TW202043216A - Compound, light emitting material, and organic semiconductor laser element - Google Patents

Compound, light emitting material, and organic semiconductor laser element Download PDF

Info

Publication number
TW202043216A
TW202043216A TW109106554A TW109106554A TW202043216A TW 202043216 A TW202043216 A TW 202043216A TW 109106554 A TW109106554 A TW 109106554A TW 109106554 A TW109106554 A TW 109106554A TW 202043216 A TW202043216 A TW 202043216A
Authority
TW
Taiwan
Prior art keywords
compound
group
general formula
light
substituted
Prior art date
Application number
TW109106554A
Other languages
Chinese (zh)
Inventor
儘田正史
安達千波矢
大山裕也
Original Assignee
國立大學法人九州大學
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 國立大學法人九州大學 filed Critical 國立大學法人九州大學
Publication of TW202043216A publication Critical patent/TW202043216A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/14Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/36Structure or shape of the active region; Materials used for the active region comprising organic materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
  • Semiconductor Lasers (AREA)
  • Plural Heterocyclic Compounds (AREA)

Abstract

This compound represented by Z1-L-Z2 is highly stable and exhibits excellent light emitting properties. Z1 and Z2 each independently represent a substituted or unsubstituted diarylamino group. The two aryl groups forming the diarylamino group are bound to each other either directly or via a linking group. L represents a conjugated linking group including a benzofuran structure and includes five or more rings in the chain linking Z1 and Z2.

Description

化合物、發光材料及有機半導體雷射元件Compounds, luminescent materials and organic semiconductor laser components

本發明係關於一種作為發光材料有用之化合物。The present invention relates to a compound useful as a luminescent material.

目前,對於實現雷射振盪閾值較低之有機半導體雷射元件之研究盛行。特別是為了實現此種有機半導體雷射元件,必須開發發射自發發射放大光(ASE:Amplified Spontaneous Emissiom)之化合物,因此,積極地進行合成各種化合物、調查ASE特性、發現作為雷射材料有用之化合物的研究。其中,亦可見藉由以茋結構為基本結構進行分子設計、而實現自發發射放大光發射之閾值(ASE閾值)較低之雷射材料的研究。 例如,非專利文獻1中報告,由下述式所表示之雙茋衍生物(BSB-Cz)表現出極低之ASE閾值,作為有機雷射色素優異。At present, researches on organic semiconductor laser components with low laser oscillation threshold are prevalent. In particular, in order to realize such organic semiconductor laser elements, it is necessary to develop compounds that emit spontaneously emitted amplified light (ASE: Amplified Spontaneous Emissiom). Therefore, various compounds are actively synthesized, ASE characteristics are investigated, and compounds useful as laser materials are discovered Research. Among them, it can also be seen that by using the stilbene structure as the basic structure for molecular design, the study of laser materials with a lower threshold of spontaneous emission amplified light (ASE threshold) can be seen. For example, Non-Patent Document 1 reports that the bisstilbene derivative (BSB-Cz) represented by the following formula exhibits an extremely low ASE threshold and is excellent as an organic laser dye.

[化1]

Figure 02_image001
[先前技術文獻] [非專利文獻][化1]
Figure 02_image001
[Prior technical literature] [Non-patent literature]

[非專利文獻1]Appl. Phys. Lett. 2005, 86, 071110[Non-Patent Document 1] Appl. Phys. Lett. 2005, 86, 071110

[發明所欲解決之問題][The problem to be solved by the invention]

如上所述,可知BSB-Cz係優異之有機雷射色素。然而,本發明人等對BSB-Cz之實用性進行評價,其結果,判明由於存在於雙茋骨架之雙鍵化學上不穩定,故而若蒸鍍BSB-Cz而形成發光層,則於其高溫之蒸鍍過程中會發生順式-反式異構化或分解,產生異構體或分解物等雜質(參照後述之實施例之NMR(nuclear magnetic resonance,核磁共振)資料)。此種雜質之生成會導致光學物性之變化或半導體特性之降低,因此,為了實現雷射性能優異之雷射元件,殷切期望開發出穩定性更高之雷射材料。As mentioned above, it is known that BSB-Cz is an excellent organic laser pigment. However, the inventors of the present invention evaluated the practicality of BSB-Cz. As a result, it was found that the double bond existing in the stilbene skeleton is chemically unstable. Therefore, if the light-emitting layer is formed by vapor deposition of BSB-Cz, it is During the evaporation process, cis-trans isomerization or decomposition occurs, and impurities such as isomers or decomposition products are generated (refer to the NMR (nuclear magnetic resonance) data of the examples described later). The generation of such impurities can lead to changes in optical properties or degradation of semiconductor characteristics. Therefore, in order to realize laser devices with excellent laser performance, it is highly desirable to develop laser materials with higher stability.

於此種狀況下,本發明人等以發現表現出與BSB-Cz同樣優異或較BSB-Cz更加優異之發光特性、且穩定性較高之化合物為目標,反覆進行研究。而且,以實現雷射振盪閾值較低之有機半導體雷射元件為目的,進行銳意研究。 [解決問題之技術手段]Under such circumstances, the inventors of the present invention have made repeated researches aiming at discovering compounds that exhibit the same or better luminescence characteristics as BSB-Cz or better than BSB-Cz and higher stability. In addition, intensive research is being conducted for the purpose of realizing organic semiconductor laser elements with a lower laser oscillation threshold. [Technical means to solve the problem]

作為進行銳意研究之結果,本發明人等發現,藉由將BSB-Cz之茋結構之伸乙烯基(-CH=CH-)利用氧原子與苯環連結而形成呋喃環,可提供一種其穩定性顯著提高、表現出較高之量子產率及較低之ASE閾值、且穩定性亦優異之化合物。 本發明係基於該等見解而提出,具體而言,具有以下之構成。As a result of intensive research, the inventors found that by linking the vinylidene group (-CH=CH-) of the stilbene structure of BSB-Cz to the benzene ring to form a furan ring, a stable Compounds with significantly improved performance, higher quantum yield and lower ASE threshold, and excellent stability. The present invention is proposed based on these findings, and specifically has the following configuration.

[1]一種化合物,其由下述通式(1)所表示, 通式(1) Z1 -L-Z2 [於通式(1)中,Z1 及Z2 分別獨立地表示經取代或者未經取代之二芳基胺基,構成上述二芳基胺基之2個芳基相互直接或經由連結基而鍵結,L表示包含苯并呋喃結構之共軛系連結基,於連結Z1 與Z2 之連結鏈中包含5個以上之環]。 [2]如[1]之化合物,其中上述共軛系連結基具有選自經取代或者未經取代之苯環、經取代或者未經取代之呋喃環、經取代或者未經取代之雜芳香環、及經取代或者未經取代之伸乙烯基中之2個以上連結而得之結構(其中上述苯環及呋喃環可縮合,又,上述呋喃環及上述雜芳香環可縮合)。 [3]如[1]或[2]之化合物,其中上述共軛系連結基包含經取代或者未經取代之苯并呋喃-2,6-二基。 [4]如[1]至[3]中任一項之化合物,其中上述共軛系連結基具有選自下述群A中之1個以上之基連結而得之結構, [化2]

Figure 02_image003
[上述群A之各基中之氫原子可經取代,*表示連結位置,自上述群A之中選擇至少1個包含苯并呋喃結構之基,又,上述群A中之包含苯并呋喃結構之基及包含茀結構之基之構成該等基之苯環之環骨架構成原子之至少1個可經氮原子取代]。 [5]如[1]至[4]中任一項之化合物,其中上述共軛系連結基包含由下述通式(2)所表示之基, [化3]
Figure 02_image005
[於通式(2)中,R1 及R2 相互鍵結而形成-O-,R3 及R4 分別獨立地表示氫原子或取代基,或相互鍵結而形成連結基,*表示連結位置,通式(2)中之與苯環鍵結之氫原子可藉由取代基所取代]。 [6]如[1]至[5]中任一項之化合物,其中上述共軛系連結基之鏈長原子數為10~30。 [7]如[1]至[6]中任一項之化合物,其中Z1 及Z2 分別獨立地為由下述通式(3)所表示之基, [化4]
Figure 02_image007
[於通式(3)中,R11 ~R20 分別獨立地表示氫原子或取代基,R15 及R16 相互鍵結而形成單鍵或連結基,R11 及R12 、R12 及R13 、R13 及R14 、R14 及R15 、R16 及R17 、R17 及R18 、R18 及R19 、R19 及R20 可相互鍵結而形成環狀結構,*表示鍵結位置]。 [8]如[1]至[6]中任一項之化合物,其中Z1 及Z2 分別獨立地為由下述通式(4)~(8)之任一者所表示之基, [化5]
Figure 02_image009
Figure 02_image011
Figure 02_image013
[於通式(4)~(8)中,R21 ~R24 、R27 ~R38 、R41 ~R48 、R51 ~R58 、R61 ~R65 、R81 ~R90 分別獨立地表示氫原子或取代基,R21 及R22 、R22 及R23 、R23 及R24 、R27 及R28 、R28 及R29 、R29 及R30 、R31 及R32 、R32 及R33 、R33 及R34 、R35 及R36 、R36 及R37 、R37 及R38 、R41 及R42 、R42 及R43 、R43 及R44 、R45 及R46 、R46 及R47 、R47 及R48 、R51 及R52 、R52 及R53 、R53 及R54 、R55 及R56 、R56 及R57 、R57 及R58 、R61 及R62 、R62 及R63 、R63 及R64 、R64 及R65 、R54 及R61 、R55 及R65 、R81 及R82 、R82 及R83 、R83 及R84 、R85 及R86 、R86 及R87 、R87 及R88 、R89 及R90 可相互鍵結而形成環狀結構,*表示鍵結位置]。 [9]如[8]之化合物,其中Z1 及Z2 分別獨立地為由上述通式(4)所表示之基。 [10]一種發光材料,其包含如[1]至[9]中任一項之化合物。 [11]如[10]之發光材料,其發射自發發射放大光。 [12]如[10]或[11]之發光材料,其係有機半導體雷射元件用之發光材料。 [13]一種有機半導體雷射元件,其包含由上述通式(1)所表示之化合物。 [發明之效果][1] A compound represented by the following general formula (1), the general formula (1) Z 1 -LZ 2 [In the general formula (1), Z 1 and Z 2 each independently represent substituted or unsubstituted A substituted diarylamino group, the two aryl groups constituting the above-mentioned diarylamino group are directly bonded to each other or via a linking group, L represents a conjugated linking group containing a benzofuran structure, and when Z 1 is connected to The link chain of Z 2 contains more than 5 rings]. [2] The compound of [1], wherein the above-mentioned conjugated linking group has a substituted or unsubstituted benzene ring, a substituted or unsubstituted furan ring, and a substituted or unsubstituted heteroaromatic ring , And a structure in which two or more of the substituted or unsubstituted vinylidene groups are connected (wherein the benzene ring and the furan ring may be condensed, and the furan ring and the heteroaromatic ring may be condensed). [3] The compound according to [1] or [2], wherein the above-mentioned conjugated linking group includes a substituted or unsubstituted benzofuran-2,6-diyl group. [4] The compound according to any one of [1] to [3], wherein the above-mentioned conjugated linking group has a structure in which one or more groups selected from the following group A are connected, [化2]
Figure 02_image003
[The hydrogen atom in each group of the above group A may be substituted, * indicates the linking position, and at least one group containing a benzofuran structure is selected from the above group A, and the group A includes a benzofuran structure At least one of the atoms constituting the benzene ring of the benzene ring of the group and the group containing the fluorine structure may be substituted by a nitrogen atom]. [5] The compound according to any one of [1] to [4], wherein the above-mentioned conjugated system linking group includes a group represented by the following general formula (2), [化3]
Figure 02_image005
[In the general formula (2), R 1 and R 2 are bonded to each other to form -O-, R 3 and R 4 each independently represent a hydrogen atom or a substituent, or are bonded to each other to form a linking group, * represents a link Position, the hydrogen atom bonded to the benzene ring in the general formula (2) can be substituted by a substituent]. [6] The compound according to any one of [1] to [5], wherein the chain length of the conjugated linking group is 10-30. [7] The compound according to any one of [1] to [6], wherein Z 1 and Z 2 are each independently a group represented by the following general formula (3), [formation 4]
Figure 02_image007
[In the general formula (3), R 11 to R 20 each independently represent a hydrogen atom or a substituent, R 15 and R 16 are bonded to each other to form a single bond or a linking group, R 11 and R 12 , R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 16 and R 17 , R 17 and R 18 , R 18 and R 19 , R 19 and R 20 can be bonded to each other to form a cyclic structure, * represents a bond End position]. [8] The compound according to any one of [1] to [6], wherein Z 1 and Z 2 are each independently a group represented by any one of the following general formulas (4) to (8), [化5]
Figure 02_image009
Figure 02_image011
Figure 02_image013
[In the general formulae (4) to (8), R 21 to R 24 , R 27 to R 38 , R 41 to R 48 , R 51 to R 58 , R 61 to R 65 , and R 81 to R 90 are each independent Ground represents a hydrogen atom or a substituent, R 21 and R 22 , R 22 and R 23 , R 23 and R 24 , R 27 and R 28 , R 28 and R 29 , R 29 and R 30 , R 31 and R 32 , R 32 and R 33 , R 33 and R 34 , R 35 and R 36 , R 36 and R 37 , R 37 and R 38 , R 41 and R 42 , R 42 and R 43 , R 43 and R 44 , R 45 And R 46 , R 46 and R 47 , R 47 and R 48 , R 51 and R 52 , R 52 and R 53 , R 53 and R 54 , R 55 and R 56 , R 56 and R 57 , R 57 and R 58 , R 61 and R 62 , R 62 and R 63 , R 63 and R 64 , R 64 and R 65 , R 54 and R 61 , R 55 and R 65 , R 81 and R 82 , R 82 and R 83 , R 83 and R 84 , R 85 and R 86 , R 86 and R 87 , R 87 and R 88 , R 89 and R 90 can be bonded to each other to form a cyclic structure, and * indicates bonding position]. [9] The compound of [8], wherein Z 1 and Z 2 are each independently a group represented by the above general formula (4). [10] A luminescent material comprising the compound of any one of [1] to [9]. [11] Luminescent materials such as [10], which emit spontaneous emission amplified light. [12] The luminescent material of [10] or [11], which is a luminescent material for organic semiconductor laser devices. [13] An organic semiconductor laser element comprising the compound represented by the above general formula (1). [Effects of Invention]

本發明之化合物由於表現出較高之量子產率及較低之ASE閾值,穩定性亦較高,故而作為發光材料有用,特別是作為有機半導體雷射元件用之發光材料之有用性較高。將本發明之化合物用於雷射材料之有機半導體雷射元件可實現較低之雷射振盪閾值。Since the compound of the present invention exhibits a higher quantum yield and a lower ASE threshold, and higher stability, it is useful as a light-emitting material, especially as a light-emitting material for organic semiconductor laser devices. The use of the compound of the present invention in the organic semiconductor laser element of the laser material can achieve a lower laser oscillation threshold.

以下,對本發明之內容詳細進行說明。以下所記載之構成要件之說明存在基於本發明之代表性實施態樣或具體例而成之情形,然而,本發明並未限定於此種實施態樣或具體例。再者,於本說明書中,使用「~」表示之數值範圍意指包含「~」之前後所記載之數值作為下限值及上限值之範圍。又,本發明所用之化合物之分子內所存在之氫原子之同位素種類並未特別限定,例如,分子內之氫原子可全部為1 H,亦可一部分或全部為2 H(氘D)。Hereinafter, the content of the present invention will be described in detail. The description of the constituent elements described below may be based on representative embodiments or specific examples of the present invention, however, the present invention is not limited to such embodiments or specific examples. In addition, in this specification, the numerical range indicated by "~" means a range that includes the numerical values described before and after "~" as the lower limit and the upper limit. In addition, the isotopic types of hydrogen atoms present in the molecule of the compound used in the present invention are not particularly limited. For example, all of the hydrogen atoms in the molecule may be 1 H, or some or all of the hydrogen atoms may be 2 H (deuterium D).

[由通式(1)所表示之化合物] 本發明之化合物具有由下述通式(1)所表示之結構。 通式(1) Z1 -L-Z2 於通式(1)中,Z1 及Z2 分別獨立地表示經取代或者未經取代之二芳基胺基,構成該二芳基胺基之2個芳基相互直接鍵結,或經由連結基而鍵結。L表示包含苯并呋喃結構之共軛系連結基,於連結Z1 與Z2 之連結鏈中包含5個以上之環。[Compound represented by general formula (1)] The compound of the present invention has a structure represented by the following general formula (1). General formula (1) Z 1 -LZ 2 In general formula (1), Z 1 and Z 2 each independently represent a substituted or unsubstituted diarylamino group, which constitutes two of the diarylamino groups The aryl groups are directly bonded to each other or bonded via a linking group. L represents a conjugated linking group including a benzofuran structure, and includes 5 or more rings in the linking chain linking Z 1 and Z 2 .

通式(1)之L係連結Z1 與Z2 之連結鏈採取共軛結構、包含至少1個苯并呋喃結構、並且於連結鏈中包含5個以上之環的連結基。共軛結構可藉由連結苯環、雜芳香環、呋喃環、伸乙烯基、苯并呋喃結構等具有雙鍵之結構而形成。此處所說之雜芳香環,較佳為5員環或6員環,作為環骨架構成雜原子,可列舉氮原子、氧原子、硫原子。更佳之雜芳香環係包含氮原子作為環骨架構成雜原子之6員環及包含氧原子作為環骨架構成雜原子之5員環,例如,可列舉吡啶環、嗒𠯤環、嘧啶環、吡𠯤環、呋喃環。作為L可採取之共軛連結基,例如,可列舉:具有連結2個以上之苯并呋喃結構而得之結構者;具有連結1個以上之苯并呋喃結構及1個以上之苯環而得之結構者;具有連結1個以上之苯并呋喃結構及1個以上之伸乙烯基而得之結構者;具有連結1個以上之苯并呋喃結構、1個以上之苯環及1個以上之伸乙烯基而得之結構者。構成L表示之共軛連結基之苯環及呋喃環可縮合,又,雜芳香環及呋喃環亦可縮合。 L表示之共軛連結基較佳為具有選自下述群A中之1個以上之基連結而得之結構者。 [化6]

Figure 02_image015
The L of the general formula (1) is a linking group in which the linking chain connecting Z 1 and Z 2 adopts a conjugated structure, includes at least one benzofuran structure, and includes 5 or more rings in the linking chain. The conjugated structure can be formed by connecting a structure having a double bond such as a benzene ring, a heteroaromatic ring, a furan ring, an vinylidene ring, and a benzofuran structure. The heteroaromatic ring referred to here is preferably a 5-membered ring or a 6-membered ring, and the heteroatom constituting the ring skeleton includes a nitrogen atom, an oxygen atom, and a sulfur atom. More preferably, a heteroaromatic ring system contains a nitrogen atom as a ring skeleton to form a 6-membered ring of heteroatoms and an oxygen atom as a ring skeleton to constitute a 5-membered ring of heteroatoms, for example, pyridine ring, pyrimidine ring, pyrimidine ring, and pyridine ring Ring, furan ring. Examples of the conjugated linking group that L can take include: those having a structure obtained by connecting two or more benzofuran structures; those having a structure obtained by connecting one or more benzofuran structures and one or more benzene rings. The structure; the structure obtained by connecting more than one benzofuran structure and more than one vinylidene structure; having more than one benzofuran structure, more than one benzene ring and more than one Structure derived from vinyl. The benzene ring and the furan ring constituting the conjugated linking group represented by L may be condensed, and the heteroaromatic ring and the furan ring may also be condensed. The conjugated linking group represented by L is preferably one having a structure in which one or more groups selected from the following group A are connected. [化6]
Figure 02_image015

*表示連結位置。自上述群A之中選擇至少1個包含苯并呋喃結構之基。又,上述群A中之包含苯并呋喃結構之基及包含茀結構之基之構成該等基之苯環之環骨架構成原子之至少1個可經氮原子取代。1個環中所取代之氮原子之數較佳為1或2,於為2之情形時,較佳為於2個氮原子不直接鍵結之位置(不相鄰之位置)取代。本案中所說之「包含苯并呋喃結構」,意指亦包含另一環進而與構成苯并呋喃之苯環縮合者、或另一環進而與構成苯并呋喃之呋喃環縮合者、或另一環分別與構成苯并呋喃之苯環及呋喃環之兩者縮合者。縮合之環為芳香環、雜芳香環、非芳香環、雜非芳香環之任一者均可,又,環數並未特別限制。環數例如選自2~30之範圍內,或選自2~15之範圍內,或選自2~8之範圍內。 L表示之共軛連結基較佳為於上述結構之中特別是包含以下之苯并呋喃結構者。 [化7]

Figure 02_image017
上述之中,特別是可選自以下之共軛連結基。
Figure 02_image019
*Indicates the link location. At least one group containing a benzofuran structure is selected from the above group A. In addition, at least one of the group A containing the benzofuran structure and the group containing the sulphur structure of the ring skeleton constituent atoms of the benzene ring constituting the group may be substituted with a nitrogen atom. The number of nitrogen atoms substituted in a ring is preferably 1 or 2. In the case of 2, it is preferably substituted at a position where the two nitrogen atoms are not directly bonded (non-adjacent positions). In this case, "including the benzofuran structure" means that it also includes another ring which condenses with the benzene ring constituting the benzofuran, or another ring which condenses with the furan ring constituting the benzofuran, or another ring separately Condensed with both the benzene ring and the furan ring constituting benzofuran. The condensed ring may be any of an aromatic ring, a heteroaromatic ring, a non-aromatic ring, and a heteronon-aromatic ring, and the number of rings is not particularly limited. The number of rings is, for example, selected from the range of 2-30, or selected from the range of 2-15, or selected from the range of 2-8. The conjugated linking group represented by L is preferably one containing the following benzofuran structure among the above-mentioned structures. [化7]
Figure 02_image017
Among the above, in particular, the following conjugated linking groups can be selected.
Figure 02_image019

又,作為L表示之共軛連結基,包含由以下之通式(2)所表示之結構者亦較佳。 [化8]

Figure 02_image021
Moreover, as the conjugated linking group represented by L, it is also preferable to include a structure represented by the following general formula (2). [化8]
Figure 02_image021

於通式(2)中,R1 及R2 相互鍵結而形成-O-。R3 及R4 分別獨立地表示氫原子或取代基,或相互鍵結而形成連結基。*表示連結位置。通式(2)中之與苯環鍵結之氫原子可藉由取代基所取代。 R3 及R4 相互鍵結而形成之連結基特佳為-O-。In the general formula (2), R 1 and R 2 are bonded to each other to form -O-. R 3 and R 4 each independently represent a hydrogen atom or a substituent, or are bonded to each other to form a linking group. *Indicates the link location. The hydrogen atom bonded to the benzene ring in the general formula (2) may be replaced by a substituent. The connecting group formed by R 3 and R 4 being bonded to each other is preferably -O-.

L於連結Z1 與Z2 之連結鏈中包含5個以上之環。此處所說之「連結鏈」,不包含分支結構。又,關於縮合環,對縮合之環之數進行計數。例如,若為苯并呋喃,則環計數為2個,若為二苯并呋喃,則環計數為3個。連結Z1 與Z2 之連結鏈中所包含之環之數例如可設為7個以上、或9個以上,又,可設為30個以下、或20個以下、或15個以下。 構成L所表示之共軛連結基之苯環、雜芳香環、呋喃環、伸乙烯基、苯并呋喃結構等中之氫原子可藉由取代基所取代,亦較佳未經取代。作為取代基,例如,可列舉烷基(碳數較佳為1~20,更佳為1~6)、烯基(碳數較佳為2~20,更佳為2~6)、炔基(碳數較佳為2~20,更佳為2~6)、芳基(碳數較佳為6~20,更佳為6~14)、雜芳基(環骨架構成原子數較佳為5~20,更佳為5~14)等。與苯環、雜芳香環、呋喃環、苯并呋喃環鍵結之取代基可相互鍵結而形成環狀結構。作為此種環狀結構,可列舉芳香環、雜芳香環、非芳香族烴環、非芳香族雜環等。另一方面,伸乙烯基之取代基可相互鍵結而形成環狀結構,但不形成芳香環或雜芳香環,只要為非芳香族烴環、非芳香族雜環則可形成。取代基鍵結而形成之環狀結構較佳為5~7員環,更佳為5或6員環。L includes more than 5 rings in the link chain connecting Z 1 and Z 2 . The "link chain" mentioned here does not include the branch structure. In addition, regarding the condensed ring, the number of condensed rings is counted. For example, if it is benzofuran, the ring count is 2, and if it is dibenzofuran, the ring count is 3. The number of rings included in the link chain connecting Z 1 and Z 2 can be, for example, 7 or more, or 9 or more, and 30 or less, or 20 or less, or 15 or less. The hydrogen atom in the benzene ring, heteroaromatic ring, furan ring, vinylidene, benzofuran structure, etc. constituting the conjugated linking group represented by L may be substituted by a substituent, and is preferably unsubstituted. As the substituent, for example, an alkyl group (the carbon number is preferably 1 to 20, more preferably 1 to 6), an alkenyl group (the carbon number is preferably 2 to 20, more preferably 2 to 6), and alkynyl groups (The carbon number is preferably 2-20, more preferably 2-6), aryl (the carbon number is preferably 6-20, more preferably 6-14), heteroaryl (the number of atoms constituting the ring skeleton is preferably 5-20, more preferably 5-14) etc. The substituents bonded to the benzene ring, heteroaromatic ring, furan ring, and benzofuran ring may be bonded to each other to form a cyclic structure. As such a cyclic structure, aromatic ring, heteroaromatic ring, non-aromatic hydrocarbon ring, non-aromatic heterocyclic ring, etc. are mentioned. On the other hand, the substituents of the vinylidene group may be bonded to each other to form a cyclic structure, but do not form an aromatic ring or a heteroaromatic ring, as long as it is a non-aromatic hydrocarbon ring or a non-aromatic heterocycle. The cyclic structure formed by bonding the substituents is preferably a 5- to 7-membered ring, and more preferably a 5- or 6-membered ring.

通式(1)中之Z1 及Z2 分別獨立地表示經取代或者未經取代之二芳基胺基,構成上述二芳基胺基之2個芳基相互直接或經由連結基而鍵結。Z1 及Z2 可相同亦可不同,較佳為相同。又,Z1 及Z2 較佳為分別獨立地為由下述通式(3)所表示之基。 [化9]

Figure 02_image023
Z 1 and Z 2 in the general formula (1) each independently represent a substituted or unsubstituted diarylamino group, and the two aryl groups constituting the above-mentioned diarylamino group are bonded to each other directly or through a linking group . Z 1 and Z 2 may be the same or different, and are preferably the same. Furthermore, it is preferable that Z 1 and Z 2 are each independently a group represented by the following general formula (3). [化9]
Figure 02_image023

於通式(3)中,R11 ~R20 分別獨立地表示氫原子或取代基。R15 及R16 相互鍵結而形成單鍵或連結基。R11 及R12 、R12 及R13 、R13 及R14 、R14 及R15 、R16 及R17 、R17 及R18 、R18 及R19 、R19 及R20 可相互鍵結而形成環狀結構。*表示鍵結位置。 關於R11 ~R20 可採取之取代基,可參照有關構成L所表示之共軛連結基之環等之取代基之說明。又,關於R11 及R12 等相互鍵結而形成之環狀結構,可參照有關L所表示之共軛連結基中之環狀結構之說明。In the general formula (3), R 11 to R 20 each independently represent a hydrogen atom or a substituent. R 15 and R 16 are bonded to each other to form a single bond or a linking group. R 11 and R 12 , R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 16 and R 17 , R 17 and R 18 , R 18 and R 19 , R 19 and R 20 can bond to each other Knot to form a ring structure. * Indicates the position of the bond. Regarding the substituents that R 11 to R 20 can take, refer to the description of the substituents such as the ring constituting the conjugated linking group represented by L. In addition, for the cyclic structure formed by bonding R 11 and R 12 to each other, refer to the description of the cyclic structure in the conjugated linking group represented by L.

作為由通式(3)所表示之基之較佳之例,可列舉由下述通式(4)~(8)之任一者所表示之基。 [化10]

Figure 02_image025
Figure 02_image027
As a preferable example of the group represented by the general formula (3), a group represented by any one of the following general formulas (4) to (8) can be cited. [化10]
Figure 02_image025
Figure 02_image027

於通式(4)~(8)中,R21 ~R24 、R27 ~R38 、R41 ~R48 、R51 ~R58 、R61 ~R65 、R81 ~R90 分別獨立地表示氫原子或取代基。R21 及R22 、R22 及R23 、R23 及R24 、R27 及R28 、R28 及R29 、R29 及R30 、R31 及R32 、R32 及R33 、R33 及R34 、R35 及R36 、R36 及R37 、R37 及R38 、R41 及R42 、R42 及R43 、R43 及R44 、R45 及R46 、R46 及R47 、R47 及R48 、R51 及R52 、R52 及R53 、R53 及R54 、R55 及R56 、R56 及R57 、R57 及R58 、R61 及R62 、R62 及R63 、R63 及R64 、R64 及R65 、R54 及R61 、R55 及R65 、R81 及R82 、R82 及R83 、R83 及R84 、R85 及R86 、R86 及R87 、R87 及R88 、R89 及R90 可相互鍵結而形成環狀結構。*表示鍵結位置。 關於此處所說之取代基及環狀結構,亦可參照有關通式(1)之L之取代基及環狀結構之說明。 於通式(4)~(8)之中,較佳為由通式(4)所表示者。In the general formulas (4) to (8), R 21 to R 24 , R 27 to R 38 , R 41 to R 48 , R 51 to R 58 , R 61 to R 65 , and R 81 to R 90 are each independently Represents a hydrogen atom or a substituent. R 21 and R 22 , R 22 and R 23 , R 23 and R 24 , R 27 and R 28 , R 28 and R 29 , R 29 and R 30 , R 31 and R 32 , R 32 and R 33 , R 33 And R 34 , R 35 and R 36 , R 36 and R 37 , R 37 and R 38 , R 41 and R 42 , R 42 and R 43 , R 43 and R 44 , R 45 and R 46 , R 46 and R 47 , R 47 and R 48 , R 51 and R 52 , R 52 and R 53 , R 53 and R 54 , R 55 and R 56 , R 56 and R 57 , R 57 and R 58 , R 61 and R 62 , R 62 and R 63 , R 63 and R 64 , R 64 and R 65 , R 54 and R 61 , R 55 and R 65 , R 81 and R 82 , R 82 and R 83 , R 83 and R 84 , R 85 And R 86 , R 86 and R 87 , R 87 and R 88 , R 89 and R 90 may be bonded to each other to form a cyclic structure. * Indicates the position of the bond. Regarding the substituents and cyclic structures mentioned here, reference can also be made to the description of the substituents and cyclic structures of L in the general formula (1). Among general formulas (4) to (8), those represented by general formula (4) are preferred.

作為由通式(1)所表示之化合物之例,例如,可列舉由下述通式(9)所表示之化合物。As an example of the compound represented by general formula (1), for example, a compound represented by the following general formula (9) can be cited.

[化11]

Figure 02_image029
[化11]
Figure 02_image029

於通式(9)中,R1 ~R8 分別獨立地表示氫原子或取代基,R1 及R2 、R3 及R4 、R5 及R6 、R7 及R8 中之至少1組相互鍵結而形成-O-。 於通式(9)中,4組均係形成-O-之化合物亦較佳,僅R1 及R2 、R7 及R8 形成-O-之化合物、或僅R3 及R4 、R5 及R6 形成-O-之化合物亦較佳。於通式(9)中不形成-O-之R1 ~R8 較佳為氫原子。通式(9)之與苯環鍵結之氫原子可藉由取代基所取代。又,2個取代基可相互鍵結而形成環狀結構。關於取代基,可參照有關通式(1)之L中之取代基之說明。關於環狀結構,可參照有關通式(1)之L所表示之共軛連結基中之環狀結構之說明。In the general formula (9), R 1 to R 8 each independently represent a hydrogen atom or a substituent, and at least 1 of R 1 and R 2 , R 3 and R 4 , R 5 and R 6 , R 7 and R 8 The groups are bonded to each other to form -O-. In the general formula (9), four groups of compounds are all forming -O-, and only R 1 and R 2 , R 7 and R 8 form -O-, or only R 3 and R 4 , R Compounds in which 5 and R 6 form -O- are also preferred. R 1 to R 8 that do not form -O- in the general formula (9) are preferably hydrogen atoms. The hydrogen atom bonded to the benzene ring of the general formula (9) may be substituted by a substituent. In addition, two substituents may be bonded to each other to form a cyclic structure. Regarding the substituent, refer to the description of the substituent in L of the general formula (1). Regarding the cyclic structure, refer to the description of the cyclic structure in the conjugated linking group represented by L of the general formula (1).

以下,例示由通式(1)所表示之化合物之具體例。然而,於本發明中可使用之由通式(1)所表示之化合物不應藉由該等具體例所限定性地說明。Hereinafter, specific examples of the compound represented by the general formula (1) are illustrated. However, the compounds represented by the general formula (1) that can be used in the present invention should not be limitedly illustrated by these specific examples.

[化12]

Figure 02_image031
Figure 02_image033
[化12]
Figure 02_image031
Figure 02_image033

[由通式(1)所表示之化合物之合成方法] 由通式(1)所表示之化合物係新型化合物。 由通式(1)所表示之化合物可藉由組合既知之反應而合成。例如,通式(9)之R1 及R2 、R7 及R8 相互鍵結而形成-O-之化合物可藉由使以下之反應式(1)所示之2個化合物反應而合成。又,通式(1)之R3 及R4 、R5 及R6 相互鍵結而形成-O-之化合物可藉由使以下之反應式(2)所示之2個化合物反應而合成。[Synthesis method of compound represented by general formula (1)] The compound represented by general formula (1) is a novel compound. The compound represented by the general formula (1) can be synthesized by combining known reactions. For example, a compound in which R 1 and R 2 , R 7 and R 8 of the general formula (9) are bonded to each other to form -O- can be synthesized by reacting two compounds shown in the following reaction formula (1). In addition, a compound in which R 3 and R 4 , R 5 and R 6 of the general formula (1) are bonded to each other to form -O- can be synthesized by reacting two compounds shown in the following reaction formula (2).

[化13]

Figure 02_image035
[化13]
Figure 02_image035

關於上述之反應式中之R1 ~R7 之說明,可參照通式(1)中之對應之記載。X1 ~X3 表示鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子,較佳為氯原子、溴原子、碘原子,更佳為碘。 上述反應係應用公知之偶合反應者,可適當選擇公知之反應條件使用。關於上述反應之詳細內容,可將後述之合成例、Adv. Funct. Mater., 2018, 28, 4.、Synthesis., 2008, 15, 2448.、j. New. Chem., 2018, 42, 2446.、J. Org. Chem., 2004, 69, 6832.作為參考。又,由通式(1)所表示之化合物亦可藉由組合其他公知之合成反應而合成。For the description of R 1 to R 7 in the above reaction formula, refer to the corresponding description in the general formula (1). X 1 to X 3 represent a halogen atom, and examples thereof include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. A chlorine atom, a bromine atom, and an iodine atom are preferable, and iodine is more preferable. The above reaction is to apply a known coupling reaction, and the known reaction conditions can be appropriately selected and used. For the details of the above reaction, the following synthesis example, Adv. Funct. Mater., 2018, 28, 4., Synthesis., 2008, 15, 2448., j. New. Chem., 2018, 42, 2446 ., J. Org. Chem., 2004, 69, 6832. For reference. In addition, the compound represented by the general formula (1) can also be synthesized by combining other known synthesis reactions.

[發光材料] 本發明之發光材料之特徵在於,包含由通式(1)所表示之化合物。 由通式(1)所表示之化合物由於表現出優異之發光特性及較高之穩定性,故而作為發光材料有用,特別是由於ASE閾值較低,故而作為有機雷射元件用之發光材料之有用性較高。其原因推測在於,由通式(1)所表示之化合物一面具有與BSB-Cz共通之結構,一面與BSB-Cz不同,具有伸乙烯基(-CH=CH-)與苯環連結而構成呋喃環之特徵性結構。 即,可知BSB-Cz雖ASE閾值較低,但為優異之有機雷射色素,但於分子內具有2個反應性較高之伸乙烯基(-CH=CH-),與芳香族化合物相比,穩定性不佳。然而,為了提高穩定性,於將茋結構轉換成如

Figure 109106554-A0304-12-01
之苯環之縮合結構(芳香族縮合環)之情形時,芳香性變大,發光性能本身發生變化。又,認為若將伸乙烯基藉由伸烷基而與苯環連結,則不增大芳香性,伸乙烯基併入環狀結構,穩定性提高。然而,於該情形時,產生合成步驟繁雜、或難以藉由蒸鍍成膜等問題。與此相對,本發明之由通式(1)所表示之化合物具有BSB-Cz所含之伸乙烯基之至少1個經由-O-與苯環連結而得之結構,藉此,成為伸乙烯基併入呋喃結構之形態。其中,認為呋喃環由於具有芳香性,故而穩定性高於伸乙烯基,另一方面,特別是由於呋喃環與苯環相比芳香性較低,故而即便呋喃環併入,亦保持茋之物性。又,藉由此種連結結構,雙鍵之順式反式異構化得以完全避免。 藉由以上,由通式(1)所表示之化合物除與BSB-Cz相同地表現出較低之ASE閾值以外,穩定性較高。進而,由通式(1)所表示之化合物有量子產率高於BSB-Cz之傾向。而且,有量子產率高於將BSB-Cz所含之伸乙烯基之至少1個經由-S-與苯環連結而形成噻吩環之化合物之傾向。又,由通式(1)所表示之化合物可不經歷繁雜之步驟而合成,又,可藉由真空蒸鍍法容易地成膜。藉由該等,由通式(1)所表示之化合物作為發光材料、特別是有機半導體雷射元件用之發光材料之有用性非常高。[Light-emitting material] The light-emitting material of the present invention is characterized by including a compound represented by the general formula (1). The compound represented by the general formula (1) is useful as a light-emitting material because it exhibits excellent light-emitting characteristics and high stability, and is particularly useful as a light-emitting material for organic laser devices due to its low ASE threshold. High sex. The reason is presumed to be that the compound represented by the general formula (1) has a structure common to BSB-Cz on one side, and is different from BSB-Cz on the other side, and has an vinylidene group (-CH=CH-) connected with a benzene ring to form furan The characteristic structure of the ring. That is, it can be seen that although BSB-Cz has a low ASE threshold, it is an excellent organic laser pigment, but has two highly reactive vinylidene groups (-CH=CH-) in the molecule, which is compared with aromatic compounds , Poor stability. However, in order to improve stability, Yu transformed the stilbene structure into
Figure 109106554-A0304-12-01
In the case of the condensed structure of the benzene ring (aromatic condensed ring), the aromaticity becomes greater and the luminescence performance itself changes. In addition, it is considered that if the vinylene group is connected to the benzene ring through the alkylene group, the aromaticity is not increased, the vinylene group is incorporated into the cyclic structure, and the stability is improved. However, in this case, problems such as complicated synthesis steps or difficulty in film formation by vapor deposition arise. In contrast, the compound represented by the general formula (1) of the present invention has a structure in which at least one of the vinylidene groups contained in BSB-Cz is connected to the benzene ring via -O-, thereby becoming vinylidene The form of the group incorporated into the furan structure. Among them, it is believed that the furan ring is more stable than vinylidene due to its aromaticity. On the other hand, especially because the furan ring is less aromatic than the benzene ring, even if the furan ring is incorporated, the physical properties of stilbene are maintained . Moreover, with this connection structure, the cis-trans isomerization of the double bond can be completely avoided. As a result of the above, the compound represented by the general formula (1) has higher stability except that it exhibits a lower ASE threshold like BSB-Cz. Furthermore, the compound represented by the general formula (1) tends to have a quantum yield higher than BSB-Cz. Moreover, there is a tendency that the quantum yield is higher than that of a compound that connects at least one of the vinylidene groups contained in BSB-Cz to a benzene ring via -S- to form a thiophene ring. In addition, the compound represented by the general formula (1) can be synthesized without going through complicated steps, and can be easily formed into a film by a vacuum vapor deposition method. With these, the compound represented by the general formula (1) is very useful as a light-emitting material, especially a light-emitting material for organic semiconductor laser devices.

[有機雷射元件] 如上所述,由通式(1)所表示之化合物表現出較高之量子產率及較低之ASE閾值,且穩定性較高。由此,藉由將由通式(1)所表示之化合物用於有機雷射元件之材料,可於其成膜時之蒸鍍過程中不損傷光學物性,而實現優異之雷射特性。 應用本發明之化合物之有機雷射元件可為藉由對發光層照射激發光而發射雷射光之光激發型有機雷射元件,亦可為藉由電洞及電子注入至發光層再結合所產生之能量而發射雷射光之電流激發型有機雷射元件(有機半導體雷射元件)。光激發型有機雷射元件具有於基板上至少形成發光層之構造。又,有機半導體雷射元件具有至少形成陽極、陰極、及位於陽極與陰極之間之有機層的構造。有機層至少具有發光層,可僅由發光層所構成,亦可除發光層以外還具有1層以上之有機層。作為此種其他有機層,可列舉電洞傳輸層、電洞注入層、電子阻擋層、電洞阻擋層、電子注入層、電子傳輸層、激子阻擋層等。電洞傳輸層可為具有電洞注入功能之電洞注入傳輸層,電子傳輸層可為具有電子注入功能之電子注入傳輸層。將具體之有機半導體雷射元件之構造例表示於圖1。於圖1中,1表示基板,2表示陽極,3表示電洞注入層,4表示電洞傳輸層,5表示發光層,6表示電子傳輸層,7表示陰極。於電流激發型有機半導體雷射元件中,發光層中產生之雷射光可透過陽極提取至外部,可透過陰極提取至外部,亦可透過陽極及陰極提取至外部。又,發光層中產生之雷射光可自有機層之端面提取至外部。 以下,對有機半導體雷射元件之各構件及各層進行說明。再者,基板及發光層之說明亦適於光激發型有機雷射元件及發光層。[Organic Laser Components] As mentioned above, the compound represented by the general formula (1) exhibits a higher quantum yield, a lower ASE threshold, and a higher stability. Therefore, by using the compound represented by the general formula (1) in the material of the organic laser device, the optical properties can be achieved without damaging the optical properties during the deposition process during film formation, and excellent laser characteristics can be achieved. The organic laser element to which the compound of the present invention is applied can be a light-excited organic laser element that emits laser light by irradiating excitation light to the light-emitting layer, or it can be produced by injecting holes and electrons into the light-emitting layer and combining them A current-excited organic laser element (organic semiconductor laser element) that emits laser light with its energy. The light-excited organic laser device has a structure in which at least a light-emitting layer is formed on a substrate. In addition, the organic semiconductor laser element has a structure in which at least an anode, a cathode, and an organic layer located between the anode and the cathode are formed. The organic layer has at least a light-emitting layer, and may be composed of only the light-emitting layer, or may have one or more organic layers in addition to the light-emitting layer. Examples of such other organic layers include a hole transport layer, a hole injection layer, an electron blocking layer, a hole blocking layer, an electron injection layer, an electron transport layer, and an exciton blocking layer. The hole transport layer can be a hole injection transport layer with a hole injection function, and the electron transport layer can be an electron injection transport layer with an electron injection function. A specific example of the structure of the organic semiconductor laser device is shown in FIG. 1. In FIG. 1, 1 is a substrate, 2 is an anode, 3 is a hole injection layer, 4 is a hole transport layer, 5 is a light emitting layer, 6 is an electron transport layer, and 7 is a cathode. In the current-excited organic semiconductor laser element, the laser light generated in the light-emitting layer can be extracted to the outside through the anode, can be extracted to the outside through the cathode, and can also be extracted to the outside through the anode and the cathode. In addition, the laser light generated in the light-emitting layer can be extracted from the end surface of the organic layer to the outside. Hereinafter, each member and each layer of the organic semiconductor laser element will be described. Furthermore, the description of the substrate and the light-emitting layer is also applicable to the light-excited organic laser device and the light-emitting layer.

(基板) 本發明之有機半導體雷射元件較佳為由基板所支持。作為基板,於有機半導體雷射元件係自基板側提取雷射光之構成之情形時,採用對雷射光具有透光性之基板,較佳為使用包含玻璃、透明塑膠、石英等之透明基板。另一方面,於有機半導體雷射元件係自基板之相反側提取雷射光之構成之情形時,基板並未特別限制,除上述透明基板以外,亦可使用包含矽、紙、布之基板。(Substrate) The organic semiconductor laser device of the present invention is preferably supported by a substrate. As the substrate, when the organic semiconductor laser element is configured to extract laser light from the substrate side, a substrate that is translucent to laser light is used, and a transparent substrate containing glass, transparent plastic, quartz, etc. is preferably used. On the other hand, when the organic semiconductor laser element is configured to extract laser light from the opposite side of the substrate, the substrate is not particularly limited. In addition to the above-mentioned transparent substrate, a substrate containing silicon, paper, and cloth can also be used.

(陽極) 作為有機半導體雷射元件中之陽極,適宜使用功函數較大(4 eV以上)之金屬、合金、導電性化合物及該等之混合物作為電極材料者。作為此種電極材料之具體例,可列舉Au等金屬、CuI、氧化銦錫(ITO)、SnO2 、ZnO、TiN等導電性透明材料。又,亦可使用IDIXO(In2 O3 -ZnO)等非晶質且可製作透明導電膜之材料。陽極可藉由將該等電極材料利用蒸鍍或濺鍍等方法成膜而形成。又,可於所形成之薄膜上藉由光微影法形成所需之形狀之圖案而製成陽極,或者於不太需要圖案精度之情形時(100 μm以上左右),可於上述電極材料之蒸鍍或濺鍍時經由所需之形狀之光罩而形成圖案。或者,於使用如有機導電性化合物之可塗佈之材料之情形時,亦可使用印刷方式、塗佈方式等濕式成膜法。 其中,於有機半導體雷射元件係透過陽極提取雷射光之構成之情形時,陽極需要對雷射光具有透光性,較佳為以其雷射光之透過率大於1%之方式而構成,更佳為以大於10%之方式而構成。具體而言,較佳為將上述導電性透明材料用於陽極,或將以10~100 nm之厚度形成金屬或合金而得之薄膜用於陽極。 作為陽極之薄片電阻較佳為數百Ω/□以下。進而膜厚亦依存於材料,通常自10~1000 nm、較佳為自10~200 nm之範圍內選擇。(Anode) As the anode in the organic semiconductor laser element, it is suitable to use metals, alloys, conductive compounds and their mixtures with a large work function (above 4 eV) as electrode materials. Specific examples of such electrode materials include metals such as Au, CuI, indium tin oxide (ITO), SnO 2 , ZnO, TiN, and other conductive transparent materials. In addition, it is also possible to use materials such as IDIXO (In 2 O 3 -ZnO) that are amorphous and can produce transparent conductive films. The anode can be formed by forming a film of these electrode materials by methods such as vapor deposition or sputtering. In addition, the anode can be formed by forming a pattern of the desired shape on the formed film by photolithography, or when the pattern accuracy is not required (about 100 μm or more), it can be used among the above-mentioned electrode materials. During evaporation or sputtering, a pattern is formed through a mask of the required shape. Alternatively, when using a coatable material such as an organic conductive compound, a wet film forming method such as a printing method and a coating method can also be used. Among them, when the organic semiconductor laser element is configured to extract laser light through the anode, the anode needs to be transparent to the laser light, and it is preferably constructed in a way that the transmittance of the laser light is greater than 1%, more preferably To be constituted with greater than 10%. Specifically, it is preferable to use the above-mentioned conductive transparent material for the anode, or to use a thin film obtained by forming a metal or alloy with a thickness of 10-100 nm for the anode. The sheet resistance as the anode is preferably several hundred Ω/□ or less. Furthermore, the film thickness also depends on the material, and is usually selected from the range of 10 to 1000 nm, preferably from 10 to 200 nm.

(陰極) 另一方面,作為陰極,可使用將功函數小於陽極所用之材料之金屬(稱為電子注入性金屬)、合金、導電性化合物及該等之混合物作為電極材料者。作為此種電極材料之具體例,可列舉鈉、鈉-鉀合金、鎂、鋰、鎂/銅混合物、鎂/銀混合物、鎂/鋁混合物、鎂/銦混合物、鋁/氧化鋁(Al2 O3 )混合物、銦、鋰/鋁混合物、稀土類金屬等。該等之中,就電子注入性及對氧化等之耐久性之觀點而言,較佳為電子注入性金屬與功函數之值大於其且穩定之金屬即第二金屬之混合物、例如鎂/銀混合物、鎂/鋁混合物、鎂/銦混合物、鋁/氧化鋁(Al2 O3 )混合物、鋰/鋁混合物,鋁等。陰極可藉由將該等電極材料利用蒸鍍或濺鍍等方法成膜而形成。 其中,於有機半導體雷射元件係透過陰極提取雷射光之構成之情形時,陰極需要對雷射光具有透光性,較佳為以其雷射光之透過率大於1%之方式而構成,更佳為以大於10%之方式而構成。具體而言,較佳為將以10~100 nm之厚度形成上述電極材料而得之薄膜用於陰極。 作為陰極之薄片電阻較佳為數百Ω/□以下,膜厚通常於10 nm~5 μm、較佳為50~200 nm之範圍內選擇。(Cathode) On the other hand, as a cathode, a metal (called an electron injecting metal), an alloy, a conductive compound, and a mixture of these whose work function is smaller than that of the material used in the anode can be used as the electrode material. As specific examples of such electrode materials, sodium, sodium-potassium alloys, magnesium, lithium, magnesium/copper mixtures, magnesium/silver mixtures, magnesium/aluminum mixtures, magnesium/indium mixtures, aluminum/alumina (Al 2 O 3 ) Mixtures, indium, lithium/aluminum mixtures, rare earth metals, etc. Among them, from the viewpoint of electron injectability and durability against oxidation, it is preferable that the electron injecting metal and the work function have a greater value than the stable metal that is a mixture of the second metal, such as magnesium/silver Mixtures, magnesium/aluminum mixtures, magnesium/indium mixtures, aluminum/alumina (Al 2 O 3 ) mixtures, lithium/aluminum mixtures, aluminum, etc. The cathode can be formed by forming a film of these electrode materials by methods such as vapor deposition or sputtering. Among them, when the organic semiconductor laser element is configured to extract the laser light through the cathode, the cathode needs to be transparent to the laser light, and it is preferably constructed in a way that the transmittance of the laser light is greater than 1%, and more preferably To be constituted with greater than 10%. Specifically, it is preferable to use a thin film obtained by forming the aforementioned electrode material with a thickness of 10-100 nm for the cathode. The sheet resistance of the cathode is preferably several hundred Ω/□ or less, and the film thickness is usually selected in the range of 10 nm to 5 μm, preferably 50 to 200 nm.

(發光層) 發光層係藉由自陽極及陰極之各者注入之電洞及電子再結合而產生激子、形成反轉分佈後發射雷射光之層。 發光層較佳為僅由發光材料所構成,亦可包含發光材料及主體材料。作為發光材料,可使用選自由通式(1)所表示之化合物群中之1種或2種以上。為了使本發明之有機半導體雷射元件之閾值電流密度更低,將發光材料所產生之單重態激子及三重態激子之至少一者封於發光材料中較重要。因此,較佳為發光層中除發光材料以外還使用主體材料。作為主體材料,可使用激發單重態能量、激發三重態能量之至少任一者較用作發光材料之由通式(1)所表示之化合物具有更高之值的有機化合物。其結果,可將發光材料所產生之單重態激子及三重態激子封於發光材料之分子中,可使得用於產生該雷射光之發射之閾值電流密度更低。不過,由於存在即便無法充分封閉單重態激子及三重態激子、亦可有助於低閾值化或雷射特性之改善之情形,故而若為可實現低閾值化或雷射特性之改善之主體材料,則可並無特別限制地用於本發明。於本發明之有機半導體雷射元件中,雷射光自作為發光材料所包含之由通式(1)所表示之化合物發射。該雷射光可為自發發射放大光,亦可為藉由自外部照射之光而受激發射之受激發射光。又,來自發光層之光可包含自主體材料發射之光。 於使用並非由通式(1)所表示之主體材料之情形時,發光材料所用之由通式(1)所表示之化合物於發光層中之含量較佳為0.1重量%以上,更佳為1重量%以上,又,較佳為50重量%以下,更佳為25重量%以下,進而較佳為20重量%以下,特佳為15重量%以下。 作為發光層中之主體材料,較佳為具有電洞傳輸能力、電子傳輸能力、且防止發光之長波長化、並且具有較高之玻璃轉移溫度之有機化合物。再者,亦可使用由通式(1)所表示之化合物作為主體材料。(Light-emitting layer) The light-emitting layer is a layer that generates excitons by recombining holes and electrons injected from each of the anode and the cathode, forming an inverted distribution, and emitting laser light. The light-emitting layer is preferably composed only of light-emitting materials, and may also include light-emitting materials and host materials. As the light-emitting material, one or two or more selected from the group of compounds represented by the general formula (1) can be used. In order to lower the threshold current density of the organic semiconductor laser device of the present invention, it is important to encapsulate at least one of the singlet excitons and triplet excitons generated by the luminescent material in the luminescent material. Therefore, it is preferable to use a host material in addition to the light-emitting material in the light-emitting layer. As the host material, at least any one of excited singlet energy and excited triplet energy can be used as an organic compound having a higher value than the compound represented by the general formula (1) used as a luminescent material. As a result, the singlet excitons and triplet excitons generated by the luminescent material can be enclosed in the molecules of the luminescent material, and the threshold current density for generating the emission of the laser light can be lowered. However, even if the singlet excitons and triplet excitons cannot be fully enclosed, it can contribute to the lowering of the threshold or the improvement of the laser characteristics. Therefore, if it is possible to achieve the lowering of the threshold or the improvement of the laser characteristics The host material can be used in the present invention without particular limitation. In the organic semiconductor laser element of the present invention, the laser light is emitted from the compound represented by the general formula (1) contained as a luminescent material. The laser light may be spontaneous emission amplified light, or stimulated emission light that is stimulated to be emitted by light irradiated from the outside. Also, the light from the light-emitting layer may include light emitted from the host material. When a host material not represented by the general formula (1) is used, the content of the compound represented by the general formula (1) used in the light-emitting material in the light-emitting layer is preferably 0.1% by weight or more, more preferably 1 % By weight or more, more preferably 50% by weight or less, more preferably 25% by weight or less, still more preferably 20% by weight or less, particularly preferably 15% by weight or less. As the host material in the light-emitting layer, it is preferably an organic compound that has hole transport ability, electron transport ability, prevents long-wavelength light emission, and has a higher glass transition temperature. Furthermore, the compound represented by the general formula (1) can also be used as the host material.

(注入層) 注入層係指為了降低驅動電壓或提高發光亮度而設置於電極與有機層之間之層,有電洞注入層及電子注入層,可存在於陽極與發光層或電洞傳輸層之間、及陰極與發光層或電子傳輸層之間。注入層可視需要設置。(Injection layer) The injection layer refers to a layer provided between the electrode and the organic layer in order to reduce the driving voltage or increase the luminescence brightness. There are a hole injection layer and an electron injection layer, which can exist between the anode and the light emitting layer or the hole transport layer, and Between the cathode and the light-emitting layer or electron transport layer. The injection layer can be set as needed.

(阻擋層) 阻擋層係可阻擋存在於發光層中之電荷(電子或者電洞)及/或激子向發光層外擴散之層。電子阻擋層可配置於發光層及電洞傳輸層之間,阻擋電子向電洞傳輸層通過發光層。同樣,電洞阻擋層可配置於發光層及電子傳輸層之間,阻擋電洞向電子傳輸層通過發光層。又,阻擋層可用於阻擋激子向發光層之外側擴散。即,電子阻擋層、電洞阻擋層分別亦可兼具作為激子阻擋層之功能。本說明書中所說之電子阻擋層或激子阻擋層之含義係指包含一層中具有電子阻擋層及激子阻擋層之功能之層。(Barrier layer) The barrier layer is a layer that can prevent the charges (electrons or holes) and/or excitons existing in the light-emitting layer from diffusing out of the light-emitting layer. The electron blocking layer may be disposed between the light-emitting layer and the hole transport layer to block electrons from passing through the light-emitting layer to the hole transport layer. Similarly, the hole blocking layer can be disposed between the light-emitting layer and the electron transport layer to prevent holes from passing through the light-emitting layer to the electron transport layer. In addition, the barrier layer can be used to prevent excitons from diffusing to the outside of the light-emitting layer. That is, each of the electron blocking layer and the hole blocking layer may also function as an exciton blocking layer. The meaning of the electron blocking layer or exciton blocking layer in this specification refers to a layer having the functions of an electron blocking layer and an exciton blocking layer.

(電洞阻擋層) 電洞阻擋層廣義而言具有電子傳輸層之功能。電洞阻擋層有傳輸電子、並阻擋電洞到達電子傳輸層之作用,藉此,可提高發光層中之電子及電洞再結合之機率。作為電洞阻擋層之材料,可視需要使用後述之電子傳輸層之材料。(Hole blocking layer) The hole blocking layer functions as an electron transport layer in a broad sense. The hole blocking layer has the function of transporting electrons and blocking holes from reaching the electron transport layer, thereby increasing the probability of recombination of electrons and holes in the light-emitting layer. As the material of the hole blocking layer, the material of the electron transport layer described later can be used as needed.

(電子阻擋層) 電子阻擋層廣義而言具有傳輸電洞之功能。電子阻擋層有傳輸電洞、並阻擋電子到達電洞傳輸層之作用,藉此,可提高發光層中之電子及電洞再結合之機率。(Electron blocking layer) The electron blocking layer has the function of transmitting holes in a broad sense. The electron blocking layer has the function of transporting holes and blocking electrons from reaching the hole transport layer, thereby increasing the probability of recombination of electrons and holes in the light-emitting layer.

(激子阻擋層) 激子阻擋層係用於阻擋藉由發光層內電洞及電子再結合所產生之激子向電荷傳輸層擴散之層,藉由本層之插入,可將激子高效地封於發光層內,可提高元件之發光效率。激子阻擋層可與發光層相鄰地插入於陽極側、陰極側之任一側,亦可同時插入於兩者。即,於陽極側具有激子阻擋層之情形時,可於電洞傳輸層與發光層之間與發光層相鄰地插入該層,於插入於陰極側之情形時,可於發光層與陰極之間與發光層相鄰地插入該層。又,可於陽極、與鄰接於發光層之陽極側之激子阻擋層之間,具有電洞注入層或電子阻擋層等,可於陰極、與鄰接於發光層之陰極側之激子阻擋層之間,具有電子注入層、電子傳輸層、電洞阻擋層等。於配置阻擋層之情形時,較佳為用作阻擋層之材料之激發單重態能量及激發三重態能量之至少任一者高於發光材料之激發單重態能量及激發三重態能量。(Exciton blocking layer) The exciton blocking layer is a layer used to block the excitons generated by the recombination of holes and electrons in the light-emitting layer from diffusing to the charge transport layer. Through the insertion of this layer, the excitons can be efficiently sealed in the light-emitting layer. Can improve the luminous efficiency of the device. The exciton blocking layer may be inserted adjacent to the light-emitting layer on either the anode side or the cathode side, or may be inserted in both at the same time. That is, when there is an exciton blocking layer on the anode side, it can be inserted between the hole transport layer and the light-emitting layer adjacent to the light-emitting layer. When it is inserted on the cathode side, it can be inserted between the light-emitting layer and the cathode. The layer is inserted adjacent to the light-emitting layer. In addition, a hole injection layer or electron blocking layer can be provided between the anode and the exciton blocking layer adjacent to the anode side of the light-emitting layer, and the exciton blocking layer can be provided between the anode and the cathode side adjacent to the light-emitting layer In between, there are an electron injection layer, an electron transport layer, a hole blocking layer, etc. When the barrier layer is configured, it is preferable that at least one of the excited singlet energy and the excited triplet energy of the material used as the barrier layer is higher than the excited singlet energy and the excited triplet energy of the luminescent material.

(電洞傳輸層) 電洞傳輸層包含具有傳輸電洞之功能之電洞傳輸材料,電洞傳輸層可設置單層或複數層。 作為電洞傳輸材料,係具有電洞之注入或傳輸、電子之障壁性之任一者,可為有機物、無機物之任一者。作為可使用之公知之電洞傳輸材料,例如,可列舉三唑衍生物、㗁二唑衍生物、咪唑衍生物、咔唑衍生物、吲哚并咔唑衍生物、聚芳基烷烴衍生物、吡唑啉衍生物及吡唑啉酮衍生物、苯二胺衍生物、芳基胺衍生物、胺基取代查耳酮衍生物、㗁唑衍生物、苯乙烯基蒽衍生物、茀酮衍生物、腙衍生物、茋衍生物、矽氮烷衍生物、苯胺系共聚物、以及導電性高分子低聚物特別是噻吩低聚物等,較佳為使用卟啉化合物、芳香族三級胺化合物及苯乙烯胺化合物,更佳為使用芳香族三級胺化合物。(Hole transport layer) The hole transport layer includes a hole transport material with the function of transmitting holes, and the hole transport layer can be provided with a single layer or multiple layers. As the hole transport material, it has any of hole injection or transport, electron barrier properties, and can be either organic or inorganic. As well-known hole transport materials that can be used, for example, triazole derivatives, oxadiazole derivatives, imidazole derivatives, carbazole derivatives, indolocarbazole derivatives, polyarylalkane derivatives, Pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amine-substituted chalcone derivatives, azole derivatives, styrylanthracene derivatives, stellone derivatives , Hydrazone derivatives, stilbene derivatives, silazane derivatives, aniline copolymers, and conductive polymer oligomers, especially thiophene oligomers, etc. Preferably, porphyrin compounds and aromatic tertiary amine compounds are used And the styrylamine compound, it is more preferable to use an aromatic tertiary amine compound.

(電子傳輸層) 電子傳輸層包含具有傳輸電子之功能之材料,電子傳輸層可設置單層或複數層。 作為電子傳輸材料(亦存在兼作電洞阻擋材料之情形),可具有將自陰極注入之電子傳遞至發光層之功能。作為可使用之電子傳輸層,例如,可列舉硝基取代茀衍生物、二苯基苯醌衍生物、噻喃二氧化物衍生物、碳二醯亞胺、亞茀基甲烷衍生物、蒽醌二甲烷及蒽酮衍生物、㗁二唑衍生物等。進而,上述㗁二唑衍生物中,將㗁二唑環之氧原子取代為硫原子之噻二唑衍生物、具有作為拉電子基所知之喹㗁啉環之喹㗁啉衍生物亦可用作電子傳輸材料。進而,亦可使用將該等材料導入高分子鏈、或將該等材料作為高分子之主鏈而得之高分子材料。(Electron transport layer) The electron transport layer includes a material with the function of transporting electrons, and the electron transport layer can be provided with a single layer or multiple layers. As an electron transport material (also sometimes used as a hole blocking material), it can have the function of transferring electrons injected from the cathode to the light-emitting layer. As the electron transport layer that can be used, for example, nitro-substituted quinone derivatives, diphenyl quinone derivatives, thiopyran dioxide derivatives, carbodiimides, phenylenemethane derivatives, anthraquinone Dimethane and anthrone derivatives, oxadiazole derivatives, etc. Furthermore, among the above-mentioned oxadiazole derivatives, thiadiazole derivatives in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, and quinoline derivatives having a quinoline ring known as an electron withdrawing group can also be used Used as an electronic transmission material. Furthermore, it is also possible to use a polymer material obtained by introducing these materials into a polymer chain or using these materials as the main chain of a polymer.

(共振器構造) 本發明之有機半導體雷射元件進而可具有共振器構造。「共振器構造」係用於使發光材料發射之光於發光層中往復之構造。藉此,光於發光層中反覆移動而引起受激發射,因此,可獲得強度更高之雷射光。共振器構造具體而言由一對反射鏡所構成,一反射鏡較佳為具有100%之反射率,另一反射鏡較佳為反射率為50~95%。藉由另一反射鏡之反射率設定為比較低,可透過該反射鏡將雷射光提取至外部。以下,將提取雷射光之側之反射鏡稱為「輸出鏡」。反射鏡及輸出鏡可與上述構成有機半導體雷射元件之各層及各部分開設置,亦可使陽極或陰極兼具反射鏡或輸出鏡之功能。(Resonator structure) The organic semiconductor laser element of the present invention may further have a resonator structure. The "resonator structure" is a structure used to make the light emitted by the luminescent material reciprocate in the luminescent layer. In this way, the light moves repeatedly in the light-emitting layer to cause stimulated emission, and therefore, higher intensity laser light can be obtained. The resonator structure is specifically composed of a pair of mirrors. One mirror preferably has a reflectivity of 100%, and the other mirror preferably has a reflectivity of 50-95%. By setting the reflectivity of the other mirror to be relatively low, the laser light can be extracted to the outside through the mirror. Hereinafter, the mirror on the side that extracts the laser light is referred to as the "output mirror". The reflecting mirror and the output mirror can be arranged separately from the layers and parts of the above-mentioned organic semiconductor laser element, and the anode or the cathode can also function as a reflecting mirror or an output mirror.

例如,於使陽極兼具反射鏡或輸出鏡之功能之情形時,陽極較佳為由可見光之吸收較小、反射率較高、且功函數比較大(4.0 eV以上)之金屬膜所構成。作為此種金屬膜,例如,可列舉Ag、Pt、Au等金屬膜、或包含該等金屬之合金膜。陽極之反射率及透過率例如可藉由將金屬膜之膜厚控制於數十nm以上之範圍內,而調整為所需之值。 於使陰極兼具反射鏡或輸出鏡之功能之情形時,陰極較佳為由可見光之吸收較小、反射率較高、且功函數比較小之金屬膜所構成。作為此種金屬膜,例如,可列舉Al、Mg等金屬膜、或包含該等金屬之合金膜。陰極之反射率及透過率例如可藉由將金屬膜之膜厚控制於數十nm以上之範圍內,而調整為所需之值。 於將反射鏡或輸出鏡與上述各層及各部分開設置之情形時,較佳為於陽極與有機層之間、或基板與陽極之間形成反射性之膜而作為反射鏡或輸出鏡發揮功能。 於陽極與有機層之間設置反射鏡或輸出鏡之情形時,作為該等之材料,較佳為使用可見光之吸收較小、可獲得較高之反射率、且功函數較大(功函數4.0 eV以上)之導電性材料。具體而言,可使用包括Ag、Pt、Au等金屬、或包含該等金屬之合金之金屬膜作為反射鏡或輸出鏡。該反射鏡或輸出鏡之反射率及透過率例如可藉由將金屬膜之膜厚控制於數十nm以上之範圍內而調整為所需之值。其中,於將此種反射鏡或輸出鏡設置於陽極與有機層之間之情形時,陽極之材料無需為功函數較大者,可廣泛使用公知之電極材料。 於基板與陽極之間設置反射鏡或輸出鏡之情形時,作為該等材料,較佳為使用可見光之吸收較小、可獲得較高之反射率者。具體而言,可使用包括Al、Ag、Pt等金屬、或包含該等金屬之合金之金屬膜、於Al與Si之合金膜上積層Ti膜而得之積層膜、將氧化矽與氧化鈦交替成膜而得之介電體多層膜等作為反射鏡或輸出鏡。其中,金屬膜之反射率及透過率例如可藉由將膜厚控制於數十nm以上之範圍內而調整為所需之值。又,介電體多層膜之反射率及透過率藉由控制氧化矽及氧化鈦之膜厚及積層數而調整為所需之值。 作為反射鏡與輸出鏡之組合,可列舉:輸出鏡為陽極、反射鏡為陰極之組合;輸出鏡為配置於陽極與有機層之間或基板與陽極之間之反射性之膜、反射鏡為陰極之組合;反射鏡為陽極、輸出鏡為陰極之組合;反射鏡為配置於陽極與有機層之間或基板與陽極之間之反射性之膜、輸出鏡為陰極之組合。 於此種共振器構造中,較佳為以介於反射鏡與輸出鏡之間之層之光學膜厚之合計(將各層各自之膜厚乘以折射率而得之值之合計)成為雷射光之半波長之整數倍之方式,設計元件之層構造。藉此,於反射鏡與輸出鏡之間形成駐波,光放大,可獲得強度更高之雷射光。For example, when the anode has the function of a mirror or an output mirror, the anode is preferably composed of a metal film that absorbs less visible light, has a higher reflectivity, and has a relatively large work function (above 4.0 eV). As such a metal film, for example, a metal film such as Ag, Pt, and Au, or an alloy film containing these metals can be cited. The reflectance and transmittance of the anode can be adjusted to desired values by, for example, controlling the thickness of the metal film within a range of tens of nm or more. When the cathode has the function of a mirror or an output mirror, the cathode is preferably composed of a metal film that absorbs less visible light, has a higher reflectivity, and has a smaller work function. As such a metal film, for example, metal films such as Al and Mg, or alloy films containing these metals can be cited. The reflectance and transmittance of the cathode can be adjusted to desired values by, for example, controlling the thickness of the metal film within a range of tens of nm or more. When the reflector or output mirror is separated from the above-mentioned layers and parts, it is preferable to form a reflective film between the anode and the organic layer or between the substrate and the anode to function as a reflector or output mirror . When a reflecting mirror or an output mirror is provided between the anode and the organic layer, as these materials, it is better to use visible light that absorbs less, obtains higher reflectivity, and has a larger work function (work function 4.0 eV and above) conductive materials. Specifically, a metal film including metals such as Ag, Pt, Au, or an alloy containing these metals can be used as a reflecting mirror or an output mirror. The reflectance and transmittance of the reflecting mirror or the output mirror can be adjusted to desired values by, for example, controlling the thickness of the metal film within a range of tens of nm or more. Among them, when the reflector or output mirror is arranged between the anode and the organic layer, the material of the anode does not need to be a material with a larger work function, and known electrode materials can be widely used. When a reflecting mirror or an output mirror is provided between the substrate and the anode, as these materials, it is preferable to use those that absorb less visible light and can obtain higher reflectivity. Specifically, a metal film including metals such as Al, Ag, Pt, or an alloy containing these metals, a laminated film obtained by laminating a Ti film on an alloy film of Al and Si, and alternating silicon oxide and titanium oxide can be used The dielectric multilayer film formed by the film is used as a reflecting mirror or an output mirror. Among them, the reflectance and transmittance of the metal film can be adjusted to desired values by, for example, controlling the film thickness within a range of tens of nm or more. In addition, the reflectance and transmittance of the dielectric multilayer film are adjusted to desired values by controlling the film thickness and the number of layers of silicon oxide and titanium oxide. As a combination of a reflector and an output mirror, one can include: the output mirror is an anode and the reflector is a cathode; the output mirror is a reflective film arranged between the anode and the organic layer or between the substrate and the anode, and the reflector is The combination of the cathode; the reflection mirror is the combination of the anode and the output mirror the cathode; the reflection mirror is the reflective film arranged between the anode and the organic layer or between the substrate and the anode, and the output mirror is the combination of the cathode. In this type of resonator structure, it is preferable to use the total optical film thickness of the layers between the reflector and the output mirror (the total of the values obtained by multiplying the respective film thickness of each layer by the refractive index) as the laser light To design the layer structure of the component in the way of integer multiples of the half wavelength. Thereby, a standing wave is formed between the reflecting mirror and the output mirror, the light is amplified, and a higher intensity laser light can be obtained.

又,以上之共振器構造係於相對於基板之主面垂直之方向使雷射光往復者,共振器構造亦可為於相對於基板之主面水平之方向使雷射光往復者。此種共振器構造可藉由利用有機層與空氣之折射率差而得之反射,將有機層之端面構成為反射鏡或輸出鏡。又,亦可設為於發光層附近以λ/2n(λ:光之波長,n:1以上之整數)之光柵間隔設置繞射光柵,使發光層中產生之光藉由繞射光柵之光柵間隔週期性反射。於本發明中,可採取自有機層之端面發光之態樣、與於垂直於有機層(基板)之方向發光之態樣之兩者。例如,可例示於基板上形成二維DFB(distributed feedback,分散式回饋)繞射光柵構造而於垂直於基板之方向發光之態樣。In addition, the above resonator structure is one that reciprocates the laser light in a direction perpendicular to the main surface of the substrate, and the resonator structure can also be one that reciprocates the laser light in a direction horizontal to the main surface of the substrate. This kind of resonator structure can use the reflection obtained by the refractive index difference between the organic layer and the air, and the end surface of the organic layer can be configured as a reflecting mirror or an output mirror. In addition, it is also possible to set a diffraction grating at a grating interval of λ/2n (λ: wavelength of light, n: an integer greater than 1) near the light-emitting layer, so that the light generated in the light-emitting layer passes through the grating of the diffraction grating Periodic reflections at intervals. In the present invention, both the aspect of emitting light from the end surface of the organic layer and the aspect of emitting light in the direction perpendicular to the organic layer (substrate) can be adopted. For example, it can be exemplified that a two-dimensional DFB (distributed feedback) diffraction grating structure is formed on a substrate to emit light in a direction perpendicular to the substrate.

[ASE閾值] 本說明書中之「ASE閾值」意指,對作為對象之薄膜照射激發光而測定發光強度之激發光強度依存性、將該激發光強度與發光強度之關係視作一次函數時,其斜率變化處之激發光強度。其中,作為對象之薄膜可為電流激發型有機半導體雷射元件所具有之發光層,亦可為光激發型有機雷射元件所具有之發光層。又,發光層可僅由通式(1)所表示之化合物所構成,亦可包含由通式(1)所表示之化合物及主體材料。關於「ASE閾值」之具體之測定條件,可參照實施例之欄。 對於有機半導體雷射元件所具有之發光層,該ASE閾值較佳為20 μJ/cm2 以下,更佳為10 μJ/cm2 以下,進而較佳為5 μJ/cm2 以下,特佳為1 μJ/cm2 以下。[ASE Threshold] The "ASE threshold" in this specification means when the excitation light is irradiated to the target film to measure the dependence of the excitation light intensity on the emission intensity, and the relationship between the excitation light intensity and the emission intensity is regarded as a linear function, The intensity of the excitation light where the slope changes. Among them, the target thin film may be a light-emitting layer of a current-excited organic semiconductor laser element, or a light-emitting layer of a light-excited organic laser element. In addition, the light-emitting layer may be composed only of the compound represented by the general formula (1), or may include the compound and the host material represented by the general formula (1). For the specific measurement conditions of "ASE threshold", please refer to the column of Examples. For the light-emitting layer of an organic semiconductor laser device, the ASE threshold is preferably 20 μJ/cm 2 or less, more preferably 10 μJ/cm 2 or less, still more preferably 5 μJ/cm 2 or less, particularly preferably 1 μJ/cm 2 or less.

[ASE閾值時之發光波峰之半峰全幅值] 本說明書中之「ASE閾值時之發光波峰之半峰全幅值」意指,對發光層以與ASE閾值對應之強度照射激發光並觀測發光光譜時,該發光光譜中出現之發光波峰之中,強度最大之發光波峰之半峰全幅值。其中,關於作為對象之薄膜之說明,可參照ASE閾值中之關於薄膜之說明。 對於有機半導體雷射元件所具有之發光層,該ASE閾值時之發光波峰之半峰全幅值較佳為未達30 nm,更佳為未達20 nm,進而較佳為未達15 nm。[Full amplitude at half peak of luminous wave peak at ASE threshold] In this specification, "the half-peak full amplitude of the luminescence peak at the ASE threshold" means that when the luminescent layer is irradiated with excitation light at an intensity corresponding to the ASE threshold and the luminescence spectrum is observed, among the luminescence peaks appearing in the luminescence spectrum , The full amplitude of the half-peak of the peak of the highest intensity. Among them, for the description of the target film, please refer to the description of the film in the ASE threshold. For the light-emitting layer of the organic semiconductor laser device, the half-peak full amplitude of the light-emitting peak at the ASE threshold is preferably less than 30 nm, more preferably less than 20 nm, and more preferably less than 15 nm.

如上所述之有機半導體雷射元件可藉由於陽極與陰極之間流過閾值電流密度以上之電流而發射雷射光。此時,於本發明之有機半導體雷射元件中,因包含由通式(1)所表示之化合物,故閾值電流密度較低,因此,能以比較低之電流密度發射雷射光,可獲得優異之雷射特性。The organic semiconductor laser device as described above can emit laser light due to the current above the threshold current density flowing between the anode and the cathode. At this time, since the organic semiconductor laser element of the present invention contains the compound represented by the general formula (1), the threshold current density is low. Therefore, the laser light can be emitted at a relatively low current density, and excellent The laser characteristics.

於製作本發明之有機半導體雷射元件時,由通式(1)所表示之化合物不僅可用於發光層,亦可用於除發光層以外之層。此時,發光層中所用之由通式(1)所表示之化合物、與除發光層以外之層中所用之由通式(1)所表示之化合物可相同,亦可不同。例如,亦可將由通式(1)所表示之化合物用於上述注入層、阻擋層、電洞阻擋層、電子阻擋層、激子阻擋層、電洞傳輸層、電子傳輸層等。該等層之製膜方法並未特別限定,可藉由乾式製程、濕式製程之任一製程製作。由於由通式(1)所表示之化合物之穩定性較高,故即便於乾式製程中結構亦保持穩定,不論何種成膜方法,均可充分體現出該結構之性能。 [實施例]When manufacturing the organic semiconductor laser device of the present invention, the compound represented by the general formula (1) can be used not only in the light-emitting layer, but also in layers other than the light-emitting layer. In this case, the compound represented by general formula (1) used in the light-emitting layer and the compound represented by general formula (1) used in layers other than the light-emitting layer may be the same or different. For example, the compound represented by the general formula (1) can also be used for the injection layer, barrier layer, hole barrier layer, electron barrier layer, exciton barrier layer, hole transport layer, electron transport layer, and the like. The film forming method of these layers is not particularly limited, and can be produced by any process of dry process and wet process. Due to the high stability of the compound represented by the general formula (1), the structure remains stable even in the dry process, and the performance of the structure can be fully demonstrated regardless of the film forming method. [Example]

以下列舉實施例對本發明之特徵進而具體地進行說明。以下所示之材料、處理內容、處理步序等可於不脫離本發明之趣旨之範圍內適當變更。因此,本發明之範圍不應藉由以下所示之具體例所限定性地說明。再者,發光特性之評價使用螢光分光光度計(日本分光公司製造:FP-8600)、絕對PL量子產率測定裝置(濱松光子公司製造:C11347-01)、多通道分光器(濱松光子公司製造:PMA-12)、螢光壽命測定裝置(濱松光子公司製造:Quantaurus-Tau C11367-03)進行。又,熱穩定性之評價係使用熱重量-示差熱同步測定裝置(Bruker公司製造:TG-DTA 2400SA)進行。進而,亦使用核磁共振裝置(Bruker公司製造:AVANCE III 500 MHz spectrometer)及電化學測定(BAS公司製造:BAS 608D+DPV Electrochemical system)。Examples are listed below to further specifically describe the features of the present invention. The materials, processing contents, processing steps, etc. shown below can be appropriately changed without departing from the scope of the present invention. Therefore, the scope of the present invention should not be limitedly illustrated by the specific examples shown below. In addition, the luminescence characteristics were evaluated using a fluorescent spectrophotometer (manufactured by JASCO Corporation: FP-8600), absolute PL quantum yield measuring device (manufactured by Hamamatsu Optical Co., Ltd.: C11347-01), and multi-channel spectrometer (Hamamatsu Optical Co., Ltd.) Manufacturing: PMA-12), fluorescence lifetime measurement device (manufactured by Hamamatsu Kogyo Co., Ltd.: Quantaurus-Tau C11367-03). In addition, the thermal stability was evaluated using a thermogravimetric-differential thermal synchronous measuring device (manufactured by Bruker: TG-DTA 2400SA). Furthermore, a nuclear magnetic resonance device (manufactured by Bruker: AVANCE III 500 MHz spectrometer) and electrochemical measurement (manufactured by BAS: BAS 608D + DPV Electrochemical system) were also used.

[1]化合物之合成 (合成例1)化合物1之合成 [化14]

Figure 02_image037
[1] Synthesis of Compound (Synthesis Example 1) Synthesis of Compound 1 [Chemical 14]
Figure 02_image037

於氮氣氛圍下,將N,N-二甲基甲醯胺(200 mL)及3-溴苯酚(30.0 g,174 mmol)置於三口燒瓶中,藉由冰浴冷卻至0℃後,添加氫化鈉(12.8 g,320 mmol),滴加1-溴-2,2-二乙氧基乙烷(31.5 g,209 mmol),於150℃下攪拌5小時。反應結束後,將反應液冷卻至室溫,添加水後,藉由二乙醚進行萃取。將該有機層藉由硫酸鈉進行乾燥,減壓蒸餾去除溶劑。對於該殘留物(反應產物),使用己烷:二氯甲烷=1:1之混合溶劑作為展開溶劑,並藉由矽膠管柱層析法進行分離、精製,從而以產量42.8 g、產率85.1%獲得中間物1之透明之油狀液體。1 H NMR (500 MHz, CDCl3 ): δ 7.07-7.15 (m, 3H), 6.84-6.88 (m, 1H), 4.81 (BPBF-1H), 3.98-4.00 (d, J = 5.0 Hz, 2H), 3.72-3.79 (m, 2H), 3.59-3.63 (m, 2H), 1.25 (t, J = 7.1 Hz, 6H).Under a nitrogen atmosphere, put N,N-dimethylformamide (200 mL) and 3-bromophenol (30.0 g, 174 mmol) in a three-necked flask. After cooling to 0°C in an ice bath, add hydrogenation Sodium (12.8 g, 320 mmol), 1-bromo-2,2-diethoxyethane (31.5 g, 209 mmol) was added dropwise, and the mixture was stirred at 150°C for 5 hours. After the reaction was completed, the reaction liquid was cooled to room temperature, water was added, and extraction was performed with diethyl ether. The organic layer was dried with sodium sulfate, and the solvent was distilled off under reduced pressure. For the residue (reaction product), a mixed solvent of hexane:dichloromethane=1:1 was used as the developing solvent, and the silica gel column chromatography was used to separate and purify the residue (reaction product) to obtain a yield of 42.8 g and a yield of 85.1 % Obtain the transparent oily liquid of Intermediate 1. 1 H NMR (500 MHz, CDCl 3 ): δ 7.07-7.15 (m, 3H), 6.84-6.88 (m, 1H), 4.81 (BPBF-1H), 3.98-4.00 (d, J = 5.0 Hz, 2H) , 3.72-3.79 (m, 2H), 3.59-3.63 (m, 2H), 1.25 (t, J = 7.1 Hz, 6H).

[化15]

Figure 02_image039
[化15]
Figure 02_image039

將β錫沸石(觸媒,4.16 g)置於三口燒瓶中,進行氮氣置換後,將中間物1(12.0 g,41.7 mmol)溶解於三氟化苯(200 mL)中並注入燒瓶內,於112℃下攪拌72小時。對反應液進行過濾,將殘渣藉由三氟化苯洗淨,自所得之濾液減壓蒸餾去除溶劑。對於該殘留物(反應產物),使用己烷作為展開溶劑,並藉由矽膠管柱層析法進行分離、精製,從而以產量4.24 g、產率52.0%獲得中間物2之透明之油狀液體。1 H NMR (500 MHz, CDCl3 ): δ 7.71 (s, 1H), 7.62 (d,J = 2.7 Hz, 1H), 7.49 (d,J = 9.6 Hz, 1H), 7.38 (d,J = 2.7 Hz, 1H), 6.76 (d,J = 2.7 Hz, 1H).Put β tin zeolite (catalyst, 4.16 g) in a three-necked flask and replace with nitrogen. Dissolve intermediate 1 (12.0 g, 41.7 mmol) in benzene trifluoride (200 mL) and pour it into the flask. Stir at 112°C for 72 hours. The reaction liquid was filtered, the residue was washed with benzene trifluoride, and the solvent was distilled off the obtained filtrate under reduced pressure. For the residue (reaction product), hexane was used as the developing solvent, and the silica gel column chromatography was used to separate and purify the residue (reaction product) to obtain a transparent oily liquid of intermediate 2 with a yield of 4.24 g and a yield of 52.0%. . 1 H NMR (500 MHz, CDCl 3 ): δ 7.71 (s, 1H), 7.62 (d, J = 2.7 Hz, 1H), 7.49 (d, J = 9.6 Hz, 1H), 7.38 (d, J = 2.7 Hz, 1H), 6.76 (d, J = 2.7 Hz, 1H).

[化16]

Figure 02_image041
[化16]
Figure 02_image041

將中間物2(4.11 g,20.9 mmol)、咔唑(Cz,5.12 g,30.6 mmol)、乙酸鈀(Pd(OAc)2 ,0.16 g,0.713 mmol)及碳酸鉀(3.58 g,25.9 mmol)置於三口燒瓶中,進行氮氣置換後,添加甲苯(150 mL)、三-第三丁基膦(0.732 g,3.62 mmol),於120℃下攪拌48小時。於反應液中添加水,藉由乙酸乙酯進行萃取後,將所得之有機層藉由硫酸鈉進行乾燥,減壓蒸餾去除溶劑。對於該殘留物(反應產物),使用己烷:二氯甲烷=1:1之混合溶劑作為展開溶劑,並藉由矽膠管柱層析法進行分離、精製,從而以產量3.66 g、產率61.6%獲得中間物3之透明之油狀液體。1 H NMR (500 MHz, CDCl3 ): δ 8.17 (d,J = 7.9 Hz, 2H), 7.80 (d,J = 8.2 Hz, 1H), 7.76 (d,J = 2.2 Hz, 1H), 7.73 (s,1H), 7.45 (dd,J = 8.2, 1.9 Hz, 1H), 7.41-7.43 (m, 4H), 7.28-7.32 (m, 2H), 6.91 (dd,J = 2.2 Hz, 1H);13 C NMR (CHCl3 ): δ 155.3, 146.3, 141.3, 134.2, 126.9, 125.9, 123.3, 122.4, 122.0, 120.3, 120.0, 110.6, 109.8, 106.7; Anal. Calcd for C20 H13 NO: C, 84.78; H, 4.62; N, 4.94. Found: C, 84.65; H, 4.61.Intermediate 2 (4.11 g, 20.9 mmol), carbazole (Cz, 5.12 g, 30.6 mmol), palladium acetate (Pd(OAc) 2 , 0.16 g, 0.713 mmol) and potassium carbonate (3.58 g, 25.9 mmol) were put together In a three-necked flask, after nitrogen substitution, toluene (150 mL) and tri-tert-butylphosphine (0.732 g, 3.62 mmol) were added, and the mixture was stirred at 120°C for 48 hours. Water was added to the reaction liquid, and after extraction with ethyl acetate, the obtained organic layer was dried with sodium sulfate, and the solvent was distilled off under reduced pressure. For the residue (reaction product), a mixed solvent of hexane:dichloromethane=1:1 was used as the developing solvent, and was separated and purified by silica gel column chromatography, so that the yield was 3.66 g and the yield was 61.6. % Obtain the transparent oily liquid of intermediate 3. 1 H NMR (500 MHz, CDCl 3 ): δ 8.17 (d, J = 7.9 Hz, 2H), 7.80 (d, J = 8.2 Hz, 1H), 7.76 (d, J = 2.2 Hz, 1H), 7.73 ( s,1H), 7.45 (dd, J = 8.2, 1.9 Hz, 1H), 7.41-7.43 (m, 4H), 7.28-7.32 (m, 2H), 6.91 (dd, J = 2.2 Hz, 1H); 13 C NMR (CHCl 3 ): δ 155.3, 146.3, 141.3, 134.2, 126.9, 125.9, 123.3, 122.4, 122.0, 120.3, 120.0, 110.6, 109.8, 106.7; Anal. Calcd for C 20 H 13 NO: C, 84.78; H, 4.62; N, 4.94. Found: C, 84.65; H, 4.61.

[化17]

Figure 02_image043
[化17]
Figure 02_image043

將中間物3(0.496 g,1.75 mmol)溶解於四氫呋喃(10 mL),並置於預先進行氬氣置換之三口燒瓶中,冷卻至-40℃後,滴加正丁基鋰(n-BuLi,1.6 M,1.64 mL,2.63 mmol),攪拌1小時。於該混合物中滴加將碘(0.724 g,2.85 mmol)溶解於四氫呋喃(10 mL)而得之溶液後,恢復至室溫,進而攪拌12小時。於該反應液中添加飽和之硫代硫酸鈉水溶液(20 mL)後,減壓蒸餾去除溶劑,藉由乙酸乙酯進行萃取。將有機層藉由硫酸鈉進行乾燥,進而減壓蒸餾去除溶劑。對於該殘留物(反應產物),使用二氯甲烷作為展開溶劑,並藉由矽膠管柱層析法進行分離、精製,從而以產量0.734 g獲得中間物4之透明之油狀液體。1 H NMR (500 MHz, CDCl3 ): δ 8.16 (s, 1H) , 8.15 (t,J = 0.95, 1H) 7.71 (s, 1H) 7.69-7.70 (m, 2H), 7.39-7.45 (m, 4H), 7.28-7.32 (m, 2H), 7.09 (d,J = 0.95 Hz, 1H);13 C NMR (CHCl3 ): δ 158.4, 141.1, 134.2, 128.6, 126.0, 123.4, 122.7, 120.4, 120.3, 120.1, 117.3, 110.0, 110.0, 97.1; Anal. Calcd for C20 H12 INO: C, 58.70; H, 2.96; N, 3.42. Found: C, 58.47; H, 2.99; N, 3.25.Intermediate 3 (0.496 g, 1.75 mmol) was dissolved in tetrahydrofuran (10 mL) and placed in a three-necked flask previously replaced with argon. After cooling to -40°C, n-butyllithium (n-BuLi, 1.6 M, 1.64 mL, 2.63 mmol), stir for 1 hour. A solution obtained by dissolving iodine (0.724 g, 2.85 mmol) in tetrahydrofuran (10 mL) was added dropwise to this mixture, and the mixture was returned to room temperature and further stirred for 12 hours. After adding saturated sodium thiosulfate aqueous solution (20 mL) to the reaction solution, the solvent was distilled off under reduced pressure, and extraction was performed with ethyl acetate. The organic layer was dried with sodium sulfate, and the solvent was distilled off under reduced pressure. The residue (reaction product) was separated and purified by silica gel column chromatography using dichloromethane as a developing solvent to obtain a transparent oily liquid of intermediate 4 with a yield of 0.734 g. 1 H NMR (500 MHz, CDCl 3 ): δ 8.16 (s, 1H), 8.15 (t, J = 0.95, 1H) 7.71 (s, 1H) 7.69-7.70 (m, 2H), 7.39-7.45 (m, 4H), 7.28-7.32 (m, 2H), 7.09 (d, J = 0.95 Hz, 1H); 13 C NMR (CHCl 3 ): δ 158.4, 141.1, 134.2, 128.6, 126.0, 123.4, 122.7, 120.4, 120.3 , 120.1, 117.3, 110.0, 110.0, 97.1; Anal. Calcd for C 20 H 12 INO: C, 58.70; H, 2.96; N, 3.42. Found: C, 58.47; H, 2.99; N, 3.25.

[化18]

Figure 02_image045
[化18]
Figure 02_image045

將4,4'-聯苯基二硼酸(0.169 g,0.698 mmol)及四(三苯基膦)鈀(0)(Pd(PPh3 )4 ,0.226 g,0.196 mmol)置於二口燒瓶中,進行氮氣置換後,將中間物4(0.730 g,1.78 mmol)溶解於甲苯(50 mL)而添加,繼而將碳酸鉀(0.436 g,3.15 mmol)溶解於水(50 mL)而添加,進行40小時回流。對反應液進行過濾,將殘渣藉由二氯甲烷及鹼水溶液洗淨後,溶解於鄰二氯苯(30 mL),加熱至180℃使其溶解。於該溶液中添加甲醇,過濾提取所析出之固體,藉此,以產量0.063 g、產率12.2%獲得目標化合物1之黃色固體。1 H NMR (500 MHz, CDCl3 ): δ 8.17 (dd,J = 8.5, 1.0 Hz, 4H), 8.04 (d,J = 8.5 Hz, 4H), 7.82-7.84 (m, 6H), 7.72 (s, 2H), 7.47 (dd,J = 10.1, 1.9 Hz, 6H), 7.42-7.46 (m, 4H) 7.29-7.33 (t, 4H), 7.27 (d,J = 0.95 Hz, 2H); Anal. Calcd for C52 H32 N2 O2 : C, 87.13; H, 4.50; N, 3.91. Found: C, 86.86; H, 4.46; N, 3.83.Place 4,4'-biphenyl diboronic acid (0.169 g, 0.698 mmol) and tetrakis(triphenylphosphine) palladium(0) (Pd(PPh 3 ) 4 , 0.226 g, 0.196 mmol) in a two-necked flask After nitrogen replacement, intermediate 4 (0.730 g, 1.78 mmol) was dissolved in toluene (50 mL) and added, and then potassium carbonate (0.436 g, 3.15 mmol) was dissolved in water (50 mL) and added. Reflux for hours. The reaction liquid was filtered, and the residue was washed with dichloromethane and an alkaline aqueous solution, then dissolved in o-dichlorobenzene (30 mL), and heated to 180°C to dissolve it. Methanol was added to the solution, and the precipitated solid was filtered and extracted, thereby obtaining the target compound 1 as a yellow solid with a yield of 0.063 g and a yield of 12.2%. 1 H NMR (500 MHz, CDCl 3 ): δ 8.17 (dd, J = 8.5, 1.0 Hz, 4H), 8.04 (d, J = 8.5 Hz, 4H), 7.82-7.84 (m, 6H), 7.72 (s , 2H), 7.47 (dd, J = 10.1, 1.9 Hz, 6H), 7.42-7.46 (m, 4H) 7.29-7.33 (t, 4H), 7.27 (d, J = 0.95 Hz, 2H); Anal. Calcd for C 52 H 32 N 2 O 2 : C, 87.13; H, 4.50; N, 3.91. Found: C, 86.86; H, 4.46; N, 3.83.

(合成例2)化合物2之合成 [化19]

Figure 02_image047
(Synthesis Example 2) Synthesis of Compound 2 [Chemical Formula 19]
Figure 02_image047

將藉由與合成例1相同之步驟所得之中間物2(1.03 g,5.26 mmol)、雙(頻那醇酯)二硼烷(B2 pin2 ,0.645 g,2.54 mmol)、雙(二苯基膦)二茂鐵]二氯鈀(II)(PdCl2 (dppf),0.150 g,0.205 mmol)、碳酸鉀(2.13 g,15.4 mmol)置於二口燒瓶中,進行氮氣置換後,添加二甲基亞碸(30 mL),於80℃下攪拌24小時。將該反應液冷卻至室溫,添加水,過濾提取析出物。對於該析出物,使用己烷:二氯甲烷=9:1之混合溶劑作為展開溶劑,並藉由矽膠管柱層析法進行分離、精製,從而以產量0.379 g、產率62.0%獲得中間物5之無色固體。1 H NMR (500 MHz, CDCl3 ): δ 7.78 (s , 2H), 7.65–7.67 (m, 4H), 7.55 (dd,J = 8.2, 1.6 Hz, 2H), 6.81 (dd,J = 1.1 Hz, 2H);13 C NMR (CHCl3 ): δ 155.8, 145.6, 138.3, 126.7, 122.8, 121.4, 110.3, 106.6; Anal. Calcd for C16 H10 O2 : C, 82.04; H, 4.30. Found: C, 81.97; H, 4.46.Intermediate 2 (1.03 g, 5.26 mmol), bis(pinacol ester) diborane (B 2 pin 2 , 0.645 g, 2.54 mmol), bis(diphenyl) obtained by the same procedure as Synthesis Example 1 Phosphine) ferrocene] dichloropalladium (II) (PdCl 2 (dppf), 0.150 g, 0.205 mmol), potassium carbonate (2.13 g, 15.4 mmol) are placed in a two-necked flask, after nitrogen replacement, add two Methyl sulfoxide (30 mL), stirred at 80°C for 24 hours. The reaction liquid was cooled to room temperature, water was added, and the precipitate was filtered and extracted. For the precipitate, a mixed solvent of hexane: dichloromethane = 9:1 was used as the developing solvent, and was separated and purified by silica gel column chromatography, thereby obtaining an intermediate with a yield of 0.379 g and a yield of 62.0% 5 is a colorless solid. 1 H NMR (500 MHz, CDCl 3 ): δ 7.78 (s, 2H), 7.65–7.67 (m, 4H), 7.55 (dd, J = 8.2, 1.6 Hz, 2H), 6.81 (dd, J = 1.1 Hz , 2H); 13 C NMR (CHCl 3 ): δ 155.8, 145.6, 138.3, 126.7, 122.8, 121.4, 110.3, 106.6; Anal. Calcd for C 16 H 10 O 2 : C, 82.04; H, 4.30. Found: C, 81.97; H, 4.46.

[化20]

Figure 02_image049
[化20]
Figure 02_image049

將中間物5(0.315 g,1.35 mmol)溶解於四氫呋喃(10 mL),並置於預先進行氬氣置換之三口燒瓶中,冷卻至-40℃後,滴加正丁基鋰(n-BuLi,1.6 M,2.80 mL,4.34 mmol),攪拌1小時。於該混合物中滴加將碘(1.03 g,4.06 mmol)溶解於四氫呋喃(10 mL)而得之溶液後,恢復至室溫,進而攪拌12小時。於該反應液中添加飽和之硫代硫酸鈉水溶液(20 mL)後,減壓蒸餾去除溶劑,藉由乙酸乙酯進行萃取。將有機層藉由硫酸鈉進行乾燥,進而減壓蒸餾去除溶劑。對於殘留物(反應產物),使用二氯甲烷作為展開溶劑,並藉由矽膠管柱層析法進行分離、精製,從而以產量0.506 g、產率77.5%獲得中間物6之無色固體。1 H NMR (500 MHz, CDCl3 ): δ 7.70 (s, 2 H), 7.57 (d,J = 8.2, 2H), 7.49 (dd,J = 8.2, 1.6 Hz, 2H), 6.99 (d,J = 0.95 Hz, 2H);13 C NMR (CHCl3 ): δ 161.6, 140.4, 131.2, 125.7, 122.6, 119.9, 112.3, 99.0.Intermediate 5 (0.315 g, 1.35 mmol) was dissolved in tetrahydrofuran (10 mL) and placed in a three-necked flask previously replaced with argon. After cooling to -40°C, n-butyllithium (n-BuLi, 1.6 M, 2.80 mL, 4.34 mmol), stir for 1 hour. A solution obtained by dissolving iodine (1.03 g, 4.06 mmol) in tetrahydrofuran (10 mL) was added dropwise to this mixture, and the mixture was returned to room temperature and further stirred for 12 hours. After adding saturated sodium thiosulfate aqueous solution (20 mL) to the reaction solution, the solvent was distilled off under reduced pressure, and extraction was performed with ethyl acetate. The organic layer was dried with sodium sulfate, and the solvent was distilled off under reduced pressure. For the residue (reaction product), dichloromethane was used as the developing solvent, and the silica gel column chromatography was used to separate and refine the colorless solid of Intermediate 6 with a yield of 0.506 g and a yield of 77.5%. 1 H NMR (500 MHz, CDCl 3 ): δ 7.70 (s, 2 H), 7.57 (d, J = 8.2, 2H), 7.49 (dd, J = 8.2, 1.6 Hz, 2H), 6.99 (d, J = 0.95 Hz, 2H); 13 C NMR (CHCl 3 ): δ 161.6, 140.4, 131.2, 125.7, 122.6, 119.9, 112.3, 99.0.

[化21]

Figure 02_image051
[化21]
Figure 02_image051

將4-(9H-咔唑-9-基)苯硼酸(1.06 g,3.69 mmol)、四(三苯基膦)鈀(0)(Pd(PPh3 )4 ,0.124 g,0.107 mmol)置於二口燒瓶中,進行氮氣置換後,將中間物6(0.510 g,1.04 mmol)溶解於甲苯(50 mL)而添加,繼而將碳酸鉀(1.20 g,8.68 mmol)溶解於水(50 mL)而添加,進行48小時回流。對反應液進行過濾,將殘渣藉由二氯甲烷及鹼水溶液洗淨後,溶解於鄰二氯苯(30 mL),加熱至180℃使其溶解。對該溶液進行過濾而去除觸媒,添加甲醇,過濾提取所析出之固體,藉此,以產量0.464 g、產率62.2%獲得目標化合物2之黃色固體。1 H NMR (500 MHz, CDCl3 ): δ 8.17 (d,J = 8.5, 8H), 7.92 (s, 2H), 7.71-7.77 (m, 6H), 7.67 (dd,J = 8.2, 1.6 Hz, 2H), 7.52 (d,J = 8.2 Hz, 4H), 7.43-7.47 (m, 4H) 7.30-7.33 (m, 4H), 7.24 (d,J = 0.63 Hz, 2H);13 C NMR (CHCl3 ): δ 155.8, 140.6, 138.2, 137.8, 129.3, 128.5, 127.3, 126.3, 126.0, 123.5, 122.9, 121.3, 120.3, 120.1, 109.8, 109.6, 101.9; Anal. Calcd for C52 H32 N2 O2 : C, 87.13; H, 4.50; N, 3.91. Found: C, 86.99; H, 4.51; N, 3.67.Place 4-(9H-carbazol-9-yl)phenylboronic acid (1.06 g, 3.69 mmol), tetrakis(triphenylphosphine) palladium(0) (Pd(PPh 3 ) 4 , 0.124 g, 0.107 mmol) in In a two-neck flask, after nitrogen replacement, Intermediate 6 (0.510 g, 1.04 mmol) was dissolved in toluene (50 mL) and added, and potassium carbonate (1.20 g, 8.68 mmol) was dissolved in water (50 mL). Add and reflux for 48 hours. The reaction liquid was filtered, and the residue was washed with dichloromethane and an alkaline aqueous solution, then dissolved in o-dichlorobenzene (30 mL), and heated to 180°C to dissolve it. The solution was filtered to remove the catalyst, methanol was added, and the precipitated solid was filtered and extracted, thereby obtaining the target compound 2 as a yellow solid with a yield of 0.464 g and a yield of 62.2%. 1 H NMR (500 MHz, CDCl 3 ): δ 8.17 (d, J = 8.5, 8H), 7.92 (s, 2H), 7.71-7.77 (m, 6H), 7.67 (dd, J = 8.2, 1.6 Hz, 2H), 7.52 (d, J = 8.2 Hz, 4H), 7.43-7.47 (m, 4H) 7.30-7.33 (m, 4H), 7.24 (d, J = 0.63 Hz, 2H); 13 C NMR (CHCl 3 ): δ 155.8, 140.6, 138.2, 137.8, 129.3, 128.5, 127.3, 126.3, 126.0, 123.5, 122.9, 121.3, 120.3, 120.1, 109.8, 109.6, 101.9; Anal.Calcd for C 52 H 32 N 2 O 2 : C, 87.13; H, 4.50; N, 3.91. Found: C, 86.99; H, 4.51; N, 3.67.

[2]評價 對於所合成之各化合物及下述之BSB-Cz(比較化合物),進行穩定性及發光特性之評價。 [化22]

Figure 02_image053
[2] Evaluation The stability and luminescence characteristics of each compound synthesized and the following BSB-Cz (comparative compound) were evaluated. [化22]
Figure 02_image053

(穩定性之評價) 對於化合物1、2及BSB-Cz,分別藉由真空蒸鍍法以10-4 ~10-5 Pa之真空度形成蒸鍍膜後,使其熔融,其後,進行NMR分析。又,與此不同,使化合物1、2及BSB-Cz分別昇華後,進行NMR分析。其中,由於昇華裝置內之壓力高於真空蒸鍍裝置內之壓力,故而昇華溫度高於真空蒸鍍法之蒸發溫度。 進行NMR分析,其結果,BSB-Cz之情形時,於蒸鍍膜之熔融後測定之NMR光譜中,觀測到真空蒸鍍前之NMR光譜中未見之較小之波峰,確認雜質生成。又,於昇華後測定之NMR光譜中,進而觀測到新之雜質波峰,其中亦確認有來自苯基咔唑之波峰。由此可知,BSB-Cz藉由真空蒸鍍或昇華等熱製程而生成雜質,特別是於昇華之情形時,分解充分進行。另一方面,化合物1、2之情形時,於蒸鍍膜之熔融後或昇華後測定之NMR光譜中確認無來自分解物之波峰,分解受到抑制。 又,對於化合物1、2及BSB-Cz,進行1 Pa下之熱重量測定(TG)及1 atm下之熱重量-示差熱測定(TG-DTA),其結果,雖昇華溫度為相同程度,但BSB-Cz之分解溫度為478℃,與此相對,化合物1之分解溫度為539℃,化合物2之分解溫度為543℃,表現出較高之分解溫度。 由以上結果,可確認化合物1、2與BSB-Cz相比熱穩定性特別高。(Evaluation of stability) For compounds 1, 2 and BSB-Cz, a vapor-deposited film was formed by a vacuum vapor deposition method with a vacuum of 10 -4 to 10 -5 Pa, then melted, and then analyzed by NMR . Also, unlike this, after subliming the compounds 1, 2 and BSB-Cz, respectively, NMR analysis was performed. Among them, because the pressure in the sublimation device is higher than the pressure in the vacuum evaporation device, the sublimation temperature is higher than the evaporation temperature of the vacuum evaporation method. NMR analysis was performed. As a result, in the case of BSB-Cz, in the NMR spectrum measured after the vapor deposition film was melted, small peaks not seen in the NMR spectrum before vacuum vapor deposition were observed, and it was confirmed that impurities were generated. In addition, in the NMR spectrum measured after sublimation, new impurity peaks were observed, and the peaks derived from phenylcarbazole were also confirmed. It can be seen that BSB-Cz generates impurities through thermal processes such as vacuum evaporation or sublimation, especially in the case of sublimation, the decomposition proceeds sufficiently. On the other hand, in the case of Compounds 1 and 2, the NMR spectrum measured after melting or sublimation of the vapor-deposited film confirms that there is no peak derived from the decomposition product, and decomposition is suppressed. In addition, for compounds 1, 2 and BSB-Cz, thermogravimetric measurement (TG) at 1 Pa and thermogravimetric-differential thermal measurement (TG-DTA) at 1 atm were performed. As a result, although the sublimation temperature was the same, However, the decomposition temperature of BSB-Cz is 478°C. In contrast, the decomposition temperature of compound 1 is 539°C, and the decomposition temperature of compound 2 is 543°C, showing a higher decomposition temperature. From the above results, it can be confirmed that compounds 1 and 2 have particularly higher thermal stability than BSB-Cz.

(溶液之PL發光特性及電化學特性之評價) 將化合物1、2及BSB-Cz分別溶解於甲苯、氯仿或N,N-二甲基甲醯胺而製備9種溶液。此時,各溶液之濃度設為10-5 M。 對於所製備之各溶液,調查吸收光譜及340 nm激發光下之發光特性。將發光特性之測定結果表示於表1。其中,關於光致發光量子產率(PL量子產率ΦPL )及發光壽命T,表示於大氣下(in air)測定之值及於氮氣氛圍下(in N2 )下測定之值之兩者。(Evaluation of PL luminescence characteristics and electrochemical characteristics of the solution) Compounds 1, 2 and BSB-Cz were dissolved in toluene, chloroform or N,N-dimethylformamide to prepare 9 solutions. At this time, the concentration of each solution is set to 10 -5 M. For each solution prepared, the absorption spectrum and the luminescence characteristics under 340 nm excitation light were investigated. Table 1 shows the measurement results of luminescence characteristics. Among them, the photoluminescence quantum yield (PL quantum yield Φ PL ) and luminescence lifetime T represent both the value measured under the atmosphere (in air) and the value measured under the nitrogen atmosphere (in N 2 ) .

[表1] 化合物No 溶劑 發光極大波長λmax (nm) PL量子產率ΦPL in air(%) PL量子產率ΦPL in N2 (%) 發光壽命T in air(ns) 發光壽命T in N2 (ns) kr ×108 (s-1 ) 化合物1 甲苯 419 94 96 0.93 0.97 9.9 氯仿 423 89 96 1.0 1.1 8.9 N,N-二甲基甲醯胺 447 94 98 1.4 1.4 6.8 化合物2 甲苯 407 94 96 0.89 0.93 10 氯仿 407 94 96 0.95 0.99 9.7 N,N-二甲基甲醯胺 409 96 100 1.02 1.04 9.6 BSB-Cz 甲苯 420 83 89 0.84 0.87 10 氯仿 423 86 88 0.93 0.95 9.3 N,N-二甲基甲醯胺 446 90 96 1.1 1.1 8.5 [Table 1] Compound No Solvent Maximum emission wavelength λ max (nm) PL quantum yieldΦ PL in air(%) PL quantum yieldΦ PL in N 2 (%) Luminous lifetime T in air(ns) Luminous lifetime T in N 2 (ns) k r ×10 8 (s -1 ) Compound 1 Toluene 419 94 96 0.93 0.97 9.9 Chloroform 423 89 96 1.0 1.1 8.9 N,N-Dimethylformamide 447 94 98 1.4 1.4 6.8 Compound 2 Toluene 407 94 96 0.89 0.93 10 Chloroform 407 94 96 0.95 0.99 9.7 N,N-Dimethylformamide 409 96 100 1.02 1.04 9.6 BSB-Cz Toluene 420 83 89 0.84 0.87 10 Chloroform 423 86 88 0.93 0.95 9.3 N,N-Dimethylformamide 446 90 96 1.1 1.1 8.5

化合物1、2及BSB-Cz之各溶液之吸收光譜、發光壽命T及發射速度常數kr很一致。其中,發射速度常數kr與ASE振盪閾值相關,因此,根據該結果表示,化合物1、2表現出與BSB-Cz同樣低之ASE振盪閾值。又,關於發光波峰,任一化合物均為溶劑之極性越大(按N,N-二甲基甲醯胺、氯仿、甲苯之順序)則越向長波長側位移,其位移之程度相同,溶劑相同之情形時,彼此之發光極大波長亦大概相同。另一方面,關於光致發光量子產率,化合物1、2之溶液較BSB-Cz之溶液表現出更高之值。 由此可知,化合物1、2保持與BSB-Cz相同之發光特性,穩定性及量子產率提高,係作為發光材料得以改善者。The absorption spectra, luminescence lifetime T and emission rate constant kr of the solutions of Compound 1, 2 and BSB-Cz are very consistent. Among them, the emission rate constant kr is related to the ASE oscillation threshold. Therefore, according to the results, compounds 1 and 2 exhibit the same low ASE oscillation threshold as BSB-Cz. In addition, regarding the emission peak, the greater the polarity of the solvent for any compound (in the order of N,N-dimethylformamide, chloroform, and toluene), the more it shifts to the longer wavelength side, and the degree of shift is the same. In the same situation, the maximum emission wavelengths of each other are approximately the same. On the other hand, with regard to the photoluminescence quantum yield, the solutions of Compounds 1 and 2 showed higher values than the BSB-Cz solution. From this, it can be seen that Compounds 1 and 2 maintain the same luminescence characteristics as BSB-Cz, improve stability and quantum yield, and are improved as luminescent materials.

又,將化合物1及BSB-Cz分別溶解於二氯甲烷,藉由循環伏安法(CV)及微分脈衝伏安法(DPV)對電化學特性進行測定。將其結果表示於表2。表2中之各值係將基準物質二茂鐵之半波電位設為0所求出者,HOMO(Highest Occupied Molecular Orbital,最高佔有分子軌道)及LUMO(Lowest Unoccupied Molecular Orbital,最低未占分子軌道)之各能階係自藉由CV所測定之氧化電位、還原電位而算出。In addition, compound 1 and BSB-Cz were dissolved in dichloromethane, respectively, and the electrochemical characteristics were measured by cyclic voltammetry (CV) and differential pulse voltammetry (DPV). The results are shown in Table 2. The values in Table 2 are calculated by setting the half-wave potential of the reference material ferrocene to 0, HOMO (Highest Occupied Molecular Orbital) and LUMO (Lowest Unoccupied Molecular Orbital, the lowest unoccupied molecular orbital) The energy levels of) are calculated from the oxidation potential and reduction potential measured by CV.

[表2] 化合物No CV DPV HOMO(eV) LUMO(eV) 氧化還原電位Egredox (eV) 光學帶隙Egopt (eV) 氧化電位Eox (V) 還原電位Ered (V) 氧化電位Eox (V) 還原電位Ered (V) 化合物1 0.77 -2.15 0.71 -2.39 -5.6 -2.7 2.92 2.93 BSB-Cz 0.78 -2.10 0.72 -2.40 -5.6 -2.7 2.88 2.93 [Table 2] Compound No CV DPV HOMO(eV) LUMO(eV) Redox potential Eg redox (eV) Optical band gap Eg opt (eV) Oxidation potential E ox (V) Reduction potential E red (V) Oxidation potential E ox (V) Reduction potential E red (V) Compound 1 0.77 -2.15 0.71 -2.39 -5.6 -2.7 2.92 2.93 BSB-Cz 0.78 -2.10 0.72 -2.40 -5.6 -2.7 2.88 2.93

如表2所示,化合物1及BSB-Cz之氧化電位、還原電位均類似,HOMO及LUMO之各能階亦為相近值。As shown in Table 2, the oxidation potential and reduction potential of compound 1 and BSB-Cz are similar, and the energy levels of HOMO and LUMO are also similar.

(單獨膜之PL發光特性之評價) 於石英基板上藉由真空蒸鍍法於真空度10-4 Pa以下之條件下以100 nm之厚度形成化合物2之薄膜(單獨膜)。又,於相同之條件下,於石英基板上以100 nm之厚度形成BSB-Cz之薄膜(單獨膜)。對於所形成之各薄膜,進行利用原子力顯微鏡之表面粗糙度之評價及利用X射線繞射分析之結晶性之評價,其結果,可知表面粗糙度均較低,均為非晶形。 又,對於各單獨膜,測定340 nm激發光下之發光特性,其結果,BSB-Cz之單獨膜係發光極大波長λmax 為480 nm,大氣下之PL量子產率ΦPL 為69%,大氣下之發光壽命T為1.6 ns,發射速度常數kr 為4.4×108 s-1 。又,化合物2之單獨膜係發光極大波長λmax 為452 nm,大氣下之PL量子產率ΦPL 為79%,氮氣氛圍下之PL量子產率ΦPL 為87%,大氣下之發光壽命T為1.7 ns,氮氣氛圍下之發光壽命T為1.8 ns,發射速度常數kr 為4.7×108 s-1 ,可知PL量子產率及發射速度常數高於BSB-Cz,發光特性得到改善。(Evaluation of PL luminescence characteristics of a single film) A thin film of compound 2 (a single film) with a thickness of 100 nm was formed on a quartz substrate by a vacuum evaporation method under a vacuum of 10 -4 Pa or less. Furthermore, under the same conditions, a thin film of BSB-Cz (individual film) was formed with a thickness of 100 nm on the quartz substrate. For each of the formed thin films, the surface roughness by atomic force microscope and the crystallinity by X-ray diffraction analysis were evaluated. As a result, it was found that the surface roughness was low, and they were all amorphous. In addition, for each individual film, the luminescence characteristics under 340 nm excitation light were measured. As a result, the maximum wavelength λ max of the single film system of BSB-Cz was 480 nm, and the PL quantum yield under the atmosphere Φ PL was 69%. The light-emitting lifetime T is 1.6 ns and the emission rate constant k r is 4.4×10 8 s -1 . In addition, the maximum wavelength λ max of the single film of compound 2 is 452 nm, the PL quantum yield Φ PL under the atmosphere is 79%, the PL quantum yield Φ PL under the nitrogen atmosphere is 87%, and the luminescence lifetime under the atmosphere T The luminescence lifetime T under nitrogen atmosphere is 1.8 ns, and the emission rate constant k r is 4.7×10 8 s -1 . It can be seen that the PL quantum yield and emission rate constant are higher than BSB-Cz, and the luminescence characteristics are improved.

(單獨膜之光耐久性之評價) 對於與PL發光特性之評價中所用者相同之條件下製作之、化合物2之單獨膜及BSB-Cz之單獨膜,自CW(continuous wave,連續波)雷射光源以強度18 μW連續照射405 nm激發光,調查其發光強度之經時變化。將其結果表示於圖2。再者,此處以於各薄膜中激子密度相等之方式調節照射強度。 如圖2所示,於化合物2之單獨膜之情形時,激發光照射期間發光強度保持一定,與此相對,於BSB-Cz之單獨膜之情形時,發光強度經時性減少。由此可知,化合物2與BSB-Cz相比,激發狀態下之穩定性(光耐久性)較高,適合作為激子密度必然變高之雷射材料用之化合物。(Evaluation of light durability of single film) For the single film of compound 2 and the single film of BSB-Cz produced under the same conditions as those used in the evaluation of PL luminescence characteristics, continuous irradiation of 405 nm from a CW (continuous wave) laser light source with an intensity of 18 μW Excite the light and investigate the time-dependent change of its luminous intensity. The results are shown in Fig. 2. Furthermore, the intensity of irradiation is adjusted so that the density of excitons in each thin film is equal. As shown in Figure 2, in the case of a single film of Compound 2, the luminous intensity remains constant during the excitation light irradiation period. In contrast, in the case of a single film of BSB-Cz, the luminous intensity decreases with time. It can be seen that, compared with BSB-Cz, compound 2 has higher stability (light durability) in the excited state, and is suitable as a compound for laser materials whose exciton density is inevitably higher.

(摻雜膜之PL發光特性之評價) 於石英基板上藉由真空蒸鍍法於真空度10-4 Pa以下之條件下自不同之蒸鍍源共蒸鍍化合物2及CBP(4,4'-Bis(N-carbazolyl)-1,1'-biphenyl,4,4'-二(N-咔唑基)聯苯),以130 nm之厚度形成化合物2之濃度為6.0重量%之薄膜(摻雜膜)。又,於相同之條件下,於石英基板上自不同之蒸鍍源共蒸鍍BSB-Cz及CBP,以130 nm之厚度形成BSB-Cz之濃度為6.0重量%之薄膜(摻雜膜)。 對於各摻雜膜,測定340 nm激發光下之發光特性,其結果,BSB-Cz之摻雜膜係發光極大波長λmax 為462 nm,大氣下之PL量子產率ΦPL 為87%,大氣下之發光壽命T為1.1 ns,發射速度常數kr 為7.9×108 s-1 。又,化合物2之摻雜膜係發光極大波長λmax 為445 nm,大氣下及氮氣氛圍下之PL量子產率ΦPL 均為100%,大氣下之發光壽命T為1.3 ns,氮氣氛圍下之發光壽命T為1.6 ns,發射速度常數kr 為7.6×108 s-1 ,相比BSB-Cz之摻雜膜表現出較高之量子產率。(Evaluation of PL luminescence characteristics of doped film) Co-evaporate compound 2 and CBP (4,4') from different evaporation sources on quartz substrate by vacuum evaporation method under the condition of vacuum degree below 10 -4 Pa -Bis(N-carbazolyl)-1,1'-biphenyl, 4,4'-bis(N-carbazolyl) biphenyl), with a thickness of 130 nm to form a thin film of compound 2 with a concentration of 6.0% by weight (doped Miscellaneous film). In addition, under the same conditions, BSB-Cz and CBP were co-evaporated from different evaporation sources on the quartz substrate to form a thin film (doped film) with a BSB-Cz concentration of 6.0 wt% with a thickness of 130 nm. For each doped film, the luminescence characteristics under 340 nm excitation light were measured. As a result, the maximum wavelength λ max of the doped film of BSB-Cz was 462 nm, and the PL quantum yield under the atmosphere Φ PL was 87%. The light-emitting lifetime T is 1.1 ns, and the emission rate constant k r is 7.9×10 8 s -1 . In addition, the maximum wavelength λ max of the doped film of compound 2 is 445 nm, the PL quantum yield Φ PL under the atmosphere and nitrogen atmosphere are both 100%, the luminescence lifetime T under the atmosphere is 1.3 ns, The emission lifetime T is 1.6 ns, and the emission rate constant k r is 7.6×10 8 s -1 , which shows a higher quantum yield than the doped film of BSB-Cz.

(摻雜膜之ASE發光特性之評價) 對於與PL發光特性之評價中所用者相同之條件下製作之、化合物2之摻雜膜及BSB-Cz之摻雜膜,調查氮氣雷射之337 nm激發光下之ASE發光特性。 對於化合物2之摻雜膜,將測定發光強度及發光波峰半峰全幅值FWHM之激發強度依存性而得之結果表示於圖3,將PL光譜及ASE光譜表示於圖4。PL光譜係於0.7 μJ/cm2 之激發強度下測定之發光光譜。對於BSB-Cz之摻雜膜,將測定發光強度及發光波峰半峰全幅值FWHM之激發強度依存性而得之結果表示於圖5,將PL光譜及ASE光譜表示於圖6。PL光譜係於0.2 μJ/cm2 之激發強度下測定之發光光譜,ASE光譜係於15 μJ/cm2 之激發強度下測定之發光光譜。 如圖3、5所示,關於任一摻雜膜,均於發光強度之激發強度依存性圖表中,確認其斜率變化之變化點(閾值Eth ),並確認FWHM依存於激發強度而變窄之相關關係。又,如圖4、6所示,於閾值Eth 以上之激發強度下,觀測到可確認為ASE波峰之急遽之發光波峰。其中,自該等測定結果可知,BSB-Cz之摻雜膜之ASE之極大波長λASE 為458 nm,ASE閾值Eth 為0.89 μJ/cm2 ,化合物2之摻雜膜之ASE之極大波長λASE 為442 nm,ASE閾值Eth 為0.90 μJ/cm2 ,與BSB-Cz摻雜膜同等。 自以上之結果可知,由通式(1)所表示之化合物與BSB-Cz相同,係可發射ASE之化合物,進而,量子產率及穩定性高於BSB-Cz,係更優異之發光材料。(Evaluation of ASE emission characteristics of doped film) For the doped film of compound 2 and the doped film of BSB-Cz produced under the same conditions as those used in the evaluation of PL emission characteristics, investigate the 337 nm of nitrogen laser Luminescence characteristics of ASE under excitation light. For the doped film of Compound 2, the results obtained by measuring the excitation intensity dependence of the luminescence intensity and the full-width FWHM of the luminescence peak are shown in FIG. 3, and the PL spectrum and the ASE spectrum are shown in FIG. 4. The PL spectrum is the luminescence spectrum measured at an excitation intensity of 0.7 μJ/cm 2 . For the BSB-Cz doped film, the results obtained by measuring the excitation intensity dependence of the luminescence intensity and the FWHM of the luminescence peak half-peak full-width FWHM are shown in FIG. 5, and the PL spectrum and the ASE spectrum are shown in FIG. 6. The PL spectrum is the luminescence spectrum measured under an excitation intensity of 0.2 μJ/cm 2 , and the ASE spectrum is the luminescence spectrum measured under an excitation intensity of 15 μJ/cm 2 . As shown in Figures 3 and 5, for any doped film, in the excitation intensity dependence graph of luminescence intensity, confirm the change point (threshold value E th ) of the slope change, and confirm that the FWHM is narrowed depending on the excitation intensity的 related relationship. In addition, as shown in Figs. 4 and 6, at an excitation intensity above the threshold E th , a sudden emission peak that can be confirmed as an ASE peak is observed. Among them, it can be seen from the measurement results that the maximum wavelength λ ASE of the ASE of the doped film of BSB-Cz is 458 nm, the ASE threshold E th is 0.89 μJ/cm 2 , and the maximum wavelength λ of the ASE of the doped film of Compound 2 The ASE is 442 nm, and the ASE threshold E th is 0.90 μJ/cm 2 , which is equivalent to the BSB-Cz doped film. From the above results, it can be seen that the compound represented by the general formula (1) is the same as BSB-Cz and is a compound capable of emitting ASE. Furthermore, the quantum yield and stability are higher than that of BSB-Cz, which is a more excellent luminescent material.

(單獨膜之ASE振盪時之耐久性之評價) 對於與PL發光特性之評價中所用者相同之條件下製作之、化合物1之單獨膜及化合物2之單獨膜及BSB-Cz之單獨膜,使用與ASE發光特性之評價中所用者相同之激發光源(337 nm、脈寬0.8 ns、10 Hz),以較ASE振盪閾值充分高之強度950 μJ/cm2 進行照射,於氮氣氛圍下,調查其發光強度之經時變化。將其結果表示於圖7。再者,橫軸表示測定時間。 如圖7所示,化合物1及化合物2之單獨膜之發光強度之減少小於BSB-Cz之單獨膜之發光強度之減少。由此可知,化合物1及化合物2與BSB-Cz相比,即便於雷射振盪狀態下穩定性(光耐久性)亦較高,適合作為雷射材料用之化合物。(Evaluation of durability of single film during ASE oscillation) For the single film of compound 1, the single film of compound 2, and the single film of BSB-Cz produced under the same conditions as those used in the evaluation of PL luminescence characteristics, use The same excitation light source (337 nm, pulse width 0.8 ns, 10 Hz) used in the evaluation of ASE luminescence characteristics was irradiated with an intensity of 950 μJ/cm 2 sufficiently higher than the ASE oscillation threshold. The investigation was conducted under a nitrogen atmosphere. The luminous intensity changes over time. The results are shown in Fig. 7. In addition, the horizontal axis represents the measurement time. As shown in Figure 7, the reduction of the luminous intensity of the individual films of Compound 1 and Compound 2 is smaller than the reduction of the luminous intensity of the individual films of BSB-Cz. It can be seen that, compared with BSB-Cz, compound 1 and compound 2 have higher stability (light durability) even in the laser oscillation state, and are suitable as compounds for laser materials.

[化23]

Figure 02_image055
[產業上之可利用性][化23]
Figure 02_image055
[Industrial availability]

本發明之化合物表現出較高之量子產率及較低之ASE閾值,穩定性亦較高。由此,藉由將本發明之化合物用作有機半導體雷射元件之發光材料,可實現雷射振盪閾值較低之有機半導體雷射元件。由此,本發明之產業上之可利用性較高。The compound of the present invention exhibits a higher quantum yield and a lower ASE threshold, and the stability is also higher. Therefore, by using the compound of the present invention as a light-emitting material of an organic semiconductor laser device, an organic semiconductor laser device with a lower laser oscillation threshold can be realized. Therefore, the industrial applicability of the present invention is high.

1:基板 2:陽極 3:電洞注入層 4:電洞傳輸層 5:發光層 6:電子傳輸層 7:陰極1: substrate 2: anode 3: hole injection layer 4: hole transport layer 5: Light-emitting layer 6: Electron transport layer 7: Cathode

圖1係表示本發明之有機半導體雷射元件之層構成例之概略剖視圖。 圖2係表示化合物2及BSB-Cz之光耐性之圖表。 圖3係表示化合物2之單獨膜之發光強度及波峰半峰全幅值(FWHM)之激發光強度依存性之圖表。 圖4係化合物2之單獨膜之PL(photoluminescence,光致發光)光譜及ASE光譜。 圖5係表示BSB-Cz之單獨膜之發光強度及波峰半峰全幅值(FWHM)之激發光強度依存性之圖表。 圖6係BSB-Cz之單獨膜之PL光譜及ASE光譜。 圖7係表示化合物1、化合物2及BSB-Cz之各單獨膜之ASE振盪時之耐久性之圖表。Fig. 1 is a schematic cross-sectional view showing an example of the layer structure of the organic semiconductor laser element of the present invention. Figure 2 is a graph showing the light tolerance of Compound 2 and BSB-Cz. Fig. 3 is a graph showing the dependence of the luminous intensity of a single film of compound 2 on the excitation light intensity and the full width at half maximum (FWHM) of the peak. Figure 4 shows the PL (photoluminescence) spectra and ASE spectra of a single film of Compound 2. Fig. 5 is a graph showing the dependence of the luminous intensity of a single film of BSB-Cz and the FWHM of the excitation light intensity. Figure 6 shows the PL spectrum and ASE spectrum of a single film of BSB-Cz. Fig. 7 is a graph showing the durability of each individual film of Compound 1, Compound 2, and BSB-Cz during ASE oscillation.

Figure 109106554-A0304-11-0001-1
Figure 109106554-A0304-11-0001-1

Claims (13)

一種化合物,其係由下述通式(1)所表示, 通式(1) Z1 -L-Z2 [於通式(1)中,Z1 及Z2 分別獨立地表示經取代或者未經取代之二芳基胺基,構成上述二芳基胺基之2個芳基相互直接或經由連結基而鍵結,L表示包含苯并呋喃結構之共軛系連結基,於連結Z1 與Z2 之連結鏈中包含5個以上之環]。A compound represented by the following general formula (1), General formula (1) Z 1 -LZ 2 [In the general formula (1), Z 1 and Z 2 each independently represent substituted or unsubstituted The two aryl groups constituting the above-mentioned diarylamino group are directly bonded to each other or via a linking group. L represents a conjugated linking group containing a benzofuran structure, which is used to connect Z 1 and Z 2 The link chain contains more than 5 rings]. 如請求項1之化合物,其中上述共軛系連結基具有選自經取代或者未經取代之苯環、經取代或者未經取代之呋喃環、經取代或者未經取代之雜芳香環、及經取代或者未經取代之伸乙烯基中之2個以上連結而得之結構(其中上述苯環及呋喃環可縮合,又,上述呋喃環及上述雜芳香環可縮合)。The compound of claim 1, wherein the above-mentioned conjugated system linking group has a group selected from a substituted or unsubstituted benzene ring, a substituted or unsubstituted furan ring, a substituted or unsubstituted heteroaromatic ring, and a A structure in which two or more of the substituted or unsubstituted vinylidene groups are connected (wherein, the benzene ring and the furan ring may be condensed, and the furan ring and the heteroaromatic ring may be condensed). 如請求項1之化合物,其中上述共軛系連結基包含經取代或者未經取代之苯并呋喃-2,6-二基。The compound of claim 1, wherein the above-mentioned conjugated linking group comprises a substituted or unsubstituted benzofuran-2,6-diyl group. 如請求項1之化合物,其中上述共軛系連結基具有選自下述群A中之1個以上之基連結而得之結構, [化1]
Figure 03_image057
[上述群A之各基中之氫原子可經取代,*表示連結位置,自上述群A之中選擇至少1個包含苯并呋喃結構之基,又,上述群A中之包含苯并呋喃結構之基及包含茀結構之基之構成該等基之苯環之環骨架構成原子之至少1個可經氮原子取代]。
The compound of claim 1, wherein the above-mentioned conjugated linking group has a structure in which one or more groups selected from the following group A are connected, [化1]
Figure 03_image057
[The hydrogen atom in each group of the above group A may be substituted, * indicates the linking position, and at least one group containing a benzofuran structure is selected from the above group A, and the group A includes a benzofuran structure At least one of the atoms constituting the benzene ring of the benzene ring of the group and the group containing the fluorine structure may be substituted by a nitrogen atom].
如請求項1之化合物,其中上述共軛系連結基包含由下述通式(2)所表示之基, [化2]
Figure 03_image059
[於通式(2)中,R1 及R2 相互鍵結而形成-O-,R3 及R4 分別獨立地表示氫原子或取代基,或相互鍵結而形成連結基,*表示連結位置,通式(2)中之與苯環鍵結之氫原子可藉由取代基所取代]。
The compound of claim 1, wherein the above-mentioned conjugated linking group includes a group represented by the following general formula (2), [化2]
Figure 03_image059
[In the general formula (2), R 1 and R 2 are bonded to each other to form -O-, R 3 and R 4 each independently represent a hydrogen atom or a substituent, or are bonded to each other to form a linking group, * represents a link Position, the hydrogen atom bonded to the benzene ring in the general formula (2) can be substituted by a substituent].
如請求項1至5中任一項之化合物,其中上述共軛系連結基之鏈長原子數為10~30。The compound according to any one of claims 1 to 5, wherein the chain length of the conjugated linking group is 10-30. 如請求項1至5中任一項之化合物,其中Z1 及Z2 分別獨立地為由下述通式(3)所表示之基, [化3]
Figure 03_image061
[於通式(3)中,R11 ~R20 分別獨立地表示氫原子或取代基,R15 及R16 相互鍵結而形成單鍵或連結基,R11 及R12 、R12 及R13 、R13 及R14 、R14 及R15 、R16 及R17 、R17 及R18 、R18 及R19 、R19 及R20 可相互鍵結而形成環狀結構,*表示鍵結位置]。
The compound of any one of claims 1 to 5, wherein Z 1 and Z 2 are each independently a group represented by the following general formula (3), [化3]
Figure 03_image061
[In the general formula (3), R 11 to R 20 each independently represent a hydrogen atom or a substituent, R 15 and R 16 are bonded to each other to form a single bond or a linking group, R 11 and R 12 , R 12 and R 13 , R 13 and R 14 , R 14 and R 15 , R 16 and R 17 , R 17 and R 18 , R 18 and R 19 , R 19 and R 20 can be bonded to each other to form a cyclic structure, * represents a bond End position].
如請求項1至5中任一項之化合物,其中Z1 及Z2 分別獨立地為由下述通式(4)~(8)之任一者所表示之基, [化4]
Figure 03_image063
Figure 03_image065
[於通式(4)~(8)中,R21 ~R24 、R27 ~R38 、R41 ~R48 、R51 ~R58 、R61 ~R65 、R81 ~R90 分別獨立地表示氫原子或取代基,R21 及R22 、R22 及R23 、R23 及R24 、R27 及R28 、R28 及R29 、R29 及R30 、R31 及R32 、R32 及R33 、R33 及R34 、R35 及R36 、R36 及R37 、R37 及R38 、R41 及R42 、R42 及R43 、R43 及R44 、R45 及R46 、R46 及R47 、R47 及R48 、R51 及R52 、R52 及R53 、R53 及R54 、R55 及R56 、R56 及R57 、R57 及R58 、R61 及R62 、R62 及R63 、R63 及R64 、R64 及R65 、R54 及R61 、R55 及R65 、R81 及R82 、R82 及R83 、R83 及R84 、R85 及R86 、R86 及R87 、R87 及R88 、R89 及R90 可相互鍵結而形成環狀結構,*表示鍵結位置]。
The compound of any one of claims 1 to 5, wherein Z 1 and Z 2 are each independently a group represented by any one of the following general formulas (4) to (8), [formation 4]
Figure 03_image063
Figure 03_image065
[In the general formulae (4) to (8), R 21 to R 24 , R 27 to R 38 , R 41 to R 48 , R 51 to R 58 , R 61 to R 65 , and R 81 to R 90 are each independent Ground represents a hydrogen atom or a substituent, R 21 and R 22 , R 22 and R 23 , R 23 and R 24 , R 27 and R 28 , R 28 and R 29 , R 29 and R 30 , R 31 and R 32 , R 32 and R 33 , R 33 and R 34 , R 35 and R 36 , R 36 and R 37 , R 37 and R 38 , R 41 and R 42 , R 42 and R 43 , R 43 and R 44 , R 45 And R 46 , R 46 and R 47 , R 47 and R 48 , R 51 and R 52 , R 52 and R 53 , R 53 and R 54 , R 55 and R 56 , R 56 and R 57 , R 57 and R 58 , R 61 and R 62 , R 62 and R 63 , R 63 and R 64 , R 64 and R 65 , R 54 and R 61 , R 55 and R 65 , R 81 and R 82 , R 82 and R 83 , R 83 and R 84 , R 85 and R 86 , R 86 and R 87 , R 87 and R 88 , R 89 and R 90 can be bonded to each other to form a cyclic structure, and * indicates bonding position].
如請求項8之化合物,其中Z1 及Z2 分別獨立地為由上述通式(4)所表示之基。The compound of claim 8, wherein Z 1 and Z 2 are each independently a group represented by the above general formula (4). 一種如請求項1至9中任一項之化合物之用途,其係使用作為發光材料。A use of the compound according to any one of claims 1 to 9, which is used as a luminescent material. 如請求項10之作為發光材料之用途,其中上述化合物係發射自發發射放大光之化合物。The use as a luminescent material according to claim 10, wherein the above-mentioned compound is a compound that emits spontaneously emitting amplified light. 如請求項10或11之作為發光材料之用途,其係使用作為有機半導體雷射元件用之發光材料。If claim 10 or 11 is used as a luminescent material, it is used as a luminescent material for an organic semiconductor laser element. 一種有機半導體雷射元件,其包含由下述通式(1)所表示之化合物, 通式(1) Z1 -L-Z2 [於通式(1)中,Z1 及Z2 分別獨立地表示經取代或者未經取代之二芳基胺基,構成上述二芳基胺基之2個芳基相互直接或經由連結基而鍵結,L表示包含苯并呋喃結構之共軛系連結基]。An organic semiconductor laser element comprising a compound represented by the following general formula (1), the general formula (1) Z 1 -LZ 2 [In the general formula (1), Z 1 and Z 2 are each independently represented In the substituted or unsubstituted diarylamino group, the two aryl groups constituting the above-mentioned diarylamino group are bonded to each other directly or via a linking group, and L represents a conjugated linking group containing a benzofuran structure].
TW109106554A 2019-02-27 2020-02-27 Compound, light emitting material, and organic semiconductor laser element TW202043216A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019-034969 2019-02-27
JP2019034969 2019-02-27
JP2019228277 2019-12-18
JP2019-228277 2019-12-18

Publications (1)

Publication Number Publication Date
TW202043216A true TW202043216A (en) 2020-12-01

Family

ID=72239673

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109106554A TW202043216A (en) 2019-02-27 2020-02-27 Compound, light emitting material, and organic semiconductor laser element

Country Status (3)

Country Link
JP (1) JPWO2020175624A1 (en)
TW (1) TW202043216A (en)
WO (1) WO2020175624A1 (en)

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3735288B2 (en) * 2001-10-30 2006-01-18 松下電器産業株式会社 LIGHT EMITTING ELEMENT AND DEVICE USING THE SAME
JP2006265172A (en) * 2005-03-24 2006-10-05 Japan Science & Technology Agency New carbazole derivative and organic electroluminescent element and organic semiconductor laser element
JP2008106032A (en) * 2006-09-25 2008-05-08 Kyushu Univ Carbazole derivative and organic solid laser material using the same
JP5105820B2 (en) * 2006-10-12 2012-12-26 国立大学法人九州大学 Carbazole derivative and organic solid-state laser material using the same
JP2008163190A (en) * 2006-12-28 2008-07-17 Kyushu Univ Diphenyl ethene derivative and organic solid-state laser material using the same
EP2145936A3 (en) * 2008-07-14 2010-03-17 Gracel Display Inc. Fluorene and pyrene derivatives and organic electroluminescent device using the same
KR101902496B1 (en) * 2010-10-12 2018-09-28 신닛테츠 수미킨 가가쿠 가부시키가이샤 Chalcogen-containing aromatic compound, organic semiconductor material, and organic electronic device
WO2014067614A1 (en) * 2012-10-31 2014-05-08 Merck Patent Gmbh Electronic device
KR102572918B1 (en) * 2014-12-23 2023-08-30 메르크 파텐트 게엠베하 Carbazoles with two dibenzofuran or dibenzothiophene substituents
US20180182980A1 (en) * 2015-06-03 2018-06-28 Udc Ireland Limited Highly efficient oled devices with very short decay times
US20170271610A1 (en) * 2016-03-18 2017-09-21 Semiconductor Energy Laboratory Co., Ltd. Light-emitting element, display device, electronic device, and lighting device
CN107698601B (en) * 2016-08-09 2022-01-04 株式会社Lg化学 Heterocyclic compound and organic electroluminescent element comprising same
TWI766884B (en) * 2016-09-30 2022-06-11 德商麥克專利有限公司 Compounds having diazadibenzofuran or diazadibenzothiophene structures, process for preparing the same and use thereof
CN107880056B (en) * 2016-09-30 2020-07-14 南京高光半导体材料有限公司 Organic electroluminescent compounds and organic electroluminescent device using the same
WO2018221173A1 (en) * 2017-06-02 2018-12-06 コニカミノルタ株式会社 Organic electroluminescent element, display device, and lighting device
CN107602336A (en) * 2017-09-12 2018-01-19 长春海谱润斯科技有限公司 A kind of anthracene derivative and its synthetic method and organic luminescent device
CN108424411A (en) * 2017-09-30 2018-08-21 北京绿人科技有限责任公司 Triaizine compounds and its application with symmetrical structure and organic electroluminescence device
CN107573307A (en) * 2017-10-25 2018-01-12 长春海谱润斯科技有限公司 A kind of electroluminescent organic material and organic luminescent device
CN108892674A (en) * 2018-08-12 2018-11-27 瑞声科技(南京)有限公司 A kind of heat lag fluorescent chemicals and its application

Also Published As

Publication number Publication date
JPWO2020175624A1 (en) 2021-12-23
WO2020175624A1 (en) 2020-09-03

Similar Documents

Publication Publication Date Title
JP7226718B2 (en) Organic light-emitting device, composition and film
JP6493220B2 (en) Luminescent material, organic light emitting device and compound
JP6277182B2 (en) COMPOUND, LIGHT EMITTING MATERIAL AND ORGANIC LIGHT EMITTING DEVICE
JP5594750B2 (en) COMPOUND, LIGHT EMITTING MATERIAL AND ORGANIC LIGHT EMITTING DEVICE
JP6293417B2 (en) COMPOUND, LIGHT EMITTING MATERIAL AND ORGANIC LIGHT EMITTING DEVICE
JP5723764B2 (en) Organic electroluminescence device
WO2018159662A1 (en) Compound, light emitting material and organic light emitting element
EP3561023B1 (en) Light-emitting material, coumpound, and organic light-emitting element
WO2015105137A1 (en) Light-emitting material, organic light-emitting element, and compound
JP7028176B2 (en) Organic light emitting devices and light emitting materials and compounds used for them
WO2018207750A1 (en) Compound, light emitting material and organic light emitting element
JP7410571B2 (en) Compounds, luminescent materials, delayed phosphors, organic light emitting devices, oxygen sensors, molecular design methods and programs
WO2019176971A1 (en) Charge transport material, compound, and organic light-emitting element
JP7267563B2 (en) Luminescent materials, compounds, delayed phosphors and light-emitting devices
Bhalla et al. Carbazole-based linear conjugated molecules: structure–property relationships and device properties
WO2020189519A1 (en) Organic electroluminescent element and compound
TW202144374A (en) Laser element, compound, method for producing compound and lasing sensitizer
JP7214142B2 (en) Singlet fission materials, triplet sensitizers, compounds and thin films
TW202043216A (en) Compound, light emitting material, and organic semiconductor laser element
JP7165943B2 (en) Compounds having a π-electron conjugated unit and a carbazole group
JP2024084864A (en) Organic electroluminescent element and electronic device
TWI712599B (en) Organic electroluminescent material and organic electroluminescent element using the same
WO2018159663A1 (en) Light-emitting material, organic light-emitting element and compound
JP7395136B2 (en) Composition and organic light emitting device
WO2023171688A1 (en) Compound, organic electroluminescent element material, organic electroluminescent element, and electronic device