TW202041633A - Reinforcing film, method for making same, method for making device and reinforcing method - Google Patents

Reinforcing film, method for making same, method for making device and reinforcing method Download PDF

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TW202041633A
TW202041633A TW108123049A TW108123049A TW202041633A TW 202041633 A TW202041633 A TW 202041633A TW 108123049 A TW108123049 A TW 108123049A TW 108123049 A TW108123049 A TW 108123049A TW 202041633 A TW202041633 A TW 202041633A
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adhesive layer
base polymer
reinforcing film
adherend
film
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TWI789537B (en
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片岡賢一
仲野武史
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日商日東電工股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062Copolymers with monomers not covered by C09J133/06
    • C09J133/064Copolymers with monomers not covered by C09J133/06 containing anhydride, COOH or COOM groups, with M being metal or onium-cation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062Copolymers with monomers not covered by C09J133/06
    • C09J133/066Copolymers with monomers not covered by C09J133/06 containing -OH groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/02Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving pretreatment of the surfaces to be joined
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention provides a reinforcing film, a method for making the same, a method for making a device and a reinforing method. The present invention relates to the reinforcing film (10) comprising: a film substrate; and an adhesive layer (2) adhered and laminated on one main surface of the film substrate, wherein the adhesive layer consists of a photocurable composition. In addition, the photocurable composition constituting the adhesive layer comprises a base polymer, a photo-curing agent, and a photopolymerization initiator. The base polymer having a cross-linked structure is formed by a cross-linking reaction of a composition including the base polymer, a cross-linking agent, and a cross-linking accelerator.

Description

補強膜及其製造方法、裝置之製造方法與補強方法Reinforcing film and its manufacturing method, manufacturing method and reinforcing method of device

本發明係關於一種膜基材與光硬化性之黏著劑層固著積層而成之補強膜及其製造方法。進而,本發明係關於一種於表面貼合有補強膜之裝置之製造方法、及於被黏著體之表面固著積層補強膜之補強方法。The present invention relates to a reinforcing film formed by fixing and laminating a film substrate and a photocurable adhesive layer and a manufacturing method thereof. Furthermore, the present invention relates to a method of manufacturing a device with a reinforcing film attached to the surface, and a reinforcing method of fixing a laminated reinforcing film on the surface of an adherend.

於顯示器等光學裝置或電子裝置之表面,存在為了表面保護或耐衝擊性賦予等而貼合黏著性膜之情況。此種黏著性膜通常係於膜基材之主面固著積層黏著劑層,且經由該黏著劑層貼合於裝置表面。On the surface of an optical device such as a display or an electronic device, an adhesive film may be attached for surface protection or impact resistance. Such an adhesive film is usually fixed with a laminated adhesive layer on the main surface of the film substrate, and is attached to the surface of the device via the adhesive layer.

於裝置之組裝、加工、輸送等使用前之狀態下,可藉由於裝置或裝置構成零件之表面暫黏黏著性膜而抑制被黏著體之損傷或破損。對如此以表面之暫時性保護為目的而暫黏之黏著性膜要求可容易地自被黏著體剝離,且不產生於被黏著體之糊劑殘留。In the state before the device is assembled, processed, transported, etc., the adhesive film can be temporarily adhered to the surface of the device or its constituent parts to prevent damage or breakage of the adherend. For such an adhesive film temporarily adhered for the purpose of temporary protection of the surface, it is required that it can be easily peeled off from the adherend and does not produce paste residue on the adherend.

於專利文獻1中揭示有一種黏著性膜,其除裝置之組裝、加工、輸送等以外,於裝置之使用時亦於貼合於裝置表面不變之狀態下使用。此種黏著性膜由於表面保護、以及對裝置之衝擊之分散、對撓性裝置之剛性賦予等而具有對裝置進行補強之功能。Patent Document 1 discloses an adhesive film, which, in addition to the assembly, processing, and transportation of the device, is also used in a state of being attached to the surface of the device during use of the device. Such an adhesive film has the function of reinforcing the device due to surface protection, dispersion of the impact on the device, and rigidity to the flexible device.

於將黏著性膜貼合於被黏著體時,存在產生氣泡之混入或黏貼位置之偏移等貼合不良之情況。於產生貼合不良之情形時,進行如下作業(二次加工):自被黏著體將黏著性膜剝離並貼合另一黏著性膜。用作工程材料之黏著性膜由於係以自被黏著體之剝離為前提進行設計,因此容易二次加工。另一方面,以永久接著為前提之補強膜一般而言不假定自裝置剝離而是牢固地接著於裝置之表面,因此難以二次加工。When the adhesive film is attached to the adherend, there are cases of poor attachment such as the mixing of air bubbles or the offset of the attachment position. In the case of poor bonding, perform the following operations (secondary processing): peel the adhesive film from the adherend and attach another adhesive film. The adhesive film used as an engineering material is designed on the premise of peeling from the adherend, so it is easy to reprocess. On the other hand, the reinforcing film premised on permanent bonding generally does not assume peeling from the device but firmly adheres to the surface of the device, so it is difficult to perform secondary processing.

於專利文獻2中揭示有一種黏著性膜,其具備設計成剛與被黏著體貼合後為低黏著性且接著力經時性地上升之黏著劑層。以光或熱作為觸發器使接著力上升之黏著劑可任意地設定與被黏著體之貼合後之由硬化而引起之接著力上升之時點。又,由於剛貼合後(接著力上升處理前)接著力較小,故而容易自被黏著體剝離,可用作具有二次加工性之補強膜。 [先前技術文獻] [專利文獻]Patent Document 2 discloses an adhesive film provided with an adhesive layer designed to have low adhesiveness immediately after being bonded to an adherend, and then the force to increase over time. The adhesive that uses light or heat as the trigger to increase the adhesive force can be arbitrarily set at the time point of the adhesive force rising due to hardening after being attached to the adherend. In addition, since the adhesive force is small immediately after bonding (before the adhesive force increasing process), it is easy to peel off from the adherend, and can be used as a reinforcing film with secondary processability. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本專利特開2017-132977號公報 [專利文獻2]國際公開第2015/163115號[Patent Document 1] Japanese Patent Laid-Open No. 2017-132977 [Patent Document 2] International Publication No. 2015/163115

[發明所欲解決之問題][The problem to be solved by the invention]

存在對電漿裝置等被黏著體之表面於貼合補強膜之前,以被黏著體表面之潔淨化等為目的而進行電漿處理或電暈處理等表面活化處理的情況。若於表面活性處理後之被黏著體之表面貼合補強膜,則存在與於未進行表面活化處理之被黏著體貼合補強膜之情形時相比,接著力大幅上升,自被黏著體剝離補強膜(二次加工)變得困難的情況。There are cases where the surface of an adherend such as a plasma device or the like is subjected to surface activation treatment such as plasma treatment or corona treatment for the purpose of cleaning the surface of the adherend before laminating the reinforcing film. If the reinforcing film is attached to the surface of the adherend after the surface activation treatment, the adhesive strength will increase significantly compared with the case where the adherend without the surface activation treatment is attached to the reinforcing film, and the reinforcement will be peeled off from the adherend. When the film (secondary processing) becomes difficult.

鑒於該課題,本發明之目的在於提供一種即便藉由電漿等對被黏著體表面進行過活化處理之情形時,對被黏著體之初期接著力亦較低、二次加工性優異之補強膜。 [解決問題之技術手段]In view of this problem, the object of the present invention is to provide a reinforcing film that has low initial adhesion to the adherend and excellent secondary processability even when the surface of the adherend is activated by plasma or the like. . [Technical means to solve the problem]

鑒於上述課題,本發明者等人進行研究,結果發現:藉由使用交聯促進劑向基礎聚合物中導入交聯結構,因被黏著體之表面活化處理之有無而引起之初期接著力之差較小,對經表面活化處理之被黏著體亦具有優異之二次加工性。In view of the above-mentioned problems, the inventors of the present invention conducted research and found that by using a cross-linking accelerator to introduce a cross-linked structure into the base polymer, the initial adhesive strength is poor due to the presence or absence of surface activation treatment of the adherend Smaller, it also has excellent secondary processability to the adherend after surface activation treatment.

本發明之補強膜具備固著積層於膜基材之一主面上之黏著劑層。黏著劑層包含光硬化性組合物,上述光硬化性組合物含有具有交聯結構之基礎聚合物、光硬化劑、及光聚合起始劑。例如,將包含基礎聚合物、交聯劑、交聯促進劑、光硬化劑、及光聚合起始劑之組合物層狀地塗佈於膜基材上,利用基礎聚合物與交聯劑之反應向基礎聚合物中導入交聯結構,藉此可獲得於膜基材上固著積層有黏著劑層之補強膜。亦可將於其他基材上所形成之黏著劑層轉印至膜基材上。The reinforcing film of the present invention is provided with an adhesive layer fixedly laminated on a main surface of the film substrate. The adhesive layer contains a photocurable composition, and the photocurable composition contains a base polymer having a crosslinked structure, a photocuring agent, and a photopolymerization initiator. For example, a composition containing a base polymer, a crosslinking agent, a crosslinking accelerator, a light hardener, and a photopolymerization initiator is applied to a film substrate in a layered manner, and a combination of the base polymer and the crosslinking agent is used. The reaction introduces a cross-linked structure into the base polymer, thereby obtaining a reinforced film with an adhesive layer fixed on the film substrate. The adhesive layer formed on other substrates can also be transferred to the film substrate.

作為黏著劑層之基礎聚合物,例如可使用丙烯酸系聚合物。藉由包含基礎聚合物、交聯劑、及交聯促進劑之組合物之交聯反應,向基礎聚合物中導入交聯結構。例如,基礎聚合物含有含羥基單體及/或含羧基單體作為單體單元,藉由多官能異氰酸酯化合物或多官能環氧化合物等交聯劑與該等官能基鍵結而被導入交聯結構。作為交聯促進劑,可良好地使用有機金屬化合物。藉由使黏著劑組合物包含使用交聯促進劑導入有交聯結構之基礎聚合物,存在即便於藉由電漿處理等對被黏著體表面進行過活化處理之情形時,亦會抑制對被黏著體之初期接著力之上升之傾向。As the base polymer of the adhesive layer, for example, an acrylic polymer can be used. The crosslinking structure is introduced into the base polymer by the crosslinking reaction of the composition including the base polymer, the crosslinking agent, and the crosslinking accelerator. For example, the base polymer contains a hydroxyl group-containing monomer and/or a carboxyl group-containing monomer as a monomer unit, and is cross-linked by bonding a cross-linking agent such as a multifunctional isocyanate compound or a multifunctional epoxy compound to these functional groups. structure. As a crosslinking accelerator, an organometallic compound can be used favorably. By making the adhesive composition include a base polymer with a cross-linked structure introduced with a cross-linking accelerator, even when the surface of the adherend is activated by plasma treatment or the like, it is suppressed The tendency of the initial adhesion of the adhesive body to increase.

黏著劑層(光硬化性組合物)之凝膠分率可為60%以上。The gel fraction of the adhesive layer (photocurable composition) can be 60% or more.

黏著劑層之光硬化劑例如為多官能(甲基)丙烯酸酯。光硬化劑之官能基當量較佳為100~500 g/eq左右。The light curing agent of the adhesive layer is, for example, a multifunctional (meth)acrylate. The functional group equivalent of the light hardener is preferably about 100 to 500 g/eq.

將補強膜暫黏於被黏著體之表面後,藉由對黏著劑層照射活性光線,使黏著劑層光硬化,而使補強膜與被黏著體之接著力上升,獲得於被黏著體之表面固著積層有補強膜之裝置。於被黏著體為聚醯亞胺膜之情形時,較佳為使黏著劑層光硬化之前(暫黏狀態),黏著劑層與聚醯亞胺膜之接著力為1 N/25 mm以下。亦可於將補強膜暫黏於被黏著體之前對被黏著體進行電漿處理等表面活化處理。 [發明之效果]After the reinforcing film is temporarily adhered to the surface of the adherend, the adhesive layer is irradiated with active light to light-harden the adhesive layer, so that the adhesive force between the reinforcing film and the adherend increases, and is obtained on the surface of the adherend The fixed laminate has a device for reinforcing film. When the adherend is a polyimide film, it is preferable that the adhesive force between the adhesive layer and the polyimide film be 1 N/25 mm or less before the adhesive layer is photocured (temporary adhesion state). It is also possible to perform surface activation treatments such as plasma treatment on the adherend before temporarily adhering the reinforcing film to the adherend. [Effects of Invention]

本發明之補強膜中,黏著劑層包含光硬化性組合物,且於與被黏著體之接著後藉由使黏著劑層光硬化而使與被黏著體之接著力上升。於使黏著劑層光硬化前,對藉由電漿處理等而進行過活化處理之被黏著體之接著力亦較小,因此容易二次加工,光硬化後表現出較高之接著力。In the reinforcing film of the present invention, the adhesive layer contains a photocurable composition, and after bonding with the adherend, the adhesive layer is photocured to increase the adhesive force with the adherend. Before the adhesive layer is photocured, the adhesive force to the adherend that has been activated by plasma treatment or the like is also small, so it is easy to perform secondary processing, and exhibits a higher adhesive force after photocuring.

圖1係表示補強膜之一實施形態之剖視圖。補強膜10於膜基材1之一主面上具備黏著劑層2。黏著劑層2固著積層於基材膜1之一主面上。黏著劑層2係包含光硬化性組合物之光硬化性黏著劑,且藉由紫外線等活性光線之照射進行硬化,從而與被黏著體之接著力上升。Fig. 1 is a cross-sectional view showing an embodiment of a reinforcing film. The reinforcing film 10 is provided with an adhesive layer 2 on one main surface of the film base material 1. The adhesive layer 2 is fixedly laminated on one main surface of the base film 1. The adhesive layer 2 contains a photocurable adhesive of a photocurable composition, and is cured by the irradiation of active rays such as ultraviolet rays, thereby increasing the adhesive force with the adherend.

圖2係於黏著劑層2之主面上暫黏有隔離件5之補強膜之剖視圖。圖3係表示於裝置20之表面黏貼設置有補強膜10之狀態之剖視圖。2 is a cross-sectional view of a reinforcing film with a spacer 5 temporarily adhered to the main surface of the adhesive layer 2. 3 is a cross-sectional view showing a state where the reinforcing film 10 is attached to the surface of the device 20.

自黏著劑層2之表面將隔離件5剝離去除,將黏著劑層2之露出面貼合於裝置20之表面,藉此於裝置20之表面黏貼設置補強膜10。該狀態係黏著劑層2為光硬化前且於裝置20上暫黏有補強膜10(黏著劑層2)之狀態。藉由使黏著劑層2進行光硬化,而使於裝置20與黏著劑層2之界面之接著力上升,使裝置20與補強膜10固著。The spacer 5 is peeled off from the surface of the adhesive layer 2, and the exposed surface of the adhesive layer 2 is attached to the surface of the device 20, thereby attaching the reinforcing film 10 to the surface of the device 20. This state is that the adhesive layer 2 is in a state where the reinforcing film 10 (adhesive layer 2) is temporarily adhered to the device 20 before photocuring. By photocuring the adhesive layer 2, the adhesive force at the interface between the device 20 and the adhesive layer 2 is increased, and the device 20 and the reinforcing film 10 are fixed.

所謂「固著」,係指所積層之2層牢固地接著、不可能或難以於兩者之界面剝離之狀態。所謂「暫黏」,係指所積層之2層間之接著力較小、可容易地於兩者之界面剝離之狀態。The so-called "fixed" refers to the state where the two layers of the laminated layer are firmly connected, and it is impossible or difficult to peel off at the interface between the two layers. The so-called "temporary adhesion" refers to a state in which the adhesive force between the two layers of the laminated layer is small and can be easily peeled off at the interface between the two layers.

圖2所示之補強膜中,膜基材1與黏著劑層2固著,且隔離件5暫黏於黏著劑層2。若將膜基材1與隔離件5進行剝離,則於黏著劑層2與隔離件5之界面產生剝離,維持膜基材1上固著有黏著劑層2之狀態。於剝離後之隔離件5上不會殘存黏著劑。In the reinforced film shown in FIG. 2, the film base material 1 and the adhesive layer 2 are fixed, and the spacer 5 is temporarily adhered to the adhesive layer 2. When the film base material 1 and the separator 5 are peeled off, peeling occurs at the interface between the adhesive layer 2 and the separator 5, and the state of the adhesive layer 2 fixed on the film base material 1 is maintained. No adhesive remains on the separator 5 after peeling.

圖3所示之黏貼設置有補強膜10之裝置於黏著劑層2之光硬化前,裝置20與黏著劑層2為暫黏狀態。若對膜基材1與裝置20進行剝離,則於黏著劑層2與裝置20之界面產生剝離,維持膜基材1上固著有黏著劑層2之狀態。由於在裝置20上不會殘存黏著劑,故而容易二次加工。於使黏著劑層2光硬化後,由於黏著劑層2與裝置20之接著力上升,故而難以自裝置20剝離膜1,若將兩者剝離,則存在產生黏著劑層2之凝集破壞之情況。In the pasting device shown in FIG. 3 provided with a reinforcing film 10, before the photo-curing of the adhesive layer 2, the device 20 and the adhesive layer 2 are in a temporarily bonded state. If the film base material 1 and the device 20 are peeled off, peeling occurs at the interface between the adhesive layer 2 and the device 20, and the state of the adhesive layer 2 fixed on the film base material 1 is maintained. Since no adhesive remains on the device 20, secondary processing is easy. After the adhesive layer 2 is photocured, since the adhesive force between the adhesive layer 2 and the device 20 increases, it is difficult to peel the film 1 from the device 20. If the two are peeled off, the adhesive layer 2 may cause aggregation failure .

[補強膜之構成] <膜基材> 作為膜基材1,使用塑膠膜。為了使膜基材1及黏著劑層2固著,較佳為膜基材1之附設黏著劑層2之面未實施過脫模處理。[Composition of Reinforcing Film] <Film base material> As the film base material 1, a plastic film is used. In order to fix the film base material 1 and the adhesive layer 2, it is preferable that the surface of the film base material 1 on which the adhesive layer 2 is attached has not been subjected to mold release treatment.

膜基材之厚度例如為4~500 μm左右。就藉由剛性賦予或衝擊緩和等對裝置進行補強之觀點而言,膜基材1之厚度較佳為12 μm以上,更佳為30 μm以上,進而較佳為45 μm以上。就使補強膜具有可撓性從而提高操作性之觀點而言,膜基材1之厚度較佳為300 μm以下,更佳為200 μm以下。就兼顧機械強度及可撓性之觀點而言,膜基材1之壓縮強度較佳為100~3000 kg/cm2 ,更佳為200~2900 kg/cm2 ,進而較佳為300~2800 kg/cm2 ,尤佳為400~2700 kg/cm2The thickness of the film substrate is, for example, about 4 to 500 μm. From the viewpoint of reinforcement of the device by rigidity imparting or impact mitigation, the thickness of the film substrate 1 is preferably 12 μm or more, more preferably 30 μm or more, and even more preferably 45 μm or more. From the viewpoint of making the reinforcing film flexible and improving operability, the thickness of the film substrate 1 is preferably 300 μm or less, and more preferably 200 μm or less. From the viewpoint of both mechanical strength and flexibility, the compressive strength of the film substrate 1 is preferably 100-3000 kg/cm 2 , more preferably 200-2900 kg/cm 2 , and still more preferably 300-2800 kg /cm 2 , preferably 400~2700 kg/cm 2 .

作為構成膜基材1之塑膠材料,可列舉聚酯系樹脂、聚烯烴系樹脂、環狀聚烯烴系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂等。於顯示器等光學裝置用之補強膜中,膜基材1較佳為透明膜。又,於自膜基材1側照射活性光線進行黏著劑層2之光硬化之情形時,膜基材1較佳為具有對黏著劑層之硬化所使用之活性光線之透明性。就兼備機械強度及透明性而言,可良好地使用聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯系樹脂。於自被黏著體側照射活性光線使黏著劑層硬化之情形時,被黏著體具有對活性光線之透明性即可,膜基材1對活性光線可不透明。Examples of the plastic material constituting the film base material 1 include polyester resins, polyolefin resins, cyclic polyolefin resins, polyamide resins, polyimide resins, and the like. In reinforcing films for optical devices such as displays, the film substrate 1 is preferably a transparent film. In addition, when active light rays are irradiated from the side of the film base material 1 to perform photocuring of the adhesive layer 2, the film base material 1 preferably has transparency to the active light rays used for curing the adhesive layer. In terms of having both mechanical strength and transparency, polyester resins such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate can be used favorably. When the active light is irradiated from the side of the adherend to harden the adhesive layer, the adherend only needs to be transparent to the active light, and the film substrate 1 may be opaque to the active light.

於膜基材1之表面亦可設置易接著層、易滑層、脫模層、抗靜電層、硬塗層、抗反射層等功能性塗層。再者,如上所述,為了使膜基材1及黏著劑層2固著,於膜基材1之附設黏著劑層2之面較佳為未設置脫模層。Functional coatings such as an easy-to-adhesive layer, easy-slip layer, release layer, antistatic layer, hard coating layer, and anti-reflection layer can also be provided on the surface of the film substrate 1. Furthermore, as described above, in order to fix the film base material 1 and the adhesive layer 2, it is preferable that no release layer is provided on the surface of the film base material 1 where the adhesive layer 2 is attached.

<黏著劑層> 固著積層於膜基材11上之黏著劑層2包含含有基礎聚合物、光硬化劑及光聚合起始劑之光硬化性組合物。黏著劑層2由於光硬化前與裝置或裝置零件等被黏著體之接著力較小,因此容易二次加工。黏著劑層2由於與被黏著體之接著力藉由光硬化而提昇,因此於裝置之使用時,補強膜亦不易自裝置表面剝離,接著可靠性優異。<Adhesive layer> The adhesive layer 2 fixedly laminated on the film substrate 11 includes a photocurable composition containing a base polymer, a photocuring agent, and a photopolymerization initiator. Since the adhesive layer 2 has a small adhesive force with the adhered body such as the device or device parts before photocuring, secondary processing is easy. Since the adhesive force of the adhesive layer 2 with the adherend is improved by light curing, the reinforcing film is not easy to peel off from the surface of the device when the device is used, and the bonding reliability is excellent.

於補強膜用於顯示器等光學裝置之情形時,黏著劑層2之全光線透過率較佳為80%以上,更佳為85%以上,進而較佳為90%以上。黏著劑層2之霧度較佳為2%以下,更佳為1%以下,進而較佳為0.7%以下,尤佳為0.5%以下。When the reinforcing film is used in an optical device such as a display, the total light transmittance of the adhesive layer 2 is preferably 80% or more, more preferably 85% or more, and even more preferably 90% or more. The haze of the adhesive layer 2 is preferably 2% or less, more preferably 1% or less, still more preferably 0.7% or less, and particularly preferably 0.5% or less.

(基礎聚合物) 基礎聚合物係黏著劑組合物之主構成成分。基礎聚合物之種類並無特別限定,適當地選擇丙烯酸系聚合物、聚矽氧系聚合物、胺基甲酸酯系聚合物、橡膠系聚合物等即可。尤其是就光學透明性及接著性優異、且接著性之控制容易之方面而言,黏著劑組合物較佳為含有丙烯酸系聚合物作為基礎聚合物,且較佳為黏著劑組合物之50重量%以上為丙烯酸系聚合物。(Base polymer) The base polymer is the main component of the adhesive composition. The type of base polymer is not particularly limited, and acrylic polymer, silicone polymer, urethane polymer, rubber polymer, etc. may be appropriately selected. Especially in terms of excellent optical transparency and adhesiveness, and easy control of adhesiveness, the adhesive composition preferably contains an acrylic polymer as a base polymer, and is preferably 50% by weight of the adhesive composition % Or more is acrylic polymer.

作為丙烯酸系聚合物,可良好地使用包含(甲基)丙烯酸烷基酯作為主要單體成分者。再者,於本說明書中,所謂「(甲基)丙烯酸」,意指丙烯酸及/或甲基丙烯酸。As the acrylic polymer, those containing alkyl (meth)acrylate as a main monomer component can be used favorably. In addition, in this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.

作為(甲基)丙烯酸烷基酯,可良好地使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。(甲基)丙烯酸烷基酯之烷基可為直鏈亦可具有支鏈。作為(甲基)丙烯酸烷基酯之例,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸芳烷基酯等。As the alkyl (meth)acrylate, an alkyl (meth)acrylate whose alkyl group has 1 to 20 carbon atoms can be preferably used. The alkyl group of the alkyl (meth)acrylate may be linear or branched. Examples of alkyl (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, (meth) ) Second butyl acrylate, third butyl (meth)acrylate, pentyl (meth)acrylate, isoamyl (meth)acrylate, neopentyl (meth)acrylate, hexyl (meth)acrylate , Heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, (meth) Isononyl acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, isodecyl (meth)acrylate Tridecyl ester, tetradecyl (meth)acrylate, isotetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, Heptadecyl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, nonadecyl (meth)acrylate, (meth)acrylic acid Aralkyl esters and the like.

關於(甲基)丙烯酸烷基酯之含量,相對於構成基礎聚合物之單體成分總量較佳為40重量%以上,更佳為50重量%以上,進而較佳為55重量%以上。The content of the alkyl (meth)acrylate is preferably 40% by weight or more with respect to the total amount of monomer components constituting the base polymer, more preferably 50% by weight or more, and still more preferably 55% by weight or more.

丙烯酸系基礎聚合物含有具有能夠交聯之官能基之單體成分作為共聚成分。藉由於基礎聚合物中導入交聯結構,存在凝集力提昇,黏著劑層2之接著力提昇,並且二次加工時之於被黏著體之糊劑殘留減少之傾向。The acrylic base polymer contains a monomer component having a crosslinkable functional group as a copolymer component. Due to the introduction of a cross-linked structure in the base polymer, the cohesive force increases, the adhesive force of the adhesive layer 2 increases, and the paste residue on the adherend during secondary processing tends to decrease.

作為具有能夠交聯之官能基之單體,可列舉含羥基單體、或含羧基單體。基礎聚合物之羥基或羧基成為與後述交聯劑之反應點。例如,於使用異氰酸酯系交聯劑之情形時,較佳為含有含羥基單體作為基礎聚合物之共聚成分。於使用環氧系交聯劑之情形時,較佳為含有含羧基單體作為基礎聚合物之共聚成分。Examples of the monomer having a crosslinkable functional group include a hydroxyl group-containing monomer or a carboxyl group-containing monomer. The hydroxyl group or carboxyl group of the base polymer becomes the reaction point with the crosslinking agent mentioned later. For example, when an isocyanate-based crosslinking agent is used, it is preferably a copolymerization component containing a hydroxyl-containing monomer as a base polymer. When an epoxy-based crosslinking agent is used, it is preferably a copolymer component containing a carboxyl group-containing monomer as a base polymer.

作為含羥基單體,可列舉(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、(甲基)丙烯酸4-(羥甲基)環己基甲酯等。作為含羧基單體,可列舉(甲基)丙烯酸、(甲基)丙烯酸2-羧基乙酯、(甲基)丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等。Examples of hydroxyl-containing monomers include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, and 6-hydroxyhexyl (meth)acrylate. Ester, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, 4-(hydroxymethyl)cyclohexylmethyl (meth)acrylate Ester etc. Examples of carboxyl group-containing monomers include (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, Butenoic acid and so on.

丙烯酸系基礎聚合物中,含羥基單體與含羧基單體之合計量相對於構成單體成分總量較佳為1~30重量%,更佳為2~25重量%,進而較佳為3~20重量%。In the acrylic base polymer, the total amount of the hydroxyl group-containing monomer and the carboxyl group-containing monomer is preferably 1 to 30% by weight, more preferably 2 to 25% by weight, and still more preferably 3 relative to the total amount of constituent monomer components. ~20% by weight.

丙烯酸系基礎聚合物亦可含有N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-丙烯醯基𠰌啉、N-乙烯基羧醯胺類、N-乙烯基己內醯胺等含氮單體作為構成單體成分。The acrylic base polymer may also contain N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperidine, vinylpyrrolidone, vinyl Nitrogen-containing monomers such as pyrrole, vinyl imidazole, vinyl azole, vinyl oxoline, N-acryloyl oxoline, N-vinyl carboxamides, and N-vinyl caprolactam as constituent monomers ingredient.

丙烯酸系基礎聚合物亦可包含除上述以外之單體成分。丙烯酸系基礎聚合物例如亦可包含乙烯酯單體、芳香族乙烯基單體、含環氧基單體、乙烯醚單體、含磺基單體、含磷酸基單體、含酸酐基單體等作為單體成分。The acrylic base polymer may also contain monomer components other than the above. The acrylic base polymer may also include, for example, vinyl ester monomers, aromatic vinyl monomers, epoxy group-containing monomers, vinyl ether monomers, sulfo group-containing monomers, phosphoric acid group-containing monomers, and acid anhydride group-containing monomers. Etc. as monomer components.

導入交聯結構之前之基礎聚合物亦可為實質上不含氮原子者。基礎聚合物之構成元素中之氮之比率亦可為0.1莫耳%以下、0.05莫耳%以下、0.01莫耳%以下、0.005莫耳%以下、0.001莫耳%以下、或0。藉由使用實質上不含氮原子之基礎聚合物,存在抑制對被黏著體進行過表面活化處理之情形時光硬化前之黏著劑層之接著力(初期接著力)上升之傾向。The base polymer before the introduction of the cross-linked structure may be substantially free of nitrogen atoms. The ratio of nitrogen in the constituent elements of the base polymer may be 0.1 mol% or less, 0.05 mol% or less, 0.01 mol% or less, 0.005 mol% or less, 0.001 mol% or less, or 0. By using a base polymer that does not substantially contain nitrogen atoms, there is a tendency to suppress the increase in the adhesive force (initial adhesive force) of the adhesive layer before photocuring when the surface activation treatment is performed on the adherend.

藉由不使用含氰基單體、含內醯胺結構單體、含醯胺基單體、含𠰌啉環單體等含氮原子單體作為基礎聚合物之構成單體成分,可獲得實質上不含氮原子之基礎聚合物。於基礎聚合物實質上不含氮原子之情形時,就提高黏著劑之凝集性之觀點而言,基礎聚合物亦較佳為包含含羧基單體作為單體成分。By not using nitrogen atom-containing monomers such as cyano group-containing monomers, internal amide structure monomers, amine group-containing monomers, and pholine ring-containing monomers as the constituent monomer components of the basic polymer, the essential The base polymer does not contain nitrogen atoms. In the case where the base polymer does not substantially contain nitrogen atoms, from the viewpoint of improving the cohesiveness of the adhesive, the base polymer also preferably contains a carboxyl group-containing monomer as a monomer component.

光硬化前之黏著劑之接著特性容易受基礎聚合物之構成成分及分子量影響。有基礎聚合物之分子量越大,則黏著劑變得越硬之傾向。丙烯酸系基礎聚合物之重量平均分子量較佳為10萬~500萬,更佳為30萬~300萬,進而較佳為50萬~200萬。再者,於基礎聚合物中導入交聯結構之情形時,所謂基礎聚合物之分子量,係指交聯結構導入前之分子量。The adhesive properties of the adhesive before photocuring are easily affected by the composition and molecular weight of the base polymer. The greater the molecular weight of the base polymer, the harder the adhesive tends to become. The weight average molecular weight of the acrylic base polymer is preferably 100,000 to 5 million, more preferably 300,000 to 3 million, and still more preferably 500,000 to 2 million. Furthermore, when a cross-linked structure is introduced into the base polymer, the molecular weight of the base polymer refers to the molecular weight before the introduction of the cross-linked structure.

藉由使基礎聚合物包含高Tg單體作為構成單體成分,存在黏著劑之凝集力提昇、光硬化前二次加工性優異、光硬化後表現出較高之接著可靠性之傾向。所謂高Tg單體,意指均聚物之玻璃轉移溫度(Tg)較高之單體。作為均聚物之Tg為40℃以上之單體,可列舉:甲基丙烯酸雙環戊酯(Tg:175℃)、丙烯酸雙環戊酯(Tg:120℃)、甲基丙烯酸異𦯉酯(Tg:173℃)、丙烯酸異𦯉酯(Tg:97℃)、甲基丙烯酸甲酯(Tg:105℃)、甲基丙烯酸1-金剛烷基酯(Tg:250℃)、丙烯酸1-金剛烷基酯(Tg:153℃)等(甲基)丙烯酸酯;丙烯醯𠰌啉(Tg:145℃)、二甲基丙烯醯胺(Tg:119℃)、二乙基丙烯醯胺(Tg:81℃)、二甲胺基丙基丙烯醯胺(Tg:134℃)、異丙基丙烯醯胺(Tg:134℃)、羥乙基丙烯醯胺(Tg:98℃)等含醯胺基之乙烯基單體;甲基丙烯酸(Tg:228℃)、丙烯酸(Tg:106℃)等酸單體;N-乙烯基吡咯啶酮(Tg:54℃)等。By including a high Tg monomer as a constituent monomer component in the base polymer, there is a tendency that the cohesive force of the adhesive is improved, the secondary processability before photocuring is excellent, and the adhesion reliability after photocuring is higher. The so-called high Tg monomer means a monomer with a higher glass transition temperature (Tg) of the homopolymer. Monomers with homopolymers having a Tg of 40°C or higher include: dicyclopentyl methacrylate (Tg: 175°C), dicyclopentyl acrylate (Tg: 120°C), and iso-methacrylate (Tg: 173°C), isopropyl acrylate (Tg: 97°C), methyl methacrylate (Tg: 105°C), 1-adamantyl methacrylate (Tg: 250°C), 1-adamantyl acrylate (Tg: 153°C) and other (meth)acrylates; acrylamide (Tg: 145°C), dimethyl acrylamide (Tg: 119°C), diethyl acrylamide (Tg: 81°C) , Dimethylaminopropyl acrylamide (Tg: 134°C), isopropylacrylamide (Tg: 134°C), hydroxyethyl acrylamide (Tg: 98°C) and other vinyl groups containing amide groups Monomers; acid monomers such as methacrylic acid (Tg: 228°C) and acrylic acid (Tg: 106°C); N-vinylpyrrolidone (Tg: 54°C) and the like.

丙烯酸系基礎聚合物中,均聚物之Tg為40℃以上之單體之含量相對於構成單體成分總量較佳為1~50重量%,更佳為3~40重量%。為了形成具有適度之硬度而二次加工性優異之黏著劑層,作為基礎聚合物之單體成分,較佳為包含均聚物之Tg為80℃以上之單體成分,更佳為包含均聚物之Tg為100℃以上之單體成分。丙烯酸系基礎聚合物中,均聚物之Tg為100℃以上之單體之含量相對於構成單體成分總量較佳為0.1重量%以上,更佳為0.5重量%以上,進而較佳為1重量%以上,尤佳為3重量%以上。In the acrylic base polymer, the content of the monomer whose Tg of the homopolymer is 40° C. or higher is preferably 1 to 50% by weight, and more preferably 3 to 40% by weight, relative to the total amount of constituent monomer components. In order to form an adhesive layer with moderate hardness and excellent secondary processability, the monomer component of the base polymer preferably includes a monomer component with a homopolymer having a Tg of 80°C or higher, and more preferably includes a homopolymer The Tg of the material is a monomer component above 100°C. In the acrylic base polymer, the content of the monomer having a Tg of 100°C or higher in the homopolymer is preferably 0.1% by weight or more, more preferably 0.5% by weight or more, and more preferably 1 % By weight or more, particularly preferably 3% by weight or more.

藉由將上述單體成分利用溶液聚合、乳化聚合、塊狀聚合等各種公知之方法進行聚合,可獲得作為基礎聚合物之丙烯酸系聚合物。就黏著劑之接著力、保持力等特性之平衡、或成本等觀點而言,較佳為溶液聚合法。作為溶液聚合之溶劑,使用乙酸乙酯、甲苯等。溶液濃度通常為20~80重量%左右。作為溶液聚合所使用之聚合起始劑,可使用偶氮系、過氧化物系等各種公知者。為了對分子量進行調整,可使用鏈轉移劑。反應溫度通常為50~80℃左右,反應時間通常為1~8小時左右。By polymerizing the above-mentioned monomer components by various known methods such as solution polymerization, emulsion polymerization, and bulk polymerization, an acrylic polymer as a base polymer can be obtained. From the viewpoint of the balance of properties such as adhesive force and retention force of the adhesive, or the viewpoint of cost, the solution polymerization method is preferred. As a solvent for solution polymerization, ethyl acetate, toluene, etc. are used. The concentration of the solution is usually about 20 to 80% by weight. As the polymerization initiator used in the solution polymerization, various known ones such as azo-based and peroxide-based can be used. In order to adjust the molecular weight, a chain transfer agent can be used. The reaction temperature is usually about 50 to 80°C, and the reaction time is usually about 1 to 8 hours.

(低聚物) 黏著劑組合物除基礎聚合物以外可包含低聚物。例如,黏著劑組合物除丙烯酸系基礎聚合物以外可包含丙烯酸系低聚物。作為低聚物,可使用重量平均分子量為1000~30000左右者。丙烯酸系低聚物含有(甲基)丙烯酸烷基酯作為主要構成單體成分。就提高光硬化後之黏著劑層2之接著力之觀點而言,丙烯酸系低聚物之玻璃轉移溫度較佳為40℃以上,更佳為50℃以上。低聚物與基礎聚合物同樣地,可包含能夠交聯之官能基。(Oligomer) The adhesive composition may include oligomers in addition to the base polymer. For example, the adhesive composition may include acrylic oligomers in addition to the acrylic base polymer. As the oligomer, those having a weight average molecular weight of about 1,000 to 30,000 can be used. The acrylic oligomer contains alkyl (meth)acrylate as a main constituent monomer component. From the viewpoint of improving the adhesive force of the adhesive layer 2 after photocuring, the glass transition temperature of the acrylic oligomer is preferably 40°C or higher, more preferably 50°C or higher. Like the base polymer, the oligomer may contain a functional group capable of crosslinking.

黏著劑組合物中之低聚物之含量並無特別限定。於黏著劑組合物除丙烯酸系基礎聚合物以外含有丙烯酸系低聚物之情形時,就將接著力調整至適當之範圍之觀點而言,低聚物之量相對於基礎聚合物100重量份較佳為0.1~20重量份,更佳為0.3~10重量份,進而較佳為0.5~5重量份。The content of the oligomer in the adhesive composition is not particularly limited. When the adhesive composition contains acrylic oligomers in addition to the acrylic base polymer, from the viewpoint of adjusting the adhesive force to an appropriate range, the amount of the oligomer is relatively high relative to 100 parts by weight of the base polymer. It is preferably 0.1 to 20 parts by weight, more preferably 0.3 to 10 parts by weight, and still more preferably 0.5 to 5 parts by weight.

(交聯劑) 藉由向基礎聚合物中導入交聯結構,能夠使黏著劑具有適度之凝集力。例如,藉由於使基礎聚合物進行聚合後之溶液中添加交聯劑並視需要進行加熱,而導入交聯結構。交聯劑於1分子中具有2個以上之交聯性官能基。交聯劑亦可為1分子中具有3個以上之交聯性官能基者。(Crosslinking agent) By introducing a cross-linked structure into the base polymer, the adhesive can have a moderate cohesive force. For example, a crosslinking structure is introduced by adding a crosslinking agent to the solution after polymerizing the base polymer and heating as necessary. The crosslinking agent has two or more crosslinkable functional groups in one molecule. The crosslinking agent may have 3 or more crosslinkable functional groups in one molecule.

作為交聯劑,可列舉異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。該等交聯劑與導入至基礎聚合物中之羥基或羧基等官能基反應而形成交聯結構。就與基礎聚合物之羥基或羧基之反應性較高、容易導入交聯結構之方面而言,較佳為異氰酸酯系交聯劑及環氧系交聯劑。Examples of the crosslinking agent include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, azoline-based crosslinking agents, aziridine-based crosslinking agents, carbodiimide-based crosslinking agents, and metal chelate compounds. Department of crosslinking agent and so on. These crosslinking agents react with functional groups such as hydroxyl or carboxyl groups introduced into the base polymer to form a crosslinked structure. In terms of high reactivity with the hydroxyl group or carboxyl group of the base polymer and easy introduction of a crosslinked structure, isocyanate-based crosslinking agents and epoxy-based crosslinking agents are preferred.

作為異氰酸酯系交聯劑,使用1分子中具有2個以上異氰酸酯基之多異氰酸酯。異氰酸酯系交聯劑亦可為1分子中具有3個以上之異氰酸酯基者。作為異氰酸酯系交聯劑,例如可列舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族多異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲伸苯基二異氰酸酯、4,4'-二苯甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲伸苯基二異氰酸酯三聚物加成物(例如,Tosoh製造之「Coronate L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(例如,Tosoh製造之「Coronate HL」)、苯二甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學製造之「Takenate D110N」)、六亞甲基二異氰酸酯之三聚異尿酸酯體(例如,Tosoh製造之「Coronate HX」)等異氰酸酯加成物等。As the isocyanate-based crosslinking agent, a polyisocyanate having two or more isocyanate groups in one molecule is used. The isocyanate-based crosslinking agent may have three or more isocyanate groups in one molecule. As the isocyanate-based crosslinking agent, for example, lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; cyclopentyl diisocyanate, cyclohexyl diisocyanate, isophorone diisocyanate, etc. Alicyclic isocyanates; aromatic isocyanates such as 2,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane/phenylene diisocyanate Diisocyanate trimer adduct (for example, "Coronate L" manufactured by Tosoh), trimethylolpropane/hexamethylene diisocyanate adduct (for example, "Coronate HL" manufactured by Tosoh), Trimethylolpropane adduct of xylylene diisocyanate (for example, "Takenate D110N" manufactured by Mitsui Chemicals), trimeric isourate of hexamethylene diisocyanate (for example, "Coronate" manufactured by Tosoh) HX”) and other isocyanate adducts.

作為環氧系交聯劑,可使用1分子中具有2個以上環氧基之多官能環氧化合物。環氧系交聯劑亦可為1分子中具有3個以上或4個以上之環氧基者。環氧系交聯劑之環氧基可為縮水甘油基。作為環氧系交聯劑,例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、山梨糖醇聚縮水甘油醚、甘油聚縮水甘油醚、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚、山梨糖醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥基乙基)三聚異氰酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙酚-S-二縮水甘油醚等。作為環氧系交聯劑,亦可使用Nagase chemteX製造之「DENACOL」、Mitsubishi Gas Chemical製造之「Tetrad X」「Tetrad C」等市售品。As the epoxy-based crosslinking agent, a polyfunctional epoxy compound having two or more epoxy groups in one molecule can be used. The epoxy-based crosslinking agent may have 3 or more or 4 or more epoxy groups in one molecule. The epoxy group of the epoxy-based crosslinking agent may be a glycidyl group. Examples of epoxy-based crosslinking agents include: N,N,N',N'-tetraglycidyl-meta-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-di Glycidyl amino methyl) cyclohexane, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene two Alcohol diglycidyl ether, polypropylene glycol diglycidyl ether, sorbitol polyglycidyl ether, glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether, sorbitan polyglycidyl ether, three Hydroxymethyl propane polyglycidyl ether, diglycidyl adipate, diglycidyl phthalate, tris(2-hydroxyethyl) triglycidyl isocyanate, resorcinol diglycidyl Glyceryl ether, bisphenol-S-diglycidyl ether, etc. As the epoxy-based crosslinking agent, commercially available products such as "DENACOL" manufactured by Nagase chemteX and "Tetrad X" and "Tetrad C" manufactured by Mitsubishi Gas Chemical can also be used.

即便於基礎聚合物實質上不含氮原子之情形時,交聯劑亦可包含氮原子。例如可於實質上不含氮原子之基礎聚合物中藉由異氰酸酯交聯劑導入交聯結構。於基礎聚合物實質上不含氮原子之情形時,藉由使用環氧系交聯劑等不含氮原子之交聯劑,存在因電漿處理等表面活化處理之有無而引起之初期接著力之差變得更小之傾向。Even when the base polymer does not substantially contain nitrogen atoms, the crosslinking agent may contain nitrogen atoms. For example, an isocyanate crosslinking agent can be used to introduce a crosslinked structure into a base polymer that does not substantially contain nitrogen atoms. When the base polymer contains substantially no nitrogen atoms, by using crosslinking agents that do not contain nitrogen atoms such as epoxy-based crosslinking agents, there is an initial adhesion caused by the presence or absence of surface activation treatments such as plasma treatment The tendency of the difference to become smaller.

交聯劑之使用量只要根據基礎聚合物之組成或分子量等適當地調整即可。交聯劑之使用量相對於基礎聚合物100重量份為0.01~10重量份左右,較佳為0.1~7重量份,更佳為0.2~6重量份,進而較佳為0.3~5重量份。又,交聯劑相對於基礎聚合物100重量份之使用量(重量份)除以交聯劑之官能基當量(g/eq)所得之值較佳為0.00015~0.11,更佳為0.001~0.077,進而較佳為0.003~0.055,尤佳為0.0045~0.044。藉由使交聯劑之使用量大於以永久接著為目的之普通之丙烯酸系之光學用透明黏著劑而使黏著劑具有適度之硬度,存在二次加工時之於被黏著體之糊劑殘留減少、二次加工性提昇之傾向。The amount of the crosslinking agent used may be appropriately adjusted according to the composition or molecular weight of the base polymer. The amount of the crosslinking agent used is about 0.01 to 10 parts by weight relative to 100 parts by weight of the base polymer, preferably 0.1 to 7 parts by weight, more preferably 0.2 to 6 parts by weight, and still more preferably 0.3 to 5 parts by weight. In addition, the amount (parts by weight) of the crosslinking agent used relative to 100 parts by weight of the base polymer divided by the functional group equivalent (g/eq) of the crosslinking agent is preferably 0.00015 to 0.11, more preferably 0.001 to 0.077 , More preferably 0.003 to 0.055, particularly preferably 0.0045 to 0.044. By making the use amount of crosslinking agent larger than the ordinary acrylic optical transparent adhesive for permanent bonding, the adhesive has moderate hardness, and the paste residue on the adherend during secondary processing is reduced. , The tendency of secondary processing to improve.

(交聯促進劑) 黏著劑組合物除交聯劑以外包含交聯促進劑。藉由使用交聯促進劑,能夠使交聯反應(交聯結構向基礎聚合物之導入)有效率地進行。又,藉由使用交聯促進劑向基礎聚合物中導入交聯結構,存在補強膜之黏著劑層對表面進行過活化處理之被黏著體亦表現出較低之初期接著力之傾向。(Crosslinking accelerator) The adhesive composition contains a crosslinking accelerator in addition to the crosslinking agent. By using a cross-linking accelerator, the cross-linking reaction (introduction of the cross-linked structure to the base polymer) can proceed efficiently. In addition, by using a cross-linking accelerator to introduce a cross-linked structure into the base polymer, there is a tendency for the adherend whose surface has been activated by the adhesive layer of the reinforcing film to exhibit lower initial adhesion.

作為交聯促進劑,可列舉有機金屬錯合物(螯合物)、金屬與烷氧基之化合物、及金屬與醯氧基之化合物等有機金屬化合物;以及三級胺等。尤其是就抑制常溫之溶液狀態下之交聯反應之進行、確保黏著劑組合物之適用期之觀點而言,較佳為有機金屬化合物。又,就容易遍佈黏著劑層之整個厚度方向導入均一之交聯結構之方面而言,作為交聯促進劑,較佳為常溫下為液體之有機金屬化合物。As the crosslinking accelerator, organometallic compounds such as organometallic complexes (chelates), compounds of metals and alkoxy groups, and compounds of metals and alkoxy groups; and tertiary amines. In particular, from the viewpoint of suppressing the progress of the cross-linking reaction in a solution state at room temperature and ensuring the pot life of the adhesive composition, an organometallic compound is preferred. In addition, in terms of easily introducing a uniform crosslinking structure throughout the entire thickness direction of the adhesive layer, the crosslinking accelerator is preferably an organometallic compound that is liquid at room temperature.

作為有機金屬化合物之金屬,可列舉鐵、錫、鋁、鋯、鋅、鈦、鉛、鈷、鋅等。Examples of the metal of the organometallic compound include iron, tin, aluminum, zirconium, zinc, titanium, lead, cobalt, zinc, and the like.

作為鐵系交聯促進劑,可列舉:三(乙醯丙酮)鐵、三(己烷-2,4-二酮)鐵、三(庚烷-2,4-二酮)鐵、三(庚烷-3,5-二酮)鐵、三(5-甲基己烷-2,4-二酮)鐵、三(辛烷-2,4-二酮)鐵、三(6-甲基庚烷-2,4-二酮)鐵、三(2,6-二甲基庚烷-3,5-二酮)鐵、三(壬烷-2,4-二酮)鐵、三(壬烷-4,6-二酮)鐵、三(2,2,6,6-四甲基庚烷-3,5-二酮)鐵、三(十三烷-6,8-二酮)鐵、三(1-苯基丁烷-1,3-二酮)鐵、三(六氟乙醯丙酮)鐵、三(乙醯乙酸乙酯)鐵、三(乙醯乙酸正丙酯)鐵、三(乙醯乙酸異丙酯)鐵、三(乙醯乙酸正丁酯)鐵、三(乙醯乙酸第二丁酯)鐵、三(乙醯乙酸第三丁酯)鐵、三(丙醯乙酸甲酯)鐵、三(丙醯乙酸乙酯)鐵、三(丙醯乙酸正丙酯)鐵、三(丙醯乙酸異丙酯)鐵、三(丙醯乙酸正丁酯)鐵、三(丙醯乙酸第二丁酯)鐵、三(丙醯乙酸第三丁酯)鐵、三(乙醯乙酸苄酯)鐵、三(丙二酸二甲酯)鐵、三(丙二酸二乙酯)鐵、三甲醇鐵、三乙醇鐵、三異丙醇鐵等。Examples of iron-based crosslinking accelerators include tris(acetone) iron, tris(hexane-2,4-diketone) iron, tris(heptane-2,4-diketone) iron, tris(heptane) iron Alkane-3,5-dione)iron, tris(5-methylhexane-2,4-dione)iron, tris(octane-2,4-dione)iron, tris(6-methylheptane) Alkane-2,4-dione)iron, tris(2,6-dimethylheptane-3,5-dione)iron, tris(nonane-2,4-dione)iron, tris(nonane) -4,6-diketone) iron, tris(2,2,6,6-tetramethylheptane-3,5-dione) iron, tris(tridecane-6,8-dione) iron, Tris(1-phenylbutane-1,3-dione) iron, tris(hexafluoroacetone acetone) iron, tris(ethyl acetylacetate) iron, tris(n-propyl acetylacetate) iron, tris (Isopropyl Acetate) Iron, Tris(n-Butyl Acetate) Iron, Tris(Second Butyl Acetate) Iron, Tris(Tterbutyl Acetate) Iron, Tris(Acetyl Acetate) Methyl ester) iron, tris(ethyl acrylate) iron, tris(n-propyl propyl acetate) iron, tris(isopropyl propyl acetate) iron, tris(n-butyl propyl acetate) iron, tris( (2-butyl acrylate) iron, tris(tert-butyl acrylate) iron, tris(benzyl acetylacetate) iron, tris(dimethyl malonate) iron, tris(diethyl malonate) Ester) iron, iron trimethoxide, iron triethanol, iron triisopropoxide, etc.

作為錫系交聯促進劑,可列舉:二氯化二丁基錫、氧化二丁基錫、二溴化二丁基錫、馬來酸二丁基錫、二月桂酸二丁基錫、二乙酸二丁基錫、硫化二丁基錫、甲氧化三丁基錫、乙酸三丁基錫、乙氧化三乙基錫、乙氧化三丁基錫、氧化二辛基錫、二月桂酸二辛基錫、氯化三丁基錫、三氯乙酸三丁基錫、2-乙基己酸錫等。Examples of tin-based crosslinking accelerators include: dibutyltin dichloride, dibutyltin oxide, dibutyltin dibromide, dibutyltin maleate, dibutyltin dilaurate, dibutyltin diacetate, dibutyltin sulfide, methoxide Tributyl tin, tributyl tin acetate, triethyl tin ethoxide, tributyl tin ethoxide, dioctyl tin oxide, dioctyl tin dilaurate, tributyl tin chloride, tributyl tin trichloroacetate, 2-ethylhexanoic acid Tin etc.

作為鋁系交聯促進劑,可列舉:二異丙醇單第二丁醇鋁、第二丁醇鋁、異丙醇鋁、乙醇鋁、乙醯乙酸乙酯二異丙醇鋁、三乙醯乙酸乙酯鋁、乙醯乙酸烷基酯二異丙醇鋁、單乙醯丙酮雙(乙醯乙酸乙酯)鋁、三乙醯丙酮鋁等。Examples of aluminum-based crosslinking accelerators include: aluminum diisopropoxide, aluminum diisopropoxide, aluminum dibutoxide, aluminum isopropoxide, aluminum ethoxide, ethyl acetate, aluminum diisopropoxide, and triacetate. Aluminum ethyl acetate, Alkyl Acetate Acetate Aluminum Diisopropoxide, Monoacetone Bis(Acetate Acetate) Aluminum, Triacetone Aluminum, etc.

作為鋯系交聯促進劑,可列舉四乙醯丙酮鋯、單乙醯丙酮鋯、三丁醇單丙酮鋯、環烷酸鋯、丙醇鋯、丁醇鋯等。As the zirconium-based crosslinking accelerator, zirconium tetraacetone acetonate, zirconium monoacetone acetonate, zirconium tributoxide monoacetone, zirconium naphthenate, zirconium propoxide, zirconium butoxide, etc. may be mentioned.

作為鋅系交聯促進劑,可列舉環烷酸鋅、2-乙基己酸鋅等。Examples of the zinc-based crosslinking accelerator include zinc naphthenate, zinc 2-ethylhexanoate, and the like.

作為鈦系交聯促進劑,可列舉:二氯化二丁基鈦、鈦酸四丁酯、鈦酸四異丙酯、鈦酸四辛酯、三氯化丁醇鈦、乙醯丙酮鈦、四乙醯丙酮鈦、乙醯乙酸乙酯鈦、乳酸鈦銨鹽、三乙醇胺鈦、二異丙醇雙乙醯丙酮鈦、異硬脂酸鈦、二乙醇胺鈦、胺基乙基胺基乙醇鈦等。As the titanium-based crosslinking accelerator, dibutyl titanium dichloride, tetrabutyl titanate, tetraisopropyl titanate, tetraoctyl titanate, titanium butoxide trichloride, titanium acetone, Titanium tetraacetylacetone, titanium ethyl acetate, titanium ammonium lactate, titanium triethanolamine, titanium diisopropanol diacetone, titanium isostearate, titanium diethanolamine, titanium ethylaminoethyl ethoxide Wait.

作為鉛系交聯促進劑,可列舉油酸鉛、2-乙基己酸鉛、苯甲酸鉛、環烷酸鉛等。Examples of lead-based crosslinking accelerators include lead oleate, lead 2-ethylhexanoate, lead benzoate, and lead naphthenate.

作為鈷系交聯促進劑,可列舉2-乙基己酸鈷、苯甲酸鈷等。Examples of cobalt-based crosslinking accelerators include cobalt 2-ethylhexanoate and cobalt benzoate.

交聯促進劑之使用量只要根據交聯劑之種類及使用量、以及交聯促進劑之種類適當地調整即可。交聯促進劑之使用量一般相對於基礎聚合物100重量份為0.001~2重量份左右。The use amount of the crosslinking accelerator may be appropriately adjusted according to the type and amount of the crosslinking agent, and the type of crosslinking accelerator. The usage amount of the crosslinking accelerator is generally about 0.001 to 2 parts by weight relative to 100 parts by weight of the base polymer.

於對環氧系交聯劑使用交聯促進劑之情形時,交聯促進劑之使用量相對於基礎聚合物100重量份較佳為0.01~2.0重量份。對於環氧系交聯劑,較佳為使用非錫系有機金屬作為交聯促進劑。於對異氰酸酯系交聯劑使用交聯促進劑之情形時,交聯促進劑之使用量較佳為0.001~0.1重量份。When a crosslinking accelerator is used for the epoxy-based crosslinking agent, the amount of the crosslinking accelerator used is preferably 0.01 to 2.0 parts by weight relative to 100 parts by weight of the base polymer. For the epoxy-based crosslinking agent, it is preferable to use a non-tin-based organic metal as the crosslinking accelerator. When a crosslinking accelerator is used for the isocyanate-based crosslinking agent, the amount of the crosslinking accelerator used is preferably 0.001 to 0.1 parts by weight.

黏著劑組合物亦可除交聯促進劑以外包含交聯延遲劑。藉由添加交聯延遲劑,能夠抑制常溫之溶液狀態下之交聯反應之進行,從而使黏著劑組合物之適用期變長。作為交聯延遲劑,可列舉乙醯乙酸甲酯、乙醯乙酸乙酯、乙醯乙酸辛酯、乙醯乙酸油酯、乙醯乙酸月桂酯、乙醯乙酸硬脂酯等β-酮酯;乙醯丙酮、2,4-己二酮、苯甲醯基丙酮等β-二酮;第三丁醇等醇類。其中,較佳為β-二酮,尤佳為乙醯丙酮。交聯延遲劑之使用量相對於黏著劑組合物總量100重量份為0.1~30重量份左右,較佳為25重量份以下,更佳為20重量份以下。The adhesive composition may also include a crosslinking retarder in addition to the crosslinking accelerator. By adding a crosslinking retarder, the progress of the crosslinking reaction in a solution state at room temperature can be inhibited, thereby prolonging the pot life of the adhesive composition. As the crosslinking retarder, β-ketoesters such as methyl acetylacetate, ethyl acetylacetate, octyl acetylacetate, oleyl acetylacetate, lauryl acetylacetate, and stearyl acetylacetate; Β-diketones such as acetone, 2,4-hexanedione, and benzylacetone; alcohols such as tertiary butanol. Among them, β-diketone is preferred, and acetone is particularly preferred. The amount of the crosslinking retarder used is about 0.1-30 parts by weight relative to 100 parts by weight of the total adhesive composition, preferably 25 parts by weight or less, and more preferably 20 parts by weight or less.

(光硬化劑) 構成黏著劑層2之黏著劑組合物除基礎聚合物以外含有光硬化劑。包含光硬化性之黏著劑組合物之黏著劑層2若於與被黏著體貼合後進行光硬化,則與被黏著體之接著力提昇。(Light Hardener) The adhesive composition constituting the adhesive layer 2 contains a light hardener in addition to the base polymer. If the adhesive layer 2 containing the photocurable adhesive composition is photocured after being bonded to the adherend, the adhesive force with the adherend is improved.

光硬化劑於1分子中具有2個以上之聚合性官能基。作為聚合性官能基,較佳為具有基於光自由基反應之聚合性者,作為光硬化劑,較佳為於1分子中具有2個以上之乙烯性不飽和鍵之化合物。又,光硬化劑較佳為表現出與基礎聚合物之相溶性之化合物。就表現出與基礎聚合物之適度之相溶性之方面而言,光硬化劑較佳為常溫下為液體者。藉由使光硬化劑與基礎聚合物相溶且於組合物中均勻地分散,能夠確保與被黏著體之接觸面積,且能夠形成透明性較高之黏著劑層2。又,藉由使基礎聚合物與光硬化劑表現出適度之相溶性,容易於光硬化後之黏著劑層2內均勻地導入藉由光硬化劑而得之交聯結構,從而存在與被黏著體之接著力適當地上升之傾向。The light hardener has two or more polymerizable functional groups in one molecule. As the polymerizable functional group, those having polymerizability based on photoradical reaction are preferred, and as the light curing agent, a compound having two or more ethylenically unsaturated bonds in one molecule is preferred. In addition, the light hardener is preferably a compound exhibiting compatibility with the base polymer. In terms of exhibiting moderate compatibility with the base polymer, the light hardener is preferably one that is liquid at room temperature. By dissolving the light hardener and the base polymer and uniformly dispersing in the composition, the contact area with the adherend can be ensured, and the adhesive layer 2 with higher transparency can be formed. In addition, by making the base polymer and the light hardening agent have moderate compatibility, it is easy to uniformly introduce the cross-linked structure obtained by the light hardening agent into the adhesive layer 2 after light hardening, so as to exist and be adhered The tendency of the adhesion of the body to rise appropriately.

基礎聚合物與光硬化劑之相溶性主要受化合物之結構之影響。化合物之結構與相溶性例如可藉由Hansen溶解度參數進行評價,存在基礎聚合物與光硬化劑之溶解度參數之差越小,相溶性變得越高之傾向。The compatibility of the base polymer and the light hardener is mainly affected by the structure of the compound. The structure and compatibility of the compound can be evaluated by, for example, the Hansen solubility parameter. The smaller the difference between the solubility parameter of the base polymer and the light hardener, the higher the compatibility.

就與丙烯酸系基礎聚合物之相溶性較高之方面而言,較佳為使用多官能(甲基)丙烯酸酯作為光硬化劑。作為多官能(甲基)丙烯酸酯,可列舉:聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯、雙酚A環氧乙烷改性二(甲基)丙烯酸酯、雙酚A環氧丙烷改性二(甲基)丙烯酸酯、烷二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、乙氧化異三聚氰酸三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、乙氧化季戊四醇四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇聚(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、(甲基)丙烯酸胺基甲酸酯、環氧(甲基)丙烯酸酯、丁二烯(甲基)丙烯酸酯、異戊二烯(甲基)丙烯酸酯等。該等之中,就與丙烯酸系基礎聚合物之相溶性優異之方面而言,較佳為聚乙二醇二(甲基)丙烯酸酯或聚丙二醇二(甲基)丙烯酸酯,尤佳為聚乙二醇二(甲基)丙烯酸酯。In terms of high compatibility with the acrylic base polymer, it is preferable to use a polyfunctional (meth)acrylate as a light hardener. Examples of polyfunctional (meth)acrylates include polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, Bisphenol A ethylene oxide modified di(meth)acrylate, bisphenol A propylene oxide modified di(meth)acrylate, alkanediol di(meth)acrylate, tricyclodecane dimethanol Di(meth)acrylate, ethoxylated isocyanuric acid tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(methyl) ) Acrylate, di-trimethylolpropane tetra(meth)acrylate, ethoxylated pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate, two Pentaerythritol hexa(meth)acrylate, neopentyl glycol di(meth)acrylate, glycerol di(meth)acrylate, (meth)acrylate urethane, epoxy (meth)acrylate, Butadiene (meth)acrylate, isoprene (meth)acrylate, etc. Among them, in terms of excellent compatibility with acrylic base polymers, polyethylene glycol di(meth)acrylate or polypropylene glycol di(meth)acrylate is preferred, and poly(meth)acrylate is particularly preferred. Ethylene glycol di(meth)acrylate.

基礎聚合物與光硬化劑之相溶性亦受化合物之分子量影響。存在光硬化性化合物之分子量越小,與基礎聚合物之相溶性變得越高之傾向。就與基礎聚合物之相溶性之觀點而言,光硬化劑之分子量較佳為1500以下,更佳為1000以下,進而較佳為500以下,尤佳為400以下。The compatibility of the base polymer and the light hardener is also affected by the molecular weight of the compound. There is a tendency that the lower the molecular weight of the photocurable compound, the higher the compatibility with the base polymer. From the viewpoint of compatibility with the base polymer, the molecular weight of the light hardener is preferably 1500 or less, more preferably 1000 or less, still more preferably 500 or less, and particularly preferably 400 or less.

就與基礎聚合物之相溶性較高、且提昇光硬化後之接著力之觀點而言,光硬化劑之官能基當量(g/eq)較佳為500以下,更佳為400以下,進而較佳為300以下,尤佳為200以下。另一方面,若光硬化劑之官能基當量過小,則存在光硬化後之黏著劑層之交聯點密度變高、接著性降低之情況。因此,光硬化劑之官能基當量較佳為80以上,更佳為100以上,進而較佳為130以上。From the viewpoint of high compatibility with the base polymer and improvement of the adhesive force after light curing, the functional group equivalent (g/eq) of the light curing agent is preferably 500 or less, more preferably 400 or less, and more Preferably it is 300 or less, particularly preferably 200 or less. On the other hand, if the functional group equivalent of the photocuring agent is too small, the crosslinking point density of the adhesive layer after photocuring may increase and the adhesiveness may decrease. Therefore, the functional group equivalent of the light hardener is preferably 80 or more, more preferably 100 or more, and still more preferably 130 or more.

於丙烯酸系基礎聚合物與多官能丙烯酸酯光硬化劑之組合中,於光硬化劑之官能基當量較小之情形時,存在基礎聚合物與光硬化劑之相互作用較強,初期接著力上升,而引起二次加工性之降低之情況。就使光硬化前之黏著劑層2與被黏著體之接著力保持為適當之範圍之觀點而言,亦較佳為光硬化劑之官能基當量為上述範圍內。In the combination of acrylic base polymer and multifunctional acrylate light hardening agent, when the functional group equivalent of the light hardening agent is small, the interaction between the base polymer and the light hardening agent is stronger, and the initial adhesive force increases , And cause the reduction of secondary processing. From the viewpoint of keeping the adhesive force between the adhesive layer 2 before photocuring and the adherend in an appropriate range, it is also preferable that the functional group equivalent of the photocuring agent is within the above range.

黏著劑組合物中之光硬化劑之含量相對於基礎聚合物100重量份較佳為10~50重量份。藉由將光硬化劑之調配量設為上述範圍,能夠將光硬化後之黏著劑層與被黏著體之接著性調整至適當之範圍。光硬化劑之含量相對於基礎聚合物100重量份更佳為15~45重量份,進而較佳為20~40重量份。The content of the light hardener in the adhesive composition is preferably 10-50 parts by weight relative to 100 parts by weight of the base polymer. By setting the blending amount of the light curing agent within the above range, the adhesiveness of the adhesive layer after light curing and the adherend can be adjusted to an appropriate range. The content of the light hardener is more preferably 15 to 45 parts by weight, and still more preferably 20 to 40 parts by weight relative to 100 parts by weight of the base polymer.

(光聚合起始劑) 光聚合起始劑係藉由活性光線之照射而產生活性種,促進光硬化劑之硬化反應。作為光聚合起始劑,可根據光硬化劑之種類等而使用光陽離子起始劑(光酸產生劑)、光自由基起始劑、光陰離子起始劑(光鹼產生劑)等。於使用多官能丙烯酸酯等乙烯性不飽和化合物作為光硬化劑之情形時,較佳為使用光自由基起始劑作為聚合起始劑。(Photopolymerization initiator) The photopolymerization initiator is irradiated with active light to generate active species to promote the hardening reaction of the light hardener. As the photopolymerization initiator, a photocation initiator (photoacid generator), a photoradical initiator, a photoanion initiator (photobase generator), etc. can be used according to the kind of the photohardener or the like. When using an ethylenically unsaturated compound such as a polyfunctional acrylate as a light hardening agent, it is preferable to use a photo radical initiator as a polymerization initiator.

光自由基起始劑係藉由活性光線之照射而生成自由基,並藉由自光自由基起始劑向光硬化劑之自由基轉移而促進光硬化劑之自由基聚合反應。作為光自由基起始劑(光自由基產生劑),較佳為藉由波長短於450 nm之可見光或紫外線之照射生成自由基者,可列舉羥基酮類、苯偶醯二甲基縮酮類、胺基酮類、醯基膦氧化物類、二苯甲酮類、含三氯甲基之三𠯤衍生物等。光自由基起始劑可單獨使用,亦可將2種以上混合使用。The photo-radical initiator generates free radicals by the irradiation of active light, and promotes the radical polymerization reaction of the photo-hardener by free radical transfer from the photo-radical initiator to the photohardener. As the photo-radical initiator (photo-radical generator), it is preferable to generate free radicals by irradiation of visible light or ultraviolet light with a wavelength shorter than 450 nm, and examples include hydroxy ketones and benzyl dimethyl ketals. Ketones, aminoketones, phosphine oxides, benzophenones, trichloromethyl-containing three 𠯤 derivatives, etc. The photo-radical initiator may be used alone or in combination of two or more kinds.

於對黏著劑層2要求透明性之情形時,光聚合起始劑較佳為對長於400 nm之波長之光(可見光)之感度較小,例如可良好地使用波長405 nm下之吸光係數為1×102 [mL g-1 cm-1 ]以下之光聚合起始劑。When transparency is required for the adhesive layer 2, the photopolymerization initiator is preferably less sensitive to light with a wavelength longer than 400 nm (visible light), for example, the absorbance coefficient at a wavelength of 405 nm can be used well 1×10 2 [mL g -1 cm -1 ] or less photopolymerization initiator.

黏著劑層2中之光聚合起始劑之含量相對於基礎聚合物100重量份較佳為0.01~5重量份,更佳為0.02~3重量份,進而較佳為0.03~2重量份。黏著劑層2中之光聚合起始劑之含量相對於光硬化劑100重量份較佳為0.02~10重量份,更佳為0.05~7重量份,進而較佳為0.1~5重量份。The content of the photopolymerization initiator in the adhesive layer 2 is preferably 0.01 to 5 parts by weight, more preferably 0.02 to 3 parts by weight, and still more preferably 0.03 to 2 parts by weight relative to 100 parts by weight of the base polymer. The content of the photopolymerization initiator in the adhesive layer 2 is preferably 0.02 to 10 parts by weight, more preferably 0.05 to 7 parts by weight, and still more preferably 0.1 to 5 parts by weight relative to 100 parts by weight of the light hardener.

(其他添加劑) 除上述例示之各成分以外,黏著劑層亦可於無損本發明之特性之範圍內含有矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、抗氧化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑、界面活性劑、抗靜電劑等添加劑。(Other additives) In addition to the components exemplified above, the adhesive layer may also contain silane coupling agents, adhesiveness imparting agents, plasticizers, softeners, antioxidants, anti-deterioration agents, fillers, and coloring within the range that does not impair the characteristics of the present invention. Additives such as agents, ultraviolet absorbers, surfactants, and antistatic agents.

[補強膜之製作] 藉由於膜基材1上積層光硬化性之黏著劑層2,而獲得補強膜。黏著劑層2可於膜基材1上直接形成,亦可將於其他基材上片狀地形成之黏著劑層轉印至膜基材1上。[Production of Reinforcing Film] The photocurable adhesive layer 2 is laminated on the film substrate 1 to obtain a reinforced film. The adhesive layer 2 can be directly formed on the film substrate 1, or an adhesive layer formed in a sheet form on another substrate can be transferred to the film substrate 1.

藉由將上述黏著劑組合物利用輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥式刷塗、噴塗、浸漬輥塗佈、棒式塗佈、刮塗、氣刀刮塗、淋幕式塗佈、唇板塗佈、模嘴塗佈等塗佈於基材上,並視需要將溶劑進行乾燥去除,而形成黏著劑層。作為乾燥方法,可酌情採用適當之方法。加熱乾燥溫度較佳為40℃~200℃,更佳為50℃~180℃,進而較佳為70℃~170℃。乾燥時間較佳為5秒~20分鐘,更佳為5秒~15分鐘,進而較佳為10秒~10分鐘。By applying the above-mentioned adhesive composition using roll coating, touch roll coating, gravure coating, reverse coating, roll brushing, spraying, dipping roll coating, bar coating, blade coating, gas Knife coating, curtain coating, lip coating, die nozzle coating, etc. are coated on the substrate, and the solvent is dried and removed as needed to form an adhesive layer. As the drying method, an appropriate method can be adopted as appropriate. The heating and drying temperature is preferably 40°C to 200°C, more preferably 50°C to 180°C, and still more preferably 70°C to 170°C. The drying time is preferably 5 seconds to 20 minutes, more preferably 5 seconds to 15 minutes, and still more preferably 10 seconds to 10 minutes.

黏著劑層2之厚度例如為1~300 μm左右。存在黏著劑層2之厚度越大,與被黏著體之接著性越會提昇之傾向。另一方面,於黏著劑層2之厚度過大之情形時,存在光硬化前之流動性較高、操作變得困難之情況。因此,黏著劑層2之厚度較佳為5~100 μm,更佳為8~50 μm,進而較佳為10~40 μm,尤佳為13~30 μm。The thickness of the adhesive layer 2 is, for example, about 1 to 300 μm. There is a tendency that the greater the thickness of the adhesive layer 2 is, the more the adhesion with the adherend will increase. On the other hand, when the thickness of the adhesive layer 2 is too large, the fluidity before photocuring may be high, and handling may become difficult. Therefore, the thickness of the adhesive layer 2 is preferably 5-100 μm, more preferably 8-50 μm, still more preferably 10-40 μm, and particularly preferably 13-30 μm.

較佳為與溶劑之乾燥同時、或於溶劑之乾燥後藉由加熱或老化進行交聯。加熱溫度或加熱時間係根據使用之交聯劑或交聯促進劑之種類適當地設定,通常於20℃~160℃之範圍藉由1分鐘至7天左右之加熱進行交聯。用以將溶劑進行乾燥去除之加熱亦可兼作用於交聯之加熱。Preferably, the crosslinking is performed simultaneously with the drying of the solvent or by heating or aging after the drying of the solvent. The heating temperature or heating time is appropriately set according to the type of cross-linking agent or cross-linking accelerator used, and cross-linking is usually performed by heating in the range of 20°C to 160°C for about 1 minute to 7 days. The heating used to dry and remove the solvent can also serve as the heating for crosslinking.

藉由於基礎聚合物中導入交聯結構,凝膠分率上升。存在凝膠分率越高,黏著劑越硬,於因二次加工等而自被黏著體剝離補強膜時,可抑制向被黏著體之糊劑殘留之傾向。光硬化前之黏著劑層2之凝膠分率較佳為30%以上,更佳為50%以上,進而較佳為60%以上,尤佳為65%以上。黏著劑層2之光硬化前之凝膠分率亦可為70%以上或75%以上。The introduction of a cross-linked structure into the base polymer increases the gel fraction. The higher the gel fraction, the harder the adhesive, and when the reinforcing film is peeled from the adherend due to secondary processing, etc., the tendency of the paste to remain on the adherend can be suppressed. The gel fraction of the adhesive layer 2 before photocuring is preferably 30% or more, more preferably 50% or more, still more preferably 60% or more, and particularly preferably 65% or more. The gel fraction of the adhesive layer 2 before light hardening can also be 70% or more or 75% or more.

由於黏著劑含有未反應之光硬化劑,故而光硬化前之黏著劑層2之凝膠分率一般為90%以下。若光硬化前之黏著劑層2之凝膠分率過大,則存在對被黏著體之抓固力降低、初期接著力變得不充分之情況。因此,光硬化前之黏著劑層2之凝膠分率較佳為85%以下,更佳為80%以下。Since the adhesive contains an unreacted light hardening agent, the gel fraction of the adhesive layer 2 before light hardening is generally below 90%. If the gel fraction of the adhesive layer 2 before photocuring is too large, the gripping force to the adherend may decrease, and the initial adhesive force may become insufficient. Therefore, the gel fraction of the adhesive layer 2 before photocuring is preferably 85% or less, and more preferably 80% or less.

凝膠分率可作為對乙酸乙酯等溶劑之不溶物而求出,具體而言,作為將黏著劑層於乙酸乙酯中於23℃下浸漬7天後之不溶成分相對於浸漬前之試樣之重量分率(單位:重量%)而求出。一般而言,聚合物之凝膠分率與交聯度相等,聚合物中之經交聯之部分越多,凝膠分率變得越大。因此,存在交聯劑之使用量(交聯性官能基之含量)越多,凝膠分率變得越大之傾向。又,藉由使用交聯促進劑,交聯劑之未反應官能基之量會減少,因此存在凝膠分率變大之傾向。光硬化前之黏著劑層2中,由於光硬化劑為未反應之狀態,故而光硬化劑之量越多,凝膠分率變得越小。The gel fraction can be determined as the insoluble matter in a solvent such as ethyl acetate. Specifically, as the insoluble matter after immersing the adhesive layer in ethyl acetate at 23°C for 7 days compared to the test before immersion The weight fraction of the sample (unit: weight %) is calculated. Generally speaking, the gel fraction of a polymer is equal to the degree of crosslinking. The more crosslinked parts in the polymer, the greater the gel fraction. Therefore, the more the amount of crosslinking agent used (the content of crosslinkable functional groups), the greater the gel fraction tends to be. In addition, by using a crosslinking accelerator, the amount of unreacted functional groups of the crosslinking agent is reduced, so there is a tendency for the gel fraction to increase. In the adhesive layer 2 before photocuring, since the photocuring agent is in an unreacted state, the greater the amount of the photocuring agent, the smaller the gel fraction.

藉由交聯劑於聚合物中導入交聯結構後,光硬化劑亦維持未反應之狀態。因此,形成包含基礎聚合物及光硬化劑之光硬化性之黏著劑層2。於在膜基材1上形成黏著劑層2之情形時,較佳為以黏著劑層2之保護等為目的於黏著劑層2上附設隔離件5。亦可於黏著劑層2上附設隔離件5後進行交聯。After the crosslinking structure is introduced into the polymer by the crosslinking agent, the light hardener also maintains an unreacted state. Therefore, a photo-curable adhesive layer 2 containing a base polymer and a photo-curing agent is formed. When the adhesive layer 2 is formed on the film substrate 1, it is preferable to attach a spacer 5 to the adhesive layer 2 for the purpose of protecting the adhesive layer 2 or the like. The adhesive layer 2 can also be cross-linked after the spacer 5 is attached.

於在其他基材上形成黏著劑層2之情形時,藉由於使溶劑乾燥後將黏著劑層2轉印至膜基材1上而獲得補強膜。亦可將黏著劑層之形成所使用之基材直接作為隔離件5。In the case of forming the adhesive layer 2 on another substrate, a reinforcing film is obtained by transferring the adhesive layer 2 to the film substrate 1 after drying the solvent. The base material used in the formation of the adhesive layer can also be directly used as the spacer 5.

作為隔離件5,可良好地使用聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯膜等塑膠膜。隔離件之厚度通常為3~200 μm,較佳為10~100 μm左右。較佳為對隔離件5之與黏著劑層2之接觸面實施藉由聚矽氧系、氟系、長鏈烷基系、或者脂肪醯胺系等脫模劑、或二氧化矽粉等進行之脫模處理。藉由對隔離件5之表面進行脫模處理,於將膜基材1與隔離件5剝離時,可維持於黏著劑層2與隔離件5之界面產生剝離、於膜基材1上固著黏著劑層2之狀態。As the separator 5, plastic films such as polyethylene, polypropylene, polyethylene terephthalate, and polyester films can be suitably used. The thickness of the spacer is usually 3 to 200 μm, preferably about 10 to 100 μm. Preferably, the contact surface between the spacer 5 and the adhesive layer 2 is implemented by a silicone-based, fluorine-based, long-chain alkyl-based, or fatty amide-based mold release agent, or silica powder, etc. The demoulding treatment. By performing a mold release treatment on the surface of the separator 5, when the film base material 1 and the separator 5 are peeled off, it can be maintained at the interface between the adhesive layer 2 and the separator 5 to be peeled and fixed on the film base material 1. The state of the adhesive layer 2.

[補強膜之使用] 本發明之補強膜係貼合於裝置或裝置構成零件而使用。供補強膜貼合之被黏著體並無特別限定,可列舉各種電子裝置、光學裝置及其構成零件等。補強膜可貼合於被黏著體之整個面,亦可選擇性地僅貼合於需要補強之部分。又,亦可將補強膜貼合於被黏著體之整個面之後,將無需補強之部位之補強膜切斷,並將補強膜剝離去除。只要為使黏著劑光硬化之前,則補強膜係暫黏於被黏著體表面之狀態,因此能夠自被黏著體之表面容易地將補強膜剝離去除。[Use of Reinforcing Film] The reinforcing film of the present invention is used by sticking to the device or device constituent parts. The adherend to which the reinforcing film is attached is not particularly limited, and various electronic devices, optical devices, and their constituent parts can be cited. The reinforcing film can be attached to the entire surface of the adherend, or can be selectively attached only to the part that needs reinforcement. In addition, after the reinforcing film is attached to the entire surface of the adherend, the reinforcing film at the part that does not need to be reinforced can be cut, and the reinforcing film can be peeled off. As long as it is before the adhesive is photocured, the reinforcing film is temporarily stuck to the surface of the adherend, so the reinforcing film can be easily peeled off from the surface of the adherend.

由於藉由貼合補強膜而賦予適度之剛性,因此可期待操作性提昇或破損防止效果。於裝置之製造步驟中,於對半成品貼合補強膜之情形時,可對切斷成製品尺寸之前之大的半成品貼合補強膜。亦可將補強膜以卷對卷貼合於藉由卷對卷處理(roll to roll process)而製造之裝置之母輥。Since appropriate rigidity is imparted by laminating the reinforcing film, the improvement in operability and the effect of preventing damage can be expected. In the manufacturing steps of the device, when the reinforcing film is attached to the semi-finished product, the reinforcing film can be attached to the semi-finished product that is larger than the size of the product before being cut. The reinforcing film can also be attached to the mother roll of the device manufactured by the roll to roll process in a roll to roll.

<光硬化前之黏著劑層之特性> 補強膜10中,黏著劑層2與膜基材1固著,於與被黏著體貼合後且光硬化前,對被黏著體之接著力較小。因此,光硬化前,補強膜自被黏著體之剝離較容易,二次加工性優異。又,光硬化前,將補強膜切斷並將被黏著體表面之一部分之區域之補強膜去除等加工亦可容易地進行。<Characteristics of the adhesive layer before light curing> In the reinforcing film 10, the adhesive layer 2 is fixed to the film base material 1, and after being bonded to the adherend and before light curing, the adhesive force to the adherend is small. Therefore, before photocuring, the reinforcing film can be easily peeled from the adherend, and the secondary workability is excellent. In addition, processing such as cutting the reinforcing film and removing the reinforcing film on a part of the surface of the adherend before photocuring can also be easily performed.

(接著力) 就使自被黏著體之剝離容易、防止向補強膜剝離後之被黏著體之糊劑殘留之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力較佳為1.5 N/25 mm以下,更佳為1 N/25 mm以下,進而較佳為0.7 N/25 mm以下,尤佳為0.5 N/25 mm以下。光硬化前之黏著劑層2與被黏著體之接著力亦可為0.4 N/25 mm以下、0.3 N/25 mm以下或0.2 N/25 mm以下。就防止保管或操作時之補強膜之剝離之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力較佳為0.005 N/25 mm以上,更佳為0.01 N/25 mm以上,進而較佳為0.02 N/25 mm以上,尤佳為0.03 N/25 mm以上。(Adhesion) From the viewpoint of making it easy to peel from the adherend and preventing the paste remaining on the adherend after peeling off the reinforcing film, the adhesive force between the adhesive layer 2 and the adherend before photocuring is preferably 1.5 N/ 25 mm or less, more preferably 1 N/25 mm or less, still more preferably 0.7 N/25 mm or less, and particularly preferably 0.5 N/25 mm or less. The adhesive force between the adhesive layer 2 and the adherend before light hardening can also be 0.4 N/25 mm or less, 0.3 N/25 mm or less, or 0.2 N/25 mm or less. From the viewpoint of preventing peeling of the reinforcing film during storage or handling, the adhesive force between the adhesive layer 2 and the adherend before photocuring is preferably 0.005 N/25 mm or more, more preferably 0.01 N/25 mm or more , And more preferably 0.02 N/25 mm or more, particularly preferably 0.03 N/25 mm or more.

補強膜較佳為於使黏著劑層光硬化前之狀態下對聚醯亞胺膜之接著力為上述範圍內。於撓性顯示面板、撓性印刷配線板(FPC)、將顯示面板與配線板一體化而成之裝置等中,使用可撓性之基板材料,就耐熱性或尺寸穩定性之觀點而言,一般使用聚醯亞胺膜。黏著劑層對作為基板之聚醯亞胺膜具有上述接著力之補強膜於黏著劑之光硬化前容易剝離,光硬化後接著可靠性優異。The reinforcing film preferably has an adhesive force to the polyimide film in the state before the adhesive layer is photocured within the above range. In flexible display panels, flexible printed wiring boards (FPC), devices that integrate display panels and wiring boards, etc., flexible substrate materials are used. From the viewpoint of heat resistance or dimensional stability, Polyimide films are generally used. The adhesive layer has the above-mentioned adhesive force to the polyimide film as the substrate, and the reinforcing film is easily peeled off before the adhesive is photocured, and the adhesion reliability after photocuring is excellent.

亦可於貼合補強膜之前為了潔淨化等而對裝置表面之聚醯亞胺膜等被黏著體進行活化處理。作為表面活化處理,可列舉電漿處理、電暈處理、輝光放電處理等。尤其是就可於大氣壓之下進行處理、活化效果較高之方面而言,較佳為大氣壓電漿處理。It is also possible to activate the adherends such as the polyimide film on the surface of the device for the purpose of cleaning before attaching the reinforcing film. Examples of surface activation treatment include plasma treatment, corona treatment, glow discharge treatment, and the like. Especially in terms of processing under atmospheric pressure and high activation effect, atmospheric pressure slurry processing is preferable.

若對被黏著體進行表面活化處理,則存在與未進行表面活化處理之情形相比,光硬化前之黏著劑層2與被黏著體之接著力變高之傾向。若光硬化前之黏著劑層與被黏著體之接著力過大,則存在二次加工變得困難之情況。因此,進行過表面活化處理之被黏著體與光硬化前之黏著劑層之接著力較佳為2 N/25 mm以下,更佳為1.5 N/25 mm以下,進而較佳為1 N/25 mm以下。進行過表面活化處理之被黏著體與光硬化前之黏著劑層之接著力亦可為0.7 N/25 mm以下或0.5 N/25 mm以下。進行過表面活化處理之被黏著體與光硬化前之黏著劑層之接著力較佳為未進行表面活化處理之被黏著體與光硬化前之黏著劑層之接著力之4倍以下,更佳為3倍以下。進行過表面活化處理之被黏著體與光硬化前之黏著劑層之接著力亦可為未進行表面活化處理之被黏著體與光硬化前之黏著劑層之接著力之2倍以下、1.7倍以下或1.5倍以下。If the surface activation treatment is performed on the adherend, the adhesion between the adhesive layer 2 before photocuring and the adherend tends to be higher than when the surface activation treatment is not performed. If the adhesive force between the adhesive layer and the adherend before photocuring is too large, secondary processing may become difficult. Therefore, the adhesive force between the surface-activated adherend and the adhesive layer before photocuring is preferably 2 N/25 mm or less, more preferably 1.5 N/25 mm or less, and more preferably 1 N/25 mm below. The adhesive force between the surface-activated adherend and the adhesive layer before photocuring can also be 0.7 N/25 mm or less or 0.5 N/25 mm or less. The adhesive force between the surface-activated adherend and the adhesive layer before photocuring is preferably less than 4 times the adhesive force of the adherend without surface activation and the adhesive layer before photocuring, more preferably It is 3 times or less. The adhesive force between the surface-activated adherend and the adhesive layer before photocuring can also be less than 2 times or 1.7 times the adhesive force of the adherend without surface activation and the adhesive layer before photocuring Or less than 1.5 times.

表面進行過活化處理之被黏著體大量包含羥基、羰基、羧基等活性基,藉由與基礎聚合物之極性官能基之分子間相互作用,接著力容易上升。尤其是於基礎聚合物包含氮原子之情形時,認為由於氮原子之不成對電子與進行過活化處理之被黏著體之活性基之相互作用較強,故而接著力容易上升。尤其是於被黏著體為聚醯亞胺之情形時,認為藉由活化處理,醯胺酸、末端之胺基或羧基(或羧酸酐基)等會被活化,與基礎聚合物之極性官能基之相互作用較強,此亦與初期接著力之上升有關。The surface of the adherend that has undergone activation treatment contains a large number of active groups such as hydroxyl, carbonyl, and carboxyl groups, and the adhesive force is easily increased due to the intermolecular interaction with the polar functional groups of the base polymer. Especially when the base polymer contains a nitrogen atom, it is believed that the unpaired electron of the nitrogen atom has a strong interaction with the active group of the adherend that has undergone activation treatment, so the adhesive force is likely to increase. Especially when the adherend is polyimide, it is believed that by activation treatment, the amide acid, the terminal amine group or the carboxyl group (or carboxylic anhydride group) will be activated, and the polar functional group of the base polymer The interaction is stronger, which is also related to the increase in initial adhesion.

藉由使用有機金屬等交聯促進劑,存在因被黏著體之表面活化處理而引起之初期接著力之上升受到抑制之傾向,尤其是於交聯劑之1分子中所包含之交聯性官能基之數較多、官能基密度較高之情形時,該傾向較大。若使用交聯促進劑,則交聯性官能基會被活化,反應性變高。因此,未反應之官能基減少,藉由1個交聯劑交聯之聚合物鏈之數較多,容易形成高密度之交聯結構,認為其與初期接著力之上升抑制有關。By using crosslinking accelerators such as organometallics, there is a tendency that the increase in initial adhesion caused by the surface activation treatment of the adherend is suppressed, especially the crosslinking function contained in 1 molecule of the crosslinking agent This tendency is greater when the number of groups is large and the density of functional groups is high. If a crosslinking accelerator is used, the crosslinkable functional group will be activated and the reactivity will increase. Therefore, the number of unreacted functional groups is reduced, and the number of polymer chains cross-linked by one cross-linking agent is large, and it is easy to form a high-density cross-linked structure, which is believed to be related to the suppression of the increase in initial adhesion.

例如,認為:於交聯密度較低之情形時,於黏著劑層之主體部分中,於聚合物鏈之間隙容易存在光硬化劑(多官能單體),相對於此,於交聯密度較高之情形時,由於聚合物鏈之間隙較少(較小),因此於主體部分不易存在光硬化劑,光硬化前之黏著劑層中,光硬化劑容易偏集存在於界面附近。因此認為:即便於對被黏著體進行表面活化處理之情形時,由於接著界面之被黏著體與基礎聚合物之相互作用較小,故而初期接著力之上升亦會受到抑制。For example, it is believed that when the cross-linking density is low, in the main part of the adhesive layer, the light hardener (multifunctional monomer) is likely to exist in the gaps between the polymer chains. In contrast, the cross-linking density is higher. When it is high, since the gap between the polymer chains is small (smaller), the light hardening agent is not easy to exist in the main body part. In the adhesive layer before light hardening, the light hardening agent is likely to be concentrated in the vicinity of the interface. Therefore, it is believed that even in the case of surface activation treatment on the adherend, since the interaction between the adherend and the base polymer at the interface is small, the initial increase in adhesive force will be suppressed.

又,由於藉由使用交聯促進劑,可提高交聯度(凝膠分率),因此未反應(未交聯)之羥基或羧基減少。認為交聯結構部分容易埋設於聚合物之內部、與交聯劑反應之羥基或羧基之氧原子於表面之露出較少亦有助於抑制初期接著力上升。尤其是於藉由1個交聯劑交聯之聚合物鏈之數較多之情形時,認為由於交聯結構部分於表面之露出較少,故而基礎聚合物之極性基與被黏著體之活性基之相互作用較小,初期接著力之上升受到抑制。In addition, since the degree of crosslinking (gel fraction) can be increased by using a crosslinking accelerator, unreacted (uncrosslinked) hydroxyl groups or carboxyl groups are reduced. It is believed that the cross-linked structure part is easy to be embedded in the polymer, and the oxygen atoms of the hydroxyl or carboxyl group that react with the cross-linking agent are less exposed on the surface, which also helps to suppress the initial adhesion increase. Especially when the number of polymer chains cross-linked by one cross-linking agent is large, it is considered that because the cross-linked structure part is less exposed on the surface, the polar groups of the base polymer and the adherend are active The interaction of the base is small, and the initial increase in adhesion is suppressed.

(儲存模數) 黏著劑層2較佳為光硬化前之25℃下之剪切儲存模數G'i 為1×104 ~1.2×105 Pa。剪切儲存模數(以下,僅記載為「儲存模數」)係藉由讀取依據JIS K7244-1「塑膠-動態機械特性之試驗方法」所記載之方法於頻率1 Hz之條件下於-50~150℃之範圍以升溫速度5℃/min進行測定時的特定溫度下之值而求出。(Storage modulus) The adhesive layer 2 preferably has a shear storage modulus G′ i at 25° C. before photocuring of 1×10 4 to 1.2×10 5 Pa. Shear storage modulus (hereinafter, only described as "storage modulus") is based on the method described in JIS K7244-1 "Plastics-Test Methods for Dynamic Mechanical Properties" at a frequency of 1 Hz at- The range of 50 to 150°C is calculated as the value at a specific temperature when the temperature rise rate is 5°C/min.

於如黏著劑般表現出黏彈性之物質中,儲存模數G'用作表示硬度之程度之指標。黏著劑層之儲存模數與凝集力具有較高之關聯,存在黏著劑之凝集力越高,於被黏著體之抓固力變得越大之傾向。光硬化前之黏著劑層2之儲存模數只要為1×104 Pa以上,則黏著劑具有充分之硬度及凝集力,因此於自被黏著體將補強膜剝離時不易產生於被黏著體之糊劑殘留。又,於黏著劑層2之儲存模數較大之情形時,可抑制黏著劑自補強膜之端面溢出。光硬化前之黏著劑層2之儲存模數只要為1.2×105 Pa以下,則於黏著劑層2與被黏著體之界面之剝離容易,於進行二次加工之情形時,亦不易產生黏著劑層之凝集破壞或於被黏著體表面之糊劑殘留。In a substance that exhibits viscoelasticity like an adhesive, the storage modulus G'is used as an indicator of the degree of hardness. The storage modulus of the adhesive layer has a higher correlation with the cohesive force. The higher the cohesive force of the adhesive, the greater the gripping force of the adherend. As long as the storage modulus of the adhesive layer 2 before light hardening is 1×10 4 Pa or more, the adhesive has sufficient hardness and cohesive power, so it is not easy to produce on the adherend when the reinforcing film is peeled from the adherend Paste remains. In addition, when the storage modulus of the adhesive layer 2 is large, the adhesive can be prevented from overflowing from the end surface of the reinforcing film. As long as the storage modulus of the adhesive layer 2 before light hardening is 1.2×10 5 Pa or less, it will be easy to peel off at the interface between the adhesive layer 2 and the adherend, and it is not easy to produce adhesion during secondary processing. The agglomeration of the agent layer is broken or the paste remains on the surface of the adherend.

就提高補強膜之二次加工性從而抑制二次加工時之於被黏著體之糊劑殘留之觀點而言,黏著劑層2之光硬化前之25℃下之儲存模數G'i 更佳為3×104 ~1×105 Pa,進而較佳為4×104 ~9.5×104 Pa。Secondary processing to improve the reinforcing of film to suppress the residual paste in view of the adhesion of the body in terms of secondary processing, storage under the adhesive layer of the front light 25 2 deg.] C and cured modulus G 'i better It is 3×10 4 to 1×10 5 Pa, more preferably 4×10 4 to 9.5×10 4 Pa.

<黏著劑層之光硬化> 藉由將補強膜貼合於被黏著體之後對黏著劑層2照射活性光線,而使黏著劑層光硬化。作為活性光線,可列舉紫外線、可見光、紅外線、X射線、α射線、β射線、及γ射線等。就能夠抑制保管狀態下之黏著劑層之硬化且容易硬化之方面而言,作為活性光線,較佳為紫外線。活性光線之照射強度或照射時間根據黏著劑層之組成或厚度等適當設定即可。對黏著劑層2之活性光線之照射可自膜基材1側及被黏著體側之任一面實施,亦可自兩面進行活性光線之照射。<Light hardening of adhesive layer> After bonding the reinforcing film to the adherend, the adhesive layer 2 is irradiated with active light to light-harden the adhesive layer. Examples of active rays include ultraviolet rays, visible rays, infrared rays, X-rays, α rays, β rays, and γ rays. In terms of being able to suppress the hardening of the adhesive layer in the storage state and being easy to harden, the active light is preferably ultraviolet light. The irradiation intensity or irradiation time of the active light can be appropriately set according to the composition or thickness of the adhesive layer. The active light irradiation of the adhesive layer 2 can be carried out from either side of the film substrate 1 side and the adherend side, or active light irradiation can be carried out from both sides.

<光硬化後之黏著劑層之特性> (接著力) 就裝置之實用時之接著可靠性之觀點而言,光硬化後之黏著劑層2與被黏著體之接著力較佳為2 N/25 mm以上,更佳為3 N/25 mm以上,進而較佳為5 N/25 mm以上。使黏著劑層光硬化後之補強膜與被黏著體之接著力亦可為6 N/25 mm以上、8 N/25 mm以上、10 N/25 mm以上、12 N/25 mm以上、或13 N/25 mm以上。補強膜較佳為光硬化後之黏著劑層對聚醯亞胺膜具有上述範圍之接著力。光硬化後之黏著劑層2與被黏著體之接著力較佳為光硬化前之黏著劑層2與被黏著體之接著力之5倍以上,更佳為8倍以上,進而較佳為10倍以上。光硬化後之黏著劑層與被黏著體之接著力亦可為光硬化前之黏著劑層與被黏著體之接著力之20倍以上、30倍以上、40倍以上、或50倍以上。<Characteristics of the adhesive layer after light curing> (Adhesion) From the viewpoint of the bonding reliability of the device in practical use, the bonding force between the adhesive layer 2 and the adherend after light curing is preferably 2 N/25 mm or more, more preferably 3 N/25 mm or more, and then Preferably it is 5 N/25 mm or more. The adhesive force between the reinforcing film and the adherend after light curing of the adhesive layer can also be 6 N/25 mm or more, 8 N/25 mm or more, 10 N/25 mm or more, 12 N/25 mm or more, or 13 N/25 mm or more. The reinforcing film is preferably the adhesive layer after photocuring that has an adhesive force in the above range to the polyimide film. The adhesive force between the adhesive layer 2 and the adherend after light curing is preferably at least 5 times the adhesive force of the adhesive layer 2 and the adherend before light curing, more preferably at least 8 times, and more preferably 10 Times more. The adhesive force between the adhesive layer and the adherend after light curing can also be 20 times or more, 30 times or more, 40 times or more, or 50 times the adhesive force of the adhesive layer and the adherend before light curing.

如上所述,存在包含使用交聯劑及交聯促進劑導入有交聯結構之基礎聚合物之黏著劑會抑制因被黏著體之表面活化處理而引起之初期接著力之上升之傾向。另一方面,於對被黏著體進行過表面活化處理之情形時,存在與未進行被黏著體之表面活化處理之情形時相比,光硬化後之黏著劑層2與被黏著體之接著力變大之傾向。即,於使用具備具有特定組成之黏著劑層之補強膜之情形時,藉由對被黏著體實施電漿處理等表面活化處理,會抑制初期接著力之上升,確保二次加工性,並且於光硬化後會實現較高之接著力,可獲得補強膜之接著可靠性優異之裝置。尤其是於使用有機金屬交聯促進劑之情形時,存在對被黏著體進行過表面活化處理之情形時之初期接著力之上升抑制、及光硬化後之接著力上升變得更明顯之傾向。As described above, there is a tendency that an adhesive including a base polymer with a cross-linked structure introduced using a cross-linking agent and a cross-linking accelerator suppresses the increase in the initial adhesive force caused by the surface activation treatment of the adherend. On the other hand, when the surface activation treatment is performed on the adherend, there is an adhesive force between the adhesive layer 2 and the adherend after photocuring compared with the case where the surface activation treatment of the adherend is not performed The tendency to become bigger. That is, when using a reinforcing film with an adhesive layer with a specific composition, by performing surface activation treatment such as plasma treatment on the adherend, the increase in initial adhesion is suppressed, and the secondary workability is ensured. After light curing, a higher adhesive force will be realized, and a device with excellent adhesive reliability of the reinforcing film can be obtained. Especially in the case of using an organometallic crosslinking accelerator, there is a tendency that the initial increase in adhesive strength is suppressed when the adherend is subjected to surface activation treatment, and the increase in adhesive strength after photocuring becomes more pronounced.

(儲存模數) 黏著劑層2較佳為光硬化後之25℃下之儲存模數G'f 為1.0×105 Pa以上。只要光硬化後之黏著劑層2之儲存模數為1.0×105 Pa以上,則伴隨凝集力之增大,與被黏著體之接著力提昇,可獲得較高之接著可靠性。另一方面,於儲存模數過大之情形時,黏著劑難以潤濕擴展,與被黏著體之接觸面積變小。又,黏著劑之應力分散性降低,因此存在剝離力容易傳播至接著界面,與被黏著體之接著力降低之傾向。因此,黏著劑層2之光硬化後之25℃下之儲存模數G'f 較佳為2×106 Pa以下。就提高使黏著劑層光硬化後之補強膜之接著可靠性之觀點而言,G'f 更佳為1.1×105 ~1.2×106 Pa,進而較佳為1.2×105 ~1×106 Pa。(Storage modulus) The adhesive layer 2 preferably has a storage modulus G′ f at 25° C. after light curing of 1.0×10 5 Pa or more. As long as the storage modulus of the adhesive layer 2 after light curing is 1.0×10 5 Pa or more, the adhesion force with the adherend increases as the cohesive force increases, and higher bonding reliability can be obtained. On the other hand, when the storage modulus is too large, the adhesive is difficult to wet and expand, and the contact area with the adherend becomes smaller. In addition, the stress dispersibility of the adhesive is reduced, so there is a tendency for the peeling force to easily propagate to the bonding interface and the adhesive force with the adherend to decrease. Therefore, the storage modulus G′ f at 25° C. of the adhesive layer 2 after light curing is preferably 2×10 6 Pa or less. To improve the reinforcing layer after the adhesive was light cured film in terms of the reliability point of view and then, G 'f is more preferably 1.1 × 10 5 ~ 1.2 × 10 6 Pa, and further preferably 1.2 × 10 5 ~ 1 × 10 6 Pa.

黏著劑層2之光硬化前後之25℃下之儲存模數之比G'f /G'i 較佳為2以上。只要G'f 為G'i 之2倍以上,則藉由光硬化之G'之增加變大,可兼顧光硬化前之二次加工性及光硬化後之接著可靠性。G'f /G'i 更佳為4以上,進而較佳為8以上,尤佳為10以上。G'f /G'i 之上限並無特別限定,於G'f /G'i 過大之情形時,容易導致因光硬化前之G'較小而引起之初期接著不良、或因光硬化後之G'過大而引起之接著可靠性之降低。因此,G'f /G'i 較佳為100以下,更佳為40以下,進而較佳為30以下,尤佳為25以下。The ratio of the storage modulus G'f /G' i at 25° C. before and after light curing of the adhesive layer 2 is preferably 2 or more. As long as the G 'is F G' i of 2 times or more, by increasing the photohardenable of G 'becomes larger, secondary processability can be both before and after photohardening of the photohardenable Next reliability. G'f /G' i is more preferably 4 or more, still more preferably 8 or more, and particularly preferably 10 or more. G 'f / G' of the upper limit of i is not particularly limited, to G 'f / G' of the case when i is too large, easily lead to the front of the photo-curing by G 'is small and the initial cause of the failure and then, after the photohardening or because The G'is too large and the reliability of the connection is reduced. Therefore, G'f /G' i is preferably 100 or less, more preferably 40 or less, still more preferably 30 or less, and particularly preferably 25 or less.

附設補強膜後之被黏著體存在進行以複數個積層構件之積層界面之親和性提昇等為目的之高壓釜處理處理、或用以接合電路構件之熱壓接等加熱處理的情況。於進行此種加熱處理時,較佳為補強膜與被黏著體之間之黏著劑不自端面流動。The adherend after the reinforcement film is attached may be subjected to autoclave treatment for the purpose of enhancing the affinity of the laminate interface of a plurality of laminate members, or heat treatment such as thermocompression bonding for bonding circuit members. When performing such heat treatment, it is preferable that the adhesive between the reinforcing film and the adherend does not flow from the end surface.

就抑制高溫加熱時之黏著劑之溢出之觀點而言,光硬化後之黏著劑層2之100℃下之儲存模數較佳為5×104 Pa以上,更佳為8×104 Pa以上,進而較佳為1×105 Pa以上。就防止加熱時之黏著劑之溢出、以及防止加熱時之接著力降低之觀點而言,光硬化後之黏著劑層2之100℃下之儲存模數較佳為50℃下之儲存模數之60%以上,更佳為65%以上,進而較佳為70%以上,尤佳為75%以上。From the viewpoint of suppressing the overflow of the adhesive during high-temperature heating, the storage modulus at 100°C of the adhesive layer 2 after photohardening is preferably 5×10 4 Pa or more, more preferably 8×10 4 Pa or more , And more preferably 1×10 5 Pa or more. From the viewpoints of preventing the overflow of the adhesive during heating and preventing the decrease of the adhesive force during heating, the storage modulus at 100°C of the adhesive layer 2 after photohardening is preferably that of the storage modulus at 50°C 60% or more, more preferably 65% or more, still more preferably 70% or more, and particularly preferably 75% or more.

藉由貼合補強膜,可對作為被黏著體之半成品賦予適度之剛性,並且得以使應力緩和、分散,因此能夠抑制製造步驟中有可能產生之各種不良情況、提昇生產效率、改善良率。又,補強膜由於即便於對被黏著體進行過表面活化處理之情形時,於使黏著劑層光硬化之前,自被黏著體之剝離亦容易,故而於積層或產生貼合不良之情形時亦容易二次加工。使黏著劑層光硬化後,對被黏著體表現出較高之接著力,補強膜不易自裝置表面剝離,接著可靠性優異。 [實施例]By laminating the reinforcing film, moderate rigidity can be given to the semi-finished product as the adherend, and the stress can be relieved and dispersed. Therefore, various defects that may occur in the manufacturing step can be suppressed, production efficiency can be improved, and yield can be improved. In addition, since the reinforcing film is easily peeled from the adherend before the adhesive layer is photocured even when the adherend has been subjected to surface activation treatment, it is also easy to laminate or cause poor adhesion. Easy secondary processing. After light-curing the adhesive layer, it exhibits a high adhesive force to the adherend, the reinforcing film is not easy to peel off the surface of the device, and the bonding reliability is excellent. [Example]

以下列舉實施例進一步進行說明,但本發明並不限定於該等實施例。Examples are listed below for further description, but the present invention is not limited to these examples.

[比較例1] <基礎聚合物之聚合> 於具備溫度計、攪拌機、回流冷凝管及氮氣導入管之反應容器中投入作為單體之丙烯酸丁酯(BA)95重量份及丙烯酸(AA)5重量份、作為熱聚合起始劑之偶氮雙異丁腈(AIBN)0.2重量份、以及作為溶劑之乙酸乙酯233重量份,並通入氮氣,一面攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,反應7小時,獲得重量平均分子量60萬之丙烯酸系聚合物之溶液。[Comparative Example 1] <polymerization of basic polymer> Put 95 parts by weight of butyl acrylate (BA) as monomers and 5 parts by weight of acrylic acid (AA) as monomers into a reaction vessel equipped with a thermometer, agitator, reflux condenser and nitrogen introduction tube, and azobis as a thermal polymerization initiator. 0.2 parts by weight of isobutyronitrile (AIBN) and 233 parts by weight of ethyl acetate as a solvent were blown with nitrogen gas, and nitrogen replacement was performed for about 1 hour while stirring. Thereafter, it was heated to 60°C and reacted for 7 hours to obtain a solution of acrylic polymer with a weight average molecular weight of 600,000.

<黏著劑組合物之製備> 於丙烯酸系聚合物之溶液中添加作為交聯劑之4官能環氧系化合物(Mitsubishi Gas Chemical製造之「Tetrad C」)0.5重量份、作為多官能丙烯酸系單體之新中村化學工業製造之「NK Ester A200」(聚乙二醇#200(n=4)二丙烯酸酯;分子量308,官能基當量154 g/eq)30重量份、及光聚合起始劑(BASF製造之「Irgacure 651」)0.1重量份,製備黏著劑組合物。<Preparation of adhesive composition> Add 0.5 parts by weight of a 4-functional epoxy compound ("Tetrad C" manufactured by Mitsubishi Gas Chemical) as a crosslinking agent to a solution of acrylic polymer, and a multifunctional acrylic monomer manufactured by Shinnakamura Chemical Industry Co., Ltd. NK Ester A200" (polyethylene glycol #200 (n=4) diacrylate; molecular weight 308, functional group equivalent 154 g/eq) 30 parts by weight, and photopolymerization initiator ("Irgacure 651" manufactured by BASF) 0.1 parts by weight to prepare an adhesive composition.

<黏著劑組合物之塗佈及交聯> 於未經表面處理之厚度75 μm之聚對苯二甲酸乙二酯膜(Toray製造之「Lumirror S10」)上以乾燥後之厚度成為25 μm之方式使用槽輥塗佈上述黏著劑組合物。於130℃下乾燥1分鐘將溶劑去除,其後,於黏著劑之塗佈面貼合隔離件(表面進行過聚矽氧脫模處理之厚度25 μm之聚對苯二甲酸乙二酯膜)之脫模處理面。其後,於25℃之環境下進行4天之老化處理,進行交聯,而獲得於膜基材上固著積層有光硬化性黏著片且於其上暫黏有隔離件之補強膜。<Coating and crosslinking of adhesive composition> The adhesive composition was coated on a polyethylene terephthalate film with a thickness of 75 μm (“Lumirror S10” manufactured by Toray) without surface treatment so that the thickness after drying became 25 μm using a grooved roller. Dry at 130°C for 1 minute to remove the solvent. After that, paste the separator (25 μm thick polyethylene terephthalate film with silicone release treatment on the surface) on the coated surface of the adhesive. The demoulding surface. Thereafter, an aging treatment was carried out for 4 days in an environment of 25° C., and cross-linking was performed to obtain a reinforcing film with a photocurable adhesive sheet fixed on the film substrate and a separator temporarily adhered thereon.

[實施例1~5] 於黏著劑組合物之製備中,於丙烯酸系聚合物之溶液中除交聯劑、多官能丙烯酸系單體、及光聚合起始劑以外添加表1所示之種類及量之有機金屬交聯促進劑。除添加有機金屬交聯促進劑以外,以與比較例1相同之方式製作補強膜。[Examples 1 to 5] In the preparation of the adhesive composition, in addition to the crosslinking agent, multifunctional acrylic monomer, and photopolymerization initiator, the type and amount of organic metal crosslinking shown in Table 1 are added to the acrylic polymer solution Accelerator. Except for adding an organometallic crosslinking accelerator, a reinforcing film was produced in the same manner as in Comparative Example 1.

[實施例6] 實施例6中,於黏著劑組合物之製備中,於丙烯酸系聚合物之溶液中除交聯劑、有機金屬交聯促進劑、多官能丙烯酸系單體、及光聚合起始劑以外添加含羧基丙烯酸系低聚物(東亞合成製造之「ARUFON UC-3000」;重量平均分子量:1萬;玻璃轉移溫度:65℃;酸值:74 mgKOH/g)1重量份。除此以外,以與實施例4相同之方式製作補強膜。[Example 6] In Example 6, in the preparation of the adhesive composition, in addition to the crosslinking agent, the organometallic crosslinking accelerator, the multifunctional acrylic monomer, and the photopolymerization initiator, the acrylic polymer solution was added containing Carboxy acrylic oligomer ("ARUFON UC-3000" manufactured by Toagosei; weight average molecular weight: 10,000; glass transition temperature: 65°C; acid value: 74 mgKOH/g) 1 part by weight. Except for this, a reinforcing film was produced in the same manner as in Example 4.

[對聚醯亞胺膜之接著力之測定] <光硬化前之接著力> 將厚度12.5 μm之聚醯亞胺膜(DU PONT-TORAY製造之「Kapton 50EN」)經由雙面膠帶(日東電工製造之「No.531」)貼附於玻璃板,獲得測定用聚醯亞胺膜基板。自切取為寬度25 mm×長度100 mm之補強膜之表面將隔離件剝離去除,並使用手壓輥貼合於測定用聚醯亞胺膜基板,製作接著力測定用試樣(無電漿處理)。[Measurement of the adhesion of polyimide film] <Adhesive force before light hardening> A polyimide film with a thickness of 12.5 μm ("Kapton 50EN" manufactured by DU PONT-TORAY) is attached to a glass plate via a double-sided tape ("No.531" manufactured by Nitto Denko) to obtain a polyimide for measurement Film substrate. The separator was peeled off from the surface of the reinforcing film with a width of 25 mm × a length of 100 mm, and was attached to the polyimide film substrate for measurement using a hand roller to prepare a sample for adhesion measurement (no plasma treatment) .

一面以搬送速度3 m/min搬送測定用聚醯亞胺基板一面使用常壓式電漿處理機以電極電壓160 V之條件對聚醯亞胺膜之表面實施電漿處理。於電漿處理後之測定用聚醯亞胺膜基板上使用手壓輥貼合補強膜,製作接著力測定用試樣(有電漿處理)。While conveying the polyimide substrate for measurement at a conveying speed of 3 m/min, the surface of the polyimide film was subjected to plasma treatment using an atmospheric-pressure plasma processor at an electrode voltage of 160 V. The reinforcing film was attached to the polyimide film substrate for measurement after the plasma treatment using a hand roller to prepare a sample for adhesion measurement (with plasma treatment).

使用該等試驗樣品,利用夾頭保持補強膜之聚對苯二甲酸乙二酯膜之端部,以拉伸速度300 mm/min進行補強膜之180°剝離試驗,並測定剝離強度。根據所獲得之結果,算出有電漿處理之情形時之接著力相對於無電漿處理之情形時之接著力的比(由電漿處理導致之接著力之增加率)。Using these test samples, the end of the polyethylene terephthalate film of the reinforced film was held by a chuck, and the 180° peel test of the reinforced film was performed at a tensile speed of 300 mm/min, and the peel strength was measured. Based on the obtained results, the ratio of the adhesive force when plasma treatment is applied to the adhesive force when there is no plasma treatment (the increase rate of adhesive force caused by plasma treatment) is calculated.

<光硬化後之接著力> 於聚醯亞胺膜基板(有電漿處理、及無電漿處理)上貼合補強膜,其後,使用波長365 nm之LED(Light Emitting Diode,發光二極體)光源自補強膜側(PET膜側)照射累計光量4000 mJ/cm2 之紫外線使黏著劑層光硬化。使用該試驗樣品與上述同樣地藉由180°剝離試驗對接著力進行測定。<Adhesive force after light curing> A reinforcing film is attached to the polyimide film substrate (with plasma treatment and without plasma treatment), and then a 365 nm LED (Light Emitting Diode) is used ) The light source irradiates ultraviolet rays with a cumulative light quantity of 4000 mJ/cm 2 from the side of the reinforcing film (the side of the PET film) to light-harden the adhesive layer. Using this test sample, the adhesive force was measured by a 180° peel test in the same manner as described above.

將比較例1及實施例1~6之補強膜之黏著劑之組成(低聚物、多官能單體、光聚合起始劑、交聯劑及交聯促進劑之種類、以及相對於基礎聚合物100重量份之添加量)、對聚醯亞胺膜之接著力及由電漿處理導致之接著力之增加率(「有電漿處理」之接著力相對於「無電漿處理」之接著力之比)、以及光硬化後之接著力示於表1。The composition of the adhesive of the reinforcing film of Comparative Example 1 and Examples 1 to 6 (oligomer, multifunctional monomer, photopolymerization initiator, crosslinking agent and crosslinking accelerator type, and relative to the basic polymerization 100 parts by weight of the substance), the adhesion to the polyimide film and the increase rate of the adhesion caused by the plasma treatment (the adhesion of "plasma treatment" is relative to the adhesion of "no plasma treatment" The ratio) and the adhesive force after photohardening are shown in Table 1.

於表1及表2中,「UC3000」為東亞合成製造之「ARUFON UC-3000」,「A200」為新中村化學工業製造之「NK Ester A200」,「APG700」為新中村化學工業製造之「NK Ester APG700」,「Irg651」為BASF製造之「Irgacure 651」,「Irg184」為BASF製造之「Irgacure 184」。表1及表2中之交聯促進劑之詳情如下。 Fe:三(乙醯丙酮)鐵(日本化學產業製造之「乙醯丙酮鐵(III)」) Zr:四乙醯丙酮鋯(東京化成工業製造) Ti:二異丙氧基雙乙醯丙酮鈦(東京化成工業製造) Al:三乙醯丙酮鋁(東京化成工業製造) Sn:二月桂酸二辛基錫(Tokyo Fine Chemical製造之「Embilizer OL-1」)In Table 1 and Table 2, "UC3000" is "ARUFON UC-3000" manufactured by Toa Synthetic, "A200" is "NK Ester A200" manufactured by Shinnakamura Chemical Industry, and "APG700" is "ARUFON UC-3000" manufactured by Shinnakamura Chemical Industry. "NK Ester APG700", "Irg651" is "Irgacure 651" manufactured by BASF, and "Irg184" is "Irgacure 184" manufactured by BASF. The details of the crosslinking accelerators in Table 1 and Table 2 are as follows. Fe: tris(acetone) iron ("acetone iron(III)" manufactured by Japan Chemical Industry) Zr: Zirconium tetraacetone (manufactured by Tokyo Chemical Industry) Ti: Titanium diisopropoxy bisacetylacetonate (manufactured by Tokyo Chemical Industry) Al: Aluminum triacetone (manufactured by Tokyo Chemical Industry) Sn: Dioctyltin dilaurate ("Embilizer OL-1" manufactured by Tokyo Fine Chemical)

[表1]    低聚物 多官能單體 光聚合起始劑 交聯劑 交聯促進劑 光硬化前 光硬化後 接著力 (N/25 mm) 接著力上升率 (倍) 接著力 (N/25 mm) 種類 無電漿 有電漿 無電漿 有電漿 比較例1    A200 30重量份 Irg651 0.1重量份 Tetrad C 0.5重量份 - 0.15 0.21 1.40 7.4 18.2 實施例1    Zr 0.2 0.16 0.17 1.03 12.7 23.0 實施例2    Zr 0.15 0.15 0.15 1.05 10.1 21.4 實施例3    Ti 1.0 0.09 0.13 1.38 12.8 21.3 實施例4    Fe 0.025 0.11 0.12 1.05 9.0 19.0 實施例5    Al 0.1 0.10 0.12 1.11 9.1 18.0 實施例6 UC3000 1重量份 Fe 0.025 0.11 0.13 1.11 10.5 22.9 [Table 1] Oligomer Multifunctional monomer Photopolymerization initiator Crosslinking agent Crosslinking accelerator Before light hardening After light hardening Adhesion (N/25 mm) Adhesion force rise rate (times) Adhesion (N/25 mm) species the amount No plasma With plasma No plasma With plasma Comparative example 1 A200 30 parts by weight Irg651 0.1 parts by weight Tetrad C 0.5 parts by weight - 0.15 0.21 1.40 7.4 18.2 Example 1 Zr 0.2 0.16 0.17 1.03 12.7 23.0 Example 2 Zr 0.15 0.15 0.15 1.05 10.1 21.4 Example 3 Ti 1.0 0.09 0.13 1.38 12.8 21.3 Example 4 Fe 0.025 0.11 0.12 1.05 9.0 19.0 Example 5 Al 0.1 0.10 0.12 1.11 9.1 18.0 Example 6 UC3000 1 part by weight Fe 0.025 0.11 0.13 1.11 10.5 22.9

於比較例1及實施例1~6之任一者中,對未進行過電漿處理之聚醯亞胺膜基板之初期接著力均為0.2 N/25 mm以下,可自聚醯亞胺膜容易地剝離。又,若進行黏著劑之光硬化,則接著力上升,與聚醯亞胺膜基板牢固地接著。In any one of Comparative Example 1 and Examples 1 to 6, the initial adhesion to the polyimide film substrate that has not undergone plasma treatment is less than 0.2 N/25 mm, which can be self-polyimide film Peel easily. In addition, when light curing of the adhesive is performed, the adhesive force increases, and the adhesive is firmly bonded to the polyimide film substrate.

未添加交聯促進劑之比較例1中,對電漿處理後之聚醯亞胺膜基板之初期接著力超過0.2 N/25 mm,上升至對未進行過電漿處理之聚醯亞胺膜基板之初期接著力之1.4倍。In Comparative Example 1 where no crosslinking accelerator was added, the initial adhesion to the polyimide film substrate after plasma treatment exceeded 0.2 N/25 mm, and it increased to that of the polyimide film without plasma treatment The initial adhesion of the substrate is 1.4 times.

添加有交聯促進劑之實施例1~5中,與比較例1相比,對電漿處理後之聚醯亞胺膜基板之初期接著力較低,由電漿處理導致之初期接著力之上升受到抑制。於除丙烯酸系基礎聚合物以外添加有丙烯酸系低聚物之實施例6中,亦與使用有相同之鐵系交聯促進劑之實施例4同樣地,由電漿處理導致之初期接著力之上升受到抑制。In Examples 1 to 5 with the addition of a crosslinking accelerator, compared with Comparative Example 1, the initial adhesion to the polyimide film substrate after plasma treatment was lower, and the initial adhesion caused by the plasma treatment was lower The rise is suppressed. In Example 6 where acrylic oligomer was added in addition to the acrylic base polymer, similar to Example 4 using the same iron-based crosslinking accelerator, the initial adhesive force caused by the plasma treatment was The rise is suppressed.

若著眼於使黏著劑光硬化後之接著力,則於任一實施例中,藉由於電漿處理後之聚醯亞胺基板貼合補強膜並進行光硬化,與未進行電漿處理之情形時相比,接著力均上升,表現出與比較例1同等以上之較高之接著力。If focusing on the adhesive force after photocuring of the adhesive, in any embodiment, the polyimide substrate after the plasma treatment is bonded to the reinforcing film and photocured, and the case where the plasma treatment is not performed Compared with the time, the adhesive force increased, and the adhesive force was higher than that of Comparative Example 1.

根據以上結果,可知:藉由使用交聯劑及交聯促進劑於基礎聚合物中導入交聯結構,對進行過電漿處理等活化處理之被黏著體之初期接著力較低,二次加工性優異,並且使黏著劑光硬化後,能夠實現高於不使用交聯促進劑之情形時之接著力,接著可靠性優異。According to the above results, it can be seen that by using a crosslinking agent and a crosslinking accelerator to introduce a crosslinked structure into the base polymer, the initial adhesion to the adherend that has undergone activation treatment such as plasma treatment is low, and secondary processing It has excellent properties, and after photocuring the adhesive, it can achieve higher adhesion than when no crosslinking accelerator is used, and has excellent adhesion reliability.

[比較例2] <基礎聚合物之聚合> 於具備溫度計、攪拌機、回流冷凝管及氮氣導入管之反應容器中投入作為單體之丙烯酸2-乙基己酯(2EHA)63重量份、甲基丙烯酸甲酯(MMA)9重量份、丙烯酸羥基乙酯(HEA)13重量份、及N-乙烯基吡咯啶酮(NVP)15重量份、作為熱聚合起始劑之AIBN 0.2重量份、以及作為溶劑之乙酸乙酯233重量份,並通入氮氣,一面攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,反應7小時,獲得重量平均分子量120萬之丙烯酸系聚合物之溶液。[Comparative Example 2] <polymerization of basic polymer> Add 63 parts by weight of 2-ethylhexyl acrylate (2EHA), 9 parts by weight of methyl methacrylate (MMA), and acrylic hydroxyl as monomers into a reaction vessel equipped with a thermometer, a stirrer, a reflux condenser and a nitrogen introduction tube. 13 parts by weight of ethyl ester (HEA), 15 parts by weight of N-vinylpyrrolidone (NVP), 0.2 parts by weight of AIBN as a thermal polymerization initiator, and 233 parts by weight of ethyl acetate as a solvent, and pass Nitrogen replacement was performed for about 1 hour while stirring. Thereafter, it was heated to 60°C and reacted for 7 hours to obtain a solution of acrylic polymer with a weight average molecular weight of 1.2 million.

<黏著劑組合物之製備> 於丙烯酸系聚合物溶液中添加作為交聯劑之苯二甲基二異氰酸酯之三羥甲基丙烷加成物之75%乙酸乙酯溶液(三井化學製造之「Takenate D110N」)以固形物成分計2.5重量份、作為多官能丙烯酸系單體之新中村化學工業製造之「NK Ester APG700」(聚丙二醇#700(n=12)二丙烯酸酯;分子量808,官能基當量404 g/eq)30重量份、及光聚合起始劑(BASF製造之「Irgacure 184」)1重量份,製備黏著劑組合物。<Preparation of adhesive composition> Add a 75% ethyl acetate solution of trimethylolpropane adduct of xylylene diisocyanate as a crosslinking agent to the acrylic polymer solution ("Takenate D110N" manufactured by Mitsui Chemicals) based on the solid content 2.5 parts by weight, as a multifunctional acrylic monomer, "NK Ester APG700" (polypropylene glycol #700 (n=12) diacrylate; molecular weight 808, functional group equivalent 404 g/eq) 30 weight Part, and 1 part by weight of a photopolymerization initiator ("Irgacure 184" manufactured by BASF) to prepare an adhesive composition.

<黏著劑組合物之塗佈及交聯> 以與比較例1相同之方式進行黏著劑組合物之塗佈、加熱乾燥及交聯,製作於膜基材上固著積層有光硬化性黏著片並於其上暫黏有隔離件之補強膜。<Coating and crosslinking of adhesive composition> The adhesive composition was applied, heated and dried, and crosslinked in the same manner as in Comparative Example 1, to produce a reinforcing film with a photocurable adhesive sheet and a spacer temporarily adhered on the film substrate. .

[實施例7及實施例8] 於黏著劑組合物之製備中,於丙烯酸系聚合物之溶液中除交聯劑、多官能丙烯酸系單體、及光聚合起始劑以外添加表2所示之種類及量之有機金屬交聯促進劑。除添加有機金屬交聯促進劑以外,以與比較例2相同之方式製作補強膜。[Example 7 and Example 8] In the preparation of the adhesive composition, in addition to the crosslinking agent, multifunctional acrylic monomer, and photopolymerization initiator, the type and amount of organic metal crosslinking shown in Table 2 are added to the acrylic polymer solution Accelerator. Except for adding an organometallic crosslinking accelerator, a reinforcing film was produced in the same manner as in Comparative Example 2.

[實施例9] 於黏著劑組合物之製備中,使用BASF製造之「Irgacure 651」代替BASF製造之「Irgacure 184」作為光聚合起始劑。除此以外,以與實施例7相同之方式製作補強膜。[Example 9] In the preparation of the adhesive composition, "Irgacure 651" manufactured by BASF was used instead of "Irgacure 184" manufactured by BASF as the photopolymerization initiator. Except for this, a reinforcing film was produced in the same manner as in Example 7.

[實施例10] 於黏著劑組合物之製備中,添加新中村化學工業製造之「NK Ester A200」20重量份代替新中村化學工業製造之「NK Ester APG700」30重量份作為多官能丙烯酸系單體。除此以外,以與實施例7相同之方式製作補強膜。[Example 10] In the preparation of the adhesive composition, 20 parts by weight of "NK Ester A200" manufactured by Shinnakamura Chemical Industry Co., Ltd. was added instead of 30 parts by weight of "NK Ester APG700" manufactured by Shinnakamura Chemical Industry Co., Ltd. as a multifunctional acrylic monomer. Except for this, a reinforcing film was produced in the same manner as in Example 7.

[對聚醯亞胺膜之接著力之測定] 於未進行過電漿處理之聚醯亞胺膜基板及電漿處理後之聚醯亞胺膜基板之各者貼合補強膜,針對使黏著劑層光硬化之前及光硬化後之各者,藉由剝離試驗對接著力進行測定。[Measurement of the adhesion of polyimide film] Laminate the reinforcing film on each of the polyimide film substrate that has not undergone plasma treatment and the polyimide film substrate after plasma treatment. For each of the adhesive layer before and after photocuring, The adhesion force was measured by a peel test.

將比較例2及實施例7~10之補強膜之黏著劑之組成、對聚醯亞胺膜之接著力及由電漿處理導致之接著力之增加率、以及光硬化後之接著力示於表2。The composition of the adhesive of the reinforcing film of Comparative Example 2 and Examples 7-10, the adhesive force to the polyimide film, the increase rate of the adhesive force caused by plasma treatment, and the adhesive force after photocuring are shown in Table 2.

[表2]    多官能單體 光聚合起始劑 交聯劑 交聯促進劑 光硬化前 光硬化後 接著力 (N/25 mm) 接著力上升率 (倍) 接著力 (N/25 mm) 種類 種類 種類 無電漿 有電漿 無電漿 有電漿 比較例2 APG700 30 Irg184 0.1 Takenate D110N 2.5重量份 - 0.50 2.07 4.14 9.7 16.9 實施例7 APG700 30 Irg184 0.1 Fe 0.005 0.30 0.61 2.03 4.4 10.4 實施例8 APG700 30 Irg184 0.1 Sn 0.03 0.39 0.93 2.36 6.3 12.5 實施例9 APG700 30 Irg651 0.1 Fe 0.005 0.44 1.05 2.40 7.7 14.1 實施例10 A200 20 Irg184 0.1 Fe 0.005 0.19 0.45 2.33 11.6 27.6 [Table 2] Multifunctional monomer Photopolymerization initiator Crosslinking agent Crosslinking accelerator Before light hardening After light hardening Adhesion (N/25 mm) Adhesion force rise rate (times) Adhesion (N/25 mm) species the amount species the amount species the amount No plasma With plasma No plasma With plasma Comparative example 2 APG700 30 Irg184 0.1 Takenate D110N 2.5 parts by weight - 0.50 2.07 4.14 9.7 16.9 Example 7 APG700 30 Irg184 0.1 Fe 0.005 0.30 0.61 2.03 4.4 10.4 Example 8 APG700 30 Irg184 0.1 Sn 0.03 0.39 0.93 2.36 6.3 12.5 Example 9 APG700 30 Irg651 0.1 Fe 0.005 0.44 1.05 2.40 7.7 14.1 Example 10 A200 20 Irg184 0.1 Fe 0.005 0.19 0.45 2.33 11.6 27.6

未添加交聯促進劑之比較例2中,對電漿處理後之聚醯亞胺膜基板之初期接著力超過2 N/25 mm,上升至對未進行過電漿處理之聚醯亞胺膜基板之初期接著力之4倍以上,變得難以自聚醯亞胺膜基板剝離補強膜。In Comparative Example 2 where no crosslinking accelerator is added, the initial adhesion to the polyimide film substrate after plasma treatment exceeds 2 N/25 mm, and it rises to the level of the polyimide film that has not undergone plasma treatment. The initial adhesive force of the substrate is more than 4 times, and it becomes difficult to peel the reinforcing film from the polyimide film substrate.

添加有交聯促進劑之實施例7、8中,對電漿處理後之聚醯亞胺膜基板之初期接著力為1 N/25 mm以下,與比較例2相比,初期接著力之上升受到抑制。於變更了光聚合起始劑之種類之實施例9、及變更了多官能單體之種類之實施例10中,亦與使用有相同之鐵系交聯促進劑之實施例7同樣地,由電漿處理導致之初期接著力之上升受到抑制。In Examples 7 and 8 with the addition of a crosslinking accelerator, the initial adhesion to the polyimide film substrate after plasma treatment was 1 N/25 mm or less. Compared with Comparative Example 2, the initial adhesion increased Repressed. In Example 9 in which the type of photopolymerization initiator was changed, and in Example 10 in which the type of polyfunctional monomer was changed, it was also the same as in Example 7 in which the same iron-based crosslinking accelerator was used. The increase of initial adhesive force caused by plasma treatment is suppressed.

根據表1所示之比較例1及實施例1~6(於丙烯酸丁酯與丙烯酸之共聚聚合物中藉由環氧系交聯劑導入有交聯結構之例)之結果、以及表2所示之比較例2及實施例7~10(於丙烯酸2-乙基己酯與甲基丙烯酸甲酯、丙烯酸羥基乙酯、及N-乙烯基吡咯啶酮之共聚聚合物中藉由異氰酸酯系交聯劑導入有交聯結構之例)之結果,可知:不論基礎聚合物或交聯劑之種類如何,藉由除交聯劑以外使用交聯促進劑,對進行過活化處理之被黏著體之初期接著力均會被抑制得較低。According to the results of Comparative Example 1 and Examples 1 to 6 shown in Table 1 (an example in which a crosslinked structure is introduced into a copolymer of butyl acrylate and acrylic acid by an epoxy-based crosslinking agent), and the results shown in Table 2 Shown in Comparative Example 2 and Examples 7 to 10 (in the copolymer of 2-ethylhexyl acrylate, methyl methacrylate, hydroxyethyl acrylate, and N-vinylpyrrolidone by isocyanate The result of the example where the linking agent is introduced with a cross-linking structure), it can be seen that regardless of the type of base polymer or cross-linking agent, by using a cross-linking accelerator in addition to the cross-linking agent, The initial adhesive force will be suppressed low.

1:膜基材 2:黏著劑層 5:隔離件 10:補強膜 20:被黏著體 1: Film substrate 2: Adhesive layer 5: spacer 10: Reinforcing film 20: adherend

圖1係表示補強膜之積層構成之剖視圖。 圖2係表示補強膜之積層構成之剖視圖。 圖3係表示黏貼設置有補強膜之裝置之剖視圖。Fig. 1 is a cross-sectional view showing the laminated structure of the reinforcing film. Fig. 2 is a cross-sectional view showing the laminated structure of the reinforcing film. Fig. 3 is a cross-sectional view showing a device for sticking and installing a reinforcing film.

1:膜基材 1: Film substrate

2:黏著劑層 2: Adhesive layer

10:補強膜 10: Reinforcing film

Claims (16)

一種補強膜,其具備膜基材、及固著積層於上述膜基材之一主面上之黏著劑層; 上述黏著劑層包含光硬化性組合物,上述光硬化性組合物含有具有交聯結構之基礎聚合物、光硬化劑、及光聚合起始劑;且 具有交聯結構之基礎聚合物係藉由包含基礎聚合物、交聯劑、及交聯促進劑之組合物之交聯反應而形成者。A reinforcing film comprising a film substrate and an adhesive layer fixedly laminated on one of the main surfaces of the film substrate; The adhesive layer includes a photocurable composition, and the photocurable composition includes a base polymer having a crosslinked structure, a photocuring agent, and a photopolymerization initiator; and The base polymer having a cross-linked structure is formed by the cross-linking reaction of a composition comprising a base polymer, a cross-linking agent, and a cross-linking accelerator. 如請求項1之補強膜,其中上述交聯促進劑為有機金屬化合物。The reinforcing film of claim 1, wherein the crosslinking accelerator is an organometallic compound. 如請求項1或2之補強膜,其中上述基礎聚合物含有選自由含羥基單體及含羧基單體所組成之群中之1種以上作為單體單元,且藉由與羥基或羧基鍵結之交聯劑導入有交聯結構。The reinforced film of claim 1 or 2, wherein the base polymer contains one or more selected from the group consisting of a hydroxyl-containing monomer and a carboxyl-containing monomer as a monomer unit, and is bonded by a hydroxyl group or a carboxyl group The cross-linking agent is introduced with a cross-linked structure. 如請求項1至3中任一項之補強膜,其中上述交聯劑為異氰酸酯系交聯劑或環氧系交聯劑。The reinforced film according to any one of claims 1 to 3, wherein the crosslinking agent is an isocyanate-based crosslinking agent or an epoxy-based crosslinking agent. 如請求項1至4中任一項之補強膜,其中上述光硬化性組合物之凝膠分率為60%以上。The reinforcing film according to any one of claims 1 to 4, wherein the gel fraction of the photocurable composition is 60% or more. 如請求項1至5中任一項之補強膜,其含有丙烯酸系聚合物作為上述基礎聚合物。The reinforcing film according to any one of claims 1 to 5, which contains an acrylic polymer as the base polymer. 如請求項1至6中任一項之補強膜,其中上述光硬化性組合物相對於上述基礎聚合物100重量份含有上述光硬化劑10~50重量份。The reinforced film according to any one of claims 1 to 6, wherein the photocurable composition contains 10 to 50 parts by weight of the light curing agent relative to 100 parts by weight of the base polymer. 如請求項1至7中任一項之補強膜,其中上述光硬化劑為多官能(甲基)丙烯酸酯。The reinforcing film according to any one of claims 1 to 7, wherein the light hardener is a multifunctional (meth)acrylate. 如請求項1至8中任一項之補強膜,其中上述光硬化劑之官能基當量為100~500 g/eq。The reinforcing film according to any one of claims 1 to 8, wherein the functional group equivalent of the light hardener is 100 to 500 g/eq. 如請求項1至9中任一項之補強膜,其中使上述黏著劑層光硬化前之與聚醯亞胺膜之接著力為1 N/25 mm以下。The reinforcing film according to any one of claims 1 to 9, wherein the adhesive force with the polyimide film before photocuring the adhesive layer is 1 N/25 mm or less. 一種補強膜之製造方法,其係如請求項1至10中任一項之補強膜之製造方法, 該方法係將包含基礎聚合物、交聯劑、交聯促進劑、光硬化劑、及光聚合起始劑之組合物層狀地塗佈於膜基材上,藉由上述基礎聚合物與上述交聯劑之反應而向上述基礎聚合物中導入交聯結構,形成黏著劑層。A method for manufacturing a reinforcing film, which is the method for manufacturing a reinforcing film according to any one of claims 1 to 10, In this method, a composition comprising a base polymer, a crosslinking agent, a crosslinking accelerator, a light hardening agent, and a photopolymerization initiator is layered on a film substrate, and the base polymer is combined with the above The reaction of the cross-linking agent introduces a cross-linked structure into the above-mentioned base polymer to form an adhesive layer. 一種補強膜之製造方法,其係如請求項1至10中任一項之補強膜之製造方法, 該方法係層狀地塗佈包含基礎聚合物、交聯劑、交聯促進劑、光硬化劑、及光聚合起始劑之組合物,藉由上述基礎聚合物與上述交聯劑之反應而向上述基礎聚合物中導入交聯結構,形成黏著劑層;且 將上述黏著劑層轉印至膜基材上。A method for manufacturing a reinforcing film, which is the method for manufacturing a reinforcing film according to any one of claims 1 to 10, This method is to coat a composition comprising a base polymer, a crosslinking agent, a crosslinking accelerator, a light hardener, and a photopolymerization initiator in layers, and the base polymer and the crosslinking agent are reacted Introducing a cross-linked structure into the above-mentioned base polymer to form an adhesive layer; and The above-mentioned adhesive layer is transferred to the film substrate. 一種裝置之製造方法,該裝置於表面貼合有補強膜, 該方法係將如請求項1至10中任一項之補強膜之上述黏著劑層暫黏於被黏著體之表面,其後, 藉由對上述黏著劑層照射活性光線,使上述黏著劑層光硬化,而使上述補強膜與上述被黏著體之接著力上升。A method of manufacturing a device, the device is attached with a reinforcing film on the surface, The method is to temporarily stick the above-mentioned adhesive layer of the reinforcing film of any one of claims 1 to 10 on the surface of the adherend, and then, By irradiating the adhesive layer with active light, the adhesive layer is photocured, and the adhesive force between the reinforcing film and the adherend is increased. 如請求項13之裝置之製造方法,其中於暫黏上述補強膜之前,進行上述被黏著體之表面活化處理。The method for manufacturing a device according to claim 13, wherein the surface activation treatment of the adherend is performed before temporarily adhering the reinforcing film. 如請求項14之裝置之製造方法,其中上述表面活化處理為電漿處理。The device manufacturing method of claim 14, wherein the surface activation treatment is plasma treatment. 一種補強方法,其係於被黏著體之表面貼合補強膜之補強方法, 該方法係於進行被黏著體之表面活化處理之後,將如請求項1至10中任一項之補強膜之上述黏著劑層暫黏於活化處理後之被黏著體表面,且 藉由對上述黏著劑層照射活性光線,使上述黏著劑層光硬化,而使上述補強膜與上述被黏著體之接著力上升。A reinforcement method, which is a reinforcement method of attaching a reinforcement film to the surface of the adherend, The method is to temporarily stick the above-mentioned adhesive layer of the reinforcing film of any one of claims 1 to 10 on the surface of the adherend after the activation treatment after the surface activation treatment of the adherend, and By irradiating the adhesive layer with active light, the adhesive layer is photocured, and the adhesive force between the reinforcing film and the adherend is increased.
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