TW202041320A - Creep feed grinding method - Google Patents
Creep feed grinding method Download PDFInfo
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- TW202041320A TW202041320A TW108144170A TW108144170A TW202041320A TW 202041320 A TW202041320 A TW 202041320A TW 108144170 A TW108144170 A TW 108144170A TW 108144170 A TW108144170 A TW 108144170A TW 202041320 A TW202041320 A TW 202041320A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/20—Drives or gearings; Equipment therefor relating to feed movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/18—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the presence of dressing tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/06—Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels
- B24B53/07—Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels by means of forming tools having a shape complementary to that to be produced, e.g. blocks, profile rolls
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Abstract
Description
發明領域 本發明是有關於一種深切緩進(creep feed)磨削方法。Invention field The present invention relates to a creep feed grinding method.
發明背景
在讓環狀地配設有磨削磨石的磨削輪旋轉來對板狀工件的上表面進行深切緩進磨削的情況下,將磨削磨石定位在預定的高度,並使保持有板狀工件的保持工作台朝向磨削磨石並在Y軸方向上移動,而使磨削磨石的下表面及側面接觸於板狀工件(參照專利文獻1及2)。
又,此時,藉由以保持工作台保持複數片長條的板狀工件,並使保持工作台在Y軸方向上移動,而同時磨削複數片板狀工件,藉此可提高生產性。
先前技術文獻
專利文獻Background of the invention
When the grinding wheel equipped with the grinding grindstone in a ring shape is rotated to perform deep-cut and slow-advance grinding on the upper surface of the plate-shaped workpiece, the grinding grindstone is positioned at a predetermined height and held there. The holding table of the plate-shaped workpiece faces the grinding grindstone and moves in the Y-axis direction, so that the lower surface and the side surface of the grinding grindstone are brought into contact with the plate-shaped workpiece (see
專利文獻1:日本專利特開2010-016181號公報 專利文獻2:日本專利特開2009-069759號公報Patent Document 1: Japanese Patent Laid-Open No. 2010-016181 Patent Document 2: Japanese Patent Laid-Open No. 2009-069759
發明概要 發明欲解決之課題 然而,複數個板狀工件的厚度(例如基板上的樹脂的厚度)會有互相不同的情況。此時,當以保持工作台保持複數個板狀工件時,由於磨削磨石與板狀工件的上表面之間的距離按每個板狀工件而不同,因此難以讓複數個板狀工件中的各自的磨削量變得相等。Summary of the invention Problems to be solved by the invention However, the thickness of a plurality of plate-shaped workpieces (for example, the thickness of the resin on the substrate) may be different from each other. At this time, when a plurality of plate-shaped workpieces are held by the holding table, since the distance between the grinding stone and the upper surface of the plate-shaped workpiece is different for each plate-shaped workpiece, it is difficult to place the plurality of plate-shaped workpieces The respective grinding amount becomes equal.
本發明之目的在於藉由保持工作台保持厚度相異的複數個板狀工件來進行深切緩進磨削時,讓各板狀工件的磨削量變得相等。 用以解決課題之手段The purpose of the present invention is to make the grinding amount of each plate-shaped workpiece equal when performing deep-cut jog grinding by holding a plurality of plate-shaped workpieces with different thicknesses by a holding table. Means to solve the problem
本磨削方法之深切緩進磨削磨削方法(本磨削方法)是使具有配設成環狀之磨削磨石的磨削輪旋轉,並使複數個板狀工件保持在保持工作台的保持面,且將該磨削磨石的下表面定位在比該板狀工件的上表面更下方,並沿著平行於該保持面的Y軸方向,使該板狀工件與該磨削磨石相對地移動,而藉由該磨削磨石的側面及下表面來磨削該板狀工件,前述深切緩進磨削方法包含以下步驟: 保持步驟,以在1個板狀工件的磨削中不讓該磨削磨石接觸到相鄰的板狀工件的方式,在Y軸方向上設置間隙來讓複數個板狀工件保持在該保持面; 磨削磨石高度設定步驟,對該複數個板狀工件按每個來決定該磨削磨石的高度;及 磨削步驟,在讓該磨削磨石變得未接觸到先前已磨削的板狀工件之後到讓該磨削磨石接觸於下一個板狀工件之前,將該磨削磨石的高度變更成在該磨削磨石高度設定步驟中所設定的高度,並以該磨削磨石來磨削板狀工件。The deep-cut slow-entry grinding method of this grinding method (this grinding method) is to rotate a grinding wheel with a grinding stone arranged in a ring shape, and to hold a plurality of plate-shaped workpieces on the holding table The lower surface of the grinding stone is positioned below the upper surface of the plate-shaped workpiece, and along the Y-axis direction parallel to the holding surface, the plate-shaped workpiece and the grinding The stone moves relatively, and the plate-shaped workpiece is ground by grinding the side and lower surface of the grinding stone. The aforementioned deep-cut and slow-entry grinding method includes the following steps: The holding step is to provide a gap in the Y-axis direction so that the grinding grindstone does not contact the adjacent plate-shaped workpiece during the grinding of one plate-shaped workpiece so that the plurality of plate-shaped workpieces are held in the holding step. surface; In the step of setting the height of the grinding stone, the height of the grinding stone is determined for each of the plurality of plate-shaped workpieces; and In the grinding step, the height of the grinding grindstone is changed after the grinding grindstone is not brought into contact with the previously ground plate-shaped workpiece until the grinding grindstone is brought into contact with the next plate-shaped workpiece The height is set in the height setting step of the grinding stone, and the plate-shaped workpiece is ground with the grinding stone.
又,本磨削方法亦可更具備以下步驟: 高度測定步驟,在到該磨削磨石高度設定步驟之前,測定以在該Y軸方向上分開的方式保持在該保持面的該複數個板狀工件的上表面高度;及 磨削量設定步驟,設定該板狀工件中的固定的磨削量, 又,在該磨削步驟中,是因應於所測定之該板狀工件的上表面高度來變更該磨削磨石的高度,而對上表面高度不同的各板狀工件進行固定量磨削。 發明效果In addition, the grinding method may further have the following steps: A height measuring step, measuring the height of the upper surface of the plurality of plate-shaped workpieces held on the holding surface in a manner of being separated in the Y-axis direction before the height setting step of the grinding stone; and The grinding amount setting step is to set a fixed grinding amount in the plate-shaped workpiece, In the grinding step, the height of the grinding stone is changed in accordance with the measured height of the upper surface of the plate-shaped workpiece, and the plate-shaped workpieces with different upper surface heights are ground by a fixed amount. Invention effect
在本磨削方法中,是在磨削磨石高度設定步驟中將複數個板狀工件按每個來決定磨削磨石的高度,而在磨削步驟中將磨削磨石的高度設定在按每個板狀工件而決定的高度,並磨削板狀工件。藉此,在藉由保持工作台的保持面來保持複數個板狀工件並進行深切緩進磨削時,即使在各板狀工件的上表面高度(厚度)為互相不同的情況下,仍然可以將各板狀工件的磨削量設成固定。In this grinding method, the height of the grinding stone is determined for each of a plurality of plate-shaped workpieces in the grinding stone height setting step, and the height of the grinding stone is set in the grinding step According to the height determined by each plate-shaped workpiece, the plate-shaped workpiece is ground. Thereby, when a plurality of plate-shaped workpieces are held by holding the holding surface of the table and deep-cut jog grinding is performed, even if the upper surface height (thickness) of each plate-shaped workpiece is different from each other, it is still possible Set the grinding amount of each plate-shaped workpiece to be fixed.
又,在本磨削方法中,亦可在磨削磨石高度設定步驟之前,實施測定各板狀工件的上表面高度的測定步驟、以及設定板狀工件中的固定的磨削量的磨削量設定步驟。並且,在磨削步驟中,亦可因應於所測定的板狀工件的上表面高度來變更磨削磨石的高度。藉此,將上表面高度互相不同的各板狀工件的磨削量設成固定之作法即變得較容易。In addition, in this grinding method, before the grinding stone height setting step, the measuring step of measuring the height of the upper surface of each plate-shaped workpiece and the grinding of setting a fixed amount of grinding in the plate-shaped workpiece may be carried out. Volume setting steps. In addition, in the grinding step, the height of the grinding stone may be changed in accordance with the measured height of the upper surface of the plate-shaped workpiece. Thereby, it becomes easier to set the grinding amount of each plate-shaped workpiece whose upper surface heights are different from each other to be fixed.
用以實施發明之形態
如圖1(a)所示,在本實施形態之深切緩進磨削方法(本磨削方法)中所磨削的板狀工件1是形成為大致矩形狀。並且,如圖1(b)所示,板狀工件1具有PCB等之由樹脂所構成的基板2、配設於基板2的上下表面的元件晶片3、豎立設置於各元件晶片3的電極4、及密封各元件晶片3及電極4的樹脂層5。電極4是例如Cu電極。形成樹脂層5的樹脂是例如環氧樹脂。The form used to implement the invention
As shown in Fig. 1(a), the plate-
在本實施形態中,雖然處理複數個板狀工件1,但各板狀工件1的厚度是互相不同的。厚度不同之理由是由於典型上各板狀工件1中的樹脂層5的厚度互相不同。In this embodiment, although a plurality of plate-
接著,說明在本磨削方法中所使用的磨削裝置的構成。如圖2所示,本實施形態之磨削裝置11具備有長方體形的基台12、朝上方延伸的支柱13、進行預定之運算的計算組件70、及控制磨削裝置11的各構件的控制組件71。Next, the structure of the grinding apparatus used in this grinding method is demonstrated. As shown in FIG. 2, the
在基台12的上表面側,設置有開口部12a,並以覆蓋開口部12a的方式配置有防水蓋C。又,在防水蓋C的支柱13側配置有包含保持工作台18的保持組件15。並且,在基台12的內部具備有使保持組件15在Y軸方向上移動的Y軸方向移動組件40。On the upper surface side of the
保持組件15包含有保持工作台18及支撐構件16,前述保持工作台18具有用於保持板狀工件1(參照圖1(a)(b))之保持面19,前述支撐構件16是支撐保持工作台18。保持工作台18的保持面19是連通於未圖示的吸引源。支撐構件16是在其上表面配置有保持工作台18,且是藉由Y軸方向移動組件40而與保持工作台18一起沿著Y軸移動。The
在本實施形態中,若粗略地說,保持工作台18是在前方的板狀工件載置位置與後方的磨削區域之間移動,前述板狀工件載置位置是用於將板狀工件1載置於保持面19的位置,前述磨削區域是用以磨削板狀工件1的區域。此外,藉由使保持工作台18在磨削區域內移動,而讓磨削組件26的磨削磨石37磨削已保持在保持工作台18的板狀工件1。In this embodiment, roughly speaking, the holding table 18 moves between the front plate-shaped workpiece placement position and the rear grinding area, and the aforementioned plate-shaped workpiece placement position is used to place the plate-
Y軸方向移動組件40具備有平行於Y軸方向的一對Y軸導軌42、在此Y軸導軌42上滑動之Y軸移動工作台45、和Y軸導軌42平行的Y軸滾珠螺桿43、以及連接於Y軸滾珠螺桿43的Y軸伺服馬達44、以及保持這些的保持台41。The Y-axis
Y軸移動工作台45是以可在Y軸導軌42上滑動的方式設置。在Y軸移動工作台45的下表面固定有未圖示的螺帽部。於此螺帽部螺合有Y軸滾珠螺桿43。Y軸伺服馬達44是連結於Y軸滾珠螺桿43的一端部。The Y-axis moving table 45 is installed in a manner slidable on the Y-
在Y軸方向移動組件40中,是藉由以Y軸伺服馬達44使Y軸滾珠螺桿43旋轉,而讓Y軸移動工作台45沿著Y軸導軌42在Y軸方向上移動。在Y軸移動工作台45上載置有保持組件15的支撐構件16。從而,隨著Y軸移動工作台45往Y軸方向的移動,使包含保持工作台18的保持組件15在Y軸方向上移動。In the Y-axis
支柱13是豎立設置在基台12的後部。在支柱13的前表面設置有磨削板狀工件1的磨削組件26、以及使磨削組件26朝Z軸方向上下移動的Z軸方向移動組件14。The
Z軸方向移動組件14具備有平行於Z軸方向的一對Z軸導軌21、於此Z軸導軌21上滑動的Z軸移動工作台20、和Z軸導軌21平行的Z軸滾珠螺桿22、及Z軸伺服馬達24。The Z-axis
Z軸移動工作台20是以可在Z軸導軌21上滑動的方式設置。在Z軸移動工作台20的後表面(背面)固定有未圖示的螺帽部。於此螺帽部螺合有Z軸滾珠螺桿22。Z軸伺服馬達24是連結於Z軸滾珠螺桿22的一端部。The Z-axis moving table 20 is installed in a manner slidable on the Z-
在Z軸方向移動組件14中,是藉由Z軸伺服馬達24使Z軸滾珠螺桿22旋轉,而讓Z軸移動工作台20沿著Z軸導軌21在Z軸方向上移動。In the Z-axis
磨削組件26是安裝於Z軸移動工作台20的前表面(正面)。磨削組件26具備有:固定於Z軸方向移動組件14之Z軸移動工作台20的支撐構造28、固定於支撐構造28的主軸殼體30、保持於主軸殼體30的主軸32、安裝於主軸32的下端的輪座34、及支撐於輪座34的磨削輪36。磨削組件26是將磨削輪36支撐成可旋轉。The
支撐構造28是以支撐有磨削組件26的其他構件的狀態,安裝於Z軸方向移動組件14之Z軸移動工作台20。主軸殼體30是以朝Z軸方向延伸的方式保持於支撐構造28。主軸32是朝Z軸方向延伸且以可旋轉的方式被主軸殼體30所支撐。The
於主軸32的上端側連結有馬達等旋轉驅動源(未圖示)。藉由此旋轉驅動源,主軸32是以繞著朝Z軸方向延伸之旋轉軸心的方式旋轉。A rotational drive source (not shown) such as a motor is connected to the upper end side of the
輪座34是形成為圓盤狀,且固定於主軸32的下端(前端)。如圖3所示,輪座34具有主軸裝設面34a。主軸32是透過主軸裝設面34a而連結於輪座34的中心。
此外,輪座34是透過為主軸裝設面34a之相反面即輪裝設面34b來支撐磨削輪36。The
磨削輪36是形成為具有與輪座34大致相同的直徑。如圖3所示,磨削輪36包含由不鏽鋼等金屬材料所形成之圓環狀的輪基台(環狀基台)38。在輪基台38的下表面,是涵蓋全周而固定有環狀地配置的複數個磨削磨石37。磨削磨石37是在已接觸於保持在保持工作台18的保持面19之板狀工件1的狀態下,藉由與主軸32一起旋轉來磨削板狀工件1。The grinding
再者,在本實施形態中,磨削組件26是在相對於保持工作台18就Y軸方向而言為傾斜的狀態下,磨削保持工作台18上的板狀工件1。有關於此,在本實施形態中,是如圖3所示,將磨削組件26傾斜成+ Y側變得較高,而使位於磨削磨石37的- Y側的部分磨削板狀工件1。In addition, in the present embodiment, the grinding
又,如圖2所示,在基台12中的開口部12a的側部設置有高度測定部51。高度測定部51具備有固定於基台12上的支撐柱52、設置於支撐柱52的上端的第1延伸部531及第2延伸部532、安裝在第1延伸部531的前端的第1高度測定組件54、以及安裝在第2延伸部532的前端的第2高度測定組件55。In addition, as shown in FIG. 2, a
第1高度測定組件54及第2高度測定組件55是例如雷射式的距離測定器,並配置在位於磨削區域之藉由保持工作台18所保持的板狀工件1的上部,而以非接觸方式測定板狀工件1的上表面高度。
又,也可以使用讓測定頭於板狀工件1中接觸於板狀工件1的上表面,而測定上表面高度之接觸式的測定器。再者,接觸式的測定器具備使測定頭上下移動的驅動源,並按每個板狀工件1使測定頭上下移動,而使其重複測定頭的接觸及分開並測定各自的板狀工件1的上表面高度。The first
再者,板狀工件1的上表面高度是例如從保持工作台18的保持面19沿板狀工件1的Z軸方向到上側的樹脂層5(參照圖1(b))的上端面(亦即板狀工件1的上表面)為止的距離。Furthermore, the height of the upper surface of the plate-shaped
接著,說明本磨削方法的各步驟。
在本磨削方法中,是使具有配設成環狀之磨削磨石37的磨削輪36旋轉,並使複數個板狀工件1保持在保持工作台18的保持面19,且將磨削磨石37的下表面定位到比這些板狀工件1的上表面更下方,而沿著平行於保持面19的Y軸方向,使板狀工件1與磨削磨石37相對地移動,而藉由磨削磨石37的側面及下表面來磨削板狀工件1。Next, each step of the grinding method will be described.
In this grinding method, a grinding
(1)保持步驟
在此步驟中,控制組件71是將保持工作台18配置於前方(-Y側)的板狀工件載置位置。在此狀態下,如圖4所示,可藉由使用者將複數個板狀工件1在保持工作台18之保持面19載置成使其長邊方向沿著X軸方向,並且在Y軸方向上互相分開。(1) Keep steps
In this step, the
再者,沿著相鄰的板狀工件1的Y軸方向的間隔是設定成如下之長度:在1個板狀工件1的磨削中,不讓磨削磨石37接觸到相鄰之板狀工件1之長度。Furthermore, the interval along the Y-axis direction of adjacent plate-shaped
例如,板狀工件1的尺寸為240mm×75mm,且磨削磨石37的外徑為504mm,磨削磨石37的內徑為486mm,保持工作台18的保持面19的直徑為580mm的情況下,相鄰的板狀工件1的間隔是設為35mm左右。For example, when the size of the plate-shaped
板狀工件1的載置後,藉由控制組件71控制未圖示的吸引源,並將吸引力傳達到保持面19,保持面19即吸引保持複數個板狀工件1。After the plate-shaped
(2)高度測定步驟
在此步驟中,控制組件71是將保持工作台18移動至後方(+Y側)的磨削區域內的高度測定開始位置。高度測定開始位置是例如磨削區域中的最-Y側的位置。(2) Height measurement steps
In this step, the
並且,如圖5所示,控制組件71是藉由調整高度測定部51的延伸部531及532的旋繞位置,而將第1高度測定組件54配置到位於最+Y側的板狀工件1中的X方向的中央部的上部,並且將第2高度測定組件55配置在此板狀工件1的-X方向側的端部之上部。And, as shown in FIG. 5, the
此外,控制組件71是控制Y軸方向移動組件40,而使保持工作台18如箭頭B所示地朝+Y方向移動。藉此,使第1高度測定組件54一邊沿著一點鏈線a相對於保持工作台18相對地移動,一邊將因應於位於其下部的板狀工件1的高度之測定訊號輸出到計算組件70。並且,計算組件70是依據測定訊號而計算各板狀工件1之沿著一點鏈線a的高度,並傳達至控制組件71。In addition, the
如此進行,控制組件71即取得保持工作台18上的全部的板狀工件1的X方向的中央部的上表面高度。在此,一點鏈線a是第1高度測定組件54中的上表面高度測定的掃描位置。In this way, the
又,藉由保持工作台18的移動,如圖5所示,第2高度測定組件55也沿著一點鏈線b相對於保持工作台18相對地移動,而將對應於位於其下部的板狀工件1的高度之測定訊號輸出到計算組件70。並且,計算組件70依據測定訊號計算沿著各板狀工件1的一點鏈線b的高度,並傳達至控制組件71。In addition, by the movement of the holding table 18, as shown in FIG. 5, the second
如此進行,控制組件71即取得保持工作台18上之所有的板狀工件1的-X方向側的端部的上表面高度。在此,一點鏈線b是第2高度測定組件55中的上表面高度測定的掃描位置。In this way, the
又,此高度測定步驟結束後,將朝+Y側移動的保持工作台18配置在磨削區域內的磨削開始位置。磨削開始位置是例如磨削區域中的最+Y側的位置,且是保持於保持工作台18的複數個板狀工件1當中,磨削磨石37並未接觸到最-Y側的板狀工件1的位置。
再者,在圖5中,為了方便說明,省略了配置於保持工作台18的上方之磨削磨石37等的圖示。In addition, after this height measurement step is completed, the holding table 18 moving to the +Y side is arranged at the grinding start position in the grinding area. The grinding start position is, for example, the position on the most +Y side in the grinding area, and is among the plurality of plate-
(3)磨削量設定步驟
在此步驟中,控制組件71是依據例如來自使用者的指示而設定板狀工件1的磨削量。磨削量在複數個板狀工件1之間為相同(固定)。磨削量是例如磨削上側的樹脂層5及電極4,而使電極4露出之程度的量。(3) Setting steps of grinding amount
In this step, the
(4)磨削磨石高度設定步驟
在此步驟中,控制組件71是依據例如在高度測定步驟中所測定出的各板狀工件1中的X方向的中央部之上表面高度、與在磨削量設定步驟中所設定之磨削量,而按每個板狀工件1來決定磨削板狀工件1時的磨削磨石37的高度。(4) Steps for setting the height of the grinding stone
In this step, the
如上述,磨削量在複數個板狀工件1之間是相同的。因此,磨削磨石37的高度是一方面在磨削上表面高度較高的板狀工件1的情況下設定得較高,另一方面在磨削上表面高度較低的板狀工件1的情況下設定得較低。As described above, the grinding amount is the same among the plurality of plate-shaped
(5)磨削步驟
在此步驟中,控制組件71是藉由磨削磨石37來磨削板狀工件1。此時,控制組件71是將磨削各板狀工件1時的磨削磨石37的高度設為在磨削磨石高度設定步驟中按每個板狀工件1而決定的高度。(5) Grinding steps
In this step, the
亦即,首先,控制組件71是透過圖1所示之主軸32使磨削輪36旋轉,並且藉由Z軸方向移動組件14將包含磨削輪36的磨削組件26朝下方進給。That is, first, the
在此,如上述,保持工作台18是配置在磨削區域內的最+Y側的磨削開始位置上。然後,在保持工作台18位於磨削開始位置的情況下,將磨削輪36的磨削磨石37配置在可從-Y側磨削位於最-Y側的板狀工件1的位置上。Here, as described above, the holding table 18 is arranged at the grinding start position on the most +Y side in the grinding area. Then, while keeping the table 18 at the grinding start position, the grinding
然後,控制組件71是控制Z軸方向移動組件14,而將磨削磨石37的高度設定成因應於位於最-Y側的板狀工件1在磨削磨石高度設定步驟中所決定的高度。之後,藉由控制Y軸方向移動組件40並使保持工作台18朝-Y側移動,而如圖6~圖8所示,磨削位於最-Y側的板狀工件1。Then, the
又,在磨削步驟中,如圖6所示,也是控制組件71將第1高度測定組件54配置於所磨削的板狀工件1中的X方向的中央部之上部,並且將第2高度測定組件55配置於此板狀工件1的-X方向側的端部之上部。如此進行,控制組件71是朝和高度測定步驟為相反的相反方向,沿著一點鏈線a及b測定保持工作台18上的板狀工件1的高度。並且,控制組件71是在磨削中藉由使用了高度測定之結果的反饋控制,來微調磨削磨石37的高度。Also, in the grinding step, as shown in FIG. 6, the
再者,如圖6~圖8所示,在板狀工件1中,是其X軸方向中的中央部比端部更先被磨削。從而,控制組件71可以藉由使用來自測定板狀工件1的X軸方向中的端部之高度的第2高度測定組件55的測定結果,而比較早期地實施磨削磨石37的高度的反饋控制。In addition, as shown in FIGS. 6 to 8, in the plate-shaped
又,如圖9~圖11所示,由於控制組件71是在對1個板狀工件1(1a)的磨削結束後,在讓磨削磨石37變得未接觸到此板狀工件1(1a)之後到讓磨削磨石37接觸於下一個板狀工件1(1b)之前,控制Z軸方向移動組件14,而將磨削磨石37的高度變更成因應於下一個板狀工件1(1b)在磨削磨石高度設定步驟中所設定的高度。In addition, as shown in FIGS. 9 to 11, since the
如此,在磨削步驟中,是因應於在高度測定步驟中所測定之各板狀工件1的上表面高度來變更磨削磨石37的高度,藉此對上表面高度不同的各自的板狀工件1進行固定量磨削。In this way, in the grinding step, the height of the grinding
如以上,在本磨削方法中,是在磨削磨石高度設定步驟中將複數個板狀工件1按每個來決定磨削磨石37的高度,而在磨削步驟中將磨削磨石37的高度設定在按每個板狀工件1而決定的高度,並磨削板狀工件1。藉此,在藉由保持工作台18的保持面19來保持複數個板狀工件1並進行深切緩進磨削時,即使是各板狀工件1的上表面高度(厚度)為互相不同的情況下,仍然可以將各板狀工件1的磨削量設成固定。As described above, in this grinding method, the height of the grinding
又,本磨削方法是在磨削磨石高度設定步驟之前,實施測定各板狀工件1的上表面高度的測定步驟、以及設定板狀工件1中的固定的磨削量的磨削量設定步驟。並且,在磨削步驟中,是將磨削磨石37的高度設定成考慮所測定出的板狀工件1的上表面高度而決定的高度。亦即,在磨削步驟中,可因應於所測定出的板狀工件1的上表面高度來變更磨削磨石37的高度。藉此,將上表面高度互相不同的各板狀工件1的磨削量設成固定之作法即變得較容易。In addition, this grinding method implements the measuring step of measuring the height of the upper surface of each plate-shaped
再者,在本實施形態中,是在磨削磨石高度設定步驟中,以使各板狀工件1的磨削量成為固定的方式來決定磨削磨石37的高度。亦可取代於此,而在例如保持工作台18的保持面19保持有不同的種類的板狀工件1的情況下,在磨削磨石高度設定步驟中,以按每個板狀工件1的種類,來變更切割後的厚度即成品厚度的方式決定磨削磨石37的高度。藉此,可以讓板狀工件1以具有因應於其種類之適當的成品厚度的方式來進行深切緩進磨削。In addition, in this embodiment, in the grinding stone height setting step, the height of the grinding
又,在本磨削方法中,磨削組件26是在相對於保持工作台18朝Y軸方向傾斜的狀態下,磨削保持工作台18上的板狀工件1。有關於此,在圖3所示之形態中,磨削組件26是傾斜成+Y側變得較高,且使磨削磨石37之位於-Y側的部分磨削板狀工件1。但是,並非受限於此,亦可構成為將磨削組件26傾斜成-Y側變得較高,且使磨削磨石37之位於+Y側的部分磨削板狀工件1。此時,在磨削時,保持工作台18是從-Y側朝向+Y側而移動。In addition, in this grinding method, the grinding
又,在本實施形態之高度測定步驟中,控制組件71是取得板狀工件1的-X方向側的端部的上表面高度、及板狀工件1的X方向的中央部的上表面高度。亦可取代於此,控制組件71僅取得其中任一個的高度。In the height measurement step of the present embodiment, the
又,在本實施形態的磨削磨石高度設定步驟中,控制組件71是依據在高度測定步驟所測定出的各板狀工件1中的X方向的中央部之上表面高度、與在磨削量設定步驟中所設定之磨削量,來決定磨削板狀工件1時的磨削磨石37的高度。亦可取代於此,控制組件71是使用各板狀工件1中的-X方向側的端部的上表面高度、或端部的上表面高度與中央部的上表面高度之雙方,來和磨削量設定步驟中所設定的磨削量一起而決定磨削磨石37的高度。In the grinding stone height setting step of the present embodiment, the
1、1a、1b:板狀工件
2:基板
3:元件晶片
4:電極
5:樹脂層
11:磨削裝置
12:基台
12a:開口部
13:支柱
14:Z軸方向移動組件
15:保持組件
16:支撐構件
18:保持工作台
19:保持面
20:Z軸移動工作台
21:Z軸導軌
22:Z軸滾珠螺桿
24:Z軸伺服馬達
26:磨削組件
28:支撐構造
30:主軸殼體
32:主軸
34:輪座
34a:主軸裝設面
34b:輪裝設面
36:磨削輪
37:磨削磨石
38:輪基台
40:Y軸方向移動組件
41:保持台
42:Y軸導軌
43:Y軸滾珠螺桿
44:Y軸伺服馬達
45:Y軸移動工作台
51:高度測定部
52:支撐柱
531:第1延伸部
532:第2延伸部
54:第1高度測定組件
55:第2高度測定組件
70:計算組件
71:控制組件
a、b:一點鏈線
B:箭頭
C:防水蓋
+X、-X、+Y、-Y、+Z、-Z、Z:方向1, 1a, 1b: plate-shaped workpiece
2: substrate
3: Component chip
4: electrode
5: Resin layer
11: Grinding device
12:
圖1(a)是在本實施形態之磨削方法(本磨削方法)中磨削的板狀工件的平面圖,圖1(b)是圖1(a)中的A - A線箭頭視角截面圖。 圖2是顯示在本磨削方法中所使用的磨削裝置的構成的立體圖。 圖3是顯示磨削輪的構成的截面圖。 圖4是顯示本磨削方法中的保持步驟的頂視圖。 圖5是顯示本磨削方法中的高度測定步驟的頂視圖。 圖6是顯示本磨削方法的磨削步驟中的剛開始磨削後之保持工作台、磨削磨石、第1高度測定組件及第2高度測定組件的頂視圖。 圖7是顯示圖6所示之保持工作台、磨削磨石及第2高度測定組件的截面圖。 圖8是顯示圖6所示之保持工作台、磨削磨石及第1高度測定組件的截面圖。 圖9是顯示在本磨削方法的磨削步驟中,剛磨削了1片板狀工件後之保持工作台、磨削磨石、第1高度測定組件及第2高度測定組件的頂視圖。 圖10是顯示圖9所示之保持工作台、磨削磨石及第2高度測定組件的截面圖。 圖11是顯示圖9所示之保持工作台、磨削磨石及第1高度測定組件的截面圖。Fig. 1(a) is a plan view of a plate-shaped workpiece ground in the grinding method of this embodiment (this grinding method), and Fig. 1(b) is a cross-sectional view taken from the line A-A in Fig. 1(a) Figure. Fig. 2 is a perspective view showing the configuration of a grinding device used in the grinding method. Fig. 3 is a cross-sectional view showing the configuration of the grinding wheel. Fig. 4 is a top view showing the holding step in the present grinding method. Fig. 5 is a top view showing the height measurement step in the grinding method. Fig. 6 is a top view showing the holding table, the grinding grindstone, the first height measuring unit, and the second height measuring unit just after the grinding is started in the grinding step of the grinding method. Fig. 7 is a cross-sectional view showing the holding table, the grinding stone, and the second height measuring unit shown in Fig. 6. Fig. 8 is a cross-sectional view showing the holding table, the grinding stone, and the first height measuring unit shown in Fig. 6. 9 is a top view showing the holding table, the grinding grindstone, the first height measuring unit, and the second height measuring unit immediately after grinding a plate-shaped workpiece in the grinding step of the grinding method. Fig. 10 is a cross-sectional view showing the holding table, the grinding stone, and the second height measuring unit shown in Fig. 9. Fig. 11 is a cross-sectional view showing the holding table, the grinding stone, and the first height measuring unit shown in Fig. 9.
1、1a、1b:板狀工件 1, 1a, 1b: plate-shaped workpiece
14:Z軸方向移動組件 14: Moving component in Z axis direction
18:保持工作台 18: Keep the workbench
19:保持面 19: Keep the face
34:輪座 34: wheel seat
37:磨削磨石 37: Grinding grindstone
38:輪基台 38: Wheel abutment
40:Y軸方向移動組件 40: Moving component in Y axis direction
55:第2高度測定組件 55: The second height measurement unit
b:一點鏈線 b: a little chain line
B:箭頭 B: Arrow
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JP6300654B2 (en) * | 2014-06-13 | 2018-03-28 | 株式会社ディスコ | Grinding method |
JP6346833B2 (en) * | 2014-09-17 | 2018-06-20 | 株式会社ディスコ | Workpiece grinding method |
JP6774244B2 (en) * | 2016-07-22 | 2020-10-21 | 株式会社ディスコ | Grinding device |
-
2018
- 2018-12-04 JP JP2018227209A patent/JP2020089930A/en active Pending
-
2019
- 2019-11-27 KR KR1020190154392A patent/KR20200067752A/en not_active Application Discontinuation
- 2019-12-02 CN CN201911211341.2A patent/CN111266931A/en active Pending
- 2019-12-03 TW TW108144170A patent/TW202041320A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN111266931A (en) | 2020-06-12 |
JP2020089930A (en) | 2020-06-11 |
KR20200067752A (en) | 2020-06-12 |
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