TW202029413A - Method to register the origin position of cutting device which can keep a high-precision calculation of incision depth for a processed object - Google Patents
Method to register the origin position of cutting device which can keep a high-precision calculation of incision depth for a processed object Download PDFInfo
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- TW202029413A TW202029413A TW109101903A TW109101903A TW202029413A TW 202029413 A TW202029413 A TW 202029413A TW 109101903 A TW109101903 A TW 109101903A TW 109101903 A TW109101903 A TW 109101903A TW 202029413 A TW202029413 A TW 202029413A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Abstract
Description
本發明係關於切割裝置的原點位置登錄方法。The present invention relates to a method for registering the origin position of a cutting device.
已知以裝設於主軸之切割刀片切割半導體晶圓等各種板狀物,並形成所要求之深度的槽或分割之加工。例如已開發以下技術:高深度精確度地在被加工物形成所要求之深度的槽時,配合被加工物的厚度(高度)而控制切割刀片的高度。It is known to process various plates such as semiconductor wafers with a dicing blade installed on a spindle, and to form grooves of a required depth or to divide them. For example, the following technology has been developed to control the height of the cutting blade according to the thickness (height) of the workpiece when the workpiece is formed into a groove of the required depth with high depth accuracy.
要進一步增加精確度時,需要正確控制切割刀片的刀鋒與卡盤台的保持面之距離。將切割刀片的前端(下端)與卡盤台的保持面接觸的點登錄(設置)作為所謂原點位置,藉由控制從原點位置起的距離(高度)而控制切口深度,此係一般切割裝置之運用方法。然而,因卡盤台有厚度偏差或傾斜,故將一處的原點位置適用於保持面全面會在切口深度精確度產生誤差。To further increase the accuracy, it is necessary to correctly control the distance between the blade edge of the cutting blade and the holding surface of the chuck table. Register (set) the point where the tip (lower end) of the cutting blade contacts the holding surface of the chuck table as the so-called origin position, and control the depth of the incision by controlling the distance (height) from the origin position. This is a general cutting How to use the device. However, due to the thickness deviation or tilt of the chuck table, applying a position of the origin to the entire holding surface will cause errors in the accuracy of the cut depth.
又,使主軸在分度進給方向(Y軸方向)移動之單元或使卡盤台在加工進給方向(X軸方向)移動之單元等,也因其真直度有所極限,故在欲以非常高的精確度控制切口深度之情形,需要登錄卡盤台全面中的原點位置,並配合其而修正X、Y、Z各軸的移動。In addition, the unit that moves the spindle in the indexing feed direction (Y-axis direction) or the unit that moves the chuck table in the machining feed direction (X-axis direction), etc., are also limited due to their straightness. To control the incision depth with very high accuracy, it is necessary to register the origin position of the chuck table and correct the movement of the X, Y, and Z axes.
因此,本發明之申請人提出一種加工裝置,其測量晶圓的高度,並根據此而控制切口深度(例如,參照專利文獻1)。 [習知技術文獻] [專利文獻]Therefore, the applicant of the present invention proposes a processing device that measures the height of the wafer and controls the depth of the cut based on this (for example, refer to Patent Document 1). [Literature Technical Literature] [Patent Literature]
[專利文獻1]日本特開2016-207808號公報[Patent Document 1] JP 2016-207808 A
[發明所欲解決的課題] 前述加工裝置被要求即使卡盤台的保持面有高度偏差亦可實現對被加工物的高精確度切口深度。[The problem to be solved by the invention] The aforementioned processing device is required to achieve high-precision cut depth of the workpiece even if the holding surface of the chuck table has a height deviation.
本發明係有鑑於此問題點而完成者,其目的為提供一種切割裝置的原點位置登錄方法,其即使卡盤台的保持面有高度偏差,亦可實現對被加工物的高精確度切口深度。The present invention was completed in view of this problem, and its purpose is to provide a method for registering the origin position of a cutting device, which can achieve high-precision cutting of the workpiece even if the holding surface of the chuck table has a height deviation depth.
[解決課題的技術手段] 為了解決上述課題並達成目的,本發明之切割裝置的原點位置登錄方法係使用切割裝置之原點位置的登錄方法,該切割裝置具備:卡盤台,其將被加工物保持在保持面;切割單元,其切割保持於該卡盤台之被加工物,並於主軸裝設有切割刀片;X軸移動單元,其使該卡盤台及該切割單元往與該保持面平行之X軸方向相對地移動;Y軸移動單元,其使該卡盤台及該切割單元往與該保持面平行且與該X軸方向正交之Y軸方向相對地移動;Z軸移動單元,其使該卡盤台及該切割單元往與該保持面正交之Z軸方向相對地移動;攝影機單元,其拍攝保持於該保持面之被加工物;原點位置登錄部,其將該保持面與該切割刀片前端接觸之切割單元的該Z軸方向高度作為原點位置,並登錄分別對應該保持面之XY座標的該原點位置;及修正部,其根據登錄在該原點位置登錄部之資訊,因應XY座標修正該切割單元之該Z軸方向的高度;該切割裝置的原點位置登錄方法的特徵在於具備以下步驟:薄片保持步驟,其於該卡盤台的保持面保持預定厚度的薄片;切割痕形成步驟,其在該卡盤台之多個XY座標使該切割單元從該薄片的表面在該Z軸方向升降預定量,並以該切割刀片形成未完全切斷該薄片之深度的切割痕;及原點位置登錄步驟,其以該攝影機單元檢測多個該切割痕相對於XY座標的長度,從該切割痕的長度與該切割刀片的外徑計算該切割痕之切口深度,並從該切口深度與該薄片的厚度對應該XY座標推算該原點位置並記憶。[Technical means to solve the problem] In order to solve the above-mentioned problems and achieve the objective, the origin position registration method of the cutting device of the present invention uses the origin position registration method of the cutting device. The cutting device includes: a chuck table that holds the workpiece on the holding surface; A cutting unit, which cuts the workpiece held on the chuck table, and is equipped with a cutting blade on the main shaft; an X-axis moving unit, which moves the chuck table and the cutting unit to the X axis direction parallel to the holding surface Relatively move; Y-axis moving unit, which makes the chuck table and the cutting unit relatively move to the Y-axis direction parallel to the holding surface and orthogonal to the X-axis direction; Z-axis moving unit, which makes the card The disk table and the cutting unit move relative to the Z axis direction orthogonal to the holding surface; the camera unit photographs the processed object held on the holding surface; the origin position registration part, which cuts the holding surface and The Z-axis height of the cutting unit contacted by the tip of the blade is taken as the origin position, and the origin position corresponding to the XY coordinates of the holding surface is registered; and the correction part is based on the information registered in the origin position registration part, The height of the cutting unit in the Z-axis direction is corrected according to the XY coordinates; the origin position registration method of the cutting device is characterized by the following steps: a sheet holding step, which holds a sheet of a predetermined thickness on the holding surface of the chuck table; A step of forming a cutting mark, in which a plurality of XY coordinates of the chuck table make the cutting unit lift a predetermined amount from the surface of the sheet in the Z-axis direction, and use the cutting blade to form a cut to a depth that does not completely cut the sheet Mark; and the origin position registration step, which uses the camera unit to detect the length of a plurality of the cut marks relative to the XY coordinates, calculate the cut depth of the cut marks from the length of the cut marks and the outer diameter of the cutting blade, and from The depth of the cut and the thickness of the sheet correspond to the XY coordinates to calculate the origin position and memorize it.
前述切割裝置的原點位置登錄方法中,該薄片為外周被固定於環狀框架之切割膠膜,該保持面可被該切割膠膜覆蓋。In the aforementioned method for registering the origin position of the cutting device, the sheet is a cutting film whose outer periphery is fixed to the ring frame, and the holding surface can be covered by the cutting film.
[發明功效] 本發明可發揮以下功效:即使卡盤台的保持面有高度偏差,也可實現對被加工物的高精確度切口深度。[Invention Effect] The invention can exert the following effects: even if the holding surface of the chuck table has a height deviation, it can also realize a high-precision cut depth of the workpiece.
一邊參照圖式一邊詳細說明用於實施本發明之方式(實施方式)。本發明並不受限於以下實施方式所記載的內容。又,以下所記載的構成要件包含本發明所屬技術領域中具有通常知識者可輕易思及及實質上相同者。再者,以下所記載的構成能適當組合。又,可在不超出本發明主旨範圍內進行構成的各種省略、取代或變更。The mode (embodiment) for implementing the present invention will be described in detail with reference to the drawings. The present invention is not limited to the content described in the following embodiments. In addition, the constituent requirements described below include those that can be easily thought of and are substantially the same by those having ordinary knowledge in the technical field to which the present invention belongs. In addition, the configurations described below can be combined as appropriate. In addition, various omissions, substitutions, or changes in the configuration can be made without departing from the scope of the gist of the present invention.
[實施方式1] 根據圖式說明本發明的實施方式1之切割裝置的原點位置登錄方法。圖1係表示實施方式1之實施切割裝置的原點位置登錄方法之切割裝置的構成例之立體圖。圖2係示意性地表示圖1所示切割裝置之Z軸方向位置檢測單元的構成之圖。圖3係示意性地表示圖1所示切割裝置之控制單元的原點位置登錄部已登錄原點位置的資訊之圖。[Embodiment 1] The origin position registration method of the cutting device in the first embodiment of the present invention will be described based on the drawings. FIG. 1 is a perspective view showing a configuration example of a cutting device for implementing the origin position registration method of the cutting device according to the first embodiment. Fig. 2 is a diagram schematically showing the configuration of the Z-axis direction position detection unit of the cutting device shown in Fig. 1. FIG. 3 is a diagram schematically showing the information that the origin position registration unit of the control unit of the cutting device shown in FIG. 1 has registered the origin position.
實施方式1之切割裝置的原點位置登錄方法係由圖1所示之切割裝置1進行實施。圖1所示之切割裝置1為切割(相當於加工)圖1所示之被加工物200的加工裝置。實施方式1中,被加工物200為以矽、藍寶石、鎵等作為母材之圓板狀半導體晶圓或光學元件晶圓等晶圓。被加工物200係在表面201藉由形成為網格狀的多條分割預定線202而劃分成網格狀的區域中形成元件203。The origin position registration method of the cutting device of the first embodiment is implemented by the
又,本發明之被加工物200可為中央部經薄化且在外周部形成厚部之所謂TAIKO(註冊商標)晶圓,也可為晶圓之外、具有多個以樹脂密封之元件的矩形狀封裝基板、陶瓷基板、鐵氧體基板或含有鎳及鐵之至少一者的基板等。實施方式1中,被加工物200的背面204黏貼於切割膠膜205並被環狀框架206支撐,該切割膠膜205的外周緣裝設於環狀框架206。In addition, the
圖1所示之切割裝置1係將被加工物200保持於卡盤台10並沿著分割預定線202以切割刀片21進行切割之裝置。如圖1所示,切割裝置1具備:以保持面11吸引保持被加工物200之卡盤台10、主軸22裝設有切割保持於卡盤台10之被加工物200的切割刀片21之切割單元20、拍攝保持於卡盤台10的保持面11之被加工物200之攝影機單元30及控制單元100。The
又,如圖1所示,切割裝置1至少還具備:使卡盤台10及切割單元20往與保持面11平行之X軸方向相對地移動之X軸移動單元40、使卡盤台10及切割單元20往與保持面11平行且與X軸方向正交之Y軸方向相對地移動之Y軸移動單元50,及使卡盤台10及切割單元20往與保持面11正交之Z軸方向相對地移動之Z軸移動單元60。如圖1所示,切割裝置1具備二個切割單元20,亦即係雙主軸之切割機,所謂對向式雙主軸型的切割裝置1。In addition, as shown in FIG. 1, the
卡盤台10為圓盤形狀,保持被加工物200之保持面11係由多孔陶瓷等所形成。又,卡盤台10係藉由X軸移動單元,而在跨越切割單元20下方之加工區域與從切割單元20下方分開並將被加工物200搬入搬出之搬入搬出區域間,藉由X軸移動單元40在X軸方向自由移動地設置,且藉由旋轉驅動源而繞著與Z軸方向平行之軸心自由旋轉地設置。卡盤台10係與圖中未表示之真空吸引源連接,並藉由真空吸引源而被吸引,藉此吸引、保持載置於保持面11之被加工物200。在實施方式1中,卡盤台10係透過切割膠膜205而吸引、保持被加工物200的背面204側。又,如圖1所示,卡盤台10的周圍設置有多個夾持環狀框架206之夾具部12。The chuck table 10 has a disc shape, and the
切割單元20為自由裝卸地裝設有切割保持於卡盤台10之被加工物200的切割刀片21的切割手段。切割單元20分別相對於保持於卡盤台10之被加工物200藉由Y軸移動單元50在Y軸方向自由移動地設置,且藉由Z軸移動單元60在Z軸方向自由移動地設置。The
如圖1所示,一切割單元20係透過Y軸移動單元50、Z軸移動單元60等而設置於從裝置本體2立設之門型支撐框架3的一柱部4。如圖1所示,另一切割單元20係透過Y軸移動單元50、Z軸移動單元60等而設置於支撐框架3的另一柱部5。此外,支撐框架3係藉由水平梁6連結柱部4、5彼此的上端。As shown in FIG. 1, a
切割單元20係藉由Y軸移動單元50及Z軸移動單元60而使切割刀片21能定位於卡盤台10的保持面11之任意位置。切割單元20具備:藉由Y軸移動單元50及Z軸移動單元60而在Y軸方向及Z軸方向自由移動地設置之主軸外殼23,及繞主軸外殼23軸心自由旋轉地設置並藉由馬達旋轉且同時於前端裝設有切割刀片21之主軸22。The
攝影機單元30係以與切割單元20一體移動之方式固定於切割單元20。攝影機單元30具備拍攝保持於卡盤台10之切割前的被加工物200的所欲分割區域之攝像元件。攝像元件例如為CCD(Charge-Coupled Device,電荷耦合元件)攝像元件或CMOS(Complementary MOS,互補式金屬氧化物半導體)攝像元件。攝影機單元30係拍攝保持於卡盤台10之被加工物200,而獲得用於執行被加工物200與切割刀片21的對位之對準等的影像,並將所得的影像輸出至控制單元100。The
X軸移動單元40係使卡盤台10在加工進給方向亦即X軸方向移動,藉此將卡盤台10與切割單元20相對地沿著X軸方向進行加工進給。Y軸移動單元50係使切割單元20在分度進給方向亦即Y軸方向移動,藉此將卡盤台10與切割單元20相對地沿著Y軸方向進行分度進給。Z軸移動單元60係使切割單元20在切割進給方向亦即Z軸方向移動,藉此將卡盤台10與切割單元20相對地沿著Z軸方向進行切割進給。The
X軸移動單元40、Y軸移動單元50及Z軸移動單元60具備:繞軸心自由旋轉地設置之習知的滾珠螺桿51、61;使滾珠螺桿51、61繞軸心旋轉之習知的脈衝馬達52、62;及將卡盤台10或切割單元20在X軸方向、Y軸方向或Z軸方向自由移動地支撐之習知的導軌53、63。The
又,切割裝置1具備:用於檢測卡盤台10之X軸方向的位置且圖中未表示之X軸方向位置檢測單元、用於檢測切割單元20之Y軸方向的位置且圖中未表示之Y軸方向位置檢測單元、及用於檢測切割單元20之Z軸方向的位置且圖2所示之Z軸方向位置檢測單元70。X軸方向位置檢測單元及Y軸方向位置檢測單元可藉由以下而構成:線性尺標,其與X軸方向或Y軸方向平行;及讀取頭,其藉由X軸移動單元40或Y軸移動單元50而在X軸方向或Y軸方向自由移動地設置,並讀取線性尺標的標度。X軸方向位置檢測單元及Y軸方向位置檢測單元係將讀取頭所讀取之表示線性尺標的標度之資訊作為表示卡盤台10之X軸方向的位置或切割單元20之Y軸方向的位置之資訊,而輸出至控制單元100。In addition, the
如圖2所示,實施方式1中,Z軸方向位置檢測單元70具備:線性尺標71,其裝設於移動桌台54(圖1所示)等,該移動桌台54係藉由Y軸移動單元50而在Y軸方向移動;及讀取頭72,其藉由Z軸移動單元60而與切割單元20一體地在Z軸方向自由移動地設置。線性尺標71具備多個設置在Z軸方向之標度73。讀取頭72讀取與線性尺標71之讀取頭72相向之標度73。Z軸方向位置檢測單元70將讀取頭72所讀取之表示線性尺標71的標度73之資訊檢測作為切割單元20之Z軸方向的位置,並輸出至控制單元100。又,本發明中,Z軸方向位置檢測單元70亦可藉由繞滾珠螺桿61軸心旋轉之脈衝馬達62的脈衝數而檢測切割單元20之Z軸方向的位置。As shown in FIG. 2, in the first embodiment, the Z-axis direction
又,切割裝置1具備:卡匣升降機80,其在上表面載置卡匣81且使卡匣81在Z軸方向升降移動,該卡匣81係在Z軸方向空開間隔收納多個切割前後之被加工物200;清洗單元90,其清洗切割後之被加工物200;及圖中未表示的搬送單元,其在卡匣81與卡盤台10與清洗單元90之間搬送被加工物200。搬送單元將切割前之被加工物200搬送至卡盤台10的保持面11中預先決定的預定位置。In addition, the
控制單元100係分別控制切割裝置1之上述各單元,並於切割裝置1對被加工物200實施加工動作。具體而言,控制單元100係使搬送單元將切割加工前之被加工物200從卡匣81搬送至卡盤台10的保持面11。控制單元100係將被加工物200吸引保持在卡盤台10,並使夾具部12夾持環狀框架206後,使X軸移動單元40移動卡盤台10,並使攝影機單元30拍攝卡盤台10上之被加工物200。控制單元100係執行被加工物200與切割刀片21的對位之對準,並一邊使卡盤台10與切割單元20的切割刀片21沿著分割預定線202相對地移動,一邊使切割刀片21切入分割預定線202。The
控制單元100係在切割刀片21切入所有分割預定線202後,解除卡盤台10的吸引保持及夾具部12的夾持,使搬送單元將卡盤台10上之被加工物200搬送至清洗單元90。控制單元100係使清洗單元90清洗被加工物200,並使搬送單元將被加工物200從清洗單元90搬送至卡匣81。After the
控制單元100為一電腦,具有:具有如CPU(central processing unit,中央處理單元)之微處理機的運算處理裝置、具有如ROM(read only memory,唯讀記憶體)或RAM(random access memory,隨機存取記憶體)之記憶體的記憶裝置及輸出輸入界面裝置。控制單元100之運算處理裝置係根據記憶於記憶裝置之電腦程式實施運算處理,將用於控制切割裝置1之控制訊號透過輸出輸入界面裝置而輸出至切割裝置1之上述各單元。The
又,控制單元100連接:圖中未表示的顯示單元,其顯示加工動作的狀態或攝影機單元30所拍攝的影像等;及輸入單元,其用於操作員登錄加工內容資訊等之際。加工內容資訊記憶於記憶裝置。加工內容資訊包含將切割刀片21切入各分割預定線202時之切割刀片21刀刃的刀鋒從保持面11起的Z軸方向的高度。顯示單元係藉由液晶顯示裝置等而構成。輸入單元係藉由設置於顯示單元的顯示畫面之觸控面板或鍵盤等外部輸入裝置等而構成。In addition, the
又,控制單元100具備原點位置登錄部101與修正部102。原點位置登錄部101登錄對應保持面11的XY座標之各個切割單元20之Z軸方向的原點位置302之資訊300(圖3所示)。此外,所謂原點位置302,係指保持面11與切割刀片21的刀鋒前端接觸之切割單元20之Z軸方向的高度,亦即表示保持面11之Z軸方向的高度之位置。實施方式1中,所謂原點位置302,係指在保持面11與切割刀片21的刀鋒前端接觸時,對應Z軸方向位置檢測單元70所檢測之切割單元20之Z軸方向的位置者。In addition, the
又,所謂保持面11之XY座標,係指以從保持面11之預先決定位置起的X軸方向及Y軸方向的距離而定之保持面11上的座標。原點位置登錄部101登錄保持面11之預先決定且互相不同之多個位置301分別的原點位置302及XY座標。亦即,如圖3所示,原點位置登錄部101登錄使各位置301個別的XY座標與各位置301的原點位置302一對一地相對應的資訊300。In addition, the XY coordinates of the holding
此外,實施方式1中,使保持面11中心之位置301(以下以符號301-1表示)的XY座標與位置301-1的原點位置302(以下以符號302-1表示)相對應。實施方式1中,使保持面11之從位置301-1起在Y軸方向離開第一距離的位置301(以下以符號301-2、301-3表示)個別的XY座標與各位置301-2、301-3個別的原點位置302(以下以符號302-2、302-3表示)相對應。實施方式1中,使保持面11之從位置301-1起在Y軸方向分開較第一距離長之第二距離之位置301(以下以符號301-4、301-5表示)個別的XY座標與各位置301-4、301-5個別的原點位置302(以下以符號302-4、302-5表示)相對應。實施方式1中,使保持面11之從位置301-1起在X軸方向分離與第一距離及第二距離兩者相異之第三距離之位置301(以下以符號301-6、301-7表示)個別的XY座標與各位置301-6、301-7個別的原點位置302(以下以符號302-6、302-7表示)相對應。In addition, in
此外,本說明書中,在不區別保持面11之各位置301彼此之情形中係使用符號301,而在區別各位置301彼此之際則使用符號301-1、301-2、301-3、301-4、301-5、301-6、301-7。保持面11之各位置301-1、301-2、301-3、301-4、301-5、301-6、301-7的XY座標係預先決定並記憶於記憶裝置。又,本說明書中,在不區別保持面11之各位置301的原點位置302彼此之情形中係使用符號302,而在區別各原點位置302彼此之際則使用符號302-1、302-2、302-3、302-4、302-5、302-6、302-7。又,實施方式1中,各原點位置302-1、302-2、302-3、302-4、302-5、302-6、302-7係以各位置301-1、301-2、301-3、301-4、301-5、301-6、301-7中任一位置301的原點位置302為零,並以從任一位置301的原點位置302起的Z軸方向的距離而定。實施方式1中,各原點位置302-1、302-2、302-3、302-4、302-5、302-6、302-7係以位置301-1的原點位置302-1為零,以從位置301-1的原點位置302-1起的Z軸方向的距離而定。實施方式1中,例如在原點位置302較原點位置302-1更上方之情形中,以從原點位置302-2起的正距離(例如+1μm等)而定,在原點位置302較原點位置302-1更下方之情形中,以從原點位置302-2起的負距離(例如-1μm等)而定。In addition, in this specification, the
修正部102係根據登錄於原點位置登錄部101之如圖3所示之資訊300,使切割刀片21切入被加工物200時的切割單元20之Z軸方向的高度因應XY座標進行修正。亦即,修正部102係在使切割刀片21切入各分割預定線202時,根據登錄於原點位置登錄部101之如圖3所示之資訊300,而控制Z軸移動單元60,並以成為預先記憶於記憶裝置之切割刀片21刀刃的刀鋒從保持面11起的Z軸方向的高度之方式,調整切割單元20之Z軸方向的高度。修正部102計算切割刀片21切入分割預定線202之位置的XY座標。修正部102根據登錄於原點位置登錄部101之如圖3所示之資訊300,計算切割刀片21切入分割預定線202之位置的原點位置302,並根據所計算之原點位置302控制Z軸移動單元60,以成為預先記憶於記憶裝置之切割刀片21刀刃的刀鋒從保持面11起的Z軸方向的高度之方式,調整切割單元20之Z軸方向的高度。The
例如,修正部102根據如圖3所示之資訊300,若切割刀片21切入分割預定線202之位置的原點位置302位於較原點位置302-1更上方,則使切割單元20上升以下距離量:切割刀片21切入分割預定線202之位置的原點位置302從原點位置302-1起的Z軸方向的距離量。修正部102根據如圖3所示之資訊300,若切割刀片21切入分割預定線202之位置的原點位置302位於較原點位置302-1更下方,則使切割單元20下降以下距離量:切割刀片21切入分割預定線202之位置的原點位置302從原點位置302-1起的Z軸方向的距離量。For example, based on the
藉由將資訊300記憶於記憶裝置,而實現原點位置登錄部101之功能。藉由控制單元100之運算處理裝置根據記憶於記憶裝置之電腦程式實施運算處理,而實現修正部102之功能。By storing the
接著,本說明書說明於切割裝置1之控制單元100的原點位置登錄部101登錄各位置301的原點位置302之方法,亦即實施方式1之切割裝置的原點位置登錄方法。圖4為表示實施方式1之切割裝置的原點位置登錄方法之流程之流程圖。圖5為示意性地表示圖4所示之切割裝置的原點位置登錄方法之切割痕形成步驟之局部剖面側視圖。圖6為示意性地表示圖4所示之切割裝置的原點位置登錄方法之切割痕形成步驟中的切割刀片與切割痕等之切割膠膜剖面圖。圖7為圖4所示之切割裝置的原點位置登錄方法之切割痕形成步驟後的切割膠膜之俯視圖。圖8係表示圖4所示之切割裝置的原點位置登錄方法的原點位置登錄步驟中所登錄的資訊一例之圖。Next, this specification describes a method of registering the
切割裝置的原點位置登錄方法為使用圖1所示之切割裝置1之原點位置302的登錄方法,如圖4所示,具備薄片保持步驟ST1、切割痕形成步驟ST2及原點位置登錄步驟ST3。切割裝置的原點位置登錄方法中,首先,操作員將表示薄片亦即切割膠膜205之厚度205-1(示於圖5及圖6,相當於申請專利範圍所記載的預定厚度)之資訊及表示切割刀片21之外徑R(示於圖5及圖6)之資訊登錄於控制單元100,將於外周緣黏貼有環狀框架206之切割膠膜205收納於卡匣81,將卡匣81設置於卡匣升降機80的上表面。其後,若控制單元100接受到來自操作員之原點位置302的登錄動作的開始指示,則切割裝置的原點位置登錄方法係由薄片保持步驟ST1起依序實施。The origin position registration method of the cutting device is the registration method using the
薄片保持步驟ST1係於保持面11保持切割膠膜205之步驟。亦即,實施方式1中,申請專利範圍所記載之薄片係外周緣黏貼於環狀框架206並被固定之切割膠膜205。此外,實施方式1中,切割膠膜205之厚度205-1之偏差(最大之厚度205-1與最小之厚度205-1的差)在卡盤台10的保持面11程度的面積中為1μm以下。薄片保持步驟ST1中,切割裝置1之控制單元100係使搬送單元將收納於卡匣81且於外周緣黏貼有環狀框架206之切割膠膜205搬送至卡盤台10的保持面11中預先決定之預定位置。The sheet holding step ST1 is a step of holding the cut
薄片保持步驟ST1中,控制單元100係使卡盤台10的保持面11吸引保持切割膠膜205,且同時使夾具部12夾持環狀框架206。實施方式1中,薄片保持步驟ST1中,卡盤台10的保持面11係由切割膠膜205覆蓋,且同時使切割膠膜205密接於保持面11。如此一來,切割膠膜205的表面亦即上表面205-2之高度係同保持面11之高度。切割裝置的原點位置登錄方法進入切割痕形成步驟ST2。In the sheet holding step ST1, the
切割痕形成步驟ST2係如後述的步驟:在卡盤台10的保持面11之多個XY座標所決定的各位置301上,從切割膠膜205之上表面205-2使任一切割單元20在Z軸方向升降預定量,並以切割刀片21形成未完全切斷切割膠膜205之切口深度H(示於圖6)之切割痕400。切割痕形成步驟ST2中,控制單元100係使X軸移動單元40將卡盤台10移動往加工區域,使切割刀片21切入至保持面11之各位置301上的切割膠膜205,於保持面11之各位置301上的切割膠膜205形成切割痕400。如此,實施方式1之切割裝置的原點位置登錄方法於被加工物200之一般切割加工所使用的切割膠膜205形成切割痕400。The cutting mark formation step ST2 is a step described later: at each
切割痕形成步驟ST2中,於各位置301上之切割膠膜205形成切割痕400時,控制單元100係控制各移動單元40、50、60等,使藉由主軸22而旋轉之切割刀片21位於各位置301上且Z軸方向高度成為從保持面11起的預先決定之預定高度之位置。切割痕形成步驟ST2中,於各位置301上之切割膠膜205形成切割痕400時,控制單元100係控制Z軸移動單元60等,使切割刀片21下降預先決定之預定移動量,即刀鋒的前端切入切割膠膜205之厚度方向中央,如圖5中虛線與實線以及圖6所示,使切割刀片21之刀鋒的前端切入至切割膠膜205之厚度方向中央後,使其上升。In the cutting mark forming step ST2, when the
亦即,切割刀片21之刀鋒前端切入至切割膠膜205之厚度方向中央並形成切割痕400時的切割刀片21之軸心21-1在Z軸方向的高度(示於圖6)是預先決定的。如此,切割痕形成步驟ST2中,控制單元100係於保持面11之各位置301上之切割膠膜205依序形成切割痕400。切割痕形成步驟ST2中,如圖7所示,於保持面11所有位置301上之切割膠膜205形成切割痕400後,進入原點位置登錄步驟ST3。That is, the height of the axis 21-1 of the
原點位置登錄步驟ST3係以攝影機單元30檢測形成於XY座標所決定的各位置301之多個切割痕400之X軸方向的長度D(示於圖6),由切割痕400之X軸方向的長度D及切割刀片21之外徑R計算切割痕400之從切割膠膜205之上表面205-2起的切口深度H。原點位置登錄步驟ST3係如後述的步驟:由所計算之切口深度H與切割膠膜205之厚度205-1,對應XY座標推算各位置301的原點位置302,並記憶於原點位置登錄部101。The origin position registration step ST3 is to use the
原點位置登錄步驟ST3中,控制單元100係計算卡盤台10的保持面11之各位置301的原點位置302,使所計算之原點位置302與各位置301的XY座標相對應並生成前述資訊300,將所生成之資訊300登錄於原點位置登錄部101。原點位置登錄步驟ST3中,控制單元100係在計算各位置301的原點位置302時,以攝影機單元30拍攝形成於各位置301上之切割痕400,由所拍攝的影像計算各切割痕400之X軸方向的長度D並記憶。In the origin position registration step ST3, the
又,原點位置登錄步驟ST3中,因預先記憶有表示切割刀片21之外徑R及切割膠膜205之厚度205-1的資訊,故若以切割刀片21之外徑為R,則根據下述公式1,控制單元100會計算形成各位置301上之切割痕400時,切割刀片21之軸心21-1與切割膠膜205之上表面205-2的距離Z(示於圖6)。In addition, in the origin position registration step ST3, since the information indicating the outer diameter R of the
Z={(R/2)2
-(D/2)2
}1/2
…式1Z={(R/2) 2 -(D/2) 2 } 1/2 …
原點位置登錄步驟ST3中,控制單元100係根據下述公式2而計算各位置301上之切割痕400之切口深度H。In the origin position registration step ST3, the
H=(R/2)-Z…式2H=(R/2)-Z…
原點位置登錄步驟ST3中,控制單元100係根據表示所計算之距離Z、切口深度H、預先決定之形成切割痕400時的切割刀片21之軸心21-1之Z軸方向的高度及預先記憶之切割膠膜205之厚度205-1的資訊,而計算卡盤台10之保持面11之各位置301的原點位置302。實施方式1中,原點位置登錄步驟ST3中,控制單元100計算所計算之各位置301的原點位置302中位於最上方之原點位置302與位於最下方之原點位置302的差,並判定所計算之差是否為預先決定之容許值以下。原點位置登錄步驟ST3中,控制單元100若判定位於最上方之原點位置302與位於最下方之原點位置302的差超過預先決定之容許值,則以顯示單元等通知操作員卡盤台10的保持面11之精確度不適於被加工物200之切割加工。In the origin position registration step ST3, the
原點位置登錄步驟ST3中,控制單元100若判定位於最上方之原點位置302與位於最下方之原點位置302的差為預先決定容許值以下,則使各位置301之所計算的原點位置302與各位置301的XY座標相對應,生成圖8所示之資訊300,並將所生成之資訊300登錄於原點位置登錄部101。又,實施方式1中,圖8所示之資訊300中,將位置301-1的原點位置302-1設為零,並以從位置301-1的原點位置302-1起的Z軸方向的距離而決定各位置301的原點位置302。In the origin position registration step ST3, if the
實施方式1之切割裝置的原點位置登錄方法係於一般被加工物200之切割加工所使用的切割膠膜205以切割刀片21形成從Z軸方向切入之切割痕400,並從切割痕400之長度D、切割刀片21之外徑R及切割膠膜205之厚度205-1,推算保持面11之各位置301與切割刀片21之刀鋒前端接觸之Z軸方向的原點位置302。藉此,實施方式1之切割裝置的原點位置登錄方法係推算保持面11之多個位置301各別的原點位置302,並利用於計算實現高精確度切口深度之修正值。其結果,實施方式1之切割裝置的原點位置登錄方法發揮以下功效:即使卡盤台10的保持面11有高度偏差,也可實現對被加工物200的高精確度切口深度。The method for registering the origin position of the cutting device in the first embodiment is that the cutting
又,實施方式1之切割裝置的原點位置登錄方法,使切割單元20之切割刀片21實際切入保持面11之各位置301上之切割膠膜205,以推算原點位置302。藉此,推算出之原點位置302包含各移動單元40、50、60之滾動等機械性誤差。其結果,實施方式1之切割裝置的原點位置登錄方法,根據所登錄之資訊300使修正部102進行修正且同時切割加工被加工物200,藉此,能夠比各移動單元40、50、60之滾動等機械性誤差範圍更高精確度地加工被加工物200。In addition, in the method for registering the origin position of the cutting device in the first embodiment, the
實施方式1之切割裝置的原點位置登錄方法因是就近於被加工物200之加工步驟,並利用卡盤台10的保持面11程度面積中的厚度205-1之偏差為1μm以下之切割膠膜205,而登錄保持面11之各位置301的原點位置302,故亦有節省成本之功效。The origin position registration method of the cutting device of the first embodiment is a processing step close to the
此外,本發明並不受限於上述實施方式及變形例。亦即,可在不超出本發明中心思想之範圍內實施各種變形。本發明可使各切割單元20之切割刀片21切入各位置301上之切割膠膜205,在每個各切割單元20生成如圖3所示之資訊300,並登錄於原點位置登錄部101。此情形,所登錄之各資訊300的原點位置302包含使對應的切割單元20移動之移動單元50、60之滾動等機械性誤差,可高精確度地加工被加工物200。In addition, the present invention is not limited to the above-mentioned embodiment and modification examples. That is, various modifications can be implemented within the scope of the central idea of the present invention. In the present invention, the
1:切割裝置
10:卡盤台
11:保持面
20:切割單元
21:切割刀片
22:主軸
30:攝影機單元
40:X軸移動單元
50:Y軸移動單元
60:Z軸移動單元
101:原點位置登錄部
102:修正部
200:被加工物
205:切割膠膜(薄片)
205-1:厚度(預定厚度)
205-2:上表面(表面)
206:環狀框架
300:資訊
302,302-1,302-2,302-3,302-4,302-5,302-6,302-7:原點位置
400:切割痕
H:切口深度(深度)
D:長度
R:外徑
ST1:薄片保持步驟
ST2:切割痕形成步驟
ST3:原點位置登錄步驟1: Cutting device
10: Chuck table
11: Keep the face
20: Cutting unit
21: Cutting blade
22: Spindle
30: Camera unit
40: X axis moving unit
50: Y axis moving unit
60: Z axis moving unit
101: Origin Position Registration Department
102: Correction Department
200: processed objects
205: Cutting film (thin slice)
205-1: Thickness (predetermined thickness)
205-2: Upper surface (surface)
206: Ring Frame
300:
圖1係表示實施方式1之實施切割裝置的原點位置登錄方法之切割裝置的構成例之立體圖。 圖2係示意性地表示圖1所示切割裝置之Z軸方向位置檢測單元的構成之圖。 圖3係示意性地表示圖1所示切割裝置之控制單元的原點位置登錄部已登錄原點位置的資訊之圖。 圖4係表示實施方式1之切割裝置的原點位置登錄方法的流程之流程圖。 圖5係示意性地表示圖4所示之切割裝置的原點位置登錄方法之切割痕形成步驟的局部剖面側視圖。 圖6係示意性地表示圖4所示之切割裝置的原點位置登錄方法之切割痕形成步驟中之切割刀片與切割痕等之切割膠膜剖面圖。 圖7係圖4所示之切割裝置的原點位置登錄方法之切割痕形成步驟後的切割膠膜之俯視圖。 圖8係表示圖4所示之切割裝置的原點位置登錄方法的原點位置登錄步驟中所登錄的資訊一例之圖。FIG. 1 is a perspective view showing a configuration example of a cutting device for implementing the origin position registration method of the cutting device according to the first embodiment. Fig. 2 is a diagram schematically showing the configuration of the Z-axis direction position detection unit of the cutting device shown in Fig. 1. FIG. 3 is a diagram schematically showing the information that the origin position registration unit of the control unit of the cutting device shown in FIG. 1 has registered the origin position. 4 is a flowchart showing the flow of the origin position registration method of the cutting device of the first embodiment. FIG. 5 is a partial cross-sectional side view schematically showing the step of forming a cut mark in the origin position registration method of the cutting device shown in FIG. 4. 6 is a cross-sectional view schematically showing the cutting blade and the cutting film in the cutting mark formation step of the origin position registration method of the cutting device shown in FIG. 4. FIG. 7 is a top view of the cutting film after the cutting mark formation step of the origin position registration method of the cutting device shown in FIG. 4. 8 is a diagram showing an example of information registered in the origin position registration step of the origin position registration method of the cutting device shown in FIG. 4.
ST1:薄片保持步驟 ST1: flake retention step
ST2:切割痕形成步驟 ST2: Cutting mark formation step
ST3:原點位置登錄步驟 ST3: Origin position registration procedure
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