TW202022499A - Photosensitive resin composition, photoresist, color filter and display device - Google Patents
Photosensitive resin composition, photoresist, color filter and display device Download PDFInfo
- Publication number
- TW202022499A TW202022499A TW108142648A TW108142648A TW202022499A TW 202022499 A TW202022499 A TW 202022499A TW 108142648 A TW108142648 A TW 108142648A TW 108142648 A TW108142648 A TW 108142648A TW 202022499 A TW202022499 A TW 202022499A
- Authority
- TW
- Taiwan
- Prior art keywords
- substituted
- group
- unsubstituted
- same
- different
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
Description
本申請案主張於2018年11月23日提交至韓國智慧財產局的韓國專利申請案第10-2018-0146358號的申請日的優先權,其內容全部包含於本說明書。This application claims priority from the filing date of Korean Patent Application No. 10-2018-0146358, which was filed with the Korean Intellectual Property Office on November 23, 2018, and its contents are all included in this specification.
本說明書是有關於一種感光性樹脂組成物、光阻、彩色濾光片以及顯示裝置。This specification relates to a photosensitive resin composition, photoresist, color filter and display device.
目前,為了實現彩色濾光片,通常應用將顏料用作著色劑的顏料分散法。但是在顏料分散液的情況下,顏料以粒子狀態存在而不僅使光散射,而且因顏料的微細化而使顏料表面積急劇地增加,因藉此引起的分散穩定性的惡化而生成不均勻的顏料粒子。因此,為了達成最近要求的高亮度、高對比度及高解析度,最近研究了使用染料代替顏料作為著色劑。Currently, in order to realize a color filter, a pigment dispersion method in which a pigment is used as a colorant is generally applied. However, in the case of a pigment dispersion, the pigment exists in the state of particles, which not only scatters light, but also increases the surface area of the pigment drastically due to the miniaturization of the pigment, resulting in the deterioration of the dispersion stability caused by this, resulting in uneven pigment particle. Therefore, in order to achieve the recently required high brightness, high contrast, and high resolution, it has recently been studied to use dyes instead of pigments as colorants.
通常,染料與顏料相比具有透射度高的優點。但是與顏料相比具有耐熱性不足的缺點。另外,與現有顏料相比,對有機溶劑的溶解度佳,因而具有耐化學性不足的缺點。 [現有技術文獻] [專利文獻] [專利文獻1]日本公開文獻 特開平9-87534Generally, dyes have the advantage of higher transmittance than pigments. However, it has the disadvantage of insufficient heat resistance compared with pigments. In addition, compared with existing pigments, it has better solubility in organic solvents, and therefore has the disadvantage of insufficient chemical resistance. [Prior Art Literature] [Patent Literature] [Patent Document 1] Japanese Open Document JP 9-87534
[發明所欲解決之課題][Problems to be solved by the invention]
本說明書提供一種感光性樹脂組成物、光阻、彩色濾光片以及顯示裝置。 [解決課題之手段]This specification provides a photosensitive resin composition, photoresist, color filter, and display device. [Means to solve the problem]
本說明書的一實施形態提供一種感光性樹脂組成物,所述感光性樹脂組成物包含:二苯並哌喃染料;黏合劑樹脂,包含下述由化學式1表示的結構;多官能性單體;光起始劑;以及溶劑。An embodiment of this specification provides a photosensitive resin composition, the photosensitive resin composition comprising: dibenzopyran dye; a binder resin comprising the following structure represented by Chemical Formula 1; a multifunctional monomer; Photoinitiator; and solvent.
[化學式1] 在所述化學式1中,是指與其他取代基或鍵結部連接的部分, X'為O或NH, L1及L2彼此相同或不同,分別獨立地為直接鍵、經取代或未經取代的伸烷基、-C(=O)-、或-L'-O(C=O)-, L'為經取代或未經取代的伸烷基, T1至T3彼此相同或不同,分別獨立地為氫、羥基、或者經取代或未經取代的烷基, t2為0至4的整數,在t2為2以上的情況下,T2彼此相同或不同, t3為0至5的整數,在t3為2以上的情況下,T3彼此相同或不同。[Chemical Formula 1] In the chemical formula 1, It refers to the part connected to other substituents or bonding parts, X'is O or NH, L1 and L2 are the same or different from each other, and are each independently a direct bond, a substituted or unsubstituted alkylene group, -C( =O)-, or -L'-O(C=O)-, L'is a substituted or unsubstituted alkylene group, T1 to T3 are the same or different from each other, and are independently hydrogen, hydroxyl, or A substituted or unsubstituted alkyl group, t2 is an integer from 0 to 4, when t2 is 2 or more, T2 is the same or different from each other, t3 is an integer from 0 to 5, and when t3 is 2 or more, T3 Same or different from each other.
本說明書的一實施形態提供一種使用所述感光性樹脂組成物製造的光阻。One embodiment of this specification provides a photoresist manufactured using the photosensitive resin composition.
本說明書的一實施形態提供一種包含所述光阻的彩色濾光片。An embodiment of this specification provides a color filter including the photoresist.
本說明書的一實施形態提供一種包含所述彩色濾光片的顯示裝置。 [發明的效果]An embodiment of this specification provides a display device including the color filter. [Effect of invention]
根據本說明書的一實施形態的感光性樹脂組成物因包含含有由化學式2表示的結構的黏合劑樹脂,從而具有移染及溶出的耐化學特性優異的優點。Since the photosensitive resin composition according to an embodiment of the present specification includes a binder resin containing a structure represented by Chemical Formula 2, it has the advantage of excellent chemical resistance to migration and elution.
以下,針對本說明書更詳細地進行說明。Hereinafter, this specification will be described in more detail.
在本說明書中,在記載為某部件位於其他部件「上」時,該情況不僅包含某部件與其他部件相接的情況,而且亦包含兩部件之間存在又一部件的情況。In this specification, when a component is described as being "on" another component, the case includes not only the case where a certain component is connected to another component, but also the case where another component exists between the two components.
在本說明書中,在記載為某部分「包含」某構成要素時,只要無特別相反的記載,則該情況是指並不排除其他構成要素,可更包含其他構成要素。In this specification, when a certain part "includes" a certain component, as long as there is no description to the contrary in particular, this means that other components are not excluded, and other components may be included.
在本說明書中,是指與其他取代基或鍵結部鍵結的部位。In this manual, It refers to the site of bonding with other substituents or bonding parts.
在本說明書中,「衍生的單元」是指形成高分子的單元分子或重覆結構。In this specification, "derivatized unit" refers to a unit molecule or a repeating structure forming a polymer.
本說明書的一實施形態提供一種感光性樹脂組成物,所述感光性樹脂組成物包含:二苯並哌喃染料;黏合劑樹脂,包含下述由化學式1表示的結構;多官能性單體;光起始劑;以及溶劑。An embodiment of this specification provides a photosensitive resin composition, the photosensitive resin composition comprising: dibenzopyran dye; a binder resin comprising the following structure represented by Chemical Formula 1; a multifunctional monomer; Photoinitiator; and solvent.
[化學式1] 在所述化學式1中,是指與其他取代基或鍵結部連接的部分, X'為O或NH, L1及L2彼此相同或不同,分別獨立地為直接鍵、經取代或未經取代的伸烷基、-C(=O)-、或-L'-O(C=O)-, L'為經取代或未經取代的伸烷基, T1至T3彼此相同或不同,分別獨立地為氫、羥基、或者經取代或未經取代的烷基, t2為0至4的整數,在t2為2以上的情況下,T2彼此相同或不同, t3為0至5的整數,在t3為2以上的情況下,T3彼此相同或不同。[Chemical Formula 1] In the chemical formula 1, It refers to the part connected to other substituents or bonding parts, X'is O or NH, L1 and L2 are the same or different from each other, and are each independently a direct bond, a substituted or unsubstituted alkylene group, -C( =O)-, or -L'-O(C=O)-, L'is a substituted or unsubstituted alkylene group, T1 to T3 are the same or different from each other, and are independently hydrogen, hydroxyl, or A substituted or unsubstituted alkyl group, t2 is an integer from 0 to 4, when t2 is 2 or more, T2 is the same or different from each other, t3 is an integer from 0 to 5, and when t3 is 2 or more, T3 Same or different from each other.
本說明書的一實施形態的感光性樹脂組成物藉由包含由所述化學式1表示的結構的黏合劑樹脂,從而在進行曝光製程時由所述化學式1表示的結構促進自由基(Radical)反應,提高所述感光性樹脂組成物內的黏合劑樹脂、多官能性單體的聚合程度,可提高膜的固化度。隨著膜的固化度變高,使用本說明書的感光性樹脂組成物製造的彩色濾光片的耐熱性及耐化學性得到改善。The photosensitive resin composition of an embodiment of the present specification includes a binder resin having a structure represented by the chemical formula 1, so that the structure represented by the chemical formula 1 promotes a radical reaction during the exposure process. Increasing the degree of polymerization of the binder resin and the polyfunctional monomer in the photosensitive resin composition can increase the degree of curing of the film. As the degree of curing of the film becomes higher, the heat resistance and chemical resistance of the color filter manufactured using the photosensitive resin composition of this specification are improved.
本說明書的由化學式表示的結構、染料、或化合物的取代基的例示在下文中進行說明,但並不限定於此。Examples of the structure represented by the chemical formula, the dye, or the substituent of the compound in this specification are described below, but are not limited thereto.
在本說明書中,「經取代或未經取代」的用語是指被選自包含氘、鹵素基、腈基、硝基、-OH、羰基、酯基、-COOH、醯亞胺基、醯胺基、陰離子基團、烷氧基、烷基、環烷基、烯基、環烯基、芳烷基、膦基、磺酸鹽基、胺基、芳基、雜芳基、矽基、硼基、(甲基)丙烯醯基、(甲基)丙烯酸酯基、醚基、包含N、O、S或P原子中的一個以上的雜環基及陰離子基團的群組中的一個以上的取代基取代、或者不具有任何取代基。In this specification, the term "substituted or unsubstituted" means that it is selected from deuterium, halogen group, nitrile group, nitro group, -OH, carbonyl group, ester group, -COOH, amide group, amide Groups, anionic groups, alkoxy groups, alkyl groups, cycloalkyl groups, alkenyl groups, cycloalkenyl groups, aralkyl groups, phosphine groups, sulfonate groups, amine groups, aryl groups, heteroaryl groups, silyl groups, boron Group, (meth)acryloyl group, (meth)acrylate group, ether group, more than one heterocyclic group containing one or more of N, O, S, or P atoms and an anionic group The substituent is substituted or does not have any substituent.
在本說明書中,作為鹵素基的例子,有氟、氯、溴或碘。In this specification, as examples of the halogen group, there are fluorine, chlorine, bromine or iodine.
在本說明書中,所述烷基可為直鏈或分支鏈,碳數並不特別限定,但所述烷基的碳數可為1至30。根據又一實施形態,所述烷基的碳數為1至20。根據又一實施形態,所述烷基的碳數為1至10。作為烷基的具體例子,有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、正己基、正庚基、及正辛基等,但並不限定於此。In this specification, the alkyl group may be linear or branched, and the carbon number is not particularly limited, but the carbon number of the alkyl group may be 1-30. According to another embodiment, the carbon number of the alkyl group is 1-20. According to another embodiment, the carbon number of the alkyl group is 1-10. As specific examples of alkyl groups, there are methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tertiary butyl, n-pentyl, n-hexyl, n-heptyl, and n-octyl. Etc., but not limited to this.
在本說明書中,環烷基並不特別限定,但較佳為碳數為3至30,且特別是較佳為環戊基、環己基,但並不限定於此。In this specification, the cycloalkyl group is not particularly limited, but preferably has a carbon number of 3 to 30, and particularly preferably cyclopentyl and cyclohexyl, but it is not limited thereto.
在本說明書中,伸烷基是指在烷烴(alkane)中有兩個鍵結位置的基。所述伸烷基可為直鏈、分支鏈或環狀鏈。伸烷基的碳數並不特別限定,但例如碳數可為1至30。另外,碳數可為1至20,且碳數可為1至10。In this specification, an alkylene group refers to a group having two bonding positions in an alkane. The alkylene group may be linear, branched or cyclic. The carbon number of the alkylene is not particularly limited, but the carbon number can be 1-30, for example. In addition, the carbon number may be 1-20, and the carbon number may be 1-10.
在本說明書中,所述伸烷基可為烷二基(alkanediyl),所述烷二基可應用所述伸烷基的說明。In this specification, the alkylene group may be an alkanediyl group, and the description of the alkylene group may be applied to the alkanediyl group.
在本說明書中,環烷基並無特別限定,但根據一實施形態,所述環烷基的碳數為3至30。根據又一實施形態,所述環烷基的碳數為3至20。根據又一實施形態,所述環烷基的碳數為3至6。具體而言,有環丙基、環丁基、環戊基、環己基、環庚基、環辛基等,但並不限定於此。In the present specification, the cycloalkyl group is not particularly limited, but according to one embodiment, the carbon number of the cycloalkyl group is 3-30. According to another embodiment, the carbon number of the cycloalkyl group is 3-20. According to another embodiment, the carbon number of the cycloalkyl group is 3-6. Specifically, there are cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, etc., but it is not limited thereto.
在本說明書中,芳基並不特別限定,但較佳為碳數為6至60,且可為單環式芳基或多環式芳基。根據一實施形態,所述芳基的碳數為6至30。根據一實施形態,所述芳基的碳數為6至20。作為單環式芳基,所述芳基可為苯基、聯苯基、聯三苯基等,但不限定於此。作為所述多環式芳基,可為萘基、蒽基、茚基、菲基、芘基、苝基、三苯基、䓛基、芴基等,但不限定於此。In this specification, the aryl group is not particularly limited, but preferably has a carbon number of 6 to 60, and may be a monocyclic aryl group or a polycyclic aryl group. According to one embodiment, the carbon number of the aryl group is 6-30. According to an embodiment, the carbon number of the aryl group is 6-20. As a monocyclic aryl group, the aryl group may be a phenyl group, a biphenyl group, a triphenyl group, etc., but is not limited thereto. The polycyclic aryl group may be naphthyl, anthracenyl, indenyl, phenanthryl, pyrenyl, perylene, triphenyl, eryl, fluorenyl, etc., but is not limited thereto.
在本說明書中,所述雜環基是包含O、N或S作為異種原子的雜環基,可為芳香族或脂肪族。所述雜環基的碳數並不特別限定,但碳數為2至30,具體而言碳數為2至20。作為雜環基的例子,有噻吩基、呋喃基、吡咯基、咪唑基、噻唑基、噁唑基、噁二唑基、三唑基、吡啶基、聯吡啶基、三嗪基、吖啶基(acridyl)、噠嗪基、喹啉基、異喹啉基、吲哚基、咔唑基、苯並噁唑基、苯並咪唑基、苯並噻唑基、苯並咔唑基、苯並噻吩基、二苯並噻吩基、苯並呋喃基及二苯並呋喃基等,但並不僅限定於此。In this specification, the heterocyclic group is a heterocyclic group containing O, N, or S as a heteroatom, and may be aromatic or aliphatic. The carbon number of the heterocyclic group is not particularly limited, but the carbon number is 2-30, specifically, the carbon number is 2-20. Examples of heterocyclic groups include thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, oxazolyl, oxadiazolyl, triazolyl, pyridyl, bipyridyl, triazinyl, acridinyl (Acridyl), pyridazinyl, quinolinyl, isoquinolinyl, indolyl, carbazolyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, benzocarbazolyl, benzothiophene Group, dibenzothienyl, benzofuranyl, dibenzofuranyl, etc., but not limited to these.
在本說明書中,除雜芳基為芳香族以外,可應用有關於所述的雜環基的說明。In this specification, the explanation about the heterocyclic group can be applied except that the heteroaryl group is aromatic.
在本說明書中,所述烷氧基可為直鏈或分支鏈,碳數並不特別限定,但可為1至30,具體而言可為1至20,更具體而言可為1至10。In the present specification, the alkoxy group may be linear or branched, and the carbon number is not particularly limited, but it may be 1 to 30, specifically 1 to 20, and more specifically 1 to 10. .
在本說明書中,陰離子基團與化學式1的結構具有化學鍵,且所述化學鍵可指離子鍵。所述陰離子基團並不特別限定,例如,可應用在美國專利第7,939,644號、日本特開第2006-003080號、日本特開第2006-001917號、日本特開第2005-159926號、日本特開第2007-7028897號、日本特開第2005-071680號、韓國申請公開第2007-7000693號、日本特開第2005-111696號、日本特開第2008-249663號、及日本特開第2014-199436中所記載的陰離子。In this specification, the anionic group has a chemical bond with the structure of Chemical Formula 1, and the chemical bond may refer to an ionic bond. The anionic group is not particularly limited. For example, it can be applied to U.S. Patent No. 7,939,644, Japanese Patent Application Publication No. 2006-003080, Japanese Patent Application Publication No. 2006-001917, Japanese Patent Application Publication No. 2005-159926, and Japanese Patent Application Publication No. 2006-003080. Japanese Patent Application Publication No. 2007-7028897, Japanese Patent Application Publication No. 2005-071680, Korean Application Publication No. 2007-7000693, Japanese Patent Application Publication No. 2005-111696, Japanese Patent Application Publication No. 2008-249663, and Japanese Patent Application Publication No. 2014- The anion described in 199436.
作為所述陰離子基團的具體例子,有三氟甲烷磺酸根陰離子、雙(三氟甲基磺醯基)醯胺陰離子、雙三氟甲烷磺醯亞胺陰離子、雙全氟乙基磺醯亞胺陰離子、四苯基硼酸根陰離子、四(4-氟苯基)硼酸鹽、四(五氟苯基)硼酸鹽、三三氟甲烷磺醯基甲基化物、SO3 - 、CO2 - 、SO2 N- SO2 CF3 、SO2 N- SO2 CF2 CF3 、鹵素基例如氟基、碘基、氯基等,但並不僅限定於此。As specific examples of the anionic group, there are trifluoromethanesulfonate anion, bis(trifluoromethylsulfonyl)amide anion, bistrifluoromethanesulfonamide anion, and bisperfluoroethylsulfonylimide anion. , tetraphenyl borate anion, tetrakis (4-fluorophenyl) borate, tetrakis (pentafluorophenyl) borate, tris trifluoromethane sulfonic methide acyl, SO 3 -, CO 2 - , SO 2 N - SO 2 CF 3 , SO 2 N - SO 2 CF 2 CF 3 , and halogen groups such as fluoro, iodo, and chloro groups, but not limited to these.
在本說明書中,陰離子基團其自身可具有陰離子,或者可與其他陽離子一併以錯合化合物形態存在。因此,根據經取代的陰離子基團的個數,本發明的化合物的分子整體的電荷之和可不同。在本發明的化合物的一個胺基中具有陽離子,因此,分子整體的電荷之和可具有從自經取代的陰離子基團的個數減去1所得的值的陰離子至0的值。In this specification, the anionic group itself may have an anion, or may exist in the form of a complex compound together with other cations. Therefore, depending on the number of substituted anionic groups, the sum of charges of the entire molecule of the compound of the present invention may be different. The compound of the present invention has a cation in one amine group, and therefore, the sum of the charges of the entire molecule can have an anion value obtained by subtracting 1 from the number of substituted anionic groups to 0.
在本說明書中,「(甲基)丙烯酸」表示選自由丙烯酸及甲基丙烯酸所組成的群組中的至少一種。「(甲基)丙烯酸」的表述亦具有相同的含義。In this specification, "(meth)acrylic acid" means at least one selected from the group consisting of acrylic acid and methacrylic acid. The expression "(meth)acrylic acid" also has the same meaning.
在本說明書的一實施形態中,包含由所述化學式1表示的結構的黏合劑樹脂更包含衍生自具有碳數為2至4的環狀醚結構的不飽和化合物的單元。In one embodiment of the present specification, the binder resin including the structure represented by the chemical formula 1 further includes a unit derived from an unsaturated compound having a cyclic ether structure having a carbon number of 2 to 4.
所述具有碳數為2至4的環狀醚結構的不飽和化合物可為下述結構中的任一者,但並不限定於此。 The unsaturated compound having a cyclic ether structure having a carbon number of 2 to 4 may be any of the following structures, but is not limited to this.
在所述結構中,R為氫、或碳數為1至4的經取代或未經取代的烷基, X3及X4彼此相同或不同,分別為直接鍵、-Rz-、-Rz-O-、-Rz-S-、或-Rz-NH-,所述Rz為碳數為1至6的經取代或未經取代的烷二基(alkanediyl group)。In the structure, R is hydrogen, or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X3 and X4 are the same or different from each other, and are respectively a direct bond, -Rz-, -Rz-O-, -Rz-S-, or -Rz-NH-, and the Rz is a substituted or a carbon number of 1 to 6 Unsubstituted alkanediyl group (alkanediyl group).
在本說明書的一實施形態中,所述R可為碳數為1至4的由-OH取代的烷基。In an embodiment of the present specification, the R may be an alkyl group having 1 to 4 carbon atoms substituted by -OH.
在本說明書的一實施形態中,所述感光性樹脂組成物可更包含如下的黏合劑樹脂:所述黏合劑樹脂包含衍生自具有碳數為2至4的環狀醚結構的不飽和化合物的單元。In one embodiment of this specification, the photosensitive resin composition may further include a binder resin: the binder resin includes an unsaturated compound derived from a cyclic ether structure having a carbon number of 2 to 4 unit.
所述具有碳數為2至4的環狀醚結構的不飽和化合物可應用所述的說明。For the unsaturated compound having a cyclic ether structure having a carbon number of 2 to 4, the above description can be applied.
在本說明書的一實施形態中,除包含由所述化學式1表示的結構的黏合劑樹脂以外,所述感光性樹脂組成物可更包含相應技術領域內通常使用的黏合劑樹脂。In one embodiment of this specification, in addition to the binder resin including the structure represented by the chemical formula 1, the photosensitive resin composition may further include a binder resin commonly used in the corresponding technical field.
在本說明書的一實施形態中,所述二苯並哌喃染料由下述化學式2表示。 [化學式2] 在所述化學式2中, R1至R6彼此相同或不同,分別獨立地選自由氫、氘、鹵素基、硝基、經取代或未經取代的烷基、經取代或未經取代的烷氧基、經取代或未經取代的芳基、及經取代或未經取代的雜芳基所組成的群組, R7至R11彼此相同或不同,分別獨立地選自由氫、氘、-OH、-SO3 - 、-SO3 H、-SO3 - Z+ 、-COO- 、-COOH、-COO- Z+ 、-COORa、-SO3 Rb、-SO2 NRcRd、-CONRe、經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的雜芳基所組成的群組, Z+ 表示+ N(Rf)4 、Na+ 、或K+ , Ra至Re彼此相同或不同,分別獨立地選自由氫、經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的雜芳基所組成的群組, Rc與Rd能夠彼此鍵結而形成包含氮原子的雜環, Rf能夠相同或不同, 所述R7至R11中的至少一者為-SO3 - 、-SO3 H、-SO3 - Z+ 、-COO- 、-COO- Z+ 、-COORa、-SO3 Rb、或-SO2 NRcRd, R12至R15彼此相同或不同,分別獨立地選自由氫、氘、經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的雜芳基所組成的群組, Q1及Q2彼此相同或不同,分別獨立地為直接鍵、或者經取代或未經取代的伸烷基, Rx為陰離子基團或銨結構, a為0或1。In one embodiment of the present specification, the dibenzopiperan dye is represented by the following chemical formula 2. [Chemical Formula 2] In the chemical formula 2, R1 to R6 are the same or different from each other, and are each independently selected from hydrogen, deuterium, halogen, nitro, substituted or unsubstituted alkyl, and substituted or unsubstituted alkoxy. , Substituted or unsubstituted aryl groups, and substituted or unsubstituted heteroaryl groups, R7 to R11 are the same or different from each other, and are independently selected from hydrogen, deuterium, -OH, -SO 3 -, -SO 3 H, -SO 3 - Z +, -COO -, -COOH, -COO - Z +, -COORa, -SO 3 Rb, -SO 2 NRcRd, -CONRe, a substituted or unsubstituted The group consisting of the alkyl group, substituted or unsubstituted aryl group, and substituted or unsubstituted heteroaryl group, Z + represents + N(Rf) 4 , Na + , or K + , Ra to Res are the same or different from each other, and are independently selected from the group consisting of hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, Rc and Rd can be bonded to each other to form a heterocyclic ring containing a nitrogen atom, an Rf can be the same or different, R7 to R11 in the at least one of -SO 3 -, -SO 3 H, -SO 3 - Z +, -COO -, -COO - Z +, -COORa, -SO 3 Rb, or -SO 2 NRcRd, R12 to R15 are the same or different, each independently selected from the group consisting of hydrogen, deuterium, substituted or unsubstituted alkyl group , Substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, Q1 and Q2 are the same or different from each other, and are each independently a direct bond, or substituted or unsubstituted Rx is an anionic group or ammonium structure, and a is 0 or 1.
在本說明書的一實施形態中,R1至R6彼此相同或不同,分別獨立地選自由氫、氘、鹵素基、硝基、碳數為1至30的經取代或未經取代的烷基、碳數為1至30的經取代或未經取代的烷氧基、碳數為6至30的經取代或未經取代的芳基、及碳數為2至30的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R1至R6彼此相同或不同,分別獨立地選自由氫、氘、鹵素基、硝基、碳數為1至20的經取代或未經取代的烷基、碳數為1至20的經取代或未經取代的烷氧基、碳數為6至20的經取代或未經取代的芳基、及碳數為2至20的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R1至R6彼此相同或不同,分別獨立地選自由氫、氘、鹵素基、硝基、碳數為1至20的經取代或未經取代的烷基、碳數為1至20的經取代或未經取代的烷氧基、碳數為6至20的經取代或未經取代的芳基、及碳數為2至20的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R1至R6為氫、或者經取代或未經取代的甲基。 在本說明書的一實施形態中,R1至R6為氫、或甲基。In one embodiment of this specification, R1 to R6 are the same or different from each other, and are each independently selected from hydrogen, deuterium, halogen, nitro, substituted or unsubstituted alkyl having 1 to 30 carbons, and carbon A substituted or unsubstituted alkoxy group having a number of 1 to 30, a substituted or unsubstituted aryl group having a carbon number of 6 to 30, and a substituted or unsubstituted heterocyclic group having a carbon number of 2 to 30 A group of aryl groups. In an embodiment of the present specification, R1 to R6 are the same or different from each other, and are independently selected from hydrogen, deuterium, halogen, nitro, substituted or unsubstituted alkyl with 1 to 20 carbons, carbon A substituted or unsubstituted alkoxy group having a number of 1 to 20, a substituted or unsubstituted aryl group having a carbon number of 6 to 20, and a substituted or unsubstituted heterocyclic group having a carbon number of 2 to 20 A group of aryl groups. In an embodiment of the present specification, R1 to R6 are the same or different from each other, and are independently selected from hydrogen, deuterium, halogen, nitro, substituted or unsubstituted alkyl with 1 to 20 carbons, carbon A substituted or unsubstituted alkoxy group having a number of 1 to 20, a substituted or unsubstituted aryl group having a carbon number of 6 to 20, and a substituted or unsubstituted heterocyclic group having a carbon number of 2 to 20 A group of aryl groups. In one embodiment of this specification, R1 to R6 are hydrogen, or substituted or unsubstituted methyl. In one embodiment of this specification, R1 to R6 are hydrogen or methyl.
在本說明書的一實施形態中,R7至R11彼此相同或不同,分別獨立地選自由氫、氘、-OH、-SO3 - 、-SO3 H、-SO3 - Z+ 、-COO- 、-COOH、-COO- Z+ 、-COORa、-SO3 Rb、-SO2 NRcRd、-CONRe、碳數為1至30的經取代或未經取代的烷基、碳數為6至30的經取代或未經取代的芳基、及碳數為2至30的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R7至R11彼此相同或不同,分別獨立地選自由氫、氘、-OH、-SO3 - 、-SO3 H、-SO3 - Z+ 、-COO- 、-COOH、-COO- Z+ 、-COORa、-SO3 Rb、-SO2 NRcRd、-CONRe、碳數為1至20的經取代或未經取代的烷基、碳數為6至20的經取代或未經取代的芳基、及碳數為2至20的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R7至R11彼此相同或不同,分別獨立地選自由氫、-SO3 - 、-SO3 H、-SO3 - Z+ 、-COO- 、-COO- Z+ 、-COORa、-SO3 Rb、及-SO2 NRcRd所組成的群組。 在本說明書的一實施形態中,R7至R11彼此相同或不同,分別獨立地選自由氫、-SO3 - 、-SO3 H、-COO- 、-COO- Z+ 、及-COORa所組成的群組。In an embodiment of the present specification, R7 to R11 are the same or different and each independently selected from the group consisting of hydrogen, deuterium, -OH, -SO 3 -, -SO 3 H, -SO 3 - Z +, -COO -, -COOH, -COO - Z + , -COORa, -SO 3 Rb, -SO 2 NRcRd, -CONRe, substituted or unsubstituted alkyl with 1 to 30 carbons, and 6 to 30 carbons A group consisting of substituted or unsubstituted aryl groups and substituted or unsubstituted heteroaryl groups having 2 to 30 carbon atoms. In an embodiment of the present specification, R7 to R11 are the same or different and each independently selected from the group consisting of hydrogen, deuterium, -OH, -SO 3 -, -SO 3 H, -SO 3 - Z +, -COO -, -COOH, -COO - Z + , -COORa, -SO 3 Rb, -SO 2 NRcRd, -CONRe, substituted or unsubstituted alkyl with 1 to 20 carbons, and 6 to 20 carbons A group consisting of substituted or unsubstituted aryl groups and substituted or unsubstituted heteroaryl groups having 2 to 20 carbon atoms. In an embodiment of the present specification, R7 to R11 are the same or different, each independently selected from the group consisting of hydrogen, -SO 3 -, -SO 3 H , -SO 3 - Z +, -COO -, -COO - Z + , -COORa, -SO 3 Rb, and -SO 2 NRcRd. In an embodiment of the present specification, R7 to R11 are the same or different, each independently selected from the group consisting of hydrogen, -SO 3 - consisting of Z +, and the -COORa -, -SO 3 H, -COO - , -COO Group.
在本說明書的一實施形態中,Z+ 為+ N(Rf)4 、Na+ 、或K+ 。 在本說明書的一實施形態中,Z+ 為Na+ 。In one embodiment of this specification, Z + is + N(Rf) 4 , Na + , or K + . In one embodiment of this specification, Z + is Na + .
在本說明書的一實施形態中,Ra至Re彼此相同或不同,分別獨立地選自由氫、碳數為1至30的經取代或未經取代的烷基、碳數為6至30的經取代或未經取代的芳基、及碳數為2至30的經取代或未經取代的雜芳基所組成的群組,Rc與Rd可彼此鍵結而形成包含氮原子的雜環,Rf可相同或不同。 在本說明書的一實施形態中,Ra至Re彼此相同或不同,分別獨立地選自由氫、碳數為1至20的經取代或未經取代的烷基、碳數為6至20的經取代或未經取代的芳基、及碳數為2至20的經取代或未經取代的雜芳基所組成的群組,Rc與Rd可彼此鍵結而形成包含氮原子的雜環,Rf可相同或不同。 在本說明書的一實施形態中,Ra至Re彼此相同或不同,分別獨立地選自由氫、碳數為1至10的經取代或未經取代的烷基、碳數為6至20的經取代或未經取代的芳基、及碳數為2至20的經取代或未經取代的雜芳基所組成的群組,Rc與Rd可彼此鍵結而形成包含氮原子的雜環,Rf可相同或不同。 在本說明書的一實施形態中,Ra為經取代或未經取代的甲基。 在本說明書的一實施形態中,Ra為甲基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為1至20的經取代或未經取代的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為3至20的經取代或未經取代的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為3至20的直鏈或分支鏈的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為3至20的分支鏈的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為1至10的經取代或未經取代的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為1至10的直鏈或分支鏈的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或碳數為1至10的分支鏈的烷基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或者經取代或未經取代的2-乙基己基。 在本說明書的一實施形態中,Rc及Rd彼此相同或不同,分別獨立地為氫、或2-乙基己基。In one embodiment of the present specification, Ra to Re are the same or different from each other, and are independently selected from hydrogen, substituted or unsubstituted alkyl having 1 to 30 carbons, and substituted 6 to 30 carbons. Or an unsubstituted aryl group and a substituted or unsubstituted heteroaryl group with a carbon number of 2 to 30. Rc and Rd can bond with each other to form a heterocyclic ring containing a nitrogen atom, and Rf can Same or different. In an embodiment of the present specification, Ra to Re are the same or different from each other, and are independently selected from hydrogen, substituted or unsubstituted alkyl having 1 to 20 carbons, and substituted 6 to 20 carbons. Or an unsubstituted aryl group and a substituted or unsubstituted heteroaryl group with a carbon number of 2 to 20. Rc and Rd can bond with each other to form a heterocyclic ring containing a nitrogen atom, and Rf can Same or different. In one embodiment of the present specification, Ra to Re are the same or different from each other, and are independently selected from hydrogen, substituted or unsubstituted alkyl having 1 to 10 carbons, and substituted 6 to 20 carbons. Or an unsubstituted aryl group and a substituted or unsubstituted heteroaryl group with a carbon number of 2 to 20. Rc and Rd can bond with each other to form a heterocyclic ring containing a nitrogen atom, and Rf can Same or different. In one embodiment of this specification, Ra is a substituted or unsubstituted methyl group. In one embodiment of this specification, Ra is a methyl group. In one embodiment of the present specification, Rc and Rd are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms. In an embodiment of the present specification, Rc and Rd are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group having 3 to 20 carbon atoms. In one embodiment of this specification, Rc and Rd are the same or different from each other, and each independently is hydrogen or a linear or branched alkyl group having 3 to 20 carbon atoms. In one embodiment of this specification, Rc and Rd are the same or different from each other, and are each independently hydrogen or a branched alkyl group having 3 to 20 carbon atoms. In one embodiment of the present specification, Rc and Rd are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms. In an embodiment of the present specification, Rc and Rd are the same or different from each other, and are each independently hydrogen or a linear or branched alkyl group having 1 to 10 carbon atoms. In an embodiment of the present specification, Rc and Rd are the same or different from each other, and are each independently hydrogen or a branched alkyl group having 1 to 10 carbon atoms. In one embodiment of this specification, Rc and Rd are the same or different from each other, and are each independently hydrogen, or substituted or unsubstituted 2-ethylhexyl. In one embodiment of this specification, Rc and Rd are the same or different from each other, and each independently is hydrogen or 2-ethylhexyl.
在本說明書的一實施形態中,-SO2 NRcRd可由-SO2 NY表示,所述Y可應用所述Rc及Rd的定義。In one embodiment of this specification, -SO 2 NRcRd can be represented by -SO 2 NY, and the definitions of Rc and Rd can be applied to the Y.
在本說明書的一實施形態中,R12至R15彼此相同或不同,分別獨立地選自由氫、氘、碳數為1至30的經取代或未經取代的烷基、碳數為6至30的經取代或未經取代的芳基、及碳數為2至30的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R12至R15彼此相同或不同,分別獨立地選自由氫、氘、碳數為1至20的經取代或未經取代的烷基、碳數為6至20的經取代或未經取代的芳基、及碳數為2至20的經取代或未經取代的雜芳基所組成的群組。 在本說明書的一實施形態中,R12至R15彼此相同或不同,分別獨立地選自由氫、碳數為1至10的經取代或未經取代的烷基、及碳數為6至12的經取代或未經取代的芳基所組成的群組。 在本說明書的一實施形態中,R12及R14彼此相同或不同,分別獨立地為氫、經取代或未經取代的乙基、或者經取代或未經取代的丙基。 在本說明書的一實施形態中,R12及R14彼此相同或不同,分別獨立地為氫、乙基、正丙基、或異丙基。 在本說明書的一實施形態中,R13及R15彼此相同或不同,分別獨立地為經取代或未經取代的乙基、或者經取代或未經取代的苯基。 在本說明書的一實施形態中,R13及R15彼此相同或不同,分別獨立地為乙基、或為經選自由甲基、-SO2 NHY、-SO3 - 及-SO3 H所組成的群組中的一種以上的取代基取代的苯基,Y與所述的內容相同。In one embodiment of the present specification, R12 to R15 are the same or different from each other, and are independently selected from hydrogen, deuterium, substituted or unsubstituted alkyl groups having 1 to 30 carbon atoms, and those having 6 to 30 carbon atoms. A group consisting of substituted or unsubstituted aryl groups and substituted or unsubstituted heteroaryl groups having 2 to 30 carbon atoms. In an embodiment of the present specification, R12 to R15 are the same or different from each other, and are independently selected from hydrogen, deuterium, substituted or unsubstituted alkyl having 1 to 20 carbons, and 6 to 20 carbons. A group consisting of substituted or unsubstituted aryl groups and substituted or unsubstituted heteroaryl groups having 2 to 20 carbon atoms. In one embodiment of the present specification, R12 to R15 are the same or different from each other, and are independently selected from hydrogen, substituted or unsubstituted alkyl having 1 to 10 carbons, and alkyl having 6 to 12 carbons. A group of substituted or unsubstituted aryl groups. In an embodiment of the present specification, R12 and R14 are the same or different from each other, and are each independently hydrogen, substituted or unsubstituted ethyl, or substituted or unsubstituted propyl. In one embodiment of this specification, R12 and R14 are the same or different from each other, and are each independently hydrogen, ethyl, n-propyl, or isopropyl. In one embodiment of the present specification, R13 and R15 are the same or different from each other, and are each independently a substituted or unsubstituted ethyl group, or a substituted or unsubstituted phenyl group. In one embodiment of this specification, R13 and R15 are the same or different from each other, and are each independently an ethyl group, or are selected from the group consisting of methyl, -SO 2 NHY, -SO 3 - and -SO 3 H For the phenyl group substituted by more than one substituent in the group, Y is the same as described above.
在本說明書的一實施形態中,Q1及Q2彼此相同或不同,分別獨立地為直接鍵、或者碳數為1至30的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,Q1及Q2彼此相同或不同,分別獨立地為直接鍵、或者碳數為1至20的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,Q1及Q2彼此相同或不同,分別獨立地為直接鍵、或者碳數為1至10的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,Q1及Q2彼此相同或不同,分別獨立地為直接鍵、經取代或未經取代的亞甲基、經取代或未經取代的伸乙基、或者經取代或未經取代的伸丙基。 在本說明書的一實施形態中,Q1及Q2彼此相同或不同,分別獨立地為直接鍵、亞甲基、伸乙基、或伸丙基。In one embodiment of the present specification, Q1 and Q2 are the same or different from each other, and are each independently a direct bond or a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms. In an embodiment of the present specification, Q1 and Q2 are the same or different from each other, and are each independently a direct bond or a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms. In an embodiment of the present specification, Q1 and Q2 are the same or different from each other, and are each independently a direct bond or a substituted or unsubstituted alkylene group having 1 to 10 carbon atoms. In one embodiment of this specification, Q1 and Q2 are the same or different from each other, and are each independently a direct bond, a substituted or unsubstituted methylene group, a substituted or unsubstituted ethylene group, or a substituted or Unsubstituted propylene. In one embodiment of this specification, Q1 and Q2 are the same or different from each other, and are each independently a direct bond, a methylene group, an ethylene group, or a propylene group.
在本說明書的一實施形態中,Rx為陰離子基團或銨結構。 在本說明書的一實施形態中,Rx為陰離子基團,所述陰離子基團為氯基(Cl- )。In one embodiment of this specification, Rx is an anionic group or an ammonium structure. In an embodiment of this specification, Rx is an anionic group, and the anionic group is a chlorine group (Cl − ).
在本說明書的一實施形態中,Rx為銨結構,所述銨結構可由下述化學式A表示。In one embodiment of this specification, Rx is an ammonium structure, and the ammonium structure can be represented by the following chemical formula A.
[化學式A] 在所述化學式A中, A1至A4彼此相同或不同,分別獨立地為氫、或者經取代或未經取代的烷基。 在本說明書的一實施形態中,A1至A4彼此相同或不同,分別獨立地為氫、或碳數為1至30的經取代或未經取代的烷基。 在本說明書的一實施形態中,A1至A4彼此相同或不同,分別獨立地為氫、或碳數為1至20的經取代或未經取代的烷基。 在本說明書的一實施形態中,A1至A4彼此相同或不同,分別獨立地為氫、或碳數為1至12的經取代或未經取代的烷基。[Chemical formula A] In the chemical formula A, A1 to A4 are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group. In an embodiment of the present specification, A1 to A4 are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms. In one embodiment of this specification, A1 to A4 are the same or different from each other, and are each independently hydrogen, or a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms. In an embodiment of the present specification, A1 to A4 are the same or different from each other, and are each independently hydrogen or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms.
在本說明書的一實施形態中,a為0或1。 在本說明書的一實施形態中,a為0。 在本說明書的一實施形態中,a為1。In one embodiment of this specification, a is 0 or 1. In one embodiment of this specification, a is 0. In one embodiment of this specification, a is 1.
在本說明書的一實施形態中,所述化學式2可為下述結構中的任一者。 In an embodiment of this specification, the chemical formula 2 may be any of the following structures.
在所述結構中,Y為碳數為3至20的分支鏈的烷基。具體而言,所述Y為2-乙基己基。In the structure, Y is a branched alkyl group having 3 to 20 carbon atoms. Specifically, the Y is 2-ethylhexyl.
所述結構中,由表示的含義是指在的苯基所包含的碳中,在除由甲基取代的部分以外的碳中的任一者可經-SO2 NHY取代。In the structure, by The meaning refers to Among the carbons contained in the phenyl group, any one of the carbons other than the part substituted by the methyl group may be substituted by -SO 2 NHY.
所述結構中,由表示的含義是指在的苯基所包含的碳中,在除由甲基取代的部分以外的碳中的任一者可經-SO3 - 取代。In the structure, by The meaning refers to Among the carbons contained in the phenyl group, any one of the carbons other than the part substituted with a methyl group may be substituted with -SO 3 - .
在本說明書的一實施形態中,X'為O。 在本說明書的一實施形態中,X'為NH。In one embodiment of this specification, X'is O. In one embodiment of this specification, X'is NH.
在本說明書的一實施形態中,L1為直接鍵、經取代或未經取代的伸烷基、或-C(=O)-。 在本說明書的一實施形態中,L1為直接鍵、碳數為1至30的經取代或未經取代的伸烷基、或-C(=O)-。 在本說明書的一實施形態中,L1為直接鍵、碳數為1至20的經取代或未經取代的伸烷基、或-C(=O)-。 在本說明書的一實施形態中,L1為直接鍵、碳數為1至10的經取代或未經取代的伸烷基、或-C(=O)-。 在本說明書的一實施形態中,L1為直接鍵。 在本說明書的一實施形態中,L1為經取代或未經取代的亞甲基、經取代或未經取代的伸乙基、或者經取代或未經取代的伸丙基。 在本說明書的一實施形態中,L1為亞甲基、伸乙基、或伸丙基。 在本說明書的一實施形態中,L1為-C(=O)-。In one embodiment of this specification, L1 is a direct bond, a substituted or unsubstituted alkylene group, or -C(=O)-. In one embodiment of this specification, L1 is a direct bond, a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms, or -C(=O)-. In one embodiment of the present specification, L1 is a direct bond, a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms, or -C(=O)-. In one embodiment of this specification, L1 is a direct bond, a substituted or unsubstituted alkylene group having 1 to 10 carbon atoms, or -C(=O)-. In one embodiment of this specification, L1 is a direct bond. In one embodiment of this specification, L1 is substituted or unsubstituted methylene, substituted or unsubstituted ethylene, or substituted or unsubstituted ethylene. In one embodiment of the present specification, L1 is methylene, ethylene, or ethylene. In one embodiment of this specification, L1 is -C(=O)-.
在本說明書的一實施形態中,L2為直接鍵、-C(=O)-、或-L'-O(C=O)-。 在本說明書的一實施形態中,L2為直接鍵。 在本說明書的一實施形態中,L2為-C(=O)-。 在本說明書的一實施形態中,L2為-L'-O(C=O)-。In one embodiment of this specification, L2 is a direct bond, -C(=O)-, or -L'-O(C=O)-. In one embodiment of this specification, L2 is a direct bond. In one embodiment of this specification, L2 is -C(=O)-. In one embodiment of this specification, L2 is -L'-O(C=O)-.
在本說明書的一實施形態中,L'為碳數為1至30的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,L'為碳數為1至20的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,L'為碳數為1至10的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,L'為經取代或未經取代的亞甲基。 在本說明書的一實施形態中,L'為亞甲基。In one embodiment of the present specification, L'is a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms. In one embodiment of the present specification, L'is a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms. In one embodiment of the present specification, L'is a substituted or unsubstituted alkylene group having 1 to 10 carbon atoms. In one embodiment of this specification, L'is a substituted or unsubstituted methylene group. In one embodiment of this specification, L'is a methylene group.
在本說明書的一實施形態中,T1至T3彼此相同或不同,分別獨立地為氫、羥基、碳數為1至30的經取代或未經取代的烷基。 在本說明書的一實施形態中,T1至T3彼此相同或不同,分別獨立地為氫、羥基、碳數為1至20的經取代或未經取代的烷基。 在本說明書的一實施形態中,T1至T3彼此相同或不同,分別獨立地為氫、羥基、碳數為1至10的經取代或未經取代的烷基。 在本說明書的一實施形態中,T1至T3彼此相同或不同,分別獨立地為氫、羥基、經取代或未經取代的甲基。 在本說明書的一實施形態中,T1為氫或甲基。 在本說明書的一實施形態中,T2為氫。 在本說明書的一實施形態中,T3為氫、羥基、或經胺基取代的甲基。In one embodiment of this specification, T1 to T3 are the same or different from each other, and are each independently hydrogen, a hydroxyl group, and a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms. In one embodiment of this specification, T1 to T3 are the same or different from each other, and are each independently hydrogen, a hydroxyl group, and a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms. In an embodiment of the present specification, T1 to T3 are the same or different from each other, and are each independently hydrogen, a hydroxyl group, and a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms. In one embodiment of the present specification, T1 to T3 are the same or different from each other, and are each independently hydrogen, hydroxyl, and substituted or unsubstituted methyl. In one embodiment of this specification, T1 is hydrogen or methyl. In one embodiment of this specification, T2 is hydrogen. In one embodiment of this specification, T3 is hydrogen, a hydroxyl group, or a methyl group substituted with an amino group.
根據本說明書的一實施形態,所述化學式1可由下述化學式3表示。According to an embodiment of this specification, the chemical formula 1 can be represented by the following chemical formula 3.
[化學式3] 在所述化學式3中,是指與其他取代基或鍵結部連接的部分, X'、L1、L2、T1至T3、t2及t3與在所述化學式1中定義的內容相同。[Chemical formula 3] In the chemical formula 3, It refers to a part connected to other substituents or bonding parts, and X', L1, L2, T1 to T3, t2, and t3 are the same as those defined in the chemical formula 1.
在本說明書的一實施形態中,所述化學式1可由下述結構中的任一者表示,但並不限定於此。所述化學式1是由下述結構中的任一者形成聚合的部分。 In one embodiment of this specification, the chemical formula 1 can be represented by any of the following structures, but it is not limited to this. The chemical formula 1 is a polymerized part formed by any of the following structures.
在本說明書的一實施形態中,所述黏合劑樹脂可更包含一種以上的由下述化學式4至化學式7中的任一者表示的結構。In an embodiment of the present specification, the binder resin may further include one or more structures represented by any one of the following Chemical Formula 4 to Chemical Formula 7.
[化學式4] [化學式5] [化學式6] [化學式7] 在所述化學式4至化學式7中,是指與其他取代基或鍵結部連接的部分, L41、L51、L52、及L61彼此相同或不同,分別獨立地為經取代或未經取代的伸烷基, X1、X2、Y1、Y2、Z1及Z2彼此相同或不同,分別獨立地為氫、經取代或未經取代的烷基、經取代或未經取代的環烷基、或者經取代或未經取代的芳基, x2為0至5的整數,在x2為2以上的情況下,X2彼此相同或不同。[Chemical formula 4] [Chemical formula 5] [Chemical formula 6] [Chemical formula 7] In the chemical formula 4 to chemical formula 7, It refers to the part connected to other substituents or bonding parts, L41, L51, L52, and L61 are the same or different from each other, and are each independently a substituted or unsubstituted alkylene group, X1, X2, Y1, Y2, Z1 and Z2 are the same or different from each other, and are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, or substituted or unsubstituted aryl, x2 is 0 to An integer of 5, and when x2 is 2 or more, X2 is the same or different from each other.
在本說明書的一實施形態中,L41、L51、L52、及L61彼此相同或不同,分別獨立地為碳數為1至30的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,L41、L51、L52、及L61彼此相同或不同,分別獨立地為碳數為1至20的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,L41、L51、L52、及L61彼此相同或不同,分別獨立地為碳數為1至10的經取代或未經取代的伸烷基。 在本說明書的一實施形態中,L41、L51、L52、及L61彼此相同或不同,分別獨立地為經取代或未經取代的亞甲基。 在本說明書的一實施形態中,L41、L51、L52、及L61彼此相同或不同,分別獨立地為亞甲基。In one embodiment of the present specification, L41, L51, L52, and L61 are the same or different from each other, and are each independently a substituted or unsubstituted alkylene group having 1 to 30 carbon atoms. In one embodiment of the present specification, L41, L51, L52, and L61 are the same as or different from each other, and are each independently a substituted or unsubstituted alkylene group having 1 to 20 carbon atoms. In one embodiment of the present specification, L41, L51, L52, and L61 are the same as or different from each other, and are each independently a substituted or unsubstituted alkylene group having 1 to 10 carbon atoms. In one embodiment of this specification, L41, L51, L52, and L61 are the same or different from each other, and each independently is a substituted or unsubstituted methylene group. In one embodiment of this specification, L41, L51, L52, and L61 are the same or different from each other, and each independently is a methylene group.
在本說明書的一實施形態中,X1、X2、Y1、Y2、Z1及Z2彼此相同或不同,分別獨立地為氫、碳數為1至30的經取代或未經取代的烷基、碳數為3至30的經取代或未經取代的環烷基、或碳數為6至30的經取代或未經取代的芳基。 在本說明書的一實施形態中,X1、X2、Y1、Y2、Z1及Z2彼此相同或不同,分別獨立地為氫、碳數為1至20的經取代或未經取代的烷基、碳數為3至20的經取代或未經取代的環烷基、或碳數為6至20的經取代或未經取代的芳基。 在本說明書的一實施形態中,X1、X2、Y1、Z1及Z2彼此相同或不同,分別獨立地為氫、碳數為1至10的經取代或未經取代的烷基、碳數為3至10的經取代或未經取代的環烷基、或碳數為6至12的經取代或未經取代的芳基。 在本說明書的一實施形態中,X1及Y1為經取代或未經取代的甲基。 在本說明書的一實施形態中,X1及Y1為甲基。 在本說明書的一實施形態中,X2為氫。 在本說明書的一實施形態中,Y2為經取代或未經取代的環己基、或者經取代或未經取代的苯基。 在本說明書的一實施形態中,Y2為環己基、或苯基。 在本說明書的一實施形態中,Z1為經取代或未經取代的苯基。 在本說明書的一實施形態中,Z1為苯基。 在本說明書的一實施形態中,Z2為經取代或未經取代的甲基。 在本說明書的一實施形態中,Z2為甲基。In one embodiment of this specification, X1, X2, Y1, Y2, Z1, and Z2 are the same or different from each other and are each independently hydrogen, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, and a carbon number It is a substituted or unsubstituted cycloalkyl group of 3 to 30, or a substituted or unsubstituted aryl group of 6 to 30 carbon atoms. In one embodiment of this specification, X1, X2, Y1, Y2, Z1, and Z2 are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and a carbon number It is a substituted or unsubstituted cycloalkyl group having 3 to 20, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms. In one embodiment of this specification, X1, X2, Y1, Z1, and Z2 are the same or different from each other, and are each independently hydrogen, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and a carbon number of 3. A substituted or unsubstituted cycloalkyl group having to 10 or a substituted or unsubstituted aryl group having 6 to 12 carbons. In one embodiment of this specification, X1 and Y1 are substituted or unsubstituted methyl groups. In one embodiment of this specification, X1 and Y1 are methyl groups. In one embodiment of this specification, X2 is hydrogen. In one embodiment of this specification, Y2 is a substituted or unsubstituted cyclohexyl group, or a substituted or unsubstituted phenyl group. In one embodiment of this specification, Y2 is cyclohexyl or phenyl. In one embodiment of this specification, Z1 is a substituted or unsubstituted phenyl group. In one embodiment of this specification, Z1 is a phenyl group. In one embodiment of this specification, Z2 is a substituted or unsubstituted methyl group. In one embodiment of this specification, Z2 is a methyl group.
在本說明書的一實施形態中,所述化學式4可由下述結構表示,但並不限定於此。 In one embodiment of this specification, the chemical formula 4 can be represented by the following structure, but it is not limited to this.
在本說明書的一實施形態中,所述化學式5可由下述結構表示,但並不限定於此。 In one embodiment of this specification, the chemical formula 5 can be represented by the following structure, but it is not limited to this.
在本說明書的一實施形態中,所述化學式6可由下述結構表示,但並不限定於此。 In one embodiment of this specification, the chemical formula 6 can be represented by the following structure, but it is not limited to this.
在本說明書的一實施形態中,所述化學式7可由下述結構表示,但並不限定於此。 In one embodiment of this specification, the chemical formula 7 can be represented by the following structure, but it is not limited to this.
在本說明書的一實施形態中,所述黏合劑樹脂可為如下的共聚物:所述共聚物包含選自由所述化學式1及所述化學式4至化學式7表示的結構中的一者以上的結構。In one embodiment of the present specification, the binder resin may be a copolymer including one or more structures selected from the structure represented by the chemical formula 1 and the chemical formula 4 to the chemical formula 7 .
本說明書的一實施形態提供一種感光性樹脂組成物,以所述感光性樹脂組成物的總重量為基準,包含:0.1重量%至30重量%的所述二苯並哌喃染料;1重量%至40重量%的包含所述由化學式1表示的結構的黏合劑樹脂;1重量%至40重量%的所述多官能性單體;0.1重量%至10重量%的所述光起始劑;以及餘量為溶劑。An embodiment of this specification provides a photosensitive resin composition, based on the total weight of the photosensitive resin composition, containing: 0.1% to 30% by weight of the dibenzopiperan dye; 1% by weight To 40% by weight of the binder resin including the structure represented by Chemical Formula 1; 1% to 40% by weight of the polyfunctional monomer; 0.1% to 10% by weight of the photoinitiator; And the balance is solvent.
藉由使所述感光性樹脂組成物的各構成要素滿足所述範圍,可得到耐熱性及耐化學性優異的彩色濾光片用感光性樹脂組成物。By making each component of the photosensitive resin composition satisfy the above-mentioned range, a photosensitive resin composition for color filters having excellent heat resistance and chemical resistance can be obtained.
在本說明書的一實施形態中,所述黏合劑樹脂的重量平均分子量為5,000 g/mol至30,000 g/mol。較佳可為5,000 g/mol至20,000 g/mol。In an embodiment of this specification, the weight average molecular weight of the binder resin is 5,000 g/mol to 30,000 g/mol. Preferably, it may be 5,000 g/mol to 20,000 g/mol.
藉由使所述黏合劑樹脂滿足所述重量平均分子量的範圍,可得到耐熱性及耐化學性優異的彩色濾光片膜。When the binder resin satisfies the weight average molecular weight range, a color filter film excellent in heat resistance and chemical resistance can be obtained.
所述重量平均分子量是分子量不均勻且以某種高分子物質的分子量為基準使用的平均分子量中的一種,且是藉由利用重量分率對存在分子量分佈的高分子化合物的成分分子物種的分子量進行平均而得到的值。The weight average molecular weight is one of the average molecular weights used based on the molecular weight of a certain polymer substance with uneven molecular weight, and is determined by using the weight fraction to determine the molecular weight of the component molecular species of the polymer compound having a molecular weight distribution. The value obtained by averaging.
所述重量平均分子量可藉由凝膠滲透層析法(Gel Permeation Chromatography,GPC)分析而測定。The weight average molecular weight can be determined by gel permeation chromatography (Gel Permeation Chromatography, GPC) analysis.
在本說明書的一實施形態中,所述感光性樹脂組成物可更包含選自由顏料及染料所組成的群組中的一者。In one embodiment of this specification, the photosensitive resin composition may further include one selected from the group consisting of pigments and dyes.
即,所述感光性樹脂組成物除所述化學式1的化合物以外,可更包含染料及顏料中的至少一種。例如,所述感光性樹脂組成物亦可僅包含所述化學式1的化合物,但亦可包含所述化學式1的化合物與一種以上的染料、或包含所述化學式1的化合物與一種以上的顏料、或包含所述化學式1的化合物、一種以上的染料及一種以上的顏料。That is, the photosensitive resin composition may further include at least one of a dye and a pigment in addition to the compound of the chemical formula 1. For example, the photosensitive resin composition may only include the compound of the chemical formula 1, but may also include the compound of the chemical formula 1 and one or more dyes, or the compound of the chemical formula 1 and one or more pigments, Or include the compound of the chemical formula 1, more than one dye and more than one pigment.
所述染料可為是蒽醌系、氮雜卟啉系、偶氮系、三芳基甲烷系、酞青系、或二吡咯並吡咯系,但並不限定於此。The dye may be an anthraquinone series, azaporphyrin series, azo series, triarylmethane series, phthalocyanine series, or dipyrrolopyrrole series, but is not limited thereto.
所述顏料可為銅酞青系藍色顏料、或紫色顏料(顏料紫(Pigment violet)23),但並不限定於此。具體而言,所述顏料可為C.I顏料藍(pigment blue)15:6。The pigment may be a copper phthalocyanine blue pigment or a purple pigment (Pigment violet 23), but is not limited to this. Specifically, the pigment may be C.I pigment blue (pigment blue) 15:6.
所述黏合劑樹脂可使用賦予膜的機械強度的多官能性單體與賦予鹼溶解性的單體的共聚樹脂,可更包含在相應技術領域內通常使用的黏合劑。The binder resin may use a copolymer resin of a polyfunctional monomer that imparts mechanical strength to the film and a monomer that imparts alkali solubility, and may further include a binder commonly used in the corresponding technical field.
賦予所述膜的機械強度的多官能性單體可為不飽和羧酸酯類、芳香族乙烯基類、不飽和醚類、不飽和醯亞胺類、及酸酐中的任一者以上。 作為所述不飽和羧酸酯類的具體例,可選自由(甲基)丙烯酸苄酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸2-苯氧基乙酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基-3-氯丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸醯基辛基氧基-2-羥基丙酯、丙三醇(甲基)丙烯酸酯、(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、乙氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基三丙二醇(甲基)丙烯酸酯、聚(乙二醇)甲醚(甲基)丙烯酸酯、苯氧基二乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚丙二醇(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸1,1,1,3,3,3-六氟異丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯、(甲基)丙烯酸三溴苯酯、α-羥基甲基丙烯酸甲酯、α-羥基甲基丙烯酸乙酯、α-羥基甲基丙烯酸丙酯及α-羥基甲基丙烯酸丁酯所組成的群組中,但並不僅限定於該些。 作為所述芳香族乙烯基單量體類的具體例,可選自由苯乙烯、α-甲基苯乙烯、(鄰、間、對)-乙烯基甲苯、(鄰、間、對)-甲氧基苯乙烯及(鄰、間、對)-氯苯乙烯所組成的群組中,但並不僅限定於該些。 作為所述不飽和醚類的具體例,可選自由乙烯基甲醚、乙烯基乙醚及烯丙基縮水甘油醚所組成的群組中,但並不僅限定於該些。 作為所述不飽和醯亞胺類的具體例,可選自由N-苯基馬來醯亞胺、N-(4-氯苯基)馬來醯亞胺、N-(4-羥基苯基)馬來醯亞胺及N-環己基馬來醯亞胺所組成的群組中,但並不僅限定於該些。 作為所述酸酐,有馬來酸酐、甲基馬來酸酐、四氫鄰苯二甲酸酐等,但並不僅限定於該些。The polyfunctional monomer that provides the mechanical strength of the film may be any one or more of unsaturated carboxylic acid esters, aromatic vinyls, unsaturated ethers, unsaturated imines, and acid anhydrides. As specific examples of the unsaturated carboxylic acid esters, benzyl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, Base) dimethylaminoethyl acrylate, isobutyl (meth)acrylate, tertiary butyl (meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, (meth)acrylate Base) ethylhexyl acrylate, 2-phenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate , 2-hydroxy-3-chloropropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, octyloxy-2-hydroxypropyl (meth)acrylate, glycerol (meth) Base) acrylate, 2-methoxyethyl (meth)acrylate, 3-methoxybutyl (meth)acrylate, ethoxydiethylene glycol (meth)acrylate, methoxytriethyl Glycol (meth)acrylate, methoxytripropylene glycol (meth)acrylate, poly(ethylene glycol) methyl ether (meth)acrylate, phenoxydiethylene glycol (meth)acrylate, P-nonylphenoxy polyethylene glycol (meth)acrylate, p-nonylphenoxy polypropylene glycol (meth)acrylate, glycidyl (meth)acrylate, tetrafluoropropyl (meth)acrylate , 1,1,1,3,3,3-hexafluoroisopropyl (meth)acrylate, octafluoropentyl (meth)acrylate, heptafluorodecyl (meth)acrylate, (meth)acrylic acid Tribromophenyl ester, α-hydroxy methyl methacrylate, α-hydroxy ethyl methacrylate, α-hydroxy propyl methacrylate, and α-hydroxy butyl methacrylate, but not only Limited to these. As specific examples of the aromatic vinyl monomers, styrene, α-methylstyrene, (ortho, m, p)-vinyl toluene, (ortho, m, and p)-methoxy But it is not limited to the group consisting of styrene and (ortho, meta, p)-chlorostyrene. As specific examples of the unsaturated ethers, it can be selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but it is not limited to these. As specific examples of the unsaturated amides, N-phenylmaleimines, N-(4-chlorophenyl)maleimines, N-(4-hydroxyphenyl) Maleimines and N-cyclohexylmaleimines are in the group, but they are not limited to these. As the acid anhydride, there are maleic anhydride, methylmaleic anhydride, tetrahydrophthalic anhydride, etc., but it is not limited to these.
賦予鹼溶解性的所述單體若為包含酸基者,則並無特別限定,例如較佳為使用選自由(甲基)丙烯酸、巴豆酸、衣康酸、馬來酸、富馬酸、單甲基馬來酸、5-降冰片烯-2-羧酸、鄰苯二甲酸單-2-((甲基)丙烯醯氧基)乙酯、琥珀酸單-2-((甲基)丙烯醯氧基)乙酯、ω-羧基聚己內酯單(甲基)丙烯酸酯所組成的群組中的一種以上,但並不僅限定於該些。The monomer imparting alkali solubility is not particularly limited if it contains an acid group. For example, it is preferably selected from (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, Monomethylmaleic acid, 5-norbornene-2-carboxylic acid, phthalic acid mono-2-((meth)acryloxy) ethyl ester, succinic acid mono-2-((methyl) One or more of the group consisting of acryloxy) ethyl and ω-carboxy polycaprolactone mono(meth)acrylate, but it is not limited to these.
在本說明書的一實施形態中,所述多官能性單體可為二季戊四醇五丙烯酸酯。In an embodiment of this specification, the multifunctional monomer may be dipentaerythritol pentaacrylate.
根據本說明書的一實施形態,所述黏合劑樹脂的酸價可為70 KOH mg/g至120 KOH mg/g。According to an embodiment of the present specification, the acid value of the binder resin may be 70 KOH mg/g to 120 KOH mg/g.
所述黏合劑樹脂的酸價可利用0.1 N濃度的氫氧化鉀(KOH)甲醇溶液滴定來測定。The acid value of the binder resin can be determined by titration with a 0.1 N potassium hydroxide (KOH) methanol solution.
所述光起始劑若為藉由光而產生自由基來引發交聯的起始劑,則並不特別限定,例如可為選自由苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物及肟系化合物所組成的群組中的一種以上。The photoinitiator is not particularly limited as long as it is an initiator that generates free radicals by light to initiate crosslinking. For example, it may be selected from acetophenone-based compounds, biimidazole-based compounds, and triazine-based compounds. And one or more of the group consisting of oxime-based compounds.
所述苯乙酮系化合物有2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥基乙氧基)-苯基-(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、安息香甲醚、安息香乙醚、安息香異丁醚、安息香丁醚、2,2-二甲氧基-2-苯基苯乙酮、2-甲基-(4-甲硫基)苯基-2-嗎啉基-1-丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-(4-溴-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮或2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮等,並不限定於此。The acetophenone compounds include 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1 -Ketone, 4-(2-hydroxyethoxy)-phenyl-(2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl phenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether, Benzoin butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl-(4-methylthio)phenyl-2-morpholin-1-propane-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butane-1-one, 2-(4-bromo-benzyl-2-dimethylamino- 1-(4-morpholinophenyl)-butane-1-one or 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, etc., It is not limited to this.
作為所述聯咪唑系化合物,有2,2-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4',5,5'-四(3,4,5-三甲氧基苯基)-1,2'-聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4,5,5'-四苯基-1,2'-聯咪唑等,並不限定於此。As the biimidazole compound, there are 2,2-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl) -4,4',5,5'-Tetra(3,4,5-trimethoxyphenyl)-1,2'-biimidazole, 2,2'-bis(2,3-dichlorophenyl) -4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4,4,5,5'-tetraphenyl-1,2'-biimidazole It is not limited to this.
所述三嗪系化合物有3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸1,1,1,3,3,3-六氟異丙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸2-環氧基乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸環己酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸苄酯、3-{氯-4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙醯胺、2,4-雙(三氯甲基)-6-對甲氧基苯乙烯基-均三嗪、2,4-雙(三氯甲基)-6-(1-對二甲基胺基苯基)-1,3-丁二烯基-均三嗪、2-三氯甲基-4-胺基-6-對甲氧基苯乙烯基-均三嗪等,且並不限定於此。The triazine compounds include 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 3-{4-[2,4- Bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid 1,1,1,3,3,3-hexafluoroisopropyl ester, 2-{4-[2,4- Bis(trichloromethyl)-s-triazin-6-yl]phenylthio) ethyl acetate, 2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl] Phenylthio}2-epoxyethyl acetate, 2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}cyclohexyl acetate, 2- {4-[2,4-Bis(trichloromethyl)-s-triazin-6-yl]phenylthio}benzyl acetate, 3-{chloro-4-[2,4-bis(trichloromethyl) )-S-triazin-6-yl]phenylthio}propionic acid, 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propanamide , 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazine, 2,4-bis(trichloromethyl)-6-(1-p-dimethylamino) (Phenyl)-1,3-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, etc., and not limited to these .
所述肟系化合物有1,2-辛二酮-1-(4-苯硫基)苯基-2-(鄰苯甲醯基肟)(汽巴-嘉基(Ciba-Geigy)公司,CGI-124)、乙酮-1-(9-乙基)-6-(2-甲基苯甲醯基-3-基)-1-(O-乙醯基肟)(CGI-242)、N-1919(艾迪科(Adeka)公司)等,並不限定於此。The oxime compounds include 1,2-octanedione-1-(4-phenylthio)phenyl-2-(phthaloyl oxime) (Ciba-Geigy Company, CGI -124), ethyl ketone-1-(9-ethyl)-6-(2-methylbenzyl-3-yl)-1-(O-acetoxime) (CGI-242), N -1919 (Adeka), etc., are not limited to this.
所述光起始劑可為三養公司的SPI-03。The photoinitiator may be SPI-03 of Samyang Corporation.
所述溶剂可為選自由丙酮、甲基乙基酮、甲基異丁基酮、甲基溶纖劑、乙基溶纖劑、四氫呋喃、1,4-二噁烷、乙二醇二甲醚、乙二醇二乙醚、丙二醇二甲醚、丙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇甲基乙基醚、氯仿、二氯甲烷、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2-三氯乙烷、1,1,2-三氯乙烯、己烷、庚烷、辛烷、環己烷、苯、甲苯、二甲苯、甲醇、乙醇、異丙醇、丙醇、丁醇、第三丁醇、2-乙氧基丙醇、2-甲氧基丙醇、3-甲氧基丁醇、環己酮、環戊酮、丙二醇單甲醚乙酸酯、丙二醇乙醚乙酸酯、3-甲氧基丁基乙酸酯、3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、甲基溶纖劑乙酸酯、乙酸丁酯、丙二醇單甲醚及二丙二醇單甲醚所組成的群組中的一種以上,但並不僅限定於此。The solvent can be selected from acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether , Ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, chloroform, dichloromethane, 1,2 -Dichloroethane, 1,1,1-trichloroethane, 1,1,2-trichloroethane, 1,1,2-trichloroethylene, hexane, heptane, octane, cyclohexane , Benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tertiary butanol, 2-ethoxypropanol, 2-methoxypropanol, 3-methoxybutanol , Cyclohexanone, cyclopentanone, propylene glycol monomethyl ether acetate, propylene glycol ethyl ether acetate, 3-methoxybutyl acetate, ethyl 3-ethoxypropionate, ethyl cellosolve B One or more of the group consisting of acid ester, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether, and dipropylene glycol monomethyl ether, but it is not limited thereto.
在本說明書的一實施形態中,所述溶劑可為丙二醇單甲醚乙酸酯及/或3-甲氧基丁基乙酸酯。In an embodiment of this specification, the solvent may be propylene glycol monomethyl ether acetate and/or 3-methoxybutyl acetate.
在本說明書的一實施形態中,以所述感光性樹脂組成物中固體成分的總重量為基準,所述二苯並哌喃染料的含量為0.1重量%至30重量%,包含由化學式1表示的結構的所述黏合劑樹脂的含量為1重量%至40重量%,所述光起始劑的含量為0.1重量%至10重量%。In one embodiment of the present specification, the content of the dibenzopyran dye is 0.1% by weight to 30% by weight based on the total weight of the solid content in the photosensitive resin composition, including the formula represented by chemical formula 1. The content of the binder resin of the structure is 1% to 40% by weight, and the content of the photoinitiator is 0.1% to 10% by weight.
以所述感光性樹脂組成物中固體成分的總重量為基準,在所述感光性樹脂組成物所包含的各構成要素滿足所述範圍的情況,具有耐熱性及耐化學性優異的效果。On the basis of the total weight of the solid content in the photosensitive resin composition, when each component contained in the photosensitive resin composition satisfies the above range, it has an effect of excellent heat resistance and chemical resistance.
所謂所述固體成分的總重量,是指感光性樹脂組成物中除溶劑以外的成分的總重量之和。固體成分及各成分的以固體成分為基準的重量%的基準可藉由液相層析法或氣相層析法等本領域中所使用的通常的分析手段進行測定。The total weight of the solid content refers to the total weight of the components other than the solvent in the photosensitive resin composition. The solid content and the weight% standard based on the solid content of each component can be measured by a common analysis method used in the art such as liquid chromatography or gas chromatography.
根據本說明書的一實施形態,所述感光性樹脂組成物進一步包含選自由抗氧化劑、接著助劑、光交聯增感劑、固化促進劑、密著促進劑、界面活性劑、熱聚合防止劑、紫外線吸收劑、接著助劑、分散劑及調平劑所組成的群組中的一種或兩種以上的添加劑。According to an embodiment of the present specification, the photosensitive resin composition further includes an antioxidant, an adhesive agent, a photocrosslinking sensitizer, a curing accelerator, an adhesion accelerator, a surfactant, and a thermal polymerization inhibitor. One or two or more additives in the group consisting of ultraviolet absorbers, adhesives, dispersants and leveling agents.
在本說明書的一實施形態中,所述添加劑具體而言可選自由抗氧化劑、界面活性劑、及接著助劑所組成的群組。In an embodiment of the present specification, the additives can be specifically selected from the group consisting of antioxidants, surfactants, and adjuvants.
另外,所述感光性樹脂組成物可更包含多硫醇(multi-thiol)劑。In addition, the photosensitive resin composition may further contain a multi-thiol agent.
根據本說明書的一實施形態,以所述感光性樹脂組成物中固體成分的總重量為基準,所述添加劑的含量為0.1重量%至20重量%。According to an embodiment of the present specification, the content of the additive is 0.1% by weight to 20% by weight based on the total weight of the solid content in the photosensitive resin composition.
所述光交聯增感劑可使用選自由以下化合物所組成的群組中的一種以上:二苯甲酮、4,4-雙(二甲基胺基)二苯甲酮、4,4-雙(二乙基胺基)二苯甲酮、2,4,6-三甲基胺基二苯甲酮、鄰苯甲醯基苯甲酸甲酯、3,3-二甲基-4-甲氧基二苯甲酮、3,3,4,4-四(第三丁基過氧化羰基)二苯甲酮等二苯甲酮系化合物;9-芴酮、2-氯-9-芴酮、2-甲基-9-芴酮等芴酮系化合物;硫雜蒽酮、2,4-二乙基硫雜蒽酮、2-氯硫雜蒽酮、1-氯-4-丙基氧基硫雜蒽酮、異丙基硫雜蒽酮、二異丙基硫雜蒽酮等硫雜蒽酮系化合物;氧雜蒽酮、2-甲基氧雜蒽酮等氧雜蒽酮系化合物;蒽醌、2-甲基蒽醌、2-乙基蒽醌、第三丁基蒽醌、2,6-二氯-9,10-蒽醌等蒽醌系化合物;9-苯基吖啶、1,7-雙(9-吖啶基)庚烷、1,5-雙(9-吖啶基戊烷)、1,3-雙(9-吖啶基)丙烷等吖啶系化合物;苄基、1,7,7-三甲基-雙環[2,2,1]庚烷-2,3-二酮、9,10-菲醌等二羰基化合物;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基氧化膦等氧化膦系化合物;4-(二甲基胺基)苯甲酸甲酯、4-(二甲基胺基)苯甲酸乙酯、2-正丁氧基乙基-4-(二甲基胺基)苯甲酸酯等苯甲酸酯系化合物;2,5-雙(4-二乙基胺基亞苄基)環戊酮、2,6-雙(4-二乙基胺基亞苄基)環己酮、2,6-雙(4-二乙基胺基亞苄基)-4-甲基-環戊酮等胺基增效劑;3,3-羰基乙烯基-7-(二乙基胺基)香豆素、3-(2-苯並噻唑基)-7-(二乙基胺基)香豆素、3-苯甲醯基-7-(二乙基胺基)香豆素、3-苯甲醯基-7-甲氧基-香豆素、10,10-羰基雙[1,1,7,7-四甲基-2,3,6,7-四氫-1H,5H,11H-C1]-苯並吡喃並[6,7,8-ij]-喹嗪-11-酮等香豆素系化合物;4-二乙基胺基查耳酮、4-疊氮基亞苄基苯乙酮等查耳酮化合物;2-苯甲醯基亞甲基、3-甲基-b-萘並噻唑啉。The photo-crosslinking sensitizer can use one or more selected from the group consisting of the following compounds: benzophenone, 4,4-bis(dimethylamino)benzophenone, 4,4- Bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl phthalate, 3,3-dimethyl-4-methyl Benzophenone compounds such as oxybenzophenone, 3,3,4,4-tetra(tert-butylperoxycarbonyl)benzophenone; 9-fluorenone, 2-chloro-9-fluorenone , 2-methyl-9-fluorenone and other fluorenone compounds; thioxanthone, 2,4-diethyl thioxanthone, 2-chlorothioxanthone, 1-chloro-4-propyl oxygen Thioxanthone compounds such as thioxanthone, isopropyl thioxanthone, diisopropyl thioxanthone; xanthone compounds such as xanthone, 2-methylxanthone ; Anthraquinone compounds such as anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, tertiary butyl anthraquinone, 2,6-dichloro-9,10-anthraquinone; 9-phenyl acridine , 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinylpentane), 1,3-bis(9-acridinyl)propane and other acridine compounds; Benzyl, 1,7,7-trimethyl-bicyclo[2,2,1]heptane-2,3-dione, 9,10-phenanthrenequinone and other dicarbonyl compounds; 2,4,6-trimethyl Phosphine oxide compounds such as benzoyl diphenyl phosphine oxide, bis(2,6-dimethoxybenzyl)-2,4,4-trimethylpentyl phosphine oxide; 4-(bis Benzoic acid such as methylamino) benzoate, ethyl 4-(dimethylamino) benzoate, 2-n-butoxyethyl-4-(dimethylamino) benzoate Ester compounds; 2,5-bis(4-diethylaminobenzylidene)cyclopentanone, 2,6-bis(4-diethylaminobenzylidene)cyclohexanone, 2,6- Amino synergists such as bis(4-diethylaminobenzylidene)-4-methyl-cyclopentanone; 3,3-carbonylvinyl-7-(diethylamino)coumarin, 3-(2-benzothiazolyl)-7-(diethylamino)coumarin, 3-benzyl-7-(diethylamino)coumarin, 3-benzyl -7-Methoxy-coumarin, 10,10-carbonylbis[1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H,5H,11H-C1]- Benzopyrano[6,7,8-ij]-quinazine-11-one and other coumarin compounds; 4-diethylaminochalcone, 4-azidobenzylidene acetophenone Other chalcone compounds; 2-benzyl methylene, 3-methyl-b-naphththiazoline.
所述固化促進劑用於提高固化及機械強度,具體而言,可使用選自由2-巰基苯並咪唑、2-巰基苯並噻唑、2-巰基苯並噁唑、2,5-二巰基-1,3,4-噻二唑、2-巰基-4,6-二甲基胺基吡啶、季戊四醇-四(3-巰基丙酸酯)、季戊四醇-三(3-巰基丙酸酯)、季戊四醇-四(2-巰基乙酸酯)、季戊四醇-三(2-巰基乙酸酯)、三羥甲基丙烷-三(2-巰基乙酸酯)及三羥甲基丙烷-三(3-巰基丙酸酯)所組成的群組中的一種以上。The curing accelerator is used to improve curing and mechanical strength. Specifically, it can be selected from 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto- 1,3,4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetra(3-mercaptopropionate), pentaerythritol-tris(3-mercaptopropionate), pentaerythritol -Tetra(2-mercaptoacetate), pentaerythritol-tris(2-mercaptoacetate), trimethylolpropane-tris(2-mercaptoacetate) and trimethylolpropane-tris(3-mercapto) One or more of the group consisting of propionate).
所述接著助劑可使用本領域內通常所使用者,在一實施形態中,所述接著助劑可為KBM-503。The bonding agent can be commonly used in the art. In one embodiment, the bonding agent may be KBM-503.
所述多硫醇劑可使用本領域內通常所使用者,在一實施形態中,所述多硫醇劑可為PE-01。The polythiol agent can be commonly used in the art. In one embodiment, the polythiol agent can be PE-01.
作為所述密著促進劑,可使用選自甲基丙烯醯氧基丙基三甲氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷、甲基丙烯醯氧基丙基三乙氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷等甲基丙烯醯基矽烷偶合劑中的一種以上,作為烷基三甲氧基矽烷,可使用選自辛基三甲氧基矽烷、十二烷基三甲氧基矽烷、十八烷基三甲氧基矽烷等中的一種以上。As the adhesion promoter, a group selected from the group consisting of methacryloxypropyltrimethoxysilane, methacryloxypropyldimethoxysilane, methacryloxypropyltriethoxy One or more of methacryloyl silane coupling agents such as methacryloyl silane, methacryloyloxypropyl dimethoxy silane, etc. As the alkyl trimethoxy silane, a group selected from octyl trimethoxy silane, ten One or more of dialkyltrimethoxysilane, octadecyltrimethoxysilane, etc.
所述界面活性劑為矽系界面活性劑或氟系界面活性劑,具體而言,矽系界面活性劑可使用畢克化學(BYK-Chemie)公司的畢克(BYK)-077、畢克(BYK)-085、畢克(BYK)-300、畢克(BYK)-301、畢克(BYK)-302、畢克(BYK)-306、畢克(BYK)-307、畢克(BYK)-310、畢克(BYK)-320、畢克(BYK)-322、畢克(BYK)-323、畢克(BYK)-325、畢克(BYK)-330、畢克(BYK)-331、畢克(BYK)-333、畢克(BYK)-335、畢克(BYK)-341v344、畢克(BYK)-345v346、畢克(BYK)-348、畢克(BYK)-354、畢克(BYK)-355、畢克(BYK)-356、畢克(BYK)-358、畢克(BYK)-361、畢克(BYK)-370、畢克(BYK)-371、畢克(BYK)-375、畢克(BYK)-380、畢克(BYK)-390等,作為氟系界面活性劑,可使用迪愛生(DIC)(大日本油墨化學工業股份有限公司(DaiNippon Ink & Chemicals))公司的F-114、F-177、F-410、F-411、F-450、F-493、F-494、F-443、F-444、F-445、F-446、F-470、F-471、F-472SF、F-474、F-475、F-477、F-478、F-479、F-480SF、F-482、F-483、F-484、F-486、F-487、F-554、F-172D、MCF-350SF、TF-1025SF、TF-1117SF、TF-1026SF、TF-1128、TF-1127、TF-1129、TF-1126、TF-1130、TF-1116SF、TF-1131、TF1132、TF1027SF、TF-1441、TF-1442等,但並不僅限定於此。The surfactant is a silicon-based surfactant or a fluorine-based surfactant. Specifically, the silicon-based surfactant can be BYK-077 and BYK-Chemie (BYK-Chemie). BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK -310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331 , BYK-333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK BYK -355, BYK -356, BYK -358, BYK -361, BYK -370, BYK -371, BYK (BYK) BYK-375, BYK-380, BYK-390, etc. As a fluorine-based surfactant, you can use DIC (DaiNippon Ink & Chemicals) )) The company's F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, F-445, F-446, F- 470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-554, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF- 1116SF, TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc., but not limited to these.
在本說明書的一實施形態中,界面活性劑可為氟系界面活性劑,具體而言可為迪愛生(DIC)公司的F-554。In one embodiment of this specification, the surfactant may be a fluorine-based surfactant, and specifically, may be F-554 of DIC Corporation.
作為所述抗氧化劑,可為選自由受阻酚(Hindered phenol)系抗氧化劑、胺系抗氧化劑、硫系抗氧化劑及膦系抗氧化劑所組成的群組中的一種以上,但並不僅限定於此。作為所述抗氧化劑的具體例,可列舉:如磷酸、磷酸三甲酯或磷酸三乙酯等磷酸系熱穩定劑;如2,6-二-第三丁基-對甲酚、十八烷基-3-(4-羥基-3,5-二-第三丁基苯基)丙酸酯、四雙[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、3,5-二-第三丁基-4-羥基苄基亞磷酸二乙酯、2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-g,t-丁基苯酚4,4'-亞丁基-雙(3-甲基-6-第三丁基苯酚)、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)或雙[3,3-雙-(4'-羥基-3'-第三丁基苯基)丁酸]二醇酯(Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid] glycol ester)等受阻酚(Hindered phenol)系一次抗氧化劑;如苯基-α-萘基胺、苯基-β-萘基胺、N,N'-二苯基-對苯二胺或N,N'-二-β-萘基-對苯二胺等胺系二次抗氧化劑;二月桂基二硫化物、二月桂基硫代丙酸酯、二硬脂基硫代丙酸酯、巰基苯並噻唑或四甲基秋蘭姆二硫化物四雙[亞甲基-3-(月桂基硫代)丙酸酯]甲烷等硫(Thio)系二次抗氧化劑;或者如三苯基亞磷酸酯、三(壬基苯基)亞磷酸酯、三異癸基亞磷酸酯、雙(2,4-二丁基苯基)季戊四醇二亞磷酸酯(Bis(2,4-ditbutylphenyl)Pentaerythritol Diphosphite)或(1,1'-聯苯基)-4,4'-二基雙亞膦酸四[2,4-雙(1,1-二甲基乙基)苯基]酯((1,1'-Biphenyl)-4,4'-Diylbisphosphonous acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl]ester)等亞磷酸酯系二次抗氧化劑。The antioxidant may be one or more selected from the group consisting of hindered phenol-based antioxidants, amine-based antioxidants, sulfur-based antioxidants, and phosphine-based antioxidants, but it is not limited to these . Specific examples of the antioxidant include: phosphoric acid-based heat stabilizers such as phosphoric acid, trimethyl phosphate, or triethyl phosphate; such as 2,6-di-tert-butyl-p-cresol, octadecane 3-(4-hydroxy-3,5-di-tert-butylphenyl) propionate, tetrabis[methylene-3-(3,5-di-tert-butyl-4-hydroxy (Phenyl) propionate) methane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-tert-butyl-4-hydroxybenzyl)benzene, 3,5- Di-tert-butyl-4-hydroxybenzyl diethyl phosphite, 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-g,t-butyl Phenol 4,4'-butylene-bis(3-methyl-6-tert-butylphenol), 4,4'-thiobis(3-methyl-6-tert-butylphenol) or bis[ 3,3-bis-(4'-hydroxy-3'-tert-butylphenyl) butyric acid] glycol ester (Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl) butanoicacid] glycol ester and other Hindered phenols are primary antioxidants; such as phenyl-α-naphthylamine, phenyl-β-naphthylamine, N,N'-diphenyl-p-phenylenediamine or N,N'-bis-β-naphthyl-p-phenylenediamine and other amine-based secondary antioxidants; dilauryl disulfide, dilauryl thiopropionate, distearyl thiopropionate, Thio-based secondary antioxidants such as mercaptobenzothiazole or tetramethylthiuram disulfide tetrabis[methylene-3-(laurylthio)propionate]methane; or such as triphenyl Phosphite, tris(nonylphenyl) phosphite, triisodecyl phosphite, bis(2,4-dibutylphenyl) pentaerythritol diphosphite (Bis(2,4-ditbutylphenyl)Pentaerythritol Diphosphite) or (1,1'-biphenyl)-4,4'-diylbisphosphonite tetrakis[2,4-bis(1,1-dimethylethyl)phenyl] ester ((1 ,1'-Biphenyl)-4,4'-Diylbisphosphonous acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl]ester) and other phosphite-based secondary antioxidants.
在本說明書的一實施形態中,所述抗氧化劑可為受阻酚系抗氧化劑,具體而言可為松原產業的松諾科(Songnox)-1010。In one embodiment of this specification, the antioxidant may be a hindered phenol-based antioxidant, and specifically may be Songnox-1010 from Songyuan Industry.
作為所述紫外線吸收劑,可使用2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯-苯並三唑、烷氧基二苯甲酮等,但並不限定於此,本領域中通常所使用者均能夠使用。As the ultraviolet absorber, 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chloro-benzotriazole, alkoxybenzophenone, etc. can be used, but It is not limited to this, and it can be used by any user in the field.
作為所述熱聚合防止劑,例如可包含選自由對苯甲醚、對苯二酚、鄰苯二酚(pyrocatechol)、第三丁基鄰苯二酚(t-butyl catechol)、N-亞硝基苯基羥基胺銨鹽、N-亞硝基苯基羥基胺鋁鹽、對甲氧基苯酚、二-第三丁基-對甲酚、鄰苯三酚、苯醌、4,4-硫代雙(3-甲基-6-第三丁基酚)、2,2-亞甲基雙(4-甲基-6-第三丁基苯酚)、2-巰基咪唑及啡噻嗪(phenothiazine)所組成的群組中的一種以上,但並不僅限定於該些,亦可包含本技術領域中通常已知者。As the thermal polymerization inhibitor, for example, it may be selected from the group consisting of p-anisole, hydroquinone, pyrocatechol, t-butyl catechol, and N-nitroso Phenyl phenyl hydroxylamine ammonium salt, N-nitrosophenyl hydroxylamine aluminum salt, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, benzoquinone, 4,4-sulfur Bis(3-methyl-6-tert-butylphenol), 2,2-methylene bis(4-methyl-6-tert-butylphenol), 2-mercaptoimidazole and phenothiazine One or more of the group consisting of ), but not limited to these, and may include those generally known in the technical field.
所述分散劑可以以下方法來使用:以預先對顏料進行表面處理的形態內部添加於顏料中的方法或者外部添加於顏料中的方法。作為所述分散劑,可使用化合物型、非離子性、陰離子性或陽離子性分散劑,可列舉氟系、酯系、陽離子系、陰離子系、非離子系、兩性界面活性劑等。該些可分別使用或將兩種以上組合使用。 具體而言,所述分散劑可有選自由聚烷二醇及其酯、聚氧伸烷基多元醇、酯環氧烷加成物、醇環氧烷加成物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺環氧烷加成物及烷基胺所組成的群組中的一種以上,但並不限定於此。The dispersant can be used by a method of internally adding to the pigment in a form in which the pigment is surface-treated in advance, or a method of externally adding to the pigment. As the dispersant, compound-type, nonionic, anionic, or cationic dispersants can be used, and examples include fluorine-based, ester-based, cationic, anionic, nonionic, and amphoteric surfactants. These can be used individually or in combination of two or more types. Specifically, the dispersant may be selected from polyalkylene glycols and their esters, polyoxyalkylene polyols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonates, sulfonic acids One or more of the group consisting of salt, carboxylate, carboxylate, alkyl amine alkylene oxide adduct, and alkyl amine, but it is not limited to this.
所述調平劑可為聚合物性或非聚合物性。作為聚合物性的調平劑的具體例,可列舉聚乙烯亞胺、聚醯胺胺、胺與環氧化物的反應產物,作為非聚合物性的調平劑的具體例,包含非聚合物含硫化合物及非聚合物含氮化合物,但不限定於此,本領域中通常所使用者均能夠使用。The leveling agent may be polymeric or non-polymeric. Specific examples of polymer leveling agents include polyethyleneimine, polyamide amines, reaction products of amines and epoxides, and specific examples of non-polymer leveling agents include non-polymer sulfur-containing Compounds and non-polymer nitrogen-containing compounds, but not limited to these, can be used by users generally in the field.
本說明書的一實施形態提供一種使用所述感光性樹脂組成物製造的光阻。One embodiment of this specification provides a photoresist manufactured using the photosensitive resin composition.
更詳細而言,提供一種可利用適當的方法將本說明書的感光性樹脂組成物塗佈至基材上固化來形成薄膜或圖案形態的光阻。In more detail, it provides a photoresist which can form a film or pattern form by applying the photosensitive resin composition of this specification to a base material and hardening by a suitable method.
作為所述塗佈方法,雖並不特別限定,但可使用噴霧法、輥塗法、旋塗法等,通常廣泛使用旋塗法。另外,於形成塗佈膜之後,視情況,亦可於減壓下去除一部分殘留溶劑。Although the coating method is not particularly limited, a spray method, a roll coating method, a spin coating method, etc. can be used, and the spin coating method is generally widely used. In addition, after the coating film is formed, as appropriate, a part of the residual solvent may be removed under reduced pressure.
作為用於對本說明書的感光性樹脂組成物進行固化的光源,例如有使波長為250 nm至450 nm的光發散的水銀蒸汽弧(arc)、碳弧、氙(Xe)弧等,但未必侷限於此。As a light source for curing the photosensitive resin composition of this specification, there are, for example, mercury vapor arc (arc), carbon arc, and xenon (Xe) arc that emit light with a wavelength of 250 nm to 450 nm, but it is not necessarily limited. Here.
本說明書的感光性樹脂組成物可用於薄膜電晶體液晶顯示裝置(Thin Film Transistor Liquid Crystal Display,TFT LCD)彩色濾光片製造用顏料分散型光阻、薄膜電晶體液晶顯示裝置(TFT LCD)或有機發光二極體的黑色矩陣形成用光阻、外塗層形成用光阻、柱狀間隔物(colomn spacer)光阻、光固化型塗料、光固化性墨水、光固化性接著劑、印刷版、印刷配線板用光阻、電漿顯示器面板(Plasma Display Panel,PDP)用光阻等,其用途並無特別限制。The photosensitive resin composition of this specification can be used for pigment dispersion type photoresist, thin film transistor liquid crystal display (TFT LCD) or thin film transistor liquid crystal display (TFT LCD) color filter manufacturing Photoresist for black matrix formation of organic light-emitting diodes, photoresist for overcoat formation, photoresist for colomn spacer, photocurable paint, photocurable ink, photocurable adhesive, printing plate , The use of photoresist for printed wiring boards, plasma display panels (Plasma Display Panel, PDP), etc., is not particularly limited.
根據本說明書的一實施形態,提供一種包含所述光阻的彩色濾光片。According to an embodiment of this specification, a color filter including the photoresist is provided.
所述彩色濾光片可使用包含含有由所述化學式1表示的結構的黏合劑樹脂的感光性樹脂組成物製造而成。將所述感光性樹脂組成物塗佈於基板上,形成塗覆(coating)膜,對所述塗覆膜進行曝光、顯影及固化,藉此可形成彩色濾光片。The color filter can be manufactured using a photosensitive resin composition containing a binder resin containing the structure represented by the chemical formula 1. The photosensitive resin composition is coated on a substrate to form a coating film, and the coating film is exposed, developed, and cured, thereby forming a color filter.
所述基板可為玻璃板、矽晶圓及聚醚碸(Polyethersulfone,PES)、聚碳酸酯(Polycarbonate,PC)等塑膠基材的板等,其種類並無特別限制。The substrate can be a glass plate, a silicon wafer, a polyethersulfone (PES), polycarbonate (Polycarbonate, PC) and other plastic substrate plates, etc., and the type is not particularly limited.
所述彩色濾光片可包含紅色圖案、綠色圖案、藍色圖案、黑色矩陣。The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.
根據又一實施形態,所述彩色濾光片可更包含外塗層。According to another embodiment, the color filter may further include an outer coating.
於彩色濾光片的彩色畫素之間,為了提升對比度,可配置被稱為黑色矩陣的格子狀的黑色圖案。作為黑色矩陣的材料,可使用鉻。該情況下,可利用以下方式:使鉻蒸鍍於玻璃基板整體上,並藉由蝕刻處理來形成圖案。但是,考慮到製程上的高成本、鉻的高反射率、由鉻的廢液引起的環境污染,亦可使用利用能夠進行微細加工的顏料分散法的樹脂黑色矩陣。In order to increase the contrast between the color pixels of the color filter, a grid-like black pattern called a black matrix can be arranged. As the material of the black matrix, chromium can be used. In this case, the following method can be used: chromium is vapor-deposited on the entire glass substrate, and a pattern is formed by etching. However, considering the high cost of the manufacturing process, the high reflectivity of chromium, and the environmental pollution caused by the waste liquid of chromium, a resin black matrix using a pigment dispersion method capable of fine processing can also be used.
所述黑色矩陣可使用黑色顏料或黑色染料作為顏色材料,例如可單獨使用碳黑,或者將碳黑與著色顏料混合使用,此時,由於將遮光性不足的著色顏料加以混合,故而有如下優點:即使顏色材料的量相對增加,膜的強度或者對基板的密著性亦不會降低。The black matrix can use black pigments or black dyes as color materials. For example, carbon black can be used alone, or carbon black can be mixed with coloring pigments. In this case, since coloring pigments with insufficient light-shielding properties are mixed, it has the following advantages : Even if the amount of color material is relatively increased, the strength of the film or the adhesion to the substrate will not decrease.
本說明書的一實施形態提供一種包含所述彩色濾光片的顯示裝置。An embodiment of this specification provides a display device including the color filter.
所述顯示裝置可為電漿顯示器面板(Plasma Display Panel,PDP)、發光二極體(Light Emitting Diode,LED)、有機發光元件(Organic Light Emitting Diode,OLED)、液晶顯示裝置(Liquid Crystal Display,LCD)、薄膜電晶體液晶顯示裝置(Thin Film Transistor-Liquid Crystal Display,LCD-TFT)以及陰極射線管(Cathode Ray Tube,CRT)中的任一者。The display device may be a plasma display panel (Plasma Display Panel, PDP), a light emitting diode (Light Emitting Diode, LED), an organic light emitting element (Organic Light Emitting Diode, OLED), a liquid crystal display device (Liquid Crystal Display, LCD), Thin Film Transistor-Liquid Crystal Display (LCD-TFT), and Cathode Ray Tube (CRT).
以下,為了對本說明書進行具體說明,列舉實施例來詳細地說明。但是,本說明書的實施例可變形為各種其他形態,本說明書的範圍並不解釋為限定於以下記述的實施例。本說明書的實施例是為了對本領域中有平均知識者更完整地說明本說明書而提供的。Hereinafter, in order to specifically explain this specification, examples are given for detailed description. However, the embodiments of this specification can be modified into various other forms, and the scope of this specification is not construed as being limited to the embodiments described below. The examples of this specification are provided for more complete description of this specification for those with average knowledge in the field.
>實施例>>Examples>
1.二苯並哌喃染料的合成實施例 [合成例1] 向25 g的N-甲基-2-吡咯啶酮(N-methyl-2-pyrrolidone)加入5 g的[A](12.34 mmol,1 eq)、7.48 g的2,6-二甲基苯胺(2,6-dimethylaniline)(61.692 mmol,5 eq),升溫至150℃並攪拌。在150℃下在4小時的持續時間內進行反應後,使其冷卻至常溫後,慢慢地添加至500 mL的1 M鹽酸(HCl)水溶液中。添加後在1小時的持續時間內攪拌後,對析出物進行減壓過濾。將過濾物加入至甲醇(MeOH)溶劑,在60℃下在1小時的持續時間內回流(reflux)後,進行減壓過濾。在真空烘箱(Vacuum oven)中進行乾燥得到3.07 g的[A-1](產率43.0%)。 離子化模式:大氣壓化學遊離(Atmospheric Pressure Chemical Ionization,APCI)+:m/z=574[M+H]+,準確質量(Exact Mass):5741. Synthesis Examples of Dibenzopyran Dyes [Synthesis Example 1] To 25 g of N-methyl-2-pyrrolidone (N-methyl-2-pyrrolidone) was added 5 g of [A] (12.34 mmol, 1 eq), 7.48 g of 2,6-dimethylaniline ( 2,6-dimethylaniline) (61.692 mmol, 5 eq), heated to 150°C and stirred. After the reaction was carried out at 150°C for a duration of 4 hours, it was allowed to cool to normal temperature and then slowly added to 500 mL of 1 M hydrochloric acid (HCl) aqueous solution. After the addition was stirred for a duration of 1 hour, the precipitate was filtered under reduced pressure. The filtrate was added to a methanol (MeOH) solvent, refluxed (reflux) for a duration of 1 hour at 60°C, and filtered under reduced pressure. It was dried in a vacuum oven to obtain 3.07 g of [A-1] (yield 43.0%). Ionization mode: Atmospheric Pressure Chemical Ionization (APCI)+: m/z=574[M+H]+, Exact Mass: 574
2.黏合劑合成實施例2. Binder synthesis example
[合成例2] 向反應容器加入甲基丙烯酸苄酯51.75 mol%、N-苯基馬來醯亞胺8.63 mol%、苯乙烯10.35 mol%、甲基丙烯酸29.28 mol%與溶劑混合,在氮環境下混合並升溫至60℃。之後,以黏合劑樹脂固體成分的總重量為基準投入10重量份的熱聚合起始劑V65(2,2-偶氮雙(2,4-二甲基戊腈)(2,2-Azobis(2,4-dimethylvaleronitrile))),使其反應16小時來製造黏合劑樹脂A。 所製造的黏合劑樹脂A的酸價為125 mg KOH/g,重量平均分子量為8,200。製造的黏合劑樹脂A具有下述所表示的結構單元。 [Synthesis Example 2] Add 51.75 mol% of benzyl methacrylate, 8.63 mol% of N-phenylmaleimide, 10.35 mol% of styrene, and 29.28 mol% of methacrylic acid to the reaction vessel and mix them with a solvent. Mix and warm to 60°C. After that, 10 parts by weight of the thermal polymerization initiator V65 (2,2-azobis(2,4-dimethylvaleronitrile) (2,2-Azobis()) was added based on the total weight of the solid content of the binder resin. 2,4-dimethylvaleronitrile))) and react for 16 hours to produce adhesive resin A. The acid value of the produced adhesive resin A was 125 mg KOH/g, and the weight average molecular weight was 8,200. The produced adhesive resin A has the structural unit shown below.
[合成例3] 向反應容器加入甲基丙烯酸17.7 mol%、甲基丙烯酸縮水甘油酯42.9 mol%、苯乙烯39.4 mol%,在氮環境下混合並升溫至60℃。以與所述合成例2相同的方法進行製造來製造黏合劑樹脂B。 所製造的黏合劑樹脂B的酸價為85 mg KOH/g,重量平均分子量為10,700。 製造的黏合劑樹脂B具有下述所表示的結構單元。 [Synthesis Example 3] 17.7 mol% of methacrylic acid, 42.9 mol% of glycidyl methacrylate, and 39.4 mol% of styrene were added to a reaction vessel, mixed in a nitrogen atmosphere, and heated to 60°C. The production was carried out in the same manner as in Synthesis Example 2 to produce the binder resin B. The acid value of the produced adhesive resin B was 85 mg KOH/g, and the weight average molecular weight was 10,700. The produced adhesive resin B has the structural unit shown below.
[合成例4] 投入苯乙烯36.49 mol%、甲基丙烯酸縮水甘油酯39.62 mol%、甲基丙烯酸酯18.80 mol%、二苯甲酮甲基丙烯酸酯5.10 mol%,以與合成例2相同的方法進行製造來製造黏合劑樹脂C。 所製造的黏合劑樹脂C的酸價為88 mg KOH/g,重量平均分子量為8,300。 製造的黏合劑樹脂C具有下述所表示的結構單元。 [Synthesis Example 4] 36.49 mol% of styrene, 39.62 mol% of glycidyl methacrylate, 18.80 mol% of methacrylate, and 5.10 mol% of benzophenone methacrylate were charged in the same method as in Synthesis Example 2. Manufacture to manufacture binder resin C. The acid value of the produced adhesive resin C was 88 mg KOH/g, and the weight average molecular weight was 8,300. The produced adhesive resin C has the structural unit shown below.
[合成例5] 投入苯乙烯29.87 mol%、甲基丙烯酸縮水甘油酯40.00 mol%、甲基丙烯酸酯20.02 mol%、二苯甲酮甲基丙烯酸酯10.12 mol%,以與合成例2相同的方法進行製造來製造黏合劑樹脂D。 所製造的黏合劑樹脂D的酸價為88 mg KOH/g,重量平均分子量為9,200。 製造的黏合劑樹脂D具有與黏合劑樹脂C相同的結構單元。[Synthesis Example 5] Add 29.87 mol% of styrene, 40.00 mol% of glycidyl methacrylate, 20.02 mol% of methacrylate, and 10.12 mol% of benzophenone methacrylate, and manufacture the adhesive in the same manner as in Synthesis Example 2. Agent resin D. The acid value of the produced adhesive resin D was 88 mg KOH/g, and the weight average molecular weight was 9,200. The manufactured adhesive resin D has the same structural unit as the adhesive resin C.
[合成例6] 投入苯乙烯36.49 mol%、甲基丙烯酸縮水甘油酯36.92 mol%、甲基丙烯酸酯18.80 mol%、N-(4-苯甲醯基苯基)甲基丙烯醯胺(N-(4-benzoylphenyl)methacrylamide)5.10 mol%,以與合成例2相同的方法進行製造來製造黏合劑樹脂E。 所製造的黏合劑樹脂E的酸價為78 mg KOH/g,重量平均分子量為7,900。 製造的黏合劑樹脂E具有下述所表示的結構單元。 [Synthesis Example 6] 36.49 mol% of styrene, 36.92 mol% of glycidyl methacrylate, 18.80 mol% of methacrylate, and N-(4-benzylphenyl)methacrylamide (N- (4-benzoylphenyl)methacrylamide) 5.10 mol%, produced in the same manner as in Synthesis Example 2 to produce the adhesive resin E. The acid value of the produced adhesive resin E was 78 mg KOH/g, and the weight average molecular weight was 7,900. The produced adhesive resin E has the structural unit shown below.
[合成例7] 投入苯乙烯36.49 mol%、甲基丙烯酸環己酯36.92 mol%、甲基丙烯酸酯18.80 mol%、二苯甲酮甲基丙烯酸酯5.10 mol%,以與合成例2相同的方法進行製造來製造黏合劑樹脂F。 所製造的黏合劑樹脂F的酸價為82 mg KOH/g,重量平均分子量為8,500。 製造的黏合劑樹脂F具有下述所表示的結構單元。 [Synthesis Example 7] 36.49 mol% of styrene, 36.92 mol% of cyclohexyl methacrylate, 18.80 mol% of methacrylate, and 5.10 mol% of benzophenone methacrylate were charged in the same method as in Synthesis Example 2. Manufacture to manufacture the adhesive resin F. The acid value of the produced adhesive resin F was 82 mg KOH/g, and the weight average molecular weight was 8,500. The produced adhesive resin F has the structural unit shown below.
[感光性樹脂組成物的製造][Manufacturing of photosensitive resin composition]
[比較例1]
混合下述表1所示的組成來製造比較例1的感光性樹脂組成物。
[表1]
[感光性樹脂組成物比較例2至比較例4及實施例1至實施例4的製造]
除根據下述表2記載所示應用黏合劑樹脂及光起始劑的種類及含量以外,以與所述表1記載的內容相同的成分及含量來製造比較例2至比較例4及實施例1至實施例4的感光性樹脂組成物。
[表2]
>實驗例>>Experimental example>
[基板製作] 將藉由所述實施例1至實施例4及比較例1至比較例4製造的感光性樹脂組成物旋塗(spincoating)於玻璃(5 cm×5 cm)上,於110℃下實施70秒前熱處理而形成膜。利用光罩(photo mask)於高壓水銀燈下以40 mJ/cm2 的能量對所述膜進行曝光後,利用氫氧化鉀(KOH)鹼水溶液對圖案進行顯影,並用蒸餾水清洗。去除蒸餾水後以230℃實施20分鐘後熱處理而得到彩色圖案。[Substrate production] The photosensitive resin composition manufactured by the above-mentioned Example 1 to Example 4 and Comparative Example 1 to Comparative Example 4 was spincoated on glass (5 cm×5 cm) at 110°C The heat treatment before 70 seconds is performed to form a film. After exposing the film with a photo mask under a high-pressure mercury lamp with an energy of 40 mJ/cm 2 , the pattern was developed with an alkaline aqueous solution of potassium hydroxide (KOH) and washed with distilled water. After removing distilled water, post-heat treatment was performed at 230°C for 20 minutes to obtain a color pattern.
[耐熱性評估] 針對在如上所述的條件下製造的經後熱處理的基板,利用分光光度計(MCPD,大塚股份有限公司(Otsuka Co.,Ltd))得到380 nm至780 nm波長範圍的吸收光譜。 追加性地在230℃下對經後熱處理的基板處理120分鐘,在相同的設備與相同的測定範圍下得到透射率光譜。 使用由將C光源作為背光得到的吸收光譜得到的值L*、a*、b*,藉由下述算式1計算ΔEab(耐熱性),並示於下述表3。 [算式1] ΔEab(L*,a*,b*) = {(ΔL*)2 +(Δa*)2 +(Δb*)2 }1/2 ΔEab值小為顏色變化小的含義,表示耐熱性優異。[Evaluation of heat resistance] For the post-heat-treated substrates manufactured under the conditions described above, a spectrophotometer (MCPD, Otsuka Co., Ltd) was used to obtain absorption in the wavelength range of 380 nm to 780 nm spectrum. The post-heat-treated substrate was additionally processed at 230°C for 120 minutes, and the transmittance spectrum was obtained under the same equipment and the same measurement range. Using the values L*, a*, and b* obtained from the absorption spectrum obtained by using the C light source as a backlight, ΔEab (heat resistance) was calculated by the following formula 1 and shown in Table 3 below. [Equation 1] ΔEab(L*, a*, b*) = {(ΔL*) 2 +(Δa*) 2 +(Δb*) 2 } 1/2 ΔEab value means small color change, which means heat resistance Excellent performance.
[耐化學性評估]
將進行一次後熱處理的基板剪為1 cm×5 cm後,利用分光光度計(MCPD,大塚股份有限公司(Otsuka Co.,Ltd))測定380 nm至780 nm波長範圍的吸收光譜。
得到光譜後,將其浸漬於16 g的N-甲基-2-吡咯啶酮(N-methyl-2-pyrrolidone)溶劑,之後在常溫下放置10分鐘後,利用蒸餾水乾淨地清洗。在相同的設備與相同的測定範圍下得到透射率光譜。
利用浸漬前後的光譜應用所述[算式1]進行計算,將ΔEab(耐化學性)示於下述表3。
ΔEab值小為顏色變化小的含義,表示耐化學性優異。
[表3]
根據所述表3確認,與比較例1至比較例4相比,實施例1至實施例4的ΔEab值小,藉由利用本說明書的一實施形態的耐熱性及耐化學性優異的感光性樹脂組成物可得到彩色濾光片。According to Table 3, it is confirmed that the ΔEab values of Examples 1 to 4 are smaller than those of Comparative Examples 1 to 4, and the photosensitivity that is excellent in heat resistance and chemical resistance by using one embodiment of this specification The resin composition can obtain a color filter.
無no
無no
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2018-0146358 | 2018-11-23 | ||
KR1020180146358A KR102216766B1 (en) | 2018-11-23 | 2018-11-23 | Photosensitive resin composition, photoresist, color filter and display device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202022499A true TW202022499A (en) | 2020-06-16 |
TWI725631B TWI725631B (en) | 2021-04-21 |
Family
ID=70773853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108142648A TWI725631B (en) | 2018-11-23 | 2019-11-22 | Photosensitive resin composition, photoresist, color filter and display device |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR102216766B1 (en) |
CN (1) | CN112204465B (en) |
TW (1) | TWI725631B (en) |
WO (1) | WO2020106095A1 (en) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0987534A (en) | 1995-09-25 | 1997-03-31 | Konica Corp | Ink jet recording fluid |
DE10323685A1 (en) | 2003-05-22 | 2004-12-09 | Rühe, Jürgen, Prof. Dr. | Process for the covalent immobilization of probe biomolecules on organic surfaces |
CN101126902B (en) * | 2006-08-17 | 2011-06-15 | 达兴材料股份有限公司 | Photosensitive resin composition |
KR100835605B1 (en) | 2007-06-19 | 2008-06-09 | 제일모직주식회사 | Thermosetting resin composition for color filter of cmos image sensor and color filter using the composition, and cmos image sensor using the color filter |
TWI455952B (en) * | 2010-12-16 | 2014-10-11 | Agi Corp | Crosslinkable liquid benzophenone (meth) acrylate |
EP2607382A1 (en) * | 2011-12-22 | 2013-06-26 | Philipps Universität Marburg | Chemically functionalised electrospun dispersion fibres for layer-by-layer coatings |
JP6374172B2 (en) * | 2014-01-31 | 2018-08-15 | 富士フイルム株式会社 | Colored composition, cured film using the same, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, image display device, and dye multimer |
JP6799949B2 (en) | 2015-07-21 | 2020-12-16 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | Color curable resin composition, color filter and display device |
KR102067858B1 (en) * | 2016-05-24 | 2020-01-17 | 주식회사 엘지화학 | Compound, colorant composition comprising the same and resin composition comprising the same |
KR102092438B1 (en) * | 2016-07-26 | 2020-03-23 | 주식회사 엘지화학 | Photosensitive resin composition and color filter comprising same |
KR102247290B1 (en) * | 2018-07-27 | 2021-04-30 | 주식회사 엘지화학 | Binder resin, photosensitive resin composition, pothoresist, color filter and display device |
-
2018
- 2018-11-23 KR KR1020180146358A patent/KR102216766B1/en active IP Right Grant
-
2019
- 2019-11-22 TW TW108142648A patent/TWI725631B/en active
- 2019-11-22 CN CN201980036391.3A patent/CN112204465B/en active Active
- 2019-11-22 WO PCT/KR2019/016119 patent/WO2020106095A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CN112204465A (en) | 2021-01-08 |
CN112204465B (en) | 2024-04-02 |
TWI725631B (en) | 2021-04-21 |
WO2020106095A1 (en) | 2020-05-28 |
KR20200061035A (en) | 2020-06-02 |
KR102216766B1 (en) | 2021-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6579452B2 (en) | Compound, coloring material composition containing the same, and resin composition containing the same | |
TWI631422B (en) | Photosensitive resin composition, photosensitive material, color filter and display device | |
TWI675830B (en) | Xanthene-based compound, colorant composition comprising the same and resin composition comprising the same | |
TWI622586B (en) | Compound, colorant composition comprising the same and resin composition comprising the same, photosensitive material, color filter, display device | |
TWI764041B (en) | Compound, colorant composition, photoresist, color filter and display device | |
TWI669346B (en) | Photosensitive resin composition, photosensitive material, color filter and display device | |
TW201811926A (en) | Photosensitive resin composition, photosensitive material, color filter and display device capable of improving color purity, color reproduction, brightness, and contrast ratio | |
JP6604606B2 (en) | Compound, coloring material composition containing the same, and resin composition containing the same | |
JP2017203161A (en) | Compound, colorant composition comprising the same, and resin composition comprising the same | |
JP2019523760A (en) | Compound and photosensitive resin composition containing the same | |
TW202010814A (en) | Binder resin, photosensitive resin composition, photoresist, color filter and display device | |
KR102662536B1 (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
TWI725631B (en) | Photosensitive resin composition, photoresist, color filter and display device | |
KR20200069070A (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
TWI761701B (en) | Colorant composition, photoresist, color filter and display device | |
TWI813834B (en) | Photosensitive resin composition, photoresist, color filter and display device | |
TW202024243A (en) | Photosensitive resin composition, photoresist, color filter and display device | |
TW201942255A (en) | Quinophthalone-based compound, photosensitive resin composition, photoresist, color filter, and display device comprising the same | |
KR102718652B1 (en) | Compound, photosensitive resin composition comprising the same, photoresist, color filter and display device | |
TWI705063B (en) | Xanthene-based compound, colorant composition, photosensitive resin composition, photosensitive material, color filter and display device | |
JP2018028072A (en) | Compound, colorant composition comprising the same and resin composition comprising the same | |
KR102683195B1 (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
JP6915767B2 (en) | Compounds, polymers, color material compositions, resin compositions, color filters and display devices | |
TWI679200B (en) | Xanthene-based compound, photosensitive resin composition, photoresist, color filter, and display device comprising the same |