TW202021699A - Apparatus for slicing an ingot and method of slicing an ingot - Google Patents
Apparatus for slicing an ingot and method of slicing an ingot Download PDFInfo
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- TW202021699A TW202021699A TW108140776A TW108140776A TW202021699A TW 202021699 A TW202021699 A TW 202021699A TW 108140776 A TW108140776 A TW 108140776A TW 108140776 A TW108140776 A TW 108140776A TW 202021699 A TW202021699 A TW 202021699A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
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Abstract
Description
本發明涉及半導體製造領域,具體而言涉及一種晶棒切片裝置和方法。The present invention relates to the field of semiconductor manufacturing, in particular to an ingot slicing device and method.
目前,晶棒的切割以鋼線帶動漿料進行的機械線切割為主。其原理是通過一根高速運動的鋼線帶動附著在鋼線上的切割刃料對矽棒進行摩擦,從而達到切割效果。由於線切割過程中採用鋼線,其容易引入如Cu、Fe等污染物。同時,採用線切割工藝對晶棒進行切割,無法避免產生截口損失。At present, the cutting of ingots is dominated by mechanical wire cutting in which steel wires drive slurry. The principle is to use a high-speed steel wire to drive the cutting blade material attached to the steel wire to rub the silicon rod to achieve the cutting effect. Since steel wire is used in the wire cutting process, it is easy to introduce contaminants such as Cu and Fe. At the same time, the wire cutting process is used to cut the ingot, which cannot avoid the loss of section.
一種改進的晶棒切割方法是採用電解法對晶棒進行電化學切割。通過將晶棒和線狀電極同時設置在容納有電解質的電解裝置的陽極和陰極,在陰極和陽極之間施加直流電源的情況下,線狀電極與晶棒上與線狀電極相對應的部分發生電解反應,使晶棒被切割。這一過程中在設置為線狀電極的陰極上往往發生析氫的電化學反應,然而析出的氫氣往往吸附線狀電極上,導致線狀電極表面反應活性下降,使後續晶棒切割的電化學反應效率下降甚至無法進行,影響晶棒切割效果。An improved method for cutting ingots is to electrochemically cut the ingots by electrolysis. By arranging the ingot and the wire electrode at the anode and the cathode of the electrolytic device containing the electrolyte at the same time, the wire electrode and the portion of the ingot corresponding to the wire electrode when the DC power is applied between the cathode and the anode An electrolysis reaction occurs, causing the crystal rod to be cut. In this process, the electrochemical reaction of hydrogen evolution often occurs on the cathode set as the linear electrode. However, the precipitated hydrogen is often adsorbed on the linear electrode, resulting in a decrease in the surface reaction activity of the linear electrode, and the electrochemical reaction of the subsequent crystal bar cutting The efficiency drops or even cannot be carried out, which affects the ingot cutting effect.
為此,有必要提出一種新的晶棒切片裝置和方法,用以解決現有技術中的問題。For this reason, it is necessary to propose a new crystal rod slicing device and method to solve the problems in the prior art.
在發明內容部分中引入了一系列簡化形式的概念,這將在具體實施方式部分中進一步詳細說明。本發明的發明內容部分並不意味著要試圖限定出所要求保護的技術方案的關鍵特徵和必要技術特徵,更不意味著試圖確定所要求保護的技術方案的保護範圍。A series of simplified concepts are introduced in the content of the invention, which will be explained in further detail in the detailed implementation section. The inventive content part of the present invention does not mean an attempt to limit the key features and necessary technical features of the claimed technical solution, nor does it mean an attempt to determine the protection scope of the claimed technical solution.
本發明提供了一種晶棒切片裝置,該裝置包括:電源,該電源輸出直流電和交流電;電解池,用於存放電解質;陽極,該陽極包括晶棒,該晶棒與該電源輸出的該直流電的正極電性連接;陰極,包括至少一線狀電極,該線狀電極容置於該電解池內並與該電源輸出的該直流電的負極電性連接,該線狀電極的長度方向與該晶棒的軸向交叉設置,並且該線狀電極與該晶棒不接觸;支撐裝置,用以控制該線狀電極與該晶棒之間的相對位置;其中,當該電源輸出該直流電時該支撐裝置控制該線狀電極與該晶棒之間的相對位置實現彼此靠近的相對運動,通過該彼此靠近的相對運動實現晶棒切片過程,在該晶棒切片過程中該線狀電極上發生電化學反應析出氣體,當該電源輸出該交流電時,該支撐裝置控制該線狀電極與該晶棒之間的相對位置停止該晶棒切片過程,該線狀電極上的該氣體脫附。The present invention provides a crystal rod slicing device. The device includes: a power source that outputs direct current and alternating current; an electrolytic cell for storing electrolyte; an anode, the anode includes a crystal rod, and the crystal rod and the direct current output from the power source The positive electrode is electrically connected; the cathode includes at least one linear electrode contained in the electrolytic cell and electrically connected to the negative electrode of the direct current output from the power supply. The length direction of the linear electrode is connected to that of the crystal rod. Axial cross-arrangement, and the linear electrode does not contact the crystal rod; the supporting device is used to control the relative position between the linear electrode and the crystal rod; wherein, when the power source outputs the direct current, the supporting device controls The relative position between the wire electrode and the crystal rod realizes the relative movement close to each other, and the crystal rod slicing process is realized by the relative movement close to each other. During the crystal rod slicing process, an electrochemical reaction occurs on the wire electrode to precipitate When the power source outputs the alternating current, the supporting device controls the relative position between the linear electrode and the crystal rod to stop the crystal rod slicing process, and the gas on the linear electrode desorbs.
示例性地,該電源輸出電壓的範圍為0-50V,輸出電流的範圍為0-10A。Exemplarily, the range of the output voltage of the power supply is 0-50V, and the range of the output current is 0-10A.
示例性地,該交流電源的頻率範圍為0-1000Hz。Exemplarily, the frequency range of the AC power supply is 0-1000 Hz.
示例性地,該電源還包括調整該交流電的波形的裝置。Exemplarily, the power supply further includes a device for adjusting the waveform of the alternating current.
示例性地,當該電源輸出該交流電時,該支撐裝置控制該線狀電極與該晶棒之間的相對位置實現彼此遠離的相對運動或者相對靜止,通過該彼此遠離的相對運動或者該相對靜止停止該晶棒切片過程。Exemplarily, when the power supply outputs the alternating current, the supporting device controls the relative position between the linear electrode and the crystal rod to realize a relative movement away from each other or relatively static, through the relative movement away from each other or the relative static Stop the ingot slicing process.
示例性地,該支撐裝置包括在陰極上設置的線狀電極支撐裝置,該線狀電極支撐裝置控制該線狀電極沿著該晶棒的徑向移動實現該彼此靠近的相對運動或者該彼此遠離的相對運動,該線狀電極支撐裝置控制該線狀電極停止移動實現該相對靜止。Exemplarily, the supporting device includes a linear electrode supporting device arranged on the cathode, and the linear electrode supporting device controls the linear electrode to move along the radial direction of the crystal rod to realize the relative movement close to each other or to move away from each other. The linear electrode supporting device controls the linear electrode to stop moving to realize the relative static.
示例性地,該線狀電極支撐裝置包括至少兩個導輥,該導輥轉動帶動該線狀電極沿著該線狀電極的長度方向移動。Exemplarily, the linear electrode supporting device includes at least two guide rollers, and the rotation of the guide roller drives the linear electrode to move along the length direction of the linear electrode.
示例性地,該支撐裝置包括在該陽極上設置的晶棒支撐裝置,該晶棒支撐裝置控制該晶棒沿著徑向移動實現該彼此靠近的相對運動或者彼此遠離的相對運動,該晶棒支撐裝置控制該晶棒停止移動實現該相對靜止。Exemplarily, the support device includes an ingot support device provided on the anode, the ingot support device controls the ingot to move in a radial direction to achieve the relative movement close to each other or the relative movement away from each other, the ingot The supporting device controls the crystal rod to stop moving to realize the relative stillness.
示例性地,該晶棒支撐裝置包括第一部分與第二部分,該第一部分與該電源電性連接,該第二部分為梳齒結構。Exemplarily, the crystal rod supporting device includes a first part and a second part, the first part is electrically connected to the power source, and the second part is a comb tooth structure.
本發明還提供了一種晶棒切片方法,包括:步驟S1:將晶棒至少部分浸沒於包含電解質的電解池中,該電解池中設置有包含一線狀電極的陰極;步驟S2:調整該晶棒與該陰極之間的相對位置,以使該晶棒的軸向與該線狀電極的長度方向交叉設置,並且該晶棒與該線狀電極不接觸;步驟S3:在該晶棒和該陰極之間接通電源的同時控制該晶棒和該線狀電極之間的相對位置實現對該晶棒的切片,其中,該步驟S3包括:步驟S31:在第一時間段內,該電源輸出直流電,該晶棒接通該直流電源的正極,該陰極接通該直流電源的負極,控制該晶棒和該線狀電極之間的相對位置實現彼此靠近的相對運動,通過該彼此靠近的相對運動實現晶棒切片過程,在該晶棒切片過程中該線狀電極上發生電化學反應析出氣體;步驟S32:在第二時間段內,該電源輸出交流電,控制該晶棒和該線狀電極之間的相對位置停止該晶棒切片過程,該線狀電極上的該氣體脫附;迴圈執行該步驟S31、和步驟S32,直至對該晶棒完成切片。The present invention also provides a crystal rod slicing method, which includes: step S1: at least partially immersing the crystal rod in an electrolytic cell containing electrolyte, and the electrolytic cell is provided with a cathode containing a linear electrode; step S2: adjusting the crystal rod The relative position between the crystal rod and the cathode is such that the axial direction of the crystal rod crosses the length direction of the linear electrode, and the crystal rod does not contact the linear electrode; step S3: the crystal rod and the cathode The relative position between the crystal rod and the linear electrode is controlled while connecting the power supply to realize the slicing of the crystal rod, wherein the step S3 includes: step S31: in the first time period, the power supply outputs direct current, The crystal rod is connected to the positive electrode of the DC power supply, and the cathode is connected to the negative electrode of the DC power supply. The relative position between the crystal rod and the linear electrode is controlled to realize the relative movement close to each other, which is realized by the relative movement close to each other. During the slicing process of the crystal rod, an electrochemical reaction occurs on the linear electrode to precipitate gas; step S32: in the second time period, the power supply outputs alternating current, and the control between the crystal rod and the linear electrode Stop the slicing process of the crystal rod, and the gas on the linear electrode is desorbed; perform step S31 and step S32 in a loop until the crystal rod is sliced.
根據本發明的晶棒切片裝置和方法,電源可以同時輸出交流電和直流電,在陰極和陽極之間接通直流電時,通過支撐裝置控制線狀電極與晶棒之間的相對位置實現彼此靠近的相對運動實現晶棒切片過程,當在陽極和陰極之間接通該交流電時,通過支撐裝置控制線狀電極與晶棒之間的相對位置停止該晶棒切片過程,此時線狀電極上不發生電化學反應使H2 從線狀電極上脫除,並且由於線狀電極上載入的交流電使陰極上發生電性改變,這一過程使線狀電極上吸附的H2 快速脫除,有效解決了氫氣吸附線狀電極上而影響陰極電化學反應的效率的問題,保證了晶棒切割的效率和品質。According to the crystal rod slicing device and method of the present invention, the power supply can output alternating current and direct current at the same time. When the direct current is connected between the cathode and the anode, the relative position between the linear electrode and the crystal rod is controlled by the supporting device to realize the relative movement close to each other. Realize the crystal rod slicing process. When the alternating current is connected between the anode and the cathode, the relative position between the linear electrode and the crystal rod is controlled by the supporting device to stop the crystal rod slicing process. At this time, no electrochemistry occurs on the linear electrode. The reaction removes H 2 from the linear electrode, and the alternating current loaded on the linear electrode causes electrical changes on the cathode. This process quickly removes the H 2 adsorbed on the linear electrode, effectively eliminating hydrogen The problem of adsorbing on the linear electrode and affecting the efficiency of the electrochemical reaction of the cathode ensures the efficiency and quality of the ingot cutting.
在下文的描述中,給出了大量具體的細節以便提供對本發明更為徹底的理解。然而,對於本領域技術人員而言顯而易見的是,本發明可以無需一個或多個這些細節而得以實施。在其他的例子中,為了避免與本發明發生混淆,對於本領域公知的一些技術特徵未進行描述。In the following description, a lot of specific details are given to provide a more thorough understanding of the present invention. However, it is obvious to those skilled in the art that the present invention can be implemented without one or more of these details. In other examples, in order to avoid confusion with the present invention, some technical features known in the art are not described.
為了徹底理解本發明,將在下列的描述中提出詳細的描述,以說明本發明該的晶棒切片裝置。顯然,本發明的施行並不限於半導體領域的技術人員所熟習的特殊細節。本發明的較佳實施例詳細描述如下,然而除了這些詳細描述外,本發明還可以具有其他實施方式。In order to thoroughly understand the present invention, a detailed description will be provided in the following description to illustrate the ingot slicing device of the present invention. Obviously, the implementation of the present invention is not limited to the specific details familiar to those skilled in the semiconductor field. The preferred embodiments of the present invention are described in detail as follows. However, in addition to these detailed descriptions, the present invention may also have other embodiments.
應予以注意的是,這裡所使用的術語僅是為了描述具體實施例,而非意圖限制根據本發明的示例性實施例。如在這裡所使用的,除非上下文另外明確指出,否則單數形式也意圖包括複數形式。此外,還應當理解的是,當在本說明書中使用術語“包含”和/或“包括”時,其指明存在該特徵、整體、步驟、操作、元件和/或元件,但不排除存在或附加一個或多個其他特徵、整體、步驟、操作、元件、元件和/或它們的組合。It should be noted that the terms used here are only for describing specific embodiments, and are not intended to limit the exemplary embodiments according to the present invention. As used herein, unless the context clearly dictates otherwise, the singular form is also intended to include the plural form. In addition, it should also be understood that when the terms "comprising" and/or "including" are used in this specification, they indicate the presence of the feature, whole, step, operation, element, and/or element, but do not exclude the presence or addition One or more other features, wholes, steps, operations, elements, elements and/or combinations thereof.
現在,將參照附圖更詳細地描述根據本發明的示例性實施例。然而,這些示例性實施例可以多種不同的形式來實施,並且不應當被解釋為只限於這裡所闡述的實施例。應當理解的是,提供這些實施例是為了使得本發明的公開徹底且完整,並且將這些示例性實施例的構思充分傳達給本領域普通技術人員。在附圖中,為了清楚起見,誇大了層和區域的厚度,並且使用相同的附圖標記表示相同的元件,因而將省略對它們的描述。Now, exemplary embodiments according to the present invention will be described in more detail with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many different forms, and should not be construed as being limited to the embodiments set forth herein. It should be understood that these embodiments are provided to make the disclosure of the present invention thorough and complete, and to fully convey the concept of these exemplary embodiments to those of ordinary skill in the art. In the drawings, the thicknesses of layers and regions are exaggerated for clarity, and the same reference numerals are used to denote the same elements, and thus their descriptions will be omitted.
為了解決現有技術中的技術問題,本發明提供了一種晶棒切片裝置,該裝置包括:電源,該電源輸出直流電和交流電;電解池,用於存放電解質;陽極,該陽極包括晶棒,該晶棒與該電源輸出的該直流電的正極電性連接;陰極,包括至少一線狀電極,該線狀電極容置於該電解池內並與該電源輸出的該直流電的負極電性連接,該線狀電極的長度方向與該晶棒的軸向交叉設置,並且該線狀電極與該晶棒不接觸;支撐裝置,用以控制該線狀電極與該晶棒之間的相對位置;其中,當該電源輸出該直流電時該支撐裝置控制該線狀電極與該晶棒之間的相對位置實現彼此靠近的相對運動,通過該彼此靠近的相對運動實現晶棒切片過程,在該晶棒切片過程中該線狀電極上發生電化學反應析出氣體,當該電源輸出該交流電時,該支撐裝置控制該線狀電極與該晶棒之間的相對位置停止該晶棒切片過程,該線狀電極上的該氣體脫附。In order to solve the technical problems in the prior art, the present invention provides a crystal rod slicing device, which includes: a power supply, the power supply outputs direct current and alternating current; an electrolytic cell for storing electrolyte; an anode, the anode includes a crystal rod, the crystal The rod is electrically connected to the positive pole of the direct current output from the power supply; the cathode includes at least one linear electrode which is contained in the electrolytic cell and is electrically connected to the negative pole of the direct current output from the power supply. The length direction of the electrode crosses the axial direction of the crystal rod, and the linear electrode is not in contact with the crystal rod; the supporting device is used to control the relative position between the linear electrode and the crystal rod; wherein, when the When the power supply outputs the direct current, the supporting device controls the relative position between the linear electrode and the crystal rod to achieve relative movement close to each other, and realizes the crystal rod slicing process through the close relative movement. An electrochemical reaction occurs on the linear electrode to produce gas. When the power source outputs the alternating current, the supporting device controls the relative position between the linear electrode and the crystal rod to stop the slicing process of the crystal rod. Gas desorption.
實施例一Example one
下面參看圖1和圖2對本發明所提出的一種晶棒切片裝置進行示例性說明,圖1為根據本發明的一個實施例的一種晶棒切片裝置的結構示意圖;圖2為圖1中晶棒相對於線狀電極設置的正面示意圖。The following is an exemplary description of the ingot slicing device proposed by the present invention with reference to Figs. 1 and 2. Fig. 1 is a schematic diagram of the structure of an ingot slicing device according to an embodiment of the present invention; Fig. 2 is the ingot slicing device in Fig. 1 A schematic front view of the arrangement relative to the linear electrode.
首先,參看圖1,根據本發明的一個實施例的晶棒切片裝置包括電源100、電解池200、以及分別與電源100的電性相連的陽極和陰極。First, referring to FIG. 1, an ingot slicing device according to an embodiment of the present invention includes a
該電源100輸出直流電和交流電。該電源可以是任何可以同時提供直流功率和交流功率的裝置。在一個示例中,該電源包括交流電源和與該交流電源相連的交流轉直流裝置,通過交流轉直流裝置的開啟和關閉分別提供直流電和交流電。在一個示例中,該電源包括直流電源和交流電源以及兩者之間設置的開關元件,通過開關元件控制陰極和陽極之間連接交流電源還是直流電源從而控制電源輸出直流電還是交流電。參看圖1,本實施例中,電源100包括直流電源101、交流電源102以及連接在直流電源101和交流電源102之間的開關元件103。當開關元件103接通直流電源101端時,電源100輸出直流電,當開關元件103接通交流電源102端時,電源100輸出交流電。The
需要理解的是,本實施例中電源設置為直流電源、交流電源和開關元件以使電源輸出直流電和交流電僅僅是示例性地,本領域技術人員應當理解,任何可以輸出直流電和交流電的電源均適用于本發明。It should be understood that the power supply in this embodiment is set to DC power, AC power, and switching elements so that the power supply can output DC and AC power is only exemplary. Those skilled in the art should understand that any power supply that can output DC and AC power is applicable. In the present invention.
電解池200中包括電解質201,該電解質201用以在直流電源的作用下與矽晶棒發生電化學反應。The
該陽極包括晶棒300,其中晶棒300與電源100輸出的直流電的正極電性連接。在本實施例中,晶棒300與電源100中的直流電源101的正極電性連接。The anode includes an
該陰極容置於電解池200內並且包括至少一線狀電極400。線狀電極400的長度方向與晶棒300的軸向交叉設置,並且線狀電極400與晶棒300不接觸。線狀電極400與電源100輸出的直流電的負極電性連接,在本實施例中,線狀電極400與電源100中的直流電源101的負極電性連接。The cathode is contained in the
參看圖2,示出了線狀電極相對晶棒設置的正面示意圖,其中線狀電極400容置於電解池200的電解質201內,線狀電極400的長度方向相對晶棒300的軸向垂直設置,並且線狀電極400與晶棒300不接觸。在上述電源、電解池、陰極和陽極的設置形式下,通過線狀電極400與晶棒300間的彼此靠近的相對運動實現晶棒300的切片。Referring to FIG. 2, there is shown a schematic front view of the arrangement of the linear electrode relative to the crystal rod, wherein the
示例性地,該線狀電極400的材料可以是任何非金屬導電材料。具體的,線狀電極400的材料可以設置為碳纖維、碳包覆的金屬線等。示例性地,該線狀電極的直徑的範圍為50-150µm。Exemplarily, the material of the
示例性地,該電解質201包括包含氫氟酸的溶液。將線狀電極400的長度方向與晶棒300的軸向交叉設置,並且線狀電極400與晶棒300不接觸,在電源100在陰極和陽極之間施加電壓或電流時,線狀電極400與晶棒300上相對線狀電極400設置的部分發生電化學反應。其中,位於陽極上的晶棒發生如下電化學反應:
在陰極線狀電極上發生如下電化學反應: Illustratively, the
採用電化學的方法進行切割,相較於採用切割線的機械切割方法,有效減少了晶棒切割過程中的截口損失,同時,採用電化學切割晶棒的方法實現非接觸切割,有效避免了機械損傷、晶圓翹曲以及接觸切割產生的污染。同時,採用電化學切割後的晶圓,不需要進一步進行化學蝕刻等處理,大大簡化了切割後的晶圓的處理流程。The electrochemical method is used for cutting. Compared with the mechanical cutting method using the cutting wire, the cut loss during the cutting of the ingot is effectively reduced. At the same time, the electrochemical method of cutting the ingot to achieve non-contact cutting is effectively avoided. Mechanical damage, wafer warpage, and contamination from contact cutting. At the same time, the use of electrochemically cut wafers does not require further processing such as chemical etching, which greatly simplifies the processing flow of the cut wafers.
由於在上述電化學反應中,陰極上析出H2
,H2
往往吸附線狀電極400上,使得線狀電極400表面反應活性降低,影響後續電化學反應效率,進而影響晶棒切片速率和切片品質。本發明將電源設置為可以輸出直流電和交流電,控制線狀電極與晶棒之間的相對位置實現彼此靠近的相對運動,使電源輸出直流電以使晶棒和線狀電極之間發生電化學反應並伴隨著彼此靠近的相對運動而實現晶棒的切割;隨著晶棒切割的進行,陰極的線狀電極上析出H2
並累積吸附線狀電極上,使電源輸出交流電時控制線狀電極和晶棒之間的相對位置實現彼此遠離的相對運動或者相對靜止,此時線狀電極上不發生電化學反應而使H2
從線狀電極上脫除,並且由於線狀電極上載入的交流電使陰極上發生電性改變,這一過程使線狀電極上吸附的H2
快速脫除,有效解決了氫氣吸附線狀電極上而影響陰極電化學反應的效率的問題,保證了晶棒切割的效率和品質。In the above electrochemical reaction, H 2 is precipitated on the cathode, and H 2 is often adsorbed on the
示例性地,該電源輸出電壓的範圍為0-50V,輸出電流的範圍為0-10A。通過調整電源的輸出電壓和電流配合晶棒切片的數量可以調整晶棒的切片速率。示例性地,該交流電源的頻率範圍為0-1000Hz。進一步,該電源還包括調整該交流電的波形的裝置,從而使該電源輸出的交流電具有不同的波形,如矩形、正弦、三角波等。通過輸出的不同的頻率或波形的交流電可以在不同切片速率下匹配不同H2 的脫除速率,從而使晶棒切片速率提升。Exemplarily, the range of the output voltage of the power supply is 0-50V, and the range of the output current is 0-10A. The slicing rate of the ingot can be adjusted by adjusting the output voltage and current of the power supply to match the number of ingot slices. Exemplarily, the frequency range of the AC power supply is 0-1000 Hz. Further, the power supply also includes a device for adjusting the waveform of the alternating current, so that the alternating current output by the power supply has different waveforms, such as rectangular, sine, and triangular waves. By outputting alternating currents of different frequencies or waveforms, different H 2 removal rates can be matched at different slicing rates, thereby increasing the ingot slicing rate.
示例性地,本發明通過設置支撐晶棒或者支撐線狀電極的支撐裝置控制晶棒與線狀電極之間的相對運動,實現該彼此靠近的相對運動、該彼此遠離的相對運動或者該相對靜止。Exemplarily, the present invention controls the relative movement between the crystal rod and the linear electrode by providing a support device that supports the crystal rod or the linear electrode, so as to realize the relative movement close to each other, the relative movement away from each other, or the relative static .
示例性地,該支撐裝置包括在陰極上設置的線狀電極支撐裝置,該線狀電極支撐裝置控制該線狀電極沿著該晶棒的徑向移動實現該彼此靠近的相對運動或者彼此遠離的相對運動,該線狀電極支撐裝置控制該線狀電極停止運動實現該相對靜止。在這一情況中,晶棒始終處於靜止狀態。如圖1所示,支撐裝置包括在陰極上設置的線狀電極支撐裝置401。線狀電極支撐裝置401支撐線狀電極400並控制線狀電極400沿著晶棒300的徑向移動實現線狀電極400與晶棒300之間的彼此靠近的相對運動或者彼此遠離的相對運動,線狀電極支撐裝置401支撐線狀電極400停止移動時實現線狀電極400與晶棒300之間的相對靜止。Exemplarily, the supporting device includes a linear electrode supporting device provided on the cathode, and the linear electrode supporting device controls the linear electrode to move along the radial direction of the crystal rod to realize the relative movement close to each other or to move away from each other. In relative motion, the linear electrode supporting device controls the linear electrode to stop moving to achieve the relative static. In this case, the crystal rod is always at rest. As shown in FIG. 1, the supporting device includes a linear
需要理解的是,本實施例將支撐裝置設置為線狀電極支撐裝置僅僅是示例性地,本領域技術人員應當理解,任何可以控制線狀電極和晶棒之間相對位置的裝置均能夠實現本發明。It should be understood that the setting of the supporting device as the linear electrode supporting device in this embodiment is only exemplary, and those skilled in the art should understand that any device that can control the relative position between the linear electrode and the crystal rod can achieve this invention.
示例性地,該線狀電極支撐裝置401還控制該線狀電極400沿著其長度方向移動。為此採用線狀電極支撐裝置401支撐線狀電極400在長度方向上移動,使得吸附線狀電極400表面的H2
隨著線狀電極的移動而脫除,進一步加快了H2
的脫除效率,進一步改善了H2
吸附線狀電極表面對電化學切割帶來的影響。Exemplarily, the linear
示例性地,該線狀電極支撐裝置包括至少兩個導輥。如圖1所示,線狀電極支撐裝置401設置為兩個導輥,通過導輥的轉動,導輥帶動線狀電極400在長度方向上移動。將線狀電極支撐裝置401設置為導輥一方面對線狀電極400起到支撐作用,使線狀電極400呈拉緊狀態,另一方面通過導輥的轉動帶動線狀電極400沿長度方向上移動,在這種設置形式下線狀電極在移動通過導輥的時候通過與導輥的接觸使吸附線狀電極上的H2
完全脫附,使得H2
的脫附效率高。Illustratively, the linear electrode supporting device includes at least two guide rollers. As shown in FIG. 1, the linear
參看圖3,示出了圖2中晶棒相對於線狀電極以及線狀電極支撐裝置設置的正面示意圖,其中,線狀電極400容置於電解池200的電解質201內,線狀電極400的延伸方向相對晶棒300的軸向垂直設置,並且線狀電極400與晶棒300不接觸。設置成導輥的線狀電極支撐裝置401沿著箭頭C-C所示的方向轉動,帶動線狀電極400沿著其長度延伸方向運動,從而使電化學反應中吸附在其表面的H2
脫附。示例性地,該導輥的材料包括石墨、碳包覆的金屬材料和導電陶瓷。在本實施例中,該導輥的材料設置為石墨。示例性地,導輥帶動該線狀電極轉動的線速度範圍為0 -10mm/s。Referring to FIG. 3, there is shown a schematic front view of the crystal rod in FIG. 2 relative to the linear electrode and the linear electrode support device. The
在將線狀電極支撐裝置設置為導輥的情況下,導輥上設置有導線槽,從而固定線狀電極的位置。示例性地,通過設置導輥上導線槽的距離設置線狀電極之間的距離。示例性地,相鄰導線槽之間的距離的範圍為100µm -1500µm。由於現有半導體製造工藝中晶圓片的厚度往往設置為100µm -1500µm,將導線槽之間的距離設置在100µm -1500µm,從而相鄰線狀電極之間的距離為100µm -1500µm,通過相鄰線狀電極對晶棒的切割,形成一個切割好的晶圓片。When the wire electrode supporting device is provided as a guide roller, a wire groove is provided on the guide roller to fix the position of the wire electrode. Exemplarily, the distance between the linear electrodes is set by setting the distance of the wire groove on the guide roller. Exemplarily, the range of the distance between adjacent wire grooves is 100 μm -1500 μm. Since the thickness of the wafer in the existing semiconductor manufacturing process is often set to 100µm -1500µm, the distance between the wire grooves is set to 100µm -1500µm, so that the distance between adjacent linear electrodes is 100µm -1500µm. The cutting of the crystal rod by the shaped electrode forms a cut wafer.
在根據本發明的一個實施例中,採用包含氫氟酸、醋酸的溶液作為電解質,其中氫氟酸的體積百分比為1-10%,醋酸的體積百分比為0-30%。In an embodiment according to the present invention, a solution containing hydrofluoric acid and acetic acid is used as the electrolyte, wherein the volume percentage of hydrofluoric acid is 1-10%, and the volume percentage of acetic acid is 0-30%.
示例性地,晶棒300的長度方向與線狀電極400的長度方向之間的角度範圍為89.5°-90.5°。在這一角度範圍下,晶棒300的軸向與線狀電極400延伸方向垂直,使切片沿著晶棒300的徑向方向進行,切出來的晶圓符合半導體製造工藝中對晶圓的要求。Exemplarily, the angle range between the length direction of the
根據本發明的一個實施例中,該晶棒切片裝置還包括PH控制裝置,用以控制該電解池內的PH。示例性地,該電解質設置為包含氫氟酸和醋酸的混合物。其中醋酸作為緩衝劑,一方面調整整個電解質的PH值,另一方面還可以增加電解質的導電性。示例性地,該PH控制裝置包括PH檢測儀和醋酸供給裝置。According to an embodiment of the present invention, the ingot slicing device further includes a PH control device for controlling the PH in the electrolytic cell. Illustratively, the electrolyte is configured to include a mixture of hydrofluoric acid and acetic acid. Among them, acetic acid is used as a buffer to adjust the pH value of the entire electrolyte on the one hand, and on the other hand it can increase the conductivity of the electrolyte. Exemplarily, the PH control device includes a PH detector and an acetic acid supply device.
根據本發明的一個實施例中,該晶棒切片裝置還包括溫度控制裝置,用以控制該陰極、該陽極和該介電質的溫度。示例性地,該溫度控制裝置包括溫度計和水冷裝置。示例性地,該溫度控制裝置控制陰極、陽極和介電質的溫度在22-24℃之間。採用溫度控制裝置控制陰極、陽極和介電質的溫度可以控制電化學反應環境的穩定,有效避免了因為溫度對電化學反應速率的影響從而導致切片品質不穩定的問題。According to an embodiment of the present invention, the ingot slicing device further includes a temperature control device for controlling the temperature of the cathode, the anode, and the dielectric substance. Exemplarily, the temperature control device includes a thermometer and a water cooling device. Exemplarily, the temperature control device controls the temperature of the cathode, the anode and the dielectric substance to be between 22-24°C. Using a temperature control device to control the temperature of the cathode, anode and dielectric can control the stability of the electrochemical reaction environment, effectively avoiding the problem of unstable slice quality due to the influence of temperature on the electrochemical reaction rate.
根據本發明的一個實施例中,該晶棒切片裝置還包括氫氣收集裝置,用以收集該陰極上電化學反應生成的氫氣。為避免陰極產生的氫氣造成危險,將整個晶棒切片裝置設置為密閉系統,同時輔助以泵等對密閉系統內的氣體進行收集,以收集氫氣。According to an embodiment of the present invention, the crystal rod slicing device further includes a hydrogen collecting device for collecting the hydrogen generated by the electrochemical reaction on the cathode. In order to avoid the danger caused by the hydrogen produced by the cathode, the entire ingot slicing device is set up as a closed system, and at the same time, the gas in the closed system is collected by a pump, etc., to collect the hydrogen.
根據本發明的一個實施例中,該晶棒切片裝置還包括電解液循環系統,用以向該電解池中補充該電解質。示例性地,該電解質循環系統包括耐酸泵以及篩檢程式,通過耐酸泵將電解質抽出,篩檢程式過濾出其中的金屬和顆粒,再將過濾後的電解質迴圈通入電解池有效提高了電解質的使用效率,減少了生產成本。According to an embodiment of the present invention, the crystal rod slicing device further includes an electrolyte circulation system for replenishing the electrolyte into the electrolytic cell. Exemplarily, the electrolyte circulation system includes an acid-resistant pump and a screening program. The electrolyte is pumped out through the acid-resistant pump. The screening program filters out the metals and particles, and then loops the filtered electrolyte into the electrolytic cell to effectively improve the electrolyte. The efficiency of use reduces production costs.
下面參看圖1、圖3A和圖3B對本發明所提出的一種晶棒切片裝置進行示例性說明,圖1為根據本發明的一個實施例的一種晶棒切片裝置的結構示意圖;圖3A和3B為圖1中的晶棒支撐裝置分別沿著A-A方向和B-B方向獲得的截面結構示意圖。The following is an exemplary description of an ingot slicing device proposed by the present invention with reference to FIGS. 1, 3A and 3B. FIG. 1 is a schematic structural diagram of an ingot slicing device according to an embodiment of the present invention; FIGS. 3A and 3B are The cross-sectional structure diagram of the crystal rod supporting device in FIG. 1 is taken along the AA direction and the BB direction, respectively.
在本實施例中,晶棒切片裝置中的電源、陰極、陽極可以採用與實施例一中一樣的設置形式,區別僅在於本實施例中支撐裝置設置為在陽極上設置的晶棒支撐裝置,該晶棒支撐裝置控制該晶棒沿著徑向移動實現該彼此靠近的相對運動和該彼此遠離的相對運動,該晶棒支撐裝置控制該晶棒停止移動實現該相對靜止。In this embodiment, the power supply, cathode, and anode in the ingot slicing device can adopt the same configuration as in the first embodiment. The only difference is that the supporting device in this embodiment is set as the ingot supporting device on the anode. The crystal rod support device controls the crystal rod to move along the radial direction to realize the relative movement close to each other and the relative movement away from each other, and the crystal rod support device controls the crystal rod to stop moving to realize the relative static.
如圖1所示,支撐裝置設置為在陽極上支撐晶棒300的晶棒支撐裝置301,晶棒支撐裝置301控制晶棒300沿著其徑向運動,從而實現晶棒300和線狀電極400之間的彼此靠近的相對運動或者彼此遠離的相對運動;晶棒支撐裝置301控制晶棒300停止運動時實現晶棒300和線狀電極400之間的相對靜止。As shown in FIG. 1, the supporting device is set as a crystal
示例性地,該晶棒支撐裝置包括第一部分與第二部分,該第一部分與該電源電性連接,該第二部分為梳齒結構。Exemplarily, the crystal rod supporting device includes a first part and a second part, the first part is electrically connected to the power source, and the second part is a comb tooth structure.
參看圖3A和圖3B,其示出了圖1中的晶棒支撐裝置沿著A-A方向和B-B方向的截面結構示意圖。晶棒支撐裝置301用以支撐晶棒300,包括第一部分3011和第二部分3012,第一部分3011與該電源100電性連接,第二部分3012與晶棒300接觸。其中,第一部分3011設置為條狀,第二部分3012設置為梳齒結構。進一步,如圖1所示,設置為梳齒結構的第二部分3012包括設置為梳齒的凸部30121和位於梳齒之間的凹部30122。其中,線狀電極400與梳齒結構的凹部30122對應設置,在電解反應過程中,凹部30122對應的晶棒300上的部分形成與陰極上線狀電極400相對應電解反應中的陽極,凹部30122對應的晶棒300上的部分進行電化學反應而消耗,而凸部30121對應的晶棒300上的部分未參與反應而留下,最終形成沿著梳齒結構上的凹部對晶棒切割的效果。示例性地,參看圖3A,該第二部分3012上的梳齒結構的凸部30121的寬度D設置為該晶棒經過切片後形成的晶圓的厚度。示例性地,矽片的厚度的範圍為100µm -1500µm,其梳齒結構上凸部的寬度的範圍為100µm -1500µm。在一個示例中,矽片的厚度為750µm,梳齒結構的凸部的寬度為750µm。示例性地,該凹部的尺寸範圍為80-200µm。3A and 3B, which show a schematic cross-sectional structure of the crystal rod supporting device in FIG. 1 along the A-A direction and the B-B direction. The
示例性地,該晶棒支撐裝置301的材料可以是任何非金屬導電材料。具體的,晶棒支撐裝置301可以設置為石墨。碳包覆的金屬材料或導電陶瓷等。Exemplarily, the material of the crystal
進一步,示例性地,該晶棒支撐裝置301與該晶棒300之間通過導電膠連接,從而實現晶棒支撐裝置301與晶棒300之間的電性連接。Further, illustratively, the
需要理解的是,本實施例將本實施例將支撐裝置設置為晶棒支撐裝置僅僅是示例性地,本領域技術人員應當理解,任何可以控制線狀電極和晶棒之間相對位置的裝置均能夠實現本發明。It should be understood that, in this embodiment, the setting of the supporting device as the crystal rod support device in this embodiment is only exemplary, and those skilled in the art should understand that any device that can control the relative position between the linear electrode and the crystal rod is not an example. The invention can be realized.
同時,也應當理解,實施例一中將支撐裝置設置為線狀電極支撐裝置,實施例二中將支撐裝置設置為晶棒支撐裝置均為示例性地。支撐裝置還可以同時包括線狀電極支撐裝置和晶棒支撐裝置,通過控制兩者分別帶動線狀電極和晶棒的運動速率來實對線狀電極和晶棒之間相對位置的控制,從而實現彼此靠近的相對運動、彼此遠離的相對運動或者相對靜止。總之,本領域技術人員應當理解,任何可以控制線狀電極和晶棒之間相對位置的裝置均能夠實現本發明。At the same time, it should also be understood that the setting of the supporting device as a linear electrode supporting device in the first embodiment and the setting of the supporting device as a crystal rod supporting device in the second embodiment are exemplary. The support device can also include a linear electrode support device and a crystal rod support device at the same time, and the relative position between the linear electrode and the crystal rod can be controlled by controlling the movement rate of the linear electrode and the crystal rod respectively by controlling the two, thereby realizing Relative motion close to each other, relative motion away from each other, or relative static. In short, those skilled in the art should understand that any device that can control the relative position between the linear electrode and the crystal rod can implement the present invention.
本發明還提供了一種晶片切割方法,包括:步驟S1:將晶棒至少部分浸沒於包含電解質的電解池中,該電解池中設置有包含一線狀電極的陰極;步驟S2:調整該晶棒與該陰極之間的相對位置,以使該晶棒的軸向與該線狀電極的長度方向交叉設置,並且該晶棒與該線狀電極不接觸;步驟S3:在該晶棒和該陰極之間接通電源的同時控制該晶棒和該線狀電極之間的相對位置實現對該晶棒的切片,其中,該步驟S3包括:步驟S31:在第一時間段內,該電源輸出直流電,該晶棒接通該直流電源的正極,該陰極接通該直流電源的負極,控制該晶棒和該線狀電極之間的相對位置實現彼此靠近的相對運動,通過該彼此靠近的相對運動實現晶棒切片過程,在該晶棒切片過程中該線狀電極上發生電化學反應析出氣體;步驟S32:在第二時間段內,該電源輸出交流電,控制該晶棒和該線狀電極之間的相對位置停止該晶棒切片過程,該線狀電極上的該氣體脫附;迴圈執行該步驟S31、和步驟S32,直至對該晶棒完成切片。The present invention also provides a wafer cutting method, including: step S1: at least partially immersing the crystal rod in an electrolytic cell containing an electrolyte, and the electrolytic cell is provided with a cathode containing a linear electrode; step S2: adjusting the crystal rod and The relative position between the cathodes is such that the axial direction of the crystal rod crosses the length direction of the linear electrode, and the crystal rod is not in contact with the linear electrode; step S3: between the crystal rod and the cathode The relative position between the crystal rod and the linear electrode is controlled to realize the slicing of the crystal rod while the power is switched on. Step S3 includes: Step S31: In the first time period, the power supply outputs direct current, and The crystal rod is connected to the positive pole of the DC power supply, and the cathode is connected to the negative pole of the DC power supply. The relative position between the crystal rod and the linear electrode is controlled to achieve a relative movement close to each other, and the crystal is realized by the relative movement close to each other. During the rod slicing process, an electrochemical reaction occurs on the linear electrode during the crystal rod slicing process; step S32: in the second time period, the power supply outputs alternating current to control the crystal rod and the linear electrode The relative position stops the slicing process of the crystal rod, and the gas on the linear electrode is desorbed; the step S31 and the step S32 are performed in a loop until the slicing of the crystal rod is completed.
參看圖1示出的晶棒切割裝置對本發明的晶棒切割方法進行進一步的說明。The ingot cutting method of the present invention will be further described with reference to the ingot cutting device shown in FIG. 1.
首先,執行步驟1:將晶棒至少部分浸沒於包含電解質的電解池中,該電解池中設置有包含一線狀電極的陰極。First, perform step 1: at least partially immerse the crystal rod in an electrolytic cell containing an electrolyte, and the electrolytic cell is provided with a cathode containing a linear electrode.
將晶棒300至少部分浸沒於電解質201中,晶棒300與陰極上的線狀電極400間隔設置。設置晶棒支撐裝置301以支撐該晶棒300,該晶棒支撐裝置301與該晶棒300之間電性連接,晶棒300通過晶棒支撐裝置301與電源100電性連接。電源100可以輸出直流電和交流電。示例性的,電源100包括直流電源101、交流電源102以及連接在直流電源101和交流電源102之間的開關元件103。當開關元件103接通直流電源101端時,電源100輸出直流電,當開關元件103接通交流電源102端時,電源100輸出交流電。The
接著,執行步驟S2:調整該晶棒與該陰極之間的相對位置,以使該晶棒的軸向與該線狀電極的長度方向交叉設置,並且該晶棒與該線狀電極不接觸。Then, step S2 is performed: adjusting the relative position between the crystal rod and the cathode, so that the axial direction of the crystal rod crosses the length direction of the linear electrode, and the crystal rod does not contact the linear electrode.
調整晶棒300與線狀電極400之間的相對位置,以使該晶棒300的軸向與該線狀電極400的長度方向交叉設置,並且該晶棒300與該線狀電極400不接觸。示例性的,線狀電極400容置於電解池200的電解質201內,線狀電極400的長度方向相對晶棒300的軸向垂直設置,並且線狀電極400與晶棒300不接觸。The relative position between the
接著,執行步驟S3:在該晶棒和該陰極之間接通電源的同時控制該晶棒和該線狀電極之間的相對位置實現對該晶棒的切片,其中,該步驟S3包括:步驟S31:在第一時間段內,該電源輸出直流電,該晶棒接通該直流電源的正極,該陰極接通該直流電源的負極,控制該晶棒和該線狀電極之間的相對位置實現彼此靠近的相對運動,通過該彼此靠近的相對運動實現晶棒切片過程,在該晶棒切片過程中該線狀電極上發生電化學反應析出氣體;步驟S32:在第二時間段內,該電源輸出交流電,控制該晶棒和該線狀電極之間的相對位置停止該晶棒切片過程,該線狀電極上的該氣體脫附;迴圈執行該步驟S31、和步驟S32,直至對該晶棒完成切片。Then, step S3 is performed: while power is connected between the crystal rod and the cathode, the relative position between the crystal rod and the linear electrode is controlled to realize the slicing of the crystal rod, wherein the step S3 includes: step S31 : In the first time period, the power supply outputs DC power, the crystal rod is connected to the positive pole of the DC power supply, and the cathode is connected to the negative pole of the DC power supply, and the relative positions between the crystal rod and the linear electrode are controlled to realize each other The close relative movement realizes the crystal rod slicing process through the close relative movement. During the crystal rod slicing process, an electrochemical reaction occurs on the linear electrode to precipitate gas; step S32: in the second time period, the power supply outputs Alternating current is used to control the relative position between the crystal rod and the linear electrode to stop the slicing process of the crystal rod, and the gas on the linear electrode is desorbed; the steps S31 and S32 are performed in a loop until the crystal rod Complete the slicing.
如圖1所示,在步驟S31中,在第一時間段內,開關元件103接通直流電源101端時,電源100輸出直流電。此時,晶棒支撐裝置301控制晶棒300沿著徑向運動實現晶棒300與線狀電極400之間彼此靠近的相對運動,通過彼此靠近的相對運動實現晶棒切片過程。在上述晶棒切片過程中,位於陽極上的晶棒發生如下電化學反應:
在陰極線狀電極上發生如下電化學反應: As shown in FIG. 1, in step S31, when the switching element 103 is connected to the end of the
陰極上析出的H2
往往吸附線狀電極400上,使得線狀電極400表面反應活性降低,影響後續電化學反應效率,進而影響晶棒切片速率和切片品質。The H 2 precipitated on the cathode tends to be adsorbed on the
在步驟S32中,在第二時間段內,當開關元件103接通交流電源102端時,電源100輸出交流電。此時,晶棒支撐裝置301控制晶棒300停止運動實現晶棒300與線狀電極400之間彼此相對靜止,此時晶棒切片過程停止,此時線狀電極上不發生電化學反應而使H2
從線狀電極上脫除,並且由於線狀電極上載入的交流電使陰極上發生電性改變,這一過程使線狀電極上吸附的H2
快速脫除,迴圈執行該步驟S31、和步驟S32,直至對該晶棒完成切片,這樣有效解決了氫氣吸附線狀電極上而影響陰極電化學反應的效率的問題,保證了晶棒切割的效率和品質。In step S32, in the second time period, when the switching element 103 is connected to the
綜上該,根據本發明的晶棒切片裝置和方法,電源可以同時輸出交流電和直流電,在陰極和陽極之間接通直流電時,通過控制線狀電極與晶棒相對位置實現彼此靠近的相對運動實現晶棒切片過程,當在陽極和陰極之間接通該交流電時,控制線狀電極與晶棒之間的相對位置停止晶棒切片過程,此時線狀電極上不發生電化學反應使H2 從線狀電極上脫除,並且由於線狀電極上載入的交流電使陰極上發生電性改變,這一過程使線狀電極上吸附的H2 快速脫除,有效解決了氫氣吸附線狀電極上而影響陰極電化學反應的效率的問題,保證了晶棒切割的效率和品質。In summary, according to the crystal rod slicing device and method of the present invention, the power supply can output alternating current and direct current at the same time. When the direct current is connected between the cathode and the anode, the relative movement of the linear electrode and the crystal rod is realized by controlling the relative position of the linear electrode and the crystal rod. In the crystal rod slicing process, when the alternating current is connected between the anode and the cathode, the relative position between the linear electrode and the crystal rod is controlled to stop the crystal rod slicing process. At this time, no electrochemical reaction occurs on the linear electrode to make H 2 from The H 2 adsorbed on the linear electrode is quickly removed due to the alternating current loaded on the linear electrode. This process makes the H 2 adsorbed on the linear electrode quickly removed, which effectively solves the problem of hydrogen adsorption on the linear electrode. The problem of affecting the efficiency of the electrochemical reaction of the cathode ensures the efficiency and quality of the ingot cutting.
本發明已經通過上述實施例進行了說明,但應當理解的是,上述實施例只是用於舉例和說明的目的,而非意在將本發明限制於所描述的實施例範圍內。此外本領域技術人員可以理解的是,本發明並不局限於上述實施例,根據本發明的教導還可以做出更多種的變型和修改,這些變型和修改均落在本發明所要求保護的範圍以內。本發明的保護範圍由附屬的權利要求書及其等效範圍所界定。The present invention has been described by the above-mentioned embodiments, but it should be understood that the above-mentioned embodiments are only for the purpose of illustration and description, and are not intended to limit the present invention to the scope of the described embodiments. In addition, those skilled in the art can understand that the present invention is not limited to the above-mentioned embodiments, and more variations and modifications can be made according to the teachings of the present invention, and these variations and modifications fall under the protection of the present invention. Within the range. The protection scope of the present invention is defined by the appended claims and their equivalent scope.
100:電源 101:直流電源 102:交流電源 103:開關元件 200:電解池 201:電解質 300:晶棒 301:晶棒支撐裝置 3011:第一部分 3012:第二部分 30121:凸部 30122:凹部 400:線狀電極 401:線狀電極支撐裝置 100: Power 101: DC power supply 102: AC power 103: switching element 200: electrolytic cell 201: Electrolyte 300: crystal rod 301: Crystal rod support device 3011: Part One 3012: Part Two 30121: convex 30122: recess 400: wire electrode 401: Wire electrode support device
本發明的下列附圖在此作為本發明的一部分用於理解本發明。附圖中示出了本發明的實施例及其描述,用來解釋本發明的原理。The following drawings of the present invention are used here as a part of the present invention for understanding the present invention. The accompanying drawings show the embodiments of the present invention and the description thereof to explain the principle of the present invention.
附圖中: 圖1為根據本發明的一個實施例的一種晶棒切片裝置的結構示意圖; 圖2為圖1中晶棒相對於線狀電極設置的正面示意圖; 圖3A和3B為圖1中的晶棒支撐裝置分別沿著A-A方向和B-B方向獲得的截面結構示意圖。In the attached picture: Fig. 1 is a schematic structural diagram of an ingot slicing device according to an embodiment of the present invention; 2 is a schematic front view of the crystal rod in FIG. 1 being arranged relative to the linear electrode; 3A and 3B are schematic diagrams of the cross-sectional structure of the crystal rod supporting device in FIG. 1 taken along the A-A direction and the B-B direction, respectively.
100:電源 100: Power
101:直流電源 101: DC power supply
102:交流電源 102: AC power
103:開關元件 103: switching element
200:電解池 200: electrolytic cell
201:電解質 201: Electrolyte
300:晶棒 300: crystal rod
301:晶棒支撐裝置 301: Crystal rod support device
400:線狀電極 400: wire electrode
401:線狀電極支撐裝置 401: Wire electrode support device
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