TW202017665A - Metal filter cleaning method and device - Google Patents

Abstract

A metal filter cleaning method and device are provided. The metal filter cleaning method includes the steps of: providing an electrolytic cleaning liquid. Immersing a metal filter and a conductive plate in the electrolytic cleaning liquid. And applying a negative voltage to the metal, applying a positive voltage to the conductive plate such that an electrolytic reaction is formed in the electrolytic cleaning liquid. The metal filter is cleaned by the electrolytic reaction. The electrolytic reaction can be formed in the holes of the deep layer of the metal filter. The bubbles generated by the electrolytic reaction can be used to peel off the dirt in the holes of the deep layer of the metal filter, so as to achieve a quick and effective cleaning.

Description

Metal filter cleaning method and device

The invention relates to a filter element cleaning method and device, in particular to a metal filter element cleaning method and device.

The traditional cleaning method of metal filter is mainly to use the bristles to contact the metal filter for cleaning, such as the filter cleaning machine for electroplating disclosed in the new patent No. M299041 published by the Republic of China, and the traditional brush cleaning or spraying All methods can only clean the surface of the filter core, and cannot effectively clean the holes used for filtering in the filter core. In addition, the above-mentioned traditional cleaning method cannot clean the inside of the multi-layer structure filter element, but can only remove the outer layer structure of the filter element.

In order to clean the inside and holes of the multi-layer filter element, fresh water is passed through the filter outlet to provide reverse water flow for reverse cleaning, and the pressure of the water flow is used to clean the holes and the dirt inside the filter element. The counter-flow filter disclosed in the invention patent No. 218489. However, because the water flow will flow to the holes that have been turned on, the holes that are severely blocked will not pass through the water flow, and cannot have the cleaning effect. In addition, after the water flow passes through the multi-layer structure, there is not enough power to clean the surface of the internal filter element. Therefore, the metal filter element often has uneven cleaning conditions, for example, some holes are still blocked.

Therefore, it is necessary to provide a metal filter cleaning method and device to solve the problems in the conventional technology

The main purpose of the present invention is to provide a method and device for cleaning a metal filter element. An electrolysis reaction is formed in the pores and inside of the metal filter element through the principle of electrolysis, and air bubbles generated through the electrolysis reaction make dirt from the surface and the hole of the metal filter element. Medium peeling to achieve the cleaning effect.

The secondary objective of the present invention is to provide a metal filter cleaning method and device, which combines the ultrasonic vibration with the principle of electrolysis to enhance the penetration of electrolytic cleaning solution to achieve more Effective cleaning effect.

In order to achieve the above object, the present invention provides a metal filter cleaning method, which includes the steps of: providing an electrolytic cleaning solution; immersing a metal filter and a conductive plate in the electrolytic cleaning solution; and applying a negative voltage to the metal The filter element applies a positive voltage to the conductive plate, so that an electrolytic reaction is formed in the electrolytic cleaning solution, and the metal filter element is washed through the electrolytic reaction.

In one embodiment of the present invention, the voltage difference between the negative voltage and the positive voltage is controlled to be 5V to 30V, and the current density of the electrolytic reaction is controlled to be 10A/m ² to 100A/m ² .

In one embodiment of the present invention, while cleaning the metal filter element through the electrolytic reaction, the method further includes the step of applying an ultrasonic wave to oscillate the electrolytic cleaning solution.

In one embodiment of the present invention, the frequency of the ultrasonic wave is controlled to be from 28 kHz to 125 kHz.

In one embodiment of the present invention, the working temperature of the electrolytic cleaning solution is controlled at 25°C to 80°C.

In one embodiment of the present invention, the metal filter cleaning method can be implemented in a negative pressure environment.

In one embodiment of the present invention, the electrolytic cleaning solution is provided by using an alkaline solution as the electrolytic cleaning solution.

The invention further provides a metal filter cleaning device, which comprises: a cleaning tank for accommodating an electrolytic cleaning solution; a DC power supply, which comprises a positive electrode and a negative electrode, wherein the negative electrode is electrically connected to a metal filter element, and The metal filter is immersed in the electrolytic cleaning solution; and a conductive plate is electrically connected to the positive electrode, and the conductive plate is immersed in the electrolytic cleaning solution.

In one embodiment of the present invention, the metal filter cleaning device further includes: an ultrasonic oscillator connected to the cleaning tank. The ultrasonic oscillator is used to apply an ultrasonic wave to oscillate the electrolytic cleaning solution.

In an embodiment of the present invention, the metal filter cleaning device further includes: a suction cover, the cover is attached to the cleaning tank to form a space; and a vacuum pump, connected to the suction cover, the vacuum pump causes the space to form a Negative pressure environment.

As described above, the present invention uses a metal filter as an electrode and is immersed in an electrolytic cleaning solution. Using the principle of electrolysis, an electrolytic reaction is formed on the holes and the surface of the metal filter to make electrolysis The cleaning solution generates air bubbles, which allow the air bubbles to peel off dirt in the holes and on the surface. In addition, the invention can help the electrolytic cleaning solution penetrate the dirt or penetrate into the hole through ultrasonic vibration, thereby enhancing the effect of peeling off the dirt. The present invention can further enhance the cleaning efficiency by operating in a negative pressure environment, controlling the working temperature of the electrolytic cleaning solution, and maintaining the cleanness of the electrolytic cleaning solution.

S101~S104‧‧‧Step

1‧‧‧Cleaning tank

2‧‧‧DC power supply

3‧‧‧Metal filter

4‧‧‧Conductive plate

5‧‧‧Ultrasonic Oscillator

6‧‧‧Exhaust cover

7‧‧‧Space

8‧‧‧Vacuum pump

9‧‧‧ Electrolytic cleaning fluid circulation pump

10‧‧‧heater

11‧‧‧Electrolytic cleaning solution

21‧‧‧Positive

22‧‧‧Negative

91‧‧‧ Electrolytic cleaning fluid filter

FIG. 1 is a flowchart of an embodiment of the metal filter cleaning method of the present invention.

FIG. 2 is a schematic structural view of an embodiment of the metal filter cleaning device of the present invention.

In order to make the above and other objects, features, and advantages of the present invention more comprehensible, the preferred embodiments of the present invention will be specifically described below in conjunction with the accompanying drawings, which will be described in detail below. Furthermore, the terms of direction mentioned in the present invention, such as up, down, top, bottom, front, back, left, right, inner, outer, side, surrounding, center, horizontal, horizontal, vertical, longitudinal, axial, The radial direction, the uppermost layer or the lowermost layer, etc., are only the directions referring to the attached drawings. Therefore, the directional terminology is used to illustrate and understand the present invention, not to limit the present invention.

Referring to FIG. 1, an embodiment of the metal filter cleaning method of the present invention includes: Step S101, providing an electrolytic cleaning solution, and the electrolytic cleaning solution provided may be an alkaline solution. The pH value of the electrolytic cleaning solution is between 10 and 13. The electrolytic cleaning solution can be replaced and adjusted according to the different dirt on the metal filter. In addition, the working temperature of the electrolytic cleaning solution can be kept between 25°C and 80°C to improve the effect of the electrolytic reaction.

In step S102, a metal filter element and a conductive plate are immersed in the electrolytic cleaning solution, wherein the metal filter element has a multi-layer structure, and the conductive plate can be made of metal, such as steel. The conductive plate can also be made of stainless steel, thereby avoiding corrosion of the conductive plate during the electrolytic reaction, thereby contaminating the electrolytic cleaning solution.

Step S103, a negative voltage is applied to the metal filter element, and a positive voltage is applied to the conductive plate, so that an electrolytic reaction is formed in the electrolytic cleaning solution, wherein the voltage difference between the negative voltage and the positive voltage can be controlled at 5V To 30V, and the current density of the electrolysis reaction is controlled between 10A/m ² and 100A/m ² . Through the adjustment of voltage difference and current density, the speed of electrolytic reaction can be controlled, and then the cleaning efficiency of the metal filter can be adjusted. To avoid that the bubbles are generated too quickly during the electrolysis reaction (the reaction is too violent), so that the holes of the metal filter are damaged. In addition, the adjustment of the voltage difference and the current density can also produce fine bubbles in the electrolytic reaction, to avoid the bubbles being too large to clean the tiny holes in the filter element of the machine

In step S104, an ultrasonic wave is applied to oscillate the electrolytic cleaning solution, wherein the frequency of the ultrasonic wave can be controlled from 28 kHz to 125 kHz. Since the dirt on the metal filter element may accumulate a considerable thickness, and the holes used for filtering on the metal filter element may be quite small, the electrolytic cleaning solution may completely infiltrate the dirt or penetrate into each hole. It takes time. Ultrasonic vibration can help the electrolytic cleaning solution penetrate the dirt or penetrate into each hole of the metal filter faster, thereby enhancing the effect of peeling off the dirt.

In addition, steps S101 to S104 of the metal filter cleaning method can be implemented in a negative pressure environment. The negative pressure environment can be formed using the principle of degassing or vacuum, and the negative pressure environment facilitates the discharge of the gas generated in the electrolytic reaction. In this way, the force of ultrasonic vibration is increased, and the ability to strip dirt is improved.

Please refer to FIG. 2, the present invention further provides a metal filter cleaning device, which can be operated in conjunction with the above metal filter cleaning method. The metal filter cleaning device includes: a cleaning tank 1, a DC power supply 2, a conductive plate 4, an ultrasonic oscillator 5, a suction cover 6 and a vacuum pump 8.

The cleaning tank 1 is used for containing an electrolytic cleaning solution 11. The electrolytic cleaning solution may be an alkaline solution. The pH value of the electrolytic cleaning solution can be between 10 and 13.

The DC power supply 2 includes a positive electrode 21 and a negative electrode 22, wherein the negative electrode 22 is electrically connected to a metal filter element 3, and the metal filter element 3 is immersed in the electrolytic cleaning solution 11. The DC power supply can provide at least a voltage difference of 5V to 30V between the positive electrode 21 and the negative electrode 22, and can also control the current density of the electrolytic reaction to be maintained between 10A/m ² and 100A/m ² . The metal filter element 3 may have a multi-layer structure, such as a five-layer metal sintered mesh. The metal filter element 3 may have many tiny holes for filtering, and the filtering accuracy of the metal filter element 3 may be less than 10 microns, such as 1 micron.

The conductive plate 4 is electrically connected to the positive electrode 21, and the conductive plate 4 is immersed in the electrolytic cleaning solution 11. The conductive plate 4 may be made of metal, such as steel. The conductive plate can also be made of stainless steel, for example, 304 stainless steel, thereby avoiding the conductive plate 4 in the electrolytic reaction Corrosion occurs during the process, which in turn contaminates the electrolytic cleaning solution 11.

The ultrasonic oscillator 5 is connected to the cleaning tank 1. The ultrasonic oscillator 5 is used to apply an ultrasonic wave (not shown) to oscillate the electrolytic cleaning solution 11. The ultrasonic oscillator 5 can provide ultrasonic waves with a frequency between 28 kHz and 125 kHz. The ultrasonic oscillator 5 can also be integrated with the cleaning tank 1, such as a common ultrasonic cleaning tank.

The suction outer cover 6 is attached to the cleaning tank 1 to form a space 7. The vacuum pump 8 is connected to the suction casing 6, and the vacuum pump 8 causes the space 7 to form a negative pressure environment. The space 7 may be a closed space, and the space is drawn through the vacuum pump 8 to form the negative pressure environment. It should be understood that other principles can also be used to form the negative pressure environment and can also be applied to the present invention.

As described above, the metal filter cleaning device may further include an electrolytic cleaning solution circulation pump 9, a heater 10, and an electrolytic cleaning solution filter 91. The electrolytic cleaning solution circulation pump 9 and the electrolytic cleaning solution filter 91 can filter and wash the dirt peeled off during the cleaning process, keep the electrolytic cleaning solution 11 clean, and maintain stable cleaning efficiency. The heater 10 maintains the working temperature of the electrolytic cleaning solution 11 between 25°C and 80°C.

The following uses an example to illustrate the advantages of the metal filter cleaning method of the present invention. When the metal filter is a five-layer metal sintered mesh with a filtering area of 0.1 m ² , the amount of the metal filter itself is 85 grams. When the metal After the filter element is used to filter pitch containing carbon microspheres, the weight of the metal filter element becomes 94 grams, and the metal filter element appears dark brown. Traditional brushing can only remove the dirt of carbon molecules in the outermost structure. The reverse cleaning is more serious due to the heavy dirt of carbon molecules.

Using the metal filter cleaning method of the present invention, the filtered metal filter is connected to the negative electrode of the DC power supply, the stainless steel 304 is used as the positive electrode, and the sodium hydroxide (NaOH) solution with a pH value of 13 is used as the electrolytic cleaning solution, and the direct current is passed and Maintain a voltage difference of 5V and a current density of 20A/m ² for electrolytic reaction. At the same time, ultrasonic waves with a frequency of 40 kHz were introduced to oscillate the electrolytic cleaning solution, and the temperature of the electrolytic cleaning solution was maintained at 65° C., and the cleaning method was operated in a negative pressure environment of 90 kpa for 5 minutes. After cleaning, the appearance of the metal filter is restored to metallic luster, and the weight is restored to 85 grams, and the bubble point pressure test can also return to the pressure value before unfiltering, which represents the multi-layer structure of the metal filter and the dirt in the holes The dirt has been removed.

In summary, the present invention uses a metal filter as an electrode and is immersed in an electrolytic cleaning solution. Using the principle of electrolysis, an electrolytic reaction is formed on the holes and the surface of the metal filter, so that the electrolytic cleaning solution generates bubbles, and the bubbles are allowed to peel off the holes. And dirt on the surface. In addition, the invention can help the electrolytic cleaning solution penetrate the dirt or penetrate into the hole through ultrasonic vibration, thereby enhancing the effect of peeling off the dirt. The present invention can further enhance the cleaning efficiency by operating in a negative pressure environment, controlling the working temperature of the electrolytic cleaning solution, and maintaining the cleanness of the electrolytic cleaning solution.

Although the present invention has been disclosed in preferred embodiments, it is not intended to limit the present invention. Anyone who is familiar with this skill can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be as defined in the scope of the attached patent application.

S101~S104‧‧‧Step

Claims (10)

A metal filter cleaning method includes the steps of: providing an electrolytic cleaning solution; immersing a metal filter and a conductive plate in the electrolytic cleaning solution; and applying a negative voltage to the metal filter and applying a positive voltage to the The conductive plate makes an electrolytic reaction form in the electrolytic cleaning solution, and cleans the metal filter element through the electrolytic reaction. The metal filter cleaning method as described in item 1 of the patent application range, wherein the voltage difference between the negative voltage and the positive voltage is controlled at 5V to 30V, and the current density of the electrolytic reaction is controlled at 10A/m ² to I00A /m ² . The metal filter cleaning method as described in item 1 of the patent application scope, wherein while cleaning the metal filter through the electrolytic reaction, the method further includes the step of applying an ultrasonic wave to oscillate the electrolytic cleaning solution. The metal filter cleaning method as described in item 3 of the patent application range, wherein the frequency of the ultrasonic wave is controlled from 28 kHz to 125 kHz. The metal filter cleaning method as described in item 1 of the patent application scope, wherein the working temperature of the electrolytic cleaning liquid is controlled at 25°C to 80°C. The metal filter cleaning method as described in item 1 of the patent application scope, wherein the metal filter cleaning method can be implemented in a negative pressure environment. The metal filter cleaning method as described in item 1 of the patent application scope, wherein the electrolytic cleaning solution is provided by using an alkaline solution as the electrolytic cleaning solution. A metal filter cleaning device includes: a cleaning tank for accommodating an electrolytic cleaning solution; a DC power supply, including a positive electrode and a negative electrode, wherein the negative electrode is electrically connected to a A metal filter element, and the metal filter element is immersed in the electrolytic cleaning solution; and a conductive plate electrically connected to the positive electrode, and the conductive plate is immersed in the electrolytic cleaning solution. The metal filter cleaning device as described in item 8 of the patent application scope further includes: an ultrasonic oscillator connected to the cleaning tank, and the ultrasonic oscillator is used to apply an ultrasonic wave to oscillate the electrolytic cleaning solution. The metal filter cleaning device as described in item 8 of the scope of the patent application further includes: a suction cover, the cover is attached to the cleaning tank to form a space; and a vacuum pump connected to the suction cover, the vacuum pump promotes the formation of the space A negative pressure environment.

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