TW202012456A - Lens composition, lens, lens production method, and display device - Google Patents
Lens composition, lens, lens production method, and display device Download PDFInfo
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- TW202012456A TW202012456A TW108129931A TW108129931A TW202012456A TW 202012456 A TW202012456 A TW 202012456A TW 108129931 A TW108129931 A TW 108129931A TW 108129931 A TW108129931 A TW 108129931A TW 202012456 A TW202012456 A TW 202012456A
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/875—Arrangements for extracting light from the devices
- H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Polymerisation Methods In General (AREA)
- Optical Filters (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
本發明有關一種透鏡用組成物。更詳細而言,有關一種用於在具有濾色器之顯示裝置的、透射濾色器之光的光徑上形成透鏡之透鏡用組成物。又,本發明有關一種透鏡、透鏡之製造方法及顯示裝置。The present invention relates to a composition for lenses. More specifically, it relates to a lens composition for forming a lens on the optical path of light passing through the color filter of a display device having a color filter. In addition, the invention relates to a lens, a lens manufacturing method and a display device.
各種顯示裝置中,通常為了顯示圖像的彩色化而使用濾色器。例如,專利文獻1中記載有如下:使用含有包含呋喃基之化合物(A)、包含光聚合性官能基之化合物(B)、光聚合起始劑(C)及著色劑之濾色器用感光性組成物來形成濾色器,並製造有機電致發光顯示裝置。 [先前技術文獻] [專利文獻]In various display devices, color filters are generally used for colorization of displayed images. For example, Patent Literature 1 describes the following: photosensitivity for color filters using a compound (A) containing a furan group, a compound (B) containing a photopolymerizable functional group, a photopolymerization initiator (C), and a coloring agent Composition to form a color filter, and manufacture an organic electroluminescence display device. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開2017-194662號公報[Patent Document 1] Japanese Patent Application Publication No. 2017-194662
近年來期望進一步提高顯示裝置的亮度。本發明者對進一步提高具有濾色器之顯示裝置的亮度進行各種研究之結果,發現能夠藉由在透射濾色器之光的光徑上設置透鏡來提高亮度。In recent years, it has been desired to further increase the brightness of display devices. The present inventors conducted various studies on further improving the brightness of a display device having a color filter, and found that it is possible to improve the brightness by providing a lens on the optical path of light transmitted through the color filter.
因此,本發明的目的在於提供一種能夠提高具有濾色器之顯示裝置的亮度之透鏡用組成物、透鏡、透鏡之製造方法及顯示裝置。Therefore, an object of the present invention is to provide a lens composition, a lens, a method for manufacturing a lens, and a display device that can increase the brightness of a display device having a color filter.
本發明者提供以下。 <1>一種透鏡用組成物,用於在具有濾色器之顯示裝置的、透射濾色器之光的光徑上形成透鏡,其中 透鏡用組成物包含聚合性單體M、光聚合起始劑A及樹脂B, 在使用透鏡用組成物製造出膜厚2μm的膜時,膜在波長400~700nm下之吸光度的最大值為0.05以下,且在波長550nm的光的折射率為1.5以上。 <2>如<1>所述之透鏡用組成物,其中樹脂B含有包含來自於由下述式(I)所表示之化合物的重複單元之樹脂b1, [化學式1] 式中,X1 表示O或NH, R1 表示氫原子或甲基, L1 表示2價的連接基, R10 表示取代基, m表示0~2的整數, p表示0以上的整數。 <3>如<2>所述之透鏡用組成物,其中樹脂b1還包含來自於烷基(甲基)丙烯酸酯的重複單元。 <4>如<1>~<3>中任一項所述之透鏡用組成物,其中光聚合起始劑A含有肟化合物。 <5>如<1>~<4>中任一項所述之透鏡用組成物,其中光聚合起始劑A包含: 在甲醇中的波長365nm的吸光係數為1.0×103 mL/gcm以上的光聚合起始劑A1;及 在甲醇中的波長365nm的吸光係數為1.0×102 mL/gcm以下,並且波長254nm的吸光係數為1.0×103 mL/gcm以上的光聚合起始劑A2。 <6>如<5>所述之透鏡用組成物,其中光聚合起始劑A1為包含氟原子之肟化合物。 <7>如<5>或<6>所述之透鏡用組成物,其中光聚合起始劑A2為羥基烷基苯酮化合物。 <8>如<5>~<7>中任一項所述之透鏡用組成物,其中相對於光聚合起始劑A1的100質量份,含有50~200質量份的光聚合起始劑A2。 <9>如<5>~<8>中任一項所述之透鏡用組成物,其中在透鏡用組成物的總固體成分中的光聚合起始劑A1和光聚合起始劑A2的合計含量為5~15質量%。 <10>如<1>~<9>中任一項所述之透鏡用組成物,其中聚合性單體M含有包含3個以上的乙烯性不飽和基之化合物。 <11>如<1>~<10>中任一項所述之透鏡用組成物,其包含矽烷偶合劑。 <12>如<1>~<11>中任一項所述之透鏡用組成物,其含有包含呋喃基之化合物。 <13>如<12>所述之透鏡用組成物,其中包含呋喃基之化合物為選自由下述式(fur-1)所表示之化合物及包含來自於由下述式(fur-1)所表示之化合物的重複單元之樹脂中之至少1種, [化學式2] 式中,Rf1 表示氫原子或甲基,Rf2 表示2價的連接基。 <14>一種透鏡,其由<1>~<13>中任一項所述之透鏡用組成物獲得。 <15>一種透鏡之製造方法,該方法包括: 在支撐體上塗佈<1>~<13>中任一項所述之透鏡用組成物來形成組成物層之步驟;及 將組成物層加工成透鏡形狀之步驟。 <16>如<15>所述之透鏡之製造方法,其中遍及所有步驟在150℃以下的溫度下進行。 <17>如<15>或<16>所述之透鏡之製造方法,其中加工成透鏡形狀之步驟包括對組成物層以1J/cm2 以上的曝光量照射波長超過350nm且380nm以下的光之步驟。 <18>如<15>或<16>所述之透鏡之製造方法,其中加工成透鏡形狀之步驟包括對組成物層照射波長超過350nm且380nm以下的光來進行曝光之後,進一步照射波長254~350nm的光來進行曝光之步驟。 <19>如<15>~<18>中任一項所述之透鏡之製造方法,其中加工成透鏡形狀之步驟包括將組成物層在100~150℃的溫度下加熱10分鐘以上之步驟。 <20>如<19>所述之透鏡之製造方法,其中加熱之步驟在非活性氣體環境下進行。 <21>一種顯示裝置,其具有濾色器和在透射濾色器之光的光徑上所設置之由<1>~<13>中任一項所述之透鏡用組成物獲得之透鏡。 <22>如<21>所述之顯示裝置,其為有機電致發光顯示裝置。 [發明效果]The inventor provides the following. <1> A lens composition for forming a lens on a light path of a display device having a color filter that transmits light of the color filter, wherein the lens composition includes a polymerizable monomer M and a photopolymerization start When the agent A and the resin B use a lens composition to produce a film with a thickness of 2 μm, the maximum absorbance of the film at a wavelength of 400 to 700 nm is 0.05 or less, and the refractive index of light at a wavelength of 550 nm is 1.5 or more. <2> The lens composition according to <1>, wherein the resin B contains a resin b1 containing a repeating unit derived from a compound represented by the following formula (I), [Chemical Formula 1] In the formula, X 1 represents O or NH, R 1 represents a hydrogen atom or a methyl group, L 1 represents a divalent linking group, R 10 represents a substituent, m represents an integer of 0 to 2, and p represents an integer of 0 or more. <3> The lens composition according to <2>, wherein the resin b1 further contains a repeating unit derived from an alkyl (meth)acrylate. <4> The lens composition according to any one of <1> to <3>, wherein the photopolymerization initiator A contains an oxime compound. <5> The lens composition according to any one of <1> to <4>, wherein the photopolymerization initiator A contains: an absorption coefficient of 1.0×10 3 mL/gcm or more in methanol at a wavelength of 365 nm Photopolymerization initiator A1; and photopolymerization initiator A2 in methanol with a wavelength of 365 nm and an absorption coefficient of 1.0×10 2 mL/gcm or less and a wavelength of 254 nm with an absorption coefficient of 1.0×10 3 mL/gcm or more . <6> The lens composition according to <5>, wherein the photopolymerization initiator A1 is an oxime compound containing a fluorine atom. <7> The lens composition according to <5> or <6>, wherein the photopolymerization initiator A2 is a hydroxyalkyl benzophenone compound. <8> The lens composition according to any one of <5> to <7>, which contains 50 to 200 parts by mass of the photopolymerization initiator A2 relative to 100 parts by mass of the photopolymerization initiator A1. . <9> The lens composition according to any one of <5> to <8>, wherein the total content of the photopolymerization initiator A1 and the photopolymerization initiator A2 in the total solid content of the lens composition It is 5 to 15% by mass. <10> The lens composition according to any one of <1> to <9>, wherein the polymerizable monomer M contains a compound containing three or more ethylenic unsaturated groups. <11> The lens composition according to any one of <1> to <10>, which contains a silane coupling agent. <12> The lens composition according to any one of <1> to <11>, which contains a furan group-containing compound. <13> The lens composition according to <12>, wherein the furan-containing compound is selected from compounds represented by the following formula (fur-1) and contains compounds derived from the following formula (fur-1) At least one of the resins of the repeating units of the compound represented, [Chemical Formula 2] In the formula, Rf 1 represents a hydrogen atom or a methyl group, and Rf 2 represents a divalent linking group. <14> A lens obtained from the lens composition according to any one of <1> to <13>. <15> A method for manufacturing a lens, the method comprising: a step of forming a composition layer by coating the lens composition according to any one of <1> to <13> on a support; and applying the composition layer Steps of processing into lens shape. <16> The method for manufacturing a lens according to <15>, wherein all steps are performed at a temperature of 150° C. or less. <17> The method for manufacturing a lens as described in <15> or <16>, wherein the step of processing into a lens shape includes irradiating the composition layer with light having a wavelength of more than 350 nm and less than 380 nm at an exposure of 1 J/cm 2 or more step. <18> The method of manufacturing a lens as described in <15> or <16>, wherein the step of processing into a lens shape includes irradiating the composition layer with light having a wavelength of more than 350 nm and less than 380 nm, and then further irradiating a wavelength of 254 to 350nm light to perform the exposure step. <19> The method for manufacturing a lens according to any one of <15> to <18>, wherein the step of processing into a lens shape includes the step of heating the composition layer at a temperature of 100 to 150° C. for 10 minutes or more. <20> The method for manufacturing a lens as described in <19>, wherein the heating step is performed in an inert gas environment. <21> A display device having a color filter and a lens obtained from the lens composition described in any one of <1> to <13> provided on the optical path of light passing through the color filter. <22> The display device according to <21>, which is an organic electroluminescence display device. [Effect of the invention]
依本發明,能夠提供一種能夠提高具有濾色器之顯示裝置的亮度之透鏡用組成物、透鏡、透鏡之製造方法。又,依本發明,能夠提供一種亮度高之顯示裝置。According to the present invention, it is possible to provide a lens composition, lens, and method for manufacturing a lens capable of improving the brightness of a display device having a color filter. Furthermore, according to the present invention, a display device with high brightness can be provided.
以下,對本發明的內容進行詳細說明。 本說明書中之基團(原子團)的標記中,未標有經取代及未經取代之標記包含不具有取代基之基團(原子團),並且還包含具有取代基之基團(原子團)。例如,“烷基”不僅包含不具有取代基之烷基(未經取代烷基),還包含具有取代基之烷基(取代烷基)。 關於本說明書中的“曝光”,除非另有指明,則不僅包含使用光之曝光,使用電子束及離子束等粒子束之描繪亦包含在曝光中。又,作為用於曝光之光,通常可列舉水銀燈的明線光譜、準分子雷射為代表之遠紫外線、極紫外線(EUV光)、X射線及電子束等光化射線或放射線。 本說明書中,使用“~”表示之數值範圍是指包含記載於“~”的前後之數值作為下限值及上限值之範圍。 本說明書中,總固體成分是指從組成物的所有成分去除溶劑之成分的合計質量。 本說明書中,“(甲基)丙烯酸酯”表示丙烯酸酯及甲基丙烯酸酯這兩者或任一者,“(甲基)丙烯酸”表示丙烯酸及甲基丙烯酸這兩者或任一者,“(甲基)烯丙基”表示烯丙基及甲基烯丙基這兩者或任一者,“(甲基)丙烯醯基”表示丙烯醯基及甲基丙烯醯基這兩者或任一者。 本說明書中“步驟”的術語不僅為獨立之步驟,而且即使在無法與其他步驟明確區分之情況下,只要實現該步驟的所期望的作用,則亦包含在本術語中。 本說明書中,重量平均分子量(Mw)及數量平均分子量(Mn)定義為藉由凝膠滲透層析法(GPC)來進行測量之聚苯乙烯換算值。Hereinafter, the content of the present invention will be described in detail. In the label of the group (atomic group) in this specification, the label not marked with substituted and unsubstituted includes a group (atomic group) without a substituent, and also includes a group (atomic group) with a substituent. For example, "alkyl" includes not only unsubstituted alkyl groups (unsubstituted alkyl groups), but also substituted alkyl groups (substituted alkyl groups). Unless otherwise specified, "exposure" in this specification includes not only exposure using light, but also drawing using particle beams such as electron beams and ion beams. In addition, as the light used for the exposure, the bright line spectrum of a mercury lamp, excimer laser, and representative actinic rays or radiation such as far ultraviolet, extreme ultraviolet (EUV light), X-ray, and electron beam are generally mentioned. In this specification, the numerical range indicated by "~" means a range including the numerical values described before and after "~" as the lower limit value and the upper limit value. In this specification, the total solid content refers to the total mass of the components excluding the solvent from all components of the composition. In this specification, "(meth)acrylate" means both or either acrylate and methacrylate, "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid, " "(Meth)allyl" means both or any one of allyl and methallyl, and "(meth)acryl" means both or any of acryl and methacryl One. The term "step" in this specification is not only an independent step, but even if it cannot be clearly distinguished from other steps, as long as the desired effect of the step is achieved, it is also included in the term. In this specification, the weight average molecular weight (Mw) and the number average molecular weight (Mn) are defined as polystyrene conversion values measured by gel permeation chromatography (GPC).
<透鏡用組成物> 本發明的透鏡用組成物用於在具有濾色器之顯示裝置的、透射濾色器之光的光徑上形成透鏡,其特徵為, 該透鏡用組成物包含聚合性單體M、光聚合起始劑A及樹脂B, 在使用該透鏡用組成物製造出膜厚2μm的膜時,前述膜在波長400~700nm下之吸光度的最大值為0.05以下,且在波長550nm的光的折射率為1.5以上。<Lens composition> The lens composition of the present invention is used to form a lens on the optical path of light passing through the color filter of a display device having a color filter, and is characterized by, The lens composition includes a polymerizable monomer M, a photopolymerization initiator A and a resin B, When a film with a thickness of 2 μm is manufactured using the lens composition, the maximum absorbance of the film at a wavelength of 400 to 700 nm is 0.05 or less, and the refractive index of light at a wavelength of 550 nm is 1.5 or more.
藉由使用本發明的透鏡用組成物,能夠更加提高具有濾色器之顯示裝置的亮度。By using the lens composition of the present invention, the brightness of a display device having a color filter can be further improved.
本發明的組成物在製造出膜厚2μm的膜時,前述膜在波長400~700nm下之吸光度的最大值為0.05以下,0.04以下為較佳,0.03以下為更佳。為了實現該種吸光度的條件,作為透鏡用組成物中所使用之素材,使用在波長400~700nm下之吸光度小之素材為較佳,使用在波長400~700nm下之吸光度的最大值為0.05以下之素材為更佳,使用前述最大值為0.03以下之素材為進一步較佳。又,本發明的組成物在製造出膜厚2μm的膜時,前述膜在波長550nm的光的折射率為1.5以上,1.52以上為較佳,1.54以上為更佳。上限為2.0以下為較佳,1.85以下為更佳。該種折射率的條件能夠藉由使透鏡用組成物含有在波長550nm的光的折射率高之素材來實現。 本發明的組成物滿足上述吸光度及折射率的條件,藉此能夠減少光量的損失,其結果能夠更加提高亮度。 又,本發明的透鏡用組成物為用於顯示裝置所包括之濾色器具有複數個顏色的像素且在該等像素的至少一部分的像素的光徑上形成透鏡者為較佳。When the composition of the present invention produces a film having a film thickness of 2 μm, the maximum absorbance of the film at a wavelength of 400 to 700 nm is 0.05 or less, preferably 0.04 or less, and more preferably 0.03 or less. In order to realize the conditions of this kind of absorbance, as the material used in the lens composition, it is preferable to use a material with a small absorbance at a wavelength of 400 to 700 nm, and the maximum value of the absorbance at a wavelength of 400 to 700 nm is 0.05 or less The material is more preferable, and the material with the aforementioned maximum value of 0.03 or less is more preferably used. In addition, when the composition of the present invention produces a film having a thickness of 2 μm, the refractive index of the film at a wavelength of 550 nm is 1.5 or more, preferably 1.52 or more, and more preferably 1.54 or more. The upper limit is preferably 2.0 or less, and more preferably 1.85 or less. The conditions of this kind of refractive index can be realized by including the lens composition with a material having a high refractive index of light at a wavelength of 550 nm. The composition of the present invention satisfies the aforementioned conditions of absorbance and refractive index, whereby the loss of light quantity can be reduced, and as a result, the brightness can be further improved. In addition, the lens composition of the present invention is preferably a pixel having a plurality of colors for a color filter included in a display device, and a lens is formed on an optical path of at least a part of the pixels of the pixels.
以下,對本發明的透鏡用組成物進行詳細說明。Hereinafter, the lens composition of the present invention will be described in detail.
<<聚合性單體>> 本發明的透鏡用組成物含有聚合性單體。作為聚合性單體,可列舉具有乙烯性不飽和基之化合物等。作為乙烯性不飽和基,可列舉乙烯基、(甲基)烯丙基、(甲基)丙烯醯基等。聚合性單體為能夠藉由自由基聚合之化合物(自由基聚合性單體)為較佳。<<Polymerizable monomer>> The composition for lenses of the present invention contains a polymerizable monomer. Examples of the polymerizable monomer include compounds having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, (meth)allyl group, (meth)acryloyl group and the like. The polymerizable monomer is preferably a compound (radical polymerizable monomer) that can be polymerized by radicals.
聚合性單體的分子量為100~2000為較佳。上限為1500以下為較佳,1000以下為更佳。下限為150以上為更佳,250以上為進一步較佳。The molecular weight of the polymerizable monomer is preferably from 100 to 2000. The upper limit is preferably 1500 or less, and more preferably 1000 or less. The lower limit is more preferably 150 or more, and more preferably 250 or more.
從組成物的經時穩定性的觀點考慮,聚合性單體的乙烯性不飽和基值(以下,稱為C=C值)為2~14mmol/g為較佳。下限為3mmol/g以上為較佳,4mmol/g以上為更佳,5mmol/g以上為進一步較佳。上限為12mmol/g以下為較佳,10mmol/g以下為更佳,8mmol/g以下為進一步較佳。藉由聚合性單體的1分子中所包含之乙烯性不飽和基的數除以聚合性單體的分子量來算出聚合性單體的C=C值。From the viewpoint of the stability over time of the composition, the ethylenically unsaturated group value of the polymerizable monomer (hereinafter, referred to as C=C value) is preferably 2 to 14 mmol/g. The lower limit is preferably 3 mmol/g or more, more preferably 4 mmol/g or more, and further preferably 5 mmol/g or more. The upper limit is preferably 12 mmol/g or less, more preferably 10 mmol/g or less, and even more preferably 8 mmol/g or less. The C=C value of the polymerizable monomer is calculated by dividing the number of ethylenically unsaturated groups contained in one molecule of the polymerizable monomer by the molecular weight of the polymerizable monomer.
聚合性單體為包含3個以上的乙烯性不飽和基之化合物為較佳,包含4個以上的乙烯性不飽和基之化合物為更佳。乙烯性不飽和基的上限為15個以下為較佳,10個以下為更佳,6個以下為進一步較佳。又,聚合性單體為3官能以上的(甲基)丙烯酸酯化合物為較佳。The polymerizable monomer is preferably a compound containing 3 or more ethylenically unsaturated groups, and more preferably a compound containing 4 or more ethylenically unsaturated groups. The upper limit of the ethylenically unsaturated group is preferably 15 or less, more preferably 10 or less, and further preferably 6 or less. In addition, it is preferable that the polymerizable monomer is a (meth)acrylate compound having three or more functions.
聚合性單體為包含乙烯性不飽和基及伸烷氧基之化合物亦為較佳。該種聚合性單體的柔軟性高,乙烯性不飽和基容易移動,因此在曝光時聚合性單體容易彼此反應,能夠形成與支撐體等的密接性優異之透鏡。又,當使用羥基烷基苯酮化合物作為光聚合起始劑時,可推測聚合性單體與光聚合起始劑接近並在聚合性單體的附近產生自由基而能夠使聚合性單體更有效地反應,並且容易形成具有更優異的密接性和耐溶劑性之透鏡。The polymerizable monomer is preferably a compound containing an ethylenically unsaturated group and an alkoxy group. Such a polymerizable monomer has high flexibility and the ethylenically unsaturated group is easy to move. Therefore, the polymerizable monomer easily reacts with each other during exposure, and a lens with excellent adhesion to a support or the like can be formed. In addition, when a hydroxyalkyl benzophenone compound is used as a photopolymerization initiator, it is presumed that the polymerizable monomer is close to the photopolymerization initiator and generates radicals in the vicinity of the polymerizable monomer, which can make the polymerizable monomer more It reacts efficiently, and it is easy to form a lens with more excellent adhesion and solvent resistance.
聚合性單體的1分子中所包含之伸烷氧基的數為3個以上為較佳,4個以上為更佳。從組成物的經時穩定性的觀點考慮,上限係20個以下為較佳。The number of alkylene oxide groups contained in one molecule of the polymerizable monomer is preferably 3 or more, and more preferably 4 or more. From the viewpoint of the stability over time of the composition, the upper limit is preferably 20 or less.
又,從與組成物中其他成分的相容性的觀點考慮,包含乙烯性不飽和基及伸烷氧基之化合物的SP值(Solubility Parameter,溶解度參數)為9.0~11.0為較佳。上限為10.75以下為較佳,10.5以下為更佳。下限為9.25以上為較佳,9.5以上為進一步較佳。再者,本說明書中,SP值使用了基於Fedors法之計算值。From the viewpoint of compatibility with other components in the composition, the SP value (Solubility Parameter) of the compound containing an ethylenically unsaturated group and an alkoxy group is preferably 9.0 to 11.0. The upper limit is preferably 10.75 or less, and more preferably 10.5 or less. The lower limit is preferably 9.25 or more, and more preferably 9.5 or more. In addition, in this specification, the SP value uses the calculation value based on the Fedors method.
作為聚合性單體,還能夠使用二新戊四醇三丙烯酸酯(作為市售品為KAYARAD D-330;NIPPON KAYAKU CO.,Ltd.製)、二新戊四醇四丙烯酸酯(作為市售品為KAYARAD D-320;NIPPON KAYAKU CO.,Ltd.製)、二新戊四醇五(甲基)丙烯酸酯(作為市售品為KAYARAD D-310;NIPPON KAYAKU CO.,Ltd.製)、二新戊四醇六(甲基)丙烯酸酯(作為市售品為KAYARAD DPHA;NIPPON KAYAKU CO.,Ltd.製造、NK酯A-DPH-12E;SHIN-NAKAMURA CHEMICAL CO.,Ltd.製)、及該等之(甲基)丙烯醯基經由乙二醇和/或丙二醇殘基鍵結之結構的化合物(例如由SARTOMER Company,Inc.市售之SR454、SR499)。又,作為聚合性單體,還能夠使用三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基丙烷環氧丙烷改質三(甲基)丙烯酸酯、三羥甲基丙烷環氧乙烷改質三(甲基)丙烯酸酯、异氰脲酸環氧乙烷改質三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯等3官能的(甲基)丙烯酸酯化合物。作為3官能的(甲基)丙烯酸酯化合物的市售品,可列舉ARONIX M-309、M-310、M-321、M-350、M-360、M-313、M-315、M-306、M-305、M-303、M-452、M-450(TOAGOSEI CO., LTD.製)、NK酯A9300、A-GLY-9E、A-GLY-20E、A-TMM-3、A-TMM-3L、A-TMM-3LM-N、A-TMPT、TMPT(Shin-Nakamura Chemical Co., Ltd.製)、KAYARAD GPO-303、TMPTA、THE-330、TPA-330、PET-30(Nippon Kayaku Co.,Ltd.製)等。As the polymerizable monomer, dipentaerythritol triacrylate (available as KAYARAD D-330 as a commercially available product; manufactured by NIPPON KAYAKU CO., Ltd.) and dipentaerythritol tetraacrylate (commercially available) can also be used. The product is KAYARAD D-320; manufactured by NIPPON KAYAKU CO., Ltd.), dipentaerythritol penta(meth)acrylate (as a commercially available product, KAYARAD D-310; manufactured by NIPPON KAYAKU CO., Ltd.), Dipentaerythritol hexa(meth)acrylate (available commercially as KAYARAD DPHA; manufactured by NIPPON KAYAKU CO., Ltd., NK ester A-DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL CO., Ltd.), And these (meth)acryl acetyl groups are bonded via ethylene glycol and/or propylene glycol residues (for example, SR454, SR499 commercially available from SARTOMER Company, Inc.). Furthermore, as the polymerizable monomer, trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide can also be used Alkyl modified tri (meth) acrylate, isocyanuric acid ethylene oxide modified tri (meth) acrylate, pentaerythritol tri (meth) acrylate and other trifunctional (meth) acrylate compounds. Examples of commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306 , M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A- TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (Nippon Manufactured by Kayaku Co., Ltd.).
聚合性單體可以具有酸基。作為酸基,可列舉羧基、磺酸基、磷酸基等,羧基為較佳。作為具有酸基之聚合性單體的市售品,可列舉ARONIX M-510、M-520、ARONIX TO-2349(TOAGOSEI CO.,LTD.製)等。The polymerizable monomer may have an acid group. Examples of the acid group include a carboxyl group, a sulfonic acid group, and a phosphoric acid group, and the carboxyl group is preferred. As a commercially available product of the polymerizable monomer having an acid group, ARONIX M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), etc. may be mentioned.
具有酸基之聚合性單體的較佳酸值為0.1~40mgKOH/g,更佳為5~30mgKOH/g。聚合性單體的酸值只要為0.1mgKOH/g以上,則對顯影液之溶解性良好,只要為40mgKOH/g以下,則在製造或處理上有利。The preferred acid value of the polymerizable monomer having an acid group is 0.1 to 40 mgKOH/g, and more preferably 5 to 30 mgKOH/g. As long as the acid value of the polymerizable monomer is 0.1 mgKOH/g or more, the solubility in the developer is good, and if it is 40 mgKOH/g or less, it is advantageous in manufacturing or handling.
聚合性單體係具有己內酯結構之化合物亦為較佳。具有己內酯結構之聚合性化合物例如由NIPPON KAYAKU CO.,Ltd.作為KAYARAD DPCA系列而在市場上出售,可列舉DPCA-20、DPCA-30、DPCA-60、DPCA-120等。Compounds having a polymerizable monosystem having a caprolactone structure are also preferred. The polymerizable compound having a caprolactone structure is sold on the market as KAYARAD DPCA series by NIPPON KAYAKU CO., Ltd., for example, DPCA-20, DPCA-30, DPCA-60, DPCA-120 and the like.
聚合性單體使用日本特開2017-048367號公報、日本專利第6057891號公報、日本專利第6031807號公報中所記載之化合物、日本特開2017-194662號公報中所記載之化合物、8UH-1006、8UH-1012(以上,Taisei Fine Chemical Co., Ltd.製)、Light-Acrylate POB-A0(KYOEISHA CHEMICAL Co.,LTD.製)等亦為較佳。As the polymerizable monomer, the compounds described in Japanese Patent Laid-Open No. 2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, the compound described in Japanese Patent Laid-Open No. 2017-194662, 8UH-1006 , 8UH-1012 (above, manufactured by Taisei Fine Chemical Co., Ltd.), Light-Acrylate POB-A0 (manufactured by KYOEISHA CHEMICAL Co., LTD.), etc. are also preferred.
聚合性單體的含量在透鏡用組成物的總固體成分中為10~60質量%為較佳。上限為55質量%以下為較佳,50質量%以下為更佳。下限為15質量%以上為較佳,30質量%以上為更佳。The content of the polymerizable monomer is preferably 10 to 60% by mass in the total solid content of the lens composition. The upper limit is preferably 55% by mass or less, and more preferably 50% by mass or less. The lower limit is preferably 15% by mass or more, and more preferably 30% by mass or more.
<<光聚合起始劑>> 本發明的透鏡用組成物含有光聚合起始劑。作為光聚合起始劑,可列舉鹵化烴衍生物(例如,具有三𠯤骨架之化合物、具有噁二唑骨架之化合物等)、醯基膦氧化物等醯基膦化合物、六芳基雙咪唑化合物、肟衍生物等肟化合物、有機過氧化物、硫化合物、酮化合物、芳香族鎓鹽、酮肟醚化合物、胺基烷基苯酮化合物、羥基烷基苯酮化合物、苯甲醯甲酸酯化合物等。作為光聚合起始劑的具體例,例如能夠參閱日本特開2013-029760號公報的0265~0268段、日本專利第6301489號公報的記載,將該內容編入本說明書中。<<Photopolymerization initiator>> The lens composition of the present invention contains a photopolymerization initiator. Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, a compound having a three-dimensional skeleton, a compound having an oxadiazole skeleton, etc.), an acylphosphine compound such as an acylphosphine oxide, and a hexaarylbisimidazole compound , Oxime derivatives and other oxime compounds, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, ketoxime ether compounds, aminoalkyl benzophenone compounds, hydroxyalkyl benzophenone compounds, benzoate Compounds etc. As specific examples of the photopolymerization initiator, for example, refer to paragraphs 0265 to 0268 of Japanese Patent Laid-Open No. 2013-029760, and the description of Japanese Patent No. 6301489, and this content is incorporated in this specification.
作為苯甲醯甲酸酯化合物,可列舉苯甲醯甲酸甲酯等。作為市售品,可列舉DAROCUR-MBF(BASF公司製)等。Examples of the benzoyl formate compound include methyl benzoyl formate. Examples of commercially available products include DAROCUR-MBF (manufactured by BASF).
作為胺基烷基苯酮化合物,例如可列舉日本特開平10-291969號公報中所記載的胺基烷基苯酮化合物。又,作為胺基烷基苯酮化合物,亦能夠使用IRGACURE-907、IRGACURE-369、IRGACURE-379(均為BASF公司製)。Examples of the aminoalkyl benzophenone compounds include those disclosed in Japanese Patent Laid-Open No. 10-291969. In addition, as the aminoalkyl benzophenone compound, IRGACURE-907, IRGACURE-369, and IRGACURE-379 (all made by BASF) can also be used.
作為醯基膦化合物,可列舉日本專利第4225898號公報中所記載的醯基膦化合物。作為具體例,可列舉雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等。作為醯基膦化合物,亦能夠使用IRGACURE-819、DAROCUR-TPO(均為BASF公司製)。Examples of the acylphosphine compound include the acylphosphine compound described in Japanese Patent No. 4225898. Specific examples include bis(2,4,6-trimethylbenzyl)-phenylphosphine oxide and the like. As the acetylphosphine compound, IRGACURE-819 and DAROCUR-TPO (all manufactured by BASF) can also be used.
作為羥基烷基苯酮化合物,可列舉由下述式(V)所表示之化合物。 式(V) [化學式3] 式中Rv1 表示取代基,Rv2 及Rv3 分別獨立地表示氫原子或取代基,Rv2 和Rv3 亦可以彼此鍵結而形成環,m表示0~5的整數。Examples of the hydroxyalkyl benzophenone compound include compounds represented by the following formula (V). Formula (V) [Chemical Formula 3] In the formula, Rv 1 represents a substituent, Rv 2 and Rv 3 each independently represent a hydrogen atom or a substituent, Rv 2 and Rv 3 may also be bonded to each other to form a ring, and m represents an integer of 0 to 5.
作為Rv1 所表示之取代基,可列舉烷基(碳數1~10的烷基為較佳)、烷氧基(碳數1~10的烷氧基為較佳)。烷基及烷氧基為直鏈或分支為較佳,直鏈為更佳。Rv1 所表示之烷基及烷氧基可以為未經取代,亦可以具有取代基。作為取代基,可列舉羥基或具有羥基烷基苯酮結構之基團等。作為具有羥基烷基苯酮結構之基團,可列舉式(V)中之Rv1 所鍵結之苯環或從Rv1 去除1個氫原子之結構的基團。Examples of the substituent represented by Rv 1 include an alkyl group (preferably an alkyl group having 1 to 10 carbon atoms) and an alkoxy group (preferably an alkoxy group having 1 to 10 carbon atoms). The alkyl group and the alkoxy group are preferably linear or branched, and more preferably linear. The alkyl group and alkoxy group represented by Rv 1 may be unsubstituted or may have a substituent. Examples of the substituent include a hydroxy group or a group having a hydroxyalkyl benzophenone structure. Examples of the group having a hydroxyalkyl benzophenone structure include a benzene ring bonded to Rv 1 in formula (V) or a group having a structure in which one hydrogen atom is removed from Rv 1 .
Rv2 及Rv3 分別獨立地表示氫原子或取代基。作為取代基,烷基(碳數1~10的烷基為較佳)為較佳。又,Rv2 和Rv3 亦可以彼此鍵結而形成環(碳數4~8的環為較佳,碳數4~8的脂肪族環為更佳)。烷基為直鏈或分支為較佳,直鏈為更佳。Rv 2 and Rv 3 each independently represent a hydrogen atom or a substituent. As the substituent, an alkyl group (preferably an alkyl group having 1 to 10 carbon atoms) is preferred. In addition, Rv 2 and Rv 3 may be bonded to each other to form a ring (a ring having 4 to 8 carbon atoms is preferable, and an aliphatic ring having 4 to 8 carbon atoms is more preferable). The alkyl group is preferably straight chain or branched, and more preferably straight chain.
作為由式(V)所表示之化合物的具體例,可列舉下述化合物。 [化學式4] As specific examples of the compound represented by the formula (V), the following compounds may be mentioned. [Chemical Formula 4]
作為羥基烷基苯酮化合物,亦能夠使用IRGACURE-184、DAROCUR-1173、IRGACURE-500、IRGACURE-2959、IRGACURE-127(產品名:均為BASF公司製)。As the hydroxyalkyl benzophenone compound, IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (product names: all manufactured by BASF) can also be used.
作為肟化合物,可列舉日本特開2001-233842號公報中所記載的化合物、日本特開2000-080068號公報中所記載的化合物、日本特開2006-342166號公報中所記載的化合物、J.C.S.Perkin II(1979年,pp.1653-1660)中所記載的化合物、J.C.S.Perkin II(1979年,pp.156-162)中所記載的化合物、Journal of Photopolymer Science and Technology(1995年,pp.202-232)中所記載的化合物、日本特開2000-066385號公報中所記載的化合物、日本特表2004-534797號公報中所記載的化合物、日本特開2006-342166號公報中所記載的化合物、日本特開2017-019766號公報中所記載的化合物、日本專利第6065596號公報中所記載的化合物、國際公開第2015/152153號中所記載的化合物、國際公開第2017/051680號中所記載的化合物、日本特開2017-198865號公報中所記載的化合物、國際公開第2017/164127號的0025~0038段中所記載的化合物等。作為肟化合物的具體例,可列舉3-苯甲醯氧基亞胺基丁烷-2-酮、3-乙醯氧基亞胺基丁烷-2-酮、3-丙醯氧基亞胺基丁烷-2-酮、2-乙醯氧基亞胺基戊烷-3-酮、2-乙醯氧基亞胺基-1-苯基丙烷-1-酮、2-苯甲醯氧基亞胺基-1-苯基丙烷-1-酮、3-(4-甲苯磺醯氧基)亞胺基丁烷-2-酮、以及2-乙氧基羰氧基亞胺基-1-苯基丙烷-1-酮等。作為市售品,可列舉IRGACURE-OXE01、IRGACURE-OXE02、IRGACURE-OXE03、IRGACURE-OXE04(以上,BASF公司製)、TR-PBG-304(Changzhou Tronly New Electronic Materials CO.,LTD.製)、Adeka Optomer N-1919(ADEKA CORPORATION製、日本特開2012-014052號公報中所記載的光聚合起始劑2)。Examples of the oxime compound include the compounds described in Japanese Patent Laid-Open No. 2001-233842, the compounds described in Japanese Patent Laid-Open No. 2000-080068, the compounds described in Japanese Patent Laid-Open No. 2006-342166, and JCSPerkin Compounds described in II (1979, pp. 1653-1660), compounds described in JCS Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202- 232) The compound described in JP 2000-066385, the compound described in JP 2004-534797, the compound described in JP 2006-342166, The compound described in Japanese Patent Application Publication No. 2017-019766, the compound described in Japanese Patent No. 6065596, the compound described in International Publication No. 2015/152153, and the compound described in International Publication No. 2017/051680 Compounds, compounds described in Japanese Patent Laid-Open No. 2017-198865, compounds described in paragraphs 0025 to 0038 of International Publication No. 2017/164127, and the like. Specific examples of the oxime compound include 3-benzyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyimide Butane-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxy Imino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutane-2-one, and 2-ethoxycarbonyloxyimino-1 -Phenylpropan-1-one and the like. Examples of commercially available products include IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, IRGACURE-OXE04 (above, manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Tronly New Electronic Materials CO., LTD.), Adeka Optomer N-1919 (photopolymerization initiator 2 described in ADEKA CORPORATION, Japanese Unexamined Patent Publication No. 2012-014052).
又,作為肟化合物,可以使用肟連接於咔唑環的N位之日本特表2009-519904號公報中所記載的化合物、雜取代基被導入到二苯甲酮部位之美國專利第7626957號公報中所記載的化合物、硝基被導入到色素部位之日本特開2010-015025號公報及美國專利公開2009-292039號公報中所記載的化合物、國際公開第2009/131189號所記載的酮肟化合物、在同一分子內含有三𠯤骨架和肟骨架之美國專利7556910號公報中所記載的化合物、在405nm具有吸收極大且對g線光源具有良好的靈敏度之日本特開2009-221114號公報中所記載的化合物等。較佳為例如能夠參閱日本特開2013-029760號公報的0274~0306段,將該內容編入本說明書中。Further, as the oxime compound, the compound described in Japanese Patent Publication No. 2009-519904 in which the oxime is connected to the N position of the carbazole ring, and US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone site can be used The compound described in JP-A No. 2010-015025 and the compound disclosed in US Patent Publication No. 2009-292039, and the ketoxime compound described in International Publication No. 2009/131189 , The compound described in US Patent No. 7556910, which contains a trio and oxime skeleton in the same molecule, has a maximum absorption at 405 nm and is described in Japanese Patent Laid-Open No. 2009-221114 which has good sensitivity to a g-line light source Compounds etc. Preferably, for example, it is possible to refer to paragraphs 0274 to 0306 of Japanese Patent Laid-Open No. 2013-029760, and incorporate the contents into this specification.
肟化合物為包含氟原子之肟化合物為較佳。包含氟原子之肟化合物具有包含氟原子之基團為較佳。包含氟原子之基團為具有氟原子之烷基(以下,亦稱為含氟烷基)及包含具有氟原子之烷基之基團(以下,亦稱為含氟基團)為較佳。作為含氟基團,選自-ORF1 、-SRF1 、-CORF1 、-COORF1 、-OCORF1 、-NRF1 RF2 、-NHCORF1 、-CONRF1 RF2 、-NHCONRF1 RF2 、-NHCOORF1 、-SO2 RF1 、-SO2 ORF1 及-NHSO2 RF1 中之至少1種基團為較佳。RF1 表示含氟烷基,RF2 表示氫原子、烷基、含氟烷基、芳基或雜環基。含氟基團為-ORF1 為較佳。The oxime compound is preferably an oxime compound containing a fluorine atom. It is preferable that the oxime compound containing a fluorine atom has a group containing a fluorine atom. The group containing a fluorine atom is preferably an alkyl group having a fluorine atom (hereinafter, also referred to as a fluorine-containing alkyl group) and a group containing an alkyl group having a fluorine atom (hereinafter, also referred to as a fluorine-containing group). As a fluorine-containing group, it is selected from -OR F1 , -SR F1 , -COR F1 , -COOR F1 , -OCOR F1 , -NR F1 R F2 , -NHCOR F1 , -CONR F1 R F2 , -NHCONR F1 R F2 , At least one group of -NHCOOR F1 , -SO 2 R F1 , -SO 2 OR F1, and -NHSO 2 R F1 is preferred. R F1 represents a fluorine-containing alkyl group, and R F2 represents a hydrogen atom, an alkyl group, a fluorine-containing alkyl group, an aryl group, or a heterocyclic group. The fluorine-containing group is preferably -OR F1 .
烷基及含氟烷基的碳數為1~20為較佳,1~15為更佳,1~10為進一步較佳,1~4為特佳。烷基及含氟烷基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳。含氟烷基中,氟原子的取代率為40~100%為較佳,50~100%為更佳,60~100%為進一步較佳。再者,氟原子的取代率是指被氟原子取代之數相對於烷基所具有之所有氫原子的數的比率(%)。The carbon number of the alkyl group and the fluorine-containing alkyl group is preferably from 1 to 20, more preferably from 1 to 15, more preferably from 1 to 10, and particularly preferably from 1 to 4. The alkyl group and the fluorine-containing alkyl group may be any of linear, branched, and cyclic, and linear or branched is preferred. In the fluorine-containing alkyl group, the substitution rate of the fluorine atom is preferably 40 to 100%, more preferably 50 to 100%, and further preferably 60 to 100%. In addition, the substitution rate of a fluorine atom means the ratio (%) of the number of fluorine atoms substituted with respect to the number of all hydrogen atoms which an alkyl group has.
芳基的碳數為6~20為較佳,6~15為更佳,6~10為進一步較佳。The carbon number of the aryl group is preferably 6-20, more preferably 6-15, and even more preferably 6-10.
雜環基為5員環或6員環為較佳。雜環基可以為單環,亦可以為縮合環。縮合數為2~8為較佳,2~6為更佳,3~5為進一步較佳,3~4為特佳。構成雜環基之碳原子的數為3~40為較佳,3~30為更佳,3~20為更佳。構成雜環基之雜原子的數為1~3為較佳。構成雜環基之雜原子為氮原子、氧原子或硫原子為較佳,氮原子為更佳。The heterocyclic group is preferably a 5-membered ring or a 6-membered ring. The heterocyclic group may be a single ring or a condensed ring. The condensation number is preferably 2-8, more preferably 2-6, further preferably 3-5, and particularly preferably 3-4. The number of carbon atoms constituting the heterocyclic group is preferably 3 to 40, more preferably 3 to 30, and even more preferably 3 to 20. The number of hetero atoms constituting the heterocyclic group is preferably 1 to 3. The hetero atom constituting the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom, and a nitrogen atom is more preferable.
包含氟原子之基團具有由式(1)或(2)表示之末端結構為較佳。式中的*表示連接鍵。 *-CHF2 (1) *-CF3 (2)It is preferable that the group containing a fluorine atom has a terminal structure represented by formula (1) or (2). * In the formula represents the connection key. *-CHF 2 (1) *-CF 3 (2)
包含氟原子之肟化合物中的所有氟原子數為3以上為較佳,4~10為更佳。The number of all fluorine atoms in the oxime compound containing fluorine atoms is preferably 3 or more, and more preferably 4-10.
包含氟原子之肟化合物為由式(OX-1)表示之化合物為較佳。 (OX-1) [化學式5] 式(OX-1)中,Ar1 及Ar2 分別獨立地表示可以具有取代基之芳香族烴環,R1 表示具有包含氟原子之基團之芳基,R2 及R3 分別獨立地表示烷基或芳基。The oxime compound containing a fluorine atom is preferably a compound represented by formula (OX-1). (OX-1) [Chemical Formula 5] In formula (OX-1), Ar 1 and Ar 2 each independently represent an aromatic hydrocarbon ring which may have a substituent, R 1 represents an aryl group having a group containing a fluorine atom, and R 2 and R 3 each independently represent Alkyl or aryl.
Ar1 及Ar2 分別獨立地表示可以具有取代基之芳香族烴環。芳香族烴環可以為單環,亦可以為縮合環。構成芳香族烴環的環之碳原子數為6~20為較佳,6~15為更佳,6~10為特佳。芳香族烴環為苯環及萘環為較佳。其中,Ar1 及Ar2 中的至少一個為苯環為較佳,Ar1 為苯環為更佳。Ar2 為苯環或萘環為較佳,萘環為更佳。Ar 1 and Ar 2 each independently represent an aromatic hydrocarbon ring which may have a substituent. The aromatic hydrocarbon ring may be a single ring or a condensed ring. The number of carbon atoms of the ring constituting the aromatic hydrocarbon ring is preferably 6-20, more preferably 6-15, and particularly preferably 6-10. The aromatic hydrocarbon ring is preferably a benzene ring or a naphthalene ring. Among them, it is preferable that at least one of Ar 1 and Ar 2 is a benzene ring, and it is more preferable that Ar 1 is a benzene ring. Ar 2 is preferably a benzene ring or a naphthalene ring, and more preferably a naphthalene ring.
作為Ar1 及Ar2 可以具有之取代基,可列舉烷基、芳基、雜環基、硝基、氰基、鹵素原子、-ORX1 、-SRX1 、-CORX1 、-COORX1 、-OCORX1 、-NRX1 RX2 、-NHCORX1 、-CONRX1 RX2 、-NHCONRX1 RX2 、-NHCOORX1 、-SO2 RX1 、-SO2 ORX1 及-NHSO2 RX1 等。RX1 及RX2 分別獨立地表示氫原子、烷基、芳基或雜環基。 鹵素原子可列舉氟原子、氯原子、溴原子及碘原子等,氟原子為較佳。作為取代基的烷基以及RX1 及RX2 所表示之烷基的碳數為1~30為較佳。烷基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳。烷基中,氫原子的一部分或全部可以由鹵素原子(較佳為氟原子)所取代。又,烷基中,氫原子的一部分或全部可以由上述取代基所取代。作為取代基的芳基以及RX1 及RX2 所表示之芳基的碳數為6~20為較佳,6~15為更佳,6~10為進一步較佳。芳基可以為單環,亦可以為縮合環。又,芳基中,氫原子的一部分或全部可以由上述取代基所取代。作為取代基的雜環基以及RX1 及RX2 所表示之雜環基係5員環或6員環為較佳。雜環基可以為單環,亦可以為縮合環。構成雜環基之碳原子的數為3~30為較佳,3~18為更佳,3~12為更佳。構成雜環基之雜原子的數為1~3為較佳。構成雜環基之雜原子為氮原子、氧原子或硫原子為較佳。又,雜環基中,氫原子的一部分或全部可以由上述取代基所取代。Examples of substituents that Ar 1 and Ar 2 may have include alkyl groups, aryl groups, heterocyclic groups, nitro groups, cyano groups, halogen atoms, -OR X1 , -SR X1 , -COR X1 , -COOR X1 ,- OCOR X1 , -NR X1 R X2 , -NHCOR X1 , -CONR X1 R X2 , -NHCONR X1 R X2 , -NHCOOR X1 , -SO 2 R X1 , -SO 2 OR X1 and -NHSO 2 R X1 and so on. R X1 and R X2 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group. Examples of the halogen atom include fluorine atom, chlorine atom, bromine atom and iodine atom, and fluorine atom is preferred. The carbon number of the alkyl group as a substituent and the alkyl group represented by R X1 and R X2 is preferably 1 to 30. The alkyl group may be any of linear, branched, and cyclic, and linear or branched is preferred. In the alkyl group, part or all of the hydrogen atoms may be substituted with halogen atoms (preferably fluorine atoms). In addition, in the alkyl group, a part or all of the hydrogen atoms may be substituted with the above substituents. The carbon number of the aryl group as a substituent and the aryl group represented by R X1 and R X2 is preferably 6-20, more preferably 6-15, and even more preferably 6-10. The aryl group may be a single ring or a condensed ring. In addition, in the aryl group, part or all of the hydrogen atom may be substituted with the above-mentioned substituent. The heterocyclic group as a substituent and the heterocyclic group represented by R X1 and R X2 are preferably a 5-membered ring or a 6-membered ring. The heterocyclic group may be a single ring or a condensed ring. The number of carbon atoms constituting the heterocyclic group is preferably 3-30, more preferably 3-18, and even more preferably 3-12. The number of hetero atoms constituting the heterocyclic group is preferably 1 to 3. The hetero atom constituting the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. In addition, in the heterocyclic group, a part or all of the hydrogen atoms may be substituted with the above substituents.
Ar1 所表示之芳香族烴環為未經取代為較佳。Ar2 所表示之芳香族烴環可以為未經取代,亦可以具有取代基。具有取代基為較佳。作為取代基,-CORX1 為較佳。RX1 為烷基、芳基或雜環基為較佳,芳基為更佳。芳基可以具有取代基,亦可以為未經取代。作為取代基,可列舉碳數1~10的烷基等。The aromatic hydrocarbon ring represented by Ar 1 is preferably unsubstituted. The aromatic hydrocarbon ring represented by Ar 2 may be unsubstituted or may have a substituent. Having a substituent is preferable. As a substituent, -COR X1 is preferred. R X1 is preferably an alkyl group, an aryl group or a heterocyclic group, more preferably an aryl group. The aryl group may have a substituent, or may be unsubstituted. Examples of the substituent include alkyl groups having 1 to 10 carbon atoms.
R1 表示具有包含氟原子之基團之芳基。芳基的碳數為6~20為較佳,6~15為更佳,6~10為進一步較佳。包含氟原子之基團為包含具有氟原子之烷基(含氟烷基)及具有氟原子之烷基之基團(含氟基團)為較佳。關於包含氟原子之基團,與上述範圍含義相同,較佳範圍亦相同。R 1 represents an aryl group having a group containing a fluorine atom. The carbon number of the aryl group is preferably 6-20, more preferably 6-15, and even more preferably 6-10. The group containing a fluorine atom is preferably an alkyl group containing a fluorine atom (fluorine-containing alkyl group) and a group containing a fluorine atom alkyl group (a fluorine-containing group). The group containing a fluorine atom has the same meaning as the above range, and the preferred range is also the same.
R2 表示烷基或芳基,烷基為較佳。烷基及芳基可以為未經取代,亦可以具有取代基。作為取代基,可列舉在上述Ar1 及Ar2 可以具有之取代基中所說明之取代基。烷基的碳數為1~20為較佳,1~15為更佳,1~10為進一步較佳,1~4為特佳。烷基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳。芳基的碳數為6~20為較佳,6~15為更佳,6~10為進一步較佳。R 2 represents an alkyl group or an aryl group, and an alkyl group is preferred. The alkyl group and the aryl group may be unsubstituted or may have a substituent. Examples of the substituent include the substituents described above for the substituents that Ar 1 and Ar 2 may have. The carbon number of the alkyl group is preferably from 1 to 20, more preferably from 1 to 15, more preferably from 1 to 10, and particularly preferably from 1 to 4. The alkyl group may be any of linear, branched, and cyclic, and linear or branched is preferred. The carbon number of the aryl group is preferably 6-20, more preferably 6-15, and even more preferably 6-10.
R3 表示烷基或芳基,烷基為較佳。烷基及芳基可以為未經取代,亦可以具有取代基。作為取代基,可列舉在上述Ar1 及Ar2 可以具有之取代基中所說明之取代基。R3 所表示之烷基的碳數為1~20為較佳,1~15為更佳,1~10為進一步較佳。烷基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳。R3 所表示之芳基的碳數為6~20為較佳,6~15為更佳,6~10為進一步較佳。R 3 represents an alkyl group or an aryl group, and an alkyl group is preferred. The alkyl group and the aryl group may be unsubstituted or may have a substituent. Examples of the substituent include the substituents described above for the substituents that Ar 1 and Ar 2 may have. The carbon number of the alkyl group represented by R 3 is preferably from 1 to 20, more preferably from 1 to 15, and even more preferably from 1 to 10. The alkyl group may be any of linear, branched, and cyclic, and linear or branched is preferred. The carbon number of the aryl group represented by R 3 is preferably 6-20, more preferably 6-15, and even more preferably 6-10.
作為具有氟原子之肟化合物的具體例,可列舉日本特開2010-262028號公報中所記載的化合物、日本特表2014-500852號公報中所記載的化合物24、36~40、日本特開2013-164471號公報中所記載的化合物(C-3)等。Specific examples of the oxime compound having a fluorine atom include the compounds described in Japanese Patent Laid-Open No. 2010-262028, and the compounds 24, 36 to 40 described in Japanese Patent Laid-Open No. 2014-500852, and Japanese Patent Laid-Open 2013 -164471, the compound (C-3) etc. described.
又,作為肟化合物,亦能夠使用具有茀環之肟化合物。作為具有茀環之肟化合物的具體例,可列舉日本特開2014-137466號公報中所記載的化合物。將該內容編入本說明書中。In addition, as the oxime compound, an oxime compound having a fused ring can also be used. As a specific example of the oxime compound having a stilbene ring, the compounds described in Japanese Patent Laid-Open No. 2014-137466 can be cited. Incorporate this content into this manual.
又,肟化合物還能夠使用具有苯并呋喃骨架之肟化合物。作為具體例,可列舉國際公開第2015/036910號中所記載的化合物OE-01~OE-75。As the oxime compound, an oxime compound having a benzofuran skeleton can also be used. As specific examples, the compounds OE-01 to OE-75 described in International Publication No. 2015/036910 can be cited.
又,肟化合物還能夠使用具有咔唑環的至少1個苯環為萘環之骨架之肟化合物。作為該種肟化合物的具體例,可列舉國際公開第2013/083505號中所記載的化合物。In addition, as the oxime compound, an oxime compound having at least one benzene ring having a carbazole ring as a skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include the compounds described in International Publication No. 2013/083505.
又,肟化合物能夠使用具有硝基之肟化合物。具有硝基之肟化合物為二聚物亦為較佳。作為具有硝基之肟化合物的具體例,可列舉日本特開2013-114249號公報的0031~0047段、日本特開2014-137466號公報的0008~0012段、0070~0079段中所記載的化合物、日本專利4223071號公報的0007~0025段中所記載的化合物等。As the oxime compound, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group is a dimer. As specific examples of the oxime compound having a nitro group, the compounds described in paragraphs 0031 to 0047 of JP-A-2013-114249, paragraphs 0008-0012 and JP0-0079 of JP-A 2014-137466 can be cited. And the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071.
將肟化合物的具體例示於以下,但是本發明不限定於此。Specific examples of the oxime compound are shown below, but the present invention is not limited thereto.
[化學式6] [化學式7] [Chemical Formula 6] [Chemical Formula 7]
本發明中所使用之光聚合起始劑為滿足以下條件1之素材為較佳。 條件1:利用旋塗機將混合1質量份之光聚合起始劑、47.5質量份之下述結構的樹脂P1及51.5質量份之丙二醇單甲醚乙酸酯(PGMEA)來製備之組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於玻璃基板上,利用100℃的加熱板進行120秒鐘之加熱處理(預烘烤)來形成膜,在測量所形成之膜在波長400~700nm的範圍內的吸光度時,前述範圍內之吸光度的最大值為0.03以下。 樹脂P1:甲基丙烯酸苄酯/甲基丙烯酸(=70/30[莫耳比])共聚物的丙二醇單甲醚乙酸酯溶液(固體成分40質量%,重量平均分子量30000,FUJIKURA KASEI CO.,LTD.製,Acrybase FF-187)The photopolymerization initiator used in the present invention is preferably a material satisfying the following condition 1. Condition 1: A composition prepared by mixing 1 part by mass of a photopolymerization initiator, 47.5 parts by mass of resin P1 of the following structure, and 51.5 parts by mass of propylene glycol monomethyl ether acetate (PGMEA) using a spin coater: After pre-baking, the film thickness was 2.0 μm. It was applied to the glass substrate, and a 100° C. hot plate was used for 120 seconds of heat treatment (pre-baking) to form a film. The measured film was measured at a wavelength of 400 When the absorbance in the range of -700 nm is used, the maximum value of the absorbance in the aforementioned range is 0.03 or less. Resin P1: propylene glycol monomethyl ether acetate solution of benzyl methacrylate/methacrylic acid (=70/30 [mol ratio]) copolymer (solid content 40% by mass, weight average molecular weight 30000, FUJIKURA KASEI CO. , Manufactured by LTD., Acrybase FF-187)
在本發明中,作為光聚合起始劑,同時使用在甲醇中的波長365nm的吸光係數為1.0×103 mL/gcm以上的光聚合起始劑A1和在甲醇中的波長365nm的吸光係數為1.0×102 mL/gcm以下且在波長254nm的吸光係數為1.0×103 mL/gcm以上的光聚合起始劑A2為較佳。依該態樣,藉由曝光容易使透鏡用組成物充分硬化,能夠在低溫製程(例如遍及所有步驟在150℃以下的溫度,較佳為120℃以下的溫度)中製造耐溶劑性等特性優異之透鏡。因此,在低溫製程中製造透鏡時尤其有效。作為光聚合起始劑A1及光聚合起始劑A2,從上述化合物中選擇具有上述吸光係數之化合物來使用為較佳。In the present invention, as the photopolymerization initiator, a photopolymerization initiator A1 having a wavelength of 365 nm in methanol with an absorption coefficient of 1.0×10 3 mL/gcm or more and a wavelength of 365 nm in methanol are used simultaneously It is preferable that the photopolymerization initiator A2 is 1.0×10 2 mL/gcm or less and the absorption coefficient at a wavelength of 254 nm is 1.0×10 3 mL/gcm or more. According to this aspect, the composition for the lens can be sufficiently hardened by exposure, and can be produced in a low-temperature process (for example, a temperature of 150° C. or less in all steps, preferably a temperature of 120° C. or less), and has excellent characteristics such as solvent resistance. Of the lens. Therefore, it is particularly effective when manufacturing lenses in low temperature processes. As the photopolymerization initiator A1 and the photopolymerization initiator A2, it is preferable to select and use a compound having the above light absorption coefficient from the above compounds.
再者,本發明中,光聚合起始劑的上述波長下之吸光係數為如以下進行測量之值。亦即,藉由使光聚合起始劑溶解於甲醇中來製備測量溶液,並測量前述測量溶液的吸光度而算出。具體而言,將前述測量溶液加入到寬度1cm的玻璃皿,使用Agilent Technologies公司製UV-Vis-NIR光譜儀(Cary5000)來測量吸光度,代入到下述式,算出在波長365nm及波長254nm下之吸光係數(mL/gcm)。 [數式1] 上述式中,ε表示吸光係數(mL/gcm),A表示吸光度,c表示光聚合起始劑的濃度(g/mL),l表示光徑長(cm)。Furthermore, in the present invention, the light absorption coefficient of the photopolymerization initiator at the above wavelength is a value measured as follows. That is, the measurement solution is prepared by dissolving the photopolymerization initiator in methanol, and it is calculated by measuring the absorbance of the measurement solution. Specifically, the measurement solution was added to a glass dish with a width of 1 cm, and the absorbance was measured using a UV-Vis-NIR spectrometer (Cary5000) manufactured by Agilent Technologies, and substituted into the following formula to calculate the absorbance at a wavelength of 365 nm and a wavelength of 254 nm. Coefficient (mL/gcm). [Formula 1] In the above formula, ε represents the absorption coefficient (mL/gcm), A represents the absorbance, c represents the concentration of the photopolymerization initiator (g/mL), and l represents the optical path length (cm).
光聚合起始劑A1在甲醇中的波長365nm下之吸光係數為1.0×103 mL/gcm以上,1.0×104 mL/gcm以上為較佳,1.1×104 mL/gcm以上為更佳,1.2×104 ~1.0×105 mL/gcm為進一步較佳,1.3×104 ~5.0×104 mL/gcm為更進一步較佳,1.5×104 ~3.0×104 mL/gcm為特佳。 又,光聚合起始劑A1在甲醇中的波長254nm的光的吸光係數為1.0×104 ~1.0×105 mL/gcm為較佳,1.5×104 ~9.5×104 mL/gcm為更佳,3.0×104 ~8.0×104 mL/gcm為進一步較佳。The absorption coefficient of the photopolymerization initiator A1 at a wavelength of 365 nm in methanol is 1.0×10 3 mL/gcm or more, preferably 1.0×10 4 mL/gcm or more, and 1.1×10 4 mL/gcm or more, 1.2×10 4 ~1.0×10 5 mL/gcm is more preferred, 1.3×10 4 ~5.0×10 4 mL/gcm is even more preferred, 1.5×10 4 ~3.0×10 4 mL/gcm is particularly preferred . In addition, the absorption coefficient of the photopolymerization initiator A1 in methanol at a wavelength of 254 nm is preferably 1.0×10 4 to 1.0×10 5 mL/gcm, and 1.5×10 4 to 9.5×10 4 mL/gcm is more Preferably, 3.0×10 4 to 8.0×10 4 mL/gcm is more preferable.
作為光聚合起始劑A1,肟化合物、胺基烷基苯酮化合物、醯基膦化合物為較佳,肟化合物及醯基膦化合物為更佳,肟化合物為進一步較佳,從與組成物中所含有之其他成分的相容性的觀點考慮,包含氟原子之肟化合物為特佳。作為包含氟原子之肟化合物,由上述式(OX-1)表示之化合物為較佳。作為光聚合起始劑A1的具體例,可列舉1,2-辛二酮,1-[4-(苯硫基)-,2-(鄰苯甲醯基肟)](作為市售品,例如IRGACURE-OXE01,BASF公司製)、乙酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-,1-(鄰乙醯基肟)(作為市售品,例如IRGACURE-OXE02,BASF公司製)、雙(2,4,6-三甲基苯甲醯基)-苯膦氧化物(作為市售品,例如IRGACURE-819,BASF公司製)、上述肟化合物的具體例中示出之(C-13)、(C-14)等。As the photopolymerization initiator A1, oxime compounds, aminoalkyl benzophenone compounds, and acetylphosphine compounds are preferred, oxime compounds and acetylphosphine compounds are more preferred, and oxime compounds are further preferred. From the viewpoint of compatibility of other components contained, an oxime compound containing a fluorine atom is particularly preferred. As the oxime compound containing a fluorine atom, the compound represented by the above formula (OX-1) is preferred. Specific examples of the photopolymerization initiator A1 include 1,2-octanedione, 1-[4-(phenylthio)-,2-(o-benzoyl oxime)] (as a commercially available product, For example, IRGACURE-OXE01, manufactured by BASF), ethyl ketone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-,1-(o-ethyl Acetyl oxime) (as a commercial product, such as IRGACURE-OXE02, manufactured by BASF), bis(2,4,6-trimethylbenzyl)-phenylphosphine oxide (as a commercial product, such as IRGACURE- 819, manufactured by BASF), (C-13), (C-14), etc. shown in the specific examples of the above oxime compounds.
光聚合起始劑A2在甲醇中的波長365nm的光的吸光係數為1.0×102 mL/gcm以下,10~1.0×102 mL/gcm為較佳,20~1.0×102 mL/gcm為更佳。又,光聚合起始劑A1在甲醇中的波長365nm的光的吸光係數與光聚合起始劑A2在甲醇中的波長365nm的光的吸光係數之差為9.0×102 mL/gcm以上,1.0×103 mL/gcm以上為較佳,5.0×103 ~3.0×104 mL/gcm為更佳,1.0×104 ~2.0×104 mL/gcm為進一步較佳。又,光聚合起始劑A2在甲醇中的波長254nm的光的吸光係數係1.0×103 mL/gcm以上,1.0×103 ~1.0×106 mL/gcm為較佳,5.0×103 ~1.0×105 mL/gcm為更佳。The light absorption coefficient of the photopolymerization initiator A2 in methanol at a wavelength of 365 nm is 1.0×10 2 mL/gcm or less, preferably 10 to 1.0×10 2 mL/gcm, and 20 to 1.0×10 2 mL/gcm. Better. In addition, the difference between the absorption coefficient of the light of the photopolymerization initiator A1 in methanol at a wavelength of 365 nm and the absorption coefficient of the light of the photopolymerization initiator A2 in methanol at a wavelength of 365 nm is 9.0×10 2 mL/gcm or more, 1.0 ×10 3 mL/gcm or more is preferable, 5.0×10 3 to 3.0×10 4 mL/gcm is more preferable, and 1.0×10 4 to 2.0×10 4 mL/gcm is even more preferable. In addition, the absorption coefficient of the photopolymerization initiator A2 in methanol at a wavelength of 254 nm is 1.0×10 3 mL/gcm or more, preferably 1.0×10 3 to 1.0×10 6 mL/gcm, and 5.0×10 3 to 1.0×10 5 mL/gcm is better.
作為光聚合起始劑A2,羥基烷基苯酮化合物、苯甲醯甲酸酯化合物、胺基烷基苯酮化合物及醯基膦化合物為較佳,羥基烷基苯酮化合物及苯甲醯甲酸酯化合物為更佳,羥基烷基苯酮化合物為進一步較佳。又,作為羥基烷基苯酮化合物,由上述式(V)所表示之化合物為較佳。作為光聚合起始劑A2的具體例,可列舉1-羥基-環己基-苯基-酮(作為市售品,例如IRGACURE-184,BASF公司製)、1-[4-(2-羥基乙氧基)-苯基]-2-羥基-2-甲基-1-丙-1-酮(作為市售品,例如IRGACURE-2959,BASF公司製)等。As the photopolymerization initiator A2, a hydroxyalkyl benzophenone compound, a benzoate compound, an aminoalkyl benzophenone compound and an acetylphosphine compound are preferred, and a hydroxyalkyl benzophenone compound and a benzophenone The acid ester compound is more preferable, and the hydroxyalkyl benzophenone compound is more preferable. As the hydroxyalkyl benzophenone compound, the compound represented by the above formula (V) is preferred. Specific examples of the photopolymerization initiator A2 include 1-hydroxy-cyclohexyl-phenyl-one (as a commercial product, for example, IRGACURE-184, manufactured by BASF), 1-[4-(2-hydroxyethyl Oxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one (as a commercially available product, for example, IRGACURE-2959, manufactured by BASF), etc.
作為光聚合起始劑A1和光聚合起始劑A2的組合,光聚合起始劑A1係肟化合物且光聚合起始劑A2係羥基烷基苯酮化合物之組合為較佳,光聚合起始劑A1係肟化合物且光聚合起始劑A2係由上述式(V)所表示之化合物之組合為更佳,光聚合起始劑A1係包含氟原子之肟化合物且光聚合起始劑A2係由上述式(V)所表示之化合物之組合為特佳。藉由設為該種組合,能夠在低溫製程中製造耐溶劑性等特性優異之透鏡。進而,亦能夠製造起皺或空隙少之透鏡。As a combination of the photopolymerization initiator A1 and the photopolymerization initiator A2, the combination of the photopolymerization initiator A1 is an oxime compound and the photopolymerization initiator A2 is a hydroxyalkyl benzophenone compound. The photopolymerization initiator A1 is an oxime compound and the photopolymerization initiator A2 is a combination of compounds represented by the above formula (V). The photopolymerization initiator A1 is an oxime compound containing a fluorine atom and the photopolymerization initiator A2 is The combination of the compounds represented by the above formula (V) is particularly preferred. With this combination, a lens with excellent characteristics such as solvent resistance can be manufactured in a low-temperature process. Furthermore, a lens with less wrinkles or voids can be manufactured.
光聚合起始劑的含量在透鏡用組成物的總固體成分中為1~20質量%為較佳。下限為2質量%以上為較佳,3質量%以上為更佳,5質量%以上為進一步較佳。上限為15質量%以下為較佳,14質量%以下為更佳,13質量%以下為進一步較佳。又,本發明的透鏡用組成物相對於聚合性單體100質量份含有5~50質量份的光聚合起始劑為較佳。上限為40質量份以下為較佳,30質量份以下為更佳。下限為10質量份以上為較佳,15質量份以上為進一步較佳。依該態樣,能夠形成矩形性優異之圖案。The content of the photopolymerization initiator is preferably 1 to 20% by mass in the total solid content of the lens composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and further preferably 5% by mass or more. The upper limit is preferably 15% by mass or less, more preferably 14% by mass or less, and further preferably 13% by mass or less. In addition, the lens composition of the present invention preferably contains 5 to 50 parts by mass of a photopolymerization initiator relative to 100 parts by mass of the polymerizable monomer. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. The lower limit is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more. According to this aspect, a pattern with excellent rectangularity can be formed.
本發明的透鏡用組成物中,作為光聚合起始劑使用了上述光聚合起始劑A1之情況下,光聚合起始劑A1的含量在透鏡用組成物的總固體成分中為1~15質量%為較佳。下限為2質量%以上為較佳,3質量%以上為更佳,4質量%以上為進一步較佳。上限為14質量%以下為較佳,12.5質量%以下為更佳,10質量%以下為進一步較佳。In the composition for a lens of the present invention, when the above-mentioned photopolymerization initiator A1 is used as the photopolymerization initiator, the content of the photopolymerization initiator A1 is 1 to 15 in the total solid content of the lens composition Quality% is better. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and further preferably 4% by mass or more. The upper limit is preferably 14% by mass or less, more preferably 12.5% by mass or less, and further preferably 10% by mass or less.
本發明的透鏡用組成物中,作為光聚合起始劑使用了上述光聚合起始劑A2之情況下,光聚合起始劑A2的含量在透鏡用組成物的總固體成分中為0.5~15質量%為較佳。下限為1質量%以上為較佳,1.5質量%以上為更佳,2質量%以上為進一步較佳。上限為12.5質量%以下為較佳,10質量%以下為更佳,7.5質量%以下為進一步較佳。When the photopolymerization initiator A2 is used as the photopolymerization initiator in the lens composition of the present invention, the content of the photopolymerization initiator A2 is 0.5 to 15 in the total solid content of the lens composition Quality% is better. The lower limit is preferably 1% by mass or more, more preferably 1.5% by mass or more, and further preferably 2% by mass or more. The upper limit is preferably 12.5% by mass or less, more preferably 10% by mass or less, and further preferably 7.5% by mass or less.
本發明的透鏡用組成物中,作為光聚合起始劑使用了上述光聚合起始劑A1和光聚合起始劑A2之情況下,本發明的透鏡用組成物相對於光聚合起始劑A1的100質量份含有50~200質量份的光聚合起始劑A2為較佳。上限為175質量份以下為較佳,150質量份以下為更佳。下限為60質量份以上為較佳,70質量份以上為進一步較佳。依該態樣,藉由曝光容易使透鏡用組成物充分硬化,能夠在低溫製程(例如遍及所有步驟在150℃以下的溫度,較佳為120℃以下的溫度)中製造透鏡。進而,亦能夠製造起皺或空隙少之透鏡。In the lens composition of the present invention, when the above-mentioned photopolymerization initiator A1 and photopolymerization initiator A2 are used as the photopolymerization initiator, the composition of the lens of the present invention relative to the photopolymerization initiator A1 It is preferable that 100 parts by mass contain 50 to 200 parts by mass of the photopolymerization initiator A2. The upper limit is preferably 175 parts by mass or less, and more preferably 150 parts by mass or less. The lower limit is preferably 60 parts by mass or more, and more preferably 70 parts by mass or more. According to this aspect, the lens composition is easily hardened by exposure, and the lens can be manufactured in a low-temperature process (for example, a temperature of 150° C. or less throughout all steps, preferably a temperature of 120° C. or less). Furthermore, a lens with less wrinkles or voids can be manufactured.
本發明的透鏡用組成物中,作為光聚合起始劑使用了上述光聚合起始劑A1和光聚合起始劑A2之情況下,在透鏡用組成物的總固體成分中的光聚合起始劑A1和光聚合起始劑A2的合計含量為5~15質量%為較佳。下限為6質量%以上為較佳,7質量%以上為更佳,8質量%以上為進一步較佳。上限為14.5質量%以下為較佳,14質量%以下為更佳,13質量%以下為進一步較佳。只要在上述範圍內,則藉由曝光容易使透鏡用組成物充分硬化,能夠在低溫製程(例如遍及所有步驟在150℃以下的溫度,較佳為120℃以下的溫度)中製造透鏡。進而,亦能夠製造起皺或空隙少之透鏡。In the lens composition of the present invention, when the above-mentioned photopolymerization initiator A1 and photopolymerization initiator A2 are used as the photopolymerization initiator, the photopolymerization initiator in the total solid content of the lens composition The total content of A1 and the photopolymerization initiator A2 is preferably 5 to 15% by mass. The lower limit is preferably 6% by mass or more, more preferably 7% by mass or more, and further preferably 8% by mass or more. The upper limit is preferably 14.5% by mass or less, more preferably 14% by mass or less, and further preferably 13% by mass or less. As long as it is within the above range, the lens composition is easily cured by exposure, and the lens can be manufactured in a low-temperature process (for example, a temperature of 150° C. or less throughout all steps, preferably a temperature of 120° C. or less). Furthermore, a lens with less wrinkles or voids can be manufactured.
<<樹脂>> 本發明的透鏡用組成物包含樹脂。樹脂例如以使顏料等粒子分散於組成物中之用途或黏合劑的用途來進行摻合。再者,將主要用於使粒子等分散於組成物中之樹脂亦稱為分散劑。但是,樹脂的該種用途為一例,亦能夠將除該種用途以外的用途作為目的來使用樹脂。<<resin>> The lens composition of the present invention contains a resin. The resin is blended, for example, for the purpose of dispersing particles such as pigments in the composition or the use of a binder. In addition, the resin mainly used to disperse particles and the like in the composition is also referred to as a dispersant. However, this kind of use of the resin is an example, and the resin can be used for purposes other than this kind of use.
樹脂的重量平均分子量(Mw)為2000~2000000為較佳。上限為1000000以下為較佳,500000以下為更佳。下限為3000以上為較佳,4000以上為更佳,5000以上為進一步較佳。The weight average molecular weight (Mw) of the resin is preferably 2,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 3000 or more, more preferably 4000 or more, and further preferably 5000 or more.
作為樹脂,例如可列舉(甲基)丙烯酸樹脂、(甲基)丙烯醯胺樹脂、環氧樹脂、烯硫醇樹脂、聚碳酸酯樹脂、聚醚樹脂、聚芳酯樹脂、聚碸樹脂、聚醚碸樹脂、聚伸苯樹脂、聚亞芳基醚氧化膦樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、聚烯烴樹脂、環狀烯烴樹脂、聚酯樹脂、苯乙烯樹脂、矽氧烷樹脂等。As the resin, for example, (meth)acrylic resin, (meth)acrylamide resin, epoxy resin, enethiol resin, polycarbonate resin, polyether resin, polyarylate resin, polyphenol resin, poly Ether resin, polystyrene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamidoamide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, silicon Oxyalkyl resin, etc.
本發明中,作為樹脂,使用在波長550nm的光的折射率為1.5以上之樹脂(以下,亦稱為高折射率樹脂)為較佳。樹脂在波長550nm的光的折射率為1.6以上為較佳,1.7以上為更佳,1.8以上為進一步較佳。上限為4.0以下為較佳,3.9以下為更佳,3.5以下為進一步較佳,3.0以下為特佳。高折射率樹脂能夠用作黏合劑或分散劑。In the present invention, as the resin, it is preferable to use a resin having a refractive index of 1.5 or more (hereinafter, also referred to as a high refractive index resin) at a wavelength of 550 nm. The refractive index of the resin at a wavelength of 550 nm is preferably 1.6 or more, more preferably 1.7 or more, and even more preferably 1.8 or more. The upper limit is preferably 4.0 or less, more preferably 3.9 or less, further preferably 3.5 or less, and particularly preferably 3.0 or less. High refractive index resin can be used as a binder or dispersant.
樹脂的折射率能夠利用以下的方法在未硬化的狀態下進行測量。關於具體的測量方法,在矽晶圓上以300nm厚度製成作為測量對象之僅由樹脂組成之膜之後,利用橢圓偏光儀(Lambda Ace RE-3300(產品名),Dainippon Screen Mfg. Co.,Ltd.)測量所獲得之膜的折射率。The refractive index of the resin can be measured in the uncured state by the following method. Regarding the specific measurement method, after forming a film composed of only resin on a silicon wafer at a thickness of 300 nm, an ellipsometer (Lambda Ace RE-3300 (product name), Dainippon Screen Mfg. Co., Ltd.) measured the refractive index of the obtained film.
本發明中所使用之樹脂亦可以具有酸基。作為酸基,例如可列舉羧基、磷酸基、磺酸基及酚性羥基等。該種酸基可以僅為1種,亦可以為2種以上。具有酸基之樹脂亦能夠用作鹼可溶性樹脂或分散劑。The resin used in the present invention may have an acid group. Examples of acid groups include carboxyl groups, phosphoric acid groups, sulfonic acid groups, and phenolic hydroxyl groups. This kind of acid group may be only one kind or two or more kinds. Resins with acid groups can also be used as alkali-soluble resins or dispersants.
具有酸基之樹脂的酸值為30~500mgKOH/g為較佳。下限為50mgKOH/g以上為更佳,70mgKOH/g以上為進一步較佳。上限為400mgKOH/g以下為更佳,200mgKOH/g以下為進一步較佳,150mgKOH/g以下為特佳,120mgKOH/g以下為最佳。The acid value of the resin having an acid group is preferably 30 to 500 mgKOH/g. The lower limit is more preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is more preferably 400 mgKOH/g or less, further preferably 200 mgKOH/g or less, particularly preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.
作為具有酸基之樹脂,在側鏈具有羧基之聚合物為較佳。例如可列舉甲基丙烯酸、丙烯酸、衣康酸、巴豆酸、順丁烯二酸、2-羧基乙基(甲基)丙烯酸、乙烯基苯甲酸、偏酯化順丁烯二酸等具有來自於單體之重複單元之共聚物、酚醛清漆型樹脂等鹼可溶性酚樹脂、在側鏈具有羧基之酸性纖維素衍生物、具有羥基之聚合物與酸酐加成之聚合物。尤其,(甲基)丙烯酸和能夠與其共聚之其他單體的共聚物為較佳。作為能夠與(甲基)丙烯酸共聚之其他單體,可列舉烷基(甲基)丙烯酸酯、芳基(甲基)丙烯酸酯、乙烯化合物等。作為烷基(甲基)丙烯酸酯及芳基(甲基)丙烯酸酯,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸甲苯酯、(甲基)丙烯酸萘酯、(甲基)丙烯酸環己酯、甲基丙烯酸環氧丙酯、甲基丙烯酸四氫糠酯等。作為乙烯化合物,可列舉苯乙烯、α-甲基苯乙烯、乙烯甲苯、丙烯腈、乙烯乙酸酯、N-乙烯基吡咯啶酮、聚苯乙烯巨分子單體、聚甲基丙烯酸甲酯巨分子單體等。能夠與該等(甲基)丙烯酸共聚之其他單體可以僅為1種,亦可以為2種以上。As the resin having an acid group, a polymer having a carboxyl group in the side chain is preferred. For example, methacrylic acid, acrylic acid, itaconic acid, crotonic acid, maleic acid, 2-carboxyethyl (meth)acrylic acid, vinyl benzoic acid, partially esterified maleic acid, etc. can be cited. Copolymers of repeating units of monomers, alkali-soluble phenol resins such as novolac-type resins, acidic cellulose derivatives having carboxyl groups on the side chains, polymers with hydroxyl groups and polymers with addition of acid anhydrides. In particular, copolymers of (meth)acrylic acid and other monomers copolymerizable therewith are preferred. Examples of other monomers copolymerizable with (meth)acrylic acid include alkyl (meth)acrylates, aryl (meth)acrylates, and vinyl compounds. Examples of the alkyl (meth)acrylate and aryl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and (meth)acrylic acid. Butyl ester, isobutyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate, phenyl (meth)acrylate, benzyl (meth)acrylate Ester, tolyl (meth)acrylate, naphthyl (meth)acrylate, cyclohexyl (meth)acrylate, glycidyl methacrylate, tetrahydrofurfuryl methacrylate, etc. Examples of the vinyl compound include styrene, α-methylstyrene, vinyltoluene, acrylonitrile, ethylene acetate, N-vinylpyrrolidone, polystyrene macromonomer, and polymethyl methacrylate. Molecular monomers, etc. The other monomer copolymerizable with such (meth)acrylic acid may be only one kind, or may be two or more kinds.
具有酸基之樹脂亦可以具有來自於順丁烯二醯亞胺化合物之重複單元。作為順丁烯二醯亞胺化合物,可列舉N-烷基順丁烯二醯亞胺、N-芳基順丁烯二醯亞胺等。作為來自於順丁烯二醯亞胺化合物之重複單元,可列舉由式(C-mi)所表示之重複單元。 [化學式8] The resin having an acid group may have a repeating unit derived from a maleimide compound. Examples of the maleimide compound include N-alkyl maleimide, N-aryl maleimide and the like. Examples of the repeating unit derived from a maleimide compound include a repeating unit represented by the formula (C-mi). [Chemical Formula 8]
在式(C-mi)中,Rmi表示烷基或芳基。烷基的碳數為1~20為較佳。烷基可以為直鏈、分支及環狀中之任一種。芳基的碳數為6~20為較佳,6~15為更佳,6~10為進一步較佳。Rmi為芳基為較佳。In the formula (C-mi), Rmi represents an alkyl group or an aryl group. The carbon number of the alkyl group is preferably 1-20. The alkyl group may be any of linear, branched, and cyclic. The carbon number of the aryl group is preferably 6-20, more preferably 6-15, and even more preferably 6-10. Rmi is preferably an aryl group.
具有酸基之樹脂為包含來自於由下述式(ED1)所表示之化合物和/或由下述式(ED2)所表示之化合物(以下,有時將該等化合物亦稱作“醚二聚物”。)之重複單元之樹脂亦為較佳。The resin having an acid group is derived from a compound represented by the following formula (ED1) and/or a compound represented by the following formula (ED2) (hereinafter, these compounds are sometimes referred to as "ether dimerization" "." The resin of the repeating unit is also preferred.
[化學式9] [Chemical Formula 9]
式(ED1)中,R1 及R2 分別獨立地表示氫原子或可以具有取代基之碳數1~25的烴基。 [化學式10] 式(ED2)中,R表示氫原子或碳數1~30的有機基團。作為式(ED2)的具體例,能夠參閱日本特開2010-168539號公報的記載。In formula (ED1), R 1 and R 2 each independently represent a hydrogen atom or a C 1-25 hydrocarbon group which may have a substituent. [Chemical Formula 10] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of the formula (ED2), the description in JP 2010-168539A can be referred to.
關於醚二聚物的具體例,能夠參閱日本特開2013-029760號公報的0317段,將該內容編入本說明書中。For specific examples of the ether dimer, refer to paragraph 0317 of Japanese Patent Laid-Open No. 2013-029760, and incorporate this content into this specification.
作為包含來自於醚二聚物的重複單元之樹脂,例如可列舉下述結構的樹脂。以下的結構式中Me表示甲基。 [化學式11] Examples of the resin containing a repeating unit derived from an ether dimer include resins having the following structures. In the following structural formulas, Me represents a methyl group. [Chemical Formula 11]
本發明中所使用之樹脂亦可以具有聚合性基。作為聚合性基,可列舉乙烯基、(甲基)烯丙基及(甲基)丙烯醯基等具有乙烯性不飽和鍵之基團。作為具有聚合性基之樹脂的市售品,可列舉DIANAL NR系列(MITSUBISHI RAYON CO.,LTD.製)、Photomer6173(含有羧基之聚胺酯丙烯酸酯寡聚物,Diamond Shamrock Co.,Ltd.製)、VISCOAT R-264、KS RESIST 106(均由OSAKA ORGANIC CHEMICAL INDUSTRY LTD.製)、CYCLOMER P系列(例如,ACA230AA)、PLACCEL CF200系列(均由Daicel Corporation製)、Ebecryl3800(DAICEL UCB CO.,LTD.製)、ACRYCURE RD-F8(NIPPON SHOKUBAI CO., LTD.製)、DP-1305(FUJIFILM Finechemicals Co.,Ltd.製)等。The resin used in the present invention may have a polymerizable group. Examples of the polymerizable group include a group having an ethylenic unsaturated bond such as a vinyl group, (meth)allyl group, and (meth)acryloyl group. Examples of commercially available resins having a polymerizable group include DIANAL NR series (manufactured by MITSUBISHI RAYON CO., LTD.), Photomer6173 (polycarboxylate acrylate oligomer containing carboxyl group, manufactured by Diamond Shamrock Co., Ltd.), VISCOAT R-264, KS RESIST 106 (all made by OSAKA ORGANIC CHEMICAL INDUSTRY LTD.), CYCLOMER P series (for example, ACA230AA), PLACCEL CF200 series (all made by Daicel Corporation), Ebecryl3800 (made by DAICEL UCB CO., LTD. ), ACRYCURE RD-F8 (manufactured by NIPPON SHOKUBAI CO., LTD.), DP-1305 (manufactured by FUJIFILM Finechemicals Co., Ltd.), etc.
本發明中所使用之樹脂含有包含來自於由式(I)所表示之化合物的重複單元(以下,亦稱為重複單元b1-1)之樹脂b1為較佳。藉由使用具有重複單元b1-1之樹脂,容易形成透明性更優異之透鏡。 [化學式12] The resin used in the present invention preferably contains a resin b1 containing a repeating unit (hereinafter, also referred to as repeating unit b1-1) derived from the compound represented by formula (I). By using a resin having a repeating unit b1-1, it is easy to form a lens with more excellent transparency. [Chemical Formula 12]
X1 表示O或NH,O為較佳。 R1 表示氫原子或甲基。 L1 表示2價的連接基。作為2價的連接基,可列舉烴基、雜環基、-NH-、-SO-、-SO2 -、-CO-、-O-、-COO-、-OCO-、-S-及組合2個以上該等而成之基團。作為烴基,可列舉烷基、芳基等。雜環基可以為非芳香族的雜環基,亦可以為芳香族雜環基。雜環基為5員環或6員環為較佳。構成雜環基之雜原子的種類可列舉氮原子、氧原子及硫原子等。構成雜環基之雜原子的數為1~3為較佳。雜環基可以為單環,亦可以為縮合環。烴基及雜環基亦可以具有取代基。作為取代基,可列舉烷基、芳基、羥基及鹵素原子等。 R10 表示取代基。作為R10 所表示之取代基,可列舉以下所示之取代基T,烴基為較佳,可以具有芳基作為取代基之烷基為更佳。 m表示0~2的整數,0或1為較佳,0為更佳。 p表示0以上的整數,0~4為較佳,0~3為更佳,0~2為進一步較佳,0或1為更進一步較佳,1為特佳。X 1 represents O or NH, and O is preferred. R 1 represents a hydrogen atom or a methyl group. L 1 represents a divalent linking group. Examples of divalent linking groups include hydrocarbon groups, heterocyclic groups, -NH-, -SO-, -SO 2 -, -CO-, -O-, -COO-, -OCO-, -S-, and combination 2 More than one such group. Examples of hydrocarbon groups include alkyl groups and aryl groups. The heterocyclic group may be a non-aromatic heterocyclic group or an aromatic heterocyclic group. The heterocyclic group is preferably a 5-membered ring or a 6-membered ring. Examples of the type of hetero atom constituting the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of hetero atoms constituting the heterocyclic group is preferably 1 to 3. The heterocyclic group may be a single ring or a condensed ring. The hydrocarbon group and the heterocyclic group may have a substituent. Examples of the substituent include alkyl groups, aryl groups, hydroxyl groups, and halogen atoms. R 10 represents a substituent. Examples of the substituent represented by R 10 include substituent T shown below, and a hydrocarbon group is preferred, and an alkyl group which may have an aryl group as a substituent is more preferred. m represents an integer of 0 to 2, 0 or 1 is preferable, and 0 is more preferable. p represents an integer of 0 or more, 0 to 4 is more preferred, 0 to 3 is more preferred, 0 to 2 is further preferred, 0 or 1 is still more preferred, and 1 is particularly preferred.
(取代基T) 作為取代基T,可列舉鹵素原子、氰基、硝基、烴基、雜環基、-ORt1 、-CORt1 、-COORt1 、-OCORt1 、-NRt1 Rt2 、-NHCORt1 、-CONRt1 Rt2 、-NHCONRt1 Rt2 、-NHCOORt1 、-SRt1 、-SO2 Rt1 、-SO2 ORt1 、-NHSO2 Rt1 或-SO2 NRt1 Rt2 。Rt1 及Rt2 分別獨立地表示氫原子、烴基或雜環基。Rt1 和Rt2 可以鍵結而形成環。(Substituent T) Examples of the substituent T include halogen atom, cyano group, nitro group, hydrocarbon group, heterocyclic group, -ORt 1 , -CORt 1 , -COORt 1 , -OCORt 1 , -NRt 1 Rt 2 ,- NHCORt 1 , -CONRt 1 Rt 2 , -NHCONRt 1 Rt 2 , -NHCOORt 1 , -SRt 1 , -SO 2 Rt 1 , -SO 2 ORt 1 , -NHSO 2 Rt 1 or -SO 2 NRt 1 Rt 2 . Rt 1 and Rt 2 each independently represent a hydrogen atom, a hydrocarbon group or a heterocyclic group. Rt 1 and Rt 2 may be bonded to form a ring.
作為鹵素原子,可列舉氟原子、氯原子、溴原子及碘原子。 作為烴基,可列舉烷基、烯基、炔基及芳基。烷基的碳數為1~30為較佳,1~15為更佳,1~8為進一步較佳。烷基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳,分支為更佳。 烯基的碳數為2~30為較佳,2~12為更佳,2~8為特佳。烯基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳。 炔基的碳數為2~30為較佳,2~25為更佳。炔基可以為直鏈、分支及環狀中之任一種,直鏈或分支為較佳。 芳基的碳數為6~30為較佳,6~20為更佳,6~12為進一步較佳。 雜環基可以為單環,亦可以為縮合環。雜環基係單環或縮合數為2~4的縮合環為較佳。構成雜環基的環之雜原子的數為1~3為較佳。構成雜環基的環之雜原子為氮原子、氧原子或硫原子為較佳。構成雜環基的環之碳原子的數為3~30為較佳,3~18為更佳,3~12為更佳。 烴基及雜環基可以具有取代基,亦可以為未經取代。作為取代基,可列舉上述取代基T中所說明之取代基。Examples of the halogen atom include fluorine atom, chlorine atom, bromine atom and iodine atom. Examples of the hydrocarbon group include alkyl, alkenyl, alkynyl and aryl groups. The carbon number of the alkyl group is preferably from 1 to 30, more preferably from 1 to 15, and even more preferably from 1 to 8. The alkyl group may be any of linear, branched, and cyclic, and linear or branched is preferred, and branched is more preferred. The carbon number of the alkenyl group is preferably from 2 to 30, more preferably from 2 to 12, and particularly preferably from 2 to 8. The alkenyl group may be any of linear, branched, and cyclic, and linear or branched is preferred. The carbon number of the alkynyl group is preferably 2-30, and more preferably 2-25. The alkynyl group may be any of linear, branched, and cyclic, and linear or branched is preferred. The carbon number of the aryl group is preferably 6-30, more preferably 6-20, and even more preferably 6-12. The heterocyclic group may be a single ring or a condensed ring. The heterocyclic group monocyclic ring or the condensed ring having a condensation number of 2 to 4 is preferred. The number of hetero atoms of the ring constituting the heterocyclic group is preferably 1 to 3. The hetero atom of the ring constituting the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3-30, more preferably 3-18, and even more preferably 3-12. The hydrocarbon group and the heterocyclic group may have a substituent, or may be unsubstituted. Examples of the substituent include the substituents described in the above-mentioned substituent T.
由式(I)所表示之化合物為由下述式(I-1)所表示之化合物為較佳。 [化學式13] The compound represented by the formula (I) is preferably a compound represented by the following formula (I-1). [Chemical Formula 13]
X1 表示O或NH,O為較佳。 R1 表示氫原子或甲基。 R2 、R3 及R11 分別獨立地表示烴基。 R2 及R3 所表示之烴基為伸烷基或伸芳基為較佳,伸烷基為更佳。伸烷基的碳數為1~10為較佳,1~5為更佳,1~3為進一步較佳,2或3為特佳。R11 所表示之烴基為可以具有芳基作為取代基之烷基為較佳,具有芳基作為取代基之烷基為更佳。烷基的碳數為1~20為較佳,1~10為更佳,1~5為進一步較佳。再者,烷基具有芳基作為取代基之情況下之烷基的碳數是指,烷基部位的碳數。 R12 表示取代基。作為R12 所表示之取代基,可列舉上述取代基T。 n表示0~15的整數,0~5的整數為較佳,0~4的整數為更佳,0~3的整數為進一步較佳。 m表示0~2的整數,0或1為較佳,0為更佳。 p1表示0以上的整數,0~4為較佳,0~3為更佳,0~2為進一步較佳,0~1為更進一步較佳,0為特佳。 q1表示1以上的整數,1~4為較佳,1~3為更佳,1~2為進一步較佳,1為特佳。X 1 represents O or NH, and O is preferred. R 1 represents a hydrogen atom or a methyl group. R 2 , R 3 and R 11 each independently represent a hydrocarbon group. The hydrocarbon group represented by R 2 and R 3 is preferably an alkylene group or an aryl group, more preferably an alkylene group. The carbon number of the alkylene group is preferably from 1 to 10, more preferably from 1 to 5, more preferably from 1 to 3, and particularly preferably 2 or 3. The hydrocarbon group represented by R 11 is preferably an alkyl group which may have an aryl group as a substituent, and more preferably an alkyl group which has an aryl group as a substituent. The carbon number of the alkyl group is preferably from 1 to 20, more preferably from 1 to 10, and even more preferably from 1 to 5. In addition, when the alkyl group has an aryl group as a substituent, the carbon number of the alkyl group means the carbon number of the alkyl portion. R 12 represents a substituent. Examples of the substituent represented by R 12 include the above-mentioned substituent T. n represents an integer of 0 to 15, an integer of 0 to 5 is preferred, an integer of 0 to 4 is more preferred, and an integer of 0 to 3 is even more preferred. m represents an integer of 0 to 2, 0 or 1 is preferable, and 0 is more preferable. p1 represents an integer of 0 or more, 0 to 4 is more preferred, 0 to 3 is more preferred, 0 to 2 is further preferred, 0 to 1 is still more preferred, and 0 is particularly preferred. q1 represents an integer of 1 or more, preferably 1-4, more preferably 1-3, further preferably 1-2, and 1 particularly preferably.
由式(I)所表示之化合物為由下述式(III)所表示之化合物為較佳。 [化學式14] 式中,R1 表示氫原子或甲基,R21 及R22 分別獨立地表示伸烷基,n表示0~15的整數。R21 及R22 所表示之伸烷基的碳數為1~10為較佳,1~5為更佳,1~3為進一步較佳,2或3為特佳。n表示0~15的整數,0~5的整數為較佳,0~4的整數為更佳,0~3的整數為進一步較佳。The compound represented by the formula (I) is preferably a compound represented by the following formula (III). [Chemical Formula 14] In the formula, R 1 represents a hydrogen atom or a methyl group, R 21 and R 22 each independently represent an alkylene group, and n represents an integer of 0-15. The carbon number of the alkylene group represented by R 21 and R 22 is preferably from 1 to 10, more preferably from 1 to 5, more preferably from 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, an integer of 0 to 5 is preferred, an integer of 0 to 4 is more preferred, and an integer of 0 to 3 is even more preferred.
作為由式(I)所表示之化合物,可列舉枯基苯酚的環氧乙烷或環氧丙烷改質(甲基)丙烯酸酯等。作為市售品,可列舉ARONIX M-110(TOAGOSEI CO., LTD.製)等。Examples of the compound represented by the formula (I) include ethylene oxide or propylene oxide modified (meth)acrylate of cumylphenol. Examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.) and the like.
樹脂b1還包含來自於烷基(甲基)丙烯酸酯的重複單元(以下,亦稱為重複單元b1-2)為較佳。烷基(甲基)丙烯酸酯的烷基部位的碳數為3~10為較佳,3~8為更佳,3~6為進一步較佳。作為烷基(甲基)丙烯酸酯的較佳之具體例,可列舉(甲基)丙烯酸正丁酯等。It is preferable that the resin b1 further contains a repeating unit derived from an alkyl (meth)acrylate (hereinafter, also referred to as repeating unit b1-2). The carbon number of the alkyl portion of the alkyl (meth)acrylate is preferably from 3 to 10, more preferably from 3 to 8, and even more preferably from 3 to 6. Preferred specific examples of the alkyl (meth)acrylate include n-butyl (meth)acrylate and the like.
樹脂b1還包含具有酸基之重複單元(以下,亦稱為重複單元b1-3)亦為較佳。It is also preferable that the resin b1 further includes a repeating unit having an acid group (hereinafter, also referred to as repeating unit b1-3).
本發明的透鏡用組成物能夠含有作為分散劑的樹脂。作為分散劑,可列舉酸性分散劑(酸性樹脂)、鹼性分散劑(鹼性樹脂)。在此,酸性分散劑(酸性樹脂)表示酸基的量多於鹼性基的量之樹脂。作為酸性分散劑(酸性樹脂),將酸基的量與鹼性基的量的合計量設為100莫耳%時,酸基的量佔70莫耳%以上之樹脂為較佳,實質上僅由酸基組成之樹脂為更佳。酸性分散劑(酸性樹脂)所具有之酸基為羧基為較佳。酸性分散劑(酸性樹脂)的酸值為10~105mgKOH/g為較佳。又,鹼性分散劑(鹼性樹脂)表示鹼性基的量多於酸基的量之樹脂。作為鹼性分散劑(鹼性樹脂),將酸基的量與鹼性基的量的合計量設為100莫耳%時,鹼性基的量超過50莫耳%之樹脂為較佳。鹼性分散劑所具有之鹼性基為胺基為較佳。The lens composition of the present invention can contain a resin as a dispersant. Examples of the dispersant include acidic dispersants (acid resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin having more acid groups than basic groups. As the acidic dispersant (acid resin), when the total amount of the acid group and the amount of the basic group is set to 100 mol %, a resin having an acid group amount of 70 mol% or more is preferable, and substantially only Resins composed of acid groups are better. The acidic group of the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. In addition, an alkaline dispersant (alkaline resin) means a resin having more basic groups than acid groups. As the basic dispersant (basic resin), when the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, a resin having an amount of basic groups exceeding 50 mol% is preferable. The basic group of the basic dispersant is preferably an amine group.
作為分散劑,例如可列舉高分子分散劑〔例如,聚醯胺及其鹽、多羧酸及其鹽、高分子量不飽和酸酯、改質聚胺酯、改質聚酯、改質聚(甲基)丙烯酸酯、(甲基)丙烯酸系共聚物、萘磺酸福馬林縮合物〕、聚氧乙烯烷基磷酸酯、聚氧乙烯烷基胺、烷醇胺等。關於高分子分散劑,能夠依據其結構進一步分類成直鏈狀高分子、末端改質型高分子、接枝型高分子、封端型高分子。高分子分散劑吸附於顏料等粒子表面,發揮防止再凝聚之作用。因此,能夠作為較佳結構舉出具有錨定於顏料等粒子表面的部位之末端改質型高分子、接枝型高分子、封端型高分子。又,亦較佳地使用日本特開2011-070156號公報的0028~0124段中所記載的分散劑和日本特開2007-277514號公報中所記載的分散劑。Examples of the dispersant include polymer dispersants [for example, polyamide and its salts, polycarboxylic acids and their salts, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, and modified poly(methyl ) Acrylic acid ester, (meth)acrylic copolymer, formalin naphthalenesulfonate condensate], polyoxyethylene alkyl phosphate, polyoxyethylene alkylamine, alkanolamine, etc. The polymer dispersant can be further classified into a linear polymer, a terminal modified polymer, a graft polymer, and a capped polymer according to its structure. The polymer dispersant adsorbs on the surface of particles such as pigments, and plays a role in preventing re-agglomeration. Therefore, as a preferable structure, a terminal modified polymer, a grafted polymer, and an end-capped polymer having a portion anchored to the surface of particles such as pigments can be cited. In addition, the dispersants described in paragraphs 0028 to 0124 of JP 2011-070156 and the dispersants described in JP 2007-277514 are also preferably used.
本發明中,亦能夠作為分散劑使用封端共聚物。封端共聚物的詳細內容能夠參閱日本特開2012-137564號公報的0131~0160段的記載,將該內容編入本說明書中。又,本發明中,亦能夠作為分散劑使用在主鏈及側鏈的至少一者包含氮原子之寡聚亞胺系共聚物。關於寡聚亞胺系共聚物,能夠參閱日本特開2012-255128號公報的0102~0174段的記載,將該內容編入本說明書中。In the present invention, a blocked copolymer can also be used as a dispersant. The details of the end-capping copolymer can be found in paragraphs 0131 to 0160 of JP-A-2012-137564, and this content is incorporated in this specification. In addition, in the present invention, an oligoimide-based copolymer containing a nitrogen atom in at least one of the main chain and the side chain can also be used as a dispersant. For the oligoimide-based copolymer, refer to the description in paragraphs 0102 to 0174 of JP-A-2012-255128, and incorporate this content into this specification.
分散劑亦能夠作為市售品獲得,作為該種具體例,可列舉BYK Chemie GmbH製的Disperbyk系列(例如,Disperbyk-111,2001等)、Lubrizol Japan Ltd.製的SOLSPERSE系列(例如,SOLSPERSE20000、76500等)、Ajinomoto Fine-Techno Co.,Inc.製的AJISPER系列等。又,亦能夠將日本特開2012-137564號公報的0129段中所記載之製品和日本特開2017-194662號公報的0235段中所記載之製品用作分散劑。Dispersants can also be obtained as commercially available products. Examples of such specific examples include the Disperbyk series (for example, Disperbyk-111, 2001, etc.) manufactured by BYK Chemie GmbH, and the SOLSPERSE series (for example, SOLSPERSE20000, 76500) manufactured by Lubrizol Japan Ltd. Etc.), AJISPER series manufactured by Ajinomoto Fine-Techno Co., Inc. etc. In addition, the product described in paragraph 0129 of JP-A-2012-137564 and the product described in paragraph 0235 of JP-A-2017-194662 can also be used as a dispersant.
樹脂的含量在透鏡用組成物的總固體成分中為15~75質量%為較佳。上限為65質量%以下為較佳,55質量%以下為更佳。下限為25質量%以上為較佳,35質量%以上為更佳。 又,樹脂的含量相對於聚合性單體的100質量份為25~200質量份為較佳。上限為175質量份以下為較佳,150質量份以下為更佳。下限為50質量份以上為較佳,75質量份以上為更佳。 又,本發明的透鏡用組成物所包含之樹脂的總量中之上述樹脂b1(包含來自於由式(III)所表示之化合物的重複單元)的含量為0.1~100質量%為較佳,10~100質量%為更佳。上限亦能夠設為90質量%以下,亦能夠設為80質量%以下,還能夠設為70質量%以下。 又,上述樹脂b1的含量在透鏡用組成物的總固體成分中為0.1~70質量%為較佳。上限為60質量%以下為較佳,50質量%以下為更佳。下限為1質量%以上為較佳,5質量%以上為更佳。The content of the resin is preferably 15 to 75% by mass in the total solid content of the lens composition. The upper limit is preferably 65% by mass or less, and more preferably 55% by mass or less. The lower limit is preferably 25% by mass or more, and more preferably 35% by mass or more. In addition, the content of the resin is preferably 25 to 200 parts by mass relative to 100 parts by mass of the polymerizable monomer. The upper limit is preferably 175 parts by mass or less, and more preferably 150 parts by mass or less. The lower limit is preferably 50 parts by mass or more, and more preferably 75 parts by mass or more. Further, the content of the resin b1 (including the repeating unit derived from the compound represented by formula (III)) in the total amount of resins included in the lens composition of the present invention is preferably 0.1 to 100% by mass, 10 to 100% by mass is better. The upper limit can also be set to 90% by mass or less, 80% by mass or less, and 70% by mass or less. In addition, the content of the resin b1 is preferably 0.1 to 70% by mass in the total solid content of the lens composition. The upper limit is preferably 60% by mass or less, and more preferably 50% by mass or less. The lower limit is preferably 1% by mass or more, and more preferably 5% by mass or more.
<<含有呋喃基之化合物>> 本發明的透鏡用組成物含有包含呋喃基之化合物(以下,亦稱為含有呋喃基之化合物)為較佳。依該態樣,能夠製成低溫硬化性優異之透鏡用組成物。<<Furanyl-containing compounds>> The lens composition of the present invention preferably contains a furan group-containing compound (hereinafter, also referred to as furan group-containing compound). According to this aspect, a composition for a lens excellent in low-temperature curability can be produced.
含有呋喃基之化合物只要包含呋喃基(從呋喃去除1個氫原子之基團)則其結構並無特別限定。 關於包含呋喃基之化合物,能夠使用日本特開2017-194662號公報的0049~0089段中所記載之化合物。又,亦能夠使用日本特開2000-233581號公報、日本特開1994-271558號公報、日本特開1994-293830號公報、日本特開1996-239421號公報、日本特開1998-508655號公報、日本特開2000-001529號公報、日本特開2003-183348號公報、日本特開2006-193628號公報、日本特開2007-186684號公報、日本特開2010-265377號公報及日本特開2011-170069號公報等中所記載之化合物。The furan group-containing compound is not particularly limited as long as it contains a furan group (a group in which one hydrogen atom is removed from furan). As for the compound containing a furanyl group, the compounds described in paragraphs 0049 to 0089 of JP-A-2017-194662 can be used. In addition, Japanese Patent Application Publication No. 2000-233581, Japanese Patent Application Publication No. 1994-271558, Japanese Patent Application Publication No. 1994-293830, Japanese Patent Application Publication No. 1996-239421, Japanese Patent Application Publication No. 1998-508655, Japanese Patent Laid-Open No. 2000-001529, Japanese Patent Laid-Open No. 2003-183348, Japanese Patent Laid-Open No. 2006-193628, Japanese Patent Laid-Open No. 2007-186684, Japanese Patent Laid-Open No. 2010-265377 and Japanese Patent Laid-Open 2011- The compound described in 170069 Gazette.
含有呋喃基之化合物可以為單體,亦可以為聚合物。從容易獲得耐久性優異之透鏡等理由考慮,聚合物為較佳。聚合物的情況下,重量平均分子量為2000~70000為較佳。上限為60000以下為較佳,50000以下為更佳。下限為3000以上為較佳,4000以上為更佳,5000以上為進一步較佳。再者,聚合物型包含呋喃基之化合物為亦符合本發明的透鏡用組成物中之樹脂之成分。The furan-containing compound may be a monomer or a polymer. For reasons such as easy availability of lenses with excellent durability, polymers are preferred. In the case of a polymer, the weight average molecular weight is preferably 2,000 to 70,000. The upper limit is preferably 60,000 or less, and more preferably 50,000 or less. The lower limit is preferably 3000 or more, more preferably 4000 or more, and further preferably 5000 or more. In addition, the polymer type furan group-containing compound is a component of the resin in the lens composition according to the present invention.
作為單體型含有呋喃基之化合物(以下,亦稱為含有呋喃基之單體),可列舉由下述式(fur-1)所表示之化合物。 [化學式15] 式中,Rf1 表示氫原子或甲基,Rf2 表示2價的連接基。As the monomer type furan group-containing compound (hereinafter, also referred to as furan group-containing monomer), a compound represented by the following formula (fur-1) may be mentioned. [Chemical Formula 15] In the formula, Rf 1 represents a hydrogen atom or a methyl group, and Rf 2 represents a divalent linking group.
作為Rf2 所表示之2價的連接基,可列舉伸烷基、伸芳基、-O-、-CO-、-COO-、-OCO-、-NH-、-S-及組合該等2種以上而成之基團。伸烷基的碳數為1~30為較佳,1~20為更佳,1~15為進一步較佳。伸烷基可以為直鏈、分支、環狀中之任一種。伸芳基的碳數為6~30為較佳,6~20為更佳,6~10為進一步較佳。伸烷基及伸芳基亦可以具有取代基。作為取代基,可列舉羥基等。Examples of the divalent linking group represented by Rf 2 include alkylene, aryl, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and combinations of these 2 More than one kind of group. The carbon number of the alkylene group is preferably from 1 to 30, more preferably from 1 to 20, and even more preferably from 1 to 15. The alkylene group may be any of linear, branched, and cyclic. The carbon number of the arylene group is preferably 6-30, more preferably 6-20, and even more preferably 6-10. The alkylene group and the aryl group may have a substituent. Examples of the substituent include hydroxyl groups.
含有呋喃基之單體為由下述式(fur-1-1)所表示之化合物為較佳。 [化學式16] 式中,Rf1 表示氫原子或甲基,Rf11 表示-O-或-NH-,Rf12 表示單鍵或2價的連接基。作為Rf12 所表示之2價的連接基,可列舉伸烷基、伸芳基、-O-、-CO-、-COO-、-OCO-、-NH-、-S-及組合該等2種以上而成之基團。伸烷基的碳數為1~30為較佳,1~20為更佳,1~15為進一步較佳。伸烷基可以為直鏈、分支、環狀中之任一種。伸芳基的碳數為6~30為較佳,6~20為更佳,6~10為進一步較佳。伸烷基及伸芳基亦可以具有取代基。作為取代基,可列舉羥基等。The furan group-containing monomer is preferably a compound represented by the following formula (fur-1-1). [Chemical Formula 16] In the formula, Rf 1 represents a hydrogen atom or a methyl group, Rf 11 represents -O- or -NH-, and Rf 12 represents a single bond or a divalent linking group. Examples of the divalent linking group represented by Rf 12 include alkylene group, aryl group, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and combinations thereof. 2 More than one kind of group. The carbon number of the alkylene group is preferably from 1 to 30, more preferably from 1 to 20, and even more preferably from 1 to 15. The alkylene group may be any of linear, branched, and cyclic. The carbon number of the arylene group is preferably 6-30, more preferably 6-20, and even more preferably 6-10. The alkylene group and the aryl group may have a substituent. Examples of the substituent include hydroxyl groups.
作為含有呋喃基之單體的具體例,可列舉下述結構的化合物。以下的結構式中,Rf1 表示氫原子或甲基。 [化學式17] As specific examples of the furan group-containing monomer, compounds having the following structures can be mentioned. In the following structural formulas, Rf 1 represents a hydrogen atom or a methyl group. [Chemical Formula 17]
作為聚合物型含有呋喃基之化合物(以下,亦稱為含有呋喃基之聚合物),含有包含呋喃基之重複單元之樹脂為較佳,包含來自於由上述式(fur-1)所表示之化合物的重複單元之樹脂為更佳。含有呋喃基之聚合物中的呋喃基的濃度為每1g含有呋喃基之聚合物為0.5~6.0mmol為較佳,1.0~4.0mmol為進一步較佳。若呋喃基的濃度為0.5mmol以上,較佳為1.0mmol以上,則容易形成耐溶劑性等優異之透鏡。呋喃基的濃度只要為6.0mmol以下,較佳為4.0mmol以下,則透鏡用組成物的經時穩定性良好。As the polymer type furan group-containing compound (hereinafter, also referred to as furan group-containing polymer), a resin containing a furan group-containing repeating unit is preferable, and includes a resin derived from the formula (fur-1) The resin of the repeating unit of the compound is more preferable. The concentration of the furan group in the furan group-containing polymer is preferably 0.5 to 6.0 mmol per 1 g of the furan group containing polymer, and more preferably 1.0 to 4.0 mmol. If the furan group concentration is 0.5 mmol or more, preferably 1.0 mmol or more, it is easy to form a lens excellent in solvent resistance and the like. As long as the furan group concentration is 6.0 mmol or less, preferably 4.0 mmol or less, the lens composition has good stability over time.
含有呋喃基之聚合物除具有呋喃基之重複單元以外,還可以包含具有酸基之重複單元和/或具有聚合性基之重複單元。作為酸基,可列舉羧基、磷酸基、磺酸基及酚性羥基等。作為聚合性基,可列舉乙烯基、(甲基)烯丙基及(甲基)丙烯醯基等具有乙烯性不飽和鍵之基團。The polymer containing a furan group may contain a repeating unit having an acid group and/or a repeating unit having a polymerizable group in addition to the repeating unit having a furan group. Examples of acid groups include carboxyl groups, phosphoric acid groups, sulfonic acid groups, and phenolic hydroxyl groups. Examples of the polymerizable group include a group having an ethylenic unsaturated bond such as a vinyl group, (meth)allyl group, and (meth)acryloyl group.
含有呋喃基之聚合物包含具有酸基之重複單元之情況下,含有呋喃基之聚合物在透鏡用組成物中的溶解性變高,因此容易形成透明性更優異之透鏡。進而,還提高與聚合性單體的反應性而更加提高在低溫下的硬化性,容易形成耐溶劑性等更優異之透鏡。含有呋喃基之聚合物包含具有酸基之重複單元之情況下,其酸值為10~200mgKOH/g為較佳,40~130mgKOH/g為更佳。When the furan group-containing polymer contains a repeating unit having an acid group, the solubility of the furan group-containing polymer in the lens composition becomes high, so that it is easy to form a lens with more excellent transparency. Furthermore, the reactivity with the polymerizable monomer is increased to further improve the hardenability at a low temperature, and it is easy to form a lens having more excellent solvent resistance. When the polymer containing a furan group contains a repeating unit having an acid group, the acid value is preferably 10 to 200 mgKOH/g, and more preferably 40 to 130 mgKOH/g.
含有呋喃基之聚合物包含具有聚合性基之重複單元之情況下,容易形成耐溶劑性等更優異之透鏡。When the polymer containing a furan group contains a repeating unit having a polymerizable group, it is easy to form a lens having more excellent solvent resistance.
含有呋喃基之聚合物能夠利用日本特開2017-194662號公報的0052~0101段中所記載之方法來進行製造。The furan group-containing polymer can be produced by the method described in paragraphs 0052 to 0101 of Japanese Patent Application Publication No. 2017-194662.
含有呋喃基之化合物的含量在透鏡用組成物的總固體成分中為0.1~70質量%為較佳。下限為2.5質量%以上為較佳,5.0質量%以上為更佳,7.5質量%以上為進一步較佳。上限為65質量%以下為較佳,60質量%以下為更佳,50質量%以下為進一步較佳。 又,作為含有呋喃基之化合物使用了含有呋喃基之聚合物之情況下,透鏡用組成物所包含之樹脂中之含有呋喃基之聚合物的含量為0.1~100質量%為較佳。下限為10質量%以上為較佳,15質量%以上為更佳。上限為90質量%以下為較佳,80質量%以下為更佳。 又,本發明的透鏡用組成物中所使用之樹脂包含上述樹脂b1,並且使用了含有呋喃基之聚合物作為含有呋喃基之化合物之情況下,含有呋喃基之聚合物的含量相對於樹脂b1的100質量份為10~200質量份為較佳。上限為175質量份以下為較佳,150質量份以下為較佳。下限為25質量份以上為較佳,50質量份以上為較佳。藉由同時使用樹脂b1和含有呋喃基之聚合物,能夠期待低溫硬化性和透明性優異等效果。進而,兩者的比例在上述範圍內之情況下,容易獲得具有優異之耐久性之透鏡。The content of the furan group-containing compound is preferably 0.1 to 70% by mass in the total solid content of the lens composition. The lower limit is preferably 2.5% by mass or more, more preferably 5.0% by mass or more, and further preferably 7.5% by mass or more. The upper limit is preferably 65% by mass or less, more preferably 60% by mass or less, and further preferably 50% by mass or less. In addition, when a furan group-containing polymer is used as the furan group-containing compound, the content of the furan group-containing polymer in the resin contained in the lens composition is preferably 0.1 to 100% by mass. The lower limit is preferably 10% by mass or more, and more preferably 15% by mass or more. The upper limit is preferably 90% by mass or less, and more preferably 80% by mass or less. Furthermore, when the resin used in the lens composition of the present invention contains the above-mentioned resin b1 and a furan group-containing polymer is used as the furan group-containing compound, the content of the furan group-containing polymer relative to the resin b1 100 parts by mass is preferably 10 to 200 parts by mass. The upper limit is preferably 175 parts by mass or less, and preferably 150 parts by mass or less. The lower limit is preferably 25 parts by mass or more, and preferably 50 parts by mass or more. By using the resin b1 and the furan group-containing polymer at the same time, the effects such as excellent low-temperature curability and transparency can be expected. Furthermore, when the ratio of the two is within the above range, it is easy to obtain a lens having excellent durability.
<<具有環氧基之化合物>> 本發明的透鏡用組成物還含有具有環氧基之化合物為較佳。作為具有環氧基之化合物,在1分子內具有2個以上的環氧基之化合物為較佳。在1分子內具有2~100個環氧基為較佳。上限例如亦能夠設為10個以下,亦能夠設為5個以下。具有環氧基之化合物的環氧基當量(=具有環氧基之化合物的分子量/環氧基的數)為500g/eq以下為較佳,100~400g/eq為更佳,100~300g/eq為進一步較佳。具有環氧基之化合物可以為低分子化合物(例如,分子量小於1000),亦可以為高分子化合物(macromolecule)(例如,分子量1000以上的聚合物的情況下,重量平均分子量為1000以上)。具有環氧基之化合物的分子量(聚合物的情況下,重量平均分子量)為200~100000為較佳,500~50000為更佳。分子量(聚合物的情況下,重量平均分子量)的上限為3000以下為較佳,2000以下為更佳,1500以下為進一步較佳。<<Compounds with epoxy groups>> It is preferable that the lens composition of the present invention further contains a compound having an epoxy group. As the compound having an epoxy group, a compound having two or more epoxy groups in one molecule is preferred. It is preferable to have 2 to 100 epoxy groups in one molecule. For example, the upper limit can be set to 10 or less, and can also be set to 5 or less. The epoxy equivalent of the compound having an epoxy group (= molecular weight of the compound having an epoxy group/number of epoxy groups) is preferably 500 g/eq or less, 100 to 400 g/eq is more preferable, and 100 to 300 g/ eq is further preferred. The compound having an epoxy group may be a low-molecular compound (for example, a molecular weight of less than 1000) or a macromolecule (for example, in the case of a polymer with a molecular weight of 1,000 or more, the weight average molecular weight is 1,000 or more). The molecular weight of the compound having an epoxy group (weight average molecular weight in the case of a polymer) is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the molecular weight (weight average molecular weight in the case of a polymer) is preferably 3000 or less, more preferably 2000 or less, and even more preferably 1500 or less.
作為具有環氧基之化合物,亦能夠使用日本特開2013-011869號公報的0034~0036段、日本特開2014-043556號公報的0147~0156段、日本特開2014-089408號公報的0085~0092段中所記載之化合物、日本特開2017-179172號公報中所記載之化合物。將該等內容編入本說明書中。As the compound having an epoxy group, paragraphs 0034 to 0036 of Japanese Patent Laid-Open No. 2013-011869, paragraphs 0147 to 0156 of Japanese Patent Laid-Open No. 2014-043556, and 0085 to Japanese Patent Laid-Open No. 2014-089408 can also be used The compound described in paragraph 0092, the compound described in Japanese Patent Application Laid-Open No. 2017-179172. Incorporate such content into this manual.
本發明的透鏡用組成物含有具有環氧基之化合物之情況下,具有環氧基之化合物的含量在透鏡用組成物的總固體成分中為0.1~40質量%為較佳。下限為0.5質量%以上為更佳,1質量%以上為進一步較佳。上限為30質量%以下為更佳,20質量%以下為進一步較佳。具有環氧基之化合物可以單獨為1種,亦可以同時使用2種以上。同時使用2種以上之情況下,合計量在上述範圍為較佳。When the lens composition of the present invention contains a compound having an epoxy group, the content of the compound having an epoxy group is preferably 0.1 to 40% by mass in the total solid content of the lens composition. The lower limit is more preferably 0.5% by mass or more, and further preferably 1% by mass or more. The upper limit is preferably 30% by mass or less, and more preferably 20% by mass or less. The compound having an epoxy group may be one kind alone, or two or more kinds may be used simultaneously. When two or more types are used at the same time, the total amount is preferably within the above range.
<<白色或無色的顏料(白色系顏料)>> 本發明的透鏡用組成物能夠含有白色或無色的顏料(以下,亦稱為白色系顏料)。本發明的透鏡用組成物含有白色系顏料之情況下,容易形成折射率高之透鏡。<<White or colorless pigment (white pigment)>> The lens composition of the present invention can contain white or colorless pigments (hereinafter, also referred to as white pigments). When the lens composition of the present invention contains a white pigment, it is easy to form a lens with a high refractive index.
作為白色系顏料,可列舉包含選自Ti、Zr、Sn、Sb、Cu、Fe、Mn、Pb、Cd、As、Cr、Hg、Zn、Al、Mg、Si、P及S中之至少1種元素之氧化物的粒子,包含選自Ti、Zr、Sn、Al及Si中之至少1種元素之氧化物的粒子為較佳。作為氧化物,氧化鈦及氧化鋯為較佳,氧化鈦為更佳。又,作為氧化鈦,可列舉金紅石型氧化鈦、銳鈦礦(Anatase)型氧化鈦及非晶質型氧化鈦,金紅石型氧化鈦為較佳。又,上述的氧化物利用表面處理劑進行表面處理亦為較佳。作為表面處理劑,可列舉無機化合物及有機化合物。可以同時使用無機化合物和有機化合物。作為表面處理劑的具體例,可列舉多元醇、氧化鋁、氫氧化鋁、非晶質二氧化矽、含水二氧化矽、烷醇胺、硬脂酸、有機矽氧烷、氧化鋯、氫化二甲基矽油、矽烷偶合劑及鈦酸酯偶合劑等。Examples of the white pigment include at least one selected from Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, and S The particles of elemental oxides are preferably particles containing oxides of at least one element selected from Ti, Zr, Sn, Al and Si. As the oxide, titanium oxide and zirconium oxide are preferred, and titanium oxide is more preferred. Furthermore, examples of titanium oxide include rutile titanium oxide, anatase (Anatase) titanium oxide, and amorphous titanium oxide, and rutile titanium oxide is preferred. In addition, the above-mentioned oxide is preferably surface-treated with a surface-treating agent. Examples of surface treatment agents include inorganic compounds and organic compounds. Both inorganic compounds and organic compounds can be used at the same time. Specific examples of the surface treatment agent include polyol, alumina, aluminum hydroxide, amorphous silica, hydrous silica, alkanolamine, stearic acid, organosiloxane, zirconium oxide, hydrogenated dioxide Methyl silicone oil, silane coupling agent and titanate coupling agent, etc.
對白色系顏料的形狀並無特別限制。例如,可列舉各向同性形狀(例如,球狀、多面體狀等)、各向異性形狀(例如,針狀、棒狀及板狀等)、不定形狀等形狀。The shape of the white pigment is not particularly limited. For example, an isotropic shape (for example, spherical shape, polyhedral shape, etc.), anisotropic shape (for example, needle shape, rod shape, plate shape, etc.), an indefinite shape, and the like can be cited.
白色系顏料的1次粒子的重量平均粒徑為150nm以下為較佳,100nm以下為更佳,80nm以下為進一步較佳。下限值並無特別既定,但是1nm以上為較佳。再者,關於白色系顏料的重量平均粒徑,除非另有指明,則藉由利用丙二醇單甲醚乙酸酯將包含白色系顏料之混合液或分散液稀釋成80倍,並利用動態光散射法對所獲得之稀釋液進行測量來獲得。關於該測量,設為利用Nikkiso Co., Ltd.製Microtrac(產品名)UPA-EX150進行來獲得之重量平均粒徑。The weight average particle diameter of the primary particles of the white pigment is preferably 150 nm or less, more preferably 100 nm or less, and further preferably 80 nm or less. The lower limit value is not particularly set, but it is preferably 1 nm or more. In addition, regarding the weight average particle size of the white pigment, unless otherwise specified, the mixed liquid or dispersion containing the white pigment is diluted to 80 times by using propylene glycol monomethyl ether acetate, and dynamic light scattering is used Method to measure the obtained dilution. For this measurement, the weight average particle diameter obtained by using Microtrac (product name) UPA-EX150 manufactured by Nikkiso Co., Ltd. is assumed.
作為白色系顏料的比表面積,10~400m2 /g為較佳,20~200m2 /g為更佳,30~150m2 /g為進一步較佳。As a white pigment of specific surface area, 10 ~ 400m 2 / g is preferred, 20 ~ 200m 2 / g is more preferably, 30 ~ 150m 2 / g is further preferred.
作為白色系顏料的折射率,1.6~3.0為較佳。下限為1.7以上為較佳,1.8以上為更佳。作為上限,2.9以下為較佳,2.8以下為更佳。再者,白色系顏料的折射率的測量方法以日本工業規格(JIS K 0062:1992)為基準。The refractive index of the white pigment is preferably 1.6 to 3.0. The lower limit is preferably 1.7 or more, and more preferably 1.8 or more. As an upper limit, 2.9 or less is preferable, and 2.8 or less is more preferable. In addition, the measurement method of the refractive index of a white pigment is based on Japanese Industrial Standards (JIS K 0062:1992).
白色系顏料可以使用市售品。例如,作為氧化鈦,可列舉TTO系列(TTO-51(A)、TTO-51(C)、TTO-55(C)等)、TTO-S、V系列(TTO-S-1、TTO-S-2、TTO-V-3等)(以上,產品名,ISHIHARA SANGYO KAISHA, LTD.製)、MT系列(MT-01、MT-05等)(TAYCA CORPORATION製,產品名)等。As the white pigment, a commercially available product can be used. For example, as the titanium oxide, TTO series (TTO-51 (A), TTO-51 (C), TTO-55 (C), etc.), TTO-S, V series (TTO-S-1, TTO-S -2, TTO-V-3, etc.) (above, product name, manufactured by ISHIHARA SANGYO KAISHA, LTD.), MT series (MT-01, MT-05, etc.) (manufactured by TAYCA CORPORATION, product name), etc.
本發明的透鏡用組成物含有白色系顏料之情況下,白色系顏料的含量在透鏡用組成物的總固體成分中為10~60質量%為較佳。上限為50質量%以下為較佳,40質量%以下為更佳。下限為15質量%以上為較佳,20質量%以上為進一步較佳。本發明的透鏡用組成物可以僅包含1種白色系顏料,亦可以包含2種以上。包含2種以上之情況下,該等合計量在上述範圍為較佳。 又,本發明的透鏡用組成物實質上不含有白色系顏料亦為較佳。依該態樣,容易形成表面粗糙度小之透鏡。本發明的透鏡用組成物實質上不含有白色系顏料之情況是指,白色系顏料的含量在透鏡用組成物的總固體成分中為0.1質量%以下,0.05質量%以下為較佳,0.01質量%以下為進一步較佳,不含有為特佳。When the composition for lenses of the present invention contains a white pigment, the content of the white pigment is preferably 10 to 60% by mass in the total solid content of the lens composition. The upper limit is preferably 50% by mass or less, and more preferably 40% by mass or less. The lower limit is preferably 15% by mass or more, and more preferably 20% by mass or more. The lens composition of the present invention may contain only one kind of white pigment, or may contain two or more kinds. When two or more types are included, the total amount is preferably within the above range. Moreover, it is also preferable that the lens composition of the present invention does not substantially contain a white pigment. According to this aspect, it is easy to form a lens with a small surface roughness. The case where the composition for lenses of the present invention does not substantially contain a white pigment means that the content of the white pigment in the total solid content of the lens composition is 0.1% by mass or less, preferably 0.05% by mass or less, and 0.01% by mass % Or less is further preferred, and not contained is particularly preferred.
<<溶劑>> 本發明的透鏡用組成物含有溶劑為較佳。作為溶劑,可列舉有機溶劑。溶劑只要滿足各成分的溶解性或透鏡用組成物的塗佈性,則基本無特別限制。作為有機溶劑,可列舉酯系溶劑、酮系溶劑、醇系溶劑、醯胺系溶劑、醚系溶劑及烴系溶劑等。關於該等的詳細內容,能夠參閱國際公開第2015/166779號的0223段,將該內容編入本說明書中。又,亦能夠較佳地使用環狀烷基所取代之酯系溶劑及環狀烷基所取代之酮系溶劑。作為有機溶劑的具體例,可列舉聚乙二醇單甲基醚、二氯甲烷、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙基賽路蘇乙酸酯、乳酸乙酯、二乙二醇二甲醚、乙酸丁酯、3-甲氧基丙酸甲酯、2-庚酮、環己酮、乙酸環己酯、環戊酮、乙基卡必醇乙酸酯、丁基卡必醇乙酸酯、丙二醇單甲醚、丙二醇單甲醚乙酸酯、3-甲氧基-N,N-二甲基丙醯胺及3-丁氧基-N,N-二甲基丙醯胺等。但是,關於作為溶劑的芳香族烴類(苯、甲苯、二甲苯及乙基苯等),存在因環境方面等理由而減少為佳之情況(例如,相對於有機溶劑總量,亦能夠設為50質量ppm(parts per million,百萬分率)以下,亦能夠設為10質量ppm以下,還能夠設為1質量ppm以下)。<<Solvent>> The lens composition of the present invention preferably contains a solvent. Examples of the solvent include organic solvents. The solvent is basically not particularly limited as long as it satisfies the solubility of each component or the coatability of the lens composition. Examples of organic solvents include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For details of these, please refer to paragraph 0223 of International Publication No. 2015/166779, and incorporate the contents into this specification. In addition, an ester solvent substituted with a cyclic alkyl group and a ketone solvent substituted with a cyclic alkyl group can also be preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethyl celulose acetate , Ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol Acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropylamide and 3-butoxy-N , N-dimethylpropylamide, etc. However, the aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as solvents may be reduced due to environmental reasons (for example, it can be set to 50 relative to the total amount of organic solvents) Mass ppm (parts per million) or less can also be set to 10 mass ppm or less, and can also be set to 1 mass ppm or less).
本發明中,使用金屬含量少之溶劑為較佳,例如溶劑的金屬含量例如為10質量ppb(十億分率,parts per billion)以下為較佳。依需要,亦可以使用質量ppt(兆分率,parts per trillion)級別的溶劑,該種高純度溶劑例如由TOYO Gosei Co.,Ltd.所提供(化學工業日報,2015年11月13日)。In the present invention, it is preferable to use a solvent with a small metal content. For example, the metal content of the solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, you can also use a quality ppt (parts per trillion) grade of solvents, such high-purity solvents such as provided by TOYO Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).
作為從溶劑中去除金屬等雜質之方法,例如能夠列舉蒸餾(分子蒸餾和薄膜蒸餾等)或使用過濾器之過濾。作為用於過濾之過濾器的過濾器孔徑,10μm以下為較佳,5μm以下為更佳,3μm以下為進一步較佳。過濾器的材質為聚四氟乙烯、聚乙烯或尼龍為較佳。Examples of the method for removing impurities such as metals from the solvent include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The material of the filter is preferably Teflon, polyethylene or nylon.
溶劑中可以包含異構物(原子數相同但是結構不同之化合物)。又,異構物可以僅包含1種,亦可以包含複數種。The solvent may contain isomers (compounds with the same number of atoms but different structures). In addition, the isomer may contain only one kind or plural kinds.
本發明中,有機溶劑中的過氧化物的含有率為0.8mmol/L以下為較佳,實質上不含有過氧化物為更佳。In the present invention, the content rate of the peroxide in the organic solvent is preferably 0.8 mmol/L or less, and it is more preferably substantially free of the peroxide.
透鏡用組成物中之溶劑的含量為40~90質量%為較佳。下限為50質量%以上為較佳,55質量%以上為更佳,60質量%以上為進一步較佳。上限為85質量%以下為較佳,80質量%以下為更佳,75質量%以下為進一步較佳。The content of the solvent in the lens composition is preferably 40 to 90% by mass. The lower limit is preferably 50% by mass or more, more preferably 55% by mass or more, and further preferably 60% by mass or more. The upper limit is preferably 85% by mass or less, more preferably 80% by mass or less, and further preferably 75% by mass or less.
又,從環境法規的觀點考慮,本發明的透鏡用組成物實質上不含有環境法規物質為較佳。再者,本發明中,實質上不含有環境法規物質是指透鏡用組成物中之環境法規物質的含量為50質量ppm以下,30質量ppm以下為較佳,10質量ppm以下為進一步較佳,1質量ppm以下為特佳。環境法規物質例如可列舉苯;甲苯、二甲苯等烷基苯類;及氯苯等鹵化苯類等。該等基於REACH(Registration Evaluation Authorization and Restriction of CHemicals:化學品註冊評估授權與限制)法規、PRTR(Pollutant Release and Transfer Register:環境污染物排放與轉移登記制度)法、VOC(Volatile Organic Compounds:揮發性有機化合物)法規等註冊為環境法規物質,使用量和處理方法受到嚴格管制。該等化合物有時在製造本發明的透鏡用組成物中所使用之各成分等時用作溶劑且有時作為殘留溶劑混入至透鏡用組成物中。從對人的安全性、對環境的考慮的觀點考慮,盡可能地減少該等物質為較佳。作為減少環境法規物質之方法,可列舉將系統內部進行加熱和減壓而設為環境法規物質的沸點以上,並從系統中蒸餾去除環境法規物質並將其減少之方法。又,蒸餾去除少量的環境法規物質之情況下,為了提高效率而與具有和該溶劑相同的沸點之溶劑共沸亦是有用的。又,當含有具有自由基聚合性之化合物時,可以在添加聚合抑制劑之後減壓蒸餾去除,以便抑制在減壓蒸餾去除過程中進行自由基聚合反應而導致在分子間進行交聯。該等蒸餾去除方法能夠在原料階段、使原料反應之產物(例如聚合後的樹脂溶液和多官能單體溶液)的階段或藉由混合該等化合物而製作之透鏡用組成物的階段中的任一階段中進行。From the viewpoint of environmental regulations, it is preferable that the lens composition of the present invention does not substantially contain environmental regulations. In addition, in the present invention, substantially not containing environmental regulatory substances means that the content of environmental regulatory substances in the lens composition is 50 mass ppm or less, preferably 30 mass ppm or less, and further preferably 10 mass ppm or less. 1 mass ppm or less is particularly preferable. Examples of environmental regulations include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These are based on REACH (Registration Evaluation Authorization and Restriction of CHemicals) regulations, PRTR (Pollutant Release and Transfer Register) laws, and VOC (Volatile Organic Compounds: volatile Organic compounds) laws and regulations are registered as environmental laws and regulations, and their usage and disposal methods are strictly controlled. These compounds are sometimes used as solvents in the production of the components used in the lens composition of the present invention and the like, and are sometimes mixed into the lens composition as a residual solvent. From the viewpoint of human safety and environmental considerations, it is better to reduce these substances as much as possible. As a method of reducing environmental regulations substances, a method of heating and depressurizing the inside of the system to be higher than the boiling point of environmental regulations substances, and distilling and removing environmental regulations substances from the system and reducing them. In addition, when distilling a small amount of environmental regulations, it is also useful to azeotrope with a solvent having the same boiling point as the solvent in order to improve efficiency. In addition, when a compound having radical polymerizability is contained, it may be distilled off under reduced pressure after the addition of a polymerization inhibitor, so as to suppress the radical polymerization reaction during the distillation under reduced pressure and cause crosslinking between molecules. These distillation and removal methods can be any of the raw material stage, the stage of the product reacting the raw material (for example, the resin solution after polymerization and the polyfunctional monomer solution), or the stage of the lens composition prepared by mixing these compounds In one stage.
<<硬化促進劑>> 本發明的透鏡用組成物可以以促進聚合性單體的反應或降低硬化溫度為目的添加硬化促進劑。作為硬化促進劑,可列舉在分子內具有2個以上的巰基之多官能硫醇化合物等。多官能硫醇化合物亦能夠以穩定性、臭味、解析度、顯影性、密接性等的改良為目的而添加。多官能硫醇化合物為二級烷基硫醇類為較佳,由式(T1)所表示之化合物為更佳。 式(T1) [化學式18] (式(T1)中,n表示2~4的整數,L表示2~4價的連接基。)<<hardening accelerator>> The lens composition of the present invention may be added with a curing accelerator for the purpose of promoting the reaction of the polymerizable monomer or lowering the curing temperature. Examples of the curing accelerator include polyfunctional thiol compounds having two or more thiol groups in the molecule. The polyfunctional thiol compound can also be added for the purpose of improving stability, odor, resolution, developability, adhesion, and the like. The polyfunctional thiol compound is preferably a secondary alkyl thiol, and the compound represented by formula (T1) is more preferable. Formula (T1) [Chemical Formula 18] (In formula (T1), n represents an integer of 2 to 4, and L represents a 2 to 4 valent linking group.)
式(T1)中,連接基L為碳數2~12的脂肪族基為較佳,n為2,L為碳數2~12的伸烷基為特佳。In the formula (T1), the linking group L is preferably an aliphatic group having 2 to 12 carbon atoms, n is 2, and L is an alkylene group having 2 to 12 carbon atoms.
又,硬化促進劑亦能夠使用羥甲基系化合物(例如在日本特開2015-034963號公報的0246段中,作為交聯劑而例示之化合物)、胺類、鏻鹽、脒鹽、醯胺化合物(以上,例如為日本特開2013-041165號公報的0186段中所記載的硬化劑)、鹼產生劑(例如為日本特開2014-055114號公報中所記載的離子性化合物)、氰酸酯化合物(例如為日本特開2012-150180號公報的0071段中所記載的化合物)、烷氧基矽烷化合物(例如為日本特開2011-253054號公報中所記載的具有環氧基之烷氧基矽烷化合物)、鎓鹽化合物(例如,在日本特開2015-034963號公報的0216段中作為酸產生劑而例示之化合物、日本特開2009-180949號公報中所記載的化合物)等。In addition, as the hardening accelerator, a hydroxymethyl compound (for example, a compound exemplified as a crosslinking agent in paragraph 0246 of Japanese Patent Laid-Open No. 2015-034963), amines, phosphonium salts, amidine salts, and amides can also be used Compounds (above, for example, the curing agent described in paragraph 0186 of Japanese Patent Laid-Open No. 2013-041165), alkali generators (for example, ionic compounds described in Japanese Patent Laid-Open No. 2014-055114), cyanic acid Ester compound (for example, the compound described in paragraph 0071 of Japanese Unexamined Patent Publication No. 2012-150180), alkoxysilane compound (for example, an alkoxy group having an epoxy group described in Japanese Unexamined Patent Publication No. 2011-253054 Silane compound), onium salt compounds (for example, the compounds exemplified as the acid generator in paragraph 0216 of Japanese Patent Laid-Open No. 2015-034963, the compounds described in Japanese Patent Laid-Open No. 2009-180949), etc.
本發明的透鏡用組成物含有硬化促進劑之情況下,硬化促進劑的含量在透鏡用組成物的總固體成分中為0.3~8.9質量%為較佳,0.8~6.4質量%為更佳。When the composition for a lens of the present invention contains a curing accelerator, the content of the curing accelerator is preferably 0.3 to 8.9% by mass in the total solid content of the lens composition, and more preferably 0.8 to 6.4% by mass.
<<矽烷偶合劑>> 本發明的透鏡用組成物含有矽烷偶合劑為較佳。藉由含有矽烷偶合劑,容易獲得與支撐體的密接性優異之透鏡。作為矽烷偶合劑,在一個分子中具有至少2種反應性不同之官能基之矽烷化合物為較佳。矽烷偶合劑為具有選自乙烯基、環氧基、苯乙烯基、甲基丙烯醯基、胺基、異氰脲酸酯基、脲基、巰基、硫醚基及異氰酸酯基中之至少1種基團及烷氧基之矽烷化合物為較佳。作為矽烷偶合劑的具體例,可列舉N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷(Shin-Etsu Chemical Co., Ltd.製、KBM-602)、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷(Shin-Etsu Chemical Co., Ltd.製、KBM-603)、3-胺基丙基三甲氧基矽烷(Shin-Etsu Chemical Co., Ltd.製、KBM-903)、3-胺基丙基三乙氧基矽烷(Shin-Etsu Chemical Co., Ltd.製、KBE-903)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(Shin-Etsu Chemical Co., Ltd.製、KBM-503)、3-環氧丙氧基丙基三甲氧基矽烷(Shin-Etsu Chemical Co., Ltd.製、KBM-403)等。關於矽烷偶合劑的詳細內容,能夠參閱日本特開2013-254047號公報的0155~0158段中的記載,將該內容編入本說明書中。本發明的透鏡用組成物含有矽烷偶合劑之情況下,矽烷偶合劑的含量在透鏡用組成物的總固體成分中為0.001~20質量%為較佳,0.01~10質量%為更佳,0.1質量%~5質量%為特佳。本發明的透鏡用組成物可以僅包含1種矽烷偶合劑,亦可以包含2種以上。包含2種以上之情況下,該等合計量在上述範圍為較佳。<<Silane coupling agent>> The lens composition of the present invention preferably contains a silane coupling agent. By containing a silane coupling agent, it is easy to obtain a lens with excellent adhesion to the support. As the silane coupling agent, a silane compound having at least two functional groups having different reactivity in one molecule is preferred. The silane coupling agent has at least one selected from the group consisting of vinyl group, epoxy group, styryl group, methacryl group, amine group, isocyanurate group, urea group, mercapto group, thioether group and isocyanate group Silane compounds of groups and alkoxy groups are preferred. Specific examples of the silane coupling agent include N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-602) , N-2-(aminoethyl)-3-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-603), 3-aminopropyltrimethoxysilane ( Shin-Etsu Chemical Co., Ltd., KBM-903), 3-aminopropyltriethoxysilane (Shin-Etsu Chemical Co., Ltd., KBE-903), 3-methacrylonitrile Oxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-503), 3-glycidoxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-403) etc. For details of the silane coupling agent, refer to the description in paragraphs 0155 to 0158 of JP-A-2013-254047, and incorporate the contents into this specification. When the composition for a lens of the present invention contains a silane coupling agent, the content of the silane coupling agent in the total solid content of the lens composition is preferably 0.001 to 20% by mass, more preferably 0.01 to 10% by mass, 0.1 Mass% ~ 5 mass% is particularly good. The lens composition of the present invention may contain only one kind of silane coupling agent, or may contain two or more kinds. When two or more types are included, the total amount is preferably within the above range.
<<聚合抑制劑>> 本發明的透鏡用組成物能夠含有聚合抑制劑。作為聚合抑制劑,可列舉氫醌、對甲氧基苯酚、二-第三丁基-對甲酚、鄰苯三酚、第三丁基鄰苯二酚、苯醌、4,4’-硫代雙(3-甲基-6-第三丁基苯酚)、2,2’-亞甲基雙(4-甲基-6-第三丁基苯酚)、N-亞硝基雙羥基胺鹽(銨鹽、第一鈰鹽等)等。本發明的透鏡用組成物含有聚合抑制劑之情況下,聚合抑制劑的含量在透鏡用組成物的總固體成分中為0.0001~5質量%為較佳。本發明的透鏡用組成物可以僅包含1種聚合抑制劑,亦可以包含2種以上。包含2種以上之情況下,該等合計量在上述範圍為較佳。<<Polymerization inhibitor>> The lens composition of the present invention can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-third butyl-p-cresol, pyrogallol, tertiary butyl catechol, benzoquinone, and 4,4′-sulfur. Bis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol), N-nitrosobishydroxylamine salt (Ammonium salt, first cerium salt, etc.) etc. When the composition for lenses of the present invention contains a polymerization inhibitor, the content of the polymerization inhibitor is preferably 0.0001 to 5% by mass in the total solid content of the composition for lenses. The lens composition of the present invention may contain only one kind of polymerization inhibitor, or may contain two or more kinds. When two or more types are included, the total amount is preferably within the above range.
<<紫外線吸收劑>> 本發明的透鏡用組成物能夠含有紫外線吸收劑。紫外線吸收劑能夠使用共軛二烯化合物、胺基二烯化合物、水楊酸酯化合物、二苯甲酮化合物、苯并三唑化合物、丙烯腈化合物、羥苯基三𠯤化合物、吲哚化合物及三𠯤化合物等。關於該等的詳細內容,能夠參閱日本特開2012-208374號公報的0052~0072段、日本特開2013-068814號公報的0317~0334段、日本特開2016-162946號公報的0061~0080段的記載,將該等內容編入本說明書中。作為紫外線吸收劑的市售品,例如可列舉UV-503(DAITO CHEMICAL CO.,LTD.製)等。又,作為苯并三唑化合物,可列舉MIYOSHI & FAT CO.,LTD.製的MYUA系列(化學工業日報,2016年2月1日)。又,作為紫外線吸收劑,亦能夠使用日本專利第6268967號公報的0049~0059段中所記載的化合物。本發明的透鏡用組成物含有紫外線吸收劑之情況下,紫外線吸收劑的含量在透鏡用組成物的總固體成分中為0.1~10質量%為較佳,0.1~5質量%為更佳,0.1~3質量%為特佳。又,紫外線吸收劑可以僅使用1種,亦可以使用2種以上。使用2種以上之情況下,合計量在上述範圍為較佳。<<UV absorber>> The lens composition of the present invention can contain an ultraviolet absorber. As the ultraviolet absorber, conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyl triphenyl compounds, indole compounds, and the like can be used. Three 𠯤 compounds etc. For details of these, please refer to paragraphs 0052-0072 of JP-A 2012-208374, paragraphs 0317-0334 of JP-A 2013-068814, and paragraphs 0061-0080 of JP-A 2016-162946 The contents of this document are incorporated into this manual. Examples of commercially available products of ultraviolet absorbers include UV-503 (manufactured by DAITO CHEMICAL CO., LTD.) and the like. In addition, examples of the benzotriazole compound include the MYUA series manufactured by MIYOSHI & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016). In addition, as the ultraviolet absorber, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 can also be used. When the composition for lenses of the present invention contains an ultraviolet absorber, the content of the ultraviolet absorber is preferably 0.1 to 10% by mass in the total solid content of the lens composition, more preferably 0.1 to 5% by mass, 0.1 ~3% by mass is particularly good. In addition, only one type of ultraviolet absorber may be used, or two or more types may be used. When two or more types are used, the total amount is preferably in the above range.
<<界面活性劑>> 本發明的透鏡用組成物能夠含有界面活性劑。作為界面活性劑,能夠使用氟系界面活性劑、非離子系界面活性劑、陽離子系界面活性劑、陰離子系界面活性劑、矽酮系界面活性劑等各種界面活性劑。關於界面活性劑,能夠參閱國際公開第2015/166779號的0238~0245段,將該內容編入本說明書中。<<Surfactant>> The lens composition of the present invention can contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a non-ionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone surfactant can be used. For the surfactant, refer to paragraphs 0238 to 0245 of International Publication No. 2015/166779, and incorporate this content into this specification.
本發明中,界面活性劑為氟系界面活性劑為較佳。藉由使透鏡用組成物含有氟系界面活性劑,能夠進一步提高液特性(尤其,流動性),並且進一步改善省液性。又,還能夠形成厚度不均少之膜。In the present invention, the surfactant is preferably a fluorine-based surfactant. By containing the fluorine-based surfactant in the lens composition, the liquid characteristics (particularly, fluidity) can be further improved, and the liquid saving property can be further improved. In addition, it is possible to form a film with less unevenness in thickness.
氟系界面活性劑中的氟含有率為3~40質量%為較佳,更佳為5~30質量%,特佳為7~25質量%。氟含有率在該範圍內之氟系界面活性劑,從塗佈膜的厚度的均勻性或省液性的方面而言為有效,透鏡用組成物中之溶解性亦良好。The fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. The fluorine-based surfactant having a fluorine content in this range is effective from the viewpoint of uniformity of the thickness of the coating film or liquid-saving property, and the solubility in the lens composition is also good.
作為氟系界面活性劑,可列舉日本特開2014-041318號公報的0060~0064段(相對應之國際公開第2014/017669號的0060~0064段)等中所記載的界面活性劑、日本特開2011-132503號公報的0117~0132段中所記載的界面活性劑,將該等內容編入本說明書中。作為氟系界面活性劑的市售品,例如可列舉Magaface F171、F172、F173、F176、F177、F141、F142、F143、F144、R30、F437、F475、F479、F482、F554、F780、EXP、MFS-330(以上,DIC CORPORATION製)、Fluorad FC430、FC431、FC171(以上,Sumitomo 3M Limited製)、Surflon S-382、SC-101、SC-103、SC-104、SC-105、SC-1068、SC-381、SC-383、S-393、KH-40(以上,ASAHI GLASS CO.,LTD.製)、PolyFox PF636、PF656、PF6320、PF6520、PF7002(以上,OMNOVA SOLUTIONS INC.製)等。Examples of fluorine-based surfactants include those described in paragraphs 0060 to 0064 of Japanese Patent Laid-Open No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), etc. The surfactants described in paragraphs 0117 to 0132 of 2011-132503 are incorporated in this specification. Examples of commercially available products of fluorine-based surfactants include Magaface F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, and MFS. -330 (above, made by DIC CORPORATION), Fluorad FC430, FC431, FC171 (above, made by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (above, manufactured by ASAHI GLASS CO., LTD.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (above, manufactured by OMNOVA SOLUTIONS INC.), etc.
又,氟系界面活性劑亦能夠較佳地使用丙烯酸系化合物,該丙烯酸系化合物具備具有含有氟原子之官能基之分子結構,若進行加熱則含有氟原子之官能基的部分斷裂而氟原子揮發。作為該等氟系界面活性劑,可列舉DIC CORPORATION製的Magaface DS系列(化學工業日報,2016年2月22日)(日經產業新聞,2016年2月23日)、例如Magaface DS-21。In addition, as the fluorine-based surfactant, an acrylic compound can be preferably used. The acrylic compound has a molecular structure having a functional group containing a fluorine atom. When heated, a part of the functional group containing a fluorine atom is broken and the fluorine atom is volatilized. . Examples of such fluorine-based surfactants include Magaface DS series manufactured by DIC CORPORATION (Chemical Industry Daily, February 22, 2016) (Nikkei Industry News, February 23, 2016), and, for example, Magaface DS-21.
又,氟系界面活性劑使用具有氟化烷基或氟化伸烷基醚基之含氟原子乙烯醚化合物與親水性乙烯醚化合物的聚合物亦為較佳。該種氟系界面活性劑能夠參閱日本特開2016-216602號公報的記載,並將該內容編入本說明書中。In addition, as the fluorine-based surfactant, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkyl ether group and a hydrophilic vinyl ether compound. Such a fluorine-based surfactant can refer to the description in Japanese Patent Laid-Open No. 2016-216602, and this content is incorporated in this specification.
氟系界面活性劑亦能夠使用封端聚合物。例如可列舉日本特開2011-089090號公報中所記載之化合物。氟系界面活性劑還能夠較佳地使用含氟高分子化合物,該含氟高分子化合物含有:來自於具有氟原子之(甲基)丙烯酸酯化合物之重複單元;及來自於具有2個以上(較佳為5個以上)伸烷氧基(較佳為伸乙氧基、伸丙氧基)之(甲基)丙烯酸酯化合物之重複單元。作為本發明中所使用之氟系界面活性劑,還例示出下述化合物。 [化學式19] 關於上述的化合物的重量平均分子量,較佳為3000~50000,例如為14000。上述的化合物中,表示重複單元的比例之%為莫耳%。As the fluorine-based surfactant, a blocked polymer can also be used. For example, the compound described in JP 2011-089090 can be cited. As the fluorine-based surfactant, a fluorine-containing polymer compound can be preferably used. The fluorine-containing polymer compound contains: repeating units derived from a (meth)acrylate compound having a fluorine atom; and from having more than 2 ( It is preferably 5 or more) repeating units of the (meth)acrylate compound of the alkoxy group (preferably the ethoxy group and the propylene group). As the fluorine-based surfactant used in the present invention, the following compounds are also exemplified. [Chemical Formula 19] The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above-mentioned compounds,% representing the ratio of repeating units is mole %.
又,氟系界面活性劑亦能夠使用在側鏈具有乙烯性不飽和鍵基之含氟聚合物。作為具體例,可列舉日本特開2010-164965號公報的0050~0090段及0289~0295段中所記載之化合物、例如DIC CORPORATION製的Magaface RS-101、RS-102、RS-718K、RS-72-K等。氟系界面活性劑亦能夠使用日本特開2015-117327號公報的0015~0158段中所記載的化合物。In addition, as the fluorine-based surfactant, a fluoropolymer having an ethylenically unsaturated bond group in the side chain can also be used. Specific examples include the compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of Japanese Patent Laid-Open No. 2010-164965, for example, Magaface RS-101, RS-102, RS-718K, RS- manufactured by DIC CORPORATION 72-K etc. As the fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used.
作為非離子系界面活性劑,可列舉甘油、三羥甲基丙烷、三羥甲基乙烷以及它們的乙氧基化物及丙氧基化物(例如,甘油丙氧基化物、甘油乙氧基化物等)、聚氧乙烯月桂基醚、聚氧乙烯硬脂基醚、聚氧乙烯油基醚、聚氧乙烯辛基苯基醚、聚氧乙烯壬基苯基醚、聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯、脫水山梨糖醇脂肪酸酯、PLURONIC L10、L31、L61、L62、10R5、17R2、25R2(BASF公司製)、TETRONIC 304、701、704、901、904、150R1(BASF公司製)、SOLSPERSE 20000(Lubrizol Japan Ltd.製)、NCW-101、NCW-1001、NCW-1002(Wako Pure Corporation製)、PIONIN D-6112、D-6112-W、D-6315(Takemoto Oil & Fat Co.,Ltd.製)、OLFIN E1010、Surfynol 104、400、440(Nissin Chemical Co.,Ltd.製)等。Examples of nonionic surfactants include glycerin, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerin propoxylates, glycerin ethoxylates) Etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol dilaurate Ester, polyethylene glycol distearate, sorbitan fatty acid ester, PLURONIC L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), TETRONIC 304, 701, 704, 901, 904 , 150R1 (manufactured by BASF), SOLSPERSE 20000 (manufactured by Lubrizol Japan Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Corporation), PIONIN D-6112, D-6112-W, D-6315 (Manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.
作為矽酮系界面活性劑,例如可列舉Toray Silicone DC3PA、Toray Silicone SH7PA、Toray Silicone DC11PA、Toray Silicone SH21PA、Toray Silicone SH28PA、Toray Silicone SH29PA、Toray Silicone SH30PA、Toray Silicone SH8400(以上,Dow Corning Toray Co.,Ltd.製)、TSF-4440、TSF-4300、TSF-4445、TSF-4460、TSF-4452(以上,Momentive performance Materials Inc.製)、KP-341、KF-6001、KF-6002(以上,Shin-Etsu Chemical Co., Ltd.製)、BYK307、BYK323、BYK330(以上,BYK Chemie GmbH製)等。Examples of silicone surfactants include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (above, Dow Corning Toray Co. , Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (above, manufactured by Momentive Performance Materials Inc.), KP-341, KF-6001, KF-6002 (above, Shin-Etsu Chemical Co., Ltd.), BYK307, BYK323, BYK330 (above, BYK Chemie GmbH), etc.
界面活性劑在透鏡用組成物的總固體成分中之含量為0.001~5.0質量%為較佳,0.005~3.0質量%為更佳。界面活性劑可以僅為1種,亦可以為2種以上。2種以上之情況下,該等合計量在上述範圍為較佳。The content of the surfactant in the total solid content of the lens composition is preferably 0.001 to 5.0% by mass, and more preferably 0.005 to 3.0% by mass. The surfactant may be only one kind or two or more kinds. In two or more cases, the total amount is preferably within the above range.
<<其他添加劑>> 本發明的透鏡用組成物中能夠依需要摻合各種添加劑,例如填充劑、密接促進劑、抗氧化劑、抗凝聚劑等。作為該等添加劑,能夠舉出日本特開2004-295116號公報的0155~0156段中所記載的添加劑,將該內容編入本說明書中。又,作為抗氧化劑,例如能夠使用酚化合物、磷系化合物(例如日本特開2011-090147號公報的0042段中所記載的化合物)、硫醚化合物等。作為市售品,例如可列舉ADEKA CORPORATION製造的Adekastab系列(AO-20、AO-30、AO-40、AO-50、AO-50F、AO-60、AO-60G、AO-80、AO-330等)。又,作為抗氧化劑,亦能夠使用國際公開第2017/006600號中所記載之多官能受阻胺抗氧化劑、國際公開第2017/164024號中所記載之抗氧化劑、日本專利第6268967號公報的0023~0048段中所記載之抗氧化劑。抗氧化劑可以僅使用1種,亦可以使用2種以上。又,本發明的透鏡用組成物依需要可以含有潛伏的抗氧化劑。作為潛伏的抗氧化劑,可列舉作為抗氧化劑而發揮功能之部位被保護基保護之化合物,且保護基藉由在100~250℃下進行加熱或在酸/鹼觸媒存在下在80~200℃下進行加熱而脫離並作為抗氧化劑而發揮功能之化合物。作為潛伏的抗氧化劑的具體例,可列舉國際公開WO2014/021023號公報、國際公開第2017/030005號、日本特開2017-008219號公報中所記載之化合物。作為市售品,可列舉ADEKAARKLS GPA-5001(ADEKA CORPORATION製)等。又,本發明的透鏡用組成物能夠含有日本特開2004-295116號公報的0078段中所記載的增感劑或光穩定劑、日本特開2004-295116號公報的0081段中所記載的熱聚合抑制劑。<<Other additives>> Various additives such as fillers, adhesion promoters, antioxidants, and anti-agglomerating agents can be blended into the lens composition of the present invention as needed. Examples of such additives include those described in paragraphs 0155 to 0156 of Japanese Patent Laid-Open No. 2004-295116, and the contents are incorporated in this specification. In addition, as the antioxidant, for example, a phenol compound, a phosphorus-based compound (for example, a compound described in paragraph 0044 of Japanese Patent Laid-Open No. 2011-090147), and a sulfide compound can be used. Examples of commercially available products include Adekastab series (AO-20, AO-30, AO-40, AO-50, AO-50F, AO-60, AO-60G, AO-80, AO-330 manufactured by ADEKA CORPORATION Wait). In addition, as the antioxidant, the polyfunctional hindered amine antioxidant described in International Publication No. 2017/006600, the antioxidant described in International Publication No. 2017/164024, and Japanese Patent No. 6268967 0023- The antioxidant described in paragraph 0048. Only one type of antioxidant may be used, or two or more types may be used. In addition, the lens composition of the present invention may contain a latent antioxidant as needed. As a latent antioxidant, a compound in which a part functioning as an antioxidant is protected by a protecting group, and the protecting group is heated at 100 to 250°C or at 80 to 200°C in the presence of an acid/base catalyst A compound that is heated to be detached and functions as an antioxidant. As specific examples of the latent antioxidant, the compounds described in International Publication No. WO2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Publication No. 2017-008219 can be cited. Examples of commercially available products include ADEKAARKLS GPA-5001 (manufactured by ADEKA CORPORATION). Furthermore, the lens composition of the present invention can contain the sensitizer or light stabilizer described in paragraph 0078 of Japanese Patent Laid-Open No. 2004-295116, and the heat described in paragraph 0081 of Japanese Patent Laid-Open No. 2004-295116 Polymerization inhibitor.
本發明的透鏡用組成物實質上不含有彩色著色劑及黑色著色劑為較佳。本發明的透鏡用組成物實質上不含有彩色著色劑及黑色著色劑之情況是指,彩色著色劑及黑色著色劑的合計含量在透鏡用組成物的總固體成分中為0.1質量%以下,0.05質量%以下為較佳,0.01質量%以下為進一步較佳,不含有為特佳。再者,在此所言之彩色著色劑中不包含上述白色系顏料。It is preferable that the lens composition of the present invention does not substantially contain color colorants and black colorants. The case where the composition for lenses of the present invention does not substantially contain a color colorant and a black colorant means that the total content of the color colorant and black colorant is 0.1% by mass or less in the total solid content of the lens composition, 0.05 Mass% or less is preferable, 0.01 mass% or less is even more preferable, and no content is particularly preferable. In addition, the color colorant mentioned here does not contain the said white pigment.
本發明的透鏡用組成物的黏度(25℃)為1.5~10mPa・s為較佳。下限為2.0mPa・s以上為較佳,2.5mPa・s以上為更佳。上限為9.5mPa・s以下為較佳,9.0mPa・s以下為更佳。黏度只要在上述範圍內,則塗佈性優異。The viscosity (25°C) of the lens composition of the present invention is preferably from 1.5 to 10 mPa・s. The lower limit is preferably 2.0 mPa・s or more, and more preferably 2.5 mPa・s or more. The upper limit is preferably 9.5 mPa・s or less, and more preferably 9.0 mPa・s or less. As long as the viscosity is within the above range, the coatability is excellent.
本發明的透鏡用組成物的固體成分濃度為15~50質量%為較佳。下限為20質量%以上為較佳,25質量%以上為更佳。上限為45質量%以下為較佳,40質量%以下為更佳。固體成分濃度只要在上述範圍內,則容易製造起皺或空隙得到抑制之透鏡。The solid content concentration of the lens composition of the present invention is preferably 15 to 50% by mass. The lower limit is preferably 20% by mass or more, and more preferably 25% by mass or more. The upper limit is preferably 45% by mass or less, and more preferably 40% by mass or less. As long as the solid content concentration is within the above range, it is easy to produce a lens with wrinkles or voids suppressed.
關於本發明的透鏡用組成物,未與顏料等鍵結或配位之游離的金屬的含量為100ppm以下為較佳,50ppm以下為更佳,10ppm以下為進一步較佳,實質上不含有為特佳。依該態樣,能夠期待顏料分散性的穩定化(凝聚抑止)、分散性良化所伴隨之分光特性的提高、硬化性成分的穩定化或金屬原子/金屬離子的溶出所伴隨之導電性變動的抑止、顯示特性的提高等效果。又,還可獲得日本特開2012-153796號公報、日本特開2000-345085號公報、日本特開2005-200560號公報、日本特開平08-043620號公報、日本特開2004-145078號公報、日本特開2014-119487號公報、日本特開2010-083997號公報、日本特開2017-090930號公報、日本特開2018-025612號公報、日本特開2018-025797號公報、日本特開2017-155228號公報、日本特開2018-036521號公報等中所記載之效果。作為上述游離的金屬的種類,可列舉Na、K、Ca、Sc、Ti、Mn、Cu、Zn、Fe、Cr、Co、Mg、Al、Sn、Zr、Ga、Ge、Ag、Au、Pt、Cs、Bi等。又,關於本發明的透鏡用組成物,未與顏料等鍵結或配位之游離的鹵素的含量為100ppm以下為較佳,50ppm以下為更佳,10ppm以下為進一步較佳,實質上不含有為特佳。作為減少組成物中的游離的金屬或鹵素的方法,可列舉基於離子交換水之清洗、過濾、超過濾、基於離子交換樹脂之純化等方法。Regarding the lens composition of the present invention, the content of the free metal that is not bonded or coordinated with the pigment or the like is preferably 100 ppm or less, more preferably 50 ppm or less, and even more preferably 10 ppm or less. good. According to this aspect, it is possible to expect the improvement of the spectroscopic characteristics accompanying the stabilization of the pigment dispersion (agglomeration inhibition), the improvement of the dispersibility, the stabilization of the curable component, or the change in the conductivity accompanying the elution of metal atoms/metal ions. The effect of the suppression, the improvement of display characteristics and so on. In addition, Japanese Patent Laid-Open No. 2012-153796, Japanese Patent Laid-Open No. 2000-345085, Japanese Patent Laid-Open No. 2005-200560, Japanese Patent Laid-Open No. 08-043620, Japanese Patent Laid-Open No. 2004-145078, Japanese Patent Application Publication No. 2014-119487, Japanese Patent Application Publication No. 2010-083997, Japanese Patent Application Publication 2017-090930, Japanese Patent Application Publication 2018-025612, Japanese Patent Application Publication 2018-025797, Japanese Patent Application 2017- Effects described in 155228, JP-A-2018-036521, etc. Examples of the above-mentioned free metal include Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, Cs, Bi, etc. In addition, regarding the lens composition of the present invention, the content of free halogen that is not bonded or coordinated with the pigment or the like is preferably 100 ppm or less, more preferably 50 ppm or less, and even more preferably 10 ppm or less, and does not substantially contain It is especially good. Examples of methods for reducing free metals or halogens in the composition include methods such as washing with ion-exchanged water, filtration, ultrafiltration, and purification with ion-exchange resin.
本發明的透鏡用組成物不含有對苯二甲酸酯亦為較佳。It is also preferable that the composition for lenses of the present invention does not contain terephthalate.
<收容容器> 作為本發明的透鏡用組成物的收容容器,並無特別限定,能夠使用公知的收容容器。又,作為收容容器,以抑制雜質混入原材料或透鏡用組成物中為目的,使用由6種6層的樹脂構成之多層瓶或將6種樹脂設為7層結構之瓶亦為較佳。作為該種容器,例如可列舉日本特開2015-123351號公報中所記載的容器。<Storage container> The container for the lens composition of the present invention is not particularly limited, and a known container can be used. In addition, as a storage container, for the purpose of preventing impurities from being mixed into the raw material or the lens composition, it is preferable to use a multi-layer bottle composed of 6 kinds of 6-layer resins or a bottle with 6 kinds of resins having a 7-layer structure. Examples of such containers include those described in Japanese Patent Laid-Open No. 2015-123351.
<透鏡用組成物之製造方法> 本發明的透鏡用組成物能夠混合前述成分來進行製造。在製造透鏡用組成物的時,可以將所有成分同時溶解和/或分散於溶劑中來製造透鏡用組成物,亦可以依需要將各成分適當設為2個以上的溶液或分散液,在使用時(塗佈時)混合該等來製造透鏡用組成物。<Manufacturing method of lens composition> The lens composition of the present invention can be produced by mixing the aforementioned components. When manufacturing a composition for a lens, all components can be dissolved and/or dispersed in a solvent at the same time to manufacture the composition for a lens, or each component can be appropriately set to two or more solutions or dispersions as needed. At the time (at the time of coating), these are mixed to produce a lens composition.
又,在製造透鏡用組成物時,可以含有使顏料等粒子分散之製程。在使顏料分散之製程中,作為用於顏料的分散之機械力,可列舉壓縮、壓榨、衝擊、剪斷、氣蝕等。作為該等製程的具體例,可列舉珠磨機、混砂機(sand mill)、輥磨機、球磨機、塗料攪拌器(pain shaker)、微射流機(microfluidizer)、高速葉輪、砂磨機、噴流混合器(flowjet mixer)、高壓濕式微粒化、超音波分散等。又,在混砂機(珠磨機)中之顏料的粉碎中,在藉由使用直徑小的珠子、加大珠子的填充率等來提高了粉碎效率之條件下進行處理為較佳。又,粉碎處理之後,藉由過濾、離心分離等來去除粗粒子為較佳。又,使顏料分散之製程及分散機能夠較佳地使用《分散技術大全,JOHOKIKO CO.,LTD.發行,2005年7月15日》或《以懸浮液(固/液分散系統)為中心之分散技術與工業應用的實際 綜合資料集、經營開發中心出版部發行,1978年10月10日》、日本特開2015-157893號公報的0022段中所記載的製程及分散機。又,在使顏料分散之製程中,可以藉由鹽磨(salt milling)步驟進行粒子的微細化處理。鹽磨步驟中所使用之素材、機器、處理條件等例如能夠參閱日本特開2015-194521號公報、日本特開2012-046629號公報的記載。In addition, when manufacturing a composition for a lens, a process of dispersing particles such as pigments may be included. In the process of dispersing the pigment, examples of the mechanical force for dispersing the pigment include compression, pressing, impact, shearing, and cavitation. Specific examples of such processes include bead mills, sand mills, roller mills, ball mills, paint shakers, microfluidizers, high-speed impellers, and sand mills. Flow jet mixer, high-pressure wet micronization, ultrasonic dispersion, etc. In addition, in the pulverization of the pigment in the sand mixer (bead mill), it is preferable to perform the treatment under the condition that the pulverization efficiency is improved by using beads having a small diameter and increasing the filling rate of the beads. In addition, it is preferable to remove coarse particles by filtration, centrifugal separation, etc. after the pulverization treatment. In addition, the process and the dispersing machine for dispersing the pigment can use "Dispersion Technology Encyclopedia, issued by JOHOKIKO CO., LTD., July 15, 2005" or "Suspension (solid/liquid dispersion system) as the center Practical comprehensive data set of decentralized technology and industrial applications, issued by the Publishing Department of the Management Development Center, October 10, 1978, and the process and decentralized machine described in paragraph 0022 of Japanese Patent Laid-Open No. 2015-157893. In addition, in the process of dispersing the pigment, the particles can be refined by a salt milling step. For materials, equipment, processing conditions, etc. used in the salt milling step, for example, the descriptions in Japanese Patent Laid-Open Nos. 2015-194521 and 2012-046629 can be referred to.
當製造透鏡用組成物時,以去除異物或減少缺陷等為目的,利用過濾器過濾透鏡用組成物為較佳。作為過濾器,只要為一直用於過濾用途等之過濾器,則能夠無特別限定地使用。例如可列舉使用了聚四氟乙烯(PTFE)等氟樹脂、尼龍(例如尼龍-6、尼龍-6,6)等聚醯胺樹脂、聚乙烯、聚丙烯(PP)等聚烯樹脂(包含高密度、超高分子量的聚烯樹脂)等素材之過濾器。該等素材中聚丙烯(包含高密度聚丙烯)及尼龍為較佳。When manufacturing a composition for a lens, it is preferable to filter the composition for a lens with a filter for the purpose of removing foreign substances or reducing defects. The filter can be used without particular limitation as long as it is a filter that has always been used for filtering purposes. For example, fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6, nylon-6,6), polyolefin resins such as polyethylene and polypropylene (PP) Filters of materials such as density and ultra-high molecular weight polyene resin). Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.
過濾器的孔徑為0.01~7.0μm為較佳,0.01~3.0μm為更佳,0.05~0.5μm為進一步較佳。過濾器的孔徑只要在上述範圍內,則能夠更確實地去除微細的異物。關於過濾器的孔徑值,能夠參閱過濾器製造商的標稱值。過濾器能夠使用由NIHON PALL LTD.(DFA4201NIEY等)、Advantec Toyo Kaisha, Ltd.、Nihon Entegris K.K.(formerly Nippon micro squirrel Co., Ltd.)及KITZMICROFILTER CORPORATION等所提供之各種過濾器。The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and even more preferably 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be more reliably removed. For the pore size value of the filter, refer to the nominal value of the filter manufacturer. As the filter, various filters provided by NIHON PALL LTD. (DFA4201NIEY, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (formerly Nippon micro squirrel Co., Ltd.) and KITZMICROFILTER CORPORATION can be used.
又,作為過濾器使用纖維狀過濾材料亦為較佳。作為纖維狀過濾材料,例如可列舉聚丙烯纖維、尼龍纖維、玻璃纖維等。作為市售品,可列舉ROKI TECHNO CO.,LTD.製的SBP型系列(SBP008等)、TPR型系列(TPR002、TPR005等)、SHPX型系列(SHPX003等)。In addition, it is also preferable to use a fibrous filter material as a filter. Examples of the fibrous filter material include polypropylene fibers, nylon fibers, and glass fibers. Examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.
使用過濾器時,亦可以組合不同之過濾器(例如,第1過濾器和第2過濾器等)。此時,由各過濾器進行的過濾可以僅為1次,亦可以進行2次以上。又,可以在上述範圍內組合不同之孔徑的過濾器。又,由第1過濾器進行的過濾僅對分散液進行,混合其他成分之後亦可以由第2過濾器進行過濾。When using filters, you can also combine different filters (for example, the first filter and the second filter, etc.). At this time, the filtering by each filter may be performed only once, or may be performed twice or more. Furthermore, filters with different pore sizes can be combined within the above range. In addition, the filtration by the first filter is performed only on the dispersion liquid, and after the other components are mixed, the filtration can also be performed by the second filter.
<透鏡> 本發明的透鏡為由上述本發明的透鏡用組成物獲得之透鏡。本發明的透鏡在波長400~700nm下之吸光度的最大值為0.05以下為較佳,0.04以下為更佳,0.03以下為進一步較佳。又,本發明的透鏡在波長400~700nm的光的透射率為90%以上為較佳,91.5%以上為更佳,93%以上為進一步較佳。又,本發明的透鏡在波長550nm的光的折射率為1.5以上為較佳,1.52以上為更佳,1.54以上為進一步較佳。上限為2.0以下為較佳,1.85以下為更佳。<Lens> The lens of the present invention is a lens obtained from the above-mentioned lens composition of the present invention. The maximum absorbance of the lens of the present invention at a wavelength of 400 to 700 nm is preferably 0.05 or less, more preferably 0.04 or less, and even more preferably 0.03 or less. In addition, the lens of the present invention preferably has a light transmittance of 90% or more at a wavelength of 400 to 700 nm, more preferably 91.5% or more, and further preferably 93% or more. In addition, the lens of the present invention preferably has a refractive index of 1.5 or more for light having a wavelength of 550 nm, more preferably 1.52 or more, and further preferably 1.54 or more. The upper limit is preferably 2.0 or less, and more preferably 1.85 or less.
作為透鏡形狀,能夠採用藉由光學系設計所導出之各種形狀、例如可列舉凸形狀、凹形狀等。例如藉由設為凹形狀(凹型透鏡),容易提高光的聚光性。As the lens shape, various shapes derived from the design of the optical system can be adopted, and for example, a convex shape, a concave shape, etc. may be mentioned. For example, by setting it to a concave shape (concave lens), it is easy to improve the light condensing property.
透鏡的曲率半徑在發揮所期望的效果之範圍內為較佳,並無特別限定。The radius of curvature of the lens is preferably within a range that exhibits the desired effect, and is not particularly limited.
透鏡的厚度為0.5~3.0μm為較佳。上限為2.5μm以下為較佳,2.0μm以下為更佳。下限為0.7μm以上為較佳,0.9μm以上為更佳。在此,透鏡的厚度是指,透鏡的最厚部分的厚度。例如雙面凸透鏡的情況下,是指從一側凸面的頂點至另一側凸面的頂點的距離。The thickness of the lens is preferably 0.5 to 3.0 μm. The upper limit is preferably 2.5 μm or less, and more preferably 2.0 μm or less. The lower limit is preferably 0.7 μm or more, and more preferably 0.9 μm or more. Here, the thickness of the lens refers to the thickness of the thickest part of the lens. For example, in the case of a lenticular lens, it means the distance from the vertex of one convex surface to the vertex of the other convex surface.
本發明的透鏡在具有濾色器之顯示裝置的、透射濾色器之光的光徑上設置而使用。本發明的透鏡可以設置於向濾色器入射之入射光側,亦可以設置於從濾色器射出之射出光側。設置於向濾色器入射之入射光側之情況下,能夠使在濾色器上聚光之光量增加。又,設置於從濾色器射出之射出光側之情況下,能夠使在顯示器上聚光之光量增加。又,本發明的透鏡可以直接與濾色器接觸,亦可以在本發明的透鏡與濾色器之間設置密接層或平坦化層等其他層。又,本發明的透鏡亦能夠以國際公開第2018/135189號中所記載的態樣來配置並使用。The lens of the present invention is provided on a display device having a color filter and used for transmitting the light path of the color filter. The lens of the present invention may be disposed on the side of incident light incident on the color filter, or may be disposed on the side of incident light emitted from the color filter. When provided on the side of the incident light incident on the color filter, the amount of light condensed on the color filter can be increased. In addition, when it is provided on the light emitting side emitted from the color filter, the amount of light condensed on the display can be increased. In addition, the lens of the present invention may directly contact the color filter, or another layer such as an adhesion layer or a planarization layer may be provided between the lens of the present invention and the color filter. In addition, the lens of the present invention can also be arranged and used as described in International Publication No. 2018/135189.
作為使用本發明的透鏡之顯示裝置,可列舉有機電致發光顯示裝置及液晶顯示裝置等,有機電致發光顯示裝置為較佳。Examples of the display device using the lens of the present invention include organic electroluminescence display devices and liquid crystal display devices. Organic electroluminescence display devices are preferred.
<透鏡之製造方法> 接著,對本發明的透鏡之製造方法進行說明。本發明的透鏡之製造方法包括在支撐體上塗佈上述本發明的透鏡用組成物來形成組成物層之步驟,將組成物層加工成透鏡形狀之步驟。<Manufacturing method of lens> Next, the method of manufacturing the lens of the present invention will be described. The method for manufacturing a lens of the present invention includes the steps of coating the above-mentioned lens composition of the present invention on a support to form a composition layer, and processing the composition layer into a lens shape.
在本發明的透鏡之製造方法中,遍及所有步驟在150℃以下的溫度下進行為較佳,在120℃以下的溫度下進行為更佳,在100℃以下的溫度下進行為進一步較佳。藉由以該種方式製造透鏡,藉此抑制膜的加熱收縮而容易形成起皺或空隙少之透鏡。進而,能夠減少熱對支撐體的損傷。尤其,關於有機電致發光元件等有機發光層,存在耐熱性低之傾向,在150℃以下(較佳為120℃以下)的低溫下進行硬化處理,藉此能夠減少熱對有機發光層的損傷。In the method of manufacturing a lens of the present invention, it is preferable to perform at all the steps at a temperature of 150° C. or lower, more preferably at a temperature of 120° C. or lower, and further preferably at a temperature of 100° C. or lower. By manufacturing the lens in this way, it is possible to suppress heating shrinkage of the film and easily form a lens with less wrinkles or less voids. Furthermore, it is possible to reduce the damage to the support by heat. In particular, organic light-emitting layers such as organic electroluminescent elements tend to have low heat resistance, and hardening treatment is performed at a low temperature of 150° C. or lower (preferably 120° C. or lower), thereby reducing heat damage to the organic light-emitting layer .
(形成組成物層之步驟) 接著,對各步驟進行說明。在形成組成物層之步驟中,使用本發明的透鏡用組成物在支撐體上形成組成物層。作為支撐體,可列舉玻璃基板、聚碳酸酯基板、聚酯基板、芳香族聚醯胺基板、聚醯胺醯亞胺基板及聚醯亞胺基板等。在該等基板上可以形成有機發光層。又,在有機發光層上可以進一步形成濾色器。又,基板或濾色器中,為了改良與上部層的密接性、防止物質的擴散或者表面的平坦化可以設置有底塗層。(Steps to form the composition layer) Next, each step will be described. In the step of forming a composition layer, the composition for a lens of the present invention is used to form a composition layer on a support. Examples of the support include glass substrates, polycarbonate substrates, polyester substrates, aromatic polyamide substrates, polyamidoimide substrates, and polyimide substrates. An organic light emitting layer can be formed on these substrates. In addition, a color filter may be further formed on the organic light-emitting layer. In addition, the substrate or the color filter may be provided with an undercoat layer in order to improve the adhesion with the upper layer, prevent the diffusion of substances, or flatten the surface.
作為透鏡用組成物的塗佈方法,能夠使用公知的方法。例如,可列舉滴加法(滴鑄:drop cast);狹縫塗佈法;噴塗法;輥塗法;旋轉塗佈法(旋塗法);流延塗佈法;狹縫旋塗法;預濕法(例如,日本特開2009-145395號公報中所記載之方法);噴墨(例如按需方式、壓電方式、熱方式)、噴嘴噴射等吐出系印刷、柔版印刷、網版印刷、凹版印刷、逆轉偏移印刷、金屬遮罩印刷法等各種印刷法;使用了模具等之轉印法;奈米壓印法等。作為利用噴墨的應用方法,並無特別限定,例如可列舉“擴展・可使用之噴墨-專利上可見的無限的可能性-,2005年2月發行,S.B.RESEARCH CO., LTD.”中所示之方法(尤其115頁~133頁)或、日本特開2003-262716號公報、日本特開2003-185831號公報、日本特開2003-261827號公報、日本特開2012-126830號公報、日本特開2006-169325號公報等中所記載的方法。又,關於硬化性組成物的塗佈方法,能夠參閱國際公開第2017/030174號、國際公開第2017/018419號的記載,將該等內容編入本說明書中。As a coating method of the lens composition, a known method can be used. For example, drop method (drop cast); slit coating method; spray coating method; roll coating method; spin coating method (spin coating method); cast coating method; slit spin coating method; pre Wet method (for example, the method described in Japanese Patent Laid-Open No. 2009-145395); inkjet (for example, on-demand method, piezoelectric method, thermal method), nozzle jetting, etc. discharge system printing, flexographic printing, screen printing , Gravure printing, reverse offset printing, metal mask printing and other printing methods; transfer method using molds, etc.; nano imprint method. The application method using inkjet is not particularly limited, and for example, "Extended・Usable inkjet-Infinite possibilities visible in patents -, issued February 2005, SBRESEARCH CO., LTD." The method shown (especially 115 pages to 133 pages) or, JP 2003-262716, JP 2003-185831, JP 2003-261827, JP 2012-126830, The method described in Japanese Unexamined Patent Publication No. 2006-169325. In addition, regarding the application method of the curable composition, the descriptions in International Publication No. 2017/030174 and International Publication No. 2017/018419 can be referred to, and these contents are incorporated in this specification.
在支撐體上所形成之組成物層亦可以進行乾燥(預烘烤)。進行預烘烤之情況下,預烘烤溫度為100℃以下為較佳,90℃以下為更佳,80℃以下為進一步較佳,70℃以下為特佳。下限例如能夠設為40℃以上。預烘烤時間為10~3600秒鐘為較佳。預烘烤能夠利用加熱板、烘箱等進行。The composition layer formed on the support can also be dried (pre-baked). In the case of pre-baking, the pre-baking temperature is preferably 100°C or lower, more preferably 90°C or lower, further preferably 80°C or lower, and particularly preferably 70°C or lower. The lower limit can be set to 40° C. or higher, for example. The pre-baking time is preferably 10 to 3600 seconds. The pre-baking can be performed using a hot plate, an oven, or the like.
(加工成透鏡形狀之步驟) 作為將組成物層加工成透鏡形狀之方法,能夠使用以往公知的加工方法。例如,能夠使用轉印法、壓印法及熱下陷法(heat sagging)等進行製造。其中,從容易進行透鏡形狀的控制等理由考慮,轉印法為較佳。(Steps of processing into lens shape) As a method of processing the composition layer into a lens shape, a conventionally known processing method can be used. For example, it can be manufactured using a transfer method, an imprint method, a heat sagging method, or the like. Among them, the transfer method is preferable from the viewpoint of easy control of the lens shape and the like.
在轉印法中,能夠對在支撐體上所形成之組成物層進行硬化處理來形成硬化物層,在該硬化物層上形成光阻層,將該光阻層圖案形成為透鏡形狀,並將該圖案形成之光阻層作為遮罩對硬化物層進行乾式蝕刻,從而將透鏡形狀轉印於硬化物層上來進行製造。又,關於使用了轉印法之透鏡之製造方法,亦能夠使用日本特開2006-073605號公報、日本特開2006-190903號公報、日本特開2008-281414號公報、日本特開2014-029524號公報等中所記載之方法,將該等內容編入本說明書中。In the transfer method, the composition layer formed on the support can be hardened to form a hardened material layer, a photoresist layer is formed on the hardened material layer, and the photoresist layer pattern is formed into a lens shape, and The patterned photoresist layer is used as a mask to dry-etch the hardened material layer, and the lens shape is transferred onto the hardened material layer for manufacturing. In addition, as for the manufacturing method of the lens using the transfer method, Japanese Patent Application Publication No. 2006-073605, Japanese Patent Application Publication No. 2006-190903, Japanese Patent Application Publication No. 2008-281414, Japanese Patent Application Publication No. 2014-029524 can also be used. The methods described in the Japanese Patent Gazette, etc. are incorporated into this specification.
在壓印法中,能夠在支撐體上形成之組成物層上按壓具有圖案之模具而以模具和支撐體來夾持組成物層,在以模具和支撐體來夾持組成物層之狀態下曝光組成物層並使其硬化之後,將模具從支撐體進行剝離來進行製造。In the imprint method, it is possible to press a mold having a pattern on a composition layer formed on a support body to sandwich the composition layer between the mold and the support body, in a state where the composition layer is sandwiched between the mold and the support body After exposing and hardening the composition layer, the mold is peeled off from the support to manufacture.
在熱下陷法中,對在支撐體上形成之組成物層進行硬化處理來形成硬化物層,對該硬化物層進行加熱來使硬化物層的表面熱下陷,藉此能夠將硬化物層加工成透鏡形狀。In the heat sinking method, the composition layer formed on the support is hardened to form a hardened material layer, and the hardened material layer is heated to thermally sink the surface of the hardened material layer, whereby the hardened material layer can be processed Into a lens shape.
在加工成透鏡形狀之步驟中,包括曝光組成物層之步驟為較佳。藉此,能夠硬化曝光部分的組成物層。曝光用作組成物層的硬化處理。關於曝光,對組成物層照射放射線來進行為較佳。作為放射線,可列舉g線、i線等。又,亦能夠使用波長300nm以下的光(較佳為波長180~300nm的光)。作為波長300nm以下的光,可列舉KrF線(波長248nm)、ArF線(波長193nm)等,KrF線(波長248nm)為較佳。又,亦能夠利用300nm以上的長波光源。In the step of processing into a lens shape, the step of exposing the composition layer is preferable. This makes it possible to harden the composition layer of the exposed portion. Exposure is used as a hardening treatment of the composition layer. Regarding the exposure, the composition layer is preferably irradiated with radiation. Examples of radiation include g-rays and i-rays. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF line (wavelength 248 nm), ArF line (wavelength 193 nm), etc. KrF line (wavelength 248 nm) is preferred. In addition, a long-wavelength light source of 300 nm or more can also be used.
又,曝光時,可以連續照射光來進行曝光,亦可以以脈衝的方式照射來進行曝光(脈衝曝光)。再者,脈衝曝光是指,以短時間(例如,毫秒級別以下)的循環反覆進行光的照射和停止來曝光之方式的曝光方法。脈衝曝光的情況下,脈衝寬度為100奈米秒(ns)以下為較佳,50奈米秒以下為更佳,30奈米秒以下為進一步較佳。脈衝寬度的下限並無特別限定,能夠設為1飛秒(fs)以上,亦能夠設為10飛秒以上。頻率為1kHz以上為較佳,2kHz以上為更佳,4kHz以上為進一步較佳。頻率的上限為50kHz以下為較佳,20kHz以下為更佳,10kHz以下為進一步較佳。最大瞬時照度為50000000W/m2 以上為較佳,100000000W/m2 以上為更佳,200000000W/m2 以上為進一步較佳。又,最大瞬時照度的上限為1000000000W/m2 以下為較佳,800000000W/m2 以下為更佳,500000000W/m2 以下為進一步較佳。再者,脈衝寬度是指,脈衝週期中之光所照射之時間。又,頻率是指,每秒鐘脈衝週期的次數。又,最大瞬時照度是指,在脈衝週期中之光所照射之時間內的平均照度。又,脈衝週期是指,將脈衝曝光中之光的照射和停止設為1次循環之週期。In addition, during exposure, light may be continuously irradiated for exposure, or may be irradiated in a pulse manner for exposure (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is irradiated repeatedly and stopped to stop exposure in a short time (for example, below a millisecond level). In the case of pulse exposure, the pulse width is preferably 100 nanoseconds (ns) or less, more preferably 50 nanoseconds or less, and further preferably 30 nanoseconds or less. The lower limit of the pulse width is not particularly limited, and can be set to 1 femtosecond (fs) or more, and can also be set to 10 femtoseconds or more. The frequency is preferably 1 kHz or more, more preferably 2 kHz or more, and further preferably 4 kHz or more. The upper limit of the frequency is preferably 50 kHz or less, more preferably 20 kHz or less, and further preferably 10 kHz or less. The maximum instantaneous illuminance is preferably 50000000W/m 2 or more, more preferably 100000000W/m 2 or more, and further preferably 200000000W/m 2 or more. Furthermore, the upper limit of the maximum instantaneous illuminance is preferably 1000000000W/m 2 or less, more preferably 800000000W/m 2 or less, and further preferably 500000000W/m 2 or less. Furthermore, the pulse width refers to the time that the light in the pulse period is irradiated. Also, frequency refers to the number of pulse cycles per second. Also, the maximum instantaneous illuminance refers to the average illuminance during the time irradiated by the light in the pulse period. In addition, the pulse period means a period in which one cycle of irradiation and stop of light in pulse exposure is made.
照射量(曝光量)例如為0.03~2.5J/cm2 為較佳,0.05~1.0J/cm2 為更佳。關於曝光時之氧濃度,能夠適當進行選擇,除了在大氣下進行以外,例如可以在氧濃度為19體積%以下的低氧環境下(例如15體積%、5體積%或實質上無氧)進行曝光,亦可以在氧濃度大於21體積%之高氧環境下(例如22體積%、30體積%或50體積%)進行曝光。又,曝光照度能夠適當進行設定,通常能夠從1000W/m2 ~100000W/m2 (例如,5000W/m2 、15000W/m2 、35000W/m2 )的範圍進行選擇。氧濃度和曝光照度可以適當組合條件,例如能夠設為氧濃度10體積%且照度10000W/m2 、氧濃度35體積%且照度20000W/m2 等。The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm 2, and more preferably 0.05 to 1.0 J/cm 2 . The oxygen concentration at the time of exposure can be appropriately selected. In addition to being performed in the atmosphere, for example, it can be performed in a low-oxygen environment with an oxygen concentration of 19% by volume or less (eg, 15% by volume, 5% by volume, or substantially oxygen-free) Exposure can also be performed in a high oxygen environment with an oxygen concentration greater than 21% by volume (eg 22% by volume, 30% by volume or 50% by volume). In addition, the exposure illuminance can be appropriately set, and can usually be selected from the range of 1000 W/m 2 to 100,000 W/m 2 (for example, 5000 W/m 2 , 15000 W/m 2 , and 35000 W/m 2 ). The oxygen concentration and the exposure illuminance can be appropriately combined. For example, the oxygen concentration can be 10% by volume and the illuminance is 10,000 W/m 2 , the oxygen concentration is 35% by volume and the illuminance is 20,000 W/m 2, or the like.
組成物層的曝光處理中可以將組成物層曝光成圖案狀。例如,藉由利用步進曝光機或掃描曝光機等,並經由具有既定的遮罩圖案之遮罩對組成物層進行曝光,能夠曝光成圖案狀。藉此,能夠選擇性地硬化曝光部分的組成物層。而且,藉由顯影去除組成物層的未曝光部分,能夠形成圖案。關於顯影去除組成物層的未曝光部分,能夠使用顯影液來進行。顯影液的溫度例如為20~30℃為較佳。顯影時間為20~180秒鐘為較佳。又,為了提高殘渣去除性,可以反覆進行數次如下步驟,亦即每隔60秒鐘甩掉顯影液並進一步重新供給顯影液。顯影液可列舉有機溶劑、鹼顯影液等。作為鹼顯影液,以純水稀釋鹼劑而得之鹼性水溶液為較佳。作為鹼劑,例如可列舉氨、乙胺、二乙胺、二甲基乙醇胺、二甘醇胺、二乙醇胺、羥基胺、乙二胺、四甲基氫氧化銨、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、乙基三甲基氫氧化銨、苄基三甲基氫氧化銨、二甲基雙(2-羥基乙基)氫氧化銨、膽鹼、吡咯、哌啶、1,8-二氮雜雙環[5.4.0]-7-十一碳烯等有機鹼性化合物或氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、矽酸鈉、偏矽酸鈉等無機鹼性化合物。關於鹼劑,分子量大的化合物在環境方面及安全方面較佳。鹼性水溶液的鹼劑的濃度為0.001~10質量%為較佳,0.01~1質量%為更佳。又,顯影液可進一步包含界面活性劑。作為界面活性劑,可列舉上述界面活性劑,非離子系界面活性劑為較佳。從方便運輸和保管等觀點考慮,顯影液亦可以暫且製成為濃縮液,使用時稀釋成所需的濃度。對於稀釋倍率並無特別限定,例如能夠設定在1.5~100倍的範圍。又,顯影之後利用純水進行清洗(沖洗)亦為較佳。又,關於沖洗,使形成有顯影之後的組成物層之支撐體旋轉,並且向顯影之後的組成物層供給沖洗液來進行為較佳。又,藉由使吐出沖洗液之噴嘴從支撐體的中心部向支撐體的周緣部移動來進行亦為較佳。此時,當從噴嘴的支撐體中心部向周緣部移動時,可以一邊使噴嘴的移動速度逐漸降低一邊使其移動。藉由以該種方式進行沖洗,能夠抑制沖洗的面內偏差。又,使噴嘴從支撐體中心部向周緣部移動,並且使支撐體的轉速逐漸降低亦可以獲得相同的效果。In the exposure process of the composition layer, the composition layer may be exposed in a pattern. For example, by using a step exposure machine, a scanning exposure machine, or the like, and exposing the composition layer through a mask having a predetermined mask pattern, it can be exposed in a pattern. With this, the composition layer of the exposed portion can be selectively hardened. Furthermore, by developing and removing unexposed portions of the composition layer, a pattern can be formed. Regarding development, the unexposed portion of the composition layer can be removed using a developer. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal property, the following steps may be repeated several times, that is, the developer solution is shaken every 60 seconds and the developer solution is further supplied again. Examples of the developing solution include organic solvents and alkaline developing solutions. As the alkaline developing solution, an alkaline aqueous solution obtained by diluting the alkaline agent with pure water is preferred. Examples of the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethylene glycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, and tetraethylammonium hydroxide. Tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, Organic basic compounds such as pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene, or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, Inorganic basic compounds such as sodium metasilicate. Regarding the alkali agent, a compound with a large molecular weight is preferable in terms of environment and safety. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. In addition, the developer may further contain a surfactant. Examples of the surfactant include the above-mentioned surfactants, and nonionic surfactants are preferred. From the viewpoint of convenience in transportation and storage, the developer can also be temporarily made into a concentrated solution and diluted to a desired concentration when used. The dilution ratio is not particularly limited, and it can be set in the range of 1.5 to 100 times, for example. Moreover, it is also preferable to wash (rinse) with pure water after development. In addition, regarding the rinsing, it is preferable to rotate the support body on which the composition layer after development is formed, and supply the rinsing liquid to the composition layer after development. Furthermore, it is also preferable to move the nozzle that discharges the rinse liquid from the center of the support to the peripheral edge of the support. At this time, when moving from the center portion of the support body of the nozzle to the peripheral portion, it is possible to move the nozzle while gradually reducing the moving speed of the nozzle. By performing rinsing in this way, the in-plane deviation of rinsing can be suppressed. In addition, the same effect can be obtained by moving the nozzle from the center portion of the support body to the peripheral edge portion and gradually reducing the rotation speed of the support body.
可以在曝光後(進行了顯影之情況下,顯影之後實施了乾燥之後)進行加熱處理(後烘烤)。加熱溫度為100~150℃為較佳,100~120℃為更佳。加熱時間為1分鐘以上為較佳,5分鐘以上為更佳,10分鐘以上為進一步較佳。上限並無特別限定,從生產性的觀點考慮,300分鐘以下為較佳。後烘烤在非活性氣體的環境下進行亦為較佳。依該態樣,能夠不受氧影響而以非常高之效率進行熱聚合,即使在遍及所有步驟在150℃以下(較佳為120℃以下)的溫度下製造了透鏡之情況下,亦能夠製造耐溶劑性等特性優異之透鏡。作為非活性氣體,可列舉氮氣、氬氣及氦氣等,氮氣為較佳。後烘烤時的氧濃度為100ppm以下為較佳。The heat treatment (post-baking) may be carried out after exposure (in the case of development, after development and drying). The heating temperature is preferably 100 to 150°C, and more preferably 100 to 120°C. The heating time is preferably 1 minute or more, more preferably 5 minutes or more, and further preferably 10 minutes or more. The upper limit is not particularly limited, but from the viewpoint of productivity, 300 minutes or less is preferable. It is also preferable to perform post-baking in an inert gas environment. According to this aspect, it is possible to perform thermal polymerization at a very high efficiency without being affected by oxygen, even when the lens is manufactured at a temperature of 150° C. or less (preferably 120° C. or less) throughout all steps. A lens with excellent characteristics such as solvent resistance. Examples of the inert gas include nitrogen, argon, and helium, and nitrogen is preferred. The oxygen concentration during post-baking is preferably 100 ppm or less.
本發明中,加工成透鏡形狀之步驟包括對組成物層以1J/cm2 以上的曝光量照射波長超過350nm且380nm以下的光之步驟亦為較佳。藉由以該種方式進行曝光,能夠使組成物層充分硬化,即使在遍及所有步驟在150℃以下的溫度下製造了透鏡之情況下,亦能夠製造耐溶劑性等特性優異之透鏡。In the present invention, the step of processing into a lens shape includes the step of irradiating the composition layer with light having a wavelength of more than 350 nm and less than 380 nm at an exposure amount of 1 J/cm 2 or more. By performing exposure in this way, the composition layer can be sufficiently hardened, and even if the lens is manufactured at a temperature of 150° C. or less throughout all steps, a lens with excellent characteristics such as solvent resistance can be manufactured.
本發明中,加工成透鏡形狀之步驟包括對組成物層照射波長超過350nm且380nm以下的光來進行曝光(以下,亦稱為曝光1)之後,進一步照射波長254~350nm的光來進行曝光(以下,亦稱為曝光2)之步驟亦為較佳。藉由該態樣,亦能夠使組成物層充分硬化,即使在遍及所有步驟在150℃以下的溫度下製造了透鏡之情況下,亦能夠製造耐溶劑性等特性優異之透鏡。In the present invention, the step of processing into a lens shape includes irradiating the composition layer with light having a wavelength exceeding 350 nm and 380 nm or less (hereinafter, also referred to as exposure 1), and further irradiating light with a wavelength of 254 to 350 nm to perform exposure ( Hereinafter, the step also referred to as exposure 2) is also preferred. With this aspect, the composition layer can be sufficiently hardened, and even when the lens is manufactured at a temperature of 150° C. or less throughout all steps, a lens with excellent characteristics such as solvent resistance can be manufactured.
形成圖案時,對組成物層照射波長超過350nm且380nm以下的光來曝光成圖案狀(曝光1),對曝光1之後的組成物層進行顯影,並對顯影之後的組成物層照射波長254~350nm的光來進行曝光(曝光2)為較佳。藉由以顯影之前及顯影之後這兩個階段曝光組成物層,能夠利用第一次曝光(顯影之前的曝光)使組成物適當硬化,能夠利用下一次曝光(顯影之後的曝光)使組成物整體幾乎完全硬化。作為結果,在低溫條件下亦能夠充分硬化組成物,並能夠形成耐溶劑性、密接性及矩形性優異之圖案。When forming a pattern, the composition layer is irradiated with light having a wavelength exceeding 350 nm and 380 nm or less to be exposed in a pattern (exposure 1), the composition layer after exposure 1 is developed, and the composition layer after development is irradiated with a wavelength of 254 to Exposure with 350 nm light (exposure 2) is preferred. By exposing the composition layer in two stages before development and after development, the composition can be properly hardened by the first exposure (exposure before development), and the whole composition can be utilized by the next exposure (exposure after development) Almost completely hardened. As a result, the composition can be sufficiently cured under low-temperature conditions, and a pattern excellent in solvent resistance, adhesion, and rectangularity can be formed.
曝光1中所使用之光為波長超過350nm且380nm以下的光,波長355~370nm的光為較佳,i線為更佳。作為照射量(曝光量),例如為30~1500mJ/cm2 為較佳,50~1000mJ/cm2 為更佳。關於曝光時之氧濃度,能夠適當選擇。The light used in exposure 1 is light with a wavelength exceeding 350 nm and less than 380 nm, light with a wavelength of 355 to 370 nm is preferred, and i-line is more preferred. The irradiation amount (exposure amount) is, for example, preferably 30 to 1500 mJ/cm 2 , and more preferably 50 to 1000 mJ/cm 2 . The oxygen concentration at the time of exposure can be appropriately selected.
曝光2中所使用之光為波長254~350nm的光,波長254nm的光為更佳。曝光2例如能夠利用紫外線光阻劑硬化裝置來進行。從紫外線光阻劑硬化裝置例如亦可以照射波長254~350nm的光和除此以外的光(例如i射線)。曝光1中所使用之光的波長與曝光2中所使用之光的波長之差為200nm以下為較佳,100~150nm為更佳。曝光2中的照射量(曝光量)為30~4000mJ/cm2 為較佳,50~3500mJ/cm2 為更佳。關於曝光時之氧濃度,能夠適當選擇。The light used in exposure 2 is light with a wavelength of 254 to 350 nm, and light with a wavelength of 254 nm is more preferable. The exposure 2 can be performed using, for example, an ultraviolet photoresist curing device. For example, the ultraviolet photoresist curing device may irradiate light with a wavelength of 254 to 350 nm and other light (for example, i-rays). The difference between the wavelength of light used in exposure 1 and the wavelength of light used in exposure 2 is preferably 200 nm or less, and more preferably 100 to 150 nm. The exposure amount (exposure amount) in exposure 2 is preferably 30 to 4000 mJ/cm 2 , and more preferably 50 to 3500 mJ/cm 2 . The oxygen concentration at the time of exposure can be appropriately selected.
<顯示裝置> 本發明的顯示裝置具有上述本發明的透鏡和濾色器。而且,本發明的顯示裝置中,透鏡在透射濾色器之光的光徑上設置。濾色器可列舉具有1個顏色以上的紅色像素、藍色像素、綠色像素、青色像素、品紅色像素及黃色像素等著色像素之濾波器。作為濾色器的具體例,可列舉至少具有紅色像素、藍色像素及綠色像素之濾波器或至少具有青色像素、品紅色像素及黃色像素之濾波器等。濾色器能夠使用包含彩色著色劑之著色組成物來進行製造。 關於本發明的顯示裝置,顯示裝置所包含之濾色器具有複數個顏色的像素,在該等像素的至少一部分的像素的光徑上形成本發明的透鏡為較佳。 濾色器亦可以具有在藉由隔壁分隔成例如格子狀之空間中填入有各著色像素之結構。此時的隔壁為相對於各著色像素為低折射率為較佳。又,亦可以以US2018/0040656號公報中所記載的構成形成隔壁。 作為顯示裝置,可列舉液晶顯示裝置或有機電致發光顯示裝置等。關於顯示裝置的定義和各圖像顯示裝置的詳細內容,例如記載於“電子顯示器設備(佐佐木昭夫著、Kogyo Chosakai Publishing Co.,Ltd. 1990年發行)”、“顯示器設備(伊吹順章著、Sangyo-Tosho Publishing Co. Ltd.、1989年發行)”等中。又,關於液晶顯示裝置,例如記載於“下一代液晶顯示器技術(內田龍男編輯、Kogyo Chosakai Publishing Co.,Ltd.、1994年發行)”中。對能夠應用本發明之液晶顯示裝置無特別限制,例如能夠應用於上述“新一代液晶顯示器技術”中所記載之各種方式的液晶顯示裝置。<Display device> The display device of the present invention includes the lens and color filter of the present invention described above. Furthermore, in the display device of the present invention, the lens is provided on the optical path of the light transmitted through the color filter. The color filter may include a filter having one or more colored pixels such as red pixels, blue pixels, green pixels, cyan pixels, magenta pixels, and yellow pixels. Specific examples of the color filter include a filter having at least red pixels, blue pixels, and green pixels, or a filter having at least cyan pixels, magenta pixels, and yellow pixels. The color filter can be manufactured using a coloring composition containing color colorants. Regarding the display device of the present invention, the color filter included in the display device has pixels of a plurality of colors, and it is preferable to form the lens of the present invention on the optical path of at least a part of the pixels of the pixels. The color filter may have a structure in which each colored pixel is filled in a space partitioned by a partition into, for example, a lattice shape. In this case, the partition wall preferably has a low refractive index with respect to each colored pixel. In addition, the partition wall may be formed with the structure described in US2018/0040656. As a display device, a liquid crystal display device, an organic electroluminescence display device, etc. are mentioned. The definition of the display device and the details of each image display device are described in, for example, "Electronic Display Equipment (Showa Sasaki, Kogyo Chosakai Publishing Co., Ltd. issued in 1990)", "Display Equipment (Ibuki Shunzhang, Sangyo-Tosho Publishing Co. Ltd., issued in 1989)", etc. In addition, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (Editor Uchida Ryuo, Kogyo Chosakai Publishing Co., Ltd., issued in 1994)." The liquid crystal display device to which the present invention can be applied is not particularly limited, and for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "new generation liquid crystal display technology".
有機電致發光顯示裝置亦可以為具有由白色有機電致發光元件構成之光源者。作為白色有機電致發光元件,串聯結構為較佳。關於有機電致發光元件的串聯結構,記載於日本特開2003-045676號公報、三上明義監修、“有機EL技術開發的最前線-高亮度・高精度・長壽命化・技術訣竅集-”、技術資訊協會、326-328頁、2008年等。關於有機EL元件所發出之白色光的光譜,在藍色區域(430nm-485nm)、綠色區域(530nm-580nm)及黃色區域(580nm-620nm)中具有強之極大發光峰者為較佳。除了該等發光峰以外,進一步在紅色區域(650nm-700nm)中具有極大發光峰者為更佳。 [實施例]The organic electroluminescence display device may be a light source composed of white organic electroluminescence elements. As a white organic electroluminescent element, a tandem structure is preferred. The series structure of organic electroluminescent elements is described in Japanese Patent Application Laid-Open No. 2003-045676, oversight by Mikami Akira, "Forefront of organic EL technology development-high brightness, high precision, long life, and technical know-how -" , Technical Information Association, 326-328 pages, 2008, etc. Regarding the spectrum of the white light emitted by the organic EL element, it is better to have a strong maximum emission peak in the blue region (430 nm-485 nm), green region (530 nm-580 nm), and yellow region (580 nm-620 nm). In addition to these luminescence peaks, it is better to further have a very large luminescence peak in the red region (650 nm-700 nm). [Example]
以下舉出實施例來對本發明進行具體說明。關於以下的實施例所示之材料、使用量、比例、處理內容、處理步驟等,只要不脫離本發明的宗旨則能夠適當地進行變更。從而,本發明的範圍並不限定於以下所示之具體例。The present invention will be specifically described below with examples. The materials, usage amounts, ratios, processing contents, processing steps, etc. shown in the following examples can be appropriately changed as long as they do not depart from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below.
<顏料分散液的製備> (顏料分散液T1) 利用Kotobuki Industries Co., Ltd.製Ultra Apex Mill(產品名)作為循環型分散裝置(珠磨機)對下述組成A的混合液如以下那樣進行分散處理來製備了顏料分散液T1。<Preparation of pigment dispersion> (Pigment dispersion T1) Using the Ultra Apex Mill (product name) manufactured by Kotobuki Industries Co., Ltd. as a circulation type dispersing device (bead mill), the mixed liquid of the following composition A was subjected to dispersion treatment as follows to prepare a pigment dispersion liquid T1.
(組成A) ・白色系顏料(利用包含氫氧化鋁(Al(OH)3 )、非晶質二氧化矽(SiO2 )及硬脂酸(C17 H35 COOH)之表面處理劑對二氧化鈦的粒子表面進行了表面處理之粒子(含有75質量%以上的二氧化鈦、含有小於15質量%的氫氧化鋁、含有小於5質量%的非晶質二氧化矽、含有小於10質量%的硬脂酸)、平均一次粒徑40nm)……22.8質量份 ・分散劑(下述結構的樹脂,酸值=50mgKOH/g,重量平均分子量=10,000,附記於主鏈之數值為莫耳比,附記於側鏈之數值為重複單元的數)……6.1質量份 [化學式20] ・丙二醇單甲醚乙酸酯(PGMEA)……71.1質量份(Composition A) ・White pigment (using aluminum hydroxide (Al(OH) 3 ), amorphous silicon dioxide (SiO 2 ) and stearic acid (C 17 H 35 COOH) surface treatment agent for titanium dioxide Particle surface-treated particles (containing 75% by mass or more of titanium dioxide, less than 15% by mass of aluminum hydroxide, less than 5% by mass of amorphous silicon dioxide, and less than 10% by mass of stearic acid) 、Average primary particle size 40nm)……22.8 parts by mass ・dispersant (resin of the following structure, acid value = 50mgKOH/g, weight average molecular weight = 10,000, the value appended to the main chain is mole ratio, appended to the side chain The value is the number of repeating units)...6.1 parts by mass [Chemical formula 20] ・Propylene glycol monomethyl ether acetate (PGMEA)……71.1 parts by mass
分散裝置在以下的條件下進行了操作。 ・珠子直徑:直徑0.05mm ・珠子填充率:75體積% ・圓周速度:8m/sec ・泵供給量:10Kg/hour ・冷卻水:自來水 ・珠磨機環狀通路內容積:0.15L ・分散處理之混合液量:0.44kgThe dispersing device was operated under the following conditions. ・Bead diameter: 0.05mm diameter ・Bead filling rate: 75% by volume ・Circumferential speed: 8m/sec ・Pump supply: 10Kg/hour ・Cooling water: tap water ・Inner volume of circular path of bead mill: 0.15L ・Dispersed mixed liquid volume: 0.44kg
<透鏡用組成物的製備> (實施例1) 將以下所示之原料混合並攪拌之後,利用孔徑0.45μm的尼龍製過濾器(NIHON PALL LTD.製)進行過濾來製備了透鏡用組成物。 ・光聚合起始劑A1(起始劑1)……1.75質量份 ・光聚合起始劑A2(起始劑4)……1.41質量份 ・樹脂(樹脂1的40質量%PGMEA溶液)……39.54質量份 ・聚合性單體M1……28.84質量份 ・聚合抑制劑1(對甲氧基苯酚)……0.008質量份 ・界面活性劑1(下述結構的化合物、Mw=14000、表示重複單元的比例之%的數值為莫耳%)……0.021質量份 [化學式21] ・矽烷偶合劑1(KBM-602、Shin-Etsu Chemical Co., Ltd.製)……0.175質量份 ・PGMEA……28.25質量份<Preparation of Lens Composition> (Example 1) After mixing and stirring the raw materials shown below, a nylon filter (manufactured by NIHON PALL LTD.) with a pore size of 0.45 μm was used for filtration to prepare a lens composition. ・Photopolymerization initiator A1 (Initiator 1)... 1.75 parts by mass ・Photopolymerization initiator A2 (Initiator 4)... 1.41 parts by mass ・Resin (40 mass% PGMEA solution of Resin 1)... 39.54 parts by mass・polymerizable monomer M1……28.84 parts by mass・polymerization inhibitor 1 (p-methoxyphenol)……0.008 parts by mass・surfactant 1 (compound of the following structure, Mw=14000, indicating repeating unit The value of% of the ratio is mole %)...0.021 parts by mass [Chemical formula 21] ・Silane coupling agent 1 (KBM-602, manufactured by Shin-Etsu Chemical Co., Ltd.)……0.175 parts by mass・PGMEA……28.25 parts by mass
(實施例2~15、17~33、比較例1) 除了分別將光聚合起始劑的種類及含量、樹脂的種類、聚合性單體的種類、溶劑的種類、透鏡用組成物的總固體成分變更為如下述表中所記載那樣以外,以與實施例1相同的方式製備了透鏡用組成物。再者,透鏡用組成物的總固體成分藉由改變溶劑的摻合量來進行了調整。(Examples 2-15, 17-33, Comparative Example 1) In addition to changing the type and content of the photopolymerization initiator, the type of resin, the type of polymerizable monomer, the type of solvent, and the total solid content of the lens composition as described in the following table, The lens composition was prepared in the same manner as in Example 1. Furthermore, the total solid content of the lens composition was adjusted by changing the blending amount of the solvent.
(實施例16)
將以下所示之原料混合並攪拌之後,利用孔徑0.45μm的尼龍製過濾器(NIHON PALL LTD.製)進行過濾來製備了透鏡用組成物。
・顏料分散液T1……69.29質量份
・光聚合起始劑A1(起始劑1)……1.75質量份
・光聚合起始劑A2(起始劑4)……1.41質量份
・樹脂(樹脂1的40質量%PGMEA溶液)……9.29質量份
・聚合性單體M1……14.52質量份
・聚合抑制劑1……0.008質量份
・界面活性劑1……0.021質量份
・矽烷偶合劑1……17.5質量份
・PGMEA……3.57質量份
[表1]
上述表的含量一欄中所記載的數值為光聚合起始劑A1或光聚合起始劑A2在透鏡用組成物的總固體成分中之含量(質量%)的值。The numerical value described in the content column of the above table is a value of the content (mass %) of the photopolymerization initiator A1 or the photopolymerization initiator A2 in the total solid content of the lens composition.
(光聚合起始劑) ・起始劑1:IRGACURE-OXE01(BASF公司製,下述結構的化合物,在甲醇中的波長365nm下之吸光係數為6969mL/gcm。利用下述的方法測量之起始劑塗佈膜的吸光度的最大值為0.01。) ・起始劑2:IRGACURE-OXE02(BASF公司製,下述結構的化合物,在甲醇中的波長365nm下之吸光係數為7749mL/gcm。利用下述的方法測量之起始劑塗佈膜的吸光度的最大值為0.01。) ・起始劑3:下述結構的化合物(在甲醇中的波長365nm的光的吸光係數為18900mL/gcm。利用下述的方法測量之起始劑塗佈膜的吸光度的最大值為0.02。) ・起始劑4:IRGACURE-2959(BASF公司製,下述結構的化合物,在甲醇中的波長365nm下之吸光係數為48.93mL/gcm,波長254nm下之吸光係數為3.0×104 mL/gcm。利用下述的方法測量之起始劑塗佈膜的吸光度的最大值為0.005。) ・起始劑5:IRGACURE-184(BASF公司製,下述結構的化合物,在甲醇中的波長365nm下之吸光係數為88.64mL/gcm,波長254nm下之吸光係數為3.3×104 mL/gcm。利用下述的方法測量之起始劑塗佈膜的吸光度的最大值為0.004。) ・起始劑6:下述結構的化合物(在甲醇中的波長365nm的光的吸光係數為13200mL/gcm。利用下述的方法測量之起始劑塗佈膜的吸光度的最大值為0.13。) [化學式22] (Photopolymerization initiator) ・Initiator 1: IRGACURE-OXE01 (manufactured by BASF, the compound of the following structure, the absorption coefficient at a wavelength of 365 nm in methanol is 6969mL/gcm. It is measured by the following method The maximum absorbance of the starting agent coating film is 0.01.) ・Initiator 2: IRGACURE-OXE02 (made by BASF Corporation, the compound of the following structure, the absorption coefficient at a wavelength of 365 nm in methanol is 7749 mL/gcm. The maximum absorbance of the initiator-coated film measured by the following method is 0.01.) ・Initiator 3: The compound of the following structure (absorption coefficient of light with a wavelength of 365 nm in methanol is 18900 mL/gcm. Use The maximum absorbance of the initiator-coated film measured by the following method is 0.02.) ・Initiator 4: IRGACURE-2959 (manufactured by BASF, compound of the following structure, absorbance at a wavelength of 365 nm in methanol The coefficient is 48.93mL/gcm, and the absorption coefficient at a wavelength of 254nm is 3.0×10 4 mL/gcm. The maximum absorbance of the starter coating film measured by the following method is 0.005.) ・Initiator 5: IRGACURE-184 (manufactured by BASF, the compound of the following structure, the absorption coefficient in methanol at a wavelength of 365nm is 88.64mL/gcm, and the absorption coefficient at a wavelength of 254nm is 3.3×10 4 mL/gcm. Use the following method The maximum absorbance of the measured starter coating film is 0.004.) ・Initiator 6: compound of the following structure (absorption coefficient of light with a wavelength of 365 nm in methanol is 13200 mL/gcm. Use the following method The maximum absorbance of the measured starter coating film is 0.13.) [Chemical Formula 22]
(聚合性單體) M1:下述結構的化合物 [化學式23] M2:ARONIX M-309(TOAGOSEI CO., LTD.製、三羥甲基丙烷三丙烯酸酯) M3:ARONIX M-310(TOAGOSEI CO., LTD.製、三羥甲基丙烷聚氧丙烯改質三丙烯酸酯) M4:ARONIX M-350(TOAGOSEI CO., LTD.製、三羥甲基丙烷聚氧乙烯改質三丙烯酸酯) M5:ARONIX M-408(TOAGOSEI CO., LTD.製、二三羥甲基丙烷四丙烯酸酯)(Polymerizable monomer) M1: Compound of the following structure [Chemical Formula 23] M2: ARONIX M-309 (manufactured by TOAGOSEI CO., LTD., trimethylolpropane triacrylate) M3: ARONIX M-310 (manufactured by TOAGOSEI CO., LTD., trimethylolpropane polyoxypropylene modified three Acrylate) M4: ARONIX M-350 (manufactured by TOAGOSEI CO., LTD., trimethylolpropane polyoxyethylene modified triacrylate) M5: ARONIX M-408 (manufactured by TOAGOSEI CO., LTD., ditrihydroxy) Methyl propane tetraacrylate)
(樹脂) 樹脂1:下述結構的樹脂(Mw=11000,酸值=31.5mgKOH/g,附記於主鏈之數值為莫耳比。) [化學式24] (Resin) Resin 1: Resin of the following structure (Mw=11000, acid value=31.5mgKOH/g, the value appended to the main chain is the molar ratio.) [Chemical Formula 24]
樹脂2:利用以下的方法合成之樹脂 向具備溫度計、冷卻管、氮氣導入管、滴加管及攪拌裝置之可分離式4口燒瓶投入環己酮70.0質量份,升溫至80℃,將燒瓶內置換成氮之後,藉由滴加管經2小時滴加了甲基丙烯酸正丁酯13.3質量份、2-甲基丙烯酸羥基乙酯4.6質量份、甲基丙烯酸4.3質量份、枯基苯酚環氧乙烷改質丙烯酸酯(TOAGOSEI CO., LTD.製、ARONIX M110)7.4質量份及2,2’-偶氮雙異丁腈0.4質量份的混合物。滴加結束後,進一步持續進行3小時反應來獲得了樹脂2(Mw=26000)的30質量%溶液。Resin 2: Resin synthesized by the following method 70.0 parts by mass of cyclohexanone was put into a separable 4-neck flask equipped with a thermometer, cooling tube, nitrogen introduction tube, dropping tube and stirring device, and the temperature was raised to 80°C. After replacing the flask with nitrogen, the drop tube After 2 hours, 13.3 parts by mass of n-butyl methacrylate, 4.6 parts by mass of 2-hydroxyethyl methacrylate, 4.3 parts by mass of methacrylic acid, and cumylphenol ethylene oxide modified acrylate (TOAGOSEI CO. , LTD., ARONIX M110) 7.4 parts by mass and a mixture of 2,2'-azobisisobutyronitrile 0.4 parts by mass. After the dropwise addition, the reaction was further continued for 3 hours to obtain a 30% by mass solution of Resin 2 (Mw=26000).
樹脂3:利用以下的方法合成之樹脂 向具備攪拌機、溫度計、滴加裝置、還流冷卻器、氣體導入管之反應容器加入丙二醇單甲醚乙酸酯90.0質量份,一邊向容器注入氮氣一邊加熱至60℃,在相同溫度下經2小時滴加甲基丙烯酸糠酯50.0質量份、2-甲基丙烯醯氧乙基琥珀酸26.7質量份、2-甲基丙烯酸羥基乙酯23.3質量份、2,2’-偶氮雙(2,4-二甲基戊腈)2.5質量份的混合物來進行了聚合反應。滴加結束之後,進一步在60℃下反應1小時後,添加使2,2’-偶氮雙(2,4-二甲基戊腈)0.5質量份溶解於丙二醇單甲醚乙酸酯10.0質量份而得者,之後在相同溫度下持續攪拌3小時來獲得了共聚物。冷卻至室溫之後,藉由利用丙二醇單甲醚乙酸酯稀釋來獲得了樹脂3(Mw=52000)的20質量%溶液。Resin 3: Resin synthesized by the following method 90.0 parts by mass of propylene glycol monomethyl ether acetate was added to a reaction vessel equipped with a stirrer, thermometer, dropping device, return flow cooler, and gas introduction tube, and heated to 60°C while injecting nitrogen gas into the vessel, and the same temperature was passed for 2 hours 50.0 parts by mass of furfuryl methacrylate, 26.7 parts by mass of 2-methacryl oxyethyl succinic acid, 23.3 parts by mass of hydroxyethyl 2-methacrylate, 2,2'-azobis (2,4 -Dimethylvaleronitrile) 2.5 parts by mass of the mixture was polymerized. After completion of the dropwise addition, after further reacting at 60° C. for 1 hour, 0.5 parts by mass of 2,2′-azobis(2,4-dimethylvaleronitrile) was added and dissolved in propylene glycol monomethyl ether acetate 10.0 parts by mass After obtaining the portion, the copolymer was continuously stirred at the same temperature for 3 hours. After cooling to room temperature, a 20% by mass solution of resin 3 (Mw=52000) was obtained by dilution with propylene glycol monomethyl ether acetate.
樹脂4:下述結構的樹脂(Mw=30000,附記於主鏈之數值為莫耳比。) [化學式25] Resin 4: Resin of the following structure (Mw=30000, the value appended to the main chain is the molar ratio.) [Chemical Formula 25]
樹脂5:利用以下的方法合成之樹脂 向具備攪拌機、溫度計、滴加裝置、還流冷卻器、氣體導入管之反應容器加入丙二醇單甲醚乙酸酯90.0質量份,一邊向容器注入氮氣一邊加熱至60℃,在相同溫度下經2小時滴加甲基丙烯酸環氧丙酯35.0質量份、甲基丙烯酸甲酯45.0質量份、2,2’-偶氮雙異丁腈2.5質量份的混合物來進行了聚合反應。滴加結束之後,進一步在60℃下反應1小時後,添加使2,2’-偶氮雙異丁腈0.5質量份溶解於丙二醇單甲醚乙酸酯10.0質量份而得者,之後在相同溫度下持續攪拌3小時來獲得了共聚物。接著,向反應容器注入乾燥空氣,並加入丙烯酸10.0質量份、丙二醇單甲醚乙酸酯30.2質量份、二甲基苄基胺基1.30質量份、甲醌(methoquinone)0.26質量份,加熱至100℃並持續進行20小時的攪拌,並進行酸值測量,確認到生成了目標產物之情況。進一步持續向反應容器加入四氫鄰苯二甲酸酐10.0質量份、丙二醇單甲醚乙酸酯27.7質量份,在60℃下攪拌3小時之後冷卻至室溫後,利用丙二醇單甲醚乙酸酯稀釋,藉此獲得了樹脂5(Mw=12000)的20質量%溶液。Resin 5: resin synthesized by the following method 90.0 parts by mass of propylene glycol monomethyl ether acetate was added to a reaction vessel equipped with a stirrer, thermometer, dropping device, return flow cooler, and gas introduction tube, and heated to 60°C while injecting nitrogen gas into the vessel, and the same temperature was passed for 2 hours A mixture of 35.0 parts by mass of glycidyl methacrylate, 45.0 parts by mass of methyl methacrylate, and 2.5 parts by mass of 2,2'-azobisisobutyronitrile was added to perform a polymerization reaction. After the end of the dropwise addition, after further reacting at 60°C for 1 hour, add 0.5 parts by mass of 2,2'-azobisisobutyronitrile to 10.0 parts by mass of propylene glycol monomethyl ether acetate, and then add the same The stirring was continued for 3 hours at the temperature to obtain the copolymer. Next, dry air was injected into the reaction vessel, 10.0 parts by mass of acrylic acid, 30.2 parts by mass of propylene glycol monomethyl ether acetate, 1.30 parts by mass of dimethylbenzylamino group, and 0.26 parts by mass of methoquinone were heated to 100 The stirring was continued for 20 hours at ℃, and the acid value was measured to confirm that the target product was produced. Further, 10.0 parts by mass of tetrahydrophthalic anhydride and 27.7 parts by mass of propylene glycol monomethyl ether acetate were continuously added to the reaction vessel, and after stirring at 60°C for 3 hours, after cooling to room temperature, propylene glycol monomethyl ether acetate was used. By dilution, a 20% by mass solution of resin 5 (Mw=12000) was obtained.
(溶劑) PGMEA:丙二醇單甲醚乙酸酯 PGME:丙二醇單甲醚(Solvent) PGMEA: propylene glycol monomethyl ether acetate PGME: propylene glycol monomethyl ether
[起始劑塗佈膜的吸光度的測量] 混合起始劑1的1質量份、樹脂的47.5質量份及PGMEA的51.5質量份來製備了起始劑組成物1。 樹脂P1:甲基丙烯酸苄酯/甲基丙烯酸(=70/30[莫耳比])共聚物的丙二醇單甲醚乙酸酯溶液(固體成分40質量%、重量平均分子量30000、FUJIKURA KASEI CO.,LTD.製,Acrybase FF-187)[Measurement of absorbance of starter coating film] Starter composition 1 was prepared by mixing 1 part by mass of initiator 1, 47.5 parts by mass of resin and 51.5 parts by mass of PGMEA. Resin P1: propylene glycol monomethyl ether acetate solution of benzyl methacrylate/methacrylic acid (=70/30 [mol ratio]) copolymer (solid content 40% by mass, weight average molecular weight 30000, FUJIKURA KASEI CO. , Manufactured by LTD., Acrybase FF-187)
除了使用起始劑2~6來代替起始劑1以外,以與起始劑組成物1相同的方式製備了起始劑組成物2~6。The starter compositions 2 to 6 were prepared in the same manner as the starter composition 1 except that the starters 2 to 6 were used instead of the starter 1.
利用旋塗機,將各起始劑組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於玻璃基板上,並利用100℃的加熱板進行了120秒鐘的加熱處理(預烘烤)。關於所獲得之硬化膜,利用紫外可見近紅外分光光度計UV3600(Shimadzu Corporation製)的分光光度計(參考:玻璃基板)測量了波長400~700nm的範圍內的光的吸光度。Using a spin coater, each starter composition was applied to a glass substrate so that the film thickness after pre-baking became 2.0 μm, and a 120-second heating process was performed using a 100°C hot plate (pre-baking) grilled). Regarding the obtained cured film, the absorbance of light in the wavelength range of 400 to 700 nm was measured with a spectrophotometer (reference: glass substrate) of ultraviolet-visible-near infrared spectrophotometer UV3600 (manufactured by Shimadzu Corporation).
<評價> (吸光度及折射率) 利用旋塗機,將各透鏡用組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於玻璃基板上,並利用100℃的加熱板進行了120秒鐘的加熱處理(預烘烤)。接著,利用i線步進機曝光裝置FPA-3000i5+(Canon Inc.製),以100mJ/cm2 的曝光量照射了i線。接著,利用紫外線光阻劑硬化裝置(UMA-802-HC-552;USHIO INC.製),以3000mJ/cm2 的曝光量進行曝光,從而製作了硬化膜。 關於所獲得之硬化膜,利用紫外可見近紅外分光光度計UV3600(Shimadzu Corporation製)的分光光度計(參考:玻璃基板)測量了波長400~700nm的範圍內的光的吸光度。吸光度越小,可見透明性越優異。吸光度的評價基準如以下。 AA:在波長400~700nm的整個範圍內的吸光度的最大值小於0.03。 A:在波長400~700nm的整個範圍內的吸光度的最大值為0.03以上且小於0.04。 B:在波長400~700nm的整個範圍內的吸光度的最大值為0.04以上且小於0.05。 C:在波長400~700nm的整個範圍內的吸光度的最大值為0.05以上。 又,關於所獲得之硬化膜,利用J.A.Woollam Japan Co.,Inc.製橢圓偏光計測量了在波長550nm的光的折射率。<Evaluation> (Absorbance and refractive index) Using a spin coater, each lens composition was applied on a glass substrate so that the film thickness after pre-baking became 2.0 μm, and a 120° C. hot plate was used for 120 Heat treatment in seconds (pre-bake). Next, the i-ray was irradiated with an exposure amount of 100 mJ/cm 2 using an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, using an ultraviolet photoresist curing device (UMA-802-HC-552; manufactured by USHIO INC.), exposure was performed at an exposure amount of 3000 mJ/cm 2 to produce a cured film. Regarding the obtained cured film, the absorbance of light in the wavelength range of 400 to 700 nm was measured with a spectrophotometer (reference: glass substrate) of ultraviolet-visible-near infrared spectrophotometer UV3600 (manufactured by Shimadzu Corporation). The smaller the absorbance, the better the visible transparency. The evaluation criteria of absorbance are as follows. AA: The maximum value of absorbance over the entire wavelength range of 400 to 700 nm is less than 0.03. A: The maximum value of absorbance in the entire range of wavelengths from 400 to 700 nm is 0.03 or more and less than 0.04. B: The maximum value of absorbance in the entire range of wavelengths from 400 to 700 nm is 0.04 or more and less than 0.05. C: The maximum value of absorbance in the entire range of wavelengths from 400 to 700 nm is 0.05 or more. Further, regarding the obtained cured film, the refractive index of light at a wavelength of 550 nm was measured using an ellipsometer manufactured by JA Woollam Japan Co., Inc.
(耐溶劑性) 關於所獲得之上述的硬化膜,滴加N-甲基吡咯啶酮(NMP)之後,放置200秒鐘,並利用流水沖洗10秒鐘來進行了耐溶劑性試驗。測量耐溶劑性試驗前後的膜的厚度,並測量殘膜率來評價了耐溶劑性。殘膜率越接近1,耐溶劑性越優異。 殘膜率=耐溶劑性試驗前後的硬化膜的厚度/耐溶劑性試驗之前的硬化膜的厚度 AA:殘膜率為0.95以上且1.0以下。 A:殘膜率為0.90以上且小於0.95。 B:殘膜率為0.85以上且小於0.90。 C:殘膜率小於0.85。(Solvent resistance) Regarding the obtained cured film, after dropping N-methylpyrrolidone (NMP), it was left for 200 seconds and rinsed with running water for 10 seconds to perform a solvent resistance test. The thickness of the film before and after the solvent resistance test was measured, and the residual film ratio was measured to evaluate the solvent resistance. The closer the residual film ratio is to 1, the better the solvent resistance. Residual film rate = thickness of cured film before and after solvent resistance test / thickness of cured film before solvent resistance test AA: The residual film ratio is 0.95 or more and 1.0 or less. A: The residual film ratio is 0.90 or more and less than 0.95. B: The residual film ratio is 0.85 or more and less than 0.90. C: The residual film rate is less than 0.85.
(矩形性) 利用旋塗法,將各透鏡用組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於玻璃基板上,之後利用100℃的加熱板進行了120秒鐘的加熱處理來形成了組成物層。接著,利用i線步進機曝光裝置,並經由形成有10μm見方的島形圖案之遮罩以100mJ/cm2 的曝光量曝光了i線。之後,使用氫氧化四甲基銨0.3質量%水溶液在23℃進行60秒鐘的覆液式顯影,接著進行了沖洗處理。接著,以3000mJ/cm2 的曝光量曝光(後曝光)在波長254~350nm的光來形成了圖案。 利用測長SEM(掃描式電子顯微鏡),從玻璃基板的正上方觀察了形成於玻璃基板上之圖案的寬度及圖案的對角線的長度。以以下的基準評價了矩形性。圖案的對角線的長度/(圖案的寬度×20.5 )的值越接近1.0,矩形性越佳。 AA:圖案的對角線的長度/(圖案的寬度×20.5 )為超過0.95且1.0以下。 A:圖案的對角線的長度/(圖案的寬度×20.5 )為超過0.90且0.95以下。 B:圖案的對角線的長度/(圖案的寬度×20.5 )為超過0.80且0.90以下。 C:圖案的對角線的長度/(圖案的寬度×20.5 )為0.80以下。(Rectangularity) By spin coating, each lens composition was applied on a glass substrate so that the film thickness after pre-baking became 2.0 μm, and then a 120°C hot plate was used for heat treatment for 120 seconds. To form the composition layer. Next, using an i-line stepper exposure device, the i-line was exposed with an exposure amount of 100 mJ/cm 2 through a mask formed with an island-shaped pattern of 10 μm square. Thereafter, a 0.3% by mass aqueous solution of tetramethylammonium hydroxide was used for liquid-covered development at 23° C. for 60 seconds, followed by a rinse treatment. Next, a pattern was formed by exposing (post-exposure) light with a wavelength of 254 to 350 nm at an exposure amount of 3000 mJ/cm 2 . Using a length measuring SEM (scanning electron microscope), the width of the pattern formed on the glass substrate and the length of the diagonal line of the pattern were observed from directly above the glass substrate. The rectangularity was evaluated on the following criteria. The closer the value of the diagonal length of the pattern/(width of the pattern×2 0.5 ) to 1.0, the better the rectangularity. AA: The length of the diagonal of the pattern/(width of the pattern×2 0.5 ) is more than 0.95 and 1.0 or less. A: The length of the diagonal of the pattern/(width of the pattern×2 0.5 ) exceeds 0.90 and 0.95 or less. B: The length of the diagonal of the pattern/(width of the pattern×2 0.5 ) exceeds 0.80 and 0.90 or less. C: The length of the diagonal of the pattern/(width of the pattern×2 0.5 ) is 0.80 or less.
<透鏡表面的起皺> 利用旋塗法,將透鏡用組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於噴霧了六甲基二矽氮烷之8英吋(20.32cm)的矽晶圓上,之後利用100℃的加熱板進行120秒鐘的加熱處理來形成了組成物層。接著,使用i線步進機曝光裝置FPA-3000i5+(Canon Inc.製),通過100μm見方的島形圖案遮罩以100mJ/cm2 的曝光量照射了i線。之後,將形成有被曝光之組成物層之矽晶圓載置於旋轉・噴淋顯影機(DW-30型;Chemitronics Co., Ltd.製)的水平旋轉台上,使用CD-2000(FUJIFILM Electronic Materials Co.,Ltd.製)的40%稀釋液在23℃下進行了180秒鐘的覆液式顯影。接著,將該矽晶圓以真空吸盤方式固定於水平旋轉台上,藉由旋轉裝置使矽晶圓以50rpm轉速旋轉,並且從其旋轉中心的上方由噴出噴嘴以噴淋狀供給純水來進行沖洗處理,之後進行了旋轉乾燥。接著,利用紫外線光阻劑硬化裝置(UMA-802-HC-552;USHIO INC.製)以3000mJ/cm2 的曝光量進行曝光(後曝光)來形成了圖案。 接著,將正型光阻液(HPR-204ESZ-9-5mPa・s,FUJIFILM Electronic Materials Co.,Ltd.製)以乾燥膜厚成為0.5μm的方式塗佈於所獲得之圖案上,並利用加熱板在90℃下加熱了1分鐘。然後,各透鏡的中心部的光透射率為0%,經由將透射率調整成隨著向周邊部擴展光透射率隨之增加之半色調遮罩,使用i線步進機曝光裝置FPA-3000i5+(Canon Inc.製)以300mJ/cm2 的曝光量照射了i線。接著,使用鹼顯影液(HPRD-429E、FUJIFILM Electronic Materials Co.,Ltd.製),在室溫下進行了60秒鐘的覆液式顯影之後,進一步利用使用了純水之旋轉噴淋進行了20秒鐘的沖洗。之後,進一步利用純水進行水洗後,藉由高速旋轉使基板乾燥,並進一步利用加熱板在100℃、15分鐘的條件下進行加熱來形成了透鏡形狀的光阻圖案。 使用乾式蝕刻裝置(Hitachi High-Technologies Corporation.製:U-621),在下述條件下對如以上那樣所獲得之基板實施乾式蝕刻處理,並加工成能夠用作微透鏡形狀來製造了透鏡。<Wrinkle on lens surface> Using a spin coating method, the lens composition is applied to 8 inches (20.32 cm) sprayed with hexamethyldisilazane so that the film thickness after pre-baking becomes 2.0 μm. On the silicon wafer, a 100°C hot plate was used for 120 seconds of heat treatment to form a composition layer. Next, using an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.), i-rays were irradiated with an exposure amount of 100 mJ/cm 2 through an island-shaped pattern mask of 100 μm square. After that, the silicon wafer on which the exposed composition layer was formed was placed on a horizontal rotary table of a rotary/spray developing machine (DW-30 type; manufactured by Chemitronics Co., Ltd.) using CD-2000 (FUJIFILM Electronic The 40% dilution of Materials Co., Ltd. was subjected to liquid-covered development at 23°C for 180 seconds. Next, the silicon wafer was fixed on a horizontal rotating table by a vacuum chuck method, the silicon wafer was rotated at 50 rpm by a rotating device, and pure water was sprayed from a spray nozzle from above the center of rotation to perform After rinsing, spin drying was performed. Next, a pattern was formed by exposure (post-exposure) using an ultraviolet photoresist curing device (UMA-802-HC-552; manufactured by USHIO INC.) at an exposure amount of 3000 mJ/cm 2 . Next, a positive type photoresist (HPR-204ESZ-9-5mPa・s, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was applied to the obtained pattern with a dry film thickness of 0.5 μm, and heated The board was heated at 90°C for 1 minute. Then, the light transmittance of the central part of each lens is 0%. After adjusting the transmittance to a halftone mask that increases as the light transmittance increases toward the peripheral part, an i-line stepper exposure device FPA-3000i5+ is used (Manufactured by Canon Inc.) The i-ray was irradiated with an exposure of 300 mJ/cm 2 . Next, using an alkaline developer (HPRD-429E, manufactured by FUJIFILM Electronic Materials Co., Ltd.), after performing liquid-covered development at room temperature for 60 seconds, it was further carried out by rotary spray using pure water Rinse for 20 seconds. Thereafter, after further washing with pure water, the substrate was dried by high-speed rotation, and further heated by a hot plate at 100° C. for 15 minutes to form a lens-shaped photoresist pattern. Using a dry etching device (manufactured by Hitachi High-Technologies Corporation: U-621), the substrate obtained as above was subjected to dry etching treatment under the following conditions, and processed into a shape that can be used as a microlens to produce a lens.
(透鏡加工條件) ・RF(radio frequency:射頻)功率:800W ・天線偏壓:100W ・晶圓偏壓:500W ・腔室內壓:0.5Pa ・基板溫度:50℃ ・混合氣體種類及流量:CF4 /C4 F6 /O2 /Ar=175/25/50/200ml/分鐘 ・光阻劑蝕刻速度:140nm/分鐘(Lens processing conditions) ・RF (radio frequency: RF) power: 800W ・Antenna bias: 100W ・Wafer bias: 500W ・Internal pressure: 0.5Pa ・Substrate temperature: 50°C ・ Mixed gas type and flow rate: CF 4 /C 4 F 6 /O 2 /Ar=175/25/50/200ml/min・Etching speed of photoresist: 140nm/min
利用光學顯微鏡(500倍)對所獲得之透鏡表面進行觀察,按照以下所示之評價基準觀察表面的起皺的情況並進行了評價。 AA:在表面完全未確認到起皺。 A:在表面幾乎未確認到起皺。 B:在表面稍微確認到起皺。 C:觀察到明顯的起皺。The surface of the obtained lens was observed with an optical microscope (500 times), and the surface wrinkle was observed and evaluated according to the evaluation criteria shown below. AA: Wrinkle was not confirmed at all on the surface. A: Almost no wrinkles were observed on the surface. B: Wrinkle was slightly confirmed on the surface. C: Obvious wrinkling was observed.
[表2]
如上述表所示,實施例1~33的吸光度及折射率的特性優異。尤其,實施例1~16、19、20、22~33的透鏡表面起皺的評價為良好。進而,耐溶劑性及矩形性的評價均為B以上。 在具有濾色器之顯示裝置的濾色器的表面上形成實施例1~33的透鏡來安裝於顯示裝置之結果,其亮度比不具有實施例1~33的透鏡之顯示裝置的亮度良好。尤其,安裝有實施例1~16、19、20、22~33的透鏡之顯示裝置的亮度尤其良好。 另一方面,觀察到安裝有比較例1的透鏡之顯示裝置的亮度比不具有透鏡之顯示裝置的亮度低。As shown in the above table, Examples 1 to 33 have excellent absorbance and refractive index characteristics. In particular, the evaluation of the lens surface wrinkles of Examples 1 to 16, 19, 20, and 22 to 33 was good. Furthermore, the evaluations of solvent resistance and rectangularity are both B or more. As a result of forming the lenses of Examples 1 to 33 on the surface of the color filter of the display device with the color filter and mounting it on the display device, the brightness was better than that of the display device without the lenses of Examples 1 to 33. In particular, the brightness of the display device in which the lenses of Examples 1 to 16, 19, 20, and 22 to 33 were mounted was particularly good. On the other hand, it was observed that the brightness of the display device equipped with the lens of Comparative Example 1 was lower than that of the display device without the lens.
當評價透鏡表面的起皺時,除了在230℃、15分鐘的條件下利用加熱板進行加熱硬化來代替進行後曝光以外,利用相同的方法製造透鏡並觀察了透鏡表面的起皺之結果,觀察到比進行後曝光來製造透鏡時起皺的產生量多。When evaluating the wrinkle on the lens surface, the lens was manufactured by the same method and the result of the wrinkle on the lens surface was observed by the same method except that the heating plate was heated and cured at 230°C for 15 minutes instead of post-exposure. The amount of generation of wrinkles is greater than when a lens is manufactured by performing post-exposure.
利用旋塗機,將實施例12或實施例33的透鏡用組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於玻璃基板上,並利用100℃的加熱板進行了120秒鐘的加熱處理(預烘烤)。接著,利用i線步進機曝光裝置FPA-3000i5+(Canon Inc.製),以3000mJ/cm2 的曝光量照射i線來製作了硬化膜。利用與上述相同的方法對所獲得之硬化膜的耐溶劑性進行了評價之結果,耐溶劑性均為AA的評價。Using a spin coater, the lens composition of Example 12 or Example 33 was applied on a glass substrate so that the film thickness after pre-baking became 2.0 μm, and a hot plate at 100° C. was used for 120 seconds. Heat treatment (pre-baking). Next, an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.) was used to irradiate i-line with an exposure of 3000 mJ/cm 2 to produce a cured film. The solvent resistance of the obtained cured film was evaluated by the same method as described above, and the solvent resistance was all AA evaluation.
利用旋塗機,將實施例12或實施例33的透鏡用組成物以預烘烤之後的膜厚成為2.0μm的方式塗佈於玻璃基板上,並利用100℃的加熱板進行了120秒鐘的加熱處理(預烘烤)。接著,利用i線步進機曝光裝置FPA-3000i5+(Canon Inc.製)以100mJ/cm2 的曝光量照射了i線。接著,利用120℃的加熱板進行900秒鐘的加熱處理來製作了硬化膜。利用與上述相同的方法對所獲得之硬化膜的耐溶劑性進行了評價之結果,耐溶劑性均為A的評價。Using a spin coater, the lens composition of Example 12 or Example 33 was applied on a glass substrate so that the film thickness after pre-baking became 2.0 μm, and a hot plate at 100° C. was used for 120 seconds. Heat treatment (pre-baking). Next, i-rays were irradiated with an exposure amount of 100 mJ/cm 2 using an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, a 120° C. hot plate was used for heat treatment for 900 seconds to produce a cured film. The solvent resistance of the obtained cured film was evaluated by the same method as described above, and the solvent resistance was all evaluated as A.
使用各實施例的透鏡用組成物形成凹型形狀的透鏡,亦可以獲得與各實施例相同的效果。Even if the lens composition of each embodiment is used to form a concave lens, the same effect as that of each embodiment can be obtained.
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