TW202011496A - Device for supporting plate-shaped workpiece and electroplating apparatus - Google Patents
Device for supporting plate-shaped workpiece and electroplating apparatus Download PDFInfo
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本發明係有關一種可供支撐被鍍物進行電鍍作業之板件支撐構件。The invention relates to a plate supporting member capable of supporting an object to be plated for electroplating.
習知常用的晶圓電鍍裝置大約可以分為兩類,一為直立式電鍍裝置(Rack plater),另一為平放式電鍍裝置 (Cup plater)。一般習知直立式電鍍裝置(Rack plater)在進行電鍍之前,需先將晶圓的背面壓上一層藍色膠膜 (blue tape),此外,在晶圓邊緣處必須塗上光阻,以防止晶圓的邊緣鍍上不需要的金屬。接著以晶圓電鍍夾具上之電鍍點(probe)與晶圓的邊緣接觸,藉此提供每一處晶圓電鍍所需要的電流,之後將晶圓浸泡於具有高溫的電鍍液之電鍍槽中,經一段預定時間之後將晶圓取出,即完成電鍍的動作。電鍍之後再將藍色膠膜撕去。然而,於晶圓的背面壓上一層藍色膠膜、電鍍後撕膜以及在晶圓的邊緣處塗上光阻,不但耗時而且非常容易污染及損傷晶圓,影響產品的良率。The conventionally used wafer electroplating devices can be roughly divided into two types, one is an upright electroplating device (Rack plater), and the other is a flat-type electroplating device (Cup plater). In the conventional conventional electroplating equipment (Rack plater), before the electroplating, the back of the wafer needs to be pressed with a layer of blue tape (blue tape). In addition, a photoresist must be coated on the edge of the wafer to prevent The edges of the wafer are plated with unwanted metal. Then, the electroplating probe on the wafer electroplating jig is in contact with the edge of the wafer to provide the current required for electroplating of each wafer, and then the wafer is immersed in the electroplating bath with a high-temperature electroplating solution, After a predetermined period of time, the wafer is taken out, and the electroplating is completed. After electroplating, remove the blue film. However, pressing a blue adhesive film on the back of the wafer, tearing the film after electroplating, and applying photoresist on the edge of the wafer are not only time-consuming but also very easy to contaminate and damage the wafer, affecting the yield of the product.
故出現如中華民國專利公告號第461015號,專利名稱「晶圓電鍍夾具」,其具有一真空系統、一下蓋、一抽氣管線以及二上蓋,二上蓋分別具有一圓形開口,分別與下蓋之兩面相結合,並露出晶圓的電鍍區域,且於圓形開口邊緣分別具有複數個電鍍點以及探針用以分別與晶圓電性連接,而下蓋具有複數個貫穿孔可與抽氣管線相連通,利用真空系統透過抽氣管線以及複數貫穿孔可先將晶圓穩定的吸住於下蓋,之後再將上蓋以螺栓鎖合於下蓋的兩邊。在上蓋鎖合於下蓋之後,再以支持裝置固定,即可放入電鍍液中進行電鍍。Therefore, such as the Republic of China Patent Announcement No. 461015, the patent name "wafer electroplating fixture", which has a vacuum system, a lower cover, a suction line and two upper covers, the two upper covers have a circular opening, respectively The two surfaces of the cover are combined to expose the plating area of the wafer, and a plurality of plating points and probes are respectively provided on the edge of the circular opening for electrically connecting with the wafer, and the lower cover has a plurality of through holes The gas lines are connected, and the vacuum system can be used to suck the wafer stably on the lower cover through the suction line and the plurality of through holes, and then the upper cover is bolted to both sides of the lower cover. After the upper cover is locked to the lower cover, and then fixed with a supporting device, it can be placed in an electroplating solution for electroplating.
雖上述習有專利可省去壓藍膜、撕膜以及於晶圓電鍍面邊緣圖光阻的繁瑣步驟;但仍存在以下缺失: 1、 須利用人工以螺栓鎖合方式將上蓋與下蓋相互鎖合,不僅耗時費工且人工鎖合之力道難以控制,容易因為力量過大使上蓋施力於晶圓而發生破片的風險; 2、 施力於每個螺栓力量不同時,使上蓋與晶圓表面產生間隙,電鍍液會由間隙滲入且滲漏到晶圓背面; 3、 因電鍍點以及探針並無彈性,進行螺栓鎖合後,容易於晶圓表面產生應力而有破片的情況發生。Although the above-mentioned conventional patents can save the cumbersome steps of pressing the blue film, tearing the film and photoresist on the edge of the wafer plating surface; but there are still the following defects: 1. The upper cover and the lower cover must be manually locked with each other by bolt locking Locking, not only time-consuming and labor-intensive, but also difficult to control the force of manual locking, it is easy to break the risk of breaking due to the force of the ambassador upper cover exerting force on the wafer; 2. When the force of each bolt is different, the upper cover and the crystal There is a gap on the round surface, and the plating solution will infiltrate from the gap and leak to the back of the wafer; 3. Due to the inflexibility of the plating point and the probe, after the bolt is locked, it is easy to generate stress on the wafer surface and fragments may occur .
本發明的主要目是提供一種板件支撐構件,提供一較佳夾持支撐效果,不僅可確實支撐被鍍物亦可避免因應力而破片的風險。The main purpose of the present invention is to provide a plate supporting member, which provides a better clamping and supporting effect, which can not only support the object to be plated but also avoid the risk of chipping due to stress.
本發明的次要目的是提供一種板件支撐構件,提供一較佳密封效果,可確保電鍍液不會滲漏至被鍍物之非電鍍區,確保產品良率。The secondary object of the present invention is to provide a plate support member that provides a better sealing effect, can ensure that the plating solution does not leak to the non-plating area of the object to be plated, and ensures the product yield.
本發明之板件支撐構件至少包含有:第一部件,設有一開孔以及環設於該開孔周緣處之複數第一磁吸部;導電部件,具有一環狀撓性絕緣主體以及外露於該撓性絕緣主體之複數彈性導電部,該撓性絕緣主體係環設於該開孔周緣處;第二部件,設有複數第二磁吸部,其數量與位置係與該第一磁吸部相對應,該第二部件係配置於該第一部件一側,並可將該開孔一側封閉;以及固定部件,配置於該第一部件與該第二部件之間,供固定該第一、第二部件。The plate supporting member of the present invention includes at least: a first part provided with an opening and a plurality of first magnetically attracting parts looped around the periphery of the opening; a conductive part having a ring-shaped flexible insulating body and exposed to A plurality of elastic conductive parts of the flexible insulation body, the flexible insulation main system ring is arranged at the periphery of the opening; the second part is provided with a plurality of second magnetic attraction parts, the number and position of which are the same as the first magnetic attraction Corresponding to the part, the second part is arranged on the side of the first part and can close the opening side; and a fixing part is arranged between the first part and the second part for fixing the
其中,該板件支撐構件可供夾持固定一被鍍物於一電鍍槽內進行電鍍,而該開孔露出該被鍍物之一電鍍區域,利用撓性絕緣主體以及複數彈性導電部接觸於被鍍物表面,不致使被鍍物產生破片風險,且可有效防止電鍍區域以外的邊緣部、背面等非電鍍區接觸到電鍍液。Wherein, the board supporting member can hold and fix an object to be plated in an electroplating tank, and the opening exposes a plating area of the object to be plated, and is contacted by a flexible insulating body and a plurality of elastic conductive parts The surface of the object to be plated does not cause a risk of chipping of the object to be plated, and can effectively prevent non-plating areas such as edges and back surfaces other than the plating area from coming into contact with the plating solution.
依據上述技術特徵,所述導電部件進一步具有至少二掛架以及與該二掛架連接之導電體,該掛架係延伸外露於該第一部件之上方,該導電體一側具有齒梳狀排列之複數片體,而該複數片體之一自由端係分別朝內彎折而形成該彈性導電部。According to the above technical features, the conductive member further has at least two hangers and a conductor connected to the two hangers, the hanger extends to be exposed above the first member, and the side of the conductor has a comb arrangement A plurality of pieces, and a free end of the plurality of pieces is respectively bent inward to form the elastic conductive portion.
依據上述技術特徵,所述固定部件具有一固定件、可動件以及連接該固定件與可動件之樞軸,該可動件係以該樞軸形成樞轉,該可動件之自由端設有一彈性固定部。According to the above technical feature, the fixed part has a fixed part, a movable part and a pivot connecting the fixed part and the movable part, the movable part is pivoted by the pivot, and the free end of the movable part is provided with an elastic fixation unit.
依據上述技術特徵,所述固定件係配置於該第二部件,該第一部件具有一凹槽以供固定該可動件。According to the above technical features, the fixing member is disposed on the second member, and the first member has a groove for fixing the movable member.
依據上述技術特徵,所述凹槽並設有一溝部以供卡掣該彈性固定部。According to the above technical features, the groove is also provided with a groove portion for catching the elastic fixing portion.
依據上述技術特徵,進一步設有一真空系統以及與該真空系統連接之第一抽吸口,該第一抽吸口係配置於該第二部件,該第二部件另配置有一第二抽吸口可與該第一抽吸口連通,該第二抽吸口係朝向該開孔。According to the above technical features, a vacuum system and a first suction port connected to the vacuum system are further provided, the first suction port is disposed on the second component, and the second component is further provided with a second suction port Communicating with the first suction port, the second suction port faces the opening.
依據上述技術特徵,所述第一磁吸部係為配置於該第一部件之磁性體,該第二磁吸部係為配置於該第二部件之磁性體。According to the above technical features, the first magnetic attraction portion is a magnetic body disposed on the first member, and the second magnetic attraction portion is a magnetic body disposed on the second member.
依據上述技術特徵,所述第一、第二部件分別設有可相互接合的第一、第二組裝件。According to the above technical features, the first and second components are respectively provided with first and second assembly parts that can be joined to each other.
本發明另提供一種電鍍裝置,其至少包含有:上述之板件支撐構件;以及用以保存電鍍液於其中的電鍍槽。The present invention further provides an electroplating apparatus, which at least includes: the above-mentioned plate support member; and an electroplating tank for storing electroplating solution therein.
依據上述技術特徵,所述板件支撐構件用以夾持一被鍍物於該電鍍槽內進行電鍍,該被鍍物係被支撐固定於該第一、第二部件之間,該開孔並露出該被鍍物之一電鍍區域,且該被鍍物至少一部份係與該複數彈性導電部接觸。According to the above technical features, the plate support member is used to clamp an object to be plated in the electroplating bath for electroplating, the object to be plated is supported and fixed between the first and second parts, and the opening and A plating area of the object is exposed, and at least a part of the object is in contact with the plurality of elastic conductive parts.
除非另外說明,否則本申請說明書和申請專利範圍中所使用的下列用語具有下文給予的定義。請注意,本申請說明書和申請專利範圍中所使用的單數形用語「一」意欲涵蓋在一個以及一個以上的所載事項,例如至少一個、至少二個或至少三個,而非意味著僅僅具有單一個所載事項。此外,申請專利範圍中使用的「包含」、「具有」等開放式連接詞是表示請求項中所記載的元件或成分的組合中,不排除請求項未載明的其他組件或成分。亦應注意到用語「或」在意義上一般也包括「及/或」,除非內容另有清楚表明。本申請說明書和申請專利範圍中所使用的用語「約(about)」或「實質上(substantially)」,是用以修飾任何可些微變化的誤差,但這種些微變化並不會改變其本質。Unless otherwise stated, the following terms used in the specification and patent scope of this application have the definitions given below. Please note that the singular term "a" used in the specification and patent scope of this application is intended to cover one or more of the items contained, such as at least one, at least two, or at least three, and does not mean to have only The single item contained. In addition, open connection terms such as "include", "have", etc. used in the scope of patent application mean that the combination of elements or components described in the request does not exclude other components or components not specified in the request. It should also be noted that the term "or" also generally includes "and/or" in the sense, unless the content clearly indicates otherwise. The terms "about" or "substantially" used in the specification and patent scope of this application are used to modify any slight variation error, but such slight variation will not change its essence.
首先,本案方法涉及一種板件支撐構件,請參閱第1圖所示為本發明中板件處理裝置之結構示意圖,至少包含有:第一部件1、導電部件2、第二部件3以及固定部件4。First of all, the method of this case involves a board support member. Please refer to FIG. 1 for a schematic diagram of the board handling device of the present invention, which at least includes: a
第一部件1係具有一剛性主體,其設有一開孔11以及環設於該開孔11周緣處之複數第一磁吸部12,該第一磁吸部12可以為配置於該第一部件1之磁性體。The
導電部件2具有一環狀撓性絕緣主體21以及外露於該撓性絕緣主體21之複數彈性導電部22,請同時參閱第2圖至第4圖所示,該撓性絕緣主體21係環設於該開孔11周緣處,該撓性絕緣主體21可以為矽膠等材質。該導電部件2進一步具有至少二掛架23以及與該二掛架23連接之導電體24,該掛架23係延伸外露於該第一部件1之上方,該導電體24一側具有齒梳狀排列之複數片體241,而該複數片體241之一自由端係分別朝內彎折,而其彎折處則形成該彈性導電部22。The
第二部件3係具有一剛性主體,如第1圖所示,其設有複數第二磁吸部31,其數量與位置係與該第一磁吸部12相對應,該第二磁吸部31可以為配置於該第二部件3之磁性體,該第二部件3係配置於該第一部件1一側,並可將該開孔11一側封閉。The
固定部件4則配置於該第一部件1與該第二部件3之間,供固定該第一、第二部件1、3,請同時參閱第1圖及第5圖所示,該固定部件4具有一固定件41、可動件42以及連接該固定件41與可動件42之樞軸43,該可動件42係以該樞軸43形成樞轉,該可動件42之自由端設有一彈性固定部421,該彈性固定部421可以為一彈片構型;如圖所示之實施例中,該固定件41係配置於該第二部件3,該第一部件1具有一凹槽13以供固定該可動件42,該凹槽13並設有一溝部14以供卡掣該彈性固定部421。The
本發明之板件支撐構件可用以夾持一被鍍物5於一保存電鍍液於其中的電鍍槽(圖未示)內進行電鍍,如第6圖及第7圖所示,該被鍍物5係被支撐固定於該第一、第二部件1、3之間,該開孔11並露出該被鍍物5之一電鍍區域51,而電鍍區域51以外的邊緣部、背面等非電鍍區52則與第二部件3接觸而呈封閉狀,尤其是利用第一磁吸部12與第二磁吸部31的相互磁吸固定作用,並藉由固定部件4將第一、第二部件1、3相互固定,不僅可確實支撐被鍍物5亦可避免因應力而破片的風險,而該被鍍物5至少一部份係與該撓性絕緣主體21以及複數彈性導電部22接觸,並將電流利用掛架23、導電體24以及複數彈性導電部22通入被鍍物5上,以利電鍍的進行;其中,因撓性絕緣主體21之配置,使得被鍍物5非電鍍區52緊貼於第二部件3,而被鍍物5的邊緣則緊貼於撓性絕緣主體21,不僅可避免被鍍物產生破片風險,且可有效防止電鍍區域以外的邊緣部、背面等非電鍍區接觸到電鍍液。The plate supporting member of the present invention can be used to clamp an object to be plated 5 in an electroplating tank (not shown) in which the plating solution is stored for electroplating. As shown in FIGS. 6 and 7, the object to be plated 5 is supported and fixed between the first and
本發明進一步設有一真空系統(圖未示)以及與該真空系統連接之第一抽吸口61,如第8圖所示,該第一抽吸口61係配置於該第二部件3,該第二部件3另配置有一第二抽吸口62可與該第一抽吸口61連通,請同時參閱第1圖及第6圖所示,該第二抽吸口62係朝向該開孔11,可預先將被鍍物5利用真空系統以及第一、第二抽吸口61、62之真空吸引作用,並將被鍍物5的電鍍區域51朝外吸附固定於該第二部件3,再利用第一、第二磁吸部12、31以及固定部件4將第一、第二部件1、3相互固定;再者,該第一、第二部件1、3分別設有可相互接合的第一、第二組裝件71、72,如圖所示實施例中,第一組裝件71係為配置於該第一部件1表面之凸塊構型,第二組裝件72則為配置於該第二部件3表面之凹部構型,利用第一、第二組裝件71、72相互接合作用,可將該第一、第二部件1、3相互組裝對位。The present invention further includes a vacuum system (not shown) and a
綜上所述,本發明提供一種板件支撐構件及電鍍裝置,爰依法提呈發明專利之申請;本發明之技術內容及技術特點巳揭示如上,然而熟悉本項技術之人士仍可能基於本發明之揭示而作各種不背離本案發明精神之替換及修飾。因此,本發明之保護範圍應不限於實施例所揭示者,而應包括各種不背離本發明之替換及修飾,並為以下之申請專利範圍所涵蓋。In summary, the present invention provides a plate support member and an electroplating device, and an application for an invention patent is filed according to law; the technical content and technical features of the present invention have been disclosed as above, but those familiar with this technology may still be based on the present invention The disclosure made various substitutions and modifications without departing from the spirit of the present invention. Therefore, the protection scope of the present invention should not be limited to those disclosed in the embodiments, but should include various replacements and modifications without departing from the present invention, and be covered by the following patent application scope.
1:第一部件 11:開孔 12:第一磁吸部 13:凹槽 14:溝部 2:導電部件 21:撓性絕緣主體 22:彈性導電部 23:掛架 24:導電體 241:片體 3:第二部件 31:第二磁吸部 4:固定部件 41:固定件 42:可動件 421:彈性固定部 43:樞軸 5:被鍍物 51:電鍍區域 52:非電鍍區 61:第一抽吸口 62:第二抽吸口 71:第一組裝件 72:第二組裝件1: the first part 11: opening 12: The first magnetic part 13: groove 14: Ditch 2: conductive parts 21: Flexible insulation body 22: Elastic conductive part 23: Hanger 24: conductor 241: piece 3: the second part 31: Second magnetic attraction 4: fixed parts 41: fixings 42: moving parts 421: Elastic fixing part 43: pivot 5: Object to be plated 51: plating area 52: Non-plating area 61: The first suction port 62: Second suction port 71: The first assembly 72: second assembly
第1圖為本發明中板件支撐構件之結構分解圖。 第2圖為本發明中第一部件之結構放大立體圖。 第3圖為本發明中導電部件之結構放大立體圖。 第4圖為本發明中導電體之結構放大立體圖。 第5圖為本發明中固定部件之結構放大立體圖。 第6圖為本發明中板件支撐構件之結構示意圖。 第7圖為本發明中板件支撐構件之結構立體圖。 第8圖為本發明中真空系統之結構示意圖。Fig. 1 is an exploded view of the structure of a plate supporting member in the present invention. FIG. 2 is an enlarged perspective view of the structure of the first component in the present invention. FIG. 3 is an enlarged perspective view of the structure of the conductive member in the present invention. FIG. 4 is an enlarged perspective view of the structure of the conductor in the present invention. Fig. 5 is an enlarged perspective view of the structure of the fixing member in the present invention. Fig. 6 is a schematic diagram of the structure of a plate supporting member in the present invention. Fig. 7 is a perspective view of the structure of a plate support member in the present invention. Figure 8 is a schematic diagram of the structure of the vacuum system in the present invention.
1:第一部件 1: the first part
11:開孔 11: opening
12:第一磁吸部 12: The first magnetic part
2:導電部件 2: conductive parts
21:撓性絕緣主體 21: Flexible insulation body
3:第二部件 3: the second part
31:第二磁吸部 31: Second magnetic attraction
4:固定部件 4: fixed parts
5:被鍍物 5: Object to be plated
52:非電鍍區 52: Non-plating area
62:第二抽吸口 62: Second suction port
71:第一組裝件 71: The first assembly
72:第二組裝件 72: second assembly
Claims (10)
Priority Applications (1)
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TW107130672A TW202011496A (en) | 2018-08-31 | 2018-08-31 | Device for supporting plate-shaped workpiece and electroplating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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TW107130672A TW202011496A (en) | 2018-08-31 | 2018-08-31 | Device for supporting plate-shaped workpiece and electroplating apparatus |
Publications (1)
Publication Number | Publication Date |
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TW202011496A true TW202011496A (en) | 2020-03-16 |
Family
ID=70766670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW107130672A TW202011496A (en) | 2018-08-31 | 2018-08-31 | Device for supporting plate-shaped workpiece and electroplating apparatus |
Country Status (1)
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TW (1) | TW202011496A (en) |
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2018
- 2018-08-31 TW TW107130672A patent/TW202011496A/en unknown
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