TW202003522A - Process for preparation of morphinan derivatives - Google Patents

Process for preparation of morphinan derivatives Download PDF

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TW202003522A
TW202003522A TW108111313A TW108111313A TW202003522A TW 202003522 A TW202003522 A TW 202003522A TW 108111313 A TW108111313 A TW 108111313A TW 108111313 A TW108111313 A TW 108111313A TW 202003522 A TW202003522 A TW 202003522A
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heteroaryl
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廣瀨雅朗
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日商日本化美化股份有限公司
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D489/00Heterocyclic compounds containing 4aH-8, 9 c- Iminoethano-phenanthro [4, 5-b, c, d] furan ring systems, e.g. derivatives of [4, 5-epoxy]-morphinan of the formula:
    • C07D489/09Heterocyclic compounds containing 4aH-8, 9 c- Iminoethano-phenanthro [4, 5-b, c, d] furan ring systems, e.g. derivatives of [4, 5-epoxy]-morphinan of the formula: containing 4aH-8, 9 c-Iminoethano- phenanthro [4, 5-b, c, d] furan ring systems condensed with carbocyclic rings or ring systems
    • C07D489/10Heterocyclic compounds containing 4aH-8, 9 c- Iminoethano-phenanthro [4, 5-b, c, d] furan ring systems, e.g. derivatives of [4, 5-epoxy]-morphinan of the formula: containing 4aH-8, 9 c-Iminoethano- phenanthro [4, 5-b, c, d] furan ring systems condensed with carbocyclic rings or ring systems with a bridge between positions 6 and 14
    • C07D489/12Heterocyclic compounds containing 4aH-8, 9 c- Iminoethano-phenanthro [4, 5-b, c, d] furan ring systems, e.g. derivatives of [4, 5-epoxy]-morphinan of the formula: containing 4aH-8, 9 c-Iminoethano- phenanthro [4, 5-b, c, d] furan ring systems condensed with carbocyclic rings or ring systems with a bridge between positions 6 and 14 the bridge containing only two carbon atoms
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    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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Abstract

Process for the preparation of a compound represented by following general formula by a dealkylation reaction using a boron trifluoride complex (in the formula, R1 is C1-10 alkyl group or the like, R2 is C1-10 alkyl group or the like, R3 is hydrogen atom or the like, R4 is hydrogen atom or the like, R5 and R6 may be the same or different, and is hydrogen atom or the like, R7 and R8 may be the same or different, and is hydrogen atom or the like, R9 , R10 and R11 may be the same or different, and is hydrogen atom, C1-10 alkyl group or the like, R12 is -C(=O)OR13 group, -C(=O)-R14 group, -C(=O)NR20 R21 group or the like).

Description

嗎啡喃衍生物之製造方法Method for manufacturing morphinan derivatives

本發明有關一種具有丁基原啡因骨架之嗎啡喃衍生物之製造方法。 本申請案依據已於2018年3月30日在日本提出申請之特願2018-68325號主張優先權,並於此援用其內容。The invention relates to a method for manufacturing a morphinan derivative having a butylorphane skeleton. This application claims priority based on Japanese Patent Application No. 2018-68325, which has been filed in Japan on March 30, 2018, and the contents are invoked here.

背景技術 丁基原啡因(Buprenorphine)係針對類鴉片受體之類鴉片部分致效劑(agonist),係一用於鎮痛及治療類鴉片成癮症之化合物。作為鎮痛劑,其首先由Reckitt & Colman公司上市,而就類鴉片成癮症之治療藥而言,其係一高用量錠劑已受美國食品藥物管理局(FDA)認可之化合物。Background technique Buprenorphine is an opioid partial agonist for opioid receptors, and is a compound used for analgesia and treatment of opioid addiction. As an analgesic, it was first marketed by Reckitt & Colman, and for the treatment of opioid addiction, it is a compound whose high dosage lozenges have been approved by the US Food and Drug Administration (FDA).

[化學式1]

Figure 02_image003
[Chemical Formula 1]
Figure 02_image003

以丁基原啡因骨架為先導化合物之衍生物化,迄今仍是藥物化學領域中饒富興味之對象,舉例來說,非專利文獻1報告了已使丁基原啡因之7位轉換之物,其他也有許多探討現正進行中。其中,尤以丁基原啡因骨架之6位羥基作為用以創製PET配體之18F修飾官能基之導入位置而受到矚目。舉例而言,非專利文獻2及非專利文獻3已就丁基原啡因骨架6位導入有18F乙基之PET配體[18F]FBPN等之合成及其性質作出報告。Derivatives using butylorphine as the lead compound are still interesting objects in the field of medicinal chemistry. For example, Non-Patent Document 1 reports the 7-position conversion of butylorphine. There are many others Discussions are ongoing. Among them, butylorphine in particular has attracted attention because the hydroxyl group at the 6-position of the skeleton is used as the introduction position of the 18F modified functional group used to create PET ligands. For example, Non-Patent Document 2 and Non-Patent Document 3 have reported on the synthesis and properties of PET ligand [18F] FBPN, etc. with an 18F ethyl group introduced at the 6-position of butylorphanine skeleton.

[化學式2]

Figure 02_image005
[Chemical Formula 2]
Figure 02_image005

此外,非專利文獻4也以相同途徑,針對丁基原啡因骨架6位導入有11C甲基之PET配體的合成予以報告。 再者,於非專利文獻5中,Srivastava氏等人則於丁基原啡因骨架6位導入胺烷基取代基後,進行以其胺基作為踏板之修飾,而報告了具有丁基原啡因骨架之生化學工具的合成及其應用。In addition, Non-Patent Document 4 also reports the synthesis of PET ligands with an 11C methyl group introduced at the 6-position of the butylorphanine skeleton in the same way. Furthermore, in Non-Patent Document 5, Srivastava et al. introduced an amine alkyl substituent at the 6-position of the butylorphanine skeleton, and then modified the amine group as a pedal, and reported the birth of the butylorphanine skeleton. Synthesis and application of chemical tools.

[化學式3]

Figure 02_image007
[Chemical Formula 3]
Figure 02_image007

此外,Kyle氏等人於專利文獻1中揭示了以疼痛治療藥為目的且於丁基原啡因骨架6位導入有聚醚官能基之衍生物的合成。 就此等丁基原啡因骨架6位經修飾之衍生物的合成而言,不可或缺的是調製出6位羥基呈現無保護且僅有酚性羥基受保護之化合物(A)來作為前驅物。In addition, Kyle et al. disclosed in Patent Document 1 the synthesis of a derivative having a polyether functional group introduced at the 6-position of a butylorphanine skeleton for the purpose of a pain treatment drug. For the synthesis of these modified derivatives of butylorphine at the 6-position of the backbone, it is indispensable to prepare a compound (A) in which the 6-position hydroxyl group is unprotected and only the phenolic hydroxyl group is protected as a precursor.

[化學式4]

Figure 02_image009
[Chemical Formula 4]
Figure 02_image009

上述專利文獻及非專利文獻中,有不少情況是採用下述手法:製得丁基原啡因骨架中具有2個羥基(6位羥基、酚性羥基)之中間產物後,之後再選擇性地僅將酚性羥基予以保護。In the above-mentioned patent documents and non-patent documents, there are many cases where the following method is adopted: after the intermediate product having 2 hydroxyl groups (6-position hydroxyl group, phenolic hydroxyl group) in the butylorphanine skeleton is prepared, and then selectively only Protect phenolic hydroxyl groups.

[化學式5]

Figure 02_image010
[Chemical Formula 5]
Figure 02_image010

此時,用來去除鍵結三級醇之甲基的反應劑必須使用LiAlH4 、三溴化硼等需激烈條件之反應劑及具高毒性、危險性之反應劑,而難以應用在工業生產上。At this time, the reagent used to remove the methyl group of the tertiary alcohol must use LiAlH 4 , boron tribromide and other reagents that require severe conditions and highly toxic and dangerous reagents, which are difficult to apply in industrial production. on.

已知類鴉片受體有μ、δ、κ及ε等幾種次類型存在。對μ受體顯示強烈親和性之嗎啡自古以來即被用作鎮痛藥。然而,類鴉片μ受體致效劑已知會經由μ受體而引起成癮及呼吸抑制等有害現象。 另一方面,已知δ受容體致效劑雖也具有鎮痛作用卻與可見於嗎啡之有害現象無涉。因此,δ受體選擇性致效劑係作為優良鎮痛劑而受期待。It is known that there are several subtypes of opioid receptors such as μ, δ, κ and ε. Morphine, which shows a strong affinity for the μ receptor, has been used as an analgesic since ancient times. However, opioid μ receptor agonists are known to cause harmful phenomena such as addiction and respiratory depression via the μ receptor. On the other hand, it is known that although the delta receptor effector also has analgesic effects, it is not involved in the harmful phenomena that can be seen in morphine. Therefore, the delta receptor selective agonist is expected as an excellent analgesic.

就具有δ受體選擇性致效劑活性之化合物而言,舉例來說,專利文獻2已報告了下式(B)所示之化合物。For compounds having delta receptor selective agonist activity, for example, Patent Document 2 has reported compounds represented by the following formula (B).

[化學式6]

Figure 02_image011
[Chemical Formula 6]
Figure 02_image011

此外,專利文獻3則報告了下式(C)所示化合物。In addition, Patent Document 3 reports a compound represented by the following formula (C).

[化學式7]

Figure 02_image013
[Chemical Formula 7]
Figure 02_image013

由於此等衍生物具有高度之δ受體選擇性及鎮痛作用,而期待應用於鎮痛藥等藥劑上。Since these derivatives have high delta receptor selectivity and analgesic effects, they are expected to be applied to analgesics and other drugs.

於此等報告之中,具有・丁基原啡因骨架之中間產物(j)被設定成用以獲得最終目的物之製造中間產物,可謂(j)即是對應6位羥基呈無保護且僅有酚性羥基受保護之前述(A)的化合物。 此處之製法亦如同專利文獻2之段落[0023]所載,使三溴化硼對(h)發生作用而一次去除2個羥基之甲基,製成二羥基化合物(i)後,選擇性地僅將酚性羥基予以再保護而製得(j)。 亦即,為了製得(j)需要2個步驟,即,一次將(h)之二個甲基完全去除後,選擇性地僅將酚性羥基予以再保護。In these reports, the intermediate product (j) with the butylorphine skeleton was set as the intermediate product for the final purpose. It can be said that (j) corresponds to the 6-position hydroxyl group which is unprotected and contains only phenol The compound of the aforementioned (A) in which the protective hydroxyl group is protected. The preparation method here is also as described in paragraph [0023] of Patent Document 2. The boron tribromide acts on (h) to remove the methyl groups of two hydroxyl groups at a time to form a dihydroxy compound (i). (J) is prepared by reprotecting only the phenolic hydroxyl group. That is, in order to obtain (j), two steps are required, that is, after the two methyl groups of (h) are completely removed at once, only the phenolic hydroxyl group is selectively reprotected.

[化學式8]

Figure 02_image015
[Chemical Formula 8]
Figure 02_image015

由於嗎啡喃衍生物之製造需要較專利文獻2更多階段之反應,儘可能短工序且高產率地製得各中間產物一事變得相當重要,為了從上述(h)得到(j)而耗費2個步驟顯然在經濟面上也甚不利。 因此,開拓出可從(h)之二個甲氧基中選擇性地僅去除非酚性羥基之甲基而藉1個步驟即直接獲得(j)的反應路徑,即可解決此一問題,可說是提示了對於此等領域甚是有用之方法論。Since the production of morphinan derivatives requires more stages of reaction than Patent Document 2, it becomes very important to produce each intermediate product in the shortest possible process and at a high yield, and it takes 2 to obtain (j) from (h) above. This step is obviously very economically disadvantageous. Therefore, this problem can be solved by developing a reaction path that can directly remove the methyl group of non-phenolic hydroxyl group from the two methoxy groups of (h) and directly obtain (j) in one step. It can be said to suggest a very useful methodology for these fields.

就此種選擇性之脫甲基化反應而言,舉例來說,非專利文獻4報告了下式所示方法。For such a selective demethylation reaction, for example, Non-Patent Document 4 reports a method represented by the following formula.

[化學式9]

Figure 02_image016
[Chemical Formula 9]
Figure 02_image016

此外,就習知技術而言,雖然於高溫下利用鹽酸進行自烷氧基之脫甲基化反應已為人所知,但就具有丁基原啡因骨架之衍生物而言,因其也會進行基本骨架之開環反應,故而無法獲得目的化合物。 如此,由於此等反應所使用之試劑的反應性極高,而有化合物中存有其他官能基時除了目的之脫甲基化反應以外也會進行損及其他官能基之副反應而無法獲得目的化合物等問題,可適用於反應之化合物受限而缺乏汎用性。 因此,就丁基原啡因衍生物之製造中間產物(A)或(j)的製造方法而言,乃冀望開拓出一種可在溫和條件下具汎用性且高產率地從鍵結於三級碳之烷氧基選擇性地進行脫烷基化而不損及保護酚性羥基之烷基、且僅需1個步驟的方法。 先行技術文獻 專利文獻In addition, as far as the conventional technology is concerned, although the demethylation reaction from the alkoxy group using hydrochloric acid at a high temperature is known, as for the derivative having a butylorphanine skeleton, it also proceeds The ring-opening reaction of the basic skeleton makes it impossible to obtain the target compound. In this way, due to the extremely high reactivity of the reagents used in these reactions, and the presence of other functional groups in the compound, in addition to the demethylation reaction of the purpose, side reactions that damage the other functional groups will proceed and the purpose cannot be obtained. Compounds and other issues can be applied to the reaction of the compound is limited and lacks versatility. Therefore, in terms of the production method of the intermediate product (A) or (j) for the production of butylorphanine derivatives, it is hoped to develop a method that can be used under mild conditions with universality and high yield from bonding to tertiary carbon The alkoxy group is selectively dealkylated without damaging the alkyl group protecting the phenolic hydroxyl group, and requires only one step. Advanced technical literature Patent Literature

[專利文獻1]國際公開第2012/038813號小冊 [專利文獻2]國際公開第2013/035833號小冊 [專利文獻3]國際公開第2014/136305號小冊 非專利文獻[Patent Literature 1] International Publication No. 2012/038813 [Patent Literature 2] International Publication No. 2013/035833 [Patent Document 3] International Publication No. 2014/136305 Non-patent literature

[非專利文獻1]HELVETICA CHMICA ACTA Vol.83, 3122-3130 [非專利文獻2]J. Med. Chem, 57, 5464-5469. 2014 [非專利文獻3]Molecules, 18, 7271-7278. 2013 [非專利文獻4]Tetrahedron Letters, 28(35), 4015-18. 1987 [非專利文獻5]Tetrahedron, 72(40),6127-6135. 2016 [非專利文獻6]Protective Groups in Organic Synthesis, 1991[Non-Patent Document 1] HELVETICA CHMICA ACTA Vol. 83, 3122-3130 [Non-Patent Document 2] J. Med. Chem, 57, 5464-5469. 2014 [Non-Patent Document 3] Molecules, 18, 7271-7278. 2013 [Non-Patent Document 4] Tetrahedron Letters, 28(35), 4015-18. 1987 [Non-Patent Document 5] Tetrahedron, 72(40), 6127-6135. 2016 [Non-Patent Document 6] Protective Groups in Organic Synthesis, 1991

發明概要 發明欲解決之課題 本發明之目的在於提供一種用以製造具丁基原啡因骨架之嗎啡喃衍生物之中間產物製造方法。 用以解決課題之手段Summary of the invention Problems to be solved by invention The object of the present invention is to provide an intermediate product manufacturing method for manufacturing a morphinan derivative having a butylorphanine skeleton. Means to solve the problem

於上述實情下,本案發明人等針對前述中間產物製造方法精心進行探討,結果發現,可藉由在適切之溶劑中使用三氟化硼錯合物而選擇性地從鍵結於三級碳之烷氧基進行脫烷基化反應且不損及保護酚性羥基之烷基,而終至完成本發明。 [1]亦即,本發明之一態樣有關下列通式(II)所示之化合物之製造方法,包含使下列化合物(I)與三氟化硼錯合物於溶劑中反應之步驟;Based on the above facts, the inventors of the present application have carefully discussed the aforementioned intermediate product manufacturing method, and found that the boron trifluoride complex can be selectively used from the bond to the tertiary carbon by using a boron trifluoride complex in a suitable solvent. The alkoxy group undergoes a dealkylation reaction without compromising the alkyl group protecting the phenolic hydroxyl group, and finally the present invention is completed. [1] That is, one aspect of the present invention relates to a method for producing a compound represented by the following general formula (II), which includes the step of reacting the following compound (I) with boron trifluoride complex in a solvent;

[化學式11]

Figure 02_image018
(式中,R1 、R3 ~R12 同後所示); [化學式10]
Figure 02_image001
(式中,R1 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之至少1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C3-6 環烷基、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5); R2 表示可具有取代基之C1-10 烷基、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)或可具有取代基之C2-6 烯基; R3 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5); R4 表示氫原子、可具有取代基之C1-10 烷基、-OR22 基(R22 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之芳基或可具有取代基之C1-6 烷醯基)、鹵素原子、氰基、胺甲醯基、可具有取代基之醯基、硝基及可具有取代基之胺基; R5 及R6 相同或互異,表示氫原子、氟原子或羥基; R7 及R8 相同或互異,表示氫原子、氟原子或羥基,或者,R7 及R8 與其所鍵結之碳共同表示羰基); R9 、R10 、R11 相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5),或者,R9 與R10 鍵結而表示可具有取代基之C3-6 飽和烴環,R9 及R10 中任一者與R11 鍵結而表示可具有取代基之C3-6 飽和烴環或可具有取代基之C3-6 環烯烴; R12 表示-C(=O)OR13 基(R13 表示氫原子、可具有取代基之C1-10 烷基或羧基保護基)、-C(=O)-R14 基(R14 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5))、-OR15 基(R15 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之芳基、可具有取代基之雜芳基或羥基保護基)、-NR16 R17 基(R16 與R17 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之C6-10 芳基、可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5))、或胺基保護基、-C(OR15 )R18 R19 基(R18 與R19 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基)、或-C(NR16 R17 )R18 R19 基(R16 、R17 、R18 、R19 同前所示)、-C(=O)NR20 R21 基(R20 與R21 相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之芳烯基(芳基部分之碳原子數為6~10,烯基部分之碳原子數表示2~6)、可具有取代基之雜芳烯基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,烯基部分之碳原子數表示2~6)、可具有取代基之環烷基烯基(環烷基部分之碳原子數為3~6,烯基部分之碳原子數表示2~6)、可具有取代基之C4-6 環烯基、可具有取代基之環烯基烷基(環烯基部分之碳原子數為4~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之環烯基烯基(環烯基部分之碳原子數為4~6,烯基部分之碳原子數表示2~6)、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5);或者,R20 與R21 鍵結而表示可具有取代基且4~8員環之環狀胺基,或,R20 及R21 中任一者可與R9 、R10 及R11 中任一者共同形成可具有取代基之內醯胺環)。 [2]本發明之另一態樣有關前述[1]之製造方法,其中R1 為選自下列之取代基:可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。 [3]本發明之另一態樣有關前述[1]或[2]之製造方法,其中R4 為氫原子或鹵素原子。 [4]本發明之另一態樣有關前述[1]至[3]中任一項之製造方法,其中R5 及R6 為氫原子。 [5]本發明之另一態樣有關前述[1]至[4]中任一項之製造方法,其中R7 及R8 為氫原子。 [6]本發明之另一態樣有關前述[1]至[5]中任一項之製造方法,其中R9 為氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。 [7]本發明之另一態樣有關前述[1]至[6]中任一項之製造方法,其中R10 為氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。 [8]本發明之另一態樣有關前述[1]至[7]中任一項之製造方法,其中R11 為氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。 [9]本發明之另一態樣有關前述[1]至[8]中任一項之製造方法,其中R12 為-C(=O)OR13 基、-C(=O)-R14 基、-OR15 基、-NR16 R17 基、-C(OH)R18 R19 基、-C(NR16 R17 )R18 R19 基或-C(=O)NR20 R21 基(R13 ~R20 及R21 同前所示)。 [10]本發明之另一態樣有關前述[1]至[9]中任一項之製造方法,其中R3 為可具有取代基之C1-10 烷基。 [11]本發明之另一態樣有關前述[1]至[10]中任一項之製造方法,其中R2 為可具有取代基之C1-10 烷基。 [12]本發明之另一態樣有關前述[1]至[11]中任一項之製造方法,其中前述通式(II)所示化合物係選自下列編號1~48所示化合物之化合物或其鹽。 [化學式12]
Figure 02_image020
[化學式13]
Figure 02_image022
[化學式14]
Figure 02_image024
[化學式15]
Figure 02_image026
[化學式16]
Figure 02_image028
[化學式17]
Figure 02_image030
[化學式18]
Figure 02_image032
[化學式19]
Figure 02_image034
[化學式20]
Figure 02_image036
[化學式21]
Figure 02_image038
[13]本發明之另一態樣有關前述[1]至[12]中任一項之製造方法,其中前述通式(I)所載化合物為酸加成鹽之形態。 [14]本發明之另一態樣有關前述[13]之製造方法,其中如前述[13]之酸加成鹽選自礦酸類、有機羧酸類或磺酸類。 [15]本發明之另一態樣有關前述[13]或[14]之製造方法,其中如前述[13]或[14]之酸加成鹽選自鹽酸、硫酸、甲酸、草酸、乙酸、檸檬酸、三氯乙酸、三氟乙酸、順丁烯二酸、反丁烯二酸、甲磺酸、苯磺酸、對甲苯磺酸、均三甲苯磺酸或萘磺酸。 [16]本發明之另一態樣有關前述[1]至[15]中任一項之製造方法,其中如前述[1]之三氟化硼錯合物選自三氟化硼-醚錯合物、三氟化硼-水錯合物、三氟化硼-醇錯合物、三氟化硼-胺錯合物、三氟化硼-酚錯合物、三氟化硼-硫化物錯合物、三氟化硼-亞碸錯合物、三氟化硼-羧酸錯合物或三氟化硼-磷酸錯合物等。 [17]本發明之另一態樣有關前述[16]之製造方法,其中如前述[16]之三氟化硼錯合物選自三氟化硼-醚錯合物、三氟化硼-醇錯合物或三氟化硼-羧酸錯合物。 [18]本發明之另一態樣有關前述[1]至[17]中任一項之製造方法,其使用相對於前述化合物(I)為1~50重量倍之三氟化硼錯合物。 [19]本發明之另一態樣有關前述[1]至[18]中任一項之製造方法,其中前述溶劑選自羧酸類、羧酸酯類、醇類、烴類、鹵烷類、腈類、醚類、酮類、醯胺類、亞碸類、脲類或碳酸酯類。 [20]本發明之另一態樣有關前述[19]之製造方法,其中前述溶劑選自羧酸類、烴類、腈類或醚類。 [21]本發明之另一態樣有關前述[19]或[20]之製造方法,其中前述溶劑選自乙酸、乙腈、甲苯或二甲苯。 [22]本發明之另一態樣有關前述[1]至[21]中任一項之製造方法,其使前述化合物(I)與三氟化硼錯合物於溶劑中反應時之反應溫度為20~150℃之範圍。 [23]本發明之另一態樣有關前述通式(I)所示化合物之酸加成鹽。 發明效果[Chemical Formula 11]
Figure 02_image018
(In the formula, R 1 and R 3 ~R 12 are the same as shown later); [Chemical formula 10]
Figure 02_image001
(In the formula, R 1 represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a cycloalkyl alkyl group which may have a substituent (the number of carbon atoms of the cycloalkyl portion is 3 to 6, and the alkylene portion The number of carbon atoms represents 1 to 5), the aralkyl group which may have a substituent (the number of carbon atoms of the aryl portion is 6 to 10, and the number of carbon atoms of the alkylene portion represents 1 to 5), which may have a substituent Heteroaralkyl (heteroaryl contains at least 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5), C which may have a substituent 3-6 cycloalkyl, optionally substituted C 2-6 alkenyl, optionally substituted C 6-10 aryl, or optionally substituted heteroaryl (heteroaryl includes selected from N, O and 1 to 4 heteroatoms in S are used as ring constituent atoms, and the number of carbon atoms in the alkylene extension means 1 to 5); R 2 represents a C 1-10 alkyl group which may have a substituent, and an aralkyl which may have a substituent Group (the number of carbon atoms in the aryl part is 6~10, and the number of carbon atoms in the alkylene part represents 1~5), heteroaralkyl which may have a substituent (heteroaryl includes selected from N, O and S 1 to 4 heteroatoms are used as ring constituent atoms, the number of carbon atoms in the alkylene moiety represents 1 to 5) or C 2-6 alkenyl which may have a substituent; R 3 represents a hydrogen atom, C which may have a substituent 1-10 alkyl groups, cycloalkylalkyl groups which may have substituents (the number of carbon atoms in the cycloalkyl portion is 3 to 6, and the number of carbon atoms in the alkylene portion represents 1 to 5), aromatic groups which may have substituents Alkyl groups (the number of carbon atoms in the aryl group is 6-10, and the number of carbon atoms in the alkylene group represents 1~5), heteroaralkyl groups that may have substituents (heteroaryl groups include selected from N, O, and S Among them, 1 to 4 heteroatoms are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5), C 2-6 alkenyl which may have a substituent, C 6-10 aryl which may have a substituent Or a heteroaryl group which may have a substituent (the heteroaryl group contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5); R 4 Represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, -OR 22 group (R 22 represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, an aryl group which may have a substituent, or may have a substitution C 1-6 alkyl amide group), halogen atom, cyano group, amine methyl amide group, optionally substituted acetyl group, nitro group and optionally substituted amine group; R 5 and R 6 are the same or different , Represents a hydrogen atom, a fluorine atom or a hydroxyl group; R 7 and R 8 are the same or different from each other, represent a hydrogen atom, a fluorine atom or a hydroxyl group, or R 7 and R 8 together with the carbon to which they are bonded represent a carbonyl group); R 9 , R 10 and R 11 are the same or different from each other, and represent a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C 3-6 cycloalkyl group that may have a substituent, and a cycloalkyl alkyl group that may have a substituent ( The number of carbon atoms in the cycloalkyl moiety is 3~6, and the number of carbon atoms in the alkylene moiety indicates 1~5), aralkyl group (aryl moiety) which may have a substituent The number of carbon atoms is 6~10, and the number of carbon atoms in the alkylene portion represents 1~5), heteroaralkyl groups which may have substituents (heteroaryl groups include 1~4 selected from N, O and S Heteroatoms as ring-forming atoms, the number of carbon atoms in the alkylene moiety represents 1 to 5), a C 6-10 aryl group which may have a substituent, or a heteroaryl group which may have a substituent (the heteroaryl group includes a member selected from N 1 to 4 heteroatoms in O, S are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5), or R 9 and R 10 are bonded to represent C 3- which may have a substituent 6 saturated hydrocarbon ring, any one of R 9 and R 10 is bonded to R 11 to represent a C 3-6 saturated hydrocarbon ring which may have a substituent or a C 3-6 cycloalkene which may have a substituent; R 12 represents- C(=O)OR 13 group (R 13 represents a hydrogen atom, a C 1-10 alkyl group or a carboxyl protecting group which may have a substituent), -C(=O)-R 14 group (R 14 represents a hydrogen atom, may C 1-10 alkyl group with substituents, C 6-10 aryl group with substituents or heteroaryl group with substituents (heteroaryl groups include 1 to 4 hetero groups selected from N, O and S Atoms are ring-constituting atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5)), -OR 15 groups (R 15 represents a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C group that may have a substituent 3-6 cycloalkyl, optionally substituted aryl, optionally substituted heteroaryl or hydroxy protecting group), -NR 16 R 17 group (R 16 and R 17 may be the same or different from each other, indicating a hydrogen atom , C 1-10 alkyl which may have a substituent, C 3-6 cycloalkyl which may have a substituent, C 6-10 aryl which may have a substituent, heteroaryl which may have a substituent (heteroaryl Contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5)), or an amine protecting group, -C(OR 15 )R 18 R 19 group (R 18 and R 19 may be the same or different from each other, and represent a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C 3-6 cycloalkyl group that may have a substituent, a C that may have a substituent 6-10 aryl or heteroaryl which may have a substituent), or -C (NR 16 R 17 ) R 18 R 19 group (R 16 , R 17 , R 18 , R 19 are the same as shown above), -C (=O)NR 20 R 21 group (R 20 is the same as or different from R 21 and represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a C 3-6 cycloalkyl group which may have a substituent, may Cycloalkylalkyl groups with substituents (the number of carbon atoms in the cycloalkyl portion is 3 to 6, and the number of carbon atoms in the alkylene portion represents 1 to 5), aralkyl groups that may have substituents (the aryl portion The number of carbon atoms is 6~10, and the number of carbon atoms in the alkylene moiety represents 1~5), heteroaralkyl groups which may have substituents (heteroaryl groups include 1 to 4 hetero groups selected from N, O and S Atoms as rings constitute atoms, alkylene The number of carbon atoms in the base portion represents 1 to 5), C 2-6 alkenyl group which may have a substituent, aralkenyl group which may have a substituent (the carbon number of the aryl portion is 6 to 10, the carbon of the alkenyl portion The number of atoms represents 2 to 6), a heteroarylalkenyl group which may have a substituent (the heteroaryl group contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkenyl part represents 2~6), cycloalkylalkenyl which may have a substituent (the number of carbon atoms in the cycloalkyl portion is 3-6, and the number of carbon atoms in the alkenyl portion represents 2-6), C 4- which may have a substituent 6 cycloalkenyl, cycloalkenyl alkyl which may have a substituent (the number of carbon atoms in the cycloalkenyl part is 4 to 6, and the number of carbon atoms in the alkylene part represents 1 to 5), cycloalkene which may have a substituent Alkenyl (the number of carbon atoms in the cycloalkenyl part is 4 to 6, and the number of carbon atoms in the alkenyl part represents 2 to 6), aryl which may have a substituent, or heteroaryl which may have a substituent (heteroaryl Contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5); or, R 20 and R 21 are bonded to indicate that they may have a substituent In addition, a cyclic amine group having 4 to 8 member rings, or any one of R 20 and R 21 may be combined with any one of R 9 , R 10 and R 11 to form an internal amide ring which may have a substituent). [2] Another aspect of the present invention relates to the manufacturing method of the aforementioned [1], wherein R 1 is a substituent selected from the group consisting of a C 1-10 alkyl group which may have a substituent, and a cycloalkyl group which may have a substituent Alkyl groups (the number of carbon atoms in the cycloalkyl part is 3~6, and the number of carbon atoms in the alkylene part represents 1~5), aralkyl groups which may have substituents (the number of carbon atoms in the aryl part is 6~10) , The number of carbon atoms in the alkylene moiety represents 1 to 5), a C 2-6 alkenyl group that may have a substituent, a C 6-10 aryl group that may have a substituent, or a heteroaryl group that may have a substituent (heteroaryl) The group contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5). [3] Another aspect of the present invention relates to the manufacturing method of the aforementioned [1] or [2], wherein R 4 is a hydrogen atom or a halogen atom. [4] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [3], wherein R 5 and R 6 are hydrogen atoms. [5] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [4], wherein R 7 and R 8 are hydrogen atoms. [6] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [5], wherein R 9 is a hydrogen atom, a C 1-10 alkyl group which may have a substituent, which may have a substituent Cycloalkyl, aryl which may have a substituent, or heteroaryl which may have a substituent (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, alkylene moiety The number of carbon atoms represents 1~5). [7] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [6], wherein R 10 is a hydrogen atom, a C 1-10 alkyl group which may have a substituent, which may have a substituent Cycloalkyl, aryl which may have a substituent, or heteroaryl which may have a substituent (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, alkylene moiety The number of carbon atoms represents 1~5). [8] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [7], wherein R 11 is a hydrogen atom, a C 1-10 alkyl group which may have a substituent, which may have a substituent Cycloalkyl, aryl which may have a substituent, or heteroaryl which may have a substituent (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, alkylene moiety The number of carbon atoms represents 1~5). [9] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [8], wherein R 12 is -C(=O)OR 13 group, -C(=O)-R 14 Group, -OR 15 group, -NR 16 R 17 group, -C(OH)R 18 R 19 group, -C(NR 16 R 17 )R 18 R 19 group or -C(=O)NR 20 R 21 group (R 13 ~R 20 and R 21 are the same as before). [10] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [9], wherein R 3 is a C 1-10 alkyl group which may have a substituent. [11] Another aspect of the present invention relates to the production method of any one of the aforementioned [1] to [10], wherein R 2 is a C 1-10 alkyl group which may have a substituent. [12] Another aspect of the present invention relates to the production method of any one of the aforementioned [1] to [11], wherein the compound represented by the general formula (II) is a compound selected from the following compounds represented by Nos. 1 to 48 Or its salt. [Chemical Formula 12]
Figure 02_image020
[Chemical Formula 13]
Figure 02_image022
[Chemical Formula 14]
Figure 02_image024
[Chemical Formula 15]
Figure 02_image026
[Chemical Formula 16]
Figure 02_image028
[Chemical Formula 17]
Figure 02_image030
[Chemical Formula 18]
Figure 02_image032
[Chemical Formula 19]
Figure 02_image034
[Chemical Formula 20]
Figure 02_image036
[Chemical Formula 21]
Figure 02_image038
[13] Another aspect of the present invention relates to the production method of any one of the aforementioned [1] to [12], wherein the compound contained in the aforementioned general formula (I) is in the form of an acid addition salt. [14] Another aspect of the present invention relates to the manufacturing method of the aforementioned [13], wherein the acid addition salt as described in the aforementioned [13] is selected from mineral acids, organic carboxylic acids or sulfonic acids. [15] Another aspect of the present invention relates to the manufacturing method of the aforementioned [13] or [14], wherein the acid addition salt as described in the aforementioned [13] or [14] is selected from hydrochloric acid, sulfuric acid, formic acid, oxalic acid, acetic acid, Citric acid, trichloroacetic acid, trifluoroacetic acid, maleic acid, fumaric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, mesitylenesulfonic acid or naphthalenesulfonic acid. [16] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [15], wherein the boron trifluoride complex as described in the aforementioned [1] is selected from boron trifluoride-ether complex Compound, boron trifluoride-water complex, boron trifluoride-alcohol complex, boron trifluoride-amine complex, boron trifluoride-phenol complex, boron trifluoride-sulfide Complex, boron trifluoride-sulfonate complex, boron trifluoride-carboxylic acid complex or boron trifluoride-phosphate complex, etc. [17] Another aspect of the present invention relates to the manufacturing method of the aforementioned [16], wherein the boron trifluoride complex of the aforementioned [16] is selected from boron trifluoride-ether complex, boron trifluoride- Alcohol complex or boron trifluoride-carboxylic acid complex. [18] Another aspect of the present invention relates to the manufacturing method of any one of the aforementioned [1] to [17], which uses a boron trifluoride complex of 1 to 50 times the weight of the compound (I) . [19] Another aspect of the present invention relates to the production method of any one of the aforementioned [1] to [18], wherein the aforementioned solvent is selected from carboxylic acids, carboxylic acid esters, alcohols, hydrocarbons, haloalkanes, Nitriles, ethers, ketones, amides, sulfonamides, ureas or carbonates. [20] Another aspect of the present invention relates to the manufacturing method of the aforementioned [19], wherein the aforementioned solvent is selected from carboxylic acids, hydrocarbons, nitriles or ethers. [21] Another aspect of the present invention relates to the manufacturing method of the aforementioned [19] or [20], wherein the aforementioned solvent is selected from acetic acid, acetonitrile, toluene or xylene. [22] Another aspect of the present invention relates to the production method of any one of the aforementioned [1] to [21], which is a reaction temperature when the aforementioned compound (I) and boron trifluoride complex are reacted in a solvent It is in the range of 20~150℃. [23] Another aspect of the present invention relates to an acid addition salt of the compound represented by the aforementioned general formula (I). Invention effect

本發明使用三氟化硼錯合物且利用自嗎啡喃衍生物(I)之選擇性脫烷基化反應來進行化合物(II)之製造,相對於習知方法需要2個步驟,以1個步驟即可以高產率獲得目的化合物且顯示出高度汎用性,而可廣泛利用於製造嗎啡喃衍生物。The present invention uses boron trifluoride complex and utilizes selective dealkylation reaction from morphinan derivative (I) to produce compound (II), which requires 2 steps, 1 In this step, the target compound can be obtained in high yield and shows a high degree of versatility, and it can be widely used in the production of morphinan derivatives.

[化學式22]

Figure 02_image040
(式中,R1 ~R12 同前所示,L表示鹵素原子(例如溴原子、碘原子)、甲磺醯氧基或對甲苯磺醯氧基等脫離基)。[Chemical Formula 22]
Figure 02_image040
(In the formula, R 1 to R 12 are as described above, and L represents a halogen atom (for example, bromine atom, iodine atom), mesyloxy group, p-toluenesulfonyloxy group, or other leaving group).

用以實施發明之形態 接著更詳細說明本發明如下。 上述通式(I)及(II)所示之嗎啡喃衍生物、該化合物之互變異構物、立體異構物或其藥學上可接受之鹽或者其等之溶劑合物之中,較佳者可列舉如下。此外,氘及13 C等安定同位素也包含在內。 R1 ~R4 、R9 ~R11 及R13 所示可具有取代基之C1-10 烷基中,C1-10 烷基可舉如甲基、乙基、正丙基、異丙基、正丁基、異丁基、三級丁基、戊基、己基、庚基或辛基等直鏈或支鏈狀烷基,且宜舉如C1-6 烷基,較宜舉如C1-3 烷基,更宜舉如甲基。 此外,此等烷基可經氘化,經氘化之烷基可舉如甲基-d3或乙基-1,1-d2、乙基-d5等。 前述烷基中之取代基可舉如第[0054]段所載之物,但宜舉如羥基或鹵素原子(更宜氟原子),例如2-氟乙基、3-氟丙基、4-氟丁基、2-羥乙基或三氟甲基等。The form for carrying out the invention will be explained in more detail as follows. Among the morphinan derivatives represented by the above general formulas (I) and (II), tautomers, stereoisomers of the compounds or pharmaceutically acceptable salts thereof or solvates thereof, preferably Those can be listed as follows. In addition, stable isotopes such as deuterium and 13 C are also included. R 1 ~ R 4, R 9 ~ R 11 and R 13 group shown may have a substituent of C 1-10 alkyl, C 1-10 alkyl may be cited methyl, ethyl, n-propyl, isopropyl, Straight-chain or branched-chain alkyl groups such as alkyl, n-butyl, isobutyl, tertiary butyl, pentyl, hexyl, heptyl or octyl, and preferably C 1-6 alkyl, more preferably such as C 1-3 alkyl, more preferably methyl. In addition, such alkyl groups may be deuterated. Examples of deuterated alkyl groups include methyl-d3, ethyl-1,1-d2, and ethyl-d5. The substituent in the aforementioned alkyl group may be as described in paragraph [0054], but is preferably exemplified by a hydroxyl group or a halogen atom (more preferably a fluorine atom), for example, 2-fluoroethyl, 3-fluoropropyl, 4- Fluorobutyl, 2-hydroxyethyl or trifluoromethyl.

R1 、R9 ~R11 、R15 ~R20 及R21 所示可具有取代基之C3-6 環烷基中,C3-6 環烷基可舉如環丙基、環丁基、環戊基或環己基等,且宜舉如環丙基。 Among the C 3-6 cycloalkyl groups which may have substituents represented by R 1 , R 9 to R 11 , R 15 to R 20 and R 21 , C 3-6 cycloalkyl groups may be exemplified by cyclopropyl and cyclobutyl , Cyclopentyl or cyclohexyl, etc., and preferably such as cyclopropyl.

R1 、R3 、R9 ~R11 、R20 及R21 所示可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)中,環烷基烷基可舉如經環丙基、環丁基、環戊基或環己基等C3-6 環烷基取代之甲基及乙基等,且宜舉如環丙基甲基、環丙基乙基、環丁基甲基或環丁基乙基等,更宜舉如環丙基甲基。 此外,環烷基烷基可經氘化,可舉例如(環丙基-d5)甲基或環丙基甲基-d2基等。R 1 , R 3 , R 9 to R 11 , R 20 and R 21 may have a substituted cycloalkylalkyl group (the number of carbon atoms of the cycloalkyl portion is 3 to 6, the carbon atoms of the alkylene portion The numbers represent 1 to 5). The cycloalkylalkyl group may include methyl and ethyl groups substituted with C 3-6 cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, or cyclohexyl groups, and the Examples thereof include cyclopropylmethyl, cyclopropylethyl, cyclobutylmethyl or cyclobutylethyl, and more preferred examples include cyclopropylmethyl. In addition, the cycloalkylalkyl group may be deuterated, and examples thereof include (cyclopropyl-d5)methyl or cyclopropylmethyl-d2 groups.

R20 及R21 所示可具有取代基之環烷基烯基(環烷基部分之碳原子數為3~6,烯基部分之碳原子數表示2~6)中,環烷基烯基可舉如經環丙基、環丁基、環戊基或環己基等C3-6 環烷基取代之2-丙烯基或3-甲基-2-丁烯基等。 In the cycloalkylalkenyl group which may have a substituent represented by R 20 and R 21 (the number of carbon atoms in the cycloalkyl portion is 3 to 6, and the number of carbon atoms in the alkenyl portion represents 2 to 6), the cycloalkylalkenyl group Examples thereof include 2-propenyl or 3-methyl-2-butenyl substituted with C 3-6 cycloalkyl such as cyclopropyl, cyclobutyl, cyclopentyl or cyclohexyl.

R20 及R21 所示可具有取代基之環烯基烷基(環烯基部分之碳原子數為4~6,伸烷基部分之碳原子數表示1~5)中,環烯基烷基可舉如經環戊烯基或環己烯基等取代之甲基或乙基等。 In the cycloalkenyl alkyl group which may have a substituent represented by R 20 and R 21 (the number of carbon atoms in the cycloalkenyl portion is 4 to 6, and the number of carbon atoms in the alkylene portion represents 1 to 5), the cycloalkenyl alkyl group Examples of the group include methyl or ethyl substituted with cyclopentenyl or cyclohexenyl.

R20 及R21 所示可具有取代基之環烯基烯基(環烯基部分之碳原子數為4~6,烯基部分之碳原子數表示2~6)中,環烯基烯基可舉如經環戊烯基或環己烯基等取代之2-丙烯基或3-甲基-2-丁烯基等。Among the optionally substituted cycloalkenylalkenyl groups represented by R 20 and R 21 (the number of carbon atoms in the cycloalkenyl portion is 4 to 6, and the number of carbon atoms in the alkenyl portion represents 2 to 6), the cycloalkenyl alkenyl group Examples include 2-propenyl or 3-methyl-2-butenyl substituted with cyclopentenyl or cyclohexenyl.

R1 ~R3 、R9 ~R11 、R20 及R21 所示可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)中,芳烷基可舉如經苯基或萘基等取代之甲基或乙基等,且宜舉如經苯基取代之甲基。R 1 ~R 3 , R 9 ~R 11 , R 20 and R 21 may be substituted aralkyl groups (the number of carbon atoms in the aryl part is 6~10, and the number of carbon atoms in the alkylene part indicates 1 In ~5), the aralkyl group can be exemplified by methyl or ethyl substituted with phenyl or naphthyl, etc., and preferably exemplified by methyl substituted with phenyl.

R20 及R21 所示可具有取代基之芳烯基(芳基部分之碳原子數為6~10,烯基部分之碳原子數表示2~6)中,芳烯基可舉如經苯基或萘基等取代之2-丙烯基或3-甲基-2-丁烯基等。The arylalkenyl group which may have a substituent represented by R 20 and R 21 (the carbon number of the aryl part is 6-10, and the carbon number of the alkenyl part represents 2-6), the arylalkenyl group may be exemplified by benzene 2-propenyl or 3-methyl-2-butenyl substituted with alkyl or naphthyl.

R1 ~R3 、R9 ~R11 、R20 及R21 所示可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數為1~5)中,雜芳烷基可舉如:雜芳基之環構成原子數為5~10之(吡啶-2-基)甲基、(吡啶-3-基)甲基、(吡啶-4-基)甲基、2-(吡啶-2-基)乙基、(呋喃-2-基)甲基、(呋喃-3-基)甲基、(咪唑-2-基)甲基、(咪唑-4-基)甲基、(咪唑-5-基)甲基、(噻唑-2-基)甲基、(噻唑-4-基)甲基、(噻唑-5-基)甲基、(噻吩2-基)甲基、2-(噻吩-2-基)乙基或(1H-四唑-5-基)甲基等單環雜芳烷基;以及(喹啉-3-基)甲基或(吲哚-3-基)甲基等二環雜芳烷基。R 1 to R 3 , R 9 to R 11 , R 20 and R 21 may have a heteroaralkyl group which may have a substituent (the heteroaryl group contains 1 to 4 hetero atoms selected from N, O and S as a ring Constituent atoms, the number of carbon atoms in the alkylene extending portion is 1~5), heteroaralkyl groups can be exemplified by: the ring of heteroaryl group constitutes (pyridin-2-yl)methyl group having 5-10 atoms, ( Pyridin-3-yl)methyl, (pyridin-4-yl)methyl, 2-(pyridin-2-yl)ethyl, (furan-2-yl)methyl, (furan-3-yl)methyl , (Imidazol-2-yl)methyl, (imidazol-4-yl)methyl, (imidazol-5-yl)methyl, (thiazol-2-yl)methyl, (thiazol-4-yl)methyl , (Thiazol-5-yl)methyl, (thiophen-2-yl)methyl, 2-(thiophen-2-yl)ethyl or (1H-tetrazol-5-yl)methyl and other monocyclic heteroarane Groups; and bicyclic heteroaralkyl groups such as (quinolin-3-yl)methyl or (indol-3-yl)methyl.

R20 及R21 所示可具有取代基之雜芳烯基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,烯基部分之碳原子數表示2~6)中,雜芳烯基可舉如經吡啶基、呋喃基、咪唑基或噻唑基等取代之2-丙烯基或3-甲基-2-丁烯基等。The heteroarylalkenyl group which may have a substituent represented by R 20 and R 21 (the heteroaryl group contains 1 to 4 hetero atoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkenyl part represents 2 In ~6), the heteroarylalkenyl group includes 2-propenyl or 3-methyl-2-butenyl substituted with pyridyl, furyl, imidazolyl, or thiazolyl.

R20 及R21 所示可具有取代基之C4-6 環烯基中,C4-6 環烯基宜舉如環戊烯基或環己烯基等。 Among the C 4-6 cycloalkenyl groups which may have a substituent represented by R 20 and R 21 , the C 4-6 cycloalkenyl group is preferably cyclopentenyl or cyclohexenyl.

R1 ~R3 、R20 及R21 所示可具有取代基之C2-6 烯基中,C2-6 烯基可舉如2-丙烯基或3-甲基-2-丁烯基等,且宜舉如2-丙烯基等。 Among the C 2-6 alkenyl groups which may have a substituent represented by R 1 to R 3 , R 20 and R 21 , the C 2-6 alkenyl group may be exemplified by 2-propenyl or 3-methyl-2-butenyl Etc., and preferably such as 2-propenyl.

R9 與R10 、或者R9 及R10 中任一者與R11 鍵結而形成之可具有取代基之C3-6 飽和烴環中,C3-6 飽和烴環可舉如環丙烷環、環丁烷環、環戊烷環或環己烷環等。In the C 3-6 saturated hydrocarbon ring which may be substituted by R 9 and R 10 , or any of R 9 and R 10 bonded to R 11 , the C 3-6 saturated hydrocarbon ring may be exemplified by cyclopropane Ring, cyclobutane ring, cyclopentane ring or cyclohexane ring, etc.

R20 或R21 與R9 、R10 及R11 中任一者共同形成之可具有取代基之內醯胺環中,內醯胺環可舉如δ-內醯胺或γ-內醯胺。R 20 or R 21 and any one of R 9 , R 10 and R 11 may form an internal amide ring which may have a substituent, and the internal amide ring may be exemplified by δ-lactam or γ-lactam .

R9 及R10 中任一者與R11 鍵結而形成之可具有取代基之C3-6 環烯烴中,C3-6 環烯烴可舉如環戊烯或環己烯等。R 9 and R 10 and any one of R 11 may be bonded to form the cyclic olefin having 3-6 substituents of the group C, C 3-6 cyclic olefins such as cyclopentene, may be cited cyclohexene or the like.

R1 、R3 、R9 ~R11 、R14 ~R20 及R21 所示可具有取代基之C6-10 芳基中,C6-10 芳基可舉如苯基或萘基等。 Among the C 6-10 aryl groups which may have a substituent represented by R 1 , R 3 , R 9 to R 11 , R 14 to R 20 and R 21 , the C 6-10 aryl group may be phenyl or naphthyl, etc. .

R1 、R3 、R9 ~R11 、R14 ~R20 及R21 所示可具有取代基之雜芳基中,雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子)可舉如:環構成原子數為5~10之吡啶基、呋喃基、咪唑基、嘧啶基、吡

Figure 108111313-A0304-12-01
基或噻唑基等單環雜芳基;以及喹啉基或吲哚基等二環雜芳基。Among the heteroaryl groups which may have substituents represented by R 1 , R 3 , R 9 to R 11 , R 14 to R 20 and R 21 , the heteroaryl group (heteroaryl group includes 1 selected from N, O and S ~4 heteroatoms as ring constituent atoms) can be exemplified by pyridyl, furanyl, imidazolyl, pyrimidinyl, pyridine with 5 to 10 ring constituent atoms
Figure 108111313-A0304-12-01
Monocyclic heteroaryl groups such as alkyl or thiazolyl; and bicyclic heteroaryl groups such as quinolinyl or indolyl.

R20 與R21 鍵結而形成之可具有取代基且4~8員環之環狀胺基中,4~8員環之環狀胺基可舉如吖呾基、吡咯啶基、哌

Figure 108111313-A0304-12-01
基或
Figure 108111313-A0304-12-02
啉基等環狀胺基。Among the cyclic amine groups having 4 to 8 member rings formed by bonding R 20 and R 21 , the cyclic amine groups having 4 to 8 member rings can be exemplified by acryl, pyrrolidyl, piper
Figure 108111313-A0304-12-01
Base or
Figure 108111313-A0304-12-02
Cyclic amine groups such as porphyrinyl.

R4 及R22 所示可具有取代基之醯基中,醯基可舉如乙醯基、丙醯基或苯甲醯基等。Among the acyl groups which may have a substituent shown by R 4 and R 22 , the acyl group may be exemplified by acetyl, propyl, or benzoyl.

R4 所示鹵素原子可舉如氟原子、氯原子、溴原子或碘原子,且宜舉如氟原子或氯原子,更宜舉如氟原子。The halogen atom represented by R 4 may be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and preferably a fluorine atom or a chlorine atom, more preferably a fluorine atom.

R16 、R17 、R20 及R21 所示胺基保護基可舉一般習知物(例如非專利文獻6記載之胺基保護基),可舉例如:乙醯基、三氟乙醯基、三級丁氧羰基、三級戊氧羰基、2,2,2-三氯乙氧羰基、苄氧羰基、對氯苄氧羰基、對甲氧苄羰基、對硝基苄氧羰基、對苯基偶氮苄氧羰基、對甲氧苯基偶氮苄氧羰基、3,5-二甲氧苄氧羰基、3,4,5-三甲氧苄氧羰基、3,5-二甲氧苄氧羰基、3,4,5-三甲氧苄氧羰基、對聯苯異丙氧羰基、二異丙基甲氧羰基、2-(三甲矽基)乙氧羰基、9-茀基甲氧羰基、苄基或對甲氧苄基等。The amine protecting groups represented by R 16 , R 17 , R 20 and R 21 can be exemplified by general conventional materials (for example, the amine protecting group described in Non-Patent Document 6), and examples thereof include acetyl group and trifluoroacetyl group , Tertiary butoxycarbonyl, tertiary pentoxycarbonyl, 2,2,2-trichloroethoxycarbonyl, benzyloxycarbonyl, p-chlorobenzyloxycarbonyl, p-methoxybenzylcarbonyl, p-nitrobenzyloxycarbonyl, p-benzene Azobenzyloxycarbonyl, p-methoxyphenylazobenzyloxycarbonyl, 3,5-dimethoxybenzyloxycarbonyl, 3,4,5-trimethoxybenzyloxycarbonyl, 3,5-dimethoxybenzyloxy Carbonyl, 3,4,5-trimethoxybenzyloxycarbonyl, p-biphenylisopropyloxycarbonyl, diisopropylmethoxycarbonyl, 2-(trimethylsilyl)ethoxycarbonyl, 9-茀methoxymethoxycarbonyl, benzyl Or p-methoxybenzyl and so on.

R13 所示羧基保護基可舉一般習知物(例如非專利文獻6記載之羧基保護基),可舉如:甲基、乙基、正丙基、異丙基、正丁基、異丁基、三級丁基、戊基、己基或庚基等C1-6 烷基;乙烯基、烯丙基、1-丙烯基、1-丁烯基、1-戊烯基、1-己烯基或1-庚烯基等C1-6 烯基;苄基等碳數7~11之芳烷基;苯基或萘基等碳數6~14之芳基等可藉由在水解及接觸還原等溫和條件下進行處理而去除者;乙醯氧基甲基或三甲基乙醯氧基甲基等醯氧基C1-6 烷基;甲氧羰氧基甲基或1-乙氧羰氧基乙基等C1-6 烷氧羰氧基C1-6 烷基;甲氧基甲基等C1-6 烷氧基C1-6 烷基;酞內酯等內酯基;1-二甲基胺基乙基等二C1-6 烷基胺基C1-6 烷基;以及(5-甲基-2-側氧基-1,3-二㗁唑-4-基)甲基等,且宜舉如C1-6 烷基、C1-6 烯基及碳數7~11芳烷基,較宜舉如:甲基、乙基、正丙基、異丙基、正丁基及異丁基等C1-4 烷基(三級丁基除外);烯丙基、1-丙烯基及1-丁烯基等C3-5 烯基;及,苄基,且更宜舉如甲基或乙基。The carboxyl protecting group represented by R 13 may be a general conventional substance (for example, the carboxyl protecting group described in Non-Patent Document 6), and may be exemplified by methyl, ethyl, n-propyl, isopropyl, n-butyl, and isobutyl C 1-6 alkyl group, tertiary butyl, pentyl, hexyl or heptyl; vinyl, allyl, 1-propenyl, 1-butenyl, 1-pentenyl, 1-hexene C 1-6 alkenyl such as alkyl or 1-heptenyl; aralkyl having 7 to 11 carbons such as benzyl; aryl having 6 to 14 carbons such as phenyl or naphthyl can be hydrolyzed and contacted Removal and removal under isothermal conditions; Acetoxy C 1-6 alkyl such as acetoxymethyl or trimethylacetoxymethyl; methoxycarbonyloxymethyl or 1-ethoxy carbonyloxy ethyl and the like C 1-6 alkoxycarbonyl-C 1-6 alkyl; methoxymethyl and the like C 1-6 alkoxy C 1-6 alkyl; phthalazin lactones lactone group; Di-C 1-6 alkylamino C 1-6 alkyl such as 1-dimethylaminoethyl; and (5-methyl-2-oxo-1,3-diazol-4-yl ) Methyl, etc., and preferably such as C 1-6 alkyl, C 1-6 alkenyl and C 7-11 aralkyl, more preferably such as: methyl, ethyl, n-propyl, isopropyl , C 1-4 alkyl such as n-butyl and isobutyl (except tertiary butyl); C 3-5 alkenyl such as allyl, 1-propenyl and 1-butenyl; and, benzyl, More preferably, it is methyl or ethyl.

R15 所示羥基保護基可舉一般習知物(例如非專利文獻6記載之羥基保護基),可舉如:苄基、4-甲氧苄基或三苯甲基等可具有取代基之芳烷基;乙醯基等醯基;三甲矽基或三級丁基二甲基矽基等具有取代基之矽基等。The hydroxy-protecting group represented by R 15 can be a general conventional substance (for example, the hydroxy-protecting group described in Non-Patent Document 6), and examples thereof include benzyl, 4-methoxybenzyl, trityl, etc. which may have a substituent. Aralkyl; acetyl groups such as acetyl; silane groups with substituents such as trimethylsilyl or tertiary butyldimethylsilyl.

本說明書中所說明之取代基可舉如:甲基、乙基、丙基、異丙基、丁基或三級丁基基等直鏈或支鏈C1-6 烷基;氟甲基、二氟甲基或三氟甲基等鹵化甲基;甲氧基、乙氧基、丙氧基或異丙氧基等直鏈或支鏈狀C1-8 烷氧基;2-丙烯基等C2-6 烯基;環丙基或環己基等C3-8 環烷基;苯基等C6-14 芳基;吡啶基、呋喃基或咪唑基等雜芳基;氟原子或氯原子等鹵素原子;C1-6 烷基胺基、二C1-6 烷基胺基或醯基胺基等可具有取代基之胺基;可具有保護基之胺基;甲醯基、乙醯基、環丙羰基或苯甲醯基等醯基;羥基;胍基;硝基;氰基等。The substituents described in this specification can be exemplified by straight-chain or branched C 1-6 alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl or tertiary butyl groups; fluoromethyl, Halogenated methyl such as difluoromethyl or trifluoromethyl; linear or branched C 1-8 alkoxy such as methoxy, ethoxy, propoxy or isopropoxy; 2-propenyl etc. C 2-6 alkenyl; C 3-8 cycloalkyl such as cyclopropyl or cyclohexyl; C 6-14 aryl such as phenyl; heteroaryl such as pyridyl, furyl or imidazolyl; fluorine atom or chlorine atom Etc. halogen atoms; C 1-6 alkylamine groups, di C 1-6 alkylamine groups or amide groups such as amine groups which may have substituents; amine groups which may have protective groups; methyl acetyl and acetyl Acyl groups such as alkyl, cyclopropylcarbonyl or benzoyl; hydroxyl; guanidino; nitro; cyano, etc.

此等取代基中,較佳之取代基組合如下:R1 可舉如可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6且伸烷基部分之碳原子數表示1~5)及其氘化物以及可具有取代基之C2-6 醯基;R2 可舉如可具有取代基之C1-10 烷基;R3 可舉如可具有取代基之C1-10 烷基;R4 ~R8 可舉如氫原子;R9 ~R11 可相同或互異,可舉如氫原子及可具有取代基之C1-10 烷基,更宜舉如氫原子;R12 可舉如-C(=O)OR13 基、-C(=O)-R14 基、-OR15 基、-C(OR15 )R18 R19 基、-NR16 R17 基或-C(=O)NR20 R21 基,更宜舉如-C(=O)OR13 基、-C(=O)-R14 基、-C(OR15 )R18 R19 基或-C(=O)NR20 R21 基;R13 、R14 、R18 、R19 及R20 可舉如氫原子、可具有取代基之C1-10 烷基;R21 可舉如氫原子、可具有取代基之C1-10 烷基、可具有取代基之芳烷基(芳基部分之碳原子數為6~10且伸烷基部分之碳原子數表示1~5)及可具有取代基之芳基,且可更具體舉如苄基醯胺基、醯胺苯基、醯肼基、-C(OH)Me(tert-Bu)、-C(OH)Me2 、-C(=O)OEt、-C(OH)MePr、苯乙基醯胺、-CH2 OBn、-CH2 OH或-C(OH)MeCF3Among these substituents, the preferred combination of substituents is as follows: R 1 can be exemplified by a C 1-10 alkyl group which may have a substituent, a cycloalkyl alkyl group which may have a substituent (the number of carbon atoms in the cycloalkyl moiety is 3 to 6 and the number of carbon atoms in the alkylene extension means 1 to 5) and its deuterated compounds and C 2-6 acetyl groups which may have substituents; R 2 may be exemplified by C 1-10 alkyl groups which may have substituents ; R 3 may be exemplified by a C 1-10 alkyl group which may have a substituent; R 4 to R 8 may be exemplified by a hydrogen atom; R 9 to R 11 may be the same or different from each other, and may be exemplified by a hydrogen atom and may have a substituent The C 1-10 alkyl group is more preferably a hydrogen atom; R 12 may be exemplified by -C(=O)OR 13 group, -C(=O)-R 14 group, -OR 15 group, and -C(OR 15 ) R 18 R 19 group, -NR 16 R 17 group or -C(=O)NR 20 R 21 group, more preferably such as -C(=O)OR 13 group, -C(=O)-R 14 Group, -C(OR 15 )R 18 R 19 group or -C(=O)NR 20 R 21 group; R 13 , R 14 , R 18 , R 19 and R 20 can be exemplified by hydrogen atom, which may have a substituent C 1-10 alkyl group; R 21 can be exemplified by a hydrogen atom, a C 1-10 alkyl group which may have a substituent, an aralkyl group which may have a substituent (the carbon number of the aryl part is 6 to 10 and extends The number of carbon atoms in the alkyl portion represents 1 to 5) and an aryl group which may have a substituent, and may be more specifically exemplified by benzyl amide amino group, amide phenyl group, hydrazide group, -C(OH)Me(tert -Bu), -C(OH)Me 2 , -C(=O)OEt, -C(OH)MePr, phenethylamide, -CH 2 OBn, -CH 2 OH, or -C(OH)MeCF 3 .

此等取代基中,更理想之取代基組合如下:R1 可舉如氫原子、甲基、環丙基甲基、環丁基甲基及其氘化物以及烯丙基;R2 及R3 可舉如甲基;R4 ~R8 可舉如氫原子;R9 ~R11 相同或互異,可舉如氫原子及C1-10 烷基,更宜舉如氫原子;R12 可舉如苄基醯胺基、-C(OH)Me(tert-Bu)、-C(OH)Me2 、-CH2 OH或-C(OH)MeCF3 等。Among these substituents, the more ideal combination of substituents is as follows: R 1 can be exemplified by hydrogen atom, methyl, cyclopropylmethyl, cyclobutylmethyl and its deuterium compounds and allyl groups; R 2 and R 3 can be exemplified Such as methyl; R 4 ~R 8 can be exemplified by hydrogen atom; R 9 ~R 11 are the same or different from each other, can be exemplified by hydrogen atom and C 1-10 alkyl group, more preferably by hydrogen atom; R 12 can be exemplified by Benzylamide, -C(OH)Me(tert-Bu), -C(OH)Me 2 , -CH 2 OH or -C(OH)MeCF 3, etc.

通式(I)所示化合物可利用一般習知方法,例如載於專利文獻2、非專利文獻1或非專利文獻6等之方法來製造。The compound represented by the general formula (I) can be produced by a generally known method, for example, a method described in Patent Document 2, Non-Patent Document 1, or Non-Patent Document 6.

本實施形態中使用之三氟化硼錯合物可使用市售品或以一般習知方法調製之物。 本實施形態中使用之三氟化硼錯合物可舉如:三氟化硼-醚錯合物(例如三氟化硼二甲醚、三氟化硼二乙醚、三氟化硼二異丙醚、三氟化硼二正丁醚、三氟化硼三級丁基甲醚及三氟化硼四氫呋喃等)、三氟化硼-水錯合物(例如三氟化硼單水合物及三氟化硼二水合物等)、三氟化硼-醇錯合物(例如三氟化硼甲醇、三氟化硼乙醇、三氟化硼丙醇、三氟化硼異丙醇、三氟化硼丁醇、三氟化硼異丁醇、三氟化硼乙二醇及三氟化硼2-胺基乙醇等)、三氟化硼-胺錯合物(例如三氟化硼二甲胺、三氟化硼三乙胺、三氟化硼二異丙胺、三氟化硼二異丙基乙胺、三氟化硼二乙胺、三氟化硼三甲胺、三氟化硼二異丙基乙胺、三氟化硼三丁胺、三氟化硼(可具有取代基之)吡啶、三氟化硼苯胺、三氟化硼N-甲基苯胺、三氟化硼N,N-二甲基苯胺、三氟化硼二氮二環十一烯、三氟化硼苯并咪唑、三氟化硼咪唑、三氟化硼(氮原子可經取代)吡咯啶、三氟化硼(氮原子可經取代)哌啶、三氟化硼(氮原子可經取代)哌

Figure 108111313-A0304-12-01
、三氟化硼(氮原子可經取代)
Figure 108111313-A0304-12-02
啉及三氟化硼氨等)、三氟化硼-酚錯合物(例如三氟化硼酚、三氟化硼(可具有取代基之)酚等)、三氟化硼-硫化物錯合物(例如三氟化硼二乙硫及三氟化硼二甲硫等)、三氟化硼-亞碸錯合物(例如三氟化硼二甲亞碸錯合物等)、三氟化硼-羧酸錯合物(例如三氟化硼甲酸、三氟化硼乙酸、三氟化硼苯甲酸及三氟化硼酞酸單酯錯合物等)或三氟化硼-磷酸錯合物(例如三氟化硼磷酸等)等;且宜舉如三氟化硼-醚錯合物、三氟化硼-醇錯合物或三氟化硼-羧酸錯合物,較宜舉如三氟化硼二甲醚、三氟化硼二乙醚、三氟化硼二異丙醚、三氟化硼二正丁醚、三氟化硼甲醇、三氟化硼乙醇、三氟化硼丙醇、三氟化硼異丙醇或三氟化硼乙酸,更宜舉如三氟化硼二乙醚。The boron trifluoride complex used in this embodiment can be a commercially available product or a product prepared by a generally known method. Examples of the boron trifluoride complex used in this embodiment include: boron trifluoride-ether complex (for example, boron trifluoride dimethyl ether, boron trifluoride diethyl ether, and boron trifluoride diisopropyl Ether, boron trifluoride di-n-butyl ether, boron trifluoride tertiary butyl methyl ether and boron trifluoride tetrahydrofuran, etc.), boron trifluoride-water complex (such as boron trifluoride monohydrate and trifluoride Boron dihydrate, etc.), boron trifluoride-alcohol complex (e.g. boron trifluoride methanol, boron trifluoride ethanol, boron trifluoride propanol, boron trifluoride isopropanol, boron trifluoride butyl butyl fluoride Alcohol, boron trifluoride isobutanol, boron trifluoride ethylene glycol and boron trifluoride 2-aminoethanol, etc.), boron trifluoride-amine complex (e.g. boron trifluoride dimethylamine, trifluoride Boron fluoride triethylamine, boron trifluoride diisopropylamine, boron trifluoride diisopropylethylamine, boron trifluoride diethylamine, boron trifluoride trimethylamine, boron trifluoride diisopropylethyl Amine, boron trifluoride tributylamine, boron trifluoride (may have substituents) pyridine, boron trifluoride aniline, boron trifluoride N-methylaniline, boron trifluoride N,N-dimethyl Aniline, boron trifluoride diazabicycloundecene, boron trifluoride benzimidazole, boron trifluoride imidazole, boron trifluoride (nitrogen atom can be substituted) pyrrolidine, boron trifluoride (nitrogen atom can Substituted) piperidine, boron trifluoride (nitrogen atom can be substituted) piper
Figure 108111313-A0304-12-01
, Boron trifluoride (nitrogen atom can be substituted)
Figure 108111313-A0304-12-02
Porphyrin and boron trifluoride ammonia, etc.), boron trifluoride-phenol complex (such as boron trifluoride phenol, boron trifluoride (which may have a substituent) phenol, etc.), boron trifluoride-sulfide complex Compounds (such as boron trifluoride diethyl sulfide and boron trifluoride dimethyl sulfide, etc.), boron trifluoride-sulfonate complex (such as boron trifluoride dimethylsulfide complex, etc.), trifluoro Boron trifluoride-carboxylic acid complex (such as boron trifluoride formic acid, boron trifluoride acetic acid, boron trifluoride benzoic acid, and boron trifluoride phthalate monoester complex, etc.) or boron trifluoride-phosphate triphosphate Compound (for example, boron trifluoride phosphoric acid, etc.), etc.; and, for example, boron trifluoride-ether complex, boron trifluoride-alcohol complex or boron trifluoride-carboxylic acid complex, preferably Examples include boron trifluoride dimethyl ether, boron trifluoride diethyl ether, boron trifluoride diisopropyl ether, boron trifluoride di-n-butyl ether, boron trifluoride methanol, boron trifluoride ethanol, trifluoride Boron propanol, boron trifluoride isopropanol or boron trifluoride acetic acid, more preferably boron trifluoride diethyl ether.

本實施形態之理想嗎啡喃衍生物(II)可舉如以下化合物編號1~48之物。The ideal morphinan derivative (II) of this embodiment can be exemplified by the following compound numbers 1 to 48.

[化學式23]

Figure 02_image020
[化學式24]
Figure 02_image022
[化學式25]
Figure 02_image024
[化學式26]
Figure 02_image026
[化學式27]
Figure 02_image028
[化學式28]
Figure 02_image030
[化學式29]
Figure 02_image032
[化學式30]
Figure 02_image034
[化學式31]
Figure 02_image036
[化學式32]
Figure 02_image038
[Chemical Formula 23]
Figure 02_image020
[Chemical Formula 24]
Figure 02_image022
[Chemical Formula 25]
Figure 02_image024
[Chemical Formula 26]
Figure 02_image026
[Chemical Formula 27]
Figure 02_image028
[Chemical Formula 28]
Figure 02_image030
[Chemical Formula 29]
Figure 02_image032
[Chemical Formula 30]
Figure 02_image034
[Chemical Formula 31]
Figure 02_image036
[Chemical Formula 32]
Figure 02_image038

原料之嗎啡喃衍生物(I)不僅可使用自由物(free base),也可使用酸加成鹽。尤其是在嗎啡喃衍生物(I)之無鹽基物為泡狀非晶質時,體積變得龐大而常有難以工業規模處置之情況。相對來說,嗎啡喃衍生物(I)為鹽時會成為粉末狀物質,因此而較泡狀物質容易處置,容易應用在工業規模製造上而甚有效。酸加成鹽可舉例如:與鹽酸或硫酸等礦酸之鹽;與甲酸、草酸、乙酸、檸檬酸、三氯乙酸、三氟乙酸、反丁烯二酸或順丁烯二酸等有機羧酸等之鹽;與甲磺酸、苯磺酸、對甲苯磺酸、均三甲苯磺酸、萘磺酸或樟腦磺酸等磺酸之鹽。The morphinan derivative (I) as a raw material can use not only a free base but also an acid addition salt. Especially when the salt-free base of the morphinan derivative (I) is foamy amorphous, the volume becomes large and it is often difficult to handle on an industrial scale. Relatively speaking, the morphinan derivative (I) becomes a powdery substance when it is a salt, so it is easier to dispose than a foamy substance and is easy to apply to industrial-scale manufacturing. Examples of acid addition salts include salts with mineral acids such as hydrochloric acid or sulfuric acid; organic carboxylates with formic acid, oxalic acid, acetic acid, citric acid, trichloroacetic acid, trifluoroacetic acid, fumaric acid, or maleic acid, etc. Salts of acids, etc.; salts with sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, mesitylenesulfonic acid, naphthalenesulfonic acid or camphorsulfonic acid.

可藉由使三氟化硼錯合物對通式(I)所示化合物發生作用來進行通式(II)所示具有丁基原啡因骨架之嗎啡喃衍生物之製造。The production of a morphinan derivative having a butylorphanine skeleton represented by the general formula (II) can be carried out by causing a boron trifluoride complex to act on the compound represented by the general formula (I).

[化學式33]

Figure 02_image049
[Chemical Formula 33]
Figure 02_image049

用於本反應之溶劑可舉如羧酸類、羧酸酯類、醇類、烴類、鹵烷類、腈類、醚類、酮類、醯胺類、亞碸類及碳酸酯類等溶劑,可舉例如:甲酸或乙酸等羧酸類;乙酸乙酯等羧酸酯類;甲醇、乙醇或丙醇等醇類;苯、甲苯或二甲苯等芳香族烴;二氯甲烷、氯仿或四氯化碳等鹵化烴類;乙腈或丙腈等腈類;二乙醚、三級丁基甲醚、四氫呋喃或二㗁烷等醚類;丙酮或甲乙酮等酮類;二甲基甲醯胺或二甲基乙醯胺等醯胺類;二甲基亞碸等亞碸類;碳酸二乙酯、1,3-二㗁烷-2-酮等碳酸酯類;N,N’-二甲基伸丙基脲等脲類;水或其等之混合溶劑;且宜舉如羧酸類、羧酸酯類、醇類、烴類、鹵烷類、腈類、醚類、酮類、醯胺類、亞碸類、脲類或碳酸酯類,較宜舉如羧酸類、烴類、腈類或醚類,更宜舉如乙酸、乙腈、二甲苯及甲苯,尤宜舉如乙酸或乙腈。溶劑之使用量並未特別受限,但相對於化合物(I)宜在1至200重量倍(宜1~100、較宜1~50、更宜1~20重量倍)之範圍。 反應溫度可視使用之溶劑來適當設定,舉例來說,可在20℃至150℃(宜40℃至120℃,較宜50℃至100℃,更宜50至90℃)間之溫度進行,於反應溫度下在5分鐘至300小時(宜1小時至20小時)間結束。 三氟化硼錯合物相對於化合物(I)可使用1.0重量倍至50重量倍,且宜1重量倍至30重量倍,更宜1重量倍至10重量倍。 實施例Examples of solvents used in this reaction include solvents such as carboxylic acids, carboxylic acid esters, alcohols, hydrocarbons, haloalkanes, nitriles, ethers, ketones, amides, sulfonates, and carbonates. Examples include: carboxylic acids such as formic acid or acetic acid; carboxylic acid esters such as ethyl acetate; alcohols such as methanol, ethanol or propanol; aromatic hydrocarbons such as benzene, toluene or xylene; methylene chloride, chloroform or tetrachloride Halogenated hydrocarbons such as carbon; nitriles such as acetonitrile or propionitrile; ethers such as diethyl ether, tertiary butyl methyl ether, tetrahydrofuran or dioxane; ketones such as acetone or methyl ethyl ketone; dimethylformamide or dimethylacetamide Amides such as amines; sulfides such as dimethyl sulfoxide; carbonates such as diethyl carbonate and 1,3-dioxan-2-one; N,N'-dimethyl propyl urea, etc. Urea; water or their mixed solvents; and preferably such as carboxylic acids, carboxylic acid esters, alcohols, hydrocarbons, haloalkanes, nitriles, ethers, ketones, amides, sulfonamides, Urea or carbonates are more preferably carboxylic acids, hydrocarbons, nitriles or ethers, more preferably acetic acid, acetonitrile, xylene and toluene, particularly preferably acetic acid or acetonitrile. The amount of solvent used is not particularly limited, but it is preferably in the range of 1 to 200 times the weight (preferably 1 to 100, more preferably 1 to 50, and more preferably 1 to 20 times the weight) relative to compound (I). The reaction temperature can be appropriately set according to the solvent used. For example, it can be carried out at a temperature between 20°C and 150°C (preferably 40°C to 120°C, more preferably 50°C to 100°C, more preferably 50 to 90°C). The reaction temperature is completed within 5 minutes to 300 hours (preferably 1 hour to 20 hours). The boron trifluoride complex can be used from 1.0 to 50 times the weight of the compound (I), and preferably from 1 to 30 times, and more preferably from 1 to 10 times. Examples

接著,舉參考例、實施例及試驗例以更詳盡說明本發明,但本發明不受其等所限。另,實施例化合物及參考例化合物之命名係使用Cambridge Soft公司製ChemDraw ver.15,將其描繪出之結構式以該軟體內建之命名規則轉換為英文名後再譯為日文。Next, reference examples, examples, and test examples are given to explain the present invention in more detail, but the present invention is not limited thereto. In addition, the naming of the compound of the example and the compound of the reference example used ChemDraw ver.15 manufactured by Cambridge Soft Co., Ltd., and the structural formula described by the software was converted into English names according to the naming rules built in the software, and then translated into Japanese.

[實施例1] (4R,4aR,7R,7aR,12bS)-N-苄基-3-(環丙基甲基)-7-羥基-9-甲氧基-1,2,3,4,7,7a-六氫-4a,7-乙橋-4,12-甲橋苯并呋喃并[3,2-e]異喹啉-14-甲醯胺之製造[Example 1] (4R, 4aR, 7R, 7aR, 12bS)-N-benzyl-3-(cyclopropylmethyl)-7-hydroxy-9-methoxy-1,2,3,4,7,7a-hexa Manufacture of hydrogen-4a,7-ethyl bridge-4,12-methyl bridge benzofuro[3,2-e]isoquinoline-14-methylamide

[化學式34]

Figure 02_image051
[Chemical Formula 34]
Figure 02_image051

對100L之三頸燒瓶,使原料之(4R,4aR,7R,7aR,12bS)-N-苄基-3-(環丙基甲基)-7,9-二甲氧基-1,2,3,4,7,7a-六氫-4a,7-乙橋-4,12-甲橋苯并呋喃并[3,2-e]異喹啉-14-甲醯胺(4.2kg)溶解於乙腈(42L)。於室溫下對所得溶液添加三氟化硼二乙醚錯合物(17.1kg)。使混合物於65℃至68℃間攪拌5小時再以HPLC確認反應,原料已消失。 使反應溶液冷卻至0℃至15℃,緩緩添加4當量氫氧化鈉水溶液(120L),最後將pH調製成10~12。 以乙酸乙酯(30L)抽提反應溶液2次,將收集之有機層以飽和食鹽水(20L)洗淨2次。 使有機層於無水硫酸鈉(5kg)上乾燥後,過濾選別不溶物後於減壓下濃縮濾液而獲得黃色結晶狀固體。 於正庚烷與乙酸乙酯(1:1,1.2L)之混合溶劑與水(1.8L)中攪拌洗淨所得固體並予以粉碎。濾取結晶性固體後使其乾燥,而以黃色結晶性固體之形態獲得標題化合物(2.85kg,70%)。(HPLC純度98.9%) 使濾液之有機層分離後,濃縮至約600mL而獲得懸濁液。濾取所產生之固體後使其乾燥,獲得標題化合物之第二獲結晶(100g)。(HPLC純度95.6%) 所得化合物之NMR圖譜與專利文獻2之數據一致。For a 100L three-necked flask, make the raw material (4R, 4aR, 7R, 7aR, 12bS)-N-benzyl-3-(cyclopropylmethyl)-7,9-dimethoxy-1,2, 3,4,7,7a-hexahydro-4a,7-ethyl bridge-4,12-methyl bridge benzofuro[3,2-e]isoquinoline-14-methylamide (4.2kg) was dissolved in Acetonitrile (42L). Boron trifluoride diethyl ether complex (17.1 kg) was added to the resulting solution at room temperature. The mixture was stirred at 65°C to 68°C for 5 hours and then the reaction was confirmed by HPLC, and the raw material had disappeared. The reaction solution was cooled to 0°C to 15°C, 4 equivalents of sodium hydroxide aqueous solution (120L) were slowly added, and finally the pH was adjusted to 10-12. The reaction solution was extracted twice with ethyl acetate (30 L), and the collected organic layer was washed twice with saturated brine (20 L). After the organic layer was dried over anhydrous sodium sulfate (5 kg), the insoluble matter was filtered and the filtrate was concentrated under reduced pressure to obtain a yellow crystalline solid. The resulting solid was stirred and washed in a mixed solvent of n-heptane and ethyl acetate (1:1, 1.2 L) and water (1.8 L) and pulverized. The crystalline solid was collected by filtration and dried, and the title compound (2.85 kg, 70%) was obtained as a yellow crystalline solid. (HPLC purity 98.9%) After separating the organic layer of the filtrate, it was concentrated to about 600 mL to obtain a suspension. The produced solid was filtered and dried to obtain the second crystal (100 g) of the title compound. (HPLC purity 95.6%) The NMR spectrum of the obtained compound is consistent with the data of Patent Document 2.

[實施例2] 將實施例1之溶劑變更為乙酸,同樣地進行下述實驗。 對100L之三頸燒瓶,使原料之(4R,4aR,7R,7aR,12bS)-N-苄基-3-(環丙基甲基)-7,9-二甲氧基-1,2,3,4,7,7a-六氫-4a,7-乙橋-4,12-甲橋苯并呋喃并[3,2-e]異喹啉-14-甲醯胺(7.4kg)溶解於乙酸(45kg)。於室溫下對所得溶液添加三氟化硼二乙醚錯合物(20.5kg)。於90℃下攪拌混合物8小時,以HPLC確認反應,雖然原料殘存2.4%但停止加熱。 濃縮反應溶液並餾除乙酸後,將殘渣溶解於二氯甲烷(80kg)中。將溶液半量移至100L之燒瓶,添加4當量氫氧化鈉水溶液(約5kg)並將pH調整為11~12。使有機層分離並於無水硫酸鈉(10kg)上乾燥。也對殘餘之半量同樣施行。 過濾選別不溶物後,於減壓下濃縮濾液,使所得殘渣於室溫下在正己烷及乙酸乙酯(1;1,20kg)中攪拌3小時而獲得懸浮液。濾取所得固體並以正己烷洗淨後,於減壓下乾燥而以象牙色結晶性固體之形態獲得標題化合物(2.5kg)。(HPLC純度97.5%) 所得化合物之NMR圖譜與專利文獻2之數據一致。[Example 2] The solvent of Example 1 was changed to acetic acid, and the following experiment was carried out similarly. For a 100L three-necked flask, make the raw material (4R, 4aR, 7R, 7aR, 12bS)-N-benzyl-3-(cyclopropylmethyl)-7,9-dimethoxy-1,2, 3,4,7,7a-Hexahydro-4a,7-ethyl bridge-4,12-methyl bridge benzofuro[3,2-e]isoquinoline-14-carboxamide (7.4kg) was dissolved in Acetic acid (45kg). Boron trifluoride diethyl ether complex (20.5 kg) was added to the resulting solution at room temperature. The mixture was stirred at 90°C for 8 hours, and the reaction was confirmed by HPLC. Although 2.4% of the raw material remained, the heating was stopped. After concentrating the reaction solution and distilling off acetic acid, the residue was dissolved in dichloromethane (80 kg). Move half of the solution to a 100L flask, add 4 equivalents of sodium hydroxide aqueous solution (about 5kg) and adjust the pH to 11-12. The organic layer was separated and dried over anhydrous sodium sulfate (10 kg). The same applies to the remaining half. After filtering to select insoluble materials, the filtrate was concentrated under reduced pressure, and the resulting residue was stirred at room temperature in n-hexane and ethyl acetate (1; 1,20 kg) for 3 hours to obtain a suspension. The obtained solid was collected by filtration and washed with n-hexane, and then dried under reduced pressure to obtain the title compound (2.5 kg) as an ivory crystalline solid. (HPLC purity 97.5%) The NMR spectrum of the obtained compound is consistent with the data of Patent Document 2.

[實施例3] (4R,4aR,7R,7aR,12bS)-N-苄基-3-(環丙基甲基)-7-羥基-9-甲氧基-1,2,3,4,7,7a-六氫-4a,7-乙橋-4,12-甲橋苯并呋喃并[3,2-e]異喹啉-14-甲醯胺之製造(起始物質使用對甲苯磺酸鹽之實驗例)[Example 3] (4R, 4aR, 7R, 7aR, 12bS)-N-benzyl-3-(cyclopropylmethyl)-7-hydroxy-9-methoxy-1,2,3,4,7,7a-hexa Production of hydrogen-4a,7-ethyl bridge-4,12-methyl bridge benzofuro[3,2-e]isoquinoline-14-carboxamide (Experimental example of using p-toluenesulfonate as starting material )

[化學式35]

Figure 02_image052
[Chemical Formula 35]
Figure 02_image052

於100L之反應容器中添加乙腈(47.6kg)及(4R,4aR,7R,7aR,12bS)-N-苄基-3-(環丙基甲基)-7,9-二甲氧基-1,2,3,4,7,7a-六氫-4a,7-乙橋-4,12-甲橋苯并呋喃并[3,2-e]異喹啉-14-甲醯胺 對甲苯磺酸鹽 1對甲苯磺酸加成物(6.02kg)。於室溫下對所得溶液添加三氟化硼二乙醚錯合物(24.5kg),於65-68℃下將反應混合物攪拌6小時。 藉HPLC分析確認原料已消失。 將反應溶液冷卻至0-15℃,於冰冷下緩緩添加4當量之氫氧化鈉水溶液(180.6kg, 89.1等量)而將pH調整為10-12。 以乙酸乙酯(38kg)抽提反應混合物2次,並以飽和食鹽水(28.7kg)將所收集之有機層洗淨2次。減壓下濃縮有機層而獲得黃色固體。將該物於正庚烷(8.18kg)與乙酸乙酯之混合物(5.41kg)及水(8.43kg)中攪拌洗淨,濾取固體而以灰色結晶性固體之形態獲得標題化合物(3.1kg,88%)。 所得化合物之NMR圖譜與專利文獻2之數據一致。Add acetonitrile (47.6kg) and (4R, 4aR, 7R, 7aR, 12bS)-N-benzyl-3-(cyclopropylmethyl)-7,9-dimethoxy-1 to a 100L reaction vessel ,2,3,4,7,7a-hexahydro-4a,7-ethyl bridge-4,12-methyl bridge benzofuro[3,2-e]isoquinoline-14-methylamide p-toluenesulfonate Acid salt 1 p-toluenesulfonic acid adduct (6.02 kg). Boron trifluoride diethyl ether complex (24.5 kg) was added to the resulting solution at room temperature, and the reaction mixture was stirred at 65-68°C for 6 hours. HPLC analysis confirmed that the raw material had disappeared. The reaction solution was cooled to 0-15°C, and 4 equivalents of sodium hydroxide aqueous solution (180.6 kg, 89.1 equivalent) was slowly added under ice cooling to adjust the pH to 10-12. The reaction mixture was extracted twice with ethyl acetate (38 kg), and the collected organic layer was washed twice with saturated brine (28.7 kg). The organic layer was concentrated under reduced pressure to obtain a yellow solid. This was stirred and washed in a mixture of n-heptane (8.18 kg) and ethyl acetate (5.41 kg) and water (8.43 kg), and the solid was filtered to obtain the title compound (3.1 kg, as a gray crystalline solid). 88%). The NMR spectrum of the obtained compound is consistent with the data of Patent Document 2.

以上說明本發明之較佳實施例,但本發明不受此等實施例限定。可在不超脫本發明旨趣之範圍內進行結構之附加、省略、取代及其他變更。本發明不受前述說明所限定,而僅受所附之申請專利範圍的範圍而限定。The preferred embodiments of the present invention have been described above, but the present invention is not limited by these embodiments. Additions, omissions, substitutions, and other changes to the structure can be made without departing from the scope of the invention. The present invention is not limited by the foregoing description, but only by the scope of the appended patent application.

(無)(no)

Claims (23)

一種下列通式(II)所示之化合物之製造方法,包含使下列化合物(I)與三氟化硼錯合物於溶劑中反應之步驟; [化學式2]
Figure 03_image018
(式中,R1 、R3 ~R12 同後所示); [化學式1]
Figure 03_image001
(式中,R1 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之至少1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C3-6 環烷基、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5); R2 表示可具有取代基之C1-10 烷基、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)或可具有取代基之C2-6 烯基; R3 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5); R4 表示氫原子、可具有取代基之C1-10 烷基、-OR22 基(R22 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之芳基或可具有取代基之C1-6 烷醯基)、鹵素原子、氰基、胺甲醯基、可具有取代基之醯基、硝基及可具有取代基之胺基; R5 及R6 相同或互異,表示氫原子、氟原子或羥基; R7 及R8 相同或互異,表示氫原子、氟原子或羥基,或者,R7 及R8 與其所鍵結之碳共同表示羰基); R9 、R10 、R11 相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5),或者,R9 與R10 鍵結而表示可具有取代基之C3-6 飽和烴環,R9 及R10 中任一者與R11 鍵結而表示可具有取代基之C3-6 飽和烴環或可具有取代基之C3-6 環烯烴; R12 表示-C(=O)OR13 基(R13 表示氫原子、可具有取代基之C1-10 烷基或羧基保護基)、-C(=O)-R14 基(R14 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5))、-OR15 基(R15 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之芳基、可具有取代基之雜芳基或羥基保護基)、-NR16 R17 基(R16 與R17 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之C6-10 芳基、可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5))、或胺基保護基、-C(OR15 )R18 R19 基(R18 與R19 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基)、或-C(NR16 R17 )R18 R19 基(R16 、R17 、R18 、R19 同前所示)、-C(=O)NR20 R21 基(R20 與R21 相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之芳烯基(芳基部分之碳原子數為6~10,烯基部分之碳原子數表示2~6)、可具有取代基之雜芳烯基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,烯基部分之碳原子數表示2~6)、可具有取代基之環烷基烯基(環烷基部分之碳原子數為3~6,烯基部分之碳原子數表示2~6)、可具有取代基之C4-6 環烯基、可具有取代基之環烯基烷基(環烯基部分之碳原子數為4~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之環烯基烯基(環烯基部分之碳原子數為4~6,烯基部分之碳原子數表示2~6)、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5);或者,R20 與R21 鍵結而表示可具有取代基且4~8員環之環狀胺基,或,R20 及R21 中任一者可與R9 、R10 及R11 中任一者共同形成可具有取代基之內醯胺環)。
A method for manufacturing a compound represented by the following general formula (II), comprising the step of reacting the following compound (I) with boron trifluoride complex in a solvent; [Chemical Formula 2]
Figure 03_image018
(In the formula, R 1 and R 3 ~R 12 are the same as shown later); [Chemical Formula 1]
Figure 03_image001
(In the formula, R 1 represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a cycloalkyl alkyl group which may have a substituent (the number of carbon atoms of the cycloalkyl portion is 3 to 6, and the alkylene portion The number of carbon atoms represents 1 to 5), the aralkyl group which may have a substituent (the number of carbon atoms of the aryl portion is 6 to 10, and the number of carbon atoms of the alkylene portion represents 1 to 5), which may have a substituent Heteroaralkyl (heteroaryl contains at least 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5), C which may have a substituent 3-6 cycloalkyl, optionally substituted C 2-6 alkenyl, optionally substituted C 6-10 aryl, or optionally substituted heteroaryl (heteroaryl includes selected from N, O and 1 to 4 heteroatoms in S are used as ring constituent atoms, and the number of carbon atoms in the alkylene extension means 1 to 5); R 2 represents a C 1-10 alkyl group which may have a substituent, and an aralkyl which may have a substituent Group (the number of carbon atoms in the aryl part is 6~10, and the number of carbon atoms in the alkylene part represents 1~5), heteroaralkyl which may have a substituent (heteroaryl includes selected from N, O and S 1 to 4 heteroatoms are used as ring constituent atoms, the number of carbon atoms in the alkylene moiety represents 1 to 5) or C 2-6 alkenyl which may have a substituent; R 3 represents a hydrogen atom, C which may have a substituent 1-10 alkyl groups, cycloalkylalkyl groups which may have substituents (the number of carbon atoms in the cycloalkyl portion is 3 to 6, and the number of carbon atoms in the alkylene portion represents 1 to 5), aromatic groups which may have substituents Alkyl groups (the number of carbon atoms in the aryl group is 6-10, and the number of carbon atoms in the alkylene group represents 1~5), heteroaralkyl groups that may have substituents (heteroaryl groups include selected from N, O, and S Among them, 1 to 4 heteroatoms are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5), C 2-6 alkenyl which may have a substituent, C 6-10 aryl which may have a substituent Or a heteroaryl group which may have a substituent (the heteroaryl group contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5); R 4 Represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, -OR 22 group (R 22 represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, an aryl group which may have a substituent, or may have a substitution C 1-6 alkyl amide group), halogen atom, cyano group, amine methyl amide group, optionally substituted acetyl group, nitro group and optionally substituted amine group; R 5 and R 6 are the same or different , Represents a hydrogen atom, a fluorine atom or a hydroxyl group; R 7 and R 8 are the same or different from each other, represent a hydrogen atom, a fluorine atom or a hydroxyl group, or R 7 and R 8 together with the carbon to which they are bonded represent a carbonyl group); R 9 , R 10 and R 11 are the same or different from each other, and represent a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C 3-6 cycloalkyl group that may have a substituent, and a cycloalkyl alkyl group that may have a substituent ( The number of carbon atoms in the cycloalkyl moiety is 3~6, and the number of carbon atoms in the alkylene moiety indicates 1~5), aralkyl group (aryl moiety) which may have a substituent The number of carbon atoms is 6~10, and the number of carbon atoms in the alkylene portion represents 1~5), heteroaralkyl groups which may have substituents (heteroaryl groups include 1~4 selected from N, O and S Heteroatoms as ring-forming atoms, the number of carbon atoms in the alkylene moiety represents 1 to 5), a C 6-10 aryl group which may have a substituent, or a heteroaryl group which may have a substituent (the heteroaryl group includes a member selected from N 1 to 4 heteroatoms in O, S are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5), or R 9 and R 10 are bonded to represent C 3- which may have a substituent 6 saturated hydrocarbon ring, any one of R 9 and R 10 is bonded to R 11 to represent a C 3-6 saturated hydrocarbon ring which may have a substituent or a C 3-6 cycloalkene which may have a substituent; R 12 represents- C(=O)OR 13 group (R 13 represents a hydrogen atom, a C 1-10 alkyl group or a carboxyl protecting group which may have a substituent), -C(=O)-R 14 group (R 14 represents a hydrogen atom, may C 1-10 alkyl group with substituents, C 6-10 aryl group with substituents or heteroaryl group with substituents (heteroaryl groups include 1 to 4 hetero groups selected from N, O and S Atoms are ring-constituting atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5)), -OR 15 groups (R 15 represents a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C group that may have a substituent 3-6 cycloalkyl, optionally substituted aryl, optionally substituted heteroaryl or hydroxy protecting group), -NR 16 R 17 group (R 16 and R 17 may be the same or different from each other, indicating a hydrogen atom , C 1-10 alkyl which may have a substituent, C 3-6 cycloalkyl which may have a substituent, C 6-10 aryl which may have a substituent, heteroaryl which may have a substituent (heteroaryl Contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5)), or an amine protecting group, -C(OR 15 )R 18 R 19 group (R 18 and R 19 may be the same or different from each other, and represent a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C 3-6 cycloalkyl group that may have a substituent, a C that may have a substituent 6-10 aryl or heteroaryl which may have a substituent), or -C (NR 16 R 17 ) R 18 R 19 group (R 16 , R 17 , R 18 , R 19 are the same as shown above), -C (=O)NR 20 R 21 group (R 20 is the same as or different from R 21 and represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a C 3-6 cycloalkyl group which may have a substituent, may Cycloalkylalkyl groups with substituents (the number of carbon atoms in the cycloalkyl portion is 3 to 6, and the number of carbon atoms in the alkylene portion represents 1 to 5), aralkyl groups that may have substituents (the aryl portion The number of carbon atoms is 6~10, and the number of carbon atoms in the alkylene moiety represents 1~5), heteroaralkyl groups which may have substituents (heteroaryl groups include 1 to 4 hetero groups selected from N, O and S Atoms as rings constitute atoms, alkylene The number of carbon atoms in the base portion represents 1 to 5), C 2-6 alkenyl group which may have a substituent, aralkenyl group which may have a substituent (the carbon number of the aryl portion is 6 to 10, the carbon of the alkenyl portion The number of atoms represents 2 to 6), a heteroarylalkenyl group which may have a substituent (the heteroaryl group contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkenyl part represents 2~6), cycloalkylalkenyl which may have a substituent (the number of carbon atoms in the cycloalkyl portion is 3-6, and the number of carbon atoms in the alkenyl portion represents 2-6), C 4- which may have a substituent 6 cycloalkenyl, cycloalkenyl alkyl which may have a substituent (the number of carbon atoms in the cycloalkenyl part is 4 to 6, and the number of carbon atoms in the alkylene part represents 1 to 5), cycloalkene which may have a substituent Alkenyl (the number of carbon atoms in the cycloalkenyl part is 4 to 6, and the number of carbon atoms in the alkenyl part represents 2 to 6), aryl which may have a substituent, or heteroaryl which may have a substituent (heteroaryl Contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5); or, R 20 and R 21 are bonded to indicate that they may have a substituent In addition, a cyclic amine group having 4 to 8 member rings, or any one of R 20 and R 21 may be combined with any one of R 9 , R 10 and R 11 to form an internal amide ring which may have a substituent).
如請求項1之製造方法,其中R1 為選自下列之取代基:可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。The manufacturing method according to claim 1, wherein R 1 is a substituent selected from the group consisting of C 1-10 alkyl which may have a substituent, and cycloalkylalkyl which may have a substituent (the number of carbon atoms in the cycloalkyl portion It is 3~6, and the number of carbon atoms in the alkylene moiety represents 1~5), and the aralkyl group which may have a substituent (the number of carbon atoms in the aryl moiety is 6~10, and the number of carbon atoms in the alkylene moiety represents 1 ~5), optionally substituted C 2-6 alkenyl, optionally substituted C 6-10 aryl, or optionally substituted heteroaryl (heteroaryl includes those selected from N, O, and S 1 to 4 heteroatoms are used as ring-constituting atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5). 如請求項1之製造方法,其中R4 為氫原子或鹵素原子。The manufacturing method according to claim 1, wherein R 4 is a hydrogen atom or a halogen atom. 如請求項1之製造方法,其中R5 及R6 為氫原子。The manufacturing method according to claim 1, wherein R 5 and R 6 are hydrogen atoms. 如請求項1之製造方法,其中R7 及R8 為氫原子。The manufacturing method according to claim 1, wherein R 7 and R 8 are hydrogen atoms. 如請求項1之製造方法,其中R9 為氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。The manufacturing method according to claim 1, wherein R 9 is a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a cycloalkyl group which may have a substituent, an aryl group which may have a substituent, or a hetero group which may have a substituent Aryl (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5). 如請求項1之製造方法,其中R10 為氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。The manufacturing method according to claim 1, wherein R 10 is a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a cycloalkyl group which may have a substituent, an aryl group which may have a substituent, or a hetero group which may have a substituent Aryl (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5). 如請求項1之製造方法,其中R11 為氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)。The manufacturing method according to claim 1, wherein R 11 is a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a cycloalkyl group which may have a substituent, an aryl group which may have a substituent, or a hetero group which may have a substituent Aryl (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5). 如請求項1之製造方法,其中R12 為-C(=O)OR13 基、-C(=O)-R14 基、-OR15 基、-NR16 R17 基、-C(OH)R18 R19 基、-C(NR16 R17 )R18 R19 基或-C(=O)NR20 R21 基(R13 ~R20 及R21 同前所示)。As in the manufacturing method of claim 1, wherein R 12 is -C(=O)OR 13 group, -C(=O)-R 14 group, -OR 15 group, -NR 16 R 17 group, -C(OH) R 18 R 19 group, -C(NR 16 R 17 )R 18 R 19 group or -C(=O)NR 20 R 21 group (R 13 ~R 20 and R 21 are the same as above). 如請求項1之製造方法,其中R3 為可具有取代基之C1-10 烷基。The manufacturing method according to claim 1, wherein R 3 is a C 1-10 alkyl group which may have a substituent. 如請求項1之製造方法,其中R2 為可具有取代基之C1-10 烷基。The manufacturing method according to claim 1, wherein R 2 is a C 1-10 alkyl group which may have a substituent. 如請求項1之製造方法,其中前述通式(II)所示化合物係選自下列編號1~48所示化合物之化合物或其鹽。 [化學式3]
Figure 03_image020
[化學式4]
Figure 03_image022
[化學式5]
Figure 03_image024
[化學式6]
Figure 03_image026
[化學式7]
Figure 03_image028
[化學式8]
Figure 03_image030
[化學式9]
Figure 03_image032
[化學式10]
Figure 03_image034
[化學式11]
Figure 03_image036
[化學式12]
Figure 03_image038
The manufacturing method according to claim 1, wherein the compound represented by the aforementioned general formula (II) is a compound selected from the compounds represented by the following numbers 1 to 48 or a salt thereof. [Chemical Formula 3]
Figure 03_image020
[Chemical Formula 4]
Figure 03_image022
[Chemical Formula 5]
Figure 03_image024
[Chemical Formula 6]
Figure 03_image026
[Chemical Formula 7]
Figure 03_image028
[Chemical Formula 8]
Figure 03_image030
[Chemical Formula 9]
Figure 03_image032
[Chemical Formula 10]
Figure 03_image034
[Chemical Formula 11]
Figure 03_image036
[Chemical Formula 12]
Figure 03_image038
如請求項1之製造方法,其中前述通式(I)之化合物為酸加成鹽之形態。The manufacturing method according to claim 1, wherein the compound of the general formula (I) is in the form of an acid addition salt. 如請求項13之製造方法,其中如請求項13之酸加成鹽選自礦酸類、有機羧酸類或磺酸類。The manufacturing method according to claim 13, wherein the acid addition salt according to claim 13 is selected from mineral acids, organic carboxylic acids or sulfonic acids. 如請求項14之製造方法,其中酸加成鹽選自鹽酸、硫酸、甲酸、草酸、乙酸、檸檬酸、三氯乙酸、三氟乙酸、順丁烯二酸、反丁烯二酸、甲磺酸、苯磺酸、對甲苯磺酸、均三甲苯磺酸或萘磺酸。The manufacturing method according to claim 14, wherein the acid addition salt is selected from hydrochloric acid, sulfuric acid, formic acid, oxalic acid, acetic acid, citric acid, trichloroacetic acid, trifluoroacetic acid, maleic acid, fumaric acid, methanesulfonic acid Acid, benzenesulfonic acid, p-toluenesulfonic acid, mesitylenesulfonic acid or naphthalenesulfonic acid. 如請求項1之製造方法,其中如請求項1之三氟化硼錯合物選自三氟化硼-醚錯合物、三氟化硼-水錯合物、三氟化硼-醇錯合物、三氟化硼-胺錯合物、三氟化硼-酚錯合物、三氟化硼-硫化物錯合物、三氟化硼-亞碸錯合物、三氟化硼-羧酸錯合物或三氟化硼-磷酸錯合物等。The manufacturing method according to claim 1, wherein the boron trifluoride complex according to claim 1 is selected from boron trifluoride-ether complex, boron trifluoride-water complex, boron trifluoride-alcohol complex Compound, boron trifluoride-amine complex, boron trifluoride-phenol complex, boron trifluoride-sulfide complex, boron trifluoride-sulfonate complex, boron trifluoride- Carboxylic acid complex or boron trifluoride-phosphate complex, etc. 如請求項16之製造方法,其中如請求項16之三氟化硼錯合物選自三氟化硼-醚錯合物、三氟化硼-醇錯合物或三氟化硼-羧酸錯合物。The manufacturing method according to claim 16, wherein the boron trifluoride complex according to claim 16 is selected from boron trifluoride-ether complex, boron trifluoride-alcohol complex or boron trifluoride-carboxylic acid Complex. 如請求項1之製造方法,其使用相對於前述化合物(I)為1~50重量倍之三氟化硼錯合物。According to the manufacturing method of claim 1, boron trifluoride complex compound is used in an amount of 1 to 50 times by weight relative to the aforementioned compound (I). 如請求項1之製造方法,其中前述溶劑選自羧酸類、羧酸酯類、醇類、烴類、鹵烷類、腈類、醚類、酮類、醯胺類、亞碸類、脲類或碳酸酯類。The manufacturing method according to claim 1, wherein the aforementioned solvent is selected from carboxylic acids, carboxylic acid esters, alcohols, hydrocarbons, haloalkanes, nitriles, ethers, ketones, amides, sulfonamides, ureas Or carbonates. 如請求項19之製造方法,其中前述溶劑選自羧酸類、烴類、腈類或醚類。The manufacturing method according to claim 19, wherein the aforementioned solvent is selected from carboxylic acids, hydrocarbons, nitriles or ethers. 如請求項19之製造方法,其中前述溶劑選自乙酸、乙腈、甲苯或二甲苯。The manufacturing method according to claim 19, wherein the aforementioned solvent is selected from acetic acid, acetonitrile, toluene or xylene. 如請求項1至21中任一項之製造方法,其使前述化合物(I)與三氟化硼錯合物於溶劑中反應時之反應溫度為20~150℃之範圍。The manufacturing method according to any one of claims 1 to 21, wherein the reaction temperature when the compound (I) and boron trifluoride complex is reacted in a solvent is in the range of 20 to 150°C. 一種下式所示化合物之酸加成鹽; [化學式13]
Figure 03_image001
(式中,R1 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C3-6 環烷基、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5); R2 表示可具有取代基之C1-10 烷基、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)或可具有取代基之C2-6 烯基; R3 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5); R4 表示氫原子、可具有取代基之C1-10 烷基、-OR22 基(R22 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之芳基或可具有取代基之C1-6 烷醯基)、鹵素原子、氰基、胺甲醯基、可具有取代基之醯基、硝基及可具有取代基之胺基; R5 與R6 相同或互異,表示氫原子、氟原子或羥基; R7 與R8 相同或互異,表示氫原子、氟原子或羥基,或者,R7 及R8 與所鍵結之碳共同表示羰基); R9 、R10 、R11 相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5);或者,R9 與R10 鍵結而表示可具有取代基之C3-6 飽和烴環,R9 及R10 中任一者與R11 鍵結而表示可具有取代基之C3-6 飽和烴環或可具有取代基之C3-6 環烯烴; R12 表示-C(=O)OR13 基(R13 表示氫原子、可具有取代基之C1-10 烷基或羧基保護基)、-C(=O)-R14 基(R14 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5))、-OR15 基(R15 表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之芳基、可具有取代基之雜芳基或羥基保護基)、-NR16 R17 基(R16 與R17 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之C6-10 芳基、可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5))、或胺基保護基、-C(OR15 )R18 R19 基(R18 與R19 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之C6-10 芳基或可具有取代基之雜芳基)、或-C(NR16 R17 )R18 R19 基(R16 、R17 、R18 、R19 同前所示)、-C(=O)NR20 R21 基(R20 與R21 可相同或互異,表示氫原子、可具有取代基之C1-10 烷基、可具有取代基之C3-6 環烷基、可具有取代基之環烷基烷基(環烷基部分之碳原子數為3~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之芳烷基(芳基部分之碳原子數為6~10,伸烷基部分之碳原子數表示1~5)、可具有取代基之雜芳烷基(雜芳基為包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5)、可具有取代基之C2-6 烯基、可具有取代基之芳烯基(芳基部分之碳原子數為6~10,烯基部分之碳原子數表示2~6)、可具有取代基之雜芳烯基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子、烯基部分之碳原子數表示2~6)、可具有取代基之環烷基烯基(環烷基部分之碳原子數為3~6,烯基部分之碳原子數表示2~6)、可具有取代基之C4-6 環烯基、可具有取代基之環烯基烷基(環烯基部分之碳原子數為4~6,伸烷基部分之碳原子數表示1~5)、可具有取代基之環烯基烯基(環烯基部分之碳原子數為4~6,烯基部分之碳原子數表示2~6)、可具有取代基之芳基或可具有取代基之雜芳基(雜芳基包含選自N、O及S中之1~4個雜原子作為環構成原子,伸烷基部分之碳原子數表示1~5);或者,R20 與R21 鍵結而表示可具有取代基且4~8員環之環狀胺基,或R20 及R21 中任一者可與R9 、R10 及R11 中任一者共同形成可具有取代基之內醯胺環)。
An acid addition salt of a compound represented by the following formula; [Chemical Formula 13]
Figure 03_image001
(In the formula, R 1 represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a cycloalkyl alkyl group which may have a substituent (the number of carbon atoms of the cycloalkyl portion is 3 to 6, and the alkylene portion The number of carbon atoms represents 1 to 5), the aralkyl group which may have a substituent (the number of carbon atoms of the aryl portion is 6 to 10, and the number of carbon atoms of the alkylene portion represents 1 to 5), which may have a substituent Heteroaralkyl (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5), C 3 which may have a substituent -6 cycloalkyl, optionally substituted C 2-6 alkenyl, optionally substituted C 6-10 aryl, or optionally substituted heteroaryl (heteroaryl includes selected from N, O, and S Among them, 1 to 4 heteroatoms are used as ring constituent atoms, and the number of carbon atoms in the alkylene extension means 1 to 5); R 2 represents a C 1-10 alkyl group which may have a substituent, and an aralkyl group which may have a substituent (The number of carbon atoms in the aryl moiety is 6 to 10, and the number of carbon atoms in the alkylene moiety represents 1 to 5). Heteroaralkyl groups which may have a substituent (heteroaryl groups include those selected from N, O and S 1 to 4 heteroatoms are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5) or C 2-6 alkenyl which may have a substituent; R 3 represents a hydrogen atom and C 1 which may have a substituent -10 alkyl, optionally substituted cycloalkylalkyl (the number of carbon atoms in the cycloalkyl portion is 3 to 6, and the number of carbon atoms in the alkylene portion represents 1 to 5), aralkyl which may have a substituent Group (the number of carbon atoms in the aryl part is 6~10, and the number of carbon atoms in the alkylene part represents 1~5), heteroaralkyl which may have a substituent (heteroaryl includes selected from N, O and S One to four heteroatoms are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5), C 2-6 alkenyl which may have a substituent, C 6-10 aryl which may have a substituent, or Heteroaryl group which may have a substituent (heteroaryl group contains 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkylene portion represents 1 to 5); R 4 represents Hydrogen atom, optionally substituted C 1-10 alkyl group, -OR 22 group (R 22 represents a hydrogen atom, optionally substituted C 1-10 alkyl group, optionally substituted aryl group or optionally substituted group C 1-6 alkyl amide group), halogen atom, cyano group, amine methyl amide group, optionally substituted acetyl group, nitro group and optionally substituted amine group; R 5 and R 6 are the same or different from each other, Represents a hydrogen atom, a fluorine atom or a hydroxyl group; R 7 and R 8 are the same or different from each other, represent a hydrogen atom, a fluorine atom or a hydroxyl group, or R 7 and R 8 together with the carbon to which they are bonded represent a carbonyl group); R 9 and R 10 , R 11 is the same or different from each other, represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a C 3-6 cycloalkyl group which may have a substituent, a cycloalkyl alkyl group which may have a substituent (ring The number of carbon atoms in the alkyl part is 3~6, and the number of carbon atoms in the alkylene part indicates 1~5), aralkyl which may have a substituent (carbon in the aryl part) The number of atoms is 6~10, and the number of carbon atoms in the alkylene portion represents 1~5), heteroaralkyl groups which may have substituents (heteroaryl groups contain 1 to 4 heteroatoms selected from N, O and S As a ring constituent atom, the number of carbon atoms in the alkylene moiety represents 1 to 5), a C 6-10 aryl group which may have a substituent, or a heteroaryl group which may have a substituent (the heteroaryl group includes a group selected from N, O, and 1 to 4 heteroatoms in S are used as ring-forming atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5); or, R 9 and R 10 are bonded to represent a C 3-6 saturated hydrocarbon which may have a substituent Ring, any one of R 9 and R 10 is bonded to R 11 to represent a C 3-6 saturated hydrocarbon ring which may have a substituent or a C 3-6 cycloalkene which may have a substituent; R 12 represents -C(= O) OR 13 group (R 13 represents a hydrogen atom, a C 1-10 alkyl group or a carboxyl protecting group which may have a substituent), -C(=O)-R 14 group (R 14 represents a hydrogen atom, which may have a substituent C 1-10 alkyl, C 6-10 aryl which may have a substituent, or heteroaryl which may have a substituent (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S as rings Constituent atoms, the number of carbon atoms in the alkylene moiety represents 1 to 5)), -OR 15 group (R 15 represents a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a C 3-6 which may have a substituent) Cycloalkyl, optionally substituted aryl, optionally substituted heteroaryl or hydroxy protecting group), -NR 16 R 17 group (R 16 and R 17 may be the same or different from each other, indicating a hydrogen atom, may have C 1-10 alkyl group for substituents, C 3-6 cycloalkyl group for substituents, C 6-10 aryl group for substituents, heteroaryl group for substituents (heteroaryl groups include 1 to 4 heteroatoms in N, O and S are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5)), or amine protecting group, -C(OR 15 )R 18 R 19 group (R 18 and R 19 may be the same or different from each other, and represent a hydrogen atom, a C 1-10 alkyl group that may have a substituent, a C 3-6 cycloalkyl group that may have a substituent, a C 6-10 that may have a substituent Aryl or heteroaryl which may have a substituent), or -C (NR 16 R 17 ) R 18 R 19 group (R 16 , R 17 , R 18 , R 19 are the same as shown above), -C (=O )NR 20 R 21 group (R 20 and R 21 may be the same or different from each other, indicating a hydrogen atom, a C 1-10 alkyl group which may have a substituent, a C 3-6 cycloalkyl group which may have a substituent, may have a substitution Cycloalkylalkyl group (the number of carbon atoms in the cycloalkyl portion is 3~6, the number of carbon atoms in the alkylene portion represents 1~5), the aralkyl group which may have a substituent (carbon atoms in the aryl portion The number is from 6 to 10, and the number of carbon atoms in the alkylene portion represents 1 to 5), and heteroarylalkyl group which may have a substituent (heteroaryl group includes 1 to 4 heteroatoms selected from N, O, and S As ring constituent atoms, alkylene The number of carbon atoms in the part represents 1 to 5), C 2-6 alkenyl which may have a substituent, aryl alkenyl which may have a substituent (the number of carbon atoms in the aryl part is 6 to 10, and the carbon atoms in the alkenyl part The number represents 2 to 6), a heteroarylalkenyl group which may have a substituent (the heteroaryl group includes 1 to 4 heteroatoms selected from N, O, and S as ring constituent atoms, and the number of carbon atoms in the alkenyl portion represents 2 ~6), cycloalkylalkenyl which may have a substituent (the number of carbon atoms in the cycloalkyl part is 3-6, and the number of carbon atoms in the alkenyl part represents 2-6), C 4-6 which may have a substituent Cycloalkenyl, optionally substituted cycloalkenylalkyl (cycloalkenyl moiety has 4 to 6 carbon atoms, alkylene moiety has 1 to 5 carbon atoms), and optionally substituted cycloalkenyl Alkenyl (the number of carbon atoms in the cycloalkenyl moiety is 4-6, and the number of carbon atoms in the alkenyl moiety represents 2-6), aryl which may have a substituent or heteroaryl which may have a substituent (heteroaryl contains 1 to 4 heteroatoms selected from N, O, and S are used as ring constituent atoms, and the number of carbon atoms in the alkylene moiety represents 1 to 5); or, R 20 and R 21 are bonded to indicate that they may have a substituent and A cyclic amine group of 4-8 member rings, or any one of R 20 and R 21 may together with any one of R 9 , R 10 and R 11 form an internal amide ring which may have a substituent).
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