TW202001137A - Vacuum valve characterized in providing a vacuum gate valve capable of controlling an opening degree with a high accuracy for enabling a treatment chamber to be in a vacuum status - Google Patents
Vacuum valve characterized in providing a vacuum gate valve capable of controlling an opening degree with a high accuracy for enabling a treatment chamber to be in a vacuum status Download PDFInfo
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本發明係關於一種例如為了將處理腔室內設為真空而使用之真空閥。The present invention relates to, for example, a vacuum valve used for vacuuming a processing chamber.
在半導體裝置的製造步驟中,利用各種處理腔室,例如進行基於蝕刻、CVD(化學氣相沉積)或者PVD(物理沉積)之薄膜處理。為了將該處理腔室內調整為所希望的壓力,使用真空泵及真空用閘閥。真空用閘閥配置於處理腔室的開口與真空泵的吸氣口之間。作為該真空用閘閥,有時採用擺動式的真空用閘閥。擺動式的真空用閘閥中,藉由閥板沿橫向擺動,調整連通處理腔室與真空泵之流路的開度。 擺動式的真空用閘閥中,為了使閥板平滑地擺動,在閥板與外殼之間設置有若干間隙。藉此,閥板在密封閘閥的開口時,為了封閉上述間隙,閥板緊貼於外殼。 提出有為了實現閥板與外殼的緊貼,藉由彈簧,將閥板按壓於外殼(例如,參閱專利文獻1)。 (先前技術文獻) (專利文獻) 專利文獻1:日本特開2003-185035號公報In the manufacturing steps of the semiconductor device, various processing chambers are used, for example, thin film processing based on etching, CVD (Chemical Vapor Deposition) or PVD (Physical Deposition). In order to adjust the processing chamber to a desired pressure, a vacuum pump and a gate valve for vacuum are used. The gate valve for vacuum is arranged between the opening of the processing chamber and the suction port of the vacuum pump. As the gate valve for vacuum, a swing gate valve for vacuum is sometimes used. In the swing gate valve for vacuum, the opening of the flow path connecting the processing chamber and the vacuum pump is adjusted by the valve plate swinging in the lateral direction. In the swing type gate valve for vacuum, in order to smoothly swing the valve plate, some gaps are provided between the valve plate and the housing. Therefore, when the valve plate seals the opening of the gate valve, in order to close the gap, the valve plate is closely attached to the housing. proposes that in order to achieve close contact between the valve plate and the housing, the valve plate is pressed against the housing by a spring (for example, see Patent Document 1). (Prior Art Literature) (Patent Literature) Patent Literature 1: Japanese Patent Laid-Open No. 2003-185035
[發明所要解決的問題] 本發明的一態樣之例示性目的之一在於提供一種能夠精度良好地控制閥的開度之真空用閘閥。 [用以解決問題之手段] 依本發明的一態樣,提供一種真空閥,其具備:外殼,其具有開口;閥板,其能夠覆蓋前述開口;驅動源;環狀旋轉體,其具備:外壁、內壁、連結前述外壁與前述內壁之底壁、形成於前述底壁之彎曲長孔、及固定於前述內壁及前述外壁中的至少一方之升降銷,並藉由來自前述驅動源的驅動力旋轉;棒狀支撐構件,其配置於前述旋轉體的前述外壁與前述內壁之間,具備貫通前述底壁的前述彎曲長孔而固定於前述外殼之第1端部、及將前述旋轉體支撐於旋轉軸向之寬徑部;環狀升降軆,其支撐密封環,並且具有:配置於前述旋轉體的前述外壁與前述內壁之間,供前述旋轉體的前述升降銷插入之傾斜長孔,藉由前述升降銷隨著前述旋轉體的旋轉而在前述傾斜長孔內移動,而與前述密封環一同相對於前述旋轉體朝向前述旋轉軸方向升降;及第1滑動構件,其配置於前述旋轉體的前述底壁與前述支撐構件的前述寬徑部之間。 另外,在方法、裝置、系統等之間相互置換以上構成要素的任意組合或本發明的構成要素或表現者亦作為本發明的應對而有效。 [發明效果] 依本發明,能夠精度良好地控制真空用閘閥的開度。[Problems to be Solved by the Invention] One of the exemplary objects of one aspect of the present invention is to provide a vacuum gate valve capable of accurately controlling the opening of a valve. [Means to solve the problem] According to one aspect of the present invention, there is provided a vacuum valve including: a housing having an opening; a valve plate capable of covering the opening; a driving source; and a ring-shaped rotating body including: The outer wall, the inner wall, the bottom wall connecting the outer wall and the inner wall, the curved long hole formed in the bottom wall, and the lift pin fixed to at least one of the inner wall and the outer wall, and The driving force of the rod rotates; a rod-shaped support member, which is arranged between the outer wall and the inner wall of the rotating body, is provided with the curved long hole penetrating the bottom wall to be fixed to the first end of the housing, and the The rotating body is supported by a wide-diameter portion of the rotating axis; an annular lifting shaft, which supports a seal ring, and has: disposed between the outer wall and the inner wall of the rotating body, for inserting the lifting pin of the rotating body The inclined long hole moves in the inclined long hole by the lifting pin as the rotating body rotates, and moves up and down in the direction of the rotation axis relative to the rotating body together with the seal ring; and the first sliding member, which It is arranged between the bottom wall of the rotating body and the wide-diameter portion of the support member. In addition, any combination of the above constituent elements or the constituent elements or expressors of the present invention which are mutually substituted among methods, devices, systems, etc. are also effective as a countermeasure of the present invention. [Effect of the Invention] According to the present invention, the opening degree of the vacuum gate valve can be accurately controlled.
本發明的一實施形態之真空閥(本真空閥)具備:外殼,其具有開口;閥板,其能夠覆蓋前述開口;驅動源;環狀旋轉體,其具備外壁、內壁、連結前述外壁與前述內壁之底壁、形成於前述底壁之彎曲長孔、及固定於前述內壁及前述外壁中的至少一方之升降銷,並藉由來自前述驅動源的驅動力旋轉;棒狀支撐構件,配置於前述旋轉體的前述外壁與前述內壁之間,具備:貫通前述底壁的前述彎曲長孔而固定於前述外殼之第1端部、及支撐前述旋轉體之寬徑部;環狀升降體,其支撐密封環,並且具有:配置於前述旋轉體的前述外壁與前述內壁之間,供前述旋轉體的前述升降銷插入之傾斜長孔,藉由前述升降銷隨著前述旋轉體的旋轉而在前述傾斜長孔內移動,而與前述密封環一同相對於前述旋轉體朝向前述旋轉軸方向升降;及第1滑動構件,其配置於前述旋轉體的前述底壁與前述支撐構件的前述寬徑部之間。 本真空閥能夠藉由旋轉體的旋轉量調整密封環的位置。亦即,能夠機械控制密封環的位置。故,能夠以高精度控制真空閥的開度。並且,第1滑動構件減少旋轉體與支撐構件之間的摩擦阻力。藉此,旋轉體能夠藉由來自驅動源的驅動力平滑地旋轉。 並且,前述第1滑動構件可包含第1滑動用滾珠,前述旋轉體可還具有用以保持前述第1滑動用滾珠之滾珠槽。藉此,能夠抑制第1滑動用滾珠在旋轉體的底壁上分散。亦即,旋轉體能夠良好地保持第1滑動用滾珠。 並且,前述支撐構件可還具備配置於前述旋轉體的前述底壁與前述支撐構件的前述寬徑部之間之環形板,前述環形板可具有用以保持前述第1滑動用滾珠之板槽。此時,第1滑動用滾珠以被滾珠槽與板槽夾住的方式所保持。藉此,能夠更加良好地保持第1滑動用滾珠。 並且,前述滾珠槽可包含形成於前述旋轉體的前述外壁側之第1滾珠槽及形成於前述旋轉體的前述內壁側之第2滾珠槽。此時,保持第1滑動用滾珠之滾珠槽配置於旋轉體的底壁的2處。故,能夠進一步良好地減輕旋轉體與支撐構件的寬徑部之間的摩擦阻力。 並且,前述板槽可包含與前述旋轉體的前述第1滾珠槽相對向之第1板槽及與前述旋轉體的前述第2滾珠槽相對向之第2板槽。此時,第1板槽從與第1滾珠槽相反的一側來保持被保持於第1滾珠槽之第1滑動用滾珠。第2板槽從與前述第2滾珠槽相反的一側來保持被保持於前述第2滾珠槽之第1滑動用滾珠。藉此,能夠更加良好地保持第1滑動用滾珠。 並且,前述閥板可構成為能夠在覆蓋前述開口部之關閉位置與開放前述開口部之開啟位置之間擺動,前述密封環可構成為在前述閥板位於前述關閉位置時能夠移動,以便與前述閥板接觸。依該結構,能夠藉由沿橫向擺動閥板,調整開口部的開度。藉此,能夠在廣範圍控制開口部的開度。 並且,前述外殼可在前述旋轉體的前述底壁與前述外殼之間具備第2滑動構件。故,旋轉體旋轉時,能夠減輕旋轉體與外殼之間的摩擦阻力。 並且,前述升降體可還具備供與前述支撐構件的前述第1端部相反的一側的第2端部插入之滑動孔,沿著前述支撐構件,相對於前述旋轉體升降。藉此,藉由支撐構件,引導升降體的升降動作。其結果,能夠使升降體的升降動作平滑化。 並且,可在前述支撐構件的前述第2端部的外周面與前述滑動孔的內周面之間具備第3滑動構件。此時,升降體相對於旋轉體升降時,能夠減輕升降體的滑動孔的內周面與支撐構件的外周面之間的摩擦阻力。藉此,能夠使升降體的升降動作進一步平滑化。 以下,參閱附圖,對用以實施本發明的形態進行詳細說明。另外,說明中,對相同要素標註相同符號,並適當省略重複說明。並且,以下敘述之結構係例示,並非限定本發明的範圍者。 圖1係表示本發明的一實施形態之真空用閘閥(真空閥)1的配置情況之概略剖面圖。成為排氣對象之真空容器例如為處理腔室C,係未圖示之半導體裝置的一部分。如圖1所示,真空用閘閥1配置於處理腔室C與真空泵P之間。處理腔室C與真空用泵P經由設置於閘閥之流體通道11連通。亦即,真空泵P經由流體通道11排出處理腔室C內的氣體。真空用閘閥1藉由變更流體通道11的開口面積來調整基於真空泵P之排氣速度,將處理腔室C的內部維持於所希望的壓力。並且,若真空用閘閥1完全關閉,則處理腔室C與真空用泵P被隔離,處理腔室被封閉。 真空用閘閥1具備外殼2及閥板4。外殼2的形狀為大致環狀。在外殼2的中心部形成流體通道11。如上所述,流體通道11係氣密地連結處理腔室C的開口與真空泵P的吸氣口之間的流路。故,流體通道11亦能稱作處理腔室C的開口。閥板4容納於外殼2的內部。為了便於說明,將流體通道11中配置有閥板之部位稱作開口12。閥板4能夠在覆蓋開口12之關閉位置與未覆蓋開口12之開啟位置之間移動(擺動)於:與流體通道11所延伸之方向(以下,亦稱作縱向。)大致正交之方向(以下,亦稱作橫向。)。閥板4藉由該擺動調整開口12的開口面積。 閥板4位於關閉位置時,真空用閘閥1能夠採取緊貼狀態或分開狀態。在緊貼狀態下,閥板4是與安裝於後述之密封環55之密封構件56緊貼,而完全密封開口12。在該狀態下,處理腔室C從真空泵P隔離並被密封。另一方面,在分開狀態下,密封構件56從閥板4分開,而在閥板4與密封構件56之間產生縱向間隙。亦即,在分開狀態下,開口12雖被閥板4覆蓋,但由於上述間隙,開口12並不完全被封閉,而是稍微開放。 如此,真空用閘閥1中,閥板4位於關閉位置,處於緊貼狀態時,能夠密封處理腔室C。並且,閥板4位於關閉位置與開啟位置之間,能夠局部覆蓋開口12。而且,閥板4位於關閉位置,處於分開狀態時,能夠稍微開放開口12。如此,藉由細緻地設定在開口12與閥板4之間產生之橫向的開口面積及縱向的開口面積,能夠在廣範圍內控制真空用閘閥1的開度,藉此,能夠在廣範圍內控制處理腔室C內的壓力。 圖2係表示本發明的一實施形態之真空用閘閥1的整體結構之說明圖。圖2中,為了示出容納於外殼本體2A之狀態的旋轉體20,未圖示外殼本體2A的一部分。圖3係本發明的一實施形態之真空用閘閥1的剖面圖。如該等圖所示,真空用閘閥1具備具有上述流體通道11之外殼2、閥板4、馬達6及位置調整部8。 如上所述,閥板4容納於外殼2的內部,能夠在關閉位置與開啟位置之間擺動。馬達6係用以擺動該閥板4之驅動源。閥板4將馬達6的驅動軸作為旋轉軸來擺動。 位置調整部8藉由使升降體50相對於位於關閉位置之閥板4朝軸向移動,來切換緊貼狀態與分開狀態。亦即,位置調整部8使密封構件56朝向流體通道11所延伸之縱向亦即處理腔室C、真空用閘閥1及真空泵P的排列方向(圖3所示之X1或者X2方向)移動。另外,以下中,有時將上述排列方向(X1及X2方向)稱作“軸向”,將與軸向垂直之方向稱作“徑向”,將圍繞軸向之方向稱作“周方向”。周方向係與徑向正交之切線方向。 例如,位置調整部8在閥板4位於關閉位置時(閥板4覆蓋開口12時),能夠使密封環55向靠近閥板4之方向(X1方向)移動,從而使密封構件56緊貼於閥板4。該狀態係緊貼狀態。並且,位置調整部8能夠使處於緊貼狀態之密封環55向遠離閥板4之方向(X2方向)移動,從而在密封構件56與閥板4之間產生間隙。該狀態係分開狀態。另外,位置調整部8能夠在分開狀態下,將密封環55與閥板4的間隔調整為任意距離。 外殼2除了閥板4以外,還容納位置調整部8的一部分(後述之旋轉機構19)。如圖3所示,外殼2可由外殼本體2A及法蘭2B構成。法蘭2B藉由螺栓等,裝卸自如地安裝於外殼本體2A。藉此,藉由裝卸法蘭2B,外殼2能夠開閉自如。藉此,真空用閘閥1中,藉由打開外殼2,能夠輕易地進行位置調整部8的檢查、修理及更換。 圖4係表示位置調整部8的外觀之說明圖。如圖4所示,位置調整部8具備驅動源18及旋轉機構19。旋轉機構19容納於藉由外殼本體2A及法蘭2B所限定之內部空間。 驅動源18例如係馬達。如圖2所示,馬達安裝於外殼2的外側。驅動源18可具有驅動齒輪18b及旋轉齒輪18a。旋轉齒輪18a可容納於外殼2的內部。驅動源18藉由驅動齒輪18b及旋轉齒輪18a,向容納於外殼2的內部空間之旋轉機構19傳遞驅動力。 旋轉機構19包含旋轉體20及升降體50。旋轉體20及升降體50分別具有圓環狀,以包圍流體通道11(開口12)之方式,容納於外殼2的內部空間。旋轉體20經由支撐構件40支撐於法蘭2B。旋轉體20上設置有沿著周方向之彎曲長孔22a。支撐構件40貫通彎曲長孔22a。旋轉體20能夠在彎曲長孔22a的周方向長度的範圍內相對於支撐構件40進行相對旋轉。在旋轉體20的外側面形成有與旋轉齒輪18a嚙合之齒輪槽27。旋轉體20例如將開口12的中心作為旋轉軸,藉由驅動源18旋轉。升降體50並不隨著旋轉體20的旋轉而旋轉,而是相對於旋轉體20,在軸向上相對移動。密封構件56與升降體50一體地在軸向上移動。 以下,對真空用閘閥1的結構進行詳細說明。圖5係旋轉機構19的局部剖面圖,係圖4所示之從AA線箭頭方向剖視之剖面圖。圖5中,為了提高明確性,還一併示出外殼2(外殼本體2A及法蘭2B)及閥板4。如圖5所示,旋轉機構19主要包含支撐於支撐構件40之旋轉體20、與旋轉體卡合之升降體50、支撐於升降體50之密封環55及安裝於密封環55之密封構件56。 如上所述,本真空閥1藉由設置於外殼2的外部之驅動源18驅動旋轉體20。外殼2具有用以將驅動源18的旋轉傳遞至旋轉體20的齒輪槽27之開口。故,外殼2的內部空間的一部分例如供配置旋轉體20之區域成為大氣壓。另一方面,閥板4配置於真空區域。故,真空區域藉由封裝構件57從大氣壓區域密封。隔離真空區域與大氣壓區域之封裝構件57例如係O型環57。作為封裝構件57,可在升降體50的外周面及內周面設置一對O型環57。同樣地,可在密封環55的外周面及內周面設置一對O型環57。比O型環57更靠閥板4之一側(X1側)成為與流體通道11相同的真空。另一方面,比密封構件更遠離閥板4之一側(X2側)成為大氣壓。如此,流體通道11氣密地連通處理腔室C與真空泵P。 圖6係表示支撐構件40的外觀之說明圖。並且,圖7係表示被分解之支撐構件之說明圖。支撐構件40係大致棒狀(銷狀)的構件,貫通旋轉體20的彎曲長孔22a而固定於法蘭2B。支撐構件40包含第1端部43a、寬徑部44及與第1端部43a相反的一側的第2端部43b。在第1端部43a形成有螺紋部42。螺紋部42卡合於設置於法蘭2B之螺孔14a(參閱圖5)。第2端部43b可具備第3滑動構件46。第3滑動構件46例如係滾珠滑塊46。滾珠滑塊46包含中空圓筒狀的本體及配置於本體的側面之複數個小球。該等小球能夠在本體的側面向任意方向旋轉。滾珠滑塊46嵌入於支撐構件40的第2端部43b。 圖8係表示法蘭2B的外觀之說明圖。圖8表示使閥板4側朝上之狀態的法蘭2B。如圖8所示,法蘭2B具備內筒13、槽部14及凸緣部16,係大致環狀的構件。內筒13呈沿軸向延伸之中空圓筒狀的形狀。內筒13的內側係成為流體通道11之空間。凸緣部16具備用以將法蘭2B固定於外殼本體2A之複數個螺紋孔17。槽部14設置於內筒13與凸緣部16之間。槽部14按每一既定間隔而具備複數個螺孔14a。螺孔14a上卡合支撐構件40的螺紋部42。槽部14容納構成旋轉機構19之旋轉體20的一部分。可在槽部14與旋轉體20之間配置第2滑動構件15。第2滑動構件15例如係複數個法蘭滾珠15。法蘭滾珠15沿周方向按每一既定間隔配置。法蘭滾珠15保持為能夠在旋轉體20與槽部14(法蘭2B)之間向任意方向旋轉。故,法蘭滾珠15作為滾珠軸承發揮功能。 圖9係表示法蘭2B及嵌入於該法蘭2B的槽部14之旋轉體20之說明圖。如圖9及圖5所示,旋轉體20係具有凹狀(U字狀)的剖面之環狀構件。亦即,旋轉體20具備外壁21、配置成與外壁同心之內壁23及連結外壁21與內壁23之底壁22。外壁21及內壁23分別係中空圓筒狀的構件,外壁21比內壁22大徑。底壁22係環狀構件,外徑與外壁21的直徑大致一致,內徑與內壁23的直徑大致一致。在底壁22形成有用以供支撐構件40貫通之彎曲長孔22a。彎曲長孔22a可按等間隔形成有複數個。彎曲長孔22a為了相對於支撐構件40容許旋轉體20的旋轉,在周方向上具有與旋轉體20的旋轉量對應之長度。亦即,旋轉體20能夠旋轉至彎曲長孔22a的端部與支撐構件40抵接為止。 在底壁22與支撐構件40之間配置第1滑動構件28。第1滑動構件例如係滾珠。在底壁22之與法蘭2B相反的一側的面設置用以保持滾珠之滾珠槽。圖10表示在底壁22配置有第1滑動構件28之狀態。滾珠槽可設置複數個。例如,可在外壁21與底壁22連接之角部附近形成外側滾珠槽(第1滾珠槽)24。而且,在內壁23與底壁22連接之角部附近可形成內側滾珠槽(第2滾珠槽)25。此時,彎曲長孔22a位於外側滾珠槽與內側滾珠槽之間。 如此,複數個滾珠槽以同心狀夾著彎曲長孔22a而配置。在外側滾珠槽24及內側滾珠槽25上配置複數個底壁滾珠28。如該圖所示,在外側滾珠槽24及內側滾珠槽25,及於其大致周方向整個區域地配置有底壁滾珠28。底壁滾珠28能夠在該等溝內向任意方向旋轉。故,減少旋轉體20相對於支撐構件40旋轉時產生之旋轉體20與支撐構件40之間的摩擦阻力。 圖11係表示環形板30之說明圖。環形板30配置成覆蓋配置有底壁滾珠28之旋轉體20的底壁22。如圖11所示,環形板30係設置有複數個貫通孔32之環狀構件。各貫通孔32係用以供支撐構件40嵌入之開口。貫通孔32的內徑稍大於支撐構件40的外徑。故,若支撐構件40貫通貫通孔32,則環形板30在旋轉方向上的移動被抑制。故,環形板30與支撐構件40一體地被固定,並不會隨著旋轉體20旋轉。 而且,在環形板30的外側及內側,沿著環形板30的圓周方向設置板槽。板槽是對應滾珠槽而設置。例如,設置有外側板槽(第1板槽)34及內側板槽(第2板槽)36。外側板槽34從與外側滾珠槽24相反的一側來保持被保持於外側滾珠槽24之底壁滾珠28。內側板槽36從與內側滾珠槽25相反的一側來保持被保持於內側滾珠槽25之底壁滾珠28。亦即,外側板槽34所形成之圓的直徑是與外側滾珠槽24所形成之圓的直徑一致。內側板槽36所形成之圓的直徑是與內側滾珠槽25所形成之圓的直徑一致。底壁滾珠28被保持為在外側滾珠槽24與外側板槽34之間及在內側滾珠槽25與內側板槽36之間能夠向任意方向旋轉。如此,底壁滾珠28藉由滾珠槽與板槽被夾持為能夠旋轉。亦即,旋轉體20所具備之底壁滾珠28在旋轉體20與環形板30之間作為滾珠軸承發揮功能。 再次利用圖5,對由支撐構件40所形成之旋轉體20的支撐進行敘述。如上所述,設置於支撐構件40的前端之螺紋部42貫通環形板30的貫通孔32及旋轉體20的彎曲長孔22a而與設置於法蘭2B之螺孔14a卡合。寬徑部44在支撐構件40的長邊方向上設置於大致中央。寬徑部44包含作為第1端部43a側的面之第1面44a及作為與第1面44a相反的一側的面且作為第2端部43b側的面之第2面44b。在螺紋部42卡合於螺孔14a之狀態下,第1面44a與環形板30接觸。亦即,寬徑部44藉由該第1面44a,在與法蘭2b之間夾入旋轉體20及環形板30。另一方面,寬徑部44的第2面44b與升降體50的上表面相對向。寬徑部44的徑向寬度稍小於外壁21與內壁23之間的徑向間隙。故,寬徑部44配置於外壁21與內壁23之間。如此,旋轉體20藉由支撐構件40被支撐為能夠旋轉。 圖12係從斜上方顯示升降體50之說明圖。如圖12所示,升降體50係具有以沿著軸向之方式設置於上表面之複數個滑動孔54及設置於側面之複數個傾斜長孔52之環狀構件。滑動孔54配置於與支撐構件40對應之位置。如圖5所示,升降體50中,在滑動孔54插入支撐構件40的第2端部43b。滑動孔54的內徑稍大於支撐構件40的第2端部43b的外徑。支撐構件40的第2端部43b與滑動孔之間可設置上述滾珠滑塊6。藉由如此的結構,升降體50能夠沿軸向移動。另一方面,升降體50的旋轉被支撐構件40限制。 旋轉體20具有升降銷26,該升降銷26在周方向上,在與支撐構件40不同的位置,固定於外壁21或內壁23中的至少一方上,並沿徑向延伸。升降銷26的兩端分別支撐於外壁21與內壁23為較佳。故,升降銷26隨著旋轉體20的旋轉而旋轉。升降銷26可沿周方向以既定間隔配置複數個。例如,可沿周方向交替地配置支撐構件40與升降銷26。升降銷26卡合於升降體50的傾斜長孔52來支撐升降體50。 傾斜長孔52係沿徑向貫通升降體50之長孔,以相對於軸向以及與軸向垂直之面的雙方呈傾斜之方式延伸。如上所述,升降體50藉由與支撐構件40的卡合而無法旋轉。藉此,若旋轉體20旋轉,則升降銷26在傾斜長孔52內移動,伴隨該移動,升降體50沿軸向移動。故,傾斜長孔52的周方向長度具有與旋轉體20的旋轉量相對應之長度。 再次利用圖5,對升降體50與密封環55的結構進行敘述。如圖5所示,在升降體50的下表面安裝密封環55。密封環55係與升降體50相同的圓環狀構件,與升降體50一體地移動。密封環55的上表面,可考慮維修性而藉由能夠拆卸的嵌合機構固定於升降體50的下表面。密封環55在其下表面具有密封構件56。密封構件56例如係O型環。若升降體50沿X1方向移動,則密封環55(密封構件56)與閥板4接觸。 如此,本實施形態中,藉由旋轉體20的旋轉,環狀升降體50與密封環55一同升降。藉此,本實施形態中,藉由升降之環狀升降體50,能夠及於圓板狀的閥板4的整周而按壓(保持)密封環55。藉此,能夠良好地抑制在閥板4與密封構件56之間產生間隙,保持緊貼狀態(處理腔室C的密封狀態)。 圖13及圖14係用以說明旋轉機構19的動作之立體圖。圖13及圖14中,為了顯示出升降體50的傾斜長孔52與升降銷26的卡合狀態,因而未圖示旋轉體20的外壁21的一部分。如上所述,旋轉機構19中,末端固定於外壁21上之複數個升降銷26插入於升降體50的傾斜長孔52。插入於傾斜長孔52之升降銷26的前端固定於旋轉體20的內壁23。為了使傾斜長孔52與升降銷26的相對移動平滑化,升降銷26可在其外周具有軸承。如此,升降體50相對於旋轉體20機械性地卡合。如上所述,傾斜長孔52相對於軸向傾斜延伸。並且,升降體50的旋轉受到支撐構件40的限制。故,若旋轉體20旋轉,則升降銷26在傾斜長孔52內相對移動,並且升降體50沿軸向升降。 圖13表示旋轉體20的升降銷26位於處於傾斜長孔52的最下位之始端之狀態。在該狀態下,升降體50位於最上位。亦即,係密封環55與閥板4的軸向距離變得最大之狀態。在該狀態下,容許閥板4的擺動。 將處理腔室C的壓力設為較高時,升降銷26朝向位於傾斜長孔52的最上位之終端移動。隨著升降銷26的移動,升降體50被升降銷26下壓。隨此,密封環55與閥板4的軸向距離變小。 圖14表示旋轉體20的升降銷26位於處於傾斜長孔52的最上位之終端之狀態。在該狀態下,升降體50位於最下位。亦即,密封環55(密封構件56)與閥板4接觸。 尤其,在分開狀態亦即處理腔室C被真空泵P排氣之狀態下,O型環57之上下空間的壓差變大。藉由該壓差,升降體50及密封環55受到向X1方向拉伸之力。升降體50經由升降銷26支撐於旋轉體20,故,旋轉體20亦與升降體50相同地,受到向X1方向拉伸之力。亦即,旋轉體20被壓緊於支撐構件40的寬徑部44。故,藉由O型環57產生之壓差有可能使旋轉體20與寬徑部44的第1面44a之間的滑動阻力上升。若滑動阻力過度上升,則有可能阻礙旋轉體20的旋轉。旋轉體20的阻礙會影響密封環55的升降位置,故,有可能影響處理腔室C的壓力。 關於此,本實施形態中,旋轉體20具有作為第1滑動構件之底壁滾珠28。底壁滾珠28配置於旋轉體20的底壁22與環形板30(支撐構件40的寬徑部44的第1面44a)之間。亦即,旋轉體20經由底壁滾珠28與環形板30(第1面44a)接觸。故,在旋轉體20向閥板4側(環形板30側)被拉伸時,底壁滾珠28亦作為滾珠軸承發揮功能,故,能夠減輕旋轉體20與支撐構件40(環形板30)之間的摩擦阻力。藉此,旋轉體20能夠藉由來自驅動源18的驅動力平滑地旋轉,能夠以高精度調整密封環的位置,故,能夠以高精度控制閥的開度。 並且,本實施形態中,旋轉體20具備用以保持底壁滾珠28之滾珠槽。藉此,能夠抑制底壁滾珠28在旋轉體20的底壁22上分散。亦即,旋轉體20能夠良好地保持底壁滾珠28。而且,在底壁22的外側與內側這2處配置底壁滾珠28,故,能夠進一步良好地減輕旋轉體20與環形板30(支撐構件40的寬徑部44的第1面44a)之間的摩擦阻力。 並且,本實施形態中,具備配置於旋轉體20的底壁22與支撐構件40的寬徑部44之間之環形板30。並且,該環形板30具有用以保持底壁滾珠28之外側板槽34及內側板槽36。外側板槽34從與外側滾珠槽24相反的一側來保持被保持於外側滾珠槽24之底壁滾珠28。內側板槽36從與內側滾珠槽25相反的一側來保持被保持於內側滾珠槽25之底壁滾珠28。藉此,本實施形態中,能夠更加良好地保持底壁滾珠28。 而且,本實施形態中,法蘭2B在槽部14具備作為第2滑動構件15之複數個法蘭滾珠15,該等法蘭滾珠15與旋轉體20接觸。亦即,旋轉體20經由法蘭滾珠15與法蘭2B接觸。故,旋轉體20旋轉時,法蘭滾珠15作為滾珠軸承發揮功能,故,能夠減輕旋轉體20與法蘭2B(槽部14)之間的摩擦阻力。藉此,旋轉體20能夠藉由來自驅動源18的驅動力更加平滑地旋轉。 並且,本實施形態中,在升降體50的滑動孔54與支撐構件40之間具備滾珠滑塊46。藉此,能夠藉由支撐構件40支持升降體50的升降動作。其結果,能夠使升降體50的升降動作平滑化。 以上,依據實施形態對本發明進行了說明。本發明並不限定於上述實施形態,本領域技術人員應可理解能夠進行各種設計變更,能夠實現各種變形例,並且該種變形例亦在本發明的範圍內。 本實施形態中,閥板4能夠藉由馬達6的驅動力,在關閉位置與開啟位置之間移動(擺動)。然而,閥板4亦可固定於關閉位置。此時,藉由閥板4的狀態(緊貼狀態或者分開狀態)調整處理腔室C的真空度。 本實施形態中,第1滑動構件28、第2滑動構件15、第3滑動構件46分別係滾珠。然而,各滑動構件並不限於此,亦可以係針狀等任意形狀。 本實施形態中,旋轉體20具有8個升降銷26,升降體50具有8個傾斜長孔52。然而,升降銷26及傾斜長孔52的數量並不限於此,可以是任意數量。 並且,本實施形態中,在旋轉體20的底壁22設置有環形板30,旋轉體20隔著環形板30與支撐構件40的第1面44a相對向。然而,並不限定於此,旋轉體20亦可不具備環形板30。此時,旋轉體20經由底壁滾珠28與支撐構件40的第1面44a接觸。並且,底壁滾珠28能夠在旋轉體20與支撐構件40的第1面44a之間作為滾珠軸承發揮功能,減輕該等之間的摩擦阻力。 [產業上的可利用性] 本發明例如能夠運用於為了將處理腔室內設為真空而使用之真空用閥。A vacuum valve (present vacuum valve) according to an embodiment of the present invention includes: a housing having an opening; a valve plate capable of covering the opening; a driving source; a ring-shaped rotating body including an outer wall, an inner wall, and connecting the outer wall with A bottom wall of the inner wall, a curved long hole formed in the bottom wall, and a lifting pin fixed to at least one of the inner wall and the outer wall, and rotated by a driving force from the driving source; a rod-shaped support member Arranged between the outer wall and the inner wall of the rotating body, including: a first end portion fixed to the housing through the curved long hole passing through the bottom wall, and a wide-diameter portion supporting the rotating body; The lifting body supports the seal ring, and has an inclined long hole which is arranged between the outer wall and the inner wall of the rotating body and into which the lifting pin of the rotating body is inserted, and the rotating body follows the rotating body by the lifting pin Rotating to move in the oblique oblong hole and move up and down with the seal ring relative to the rotating body in the direction of the rotation axis; and a first sliding member disposed on the bottom wall of the rotating body and the support member Between the aforementioned wide-diameter portions. This vacuum valve can adjust the position of the seal ring by the amount of rotation of the rotating body. That is, the position of the seal ring can be mechanically controlled. Therefore, the opening degree of the vacuum valve can be controlled with high accuracy. In addition, the first sliding member reduces the frictional resistance between the rotating body and the support member. With this, the rotating body can be smoothly rotated by the driving force from the driving source. Also, the first sliding member may include a first sliding ball, and the rotating body may further have a ball groove for holding the first sliding ball. With this, it is possible to suppress the first sliding balls from being scattered on the bottom wall of the rotating body. That is, the rotating body can hold the first sliding ball well. In addition, the support member may further include an annular plate disposed between the bottom wall of the rotating body and the wide-diameter portion of the support member, and the annular plate may have a plate groove for holding the first sliding ball. At this time, the first sliding ball is held so as to be sandwiched between the ball groove and the plate groove. With this, the first sliding ball can be held more favorably. In addition, the ball groove may include a first ball groove formed on the outer wall side of the rotating body and a second ball groove formed on the inner wall side of the rotating body. At this time, the ball groove holding the first sliding ball is arranged at two places on the bottom wall of the rotating body. Therefore, the friction resistance between the rotating body and the wide-diameter portion of the support member can be further reduced satisfactorily. Also, the plate groove may include a first plate groove facing the first ball groove of the rotating body and a second plate groove facing the second ball groove of the rotating body. At this time, the first plate groove holds the first sliding ball held by the first ball groove from the side opposite to the first ball groove. The second plate groove holds the first sliding ball held by the second ball groove from the side opposite to the second ball groove. With this, the first sliding ball can be held more favorably. Also, the valve plate may be configured to be swingable between a closed position covering the opening and an open position to open the opening, and the seal ring may be configured to be movable when the valve plate is in the closed position so as to The valve plate is in contact. According to this structure, the opening of the opening can be adjusted by swinging the valve plate in the lateral direction. With this, the opening degree of the opening can be controlled in a wide range. Also, the housing may include a second sliding member between the bottom wall of the rotating body and the housing. Therefore, when the rotating body rotates, the frictional resistance between the rotating body and the housing can be reduced. Also, the lifting body may further include a slide hole into which the second end portion opposite to the first end portion of the support member is inserted, and move up and down relative to the rotating body along the support member. Thereby, the lifting movement of the lifting body is guided by the supporting member. As a result, the lifting operation of the lifting body can be smoothed. In addition, a third sliding member may be provided between the outer peripheral surface of the second end portion of the support member and the inner peripheral surface of the sliding hole. At this time, when the lifting body moves up and down relative to the rotating body, the frictional resistance between the inner peripheral surface of the sliding hole of the lifting body and the outer peripheral surface of the support member can be reduced. Thereby, the lifting operation of the lifting body can be further smoothed. Hereinafter, referring to the drawings, a detailed description will be given of a mode for carrying out the present invention. In addition, in the description, the same elements are denoted by the same symbols, and duplication of description will be appropriately omitted. In addition, the structure described below is an example and does not limit the scope of the present invention. FIG. 1 is a schematic cross-sectional view showing the arrangement of a vacuum gate valve (vacuum valve) 1 according to an embodiment of the present invention. The vacuum container to be exhausted is, for example, the processing chamber C, and is a part of a semiconductor device (not shown). As shown in FIG. 1, the
C‧‧‧處理腔室P‧‧‧真空泵1‧‧‧真空用閘閥2‧‧‧外殼2A‧‧‧外殼本體2B‧‧‧法蘭4‧‧‧閥板6‧‧‧馬達8‧‧‧位置調整部11‧‧‧流體通道12‧‧‧開口13‧‧‧內筒14‧‧‧槽部14a‧‧‧螺孔15‧‧‧法蘭滾珠16‧‧‧凸緣部17‧‧‧螺紋孔18‧‧‧驅動源18a‧‧‧旋轉齒輪18b‧‧‧驅動齒輪19‧‧‧旋轉機構20‧‧‧旋轉體21‧‧‧外壁22‧‧‧底壁22a‧‧‧彎曲長孔23‧‧‧內壁24‧‧‧外側滾珠槽25‧‧‧內側滾珠槽26‧‧‧升降銷27‧‧‧齒輪槽28‧‧‧底壁滾珠30‧‧‧環形板32‧‧‧貫通孔34‧‧‧外側板槽36‧‧‧內側板槽40‧‧‧支撐構件42‧‧‧螺紋部43a‧‧‧第1端部43b‧‧‧第2端部44‧‧‧寬徑部44a‧‧‧第1面44b‧‧‧第2面46‧‧‧滾珠滑塊50‧‧‧升降體52‧‧‧傾斜長孔54‧‧‧滑動孔55‧‧‧密封環56‧‧‧密封構件57‧‧‧封裝構件C‧‧‧Process chamber P‧‧‧Vacuum pump 1‧‧‧Vacuum gate valve 2‧‧‧Case 2A‧‧‧Case body 2B‧‧‧Flange 4‧‧‧Valve plate 6‧‧‧Motor 8‧‧ ‧Position adjustment part 11‧‧‧Fluid passage 12‧‧‧Opening 13‧‧‧Inner tube 14‧‧‧Slot part 14a‧‧‧Thread hole 15‧‧‧Flange ball 16‧‧‧Flange part 17‧‧ ‧Threaded hole 18‧‧‧Drive source 18a‧‧‧Rotating gear 18b‧‧‧Drive gear 19‧‧‧Rotating mechanism 20‧‧‧Rotating body 21‧‧‧Outer wall 22‧‧‧Bottom wall 22a‧‧‧Bending length Hole 23‧‧‧Inner wall 24‧‧‧Outer ball groove 25‧‧‧Inner ball groove 26‧‧‧Lift pin 27‧‧‧Gear groove 28‧‧‧Bottom wall ball 30‧‧‧Annular plate 32‧‧‧ Through-hole 34‧‧‧Outer plate groove 36‧‧‧Inner plate groove 40‧‧‧Support member 42‧‧‧Thread part 43a‧‧‧First end 43b‧‧‧Second end 44‧‧‧ Part 44a‧‧‧1st surface 44b‧‧‧2nd surface 46‧‧‧ball slider 50‧‧‧lifting body 52‧‧‧inclined long hole 54‧‧‧sliding hole 55‧‧‧sealing ring 56‧‧ ‧Seal member 57‧‧‧Packaging member
圖1係表示本發明的一實施形態之真空用閘閥的配置情況之說明圖。 圖2係表示真空用閘閥的整體結構之說明圖。 圖3係真空用閘閥的剖面圖。 圖4係表示真空用閘閥所具備之位置調整部的外觀之說明圖。 圖5係位置調整部所具備之旋轉機構的局部剖面圖,係圖4所示之從AA線箭頭方向剖視之剖面圖。 圖6係表示旋轉機構所具備之支撐構件的外觀之說明圖。 圖7係表示被分解之支撐構件之說明圖。 圖8係表示作為真空用閘閥的外殼的一部分之法蘭的外觀之說明圖。 圖9係表示法蘭及嵌入於該法蘭的槽部之旋轉體之說明圖。 圖10表示配置於旋轉體的外側滾珠槽及內側滾珠槽之底壁滾珠。 圖11係表示旋轉機構所具備之環形板之說明圖。 圖12係從斜上方顯示旋轉機構所具備之升降體之說明圖。 圖13係用以說明旋轉機構的動作之立體圖。 圖14係用以說明旋轉機構的動作之立體圖。FIG. 1 is an explanatory diagram showing the arrangement of a vacuum gate valve according to an embodiment of the present invention. FIG. 2 is an explanatory diagram showing the overall structure of a vacuum gate valve. Figure 3 is a sectional view of a vacuum gate valve. FIG. 4 is an explanatory diagram showing the appearance of a position adjusting section provided in a vacuum gate valve. FIG. 5 is a partial cross-sectional view of the rotation mechanism provided in the position adjustment unit, and is a cross-sectional view taken along the arrow line AA line shown in FIG. 4. FIG. 6 is an explanatory diagram showing the appearance of the support member provided in the rotation mechanism. FIG. 7 is an explanatory diagram showing the disassembled support member. FIG. 8 is an explanatory diagram showing the appearance of a flange which is a part of a housing of a vacuum gate valve. FIG. 9 is an explanatory diagram showing a flange and a rotating body embedded in the groove of the flange. FIG. 10 shows the bottom wall balls arranged in the outer ball groove and the inner ball groove of the rotating body. FIG. 11 is an explanatory diagram showing an annular plate provided in the rotating mechanism. FIG. 12 is an explanatory diagram showing the lifting body included in the rotating mechanism from diagonally above. FIG. 13 is a perspective view for explaining the operation of the rotating mechanism. FIG. 14 is a perspective view for explaining the operation of the rotating mechanism.
2A‧‧‧外殼本體 2A‧‧‧Shell body
2B‧‧‧法蘭 2B‧‧‧Flange
4‧‧‧閥板 4‧‧‧Valve plate
14a‧‧‧螺孔 14a‧‧‧Screw hole
19‧‧‧旋轉機構 19‧‧‧ Rotating mechanism
20‧‧‧旋轉體 20‧‧‧rotating body
21‧‧‧外壁 21‧‧‧Outer wall
23‧‧‧內壁 23‧‧‧Inner wall
28‧‧‧底壁滾珠 28‧‧‧Bottom ball
30‧‧‧環形板 30‧‧‧Ring plate
40‧‧‧支撐構件 40‧‧‧Supporting member
42‧‧‧螺紋部 42‧‧‧Thread
44‧‧‧寬徑部 44‧‧‧ Wide diameter section
44a‧‧‧第1面 44a‧‧‧The first side
44b‧‧‧第2面 44b‧‧‧The second side
50‧‧‧升降體 50‧‧‧Lifting body
55‧‧‧密封環 55‧‧‧Seal ring
56‧‧‧密封構件 56‧‧‧Seal member
57‧‧‧封裝構件 57‧‧‧Packaging components
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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TW107119418A TWI662215B (en) | 2018-06-06 | 2018-06-06 | Vacuum valve |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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TW107119418A TWI662215B (en) | 2018-06-06 | 2018-06-06 | Vacuum valve |
Publications (2)
Publication Number | Publication Date |
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TWI662215B TWI662215B (en) | 2019-06-11 |
TW202001137A true TW202001137A (en) | 2020-01-01 |
Family
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TW107119418A TWI662215B (en) | 2018-06-06 | 2018-06-06 | Vacuum valve |
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TW (1) | TWI662215B (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4630994B1 (en) * | 2009-12-01 | 2011-02-09 | プログレッシオ合同会社 | Vacuum gate valve |
CN103403416B (en) * | 2011-03-10 | 2015-09-23 | 株式会社爱发科 | Cut-off valve and guiding valve |
KR102025053B1 (en) * | 2016-10-04 | 2019-09-24 | 가부시키가이샤 아루박 | Gate valve |
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2018
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TWI662215B (en) | 2019-06-11 |
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