TW201946712A - Molding system, and, molding method - Google Patents

Molding system, and, molding method Download PDF

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Publication number
TW201946712A
TW201946712A TW108115910A TW108115910A TW201946712A TW 201946712 A TW201946712 A TW 201946712A TW 108115910 A TW108115910 A TW 108115910A TW 108115910 A TW108115910 A TW 108115910A TW 201946712 A TW201946712 A TW 201946712A
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Taiwan
Prior art keywords
shaping
energy beam
structural layer
forming
energy
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TW108115910A
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Chinese (zh)
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長坂博之
上野和樹
安葉浩一
関口慧
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日商尼康股份有限公司
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Publication of TW201946712A publication Critical patent/TW201946712A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10Sintering only
    • B22F3/105Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12Both compacting and sintering
    • B22F3/16Both compacting and sintering in successive or repeated steps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00Apparatus for additive manufacturing; Details thereof or accessories therefor

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Powder Metallurgy (AREA)

Abstract

This molding system comprises an irradiation device which irradiates an energy beam, and a supply device which supplies a material, wherein: the energy beam is irradiated onto a first molded surface to melt the material and form a first structured layer; the energy beam is irradiated onto a second molded surface, which is at least a portion of a surface of the first structured layer, to melt the material and form a second structured layer on the first structured layer; and energy transmitted from the energy beam to the first molded surface per a unit area or per a unit of time is different from energy transmitted from the energy beam to the second molded surface per a unit area or per a unit of time.

Description

造形系統與造形方法Shaping system and method

本發明是有關於一種例如形成造形物的造形系統及造形方法的技術領域。The present invention relates to a technical field of, for example, a forming system and a forming method for forming a shaped object.

於專利文獻1中記載有一種造形系統,其於利用能量光束使粉狀的材料熔融後,使已熔融的材料固化,藉此於基材形成造形物。於此種造形系統中,於基材形成造形物後,將造形物自基材適當地分離(作為一例,卸下)成為技術課題。
[現有技術文獻]
[專利文獻]
Patent Document 1 describes a forming system that melts a powdery material by an energy beam, and then solidifies the molten material to form a shape on a substrate. In such a forming system, after forming a shaped object on a base material, it is a technical problem to appropriately separate the shaped object from the base material (as an example, remove it).
[Prior Art Literature]
[Patent Literature]

[專利文獻1]美國專利申請公開第2017/014909號說明書[Patent Document 1] US Patent Application Publication No. 2017/014909

根據第一形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層,且於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。According to a first aspect, there is provided a forming system including an irradiating device for irradiating an energy beam and a supply device for supplying a material, and irradiating the first forming surface with the energy beam, thereby melting the supplied material and forming the material. A first structure layer, and irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structure layer, thereby melting the supplied material and depositing the material on the first structure layer A second structure layer is formed thereon, and the energy transferred from the energy beam to the first shaping surface per unit area or unit time, and from the energy beam to the first shaping surface per unit area or unit time. The two shaped surfaces transfer different energies.

根據第二形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,藉此使所述被供給的所述材料熔融,而於所述第一結構層上形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一結構層不同的第二結構層。According to a second aspect, there is provided a forming system including an irradiating device for irradiating an energy beam, and a supply device for supplying a material, and irradiating the first forming surface with the energy beam, thereby melting the supplied material and forming the material. A first structure layer, and irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structure layer, thereby melting the supplied material and causing the first structure to A second structure layer having a size different from that of the first structure layer in at least one of the directions along the surface of the first structure layer is formed on the layer.

根據第三形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射具有第一光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射具有與所述第一光束特性不同的第二光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層。According to a third aspect, there is provided a forming system including an irradiating device for irradiating an energy beam and a supplying device for supplying a material, and irradiating the first forming surface with the energy beam having a first beam characteristic, thereby causing the supplied The material melts to form a first structural layer, and irradiates the second beam forming surface, which is at least a part of the surface of the first structural layer, with the energy beam having a second beam characteristic different from the first beam characteristic. Thereby, the supplied material is melted to form a second structure layer on the first structure layer.

根據第四形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射所述能量光束,且以第一供給形態供給所述材料來形成第一結構層,對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料而於所述第一結構層上形成第二結構層。According to a fourth aspect, there is provided a forming system including an irradiating device for radiating an energy beam, and a supplying device for supplying a material, irradiating the energy beam to a first forming surface, and supplying the material in a first supply form to form a first The structure layer irradiates the energy beam onto a second shaping surface that is at least a part of a surface of the first structure layer, and supplies the material in a second supply form different from the first supply form. A second structure layer is formed on the first structure layer.

根據第五形態,提供一種造形系統,包括:照射裝置,對造形面照射能量光束;供給裝置,供給材料;以及移動裝置,使所述第一造形面及所述能量光束的照射位置中的至少一者移動,以變更所述能量光束的照射位置與所述造形面的相對的位置關係,對第一造形面照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成第一結構層,對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動,而於所述第一結構層上形成第二結構層。According to a fifth aspect, there is provided a shaping system including: an irradiation device that irradiates an energy beam on a shaping surface; a supply device that supplies a material; and a moving device that causes at least one of the first shaping surface and an irradiation position of the energy beam to be One moves to change the relative positional relationship between the irradiation position of the energy beam and the shaping surface, irradiates the energy beam to a first shaping surface, and causes the first shaping surface and the structure to be moved in a first moving form. At least one of the irradiation positions of the energy beam is moved to form a first structure layer, and the second shaping surface that is at least a part of a surface of the first structure layer is irradiated with the energy beam, and A second moving form having a different moving form moves at least one of the second forming surface and the irradiation position of the energy beam to form a second structure layer on the first structure layer.

根據第六形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,藉由對第一造形面照射所述能量光束來使所述被供給的所述材料熔融而形成第一熔融池,藉此形成第一結構層,藉由對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束來使所述被供給的所述材料熔融,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成第二結構層。According to a sixth aspect, there is provided a forming system including an irradiating device for irradiating an energy beam and a supply device for supplying a material, and irradiating the first forming surface with the energy beam to melt the supplied material and form A first melting pool, thereby forming a first structural layer, and melting the supplied material by irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structural layer, A second molten pool having a size different from that of the first molten pool in at least one of the directions along the surface of the first structural layer is formed, thereby forming a second structure on the first structural layer. Floor.

根據第七形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成第一熔融池,藉此形成第一結構層,對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料而於所述第二造形面形成第二熔融池,藉此於所述第一結構層上形成第二結構層。According to a seventh aspect, there is provided a forming system including an irradiating device for radiating an energy beam, and a supplying device for supplying a material, the first forming surface is irradiated with the energy beam, and the first supply amount is per unit time or per unit area. The material is supplied to form a first molten pool, thereby forming a first structure layer, and irradiating the second beam forming surface, which is at least a part of the surface of the first structure layer, with the energy beam, and per unit time or per unit time. A unit area is supplied with the material at a second supply amount different from the first supply amount to form a second melting pool on the second forming surface, thereby forming a second structure layer on the first structure layer.

根據第八形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射所述能量光束來形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層,且使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力低。According to an eighth aspect, there is provided a shaping system including an irradiation device for irradiating an energy beam and a supply device for supplying a material, the first shaping surface is irradiated with the energy beam to form a first structure layer, and the first structure layer is provided as the first structure. The second shaping surface of at least a part of the surface of the layer irradiates the energy beam to form a second structure layer on the first structure layer, and makes the first structure layer more resistant to damage than the second structure. The layer has low resistance to destruction.

根據第九形態,提供一種造形系統,包括照射能量光束的照射裝置、及供給材料的供給裝置,對第一造形面照射所述能量光束,且將第一材料作為所述材料供給來形成第一結構層,對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且將第二材料作為所述材料供給而於所述第一結構層上形成第二結構層,且所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。
本發明的作用及其他益處根據以下所說明的用於實施的形態而變得明確。
According to a ninth aspect, there is provided a shaping system including an irradiation device for irradiating an energy beam and a supply device for supplying a material, the first shaping surface is irradiated with the energy beam, and a first material is supplied as the material to form a first The structure layer irradiates the energy beam onto a second shaping surface that is at least a part of a surface of the first structure layer, and supplies a second material as the material to form a second structure on the first structure layer. Layer, and the bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface.
The function and other benefits of the present invention will be made clear by the embodiments for implementation described below.

以下,參照圖式對造形系統及造形方法的實施方式進行說明。以下,使用可藉由利用雷射堆焊(laser build-up welding)法(雷射金屬沈積(Laser Metal Deposition,LMD)),進行使用造形材料M的附加加工來形成造形物的造形系統1,對加工系統及加工方法的實施方式進行說明。再者,雷射堆焊法(LMD)亦可稱為直接金屬沈積(Direct Metal Deposition)、直接能量沈積(Direct Energy Deposition)、雷射被覆(Laser Cladding)、雷射網狀成形(Laser Engineered Net Shaping)、直接光製造(Direct Light Fabrication)、雷射共凝固(Laser Consolidation)、形狀沈積製造(Shape Deposition Manufacturing)、送線雷射沈積(Wire Feed Laser Deposition)、氣體穿線(Gas Through Wire)、雷射粉末熔合(Laser Powder Fusion)、雷射金屬成形(Laser Metal Forming)、選擇性雷射粉末重熔(Selective Laser Powder Remelting)、雷射直接澆鑄(Laser Direct Casting)、雷射粉末沈積(Laser Powder Deposition)、雷射積層製造(Laser Additive Manufacturing)、雷射快速成形(Laser Rapid Forming)。Hereinafter, embodiments of the forming system and the forming method will be described with reference to the drawings. Hereinafter, a shaping system 1 capable of forming a shape by using an additional process using the shaping material M using a laser build-up welding method (Laser Metal Deposition (LMD)) is used. Embodiments of the processing system and the processing method will be described. Moreover, the laser surfacing method (LMD) can also be referred to as Direct Metal Deposition, Direct Energy Deposition, Laser Cladding, Laser Engineered Net Shaping), Direct Light Fabrication, Laser Consolidation, Shape Deposition Manufacturing, Wire Feed Laser Deposition, Gas Through Wire, Laser Powder Fusion, Laser Metal Forming, Selective Laser Powder Remelting, Laser Direct Casting, Laser Powder Deposition Powder Deposition), Laser Additive Manufacturing, Laser Rapid Forming.

另外,於以下的說明中,使用由相互正交的X軸、Y軸及Z軸所定義的XYZ正交座標系,對構成造形系統1的各種構成元件的位置關係進行說明。再者,於以下的說明中,為了便於說明,將X軸方向及Y軸方向分別設為水平方向(即,水平面內的規定方向),將Z軸方向設為垂直方向(即,與水平面正交的方向,實質上是上下方向或重力方向)。另外,將環繞X軸、Y軸及Z軸的旋轉方向(換言之,傾斜方向)分別稱為θX方向、θY方向及θZ方向。此處,亦可將Z軸方向設為重力方向。另外,亦可將XY平面設為水平方向。
(1)造形系統1的整體結構
首先,參照圖1對本實施方式的造形系統1的整體結構進行說明。圖1是表示本實施方式的造形系統1的結構的一例的剖面圖。
In the following description, the positional relationship of various constituent elements constituting the shaping system 1 will be described using an XYZ orthogonal coordinate system defined by mutually orthogonal X-axis, Y-axis, and Z-axis. Furthermore, in the following description, for convenience of explanation, the X-axis direction and the Y-axis direction are set to a horizontal direction (that is, a predetermined direction in a horizontal plane), and the Z-axis direction is set to a vertical direction (that is, positively aligned with the horizontal plane The direction of intersection is essentially the vertical direction or the direction of gravity). In addition, the rotation directions (in other words, tilt directions) around the X-axis, Y-axis, and Z-axis are referred to as the θX direction, θY direction, and θZ direction, respectively. Here, the Z-axis direction may be set to the direction of gravity. Alternatively, the XY plane may be set in the horizontal direction.
(1) Overall configuration of the forming system 1 First, the overall configuration of the forming system 1 according to the present embodiment will be described with reference to FIG. 1. FIG. 1 is a cross-sectional view showing an example of a configuration of a forming system 1 according to the present embodiment.

造形系統1可形成三維結構物(即,於三維方向的任一方向上均具有大小的三維的物體、立體物,換言之,於X方向、Y方向及Z方向上具有大小的物體)ST。造形系統1可於成為用於形成三維結構物ST的基礎(作為一例,基材、被加工材料及工件的至少一者)的工件W上形成三維結構物ST。造形系統1可藉由對工件W進行附加加工來形成三維結構物ST。於工件W為後述的平台13的情況下,造形系統1可於平台13上形成三維結構物ST。於工件W為由平台13保持的現有結構物(再者,現有結構物亦可為造形系統1已形成的其他三維結構物ST)的情況下,造形系統1可於現有結構物上形成三維結構物ST。於此情況下,造形系統1亦可形成已與現有結構物一體化的三維結構物ST。形成已與現有結構物一體化的三維結構物ST的動作等同於將新的結構物附加至現有結構物的動作。或者,造形系統1亦可形成能夠與現有結構物分離的三維結構物ST。再者,圖1表示工件W為由平台13保持的現有結構物的例子。另外,以下使用工件W為由平台13保持的現有結構物的例子進行說明。The shaping system 1 can form a three-dimensional structure (that is, a three-dimensional object or a three-dimensional object having a size in any direction of the three-dimensional direction, in other words, an object having a size in the X direction, the Y direction, and the Z direction) ST. The shaping system 1 can form the three-dimensional structure ST on a workpiece W that serves as a basis for forming the three-dimensional structure ST (for example, at least one of a base material, a material to be processed, and a workpiece). The shaping system 1 can form a three-dimensional structure ST by performing additional processing on the workpiece W. When the workpiece W is a platform 13 described later, the forming system 1 can form a three-dimensional structure ST on the platform 13. In the case where the workpiece W is an existing structure held by the platform 13 (in addition, the existing structure may also be another three-dimensional structure ST already formed by the shaping system 1), the shaping system 1 may form a three-dimensional structure on the existing structure.物 ST. In this case, the shaping system 1 may also form a three-dimensional structure ST integrated with an existing structure. The operation of forming the three-dimensional structure ST that has been integrated with the existing structure is equivalent to the operation of adding a new structure to the existing structure. Alternatively, the shaping system 1 may form a three-dimensional structure ST that can be separated from an existing structure. In addition, FIG. 1 shows an example in which the workpiece W is a conventional structure held by the platform 13. In addition, an example in which the workpiece W is a conventional structure held by the platform 13 will be described below.

如上所述,造形系統1可利用雷射堆焊法來形成造形物。即,亦可說造形系統1是利用積層造形技術來形成物體的3D列印機。再者,積層造形技術亦被稱為快速原型設計(Rapid Prototyping)、快速製造(Rapid Manufacturing)、或積層製造(Additive Manufacturing)。As described above, the shaping system 1 can form a shaped object by a laser surfacing method. That is, it can also be said that the forming system 1 is a 3D printer that uses an overlay forming technique to form an object. Moreover, the multilayer forming technology is also called Rapid Prototyping, Rapid Manufacturing, or Additive Manufacturing.

造形系統1利用光EL對造形材料M進行加工來形成造形物。作為此種光EL,例如可使用紅外光、可見光及紫外光中的至少一者,但亦可使用其他種類的光。光EL是雷射光。造形材料M是可藉由規定強度以上的光EL的照射而熔融的材料。作為此種造形材料M,例如可使用金屬性的材料及樹脂性的材料的至少一者。但是,作為造形材料M,亦可使用與金屬性的材料及樹脂性的材料不同的其他材料。造形材料M是粉狀或粒狀的材料。即,造形材料M是粉粒體。但是,造形材料M亦可不是粉粒體,例如亦可使用線狀的造形材料或氣體狀的造形材料。再者,造形系統1亦可利用帶電粒子束等能量光束對造形材料M進行加工來形成造形物。The shaping system 1 processes the shaping material M using the light EL to form a shaped object. As such light EL, for example, at least one of infrared light, visible light, and ultraviolet light may be used, but other types of light may be used. Light EL is laser light. The shaping material M is a material that can be melted by irradiation with light EL having a predetermined intensity or more. As such a shaping material M, for example, at least one of a metallic material and a resinous material can be used. However, as the molding material M, other materials different from metallic materials and resinous materials may be used. The molding material M is a powdery or granular material. That is, the molding material M is a powder or a granular material. However, the molding material M may not be a powder or granular material, and for example, a linear molding material or a gas-shaped molding material may be used. In addition, the shaping system 1 may process the shaping material M using an energy beam such as a charged particle beam to form a shaped object.

為了對造形材料M進行加工,如圖1所示,造形系統1包括:造形頭11、造形頭驅動系統12、平台13、以及控制裝置14。進而,造形頭11包括:照射系統111、及材料噴嘴(即,供給造形材料M的供給系統中的至少一部分)112。In order to process the forming material M, as shown in FIG. 1, the forming system 1 includes a forming head 11, a forming head driving system 12, a platform 13, and a control device 14. Further, the shaping head 11 includes an irradiation system 111 and a material nozzle (that is, at least a part of a supply system that supplies the shaping material M) 112.

照射系統111是用於自射出部113中射出光EL的光學系統(例如,聚光光學系統)。具體而言,照射系統111經由光纖等未圖示的光傳送構件而與發出光EL的未圖示的光源進行光學連接。照射系統111經由光傳送構件射出自光源傳播而來的光EL。照射系統111自照射系統111朝下方(即,-Z側)照射光EL。於照射系統111的下方配置有平台13。當於平台13搭載有工件W時,照射系統111可朝工件W照射光EL。具體而言,照射系統111對作為被照射光EL(典型的是被聚光)的區域而設定於工件W上的規定形狀的照射區域EA照射光EL。進而,於控制裝置14的控制下,照射系統111的狀態可在對照射區域EA照射光EL的狀態與不對照射區域EA照射光EL的狀態之間切換。再者,自照射系統111中射出的光EL的方向並不限定於正下方(即,與Z軸一致的方向),例如,亦可為相對於Z軸僅傾斜了規定的角度的方向。照射區域EA例如可為圓形形狀的區域,亦可為其他形狀(例如,矩形形狀)。The irradiation system 111 is an optical system (for example, a condensing optical system) for emitting light EL from the emitting section 113. Specifically, the irradiation system 111 is optically connected to a light source (not shown) that emits light EL via a light transmission member (not shown) such as an optical fiber. The irradiation system 111 emits light EL propagating from a light source through a light transmitting member. The irradiation system 111 irradiates the light EL from the irradiation system 111 downward (ie, the -Z side). A platform 13 is arranged below the irradiation system 111. When the work W is mounted on the stage 13, the irradiation system 111 can irradiate the light EL to the work W. Specifically, the irradiation system 111 irradiates the light EL to the irradiation area EA of a predetermined shape set on the workpiece W as a region to be irradiated with light EL (typically condensed). Further, under the control of the control device 14, the state of the irradiation system 111 can be switched between a state where the light EL is irradiated to the irradiation area EA and a state where the light EL is not irradiated to the irradiation area EA. In addition, the direction of the light EL emitted from the self-illumination system 111 is not limited to directly below (that is, a direction consistent with the Z axis), and may be a direction inclined only by a predetermined angle with respect to the Z axis, for example. The irradiation area EA may be, for example, a circular area, or may be another shape (for example, a rectangular shape).

材料噴嘴112具有供給造形材料M的供給出口(即,供給口)114。材料噴嘴112自供給出口114供給(例如噴射、噴出或射出)造形材料M。材料噴嘴112與作為造形材料M的供給源的未圖示的材料供給裝置物理式地連接。此時,未圖示的管等粉體傳送構件亦可介於材料供給裝置與材料噴嘴之間。材料噴嘴112供給自材料供給裝置經由粉體傳送構件所供給的造形材料M。再者,於圖1中,將材料噴嘴112描繪成管形狀。但是,材料噴嘴112的形狀並不限定於所述管形狀。材料噴嘴112朝下方(即,-Z側)供給造形材料M。於材料噴嘴112的下方配置有平台13。當於平台13搭載有工件W時,材料噴嘴112朝工件W供給造形材料M。再者,自材料噴嘴112所供給的造形材料M的前進方向是相對於Z軸僅傾斜了規定的角度(作為一例,銳角)的方向,但亦可為正下方(即,與Z軸一致的方向)。再者,亦可設置多個材料噴嘴112。The material nozzle 112 has a supply outlet (ie, a supply port) 114 for supplying the shaping material M. The material nozzle 112 supplies (for example, sprays, ejects, or ejects) the shaping material M from the supply outlet 114. The material nozzle 112 is physically connected to a material supply device (not shown) as a supply source of the molding material M. At this time, a powder conveying member such as a tube (not shown) may be interposed between the material supply device and the material nozzle. The material nozzle 112 is supplied with the shaping material M supplied from the material supply device via the powder transfer member. Furthermore, in FIG. 1, the material nozzle 112 is drawn into a tube shape. However, the shape of the material nozzle 112 is not limited to the shape of the tube. The material nozzle 112 supplies the forming material M downward (ie, the -Z side). A platform 13 is arranged below the material nozzle 112. When the workpiece W is mounted on the table 13, the material nozzle 112 supplies the molding material M to the workpiece W. The advancing direction of the forming material M supplied from the material nozzle 112 is a direction inclined only by a predetermined angle (for example, an acute angle) with respect to the Z axis, but may be directly below (that is, coincide with the Z axis). direction). Furthermore, a plurality of material nozzles 112 may be provided.

於本實施方式中,材料噴嘴112是以朝照射系統111照射光EL的照射區域EA供給造形材料M的方式,相對於照射系統111來進行對位。即,以作為材料噴嘴112供給造形材料M的區域而設定於工件W上的供給區域MA與照射區域EA一致(或者,至少部分地重覆)的方式,將材料噴嘴112與照射系統111進行對位。再者,亦能夠以材料噴嘴112對藉由已自照射系統111中射出的光EL而形成於工件W的熔融池MP供給造形材料M的方式進行對位。另外,亦能夠以材料噴嘴112供給造形材料M的供給區域MA與熔融池MP的區域部分地重疊的方式進行對位。In this embodiment, the material nozzle 112 is aligned with respect to the irradiation system 111 so that the shaping material M is supplied to the irradiation area EA that irradiates the light EL with the irradiation system 111. That is, the material nozzle 112 is aligned with the irradiation system 111 so that the supply area MA set on the workpiece W as the area where the material nozzle 112 supplies the shaping material M and the irradiation area EA coincides (or at least partially overlaps). Bit. Furthermore, the material nozzle 112 can be aligned so that the molding material M is supplied to the molten pool MP formed on the workpiece W by the light EL emitted from the irradiation system 111. In addition, alignment can also be performed so that the supply region MA where the material nozzle 112 supplies the molding material M and the region of the melting pool MP partially overlap.

造形頭驅動系統12使造形頭11進行移動。造形頭驅動系統12使造形頭11沿著X軸、Y軸及Z軸的各軸進行移動。除X軸、Y軸及Z軸的各軸以外,造形頭驅動系統12亦可使造形頭11沿著θX方向、θY方向及θZ方向的至少一者進行移動。造形頭驅動系統12例如包含馬達等。若造形頭驅動系統12使造形頭11進行移動,則於工件W上,照射區域EA亦相對於工件W進行移動。因此,造形頭驅動系統12可藉由使造形頭11進行移動,而變更工件W與照射區域EA的位置關係(換言之,保持工件W的平台13與照射區域EA的位置關係)。另外,造形頭驅動系統12可藉由使造形頭11進行移動,而變更工件W與供給區域MA的位置關係(換言之,保持工件W的平台13與供給區域MA的位置關係)。The shaping head driving system 12 moves the shaping head 11. The shaping head driving system 12 moves the shaping head 11 along each of the X-axis, Y-axis, and Z-axis. The shaping head drive system 12 may move the shaping head 11 along at least one of the θX direction, the θY direction, and the θZ direction, in addition to each of the X-axis, Y-axis, and Z-axis. The shaping head drive system 12 includes, for example, a motor and the like. When the shaping head driving system 12 moves the shaping head 11, the irradiation area EA on the workpiece W also moves relative to the workpiece W. Therefore, the shaping head driving system 12 can change the positional relationship between the workpiece W and the irradiation area EA by moving the shaping head 11 (in other words, the positional relationship between the stage 13 and the irradiation area EA that maintains the workpiece W). In addition, the forming head drive system 12 can change the positional relationship between the workpiece W and the supply area MA by moving the forming head 11 (in other words, the positional relationship between the stage 13 holding the work W and the supply area MA).

再者,造形頭驅動系統12亦可使照射系統111與材料噴嘴112分開移動。具體而言,例如,造形頭驅動系統12亦可調整射出部113的位置、射出部113的方向(或姿勢)、供給出口114的位置及供給出口114的方向(或姿勢)的至少一者。於此情況下,可分開控制照射光學系統111照射光EL的照射區域EA、及材料噴嘴112供給造形材料M的供給區域MA。In addition, the shaping head driving system 12 can move the irradiation system 111 and the material nozzle 112 separately. Specifically, for example, the shaping head drive system 12 may also adjust at least one of the position of the injection portion 113, the direction (or posture) of the injection portion 113, the position of the supply outlet 114, and the direction (or posture) of the supply outlet 114. In this case, the irradiation area EA where the irradiation optical system 111 irradiates the light EL and the supply area MA where the material nozzle 112 supplies the shaping material M can be controlled separately.

平台13可保持工件W。平台13進而可鬆開經保持的工件W。所述照射系統111於平台13保持工件W的期間的至少一部分中照射光EL。進而,所述材料噴嘴112於平台13保持工件W的期間的至少一部分中供給造形材料M。再者,存在材料噴嘴112已供給的造形材料M的一部分自工件W的表面朝工件W的外部(例如,朝平台13的周圍)散落或灑落的可能性。因此,造形系統1亦可於平台13的周圍包括回收已散落或灑落的造形材料M的回收裝置。The platform 13 can hold the workpiece W. The platform 13 can in turn release the held workpiece W. The irradiation system 111 irradiates light EL on at least a part of the period during which the stage 13 holds the workpiece W. Furthermore, the material nozzle 112 supplies the shaping material M in at least a part of the period in which the stage 13 holds the workpiece W. Furthermore, there is a possibility that a part of the shaping material M that has been supplied from the material nozzle 112 is scattered or dropped from the surface of the workpiece W toward the outside of the workpiece W (for example, around the platform 13). Therefore, the forming system 1 may also include a recovery device for recovering the scattered or spilled forming material M around the platform 13.

控制裝置14對造形系統1的動作進行控制。控制裝置14例如可包含中央處理單元(Central Processing Unit,CPU)或圖形處理單元(Graphics Processing Unit,GPU)等運算裝置、或記憶體等記憶裝置。控制裝置14作為藉由運算裝置執行電腦程式對造形系統1的動作進行控制的裝置而發揮功能。該電腦程式是用於使控制裝置14(例如,運算裝置)進行(即,執行)控制裝置14應進行的後述的動作的電腦程式。即,該電腦程式是用於以使造形系統1進行後述的動作的方式使控制裝置14發揮功能的電腦程式。運算裝置所執行的電腦程式可被記錄於控制裝置14所包括的記憶體(即,記錄媒體),亦可被記錄於已內置於控制裝置14或可外置於控制裝置14的任意的存儲媒體(例如,硬碟或半導體記憶體)。或者,運算裝置亦可經由網路介面而自控制裝置14的外部的裝置下載應執行的電腦程式。The control device 14 controls the operation of the shaping system 1. The control device 14 may include, for example, a computing device such as a central processing unit (CPU) or a graphics processing unit (GPU), or a memory device such as a memory. The control device 14 functions as a device that controls the operation of the shaping system 1 by executing a computer program by a computing device. This computer program is a computer program for causing the control device 14 (for example, a computing device) to perform (that is, execute) an operation to be described later that the control device 14 should perform. That is, this computer program is a computer program for causing the control system 14 to function so that the shaping system 1 may perform the operation mentioned later. The computer program executed by the computing device may be recorded in a memory (ie, a recording medium) included in the control device 14, or may be recorded in any storage medium that is already built in the control device 14 or can be externally placed on the control device 14. (For example, hard drives or semiconductor memory). Alternatively, the computing device may download a computer program to be executed from a device external to the control device 14 through a network interface.

控制裝置14亦可不設置於造形系統1的內部,例如,亦可作為伺服器等而設置於造形系統1外。於此情況下,控制裝置14與造形系統1亦可藉由有線及/或無線的網路(或者,資料匯流排及/或通信線路)來連接。作為有線的網路,例如亦可使用利用以IEEE1394、RS-232x、RS-422、RS-423、RS-485及通用串列匯流排(Universal Serial Bus,USB)的至少一者為代表的串列匯流排方式的介面的網路。作為有線的網路,亦可使用利用並列匯流排方式的介面的網路。作為有線的網路,亦可使用利用依據以10BASE-T、100BASE-TX及1000BASE-T的至少一者為代表的乙太網路(註冊商標)的介面的網路。作為無線的網路,亦可使用利用電波的網路。作為利用電波的網路的一例,可列舉依據IEEE802.1x的網路(例如,無線區域網路(Local Area Network,LAN)及藍牙(Bluetooth)(註冊商標)的至少一者)。作為無線的網路,亦可使用利用紅外線的網路。作為無線的網路,亦可使用利用光通信的網路。於此情況下,控制裝置14與造形系統1亦能夠以可經由網路而收發各種資訊的方式構成。另外,控制裝置14亦可經由網路而能夠對造形系統1發送指令或控制參數等資訊。造形系統1亦可包括經由所述網路而接收來自控制裝置14的指令或控制參數等資訊的接收裝置。或者,亦可將執行控制裝置14所進行的處理中的一部分的第一控制裝置設置於造形系統1的內部,另一方面,將執行控制裝置14所進行的處理中的另一部分的第二控制裝置設置於造形系統1的外部。The control device 14 may not be provided inside the shaping system 1. For example, the control device 14 may be provided outside the shaping system 1 as a server or the like. In this case, the control device 14 and the shaping system 1 may also be connected through a wired and / or wireless network (or, a data bus and / or a communication line). As a wired network, for example, a string represented by at least one of IEEE1394, RS-232x, RS-422, RS-423, RS-485, and Universal Serial Bus (USB) can be used. A network of bus-based interfaces. As a wired network, a network using an interface of a parallel bus method can also be used. As a wired network, a network using an Ethernet (registered trademark) interface based on at least one of 10BASE-T, 100BASE-TX, and 1000BASE-T can be used. As a wireless network, a network using electric waves can also be used. As an example of a network using radio waves, a network based on IEEE802.1x (for example, at least one of a local area network (LAN) and Bluetooth (registered trademark)) can be cited. As a wireless network, a network using infrared rays can also be used. As a wireless network, a network using optical communication can also be used. In this case, the control device 14 and the shaping system 1 can also be configured so that various kinds of information can be transmitted and received via the network. In addition, the control device 14 can also send information such as instructions and control parameters to the shaping system 1 via a network. The shaping system 1 may also include a receiving device that receives information such as instructions or control parameters from the control device 14 via the network. Alternatively, a first control device that executes a part of the processing performed by the control device 14 may be provided inside the shaping system 1 and on the other hand, a second control that executes another part of the processing performed by the control device 14 may be provided. The device is provided outside the shaping system 1.

再者,作為記錄運算裝置所執行的電腦程式的記錄媒體,亦可使用唯讀光碟(Compact Disc-Read Only Memory,CD-ROM)、可燒錄光碟(Compact Disc-Recordable,CD-R)、可重寫光碟(Compact Disc-Rewritable,CD-RW)或軟性磁碟、磁光碟(Magnetic Optical,MO)、唯讀數位多功能光碟(Digital Versatile Disc-Read Only Memory,DVD-ROM)、數位多功能光碟隨機存取記憶體(Digital Versatile Disc-Random Access Memory,DVD-RAM)、可燒錄數位多功能光碟(Digital Versatile Disc-Recordable,DVD-R)、可燒錄數位多功能光碟(Digital Versatile Disc+Recordable,DVD+R)、可重寫數位多功能光碟(Digital Versatile Disc-Rewritable,DVD-RW)、可重寫數位多功能光碟(Digital Versatile Disc+Rewritable,DVD+RW)及藍光(Blu-ray)(註冊商標)等光碟、磁帶等磁性媒體、磁光碟、USB記憶體等半導體記憶體、以及其他可儲存程式的任意的媒體的至少一者。於記錄媒體,亦可包含可記錄電腦程式的設備(例如,電腦程式被安裝成能夠以軟體及韌體等的至少一種形態執行的狀態的通用設備或專用設備)。進而,電腦程式中所包含的各處理或功能可由藉由控制裝置14(即,電腦)執行電腦程式而於控制裝置14內實現的邏輯性的處理塊來實現,亦可由控制裝置14所包括的規定的閘陣列(現場可程式閘陣列(Field Programmable Gate Array,FPGA)、特定應用積體電路(Application Specific Integrated Circuit,ASIC))等硬體來實現,亦能夠以邏輯性的處理塊與實現硬體的一部分的元件的部分硬體模組混合的形式來實現。Furthermore, as a recording medium for a computer program executed by a recording and computing device, a compact disc-read only memory (CD-ROM), a compact disc-recordable (CD-R), Compact Disc-Rewritable (CD-RW) or floppy disk, Magnetic Optical (MO), Digital Versatile Disc-Read Only Memory (DVD-ROM), digital Function Disc Random Access Memory (Digital Versatile Disc-Random Access Memory (DVD-RAM)), Digital Versatile Disc-Recordable (DVD-R), Digital Versatile (Digital Versatile Disc + Recordable (DVD + R), Digital Versatile Disc-Rewritable (DVD-RW), Digital Versatile Disc + Rewritable (DVD + RW), and Blu-ray (Blu -ray) (registered trademark) At least one of optical discs such as magnetic discs, magnetic media such as magnetic tapes, magneto-optical discs, semiconductor memories such as USB memories, and other arbitrary media that can store programs . The recording medium may include a device capable of recording a computer program (for example, a general-purpose device or a special-purpose device in which the computer program is installed in a state capable of being executed in at least one of software and firmware). Further, each process or function included in the computer program may be implemented by a logical processing block implemented in the control device 14 by executing the computer program by the control device 14 (ie, a computer), or may be included in the control device 14 The specified gate array (Field Programmable Gate Array (FPGA), Application Specific Integrated Circuit (ASIC)) and other hardware can be used to implement the logic processing block and the hardware. The components of the body are partly implemented in the form of a mixed hardware module.

尤其,於本實施方式中,控制裝置14對由照射系統111所射出的光EL的射出形態進行控制。射出形態例如包含光EL的強度及光EL的射出時序的至少一者。於光EL為脈衝光的情況下,射出形態例如亦可包含脈衝光的發光時間的長度、及脈衝光的發光時間與消光時間的比(所謂的占空比)的至少一者。進而,控制裝置14對藉由造形頭驅動系統12而移動的造形頭11的移動形態進行控制。移動形態例如包含移動量、移動速度、移動方向及移動時序的至少一者。進而,控制裝置14對由材料噴嘴112所供給的造形材料M的供給形態進行控制。供給形態例如包含供給量(特別是每單位時間的供給量)。再者,控制裝置14亦可同時控制由照射系統111所射出的光EL的射出形態與由材料噴嘴112所供給的造形材料M的供給形態。
(2)造形系統1的動作
In particular, in the present embodiment, the control device 14 controls the emission form of the light EL emitted from the irradiation system 111. The emission form includes, for example, at least one of the intensity of the light EL and the emission timing of the light EL. When the light EL is pulsed light, the emission form may include at least one of the length of the pulsed light emission time and the ratio of the pulsed light emission time to the extinction time (so-called duty cycle). Furthermore, the control device 14 controls the movement form of the shaping head 11 which is moved by the shaping head drive system 12. The movement form includes, for example, at least one of a movement amount, a movement speed, a movement direction, and a movement sequence. Furthermore, the control device 14 controls the supply form of the shaping material M supplied from the material nozzle 112. The supply form includes, for example, a supply amount (especially a supply amount per unit time). In addition, the control device 14 may simultaneously control the emission form of the light EL emitted from the irradiation system 111 and the supply form of the shaping material M supplied from the material nozzle 112.
(2) Operation of the shaping system 1

繼而,對造形系統1的動作進行說明。於本實施方式中,造形系統1如所述般進行用於形成三維結構物ST的造形動作。尤其,造形系統1進行第一造形動作與第二造形動作的至少一者,所述第一造形動作是用於在工件W形成三維結構物ST的基本的造形動作,所述第二造形動作是用於形成與由第一造形動作所形成的三維結構物ST相比容易自工件W分離(換言之,卸下)的三維結構物ST的造形動作。以下,依次對第一造形動作及第二造形動作進行說明。
(2-1)第一造形動作(基本造形動作)
Next, the operation of the shaping system 1 will be described. In this embodiment, the shaping system 1 performs a shaping operation for forming the three-dimensional structure ST as described above. In particular, the shaping system 1 performs at least one of a first shaping action and a second shaping action, the first shaping action being a basic shaping action for forming a three-dimensional structure ST on the workpiece W, and the second shaping action is The forming operation for forming the three-dimensional structure ST that is easier to separate (in other words, remove) from the workpiece W than the three-dimensional structure ST formed by the first forming operation. Hereinafter, the first shaping operation and the second shaping operation will be described in order.
(2-1) First forming action (basic forming action)

首先,對第一造形動作進行說明。如上所述,造形系統1利用雷射堆焊法來形成三維結構物ST。因此,造形系統1亦可將依據雷射堆焊法的現有的造形動作作為第一造形動作來進行,藉此形成三維結構物ST。以下,對利用雷射堆焊法的三維結構物ST的造形動作的一例進行簡單說明。First, the first shaping operation will be described. As described above, the forming system 1 uses a laser surfacing method to form the three-dimensional structure ST. Therefore, the forming system 1 can also perform the existing forming operation according to the laser surfacing method as the first forming operation, thereby forming the three-dimensional structure ST. An example of the forming operation of the three-dimensional structure ST by the laser surfacing method will be briefly described below.

造形系統1根據應形成的三維結構物ST的三維模型資料(例如,電腦輔助設計(Computer Aided Design,CAD)資料)等,於工件W上形成三維結構物ST。三維模型資料包含表示三維結構物ST的形狀(特別是三維形狀)的資料。作為三維模型資料,亦可使用由設置於造形系統1內的測量裝置所測量的立體物的測量資料。作為三維模型資料,亦可使用與造形系統1分開設置的三維形狀測量機的測量資料。作為此種三維形狀測量機的一例,可列舉:具有可相對於工件W進行移動且可接觸工件W的探針的接觸型的三維測定機及非接觸型的三維測量機的至少一者。作為非接觸型的三維測量機的一例,可列舉:圖案投影方式的三維測量機、光切斷方式的三維測量機、飛行時間(time of flight)方式的三維測量機、波紋輪廓(moire topography)方式的三維測量機、全像干涉方式的三維測量機、電腦斷層攝影(Computed Tomography,CT)方式的三維測量機、及磁共振成像(Magnetic Resonance Imaging,MRI)方式的三維測量機的至少一者。作為三維模型資料,亦可使用三維結構物ST的設計資料。The shaping system 1 forms a three-dimensional structure ST on the workpiece W based on the three-dimensional model data (for example, computer aided design (CAD) data) of the three-dimensional structure ST to be formed. The three-dimensional model data includes data representing a shape (especially a three-dimensional shape) of the three-dimensional structure ST. As the three-dimensional model data, measurement data of a three-dimensional object measured by a measurement device provided in the shaping system 1 may be used. As the three-dimensional model data, measurement data of a three-dimensional shape measuring machine provided separately from the forming system 1 may be used. Examples of such a three-dimensional shape measuring machine include at least one of a contact-type three-dimensional measuring machine and a non-contact-type three-dimensional measuring machine having a probe that can move with respect to the workpiece W and can contact the workpiece W. Examples of the non-contact three-dimensional measuring machine include a three-dimensional measuring machine of a pattern projection method, a three-dimensional measuring machine of a light cutting method, a three-dimensional measuring machine of a time of flight method, and moire topography. At least one of a three-dimensional measuring machine based on a method, a three-dimensional measuring machine based on a holographic interference method, a three-dimensional measuring machine based on a computed tomography (CT) method, and a three-dimensional measuring machine based on a magnetic resonance imaging (MRI) . As the three-dimensional model data, design data of the three-dimensional structure ST can also be used.

造形系統1為了形成三維結構物ST,例如依次形成沿著Z軸方向排列的多個層狀的部分結構物(以下,稱為「結構層」)SL。例如,造形系統1一層一層地依次形成藉由沿著Z軸方向將三維結構物ST切成圓片所獲得的多個結構層SL。其結果,形成作為積層有多個結構層SL的積層結構體的三維結構物ST。以下,對藉由一層一層地依次形成多個結構層SL來形成三維結構物ST的動作的流程進行說明。In order to form the three-dimensional structure ST, the shaping system 1 forms, for example, a plurality of layered partial structures (hereinafter, referred to as “structural layers”) SL that are aligned along the Z-axis direction. For example, the forming system sequentially forms a plurality of structural layers SL obtained by cutting a three-dimensional structure ST into a wafer along the Z-axis direction one by one. As a result, a three-dimensional structure ST is formed as a laminated structure in which a plurality of structural layers SL are laminated. Hereinafter, a flow of an operation of forming the three-dimensional structure ST by sequentially forming a plurality of structural layers SL one by one will be described.

首先,參照圖2(a)至圖2(c)對形成各結構層SL的動作進行說明。於控制裝置14的控制下,造形系統1於相當於工件W的表面或已形成的結構層SL的表面的造形面MS上的所期望區域設定照射區域EA,並自照射系統111對該照射區域EA照射光EL。再者,亦可將自照射系統111照射的光EL於造形面MS上所佔的區域稱為照射區域EA。另外,造形系統1亦可不於造形面MS上的所期望區域設定照射區域EA。此時,亦可將自照射系統111照射的光EL於造形面MS上所佔的區域稱為照射區域EA。於本實施方式中,光EL的聚焦位置FP(即,聚光位置,換言之,於Z軸方向或光EL的前進方向上,光EL最聚集的位置)與造形面MS一致。再者,亦可將光EL的聚焦位置FP設定於已自造形面MS朝Z軸方向偏離的位置。其結果,如圖2(a)所示,藉由已自照射系統111中射出的光EL而於造形面MS上的所期望區域形成熔融池(即,已藉由光EL而熔融的液狀的金屬或樹脂等的池)MP。進而,於控制裝置14的控制下,造形系統1於造形面MS上的所期望區域設定供給區域MA,並自材料噴嘴112對該供給區域MA供給造形材料M。再者,造形系統1亦可不於造形面MS上的所期望區域設定供給區域MA。此時,亦可將自材料噴嘴112供給造形材料M的區域稱為供給區域MA。此處,如上所述,照射區域EA與供給區域MA一致,因此供給區域MA被設定成形成有熔融池MP的區域。換言之,供給區域MA與形成有熔融池MP的區域一致。因此,如圖2(b)所示,造形系統1自材料噴嘴112對熔融池MP供給造形材料M。其結果,被供給至熔融池MP的造形材料M熔融。若伴隨造形頭11的移動而不再對熔融池MP照射光EL,則已於熔融池MP中熔融的造形材料M得到冷卻而固化(即,凝固)。其結果,如圖2(c)所示,已固化的造形材料M堆積於造形面MS上。換言之,藉由已固化的造形材料M的堆積物來形成造形物。藉由如所述般進行將造形材料M的堆積物附加至造形面MS的附加加工,而形成造形物。First, an operation of forming each structural layer SL will be described with reference to FIGS. 2 (a) to 2 (c). Under the control of the control device 14, the shaping system 1 sets an irradiation area EA on a desired area on the shaping surface MS corresponding to the surface of the workpiece W or the surface of the formed structural layer SL, and the irradiation area 111 is set by the irradiation system 111. EA irradiates light EL. The area occupied by the light EL emitted from the irradiation system 111 on the shaping surface MS may be referred to as an irradiation area EA. In addition, the shaping system 1 may not set the irradiation area EA on a desired area on the shaping surface MS. At this time, an area occupied by the light EL emitted from the irradiation system 111 on the shaping surface MS may be referred to as an irradiation area EA. In the present embodiment, the focusing position FP of the light EL (that is, the light condensing position, in other words, the position where the light EL is most concentrated in the Z-axis direction or the forward direction of the light EL) coincides with the shaping surface MS. Furthermore, the focusing position FP of the light EL may be set to a position that has been deviated from the shaping surface MS in the Z-axis direction. As a result, as shown in FIG. 2 (a), a melting pool is formed in a desired region on the molding surface MS by the light EL that has been emitted from the irradiation system 111 (that is, a liquid state that has been melted by the light EL. Of metal or resin, etc.) MP. Further, under the control of the control device 14, the forming system 1 sets a supply area MA on a desired area on the forming surface MS, and supplies the forming material M to the supply area MA from the material nozzle 112. In addition, the forming system 1 may not set the supply area MA in a desired area on the forming surface MS. At this time, a region where the forming material M is supplied from the material nozzle 112 may be referred to as a supply region MA. Here, as described above, since the irradiation area EA and the supply area MA coincide, the supply area MA is set as an area in which the melting pool MP is formed. In other words, the supply area MA coincides with the area where the molten pool MP is formed. Therefore, as shown in FIG. 2 (b), the forming system 1 supplies the forming material M from the material nozzle 112 to the melting pool MP. As a result, the molding material M supplied to the melting pool MP is melted. When the melting pool MP is not irradiated with light EL as the shaping head 11 moves, the shaping material M that has been melted in the melting pool MP is cooled and solidified (that is, solidified). As a result, as shown in FIG. 2 (c), the solidified molding material M is deposited on the molding surface MS. In other words, the shaped object is formed by the accumulation of the solidified shaped material M. The forming process is performed by adding the deposit of the forming material M to the forming surface MS as described above.

一面改變相對於造形面MS的造形頭11的XY平面內的位置,一面重覆此種包含利用光EL的照射的熔融池MP的形成、朝熔融池MP的造形材料M的供給、被供給的造形材料M的熔融及已熔融的造形材料M的固化的一連串的造形處理。換言之,一面使造形頭11相對於造形面MS沿著XY平面內進行移動,一面重覆包含熔融池MP的形成、造形材料M的供給、造形材料M的熔融及已熔融的造形材料M的固化的一連串的造形處理。若造形頭11相對於造形面MS進行移動,則照射區域EA亦相對於造形面MS進行移動。因此,亦可說一面使照射區域EA相對於造形面MS沿著XY平面進行移動,一面重覆一連串的造形處理。此時,對已設定於應形成造形物的區域的照射區域EA選擇性地照射光EL,另一方面,對已設定於不應形成造形物的區域的照射區域EA選擇性地不照射光EL。再者,亦可說於不應形成造形物的區域不設定照射區域EA。即,造形系統1一面使照射區域EA於造形面MS上沿著規定的移動軌跡進行移動,一面於對應於應形成造形物的區域的分佈(即,結構層SL的圖案)的時序對造形面MS照射光EL。換言之,造形系統1一面使被照射光EL的預定的區域於造形面MS上沿著規定的移動軌跡進行移動,一面於該區域已位於應形成造形物的區域的情況下對造形面MS照射光EL。其結果,於造形面MS上形成相當於由已凝固的造形材料M所形成的造形物的集合體的結構層SL。再者,於所述說明中,使照射區域EA相對於造形面MS進行了移動,但亦可使造形面MS相對於照射區域EA進行移動。While changing the position in the XY plane of the forming head 11 with respect to the forming surface MS, the formation of the molten pool MP including irradiation with light EL, the supply of the forming material M to the molten pool MP, and the supplied A series of shaping processes for melting the shaping material M and solidifying the molten shaping material M. In other words, the forming head 11 is moved along the XY plane with respect to the forming surface MS, and the formation of the molten pool MP, the supply of the forming material M, the melting of the forming material M, and the solidification of the molten forming material M are repeated. A series of shaping processes. When the shaping head 11 moves relative to the shaping surface MS, the irradiation area EA also moves relative to the shaping surface MS. Therefore, it can be said that a series of forming processes are repeated while moving the irradiation area EA along the XY plane with respect to the forming surface MS. At this time, the light EL is selectively irradiated to the irradiation area EA that has been set in the area where the formation should be formed, and the light EL is selectively not irradiated to the irradiation area EA that has been set in the area where the formation should not be formed. . In addition, it can be said that the irradiation area EA is not set in a region where no shaped object should be formed. That is, the shaping system 1 moves the irradiation area EA along the predetermined movement trajectory on the shaping surface MS, and simultaneously shapes the shaping surface with the timing corresponding to the distribution of the area where the shaped object should be formed (that is, the pattern of the structural layer SL). The MS irradiates light EL. In other words, the forming system 1 moves a predetermined area of the illuminated light EL along the predetermined movement trajectory on the forming surface MS, and irradiates the forming surface MS with light when the area is already in the area where the formation object is to be formed. EL. As a result, a structural layer SL is formed on the forming surface MS, which is equivalent to an aggregate of forming objects formed from the solidified forming material M. In the above description, the irradiation area EA is moved relative to the shaping surface MS, but the shaping surface MS may be moved relative to the irradiation area EA.

於控制裝置14的控制下,造形系統1根據三維模型資料重覆進行用於形成此種結構層SL的動作。若參照圖3(a)至圖3(f)進行說明,則具體而言,首先,控制裝置14以積層間距對三維模型資料進行切片處理來製作切片資料(slice data)。再者,控制裝置14亦可對應於造形系統1的特性,至少部分地修正切片資料。於控制裝置14的控制下,造形系統1根據對應於結構層SL#1的三維模型資料(即,對應於結構層SL#1的切片資料),進行用於在相當於工件W的表面WS的造形面MS上形成第一層的結構層SL#1的動作。其結果,如圖3(a)及圖3(b)所示,於造形面MS上形成結構層SL#1。其後,造形系統1將結構層SL#1的表面(典型的是上表面)設定成新的造形面MS後,於該新的造形面MS上形成第二層的結構層SL#2。為了形成結構層SL#2,控制裝置14首先以造形頭11沿著Z軸進行移動的方式控制造形頭驅動系統12。具體而言,控制裝置14控制造形頭驅動系統12,以於結構層SL#1的表面(即,新的造形面MS)設定照射區域EA及供給區域MA的方式,使造形頭11朝+Z側進行移動。藉此,光EL的聚焦位置FP與新的造形面MS一致。其後,於控制裝置14的控制下,造形系統1以與形成結構層SL#1的動作相同的動作,根據對應於結構層SL#2的切片資料,於結構層SL#1上形成結構層SL#2。其結果,如圖3(c)及圖3(d)所示,形成結構層SL#2。以後,重覆相同的動作,直至形成構成應形成於工件W上的三維結構物的所有結構層SL為止。其結果,如圖3(e)及圖3(f)所示,藉由沿著Z軸(即,沿著自熔融池MP的底面朝向上表面的方向)積層有多個結構層SL的積層結構物來形成三維結構物ST。
(2-2)第二造形動作(容易自工件W分離的三維結構物ST的造形動作)
Under the control of the control device 14, the shaping system 1 repeatedly performs an operation for forming such a structural layer SL according to the three-dimensional model data. 3 (a) to 3 (f), specifically, first, the control device 14 performs slice processing on the three-dimensional model data at the layer pitch to create slice data. In addition, the control device 14 may also modify the slice data at least partially according to the characteristics of the shaping system 1. Under the control of the control device 14, the shaping system 1 performs a process for forming a surface WS corresponding to the workpiece W on the basis of the three-dimensional model data corresponding to the structural layer SL # 1 (that is, the slice data corresponding to the structural layer SL # 1). The operation of forming the first structural layer SL # 1 on the forming surface MS. As a result, as shown in FIGS. 3 (a) and 3 (b), a structural layer SL # 1 is formed on the forming surface MS. Thereafter, the forming system 1 sets the surface (typically, the upper surface) of the structural layer SL # 1 to a new forming surface MS, and then forms a second structural layer SL # 2 on the new forming surface MS. To form the structural layer SL # 2, the control device 14 first controls the shaping head driving system 12 so that the shaping head 11 moves along the Z axis. Specifically, the control device 14 controls the shaping head driving system 12 such that the irradiation area EA and the supply area MA are set on the surface of the structural layer SL # 1 (ie, the new shaping surface MS), so that the shaping head 11 faces + Z. Side to move. Thereby, the focus position FP of the light EL coincides with the new shaping surface MS. Thereafter, under the control of the control device 14, the shaping system 1 forms a structural layer on the structural layer SL # 1 based on the slice data corresponding to the structural layer SL # 2 in the same operation as the operation of forming the structural layer SL # 1. SL # 2. As a result, as shown in FIGS. 3 (c) and 3 (d), a structural layer SL # 2 is formed. Thereafter, the same operation is repeated until all the structural layers SL constituting the three-dimensional structure to be formed on the workpiece W are formed. As a result, as shown in FIG. 3 (e) and FIG. 3 (f), a plurality of structural layers SL are laminated along the Z axis (that is, along the direction from the bottom surface to the upper surface of the molten pool MP). Structure to form a three-dimensional structure ST.
(2-2) The second shaping operation (the shaping operation of the three-dimensional structure ST that is easy to separate from the workpiece W)

繼而,對第二造形動作進行說明,所述第二造形動作是用於形成與由第一造形動作所形成的三維結構物ST相比容易自工件W分離(換言之,卸下)的三維結構物ST的造形動作。與所述第一造形動作同樣地,第二造形動作是藉由依次形成多個結構層SL來形成三維結構物ST的造形動作。但是,第二造形動作於包含用於形成容易自工件W分離的三維結構物ST的動作這一點上,與所述第一造形動作不同。第二造形動作的其他特徵亦可與第一造形動作的其他特徵相同。以下,對用於形成容易自工件W分離的三維結構物ST的動作進行說明。Next, a description will be given of a second shaping operation for forming a three-dimensional structure that is easier to separate (in other words, remove) from the workpiece W than the three-dimensional structure ST formed by the first shaping operation. ST shape action. Similar to the first forming operation, the second forming operation is a forming operation for forming the three-dimensional structure ST by sequentially forming a plurality of structural layers SL. However, the second forming operation is different from the first forming operation in that it includes an operation for forming a three-dimensional structure ST that is easily separated from the workpiece W. Other features of the second shaping action may be the same as those of the first shaping action. Hereinafter, an operation for forming the three-dimensional structure ST that is easily separated from the workpiece W will be described.

於本實施方式中,於控制裝置14的控制下,造形系統1採用如下的特性變更動作作為用於形成容易自工件W上分離的三維結構物ST的動作,所述特性變更動作將構成三維結構物ST的多個結構層SL中的一部分的特性變更成與多個結構層SL中的另一部分的特性不同的特性。具體而言,造形系統1採用如下的動作作為特性變更動作,所述動作將多個結構層SL中的最下層的結構層SL(典型的是形成於相當於表面WS的造形面MS的第一層的結構層SL#1)的特性變更成與多個結構層SL之中除最下層的結構層SL以外的其他結構層SL(典型的是形成於最下層的結構層SL上的其他結構層SL)的特性不同的特性。但是,如其後於變形例中進行詳述般,造形系統1例如亦可採用如下的動作作為特性變更動作,所述動作將多個結構層SL中的包含最下層的結構層SL的位於下層的多個結構層SL的特性變更成與多個結構層SL之中除位於下層的多個結構層SL以外的其他結構層SL(即,與位於下層的結構層SL相比位於上層的結構層SL)的特性不同的特性。In this embodiment, under the control of the control device 14, the shaping system 1 adopts the following characteristic changing operation as an operation for forming a three-dimensional structure ST that is easy to separate from the workpiece W, and the characteristic changing operation will constitute a three-dimensional structure A characteristic of a part of the plurality of structural layers SL of the object ST is changed to a characteristic different from a characteristic of the other part of the plurality of structural layers SL. Specifically, the forming system 1 adopts the following operation as a characteristic changing operation that uses the lowermost structural layer SL (typically, the first structural layer MS formed on the surface WS equivalent to the surface WS) of the plurality of structural layers SL. The characteristics of the structural layer SL # 1 of the first layer are changed to the structural layer SL other than the structural layer SL of the lowermost structural layer SL (typically other structural layers formed on the structural layer SL of the lowermost layer). SL) different characteristics. However, as will be described in detail later in the modification example, the shaping system 1 may also adopt, for example, an operation for changing the characteristics, which includes a plurality of structural layers SL including the structural layer SL that is the lowermost layer in the lower layer. The characteristics of the plurality of structural layers SL are changed to the other structural layers SL other than the plurality of structural layers SL located in the lower layer (that is, the structural layer SL located in the upper layer compared to the structural layer SL located in the lower layer). ) Different characteristics.

結構層SL的特性亦可包含結構層SL的尺寸。尤其,結構層SL的特性亦可包含沿著造形面MS的至少一個方向(典型的是與多個結構層SL的積層方向交叉的至少一個方向)上的結構層SL的尺寸。於此情況下,結構層SL的尺寸亦可稱為結構層SL的寬度。於以下的說明中,於無特別的表述的情況下,結構層SL的尺寸是指沿著造形面MS的至少一個方向上的結構層SL的尺寸。例如,可將結構層SL的尺寸設為XY平面內的任意的方向上的結構層SL的尺寸。於此情況下,造形系統1進行作為特性變更動作的第一特性變更動作,所述第一特性變更動作用於將最下層的結構層SL(以下,適宜稱為「結構層SL_lowest」)的尺寸變更成與結構層SL_lowest以外的其他結構層SL(以下,適宜稱為「結構層SL_upper」)的尺寸不同的尺寸。再者,於進行結構層SL彼此的尺寸的比較的情況下,只要將各結構層SL的尺寸設為相同的方向上的結構層SL的尺寸即可。更具體而言,造形系統1例如進行作為第一特性變更動作的如下的動作,所述動作用於使結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小。如其後進行詳述般,於結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小的情況下,與結構層SL_lowest的尺寸未變得較結構層SL_upper的尺寸小的情況相比,結構層SL_lowest容易自工件W分離。若結構層SL_lowest自工件W分離,則經由結構層SL_lowest而已與工件W一體化的結構層SL_upper亦自工件W分離。如此,與藉由第一造形動作來形成三維結構物ST的情況相比,三維結構物ST自工件W上的分離變得容易。The characteristics of the structure layer SL may also include the size of the structure layer SL. In particular, the characteristics of the structural layer SL may also include the size of the structural layer SL along at least one direction of the forming surface MS (typically at least one direction that intersects the lamination direction of the plurality of structural layers SL). In this case, the size of the structure layer SL may also be referred to as the width of the structure layer SL. In the following description, unless otherwise stated, the size of the structural layer SL refers to the size of the structural layer SL in at least one direction along the forming surface MS. For example, the size of the structural layer SL may be the size of the structural layer SL in an arbitrary direction in the XY plane. In this case, the shaping system 1 performs a first characteristic changing operation as a characteristic changing operation for reducing the size of the lowermost structural layer SL (hereinafter, appropriately referred to as the “structural layer SL_lowest”). The size is changed to a size different from that of the other structural layers SL (hereinafter, appropriately referred to as “structural layer SL_upper”) other than the structural layer SL_lowest. When the sizes of the structural layers SL are compared, the size of each structural layer SL may be the size of the structural layer SL in the same direction. More specifically, the shaping system 1 performs, for example, an operation as a first characteristic changing operation for reducing the size of the structural layer SL_lowest to be smaller than the size of the structural layer SL_upper. As detailed later, when the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, the structure layer SL_lowest is smaller than the case where the size of the structure layer SL_lowest does not become smaller than the size of the structure layer SL_upper. Easily separated from the workpiece W. If the structural layer SL_lowest is separated from the workpiece W, the structural layer SL_upper that has been integrated with the workpiece W via the structural layer SL_lowest is also separated from the workpiece W. In this way, separation of the three-dimensional structure ST from the workpiece W becomes easier than when the three-dimensional structure ST is formed by the first shaping operation.

結構層SL的特性亦可包含結構層SL對於破壞的抵抗力(換言之,破碎困難度,例如韌性)。換言之,結構層SL的特性亦可包含結構層SL的脆度(換言之,脆性)。於此情況下,造形系統1進行作為特性變更動作的第二特性變更動作,所述第二特性變更動作將最下層的結構層SL_lowest對於破壞的抵抗力變更成與結構層SL_lowest以外的其他結構層SL_upper對於破壞的抵抗力不同的抵抗力。更具體而言,造形系統1例如進行作為第二特性變更動作的如下的動作,所述動作用於使結構層SL_lowest對於破壞的抵抗力變得較結構層SL_upper對於破壞的抵抗力低。結構層SL_upper亦可與由第一造形動作所形成的結構層SL同樣地形成。於此情況下,造形系統1亦可進行作為第二特性變更動作的如下的動作,所述動作用於使結構層SL_lowest對於破壞的抵抗力與藉由第一造形動作來形成結構層SL(典型的是結構層SL_lowest)的情況相比變低。如其後進行詳述般,於結構層SL_lowest對於破壞的抵抗力變低的情況下,與結構層SL_lowest對於破壞的抵抗力不變低的情況(即,藉由第一造形動作來形成結構層SL(典型的是結構層SL_lowest)的情況)相比,結構層SL_lowest容易被破壞。因此,亦可說第二特性變更動作是用於使結構層SL_lowest較結構層SL_upper更容易被破壞的動作。若結構層SL_lowest被破壞,則經由結構層SL_lowest而已與工件W一體化的結構層SL_upper自工件W分離。如此,三維結構物ST自工件W的分離變得容易。The characteristics of the structural layer SL may also include the resistance of the structural layer SL to damage (in other words, the difficulty of breaking, such as toughness). In other words, the characteristics of the structural layer SL may also include the brittleness (in other words, brittleness) of the structural layer SL. In this case, the shaping system 1 performs a second characteristic changing operation as a characteristic changing operation, which changes the resistance of the lowermost structural layer SL_lowest to destruction to a structural layer other than the structural layer SL_lowest. SL_upper has different resistance to destruction. More specifically, the shaping system 1 performs, for example, an operation for changing the characteristic resistance of the structural layer SL_lowest to destruction lower than the structural layer SL_upper's resistance to destruction as a second characteristic changing operation. The structure layer SL_upper may be formed in the same manner as the structure layer SL formed by the first shaping operation. In this case, the shaping system 1 may also perform the following actions as the second characteristic changing action, which is to make the structural layer SL_lowest resistant to destruction and to form the structural layer SL (typically by the first shaping action) It is the structure layer SL_lowest). As detailed later, when the structural layer SL_lowest has a low resistance to destruction, and when the structural layer SL_lowest has a low resistance to destruction (that is, the structural layer SL is formed by the first shaping operation). (Typically the case of the structure layer SL_lowest) Compared with the structure layer SL_lowest, it is easy to be destroyed. Therefore, it can be said that the second characteristic changing operation is an operation for making the structural layer SL_lowest more likely to be destroyed than the structural layer SL_upper. If the structural layer SL_lowest is destroyed, the structural layer SL_upper that has been integrated with the workpiece W via the structural layer SL_lowest is separated from the workpiece W. In this way, separation of the three-dimensional structure ST from the workpiece W becomes easy.

結構層SL的特性亦可包含結構層SL對於工件W的結合力(換言之,附著力)。於此情況下,造形系統1進行作為特性變更動作的第三特性變更動作,所述第三特性變更動作將最下層的結構層SL_lowest對於工件W的結合力變更成與結構層SL_lowest以外的其他結構層SL_upper對於工件W的結合力不同的結合力。更具體而言,造形系統1進行作為第三特性變更動作的如下的動作,所述動作用於使結構層SL_lowest對於工件W的結合力變得較結構層SL_upper對於工件W的結合力弱。結構層SL_upper亦可與由第一造形動作所形成的結構層SL同樣地形成。於此情況下,造形系統1亦可進行作為第三特性變更動作的如下的動作,所述動作用於使結構層SL_lowest對於工件W的結合力與藉由第一造形動作來形成結構層SL(典型的是結構層SL_lowest)的情況相比變弱。如其後進行詳述般,於結構層SL_lowest對於工件W的結合力變弱的情況下,與結構層SL_lowest對於工件W的結合力不變弱的情況(即,藉由第一造形動作來形成結構層SL(典型的是結構層SL_lowest)的情況)相比,結構層SL_lowest容易自工件W分離。若結構層SL_lowest自工件W分離,則經由結構層SL_lowest而已與工件W結合的結構層SL_upper亦自工件W分離。如此,與藉由第一造形動作來形成三維結構物ST的情況相比,三維結構物ST自工件W的分離變得容易。
以下,對此種第一特性變更動作~第三特性變更動作的詳細情況依次進行說明。
(2-2-1)第一特性變更動作
The characteristics of the structural layer SL may also include the binding force (in other words, adhesion) of the structural layer SL to the workpiece W. In this case, the shaping system 1 performs a third characteristic changing operation as a characteristic changing operation that changes the binding force of the lowermost structural layer SL_lowest to the workpiece W to a structure other than the structural layer SL_lowest. The binding force of the layer SL_upper to the workpiece W is different. More specifically, the shaping system 1 performs an operation as a third characteristic changing operation for making the bonding force of the structural layer SL_lowest to the workpiece W weaker than the bonding force of the structural layer SL_upper to the workpiece W. The structure layer SL_upper may be formed in the same manner as the structure layer SL formed by the first shaping operation. In this case, the forming system 1 may also perform the following operation as a third characteristic changing operation for making the binding force of the structural layer SL_lowest to the workpiece W and forming the structural layer SL by the first forming operation ( It is typically weaker in the structure layer SL_lowest). As described in detail later, when the binding force of the structural layer SL_lowest to the workpiece W becomes weak, the binding force of the structural layer SL_lowest to the workpiece W does not become weak (that is, the structure is formed by the first shaping operation). Compared to the case of the layer SL (typically the structure layer SL_lowest), the structure layer SL_lowest is easier to separate from the workpiece W. If the structural layer SL_lowest is separated from the workpiece W, the structural layer SL_upper that has been combined with the workpiece W via the structural layer SL_lowest is also separated from the workpiece W. In this way, separation of the three-dimensional structure ST from the workpiece W becomes easier than when the three-dimensional structure ST is formed by the first shaping operation.
Details of the first to third characteristic changing operations will be described below in order.
(2-2-1) First characteristic change operation

首先,對用於變更結構層SL的尺寸的第一特性變更動作進行說明。造形系統1為了改變結構層SL的尺寸,例如亦可變更形成結構層SL時的形成條件。例如,造形系統1亦可將形成結構層SL_lowest時的形成條件變更成與形成結構層SL_upper時的形成條件不同的形成條件。First, a first characteristic changing operation for changing the size of the structural layer SL will be described. In order to change the size of the structure layer SL, the shaping system 1 may change the formation conditions when forming the structure layer SL, for example. For example, the forming system 1 may change the formation conditions when forming the structural layer SL_lowest to formation conditions different from the formation conditions when forming the structural layer SL_upper.

第一特性變更動作的形成條件亦可包含熔融池MP的尺寸。尤其,形成條件亦可包含沿著造形面MS的至少一個方向上的熔融池MP的尺寸。於此情況下,熔融池MP的尺寸亦可稱為熔融池MP的寬度。於以下的說明中,於無特別的表述的情況下,熔融池MP的尺寸是指沿著造形面MS的至少一個方向上的熔融池MP的尺寸。例如,可將熔融池MP的尺寸設為XY平面內的任意的方向。於此情況下,造形系統1亦可將用於形成結構層SL_lowest的熔融池MP的尺寸變更成與用於形成結構層SL_upper的熔融池MP的尺寸不同的尺寸。再者,於進行熔融池MP彼此的尺寸的比較的情況下,只要將各熔融池MP的尺寸設為相同的方向上的熔融池MP的尺寸即可。具體而言,為了使結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,亦可使用於形成結構層SL_lowest的熔融池MP的尺寸變得較用於形成結構層SL_upper的熔融池MP的尺寸小。例如,如圖4(a)所示,當於造形面MS上形成結構層SL_lowest時,造形系統1亦可將順著沿著造形面MS的至少一個方向(於圖4(a)所示的例子中是沿著XY平面的至少一個方向,例如X軸方向及/或Y軸方向)的尺寸變成第一尺寸R1的熔融池MP形成於造形面MS。另一方面,如圖4(b)所示,當於造形面MS上形成結構層SL_upper時,造形系統1亦可將順著沿著造形面MS的至少一個方向的尺寸變成較第一尺寸R1大的第二尺寸R2的熔融池MP形成於造形面MS。再者,如圖4(a)及圖4(b)所示,存在形成於造形面MS上的熔融池MP於沿著造形面MS的方向上變成圓形的情況。於此情況下,熔融池MP的尺寸亦可稱為熔融池MP的直徑。再者,當於沿著造形面MS的相互正交的兩個方向上熔融池MP的尺寸不同時,例如當熔融池MP為橢圓形狀時,亦可將任一個方向上的熔融池MP的尺寸設為熔融池MP的尺寸。作為一例,不對用於形成結構層SL_lowest的熔融池MP的沿著Y方向的尺寸與用於形成結構層SL_upper的熔融池MP的沿著X方向的尺寸進行比較,而對用於形成結構層SL_lowest的熔融池MP的沿著Y方向的尺寸與用於形成結構層SL_upper的熔融池MP的沿著Y方向的尺寸進行比較。The formation conditions of the first characteristic changing operation may include the size of the molten pool MP. In particular, the forming conditions may include the size of the molten pool MP in at least one direction along the forming surface MS. In this case, the size of the melting pool MP may also be referred to as the width of the melting pool MP. In the following description, unless otherwise stated, the size of the melting pool MP refers to the size of the melting pool MP along at least one direction along the forming surface MS. For example, the size of the molten pool MP can be set to an arbitrary direction in the XY plane. In this case, the shaping system 1 may change the size of the melting pool MP for forming the structural layer SL_lowest to a size different from the size of the melting pool MP for forming the structural layer SL_upper. When the sizes of the melting pools MP are compared, the sizes of the melting pools MP may be set to the sizes of the melting pools MP in the same direction. Specifically, in order to make the size of the structural layer SL_lowest smaller than the size of the structural layer SL_upper, the size of the melting pool MP used to form the structural layer SL_lowest may also be smaller than that of the molten pool MP used to form the structural layer SL_upper. small. For example, as shown in FIG. 4 (a), when the structural layer SL_lowest is formed on the forming surface MS, the forming system 1 may also follow at least one direction along the forming surface MS (shown in FIG. 4 (a)). In the example, the molten pool MP having a size in at least one direction along the XY plane (for example, the X-axis direction and / or the Y-axis direction) becomes the first size R1 is formed on the forming surface MS. On the other hand, as shown in FIG. 4 (b), when the structural layer SL_upper is formed on the forming surface MS, the forming system 1 can also change the size along at least one direction along the forming surface MS to be larger than the first dimension R1. The molten pool MP of the large second size R2 is formed on the forming surface MS. In addition, as shown in FIGS. 4 (a) and 4 (b), the molten pool MP formed on the forming surface MS may become circular in a direction along the forming surface MS. In this case, the size of the melting pool MP may also be referred to as the diameter of the melting pool MP. In addition, when the size of the melting pool MP is different in two mutually orthogonal directions along the forming surface MS, for example, when the melting pool MP has an oval shape, the size of the melting pool MP in either direction may be changed. The size of the melting pool MP is set. As an example, the size in the Y direction of the molten pool MP for forming the structural layer SL_lowest and the size in the X direction of the melting pool MP for forming the structural layer SL_upper are not compared, and the structural layer SL_lowest is not compared. The size of the molten pool MP in the Y direction is compared with the size of the molten pool MP in the Y direction to form the structural layer SL_upper.

為了變更熔融池MP的尺寸,造形系統1亦可對照射系統111所照射的光EL的特性進行控制。於此情況下,造形系統1亦可將用於形成結構層SL_lowest的光EL的特性變更成與用於形成結構層SL_upper的光EL的特性不同的特性。即,造形系統1於形成結構層SL_lowest時,亦可將光EL的特性設定成用於形成結構層SL_lowest的(即,用於形成小尺寸的熔融池MP的)第一特性。另一方面,造形系統1於形成結構層SL_upper時,亦可將光EL的特性設定成用於形成結構層SL_upper的(即,用於形成大尺寸的熔融池MP的)第二特性(典型的是第二特性與第一特性不同)。再者,第二特性亦可稱為用於形成尺寸較藉由第一特性的光EL所形成的小尺寸的熔融池MP大的熔融池MP的光EL的特性。In order to change the size of the melting pool MP, the shaping system 1 may also control the characteristics of the light EL irradiated by the irradiation system 111. In this case, the shaping system 1 may change the characteristics of the light EL used to form the structural layer SL_lowest to a characteristic different from the characteristics of the light EL used to form the structural layer SL_upper. That is, when the forming system 1 forms the structural layer SL_lowest, the characteristics of the light EL can also be set as the first characteristic for forming the structural layer SL_lowest (that is, for forming the small-sized molten pool MP). On the other hand, when the forming system 1 forms the structural layer SL_upper, the characteristics of the light EL can also be set to the second characteristic (typically, used to form the structural layer SL_upper (that is, used to form a large-scale molten pool MP)). Is the second characteristic is different from the first characteristic). In addition, the second characteristic may also be referred to as a characteristic of the light EL for forming the melting pool MP having a larger size than the small-sized melting pool MP formed by the light EL of the first characteristic.

第一特性變更動作的光EL的特性亦可包含造形面MS上的每單位面積的光EL的強度(或每單位面積的能量)。再者,能量亦可稱為能源量。於此情況下,如圖5所示,造形系統1於形成結構層SL_lowest時,亦可將每單位面積的光EL的強度設定成第一強度。另一方面,如圖5所示,造形系統1於形成結構層SL_upper時,亦可將每單位面積的光EL的強度設定成較第一強度大的第二強度。其結果,當形成結構層SL_lowest時,於每單位面積自光EL對造形面MS傳遞的能量及於每單位時間自光EL對造形面MS傳遞的能量中的至少一者變得較當形成結構層SL_upper時,於每單位面積自光EL對造形面MS傳遞的能量及於每單位時間自光EL對造形面MS傳遞的能量中的至少一者少。於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得越少,藉由光EL的照射而於造形面MS上熔融的造形材料M變得越少。因此,形成結構層SL_lowest時於造形面MS上熔融的造形材料M變得較形成結構層SL_upper時於造形面MS上熔融的造形材料M少。於造形面MS上熔融的造形材料M變得越少,包含該已熔融的造形材料M的熔融池MP的尺寸變得越小。因此,形成結構層SL_lowest時形成於造形面MS的熔融池MP的尺寸變得較形成結構層SL_upper時形成於造形面MS的熔融池MP的尺寸小。再者,光EL的特性亦可為造形面MS上的每單位時間的每單位面積的光EL的強度(或每單位面積的能量)。The characteristics of the light EL in the first characteristic changing operation may include the intensity (or energy per unit area) of the light EL per unit area on the forming surface MS. Furthermore, energy can also be referred to as the amount of energy. In this case, as shown in FIG. 5, when the forming system 1 forms the structural layer SL_lowest, the intensity of the light EL per unit area may be set to the first intensity. On the other hand, as shown in FIG. 5, when the forming system 1 forms the structural layer SL_upper, the intensity of the light EL per unit area may be set to a second intensity greater than the first intensity. As a result, when the structural layer SL_lowest is formed, at least one of the energy transferred from the light EL to the shaping surface MS per unit area and the energy transferred from the light EL to the shaping surface MS per unit time becomes a more appropriate structure. In the layer SL_upper, at least one of the energy transferred from the light EL to the shaping surface MS per unit area and the energy transferred from the light EL to the shaping surface MS per unit time is small. The less the energy transferred from the light EL to the shaping surface MS per unit area or the unit time, the less the shaping material M melted on the shaping surface MS by the irradiation of the light EL. Therefore, the forming material M melted on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the forming material M melted on the forming surface MS when the structural layer SL_upper is formed. The smaller the amount of the molding material M to be melted on the molding surface MS, the smaller the size of the melting pool MP containing the molten molding material M becomes. Therefore, the size of the molten pool MP formed on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the size of the molten pool MP formed on the forming surface MS when the structural layer SL_upper is formed. Moreover, the characteristic of the light EL may be the intensity (or energy per unit area) of the light EL per unit area per unit time on the shaping surface MS.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

第一特性變更動作的光EL的特性亦可包含相對於造形面MS的光EL的散焦(defocus)量。再者,此處所述的「相對於造形面MS的光EL的散焦量」亦可表示與造形面MS交叉的方向(典型的是正交的方向,例如Z軸方向或光EL的前進方向)上的造形面MS與光EL的聚焦位置FP的偏離量。於此情況下,造形系統1於形成結構層SL_lowest時,亦可將光EL的散焦量設定成第一散焦量。另一方面,造形系統1於形成結構層SL_upper時,亦可將光EL的散焦量設定成較第一散焦量小的第二散焦量。例如,造形系統1亦可於(i)形成結構層SL_lowest時,如圖6(a)所示,以光EL的散焦量變得較零大(即,將光EL的聚焦位置FP設定於已自造形面MS朝Z軸方向偏離的位置)的方式,設定光EL的散焦量,於(ii)形成結構層SL_upper時,如圖6(b)所示,以光EL的散焦量變成零(即,將光EL的聚焦位置FP設定於造形面MS)的方式,設定光EL的散焦量。或者,例如造形系統1亦可於(i)形成結構層SL_lowest時,以光EL的散焦量與形成結構層SL_upper的情況相比變大(換言之,將光EL的聚焦位置FP設定於與形成結構層SL_upper的情況相比已自造形面MS朝Z軸方向大幅度偏離的位置)的方式,設定光EL的散焦量,於(ii)形成結構層SL_upper時,以光EL的散焦量與形成結構層SL_lowest的情況相比變小(即,將光EL的聚焦位置FP設定於與形成結構層SL_lowest的情況相比已自造形面MS朝Z軸方向小幅度偏離的位置)的方式,設定光EL的散焦量。於光EL的散焦量大的情況下,如圖6(c)所示,造形面MS上的光EL的強度分佈變成如具有可使造形材料M熔融的強度(具體而言,規定的強度閾值以上的強度)的光EL的範圍變小的分佈。因此,於光EL的散焦量大的情況下,雖然於造形面MS上被照射光EL的範圍變大,但作為整體僅被照射強度小的光EL,因此於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變小。另一方面,於光EL的散焦量小的情況下,如圖6(d)所示,造形面MS上的光EL的強度分佈變成如具有使造形材料M熔融的強度的光EL的範圍相對地變大的分佈。因此,於光EL的散焦量小的情況下,雖然於造形面MS上被照射光EL的範圍變小,但作為整體被照射強度大的光EL,因此於每單位面積或每單位時間自光EL對造形面MS傳遞的能量相對於所述情況變大。其結果,於每單位面積或每單位時間自散焦量大的光EL對造形面MS傳遞的能量變得較於每單位面積或每單位時間自散焦量小的光EL對造形面MS傳遞的能量少。即,形成結構層SL_lowest時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得較形成結構層SL_upper時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量少。因此,形成結構層SL_lowest時形成於造形面MS的熔融池MP的尺寸變得較形成結構層SL_upper時形成於造形面MS的熔融池MP的尺寸小。The characteristics of the light EL of the first characteristic changing operation may include a defocus amount with respect to the light EL of the shaping surface MS. Furthermore, the "defocus amount of the light EL with respect to the shaping surface MS" described herein may also indicate a direction (typically an orthogonal direction) that intersects the shaping surface MS, such as the Z-axis direction or the advancement of the light EL The amount of deviation of the shaping surface MS from the focusing position FP of the light EL. In this case, when the shaping system 1 forms the structural layer SL_lowest, the defocus amount of the light EL can also be set to the first defocus amount. On the other hand, when the shaping system 1 forms the structural layer SL_upper, the defocus amount of the light EL can be set to a second defocus amount smaller than the first defocus amount. For example, when the forming system 1 (i) forms the structural layer SL_lowest, as shown in FIG. 6 (a), the defocus amount of the light EL becomes larger than zero (that is, the focus position FP of the light EL is set to Position of the self-shaping surface MS in the Z-axis direction), the defocus amount of the light EL is set, and when (ii) the structural layer SL_upper is formed, as shown in FIG. 6 (b), the defocus amount of the light EL becomes In a manner of zero (that is, the focal position FP of the light EL is set to the shaping surface MS), the defocus amount of the light EL is set. Alternatively, for example, when the forming system 1 (i) forms the structure layer SL_lowest, the defocus amount of the light EL becomes larger than that when the structure layer SL_upper is formed (in other words, the focal position FP of the light EL is set to be equal to that of the formation of the light EL). In the case of the structure layer SL_upper, the defocus amount of the light EL is set compared to the position where the self-shaping surface MS has deviated significantly in the Z-axis direction). (Ii) When the structure layer SL_upper is formed, the defocus amount of the light EL is set. Compared with the case where the structure layer SL_lowest is formed (ie, the focusing position FP of the light EL is set to a position that has shifted slightly from the shaping surface MS in the Z axis direction compared with the case where the structure layer SL_lowest is formed), Set the defocus amount of the light EL. In the case where the defocus amount of the light EL is large, as shown in FIG. 6 (c), the intensity distribution of the light EL on the shaping surface MS becomes such that it has an intensity that can melt the shaping material M (specifically, a predetermined intensity). A range in which the range of light EL of the intensity (intensity or more than the threshold value) becomes smaller. Therefore, in the case where the defocus amount of the light EL is large, although the range of the light EL irradiated on the shaping surface MS becomes large, as a whole, only the light EL having a small intensity is irradiated. The energy transmitted from the self-light EL to the forming surface MS becomes smaller. On the other hand, when the defocus amount of the light EL is small, as shown in FIG. 6 (d), the intensity distribution of the light EL on the forming surface MS becomes a range of the light EL having an intensity such that the forming material M is melted. Relatively large distribution. Therefore, in the case where the defocus amount of the light EL is small, although the range of the light EL irradiated on the shaping surface MS becomes small, the light EL having a large intensity is irradiated as a whole. The energy transferred from the light EL to the shaping surface MS becomes larger than that described above. As a result, the energy transferred from the light EL with a large defocus amount per unit area or unit time to the shaping surface MS is greater than that from the light EL with a small defocus amount per unit area or unit time. Less energy. That is, the energy transferred from the light EL to the shaping surface MS per unit area or unit time when the structural layer SL_lowest is formed becomes larger than the energy transferred from the light EL to the shaping surface MS per unit area or unit time when the structural layer SL_upper is formed Less energy. Therefore, the size of the molten pool MP formed on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the size of the molten pool MP formed on the forming surface MS when the structural layer SL_upper is formed.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

第一特性變更動作的光EL的特性亦可包含每單位面積的光EL的照射時間。於此情況下,造形系統1於形成結構層SL_lowest時,亦可將光EL的照射時間設定成短的第一照射時間。另一方面,造形系統1於形成結構層SL_upper時,亦可將光EL的照射時間設定成較第一照射時間長的第二照射時間。例如,造形系統1於形成結構層SL_lowest時,如圖7(a)所示,亦可將斷續地切換開閉的脈衝光作為光EL來照射。即,造形系統1於形成結構層SL_lowest時,亦可斷續地或脈衝式地照射光EL。另一方面,造形系統1於形成結構層SL_upper時,如圖7(b)所示,亦可將未斷續地切換照射及不照射(即,連續地持續照射)的連續光作為光EL來照射。換言之,造形系統1於形成結構層SL_upper時,亦可連續地照射光EL。其結果,於形成結構層SL_lowest的情況下,與形成結構層SL_upper的情況相比,產生不照射光EL的時間,相應地光EL的照射時間變短。或者,例如造形系統1於形成結構層SL_lowest時,如圖8(a)所示,亦可將表示照射光EL的時間的比例的占空比小的脈衝光作為光EL來照射。另一方面,造形系統1於形成結構層SL_upper時,如圖8(b)所示,亦可將與圖8(a)的情況相比占空比大的脈衝光作為光EL來照射。此處,於光EL週期性地重覆照射與不照射的情況下,可將光EL的占空比設為照射時間對於所述週期期間的比例。其結果,於形成結構層SL_lowest的情況下,與形成結構層SL_upper的情況相比,占空比變小,相應地光EL的照射時間變短。每單位面積的光EL的照射時間變得越短,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得越小。即,於照射時間短的情況下,與照射時間長的情況相比,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變少。因此,形成結構層SL_lowest時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得較形成結構層SL_upper時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量少。因此,形成結構層SL_lowest時形成於造形面MS的熔融池MP的尺寸變得較形成結構層SL_upper時形成於造形面MS的熔融池MP的尺寸小。The characteristics of the light EL in the first characteristic changing operation may include the irradiation time of the light EL per unit area. In this case, when the forming system 1 forms the structural layer SL_lowest, the irradiation time of the light EL may be set to a short first irradiation time. On the other hand, when the forming system 1 forms the structural layer SL_upper, the irradiation time of the light EL may be set to a second irradiation time longer than the first irradiation time. For example, when the forming system 1 forms the structural layer SL_lowest, as shown in FIG. 7 (a), pulse light that is intermittently switched on and off may be irradiated as light EL. That is, the forming system 1 may irradiate the light EL intermittently or pulsed when the structural layer SL_lowest is formed. On the other hand, when the forming system 1 forms the structural layer SL_upper, as shown in FIG. 7 (b), continuous light that is continuously switched between irradiation and non-irradiation (that is, continuous irradiation) can be used as the light EL. Irradiation. In other words, when the forming system 1 forms the structural layer SL_upper, the light EL can be continuously irradiated. As a result, when the structural layer SL_lowest is formed, compared with the case where the structural layer SL_upper is formed, the time during which the light EL is not irradiated is generated, and accordingly, the irradiation time of the light EL is shortened. Alternatively, for example, when the forming system 1 forms the structural layer SL_lowest, as shown in FIG. 8 (a), pulsed light having a small duty ratio indicating the ratio of the time of the irradiation light EL may be irradiated as the light EL. On the other hand, when the forming system 1 forms the structural layer SL_upper, as shown in FIG. 8 (b), pulsed light having a larger duty ratio than that in the case of FIG. 8 (a) may be irradiated as the light EL. Here, in a case where the light EL is repeatedly irradiated and not irradiated periodically, the duty ratio of the light EL may be set as a ratio of the irradiation time to the period period. As a result, in the case where the structural layer SL_lowest is formed, the duty ratio becomes smaller than in the case where the structural layer SL_upper is formed, and accordingly, the irradiation time of the light EL becomes shorter. The shorter the irradiation time of the light EL per unit area becomes, the smaller the energy transferred from the light EL to the shaping surface MS per unit area or per unit time becomes. That is, in the case where the irradiation time is short, as compared with the case where the irradiation time is long, the energy transferred from the light EL to the shaping surface MS per unit area or unit time is reduced. Therefore, the energy transferred from the light EL to the shaping surface MS per unit area or unit time when the structural layer SL_lowest is formed becomes larger than the energy transferred from the light EL to the shaping surface MS per unit area or per unit time when the structural layer SL_upper is formed. Less energy. Therefore, the size of the molten pool MP formed on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the size of the molten pool MP formed on the forming surface MS when the structural layer SL_upper is formed.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

為了變更熔融池MP的尺寸,造形系統1亦可對由材料噴嘴112所供給的造形材料M的供給形態進行控制。於此情況下,造形系統1亦可將形成結構層SL_lowest時的造形材料M的供給形態變更成與形成結構層SL_upper時的供給形態不同的供給形態。即,造形系統1於形成結構層SL_lowest時,亦可將造形材料M的供給形態設定成用於形成結構層SL_lowest的(即,用於形成小尺寸的熔融池MP的)第一供給形態。另一方面,造形系統1於形成結構層SL_upper時,亦可將造形材料M的供給形態設定成用於形成結構層SL_upper的(即,用於形成尺寸較用於形成結構層SL_lowest的小尺寸的熔融池MP大的熔融池MP的)第二供給形態(典型的是第二供給形態與第一供給形態不同)。In order to change the size of the melting pool MP, the forming system 1 may also control the supply form of the forming material M supplied from the material nozzle 112. In this case, the forming system 1 may change the supply form of the forming material M when the structural layer SL_lowest is formed to a supply form different from the supply form when the structural layer SL_upper is formed. That is, when the forming system 1 forms the structural layer SL_lowest, the supply form of the forming material M can also be set to the first supply form for forming the structural layer SL_lowest (that is, for forming the molten pool MP with a small size). On the other hand, when the forming system 1 forms the structural layer SL_upper, the supply form of the forming material M can also be set to be used to form the structural layer SL_upper (that is, to form a smaller size than that used to form the structural layer SL_lowest. The second supply mode (of which the melting pool MP is large) (typically, the second supply mode is different from the first supply mode).

第一特性變更動作的造形材料M的供給形態亦可包含每單位時間的造形材料M的供給量及每單位面積的造形材料M的供給量中的至少一者(即,造形材料M的供給率)。於此情況下,如圖9(a)所示,造形系統1於形成結構層SL_lowest時,亦可將造形材料M的供給量設定成第一供給量。另一方面,如圖9(a)所示,造形系統1於形成結構層SL_upper時,亦可將造形材料M的供給量設定成較圖9(a)的情況少(即,較第一供給量少)的第二供給量。於造形材料M的供給量多的情況下,如圖9(b)所示,光EL容易由被供給至造形面MS的造形材料M遮蔽。其原因在於:雖然造形材料M藉由光EL的照射而熔融,但於較可熔融的量多的量的造形材料M被供給至造形面MS的情況下,被供給的造形材料M的至少一部分不藉由光EL的照射而熔融,可作為遮蔽光EL的遮蔽物發揮功能。其結果,到達造形面MS為止的光EL的強度變小,因此於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變小。即,造形系統1為了使於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變小,將被供給的造形材料M的至少一部分用作對於光EL的遮蔽物。另一方面,於造形材料M的供給量少的情況下,如圖9(c)所示,光EL難以由被供給至造形面MS的造形材料M遮蔽。其結果,到達造形面MS的光EL的強度與圖9(b)的情況相比變大,因此於每單位面積或每單位時間自光EL對造形面MS傳遞的能量與圖9(b)的情況相比變大。因此,於造形材料M的供給量多的狀況下,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得較於造形材料M的供給量少的狀況下,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量少。即,形成結構層SL_lowest時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得較形成結構層SL_upper時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量少。因此,形成結構層SL_lowest時形成於造形面MS的熔融池MP的尺寸變得較形成結構層SL_upper時形成於造形面MS的熔融池MP的尺寸小。The supply form of the forming material M in the first characteristic changing operation may include at least one of the supply amount of the forming material M per unit time and the supply amount of the forming material M per unit area (that is, the supply rate of the forming material M). ). In this case, as shown in FIG. 9 (a), when the forming system 1 forms the structural layer SL_lowest, the supply amount of the forming material M may be set to the first supply amount. On the other hand, as shown in FIG. 9 (a), when the forming system 1 forms the structural layer SL_upper, the supply amount of the forming material M can also be set smaller than that in FIG. 9 (a) (that is, compared with the first supply). Small amount) of the second supply. When the supply amount of the shaping material M is large, as shown in FIG. 9 (b), the light EL is easily shielded by the shaping material M supplied to the shaping surface MS. The reason is that although the shaping material M is melted by irradiation with light EL, at least a part of the supplied shaping material M is supplied to the shaping surface MS when a larger amount of the shaping material M is supplied to the shaping surface MS. It can be melted without being irradiated with light EL, and can function as a shield for shielding light EL. As a result, the intensity of the light EL until it reaches the shaping surface MS is reduced, so that the energy transmitted from the light EL to the shaping surface MS per unit area or unit time is reduced. That is, in order to reduce the energy transferred from the light EL to the forming surface MS per unit area or unit time, the forming system 1 uses at least a part of the supplied forming material M as a shield for the light EL. On the other hand, when the supply amount of the shaping material M is small, as shown in FIG. 9 (c), the light EL is difficult to be shielded by the shaping material M supplied to the shaping surface MS. As a result, the intensity of the light EL reaching the forming surface MS is larger than that in the case of FIG. 9 (b). Therefore, the energy transferred from the light EL to the forming surface MS per unit area or unit time is the same as that of FIG. 9 (b) Compared to the situation becomes larger. Therefore, in the case where the supply amount of the molding material M is large, the energy transferred from the light EL to the molding surface MS per unit area or unit time becomes smaller than the supply amount of the molding material M per unit area. The area or unit of energy transferred from the light EL to the shaping surface MS is small. That is, the energy transferred from the light EL to the shaping surface MS per unit area or unit time when the structural layer SL_lowest is formed becomes larger than the energy transferred from the light EL to the shaping surface MS per unit area or per unit time when the structural layer SL_upper is formed. Less energy. Therefore, the size of the molten pool MP formed on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the size of the molten pool MP formed on the forming surface MS when the structural layer SL_upper is formed.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

再者,若於已形成有熔融池MP的狀況下,造形材料M的供給量變多,則熔融池MP藉由被供給的造形材料M而得到冷卻的可能性變高。其結果,經冷卻並固化的造形材料M增加,相應地包含不固化而維持熔融的造形材料M的熔融池MP的尺寸變小。因此,除將被供給的造形材料M的至少一部分用作對於光EL的遮蔽物以外,亦可將其用作用於冷卻熔融池MP的冷卻材料,或將其用作用於冷卻熔融池MP的冷卻材料來代替用作對於光EL的遮蔽物。於此情況下,形成結構層SL_lowest時形成於造形面MS的熔融池MP的尺寸亦變得較形成結構層SL_upper時形成於造形面MS的熔融池MP的尺寸小。Furthermore, if the supply amount of the molding material M is increased in a state where the molten pool MP is already formed, the possibility that the molten pool MP is cooled by the supplied molding material M becomes high. As a result, the molding material M cooled and solidified increases, and accordingly, the size of the molten pool MP including the molding material M that is not solidified and remains molten is reduced. Therefore, in addition to using at least a part of the supplied shaping material M as a shield for the light EL, it can also be used as a cooling material for cooling the melting pool MP, or it can be used as cooling for cooling the melting pool MP. Materials are used instead as a shield for light EL. In this case, the size of the molten pool MP formed on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the size of the molten pool MP formed on the forming surface MS when the structural layer SL_upper is formed.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

第一特性變更動作的造形材料M的供給形態亦可包含造形材料M的供給時序(或供給時期)。於此情況下,如圖10(a)所示,造形系統1於形成結構層SL_lowest時,亦可於照射光EL之前將造形材料M事先供給至造形面MS。尤其,造形系統1亦可於照射光EL之前,將至少一部分可作為遮蔽光EL的遮蔽物發揮功能的程度的量的造形材料M事先供給至造形面MS的整個面(或一部分)。如圖10(b)所示,造形系統1亦可於造形材料M被供給至造形面MS後照射光EL。此時,如圖10(b)所示,造形系統1亦可於照射光EL的期間內不供給造形材料M。其結果,被事先供給的造形材料M不會因來自材料噴嘴112的供給物(例如,新供給的造形材料M及/或為了新供給造形材料M而自材料噴嘴112中噴出的氣體等)而被吹跑。但是,造形系統1亦可於照射光EL的期間的至少一部分中供給造形材料M。其結果,被事先供給至造形面MS的造形材料M的至少一部分熔融而與造形面MS一體化,藉此形成結構層SL_lowest。此處,於造形材料M被事先供給至造形面MS的情況下,該被事先供給的造形材料M的至少一部分可作為遮蔽光EL的遮蔽物發揮功能。因此,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量與不存在遮蔽物的情況相比變小。因此,熔融池MP的尺寸與不存在遮蔽物的情況相比變小。另一方面,如圖10(c)所示,造形系統1於形成結構層SL_upper時,亦可於照射光EL之前不將造形材料M事先供給至造形面MS。即,如圖10(d)所示,造形系統1於形成結構層SL_upper時,亦可一面照射光EL一面將造形材料M局部地供給至光EL的照射區域EA(或熔融池MP)。於造形材料M未被事先供給至造形面MS的情況下,造形材料M被局部地供給,因此該被局部地供給的造形材料M的至少一部分作為遮蔽光EL的遮蔽物發揮功能的可能性變小。因此,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量與存在遮蔽物的情況相比變大。因此,熔融池MP的尺寸與存在遮蔽物的情況相比變大。The supply form of the forming material M in the first characteristic changing operation may include a supply timing (or supply timing) of the forming material M. In this case, as shown in FIG. 10 (a), when the forming system 1 forms the structural layer SL_lowest, the forming material M may be supplied to the forming surface MS in advance before the light EL is irradiated. In particular, the shaping system 1 may supply, to the entire surface (or a part) of the shaping surface MS, an amount of the shaping material M to such an extent that at least a portion can function as a shield for shielding the light EL before the light EL is irradiated. As shown in FIG. 10 (b), the shaping system 1 may also irradiate light EL after the shaping material M is supplied to the shaping surface MS. At this time, as shown in FIG. 10 (b), the shaping system 1 may not supply the shaping material M during the period in which the light EL is irradiated. As a result, the molding material M supplied in advance is not caused by the supply from the material nozzle 112 (for example, the newly supplied molding material M and / or the gas ejected from the material nozzle 112 for the new supply of the molding material M) Was blown away. However, the shaping system 1 may supply the shaping material M in at least a part of the period during which the light EL is irradiated. As a result, at least a part of the forming material M supplied to the forming surface MS in advance is melted and integrated with the forming surface MS, thereby forming the structural layer SL_lowest. Here, when the shaping material M is supplied to the shaping surface MS in advance, at least a part of the shaping material M supplied in advance can function as a shield to shield the light EL. Therefore, the energy transferred from the light EL to the shaping surface MS per unit area or unit time becomes smaller than that in the case where there is no shield. Therefore, the size of the melting pool MP becomes smaller than that in the case where no shield is present. On the other hand, as shown in FIG. 10 (c), when the forming system 1 forms the structural layer SL_upper, the forming material M may not be supplied to the forming surface MS in advance before the light EL is irradiated. That is, as shown in FIG. 10 (d), when the forming system 1 forms the structural layer SL_upper, the forming material M may be partially supplied to the irradiation area EA (or the melting pool MP) of the light EL while irradiating the light EL. In the case where the shaping material M is not supplied to the shaping surface MS in advance, the shaping material M is locally supplied, and therefore the possibility that at least a part of the locally supplied shaping material M functions as a shield that shields the light EL may change. small. Therefore, the energy transferred from the light EL to the shaping surface MS per unit area or unit time becomes larger than that in the case where a shield is present. Therefore, the size of the molten pool MP becomes larger compared with the case where a shield exists.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

為了變更熔融池MP的尺寸,造形系統1亦可對造形頭11的移動形態進行控制。於此情況下,造形系統1亦可將形成結構層SL_lowest時的造形頭11的移動形態變更成與形成結構層SL_upper時的移動形態不同的移動形態。即,造形系統1於形成結構層SL_lowest時,亦可將造形頭11的移動形態設定成用於形成結構層SL_lowest的(即,用於形成小尺寸的熔融池MP的)第一移動形態。另一方面,造形系統1於形成結構層SL_upper時,亦可將造形頭11的移動形態設定成用於形成結構層SL_upper的(即,用於形成尺寸較於第一移動形態時所形成的熔融池MP的尺寸大的熔融池MP的)第二移動形態(典型的是第二移動形態與第一移動形態不同)。In order to change the size of the melting pool MP, the shaping system 1 may also control the moving form of the shaping head 11. In this case, the forming system 1 may change the moving form of the forming head 11 when forming the structural layer SL_lowest to a moving form different from the moving form when forming the structural layer SL_upper. That is, when the forming system 1 forms the structural layer SL_lowest, the moving form of the forming head 11 can also be set to the first moving form for forming the structural layer SL_lowest (that is, for forming the molten pool MP with a small size). On the other hand, when the forming system 1 forms the structural layer SL_upper, the moving form of the forming head 11 can also be set to form the structural layer SL_upper (that is, used to form a melt having a size larger than that formed when the first moving form is formed. The second moving form of the molten pool MP having a large size of the pool MP (typically, the second moving form is different from the first moving form).

第一特性變更動作的移動形態亦可包含移動速度(例如,沿著造形面MS的方向上的移動速度,作為一例,XY平面內的任意的方向上的移動速度,典型的是X軸方向及/或Y軸方向的移動速度)。於此情況下,如圖11所示,造形系統1於形成結構層SL_lowest時,亦可將造形頭11的移動速度設定成第一移動速度。另一方面,如圖11所示,造形系統1於形成結構層SL_upper時,亦可將造形頭11的移動速度設定成較第一移動速度慢的第二移動速度。造形頭11的移動速度變得越快,造形面MS上的照射區域EA的移動速度(即,相對於造形面MS的照射區域EA的相對的移動速度)變得越快。造形面MS上的照射區域EA的移動速度變得越快,對於造形面MS的每單位面積的光EL的照射時間變得越短。因此,造形面MS上的照射區域EA的移動速度變得越快,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得越小。因此,於造形頭11的移動速度快(即,照射區域EA的移動速度快)的狀況下,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得較於造形頭11的移動速度較所述狀況下的移動速度慢(即,照射區域EA的移動速度慢)的狀況下,於每單位面積或每單位時間自光EL對造形面MS傳遞的能量少。即,形成結構層SL_lowest時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量變得較形成結構層SL_upper時於每單位面積或每單位時間自光EL對造形面MS傳遞的能量少。因此,形成結構層SL_lowest時形成於造形面MS的熔融池MP的尺寸變得較形成結構層SL_upper時形成於造形面MS的熔融池MP的尺寸小。The moving form of the first characteristic changing operation may also include a moving speed (for example, a moving speed in a direction along the forming surface MS. As an example, the moving speed in an arbitrary direction in the XY plane is typically the X-axis direction and (Or Y-axis movement speed). In this case, as shown in FIG. 11, when the forming system 1 forms the structural layer SL_lowest, the moving speed of the forming head 11 may be set to the first moving speed. On the other hand, as shown in FIG. 11, when the forming system 1 forms the structural layer SL_upper, the moving speed of the forming head 11 can also be set to a second moving speed that is slower than the first moving speed. The faster the moving speed of the shaping head 11 becomes, the faster the moving speed of the irradiation area EA on the shaping surface MS (that is, the relative moving speed of the irradiation area EA with respect to the shaping surface MS) becomes faster. The faster the moving speed of the irradiation area EA on the shaping surface MS becomes, the shorter the irradiation time of light EL per unit area of the shaping surface MS becomes. Therefore, the faster the moving speed of the irradiation area EA on the shaping surface MS becomes, the smaller the energy transferred from the light EL to the shaping surface MS per unit area or unit time becomes. Therefore, under the condition that the moving speed of the shaping head 11 is fast (that is, the moving speed of the irradiation area EA is fast), the energy transferred from the light EL to the shaping surface MS per unit area or unit time becomes larger than that of the shaping head 11. In a situation where the moving speed of d is slower than the moving speed in the situation (ie, the moving speed of the irradiation area EA is slow), less energy is transferred from the light EL to the shaping surface MS per unit area or unit time. That is, the energy transferred from the light EL to the shaping surface MS per unit area or unit time when the structural layer SL_lowest is formed becomes larger than the energy transferred from the light EL to the shaping surface MS per unit area or per unit time when the structural layer SL_upper is formed. Less energy. Therefore, the size of the molten pool MP formed on the forming surface MS when the structural layer SL_lowest is formed becomes smaller than the size of the molten pool MP formed on the forming surface MS when the structural layer SL_upper is formed.

其結果,結構層SL_lowest的尺寸變得較結構層SL_upper的尺寸小,結構層SL_lowest容易自工件W分離。As a result, the size of the structure layer SL_lowest becomes smaller than the size of the structure layer SL_upper, and the structure layer SL_lowest is easily separated from the workpiece W.

另外,造形頭11的移動速度變得越快,被供給至造形面MS上的照射區域EA及熔融池MP的至少一者的造形材料M的每單位時間的供給量變得越少。此處,當造形材料M的每單位時間的供給量低於在每單位時間可熔融的造形材料M的量時,與超過的情況相比結構層SL的尺寸變小。其結果,結構層SL_lowest容易自工件W分離。如此,熔融池MP的尺寸與結構物ST的尺寸亦可不成比例。In addition, the faster the moving speed of the shaping head 11 is, the smaller the supply amount of the shaping material M per unit time supplied to at least one of the irradiation area EA and the melting pool MP on the shaping surface MS becomes. Here, when the supply amount of the forming material M per unit time is lower than the amount of the forming material M that can be melted per unit time, the size of the structural layer SL becomes smaller than when it is exceeded. As a result, the structural layer SL_lowest is easily separated from the workpiece W. As such, the size of the melting pool MP may not be proportional to the size of the structure ST.

再者,於如後述般平台13可進行移動的情況下,為了變更熔融池MP的尺寸,造形系統1亦可對平台13的移動形態(進而對造形面MS的移動形態)進行控制。其原因在於:若平台13進行移動,則可看作照射區域EA相對於造形面MS進行移動。再者,平台13的移動形態的控制方法亦可與造形頭11的移動形態的控制方法相同,因此省略其詳細的說明。或者,如後述般,於可藉由利用振鏡等使光EL偏轉而使照射區域EA相對於造形面MS進行移動的情況下,為了變更熔融池MP的尺寸,造形系統1亦可對照射區域EA的移動形態進行控制。再者,照射區域EA的移動形態的控制方法亦可與造形頭11的移動形態的控制方法相同,因此省略其詳細的說明。When the platform 13 can be moved as described later, in order to change the size of the melting pool MP, the forming system 1 may also control the moving form of the platform 13 (and further, the moving form of the forming surface MS). The reason is that if the platform 13 moves, it can be considered that the irradiation area EA moves relative to the forming surface MS. In addition, the control method of the movement form of the platform 13 may be the same as the control method of the movement form of the shaping head 11, and therefore detailed description thereof is omitted. Alternatively, as described later, in a case where the irradiation area EA can be moved relative to the shaping surface MS by deflecting the light EL with a galvanometer or the like, the shaping system 1 can also change the irradiation area in order to change the size of the melting pool MP. The movement pattern of the EA is controlled. In addition, the method of controlling the moving form of the irradiation area EA may be the same as the method of controlling the moving form of the shaping head 11, and thus detailed description thereof is omitted.

繼而,參照圖12(a)至圖12(f)及圖13(a)至圖13(f),對藉由變更熔融池MP的尺寸而變更結構層SL的尺寸的第一特性變更動作的具體例進行說明。Next, referring to FIGS. 12 (a) to 12 (f) and FIGS. 13 (a) to 13 (f), the first characteristic changing operation for changing the size of the structural layer SL by changing the size of the molten pool MP is described. A specific example will be described.

首先,如圖12(a)所示,為了於相當於工件W的表面WS的造形面MS形成最下層的結構層SL_lowest(即,結構層SL#1),照射系統111對造形面MS照射光EL。其結果,於造形面MS形成熔融池MP。進而,如圖12(b)所示,於照射光EL的同時,材料噴嘴112對光EL的照射區域EA(或熔融池MP)供給造形材料M。其結果,如圖12(c)所示,被供給至熔融池MP的造形材料M熔融,於造形面MS上形成包含已熔融的造形材料M並且自造形面MS隆起的熔融池MP。於形成結構層SL_lowest的期間內,造形系統1於控制裝置14的控制下,以熔融池MP的尺寸變小(例如,變成所述第一尺寸R1)的方式控制光EL的特性、造形材料M的供給形態及造形頭11的移動形態的至少一者。First, as shown in FIG. 12 (a), in order to form the lowest structural layer SL_lowest (that is, the structural layer SL # 1) on the forming surface MS corresponding to the surface WS of the workpiece W, the irradiation system 111 irradiates light to the forming surface MS. EL. As a result, a melting pool MP is formed on the forming surface MS. Further, as shown in FIG. 12 (b), while the light EL is irradiated, the material nozzle 112 supplies the shaping material M to the irradiation area EA (or the melting pool MP) of the light EL. As a result, as shown in FIG. 12 (c), the forming material M supplied to the melting pool MP is melted, and a melting pool MP including the molten forming material M and rising from the forming surface MS is formed on the forming surface MS. During the formation of the structural layer SL_lowest, the forming system 1 controls the characteristics of the light EL and the forming material M under the control of the control device 14 so that the size of the melting pool MP becomes smaller (for example, the first size R1). At least one of a supply form and a moving form of the forming head 11.

其後,若伴隨造形頭11的移動而不再對熔融池MP照射光EL,則已於熔融池MP中熔融的造形材料M得到冷卻而固化(即,凝固)。其結果,如圖12(d)所示,於工件W上,藉由已固化的造形材料M的堆積物來形成構成最下層的結構層SL_lowest的造形物。Thereafter, if the melting pool MP is no longer irradiated with light EL as the shaping head 11 moves, the shaping material M that has been melted in the melting pool MP is cooled and solidified (that is, solidified). As a result, as shown in FIG. 12 (d), on the workpiece W, a molded article constituting the lowermost structural layer SL_lowest is formed from the deposited material of the cured molding material M.

其後,為了於最下層的結構層SL_lowest上形成結構層SL_upper(具體而言,結構層SL#2),將最下層的結構層SL_lowest的表面設定成新的造形面MS。其後,如圖12(e)所示,照射系統111對造形面MS(即,結構層SL_lowest的表面)照射光EL。其結果,於結構層SL_lowest形成熔融池MP。進而,如圖12(f)所示,於照射光EL的同時,材料噴嘴112對光EL的照射區域EA(或熔融池MP)供給造形材料M。其結果,如圖13(a)所示,被供給至熔融池MP的造形材料M熔融,於造形面MS上形成包含已熔融的造形材料M並已自造形面MS隆起的熔融池MP。即,於結構層SL_lowest的表面上,形成包含已熔融的造形材料M並已自結構層SL_lowest的表面隆起的熔融池MP。於形成結構層SL_upper的期間內,造形系統1於控制裝置14的控制下,以熔融池MP的尺寸變大(例如,變成所述第二尺寸R2)的方式控制光EL的特性、造形材料M的供給形態及造形頭11的移動形態的至少一者。Thereafter, in order to form the structural layer SL_upper (specifically, the structural layer SL # 2) on the structural layer SL_lowest of the lowermost layer, the surface of the structural layer SL_lowest of the lowermost layer is set as a new forming surface MS. Thereafter, as shown in FIG. 12 (e), the irradiation system 111 irradiates the shaping surface MS (ie, the surface of the structural layer SL_lowest) with light EL. As a result, a molten pool MP is formed in the structural layer SL_lowest. Further, as shown in FIG. 12 (f), while the light EL is irradiated, the material nozzle 112 supplies the shaping material M to the irradiation area EA (or the melting pool MP) of the light EL. As a result, as shown in FIG. 13 (a), the forming material M supplied to the melting pool MP is melted, and a melting pool MP including the molten forming material M and raised from the forming surface MS is formed on the forming surface MS. That is, on the surface of the structural layer SL_lowest, a melting pool MP including the molten forming material M and raised from the surface of the structural layer SL_lowest is formed. During the formation of the structural layer SL_upper, the shaping system 1 controls the characteristics of the light EL and the shaping material M such that the size of the melting pool MP becomes larger (for example, the second dimension R2) under the control of the control device 14. At least one of a supply form and a moving form of the forming head 11.

其後,若伴隨造形頭11的移動而不再對熔融池MP照射光EL,則已於熔融池MP中熔融的造形材料M得到冷卻而固化(即,凝固)。其結果,如圖13(b)所示,於結構層SL_lowest上,藉由已固化的造形材料M的堆積物來形成構成結構層SL_upper的造形物。熔融池MP越大,得到冷卻而固化的造形材料M變得越多。得到冷卻而固化的造形材料M變得越多,已固化的造形材料M的堆積物的尺寸(特別是沿著造形面MS的至少一個方向上的尺寸)變得越大。因此,如圖13(b)所示,藉由形成尺寸大的熔融池MP而形成的結構層SL_upper的尺寸變得較藉由形成尺寸小的熔融池MP而形成的結構層SL_lowest的尺寸大。Thereafter, if the melting pool MP is no longer irradiated with light EL as the shaping head 11 moves, the shaping material M that has been melted in the melting pool MP is cooled and solidified (that is, solidified). As a result, as shown in FIG. 13 (b), on the structural layer SL_lowest, the shaped material constituting the structural layer SL_upper is formed by the accumulation of the solidified shaped material M. The larger the melting pool MP is, the more the molding material M is cooled and solidified. The more the molding material M cooled and solidified, the larger the size of the solidified molding material M (especially the dimension along at least one direction along the molding surface MS) becomes larger. Therefore, as shown in FIG. 13 (b), the size of the structural layer SL_upper formed by forming the molten pool MP having a large size becomes larger than the size of the structural layer SL_lowest formed by forming the molten pool MP having a small size.

其後,為了於已形成的結構層SL_upper上形成新的結構層SL_upper(具體而言,結構層SL#3),將已形成的結構層SL_upper的表面設定成新的造形面MS。其後,如圖13(c)所示,自照射系統111對造形面MS(即,已形成的結構層SL_upper的表面)照射光EL。其結果,於已形成的結構層SL_upper形成熔融池MP。進而,如圖13(d)所示,於照射光EL的同時,自材料噴嘴112對光EL的照射區域EA(或熔融池MP)供給造形材料M。其結果,如圖13(e)所示,被供給至熔融池MP的造形材料M熔融,於造形面MS上形成包含已熔融的造形材料M並已自造形面MS隆起的熔融池MP。即,於已形成的結構層SL_upper的表面上,形成包含已熔融的造形材料M並已自已形成的結構層SL_upper的表面隆起的熔融池MP。於此情況下,造形系統1亦於控制裝置14的控制下,以熔融池MP的尺寸變大(例如,變成所述第二尺寸R2)的方式控制光EL的特性、造形材料M的供給形態及造形頭11的移動形態的至少一者。其後,若伴隨造形頭11的移動而不再對熔融池MP照射光EL,則已於熔融池MP中熔融的造形材料M得到冷卻而固化(即,凝固)。其結果,如圖13(f)所示,於已形成的結構層SL_upper上,藉由已固化的造形材料M的堆積物來形成構成新的結構層SL_upper的造形物。Thereafter, in order to form a new structural layer SL_upper (specifically, the structural layer SL # 3) on the formed structural layer SL_upper, the surface of the formed structural layer SL_upper is set as a new forming surface MS. Thereafter, as shown in FIG. 13 (c), the self-illumination system 111 irradiates the shaping surface MS (ie, the surface of the structural layer SL_upper that has been formed) with light EL. As a result, a molten pool MP is formed on the formed structural layer SL_upper. Further, as shown in FIG. 13 (d), while the light EL is irradiated, the shaping material M is supplied from the material nozzle 112 to the irradiation area EA (or the melting pool MP) of the light EL. As a result, as shown in FIG. 13 (e), the forming material M supplied to the melting pool MP is melted, and a melting pool MP including the molten forming material M and raised from the forming surface MS is formed on the forming surface MS. That is, on the surface of the formed structural layer SL_upper, a melting pool MP including the molten forming material M and raised from the surface of the formed structural layer SL_upper is formed. In this case, the forming system 1 is also controlled by the control device 14 to control the characteristics of the light EL and the supply form of the forming material M such that the size of the melting pool MP becomes larger (for example, the second size R2). And at least one of the moving patterns of the shaping head 11. Thereafter, if the melting pool MP is no longer irradiated with light EL as the shaping head 11 moves, the shaping material M that has been melted in the melting pool MP is cooled and solidified (that is, solidified). As a result, as shown in FIG. 13 (f), on the already formed structural layer SL_upper, a shaped object constituting a new structural layer SL_upper is formed from a deposit of the solidified forming material M.

其後,重覆用於在已形成的多個結構層SL_upper中的最上層的結構層SL_upper上形成新的結構層SL_upper的動作。其結果,藉由包含此種第一特性變更動作的第二造形動作,如圖14(a)所示,形成於尺寸小的結構層SL_lowest上具有尺寸較該結構層SL_lowest的尺寸大的多個結構層SL_upper的三維結構物ST。即,形成於寬度狹小的結構層SL_lowest上具有寬度較該結構層SL_lowest的寬度寬廣的多個結構層SL_upper的三維結構物ST。因此,形成形成有結構層SL_lowest的部分實質上變成切口(換言之,中間變細部、凹部、裂縫、切縫或槽)的三維結構物ST。即,形成在與工件W結合的部分實質上形成有切口的三維結構物ST。換言之,形成與工件W的接觸面積(或結合部分的面積)小的三維結構物ST。Thereafter, the operation for forming a new structural layer SL_upper on the uppermost structural layer SL_upper among the plurality of formed structural layers SL_upper is repeated. As a result, as shown in FIG. 14 (a), a second shaping operation including such a first characteristic changing operation is formed on the structure layer SL_lowest having a small size and has a plurality of sizes larger than the size of the structure layer SL_lowest. The three-dimensional structure ST of the structural layer SL_upper. That is, the three-dimensional structure ST formed on the narrow structure layer SL_lowest and having a plurality of structure layers SL_upper wider than the width of the structure layer SL_lowest is formed. Therefore, the three-dimensional structure ST in which the portion where the structural layer SL_lowest is formed becomes substantially a cutout (in other words, an intermediate thinned portion, a recessed portion, a crack, a slit, or a groove) is formed. In other words, a three-dimensional structure ST is formed in which a notch is substantially formed in a portion bonded to the workpiece W. In other words, a three-dimensional structure ST having a small contact area (or an area of a bonding portion) with the workpiece W is formed.

作為一例,若藉由第二造形動作來形成圖3(a)至圖3(f)中所示的箱狀的三維結構物ST,則如圖15(a)至圖15(c)所示,形成包含壁狀的結構物ST1、壁狀的結構物ST2、壁狀的結構物ST3及壁狀的結構物ST4的三維結構物ST,所述壁狀的結構物ST1沿著X軸方向延長,所述壁狀的結構物ST2沿著X軸方向延長且沿著Y軸方向與結構物ST1相向,所述壁狀的結構物ST3沿著Y軸方向延長,且+Y側及-Y側的端部分別連結於結構物ST1及結構物ST2的-X側的端部,所述壁狀的結構物ST4沿著Y軸方向延長,+Y側及-Y側的端部分別連結於結構物ST1及結構物ST2的+X側的端部,且沿著Y軸方向與結構物ST3相向。於此情況下,如圖15(b)所示,構成結構物ST1的結構層SL_lowest的Y軸方向的尺寸變得較構成結構物ST1的結構層SL_upper的Y軸方向的尺寸小。進而,如圖15(b)所示,構成結構物ST2的結構層SL_lowest的Y軸方向的尺寸變得較構成結構物ST2的結構層SL_upper的Y軸方向的尺寸小。進而,如圖15(c)所示,構成結構物ST3的結構層SL_lowest的X軸方向的尺寸變得較構成結構物ST3的結構層SL_upper的X軸方向的尺寸小。進而,如圖15(c)所示,構成結構物ST4的結構層SL_lowest的X軸方向的尺寸變得較構成結構物ST4的結構層SL_upper的X軸方向的尺寸小。As an example, if the box-shaped three-dimensional structure ST shown in Figs. 3 (a) to 3 (f) is formed by the second shaping operation, as shown in Figs. 15 (a) to 15 (c) A three-dimensional structure ST including a wall-shaped structure ST1, a wall-shaped structure ST2, a wall-shaped structure ST3, and a wall-shaped structure ST4 is formed, and the wall-shaped structure ST1 is extended along the X-axis direction. The wall-shaped structure ST2 is extended along the X-axis direction and faces the structure ST1 along the Y-axis direction, and the wall-shaped structure ST3 is extended along the Y-axis direction, and the + Y side and the -Y side The end portions of are connected to the -X side ends of the structures ST1 and ST2, the wall-shaped structure ST4 is extended along the Y-axis direction, and the ends of the + Y side and the -Y side are connected to the structure, respectively. The ends of the object ST1 and the structure ST2 on the + X side face the structure ST3 along the Y-axis direction. In this case, as shown in FIG. 15 (b), the size in the Y-axis direction of the structural layer SL_lowest constituting the structure ST1 becomes smaller than the size in the Y-axis direction of the structural layer SL_upper constituting the structure ST1. Further, as shown in FIG. 15 (b), the size in the Y-axis direction of the structural layer SL_lowest constituting the structure ST2 becomes smaller than the size in the Y-axis direction of the structural layer SL_upper constituting the structure ST2. Further, as shown in FIG. 15 (c), the size in the X-axis direction of the structural layer SL_lowest constituting the structure ST3 becomes smaller than the size in the X-axis direction of the structural layer SL_upper constituting the structure ST3. Furthermore, as shown in FIG. 15 (c), the size in the X-axis direction of the structural layer SL_lowest constituting the structure ST4 becomes smaller than the size in the X-axis direction of the structural layer SL_upper constituting the structure ST4.

另一方面,於進行假設使結構層SL_lowest的尺寸與結構層SL_upper的尺寸變成相同的第一比較例的造形動作的情況下,如圖14(b)所示,形成在與工件W結合的部分未形成切口的三維結構物ST。換言之,形成與工件W的接觸面積(或結合部分的面積)大的三維結構物ST。On the other hand, when the shaping operation of the first comparative example is performed in which the size of the structure layer SL_lowest and the size of the structure layer SL_upper are made the same, as shown in FIG. Three-dimensional structure ST with no cuts. In other words, a three-dimensional structure ST having a large contact area (or an area of a bonding portion) with the workpiece W is formed.

與藉由此種第一比較例的造形動作所形成的三維結構物ST相比,藉由包含第一特性變更動作的第二造形動作所形成的三維結構物ST可利用形成於與工件W的結合部分的切口,自工件W容易地分離。具體而言,如圖14(c)所示,三維結構物ST亦可藉由結構層SL_lowest的自工件W的分離,而於包含結構層SL_lowest及結構層SL_upper的狀態下自工件W分離。或者,如圖14(d)所示,三維結構物ST亦可於結構層SL_lowest斷裂且結構層SL_lowest的一部分已與工件W結合的狀態下,使結構層SL_lowest的剩餘的一部分自工件W分離。藉此,亦可於結構層SL_lowest的一部分被自三維結構物ST中去除的狀態下,自工件W分離。或者,三維結構物ST的結構層SL_lowest亦可在與結構層SL_upper的邊界斷裂。藉此,亦可於結構層SL_lowest的整體已與工件W結合的狀態下,使三維結構物ST(即,包含結構層SL_upper的三維結構物ST)自工件W分離。於此情況下,已與工件W結合的結構層SL_lowest的至少一部分亦可不是構成三維結構物ST的結構層SL。作為一例,造形系統1亦可將用於使三維結構物ST自工件W分離的結構層SL作為結構層SL_lowest來形成,其後,將構成三維結構物ST的結構層SL作為結構層SL_upper而形成於結構層SL_lowest上。如此,可藉由包含第一特性變更動作的第二造形動作,而形成可容易地自工件W分離的三維結構物ST。
(2-2-2)第二特性變更動作
Compared with the three-dimensional structure ST formed by the forming operation of the first comparative example, the three-dimensional structure ST formed by the second forming operation including the first characteristic changing operation can be used in the formation with the workpiece W. The cut of the joint portion is easily separated from the workpiece W. Specifically, as shown in FIG. 14 (c), the three-dimensional structure ST can also be separated from the workpiece W in a state including the structural layer SL_lowest and the structural layer SL_upper by separating the structural layer SL_lowest from the workpiece W. Alternatively, as shown in FIG. 14 (d), the three-dimensional structure ST may separate the remaining part of the structural layer SL_lowest from the workpiece W in a state where the structural layer SL_lowest is broken and a part of the structural layer SL_lowest has been combined with the workpiece W. Thereby, in a state where a part of the structural layer SL_lowest is removed from the three-dimensional structure ST, the structure W can be separated from the workpiece W. Alternatively, the structural layer SL_lowest of the three-dimensional structure ST may be broken at the boundary with the structural layer SL_upper. Thereby, the three-dimensional structure ST (that is, the three-dimensional structure ST including the structure layer SL_upper) can be separated from the workpiece W in a state where the entire structure layer SL_lowest has been combined with the workpiece W. In this case, at least a part of the structural layer SL_lowest that has been combined with the workpiece W may not be the structural layer SL constituting the three-dimensional structure ST. As an example, the forming system 1 may be formed with the structural layer SL for separating the three-dimensional structure ST from the workpiece W as the structural layer SL_lowest, and thereafter, the structural layer SL constituting the three-dimensional structure ST may be formed as the structural layer SL_upper. On the structure layer SL_lowest. In this way, the three-dimensional structure ST that can be easily separated from the workpiece W can be formed by the second shaping operation including the first characteristic changing operation.
(2-2-2) Second characteristic change operation

繼而,對用於變更結構層SL對於破壞的抵抗力的第二特性變更動作進行說明。再者,本實施方式的「破壞」亦可包含由物理作用(例如外力,作為一例,衝擊)所引起的破壞、由電作用所引起的破壞、由磁作用所引起的破壞、由熱作用所引起的破壞、由光學作用所引起的破壞及由化學作用所引起的破壞的至少一者。本實施方式的「脆性」亦可包含對於物理作用的脆性、對於電作用的脆性、對於磁作用的脆性、對於熱作用的脆性、對於光學作用的脆性及對於化學作用的脆性的至少一者。Next, a second characteristic changing operation for changing the resistance of the structural layer SL to damage will be described. The "damage" in this embodiment may also include damage caused by a physical action (for example, external force, as an example, impact), damage caused by an electric action, damage caused by a magnetic action, and heat caused by a heat action. At least one of the damage caused, the damage caused by optical effects, and the damage caused by chemical effects. The "brittleness" of the present embodiment may include at least one of brittleness to physical action, brittleness to electric action, brittleness to magnetic action, brittleness to thermal action, brittleness to optical action, and brittleness to chemical action.

造形系統1為了變更結構層SL對於破壞的抵抗力,例如亦可改變形成結構層SL時的形成條件。作為一例,造形系統1亦可將形成結構層SL_lowest時的形成條件變更成與形成結構層SL_upper時的形成條件不同的形成條件。In order to change the resistance of the structural layer SL to destruction, the shaping system 1 may change the formation conditions when the structural layer SL is formed, for example. As an example, the forming system 1 may change the formation conditions when forming the structural layer SL_lowest to formation conditions different from the formation conditions when forming the structural layer SL_upper.

第二特性變更動作的形成條件亦可包含照射系統111所照射的光EL的特性。於此情況下,造形系統1亦可將用於形成結構層SL_lowest的光EL的特性變更成與用於形成結構層SL_upper的光EL的特性不同的特性。例如,造形系統1於形成結構層SL_lowest時,亦可將光EL的特性設定成用於形成對於破壞的抵抗力低的結構層SL_lowest的第三特性。另一方面,造形系統1於形成結構層SL_upper時,亦可將光EL的特性設定成用於形成對於破壞的抵抗力高的結構層SL_upper的第四特性(典型的是第四特性與第三特性不同)。The formation conditions of the second characteristic changing operation may include characteristics of the light EL irradiated by the irradiation system 111. In this case, the shaping system 1 may change the characteristics of the light EL used to form the structural layer SL_lowest to a characteristic different from the characteristics of the light EL used to form the structural layer SL_upper. For example, when the forming system 1 forms the structural layer SL_lowest, the characteristics of the light EL may be set to a third characteristic for forming the structural layer SL_lowest with low resistance to destruction. On the other hand, when the forming system 1 forms the structural layer SL_upper, the characteristics of the light EL can also be set to the fourth characteristic (typically the fourth characteristic and the third characteristic) for forming the structural layer SL_upper with high resistance to destruction. Different characteristics).

第二特性變更動作的光EL的特性亦可包含造形面MS上的每單位面積的光EL的強度(或每單位面積的光EL的能量)。於此情況下,如圖16所示,造形系統1於形成結構層SL_lowest時,亦可將每單位面積的光EL的強度設定成第三強度。第三強度是較後述的第四強度大的強度。亦可基於可使造形材料M蒸發的強度來設定第三強度。例如,亦可將第三強度設定成可使造形材料M蒸發的強度以上。其結果,於形成結構層SL_lowest時,被供給至造形面MS的造形材料M的至少一部分藉由光EL的照射而蒸發。因此,不蒸發而僅熔融的造形材料M變少。其結果,只有未滿用於形成結構層SL_lowest的足夠的量的造形材料M熔融(進而,變成不固化)。若未滿此種足夠的量的造形材料M固化而形成結構層SL_lowest,則於結構層SL_lowest的內部,可因造形材料M的不足而形成許多空隙。此種空隙變得越多,結構層SL_lowest變得越脆。換言之,空隙變得越多,結構層SL_lowest的脆度變得越高。因此,結構層SL_lowest對於破壞的抵抗力變低。另一方面,如圖16所示,造形系統1於形成結構層SL_upper時,亦可將每單位面積的光EL的強度設定成較第三強度小的第四強度。亦可基於可使造形材料M蒸發的強度來設定第四強度。例如,亦可將第四強度設定成未滿可使造形材料M蒸發的強度。其結果,於形成結構層SL_upper時,被供給至造形面MS的造形材料M的至少一部分藉由光EL的照射而蒸發的可能性幾乎消失。因此,熔融的造形材料M變少的可能性低。因此,由用於形成結構層SL_upper的足夠的量的造形材料M形成結構層SL_upper,因此形成於結構層SL_upper的內部的空隙變得較形成於結構層SL_lowest的內部的空隙少。其結果,結構層SL_upper變硬。換言之,結構層SL_upper的脆度變低。因此,結構層SL_upper對於破壞的抵抗力變得較結構層SL_lowest高。即,結構層SL_lowest對於破壞的抵抗力變得較結構層SL_upper對於破壞的抵抗力低。The characteristics of the light EL in the second characteristic changing operation may include the intensity of the light EL per unit area (or the energy of the light EL per unit area) on the shaping surface MS. In this case, as shown in FIG. 16, when the forming system 1 forms the structural layer SL_lowest, the intensity of the light EL per unit area may be set to a third intensity. The third intensity is greater than the fourth intensity described later. The third intensity may also be set based on the intensity at which the shaping material M can be evaporated. For example, the third intensity may be set to an intensity at which the shaping material M can be evaporated. As a result, at the time of forming the structural layer SL_lowest, at least a part of the forming material M supplied to the forming surface MS is evaporated by irradiation of light EL. Therefore, the amount of the molding material M that melts without evaporation is reduced. As a result, only a sufficient amount of the shaping material M for forming the structural layer SL_lowest is melted (and further becomes non-solidified). If the sufficient amount of the shaping material M is not cured to form the structural layer SL_lowest, many voids may be formed inside the structural layer SL_lowest due to the lack of the shaping material M. The more such voids become, the more brittle the structural layer SL_lowest becomes. In other words, the more the voids become, the higher the brittleness of the structural layer SL_lowest becomes. Therefore, the structural layer SL_lowest has a low resistance to destruction. On the other hand, as shown in FIG. 16, when the forming system 1 forms the structural layer SL_upper, the intensity of the light EL per unit area may be set to a fourth intensity that is lower than the third intensity. The fourth intensity may be set based on the intensity at which the molding material M can be evaporated. For example, the fourth strength may be set to a strength that is less than the strength at which the molding material M can be evaporated. As a result, at the time of forming the structural layer SL_upper, the possibility that at least a part of the forming material M supplied to the forming surface MS is evaporated by the irradiation of the light EL almost disappears. Therefore, there is less possibility that the molten molding material M will be reduced. Therefore, the structural layer SL_upper is formed of a sufficient amount of the shaping material M for forming the structural layer SL_upper, and thus the voids formed inside the structural layer SL_upper become smaller than the voids formed inside the structural layer SL_lowest. As a result, the structural layer SL_upper becomes hard. In other words, the brittleness of the structural layer SL_upper becomes low. Therefore, the structural layer SL_upper has a higher resistance to destruction than the structural layer SL_lowest. That is, the resistance of the structural layer SL_lowest to destruction becomes lower than the resistance of the structural layer SL_upper to destruction.

第二特性變更動作的形成條件亦可包含由材料噴嘴112所供給的造形材料M的供給形態。於此情況下,造形系統1亦可將形成結構層SL_lowest時的造形材料M的供給形態變更成與形成結構層SL_upper時的供給形態不同的供給形態。例如,造形系統1於形成結構層SL_lowest時,亦可將造形材料M的供給形態設定成用於形成對於破壞的抵抗力低的結構層SL_lowest的第三供給形態。另一方面,造形系統1於形成結構層SL_upper時,亦可將造形材料M的供給形態設定成用於形成對於破壞的抵抗力較結構層SL_lowest高的結構層SL_upper的第四供給形態(典型的是第四供給形態與第三供給形態不同)。The formation condition of the second characteristic changing operation may include a supply form of the forming material M supplied from the material nozzle 112. In this case, the forming system 1 may change the supply form of the forming material M when the structural layer SL_lowest is formed to a supply form different from the supply form when the structural layer SL_upper is formed. For example, when the forming system 1 forms the structural layer SL_lowest, the supply form of the forming material M may be set to a third supply form for forming the structural layer SL_lowest having a low resistance to destruction. On the other hand, when the forming system 1 forms the structural layer SL_upper, the supply form of the forming material M can also be set to a fourth supply form (typically, for forming the structural layer SL_upper having higher resistance to destruction than the structural layer SL_lowest (typical (It is different from the fourth supply form).

第二特性變更動作的造形材料M的供給形態亦可包含每單位時間或每單位面積的造形材料M的供給量(即,造形材料M的供給率)。於此情況下,如圖17所示,造形系統1於形成結構層SL_lowest時,亦可將造形材料M的供給量設定成第三供給量。第三供給量較後述的第四供給量少。亦可基於用於形成結構層SL_lowest的必要的造形材料M的分量來設定第三供給量。例如,亦可將第三供給量設定成未滿用於形成結構層SL_lowest的必要的造形材料M的分量。其結果,於形成結構層SL_lowest時,只有未滿用於形成結構層SL_lowest的足夠的量的造形材料M熔融(進而,只有未滿用於形成結構層SL_lowest的足夠的量的造形材料M固化)。因此,因所述理由,結構層SL_lowest對於破壞的抵抗力變低。另一方面,如圖17所示,造形系統1於形成結構層SL_upper時,亦可將造形材料M的供給量設定成較第三供給量多的第四供給量。亦可基於用於形成結構層SL_upper的必要的造形材料M的分量來設定第四供給量。例如,亦可將第四供給量設定成用於形成結構層SL_upper的必要的造形材料M的分量以上。其結果,於形成結構層SL_upper時,用於形成結構層SL_upper的足夠的量的造形材料M熔融(進而,用於形成結構層SL_upper的足夠的量的造形材料M固化)。因此,因所述理由,結構層SL_upper對於破壞的抵抗力變高。即,結構層SL_lowest對於破壞的抵抗力變得較結構層SL_upper對於破壞的抵抗力低。The supply form of the forming material M in the second characteristic changing operation may include a supply amount of the forming material M per unit time or unit area (that is, a supply rate of the forming material M). In this case, as shown in FIG. 17, when the forming system 1 forms the structural layer SL_lowest, the supply amount of the forming material M may be set to a third supply amount. The third supply amount is smaller than the fourth supply amount described later. The third supply amount may be set based on a component of the forming material M necessary for forming the structural layer SL_lowest. For example, the third supply amount may be set to be less than the amount of the forming material M necessary for forming the structural layer SL_lowest. As a result, when the structural layer SL_lowest is formed, only a sufficient amount of the shaping material M for forming the structural layer SL_lowest is melted (and further, only a sufficient amount of the shaping material M for forming the structural layer SL_lowest is solidified) . For this reason, the structural layer SL_lowest has a low resistance to destruction. On the other hand, as shown in FIG. 17, when the forming system 1 forms the structural layer SL_upper, the supply amount of the forming material M may be set to a fourth supply amount which is greater than the third supply amount. The fourth supply amount may be set based on a component of the shaping material M necessary for forming the structural layer SL_upper. For example, the fourth supply amount may be set to be equal to or greater than the amount of the shaping material M necessary for forming the structural layer SL_upper. As a result, when the structural layer SL_upper is formed, a sufficient amount of the shaping material M for forming the structural layer SL_upper is melted (and further, a sufficient amount of the shaping material M for forming the structural layer SL_upper is solidified). For this reason, the structural layer SL_upper has a high resistance to destruction. That is, the resistance of the structural layer SL_lowest to destruction becomes lower than the resistance of the structural layer SL_upper to destruction.

第二特性變更動作的形成條件亦可包含自材料噴嘴112供給的造形材料M的種類。於此情況下,造形系統1亦可將為了形成結構層SL_lowest而供給的造形材料M的種類變更成與為了形成結構層SL_upper而供給的造形材料M的種類不同的種類。例如,造形系統1於形成結構層SL_lowest時,亦可供給用於形成對於破壞的抵抗力低的結構層SL_lowest的第一種造形材料M。另一方面,造形系統1於形成結構層SL_upper時,亦可供給用於形成對於破壞的抵抗力較結構層SL_lowest高的結構層SL_upper的第二種造形材料M。例如,第一種造形材料M的脆度亦可較第二種造形材料M的脆度高。例如,第一種造形材料M亦可較第二種造形材料M脆。其結果,由第一種造形材料M所形成的結構層SL_lowest對於破壞的抵抗力變得較由第二種造形材料M所形成的結構層SL_upper對於破壞的抵抗力低。The formation condition of the second characteristic changing operation may include the type of the forming material M supplied from the material nozzle 112. In this case, the forming system 1 may change the type of the forming material M supplied to form the structural layer SL_lowest to a different type from the type of the forming material M supplied to form the structural layer SL_upper. For example, when the forming system 1 forms the structural layer SL_lowest, the first forming material M for forming the structural layer SL_lowest having a low resistance to destruction can also be supplied. On the other hand, when forming the structural layer SL_upper, the forming system 1 can also supply a second forming material M for forming a structural layer SL_upper having higher resistance to destruction than the structural layer SL_lowest. For example, the brittleness of the first shaping material M may also be higher than that of the second shaping material M. For example, the first forming material M may be more brittle than the second forming material M. As a result, the structural layer SL_lowest formed by the first forming material M has a lower resistance to destruction than the structural layer SL_upper formed by the second forming material M has a lower resistance to destruction.

如圖18(a)所示,藉由包含此種第二特性變更動作的第二造形動作而形成如下的三維結構物ST,所述三維結構物ST於對於破壞的抵抗力低的結構層SL_lowest上形成有對於破壞的抵抗力較結構層SL_lowest高的多個結構層SL_upper。因此,若對結構層SL_lowest施加可破壞結構層SL_lowest,但不破壞結構層SL_upper的程度的外力,則如圖18(b)所示,可不破壞結構層SL_upper而破壞結構層SL_lowest。若結構層SL_lowest被破壞,則經由結構層SL_lowest而已與工件W一體化的結構層SL_upper自工件W分離。其結果,三維結構物ST自工件W的分離變得容易。與藉由使結構層SL_lowest對於破壞的抵抗力和結構層SL_upper對於破壞的抵抗力變成相同的第二比較例的造形動作所形成的三維結構物ST相比,藉由包含第二特性變更動作的第二造形動作所形成的三維結構物ST可容易地自工件W分離。因此,包含第二特性變更動作的第二造形動作可形成能夠容易地自工件W分離的三維結構物ST。As shown in FIG. 18 (a), a three-dimensional structure ST is formed by the second shaping operation including such a second characteristic changing operation, and the three-dimensional structure ST is formed on the structural layer SL_lowest having low resistance to destruction. A plurality of structural layers SL_upper having higher resistance to destruction than the structural layers SL_lowest are formed thereon. Therefore, if an external force is applied to the structural layer SL_lowest that can damage the structural layer SL_lowest, but does not damage the structural layer SL_upper, as shown in FIG. 18 (b), the structural layer SL_lowest can be destroyed without damaging the structural layer SL_upper. If the structural layer SL_lowest is destroyed, the structural layer SL_upper that has been integrated with the workpiece W via the structural layer SL_lowest is separated from the workpiece W. As a result, separation of the three-dimensional structure ST from the workpiece W becomes easy. Compared with the three-dimensional structure ST formed by the shaping operation of the second comparative example in which the structural layer SL_lowest resistance to destruction and the structural layer SL_upper resistance to destruction are made the same, The three-dimensional structure ST formed by the second shaping operation can be easily separated from the workpiece W. Therefore, the second shaping operation including the second characteristic changing operation can form a three-dimensional structure ST that can be easily separated from the workpiece W.

再者,於為了使三維結構物ST自工件W分離而破壞結構層SL_lowest的情況下,結構層SL_lowest亦可不是構成三維結構物ST的結構層SL。例如,造形系統1亦可將為了使三維結構物ST自工件W分離而被破壞的預定的結構層SL作為結構層SL_lowest來形成,其後,將構成三維結構物ST的結構層SL作為結構層SL_upper而形成於結構層SL_1owest上。
(2-2-3)第三特性變更動作
When the structural layer SL_lowest is destroyed in order to separate the three-dimensional structure ST from the workpiece W, the structural layer SL_lowest may not be the structural layer SL constituting the three-dimensional structure ST. For example, the shaping system 1 may also form a predetermined structural layer SL that is destroyed to separate the three-dimensional structure ST from the workpiece W as the structural layer SL_lowest, and thereafter, use the structural layer SL that constitutes the three-dimensional structure ST as a structural layer. SL_upper is formed on the structure layer SL_1owest.
(2-2-3) The third characteristic change operation

繼而,對用於變更結構層SL對於工件W的結合力的第三特性變更動作進行說明。造形系統1為了變更結構層SL對於工件W的結合力,例如亦可改變形成結構層SL時的形成條件。作為一例,造形系統1亦可將形成結構層SL_lowest時的形成條件變更成與形成結構層SL_upper時的形成條件不同的形成條件。Next, a third characteristic changing operation for changing the binding force of the structural layer SL to the workpiece W will be described. In order to change the bonding force of the structural layer SL to the workpiece W, the shaping system 1 may change the formation conditions when forming the structural layer SL, for example. As an example, the forming system 1 may change the formation conditions when forming the structural layer SL_lowest to formation conditions different from the formation conditions when forming the structural layer SL_upper.

第三特性變更動作的形成條件亦可包含自材料噴嘴112供給的造形材料M的種類。於此情況下,造形系統1亦可將為了形成結構層SL_lowest而供給的造形材料M的種類變更成與為了形成結構層SL_upper而供給的造形材料M的種類不同的種類。作為一例,造形系統1於形成結構層SL_lowest時,亦可供給用於形成對於工件W的結合力弱的結構層SL_lowest的第三種造形材料M。另一方面,造形系統1於形成結構層SL_upper時,亦可供給用於形成對於工件W的結合力較結構層SL_lowest強的結構層SL_upper的第四種造形材料M。The formation condition of the third characteristic changing operation may include the type of the molding material M supplied from the material nozzle 112. In this case, the forming system 1 may change the type of the forming material M supplied to form the structural layer SL_lowest to a different type from the type of the forming material M supplied to form the structural layer SL_upper. As an example, when the forming system 1 forms the structural layer SL_lowest, the third forming material M for forming the structural layer SL_lowest having a weak binding force to the workpiece W can also be supplied. On the other hand, when forming the structural layer SL_upper, the forming system 1 can also supply a fourth forming material M for forming the structural layer SL_upper having a stronger binding force to the workpiece W than the structural layer SL_lowest.

例如,第三種造形材料M亦可為與第四種造形材料M相比與工件W之間的結合力弱的材料。具體而言,造形材料M對於工件W的表面WS的潤濕性變得越低,造形材料M與工件W之間的結合力變得越弱。再者,本實施方式的「造形材料M的潤濕性低的狀態」亦可表示「已熔融的造形材料M的接觸角大的狀態」。因此,如圖19(a)所示,第三種造形材料M亦可為與第四種造形材料M相比潤濕性低(即,接觸角較第四種造形材料M的接觸角大)的造形材料M。另一方面,如圖19(b)所示,第四種造形材料M亦可為與第三種造形材料M相比潤濕性高的造形材料M。作為一例,於工件W包含不銹鋼的情況下,第三種造形材料M亦可包含鋁、鈦、銅及鎢的至少一者,第四種造形材料M亦可包含不銹鋼(或者,與工件W包含的材料相同的材料)。其結果,由第三種造形材料M所形成的結構層SL_lowest對於工件W的結合力變得較由第四種造形材料M所形成的結構層SL_upper對於工件W的結合力弱。For example, the third shaping material M may be a material having a weaker binding force with the workpiece W than the fourth shaping material M. Specifically, the lower the wettability of the shaping material M with respect to the surface WS of the workpiece W, the weaker the bonding force between the shaping material M and the workpiece W becomes. In addition, the "state where the wettability of the shaping material M is low" of this embodiment can also mean the "state where the contact angle of the molten shaping material M is large." Therefore, as shown in FIG. 19 (a), the third shaping material M may also have lower wettability than the fourth shaping material M (that is, the contact angle is larger than that of the fourth shaping material M).的 shaped material M. On the other hand, as shown in FIG. 19 (b), the fourth shaping material M may be a shaping material M having higher wettability than the third shaping material M. As an example, when the workpiece W includes stainless steel, the third shaping material M may also include at least one of aluminum, titanium, copper, and tungsten, and the fourth shaping material M may also include stainless steel (or, The same material). As a result, the binding force of the structural layer SL_lowest formed by the third shaping material M to the workpiece W becomes weaker than the binding force of the structural layer SL_upper formed by the fourth shaping material M on the workpiece W.

如圖20(a)所示,藉由包含此種第三特性變更動作的第二造形動作而形成如下的三維結構物ST,所述三維結構物ST於對於工件W的結合力弱的結構層SL_lowest上形成有對於工件W的結合力較結構層SL_lowest強的多個結構層SL_upper。因此,與將對於工件W的結合力強的結構層SL_lowest形成於工件W上的情況相比,可使結構層SL_lowest容易地自工件W分離。若結構層SL_lowest自工件W分離,則經由結構層SL_lowest而已與工件W一體化的結構層SL_upper亦自工件W分離。如此,與包含對於工件W的結合力強的結構層SL_lowest的三維結構物ST相比,藉由包含第三特性變更動作的第二造形動作所形成的三維結構物ST可容易地自工件W分離。因此,包含第三特性變更動作的第二造形動作可形成能夠容易地自工件W分離的三維結構物ST。
(3)變形例
(3-1)第一變形例
As shown in FIG. 20 (a), a second forming operation including such a third characteristic changing operation is performed to form a three-dimensional structure ST on the structural layer having a weak binding force to the workpiece W. SL_lowest is formed with a plurality of structural layers SL_upper having a stronger binding force to the workpiece W than the structural layer SL_lowest. Therefore, the structural layer SL_lowest can be easily separated from the workpiece W compared with a case where the structural layer SL_lowest having a strong bonding force to the workpiece W is formed on the workpiece W. If the structural layer SL_lowest is separated from the workpiece W, the structural layer SL_upper that has been integrated with the workpiece W via the structural layer SL_lowest is also separated from the workpiece W. In this way, the three-dimensional structure ST formed by the second shaping operation including the third characteristic changing operation can be easily separated from the workpiece W compared with the three-dimensional structure ST including the structural layer SL_lowest having a strong binding force to the workpiece W. . Therefore, the second shaping operation including the third characteristic changing operation can form a three-dimensional structure ST that can be easily separated from the workpiece W.
(3) Modification (3-1) First modification

於所述說明中,造形系統1將多個結構層SL中的最下層的結構層SL_lowest的特性變更成與多個結構層SL之中除最下層的結構層SL_lowest以外的其他結構層SL_upper的特性不同的特性。但是,當於結構層SL_lowest上形成有多個結構層SL_upper時,如圖20所示,造形系統1亦可將結構層SL_lowest的特性變更成與多個結構層SL_upper中的至少一個結構層SL_upper的特性不同的特性,另一方面,亦可設為與多個結構層SL_upper中的至少一個其他結構層SL_upper的特性相同的特性。例如,造形系統1於形成多個結構層SL_upper時,亦可將多個結構層SL_upper中的至少一個結構層SL_upper的特性變更成與結構層SL_lowest的特性不同的特性,另一方面,亦可將多個結構層SL_upper中的至少一個其他結構層SL_upper的特性設為與結構層SL_lowest的特性相同的特性。例如,如圖21所示,造形系統1亦可將多個結構層SL_upper中的與結構層SL_lowest接觸的結構層SL_upper1(即,多個結構層SL_upper中的最下層的結構層SL_upper1)的特性變更成與結構層SL_lowest的特性不同的特性,另一方面,亦可將多個結構層SL_upper中的剩餘的結構層SL_upper2的特性設為與結構層SL_lowest的特性相同的特性。或者,例如造形系統1亦可將多個結構層SL_upper中的包含與結構層SL_lowest接觸的最下層的結構層SL_upper1的多個結構層SL_upper的特性變更成與結構層SL_lowest的特性不同的特性,另一方面,亦可將多個結構層SL_upper中的剩餘的結構層SL_upper2的特性設為與結構層SL_lowest的特性相同的特性。
(3-2)第二變形例
In the description, the shaping system 1 changes the characteristics of the lowermost structural layer SL_lowest among the plurality of structural layers SL to the characteristics of the other structural layers SL_upper other than the lowermost structural layer SL_lowest among the plurality of structural layers SL. Different characteristics. However, when a plurality of structural layers SL_upper are formed on the structural layer SL_lowest, as shown in FIG. 20, the shaping system 1 may also change the characteristics of the structural layer SL_lowest to be at least one of the multiple structural layers SL_upper. On the other hand, different characteristics may be set to the same characteristics as those of at least one other structural layer SL_upper among the plurality of structural layers SL_upper. For example, when the forming system 1 forms multiple structural layers SL_upper, the characteristics of at least one structural layer SL_upper among the multiple structural layers SL_upper may be changed to characteristics different from those of the structural layer SL_lowest. The characteristics of at least one other structural layer SL_upper among the plurality of structural layers SL_upper are set to the same characteristics as those of the structural layer SL_lowest. For example, as shown in FIG. 21, the shaping system 1 may also change the characteristics of the structural layer SL_upper1 (that is, the lowest structural layer SL_upper1 among the multiple structural layers SL_upper) in contact with the structural layer SL_lowest among the multiple structural layers SL_upper. The characteristics of the structural layer SL_lowest are different from those of the structural layer SL_lowest. On the other hand, the characteristics of the remaining structural layer SL_upper2 among the multiple structural layers SL_upper may be set to the same characteristics as those of the structural layer SL_lowest. Alternatively, for example, the shaping system 1 may also change the characteristics of the multiple structural layers SL_upper including the lowest structural layer SL_upper1 in contact with the structural layer SL_lowest among the multiple structural layers SL_upper to characteristics different from those of the structural layer SL_lowest, and On the one hand, the characteristics of the remaining structural layers SL_upper2 among the plurality of structural layers SL_upper may be set to the same characteristics as those of the structural layers SL_lowest.
(3-2) Second modification

於所述說明中,造形系統1將多個結構層SL中的最下層的結構層SL_lowest的特性變更成與多個結構層SL之中除最下層的結構層SL_lowest以外的其他結構層SL_upper的特性不同的特性。但是,造形系統1亦可將包含結構層SL_lowest的位於下層的多個結構層SL(以後,「結構層SL_lower」的特性變更成與多個結構層SL之中除多個結構層SL_lower以外的其他結構層SL(即,與結構層SL_lower相比位於上層的結構層SL,以後稱為「結構層SL_upper'」)的特性不同的特性。In the description, the shaping system 1 changes the characteristics of the lowermost structural layer SL_lowest among the plurality of structural layers SL to the characteristics of the other structural layers SL_upper other than the lowermost structural layer SL_lowest among the plurality of structural layers SL. Different characteristics. However, the shaping system 1 may also change a plurality of structural layer SLs including the structural layer SL_lowest (hereinafter, the characteristics of the "structural layer SL_lower" to other structural layers SL other than the multiple structural layers SL_lower). The structure layer SL (that is, the structure layer SL located in an upper layer compared with the structure layer SL_lower, hereinafter referred to as "structure layer SL_upper") has different characteristics.

例如,如圖22(a)及圖22(b)所示,造形系統1亦可使多個結構層SL_lower的各層的尺寸變得較結構層SL_upper'的尺寸小。於此情況下,如圖22(a)所示,多個結構層SL_lower的尺寸亦可彼此相同。或者,多個結構層SL_lower中的至少兩個尺寸亦可不同。例如,如圖22(b)所示,亦能夠以越朝向上層,結構層SL_lower的尺寸變得越大的方式,使多個結構層SL_lower的尺寸不同。此種越朝向上層尺寸變得越大的結構層SL_lower,可藉由將越朝向上層尺寸變得越大的熔融池MP形成於造形面MS而形成。For example, as shown in FIGS. 22 (a) and 22 (b), the shaping system 1 may also make the size of each of the plurality of structural layers SL_lower smaller than the size of the structural layer SL_upper ′. In this case, as shown in FIG. 22 (a), the sizes of the plurality of structural layers SL_lower may be the same as each other. Alternatively, at least two of the plurality of structural layers SL_lower may have different sizes. For example, as shown in FIG. 22 (b), the sizes of the plurality of structural layers SL_lower can be made different so that the size of the structural layer SL_lower becomes larger toward the upper layer. Such a structural layer SL_lower that becomes larger in size toward the upper layer can be formed by forming the molten pool MP that becomes larger in size toward the upper layer on the forming surface MS.

例如,如圖22(c)所示,造形系統1亦可使多個結構層SL_lower的各層對於破壞的抵抗力變得較結構層SL_upper'對於破壞的抵抗力低。於此情況下,多個結構層SL_lower對於破壞的抵抗力亦可彼此相同。或者,亦可多個結構層SL_lower中的至少兩層的對於破壞的抵抗力不同。例如,亦能夠以越朝向上層,結構層SL_lower對於破壞的抵抗力變得越高的方式,使多個結構層SL_lower對於破壞的抵抗力不同。For example, as shown in FIG. 22 (c), the shaping system 1 can also make the resistance of each of the plurality of structural layers SL_lower to destruction lower than the resistance of the structural layer SL_upper ′ to destruction. In this case, the resistances of the multiple structural layers SL_lower to the damage may be the same as each other. Alternatively, at least two of the plurality of structural layers SL_lower may have different resistances to destruction. For example, it is also possible to make the structural layers SL_lower have different resistances to destruction so that the structural layers SL_lower have higher resistance to destruction.

例如,如圖22(d)所示,造形系統1亦可使多個結構層SL_lower的各層對於工件W的結合力變得較結構層SL_upper'對於工件W的結合力弱。於此情況下,多個結構層SL_lower對於工件W的結合力亦可彼此相同。或者,亦可多個結構層SL_lowerr中的至少兩層的對於工件W的結合力不同。例如,亦能夠以越朝向上層,結構層SL_lower對於工件W的結合力變得越強的方式,使多個結構層SL_lower對於工件W的結合力不同。For example, as shown in FIG. 22 (d), the forming system 1 may also make the bonding force of each of the plurality of structural layers SL_lower to the workpiece W weaker than the bonding force of the structural layer SL_upper ′ to the workpiece W. In this case, the binding forces of the plurality of structural layers SL_lower to the workpiece W may be the same as each other. Alternatively, at least two of the plurality of structural layers SL_lowerr may have different binding forces to the workpiece W. For example, the bonding force of the structural layers SL_lower to the workpiece W can be made to be different as the toward the upper layer becomes stronger.

再者,於第二變形例中,亦與第一變形例同樣地,當於結構層SL_lower上形成多個結構層SL_upper'時,造形系統1亦可將多個結構層SL_upper'中的至少一個結構層SL_upper'的特性變更成與結構層SL_lower的特性不同的特性,另一方面,亦可將多個結構層SL_upper'中的至少一個其他結構層SL_upper'的特性設為與結構層SL_lower的特性相同的特性。
(3-3)第三變形例
Furthermore, in the second modified example, as in the first modified example, when a plurality of structural layers SL_upper 'are formed on the structural layer SL_lower, the shaping system 1 may also include at least one of the plurality of structural layers SL_upper'. The characteristic of the structural layer SL_upper 'is changed to a characteristic different from the characteristic of the structural layer SL_lower. On the other hand, at least one of the multiple structural layers SL_upper' may also have the characteristic of the other structural layer SL_upper 'as the characteristic of the structural layer SL_lower. Same characteristics.
(3-3) Third modification

於所述說明中,將形成於相當於工件W的表面WS的造形面MS的第一層的結構層SL#1用作最下層的結構層SL_lowest。但是,亦可將第二層以後的結構層SL用作最下層的結構層SL_lowest。例如,亦可將形成於已形成於工件W上的至少一個現有的結構層SL_exist上的結構層SL用作最下層的結構層SL_lowest。於此情況下,造形系統1亦可將結構層SL_lowest的特性變更成與形成(換言之,積層)於結構層SL_lowest上的至少一個結構層SL(以後,稱為「結構層SL_upper''」)的特性不同的特性。In the above description, the first structural layer SL # 1 formed on the forming surface MS corresponding to the surface WS of the workpiece W is used as the lowermost structural layer SL_lowest. However, the structural layer SL after the second layer may be used as the lowermost structural layer SL_lowest. For example, the structural layer SL formed on at least one existing structural layer SL_exist already formed on the workpiece W may be used as the lowermost structural layer SL_lowest. In this case, the shaping system 1 may also change the characteristics of the structural layer SL_lowest into and form (in other words, build up) at least one structural layer SL (hereinafter, referred to as "structural layer SL_upper") on the structural layer SL_lowest. Different characteristics.

例如,如圖23(a)所示,造形系統1亦可使形成於已形成於工件W上的多個現有的結構層SL_exist上的結構層SL_lowest的尺寸變得較形成於結構層SL_lowest上的多個結構層SL_upper''的尺寸小。例如,如圖23(b)所示,造形系統1亦可使形成於已形成於工件W上的多個現有的結構層SL_exist上的結構層SL_lowest對於破壞的抵抗力變得較形成於結構層SL_lowest上的多個結構層SL_upper''對於破壞的抵抗力低。例如,如圖23(c)所示,造形系統1亦可使形成於已形成於工件W上的多個現有的結構層SL_exist上的結構層SL_lowest對於結構層SL_exist的結合力變得較形成於結構層SL_lowest上的多個結構層SL_upper''對於結構層SL_exist的結合力弱。其結果,至少包含結構層SL_upper''的三維結構物ST可容易地自現有的結構物SL_exist分離。For example, as shown in FIG. 23 (a), the shaping system 1 can also make the size of the structural layer SL_lowest formed on the plurality of existing structural layers SL_exist already formed on the workpiece W larger than that of the structural layer SL_lowest. The size of the multiple structural layers SL_upper '' is small. For example, as shown in FIG. 23 (b), the shaping system 1 can also make the structural layer SL_lowest formed on a plurality of existing structural layers SL_exist already formed on the workpiece W more resistant to damage than the structural layer. The multiple structural layers SL_upper '' on SL_lowest have low resistance to damage. For example, as shown in FIG. 23 (c), the shaping system 1 can also make the bonding force of the structural layer SL_lowest to the structural layer SL_exist formed on the plurality of existing structural layers SL_exist already formed on the workpiece W less. The multiple structural layers SL_upper '' on the structural layer SL_lowest have a weak binding force to the structural layer SL_exist. As a result, the three-dimensional structure ST including at least the structural layer SL_upper '' can be easily separated from the existing structure SL_exist.

再者,於第三變形例中,亦與第一變形例同樣地,當於結構層SL_lowest上形成多個結構層SL_upper''時,造形系統1亦可將多個結構層SL_upper''中的至少一個結構層SL_upper''的特性變更成與結構層SL_lowest的特性不同的特性,另一方面,亦可將多個結構層SL_upper''中的至少一個其他結構層SL_upper''的特性設為與結構層SL_lowest的特性相同的特性。Furthermore, in the third modified example, as in the first modified example, when a plurality of structural layers SL_upper '' are formed on the structural layer SL_lowest, the shaping system 1 may also include the structural layers SL_upper ''. The characteristics of at least one structural layer SL_upper '' are changed to characteristics different from the characteristics of structural layer SL_lowest. On the other hand, the characteristics of at least one other structural layer SL_upper '' among the multiple structural layers SL_upper '' may be set to be the same as The structural layer SL_lowest has the same characteristics.

另外,於第三變形例中,亦與第二變形例同樣地,造形系統1亦可將形成於已形成於工件W上的現有的結構層SL_exist上的多個結構層SL_lower的各層的特性變更成與形成(換言之,積層)於結構層SL_lower上的至少一個結構層SL_upper''的特性不同的特性。
(3-4)第四變形例
In addition, in the third modification, as in the second modification, the forming system 1 may change the characteristics of each of the plurality of structural layers SL_lower formed on the existing structural layer SL_exist formed on the workpiece W. Forming and forming (in other words, stacking) at least one structural layer SL_upper '' on the structural layer SL_lower has different characteristics.
(3-4) Fourth modification

於所述說明中,為了使造形物ST容易自工件W分離,將接觸工件W的結構層SL(即,最下層的結構層SL_lowest)的尺寸、對於破壞的抵抗力及對於工件W的結合力的至少一者,設為與其上方的結構層SL(即,結構層SL_upper)的尺寸、對於破壞的抵抗力及對於工件W的結合力的至少一者改變的方式。但是,為了提昇三維結構物ST的與形狀相關的自由度、或者為了提昇三維結構物ST的形狀的精度,亦可改變形成多個結構層SL中的一個結構層SL時的熔融池MP的尺寸、及形成多個結構層SL中的另一個結構層SL時的熔融池MP的尺寸。或者,亦可改變形成多個結構層SL中的一個結構層SL時的光EL的特性、及形成多個結構層SL中的另一個結構層SL時的光EL的特性。或者,亦可改變形成多個結構層SL中的一個結構層SL時的造形材料M的供給形態、及形成多個結構層SL中的另一個結構層SL時的造形材料M的供給形態。另外,亦可改變形成多個結構層SL中的一個結構層SL時的造形頭11的移動形態、及形成多個結構層SL中的另一個結構層SL時的造形頭11的移動形態。In the description, in order to easily separate the formed object ST from the workpiece W, the size of the structural layer SL (that is, the lowest structural layer SL_lowest) that contacts the workpiece W, the resistance to destruction, and the binding force to the workpiece W It is assumed that at least one of the size of the structure layer SL (ie, the structure layer SL_upper), the resistance to the damage, and the bonding force to the workpiece W are changed so that at least one of them is changed. However, in order to improve the shape-related freedom of the three-dimensional structure ST or to improve the accuracy of the shape of the three-dimensional structure ST, the size of the melting pool MP when forming one of the plurality of structure layers SL may be changed. And the size of the molten pool MP when the other structural layer SL of the plurality of structural layers SL is formed. Alternatively, the characteristics of the light EL when forming one of the plurality of structural layers SL and the characteristics of the light EL when forming the other one of the plurality of structural layers SL may be changed. Alternatively, the supply form of the forming material M when one structural layer SL of the plurality of structural layers SL is formed, and the supply form of the forming material M when the other structural layer SL of the plurality of structural layers SL is formed may be changed. In addition, the moving form of the shaping head 11 when one structural layer SL of the plurality of structural layers SL is formed and the moving form of the shaping head 11 when another structural layer SL of the plurality of structural layers SL is formed may be changed.

此處,作為光EL的特性,亦可為造形面MS上的每單位面積的光EL的強度(或每單位面積的能量)、相對於造形面MS的光EL的散焦量、及每單位面積的光EL的照射時間中的至少一個。另外,作為造形材料M的供給形態,亦可為每單位時間的造形材料M的供給量及每單位面積的造形材料M的供給量中的至少一者、以及造形材料M的供給時序中的至少一個。作為造形頭11的移動形態,亦可為造形頭11的移動速度、及工件W的移動速度中的至少一者。Here, as the characteristics of the light EL, the intensity (or energy per unit area) of the light EL per unit area on the shaping surface MS, the defocus amount of the light EL per unit area of the shaping surface MS, and the unit At least one of the irradiation times of the area light EL. In addition, as the supply form of the molding material M, at least one of the supply amount of the molding material M per unit time and the supply amount of the molding material M per unit area may be at least one of the supply timing of the molding material M. One. The moving form of the shaping head 11 may be at least one of the moving speed of the shaping head 11 and the moving speed of the workpiece W.

例如,如圖24(a)所示,造形系統1亦能夠以使多個結構層SL#1~結構層SL#10的尺寸隨著朝向上方逐漸地變大的方式進行造形。另外,如圖24(b)所示,造形系統1亦能夠以使多個結構層SL#1~結構層SL#10的尺寸隨著朝向上方逐漸地變小的方式進行造形。或者,如圖24(c)所示,造形系統1亦能夠以使多個結構層SL#1~結構層SL#10的尺寸隨著朝向上方逐漸地變小後逐漸地變大的方式進行造形。再者,於圖24(a)至圖24(c)的例子中,多個結構層SL#1~結構層SL#10的尺寸連續地變化,但亦可如圖23(a)所示般,不連續(離散地)地變化。For example, as shown in FIG. 24 (a), the shaping system 1 can also be shaped so that the sizes of the plurality of structural layers SL # 1 to SL # 10 gradually increase as they go upward. In addition, as shown in FIG. 24 (b), the forming system 1 can also perform forming such that the sizes of the plurality of structural layers SL # 1 to SL # 10 gradually decrease as they go upward. Alternatively, as shown in FIG. 24 (c), the shaping system 1 can also be shaped in such a manner that the sizes of the plurality of structural layers SL # 1 to SL # 10 gradually become smaller as they move upward. . Furthermore, in the examples of FIGS. 24 (a) to 24 (c), the sizes of the plurality of structural layers SL # 1 to SL # 10 are continuously changed, but they may also be as shown in FIG. 23 (a). , Discontinuously (discretely) changing.

若將圖24(a)所示的例子換種說法,則亦可謂與形成多個結構層SL#1~結構層SL#10中的某一結構層SL(例如結構層SL#2)時的熔融池MP的尺寸相比,形成鄰接於所述結構層SL的結構層SL(例如結構層SL#1或結構層SL#3)時的熔融池MP的尺寸變小(著眼於結構層SL#1的情況)、或變大(著眼於結構層SL#3的情況)。If the example shown in FIG. 24 (a) is rephrased, it can also be said that when a certain structural layer SL (for example, the structural layer SL # 2) is formed among a plurality of structural layers SL # 1 to SL # 10. Compared with the size of the molten pool MP, the size of the molten pool MP when forming a structural layer SL (for example, the structural layer SL # 1 or the structural layer SL # 3) adjacent to the structural layer SL becomes smaller (focusing on the structural layer SL #). 1), or becomes larger (looking at the case of the structural layer SL # 3).

對圖24(a)所示的例子的造形動作進行簡單說明。首先,藉由照射系統111來對工件W的造形面MS(工件W的朝向+Z側的表面)照射光EL,而於工件W的造形面MS形成熔融池MP。對該熔融池MP供給造形材料M。其結果,被供給至熔融池MP的造形材料M熔融,其後,得到冷卻而固化(即,凝固)。其結果,藉由已固化的造形材料M的堆積物來形成最下層的結構層SL#1。繼而,藉由照射系統111來對結構層SL#1的朝向+Z側的表面照射光EL,而於作為結構層SL#1的表面的至少一部分的造形面MS形成熔融池MP。對該熔融池MP供給造形材料M。其結果,被供給至熔融池MP的造形材料M熔融,其後,得到冷卻而固化(即,凝固)。其結果,藉由已固化的造形材料M的堆積物來形成第二層的結構層SL#2。此處,形成最下層的結構層SL#1時的光EL的強度較形成第二層的結構層SL#2時的光EL的強度弱。另外,於形成最下層的結構層SL#1時所形成的熔融池MP的尺寸較於形成第二層的結構層SL#2時所形成的熔融池MP的尺寸小。因此,形成如第二層的結構層SL#2的尺寸(典型的是Y方向上的尺寸)變得較最下層的結構層SL#1的尺寸(典型的是Y方向上的尺寸)大的造形物。以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變大的方式,設定形成各結構層SL時的光EL的強度,可形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變大的造形物。另外,以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變大的方式,設定形成各結構層SL時的熔融池MP的尺寸,可形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變大的造形物。The shaping operation of the example shown in FIG. 24 (a) will be briefly described. First, the forming system MS of the workpiece W (the surface facing the + Z side of the workpiece W) is irradiated with the light EL by the irradiation system 111, and a melting pool MP is formed on the shaping surface MS of the workpiece W. A molding material M is supplied to the melting pool MP. As a result, the molding material M supplied to the melting pool MP is melted, and thereafter, it is cooled and solidified (that is, solidified). As a result, the lowermost structural layer SL # 1 is formed by the deposit of the solidified molding material M. Then, the surface facing the + Z side of the structural layer SL # 1 is irradiated with light EL by the irradiation system 111, and a melting pool MP is formed on the forming surface MS that is at least a part of the surface of the structural layer SL # 1. A molding material M is supplied to the melting pool MP. As a result, the molding material M supplied to the melting pool MP is melted, and thereafter, it is cooled and solidified (that is, solidified). As a result, the structure layer SL # 2 of the second layer is formed by the deposit of the solidified molding material M. Here, the intensity of the light EL when the lowermost structural layer SL # 1 is formed is weaker than the intensity of the light EL when the second structural layer SL # 2 is formed. In addition, the size of the molten pool MP formed when the lowermost structural layer SL # 1 is formed is smaller than the size of the molten pool MP formed when the second structural layer SL # 2 is formed. Therefore, the size (typically the size in the Y direction) of the structural layer SL # 2 formed as the second layer becomes larger than the size (typically the size in the Y direction) of the lowermost structural layer SL # 1. Shape. The intensity of the light EL when forming each structural layer SL is set in such a manner that it gradually increases in accordance with the manufacturing sequence of the structural layer SL (as the Z-direction position of the structural layer SL becomes higher). A workpiece that is separated from the workpiece W in the + Z axis direction and gradually becomes larger in the Y direction. In addition, the size of the melting pool MP when forming each structural layer SL can be set so that it gradually becomes larger as the fabrication order of the structural layer SL goes backward (as the position of the structural layer SL in the Z direction becomes higher), and can be formed. As the workpiece moves away from the workpiece W in the + Z direction, the shape in the Y direction gradually becomes larger.

於圖24(b)的例子中,以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變小的方式,設定形成各結構層SL時的光EL的強度,而形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變小的造形物。In the example of FIG. 24 (b), the time when each structural layer SL is formed is set so that it gradually becomes smaller as the fabrication order of the structural layer SL goes backward (as the position of the structural layer SL in the Z direction becomes higher). The intensity of the light EL forms a shape that gradually decreases in size in the Y direction as it moves away from the workpiece W in the + Z axis direction.

另外,於圖24(c)的例子中,以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變小後逐漸地變大的方式,設定形成各結構層SL時的光EL的強度,而形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變小後逐漸地變大的造形物。In addition, in the example of FIG. 24 (c), it is set such that it gradually becomes smaller and then becomes larger as the fabrication order of the structural layer SL goes backward (as the position of the structural layer SL in the Z direction becomes higher) and then becomes larger. The intensity of the light EL at the time of forming each structural layer SL forms a shape that gradually decreases in size in the Y direction as it moves away from the workpiece W in the + Z axis direction.

再者,於圖24(a)至圖24(c)的例子中,三維結構物ST亦可為於X方向上延長的形狀。此時,所述熔融池MP的尺寸及結構層SL的尺寸亦可為與延長的方向(X方向)交叉的方向的尺寸。此處,與延長的方向(X方向)交叉的方向的尺寸可為沿著結構層SL的方向(作為一例,Y方向),亦可為多個結構層SL積層的方向(作為一例,Z方向)。例如,於X方向上延長的結構層SL#1的Y方向尺寸與鄰接於該結構層SL#1的於X方向上延長的結構層SL#2的Y方向尺寸亦可互不相同。例如,於X方向上延長的結構層SL#1的Z方向尺寸與鄰接於該結構層SL#1的於X方向上延長的結構層SL#2的Z方向尺寸亦可互不相同。Furthermore, in the examples of FIGS. 24 (a) to 24 (c), the three-dimensional structure ST may have a shape extending in the X direction. At this time, the size of the melting pool MP and the size of the structural layer SL may be a size in a direction crossing the extended direction (X direction). Here, the size of the direction crossing the extended direction (X direction) may be a direction along the structural layer SL (as an example, the Y direction), or a direction in which a plurality of structural layers SL are laminated (as an example, the Z direction). ). For example, the Y-direction dimension of the structural layer SL # 1 extended in the X direction and the Y-direction dimension of the structural layer SL # 2 extended in the X direction adjacent to the structural layer SL # 1 may be different from each other. For example, the Z-direction dimension of the structural layer SL # 1 extended in the X direction and the Z-direction dimension of the structural layer SL # 2 extended in the X direction adjacent to the structural layer SL # 1 may be different from each other.

另外,於圖24(a)的例子中,亦能夠以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變慢的方式,設定形成各結構層SL時的造形頭11的移動速度,而形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變大的造形物。另外,於圖24(b)的例子中,亦能夠以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變快的方式,設定形成各結構層SL時的造形頭11的移動速度,而形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變小的造形物。而且,於圖24(c)的例子中,亦能夠以隨著結構層SL的製作順序往後(隨著結構層SL的Z方向位置變高)而逐漸地變快後逐漸地變慢的方式,設定形成各結構層SL時的造形頭11的移動速度,而形成隨著自工件W朝+Z軸方向離開,Y方向尺寸逐漸地變小後逐漸地變大的造形物。In addition, in the example of FIG. 24 (a), each structure can be set to be formed so that it gradually becomes slower as the fabrication order of the structure layer SL goes backward (as the position of the structure layer SL in the Z direction becomes higher). The moving speed of the forming head 11 at the time of layer SL forms a forming object whose size gradually increases in the Y direction as it moves away from the workpiece W in the + Z axis direction. In addition, in the example of FIG. 24 (b), each structure can be set to be formed in such a manner that it gradually becomes faster as the fabrication order of the structural layer SL goes backward (as the position of the structural layer SL in the Z direction becomes higher). The moving speed of the forming head 11 at the time of layer SL forms a forming object that gradually decreases in size in the Y direction as it moves away from the workpiece W in the + Z axis direction. Moreover, in the example of FIG. 24 (c), it can also be gradually increased and then gradually slowed down as the fabrication order of the structural layer SL goes backward (as the position of the structural layer SL in the Z direction becomes higher). The moving speed of the forming head 11 when forming each structural layer SL is set to form a forming object that gradually decreases in size in the Y direction as it moves away from the workpiece W in the + Z axis direction.

如此,於第四變型例中,可提昇三維結構物ST的與形狀相關的自由度、或三維結構物ST的形狀的精度。再者,亦可將三維結構物ST的形狀的精度設為該三維結構物ST的設計資料(作為一例,設計尺寸)與三維結構物ST的實際的形狀的差值。
再者,亦可將圖24(a)至圖24(c)中所示的第四變形例與所述實施方式以及第一變形例~第三變形例加以組合。
(3-5)其他變形例
As such, in the fourth modification, the degree of freedom of the shape of the three-dimensional structure ST or the accuracy of the shape of the three-dimensional structure ST can be improved. Furthermore, the accuracy of the shape of the three-dimensional structure ST may be the difference between the design data (as an example, the design size) of the three-dimensional structure ST and the actual shape of the three-dimensional structure ST.
Furthermore, the fourth modification shown in FIGS. 24 (a) to 24 (c) may be combined with the embodiment and the first to third modifications.
(3-5) Other modifications

於所述說明中,造形系統1包括使造形頭11進行移動的造形頭驅動系統12。但是,造形系統1除造形頭驅動系統12以外,亦可包括使平台13進行移動的平台驅動系統,或包括使平台13進行移動的平台驅動系統來代替造形頭驅動系統12。平台驅動系統亦可使平台13於X軸方向、Y軸方向、Z軸方向、θX方向、θY方向及θZ方向的至少一個方向上移動。藉由利用平台驅動系統的平台13的移動,與利用造形頭驅動系統12的造形頭11的移動同樣地變更平台13與造形頭11之間的相對的位置關係,進而變更工件W與照射區域EA之間的相對的位置關係。In the description, the shaping system 1 includes a shaping head driving system 12 that moves the shaping head 11. However, in addition to the forming head driving system 12, the forming system 1 may include a platform driving system that moves the platform 13 or a platform driving system that moves the platform 13 instead of the forming head driving system 12. The platform driving system can also move the platform 13 in at least one of the X-axis direction, Y-axis direction, Z-axis direction, θX direction, θY direction, and θZ direction. By moving the platform 13 using the platform driving system, the relative positional relationship between the platform 13 and the forming head 11 is changed in the same manner as the movement of the forming head 11 using the forming head driving system 12, and the workpiece W and the irradiation area EA are changed. The relative positional relationship between.

於所述說明中,造形系統1使造形頭11進行移動,藉此使照射區域EA相對於造形面MS進行移動。但是,造形系統1除使造形頭11進行移動以外,亦可藉由使光EL偏轉而使照射區域EA相對於造形面MS進行移動,或藉由使光EL偏轉而使照射區域EA相對於造形面MS進行移動來代替使造形頭11進行移動。於此情況下,照射系統111例如亦可包括能夠使光EL偏轉的光學系統(例如,振鏡(galvano mirror)等)。In the description, the shaping system 1 moves the shaping head 11 to move the irradiation area EA relative to the shaping surface MS. However, in addition to moving the shaping head 11, the shaping system 1 can also move the irradiation area EA relative to the shaping surface MS by deflecting the light EL, or deflect the light EL to cause the irradiation area EA relative to the shaping. The surface MS moves instead of moving the shaping head 11. In this case, the irradiation system 111 may include, for example, an optical system (for example, a galvano mirror) capable of deflecting the light EL.

於所述說明中,造形系統1對造形材料M照射光EL,藉此使造形材料M熔融。但是,造形系統1亦可對造形材料M照射任意的能量光束,藉此使造形材料M熔融。於此情況下,造形系統1除照射系統111以外,亦可包括能夠照射任意的能量光束的光束照射裝置,或包括能夠照射任意的能量光束的光束照射裝置來代替照射系統111。任意的能量光束並無限定,但包含電子束、離子束等帶電粒子束或電磁波。In the description, the shaping system 1 irradiates the shaping material M with light EL, thereby melting the shaping material M. However, the shaping system 1 may irradiate the shaping material M with an arbitrary energy beam, thereby melting the shaping material M. In this case, in addition to the irradiation system 111, the shaping system 1 may include a beam irradiation device capable of irradiating an arbitrary energy beam, or a beam irradiation device capable of irradiating an arbitrary energy beam instead of the irradiation system 111. The arbitrary energy beam is not limited, but includes a charged particle beam such as an electron beam, an ion beam, or an electromagnetic wave.

於所述說明中,造形系統1可利用雷射堆焊法來形成三維結構物ST。但是,造形系統1亦可利用能夠形成三維結構物ST的其他方式,自造形材料M形成三維結構物ST。作為其他方式的一例,例如可列舉:粉末燒結積層造形法(選擇性雷射燒結(Selective Laser Sintering,SLS))等粉末床熔融結合法(Powder Bed Fusion)。粉末床熔融結合法與一面照射光EL一面對光EL的照射區域EA供給造形材料M的雷射堆焊法不同,對已事先供給的造形材料M照射光EL等來形成三維結構物ST。作為其他方式的另一例,可列舉:結合材噴射法(Binder Jetting)、或雷射金屬熔融法(Laser Metal Fusion,LMF)。In the above description, the forming system 1 can form a three-dimensional structure ST by a laser surfacing method. However, the forming system 1 may use another method capable of forming the three-dimensional structure ST to form the three-dimensional structure ST from the forming material M. As an example of another method, for example, a powder bed fusion method (Powder Bed Fusion) such as a powder sintering lamination method (Selective Laser Sintering (SLS)) may be mentioned. The powder bed fusion bonding method is different from the laser surfacing method in which the shaping material M is supplied with one side of the light EL and one side of the irradiation area EA with light EL, and the three-dimensional structure ST is formed by irradiating the shaping material M that has been supplied in advance with light EL or the like. As another example of another method, a binder jetting method (Laser Metal Fusion) or a laser metal fusion method (LMF) may be mentioned.

於所述說明中,造形系統1包括控制裝置14。但是,造形系統1亦可不包括控制裝置14。控制裝置14亦可設置於造形系統1的外部。於此情況下,控制裝置14與造形系統1亦可藉由有線或無線的通信線路來連接。另外,亦可使用事先記錄有表示造形系統1的動作順序的訊號的記錄媒體代替控制裝置14來使造形系統1進行動作。另外,亦可使其他部分(作為一例,造形頭驅動系統12)承擔控制裝置14的一部分的功能。In the description, the shaping system 1 includes a control device 14. However, the shaping system 1 may not include the control device 14. The control device 14 may also be provided outside the shaping system 1. In this case, the control device 14 and the shaping system 1 may also be connected through a wired or wireless communication line. Instead of the control device 14, a recording medium in which a signal indicating the operation sequence of the shaping system 1 is recorded in advance may be used to operate the shaping system 1. In addition, other parts (for example, the forming head drive system 12) may be provided with functions of a part of the control device 14.

(5)附記
關於以上所說明的實施方式,進而揭示以下的附記。
[附記1]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層,且
於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記2]
如附記1中記載的造形系統,其中使於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量較於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。
[附記3]
如附記1或附記2中記載的造形系統,其中沿著所述第一結構層的表面的方向中的至少一個方向上的所述第二結構層的尺寸與所述至少一個方向上的所述第一結構層的尺寸不同。
[附記4]
如附記1至附記3的任一項中記載的造形系統,其中沿著所述第一結構層的表面的方向中的至少一個方向上的所述第二結構層的尺寸較所述至少一個方向上的所述第一結構層的尺寸大。
[附記5]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,藉此使所述被供給的所述材料熔融,而於所述第一結構層上形成第二結構層,所述第二結構層沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一結構層不同。
[附記6]
如附記5中記載的造形系統,其中於沿著所述第一結構層的表面的方向中的至少一個方向上,所述第二結構層的尺寸較所述第一結構層大。
[附記7]
如附記3至附記7的任一項中記載的造形系統,其中所述第一結構層及所述第二結構層具有朝於所述第一結構層的表面內與所述至少一個方向交叉的方向延長的形狀。
[附記8]
如附記1至附記7的任一項中記載的造形系統,其中於自所述第一結構層朝向所述第二結構層的方向上,所述第一結構層的尺寸與所述第二結構層的尺寸互不相同。
[附記9]
如附記1至附記8的任一項中記載的造形系統,其照射具有第一光束特性的所述能量光束來形成所述第一結構層,且
照射具有與所述第一光束特性不同的第二光束特性的所述能量光束來形成所述第二結構層。
[附記10]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射具有第一光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,且
對作為所述第一結構層的表面的至少一部分的第二造形面照射具有與所述第一光束特性不同的第二光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層。
[附記11]
如附記9或附記10中記載的造形系統,其中所述光束特性包含每單位面積的所述能量光束的強度或能量。
[附記12]
如附記11中記載的造形系統,其照射於每單位面積具有第一強度或第一能量的所述能量光束來形成所述第一結構層,且
照射於每單位面積具有與所述第一強度不同的第二強度或與所述第一能量不同的第二能量的所述能量光束來形成所述第二結構層。
[附記13]
如附記12中記載的造形系統,其中於每單位面積,所述第二強度較所述第一強度大。
[附記14]
如附記12或附記13中記載的造形系統,其中於每單位面積,所述第二能量較所述第一能量大。
[附記15]
如附記9至附記14的任一項中記載的造形系統,其中所述光束特性包含所述能量光束的散焦量。
[附記16]
如附記9至附記15的任一項中記載的造形系統,其照射相對於所述第一造形面的散焦量被設定成第一設定量的所述能量光束來形成所述第一結構層,且
照射相對於所述第二造形面的散焦量被設定成與所述第一設定量不同的第二設定量的所述能量光束來形成所述第二結構層。
[附記17]
如附記16中記載的造形系統,其中所述第二設定量較所述第一設定量小。
[附記18]
如附記9至附記17的任一項中記載的造形系統,其中所述光束特性包含照射所述能量光束的照射時間。
[附記19]
如附記18中記載的造形系統,其於對所述第一造形面上的單位面積區域僅照射第一照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第一結構層,且
於對所述第二造形面上的單位面積區域僅照射與所述第一照射時間不同的第二照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第二結構層。
[附記20]
如附記19中記載的造形系統,其中所述第二照射時間較所述第一照射時間長。
[附記21]
如附記18至附記20的任一項中記載的造形系統,其斷續地或呈脈衝狀地照射所述能量光束來形成所述第一結構層,且
連續地照射所述能量光束來形成所述第二結構層。
[附記22]
如附記9至附記21的任一項中記載的造形系統,其中以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量不同。
[附記23]
如附記22中記載的造形系統,其中以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量變得較於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量少。
[附記24]
如附記1至附記23的任一項中記載的造形系統,其中所述供給裝置將材料供給至所述能量光束的照射位置。
[附記25]
如附記1至附記24的任一項中記載的造形系統,其中所述照射裝置對已由所述供給裝置供給的所述材料照射所述能量光束。
[附記26]
如附記1至附記25的任一項中記載的造形系統,其照射所述能量光束,且以第一供給形態供給所述材料來形成所述第一結構層,
照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料來形成所述第二結構層。
[附記27]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射所述能量光束,且以第一供給形態供給所述材料來形成第一結構層,
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料而於所述第一結構層上形成第二結構層。
[附記28]
如附記26或附記27中記載的造形系統,其中所述供給形態包含每單位時間或每單位面積的所述材料的供給量。
[附記29]
如附記26或附記27中記載的造形系統,其照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成所述第一結構層,
照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料來形成所述第二結構層。
[附記30]
如附記29中記載的造形系統,其中所述第二供給量較所述第一供給量少。
[附記31]
如附記26至附記29的任一項中記載的造形系統,其中所述供給形態包含所述材料的供給時序。
[附記32]
如附記31中記載的造形系統,其將所述材料供給至所述第一造形面後照射所述能量光束來形成所述第一結構層,且
將所述材料局部地供給至所述第二造形面並照射所述能量光束來形成所述第二結構層。
[附記33]
如附記32中記載的造形系統,其將所述材料供給至所述第一造形面後不供給所述材料而照射所述能量光束來形成所述第一結構層。
[附記34]
如附記32或附記33中記載的造形系統,其將所述材料供給至所述第一造形面後照射所述能量光束,而形成已與所述第一造形面一體化的所述第一結構層。
[附記35]
如附記26至附記34的任一項中記載的造形系統,其將所述材料的至少一部分用作遮蔽所述能量光束的遮蔽物。
[附記36]
如附記26至附記35的任一項中記載的造形系統,其中以如下方式設定所述第一供給形態及所述第二供給形態:當以所述第一供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與當以所述第二供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記37]
如附記36中記載的造形系統,其中以如下方式設定所述第一供給形態及所述第二供給形態:當以所述第一供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量變得較當以所述第二供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。
[附記38]
如附記1至附記37的任一項中記載的造形系統,更包括移動裝置,所述移動裝置使所述第一造形面、所述第二造形面及所述能量光束的照射位置中的至少一者移動,以變更所述第一造形面及所述第二造形面的至少一者與所述能量光束的照射位置的相對的位置關係,
照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成所述第一結構層,
照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動來形成所述第二結構層。
[附記39]
一種造形系統,包括:
照射裝置,對造形面照射能量光束;
供給裝置,供給材料;以及
移動裝置,使所述第一造形面及所述能量光束的照射位置中的至少一者移動,以變更所述能量光束的照射位置與所述造形面的相對的位置關係;
對第一造形面照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成第一結構層,
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動,而於所述第一結構層上形成第二結構層。
[附記40]
如附記38或附記39中記載的造形系統,其中所述移動形態包含所述第一造形面、所述第二造形面及所述能量光束的照射位置中的至少一者的移動速度。
[附記41]
如附記40中記載的造形系統,其照射所述能量光束,且以第一移動速度使所述第一造形面及所述能量光束的照射位置的至少一者移動來形成所述第一結構層,
照射所述能量光束,且以與所述第一移動速度不同的第二移動速度使所述第二造形面及所述能量光束的照射位置的至少一者移動來形成所述第二結構層。
[附記42]
如附記40中記載的造形系統,其中所述第二移動速度較所述第一移動速度慢。
[附記43]
如附記38至附記42的任一項中記載的造形系統,其中以如下方式設定所述第一移動形態及所述第二移動形態:當所述第一造形面及所述能量光束的照射位置的至少一者以所述第一移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與當所述第二造形面及所述能量光束的照射位置的至少一者以所述第二移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記44]
如附記43中記載的造形系統,其中以如下方式設定所述第一移動形態及所述第二移動形態:當所述第一造形面及所述能量光束的照射位置的至少一者以所述第一移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量變得較當所述第二造形面及所述能量光束的照射位置的至少一者以所述第二移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。
[附記45]
如附記1至附記44的任一項中記載的造形系統,其對所述第一造形面照射所述能量光束而形成第一熔融池,藉此形成所述第一結構層,對所述第二造形面照射所述能量光束,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成所述第二結構層。
[附記46]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
藉由對第一造形面照射所述能量光束來使所述被供給的所述材料熔融而形成第一熔融池,藉此形成第一結構層,
藉由對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束來使所述被供給的所述材料熔融,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成第二結構層。
[附記47]
如附記45或附記46中記載的造形系統,其中所述至少一個方向上的所述第二熔融池的尺寸較所述至少一個方向上的所述第一熔融池的尺寸大。
[附記48]
如附記45至附記47的任一項中記載的造形系統,其中於形成所述第一結構層時,使所述第一熔融池朝所述第一造形面內的第一方向移動,
於形成所述第二結構層時,使所述第二熔融池朝所述第二造形面內的第二方向移動,
所述第一方向及所述第二方向相互平行,且
所述至少一個方向與所述第一方向及所述第二方向交叉。
[附記49]
如附記45至附記48的任一項中記載的造形系統,其照射具有第一光束特性的所述能量光束來形成所述第一熔融池,且
照射具有與所述第一光束特性不同的第二光束特性的所述能量光束來形成所述第二熔融池。
[附記50]
如附記49中記載的造形系統,其中所述光束特性包含每單位面積的所述能量光束的強度或能量。
[附記51]
如附記50中記載的造形系統,其照射於每單位面積具有第一強度或第一能量的所述能量光束來形成所述第一熔融池,且
照射於每單位面積具有與所述第一強度不同的第二強度或與所述第一能量不同的第二能量的所述能量光束來形成所述第二熔融池。
[附記52]
如附記51中記載的造形系統,其中每單位面積的所述第二強度較每單位面積的所述第一強度大。
[附記53]
如附記51或附記52中記載的造形系統,其中每單位面積的所述第二能量較每單位面積的所述第一能量大。
[附記54]
如附記49至附記53的任一項中記載的造形系統,其中所述光束特性包含所述能量光束的散焦量。
[附記55]
如附記54中記載的造形系統,其照射相對於所述第一造形面的散焦量被設定成第一設定量的所述能量光束來形成所述第一熔融池,且
照射相對於所述第二造形面的散焦量被設定成與所述第一設定量不同的第二設定量的所述能量光束來形成所述第二熔融池。
[附記56]
如附記55中記載的造形系統,其中所述第二設定量較所述第一設定量小。
[附記57]
如附記49至附記56的任一項中記載的造形系統,其中所述光束特性包含照射所述能量光束的照射時間。
[附記58]
如附記57中記載的造形系統,其於對所述第一造形面上的單位面積區域僅照射第一照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第一熔融池,且
於對所述第二造形面上的單位面積區域僅照射與所述第一照射時間不同的第二照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第二熔融池。
[附記59]
如附記58中記載的造形系統,其中所述第二照射時間較所述第一照射時間長。
[附記60]
如附記57至附記59的任一項中記載的造形系統,其斷續地或呈脈衝狀地照射所述能量光束來形成所述第一熔融池,且
連續地照射所述能量光束來形成所述第二熔融池。
[附記61]
如附記49至附記60的任一項中記載的造形系統,其中以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量不同。
[附記62]
如附記61中記載的造形系統,其中以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量變得較於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量少。
[附記63]
如附記45至附記62的任一項中記載的造形系統,其中所述供給裝置將所述材料供給至所述能量光束的照射位置。
[附記64]
如附記45至附記63的任一項中記載的造形系統,其中所述照射裝置對已由所述供給裝置供給的所述材料照射所述能量光束。
[附記65]
如附記45至附記64的任一項中記載的造形系統,其照射所述能量光束,且以第一供給形態供給所述材料來形成所述第一熔融池,
照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料來形成所述第二熔融池。
[附記66]
如附記65中記載的造形系統,其中所述供給形態包含每單位時間或每單位面積的所述材料的供給量。
[附記67]
如附記66中記載的造形系統,其照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成所述第一熔融池,
照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料來形成所述第二熔融池。
[附記68]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成第一熔融池,藉此形成第一結構層,
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料而於所述第二造形面形成第二熔融池,藉此於所述第一結構層上形成第二結構層。
[附記69]
如附記67或附記68中記載的造形系統,其中所述第二供給量較所述第一供給量少。
[附記70]
如附記65至附記69的任一項中記載的造形系統,其中所述供給形態包含所述材料的供給時序。
[附記71]
如附記70中記載的造形系統,其將所述材料供給至所述第一造形面後照射所述能量光束來形成所述第一熔融池,且
將所述材料局部地供給至所述第二造形面並照射所述能量光束來形成所述第二熔融池。
[附記72]
如附記71中記載的造形系統,其將所述材料供給至所述第一造形面後不供給所述材料而照射所述能量光束來形成所述第一熔融池。
[附記73]
如附記71或附記72中記載的造形系統,其將所述材料供給至所述第一造形面後照射所述能量光束來形成所述第一熔融池,藉此形成已與所述第一造形面一體化的所述第一結構層。
[附記74]
如附記65至附記73的任一項中記載的造形系統,其將所述材料的至少一部分用作遮蔽所述能量光束的遮蔽物。
[附記75]
如附記65至附記74的任一項中記載的造形系統,其中以如下方式設定所述第一供給形態及所述第二供給形態:當以所述第一供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與當以所述第二供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記76]
如附記75中記載的造形系統,其中以如下方式設定所述第一供給形態及所述第二供給形態:當以所述第一供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量變得較當以所述第二供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。
[附記77]
如附記45至附記74的任一項中記載的造形系統,更包括移動裝置,所述移動裝置使所述第一造形面、所述第二造形面及所述能量光束的照射位置中的至少一者移動,以變更所述第一造形面及所述第二造形面的至少一者與所述能量光束的照射位置的相對的位置關係,
照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成所述第一熔融池,
照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動來形成所述第二熔融池。
[附記78]
如附記77中記載的造形系統,其中所述移動形態包含所述第一造形面、所述第二造形面及所述能量光束的照射位置中的至少一者的移動速度。
[附記79]
如附記78中記載的造形系統,其照射所述能量光束,且以第一移動速度使所述第一造形面及所述能量光束的照射位置的至少一者移動來形成所述第一熔融池,
照射所述能量光束,且以與所述第一移動速度不同的第二移動速度使所述第二造形面及所述能量光束的照射位置的至少一者移動來形成所述第二熔融池。
[附記80]
如附記79中記載的造形系統,其中所述第二移動速度較所述第一移動速度慢。
[附記81]
如附記77至附記80的任一項中記載的造形系統,其中以如下方式設定所述第一移動形態及所述第二移動形態:當所述第一造形面及所述能量光束的照射位置的至少一者以所述第一移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與當所述第二造形面及所述能量光束的照射位置的至少一者以所述第二移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記82]
如附記81中記載的造形系統,其中以如下方式設定所述第一移動形態及所述第二移動形態:當所述第一造形面及所述能量光束的照射位置的至少一者以所述第一移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量變得較當所述第二造形面及所述能量光束的照射位置的至少一者以所述第二移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量少。
[附記83]
如附記1至附記82的任一項中記載的造形系統,其將已形成於所述第一造形面的所述第一結構層的表面的至少一部分設定成新的第一造形面,於已形成的所述第一結構層上形成新的所述第一結構層,藉此形成經積層的多個所述第一結構層,且
將所述多個第一結構層之中位於最上層的一個第一結構層的表面的至少一部分設定成所述第二造形面,於所述一個第一結構層上形成所述第二結構層。
[附記84]
如附記83中記載的造形系統,其中以隨著朝向上層,沿著所述多個第一結構層的表面的方向中的至少一個方向上的所述多個第一結構層的尺寸變大的方式,形成所述多個第一結構層。
[附記85]
如附記83或附記84中記載的造形系統,其對所述第一造形面照射所述能量光束而形成第一熔融池,藉此形成所述第一結構層,且
以隨著朝向上層,沿著所述多個第一結構層的表面的方向中的至少一個方向上的所述第一熔融池的尺寸變大的方式,形成所述第一熔融池。
[附記86]
如附記83中記載的造形系統,其中以隨著朝向上層,沿著所述多個第一結構層的表面的方向中的至少一個方向上的所述多個第一結構層的尺寸變小的方式,形成所述多個第一結構層。
[附記87]
如附記83或附記86中記載的造形系統,其對所述第一造形面照射所述能量光束而形成第一熔融池,藉此形成所述第一結構層,且
以隨著朝向上層,沿著所述多個第一結構層的表面的方向中的至少一個方向上的所述第一熔融池的尺寸變小的方式,形成所述第一熔融池。
[附記88]
如附記1至附記87的任一項中記載的造形系統,其中使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力低。
[附記89]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射所述能量光束而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,而於所述第一結構層上形成第二結構層,且
使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力低。
[附記90]
如附記88或附記89中記載的造形系統,其中藉由在所述第一結構層的內部形成較所述第二結構層多的空隙,而使所述第一結構層的脆性較所述第二結構層的脆性高。
[附記91]
如附記88至附記90的任一項中記載的造形系統,其中將脆性較為了形成所述第二結構層而作為所述材料來供給的第二材料高的第一材料作為所述材料來供給,而形成所述第一結構層,藉此使所述第一結構層的脆性較所述第二結構層的脆性高。
[附記92]
如附記88至附記91的任一項中記載的造形系統,其照射具有第一光束特性的所述能量光束來形成所述第一結構層,且
照射具有與所述第一光束特性不同的第二光束特性的所述能量光束來形成所述第二結構層。
[附記93]
如附記92中記載的造形系統,其中所述光束特性包含每單位面積的所述能量光束的強度或能量。
[附記94]
如附記93中記載的造形系統,其照射於每單位面積具有第三強度或第三能量的所述能量光束來形成所述第一結構層,且
照射於每單位面積具有較所述第三強度大的第四強度或較所述第三能量小的第四能量的所述能量光束來形成所述第二結構層。
[附記95]
如附記92至附記94的任一項中記載的造形系統,其照射具有可使所述材料蒸發的強度或能量的所述能量光束來形成所述第一結構層。
[附記96]
如附記88至附記95的任一項中記載的造形系統,其照射所述能量光束,且以第三供給形態供給所述材料來形成所述第一結構層,
照射所述能量光束,且以與所述第三供給形態不同的第四供給形態供給所述材料來形成所述第二結構層。
[附記97]
如附記96中記載的造形系統,其中所述供給形態包含每單位時間或每單位面積的所述材料的供給量。
[附記98]
如附記97中記載的造形系統,其照射所述能量光束,且於每單位時間或每單位面積以第三供給量供給所述材料來形成所述第一結構層,
照射所述能量光束,且於每單位時間或每單位面積以較所述第三供給量多的第四供給量供給所述材料來形成所述第二結構層。
[附記99]
如附記1至附記98的任一項中記載的造形系統,其將第一材料作為所述材料來供給而形成所述第一結構層,
將第二材料作為所述材料來供給而形成所述第二結構層,且
所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。
[附記100]
一種造形系統,包括:
照射裝置,照射能量光束;以及
供給裝置,供給材料;
對第一造形面照射所述能量光束,且將第一材料作為所述材料來供給而形成第一結構層,對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且將第二材料作為所述材料來供給而於所述第一結構層上形成第二結構層,
所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。
[附記101]
如附記99或附記100中記載的造形系統,其中所述第一材料對於所述第一造形面的潤濕性較所述第二材料對於所述第一造形面的潤濕性低。
[附記102]
如附記99至附記100的任一項中記載的造形系統,其中於表面的至少一部分具有所述第一造形面的物體包含不銹鋼,
所述第一材料包含鋁、鈦、銅及鎢的至少一者,且
所述第二材料包含與所述物體相同的材料。
[附記103]
如附記88至附記102的任一項中記載的造形系統,其將已形成於所述第一造形面的所述第一結構層的表面的至少一部分設定成新的第一造形面,於已形成的所述第一結構層上形成新的所述第一結構層,藉此形成經積層的多個所述第一結構層,且
將所述多個第一結構層之中位於最上層的一個第一結構層的表面的至少一部分設定成所述第二造形面,於所述一個第一結構層上形成所述第二結構層。
[附記104]
一種造形方法,包括:
對第一造形面照射能量光束來形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層;且
使於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記105]
如附記104中記載的造形方法,其中於每單位面積或每單位時間對所述第一造形面傳遞的能量較於每單位面積或每單位時間對所述第二造形面傳遞的能量少。
[附記106]
一種造形方法,包括:
對第一造形面照射能量光束來形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,而於所述第一結構層上形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一結構層不同的第二結構層。
[附記107]
如附記106中記載的造形方法,其中於沿著所述第一結構層的表面的方向中的至少一個方向上,所述第二結構層的尺寸較所述第一結構層大。
[附記108]
一種造形方法,包括:
對第一造形面照射能量光束來形成第一熔融池,藉此形成第一結構層;以及
對第二造形面照射所述能量光束,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成第二結構層。
[附記109]
如附記108中記載的造形方法,其中所述第二熔融池較所述第一熔融池大。
[附記110]
一種造形方法,包括:
對第一造形面照射能量光束來形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層;且
使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力高。
[附記111]
一種造形方法,包括:
對第一造形面照射能量光束,且供給第一材料來形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且供給第二材料而於所述第一結構層上形成第二結構層;且
所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。
[附記112]
如附記104至附記111的任一項中記載的造形方法,更包括使所述第二結構層自所述第一造形面分離。
[附記113]
如附記112中記載的造形方法,其中使所述第二結構層分離包括藉由破壞所述第一結構層或使所述第一結構層自所述第一造形面分離,而將所述第二結構層自所述第一造形面分開。
[附記114]
一種造形方法,包括:
至少對第一造形面及第二造形面供給材料;
對所述第一造形面照射具有第一光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的所述第二造形面照射具有與所述第一光束特性不同的第二光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層。
[附記115]
一種造形方法,包括:
至少對第一造形面及第二造形面供給材料;
對所述第一造形面照射所述能量光束,且以第一供給形態供給所述材料來形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的所述第二造形面照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料而於所述第一結構層上形成第二結構層。
[附記116]
一種造形方法,包括:
對造形面照射能量光束;
供給材料;
使所述第一造形面及所述能量光束的照射位置中的至少一者移動,以變更所述能量光束的照射位置與所述造形面的相對的位置關係;
對第一造形面照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動,而於所述第一結構層上形成第二結構層。
[附記117]
一種造形方法,包括:
照射能量光束;
供給材料;
對第一造形面照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成第一熔融池,藉此形成第一結構層;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料而於所述第二造形面形成第二熔融池,藉此於所述第一結構層上形成第二結構層。
[附記118]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對第一造形面照射所述能量光束來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層的處理;且
於所述控制中,使於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。
[附記119]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對第一造形面照射所述能量光束來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,而於所述第一結構層上形成第二結構層的處理,所述第二結構層沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一結構層不同。
[附記120]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
至少對第一造形面及第二造形面供給材料的處理;以及
對所述第一造形面照射具有第一光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層的處理;且
於所述控制中,對作為所述第一結構層的表面的至少一部分的所述第二造形面照射具有與所述第一光束特性不同的第二光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層。
[附記121]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
至少對第一造形面及第二造形面供給材料的處理;
對所述第一造形面照射所述能量光束,且以第一供給形態供給所述材料來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的所述第二造形面照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料而於所述第一結構層上形成第二結構層的處理。
[附記122]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對造形面照射所述能量光束的處理;
供給材料的處理;
使所述第一造形面及所述能量光束的照射位置中的至少一者移動,以變更所述能量光束的照射位置與所述造形面的相對的位置關係的處理;
對第一造形面照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動,而於所述第一結構層上形成第二結構層的處理。
[附記123]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對第一造形面照射所述能量光束來形成第一熔融池,藉此形成第一結構層的處理;以及
對第二造形面照射所述能量光束,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成第二結構層的處理。
[附記124]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對第一造形面照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成第一熔融池,藉此形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料而於所述第二造形面形成第二熔融池,藉此於所述第一結構層上形成第二結構層的處理。
[附記125]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對第一造形面照射所述能量光束來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層的處理;且
使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力高。
[附記126]
一種控制裝置,其是對造形系統進行控制的控制裝置,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述控制裝置以藉由所述造形系統來執行如下的處理的方式進行控制:
對第一造形面照射所述能量光束,且供給第一材料來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且供給第二材料而於所述第一結構層上形成第二結構層的處理;且
所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。
[附記127]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對第一造形面照射所述能量光束來形成第一結構層的處理;
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層的處理;以及
於所述控制中,使於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同的處理。
[附記128]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對第一造形面照射所述能量光束來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,而於所述第一結構層上形成第二結構層的處理,所述第二結構層沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一結構層不同。
[附記129]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
至少對第一造形面及第二造形面供給材料的處理;
對所述第一造形面照射具有第一光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層的處理;以及
於所述控制中,對作為所述第一結構層的表面的至少一部分的所述第二造形面照射具有與所述第一光束特性不同的第二光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層的處理。
[附記130]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
至少對第一造形面及第二造形面供給材料的處理;
對所述第一造形面照射所述能量光束,且以第一供給形態供給所述材料來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的所述第二造形面照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料而於所述第一結構層上形成第二結構層的處理。
[附記131]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對造形面照射所述能量光束的處理;
供給材料的處理;
使所述第一造形面及所述能量光束的照射位置中的至少一者移動,以變更所述能量光束的照射位置與所述造形面的相對的位置關係的處理;
對第一造形面照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動,而於所述第一結構層上形成第二結構層的處理。
[附記132]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對第一造形面照射所述能量光束來形成第一熔融池,藉此形成第一結構層的處理;以及
對第二造形面照射所述能量光束,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成第二結構層的處理。
[附記133]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對第一造形面照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成第一熔融池,藉此形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料而於所述第二造形面形成第二熔融池,藉此於所述第一結構層上形成第二結構層的處理。
[附記134]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對第一造形面照射所述能量光束來形成第一結構層的處理;
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層的處理;以及
使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力高的處理。
[附記135]
一種程式,其是使對造形系統進行控制的電腦執行的程式,所述造形系統包括照射能量光束的照射裝置、及供給材料的供給裝置,且所述程式使電腦執行如下的處理:
對第一造形面照射所述能量光束,且供給第一材料來形成第一結構層的處理;以及
對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且供給第二材料而於所述第一結構層上形成第二結構層的處理;且
所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。
[附記136]
一種記錄媒體,其記錄有如附記127至附記135的任一項中記載的電腦程式。
(5) Additional notes
Regarding the embodiment described above, the following additional notes are further disclosed.
[Supplementary note 1]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
The first shaping surface is irradiated with the energy beam, thereby melting the supplied material to form a first structural layer, and irradiating a second shaping surface that is at least a part of a surface of the first structural layer The energy beam, thereby melting the supplied material to form a second structure layer on the first structure layer, and
The energy transferred from the energy beam to the first shaping surface per unit area or unit time is different from the energy transferred from the energy beam to the second shaping surface per unit area or unit time.
[Supplementary note 2]
The shaping system as described in Supplementary Note 1, wherein the energy transferred from the energy beam to the first shaping surface per unit area or unit time is greater than that per unit area or unit time from the energy beam pair. The second shaping surface transfers less energy.
[Supplementary note 3]
The shaping system as described in Supplementary Note 1 or 2, wherein the size of the second structural layer in at least one of the directions along the surface of the first structural layer is the same as that of The dimensions of the first structural layer are different.
[Supplementary note 4]
The shaping system according to any one of Supplementary Notes 1 to 3, wherein a size of the second structural layer in at least one of directions along a surface of the first structural layer is larger than the at least one direction The size of the first structural layer is large.
[Supplementary note 5]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
The first shaping surface is irradiated with the energy beam, thereby melting the supplied material to form a first structural layer, and irradiating a second shaping surface that is at least a part of a surface of the first structural layer. The energy beam, thereby melting the supplied material, and forming a second structure layer on the first structure layer, the second structure layer along a surface of the first structure layer A dimension in at least one of the directions is different from the first structure layer.
[Supplementary note 6]
The shaping system described in Supplementary Note 5, wherein a size of the second structural layer is larger than that of the first structural layer in at least one of directions along a surface of the first structural layer.
[Supplementary note 7]
The shaping system according to any one of appendices 3 to 7, wherein the first structure layer and the second structure layer have a cross-section that intersects the at least one direction toward a surface of the first structure layer. Directional extended shape.
[Supplementary note 8]
The shaping system according to any one of Supplementary Notes 1 to 7, wherein the size of the first structural layer and the second structure are in a direction from the first structural layer toward the second structural layer. The dimensions of the layers are different from each other.
[Supplementary note 9]
The forming system according to any one of Supplementary Notes 1 to 8, irradiating the energy beam having a first beam characteristic to form the first structure layer, and
The second structure layer is formed by irradiating the energy beam having a second beam characteristic different from the first beam characteristic.
[Supplementary note 10]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
Irradiating the first shaping surface with the energy beam having a first beam characteristic, thereby melting the supplied material to form a first structural layer, and
Irradiating the second shaping surface, which is at least a part of the surface of the first structural layer, with the energy beam having a second beam characteristic different from the first beam characteristic, thereby causing the supplied material The second structure layer is formed on the first structure layer by melting.
[Supplementary note 11]
The shaping system described in Supplementary Note 9 or 10, wherein the beam characteristic includes an intensity or energy of the energy beam per unit area.
[Supplementary note 12]
The shaping system described in Supplementary Note 11, which irradiates the energy beam having a first intensity or a first energy per unit area to form the first structure layer, and
The second structure layer is formed by irradiating the energy beam having a second intensity different from the first intensity or a second energy different from the first energy per unit area.
[Supplementary note 13]
The shaping system described in Appendix 12, wherein the second intensity is greater than the first intensity per unit area.
[Supplementary note 14]
The shaping system described in Supplementary Note 12 or 13, wherein the second energy is greater than the first energy per unit area.
[Supplementary note 15]
The shaping system according to any one of appendixes 9 to 14, wherein the beam characteristics include a defocus amount of the energy beam.
[Supplementary note 16]
The shaping system according to any one of appendices 9 to 15, which irradiates the energy beam whose defocus amount with respect to the first shaping surface is set to a first set amount to form the first structural layer. , And
The second structural layer is formed by irradiating the energy beam with a defocus amount set to a second set amount different from the first set amount with respect to the second shaping surface.
[Supplementary note 17]
The shaping system described in Supplementary Note 16, wherein the second set amount is smaller than the first set amount.
[Supplementary note 18]
The shaping system according to any one of appendixes 9 to 17, wherein the beam characteristics include an irradiation time for irradiating the energy beam.
[Supplementary note 19]
The shaping system described in Supplementary Note 18, in a state where the unit area on the first shaping surface is irradiated with only the energy beam for a first irradiation time, the energy beam is irradiated to form the first structure. Layers, and
The second structure layer is formed by irradiating the energy beam in a state where the unit area on the second shaping surface is irradiated with the energy beam only for a second irradiation time different from the first irradiation time. .
[Supplementary note 20]
The shaping system described in Supplementary Note 19, wherein the second irradiation time is longer than the first irradiation time.
[Supplementary note 21]
The forming system according to any one of Supplementary Note 18 to Supplementary Note 20, which irradiates the energy beam intermittently or in a pulse form to form the first structure layer, and
The energy beam is continuously irradiated to form the second structure layer.
[Supplementary note 22]
The shaping system according to any one of Supplementary Notes 9 to 21, wherein the first light beam characteristic and the second light beam characteristic are set as follows: the first light beam characteristic is provided per unit area or unit time. The energy transmitted by the energy beam to the first shaping surface is different from the energy transmitted from the energy beam having the second beam characteristic to the second shaping surface per unit area or unit time .
[Supplementary note 23]
The shaping system as described in Appendix 22, wherein the first beam characteristic and the second beam characteristic are set as follows: the energy beam pair having the first beam characteristic per unit area or unit time The energy transferred by the first shaping surface becomes smaller than the energy transferred from the energy beam having the second beam characteristic to the second shaping surface per unit area or unit time.
[Supplementary Note 24]
The shaping system according to any one of Supplementary Notes 1 to 23, wherein the supply device supplies a material to an irradiation position of the energy beam.
[Supplementary note 25]
The shaping system according to any one of Supplementary Notes 1 to 24, wherein the irradiation device irradiates the energy beam to the material that has been supplied by the supply device.
[Supplementary note 26]
The forming system according to any one of Supplementary Notes 1 to 25, which irradiates the energy beam and supplies the material in a first supply form to form the first structural layer,
The second structural layer is formed by irradiating the energy beam and supplying the material in a second supply form different from the first supply form.
[Supplementary note 27]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
Irradiating the first shaping surface with the energy beam, and supplying the material in a first supply form to form a first structural layer,
Irradiating the energy beam onto a second shaping surface that is at least a part of the surface of the first structure layer, and supplying the material in a second supply form different from the first supply form to the first structure A second structural layer is formed on the layer.
[Supplementary note 28]
The shaping system described in Supplementary Note 26 or 27, wherein the supply form includes a supply amount of the material per unit time or per unit area.
[Supplementary note 29]
The shaping system described in Supplementary Note 26 or 27, which irradiates the energy beam and supplies the material at a first supply amount per unit time or per unit area to form the first structural layer,
The energy beam is irradiated and the material is supplied at a second supply amount different from the first supply amount per unit time or per unit area to form the second structure layer.
[Supplementary note 30]
The shaping system as described in Appendix 29, wherein the second supply amount is smaller than the first supply amount.
[Supplementary note 31]
The shaping system according to any one of appendixes 26 to 29, wherein the supply form includes a supply timing of the material.
[Supplementary note 32]
The forming system described in Appendix 31, which supplies the material to the first forming surface and irradiates the energy beam to form the first structural layer, and
The material is locally supplied to the second shaping surface and irradiated with the energy beam to form the second structure layer.
[Supplementary note 33]
The shaping system described in Supplementary Note 32, which supplies the material to the first shaping surface without supplying the material and irradiates the energy beam to form the first structural layer.
[Supplementary note 34]
The shaping system described in Supplementary Note 32 or 33, which supplies the material to the first shaping surface and irradiates the energy beam to form the first structure that has been integrated with the first shaping surface. Floor.
[Supplementary note 35]
The shaping system according to any one of Appendixes 26 to 34, wherein at least a part of the material is used as a shield that shields the energy beam.
[Supplementary note 36]
The shaping system described in any one of Supplementary Notes 26 to 35, wherein the first supply form and the second supply form are set as follows: When the material is supplied in the first supply form, the Energy transferred from the energy beam to the first shaping surface per unit area or unit time, and from the energy per unit area or unit time when the material is supplied in the second supply form The energy transmitted by the light beam to the second shaping surface is different.
[Supplementary note 37]
The shaping system as described in Supplementary Note 36, wherein the first supply form and the second supply form are set as follows: when the material is supplied in the first supply form, in a unit area or a unit time The energy transferred from the energy beam to the first shaping surface becomes smaller than when the material is supplied in the second supply form, the energy beam is applied to the second unit area per unit area or unit time. Shaping surfaces transfer less energy.
[Supplementary note 38]
The shaping system described in any one of Supplementary Notes 1 to 37, further comprising a moving device that causes at least one of the first forming surface, the second forming surface, and an irradiation position of the energy beam. One moves to change the relative positional relationship between at least one of the first shaping surface and the second shaping surface and the irradiation position of the energy beam,
Irradiating the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form the first structure layer,
Irradiating the energy beam and moving at least one of the second shaping surface and the irradiation position of the energy beam in a second movement form different from the first movement form to form the second structure layer .
[Supplementary note 39]
A shaping system includes:
An irradiating device, which irradiates an energy beam on the forming surface;
Supply device, supply material; and
A moving device that moves at least one of the first shaping surface and the irradiation position of the energy beam to change a relative positional relationship between the irradiation position of the energy beam and the shaping surface;
Irradiating the first shaping surface with the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form a first structure layer,
Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structural layer, and causing the second shaping surface and the energy to be in a second moving form different from the first moving form At least one of the irradiation positions of the light beam moves, and a second structure layer is formed on the first structure layer.
[Supplementary note 40]
The shaping system described in Supplementary Note 38 or 39, wherein the moving form includes a moving speed of at least one of the first forming surface, the second forming surface, and an irradiation position of the energy beam.
[Supplementary note 41]
The shaping system described in Supplementary Note 40, which irradiates the energy beam and moves at least one of the first shaping surface and the irradiation position of the energy beam at a first moving speed to form the first structural layer. ,
The second structural layer is formed by irradiating the energy beam and moving at least one of the second shaping surface and the irradiation position of the energy beam at a second moving speed different from the first moving speed.
[Supplementary note 42]
The shaping system as described in Appendix 40, wherein the second moving speed is slower than the first moving speed.
[Supplementary note 43]
The shaping system described in any one of Supplementary Notes 38 to 42, wherein the first moving form and the second moving form are set as follows: when the first forming surface and the irradiation position of the energy beam are The energy transferred from the energy beam to the first shaping surface per unit area or unit time when at least one of the moving in the first moving form, and the second shaping surface and the energy per unit area or unit time When at least one of the irradiation positions of the light beam moves in the second movement form, the energy transmitted from the energy beam to the second shaping surface per unit area or per unit time is different.
[Supplementary note 44]
The shaping system described in Supplementary Note 43, wherein the first moving form and the second moving form are set as follows: when at least one of the first shaping surface and the irradiation position of the energy beam is set as the When the first moving form moves, the energy transferred from the energy beam to the first shaping surface per unit area or unit time becomes at least as large as the irradiation position of the second shaping surface and the energy beam When one moves in the second moving form, less energy is transmitted from the energy beam to the second shaping surface per unit area or per unit time.
[Supplementary note 45]
The forming system according to any one of Supplementary Notes 1 to 44, wherein the first forming surface is irradiated with the energy beam to form a first molten pool, thereby forming the first structural layer, and Two shaped surfaces irradiate the energy beam to form a second melting pool having a size different from that of the first melting pool in at least one of the directions along the surface of the first structure layer, thereby applying The second structure layer is formed on the first structure layer.
[Supplementary note 46]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
Irradiating the energy beam onto the first shaping surface to melt the supplied material to form a first melting pool, thereby forming a first structural layer,
Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structure layer to melt the supplied material, thereby forming a material along the surface of the first structure layer A second molten pool having a size different from that of the first molten pool in at least one of the directions, thereby forming a second structural layer on the first structural layer.
[Supplementary note 47]
The shaping system as described in supplementary note 45 or 46, wherein the size of the second melting pool in the at least one direction is larger than the size of the first melting pool in the at least one direction.
[Supplementary note 48]
The forming system according to any one of Supplementary Notes 45 to 47, wherein when the first structural layer is formed, the first molten pool is moved toward a first direction within the first forming surface,
When forming the second structural layer, moving the second molten pool toward a second direction within the second forming surface,
The first direction and the second direction are parallel to each other, and
The at least one direction intersects the first direction and the second direction.
[Supplementary note 49]
The shaping system according to any one of Supplementary Notes 45 to 48, which irradiates the energy beam having a first beam characteristic to form the first molten pool, and
The energy beam having a second beam characteristic different from the first beam characteristic is irradiated to form the second molten pool.
[Supplementary note 50]
The shaping system described in Appendix 49, wherein the beam characteristic includes an intensity or energy of the energy beam per unit area.
[Supplementary note 51]
The shaping system described in Supplementary Note 50, which irradiates the energy beam having a first intensity or a first energy per unit area to form the first molten pool, and
The second molten pool is formed by irradiating the energy beam having a second intensity different from the first intensity or a second energy different from the first energy per unit area.
[Supplementary note 52]
The shaping system described in Supplementary Note 51, wherein the second intensity per unit area is greater than the first intensity per unit area.
[Supplementary note 53]
The shaping system described in Supplementary Note 51 or 52, wherein the second energy per unit area is greater than the first energy per unit area.
[Supplementary note 54]
The shaping system according to any one of appendixes 49 to 53, wherein the beam characteristic includes a defocus amount of the energy beam.
[Supplementary note 55]
The shaping system described in Supplementary Note 54, which irradiates the energy beam whose defocus amount with respect to the first shaping surface is set to a first set amount to form the first molten pool, and
The second molten pool is formed by irradiating the energy beam whose defocus amount with respect to the second shaping surface is set to a second set amount different from the first set amount.
[Supplementary note 56]
The shaping system described in Supplementary Note 55, wherein the second set amount is smaller than the first set amount.
[Supplementary note 57]
The shaping system according to any one of appendixes 49 to 56, wherein the beam characteristic includes an irradiation time for irradiating the energy beam.
[Supplementary note 58]
The shaping system described in Supplementary Note 57, in which the unit area on the first shaping surface is irradiated with the energy beam only for a first irradiation time, the energy beam is irradiated to form the first melt Pool, and
In a state where a unit area area on the second shaping surface is irradiated with the energy beam only for a second irradiation time different from the first irradiation time, the energy beam is irradiated to form the second molten pool .
[Supplementary note 59]
The shaping system according to Supplementary Note 58, wherein the second irradiation time is longer than the first irradiation time.
[Supplementary note 60]
The forming system according to any one of Supplementary Notes 57 to 59, which irradiates the energy beam intermittently or in a pulse form to form the first molten pool, and
The energy beam is continuously irradiated to form the second molten pool.
[Supplementary note 61]
The shaping system according to any one of Supplementary 49 to Supplementary 60, wherein the first light beam characteristic and the second light beam characteristic are set as follows: the first light beam characteristic is provided per unit area or unit time. The energy transmitted by the energy beam to the first shaping surface is different from the energy transmitted from the energy beam having the second beam characteristic to the second shaping surface per unit area or unit time .
[Supplementary note 62]
The shaping system as described in Appendix 61, wherein the first beam characteristic and the second beam characteristic are set as follows: the energy beam pair having the first beam characteristic per unit area or unit time The energy transferred by the first shaping surface becomes smaller than the energy transferred from the energy beam having the second beam characteristic to the second shaping surface per unit area or unit time.
[Supplementary note 63]
The shaping system according to any one of Supplementary Notes 45 to 62, wherein the supply device supplies the material to an irradiation position of the energy beam.
[Supplementary note 64]
The shaping system according to any one of Supplementary Notes 45 to 63, wherein the irradiation device irradiates the energy beam to the material that has been supplied by the supply device.
[Supplementary note 65]
The forming system according to any one of Supplementary Notes 45 to 64, which irradiates the energy beam and supplies the material in a first supply form to form the first molten pool,
The second molten pool is formed by irradiating the energy beam and supplying the material in a second supply form different from the first supply form.
[Supplementary note 66]
The forming system according to Supplementary Note 65, wherein the supply form includes a supply amount of the material per unit time or per unit area.
[Supplementary note 67]
The shaping system described in Appendix 66, which irradiates the energy beam and supplies the material at a first supply amount per unit time or per unit area to form the first molten pool,
The energy beam is irradiated, and the material is supplied at a second supply amount different from the first supply amount per unit time or per unit area to form the second molten pool.
[Supplementary note 68]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
Irradiating the first shaping surface with the energy beam, and supplying the material at a first supply amount per unit time or per unit area to form a first molten pool, thereby forming a first structural layer,
Irradiating the second beam forming surface that is at least a part of the surface of the first structural layer, and supplying the energy beam at a second supply amount different from the first supply amount per unit time or per unit area. The material forms a second molten pool on the second forming surface, thereby forming a second structural layer on the first structural layer.
[Supplementary note 69]
The shaping system according to Supplementary Note 67 or 68, wherein the second supply amount is smaller than the first supply amount.
[Supplementary note 70]
The forming system according to any one of Supplementary Notes 65 to 69, wherein the supply form includes a supply timing of the material.
[Supplementary note 71]
The forming system according to Supplement 70, which supplies the material to the first forming surface and irradiates the energy beam to form the first molten pool, and
The material is locally supplied to the second shaping surface and irradiated with the energy beam to form the second molten pool.
[Supplementary note 72]
The shaping system described in Supplementary Note 71, which supplies the material to the first shaping surface without supplying the material and irradiates the energy beam to form the first molten pool.
[Supplementary note 73]
The forming system described in Supplementary 71 or 72, which supplies the material to the first forming surface and irradiates the energy beam to form the first molten pool, thereby forming the first molten pool. The first structural layer is integrated on a surface.
[Supplementary note 74]
The shaping system according to any one of Supplementary Notes 65 to 73, wherein at least a part of the material is used as a shield that shields the energy beam.
[Supplementary note 75]
The shaping system described in any one of Supplementary Notes 65 to 74, wherein the first supply form and the second supply form are set as follows: When the material is supplied in the first supply form, the Energy transferred from the energy beam to the first shaping surface per unit area or unit time, and from the energy per unit area or unit time when the material is supplied in the second supply form The energy transmitted by the light beam to the second shaping surface is different.
[Supplementary note 76]
The shaping system described in Supplementary Note 75, wherein the first supply form and the second supply form are set as follows: When the material is supplied in the first supply form, in a unit area or a unit time The energy transferred from the energy beam to the first shaping surface becomes smaller than when the material is supplied in the second supply form, the energy beam is applied to the second unit area per unit area or unit time. Shaping surfaces transfer less energy.
[Supplementary note 77]
The shaping system described in any one of Supplementary Notes 45 to 74, further comprising a moving device that causes at least one of the first forming surface, the second forming surface, and an irradiation position of the energy beam. One moves to change the relative positional relationship between at least one of the first shaping surface and the second shaping surface and the irradiation position of the energy beam,
Irradiating the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form the first molten pool,
Irradiate the energy beam and move at least one of the second shaping surface and the irradiation position of the energy beam in a second movement form different from the first movement form to form the second molten pool .
[Supplementary note 78]
The forming system according to Supplementary Note 77, wherein the moving form includes a moving speed of at least one of the first forming surface, the second forming surface, and an irradiation position of the energy beam.
[Supplementary note 79]
The shaping system described in Supplementary Note 78, which irradiates the energy beam and moves at least one of the first shaping surface and the irradiation position of the energy beam at a first moving speed to form the first molten pool. ,
The second molten pool is formed by irradiating the energy beam and moving at least one of the second shaping surface and the irradiation position of the energy beam at a second moving speed different from the first moving speed.
[Supplementary note 80]
The shaping system described in Appendix 79, wherein the second moving speed is slower than the first moving speed.
[Supplementary note 81]
The forming system described in any one of Supplementary 77 to Supplementary 80, wherein the first moving form and the second moving form are set as follows: when the first forming surface and the irradiation position of the energy beam are The energy transferred from the energy beam to the first shaping surface per unit area or unit time when at least one of the moving in the first moving form, and the second shaping surface and the energy per unit area or unit time When at least one of the irradiation positions of the light beam moves in the second movement form, the energy transmitted from the energy beam to the second shaping surface per unit area or per unit time is different.
[Supplementary Note 82]
The shaping system described in Appendix 81, wherein the first moving form and the second moving form are set as follows: when at least one of the first shaping surface and the irradiation position of the energy beam is set as the When the first moving form moves, the energy transferred from the energy beam to the first shaping surface per unit area or unit time becomes at least as large as the irradiation position of the second shaping surface and the energy beam. When one moves in the second moving form, less energy is transmitted from the energy beam to the first shaping surface per unit area or unit time.
[Supplementary note 83]
The forming system according to any one of Supplementary Notes 1 to 82, wherein at least a part of the surface of the first structural layer that has been formed on the first forming surface is set as a new first forming surface. Forming a new first structure layer on the formed first structure layer, thereby forming a plurality of laminated first structure layers, and
At least a part of a surface of a first structure layer located at the uppermost layer among the plurality of first structure layers is set as the second shaping surface, and the second structure layer is formed on the one first structure layer .
[Supplementary note 84]
The shaping system as described in Supplement 83, wherein the size of the plurality of first structural layers becomes larger in at least one of the directions along the surface of the plurality of first structural layers as they are directed toward the upper layer. Way, forming the plurality of first structural layers.
[Supplementary note 85]
The forming system described in Supplementary Note 83 or 84, which irradiates the first beam forming surface with the energy beam to form a first melting pool, thereby forming the first structural layer, and
The first molten pool is formed such that the size of the first molten pool in a direction along at least one of the directions of the surfaces of the plurality of first structural layers becomes larger as it goes toward the upper layer.
[Supplementary note 86]
The shaping system as described in Supplement 83, wherein the size of the plurality of first structural layers becomes smaller in at least one of the directions along the surface of the plurality of first structural layers as they go toward the upper layer. Way, forming the plurality of first structural layers.
[Supplementary note 87]
The forming system described in Supplementary Note 83 or 86, which irradiates the first beam forming surface with the energy beam to form a first molten pool, thereby forming the first structural layer, and
The first molten pool is formed in such a manner that the size of the first molten pool in a direction along at least one of the directions of the surfaces of the plurality of first structural layers becomes smaller as it goes toward the upper layer.
[Supplementary note 88]
The shaping system according to any one of Supplementary Notes 1 to 87, wherein the resistance of the first structural layer to damage is made lower than the resistance of the second structural layer to damage.
[Supplementary note 89]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
The first forming surface is irradiated with the energy beam to form a first structure layer, and the second forming surface that is at least a part of the surface of the first structure layer is irradiated with the energy beam, and the first structure layer is A second structural layer is formed thereon, and
The resistance of the first structure layer to damage is made lower than the resistance of the second structure layer to damage.
[Supplementary note 90]
The shaping system as described in Supplementary Note 88 or 89, wherein the first structural layer is more brittle than the first structural layer by forming more voids in the first structural layer than in the second structural layer. The two structural layers have high brittleness.
[Supplementary note 91]
The shaping system according to any one of supplementary notes 88 to 90, wherein a first material having a higher brittleness than a second material that is formed as the second structural layer and is supplied as the material is supplied as the material. To form the first structure layer, thereby making the brittleness of the first structure layer higher than that of the second structure layer.
[Supplementary note 92]
The shaping system according to any one of supplementary notes 88 to 91, wherein the first structural layer is formed by irradiating the energy beam having a first beam characteristic, and
The second structure layer is formed by irradiating the energy beam having a second beam characteristic different from the first beam characteristic.
[Supplementary Note 93]
The shaping system described in Supplementary Note 92, wherein the beam characteristic includes an intensity or energy of the energy beam per unit area.
[Supplementary note 94]
The shaping system described in Supplementary Note 93, which irradiates the energy beam having a third intensity or a third energy per unit area to form the first structural layer, and
The second structural layer is formed by irradiating the energy beam having a fourth intensity greater than the third intensity or a fourth energy lower than the third energy per unit area.
[Supplementary note 95]
The shaping system according to any one of appendixes 92 to 94, wherein the first structural layer is formed by irradiating the energy beam having an intensity or energy capable of evaporating the material.
[Supplementary Note 96]
The shaping system according to any one of supplementary notes 88 to 95, which irradiates the energy beam and supplies the material in a third supply form to form the first structural layer,
The second structural layer is formed by irradiating the energy beam and supplying the material in a fourth supply form different from the third supply form.
[Supplementary note 97]
The shaping system according to Appendix 96, wherein the supply form includes a supply amount of the material per unit time or per unit area.
[Supplementary note 98]
The shaping system described in Appendix 97, which irradiates the energy beam and supplies the material at a third supply amount per unit time or per unit area to form the first structural layer,
The energy beam is irradiated and the material is supplied at a fourth supply amount more than the third supply amount per unit time or per unit area to form the second structure layer.
[Supplementary note 99]
The forming system according to any one of Supplementary Notes 1 to 98, which supplies the first material as the material to form the first structural layer,
Supplying a second material as the material to form the second structural layer, and
The bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface.
[Supplementary note 100]
A shaping system includes:
An irradiation device that irradiates an energy beam; and
Supply device
The first shaping surface is irradiated with the energy beam, a first material is supplied as the material to form a first structure layer, and a second shaping surface that is at least a part of a surface of the first structure layer is irradiated with the An energy beam, and a second material is supplied as the material to form a second structure layer on the first structure layer,
The bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface.
[Supplementary note 101]
The shaping system described in Supplementary Note 99 or Supplementary Note 100, wherein the wettability of the first material to the first shaping surface is lower than the wettability of the second material to the first shaping surface.
[Supplementary note 102]
The forming system according to any one of supplementary notes 99 to 100, wherein the object having the first shaping surface on at least a part of the surface includes stainless steel,
The first material includes at least one of aluminum, titanium, copper, and tungsten, and
The second material includes the same material as the object.
[Supplementary note 103]
The forming system according to any one of Supplementary Notes 88 to 102, wherein at least a part of the surface of the first structural layer that has been formed on the first forming surface is set as a new first forming surface. Forming a new first structure layer on the formed first structure layer, thereby forming a plurality of laminated first structure layers, and
At least a part of a surface of a first structure layer located at the uppermost layer among the plurality of first structure layers is set as the second shaping surface, and the second structure layer is formed on the one first structure layer .
[Supplementary Note 104]
A shaping method includes:
Irradiating the first shaping surface with an energy beam to form a first structure layer; and
Irradiating a second shaping surface that is at least a part of a surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and
The energy transferred from the energy beam to the first shaping surface per unit area or unit time is different from the energy transferred from the energy beam to the second shaping surface per unit area or unit time. .
[Supplementary note 105]
The shaping method described in Supplementary Note 104, wherein the energy transferred to the first shaping surface per unit area or unit time is less than the energy transferred to the second shaping surface per unit area or unit time.
[Supplementary note 106]
A shaping method includes:
Irradiating the first shaping surface with an energy beam to form a first structure layer; and
Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structure layer, and forming at least one of directions along the surface of the first structure layer on the first structure layer A second structure layer having a different dimension in the direction from the first structure layer.
[Supplementary note 107]
The forming method described in Supplementary Note 106, wherein the size of the second structure layer is larger than that of the first structure layer in at least one of directions along a surface of the first structure layer.
[Supplementary Note 108]
A shaping method includes:
Irradiating the first forming surface with an energy beam to form a first molten pool, thereby forming a first structural layer; and
The second shaping surface is irradiated with the energy beam to form a second melting pool having a size different from that of the first melting pool in at least one of the directions along the surface of the first structure layer. A second structure layer is formed on the first structure layer.
[Supplementary note 109]
The forming method described in Supplementary Note 108, wherein the second molten pool is larger than the first molten pool.
[Supplementary note 110]
A shaping method includes:
Irradiating the first shaping surface with an energy beam to form a first structure layer; and
Irradiating a second shaping surface that is at least a part of a surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and
The resistance of the first structure layer to damage is made higher than the resistance of the second structure layer to damage.
[Supplementary note 111]
A shaping method includes:
Irradiating the first forming surface with an energy beam and supplying a first material to form a first structural layer; and
Irradiating the second beam forming surface that is at least a part of the surface of the first structure layer, and supplying a second material to form a second structure layer on the first structure layer; and
The bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface.
[Supplementary note 112]
The forming method described in any one of Supplementary Notes 104 to 111 further includes separating the second structural layer from the first forming surface.
[Supplementary note 113]
The forming method described in Supplementary Note 112, wherein separating the second structure layer includes separating the first structure layer by damaging the first structure layer or separating the first structure layer from the first forming surface. The two structural layers are separated from the first forming surface.
[Supplementary Note 114]
A shaping method includes:
Supplying material to at least the first forming surface and the second forming surface;
Irradiating the first shaping surface with the energy beam having a first beam characteristic, thereby melting the supplied material to form a first structural layer; and
Irradiating the second shaping surface that is at least a part of the surface of the first structural layer with the energy beam having a second beam characteristic different from the first beam characteristic, thereby causing the supplied The material is melted to form a second structure layer on the first structure layer.
[Supplementary note 115]
A shaping method includes:
Supplying material to at least the first forming surface and the second forming surface;
Irradiating the first shaping surface with the energy beam and supplying the material in a first supply form to form a first structure layer; and
Irradiating the energy beam onto the second shaping surface that is at least a part of the surface of the first structure layer, and supplying the material in a second supply form different from the first supply form, A second structure layer is formed on a structure layer.
[Supplementary note 116]
A shaping method includes:
Irradiating an energy beam on the forming surface;
Supply materials
Moving at least one of the first shaping surface and the irradiation position of the energy beam to change the relative positional relationship between the irradiation position of the energy beam and the shaping surface;
Irradiating the first shaping surface with the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form a first structure layer; and
Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structural layer, and causing the second shaping surface and the energy to be in a second moving form different from the first moving form At least one of the irradiation positions of the light beam moves, and a second structure layer is formed on the first structure layer.
[Supplementary note 117]
A shaping method includes:
Irradiate energy beam
Supply materials
Irradiating the first forming surface with the energy beam and supplying the material at a first supply amount per unit time or per unit area to form a first molten pool, thereby forming a first structural layer; and
Irradiating the second beam forming surface that is at least a part of the surface of the first structural layer, and supplying the energy beam at a second supply amount different from the first supply amount per unit time or per unit area. The material forms a second molten pool on the second forming surface, thereby forming a second structural layer on the first structural layer.
[Supplementary Note 118]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device performs the following by the shaping system Control the way of processing:
A process of irradiating the first shaping surface with the energy beam to form a first structure layer; and
A process of irradiating the second shaping surface that is at least a part of the surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and
In the control, the energy transferred from the energy beam to the first shaping surface per unit area or unit time is controlled to the second shaping surface from the energy beam to the second unit area or unit time. Shaped surfaces transfer different energies.
[Supplementary note 119]
A control device is a control device for controlling a shaping system. The shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material. Control the way of processing:
A process of irradiating the first shaping surface with the energy beam to form a first structure layer; and
A process of irradiating the second beam forming surface that is at least a part of the surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer, the second structure layer A dimension in at least one of the directions of the surface of the first structure layer is different from that of the first structure layer.
[Supplementary note 120]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
Processing of at least a first forming surface and a second forming surface; and
A process of irradiating the first shaping surface with the energy beam having a first beam characteristic, thereby melting the supplied material to form a first structural layer; and
In the controlling, the second shaping surface, which is at least a part of the surface of the first structural layer, is irradiated with the energy beam having a second beam characteristic different from the first beam characteristic, whereby The supplied material is melted to form a second structure layer on the first structure layer.
[Supplementary note 121]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
Processing of at least the first forming surface and the second forming surface;
A process of irradiating the first shaping surface with the energy beam and supplying the material in a first supply form to form a first structure layer; and
Irradiating the energy beam onto the second shaping surface that is at least a part of the surface of the first structure layer, and supplying the material in a second supply form different from the first supply form, A process of forming a second structure layer on a structure layer.
[Supplementary note 122]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
A process of irradiating the forming surface with the energy beam;
Handling of supplied materials;
A process of moving at least one of the first shaping surface and the irradiation position of the energy beam to change a relative positional relationship between the irradiation position of the energy beam and the shaping surface;
A process of irradiating the first shaping surface with the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form a first structure layer; and
Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structural layer, and causing the second shaping surface and the energy to be in a second moving form different from the first moving form A process of forming at least one of the irradiation positions of the light beam to form a second structure layer on the first structure layer.
[Supplementary note 123]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
A process of irradiating the first shaping surface with the energy beam to form a first molten pool, thereby forming a first structural layer; and
The second shaping surface is irradiated with the energy beam to form a second melting pool having a size different from that of the first melting pool in at least one of the directions along the surface of the first structure layer. A process of forming a second structure layer on the first structure layer.
[Supplementary note 124]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
A process of irradiating the first forming surface with the energy beam and supplying the material at a first supply amount per unit time or per unit area to form a first molten pool, thereby forming a first structural layer; and
Irradiating the second beam forming surface that is at least a part of the surface of the first structural layer, and supplying the energy beam at a second supply amount different from the first supply amount per unit time or per unit area. Material to form a second molten pool on the second forming surface, thereby forming a second structural layer on the first structural layer.
[Supplementary note 125]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
A process of irradiating the first shaping surface with the energy beam to form a first structure layer; and
A process of irradiating the second shaping surface that is at least a part of the surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and
The resistance of the first structure layer to damage is made higher than the resistance of the second structure layer to damage.
[Supplementary note 126]
A control device is a control device for controlling a shaping system, the shaping system includes an irradiation device for irradiating an energy beam, and a supply device for supplying a material, and the control device executes the following by the shaping system Control the way of processing:
A process of irradiating the first shaping surface with the energy beam and supplying a first material to form a first structural layer; and
A process of irradiating the second shaping surface that is at least a part of the surface of the first structure layer with the energy beam and supplying a second material to form a second structure layer on the first structure layer; and
The bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface.
[Supplementary note 127]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the first shaping surface with the energy beam to form a first structure layer;
A process of irradiating a second shaping surface that is at least a part of a surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and
In the control, the energy transferred from the energy beam to the first shaping surface per unit area or unit time is controlled to the second shaping surface from the energy beam to the second unit area or unit time. Different processing of the energy transferred by the shaping surface.
[Supplementary note 128]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the first shaping surface with the energy beam to form a first structure layer; and
A process of irradiating the second beam forming surface that is at least a part of the surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer, the second structure layer A dimension in at least one of the directions of the surface of the first structure layer is different from that of the first structure layer.
[Supplementary note 129]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
Processing of at least the first forming surface and the second forming surface;
A process of irradiating the first shaping surface with the energy beam having a first beam characteristic, thereby melting the supplied material to form a first structural layer; and
In the controlling, the second shaping surface, which is at least a part of the surface of the first structural layer, is irradiated with the energy beam having a second beam characteristic different from the first beam characteristic, whereby A process in which the supplied material is melted to form a second structure layer on the first structure layer.
[Supplementary note 130]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
Processing of at least the first forming surface and the second forming surface;
A process of irradiating the first shaping surface with the energy beam and supplying the material in a first supply form to form a first structure layer; and
Irradiating the energy beam onto the second shaping surface that is at least a part of the surface of the first structure layer, and supplying the material in a second supply form different from the first supply form, A process of forming a second structure layer on a structure layer.
[Supplementary note 131]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the forming surface with the energy beam;
Handling of supplied materials;
A process of moving at least one of the first shaping surface and the irradiation position of the energy beam to change a relative positional relationship between the irradiation position of the energy beam and the shaping surface;
A process of irradiating the first shaping surface with the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form a first structure layer; and
Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structural layer, and causing the second shaping surface and the energy to be in a second moving form different from the first moving form A process of forming at least one of the irradiation positions of the light beam to form a second structure layer on the first structure layer.
[Supplementary note 132]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the first shaping surface with the energy beam to form a first molten pool, thereby forming a first structural layer; and
The second shaping surface is irradiated with the energy beam to form a second melting pool having a size different from that of the first melting pool in at least one of the directions along the surface of the first structure layer. A process of forming a second structure layer on the first structure layer.
[Supplementary note 133]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the first forming surface with the energy beam and supplying the material at a first supply amount per unit time or per unit area to form a first molten pool, thereby forming a first structural layer; and
Irradiating the second beam forming surface that is at least a part of the surface of the first structural layer, and supplying the energy beam at a second supply amount different from the first supply amount per unit time or per unit area. Material to form a second molten pool on the second forming surface, thereby forming a second structural layer on the first structural layer.
[Supplementary note 134]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the first shaping surface with the energy beam to form a first structure layer;
A process of irradiating a second shaping surface that is at least a part of a surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and
A treatment for making the first structure layer more resistant to damage than the second structure layer being resistant to damage.
[Supplementary note 135]
A program is a program executed by a computer that controls a shaping system, the shaping system includes an irradiation device that irradiates an energy beam, and a supply device that supplies materials, and the program causes the computer to perform the following processing:
A process of irradiating the first shaping surface with the energy beam and supplying a first material to form a first structural layer; and
A process of irradiating the second shaping surface that is at least a part of the surface of the first structure layer with the energy beam and supplying a second material to form a second structure layer on the first structure layer; and
The bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface.
[Supplementary note 136]
A recording medium having recorded thereon a computer program as described in any one of Appendixes 127 to 135.

所述各實施方式的構成要件的至少一部分可與所述各實施方式的構成要件的至少另一部分適宜組合。亦可不使用所述各實施方式的構成要件中的一部分。另外,只要被法令容許,則援引所述各實施方式中所引用的所有公開公報及美國專利的揭示來作為本文的記載的一部分。At least a part of the constituent elements of the respective embodiments may be appropriately combined with at least another part of the constituent elements of the respective embodiments. It is not necessary to use a part of the constituent elements of each of the embodiments described above. In addition, as long as permitted by law, all publications and U.S. patents cited in the above-mentioned embodiments are cited as a part of the description herein.

本發明並不限定於所述實施例,可於不違反可自申請專利範圍及說明書整體領會的發明的主旨或思想的範圍內適宜變更,伴隨此種變更的造形系統、造形方法、控制裝置、電腦程式及記錄媒體亦是包含於本發明的技術範圍內者。The present invention is not limited to the embodiments described above, and may be appropriately modified within a range that does not violate the spirit or idea of the invention that can be appreciated from the scope of the patent application and the entire specification. The shaping system, shaping method, control device, Computer programs and recording media are also included in the technical scope of the present invention.

1‧‧‧造形系統1‧‧‧Shaping System

11‧‧‧造形頭 11‧‧‧Shaping head

12‧‧‧造形頭驅動系統 12‧‧‧Shaping head drive system

13‧‧‧平台 13‧‧‧platform

14‧‧‧控制裝置 14‧‧‧Control device

111‧‧‧照射系統 111‧‧‧ irradiation system

112‧‧‧材料噴嘴 112‧‧‧Material Nozzle

113‧‧‧射出部 113‧‧‧ Injection Department

114‧‧‧供給出口 114‧‧‧Supply export

EA‧‧‧照射區域 EA‧‧‧ Irradiated area

EL‧‧‧光 EL‧‧‧Light

FP‧‧‧聚焦位置 FP‧‧‧Focus position

M‧‧‧造形材料 M‧‧‧Shaping Materials

MA‧‧‧供給區域 MA‧‧‧ Supply Area

MP‧‧‧熔融池 MP‧‧‧ Molten Pool

MS‧‧‧造形面 MS‧‧‧Shaping Surface

R1‧‧‧第一尺寸 R1‧‧‧first size

R2‧‧‧第二尺寸 R2‧‧‧Second size

SL、SL#1~SL#10、SL_lowest、SL_lower、SL_upper、SL_upper1、SL_upper2、SL_upper'、SL_upper''、SL_exist‧‧‧結構層 SL, SL # 1 ~ SL # 10, SL_lowest, SL_lower, SL_upper, SL_upper1, SL_upper2, SL_upper ', SL_upper' ', SL_exist‧‧‧ Structure layer

ST‧‧‧三維結構物 ST‧‧‧Three-dimensional structure

ST1、ST2、ST3、ST4‧‧‧壁狀的結構物 ST1, ST2, ST3, ST4‧‧‧wall-like structures

W‧‧‧工件 W‧‧‧ Workpiece

WS‧‧‧表面 WS‧‧‧ surface

X、Y、Z‧‧‧方向 X, Y, Z‧‧‧ directions

圖1是表示本實施方式的造形系統的結構的剖面圖。FIG. 1 is a cross-sectional view showing a configuration of a forming system according to the present embodiment.

圖2(a)至圖2(c)的各圖分別是表示於工件上的某一區域中照射光且供給了造形材料時的情況的剖面圖。 Each of FIGS. 2 (a) to 2 (c) is a cross-sectional view showing a state where light is irradiated to a certain area on a workpiece and a molding material is supplied.

圖3(a)、圖3(c)及圖3(e)的各圖是表示形成三維結構物的過程的剖面圖,圖3(b)、圖3(d)及圖3(f)的各圖是表示形成三維結構物的過程的平面圖。 Each of FIGS. 3 (a), 3 (c), and 3 (e) is a cross-sectional view showing a process of forming a three-dimensional structure. FIGS. 3 (b), 3 (d), and 3 (f) Each figure is a plan view showing a process of forming a three-dimensional structure.

圖4(a)是表示用於形成最下層的結構層的熔融池的平面圖,圖4(b)是表示用於形成最下層的結構層以外的其他結構層的熔融池的平面圖。 FIG. 4 (a) is a plan view showing a molten pool used to form a lowermost structural layer, and FIG. 4 (b) is a plan view showing a molten pool used to form a structural layer other than the lowermost structural layer.

圖5是表示用於形成最下層的結構層的光的強度、及用於形成最下層的結構層以外的其他結構層的光的強度的圖表。 FIG. 5 is a graph showing the intensity of light for forming the lowermost structural layer and the intensity of light for other structural layers other than the lowermost structural layer.

圖6(a)是表示用於形成最下層的結構層的光的散焦量的剖面圖,圖6(b)是表示用於形成最下層的結構層以外的其他結構層的光的散焦量的剖面圖,圖6(c)是表示用於形成最下層的結構層的光的於造形面上的強度分佈的圖表,圖6(d)是表示用於形成最下層的結構層以外的其他結構層的光的於造形面上的強度分佈的圖表。 FIG. 6 (a) is a cross-sectional view showing the amount of defocus of light used to form the lowermost structural layer, and FIG. 6 (b) is a diagram showing the defocus of light of other structural layers other than the lowermost structural layer. Fig. 6 (c) is a graph showing the intensity distribution of light on the forming surface for forming the lowermost structural layer, and Fig. 6 (d) is a diagram showing the other than the lowermost structural layer. Graph of the intensity distribution of light on the forming surface of other structural layers.

圖7(a)是表示用於形成最下層的結構層的光的照射時間的時序圖,圖7(b)是表示用於形成最下層的結構層以外的其他結構層的光的照射時間的時序圖。 FIG. 7 (a) is a timing chart showing the irradiation time of light for forming the lowermost structural layer, and FIG. 7 (b) is a diagram showing the irradiation time of light for other structural layers other than the lowermost structural layer. Timing diagram.

圖8(a)是表示用於形成最下層的結構層的光的照射時間的時序圖,圖8(b)是表示用於形成最下層的結構層以外的其他結構層的光的照射時間的時序圖。 FIG. 8 (a) is a timing chart showing the irradiation time of light for forming the lowermost structural layer, and FIG. 8 (b) is a diagram showing the irradiation time of light for other structural layers other than the lowermost structural layer. Timing diagram.

圖9(a)是表示形成最下層的結構層時的造形材料的供給量及形成最下層的結構層以外的其他結構層時的造形材料的供給量的圖表,圖9(b)是於造形面上表示形成最下層的結構層時所供給的造形材料的剖面圖,圖9(c)是於造形面上表示形成最下層的結構層以外的其他結構層時所供給的造形材料的剖面圖。 FIG. 9 (a) is a graph showing the supply amount of the molding material when forming the lowest structural layer and the supply amount of the molding material when forming a structural layer other than the lowest structural layer. FIG. 9 (b) A cross-sectional view of the forming material supplied when the lowermost structural layer is formed is shown on the surface. FIG. 9 (c) is a cross-sectional view of the forming material supplied when the other structural layers other than the lowermost structural layer are formed on the forming surface. .

圖10(a)及圖10(b)的各圖是表示形成最下層的結構層的情況的剖面圖,圖10(c)及圖10(d)的各圖是表示形成最下層的結構層以外的其他結構層的情況的剖面圖。 Each of FIGS. 10 (a) and 10 (b) is a cross-sectional view showing a case where the lowermost structural layer is formed, and each of FIGS. 10 (c) and 10 (d) is a diagram showing the lowermost structural layer. A cross-sectional view of a case other than a structural layer.

圖11是表示形成最下層的結構層時的造形頭的移動速度及形成最下層的結構層以外的其他結構層時的造形頭的移動速度的圖表。 FIG. 11 is a graph showing the moving speed of the forming head when forming the lowermost structural layer and the moving speed of the forming head when forming other structural layers other than the lowermost structural layer.

圖12(a)至圖12(f)的各圖是表示藉由變更熔融池的尺寸來變更結構層的尺寸的第一特性變更動作的一步驟的剖面圖。 12 (a) to 12 (f) are cross-sectional views showing one step of a first characteristic changing operation for changing the size of a structural layer by changing the size of a molten pool.

圖13(a)至圖13(f)的各圖是表示藉由變更熔融池的尺寸來變更結構層的尺寸的第一特性變更動作的一步驟的剖面圖。 13 (a) to 13 (f) are cross-sectional views showing one step of a first characteristic changing operation of changing the size of the structural layer by changing the size of the molten pool.

圖14(a)是表示藉由包含第一特性變更動作的第二造形動作所形成的三維結構物的剖面圖,圖14(b)是表示藉由第一比較例的造形動作所形成的三維結構物的剖面圖,圖14(c)及圖14(d)的各圖是表示將藉由包含第一特性變更動作的第二造形動作所形成的三維結構物自工件W分離的情況的剖面圖。 14 (a) is a cross-sectional view showing a three-dimensional structure formed by a second forming operation including a first characteristic changing operation, and FIG. 14 (b) is a three-dimensional structure formed by a forming operation of a first comparative example 14 (c) and 14 (d) are cross-sectional views showing a case where a three-dimensional structure formed by a second shaping operation including a first characteristic changing operation is separated from the workpiece W Illustration.

圖15(a)是表示藉由包含第一特性變更動作的第二造形動作所形成的三維結構物的平面圖,圖15(b)及圖15(c)的各圖是表示藉由包含第一特性變更動作的第二造形動作所形成的三維結構物的剖面圖。 FIG. 15 (a) is a plan view showing a three-dimensional structure formed by a second shaping operation including a first characteristic changing operation, and each of FIGS. 15 (b) and 15 (c) is a view showing that A cross-sectional view of a three-dimensional structure formed by the second shaping operation of the characteristic changing operation.

圖16是表示用於形成最下層的結構層的光的強度、及用於形成最下層的結構層以外的其他結構層的光的強度的圖表。 FIG. 16 is a graph showing the intensity of light for forming the lowermost structural layer and the intensity of light for other structural layers other than the lowermost structural layer.

圖17是表示形成最下層的結構層時的造形材料的供給量、及形成最下層的結構層以外的其他結構層時的造形材料的供給量的圖表。 FIG. 17 is a graph showing a supply amount of a molding material when a lowermost structural layer is formed, and a supply amount of a molding material when a structural layer other than the lowermost structural layer is formed.

圖18(a)是表示藉由包含第二特性變更動作的第二造形動作所形成的三維結構物的平面圖,圖18(b)是表示將藉由包含第二特性變更動作的第二造形動作所形成的三維結構物自工件分離的情況的剖面圖。 FIG. 18 (a) is a plan view showing a three-dimensional structure formed by a second shaping operation including a second characteristic changing operation, and FIG. 18 (b) is a diagram showing a second shaping operation including a second characteristic changing operation A sectional view of a case where the formed three-dimensional structure is separated from a workpiece.

圖19(a)是表示用於形成最下層的結構層的造形材料的潤濕性的剖面圖,圖19(b)是表示用於形成最下層的結構層以外的其他結構層的造形材料的潤濕性的剖面圖。 FIG. 19 (a) is a cross-sectional view showing the wettability of a forming material used to form the lowermost structural layer, and FIG. 19 (b) is a drawing showing a forming material of other structural layers other than the lowermost structural layer Wetting profile.

圖20(a)是表示藉由包含第三特性變更動作的第二造形動作所形成的三維結構物的平面圖,圖20(b)是表示將藉由包含第三特性變更動作的第二造形動作所形成的三維結構物自工件分離的情況的剖面圖。 FIG. 20 (a) is a plan view showing a three-dimensional structure formed by a second shaping operation including a third characteristic changing operation, and FIG. 20 (b) is a diagram showing a second shaping operation including a third characteristic changing operation A sectional view of a case where the formed three-dimensional structure is separated from a workpiece.

圖21是表示第一變形例的三維結構物的剖面圖。 21 is a cross-sectional view showing a three-dimensional structure according to a first modification.

圖22(a)至圖22(d)的各圖是表示第二變形例的三維結構物的剖面圖。 22 (a) to 22 (d) are cross-sectional views showing a three-dimensional structure according to a second modification.

圖23(a)至圖23(c)的各圖是表示第三變形例的三維結構物的剖面圖。 23 (a) to 23 (c) are cross-sectional views showing a three-dimensional structure according to a third modification.

圖24(a)至圖24(c)的各圖是表示第四變形例的三維結構物的剖面圖。 Each of FIGS. 24 (a) to 24 (c) is a cross-sectional view showing a three-dimensional structure according to a fourth modification.

Claims (71)

一種造形系統,包括: 照射裝置,照射能量光束;以及 供給裝置,供給材料; 對第一造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層,且 於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。A shaping system includes: An irradiation device that irradiates an energy beam; and Supply device The first shaping surface is irradiated with the energy beam, thereby melting the supplied material to form a first structural layer, and irradiating a second shaping surface that is at least a part of a surface of the first structural layer. The energy beam, thereby melting the supplied material to form a second structure layer on the first structure layer, and The energy transferred from the energy beam to the first shaping surface per unit area or unit time is different from the energy transferred from the energy beam to the second shaping surface per unit area or unit time. 如申請專利範圍第1項所述的造形系統,其中 使於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量,較於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。The shaping system according to item 1 of the patent application scope, wherein The energy transferred from the energy beam to the first shaping surface per unit area or unit time is less than the energy transferred from the energy beam to the second shaping surface per unit area or unit time. . 如申請專利範圍第1項或第2項所述的造形系統,其中 沿著所述第一結構層的表面的方向中的至少一個方向上的所述第二結構層的尺寸,與所述至少一個方向上的所述第一結構層的尺寸不同。The shaping system as described in claim 1 or 2, The size of the second structure layer in at least one of the directions along the surface of the first structure layer is different from the size of the first structure layer in the at least one direction. 如申請專利範圍第1項至第3項中任一項所述的造形系統,其中 沿著所述第一結構層的表面的方向中的至少一個方向上的所述第二結構層的尺寸,較所述至少一個方向上的所述第一結構層的尺寸大。The shaping system according to any one of claims 1 to 3, wherein The size of the second structure layer in at least one of the directions along the surface of the first structure layer is larger than the size of the first structure layer in the at least one direction. 一種造形系統,包括: 照射裝置,照射能量光束;以及 供給裝置,供給材料; 對第一造形面照射所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,並對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,藉此使所述被供給的所述材料熔融,而於所述第一結構層上形成第二結構層,所述第二結構層沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一結構層不同。A shaping system includes: An irradiation device that irradiates an energy beam; and Supply device The first shaping surface is irradiated with the energy beam, thereby melting the supplied material to form a first structural layer, and irradiating a second shaping surface that is at least a part of a surface of the first structural layer. The energy beam, thereby melting the supplied material, and forming a second structure layer on the first structure layer, the second structure layer along a surface of the first structure layer A dimension in at least one of the directions is different from the first structure layer. 如申請專利範圍第5項所述的造形系統,其中 於沿著所述第一結構層的表面的方向中的至少一個方向上,所述第二結構層的尺寸較所述第一結構層大。The shaping system according to item 5 of the patent application scope, wherein In at least one of the directions along the surface of the first structure layer, the size of the second structure layer is larger than that of the first structure layer. 如申請專利範圍第3項至第6項中任一項所述的造形系統,其中 所述第一結構層及所述第二結構層具有朝於所述第一結構層的表面內與所述至少一個方向交叉的方向延長的形狀。The shaping system according to any one of claims 3 to 6 in the scope of patent application, wherein The first structure layer and the second structure layer have a shape extending toward a direction intersecting the at least one direction within a surface of the first structure layer. 如申請專利範圍第1項至第7項中任一項所述的造形系統,其中 於自所述第一結構層朝向所述第二結構層的方向上,所述第一結構層的尺寸與所述第二結構層的尺寸互不相同。The shaping system according to any one of claims 1 to 7, wherein In a direction from the first structure layer toward the second structure layer, a size of the first structure layer and a size of the second structure layer are different from each other. 如申請專利範圍第1項至第8項中任一項所述的造形系統,其照射具有第一光束特性的所述能量光束來形成所述第一結構層,且 照射具有與所述第一光束特性不同的第二光束特性的所述能量光束來形成所述第二結構層。The shaping system according to any one of claims 1 to 8 of the scope of patent application, which irradiates the energy beam having a first beam characteristic to form the first structure layer, and The second structure layer is formed by irradiating the energy beam having a second beam characteristic different from the first beam characteristic. 一種造形系統,包括: 照射裝置,照射能量光束;以及 供給裝置,供給材料; 對第一造形面照射具有第一光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而形成第一結構層,且 對作為所述第一結構層的表面的至少一部分的第二造形面照射具有與所述第一光束特性不同的第二光束特性的所述能量光束,藉此使所述被供給的所述材料熔融而於所述第一結構層上形成第二結構層。A shaping system includes: An irradiation device that irradiates an energy beam; and Supply device Irradiating the first shaping surface with the energy beam having a first beam characteristic, thereby melting the supplied material to form a first structural layer, and Irradiating the second shaping surface, which is at least a part of the surface of the first structural layer, with the energy beam having a second beam characteristic different from the first beam characteristic, thereby causing the supplied material The second structure layer is formed on the first structure layer by melting. 如申請專利範圍第9項或第10項所述的造形系統,其中 所述光束特性包含每單位面積的所述能量光束的強度或能量。The shaping system as described in claim 9 or 10, The beam characteristic includes the intensity or energy of the energy beam per unit area. 如申請專利範圍第11項所述的造形系統,其照射於每單位面積具有第一強度或第一能量的所述能量光束來形成所述第一結構層,且 照射於每單位面積具有與所述第一強度不同的第二強度或與所述第一能量不同的第二能量的所述能量光束來形成所述第二結構層。The shaping system according to item 11 of the scope of patent application, wherein the shaping beam is irradiated with the energy beam having a first intensity or a first energy per unit area to form the first structure layer, and The second structure layer is formed by irradiating the energy beam having a second intensity different from the first intensity or a second energy different from the first energy per unit area. 如申請專利範圍第12項所述的造形系統,其中 於每單位面積,所述第二強度較所述第一強度大。The shaping system according to item 12 of the patent application scope, wherein The second intensity is greater than the first intensity per unit area. 如申請專利範圍第12項或第13項所述的造形系統,其中 於每單位面積,所述第二能量較所述第一能量大。The shaping system as described in claim 12 or 13, The second energy is greater than the first energy per unit area. 如申請專利範圍第9項至第14項中任一項所述的造形系統,其中 所述光束特性包含所述能量光束的散焦量。The shaping system according to any one of claims 9 to 14, in which: The beam characteristic includes a defocus amount of the energy beam. 如申請專利範圍第9項至第15項中任一項所述的造形系統,其照射相對於所述第一造形面的散焦量被設定成第一設定量的所述能量光束來形成所述第一結構層,且 照射相對於所述第二造形面的散焦量被設定成與所述第一設定量不同的第二設定量的所述能量光束來形成所述第二結構層。The shaping system according to any one of claims 9 to 15 in the scope of patent application, which irradiates the energy beam whose defocus amount with respect to the first shaping surface is set to a first set amount to form the energy beam. Mentioned first structural layer, and The second structural layer is formed by irradiating the energy beam with a defocus amount set to a second set amount different from the first set amount with respect to the second shaping surface. 如申請專利範圍第16項所述的造形系統,其中 所述第二設定量較所述第一設定量小。The shaping system according to item 16 of the patent application scope, wherein The second set amount is smaller than the first set amount. 如申請專利範圍第9項至第17項中任一項所述的造形系統,其中 所述光束特性包含照射所述能量光束的照射時間。The shaping system according to any one of claims 9 to 17, wherein The beam characteristic includes an irradiation time for irradiating the energy beam. 如申請專利範圍第18項所述的造形系統,其於對所述第一造形面上的單位面積區域僅照射第一照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第一結構層,且 於對所述第二造形面上的單位面積區域僅照射與所述第一照射時間不同的第二照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第二結構層。The shaping system according to item 18 of the scope of application for a patent, wherein the unit area on the first shaping surface is irradiated with the energy beam only for a first irradiation time to form the energy beam. Mentioned first structural layer, and The second structure layer is formed by irradiating the energy beam in a state where the unit area on the second shaping surface is irradiated with the energy beam only for a second irradiation time different from the first irradiation time. . 如申請專利範圍第19項所述的造形系統,其中所述第二照射時間較所述第一照射時間長。The shaping system according to item 19 of the scope of patent application, wherein the second irradiation time is longer than the first irradiation time. 如申請專利範圍第18項至第20項中任一項所述的造形系統,其斷續地或呈脈衝狀地照射所述能量光束來形成所述第一結構層,且 連續地照射所述能量光束來形成所述第二結構層。The shaping system according to any one of claims 18 to 20 in the scope of the patent application, which irradiates the energy beam intermittently or pulsed to form the first structure layer, The energy beam is continuously irradiated to form the second structure layer. 如申請專利範圍第9項至第21項中任一項所述的造形系統,其中 以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量不同。The shaping system according to any one of claims 9 to 21 in the scope of patent application, wherein The first beam characteristic and the second beam characteristic are set as follows: the energy transferred from the energy beam having the first beam characteristic to the first shaping surface per unit area or unit time, It is different from the energy transmitted from the energy beam having the second beam characteristic to the second shaping surface per unit area or unit time. 如申請專利範圍第22項所述的造形系統,其中 以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量變得較於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量少。The shaping system as described in claim 22, wherein The first beam characteristic and the second beam characteristic are set in such a manner that the energy transferred from the energy beam having the first beam characteristic to the first shaping surface per unit area or unit time is changed. The energy transferred to the second shaping surface from the energy beam having the second beam characteristic per unit area or unit time is less. 如申請專利範圍第1項至第23項中任一項所述的造形系統,其中 所述供給裝置將材料供給至所述能量光束的照射位置。The shaping system according to any one of claims 1 to 23, wherein The supply device supplies a material to an irradiation position of the energy beam. 如申請專利範圍第1項至第24項中任一項所述的造形系統,其中 所述照射裝置對已由所述供給裝置供給的所述材料照射所述能量光束。The shaping system according to any one of claims 1 to 24, wherein The irradiation device irradiates the energy beam with the material that has been supplied by the supply device. 如申請專利範圍第1項至第25項中任一項所述的造形系統,其照射所述能量光束,且以第一供給形態供給所述材料來形成所述第一結構層, 照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料來形成所述第二結構層。The shaping system according to any one of claims 1 to 25 in the scope of patent application, which irradiates the energy beam and supplies the material in a first supply form to form the first structural layer, The second structural layer is formed by irradiating the energy beam and supplying the material in a second supply form different from the first supply form. 一種造形系統,包括: 照射裝置,照射能量光束;以及 供給裝置,供給材料; 對第一造形面照射所述能量光束,且以第一供給形態供給所述材料來形成第一結構層, 對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料而於所述第一結構層上形成第二結構層。A shaping system includes: An irradiation device that irradiates an energy beam; and Supply device Irradiating the first shaping surface with the energy beam, and supplying the material in a first supply form to form a first structural layer, Irradiating the energy beam onto a second shaping surface that is at least a part of the surface of the first structure layer, and supplying the material in a second supply form different from the first supply form to the first structure A second structural layer is formed on the layer. 如申請專利範圍第26項或第27項所述的造形系統,其中 所述供給形態包含每單位時間或每單位面積的所述材料的供給量。The shaping system as described in claim 26 or 27, The supply form includes a supply amount of the material per unit time or per unit area. 如申請專利範圍第26項或第27項所述的造形系統,其照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成所述第一結構層, 照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料來形成所述第二結構層。The shaping system according to item 26 or 27 of the scope of patent application, which irradiates the energy beam and supplies the material at a first supply amount per unit time or per unit area to form the first structure layer. , The energy beam is irradiated and the material is supplied at a second supply amount different from the first supply amount per unit time or per unit area to form the second structure layer. 如申請專利範圍第29項所述的造形系統,其中 所述第二供給量較所述第一供給量少。The shaping system as described in claim 29, wherein The second supply amount is smaller than the first supply amount. 如申請專利範圍第26項至第29項中任一項所述的造形系統,其中 所述供給形態包含所述材料的供給時序。The shaping system according to any one of claims 26 to 29, wherein The supply form includes a supply timing of the material. 如申請專利範圍第31項所述的造形系統,其將所述材料供給至所述第一造形面後照射所述能量光束來形成所述第一結構層,且 將所述材料局部地供給至所述第二造形面並照射所述能量光束來形成所述第二結構層。The shaping system according to item 31 of the scope of patent application, which supplies the material to the first shaping surface and irradiates the energy beam to form the first structure layer, and The material is locally supplied to the second shaping surface and irradiated with the energy beam to form the second structure layer. 如申請專利範圍第32項所述的造形系統,其將所述材料供給至所述第一造形面後不供給所述材料而照射所述能量光束來形成所述第一結構層。According to the forming system according to item 32 of the scope of application for a patent, after the material is supplied to the first forming surface, the energy beam is irradiated without supplying the material to form the first structural layer. 如申請專利範圍第32項或第33項所述的造形系統,其將所述材料供給至所述第一造形面後照射所述能量光束,而形成與所述第一造形面一體化的所述第一結構層。The forming system according to item 32 or 33 of the scope of application for a patent, which supplies the material to the first forming surface and irradiates the energy beam to form a unit integrated with the first forming surface. The first structural layer is described. 如申請專利範圍第26項至第34項中任一項所述的造形系統,其將所述材料的至少一部分用作遮蔽所述能量光束的遮蔽物。The shaping system according to any one of claims 26 to 34 in the scope of patent application, which uses at least a part of the material as a shield to shield the energy beam. 如申請專利範圍第26項至第35項中任一項所述的造形系統,其中 以如下方式設定所述第一供給形態及所述第二供給形態:當以所述第一供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與當以所述第二供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。The shaping system according to any one of claims 26 to 35 in the scope of patent application, wherein The first supply form and the second supply form are set in such a manner that, when the material is supplied in the first supply form, the first beam form is applied to the first beam from the energy beam per unit area or unit time. The energy transferred by the shaping surface is different from the energy transferred from the energy beam to the second shaping surface per unit area or unit time when the material is supplied in the second supply form. 如申請專利範圍第36項所述的造形系統,其中 以如下方式設定所述第一供給形態及所述第二供給形態:當以所述第一供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量變得較當以所述第二供給形態供給所述材料時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。The shaping system as described in claim 36, wherein The first supply form and the second supply form are set as follows: when the material is supplied in the first supply form, the first beam form The energy transferred by the shaping surface becomes less than the energy transferred from the energy beam to the second shaping surface per unit area or unit time when the material is supplied in the second supply form. 如申請專利範圍第1項至第37項中任一項所述的造形系統,更包括移動裝置,所述移動裝置使所述第一造形面、所述第二造形面及所述能量光束的照射位置中的至少一者移動,以變更所述第一造形面及所述第二造形面的至少一者與所述能量光束的照射位置的相對的位置關係, 照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成所述第一結構層, 照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動來形成所述第二結構層。The shaping system according to any one of claims 1 to 37 in the scope of the patent application, further comprising a moving device, which moves the first shaping surface, the second shaping surface, and the energy beam. Moving at least one of the irradiation positions to change the relative positional relationship between at least one of the first shaping surface and the second shaping surface and the irradiation position of the energy beam, Irradiating the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form the first structure layer, Irradiating the energy beam and moving at least one of the second shaping surface and the irradiation position of the energy beam in a second movement form different from the first movement form to form the second structure layer . 一種造形系統,包括: 照射裝置,對造形面照射能量光束; 供給裝置,供給材料;以及 移動裝置,使所述造形面及所述能量光束的照射位置中的至少一者移動,以變更所述能量光束的照射位置與所述造形面的相對的位置關係; 對第一造形面照射所述能量光束,且以第一移動形態使所述第一造形面及所述能量光束的照射位置中的至少一者移動來形成第一結構層, 對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且以與所述第一移動形態不同的第二移動形態使所述第二造形面及所述能量光束的照射位置中的至少一者移動,而於所述第一結構層上形成第二結構層。A shaping system includes: An irradiating device, which irradiates an energy beam on the forming surface; Supply device, supply material; and A moving device that moves at least one of the shaping surface and the irradiation position of the energy beam to change a relative positional relationship between the irradiation position of the energy beam and the shaping surface; Irradiating the first shaping surface with the energy beam, and moving at least one of the first shaping surface and the irradiation position of the energy beam in a first moving form to form a first structure layer, Irradiating the energy beam onto a second shaping surface that is at least a part of a surface of the first structural layer, and causing the second shaping surface and the energy to be in a second moving form different from the first moving form At least one of the irradiation positions of the light beam moves, and a second structure layer is formed on the first structure layer. 如申請專利範圍第38項或第39項所述的造形系統,其中 所述移動形態包含所述第一造形面、所述第二造形面及所述能量光束的照射位置中的至少一者的移動速度。The shaping system as described in claim 38 or 39, The moving form includes a moving speed of at least one of the first forming surface, the second forming surface, and an irradiation position of the energy beam. 如申請專利範圍第40項所述的造形系統,其照射所述能量光束,且以第一移動速度使所述第一造形面及所述能量光束的照射位置的至少一者移動來形成所述第一結構層, 照射所述能量光束,且以與所述第一移動速度不同的第二移動速度使所述第二造形面及所述能量光束的照射位置的至少一者移動來形成所述第二結構層。The shaping system according to item 40 of the patent application scope, wherein the energy beam is irradiated, and at least one of the first shaping surface and the irradiation position of the energy beam is moved at a first moving speed to form the First structural layer, The second structural layer is formed by irradiating the energy beam and moving at least one of the second shaping surface and the irradiation position of the energy beam at a second moving speed different from the first moving speed. 如申請專利範圍第41項所述的造形系統,其中 所述第二移動速度較所述第一移動速度慢。The shaping system according to item 41 of the patent application scope, wherein The second moving speed is slower than the first moving speed. 如申請專利範圍第38項至第42項中任一項所述的造形系統,其中 以如下方式設定所述第一移動形態及所述第二移動形態:當所述第一造形面及所述能量光束的照射位置的至少一者以所述第一移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量、與當所述第二造形面及所述能量光束的照射位置的至少一者以所述第二移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量不同。The shaping system according to any one of claims 38 to 42 in the scope of patent application, wherein The first movement form and the second movement form are set as follows: when at least one of the first shaping surface and the irradiation position of the energy beam moves in the first movement form, Area or energy transferred from the energy beam to the first shaping surface per unit time, and when at least one of the second shaping surface and the irradiation position of the energy beam moves in the second moving form The energy transmitted from the energy beam to the second shaping surface per unit area or unit time is different. 如申請專利範圍第43項所述的造形系統,其中 以如下方式設定所述第一移動形態及所述第二移動形態:當所述第一造形面及所述能量光束的照射位置的至少一者以所述第一移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第一造形面傳遞的能量變得較當所述第二造形面及所述能量光束的照射位置的至少一者以所述第二移動形態移動時,於每單位面積或每單位時間自所述能量光束對所述第二造形面傳遞的能量少。The shaping system according to item 43 of the patent application scope, wherein The first movement form and the second movement form are set as follows: when at least one of the first shaping surface and the irradiation position of the energy beam moves in the first movement form, The area or the energy transferred from the energy beam to the first shaping surface per unit time becomes more moved in at least one of the second shaping surface and the irradiation position of the energy beam in the second moving form. , The energy transferred from the energy beam to the second shaping surface per unit area or unit time is small. 如申請專利範圍第1項至第44項中任一項所述的造形系統,其對所述第一造形面照射所述能量光束而形成第一熔融池,藉此形成所述第一結構層,對所述第二造形面照射所述能量光束,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成所述第二結構層。According to the forming system according to any one of the scope of claims 1 to 44, the first forming surface is irradiated with the energy beam to form a first melting pool, thereby forming the first structural layer. Irradiating the energy beam onto the second shaping surface to form a second melting pool having a size different from that of the first melting pool in at least one of the directions along the surface of the first structural layer, Thereby, the second structure layer is formed on the first structure layer. 一種造形系統,包括: 照射裝置,照射能量光束;以及 供給裝置,供給材料; 藉由對第一造形面照射所述能量光束來使所述被供給的所述材料熔融而形成第一熔融池,藉此形成第一結構層, 藉由對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束來使所述被供給的所述材料熔融,而形成沿著所述第一結構層的表面的方向中的至少一個方向上的尺寸與所述第一熔融池不同的第二熔融池,藉此於所述第一結構層上形成第二結構層。A shaping system includes: An irradiation device that irradiates an energy beam; and Supply device Irradiating the energy beam onto the first shaping surface to melt the supplied material to form a first melting pool, thereby forming a first structural layer, Irradiating the energy beam onto a second shaping surface that is at least a part of the surface of the first structural layer to melt the supplied material, thereby forming a A second molten pool having a size different from that of the first molten pool in at least one of the directions, thereby forming a second structural layer on the first structural layer. 如申請專利範圍第45項或第46項所述的造形系統,其中 所述至少一個方向上的所述第二熔融池的尺寸較所述至少一個方向上的所述第一熔融池的尺寸大。The shaping system as described in claim 45 or 46, The size of the second melting pool in the at least one direction is larger than the size of the first melting pool in the at least one direction. 如申請專利範圍第45項至第47項中任一項所述的造形系統,其中 於形成所述第一結構層時,使所述第一熔融池朝所述第一造形面內的第一方向移動, 於形成所述第二結構層時,使所述第二熔融池朝所述第二造形面內的第二方向移動, 所述第一方向及所述第二方向相互平行,且 所述至少一個方向與所述第一方向及所述第二方向交叉。The shaping system according to any one of claims 45 to 47, wherein When forming the first structural layer, moving the first molten pool toward a first direction in the first forming surface, When forming the second structural layer, moving the second molten pool toward a second direction within the second forming surface, The first direction and the second direction are parallel to each other, and The at least one direction intersects the first direction and the second direction. 如申請專利範圍第45項至第48項中任一項所述的造形系統,其照射具有第一光束特性的所述能量光束來形成所述第一熔融池,且 照射具有與所述第一光束特性不同的第二光束特性的所述能量光束來形成所述第二熔融池。The shaping system according to any one of claims 45 to 48 in the scope of patent application, which irradiates the energy beam having a first beam characteristic to form the first molten pool, and The energy beam having a second beam characteristic different from the first beam characteristic is irradiated to form the second molten pool. 如申請專利範圍第49項所述的造形系統,其中 所述光束特性包含每單位面積的所述能量光束的強度或能量。The shaping system as described in claim 49, wherein The beam characteristic includes the intensity or energy of the energy beam per unit area. 如申請專利範圍第50項所述的造形系統,其照射於每單位面積具有第一強度或第一能量的所述能量光束來形成所述第一熔融池,且 照射於每單位面積具有與所述第一強度不同的第二強度或與所述第一能量不同的第二能量的所述能量光束來形成所述第二熔融池。The shaping system according to item 50 of the scope of patent application, which irradiates the energy beam having a first intensity or a first energy per unit area to form the first molten pool, and The second molten pool is formed by irradiating the energy beam having a second intensity different from the first intensity or a second energy different from the first energy per unit area. 如申請專利範圍第51項所述的造形系統,其中 每單位面積的所述第二強度較每單位面積的所述第一強度大。The shaping system according to item 51 of the scope of patent application, wherein The second intensity per unit area is greater than the first intensity per unit area. 如申請專利範圍第51項或第52項所述的造形系統,其中 每單位面積的所述第二能量較每單位面積的所述第一能量大。The shaping system as described in claim 51 or 52, The second energy per unit area is greater than the first energy per unit area. 如申請專利範圍第49項至第53項中任一項所述的造形系統,其中 所述光束特性包含所述能量光束的散焦量。The shaping system according to any one of claims 49 to 53 in the scope of patent application, wherein The beam characteristic includes a defocus amount of the energy beam. 如申請專利範圍第54項所述的造形系統,其照射相對於所述第一造形面的散焦量被設定成第一設定量的所述能量光束來形成所述第一熔融池,且 照射相對於所述第二造形面的散焦量被設定成與所述第一設定量不同的第二設定量的所述能量光束來形成所述第二熔融池。The shaping system according to item 54 of the scope of the patent application, which irradiates the energy beam whose defocus amount with respect to the first shaping surface is set to a first set amount to form the first molten pool, and The second molten pool is formed by irradiating the energy beam whose defocus amount with respect to the second shaping surface is set to a second set amount different from the first set amount. 如申請專利範圍第55項所述的造形系統,其中 所述第二設定量較所述第一設定量小。The shaping system as described in claim 55, wherein The second set amount is smaller than the first set amount. 如申請專利範圍第49項至第56項中任一項所述的造形系統,其中 所述光束特性包含照射所述能量光束的照射時間。The shaping system according to any one of claims 49 to 56 in the scope of patent application, wherein The beam characteristic includes an irradiation time for irradiating the energy beam. 如申請專利範圍第57項所述的造形系統,其於對所述第一造形面上的單位面積區域僅照射第一照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第一熔融池,且 於對所述第二造形面上的單位面積區域僅照射與所述第一照射時間不同的第二照射時間的所述能量光束的狀態下,照射所述能量光束來形成所述第二熔融池。The shaping system according to item 57 of the scope of patent application, in a state in which a unit area on the first shaping surface is irradiated with only the energy beam for a first irradiation time, irradiating the energy beam to form Mentioned first molten pool, and In a state where a unit area area on the second shaping surface is irradiated with the energy beam only for a second irradiation time different from the first irradiation time, the energy beam is irradiated to form the second molten pool. . 如申請專利範圍第58項所述的造形系統,其中 所述第二照射時間較所述第一照射時間長。The shaping system according to item 58 of the patent application, wherein The second irradiation time is longer than the first irradiation time. 如申請專利範圍第57項至第59項中任一項所述的造形系統,其斷續地或呈脈衝狀地照射所述能量光束來形成所述第一熔融池,且 連續地照射所述能量光束來形成所述第二熔融池。The shaping system according to any one of claims 57 to 59 in the scope of the patent application, which irradiates the energy beam intermittently or in pulses to form the first molten pool, and The energy beam is continuously irradiated to form the second molten pool. 如申請專利範圍第49項至第60項中任一項所述的造形系統,其中 以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量、與於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量不同。The shaping system according to any one of claims 49 to 60, wherein The first beam characteristic and the second beam characteristic are set as follows: the energy transferred from the energy beam having the first beam characteristic to the first shaping surface per unit area or unit time, It is different from the energy transmitted from the energy beam having the second beam characteristic to the second shaping surface per unit area or unit time. 如申請專利範圍第61項所述的造形系統,其中 以如下方式設定所述第一光束特性及所述第二光束特性:於每單位面積或每單位時間自具有所述第一光束特性的所述能量光束對所述第一造形面傳遞的能量變得較於每單位面積或每單位時間自具有所述第二光束特性的所述能量光束對所述第二造形面傳遞的能量少。The shaping system according to item 61 of the patent application, wherein The first beam characteristic and the second beam characteristic are set in such a manner that the energy transferred from the energy beam having the first beam characteristic to the first shaping surface per unit area or unit time is changed. The energy transferred to the second shaping surface from the energy beam having the second beam characteristic per unit area or unit time is less. 如申請專利範圍第45項至第62項中任一項所述的造形系統,其中 所述供給裝置將所述材料供給至所述能量光束的照射位置。The shaping system according to any one of claims 45 to 62 in the scope of patent application, wherein The supply device supplies the material to an irradiation position of the energy beam. 如申請專利範圍第45項至第63項中任一項所述的造形系統,其中 所述照射裝置對已由所述供給裝置供給的所述材料照射所述能量光束。The shaping system according to any one of claims 45 to 63, wherein The irradiation device irradiates the energy beam with the material that has been supplied by the supply device. 如申請專利範圍第45項至第64項中任一項所述的造形系統,其 照射所述能量光束,且以第一供給形態供給所述材料來形成所述第一熔融池, 照射所述能量光束,且以與所述第一供給形態不同的第二供給形態供給所述材料來形成所述第二熔融池。The shaping system according to any one of claims 45 to 64, Irradiating the energy beam and supplying the material in a first supply form to form the first molten pool, The second molten pool is formed by irradiating the energy beam and supplying the material in a second supply form different from the first supply form. 如申請專利範圍第65項所述的造形系統,其中 所述供給形態包含每單位時間或每單位面積的所述材料的供給量。The shaping system as described in claim 65, wherein The supply form includes a supply amount of the material per unit time or per unit area. 如申請專利範圍第66項所述的造形系統,其照射所述能量光束,且於每單位時間或每單位面積以第一供給量供給所述材料來形成所述第一熔融池, 照射所述能量光束,且於每單位時間或每單位面積以與所述第一供給量不同的第二供給量供給所述材料來形成所述第二熔融池。The shaping system according to item 66 of the scope of patent application, which irradiates the energy beam and supplies the material at a first supply amount per unit time or per unit area to form the first molten pool, The energy beam is irradiated, and the material is supplied at a second supply amount different from the first supply amount per unit time or per unit area to form the second molten pool. 一種造形方法,包括: 對第一造形面照射能量光束來形成第一結構層;以及 對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束而於所述第一結構層上形成第二結構層;且 使所述第一結構層對於破壞的抵抗力較所述第二結構層對於破壞的抵抗力高。A shaping method includes: Irradiating the first shaping surface with an energy beam to form a first structure layer; and Irradiating a second shaping surface that is at least a part of a surface of the first structure layer with the energy beam to form a second structure layer on the first structure layer; and The resistance of the first structure layer to damage is made higher than the resistance of the second structure layer to damage. 一種造形方法,包括: 對第一造形面照射能量光束,且供給第一材料來形成第一結構層;以及 對作為所述第一結構層的表面的至少一部分的第二造形面照射所述能量光束,且供給第二材料而於所述第一結構層上形成第二結構層;且 所述第一材料與所述第一造形面之間的結合力較所述第二材料與所述第一造形面之間的結合力弱。A shaping method includes: Irradiating the first forming surface with an energy beam and supplying a first material to form a first structural layer; and Irradiating the second beam forming surface that is at least a part of the surface of the first structure layer, and supplying a second material to form a second structure layer on the first structure layer; and The bonding force between the first material and the first shaping surface is weaker than the bonding force between the second material and the first shaping surface. 如申請專利範圍第68項或第69項所述的造形方法,更包括使所述第二結構層自所述第一造形面分離。The forming method according to item 68 or item 69 of the scope of patent application, further comprising separating the second structural layer from the first forming surface. 如申請專利範圍第70項所述的造形方法,其中 使所述第二結構層分離包括藉由破壞所述第一結構層或使所述第一結構層自所述第一造形面分離,而將所述第二結構層自所述第一造形面分開。The forming method according to the scope of application for patent 70, wherein Separating the second structure layer includes separating the second structure layer from the first shaping surface by damaging the first structure layer or separating the first structure layer from the first shaping surface. separate.
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