TW201943647A - 6H-type hexagonal barium germanium oxide, manufacture thereof, sintered body thereof, and target made of same - Google Patents

6H-type hexagonal barium germanium oxide, manufacture thereof, sintered body thereof, and target made of same Download PDF

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TW201943647A
TW201943647A TW108112845A TW108112845A TW201943647A TW 201943647 A TW201943647 A TW 201943647A TW 108112845 A TW108112845 A TW 108112845A TW 108112845 A TW108112845 A TW 108112845A TW 201943647 A TW201943647 A TW 201943647A
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germanium oxide
barium germanium
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遊佐斉
宮川仁
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國立研究開發法人物質 材料研究機構
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Abstract

Provided are barium germanium oxide having a band gap of 3 - 4 eV, a manufacturing method of the barium germanium oxide, a sintered body of the barium germanium oxide, and a target made of the sintered body. The barium germanium oxide of the present invention includes at least Ba, Ge, and O, and a crystal represented by a general formula of ABO3(Here, A includes at least Ba, and B includes at least Ge.), which has a 6H hexagonal perovskite structure.

Description

六方晶系6H型鋇鍺氧化物、其製造方法、燒結體、及靶材Hexagonal 6H-type barium germanium oxide, manufacturing method thereof, sintered body, and target material

本發明係關於一種鋇鍺氧化物、其製造方法、燒結體、及靶材,詳細而言,係關於一種六方晶系6H型鋇鍺氧化物、其製造方法、燒結體、及靶材。The present invention relates to a barium germanium oxide, a method for manufacturing the same, a sintered body, and a target, and in particular, it relates to a hexagonal 6H type barium germanium oxide, a method for manufacturing the same, a sintered body, and a target.

對於由智慧型手機或平板等所代表之攜帶型資訊終端之顯示器,正使用透明導電性物質。當前所使用之透明導電性物質係以氧化銦等稀有金屬為主成分,故而自資源方面而言要求探索代替物質。例如,Ba(鋇)或Si(矽)、或者與Si同族之Ge(鍺)等係資源方面豐富,較理想為開發使用該等元素之材料。Transparent displays are being used for displays of portable information terminals such as smart phones and tablets. The currently used transparent conductive materials are based on rare metals such as indium oxide, so it is necessary to explore alternative materials in terms of resources. For example, Ba (barium) or Si (silicon), or Ge (germanium) of the same family as Si are abundant in resources, and it is ideal to develop materials using these elements.

已開發出具有立方晶系、菱面對稱系9R型及六方晶系6H型鈣鈦礦結構之由BaSiO3 所表示之氧化物(例如,參照非專利文獻1及2)。根據非專利文獻1,可獲得立方晶系BaSiO3 ,然而其於大氣壓下非晶化,故而無法用作透明導電性物質。根據非專利文獻2,可獲得9R型及6H型BaSiO3 ,然而均於大氣壓下變為非晶,故而無法使用。An oxide represented by BaSiO 3 having a cubic crystal system, a rhombohedral symmetry 9R type, and a hexagonal 6H type perovskite structure has been developed (for example, refer to Non-Patent Documents 1 and 2). According to Non-Patent Document 1, cubic crystalline BaSiO 3 can be obtained. However, it is amorphous at atmospheric pressure and cannot be used as a transparent conductive material. According to Non-Patent Document 2, 9R-type and 6H-type BaSiO 3 can be obtained. However, both of them become amorphous at atmospheric pressure, so they cannot be used.

又,開發出具有六方晶系9H型及六方晶系4H型鈣鈦礦結構之由BaGeO3 所表示之氧化物(例如,參照非專利文獻3)。9H型BaGeO3 係藉由將具有假矽灰石結構之BaGeO3 於650℃~850℃之溫度範圍、9.5 GPa~12 GPa之範圍進行處理而合成。同樣地,4H型BaGeO3 係藉由將具有假矽灰石結構之BaGeO3 於950℃~1400℃之溫度範圍、9.5 GPa~12 GPa之範圍進行處理而合成。然而,關於該等之帶隙並無報告。又,斜方晶系之BaGeO3 雖可於常壓下獲得,然而其帶隙大至5.7 eV,因此認為無法用於透明導電性物質。
[先前技術文獻]
[非專利文獻]
Furthermore, an oxide represented by BaGeO 3 having a hexagonal 9H type and a hexagonal 4H type perovskite structure has been developed (for example, refer to Non-Patent Document 3). 9H-type 3-based BaGeO BaGeO by limestone structures having a 3 silicon prosthesis in a temperature range of 650 ℃ ~ 850 ℃, 9.5 GPa ~ 12 GPa range of processing and synthesis. Similarly, 4H-based type BaGeO 3 BaGeO by limestone structures having silicon at 950 ℃ ~ fake temperature in the range of 3 1400 ℃, 9.5 GPa ~ 12 GPa range of processing and synthesis. However, no report has been made on such band gaps. In addition, although BaGeO 3 of the orthorhombic system can be obtained under normal pressure, its band gap is as large as 5.7 eV, and therefore it is considered that it cannot be used for transparent conductive materials.
[Prior technical literature]
[Non-patent literature]

[非專利文獻1]H. Hiramatsu等,Inorg. Chem.,56,10535–10542,2017
[非專利文獻2]H. Yusa等,Am. Mineral.,92,648–654,2007
[非專利文獻3]Y. Shimizu等,High-Temperature-High Pressures,2,113–120,1970
[Non-Patent Document 1] H. Hiramatsu et al., Inorg. Chem., 56, 10535-10542, 2017
[Non-Patent Document 2] H. Yusa et al., Am. Mineral., 92, 648-654, 2007
[Non-Patent Document 3] Y. Shimizu et al., High-Temperature-High Pressures, 2, 113–120, 1970

[發明所欲解決之問題][Problems to be solved by the invention]

根據以上內容,本發明之問題在於提供一種具有4 eV以下之帶隙之鋇鍺氧化物、其製造方法、燒結體、及靶材。
[解決問題之技術手段]
Based on the foregoing, it is a problem of the present invention to provide a barium germanium oxide having a band gap of 4 eV or less, a method for producing the same, a sintered body, and a target.
[Technical means to solve the problem]

本發明之鋇鍺氧化物可至少含有Ba(鋇)、Ge(鍺)及O(氧),含有由通式ABO3 (其中,A至少含有Ba,B至少含有Ge)所表示之結晶,上述由ABO3 所表示之結晶具有六方晶系6H型鈣鈦礦結構。藉此,上述問題可解決。
上述由ABO3 所表示之結晶可具有空間群P63 /mmc之對稱性,且晶格常數a、b及c分別滿足以下之範圍:
a=0.56006±0.05(nm)
b=0.56006±0.05(nm)
c=1.3653±0.1(nm)。
本發明之鋇鍺氧化物可具有2.5 eV以上且4 eV以下之範圍之帶隙。
本發明之鋇鍺氧化物可具有2.5 eV以上且3.5 eV以下之範圍之帶隙。
上述A可進而含有選自由La(鑭)、Ce(鈰)、Pr(鐠)、Nd(釹)、Sm(釤)、Eu(銪)、Gd(釓)、Tb(鋱)、Dy(鏑)、Ho(鈥)、Er(鉺)、Tm(銩)、Yb(鐿)、Lu(鎦)、Y(釔)、Sc(鈧)、及In(銦)所組成之群中之元素。
上述A可於0.05莫耳%以上且15莫耳%以下之範圍內進而含有上述所選擇之元素。
上述B可進而含有Si。
本發明之製造鋇鍺氧化物之方法可包括下述步驟:將至少含有由具有斜方晶之BaGeO3 所表示之鋇鍺氧化物之原料粉末以900℃以上且2300℃以下之溫度範圍、7.5 GPa以上且45 GPa以下之壓力範圍進行處理。藉此,上述問題可解決。
上述進行處理之步驟可藉由使用選自由金剛石砧座裝置、多砧座裝置及帶型高壓裝置所組成之群中之至少1個裝置的高溫高壓處理法或衝擊壓縮法而進行。
上述進行處理之步驟可藉由使用金剛石砧座裝置或多砧座裝置之高溫高壓處理法而進行,上述壓力範圍於處理前為12 GPa以上且44 GPa以下之範圍,於處理後為7.5 GPa以上且40 GPa以下之範圍。上述壓力範圍可於處理前為12 GPa以上且24 GPa以下之範圍,於處理後為8.0 GPa以上且18.5 GPa以下之範圍。 上述溫度範圍可為1200℃以上且2000℃以下之範圍。
上述溫度範圍可為1300℃以上且1500℃以下之範圍,上述壓力範圍可於處理前為19.5 GPa以上且24 GPa以下之範圍,於處理後為12.5 GPa以上且16.5 GPa以下之範圍。
上述原料粉末可為具有100 nm以上且500 μm以下之粒徑之粉末。
上述進行處理之步驟可使上述原料粉末反應5分鐘以上且24小時以下之時間。
上述原料粉末可進而含有包含選自由Y、Sc、In、Si、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所組成之群中之至少1種元素的物質。
本發明可為一種燒結體,其包含如上述之鋇鍺氧化物。此種燒結體可解決如上述之問題。
本發明可為一種物理氣相沉積用靶材,其包含如上述之燒結體。藉由此種靶材,可解決上述問題。
[發明之效果]
The barium germanium oxide of the present invention may contain at least Ba (barium), Ge (germanium), and O (oxygen), and crystals represented by the general formula ABO 3 (where A contains at least Ba and B contains Ge at least). The crystal represented by ABO 3 has a hexagonal 6H type perovskite structure. With this, the above problems can be solved.
The above-mentioned crystal represented by ABO 3 may have the symmetry of the space group P6 3 / mmc, and the lattice constants a, b, and c respectively satisfy the following ranges:
a = 0.56006 ± 0.05 (nm)
b = 0.56006 ± 0.05 (nm)
c = 1.3653 ± 0.1 (nm).
The barium germanium oxide of the present invention may have a band gap in a range of 2.5 eV or more and 4 eV or less.
The barium germanium oxide of the present invention may have a band gap in a range of 2.5 eV or more and 3.5 eV or less.
The A may further contain a material selected from La (lanthanum), Ce (cerium), Pr ()), Nd (neodymium), Sm (钐), Eu (铕), Gd (釓), Tb (鋱), Dy (镝), Ho ('), Er (铒), Tm (銩), Yb (镱), Lu (镏), Y (yttrium), Sc (钪), and In (indium).
The A may further contain the selected element in a range of 0.05 mol% or more and 15 mol% or less.
The B may further contain Si.
The method for producing barium germanium oxide according to the present invention may include the following steps: a raw material powder containing at least barium germanium oxide represented by BaGeO 3 having an orthorhombic crystal in a temperature range of 900 ° C. to 2300 ° C., 7.5 It is processed in a pressure range above GPa and below 45 GPa. With this, the above problems can be solved.
The above-mentioned processing step may be performed by a high-temperature and high-pressure treatment method or an impact compression method using at least one device selected from the group consisting of a diamond anvil device, a multiple anvil device, and a belt-type high-voltage device.
The above-mentioned processing steps can be performed by a high-temperature and high-pressure processing method using a diamond anvil device or a multiple anvil device. The above-mentioned pressure range is in a range of 12 GPa to 44 GPa before processing, and 7.5 GPa or more after processing. And in the range of 40 GPa or less. The above-mentioned pressure range may be in a range of 12 GPa or more and 24 GPa or less before processing, and a range of 8.0 GPa or more and 18.5 GPa or less after processing. The temperature range may be in a range of 1200 ° C or higher and 2000 ° C or lower.
The above temperature range may be in a range of 1300 ° C to 1500 ° C, the above pressure range may be in a range of 19.5 GPa to 24 GPa before treatment, and 12.5 GPa to 16.5 GPa after treatment.
The raw material powder may be a powder having a particle diameter of 100 nm to 500 μm.
The processing step described above allows the raw material powder to react for a period of 5 minutes to 24 hours.
The raw material powder may further contain a material selected from the group consisting of Y, Sc, In, Si, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu. Substance of at least 1 element.
The present invention may be a sintered body comprising the barium germanium oxide as described above. Such a sintered body can solve the problems as described above.
The present invention may be a target for physical vapor deposition, which includes the sintered body as described above. With such a target, the above problems can be solved.
[Effect of the invention]

如上述之鋇鍺氧化物可具有六方晶系6H型鈣鈦礦結構。如此,結晶之對稱性下降,可將帶隙降低至4 eV以下。此種鋇鍺氧化物藉由摻雜劑或缺陷控制可成為透明導電性物質。The above-mentioned barium germanium oxide may have a hexagonal 6H type perovskite structure. In this way, the symmetry of the crystal is reduced, and the band gap can be reduced below 4 eV. Such barium germanium oxide can be made into a transparent conductive substance by dopant or defect control.

如上述之鋇鍺氧化物之製造方法可包括下述步驟:將含有由具有斜方晶之BaGeO3 所表示之鋇鍺氧化物之原料粉末以900℃以上且2300℃以下之溫度範圍、7.5 GPa以上且45 GPa以下之壓力範圍進行熱處理。如此,所得之產物於一個大氣壓下其結晶結構亦不易破壞,可成為穩定之鋇鍺氧化物。The method for manufacturing barium germanium oxide as described above may include the following steps: a raw material powder containing barium germanium oxide represented by BaGeO 3 having an orthorhombic crystal, at a temperature range of 900 ° C to 2300 ° C, 7.5 GPa The heat treatment is performed in a pressure range above 45 GPa. In this way, the crystal structure of the obtained product is not easily destroyed under one atmospheric pressure, and it can become a stable barium germanium oxide.

以下,一面參照圖式一面對本發明之實施形態進行說明。再者,對相同要素附以相同編號,省略其說明。Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, the same elements are assigned the same reference numerals, and descriptions thereof are omitted.

於本發明之實施例中,對具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物、及其製造方法進行說明。In an embodiment of the present invention, a barium germanium oxide having a hexagonal 6H type perovskite structure and a method for manufacturing the same are described.

圖1係於本發明之實施例中表示鋇鍺氧化物之結晶結構之模式圖。FIG. 1 is a schematic view showing a crystal structure of barium germanium oxide in an embodiment of the present invention.

於本發明之實施例中,鋇鍺氧化物可至少含有Ba(鋇)、Ge(鍺)及O(氧),可由通式ABO3 (其中,A元素至少含有Ba,B元素至少含有Ge)所表示。進而,關於本發明之實施例,於鋇鍺氧化物中,由ABO3 所表示之結晶可具有六方晶系6H型鈣鈦礦結構。再者,於本案說明書中,「ABO3 」中之氧可包含氧過剩或者氧空位之狀態,於本說明書中可如此解釋。In the embodiment of the present invention, the barium germanium oxide may contain at least Ba (barium), Ge (germanium), and O (oxygen), and may be represented by the general formula ABO 3 (where the element A contains at least Ba and the element B contains at least Ge) Indicated. Furthermore, regarding the embodiment of the present invention, in the barium germanium oxide, the crystal represented by ABO 3 may have a hexagonal 6H type perovskite structure. Furthermore, in the description of this case, the oxygen in "ABO 3 " may include a state of excess oxygen or oxygen vacancies, which can be explained in this specification.

本案之發明人等發現具有與既有之鋇鍺氧化物之結晶結構不同之六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。藉此,成功地降低了結晶之對稱性。其結果為,於本發明之實施例中,發現鋇鍺氧化物之帶隙為4 eV以下。The inventors of the present case found a barium germanium oxide having a hexagonal system 6H type perovskite structure different from the existing crystal structure of barium germanium oxide. As a result, the symmetry of the crystal was successfully reduced. As a result, in the examples of the present invention, the band gap of the barium germanium oxide was found to be 4 eV or less.

此處,本發明人等所合成之6H型BaGeO3 係上述之由ABO3 所表示之結晶中所有A元素為Ba、所有B元素為Ge之結晶,根據對6H型BaGeO3 進行之結晶結構解析,6H型BaGeO3 係屬於六方晶系,且屬於P63 /mmc空間群(國際結晶學表(International Talbes for Crystallography)之第194號空間群)。表1中表示結晶參數及原子座標位置。具有此種結晶參數之6H型BaGeO3 於本發明人等所知之範圍內,以前未有報告。Here, the 6H-type BaGeO 3 synthesized by the present inventors is a crystal in which all the A elements are Ba and all the B elements are Ge in the above-mentioned crystal represented by ABO 3. According to the crystal structure analysis of the 6H-type BaGeO 3 The 6H type BaGeO 3 system belongs to the hexagonal crystal system and belongs to the P6 3 / mmc space group (Space Group 194 of International Talbes for Crystallography). Table 1 shows the crystal parameters and atomic coordinate positions. The 6H-type BaGeO 3 having such a crystallization parameter is within a range known to the present inventors, and has not been reported before.

[表1]
[Table 1]

於表1中,晶格常數a、b及c表示單位晶格之軸之長度,α、β、γ表示單位晶格之軸間之角度。原子座標表示單位晶格中之各原子之位置。In Table 1, the lattice constants a, b, and c represent the length of the axis of the unit lattice, and α, β, and γ represent the angles between the axes of the unit lattice. Atomic coordinates indicate the position of each atom in the unit lattice.

獲得了以下之解析結果,即,於該結晶中,存在Ba、Ge及O之各原子,Ba於2種位點(Ba1~Ba2)存在,Ge於2種位點(Ge1~Ge2)存在,O於2種位點(O1~O2)存在。使用表1之資料進行解析之結果得知,6H型BaGeO3 具有圖1所示之結構,具有藉由Ge與O之鍵結而構成之4面體相連而得之骨架中含有Ba之結構。The following analytical results were obtained. In the crystal, each atom of Ba, Ge, and O is present, Ba is present at two kinds of sites (Ba1 to Ba2), and Ge is present at two kinds of sites (Ge1 to Ge2). O exists in two kinds of sites (O1-O2). As a result of analysis using the data in Table 1, it is known that 6H-type BaGeO 3 has a structure shown in FIG. 1 and has a structure containing Ba in a tetrahedron formed by a bond between Ge and O.

作為具有與所合成之6H型BaGeO3 相同之結晶結構之結晶,存在如上述由ABO3 所表示之結晶(A元素除Ba以外可進而含有選自由La(鑭)、Ce(鈰)、Pr(鐠)、Nd(釹)、Sm(釤)、Eu(銪)、Gd(釓)、Tb(鋱)、Dy(鏑)、Ho(鈥)、Er(鉺)、Tm(銩)、Yb(鐿)、Lu(鎦)、Y(釔)、Sc(鈧)、及In(銦)所組成之群中之至少1種元素。B元素除Ge以外可進而含有Si)。藉由如此含有除Ba及Ge以外之種類之元素,晶格常數可變化。此種結晶結構、由原子所占之位點及其座標所賦予之原子位置本質上不變者亦可作為本發明之實施例中之鋇鍺氧化物。即便晶格常數變化但未發生骨架原子間之化學鍵斷裂般之大幅變化者亦可作為本發明之實施例中之鋇鍺氧化物。於本發明之實施例中,於由對成為對象之物質之X射線繞射或中子繞射之結果以P63 /mmc之空間群進行里特沃爾德解析而求出之晶格常數及原子座標所計算出之Ge-O及Ge-Ba之化學鍵(鄰近原子間距離)之長度,與由表1所示之結晶之晶格常數及原子座標而計算出之值相比為±5%以內之情形時,可判定為相同之結晶結構。若化學鍵之長度超過±5%,則化學鍵斷裂而可能成為其他結晶。作為其他簡易之判定方法,亦可根據將6H型BaGeO3 之X射線繞射之主峰(例如,繞射強度較強之10條左右)與成為對象之物質之主峰比較而實質上一致之情況,而判定為相同之結晶結構。As the crystal having the same crystal structure as the synthesized 6H-type BaGeO 3 , there is a crystal represented by ABO 3 as described above (the element A may contain, in addition to Ba, a member selected from La (lanthanum), Ce (cerium), Pr (鐠), Nd (neodymium), Sm (钐), Eu (铕), Gd (釓), Tb (鋱), Dy (镝), Ho ('), Er (铒), Tm (銩), Yb ( (Ii) at least one element in the group consisting of Lu (镏), Y (yttrium), Sc (钪), and In (indium. Element B may contain Si in addition to Ge). By containing such elements other than Ba and Ge, the lattice constant can be changed. Those crystal structures, the positions occupied by the atoms, and the atomic positions given by their coordinates are essentially unchanged, and can also be used as the barium germanium oxide in the embodiment of the present invention. Even if the lattice constant is changed, but the chemical bond between skeleton atoms does not change greatly, it can also be used as the barium germanium oxide in the embodiment of the present invention. In the embodiment of the present invention, the lattice constants obtained by performing Rietwald analysis on the space group of P6 3 / mmc from the results of X-ray diffraction or neutron diffraction of the target substance and The length of the chemical bond (distance between adjacent atoms) of Ge-O and Ge-Ba calculated from the atomic coordinates is ± 5% compared to the value calculated from the crystal lattice constants and atomic coordinates shown in Table 1. In the cases below, the same crystal structure can be determined. If the length of the chemical bond exceeds ± 5%, the chemical bond is broken and may become other crystals. As another simple determination method, the main peak of the X-ray diffraction of 6H-type BaGeO 3 (for example, about 10 diffraction intensities) can be compared with the main peak of the target substance to substantially coincide, It was determined that the crystal structure was the same.

尤其可包含於A元素之La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Y、Sc及In均可作為摻雜劑發揮功能。該等或許可實現載子控制,故於本發明之實施例中,或許有利於將鋇鍺氧化物作為透明導電性材料。該等摻雜劑係可容許維持結晶結構之範圍內之摻雜量。例示而言,摻雜量可為A元素位點之0.05莫耳%以上且15莫耳%以下之範圍,較佳可為0.05莫耳%以上且10莫耳%以下之範圍。又,例如可為0.01莫耳%以上或0.05莫耳%以上,亦可為15莫耳%以下或10莫耳%以下。In particular, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Y, Sc, and In, which can be contained in the A element, can all function as dopants. These may allow carrier control, so in the embodiment of the present invention, it may be advantageous to use barium germanium oxide as a transparent conductive material. These dopants are dopants within a range that allows the crystalline structure to be maintained. For example, the doping amount may be in a range of 0.05 mol% to 15 mol%, and preferably in a range of 0.05 mol% to 10 mol%. For example, it may be 0.01 mol% or more or 0.05 mol% or more, and may be 15 mol% or less or 10 mol% or less.

又,亦可藉由氧空位進行載子摻雜。藉此,可作為透明導電體材料發揮功能。該空位量可為0.05%以上且10%以下之範圍。再者,空位量可藉由乾燥氧氣氛圍中之熱天平(TG)測定而測定。Carrier doping can also be performed by oxygen vacancies. Thereby, it can function as a transparent conductor material. The vacancy amount may be in a range of 0.05% to 10%. Furthermore, the amount of vacancies can be measured by a thermal balance (TG) measurement in a dry oxygen atmosphere.

進而,由ABO3 所表示之結晶可具有空間群P63 /mmc之對稱性。又,晶格常數a、b及c較佳為可分別滿足以下之範圍:
a=0.56006±0.05(nm)
b=0.56006±0.05(nm)
c=1.3653±0.1(nm)。
藉此,結晶可變得特別穩定。又,亦可降低帶隙。
Furthermore, the crystal represented by ABO 3 may have the symmetry of the space group P6 3 / mmc. In addition, the lattice constants a, b, and c preferably satisfy the following ranges:
a = 0.56006 ± 0.05 (nm)
b = 0.56006 ± 0.05 (nm)
c = 1.3653 ± 0.1 (nm).
Thereby, crystallization can become particularly stable. Also, the band gap can be reduced.

於本發明之實施例中,鋇鍺氧化物可包含由上述之ABO3 所表示之結晶。又,可具有2.5 eV以上且4 eV以下之範圍之帶隙。更詳細而言,於本發明之實施例中,鋇鍺氧化物於A元素為Ba且B元素為Ge之情形時,可具有2.5 eV以上且3.5 eV以下之範圍之帶隙。若具有此種帶隙,則於本發明之實施例中,可將鋇鍺氧化物用作透明導電性材料。進而藉由組成之調整,可具有2.9 eV以上且3.3 eV以下之範圍之帶隙。In an embodiment of the present invention, the barium germanium oxide may include a crystal represented by the above-mentioned ABO 3 . In addition, it may have a band gap in a range of 2.5 eV or more and 4 eV or less. More specifically, in the embodiment of the present invention, the barium germanium oxide may have a band gap in a range of 2.5 eV or more and 3.5 eV or less when the element A is Ba and the element B is Ge. With such a band gap, in an embodiment of the present invention, barium germanium oxide can be used as a transparent conductive material. Furthermore, by adjusting the composition, it is possible to have a band gap in a range of 2.9 eV or more and 3.3 eV or less.

其次,於本發明之實施例中,對製造鋇鍺氧化物之例示性方法進行說明。
圖2係於本發明之實施例中對製造鋇鍺氧化物之過程進行說明之圖。
Next, in an embodiment of the present invention, an exemplary method for manufacturing barium germanium oxide will be described.
FIG. 2 is a diagram illustrating a process of manufacturing barium germanium oxide in an embodiment of the present invention.

於本發明之實施例中,可例示:使用至少含有由具有斜方晶之BaGeO3 所表示之鋇鍺氧化物之原料粉末作為原料粉末之製造方法。一般而言,具有斜方晶之BaGeO3 係於大氣壓下煅燒之鋇鍺氧化物,係可獲取之鋇鍺氧化物。自此種觀點而言,有時稱為常壓相BaGeO3 。本案發明人等發現,藉由將至少含有常壓相BaGeO3 之原料粉末以900℃以上且2300℃以下之溫度範圍、7.5 GPa以上且45 GPa以下之壓力範圍進行高溫高壓處理(以下僅稱為處理),可製造上述之具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。於未達900℃之溫度及未達7.5 GPa之壓力下,易成為低壓型鋇鍺氧化物。於高於2300℃之溫度及高於45 GPa之壓力下,所得之鋇鍺氧化物若將產物於常溫下置於一個大氣壓下,則容易成為非晶。再者,於本說明書中,所謂低壓型鋇鍺氧化物,可意指結構中包含作為四配位之GeO4 之氧化物之情況。例如,BaGe2 O5 與Ba3 GeO4 之複相亦可包含於此種氧化物。In the embodiment of the present invention, a manufacturing method using a raw material powder containing at least a barium germanium oxide represented by BaGeO 3 having an orthorhombic crystal as an raw material powder can be exemplified. Generally speaking, BaGeO 3 with orthorhombic crystals is barium germanium oxide calcined at atmospheric pressure, which is an available barium germanium oxide. From this viewpoint, it is sometimes referred to as the normal-pressure phase BaGeO 3 . The inventors of the present case have found that high-temperature and high-pressure treatment is performed by using raw material powders containing at least the atmospheric pressure phase BaGeO 3 in a temperature range of 900 ° C. to 2300 ° C. and a pressure range of 7.5 GPa to 45 GPa (hereinafter referred to as simply Treatment) to produce the above-mentioned barium germanium oxide having a hexagonal 6H type perovskite structure. At a temperature of less than 900 ° C and a pressure of less than 7.5 GPa, it is easy to become a low-pressure barium germanium oxide. At a temperature higher than 2300 ° C and a pressure higher than 45 GPa, if the obtained barium germanium oxide is placed at an atmospheric pressure at normal temperature, it will easily become amorphous. In addition, in the present specification, the low-pressure type barium germanium oxide may mean a case where the structure includes an oxide of GeO 4 as a tetracoordination. For example, a complex phase of BaGe 2 O 5 and Ba 3 GeO 4 may also be included in this oxide.

此處,對上述之非專利文獻3中所記載之4H型BaGeO3 之製造方法與本發明之實施例中之製造方法之不同點進行敍述。於非專利文獻3中,使用具有假矽灰石結構之BaGeO3 作為原料,然而本案發明人等使用常壓相BaGeO3 作為原料,於此方面不同。本案發明人等發現,藉由使用常壓相BaGeO3 且滿足上述之條件,即便於常溫下於一個大氣壓下,產物之結晶結構亦不發生破壞。如此,發現可製造穩定地具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。Here, the differences between the manufacturing method of the 4H-type BaGeO 3 described in the aforementioned Non-Patent Document 3 and the manufacturing method in the embodiment of the present invention will be described. In Non-Patent Document 3, BaGeO 3 having a pseudo wollastonite structure is used as a raw material. However, the present inventors and others use a normal-pressure phase BaGeO 3 as a raw material, which is different in this respect. The inventors of the present case found that by using the atmospheric phase BaGeO 3 and satisfying the above-mentioned conditions, the crystal structure of the product is not destroyed even at an atmospheric pressure at normal temperature. In this way, it was found that a barium germanium oxide having a hexagonal 6H type perovskite structure can be manufactured stably.

再者,原料粉末較佳為具有100 nm以上且500 μm以下之粒徑之粉末。藉此,可進一步促進反應。較佳可為具有200 nm以上且200 μm以下之粒徑之粉末。再者,於本案說明書中,粒徑係設為藉由Microtrac或雷射散射法而測定之體積基準之中值徑(d50)。The raw material powder is preferably a powder having a particle diameter of 100 nm to 500 μm. This can further promote the reaction. A powder having a particle diameter of 200 nm to 200 μm is preferred. In addition, in this specification, a particle diameter is a volume-based median diameter (d50) measured by a Microtrac or laser scattering method.

原料粉末可進而含有包含選自由Y、Sc、In、Si、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所組成之群中之至少1種元素的物質。藉此,可獲得由ABO3 所表示之結晶(A元素除Ba以外可進而含有選自由La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Y、Sc及In所組成之群中之至少1種元素。B元素除Ge以外可進而含有Si)。再者,所添加之量可為可維持與表1所示之結晶結構相同之結晶結構之範圍內。例如,於添加Si之情形時,可使用常壓相BaSiO3 及/或Si金屬作為含有Si之物質。The raw material powder may further contain at least one selected from the group consisting of Y, Sc, In, Si, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu. 1 elemental substance. Thereby, a crystal represented by ABO 3 can be obtained (the element A may contain, in addition to Ba, selected from La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu At least one element in the group consisting of Y, Y, Sc, and In. The B element may further include Si in addition to Ge). In addition, the amount added may be within a range that can maintain the same crystal structure as the crystal structure shown in Table 1. For example, in the case of adding Si, a normal pressure phase BaSiO 3 and / or Si metal may be used as the Si-containing substance.

包含選自由Y、Sc、In、Si、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所組成之群中之至少1種元素之物質可為該等之金屬單質、氧化物、碳酸鹽等。進而,亦可除該等添加物質以外,為了調整組成而添加氧化鍺粉末。A substance containing at least one element selected from the group consisting of Y, Sc, In, Si, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu These can be such simple metals, oxides, carbonates, and the like. Furthermore, in addition to these additive substances, germanium oxide powder may be added in order to adjust the composition.

再者,高溫高壓處理之時間係根據原料之量或所用之裝置而不同,例示而言,可為5分鐘以上且24小時以下之時間。The time for the high-temperature and high-pressure treatment varies depending on the amount of raw materials or the equipment used. For example, the time may be 5 minutes to 24 hours.

上述之處理步驟例如可藉由使用選自由金剛石砧座裝置、多砧座裝置及帶型高壓裝置所組成之群中之至少1種裝置的高溫高壓處理法或衝擊壓縮法而進行。該等方法可達成上述之溫度範圍及壓力範圍。利用可達成上述之高溫及高壓條件之裝置即可。再者,無需限定於上述之裝置。The above-mentioned processing steps can be performed, for example, by a high-temperature and high-pressure treatment method or an impact compression method using at least one device selected from the group consisting of a diamond anvil device, a multiple anvil device, and a belt-type high-pressure device. These methods can achieve the above-mentioned temperature range and pressure range. It is sufficient to use a device capable of achieving the above-mentioned high temperature and high pressure conditions. Furthermore, it is not necessary to be limited to the above-mentioned device.

此處,對藉由將原料粉末填充於金剛石砧座單元之金剛石砧座裝置進行處理之情形加以說明。Here, a case where processing is performed by a diamond anvil device in which a raw material powder is filled in a diamond anvil unit will be described.

圖3係表示具備金剛石砧座單元之金剛石砧座裝置之整體的模式圖。
圖4係表示圖3之金剛石砧座裝置之細節的模式圖。
FIG. 3 is a schematic view showing an entire diamond anvil device including a diamond anvil unit.
FIG. 4 is a schematic view showing details of the diamond anvil device of FIG. 3.

金剛石砧座裝置可使用既有者,如圖3所示,將以底面變得平坦之方式經研磨之金剛石以使底面對向之狀態設置,對該底面施加壓力。如圖4所示,藉由墊及金剛石保持含有常壓相BaGeO3 之原料粉末。As the diamond anvil device, an existing one can be used. As shown in FIG. 3, the ground diamond is polished so that the bottom surface becomes flat so that the bottom surface faces the surface, and pressure is applied to the bottom surface. As shown in FIG. 4, a raw powder containing BaGeO 3 at a normal pressure phase is held by a pad and diamond.

接著,對金剛石砧座裝置施加上述之壓力,將光纖雷射等雷射光束照射於原料粉末即可。加熱溫度可由色溫判斷,雷射之照射時間可於溫度成為一定後為數分鐘~數十分鐘等。Then, the above-mentioned pressure is applied to the diamond anvil device, and a laser beam such as an optical fiber laser may be irradiated to the raw material powder. The heating temperature can be judged by the color temperature, and the laser irradiation time can be several minutes to tens of minutes after the temperature becomes constant.

於藉由使用圖3或圖4所示之金剛石砧座裝置或多砧座裝置之高溫高壓處理法進行上述之處理之情形時,較佳為壓力範圍可於處理前為12 GPa以上且44 GPa以下之範圍,於處理後滿足7.5 GPa以上且40 GPa以下之範圍。於本發明之實施例中,已知加熱前(處理前)之壓力與加熱後(處理後)之壓力可大不相同,藉由以該等壓力分別滿足上述之範圍之方式進行調整,可製造上述之具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。進而較佳為壓力範圍於處理前可為12 GPa以上且24 GPa以下之範圍,於處理後可滿足8 GPa以上且18.5 GPa以下之範圍。可以加熱前之壓力與加熱後之壓力分別滿足上述之範圍之方式進行調整。如此,可以單相製造上述之具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。In the case where the above-mentioned treatment is performed by the high-temperature and high-pressure treatment method using the diamond anvil device or the multiple anvil device shown in FIG. 3 or FIG. 4, it is preferable that the pressure range can be 12 GPa or more and 44 GPa before the treatment. The following range satisfies the range of 7.5 GPa to 40 GPa after the treatment. In the embodiment of the present invention, it is known that the pressure before heating (before processing) and the pressure after heating (after processing) can be quite different. By adjusting the pressures so that they respectively meet the above-mentioned ranges, it can be manufactured. The above-mentioned barium germanium oxide having a hexagonal 6H type perovskite structure. It is more preferable that the pressure range can be in a range of 12 GPa or more and 24 GPa or less before the treatment, and can satisfy a range of 8 GPa or more and 18.5 GPa or less after the treatment. The pressure before heating and the pressure after heating can be adjusted in such a manner that they satisfy the above ranges, respectively. In this way, the above-mentioned barium germanium oxide having a hexagonal 6H type perovskite structure can be manufactured in a single phase.

又,於藉由使用圖3或圖4所示之金剛石砧座裝置或多砧座裝置之高溫高壓處理法進行上述之處理之情形時,較佳為溫度範圍可為1200℃以上且2000℃以下之溫度範圍。於該範圍內,可製造上述之具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。進而較佳為溫度範圍可為1300℃以上且1500℃以下之溫度範圍。又,壓力範圍於處理前可為19.5 GPa以上且24 GPa以下之範圍。又,於處理後可滿足12.5 GPa以上且16.5 GPa以下之範圍。可選擇此種條件。如此,可以單相高產率地製造上述之具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。In the case where the above-mentioned treatment is performed by a high-temperature and high-pressure treatment method using a diamond anvil device or a multiple anvil device shown in FIG. 3 or FIG. 4, the temperature range may preferably be 1200 ° C. or higher and 2000 ° C. Temperature range. Within this range, the above-mentioned barium germanium oxide having a hexagonal 6H type perovskite structure can be manufactured. The temperature range is more preferably 1300 ° C to 1500 ° C. The pressure range may be in a range of 19.5 GPa to 24 GPa before the treatment. In addition, after the treatment, a range of 12.5 GPa or more and 16.5 GPa or less can be satisfied. You can choose this condition. In this way, the above-mentioned barium germanium oxide having a hexagonal 6H-type perovskite structure can be produced in a single phase with high yield.

其次,對藉由帶型高壓裝置進行處理之情形進行說明,上述帶型高壓裝置使用具備填充有原料粉末之膠囊之高壓單元。Next, a case where processing is performed by a belt-type high-pressure device will be described. The belt-type high-pressure device uses a high-pressure unit including a capsule filled with raw material powder.

圖5係模式性地表示用於製造本發明之鋇鍺氧化物的具備膠囊之高壓單元之剖面之圖。Fig. 5 is a schematic view showing a cross section of a high-pressure unit including a capsule for producing the barium germanium oxide of the present invention.

高壓單元具備圓筒狀之葉蠟石1、於葉蠟石1之筒內以與筒內壁面上部側及下部側接觸之方式配置之2個鋼環2、配置於鋼環2之中心軸側之圓筒狀之碳加熱器4、配置於碳加熱器4之內部之金屬製膠囊8、及填充於金屬製膠囊8之內部之原料粉末7。於葉蠟石1與碳加熱器4之間之間隙填充有填充用粉末3,於碳加熱器4與金屬製膠囊8之間之間隙亦填充有填充用粉末3。於碳加熱器4配置有Mo等金屬電極6。圖5中表示於金屬製膠囊8內填充有常壓相BaGeO3 之粉末7之情況。The high-pressure unit includes a cylindrical pyrophyllite 1, two steel rings arranged inside the barrel of the pyrophyllite 1 so as to be in contact with the upper and lower sides of the inner wall surface of the barrel, and 2 arranged on the central axis side of the steel ring 2. A cylindrical carbon heater 4, a metal capsule 8 arranged inside the carbon heater 4, and a raw material powder 7 filled inside the metal capsule 8. The gap between the pyrophyllite 1 and the carbon heater 4 is filled with a filling powder 3, and the gap between the carbon heater 4 and the metal capsule 8 is also filled with a filling powder 3. A metal electrode 6 such as Mo is disposed on the carbon heater 4. FIG. 5 shows a case where the metal capsule 8 is filled with a powder 7 of a normal pressure phase BaGeO 3 .

於一端側經圓板狀之蓋封閉之圓筒狀之碳加熱器4之內底部鋪滿填充用粉末5後,於圓筒狀之碳加熱器4內以成為同軸之方式配置金屬製膠囊8,將填充用粉末3填充於金屬製膠囊8與碳加熱器4之內壁面之間隙,進而於金屬製膠囊8之上部鋪滿填充用粉末5後,將另一端側以圓板狀之蓋密封。After filling the inside of the cylindrical carbon heater 4 closed with a disc-shaped cover on one end side with the powder 5 for filling, a metal capsule 8 is arranged coaxially in the cylindrical carbon heater 4 , Filling the gap between the inner wall surface of the metal capsule 8 and the carbon heater 4 with the filling powder 3, and then filling the upper portion of the metal capsule 8 with the filling powder 5, and sealing the other end side with a disc-shaped cover .

於筒狀之葉蠟石1內以成為同軸之方式配置該圓筒狀之碳加熱器4後,將填充用粉末3填充於碳加熱器4與葉蠟石1之內壁面之間隙。作為填充用粉末3及5,例如可列舉NaCl+10 wt%ZrO2After the cylindrical carbon heater 4 is disposed coaxially in the cylindrical pyrophyllite 1, the filling powder 3 is filled in the gap between the carbon heater 4 and the inner wall surface of the pyrophyllite 1. Examples of the filling powders 3 and 5 include NaCl + 10 wt% ZrO 2 .

其次,以嵌入葉蠟石1之內壁面上部側之填充用粉末3之方式壓入鋼環2,並且以嵌入葉蠟石1之內壁面下部側之填充用粉末3之方式壓入另一鋼環。如以上操作,可獲得將原料粉末7填充於金屬製膠囊8之高壓單元。Next, the steel ring 2 is pressed into the filling powder 3 on the upper side of the inner wall surface of the pyrophyllite 1, and the other steel is pressed into the filling powder 3 on the lower side of the inner wall surface of the pyrophyllite 1. ring. As described above, a high-pressure unit in which the raw material powder 7 is filled in the metal capsule 8 can be obtained.

圖6係模式性地表示用於製造本發明之鋇鍺氧化物的帶型高壓裝置之圖。FIG. 6 is a view schematically showing a belt-type high-voltage device for producing the barium germanium oxide of the present invention.

於帶型高壓裝置21之缸體27A、27B之間且砧座25A、25B之間之特定位置,使包含較薄之金屬板之導電體26A、26B接觸,配置參照圖5所說明之高壓單元。其次,於該等構件與高壓單元之間填充葉蠟石28。At a specific position between the cylinders 27A and 27B of the belt-type high voltage device 21 and between the anvils 25A and 25B, the conductors 26A and 26B including the thin metal plate are contacted, and the high voltage unit described with reference to FIG. 5 is arranged . Second, pyrophyllite 28 is filled between the components and the high-voltage unit.

將砧座25A、25B及缸體27A、27B移動至高壓單元側,對高壓單元以滿足上述之條件之方式進行加壓。於經加壓之狀態下,以滿足上述之條件之方式進行加熱,保持特定時間即可。例如,於使用帶型高壓裝置21之情形時,若於1100℃以上且1300℃以下之溫度範圍內、於9 GPa以上且10 GPa以下之壓力範圍內進行處理,則可以單相製造上述之具有六方晶系6H型鈣鈦礦結構之鋇鍺氧化物。The anvils 25A and 25B and the cylinders 27A and 27B are moved to the high-pressure unit side, and the high-pressure unit is pressurized in such a manner as to satisfy the above-mentioned conditions. In a pressurized state, heating is performed in a manner that satisfies the above conditions, and it can be maintained for a specific time. For example, in the case of using the belt-type high-pressure device 21, if the processing is performed in a temperature range of 1100 ° C to 1300 ° C and a pressure range of 9 GPa to 10 GPa, the above-mentioned Barium germanium oxide with hexagonal 6H type perovskite structure.

至此,本發明之鋇鍺氧化物係作為固化體或由其所得之粉體進行了說明,但本發明之鋇鍺氧化物可為粉體、燒結體、薄膜等形狀。例如,若將藉由上述之方法而得之粉末狀之本發明之鋇鍺氧化物成形、燒結,則可獲得燒結體。關於燒結,採用熱壓法、冷均壓加壓法(CIP)、熱均壓加壓法(HIP)、脈衝通電燒結法。若將如此所得之燒結體用於物理氣相沉積法中之靶材,則可提供本發明之鋇鍺氧化物薄膜。So far, the barium germanium oxide of the present invention has been described as a solidified body or a powder obtained therefrom, but the barium germanium oxide of the present invention may be in the shape of a powder, a sintered body, or a thin film. For example, if the barium germanium oxide of the present invention in powder form obtained by the above method is formed and sintered, a sintered body can be obtained. Regarding the sintering, a hot pressing method, a cold equalizing pressure method (CIP), a hot equalizing pressure method (HIP), and a pulse current sintering method are used. If the sintered body thus obtained is used as a target in a physical vapor deposition method, the barium germanium oxide film of the present invention can be provided.

其次,使用具體之實施例對本發明進行詳述,然而應注意本發明並未限定於該等實施例。
[實施例]
Next, the present invention is described in detail using specific embodiments, but it should be noted that the present invention is not limited to these embodiments.
[Example]

[例1~18]
於例1~18中,使用由具有斜方晶之BaGeO3 所表示之鋇鍺氧化物(以下稱為斜方晶BaGeO3 粉末)作為原料粉末,於表2所示之壓力範圍及溫度範圍內,實施使用圖3及圖4所示之金剛石砧座裝置的利用雷射加熱之高溫高壓處理法。
[Examples 1 to 18]
In Examples 1 to 18, barium germanium oxide (hereinafter referred to as orthorhombic BaGeO 3 powder) represented by BaGeO 3 having orthorhombic crystals was used as a raw material powder within the pressure range and temperature range shown in Table 2. The high temperature and high pressure treatment method using laser heating using the diamond anvil device shown in FIG. 3 and FIG. 4 was implemented.

首先,如以下般合成作為原料粉末之斜方晶BaGeO3 粉末。以按莫耳比計成為1:1之方式稱量GeO2 粉末(Aldrich製造,純度99.99%)及BaCO3 (Aldrich製造,純度99.99%),於鋼玉研缽中進行混合。對該混合粉進行壓製,製成顆粒(直徑:10 mm,厚度:5 mm)。將該顆粒配置於電爐中,於大氣中於1200℃下煅燒8小時。將煅燒後之顆粒以鋼玉研缽再粉碎,再次製成顆粒,於相同條件下煅燒。進行粉末X射線繞射(XRD)而對煅燒體進行鑑定。由XRD圖案而得之結晶結構參數與Pearson’s Crystal Data#1827134一致,確認所得之煅燒體為斜方晶BaGeO3First, an orthorhombic BaGeO 3 powder as a raw material powder was synthesized as follows. GeO 2 powder (manufactured by Aldrich, purity 99.99%) and BaCO 3 (manufactured by Aldrich, purity 99.99%) were weighed so that the molar ratio became 1: 1, and mixed in a steel jade mortar. This mixed powder was pressed into granules (diameter: 10 mm, thickness: 5 mm). The pellets were placed in an electric furnace and calcined in the air at 1200 ° C for 8 hours. The calcined granules were pulverized in a steel jade mortar to make granules again, and calcined under the same conditions. Powder X-ray diffraction (XRD) was performed to identify the calcined body. The crystal structure parameters obtained from the XRD pattern were consistent with Pearson's Crystal Data # 1827134, and it was confirmed that the obtained calcined body was orthorhombic BaGeO 3 .

如圖4所示,藉由墊及金剛石保持作為原料粉末之斜方晶BaGeO3 粉末。此處,所填充之斜方晶BaGeO3 粉末具有約100 μm之粒徑,約為0.3~0.8 μg。As shown in FIG. 4, an orthorhombic BaGeO 3 powder as a raw material powder is held by a pad and diamond. Here, the filled orthorhombic BaGeO 3 powder has a particle diameter of about 100 μm, which is about 0.3 to 0.8 μg.

接著,如表2所示,施加金剛石砧座裝置之處理前(加熱前)之壓力,自100 W之光纖雷射照射雷射光束至原料粉末。再者,雷射光束係聚光成10 μmϕ,掃描原料粉末整體,調整為表2所示之溫度範圍內。再者,加熱溫度係由色溫判斷。雷射之照射時間係於溫度成為一定後為數分鐘(5分鐘~10分鐘)。又,以處理後(加熱後)之壓力為表2所示之壓力之方式進行控制。再者,壓力值於DAC(Diamond Anvil Cell,金剛石砧座單元)高壓觀察實驗之情形時,使用混合於金剛石砧座之拉曼散射光譜及試樣的金之X射線繞射線測定,於DAC回收實驗之情形時,僅由金剛石砧座之拉曼散射光譜測定,後者之壓力係根據前者之壓力測定之結果進行修正。Next, as shown in Table 2, the pressure before the treatment (before heating) of the diamond anvil device was applied, and the laser beam was irradiated from the 100 W fiber laser to the raw material powder. Furthermore, the laser beam was condensed to 10 μmϕ, and the entire raw material powder was scanned and adjusted to the temperature range shown in Table 2. The heating temperature is determined by the color temperature. The laser irradiation time is several minutes (5 minutes to 10 minutes) after the temperature becomes constant. In addition, control was performed so that the pressure after the treatment (after heating) was the pressure shown in Table 2. In addition, when the pressure value is in the high pressure observation experiment of the DAC (Diamond Anvil Cell), the Raman scattering spectrum mixed with the diamond anvil and the X-ray diffraction of gold of the sample are used for measurement, and the DAC is recovered. In the case of the experiment, only the Raman scattering spectrum of the diamond anvil was used for the measurement, and the pressure of the latter was corrected based on the results of the pressure measurement of the former.

圖7係表示用於X射線結構解析之測定系統之圖。Fig. 7 is a diagram showing a measurement system for X-ray structure analysis.

對於處理後之試樣,如圖7所示,不對金剛石砧座單元進行減壓而直接用於測定系統單元,進行X射線結構解析。將來自放射光之X射線藉由矽單色化(λ=0.041476 nm,或者0.033242 nm,或者0.074996 nm),獲得X射線繞射圖案。由所得之X射線繞射圖案進行X射線結構解析,求出晶格常數等結晶結構參數。將結果表示於表3。As for the processed sample, as shown in FIG. 7, the diamond anvil unit is not directly decompressed, but is directly used in the measurement system unit for X-ray structural analysis. X-rays from the emitted light were monochromated with silicon (λ = 0.041476 nm, or 0.033242 nm, or 0.074996 nm) to obtain an X-ray diffraction pattern. X-ray structure analysis was performed from the obtained X-ray diffraction pattern, and crystal structure parameters such as a lattice constant were obtained. The results are shown in Table 3.

接著,對於處理後之試樣,將金剛石砧座單元減壓至一個大氣壓,自單元取出試樣,進行X射線結構解析,求出晶格常數等結晶結構參數。將結果示於圖8及表3。Next, for the processed sample, the diamond anvil unit was decompressed to an atmospheric pressure, the sample was taken out from the unit, and X-ray structure analysis was performed to obtain crystal structure parameters such as lattice constant. The results are shown in Fig. 8 and Table 3.

進而,對於處理後之試樣,使用漫反射測定裝置對漫反射光譜進行測定。將結果示於圖14。Furthermore, the diffuse reflection spectrum of the processed sample was measured using a diffuse reflection measuring device. The results are shown in FIG. 14.

[例19]
於例19中,使用斜方晶BaGeO3 粉末作為原料粉末,以表2所示之壓力範圍及溫度範圍,實施使用圖5及圖6所示之帶型高壓裝置之高溫高壓處理法。
[Example 19]
In Example 19, an orthorhombic BaGeO 3 powder was used as a raw material powder, and the high-temperature and high-pressure treatment method using the belt-type high-pressure device shown in FIG. 5 and FIG. 6 was performed in the pressure range and temperature range shown in Table 2.

將例1中所合成之斜方晶BaGeO3 粉末填充於一端側經圓板狀之蓋封閉的Au(金)製之圓筒狀之金屬製膠囊(圖5之8)內後,將另一端側以圓板狀之Mo製之蓋密封。此時,填充時之鬆密度為1.4 g/cm3 。其次,於一端側經圓板狀之蓋封閉的圓筒狀之碳加熱器(圖5之4)之內底部鋪滿填充用粉末(NaCl+10 wt%ZrO2 )後,於圓筒狀之碳加熱器內以成為同軸之方式配置該金屬製膠囊,將填充用粉末(NaCl+10 wt%ZrO2 )填充於金屬製膠囊與碳加熱器之內壁面之間隙,進而於金屬製膠囊之上部鋪滿填充用粉末(NaCl+10 wt%ZrO2 )後,將另一端側以圓板狀之蓋密封。The orthorhombic BaGeO 3 powder synthesized in Example 1 was filled into a cylindrical metal capsule (Au) made of Au (gold) closed at one end by a disc-shaped lid, and the other end The side is sealed with a disc-shaped lid made of Mo. At this time, the bulk density at the time of filling was 1.4 g / cm 3 . Next, the bottom of the cylindrical carbon heater (Fig. 5-4) closed with a disk-shaped cover on one end side is covered with filling powder (NaCl + 10 wt% ZrO 2 ), and then the cylindrical carbon is heated. The metal capsule is arranged coaxially in the device, and the filling powder (NaCl + 10 wt% ZrO 2 ) is filled in the gap between the metal capsule and the inner wall surface of the carbon heater, and the upper portion of the metal capsule is filled with a filling material. After powdering (NaCl + 10 wt% ZrO 2 ), the other end side was sealed with a disc-shaped lid.

其次,於筒狀之葉蠟石內以成為同軸之方式配置該圓筒狀之碳加熱器後,將填充用粉末(NaCl+10 wt%ZrO2 )填充於碳加熱器與葉蠟石之內壁面之間隙。Next, the cylindrical carbon heater is arranged coaxially in the cylindrical pyrophyllite, and the filling powder (NaCl + 10 wt% ZrO 2 ) is filled in the inner wall surface of the carbon heater and pyrophyllite. gap.

其次,將鋼環壓入葉蠟石之內壁面上部側之填充用粉末,並且將另一鋼環壓入葉蠟石之內壁面下部側之填充用粉末。如以上操作而製作高壓單元。Next, a steel ring is pressed into the powder for filling on the upper side of the inner wall surface of pyrophyllite, and another steel ring is pressed into the powder for filling on the lower side of the inner wall surface of pyrophyllite. Proceed as above to make a high voltage unit.

將高壓單元配置於圖6所示之帶型加壓裝置之特定位置。將高壓單元加壓至表2所示之壓力值。其次,於經加壓之狀態下,於表2所示之溫度下進行加熱。於該狀態下將溫度、壓力保持30分鐘。藉此,對原料粉末進行高溫高壓處理。The high-pressure unit is arranged at a specific position of the belt-type pressurizing device shown in FIG. 6. Pressurize the high-pressure unit to the pressure values shown in Table 2. Next, in a pressurized state, heating was performed at the temperature shown in Table 2. In this state, the temperature and pressure were maintained for 30 minutes. Thereby, the raw material powder is subjected to high-temperature and high-pressure treatment.

返回至室溫、常壓,取出金屬製膠囊內部之產物。其次,對產物於經加熱至80℃之水中進行處理。藉此,將附著於產物之NaCl溶解去除。如此獲得試樣。對於所得之試樣,與例1~18同樣地進行X射線結構解析,測定漫反射光譜。將結果示於表3。Return to room temperature and normal pressure, and take out the product inside the metal capsule. Next, the product was treated in water heated to 80 ° C. As a result, NaCl adhering to the product was dissolved and removed. Thus, a sample was obtained. X-ray structure analysis was performed on the obtained samples in the same manner as in Examples 1 to 18, and the diffuse reflection spectrum was measured. The results are shown in Table 3.

[例20~21]
於例20~21中,使用斜方晶BaGeO3 粉末(例1中所合成之粉末)、La2 O3 粉末(Aldrich製造,純度99.99%)、及GeO2 粉末(Aldrich製造,純度99.999%)作為原料粉末,以表2所示之壓力範圍及溫度範圍,實施使用圖3及圖4所示之金剛石砧座裝置之利用雷射加熱之高溫高壓處理法。
[Examples 20 to 21]
In Examples 20 to 21, orthorhombic BaGeO 3 powder (the powder synthesized in Example 1), La 2 O 3 powder (manufactured by Aldrich, purity 99.99%), and GeO 2 powder (manufactured by Aldrich, purity 99.999%) were used. As the raw material powder, a high-temperature and high-pressure treatment method using laser heating using a diamond anvil device shown in FIG. 3 and FIG. 4 was performed in the pressure range and temperature range shown in Table 2.

詳細而言,以於由Ba1-x Lax GeO3 (x=0.05、0.10)所表示之式中金屬離子之量一致之方式,混合斜方晶BaGeO3 粉末、La2 O3 粉末及GeO2 粉末。如圖4所示,藉由墊及金剛石保持混合粉末。此處,所填充之混合粉末之重量約為0.3~0.8 μg。以下之順序與例1~例18相同,故省略說明。In detail, the orthorhombic BaGeO 3 powder, La 2 O 3 powder, and GeO are mixed so that the amount of metal ions in the formula represented by Ba 1-x La x GeO 3 (x = 0.05, 0.10) is consistent. 2 powder. As shown in Fig. 4, the mixed powder is held by a pad and diamond. Here, the weight of the mixed powder to be filled is about 0.3 to 0.8 μg. The following procedures are the same as those in Examples 1 to 18, and therefore descriptions are omitted.

對於處理後之試樣,將金剛石砧座單元減壓至一個大氣壓,自單元取出試樣,進行X射線結構解析,求出晶格常數等結晶結構參數。將結果示於圖8及表3。For the treated sample, the diamond anvil unit was decompressed to an atmospheric pressure, the sample was taken out from the unit, and X-ray structure analysis was performed to obtain crystal structure parameters such as lattice constant. The results are shown in Fig. 8 and Table 3.

[表2]
[Table 2]

參照表3及圖8~圖14對以上之結果進行說明。The above results will be described with reference to Table 3 and FIGS. 8 to 14.

圖8係表示例8之試樣(於一個大氣壓)之XRD圖案之圖。
圖9係表示例20之試樣(於一個大氣壓)之XRD圖案之圖。
圖10係表示例21之試樣(於一個大氣壓)之XRD圖案之圖。
FIG. 8 is a diagram showing an XRD pattern of the sample (at one atmosphere) of Example 8. FIG.
Figure 9 is a diagram showing the XRD pattern of the sample (at one atmosphere) of Example 20.
Fig. 10 is a diagram showing the XRD pattern of the sample (at one atmosphere) of Example 21.

根據圖8,繞射峰均可對具有呈現六方晶系6H型P63 /mmc空間群之對稱性之鈣鈦礦結構之鋇鍺氧化物(6H型BaGeO3 )附以指數。圖9及圖10亦同樣地,繞射峰均可對具有呈現六方晶系6H型P63 /mmc空間群之對稱性之鈣鈦礦結構之鋇鍺氧化物(6H型BaGeO3 )附以指數。又,未見除此以外之表示第二相之峰。雖未圖示,但例2、9、11、12、14、17及19之試樣亦顯示同樣之XRD圖案。According to FIG. 8, the diffraction peaks can be indexed with a barium germanium oxide (6H type BaGeO 3 ) having a perovskite structure exhibiting the symmetry of a hexagonal 6H type P6 3 / mmc space group. 9 and 10, the diffraction peaks can be indexed to the barium germanium oxide (6H type BaGeO 3 ) having a perovskite structure that exhibits the symmetry of the hexagonal 6H type P6 3 / mmc space group. . In addition, no other peak showing the second phase was seen. Although not shown, the samples of Examples 2, 9, 11, 12, 14, 17 and 19 also showed the same XRD pattern.

又,例1、3、5、10及13之試樣顯示與例8同樣之XRD圖案,並且顯示寬之暈圈圖案。由此可知,該等試樣含有6H型BaGeO3 並且含有非晶。例6之試樣可見複數個繞射峰,一部分對6H型BaGeO3 附以指數,一部分對低壓型BaGeO3 附以指數。例4、7、15、16及18之試樣均未顯示相當於6H型BaGeO3 之峰。In addition, the samples of Examples 1, 3, 5, 10, and 13 showed the same XRD pattern as in Example 8, and showed a wide halo pattern. From this, it can be seen that these samples contain 6H-type BaGeO 3 and contain amorphous. In the sample of Example 6, a plurality of diffraction peaks were seen, part of which was indexed to 6H type BaGeO 3 , and part of which was indexed to low-pressure type BaGeO 3 . The samples of Examples 4, 7, 15, 16, and 18 did not show a peak corresponding to 6H-type BaGeO 3 .

將以上之結果彙總於表3。The above results are summarized in Table 3.

[表3]
[table 3]

由該等表示,藉由使用斜方晶BaGeO3 粉末作為原料粉末,以900℃以上且2300℃以下之溫度範圍、7.5 GPa以上且45 GPa以下之壓力範圍進行處理,而至少製造6H型BaGeO3From these expressions, at least 6H-type BaGeO 3 is manufactured by using orthorhombic BaGeO 3 powder as a raw material powder and processing in a temperature range of 900 ° C. to 2300 ° C. and a pressure range of 7.5 GPa to 45 GPa. .

圖11係表示例8、例20及例21之試樣之a軸之單位晶格長之La添加量依存性之圖。
圖12係表示例8、例20及例21之試樣之c軸之單位晶格長之La添加量依存性之圖。
圖13係表示例8、例20及例21之試樣之單位晶格體積之La添加量依存性之圖。
11 is a graph showing the dependency of La addition amount per unit lattice length on the a-axis of the samples of Examples 8, 20, and 21;
FIG. 12 is a graph showing the dependence of La addition amount per unit lattice length on the c-axis of the samples of Examples 8, 20, and 21. FIG.
FIG. 13 is a graph showing the dependency of La addition amount per unit lattice volume on the samples of Examples 8, 20, and 21.

圖11~圖13中一併表示未添加La之例8之結果。根據圖11~圖13可知,隨著La添加量增大,a軸及c軸之晶格常數伸長。又,隨著La添加量增大,晶格體積增大。由此可知,所添加之La於Ba部位固溶,其添加量以15莫耳%為上限較妥當。The results of Example 8 in which La is not added are shown in FIGS. 11 to 13. As can be seen from FIGS. 11 to 13, as the amount of La added increases, the lattice constants of the a-axis and the c-axis extend. As the amount of La added increases, the lattice volume increases. From this, it can be known that the added La is solid-dissolved in the Ba portion, and the addition amount thereof is more appropriate with an upper limit of 15 mol%.

又,示出:藉由除斜方晶BaGeO3 粉末以外,添加包含選自由Y、Sc、In、Si、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所組成之群中之至少1種元素的物質作為原料粉末,而製造Ba之一部分或Ge之一部分經取代之6H型BaGeO3 。又,示出GeO2 之進一步添加對於組成之調整有效。In addition, it is shown that by adding, in addition to the orthorhombic BaGeO 3 powder, a material selected from Y, Sc, In, Si, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, A substance of at least one element in the group consisting of Tm, Yb, and Lu is used as a raw material powder, and 6H-type BaGeO 3 having a part of Ba or a part of Ge substituted is produced. It is also shown that further addition of GeO 2 is effective for adjusting the composition.

圖14係表示例8之試樣之漫反射光譜之圖。FIG. 14 is a graph showing a diffuse reflection spectrum of the sample of Example 8. FIG.

如圖14所示,由漫反射光譜之吸收端求出之帶隙(Eg )算出為3.1 eV。再者,雖未圖示,但作為6H型BaGeO3 單相之例2、9、11、12、14、17、19、20及21之試樣之帶隙均為2.5 eV以上且3.5 eV以下之範圍內。
[產業上之可利用性]
As shown in FIG. 14, the band gap (E g ) obtained from the absorption end of the diffuse reflection spectrum was calculated to be 3.1 eV. Moreover, although not shown, the band gaps of the samples 2, 9, 11, 12, 14, 17, 19, 20, and 21, which are examples of the 6H-type BaGeO 3 single phase, are all 2.5 eV or more and 3.5 eV or less. Within range.
[Industrial availability]

本發明之鋇鍺氧化物由於具有4 eV以下之帶隙,故可藉由摻雜劑或缺陷控制而成為透明導電性物質。又,若將本發明之鋇鍺氧化物作為燒結體,將其用於靶材,則可提供薄膜之鋇鍺氧化物,可應用於顯示器等。Since the barium germanium oxide of the present invention has a band gap of 4 eV or less, it can be made into a transparent conductive substance by dopant or defect control. In addition, if the barium germanium oxide of the present invention is used as a sintered body and used as a target, a thin film of barium germanium oxide can be provided, which can be applied to displays and the like.

1‧‧‧葉蠟石容器(筒) 1‧‧‧Pyrophyllite container (tube)

2‧‧‧鋼環 2‧‧‧ steel ring

3、5‧‧‧填充用粉末(NaCl+10 wt%ZrO2)3.5‧‧‧filling powder (NaCl + 10 wt% ZrO 2 )

4‧‧‧碳加熱器 4‧‧‧carbon heater

6‧‧‧Mo電極 6‧‧‧Mo electrode

7‧‧‧原料粉末 7‧‧‧ raw material powder

8‧‧‧金屬製膠囊 8‧‧‧ metal capsules

21‧‧‧帶型高壓裝置 21‧‧‧Belt type high voltage device

25A、25B‧‧‧砧座 25A, 25B‧‧‧ Anvil

26A、26B‧‧‧導電體 26A, 26B‧‧‧Conductor

27A、27B‧‧‧缸體 27A, 27B‧‧‧ cylinder

28‧‧‧葉蠟石(填充用) 28‧‧‧ Pyrophyllite (for filling)

a‧‧‧軸 a‧‧‧axis

b‧‧‧軸 b‧‧‧axis

c‧‧‧軸 c‧‧‧axis

圖1係表示本發明之鋇鍺氧化物之結晶結構的模式圖。FIG. 1 is a schematic view showing the crystal structure of the barium germanium oxide of the present invention.

圖2係對製造本發明之鋇鍺氧化物之過程進行說明之圖。 FIG. 2 is a diagram illustrating a process of manufacturing the barium germanium oxide of the present invention.

圖3係表示具備金剛石砧座單元之金剛石砧座裝置之整體的模式圖。 FIG. 3 is a schematic view showing an entire diamond anvil device including a diamond anvil unit.

圖4係表示圖3之金剛石砧座裝置之細節的模式圖。 FIG. 4 is a schematic view showing details of the diamond anvil device of FIG. 3.

圖5係模式性地表示用於製造本發明之鋇鍺氧化物的具備膠囊之高壓單元之剖面之圖。 Fig. 5 is a schematic view showing a cross section of a high-pressure unit including a capsule for producing the barium germanium oxide of the present invention.

圖6係模式性地表示用於製造本發明之鋇鍺氧化物的帶型高壓裝置之圖。 FIG. 6 is a view schematically showing a belt-type high-voltage device for producing the barium germanium oxide of the present invention.

圖7係表示用於X射線結構解析之測定系統之圖。 Fig. 7 is a diagram showing a measurement system for X-ray structure analysis.

圖8係表示例8之試樣(於一個大氣壓)之XRD(X ray diffraction,X射線繞射)圖案之圖。 FIG. 8 is a diagram showing an XRD (X ray diffraction) pattern of the sample (at one atmospheric pressure) of Example 8. FIG.

圖9係表示例20之試樣(於一個大氣壓)之XRD圖案之圖。 Figure 9 is a diagram showing the XRD pattern of the sample (at one atmosphere) of Example 20.

圖10係表示例21之試樣(於一個大氣壓)之XRD圖案之圖。 Fig. 10 is a diagram showing the XRD pattern of the sample (at one atmosphere) of Example 21.

圖11係表示例8、例20及例21之試樣之a軸之單位晶格長之La添加量依存性之圖。 11 is a graph showing the dependency of La addition amount per unit lattice length on the a-axis of the samples of Examples 8, 20, and 21;

圖12係表示例8、例20及例21之試樣之c軸之單位晶格長之La添加量依存性之圖。 FIG. 12 is a graph showing the dependence of La addition amount per unit lattice length on the c-axis of the samples of Examples 8, 20, and 21. FIG.

圖13係表示例8、例20及例21之試樣之單位晶格體積之La添加量依存性之圖。 FIG. 13 is a graph showing the dependency of La addition amount per unit lattice volume on the samples of Examples 8, 20, and 21.

圖14係表示例8之試樣之漫反射光譜之圖。 FIG. 14 is a graph showing a diffuse reflection spectrum of the sample of Example 8. FIG.

Claims (18)

一種鋇鍺氧化物,其含有由通式ABO3 (其中,A至少含有Ba,B至少含有Ge)所表示之結晶, 上述由ABO3 所表示之結晶具有六方晶系6H型鈣鈦礦結構。A barium germanium oxide contains a crystal represented by the general formula ABO 3 (where A contains at least Ba and B contains at least Ge). The crystal represented by ABO 3 has a hexagonal 6H type perovskite structure. 如請求項1之鋇鍺氧化物,其中上述由ABO3 所表示之結晶具有空間群P63 /mmc之對稱性, 晶格常數a、b及c分別滿足以下之範圍: a=0.56006±0.05(nm) b=0.56006±0.05(nm) c=1.3653±0.1(nm)。For example, the barium germanium oxide of claim 1, in which the above-mentioned crystal represented by ABO 3 has the symmetry of the space group P6 3 / mmc, and the lattice constants a, b, and c respectively satisfy the following ranges: a = 0.56006 ± 0.05 ( nm) b = 0.56006 ± 0.05 (nm) c = 1.3653 ± 0.1 (nm). 如請求項1或2之鋇鍺氧化物,其具有2.5 eV以上且4 eV以下之範圍之帶隙。The barium germanium oxide of claim 1 or 2 has a band gap in a range of 2.5 eV or more and 4 eV or less. 如請求項3之鋇鍺氧化物,其具有2.5 eV以上且3.5 eV以下之範圍之帶隙。The barium germanium oxide of claim 3 has a band gap in a range of 2.5 eV or more and 3.5 eV or less. 如請求項1或2之鋇鍺氧化物,其中上述A進而含有選自由La(鑭)、Ce(鈰)、Pr(鐠)、Nd(釹)、Sm(釤)、Eu(銪)、Gd(釓)、Tb(鋱)、Dy(鏑)、Ho(鈥)、Er(鉺)、Tm(銩)、Yb(鐿)、Lu(鎦)、Y(釔)、Sc(鈧)、及In(銦)所組成之群中之至少1種元素。For example, the barium germanium oxide of claim 1 or 2, wherein the A further contains a member selected from the group consisting of La (lanthanum), Ce (cerium), Pr (鐠), Nd (neodymium), Sm (钐), Eu (铕), and Gd. (釓), Tb (鋱), Dy (镝), Ho ('), Er (铒), Tm (銩), Yb (镱), Lu (镏), Y (yttrium), Sc (钪), and At least one element in the group consisting of In (indium). 如請求項5之鋇鍺氧化物,其中作為上述A而進而含有之上述至少1種元素為0.05莫耳%以上且15莫耳%以下之範圍。The barium germanium oxide according to claim 5, wherein the at least one element further contained as the A is in a range of 0.05 mol% or more and 15 mol% or less. 如請求項1或2之鋇鍺氧化物,其中上述B進而含有Si。The barium germanium oxide according to claim 1 or 2, wherein said B further contains Si. 一種製造鋇鍺氧化物之方法,其包括下述步驟:將至少含有由具有斜方晶之BaGeO3 所表示之鋇鍺氧化物之原料粉末以900℃以上且2300℃以下之溫度範圍、7.5 GPa以上且45 GPa以下之壓力範圍進行處理。A method for manufacturing barium germanium oxide, comprising the steps of: 7.5 GPa of a raw material powder containing at least barium germanium oxide represented by BaGeO 3 having an orthorhombic crystal at a temperature range of 900 ° C to 2300 ° C; It is processed in the pressure range above 45 GPa. 如請求項8之方法,其中上述進行處理之步驟係藉由使用選自由金剛石砧座裝置、多砧座裝置及帶型高壓裝置所組成之群中之至少1種裝置的高溫高壓處理法或衝擊壓縮法而進行。The method of claim 8, wherein the above-mentioned processing step is performed by a high-temperature and high-pressure treatment method or impact using at least one device selected from the group consisting of a diamond anvil device, a multiple anvil device, and a belt-type high-voltage device. Compression method. 如請求項9之方法,其中上述進行處理之步驟係藉由使用金剛石砧座裝置或多砧座裝置之高溫高壓處理法而進行, 上述壓力範圍於處理前為12 GPa以上且44 GPa以下之範圍,於處理後為7.5 GPa以上且40 GPa以下之範圍。As the method of claim 9, wherein the above-mentioned processing step is performed by a high-temperature and high-pressure processing method using a diamond anvil device or a multi-anvil device, the above-mentioned pressure range is in a range of 12 GPa or more and 44 GPa or less before processing. After treatment, the range is 7.5 GPa or more and 40 GPa or less. 如請求項10之方法,其中上述壓力範圍於處理前為12 GPa以上且24 GPa以下之範圍,於處理後為8.0 GPa以上且18.5 GPa以下之範圍。The method of claim 10, wherein the pressure range is in a range of 12 GPa or more and 24 GPa or less before processing, and 8.0 GPa or more and 18.5 GPa or less after processing. 如請求項11之方法,其中上述溫度範圍為1200℃以上且2000℃以下之範圍。The method according to claim 11, wherein the temperature range is in a range of 1200 ° C or higher and 2000 ° C or lower. 如請求項12之方法,其中上述溫度範圍為1300℃以上且1500℃以下之範圍, 上述壓力範圍於處理前為19.5 GPa以上且24 GPa以下之範圍,於處理後為12.5 GPa以上且16.5 GPa以下之範圍。The method of claim 12, wherein the above temperature range is in the range of 1300 ° C to 1500 ° C, The above-mentioned pressure range is a range of 19.5 GPa or more and 24 GPa or less before the treatment, and a range of 12.5 GPa or more and 16.5 GPa or less after the treatment. 如請求項8至13中任一項之方法,其中上述原料粉末為具有100 nm以上且500 μm以下之粒徑之粉末。The method according to any one of claims 8 to 13, wherein the raw material powder is a powder having a particle diameter of 100 nm or more and 500 μm or less. 如請求項8至13中任一項之方法,其中上述進行處理之步驟使上述原料粉末反應5分鐘以上且24小時以下之時間。The method according to any one of claims 8 to 13, wherein the step of carrying out the treatment causes the raw material powder to react for a period of 5 minutes or more and 24 hours or less. 如請求項8至13中任一項之方法,其中上述原料粉末進而含有包含選自由Y、Sc、In、Si、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所組成之群中之至少1種元素的物質。The method according to any one of claims 8 to 13, wherein the raw material powder further contains a material selected from the group consisting of Y, Sc, In, Si, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, A substance of at least one element in the group consisting of Er, Tm, Yb, and Lu. 一種燒結體,其包含如請求項1或2之鋇鍺氧化物。A sintered body comprising a barium germanium oxide as claimed in claim 1 or 2. 一種物理氣相沉積用靶材,其包含如請求項17之燒結體。A target for physical vapor deposition, comprising the sintered body as claimed in claim 17.
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