TW201941669A - Wiring circuit board and method for manufacturing same - Google Patents

Wiring circuit board and method for manufacturing same Download PDF

Info

Publication number
TW201941669A
TW201941669A TW108108828A TW108108828A TW201941669A TW 201941669 A TW201941669 A TW 201941669A TW 108108828 A TW108108828 A TW 108108828A TW 108108828 A TW108108828 A TW 108108828A TW 201941669 A TW201941669 A TW 201941669A
Authority
TW
Taiwan
Prior art keywords
wiring
insulating layer
magnetic
layer
thickness direction
Prior art date
Application number
TW108108828A
Other languages
Chinese (zh)
Other versions
TWI841552B (en
Inventor
奧村圭佑
古川佳宏
Original Assignee
日商日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW201941669A publication Critical patent/TW201941669A/en
Application granted granted Critical
Publication of TWI841552B publication Critical patent/TWI841552B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F38/00Adaptations of transformers or inductances for specific applications or functions
    • H01F38/14Inductive couplings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type 
    • H01F17/04Fixed inductances of the signal type  with magnetic core
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/165Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed inductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

This wiring circuit board is provided with: a first insulation layer; a wiring disposed on one surface, in the thickness direction, of the first insulation layer; a second insulation layer which covers the wiring; and a particle-containing layer which contains electrically conductive particles each having a shape, the aspect ratio of which is 2 or more, and which covers the wiring via the second insulation layer. The wiring has a substantially curved shape.

Description

配線電路基板及其製造方法Wiring circuit board and manufacturing method thereof

本發明係關於一種配線電路基板及其製造方法。The present invention relates to a printed circuit board and a method for manufacturing the same.

先前,已知可於以無線方式輸送電力之無線通信或無線電力輸送中使用線圈模組。Previously, it has been known that coil modules can be used in wireless communication or wireless power transmission that transmits power wirelessly.

例如,提出有具備線圈圖案及磁性層之線圈模組,該磁性層將線圈圖案埋設,且含有扁平形狀之磁性粒子(導電性粒子)(例如,參照專利文獻1)。For example, there is proposed a coil module including a coil pattern and a magnetic layer in which the coil pattern is buried and contains flat-shaped magnetic particles (conductive particles) (for example, refer to Patent Document 1).

此種線圈模組例如係藉由首先利用導體圖案化形成線圈圖案,繼而將含有磁性粒子之磁性片材相對於線圈圖案加以熱壓而獲得。
[先前技術文獻]
[專利文獻]
Such a coil module is obtained, for example, by first forming a coil pattern using a conductor pattern, and then heat-pressing a magnetic sheet containing magnetic particles with respect to the coil pattern.
[Prior technical literature]
[Patent Literature]

專利文獻1:日本專利特開2017-005115號公報Patent Document 1: Japanese Patent Laid-Open No. 2017-005115

[發明所欲解決之問題][Problems to be solved by the invention]

可是,存在線圈圖案中流通大電流之情形,於該情形時,絕緣層中所含有之扁平形狀之磁性粒子會使線圈圖案間短路,因此要求線圈圖案與磁性層之間具有絕緣性。However, there may be a case where a large current flows in the coil pattern. In this case, the flat-shaped magnetic particles contained in the insulating layer may cause a short circuit between the coil patterns. Therefore, insulation between the coil pattern and the magnetic layer is required.

因此,嘗試於線圈圖案與磁性層之間形成絕緣層。Therefore, it is attempted to form an insulating layer between the coil pattern and the magnetic layer.

但由於在上述線圈圖案之上表面及側面之稜線部,會形成朝向上側傾斜側方(外側)尖突之尖突部,故而於該情形時,若形成絕緣層,則與尖突部對向之絕緣層之厚度容易變得過薄。因此,若隔著絕緣層,將含有磁性粒子之磁性片材相對於包含尖突部之線圈圖案加以熱壓,則磁性粒子會貫通與尖突部對向之絕緣層而與尖突部接觸,其結果,存在由於該接觸而無法確保磁性層與線圈圖案之絕緣性之故障。However, since the ridgeline portions on the upper surface and the side surface of the coil pattern are formed with sloping side (outside) spurs that are inclined upward, in this case, if an insulating layer is formed, the spurs face the spurs. The thickness of the insulating layer easily becomes too thin. Therefore, if a magnetic sheet containing magnetic particles is thermally pressed with respect to a coil pattern including a sharp portion through an insulating layer, the magnetic particles penetrate the insulating layer facing the sharp portion and come into contact with the sharp portion, As a result, there is a problem that the insulation between the magnetic layer and the coil pattern cannot be ensured due to the contact.

另一方面,亦要求線圈模組具有較高之電感。On the other hand, the coil module is also required to have a higher inductance.

本發明提供一種能確保含粒子層對配線之絕緣性,並且具有較高之電感之配線電路基板及其製造方法。
[解決問題之技術手段]
The invention provides a wiring circuit substrate capable of ensuring the insulation property of a particle-containing layer to wiring and having a high inductance, and a manufacturing method thereof.
[Technical means to solve the problem]

本發明(1)包含一種配線電路基板,其具備:第1絕緣層;配線,其配置於上述第1絕緣層之厚度方向一面;第2絕緣層,其被覆上述配線;及含粒子層,其含有具有縱橫比為2以上之形狀之導電性粒子,且隔著上述第2絕緣層被覆上述配線;且上述配線具有大致彎曲形狀。The present invention (1) includes a wiring circuit board including: a first insulating layer; wiring arranged on one side in the thickness direction of the first insulating layer; a second insulating layer covering the wiring; and a particle-containing layer, which It contains conductive particles having a shape having an aspect ratio of 2 or more, and covers the wiring via the second insulating layer; and the wiring has a substantially curved shape.

於該配線電路基板中,配線具有大致彎曲形狀,故而能將被覆配線中與大致彎曲形狀對應之部分之第2絕緣層以抑制其變得過薄之方式形成。因此,能抑制導電性粒子貫通第2絕緣層而與配線接觸。其結果,藉由第2絕緣層,能確保含粒子層對配線之絕緣性。In this wiring circuit board, since the wiring has a substantially curved shape, a second insulating layer covering a portion of the wiring corresponding to the substantially curved shape can be formed so as to prevent the second insulating layer from becoming too thin. Therefore, it is possible to prevent the conductive particles from penetrating the second insulating layer and coming into contact with the wiring. As a result, the second insulating layer can ensure the insulation of the particle-containing layer from the wiring.

因此,該配線電路基板能確保第2絕緣層之絕緣性。Therefore, this printed circuit board can ensure the insulation of the second insulating layer.

本發明(2)包含如(1)所記載之配線電路基板,其中上述導電性粒子係磁性粒子,上述含粒子層係磁性層,且該配線電路基板係磁性配線電路基板。The present invention (2) includes the wiring circuit board according to (1), wherein the conductive particles are magnetic particles, the particle-containing layer is a magnetic layer, and the wiring circuit board is a magnetic wiring circuit board.

於作為磁性配線電路基板之配線電路基板中,在隔著第2絕緣層被覆配線中與大致彎曲形狀對應之部分的磁性層中,縱橫比為2以上之磁性粒子能沿著配線之彎曲形狀配向。即,磁性粒子於與配線中對應於大致彎曲形狀之部分對向之磁性層中,能沿著相對於厚度方向及正交方向傾斜之方向配向。因此,能於磁性層中形成沿著配線之與大致彎曲形狀對應之部分的順暢之磁路。從而,能提高配線周圍之實效磁導率。其結果,配線電路基板具有較高之電感。In a wiring circuit board that is a magnetic wiring circuit board, magnetic particles having an aspect ratio of 2 or more can be aligned along the curved shape of the wiring in the magnetic layer covering the portion corresponding to the substantially curved shape of the wiring via the second insulating layer. . That is, the magnetic particles can be aligned in a direction inclined with respect to the thickness direction and the orthogonal direction in the magnetic layer facing the portion corresponding to the substantially curved shape in the wiring. Therefore, a smooth magnetic circuit can be formed in the magnetic layer along the portion of the wiring corresponding to the substantially curved shape. Therefore, the effective magnetic permeability around the wiring can be improved. As a result, the wiring circuit board has a high inductance.

因此,該配線電路基板既能具有較高之電感,又能確保第2絕緣層之絕緣性。Therefore, the wiring circuit board can have a high inductance and can ensure the insulation of the second insulating layer.

本發明(3)包含如(2)所記載之配線電路基板,其中上述第2絕緣層係電沈積層。The present invention (3) includes the wiring circuit board according to (2), wherein the second insulating layer is an electrodeposited layer.

於該配線電路基板中,第2絕緣層為電沈積層,故而能使第2絕緣層之厚度較薄。因此,能抑制隔著該第2絕緣層被覆配線之磁性層之實效磁導率降低。其結果,該配線電路基板具有較高之電感。In this wiring circuit board, the second insulating layer is an electrodeposited layer, so that the thickness of the second insulating layer can be made thin. Therefore, it is possible to suppress a decrease in the effective magnetic permeability of the magnetic layer covering the wiring via the second insulating layer. As a result, the wiring circuit board has a high inductance.

另一方面,於第2絕緣層之厚度較薄之情形時,磁性粒子容易貫通較薄第2絕緣層而與配線接觸。但於該配線電路基板中,在被覆具有大致彎曲形狀之配線之第2絕緣層中,抑制厚度形成得過薄之情況,故而能抑制磁性粒子對第2絕緣層之貫通,從而確保第2絕緣層之絕緣性。On the other hand, when the thickness of the second insulating layer is thin, the magnetic particles easily penetrate the thin second insulating layer and come into contact with the wiring. However, in this wiring circuit board, in the second insulating layer covering the wiring having a substantially curved shape, the thickness is prevented from being too thin, so that the penetration of the magnetic particles into the second insulating layer can be suppressed, thereby ensuring the second insulation Layer of insulation.

本發明(4)包含如(2)或(3)所記載之配線電路基板,其中上述第2絕緣層之平均厚度T為10 μm以下。The invention (4) includes the printed circuit board according to (2) or (3), wherein the average thickness T of the second insulating layer is 10 μm or less.

於該配線電路基板中,第2絕緣層之平均厚度T薄至10 μm以下,故而能抑制磁性層之實效磁導率降低。其結果,該配線電路基板具有較高之電感。In this printed circuit board, since the average thickness T of the second insulating layer is as thin as 10 μm or less, the effective magnetic permeability of the magnetic layer can be suppressed from decreasing. As a result, the wiring circuit board has a high inductance.

本發明(5)包含如(2)~(4)中任一項所記載之配線電路基板,其中上述配線具有:厚度方向一面,其於上述第1絕緣層之上述厚度方向一面隔開間隔而對向配置;厚度方向另一面,其與上述第1絕緣層之上述厚度方向一面接觸;及側面,其將上述厚度方向一面及上述厚度方向另一面之兩端緣連結;上述第2絕緣層被覆上述厚度方向一面及上述側面,上述配線具有由上述厚度方向一面及上述側面形成之角部,且上述角部具有大致彎曲形狀。The present invention (5) includes the wiring circuit board according to any one of (2) to (4), wherein the wiring has a thickness direction surface spaced apart from the thickness direction surface of the first insulating layer. Opposite arrangement; the other side in the thickness direction, which is in contact with the one side in the thickness direction of the first insulating layer; and the side, which connects the two ends of the one surface in the thickness direction and the other side in the thickness direction; the second insulating layer is covered In the one surface in the thickness direction and the side surface, the wiring has a corner portion formed by the one surface in the thickness direction and the side surface, and the corner portion has a substantially curved shape.

於該配線電路基板中,配線之角部具有大致彎曲形狀,故而能將被覆該角部之第2絕緣層以抑制其變得過薄之方式形成。因此,能抑制導電性粒子貫通第2絕緣層而與配線之角部接觸。其結果,藉由第2絕緣層,能確保含粒子層對配線之絕緣性。因此,該配線電路基板能確保第2絕緣層之絕緣性。In this wiring circuit board, the corners of the wiring have a substantially curved shape, so that the second insulating layer covering the corners can be formed so as to prevent the second insulating layer from becoming too thin. Therefore, it is possible to prevent the conductive particles from penetrating the second insulating layer and coming into contact with the corners of the wiring. As a result, the second insulating layer can ensure the insulation of the particle-containing layer from the wiring. Therefore, this printed circuit board can ensure the insulation of the second insulating layer.

本發明(6)包含如(5)所記載之配線電路基板,其中上述角部之曲率半徑R為9 μm以上。The present invention (6) includes the printed circuit board according to (5), wherein a radius of curvature R of the corner portion is 9 μm or more.

於該配線電路基板中,若角部之曲率半徑R高達9 μm以上,則角部之圓弧面較為平緩,因此能以充足之厚度形成與該角部對應之第2絕緣層。又,於與角部對向之第2磁性層中,磁性粒子能確切地沿著角部之圓弧面配向。In this printed circuit board, if the radius of curvature R of the corner portion is as high as 9 μm or more, the arc surface of the corner portion is relatively gentle, so that a second insulating layer corresponding to the corner portion can be formed with a sufficient thickness. In the second magnetic layer facing the corner, the magnetic particles can be aligned along the arc surface of the corner.

本發明(7)包含如(5)或(6)所記載之配線電路基板,其中上述磁性層被覆上述第1絕緣層中自上述第2絕緣層露出之上述厚度方向一面,上述配線具有由上述厚度方向另一面及上述側面形成之第2角部,且上述第2角部具有相互面對面之2個上述側面間之長度隨著向上述厚度方向另一側靠近而變長之部分。The present invention (7) includes the wiring circuit board according to (5) or (6), in which the magnetic layer covers the thickness direction surface exposed from the second insulating layer in the first insulating layer, and the wiring has A second corner portion formed by the other surface in the thickness direction and the side surface, and the second corner portion has a portion in which the length between the two side surfaces facing each other becomes longer as the second corner portion approaches the other side in the thickness direction.

於該配線電路基板中,磁性層被覆第1絕緣層中自第2絕緣層露出之厚度方向一面,故而該磁性層中之磁性粒子能沿著正交方向配向。In this printed circuit board, the magnetic layer covers one surface of the first insulating layer in the thickness direction exposed from the second insulating layer, so the magnetic particles in the magnetic layer can be aligned in the orthogonal direction.

又,由另一面及側面形成之第2角部具有相互面對面之2個側面間之長度隨著向另一面靠近而變長之部分,故而於隔著第2絕緣層被覆該部分之磁性層中,與第2角部中之部分對應地,磁性粒子能沿著相對於正交方向傾斜之方向配向。In addition, the second corner formed by the other side and the side has a portion in which the length between the two side surfaces facing each other becomes longer as they approach the other side, and therefore in the magnetic layer that covers the portion through the second insulating layer Corresponding to a part of the second corner, the magnetic particles can be aligned in a direction inclined with respect to the orthogonal direction.

從而,於第2角部周圍,能形成順暢之磁路。因此,配線電路基板具有更高電感。Therefore, a smooth magnetic circuit can be formed around the second corner portion. Therefore, the wiring circuit board has higher inductance.

本發明(8)包含如(2)~(4)中任一項所記載之配線電路基板,其中上述配線具有大致圓形形狀,上述第2絕緣層被覆上述配線之周面,且上述含粒子層隔著上述第2絕緣層被覆上述配線之上述周面。The present invention (8) includes the wiring circuit board according to any one of (2) to (4), wherein the wiring has a substantially circular shape, the second insulating layer covers a peripheral surface of the wiring, and the particles include The peripheral surface of the wiring is covered with the second insulating layer.

於配線周圍之磁性層中,磁性粒子能形成沿著配線之周面之順暢之磁路。因此,能提高配線周圍之實效磁導率。其結果,配線電路基板具有較高之電感。In the magnetic layer around the wiring, the magnetic particles can form a smooth magnetic path along the peripheral surface of the wiring. Therefore, the effective magnetic permeability around the wiring can be improved. As a result, the wiring circuit board has a high inductance.

本發明(9)包含一種配線電路基板之製造方法,其包含:第1步驟,其係準備第1絕緣層、及配置於上述第1絕緣層之厚度方向一面之配線;第2步驟,其係藉由第2絕緣層被覆上述配線;及第3步驟,其係形成含粒子層,該含粒子層隔著上述第2絕緣層被覆上述配線,且含有具有縱橫比為2以上之形狀之導電性粒子;且上述配線形成為大致彎曲形狀,於上述第2步驟中,將含有沿著與上述厚度方向正交之方向配向之上述導電性粒子之含粒子片材相對於上述第2絕緣層加以熱壓。The present invention (9) includes a method for manufacturing a printed circuit board, which includes: a first step of preparing a first insulating layer and wiring arranged on one side in the thickness direction of the first insulating layer; and a second step of The wiring is covered with a second insulating layer; and in a third step, a particle-containing layer is formed, the particle-containing layer covers the wiring with the second insulating layer interposed therebetween, and contains a conductive material having a shape having an aspect ratio of 2 or more And the wiring is formed into a substantially curved shape, and in the second step, a particle-containing sheet containing the conductive particles aligned in a direction orthogonal to the thickness direction is heated to the second insulating layer Pressure.

可是,於第2步驟中,將含粒子片材相對於第2絕緣層加以熱壓時,含粒子片材中所含有之導電性粒子容易貫通第2絕緣層而與配線接觸。However, in the second step, when the particle-containing sheet is hot-pressed against the second insulating layer, the conductive particles contained in the particle-containing sheet easily penetrate the second insulating layer and come into contact with the wiring.

然而,於該配線電路基板之製造方法中,在第1步驟中,配線形成為大致彎曲形狀,故而能將被覆配線中與大致彎曲形狀對應之部分之第2絕緣層形成得較厚。However, in the method for manufacturing a printed circuit board, in the first step, the wiring is formed into a substantially curved shape, so that the second insulating layer of the portion of the covered wiring corresponding to the approximately curved shape can be formed thick.

因此,能抑制導電性粒子對第2絕緣層之貫通、及導電性粒子與配線之接觸。Therefore, it is possible to suppress the penetration of the conductive particles into the second insulating layer and the contact between the conductive particles and the wiring.

從而,該製造方法能獲得確保第2絕緣層之絕緣性之配線電路基板。Therefore, this manufacturing method can obtain a printed circuit board that ensures the insulation of the second insulating layer.

本發明(10)包含如(9)所記載之配線電路基板之製造方法,其中上述導電性粒子係磁性粒子,上述含粒子層係磁性層,且該製造方法係磁性配線電路基板之製造方法。The invention (10) includes the method for manufacturing a wiring circuit board according to (9), wherein the conductive particles are magnetic particles, the particle-containing layer is a magnetic layer, and the manufacturing method is a method for manufacturing a magnetic wiring circuit board.

於作為磁性配線電路基板之製造方法的配線電路基板之製造方法之第2步驟中,將含有沿著與厚度方向正交之方向配向之導電性粒子的磁性片材相對於第2絕緣層加以熱壓,故而於隔著第2絕緣層被覆配線中與大致彎曲形狀對應之部分之磁性層中,磁性粒子能沿著配線之彎曲形狀配向。即,能使磁性粒子於與配線之對應於大致彎曲形狀之部分對向之磁性層中,沿著相對於厚度方向及正交方向傾斜之方向配向。因此,能於磁性層中形成沿著配線之與大致彎曲形狀對應之部分的順暢之磁路。從而,能提高配線周圍之實效磁導率。其結果,能製造出具有較高之電感之配線電路基板。In the second step of the method of manufacturing a printed circuit board as a method of manufacturing a magnetic printed circuit board, a magnetic sheet containing conductive particles aligned in a direction orthogonal to the thickness direction is heated to the second insulating layer. Therefore, the magnetic particles can be aligned along the curved shape of the wiring in the magnetic layer covering the portion of the wiring corresponding to the substantially curved shape through the second insulating layer. That is, it is possible to orient the magnetic particles in the magnetic layer facing the portion of the wiring corresponding to the substantially curved shape in a direction inclined with respect to the thickness direction and the orthogonal direction. Therefore, a smooth magnetic circuit can be formed in the magnetic layer along the portion of the wiring corresponding to the substantially curved shape. Therefore, the effective magnetic permeability around the wiring can be improved. As a result, a printed circuit board having high inductance can be manufactured.

本發明(11)包含如(10)所記載之配線電路基板之製造方法,其中上述第1步驟中之上述配線具有:厚度方向一面,其於上述第1絕緣層之上述厚度方向一面隔開間隔而對向配置;厚度方向另一面,其與上述第1絕緣層之上述厚度方向一面接觸;及側面,其將上述厚度方向一面及上述厚度方向另一面之兩端緣連結;進而,於上述厚度方向一面及上述側面,形成大致彎曲形狀之角部;且於上述第2步驟中,藉由上述絕緣層,被覆上述配線之上述厚度方向一面及上述側面,於上述第3步驟中,形成隔著上述第2絕緣層被覆上述配線之上述厚度方向一面及上述側面之含粒子層。The present invention (11) includes the method for manufacturing a printed circuit board according to (10), wherein the wiring in the first step has a thickness-direction surface and is spaced apart from the thickness-direction surface of the first insulating layer. And oppositely arranged; the other side in the thickness direction is in contact with the one side in the thickness direction of the first insulating layer; and the side surface connects the two edges of the one side in the thickness direction and the other side in the thickness direction; further, at the thickness In the second step, the side of the thickness direction and the side surface of the wiring are covered with the insulating layer in the second step, and in the third step, a gap is formed. The second insulating layer covers the particle-containing layer on the one surface in the thickness direction and the side surface of the wiring.

於該配線電路基板之製造方法中,在第1步驟之配線形成了大致彎曲形狀之角部,故而能將被覆該角部之第2絕緣層形成得較厚。In the method for manufacturing a printed circuit board, since the corner portion having a substantially curved shape is formed in the wiring in the first step, the second insulating layer covering the corner portion can be formed thicker.

因此,能抑制導電性粒子對第2絕緣層之貫通、及導電性粒子與配線之接觸。Therefore, it is possible to suppress the penetration of the conductive particles into the second insulating layer and the contact between the conductive particles and the wiring.

從而,該製造方法能獲得確保第2絕緣層之絕緣性之配線電路基板。Therefore, this manufacturing method can obtain a printed circuit board that ensures the insulation of the second insulating layer.

本發明(12)包含如(11)所記載之配線電路基板之製造方法,其中上述第1步驟包含:第4步驟,其係藉由減成法,形成具有由厚度方向一面及側面形成之尖突部之配線基部;及,第5步驟,其係藉由鍍覆,形成鍍覆層,藉此利用被覆部將上述角部形成為大致彎曲形狀,該鍍覆層被覆上述配線基部,且具有被覆上述尖突部之上述被覆部。The present invention (12) includes the method for manufacturing a printed circuit board as described in (11), wherein the first step includes the fourth step: forming a tip having a surface formed by a thickness direction and a side surface by a subtractive method. The wiring base of the protrusion; and, in a fifth step, a plating layer is formed by plating, whereby the corner portion is formed into a substantially curved shape by a covering portion, the plating layer covers the wiring base portion, and has Covering the covered portion of the spike.

可是,若於第1步驟中,形成具有尖突部之配線,則存在於第2步驟中,與尖突部對向之絕緣層之厚度變得過薄之情形。其後,若於第3步驟中,形成磁性層,則磁性粒子會貫通與尖突部對向之絕緣層而與尖突部接觸,其結果,存在由於該接觸而無法確保磁性層與配線之絕緣性之情形。However, in the first step, if a wiring having a pointed portion is formed, the thickness of the insulating layer facing the pointed portion may be too thin in the second step. Thereafter, if a magnetic layer is formed in the third step, the magnetic particles penetrate the insulating layer facing the pointed portion and come into contact with the pointed portion. As a result, the contact between the magnetic layer and the wiring cannot be ensured. Insulation situation.

但即便於該第4步驟中,形成具有尖突部之配線基部,亦會於第5步驟中,形成具有被覆尖突部之被覆部之鍍覆層,而利用被覆部將角部形成為大致彎曲形狀。因此,能於第2步驟中,將被覆該角部之第2絕緣層以抑制其變得過薄之方式形成。However, even in the fourth step, a wiring base portion having a sharpened portion is formed, and in the fifth step, a plating layer having a covered portion covering the sharpened portion is formed, and the corner portion is formed approximately using the covered portion. Bent shape. Therefore, in the second step, the second insulating layer covering the corner can be formed so as to prevent the second insulating layer from becoming too thin.

藉由於第3步驟中形成磁性層,能抑制磁性層中之磁性粒子貫通第2絕緣層而與配線接觸。By forming the magnetic layer in the third step, it is possible to prevent the magnetic particles in the magnetic layer from penetrating the second insulating layer and making contact with the wiring.

本發明(13)包含如(10)所記載之配線電路基板之製造方法,其中上述第1步驟中之上述配線具有大致圓形形狀,且於上述第2步驟中,藉由上述絕緣層,被覆上述配線之周面,於上述第3步驟中,形成隔著上述第2絕緣層被覆上述配線之上述周面之含粒子層。The present invention (13) includes the method for manufacturing a printed circuit board according to (10), wherein the wiring in the first step has a substantially circular shape, and in the second step, the wiring is covered with the insulating layer. In the third step, the peripheral surface of the wiring is formed with a particle-containing layer covering the peripheral surface of the wiring with the second insulating layer interposed therebetween.

於第3步驟中,在配線周圍之磁性層中,磁性粒子能形成沿著配線之大致彎曲形狀之順暢之磁路。因此,能提高配線周圍之實效磁導率。其結果,能製造出具有較高之電感之配線電路基板。
[發明之效果]
In the third step, in the magnetic layer around the wiring, the magnetic particles can form a smooth magnetic circuit along the substantially curved shape of the wiring. Therefore, the effective magnetic permeability around the wiring can be improved. As a result, a printed circuit board having high inductance can be manufactured.
[Effect of the invention]

藉由本發明之配線電路基板之製造方法所獲得之本發明之配線電路基板能確保第2絕緣層之絕緣性。The printed circuit board of the present invention obtained by the method for manufacturing a printed circuit board of the present invention can ensure the insulation of the second insulating layer.

<一實施形態>
參照圖1,對作為本發明之配線電路基板之一實施形態之磁性配線電路基板1進行說明。
〈One embodiment〉
A magnetic wiring circuit board 1 which is an embodiment of the wiring circuit board of the present invention will be described with reference to FIG. 1.

磁性配線電路基板1具有於厚度方向上相互對向之厚度方向一面及另一面,且具有沿著面方向(與厚度方向正交之方向)延伸之形狀。磁性配線電路基板1具備作為絕緣層之一例之第1絕緣層2、作為配線之一例之配線部3、第2絕緣層4、及作為含粒子層之一例之磁性層5。The magnetic wiring circuit board 1 has one surface and the other surface in the thickness direction facing each other in the thickness direction, and has a shape extending in the surface direction (a direction orthogonal to the thickness direction). The magnetic wiring circuit board 1 includes a first insulating layer 2 as an example of an insulating layer, a wiring portion 3 as an example of wiring, a second insulating layer 4, and a magnetic layer 5 as an example of a particle-containing layer.

第1絕緣層2具有沿著面方向延伸之形狀。第1絕緣層2係支持下文所說明之配線部3之支持材,進而亦係支持磁性配線電路基板1之支持層。
第1絕緣層2具有作為厚度方向一面之第1絕緣面7、及作為厚度方向另一面之第2絕緣面8。第1絕緣面7及第2絕緣面8分別為沿著面方向之平坦面。又,第1絕緣層2具有可撓性。
The first insulating layer 2 has a shape extending in the plane direction. The first insulating layer 2 is a supporting material that supports the wiring portion 3 described below, and also a supporting layer that supports the magnetic wiring circuit substrate 1.
The first insulating layer 2 includes a first insulating surface 7 as one surface in the thickness direction, and a second insulating surface 8 as the other surface in the thickness direction. The first insulating surface 7 and the second insulating surface 8 are flat surfaces along the plane direction, respectively. The first insulating layer 2 has flexibility.

作為第1絕緣層2之材料,例如可列舉聚醯亞胺樹脂、聚酯樹脂、丙烯酸系樹脂等樹脂。又,第1絕緣層2可為單層亦可為複數層。第1絕緣層2之厚度並不特別限定,例如為1 μm以上1000 μm以下。Examples of the material of the first insulating layer 2 include resins such as polyimide resin, polyester resin, and acrylic resin. The first insulating layer 2 may be a single layer or a plurality of layers. The thickness of the first insulating layer 2 is not particularly limited, and is, for example, 1 μm to 1,000 μm.

於第1絕緣層2之第1絕緣面7,例如,在沿著厚度方向及第1方向(相當於圖1中之左右方向,包含於面方向之方向)切斷所得之切斷面,沿著第1方向相互隔開間隔配置有複數個配線部3。作為配線部3之俯視(沿著厚度方向觀察時)形狀,並不特別限定,例如包括圓環形狀(線圈形狀等)。For example, the cut surface obtained by cutting the first insulating surface 7 of the first insulating layer 2 along the thickness direction and the first direction (corresponding to the left-right direction in FIG. 1 and the direction including the surface direction), A plurality of wiring portions 3 are arranged at intervals in the first direction. The shape of the wiring portion 3 in plan view (when viewed in the thickness direction) is not particularly limited, and includes, for example, a ring shape (coil shape, etc.).

配線部3具備:第1配線面9,其係相對於第1絕緣層2之第1絕緣面7隔開間隔而對向配置於厚度方向一側之厚度方向一面;第2配線面10,其與第1絕緣層2之第1絕緣面7接觸;及配線側面11,其係將第1配線面9及第2配線面10之第1方向兩端緣連結之側面。The wiring section 3 is provided with a first wiring surface 9 that is opposite to the thickness direction side of the first insulating surface 7 of the first insulating layer 2 and is disposed opposite to the thickness direction side; a second wiring surface 10 that It is in contact with the first insulating surface 7 of the first insulating layer 2; and the wiring side surface 11 is a side surface that connects the first wiring surface 9 and the second wiring surface 10 at both ends in the first direction.

第1配線面9係沿著第1方向之平坦面。The first wiring surface 9 is a flat surface along the first direction.

第2配線面10係與第1配線面9沿著厚度方向隔開間隔而對向配置,且與第1配線面9平行之平坦面。The second wiring surface 10 is a flat surface that is disposed opposite to the first wiring surface 9 in a thickness direction and is parallel to the first wiring surface 9.

配線側面11沿著厚度方向延伸。配線側面11於1個配線部3具備2個。2個配線側面11沿著第1方向相互隔開間隔而對向(相互面對面)配置。The wiring side surface 11 extends in the thickness direction. The wiring side surface 11 includes two wiring sections 3. The two wiring side surfaces 11 are arranged to face each other (to face each other) at intervals in the first direction.

該配線部3具有作為角部之一例之第1角部21、及第2角部22。The wiring portion 3 includes a first corner portion 21 and a second corner portion 22 as an example of the corner portion.

第1角部21係配線部3中由第1配線面9及配線側面11形成之稜線部(第1稜線部)。詳細而言,第1角部21係遍及第1配線面9之第1方向兩端部各者、及連續於其等之配線側面11之厚度方向一端部而形成。每1個配線部3形成有2個第1角部21。The first corner portion 21 is a ridgeline portion (first ridgeline portion) formed by the first wiring surface 9 and the wiring side surface 11 in the wiring portion 3. Specifically, the first corner portion 21 is formed across each of both ends in the first direction of the first wiring surface 9 and one end portion in the thickness direction that is continuous to the wiring side surfaces 11. Two first corner portions 21 are formed for each wiring portion 3.

而且,該第1角部21於剖視下(於沿著厚度方向及第1方向之切斷面上),具有大致彎曲形狀。具體而言,第1角部21具有朝向第1方向外側及厚度方向一側鼓起之彎曲面(詳細而言,為大致圓弧面)23。The first corner portion 21 has a substantially curved shape in a cross-sectional view (on a cut surface along the thickness direction and the first direction). Specifically, the first corner portion 21 has a curved surface (specifically, a substantially circular arc surface) 23 that bulges outward in the first direction and one side in the thickness direction.

形成彎曲面23(圓弧面)之圓C之中心CP例如位於配線部3之內部。The center CP of the circle C forming the curved surface 23 (arc surface) is located inside the wiring portion 3, for example.

形成彎曲面23之圓C之半徑(曲率半徑)R例如為5 μm以上,較佳為9 μm以上,更佳為15 μm以上,進而更佳為20 μm以上,又,例如為30 μm以下。若彎曲面23之曲率半徑R為上述下限以上,則能使彎曲面23較為平緩,從而能更確切地以充足之厚度T形成下文所說明之第2絕緣層4。又,磁性粒子18(下述)於與第1角部21對向之第2絕緣層4,能沿著彎曲面23確切地配向。The radius (curvature radius) R of the circle C forming the curved surface 23 is, for example, 5 μm or more, preferably 9 μm or more, more preferably 15 μm or more, still more preferably 20 μm or more, and 30 μm or less, for example. If the curvature radius R of the curved surface 23 is greater than or equal to the above-mentioned lower limit, the curved surface 23 can be made gentle, and the second insulating layer 4 described below can be formed more accurately with a sufficient thickness T. In addition, the magnetic particles 18 (described below) can be accurately aligned along the curved surface 23 on the second insulating layer 4 facing the first corner portion 21.

若第1角部21之曲率半徑R為上述上限以下,則能無間隙(空隙)地將磁性層5填充於配線側面11之厚度方向中央部50(下述)。When the curvature radius R of the first corner portion 21 is equal to or smaller than the above-mentioned upper limit, the magnetic layer 5 can be filled in the thickness-direction central portion 50 (described below) of the wiring side surface 11 without gaps (voids).

彎曲面23之中心角α係連結圓弧之一端及中心CP之線段與連結圓弧之另一端及中心CP之線段所成之角度,例如未達180度。具體而言,彎曲面23之中心角α例如為45度以上,較佳為60度以上,更佳為80度以上,又,例如為150度以下,較佳為135度以下,更佳為120度以下。若彎曲面23之中心角α為上述下限以上,則能使彎曲面23之長度較長,因此磁性粒子18能確切地沿著(配向於)彎曲面23。若彎曲面23之中心角α為上述下限以上,則能使彎曲面23之長度較長,因此磁性粒子18能確切地沿著(配向於)彎曲面23。若彎曲面23之中心角α為上述上限以下,則能無間隙(空隙)地將磁性層5填充於配線側面11之厚度方向中央部50(下述)。The central angle α of the curved surface 23 is an angle formed by a line segment connecting one end of the arc and the center CP and a line segment connecting the other end of the arc and the center CP, for example, less than 180 degrees. Specifically, the center angle α of the curved surface 23 is, for example, 45 degrees or more, preferably 60 degrees or more, more preferably 80 degrees or more, and, for example, 150 degrees or less, preferably 135 degrees or less, and more preferably 120 degrees. Degrees below. If the central angle α of the curved surface 23 is greater than or equal to the above-mentioned lower limit, the length of the curved surface 23 can be made longer. Therefore, the magnetic particles 18 can be accurately (orientated) along the curved surface 23. If the central angle α of the curved surface 23 is greater than or equal to the above-mentioned lower limit, the length of the curved surface 23 can be made longer. Therefore, the magnetic particles 18 can be accurately (orientated) along the curved surface 23. When the center angle α of the curved surface 23 is equal to or less than the above-mentioned upper limit, the magnetic layer 5 can be filled in the thickness-direction central portion 50 (described below) of the wiring side surface 11 without gaps (voids).

再者,如圖1之放大圖所示,形成彎曲面23之圓C被定義為基於中心CP之圓C,該中心CP係以形成於第1角部21中最大限度地通過(重疊)彎曲面23之圓弧之方式,決定中心CP。而並非基於中心CP'之圓C',該中心CP'係如圖3所示,以形成於第1角部21中略微(最小限度地)通過(重疊)彎曲面23之圓弧之方式,決定中心CP'。Furthermore, as shown in the enlarged view of FIG. 1, the circle C forming the curved surface 23 is defined as a circle C based on a center CP which is formed in the first corner 21 to pass through (overlap) the curve as much as possible. The arc of the face 23 determines the center CP. Instead of the circle C 'based on the center CP', the center CP 'is shown in FIG. 3 and formed in the first corner 21 to pass (overlay) the arc of the curved surface 23 slightly (minimally), Decision center CP '.

第2角部22係配線部3中由第2配線面10及配線側面11形成之稜線部(第2稜線部)。詳細而言,第2角部22係遍及第2配線面10之第1方向兩端部各者、及連續於其等之配線側面11之厚度方向另一端部而形成。每1個配線部3形成有2個第2角部22。The second corner portion 22 is a ridgeline portion (second ridgeline portion) formed by the second wiring surface 10 and the wiring side surface 11 in the wiring portion 3. Specifically, the second corner portion 22 is formed across each of the two end portions in the first direction of the second wiring surface 10 and the other end portion in the thickness direction that is continuous to the wiring side surfaces 11. Two second corner portions 22 are formed for each wiring portion 3.

2個第2角部22各者相對於2個第1角部21各者配置於厚度方向另一側。Each of the two second corner portions 22 is disposed on the other side in the thickness direction with respect to each of the two first corner portions 21.

第2角部22係朝向第1方向外側(第1方向外側傾斜第1方向另一側)尖突之第2尖突部。第2角部22具有傾斜面24、平坦面26(藉由具有該等兩者而劃分)。The second corner portion 22 is a second spike portion that is outward toward the outside in the first direction (the outside of the first direction is inclined toward the other side in the first direction). The second corner portion 22 has an inclined surface 24 and a flat surface 26 (divided by having both).

傾斜面24具有錐形面27作為主要部分。較佳為傾斜面24僅包含錐形面27。傾斜面24自配線側面11之厚度方向中央部(詳細而言,為中央部與另一端部之間附近)50連續,且面向第1方向外側。與2個第2角部22對應之2個傾斜面24於第1方向上相互對向(相互面對面)配置。The inclined surface 24 has a tapered surface 27 as a main part. Preferably, the inclined surface 24 includes only a tapered surface 27. The inclined surface 24 is continuous from the central portion in the thickness direction of the wiring side surface 11 (specifically, the vicinity between the central portion and the other end portion) 50 and faces outward in the first direction. The two inclined surfaces 24 corresponding to the two second corner portions 22 are arranged to face each other (face each other) in the first direction.

錐形面27相對於厚度方向及第1方向傾斜。即,錐形面27沿著相對於厚度方向及第1方向傾斜,且隨著向厚度方向另一側前進而向第1方向外側傾斜之傾斜方向(第1傾斜方向)(參照結合放大圖而表示之方向箭頭)。與2個傾斜面24對應之2個錐形面27係其等之間之長度隨著向厚度方向另一側靠近而變長之2個錐形面(部分之一例)。具體而言,錐形面27以隨著自配線側面11之厚度方向中央部(詳細而言,為中央部與另一端部之間附近)50朝向第2配線面10之第1方向兩端緣(第1絕緣層2之第1絕緣面7)而朝向第1方向外側呈末端寬大狀擴大之方式傾斜。再者,錐形面27之第1方向長度除以厚度方向長度所得之錐度(第1方向長度/厚度方向長度)例如為0.001以上,較佳為0.01以上,更佳為0.1以上,又,例如為1.0以下,較佳為0.75以下。The tapered surface 27 is inclined with respect to the thickness direction and the first direction. That is, the tapered surface 27 is inclined along the thickness direction and the first direction, and is inclined toward the outside of the first direction (the first tilt direction) as it moves toward the other side of the thickness direction (see the enlarged view in conjunction with the enlarged view) Indicates the direction arrow). The two tapered surfaces 27 corresponding to the two inclined surfaces 24 are two tapered surfaces whose length between them becomes longer as they approach the other side in the thickness direction (part of an example). Specifically, the tapered surface 27 faces the edges in the first direction of the second wiring surface 10 so that the central portion (specifically, near the center portion and the other end portion) 50 along the thickness direction of the wiring side surface 11. (The first insulating surface 7 of the first insulating layer 2) is inclined so as to widen toward the outside in the first direction so as to be widened at the ends. The taper (first direction length / thickness direction length) obtained by dividing the first direction length of the tapered surface 27 by the thickness direction length is, for example, 0.001 or more, preferably 0.01 or more, and more preferably 0.1 or more. It is 1.0 or less, and preferably 0.75 or less.

平坦面26係自傾斜面24之厚度方向另一側另一端緣朝向第1方向內側筆直延伸之平面。平坦面26相當於第2配線面10之第1方向兩端緣。平坦面26與第1絕緣面7接觸。The flat surface 26 is a plane that extends straight from the other end edge on the other side in the thickness direction of the inclined surface 24 toward the inside in the first direction. The flat surface 26 corresponds to both ends of the second wiring surface 10 in the first direction. The flat surface 26 is in contact with the first insulating surface 7.

第2角部22之傾斜面24與第1角部21之彎曲面23例如隔著配線側面11之厚度方向中央部50而配置。The inclined surface 24 of the second corner portion 22 and the curved surface 23 of the first corner portion 21 are arranged, for example, across the thickness-direction central portion 50 of the wiring side surface 11.

再者,該第2角部22亦可為與下述配線基部36之第2尖突部45(參照圖2A)相同之形狀。It should be noted that the second corner portion 22 may have the same shape as the second spike portion 45 (see FIG. 2A) of the wiring base portion 36 described below.

配線側面11具備第1角部21之彎曲面23中面向第1方向外側之部分、厚度方向中央部50、及彎曲面23之傾斜面24中面向第1方向外側之部分。The wiring side surface 11 includes a portion of the curved surface 23 of the first corner portion 21 that faces outward in the first direction, a thickness direction central portion 50, and a portion of the inclined surface 24 of the curved surface 23 that faces the outside in the first direction.

再者,2個配線側面11之厚度方向中央部50各者具有朝向第1方向內側收縮之形狀。具體而言,配線側面11具有其等之間之長度於第1方向中央部最短之形狀(收縮部)。In addition, each of the thickness-direction central portions 50 of the two wiring side surfaces 11 has a shape that contracts toward the inside in the first direction. Specifically, the wiring side surface 11 has a shape (constriction) whose length is the shortest at the center portion in the first direction.

再者,如圖2B之假想線所示,配線部3例如具備配線基部36、及形成於其厚度方向一面及兩側面之鍍覆層30。Further, as shown by an imaginary line in FIG. 2B, the wiring portion 3 includes, for example, a wiring base portion 36 and a plating layer 30 formed on one surface and both side surfaces in the thickness direction.

作為配線部3之材料,例如可列舉銅、鎳、金、錫等金屬或該等金屬之合金等導體,較佳列舉銅。Examples of the material of the wiring section 3 include metals such as copper, nickel, gold, and tin, or conductors of alloys of these metals, and preferably copper.

配線部3之厚度係第1配線面9與第2配線面10之間之長度,具體而言,例如為10 μm以上,較佳為30 μm以上,又,例如為500 μm以下,較佳為250 μm以下。The thickness of the wiring portion 3 is the length between the first wiring surface 9 and the second wiring surface 10, and specifically, it is, for example, 10 μm or more, preferably 30 μm or more, and, for example, 500 μm or less, preferably 250 μm or less.

配線部3之寬度作為相互面對面之2個第1角部21之第1方向上之端緣間之距離,例如為20 μm以上,較佳為50 μm以上,又,例如為2000 μm以下,較佳為1000 μm以下。The width of the wiring portion 3 is the distance between the end edges in the first direction of the two first corner portions 21 facing each other, for example, 20 μm or more, preferably 50 μm or more, and, for example, 2000 μm or less. It is preferably 1000 μm or less.

相鄰之配線部3間之間隔作為隔著第2絕緣層4(下述)及磁性層5(下述)而相鄰之第1角部21之第1方向端緣間之間隔,例如為20 μm以上,較佳為50 μm以上,又,例如為1000 μm以下,較佳為500 μm以下。
配線部3之厚度相對於配線部3之寬度之比(厚度/寬度)例如為0.005以上,較佳為0.03以上,又,例如為25以下,較佳為5以下。配線部3之厚度相對於相鄰之配線部3間之間隔之比(厚度/間隔)例如為0.01以上,較佳為0.06以上,又,例如為25以下,較佳為5以下。配線部3之寬度相對於相鄰之配線部3間之間隔之比(寬度/間隔)例如為0.02以上,較佳為0.01以上,又,例如為100以下,較佳為20以下。
The interval between the adjacent wiring portions 3 is defined as the interval between the first direction end edges of the adjacent first corner portions 21 via the second insulating layer 4 (described below) and the magnetic layer 5 (described below). 20 μm or more, preferably 50 μm or more, and, for example, 1000 μm or less, and preferably 500 μm or less.
The ratio (thickness / width) of the thickness of the wiring portion 3 to the width of the wiring portion 3 is, for example, 0.005 or more, preferably 0.03 or more, and, for example, 25 or less, and preferably 5 or less. The ratio (thickness / interval) of the thickness of the wiring portion 3 to the interval between adjacent wiring portions 3 is, for example, 0.01 or more, preferably 0.06 or more, and, for example, 25 or less, and preferably 5 or less. The ratio (width / interval) of the width of the wiring portion 3 to the interval between adjacent wiring portions 3 is, for example, 0.02 or more, preferably 0.01 or more, and, for example, 100 or less, and preferably 20 or less.

再者,配線部3連同上述第1絕緣層2一併配備於配線電路基板準備體6。即,配線電路基板準備體6不具備下文所說明之第2絕緣層4及磁性層5,而具備第1絕緣層2、配線部3。較佳為配線電路基板準備體6僅包含第1絕緣層2及配線部3。The wiring portion 3 is provided on the printed circuit board preparation 6 together with the first insulating layer 2. That is, the printed circuit board preparation 6 does not include the second insulating layer 4 and the magnetic layer 5 described below, but includes the first insulating layer 2 and the wiring portion 3. Preferably, the printed circuit board preparation 6 includes only the first insulating layer 2 and the wiring portion 3.

第2絕緣層4與複數個配線部3對應而設置有複數個。第2絕緣層4沿著配線部3之第1配線面9及配線側面11(包含彎曲面23及傾斜面24)形成為薄膜狀。第2絕緣層4具備與第1配線面9及配線側面11接觸之第4絕緣面13、以及隔開間隔配置於第4絕緣面13之厚度方向一側或第1方向外側之第3絕緣面12。The second insulating layer 4 is provided corresponding to the plurality of wiring portions 3. The second insulating layer 4 is formed in a thin film shape along the first wiring surface 9 and the wiring side surface 11 (including the curved surface 23 and the inclined surface 24) of the wiring portion 3. The second insulating layer 4 includes a fourth insulating surface 13 that is in contact with the first wiring surface 9 and the wiring side surface 11, and a third insulating surface that is disposed on the thickness direction side of the fourth insulation surface 13 or outside the first direction at intervals. 12.

第4絕緣面13具有與第1配線面9及配線側面11對應(具體而言,相同)之形狀。The fourth insulating surface 13 has a shape corresponding to the first wiring surface 9 and the wiring side surface 11 (specifically, the same).

第3絕緣面12具有追隨於第4絕緣面13之形狀,以確保第2絕緣層4之厚度T。第3絕緣面12具有與第4絕緣面13平行之形狀。The third insulating surface 12 has a shape following the fourth insulating surface 13 to ensure the thickness T of the second insulating layer 4. The third insulating surface 12 has a shape parallel to the fourth insulating surface 13.

又,第2絕緣層4例如為電沈積層(下述)、塗佈層(下述)等,較佳為電沈積層。The second insulating layer 4 is, for example, an electrodeposited layer (described below), a coating layer (described below), or the like, and is preferably an electrodeposited layer.

第2絕緣層4例如相對較為柔軟(尤其是,具有於下述第3步驟(參照圖2D)中之熱壓時變得柔軟之性質),另一方面不具有磁性。具體而言,作為第2絕緣層4之材料,可列舉不含磁性粒子18(將於下述磁性層5中詳細敍述)之樹脂等。作為第2絕緣層4之樹脂,較佳為於水中具有離子性之樹脂,具體而言,可列舉丙烯酸系樹脂、環氧系樹脂、聚醯亞胺系樹脂、其等之混合物等。The second insulating layer 4 is relatively soft, for example (especially, it has a property that it becomes soft during heat pressing in the third step (see FIG. 2D) described below), and is not magnetic. Specifically, as the material of the second insulating layer 4, a resin or the like that does not contain magnetic particles 18 (to be described in detail later in the magnetic layer 5) can be mentioned. The resin of the second insulating layer 4 is preferably a resin having an ionic property in water. Specific examples include acrylic resins, epoxy resins, polyimide resins, and mixtures thereof.

第2絕緣層4之厚度T相對較薄,作為其平均厚度,例如為20 μm以下,較佳為15 μm以下,更佳為10 μm以下,進而更佳為7.5 μm,尤佳為5 μm以下,最佳為3 μm以下,又,例如為0.1 μm以上,較佳為0.5 μm以上,更佳為1 μm以上。The thickness T of the second insulating layer 4 is relatively thin, and the average thickness is, for example, 20 μm or less, preferably 15 μm or less, more preferably 10 μm or less, even more preferably 7.5 μm, and even more preferably 5 μm or less. Is preferably 3 μm or less, and is, for example, 0.1 μm or more, preferably 0.5 μm or more, and more preferably 1 μm or more.

若第2絕緣層4之厚度T薄至上述上限以下,則能提高下文所說明之磁性層5之實效磁導率,從而提高磁性配線電路基板1之電感。If the thickness T of the second insulating layer 4 is less than the above-mentioned upper limit, the effective magnetic permeability of the magnetic layer 5 described below can be increased, thereby increasing the inductance of the magnetic wiring circuit board 1.

另一方面,若第2絕緣層4過薄,則下述磁性層5中之磁性粒子容易貫通第2絕緣層4而與配線部3接觸。On the other hand, when the second insulating layer 4 is too thin, magnetic particles in the magnetic layer 5 described below easily penetrate the second insulating layer 4 and come into contact with the wiring portion 3.

但於該磁性配線電路基板1中,配線部3之第1角部21具有大致彎曲形狀,故而第2絕緣層4之厚度T能抑制第2絕緣層4變得過薄,抑制第2絕緣層4被磁性粒子18貫通,從而確保第2絕緣層4之絕緣性。However, in this magnetic wiring circuit board 1, the first corner portion 21 of the wiring portion 3 has a substantially curved shape, so the thickness T of the second insulating layer 4 can suppress the second insulating layer 4 from becoming too thin and the second insulating layer. 4 is penetrated by the magnetic particles 18 to ensure the insulation of the second insulating layer 4.

再者,容許第2絕緣層4之被覆第1角部21之部分之厚度T1與第2絕緣層4之被覆上述第1角部21以外之部分(例如,配線側面11之厚度方向中央部50及/或第1配線面9之第1方向中央部)之部分之厚度T0相同,或相對於厚度T0略小。In addition, the thickness T1 of the portion of the second insulating layer 4 that covers the first corner portion 21 and the portion of the second insulating layer 4 that covers the first corner portion 21 (for example, the thickness direction central portion 50 of the wiring side surface 11) are allowed. And / or the first wiring surface 9 in the first direction center portion) has the same thickness T0 or is slightly smaller than the thickness T0.

於第2絕緣層4中,被覆第1角部21之部分之厚度T1之相對於被覆第1角部21以外之部分之部分之厚度T0之比(T1/T0)例如為1以下,較佳為未達1,更佳為0.95以下,進而更佳為0.9以下,又,例如為0.7以上,較佳為0.8以上。In the second insulating layer 4, the ratio (T1 / T0) of the thickness T1 of the portion covering the first corner portion 21 to the thickness T0 of the portion covering the portion other than the first corner portion 21 is, for example, 1 or less, preferably It is less than 1, more preferably 0.95 or less, still more preferably 0.9 or less, and, for example, 0.7 or more, and more preferably 0.8 or more.

第2絕緣層4之被覆第1角部21之部分之厚度T1例如為0.5 μm以上,較佳為1 μm以上,又,例如為10 μm以下,較佳為7 μm以下。The thickness T1 of the portion of the second insulating layer 4 covering the first corner portion 21 is, for example, 0.5 μm or more, preferably 1 μm or more, and, for example, 10 μm or less, and preferably 7 μm or less.

第2絕緣層4之被覆其他部分之部分之厚度T0例如為0.52 μm以上,較佳為1.04 μm以上,又,例如為14.49 μm以下,較佳為10.14 μm以下。The thickness T0 of the second insulating layer 4 covering other parts is, for example, 0.52 μm or more, preferably 1.04 μm or more, and, for example, 14.49 μm or less, and preferably 10.14 μm or less.

再者,第2絕緣層4之平均厚度係藉由將上述厚度T1及T0按其面積比分攤而算出。The average thickness of the second insulating layer 4 is calculated by allocating the thicknesses T1 and T0 according to their area ratios.

磁性層5為了提高磁性配線電路基板1之電感,而相對於配線電路基板準備體6設置。磁性層5具有沿著面方向延伸之形狀。The magnetic layer 5 is provided for the printed circuit board preparation 6 in order to increase the inductance of the magnetic printed circuit board 1. The magnetic layer 5 has a shape extending in the plane direction.

磁性層5隔著第2絕緣層4埋設有配線部3。具體而言,磁性層5隔著第2絕緣層4,被覆配線部3之第1配線面9及配線側面11(包含彎曲面23及傾斜面24)。又,磁性層5於第1絕緣層2之第1絕緣面7,被覆自第2絕緣層4露出之露出面16。The magnetic layer 5 is embedded with a wiring portion 3 via a second insulating layer 4. Specifically, the magnetic layer 5 covers the first wiring surface 9 and the wiring side surface 11 (including the curved surface 23 and the inclined surface 24) of the wiring portion 3 via the second insulating layer 4. The magnetic layer 5 covers the first insulating surface 7 of the first insulating layer 2 and covers the exposed surface 16 exposed from the second insulating layer 4.

磁性層5具有第1磁性面14、第2磁性面15。The magnetic layer 5 includes a first magnetic surface 14 and a second magnetic surface 15.

第1磁性面14相對於第2絕緣層4之第3絕緣面12隔開間隔配置於厚度方向一側。第1磁性面14露出於厚度方向一側。第1磁性面14具有:複數個凸部28,其等與複數個配線部3對應,朝向厚度方向一側隆起;及凹部29,其配置於彼此相鄰之凸部13之間,且相對於凸部28朝向厚度方向另一側下沉。The first magnetic surface 14 is disposed on the thickness-direction side of the third insulating surface 12 of the second insulating layer 4 at intervals. The first magnetic surface 14 is exposed on one side in the thickness direction. The first magnetic surface 14 includes a plurality of convex portions 28 corresponding to the plurality of wiring portions 3 and protruding toward one side in the thickness direction; and a concave portion 29 disposed between the convex portions 13 adjacent to each other and opposite to The convex portion 28 sinks toward the other side in the thickness direction.

第2磁性面15隔開間隔配置於第1磁性面14之厚度方向另一側。
第2磁性面15連續於第3絕緣面12、露出面16,且與其等接觸。
The second magnetic surface 15 is disposed on the other side in the thickness direction of the first magnetic surface 14 at intervals.
The second magnetic surface 15 is continuous with the third insulating surface 12 and the exposed surface 16 and is in contact therewith.

磁性層5例如含有磁性粒子18。具體而言,作為磁性層5之材料,例如可列舉含有縱橫比為2以上之磁性粒子18及樹脂成分19之磁性組合物等。The magnetic layer 5 contains, for example, magnetic particles 18. Specifically, examples of the material of the magnetic layer 5 include a magnetic composition containing magnetic particles 18 and a resin component 19 having an aspect ratio of 2 or more.

作為構成磁性粒子18之磁性材料,例如可列舉軟磁性體、硬磁性體。自電感之觀點而言,較佳列舉軟磁性體。Examples of the magnetic material constituting the magnetic particles 18 include a soft magnetic body and a hard magnetic body. From the viewpoint of inductance, a soft magnetic body is preferred.

作為軟磁性體,可列舉:例如,以純物質之狀態含有1種金屬元素之單一金屬體;例如,1種以上金屬元素(第1金屬元素)與1種以上金屬元素(第2金屬元素)及/或非金屬元素(碳、氮、矽、磷等)之共融體(混合物)即合金體。其等可單獨使用或併用。Examples of the soft magnetic body include: a single metal body containing one metal element in a pure substance state; for example, one or more metal elements (first metal element) and one or more metal elements (second metal element); and The alloy body is the eutectic body (mixture) of non-metal elements (carbon, nitrogen, silicon, phosphorus, etc.). These can be used alone or in combination.

作為單一金屬體,例如可列舉僅由1種金屬元素(第1金屬元素)構成之金屬單體。作為第1金屬元素,例如,自鐵(Fe)、鈷(Co)、鎳(Ni)及其他能作為軟磁性體之第1金屬元素而含有之金屬元素當中適當選擇。Examples of the single metal body include a metal monomer composed of only one metal element (first metal element). As the first metal element, for example, iron (Fe), cobalt (Co), nickel (Ni), and other metal elements that can be contained as the first metal element of the soft magnetic body are appropriately selected.

又,作為單一金屬體,可列舉:例如,包含僅含有1種金屬元素之核、及含有將該核之表面之一部分或全部改質之無機物及/或有機物之表面層的形態;例如,將含有第1金屬元素之有機金屬化合物或無機金屬化合物分解(熱分解等)的形態等。作為後一種形態,更具體列舉:將含有鐵作為第1金屬元素之有機鐵化合物(具體而言,為羰基鐵)熱分解所得之鐵粉(有時稱作羰基鐵粉)等。再者,包含將僅含有1種金屬元素之部分改質之無機物及/或有機物之層的位置並不限定於如上所述之表面。再者,作為能獲得單一金屬體之有機金屬化合物或無機金屬化合物,並不特別限制,而可自能獲得軟磁性體之單一金屬體之公知至慣用之有機金屬化合物或無機金屬化合物中適當選擇。Examples of the single metal body include the form of a surface layer including a core containing only one metal element, and a surface layer containing an inorganic substance and / or an organic substance partially or entirely modified from a part of the surface of the core; A form in which the organometallic compound or the inorganic metal compound containing the first metal element is decomposed (such as thermal decomposition). As the latter aspect, an iron powder (sometimes referred to as a carbonyl iron powder) obtained by thermally decomposing an organic iron compound (specifically, carbonyl iron) containing iron as the first metal element may be mentioned. In addition, the position of a layer including a partially modified inorganic substance and / or organic substance containing only one metal element is not limited to the surface as described above. Moreover, as the organometallic compound or the inorganic metal compound capable of obtaining a single metal body, it is not particularly limited, and it can be appropriately selected from known to conventional organometallic compounds or inorganic metal compounds that can obtain a single metal body of the soft magnetic body. .

合金體係1種以上金屬元素(第1金屬元素)與1種以上金屬元素(第2金屬元素)及/或非金屬元素(碳、氮、矽、磷等)之共融體,只要為可用作軟磁性體之合金體者即可,並不特別限制。A blend of more than one metal element (first metal element) and more than one metal element (second metal element) and / or non-metal elements (carbon, nitrogen, silicon, phosphorus, etc.) in the alloy system, as long as it is available It is not particularly limited as long as it is an alloy body of a soft magnetic body.

第1金屬元素係合金體中之必要元素,例如可列舉鐵(Fe)、鈷(Co)、鎳(Ni)等。再者,若第1金屬元素為Fe,則合金體稱作Fe系合金,若第1金屬元素為Co,則合金體稱作Co系合金,若第1金屬元素為Ni,則合金體稱作Ni系合金。Examples of essential elements in the first metal element-based alloy include iron (Fe), cobalt (Co), and nickel (Ni). If the first metal element is Fe, the alloy body is called an Fe-based alloy, if the first metal element is Co, the alloy body is called a Co-based alloy, and if the first metal element is Ni, the alloy body is called Ni-based alloy.

第2金屬元素係次要含有於合金體中之元素(副成分),且係與第1金屬元素相融(共融)之金屬元素,例如可列舉鐵(Fe)(於第1金屬元素為Fe以外之情形時)、鈷(Co)(於第1金屬元素為Co以外之情形時)、鎳(Ni)(於第1金屬元素為Ni以外之情形時)、鉻(Cr)、鋁(Al)、矽(Si)、銅(Cu)、銀(Ag)、錳(Mn)、鈣(Ca)、鋇(Ba)、鈦(Ti)、鋯(Zr)、鉿(Hf)、釩(V)、鈮(Nb)、鉭(Ta)、鉬(Mo)、鎢(W)、釕(Ru)、銠(Rh)、鋅(Zn)、鎵(Ga)、銦(In)、鍺(Ge)、錫(Sn)、鉛(Pb)、鈧(Sc)、釔(Y)、鍶(Sr)、各種稀土類元素等。其等可單獨使用或2種以上併用。The second metal element is an element (secondary component) that is contained in the alloy body in a minor manner, and is a metal element that is fused (co-fused) with the first metal element. For example, iron (Fe) (in the first metal element is (When other than Fe), cobalt (Co) (when the first metal element is other than Co), nickel (Ni) (when the first metal element is other than Ni), chromium (Cr), aluminum ( Al), silicon (Si), copper (Cu), silver (Ag), manganese (Mn), calcium (Ca), barium (Ba), titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium ( V), niobium (Nb), tantalum (Ta), molybdenum (Mo), tungsten (W), ruthenium (Ru), rhodium (Rh), zinc (Zn), gallium (Ga), indium (In), germanium ( Ge), tin (Sn), lead (Pb), scandium (Sc), yttrium (Y), strontium (Sr), various rare earth elements, and the like. These can be used alone or in combination of two or more.

非金屬元素係次要含有於合金體中之元素(副成分),且係與第1金屬元素相融(共融)之非金屬元素,例如可列舉硼(B)、碳(C)、氮(N)、矽(Si)、磷(P)、硫(S)等。其等可單獨使用或2種以上併用。Non-metallic elements are elements (subcomponents) that are contained in the alloy body, and are non-metallic elements that are compatible (co-fused) with the first metal element. Examples include boron (B), carbon (C), and nitrogen. (N), silicon (Si), phosphorus (P), sulfur (S), and the like. These can be used alone or in combination of two or more.

作為合金體之一例,如Fe系合金,例如可列舉磁性不鏽鋼(Fe-Cr-Al-Si合金)(包括電磁不鏽鋼)、鐵矽鋁合金(Fe-Si-Al合金)(包括超鐵矽鋁合金)、鎳鐵合金(Fe-Ni合金)、Fe-Ni-Mo合金、Fe-Ni-Mo-Cu合金、Fe-Ni-Co合金、Fe-Cr合金、Fe-Cr-Al合金、Fe-Ni-Cr合金、Fe-Ni-Cr-Si合金、矽銅(Fe-Cu-Si合金)、Fe-Si合金、Fe-Si-B(-Cu-Nb)合金、Fe-B-Si-Cr合金、Fe-Si-Cr-Ni合金、Fe-Si-Cr合金、Fe-Si-Al-Ni-Cr合金、Fe-Ni-Si-Co合金、Fe-N合金、Fe-C合金、Fe-B合金、Fe-P合金、鐵氧體(不鏽鋼系鐵氧體,進而包括Mn-Mg系鐵氧體、Mn-Zn系鐵氧體、Ni-Zn系鐵氧體、Ni-Zn-Cu系鐵氧體、Cu-Zn系鐵氧體、Cu-Mg-Zn系鐵氧體等軟鐵氧體)、鐵鈷合金(Fe-Co合金)、Fe-Co-V合金、Fe基非晶合金等。Examples of the alloy body include Fe-based alloys, for example, magnetic stainless steel (Fe-Cr-Al-Si alloy) (including electromagnetic stainless steel), and iron-silicon aluminum alloy (Fe-Si-Al alloy) (including super iron silicon aluminum) Alloy), nickel-iron alloy (Fe-Ni alloy), Fe-Ni-Mo alloy, Fe-Ni-Mo-Cu alloy, Fe-Ni-Co alloy, Fe-Cr alloy, Fe-Cr-Al alloy, Fe-Ni -Cr alloy, Fe-Ni-Cr-Si alloy, silicon copper (Fe-Cu-Si alloy), Fe-Si alloy, Fe-Si-B (-Cu-Nb) alloy, Fe-B-Si-Cr alloy , Fe-Si-Cr-Ni alloy, Fe-Si-Cr alloy, Fe-Si-Al-Ni-Cr alloy, Fe-Ni-Si-Co alloy, Fe-N alloy, Fe-C alloy, Fe-B Alloys, Fe-P alloys, ferrites (stainless steel-based ferrites, further including Mn-Mg-based ferrites, Mn-Zn-based ferrites, Ni-Zn-based ferrites, Ni-Zn-Cu-based iron (Ferrite, Cu-Zn-based ferrite, Cu-Mg-Zn-based ferrite and other soft ferrite), iron-cobalt alloy (Fe-Co alloy), Fe-Co-V alloy, Fe-based amorphous alloy, etc. .

作為合金體之一例,如Co系合金,例如可列舉Co-Ta-Zr、鈷(Co)基非晶合金等。Examples of the alloy body include a Co-based alloy, and examples thereof include Co-Ta-Zr, a cobalt (Co) -based amorphous alloy, and the like.

作為合金體之一例,如Ni系合金,例如可列舉Ni-Cr合金等。An example of the alloy body is a Ni-based alloy, and examples thereof include a Ni-Cr alloy.

該等軟磁性體之中,自磁性特性之點,較佳列舉合金體,更佳為列舉Fe系合金,進而更佳為列舉鐵矽鋁合金(Fe-Si-Al合金),自獲得較高磁導率之觀點而言,尤佳為列舉含Si率為9~15質量%之鐵矽鋁合金。又,作為軟磁性體,較佳列舉單一金屬體,更佳為列舉以純物質之狀態含有鐵元素之單一金屬體,進而更佳為列舉鐵單體或鐵粉(羰基鐵粉)。Among these soft magnetic bodies, from the viewpoint of self-magnetic properties, alloy bodies are more preferable, Fe-based alloys are more preferable, and iron-silicon aluminum alloys (Fe-Si-Al alloys) are more preferable. From the viewpoint of magnetic permeability, an iron-silicon aluminum alloy containing a Si content of 9 to 15% by mass is particularly preferred. Further, as the soft magnetic body, a single metal body is preferably used, more preferably a single metal body containing iron in a pure substance state, and even more preferably an iron monomer or iron powder (carbonyl iron powder).

作為磁性粒子18之形狀,可列舉例如厚度較薄且面較廣之扁平形狀(板形狀)、例如針形狀等具有各向異性之形狀。又,亦可進而含有非各向異性之磁性粒子。非各向異性之磁性粒子例如可具有球狀、顆粒狀、塊狀、丸狀等形狀。作為磁性粒子18之形狀,較佳列舉具有各向異性之形狀。Examples of the shape of the magnetic particles 18 include a flat shape (plate shape) having a thin thickness and a wide surface, and an anisotropic shape such as a needle shape. Further, it may further contain non-anisotropic magnetic particles. The non-anisotropic magnetic particles may have a shape such as a spherical shape, a granular shape, a block shape, or a pellet shape. As the shape of the magnetic particles 18, a shape having an anisotropy is preferable.

磁性粒子18為扁平狀之情形時之磁性粒子之縱橫比為2以上,較佳為5以上,更佳為10以上,進而更佳為20以上,又,為100以下。When the magnetic particles 18 are flat, the aspect ratio of the magnetic particles is 2 or more, preferably 5 or more, more preferably 10 or more, still more preferably 20 or more, and 100 or less.

再者,磁性粒子18為扁平狀之情形時之扁平率(扁平度)例如為8以上,較佳為15以上,又,例如為500以下,較佳為450以下。扁平率例如為磁性粒子18之平均粒徑(平均長度)除以磁性粒子18之平均厚度所得之縱橫比。When the magnetic particles 18 are flat, the flattening ratio (flatness) is, for example, 8 or more, preferably 15 or more, and, for example, 500 or less, and preferably 450 or less. The flattening ratio is, for example, an aspect ratio obtained by dividing the average particle diameter (average length) of the magnetic particles 18 by the average thickness of the magnetic particles 18.

磁性粒子18於磁性層5(磁性組合物)中之含有比率例如為50體積%以上,較佳為55體積%以上,又,例如為95體積%以下,較佳為90體積%以下。The content ratio of the magnetic particles 18 in the magnetic layer 5 (magnetic composition) is, for example, 50 vol% or more, preferably 55 vol% or more, and, for example, 95 vol% or less, and preferably 90 vol% or less.

作為樹脂成分19,例如可列舉含有環氧樹脂、硬化劑及硬化促進劑之環氧樹脂組合物等熱硬化性樹脂。再者,此種磁性組合物例如於日本專利特開2017-005115號公報、日本專利特開2015-092543號公報等中有所記載。Examples of the resin component 19 include thermosetting resins such as an epoxy resin composition containing an epoxy resin, a curing agent, and a curing accelerator. Such a magnetic composition is described in, for example, Japanese Patent Laid-Open No. 2017-005115, Japanese Patent Laid-Open No. 2015-092543, and the like.

關於磁性配線電路基板1之厚度,作為其最大厚度(與凸部28對應之厚度),例如為30 μm以上,較佳為50 μm以上,又,例如為1000 μm以下,較佳為800 μm以下。Regarding the thickness of the magnetic wiring circuit board 1, the maximum thickness (thickness corresponding to the convex portion 28) is, for example, 30 μm or more, preferably 50 μm or more, and, for example, 1000 μm or less, and preferably 800 μm or less. .

其次,參照圖2A~圖2D,對該磁性配線電路基板1之製造方法進行說明。Next, a method of manufacturing the magnetic wiring circuit board 1 will be described with reference to FIGS. 2A to 2D.

該製造方法包含作為準備第1絕緣層2與配線部3之步驟之一例之第1步驟(參照圖2A及圖2B)、形成第2絕緣層4之第2步驟(參照圖2C)、及作為形成磁性層5之步驟之一例之第3步驟(參照圖2D)。This manufacturing method includes a first step (see FIG. 2A and FIG. 2B) as an example of a step of preparing the first insulating layer 2 and the wiring portion 3, a second step (see FIG. 2C) of forming the second insulating layer 4, and as The third step is an example of the step of forming the magnetic layer 5 (see FIG. 2D).

如圖2A及圖2B所示,於第1步驟中,準備具備第1絕緣層2及配線部3之配線電路基板準備體6。該第1步驟包含準備第1絕緣層2之步驟(參照圖2A)、形成配線基部36之第4步驟(參照圖2A)、及形成鍍覆層30之第5步驟(參照圖2B)。As shown in FIGS. 2A and 2B, in a first step, a printed circuit board preparation body 6 including a first insulating layer 2 and a wiring portion 3 is prepared. This first step includes a step of preparing a first insulating layer 2 (see FIG. 2A), a fourth step of forming a wiring base 36 (see FIG. 2A), and a fifth step of forming a plating layer 30 (see FIG. 2B).

於第4步驟中,藉由例如減成法、加成法等導體圖案化方法,於第1絕緣層2之第1絕緣面7形成配線基部36。In the fourth step, the wiring base portion 36 is formed on the first insulating surface 7 of the first insulating layer 2 by a conductor patterning method such as a subtractive method or an additive method.

藉由減成法形成配線基部36時,首先準備包含第1絕緣層2及導體層(金屬層)之積層體(未圖示),繼而以與配線基部36相同之圖案,於導體層之厚度方向一面形成抗蝕層。繼而,藉由例如濕式蝕刻、乾式蝕刻等蝕刻將自抗蝕層露出之導體層圖案化,而形成配線基部36。較佳為藉由濕式蝕刻形成配線基部36。其後,藉由例如剝離等將抗蝕層去除。When forming the wiring base portion 36 by the subtractive method, a multilayer body (not shown) including the first insulating layer 2 and a conductor layer (metal layer) is first prepared, and then the thickness of the conductor layer is the same as the pattern of the wiring base portion 36. A resist layer is formed on one side. Then, the conductive layer exposed from the resist layer is patterned by etching such as wet etching and dry etching to form the wiring base 36. The wiring base 36 is preferably formed by wet etching. Thereafter, the resist layer is removed by, for example, peeling.

藉由加成法形成配線基部36時,首先於第1絕緣層2之第1絕緣面7形成導體薄膜(種膜),繼而於導體薄膜之厚度方向一面,形成圖案與配線基部36相反之抗鍍覆層。繼而,藉由鍍覆,於自抗鍍覆層露出之導體薄膜形成配線基部36。其後,將抗鍍覆層及與之對應之導體薄膜去除。When the wiring base 36 is formed by the additive method, a conductor film (seed film) is first formed on the first insulating surface 7 of the first insulating layer 2, and then a pattern opposite to the wiring base 36 is formed on the side of the thickness direction of the conductor film. Plating. Then, the wiring base 36 is formed on the conductive film exposed from the anti-plating layer by plating. Thereafter, the anti-plating layer and the corresponding conductive film are removed.

作為導體圖案化方法,較佳列舉減成法。若為減成法,則與加成法相比,能迅速地形成具有較厚厚度之配線基部36。As the conductor patterning method, a subtractive method is preferably cited. In the subtractive method, the wiring base portion 36 having a relatively thick thickness can be formed more quickly than the additive method.

另一方面,若採用減成法形成配線基部36,則會於配線基部36形成第1尖突部25,但如下所述,因第1尖突部25而導致第2絕緣層4變薄之情況能利用藉由下述第5步驟形成之鍍覆層30加以消除。On the other hand, if the wiring base portion 36 is formed by the subtractive method, the first spike portion 25 is formed on the wiring base portion 36. However, as described below, the second insulating layer 4 becomes thin due to the first spike portion 25. This situation can be eliminated by using the plating layer 30 formed in the fifth step described below.

再者,該配線基部36係用以形成配線部3之基部(基台),與下述鍍覆層30一併形成配線部3。即,並不僅由圖2A所示之配線基部36構成配線部3。The wiring base portion 36 is a base portion (base) for forming the wiring portion 3, and the wiring portion 3 is formed together with the plating layer 30 described below. That is, the wiring portion 3 is not limited to the wiring base portion 36 shown in FIG. 2A.

配線基部36具有與第1角部21對應之第1尖突部25、與厚度方向中央部50對應之基部中央側面51、及與第2角部22對應之第2尖突部45。The wiring base portion 36 includes a first spike portion 25 corresponding to the first corner portion 21, a base portion central side surface 51 corresponding to the thickness direction central portion 50, and a second spike portion 45 corresponding to the second corner portion 22.

第1尖突部25係配線基部36中由厚度方向一面及側面形成之稜線部。第1尖突部25朝向第1方向外側傾斜第1方向一側尖銳地尖突。第1尖突部25之角度(由第1配線面9及配線側面11之端部形成之角度)β1例如為135度以下,較佳為120度以下,更佳為90度以下,又,例如為30度以上,較佳為45度以上。The first spiky portion 25 is a ridgeline portion formed on the wiring base portion 36 from one surface and the side surface in the thickness direction. The first spiky portion 25 is sharply pointed toward the outer side of the first direction, and the side of the first direction is sharply pointed. The angle (the angle formed by the ends of the first wiring surface 9 and the wiring side surface 11) of the first spike 25 is, for example, 135 degrees or less, preferably 120 degrees or less, and more preferably 90 degrees or less. It is 30 degrees or more, preferably 45 degrees or more.

第2尖突部45係配線基部36中由厚度方向另一面及側面形成之稜線部。第2尖突部45朝向第1方向外側傾斜第1方向另一側尖銳地尖突。第2尖突部45之角度(由第2配線面10及配線側面11之端部形成之角度)β2例如為35度以上,較佳為45度以上,更佳為80度超過,又,例如為150度以下,較佳為135度以下。The second spike portion 45 is a ridge portion formed on the wiring base portion 36 from the other surface and the side surface in the thickness direction. The second spiky portion 45 inclines sharply toward the outside in the first direction and the other side in the first direction is sharply pointed. The angle (the angle formed by the ends of the second wiring surface 10 and the wiring side surface 11) of the second spike 45 is, for example, 35 ° or more, preferably 45 ° or more, and more preferably 80 ° or more. For example, It is 150 degrees or less, and preferably 135 degrees or less.

基部中央側面51係將第1尖突部25及第2尖突部45於厚度方向上連結之連結面。The base central side surface 51 is a connecting surface that connects the first spiked portion 25 and the second spiked portion 45 in the thickness direction.

配線基部36之材料與上述配線部3之材料相同。The material of the wiring base portion 36 is the same as that of the wiring portion 3 described above.

於第5步驟中,如圖2B所示,其後於配線基部36形成鍍覆層30。In a fifth step, as shown in FIG. 2B, a plating layer 30 is formed on the wiring base 36.

作為鍍覆層30之材料,自配線基部36之材料適當選擇,較佳為與配線基部36之材料相同。As the material of the plating layer 30, the material of the wiring base portion 36 is appropriately selected, and is preferably the same as the material of the wiring base portion 36.

藉由鍍覆,形成鍍覆層30。The plating layer 30 is formed by plating.

作為鍍覆,例如可列舉電解鍍覆、無電解鍍覆等。自將鍍覆層30形成得較厚之觀點而言,較佳列舉電解鍍覆(更佳為電解銅鍍覆)。Examples of the plating include electrolytic plating and electroless plating. From the viewpoint of forming the plating layer 30 thicker, electrolytic plating (more preferably, electrolytic copper plating) is mentioned.

藉由鍍覆,於配線基部36之厚度方向一面及兩側面,積層鍍覆層30。於鍍覆中,鍍覆層30呈析出狀形成於配線基部36之厚度方向一面及兩側面。The plating layer 30 is laminated on one and both sides of the wiring base 36 in the thickness direction by plating. In the plating, the plating layer 30 is formed in a precipitate shape on one side and both sides in the thickness direction of the wiring base portion 36.

藉由該鍍覆,於第1尖突部25,作為朝向厚度方向一側及第1方向外側生長(鍍覆生長)之被覆部之一例之第1被覆部31析出。該第1被覆部31形成具備彎曲面23之第1角部21。By this plating, the first coating portion 31 is deposited on the first spiked portion 25 as an example of a coating portion that grows (plating growth) toward one side in the thickness direction and outside in the first direction. The first covering portion 31 forms a first corner portion 21 including a curved surface 23.

另一方面,於配線基部36之第1尖突部25以外之部分(包含第2尖突部45及厚度方向中央部50之部分),朝向厚度方向一側或第1方向外側生長(鍍覆生長)之第2被覆部32析出。該第2被覆部32形成配線基部36之厚度方向一面及兩側面(其中,為除了第1角部21之部分,且為包含厚度方向中央部50及傾斜面24之部分)。On the other hand, the portion other than the first spike portion 25 of the wiring base portion 36 (the portion including the second spike portion 45 and the thickness-direction central portion 50) grows toward the thickness direction side or the first direction outside (plating) (Growth) second coating portion 32 is deposited. The second covering portion 32 forms one surface and two side surfaces in the thickness direction of the wiring base portion 36 (wherein, the portion except the first corner portion 21 and a portion including the thickness direction central portion 50 and the inclined surface 24).

即,該鍍覆層30具備第1被覆部31及第2被覆部32。較佳為鍍覆層30僅包含第1被覆部31及第2被覆部32。That is, the plating layer 30 includes a first coating portion 31 and a second coating portion 32. Preferably, the plating layer 30 includes only the first coating portion 31 and the second coating portion 32.

第1被覆部31係藉由鍍覆成分自第1尖突部25呈剖視大致放射狀(除了第1尖突部25之內部之方向,扇狀)鍍覆生長而形成。因此,第1被覆部31具有彎曲面23。The first coating portion 31 is formed by plating and growing in a substantially radial shape (except for the direction inside the first sharp portion 25, in a fan shape) in section from the first sharp portion 25 by a plating component. Therefore, the first covering portion 31 has a curved surface 23.

另一方面,關於第2被覆部32,於第1尖突部25以外之部分,鍍覆成分自各面朝向正交之方向,具體而言,於配線基部36之厚度方向一面,鍍覆成分朝向厚度方向上側呈面狀鍍覆生長,並且於配線基部36之兩側面(包含第2尖突部45之側面),鍍覆成分朝向第1方向兩外側呈面狀鍍覆生長。因此,第2被覆部32不具有上述彎曲面23,而具有第1配線面9及配線側面11(包含厚度方向中央部50,但除了彎曲面23)。On the other hand, with regard to the second coating portion 32, the plating component is oriented in a direction orthogonal to each surface from the surface other than the first spike portion 25. Specifically, the plating component is oriented toward the thickness direction of the wiring base portion 36. The upper side in the thickness direction is grown in a planar form, and on both sides of the wiring base portion 36 (including the side of the second cusp portion 45), the plating components are grown in a plane form toward both outer sides in the first direction. Therefore, the second covering portion 32 does not have the curved surface 23 described above, but includes the first wiring surface 9 and the wiring side surface 11 (including the thickness-direction central portion 50, except for the curved surface 23).

該第2被覆部32包含第2角部22,該第2角部22基於上述鍍覆生長,包含傾斜面24。The second covering portion 32 includes a second corner portion 22, and the second corner portion 22 includes an inclined surface 24 based on the plating growth described above.

於鍍覆層30中,第1被覆部31之厚度(生長厚度或鍍覆厚度)較佳為與第2被覆部32之厚度相比較厚。若鍍覆為電解鍍覆,則第1尖突部25之電流密度與配線基部36之第1尖突部25以外之電流密度相比較高。因此,第1被覆部31之鍍覆生長與第2被覆部32之鍍覆生長相比較快,因此第1被覆部31之厚度與第2被覆部32之厚度相比較厚。In the plating layer 30, the thickness (growth thickness or plating thickness) of the first coating portion 31 is preferably thicker than the thickness of the second coating portion 32. If the plating is electrolytic plating, the current density of the first spikes 25 is higher than the current density of the wiring base 36 other than the first spikes 25. Therefore, the plating growth of the first coating portion 31 is faster than the plating growth of the second coating portion 32, so the thickness of the first coating portion 31 is thicker than the thickness of the second coating portion 32.

鍍覆層30之厚度係根據鍍覆之生長速度及鍍覆時間適當設定。再者,鍍覆之生長速度及鍍覆時間係根據例如鍍覆中所使用之鍍覆液中之金屬(導體)濃度、溫度等適當設定,例如,若鍍覆為電解鍍覆,則根據電流密度、極間距離、浴內攪拌度(速度)、硫酸銅濃度、硫酸濃度、氯化物離子濃度、添加劑(調平劑、亮滑劑、聚合劑)之種類及量適當設定,例如,若鍍覆為無電解鍍覆,則根據附著於配線基部36之表面之觸媒之種類、量等適當設定。The thickness of the plating layer 30 is appropriately set according to the growth rate of plating and the plating time. In addition, the growth rate and plating time of the plating are appropriately set according to, for example, the concentration of the metal (conductor) in the plating solution used in the plating, the temperature, and the like. For example, if the plating is electrolytic plating, the The density and distance between electrodes, the degree of stirring in the bath (speed), the concentration of copper sulfate, the concentration of sulfuric acid, the concentration of chloride ions, and the type and amount of additives (leveling agent, brightener, polymerizer) are appropriately set. For example, if plating The coating is electroless plating, and it is appropriately set according to the type, amount, and the like of the catalyst attached to the surface of the wiring base 36.

再者,如圖2B所示,於配線基部36與鍍覆層30之間,示出了以假想線表示之邊界,但若上述鍍覆層30之材料與配線基部36之材料相同,則上述邊界變得不清晰,或並不存在(無法觀察到)。Further, as shown in FIG. 2B, a boundary indicated by an imaginary line is shown between the wiring base 36 and the plating layer 30. However, if the material of the plating layer 30 and the wiring base 36 are the same, the above Boundaries become unclear or non-existent (unobservable).

於該鍍覆層30中,第1被覆部31係藉由上述鍍覆而形成,故而具有上述彎曲面23。另一方面,第2被覆部32具有傾斜面24。In this plating layer 30, the first coating portion 31 is formed by the above-mentioned plating, and thus has the above-mentioned curved surface 23. On the other hand, the second covering portion 32 has an inclined surface 24.

於第2步驟中,如圖2C所示,繼而於上述配線電路基板準備體6形成第2絕緣層4。具體而言,藉由第2絕緣層4,被覆配線部3之第1配線面9及配線側面11。In the second step, as shown in FIG. 2C, a second insulating layer 4 is formed on the above-mentioned printed circuit board preparation 6. Specifically, the first wiring surface 9 and the wiring side surface 11 of the wiring portion 3 are covered by the second insulating layer 4.

作為形成第2絕緣層4之方法,例如可列舉電沈積(電沈積塗裝)、例如印刷等塗佈等。Examples of a method for forming the second insulating layer 4 include electrodeposition (electrodeposition coating), coating such as printing, and the like.

於電沈積中,將配線電路基板準備體6(製造中途之磁性配線電路基板1)浸漬於含有樹脂(較佳為電沈積塗料)之電沈積液中,繼而對配線部3施加電流,藉此於配線部3之第1配線面9及配線側面11使樹脂之被膜析出。其後,視需要,使被膜乾燥。藉此,第2絕緣層4被形成為電沈積層。其後,視需要,藉由燒接,加熱第2絕緣層4(電沈積層)使之硬化。In the electrodeposition, the wiring circuit board preparation 6 (the magnetic wiring circuit board 1 in the middle of manufacturing) is immersed in an electrodeposition solution containing a resin (preferably an electrodeposition paint), and then a current is applied to the wiring portion 3, whereby A resin film is deposited on the first wiring surface 9 and the wiring side surface 11 of the wiring portion 3. Thereafter, if necessary, the film is dried. Thereby, the second insulating layer 4 is formed as an electrodeposited layer. Thereafter, if necessary, the second insulating layer 4 (electrodeposited layer) is heated by firing to harden it.

於作為塗佈之一例之印刷中,以含有樹脂之清漆,經由網版,於配線部3之第1配線面9及配線側面11塗佈被膜(網版印刷)。其後,使被膜乾燥。In printing as an example of coating, a coating film (screen printing) is applied to the first wiring surface 9 and the wiring side surface 11 of the wiring portion 3 via a screen using a resin-containing varnish. After that, the film was dried.

作為形成第2絕緣層4之方法,較佳列舉電沈積。若為電沈積,則能使第2絕緣層4之厚度T較薄(但設定為能確保第2絕緣層4之絕緣性之程度之厚度)。又,若為電沈積,則第2絕緣層4能將露出面16確切地露出,因此於相鄰之配線部3間,能於其後之第3步驟中,遍及厚度方向整體而配置磁性層5,故而能提高磁性層5之實效磁導率,從而使磁性配線電路基板1之電感變高。As a method of forming the second insulating layer 4, electrodeposition is preferably mentioned. In the case of electrodeposition, the thickness T of the second insulating layer 4 can be made thin (but set to a thickness that can secure the insulation of the second insulating layer 4). In addition, in the case of electrodeposition, the second insulating layer 4 can accurately expose the exposed surface 16. Therefore, a magnetic layer can be disposed across the entire thickness direction between adjacent wiring portions 3 in a subsequent third step. 5. Therefore, the effective magnetic permeability of the magnetic layer 5 can be improved, so that the inductance of the magnetic wiring circuit substrate 1 becomes high.

於第3步驟中,其後,如圖2D所示,於配線電路基板準備體6形成磁性層5。具體而言,藉由磁性層5,隔著第2絕緣層4被覆配線部3之第1配線面9及配線側面11。In the third step, as shown in FIG. 2D, a magnetic layer 5 is formed on the printed circuit board preparation 6. Specifically, the first wiring surface 9 and the wiring side surface 11 of the wiring portion 3 are covered by the magnetic layer 5 through the second insulating layer 4.

於第3步驟中,例如,如圖2C所示,首先準備作為含粒子片材之一例之磁性片材17。準備磁性片材17時,例如,將含有上述磁性粒子及樹脂成分(較佳為B階段之熱硬化性樹脂)之磁性組合物形成為片狀。於磁性片材17中,磁性粒子18沿著磁性片材17之面方向(與厚度方向正交之方向)配向(排列)。In the third step, for example, as shown in FIG. 2C, a magnetic sheet 17 as an example of a particle-containing sheet is first prepared. When the magnetic sheet 17 is prepared, for example, a magnetic composition containing the above-mentioned magnetic particles and a resin component (preferably a B-stage thermosetting resin) is formed into a sheet shape. In the magnetic sheet 17, the magnetic particles 18 are aligned (aligned) along the surface direction (the direction orthogonal to the thickness direction) of the magnetic sheet 17.

其後,如圖2C之箭頭所示,將磁性片材17相對於配線電路基板準備體6之第2絕緣層4加以熱壓。將磁性片材17配置於配線電路基板準備體6之厚度方向一側,將磁性片材17相對於配線電路基板準備體6之厚度方向一面加以熱壓。Thereafter, as shown by an arrow in FIG. 2C, the magnetic sheet 17 is hot-pressed against the second insulating layer 4 of the printed circuit board preparation 6. The magnetic sheet 17 is arranged on one side in the thickness direction of the printed circuit board preparation 6, and the magnetic sheet 17 is hot-pressed on one side of the printed circuit board preparation 6 in the thickness direction.

藉此,磁性片材17隔著第2絕緣層4將配線部3埋設。具體而言,磁性片材17隔著第2絕緣層4被覆第2絕緣層4之第1配線面9,並且進入(下沉至)彼此相鄰之配線部3之間(與露出面16對向之部分),而填充於其間(部分)。Thereby, the wiring sheet 3 is buried in the magnetic sheet 17 via the second insulating layer 4. Specifically, the magnetic sheet 17 covers the first wiring surface 9 of the second insulating layer 4 via the second insulating layer 4 and enters (sinks) between the adjacent wiring portions 3 (16 pairs of exposed surfaces). To the part), and filled in between (part).

於熱壓前後之磁性片材17中,與配線部3之第1配線面9對向之磁性粒子18之配向方向(具體而言,為面方向)並不變動。又,於熱壓前後之磁性片材17中,與露出面16對向之磁性粒子18之配向方向(具體而言,為面方向)並不變動。In the magnetic sheet 17 before and after the hot pressing, the alignment direction (specifically, the surface direction) of the magnetic particles 18 facing the first wiring surface 9 of the wiring portion 3 does not change. In the magnetic sheet 17 before and after the hot pressing, the alignment direction (specifically, the surface direction) of the magnetic particles 18 facing the exposed surface 16 does not change.

另一方面,於熱壓前後之磁性片材17中,與第1角部21對向之磁性粒子18之配向方向(具體而言,為面方向)於沿著彎曲面23之方向(即,隨著朝向厚度方向另一側而向第1方向外側傾斜之傾斜方向)上變動。即,上述磁性粒子18沿著彎曲面23配向。On the other hand, in the magnetic sheet 17 before and after the hot pressing, the alignment direction (specifically, the surface direction) of the magnetic particles 18 opposed to the first corner 21 is in the direction along the curved surface 23 (that is, As it goes toward the other side in the thickness direction, it fluctuates in an oblique direction that is inclined outward in the first direction). That is, the magnetic particles 18 are aligned along the curved surface 23.

又,於熱壓前後之磁性片材17中,與第2角部22對向之磁性粒子18之配向方向(具體而言,為面方向)於沿著傾斜面24之方向(即,隨著朝向厚度方向另一側而向第1方向外側傾斜之傾斜方向)上變動。即,上述磁性粒子18沿著傾斜面24配向。Furthermore, in the magnetic sheet 17 before and after the hot pressing, the alignment direction (specifically, the surface direction) of the magnetic particles 18 opposed to the second corner portion 22 is in the direction along the inclined surface 24 (that is, as the Toward the other side in the thickness direction and in an oblique direction inclined outward in the first direction). That is, the magnetic particles 18 are aligned along the inclined surface 24.

另一方面,於熱壓前後之磁性片材17中,配線側面11之與第1角部21及第2角部22間對向之磁性粒子18之配向方向(具體而言,為面方向)於沿著厚度方向之方向上變動。即,上述磁性粒子18沿著厚度方向配向。On the other hand, in the magnetic sheet 17 before and after the hot pressing, the alignment direction (specifically, the surface direction) of the magnetic particles 18 facing the wiring side surface 11 and the first corner portion 21 and the second corner portion 22. It changes in the direction along the thickness direction. That is, the magnetic particles 18 are aligned in the thickness direction.

藉此,磁性片材17形成(成型)為隔著第2絕緣層4被覆配線部3,且具有凸部28及凹部29之磁性層5。Thereby, the magnetic sheet 17 is formed (molded) so as to cover the wiring portion 3 with the second insulating layer 4 interposed therebetween, and the magnetic layer 5 having the convex portions 28 and the concave portions 29.

磁性層5中如上所述般配向之磁性粒子18形成包圍配線部3之流暢之磁路。The magnetic particles 18 aligned in the magnetic layer 5 as described above form a smooth magnetic circuit surrounding the wiring portion 3.

藉此,能獲得具備配線電路基板準備體6及磁性層5之磁性配線電路基板1。磁性配線電路基板1較佳為僅包含配線電路基板準備體6及磁性層5。Thereby, the magnetic wiring circuit board 1 provided with the printed circuit board preparation body 6 and the magnetic layer 5 can be obtained. The magnetic wiring circuit board 1 preferably includes only the wiring circuit board preparation 6 and the magnetic layer 5.

其後,於磁性層5含有B階段之熱硬化性樹脂之情形時,視需要,藉由例如加熱,使磁性層5 C階段化(完全硬化)。Then, when the magnetic layer 5 contains a B-stage thermosetting resin, if necessary, the magnetic layer 5 is C-staged (completely hardened) by, for example, heating.

該磁性配線電路基板1例如可用於無線電力輸送(無線饋電及/或無線受電)、無線通信、感測器、被動零件等。The magnetic wiring circuit board 1 can be used for, for example, wireless power transmission (wireless power feeding and / or wireless power receiving), wireless communication, sensors, passive parts, and the like.

而且,於該磁性配線電路基板1中,配線部3之第1角部21(配線部3中與大致彎曲形狀對應之部分)具有大致彎曲形狀,故而能將被覆該第1角部21之第2絕緣層4以抑制其變得過薄之方式形成。因此,能抑制磁性粒子18貫通第2絕緣層4而與配線部3接觸。其結果,藉由第2絕緣層4,能確保磁性層5對配線部3之絕緣性。Further, in the magnetic wiring circuit board 1, the first corner portion 21 of the wiring portion 3 (the portion corresponding to the substantially curved shape in the wiring portion 3) has a substantially curved shape, so that the first corner portion 21 covering the first corner portion 21 can be covered. 2 The insulating layer 4 is formed so as to prevent it from becoming too thin. Therefore, the magnetic particles 18 can be prevented from penetrating the second insulating layer 4 and coming into contact with the wiring portion 3. As a result, the insulation property of the magnetic layer 5 to the wiring portion 3 can be secured by the second insulating layer 4.

又,於隔著第2絕緣層4被覆第1角部21之磁性層5中,磁性粒子18能沿著第1角部21之彎曲形狀配向。即,磁性粒子18於與配線部3之第1配線面9對向之磁性層5中,沿著面方向,於與配線部3之配線側面11對向之磁性層5中,沿著厚度方向配向,於與第1角部21對向之磁性層5中,沿著相對於厚度方向及第1方向傾斜之方向配向。因此,能於磁性層5中形成包圍配線部3之順暢之磁路。從而,能提高配線部3周圍之實效磁導率。其結果,磁性配線電路基板1具有較高之電感。Moreover, in the magnetic layer 5 covering the first corner portion 21 with the second insulating layer 4 interposed therebetween, the magnetic particles 18 can be aligned along the curved shape of the first corner portion 21. That is, the magnetic particles 18 are along the thickness direction in the magnetic layer 5 facing the first wiring surface 9 of the wiring portion 3, and in the magnetic layer 5 facing the wiring side surface 11 of the wiring portion 3, along the thickness direction. The alignment is aligned in the magnetic layer 5 facing the first corner portion 21 in a direction inclined with respect to the thickness direction and the first direction. Therefore, a smooth magnetic circuit surrounding the wiring portion 3 can be formed in the magnetic layer 5. Therefore, the effective magnetic permeability around the wiring portion 3 can be improved. As a result, the magnetic wiring circuit board 1 has a high inductance.

因此,該磁性配線電路基板1既具有較高之電感,且第2絕緣層4之絕緣性優異。Therefore, the magnetic wiring circuit board 1 has high inductance, and the second insulating layer 4 has excellent insulation properties.

又,於該磁性配線電路基板1中,若第2絕緣層4為電沈積層,則能使第2絕緣層4之厚度較薄。因此,能抑制隔著該第2絕緣層4被覆配線部3之磁性層5之實效磁導率降低。其結果,該磁性配線電路基板1具有較高之電感。Moreover, in this magnetic wiring circuit board 1, if the second insulating layer 4 is an electrodeposited layer, the thickness of the second insulating layer 4 can be made thin. Therefore, it is possible to suppress a decrease in the effective magnetic permeability of the magnetic layer 5 covering the wiring portion 3 via the second insulating layer 4. As a result, the magnetic wiring circuit board 1 has a high inductance.

另一方面,於如圖9A所示,第2絕緣層4之厚度,具體而言,與第1尖突部25對向之第2絕緣層4之厚度T1較薄之情形時,如圖9B所示,磁性粒子18容易貫通較薄第2絕緣層4而與配線部3接觸。但於該磁性配線電路基板1中,如圖1所示,配線部3之第1角部21具有大致彎曲形狀,抑制被覆該第1角部21之第2絕緣層4厚度形成得過薄,故而能抑制磁性粒子18對第2絕緣層4之貫通,從而確保第2絕緣層4之絕緣性。On the other hand, when the thickness of the second insulating layer 4 as shown in FIG. 9A, specifically, the thickness T1 of the second insulating layer 4 facing the first pointed portion 25 is thin, as shown in FIG. 9B As shown, the magnetic particles 18 easily penetrate the thin second insulating layer 4 and come into contact with the wiring portion 3. However, in the magnetic wiring circuit board 1, as shown in FIG. 1, the first corner portion 21 of the wiring portion 3 has a substantially curved shape, and the thickness of the second insulating layer 4 covering the first corner portion 21 is suppressed from being excessively thin. Therefore, penetration of the magnetic particles 18 into the second insulating layer 4 can be suppressed, and the insulation of the second insulating layer 4 can be ensured.

又,於該磁性配線電路基板1中,若第1角部21之曲率半徑R高達9 μm以上,則彎曲面23較為平緩,因此能以充足之厚度T1形成與第1角部21對應之第2絕緣層4。又,於與第1角部21對向之第2絕緣層4中,磁性粒子18能確切地沿著彎曲面23配向。Further, in the magnetic wiring circuit board 1, if the curvature radius R of the first corner portion 21 is as high as 9 μm or more, the curved surface 23 is relatively gentle, so that a first portion corresponding to the first corner portion 21 can be formed with a sufficient thickness T1 2 Insulation layer 4. In the second insulating layer 4 facing the first corner 21, the magnetic particles 18 can be aligned along the curved surface 23 exactly.

又,若第2絕緣層4之平均厚度T薄至10 μm以下,則能抑制磁性層4之實效磁導率降低。其結果,該磁性配線電路基板1具有較高之電感。In addition, if the average thickness T of the second insulating layer 4 is as thin as 10 μm or less, it is possible to suppress a decrease in the effective magnetic permeability of the magnetic layer 4. As a result, the magnetic wiring circuit board 1 has a high inductance.

又,於該磁性配線電路基板1中,磁性層5被覆露出面16,故而該磁性層5中之磁性粒子18能沿著面方向配向。In the magnetic wiring circuit board 1, the magnetic layer 5 covers the exposed surface 16. Therefore, the magnetic particles 18 in the magnetic layer 5 can be aligned in the plane direction.

又,由配線部3之第2配線面10及配線側面11形成之第2角部22具有相互面對面之2個配線側面11間之長度隨著向第2配線面10靠近而變長之錐形面27,故而於隔著第2絕緣層4進行被覆之磁性層5中,與錐形面27對應地,磁性粒子18能沿著相對於第1方向方向傾斜之方向配向。In addition, the second corner portion 22 formed by the second wiring surface 10 and the wiring side surface 11 of the wiring portion 3 has a tapered shape in which the length between the two wiring side surfaces 11 facing each other becomes closer to the second wiring surface 10. In the magnetic layer 5 covered with the second insulating layer 4, the magnetic particles 18 can be aligned in a direction inclined with respect to the first direction, corresponding to the tapered surface 27.

從而,於第2角部22周圍,能形成順暢之磁路。因此,磁性配線電路基板1具有更高電感。Therefore, a smooth magnetic circuit can be formed around the second corner portion 22. Therefore, the magnetic wiring circuit board 1 has higher inductance.

可是,如圖9A及圖9B所示,於第2步驟中,將磁性片材17相對於第2絕緣層4加以熱壓時,磁性片材17中所含有之磁性粒子18容易貫通第2絕緣層4而與配線部3接觸。However, as shown in FIGS. 9A and 9B, in the second step, when the magnetic sheet 17 is heat-pressed against the second insulating layer 4, the magnetic particles 18 contained in the magnetic sheet 17 easily penetrate the second insulation. The layer 4 is in contact with the wiring portion 3.

然而,如圖2B所示,於該磁性配線電路基板1之製造方法中,在第1步驟中,於配線部3形成大致彎曲形狀之第1角部21,故而如圖2C所示,能將被覆該第1角部21之第2絕緣層4形成得較厚。However, as shown in FIG. 2B, in the manufacturing method of the magnetic wiring circuit board 1, in the first step, the first corner portion 21 having a substantially curved shape is formed on the wiring portion 3. Therefore, as shown in FIG. 2C, The second insulating layer 4 covering the first corner portion 21 is formed thickly.

因此,能抑制磁性粒子18對第2絕緣層4之貫通、及磁性粒子18與配線之接觸。Therefore, penetration of the magnetic particles 18 into the second insulating layer 4 and contact between the magnetic particles 18 and the wiring can be suppressed.

從而,該製造方法能獲得第2絕緣層4之絕緣性優異之磁性配線電路基板1。Therefore, this manufacturing method can obtain the magnetic wiring circuit board 1 having excellent insulation properties of the second insulating layer 4.

又,於第2步驟中,將含有沿著面方向配向之磁性粒子18之磁性片材17相對於第2絕緣層4加以熱壓,故而於隔著第2絕緣層4被覆第1角部21之磁性層5中,磁性粒子18能沿著第1角部21之彎曲形狀配向。即,能使磁性粒子18於與配線部3之第1配線面9對向之磁性層5中,沿著面方向配向,於與配線部3之配線側面11對向之磁性層5中,沿著厚度方向配向,於與第1角部21對向之磁性層5中,沿著相對於厚度方向及第1方向傾斜之方向配向。因此,能於磁性層5中形成包圍配線部3之順暢之磁路。從而,能提高提高配線部3周圍之實效磁導率。其結果,能製造出具有較高之電感之磁性配線電路基板1。In the second step, the magnetic sheet 17 containing the magnetic particles 18 aligned in the planar direction is hot-pressed against the second insulating layer 4, so that the first corner portion 21 is covered with the second insulating layer 4 interposed therebetween. In the magnetic layer 5, the magnetic particles 18 can be aligned along the curved shape of the first corner portion 21. That is, the magnetic particles 18 can be aligned along the plane direction in the magnetic layer 5 facing the first wiring surface 9 of the wiring portion 3, and can be aligned along the magnetic layer 5 facing the wiring side surface 11 of the wiring portion 3. Orientation in the thickness direction is performed in the magnetic layer 5 facing the first corner 21 in a direction inclined with respect to the thickness direction and the first direction. Therefore, a smooth magnetic circuit surrounding the wiring portion 3 can be formed in the magnetic layer 5. Therefore, the effective magnetic permeability around the wiring portion 3 can be improved. As a result, the magnetic wiring circuit board 1 having high inductance can be manufactured.

因此,該製造方法能獲得既具有較高之電感,且第2絕緣層4之絕緣性優異之磁性配線電路基板1。Therefore, this manufacturing method can obtain a magnetic wiring circuit board 1 having a high inductance and excellent insulation properties of the second insulating layer 4.

可是,若如圖2A所示,於第1步驟中,形成具有尖突部之配線部3,則如圖9A所示,於第2步驟中,與第1尖突部25對向之第2絕緣層4之厚度T1容易變得過薄。其後,若如圖9B所示,於第3步驟中,形成磁性層5,則磁性粒子18會與配線部3接觸,故而無法確保磁性層5與配線部3之絕緣性。However, as shown in FIG. 2A, in the first step, the wiring portion 3 having a sharp portion is formed, as shown in FIG. 9A, in the second step, the second portion opposed to the first sharp portion 25 The thickness T1 of the insulating layer 4 is liable to become too thin. Thereafter, as shown in FIG. 9B, if the magnetic layer 5 is formed in the third step, the magnetic particles 18 will be in contact with the wiring portion 3, so the insulation between the magnetic layer 5 and the wiring portion 3 cannot be ensured.

但即便如圖2A所示,於該第4步驟中,形成具有第1尖突部25之配線基部36,亦會如圖2B所示,於第5步驟中,形成具有被覆第1尖突部25之第1被覆部31之鍍覆層30,而將第1角部21自第1被覆部31形成為大致彎曲形狀。因此,如圖2C所示,能於第2步驟中,將被覆該第1角部21之第2絕緣層4以抑制其變得過薄之方式,即,以厚度T1(參照圖1之放大圖)形成。However, as shown in FIG. 2A, in the fourth step, the wiring base 36 having the first spikes 25 is formed, as shown in FIG. 2B. In the plating layer 30 of the first covering portion 31 of 25, the first corner portion 21 is formed into a substantially curved shape from the first covering portion 31. Therefore, as shown in FIG. 2C, in the second step, the second insulating layer 4 covering the first corner portion 21 can be prevented from becoming too thin, that is, with a thickness T1 (refer to FIG. 1 for an enlargement) (Figure) formation.

藉由如圖2D所示,於第3步驟中,形成磁性層5,能抑制磁性層5中之磁性粒子18貫通第2絕緣層4而與配線部3接觸。As shown in FIG. 2D, in the third step, the magnetic layer 5 is formed, and the magnetic particles 18 in the magnetic layer 5 can be prevented from penetrating the second insulating layer 4 and coming into contact with the wiring portion 3.

<變化例>
於以下之各變化例中,對與上述一實施形態相同之構件及步驟,標註相同之參照符號,並省略其詳細之說明。又,各變化例除了特別載明以外,能達成與一實施形態相同之作用效果。進而,可將一實施形態及其變化例適當組合。
< Modifications >
In each of the following modifications, the same components and steps as those of the above-mentioned embodiment are marked with the same reference numerals, and detailed descriptions thereof are omitted. In addition, each modification can achieve the same effect as that of the embodiment except that it is specifically described. Furthermore, an embodiment and its modifications can be appropriately combined.

於一實施形態中,作為本發明之配線電路基板之一例,列舉具備磁性層5之磁性配線電路基板1進行了說明。但雖未圖示,卻並不限定於此,亦可列舉具備磁性層5以外之含粒子層之配線電路基板。In one embodiment, as an example of the printed circuit board of the present invention, a magnetic printed circuit board 1 including a magnetic layer 5 has been described. Although not shown, the present invention is not limited to this, and a printed circuit board including a particle-containing layer other than the magnetic layer 5 may be used.

含粒子層以適當比率含有上述磁性粒子以外之導電性粒子。作為導電性粒子,並不特別限定,可列舉銅粒子、銀粒子、金粒子、鐵粒子、錫粒子等金屬粒子等。The particle-containing layer contains conductive particles other than the magnetic particles in an appropriate ratio. The conductive particles are not particularly limited, and examples thereof include metal particles such as copper particles, silver particles, gold particles, iron particles, and tin particles.

要獲得具備含粒子層之配線電路基板,需參照圖2C,準備上述含粒子片材代替磁性片材17,並將含粒子片材相對於配線電路基板準備體6加以熱壓。To obtain a wiring circuit board having a particle-containing layer, it is necessary to refer to FIG. 2C, prepare the particle-containing sheet instead of the magnetic sheet 17, and heat-press the particle-containing sheet with respect to the wiring circuit board preparation 6.

而且,於該配線電路基板中,配線部3之第1角部21具有大致彎曲形狀,故而能將被覆該第1角部21之第2絕緣層4以抑制其變得過薄之方式形成。因此,能抑制導電性粒子貫通第2絕緣層4而與配線部3接觸。其結果,藉由第2絕緣層4,能確保含粒子層對配線部3之絕緣性。Further, in the printed circuit board, the first corner portion 21 of the wiring portion 3 has a substantially curved shape, so that the second insulating layer 4 covering the first corner portion 21 can be formed so as to prevent the second insulating layer 4 from becoming too thin. Therefore, it is possible to prevent the conductive particles from penetrating the second insulating layer 4 and coming into contact with the wiring portion 3. As a result, the second insulating layer 4 can ensure the insulation of the particle-containing layer to the wiring portion 3.

可是,於第2步驟中,將含粒子片材相對於第2絕緣層4加以熱壓時,含粒子片材中所含有之導電性粒子容易貫通第2絕緣層4而與配線接觸。However, in the second step, when the particle-containing sheet is hot-pressed on the second insulating layer 4, the conductive particles contained in the particle-containing sheet easily penetrate the second insulating layer 4 and come into contact with the wiring.

然而,於該配線電路基板之製造方法中,在第1步驟中,於配線部3形成大致彎曲形狀之第1角部21,故而能將被覆該第1角部21之第2絕緣層4形成得較厚。However, in the method for manufacturing a printed circuit board, in the first step, the first corner portion 21 having a substantially curved shape is formed on the wiring portion 3, so that the second insulating layer 4 covering the first corner portion 21 can be formed. Get thicker.

因此,能抑制導電性粒子對第2絕緣層4之貫通、及導電性粒子與配線部3之接觸。Therefore, penetration of the conductive particles into the second insulating layer 4 and contact between the conductive particles and the wiring portion 3 can be suppressed.

從而,該製造方法能獲得確保第2絕緣層4之絕緣性之配線電路基板。Therefore, this manufacturing method can obtain a printed circuit board that ensures the insulation of the second insulating layer 4.

因此,該配線電路基板能確保第2絕緣層4之絕緣性。Therefore, this printed circuit board can ensure the insulation of the second insulating layer 4.

如圖1所示,於一實施形態中,1個配線部3中具有2個配線側面11間之長度於第1方向中央部最短之收縮部。但如圖4所示,配線部3亦可具有不具備收縮部之配線側面11。As shown in FIG. 1, in one embodiment, one wiring portion 3 has a constricted portion whose length between the two wiring side surfaces 11 is the shortest in the central portion in the first direction. However, as shown in FIG. 4, the wiring portion 3 may have a wiring side surface 11 that does not include a constricted portion.

又,一實施形態中之圖1表示鍍覆層30之厚度相對較厚之一例。如圖4所示,該變化例係鍍覆層30之厚度與一實施形態中之鍍覆層30之厚度相比較薄之例。FIG. 1 in one embodiment shows an example where the thickness of the plating layer 30 is relatively thick. As shown in FIG. 4, this modification is an example in which the thickness of the plating layer 30 is relatively thin compared with the thickness of the plating layer 30 in one embodiment.

於該變化例中,形成彎曲面23之圓C之曲率半徑R相對較小,又,中心角α亦較小。曲率半徑R例如未達9 μm,進而為5 μm以下,再進而為2 μm以下,中心角α未達110度。In this modification, the radius of curvature R of the circle C forming the curved surface 23 is relatively small, and the center angle α is also small. The curvature radius R is, for example, less than 9 μm, further 5 μm or less, and further 2 μm or less, and the central angle α does not reach 110 degrees.

雖該變化例中之曲率半徑R與一實施形態中之曲率半徑R相比較小,但與一實施形態同樣地,能以充足之厚度形成與彎曲面23對應之第2絕緣層4。Although the radius of curvature R in this modification is smaller than the radius of curvature R in one embodiment, the second insulating layer 4 corresponding to the curved surface 23 can be formed with a sufficient thickness in the same manner as in the embodiment.

又,如圖1所示,於一實施形態中,第2角部22包含具有錐形面27之傾斜面24。但如圖5所示,第2角部22亦可具有相對於平坦面26垂直地形成之垂直面33代替傾斜面24。As shown in FIG. 1, in one embodiment, the second corner portion 22 includes an inclined surface 24 having a tapered surface 27. However, as shown in FIG. 5, the second corner portion 22 may have a vertical surface 33 formed perpendicular to the flat surface 26 instead of the inclined surface 24.

相互面對面之2個垂直面33間之長度隨著朝向厚度方向另一側為相同。The lengths between the two vertical surfaces 33 facing each other are the same as they go toward the other side in the thickness direction.

又,如圖6所示,傾斜面24亦可具有隨著朝向第1絕緣面7而朝向第1方向內側縮窄之第2錐形面(第1窄縮面)34,代替隨著朝向第2配線面10而朝向第1方向外側呈末端寬大狀擴大之錐形面27。As shown in FIG. 6, the inclined surface 24 may have a second tapered surface (first narrowed surface) 34 that narrows toward the inner side in the first direction as it goes toward the first insulating surface 7 instead of going toward the 2 The wiring surface 10 is a tapered surface 27 that widens toward the outside in the first direction and has a wide end.

此種第2錐形面(第1窄縮面)34例如係藉由加成法而形成。Such a second tapered surface (first narrowed surface) 34 is formed by, for example, an addition method.

如圖1所示,於一實施形態中,傾斜面24僅包含錐形面27。但如圖7所示,例如,傾斜面24之厚度方向另一端緣亦可為第2彎曲面35。彼此相鄰之第2彎曲面35係隨著朝向第1絕緣面7而其間之長度變短之第2窄縮面37。於該情形時,配線側面11連續地具備第1角部21之彎曲面23中面向第1方向外側之部分、厚度方向中央部50、以及傾斜面24中之錐形面27及第2窄縮面37。As shown in FIG. 1, in one embodiment, the inclined surface 24 includes only a tapered surface 27. However, as shown in FIG. 7, for example, the other end edge in the thickness direction of the inclined surface 24 may be the second curved surface 35. The second curved surfaces 35 adjacent to each other are the second narrowed surfaces 37 whose length becomes shorter as they go toward the first insulating surface 7. In this case, the wiring side surface 11 is continuously provided with a portion of the curved surface 23 of the first corner portion 21 facing outward in the first direction, a thickness direction central portion 50, and a tapered surface 27 and a second narrowing of the inclined surface 24.面 37。 Face 37.

於一實施形態中,如圖1A~圖1B所示,配線部3包含平坦面(例如,第1配線面9及第2配線面10),但於該變化例中,如圖8C所示,具有不含平坦面之剖視大致圓形形狀。In one embodiment, as shown in FIG. 1A to FIG. 1B, the wiring portion 3 includes a flat surface (for example, the first wiring surface 9 and the second wiring surface 10). It has a substantially circular shape in cross section without a flat surface.

詳細而言,配線部3於以與輸送電流之方向(輸送方向)(紙面進深方向)正交之截面切斷時,具有大致圓形形狀。配線部3具有作為外周面之配線周面46。Specifically, the wiring portion 3 has a substantially circular shape when cut in a cross section orthogonal to the direction (conveyance direction) (depth direction on the paper surface) of the conveyance current. The wiring section 3 has a wiring peripheral surface 46 as an outer peripheral surface.

配線部3之半徑例如為25 μm以上,較佳為50 μm以上,又,例如為2000 μm以下,較佳為200 μm以下。The radius of the wiring portion 3 is, for example, 25 μm or more, preferably 50 μm or more, and, for example, 2000 μm or less, and preferably 200 μm or less.

第2絕緣層4被覆配線部3之配線周面37。第2絕緣層4係以沿著第1周面37之均勻之厚度形成,具體而言,具有剖視大致圓環形狀。第2絕緣層4具有與配線部3之配線周面46接觸之內周面、及作為外周面之絕緣周面47。絕緣周面47之厚度方向另一端緣與第1絕緣層2之第1絕緣面7接觸。The second insulating layer 4 covers the wiring peripheral surface 37 of the wiring portion 3. The second insulating layer 4 is formed with a uniform thickness along the first peripheral surface 37, and specifically has a substantially annular shape in cross section. The second insulating layer 4 has an inner peripheral surface that is in contact with the wiring peripheral surface 46 of the wiring portion 3 and an insulating peripheral surface 47 as an outer peripheral surface. The other end edge in the thickness direction of the insulating peripheral surface 47 is in contact with the first insulating surface 7 of the first insulating layer 2.

第2絕緣層4之厚度T係內周面與絕緣周面47之距離,如一實施形態中所揭示。The thickness T of the second insulating layer 4 is the distance between the inner peripheral surface and the insulating peripheral surface 47, as disclosed in one embodiment.

磁性層5隔著第2絕緣層4被覆配線部3之配線周面46。The magnetic layer 5 covers the wiring peripheral surface 46 of the wiring portion 3 via the second insulating layer 4.

於磁性層5中,磁性粒子18於第2絕緣層4附近,沿著配線部3之配線周面46,具體而言,沿著第2絕緣層4之絕緣周面47配向。再者,第2絕緣層4附近區域例如被定義為配線部3之半徑之1.5倍以內之區域。In the magnetic layer 5, the magnetic particles 18 are aligned near the second insulating layer 4 along the wiring peripheral surface 46 of the wiring portion 3, and specifically, along the insulating peripheral surface 47 of the second insulating layer 4. The area near the second insulating layer 4 is defined as, for example, an area within 1.5 times the radius of the wiring portion 3.

如圖8A所示,要製造該磁性配線電路基板1,首先需準備第1絕緣層2。另外,準備配線部3及第2絕緣層4。配線部3及第2絕緣層4可準備成市售之漆包線。As shown in FIG. 8A, in order to manufacture the magnetic wiring circuit board 1, first a first insulating layer 2 needs to be prepared. In addition, the wiring portion 3 and the second insulating layer 4 are prepared. The wiring portion 3 and the second insulating layer 4 can be prepared as commercially available enameled wires.

繼而,如圖8B所示,將第2絕緣層4之厚度方向另一端緣配置於第1絕緣層2之第1絕緣面7。藉此,同時實施第1步驟及第2步驟。Then, as shown in FIG. 8B, the other end edge in the thickness direction of the second insulating layer 4 is disposed on the first insulating surface 7 of the first insulating layer 2. Thereby, the first step and the second step are performed simultaneously.

其後,將磁性片材17相對於第1絕緣層2、配線部3及第2絕緣層4加以熱壓(第3步驟之實施)。Thereafter, the magnetic sheet 17 is hot-pressed against the first insulating layer 2, the wiring portion 3, and the second insulating layer 4 (implementation of the third step).

藉此,於第2絕緣層4中,在第2絕緣層4附近區域,磁性粒子18能沿著配線部3之配線周面46,具體而言,沿著第2絕緣層4之絕緣周面47配向。Thereby, in the second insulating layer 4, in the vicinity of the second insulating layer 4, the magnetic particles 18 can follow the wiring peripheral surface 46 of the wiring portion 3, specifically, along the insulating peripheral surface of the second insulating layer 4. 47Alignment.

藉此,獲得具備第1絕緣層2、配線部3、第2絕緣層4及磁性層5之磁性配線電路基板1。Thereby, the magnetic wiring circuit board 1 provided with the 1st insulation layer 2, the wiring part 3, the 2nd insulation layer 4, and the magnetic layer 5 is obtained.

而且,於該磁性配線電路基板1中,在配線部3(第2絕緣層4)周圍(附近區域)之磁性層5中,磁性粒子18能形成沿著配線周面46,具體而言,沿著絕緣周面47之順暢之磁路。因此,能提高配線部3周圍之實效磁導率。其結果,該磁性配線電路基板1具有較高之電感。Further, in this magnetic wiring circuit board 1, in the magnetic layer 5 around (the vicinity of) the wiring portion 3 (the second insulating layer 4), the magnetic particles 18 can be formed along the wiring peripheral surface 46, specifically, along the wiring peripheral surface 46. The smooth magnetic circuit of the insulating peripheral surface 47. Therefore, the effective magnetic permeability around the wiring portion 3 can be improved. As a result, the magnetic wiring circuit board 1 has a high inductance.

又,於磁性配線電路基板1之製造方法中,在第3步驟中,於配線部3(第2絕緣層4)周圍(附近區域)之磁性層5中,磁性粒子18能形成沿著配線部3之大致彎曲形狀之順暢之磁路。因此,能提高配線部3周圍之實效磁導率。其結果,能製造出具有較高之電感之磁性配線電路基板1。In the method for manufacturing the magnetic wiring circuit board 1, in the third step, the magnetic particles 18 can be formed along the wiring portion in the magnetic layer 5 around the wiring portion 3 (second insulating layer 4) (in the vicinity). 3 is a smooth magnetic circuit with a roughly curved shape. Therefore, the effective magnetic permeability around the wiring portion 3 can be improved. As a result, the magnetic wiring circuit board 1 having high inductance can be manufactured.

再者,磁性層5中之磁性粒子18之比率於磁性層5中可一樣,又,亦可隨著自各配線部3遠離而變高或變低。In addition, the ratio of the magnetic particles 18 in the magnetic layer 5 may be the same as that in the magnetic layer 5, and may also increase or decrease as the distance from the wiring portions 3 increases.

再者,於圖8A~圖8C所示之變化例中,配線部3具有剖視大致圓形形狀,但只要於剖視下,具有大致彎曲形狀,便不特別限定,例如雖未圖示,但亦可為至少具有1個大致彎曲形狀之角部之大致矩形、大致梯形。於該變化例中,雖未圖示,但絕緣層4被覆配線部3之整個配線周面46。Moreover, in the modification shown in FIGS. 8A to 8C, the wiring portion 3 has a substantially circular shape in cross section, but is not particularly limited as long as it has a substantially curved shape in cross section. For example, although not shown, However, it may be a substantially rectangular or substantially trapezoidal shape having at least one corner having a substantially curved shape. In this modification, although not shown, the insulating layer 4 covers the entire wiring peripheral surface 46 of the wiring portion 3.

再者,上述發明係作為本發明之例示之實施形態而提供,但其僅為例示,不應限定性地進行解釋。該技術領域之業者所明瞭之本發明之變化例包含於下述申請專利範圍內。
[產業上之可利用性]
The above invention is provided as an exemplary embodiment of the present invention, but it is only an example and should not be interpreted in a limited manner. Variations of the present invention that are known to those skilled in the art are included in the scope of the following patent applications.
[Industrial availability]

配線電路基板可用於磁性用途。The printed circuit board can be used for magnetic applications.

1‧‧‧磁性配線電路基板(配線電路基板之一例)1‧‧‧ Magnetic wiring circuit board (an example of a wiring circuit board)

2‧‧‧第1絕緣層 2‧‧‧The first insulation layer

3‧‧‧配線部(配線之一例) 3‧‧‧Wiring section (an example of wiring)

4‧‧‧第2絕緣層 4‧‧‧Second insulation layer

5‧‧‧磁性層(含粒子層之一例) 5‧‧‧ Magnetic layer (an example of a layer containing particles)

6‧‧‧配線電路基板準備體 6‧‧‧ Wiring circuit board preparation

7‧‧‧第1絕緣面 7‧‧‧The first insulation surface

8‧‧‧第2絕緣面 8‧‧‧Second insulation surface

9‧‧‧第1配線面 9‧‧‧The first wiring surface

10‧‧‧第2配線面 10‧‧‧ 2nd wiring surface

11‧‧‧配線側面 11‧‧‧ side of wiring

12‧‧‧第3絕緣面 12‧‧‧ 3rd insulation surface

13‧‧‧第4絕緣面 13‧‧‧ 4th insulation surface

14‧‧‧第1磁性面 14‧‧‧ 1st magnetic surface

15‧‧‧第2磁性面 15‧‧‧ 2nd magnetic surface

16‧‧‧露出面 16‧‧‧ exposed

17‧‧‧磁性片材(含粒子片材之一例) 17‧‧‧Magnetic sheet (example of particle sheet)

18‧‧‧磁性粒子 18‧‧‧ magnetic particles

19‧‧‧樹脂成分 19‧‧‧ resin composition

21‧‧‧第1角部 21‧‧‧The first corner

22‧‧‧第2角部 22‧‧‧ 2nd corner

23‧‧‧彎曲面(圓弧面) 23‧‧‧ curved surface (circular surface)

24‧‧‧傾斜面 24‧‧‧ inclined surface

25‧‧‧尖突部 25‧‧‧ Spire

26‧‧‧平坦面 26‧‧‧ flat surface

27‧‧‧錐形面 27‧‧‧ tapered surface

28‧‧‧凸部 28‧‧‧ convex

29‧‧‧凹部 29‧‧‧ recess

30‧‧‧鍍覆層 30‧‧‧Plating

31‧‧‧第1被覆部 31‧‧‧The first covered part

32‧‧‧第2被覆部 32‧‧‧ 2nd covered section

33‧‧‧垂直面 33‧‧‧Vertical plane

34‧‧‧第2錐形面(第1窄縮面) 34‧‧‧ 2nd tapered surface (1st narrowed surface)

35‧‧‧第2彎曲面 35‧‧‧ 2nd curved surface

36‧‧‧配線基部 36‧‧‧Wiring base

37‧‧‧第2窄縮面 37‧‧‧ 2nd narrow face

45‧‧‧第2尖突部 45‧‧‧ 2nd cusp

46‧‧‧配線周面 46‧‧‧ Wiring surface

47‧‧‧絕緣周面 47‧‧‧ Insulated peripheral surface

50‧‧‧厚度方向中央部 50‧‧‧ thickness center

51‧‧‧基部中央側面 51‧‧‧ Central side of base

C‧‧‧圓 C‧‧‧circle

C'‧‧‧圓 C'‧‧‧ round

CP‧‧‧中心 CP‧‧‧ Center

CP'‧‧‧中心 CP'‧‧‧ Center

R‧‧‧曲率半徑 R‧‧‧ radius of curvature

T‧‧‧第2絕緣層之厚度(平均厚度) T‧‧‧thickness of the second insulation layer (average thickness)

T0‧‧‧厚度 T0‧‧‧thickness

T1‧‧‧厚度 T1‧‧‧thickness

α‧‧‧中心角 α‧‧‧ Center Angle

β1‧‧‧角度 β1‧‧‧ angle

β2‧‧‧角度 β2‧‧‧ angle

圖1表示作為本發明之配線電路基板之一實施形態的磁性配線電路基板之剖視圖及其一部分放大剖視圖。FIG. 1 shows a cross-sectional view of a magnetic wiring circuit board as an embodiment of the wiring circuit board of the present invention and an enlarged sectional view of a part thereof.

圖2A~圖2D係圖1所示之磁性配線電路基板之製造步驟圖,圖2A表示形成配線基部之第4步驟(第1步驟),圖2B表示形成鍍覆層,且形成配線之第5步驟(第1步驟),圖2C表示形成第2絕緣層之第2步驟,圖2D表示形成磁性層之第3步驟。 2A to 2D are manufacturing steps of the magnetic wiring circuit board shown in FIG. 1. FIG. 2A shows a fourth step (first step) of forming a wiring base, and FIG. 2B shows a fifth step of forming a plating layer and forming wiring. Step (first step), FIG. 2C shows a second step of forming a second insulating layer, and FIG. 2D shows a third step of forming a magnetic layer.

圖3係於圖1中對通過第1角部之彎曲面之圓弧面之圓進行說明之剖視圖。 3 is a cross-sectional view illustrating a circle passing through a curved surface of a curved surface of a first corner portion in FIG. 1.

圖4係於圖1中表示磁性配線電路基板之變化例(鍍覆層較薄,且配線側面不具有收縮之態樣)之一部分放大剖視圖。 FIG. 4 is an enlarged cross-sectional view of a part of FIG. 1 showing a modified example of the magnetic wiring circuit board (a state where the plating layer is thin and the wiring side does not have a shrinkage).

圖5係於圖1中表示磁性配線電路基板之變化例(第2角部具有垂直面之態樣)之一部分放大剖視圖。 FIG. 5 is an enlarged cross-sectional view of a portion of FIG. 1 showing a modified example of the magnetic wiring circuit board (a state where the second corner portion has a vertical plane).

圖6係於圖1中表示磁性配線電路基板之變化例(第2角部具有第1窄縮面之態樣)之一部分放大剖視圖。 FIG. 6 is an enlarged sectional view of a part of FIG. 1 showing a modified example of the magnetic wiring circuit board (a state where the second corner portion has the first narrowed surface).

圖7係於圖1表示磁性配線電路基板之變化例(第2角部具有第2窄縮面之態樣)之一部分放大剖視圖。 FIG. 7 is an enlarged sectional view of a part of a modified example of the magnetic wiring circuit board (a state in which the second corner portion has the second narrowed surface) in FIG. 1.

圖8A~圖8C係圖1所示之磁性配線電路基板之變化例(配線部為剖視大致圓形之態樣)之製造步驟圖,圖8A表示準備第1絕緣層、配線部及第2絕緣層之步驟,圖8B表示將配線部及第2絕緣層配置於第1絕緣層之步驟,圖8C表示將磁性片材相對於第1絕緣層、配線部及第2絕緣層加以熱壓之步驟。 FIGS. 8A to 8C are manufacturing process diagrams of a modified example of the magnetic wiring circuit board shown in FIG. 1 (the wiring portion is substantially circular in cross-section), and FIG. 8A shows preparation of a first insulating layer, a wiring portion, and a second In the step of the insulating layer, FIG. 8B shows the step of disposing the wiring portion and the second insulating layer on the first insulating layer, and FIG. 8C shows the step of thermally pressing the magnetic sheet to the first insulating layer, the wiring portion and the second insulating layer. step.

圖9A~圖9B係比較例之磁性配線電路基板之製造步驟圖,圖9A表示形成第2絕緣層之第2步驟,圖9B表示形成磁性層之第3步驟。 FIGS. 9A to 9B are diagrams showing the manufacturing steps of a magnetic wiring circuit board of a comparative example. FIG. 9A shows a second step of forming a second insulating layer, and FIG. 9B shows a third step of forming a magnetic layer.

Claims (13)

一種配線電路基板,其特徵在於具備: 第1絕緣層; 配線,其配置於上述第1絕緣層之厚度方向一面; 第2絕緣層,其被覆上述配線;及 含粒子層,其含有具有縱橫比為2以上之形狀之導電性粒子,且隔著上述第2絕緣層被覆上述配線;且 上述配線具有大致彎曲形狀。A wiring circuit substrate, comprising: First insulation layer; The wiring is arranged on one side in the thickness direction of the first insulating layer; A second insulating layer covering the wiring; and A particle-containing layer containing conductive particles having a shape having an aspect ratio of 2 or more, and covering the wiring via the second insulating layer; and The wiring has a substantially curved shape. 如請求項1之配線電路基板,其中上述導電性粒子係磁性粒子, 上述含粒子層係磁性層,且 該配線電路基板係磁性配線電路基板。The printed circuit board according to claim 1, wherein the conductive particles are magnetic particles, The particle-containing layer is a magnetic layer, and This wiring circuit board is a magnetic wiring circuit board. 如請求項2之配線電路基板,其中上述第2絕緣層係電沈積層。The printed circuit board according to claim 2, wherein the second insulating layer is an electrodeposited layer. 如請求項2之配線電路基板,其中上述第2絕緣層之平均厚度T為10 μm以下。The printed circuit board according to claim 2, wherein the average thickness T of the second insulating layer is 10 μm or less. 如請求項2之配線電路基板,其中上述配線具有:厚度方向一面,其於上述第1絕緣層之上述厚度方向一面隔開間隔而對向配置;厚度方向另一面,其與上述第1絕緣層之上述厚度方向一面接觸;及側面,其將上述厚度方向一面及上述厚度方向另一面之兩端緣連結; 上述第2絕緣層被覆上述厚度方向一面及上述側面, 上述配線具有由上述厚度方向一面及上述側面形成之角部,且 上述角部具有大致彎曲形狀。The wiring circuit board according to claim 2, wherein the wiring has: one surface in a thickness direction, which is arranged opposite to the one surface in the thickness direction of the first insulating layer, and the other surface in the thickness direction, which is opposite to the first insulating layer One side of the thickness direction is in contact with one side; and a side surface that connects two end edges of the one surface in the thickness direction and the other side in the thickness direction; The second insulating layer covers the one surface in the thickness direction and the side surface, The wiring has a corner portion formed by the one surface in the thickness direction and the side surface; and The corner portion has a substantially curved shape. 如請求項5之配線電路基板,其中上述角部之曲率半徑R為9 μm以上。The wiring circuit board according to claim 5, wherein the radius of curvature R of the corner is 9 μm or more. 如請求項5之配線電路基板,其中上述磁性層被覆上述第1絕緣層中自上述第2絕緣層露出之上述厚度方向一面, 上述配線具有由上述厚度方向另一面及上述側面形成之第2角部,且 上述第2角部具有相互面對面之2個上述側面間之長度隨著向上述厚度方向另一側靠近而變長之部分。The printed circuit board according to claim 5, wherein the magnetic layer covers the first insulating layer and the thickness direction surface exposed from the second insulating layer, The wiring has a second corner formed by the other surface in the thickness direction and the side surface; and The second corner portion has a portion in which a length between the two side surfaces facing each other becomes longer as it approaches the other side in the thickness direction. 如請求項2之配線電路基板,其中上述配線具有大致圓形形狀, 上述第2絕緣層被覆上述配線之周面,且 上述含粒子層隔著上述第2絕緣層被覆上述配線之上述周面。The wiring circuit board of claim 2, wherein the wiring has a substantially circular shape, The second insulating layer covers a peripheral surface of the wiring, and The particle-containing layer covers the peripheral surface of the wiring via the second insulating layer. 一種配線電路基板之製造方法,其特徵在於包含: 第1步驟,其係準備第1絕緣層、及配置於上述第1絕緣層之厚度方向一面之配線; 第2步驟,其係藉由第2絕緣層被覆上述配線;及 第3步驟,其係形成含粒子層,該含粒子層隔著上述第2絕緣層被覆上述配線,且含有具有縱橫比為2以上之形狀之導電性粒子;且 上述配線形成為大致彎曲形狀, 於上述第2步驟中,將含有沿著與上述厚度方向正交之方向配向之上述導電性粒子之含粒子片材相對於上述第2絕緣層加以熱壓。A method for manufacturing a wiring circuit substrate, comprising: The first step is to prepare a first insulating layer and wiring arranged on one side in the thickness direction of the first insulating layer; The second step is to cover the wiring with a second insulating layer; and The third step is to form a particle-containing layer which covers the wiring via the second insulating layer and contains conductive particles having a shape having an aspect ratio of 2 or more; and The wiring is formed into a substantially curved shape, In the second step, the particle-containing sheet containing the conductive particles aligned in a direction orthogonal to the thickness direction is hot-pressed on the second insulating layer. 如請求項9之配線電路基板之製造方法,其中上述導電性粒子係磁性粒子, 上述含粒子層係磁性層, 含粒子片材係磁性片材,且 該製造方法係磁性配線電路基板之製造方法。The method for manufacturing a printed circuit board according to claim 9, wherein the conductive particles are magnetic particles, The particle-containing layer is a magnetic layer, The particle-containing sheet is a magnetic sheet, and This manufacturing method is a manufacturing method of a magnetic wiring circuit board. 如請求項10之配線電路基板之製造方法,其中上述第1步驟中之上述配線具有:厚度方向一面,其於上述第1絕緣層之上述厚度方向一面隔開間隔而對向配置;厚度方向另一面,其與上述第1絕緣層之上述厚度方向一面接觸;及側面,其將上述厚度方向一面及上述厚度方向另一面之兩端緣連結;進而,於上述厚度方向一面及上述側面,形成大致彎曲形狀之角部;且 於上述第2步驟中,藉由上述絕緣層,被覆上述配線之上述厚度方向一面及上述側面, 於上述第3步驟中,形成隔著上述第2絕緣層被覆上述配線之上述厚度方向一面及上述側面之含粒子層。For example, the method for manufacturing a printed circuit board according to claim 10, wherein the wiring in the first step has: a thickness direction surface, which is oppositely disposed on the thickness direction surface of the first insulation layer, and is oppositely disposed; One surface is in contact with the thickness direction of the first insulating layer; and a side surface connects the two edges of the one surface in the thickness direction and the other surface in the thickness direction; further, the one surface in the thickness direction and the side surface are formed roughly. Corners of curved shapes; and In the second step, the thickness-direction surface and the side surface of the wiring are covered with the insulation layer. In the third step, a particle-containing layer is formed to cover the one surface in the thickness direction and one side of the wiring via the second insulating layer. 如請求項11之配線電路基板之製造方法,其中上述第1步驟包含: 第4步驟,其係藉由減成法,形成具有由厚度方向一面及側面形成之尖突部之配線基部;及, 第5步驟,其係藉由鍍覆,形成鍍覆層,藉此利用被覆部將上述角部形成為大致彎曲形狀,該鍍覆層被覆上述配線基部,且具有被覆上述尖突部之上述被覆部。The method of manufacturing a printed circuit board according to claim 11, wherein the above first step includes: The fourth step is to form a wiring base having a pointed portion formed by one side and the side in the thickness direction by a subtractive method; and, The fifth step is to form a plating layer by plating, thereby forming the corner portion into a substantially curved shape by using a covering portion, the plating layer covering the wiring base portion, and having the coating covering the pointed portion. unit. 如請求項10之配線電路基板之製造方法,其中上述第1步驟中之上述配線具有大致圓形形狀,且 於上述第2步驟中,藉由上述絕緣層,被覆上述配線之周面, 於上述第3步驟中,形成隔著上述第2絕緣層被覆上述配線之上述周面之含粒子層。The method of manufacturing a printed circuit board according to claim 10, wherein the wiring in the first step has a substantially circular shape, and In the second step, the peripheral surface of the wiring is covered with the insulating layer. In the third step, a particle-containing layer covering the peripheral surface of the wiring with the second insulating layer formed thereon is formed.
TW108108828A 2018-03-16 2019-03-15 Wiring circuit board and manufacturing method thereof TWI841552B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018049136 2018-03-16
JP2018-049136 2018-03-16
JP2019-044777 2019-03-12
JP2019044777A JP7372747B2 (en) 2018-03-16 2019-03-12 Wired circuit board and its manufacturing method

Publications (2)

Publication Number Publication Date
TW201941669A true TW201941669A (en) 2019-10-16
TWI841552B TWI841552B (en) 2024-05-11

Family

ID=

Also Published As

Publication number Publication date
JP7372747B2 (en) 2023-11-01
CN111819643B (en) 2022-07-15
KR20200127193A (en) 2020-11-10
CN111819643A (en) 2020-10-23
JP2019165222A (en) 2019-09-26

Similar Documents

Publication Publication Date Title
JP7372747B2 (en) Wired circuit board and its manufacturing method
CN105448503B (en) Multilayer seed pattern inductor, its manufacture method and there is its plate
JP5054445B2 (en) Coil parts
JP2021073710A (en) Power inductor
KR101662209B1 (en) Power inductor and method of manufacturing the same
JP6207107B2 (en) Coil electronic component and manufacturing method thereof
JP7323268B2 (en) Magnetic wiring circuit board and manufacturing method thereof
CN105826050B (en) Electronic building brick and its manufacturing method
CN107039155A (en) Coil electronic building brick and its manufacture method
US11610721B2 (en) Inductor
US20160276096A1 (en) Power inductor
KR20160034802A (en) Coil Component
WO2019177078A1 (en) Wiring circuit board and method for manufacturing same
US11282634B2 (en) Coil electronic component
US20220165482A1 (en) Inductor
US20220165473A1 (en) Inductor
TWI841552B (en) Wiring circuit board and manufacturing method thereof
TWI832971B (en) Inductor
TW202101487A (en) Inductor
TWI826648B (en) Inductor
JP2004200439A (en) Substrate
TW202109561A (en) Inductor and manufacturing method therefor
KR20170142151A (en) Coil electronic part and manufacturing method thereof