TW201934360A - Titanium plate having low gloss and method for producing the same - Google Patents

Abstract

The present invention relates to a titanium plate having low gloss and a method for producing the same. A titanium roll is firstly provided, and there is no oxide layer on a surface of the titanium roll. Then, the titanium roll is subjected to a pattern-forming process with an embossing roller, thereby producing the titanium plate having low gloss. The pattern-forming process includes at least two embossing-forming steps. The pattern-forming process excludes a pickling step, an alkaline cleaning step and/or an anodizing step.

Description

Titanium plate with low gloss and manufacturing method thereof

The invention relates to a titanium plate and a manufacturing method thereof, and particularly to a titanium plate with low gloss and a manufacturing method thereof.

Titanium has light weight, high strength and good corrosion resistance, so titanium has been widely used in building exterior walls. However, the titanium metal surface has a metallic luster, so when a titanium metal plate is used on the exterior wall of the building, both daylight and the city's bright light will be reflected by the titanium metal plate, which will cause light damage, which will affect driving sight and reduce the vicinity easily. Living quality of the household. Therefore, the building regulations of various countries will regulate the gloss of the external walls and roofs of buildings to avoid the defects of the aforementioned titanium plate reflecting light. For example, the Taipei City Development Bureau requires that the gloss of metal plates used in building materials should not exceed 70%.

Generally, a method for manufacturing a low-gloss titanium plate is to reduce the gloss of the titanium plate through an acid washing step, an alkali washing step, an anodizing step, or a single embossing step. However, the chemical solvents used in these methods are harmful to the environment, or the stain resistance of the produced titanium plate is not good, which is not suitable for building exterior walls.

In the general acid washing step and alkaline washing step, the chemical solvent after use is not easy to handle, which increases the subsequent processing cost. Among them, if an acidic solvent remains in the prepared titanium plate, the titanium plate is liable to discolor, which reduces the surface quality, and even cannot be applied to the exterior wall of the building. In addition, in the high-temperature alkaline washing step, the high-temperature alkaline solvent will react violently with the titanium coil, and it is easy to greatly reduce the thickness of the titanium coil, or it may be corroded and burned by the high-temperature alkaline solvent.

In the foregoing anodizing step, although the color of the titanium plate can be changed, the original color of the surface of the titanium plate cannot be displayed, and the surface color of the titanium plate after the anode is easily affected by the external environment, resulting in the defect of discoloration. Secondly, when a large number of titanium plates are anodized, due to different ion diffusion conditions, the obtained titanium plates are prone to have defects of uneven color, which reduces the quality. In addition, the anodized titanium plate has poor surface stain resistance.

In the aforementioned single-pass embossing step, compared with the aforementioned processing method, although the production cost of the single-pass embossing step is lower, the pattern of the surface of the titanium plate it produces is simpler and lighter. Therefore, its effect of scattering light is poor, and its glossiness is greater than 50%.

In view of this, it is urgent to provide a titanium plate with low gloss and a manufacturing method thereof to improve the defects of the conventional titanium plate with low gloss.

Therefore, one aspect of the present invention is to provide a method for manufacturing a titanium plate with low gloss, wherein the pattern forming process of the manufacturing method has multiple embossing steps, and can be applied on the surface of the obtained titanium plate. Form irregular patterns, thereby reducing the gloss of the titanium plate.

Another aspect of the present invention is to provide a titanium plate with low gloss, which is obtained by the aforementioned method.

According to an aspect of the present invention, a method for manufacturing a titanium plate with low gloss is proposed. In this manufacturing method, a titanium coil is first provided, and the surface of the titanium coil does not have an oxide layer. Then, the titanium roll is subjected to a pattern forming process using an embossing roller to obtain a titanium plate. The pattern forming process includes at least two embossing steps, and the pattern forming process excludes performing an acid washing step, an alkali washing step, and / or an anodizing step.

According to an embodiment of the present invention, before the foregoing process for providing a titanium coil is performed, the manufacturing method may selectively provide a titanium oxide coil and subject the titanium oxide coil to an acid washing process to remove surface oxidation of the titanium oxide coil. Layer and form a titanium roll.

According to another embodiment of the present invention, the aforementioned pattern forming process includes at least three embossing steps.

According to another embodiment of the present invention, the president's weight reduction of the aforementioned pattern forming process is 6% to 10%.

According to another embodiment of the present invention, the reduction ratio of each embossing step is 1.5% to 3%.

According to yet another embodiment of the present invention, the embossing speed of each embossing step is 30 to 60 meters per minute.

According to yet another embodiment of the present invention, before the aforementioned pattern forming process is performed, the manufacturing method may selectively perform a cold rolling process on the titanium coil.

According to yet another embodiment of the present invention, the gloss (Gs60) of the aforementioned titanium plate is 30% to 40%.

According to yet another embodiment of the present invention, the surface roughness of the aforementioned titanium plate is 6 μm to 7 μm.

According to another aspect of the present invention, a titanium plate is proposed, which is manufactured by using the aforementioned manufacturing method. The titanium plate has a gloss of 30% to 40%, and the surface roughness of the titanium plate is 6 μm to 7 μm.

By applying the titanium plate with low gloss of the present invention and the manufacturing method thereof, the steel sheet is subjected to multiple embossing steps to form an irregular pattern on the surface of the obtained steel sheet, thereby reducing the steel sheet Gloss, and improve the stain resistance of the surface of the steel plate, which can meet the needs of external walls of buildings.

100‧‧‧ Method

110‧‧‧Procedure of providing titanium coil

120‧‧‧ Steps of pattern forming process using embossing roller

130‧‧‧ Steps to make titanium plate

In order to have a more complete understanding of the embodiments of the present invention and its advantages, please refer to the following description and cooperate with the corresponding drawings. It must be emphasized that the various features are not drawn to scale and are for illustration purposes only. The contents of the related drawings are described as follows: [FIG. 1] A flowchart showing a method for manufacturing a titanium plate according to an embodiment of the present invention.

The manufacture and use of the embodiments of the invention are discussed in detail below. It is understood, however, that the embodiments provide many applicable inventive concepts that It can be implemented in a variety of specific content. The specific embodiments discussed are for illustration only and are not intended to limit the scope of the invention.

Please refer to FIG. 1, which illustrates a method for manufacturing a titanium plate according to an embodiment of the present invention. In the method 100, a titanium coil is first provided, as shown in step 110. In order to help the surface of the titanium coil to form a pattern, the surface of the titanium coil does not have an oxide layer. In some embodiments, the oxide layer on the surface of the titanium roll is an oxide layer formed after the surface titanium metal is oxidized. If the surface of the titanium coil has an oxide layer, the mechanical properties of the oxide layer are relatively hard and brittle. Therefore, when the pattern forming process described later is performed, the oxide layer under stress will be broken, and the pattern cannot be effectively formed on the surface of the titanium coil. Furthermore, the gloss of the obtained titanium plate cannot be reduced. In some embodiments, the titanium roll may be a pure titanium titanium roll of grade 1 titanium to grade 4 titanium (Grade 1 (Gr. 1) to Grade 4).

In some embodiments, if the provided titanium roll has a surface oxide layer (that is, a titanium oxide roll, and since the surface oxide layer is generally black, it is also referred to as a black-skinned titanium roll), before the aforementioned step 110, The titanium oxide roll is firstly subjected to an acid washing process to remove the surface oxide layer of the titanium oxide roll, thereby forming the titanium roll provided in the foregoing step 110. In some embodiments, the pickling process may be performed by using process parameters and conditions that are well known in the technical field to which the present invention belongs, and therefore will not be described in detail here.

Please continue to refer to FIG. 1. After step 110, the titanium roll is patterned with an embossing roller to obtain a titanium plate with low gloss according to the present invention, as shown in steps 120 and 130. Wherein, the pattern forming process of the present invention excludes performing the acid washing step, the alkali washing step and / or the anodizing step. In step 120, the pattern forming process includes at least two embossing steps. Step. Because the surface of the embossing roller has an irregular pattern, when the titanium roll is rolled by the embossing roller, the thickness of the titanium roll is reduced accordingly, and the surface pattern of the embossing roller is transferred to the surface of the titanium roll.

During the first embossing step, the titanium roll may first pass through the embossing roller in the first direction to form a first layer pattern on the surface of the titanium roll. Next, a second embossing step is performed on the titanium roll having the first layer pattern. When the second embossing step is performed, the titanium roll can pass the embossing roller in the second direction to form a second layer pattern on the first layer pattern. Because the pattern on the embossing roller is irregular, and the position of the titanium roll when passing through the embossing roller is not easy to overlap, the titanium plate obtained through two embossing steps may have a deep and irregular pattern. Because the obtained titanium plate has a deep and irregular pattern, when light is irradiated to the titanium plate, the light is more easily scattered, and it is not easy to reflect directly, thereby reducing its gloss. In some embodiments, the pattern forming process may include at least three embossing steps. In some embodiments, the aforementioned first direction may be the same as or different from the second direction. In some embodiments, the first direction and the second direction are preferably opposite to each other (that is, the titanium coil passes the embossing roller in a reciprocating manner). If the first direction and the second direction are opposite to each other, the pattern forming process only needs to have a set of embossing rollers, or the titanium coil rolled by the embossing rollers is not carried out without the next embossing step. The position must be changed again, which can save process time.

When the pattern forming process is performed, because the embossing roller is directly rolling the titanium coil, after each pass of the embossing step, in addition to the surface of the titanium coil being stressed to form a pattern, the thickness of the titanium coil is also reduced accordingly. . Therefore, although after more embossing steps, more complex patterns can be formed on the surface of the titanium coil, and Significantly reduce its gloss, but the thickness of the titanium plate produced may be too thin to meet the specifications of back-end applications. Although the defect of too thin thickness can be solved by reducing the rolling force of the embossing step, too low rolling force cannot effectively form a pattern on the surface of the titanium coil, and it is difficult to reduce the gloss of the obtained titanium plate. In some embodiments, the pattern forming process may include three to four embossing steps. In some embodiments, the president reduction of the pattern forming process may be 6% to 10%. Preferably, when the pattern forming process is performed, the amount of reduction of each embossing step can be obtained after the president's reduction is divided by the number of embossing steps performed. In some embodiments, the cut amount of each embossing step may be 1.5% to 3%. Generally speaking, if the cut amount of each embossing step is less than 1.5%, the pattern pattern rolled on the surface of the titanium coil is not obvious, and it is difficult to reduce the gloss of the obtained titanium plate. If the cutting amount of each embossing step is greater than 3%, in addition to the dimensional specifications of the titanium plate produced, it is not easy to meet the requirements, the wear of the embossing roller is more significant, and it is easy to reduce its service life.

Therefore, before the aforementioned pattern forming process is performed, the titanium coil can be optionally subjected to a cold rolling process to pre-roll the titanium coil, so that the thickness can be further reduced to have a suitable thickness after the subsequent pattern forming process. The size of the titanium plate to meet the product specifications. For example, if the thickness of the titanium plate is 0.4 mm, and the president's weight reduction of the pattern forming process is set to 6%, the titanium coil can be cold rolled and rolled to a thickness of 0.424 mm to continue. The pattern forming process is performed. In this way, a titanium plate that meets the aforementioned thickness specifications can be produced.

In some embodiments, the groove depth of the pattern on the surface of the embossing roller is 6 μm to 9 μm. In some embodiments, the embossing roller The hardness of the material is greater than the hardness of the titanium coil, which can avoid rapid wear of the embossing roller due to frequent contact with the titanium coil, thereby increasing the cost of the device. In a specific example, the material of the embossing roller can be carbon steel, high speed steel, other suitable materials, or any combination of the above materials. In some embodiments, the surface pattern of the embossing roller can be formed by an electrical discharge machining process, a sandblasting process, an etching process, other suitable methods, or any combination of the above methods. In some embodiments, the surface roughness of the embossing roller can be 10 μm to 20 μm.

When the titanium roll is subjected to the embossing step, the embossing speed of each embossing step (ie, the speed at which the titanium roll passes through the embossing roller) may be 30 m to 60 m per minute. In some embodiments, the rolling force of the embossing roller can be 2 to 8 tons. When the embossing speed and the rolling power of the embossing roller are in the aforementioned range, and the titanium coil is subjected to three to four embossing steps, the surface of the obtained titanium plate has an irregular pattern, and It can reduce the reflectivity when light hits its surface, and diffuse the light, thereby reducing its gloss. In some embodiments, the surface roughness of the obtained titanium plate may be 6 μm to 7 μm. In some embodiments, the gloss (Gs60) of the prepared titanium plate may be 30% to 40%, wherein the gloss of the titanium plate is measured by a specular gloss method with a light irradiation angle of 60 degrees.

In some embodiments, if the aforementioned embossing speed is less than 30 meters per minute, the time and cost required for the manufacturing process will increase significantly. If the embossing speed is greater than 60 meters per minute, titanium has a high activity and is liable to stick to the surface of the embossing roller, thereby reducing the surface quality of the titanium roll after each embossing step. Furthermore, the embossing speed is too fast, and the lubrication requirements of titanium coils are high. Therefore, if When the lubricity of the titanium coil is poor, due to the rolling of the embossing roller, the titanium coil is easy to generate powder, and the surface quality of the titanium plate produced is reduced.

The following uses examples to illustrate the application of the present invention, but it is not intended to limit the present invention. Any person skilled in the art can make various changes and decorations without departing from the spirit and scope of the present invention.

Preparation of titanium plate Examples

First, a titanium roll is provided, and the surface of the titanium roll does not have an oxide layer. Then, the titanium coil is subjected to a pattern forming process. Among them, the president reduction of the pattern forming process is set to 6%, and the pattern forming process has three embossing steps. The surface roughness of the embossing roller is 13 μm, and the surface pattern of the embossing roller is formed by an etching process. The embossing speed of the titanium roll through the embossing roller was 18 meters per minute.

After three embossing steps, the titanium plate of the embodiment can be obtained. The surface roughness of the prepared titanium plate was 6.6 μm, and the pattern depth of the pattern on the surface of the titanium plate was 2.1 μm. Secondly, the gloss (Gs60) of the titanium plate is 34%.

Comparative example

The comparative example uses the same preparation method as the titanium plate manufacturing method of the example, and uses the same titanium roll and embossing roller for the embossing step. The difference is that the pattern forming process of the comparative example only performs one pass of embossing. step.

After one pass of the embossing step, the surface roughness of the titanium plate prepared in the comparative example was 3.2 μm, and the pattern depth of the pattern on the surface of the titanium plate was 0.7 μm. Secondly, the gloss (Gs60) of the titanium plate is 85%.

According to the glossiness of the titanium plates prepared in the foregoing examples and comparative examples, it can be known that the titanium plate (ie, the embodiment) obtained through three embossing steps has a lower glossiness. Obviously, the manufacturing method disclosed in the present invention can obtain a titanium plate with low gloss, and can solve the defect that the conventional titanium plate easily reflects light.

In addition, the dirt resistance of the titanium plates prepared in the foregoing examples and comparative examples, and titanium plates without a pattern on the surface (that is, titanium plates subjected to only a cold rolling process and a pattern forming process) were further evaluated. . First, the color (E ₁ ) of the test area of the titanium plate was measured by chromaticity measurement. Then, apply petroleum jelly to the test area and let it stand for 30 minutes. Then, wipe the petrolatum in the test area with a dry cloth, and measure the color (E ₂ ) of the test area with a colorimeter. Calculate the measured color difference value (△ E = E ₁ -E ₂ ), where the smaller the color difference value, the better the dirt resistance of the titanium plate.

According to the foregoing evaluation method, the color difference value of the titanium plate of the example is 4.2, the color difference value of the titanium plate of the comparative example is 15.6, and the color difference value of the titanium plate without a pattern on the surface is 18.3.

Obviously, the titanium plate obtained by the embossing step of the embodiment of the present invention has excellent stain resistance. Therefore, the titanium plate prepared by the present invention can effectively suppress the reflection of light, and it can also avoid the adhesion of dirt, so it can meet the application requirements.

According to the foregoing description, it can be known that the manufacturing method of the present invention can reduce the number of times (at least two times) of the embossing step of the titanium coil to form an irregular pattern on the surface of the obtained titanium plate, which can reduce the Titanium plate gloss. Secondly, with the irregular pattern on the surface of the titanium plate, the titanium plate prepared by the present invention has good stain resistance. Therefore, the titanium plate of the present invention can meet the application requirements of buildings.

In addition, the manufacturing method of the present invention does not require a pickling step, an alkaline washing step, and / or an anodizing step for the titanium coil, does not have the environmental protection problems faced by the conventional technology, and the required manufacturing cost can also be greatly reduced.

Although the present invention has been disclosed as above in the embodiments, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field to which the present invention pertains can make various changes and modifications without departing from the spirit and scope of the present invention. Retouching, so the scope of protection of the present invention shall be determined by the scope of the attached patent application.

Claims (10)

A method for manufacturing a titanium plate with low glossiness, comprising: providing a titanium roll, wherein one surface of the titanium roll does not have an oxide layer; and using an embossing roller to perform a pattern forming process on the titanium roll to The titanium plate is prepared, wherein the pattern forming process includes at least two embossing steps, and wherein the pattern forming process excludes performing an acid washing step, an alkaline washing step, and / or an anodizing step. According to the method for manufacturing a titanium plate having low gloss as described in the first patent application scope, before the manufacturing process of providing the titanium coil, the manufacturing method further includes: providing a titanium oxide coil, wherein the titanium oxide coil has A surface oxide layer; and performing an acid washing process on the titanium oxide roll to remove the surface oxide layer and form the titanium roll. The method for manufacturing a titanium plate with low gloss as described in item 1 of the scope of patent application, wherein the pattern forming process includes at least three embossing steps. According to the method for manufacturing a titanium plate with low gloss as described in the first item of the scope of patent application, one of the pattern forming processes reduces the amount of the president by 6% to 10%. According to the method for manufacturing a titanium plate with low gloss as described in item 4 of the scope of the patent application, wherein the reduction rate of one of the embossing steps per pass is 1.5% to 3%. According to the method for manufacturing a titanium plate with low gloss as described in item 1 of the scope of the patent application, one of the embossing steps in each pass has an embossing speed of 30 meters to 60 meters per minute. According to the method for manufacturing a titanium plate with low gloss as described in the first scope of the patent application, before the pattern forming process is performed, the manufacturing method further includes: performing a cold rolling process on the titanium coil. The method for manufacturing a titanium plate with low gloss as described in the first item of the patent application scope, wherein one of the titanium plates has a gloss (Gs60) of 30% to 40%. The method for manufacturing a titanium plate with low gloss as described in the first item of the patent application scope, wherein a surface roughness of one of the titanium plates is 6 μm to 7 μm. A titanium plate with low gloss, produced by using the manufacturing method described in any one of claims 1 to 9, wherein one of the titanium plates has a gloss (Gs60) of 30% to 40% The surface roughness of one of the titanium plates is 6 μm to 7 μm.