TW201931438A - Lighting method for lamp - Google Patents

Abstract

The invention provides a method for lighting a lamp which is possible to reduce useless power in contribution for exposing an exposure target, and capable of achievement of prolonging the life of a lamp. An exposure power is supplied to a lamp at exposure time for exposing an exposure object X, and a standby power is supplied to the lamp at the time other than the exposure time, wherein the standby power is lower than the exposure power and can keep the lamp being remained in a lighting state.

Description

Lamp lighting method

The present invention relates to a lighting method capable of emitting a lamp for exposure of, for example, a printed wiring board or the like.

One type of printed wiring board that has been used in the past is a wiring pattern formed of a metal such as copper on a substrate of a resin or a glass epoxy material in order to actually mount the component on an electronic device. The formation of the wiring pattern on such a printed wiring substrate can use a photo etching technique. The photolithography is applied to a substrate on which a metal layer to be wired is formed over the entire surface, and a photoresist for applying a photosensitive tincture is applied, and the irradiation light from the exposure device is irradiated to be the same as the wiring pattern. The reticle is carried out.

The photoresist includes a negative photoresist which reduces the solubility of the photoresist due to irradiation of light, and a positive photoresist which, in contrast, causes the solubility of the photoresist to increase due to the irradiation of light. By removing the photoresist portion which relatively increases the solubility due to the irradiation light by chemical treatment, when the exposed metal layer is removed by etching, only the metal layer remains below the portion where the photoresist remains. A photoresist is used to form a wiring pattern on the substrate. Even in the case where the irradiation light is applied to the photoresist of either the positive type or the negative type, in order to ensure that the irradiation surface is uniformly uniform in total, it is possible to use a plurality of discharge lamps having an average amount of light emission of one lamp as light source.

The discharge lamp generates ultraviolet light by causing arc discharge between the pair of electrodes disposed opposite to each other in the airtight internal space in the arc tube to excite the mercury enclosed in the internal space.

The most appropriate exposure time is determined according to the type of the photoresist; that is, the length of time during which the light from the discharge lamp is irradiated to the photoresist is determined. Therefore, a shutter is disposed between the discharge lamp and the exposure target (resist or the like), and by opening the shutter only at a required time, in general, the exposure of the object to be exposed is performed at the most appropriate exposure time. The shutter is closed during other periods (for example, during replacement of the exposure target). (for example, Patent Document 1).
Advanced Technology Literature
Patent Literature

Patent Document 1 JP-A-2002-373840

"The subject to be solved by the invention"

However, the conventional exposure method is problematic. Since the exposure time is controlled by the shutter, even if the exposure is not performed, the lamp needs to continuously emit light, which not only causes power failure, but also often causes the lamp to fail to achieve a long service life by the rated power.

The present invention has been made in view of the above problems, and an object of the invention is to provide a method for lighting a discharge lamp, which is capable of reducing power that does not contribute to exposure of an object to be exposed and is useless, and can achieve a long life of the lamp. Chemical.
"Means to solve the problem"

According to an aspect of the invention, there is provided a lighting method of a lamp, wherein an exposure power is supplied to a lamp during an exposure time for exposing an exposure object,
In addition to the exposure time, the standby power is supplied to the lamp, and the standby power is lower than the exposure power, and the lighting state of the lamp can be maintained.

Preferably, the lamp is a discharge lamp, and the supply time of the exposure power is a constant internal pressure of the discharge lamp when the internal pressure of the discharge lamp is continuously supplied to the discharge lamp. Time is even shorter.

Preferably, the lamp is an LED (Light Emitting Diode); and the supply time of the exposure power is a constant connection of the LED when the contact temperature of the LED reaches the exposure power and is supplied to the LED. The time to point the temperature is even shorter.

Preferably, in the case of the LED, the lamp stops supplying power to the lamp and turns off the light outside the exposure time.

Preferably, the intensity of the light from the exposed lamp is changed during the exposure time by the light sensitivity of the exposed photoresist.
Invention effect

According to the present invention, it is possible to provide a method of lighting a lamp which is capable of reducing unnecessary power that does not contribute to exposure of an object to be exposed, and which can achieve a long life of the lamp.

(Example 1)

(Composition of exposure machine 10)
Fig. 1 is a view showing an exposure machine 10 according to Embodiment 1 to which the present invention is applied. The exposure machine 10 is roughly constituted by an exposure device 50, an integrator 12, a concave mirror 14, an irradiation surface 16, and a shutter 24.

The exposure device 50 emits light having a wavelength suitable for exposure of the exposure target X. The details of the exposure device 50 will be described after explaining the configuration of the exposure machine 10.

The integrator 12 has an incident surface 18 that receives light from the exposure device 50, and an exit surface 20 that enhances the uniformity of the received light and emits the light. The entrance surface 18 and the exit surface 20 are formed with a plurality of fly-eye lenses 21, respectively.

The concave mirror 14 has a reflective concave surface 22 on its inner side. The concave mirror 14 reflects the light emitted from the integrator 12 by the reflective concave surface 22 to become parallel light.

The irradiation surface 16 receives the light of the parallel light from the concave mirror 14 and is disposed in a direction approximately perpendicular to the parallel light. The exposure target X is placed on the irradiation surface 16. On the surface of the exposure target X, for example, a sensitizer or a photoresist is applied. A desired circuit pattern or the like is formed on the surface of the exposure target X by irradiating the parallel light from the concave mirror 14 to a desired region in the exposure target X.

The shutter 24 is a device that is disposed on the exit surface 20 side of the integrator 12 and that switches the path (optical path) of light from the discharge lamp 110. The shutter 24 is opened in conjunction with the exposure time of the exposure target X to allow the light from the discharge lamp 110 to reach the exposure target X; the time other than the exposure time is such that the light from the discharge lamp 110 is not achieved by closing the shutter 24 The illuminated surface 16. Further, the position at which the shutter 24 is disposed is of course not limited to the embodiment, and may be disposed at another position on the optical path between the discharge lamp 110 and the exposure target X.

(Composition of exposure device 50)
Fig. 2 is a view showing an exposure apparatus 50 according to Embodiment 1 to which the present invention is applied. 3 is a plan view of the exposure device 50. The exposure device 50 includes a plurality of light source devices 100, a frame 52, a discharge lamp switch 53, a discharge lamp power source 54, and a control unit 60.

The light source device 100 emits light having a wavelength suitable for exposure of the exposure target X. As shown in FIG. 4, the light source device 100 is roughly constituted by a discharge lamp 110, a mirror 150, and an insulating base 170. Further, the mirror 150 is sometimes combined with the insulating base 170 as the mirror container 151.

As shown in FIG. 5, the discharge lamp 110 has an arc tube portion 112 and a pair of sealing portions 114 extending from the arc tube portion 112. The arc tube portion 112 and the pair of sealing portions 114 are integrally formed of quartz glass. Further, an internal space 116 sealed by the sealing portion 114 is further formed in the arc tube portion 112.

Each of the sealing portions 114 of the discharge lamp 110 is provided with an embedded molybdenum foil 118, one end of which is connected to one end of the foil 118, and the other end of which is disposed in the interior space 116. A pair of electrodes 120, and one end is connected to the other end of the foil 118 and the other ends are extended outward by the sealing portion 114 by a pair of lead bars 122. Further, the internal space 116 is sealed with a specified amount of mercury 124 and halogen (for example, bromine).

When a predetermined high voltage is applied to the pair of lead bars 122 provided in the discharge lamp 110, the glow discharge started between the pair of electrodes 120 provided in the internal space 116 of the arc tube portion 112 is caused to be an arc discharge. The evaporation caused by the arc and the excited mercury 124 emit light (mainly ultraviolet rays).

Returning to Fig. 4, the sealing portion 114 on one side of the light source device 100 of the present embodiment is inserted into the sealing portion insertion hole 156 of the mirror 150. In addition, the discharge lamp 110 may be used for an alternating current lighting or a direct current lighting.

The mirror 150 has a bowl-shaped reflecting surface 152 on its inner side surface. The reflective surface 152 is configured to reflect a portion of the light from the discharge lamp 110 that is configured to position the arc tube portion 112 on the inside of the mirror 150. In the present embodiment, the reflecting surface 152 defines a paraboloid of rotation. Further, the light-emitting point in the discharge lamp 110 (generally, the center position of the arc formed between one of the electrodes 120 in the internal space 116) coincides with the focus of the paraboloid of revolution. Thereby, the light emitted from the light-emitting point of the discharge lamp 110 and reflected by the reflecting surface 152 and emitted by the opening 154 of the mirror 150 is almost parallel light. Of course, the shape of the reflecting surface 152 is not limited thereto, and may be a rotating elliptical surface or another rotating surface; or may be a shape other than the rotating surface. Further, it is not necessary to make the light-emitting point coincide with the focus; it is also possible to make the light-emitting point deviate from the focus as needed.

Further, the opening 154 in the mirror 150 is protruded from the bottom neck portion 155 from the opposite side. Further, on the reflecting surface 152 of the mirror 150, a sealing portion insertion hole 156 into which the sealing portion 114 on one side of the discharge lamp 110 is inserted is formed. The seal insertion hole 156 is formed from the bottom of the reflecting surface 152 toward the front end of the bottom neck portion 155.

As shown in FIG. 1, by combining the mirror 150 with the discharge lamp 110, the light emitted from the discharge lamp 110 travels along the central axis CL of the reflecting surface 152 at a predetermined angle (opening). The corners of the corners travel toward the front of the mirror 150.

Referring back to FIG. 4, the insulating base 170 is formed of an electrical insulator such as ceramic, and is formed with a bottom neck portion 155 for the mirror 150 and a discharge lamp 110 inserted into the sealing portion insertion hole 156. The mirror inserted into the sealing portion 114 on one side is inserted into the hole 172. The bottom neck portion 155 and the sealing portion 114 are inserted into the mirror insertion hole 172; the insulating base 170 is covered with the sealing portion insertion hole 156 from the outside.

Further, the insulating base 170 is formed with an inner space 174 that communicates with the mirror insertion hole 172 described above; and the inner space 174 communicates with the outer side to form a power line through which the power supply line A can be inserted. Hole 176.

Further, the insulating base 170 and the discharge lamp 110 are fixed to each other by an inorganic adhesive C having electrical insulating properties and high thermal conductivity. Specifically, the end portion of the bottom neck portion 155 of the mirror 150 and the sealing portion 114 on one side of the discharge lamp 110 are inserted into the mirror insertion hole 172 of the insulating base 170; and the power supply line A is disposed in the power supply line A. In the state of the inner space 174 of the insulating base 170, the inorganic space C is filled in the inner space 174.

Returning to Fig. 3, frame 52 is an approximately rectangular parallelepiped component material that can be used to form a plurality of recesses 58 for a plurality of light source devices 100.

Returning to Fig. 2, the discharge lamp power source 54 is the power required for the discharge lamp 110 of each of the light source devices 100 mounted on the frame 52. Further, the discharge lamp switch 53 is for turning on or off the current supplied to the discharge lamp 110.

The control unit 60 has a power supply control for controlling the discharge lamp power supply 54 to control the power supply from the discharge lamp power supply 54 to the discharge lamp 110. Specifically, as shown in FIG. 6 , when the discharge lamp power source 54 exposes the exposure target X, the control unit 60 supplies the exposure power H only for the time (exposure time) required for the exposure (for example, discharge). The rated power of the lamp 110). In addition, control is performed to supply the discharge lamp 110 with standby power L that is lower than the exposure power H and that can maintain the lighting state of the discharge lamp 110, in addition to the above-described exposure time.

In addition, although the example of the discharge electric power H of the pulse-wave shape is supplied to the discharge lamp power supply 54 as an example, the waveform of the exposure electric power H supplied to the discharge lamp power supply 54 is not limited to this, of course. As shown in FIG. 7 , the primary power type (linear type) may be increased or decreased from the standby power L to the exposure power H, or a quadratic function type (release type) not shown may be added. cut back. Still further, for example, as shown in FIG. 8, the enthalpy of the exposure power H during the exposure time may be non-constant. As shown in FIG. 8, even if the exposure power is relatively high in the first half of the exposure time and the relatively low exposure power is supplied in the second half of the exposure time, the amount of power supplied during the exposure time (the time of the power) The integral is equivalent to the pattern of Fig. 6 or Fig. 7. Further, in accordance with the characteristics of the exposure target X (for example, a photoresist), as shown in FIGS. 9 and 10, the electric power supplied to the discharge lamp 110 during the exposure time may be changed to change the luminous intensity of the discharge lamp 110.

As described above, by changing the electric power supplied to the discharge lamp 110 during the exposure time, it is possible to perform power adjustment for a short period of time depending on the degree of reaction of the photoresist, and it is possible to supply an amount of light suitable for the photoreaction of the photoresist.

(Operation of exposure device 50)
When the power switch (not shown) of the exposure device 50 is introduced, the discharge lamp switch 53 is turned on, and the power supply from the discharge lamp power source 54 to the discharge lamp 110 of the light source device 100 is started. When the power is turned on, the discharge lamp 110 is illuminated. Further, at this stage, the electric power supplied from the power source 54 for the discharge lamp to the discharge lamp 110 is the standby power L.

Then, the exposure operation for the exposure target X is started. When the exposure target X is placed on the irradiation surface 16 of the exposure machine 10, the discharge lamp power supply 54 is for a specified time (that is, a specified exposure time), for the discharge lamp. 110 supplies an exposure power H higher than the start power. At the same time, the shutter 24 of the exposure machine 10 is turned on, and the exposure light from the discharge lamp 110 is irradiated onto the exposure target X to perform an exposure operation.

When the specified exposure time is reached, the shutter 24 is turned off and the electric power supplied from the discharge lamp power source 54 to the discharge lamp 110 is returned from the exposure power H to the standby power L. After that, the exposure target X to which the exposure is terminated is replaced with the unexposed exposure target X, and the exposure operation described above is performed. Thereafter, the exposure operation is repeated.

(Special features of the exposure device 50)
According to the present embodiment, when the shutter 24 is closed and exposure is not performed on the exposure target X, the self-discharge lamp power supply 54 supplies the standby power L to the discharge lamp 110; when the shutter 24 is opened and the exposure target X is exposed, The self-discharge lamp power supply 54 supplies the discharge lamp 110 with an exposure power H higher than the standby power L.

By this means, when the shutter 24 is closed so that the light from the discharge lamp 110 does not contribute to the exposure of the exposure target X, since it is supplied to the discharge lamp 110 at a relatively low standby power L, useless power can be reduced.

Further, in comparison with the conventional method of continuously lighting the discharge lamp 110 with the rated electric power, since the discharge lamp 110 is turned on at the standby electric power L lower than the rated electric power, the discharge lamp can be realized. The long life of 110 is long.

Further, when attention is paid to the pressure of the internal space 116 of the arc tube portion 112 of the discharge lamp 110 in the lighting, in the case of the conventional method of constantly lighting the discharge lamp 110 with the rated electric power, as shown in FIG. The electric power supplied to the discharge lamp 110 and the pressure in the internal space 116 are almost constant. On the other hand, in the case of the lighting method of the discharge lamp 110 of the present embodiment, as shown in FIG. 12, the pressure of the internal space 116 when the standby power L is supplied is relatively low; when the supply of the exposure power H is started. At this time, the pressure begins to rise. When the self-exposure power H returns to the standby power L, the pressure that starts to rise becomes maximum and starts to decrease. In the future, this type of action is repeated.

According to the lighting method of the discharge lamp 110 of the present embodiment, the time for supplying the exposure power H is higher than the internal pressure of the discharge lamp 110 (the pressure of the internal space 116 in the arc tube portion 112) reaches the exposure power H. The time of the constant internal pressure (i.e., the pressure state as illustrated in Fig. 8) of the discharge lamp 110 in the case of being supplied to the discharge lamp 110 is also shorter. Therefore, even if the exposure power H at the time of performing the exposure operation of the exposure target X is the same as the rated power in the conventional method, the same amount of light is emitted, and the internal space in the arc tube portion 112 of the discharge lamp 110 is emitted. The peak pressure of 116 can be suppressed to a lower level than in the case of the conventional method.

When the pressure of the internal space 116 in the arc tube portion 112 is suppressed from being maintained at a pressure, even a light having a relatively short wavelength (short-wavelength light) among the visible light included in the light emitted from the discharge lamp 110, And the ratio of ultraviolet light is also increased. When the ratio of the short-wavelength light is increased, the exposure efficiency of the photoresist provided on the exposure target X is increased upward. In view of the above, according to the lighting method of the discharge lamp 110 of the present embodiment, it is possible to contribute to the improvement of the exposure efficiency of the exposure target X.

(Modification 1)
In the above-described embodiment, although the lighting method in the case where the discharge lamp 110 is used as the lamp is described as a quick description, it is also possible to use an LED (Light Emitting Diode) or a laser as a lamp instead. Discharge lamp 110.

In particular, when an LED is used as the lamp, the contact temperature of the LED (the temperature of the joint portion where the P-type semiconductor and the N-type semiconductor which generate heat when the LED emits light are mutually joined) is used for the exposure. The power for exposure is supplied in a shorter period of time until the constant temperature of the LED in the case where the power is continuously supplied to the LED.

Therefore, it is possible to use the peak of the irradiation intensity (light in FIG. 13) of the light from the LED (the ultraviolet light) generated after the power supplied to the LED is increased for each exposure time (see FIG. 13), so that the exposure target can be more efficiently performed. The object is exposed.

Furthermore, in the above-described embodiment, the standby power L is supplied lower than the exposure power H except for the exposure time. However, when the LED or the laser is used as the lamp, It is to stop the power supplied outside the exposure time and turn off the LED or the laser.

(Modification 2)
When an LED or a laser is used as the lamp, of course, when the discharge lamp 110 is used, the irradiation intensity of the light irradiated by the light source device 100 during the exposure time may be a constant value. Instead, as shown in FIG. 14, the flail exposure time is divided into, for example, two ("first exposure time" と "second exposure time"), and the first exposure time and the second exposure time are changed from the illumination by the light source device 100. The intensity of light illumination.

In the above-mentioned FIG. 14, although the example in which the irradiation intensity is increased in the first exposure time and the second exposure time is made weaker than the irradiation intensity is illustrated, it is needless to say that as shown in FIG. The irradiation intensity is weakened at the first exposure time and is stronger than the irradiation intensity at the second exposure time. Further, as shown in FIG. 16, the irradiation intensity may be gradually increased in the first exposure time, and the irradiation intensity may be set to a constant value in the second exposure time. Furthermore, the continuous exposure time can be divided into three or more; for example, as shown in FIG. 17, the irradiation intensity is gradually increased in the first exposure time; and the irradiation intensity is constant in the second exposure time; The irradiation intensity is gradually weakened at the third exposure time. Further, as shown in FIG. 18, the irradiation intensity may be gradually increased in the first exposure time, and the irradiation intensity may be made constant after the first exposure time, and the irradiation intensity may be made constant in the third exposure time. After the initial increase, the function is gradually reduced by the quadratic function. As described above, in the case where the irradiation intensity is changed, a case where the LED laser is used as the lamp can be used, and of course, the discharge lamp 110 can be used.

As described above, by changing the electric power supplied to the lamp during the exposure time, it is possible to perform power adjustment for a short period of time depending on the degree of reaction of the photoresist, and to supply an amount of light suitable for the photoreaction of the photoresist.

The embodiment disclosed in the present invention is assumed to be non-limiting, since all the points are exemplified. The scope of the present invention is not limited by the scope of the invention, but is intended to be included in the scope of the claims.

10‧‧‧Exposure machine

12‧‧‧ Integrator

14‧‧‧ concave mirror

16‧‧‧ illuminated surface

18‧‧‧Incoming surface

20‧‧‧Outlet

21‧‧‧ flying eye lens

22‧‧‧Reflective concave

24‧‧ ‧Shutter

50‧‧‧Exposure device

52‧‧‧Frame

53‧‧‧Discharge lamp switch

54‧‧‧Power supply for discharge lamps

58‧‧‧ recess

60‧‧‧Control Department

100‧‧‧Light source device

110‧‧‧discharge lamp

112‧‧‧Lighting tube department

114‧‧‧ Sealing Department

116‧‧‧Internal space

118‧‧‧Foil

120‧‧‧electrode

122‧‧‧ lead bars

124‧‧‧ Mercury

150‧‧‧Mirror

151‧‧‧Mirror container

152‧‧‧reflecting surface

154‧‧‧ openings

155‧‧‧ bottom neck

156‧‧‧ Sealing hole

170‧‧‧Insert base

172‧‧‧Mirror insertion hole

174‧‧‧ inside space

176‧‧‧Power cord plugged into the hole

X‧‧‧ Exposure objects

H‧‧‧Exposure power

L‧‧‧Standby power

Fig. 1 is a view showing an example of an exposure machine 10 which can be applied to the present invention.

Fig. 2 is a view showing an example of an exposure apparatus 50 which can be applied to the present invention.

Fig. 3 is a plan view showing an example of an exposure apparatus 50 which can be applied to the present invention.

Fig. 4 is a cross-sectional view showing an example of a light source device 100 which can be applied to the present invention.

FIG. 5 is a cross-sectional view showing an example of the discharge lamp 110.

Fig. 6 is a graph showing an example of electric power supplied to the discharge lamp 110 in accordance with the lighting method according to the present invention.

Fig. 7 is a graph showing another example of the electric power supplied to the discharge lamp 110 by the lighting method according to the present invention.

Fig. 8 is a graph showing another example of the electric power supplied to the discharge lamp 110 by the lighting method according to the present invention.

Fig. 9 is a graph showing another example of the electric power supplied to the discharge lamp 110 by the lighting method according to the present invention.

Fig. 10 is a graph showing another example of the electric power supplied to the discharge lamp 110 by the lighting method according to the present invention.

Fig. 11 is a graph showing an example of the electric power applied to the discharge lamp and the pressure in the internal space of the arc tube portion according to the conventional lighting method.

Fig. 12 is a graph showing an example of the electric power supplied to the discharge lamp 110 and the pressure in the internal space 116 of the arc tube portion 112 according to the lighting method according to the present invention.

Fig. 13 is a graph showing an example of the relationship between the elapsed time from the start of power supply to the LED and the irradiation intensity of the light irradiated from the LED according to the lighting method according to the first modification.

Fig. 14 is a view showing an example of the irradiation intensity of light in the exposure time according to the lighting method according to the second modification.

Fig. 15 is a view showing an example of the irradiation intensity of light in the exposure time according to the lighting method according to the second modification.

Fig. 16 is a view showing an example of the irradiation intensity of light in the exposure time according to the lighting method according to the second modification.

Fig. 17 is a view showing an example of the irradiation intensity of light in the exposure time according to the lighting method according to the second modification.

Fig. 18 is a view showing an example of the irradiation intensity of light in the exposure time according to the lighting method according to the second modification.

Claims (5)

A method for lighting a lamp, wherein an exposure power is supplied to a lamp during an exposure time for exposing an exposure target, In addition to the exposure time, the standby power is supplied to the lamp, and the standby power is lower than the exposure power and the lighting state of the lamp can be maintained. The lighting method as recited in claim 1, wherein The aforementioned lamp is a discharge lamp; The supply time of the exposure power is a ratio that is shorter when the internal pressure of the discharge lamp reaches the constant internal pressure of the discharge lamp when the exposure power is continuously supplied to the discharge lamp. The lighting method as recited in claim 1, wherein The aforementioned lamp is an LED; The supply time of the exposure power is shorter than the time when the junction temperature of the LED reaches the constant contact temperature of the LED when the exposure power is supplied to the LED. The lighting method according to claim 3, wherein the power supply to the lamp is stopped and the light is turned off in addition to the exposure time. The lighting method according to claim 1, wherein the irradiation intensity of the lamp is changed in accordance with the light sensitivity of the exposed photoresist during the exposure time.