TW201915590A - Structured-light projector - Google Patents

Structured-light projector Download PDF

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TW201915590A
TW201915590A TW107124849A TW107124849A TW201915590A TW 201915590 A TW201915590 A TW 201915590A TW 107124849 A TW107124849 A TW 107124849A TW 107124849 A TW107124849 A TW 107124849A TW 201915590 A TW201915590 A TW 201915590A
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light
projector
structured
diffractive optical
bricks
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TW107124849A
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TWI730243B (en
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紀政宏
蕭名淑
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奇景光電股份有限公司
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Abstract

A structured-light projector includes a diffractive optical element (DOE) that receives a collimated light and generates a plurality of light tiles. The DOE includes a plurality of optical components disposed on a substrate, wherein the light tiles are randomly arranged.

Description

結構光投影機Structured light projector

本發明係有關一種投影機,特別是關於一種結構光(structured-light)投影機。The present invention relates to a projector, and more particularly to a structured-light projector.

小型或微型光學投影機可適用於各種應用,例如投射結構光圖案於物件上,進行三維或深度映射(mapping)。於三維映射系統中,使用影像擷取裝置(例如相機)以擷取投射於物件的影像圖案。擷取影像經處理後,可建構物件的三維圖。Small or miniature optical projectors can be used in a variety of applications, such as projecting a structured light pattern onto an object for three-dimensional or depth mapping. In a three-dimensional mapping system, an image capture device (such as a camera) is used to capture an image pattern projected onto an object. After the captured image is processed, a three-dimensional map of the object can be constructed.

傳統投影機因為低解碼率(decode rate)而造成不良的效能。此外,即使光學製造的進步使得光學系統小型化的成本降低,然而傳統投影機對於體積或/且成本仍有相當的改善空間。Conventional projectors have poor performance due to low decoding rates. In addition, even though advances in optical manufacturing have reduced the cost of miniaturization of optical systems, conventional projectors still have considerable room for improvement in volume and/or cost.

鑑於傳統投影機的效能不佳、體積龐大或價格昂貴,因此亟需提出一種新穎的結構光投影機,使得效能得以有效增進或/且體積或成本可以降低。In view of the poor performance, bulkiness, or price of conventional projectors, there is a need to propose a novel structured light projector that allows for improved performance or/or reduced volume or cost.

鑑於上述,本發明實施例的目的之一在於提出一種具增進效能或/且減少體積或成本的結構光投影機。In view of the above, one of the objects of embodiments of the present invention is to provide a structured light projector with improved performance or/or reduced volume or cost.

根據本發明實施例,結構光投影機包含光源、光束限制裝置及繞射光學元件。光源產生具預設圖案的發射光。光束限制裝置接收發射光並產生準直光。繞射光學元件接收準直光並產生複數光磚,該繞射光學元件包含複數光學組成元件,其中該些光磚隨機排列。According to an embodiment of the invention, a structured light projector comprises a light source, a beam limiting device and a diffractive optical element. The light source produces an emitted light having a predetermined pattern. The beam limiting device receives the emitted light and produces collimated light. The diffractive optical element receives the collimated light and produces a plurality of light bricks, the diffractive optical element comprising a plurality of optical constituent elements, wherein the light bricks are randomly arranged.

根據本發明另一實施例,結構光投影機包含點光源、光束限制裝置、圖案化裝置及繞射光學元件。點光源產生發射光。光束限制裝置接收發射光並產生準直光。圖案化裝置接收準直光並產生圖案光。繞射光學元件接收圖案光並產生複數光磚,該繞射光學元件包含複數光學組成元件,且該些光磚隨機排列。根據本發明又一實施例,繞射光學元件位於圖案化裝置之前。In accordance with another embodiment of the present invention, a structured light projector includes a point source, a beam limiting device, a patterning device, and a diffractive optical element. The point source produces an emitted light. The beam limiting device receives the emitted light and produces collimated light. The patterning device receives the collimated light and produces patterned light. The diffractive optical element receives the pattern light and produces a plurality of light bricks, the diffractive optical element comprising a plurality of optical constituent elements, and the light bricks are randomly arranged. According to a further embodiment of the invention, the diffractive optical element is located before the patterning device.

根據本發明又一實施例,結構光投影機包含光源及繞射光學元件。光源產生具預設圖案的發射光。繞射光學元件接收發射光並產生複數光磚,其隨機或規律排列。In accordance with yet another embodiment of the present invention, a structured light projector includes a light source and a diffractive optical element. The light source produces an emitted light having a predetermined pattern. The diffractive optical element receives the emitted light and produces a plurality of light bricks that are randomly or regularly arranged.

第一A圖顯示本發明第一實施例之結構光投影機100的方塊圖,且第一B圖例示第一A圖之結構光投影機100的示意圖。結構光投影機100較佳為一種小型光學投影機,適用以投射結構光圖案於物件上,以進行三維映射。The first A diagram shows a block diagram of the structured light projector 100 of the first embodiment of the present invention, and the first B diagram illustrates a schematic diagram of the structured light projector 100 of the first A diagram. The structured light projector 100 is preferably a small optical projector adapted to project a structured light pattern onto an object for three-dimensional mapping.

在本實施例中,結構光投影機100可包含光源11,其產生具預設圖案的發射光。發射光可以為可見光或/且不可見光(例如紅外線)。本實施例之光源11可包含半導體二極體陣列,根據預設圖案排列。在一較佳實施例中,光源11可包含垂直腔面射型雷射(vertical-cavity surface-emitting laser, VCSEL)二極體陣列,設於基板(未顯示)上,並根據預設圖案排列。藉此,垂直腔面射型雷射(VCSEL)二極體作為光源11,同時執行光發射與圖案化。垂直腔面射型雷射(VCSEL)二極體可用以製造小型且高密度光源。In the present embodiment, the structured light projector 100 can include a light source 11 that produces emitted light having a predetermined pattern. The emitted light can be visible or/and invisible (eg, infrared). The light source 11 of this embodiment may comprise a semiconductor diode array arranged according to a predetermined pattern. In a preferred embodiment, the light source 11 can include a vertical-cavity surface-emitting laser (VCSEL) diode array disposed on a substrate (not shown) and arranged according to a predetermined pattern. . Thereby, a vertical cavity surface-emitting laser (VCSEL) diode is used as the light source 11, and light emission and patterning are simultaneously performed. Vertical cavity surface-emitting laser (VCSEL) diodes can be used to make small, high-density light sources.

在一實施例中,光源11的半導體二極體可依序點亮,因而得以於近區域達到功耗降低、解碼率增強或/且效能改善。第二A圖顯示光源11的部分半導體二極體,分為相鄰二群而依序點亮。第二B圖顯示光源11的部分半導體二極體,分為交叉的二群而依序點亮。光源11的半導體二極體的形狀與大小可彼此相異。第二C圖顯示光源11的部分半導體二極體,依形狀分為交叉的二群而依序點亮。In an embodiment, the semiconductor diodes of the light source 11 can be sequentially illuminated, thereby achieving power consumption reduction, decoding rate enhancement, and/or performance improvement in the near region. The second A diagram shows a portion of the semiconductor diode of the light source 11, which is divided into adjacent groups and sequentially illuminated. The second B diagram shows a portion of the semiconductor diode of the light source 11, which is divided into two groups that are crossed and sequentially illuminated. The shape and size of the semiconductor diodes of the light source 11 may be different from each other. The second C-picture shows a part of the semiconductor diode of the light source 11, which is divided into two groups according to the shape and sequentially lights up.

本實施例之結構光投影機100可包含光束限制(beam limiting)裝置12,其接收(來自光源11的)發射光並限縮發射光的截面,因而形成準直(collimated)光。在一較佳實施例中,光束限制裝置12可包含準直透鏡,其可包含透明材質(例如塑膠或玻璃),且可使用晶圓級光學(WLO)技術製造。如第一B圖所例示(但不限定於此),準直透鏡(亦即光束限制裝置12)於面向光源11的一側(例如左側)為平面,而於另一側(例如右側)為凸面。雖然第一B圖所例示的光束限制裝置12包含單一透鏡,然而也可使用複數個透鏡或複數組透鏡以建構光束限制裝置12。The structured light projector 100 of the present embodiment can include a beam limiting device 12 that receives (from the source 11) emitted light and confines the cross-section of the emitted light, thereby forming collimated light. In a preferred embodiment, the beam limiting device 12 can include a collimating lens that can comprise a transparent material (eg, plastic or glass) and can be fabricated using wafer level optical (WLO) technology. As illustrated in FIG. B (but not limited thereto), the collimating lens (ie, the beam limiting device 12) is planar on the side facing the light source 11 (eg, the left side), and on the other side (eg, the right side) Convex. Although the beam limiting device 12 illustrated in FIG. B includes a single lens, a plurality of lenses or complex array lenses may be used to construct the beam limiting device 12.

本實施例之結構光投影機100可包含繞射光學元件(diffractive optical element, DOE)13,其接收(來自光束限制裝置12的)準直光,並產生複數光磚(light tile)。光磚以二維方式互相間隔。如第一B圖所例示,本實施例之繞射光學元件13可包含複數光學組成元件(例如繞射光學組成元件)131,設於基板132上。光學組成元件131可設在相反於光束限制裝置12的一側(例如右側)。繞射光學元件13可包含透明材質,例如塑膠或玻璃。The structured light projector 100 of the present embodiment can include a diffractive optical element (DOE) 13 that receives collimated light (from the beam limiting device 12) and produces a plurality of light tiles. Light bricks are spaced apart from each other in two dimensions. As illustrated in FIG. B, the diffractive optical element 13 of the present embodiment may include a plurality of optical constituent elements (eg, diffractive optical constituent elements) 131 disposed on the substrate 132. The optical component 131 can be disposed on the opposite side (e.g., the right side) of the beam limiting device 12. The diffractive optical element 13 can comprise a transparent material such as plastic or glass.

根據本實施例的特徵之一,所產生的光磚係隨機排列。在本說明書中,“隨機”一詞係指光磚沿至少一方向(例如水平方向)為非週期性或非相關(uncorrelated)。換句話說,光磚沿特定方向(例如水平方向或X方向)不具有或重複任何樣式。藉此,繞射光學元件(DOE)13所產生的相鄰光磚可部分重疊。According to one of the features of the embodiment, the generated light bricks are randomly arranged. In the present specification, the term "random" means that the light brick is aperiodic or uncorrelated in at least one direction (for example, a horizontal direction). In other words, the tiles do not have or repeat any pattern in a particular direction (eg, horizontal or X-direction). Thereby, adjacent tiles produced by the diffractive optical element (DOE) 13 may partially overlap.

第三A圖例示光磚的中心為週期性排列,每一列間距相同且垂直互相對準。第三B圖例示光磚的中心為週期性排列,每一列間距相同但垂直互相交錯。第三C圖例示本發明實施例當中第一B圖之繞射光學元件(DOE)13所產生的光磚的中心,其隨機或非週期性排列。一般來說,光磚係從週期性排列位置沿至少一方向作隨機些微的移動。在一實施例中,光磚的移動範圍需小於預設範圍,使得遠區域物件的投射影像的光點密度可維持高於預設臨界值。第三D圖顯示每一光磚於相應邊界130當中隨機移動,其中每一邊界130的中心係位於週期性排列的未移動位置。值得注意的是,邊界130彼此不重疊。換句話說,相鄰邊界130之間需存在具預設值的間隙。The third A diagram illustrates that the center of the light brick is periodically arranged, and each column has the same pitch and is vertically aligned with each other. The third B diagram illustrates that the center of the light brick is periodically arranged, and each column has the same pitch but is vertically staggered. The third C diagram illustrates the center of the light bricks produced by the diffractive optical element (DOE) 13 of the first B diagram of the embodiment of the present invention, which is randomly or non-periodically arranged. Generally, the light bricks are randomly moved in at least one direction from the periodically arranged position. In an embodiment, the moving range of the light brick needs to be smaller than a preset range, so that the spot density of the projected image of the object in the far area can be maintained above a preset threshold. The third D-Picture shows that each tile traverses randomly within a respective boundary 130, with the center of each boundary 130 being in a periodically aligned, unmoved position. It is worth noting that the boundaries 130 do not overlap each other. In other words, a gap with a preset value needs to exist between adjacent boundaries 130.

對於具週期排列之光磚的投影機,其效能(特別是解碼率)很差,主要係因為其具有高度重複圖案,因而增加圖案匹配的困難。相反地,在本實施例中,結構光投影機100的光磚係隨機排列,因而克服週期排列之光磚之投影機的缺失,因而得以大量地增進解碼率與效能。For projectors with periodically arranged light bricks, the performance (especially the decoding rate) is poor, mainly because of its highly repeating pattern, which increases the difficulty of pattern matching. On the contrary, in the present embodiment, the light bricks of the structured light projector 100 are randomly arranged, thereby overcoming the lack of the projector of the periodically arranged light bricks, thereby greatly improving the decoding rate and performance.

再者,根據光學理論,如果降低第一B圖所例示準直透鏡(亦即光束限制裝置12)的焦距f,則投射於遠區域物件的光源11的預設圖案,其放大率將跟著提高。值得注意的是,放大率的提高並不會影響本實施例之解碼率效能。因此,結構光投影機100的整體體積得以降低,因此可以小型化投影機。再者,由於光磚係隨機排列,光源11的垂直腔面射型雷射(VCSEL)二極體的數目可以減少而不會影響遠區域物件的投射影像的光點密度。因此,結構光投影機100的整體成本得以降低,使得投影機的價格更便宜。Furthermore, according to optical theory, if the focal length f of the collimating lens (ie, the beam limiting device 12) illustrated in the first B diagram is lowered, the predetermined pattern of the light source 11 projected on the object in the far region will be improved in magnification. . It is worth noting that the increase in magnification does not affect the decoding rate performance of this embodiment. Therefore, the overall volume of the structured light projector 100 can be reduced, so that the projector can be miniaturized. Moreover, since the light bricks are randomly arranged, the number of vertical cavity surface-emitting laser (VCSEL) diodes of the light source 11 can be reduced without affecting the spot density of the projected image of the object in the far area. Therefore, the overall cost of the structured light projector 100 can be reduced, making the projector less expensive.

在一實施例中,邊緣的光磚的密度高於其他區域。因此,遠區域物件的投射影像之邊緣的光點密度可大致相同於其他區域,不會受到非近軸失真(non-paraxial distortion)的影響,因而增強三維映射。第三E圖例示於邊緣排列有較多的光磚。In an embodiment, the edge of the light brick has a higher density than the other areas. Therefore, the spot density of the edge of the projected image of the far-field object can be substantially the same as other regions, and is not affected by non-paraxial distortion, thereby enhancing the three-dimensional mapping. The third E diagram illustrates that a plurality of light bricks are arranged at the edges.

在另一實施例中,針對光磚的排列進行校正,用以補償遠區域物件的投射影像於邊緣處所產生的光學失真(optical distortion)。第三F圖例示針對光磚的排列進行校正。In another embodiment, the alignment of the tiles is corrected to compensate for optical distortion at the edges of the projected image of the object in the far region. The third F diagram illustrates the correction for the arrangement of the light bricks.

第四圖例示本發明實施例之結構光投影機100的剖面圖。在本實施例中,結構光投影機100可包含晶片31(作為光源11),其包含有垂直腔面射型雷射(VCSEL)二極體。晶片31設置於基底32上。結構光投影機100可包含準直透鏡33(作為光束限制裝置12),其藉由第一間隔物34與晶片31、基底32相隔離。結構光投影機100可包含繞射光學元件13,其藉由第二間隔物35與準直透鏡33相隔離。藉此,準直透鏡33位於晶片31與繞射光學元件13之間。The fourth figure illustrates a cross-sectional view of a structured light projector 100 in accordance with an embodiment of the present invention. In the present embodiment, structured light projector 100 can include a wafer 31 (as light source 11) that includes a vertical cavity surface-emitting laser (VCSEL) diode. The wafer 31 is disposed on the substrate 32. The structured light projector 100 can include a collimating lens 33 (as beam limiting device 12) that is isolated from the wafer 31, substrate 32 by a first spacer 34. The structured light projector 100 can include a diffractive optical element 13 that is isolated from the collimating lens 33 by a second spacer 35. Thereby, the collimator lens 33 is located between the wafer 31 and the diffractive optical element 13.

第五A圖顯示本發明第二實施例之結構光投影機200的方塊圖,且第五B圖例示第五A圖之結構光投影機200的示意圖,與前一實施例相同的技術細節予以省略。5A is a block diagram showing a structured light projector 200 according to a second embodiment of the present invention, and FIG. 5B is a schematic view showing a structured light projector 200 according to FIG. 5A, and the same technical details as in the previous embodiment are given. Omitted.

在本實施例中,結構光投影機200可包含光源11,特別是點光源,以產生發射光。本實施例之光源11可包含單一半導體二極體。在一較佳實施例中,光源11可包含邊射型雷射(edge-emitting laser)二極體。In the present embodiment, structured light projector 200 can include a light source 11, particularly a point source, to produce emitted light. The light source 11 of this embodiment may comprise a single semiconductor diode. In a preferred embodiment, light source 11 can include an edge-emitting laser diode.

本實施例之結構光投影機200可包含光束限制(beam limiting)裝置12,其接收(來自光源11的)發射光並限縮發射光的截面,因而形成準直(collimated)光。在一較佳實施例中,光束限制裝置12可包含準直透鏡,其可包含透明材質(例如塑膠或玻璃),且可使用晶圓級光學(WLO)技術製造。The structured light projector 200 of the present embodiment can include a beam limiting device 12 that receives (from the source 11) the emitted light and confines the cross-section of the emitted light, thereby forming collimated light. In a preferred embodiment, the beam limiting device 12 can include a collimating lens that can comprise a transparent material (eg, plastic or glass) and can be fabricated using wafer level optical (WLO) technology.

本實施例之結構光投影機200可包含圖案化裝置(patterning device)14,其接收(來自光束限制裝置12的)準直光,並產生圖案光。在一實施例中,圖案化裝置14可包含繞射光學元件,或其他適當光學元件用以產生具預設圖案的圖案光。The structured light projector 200 of the present embodiment can include a patterning device 14 that receives collimated light (from the beam limiting device 12) and produces patterned light. In an embodiment, the patterning device 14 can include diffractive optical elements, or other suitable optical elements for generating patterned light having a predetermined pattern.

本實施例之結構光投影機200可包含繞射光學元件(DOE)13,其接收(來自圖案化裝置14的)圖案光,並產生複數光磚(light tile)。光磚以二維方式互相間隔。如第五B圖所例示,本實施例之繞射光學元件13可包含複數光學組成元件(例如繞射光學組成元件)131,設於基板132上。類似於前一實施例,光磚係隨機排列。The structured light projector 200 of the present embodiment can include a diffractive optical element (DOE) 13 that receives patterned light (from the patterning device 14) and produces a plurality of light tiles. Light bricks are spaced apart from each other in two dimensions. As illustrated in FIG. 5B, the diffractive optical element 13 of the present embodiment may include a plurality of optical constituent elements (eg, diffractive optical constituent elements) 131 disposed on the substrate 132. Similar to the previous embodiment, the light bricks are randomly arranged.

第六圖顯示本發明第二實施例的變化型之結構光投影機300的方塊圖。本實施例類似於第五A圖的實施例,不同的地方在於,本實施例之繞射光學元件13係位於圖案化裝置14之前。因此,繞射光學元件13接收(來自光束限制裝置12的)準直光,並產生複數(不具圖案的)光磚。接下來,圖案化裝置14接收(來自繞射光學元件13的)光磚,並產生圖案光磚。Figure 6 is a block diagram showing a modified structured light projector 300 of a second embodiment of the present invention. This embodiment is similar to the embodiment of FIG. A, except that the diffractive optical element 13 of the present embodiment is located before the patterning device 14. Thus, the diffractive optical element 13 receives collimated light (from the beam limiting device 12) and produces a plurality of (non-patterned) light tiles. Next, the patterning device 14 receives the light tiles (from the diffractive optical element 13) and produces patterned light tiles.

第七A圖顯示本發明第三實施例之結構光投影機400的方塊圖,且第七B圖例示第七A圖之結構光投影機400的示意圖。7A is a block diagram showing a structured light projector 400 of a third embodiment of the present invention, and FIG. 7B is a schematic view showing a structured light projector 400 of FIG.

在本實施例中,結構光投影機400可包含光源11,其產生具預設圖案的發射光。發射光可以為可見光或/且不可見光(例如紅外線)。本實施例之光源11可包含半導體二極體陣列,根據預設圖案排列。在一較佳實施例中,光源11可包含垂直腔面射型雷射(vertical-cavity surface-emitting laser, VCSEL)二極體陣列,設於基板(未顯示)上,並根據預設圖案排列。藉此,垂直腔面射型雷射(VCSEL)二極體作為光源11,同時執行光發射與圖案化。In the present embodiment, the structured light projector 400 can include a light source 11 that produces emitted light having a predetermined pattern. The emitted light can be visible or/and invisible (eg, infrared). The light source 11 of this embodiment may comprise a semiconductor diode array arranged according to a predetermined pattern. In a preferred embodiment, the light source 11 can include a vertical-cavity surface-emitting laser (VCSEL) diode array disposed on a substrate (not shown) and arranged according to a predetermined pattern. . Thereby, a vertical cavity surface-emitting laser (VCSEL) diode is used as the light source 11, and light emission and patterning are simultaneously performed.

本實施例之結構光投影機400可包含繞射光學元件(DOE)13,其接收(來自光源11的)發射光,並產生複數光磚(light tile)。光磚以二維方式互相間隔。如第七B圖所例示,本實施例之繞射光學元件13可包含複數光學組成元件(例如繞射光學組成元件)131,設於基板132上。光學組成元件131可設在相反於光源11的一側(例如右側)。繞射光學元件13可包含透明材質,例如塑膠或玻璃。相較於第一A圖所示的實施例,由於本實施例於光源11與繞射光學元件13之間未包含有光束限制裝置12,因此本實施例之結構光投影機400可以較第一A圖之結構光投影機100更為小型化。The structured light projector 400 of the present embodiment can include a diffractive optical element (DOE) 13 that receives (from the source 11) emitted light and produces a plurality of light tiles. Light bricks are spaced apart from each other in two dimensions. As illustrated in FIG. 7B, the diffractive optical element 13 of the present embodiment may include a plurality of optical constituent elements (eg, diffractive optical constituent elements) 131 disposed on the substrate 132. The optical constituent element 131 may be disposed on a side opposite to the light source 11 (for example, the right side). The diffractive optical element 13 can comprise a transparent material such as plastic or glass. Compared with the embodiment shown in FIG. A, since the present embodiment does not include the beam limiting device 12 between the light source 11 and the diffractive optical element 13, the structured light projector 400 of the present embodiment can be the first The structured light projector 100 of Fig. A is further miniaturized.

第八A圖例示第七A圖之繞射光學元件13所產生的光磚的中心係隨機(或非週期性)排列。第八B圖顯示第八A圖之隨機排列的光磚,其部分重疊。Figure 8A illustrates a random (or non-periodic) arrangement of the centers of the tiles produced by the diffractive optical element 13 of Figure A. Figure 8B shows the randomly arranged light bricks of Figure 8A, partially overlapping.

第九A圖例示第七A圖之繞射光學元件13所產生的光磚的中心係規律(或週期性)排列。第九B圖顯示第九A圖具規律(或扇出(fan-out))排列的光磚,其部分重疊。值得注意的是,第九B圖之重疊光磚的光點密度較第八B圖之重疊光磚的光點密度來得一致(uniform),且具有較高的對比度(contrast ratio)。然而,第八B圖之重疊光磚則具有較高的效率,因為有較多光點位於感興趣區域(region of interest, ROI)。The ninth A diagram illustrates the centerline regular (or periodic) arrangement of the light bricks produced by the diffractive optical element 13 of Figure A. Figure IXB shows a ninth A-patterned (or fan-out) arrangement of light bricks that partially overlap. It is worth noting that the spot density of the overlapping tiles of Figure IX is consistent with the spot density of the overlapping tiles of Figure 8B, and has a higher contrast ratio. However, the overlapping tiles of Figure 8B have higher efficiency because there are more spots located in the region of interest (ROI).

以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之申請專利範圍;凡其它未脫離發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之申請專利範圍內。The above description is only the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention; all other equivalent changes or modifications which are not departing from the spirit of the invention should be included in the following Within the scope of the patent application.

100‧‧‧結構光投影機100‧‧‧structured light projector

200‧‧‧結構光投影機200‧‧‧structured light projector

300‧‧‧結構光投影機300‧‧‧structured light projector

400‧‧‧結構光投影機400‧‧‧structured light projector

11‧‧‧光源11‧‧‧Light source

12‧‧‧光束限制裝置12‧‧‧ Beam Limiting Device

13‧‧‧繞射光學元件13‧‧‧Diffractive optical components

131‧‧‧光學組成元件131‧‧‧Optical components

132‧‧‧基板132‧‧‧Substrate

14‧‧‧圖案化裝置14‧‧‧Drawing device

31‧‧‧晶片31‧‧‧ wafer

32‧‧‧基底32‧‧‧Base

33‧‧‧準直透鏡33‧‧‧ Collimating lens

34‧‧‧第一間隔物34‧‧‧First spacer

35‧‧‧第二間隔物35‧‧‧Second spacer

DOE‧‧‧繞射光學元件DOE‧‧‧Diffractive optical components

f‧‧‧焦距F‧‧•focal length

第一A圖顯示本發明第一實施例之結構光投影機的方塊圖。 第一B圖例示第一A圖之結構光投影機的示意圖。 第二A圖顯示光源的部分半導體二極體,分為相鄰二群而依序點亮。 第二B圖顯示光源的部分半導體二極體,分為交叉的二群而依序點亮。 第二C圖顯示光源的部分半導體二極體,依形狀分為交叉的二群而依序點亮。 第三A圖與第三B圖例示光磚的中心為週期性排列。 第三C圖與第三D圖例示本發明實施例當中第一B圖之繞射光學元件所產生的光磚的中心,其隨機或非週期性排列。 第三E圖例示於邊緣排列有較多的光磚。 第三F圖例示針對光磚的排列進行校正。 第四圖例示本發明實施例之結構光投影機的剖面圖。 第五A圖顯示本發明第二實施例之結構光投影機的方塊圖。 第五B圖例示第五A圖之結構光投影機的示意圖。 第六圖顯示本發明第二實施例的變化型之結構光投影機的方塊圖。 第七A圖顯示本發明第三實施例之結構光投影機的方塊圖。 第七B圖例示第七A圖之結構光投影機的示意圖。 第八A圖例示第七A圖之繞射光學元件所產生的光磚的中心係隨機(或非週期性)排列。 第八B圖顯示第八A圖之隨機排列的光磚,其部分重疊。 第九A圖例示第七A圖之繞射光學元件所產生的光磚的中心係規律排列。 第九B圖顯示第九A圖具規律排列的光磚,其部分重疊。Figure 1A is a block diagram showing the structured light projector of the first embodiment of the present invention. The first B diagram illustrates a schematic diagram of the structured light projector of the first A diagram. The second A picture shows a part of the semiconductor diode of the light source, which is divided into adjacent groups and sequentially lights up. The second B-picture shows a portion of the semiconductor diode of the light source, which is divided into two groups that are crossed and sequentially illuminated. The second C-picture shows a part of the semiconductor diode of the light source, which is divided into two groups according to the shape and sequentially lights up. The third A diagram and the third B diagram illustrate that the centers of the light bricks are periodically arranged. The third C diagram and the third D diagram illustrate the center of the light bricks produced by the diffractive optical elements of the first B diagram of the embodiment of the present invention, which are randomly or non-periodically arranged. The third E diagram illustrates that a plurality of light bricks are arranged at the edges. The third F diagram illustrates the correction for the arrangement of the light bricks. The fourth figure illustrates a cross-sectional view of a structured light projector in accordance with an embodiment of the present invention. Figure 5A is a block diagram showing a structured light projector of a second embodiment of the present invention. FIG. 5B is a schematic view showing a structured light projector of FIG. Figure 6 is a block diagram showing a modified structured light projector of a second embodiment of the present invention. Figure 7A is a block diagram showing a structured light projector of a third embodiment of the present invention. Figure 7B illustrates a schematic diagram of a structured light projector of Figure AA. Figure 8A illustrates a random (or non-periodic) arrangement of the centers of the tiles produced by the diffractive optical elements of Figure A. Figure 8B shows the randomly arranged light bricks of Figure 8A, partially overlapping. The ninth A diagram illustrates the central arrangement of the light bricks produced by the diffractive optical elements of the seventh embodiment. Figure IXB shows a light brick of the ninth A pattern with regular arrangement, which partially overlaps.

Claims (20)

一種結構光投影機,包含: 一繞射光學元件,接收準直光並產生複數光磚,該繞射光學元件包含複數光學組成元件,設於一基板上; 其中該光磚隨機排列。A structured light projector comprising: a diffractive optical element that receives collimated light and produces a plurality of light bricks, the diffractive optical element comprising a plurality of optical component elements disposed on a substrate; wherein the light bricks are randomly arranged. 根據申請專利範圍第1項所述之結構光投影機,其中該光磚沿至少一方向為非週期性或非相關。The structured light projector of claim 1, wherein the light brick is non-periodic or non-correlated in at least one direction. 根據申請專利範圍第1項所述之結構光投影機,其中該繞射光學元件所產生的相鄰光磚部分重疊。The structured light projector of claim 1, wherein adjacent light bricks produced by the diffractive optical element partially overlap. 一種結構光投影機,包含: 一光源,產生具預設圖案的發射光; 一光束限制裝置,接收該發射光並產生準直光;及 一繞射光學元件,接收該準直光並產生複數光磚,其隨機排列。A structured light projector comprising: a light source for generating emitted light having a predetermined pattern; a beam limiting device for receiving the emitted light and generating collimated light; and a diffractive optical element for receiving the collimated light and generating a plurality of Light bricks, which are randomly arranged. 根據申請專利範圍第4項所述之結構光投影機,其中該光源包含半導體二極體陣列,根據該預設圖案排列。The structured light projector of claim 4, wherein the light source comprises a semiconductor diode array, arranged according to the predetermined pattern. 根據申請專利範圍第5項所述之結構光投影機,其中該半導體二極體分為複數群並依序點亮。The structured light projector of claim 5, wherein the semiconductor diode is divided into a plurality of groups and sequentially illuminated. 根據申請專利範圍第6項所述之結構光投影機,其中不同群的半導體二極體具不同形狀或大小。A structured light projector according to claim 6 wherein the different groups of semiconductor diodes have different shapes or sizes. 根據申請專利範圍第4項所述之結構光投影機,其中該繞射光學元件所產生的相鄰光磚部分重疊。The structured light projector of claim 4, wherein the adjacent light bricks produced by the diffractive optical element partially overlap. 一種結構光投影機,包含: 一點光源,產生發射光; 一光束限制裝置,接收該發射光並產生準直光; 一圖案化裝置,接收該準直光並產生圖案光;及 一繞射光學元件,接收該圖案光並產生複數光磚,其隨機排列。A structured light projector comprising: a point source for generating emitted light; a beam limiting device for receiving the emitted light and generating collimated light; a patterning device for receiving the collimated light and generating patterned light; and a diffractive optical The component receives the pattern light and generates a plurality of light bricks that are randomly arranged. 根據申請專利範圍第9項所述之結構光投影機,其中該點光源包含邊射型雷射二極體。The structured light projector of claim 9, wherein the point source comprises a side-emitting laser diode. 根據申請專利範圍第9項所述之結構光投影機,其中該繞射光學元件所產生的相鄰光磚部分重疊。The structured light projector of claim 9, wherein the adjacent light bricks produced by the diffractive optical element partially overlap. 一種結構光投影機,包含: 一點光源,產生發射光; 一光束限制裝置,接收該發射光並產生準直光; 一繞射光學元件,接收該準直光並產生複數光磚,其隨機排列;及 一圖案化裝置,接收該些光磚並產生複數圖案光磚。A structured light projector comprising: a light source to generate emitted light; a beam limiting device to receive the emitted light and generate collimated light; a diffractive optical element that receives the collimated light and generates a plurality of light bricks, which are randomly arranged And a patterning device that receives the light bricks and produces a plurality of patterned light bricks. 根據申請專利範圍第12項所述之結構光投影機,其中所產生的相鄰圖案光磚部分重疊。The structured light projector of claim 12, wherein the adjacent pattern tiles produced are partially overlapped. 一種結構光投影機,包含: 一光源,產生具預設圖案的發射光;及 一繞射光學元件,接收該發射光並產生複數光磚,其隨機排列。A structured light projector comprising: a light source to generate emitted light having a predetermined pattern; and a diffractive optical element that receives the emitted light and generates a plurality of light bricks that are randomly arranged. 根據申請專利範圍第14項所述之結構光投影機,其中該光源包含半導體二極體陣列,根據該預設圖案排列。The structured light projector of claim 14, wherein the light source comprises a semiconductor diode array, arranged according to the predetermined pattern. 根據申請專利範圍第14項所述之結構光投影機,其中該繞射光學元件所產生的相鄰光磚部分重疊。The structured light projector of claim 14, wherein the adjacent light bricks produced by the diffractive optical element partially overlap. 一種結構光投影機,包含: 一光源,產生具預設圖案的發射光;及 一繞射光學元件,接收該發射光並產生複數光磚,其規律排列。A structured light projector comprising: a light source to generate emitted light having a predetermined pattern; and a diffractive optical element that receives the emitted light and generates a plurality of light bricks that are regularly arranged. 根據申請專利範圍第17項所述之結構光投影機,其中該光源包含半導體二極體陣列,根據該預設圖案排列。The structured light projector of claim 17, wherein the light source comprises a semiconductor diode array, arranged according to the predetermined pattern. 根據申請專利範圍第18項所述之結構光投影機,其中該半導體二極體包含垂直腔面射型雷射二極體。The structured light projector of claim 18, wherein the semiconductor diode comprises a vertical cavity surface-emitting laser diode. 根據申請專利範圍第17項所述之結構光投影機,其中該繞射光學元件所產生的相鄰光磚部分重疊。The structured light projector of claim 17, wherein the adjacent light bricks produced by the diffractive optical element partially overlap.
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