TWI730243B - Structured-light projector - Google Patents
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Abstract
Description
本發明係有關一種投影機,特別是關於一種結構光(structured-light)投影機。The present invention relates to a projector, in particular to a structured-light projector.
小型或微型光學投影機可適用於各種應用,例如投射結構光圖案於物件上,進行三維或深度映射(mapping)。於三維映射系統中,使用影像擷取裝置(例如相機)以擷取投射於物件的影像圖案。擷取影像經處理後,可建構物件的三維圖。Small or micro optical projectors can be applied to various applications, such as projecting structured light patterns on objects for three-dimensional or depth mapping. In the three-dimensional mapping system, an image capturing device (such as a camera) is used to capture the image pattern projected on the object. After the captured image is processed, a three-dimensional image of the object can be constructed.
傳統投影機因為低解碼率(decode rate)而造成不良的效能。此外,即使光學製造的進步使得光學系統小型化的成本降低,然而傳統投影機對於體積或/且成本仍有相當的改善空間。Traditional projectors have poor performance due to low decode rate. In addition, even if the advancement of optical manufacturing reduces the cost of miniaturization of the optical system, there is still considerable room for improvement in volume and/and cost of conventional projectors.
鑑於傳統投影機的效能不佳、體積龐大或價格昂貴,因此亟需提出一種新穎的結構光投影機,使得效能得以有效增進或/且體積或成本可以降低。In view of the poor performance, bulkiness, or high price of traditional projectors, there is an urgent need to provide a novel structured light projector that can effectively improve performance or/and reduce volume or cost.
鑑於上述,本發明實施例的目的之一在於提出一種具增進效能或/且減少體積或成本的結構光投影機。In view of the foregoing, one of the objectives of the embodiments of the present invention is to provide a structured light projector with improved performance or/and reduced volume or cost.
根據本發明實施例,結構光投影機包含光源、光束限制裝置及繞射光學元件。光源產生具預設圖案的發射光。光束限制裝置接收發射光並產生準直光。繞射光學元件接收準直光並產生複數光磚,該繞射光學元件包含複數光學組成元件,其中該些光磚隨機排列。According to an embodiment of the present invention, a structured light projector includes a light source, a beam limiting device, and a diffractive optical element. The light source generates emitted light with a predetermined pattern. The beam limiting device receives the emitted light and generates collimated light. The diffractive optical element receives the collimated light and generates a plurality of light bricks. The diffractive optical element includes a plurality of optical components, and the light bricks are arranged randomly.
根據本發明另一實施例,結構光投影機包含點光源、光束限制裝置、圖案化裝置及繞射光學元件。點光源產生發射光。光束限制裝置接收發射光並產生準直光。圖案化裝置接收準直光並產生圖案光。繞射光學元件接收圖案光並產生複數光磚,該繞射光學元件包含複數光學組成元件,且該些光磚隨機排列。根據本發明又一實施例,繞射光學元件位於圖案化裝置之前。According to another embodiment of the present invention, a structured light projector includes a point light source, a beam limiting device, a patterning device, and a diffractive optical element. Point light sources produce emitted light. The beam limiting device receives the emitted light and generates collimated light. The patterning device receives the collimated light and generates patterned light. The diffractive optical element receives the pattern light and generates a plurality of light tiles. The diffractive optical element includes a plurality of optical components, and the light tiles are randomly arranged. According to another embodiment of the present invention, the diffractive optical element is located before the patterning device.
根據本發明又一實施例,結構光投影機包含光源及繞射光學元件。光源產生具預設圖案的發射光。繞射光學元件接收發射光並產生複數光磚,其隨機或規律排列。According to another embodiment of the present invention, a structured light projector includes a light source and a diffractive optical element. The light source generates emitted light with a predetermined pattern. The diffractive optical element receives the emitted light and generates a plurality of light bricks, which are arranged randomly or regularly.
第一A圖顯示本發明第一實施例之結構光投影機100的方塊圖,且第一B圖例示第一A圖之結構光投影機100的示意圖。結構光投影機100較佳為一種小型光學投影機,適用以投射結構光圖案於物件上,以進行三維映射。FIG. 1A shows a block diagram of the
在本實施例中,結構光投影機100可包含光源11,其產生具預設圖案的發射光。發射光可以為可見光或/且不可見光(例如紅外線)。本實施例之光源11可包含半導體二極體陣列,根據預設圖案排列。在一較佳實施例中,光源11可包含垂直腔面射型雷射(vertical-cavity surface-emitting laser, VCSEL)二極體陣列,設於基板(未顯示)上,並根據預設圖案排列。藉此,垂直腔面射型雷射(VCSEL)二極體作為光源11,同時執行光發射與圖案化。垂直腔面射型雷射(VCSEL)二極體可用以製造小型且高密度光源。In this embodiment, the
在一實施例中,光源11的半導體二極體可依序點亮,因而得以於近區域達到功耗降低、解碼率增強或/且效能改善。第二A圖顯示光源11的部分半導體二極體,分為相鄰二群而依序點亮。第二B圖顯示光源11的部分半導體二極體,分為交叉的二群而依序點亮。光源11的半導體二極體的形狀與大小可彼此相異。第二C圖顯示光源11的部分半導體二極體,依形狀分為交叉的二群而依序點亮。In one embodiment, the semiconductor diodes of the
本實施例之結構光投影機100可包含光束限制(beam limiting)裝置12,其接收(來自光源11的)發射光並限縮發射光的截面,因而形成準直(collimated)光。在一較佳實施例中,光束限制裝置12可包含準直透鏡,其可包含透明材質(例如塑膠或玻璃),且可使用晶圓級光學(WLO)技術製造。如第一B圖所例示(但不限定於此),準直透鏡(亦即光束限制裝置12)於面向光源11的一側(例如左側)為平面,而於另一側(例如右側)為凸面。雖然第一B圖所例示的光束限制裝置12包含單一透鏡,然而也可使用複數個透鏡或複數組透鏡以建構光束限制裝置12。The structured
本實施例之結構光投影機100可包含繞射光學元件(diffractive optical element, DOE)13,其接收(來自光束限制裝置12的)準直光,並產生複數光磚(light tile)。光磚以二維方式互相間隔。如第一B圖所例示,本實施例之繞射光學元件13可包含複數光學組成元件(例如繞射光學組成元件)131,設於基板132上。光學組成元件131可設在相反於光束限制裝置12的一側(例如右側)。繞射光學元件13可包含透明材質,例如塑膠或玻璃。The
根據本實施例的特徵之一,所產生的光磚係隨機排列。在本說明書中,“隨機”一詞係指光磚沿至少一方向(例如水平方向)為非週期性或非相關(uncorrelated)。換句話說,光磚沿特定方向(例如水平方向或X方向)不具有或重複任何樣式。藉此,繞射光學元件(DOE)13所產生的相鄰光磚可部分重疊。According to one of the features of this embodiment, the generated light tiles are randomly arranged. In this specification, the term "random" means that the light tiles are aperiodic or uncorrelated in at least one direction (for example, the horizontal direction). In other words, the light tiles do not have or repeat any pattern along a specific direction (for example, the horizontal direction or the X direction). In this way, adjacent light tiles generated by the diffractive optical element (DOE) 13 can partially overlap.
第三A圖例示光磚的中心為週期性排列,每一列間距相同且垂直互相對準。第三B圖例示光磚的中心為週期性排列,每一列間距相同但垂直互相交錯。第三C圖例示本發明實施例當中第一B圖之繞射光學元件(DOE)13所產生的光磚的中心,其隨機或非週期性排列。一般來說,光磚係從週期性排列位置沿至少一方向作隨機些微的移動。在一實施例中,光磚的移動範圍需小於預設範圍,使得遠區域物件的投射影像的光點密度可維持高於預設臨界值。第三D圖顯示每一光磚於相應邊界130當中隨機移動,其中每一邊界130的中心係位於週期性排列的未移動位置。值得注意的是,邊界130彼此不重疊。換句話說,相鄰邊界130之間需存在具預設值的間隙。The third diagram A illustrates that the centers of the light tiles are periodically arranged, and each column has the same spacing and is vertically aligned with each other. The third figure B illustrates that the centers of the light tiles are periodically arranged, and each column has the same spacing but is vertically interlaced with each other. The third diagram C illustrates the centers of the light bricks generated by the diffractive optical element (DOE) 13 of the first diagram B in the embodiment of the present invention, which are arranged randomly or non-periodically. Generally speaking, the light tiles move slightly and randomly along at least one direction from the periodically arranged position. In one embodiment, the moving range of the light brick needs to be smaller than the preset range, so that the light spot density of the projected image of the object in the far area can be maintained higher than the preset threshold. The third diagram D shows that each light tile moves randomly among the
對於具週期排列之光磚的投影機,其效能(特別是解碼率)很差,主要係因為其具有高度重複圖案,因而增加圖案匹配的困難。相反地,在本實施例中,結構光投影機100的光磚係隨機排列,因而克服週期排列之光磚之投影機的缺失,因而得以大量地增進解碼率與效能。The performance (especially the decoding rate) of the projector with periodically arranged light tiles is very poor, mainly because it has a highly repetitive pattern, which increases the difficulty of pattern matching. On the contrary, in this embodiment, the light bricks of the
再者,根據光學理論,如果降低第一B圖所例示準直透鏡(亦即光束限制裝置12)的焦距f,則投射於遠區域物件的光源11的預設圖案,其放大率將跟著提高。值得注意的是,放大率的提高並不會影響本實施例之解碼率效能。因此,結構光投影機100的整體體積得以降低,因此可以小型化投影機。再者,由於光磚係隨機排列,光源11的垂直腔面射型雷射(VCSEL)二極體的數目可以減少而不會影響遠區域物件的投射影像的光點密度。因此,結構光投影機100的整體成本得以降低,使得投影機的價格更便宜。Furthermore, according to optical theory, if the focal length f of the collimating lens (that is, the beam limiting device 12) illustrated in the first figure B is reduced, the preset pattern of the
在一實施例中,邊緣的光磚的密度高於其他區域。因此,遠區域物件的投射影像之邊緣的光點密度可大致相同於其他區域,不會受到非近軸失真(non-paraxial distortion)的影響,因而增強三維映射。第三E圖例示於邊緣排列有較多的光磚。In one embodiment, the density of the light tiles at the edges is higher than in other areas. Therefore, the light spot density at the edge of the projected image of the object in the far area can be roughly the same as that in other areas, and will not be affected by non-paraxial distortion, thereby enhancing the three-dimensional mapping. The third diagram E illustrates that more light tiles are arranged on the edge.
在另一實施例中,針對光磚的排列進行校正,用以補償遠區域物件的投射影像於邊緣處所產生的光學失真(optical distortion)。第三F圖例示針對光磚的排列進行校正。In another embodiment, the alignment of the light tiles is corrected to compensate for the optical distortion generated at the edge of the projected image of the object in the far area. The third F diagram illustrates correction for the arrangement of light tiles.
第四圖例示本發明實施例之結構光投影機100的剖面圖。在本實施例中,結構光投影機100可包含晶片31(作為光源11),其包含有垂直腔面射型雷射(VCSEL)二極體。晶片31設置於基底32上。結構光投影機100可包含準直透鏡33(作為光束限制裝置12),其藉由第一間隔物34與晶片31、基底32相隔離。結構光投影機100可包含繞射光學元件13,其藉由第二間隔物35與準直透鏡33相隔離。藉此,準直透鏡33位於晶片31與繞射光學元件13之間。The fourth figure illustrates a cross-sectional view of the structured
第五A圖顯示本發明第二實施例之結構光投影機200的方塊圖,且第五B圖例示第五A圖之結構光投影機200的示意圖,與前一實施例相同的技術細節予以省略。Fig. 5A shows a block diagram of the structured
在本實施例中,結構光投影機200可包含光源11,特別是點光源,以產生發射光。本實施例之光源11可包含單一半導體二極體。在一較佳實施例中,光源11可包含邊射型雷射(edge-emitting laser)二極體。In this embodiment, the structured
本實施例之結構光投影機200可包含光束限制(beam limiting)裝置12,其接收(來自光源11的)發射光並限縮發射光的截面,因而形成準直(collimated)光。在一較佳實施例中,光束限制裝置12可包含準直透鏡,其可包含透明材質(例如塑膠或玻璃),且可使用晶圓級光學(WLO)技術製造。The structured
本實施例之結構光投影機200可包含圖案化裝置(patterning device)14,其接收(來自光束限制裝置12的)準直光,並產生圖案光。在一實施例中,圖案化裝置14可包含繞射光學元件,或其他適當光學元件用以產生具預設圖案的圖案光。The structured
本實施例之結構光投影機200可包含繞射光學元件(DOE)13,其接收(來自圖案化裝置14的)圖案光,並產生複數光磚(light tile)。光磚以二維方式互相間隔。如第五B圖所例示,本實施例之繞射光學元件13可包含複數光學組成元件(例如繞射光學組成元件)131,設於基板132上。類似於前一實施例,光磚係隨機排列。The structured
第六圖顯示本發明第二實施例的變化型之結構光投影機300的方塊圖。本實施例類似於第五A圖的實施例,不同的地方在於,本實施例之繞射光學元件13係位於圖案化裝置14之前。因此,繞射光學元件13接收(來自光束限制裝置12的)準直光,並產生複數(不具圖案的)光磚。接下來,圖案化裝置14接收(來自繞射光學元件13的)光磚,並產生圖案光磚。The sixth figure shows a block diagram of a modified structured
第七A圖顯示本發明第三實施例之結構光投影機400的方塊圖,且第七B圖例示第七A圖之結構光投影機400的示意圖。FIG. 7A shows a block diagram of the structured
在本實施例中,結構光投影機400可包含光源11,其產生具預設圖案的發射光。發射光可以為可見光或/且不可見光(例如紅外線)。本實施例之光源11可包含半導體二極體陣列,根據預設圖案排列。在一較佳實施例中,光源11可包含垂直腔面射型雷射(vertical-cavity surface-emitting laser, VCSEL)二極體陣列,設於基板(未顯示)上,並根據預設圖案排列。藉此,垂直腔面射型雷射(VCSEL)二極體作為光源11,同時執行光發射與圖案化。In this embodiment, the structured
本實施例之結構光投影機400可包含繞射光學元件(DOE)13,其接收(來自光源11的)發射光,並產生複數光磚(light tile)。光磚以二維方式互相間隔。如第七B圖所例示,本實施例之繞射光學元件13可包含複數光學組成元件(例如繞射光學組成元件)131,設於基板132上。光學組成元件131可設在相反於光源11的一側(例如右側)。繞射光學元件13可包含透明材質,例如塑膠或玻璃。相較於第一A圖所示的實施例,由於本實施例於光源11與繞射光學元件13之間未包含有光束限制裝置12,因此本實施例之結構光投影機400可以較第一A圖之結構光投影機100更為小型化。The structured
第八A圖例示第七A圖之繞射光學元件13所產生的光磚的中心係隨機(或非週期性)排列。第八B圖顯示第八A圖之隨機排列的光磚,其部分重疊。Fig. 8A illustrates that the centers of the light bricks generated by the diffractive
第九A圖例示第七A圖之繞射光學元件13所產生的光磚的中心係規律(或週期性)排列。第九B圖顯示第九A圖具規律(或扇出(fan-out))排列的光磚,其部分重疊。值得注意的是,第九B圖之重疊光磚的光點密度較第八B圖之重疊光磚的光點密度來得一致(uniform),且具有較高的對比度(contrast ratio)。然而,第八B圖之重疊光磚則具有較高的效率,因為有較多光點位於感興趣區域(region of interest, ROI)。Fig. 9A illustrates the regular (or periodic) arrangement of the centers of the light bricks generated by the diffractive
以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之申請專利範圍;凡其它未脫離發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之申請專利範圍內。The above descriptions are only the preferred embodiments of the present invention, and are not intended to limit the scope of patent application of the present invention; all other equivalent changes or modifications made without departing from the spirit of the invention should be included in the following Within the scope of the patent application.
100‧‧‧結構光投影機200‧‧‧結構光投影機300‧‧‧結構光投影機400‧‧‧結構光投影機11‧‧‧光源12‧‧‧光束限制裝置13‧‧‧繞射光學元件131‧‧‧光學組成元件132‧‧‧基板14‧‧‧圖案化裝置31‧‧‧晶片32‧‧‧基底33‧‧‧準直透鏡34‧‧‧第一間隔物35‧‧‧第二間隔物DOE‧‧‧繞射光學元件f‧‧‧焦距100‧‧‧Structured
第一A圖顯示本發明第一實施例之結構光投影機的方塊圖。 第一B圖例示第一A圖之結構光投影機的示意圖。 第二A圖顯示光源的部分半導體二極體,分為相鄰二群而依序點亮。 第二B圖顯示光源的部分半導體二極體,分為交叉的二群而依序點亮。 第二C圖顯示光源的部分半導體二極體,依形狀分為交叉的二群而依序點亮。 第三A圖與第三B圖例示光磚的中心為週期性排列。 第三C圖與第三D圖例示本發明實施例當中第一B圖之繞射光學元件所產生的光磚的中心,其隨機或非週期性排列。 第三E圖例示於邊緣排列有較多的光磚。 第三F圖例示針對光磚的排列進行校正。 第四圖例示本發明實施例之結構光投影機的剖面圖。 第五A圖顯示本發明第二實施例之結構光投影機的方塊圖。 第五B圖例示第五A圖之結構光投影機的示意圖。 第六圖顯示本發明第二實施例的變化型之結構光投影機的方塊圖。 第七A圖顯示本發明第三實施例之結構光投影機的方塊圖。 第七B圖例示第七A圖之結構光投影機的示意圖。 第八A圖例示第七A圖之繞射光學元件所產生的光磚的中心係隨機(或非週期性)排列。 第八B圖顯示第八A圖之隨機排列的光磚,其部分重疊。 第九A圖例示第七A圖之繞射光學元件所產生的光磚的中心係規律排列。 第九B圖顯示第九A圖具規律排列的光磚,其部分重疊。Fig. 1A shows a block diagram of the structured light projector according to the first embodiment of the present invention. Fig. 1B illustrates a schematic diagram of the structured light projector of Fig. 1A. The second diagram A shows that part of the semiconductor diodes of the light source are divided into two adjacent groups and sequentially lit. The second figure B shows that part of the semiconductor diodes of the light source are divided into two intersecting groups and sequentially lit. The second figure C shows that part of the semiconductor diodes of the light source are divided into two crossed groups according to their shapes and are sequentially lit. The third diagrams A and B illustrate that the centers of the light bricks are periodically arranged. The third diagram C and the third diagram D illustrate the centers of the light bricks generated by the diffractive optical element of the first diagram B in the embodiment of the present invention, which are arranged randomly or non-periodically. The third diagram E illustrates that more light tiles are arranged on the edge. The third F diagram illustrates correction for the arrangement of light tiles. The fourth figure illustrates a cross-sectional view of the structured light projector according to the embodiment of the present invention. Fig. 5A shows a block diagram of the structured light projector according to the second embodiment of the present invention. Fig. 5B illustrates a schematic diagram of the structured light projector of Fig. 5A. The sixth figure shows a block diagram of a modified structured light projector of the second embodiment of the present invention. Figure 7A shows a block diagram of a structured light projector according to a third embodiment of the present invention. Figure 7B illustrates a schematic diagram of the structured light projector of Figure 7A. Fig. 8A illustrates that the centers of the light bricks generated by the diffractive optical element of Fig. 7A are arranged randomly (or non-periodically). The eighth image B shows the randomly arranged light tiles of the eighth image A, which partially overlap. Fig. 9A illustrates the regular arrangement of the centers of the light bricks generated by the diffractive optical element in Fig. 7A. The ninth picture B shows the ninth picture A with regularly arranged light tiles, which partially overlap.
100‧‧‧結構光投影機 100‧‧‧Structured light projector
11‧‧‧光源 11‧‧‧Light source
12‧‧‧光束限制裝置 12‧‧‧Beam limiting device
13‧‧‧繞射光學元件 13‧‧‧Diffraction optics
DOE‧‧‧繞射光學元件 DOE‧‧‧Diffraction optical element
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TW200424739A (en) * | 2003-01-08 | 2004-11-16 | Silicon Optix Inc | Image projection system and method |
US20170003122A1 (en) * | 2011-08-09 | 2017-01-05 | Apple Inc. | Projectors of structured light |
TW201706674A (en) * | 2015-08-07 | 2017-02-16 | 高準精密工業股份有限公司 | Lighting apparatus |
US20170115497A1 (en) * | 2015-10-21 | 2017-04-27 | Princeton Optronics, Inc. | Coded Pattern Projector |
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TW200424739A (en) * | 2003-01-08 | 2004-11-16 | Silicon Optix Inc | Image projection system and method |
US20170003122A1 (en) * | 2011-08-09 | 2017-01-05 | Apple Inc. | Projectors of structured light |
TW201706674A (en) * | 2015-08-07 | 2017-02-16 | 高準精密工業股份有限公司 | Lighting apparatus |
US20170115497A1 (en) * | 2015-10-21 | 2017-04-27 | Princeton Optronics, Inc. | Coded Pattern Projector |
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