TW201913875A - Supporting structure - Google Patents

Supporting structure Download PDF

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Publication number
TW201913875A
TW201913875A TW107130613A TW107130613A TW201913875A TW 201913875 A TW201913875 A TW 201913875A TW 107130613 A TW107130613 A TW 107130613A TW 107130613 A TW107130613 A TW 107130613A TW 201913875 A TW201913875 A TW 201913875A
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Taiwan
Prior art keywords
outer casing
coupling
assembly
support structure
guide
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TW107130613A
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Chinese (zh)
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TWI794280B (en
Inventor
禹覽
金起範
金希庭
裵鐘太
李佶帝
河閏圭
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南韓商周星工程股份有限公司
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Publication of TWI794280B publication Critical patent/TWI794280B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Snaps, Bayonet Connections, Set Pins, And Snap Rings (AREA)
  • Connection Of Plates (AREA)

Abstract

Disclosed is a supporting structure including a housing having a hollow formed in a length direction thereof so that a substrate support pin is inserted into the hollow, a plurality of guide members provided at each of an upper portion and a lower portion of the housing in a circumferential direction, and guiding movement of the substrate support pin in a length direction of the housing by rolling contact with the substrate support pin, and coupling members coupled to an outer circumferential surface of the housing, provided to surround the guide members, and applying pressure to the guide members in a radial direction of the housing so as to couple the guide members to the housing.

Description

支撐結構supporting structure

本發明係關於一種支撐結構,可相對基板接收部有效地移動基本支撐銷,減少移動基板支撐銷時基板支撐銷產生的摩擦力,以及方便地克服熱變形。The present invention relates to a support structure that can effectively move a basic support pin with respect to a substrate receiving portion, reduce friction generated by the substrate support pin when moving the substrate support pin, and conveniently overcome thermal deformation.

以下將要描述的內容係簡單地用於提供實施例之背景資訊,並非構成現有技術。The contents to be described below are simply used to provide background information of the embodiments, and do not constitute prior art.

基板接收部上接收待處理的物件例如基板,基板接收部被提供於腔室內,於腔室中進行基板之蝕刻與基板上之沈積。The substrate receiving portion receives an object to be processed, such as a substrate, and the substrate receiving portion is provided in the chamber, and etching of the substrate and deposition on the substrate are performed in the chamber.

基板支撐銷係為升高基板接收部上接收的基板,或者支撐機器臂所傳送的基板,相對基板接收部垂直地移動基板以及將基板放置於基板接收部上的裝置,這樣可在腔室內於基板接收部與機器臂之間傳輸基板。The substrate supporting pin is a device for raising the substrate received on the substrate receiving portion, or supporting the substrate conveyed by the robot arm, moving the substrate perpendicularly to the substrate receiving portion, and placing the substrate on the substrate receiving portion, so that the substrate can be placed in the chamber A substrate is transferred between the substrate receiving portion and the robot arm.

提供基板支撐銷以將其插入穿透基板接收部形成的通孔內,以及相對基板接收部垂直地移動基板支撐銷。因此,基板支撐銷與通孔之內壁產生摩擦。A substrate support pin is provided to be inserted into the through hole formed through the substrate receiving portion, and the substrate support pin is vertically moved with respect to the substrate receiving portion. Therefore, the substrate supporting pin and the inner wall of the through hole are rubbed.

由於基板支撐銷與通孔之內壁間的這種摩擦,導致基板支撐銷被磨損或損壞,從而導致損壞基板支撐銷所支持的基板以及造成有缺陷的產品。Such friction between the substrate support pins and the inner walls of the through holes causes the substrate support pins to be worn or damaged, thereby causing damage to the substrates supported by the substrate support pins and causing defective products.

本發明之目的在於提供一種支撐結構,可相對基板接收部有效地移動基本支撐銷,減少移動基板支撐銷時基板支撐銷產生的摩擦力,以及方便地克服熱變形。It is an object of the present invention to provide a support structure that can effectively move a basic support pin with respect to a substrate receiving portion, reduce friction generated by the substrate support pin when moving the substrate support pin, and conveniently overcome thermal deformation.

本發明其他的優點、目的和特徵將在如下的說明書中部分地加以闡述,並且本發明其他的優點、目的和特徵對於本領域的普通技術人員來說,可以透過本發明如下的說明得以部分地理解或者可以從本發明的實踐中得出。本發明的目的和其它優點可以透過本發明所記載的說明書和申請專利範圍中特別指明的結構並結合圖式部份,得以實現和獲得。Other advantages, objects, and features of the invention will be set forth in part in the description which follows, It is understood or can be derived from the practice of the invention. The objectives and other advantages of the invention will be realized and attained by the <RTIgt;

為了獲得本發明的這些目的和其他特徵,現對本發明作具體化和概括性的描述,本發明之一種支撐結構包含外殼、複數個引導組件以及複數個耦合組件。外殼具有沿其長度方向形成的空心,這樣基板支撐銷被插入空心內。複數個引導組件沿周邊方向被提供於外殼之上部與下部之每一處,以及透過與基板支撐銷之滾動接觸而引導基板支撐銷沿外殼之長度方向移動。複數個耦合組件耦合於外殼之外部周邊表面,被提供以圍繞這些引導組件,以及沿外殼之徑向施加壓力至這些引導組件,從而將這些引導組件耦合至外殼。In order to achieve these and other features of the present invention, the present invention is embodied and broadly described. A support structure of the present invention includes a housing, a plurality of guiding assemblies, and a plurality of coupling assemblies. The outer casing has a hollow formed along its length such that the substrate support pin is inserted into the hollow. A plurality of guiding members are provided in each of the upper and lower portions of the outer casing in a peripheral direction, and guide the substrate supporting pins to move along the length of the outer casing by rolling contact with the substrate supporting pins. A plurality of coupling assemblies are coupled to the outer peripheral surface of the outer casing, are provided to surround the guide assemblies, and apply pressure to the guide assemblies in the radial direction of the outer casing to couple the guide assemblies to the outer casing.

這些耦合組件形成為環狀,以及透過緊配或形狀配合耦合於外殼。These coupling components are formed in a ring shape and are coupled to the outer casing by a tight fit or a positive fit.

這些耦合組件由鋁形成。These coupling components are formed from aluminum.

沿外殼之長度方向提供這些引導組件。These guide assemblies are provided along the length of the housing.

這些引導組件被放置於外殼之上端與下端的每一處。These guide assemblies are placed at each of the upper and lower ends of the housing.

外殼包含主體以及複數個耦合槽部。這些耦合槽部形成於主體之上端與下端處,從而沿外殼之長度方向延伸,以及這些耦合槽部之外徑小於主體之外徑,以及這些耦合組件耦合於這些耦合槽部。The outer casing includes a main body and a plurality of coupling groove portions. The coupling groove portions are formed at the upper end and the lower end of the body so as to extend along the length of the outer casing, and the outer diameters of the coupling groove portions are smaller than the outer diameter of the main body, and the coupling members are coupled to the coupling groove portions.

這些引導組件包含四個引導組件,沿外殼之周邊方向呈輻射狀放置於這些耦合槽部之每一個中。These guide assemblies include four guide assemblies that are radially placed in each of the coupling slots along the peripheral direction of the housing.

這些引導組件沿外殼之長度方向被放置為兩列。These guide assemblies are placed in two columns along the length of the housing.

這些耦合槽部具有形成於外殼之徑向且與空心連通之複數個通孔,這些引導組件被放置於這些通孔中。The coupling groove portions have a plurality of through holes formed in a radial direction of the outer casing and communicating with the hollow, and the guide members are placed in the through holes.

引導組件的每一個包含接收部,包含具有一個開口側之接收凹部,被接收於接收凹部中的第一球體,第一球體之一部分被暴露於外部以及與基板支撐銷滾動接觸,以及複數個第二球體,被接收於接收凹部中,以及與接收凹部之內壁及第一球體滾動接觸。Each of the guiding assemblies includes a receiving portion including a receiving recess having an open side received by the first ball in the receiving recess, a portion of the first ball being exposed to the outside and rolling contact with the substrate support pin, and a plurality of The two spheres are received in the receiving recess and are in rolling contact with the inner wall of the receiving recess and the first sphere.

接收部包含從其與耦合組件相對的一部分突出的複數個鉤體,以及耦合組件包含複數個凹陷的凹部,具有與鉤體對應的形狀且形成於與這些鉤體相對的部分處。The receiving portion includes a plurality of hook bodies projecting from a portion thereof opposite to the coupling assembly, and the coupling member includes a plurality of recessed recesses having a shape corresponding to the hook body and formed at a portion opposite to the hook bodies.

鉤體之上端形成為傾斜面,以及鉤體之下端形成為階梯面。The upper end of the hook body is formed as an inclined surface, and the lower end of the hook body is formed as a stepped surface.

一個實施例之支撐結構使用具有被施加至引導組件之優良壓力之環狀耦合組件,將引導組件耦合至外殼,即使出現熱變形,由此有效地抑制引導組件、外殼與支撐結構之整體之變形或損壞。The support structure of one embodiment uses an annular coupling assembly having excellent pressure applied to the guiding assembly to couple the guiding assembly to the outer casing even if thermal deformation occurs, thereby effectively suppressing deformation of the guiding assembly, the outer casing and the supporting structure as a whole. Or damaged.

實施例中,無論腔室內部的溫度環境即高溫與低溫如何,耦合組件具有優良的彈性力,無論溫度如何變化,可保持引導組件與外殼0之穩定耦合狀態。In the embodiment, the coupling assembly has excellent elastic force regardless of the temperature environment inside the chamber, that is, high temperature and low temperature, and the stable coupling state of the guiding assembly and the outer casing 0 can be maintained regardless of the temperature change.

實施例中,引導組件未使用耦合單元比如螺栓被固定至外殼,但是環狀耦合組件用於施加壓力至引導組件從而耦合引導組件至外殼,從而避免由於耦合單元之熱變形導致支撐結構的變形或損壞,以及有效地將引導組件耦合至外殼。In an embodiment, the guiding assembly is not fixed to the outer casing using a coupling unit such as a bolt, but the annular coupling assembly is for applying pressure to the guiding assembly to couple the guiding assembly to the outer casing, thereby avoiding deformation of the supporting structure due to thermal deformation of the coupling unit or Damage, and effectively coupling the guiding assembly to the housing.

實施例中,耦合組件可透過鉤體上形成之階梯面穩定地耦合至外殼,由此引導組件可透過耦合組件施加之壓力穩定地耦合至外殼。In an embodiment, the coupling assembly is stably coupled to the outer casing through a stepped surface formed on the hook body, whereby the guiding assembly is stably coupled to the outer casing through the pressure exerted by the coupling assembly.

以下,將結合附圖與實施方式描述實施例。然而,可採用多種方式修正本文說明的實施例,以及應該理解的是,並非意圖將本揭露限制於所揭露的特定形式,而是相反地,實施例將覆蓋落入申請專利範圍所限定的本揭露之精神與範圍內的全部修正、等同與代替。Hereinafter, embodiments will be described with reference to the drawings and embodiments. However, the embodiments described herein may be modified in various ways, and it should be understood that the invention is not intended to be limited to the specific forms disclosed. All the amendments, equivalents and substitutions within the spirit and scope of the disclosure.

將要理解的是,雖然本文中術語「第一」、「第二」等用於描述各種元件,這些術語並非限制這些元件。這些術語僅僅用於區分一種物質或元件與其他物質或元件。另外,考慮到實施例之配置與功能而特別定義的術語僅僅用於描述實施例,而非限制本揭露之範圍。It will be understood that, although the terms "first," "second," and the like are used herein to describe various elements, these terms are not intended to limit the elements. These terms are only used to distinguish one substance or element from another substance or element. In addition, the terms that are specifically defined in consideration of the configuration and function of the embodiments are merely used to describe the embodiments, and do not limit the scope of the disclosure.

實施例之以下描述中,將要理解的是,當每一元件被稱為形成於另一元件「上方」或「下方」時,它可直接地位於另一元件「上方」或「下方」,或者間接地兩者之間形成有一或多個中間元件。另外,當一個元件被稱為形成於另一元件「上方」或「下方」時,不僅包含前述元件之向上方向,還包含前述元件之向下方向。In the following description of the embodiments, it is to be understood that, when each element is referred to as "above" or "below" One or more intermediate elements are formed between the two. In addition, when an element is referred to as being "above" or "below" another element, it does not include the upward direction of the above-mentioned elements, and the downward direction of the aforementioned elements.

此外,應該理解的是,關係術語比如「上方/之上/上部」、「下方/之下/下部」等,不要求也不暗示物質或元件之間的任何物理或邏輯關係或其順序,以及僅僅可用於區分一種物質或元件與其他物質或元件。In addition, it should be understood that relational terms such as "above/above/upper", "lower/lower/lower", etc., do not require or imply any physical or logical relationship or order between the elements or elements, and It can only be used to distinguish one substance or component from other substances or components.

圖1係為一個實施例之支撐結構之分解縱向剖面圖。實施例之支撐結構包含外殼(或者銷插入組件)100、引導組件(或者支撐組件)200以及耦合組件300。Figure 1 is an exploded longitudinal cross-sectional view of a support structure of one embodiment. The support structure of an embodiment comprises a housing (or pin insertion assembly) 100, a guiding assembly (or support assembly) 200, and a coupling assembly 300.

外殼100具有沿其縱向形成的空心110。基板支撐銷10被插入空心內,以及基板支撐銷10相對外殼100沿外殼100之長度方向往復(reciprocate)。The outer casing 100 has a hollow 110 formed along its longitudinal direction. The substrate support pin 10 is inserted into the hollow, and the substrate support pin 10 reciprocates with respect to the outer casing 100 along the length of the outer casing 100.

外殼100被插入穿透基板接收部(圖未示)形成的通孔內且與其固定,其中基板接收部被放置於腔室之下部區域中,其中於腔室中完成基板上之沈積與基板之蝕刻。The outer casing 100 is inserted into and fixed to a through hole formed by a substrate receiving portion (not shown), wherein the substrate receiving portion is placed in a lower portion of the chamber, wherein the deposition on the substrate and the substrate are completed in the chamber. Etching.

因為外殼100被暴露於腔室內的反應氣體、清洗氣體或清洗液體,由此被腐蝕,外殼100係由抗腐蝕材料形成。因此,外殼100例如由從鋁、不鏽鋼(stainless steel;SUS)、陶瓷與抗腐蝕聚合物組成之集合中選擇的一種,或者包含上述集合中選擇的兩種或多種之複合物形成。Since the outer casing 100 is exposed to the reaction gas, the cleaning gas or the cleaning liquid in the chamber, thereby being corroded, the outer casing 100 is formed of a corrosion-resistant material. Therefore, the outer casing 100 is formed, for example, of one selected from the group consisting of aluminum, stainless steel (SUS), ceramics, and corrosion-resistant polymers, or a composite containing two or more selected from the above-mentioned collections.

基板支撐銷10之頂端11上接收基板(圖未示),如果基板即待處理之物件進入腔室且於基板接收部上被接收,或者已經完成處理之基板從腔室中取出,則基板支撐銷10相對基板接收部與外殼100被移動,從而移動基板。Receiving a substrate (not shown) on the top end 11 of the substrate supporting pin 10, if the substrate, that is, the object to be processed enters the chamber and is received on the substrate receiving portion, or the substrate that has been processed is taken out from the chamber, the substrate supports The pin 10 is moved relative to the substrate receiving portion and the outer casing 100 to move the substrate.

為了有效地相對外殼100移動基板支撐銷10,排除基板支撐銷10之顶端11之基板支撐銷10直徑小於穿透外殼100之空心110之直徑。In order to effectively move the substrate support pin 10 relative to the outer casing 100, the diameter of the substrate support pin 10 excluding the top end 11 of the substrate support pin 10 is smaller than the diameter of the hollow 110 penetrating the outer casing 100.

形成複數個通孔穿透基板接收部,以及外殼100與基板支撐銷10被放置於通孔內從而穩定地支撐基板。A plurality of through holes are formed to penetrate the substrate receiving portion, and the outer casing 100 and the substrate supporting pin 10 are placed in the through holes to stably support the substrate.

複數個引導組件200被放置於外殼100之周邊方向,以及透過滾動接觸基板支撐銷10而於外殼100之長度方向支撐或引導基板支撐銷10之移動。A plurality of guide assemblies 200 are placed in the peripheral direction of the outer casing 100, and support or guide the movement of the substrate support pins 10 in the longitudinal direction of the outer casing 100 by rolling contact with the substrate support pins 10.

沿外殼100之周邊方向依照規定間隔放置引導組件200,由此基於外殼100之中央輻射狀地放置引導組件200。The guide assembly 200 is placed at regular intervals along the peripheral direction of the outer casing 100, whereby the guide assembly 200 is radially placed based on the center of the outer casing 100.

透過輻射狀地放置引導組件200,基板支撐銷10均勻地接觸各個引導組件200,由此於外殼100之空心110內有效地被移動。By radially placing the guide assembly 200, the substrate support pins 10 uniformly contact the respective guide assemblies 200, thereby being effectively moved within the hollow 110 of the outer casing 100.

請參考圖2,舉例來說,這個實施例中,於外殼100之周邊方向提供四個引導組件200。考慮到引導組件200與外殼100之尺寸,製造支撐結構之便利,以及避免基板支撐銷10於引導組件200間的阻塞,四個引導組件200比較合適。Referring to FIG. 2, for example, in this embodiment, four guide assemblies 200 are provided in the peripheral direction of the outer casing 100. The four guide assemblies 200 are suitable in view of the size of the guide assembly 200 and the outer casing 100, the convenience of manufacturing the support structure, and the avoidance of blockage between the substrate support pins 10 between the guide assemblies 200.

可沿外殼100之長度方向提供引導組件200。如圖1代表性所示,於外殼100之上部與下部之每一處放置引導組件200。The guide assembly 200 can be provided along the length of the outer casing 100. As shown representatively in FIG. 1, the guide assembly 200 is placed at each of the upper and lower portions of the outer casing 100.

舉例來說,於外殼100之上端與下端之每一處放置引導組件200,如圖1代表性所示。這裡,耦合組件300被放置於引導組件200之配置位置所對應的位置處,由此耦合引導組件200至外殼100。For example, the guide assembly 200 is placed at each of the upper and lower ends of the outer casing 100, as representatively shown in FIG. Here, the coupling assembly 300 is placed at a position corresponding to the configuration position of the guide assembly 200, thereby coupling the guide assembly 200 to the outer casing 100.

耦合組件300被提供以圍繞引導組件200,由此施加壓力至引導組件200,以及將引導組件200耦合至外殼100。請參考圖2,形成耦合組件300以具有環狀。The coupling assembly 300 is provided to surround the guide assembly 200, thereby applying pressure to the guide assembly 200, and coupling the guide assembly 200 to the outer casing 100. Referring to FIG. 2, the coupling assembly 300 is formed to have a ring shape.

即使耦合組件300由於加熱與冷卻的緣故而重複膨脹與收縮,耦合組件300也不會塑性變形且保持優良的彈性力,由此穩定地施加壓力至引導組件200以及維持引導組件200與外殼100之間的耦合。Even if the coupling assembly 300 repeatedly expands and contracts due to heating and cooling, the coupling assembly 300 does not plastically deform and maintains an excellent elastic force, thereby stably applying pressure to the guide assembly 200 and maintaining the guide assembly 200 and the outer casing 100. Coupling between.

耦合組件300透過緊配(interference fit)或形狀配合耦合於外殼100,從而方便地耦合於外殼100。The coupling assembly 300 is coupled to the outer casing 100 through an interference fit or form fit to facilitate coupling to the outer casing 100.

耦合組件300耦合於外殼100之外部周邊表面,以及沿外殼100之徑向施加壓力至引導組件200。The coupling assembly 300 is coupled to an outer peripheral surface of the outer casing 100 and applies pressure to the guide assembly 200 in the radial direction of the outer casing 100.

通常,引導組件200使用耦合單元比如螺栓被固定至外殼100。然而,如果引導組件200使用耦合單元被固定至外殼100,則耦合單元由於腔室內部加熱的緣故容易受到熱變形的影響。Generally, the guide assembly 200 is fixed to the outer casing 100 using a coupling unit such as a bolt. However, if the guiding assembly 200 is fixed to the outer casing 100 using the coupling unit, the coupling unit is susceptible to thermal deformation due to heating inside the chamber.

如果腔室之內部被加熱以及由此達到高溫,則耦合單元可能會熱膨脹,由此引導組件200、外殼100或者支撐結構之整體可能會由於耦合單元之膨脹而變形或者被損壞。If the interior of the chamber is heated and thereby reaches a high temperature, the coupling unit may thermally expand, whereby the entirety of the guiding assembly 200, the outer casing 100 or the support structure may be deformed or damaged due to expansion of the coupling unit.

因此,實施例中,即使出現熱變形,具有對引導組件200施加優良壓力之環狀耦合組件300用於將引導組件200耦合至外殼100,由此有效地抑制引導組件200、外殼100或支撐結構之整體之變形或損壞。Therefore, in the embodiment, even if thermal deformation occurs, the annular coupling assembly 300 having excellent pressure applied to the guiding assembly 200 is used to couple the guiding assembly 200 to the outer casing 100, thereby effectively suppressing the guiding assembly 200, the outer casing 100 or the supporting structure The overall deformation or damage.

如圖1代表性所示,外殼100包含主體140與耦合槽部130。主體140之外徑大於耦合槽部130之外徑。As representatively shown in FIG. 1, the outer casing 100 includes a body 140 and a coupling groove portion 130. The outer diameter of the main body 140 is larger than the outer diameter of the coupling groove portion 130.

耦合槽部130形成於之主體140上端與下端,從而沿外殼100之長度方向延伸,以及耦合槽部130之外徑小於主體140之外徑。這裡,耦合組件300耦合於耦合槽部130。The coupling groove portion 130 is formed at an upper end and a lower end of the main body 140 so as to extend along the length direction of the outer casing 100, and the outer diameter of the coupling groove portion 130 is smaller than the outer diameter of the main body 140. Here, the coupling assembly 300 is coupled to the coupling groove portion 130.

因此,可於主體140與耦合槽部130之間形成階梯(staircases)。階梯用作耦合組件300之停止件(stoppers)。Therefore, stairs can be formed between the main body 140 and the coupling groove portion 130. The step serves as a stop for the coupling assembly 300.

就是說,如果耦合組件300耦合於耦合槽部130,當耦合組件300之一個表面接觸階梯時,耦合組件300不再於外殼100之長度方向上移動,以及被穩定地裝設於耦合槽部130中。That is, if the coupling assembly 300 is coupled to the coupling groove portion 130, when one surface of the coupling assembly 300 contacts the step, the coupling assembly 300 is no longer moved in the length direction of the outer casing 100, and is stably installed in the coupling groove portion 130. in.

當然,引導組件200沿外殼100之徑向呈輻射狀被放置於耦合槽部130上,以及耦合組件300施加壓力至引導組件200從而將引導組件200耦合至外殼100。Of course, the guide assembly 200 is placed radially on the coupling groove portion 130 in the radial direction of the outer casing 100, and the coupling assembly 300 applies pressure to the guide assembly 200 to couple the guide assembly 200 to the outer casing 100.

圖2係為實施例之支撐結構之平面示意圖。圖2表示耦合槽部130之剖面圖。耦合組件300被形成為環形,以及耦合於耦合槽部130。Figure 2 is a schematic plan view of the support structure of the embodiment. FIG. 2 shows a cross-sectional view of the coupling groove portion 130. The coupling assembly 300 is formed in a ring shape and coupled to the coupling groove portion 130.

透過施加壓力至輻射狀放置的引導組件200,耦合組件300保持引導組件200與外殼100之耦合狀態。The coupling assembly 300 maintains the coupled state of the guide assembly 200 with the outer casing 100 by applying pressure to the radially placed guide assembly 200.

耦合組件300由不會塑性變形的材料例如鋁形成,即使耦合組件300由於受熱重複膨脹與收縮,仍然保持優秀的彈性力。The coupling assembly 300 is formed of a material that is not plastically deformed, such as aluminum, even though the coupling assembly 300 repeatedly expands and contracts due to heat, maintaining excellent elastic force.

如果耦合組件300的徑向寬度過小,則當耦合組件300耦合至外殼100之耦合槽部130且熱膨脹時,耦合組件300可能會塑性變形。If the radial width of the coupling assembly 300 is too small, the coupling assembly 300 may be plastically deformed when the coupling assembly 300 is coupled to the coupling groove portion 130 of the outer casing 100 and thermally expands.

另一方面,如果耦合組件300的徑向寬度過大,則難以將耦合組件300耦合至外殼100,以及當耦合組件300耦合至外殼100時,耦合槽部130且與引導組件200可能變形或者被損壞。On the other hand, if the radial width of the coupling assembly 300 is too large, it is difficult to couple the coupling assembly 300 to the outer casing 100, and when the coupling assembly 300 is coupled to the outer casing 100, the coupling groove portion 130 and the guiding assembly 200 may be deformed or damaged. .

另外,當耦合組件300耦合至外殼100之耦合槽部130且熱膨脹時,耦合組件300具有合適的徑向寬度,從而避免塑性變形以及抑制外殼100與引導組件200之變形及對外殼100與引導組件200之損壞。In addition, when the coupling assembly 300 is coupled to the coupling groove portion 130 of the outer casing 100 and thermally expanded, the coupling assembly 300 has a suitable radial width to avoid plastic deformation and to suppress deformation of the outer casing 100 and the guiding assembly 200 and to the outer casing 100 and the guiding assembly. 200 damage.

實施例中,耦合槽部130具有沿外殼100之徑向形成的通孔120並且與空心110連通,以及引導組件200被放置於通孔120中。In the embodiment, the coupling groove portion 130 has a through hole 120 formed in the radial direction of the outer casing 100 and communicates with the hollow 110, and the guide assembly 200 is placed in the through hole 120.

這裡,形成與引導組件200接觸的通孔120區域,以具有與引導組件200的形狀對應的形狀,由此顯著地降低通孔120中放置的引導組件200之搖動。Here, the area of the through hole 120 that is in contact with the guide assembly 200 is formed to have a shape corresponding to the shape of the guide assembly 200, thereby significantly reducing the shaking of the guide assembly 200 placed in the through hole 120.

如果腔室的內部從室溫或者與其類似的低溫加熱至高溫,則外殼100、引導組件200以及耦合組件300可同時熱膨脹。If the interior of the chamber is heated from room temperature or a similar low temperature to a high temperature, the outer casing 100, the guide assembly 200, and the coupling assembly 300 can be simultaneously thermally expanded.

這裡,耦合組件300甚至在高溫時具有優良的彈性力,由此可施加壓力至引導組件200,以及保持引導組件200至外殼100之穩定耦合狀態。Here, the coupling assembly 300 has an excellent elastic force even at a high temperature, whereby pressure can be applied to the guide assembly 200, and the stable coupling state of the guide assembly 200 to the outer casing 100 can be maintained.

如果腔室的內部從高溫冷卻至室溫或者與其類似的低溫,則外殼100、引導組件200以及耦合組件300可同時熱收縮。If the interior of the chamber is cooled from a high temperature to a room temperature or a low temperature similar thereto, the outer casing 100, the guide assembly 200, and the coupling assembly 300 may be simultaneously thermally contracted.

這裡,甚至耦合組件300在低溫環境熱收縮時,耦合組件300具有優良的彈性力,由此可施加壓力至引導組件200以及保持引導組件200至外殼100之穩定耦合狀態。Here, even when the coupling assembly 300 is thermally contracted in a low temperature environment, the coupling assembly 300 has an excellent elastic force, whereby pressure can be applied to the guide assembly 200 and the stable coupling state of the guide assembly 200 to the outer casing 100 can be maintained.

實施例中,無論腔室內部的溫度環境即高溫與低溫如何,耦合組件300具有優良的彈性力,由此無論溫度如何變化,均可保持引導組件200與外殼100之穩定耦合狀態。In the embodiment, the coupling assembly 300 has excellent elastic force regardless of the temperature environment inside the chamber, that is, high temperature and low temperature, whereby the stable coupling state of the guide assembly 200 and the outer casing 100 can be maintained regardless of the temperature change.

圖3係為實施例之引導組件200之剖面圖。實施例之引導組件200包含接收部210、第一球體220與第二球體230。3 is a cross-sectional view of the guide assembly 200 of the embodiment. The guiding assembly 200 of the embodiment includes a receiving portion 210, a first sphere 220, and a second sphere 230.

一側開口的接收凹部211形成於接收部210處。耦合組件300施加壓力至接收部210之後部區域,即接收凹部211不具有開口側的區域,由此於外殼100上形成的通孔120中穩定地放置引導組件200。A receiving recess 211 that is open at one side is formed at the receiving portion 210. The coupling assembly 300 applies pressure to the rear region of the receiving portion 210, that is, the receiving recess 211 does not have the region on the opening side, whereby the guiding assembly 200 is stably placed in the through hole 120 formed in the outer casing 100.

接收凹部211中接收第一球體220與第二球體230,位於接收凹部211之開口側之第一球體220的部分被暴露於外部,這種第一球體220的暴露部分接觸基板支撐銷10。The first spherical body 220 and the second spherical body 230 are received in the receiving recess 211, and a portion of the first spherical body 220 located on the opening side of the receiving concave portion 211 is exposed to the outside, and the exposed portion of the first spherical body 220 contacts the substrate supporting pin 10.

由於這種結構的緣故,接收凹部211中接收第一球體220,以及第一球體220的一部分被暴露於外部從而與基板支撐銷10滾動接觸。Due to such a structure, the first spherical body 220 is received in the receiving recess 211, and a portion of the first spherical body 220 is exposed to the outside to be in rolling contact with the substrate supporting pin 10.

如果基板支撐銷10相對外殼100移動,則第一球體220滾動,由此極大地降低基板支撐銷10與引導組件200間的摩擦力,從而有效地移動基板支撐銷10,以及減少基板支撐銷10的磨損。If the substrate support pin 10 moves relative to the outer casing 100, the first sphere 220 rolls, thereby greatly reducing the friction between the substrate support pin 10 and the guide assembly 200, thereby effectively moving the substrate support pin 10, and reducing the substrate support pin 10. Wear and tear.

第一球體220在高溫環境的腔室內被腐蝕,由此適合由高抗腐蝕性的材料形成,以及可透過與基板支撐銷10及第二球體230摩擦而被磨損,由此適合由高耐磨性的材料形成。因此,第一球體220由氧化鋁(Al2 O3 )形成,或者具有其表面被塗佈氧化鋁之結構。The first sphere 220 is corroded in a chamber of a high temperature environment, and thus is suitably formed of a material having high corrosion resistance, and is wearable by friction with the substrate support pin 10 and the second sphere 230, thereby being suitable for high wear resistance. Sexual material formation. Therefore, the first sphere 220 is formed of alumina (Al 2 O 3 ) or has a structure in which the surface thereof is coated with alumina.

提供複數個第二球體230,從而於接收凹部211中被接收,以及滾動接觸接收凹部211之內壁與第一球體220。第二球體230由與第一球體220不同的材料形成。A plurality of second spheres 230 are provided to be received in the receiving recess 211 and to contact the inner wall of the receiving recess 211 with the first sphere 220. The second sphere 230 is formed of a different material than the first sphere 220.

第一球體220與第二球體230具有球形,以及接收凹部211之內壁具有球形,其中一部分開口。第二球體230填充第一球體220與接收凹部211之內壁間的空間。The first sphere 220 and the second sphere 230 have a spherical shape, and the inner wall of the receiving recess 211 has a spherical shape, a part of which is open. The second sphere 230 fills a space between the first sphere 220 and the inner wall of the receiving recess 211.

如果第一球體220滾動,則第二球體230相對第一球體220與接收凹部211滾動,由此顯著地降低於第一球體220之滾動期間第一球體220之表面產生的摩擦力,從而第一球體220可平滑地滾動。If the first sphere 220 rolls, the second sphere 230 rolls relative to the first sphere 220 and the receiving recess 211, thereby significantly reducing the friction generated by the surface of the first sphere 220 during the rolling of the first sphere 220, thereby The ball 220 can smoothly roll.

圖4係為實施例之支撐結構之縱向剖面之示意圖。如上所述,沿外殼100的周邊方向呈輻射狀地於耦合槽部130處提供四個引導組件200。Figure 4 is a schematic illustration of a longitudinal section of the support structure of the embodiment. As described above, the four guide assemblies 200 are radially provided at the coupling groove portion 130 in the peripheral direction of the outer casing 100.

另外,沿外殼100的長度方向放置兩列引導組件200。這裡,於外殼100之上端與下端處形成的耦合槽部130的每一處放置每一列。In addition, two rows of guide assemblies 200 are placed along the length of the outer casing 100. Here, each column is placed at each of the coupling groove portions 130 formed at the upper end and the lower end of the outer casing 100.

耦合組件300被放置於與引導組件200對應的外殼100的位置,以及耦合組件300被放置為從而容易與外殼100耦合。The coupling assembly 300 is placed at a position of the outer casing 100 corresponding to the guiding assembly 200, and the coupling assembly 300 is placed so as to be easily coupled with the outer casing 100.

因此,由於這個原因,耦合槽部130形成於耦合組件300容易與其耦合之外殼100之上端與下端的每一處,以及引導組件200與耦合組件300被放置於耦合槽部130處。Therefore, for this reason, the coupling groove portion 130 is formed at each of the upper end and the lower end of the outer casing 100 to which the coupling assembly 300 is easily coupled, and the guiding assembly 200 and the coupling assembly 300 are placed at the coupling groove portion 130.

另外,由於這個原因,沿外殼100之長度方向於外殼100之上端與下端處放置總計兩列引導組件200與耦合組件300。In addition, for this reason, a total of two rows of the guide assembly 200 and the coupling assembly 300 are placed at the upper and lower ends of the outer casing 100 along the length direction of the outer casing 100.

環狀耦合組件300透過緊配或形狀配合耦合至外殼100之耦合槽部130。The annular coupling assembly 300 is coupled to the coupling groove portion 130 of the outer casing 100 by a tight fit or form fit.

因為無需單獨的耦合單元,耦合組件300係透過緊配或形狀配合耦合至耦合槽部130,所以耦合組件300容易耦合至外殼100。Because a separate coupling unit is not required, the coupling assembly 300 is coupled to the coupling slot 130 by a tight fit or form fit, so the coupling assembly 300 is easily coupled to the outer casing 100.

採用相同的方式,因為引導組件200透過耦合組件300施加的壓力耦合至外殼100,無需單獨的耦合單元,所以引導組件200容易耦合至外殼100。In the same manner, because the guide assembly 200 is coupled to the outer casing 100 by the pressure applied by the coupling assembly 300, a separate coupling unit is not required, so the guide assembly 200 is easily coupled to the outer casing 100.

實施例中,引導組件200未使用耦合單元比如螺栓被固定至外殼100,但是環狀耦合組件300施加壓力至引導組件200從而耦合引導組件200至外殼100,從而避免由於耦合單元之熱變形導致支撐結構的變形或損壞,以及有效地將引導組件200耦合至外殼100。In an embodiment, the guide assembly 200 is not fixed to the outer casing 100 using a coupling unit such as a bolt, but the annular coupling assembly 300 applies pressure to the guide assembly 200 to couple the guide assembly 200 to the outer casing 100, thereby avoiding support due to thermal deformation of the coupling unit. Deformation or damage to the structure, as well as effectively coupling the guide assembly 200 to the outer casing 100.

圖5係為圖2之部分A之放大示意圖。圖5所示的內容對應另一實施例,由此圖5中表示了圖2中未繪示的鉤體212與凹陷的凹部312。圖6係為沿圖5之線之B-B之剖面圖。Figure 5 is an enlarged schematic view of a portion A of Figure 2. The content shown in FIG. 5 corresponds to another embodiment, whereby the hook body 212 and the recessed recess 312 which are not shown in FIG. 2 are shown in FIG. Figure 6 is a cross-sectional view taken along line B-B of Figure 5.

實施例中,鉤體212形成於接收部210上,以及凹陷的凹部312形成於耦合組件300上。In the embodiment, the hook body 212 is formed on the receiving portion 210, and the recessed concave portion 312 is formed on the coupling assembly 300.

就是說,接收部210包含從接收部210的一部分突出的與耦合組件300相對的鉤體212,以及耦合組件300包含凹陷的凹部312,凹陷的凹部312的形狀對應鉤體212的形狀,以及從耦合組件300與鉤體212相對的部分突出。That is, the receiving portion 210 includes a hook body 212 that protrudes from a portion of the receiving portion 210 opposite to the coupling assembly 300, and the coupling assembly 300 includes a recessed recess 312 having a shape corresponding to the shape of the hook body 212, and The portion of the coupling assembly 300 opposite the hook body 212 protrudes.

舉例來說,接收部210與耦合組件300相對的部分的兩個角部處均可形成鉤體212。實施例中,提供四個引導組件200,由此總計提供八個鉤體212。For example, the hook 212 may be formed at both corners of the portion of the receiving portion 210 opposite to the coupling assembly 300. In the embodiment, four guide assemblies 200 are provided, whereby a total of eight hooks 212 are provided.

另一實施例中,鉤體212形成於接收部210與耦合組件300相對之部分之中央處。這裡,因為鉤體212形成於接收部210的中央處,以及提供四個引導組件220,所以總計提供四個鉤體212。In another embodiment, the hook body 212 is formed at the center of the portion of the receiving portion 210 opposite to the coupling assembly 300. Here, since the hook body 212 is formed at the center of the receiving portion 210, and four guiding members 220 are provided, a total of four hook bodies 212 are provided.

當然,凹陷的凹部312被提供於耦合組件300中與接收部210之中央處形成的鉤體212對應的位置,以及提供的數目對應鉤體212的總數。Of course, the recessed recess 312 is provided at a position in the coupling assembly 300 corresponding to the hook body 212 formed at the center of the receiving portion 210, and the number provided corresponds to the total number of the hook bodies 212.

耦合組件300透過緊配或形狀配合耦合於外殼100之耦合槽部130,但是與外殼100分離。The coupling assembly 300 is coupled to the coupling groove portion 130 of the outer casing 100 by a tight fit or a positive fit, but is separated from the outer casing 100.

就是說,耦合組件300依照腔室內部的溫度上升/下降而重複熱膨脹與收縮,依照腔室中提供的各種裝置的作業可能連續地出現振動。That is, the coupling assembly 300 repeats thermal expansion and contraction in accordance with the temperature rise/fall of the inside of the chamber, and vibration may continuously occur in accordance with the operation of various devices provided in the chamber.

因為耦合組件300由於這種熱膨脹/收縮與振動的緣故而與外殼100分離,所以需要保持耦合組件300與100之穩定耦合狀態。Since the coupling assembly 300 is separated from the outer casing 100 due to such thermal expansion/contraction and vibration, it is necessary to maintain a stable coupling state of the coupling assemblies 300 and 100.

因此,接收部210上形成的鉤體212被裝設於耦合組件300上形成的凹陷的凹部312中,由此抑制耦合組件300與外殼100分離。Therefore, the hook body 212 formed on the receiving portion 210 is installed in the recessed recess 312 formed in the coupling assembly 300, thereby suppressing the coupling assembly 300 from being separated from the outer casing 100.

就是說,耦合組件300施加壓力至接收部210,從而保持引導組件200至外殼100之耦合狀態,以及抑制引導組件200與外殼100分離。That is, the coupling assembly 300 applies pressure to the receiving portion 210, thereby maintaining the coupled state of the guiding assembly 200 to the outer casing 100, and inhibiting the guiding assembly 200 from being separated from the outer casing 100.

引導組件200之接收部210處形成的鉤體212被裝設於耦合組件300上形成的凹陷的凹部312中,由此保持耦合組件300至外殼100之耦合狀態,以及抑制引導組件200與外殼100分離。The hook body 212 formed at the receiving portion 210 of the guiding assembly 200 is installed in the recessed recess 312 formed on the coupling assembly 300, thereby maintaining the coupled state of the coupling assembly 300 to the outer casing 100, and suppressing the guiding assembly 200 and the outer casing 100. Separation.

透過這種結構,耦合組件300與引導組件200彼此約束,由此耦合組件300與引導組件200可保持其與外殼100之穩定耦合狀態,以及避免其與外殼100分離。With this configuration, the coupling assembly 300 and the guiding assembly 200 are constrained to each other, whereby the coupling assembly 300 and the guiding assembly 200 can maintain their stable coupling with the housing 100 and avoid separation from the housing 100.

請參考圖6,鉤體212之上端形成為傾斜面212a,以及鉤體212之下端形成為階梯面212b。為了與鉤體212對應,凹陷的凹部312於其上部具有傾斜面,以及於其下部具有階梯面。Referring to FIG. 6, the upper end of the hook body 212 is formed as an inclined surface 212a, and the lower end of the hook body 212 is formed as a stepped surface 212b. In order to correspond to the hook body 212, the recessed recess 312 has an inclined surface at its upper portion and a stepped surface at its lower portion.

當耦合組件300被裝設於外殼100之耦合槽部130時,耦合組件300可沿外殼100之長度方向向下移動,即於圖6中向下移動,由此被裝設於耦合槽部130中。When the coupling assembly 300 is mounted on the coupling groove portion 130 of the outer casing 100, the coupling assembly 300 can be moved downward along the length direction of the outer casing 100, that is, moved downward in FIG. 6, thereby being mounted on the coupling groove portion 130. in.

這裡,如果耦合組件300沿外殼100向下移動,耦合組件300沿鉤體212之傾斜面212a滑動,然後當鉤體212被完成裝設於凹陷的凹部312中時,則完成外殼100上的耦合組件300的裝設。Here, if the coupling assembly 300 moves down the outer casing 100, the coupling assembly 300 slides along the inclined surface 212a of the hook body 212, and then when the hook body 212 is completed in the recessed recess 312, the coupling on the outer casing 100 is completed. Assembly of assembly 300.

當完成外殼100上的耦合組件300的裝設時,耦合組件300受到鉤體212的階梯面212b的約束,由此可避免耦合組件300沿外殼100的長度方向向上移動,以及可避免耦合組件300與外殼100分離。When the mounting of the coupling assembly 300 on the outer casing 100 is completed, the coupling assembly 300 is constrained by the stepped surface 212b of the hook body 212, thereby preventing the coupling assembly 300 from moving upward along the length of the outer casing 100, and the coupling assembly 300 can be avoided. Separated from the outer casing 100.

由於上述結構的緣故,實施例中,耦合組件300可透過鉤體212之階梯面212b穩定地耦合至外殼100,由此引導組件200可透過耦合組件300施加之壓力穩定地耦合至外殼100。Due to the above structure, in the embodiment, the coupling assembly 300 can be stably coupled to the outer casing 100 through the stepped surface 212b of the hook body 212, whereby the guiding assembly 200 can be stably coupled to the outer casing 100 through the pressure applied by the coupling assembly 300.

雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明。在不脫離本發明之精神和範圍內,所為之更動與潤飾,均屬本發明之專利保護範圍。關於本發明所界定之保護範圍請參考所附之申請專利範圍。Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. It is within the scope of the invention to be modified and modified without departing from the spirit and scope of the invention. Please refer to the attached patent application for the scope of protection defined by the present invention.

10‧‧‧基板支撐銷10‧‧‧Substrate support pin

11‧‧‧頂端11‧‧‧Top

100‧‧‧外殼100‧‧‧ Shell

110‧‧‧空心110‧‧‧ hollow

120‧‧‧通孔120‧‧‧through hole

130‧‧‧耦合槽部130‧‧‧Coupling groove

140‧‧‧主體140‧‧‧ Subject

200‧‧‧引導組件200‧‧‧Guide components

210‧‧‧接收部210‧‧‧ Receiving Department

211‧‧‧接收凹部211‧‧‧ receiving recess

212‧‧‧鉤體212‧‧‧ hook body

212a‧‧‧傾斜面212a‧‧‧ sloped surface

212b‧‧‧階梯面212b‧‧‧step surface

220‧‧‧第一球體220‧‧‧First sphere

230‧‧‧第二球體230‧‧‧Second sphere

300‧‧‧耦合組件300‧‧‧Coupling components

312‧‧‧凹陷的凹部312‧‧‧ recessed recess

A‧‧‧部分Part A‧‧‧

圖1係為一個實施例之支撐結構之分解縱向剖面圖。 圖2係為該實施例之支撐結構之平面示意圖。 圖3係為該實施例之引導組件之剖面圖。 圖4係為該實施例之支撐結構之縱向剖面意圖。 圖5係為圖2之部分A之放大示意圖。 圖6係為沿圖5之線之B-B之剖面圖。Figure 1 is an exploded longitudinal cross-sectional view of a support structure of one embodiment. Figure 2 is a schematic plan view of the support structure of the embodiment. Figure 3 is a cross-sectional view of the guide assembly of the embodiment. Figure 4 is a longitudinal cross-sectional view of the support structure of this embodiment. Figure 5 is an enlarged schematic view of a portion A of Figure 2. Figure 6 is a cross-sectional view taken along line B-B of Figure 5.

Claims (12)

一種支撐結構,包含:一外殼,具有沿其長度方向形成的一空心,這樣一基板支撐銷被插入該空心內;複數個引導組件,沿周邊方向被提供於該外殼之一上部與一下部之每一處,以及透過與該基板支撐銷之滾動接觸而引導該基板支撐銷沿該外殼之長度方向之移動;以及複數個耦合組件,耦合於該外殼之一外部周邊表面,該等耦合組件被提供以圍繞該等引導組件,以及沿該外殼之徑向施加壓力至該等引導組件,從而將該等引導組件耦合至該外殼。A support structure comprising: a casing having a hollow formed along a length thereof such that a substrate support pin is inserted into the hollow; a plurality of guide assemblies are provided in an upper portion and a lower portion of the outer casing in a peripheral direction Moving the substrate support pin along the length of the outer casing by rolling contact with the substrate support pin; and a plurality of coupling components coupled to an outer peripheral surface of the outer casing, the coupling components being A guide member is provided to surround the guide members and to apply pressure to the guide members in a radial direction of the outer casing to couple the guide members to the outer casing. 如請求項1所述之支撐結構,其中該等耦合組件形成以具有環狀,以及透過緊配或形狀配合耦合於該外殼。The support structure of claim 1 wherein the coupling assemblies are formed to have an annular shape and to be coupled to the outer casing by a tight fit or a positive fit. 如請求項2所述之支撐結構,其中該等耦合組件由鋁形成。The support structure of claim 2, wherein the coupling components are formed of aluminum. 如請求項1所述之支撐結構,其中沿該外殼之長度方向提供該等引導組件。The support structure of claim 1 wherein the guide assemblies are provided along the length of the outer casing. 如請求項4所述之支撐結構,其中該等引導組件被放置於該外殼之一上端與一下端的每一處。The support structure of claim 4, wherein the guide assemblies are placed at each of the upper and lower ends of the housing. 如請求項1所述之支撐結構,其中該外殼包含:一主體;以及複數個耦合槽部,形成於該主體之上端與下端處,從而沿該外殼之長度方向延伸,以及該等耦合槽部之外徑小於該主體之外徑,其中該等耦合組件耦合於該等耦合槽部。The support structure of claim 1, wherein the outer casing comprises: a main body; and a plurality of coupling groove portions formed at an upper end and a lower end of the main body so as to extend along a length direction of the outer casing, and the coupling groove portion The outer diameter is less than the outer diameter of the body, wherein the coupling components are coupled to the coupling grooves. 如請求項6所述之支撐結構,其中該等引導組件包含四個引導組件,沿該外殼之周邊方向呈輻射狀放置於該等耦合槽部之每一個中。The support structure of claim 6, wherein the guide assemblies comprise four guide assemblies that are radially placed in each of the coupling grooves along a peripheral direction of the outer casing. 如請求項6所述之支撐結構,其中該等引導組件沿該外殼之長度方向被放置為兩列。The support structure of claim 6, wherein the guide members are placed in two columns along the length of the outer casing. 如請求項6所述之支撐結構,其中該等耦合槽部具有形成於該外殼之徑向之複數個通孔,以及該等通孔連通該空心,其中該等引導組件被放置於該等通孔中。The support structure of claim 6, wherein the coupling groove portion has a plurality of through holes formed in a radial direction of the outer casing, and the through holes communicate with the hollow, wherein the guiding members are placed in the communication In the hole. 如請求項1所述之支撐結構,其中該等引導組件的每一個包含:一接收部,包含具有一個開口側之一接收凹部;一第一球體,被接收於該接收凹部中,該第一球體之一部分被暴露於外部以及與該基板支撐銷滾動接觸;以及複數個第二球體,被接收於該接收凹部中,以及與該接收凹部之一內壁及該第一球體滾動接觸。The support structure of claim 1, wherein each of the guiding assemblies comprises: a receiving portion comprising a receiving recess having an open side; a first sphere received in the receiving recess, the first One portion of the sphere is exposed to the outside and in rolling contact with the substrate support pin; and a plurality of second spheres are received in the receiving recess and in rolling contact with an inner wall of the receiving recess and the first sphere. 如請求項10所述之支撐結構,其中該接收部包含從其與該耦合組件相對的一部分突出的複數個鉤體;以及該耦合組件包含複數個凹陷的凹部,具有與該鉤體對應的形狀,以及形成於與該等鉤體相對的部分處。The support structure of claim 10, wherein the receiving portion includes a plurality of hooks projecting from a portion thereof opposite to the coupling assembly; and the coupling assembly includes a plurality of recessed recesses having a shape corresponding to the hook body And formed at a portion opposite to the hooks. 如請求項11所述之支撐結構,其中該鉤體之一上端形成為一傾斜面,以及該鉤體之一下端形成為一階梯面。The support structure according to claim 11, wherein an upper end of the hook body is formed as an inclined surface, and a lower end of the hook body is formed as a step surface.
TW107130613A 2017-09-04 2018-08-31 Supporting structure TWI794280B (en)

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DE3541020A1 (en) * 1985-11-19 1987-05-21 Star Gmbh ROLLING ELEMENT
US8033245B2 (en) * 2004-02-12 2011-10-11 Applied Materials, Inc. Substrate support bushing
KR101332294B1 (en) * 2006-12-27 2013-11-22 주성엔지니어링(주) Substrate support pin assembly
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KR102427077B1 (en) 2022-07-29
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