TW201909347A - Electronic package and substrate structure and the manufacture thereof - Google Patents

Electronic package and substrate structure and the manufacture thereof Download PDF

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Publication number
TW201909347A
TW201909347A TW106123646A TW106123646A TW201909347A TW 201909347 A TW201909347 A TW 201909347A TW 106123646 A TW106123646 A TW 106123646A TW 106123646 A TW106123646 A TW 106123646A TW 201909347 A TW201909347 A TW 201909347A
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Taiwan
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substrate structure
layer
grounding
electronic component
power supply
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TW106123646A
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Chinese (zh)
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TWI615927B (en
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方柏翔
林河全
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矽品精密工業股份有限公司
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Priority to TW106123646A priority Critical patent/TWI615927B/en
Priority to CN201710684584.2A priority patent/CN109256374B/en
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Publication of TWI615927B publication Critical patent/TWI615927B/en
Publication of TW201909347A publication Critical patent/TW201909347A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Geometry or layout of the interconnection structure
    • H01L23/5286Arrangements of power or ground buses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5223Capacitor integral with wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

The invention provides a substrate structure of an electronic package and a method for fabricating the same, the method comprising forming an opening on a grounding sheet or a power source sheet of a circuit portion to reduce the surface and proportion of the occupied circuit portion, thereby reducing stress concentration to prevent substrate warpage while forming a filling material in the opening to increase coupling capacity.

Description

電子封裝件暨基板結構及其製法  Electronic package and substrate structure and preparation method thereof  

本發明係有關一種基板結構,尤指一種應用於電子封裝件之基板結構及其製法。 The present invention relates to a substrate structure, and more particularly to a substrate structure applied to an electronic package and a method of fabricating the same.

隨著電子產業的蓬勃發展,電子產品也逐漸邁向多功能、高性能的趨勢。為了滿足半導體封裝件微型化(miniaturization)的封裝需求,係發展出晶圓級封裝(Wafer Level Packaging,簡稱WLP)的技術。 With the rapid development of the electronics industry, electronic products are gradually moving towards multi-functional and high-performance trends. In order to meet the packaging requirements of semiconductor package miniaturization, Wafer Level Packaging (WLP) technology has been developed.

如第1A至1D圖,係為習知晶圓級半導體封裝件1之製法之剖面示意圖。 1A to 1D are schematic cross-sectional views showing the fabrication of a conventional wafer level semiconductor package 1.

如第1A圖所示,提供一具有熱化離型膠層(thermal release tape)11之承載件10。接著,置放複數半導體元件12於該熱化離型膠層11上,且該些半導體元件12具有相對之主動面12a與非主動面12b,其中,該主動面12a具有複數電極墊120,並以該主動面12a黏著於該熱化離型膠層11上。 As shown in FIG. 1A, a carrier 10 having a thermal release tape 11 is provided. Next, the plurality of semiconductor elements 12 are placed on the thermal release layer 11, and the semiconductor elements 12 have opposite active and uninitiated faces 12a, 12b, wherein the active face 12a has a plurality of electrode pads 120, and The active surface 12a is adhered to the thermal release adhesive layer 11.

如第1B圖所示,以壓合(lamination)方式形成一封裝膠體13於該熱化離型膠層11上,以包覆該半導體元件 12。 As shown in Fig. 1B, an encapsulant 13 is formed on the thermal release layer 11 by lamination to coat the semiconductor element 12.

如第1C圖所示,進行烘烤製程以硬化該封裝膠體13,且該熱化離型膠層11因受熱後會失去黏性,再一併移除該熱化離型膠層11與該承載件10,以外露該半導體元件12之主動面12a。 As shown in FIG. 1C, a baking process is performed to harden the encapsulant 13, and the thermal release adhesive layer 11 loses viscosity after being heated, and the thermal release adhesive layer 11 is removed together. The carrier 10 exposes the active surface 12a of the semiconductor component 12.

如第1D圖所示,進行線路重佈層(Redistribution layer,簡稱RDL)製程,以形成一線路部14於該封裝膠體13與該半導體元件12之主動面12a上,使該線路部14電性連接該半導體元件12之電極墊120,其中,該線路部14係包含接地片140及電源片141(如第1D’圖所示)。接著,形成一絕緣保護層15於該線路部14上,且該絕緣保護層15外露該線路部14之部分表面,以供結合如銲錫凸塊之導電元件16。 As shown in FIG. 1D, a redistribution layer (RDL) process is performed to form a line portion 14 on the encapsulant 13 and the active surface 12a of the semiconductor device 12, so that the line portion 14 is electrically The electrode pad 120 of the semiconductor device 12 is connected to the ground pad 140 and the power supply chip 141 (as shown in FIG. 1D'). Next, an insulating protective layer 15 is formed on the wiring portion 14, and the insulating protective layer 15 exposes a portion of the surface of the wiring portion 14 for bonding the conductive members 16 such as solder bumps.

惟,習知半導體封裝件1之製法中,該接地片140與該電源片141係為金屬材質,且其所佔面積比例過多,故使該半導體封裝件1容易於後續製程中發生翹曲,導致該接地片140(或該電源片141)無法有效電性連接該些半導體元件12之電極墊120,致使電性不良,進而造成良率過低及產品可靠度不佳等問題。 However, in the manufacturing method of the conventional semiconductor package 1, the grounding piece 140 and the power supply piece 141 are made of a metal material, and the ratio of the area occupied by the semiconductor chip 140 is too large, so that the semiconductor package 1 is easily warped in a subsequent process. The grounding strip 140 (or the power strip 141) cannot be electrically connected to the electrode pads 120 of the semiconductor elements 12, resulting in poor electrical performance, which causes problems such as low yield and poor product reliability.

因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome the various problems of the above-mentioned prior art has become a problem that is currently being solved.

鑑於上述習知技術之種種缺失,本發明係提供一種基板結構,係包括:線路部,係包含至少一介電層及至少一 線路層,其中,該線路層包含有接地片及/或電源片,且該接地片或該電源片形成有開孔;以及填充材,係形成於該開孔中。 In view of the above-mentioned various deficiencies of the prior art, the present invention provides a substrate structure including: a wiring portion including at least one dielectric layer and at least one wiring layer, wherein the wiring layer includes a grounding strip and/or a power supply sheet And the grounding piece or the power supply sheet is formed with an opening; and a filler is formed in the opening.

本發明亦提供一種基板結構之製法,係包括:提供一包含至少一介電層及至少一線路層之線路部,其中,該線路層包含有接地片及/或電源片,且該接地片或該電源片形成有開孔;以及形成填充材於該開孔中。 The invention also provides a method for fabricating a substrate structure, comprising: providing a circuit portion including at least one dielectric layer and at least one circuit layer, wherein the circuit layer comprises a grounding piece and/or a power supply piece, and the grounding piece or The power sheet is formed with an opening; and a filler is formed in the opening.

前述之基板結構及其製法中,該接地片與該電源片之間具有間隙。 In the above substrate structure and method of manufacturing the same, the ground strip has a gap with the power strip.

前述之基板結構及其製法中,該填充材係為金屬材。 In the above substrate structure and method of manufacturing the same, the filler is a metal material.

前述之基板結構及其製法中,該填充材復結合於該接地片或該電源片上。 In the foregoing substrate structure and method of manufacturing the same, the filler material is combined with the grounding piece or the power supply sheet.

本發明復提供一種電子封裝件,係包括:一前述之基板結構;以及電子元件,係設於該線路部上並電性連接該接地片與該電源片。 The present invention further provides an electronic package comprising: a substrate structure as described above; and an electronic component disposed on the circuit portion and electrically connected to the ground plate and the power chip.

本發明又提供一種電子封裝件之製法,係包括:提供一前述之基板結構;以及設置電子元件於該線路部上,並令該電子元件電性連接該接地片及/或該電源片。 The invention further provides a method for manufacturing an electronic package, comprising: providing a substrate structure as described above; and disposing an electronic component on the circuit portion, and electrically connecting the electronic component to the grounding piece and/or the power supply piece.

前述之電子封裝件及其製法中,復包括形成用以包覆該電子元件之封裝層。 In the foregoing electronic package and method of manufacturing the same, the package layer for forming the electronic component is formed.

由上可知,本發明之電子封裝件暨基板結構及其製法,係藉由該接地片或該電源片具有開孔之設計,以降低其所佔線路層之面積比例,因而能減少應力集中,故相較於習知技術,本發明可避免電子封裝件或基板結構翹曲, 因而該接地片與該電源片能有效電性連接該電子元件,進而提升良率及產品可靠度。 It can be seen from the above that the electronic package and the substrate structure of the present invention and the manufacturing method thereof are designed to reduce the area ratio of the circuit layer occupied by the grounding piece or the power supply piece, thereby reducing stress concentration. Therefore, compared with the prior art, the present invention can avoid the warpage of the electronic package or the substrate structure, so that the grounding piece and the power supply piece can effectively electrically connect the electronic component, thereby improving yield and product reliability.

再者,藉由形成填充材於該開孔中以增加耦合電容,故能提供較佳之雜訊濾除,並降低該電子元件之輸出電壓突波,因而能提升良率及產品可靠度。 Moreover, by forming a filler material in the opening to increase the coupling capacitance, it can provide better noise filtering and reduce the output voltage surge of the electronic component, thereby improving yield and product reliability.

1‧‧‧半導體封裝件 1‧‧‧Semiconductor package

10,20‧‧‧承載件 10,20‧‧‧Carrier

11‧‧‧熱化離型膠層 11‧‧‧heating release layer

12‧‧‧半導體元件 12‧‧‧Semiconductor components

12a‧‧‧主動面 12a‧‧‧ active face

12b‧‧‧非主動面 12b‧‧‧Inactive surface

120‧‧‧電極墊 120‧‧‧electrode pads

13‧‧‧封裝膠體 13‧‧‧Package colloid

14,2a‧‧‧線路部 14,2a‧‧‧Line Department

140,220‧‧‧接地片 140,220‧‧‧ Grounding piece

141,221‧‧‧電源片 141,221‧‧‧Power film

15,25‧‧‧絕緣保護層 15,25‧‧‧Insulation protective layer

16,33‧‧‧導電元件 16,33‧‧‧ conductive elements

2‧‧‧基板結構 2‧‧‧Substrate structure

21‧‧‧介電層 21‧‧‧Dielectric layer

22‧‧‧線路層 22‧‧‧Line layer

22a‧‧‧導電層 22a‧‧‧ Conductive layer

222‧‧‧開孔 222‧‧‧ openings

23‧‧‧導電盲孔 23‧‧‧ Conductive blind holes

24‧‧‧填充材 24‧‧‧Filling materials

250‧‧‧開口 250‧‧‧ openings

3‧‧‧電子封裝件 3‧‧‧Electronic package

31‧‧‧電子元件 31‧‧‧Electronic components

310‧‧‧導電凸塊 310‧‧‧Electrical bumps

32‧‧‧封裝層 32‧‧‧Encapsulation layer

t‧‧‧間隙 T‧‧‧ gap

第1A至1D圖係為習知半導體封裝件之製法之剖面示意圖;第1D’圖係對應第1D圖之局部上視圖;第2A至2E圖係本發明之基板結構之製法之剖面示意圖;第2A’圖係對應第2A圖之局部上視圖;以及第3A至3B圖係為第2D圖之後續製程之剖面示意圖。 1A to 1D are schematic cross-sectional views showing a method of fabricating a conventional semiconductor package; FIG. 1D' is a partial top view corresponding to FIG. 1D; and FIGS. 2A to 2E are schematic cross-sectional views showing a method of fabricating the substrate structure of the present invention; 2A' is a partial top view corresponding to FIG. 2A; and 3A to 3B is a schematic cross-sectional view of a subsequent process of FIG. 2D.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如 “上”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. The technical content disclosed in the invention can be covered. In the meantime, the terms "upper" and "one" as used in the specification are merely for convenience of description, and are not intended to limit the scope of the invention, and the relative relationship is changed or adjusted. Substantially changing the technical content is also considered to be within the scope of the invention.

第2A至2D圖係為本發明之基板結構2之製法的剖面示意圖。 2A to 2D are schematic cross-sectional views showing the manufacturing method of the substrate structure 2 of the present invention.

如第2A及2A’圖所示,提供一承載件20,且於該承載件20上進行RDL製程以形成線路部2a,且該線路部2a係包含相疊之至少一介電層21與至少一線路層22,其中,該線路層22係包含至少一接地片220及至少一電源片221。 As shown in FIGS. 2A and 2A', a carrier 20 is provided, and an RDL process is performed on the carrier 20 to form a line portion 2a, and the line portion 2a includes at least one dielectric layer 21 and at least A circuit layer 22, wherein the circuit layer 22 includes at least one grounding strip 220 and at least one power strip 221 .

於本實施例中,形成該介電層21之材質係例如聚亞醯胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)、苯並環丁烯(Benezocy-clobutene,簡稱BCB)或聚對二唑苯(Polybenzoxazole,簡稱PBO)。 In the present embodiment, the material forming the dielectric layer 21 is, for example, Polyimide (PI), Prepreg (PP), and Benezocy-clobutene (BCB). Or polybenzoxazole (PBO).

再者,該線路層22可為單層或多層之扇出(fan out)型配置,且以電鍍方式(如藉由導電層22a)形成該線路層22,其材質可選擇延展性較高及傳導性較佳的金屬,如銅材。例如,當該線路層22為多層時,可藉由導電盲孔23電性連接上、下層之線路層22。 Furthermore, the circuit layer 22 can be a single-layer or multi-layer fan out type configuration, and the circuit layer 22 is formed by electroplating (such as by the conductive layer 22a), and the material can be selected to have high ductility. A metal with better conductivity, such as copper. For example, when the circuit layer 22 is a plurality of layers, the wiring layers 22 of the upper and lower layers can be electrically connected by the conductive blind holes 23.

又,該接地片220與該電源片221係相互分離以形成一間隙t,且於該接地片220或該電源片221上係具有至少一開孔222。 Moreover, the grounding strip 220 and the power strip 221 are separated from each other to form a gap t, and the grounding strip 220 or the power strip 221 has at least one opening 222.

如第2B及2C圖所示,於該接地片220與該電源片221上形成填充材24。 As shown in FIGS. 2B and 2C, a filler 24 is formed on the grounding piece 220 and the power supply sheet 221.

於本實施例中,該填充材24係為金屬材。例如,先電鍍形成金屬材於該介電層21與該線路層22上,再移除該接地片220與該電源片221周圍之金屬材,僅保留該接地片220(含該開孔222)與該電源片221(含該開孔222)上之金屬材。 In the present embodiment, the filler 24 is a metal material. For example, a metal material is first formed on the dielectric layer 21 and the circuit layer 22, and the grounding piece 220 and the metal material around the power supply piece 221 are removed, and only the grounding piece 220 is retained (including the opening 222). And a metal material on the power supply sheet 221 (including the opening 222).

再者,由於該填充材24係為金屬材,故該間隙t中之填充材24僅結合於該接地片220之側面與該電源片221之側面,而不會形成於該間隙t底面,以避免該接地片220與該電源片221短路。 In addition, since the filler 24 is made of a metal material, the filler 24 in the gap t is only bonded to the side surface of the grounding strip 220 and the side surface of the power strip 221, and is not formed on the bottom surface of the gap t. The grounding strip 220 is prevented from being short-circuited with the power strip 221 .

如第2D圖所示,該線路部2a可依需求繼續增設至少一介電層21與線路層22於該填充材24上;或形成一絕緣保護層25於該線路部2a上。 As shown in FIG. 2D, the line portion 2a can continue to add at least one dielectric layer 21 and the circuit layer 22 to the filling material 24 as needed; or an insulating protective layer 25 is formed on the line portion 2a.

於本實施例中,該絕緣保護層25係為防銲層,其具有複數開口250,使該線路層22之部分表面外露於該些開口250。 In the present embodiment, the insulating protective layer 25 is a solder resist layer having a plurality of openings 250 such that portions of the surface of the wiring layer 22 are exposed to the openings 250.

再者,於後續製程中,如第2E圖所示,可移除該承載件20,以製成基板結構2。或者,如第3A圖所示,先設置至少一電子元件31於該絕緣保護層25上,再形成一封裝層32於該絕緣保護層25上以包覆該電子元件31,之後,如第3B圖所示,移除該承載件20,以製成一電子封裝件3,並能形成複數如銲錫材料之導電元件33於該線路層22上。 Furthermore, in a subsequent process, as shown in FIG. 2E, the carrier 20 can be removed to form the substrate structure 2. Alternatively, as shown in FIG. 3A, at least one electronic component 31 is disposed on the insulating protective layer 25, and an encapsulation layer 32 is formed on the insulating protective layer 25 to encapsulate the electronic component 31, and then, as in FIG. 3B. As shown, the carrier 20 is removed to form an electronic package 3 and a plurality of conductive elements 33, such as solder materials, can be formed on the circuit layer 22.

又,該電子元件31係為主動元件、被動元件或其二者組合,其中,該主動元件係例如半導體晶片,而該被動元 件係例如電阻、電容及電感。例如,該電子元件31係藉由複數如銲錫材料之導電凸塊310以覆晶方式設於該些開口250中之線路層22上並電性連接該線路層22;或者,該電子元件31可藉由複數銲線(圖略)以打線方式電性連接該線路層22;亦或,該電子元件31可直接接觸該線路層22。然而,有關該電子元件31電性連接該線路層22之方式不限於上述。 Further, the electronic component 31 is an active component, a passive component or a combination thereof, wherein the active component is, for example, a semiconductor wafer, and the passive component is, for example, a resistor, a capacitor, and an inductor. For example, the electronic component 31 is provided on the circuit layer 22 of the openings 250 by a plurality of conductive bumps 310, such as solder materials, and electrically connected to the circuit layer 22; or, the electronic component 31 can be electrically connected to the circuit layer 22; The circuit layer 22 is electrically connected by wire bonding by a plurality of bonding wires (not shown); or the electronic component 31 can directly contact the circuit layer 22. However, the manner in which the electronic component 31 is electrically connected to the wiring layer 22 is not limited to the above.

另外,該封裝層32可為壓合製程用之薄膜、模壓製程用之封裝膠體或印刷製程用之膠材等,且形成該封裝層32之材質係為聚醯亞胺(PI)、乾膜(dry film)、環氧樹脂(epoxy)或封裝材。例如,於模壓製程前,可先進行塗膠(dispensing)作業以將該封裝層32塗佈於該電子元件31上,再以模具將該封裝層32壓製出所需之外觀。因此,有關該封裝層32之材質或形成方式並無特別限制。 In addition, the encapsulation layer 32 may be a film for a press-bonding process, an encapsulant for a molding process, or a paste for a printing process, and the material of the encapsulation layer 32 is polyimine (PI), dry film. (dry film), epoxy (epoxy) or packaging material. For example, prior to the molding process, a dispensing operation may be performed to apply the encapsulation layer 32 to the electronic component 31, and the encapsulation layer 32 is pressed to a desired appearance by a mold. Therefore, the material or formation of the encapsulating layer 32 is not particularly limited.

本發明之基板結構2之製法主要藉由該接地片220或該電源片221具有開孔222,以降低其所佔面積比例,因而能減少應力集中,故相較於習知技術,避免該基板結構2於後續製程中發生翹曲,亦即避免該電子封裝件3翹曲,令該接地片220與該電源片221能有效電性連接該電子元件31,進而提升良率及產品可靠度。 The substrate structure 2 of the present invention is mainly formed by the grounding strip 220 or the power strip 221 having an opening 222 to reduce the proportion of the area occupied thereby, thereby reducing stress concentration, so the substrate is avoided compared to the prior art. The structure 2 is warped in the subsequent process, that is, the electronic package 3 is prevented from being warped, so that the grounding strip 220 and the power strip 221 can be electrically connected to the electronic component 31, thereby improving yield and product reliability.

再者,考量該開孔222之設計可能影響電性,故藉由形成該填充材24於該開孔222中以增加耦合電容,使較高的耦合電容與較低之電感提供較佳之雜訊濾除,並降低如電源管理晶片(Power Management IC)之電子元件31之輸 出電壓突波,因而能提升良率及產品可靠度。例如,對地耦合電容可提升15%,寄生電感可降低16%。 Moreover, considering that the design of the opening 222 may affect electrical properties, the coupling capacitor is formed in the opening 222 to increase the coupling capacitance, so that the higher coupling capacitance and the lower inductance provide better noise. Filtering and reducing the output voltage surge of the electronic component 31, such as a Power Management IC, can improve yield and product reliability. For example, the coupling capacitance to ground can be increased by 15% and the parasitic inductance can be reduced by 16%.

本發明提供一種基板結構2,係包括:一線路部2a以及填充材24。所述之線路部2a係包含至少一介電層21及至少一線路層22,其中,該線路層22包含有至少一接地片220及/或至少一電源片221,且該接地片220或該電源片221係具有至少一開孔222。所述之填充材24係形成於該開孔222中。 The present invention provides a substrate structure 2 comprising a line portion 2a and a filler material 24. The circuit portion 2a includes at least one dielectric layer 21 and at least one circuit layer 22, wherein the circuit layer 22 includes at least one grounding strip 220 and/or at least one power strip 221, and the grounding strip 220 or the The power strip 221 has at least one opening 222. The filler 24 is formed in the opening 222.

於一實施例中,該接地片220與該電源片221之間具有間隙t。 In an embodiment, the grounding strip 220 and the power strip 221 have a gap t therebetween.

於一實施例中,該填充材24係為金屬材。 In one embodiment, the filler material 24 is a metal material.

於一實施例中,該填充材24復結合該接地片220或該電源片221。 In one embodiment, the filler 24 is combined with the grounding strip 220 or the power strip 221 .

本發明亦提供一種電子封裝件3,係包括:前述之基板結構2之任一實施例,以及設於該線路部2a上之電子元件31,且該電子元件31係電性連接該接地片220及/或該電源片221。 The present invention also provides an electronic package 3, comprising: any one of the foregoing substrate structures 2, and the electronic component 31 disposed on the circuit portion 2a, and the electronic component 31 is electrically connected to the grounding plate 220. And/or the power strip 221 .

於一實施例中,該電子封裝件3復包括一包覆該電子元件31之封裝層32。 In one embodiment, the electronic package 3 further includes an encapsulation layer 32 covering the electronic component 31.

綜上所述,本發明之電子封裝件暨基板結構及製法,係藉由該接地片或該電源片具有開孔之設計,以降低其所佔面積比例,因而能減少應力集中,避免該電子封裝件或該基板結構發生翹曲,因而該接地片與該電源片能有效電性連接該電子元件,進而提升良率及產品可靠度。 In summary, the electronic package and the substrate structure and the manufacturing method of the present invention are designed such that the grounding piece or the power supply sheet has an opening to reduce the proportion of the area occupied thereby, thereby reducing stress concentration and avoiding the electron. The package or the substrate structure is warped, so that the grounding piece and the power supply piece can be electrically connected to the electronic component, thereby improving yield and product reliability.

再者,藉由形成該填充材於該開孔中以改善耦合電容,故能提供較佳之雜訊濾除,並降低該電子元件之輸出電壓突波,因而能提升良率及產品可靠度。 Moreover, by forming the filling material in the opening to improve the coupling capacitance, it can provide better noise filtering and reduce the output voltage surge of the electronic component, thereby improving yield and product reliability.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.

Claims (14)

一種基板結構,係包括:一線路部,係包含至少一介電層及至少一線路層,其中,該線路層包含有至少一接地片及/或至少一電源片,且該接地片或該電源片形成有至少一開孔;以及填充材,係形成於該開孔中。  A substrate structure includes: a circuit portion including at least one dielectric layer and at least one circuit layer, wherein the circuit layer includes at least one grounding piece and/or at least one power supply piece, and the grounding piece or the power supply The sheet is formed with at least one opening; and a filler is formed in the opening.   如申請專利範圍第1項所述之基板結構,其中,該接地片與該電源片之間具有間隙。  The substrate structure of claim 1, wherein the grounding strip has a gap with the power strip.   如申請專利範圍第2項所述之基板結構,復包括形成於該線路部上之絕緣保護層。  The substrate structure according to claim 2, further comprising an insulating protective layer formed on the wiring portion.   如申請專利範圍第1項所述之基板結構,其中,形成該填充材之材質係為金屬。  The substrate structure according to claim 1, wherein the material forming the filler is a metal.   如申請專利範圍第1項所述之基板結構,其中,該填充材復結合於該接地片或該電源片上。  The substrate structure of claim 1, wherein the filler material is bonded to the grounding piece or the power supply sheet.   一種電子封裝件,係包括:如申請專利範圍第1至5項所述之其中一者之基板結構;以及電子元件,係設於該線路部上並電性連接該接地片及/或該電源片。  An electronic package comprising: a substrate structure according to any one of claims 1 to 5; and an electronic component disposed on the circuit portion and electrically connected to the grounding piece and/or the power supply sheet.   如申請專利範圍第6項所述之電子封裝件,復包括包覆該電子元件之封裝層。  The electronic package as claimed in claim 6 further comprising an encapsulation layer covering the electronic component.   一種基板結構之製法,係包括:提供一包含至少一介電層及至少一線路層之線路 部,其中,該線路層包含有至少一接地片及/或至少一電源片,且該接地片或該電源片形成有至少一開孔;以及形成填充材於該開孔中。  A substrate structure is provided, comprising: providing a circuit portion including at least one dielectric layer and at least one circuit layer, wherein the circuit layer comprises at least one grounding piece and/or at least one power supply piece, and the grounding piece or The power strip is formed with at least one opening; and a filler is formed in the opening.   如申請專利範圍第8項所述之基板結構之製法,其中,該接地片與該電源片之間具有間隙。  The method of fabricating a substrate structure according to claim 8, wherein the grounding strip has a gap with the power strip.   如申請專利範圍第9項所述之基板結構之製法,復包括形成絕緣保護層於該線路部上。  The method for fabricating a substrate structure according to claim 9 further comprises forming an insulating protective layer on the line portion.   如申請專利範圍第8項所述之基板結構之製法,其中,形成該填充材之材質係為金屬。  The method for fabricating a substrate structure according to claim 8, wherein the material for forming the filler is metal.   如申請專利範圍第8項所述之基板結構之製法,其中,該填充材復結合於該接地片或該電源片上。  The method of fabricating a substrate structure according to claim 8, wherein the filler material is combined with the grounding piece or the power supply sheet.   一種電子封裝件之製法,係包括:提供如申請專利範圍第8至12項所述之其中一者之基板結構;以及設置電子元件於該線路部上,並令該電子元件電性連接該接地片及/或該電源片。  An electronic package manufacturing method comprising: providing a substrate structure according to any one of claims 8 to 12; and disposing an electronic component on the circuit portion, and electrically connecting the electronic component to the ground Tablet and / or the power chip.   如申請專利範圍第13項所述之電子封裝件之製法,復包括形成用以包覆該電子元件之封裝層。  The method of manufacturing an electronic package according to claim 13 further comprising forming an encapsulation layer for coating the electronic component.  
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