TW201908531A - Cathodic electrolytic passivating treatment method for chromium-rich iron-based stainless steel elements forming a passivation film that is dense with corrosion resistant characteristic - Google Patents

Cathodic electrolytic passivating treatment method for chromium-rich iron-based stainless steel elements forming a passivation film that is dense with corrosion resistant characteristic

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TW201908531A
TW201908531A TW106123119A TW106123119A TW201908531A TW 201908531 A TW201908531 A TW 201908531A TW 106123119 A TW106123119 A TW 106123119A TW 106123119 A TW106123119 A TW 106123119A TW 201908531 A TW201908531 A TW 201908531A
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Taiwan
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chromium
stainless steel
based stainless
rich iron
oxide ceramic
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TW106123119A
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Chinese (zh)
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葛明德
呂承恩
張益誠
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德創奈米科技股份有限公司
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Priority to TW106123119A priority Critical patent/TW201908531A/en
Publication of TW201908531A publication Critical patent/TW201908531A/en

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Abstract

The present invention discloses a cathodic electrolytic passivating treatment method for chromium-rich iron-based stainless steel elements, which comprises utilizing an electrochemical electrolysis process on a surface of an iron-based stainless steel element containing 10% wt or more of chromium, using a product made of chromium-rich iron-based stainless raw material or chromium-rich iron-based stainless steel element as cathode, placing it in a trivalent chromium electrolytic solution, forming a passivation film by electrolysis on the surface under a working condition, wherein the passivation film is dense with corrosion resistant characteristic.

Description

富含鉻之鐵基不銹鋼元件陰極電解鈍化處理方法  Chromium-based iron-based stainless steel element cathode electrolytic passivation treatment method   【中文】  [Chinese]  

本發明係揭露一種,係在含10%wt以上鉻的鐵基不銹鋼元件的表面利用電化學電解方法,將富含鉻之鐵基不銹鋼元件原材或利用富含鉻之鐵基不銹鋼元件為材料之元件為陰極,置入一三價鉻電解液中,在一操作條件下,在其表面電解形成一鈍化膜,該鈍化膜為緻密且具有耐腐蝕特性。 The invention discloses a method for electrochemically electrolyzing a surface of an iron-based stainless steel component rich in chromium or using a chromium-rich iron-based stainless steel component on the surface of an iron-based stainless steel component containing 10% by weight or more of chromium. The component is a cathode, which is placed in a trivalent chromium electrolyte. Under a working condition, a passivation film is formed on the surface thereof, and the passivation film is dense and has corrosion resistance.

本發明係有關於一種富含鉻之鐵基不銹鋼元件陰極電解鈍化處理方法,特別是利用陰極電解在其表面電解形成一高度耐腐蝕的鈍化膜。 The invention relates to a method for cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element, in particular to electrolytically form a highly corrosion-resistant passivation film on the surface thereof by cathodic electrolysis.

富含鉻之鐵基不銹鋼是含有10%-30%wt以上鉻的鐵合金的總稱,或在工業上常簡稱為不銹鋼,不銹鋼不像普通鋼那樣容易腐蝕生鏽,主要原因為鋼材中的鉻一旦超過12%鉻,在其表面上,易與氧形成一層完整且緻密的抗蝕與耐熱氧化鉻保護膜,故可有效隔絕腐蝕向內進行,甚至有自行修復氧化鉻保護膜的能力,因而達到耐腐蝕的功能。當鉻含量10%wt以下則只可以在表面形成氧化膜保護而非不會氧化,這種鋼材常稱為 耐候鋼。 Chromium-rich iron-based stainless steel is a general term for iron alloys containing 10%-30% by weight of chromium, or industrially often referred to as stainless steel. Stainless steel is not as susceptible to corrosion and rust as ordinary steel. The main reason is that chromium in steel More than 12% chromium, on the surface, easy to form a complete and dense anti-oxidation and heat-resistant chromium oxide protective film with oxygen, so it can effectively insulate corrosion inward, and even have the ability to repair the chromium oxide protective film by itself, thus achieving Corrosion resistant function. When the chromium content is less than 10% by weight, only the oxide film can be formed on the surface instead of being oxidized. This steel is often called weathering steel.

不鏽鋼分為五大類:肥粒鐵、沃斯田鐵、麻田散鐵、析出硬化型及雙相型不鏽鋼。奧斯田鐵型不鏽鋼在主要元素為鐵之基材中,加入鉻(含量約16至25wt%)及鎳(含量約7至20wt%)而成。奧斯田鐵型不鏽鋼,有最佳的抗蝕能力,此鋼種在國際上常以300系稱之,佔了不鏽鋼全部使用量的70%。肥粒鐵型不鏽鋼主要元素僅有鐵及鉻,鉻含量約12至30wt%,國際上常以400系不鏽鋼稱之。由於合金元素少了鎳,故為較廉價的不鏽鋼,耐蝕性相對奧斯田鐵型不鏽鋼也較差,其中代表鋼種為430不鏽鋼,鉻含量約17wt%。麻田散鐵型不鏽鋼含鉻量約12至17wt%,含碳量約0.15至1.2wt%,為400系及500系不鏽鋼,基本型是410,其鉻含量約13wt%。麻田散鐵系不鏽鋼,具有高硬度、高強度及低價格之優點,但其延展性、耐蝕性較差。至於,析出硬化型不鏽鋼以17-7奧斯田鐵型不鏽鋼為基礎,添加少量鋁與銅合金元素,具有優良的強度、耐蝕性和切削性,適合製作航太工業等用途的高精度元件,國際上以600系不鏽鋼稱之。而雙相型不鏽鋼目的是為了克服沃斯田鐵型不鏽鋼容易在含氯環境下,產生應力腐蝕的缺點。此鋼種將鉻含量調整至24wt%;鎳含量調整至7wt%以上。 Stainless steel is divided into five categories: fat iron, Worth iron, Ma Tian iron, precipitation hardened and duplex stainless steel. The Osbane iron type stainless steel is formed by adding chromium (content of about 16 to 25 wt%) and nickel (content of about 7 to 20 wt%) to the base material of iron. Austin's iron-type stainless steel has the best resistance to corrosion. This steel is commonly used in the 300 series in the world, accounting for 70% of the total use of stainless steel. The main elements of the ferrite-type stainless steel are iron and chromium, and the chromium content is about 12 to 30% by weight. It is often referred to as 400 series stainless steel in the world. Since the alloying element is less nickel, it is a cheaper stainless steel, and the corrosion resistance is also inferior to that of the Osbane iron type stainless steel, wherein the representative steel type is 430 stainless steel, and the chromium content is about 17% by weight. The granulated stainless steel has a chromium content of about 12 to 17% by weight, a carbon content of about 0.15 to 1.2% by weight, a 400 series and a 500 series stainless steel, a basic type of 410, and a chromium content of about 13% by weight. Ma Tian loose iron stainless steel has the advantages of high hardness, high strength and low price, but its ductility and corrosion resistance are poor. As for the precipitation hardening type stainless steel, based on 17-7 Aosta iron type stainless steel, a small amount of aluminum and copper alloy elements are added, which has excellent strength, corrosion resistance and machinability, and is suitable for high-precision components for use in aerospace industry and the like. Internationally, it is called 600 series stainless steel. The purpose of the duplex stainless steel is to overcome the shortcomings of the Worthfield iron-type stainless steel which is prone to stress corrosion in a chlorine-containing environment. This steel grade adjusted the chromium content to 24% by weight; the nickel content was adjusted to 7 wt% or more.

不銹鋼鈍化處理(Stainless Passivation Treatment)為在不銹鋼表面形成一層很薄且透明的氧化層,特別是氧化鉻為主要的氧化物組成,使其可隔絕腐蝕環境,增加耐蝕能力,其鈍化製程應符合QQ-P-35C、ASTM A967-99、ASTM A380-99等規範需求。 Stainless Passivation Treatment is a thin and transparent oxide layer on the surface of stainless steel. In particular, chromium oxide is the main oxide composition, which can corrode the environment and increase the corrosion resistance. The passivation process should conform to QQ. -P-35C, ASTM A967-99, ASTM A380-99 and other specifications.

在QQ-P-35C中規範,對於大部分的不鏽鋼(如300系列)等 使用Type VI的鈍化處理方法,Type VI係使用約30%硝酸在溫度的催化作用下進行鈍化處理方法。又對於如含12~14%鉻的S440系列的不鏽鋼或S303、S430、S347、S416等使用Type II的鈍化處理方法,Type II係使用20%硝酸與2%重鉻酸鈉(鉀)在溫度的催化作用下進行鈍化處理方法。又對S303、304、321、420、430、440C也可使用檸檬酸進行鈍化。在實務上,Type VI處理因反應面積與溫度造成硝酸濃度快速變化,鈍化處理反應不易控制,常有難以通過鹽霧試驗及赤血鹽檢驗;而檸檬酸鈍化則受到僅能少數不鏽鋼材料才能使用的限制。在不鏽鋼鈍化處理較佳的生產效率、可控性及品質上,仍以使用鉻酸及重鉻酸鈉(鉀)為較佳(如前述的Type II處理),但鉻酸及重鉻酸鈉(鉀)存在有六價鉻(Cr6+)的問題,六價鉻毒性很大(大約是三價鉻的100倍以上),是一種很嚴重的致癌物,以六價鉻鍍鉻後所產生的廢水、生成物在自然界中不能自然降解與排除,在空氣中鉻濃度為0.15~0.3mg/m3時,會造成鼻中隔膜穿孔,飲用水中含鉻濃度在0.1mg/l以上時,就會使人嘔吐,侵害腸道和腎臟,且在生物體內會聚積,具有很長的危害潛伏期。世界各國政府均對六價鉻表面處理制定了相關的法律法規,逐步限制六價鉻的使用並降低其排放量,在許多產品更要求沒有六價鉻(Cr6+)以符合RoHS規定。 In the QQ-P-35C specification, for most of the stainless steel (such as 300 series) and other Type VI passivation treatment methods, Type VI uses about 30% nitric acid under the catalysis of temperature for passivation treatment. For Type S140 series stainless steel or S303, S430, S347, S416, etc. using Type II passivation treatment, Type II uses 20% nitric acid and 2% sodium dichromate (potassium) at temperature. The passivation treatment method is carried out under the catalysis. Further, it is also possible to passivate citric acid to S303, 304, 321, 420, 430, and 440C. In practice, Type VI treatment causes rapid changes in nitric acid concentration due to reaction area and temperature. Passivation treatment is difficult to control, and it is often difficult to pass salt spray test and red blood salt test. Citric acid passivation can only be used with only a few stainless steel materials. limits. In the better production efficiency, controllability and quality of stainless steel passivation treatment, it is better to use chromic acid and sodium dichromate (potassium) (as described in Type II above), but chromic acid and sodium dichromate (potassium) The problem of hexavalent chromium (Cr 6+ ), hexavalent chromium is very toxic (about 100 times more than trivalent chromium), is a very serious carcinogen, produced by hexavalent chromium plating The wastewater and products can not be naturally degraded and eliminated in nature. When the concentration of chromium in the air is 0.15~0.3mg/m3, it will cause perforation of the diaphragm in the nose. When the concentration of chromium in drinking water is above 0.1mg/l, it will It causes vomiting, invades the intestines and kidneys, and accumulates in living organisms, and has a long incubation period. Governments around the world have enacted relevant laws and regulations on the surface treatment of hexavalent chromium, gradually restricting the use of hexavalent chromium and reducing its emissions. In many products, there is no requirement for hexavalent chromium (Cr 6+ ) to comply with RoHS regulations.

金屬化陶瓷(metallic ceramic)係為非金屬元素滲雜有金屬元素共同形成的一種類陶瓷(Ceramic-like)結構的共構物,使其兼具有金屬特性與陶瓷特性,例如,有些共構物具有一般陶瓷的硬度與甚佳耐腐蝕性、或兼具有金屬光澤性與導電性、或兼具有黑色氧化物陶瓷的色澤等;台灣專利TW M498114、TW M501441、TW I456093、TW M487936及中國專利 CN201310239181.9等係揭露使用電鍍的方法(俗稱濕式法)在基材上形成金屬氧化物陶瓷層,如披覆氧化鉻鈷複合鍍層的電鍍層雖具有耐蝕性佳,但氧化鉻鈷複合鍍層之鍍層較厚且軟,且又為深黑色澤改變了外觀不易為現有機械產品容易取代。 A metallic ceramic is a ceramic-like structure of a non-metallic element impregnated with a metal element, which has both metallic and ceramic properties, for example, some co-construction. The material has the hardness of ordinary ceramics and very good corrosion resistance, or both metallic luster and electrical conductivity, or the color of black oxide ceramics; Taiwan patents TW M498114, TW M501441, TW I456093, TW M487936 and Chinese patent CN201310239181.9 et al. disclose the use of electroplating method (commonly known as wet method) to form a metal oxide ceramic layer on a substrate. For example, a plating layer coated with a chrome-cobalt-cobalt composite coating layer has good corrosion resistance, but chrome oxide cobalt The coating of the composite coating is thick and soft, and it is dark black, which changes the appearance and is not easy to replace with existing mechanical products.

鑑於前述的先前技術所揭露的技術,對於不銹鋼採用現有鈍化處理存在有實質上難以實施的困難,若採用氧化鉻鈷複合鍍層的電鍍層則又受限於鍍層較厚且軟,且又為深黑色澤改變了外觀,基於機械產業進步之未來趨勢前提下,實在有必要研發更新的技術、提出有效的具體的改善方案。本發明係基於前述的動機,利用電化學技術發展出具有緻密性高、良好的耐腐蝕性的陰極電解鈍化處理方法,應用於富含鉻之鐵基不銹鋼元件上,改善機械工業現有的生產瓶頸、以提高品質與產能,乃為迫切所需。 In view of the techniques disclosed in the foregoing prior art, there is a difficulty in implementing the passivation treatment for stainless steel, which is substantially difficult to implement. If the plating layer using the chrome-cobalt-cobalt composite coating is limited, the plating layer is thick and soft, and is deep. Black Ze has changed its appearance. Based on the future trend of the advancement of the machinery industry, it is necessary to develop newer technologies and propose effective and specific improvement plans. The invention is based on the aforementioned motive, and develops a cathode electrolytic passivation treatment method with high compactness and good corrosion resistance by using electrochemical technology, and is applied to a chromium-rich iron-based stainless steel component to improve the existing production bottleneck of the mechanical industry. To improve quality and productivity is an urgent need.

有鑑於上述習知技藝之問題,本發明主要目的為提供一種富含鉻之鐵基不銹鋼元件陰極電解鈍化處理,該富含鉻之鐵基不銹鋼元件係由一元件基材所製成,並在元件基材上以電鍍的方法,電鍍一層的鉻氧化物陶瓷鈍化層。其中元件基材之材料選自於鐵、鎳、鉻、鉬、銅、鋁之任意組合的合金,且鉻含量為10%wt以上。其中,鉻氧化物陶瓷鈍化層係以電鍍方法在元件基材上形成,係由鉻元素、氧元素、氫元素與磷元素所組成,係為非晶相結構;成份至少包含下列:鉻(Cr)、氧化鉻;其中,氧化鉻為三氧化二鉻(Cr2O3)、四氧化三鉻(Cr3O4)等。 In view of the above problems of the prior art, the main object of the present invention is to provide a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element which is made of a component substrate and A layer of chromium oxide ceramic passivation layer is electroplated on the component substrate by electroplating. The material of the element substrate is selected from the alloy of any combination of iron, nickel, chromium, molybdenum, copper and aluminum, and the chromium content is 10% by weight or more. The chromium oxide ceramic passivation layer is formed on the element substrate by electroplating, consisting of chromium element, oxygen element, hydrogen element and phosphorus element, and is an amorphous phase structure; the composition includes at least the following: chromium (Cr And chromium oxide; wherein, the chromium oxide is chromium oxide (Cr 2 O 3 ), chromium trioxide (Cr 3 O 4 ) or the like.

鉻氧化物陶瓷鈍化層係經由電鍍形成非晶相氧化鉻結構附著在該元件基材表面;該鉻氧化物陶瓷鈍化層係濕式電化學的電鍍方法, 在元件基材上電鍍披覆一層金屬化陶瓷(metallic ceramic)。 The chrome oxide ceramic passivation layer is adhered to the surface of the element substrate by electroplating to form an amorphous phase chromia structure; the chrome oxide ceramic passivation layer is a wet electrochemical plating method, and a metal layer is plated on the component substrate. Metallic ceramic.

其中,鉻氧化物陶瓷鈍化層的厚度為0.1~0.5μm,對於不同應用時厚度可為0.5~1.0μm以下;所電鍍上的鉻氧化物陶瓷鈍化層為白色至灰黑色間,其灰階值(gray value scale)(L%)為50至87之間;其中,灰階值係為量度黑色的程度,採用100個灰色色階,灰階的亮度從灰階值0(黑色)到灰階值99(白色)。其中,所謂鉻氧化物陶瓷鈍化層的厚度係指電鍍層的平均厚度,而非指特定量測點的厚度,以下相同,不再贅述。 The chromium oxide ceramic passivation layer has a thickness of 0.1 to 0.5 μm, and may have a thickness of 0.5 to 1.0 μm or less for different applications; the chromium oxide ceramic passivation layer on the plating is white to grayish black, and the gray scale value thereof is (gray value scale) (L%) is between 50 and 87; where the grayscale value is the degree of black measurement, using 100 gray scales, the grayscale brightness from grayscale value 0 (black) to grayscale The value is 99 (white). The thickness of the chrome oxide ceramic passivation layer refers to the average thickness of the plating layer, and does not refer to the thickness of the specific measurement point, which is the same as the following, and will not be described again.

鉻氧化物陶瓷鈍化層係由鉻元素、氧元素、氫元素與磷元素所組成的非晶相結構,含有較高含量比的三氧化二鉻(Cr2O3)、四氧化三鉻(Cr3O4),使鉻氧化物陶瓷鈍化層形成陶瓷化,該鍍層為淺灰色調,其灰階值(gray value scale)(L%)為50至87之間。 The chromium oxide ceramic passivation layer is composed of an amorphous phase structure composed of chromium element, oxygen element, hydrogen element and phosphorus element, and contains a high content ratio of chromium oxide (Cr 2 O 3 ) and chromium trioxide (Cr). 3 O 4 ), the chrome oxide ceramic passivation layer is ceramized, the plating layer is light gray tone, and its gray value scale (L%) is between 50 and 87.

本發明另一主要目的就為在提供一種以電化學製成鉻氧化物陶瓷鈍化層之富含鉻之鐵基不銹鋼元件的方法,解決習知技術之富含鉻之鐵基不銹鋼元件不耐候或難以鈍化處理等問題。包含下列步驟: S1:提供一富含鉻之鐵基不銹鋼元件,該富含鉻之鐵基不銹鋼元件的基材為一元件基材,該元件基材之材料選自於鐵、鎳、鉻、鉬、銅、鋁之任意組合的合金,且鉻含量為10%wt以上;在實際應用時,該元件基材即為待電鍍的富含鉻之鐵基不銹鋼元件或其一部份; S2:配置鉻氧化物陶瓷鈍化電鍍液,該鉻氧化物陶瓷鈍化電鍍液係包含:三價鉻鹽(trivalent chromium salt)、螯合劑(complex agent)及pH調節劑(pH conditioning agent)配成三價鉻電鍍液之水溶液;三價鉻鹽係提供三價鉻(Cr+3)離子與螯合劑產生螯合作用,pH調節劑作用在於穩定該鉻氧 化物陶瓷鈍化電鍍液的電化學特性、當產生電化學反應時可維持電離子電鍍的效率;其中,三價鉻主鹽可選用硫酸系三價鉻主鹽、氯酸系三價鉻主鹽其一或其組合;其中,該硫酸系三價鉻主鹽係包含三價鉻(Cr+3)與硫酸根(SO4-2)形成的化合物,如硫酸鉻(Cr2(SO4)3)、硫酸鉻銨(NH4Cr(SO4)2.12H2O)、硫酸鉻鉀(CrK(SO4)2.12H2O);該氯酸系三價鉻主鹽係三價鉻(Cr+3)與氯離子(Cl-)、過氯酸離子(ClO4-)兩者之一或其組合形成的化合物,如氯化鉻(CrCl3.6H2O)、過氯酸鉻(Cr(ClO4)3);該螯合劑係包含甲酸、甲酸鹽、乙酸、乙酸鹽類其一或其組合,如甲酸(HCOOH)、甲酸銨(HCOONH4)、甲酸鈉(HCOONa)、乙酸(CH3COOH)、乙酸銨(CH3COONH4)、乙酸鈉(CH3COONa)、乙酸鉀(CH3COOK)之一或其組合;該pH調節劑係包含硼酸鹽與銨鹽之組合,其中硼酸鹽係選自於硼酸、四硼酸鈉(Na2B4O7.10H2O)、過硼酸鈉(NaBO3.nH2O)其一或其組合;其中銨鹽係選自於硝酸銨(NH4NO3)、硫酸銨((NH4)2SO4)、氯化銨(NH4Cl)、硫酸氫銨(NH4HSO4)其一或其組合;該帄整劑係包含胺或醯胺,其中胺或醯胺係選自於乙二胺(C2H4(NH2)2)、二甲胺((CH3)2NH)、丙胺(C3H9N)、乙醯胺(CH3CONH2)、丙烯醯胺(CH2=CHCONH2)、苯甲醯胺(C6H5CONH2)其一或其組合。 Another main object of the present invention is to provide a method for electrochemically preparing a chromium-rich iron-based stainless steel component of a chromium oxide ceramic passivation layer, which solves the problem that the chromium-rich iron-based stainless steel component of the prior art is not weather resistant or It is difficult to passivate and other issues. The method comprises the following steps: S1: providing a chromium-rich iron-based stainless steel component, the substrate of the chromium-rich iron-based stainless steel component is an element substrate, and the material of the component substrate is selected from the group consisting of iron, nickel, chromium, An alloy of any combination of molybdenum, copper, and aluminum, and having a chromium content of 10% by weight or more; in practical applications, the element substrate is a chromium-rich iron-based stainless steel element to be plated or a part thereof; S2: Configuring a chromium oxide ceramic passivation plating solution comprising: a trivalent chromium salt, a complex agent, and a pH conditioning agent to form a trivalent chromium An aqueous solution of a plating solution; a trivalent chromium salt system provides sequestration of a trivalent chromium (Cr +3 ) ion with a chelating agent, and the pH adjusting agent functions to stabilize the electrochemical characteristics of the chromium oxide ceramic passivation plating solution, and to generate an electrochemical The efficiency of electro-ion plating can be maintained during the reaction; wherein the trivalent chromium main salt can be selected from a trivalent chromium main salt of sulfuric acid, a trivalent chromium main salt of chloric acid, or a combination thereof; wherein the sulfuric acid is trivalent chromium The main salt system contains trivalent chromium (Cr +3 ) and sulfur a compound formed by an acid group (SO4 -2 ) such as chromium sulfate (Cr 2 (SO 4 ) 3 ), ammonium chromium sulfate (NH 4 Cr(SO 4 ) 2 .12H 2 O), potassium chromium sulfate (CrK(SO 4 ) 2 ) .12H 2 O); the chloric acid-based trivalent chromium main salt is a compound formed by trivalent chromium (Cr +3 ) and one of chloride ion (Cl ) and perchloric acid ion (ClO 4 ) or a combination thereof. Such as chromium chloride (CrCl 3 .6H 2 O), chromium perchlorate (Cr (ClO 4 ) 3 ); the chelating agent comprises formic acid, formate, acetic acid, acetate, or a combination thereof, such as One or a combination of formic acid (HCOOH), ammonium formate (HCOONH 4 ), sodium formate (HCOONa), acetic acid (CH3COOH), ammonium acetate (CH3COONH 4 ), sodium acetate (CH3COONa), potassium acetate (CH3COOK), or a combination thereof; The invention comprises a combination of a borate and an ammonium salt, wherein the borate is selected from the group consisting of boric acid, sodium tetraborate (Na 2 B 4 O 7 .10H 2 O), sodium perborate (NaBO 3 . n H 2 O) or a combination thereof; wherein the ammonium salt is selected from the group consisting of ammonium nitrate (NH 4 NO 3 ), ammonium sulfate ((NH 4 ) 2 SO 4 ), ammonium chloride (NH 4 Cl), ammonium hydrogen sulfate (NH 4 HSO 4 ) Or a combination thereof; the conditioning agent comprises an amine or a guanamine, wherein the amine or guanamine is selected from ethylene diamine (C) 2 H 4 (NH 2 ) 2 ), dimethylamine ((CH 3 ) 2 NH), propylamine (C 3 H 9 N), acetamide (CH 3 CONH 2 ), acrylamide (CH 2 =CHCONH 2 And one or a combination of benzamidine (C 6 H 5 CONH 2 ).

為能電鍍出具有需求功能的電鍍層,三價鉻主鹽、螯合劑及pH調節劑應有適當的配方比例,較佳的,該鉻氧化物陶瓷鈍化電鍍液中該三價鉻主鹽之三價鉻(Cr+3)莫耳濃度為0.5~1.5M、與該螯合劑之碳元素莫耳濃度為0.5~0.8比1、與該pH調節劑之硼與銨合計莫耳濃度為1.7~4.5比1; S3:以電鍍方式,將該元件基材置為陰極,並浸入於鉻氧化物陶瓷鈍化電鍍液中;於一電鍍溫度條件與一電流密度條件下進行電鍍,於進行該電鍍時,係同時攪拌該鉻氧化物陶瓷鈍化電鍍液;經預定時間後,於該元件基材的導電層表面上形成該鉻氧化物陶瓷鈍化層;該電流密度條件範圍為30A/dm2至60A/dm2之間;其中,該電鍍溫度條件為操作設定溫度為45℃以下,較佳者電鍍溫度條件為所設定溫度之±3℃以內。 In order to electroplat the electroplated layer having the required function, the trivalent chromium main salt, the chelating agent and the pH adjuster should have a proper formulation ratio. Preferably, the trivalent chromium main salt in the chromium oxide ceramic passivation plating solution is used. The trivalent chromium (Cr +3 ) molar concentration is 0.5 to 1.5 M, the molar concentration of the carbon element of the chelating agent is 0.5 to 0.8, and the molar concentration of boron and ammonium of the pH adjusting agent is 1.7. 4.5 to 1; S3: electroplating, the element substrate is placed as a cathode, and immersed in a chromium oxide ceramic passivation plating solution; electroplating is performed under a plating temperature condition and a current density condition for performing the electroplating And simultaneously stirring the chromium oxide ceramic passivation plating solution; after a predetermined time, forming the chromium oxide ceramic passivation layer on the surface of the conductive layer of the element substrate; the current density condition ranges from 30 A/dm 2 to 60 A/ Between dm 2 ; wherein the plating temperature condition is an operation set temperature of 45 ° C or less, and preferably the plating temperature condition is within ± 3 ° C of the set temperature.

S4:將電鍍後的富含鉻之鐵基不銹鋼元件置入一氣氛烘箱中,該氣氛烘箱中係為真空、填充乾燥空氣或填充氮氣其一,較佳者,以填充富含氮氣的氣體,以利水氣排出。氣氛烘箱以一脫水溫度條件進行烘烤,該脫水溫度條件為165℃(含)以下,於該元件基材上形成鉻氧化物陶瓷鈍化層;所形成之鉻氧化物陶瓷鈍化層係為非晶相氧化鉻結構附著在該元件基材表面之全部或一部分,該非晶相氧化鉻結構至少包括係由鉻元素、氧元素、氫元素與磷元素所組成;成份至少包含下列:鉻(Cr)、氧化鉻;其中,氧化鉻為三氧化二鉻(Cr2O3)、四氧化三鉻(Cr3O4)等。。 S4: placing the plated chromium-rich iron-based stainless steel component in an atmosphere oven, which is vacuum, filled with dry air or filled with nitrogen gas, preferably to fill a nitrogen-rich gas, In order to facilitate the discharge of water. The atmosphere oven is baked at a dehydration temperature condition of 165 ° C or less to form a chromium oxide ceramic passivation layer on the element substrate; the formed chromium oxide ceramic passivation layer is amorphous The phase chromia structure is attached to all or a part of the surface of the element substrate, and the amorphous phase chromia structure comprises at least a chromium element, an oxygen element, a hydrogen element and a phosphorus element; the composition comprises at least the following: chromium (Cr), Chromium oxide; among them, chromium oxide is chromium oxide (Cr 2 O 3 ), chromium trioxide (Cr 3 O 4 ) or the like. .

在此特別說明,前述的三價鉻主鹽、螯合劑、pH調節劑所列舉的各化學藥品並非限制性,對於同屬三價鉻鹽、甲酸鹽、乙酸鹽、硼酸鹽、銨鹽、胺或醯胺、金屬鹽之其他化學藥品,經適當組合調整後若可達相同功能,都在本發明的範圍之內。 Herein, the various chemicals listed in the above-mentioned trivalent chromium main salt, chelating agent, and pH adjuster are not limited, and are the same trivalent chromium salt, formate, acetate, borate, ammonium salt, It is within the scope of the invention for the amine or guanamine, other chemicals of the metal salt to be able to achieve the same function if properly combined.

承上所述,依本發明之一種富含鉻之鐵基不銹鋼元件陰極電解鈍化處理,其可具有一或多個下述優點: In view of the above, a chromium-rich iron-based stainless steel element cathode electrolytic passivation treatment according to the present invention may have one or more of the following advantages:

(1)本發明的富含鉻之鐵基不銹鋼元件陰極電解鈍化處理,可將富含鉻之鐵基不銹鋼元件經電化學方法可形成緻密的氧化鉻,可取代 昔知的化學藥劑浸泡方法的鈍化處理等。 (1) The cathode electrolytic electrolytic passivation treatment of the chromium-rich iron-based stainless steel element of the present invention can electrochemically form a dense chromium oxide by using a chromium-rich iron-based stainless steel element, which can replace the chemical immersion method of the prior art. Passivation treatment, etc.

(2)富含鉻之鐵基不銹鋼元件陰極電解鈍化處理係可在任何不鏽鋼基材元件表面,形成高含氧量的鉻氧化物陶瓷鈍化層,藉由氧化物陶瓷化的非晶向結構(陶瓷特性),且藉由氧化物陶瓷化非晶向結構的緻密性與耐蝕特性,使富含鉻之鐵基不銹鋼元件可以增長使用壽命,達到耐腐蝕的機械元件的需求。 (2) Chromium-rich iron-based stainless steel element cathode electrolytic passivation treatment can form a high oxygen content chromium oxide ceramic passivation layer on the surface of any stainless steel substrate component, and an oxide-ceramic amorphous structure ( Ceramic properties), and by the oxidization of the amorphous structure of the amorphous structure and corrosion resistance, the chromium-rich iron-based stainless steel component can increase the service life and meet the demand of corrosion-resistant mechanical components.

(3)本發明的富含鉻之鐵基不銹鋼元件陰極電解鈍化處理,係採用三價鉻電鍍,其電鍍液及廢水為三價鉻不含六價鉻,三價鉻毒性遠低於六價鉻,可減少環境的負擔,為潔淨的產品並符合RoHS、REACH要求。 (3) The cathode electrolytic electrolytic passivation treatment of the chromium-rich iron-based stainless steel element of the invention adopts trivalent chromium plating, the plating solution and the waste water are trivalent chromium and do not contain hexavalent chromium, and the trivalent chromium is far less toxic than the six price. Chromium can reduce the burden on the environment, is a clean product and meets RoHS and REACH requirements.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本發明加以限制者。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.

1‧‧‧元件基材 1‧‧‧Component substrate

2‧‧‧手術刀 2‧‧‧Surgical knives

21‧‧‧機械組件 21‧‧‧Mechanical components

22‧‧‧水龍頭 22‧‧‧Water tap

3‧‧‧鉻氧化物陶瓷鈍化層 3‧‧‧Chromium oxide ceramic passivation layer

第1圖為本發明的富含鉻之鐵基不銹鋼元件陰極電解鈍化處理第一組實施例之示意圖;第2圖為本發明的富含鉻之鐵基不銹鋼元件陰極電解鈍化處理第二組實施例之示意圖;第3圖為本發明的富含鉻之鐵基不銹鋼元件陰極電解鈍化處理第三組實施例之示意圖。 1 is a schematic view showing a first group of embodiments of a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element of the present invention; and FIG. 2 is a second group of a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 3 is a schematic view showing a third embodiment of the cathodic electrolytic passivation treatment of the chromium-rich iron-based stainless steel element of the present invention.

有關本發明之前述及其他技術內容、特點與功效,在以下配 合參考圖式及實施例的詳細說明中,將可清楚的呈現。 The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the appended claims.

本發明之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理係使用電化學電鍍的方法製成,說明如下: S1:提供一富含鉻之鐵基不銹鋼元件,該富含鉻之鐵基不銹鋼元件的基材為不銹鋼,且鉻含量為10%wt以上; S2:配置鉻氧化物陶瓷鈍化電鍍液,該鉻氧化物陶瓷鈍化電鍍液係包含:三價鉻鹽(trivalent chromium salt)、螯合劑(complex agent)及pH調節劑(pH conditioning agent)配成三價鉻電鍍液之水溶液;對於不限制性的配方組成與操作條件,本發明的鉻氧化物陶瓷鈍化電鍍液的配方實施例如表一。 The cathodic electrolytic passivation treatment of the chromium-rich iron-based stainless steel element of the present invention is made by electrochemical plating, and is described as follows: S1: providing a chromium-rich iron-based stainless steel component, the chromium-rich iron-based stainless steel component The substrate is made of stainless steel and has a chromium content of 10% by weight or more; S2: a chromium oxide ceramic passivation plating solution comprising: a trivalent chromium salt, a chelating agent ( The complex agent and the pH conditioning agent are formulated into an aqueous solution of a trivalent chromium plating solution; for the non-limiting formulation and operating conditions, the formulation of the chromium oxide ceramic passivation plating solution of the present invention is as shown in Table 1.

以上濃度以M(mole/l)表示係以每升鉻氧化物陶瓷鈍化電鍍液之該純物質之莫耳數為計算,其不含不純物之質量;以下皆同。 The above concentration is expressed by M (mole/l) as the molar amount of the pure substance per liter of the chromium oxide ceramic passivation plating solution, which does not contain the mass of the impurity; the following are the same.

其中,三價鉻主鹽可選用硫酸系三價鉻主鹽、氯酸系三價鉻主鹽其一或其組合;其中,該硫酸系三價鉻主鹽係包含三價鉻(Cr+3)與硫酸根(SO4 -2)形成的化合物,如硫酸鉻(Cr2(SO4)3)、硫酸鉻銨(NH4Cr(SO4)2‧12H2O)、硫酸鉻鉀(CrK(SO4)2‧12H2O);該氯酸系三價鉻主鹽係三價鉻(Cr+3) 與氯離子(Cl-)、過氯酸離子(ClO4-)兩者之一或其組合形成的化合物,如氯化鉻(CrCl3.6H2O)、過氯酸鉻(Cr(ClO4)3) Wherein, the trivalent chromium main salt may be selected from a sulfuric acid trivalent chromium main salt, a chloric acid trivalent chromium main salt or a combination thereof; wherein the sulfuric acid trivalent chromium main salt system comprises trivalent chromium (Cr +3) ) a compound formed with sulfate (SO 4 -2 ), such as chromium sulfate (Cr 2 (SO 4 ) 3 ), ammonium ammonium sulfate (NH 4 Cr(SO 4 ) 2 ‧12H 2 O), potassium chromium sulfate (CrK) (SO 4 ) 2 ‧12H 2 O); the chloric acid-based trivalent chromium main salt is one of trivalent chromium (Cr +3 ) and chloride ion (Cl ) and perchlorate ion (ClO 4 ) or a compound formed by the combination, such as chromium chloride (CrCl 3 .6H 2 O), chromium perchlorate (Cr(ClO 4 ) 3 )

為能電鍍出具有需求功能的電鍍層,三價鉻主鹽、螯合劑及pH調節劑應有適當的配方比例,較佳的,該鉻氧化物陶瓷鈍化電鍍液中該三價鉻主鹽之三價鉻(Cr+3)莫耳濃度為0.5~1.5M、與該螯合劑之碳元素莫耳濃度為0.5~0.8比1、與該pH調節劑之硼與銨合計莫耳濃度為1.7~4.5比1; S3:以電鍍方式,將該元件基材置為陰極,並浸入於鉻氧化物陶瓷鈍化電鍍液中;於一電鍍溫度條件與一電流密度條件下進行電鍍,該電鍍溫度條件為操作設定溫度為45℃以下,較佳者電鍍溫度條件為所設定溫度之±3℃以內。 In order to electroplat the electroplated layer having the required function, the trivalent chromium main salt, the chelating agent and the pH adjuster should have a proper formulation ratio. Preferably, the trivalent chromium main salt in the chromium oxide ceramic passivation plating solution is used. The trivalent chromium (Cr +3 ) molar concentration is 0.5 to 1.5 M, the molar concentration of the carbon element of the chelating agent is 0.5 to 0.8, and the molar concentration of boron and ammonium of the pH adjusting agent is 1.7. 4.5 to 1; S3: electroplating, the element substrate is placed as a cathode, and immersed in a chromium oxide ceramic passivation plating solution; electroplating is performed under a plating temperature condition and a current density condition, and the plating temperature condition is The operation set temperature is 45 ° C or less, and preferably the plating temperature condition is within ± 3 ° C of the set temperature.

S4:將電鍍後的富含鉻之鐵基不銹鋼元件置入一氣氛烘箱中,該氣氛烘箱中係為真空、填充乾燥空氣或填充氮氣其一,較佳者,以填充富含氮氣的氣體,以利水氣排出。氣氛烘箱以一脫水溫度條件進行烘烤,該脫水溫度條件為165℃(含)以下,於該元件基材上形成鉻氧化物陶瓷鈍化層。 S4: placing the plated chromium-rich iron-based stainless steel component in an atmosphere oven, which is vacuum, filled with dry air or filled with nitrogen gas, preferably to fill a nitrogen-rich gas, In order to facilitate the discharge of water. The atmosphere oven is baked at a dehydration temperature condition of 165 ° C or less to form a chromium oxide ceramic passivation layer on the element substrate.

本發明以下實施例使用的元件基材1為鉻含量為10%wt以上的不銹鋼,此為實施例採行的方式之一,但不為所限。 The element substrate 1 used in the following examples of the present invention is a stainless steel having a chromium content of 10% by weight or more, which is one of the modes adopted in the examples, but is not limited thereto.

本發明之形成鉻氧化物陶瓷鈍化層3的鉻氧化物陶瓷鈍化電鍍液係包含:三價鉻主鹽、螯合劑、pH調節劑及帄整劑所形成之水溶液;為進行鉻氧化物陶瓷鈍化電鍍液的螯合作用,本發明之螯合劑可選用甲酸(HCOOH)、乙酸(CH3COOH)或其鹽類,如甲酸(HCOOH)、甲酸銨(HCOONH4)、甲酸鈉(HCOONa)、乙酸(CH3COOH)、乙酸銨 (CH3COONH4)、乙酸鈉(CH3COONa)、乙酸鉀(CH3COOK)之一或其組合,當提高螯合劑的相對濃度時,可增加鉻氧化物陶瓷鈍化層3的含氧量。 The chromium oxide ceramic passivation plating solution for forming the chromium oxide ceramic passivation layer 3 of the present invention comprises: an aqueous solution formed by a trivalent chromium main salt, a chelating agent, a pH adjuster and a tempering agent; For the chelation of the plating solution, the chelating agent of the present invention may be selected from formic acid (HCOOH), acetic acid (CH3COOH) or a salt thereof, such as formic acid (HCOOH), ammonium formate (HCOONH 4 ), sodium formate (HCOONa), acetic acid (CH3COOH). One or a combination of ammonium acetate (CH3COONH 4 ), sodium acetate (CH3COONa), potassium acetate (CH3COOK), or a combination thereof, increases the oxygen content of the chromium oxide ceramic passivation layer 3 when the relative concentration of the chelating agent is increased.

鉻氧化物陶瓷鈍化電鍍液之pH調節劑係做為調整電鍍液的用途,通常可使用解離度較低的鹽類,使其兼具有緩衝劑(buffer agent)的功能,常用的添加劑為無機酸的鹽類、銨鹽類、硼酸或其鹽類等,如硼酸鹽係選自於硼酸(H3BO3)、四硼酸鈉(Na2B4O7.10H2O)、過硼酸鈉(NaBO3.nH2O)其一或其組合;其中銨鹽係選自於硝酸銨(NH4NO3)、硫酸銨((NH4)2SO4)、氯化銨(NH4Cl)、硫酸氫銨(NH4HSO4)其一或其組合,當提高pH調節劑的相對濃度時,可提高鉻氧化物陶瓷鈍化層3的耐蝕性。 The pH adjuster of the chromium oxide ceramic passivation plating solution is used for adjusting the plating solution. Generally, a salt having a low degree of dissociation can be used, and the function of a buffer agent is also used. The commonly used additive is inorganic. Acid salts, ammonium salts, boric acid or salts thereof, such as borate selected from boric acid (H 3 BO 3 ), sodium tetraborate (Na 2 B 4 O 7 .10H 2 O), sodium perborate (NaBO 3 .nH 2 O) one or a combination thereof; wherein the ammonium salt is selected from ammonium nitrate (NH 4 NO 3 ), ammonium sulfate ((NH 4 ) 2 SO 4 ), ammonium chloride (NH 4 Cl) And one or a combination of ammonium hydrogen sulfate (NH 4 HSO 4 ), when the relative concentration of the pH adjuster is increased, the corrosion resistance of the chromium oxide ceramic passivation layer 3 can be improved.

在下列實施例係為本發明之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之各種實施例,但實際上的態樣不以此為限。 The following examples are various examples of the cathodic electrolytic passivation treatment of the chromium-rich iron-based stainless steel element of the present invention, but the actual aspect is not limited thereto.

<第一組實施例> <First Group of Embodiments>

請參見第1圖,第1圖為本發明的第一組實施例的示意圖,手術刀2的元件基材1為各種不銹鋼。配製電鍍製程之脫脂溶液、酸洗溶液、鉻氧化物陶瓷鈍化電鍍液;脫脂溶液的目的為去除元件基材1表面上的油脂,可採用有機溶劑、中性脫脂劑、鹼性脫脂劑或酸性脫脂劑;酸洗溶液的目的為去除元件基材1表面上的氧化物並使元件基材1的表面活化,可採用稀硫酸、稀鹽酸、稀硝酸、稀磷酸或其混合之酸液;在此說明,對於不同的元件基材1表面狀況,脫脂與酸洗並非必要的處理程序。 1 is a schematic view of a first set of embodiments of the present invention. The component substrate 1 of the scalpel 2 is various stainless steels. The degreasing solution, the pickling solution and the chromium oxide ceramic passivation plating solution of the electroplating process are prepared; the purpose of the degreasing solution is to remove the grease on the surface of the component substrate 1, and an organic solvent, a neutral degreasing agent, an alkaline degreasing agent or an acid may be used. a degreasing agent; the purpose of the pickling solution is to remove the oxide on the surface of the element substrate 1 and activate the surface of the element substrate 1, and dilute sulfuric acid, dilute hydrochloric acid, dilute nitric acid, dilute phosphoric acid or a mixed acid solution thereof may be used; This shows that for different surface conditions of the component substrate 1, degreasing and pickling are not necessary processing procedures.

接著,以電鍍的方法在元件基材1表面的全部或一部份上形成鉻氧化物陶瓷鈍化層3,以製成富含鉻之鐵基不銹鋼元件2。由於係採用前述的鉻氧化物陶瓷鈍化電鍍液,在適當操作條件下,可形成氧化鉻基之 鉻氧化物陶瓷鈍化層3;在電鍍之前,對於不電鍍鉻氧化物陶瓷鈍化層3的部份,則可使用防鍍漆、防鍍蓋、防鍍塞等工具,將不電鍍鉻氧化物陶瓷鈍化層3的部份先行遮蔽。在本實施例中,經分析後,所形成的鉻氧化物陶瓷鈍化層3係經由電鍍形成非晶相氧化鉻結構,附著在元件基材1表面,鉻氧化物陶瓷鈍化層3成份係由主要包含鉻元素、氧元素、磷元素等所組成,形成非晶相氧化鉻結構。如第2圖,係本組實施例之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理1之示意圖,在本組實施例的鉻氧化物陶瓷鈍化電鍍液係使用表一之配方,但不以此為限。 Next, a chromium oxide ceramic passivation layer 3 is formed on all or a part of the surface of the element substrate 1 by electroplating to form a chromium-rich iron-based stainless steel element 2. Since the chromium oxide ceramic passivation plating solution is used, a chromium oxide-based chromium oxide ceramic passivation layer 3 can be formed under appropriate operating conditions; for electroless plating of the chromium oxide ceramic passivation layer 3 before electroplating Then, a portion of the non-electroplated chrome oxide ceramic passivation layer 3 may be shielded first by using a tool such as anti-painting, anti-plating, and anti-plating. In this embodiment, after analysis, the formed chromium oxide ceramic passivation layer 3 is formed by electroplating to form an amorphous phase chromia structure, which is attached to the surface of the element substrate 1, and the chromium oxide ceramic passivation layer 3 is mainly composed of It consists of chromium, oxygen, and phosphorus to form an amorphous phase chromia structure. As shown in Fig. 2, it is a schematic diagram of the cathodic electrolytic passivation treatment 1 of the chromium-rich iron-based stainless steel element of the present embodiment. In the chromium oxide ceramic passivation plating solution of the present embodiment, the formulation of Table 1 is used, but not This is limited.

<第二組實施例> <Second Group of Embodiments>

請參見第2圖,第2圖為本發明的第二組實施例的示意圖,航太機械組件21的元件基材1為各種不銹鋼。在本組實施例的鉻氧化物陶瓷鈍化電鍍液係使用表一之配方,在此不再重複列出。 Please refer to FIG. 2, which is a schematic view of a second set of embodiments of the present invention. The component substrate 1 of the aerospace mechanical component 21 is various stainless steels. The chromium oxide ceramic passivation plating solution in the examples of the present embodiment uses the formulation of Table 1, and will not be repeatedly listed here.

本組實施例之披覆鉻氧化物陶瓷鈍化層3之富含鉻之鐵基不銹鋼元件1,係經由電鍍形成鉻氧化物陶瓷鈍化層3附著在元件基材1上,製成航太機械組件21,所形成的鉻氧化物陶瓷鈍化層3係經由電鍍形成非晶相 氧化鉻結構,附著在元件基材1表面,鉻氧化物陶瓷鈍化層3成份係由主要包含鉻元素、氧元素、磷元素等所組成。 The chromium-rich iron-based stainless steel element 1 of the chrome oxide ceramic passivation layer 3 of the present embodiment is attached to the element substrate 1 by electroplating to form a chromium oxide ceramic passivation layer 3, and is made into aerospace mechanical component. 21, the formed chromium oxide ceramic passivation layer 3 is formed by electroplating to form an amorphous phase chromia structure, attached to the surface of the element substrate 1, and the chromium oxide ceramic passivation layer 3 consists mainly of chromium, oxygen, and phosphorus. Elements such as elements.

<第三組實施例> <Third Group Embodiment>

如第3圖,係本組實施例之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理1之示意圖,係以衛浴水龍頭22為實施例,在本組實施例的鉻氧化物陶瓷鈍化電鍍液係使用表一之配方,在此不再重複列出。 As shown in Fig. 3, it is a schematic diagram of the cathodic electrolytic passivation treatment 1 of the chromium-rich iron-based stainless steel element of the present embodiment, which is based on the bathroom faucet 22, and the chromium oxide ceramic passivation plating system in the present embodiment. Use the formula of Table 1 and it will not be repeated here.

以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。 The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the spirit and scope of the invention are intended to be included in the scope of the appended claims.

Claims (7)

一種富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,用於一富含鉻之鐵基不銹鋼元件之元件基材上披覆一鉻氧化物陶瓷鈍化層,係包含下列步驟:提供一富含鉻之鐵基不銹鋼元件,該富含鉻之鐵基不銹鋼元件的基材為一元件基材,該元件基材之材料選自於鐵、鎳、鉻、鉬、銅、鋁之任意組合的合金,且鉻含量為10%wt以上;以該富含鉻之鐵基不銹鋼元件為陰極,並浸入於一鉻氧化物陶瓷鈍化電鍍液中;以電鍍方式於一電鍍溫度條件與一電流密度條件下進行電鍍,於該元件基材上形成一鉻氧化物陶瓷鈍化層;其中,該鉻氧化物陶瓷鈍化電鍍液至少包含:一三價鉻主鹽、一螯合劑及一pH調節劑所形成之水溶液;其中,該三價鉻主鹽為一硫酸系三價鉻主鹽或一氯酸系三價鉻主鹽兩者之一或其組合;其中,該硫酸系三價鉻主鹽係包含三價鉻(Cr +3)與硫酸根(SO 4 -2)形成的化合物,該氯酸系三價鉻主鹽係包含三價鉻(Cr +3)與氯離子(Cl -)、過氯酸離子(ClO 4 -)兩者之一或其組合形成的化合物;其中該pH調節劑係包含硼酸鹽與銨鹽之組合;其中,該鉻氧化物陶瓷鈍化電鍍液中該三價鉻主鹽之三價鉻(Cr +3)莫耳濃度為0.5~1.5M、與該螯合劑之碳元素莫耳濃度為0.5~0.8比1、與該pH調節劑之硼與銨合計莫耳濃度為1.7~4.5比1;其中,該電鍍溫度條件為45℃以下,該電流密度條件為30~60A/dm 2; 該鉻氧化物陶瓷鈍化層係由鉻元素、氧元素、氫元素與磷元素所組成,係為非晶相氧化鉻結構附著在該元件基材表面之全部或一部分。 A method for manufacturing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel component for coating a chromium oxide ceramic passivation layer on a component substrate of a chromium-rich iron-based stainless steel component, comprising the steps of: providing a a chromium-rich iron-based stainless steel component, the substrate of the chromium-rich iron-based stainless steel component is an element substrate, and the material of the component substrate is selected from any combination of iron, nickel, chromium, molybdenum, copper, and aluminum. Alloy having a chromium content of 10% by weight or more; using the chromium-rich iron-based stainless steel element as a cathode and immersing in a chromium oxide ceramic passivation plating solution; electroplating at a plating temperature condition and a current density Electroplating is performed to form a chromium oxide ceramic passivation layer on the element substrate; wherein the chromium oxide ceramic passivation plating solution comprises at least: a trivalent chromium main salt, a chelating agent and a pH adjusting agent. An aqueous solution; wherein the trivalent chromium main salt is one of or a combination of a monosulfate trivalent chromium main salt or a monochloro acid trivalent chromium main salt; wherein the sulfuric acid trivalent chromium main salt system comprises trivalent chromium (Cr +3) and sulfur (SO 4 -2) compound formed roots, the trivalent chromium-based acid salt-based master comprising trivalent chromium (Cr +3) and chloride ions (Cl -), perchlorate ion (ClO 4 -) of both a compound formed by one or a combination thereof; wherein the pH adjuster comprises a combination of a borate and an ammonium salt; wherein the trivalent chromium (Cr +3 ) of the trivalent chromium main salt in the chromium oxide ceramic passivation plating solution The concentration of the ear is 0.5 to 1.5 M, the molar concentration of the carbon element of the chelating agent is 0.5 to 0.8, and the molar concentration of boron and ammonium of the pH adjusting agent is 1.7 to 4.5 to 1; wherein the plating temperature is The condition is 45 ° C or less, and the current density condition is 30 to 60 A/dm 2 ; the chromium oxide ceramic passivation layer is composed of chromium element, oxygen element, hydrogen element and phosphorus element, and is an amorphous phase chromium oxide structure adhesion. All or part of the surface of the component substrate. 如申請專利範圍第1項所述之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,更進一步於電鍍後置入一氣氛烘箱中以一脫水溫度條件進行烘烤;其中,該氣氛烘箱中係為真空、填充乾燥空氣或填充氮氣其一;其中該脫水溫度條件為165℃(含)以下。  The method for manufacturing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element according to claim 1 is further placed in an atmosphere oven after electroplating to be baked at a dehydration temperature condition; wherein the atmosphere The oven is vacuum, filled with dry air or filled with nitrogen; wherein the dehydration temperature condition is 165 ° C or less.   如申請專利範圍第1項所述之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,其中該鉻氧化物陶瓷鈍化層成份至少包含下列:鉻(Cr)、氧化鉻;其中,氧化鉻為三氧化二鉻(Cr 2O 3)、四氧化三鉻(Cr 3O 4)。 The method for manufacturing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element according to claim 1, wherein the chromium oxide ceramic passivation layer component comprises at least the following: chromium (Cr), chromium oxide; wherein, oxidation Chromium is chromium oxide (Cr 2 O 3 ) or chromium trioxide (Cr 3 O 4 ). 如申請專利範圍第1項所述之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,其中該螯合劑係包含甲酸、甲酸鹽、乙酸、乙酸鹽類其一或其組合。  The method for producing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element according to claim 1, wherein the chelating agent comprises one of formic acid, formate, acetic acid, acetate, or a combination thereof.   如申請專利範圍第1項所述之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,其中硼酸鹽係選自於硼酸(HBO 3)、四硼酸鈉(Na 2B 4O 7.10H 2O)、過硼酸鈉(NaBO 3.nH 2O)其一或其組合;其中銨鹽係選自於硝酸銨(NH 4NO 3)、硫酸銨((NH 4) 2SO 4)、氯化銨(NH 4Cl)、硫酸氫銨(NH 4HSO 4)其一或其組合。 The method for producing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element according to claim 1, wherein the borate is selected from the group consisting of boric acid (HBO 3 ) and sodium tetraborate (Na 2 B 4 O 7 ) . 10H 2 O), sodium perborate (NaBO 3 .nH 2 O) or a combination thereof; wherein the ammonium salt is selected from ammonium nitrate (NH 4 NO 3 ), ammonium sulfate ((NH 4 ) 2 SO 4 ), One or a combination of ammonium chloride (NH 4 Cl), ammonium hydrogen sulfate (NH 4 HSO 4 ). 如申請專利範圍第1項所述之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,其中,該鉻氧化物陶瓷鈍化層的厚度為0.1~1.0μm。  The method for producing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element according to claim 1, wherein the chromium oxide ceramic passivation layer has a thickness of 0.1 to 1.0 μm.   如申請專利範圍第1項所述之富含鉻之鐵基不銹鋼元件陰極電解鈍化處理之製造方法,其中,該鉻氧化物陶瓷鈍化層灰階值(gray value scale)(L%)為50至87之間。  The method for producing a cathodic electrolytic passivation treatment of a chromium-rich iron-based stainless steel element according to claim 1, wherein the chromium oxide ceramic passivation layer has a gray value scale (L%) of 50 to Between 87.  
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