TW201901866A - Method for manufacturing hermetic package and hermetic package - Google Patents

Method for manufacturing hermetic package and hermetic package Download PDF

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Publication number
TW201901866A
TW201901866A TW107116718A TW107116718A TW201901866A TW 201901866 A TW201901866 A TW 201901866A TW 107116718 A TW107116718 A TW 107116718A TW 107116718 A TW107116718 A TW 107116718A TW 201901866 A TW201901866 A TW 201901866A
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sealing material
material layer
glass
less
sealing
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TW107116718A
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Chinese (zh)
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白神徹
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日商日本電氣硝子股份有限公司
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Publication of TW201901866A publication Critical patent/TW201901866A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/06Containers; Seals characterised by the material of the container or its electrical properties
    • H01L23/08Containers; Seals characterised by the material of the container or its electrical properties the material being an electrical insulator, e.g. glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/10Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action

Abstract

This method for producing a hermetic package is characterized by comprising: a step for preparing a ceramic substrate and forming a first sealing material layer on the ceramic substrate; a step for preparing a glass cover and forming a second sealing material layer on the glass cover; a step for laminating the ceramic substrate and the glass cover upon each other so that the first sealing material layer and the second sealing material layer are in contact with each other; and a step for obtaining a hermetic package by hermetically sealing the first sealing material layer and the second sealing material layer against each other by irradiating the first sealing material layer and the second sealing material layer with laser light from the glass cover side, thereby softening and deforming the first sealing material layer and the second sealing material layer.

Description

氣密封裝體之製造方法及氣密封裝體Manufacturing method of hermetically sealed body and hermetically sealed body

本發明涉及氣密封裝體之製造方法及氣密封裝體,具體而言涉及透過利用雷射光之下的密封處理(以下稱為雷射密封)從而將陶瓷基體與玻璃蓋進行氣密密封的氣密封裝體之製造方法及以該方法製作的氣密封裝體。The present invention relates to a method of manufacturing a gas-tight package and a gas-tight package, in particular, to a gas-tight seal between a ceramic substrate and a glass cover through a sealing process using laser light (hereinafter referred to as a laser seal) A manufacturing method of a sealed package and a gas-sealed package manufactured by this method.

氣密封裝體一般而言具備:陶瓷基體、透光性的玻璃蓋、收容於該等之內部的內部元件。The gas-tight package generally includes a ceramic base, a light-transmissive glass cover, and internal components housed in these.

安裝於氣密封裝體的內部的感測器晶片等的內部元件存在因從周圍環境浸入的水分而劣化之虞。迄今為止,為了將陶瓷基體與玻璃蓋一體化,使用具有低溫硬化性的有機樹脂系黏合劑。然而,有機樹脂系黏合劑無法完全遮蔽水分、氣體,故存在歷時使內部元件劣化之虞。Internal elements such as a sensor wafer mounted inside the airtight package may deteriorate due to moisture immersed from the surrounding environment. To date, in order to integrate the ceramic substrate and the glass cover, an organic resin-based adhesive having low-temperature hardening properties has been used. However, organic resin-based adhesives cannot completely shield moisture and gas, so there is a possibility of deteriorating internal components over time.

另一方面,使用包含玻璃粉末與耐火性填料粉末的密封材料時,密封部分不易因周圍環境的水分而劣化,易於確保氣密封裝體的氣密可靠性。On the other hand, when a sealing material containing glass powder and refractory filler powder is used, the sealing portion is not easily deteriorated by moisture in the surrounding environment, and it is easy to ensure the airtight reliability of the airtight package.

然而,玻璃粉末軟化溫度比有機樹脂系黏合劑高,故存在於密封時使內部元件熱劣化之虞。基於此等情事,近年來,雷射密封受到注目。依雷射密封時,可僅局部加熱應密封的部分,可在不會使內部元件熱劣化之下,將陶瓷基體與玻璃蓋氣密一體化。 [先前技術文獻] [專利文獻]However, the softening temperature of the glass powder is higher than that of the organic resin-based adhesive, so there is a possibility of thermally deteriorating internal components during sealing. Based on these circumstances, the laser seal has attracted attention in recent years. When sealing by laser, only the part to be sealed can be heated locally, and the ceramic substrate and the glass cover can be air-tightly integrated without thermally deteriorating internal components. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開2013-239609號公報   [專利文獻2]日本特開2014-236202號公報[Patent Literature 1] Japanese Patent Application Publication No. 2013-239609 [Patent Literature 2] Japanese Patent Application Publication No. 2014-236202

[發明所欲解決之問題][Problems to be solved by the invention]

另外,將陶瓷基體與玻璃蓋進行雷射密封的情況下,比起將玻璃基體與玻璃蓋進行雷射密封的情況,陶瓷基體的熱導度高,雷射密封時陶瓷基體的溫度不易上升,故密封材料層與陶瓷基體不易反應,存在不易確保雷射密封強度如此的問題。In addition, in the case of laser sealing the ceramic substrate and the glass cover, the thermal conductivity of the ceramic substrate is higher than in the case of laser sealing the glass substrate and the glass cover, and the temperature of the ceramic substrate during laser sealing is unlikely to rise Therefore, the sealing material layer does not easily react with the ceramic substrate, and there is such a problem that it is difficult to ensure the laser sealing strength.

另一方面,提高雷射光的輸出時,雖可提高密封材料層與陶瓷基體的反應性,惟此情況下,於玻璃蓋在與局部加熱的密封材料層相接的部分與局部未加熱的部分產生大的溫度差,故玻璃蓋容易因熱衝擊而破損,產生無法確保氣密封裝體內的氣密可靠性如此的問題。On the other hand, when the output of laser light is increased, although the reactivity of the sealing material layer and the ceramic substrate can be improved, in this case, the portion of the glass cover that is in contact with the locally heated sealing material layer and the partially unheated portion A large temperature difference occurs, so the glass cover is easily damaged by thermal shock, and there is a problem that the airtight reliability of the airtight package cannot be ensured.

所以,本發明係鑒於上述情況而創作者,其技術課題係發明一種氣密封裝體之製造方法,可在將陶瓷基體與玻璃蓋進行雷射密封的情況下,使雷射密封強度與氣密可靠性以高水平同時成立。 [解決問題之技術手段]Therefore, the present invention was created in view of the above circumstances, and its technical subject is to invent a method of manufacturing a hermetically sealed body, which can make the laser sealing strength and airtight when the ceramic substrate and the glass cover are laser sealed Reliability is established at a high level at the same time. [Technical means to solve the problem]

本發明人銳意檢討的結果,發現在以下情況下可解決上述技術課題因而提出本發明:在陶瓷基體上形成第一密封材料層,在玻璃蓋上形成第二密封材料層後,在使第一密封材料層與第二密封材料層接觸的狀態進行雷射密封。亦即,本發明的氣密封裝體之製造方法具備以下程序:準備陶瓷基體,並在陶瓷基體上形成第一密封材料層;準備玻璃蓋,並在玻璃蓋上形成第二密封材料層;以第一密封材料層與第二密封材料層接觸方式,將陶瓷基體與玻璃蓋進行層積配置;從玻璃蓋側照射雷射光,使第一密封材料層與第二密封材料層軟化變形,從而將第一密封材料層與第二密封材料層進行氣密密封,獲得氣密封裝體。As a result of a keen review of the inventors, the inventors found that the above technical problems can be solved under the following circumstances and therefore proposed the present invention: after forming the first sealing material layer on the ceramic substrate and forming the second sealing material layer on the glass cover, after making the first Laser sealing is performed in a state where the sealing material layer is in contact with the second sealing material layer. That is, the manufacturing method of the gas-tight package of the present invention includes the following procedures: preparing a ceramic substrate and forming a first sealing material layer on the ceramic substrate; preparing a glass cover and forming a second sealing material layer on the glass cover; The first sealing material layer is in contact with the second sealing material layer, and the ceramic substrate and the glass cover are laminated; the laser light is irradiated from the glass cover side to soften and deform the first sealing material layer and the second sealing material layer. The first sealing material layer and the second sealing material layer are hermetically sealed to obtain an airtight package.

本發明的氣密封裝體之製造方法係在陶瓷基體上形成第一密封材料層,在玻璃蓋上形成第二密封材料層後,在使第一密封材料層與第二密封材料層接觸的狀態進行雷射密封。作成如此時,在雷射密封前,透過電爐燒成等在陶瓷基體與玻璃蓋上形成密封材料層,故可於陶瓷基體的表層形成強固的反應層,並可於玻璃蓋的表層亦形成強固的反應層。此外在雷射密封時第一密封材料層與第二密封材料層雙方軟化流動而熔合,故可易於將陶瓷基體與玻璃蓋氣密一體化。再者可將雷射密封時的局部加熱溫度低溫化,故不僅玻璃蓋不易因熱衝擊而破損,亦可減輕對內部元件因熱導而傳播的熱。結果方面,可同時提高氣密封裝體的雷射密封強度與氣密可靠性,且可防止內部元件的熱劣化。The manufacturing method of the gas-tight package of the present invention is to form a first sealing material layer on a ceramic substrate and a second sealing material layer on a glass cover, and then make the first sealing material layer contact with the second sealing material layer Perform laser sealing. In this case, before the laser sealing, a sealing material layer is formed on the ceramic substrate and the glass cover by electric furnace firing, etc., so a strong reaction layer can be formed on the surface layer of the ceramic substrate, and a strong layer can also be formed on the surface layer of the glass cover Of the reaction layer. In addition, during laser sealing, both the first sealing material layer and the second sealing material layer soften and flow to fuse, so it is easy to integrate the ceramic substrate and the glass cover in an airtight manner. Furthermore, the local heating temperature during laser sealing can be lowered, so that not only the glass cover is not easily damaged by thermal shock, but also the heat transmitted to the internal components due to thermal conduction can be reduced. As a result, the laser sealing strength and airtight reliability of the airtight package can be improved at the same time, and the thermal degradation of internal components can be prevented.

此外,本發明的氣密封裝體之製造方法係優選上,第一密封材料層含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上,且第二密封材料層含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上。鉍系玻璃,尤其在玻璃組成中包含過渡金屬氧化物的鉍系玻璃係比起其他玻璃系,具有在雷射密封之際容易於陶瓷基體的表層形成反應層如此的特點。此外,將耐火性填料粉末導入時,可提高密封材料層的機械強度,且可使密封材料層的熱脹係數降低。磷酸銀系玻璃及碲系玻璃係與鉍系玻璃比較下,易於在低溫下軟化流動,可減低在雷射密封後發生的熱應變,故具有提高熱可靠性及機械可靠性如此的特點。再者,磷酸銀系玻璃與碲系玻璃係如同鉍系玻璃,混合耐火性填料粉末時,可提高密封材料層的機械強度,且可使密封材料層的熱脹係數降低。於此,「鉍系玻璃」指以Bi2 O3 為主成分的玻璃,具體而言指在玻璃組成中包含25莫耳%以下的Bi2 O3 的玻璃。「磷酸銀系玻璃」指以Ag2 O與P2 O5 為主成分的玻璃,具體而言指在玻璃組成中合量下包含25莫耳%以上的Ag2 O與P2 O5 的玻璃。「碲系玻璃」指以TeO2 為主成分的玻璃,具體而言指玻璃組成中含有20莫耳%以上的TeO2 的玻璃。In addition, the method for manufacturing the gas-tight package of the present invention is preferably that the first sealing material layer contains any one or more of bismuth glass, silver phosphate glass, and tellurium glass, and the second sealing material layer contains bismuth glass , Any one or more of silver phosphate-based glass and tellurium-based glass. Bismuth-based glass, especially bismuth-based glass containing transition metal oxides in the glass composition, has a characteristic that it is easier to form a reaction layer on the surface layer of the ceramic substrate when laser sealing. In addition, when the refractory filler powder is introduced, the mechanical strength of the sealing material layer can be improved, and the coefficient of thermal expansion of the sealing material layer can be reduced. Compared with bismuth glass, silver phosphate glass and tellurium glass are easy to soften and flow at low temperature, which can reduce the thermal strain after laser sealing, so it has the characteristics of improving thermal reliability and mechanical reliability. Furthermore, silver phosphate-based glass and tellurium-based glass are similar to bismuth-based glass. When the refractory filler powder is mixed, the mechanical strength of the sealing material layer can be improved, and the thermal expansion coefficient of the sealing material layer can be reduced. Here, "bismuth-based glass" refers to a glass containing Bi 2 O 3 as a main component, and specifically refers to a glass containing Bi 2 O 3 of 25 mol% or less in the glass composition. "Silver phosphate-based glass" refers to glass containing Ag 2 O and P 2 O 5 as the main components, specifically, glass containing 25 mol% or more of Ag 2 O and P 2 O 5 in the total amount of the glass composition . "Tellurium-based glass" refers to glass containing TeO 2 as a main component, and specifically refers to glass containing TeO 2 in an amount of 20 mol% or more in the glass composition.

此外,本發明的氣密封裝體之製造方法係優選上,將第一密封材料層的平均厚度限制為不足8.0μm,將第二密封材料層的平均厚度限制為不足8.0μm,且將第一密封材料層的平均厚度與第二密封材料層的平均厚度的合計限制為不足15.0μm。作成如此時,可減小在雷射密封後的氣密封裝體內的殘留應力,故可提高氣密封裝體的氣密可靠性。In addition, the method of manufacturing the gas-tight package of the present invention preferably limits the average thickness of the first sealing material layer to less than 8.0 μm, limits the average thickness of the second sealing material layer to less than 8.0 μm, and limits the first The total thickness of the average thickness of the sealing material layer and the average thickness of the second sealing material layer is limited to less than 15.0 μm. In this case, the residual stress in the air-tight package after laser sealing can be reduced, so the air-tight reliability of the air-tight package can be improved.

此外,本發明的氣密封裝體之製造方法係優選上,將第一密封材料層的平均寬度限制為不足2000μm,且將第二密封材料層的平均寬度限制為不足2000μm。作成如此時,可減小在雷射密封後的氣密封裝體內的殘留應力,故可提高氣密封裝體的氣密可靠性。In addition, the method of manufacturing the gas-sealed package of the present invention preferably limits the average width of the first sealing material layer to less than 2000 μm, and limits the average width of the second sealing material layer to less than 2000 μm. In this case, the residual stress in the air-tight package after laser sealing can be reduced, so the air-tight reliability of the air-tight package can be improved.

此外,本發明的氣密封裝體之製造方法係優選上,使用具有基部與設於基部上的框部的陶瓷基體,在框部的頂部形成第一密封材料層。In addition, in the method for manufacturing the hermetically sealed package of the present invention, preferably, a ceramic base having a base portion and a frame portion provided on the base portion is used to form a first sealing material layer on top of the frame portion.

此外,本發明的氣密封裝體之製造方法係優選上,進一步具備將第一密封材料層的表面進行研磨的程序。In addition, the method for manufacturing the airtight package of the present invention is preferably further provided with a procedure for polishing the surface of the first sealing material layer.

此外,本發明的氣密封裝體之製造方法係優選上,陶瓷基體為玻璃陶瓷、氮化鋁、氧化鋁中的任一者或此等之複合材料。In addition, the method for manufacturing the gas-tight package of the present invention is preferably that the ceramic substrate is any one of glass ceramics, aluminum nitride, and aluminum oxide, or a composite material of these.

此外,本發明的氣密封裝體之製造方法係優選上,在陶瓷基體的框部內收容感測器元件或LED元件。In addition, the method of manufacturing the hermetically sealed package of the present invention is preferably such that the sensor element or the LED element is accommodated in the frame portion of the ceramic base.

本發明的氣密封裝體係一種氣密封裝體,具有陶瓷基體與玻璃蓋,陶瓷基體具有基部與設於基部上的框部,在陶瓷基體的框部的頂部上,形成含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上的第一密封材料層,於玻璃蓋上形成含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上的第二密封材料層,且被在第一密封材料層與第二密封材料層被接觸配置的狀態下氣密一體化。The gas-tight package system of the present invention is a gas-tight package having a ceramic base and a glass cover. The ceramic base has a base and a frame provided on the base. On the top of the frame of the ceramic base, a glass containing bismuth and phosphoric acid A first sealing material layer of any one or more of silver-based glass and tellurium-based glass, a second sealing material layer containing any one or more of bismuth-based glass, silver phosphate-based glass, and tellurium-based glass is formed on the glass cover, and It is hermetically integrated in a state where the first sealing material layer and the second sealing material layer are arranged in contact.

此外,本發明的氣密封裝體係優選上,第一密封材料層含有在玻璃組成中包含過渡金屬氧化物的鉍系玻璃,且第二密封材料層含有在玻璃組成中包含過渡金屬氧化物的鉍系玻璃。In addition, in the gas seal system of the present invention, preferably, the first sealing material layer contains bismuth-based glass containing a transition metal oxide in the glass composition, and the second sealing material layer contains bismuth containing a transition metal oxide in the glass composition Department of glass.

此外,本發明的氣密封裝體係優選上,第一密封材料層的平均厚度不足8.0μm,第二密封材料層的平均厚度不足8.0μm,且第一密封材料層的平均厚度與第二密封材料層的平均厚度的合計不足15.0μm。In addition, in the gas seal system of the present invention, preferably, the average thickness of the first sealing material layer is less than 8.0 μm, the average thickness of the second sealing material layer is less than 8.0 μm, and the average thickness of the first sealing material layer and the second sealing material The total average thickness of the layers is less than 15.0 μm.

此外,本發明的氣密封裝體係優選上,第一密封材料層的平均寬度不足2000μm,且第二密封材料層的平均寬度不足2000μm。In addition, in the hermetic package system of the present invention, it is preferable that the average width of the first sealing material layer is less than 2000 μm, and the average width of the second sealing material layer is less than 2000 μm.

此外,本發明的氣密封裝體係優選上,陶瓷基體為玻璃陶瓷、氮化鋁、氧化鋁中的任一者或此等之複合材料。In addition, in the gas-tight packaging system of the present invention, preferably, the ceramic substrate is any one of glass ceramics, aluminum nitride, and aluminum oxide, or a composite material of these.

此外,本發明的氣密封裝體係優選上,在陶瓷基體的框部內收容感測器元件或LED元件。In addition, in the hermetic package system of the present invention, preferably, the sensor element or the LED element is housed in the frame portion of the ceramic base.

本發明的氣密封裝體之製造方法具有以下程序:準備陶瓷基體,並在陶瓷基體上形成第一密封材料層;準備玻璃蓋,並在玻璃蓋上形成第二密封材料層。The manufacturing method of the airtight package of the present invention has the following procedures: preparing a ceramic base and forming a first sealing material layer on the ceramic base; preparing a glass cover and forming a second sealing material layer on the glass cover.

陶瓷基體優選上具有基部與設於基部上的框部。作成如此時,易於將感測器晶片等的內部元件收容於陶瓷基體內的空間。優選上陶瓷基體的框部沿著陶瓷基體的外周端緣區域而形成為框狀。作成如此時,可增加作為裝置而發揮功能的有效面積。更易於將感測器晶片等的內部元件收容於陶瓷基體的框部內,且亦易於進行配線接合等。The ceramic base preferably has a base and a frame provided on the base. In this case, it is easy to house internal components such as sensor wafers in the space within the ceramic base. The frame portion of the upper ceramic base is preferably formed in a frame shape along the outer peripheral edge region of the ceramic base. When this is done, the effective area that functions as a device can be increased. It is easier to house internal components such as sensor wafers in the frame portion of the ceramic base, and it is also easier to perform wire bonding and the like.

優選上在框部的頂部的配置密封材料層的區域的表面的表面粗糙度Ra不足1.0μm。此表面的表面粗糙度Ra變大時,雷射密封的精度容易降低。於此,「表面粗糙度Ra」例如可透過觸針式或非接觸式的雷射膜厚計、表面粗糙度計進行測定。It is preferable that the surface roughness Ra of the surface of the region where the sealing material layer is arranged on the top of the frame portion is less than 1.0 μm. As the surface roughness Ra of this surface becomes larger, the accuracy of the laser seal tends to decrease. Here, the "surface roughness Ra" can be measured by, for example, a stylus-type or non-contact laser film thickness meter or a surface roughness meter.

陶瓷基體優選上係玻璃陶瓷、氮化鋁、氧化鋁中的任一者或此等之複合材料(例如,將氮化鋁與玻璃陶瓷一體化者)。玻璃陶瓷可易於形成熱導孔,故可恰當地防止在內部元件的動作時氣密封裝體過度發熱的事態。氮化鋁與氧化鋁散熱性良好,故可恰當地防止在內部元件的動作時氣密封裝體過度發熱的事態。The ceramic substrate is preferably composed of any one of glass ceramics, aluminum nitride, and aluminum oxide, or a composite material thereof (for example, an aluminum nitride and glass ceramic are integrated). The glass ceramic can easily form a heat conduction hole, so it can appropriately prevent the overheating of the airtight package during the operation of the internal components. Aluminum nitride and aluminum oxide have good heat dissipation, so it is possible to appropriately prevent the overheating of the airtight package during the operation of internal components.

玻璃陶瓷、氮化鋁、氧化鋁亦可被分散黑色顔料。作成如此時,陶瓷基體可吸收穿透密封材料層的雷射光。此結果,在雷射密封之際可使往熱導度高的陶瓷基體側的熱流動降低,故可效率佳地進行雷射密封。Glass ceramics, aluminum nitride, and aluminum oxide can also be dispersed with black pigments. When this is done, the ceramic substrate can absorb the laser light penetrating the sealing material layer. As a result, the heat flow to the ceramic base with high thermal conductivity can be reduced during laser sealing, so that laser sealing can be performed efficiently.

被分散黑色顔料的陶瓷基體的情況下,優選上具有吸收應照射的雷射光的性質,亦即厚度0.5mm、應照射的雷射光的波長(例如808nm)下的全透光率為10%以下(更優選上5%以下)。作成如此時,可效率佳地加熱陶瓷基體。In the case of a black pigment-dispersed ceramic substrate, it preferably has the property of absorbing laser light to be irradiated, that is, the total light transmittance at a thickness of 0.5 mm and the wavelength of laser light to be irradiated (eg, 808 nm) is 10% or less (More preferably 5% or less). In this case, the ceramic substrate can be efficiently heated.

陶瓷基體的基部的厚度優選上係0.1~2.5mm,尤其0.2~1.5mm。藉此,可謀求氣密封裝體的薄型化。The thickness of the base of the ceramic base is preferably 0.1 to 2.5 mm, especially 0.2 to 1.5 mm. This makes it possible to reduce the thickness of the airtight package.

密封材料層(第一密封材料層及/或第二密封材料層)的平均厚度優選上不足8.0μm,尤其1.0μm以上且不足6.0μm。再者第一密封材料層的平均厚度與第二密封材料層的平均厚度的合計優選上不足15.0μm,尤其不足12.0μm。密封材料層的平均厚度越小,即使密封材料層、陶瓷基體及玻璃蓋的熱脹係數不整合,仍可減低在雷射密封後殘留於密封部分的應力。此外亦可提高雷射密封的精度。另外,如上述般限制密封材料層的平均厚度的方法方面,舉例塗佈薄的密封材料膏的方法、將密封材料層的表面進行研磨處理的方法。The average thickness of the sealing material layer (the first sealing material layer and / or the second sealing material layer) is preferably less than 8.0 μm, especially 1.0 μm or more and less than 6.0 μm. Furthermore, the sum of the average thickness of the first sealing material layer and the average thickness of the second sealing material layer is preferably less than 15.0 μm, particularly less than 12.0 μm. The smaller the average thickness of the sealing material layer, even if the thermal expansion coefficients of the sealing material layer, the ceramic substrate and the glass cover are not integrated, the stress remaining in the sealing portion after laser sealing can still be reduced. In addition, the accuracy of laser sealing can also be improved. In addition, as the method of limiting the average thickness of the sealing material layer as described above, a method of applying a thin sealing material paste and a method of polishing the surface of the sealing material layer are exemplified.

密封材料層(第一密封材料層及/或第二密封材料層)的平均寬度優選上不足2000μm,不足1200μm,尤其200μm以上且不足800μm。使密封材料層的平均寬度為窄時,可減低在雷射密封後殘留於密封部分的應力。再者亦可使陶瓷基體的框部的寬度窄小化,可增加氣密封裝體的作為裝置而發揮功能的有效面積。The average width of the sealing material layer (the first sealing material layer and / or the second sealing material layer) is preferably less than 2000 μm, less than 1200 μm, especially 200 μm or more and less than 800 μm. When the average width of the sealing material layer is narrow, the stress remaining in the sealing portion after laser sealing can be reduced. In addition, the width of the frame portion of the ceramic base can be narrowed, and the effective area of the airtight package functioning as a device can be increased.

密封材料層(第一密封材料層及/或第二密封材料層)的表面粗糙度Ra優選上不足0.5μm,0.2μm以下,尤其0.01~0.15μm。作成如此時,第一密封材料層與第二密封材料層的密接性提升,雷射密封的精度提升。於此,「表面粗糙度Ra」例如可透過觸針式或非接觸式的雷射膜厚計、表面粗糙度計進行測定。另外,如上述般限制密封材料層的表面粗糙度Ra的方法方面,舉例就密封材料層的表面進行研磨處理的方法、將在密封材料層所含的耐火性填料粉末的粒度減少的方法。The surface roughness Ra of the sealing material layer (the first sealing material layer and / or the second sealing material layer) is preferably less than 0.5 μm, 0.2 μm or less, especially 0.01 to 0.15 μm. When this is done, the adhesion between the first sealing material layer and the second sealing material layer is improved, and the accuracy of the laser sealing is improved. Here, the "surface roughness Ra" can be measured by, for example, a stylus-type or non-contact laser film thickness meter or a surface roughness meter. In addition, as the method of restricting the surface roughness Ra of the sealing material layer as described above, a method of polishing the surface of the sealing material layer and a method of reducing the particle size of the refractory filler powder contained in the sealing material layer are exemplified.

第一密封材料層與第二密封材料層可作成相同的材料構成,亦可含有玻璃組成相同的玻璃粉末。作成如此時,第一密封材料層與第二密封材料層的流動性、熱脹係數等的對於熱的舉動成為相同,故易於控制雷射密封程序。The first sealing material layer and the second sealing material layer may be made of the same material, or may contain glass powder having the same glass composition. In this case, the behavior of the first sealing material layer and the second sealing material layer, such as the fluidity and the coefficient of thermal expansion, becomes the same, so that it is easy to control the laser sealing process.

第一密封材料層與第二密封材料層可作成不同的材料構成,亦可含有玻璃組成不同的玻璃粉末。作成如此時,可個別調整第一密封材料層與第二密封材料層的熱脹係數,故易於使第一密封材料層、第二密封材料層、陶瓷基體及玻璃蓋間的熱脹係數恰當化。結果方面,易於防止在雷射密封後玻璃蓋等的破損。The first sealing material layer and the second sealing material layer may be made of different materials, and may also contain glass powder with different glass compositions. In this case, the thermal expansion coefficients of the first sealing material layer and the second sealing material layer can be adjusted individually, so it is easy to optimize the thermal expansion coefficients between the first sealing material layer, the second sealing material layer, the ceramic substrate and the glass cover . As a result, it is easy to prevent breakage of the glass cover or the like after laser sealing.

密封材料層係密封材料的燒結體,為在雷射密封時軟化變形者。密封材料方面,可使用各種玻璃(例如,鉍系玻璃、磷酸銀系玻璃、碲系玻璃、磷酸錫系玻璃、釩系玻璃等),尤其從確保雷射密封強度的觀點言之,優選上使用在玻璃組成中含有過渡金屬氧化物的玻璃。玻璃中的過渡金屬氧化物的含有量,為了提高雷射吸收特性優選上為1莫耳%以上,3莫耳%以上,5莫耳%以上,10莫耳%以上,尤其15~30莫耳%。The sealing material layer is a sintered body of sealing material, which is softened and deformed during laser sealing. For the sealing material, various glasses (for example, bismuth-based glass, silver phosphate-based glass, tellurium-based glass, tin phosphate-based glass, vanadium-based glass, etc.) can be used, especially from the viewpoint of ensuring the laser sealing strength Glass containing transition metal oxide in the glass composition. The content of the transition metal oxide in the glass is preferably 1 mol% or more, 3 mol% or more, 5 mol% or more, 10 mol% or more, especially 15 to 30 mol in order to improve the laser absorption characteristics %.

鉍系玻璃係玻璃組成方面,優選上在莫耳%下含有28~60%之Bi2 O3 、15~37%之B2 O3 、1~30%之ZnO、0~40%之過渡金屬氧化物。另外,於鉍系玻璃的玻璃組成範圍的說明,%的表示指莫耳%。In terms of bismuth-based glass composition, it is preferable to contain 28 to 60% of Bi 2 O 3 , 15 to 37% of B 2 O 3 , 1 to 30% of ZnO, and 0 to 40% of transition metals in mole% Oxide. In addition, in the description of the glass composition range of bismuth-based glass,% means mole%.

在以下說明將各成分的含有範圍如上述般限定的理由。The reason for limiting the content range of each component as described above will be described below.

Bi2 O3 係用於使軟化點降低的主要成分,其含有量優選上係28~60%,33~55%,尤其35~45%。Bi2 O3 的含有量過少時,軟化點變過高,流動性容易降低。另一方面,Bi2 O3 的含有量過多時,在雷射密封時玻璃容易失透,流動性容易因此失透而降低。Bi 2 O 3 is a main component for lowering the softening point, and its content is preferably 28 to 60%, 33 to 55%, and especially 35% to 45%. When the content of Bi 2 O 3 is too small, the softening point becomes too high, and the fluidity tends to decrease. On the other hand, when the content of Bi 2 O 3 is too large, the glass is likely to devitrify during laser sealing, and the fluidity is easily degraded by this and thus reduced.

B2 O3 係在玻璃形成成分方面為必須的成分,其含有量優選上係15~37%,20~33%,尤其25~30%。B2 O3 的含有量過少時,不易形成玻璃網絡,故在雷射密封時玻璃容易失透。另一方面,B2 O3 的含有量過多時,玻璃的黏性變高,流動性容易降低。The B 2 O 3 system is an essential component in terms of glass forming components, and the content thereof is preferably 15 to 37%, 20 to 33%, and especially 25 to 30%. When the content of B 2 O 3 is too small, it is difficult to form a glass network, so the glass is easily devitrified during laser sealing. On the other hand, if the content of B 2 O 3 is too large, the viscosity of the glass becomes high, and the fluidity tends to decrease.

ZnO係提高耐失透性的成分,其含有量優選上係1~30%,3~25%,5~22%,尤其9~20%。ZnO的含有量在上述範圍外時,玻璃組成的成分平衡受損,耐失透性容易降低。The content of ZnO-based devitrification-improving component is preferably 1 to 30%, 3 to 25%, 5 to 22%, and especially 9 to 20%. When the content of ZnO is outside the above range, the composition balance of the glass composition is impaired, and the devitrification resistance tends to decrease.

過渡金屬氧化物具有雷射吸收特性的成分,其含有量優選上係0~40%,1~40%,3~40%,5~40%,12~40%,尤其15~30莫耳%。過渡金屬氧化物的含有量過多時,耐失透性容易降低。The transition metal oxide has a component with laser absorption characteristics, and its content is preferably 0-40%, 1-40%, 3-40%, 5-40%, 12-40%, especially 15-30 mole% . When the content of the transition metal oxide is too large, the devitrification resistance tends to decrease.

添加CuO時,可提高雷射吸收特性。CuO的含有量優選上係0~40%,5~35%,10~30%,尤其15~25%。CuO的含有量過多時,玻璃組成的成分平衡受損,反而耐失透性容易降低。另外,要降低鉍系玻璃的軟化點需要在玻璃組成中導入量多的Bi2 O3 ,惟使Bi2 O3 的含有量增加時,在雷射密封時玻璃容易失透,流動性容易因此失透而降低。尤其,Bi2 O3 的含有量成為30%以上時,該傾向變顯著。此對策方面,添加CuO時,即使Bi2 O3 的含有量為30%以上,仍可有效抑制玻璃的失透。When CuO is added, the laser absorption characteristics can be improved. The content of CuO is preferably 0 to 40%, 5 to 35%, 10 to 30%, especially 15 to 25%. When the content of CuO is too large, the composition balance of the glass composition is impaired, and devitrification resistance tends to decrease. In addition, to reduce the softening point of bismuth-based glass, it is necessary to introduce a large amount of Bi 2 O 3 into the glass composition. However, when the content of Bi 2 O 3 is increased, the glass is easily devitrified during laser sealing, and the fluidity is easy Reduced devitrification. In particular, when the content of Bi 2 O 3 becomes 30% or more, this tendency becomes remarkable. For this countermeasure, when CuO is added, even if the content of Bi 2 O 3 is 30% or more, devitrification of the glass can be effectively suppressed.

Fe2 O3 係提高耐失透性與雷射吸收特性的成分,其含有量優選上係0~10%,0.1~5%,尤其0.5~3%。Fe2 O3 的含有量過多時,玻璃組成的成分平衡受損,反而耐失透性容易降低。Fe 2 O 3 is a component that improves devitrification resistance and laser absorption characteristics, and its content is preferably 0 to 10%, 0.1 to 5%, and particularly 0.5 to 3%. When the content of Fe 2 O 3 is too large, the composition balance of the glass composition is impaired, but devitrification resistance tends to decrease.

MnO係提高雷射吸收特性的成分。MnO的含有量優選上係0~25%,尤其5~15%。MnO的含有量過多時,耐失透性容易降低。MnO is a component that improves laser absorption characteristics. The content of MnO is preferably 0 to 25%, especially 5 to 15%. When the content of MnO is too large, the devitrification resistance tends to decrease.

MoO3 係提高雷射吸收特性的成分。MoO3 的含有量優選上係0~25%,尤其5~15%。MoO3 的含有量過多時,耐失透性容易降低。MoO 3 is a component that improves laser absorption characteristics. The content of MoO 3 is preferably 0 to 25%, especially 5 to 15%. When the content of MoO 3 is too large, the devitrification resistance tends to decrease.

上述成分以外,亦可例如添加以下的成分。In addition to the above components, for example, the following components may be added.

SiO2 係提高耐水性的成分,惟具有使軟化點上升的作用。為此,SiO2 的含有量優選上係0~5%,0~3%,0~2%,尤其0~1%。此外,SiO2 的含有量過多時,在雷射密封時玻璃容易失透。SiO 2 is a component that improves water resistance, but has the effect of increasing the softening point. For this reason, the content of SiO 2 is preferably 0 to 5%, 0 to 3%, 0 to 2%, especially 0 to 1%. In addition, when the content of SiO 2 is too large, the glass is easily devitrified during laser sealing.

Al2 O3 係提高耐水性的成分,其含有量優選上係0~10%,0~5%,尤其0.1~2%。Al2 O3 的含有量過多時,恐軟化點會不當地上升。The Al 2 O 3 system is a component that improves water resistance, and its content is preferably 0 to 10%, 0 to 5%, and particularly 0.1 to 2%. If the content of Al 2 O 3 is too large, the softening point may increase inappropriately.

Li2 O、Na2 O及K2 O係使耐失透性降低的成分。因此,Li2 O、Na2 O及K2 O的含有量分別係0~5%,0~3%,尤其不足0~1%。Li 2 O, Na 2 O, and K 2 O are components that reduce the devitrification resistance. Therefore, the contents of Li 2 O, Na 2 O, and K 2 O are 0 to 5%, 0 to 3%, and particularly less than 0 to 1%.

MgO、CaO、SrO及BaO係提高耐失透性的成分,亦為使軟化點上升的成分。因此,MgO、CaO、SrO及BaO的含有量分別係0~20%,0~10%,尤其0~5%。MgO, CaO, SrO, and BaO are components that improve devitrification resistance, and are also components that increase the softening point. Therefore, the contents of MgO, CaO, SrO and BaO are 0-20%, 0-10%, especially 0-5%.

Sb2 O3 係提高耐失透性的成分,其含有量優選上係0~5%,尤其0~2%。Sb2 O3 的含有量過多時,玻璃組成的成分平衡受損,反而耐失透性容易降低。Sb 2 O 3 is a component for improving devitrification resistance, and the content thereof is preferably 0 to 5%, especially 0 to 2%. When the content of Sb 2 O 3 is too large, the composition balance of the glass composition is impaired, and devitrification resistance tends to decrease.

磷酸銀系玻璃係玻璃組成方面,優選上在莫耳%下,含有10~50%的Ag2 O、10~35%的P2 O5 、3~25%的ZnO、0~30%的過渡金屬氧化物。另外,於磷酸銀系玻璃的玻璃組成範圍的說明,%的表示指莫耳%。In terms of silver phosphate-based glass composition, it is preferable to contain 10 to 50% of Ag 2 O, 10 to 35% of P 2 O 5 , 3 to 25% of ZnO, and 0 to 30% transition in mole%. Metal oxide. In addition, in the description of the glass composition range of the silver phosphate-based glass,% means mole%.

Ag2 O係使玻璃低熔點化且難溶於水,故為提高耐水性的成分。Ag2 O的含有量優選上係10~50%,尤其20~40%。Ag2 O的含有量過少時,玻璃的黏性變高,流動性容易降低,且耐水性容易降低。另一方面,Ag2 O的含有量過多時,玻璃化變困難。The Ag 2 O system lowers the melting point of glass and is difficult to dissolve in water, so it is a component that improves water resistance. The content of Ag 2 O is preferably 10-50%, especially 20-40%. When the content of Ag 2 O is too small, the viscosity of the glass becomes high, the fluidity tends to decrease, and the water resistance tends to decrease. On the other hand, when the content of Ag 2 O is too large, vitrification becomes difficult.

P2 O5 係使玻璃低熔點化的成分。其含有量係10~35%,優選上尤其15~25%。P2 O5 的含有量過少時,玻璃化變困難。另一方面,P2 O5 的含有量過多時,耐候性、耐水性容易降低。P 2 O 5 is a component that lowers the melting point of glass. The content is 10 to 35%, preferably 15 to 25%. When the content of P 2 O 5 is too small, vitrification becomes difficult. On the other hand, when the content of P 2 O 5 is too large, the weather resistance and water resistance tend to decrease.

ZnO係提高耐失透性的成分,其含有量優選上係3~25%,5~22%,尤其9~20%。ZnO的含有量在上述範圍外時,玻璃組成的成分平衡受損,耐失透性容易降低。The content of the ZnO-based devitrification-improving component is preferably 3 to 25%, 5 to 22%, and especially 9 to 20%. When the content of ZnO is outside the above range, the composition balance of the glass composition is impaired, and the devitrification resistance tends to decrease.

過渡金屬氧化物係具有雷射吸收特性的成分,其含有量優選上係0~30%,1~30%,尤其3~15%。過渡金屬氧化物的含有量過多時,耐失透性容易降低。The transition metal oxide-based component has laser absorption characteristics, and its content is preferably 0 to 30%, 1 to 30%, and particularly 3 to 15%. When the content of the transition metal oxide is too large, the devitrification resistance tends to decrease.

添加CuO時,可提高雷射吸收特性。CuO的含有量優選上係0~30%,1~30%,尤其3~15%。CuO的含有量過多時,玻璃組成的成分平衡受損,反而耐失透性容易降低。When CuO is added, the laser absorption characteristics can be improved. The content of CuO is preferably 0 to 30%, 1 to 30%, especially 3 to 15%. When the content of CuO is too large, the composition balance of the glass composition is impaired, and devitrification resistance tends to decrease.

上述成分以外,例如亦可添加以下的成分。In addition to the above components, for example, the following components may be added.

TeO2 係玻璃形成成分,為使玻璃低熔點化的成分。TeO2 的含有量優選上係0~40%,尤其10~30%。TeO 2 -based glass forming component is a component that lowers the melting point of glass. The content of TeO 2 is preferably 0 to 40%, especially 10 to 30%.

Nb2 O5 係提高耐水性的成分。Nb2 O5 的含有量優選上係0~25%,尤其1~12%。Nb2 O5 的含有量過多時,玻璃的黏性變高,流動性容易降低。Nb 2 O 5 is a component that improves water resistance. The content of Nb 2 O 5 is preferably 0 to 25%, especially 1 to 12%. When the content of Nb 2 O 5 is too large, the viscosity of the glass becomes high, and the fluidity tends to decrease.

Li2 O、Na2 O及K2 O係使耐失透性降低的成分。因此,Li2 O、Na2 O及K2 O的含有量分別係0~5%,0~3%,尤其不足0~1%。Li 2 O, Na 2 O, and K 2 O are components that reduce the devitrification resistance. Therefore, the contents of Li 2 O, Na 2 O, and K 2 O are 0 to 5%, 0 to 3%, and particularly less than 0 to 1%.

MgO、CaO、SrO及BaO係提高耐失透性的成分,惟亦為使軟化點上升的成分。因此,MgO、CaO、SrO及BaO的含有量分別係0~20%,0~10%,尤其0~5%。MgO, CaO, SrO, and BaO are components that improve devitrification resistance, but they are also components that increase the softening point. Therefore, the contents of MgO, CaO, SrO and BaO are 0-20%, 0-10%, especially 0-5%.

碲系玻璃係在玻璃組成方面,在莫耳%下,優選上含有20~80%的TeO2 、0~25%的Nb2 O5 、0~40%的過渡金屬氧化物。另外,於碲系玻璃的玻璃組成範圍的說明,%的表示指莫耳%。In terms of glass composition, the tellurium-based glass system preferably contains 20 to 80% of TeO 2 , 0 to 25% of Nb 2 O 5 , and 0 to 40% of transition metal oxide in mole%. In addition, in the description of the glass composition range of tellurium-based glass,% means mole%.

TeO2 係玻璃形成成分,為使玻璃低熔點化的成分。TeO2 的含有量優選上係20~80%,尤其40~75%。TeO 2 -based glass forming component is a component that lowers the melting point of glass. The content of TeO 2 is preferably 20 to 80%, especially 40 to 75%.

Nb2 O5 係提高耐水性的成分。Nb2 O5 的含有量優選上係0~25%,1~20%,尤其5~15%。Nb2 O5 的含有量過多時,玻璃的黏性變高,流動性容易降低。Nb 2 O 5 is a component that improves water resistance. The content of Nb 2 O 5 is preferably 0 to 25%, 1 to 20%, especially 5 to 15%. When the content of Nb 2 O 5 is too large, the viscosity of the glass becomes high, and the fluidity tends to decrease.

過渡金屬氧化物係具有雷射吸收特性的成分,其含有量優選上係0~40%,5~30%,尤其15~25%。過渡金屬氧化物的含有量過多時,耐失透性容易降低。The transition metal oxide-based component has laser absorption characteristics, and its content is preferably 0 to 40%, 5 to 30%, especially 15 to 25%. When the content of the transition metal oxide is too large, the devitrification resistance tends to decrease.

添加CuO時,可提高雷射吸收特性。CuO的含有量優選上係0~40%,5~30%,尤其15~25%。CuO的含有量過多時,玻璃組成的成分平衡受損,反而耐失透性容易降低。When CuO is added, the laser absorption characteristics can be improved. The content of CuO is preferably 0 to 40%, 5 to 30%, especially 15 to 25%. When the content of CuO is too large, the composition balance of the glass composition is impaired, and devitrification resistance tends to decrease.

上述成分以外,亦可例如添加以下的成分。In addition to the above components, for example, the following components may be added.

Li2 O、Na2 O及K2 O係使耐失透性降低的成分。因此,Li2 O、Na2 O及K2 O的含有量分別係0~5%,0~3%,尤其不足0~1%。Li 2 O, Na 2 O, and K 2 O are components that reduce the devitrification resistance. Therefore, the contents of Li 2 O, Na 2 O, and K 2 O are 0 to 5%, 0 to 3%, and particularly less than 0 to 1%.

MgO、CaO、SrO及BaO係提高耐失透性的成分,惟亦為使軟化點上升的成分。因此,MgO、CaO、SrO及BaO的含有量分別係0~20%,0~10%,尤其0~5%。MgO, CaO, SrO, and BaO are components that improve devitrification resistance, but they are also components that increase the softening point. Therefore, the contents of MgO, CaO, SrO and BaO are 0-20%, 0-10%, especially 0-5%.

玻璃粉末的平均粒徑D50 優選上不足15μm,0.5~10μm,尤其0.8~5μm。玻璃粉末的平均粒徑D50 越小,玻璃粉末的軟化點降越低。The average particle diameter D 50 of the glass powder is preferably less than 15 μm, 0.5 to 10 μm, especially 0.8 to 5 μm. The smaller the average particle diameter D 50 of the glass powder, the lower the softening point of the glass powder.

密封材料層(第一密封材料層及/或第二密封材料層)亦可含有耐火性填料粉末。密封材料層優選上含有50~100體積%的玻璃與0~50體積%的耐火性填料粉末,更優選上含有55~85體積%的玻璃與15~45體積%的耐火性填料粉末,特優選上含有60~80體積%的玻璃與20~40體積%的耐火性填料粉末。添加耐火性填料粉末時,密封材料的熱脹係數容易與陶瓷基體及玻璃蓋的熱脹係數整合。此結果,容易防止在雷射密封後於密封部分殘留不當的應力的事態。另一方面,耐火性填料粉末的含有量過多時,玻璃的含有量相對變少,故密封材料層的表面平滑性降低,雷射密封的精度容易降低。The sealing material layer (the first sealing material layer and / or the second sealing material layer) may also contain refractory filler powder. The sealing material layer preferably contains 50 to 100% by volume of glass and 0 to 50% by volume of refractory filler powder, more preferably contains 55 to 85% by volume of glass and 15 to 45% by volume of refractory filler powder, particularly preferably It contains 60 to 80% by volume of glass and 20 to 40% by volume of refractory filler powder. When the refractory filler powder is added, the thermal expansion coefficient of the sealing material is easily integrated with the thermal expansion coefficient of the ceramic substrate and glass cover. As a result, it is easy to prevent a situation where an undue stress remains on the sealing portion after laser sealing. On the other hand, when the content of the refractory filler powder is too large, the content of glass relatively decreases, so the surface smoothness of the sealing material layer decreases, and the accuracy of laser sealing tends to decrease.

耐火性填料粉末方面,優選上使用從堇青石、鋯石、氧化錫、氧化鈮、磷酸鋯系陶瓷、矽鋅礦、β-鋰霞石、β-石英固溶體中選擇的一種或二種以上。此等耐火性填料粉末係除了熱脹係數低以外,機械強度高,且與鉍系玻璃、磷酸銀系玻璃、碲系玻璃等的適應性良好。For the refractory filler powder, one or two selected from cordierite, zircon, tin oxide, niobium oxide, zirconium phosphate-based ceramics, wurtzite, β-eucryptite, and β-quartz solid solution are preferably used. the above. These refractory filler powder systems have a low thermal expansion coefficient, high mechanical strength, and good compatibility with bismuth-based glass, silver phosphate-based glass, tellurium-based glass, and the like.

耐火性填料粉末的平均粒徑D50 優選上不足2μm,尤其0.1μm以上且不足1.5μm。耐火性填料粉末的平均粒徑D50 過大時,密封材料層的表面平滑性容易降低,且密封材料層的平均厚度容易變大,結果方面,雷射密封的精度容易降低。The average particle size D 50 of the refractory filler powder is preferably less than 2 μm, especially 0.1 μm or more and less than 1.5 μm. When the average particle size D 50 of the refractory filler powder is too large, the surface smoothness of the sealing material layer tends to decrease, and the average thickness of the sealing material layer tends to increase. As a result, the accuracy of laser sealing tends to decrease.

耐火性填料粉末的99%粒徑D99 優選上不足5μm,4μm以下,尤其0.3μm以上且3μm以下。耐火性填料粉末的99%粒徑D99 過大時,密封材料層的表面平滑性容易降低,且密封材料層的平均厚度容易變大,結果方面,雷射密封的精度容易降低。於此,「99%粒徑D99 」指透過雷射繞射法以體積基準進行測定之值。於此,「平均粒徑D50 」與「99%粒徑D99 」指透過雷射繞射法以體積基準進行測定之值。The 99% particle size D 99 of the refractory filler powder is preferably less than 5 μm, 4 μm or less, especially 0.3 μm or more and 3 μm or less. When the 99% particle size D 99 of the refractory filler powder is too large, the surface smoothness of the sealing material layer tends to decrease, and the average thickness of the sealing material layer tends to increase. As a result, the accuracy of laser sealing tends to decrease. Here, "99% particle size D 99 " refers to the value measured on a volume basis by the laser diffraction method. Herein, "average particle diameter D 50" and "99% particle diameter D 99" refers to the laser diffraction method was measured through a volume basis of the value.

密封材料層(第一密封材料層及/或第二密封材料層)為了提高雷射吸收特性,可進一步包含雷射吸收材,惟雷射吸收材具有助長玻璃的失透的作用。因此,密封材料中的雷射吸收材的含有量優選上係10體積%以下,5體積%以下,1體積%以下,0.5體積%以下,優選上不實質上含有。玻璃的耐失透性良好的情況下,為了提高雷射吸收特性,亦可將雷射吸收材導入1體積%以上,尤其導入3體積%以上。另外,雷射吸收材方面,可使用Cu系氧化物、Fe系氧化物、Cr系氧化物、Mn系氧化物及此等尖晶石型複合氧化物等。The sealing material layer (the first sealing material layer and / or the second sealing material layer) may further include a laser absorber in order to improve the laser absorption characteristics, but the laser absorber has a function of promoting devitrification of the glass. Therefore, the content of the laser absorber in the sealing material is preferably 10% by volume or less, 5% by volume or less, 1% by volume or less, and 0.5% by volume or less, and preferably does not substantially contain it. In the case where the devitrification resistance of the glass is good, in order to improve the laser absorption characteristics, the laser absorption material may be introduced into 1 volume% or more, especially 3 volume% or more. For the laser absorber, Cu-based oxides, Fe-based oxides, Cr-based oxides, Mn-based oxides, spinel-type composite oxides, and the like can be used.

密封材料層(第一密封材料層及/或第二密封材料層)的熱脹係數優選上係55×10- 7 ~105×10- 7 /℃,60×10- 7 ~82×10- 7 /℃,尤其65×10- 7 ~76×10- 7 /℃。作成如此時,密封材料層的熱脹係數與陶瓷基體、玻璃蓋的熱脹係數整合,殘留於密封部分的應力變小。55 × 10 based on the thermal expansion coefficient of the sealing material layer (a first sealant layer and / or the second sealing material layer) is preferably - 7 ~ 105 × 10 - 7 / ℃, 60 × 10 - 7 ~ 82 × 10 - 7 / ℃, in particular 65 × 10 - 7 ~ 76 × 10 - 7 / ℃. When this is done, the thermal expansion coefficient of the sealing material layer is integrated with the thermal expansion coefficients of the ceramic substrate and the glass cover, and the stress remaining in the sealing portion becomes smaller.

密封材料層與陶瓷基體的熱脹係數差優選上不足65×10- 7 /℃,尤其25×10- 7 /℃以下,此外密封材料層與玻璃蓋的熱脹係數差優選上不足75×10- 7 /℃,尤其25× 10- 7 /℃以下,再者第一密封材料層與第二密封材料層的熱脹係數差優選上不足30×10- 7 /℃,不足10×10- 7 /℃,尤其5×10- 7 /℃以下。此等熱脹係數差過大時,殘留於密封部分的應力不當地變高,氣密封裝體的長期可靠性恐降低。Thermal expansion coefficient of the sealing layer and the ceramic substrate difference is less than 65 × 10 on a preferably - 7 / ℃, in particular 25 × 10 - on 7 / ℃ less, and the thermal expansion coefficient of the sealing layer and the glass cover is preferred that the difference is less than 75 × 10 - 7 / ℃, in particular 25 × 10 - 7 / ℃ less, furthermore a first coefficient of thermal expansion of the second sealing material layer and the sealing material layer is preferably the difference is less than 30 × 10 - 7 / ℃, less than 10 × 10 - 7 / ℃, in particular 5 × 10 - less 7 / ℃. If the difference in thermal expansion coefficient is too large, the stress remaining in the sealing portion will be unduly high, and the long-term reliability of the airtight package may decrease.

於本發明的氣密封裝體之製造方法,密封材料層(第一密封材料層及/或第二密封材料層)優選上透過密封材料膏的塗佈、燒結而形成。作成如此時,可提高密封材料層的尺寸精度。於此,密封材料膏係密封材料與接合劑的混合物。然後,接合劑一般而言包含溶劑與樹脂。樹脂係為了調整膏體的黏性而添加。此外,亦可酌情添加界面活性劑、增黏劑等。所製作的密封材料膏係利用分注器、絲網印刷機等的塗佈機,塗佈於陶瓷基體、玻璃蓋的表面。In the method of manufacturing the gas-tight package of the present invention, the sealing material layer (the first sealing material layer and / or the second sealing material layer) is preferably formed by coating and sintering the sealing material paste. When this is done, the dimensional accuracy of the sealing material layer can be improved. Here, the sealing material paste is a mixture of the sealing material and the bonding agent. Then, the bonding agent generally contains a solvent and a resin. The resin system is added to adjust the viscosity of the paste. In addition, surfactants, tackifiers, etc. can also be added as appropriate. The produced sealing material paste is applied to the surface of the ceramic substrate and the glass cover using a dispenser such as a dispenser or a screen printer.

密封材料膏優選上沿著陶瓷基體的框部的頂部而塗佈為框狀,此外優選上沿著玻璃蓋的外周端緣區域塗佈為框狀。作成如此時,可增加將內部元件收容於氣密封裝體內的空間。The sealing material paste is preferably applied in a frame shape along the top of the frame portion of the ceramic base, and preferably applied in a frame shape along the outer peripheral edge region of the glass cover. When this is done, it is possible to increase the space for accommodating the internal components in the airtight package.

密封材料膏係優選上於陶瓷基體的框部的頂部塗佈於寬度方向之中心線上。作成如此時,可將雷射密封時的往陶瓷基體側的熱導均勻化。The sealing material paste is preferably applied to the top of the frame of the ceramic substrate on the center line in the width direction. In this case, the thermal conductivity to the ceramic substrate side during laser sealing can be made uniform.

密封材料膏一般而言透過三個輥子等將密封材料與接合劑進行混煉從而製作。接合劑一般而言包含樹脂與溶劑。使用於接合劑的樹脂方面可使用:丙烯酸酯(丙烯酸樹脂)、乙基纖維素、聚乙二醇衍生物、硝基纖維素、聚甲基苯乙烯、聚乙烯吡咯烷酮、聚碳酸丙烯酯、甲基丙烯酸酯等。使用於接合劑的溶劑方面可使用:N、N’-二甲基甲醯胺(DMF)、α-松油醇、高級醇、γ-丁內酯(γ-BL)、四氫化萘、二甘醇丁醚醋酸酯、乙酸乙酯、乙酸異戊酯、二乙二醇單乙醚、二甘醇單乙醚乙酸酯、苄基醇、甲苯、3-甲氧基-3-甲基丁醇、三甘醇單甲醚、三甘醇二甲醚、二丙二醇單甲醚、二丙二醇單丁醚、三丙二醇單甲醚、三丙二醇單丁醚、碳酸丙烯酯、二甲基亞碸(DMSO)、N-甲基-2-吡咯烷酮等。The sealing material paste is generally produced by kneading the sealing material and the bonding agent through three rollers or the like. The bonding agent generally contains a resin and a solvent. The resin used for the bonding agent can be used: acrylate (acrylic resin), ethyl cellulose, polyethylene glycol derivatives, nitrocellulose, polymethylstyrene, polyvinylpyrrolidone, polypropylene carbonate, methyl alcohol Based acrylate, etc. The solvent used in the bonding agent can be used: N, N'-dimethylformamide (DMF), α-terpineol, higher alcohol, γ-butyrolactone (γ-BL), tetralin, di Glycol butyl ether acetate, ethyl acetate, isoamyl acetate, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, benzyl alcohol, toluene, 3-methoxy-3-methylbutanol , Triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, propylene carbonate, dimethyl sulfoxide (DMSO ), N-methyl-2-pyrrolidone, etc.

玻璃蓋方面,可使用各種的玻璃。例如,可使用無鹼玻璃、硼矽玻璃、鈉鈣玻璃。For the glass cover, various glasses can be used. For example, non-alkali glass, borosilicate glass, soda lime glass can be used.

玻璃蓋的板厚優選上係0.01~2.0mm,0.1~1mm,尤其0.2~0.7mm。藉此,可謀求氣密封裝體的薄型化。The thickness of the glass cover is preferably 0.01 to 2.0 mm, 0.1 to 1 mm, especially 0.2 to 0.7 mm. This makes it possible to reduce the thickness of the airtight package.

可在玻璃蓋的內部元件側的表面形成功能膜,亦可在玻璃蓋的外側的表面形成功能膜。尤其功能膜方面抗反射膜為優選。藉此,可減低在玻璃蓋的表面反射的光。A functional film may be formed on the surface of the glass cover on the side of the internal element, or a functional film may be formed on the surface of the outside of the glass cover. In particular, an anti-reflection film is preferable in terms of functional films. By this, the light reflected on the surface of the glass cover can be reduced.

此外玻璃蓋優選上為第一玻璃板與第二玻璃板經由黏合劑而層積一體化的玻璃板層積體。In addition, the glass cover is preferably a glass plate laminate in which the first glass plate and the second glass plate are laminated and integrated via an adhesive.

第一玻璃板與第二玻璃板可使用各種的玻璃。例如可使用:無鹼玻璃、鹼硼矽酸鹽玻璃、鈉鈣玻璃。另外,玻璃板層積體雖優選上以二個玻璃板而構成,惟亦可酌情進一步將別的板狀體予以層積。Various glass can be used for the first glass plate and the second glass plate. For example, non-alkali glass, alkali borosilicate glass, soda lime glass can be used. In addition, although the glass plate laminate is preferably composed of two glass plates, another plate-like body may be further laminated as appropriate.

第一玻璃板與第二玻璃板可使用相同的玻璃。亦即可具有相同的玻璃組成。作成如此時,兩者的折射率、熱脹係數等的各種特性一致,故可抑制玻璃蓋的彎曲、在貼合面的反射等。The same glass can be used for the first glass plate and the second glass plate. That is, it can have the same glass composition. In such a case, the various characteristics such as the refractive index and the coefficient of thermal expansion of the two are the same, so that the bending of the glass cover and the reflection on the bonding surface can be suppressed.

此外,第一玻璃板與第二玻璃板亦可使用不同種類的玻璃。亦即可具有不同種類的玻璃組成。作成如此時,第二玻璃板的熱脹係數不受陶瓷基體的熱脹係數制約,故可一面嚴密地使陶瓷基體與第一玻璃板的熱脹係數整合,一面使用生產性佳的玻璃板於第二玻璃板。結果方面,容易使氣密封裝體的氣密可靠性與生產成本同時成立。In addition, different types of glass can be used for the first glass plate and the second glass plate. That is, it can have different glass compositions. In this case, the thermal expansion coefficient of the second glass plate is not restricted by the thermal expansion coefficient of the ceramic substrate, so the thermal expansion coefficient of the ceramic substrate and the first glass plate can be tightly integrated while using a glass plate with good productivity Second glass plate. As a result, it is easy to establish the airtight reliability of the airtight package simultaneously with the production cost.

用於將第一玻璃板與第二玻璃板貼合的黏合劑可使用各種的材料,惟優選上使用透光性方面優異的光硬化型黏合劑、熱硬化型黏合劑。然後,黏合劑的厚度優選上不足500μm,尤其不足100μm。黏合劑的厚度過厚時,玻璃蓋的透明性容易降低。Various materials can be used for the adhesive for bonding the first glass plate and the second glass plate, but it is preferable to use a light-curing adhesive or a thermosetting adhesive that is excellent in light transmittance. Then, the thickness of the adhesive is preferably less than 500 μm, especially less than 100 μm. When the thickness of the adhesive is too thick, the transparency of the glass cover is easily reduced.

黏合劑的折射率nd優選上為第一玻璃板的折射率nd±0.1的範圍內,優選上為第二玻璃板的折射率nd±0.1的範圍內。黏合劑的折射率nd與第一玻璃板的折射率nd及第二玻璃板的折射率nd不整合時,光容易在黏合劑與第一玻璃板的界面及黏合劑與第二玻璃板的界面反射。基於同樣的理由,第一玻璃板的折射率nd優選上為第二玻璃板的折射率nd±0.1的範圍內。The refractive index nd of the adhesive is preferably within the range of the refractive index nd ± 0.1 of the first glass plate, and preferably within the range of the refractive index nd ± 0.1 of the second glass plate. When the refractive index nd of the adhesive is not integrated with the refractive index nd of the first glass plate and the refractive index nd of the second glass plate, light is likely to be at the interface between the adhesive and the first glass plate and the interface between the adhesive and the second glass plate reflection. For the same reason, the refractive index nd of the first glass plate is preferably within the range of the refractive index nd ± 0.1 of the second glass plate.

本發明的氣密封裝體之製造方法具有以第一密封材料層與第二密封材料層接觸方式將陶瓷基體與玻璃蓋進行層積配置的程序。此情況下,可將玻璃蓋配置於陶瓷基體的下方,惟從雷射密封的效率的觀點言之,優選上將玻璃蓋配置於陶瓷基體之上方。The manufacturing method of the gas-tight package of the present invention has a procedure of laminating the ceramic substrate and the glass cover in such a manner that the first sealing material layer and the second sealing material layer are in contact. In this case, the glass cover may be arranged below the ceramic base, but from the viewpoint of the efficiency of laser sealing, it is preferable to arrange the glass cover above the ceramic base.

在將陶瓷基體與玻璃蓋進行層積配置之際,優選上以第一密封材料層與第二密封材料層的寬度方向之中心線彼此重疊的方式將第一密封材料層與第二密封材料層進行接觸配置。作成如此時,可提高雷射密封的精度。When laminating the ceramic substrate and the glass cover, it is preferable that the first sealing material layer and the second sealing material layer are stacked such that the center lines in the width direction of the first sealing material layer and the second sealing material layer overlap each other. Perform contact configuration. When this is done, the accuracy of the laser seal can be improved.

本發明的氣密封裝體之製造方法具有以下程序:從玻璃蓋側照射雷射光,使第一密封材料層與第二密封材料層軟化變形,從而將第一密封材料層與第二密封材料層進行氣密密封而獲得氣密封裝體。The manufacturing method of the airtight package of the present invention has the following procedure: irradiating laser light from the side of the glass cover to soften and deform the first sealing material layer and the second sealing material layer, thereby transforming the first sealing material layer and the second sealing material layer Airtight sealing is performed to obtain an airtight package.

雷射方面,可使用各種的雷射。尤其,半導體雷射、YAG雷射、CO2 雷射、準分子雷射、紅外線雷射係從處理容易的點言之為優選。For laser, various lasers can be used. In particular, semiconductor lasers, YAG lasers, CO 2 lasers, excimer lasers, and infrared lasers are preferred because they are easy to handle.

進行雷射密封的環境不特別限定,可為大氣環境,亦可氮氣環境等的惰性氣體環境。The environment for laser sealing is not particularly limited, and it may be an atmospheric environment or an inert gas environment such as a nitrogen environment.

在進行雷射密封之際,以(100℃以上且基體內部的發光元件的耐熱溫度以下)的溫度將玻璃蓋預熱時,可抑制熱衝擊所致的玻璃蓋的破裂。此外在緊接著雷射密封後,從玻璃蓋側照射退火雷射時,可抑制熱衝擊所致的玻璃蓋的破裂。When performing laser sealing, when the glass cover is preheated at a temperature (100 ° C. or higher and below the heat-resistant temperature of the light-emitting element inside the substrate), cracking of the glass cover due to thermal shock can be suppressed. In addition, immediately after laser sealing, when the annealing laser is irradiated from the side of the glass cover, cracking of the glass cover due to thermal shock can be suppressed.

在進行雷射密封之際,以(100℃以上且基體內部的發光元件的耐熱溫度以下)的溫度將陶瓷基體內預熱時,為了可在雷射密封時阻礙往陶瓷基體側的熱導,可效率佳地進行雷射密封。When performing laser sealing, when the ceramic substrate is preheated at a temperature (above 100 ° C and below the heat-resistant temperature of the light-emitting element inside the substrate), in order to hinder the heat conduction to the ceramic substrate side during laser sealing , Laser sealing can be performed efficiently.

優選上在按壓玻璃蓋的狀態下進行雷射密封。藉此,可在雷射密封時促進密封材料層的軟化變形。It is preferable to perform laser sealing with the glass cover pressed. This can promote the softening and deformation of the sealing material layer during laser sealing.

本發明的氣密封裝體係於具有陶瓷基體與玻璃蓋的氣密封裝體,陶瓷基體具有基部與設於基部上的框部,在陶瓷基體的框部的頂部上,形成至少包含鉍系玻璃的第一密封材料層,於玻璃蓋上,形成至少包含鉍系玻璃的第二密封材料層,且被在第一密封材料層與第二密封材料層被接觸配置的狀態下氣密一體化。本發明的氣密封裝體的技術特徵已記載於本發明的氣密封裝體之製造方法的說明欄,故就該部分係方便起見,省略詳細的說明。The hermetically sealed package system of the present invention is provided in a hermetically sealed package having a ceramic base and a glass cover. The ceramic base has a base and a frame portion provided on the base. The first sealing material layer forms a second sealing material layer containing at least a bismuth glass on the glass cover, and is hermetically integrated in a state where the first sealing material layer and the second sealing material layer are arranged in contact. The technical features of the gas-tight package of the present invention have been described in the description column of the method of manufacturing the gas-tight package of the present invention, so for the sake of convenience of this part, detailed description is omitted.

以下,一面參照圖式一面說明本發明。圖1係供於說明本發明的一實施方式用的剖面概念圖。氣密封裝體1具備陶瓷基體10與玻璃蓋11。陶瓷基體10具有基部12,進一步在基部12的外周端緣上具有框部13。此外,內部元件14收容於陶瓷基體10的框部13內。然後,在此框部13的頂部15形成第一密封材料層16。第一密封材料層16的表面係預先進行研磨處理,其表面粗糙度Ra為0.15μm以下。然後,第一密封材料層16的寬度比框部13的寬度略小。再者,第一密封材料層16係將密封材料予以燒結者,該密封材料含有在玻璃組成中含有過渡金屬氧化物的鉍系玻璃與耐火性填料粉末。另外,於陶瓷基體10內形成將內部元件14與外部電性連接的電氣配線(未圖示)。Hereinafter, the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional conceptual diagram for explaining an embodiment of the present invention. The airtight package 1 includes a ceramic base 10 and a glass cover 11. The ceramic base 10 has a base 12 and further has a frame 13 on the outer peripheral edge of the base 12. In addition, the internal element 14 is accommodated in the frame portion 13 of the ceramic base 10. Then, the first sealing material layer 16 is formed on the top 15 of the frame portion 13. The surface of the first sealing material layer 16 is previously polished, and its surface roughness Ra is 0.15 μm or less. Then, the width of the first sealing material layer 16 is slightly smaller than the width of the frame portion 13. Furthermore, the first sealing material layer 16 is a sintered sealing material containing bismuth glass containing a transition metal oxide in the glass composition and refractory filler powder. In addition, electrical wiring (not shown) electrically connecting the internal element 14 and the outside is formed in the ceramic base 10.

於玻璃蓋11的表面形成框狀的第二密封材料層17。第二密封材料層17係將密封材料予以燒結者,與第一密封材料層16略同樣的材料構成,該密封材料含有在玻璃組成中含有過渡金屬氧化物的鉍系玻璃與耐火性填料粉末。然後,第二密封材料層17的寬度與第一密封材料層16的寬度略相同。再者,第二密封材料層17的厚度比第一密封材料層16的厚度略小。A frame-shaped second sealing material layer 17 is formed on the surface of the glass cover 11. The second sealing material layer 17 is a sintered sealing material, and is composed of the same material as the first sealing material layer 16. The sealing material contains bismuth glass containing a transition metal oxide in the glass composition and refractory filler powder. Then, the width of the second sealing material layer 17 is slightly the same as the width of the first sealing material layer 16. Furthermore, the thickness of the second sealing material layer 17 is slightly smaller than the thickness of the first sealing material layer 16.

陶瓷基體10與玻璃蓋11層積配置為,玻璃蓋11為上方且第一密封材料層16與第二密封材料層17的寬度方向之中心線彼此接觸。之後,從雷射照射裝置18射出的雷射光L從玻璃蓋11側沿著第一密封材料層16與第二密封材料層17照射。藉此,第一密封材料層16與第二密封材料層17軟化流動後,陶瓷基體10與玻璃蓋11被氣密密封,形成氣密封裝體1的氣密構造。 [實施例]The ceramic base 10 and the glass cover 11 are stacked so that the glass cover 11 is above and the center lines in the width direction of the first sealing material layer 16 and the second sealing material layer 17 are in contact with each other. After that, the laser light L emitted from the laser irradiation device 18 is irradiated along the first sealing material layer 16 and the second sealing material layer 17 from the glass cover 11 side. As a result, after the first sealing material layer 16 and the second sealing material layer 17 are softened and flowed, the ceramic base 10 and the glass cover 11 are hermetically sealed to form an airtight structure of the hermetically sealed package 1. [Example]

以下,基於實施例,詳細說明本發明。另外,以下的實施例僅為例示。本發明完全不限定於以下的實施例。Hereinafter, the present invention will be described in detail based on examples. In addition, the following embodiments are only examples. The present invention is not limited to the following examples at all.

首先,以鉍系玻璃粉末為73體積%、耐火性填料粉末為27體積%的比例進行混合,製作密封材料A。於此,使鉍系玻璃粉末的平均粒徑D50 為1.0μm、99%粒徑D99 為2.5μm,使耐火性填料粉末的平均粒徑D50 為1.0μm、99%粒徑D99 為2.5μm。另外,鉍系玻璃在玻璃組成方面,在莫耳%下,含有39%的Bi2 O3 、23.7%的B2 O3 、14.1%的ZnO、2.7%的Al2 O3 、20%的CuO、0.6%的Fe2 O3 。此外耐火性填料粉末係β-鋰霞石。First, the bismuth-based glass powder was 73% by volume and the refractory filler powder was 27% by volume, and a sealing material A was produced. Here, the average particle diameter D 50 of the bismuth-based glass powder is 1.0 μm and the 99% particle diameter D 99 is 2.5 μm, and the average particle size D 50 of the refractory filler powder is 1.0 μm and 99% particle diameter D 99 is 2.5μm. In addition, in terms of glass composition, bismuth glass contains 39% Bi 2 O 3 , 23.7% B 2 O 3 , 14.1% ZnO, 2.7% Al 2 O 3 , and 20% CuO in mole% , 0.6% Fe 2 O 3 . In addition, the refractory filler powder is β-eucryptite.

測定所獲得的密封材料A的熱脹係數時,該熱脹係數係70×10- 7 /℃。另外,熱脹係數係以推桿式TMA裝置進行測定者,其測定溫度範圍係30~300℃。When the thermal expansion coefficient of the sealing material A obtained was measured, the coefficient of thermal expansion lines 70 × 10 - 7 / ℃. In addition, the thermal expansion coefficient is measured by a push-rod TMA device, and the measurement temperature range is 30 to 300 ° C.

接著,以磷酸銀系玻璃粉末為65體積%、耐火性填料粉末為35體積%的比例進行混合,製作密封材料B。於此,使磷酸銀系玻璃粉末的平均粒徑D50 為1.0μm、99%粒徑D99 為2.5μm,使耐火性填料粉末的平均粒徑D50 為1.0μm、99%粒徑D99 為2.5μm。另外,磷酸銀系玻璃在玻璃組成方面,在莫耳%下,含有32%的Ag2 O、22%的P2 O5 、27%的TeO2 、11%的ZnO、3%的Nb2 O5 、5%的CuO。此外耐火性填料粉末係NbZr(PO4 )3Next, the silver phosphate-based glass powder was 65% by volume and the refractory filler powder was 35% by volume, and the sealing material B was produced. Here, the average particle diameter D 50 of the silver phosphate-based glass powder is 1.0 μm and the 99% particle size D 99 is 2.5 μm, and the average particle size D 50 of the refractory filler powder is 1.0 μm and 99% particle size D 99 It is 2.5 μm. In addition, silver phosphate-based glass contains 32% Ag 2 O, 22% P 2 O 5 , 27% TeO 2 , 11% ZnO, and 3% Nb 2 O in mole%. 5. 5% CuO. In addition, the refractory filler powder is NbZr (PO 4 ) 3 .

測定所獲得的密封材料B的熱脹係數時,該熱脹係數係77×10- 7 /℃。另外,熱脹係數係以推桿式TMA裝置進行測定者,其測定溫度範圍係30~150℃。When the thermal expansion coefficient of the sealing material B obtained was measured, the coefficient of thermal expansion lines 77 × 10 - 7 / ℃. In addition, the thermal expansion coefficient is measured by a push-rod TMA device, and the measurement temperature range is 30 to 150 ° C.

再者,以碲系玻璃粉末為69體積%、耐火性填料粉末為31體積%的比例進行混合,製作密封材料C。於此,使碲系玻璃粉末的平均粒徑D50 為1.0μm、99%粒徑D99 為2.5μm,使耐火性填料粉末的平均粒徑D50 為1.0μm、99%粒徑D99 為2.5μm。另外,碲系玻璃在玻璃組成方面,在莫耳%下,含有72%的TeO­2 、8%的Nb2 O5 、20%的CuO。此外耐火性填料粉末係Zr2 (WO4 )(PO4 )2Furthermore, the sealing material C was produced by mixing the tellurium-based glass powder at 69% by volume and the refractory filler powder at 31% by volume. Here, the average particle diameter D 50 of tellurium-based glass powder is 1.0 μm and the 99% particle diameter D 99 is 2.5 μm, and the average particle size D 50 of the refractory filler powder is 1.0 μm and 99% particle diameter D 99 is 2.5μm. In addition, tellurium-based glass contains 72% TeO 2 , 8% Nb 2 O 5 , and 20% CuO at a mole% of glass composition. In addition, the refractory filler powder is Zr 2 (WO 4 ) (PO 4 ) 2 .

測定所獲得的密封材料C的熱脹係數時,該熱脹係數係74×10- 7 /℃。另外,熱脹係數係以推桿式TMA裝置進行測定者,其測定溫度範圍係30~250℃。When the thermal expansion coefficient of the sealing material C obtained was measured, the coefficient of thermal expansion lines 74 × 10 - 7 / ℃. In addition, the thermal expansion coefficient is measured by a push-rod TMA device, and the measurement temperature range is 30 to 250 ° C.

接著,利用記載於表中的密封材料,在具有如示於圖1的框部的陶瓷基體(縱30mm×橫30mm×基部厚度0.8mm,熱脹係數70×10- 7 /℃)的框部的頂部上形成第一密封材料層。另外,陶瓷基體係以示於表中的材料而構成,此外框部係寬度2mm、高度1.0mm的框狀。同時,利用記載於表中的密封材料,沿著記載於表中的玻璃蓋(縱30mm×橫30mm)的外周端緣上形成第二密封材料層。另外,表中的「鹼硼矽酸鹽玻璃」係日本電氣硝子株式會社製BDA,「無鹼玻璃」係日本電氣硝子株式會社製OA-10G,「鈉鈣玻璃」係市售的門窗玻璃。「玻璃陶瓷」係將包含玻璃粉末與耐火性填料粉末的生胚(green sheet)的層積片予以燒結者。Next, shown in Table sealing material, having, as shown in FIG. 1 ceramic base frame portion - the frame portion (length 30mm × horizontal 30mm × base thickness 0.8mm, the thermal expansion coefficient of 70 × 10 7 / ℃) of A first layer of sealing material is formed on the top of the. In addition, the ceramic-based system is composed of the materials shown in the table, and the frame portion has a frame shape with a width of 2 mm and a height of 1.0 mm. At the same time, using the sealing material described in the table, a second sealing material layer was formed along the outer peripheral edge of the glass cover (30 mm in length × 30 mm in width) described in the table. In the table, "alkali borosilicate glass" is BDA manufactured by NEC Glass Co., Ltd., "alkali-free glass" is OA-10G manufactured by NEC Glass Co., Ltd., and "soda lime glass" is commercially available door and window glass. "Glass ceramic" is a sintered laminated sheet containing green sheets of glass powder and refractory filler powder.

詳述之,首先以黏度成為約120Pa・s(25℃,剪率:4)的方式,將記載於表中的的密封材料、接合劑及溶劑進行混煉後,進一步以三個輥磨機進行混煉直到粉末分散為均勻,進行膏體化,獲得密封材料膏。接著,在陶瓷基體的框部的頂部上,透過絲網印刷機將上述的密封材料膏印刷為框狀。同樣,沿著玻璃蓋的外周端緣上透過絲網印刷機將密封材料膏印刷為框狀。再者,在大氣環境下,以120℃乾燥10分鐘後,在大氣環境下,以500℃燒成10分鐘,形成平均厚度6.0μm、平均寬度500μm的第一密封材料層及第二密封材料層。In detail, first, the sealing material, the bonding agent, and the solvent described in the table are kneaded so that the viscosity becomes about 120 Pa · s (25 ° C, shear rate: 4), and then three roller mills are used. Kneading is carried out until the powder is uniformly dispersed, and the paste is turned into a paste to obtain a sealing material paste. Next, on the top of the frame portion of the ceramic substrate, the above-mentioned sealing material paste is printed in a frame shape through a screen printer. Similarly, the sealing material paste is printed in a frame shape through a screen printer along the outer peripheral edge of the glass cover. Furthermore, after drying at 120 ° C for 10 minutes in an atmospheric environment, firing at 500 ° C for 10 minutes in an atmospheric environment forms a first sealing material layer and a second sealing material layer with an average thickness of 6.0 μm and an average width of 500 μm .

最後,配置為形成於陶瓷基體的框部的頂部的第一密封材料層與形成於玻璃蓋的第二密封材料層進行接觸後,從玻璃蓋側照射波長808nm、輸出8~32W的半導體雷射,使第一密封材料層及第二密封材料層軟化變形,從而將陶瓷基體與玻璃蓋進行氣密密封,獲得各氣密封裝體。Finally, after the first sealing material layer formed on the top of the frame portion of the ceramic base is in contact with the second sealing material layer formed on the glass cover, a semiconductor laser with a wavelength of 808 nm and an output of 8 to 32 W is irradiated from the glass cover side , The first sealing material layer and the second sealing material layer are softened and deformed, so that the ceramic substrate and the glass cover are hermetically sealed, and each hermetically sealed package is obtained.

就獲得的氣密封裝體,評價雷射密封後的裂痕與氣密可靠性。雷射密封後的裂痕係在以光學顯微鏡就密封部分進行觀察時,無裂痕的情況評價為「○」,有裂痕的情況評價為「×」。With regard to the gas-tight package obtained, the reliability of cracks and gas-tightness after laser sealing were evaluated. The cracks after laser sealing were evaluated as "○" when no cracks were observed when the sealed portion was observed with an optical microscope, and as "×" when cracks were present.

接著,就獲得的氣密封裝體,評價依溫度循環試驗之下的氣密可靠性。詳述之,對獲得的氣密封裝體,進行溫度循環試驗後,觀察密封材料層的附近時,就氣密可靠性將完全未確認到變質、裂痕剝離等者評價為「○」,將確認到變質、裂痕、剝離等者評價為「×」。另外,溫度循環試驗的條件係125℃⇔-55℃、1000循環。Next, the airtight package obtained was evaluated for the airtightness reliability under the temperature cycle test. In detail, after performing a temperature cycle test on the obtained gas-tight package, when observing the vicinity of the sealing material layer, the person who did not confirm the deterioration of the airtightness at all, the deterioration, cracking, etc. was evaluated as "○", and it was confirmed Those with deterioration, cracks, peeling, etc. were evaluated as “×”. In addition, the conditions of the temperature cycle test were 125 ° C--55 ° C, 1000 cycles.

接著,就獲得的氣密封裝體,評價依高溫高濕高壓試驗:HAST(Highly Accelerated Temperature and Humidity Stress test)之下的氣密可靠性。詳述之,對獲得的氣密封裝體,進行HAST後,觀察密封材料層的附近時,就氣密可靠性將完全未確認到變質、裂痕、剝離等者評價為「○」,將確認到變質、裂痕、剝離等者評價為「×」。另外,HAST的試驗條件係121℃、濕度100%、2atm、24小時。Next, the gas-tight package obtained was evaluated for hermetic reliability under the HAST (Highly Accelerated Temperature and Humidity Stress test) test. In detail, after performing HAST on the obtained gas-sealed package, when observing the vicinity of the sealing material layer, the person who did not confirm deterioration, cracks, peeling, etc. for airtight reliability was evaluated as "○", and deterioration was confirmed , Cracks, peeling, etc. are evaluated as “×”. In addition, the test conditions of HAST are 121 ° C., humidity 100%, 2 atm, and 24 hours.

如可從表1~3知悉,樣品No.1~4、8、9、12及13係雷射密封後的裂痕的評價與氣密可靠性的評價為良好。另一方面,樣品No.5~7、10、11、14及15係於陶瓷基體未形成第一密封材料層,故需要使雷射輸出上升至表中的值,使陶瓷基體的表層與第二密封材料層發生反應。此結果,樣品No.5~7、10、11、14及15係在雷射密封後產生裂痕,氣密封裝體的氣密可靠性亦低。另外,關於樣品No.5~7、10、11、14及15,在雷射密封之際使雷射輸出降低時,雷射密封強度降低,氣密可靠性的評價變為不良。 [產業上之可利用性]As can be seen from Tables 1 to 3, the evaluation of cracks after the laser sealing of Sample Nos. 1 to 4, 8, 9, 12, and 13 and the evaluation of the airtight reliability are good. On the other hand, Sample Nos. 5 to 7, 10, 11, 14, and 15 are formed on the ceramic substrate without forming the first sealing material layer, so it is necessary to increase the laser output to the value in the table, so that the surface layer of the ceramic substrate and the first The second sealing material layer reacted. As a result, Sample Nos. 5 to 7, 10, 11, 14, and 15 produced cracks after laser sealing, and the airtightness reliability of the airtight package was also low. In addition, regarding samples Nos. 5 to 7, 10, 11, 14, and 15, when the laser output is reduced at the time of laser sealing, the laser sealing strength decreases, and the evaluation of airtight reliability becomes poor. [Industry availability]

本發明的氣密封裝體係適於安裝感測器晶片、LED等的內部元件的氣密封裝體,而除此以外亦可適用於就壓電振動元件、使量子點分散於樹脂中的波長轉換元件等進行收容的氣密封裝體等。The hermetic package system of the present invention is suitable for mounting a hermetically sealed package of internal components such as sensor chips, LEDs, etc., and can also be applied to wavelength conversion of piezoelectric vibration elements and quantum dots dispersed in resin Hermetically sealed body containing components, etc.

1‧‧‧氣密封裝體1‧‧‧Airtight body

10‧‧‧陶瓷基體10‧‧‧Ceramic substrate

11‧‧‧玻璃蓋11‧‧‧Glass cover

12‧‧‧基部12‧‧‧Base

13‧‧‧框部13‧‧‧frame

14‧‧‧內部元件14‧‧‧Internal components

15‧‧‧框部的頂部15‧‧‧Top of the frame

16‧‧‧第一密封材料層16‧‧‧First sealing material layer

17‧‧‧第二密封材料層17‧‧‧Second sealing material layer

18‧‧‧雷射照射裝置18‧‧‧Laser irradiation device

L‧‧‧雷射光L‧‧‧Laser

[圖1]供於說明本發明的一實施方式用的剖面概念圖。[Fig. 1] A cross-sectional conceptual diagram for explaining an embodiment of the present invention.

Claims (14)

一種氣密封裝體之製造方法,具備以下程序:   準備陶瓷基體,並在陶瓷基體上形成第一密封材料層;   準備玻璃蓋,並在玻璃蓋上形成第二密封材料層;   以第一密封材料層與第二密封材料層接觸方式,將陶瓷基體與玻璃蓋進行層積配置;   從玻璃蓋側照射雷射光,使第一密封材料層與第二密封材料層軟化變形,從而將第一密封材料層與第二密封材料層進行氣密密封,獲得氣密封裝體。A method for manufacturing a gas-tight package, with the following procedures: Preparing a ceramic substrate and forming a first sealing material layer on the ceramic substrate; Preparing a glass cover and forming a second sealing material layer on the glass cover; The layer is in contact with the second sealing material layer, and the ceramic substrate and the glass cover are laminated; The layer and the second sealing material layer are hermetically sealed to obtain an airtight package. 如第1項的氣密封裝體之製造方法,其中,第一密封材料層含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上,且第二密封材料層含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上。The method for manufacturing a hermetically sealed package according to item 1, wherein the first sealing material layer contains any one or more of bismuth glass, silver phosphate glass, and tellurium glass, and the second sealing material layer contains bismuth glass, Any one or more of silver phosphate-based glass and tellurium-based glass. 如第1或2項的氣密封裝體之製造方法,其中,將第一密封材料層的平均厚度限制為不足8.0μm,將第二密封材料層的平均厚度限制為不足8.0μm,且將第一密封材料層的平均厚度與第二密封材料層的平均厚度的合計限制為不足15.0μm。The method for manufacturing a gas-tight package as described in item 1 or 2, wherein the average thickness of the first sealing material layer is limited to less than 8.0 μm, the average thickness of the second sealing material layer is limited to less than 8.0 μm, and the first The total thickness of the average thickness of the first sealing material layer and the average thickness of the second sealing material layer is limited to less than 15.0 μm. 如第1~3項中任一項的氣密封裝體之製造方法,其中,將第一密封材料層的平均寬度限制為不足2000μm,且將第二密封材料層的平均寬度限制為不足2000μm。The method for manufacturing an airtight package according to any one of items 1 to 3, wherein the average width of the first sealing material layer is limited to less than 2000 μm, and the average width of the second sealing material layer is limited to less than 2000 μm. 如第1~4項中任一項的氣密封裝體之製造方法,其係使用具有基部與設於基部上的框部的陶瓷基體,在框部的頂部形成第一密封材料層。The method for manufacturing a hermetically sealed package according to any one of items 1 to 4, which uses a ceramic substrate having a base portion and a frame portion provided on the base portion, and forms a first sealing material layer on top of the frame portion. 如第1~5項中任一項的氣密封裝體之製造方法,其進一步具備將第一密封材料層的表面進行研磨的程序。The method for manufacturing an airtight package according to any one of items 1 to 5, further comprising a procedure for polishing the surface of the first sealing material layer. 如第1~6項中任一項的氣密封裝體之製造方法,其中,陶瓷基體為玻璃陶瓷、氮化鋁、氧化鋁中的任一者或此等之複合材料。The method for manufacturing a gas-tight package according to any one of items 1 to 6, wherein the ceramic substrate is any one of glass ceramics, aluminum nitride, and alumina, or a composite material thereof. 如第1~7項中任一項的氣密封裝體之製造方法,其中,在陶瓷基體的框部內,收容感測器元件或LED元件。The method for manufacturing a hermetically sealed package according to any one of items 1 to 7, wherein the sensor element or the LED element is accommodated in the frame portion of the ceramic base. 一種氣密封裝體,具有陶瓷基體與玻璃蓋,   陶瓷基體具有基部與設於基部上的框部,   在陶瓷基體的框部的頂部上,形成含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上的第一密封材料層,   於玻璃蓋上,形成含有鉍系玻璃、磷酸銀系玻璃、碲系玻璃中的任一種以上的第二密封材料層,   且在第一密封材料層與第二密封材料層被接觸配置的狀態下被氣密一體化。A gas-tight package with a ceramic base and a glass cover, ceramic base has a base and a frame portion provided on the base, on the top of the frame of the ceramic base, forming bismuth-based glass, silver phosphate-based glass, tellurium-based glass Any one or more of the first sealing material layer is formed on the glass cover to form a second sealing material layer containing any one or more of bismuth-based glass, silver phosphate-based glass and tellurium-based glass, and the first sealing material layer It is airtightly integrated in a state of being arranged in contact with the second sealing material layer. 如第10項的氣密封裝體,其中,第一密封材料層含有在玻璃組成中包含過渡金屬氧化物的鉍系玻璃,且第二密封材料層含有在玻璃組成中包含過渡金屬氧化物的鉍系玻璃。The gas-sealed package according to item 10, wherein the first sealing material layer contains a bismuth glass containing a transition metal oxide in the glass composition, and the second sealing material layer contains bismuth containing a transition metal oxide in the glass composition Department of glass. 如第9或10項的氣密封裝體,其中,第一密封材料層的平均厚度不足8.0μm,第二密封材料層的平均厚度不足8.0μm,且第一密封材料層的平均厚度與第二密封材料層的平均厚度的合計不足15.0μm。The gas-sealed package according to item 9 or 10, wherein the average thickness of the first sealing material layer is less than 8.0 μm, the average thickness of the second sealing material layer is less than 8.0 μm, and the average thickness of the first sealing material layer and the second The total average thickness of the sealing material layer is less than 15.0 μm. 如第9~11項中任一項的氣密封裝體,其中,第一密封材料層的平均寬度不足2000μm,且第二密封材料層的平均寬度不足2000μm。The hermetically sealed package according to any one of items 9 to 11, wherein the average width of the first sealing material layer is less than 2000 μm, and the average width of the second sealing material layer is less than 2000 μm. 如第9~12項中任一項的氣密封裝體,其中,陶瓷基體為玻璃陶瓷、氮化鋁、氧化鋁中的任一者或此等之複合材料。The hermetically sealed package according to any one of items 9 to 12, wherein the ceramic substrate is any one of glass ceramic, aluminum nitride, aluminum oxide, or a composite material of these. 如第9~13項中任一項的氣密封裝體,其中,在陶瓷基體的框部內,收容感測器元件或LED元件。The hermetically sealed package according to any one of items 9 to 13, wherein the sensor element or the LED element is accommodated in the frame portion of the ceramic base.
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