TWI762584B - Bismuth-based glass powder, sealing material, and hermetic package - Google Patents

Bismuth-based glass powder, sealing material, and hermetic package Download PDF

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TWI762584B
TWI762584B TW107105743A TW107105743A TWI762584B TW I762584 B TWI762584 B TW I762584B TW 107105743 A TW107105743 A TW 107105743A TW 107105743 A TW107105743 A TW 107105743A TW I762584 B TWI762584 B TW I762584B
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sealing material
glass
material layer
package
bismuth
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TW107105743A
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TW201840499A (en
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廣瀬将行
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日商日本電氣硝子股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/06Containers; Seals characterised by the material of the container or its electrical properties
    • H01L23/08Containers; Seals characterised by the material of the container or its electrical properties the material being an electrical insulator, e.g. glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/10Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Abstract

本發明的技術課題在於創作一種難以於氣密封裝體內的內部元件中產生軟錯誤的鉍系玻璃。為了解決該課題,本發明的鉍系玻璃粉末的特徵在於:α射線放出率為0.15 cph/cm2 以下。The technical subject of the present invention is to create a bismuth-based glass that is difficult to generate soft errors in internal elements in a hermetically sealed package. In order to solve this problem, the bismuth-based glass powder of the present invention is characterized in that the α-ray emission rate is 0.15 cph/cm 2 or less.

Description

鉍系玻璃粉末、密封材料以及氣密封裝體Bismuth-based glass powder, sealing material, and hermetic package

本發明是有關於一種鉍系玻璃粉末、密封材料以及氣密封裝體,具體而言,是有關於一種α射線放出率低的鉍系玻璃粉末、密封材料以及氣密封裝體。The present invention relates to a bismuth-based glass powder, a sealing material, and a hermetically sealed package, and specifically, to a bismuth-based glass powder with a low alpha ray emission rate, a sealing material, and a hermetically sealed package.

氣密封裝體一般具備封裝體基體、具有透光性的玻璃蓋、以及該些的內部中所收納的內部元件。A hermetically sealed package generally includes a package body, a light-transmitting glass cover, and internal elements housed in these.

安裝於氣密封裝體的內部的感測器元件等內部元件存在因自周圍環境浸入的水分而劣化之虞。至今,為了將封裝體基體與玻璃蓋一體化而使用具有低溫硬化性的有機樹脂系接著劑。但是,有機樹脂系接著劑無法完全遮蔽水分或氣體,因此存在使內部元件經時劣化之虞。Internal elements such as sensor elements mounted inside the hermetically sealed package may be degraded by moisture infiltrating from the surrounding environment. Heretofore, an organic resin-based adhesive having low-temperature curability has been used in order to integrate the package base and the glass cover. However, since the organic resin-based adhesive cannot completely shield moisture and gas, there is a possibility of deteriorating internal elements with time.

另一方面,若使用包含鉍系玻璃粉末與耐火性填料粉末的密封材料,則密封部分不易因周圍環境的水分而劣化,從而容易確保氣密封裝體的氣密可靠性。On the other hand, when a sealing material containing bismuth-based glass powder and refractory filler powder is used, the sealing portion is less likely to be deteriorated by moisture in the surrounding environment, and it is easy to ensure the airtight reliability of the airtight package.

但是,鉍系玻璃粉末的軟化溫度高於有機樹脂系接著劑,因此存在於密封時使內部元件發生熱劣化之虞。就此種情況而言,近年來雷射密封受到關注。根據雷射密封,能夠僅將應密封的部分進行局部加熱,且可於不使內部元件發生熱劣化的情況下將封裝體基體與玻璃蓋氣密一體化。 [現有技術文獻] [專利文獻]However, since the softening temperature of the bismuth-based glass powder is higher than that of the organic resin-based adhesive, there is a possibility of thermal degradation of the internal elements during sealing. In this context, laser sealing has received attention in recent years. According to the laser sealing, only the portion to be sealed can be locally heated, and the package body and the glass cover can be airtightly integrated without thermally deteriorating the internal elements. [Prior Art Document] [Patent Document]

[專利文獻1]日本專利特開2013-239609號公報 [專利文獻2]日本專利特開2014-236202號公報[Patent Document 1] Japanese Patent Laid-Open No. 2013-239609 [Patent Document 2] Japanese Patent Laid-Open No. 2014-236202

[發明所欲解決之課題] 然而,於使用包含鉍系玻璃粉末的密封材料而對玻璃蓋與封裝體基體進行雷射密封來製作氣密封裝體的情況下,有時所獲得的氣密封裝體內的內部元件因軟錯誤(soft error)而引起誤動作,導致氣密封裝體的可靠性降低。THE PROBLEM TO BE SOLVED BY THE INVENTION However, when a hermetic package is produced by laser-sealing a glass cover and a package base using a sealing material containing bismuth-based glass powder, the obtained hermetic package may be obtained. Internal components inside the body malfunction due to soft errors, resulting in a decrease in reliability of the hermetic package.

因此,本發明是鑑於所述情況而成,其技術課題在於創作一種難以於氣密封裝體內的內部元件中產生軟錯誤的鉍系玻璃。Therefore, the present invention has been made in view of the above-mentioned circumstances, and its technical subject is to create a bismuth-based glass that is difficult to generate soft errors in internal elements in a hermetic package.

[解決課題之手段] 本發明者發現,藉由減少鉍系玻璃粉末的α射線放出率,可解決所述技術課題,並作為本發明而提出。即,本發明的鉍系玻璃粉末的特徵在於:α射線放出率為0.15 cph/cm2 以下。此處,所謂「鉍系玻璃粉末」是指以Bi2 O3 為主成分的玻璃粉末,具體而言是指玻璃組成中的Bi2 O3 的含量為25莫耳%以上的玻璃粉末。「α射線放出率」可藉由市售的閃爍計數器(scintillation counter)來進行測定。[MEANS TO SOLVE THE PROBLEM] The present inventors discovered that the said technical subject can be solved by reducing the alpha-ray emission rate of a bismuth-type glass powder, and proposes as this invention. That is, the bismuth-based glass powder of the present invention is characterized in that the α-ray emission rate is 0.15 cph/cm 2 or less. Here, "bismuth-based glass powder" refers to glass powder mainly composed of Bi 2 O 3 , and specifically refers to glass powder in which the content of Bi 2 O 3 in the glass composition is 25 mol % or more. The "α-ray emission rate" can be measured by a commercially available scintillation counter.

本發明的鉍系玻璃粉末的特徵在於:α射線放出率為0.15 cph/cm2 以下。內部元件的軟錯誤的原因為自鉍系玻璃中放出的α射線的電離作用。而且,若使鉍系玻璃的α射線放出率降低為0.15 cph/cm2 以下,則可防止內部元件的軟錯誤。再者,現有的鉍系玻璃粉末的α射線放出率為0.30 cph/cm2 ~5.00 cph/cm2 左右。The bismuth-based glass powder of the present invention is characterized in that the α-ray emission rate is 0.15 cph/cm 2 or less. The cause of the soft error of the internal element is the ionization of alpha rays emitted from the bismuth-based glass. Furthermore, when the α-ray emission rate of the bismuth-based glass is reduced to 0.15 cph/cm 2 or less, soft errors in internal elements can be prevented. In addition, the α-ray emission rate of the conventional bismuth-based glass powder is about 0.30 cph/cm 2 to 5.00 cph/cm 2 .

鉍系玻璃粉末的α射線放出率與玻璃原料中的α射線放出率有關。即,若降低玻璃原料的α射線放出率,則容易將鉍系玻璃粉末的α射線放出率減少為0.15 cph/cm2 以下。特別是Bi2 O3 的導入原料與其他玻璃原料相比具有α射線放出率高的傾向,因此極為有效的是減少Bi2 O3 的導入原料的α射線放出率。再者,若反覆精煉玻璃原料(特別是氧化鉍),則玻璃原料中的放射性同位素元素(U、Th等)的含量變少,可減少玻璃原料的α射線放出率。The α-ray emission rate of the bismuth-based glass powder is related to the α-ray emission rate in the glass raw material. That is, when the α-ray emission rate of the glass raw material is lowered, the α-ray emission rate of the bismuth-based glass powder can be easily reduced to 0.15 cph/cm 2 or less. In particular, the introduction material of Bi 2 O 3 tends to have a higher α-ray emission rate than other glass raw materials, so it is extremely effective to reduce the α-ray emission rate of the Bi 2 O 3 introduction material. Furthermore, if the glass raw material (especially bismuth oxide) is repeatedly refined, the content of radioisotope elements (U, Th, etc.) in the glass raw material decreases, and the α-ray emission rate of the glass raw material can be reduced.

第二,本發明的密封材料的特徵在於:含有40體積%~100體積%的鉍系玻璃粉末、0體積%~60體積%的耐火性填料粉末,α射線放出率為0.15 cph/cm2 以下。鉍系玻璃與其他玻璃系比較而具有於雷射密封時容易於封裝體基體(特別是陶瓷基體)的表層形成反應層的優點。另外,耐火性填料粉末可提高密封材料層的機械強度,且可降低密封材料層的熱膨脹係數。Second, the sealing material of the present invention is characterized in that it contains 40 to 100% by volume of bismuth-based glass powder, 0 to 60% by volume of refractory filler powder, and has an alpha ray emission rate of 0.15 cph/cm 2 or less. . Compared with other glass-based glasses, bismuth-based glass has the advantage that it is easy to form a reaction layer on the surface layer of the package substrate (especially the ceramic substrate) during laser sealing. In addition, the refractory filler powder can improve the mechanical strength of the sealing material layer, and can reduce the thermal expansion coefficient of the sealing material layer.

第三,本發明的氣密封裝體較佳為於封裝體基體與玻璃蓋介隔密封材料層進行氣密密封而成的氣密封裝體中,該密封材料層為密封材料的燒結體,該密封材料為所述密封材料。Third, the hermetic package of the present invention is preferably a hermetic package formed by air-tight sealing between the package body and the glass cover via a sealing material layer, the sealing material layer being a sintered body of the sealing material, and the sealing material layer being a sintered body of the sealing material. The sealing material is the sealing material.

第四,本發明的氣密封裝體較佳為氣密封裝體內部的密封材料層的α射線放出量未滿氣密封裝體內部的玻璃蓋的α射線放出量的1/7。此處,「氣密封裝體內部的密封材料層的α射線放出量」是指藉由對自配置有內部元件之側露出的密封材料層的表面積乘以密封材料層的α射線放出率而算出的值。「氣密封裝體內部的玻璃蓋的α射線放出量」是指藉由對自配置有內部元件之側露出的玻璃蓋的表面積乘以玻璃蓋的α射線放出率而算出的值。Fourth, in the hermetic package of the present invention, it is preferable that the α-ray emission amount of the sealing material layer inside the hermetic package is less than 1/7 of the α-ray emission amount of the glass cover inside the hermetic package. Here, the "α-ray emission amount of the sealing material layer inside the hermetic package" is calculated by multiplying the surface area of the sealing material layer exposed from the side where the internal elements are arranged by the α-ray emission rate of the sealing material layer value of . The "α-ray emission amount of the glass cover inside the hermetic package" is a value calculated by multiplying the surface area of the glass cover exposed from the side where the internal elements are arranged by the α-ray emission rate of the glass cover.

第五,本發明的氣密封裝體較佳為密封材料層的平均厚度未滿8.0 μm。若如此,則難以產生內部元件的軟錯誤。Fifth, in the hermetic package of the present invention, the average thickness of the sealing material layer is preferably less than 8.0 μm. In this case, it is difficult to generate soft errors in internal elements.

第六,本發明的氣密封裝體較佳為封裝體基體具有基部與設於基部上的框部,於封裝體基體的框部內(由框部、基部及玻璃蓋構成的空間內)收納有內部元件,於封裝體基體的框部的頂部與玻璃蓋之間配設有密封材料層。若如此,則容易將感測器元件等內部元件收納於框部內。Sixthly, in the hermetic package of the present invention, preferably, the package base has a base portion and a frame portion provided on the base portion. For the internal components, a sealing material layer is arranged between the top of the frame portion of the package body and the glass cover. In this way, internal elements such as sensor elements can be easily accommodated in the frame portion.

第七,本發明的氣密封裝體較佳為封裝體基體為玻璃、玻璃陶瓷、氮化鋁、氧化鋁的任一者、或該些的複合材料。Seventh, the hermetic package of the present invention is preferably any one of glass, glass ceramics, aluminum nitride, aluminum oxide, or a composite material of these as the package body matrix.

以下,參照圖式對本發明進行說明。圖1是用以說明本發明的一實施形態的概略剖面圖。由圖1可知,氣密封裝體1具備封裝體基體10與玻璃蓋11。另外,封裝體基體10具有基部12與基部12的外周邊緣上的框緣狀的框部13。而且,於封裝體基體10的框部13內收納有內部元件(例如,感測器元件)14。再者,於封裝體基體10內形成有將內部元件(例如,感測器元件)14與外部電性連接的電氣配線(未圖示)。Hereinafter, the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view for explaining an embodiment of the present invention. As can be seen from FIG. 1 , the hermetic package 1 includes a package base 10 and a glass cover 11 . In addition, the package body 10 has a base portion 12 and a frame-shaped frame portion 13 on the outer peripheral edge of the base portion 12 . Furthermore, an internal element (for example, a sensor element) 14 is accommodated in the frame portion 13 of the package base 10 . Furthermore, electrical wirings (not shown) that electrically connect the internal elements (eg, sensor elements) 14 to the outside are formed in the package body 10 .

密封材料層15的α射線放出率為0.15 cph/cm2 以下,密封材料層15是於封裝體基體10的框部13的頂部與玻璃蓋11的內部元件14側的表面之間遍及框部13的頂部的周邊而配設。另外,密封材料層15包含α射線放出率為0.15 cph/cm2 以下的鉍系玻璃與耐火性填料粉末,但實質上不包含雷射吸收材。而且,密封材料層15的寬度比封裝體基體10的框部13的頂部的寬度小,進而與玻璃蓋11的邊緣隔開。進而,密封材料層15的平均厚度未滿8.0 μm。The α-ray emission rate of the sealing material layer 15 is 0.15 cph/cm 2 or less, and the sealing material layer 15 extends over the frame portion 13 between the top of the frame portion 13 of the package base 10 and the surface of the glass cover 11 on the inner element 14 side. The perimeter of the top is equipped. In addition, the sealing material layer 15 contains a bismuth-based glass and a refractory filler powder with an α-ray emission rate of 0.15 cph/cm 2 or less, but does not substantially contain a laser absorbing material. Furthermore, the width of the sealing material layer 15 is smaller than the width of the top of the frame portion 13 of the package body 10 , and is further separated from the edge of the glass cover 11 . Furthermore, the average thickness of the sealing material layer 15 is less than 8.0 μm.

另外,所述氣密封裝體1可以如下方式來製作。首先,以密封材料層15與框部13的頂部相接的方式,將預先形成有密封材料層15的玻璃蓋11載置於封裝體基體10上。繼而,使用按壓夾具一面按壓玻璃蓋11,一面自玻璃蓋11側沿著密封材料層15來照射自雷射照射裝置出射的雷射光L。藉此,密封材料層15軟化流動,與封裝體基體10的框部13的頂部的表層進行反應,藉此封裝體基體10與玻璃蓋11進行氣密一體化,從而形成氣密封裝體1的氣密結構。In addition, the airtight package 1 can be produced as follows. First, the cover glass 11 having the sealing material layer 15 formed in advance is placed on the package base 10 so that the sealing material layer 15 is in contact with the top of the frame portion 13 . Next, while pressing the glass cover 11 using a pressing jig, the laser light L emitted from the laser irradiation device is irradiated along the sealing material layer 15 from the glass cover 11 side. Thereby, the sealing material layer 15 softens and flows, reacts with the surface layer on the top of the frame portion 13 of the package body 10 , and thereby airtightly integrates the package body 10 and the glass cover 11 , thereby forming a hermetic package 1 . Airtight structure.

本發明的鉍系玻璃粉末的α射線放出率為0.15 cph/cm2 以下,較佳為0.12 cph/cm2 以下、0.10 cph/cm2 以下、0.01 cph/cm2 ~0.08 cph/cm2 。若鉍系玻璃粉末的α射線放出率過高,則容易產生內部元件的軟錯誤。再者,於鉍系玻璃粉末的α射線放出率過低的情況下,需要高精煉的玻璃原料,鉍系玻璃粉末的原料成本容易高漲。The α-ray emission rate of the bismuth-based glass powder of the present invention is 0.15 cph/cm 2 or less, preferably 0.12 cph/cm 2 or less, 0.10 cph/cm 2 or less, and 0.01 cph/cm 2 to 0.08 cph/cm 2 . When the α-ray emission rate of the bismuth-based glass powder is too high, soft errors in internal elements are likely to occur. Furthermore, when the α-ray emission rate of the bismuth-based glass powder is too low, a highly refined glass raw material is required, and the raw material cost of the bismuth-based glass powder tends to increase.

鉍系玻璃粉末較佳為以莫耳%計而含有28%~60%的Bi2 O3 、15%~37%的B2 O3 、1%~30%的ZnO作為玻璃組成。以下說明如所述般限定各成分的含有範圍的理由。再者,於玻璃組成範圍的說明中,%的表示是指莫耳%。The bismuth-based glass powder preferably contains 28% to 60% of Bi 2 O 3 , 15% to 37% of B 2 O 3 , and 1% to 30% of ZnO as a glass composition in mol %. The reason for limiting the content range of each component as described above will be described below. In addition, in the description of the glass composition range, the representation of % means mole %.

Bi2 O3 是用以使軟化點降低的主要成分。Bi2 O3 的含量較佳為28%~60%、33%~55%、特別是35%~45%。若Bi2 O3 的含量過少,則軟化點過高,軟化流動性變得容易降低。另一方面,若Bi2 O3 的含量過多,則於雷射密封時玻璃變得容易失透,由於該失透而造成軟化流動性變得容易降低。Bi 2 O 3 is a main component for lowering the softening point. The content of Bi 2 O 3 is preferably 28% to 60%, 33% to 55%, especially 35% to 45%. When the content of Bi 2 O 3 is too small, the softening point is too high, and the softening fluidity tends to decrease. On the other hand, when the content of Bi 2 O 3 is too large, the glass tends to devitrify at the time of laser sealing, and the softening fluidity tends to decrease due to the devitrification.

B2 O3 是作為玻璃形成成分而必需的成分。B2 O3 的含量較佳為15%~37%、19%~33%、特別是22%~30%。若B2 O3 的含量過少,則變得難以形成玻璃網狀物,因此於雷射密封時玻璃變得容易失透。另一方面,若B2 O3 的含量過多,則玻璃的黏性變高,軟化流動性變得容易降低。B 2 O 3 is an essential component as a glass-forming component. The content of B 2 O 3 is preferably 15% to 37%, 19% to 33%, especially 22% to 30%. When the content of B 2 O 3 is too small, it becomes difficult to form a glass network, and thus the glass tends to devitrify at the time of laser sealing. On the other hand, when the content of B 2 O 3 is too large, the viscosity of the glass increases, and the softening fluidity tends to decrease.

ZnO是提高耐失透性的成分。ZnO的含量較佳為1%~30%、3%~25%、5%~22%、特別是5%~20%。若ZnO的含量為所述範圍外,則玻璃組成的成分平衡崩潰,耐失透性反而變得容易降低。ZnO is a component which improves devitrification resistance. The content of ZnO is preferably 1% to 30%, 3% to 25%, 5% to 22%, especially 5% to 20%. When the content of ZnO is outside the above-mentioned range, the component balance of the glass composition collapses, and the devitrification resistance tends to decrease on the contrary.

除所述成分以外,例如亦可添加以下的成分。In addition to the above-mentioned components, for example, the following components may be added.

SiO2 是提高耐水性的成分。SiO2 的含量較佳為0%~5%、0%~3%、0%~2%、特別是0%~1%。若SiO2 的含量過多,則存在軟化點不合理地上昇之虞。另外,於雷射密封時,玻璃變得容易失透。SiO 2 is a component that improves water resistance. The content of SiO 2 is preferably 0% to 5%, 0% to 3%, 0% to 2%, especially 0% to 1%. When the content of SiO 2 is too large, the softening point may increase unreasonably. In addition, the glass tends to devitrify at the time of laser sealing.

Al2 O3 是提高耐水性的成分。Al2 O3 的含量較佳為0%~10%、0.1%~5%、特別是0.5%~3%。若Al2 O3 的含量過多,則存在軟化點不合理地上昇之虞。Al 2 O 3 is a component that improves water resistance. The content of Al 2 O 3 is preferably 0% to 10%, 0.1% to 5%, particularly 0.5% to 3%. When the content of Al 2 O 3 is too large, the softening point may increase unreasonably.

Li2 O、Na2 O及K2 O是使耐失透性降低的成分。因此,Li2 O、Na2 O及K2 O的含量較佳為分別為0%~5%、0%~3%、特別是0%~未滿1%。Li 2 O, Na 2 O, and K 2 O are components that reduce devitrification resistance. Therefore, the content of Li 2 O, Na 2 O and K 2 O is preferably 0% to 5%, 0% to 3%, particularly 0% to less than 1%, respectively.

MgO、CaO、SrO及BaO是提高耐失透性的成分,卻是使軟化點上昇的成分。因此,MgO、CaO、SrO及BaO的含量較佳為分別為0%~20%、0%~10%、特別是0%~5%。MgO, CaO, SrO, and BaO are components that improve the devitrification resistance, but are components that increase the softening point. Therefore, the content of MgO, CaO, SrO and BaO is preferably 0% to 20%, 0% to 10%, particularly 0% to 5%, respectively.

為了使鉍系玻璃的軟化點降低,需要於玻璃組成中導入大量Bi2 O3 ,但若使Bi2 O3 的含量增加,則於雷射密封時玻璃變得容易失透,由於該失透而造成軟化流動性變得容易降低。特別是若Bi2 O3 的含量成為30%以上,則該傾向變顯著。作為其對策,若添加CuO,則即使Bi2 O3 的含量為30%以上,亦可有效地抑制耐失透性的降低。若進而添加CuO,則可提高雷射密封時的雷射吸收特性。CuO的含量較佳為0%~40%、1%~40%、5%~35%、10%~30%、特別是13%~25%。若CuO的含量過多,則有損玻璃組成的成分平衡,耐失透性反而變得容易降低。另外,密封材料層的總光線透過率過低,難以對封裝體基體與密封材料層的邊界區域進行局部加熱。In order to lower the softening point of bismuth-based glass, it is necessary to introduce a large amount of Bi 2 O 3 into the glass composition. However, if the content of Bi 2 O 3 is increased, the glass tends to devitrify during laser sealing. As a result, the softening fluidity becomes easy to decrease. In particular, this tendency becomes remarkable when the content of Bi 2 O 3 is 30% or more. As a countermeasure for this, if CuO is added, even if the content of Bi 2 O 3 is 30% or more, the decrease in devitrification resistance can be effectively suppressed. When CuO is further added, the laser absorption characteristics at the time of laser sealing can be improved. The content of CuO is preferably 0% to 40%, 1% to 40%, 5% to 35%, 10% to 30%, especially 13% to 25%. When the content of CuO is too large, the component balance of the glass composition is impaired, and the devitrification resistance tends to decrease on the contrary. In addition, the total light transmittance of the sealing material layer is too low, and it is difficult to locally heat the boundary region between the package body and the sealing material layer.

Fe2 O3 是提高耐失透性與雷射吸收特性的成分。Fe2 O3 的含量較佳為0%~10%、0.1%~5%、特別是0.4%~2%。若Fe2 O3 的含量過多,則玻璃組成的成分平衡崩潰,耐失透性反而變得容易降低。Fe 2 O 3 is a component that improves devitrification resistance and laser absorption properties. The content of Fe 2 O 3 is preferably 0% to 10%, 0.1% to 5%, particularly 0.4% to 2%. When the content of Fe 2 O 3 is too large, the component balance of the glass composition is collapsed, and the devitrification resistance tends to decrease on the contrary.

MnO是提高雷射吸收特性的成分。MnO的含量較佳為0%~25%、特別是5%~15%。若MnO的含量過多,則耐失透性變得容易降低。MnO is a component that improves laser absorption characteristics. The content of MnO is preferably 0% to 25%, particularly 5% to 15%. When the content of MnO is too large, the devitrification resistance tends to decrease.

Sb2 O3 是提高耐失透性的成分。Sb2 O3 的含量較佳為0%~5%、特別是0%~2%。若Sb2 O3 的含量過多,則玻璃組成的成分平衡崩潰,耐失透性反而變得容易降低。Sb 2 O 3 is a component that improves devitrification resistance. The content of Sb 2 O 3 is preferably 0% to 5%, particularly 0% to 2%. When the content of Sb 2 O 3 is too large, the component balance of the glass composition is collapsed, and the devitrification resistance tends to decrease on the contrary.

鉍系玻璃粉末的平均粒徑D50 較佳為未滿15 μm、0.5 μm~10 μm、特別是1 μm~5 μm。鉍系玻璃粉末的平均粒徑D50 越小,則鉍系玻璃粉末的軟化點越降低。此處,「平均粒徑D50 」是指藉由雷射繞射法,以體積基準而測定的值。The average particle diameter D50 of the bismuth-based glass powder is preferably less than 15 μm, 0.5 μm to 10 μm, particularly 1 μm to 5 μm. The smaller the average particle diameter D50 of the bismuth-based glass powder, the lower the softening point of the bismuth-based glass powder. Here, the "average particle diameter D 50 " refers to a value measured on a volume basis by a laser diffraction method.

本發明的密封材料含有40體積%~100體積%的鉍系玻璃粉末、0體積%~60體積%的耐火性填料粉末,較佳為含有55體積%~95體積%的鉍系玻璃粉末、5體積%~45體積%的耐火性填料粉末,更佳為含有60體積%~85體積%的鉍系玻璃粉末、15體積%~40體積%的耐火性填料粉末,特佳為含有60體積%~80體積%的鉍系玻璃粉末、20體積%~40體積%的耐火性填料粉末。鉍系玻璃粉末是於雷射密封時發生軟化變形而將封裝體基體與玻璃蓋氣密一體化的成分。耐火性填料粉末是作為骨材而起作用,使密封材料的熱膨脹係數降低且提高機械強度的成分。但是,若耐火性填料粉末的含量過多,則玻璃粉末的含量相對性變少,因此密封材料層的表面平滑性降低,雷射密封的精度變得容易降低。再者,於密封材料層中除玻璃粉末與耐火性填料粉末以外,亦可包含雷射吸收材,以提高光吸收特性。The sealing material of the present invention contains 40% to 100% by volume of bismuth-based glass powder, 0% to 60% by volume of refractory filler powder, preferably 55% to 95% by volume of bismuth-based glass powder, 5 The refractory filler powder in volume % to 45 volume %, more preferably bismuth-based glass powder in 60 volume % to 85 volume %, and refractory filler powder in 15 volume % to 40 volume %, particularly preferably 60 volume % to 60 volume %. 80% by volume of bismuth-based glass powder, 20% by volume to 40% by volume of refractory filler powder. The bismuth-based glass powder is a component that softens and deforms during laser sealing to airtightly integrate the package body and the glass cover. The refractory filler powder acts as an aggregate to lower the thermal expansion coefficient of the sealing material and increase the mechanical strength. However, when the content of the refractory filler powder is too large, the content of the glass powder is relatively small, so that the surface smoothness of the sealing material layer is lowered, and the precision of the laser sealing tends to be lowered. Furthermore, in addition to the glass powder and the refractory filler powder, the sealing material layer may also contain a laser absorbing material to improve light absorption properties.

本發明的密封材料中,α射線放出率為0.15 cph/cm2 以下,較佳為0.12 cph/cm2 以下、0.10 cph/cm2 以下、0.01 cph/cm2 ~0.08 cph/cm2 。若密封材料的α射線放出率過高,則容易產生內部元件的軟錯誤。再者,於密封材料的α射線放出率過低的情況下,需要高精煉的玻璃原料,密封材料的原料成本容易高漲。In the sealing material of the present invention, the α-ray emission rate is 0.15 cph/cm 2 or less, preferably 0.12 cph/cm 2 or less, 0.10 cph/cm 2 or less, and 0.01 cph/cm 2 to 0.08 cph/cm 2 . If the α-ray emission rate of the sealing material is too high, soft errors of internal elements are likely to occur. Furthermore, when the α-ray emission rate of the sealing material is too low, a highly refined glass raw material is required, and the raw material cost of the sealing material tends to increase.

密封材料的軟化點較佳為510℃以下、480℃以下、特別是450℃以下。若密封材料的軟化點過高,則難以提高密封材料層的表面平滑性。密封材料的軟化點的下限並無特別設定,若考慮玻璃粉末的熱穩定性,則密封材料的軟化點較佳為350℃以上。此處,「軟化點」是藉由大型DTA裝置測定時的第四反曲點,相當於圖2中的Ts。The softening point of the sealing material is preferably 510°C or lower, 480°C or lower, particularly 450°C or lower. When the softening point of the sealing material is too high, it is difficult to improve the surface smoothness of the sealing material layer. The lower limit of the softening point of the sealing material is not particularly set, but when the thermal stability of the glass powder is considered, the softening point of the sealing material is preferably 350° C. or higher. Here, the "softening point" is the fourth inflection point when measured by a large-scale DTA apparatus, and corresponds to Ts in FIG. 2 .

耐火性填料粉末較佳為選自堇青石、氧化錫、氧化鈮、矽鋅礦、β-鋰霞石、β-石英固溶體中的一種或兩種以上,特佳為β-鋰霞石或堇青石。該些耐火性填料粉末除α射線放出率與熱膨脹係數低以外,機械強度高,而且與鉍系玻璃的適合性良好。The refractory filler powder is preferably one or more selected from the group consisting of cordierite, tin oxide, niobium oxide, willemite, β-eucryptite, and β-quartz solid solution, particularly preferably β-eucryptite or cordierite. These refractory filler powders have high mechanical strength, in addition to low α-ray emission rate and thermal expansion coefficient, and good compatibility with bismuth-based glass.

耐火性填料粉末的平均粒徑D50 較佳為未滿2 μm、特別是0.1 μm以上且未滿1.5 μm。若耐火性填料粉末的平均粒徑D50 過大,則密封材料層的表面平滑性容易降低,並且密封材料層的平均厚度容易變大,結果,雷射密封的精度容易降低。The average particle diameter D50 of the refractory filler powder is preferably less than 2 μm, particularly 0.1 μm or more and less than 1.5 μm. When the average particle diameter D50 of the refractory filler powder is too large, the surface smoothness of the sealing material layer is likely to decrease, and the average thickness of the sealing material layer is likely to increase. As a result, the precision of the laser sealing is likely to decrease.

耐火性填料粉末的99%粒徑D99 較佳為未滿5 μm、4 μm以下、特別是0.3 μm以上且3 μm以下。若耐火性填料粉末的99%粒徑D99 過大,則密封材料層的表面平滑性容易降低,並且密封材料層的平均厚度容易變大,結果,雷射密封的精度容易降低。此處,「99%粒徑D99 」是指藉由雷射繞射法,以體積基準而測定的值。The 99% particle diameter D 99 of the refractory filler powder is preferably less than 5 μm and 4 μm or less, particularly 0.3 μm or more and 3 μm or less. When the 99% particle size D 99 of the refractory filler powder is too large, the surface smoothness of the sealing material layer tends to decrease, and the average thickness of the sealing material layer tends to increase. As a result, the precision of laser sealing tends to decrease. Here, “99% particle size D 99 ” refers to a value measured on a volume basis by a laser diffraction method.

為了提高光吸收特性,密封材料亦可進而包含雷射吸收材,雷射吸收材具有助長鉍系玻璃的失透的作用。因此,密封材料中的雷射吸收材的含量較佳為以15體積%以下、10體積%以下、5體積%以下、1體積%以下、0.5體積%以下、特別是實質上不含有(0.1體積%以下)為宜。於鉍系玻璃的耐失透性良好的情況下,為了提高雷射吸收特性,亦可導入1體積%以上、特別是3體積%以上的雷射吸收材。再者,作為雷射吸收材,可使用Cu系氧化物、Fe系氧化物、Cr系氧化物、Mn系氧化物及該些的尖晶石型複合氧化物等。In order to improve the light absorption characteristics, the sealing material may further include a laser absorbing material, and the laser absorbing material has the effect of promoting the devitrification of the bismuth-based glass. Therefore, the content of the laser absorbing material in the sealing material is preferably 15 vol % or less, 10 vol % or less, 5 vol % or less, 1 vol % or less, 0.5 vol % or less, and especially not substantially contained (0.1 vol % or less). % or less) is appropriate. When the devitrification resistance of the bismuth-based glass is good, in order to improve the laser absorption characteristics, a laser absorbing material may be introduced in an amount of 1 vol % or more, especially 3 vol % or more. In addition, as a laser absorbing material, a Cu-based oxide, an Fe-based oxide, a Cr-based oxide, a Mn-based oxide, a spinel-type composite oxide thereof, or the like can be used.

密封材料(密封材料層)的熱膨脹係數較佳為55×10-7 /℃~95×10-7 /℃、60×10-7 /℃~82×10-7 /℃、特別是65×10-7 /℃~76×10-7 /℃。若如此,則密封材料層的熱膨脹係數容易與玻璃蓋或封裝體基體的熱膨脹係數匹配。再者,「熱膨脹係數」是於30℃~300℃的溫度範圍內,藉由推桿式熱膨脹係數測定(TMA)裝置而測定的值。The thermal expansion coefficient of the sealing material (sealing material layer) is preferably 55×10 -7 /°C to 95×10 -7 /°C, 60×10 -7 /°C to 82×10 -7 /°C, particularly 65×10 -7 /℃~76× 10-7 /℃. In this way, the thermal expansion coefficient of the sealing material layer is easily matched with the thermal expansion coefficient of the glass cover or the package base. In addition, "thermal expansion coefficient" is the value measured by the push rod type thermal expansion coefficient measurement (TMA) apparatus in the temperature range of 30 degreeC - 300 degreeC.

本發明的氣密封裝體的特徵在於:於封裝體基體與玻璃蓋介隔密封材料層進行氣密密封而成的氣密封裝體中,該密封材料層為密封材料的燒結體,該密封材料為所述密封材料。以下,對本發明的氣密封裝體進行詳細說明。The hermetic package of the present invention is characterized in that: in the hermetic package formed by airtight sealing between the package body and the glass cover via a sealing material layer, the sealing material layer is a sintered body of the sealing material, and the sealing material for the sealing material. Hereinafter, the airtight package of the present invention will be described in detail.

本發明的氣密封裝體中,封裝體基體較佳為具有基部與設於基部上的框部。若如此,則容易將感測器元件等內部元件收納於封裝體基體的框部內。封裝體基體的框部較佳為沿封裝體基體的外側邊緣區域以框緣狀形成。若如此,則可擴大作為器件發揮功能的有效面積。另外,容易將感測器元件等內部元件收納於封裝體基體的框部內,且亦容易進行配線接合等。In the hermetic package of the present invention, the package base preferably has a base portion and a frame portion provided on the base portion. In this way, internal elements such as sensor elements can be easily accommodated in the frame portion of the package base. The frame portion of the package body is preferably formed in a frame shape along the outer edge region of the package body. In this way, the effective area functioning as a device can be enlarged. In addition, internal elements such as sensor elements can be easily accommodated in the frame portion of the package base body, and wire bonding and the like can also be easily performed.

框部的頂部中的配設有密封材料層的區域的表面的表面粗糙度Ra較佳為未滿1.0 μm。若該表面的表面粗糙度Ra變大,則雷射密封的精度變得容易降低。此處,「表面粗糙度Ra」例如可藉由觸針式或非接觸式的雷射膜厚計或表面粗糙度計來測定。It is preferable that the surface roughness Ra of the surface of the area|region in which the sealing material layer is arrange|positioned in the top part of a frame part is less than 1.0 micrometer. When the surface roughness Ra of this surface becomes large, the precision of laser sealing becomes easy to fall. Here, "surface roughness Ra" can be measured by, for example, a stylus type or non-contact type laser film thickness meter or a surface roughness meter.

框部的頂部的寬度較佳為100 μm~3000 μm、200 μm~1500 μm、特別是300 μm~900 μm。若框部的頂部的寬度過窄,則密封材料層與框部的頂部的對準變困難。另一方面,若框部的頂部的寬度過寬,則作為器件發揮功能的有效面積變小。The width of the top portion of the frame portion is preferably 100 μm to 3000 μm, 200 μm to 1500 μm, particularly 300 μm to 900 μm. When the width of the top portion of the frame portion is too narrow, it will be difficult to align the sealing material layer with the top portion of the frame portion. On the other hand, if the width of the top portion of the frame portion is too wide, the effective area functioning as a device becomes small.

封裝體基體較佳為玻璃、玻璃陶瓷、氮化鋁、氧化鋁的任一者、或該些的複合材料(例如,將氮化鋁與玻璃陶瓷一體化而成者)。玻璃容易形成密封材料層與反應層,因此可藉由雷射密封而確保牢固的密封強度。進而可容易地形成熱通孔,因此可適當地防止氣密封裝體的溫度過度上昇的事態。氮化鋁與氧化鋁的散熱性良好,因此可適當地防止氣密封裝體的溫度過度上昇的事態。The package body is preferably any one of glass, glass ceramics, aluminum nitride, and aluminum oxide, or a composite material thereof (for example, one obtained by integrating aluminum nitride and glass ceramics). Glass is easy to form a sealing material layer and a reaction layer, so a firm sealing strength can be ensured by laser sealing. Furthermore, since the thermal via hole can be easily formed, a situation in which the temperature of the hermetic package is excessively increased can be appropriately prevented. Since aluminum nitride and aluminum oxide have good heat dissipation properties, it is possible to appropriately prevent a situation in which the temperature of the hermetic package rises excessively.

玻璃陶瓷、氮化鋁、氧化鋁較佳為分散有黑色顏料(以分散有黑色顏料的狀態燒結而成)。若如此,則封裝體基體可吸收透過密封材料層的雷射光。其結果,於雷射密封時封裝體基體的與密封材料層接觸的部位經加熱,因此可於密封材料層與封裝體基體的界面促進反應層的形成。Glass ceramics, aluminum nitride, and alumina are preferably dispersed with a black pigment (sintered in a state in which the black pigment is dispersed). If so, the package body can absorb the laser light transmitted through the sealing material layer. As a result, the portion of the package base in contact with the sealing material layer is heated during laser sealing, so that the formation of the reaction layer can be promoted at the interface between the sealing material layer and the package base.

分散有黑色顏料的封裝體基體較佳為具有吸收應照射的雷射光的性質,即較佳為厚度0.5 mm,應照射的雷射光的波長(808 nm)的總光線透過率為10%以下(理想的是5%以下)。若如此,則於封裝體基體與密封材料層的界面密封材料層的溫度容易上昇。The package matrix in which the black pigment is dispersed preferably has the property of absorbing the laser light to be irradiated, that is, the thickness is preferably 0.5 mm, and the total light transmittance of the wavelength of the laser light to be irradiated (808 nm) is 10% or less ( Ideally below 5%). In this way, the temperature of the sealing material layer at the interface between the package base and the sealing material layer is likely to rise.

封裝體基體的基部的厚度較佳為0.1 mm~2.5 mm、特別是0.2 mm~1.5 mm。藉此,可實現氣密封裝體的薄型化。The thickness of the base of the package body is preferably 0.1 mm to 2.5 mm, particularly 0.2 mm to 1.5 mm. Thereby, thinning of the hermetic package can be achieved.

封裝體基體的框部的高度、即自封裝體基體減去基部的厚度的高度較佳為100 μm~2000 μm、特別是200 μm~900 μm。若如此,則適當地收納內部元件,並容易實現氣密封裝體的薄型化。The height of the frame portion of the package base body, that is, the height of the package base body minus the thickness of the base portion is preferably 100 μm to 2000 μm, particularly 200 μm to 900 μm. In this way, the internal components can be appropriately accommodated, and the thinning of the airtight package can be easily achieved.

玻璃蓋可使用各種玻璃。例如,可使用無鹼玻璃、鹼硼矽酸玻璃、鈉鈣玻璃。再者,玻璃蓋亦可為將多片玻璃板貼合而成的積層玻璃。Various types of glass can be used for the glass cover. For example, alkali-free glass, alkali borosilicate glass, soda lime glass can be used. Furthermore, the glass cover may also be a laminated glass formed by laminating a plurality of glass plates.

可於玻璃蓋的內部元件側的表面形成功能膜,亦可於玻璃蓋的外側的表面形成功能膜。功能膜特佳為抗反射膜。藉此,可減少於玻璃蓋的表面反射的光。A functional film may be formed on the surface of the inner element side of the glass cover, or a functional film may be formed on the outer surface of the glass cover. The functional film is particularly preferably an antireflection film. Thereby, the light reflected on the surface of the glass cover can be reduced.

玻璃蓋的厚度較佳為0.1 mm以上、0.15 mm~2.0 mm、特別是0.2 mm~1.0 mm。若玻璃蓋的厚度小,則氣密封裝體的強度變得容易降低。另一方面,若玻璃蓋的厚度大,則難以實現氣密封裝體的薄型化。The thickness of the glass cover is preferably 0.1 mm or more, 0.15 mm to 2.0 mm, particularly 0.2 mm to 1.0 mm. When the thickness of the cover glass is small, the strength of the airtight package tends to decrease. On the other hand, when the thickness of the cover glass is large, it is difficult to reduce the thickness of the hermetic package.

密封材料層具有藉由吸收雷射光而軟化變形,於封裝體基體的表層形成反應層,將封裝體基體與玻璃蓋氣密一體化的功能。The sealing material layer has the function of softening and deforming by absorbing the laser light, forming a reaction layer on the surface layer of the package base body, and airtightly integrating the package body base body and the glass cover.

氣密封裝體內部的密封材料層的α射線放出量較佳為未滿氣密封裝體內部的玻璃蓋的α射線放出量的1/7,進而佳為1/10以下。若氣密封裝體內部的密封材料層的α射線放出量較氣密封裝體內部的玻璃蓋的α射線放出量而言過大,則容易產生內部元件的軟錯誤。The α-ray emission amount of the sealing material layer inside the hermetic package is preferably less than 1/7 of the α-ray emission amount of the glass cover inside the hermetic package, and more preferably 1/10 or less. If the α-ray emission amount of the sealing material layer inside the hermetic package is too large compared with the α-ray emission amount of the glass cover inside the hermetic package, soft errors of internal elements are likely to occur.

玻璃蓋與密封材料層的熱膨脹係數差較佳為未滿50×10-7 /℃、未滿40×10-7 /℃、特別是30×10-7 /℃以下。若該熱膨脹係數差過大,則殘留於密封部分的應力不合理地變高,氣密封裝體的氣密可靠性變得容易降低。The difference in thermal expansion coefficient between the glass cover and the sealing material layer is preferably less than 50×10 -7 /°C, less than 40×10 -7 /°C, and particularly 30×10 -7 /°C or less. When the thermal expansion coefficient difference is too large, the stress remaining in the sealing portion becomes unreasonably high, and the airtight reliability of the airtight package tends to decrease.

密封材料層較佳為以與框部的接觸位置與框部的頂部的內側邊緣隔開的方式形成,且以與框部的頂部的外側邊緣隔開的方式形成,進而佳為形成於與框部的頂部的內側邊緣隔開50 μm以上、60 μm以上、70 μm~2000 μm、特別是80 μm~1000 μm的位置。若框部的頂部的內側邊緣與密封材料層的隔開距離過短,則於雷射密封時因局部加熱所產生的熱難以逃逸,因此玻璃蓋於冷卻過程中容易破損。另一方面,若框部的頂部的內側邊緣與密封材料層的隔開距離過長,則氣密封裝體的小型化變困難。另外,較佳為形成於與框部的頂部的外側邊緣隔開50 μm以上、60 μm以上、70 μm~2000 μm、特別是80 μm~1000 μm的位置。若框部的頂部的外側邊緣與密封材料層的隔開距離過短,則於雷射密封時因局部加熱所產生的熱難以逃逸,因此玻璃蓋於冷卻過程中容易破損。另一方面,若框部的頂部的外側邊緣與密封材料層的隔開距離過長,則氣密封裝體的小型化變困難。The sealing material layer is preferably formed in such a manner that the contact position with the frame portion is spaced apart from the inner edge of the top of the frame portion, and is formed in such a manner as to be spaced apart from the outer edge of the top portion of the frame portion, and is further preferably formed on the outer edge of the top portion of the frame portion. The inner edge of the top of the portion is separated from positions of 50 μm or more, 60 μm or more, 70 μm to 2000 μm, especially 80 μm to 1000 μm. If the distance between the inner edge of the top of the frame and the sealing material layer is too short, the heat generated by local heating during laser sealing is difficult to escape, so the glass cover is easily damaged during cooling. On the other hand, when the distance between the inner edge of the top portion of the frame portion and the sealing material layer is too long, it becomes difficult to reduce the size of the airtight package. In addition, it is preferably formed at a position separated from the outer edge of the top of the frame portion by 50 μm or more, 60 μm or more, 70 μm to 2000 μm, particularly 80 μm to 1000 μm. If the distance between the outer edge of the top of the frame and the sealing material layer is too short, the heat generated by local heating during laser sealing is difficult to escape, so the glass cover is easily damaged during cooling. On the other hand, if the distance between the outer edge of the top portion of the frame portion and the sealing material layer is too long, it will be difficult to reduce the size of the hermetic package.

密封材料層較佳為以與玻璃蓋的接觸位置與玻璃蓋的邊緣隔開50 μm以上、60 μm以上、70 μm~1500 μm、特別是80 μm~800 μm的方式形成。若玻璃蓋的邊緣與密封材料層的隔開距離過短,則於雷射密封時,在玻璃蓋的邊緣區域玻璃蓋的內部元件側的表面與外側的表面的表面溫度差變大,玻璃蓋容易破損。The sealing material layer is preferably formed so that the contact position with the glass cover is separated from the edge of the glass cover by 50 μm or more, 60 μm or more, 70 μm to 1500 μm, especially 80 μm to 800 μm. If the distance between the edge of the glass cover and the sealing material layer is too short, during laser sealing, the surface temperature difference between the surface of the inner element side and the outer surface of the glass cover in the edge area of the glass cover will increase, and the glass cover will Easily damaged.

密封材料層較佳為形成於框部的頂部的寬度方向的中心線上,即形成於框部的頂部的中央區域。若如此,則於雷射密封時因局部加熱所產生的熱容易逃逸,因此玻璃蓋不易破損。再者,於框部的頂部的寬度充分大的情況下,亦可不於框部的頂部的寬度方向的中心線上形成密封材料層。The sealing material layer is preferably formed on the center line of the top portion of the frame portion in the width direction, that is, formed in the central region of the top portion of the frame portion. In this case, the heat generated by local heating during laser sealing is easy to escape, so that the glass cover is not easily damaged. Furthermore, when the width of the top portion of the frame portion is sufficiently large, the sealing material layer may not be formed on the center line in the width direction of the top portion of the frame portion.

密封材料層的平均厚度較佳為未滿8.0 μm、特別是1.0 μm以上且未滿6.0 μm。密封材料層的平均厚度越小,氣密封裝體內的α射線放出率越少,因此容易防止內部元件的軟錯誤。密封材料層的平均厚度越小,雷射密封的精度越提高。進而於密封材料層與玻璃蓋的熱膨脹係數不匹配時,亦可於雷射密封後減少殘留於密封部分的應力。再者,作為如所述般地限制密封材料層的平均厚度的方法,可列舉將密封材料糊劑塗佈為薄的方法、對密封材料層的表面進行研磨處理的方法。The average thickness of the sealing material layer is preferably less than 8.0 μm, particularly 1.0 μm or more and less than 6.0 μm. The smaller the average thickness of the sealing material layer, the smaller the α-ray emission rate in the hermetic package, and therefore, it is easy to prevent soft errors of internal elements. The smaller the average thickness of the sealing material layer, the more accurate the laser sealing is. Furthermore, when the thermal expansion coefficients of the sealing material layer and the glass cover do not match, the stress remaining in the sealing portion can also be reduced after laser sealing. In addition, as a method of restricting the average thickness of the sealing material layer as described above, a method of applying a thin sealing material paste and a method of polishing the surface of the sealing material layer can be mentioned.

密封材料層的最大寬度較佳為1 μm以上且2000 μm以下、10 μm以上且1000 μm以下、50 μm以上且800 μm以下、特別是100 μm以上且600 μm以下。若使密封材料層的最大寬度變窄,則容易使密封材料層與框部的邊緣隔開,因此於雷射密封後容易減少殘留於密封部分的應力。進而可使封裝體基體的框部的寬度變窄,可擴大作為器件發揮功能的有效面積。另一方面,若密封材料層的最大寬度過窄,則當對密封材料層施加大的剪切應力時,密封材料層容易整塊破壞。進而雷射密封的精度變得容易降低。The maximum width of the sealing material layer is preferably 1 μm or more and 2000 μm or less, 10 μm or more and 1000 μm or less, 50 μm or more and 800 μm or less, particularly 100 μm or more and 600 μm or less. When the maximum width of the sealing material layer is narrowed, the sealing material layer can be easily separated from the edge of the frame portion, so that the stress remaining in the sealing portion after the laser sealing is easily reduced. Furthermore, the width of the frame portion of the package body can be narrowed, and the effective area functioning as a device can be enlarged. On the other hand, if the maximum width of the sealing material layer is too narrow, when a large shear stress is applied to the sealing material layer, the sealing material layer is likely to be broken in its entirety. Furthermore, the precision of laser sealing becomes easy to fall.

密封材料層可利用各種方法來形成,其中較佳為藉由密封材料糊劑的塗佈、燒結來形成。而且,密封材料糊劑的塗佈較佳為使用分配器或網版印刷機等塗佈機。若如此,則可提高密封材料層的尺寸精度(密封材料層的寬度的尺寸精度)。此處,密封材料糊劑為密封材料與媒劑的混合物。而且,媒劑通常包含溶媒與樹脂。出於調整糊劑的黏性的目的而添加樹脂。另外,視需要亦可添加界面活性劑、增黏劑等。The sealing material layer can be formed by various methods, and among them, coating and baking of a sealing material paste are preferable. In addition, it is preferable to use a dispenser or a coater such as a screen printing machine for the coating of the sealing material paste. In this way, the dimensional accuracy of the sealing material layer (the dimensional accuracy of the width of the sealing material layer) can be improved. Here, the sealing material paste is a mixture of a sealing material and a vehicle. Also, the vehicle typically includes a solvent and a resin. The resin is added for the purpose of adjusting the viscosity of the paste. In addition, a surfactant, a tackifier, etc. may be added as necessary.

密封材料糊劑通常藉由三輥等將密封材料與媒劑加以混練而製作。媒劑通常包含樹脂與溶劑。作為媒劑中所使用的樹脂,可使用丙烯酸酯(丙烯酸系樹脂)、乙基纖維素、聚乙二醇衍生物、硝化纖維素、聚甲基苯乙烯、聚碳酸乙二酯、聚碳酸丙二酯、甲基丙烯酸酯等。作為媒劑中所使用的溶劑,可使用N,N'-二甲基甲醯胺(N,N'-dimethyl formamide,DMF)、α-萜品醇、高級醇、γ-丁基內酯(γ-BL)、四氫萘(tetralin)、丁基卡必醇乙酸酯、乙酸乙酯、乙酸異戊酯、二乙二醇單乙醚、二乙二醇單乙醚乙酸酯、苄醇、甲苯、3-甲氧基-3-甲基丁醇、三乙二醇單甲醚、三乙二醇二甲醚、二丙二醇單甲醚、二丙二醇單丁醚、三丙二醇單甲醚、三丙二醇單丁醚、碳酸丙二酯、二甲基亞碸(dimethyl sulfoxide,DMSO)、N-甲基-2-吡咯啶酮等。The sealing material paste is usually produced by kneading the sealing material and the vehicle with three rolls or the like. The vehicle usually contains a resin and a solvent. As the resin used for the vehicle, acrylate (acrylic resin), ethyl cellulose, polyethylene glycol derivatives, nitrocellulose, polymethyl styrene, polyethylene carbonate, polypropylene carbonate can be used Diesters, methacrylates, etc. As the solvent used in the vehicle, N,N'-dimethylformamide (N,N'-dimethylformamide, DMF), α-terpineol, higher alcohol, γ-butyl lactone ( γ-BL), tetralin (tetralin), butyl carbitol acetate, ethyl acetate, isoamyl acetate, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, benzyl alcohol, Toluene, 3-methoxy-3-methylbutanol, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monomethyl ether Propylene glycol monobutyl ether, propylene carbonate, dimethyl sulfoxide (DMSO), N-methyl-2-pyrrolidone, etc.

密封材料糊劑亦可塗佈於封裝體基體的框部的頂部上,較佳為沿玻璃蓋的外周邊緣區域以框緣狀進行塗佈。若如此,則不需要針對封裝體基體的密封材料層的煅燒,可抑制感測器元件等內部元件的熱劣化。The sealing material paste can also be applied on the top of the frame portion of the package body, preferably in a frame shape along the outer peripheral edge region of the glass cover. In this way, firing of the sealing material layer for the package base body is not required, and thermal degradation of internal elements such as sensor elements can be suppressed.

作為製造本發明的氣密封裝體的方法,較佳為自玻璃蓋側向密封材料層照射雷射光,使密封材料層軟化變形,藉此對封裝體基體與玻璃蓋進行氣密密封來獲得氣密封裝體。該情況下,亦可將玻璃蓋配置於封裝體基體的下方,但就雷射密封的效率的觀點而言,較佳為將玻璃蓋配置於封裝體基體的上方。As a method of manufacturing the hermetically sealed package of the present invention, it is preferable to irradiate the sealing material layer with laser light from the glass cover side to soften and deform the sealing material layer, thereby airtightly sealing the package body and the glass cover to obtain a gaseous seal. Sealed body. In this case, the glass cover may be arranged below the package base, but from the viewpoint of the efficiency of laser sealing, the glass cover is preferably arranged above the package base.

作為雷射,可使用各種雷射。就容易操作的方面而言,特佳為半導體雷射、釔鋁石榴石(Yttrium-Aluminum-Garnet,YAG)雷射、CO2 雷射、準分子雷射、紅外雷射。As the laser, various lasers can be used. In terms of ease of operation, the best ones are semiconductor lasers, Yttrium-Aluminum-Garnet (YAG) lasers, CO 2 lasers, excimer lasers, and infrared lasers.

進行雷射密封的環境並無特別限定,可為大氣環境,亦可為氮氣環境等惰性環境。The environment in which the laser sealing is performed is not particularly limited, and may be an atmospheric environment or an inert environment such as a nitrogen environment.

較佳為以按壓玻璃蓋的狀態進行雷射密封。藉此,容易提高雷射密封強度。 [實施例]Preferably, the laser sealing is performed in a state where the glass cover is pressed. Thereby, it becomes easy to improve the laser sealing strength. [Example]

以下,基於實施例而對本發明進行詳細說明。再者,以下的實施例僅為例示。本發明並不受以下的實施例任何限定。Hereinafter, the present invention will be described in detail based on examples. In addition, the following Examples are only an illustration. The present invention is not limited at all by the following examples.

表1表示本發明的實施例(試樣No.1~試樣No.3)與比較例(試樣No.4~試樣No.6)。Table 1 shows the Examples (Sample No. 1 to Sample No. 3) and Comparative Examples (Sample No. 4 to Sample No. 6) of the present invention.

[表1]

Figure AA1
[Table 1]
Figure AA1

最初,準備以莫耳%計而含有39%的Bi2 O3 、23.7%的B2 O3 、14.1%的ZnO、2.7%的Al2 O3 、20%的CuO、0.6%的Fe2 O3 作為玻璃組成的方式,調配有各種氧化物、碳酸鹽等原料的玻璃批料,將其放入至鉑坩堝中,於1200℃下進行2小時的熔融。其次,藉由水冷輥將所獲得的熔融玻璃成形為薄片狀。最後,藉由球磨機將薄片狀的鉍系玻璃粉碎後進行空氣分級,獲得鉍系玻璃粉末。再者,用於試樣No.1~試樣No.3的鉍系玻璃粉末與用於試樣No.4~試樣No.6的鉍系玻璃粉末的玻璃組成與粒度相同,但α射線放出率不同,其α射線放出率可藉由變更玻璃原料的種類來進行調整。Initially, 39% Bi 2 O 3 , 23.7% B 2 O 3 , 14.1% ZnO, 2.7% Al 2 O 3 , 20% CuO, 0.6% Fe 2 O were prepared in molar %. 3 As a form of glass composition, glass batches prepared with raw materials such as various oxides and carbonates were prepared, put into a platinum crucible, and melted at 1200° C. for 2 hours. Next, the obtained molten glass is formed into a sheet shape by a water-cooled roll. Finally, the flaky bismuth-based glass was pulverized by a ball mill, and air-classified to obtain bismuth-based glass powder. In addition, the bismuth-based glass powder used for Sample No. 1 to Sample No. 3 and the bismuth-based glass powder used for Sample No. 4 to Sample No. 6 have the same glass composition and particle size, but the α-ray The emission rate is different, and the α-ray emission rate can be adjusted by changing the type of glass raw material.

其次,以鉍系玻璃粉末為90.0質量%、耐火性填料粉末為10.0質量%的比例加以混合而製作密封材料。此處,將鉍系玻璃粉末的平均粒徑D50 設為1.0 μm,將99%粒徑D99 設為2.5 μm,將耐火性填料粉末的平均粒徑D50 設為1.0 μm,將99%粒徑D99 設為2.5 μm。再者,另外耐火性填料粉末為β-鋰霞石。Next, the bismuth-based glass powder was mixed in a ratio of 90.0 mass % and the refractory filler powder was 10.0 mass % to prepare a sealing material. Here, the average particle diameter D 50 of the bismuth-based glass powder was 1.0 μm, the 99% particle diameter D 99 was 2.5 μm, the average particle diameter D 50 of the refractory filler powder was 1.0 μm, and the 99% particle diameter D 50 was 1.0 μm. The particle size D 99 was set to 2.5 μm. In addition, the refractory filler powder is β-eucryptite.

對所獲得的密封材料測定熱膨脹係數,結果,其熱膨脹係數為71×10-7 /℃。再者,熱膨脹係數為藉由推桿式TMA裝置而測定者,其測定溫度範圍為30℃~300℃。The thermal expansion coefficient of the obtained sealing material was measured, and as a result, the thermal expansion coefficient was 71×10 -7 /°C. In addition, the thermal expansion coefficient was measured by a push rod type TMA apparatus, and the measurement temperature range was 30 degreeC - 300 degreeC.

其次,沿包含硼矽酸玻璃的玻璃蓋(厚度0.4 mm、α射線放出率0.003 cph/cm2 )的外周邊緣,並使用所述密封材料來而形成框緣狀的密封材料層。若詳述,則首先以黏度成為約100 Pa·s(25℃、剪切速率(Shear rate):4)的方式將所述的密封材料、媒劑及溶劑加以混練後,進而藉由三輥研磨機進行混錬直至粉末均勻地分散,進行糊劑化而獲得密封材料糊劑。媒劑使用在二醇醚系溶劑中溶解有乙基纖維素樹脂者。其次,沿玻璃蓋的外周邊緣,利用網版印刷機以框緣狀印刷所述的密封材料糊劑。進而,於大氣環境下,以120℃乾燥10分鐘後,於大氣環境下,以500℃燒成10分鐘,藉此將密封材料層形成於玻璃蓋上。Next, a frame-shaped sealing material layer was formed using the sealing material along the outer peripheral edge of a glass cover (thickness 0.4 mm, alpha ray emission rate 0.003 cph/cm 2 ) containing borosilicate glass. To describe in detail, firstly, after kneading the above-mentioned sealing material, vehicle and solvent so that the viscosity becomes about 100 Pa·s (25°C, Shear rate: 4), the three-roller The grinder performs mixing until the powder is uniformly dispersed, and pastes it to obtain a sealing material paste. As the vehicle, one in which ethyl cellulose resin was dissolved in a glycol ether solvent was used. Next, along the outer peripheral edge of the glass cover, the sealing material paste is printed in a frame shape using a screen printing machine. Furthermore, after drying at 120° C. for 10 minutes in an atmospheric environment, the sealing material layer was formed on the cover glass by firing at 500° C. for 10 minutes in an atmospheric environment.

密封材料層的內周尺寸與厚度如表1所示般,密封材料層的平均寬度為0.2 mm。The inner circumference size and thickness of the sealing material layer are as shown in Table 1, and the average width of the sealing material layer is 0.2 mm.

另外,準備包含氧化鋁的封裝體基體(厚度0.8 mm)。封裝體基體具有與玻璃蓋相同的縱尺寸與橫尺寸,封裝體基體的表面粗糙度Ra為0.1 μm~1.0 μm。In addition, a package base (thickness 0.8 mm) containing aluminum oxide was prepared. The package body has the same vertical and lateral dimensions as the glass cover, and the surface roughness Ra of the package body is 0.1 μm to 1.0 μm.

最後,介隔密封材料層而積層配置封裝體基體與玻璃蓋。之後,使用按壓夾具,一面按壓玻璃蓋一面自玻璃蓋側向密封材料層以照射速度15 mm/sec照射波長808 nm、輸出4 W、照射徑f0.5 mm的半導體雷射,使密封材料層軟化變形,藉此將封裝體基體與玻璃蓋進行氣密一體化而獲得試樣No.1~試樣No.6的氣密封裝體。Finally, the package body and the glass cover are laminated and arranged with the sealing material layer interposed therebetween. Then, using a pressing jig, while pressing the glass cover, irradiate a semiconductor laser with a wavelength of 808 nm, an output of 4 W, and an irradiation diameter f of 0.5 mm from the side of the glass cover to the sealing material layer at an irradiation speed of 15 mm/sec. By softening and deforming, the package body and the glass cover were airtightly integrated to obtain the airtight packages of Sample No. 1 to Sample No. 6.

密封材料層與玻璃蓋的α射線放出率為藉由閃爍計數器而測定的值。再者,試樣No.1~試樣No.6中,與鉍系玻璃相比,密封材料層中的耐火性填料粉末的α射線放出率大幅度地小。因此,可認為試樣No.1~試樣No.6中,密封材料層的α射線放出率與鉍系玻璃粉末的α射線放出率大致同等。The α-ray emission rate of the sealing material layer and the cover glass is a value measured by a scintillation counter. In addition, in Sample No. 1 to Sample No. 6, the α-ray emission rate of the refractory filler powder in the sealing material layer was significantly smaller than that of the bismuth-based glass. Therefore, in Sample No. 1 to Sample No. 6, the α-ray emission rate of the sealing material layer is considered to be approximately equal to the α-ray emission rate of the bismuth-based glass powder.

內部的密封材料層的α射線放出量是藉由對自配置有內部元件之側露出的密封材料層的表面積乘以密封材料層的α射線放出率而算出的值。內部的玻璃蓋的α射線放出量是藉由對自配置有內部元件之側露出的玻璃蓋的表面積乘以玻璃蓋的α射線放出率而算出的值。The α-ray emission amount of the inner sealing material layer is a value calculated by multiplying the surface area of the sealing material layer exposed from the side where the internal elements are arranged by the α-ray emission rate of the sealing material layer. The α-ray emission amount of the glass cover inside is a value calculated by multiplying the surface area of the glass cover exposed from the side where the internal elements are arranged by the α-ray emission rate of the glass cover.

對試樣No.1~試樣No.6評價雷射密封後的裂紋與氣密可靠性。首先,利用光學顯微鏡觀察密封部分,結果未確認到裂紋的產生。其次,對所獲得的氣密封裝體進行高溫高濕高壓試驗:HAST試驗(Highly Accelerated Temperature and Humidity Stress test)後,觀察密封材料層的附近,結果完全未確認到變質、裂紋、剝離等。再者,HAST試驗的條件是121℃、濕度100%、2 atm、24小時。The cracks and airtight reliability after laser sealing were evaluated for Sample No. 1 to Sample No. 6. First, the sealing portion was observed with an optical microscope, and as a result, the occurrence of cracks was not confirmed. Next, the obtained hermetic package was subjected to a high temperature, high humidity and high pressure test: HAST test (Highly Accelerated Temperature and Humidity Stress test), and the vicinity of the sealing material layer was observed. As a result, no deterioration, cracking, peeling, or the like was confirmed at all. In addition, the conditions of the HAST test were 121 degreeC, 100% of humidity, 2 atm, 24 hours.

由表1而明確,試樣No.1~試樣No.3的密封材料層的α射線放出率低,因此認為難以產生內部元件的軟錯誤。另一方面,試樣No.4~試樣No.6的密封材料層的α射線放出率高,因此認為容易產生內部元件的軟錯誤。 [產業上之可利用性]As is clear from Table 1, since the α-ray emission rates of the sealing material layers of Sample No. 1 to Sample No. 3 are low, it is considered that soft errors in internal elements are unlikely to occur. On the other hand, since the α-ray emission rates of the sealing material layers of Sample No. 4 to Sample No. 6 are high, it is considered that a soft error of the internal element is likely to occur. [Industrial Availability]

本發明的鉍系玻璃及密封材料適於各種材料的密封,特別適於氣密封裝體的雷射密封。另外,本發明的氣密封裝體適於安裝有感測器元件等內部元件的氣密封裝體,除此以外亦可較佳地適用於收納深紫外LED元件、壓電振動元件、於樹脂中分散有量子點的波長轉換元件等的氣密封裝體等中。The bismuth-based glass and the sealing material of the present invention are suitable for sealing various materials, and are particularly suitable for laser sealing of a hermetic package. In addition, the hermetic package of the present invention is suitable for a hermetically sealed package in which internal elements such as sensor elements are mounted, and is also suitable for housing deep ultraviolet LED elements, piezoelectric vibrating elements, and resins. In a hermetic package or the like of a wavelength conversion element in which quantum dots are dispersed.

1‧‧‧氣密封裝體10‧‧‧封裝體基體11‧‧‧玻璃蓋12‧‧‧基部13‧‧‧框部14‧‧‧內部元件(例如,感測器元件)15‧‧‧密封材料層L‧‧‧雷射光Ts‧‧‧軟化點1‧‧‧Hermetically sealed package body 10‧‧‧Package body base body 11‧‧‧Glass cover 12‧‧‧Base part 13‧‧‧Frame part 14‧‧‧Internal components (eg, sensor components) 15‧‧‧ Sealing material layer L‧‧‧Laser light Ts‧‧‧softening point

圖1是用以說明本發明的一實施形態的概略剖面圖。 圖2是表示藉由大型示差熱分析(Differential thermal analysis,DTA)裝置而測定時的密封材料的軟化點的示意圖。FIG. 1 is a schematic cross-sectional view for explaining an embodiment of the present invention. FIG. 2 is a schematic diagram showing the softening point of the sealing material when measured by a large-scale differential thermal analysis (DTA) apparatus.

1‧‧‧氣密封裝體 1‧‧‧Hermetically sealed package

10‧‧‧封裝體基體 10‧‧‧Package body

11‧‧‧玻璃蓋 11‧‧‧Glass cover

12‧‧‧基部 12‧‧‧Base

13‧‧‧框部 13‧‧‧Frame

14‧‧‧內部元件(例如,感測器元件) 14‧‧‧Internal components (eg sensor components)

15‧‧‧密封材料層 15‧‧‧Sealing material layer

L‧‧‧雷射光 L‧‧‧laser light

Claims (7)

一種鉍系玻璃粉末,其特徵在於:於玻璃組成中含有1莫耳%~40莫耳%的CuO,α射線放出率為0.01cph/cm2~0.15cph/cm2A bismuth-based glass powder is characterized in that: the glass composition contains 1 mol % to 40 mol % of CuO, and the alpha ray emission rate is 0.01 cph/cm 2 to 0.15 cph/cm 2 . 一種密封材料,其特徵在於:含有40體積%~100體積%的鉍系玻璃粉末、0體積%~60體積%的耐火性填料粉末,α射線放出率為0.01cph/cm2~0.15cph/cm2,於玻璃組成中含有1莫耳%~40莫耳%的CuO。 A sealing material, characterized in that it contains 40% to 100% by volume of bismuth-based glass powder, 0% to 60% by volume of refractory filler powder, and an alpha ray emission rate of 0.01cph/cm 2 to 0.15cph/cm 2. The glass composition contains 1 mol% to 40 mol% of CuO. 一種氣密封裝體,其是將封裝體基體與玻璃蓋介隔密封材料層進行氣密密封而成,所述氣密封裝體的特徵在於:所述密封材料層為密封材料的燒結體,所述密封材料為如申請專利範圍第2項所述的密封材料。 An airtight package body is formed by airtightly sealing a package body base body and a glass cover through a sealing material layer. The airtight package body is characterized in that: the sealing material layer is a sintered body of the sealing material, so The sealing material is the sealing material described in claim 2 of the scope of the application. 如申請專利範圍第3項所述的氣密封裝體,其中所述氣密封裝體內部的所述密封材料層的α射線放出量未滿所述氣密封裝體內部的所述玻璃蓋的α射線放出量的1/7。 The hermetic package according to claim 3, wherein the alpha ray emission amount of the sealing material layer inside the hermetic package is less than alpha of the glass cover inside the hermetic package 1/7 of the ray output. 如申請專利範圍第3項或第4項所述的氣密封裝體,其中所述密封材料層的平均厚度為1.0μm~未滿8.0μm。 The hermetic package according to claim 3 or claim 4, wherein the sealing material layer has an average thickness of 1.0 μm to less than 8.0 μm. 如申請專利範圍第3項或第4項所述的氣密封裝體,其中所述封裝體基體具有基部與設於所述基部上的框部,於所述封裝體基體的所述框部內收納有內部元件,於所述封裝體基體的所述框部的頂部與所述玻璃蓋之間配設有所述密封材料層。 The hermetic package according to claim 3 or 4, wherein the package base has a base portion and a frame portion provided on the base portion, and is accommodated in the frame portion of the package base There are internal components, and the sealing material layer is disposed between the top of the frame portion of the package body and the glass cover. 如申請專利範圍第3項或第4項所述的氣密封裝體,其中所述封裝體基體為玻璃、玻璃陶瓷、氮化鋁、氧化鋁的任一者、或該些的複合材料。 The hermetic package body according to item 3 or item 4 of the claimed scope, wherein the package body base is any one of glass, glass ceramics, aluminum nitride, aluminum oxide, or a composite material thereof.
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