TW201843435A - Marking apparatus, defect inspection system and film manufacturing method - Google Patents

Marking apparatus, defect inspection system and film manufacturing method Download PDF

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TW201843435A
TW201843435A TW107106819A TW107106819A TW201843435A TW 201843435 A TW201843435 A TW 201843435A TW 107106819 A TW107106819 A TW 107106819A TW 107106819 A TW107106819 A TW 107106819A TW 201843435 A TW201843435 A TW 201843435A
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optical film
droplets
droplet
scattering
ejection
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TW107106819A
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TWI772372B (en
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越野哲史
井村圭太
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日商住友化學股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • G01N2021/8438Mutilayers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N2021/8477Investigating crystals, e.g. liquid crystals
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • G01N2021/888Marking defects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9511Optical elements other than lenses, e.g. mirrors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513Liquid crystal panels

Abstract

An objective of the present invention is to provide a marking apparatus capable of suppressing adhesion of splashes to areas other than a defective portion of a film and improving the yield rate of products, even when splashes scatter from a time when a droplet is ejected through an ejection hole to a time when the droplet is landed onto an optical film. A marking apparatus is capable of marking information by ejecting a droplet onto an optical film, the marking device including: a droplet ejection device having an ejection surface in which an ejection hole for ejecting the droplet onto the optical film is formed, and a scattering regulating member which is provided between the ejection surface and the optical film and is capable of blocking splashes from scattering from a time when the droplet is ejected through the ejection hole to a time when the droplet is landed onto the optical film, wherein a blocking surface extending in a direction intersecting the normal line of the ejection surface is formed in the scattering regulating member.

Description

標記裝置、缺陷檢查系統及膜製造裝置    Marking device, defect inspection system and film manufacturing device   

本發明係關於一種標記裝置(marking device)、缺陷檢查系統及膜(film)製造方法。 The present invention relates to a marking device, a defect inspection system, and a method for manufacturing a film.

例如,偏光膜等的光學膜,係在進行異物缺陷或凹凸缺陷等的缺陷檢查之後,捲繞於芯材的周圍。關於缺陷之位置或種類的資訊(以下稱為「缺陷資訊」),係將條碼(bar code)印字於光學膜之寬度方向的端部,或對缺陷部位施予標記,藉此可記錄於光學膜。捲繞於芯材的光學膜,係當捲繞量達到一定量時,就從上游側的光學膜切離,且作為原料捲(original fabric roll)來出貨。又,基於已施加於缺陷部位的標記而切出光學膜,藉此取出片狀物(製品)。 For example, an optical film such as a polarizing film is wound around a core material after a defect inspection such as a foreign object defect or a concave-convex defect is performed. Information about the location or type of the defect (hereinafter referred to as "defect information") is to print a bar code on the end in the width direction of the optical film, or to mark the defective part, thereby recording it in the optical membrane. The optical film wound around the core material is cut off from the upstream optical film when the winding amount reaches a certain amount, and is shipped as an original fabric roll. Moreover, the optical film is cut out based on the mark which has been applied to a defect part, and a sheet | seat (product) is taken out by this.

例如,在專利文獻1係已揭示一種缺陷標記裝置,其能夠一邊檢測具有一定寬度且朝向垂直於寬度方向之長度方向搬運的片狀製品之部分缺陷,一邊為了明示所檢測出的缺陷之部分而賦予標記用之傷痕。另一方面,在專利文獻2,係已例示一種噴墨(inkjet)等非接觸的印字方式來作 為標記手段。 For example, Patent Document 1 has disclosed a defect marking device that can detect a part of a defect of a sheet-shaped product having a certain width and conveyed in a length direction perpendicular to the width direction while clearly showing a part of the detected defect. Gives scars for marking. On the other hand, in Patent Document 2, a non-contact printing method such as inkjet has been exemplified as a marking means.

[先前技術文獻]     [Prior technical literature]     [專利文獻]     [Patent Literature]    

專利文獻1:日本特開2002-303580號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 2002-303580

專利文獻2:日本特開2011-102985號公報 Patent Document 2: Japanese Patent Application Laid-Open No. 2011-102985

在本案申請人方面,亦推進開發一種能夠藉由對光學膜射出液滴而標記資訊的標記裝置。該標記裝置係具備液滴射出裝置,該液滴射出裝置係具有形成有對光學膜射出液滴的射出孔的射出面。藉由本發明人之檢討可知:在如此的標記裝置中,除了會由於從射出孔所射出的液滴之尺寸及黏性等的特性,還會由於液滴所射出的印字對象及光學膜之搬運速度等,導致在液滴從射出孔射出之後到滴落於光學膜為止飛沫會飛散。當已飛散的飛沫附著於光學膜之缺陷部位以外的區域時,本來應作為製品被取出的部分就會因飛沫而受汙染,有時不得不將已受汙染的部分作為不良品來廢棄,而有製品之良率降低的可能性。 In the case of the applicant of this case, the development of a marking device capable of marking information by ejecting liquid droplets to an optical film has also been advanced. The marking device includes a droplet ejection device having an ejection surface formed with an ejection hole from which an optical film is ejected. From the review by the present inventors, it is known that in such a marking device, in addition to the characteristics of the size and viscosity of the liquid droplets emitted from the injection holes, it is also due to the handling of the printing object and the optical film emitted by the liquid droplets. The speed and the like cause the droplets to scatter after the liquid droplets are ejected from the injection holes until they drop on the optical film. When the scattered droplets adhere to areas other than the defective part of the optical film, the part that should have been taken out as a product will be contaminated by the droplets. Sometimes the contaminated part must be discarded as a defective product, and There is a possibility that the yield of the product is reduced.

本發明係有鑑於上述情形而開發完成,其提供一種即便是在液滴從射出孔射出之後到滴落於光學膜為止飛沫已飛散的情況下,仍可以抑制飛沫附著於膜之缺陷部位以外的區域,而可以提高製品之良率的標記裝置、 缺陷檢查系統及膜製造方法。 The present invention has been developed in view of the above-mentioned circumstances, and provides a method for preventing droplets from adhering to areas other than the defect portion of the film even when droplets have scattered after the droplets have been ejected from the injection hole until they are dropped on the optical film. Area, a marking device, a defect inspection system, and a film manufacturing method that can improve the yield of a product.

為了達成上述之目的,本發明係採用了以下的手段。 In order to achieve the above object, the present invention adopts the following means.

(1)本發明之一態樣的標記裝置,係能夠藉由對光學膜射出液滴來標記資訊,該標記裝置係具備:液滴射出裝置,係具有形成有對前述光學膜射出前述液滴的射出孔的射出面;以及飛散限制構件,係設置於前述射出面與前述光學膜之間,能夠阻斷前述液滴從前述射出孔射出之後到滴落於前述光學膜為止所飛散的飛沫;在前述飛散限制構件係形成有朝向與前述射出面之法線交叉的方向擴展的阻斷面。 (1) A marking device according to one aspect of the present invention is capable of marking information by ejecting liquid droplets onto an optical film, and the marking device includes a droplet ejecting device having a structure for ejecting the liquid droplets onto the optical film. An emission surface of the injection hole; and a scattering restricting member, which is provided between the emission surface and the optical film, and can block the droplets that are scattered after the liquid droplet is ejected from the injection hole until it drops on the optical film; The scattering restriction member is formed with a blocking surface extending in a direction intersecting with a normal line of the emission surface.

(2)如上述(1)所述之標記裝置,其中,前述飛沫亦可包含前述液滴從前述射出孔射出時所飛散的第一飛沫,和前述液滴滴落於前述光學膜時所飛散的第二飛沫之至少一方。 (2) The marking device according to the above (1), wherein the droplet may include a first droplet scattered when the droplet is ejected from the injection hole, and a droplet scattered when the droplet is dropped on the optical film. At least one of the second droplets.

(3)如上述(1)或(2)所述之標記裝置,其中,前述飛散限制構件亦可具備在與前述射出面之法線平行的方向具有厚度的飛散限制板。 (3) The marking device according to the above (1) or (2), wherein the scattering restriction member may further include a scattering restriction plate having a thickness in a direction parallel to a normal line of the emission surface.

(4)如上述(3)所述之標記裝置,其中,前述飛散限制板亦可具備隔著射出前述液滴的射出通路而配置於一方側的第一飛散限制板,以及隔著前述射出通路而配置於另一方側的第二飛散限制板之至少一方。 (4) The marking device according to the above (3), wherein the scattering-restricting plate may further include a first scattering-restricting plate disposed on one side via an ejection path through which the liquid droplets are ejected, and the ejecting path may be interposed therebetween. At least one of the second scattering limit plates is disposed on the other side.

(5)如上述(4)所述之標記裝置,其中,前述 射出通路亦可沿著與鉛直方向交叉的方向而延伸;前述第一飛散限制板亦可在鉛直方向配置於比前述射出通路更上方;前述第二飛散限制板亦可在鉛直方向配置於比前述射出通路更下方。 (5) The marking device according to the above (4), wherein the ejection path may also extend in a direction crossing the vertical direction; the first scattering limit plate may be disposed in the vertical direction more than the ejection path. Upper; the second scattering limit plate may be disposed in a vertical direction below the ejection path.

(6)如上述(4)至(5)中任一項所述之標記裝置,在前述第一飛散限制板亦可形成有朝向與前述射出面之法線交叉的方向擴展的第一阻斷面;在前述第二飛散限制板亦可形成有與前述第一阻斷面平行地擴展的第二阻斷面。 (6) The marking device according to any one of (4) to (5), in the first scattering restriction plate, a first block extending in a direction crossing the normal line of the exit surface may be formed. A second blocking surface may be formed on the second scattering limit plate and extending parallel to the first blocking surface.

(7)如上述(4)至(6)中任一項所述之標記裝置,其中,前述第一飛散限制板及前述第二飛散限制板所分離的間隔,亦可比前述射出孔之直徑更大。 (7) The marking device according to any one of (4) to (6) above, wherein a separation distance between the first scattering limit plate and the second scattering limit plate may be larger than a diameter of the injection hole. Big.

(8)如上述(5)所述之標記裝置,其中,前述飛散限制板亦可僅為第二飛散限制板。 (8) The marking device according to the above (5), wherein the scattering limit plate may be only a second scattering limit plate.

(9)如上述(1)至(8)中任一項所述之標記裝置,可更具備:遮蔽構件,係設置於前述射出面,且能夠阻斷前述液滴從前述射出孔射出時所飛散的飛沫;在前述遮蔽構件亦可形成有開口部,該開口部係於與前述射出孔相對向的位置形成開口,並且具有遮擋朝向與前述射出面之法線交叉的方向飛散之前述飛沫的內壁面。 (9) The marking device according to any one of (1) to (8), further including: a shielding member, which is provided on the ejection surface and can block the droplets from being ejected from the ejection hole Scattered droplets; an opening may be formed in the shielding member, the opening is formed at a position opposite to the injection hole, and has a shield for the droplet that is scattered in a direction that intersects with the normal of the emission surface Inner wall surface.

(10)如上述(9)所述之標記裝置,其中,前述開口部之直徑亦可比前述射出孔之直徑更大。 (10) The marking device according to the above (9), wherein a diameter of the opening portion may be larger than a diameter of the injection hole.

(11)如上述(9)或(10)所述之標記裝置,其中,在前述開口部中的前述射出面之側的緣部,亦可形成 有具有面對前述射出孔之傾斜面的錐形(taper)部。 (11) The marking device according to the above (9) or (10), wherein the edge portion on the side of the exit surface in the opening portion may be formed with a cone having an inclined surface facing the exit hole. Shape (taper).

(12)如上述(1)或(11)所述之標記裝置,可更具備:吸引裝置,係設置於前述射出面與前述光學膜之間,能夠吸引前述液滴從前述射出孔射出之後到滴落於前述光學膜為止所飛散的飛沫。 (12) The marking device according to (1) or (11) above, may further include: a suction device provided between the exit surface and the optical film, capable of attracting the liquid droplets from the exit holes to The droplets scattered until the optical film is dropped.

(13)如上述(12)所述之標記裝置,其中,前述吸引裝置亦可具備隔著射出前述液滴的射出通路而配置於一方側的第一吸引機構、和隔著前述射出通路而配置於另一方側的第二吸引機構之至少一方。 (13) The marking device according to the above (12), wherein the suction device may further include a first suction mechanism disposed on one side via an ejection path through which the liquid droplets are ejected, and disposed through the ejection path. At least one of the second attraction mechanisms on the other side.

(14)如上述(13)所述之標記裝置,其中,前述射出通路亦可沿著與鉛直方向交叉的方向而延伸;前述第一吸引機構亦可在鉛直方向配置於比前述射出通路更上方;前述第二吸引機構亦可在鉛直方向配置於比前述射出通路更下方。 (14) The marking device according to the above (13), wherein the ejection path may also extend in a direction crossing the vertical direction; the first suction mechanism may be disposed above the ejection path in a vertical direction. ; The second suction mechanism may be arranged below the injection path in the vertical direction.

(15)如上述(14)所述之標記裝置,其中,前述吸引裝置亦可僅為第二吸引機構。 (15) The marking device according to the above (14), wherein the suction device may be only a second suction mechanism.

(16)如上述(1)至(15)中任一項所述之標記裝置,其中,前述液滴射出裝置亦可配置成在搬運長條帶狀的前述光學膜的期間,隔著前述光學膜而相對向於與前述光學膜相接觸的導輥(guide roller),並從前述光學膜與前述導輥相接觸的位置之相反側射出前述液滴。 (16) The marking device according to any one of the above (1) to (15), wherein the droplet ejection device may be disposed so as to transport the optical film in a long strip shape through the optical The film is opposed to a guide roller that is in contact with the optical film, and the droplets are ejected from a side opposite to a position where the optical film is in contact with the guide roller.

(17)本發明之一態樣的缺陷檢查系統,係具備:搬運線路,係搬運長條帶狀的膜;缺陷檢查裝置,係進行在前述搬運線路上被搬運的膜之缺陷檢查;以及上 述(1)至(16)中任一項所述之標記裝置,係基於前述缺陷檢查之結果而對缺陷之位置射出液滴,藉此能夠標記資訊。 (17) A defect inspection system according to one aspect of the present invention includes: a conveying line that conveys a long strip-shaped film; a defect inspection device that performs defect inspection of the film conveyed on the conveying line; and the above. The marking device described in any one of (1) to (16) is capable of marking information by ejecting liquid droplets on the position of a defect based on the result of the aforementioned defect inspection.

(18)如上述(17)所述之缺陷檢查系統,其中,前述標記裝置亦可從與鉛直方向交叉的方向對在前述搬運線路上往與鉛直方向平行之方向被搬運的膜射出前述液滴。 (18) The defect inspection system according to the above (17), wherein the marking device may eject the liquid droplets from a direction crossing the vertical direction toward a film transported on the transportation line in a direction parallel to the vertical direction .

(19)如上述(17)所述之缺陷檢查系統,其中,前述標記裝置亦可在鉛直方向中朝上方對在前述搬運線路上往與鉛直方向交叉之方向被搬運的膜射出前述液滴。 (19) The defect inspection system according to the above (17), wherein the marking device may eject the liquid droplets upward in a vertical direction toward a film transported on the transport line in a direction crossing the vertical direction.

(20)如上述(17)至(19)中任一項所述之缺陷檢查系統,亦可復具備與前述膜相接觸的導輥;前述標記裝置亦可配置成隔著前述膜而相對向於前述導輥,並從前述膜與前述導輥相接觸的位置之相反側射出前述液滴。 (20) The defect inspection system according to any one of (17) to (19) above, which may be further provided with a guide roller in contact with the film; the marking device may be arranged to face each other across the film. The droplet is ejected from the guide roller and from a side opposite to a position where the film contacts the guide roller.

(21)如上述(20)所述之缺陷檢查系統,其中,前述膜亦可在40°以上且130°以下之角度範圍內掛繞於前述導輥之外周面。 (21) The defect inspection system according to the above (20), wherein the film may be hung around the outer peripheral surface of the guide roller within an angle range of 40 ° or more and 130 ° or less.

(22)本發明之一態樣的膜製造裝置,係具備:上述(17)至(21)所述之缺陷檢查系統。 (22) A film manufacturing apparatus according to an aspect of the present invention includes the defect inspection system described in (17) to (21) above.

(23)本發明之一態樣的膜製造方法,係包含:使用上述(17)至(21)所述之缺陷檢查系統來進行標記的步驟。 (23) A film manufacturing method according to an aspect of the present invention includes a step of performing marking using the defect inspection system described in (17) to (21) above.

依據本發明,可以提供一種即便是在液滴從射出孔射出之後到滴落於光學膜為止飛沫已飛散的情況 下,仍可以抑制飛沫附著於膜之缺陷部位以外的區域,且可以提高製品之良率的標記裝置、缺陷檢查系統及膜製造方法。 According to the present invention, even when droplets are scattered after a droplet is ejected from an ejection hole until it is dropped on an optical film, it is possible to suppress the droplets from adhering to a region other than the defect portion of the film, and to improve the Yield marking device, defect inspection system, and film manufacturing method.

1‧‧‧膜製造裝置 1‧‧‧ film manufacturing equipment

2‧‧‧缺陷檢查裝置 2‧‧‧ Defect inspection device

3‧‧‧缺陷資訊讀取裝置 3‧‧‧ Defect information reading device

4、204、304‧‧‧標記裝置 4, 204, 304‧‧‧ marking device

4a‧‧‧飛沫(第一飛沫) 4a‧‧‧Foam (the first droplet)

4b‧‧‧飛沫(第二飛沫) 4b‧‧‧ Droplet (Second Droplet)

4i‧‧‧油墨 4i‧‧‧ ink

5a、5b‧‧‧夾持輥 5a, 5b ‧‧‧ pinch roller

6‧‧‧控制裝置 6‧‧‧Control device

7‧‧‧導輥 7‧‧‧Guide roller

9‧‧‧搬運線路 9‧‧‧ handling line

10、310‧‧‧缺陷檢查系統 10, 310‧‧‧ Defect inspection system

11‧‧‧缺陷 11‧‧‧ defects

12‧‧‧資訊 12‧‧‧ Information

13‧‧‧不良品 13‧‧‧ Defective

14‧‧‧良品 14‧‧‧Good quality

20‧‧‧液滴射出裝置 20‧‧‧ droplet ejection device

20A‧‧‧射出頭 20A‧‧‧shot head

21‧‧‧射出孔 21‧‧‧ injection hole

22‧‧‧射出面 22‧‧‧ shoot out

23‧‧‧液滴射出裝置之側端部 23‧‧‧ side end of droplet ejection device

30、130、230、330‧‧‧遮蔽構件(遮蔽板) 30, 130, 230, 330‧‧‧ Shielding member (shielding plate)

31、131、231、331‧‧‧開口部 31, 131, 231, 331‧‧‧ openings

31a、131a、231a、331a‧‧‧內壁面 31a, 131a, 231a, 331a

32、332‧‧‧第一主面(遮蔽板之與射出面為 相反側的面) 32, 332‧‧‧first principal surface (the surface of the shielding plate opposite to the emission surface)

33‧‧‧遮蔽板之側端部 33‧‧‧Side end of shield

34‧‧‧遮蔽板之外緣部 34‧‧‧ Outer edge of shield

35‧‧‧第二主面(遮蔽板之射出面側的面) 35‧‧‧Second main surface (surface on the exit side of the shielding plate)

40、140、340‧‧‧固定構件 40, 140, 340‧‧‧Fixed components

41‧‧‧第一壁部 41‧‧‧First wall

42‧‧‧第二壁部 42‧‧‧Second wall section

50‧‧‧飛散限制構件 50‧‧‧Scattering restriction member

50f‧‧‧阻斷面 50f‧‧‧ blocking surface

51‧‧‧第一飛散限制板 51‧‧‧The first flying limit board

51f‧‧‧第一阻斷面 51f‧‧‧First blocking surface

52‧‧‧第二飛散限制板 52‧‧‧Second Scatter Restriction Plate

52f‧‧‧第二阻斷面 52f‧‧‧Second blocking surface

53‧‧‧第一固定壁部 53‧‧‧First fixed wall

53a‧‧‧上壁部 53a‧‧‧upper wall

53b、54b‧‧‧側壁部 53b, 54b‧‧‧ sidewall

54‧‧‧第二固定壁部 54‧‧‧Second fixed wall

54a‧‧‧下壁部 54a‧‧‧ lower wall

60、360‧‧‧吸引裝置 60、360‧‧‧Attraction device

61、361‧‧‧第一吸引機構 61, 361‧‧‧The first attraction

62、362‧‧‧第二吸引機構 62, 362‧‧‧Second Attraction Agency

62f、361f、362f‧‧‧吸引面 62f, 361f, 362f

62h‧‧‧吸引孔 62h‧‧‧Attraction hole

64‧‧‧左右側面 64‧‧‧ Left and right sides

65‧‧‧支撐軸 65‧‧‧ support shaft

72‧‧‧載台 72‧‧‧ carrier

73‧‧‧支撐機構 73‧‧‧ support

71、73a‧‧‧支撐台 71, 73a‧‧‧Support

73b‧‧‧支撐板 73b‧‧‧ support plate

73c‧‧‧豎起片 73c‧‧‧Erected

73h‧‧‧長孔 73h‧‧‧long hole

135‧‧‧第二主面 135‧‧‧Second main face

141、341‧‧‧固定構件之側壁部 141, 341‧‧‧ side wall part of fixing member

230‧‧‧筒構件 230‧‧‧ tube member

335‧‧‧第二主面 335‧‧‧Second Major Face

336‧‧‧錐形部 336‧‧‧Tapered

336a‧‧‧傾斜面 336a‧‧‧inclined

d1‧‧‧開口部之直徑 d1‧‧‧diameter of opening

d2‧‧‧射出孔之直徑 d2‧‧‧diameter of injection hole

F1X、F10X‧‧‧光學膜 F1X, F10X‧‧‧Optical Film

F4‧‧‧基材片 F4‧‧‧ substrate

F4a‧‧‧偏光件 F4a‧‧‧Polarizer

F4b、F4c‧‧‧保護膜 F4b, F4c‧‧‧protective film

F5‧‧‧黏著層 F5‧‧‧Adhesive layer

F6‧‧‧間隔片 F6‧‧‧ spacer

F7‧‧‧表面保護片 F7‧‧‧Surface protection sheet

F8‧‧‧貼合片 F8‧‧‧Fit

F11‧‧‧第一光學膜 F11‧‧‧The first optical film

F12‧‧‧第二光學膜 F12‧‧‧Second Optical Film

F13‧‧‧第三光學膜 F13‧‧‧The third optical film

FX‧‧‧光學片 FX‧‧‧ Optical Sheet

G‧‧‧邊框部 G‧‧‧Frame section

Ia‧‧‧射出通路 Ia‧‧‧ Injection path

J1‧‧‧吸引面與光學膜間距離 J1‧‧‧Distance between attractive surface and optical film

J2‧‧‧吸引面與固定構件間距離 J2‧‧‧Distance between suction surface and fixed member

J3‧‧‧吸引孔與射出孔間距離 J3‧‧‧Distance between suction hole and injection hole

K1‧‧‧射出頭之射出孔與光學膜之間的距離 K1‧‧‧ The distance between the exit hole of the head and the optical film

L1‧‧‧遮蔽板之第一主面與光學膜之間的距離 L1‧‧‧The distance between the first main surface of the shielding plate and the optical film

L2‧‧‧飛散直徑 L2‧‧‧Scatter diameter

MA‧‧‧區域 MA‧‧‧Area

P‧‧‧液晶顯示面 P‧‧‧LCD display surface

P1‧‧‧第一基板 P1‧‧‧First substrate

P2‧‧‧第二基板 P2‧‧‧Second substrate

P3‧‧‧液晶層 P3‧‧‧LCD layer

P4‧‧‧顯示區域 P4‧‧‧display area

R1、R2‧‧‧原料捲 R1, R2‧‧‧‧ Raw rolls

Ry‧‧‧最大粗糙度 Ry‧‧‧Maximum roughness

s1‧‧‧狹縫間隔 s1‧‧‧Slit interval

t1‧‧‧厚度 t1‧‧‧thickness

V1‧‧‧光學膜之搬運方向 V1‧‧‧ Optical film handling direction

V2‧‧‧與光學膜之搬運方向交叉的方向 V2‧‧‧ Intersects with the transport direction of the optical film

Va‧‧‧相對向部分 Va‧‧‧ facing part

θ‧‧‧圍包角度 θ‧‧‧Wrapping angle

第1圖係顯示液晶顯示面板之一例的俯視圖。 FIG. 1 is a plan view showing an example of a liquid crystal display panel.

第2圖係第1圖的II-II剖視圖。 Fig. 2 is a sectional view taken along the line II-II in Fig. 1.

第3圖係顯示光學膜之一例的剖視圖。 FIG. 3 is a cross-sectional view showing an example of an optical film.

第4圖係顯示第一實施形態的膜製造裝置之構成的側視圖。 Fig. 4 is a side view showing the configuration of the film manufacturing apparatus of the first embodiment.

第5圖係顯示製品化步驟的立體圖。 Fig. 5 is a perspective view showing a production step.

第6圖係顯示第一實施形態的標記裝置中之液滴射出裝置、遮蔽板及固定構件的立體圖。 Fig. 6 is a perspective view showing a droplet ejection device, a shielding plate, and a fixing member in the marking device according to the first embodiment.

第7圖係顯示第一實施形態的標記裝置中之液滴射出裝置、遮蔽板及固定構件的前視圖。 Fig. 7 is a front view showing the droplet ejection device, the shielding plate, and the fixing member in the marking device according to the first embodiment.

第8圖係第7圖的VIII-VIII剖視圖。 Fig. 8 is a sectional view taken along the line VIII-VIII in Fig. 7.

第9圖係第8圖的主要部分放大圖,且為用以說明第一實施形態的遮蔽板之作用的示意圖。 Fig. 9 is an enlarged view of a main part of Fig. 8 and is a schematic diagram for explaining the function of the shielding plate of the first embodiment.

第10圖係顯示固定構件之第一變化例的示意圖,且為相當於第8圖的剖視圖。 FIG. 10 is a schematic view showing a first modified example of the fixing member, and is a cross-sectional view corresponding to FIG. 8.

第11圖係顯示固定構件之第二變化例的示意圖,且為相當於第8圖的剖視圖。 FIG. 11 is a schematic view showing a second modification of the fixing member, and is a cross-sectional view corresponding to FIG. 8.

第12圖係顯示遮蔽構件之變化例的示意圖,且為相當於第8圖的剖視圖。 FIG. 12 is a schematic view showing a modified example of the shielding member, and is a cross-sectional view corresponding to FIG. 8.

第13圖係顯示第一實施形態的標記裝置之立體圖。 Fig. 13 is a perspective view showing a marking device according to the first embodiment.

第14圖係包含第13圖的主要部分放大圖,且為用以說明第一實施形態的標記裝置中的飛散限制構件之作用的圖。 Fig. 14 is an enlarged view including the main part of Fig. 13 and is a diagram for explaining the function of the scattering restricting member in the marking device of the first embodiment.

第15圖係顯示第二實施形態的標記裝置之立體圖。 Fig. 15 is a perspective view showing a marking device according to a second embodiment.

第16圖係用以說明第二實施形態的標記裝置中的吸引裝置之作用的示意圖。 Fig. 16 is a schematic diagram for explaining the operation of the suction device in the marking device of the second embodiment.

第17圖係顯示第三實施形態的標記裝置之示意圖,且為包含相當於第8圖之剖面的示意圖。 FIG. 17 is a schematic view showing a marking device according to a third embodiment, and is a schematic view including a cross section corresponding to FIG. 8.

〔第一實施形態〕 [First embodiment]

以下,參照圖式來詳細地說明本發明之第一實施形態。 Hereinafter, a first embodiment of the present invention will be described in detail with reference to the drawings.

在本實施形態中,就光學顯示裝置之生產系統而言,係針對構成其一部分的膜製造裝置及使用該膜製造裝置的膜製造方法加以說明。 In the present embodiment, a production system of an optical display device will be described with reference to a film production apparatus and a film production method using the film production apparatus.

膜製造裝置,係用以製造樹脂製的膜狀之光學構件(光學膜)。例如,光學膜係可列舉偏光膜、相位差膜及增亮膜等。例如,光學膜係貼合於液晶顯示面板(panel)及有機EL electro luminescence;電致發光)顯示面板等面板狀的光學顯示零件(光學顯示面板)。膜製造裝置係構成用以生產包含此種光學顯示零件或光學構件的光學顯示裝置的生產系統之一部分。 The film manufacturing device is used to manufacture a film-like optical member (optical film) made of resin. Examples of the optical film system include a polarizing film, a retardation film, and a brightness enhancement film. For example, the optical film is bonded to a panel-shaped optical display component (optical display panel) such as a liquid crystal display panel (panel) and an organic EL electro luminescence display panel. The film production apparatus constitutes a part of a production system for producing an optical display device including such an optical display part or an optical member.

在本實施形態中,係例示穿透式之液晶顯 示裝置作為光學顯示裝置。穿透式之液晶顯示裝置係具備液晶顯示面板及背光源(backlight)。在該液晶顯示裝置中,係從液晶顯示面板之背面側入射從背光源所射出的照明光,且從液晶顯示面板之表面側射出已藉由液晶顯示面板所調變後的光,藉此能夠顯示影像。 In this embodiment, a transmissive liquid crystal display device is exemplified as the optical display device. The transmissive liquid crystal display device includes a liquid crystal display panel and a backlight. In this liquid crystal display device, the illumination light emitted from the backlight is incident from the back side of the liquid crystal display panel, and the light modulated by the liquid crystal display panel is emitted from the front side of the liquid crystal display panel, thereby enabling the Display the image.

(光學顯示裝置) (Optical display device)

首先,就光學顯示裝置而言,係針對第1圖及第2圖所示的液晶顯示面P之構成加以說明。第1圖係顯示液晶顯示面板P之一例的俯視圖。第2圖係第1圖的II-II剖視圖。另外,在第2圖中係省略了顯示剖面的剖面線(hatching)之圖示。 First, the configuration of the liquid crystal display surface P shown in FIG. 1 and FIG. 2 will be described for the optical display device. FIG. 1 is a plan view showing an example of the liquid crystal display panel P. Fig. 2 is a sectional view taken along the line II-II in Fig. 1. It should be noted that the hatching showing the cross section is omitted in FIG. 2.

如第1圖及第2圖所示,液晶顯示面板P係具備:第一基板P1;第二基板P2,係相對向於第一基板P1而配置;以及液晶層P3,係配置於第一基板P1與第二基板P2之間。 As shown in FIGS. 1 and 2, the liquid crystal display panel P includes: a first substrate P1; a second substrate P2 is disposed opposite to the first substrate P1; and a liquid crystal layer P3 is disposed on the first substrate Between P1 and the second substrate P2.

第一基板P1係由俯視觀察下形成為長方形狀的透明基板所構成。第二基板P2係由形成為比第一基板P1更小形之長方形狀的透明基板所構成。液晶層P3係用密封材料(未圖示)來封閉第一基板P1與第二基板P2之間的周圍,且配置於藉由密封材料所包圍之俯視觀察下形成為長方形狀的區域之內側。在液晶顯示面板P中,係將俯視觀察下被包圍在液晶層P3之外周的內側的區域作為顯示區域P4,將包圍該顯示區域P4之周圍的外側之區域作為邊框部G。 The first substrate P1 is composed of a transparent substrate formed in a rectangular shape in a plan view. The second substrate P2 is composed of a rectangular transparent substrate formed smaller than the first substrate P1. The liquid crystal layer P3 is formed by sealing the periphery between the first substrate P1 and the second substrate P2 with a sealing material (not shown), and is disposed inside a region formed in a rectangular shape in a plan view surrounded by the sealing material. In the liquid crystal display panel P, a region surrounded by the inner side of the outer periphery of the liquid crystal layer P3 in a plan view is referred to as a display region P4, and a region outside the periphery of the display region P4 is referred to as a frame portion G.

在液晶顯示面板P之背面(背光源側),係依順序地積層貼合有作為偏光膜的第一光學膜F11,以及重疊於該第一光學膜F11作為增亮膜的第三光學膜F13。在液晶顯示面板P之表面(顯示面側)係貼合有作為偏光膜的第二光學膜F12。以下,有時將包含第一至第三光學膜F11至F13之其中任一個的膜總稱為光學膜F1X。 On the rear surface (backlight source side) of the liquid crystal display panel P, a first optical film F11 as a polarizing film and a third optical film F13 as a brightness enhancement film are laminated and laminated in this order. . A second optical film F12 as a polarizing film is bonded to the surface (display surface side) of the liquid crystal display panel P. Hereinafter, a film including any of the first to third optical films F11 to F13 may be collectively referred to as an optical film F1X.

(光學膜) (Optical film)

其次,針對第3圖所示的光學膜F1X之一例加以說明。第3圖係顯示光學膜F1X之構成的剖視圖。再者,在第3圖中,係省略了顯示剖面的剖面線之圖示。 Next, an example of the optical film F1X shown in FIG. 3 will be described. FIG. 3 is a cross-sectional view showing the configuration of the optical film F1X. It should be noted that in FIG. 3, the hatching showing the cross-section is omitted.

光學膜F1X,係藉由從第3圖所示之長條帶狀的光學片(optical sheet)FX切出預定之長度的切片(sheet piece)所取得。具體而言,該光學膜F1X係具有:基材片F4;黏著層F5,係設置於基材片F4之一方的面(第3圖中之上面);間隔片(separator sheet)F6,係經由黏著層F5而設置於基材片F4之一方的面;以及表面保護片F7,係設置於基材片F4之另一方的面(第3圖中之下面)。 The optical film F1X is obtained by cutting out a sheet piece of a predetermined length from the long strip-shaped optical sheet FX shown in FIG. 3. Specifically, the optical film F1X includes: a substrate sheet F4; an adhesive layer F5, which is provided on one side of the substrate sheet F4 (the upper surface in FIG. 3); and a separator sheet F6, which is provided through The adhesive layer F5 is provided on one surface of the base material sheet F4; and the surface protection sheet F7 is provided on the other surface (lower part in FIG. 3) of the base material sheet F4.

在基材片F4例如是偏光膜的情況下,係具有一對保護膜F4b、F4c夾住偏光件F4a的結構。黏著層F5係使基材片F4貼合於液晶顯示面板P。間隔片F6係保護黏著層F5。間隔片F6係在將基材片F4,經由黏著層F5往液晶顯示面板P貼合之前,能從光學膜F1X之黏著層F5剝離。再者,從光學膜F1X去掉間隔片F6後的部分係作為貼合片F8。 When the base material sheet F4 is, for example, a polarizing film, it has a structure in which a pair of protective films F4b and F4c sandwich a polarizer F4a. The adhesive layer F5 adheres the base material sheet F4 to the liquid crystal display panel P. The spacer F6 is a protective adhesive layer F5. The spacer F6 can be peeled from the adhesive layer F5 of the optical film F1X before the base material sheet F4 is bonded to the liquid crystal display panel P via the adhesive layer F5. In addition, the part after removing the spacer F6 from the optical film F1X is made into the bonding sheet F8.

表面保護片F7係保護基材片F4之表面。表面保護片F7係在貼合片F8之基材片F4已黏貼於液晶顯示面板P之後,能從基材片F4之表面剝離。 The surface protection sheet F7 protects the surface of the base material sheet F4. The surface protection sheet F7 can be peeled from the surface of the base material sheet F4 after the base material sheet F4 of the bonding sheet F8 has been adhered to the liquid crystal display panel P.

再者,有關基材片F4亦可省略一對保護膜F4b、F4c中之任何一方。例如,亦可省略黏著層F5側的保護膜F4b,並在偏光件F4a直接設置有黏著層F5。又,在表面保護片F7側的保護膜F4c,例如亦可施予用以保護液晶顯示面板P之最外面的硬覆膜處理,或能得到防眩功效的防眩(antiglare)處理等之表面處理。又,有關基材片F4係未限於上面所述的積層結構,亦可為單層結構。又,亦可省略表面保護片F7。 In addition, regarding the base material sheet F4, any one of the pair of protective films F4b and F4c may be omitted. For example, the protective film F4b on the side of the adhesive layer F5 may be omitted, and the polarizer F4a may be directly provided with the adhesive layer F5. In addition, the protective film F4c on the surface protective sheet F7 side may be subjected to, for example, a hard film treatment to protect the outermost surface of the liquid crystal display panel P, or an antiglare treatment to obtain an antiglare effect. deal with. The base material sheet F4 is not limited to the above-mentioned laminated structure, and may be a single-layer structure. The surface protection sheet F7 may be omitted.

(膜製造裝置及膜製造方法) (Film manufacturing apparatus and method)

其次,針對第4圖所示的膜製造裝置1加以說明。第4圖係顯示第一實施形態的膜製造裝置1之構成的側視圖。 Next, the film manufacturing apparatus 1 shown in FIG. 4 is demonstrated. FIG. 4 is a side view showing the configuration of the film manufacturing apparatus 1 according to the first embodiment.

例如,膜製造裝置1係製造在偏光膜之雙面貼合有表面保護膜而成的光學膜F10X。膜製造方法係包含光學膜F10X的製造步驟。例如,膜製造方法係包含:原料捲製造步驟,係製造長條帶狀的偏光膜之原料捲(未圖示);貼合步驟,係將長條帶狀的表面保護膜貼合於長條帶狀的偏光膜以製造長條帶狀的光學膜F10X之原料捲R1;以及標記步驟,係基於長條帶狀的光學膜F10X之缺陷檢查之結果而對缺陷之位置進行標記。再者,在標記步驟之後,進行將已被標記的部分作為不良品而除去且將並未被 標記的部分作為良品而回收的製品化步驟。 For example, the film manufacturing apparatus 1 manufactures an optical film F10X in which a surface protective film is bonded on both sides of a polarizing film. The film manufacturing method includes the manufacturing steps of the optical film F10X. For example, the film manufacturing method includes: a raw material roll manufacturing step, which is a raw material roll (not shown) for manufacturing a long strip-shaped polarizing film; and a laminating step, which applies a long strip-shaped surface protective film to a long strip The strip-shaped polarizing film is used to make a raw roll R1 of the strip-shaped optical film F10X; and the marking step is to mark the position of the defect based on the result of the defect inspection of the strip-shaped optical film F10X. Furthermore, after the marking step, a production step is performed in which the marked portion is removed as a defective product, and the unmarked portion is recovered as a good product.

例如,在原料捲製造步驟中,係在對PVA(Polyvinyl Alcohol;聚乙烯醇)等之作為偏光件之基材的膜施予染色處理、交聯處理及引伸處理等之後,藉由在施予前述處理後的膜之雙面貼合TAC(Triacetylcellulose;三醋酸纖維素)等的保護膜來製造長條帶狀的偏光膜,且藉由將所製造出的偏光膜捲繞於芯材來取得原料捲(未圖示)。 For example, in the manufacturing process of the raw material roll, after applying a dyeing treatment, a crosslinking treatment, and an extension treatment to a film that is a substrate of a polarizer such as PVA (Polyvinyl Alcohol; polyvinyl alcohol), the application A protective film such as TAC (Triacetylcellulose) is laminated on both sides of the treated film to produce a long polarized film, and the obtained polarized film is wound around a core material to obtain the polarized film. Raw material roll (not shown).

在貼合步驟,係一邊從長條帶狀的偏光膜之原料捲及長條帶狀的表面保護膜之原料捲(皆未圖示)將長條帶狀的偏光膜及長條帶狀的表面保護膜予以分別退繞,一邊用夾持輥(nip roll)等來夾住並貼合拉出,藉此製造長條帶狀的光學膜F10X,且藉由將所製造出的光學膜F10X捲繞於芯材來取得原料捲F10X。例如,表面保護膜係使用PET(Polyethylene terephthalate;聚對苯二甲酸乙二酯)。 In the bonding step, the long polarized film and the long polarized film are rolled from the raw material roll of the long polarized film and the raw roll of the long surface protective film (both not shown). The surface protective film is unwound separately, while being clamped and pulled out with a nip roll or the like to produce a long strip-shaped optical film F10X, and the manufactured optical film F10X It wound on the core material, and obtained the raw material roll F10X. For example, PET (Polyethylene terephthalate) is used as the surface protective film.

在標記步驟中,係基於缺陷檢查之結果而對缺陷之位置射出油墨4i(液滴),藉此來對光學膜F10X標記資訊。在此,所謂「射出」,例如是指從第6圖所示的射出孔21發射油墨4i。在標記步驟中,係將比缺陷更大的點狀之標誌(mark)印字(標記)於光學膜F10X之缺陷部位,藉此對缺陷部位進行直接記錄。 In the marking step, the ink 4i (droplet) is ejected to the position of the defect based on the result of the defect inspection, thereby marking the information on the optical film F10X. Here, "ejection" means, for example, that the ink 4i is emitted from the ejection hole 21 shown in Fig. 6. In the marking step, a dot-shaped mark larger than the defect is printed (marked) on the defect part of the optical film F10X, thereby directly recording the defect part.

第5圖係顯示製品化步驟的立體圖。 Fig. 5 is a perspective view showing a production step.

如第5圖所示,在製品化步驟中,從長條帶狀的光學膜F10X取得複數個片狀物(製品)。在光學膜F10X中的缺陷11之近旁,係印字有比缺陷11更大的點狀之標誌12。 再者,光學膜F10X中的區域MA,係對膜寬度方向全體施予標記(以下稱為「全寬標記」)後的區域。例如,全寬標記係在光學膜F10X之預定區域有多處發生缺陷等時進行。 As shown in FIG. 5, in the production step, a plurality of sheets (products) are obtained from the long strip-shaped optical film F10X. In the vicinity of the defect 11 in the optical film F10X, a dot mark 12 larger than the defect 11 is printed. The region MA in the optical film F10X is a region obtained by applying a mark (hereinafter referred to as a "full width mark") to the entire film width direction. For example, the full-width marking is performed when a defect or the like occurs in a predetermined area of the optical film F10X.

製品化步驟,係包含基於標記之資訊,而切斷光學膜F10X的切斷步驟。在切斷步驟中,基於標記之資訊而切出光學膜F10X,藉此取出片狀物(製品)。在製品化步驟中,將已被標記的部分作為不良品13來除去,且將未被標記的部分作為良品14來回收。 The production step includes a cutting step of cutting the optical film F10X based on the information on the mark. In the cutting step, the optical film F10X is cut out based on the marked information, thereby taking out a sheet (product). In the production step, the marked part is removed as a defective product 13, and the unmarked part is collected as a good product 14.

如第4圖所示,膜製造裝置1係具備搬運線路9。搬運線路9係形成用以搬運從原料捲R1退繞出之長條帶狀的光學膜F10X之搬運路徑。光學膜F10X係被施予有缺陷檢查及標記等的預定處理,並在捲繞部8中捲繞於芯材以作為預定處理後的原料捲R2。 As shown in FIG. 4, the film production apparatus 1 includes a transport line 9. The conveying line 9 forms a conveying path for conveying the long strip-shaped optical film F10X unwound from the raw material roll R1. The optical film F10X is subjected to a predetermined process such as defect inspection and marking, and is wound around a core material in a winding unit 8 as a raw material roll R2 after the predetermined process.

在搬運線路9係配置有一對夾持輥5a、5b。再者,在搬運線路9,亦可配置有包含複數個張力調節輥(dancer roll)的累積器(accumulator)(未圖示)以及導輥7(參照第17圖)。 A pair of nip rollers 5a and 5b are arranged on the transport line 9. Furthermore, an accumulator (not shown) including a plurality of tension rolls (not shown) and a guide roller 7 (see FIG. 17) may be disposed on the transport line 9.

一對夾持輥5a、5b係一邊在其間夾住光學膜F10X,一邊相互地逆向旋轉,藉此朝向第4圖中所示的箭頭之方向V1(光學膜F10X之搬運方向)拉出光學膜F10X。 The pair of nip rollers 5a and 5b rotate the counter-rotating directions while holding the optical film F10X therebetween, thereby pulling out the optical film in the direction of the arrow V1 (the transport direction of the optical film F10X) shown in FIG. 4. F10X.

累積器(未圖示)係用以吸收藉由光學膜F10X之進給量的變動所致的差,並且減低施加於光學膜F10X 的張力之變動。例如,累積器係具有在搬運線路9之預定區間,交替配置位在上部側的複數個張力調節輥和位在下部側的複數個張力調節輥的構成。 The accumulator (not shown) is used to absorb the difference caused by the variation of the feed amount of the optical film F10X, and to reduce the variation of the tension applied to the optical film F10X. For example, the accumulator has a configuration in which a plurality of tension adjusting rollers positioned on the upper side and a plurality of tension adjusting rollers positioned on the lower side are alternately arranged in a predetermined section of the conveying line 9.

在累積器中,係在光學膜F10X交錯地互掛於上部側的張力調節輥和下部側的張力調節輥之狀態下,一邊使光學膜F10X搬運,一邊使上部側的張力調節輥和下部側的張力調節輥相對地朝向上下方向進行升降動作。藉此,不用停止搬運線路9,就可以累積光學膜F10X。例如,在累積器中係可以藉由展寬上部側的張力調節輥與下部側的張力調節輥之間的距離,來增加光學膜F10X之累積,另一方面,可以藉由縮窄上部側的張力調節輥與下部側的張力調節輥之間的距離,來減少光學膜F10X之累積。累積器例如是在已交換原料捲R1、R2的芯材之後進行編接等作業時運轉。 In the accumulator, in a state where the optical film F10X is alternately hung on the upper tension adjusting roller and the lower tension adjusting roller, while the optical film F10X is being carried, the upper tension adjusting roller and the lower side The tension-adjusting rollers are relatively moved upwards and downwards. Thereby, the optical film F10X can be accumulated without stopping the conveyance line 9. For example, in the accumulator, it is possible to increase the accumulation of the optical film F10X by widening the distance between the tension adjustment roller on the upper side and the tension adjustment roller on the lower side. Adjust the distance between the adjustment roller and the tension adjustment roller on the lower side to reduce the accumulation of the optical film F10X. The accumulator is operated when, for example, the core material of the raw material rolls R1 and R2 is exchanged and then splicing is performed.

導輥7(參照第17圖)係將一邊旋轉一邊藉由夾持輥5a、5b所拉出的光學膜F10X導引至搬運線路9之下游側。再者,導輥7係不限於一個,亦可配置有複數個。 The guide roller 7 (refer to FIG. 17) guides the optical film F10X pulled out by the nip rollers 5 a and 5 b to the downstream side of the conveyance line 9 while rotating. The guide rollers 7 are not limited to one, and a plurality of guide rollers 7 may be arranged.

光學膜F10X係在捲繞部8中捲繞於芯材作為預定處理後的原料捲R2之後,往下一個步驟饋送(參照第5圖)。 The optical film F10X is wound around the core material in the winding unit 8 as a raw material roll R2 after a predetermined process, and then fed to the next step (see FIG. 5).

(缺陷檢查系統) (Defect inspection system)

其次,針對上述膜製造裝置1所具備的缺陷檢查系統10加以說明。 Next, a defect inspection system 10 included in the film manufacturing apparatus 1 will be described.

如第4圖所示,缺陷檢查系統10係具備搬運線路9、缺陷檢查裝置2、缺陷資訊讀取裝置3、標記裝置4及控制裝置6。 As shown in FIG. 4, the defect inspection system 10 includes a transport line 9, a defect inspection device 2, a defect information reading device 3, a marking device 4, and a control device 6.

缺陷檢查裝置2係進行光學膜F10X之缺陷檢查。具體而言,缺陷檢查裝置2係檢測在製造光學膜F10X時以及在搬運光學膜F10X時所產生的異物缺陷、凹凸缺陷、亮點缺陷等之各種缺陷。缺陷檢查裝置2係對於在搬運線路上所搬運的光學膜F10X,藉由執行例如反射檢查、穿透檢查、斜穿透檢查、正交尼可耳(cross Nicol)穿透檢查等的檢查處理,來檢測光學膜F10X之缺陷。 The defect inspection device 2 performs defect inspection of the optical film F10X. Specifically, the defect inspection device 2 detects various defects such as a foreign object defect, a bump defect, a bright spot defect, and the like, which are generated when the optical film F10X is manufactured and when the optical film F10X is transported. The defect inspection device 2 performs inspection processing such as reflection inspection, penetration inspection, oblique penetration inspection, cross Nicol penetration inspection, and the like for the optical film F10X carried on the transportation line. To detect defects of the optical film F10X.

例如,缺陷檢查裝置2係在搬運線路9上,比夾持輥5a、5b更靠上游側,且具有對光學膜F10X照射照明光的複數個照明部(未圖示)以及檢測穿透過光學膜F10X後的光(穿透光)或在光學膜F10X所反射後的光(反射光)的複數個光檢測部。 For example, the defect inspection device 2 is located on the conveying line 9 and is located more upstream than the nip rollers 5a and 5b. The defect inspection device 2 has a plurality of illumination units (not shown) that irradiate the optical film F10X with illumination light and detects the transmission through the optical film A plurality of light detection sections of light (transmitted light) after F10X or light (reflected light) reflected by optical film F10X.

在缺陷檢查裝置2為檢測穿透光的構成的情況下,排列於光學膜F10X之搬運方向的複數個照明部和光檢測部,係分別隔著光學膜F10X而相對向地配置。再者,缺陷檢查裝置2並不限於檢測穿透光的構成,亦可為檢測反射光的構成,或是檢測穿透光及反射光的構成。在檢測反射光的情況下,只要將光檢測部配置於照明部側即可。 When the defect inspection device 2 is configured to detect transmitted light, a plurality of illumination units and light detection units arranged in the conveyance direction of the optical film F10X are disposed to face each other across the optical film F10X. In addition, the defect inspection device 2 is not limited to a configuration that detects transmitted light, and may be a configuration that detects reflected light or a configuration that detects transmitted light and reflected light. In the case of detecting the reflected light, the light detection section may be disposed on the side of the illumination section.

照明部係依缺陷檢查之種類而將光強度或波長、偏光狀態等調整後的照明光照射於光學膜F10X。光 檢測部係使用CCD(Charge Coupled Device;電荷耦合元件)等的攝像元件,來拍攝光學膜F10X被照明光照射到的位置之影像。由光檢測部所拍攝到的影像(缺陷檢查之結果)係輸出至控置裝置6。 The illuminating unit irradiates the optical film F10X with the illuminating light adjusted in light intensity, wavelength, and polarization state according to the type of defect inspection. The light detection unit uses an imaging element such as a CCD (Charge Coupled Device) to capture an image of the position where the optical film F10X is illuminated by the illumination light. The image (result of defect inspection) captured by the light detection section is output to the control device 6.

再者,亦可更具備:缺陷檢查裝置(未圖示),係進行長條帶狀的光學膜及長條帶狀的表面保護膜貼合之前之長條帶狀的偏光膜之缺陷檢查;以及記錄裝置(未圖示),係將基於該缺陷檢查裝置之缺陷檢查的結果所得的缺陷資訊記錄於前述偏光膜。未圖示的缺陷檢查裝置係具有與上述之缺陷檢查裝置2同樣的構成,而檢測偏光膜之缺陷。 Furthermore, it may further include: a defect inspection device (not shown), which performs defect inspection of the long strip-shaped polarizing film before the long strip-shaped optical film and the long strip-shaped surface protective film are bonded; And a recording device (not shown) records defect information obtained based on a defect inspection result of the defect inspection device in the aforementioned polarizing film. A defect inspection device (not shown) has the same configuration as the defect inspection device 2 described above, and detects defects of the polarizing film.

記錄裝置(未圖示)所記錄的缺陷資訊係包含關於缺陷之位置或種類等的資訊,例如,以字元、條碼、二維碼(DataMatrix碼、QR碼(註冊商標)等)等的識別碼方式來記錄。在識別碼中,例如包含有顯示由未圖示之缺陷檢查裝置所檢測出的缺陷,是存在於沿著膜寬度方向離開印字有識別碼的位置多少距離的位置的資訊(關於缺陷之位置的資訊)。又,在識別碼中亦可包含有關於被檢測出的缺陷之種類的資訊。 The defect information recorded by the recording device (not shown) contains information about the location or type of the defect, for example, identification by characters, barcodes, two-dimensional codes (DataMatrix codes, QR codes (registered trademarks), etc.) Code to record. The identification code includes, for example, information indicating how far the defect detected by a defect inspection device (not shown) exists in the film width direction from the position where the identification code is printed (the position of the defect). Information). The identification code may include information on the type of the detected defect.

記錄裝置係在偏光膜之搬運線路上,設置於比未圖示之缺陷檢查裝置更靠下游側。記錄裝置係具有例如採用了噴墨方式的印字頭。該印字頭係對沿著偏光膜的寬度方向之端緣部(端部)的位置吐出油墨,且進行上述缺陷資訊之印字。 The recording device is provided on the transporting line of the polarizing film, and is disposed further downstream than a defect inspection device (not shown). The recording device includes a print head using, for example, an inkjet method. This printing head discharges ink at a position along an end edge portion (end portion) in the width direction of the polarizing film, and performs the above-mentioned defect information printing.

缺陷資訊讀取裝置3係在搬運線路9上,設置於比缺陷檢查裝置2更靠下游側。缺陷資訊讀取裝置3係讀取已記錄於光學膜F10X(前述偏光膜)的缺陷資訊。缺陷資訊讀取裝置3係具有攝像裝置。攝像裝置係使用CCD等的攝像元件,來拍攝被搬運的光學膜F10X之缺陷資訊。 The defect information reading device 3 is provided on the conveyance line 9 and is provided further downstream than the defect inspection device 2. The defect information reading device 3 reads defect information that has been recorded in the optical film F10X (the aforementioned polarizing film). The defect information reading device 3 includes an imaging device. The imaging device uses an imaging element such as a CCD to capture defect information of the optical film F10X being conveyed.

缺陷資訊讀取裝置3係讀取包含關於缺陷之位置或種類等的資訊之被記錄成例如字元、條碼、二維碼(DataMatrix碼、QR碼(註冊商標)等)等的識別碼的缺陷資訊。例如,藉由讀取缺陷資訊,就能得到顯示由缺陷檢查裝置2等所檢測出的缺陷是存在於沿著膜寬度方向離開印字有識別碼的位置多少距離的位置的資訊(關於缺陷之位置的資訊)。又,在識別碼中包含有關於被檢測出的缺陷之種類的資訊的情況下,係藉由讀取缺陷資訊,來得到關於被檢測出的缺陷之種類的資訊。藉由缺陷資訊讀取裝置3所得到的缺陷資訊(讀取結果),係輸出至控置裝置6。 The defect information reading device 3 is a defect that reads, for example, characters, barcodes, two-dimensional codes (DataMatrix codes, QR codes (registered trademarks), etc.) that contain information about the location or type of a defect. Information. For example, by reading the defect information, it is possible to obtain information showing how far the defect detected by the defect inspection device 2 and the like is located in the film width direction from the position where the identification code is printed (the position of the defect) Information). When the identification code includes information about the type of the detected defect, the information about the type of the detected defect is obtained by reading the defect information. The defect information (reading result) obtained by the defect information reading device 3 is output to the control device 6.

標記裝置4係在搬運線路9上設置於比缺陷資訊讀取裝置3更靠下游側。標記裝置4係基於缺陷檢查之結果而對缺陷之位置射出油墨4i,藉此來對光學膜F10X標記資訊。標記裝置4係對光學膜F10X之缺陷部位,印字(標記)比缺陷更大的點狀之標誌,藉此對缺陷部位進行直接記錄。 The marking device 4 is provided on the transport line 9 further downstream than the defect information reading device 3. The marking device 4 emits ink 4i at the position of the defect based on the result of the defect inspection, thereby marking information on the optical film F10X. The marking device 4 prints (marks) a dot-shaped mark larger than the defect on the defective portion of the optical film F10X, thereby directly recording the defective portion.

再者,標記裝置4亦可藉由印字(標記)如包含缺陷之大小的點狀、線狀或是框狀的標誌,來對缺陷部 位進行直接記錄。此時,除了標誌以外,亦可將顯示缺陷之種類的記號或花紋印字於缺陷部位,藉此記錄關於缺陷之種類的資訊。 In addition, the marking device 4 can also directly record the defective portion by printing (marking) a dot-like, line-shaped, or frame-shaped mark including the size of the defect. At this time, in addition to the mark, a mark or pattern indicating the type of the defect may be printed on the defective portion, thereby recording information about the type of the defect.

缺陷檢查系統10,亦可具備用以測定光學膜F10X之搬運量的測長器(未圖示)。例如,就測長器而言,亦可在搬運線路9上將旋轉編碼器(rotary encoder)等的角位置感測器配置於夾持輥。測長器係依與光學膜F10X相接觸而旋轉的夾持輥之旋轉位移量,而測定光學膜F10X之搬運量。測長器之測定結果,係輸出至控制裝置6。 The defect inspection system 10 may further include a length measuring device (not shown) for measuring the conveyance amount of the optical film F10X. For example, in the case of a length measuring device, an angular position sensor such as a rotary encoder may be disposed on the nip roller on the conveying line 9. The length measuring device measures the conveying amount of the optical film F10X according to the rotational displacement amount of the nip roller that rotates in contact with the optical film F10X. The measurement result of the length measuring device is output to the control device 6.

控制裝置6係整合控制膜製造裝置1之各部。具體而言,該控制裝置6係具備作為電子控制裝置的電腦系統(computer system)。電腦系統係具備CPU(Central Processing Unit;中央處理單元)等的運算處理部以及記憶體(memory)或硬碟(hard disk)等的資訊記憶部。 The control device 6 is an integrated unit of the control film manufacturing device 1. Specifically, the control device 6 includes a computer system as an electronic control device. The computer system includes an arithmetic processing unit such as a CPU (Central Processing Unit; central processing unit), and an information storage unit such as a memory or a hard disk.

在控制裝置6之資訊記憶部係記錄有控制電腦系統的操作系統(OS:operating system),或是在運算處理部記錄有使膜製造裝置1之各部執行各種之處理的程式(program)等。又,控制裝置6亦可包含用以執行膜製造裝置1之各部的控制所需之各種處理的ASIC(Application Specific Integrated Circuit;特殊應用積體電路)等的邏輯電路。又,控制裝置6係包含用以進行電腦系統與外部裝置之輸出輸入的介面(interface)。在該介面係能夠連接例如鍵盤(keyboard)或滑鼠(mouse)等的輸入裝置或是液晶顯示器等的顯示裝置、通信裝置等。 An information storage section of the control device 6 stores an operating system (OS) that controls a computer system, or a calculation processing section records a program that causes each section of the film manufacturing apparatus 1 to execute various processes. In addition, the control device 6 may include a logic circuit such as an ASIC (Application Specific Integrated Circuit) for performing various processes required for control of each part of the film manufacturing device 1. The control device 6 includes an interface for inputting and outputting the computer system and an external device. An input device such as a keyboard or a mouse, a display device such as a liquid crystal display, and a communication device can be connected to the interface.

控制裝置6係分析由缺陷檢查裝置之光檢測部所拍攝到的影像,並判別缺陷之有無(位置)或種類等。控制裝置6係在判定出偏光膜中存在缺陷的情況下,控制記錄裝置並將缺陷資訊記錄於偏光膜。控制裝置6係在基於缺陷檢查裝置之檢查結果及缺陷資訊讀取裝置3之讀取結果等而判定出光學膜F10X中存在缺陷的情況下,控制標記裝置4並將標誌印字於光學膜F10X。 The control device 6 analyzes the image captured by the light detection section of the defect inspection device, and determines the presence (position), type, etc. of the defect. When it is determined that a defect exists in the polarizing film, the control device 6 controls the recording device and records defect information on the polarizing film. When the control device 6 determines that there is a defect in the optical film F10X based on the inspection result of the defect inspection device and the reading result of the defect information reading device 3, the control device 6 controls the marking device 4 and prints a mark on the optical film F10X.

(標記裝置) (Marking device)

其次,針對上述缺陷檢查系統10所具備的標記裝置4加以說明。 Next, the marking device 4 included in the defect inspection system 10 will be described.

如第13圖所示,標記裝置4係具備液滴射出裝置20、遮蔽板30(遮蔽構件)、固定構件40及飛散限制構件50。首先,在以下之說明中,係針對標記裝置4之構成要素中除了飛散限制構件50以外的液滴射出裝置20、遮蔽板30及固定構件40加以說明。 As shown in FIG. 13, the marking device 4 includes a droplet ejection device 20, a shielding plate 30 (shielding member), a fixing member 40, and a scattering restricting member 50. First, in the following description, the droplet ejection device 20, the shielding plate 30, and the fixing member 40 other than the scattering restricting member 50 among the constituent elements of the marking device 4 will be described.

第6圖係顯示第一實施形態的標記裝置4中之液滴射出裝置20、遮蔽板30及固定構件40的立體圖。 FIG. 6 is a perspective view showing the droplet ejection device 20, the shielding plate 30, and the fixing member 40 in the marking device 4 according to the first embodiment.

如第6圖所示,標記裝置4係具備液滴射出裝置20、遮蔽板30及固定構件40。標記裝置4係藉由對光學膜F10X射出油墨4i,來將比缺陷更大的點狀之標誌12印字於光學膜F10X之缺陷部位。 As shown in FIG. 6, the marking device 4 includes a droplet ejection device 20, a shielding plate 30, and a fixing member 40. The marking device 4 emits the ink 4i to the optical film F10X to print a dot-shaped mark 12 larger than a defect on the defective portion of the optical film F10X.

在以下之說明中係依需要而設定xyz正交座標系統,且一邊參照該xyz正交座標系統一邊針對各構 件之位置關係加以說明。在本實施形態中,係將液滴射出裝置20之射出面22的法線方向作為x方向,將在射出面22之面內正交於x方向的方向(射出面22之寬度方向)作為y方向,將正交於x方向及y方向的方向作為z方向。在此,x方向和y方向係位在水平面內,z方向係位在鉛直方向(上下方向)。再者,有時將x方向稱為前後方向,將y方向稱為左右方向。又,有時將+x方向稱為前方向,將-x方向稱為後方向,將+y方向稱為左方向,將-y方向稱為右方向,將+z方向稱為上方向,將-z方向稱為下方向。 In the following description, the xyz orthogonal coordinate system is set as necessary, and the positional relationship of each component will be described with reference to the xyz orthogonal coordinate system. In this embodiment, the normal direction of the exit surface 22 of the droplet ejection device 20 is defined as the x direction, and the direction orthogonal to the x direction (the width direction of the exit surface 22) is defined as y within the plane of the exit surface 22. The direction is a direction orthogonal to the x-direction and the y-direction as the z-direction. Here, the x direction and the y direction are located in a horizontal plane, and the z direction is located in a vertical direction (up and down direction). The x-direction is sometimes referred to as the front-rear direction and the y-direction is sometimes referred to as the left-right direction. The + x direction is sometimes called the forward direction, the -x direction is called the backward direction, the + y direction is called the left direction, the -y direction is called the right direction, and the + z direction is called the up direction. The -z direction is called the down direction.

如第6圖所示,標記裝置4係對朝向搬運線路9上與鉛直方向平行之方向V1(上方)搬運的光學膜F10X,從與鉛直方向正交的水平方向射出油墨4i。例如,光學膜F10X之搬運速度(以下稱為「線路速度」)係設為50m/min以下的值,作為能夠將標誌12印字於光學膜F10X的範圍。在本實施形態中,線路速度係設為30m/min以下的值。 As shown in FIG. 6, the marking device 4 ejects the ink 4i from the horizontal direction orthogonal to the vertical direction with respect to the optical film F10X conveyed toward the direction V1 (upper) parallel to the vertical direction on the conveying line 9. For example, the conveyance speed (hereinafter referred to as "line speed") of the optical film F10X is set to a value of 50 m / min or less as a range in which the mark 12 can be printed on the optical film F10X. In this embodiment, the line speed is set to a value of 30 m / min or less.

第7圖係顯示第一實施形態的標記裝置4中之液滴射出裝置20、遮蔽板30及固定構件40的前視圖。第8圖係第7圖的VIII-VIII剖視圖。第9圖係第8圖的主要部分放大圖,且為用以說明第一實施形態的遮蔽板30之作用的示意圖。再者,在第9圖中,為了方便起見,省略固定構件40之圖示。 FIG. 7 is a front view showing the droplet ejection device 20, the shielding plate 30, and the fixing member 40 in the marking device 4 according to the first embodiment. Fig. 8 is a sectional view taken along the line VIII-VIII in Fig. 7. FIG. 9 is an enlarged view of a main part of FIG. 8 and is a schematic diagram for explaining the function of the shielding plate 30 according to the first embodiment. Note that in FIG. 9, the illustration of the fixing member 40 is omitted for convenience.

如第7圖所示,液滴射出裝置20係具備能夠射出油墨的複數個射出頭20A。在第7圖中,雖然是圖 示三個射出頭20A作為一例,但是射出頭20A之數目係不限於此,而是能夠依需要而適當地設定一個或是二個或四個以上等。射出頭20A係形成為沿著y方向具有長邊的長方體狀。射出頭20A之射出面22(參照第8圖),係在第7圖之正面觀察下形成為沿著y方向具有長邊的長方形狀。 As shown in FIG. 7, the liquid droplet ejection apparatus 20 includes a plurality of ejection heads 20A capable of ejecting ink. In Fig. 7, three injection heads 20A are shown as an example, but the number of the injection heads 20A is not limited to this, and one, two, or four or more can be appropriately set as required. The injection head 20A is formed in a rectangular parallelepiped shape having long sides in the y-direction. The emission surface 22 (see FIG. 8) of the injection head 20A is formed in a rectangular shape with long sides along the y direction when viewed from the front of FIG. 7.

遮蔽板30係依每複數個射出頭20A而設置有複數個。在第7圖中,雖然是圖示依每三個射出頭20A所設置的三個遮蔽板30作為一例,但是遮蔽板30之數目係不限於此,而是能夠配合射出頭20A之數目來設定,且能夠依需要而適當地設定一個或是二個或四個以上等。遮蔽板30之與射出面22為相反側的面32(以下稱為「第一主面」),係在第7圖之正面觀察下形成為與射出面22大致相同大小的長方形狀。 A plurality of shielding plates 30 are provided for each of the plurality of injection heads 20A. In FIG. 7, although three shielding plates 30 provided for every three injection heads 20A are shown as an example, the number of the shielding plates 30 is not limited to this, but can be set in accordance with the number of the injection heads 20A. And one or two or four or more can be set as required. The surface 32 (hereinafter referred to as the "first principal surface") of the shielding plate 30 opposite to the emission surface 22 is formed in a rectangular shape having substantially the same size as the emission surface 22 when viewed from the front in FIG. 7.

固定構件40係能夠將遮蔽板30依每複數個射出頭20A而固定地設置有複數個。在第7圖中,雖然是圖示能夠將遮蔽板30依每三個射出頭20A而固定地設置的三個固定構件40作為一例,但是固定構件40之數目係不限於此,而是能夠配合射出頭20A及遮蔽板30之數目來設定,且能夠依需要而適當地設定一個或是二個或四個以上等。固定構件40係在第7圖之正面觀察下形成為沿著遮蔽板30的第一主面32之外形的矩形框狀。 The fixing member 40 is capable of fixedly providing a plurality of shielding plates 30 for each of the plurality of injection heads 20A. In FIG. 7, although three fixing members 40 that can be fixedly provided with the shielding plate 30 every three ejection heads 20A are shown as an example, the number of the fixing members 40 is not limited to this, but can be matched. The number of the injection heads 20A and the shielding plates 30 is set, and one or two or four or more can be appropriately set as required. The fixing member 40 is formed in a rectangular frame shape outside the first main surface 32 of the shielding plate 30 when viewed from the front side in FIG. 7.

例如,射出頭20A,係採用閥方式的噴墨頭(inkjet head)。例如,從射出頭20A之射出孔21所射出的油墨之量(以下稱為「液滴量」),係為了使印字於光學膜 F10X的點狀之標誌12的直徑(以下稱為「點直徑」)成為1mm以上且10mm以下之範圍的值,而設為0.05μL以上且0.2μL以下之範圍的值。在本實施形態中,液滴量係設為0.166μL左右。 For example, the injection head 20A is an inkjet head using a valve system. For example, the amount of ink ejected from the ejection hole 21 of the ejection head 20A (hereinafter referred to as "droplet amount") is the diameter (hereinafter referred to as "dot diameter") of the dot-shaped mark 12 printed on the optical film F10X. '') Is a value in a range of 1 mm to 10 mm, and is set to a value in a range of 0.05 μL or more and 0.2 μL or less. In this embodiment, the droplet amount is set to about 0.166 μL.

例如,從射出頭20A之射出孔21所射出的油墨之黏度(以下稱為「油墨黏度」),係為了使點直徑成為1mm以上且10mm以下之範圍的值,而設為0.05×10-3Pa‧s以上且1.00×10-3Pa‧s以下之範圍的值。在本實施形態中,油墨黏度係設為0.89×10-3Pa‧s。 For example, the viscosity of the ink ejected from the ejection hole 21 of the ejection head 20A (hereinafter referred to as "ink viscosity") is set to 0.05 × 10 -3 in order to make the dot diameter in a range of 1 mm to 10 mm. A value in the range of Pa · s or more and 1.00 × 10 -3 Pa · s or less. In this embodiment, the ink viscosity is set to 0.89 × 10 -3 Pa · s.

例如,來自射出頭20A的油墨之射出速度(以下稱為「油墨射出速度」),係設為1m/s以上且10m/s以下之範圍的值,較佳是設為4m/s以上且5m/s以下之範圍的值,來作為能夠印字的範圍。在本實施形態中,油墨射出速度係設為4.2m/s左右。藉由將油墨射出速度設為上述範圍內,就可以精度佳地印字於作為搬運中的光學膜F10X之目標的印字區域,且可以抑制油墨之滴落時的飛沫(例如第14圖所示的第二飛沫4b)之發生。在此,所謂「油墨之滴落」,係顯示所射出的油墨4i接觸於光學膜F10X,且一邊使油墨4i之形狀崩壞一邊在光學膜F10X上印字。 For example, the ejection speed of the ink from the ejection head 20A (hereinafter referred to as "ink ejection speed") is a value in a range of 1 m / s or more and 10 m / s or less, and preferably 4 m / s or more and 5 m or less. Values in the range below / s are used as the printable range. In this embodiment, the ink ejection speed is set to about 4.2 m / s. By setting the ink ejection speed within the above range, it is possible to print with high accuracy on the printing area that is the target of the optical film F10X during transportation, and it is possible to suppress droplets when the ink drops (for example, as shown in FIG. 14). The occurrence of the second droplet 4b). Here, the so-called "drip of ink" means that the ejected ink 4i is in contact with the optical film F10X and printed on the optical film F10X while the shape of the ink 4i is broken.

例如,射出頭20A之射出孔21的開口時間,係設為0.5ms以上之範圍的值,較佳是設為0.8ms以上且1.5ms以下之範圍的值,更佳是設為0.9ms以上且1.2ms以下之範圍的值,來作為能夠將標誌12印字於光學膜F10X的範圍。在本實施形態中,開口時間係設為1.0ms 左右。藉由將開口時間設為上述範圍內,就可以使所射出的油墨之量穩定化,且設為目的的點直徑,且可以抑制油墨射出時飛沫4a之發生。 For example, the opening time of the injection hole 21 of the injection head 20A is set to a value of 0.5 ms or more, preferably a value of 0.8 ms or more and 1.5 ms or less, more preferably 0.9 ms or more and A value in a range of 1.2 ms or less is a range in which the mark 12 can be printed on the optical film F10X. In this embodiment, the opening time is set to about 1.0 ms. By setting the opening time within the above range, the amount of ink to be ejected can be stabilized, and the target dot diameter can be set, and the occurrence of droplets 4a during ink ejection can be suppressed.

例如,來自射出頭20A的油墨之射出壓力(以下稱為「油墨射出壓力」)係設為0.030MPa以下之範圍的值,較佳是設為0.020MPa以上且0.28MPa以下之範圍的值,來作為能夠將標誌12印字於光學膜F10X的範圍。在本實施形態中,油墨射出壓力係設為0.025MPa左右。藉由將油墨射出壓力設為上述範圍內,就可以使油墨射出速度穩定化,且可以抑制油墨射出時的飛沫4a及油墨之滴落時的飛沫(例如第14圖所示的第二飛沫4b)之發生。 For example, the ejection pressure of the ink from the ejection head 20A (hereinafter referred to as "ink ejection pressure") is set to a value in a range of 0.030 MPa or less, preferably a value in a range of 0.020 MPa to 0.28 MPa. The range where the logo 12 can be printed on the optical film F10X. In this embodiment, the ink ejection pressure is set to about 0.025 MPa. By setting the ink ejection pressure within the above range, the ink ejection speed can be stabilized, and the droplets 4a during ink ejection and the droplets during ink dripping can be suppressed (for example, the second droplet 4b shown in FIG. 14). ).

例如,射出頭20A之射出孔21與光學膜F10X之間的距離K1(參照第9圖),係設為50mm以下的值,較佳是設為5mm以上且15mm以下的值,來作為能夠將標誌12印字於光學膜F10X的範圍。此理由是因當將距離K1設為過小時,射出頭20A就有可能與光學膜F10X相接觸,當將距離K1設為過大時,油墨從射出孔21射出時所飛散的飛沫就有可能廣範圍地擴展所致。在本實施形態中,距離K1係設為13mm左右。再者,距離K1係設為將射出面22中的射出孔21之中心和光學膜F10X之印字面(-x方向側的面)以射出面22之法線方向予以連結所成的線段之長度。射出頭20A之射出孔21與光學膜F10X之間的距離,係相當於射出頭20A之射出面22與光學膜F10X之間的距離。 For example, the distance K1 (see FIG. 9) between the exit hole 21 of the ejection head 20A and the optical film F10X is set to a value of 50 mm or less, preferably a value of 5 mm or more and 15 mm or less. The logo 12 is printed on the area of the optical film F10X. The reason is that when the distance K1 is set too small, the ejection head 20A may be in contact with the optical film F10X. When the distance K1 is set too large, the droplets scattered when the ink is ejected from the ejection hole 21 may be wide. Scope expansion. In this embodiment, the distance K1 is set to about 13 mm. The distance K1 is the length of a line segment formed by connecting the center of the exit hole 21 in the exit surface 22 and the printing surface (the surface on the −x direction side) of the optical film F10X in the normal direction of the exit surface 22. . The distance between the emitting hole 21 of the emitting head 20A and the optical film F10X is equivalent to the distance between the emitting surface 22 of the emitting head 20A and the optical film F10X.

例如,藉由光學膜F10X之搬運所產生的光學膜F10X周邊之風速,係設為0.5m/s以下之範圍的值,較佳是設為0.2m/s以下之範圍的值,來作為能夠將標誌12印字於光學膜F10X的範圍。在本實施形態中,前述風速係在線路速度25m/min左右之條件下設成會成為0.1m/s左右。當風速在上述範圍內時,就可以抑制產生出的飛沫4a、4b廣範圍地擴展。 For example, the wind speed around the optical film F10X generated by the transportation of the optical film F10X is a value in a range of 0.5 m / s or less, preferably a value in a range of 0.2 m / s or less. The logo 12 is printed on the area of the optical film F10X. In this embodiment, the aforementioned wind speed is set to be about 0.1 m / s under the condition that the line speed is about 25 m / min. When the wind speed is within the above range, the generated droplets 4a and 4b can be suppressed from spreading over a wide range.

在射出頭20A(液滴射出裝置20)之射出面22係形成有對光學膜F10X射出油墨的複數個射出孔21。複數個射出孔21係沿著射出面22之寬度方向(y方向)排列並配置成一排於射出面22之上下方向(z方向)的中央。在第7圖中,雖然是圖示每一個射出面22有九個射出孔21作為一例,但是在本實施形態中,係每一個射出面22形成有16個射出孔21。再者,射出孔21之數目係不限於此,而是能夠依需要而適當地設定8個以下之數目或10個以上之數目等。又,射出孔21之排列係未限於一排,而是能夠依需要而適當地設定二排以上等。射出孔21,係在第7圖之正面觀察下形為圓形。 The ejection surface 22 of the ejection head 20A (the droplet ejection device 20) is formed with a plurality of ejection holes 21 for ejecting ink to the optical film F10X. The plurality of injection holes 21 are arranged along the width direction (y direction) of the emission surface 22 and are arranged in a row at the center in the up-down direction (z direction) of the emission surface 22. In FIG. 7, although nine injection holes 21 are shown as an example in each of the injection surfaces 22, in this embodiment, 16 injection holes 21 are formed in each of the injection surfaces 22. In addition, the number of the injection holes 21 is not limited to this, but can be appropriately set to a number of 8 or less or a number of 10 or more as needed. The arrangement of the injection holes 21 is not limited to one row, but two or more rows can be appropriately set as required. The injection hole 21 is circular when viewed from the front in FIG. 7.

如第8圖所示,遮蔽板30係設置於射出面22。如第9圖所示,遮蔽板30係在與射出面22之法線平行的方向(x方向)具有厚度t1。例如,遮蔽板30之厚度t1,較佳是設為2mm以上且10mm以下之範圍的值,更佳是設為2mm以上且5mm以下之範圍的值。在本實施形態中,遮蔽板30之厚度t1係設為3mm左右。再者,遮蔽板30 之厚度t1,亦可在遮蔽板30不接觸到光學膜F10X的範圍內盡可能地設為較大。 As shown in FIG. 8, the shielding plate 30 is provided on the emission surface 22. As shown in FIG. 9, the shielding plate 30 has a thickness t1 in a direction (x direction) parallel to the normal line of the emission surface 22. For example, the thickness t1 of the shielding plate 30 is preferably a value in a range of 2 mm to 10 mm, and more preferably a value in a range of 2 mm to 5 mm. In this embodiment, the thickness t1 of the shielding plate 30 is set to about 3 mm. In addition, the thickness t1 of the shielding plate 30 may be made as large as possible within a range where the shielding plate 30 does not contact the optical film F10X.

遮蔽板30係能夠阻斷油墨4i從射出孔21射出時所飛散的飛沫4a。在遮蔽板30係形成有於與射出孔21相對向之位置形成開口的開口部31。開口部31係具有面向設出油墨4i之射出通路Ia的內壁面31a。開口部31之內壁面31a係形成為將射出路徑Ia作為中心軸的圓筒狀。開口部31之內壁面31a係遮擋油墨4i從射出孔21射出時朝向與射出面22之法線交叉的方向飛散的飛沫4a。已飛散的飛沫4a之至少一部分係附著於開口部31之內壁面31a。 The shielding plate 30 is capable of blocking the droplets 4a scattered when the ink 4i is ejected from the ejection hole 21. The shielding plate 30 is formed with an opening portion 31 which is opened at a position facing the injection hole 21. The opening portion 31 has an inner wall surface 31a facing the ejection path Ia on which the ink 4i is provided. The inner wall surface 31a of the opening portion 31 is formed in a cylindrical shape with the emission path Ia as a central axis. The inner wall surface 31 a of the opening portion 31 is a droplet 4 a that scatters the ink 4 i in a direction that intersects the normal line of the emission surface 22 when the ink 4 i is ejected from the emission hole 21. At least a part of the scattered droplets 4 a is attached to the inner wall surface 31 a of the opening portion 31.

如第7圖所示,開口部31係依每複數個噴出孔21而設置有複數個。複數個開口部31係沿著第一主面32之寬度方向(y方向)排列並配置一排於第一主面32之上下方向(z方向)的中央。在第7圖中,雖然是圖示每一個遮蔽板30有九個開口部31作為一例,但是在本實施形態中,係每一個遮蔽板30配合16個射出孔21而設置有16個開口部31。再者,開口部31之數目係不限於此,而是能夠依需要而適當地設定八個以下之數目或10個以上之數目等。又,開口部31之排列係未限於一排,而是能夠依需要而適當地設定二排以上等。開口部31係在第7圖之正面觀察下為圓形。 As shown in FIG. 7, a plurality of openings 31 are provided for each of the plurality of ejection holes 21. The plurality of openings 31 are arranged along the width direction (y direction) of the first main surface 32 and are arranged in a row at the center in the up-down direction (z direction) of the first main surface 32. In FIG. 7, although each shielding plate 30 has nine openings 31 as an example, in this embodiment, each shielding plate 30 is provided with 16 openings in cooperation with 16 injection holes 21. 31. In addition, the number of the openings 31 is not limited to this, but a number of eight or less or a number of ten or more can be appropriately set as needed. The arrangement of the openings 31 is not limited to one row, but two or more rows can be appropriately set as required. The opening 31 is circular when viewed from the front in FIG. 7.

如第9圖所示,開口部31之直徑d1係比射出孔21之直徑d2更大(d1>d2)。例如,開口部31之直 徑d1與射出孔21之直徑d2的比d1/d2,較佳是設為1.5以上且5以下之範圍的值,更佳是設為2以上且4以下之範圍的值。在本實施形態中,比d1/d2係設為3左右,開口部31之直徑d1係設為3mm左右,射出孔21之直徑d2係設為1mm左右。再者,射出孔21之直徑d2亦可設為0.1mm以上且2mm以下之範圍的值。 As shown in FIG. 9, the diameter d1 of the opening 31 is larger than the diameter d2 of the injection hole 21 (d1> d2). For example, the ratio d1 / d2 of the diameter d1 of the opening portion 31 to the diameter d2 of the injection hole 21 is preferably a value in a range of 1.5 to 5 and more preferably a value in a range of 2 to 4 . In this embodiment, the ratio d1 / d2 is set to about 3, the diameter d1 of the opening 31 is set to about 3 mm, and the diameter d2 of the injection hole 21 is set to about 1 mm. The diameter d2 of the injection hole 21 may be set to a value in a range of 0.1 mm to 2 mm.

遮蔽板30之第一主面32係從光學膜F10X分離。例如,遮蔽板30之第一主面32與光學膜F10X之間的距離L1,較佳是設為10mm以下的值,更佳是設為5mm以下的值。在本實施形態中,前述距離L1係設為10mm左右。再者,前述距離L1亦可在遮蔽板30不接觸到光學膜F10X的範圍內盡可能地設為較小。 The first main surface 32 of the shielding plate 30 is separated from the optical film F10X. For example, the distance L1 between the first main surface 32 of the shielding plate 30 and the optical film F10X is preferably a value of 10 mm or less, and more preferably a value of 5 mm or less. In the present embodiment, the distance L1 is set to about 10 mm. The distance L1 may be made as small as possible within a range where the shielding plate 30 does not contact the optical film F10X.

遮蔽板30係抵接於射出面22。換言之,遮蔽板30之射出面22側的面35(以下稱為「第二主面」),係與射出面22配置於同一平面。 The shielding plate 30 is in contact with the emission surface 22. In other words, the surface 35 on the exit surface 22 side of the shielding plate 30 (hereinafter referred to as the “second principal surface”) is disposed on the same plane as the exit surface 22.

例如,遮蔽板30係藉由SUS等的金屬板、或壓克力板(acrylic plate)及聚丙烯板(polypropylene plate)(PP板)等的塑膠板所形成。在本實施形態中,遮蔽板30係藉由壓克力板所形成。再者,遮蔽板30亦可藉由對油墨不反應的板材所形成。藉此,因可以抑制藉由遮蔽板30之油墨所致的腐蝕,故而可以提高遮蔽板30之耐蝕性。 For example, the shielding plate 30 is formed of a metal plate such as SUS or a plastic plate such as an acrylic plate and a polypropylene plate (PP plate). In this embodiment, the shielding plate 30 is formed by an acrylic plate. In addition, the shielding plate 30 may be formed of a plate material that does not respond to ink. Thereby, since the corrosion by the ink of the shielding plate 30 can be suppressed, the corrosion resistance of the shielding plate 30 can be improved.

固定構件40係將遮蔽板30固定於射出頭20A。如第8圖所示,固定構件40係具備第一壁部41及第二壁部42。例如,固定構件40係藉由SUS等的金屬板 所構成。 The fixing member 40 fixes the shielding plate 30 to the injection head 20A. As shown in FIG. 8, the fixing member 40 includes a first wall portion 41 and a second wall portion 42. For example, the fixing member 40 is made of a metal plate such as SUS.

第一壁部41係覆蓋位在與射出頭20A及遮蔽板30之雙方中的射出面22之法線正交的方向的側端部23、33。第一壁部41係形成為沿著前後方向(x方向)延伸的矩形筒狀。第一壁部41係抵接於射出頭20A之上下方向(z方向)及寬度方向(y方向)的側端部23中之射出面22側的部分,以及遮蔽板30之上下方向(z方向)及寬度方向(y方向)的側端部33之雙方。例如,第一壁部41係藉由螺栓等的緊固構件來鎖緊連結於射出頭20A。藉此,能限制射出頭20A及遮蔽板30之上下方向(z方向)及寬度方向(y方向)的相對移動。 The first wall portion 41 covers the side end portions 23 and 33 located in a direction orthogonal to the normal line of the emission surface 22 of both the emission head 20A and the shielding plate 30. The first wall portion 41 is formed in a rectangular cylindrical shape extending in the front-rear direction (x direction). The first wall portion 41 is a portion abutting on the exit surface 22 side of the side end portion 23 of the ejection head 20A in the up-down direction (z direction) and the width direction (y direction), and the up-down direction of the shielding plate 30 (z direction ) And both side ends 33 in the width direction (y direction). For example, the first wall portion 41 is fastened to the injection head 20A by a fastening member such as a bolt. This can restrict the relative movement of the ejection head 20A and the shielding plate 30 in the up-down direction (z direction) and the width direction (y direction).

第二壁部42係覆蓋遮蔽板30之第一主面32中的開口部31之外周的外緣部34。第二壁部42係形成為從第一壁部41之前端(+x方向端)朝向z方向內側延伸的矩形框狀。第二壁部42係抵接於遮蔽板30之第一主面32中的開口部31之外周的外緣部34。例如,第二壁部42係藉由與第一壁部41相同的構件形成一體。再者,第二壁部42亦可藉由螺栓等的緊固構件來鎖緊連結於第一壁部41。藉此,能限制射出頭20A及遮蔽板30之前後方向(x方向)的相對移動。 The second wall portion 42 is an outer edge portion 34 that covers the outer periphery of the opening portion 31 in the first main surface 32 of the shielding plate 30. The second wall portion 42 is formed in a rectangular frame shape extending from the front end (the end in the + x direction) of the first wall portion 41 toward the inside in the z direction. The second wall portion 42 is in contact with an outer edge portion 34 on the outer periphery of the opening portion 31 in the first main surface 32 of the shielding plate 30. For example, the second wall portion 42 is integrated with the same member as the first wall portion 41. The second wall portion 42 may be locked and connected to the first wall portion 41 by a fastening member such as a bolt. This can restrict the relative movement of the ejection head 20A and the shielding plate 30 in the front-rear direction (x-direction).

以下,針對標記裝置4之構成要件中的飛散限制構件50加以說明。第13圖係顯示第一實施形態的標記裝置4之立體圖。第14圖係包含第13圖的主要部分放大圖,且為用以說明第一實施形態的標記裝置4中之飛 散限制構件50之作用的圖。再者,在第14圖中,為了方便起見,係省略固定壁部53、54的圖示。 The scattering restriction member 50 among the constituent elements of the marking device 4 will be described below. Fig. 13 is a perspective view showing a marking device 4 according to the first embodiment. Fig. 14 is an enlarged view including the main part of Fig. 13 and is a diagram for explaining the operation of the scattering restricting member 50 in the marking device 4 according to the first embodiment. Note that in FIG. 14, the illustration of the fixing wall portions 53 and 54 is omitted for the sake of convenience.

如第13圖所示,標記裝置4係具備液滴射出裝置20、遮蔽板30、固定構件40及飛散限制構件50。 As shown in FIG. 13, the marking device 4 includes a droplet ejection device 20, a shielding plate 30, a fixing member 40, and a scattering restricting member 50.

如第14圖所示,飛散限制構件50係設置於射出面22與光學膜F10X之間。具體而言,飛散限制構件50,係設置於比遮蔽板30更前方的固定構件40與光學膜F10X之間。飛散限制構件50,係阻斷油墨4i從射出孔21射出後滴落於光學膜F10X為止所飛散的飛沫。前述飛沫係包含油墨4i從射出孔21射出時所飛散的第一飛沫4a,與油墨4i滴落於光學膜F10X時所飛散的第二飛沫4b之至少一方。第一飛沫4a及第二飛沫4b係對印字對象的影響特別大。 As shown in FIG. 14, the scattering restriction member 50 is provided between the emission surface 22 and the optical film F10X. Specifically, the scattering restriction member 50 is provided between the fixing member 40 and the optical film F10X, which are located forward of the shielding plate 30. The scattering restricting member 50 blocks droplets scattered until the ink 4i is ejected from the ejection hole 21 and drops on the optical film F10X. The droplets include at least one of the first droplet 4a scattered when the ink 4i is ejected from the ejection hole 21 and the second droplet 4b scattered when the ink 4i is dropped on the optical film F10X. The effects of the first droplet 4a and the second droplet 4b on the printing target are particularly large.

在此,油墨4i從射出孔21射出之後到滴落於光學膜F10X之前所飛散的飛沫係除了油墨射出、滴落時所產生的飛沫4a、4b以外,還可列舉油墨4i在從射出孔21朝向光學膜F10X之飛行中所飛散的飛沫。但是,該油墨4i在飛行中所飛散的飛沫相較於油墨射出、滴落時所產生的飛沫4a、4b,因其產生的數量較少,且飛沫本身的大小亦非常地小,故而被設想為會汙染印字對象之程度的影響較少。 Here, in addition to the droplets 4a and 4b generated when the ink is ejected and dripped, the droplets scattered after the ink 4i is ejected from the ejection hole 21 before being dropped on the optical film F10X are also listed. The droplets scattered during the flight towards the optical film F10X. However, compared with the droplets 4a and 4b generated when the ink is ejected and dripped, the droplets scattered by the ink 4i during flight are smaller, and the size of the droplets is also very small. The influence to the extent that the printed object is contaminated is small.

再者,第一飛沫4a係包含未附著於遮蔽板30的開口部31之內壁面31a,而是通過開口部31並浮游於空中的飛沫。又,油墨4i在飛行中所飛散的飛沫會採取 與第一飛沫4a同樣的舉動。 The first droplet 4 a is a droplet that does not adhere to the inner wall surface 31 a of the opening portion 31 of the shielding plate 30 but floats in the air through the opening portion 31. The droplets scattered by the ink 4i in flight take the same behavior as the first droplet 4a.

在飛散限制構件50係形成有朝向與射出面22之法線正交的方向擴展的阻斷面50f。在飛散限制構件50中,射出面22側的阻斷面50f係限制第一飛沫4a朝向光學膜F10X側移動;光學膜F10X側的阻斷面50f,係限制第二飛沫4b朝向射出面22側移動。亦即,飛散出的第一飛沫4a之至少一部分係附著於飛散限制構件50中的射出面22側之阻斷面50f,飛散出的第二飛沫4b之至少一部分係附著於飛散限制構件50中的光學膜F10X側之阻斷面50f。 The scattering restricting member 50 is formed with a blocking surface 50f that extends in a direction orthogonal to the normal to the emission surface 22. In the scattering restriction member 50, the blocking surface 50f on the emission surface 22 side restricts the first droplet 4a from moving toward the optical film F10X side; the blocking surface 50f on the optical film F10X side restricts the second droplet 4b toward the emission surface 22 side. mobile. That is, at least a part of the first droplet 4a scattered is attached to the blocking surface 50f on the emission surface 22 side in the scattering restriction member 50, and at least a part of the second droplet 4b scattered is attached to the scattering restriction member 50. The blocking surface 50f on the side of the optical film F10X.

再者,阻斷面50f係不限於朝向與射出面22之法線正交的方向擴展,而是亦可朝向與射出面22之法線交叉的方向擴展。例如,阻斷面50f係從有效地阻斷第一飛沫4a及第二飛沫4b的觀點來看,為了使與光學膜F10X之相對向面積成為最大,較佳是朝向與膜搬運方向成為平行的方向且正交於射出面22之法線的方向擴展。再者,根據設備布局之關係而無法維持上述關係的情況下,為了相對於膜搬運方向儘量地成為平行,亦可調整阻斷面50f與射出面22之法線所成的角度。 In addition, the blocking surface 50f is not limited to extend in a direction orthogonal to the normal line of the emission surface 22, but may extend in a direction that intersects the normal line of the emission surface 22. For example, the blocking surface 50f is from the viewpoint of effectively blocking the first droplet 4a and the second droplet 4b. In order to maximize the area facing the optical film F10X, it is preferable to face the film parallel to the film conveying direction. The direction extends perpendicularly to the direction normal to the exit surface 22. Furthermore, if the above relationship cannot be maintained due to the relationship of the equipment layout, in order to be as parallel as possible with respect to the film conveying direction, the angle formed by the normal surface of the blocking surface 50f and the emission surface 22 may be adjusted.

如第13圖所示,飛散限制構件50係具備飛散限制板51、52、和固定壁部53、54。 As shown in FIG. 13, the scattering restriction member 50 includes scattering restriction plates 51 and 52 and fixed wall portions 53 and 54.

飛散限制板51、52係在與射出面22之法線平行的方向(x方向)具有厚度。在本實施形態中,飛散限制板51、52之厚度係設為3mm左右。再者,飛散限制板51、52之 厚度,亦可依需要而適當地設定,只要設定在能夠阻斷第一飛沫4a及第二飛沫4b的程度即可。 The scattering restriction plates 51 and 52 have a thickness in a direction (x direction) parallel to the normal line of the emission surface 22. In the present embodiment, the thickness of the scattering restriction plates 51 and 52 is set to about 3 mm. The thickness of the scattering restriction plates 51 and 52 may be appropriately set as required, as long as it is set to a level at which the first droplet 4a and the second droplet 4b can be blocked.

飛散限制板51、52,係設為在膜寬度方向(第13圖所示之y方向)具有長邊且在膜搬運方向(第13圖所示之z方向)具有短邊的長方形狀。在本實施形態中,飛散限制板51、52之長邊的長度係設為相當於膜寬度的1600mm左右,飛散限制板51、52之短邊的長度係設為50mm左右。 The scattering restriction plates 51 and 52 are rectangular shapes having long sides in the film width direction (the y direction shown in FIG. 13) and short sides in the film conveying direction (the z direction shown in FIG. 13). In this embodiment, the length of the long sides of the scattering restriction plates 51 and 52 is set to about 1600 mm corresponding to the film width, and the length of the short sides of the scattering restriction plates 51 and 52 is set to about 50 mm.

如第14圖所示,第一飛散限制板51係隔著射出油墨4i的射出通路Ia而配置於一方側。第二飛散限制板52係隔著射出通路Ia而配置於另一方側。第一飛散限制板51係在鉛直方向上配置於比射出通路Ia更上方,第二飛散限制板52係在鉛直方向上配置於比射出通路Ia更下方。第一飛散限制板51及第二飛散限制板52係配置於隔著射出通路Ia而相鄰的位置。在第一飛散限制板51係形成有朝向與射出面22之法線正交的方向擴展的第一阻斷面51f,在第二飛散限制板52係形成有與第一阻斷面51f平行地擴展的第二阻斷面52f。 As shown in FIG. 14, the first scattering-restricting plate 51 is disposed on one side with the ejection path Ia from which the ink 4i is ejected. The second scattering-restricting plate 52 is disposed on the other side via the emission path Ia. The first scattering restriction plate 51 is disposed above the emission path Ia in the vertical direction, and the second scattering restriction plate 52 is disposed below the emission path Ia in the vertical direction. The first scattering restriction plate 51 and the second scattering restriction plate 52 are disposed at positions adjacent to each other across the emission path Ia. The first scattering-restricting plate 51 is formed with a first blocking surface 51f extending in a direction orthogonal to the normal to the emission surface 22, and the second scattering-restricting plate 52 is formed with a parallel surface to the first blocking surface 51f. The extended second blocking surface 52f.

如第13圖所示,第一飛散限制板51及第二飛散限制板52分離的間隔s1(以下稱為「狹縫(slit)間隔」),係比射出孔21之直徑d2(參照第9圖)更大。例如,狹縫間隔s1較佳是設為2mm以上且10mm以下之範圍的值,更佳是設為2mm以上且5mm以下之範圍的值。此理由是因當將狹縫間隔s1設為過小時,油墨4i就不能過通 狹縫間隔s1,亦即有油墨4i會觸及第一飛散限制板51及第二飛散限制板52的可能性,當將狹縫間隔s1設為過大時,就有來自射出孔21的第一飛沫4a會寬範圍地擴展的可能性所致。在本實施形態中,狹縫間隔s1係設為5mm左右。再者,射出孔21之直徑d2係設為1mm左右。 As shown in FIG. 13, an interval s1 (hereinafter referred to as a “slit interval”) at which the first scattering restriction plate 51 and the second scattering restriction plate 52 are separated is smaller than the diameter d2 of the injection hole 21 (refer to FIG. 9). (Figure) bigger. For example, the slit interval s1 is preferably a value in a range of 2 mm to 10 mm, and more preferably a value in a range of 2 mm to 5 mm. The reason is that when the slit interval s1 is set too small, the ink 4i cannot pass through the slit interval s1, that is, there is a possibility that the ink 4i may touch the first scattering limit plate 51 and the second scattering limit plate 52. When the slit interval s1 is set too large, there is a possibility that the first droplets 4a from the injection holes 21 may expand widely. In this embodiment, the slit interval s1 is set to about 5 mm. The diameter d2 of the injection hole 21 is set to about 1 mm.

第一固定壁部53係具備上壁部53a及側壁部53b。第一固定壁部53係與第一飛散限制板51形成為一體。第一固定壁部53之上壁部53a係一體地連結於第一飛散限制板51之上端,並且以越往後側(-x方向側)就越位在上方的方式傾斜。第一固定壁部53之側壁部53b係一體地連結於第一飛散限制板51之左右側端及上壁部53a之左右側端,並且以越往後側(-x方向側)就越位在上方的方式傾斜,之後朝向後方屈曲而延伸。藉此,可以提高第一飛散限制板51之支撐剛性,並且可以限制第一飛沫4a往上方及左右側方之移動。 The first fixed wall portion 53 includes an upper wall portion 53a and a side wall portion 53b. The first fixed wall portion 53 is formed integrally with the first scattering restriction plate 51. The upper wall portion 53a of the first fixed wall portion 53 is integrally connected to the upper end of the first scattering restricting plate 51, and is inclined so as to be positioned above the rear side (the -x direction side). The side wall portions 53b of the first fixed wall portion 53 are integrally connected to the left and right side ends of the first scattering restricting plate 51 and the left and right side ends of the upper wall portion 53a, and are positioned further toward the rear side (-x direction side). The upward method is inclined, and then it flexes toward the rear and extends. Thereby, the support rigidity of the first scattering restriction plate 51 can be improved, and the movement of the first droplet 4a upward and leftward and rightward can be restricted.

例如,第一固定壁部53係藉由螺栓等的緊固構件而鎖緊連結於射出頭20A。藉此,能限制射出頭20A、第一固定壁部53及第一飛散限制板51之上下方向(z方向)、寬度方向(y方向)及前後方向(x方向)的相對移動。 For example, the first fixed wall portion 53 is fastened to the injection head 20A by a fastening member such as a bolt. This can restrict the relative movement of the injection head 20A, the first fixed wall portion 53 and the first scattering restriction plate 51 in the up-down direction (z direction), the width direction (y direction), and the front-back direction (x direction).

第二固定壁部54係具備下壁部54a及側壁部54b。第二固定壁部54係與第二飛散限制板52形成為一體。第二固定壁部54之下壁部54a係一體地連結於第二飛散限制板52之下端,並且朝向後方(-x方向)延伸。第二固定壁部54之側壁部54b係一體地連結於第二飛散限制板 52下部之左右側端及下壁部54a之左右側端,並且朝向後方延伸直至到達下壁部54a之後端為止。藉此,可以提高第二飛散限制板52之支撐剛性,並且可以限制第一飛沫4a往下方及左右側方之移動。 The second fixed wall portion 54 includes a lower wall portion 54a and a side wall portion 54b. The second fixed wall portion 54 is formed integrally with the second scattering restriction plate 52. The lower wall portion 54 a of the second fixed wall portion 54 is integrally connected to the lower end of the second scattering restriction plate 52 and extends toward the rear (-x direction). The side wall portions 54b of the second fixed wall portion 54 are integrally connected to the left and right side ends of the lower portion of the second scattering restriction plate 52 and the left and right side ends of the lower wall portion 54a, and extend rearward until reaching the rear end of the lower wall portion 54a. Thereby, the support rigidity of the second scattering restricting plate 52 can be improved, and the movement of the first droplet 4a downward and leftward and rightward can be restricted.

例如,第二固定壁部54係藉由螺栓等的緊固構件而鎖緊連結於射出頭20A。藉此,能限制射出頭20A、第二固定壁部54及第二飛散限制板52之上下方向(z方向)、寬度方向(y方向)及前後方向(x方向)的相對移動。 For example, the second fixed wall portion 54 is fastened to the injection head 20A by a fastening member such as a bolt. This can restrict the relative movement of the injection head 20A, the second fixed wall portion 54 and the second scattering restriction plate 52 in the up-down direction (z direction), the width direction (y direction), and the front-back direction (x direction).

飛散限制構件50之光學膜F10X側的阻斷面50f係從光學膜F10X分離。例如,飛散限制構件50之光學膜F10X側的阻斷面50f與光學膜F10X之間的距離(以下稱為「阻斷面與光學膜間距離」),較佳是設為10mm以下的值,更佳是設為1mm以上且5mm以下的值。此理由是因當將阻斷面與光學膜間距離設為過小時,就有飛散限制構件50會與光學膜F10X相接觸的可能性,當將阻斷面與光學膜間距離設為過大時,就有無法藉由阻斷面50f來限制第二飛沫4b之移動的可能性所致。在本實施形態中,阻斷面與光學膜間距離係設為3mm左右。 The blocking surface 50f on the optical film F10X side of the scattering restriction member 50 is separated from the optical film F10X. For example, the distance between the blocking surface 50f on the optical film F10X side of the scattering restriction member 50 and the optical film F10X (hereinafter referred to as the "distance between the blocking surface and the optical film") is preferably a value of 10 mm or less. More preferably, it is a value of 1 mm or more and 5 mm or less. This reason is that when the distance between the blocking surface and the optical film is set too small, there is a possibility that the scattering restricting member 50 may contact the optical film F10X. When the distance between the blocking surface and the optical film is set too large, There is a possibility that the movement of the second droplet 4b cannot be restricted by the blocking surface 50f. In this embodiment, the distance between the blocking surface and the optical film is set to about 3 mm.

飛散限制構件50之射出面22側的阻斷面50f係從射出面22分離。例如,飛散限制構件50之射出面22側的阻斷面50f與射出面22之間的距離(以下稱為「阻斷面與射出面間距離」),較佳是設為3mm以上的值。在本實施形態中,阻斷面與射出面間距離係設為10mm左右。此理由是因當將阻斷面與射出面間距離設為過小時,就有 無法藉由阻斷面50f來限制第二飛沫4b之移動的可能性,當將阻斷面與射出面間距離設為過大時,就有必要加大狹縫間隔s1所致。 The blocking surface 50f on the emission surface 22 side of the scattering restriction member 50 is separated from the emission surface 22. For example, the distance between the blocking surface 50f on the emission surface 22 side of the scattering restriction member 50 and the emission surface 22 (hereinafter referred to as the "distance between the blocking surface and the emission surface") is preferably a value of 3 mm or more. In this embodiment, the distance between the blocking surface and the emission surface is set to about 10 mm. The reason is that when the distance between the blocking surface and the emitting surface is set too small, there is a possibility that the movement of the second droplet 4b cannot be restricted by the blocking surface 50f. When the distance between the blocking surface and the emitting surface is set, If it is set too large, it is necessary to increase the slit interval s1.

例如,飛散限制構件50係藉由SUS等的金屬板或壓克力板及聚丙烯板(PP板)等的塑膠板所形成。在本實施形態中,飛散限制構件50係藉由壓克力板所形成。再者,飛散限制構件50亦可藉由對油墨不反應的板材所形成。藉此,因可以抑制藉由飛散限制構件50之油墨所致的腐蝕,故而可以提高飛散限制構件50之耐蝕性。 For example, the scattering restricting member 50 is formed of a metal plate such as SUS or an acrylic plate and a plastic plate such as a polypropylene plate (PP plate). In this embodiment, the scattering restricting member 50 is formed by an acrylic plate. In addition, the scattering restriction member 50 may be formed of a plate material that does not respond to ink. This can suppress corrosion caused by the ink of the scattering restricting member 50, so that the corrosion resistance of the scattering restricting member 50 can be improved.

如以上說明般,本實施形態的標記裝置4係能夠藉由對光學膜F10X射出油墨4i來標記標誌12,該標記裝置4係具備:液滴射出裝置20,係具有形成有對光學膜F10X射出油墨4i的射出孔21的射出面22;以及飛散限制構件50,係設置於射出面22與光學膜F10X之間,能夠阻斷油墨4i從射出孔21射出時所飛散的第一飛沫4a,和油墨4i滴落於光學膜F10X時所飛散的第二飛沫4b之至少一方;在飛散限制構件50係形成有朝向與射出面22之法線正交的方向擴展的阻斷面50f。 As described above, the marking device 4 of this embodiment is capable of marking the mark 12 by emitting ink 4i to the optical film F10X. The marking device 4 is provided with a droplet ejection device 20 having an optical film F10X formed thereon. The emission surface 22 of the injection hole 21 of the ink 4i; and the scattering restricting member 50, which is provided between the emission surface 22 and the optical film F10X, and can block the first droplet 4a scattered when the ink 4i is emitted from the injection hole 21, The ink 4i is dropped on at least one of the second droplets 4b scattered when the optical film F10X is dropped; and the blocking member 50 is formed with a blocking surface 50f that expands in a direction orthogonal to the normal line of the emission surface 22.

依據本實施形態,在射出面22與光學膜F10X之間,設置能夠阻斷油墨4i從射出孔21射出時所飛散的第一飛沫4a和油墨4i滴落於光學膜F10X時所飛散的第二飛沫4b之至少一方的飛散限制構件50,且在飛散限制構件50形成朝向與射出面22之法線正交的方向擴展的阻斷面50f,藉此與不設置飛散限制構件50而是從液滴射 出裝置20直接射出油墨的情況相較,因可以限制第一飛沫4a在射出面22與光學膜F10X之間朝向光學膜F10X側移動,並且可以限制第二飛沫4b朝向射出面22側移動,故而即便第一飛沫4a在油墨4i從射出孔21射出時飛散,或是第二飛沫4b在油墨4i滴落於光學膜F10X時飛散,仍可以抑制第一飛沫4a及第二飛沫4b附著於光學膜F10X之缺陷部位以外的區域,且可以提高製品的良率。 According to this embodiment, between the emission surface 22 and the optical film F10X, a first droplet 4a and an ink 4i which are capable of blocking the ink 4i from scattering when the ink 4i is ejected from the injection hole 21 are provided to the optical film F10X. The scattering restricting member 50 of at least one of the droplets 4 b forms a blocking surface 50 f which extends in a direction orthogonal to the normal to the emission surface 22 in the scattering restricting member 50, thereby removing the scattering restricting member 50 from the liquid instead of providing the scattering restricting member 50. Compared with the case where the droplet ejection device 20 directly ejects ink, the first droplet 4a can be restricted from moving between the emission surface 22 and the optical film F10X toward the optical film F10X side, and the second droplet 4b can be restricted from moving toward the emission surface 22 side. Therefore, even if the first droplet 4a scatters when the ink 4i is ejected from the ejection hole 21, or the second droplet 4b scatters when the ink 4i drops on the optical film F10X, it is still possible to suppress the first droplet 4a and the second droplet 4b from attaching to the optical The film F10X is in a region other than the defect site, and the yield of the product can be improved.

又,飛散限制構件50係具備在與射出面22之法線平行的方向(x方向)具有厚度的飛散限制板51、52,藉此就可以藉由調整飛散限制板51、52之厚度來提高飛散限制板51、52之剛性,且可以有效地阻斷第一飛沫4a及第二飛沫4b。 In addition, the scattering restriction member 50 includes scattering restriction plates 51 and 52 having a thickness in a direction (x direction) parallel to the normal line of the emission surface 22, whereby the thickness of the scattering restriction plates 51 and 52 can be increased by adjusting the thickness thereof. The scattering restriction plates 51 and 52 are rigid and can effectively block the first droplet 4a and the second droplet 4b.

又,飛散限制構件50係具備隔著射出油墨4i的射出通路Ia而配置於一方側的第一飛散限制板51,以及隔著射出通路Ia而配置於另一方側的第二飛散限制板52,藉此就可以用簡單的構成來有效地阻斷隔著射出通路Ia而飛散至兩側的第一飛沫4a及第二飛沫4b。 The scattering restriction member 50 includes a first scattering restriction plate 51 disposed on one side via the emission path Ia of the ink 4i, and a second scattering restriction plate 52 disposed on the other side via the emission path Ia. This makes it possible to effectively block the first droplets 4a and the second droplets 4b scattered to both sides via the ejection path Ia with a simple structure.

又,第一飛散限制板51係在鉛直方向上配置於比射出通路Ia更上方,第二飛散限制板52係在鉛直方向上配置於比射出通路Ia更下方,藉此就可以用簡單的構成來有效地阻斷隔著射出通路Ia而飛散至上下兩側的第一飛沫4a及第二飛沫4b。 In addition, the first scattering restriction plate 51 is disposed above the emission path Ia in the vertical direction, and the second scattering restriction plate 52 is disposed below the emission path Ia in the vertical direction, so that a simple configuration can be used. This effectively blocks the first droplets 4a and the second droplets 4b that are scattered to the upper and lower sides via the ejection path Ia.

又,在第一飛散限制板51係形成有朝向與射出面22之法線正交的方向擴展的第一阻斷面51f,在第 二飛散限制板52,係形成有與第一阻斷面51f平行地擴展的第二阻斷面52f,藉此與第一阻斷面51f及第二阻斷面52f相互地交叉的情況相較,不用偏於其中任一方之限制而可以有效地限制射出面22與光學膜F10X之間的第一飛沫4a往光學膜F10X側之移動和第二飛沫4b往射出面22側之移動。 A first blocking surface 51f is formed on the first scattering-restricting plate 51 to extend in a direction orthogonal to the normal to the emission surface 22, and a second blocking surface is formed on the second scattering-limiting plate 52. The second blocking surface 52f, which extends in parallel with 51f, can effectively restrict the ejection without biasing the restriction of either of them compared with the case where the first blocking surface 51f and the second blocking surface 52f cross each other. The first droplet 4a between the surface 22 and the optical film F10X moves toward the optical film F10X side, and the second droplet 4b moves toward the exit surface 22 side.

又,藉由將狹縫間隔s1設為比射出孔21之直徑d2更大,就可以迴避油墨4i觸及第一飛散限制板51及第二飛散限制板52。 In addition, by setting the slit interval s1 to be larger than the diameter d2 of the injection hole 21, it is possible to avoid the ink 4i from touching the first scattering restriction plate 51 and the second scattering restriction plate 52.

再者,在上述實施形態中,雖然已列舉將第一飛散限制板51及第二飛散限制板52隔著射出通路Ia而配置於兩側之例加以說明,但是不限於此。例如,飛散限制板亦可在鉛直方向上僅配置於比油墨4i所射出的射出通路Ia更下方。藉此,與將第一飛散限制板51及第二飛散限制板52隔著射出通路Ia而配置於兩側的情況相較,還能藉由削減零件數來形成簡單的構成並謀求成本減低,並且可以選擇性地阻斷因重力之影響而飛散至比射出通路Ia更下方的第一飛沫4a及第二飛沫4b。特別是,當點直徑較大時(液滴量較多時),因在將光學膜F10X朝向上下方向搬運的情況下,飛散至下方的飛沫就會變多,故而僅將飛散限制板配置於比射出通路Ia更下方的實際利益會變大。 Moreover, in the said embodiment, although the example where the 1st scattering-restriction plate 51 and the 2nd scattering-restriction plate 52 were arrange | positioned on both sides through the emission path Ia was demonstrated, it is not limited to this. For example, the scattering restricting plate may be arranged only vertically below the emission path Ia from which the ink 4i is emitted. As a result, compared with a case where the first scattering restriction plate 51 and the second scattering restriction plate 52 are arranged on both sides with the emission path Ia interposed therebetween, a simple structure can be formed by reducing the number of parts and cost reduction can be achieved. In addition, the first droplets 4a and the second droplets 4b which are scattered below the ejection path Ia due to the influence of gravity can be selectively blocked. In particular, when the spot diameter is large (when there are many droplets), when the optical film F10X is transported in the up-down direction, the number of droplets scattered below will increase. Therefore, only the scattering-limiting plate is disposed on the The actual benefit below the injection path Ia becomes larger.

再者,更具備設置於射出面22且能夠阻斷油墨4i從射出孔21射出時所飛散的飛沫4a的遮蔽板30, 且在遮蔽板30於與射出孔21相對向的位置形成開口並且具有內壁面31a的開口部31,該內壁面31a係遮擋朝向與射出面22之法線交叉的方向飛散的飛沫4a,藉此與不設置遮蔽板30而是從液滴射出裝置20直接射出油墨4i的情況相較,因可以減小朝向與射出面22之法線交叉的方向飛散的飛沫4a之擴散範圍,具體而言減小將飛沫4a已附著於光學膜F10X時的標誌12作為中心的飛散直徑L2(參照第9圖),故而即便在油墨4i從射出孔21射出時飛沫4a飛散,仍可以抑制飛沫4a附著於光學膜F10X之缺陷部位以外的區域,且可以提高製品的良率。 Furthermore, a shielding plate 30 provided on the emitting surface 22 and capable of blocking the droplets 4a scattered when the ink 4i is emitted from the emitting hole 21 is provided. The shielding plate 30 has an opening at a position facing the emitting hole 21 and has The opening portion 31 of the inner wall surface 31a shields the droplets 4a scattered in a direction intersecting with the normal line of the ejection surface 22, thereby directly ejecting the ink 4i from the droplet ejection device 20 without providing the shielding plate 30 Compared with the case, the diffusion range of the droplets 4a scattered toward the direction intersecting with the normal of the emission surface 22 can be reduced, and specifically, the scattering of the mark 12 as the center when the droplets 4a have been attached to the optical film F10X can be reduced. The diameter L2 (see FIG. 9), so that even if the droplets 4a are scattered when the ink 4i is ejected from the injection hole 21, it is possible to suppress the droplets 4a from adhering to areas other than the defect portion of the optical film F10X, and it is possible to improve the yield of the product.

又,因具備在與射出面22之法線平行的方向具有厚度t1的遮蔽板30,藉此就可以藉由調整遮蔽板30之厚度t1來調整飛沫4a之擴散範圍,故而可以抑制飛沫4a附著於光學膜F10X之缺陷部位以外的區域。例如,藉由在遮蔽板30不接觸到光學膜F10X的範圍內,盡可能地加大遮蔽板30之厚度t1,就可以最大限度地減小飛沫4a之擴散範圍。 In addition, since the shielding plate 30 having a thickness t1 in a direction parallel to the normal to the emission surface 22 is provided, the diffusion range of the droplets 4a can be adjusted by adjusting the thickness t1 of the shielding plate 30, so that the adhesion of the droplets 4a can be suppressed In the area other than the defect portion of the optical film F10X. For example, by increasing the thickness t1 of the shielding plate 30 as much as possible within a range where the shielding plate 30 does not contact the optical film F10X, the diffusion range of the droplets 4a can be minimized.

又,更具備能夠將遮蔽板30固定於液滴射出裝置20的固定構件40,藉此與不設置固定構件40的情況相較,更容易將遮蔽板30牢固地固定於液滴射出裝置20。 In addition, a fixing member 40 capable of fixing the shielding plate 30 to the droplet ejection device 20 is further provided, thereby making it easier to firmly fix the shielding plate 30 to the droplet ejection device 20 compared to a case where the fixing member 40 is not provided.

又,固定構件40係具備第一壁部41以及第二壁部42,該第一壁部41係覆蓋位在與射出頭20A及遮蔽板30之雙方中的射出面22之法線正交的方向的側端 部23、33,該第二壁部42係覆蓋遮蔽板30之第一主面32中的開口部31之外周的外緣部34,藉此就可以將遮蔽板30牢固地固定於射出頭20A,且可以用簡單的構成來限制射出頭20A及遮蔽板30之前後左右上下方向(xyz方向)的相對移動。 In addition, the fixing member 40 includes a first wall portion 41 and a second wall portion 42. The first wall portion 41 covers a normal line of the emission surface 22 that is orthogonal to both the emission head 20A and the shielding plate 30. Side end portions 23 and 33 in the direction, and the second wall portion 42 covers the outer edge portion 34 on the outer periphery of the opening portion 31 in the first main surface 32 of the shielding plate 30, so that the shielding plate 30 can be firmly fixed. In the injection head 20A, the relative movement of the injection head 20A and the shielding plate 30 in the left-right up-down direction (xyz direction) can be restricted with a simple structure.

又,因液滴射出裝置20係具備能夠射出油墨4i的複數個射出頭20A,且遮蔽板30依每複數個射出頭20A而設置有複數個,固定構件40能夠將遮蔽板30依每複數個射出頭20A而固定地設置有複數個,藉此可以與各個射出頭20A以一對一的關係進行遮蔽板30及固定構件40之定位,故而與設置有大小與複數個射出頭20A對應的遮蔽板及固定構件的情況相較,更可以抑制射出頭20A、遮蔽板30及固定構件40之相對位置偏移。 The droplet ejection device 20 is provided with a plurality of ejection heads 20A capable of ejecting the ink 4i, and the shielding plate 30 is provided with a plurality of ejection heads 20A. The fixing member 40 is capable of inserting the shielding plate 30 in plurality. A plurality of injection heads 20A are fixedly provided, so that the shielding plate 30 and the fixing member 40 can be positioned in a one-to-one relationship with each injection head 20A. Therefore, the shielding corresponding to the installation of a size corresponding to the plurality of injection heads 20A is provided. Compared with the case of the plate and the fixed member, the relative positional deviation of the injection head 20A, the shielding plate 30, and the fixed member 40 can be suppressed.

再者,藉由遮蔽板30抵接於射出面22,則與遮蔽30從射出面22分離的情況相較,更容易限制射出頭20A及遮蔽板30之前後方向(x方向)的相對移動。 In addition, when the shielding plate 30 abuts on the emission surface 22, it is easier to restrict the relative movement of the injection head 20A and the shielding plate 30 in the front-rear direction (x direction) than when the shielding 30 is separated from the emission surface 22.

再者,藉由將開口部31之直徑d1設為比射出孔21之直徑d2更大,就可以迴避從射出孔21所射出的油墨4i觸及開口部31。 Furthermore, by setting the diameter d1 of the opening 31 to be larger than the diameter d2 of the injection hole 21, it is possible to avoid the ink 4i emitted from the injection hole 21 from touching the opening 31.

本實施形態的缺陷檢查系統10係具備:搬運線路9,係搬運長條帶狀的光學膜F10X;缺陷檢查裝置2,係進行在搬運線路9上所搬運的光學膜F10X之缺陷檢查;以及標記裝置4,係基於缺陷檢查之結果而對缺陷11之位置射出油墨4i,藉此能夠印字標誌12。 The defect inspection system 10 according to this embodiment includes: a conveying line 9 for conveying a long strip-shaped optical film F10X; a defect inspection device 2 for performing a defect inspection of the optical film F10X conveyed on the conveying line 9; and a mark The device 4 is capable of printing a mark 12 by ejecting ink 4i on the position of the defect 11 based on the result of the defect inspection.

依據本實施形態,藉由具備上面所述的標記裝置4,則即便第一飛沫4a在油墨4i從射出孔21射出時飛散,或第二飛沫4b在油墨4i滴落於光學膜F10X時飛散,仍可以抑制第一飛沫4a及第二飛沫4b附著於光學膜F10X之缺陷部位以外的區域,且可以提高製品的良率。又,由於具備基於缺陷檢查之結果而對缺陷11之位置射出油墨4i並藉此能夠印字標誌12之標記裝置4,而可以對準缺陷之位置而印字標誌12,故而可以有效地抑制飛沫4a、4b附著於光學膜F10X之缺陷部位以外的區域,且可以更進一步提高製品的良率。 According to this embodiment, even if the first droplet 4a is scattered when the ink 4i is ejected from the injection hole 21 by having the above-mentioned marking device 4, the second droplet 4b is scattered when the ink 4i is dropped on the optical film F10X. The first droplets 4a and the second droplets 4b can still be inhibited from being attached to areas other than the defect portion of the optical film F10X, and the yield of the product can be improved. In addition, the marking device 4 is capable of printing the mark 12 on the position of the defect 11 by ejecting the ink 4i at the position of the defect 11 based on the result of the defect inspection, so that the mark 12 can be printed by aligning the position of the defect. 4b is adhered to a region other than the defect portion of the optical film F10X, and the yield of the product can be further improved.

又,標記裝置4係從與鉛直方向正交的水平方向對朝向搬運線路9上與鉛直方向平行之方向搬運的光學膜F10X射出油墨4i,藉此與標記裝置4在鉛直方向朝下方對朝向水平方向搬運的光學膜F10X射出油墨4i的情況相較,還可以抑制油墨4i因重力之影響從射出孔21自然地往下滴。 In addition, the marking device 4 ejects the ink 4i from the optical film F10X conveyed on the conveying line 9 in a direction parallel to the vertical direction from a horizontal direction orthogonal to the vertical direction, thereby facing the marking device 4 downward in the vertical direction and horizontally. Compared with the case where the optical film F10X conveyed in the direction ejects the ink 4i, the ink 4i can also be prevented from dripping naturally from the ejection hole 21 due to the influence of gravity.

本實施形態的膜製造裝置1係具備上述的缺陷檢查系統10。 The film manufacturing apparatus 1 according to this embodiment includes the above-mentioned defect inspection system 10.

依據本實施形態,藉由具備上面所述的缺陷檢查系統10,則即便第一飛沫4a在油墨4i從射出孔21射出時飛散,或第二飛沫4b在油墨4i滴落於光學膜F10X時飛散,仍可以抑制第一飛沫4a及第二飛沫4b附著於光學膜F10X之缺陷部位以外的區域,且可以提高製品的良率。又,藉由對準缺陷之位置而印字標誌12,就可以有效 地抑制飛沫4a、4b附著於光學膜F10X之缺陷部位以外的區域,且可以更進一步提高製品的良率。 According to the present embodiment, by including the defect inspection system 10 described above, even if the first droplet 4a is scattered when the ink 4i is ejected from the injection hole 21, or the second droplet 4b is scattered when the ink 4i is dropped on the optical film F10X. It is still possible to suppress the first droplet 4a and the second droplet 4b from adhering to a region other than the defect portion of the optical film F10X, and the yield of the product can be improved. In addition, by printing the mark 12 by aligning the position of the defect, it is possible to effectively prevent the droplets 4a and 4b from adhering to the area other than the defect portion of the optical film F10X, and further improve the yield of the product.

本實施形態的膜製造方法,係包含使用上述的缺陷檢查系統10來標記的步驟。 The film manufacturing method according to this embodiment includes a step of marking using the defect inspection system 10 described above.

依據本實施形態,藉由包含上述的標記步驟,則即便第一飛沫4a在油墨4i從射出孔21射出時飛散,或第二飛沫4b在油墨4i滴落於光學膜F10X時飛散,仍可以抑制第一飛沫4a及第二飛沫4b附著於光學膜F10X之缺陷部位以外的區域,且可以提高製品的良率。又,藉由對準缺陷之位置而印字標誌12,就可以有效地抑制飛沫4a、4b附著於光學膜F10X之缺陷部位以外的區域,且可以更進一步提高製品的良率。 According to this embodiment, by including the above-mentioned marking step, even if the first droplet 4a scatters when the ink 4i is ejected from the injection hole 21, or the second droplet 4b scatters when the ink 4i drops on the optical film F10X, it can be suppressed. The first droplet 4a and the second droplet 4b are adhered to a region other than the defect portion of the optical film F10X, and the yield of the product can be improved. In addition, by printing the mark 12 by aligning the position of the defect, it is possible to effectively suppress the droplets 4a and 4b from adhering to areas other than the defect portion of the optical film F10X, and further improve the yield of the product.

可是,就飛沫在油墨從射出孔射出時飛散的因素而言,係可考慮(A1)液滴量、(A2)油墨黏度等。 However, the factors that cause the droplets to scatter when the ink is ejected from the ejection hole include (A1) the amount of droplets, (A2) the viscosity of the ink, and the like.

以下,針對上述因素加以說明。 The above factors will be described below.

只要液滴量微小,可認為油墨從射出孔射出時飛沫幾乎不會飛散,或是即便飛沫已飛散但是會汙染光學膜的程度之影響仍很少。另一方面藉由本發明人的檢討已知:當液滴量較多時,油墨從射出孔射出時飛沫就會飛散,且已飛散的飛沫會汙染光學膜。 As long as the amount of droplets is small, it is considered that droplets hardly scatter when the ink is ejected from the ejection holes, or that the degree of contamination of the optical film is small even if the droplets are scattered. On the other hand, from the review by the present inventors, it is known that when the amount of liquid droplets is large, droplets will be scattered when the ink is ejected from the ejection hole, and the scattered droplets will contaminate the optical film.

例如,在市售的噴墨印表機(inkjet printer)中,因液滴量為1×10-6μL左右且微小,故而可認為油墨從射出孔射出時飛沫幾乎不會飛散,或是即便飛沫已飛散但是會汙染光學膜的程度之影響仍很少。另一方面,在本實 施形態的液滴射出裝置20中,液滴量為0.166μL左右,當與市售的噴墨印表機相較時,因液滴量相當多,故而有時油墨從射出孔射出時飛沫會飛散,且飛散出的飛沫會汙染光學膜。 For example, in a commercially available inkjet printer, since the amount of droplets is about 1 × 10 -6 μL and is very small, it can be considered that droplets are hardly scattered when the ink is ejected from the ejection hole, or even The droplets have scattered but the effect of the degree of contamination of the optical film is still small. On the other hand, in the liquid droplet ejection device 20 of this embodiment, the amount of liquid droplets is about 0.166 μL. When compared with a commercially available inkjet printer, the amount of liquid droplets is quite large, and therefore the ink may be discharged from When the injection hole is ejected, the droplets will be scattered, and the scattered droplets will contaminate the optical film.

又,若油墨黏度較大,則可認為油墨從射出孔射出時飛沫幾乎不會飛散。另一方面,藉由本發明人的檢討可明白,當油墨黏度較小時,油墨從射出孔射出時飛沫就會飛散,且已飛散的飛沫會汙染光學膜。 In addition, if the viscosity of the ink is large, it is considered that droplets are hardly scattered when the ink is ejected from the ejection hole. On the other hand, from the review by the present inventors, it can be understood that when the viscosity of the ink is small, droplets will be scattered when the ink is ejected from the injection hole, and the scattered droplets will contaminate the optical film.

例如,在市售的噴墨印表機中,油墨黏度為1.17×10-3Pa˙s左右。另一方面,在本實施形態的液滴射出裝置20中,因油墨黏度為0.89×10-3Pa˙s左右,與市售的噴墨印表機相較為較小,故而有時飛沫在油墨從射出孔射出時會飛散,且飛散出的飛沫會汙染光學膜。 For example, in a commercially available inkjet printer, the ink viscosity is about 1.17 × 10 -3 Pa˙s. On the other hand, in the liquid droplet ejection device 20 of this embodiment, the ink viscosity is about 0.89 × 10 -3 Pa˙s, which is relatively small compared with a commercially available inkjet printer, and therefore, droplets may be in the ink. It will fly away when ejected from the injection hole, and the scattered droplets will contaminate the optical film.

即便是在因上述因素(A1)、(A2)等而使飛沫在油墨從射出孔射出時飛散的情況下,依據本實施形態,則在遮蔽板30於與射出孔21相對向的位置形成開口並且具有內壁面31a的開口部31,該內壁面31a係遮擋朝向與射出面22之法線交叉的方向飛散的飛沫4a,藉此與不設置遮蔽板30而是從液滴射出裝置20直接射出油墨4i的情況相較,因可以減小朝向與射出面22之法線交叉的方向飛散的飛沫4a之擴散範圍,具體而言是減小將飛沫4a附著於光學膜F10X時的標誌12作為中心的飛散直徑L2(參照第9圖),故而可以有效地抑制飛沫4a附著於光學膜F10X之缺陷部位以外的區域,且可以更進一步提高製品的良 率。 Even when the droplets are scattered when the ink is ejected from the injection hole due to the above factors (A1), (A2), etc., according to this embodiment, an opening is formed in the shielding plate 30 at a position facing the injection hole 21 In addition, it has an opening portion 31 of an inner wall surface 31a that shields droplets 4a scattered in a direction intersecting the normal line of the emission surface 22, thereby directly ejecting from the droplet ejection device 20 without providing a shielding plate 30 Compared with the case of the ink 4i, the diffusion range of the droplets 4a scattered toward the direction intersecting with the normal of the emission surface 22 can be reduced. Specifically, the mark 12 when the droplets 4a are attached to the optical film F10X is used as a center. The scattering diameter L2 (see FIG. 9) can effectively prevent the droplets 4 a from adhering to areas other than the defect portion of the optical film F10X, and can further improve the yield of the product.

另一方面,就飛沫在油墨滴落於光學膜(印字對象)時飛散的因素而言,係可考慮(B1)點直徑(液滴量)、(B2)油墨黏度、(B3)印字對象、(B4)線路速度等。 On the other hand, in terms of the scattering of the droplets when the ink drops on the optical film (printing object), (B1) dot diameter (droplet amount), (B2) ink viscosity, (B3) printing object, (B4) Line speed and so on.

以下,針對上述因素加以說明。 The above factors will be described below.

只要點直徑極微小(只要液滴量微小),則可考慮油墨滴落於印字對象時飛沫幾乎不會飛散,或是即便飛沫已飛散但是會汙染印字對象的程度之影響仍很少。另一方面藉由本發明人的檢討可明白:當點直徑較大(液滴量較多)時,飛沫就會在油墨滴落於印字對象時飛散,且飛散出的飛沫會汙染印字對象。 As long as the dot diameter is extremely small (as long as the amount of droplets is small), it may be considered that the droplets hardly scatter when the ink drops on the printing object, or even if the droplets are scattered, the degree of contamination to the printing object is still small. On the other hand, from the review by the inventors, it can be understood that when the dot diameter is large (the liquid droplet volume is larger), the droplets will be scattered when the ink drops on the printing object, and the scattered droplets will contaminate the printing object.

例如,在市售的噴墨印表機中,點直徑係極小至20μm左右,且液滴量可推定為1×10-6μL左右,可認為油墨滴落於印字對象時飛沫幾乎不會飛散,或是即便飛沫已飛散但是會汙染印字對象的程度之影響仍很少。另一方面,在本實施形態的液滴射出裝置20中,點直徑為1mm以上且10mm以下之範圍的值,可推定液滴量為0.166μL左右,當與市售的噴墨印表機相較時,因點直徑相當大(因液滴量相當多),故而有時飛沫會在油墨滴落於印字對象時飛散,且飛散出的飛沫會汙染印字對象。 For example, in a commercially available inkjet printer, the dot diameter is extremely small to about 20 μm, and the amount of droplets can be estimated to be about 1 × 10 -6 μL. It can be considered that when the ink drops on the printing object, droplets will hardly scatter Or, even if the droplets have scattered, the effect of contaminating the printed object is still small. On the other hand, in the droplet ejection device 20 of this embodiment, the value of the spot diameter is in the range of 1 mm to 10 mm, and the estimated droplet volume is about 0.166 μL, which is equivalent to that of a commercially available inkjet printer. In some cases, because the dot diameter is quite large (because the amount of droplets is quite large), sometimes droplets will be scattered when the ink drops on the printed object, and the scattered droplets will contaminate the printed object.

又,若油墨黏度較大,則可認為油墨滴落於印字對象時飛沫幾乎不會飛散。另一方面,藉由本發明人的檢討可明白,當油墨黏度較小時,飛沫就會在油墨滴落於印字對象時飛散,且飛散出的飛沫會汙染印字對象。 In addition, if the viscosity of the ink is large, it is considered that the droplets hardly scatter when the ink drops on the printing target. On the other hand, from the review by the present inventors, it can be understood that when the viscosity of the ink is small, the droplets will be scattered when the ink drops on the printing object, and the scattered droplets will contaminate the printing object.

例如,在市售的噴墨印表機中,油墨黏度為1.17×10-3Pa˙s左右。另一方面,在本實施形態的液滴射出裝置20中,因油墨黏度為0.89×10-3Pa˙s左右,與市售的噴墨印表機相較還小,故而有時飛沫會在油墨滴落於印字對象時飛散,且已飛散的飛沫會汙染印字對象。 For example, in a commercially available inkjet printer, the ink viscosity is about 1.17 × 10 -3 Pa˙s. On the other hand, in the liquid droplet ejection device 20 of this embodiment, the ink viscosity is about 0.89 × 10 -3 Pa˙s, which is smaller than that of a commercially available inkjet printer, so droplets may sometimes When the ink drops on the printed object, it will scatter, and the scattered droplets will contaminate the printed object.

又,若印字對象為記錄紙等的紙媒體,則可考慮油墨滴落於印字對象時飛沫幾乎不會飛散。另一方面,藉由本發明人的檢討可明白,當印字對象為包含PVA及TAC的光學膜時,飛沫就會在油墨滴落於印字對象時飛散,且已飛散的飛沫會汙染印字對象。 In addition, if the printing target is a paper medium such as recording paper, it can be considered that droplets hardly scatter when ink drips on the printing target. On the other hand, it can be understood from the review by the inventors that when the printing object is an optical film including PVA and TAC, droplets will be scattered when the ink drops on the printing object, and the scattered droplets will contaminate the printing object.

例如,在市售的噴墨印表機中,印字對象為紙媒體。另一方面,在本實施形態的液滴射出裝置20中,印字對象為光學膜,有時飛沫會在油墨滴落於印字對象時飛散,且飛散出的飛沫會汙染印字對象。 For example, in a commercially available inkjet printer, the printing target is a paper medium. On the other hand, in the liquid droplet ejection device 20 of this embodiment, the printing target is an optical film, and droplets may be scattered when the ink drops on the printing target, and the flying droplets may contaminate the printing target.

又,若線路速度較小,則可認為油墨滴落於印字對象時飛沫幾乎不會飛散。另一方面,藉由本發明人的檢討可明白,當線路速度較大時,飛沫就會在油墨滴落於印字對象時寬範圍地飛散,且飛散出的飛沫會汙染印字對象。 When the line speed is low, it is considered that droplets are hardly scattered when ink is dropped on a printing object. On the other hand, from the review by the inventors, it can be understood that when the line speed is large, the droplets will spread widely when the ink drops on the printing object, and the flying droplets will contaminate the printing object.

例如,在市售的噴墨印表機中,線路速度係小至3m/min左右。另一方面,在本實施形態中,線路速度為30m/min以下的值,且就能夠將標誌12印字於光學膜F10X的範圍而言其上限係50m/min以下的值而為較大者,而有飛沫會在油墨滴落於印字對象時寬範圍地飛散, 且飛散出的飛沫會汙染印字對象。 For example, in a commercially available inkjet printer, the line speed is as small as about 3 m / min. On the other hand, in this embodiment, the line speed is a value of 30 m / min or less, and the upper limit of the range in which the mark 12 can be printed on the optical film F10X is a value of 50 m / min or less, Some droplets will spread widely when the ink drops on the printed object, and the scattered droplets will pollute the printed object.

即便是在藉由上述因素(A1)、(A2)等而使飛沫在油墨從射出孔射出時飛散的情況下,或是在藉由上述因素(B1)至(B4)等而使飛沫在油墨滴落於印字對象時飛散的情況下,依據本實施形態,則在射出面22與光學膜F10X之間,設置能夠阻斷油墨4i從射出孔21射出時所飛散的第一飛沫4a和油墨4i滴落於光學膜F10X時所飛散的第二飛沫4b之至少一方的飛散限制構件50,且在飛散限制構件50形成朝向與射出面22之法線正交的方向擴展的阻斷面50f,藉此與不設置飛散限制構件50而是從液滴射出裝置20直接射出油墨的情況相較,因可以限制第一飛沫4a在射出面22與光學膜F10X之間朝向光學膜F10X側移動,並且可以限制第二飛沫4b朝向射出面22側移動,故可有效地抑制第一飛沫4a及第二飛沫4b附著於光學膜F10X之缺陷部位以外的區域,且可以更進一步提高製品的良率。 Even when the droplets are scattered when the ink is ejected from the injection hole by the above factors (A1), (A2), etc., or when the droplets are caused by the above factors (B1) to (B4), etc. In the case of scattering when dripping on a printing object, according to this embodiment, a first droplet 4a and an ink 4i that block the ink 4i from being scattered when the ink 4i is emitted from the injection hole 21 are provided between the emission surface 22 and the optical film F10X. The scattering restricting member 50 of at least one of the second droplets 4b scattered when dropped on the optical film F10X, and the scattering restricting member 50 forms a blocking surface 50f that expands in a direction orthogonal to the normal of the emission surface 22. This is compared with the case where the ink is directly ejected from the droplet ejection device 20 without providing the scattering restricting member 50, because the first droplet 4a can be restricted from moving toward the optical film F10X side between the emission surface 22 and the optical film F10X, and can The second droplet 4b is restricted from moving toward the emitting surface 22 side, so the first droplet 4a and the second droplet 4b can be effectively prevented from adhering to the area other than the defect portion of the optical film F10X, and the yield of the product can be further improved.

以下,針對實施形態之變化例加以說明。在以下之變化例中,有關與第一實施形態共通的構成要素,係附記相同的符號,且省略其詳細的說明。 Hereinafter, a modification example of the embodiment will be described. In the following modifications, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed descriptions thereof are omitted.

(固定構件之第一變化例) (First Modification of Fixed Member)

第10圖係顯示固定構件之第一變化例的示意圖,且為相當於第8圖的剖視圖。 FIG. 10 is a schematic view showing a first modified example of the fixing member, and is a cross-sectional view corresponding to FIG. 8.

在上述實施形態中,係列舉固定構件40是由與遮蔽板30不同的構件所形成。相對於此,在本變化例中,如第10 圖所示,固定構件140係藉由與遮蔽板130相同的構件形成為一體。 In the above-mentioned embodiment, the series of lifting fixing members 40 are formed of different members from the shielding plate 30. On the other hand, in this modification, as shown in FIG. 10, the fixing member 140 is formed integrally with the same member as the shielding plate 130.

固定構件140係與遮蔽板130一起固定於射出頭120A。固定構件140係具備遮蔽板130及側壁部141。例如,固定構件140係藉由SUS等的金屬板所形成。 The fixing member 140 is fixed to the injection head 120A together with the shielding plate 130. The fixing member 140 includes a shielding plate 130 and a side wall portion 141. For example, the fixing member 140 is formed of a metal plate such as SUS.

側壁部141係覆蓋位在與射出頭20A中的射出面22之法線正交的方向的側端部23。側壁部141係形成為朝向前後方向(x方向)延伸的矩形筒狀。側壁部141係抵接於射出頭20A之上下方向(z方向)及寬度方向(y方向)的側端部23中之射出面22側的部分。 The side wall portion 141 covers a side end portion 23 located in a direction orthogonal to the normal of the emission surface 22 in the emission head 20A. The side wall portion 141 is formed in a rectangular cylindrical shape extending in the front-rear direction (x direction). The side wall portion 141 is a portion that abuts on the emission surface 22 side of the side end portions 23 in the up-down direction (z direction) and the width direction (y direction) of the injection head 20A.

遮蔽板130係形成為從側壁部141之前端(+x方向端)朝向z方向內側延伸的矩形框狀。在遮蔽板130係於與射出孔21相對向的位置形成有開口並且具有內壁面131a的開口部131,該內壁面131a係遮擋朝向與射出面22之法線交叉的方向飛散的飛沫4a。遮蔽板130係抵接於射出面22。換言之,遮蔽板130之第二主面135係與射出面22配置於同一平面。 The shielding plate 130 is formed in a rectangular frame shape extending from the front end (the end in the + x direction) of the side wall portion 141 toward the inside in the z direction. An opening portion 131 is formed in the shielding plate 130 at a position facing the injection hole 21 and has an inner wall surface 131 a for blocking the droplets 4 a scattered in a direction crossing the normal line of the emission surface 22. The shielding plate 130 is in contact with the emission surface 22. In other words, the second main surface 135 of the shielding plate 130 is disposed on the same plane as the emission surface 22.

例如,側壁部141係藉由螺栓等緊固構件來鎖緊連結於射出頭20A。藉此,能限制射出頭20A及遮蔽板130之上下方向(z方向)、寬度方向(y方向)及前後方向(x方向)的相對移動。 For example, the side wall portion 141 is fastened to the injection head 20A by a fastening member such as a bolt. This can restrict the relative movement of the ejection head 20A and the shielding plate 130 in the up-down direction (z direction), the width direction (y direction), and the front-back direction (x direction).

依據本變化例,則藉由固定構件140係與遮蔽板130形成為一體,且具備用以覆蓋位在與射出頭20A中的射出面22之法線正交的方向的側端部23的側壁 部141,就可以將遮蔽板130牢固地固定於射出頭20A,且可以用簡單的構成來限制射出頭20A及遮蔽板130之前後左右上下方向(xyz)方向的相對移動。又,與固定構件40係由與遮蔽板30不同的構件所形成的情況相較,還可以削減零件數,且可以謀求裝置構成的簡化。 According to this modification, the fixing member 140 is integrally formed with the shielding plate 130 and has a side wall 23 for covering the side end portion 23 located in a direction orthogonal to the normal line of the emission surface 22 in the injection head 20A. The portion 141 can firmly fix the shielding plate 130 to the injection head 20A, and can restrict the relative movement of the injection head 20A and the shielding plate 130 from front to back and up and down (xyz) direction with a simple structure. Moreover, compared with the case where the fixing member 40 is formed of a member different from the shielding plate 30, the number of parts can be reduced, and the device configuration can be simplified.

(固定構件之第二變化例) (Second Modification of Fixed Member)

第11圖係顯示固定構件之第二變化例的示意圖,且為相當於第8圖的剖視圖。 FIG. 11 is a schematic view showing a second modification of the fixing member, and is a cross-sectional view corresponding to FIG. 8.

在上述第一變化例中,係列舉遮蔽板130抵接於射出面22之例。相對於此,在本變化例中,如第11圖所示,遮蔽板130係從射出面22分離。具體而言,遮蔽板130之第二主面135,係配置於比射出面22更前方(+x方向)。 In the above-mentioned first modification, a series of examples in which the shielding plate 130 is in contact with the emission surface 22 has been described. In contrast, in this modification, as shown in FIG. 11, the shielding plate 130 is separated from the emission surface 22. Specifically, the second main surface 135 of the shielding plate 130 is disposed more forward (+ x direction) than the emission surface 22.

依據本變化例,因將遮蔽板130從射出面22分離,藉此就可以藉由調整遮蔽板130與射出面22之間隔來調整飛沫4a之擴散範圍,故而可以抑制飛沫4a附著於光學膜F10X之缺陷部位以外的區域。例如,藉由在遮蔽板130不接觸到光學膜F10X的範圍內,盡可能地加大遮蔽板130與射出面22之間隔,就可以最大限度地減小飛沫4a之擴散範圍。又,與將遮蔽板130抵接於射出面22的情況相較,因即便不調整遮蔽板130之厚度t1,仍可以僅調整遮蔽板130與射出面22之間隔來調整飛沫4a之擴散範圍,故而能提高設計之自由度。 According to this modification, since the shielding plate 130 is separated from the emission surface 22, the diffusion range of the droplets 4a can be adjusted by adjusting the interval between the shielding plate 130 and the emission surface 22, so that the adhesion of the droplets 4a to the optical film F10X can be suppressed. Area outside the defect. For example, by increasing the distance between the shielding plate 130 and the emitting surface 22 as much as possible within a range where the shielding plate 130 does not contact the optical film F10X, the diffusion range of the droplets 4a can be minimized. In addition, compared with the case where the shielding plate 130 is in contact with the emission surface 22, because the thickness t1 of the shielding plate 130 is not adjusted, the distance between the shielding plate 130 and the emission surface 22 can be adjusted to adjust the diffusion range of the droplets 4a. Therefore, the freedom of design can be improved.

(遮蔽構件之變化例) (Modification of shielding member)

第12圖係顯示遮蔽構件之變化例的示意圖,且為相當 於第8圖的剖視圖。 Fig. 12 is a schematic view showing a modified example of the shielding member, and is a sectional view corresponding to Fig. 8.

在上述實施形態中,係已列舉具備在與射出面22之法線平行的方向具有厚度的遮蔽板30,作為遮蔽構件之例。相對於此,在本變化例中,如第12圖所示,具備朝向與射出面22之法線平行的方向延伸的筒構件230,作為遮蔽構件。 In the embodiment described above, the shielding plate 30 having a thickness in a direction parallel to the normal line of the emission surface 22 has been cited as an example of the shielding member. In contrast, in this modification, as shown in FIG. 12, a cylindrical member 230 extending in a direction parallel to the normal line of the emission surface 22 is provided as a shielding member.

在筒構件230係形成有於與射出孔21相對向之位置形成開口的開口部231。如第12圖所示,開口部231係具有與射出油墨之射出通路Ia(參照第9圖)面對的內壁面231a。開口部231之內壁面231a,係遮擋油墨從射出孔21射出時朝向與射出面22之法線交叉的方向飛散的飛沫4a(參照第9圖)。 The cylindrical member 230 is formed with an opening portion 231 that is opened at a position facing the injection hole 21. As shown in FIG. 12, the opening portion 231 has an inner wall surface 231 a facing the ejection path Ia (see FIG. 9) from which the ink is ejected. The inner wall surface 231a of the opening portion 231 blocks the droplets 4a (see FIG. 9) that are scattered when the ink is ejected from the ejection hole 21 in a direction that intersects the normal line of the ejection surface 22.

開口部231之內壁面231a係形成為將射出通路Ia作為中心軸的圓筒狀。開口部231之直徑(筒構件230之內徑)係比射出孔21之直徑更大。 The inner wall surface 231a of the opening portion 231 is formed in a cylindrical shape with the emission path Ia as a central axis. The diameter of the opening portion 231 (the inner diameter of the cylindrical member 230) is larger than the diameter of the injection hole 21.

筒構件230係抵接於射出面22。換言之,筒構件230之端面235(第二主面),係與射出面22配置於同一平面。 The tube member 230 is in contact with the emission surface 22. In other words, the end surface 235 (the second principal surface) of the cylindrical member 230 is disposed on the same plane as the emission surface 22.

依據本變化例,因具備朝向與射出面22之法線平行的方向延伸的筒構件230,藉此就可以藉由調整筒構件230之長度(x方向之長度)來調整飛沫4a之擴散範圍,故而可以抑制飛沫4a附著於光學膜F10X之缺陷部位以外的區域。例如,藉由在筒構件230不接觸到光學膜F10X的範圍內,盡可能地加大筒構件230之長度,就可以最大限度地減小飛沫4a之擴散範圍。 According to this modification, since the cylindrical member 230 is provided to extend in a direction parallel to the normal to the emission surface 22, the diffusion range of the droplets 4a can be adjusted by adjusting the length of the cylindrical member 230 (the length in the x direction). Therefore, it is possible to suppress the droplets 4a from adhering to areas other than the defect portion of the optical film F10X. For example, by increasing the length of the cylindrical member 230 as much as possible within a range where the cylindrical member 230 does not contact the optical film F10X, the diffusion range of the droplets 4a can be minimized.

又,藉由將開口部231之直徑設為比射出孔21之直徑更大,就可以迴避從射出孔21所射出的油墨4i觸及開口部231。 In addition, by setting the diameter of the opening portion 231 to be larger than the diameter of the injection hole 21, it is possible to avoid the ink 4i emitted from the injection hole 21 from touching the opening portion 231.

〔第二實施形態〕 [Second Embodiment]

以下,針對本發明之第二實施形態的標記裝置之構成加以說明。第15圖係顯示第二實施形態的標記裝置204之立體圖。第16圖係包含第15圖的主要部分放大圖,且為用以說明第二實施形態的吸引裝置60之作用的示意圖。再者,在第15圖中,為了方便起見,僅顯示第二吸引機構62(下側吸引機構),在第16圖中係顯示第一吸引機構61及第二吸引機構62。又,在第15圖中,為了方便起見,係以二點鏈線來顯示光學膜F10X。又,在第15圖及第16圖中係省略飛散限制構件50之圖示。在本實施形態中,有關與第一實施形態共通的構成要素係附記相同的符號,且省略其詳細的說明。 Hereinafter, the configuration of a marking device according to a second embodiment of the present invention will be described. Fig. 15 is a perspective view showing a marking device 204 according to the second embodiment. FIG. 16 is an enlarged view including the main part of FIG. 15 and is a schematic diagram for explaining the operation of the suction device 60 according to the second embodiment. In FIG. 15, for convenience, only the second suction mechanism 62 (lower suction mechanism) is shown, and in FIG. 16, the first suction mechanism 61 and the second suction mechanism 62 are shown. In FIG. 15, for convenience, the two-dot chain line is used to display the optical film F10X. In FIGS. 15 and 16, illustration of the scattering restriction member 50 is omitted. In this embodiment, the same reference numerals are attached to the constituent elements that are common to the first embodiment, and detailed descriptions thereof are omitted.

在第一實施形態中,如第13圖所示,已列舉標記裝置4具備液滴射出裝置20、遮蔽板30、固定構件40及飛散限制構件50之例。相對於此,在本實施形態中,如第15圖所示,標記裝置204係更具備吸引裝置60。 In the first embodiment, as shown in FIG. 13, an example in which the marking device 4 includes a droplet ejection device 20, a shielding plate 30, a fixing member 40, and a scattering restricting member 50 has been cited. In contrast, in the present embodiment, as shown in FIG. 15, the marking device 204 is further provided with a suction device 60.

如第16圖所示,吸引裝置60係設置於射出面22與光學膜F10X之間。吸引裝置60係吸引油墨4i從射出孔21射出時所飛散的第一飛沫4a,和油墨4i滴落於光學膜F10X時所飛散的第二飛沫4b之至少一方。 As shown in FIG. 16, the suction device 60 is provided between the emission surface 22 and the optical film F10X. The suction device 60 sucks at least one of the first droplet 4a scattered when the ink 4i is ejected from the injection hole 21 and the second droplet 4b scattered when the ink 4i drops on the optical film F10X.

如第15圖所示,在本實施形態中,吸引裝 置60係具備第二吸引機構62。第二吸引機構62係在鉛直方向僅配置於比射出油墨4i的射出通路Ia更下方。在第二吸引機構62係形成有以面向射出通路Ia的方式朝前上方傾斜的吸引面62f。 As shown in Fig. 15, in this embodiment, the suction device 60 includes a second suction mechanism 62. The second suction mechanism 62 is arranged only below the ejection path Ia from which the ink 4i is ejected in the vertical direction. The second suction mechanism 62 is formed with a suction surface 62f which is inclined forward and upward so as to face the emission path Ia.

在第二吸引機構62之吸引面62f係形成有用以吸引第一飛沫4a及第二飛沫4b的吸引孔62h。吸引孔62h係在吸引面62f以沿著吸引面62f之寬度方向(y方向)的方式具有長邊而延伸。在第15圖中,雖然是圖示以沿著吸引面62f之寬度方向(y方向)的方式延伸的吸引孔62h作為一例,但是吸引孔62h之配置係不限於此,而是能夠依需要而適當地設定,如以複數個吸引孔沿著吸引面62f之寬度方向(y方向)排列並配置一排的方式,並在吸引面62f之寬度方向(y方向)分割吸引孔62h等。 The suction surface 62f of the second suction mechanism 62 is formed with a suction hole 62h for attracting the first droplet 4a and the second droplet 4b. The suction hole 62h extends in the suction surface 62f so that it may have a long side along the width direction (y direction) of the suction surface 62f. In FIG. 15, although the suction holes 62 h extending along the width direction (y direction) of the suction surface 62 f are shown as an example, the arrangement of the suction holes 62 h is not limited to this, but can be changed as needed. It is appropriately set, for example, a plurality of suction holes are arranged and arranged in a row along the width direction (y direction) of the suction surface 62f, and the suction holes 62h are divided in the width direction (y direction) of the suction surface 62f.

例如,吸引面62f與光學膜F10X之間的距離J1(以下稱為「吸引面與光學膜間距離」)係設為10mm以上的值。此理由是因當將吸引面與光學膜間距離J1設為過小時,就有吸引面62f與光學膜F10X會接觸的可能性所致。在本實施形態中,吸引面與光學膜間距離J1係設為10mm左右。再者,吸引面與光學膜間距離J1係設為將吸引面62f之下端和光學膜F10X之印字面以印字面之法線方向(x方向)予以連結所成的線段之長度。 For example, the distance J1 between the attraction surface 62f and the optical film F10X (hereinafter referred to as the "distance between the attraction surface and the optical film") is set to a value of 10 mm or more. This reason is because when the distance J1 between the attraction surface and the optical film is set too small, there is a possibility that the attraction surface 62f and the optical film F10X may contact each other. In this embodiment, the distance J1 between the suction surface and the optical film is set to about 10 mm. The distance J1 between the suction surface and the optical film is set to the length of a line segment formed by connecting the lower end of the suction surface 62f and the printing surface of the optical film F10X in the normal direction (x direction) of the printing surface.

例如,吸引面62f與固定構件40之間的距離J2(以下稱為「吸引面與固定構件間距離」),係設為30mm以上的值。此理由是因當將吸引面與固定構件間距離J2 設為過小時,就有吸引面62f與固定構件40會接觸的可能性所致。在本實施形態中,吸引面與固定構件間距離J2係設為30mm左右。再者,吸引面與固定構件間距離J2,係設為將吸引面62f之上端和固定構件40之下端在固定構件40之下面之法線方向(z方向)予以連結所成的線段之長度。 For example, the distance J2 between the suction surface 62f and the fixed member 40 (hereinafter referred to as the "distance between the suction surface and the fixed member") is set to a value of 30 mm or more. This reason is because when the distance J2 between the suction surface and the fixed member is set too small, there is a possibility that the suction surface 62f and the fixed member 40 may come into contact with each other. In this embodiment, the distance J2 between the suction surface and the fixed member is set to about 30 mm. The distance J2 between the suction surface and the fixed member is the length of a line segment formed by connecting the upper end of the suction surface 62f and the lower end of the fixed member 40 to the normal direction (z direction) below the fixed member 40.

例如,吸引孔62h與射出孔21之間的距離J3(以下稱為「吸引孔與射出孔間距離」),較佳是設為50mm以下的值,更佳是設為15mm以上且50mm以下之範圍的值。在本實施形態中,吸引孔與射出孔間距離J3係設為45mm左右。再者,吸引孔與射出孔間距離J3係設為將吸引面62f中的吸引孔62h之中心和射出面22中的射出孔21之中心予以連結所成的線段之長度。 For example, the distance J3 between the suction hole 62h and the injection hole 21 (hereinafter referred to as the "distance between the suction hole and the injection hole") is preferably set to a value of 50 mm or less, and more preferably set to 15 mm or more and 50 mm or less. The range of values. In this embodiment, the distance J3 between the suction hole and the injection hole is set to about 45 mm. The distance J3 between the suction hole and the injection hole is set to the length of a line segment formed by connecting the center of the suction hole 62h on the suction surface 62f and the center of the injection hole 21 on the injection surface 22.

例如,吸引孔62h之長度係設為與吸引面62f之寬度(y方向)的長度同程度,具體而言是設為比吸引面62f之寬度方向(y方向)的長度更小相當於第二吸引機構62之左右側壁的厚度量的長度。再者,吸引孔62h之長度係設為吸引孔62h之長邊方向(y方向)的長度。 For example, the length of the suction hole 62h is set to be approximately the same as the length of the width (y direction) of the suction surface 62f. Specifically, the length of the suction hole 62h is set to be smaller than the length of the suction surface 62f in the width direction (y direction). The length of the left and right side walls of the suction mechanism 62. The length of the suction hole 62h is set to the length in the longitudinal direction (y direction) of the suction hole 62h.

例如,吸引孔62h之寬度較佳是設為50mm以下的值,更佳是設為5mm以上且20mm以下之範圍的值。在本實施形態中,吸引孔62h之寬度係設為10mm左右。再者,吸引孔62h之寬度,係設為吸引孔62h之短邊方向(吸引面62f之傾斜方向)的長度。 For example, the width of the suction hole 62h is preferably a value of 50 mm or less, and more preferably a value of a range of 5 mm or more and 20 mm or less. In this embodiment, the width of the suction hole 62h is set to about 10 mm. The width of the suction hole 62h is set to the length of the short side direction of the suction hole 62h (the inclined direction of the suction surface 62f).

例如,藉由吸引孔62h來吸引飛沫時的風 速(以下稱為「吸引風速」),較佳是設為2m/sec以上的值,更佳是設為5m/sec以上且7m/sec以下之範圍的值。在本實施形態中,吸引風速係設為6.4m/sec。再者,吸引風速,係設為4m/sec以上且20m/sec以下之範圍的值,來作為不拉走油墨4i(非為飛沫而是主滴)的範圍。 For example, the wind speed (hereinafter referred to as "suction wind speed") when the droplets are attracted by the suction hole 62h is preferably set to a value of 2 m / sec or more, and more preferably 5 m / sec or more and 7 m / sec or less. The range of values. In this embodiment, the suction wind speed is set to 6.4 m / sec. The suction wind speed is a value in a range of 4 m / sec or more and 20 m / sec or less as a range in which the ink 4i (not a droplet but a main drop) is not pulled away.

吸引孔62h的大小係設為能夠變更。例如,在吸引面62f,設置能夠以沿著吸引孔62h之長邊方向的方式來移動的擋門(shutter)等的閉塞機構,藉此亦能夠變更吸引孔62h的大小。 The size of the suction hole 62h is made changeable. For example, the suction surface 62f is provided with a closing mechanism such as a shutter that can move along the long side direction of the suction hole 62h, thereby also changing the size of the suction hole 62h.

第二吸引機構62,係以吸引面62f面對射出通路Ia的方式呈朝前上方傾斜而延伸的形狀。具體而言,第二吸引機構62係具備:吸引面62f,係形成為在寬度方向(y方向)具有長邊的長方形狀;以及左右側面64,係將吸引面62f之左右側緣作為上底而形成為朝向前上方延伸的梯形狀。在第二吸引機構62之後端部(-x方向側端部)係設置有與左右側面64之法線平行地朝向左右側方(y方向)突出的支撐軸65。 The second suction mechanism 62 has a shape extending obliquely upward and forward so that the suction surface 62f faces the emission path Ia. Specifically, the second suction mechanism 62 includes a suction surface 62f formed in a rectangular shape having a long side in the width direction (y direction), and left and right side surfaces 64 with the left and right side edges of the suction surface 62f as an upper bottom. Instead, it is formed in a ladder shape extending forward and upward. A support shaft 65 that protrudes toward the left and right sides (y direction) parallel to the normal of the left and right side surfaces 64 is provided at the rear end portion (the side end portion in the -x direction) of the second suction mechanism 62.

在第二吸引機構62之左右側方係設置有能夠將第二吸引機構62支撐成轉動自如的支撐機構73。在第二吸引機構62之下方係設置有朝向膜寬度方向(y方向)延伸的載台(stage)72。支撐機構73係具備:支撐台73a,係固定於載台72;支撐板73b,係固定於支撐台73a;以及豎起片73c,係從支撐板73b之寬度方向內側端部(+y方向側端部)朝向上方延伸。 Support mechanisms 73 are provided on the left and right sides of the second suction mechanism 62 so as to support the second suction mechanism 62 to be rotatable. A stage 72 is provided below the second suction mechanism 62 and extends in the film width direction (y direction). The supporting mechanism 73 is provided with a supporting table 73a fixed to the stage 72, a supporting plate 73b fixed to the supporting table 73a, and a rising piece 73c extending from the widthwise inner end of the supporting plate 73b (+ y direction side) End) extends upward.

在豎起片73c係形成有於豎起片73c之厚度方向(y方向)形成開口並且朝向上下延伸的長孔73h。在豎起片73c之長孔73h係插通有第二吸引機構62之支撐軸65。長孔73h的大小係設為能夠使支撐軸65上下移動且能夠繞著支撐軸65之軸線轉動的大小。在插通至長孔73h的狀態下,支撐軸65係從豎起片73c朝向左右側方突出。第二吸引機構62係藉由未圖示之固定具將支撐軸65固定於豎起片73c,藉此能限制上下移動以及繞著支撐軸65之軸線的轉動。例如,亦可在支撐軸65之左右側端部形成螺牙,且藉由將螺帽(nut)等螺接鎖入至支撐軸65之螺牙,來限制第二吸引機構62之位置。 The rising piece 73c is formed with a long hole 73h which is opened in the thickness direction (y direction) of the rising piece 73c and extends upward and downward. A support shaft 65 of the second suction mechanism 62 is inserted into the long hole 73h of the rising piece 73c. The size of the long hole 73h is set to be such that the support shaft 65 can move up and down and can rotate about the axis of the support shaft 65. In a state of being inserted into the long hole 73h, the support shaft 65 projects from the upright piece 73c to the left and right sides. The second suction mechanism 62 fixes the support shaft 65 to the erected piece 73c by a fixing device (not shown), thereby limiting the vertical movement and rotation around the axis of the support shaft 65. For example, screw teeth may be formed at the left and right end portions of the support shaft 65, and the position of the second suction mechanism 62 may be restricted by screwing a nut or the like into the screws of the support shaft 65.

再者,圖中符號71為用以支撐液滴射出裝置20的支撐台。支撐台71係朝向液滴射出裝置20之寬度方向(y方向)延伸。例如,液滴射出裝置20係藉由螺栓等的緊固構件來鎖緊連結於支撐台71。 In addition, reference numeral 71 in the figure is a support table for supporting the droplet ejection device 20. The support stand 71 extends in the width direction (y direction) of the droplet ejection device 20. For example, the droplet ejection device 20 is fastened and connected to the support base 71 by a fastening member such as a bolt.

依據本實施形態,在射出面22與光學膜F10X之間,設置能夠吸引油墨4i從射出孔21射出時所飛散的第一飛沫4a和油墨4i滴落於光學膜F10X時所飛散的第二飛沫4b之至少一方的吸引裝置60,藉此與不設置吸引裝置60而是從液滴射出裝置20直接射出油墨4i的情況相較,因可以吸引飛散於射出面22與光學膜F10X之間的第一飛沫4a及第二飛沫4b,故而即便第一飛沫4a在油墨4i從射出孔21射出時飛散,或第二飛沫4b在油墨4i滴落於光學膜F10X時飛散,仍可以抑制第一飛沫4a及第二飛 沫4b附著於光學膜F10X之缺陷部位以外的區域,且可以提高製品的良率。 According to this embodiment, between the emission surface 22 and the optical film F10X, a first droplet 4a capable of attracting the ink 4i scattered when ejected from the injection hole 21 and a second droplet scattered when the ink 4i drops onto the optical film F10X are provided. As compared with the case where the ink 4i is directly ejected from the liquid droplet ejection device 20 without the suction device 60, the suction device 60 of at least one of 4b can attract the first scattering scattering between the ejection surface 22 and the optical film F10X. One droplet 4a and the second droplet 4b, so even if the first droplet 4a scatters when the ink 4i is ejected from the injection hole 21, or the second droplet 4b scatters when the ink 4i drops on the optical film F10X, the first droplet 4a can be suppressed And the second droplet 4b is attached to a region other than the defect portion of the optical film F10X, and the yield of the product can be improved.

再者,第二吸引機構62係在鉛直方向上僅配置於比射出油墨4i的射出通路Ia更下方,藉此與將吸引機構隔著射出通路Ia而配置於兩側的情況相較,還可以藉由削減零件數來形成簡單的構成並謀求成本減低,並且可以選擇性地吸引利用重力之影響飛散至比射出通路Ia更下方的第一飛沫4a及第二飛沫4b。特別是,當點直徑較大時(液滴量較多時),因在將光學膜F10X朝向上下方向搬運的情況下,飛散至下方的飛沫就會變多,故而設為僅第二吸引機構62的實際利益(僅將吸引機構配置於比射出通路Ia更下方的實際利益)會變大。 In addition, the second suction mechanism 62 is disposed only vertically below the ejection path Ia from which the ink 4i is ejected in the vertical direction, so that compared with the case where the suction mechanism is disposed on both sides across the ejection path Ia, it is also possible By reducing the number of parts, it is possible to form a simple structure and reduce costs, and to selectively attract the first droplets 4a and the second droplets 4b scattered under the ejection path Ia by the influence of gravity. In particular, when the spot diameter is large (when the amount of liquid droplets is large), when the optical film F10X is transported in the up-down direction, the number of droplets scattered below will increase, so it is set to only the second suction mechanism. The actual benefit of 62 (only the actual benefit of placing the attraction mechanism below the injection path Ia) becomes larger.

再者,在上述實施形態中,雖然已列舉僅將第二吸引機構62在鉛直方向上配置於比射出油墨4i的射出通路Ia還更下方之例來加以說明,但是不限於此。例如,如第16圖所示,吸引裝置60亦可具備隔著射出油墨4i的射出通路Ia而配置於一方側的第一吸引機構61以及隔著射出通路Ia而配置於另一方側的第二吸引機構62。亦即,亦可將吸引機構61、62隔著射出通路Ia而配置於兩側。藉此,可以用簡單的構成有效地吸引隔著射出通路Ia而飛散至兩側的第一飛沫4a及第二飛沫4b。 In the above-mentioned embodiment, an example has been described in which only the second suction mechanism 62 is arranged in the vertical direction below the ejection path Ia from which the ink 4i is ejected, but it is not limited to this. For example, as shown in FIG. 16, the suction device 60 may include a first suction mechanism 61 disposed on one side across the ejection path Ia from which the ink 4i is ejected, and a second suction mechanism 61 disposed on the other side via the ejection path Ia. Attraction mechanism 62. That is, the suction mechanisms 61 and 62 may be arrange | positioned on both sides via the injection path Ia. Thereby, the first droplet 4a and the second droplet 4b which are scattered to both sides via the ejection path Ia can be effectively attracted with a simple structure.

又,第一吸引機構61亦可在鉛直方向上配置於比射出通路Ia更上方,且第二吸引機構62(相當於上述實施形態的第二吸引機構62)亦可在鉛直方向上配置於 比射出通路Ia更下方。藉此,可以用簡單的構成有效地吸引隔著射出通路Ia而飛散至上下兩側的第一飛沫4a及第二飛沫4b。 In addition, the first suction mechanism 61 may be disposed above the injection path Ia in the vertical direction, and the second suction mechanism 62 (equivalent to the second suction mechanism 62 of the above embodiment) may be disposed in the vertical direction. The injection path Ia is further below. Thereby, the first droplet 4a and the second droplet 4b which are scattered to the upper and lower sides via the ejection path Ia can be effectively attracted with a simple structure.

第一吸引機構61係吸引飛散於射出通路Ia之上方的第一飛沫4a及第二飛沫4b,第二吸引機構係吸引飛散至射出通路Ia之下方的第一飛沫4a及第二飛沫4b。藉由第一吸引機構61所吸引到的飛沫,係經過配管而往箭頭之方向Q1移送,藉由第二吸引機構62所吸引到的飛沫,係經過配管而往箭頭之方向Q2移送,且分別貯存於未圖示之槽內。 The first suction mechanism 61 attracts the first droplets 4a and the second droplets 4b scattered above the ejection path Ia, and the second suction mechanism 61 attracts the first droplets 4a and the second droplet 4b scattered below the ejection path Ia. The droplets attracted by the first suction mechanism 61 are transferred in the direction of the arrow Q1 through the piping, and the droplets attracted by the second suction mechanism 62 are transferred in the direction of the arrow Q2 through the piping. Store in a slot (not shown).

[第三實施形態] [Third embodiment]

以下,針對本發明之第三實施形態的標記裝置之構成加以說明。第17圖係顯示第三實施形態的標記裝置304之示意圖,且為包含相當於第8圖之剖面的示意圖。在本實施形態中,有關與第一實施形態及第一實施形態之第二變化例共通的構成要素,係附記相同的符號,且省略其詳細的說明。 The configuration of a marking device according to a third embodiment of the present invention will be described below. FIG. 17 is a schematic diagram showing a marking device 304 according to the third embodiment, and is a schematic diagram including a cross section corresponding to FIG. 8. In this embodiment, the same components as those in the first embodiment and the second modification of the first embodiment are denoted by the same reference numerals, and detailed descriptions thereof are omitted.

如第13圖所示,在第一實施形態中係已列舉標記裝置4具備液滴射出裝置20、遮蔽板30、固定構件40及飛散限制構件50之例,如第11圖所示,在第一實施形態之第二變化例中係已列舉在固定構件140與遮蔽板130藉由相同之構件形成為一體的構成中,將遮蔽板130從射出面22分離之例。相對於此,如第17圖所示,在本實施形態中,標記裝置304係具備液滴射出裝置20、固定 構件340及吸引裝置360。 As shown in FIG. 13, in the first embodiment, an example has been described in which the marking device 4 includes a droplet ejection device 20, a shielding plate 30, a fixing member 40, and a scattering restricting member 50. As shown in FIG. In the second modification of the one embodiment, the example in which the shielding plate 130 is separated from the emission surface 22 in the configuration in which the fixing member 140 and the shielding plate 130 are integrated by the same member has been cited. On the other hand, as shown in Fig. 17, in the present embodiment, the marking device 304 includes a droplet ejection device 20, a fixing member 340, and a suction device 360.

固定構件340係與遮蔽板330藉由相同的構件來形成為一體。固定構件340係與遮蔽板330一起固定於射出頭20A。固定構件340係具備遮蔽板330及側壁部141。例如,固定構件340係藉由SUS等的金屬板所形成。 The fixing member 340 and the shielding plate 330 are integrally formed by the same member. The fixing member 340 is fixed to the injection head 20A together with the shielding plate 330. The fixing member 340 includes a shielding plate 330 and a side wall portion 141. For example, the fixing member 340 is formed of a metal plate such as SUS.

遮蔽板330係從射出面22分離。具體而言,遮蔽板330之第二主面335係配置於比射出面22更前方(+x方向)。藉由將遮蔽板330從射出面22分離,遮蔽板330亦可具有作為上面所述的飛散限制構件的功能。具體而言,藉由將遮蔽板330從射出面22分離,遮蔽板330之第二主面335(射出面22側的面)就能限制第一飛沫4a朝向光學膜F10X側移動,而遮蔽板330之第一主面332(光學膜F10X側的面)則能限制第二飛沫4b朝向射出面22側移動。 The shielding plate 330 is separated from the emission surface 22. Specifically, the second main surface 335 of the shielding plate 330 is disposed more forward (+ x direction) than the emission surface 22. By separating the shielding plate 330 from the emission surface 22, the shielding plate 330 can also function as a scattering limiting member described above. Specifically, by separating the shielding plate 330 from the emitting surface 22, the second main surface 335 (the surface on the emitting surface 22 side) of the shielding plate 330 can restrict the first droplet 4a from moving toward the optical film F10X side, and the shielding plate The first main surface 332 (the surface on the optical film F10X side) of 330 can restrict the second droplet 4b from moving toward the emission surface 22 side.

在遮蔽板330之開口部331中的射出面22側之緣部係形成有錐形部336,該錐形部336係具有以面向射出孔21的方式相對於射出面22之法線而傾斜的傾斜面336a。再者,遮蔽板330之開口部331中的射出面22側之緣部,係作為開口部331之內壁面331a、與遮蔽板330之第二主面335的境界部。 A tapered portion 336 is formed at an edge portion on the exit surface 22 side of the opening portion 331 of the shielding plate 330. The tapered portion 336 is inclined with respect to the normal line of the exit surface 22 so as to face the exit hole 21. The inclined surface 336a. The edge portion on the exit surface 22 side of the opening portion 331 of the shielding plate 330 serves as a boundary portion between the inner wall surface 331 a of the opening portion 331 and the second main surface 335 of the shielding plate 330.

在本實施形態中係設置有與光學膜F10X相接觸的導輥7。本實施形態的液滴射出裝置20係在搬運光學膜F10X的期間,隔著光學膜F10X而相對向地配置於導 輥7。液滴射出裝置20係從光學膜F10X與導輥7相接觸的位置之相反側射出油墨4i(參照第4圖)。 In this embodiment, a guide roller 7 is provided in contact with the optical film F10X. The liquid droplet ejection apparatus 20 of this embodiment is disposed on the guide roller 7 so as to face each other with the optical film F10X interposed therebetween while the optical film F10X is being conveyed. The droplet ejection device 20 ejects the ink 4i from the opposite side of the position where the optical film F10X is in contact with the guide roller 7 (see FIG. 4).

光學膜F10X較佳是在40°以上且130°以下之角度範圍(以下稱為「圍包角度θ」)內掛繞於導輥7之外周面。再者,圍包角度係設為以導輥7之中心角來表示光學膜F10X在圓周方向接觸於導輥7之外周面的部分之角度範圍的值。 The optical film F10X is preferably wound around the outer peripheral surface of the guide roller 7 in an angle range of 40 ° to 130 ° (hereinafter referred to as "wrapping angle θ"). The wrapping angle is a value that represents the angular range of the portion of the optical film F10X that is in contact with the outer peripheral surface of the guide roller 7 in the circumferential direction with the center angle of the guide roller 7.

此理由是因當圍包角度θ未滿40°時,光學膜F10X就容易在導輥7之外周面上滑動,而有在光學膜F10X上發生擦傷等的可能性,而當圍包角度θ超過130°時,例如氣泡就容易侵入至表面保護膜與偏光膜之間所致。 The reason is that when the wrapping angle θ is less than 40 °, the optical film F10X easily slides on the outer peripheral surface of the guide roller 7, and there is a possibility that scratches and the like occur on the optical film F10X. When it exceeds 130 °, for example, bubbles may easily enter between the surface protective film and the polarizing film.

又,在施加於光學膜F10X的張力較小的情況下,較佳是將圍包角度θ設為超過90°的值,更佳是設為95°以上。雖然施加於光學膜F10X的張力越小就越容易產生振顫,但是藉由將圍包角度θ設為超過95°以上,則即便是在施加於光學膜F10X的張力較小的情況下,仍可以抑制發生於光學膜F10X的振顫。另一方面,在施加於光學膜F10X的張力較大的情況下,較佳是將圍包角度θ設為未滿90°,更佳是設為85°以下。藉此,即便是在施加於光學膜F10X的張力較大的情況下,仍可以抑制光學膜F10X過度密接於導輥7之外周面。 When the tension applied to the optical film F10X is small, the envelope angle θ is preferably a value exceeding 90 °, and more preferably 95 ° or more. Although the smaller the tension applied to the optical film F10X, the more likely it is that chattering occurs, but by setting the wrapping angle θ to more than 95 °, even when the tension applied to the optical film F10X is small, It is possible to suppress chattering occurring in the optical film F10X. On the other hand, when the tension applied to the optical film F10X is large, the envelope angle θ is preferably set to less than 90 °, and more preferably set to 85 ° or less. Thereby, even when the tension applied to the optical film F10X is large, it is possible to suppress the optical film F10X from coming into close contact with the outer peripheral surface of the guide roller 7.

再者,光學膜F10X之搬運速度普通為9m/min以上且50m/min以下之範圍的值。又,施加於光學 膜F10X的張力係在乾燥爐內設為400N以上且1500N以下之範圍的值,而在乾燥爐外設為200N以上且500N以下之範圍的值。再者,光學膜F10X之寬度係設為500mm以上且1500mm以下之範圍的值,光學膜F10X之厚度係設為10μm以上且300μm以下之範圍的值。光學膜F10X之寬度越大,或者光學膜F10X之厚度越薄,就越容易發生振顫。 In addition, the conveyance speed of the optical film F10X is generally a value in a range of 9 m / min to 50 m / min. The tension applied to the optical film F10X is a value in the range of 400N to 1500N in the drying furnace, and a value in the range of 200N to 500N in the drying furnace. The width of the optical film F10X is set to a value in a range of 500 mm to 1500 mm, and the thickness of the optical film F10X is set to a value in a range of 10 μm to 300 μm. The larger the width of the optical film F10X, or the thinner the thickness of the optical film F10X, the more prone to chattering.

例如,導輥7之外徑較佳是設為100mm以上且150mm以下之範圍的值。此理由是因當加大導輥7之外徑時,雖然由於光學膜F10X相對於圍包角度θ接觸於導輥7之外周面的面積會變大,而可以抑制發生於光學膜F10X的振顫,但是當過度加大導輥7之外徑時,就容易在光學膜F10X上發生上面所述的擦傷及氣泡之侵入等所致。 For example, the outer diameter of the guide roller 7 is preferably a value in a range of 100 mm to 150 mm. This reason is that when the outer diameter of the guide roller 7 is increased, although the area where the optical film F10X contacts the outer peripheral surface of the guide roller 7 with respect to the enclosing angle θ becomes larger, vibrations occurring in the optical film F10X can be suppressed. However, when the outer diameter of the guide roller 7 is excessively increased, the above-mentioned scratches and the invasion of air bubbles easily occur on the optical film F10X.

例如,導輥7之正圓度較佳是設為1.0mm以下的值,更佳是設為0.5mm以下的值。此理由是因導輥7之正圓度越小,就越可以抑制接觸於導輥7的光學膜F10X之震動所致。 For example, the roundness of the guide roller 7 is preferably a value of 1.0 mm or less, and more preferably a value of 0.5 mm or less. This reason is because the smaller the roundness of the guide roller 7 is, the more it is possible to suppress the vibration caused by the optical film F10X coming into contact with the guide roller 7.

例如,導輥7之外周面上的表面粗糙度(最大粗糙度Ry)較佳是設為100s以下的值,更佳是設為25s以下的值。此理由是因當導輥7之外周面的表面粗糙度(最大粗糙度Ry)過大時,就容易在光學膜F10X上發生上面所述的擦傷及氣泡之侵入等所致。 For example, the surface roughness (maximum roughness Ry) of the outer peripheral surface of the guide roller 7 is preferably a value of 100 s or less, and more preferably a value of 25 s or less. This reason is because when the surface roughness (maximum roughness Ry) of the outer peripheral surface of the guide roller 7 is too large, the above-mentioned scratches and the invasion of air bubbles easily occur on the optical film F10X.

又,從更有效地抑制發生於光學膜F10X的 振顫的觀點來看,亦可在導輥7之上游側及下游側,追加設置與光學膜F10X相接觸的導輥。又,亦可使光學膜F10X相對於所追加的導輥具有圍包角度。 Furthermore, from the viewpoint of more effectively suppressing chattering occurring in the optical film F10X, a guide roller in contact with the optical film F10X may be additionally provided on the upstream side and the downstream side of the guide roller 7. In addition, the optical film F10X may have a wrapping angle with respect to the added guide roller.

導輥7係能夠朝向與光學膜F10X之搬運方向V1交叉的方向V2進退。例如,亦可將壓力缸(cylinder)機構等安裝於導輥7,藉此使導輥7能夠朝向前下方及後上方等的斜方向移動。藉此,從通紙性、連接部分、頭部清潔性等的觀點來看可以謀求作業性提高。 The guide roller 7 is capable of advancing and retreating in a direction V2 that intersects the conveying direction V1 of the optical film F10X. For example, a cylinder mechanism or the like may be attached to the guide roller 7 so that the guide roller 7 can be moved in an oblique direction such as front downward, rear upward, and the like. Thereby, workability | operativity can be improved from a viewpoint of paper feedability, a connection part, a head cleanliness, etc.

具體而言,從通紙性的觀點來看,係意指在從光學膜F10X並未搬運至搬運線路9的狀態(並未通過的狀態)搬運光學膜F10X時(通過時),藉由加寬標記裝置304與導輥7之距離,來提高作業性。 Specifically, from the viewpoint of paper-passing property, it means that when the optical film F10X is conveyed (at the time of passing) from a state where the optical film F10X is not conveyed to the conveying line 9 (passed state), it is added by The distance between the wide marking device 304 and the guide roller 7 improves workability.

其次,從接縫的觀點來說明。在交換原料捲R1、R2時,當用膠帶等來連接光學膜F10X時就會發生連接部分。在光學膜F10X中的連接之部分的厚度係成為與普通之部位的厚度(無連接之部分的厚度)相較還大。其意指即便是在如此的情況下,仍能夠使導輥7移動,藉此可以迴避接縫之部分與標記裝置304之接觸,且可以使光學膜F10X搬運至搬運線路9,而能提高作業性。 Next, it demonstrates from a seam point of view. When the raw material rolls R1 and R2 are exchanged, a connecting portion occurs when the optical film F10X is connected with an adhesive tape or the like. The thickness of the connected portion in the optical film F10X is larger than the thickness of the ordinary portion (thickness of the unconnected portion). This means that even in such a case, the guide roller 7 can still be moved, thereby avoiding the contact between the seam portion and the marking device 304, and the optical film F10X can be transported to the conveying line 9 to improve work Sex.

再者,所謂頭部清潔係意指頭部之清掃,且因藉由能夠使導輥7移動,就可以加寬作業空間,故而可以提高作業性。 In addition, the term "head cleaning" means cleaning of the head, and since the guide roller 7 can be moved, the working space can be widened, so that workability can be improved.

再者,亦可使液滴射出裝置200朝向與光學膜F10X之搬運方向V1交叉的方向(例如前後方向)進 退。 Further, the droplet ejection device 200 may be advanced or retracted in a direction (for example, a front-rear direction) that intersects with the transport direction V1 of the optical film F10X.

第17圖中的符號Va係顯示包含射出油墨4i的射出通路Ia(參照第9圖)之固定構件340與導輥7相對向的部分(以下稱為「相對向部分」)。 The symbol Va in FIG. 17 shows a portion (hereinafter, referred to as a “opposing portion”) where the fixing member 340 including the ejection path Ia (see FIG. 9) that ejects the ink 4i faces the guide roller 7.

吸引裝置360係具備:第一吸引機構361,係隔著相對向部分Va而配置於一方側;以及第二吸引機構362,係隔著相對向部分Va而配置於另一方側。亦即,吸引機構361、362係隔著相對向部分Va而配置於兩側。具體而言,第一吸引機構361係在鉛直方向配置於比相對向部分Va更上方,第二吸引機構362係在鉛直方向配置於比相對向部分Va更下方。 The suction device 360 is provided with a first suction mechanism 361 arranged on one side with the opposing portion Va interposed therebetween, and a second suction mechanism 362 arranged on the other side with the opposing portion Va interposed therebetween. That is, the suction mechanisms 361 and 362 are arranged on both sides with the opposing portion Va therebetween. Specifically, the first suction mechanism 361 is disposed above the opposing portion Va in the vertical direction, and the second suction mechanism 362 is disposed below the opposing portion Va in the vertical direction.

在第一吸引機構361係形成有以面向相對向部分Va的方式往前下方傾斜的吸引面361f。在第二吸引機構362係形成有以面向相對向部分Va的方式往後下方傾斜的吸引面362f。在各吸引面361f、362f係形成有用以吸引第一飛沫4a及第二飛沫4b的吸引孔(未圖示)。各吸引機構361、362係配置成各吸引面361f、362f進入遮蔽板330之第一主面332以及與導輥7相接觸的光學膜F10X之間的間隙。 The first suction mechanism 361 is formed with a suction surface 361f which is inclined forward and downward so as to face the facing portion Va. The second suction mechanism 362 is formed with a suction surface 362f which is inclined downward and rearward so as to face the facing portion Va. The suction surfaces 361f and 362f are formed with suction holes (not shown) for attracting the first droplets 4a and the second droplets 4b. The suction mechanisms 361 and 362 are arranged so that the suction surfaces 361f and 362f enter the gap between the first main surface 332 of the shielding plate 330 and the optical film F10X in contact with the guide roller 7.

依據本實施形態,因藉由在遮蔽板330之開口部331中的射出面22側之緣部形成具有以面向射出孔21的方式相對於射出面22之法線而傾斜的傾斜面336a的錐形部336,而可用傾斜面336a來承接第一飛沫4a,故而可以迴避第一飛沫4a分裂。假定遮蔽板330之開口部331 中的射出面22側之緣部未形成錐形部時,因在開口部331之內壁面331a與遮蔽板330之第二主面335的境界部形成有剖面觀察下為90°左右的角部,故而有油墨4i從射出孔21射出時所飛散的第一飛沫4a在角部分裂的可能性。 According to this embodiment, the taper having the inclined surface 336 a inclined with respect to the normal of the emission surface 22 so as to face the emission hole 21 is formed at the edge portion on the emission surface 22 side of the opening 331 of the shielding plate 330. The shaped portion 336 can receive the first droplet 4a by the inclined surface 336a, so that the first droplet 4a can be avoided from being split. When it is assumed that the tapered portion is not formed at the edge portion on the exit surface 22 side of the opening portion 331 of the shielding plate 330, the boundary portion between the inner wall surface 331a of the opening portion 331 and the second main surface 335 of the shielding plate 330 has a cross-sectional observation. The lower part is a corner of about 90 °, so there is a possibility that the first droplet 4a scattered when the ink 4i is ejected from the ejection hole 21 may crack at the corner.

又,藉由吸引裝置360具備隔著相對向部分Va而配置於一方側的第一吸引機構361以及隔著相對向部分Va而配置於另一方側的第二吸引機構362,就可以用簡單的構成來有效地吸引隔著相對向部分Va而飛散至兩側的第一飛沫4a及第二飛沫4b。 In addition, since the suction device 360 includes the first suction mechanism 361 disposed on one side via the opposing portion Va, and the second suction mechanism 362 disposed on the other side via the opposing portion Va, a simple method can be used. It is comprised so that the 1st droplet 4a and the 2nd droplet 4b which are scattered to both sides via the opposing part Va are attracted effectively.

又,藉由第一吸引機構361在鉛直方向上配置於比相對向部分Va更上方,第二吸引機構362在鉛直方向上配置於比相對向部分Va更下方,就可以用簡單的構成來有效地吸引隔著相對向部分Va而飛散至上下兩側的第一飛沫4a及第二飛沫4b。 Further, the first suction mechanism 361 is arranged above the opposing portion Va in the vertical direction, and the second suction mechanism 362 is arranged below the opposing portion Va in the vertical direction, so that it can be effective with a simple structure. The ground attracts the first droplets 4a and the second droplets 4b which are scattered to the upper and lower sides via the opposing portion Va.

又,因藉由將各吸引機構361、362配置成各吸引面361f、362f進入遮蔽板330之第一主面332以及與導輥7相接觸的光學膜F10X之間的間隙,就可以使吸引孔接近射出路徑Ia,故而可以有效地吸引飛散於射出面22與光學膜F10X之間的第一飛沫4a及第二飛沫4b。再者,藉由使吸引孔接近油墨4i之滴落位置,就可以更有效地吸引第二飛沫4b。 In addition, the suction mechanisms 361 and 362 are arranged so that the suction surfaces 361f and 362f enter the gap between the first main surface 332 of the shielding plate 330 and the optical film F10X in contact with the guide roller 7, so that the suction can be performed. Since the hole is close to the emission path Ia, the first droplet 4a and the second droplet 4b scattered between the emission surface 22 and the optical film F10X can be effectively attracted. Furthermore, by bringing the suction hole close to the dripping position of the ink 4i, the second droplet 4b can be more effectively sucked.

又,因藉由在搬運光學膜F10X的期間,隔著光學膜F10X而相對向於與光學膜F10X相接觸的導輥7來配置液滴射出裝置20,而可在抑制了發生於光學膜F10X 上的振顫之狀態下配置液滴射出裝置20及固定構件340,故而可以藉由在遮蔽板330不與光學膜F10X相接觸的範圍內,盡可能地減小固定構件340之遮蔽板330與射出面22的間隔,來最大限度地減小飛沫4a之擴散範圍。 In addition, since the droplet ejection device 20 is disposed opposite to the guide roller 7 that is in contact with the optical film F10X via the optical film F10X while the optical film F10X is being transported, the occurrence of the occurrence of the optical film F10X can be suppressed The droplet ejection device 20 and the fixing member 340 are arranged in the state of the above-mentioned tremor, so that the shielding plate 330 and the shielding member 330 of the fixing member 340 can be reduced as much as possible within a range where the shielding plate 330 does not contact the optical film F10X. The interval between the emission surfaces 22 is to minimize the diffusion range of the droplets 4a.

又,藉由在吸引機構361、362不吸入光學膜F10X的範圍內,盡可能地減小吸引機構361、362之吸引面與相對向部分Va的間隔,就可以最大限度地吸收飛沫4a、4b。 In addition, by minimizing the distance between the suction surface of the suction mechanism 361 and 362 and the opposite portion Va within the range where the suction mechanism 361 and 362 do not suck into the optical film F10X, the droplets 4a and 4b can be absorbed to the maximum extent. .

再者,即便是在不具備固定構件340(遮蔽板330)的情況下,仍可以藉由在射出面22不與光學膜F10X相接觸的範圍內,盡可能地減小射出頭20A之射出孔21與光學膜F10X的間隔,來最大限度地減小飛沫4a之擴散範圍。 Furthermore, even if the fixing member 340 (shielding plate 330) is not provided, the injection hole of the injection head 20A can be made as small as possible within a range where the emission surface 22 does not contact the optical film F10X. The distance between 21 and the optical film F10X is to minimize the diffusion range of the droplet 4a.

本實施形態的缺陷檢查系統310係更具備與光學膜F10X相接觸的導輥7,標記裝置304係配置成隔著光學膜F10X而相對向於導輥7,並從光學膜F10X與導輥7相接觸的位置之相反側射出油墨4i。 The defect inspection system 310 of this embodiment further includes a guide roller 7 that is in contact with the optical film F10X, and the marking device 304 is disposed to face the guide roller 7 through the optical film F10X, and the optical film F10X and the guide roller 7 The ink 4i is ejected on the opposite side of the contact position.

依據本實施形態,因可以藉由更具備上述的導輥7,而在抑制了發生於光學膜F10X的振顫之狀態下配置液滴射出裝置20及固定構件340,故而藉由在遮蔽板330不與光學膜F10X相接觸的範圍內,盡可能地減小固定構件340之遮蔽板330與射出面22的間隔,就可以最大限度地減小飛沫4a之擴散範圍。 According to this embodiment, the liquid droplet ejection device 20 and the fixing member 340 can be disposed in a state where the chattering that has occurred in the optical film F10X can be suppressed by further including the above-mentioned guide roller 7. Therefore, the shielding plate 330 can be used. Within a range not in contact with the optical film F10X, the distance between the shielding plate 330 and the emitting surface 22 of the fixing member 340 is reduced as much as possible, so that the diffusion range of the droplets 4a can be minimized.

再者,在本實施形態中雖然已列舉將遮蔽板330形成為平板狀,亦即將遮蔽板330之第一主面332作為與yz平面平行的面之例,但是不限於此。例如,亦可 將遮蔽板中之與導輥7相對向的部分以朝向導輥7之相反側下凹的方式在剖面觀察下形成為圓弧狀之面,亦即將遮蔽板之第一主面以沿著導輥7之外周面的方式形成為圓弧狀的面。藉此,與將遮蔽板330形成為平板狀的情況相較,因可以更進一步減小遮蔽板與光學膜F10X之間隔,故而可以更有效地減小飛沫4a之擴散範圍。 In addition, although the shielding plate 330 is formed into a flat plate shape in this embodiment, that is, the first main surface 332 of the shielding plate 330 is exemplified as a surface parallel to the yz plane, but it is not limited thereto. For example, the portion of the masking plate facing the guide roller 7 may be recessed toward the opposite side of the guide roller 7 to form an arc-shaped surface when viewed in cross section, that is, the first main surface of the masking plate. An arc-shaped surface is formed so as to follow the outer peripheral surface of the guide roller 7. Thereby, compared with the case where the shielding plate 330 is formed in a flat plate shape, since the distance between the shielding plate and the optical film F10X can be further reduced, the diffusion range of the droplets 4a can be reduced more effectively.

再者,本發明係不一定被限定於上述實施形態,而是能夠在未脫離本發明之趣旨的範圍內施加各種的變更。 In addition, the present invention is not necessarily limited to the above-mentioned embodiment, and various changes can be made without departing from the scope of the present invention.

在上述實施形態中,雖然已列舉標記裝置從與鉛直方向正交的方向對在搬運線路9上朝與鉛直方向平行的方向搬運的光學膜F10X射出油墨4i之例加以說明,但是不限於此。例如,標記裝置亦可從下方對朝向水平方向搬運的光學膜F10X射出油墨4i。即便是在此情況下,與標記裝置從上方對朝向水平方向搬運的光學膜F10X射出油墨4i的情況相較,仍可以抑制油墨4i受重力之影響從射出孔21自然地往下滴。 In the embodiment described above, an example has been described in which the marking device ejects the ink 4i from the optical film F10X conveyed on the conveying line 9 in a direction parallel to the vertical direction from a direction orthogonal to the vertical direction, but it is not limited to this. For example, the marking device may eject the ink 4i toward the optical film F10X conveyed in the horizontal direction from below. Even in this case, compared with the case where the marking device ejects the ink 4i toward the optical film F10X conveyed in the horizontal direction from above, it is possible to suppress the ink 4i from dripping naturally from the ejection hole 21 due to the influence of gravity.

又,在上述實施形態中,雖然已列舉標記裝置隔著射出油墨4i的射出通路Ia而在兩側配置有飛散限制板或吸引機構之例來加以說明,但是不限於此。例如,在藉由依光學膜F10XZ之搬運而產生的風之方向或油墨4i之射出通路Ia的方向,使油墨4i之飛沫隔著射出通路Ia而集中於一方側的情況下,亦可僅在該一方側配置飛散限制板或吸引機構。 Moreover, in the said embodiment, although the example which demonstrated the example which arrange | positions a scattering restriction plate or a suction mechanism on both sides through the ejection path Ia which ejects the ink 4i was demonstrated, it is not limited to this. For example, when the direction of the wind generated by the conveyance of the optical film F10XZ or the direction of the ejection path Ia of the ink 4i is concentrated, the droplets of the ink 4i are concentrated on one side across the ejection path Ia. A scattering limit plate or a suction mechanism is arranged on one side.

又,在上述實施形態中,雖然已列舉在如第7圖等所示的液滴射出裝置中,具有複數個射出孔的射出頭,是以在光學膜F10X之寬度方向覆蓋印字範圍的方式配置複數個的構成之例加以說明,但是不限於此。例如,具備具有1個至3個射出孔21的單獨之射出頭的液滴射出裝置,亦可依來自控制裝置之缺陷位置資訊而朝向光學膜F10X之寬度方向及搬運方向移動,藉此對光學膜F10X上之缺陷位置射出油墨4i並印字。再者,飛散限制板或吸引機構亦可與液滴射出裝置一起往缺陷位置移動,且防止油墨4i之飛沫汙染光學膜F10X。 In the above-mentioned embodiment, although the ejection head having a plurality of ejection holes is listed in the droplet ejection device shown in FIG. 7 and the like, it is arranged so as to cover the printing range in the width direction of the optical film F10X. A plurality of examples of the configuration will be described, but it is not limited thereto. For example, a liquid droplet ejection device provided with a single ejection head having one to three ejection holes 21 can also be moved toward the width direction and the conveyance direction of the optical film F10X according to the defect position information from the control device, so that the optical Ink 4i is ejected from the defect position on the film F10X and printed. Furthermore, the scattering limiting plate or the suction mechanism can also be moved to the defect position together with the droplet ejection device, and the droplets of the ink 4i are prevented from contaminating the optical film F10X.

又,雖然已列舉上述缺陷檢查系統10係設置於膜製造裝置1之一部分的構成作為一例來加以說明,但是不限於此。上述缺陷檢查系統10亦可與膜製造裝置1個別獨立地設置。例如,膜製造裝置1亦可不具備上述缺陷檢查系統10,而是在將膜製造裝置1中所製造的光學膜F10X,用捲繞部8來捲繞於芯材作為光學膜F10X之原料捲R2之後,往下一個步驟饋送,且在下一個步驟中的設備之一部分設置有上述缺陷檢查系統10。 In addition, although the structure in which the said defect inspection system 10 was installed in one part of the film manufacturing apparatus 1 was mentioned as an example, it is not limited to this. The defect inspection system 10 may be provided separately from the film production apparatus 1. For example, the film manufacturing apparatus 1 may not include the defect inspection system 10 described above, and the optical film F10X manufactured in the film manufacturing apparatus 1 may be wound around a core material as a raw material roll R2 of the optical film F10X by a winding unit 8. After that, it is fed to the next step, and a part of the equipment in the next step is provided with the above-mentioned defect inspection system 10.

再者,有關本發明所適用的膜,並非一定被限定於上面所述的偏光膜、相位差膜及增亮膜的光學膜,而是能夠將本發明廣泛地應用於能藉由標記裝置來進行印字的膜中。 Furthermore, the film to which the present invention is applicable is not necessarily limited to the optical film of the polarizing film, retardation film, and brightness enhancement film described above, but can be widely applied to the invention which can be applied by a marking device. In the film to be printed.

以上,雖然已一邊參照附圖一邊針對本發明之較佳的實施形態例加以說明,但是本發明當然不被限 定於該例。在上面所述之例中所示的各構成構件之各種形狀或組合等為其一例,其能夠在未脫離本發明之主旨的範圍內基於設計要求等來進行各種變更。 Although the preferred embodiment of the present invention has been described above with reference to the drawings, the present invention is not limited to this example. Various shapes, combinations, and the like of the constituent members shown in the examples described above are examples, and various changes can be made based on design requirements and the like without departing from the spirit of the present invention.

Claims (13)

一種標記裝置,係能夠藉由對光學膜射出液滴來標記資訊,該標記裝置係具備:液滴射出裝置,係具有形成有對前述光學膜射出前述液滴的射出孔的射出面;以及飛散限制構件,係設置於前述射出面與前述光學膜之間,能夠阻斷前述液滴從前述射出孔射出之後到滴落於前述光學膜為止所飛散的飛沫;在前述飛散限制構件係形成有朝向與前述射出面之法線交叉的方向擴展的阻斷面。     A marking device capable of marking information by ejecting liquid droplets onto an optical film, the marking device comprising: a droplet ejecting device having an ejection surface formed with an ejection hole for ejecting the droplets onto the optical film; and a scattering The restricting member is provided between the emission surface and the optical film, and can block the droplets that are scattered after the liquid droplets are ejected from the ejection holes until they drop on the optical film; the scattering restricting member is formed with a direction A blocking surface that extends in a direction that intersects the normal of the exit surface.     如申請專利範圍第1項所述之標記裝置,其中,前述飛沫係包含前述液滴從前述射出孔射出時所飛散的第一飛沫,和前述液滴滴落於前述光學膜時所飛散的第二飛沫之至少一方。     The marking device according to item 1 of the scope of patent application, wherein the droplets include a first droplet that is scattered when the droplet is ejected from the injection hole, and a first droplet that is scattered when the droplet is dropped on the optical film. At least one of the two droplets.     如申請專利範圍第1項或第2項所述之標記裝置,其中,前述飛散限制構件係具備在與前述射出面之法線平行的方向具有厚度的飛散限制板。     The marking device according to claim 1 or claim 2, wherein the scattering restriction member includes a scattering restriction plate having a thickness in a direction parallel to a normal line of the emission surface.     如申請專利範圍第3項所述之標記裝置,其中,前述飛散限制板係具備隔著射出前述液滴的射出通路而配置於一方側的第一飛散限制板,以及隔著前述射出通路而配置於另一方側的第二飛散限制板之至少一方。     The marking device according to item 3 of the scope of patent application, wherein the scattering restricting plate includes a first scattering restricting plate disposed on one side via an ejection path through which the droplet is ejected, and is disposed across the ejection path. At least one of the second scattering limit plates on the other side.     如申請專利範圍第4項所述之標記裝置,其中,前述射出通路係沿著與鉛直方向交叉的方向而延伸;前述第一飛散限制板係在鉛直方向配置於比前述射出通路 更上方;前述第二飛散限制板係在鉛直方向配置於比前述射出通路更下方。     The marking device according to item 4 of the scope of patent application, wherein the emission path extends in a direction crossing the vertical direction; the first scattering limit plate is disposed above the emission path in the vertical direction; The second scattering-restricting plate is arranged below the emission path in the vertical direction.     如申請專利範圍第4項或第5項所述之標記裝置,其中,在前述第一飛散限制板係形成有朝向與前述射出面之法線交叉的方向擴展的第一阻斷面;在前述第二飛散限制板係形成有與前述第一阻斷面平行地擴展的第二阻斷面。     The marking device according to item 4 or 5 of the scope of patent application, wherein the first scattering limit plate is formed with a first blocking surface that expands in a direction that intersects the normal line of the exit surface; The second scattering restriction plate is formed with a second blocking surface that extends in parallel with the first blocking surface.     如申請專利範圍第4項至第6項中任一項所述之標記裝置,其中,前述第一飛散限制板及前述第二飛散限制板所分離的間隔,係比前述射出孔之直徑更大。     The marking device according to any one of claims 4 to 6 in the scope of patent application, wherein the separation distance between the first scattering limit plate and the second scattering limit plate is larger than the diameter of the injection hole. .     如申請專利範圍第5項所述之標記裝置,其中,前述飛散限制板係僅為第二飛散限制板。     The marking device according to item 5 of the scope of patent application, wherein the scattering limit plate is only the second scattering limit plate.     如申請專利範圍第1項至第8項中任一項所述之標記裝置,更具備:遮蔽構件,係設置於前述射出面,且能夠阻斷前述液滴從前述射出孔射出時所飛散的飛沫;在前述遮蔽構件係形成有開口部,該開口部係於與前述射出孔相對向的位置形成開口,並且具有遮擋朝向與前述射出面之法線交叉的方向飛散之前述飛沫的內壁面。     The marking device according to any one of claims 1 to 8 of the scope of patent application, further comprising: a shielding member provided on the ejection surface and capable of blocking the scattering of the liquid droplets when ejected from the ejection hole. Droplets; the shielding member is formed with an opening formed at a position opposite to the injection hole, and has an inner wall surface that blocks the droplets scattered in a direction intersecting with a normal line of the emission surface.     如申請專利範圍第1項至第9項中任一項所述之標記裝置,更具備:吸引裝置,係設置於前述射出面與前述光學膜之間,能夠吸引前述液滴從前述射出孔射出之後到滴落於前述光學膜為止所飛散的飛沫。     The marking device according to any one of claims 1 to 9 of the scope of patent application, further comprising: a suction device provided between the exit surface and the optical film, capable of attracting the droplets to be ejected from the exit holes. The droplets scattered after dropping on the optical film.     如申請專利範圍第1項至第10項中任一項所述之標記裝置,其中,前述液滴射出裝置係配置成在搬運長條帶狀的前述光學膜的期間,隔著前述光學膜而相對向於與前述光學膜相接觸的導輥,並從前述光學膜與前述導輥相接觸的位置之相反側射出前述液滴。     The marking device according to any one of claims 1 to 10, wherein the liquid droplet ejection device is disposed while the long optical film is transported through the optical film. The droplet is ejected from the opposite side of the position where the optical film and the guide roller are in contact with the guide roller in contact with the optical film.     一種缺陷檢查系統,係具備:搬運線路,係搬運長條帶狀的膜;缺陷檢查裝置,係進行在前述搬運線路上被搬運的膜之缺陷檢查;以及申請專利範圍第1項至11項中任一項所述之標記裝置,係基於前述缺陷檢查之結果而對缺陷之位置射出液滴,藉此能夠標記資訊。     A defect inspection system comprising: a conveying line for conveying a long strip-shaped film; a defect inspection device for inspecting the defects of a film being conveyed on the aforementioned conveying line; and items 1 to 11 of the scope of patent application The marking device described in any one is capable of marking information by ejecting liquid droplets at the positions of defects based on the results of the aforementioned defect inspection.     一種膜製造方法,係包含:使用申請專利範圍第12項所述之缺陷檢查系統來進行標記的步驟。     A film manufacturing method includes the step of marking using a defect inspection system described in claim 12 of the patent application scope.    
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