TW201834850A - Gas barrier film and organic EL device - Google Patents

Gas barrier film and organic EL device Download PDF

Info

Publication number
TW201834850A
TW201834850A TW106143479A TW106143479A TW201834850A TW 201834850 A TW201834850 A TW 201834850A TW 106143479 A TW106143479 A TW 106143479A TW 106143479 A TW106143479 A TW 106143479A TW 201834850 A TW201834850 A TW 201834850A
Authority
TW
Taiwan
Prior art keywords
film
gas barrier
barrier film
layer
cyclic olefin
Prior art date
Application number
TW106143479A
Other languages
Chinese (zh)
Inventor
吉岡忠司
佐竹光
Original Assignee
日商東麗薄膜先端加工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東麗薄膜先端加工股份有限公司 filed Critical 日商東麗薄膜先端加工股份有限公司
Publication of TW201834850A publication Critical patent/TW201834850A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8426Peripheral sealing arrangements, e.g. adhesives, sealants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The purpose of the present invention is to provide a gas barrier film that has low retardation, is highly transparent, and has favorable flexibility. In order to achieve the foregoing, the present invention has the following configuration. Namely, a gas barrier film having a gas barrier layer composed of a single inorganic membrane directly on at least one surface of a cyclic olefin resin film, wherein the inorganic membrane comprises at least zinc oxide, silicon dioxide, and aluminum oxide.

Description

阻氣性薄膜及有機EL裝置  Gas barrier film and organic EL device  

本發明係有關於一種適用於必需有阻氣性之食品、醫藥品的包裝用途、太陽能電池、電子紙張、有機電致發光(EL)裝置等電子構件之阻氣性薄膜、及使用阻氣性薄膜之有機EL裝置。 The present invention relates to a gas barrier film suitable for use in packaging materials for foods and pharmaceutical products which are required to have gas barrier properties, solar cells, electronic papers, organic electroluminescence (EL) devices, and the like, and gas barrier properties. Thin film organic EL device.

阻氣性薄膜其一般係在基材薄膜上積層阻氣層而構成。 The gas barrier film is generally formed by laminating a gas barrier layer on a base film.

作為阻氣層,周知為無機氧化物,例如氧化鋁、氧化矽、氧化鎂等的蒸鍍膜。 The gas barrier layer is known as an inorganic oxide, for example, a vapor deposited film of alumina, cerium oxide, magnesium oxide or the like.

作為基材薄膜,周知為各種塑膠薄膜,例如包含聚烯烴、聚酯、聚醯胺、聚碳酸酯、聚苯乙烯、聚乙烯醇、乙烯乙酸乙烯酯共聚物之皂化物、聚丙烯腈、聚縮醛等樹脂的塑膠薄膜。 As the substrate film, various plastic films are known, for example, saponified materials including polyolefin, polyester, polyamide, polycarbonate, polystyrene, polyvinyl alcohol, ethylene vinyl acetate copolymer, polyacrylonitrile, poly A plastic film of a resin such as acetal.

另一方面,作為有機電致發光(EL)或液晶等的電子裝置之阻氣性薄膜,周知有使用遲滯量低(雙折射率小)且透明性高的環狀烯烴樹脂薄膜作為基材薄膜之阻氣性薄膜(專利文獻1~3)。 On the other hand, as a gas barrier film of an electronic device such as an organic electroluminescence (EL) or a liquid crystal, a cyclic olefin resin film having a low hysteresis amount (small birefringence) and high transparency is known as a base film. A gas barrier film (Patent Documents 1 to 3).

另外,為提升基材薄膜與阻氣層的密接性等,有人提案在基材薄膜與阻氣層之間配置硬塗層(專利文獻3、4)。 In addition, in order to improve the adhesion between the base film and the gas barrier layer, it has been proposed to dispose a hard coat layer between the base film and the gas barrier layer (Patent Documents 3 and 4).

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1 日本特開2007-83644號公報 Patent Document 1 Japanese Patent Laid-Open Publication No. 2007-83644

專利文獻2 日本特開2013-103373號公報 Patent Document 2 Japanese Patent Laid-Open Publication No. 2013-103373

專利文獻3 日本特開2015-24536號公報 Patent Document 3 Japanese Patent Laid-Open No. 2015-24536

專利文獻4 日本特開2006-224577號公報 Patent Document 4 Japanese Patent Laid-Open Publication No. 2006-224577

近年來,阻氣性薄膜係被要求拓展至具有可撓性之太陽能電池裝置、有機電致發光(EL)裝置或液晶顯示裝置等可撓性電子裝置的用途。亦即,阻氣性薄膜漸而被要求可耐受彎曲、折曲或者複雜之平面形狀的柔軟性。 In recent years, gas barrier films have been required to be extended to flexible electronic devices such as flexible solar cell devices, organic electroluminescence (EL) devices, and liquid crystal display devices. That is, the gas barrier film is gradually required to withstand the flexibility of bending, bending, or a complicated planar shape.

然而,如專利文獻1~3所記載之阻氣性薄膜,係使用環狀烯烴樹脂薄膜作為基材薄膜,積層二氧化矽等的無機膜作為阻氣層之阻氣性薄膜,有可撓性低的問題。又,如專利文獻3、4所記載之阻氣性薄膜,在基材薄膜與阻氣層之間配置硬塗層的阻氣性薄膜亦有可撓性低的問題。 However, in the gas barrier film described in Patent Documents 1 to 3, a cyclic olefin resin film is used as the base film, and an inorganic film such as ruthenium dioxide is laminated as a gas barrier film of the gas barrier layer, and has flexibility. Low problem. Further, in the gas barrier film described in Patent Documents 3 and 4, the gas barrier film in which the hard coat layer is disposed between the base film and the gas barrier layer has a problem that flexibility is low.

從而,有鑑於上述之課題,本發明之目的在於提供一種遲滯量低、透明性高且可撓性良好的阻氣性薄膜。本發明之其他目的在於提供一種具備本發明之阻氣性薄膜之有機EL裝置。 Therefore, in view of the above problems, an object of the present invention is to provide a gas barrier film which has a low hysteresis amount, high transparency, and good flexibility. Another object of the present invention is to provide an organic EL device comprising the gas barrier film of the present invention.

本發明之上述目的可由以下的本發明來達成: The above object of the present invention can be achieved by the following invention:

[1]一種阻氣性薄膜,其為在環狀烯烴樹脂薄膜的至少其中一面直接具有包含單一無機膜之阻氣層的阻氣性薄膜,其中前述無機膜至少包含氧化鋅、二氧化矽及氧化鋁。 [1] A gas barrier film which is a gas barrier film having a gas barrier layer containing a single inorganic film directly on at least one of a side surface of a cyclic olefin resin film, wherein the inorganic film contains at least zinc oxide, cerium oxide, and Alumina.

[2]如[1]之阻氣性薄膜,其中,前述無機膜之藉由X射線光電子光譜法(XPS法)所測得的Zn原子濃度為20~40atom%、Si原子濃度為5~20atom%、Al原子濃度為0.5~5atom%、O原子濃度為35~70atom%。 [2] The gas barrier film according to [1], wherein the inorganic film has a Zn atom concentration of 20 to 40 atom% and an atomic concentration of 5 to 20 atom by X-ray photoelectron spectroscopy (XPS method). The atomic concentration of % and Al is 0.5 to 5 atom%, and the concentration of O atom is 35 to 70 atom%.

[3]如[1]或[2]之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜之對波長550nm的光之面內方向的遲滯量(Re550)為500nm以下。 [3] The gas barrier film of [1] or [2], wherein the cyclic olefin resin film has a retardation amount (Re550) in the in-plane direction of light having a wavelength of 550 nm of 500 nm or less.

[4]如[1]至[3]中任一項之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜具有作為相位差薄膜之機能。 [4] The gas barrier film according to any one of [1] to [3] wherein the cyclic olefin resin film has a function as a retardation film.

[5]如[1]至[4]中任一項之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜的厚度小於100μm。 [5] The gas barrier film according to any one of [1] to [4] wherein the cyclic olefin resin film has a thickness of less than 100 μm.

[6]如[1]至[5]中任一項之阻氣性薄膜,其中,前述無機膜的厚度為30~60nm的範圍或120~170nm的範圍。 [6] The gas barrier film according to any one of [1] to [5] wherein the thickness of the inorganic film is in the range of 30 to 60 nm or in the range of 120 to 170 nm.

[7]如[5]或[6]之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜的厚度小於50μm,且前述無機膜的厚度為30~60nm的範圍。 [7] The gas barrier film according to [5] or [6] wherein the thickness of the cyclic olefin resin film is less than 50 μm, and the thickness of the inorganic film is in the range of 30 to 60 nm.

[8]如[1]至[7]中任一項之阻氣性薄膜,其中,在前述環狀烯烴樹脂薄膜之具有阻氣層的面之相反面具有硬化樹脂層。 [8] The gas barrier film according to any one of [1] to [7], wherein the surface of the cyclic olefin resin film having a gas barrier layer has a cured resin layer.

[9]如[8]之阻氣性薄膜,其中,前述硬化樹脂層含有粒子,該粒子的平均粒徑(r:μm)與硬化樹脂層的厚度(d:μm)的比率(r/d)為0.7以下。 [9] The gas barrier film according to [8], wherein the hardened resin layer contains particles, and a ratio of an average particle diameter (r: μm) of the particles to a thickness (d: μm) of the cured resin layer (r/d) ) is 0.7 or less.

[10]如[8]或[9]之阻氣性薄膜,其中,前述硬化樹脂層之藉由原子力顯微鏡所測得的表面粗糙度(Ra)為2.0nm以上10.0nm以下。 [10] The gas barrier film according to [8] or [9], wherein the surface roughness (Ra) of the cured resin layer measured by an atomic force microscope is 2.0 nm or more and 10.0 nm or less.

[11]一種有機EL裝置,其係具備如[1]至[10]中任一項之阻氣性薄膜。 [11] An organic EL device comprising the gas barrier film according to any one of [1] to [10].

根據本發明,可提供一種遲滯量低、透明性高且可撓性良好的阻氣性薄膜。又,本發明之阻氣性薄膜係適用於有機EL裝置。 According to the present invention, it is possible to provide a gas barrier film which has a low hysteresis amount, high transparency, and good flexibility. Moreover, the gas barrier film of the present invention is suitable for use in an organic EL device.

1‧‧‧捲繞式濺鍍‧CVD裝置 1‧‧‧Wind-sputtering ‧CVD device

4‧‧‧阻氣性薄膜 4‧‧‧ gas barrier film

6‧‧‧捲繞室 6‧‧‧Winding room

7‧‧‧捲出軸 7‧‧‧Rolling shaft

8、9、10‧‧‧捲出側導輥 8, 9, ‧ ‧ rolled out side guide rolls

11‧‧‧冷卻滾筒 11‧‧‧Cooling roller

12‧‧‧濺鍍電極 12‧‧‧ Sputtering electrode

13、14、15‧‧‧捲繞側導輥 13,14,15‧‧‧Winding side guide roller

16‧‧‧捲繞軸 16‧‧‧Winding shaft

100‧‧‧有機EL裝置 100‧‧‧Organic EL device

101‧‧‧背面基板 101‧‧‧Back substrate

102‧‧‧有機EL元件 102‧‧‧Organic EL components

103‧‧‧密封黏著劑層 103‧‧‧ Sealing adhesive layer

104‧‧‧阻氣性薄膜 104‧‧‧ gas barrier film

105‧‧‧光學薄膜 105‧‧‧Optical film

106‧‧‧表面保護薄膜 106‧‧‧Surface protection film

圖1為具備本發明之阻氣性薄膜之有機EL裝置的一例的示意剖面圖。 Fig. 1 is a schematic cross-sectional view showing an example of an organic EL device including the gas barrier film of the present invention.

圖2為示意性地表示用來製造本發明之阻氣性薄膜的捲繞式濺鍍裝置的概略圖。 Fig. 2 is a schematic view schematically showing a wound sputtering apparatus for producing a gas barrier film of the present invention.

實施發明之形態Form of implementing the invention

本發明之阻氣性薄膜係在環狀烯烴樹脂薄膜的至少其中一面直接具有包含單一無機膜之阻氣層。所 述無機膜係至少包含氧化鋅、二氧化矽及氧化鋁。以下,有將至少包含氧化鋅、二氧化矽及氧化鋁的無機膜稱為「本發明之薄膜的無機膜」的情形。 The gas barrier film of the present invention directly has a gas barrier layer containing a single inorganic film on at least one side of the cyclic olefin resin film. The inorganic film system contains at least zinc oxide, cerium oxide, and aluminum oxide. Hereinafter, an inorganic film containing at least zinc oxide, cerium oxide, and aluminum oxide is referred to as "an inorganic film of the film of the present invention".

本發明之阻氣層僅包含單一無機膜,此單一無機膜係至少包含氧化鋅、二氧化矽及氧化鋁。於本發明中,只要是至少包含氧化鋅、二氧化矽及氧化鋁的無機膜,則例如積層有氧化鋅、二氧化矽、氧化鋁之組成比不同的2種以上之無機膜者亦定義為單一無機膜。亦即,僅積層2種以上之屬於「本發明之薄膜的無機膜」之無機膜者亦定義為單一無機膜。 The gas barrier layer of the present invention contains only a single inorganic film, and the single inorganic film contains at least zinc oxide, cerium oxide, and aluminum oxide. In the present invention, as long as it is an inorganic film containing at least zinc oxide, cerium oxide, and aluminum oxide, for example, two or more inorganic films having different composition ratios of zinc oxide, cerium oxide, and aluminum oxide are also defined as A single inorganic membrane. In other words, only one or more inorganic membranes belonging to the "inorganic film of the film of the present invention" are also defined as a single inorganic film.

本發明之阻氣層不包含如以下之本發明之薄膜的無機膜以外的其他無機膜。例如,不包含:僅包含矽化合物(例如氧化矽、氮化矽、氮氧化矽)的無機膜、僅包含鋁化合物(例如氧化鋁)的無機膜、僅包含鋅化合物(例如氧化鋅、硫化鋅)的無機膜,或者僅包含上述矽化合物與上述鋁化合物的無機膜、僅包含上述矽化合物與上述鋅化合物的無機膜、僅包含上述鋁化合物與上述鋅化合物的無機膜。再者,本發明之阻氣層不包含阻氣性有機膜,例如包含有機矽化合物的有機膜。作為包含有機矽化合物的有機膜,可舉出例如包含具有聚矽氮烷骨架之矽化合物的有機膜,或者使用六甲基二矽氧烷(HMDSO)氣體的電漿CVD膜等。 The gas barrier layer of the present invention does not contain an inorganic film other than the inorganic film of the film of the present invention as described below. For example, it does not include: an inorganic film containing only a cerium compound (for example, cerium oxide, cerium nitride, cerium oxynitride), an inorganic film containing only an aluminum compound (for example, alumina), and only a zinc compound (for example, zinc oxide, zinc sulfide). The inorganic film or an inorganic film containing only the above-described ruthenium compound and the above-described aluminum compound, an inorganic film containing only the above ruthenium compound and the above zinc compound, and an inorganic film containing only the above-described aluminum compound and the above zinc compound. Further, the gas barrier layer of the present invention does not contain a gas barrier organic film such as an organic film containing an organic ruthenium compound. The organic film containing the organic ruthenium compound may, for example, be an organic film containing a ruthenium compound having a polyazirane skeleton, or a plasma CVD film using hexamethyldioxane (HMDSO) gas.

就阻氣層而言,除本發明之薄膜的無機膜以外,亦包含如上述之其他的無機膜或者有機膜的話,則阻氣性薄膜的可撓性或透明性會降低。 In the gas barrier layer, in addition to the inorganic film or the organic film described above, in addition to the inorganic film of the film of the present invention, the flexibility or transparency of the gas barrier film is lowered.

又,本發明之阻氣性薄膜係在環狀烯烴樹脂薄膜的至少其中一面直接具有本發明之薄膜的無機膜。亦即,本發明之阻氣性薄膜在環狀烯烴樹脂薄膜與本發明之薄膜的無機膜之間不存在有硬塗層等的底塗層。 Moreover, the gas barrier film of the present invention is an inorganic film which directly has the film of the present invention on at least one side of the cyclic olefin resin film. That is, the gas barrier film of the present invention does not have an undercoat layer such as a hard coat layer between the cyclic olefin resin film and the inorganic film of the film of the present invention.

在環狀烯烴樹脂薄膜與本發明之薄膜的無機膜之間若存在有硬度較高的硬塗層,則阻氣性薄膜的可撓性會降低。 When a hard coat layer having a high hardness is present between the cyclic olefin resin film and the inorganic film of the film of the present invention, the flexibility of the gas barrier film is lowered.

而且,若設置硬度較高的硬塗層,則將阻氣性薄膜切成既定大小時,在硬塗層會產生微小裂痕。一旦在硬塗層產生微小裂痕,則其會延伸至積層於硬塗層上的阻氣層,阻氣層也會產生微小裂痕。一旦在阻氣層的切斷部產生微小裂痕,將阻氣性薄膜應用於可撓性有機EL裝置而彎折或折疊時,阻氣性便會降低。其細節係於後述。 Further, when a hard coat layer having a high hardness is provided, when the gas barrier film is cut into a predetermined size, minute cracks are generated in the hard coat layer. Once a small crack is formed in the hard coat layer, it will extend to the gas barrier layer laminated on the hard coat layer, and the gas barrier layer will also generate minute cracks. When a micro crack occurs in the cut portion of the gas barrier layer, and the gas barrier film is applied to the flexible organic EL device to be bent or folded, the gas barrier property is lowered. The details are described later.

[至少包含氧化鋅、二氧化矽及氧化鋁的無機膜] [Inorganic film containing at least zinc oxide, cerium oxide and aluminum oxide]

本發明之阻氣層係由至少包含氧化鋅、二氧化矽及氧化鋁之無機膜(本發明之薄膜的無機膜)的單一層所構成。 The gas barrier layer of the present invention is composed of a single layer of an inorganic film (an inorganic film of the film of the present invention) containing at least zinc oxide, cerium oxide and aluminum oxide.

就本發明之薄膜的無機膜的組成而言,較佳的是藉由X射線光電子光譜法(XPS法)所測得的Zn原子濃度為20~40atom%、Si原子濃度為5~20atom%、Al原子濃度為0.5~5atom%、O原子濃度為35~70atom%。 The composition of the inorganic film of the film of the present invention is preferably a concentration of Zn atom of 20 to 40 atom% and a concentration of Si atom of 5 to 20 atom% as measured by X-ray photoelectron spectroscopy (XPS method). The Al atom concentration is 0.5 to 5 atom%, and the O atom concentration is 35 to 70 atom%.

若Zn原子濃度大於40atom%、或Si原子濃度小於5atom%,抑制氧化鋅之結晶生長的氧化物容易有 不足之傾向,因此,空隙部分或缺陷部分增加,而無法獲得充分的阻氣性。若Zn原子濃度小於20atom%、或Si原子濃度大於20atom%,則無機膜內部之二氧化矽的非晶質成分容易增加,而使得無機膜的柔軟性變差。 When the Zn atom concentration is more than 40 atom% or the Si atom concentration is less than 5 atom%, the oxide which inhibits the crystal growth of zinc oxide tends to be insufficient, and therefore the void portion or the defective portion is increased, and sufficient gas barrier properties cannot be obtained. When the Zn atom concentration is less than 20 atom% or the Si atom concentration is more than 20 atom%, the amorphous component of the cerium oxide inside the inorganic film is likely to increase, and the flexibility of the inorganic film is deteriorated.

Al原子濃度大於5atom%時,氧化鋅與二氧化矽的親和性容易過高,因此無機膜的硬度容易上昇,對於熱或來自外部的應力容易產生裂痕。Al原子濃度小於0.5atom%時,則氧化鋅與二氧化矽的親和性不足,不易提升形成無機膜之粒子間的結合力,而使得柔軟性變差。 When the Al atom concentration is more than 5 atom%, the affinity between zinc oxide and ceria is likely to be too high. Therefore, the hardness of the inorganic film is likely to increase, and cracks are likely to occur with heat or stress from the outside. When the Al atom concentration is less than 0.5 atom%, the affinity between zinc oxide and cerium oxide is insufficient, and the binding force between the particles forming the inorganic film is not easily improved, and the flexibility is deteriorated.

O原子濃度大於70atom%時,無機膜內部的缺陷量容易增加,而無法獲得高阻氣性。O原子濃度小於35atom%時,鋅、矽、鋁的氧化狀態易不足,無法抑制結晶生長,粒徑容易變大,而導致阻氣性惡化。 When the concentration of the O atom is more than 70 atom%, the amount of defects inside the inorganic film is likely to increase, and high gas barrier properties cannot be obtained. When the concentration of the O atom is less than 35 atom%, the oxidation state of zinc, bismuth, and aluminum is liable to be insufficient, and crystal growth cannot be suppressed, and the particle diameter tends to be large, resulting in deterioration of gas barrier properties.

基於上述觀點,更佳的是Zn原子濃度為25~35atom%、Si原子濃度為10~15atom%、Al原子濃度為1~3atom%、O原子濃度為50~64atom%。 Based on the above viewpoint, it is more preferable that the Zn atom concentration is 25 to 35 atom%, the Si atom concentration is 10 to 15 atom%, the Al atom concentration is 1 to 3 atom%, and the O atom concentration is 50 to 64 atom%.

上述組成由於係由與無機膜的形成時所使用之混合燒結材料相同程度的組成所形成,因此,可透過使用符合目標無機膜的組成之組成的混合燒結材料來調整。 Since the above composition is formed by the same composition as that of the mixed sintered material used in the formation of the inorganic film, it can be adjusted by using a mixed sintered material which satisfies the composition of the composition of the target inorganic film.

形成本發明之薄膜的無機膜的方法不特別限定,可使用氧化鋅、二氧化矽與氧化鋁之混合燒結材料,藉由真空蒸鍍法、濺鍍法、離子鍍法等來形成。在使用氧化鋅、二氧化矽與氧化鋁之單質材料的情形,可將氧 化鋅、二氧化矽與氧化鋁各自由個別的蒸鍍源或濺鍍電極同時成膜,以成為所要之組成的方式加以混合而形成。此等方法當中,基於無機膜之組成再現性的觀點,更佳為使用混合燒結材料的濺鍍法。 The method of forming the inorganic film of the film of the present invention is not particularly limited, and it can be formed by a vacuum deposition method, a sputtering method, an ion plating method, or the like using a mixed sintered material of zinc oxide, cerium oxide, and aluminum oxide. In the case of using a simple material of zinc oxide, cerium oxide and aluminum oxide, each of zinc oxide, cerium oxide and aluminum oxide may be simultaneously formed from individual vapor deposition sources or sputtering electrodes to form a desired composition. It is formed by mixing. Among these methods, a sputtering method using a mixed sintered material is more preferable from the viewpoint of composition reproducibility of the inorganic film.

藉由濺鍍法等形成無機膜時,較佳為在環狀烯烴樹脂薄膜之形成無機膜的面之相反面預先積層耐熱性的保護薄膜,其係例如在聚對苯二甲酸乙二酯(PET)薄膜設有微黏著層的PET保護薄膜。又,亦較佳的是預先積層後述之硬化樹脂層來替代上述保護薄膜。 When the inorganic film is formed by a sputtering method or the like, it is preferred to laminate a heat-resistant protective film on the opposite side of the surface of the cyclic olefin resin film on which the inorganic film is formed, for example, in polyethylene terephthalate ( The PET film has a micro-adhesive PET protective film. Further, it is also preferable to laminate a cured resin layer described later in place of the protective film.

本發明之薄膜的無機膜可於不妨害本發明之效果(阻氣性、可撓性、透明性)的範圍包含其他金屬,例如鈦、錫、銅、銦、鎵、鋯、鈮、鉬、鉭等金屬、或者此等金屬之氧化物、氮化物、硫化物。 The inorganic film of the film of the present invention may contain other metals such as titanium, tin, copper, indium, gallium, zirconium, hafnium, molybdenum, insofar as it does not impair the effects (gas barrier properties, flexibility, transparency) of the present invention. A metal such as ruthenium or an oxide, a nitride or a sulfide of such a metal.

本發明之薄膜的無機膜的厚度,基於獲得良好阻氣性之觀點,較佳為10nm以上,更佳為20nm以上,特佳為30nm以上。另一方面,厚度之上限,基於抑制阻氣性薄膜的捲曲之觀點,較佳為500nm以下,更佳為300nm以下,特佳為200nm以下。 The thickness of the inorganic film of the film of the present invention is preferably 10 nm or more, more preferably 20 nm or more, and particularly preferably 30 nm or more from the viewpoint of obtaining good gas barrier properties. On the other hand, the upper limit of the thickness is preferably 500 nm or less, more preferably 300 nm or less, and particularly preferably 200 nm or less from the viewpoint of suppressing curl of the gas barrier film.

又,對環狀烯烴樹脂薄膜積層本發明之薄膜的無機膜時,基於獲得高透明性(高總透光率)之觀點,本發明之薄膜的無機膜的厚度較佳為30~60nm的範圍或120~170nm的範圍。基於本發明之薄膜的無機膜之可見光折射率(1.70左右)、與環狀烯烴樹脂薄膜之可見光折射率(1.53左右)的關係,對環狀烯烴樹脂薄膜積層本發明之薄膜的無機膜時的穿透率係在上述2種範圍(無 機膜的厚度30~60nm的範圍、或者120~170nm的範圍)時相對較高。 Further, when the inorganic film of the film of the present invention is laminated on the film of the cyclic olefin resin, the thickness of the inorganic film of the film of the present invention is preferably in the range of 30 to 60 nm from the viewpoint of obtaining high transparency (high total light transmittance). Or a range of 120 to 170 nm. The relationship between the visible light refractive index (about 1.70) of the inorganic film of the film of the present invention and the visible light refractive index (about 1.53) of the cyclic olefin resin film, when the inorganic film of the film of the present invention is laminated on the cyclic olefin resin film The transmittance is relatively high in the above two ranges (the thickness of the inorganic film is in the range of 30 to 60 nm or in the range of 120 to 170 nm).

本發明之薄膜的無機膜係具有此種特徵:切斷時不會產生裂痕、或即使產生裂痕亦極微小。而此特徵則有以下效果:將本發明之阻氣性薄膜經切成既定大小所得之切片應用於可撓性有機EL裝置,即使彎折或折疊,仍可抑制阻氣性降低。其細節係於後述。 The inorganic film of the film of the present invention has such a characteristic that cracks do not occur at the time of cutting, or even cracks are extremely small. On the other hand, this feature has the effect that the gas barrier film of the present invention is cut into a predetermined size and applied to a flexible organic EL device, and the gas barrier property can be suppressed even if it is bent or folded. The details are described later.

要抑制無機膜切斷時的裂痕產生,無機膜的厚度係愈小愈佳;由此觀點而言,無機膜的厚度更佳為30~60nm的範圍。 In order to suppress the occurrence of cracks at the time of cutting of the inorganic film, the thickness of the inorganic film is preferably as small as possible; from this viewpoint, the thickness of the inorganic film is more preferably in the range of 30 to 60 nm.

[環狀烯烴樹脂薄膜] [Ring olefin resin film]

本發明之環烯狀烴樹脂薄膜係以環狀烯烴樹脂(COP)或者環狀烯烴共聚合樹脂(COC)為主成分的樹脂薄膜。此處所稱主成分,係指構成樹脂薄膜的樹脂成分當中,COP或者COC的構成比率為50質量%以上者,較佳為60質量%以上,更佳為80質量%以上,再更佳為90質量%以上,特佳為95質量%以上。 The cycloolefin-like hydrocarbon resin film of the present invention is a resin film containing a cyclic olefin resin (COP) or a cyclic olefin copolymer resin (COC) as a main component. In the resin component constituting the resin film, the composition ratio of COP or COC is preferably 50% by mass or more, more preferably 60% by mass or more, still more preferably 80% by mass or more, and still more preferably 90%. The mass% or more is particularly preferably 95% by mass or more.

環狀烯烴樹脂薄膜,與向來廣泛使用的聚酯薄膜,尤其是聚對苯二甲酸乙二酯薄膜相比,有所謂透濕性相對較小、具有高透明性,且使用於有機EL裝置時可提升發光效率之特徵。再者,其具備所謂遲滯量低(雙折射率小)、使用於有機EL裝置時,色彩的視角依存性較小之優點。 The cyclic olefin resin film has a relatively small moisture permeability and high transparency as compared with a polyester film which has been widely used, especially a polyethylene terephthalate film, and is used in an organic EL device. It can improve the characteristics of luminous efficiency. Further, it has an advantage that the degree of hysteresis is low (the birefringence is small) and the viewing angle dependence of color is small when used in an organic EL device.

環狀烯烴樹脂(COP)係指由環狀烯烴之均聚物所構成的樹脂。環狀烯烴共聚合樹脂(COC)係指由環狀 烯烴與環狀烯烴以外的其他單體之共聚物所構成的樹脂。 The cyclic olefin resin (COP) means a resin composed of a homopolymer of a cyclic olefin. The cyclic olefin copolymer resin (COC) is a resin composed of a copolymer of a cyclic olefin and a monomer other than a cyclic olefin.

作為要獲得COP、COC時可使用的環狀烯烴,可舉出例如:環丁烯、環戊烯、環庚烯、環己烯、環辛烯、環戊二烯、1,3-環己二烯、3,4-二甲基環戊烯、3-甲基環己烯、2-(2-甲基丁基)-1-環己烯、3a,5,6,7a-四氫-4,7-亞甲基-1H-茚等的單環式烯烴;降莰烯、二環戊二烯、四環十二烯、乙基四環十二烯、亞乙基四環十二烯、四環[7.4.0.110,13.02,7]十三-2,4,6,11-四烯等的多環式烯烴;等。此等環狀烯烴可各自單獨或者組合2種以上使用。 Examples of the cyclic olefin which can be used in order to obtain COP and COC include cyclobutene, cyclopentene, cycloheptene, cyclohexene, cyclooctene, cyclopentadiene, and 1,3-cyclohexane. Diene, 3,4-dimethylcyclopentene, 3-methylcyclohexene, 2-(2-methylbutyl)-1-cyclohexene, 3a,5,6,7a-tetrahydro- Monocyclic olefin such as 4,7-methylene-1H-indole; norbornene, dicyclopentadiene, tetracyclododecene, ethyltetracyclododecene, ethylene tetracyclododecene a polycyclic olefin such as tetracyclo [7.4.0.110, 13.02, 7] thirteen-2,4,6,11-tetraene; These cyclic olefins can be used individually or in combination of 2 or more types.

作為要獲得環狀烯烴共聚合樹脂(COC)時可使用之環狀烯烴以外的其他單體,可舉出例如乙烯、丙烯、1-丁烯、1-戊烯、1-己烯、3-甲基-1-丁烯、3-甲基-1-戊烯、3-乙基-1-戊烯、4-甲基-1-戊烯、4-甲基-1-己烯、4,4-二甲基-1-己烯、4,4-二甲基-1-戊烯、4-乙基-1-己烯、3-乙基-1-己烯、1-辛烯、1-癸烯、1-十二烯、1-十四烯、1-十六烯、1-十八烯、1-二十烯等。 Examples of the monomer other than the cyclic olefin which can be used in order to obtain a cyclic olefin copolymer resin (COC) include ethylene, propylene, 1-butene, 1-pentene, 1-hexene, and 3- Methyl-1-butene, 3-methyl-1-pentene, 3-ethyl-1-pentene, 4-methyl-1-pentene, 4-methyl-1-hexene, 4, 4-dimethyl-1-hexene, 4,4-dimethyl-1-pentene, 4-ethyl-1-hexene, 3-ethyl-1-hexene, 1-octene, 1 - terpene, 1-dodecene, 1-tetradecene, 1-hexadecene, 1-octadecene, 1-eicosene, and the like.

本發明之環狀烯烴樹脂薄膜亦能以市售品形式來取得。作為市售品,有例如日本ZEON(股)製之「ZEONEX(註冊商標)」、「ZEONOR(註冊商標)」、積水化學工業(股)之「Esshina(註冊商標)」、JSR(股)之「ARTON(註冊商標)」、日立化成(股)之「Optolet」、三井化學(股)之「Apel(註冊商標)」等。 The cyclic olefin resin film of the present invention can also be obtained in the form of a commercially available product. As a commercial item, for example, "ZEONEX (registered trademark)", "ZEONOR (registered trademark)", and "Esshina (registered trademark)", JSR (share) of Sekisui Chemical Industry Co., Ltd., manufactured by Japan ZEON Co., Ltd. "ARTON (registered trademark)", "Optolet" of Hitachi Chemical Co., Ltd., "Apel (registered trademark)" of Mitsui Chemicals Co., Ltd., etc.

環狀烯烴樹脂薄膜的厚度不特別限定,基於確保高柔軟性之觀點,厚度係愈小愈佳;具體而言,較佳為小於100μm,更佳為小於80μm,特佳為小於50μm。基於確保對拉伸或衝擊的強度之觀點,下限厚度較佳為5μm以上,更佳為10μm以上,特佳為20μm以上。 The thickness of the cyclic olefin resin film is not particularly limited, and the thickness is preferably as small as possible from the viewpoint of ensuring high flexibility; specifically, it is preferably less than 100 μm, more preferably less than 80 μm, and particularly preferably less than 50 μm. The lower limit thickness is preferably 5 μm or more, more preferably 10 μm or more, and particularly preferably 20 μm or more, from the viewpoint of ensuring the strength against stretching or impact.

又,將本發明之阻氣性薄膜應用於有機EL裝置時,基於縮小有機EL裝置的厚度之觀點,本發明之阻氣性薄膜的厚度亦愈小愈佳。由此觀點而言,環狀烯烴樹脂薄膜的厚度較佳為小於50μm,更佳為小於40μm,特佳為小於35μm。下限厚度較佳為5μm以上,更佳為10μm以上。 Moreover, when the gas barrier film of the present invention is applied to an organic EL device, the thickness of the gas barrier film of the present invention is preferably smaller as compared with the viewpoint of reducing the thickness of the organic EL device. From this point of view, the thickness of the cyclic olefin resin film is preferably less than 50 μm, more preferably less than 40 μm, and particularly preferably less than 35 μm. The lower limit thickness is preferably 5 μm or more, and more preferably 10 μm or more.

對厚度小於50μm的環狀烯烴樹脂薄膜,將本發明之薄膜的無機膜僅積層於其中一面的阻氣性薄膜容易產生捲曲。為抑制此捲曲,本發明之薄膜的無機膜的厚度較佳為30~60nm的範圍,更佳為40~55nm的範圍。亦即,就本發明之阻氣性薄膜而言,較佳的是前述環狀烯烴樹脂薄膜的厚度小於50μm,且前述無機膜的厚度為30~60nm的範圍,更佳的是前述環狀烯烴樹脂薄膜的厚度小於50μm,且前述無機膜的厚度為40~55nm的範圍。藉由對厚度小於50μm的環狀烯烴樹脂薄膜積層厚度為30~60nm,較佳為40~55nm的本發明之薄膜的無機膜,可維持良好的阻氣性,同時易於獲得高透明性(高總透光率)。 In the cyclic olefin resin film having a thickness of less than 50 μm, the gas barrier film in which only one of the inorganic films of the film of the present invention is laminated is likely to be curled. In order to suppress this curl, the thickness of the inorganic film of the film of the present invention is preferably in the range of 30 to 60 nm, more preferably in the range of 40 to 55 nm. That is, in the gas barrier film of the present invention, it is preferred that the thickness of the cyclic olefin resin film is less than 50 μm, and the thickness of the inorganic film is in the range of 30 to 60 nm, more preferably the cyclic olefin. The thickness of the resin film is less than 50 μm, and the thickness of the inorganic film is in the range of 40 to 55 nm. By laminating the inorganic film of the film of the present invention having a thickness of 30 to 60 nm, preferably 40 to 55 nm, to a cyclic olefin resin film having a thickness of less than 50 μm, it is possible to maintain good gas barrier properties while easily obtaining high transparency (high Total light transmittance).

本發明之環狀烯烴樹脂薄膜較佳為低遲滯量。具體而言,對波長550nm的光之面內方向的遲滯量 (Re550)較佳為500nm以下,較佳為400nm以下,特佳為300nm以下。下限為0nm。 The cyclic olefin resin film of the present invention preferably has a low hysteresis amount. Specifically, the amount of retardation (Re550) in the in-plane direction of light having a wavelength of 550 nm is preferably 500 nm or less, preferably 400 nm or less, and particularly preferably 300 nm or less. The lower limit is 0 nm.

若為用來保護有機EL裝置之有機EL元件免於水蒸氣侵入的阻氣性薄膜時,則環狀烯烴樹脂薄膜的遲滯量Re550較佳為100nm以下,更佳為50nm以下,特佳為10nm以下。使用此種低遲滯量之環狀烯烴樹脂薄膜的阻氣性薄膜係具備所謂有機EL元件之發光色的視角依存性較小之優點。 When the gas barrier film is used to protect the organic EL device of the organic EL device from water vapor, the retardation amount Re550 of the cyclic olefin resin film is preferably 100 nm or less, more preferably 50 nm or less, and particularly preferably 10 nm. the following. The gas barrier film using such a low hysteresis amount of the cyclic olefin resin film has an advantage that the viewing angle dependence of the luminescent color of the organic EL element is small.

又,本發明之阻氣性薄膜可兼作構成有機EL顯示裝置(有機EL顯示器)之圓偏光板的相位差薄膜(λ/4板)。此時,較佳的是環狀烯烴樹脂薄膜具有作為相位差薄膜(λ/4板)之機能。此處所稱「環狀烯烴樹脂薄膜具有作為相位差薄膜之機能」,係指環狀烯烴樹脂薄膜的遲滯量Re550為110~170nm的範圍。此時的遲滯量Re550更佳為120~150nm的範圍,特佳為130~145nm的範圍。 Further, the gas barrier film of the present invention can also serve as a retardation film (λ/4 plate) constituting a circularly polarizing plate of an organic EL display device (organic EL display). At this time, it is preferred that the cyclic olefin resin film has a function as a retardation film (λ/4 plate). Here, the term "the cyclic olefin resin film has a function as a retardation film" means that the cyclic olefin resin film has a retardation amount Re550 of 110 to 170 nm. The retardation amount Re550 at this time is more preferably in the range of 120 to 150 nm, and particularly preferably in the range of 130 to 145 nm.

環狀烯烴樹脂薄膜之對波長550nm的光之面內方向的遲滯量(Re550)為下述式所示之值:| nx-ny |×d The amount of hysteresis (Re550) of the cyclic olefin resin film in the in-plane direction of light having a wavelength of 550 nm is a value represented by the following formula: | nx-ny | × d

(式中,nx表示環狀烯烴樹脂薄膜之面內之慢軸方向的折射率,ny表示環狀烯烴樹脂薄膜之面內之快軸方向的折射率,d表示膜厚(nm))。 (wherein nx represents a refractive index in the slow axis direction in the plane of the cyclic olefin resin film, ny represents a refractive index in the fast axis direction in the plane of the cyclic olefin resin film, and d represents a film thickness (nm)).

此處所稱面內,係指環狀烯烴樹脂薄膜面內,意指與該薄膜之厚度方向垂直的面內。遲滯量可利用如實施例中所使用的雙折射計,藉由平行尼科耳旋轉法來測定。 The term "in the surface" as used herein means the in-plane of the cyclic olefin resin film, and means the surface perpendicular to the thickness direction of the film. The amount of hysteresis can be determined by a parallel Nicols rotation method using a birefringence meter as used in the examples.

環狀烯烴樹脂薄膜的遲滯量可例如藉由調整製造時(製膜時)的延伸方向或延伸倍率來控制。又,可由上述之市售品中適宜選擇使用。 The amount of hysteresis of the cyclic olefin resin film can be controlled, for example, by adjusting the extending direction or the stretching ratio at the time of production (at the time of film formation). Further, it can be suitably selected from the above-mentioned commercial products.

[阻氣性薄膜] [Gas barrier film]

本發明之阻氣性薄膜係在環狀烯烴樹脂薄膜的至少其中一面具有阻氣層。阻氣層可僅設置於環狀烯烴樹脂薄膜的單面,亦可設置於兩面,惟較佳的是僅設置於單面。 The gas barrier film of the present invention has a gas barrier layer on at least one side of the cyclic olefin resin film. The gas barrier layer may be provided only on one side of the cyclic olefin resin film, or may be provided on both sides, but it is preferably provided only on one side.

在阻氣層僅設置於環狀烯烴樹脂薄膜的單面之形態中,較佳為在環狀烯烴樹脂薄膜之設有阻氣層的面之相反面(以下有稱為「背面」)設置硬化樹脂層。關於硬化樹脂層,其細節係於後述。 In the form in which the gas barrier layer is provided only on one side of the cyclic olefin resin film, it is preferable to provide hardening on the opposite surface of the surface of the cyclic olefin resin film on which the gas barrier layer is provided (hereinafter referred to as "back surface"). Resin layer. The details of the hardened resin layer will be described later.

本發明之阻氣性薄膜較佳為高可撓性。亦即,較佳為彎折性良好。於本發明中,作為評定上述可撓性之指標,係採用圓筒形心軸法(JIS K5600-5-1:1999)。 The gas barrier film of the present invention is preferably highly flexible. That is, it is preferable that the bending property is good. In the present invention, as an index for evaluating the above flexibility, a cylindrical mandrel method (JIS K5600-5-1: 1999) is employed.

圓筒形心軸法係一種將阻氣性薄膜捲繞於直徑2mm~十數mm的圓筒心軸(圓柱棒)時觀察、評定其裂痕等的產生狀況之方法。具體而言,較佳為依據圓筒形心軸法(JIS K5600-5-1:1999),將阻氣性薄膜以阻氣層成外側的方式捲繞於直徑2mm的圓筒心軸時,其捲繞部分之阻氣層未產生裂痕。 The cylindrical mandrel method is a method of observing and evaluating the occurrence of cracks and the like when the gas barrier film is wound around a cylindrical mandrel (cylindrical rod) having a diameter of 2 mm to 10 mm. Specifically, it is preferable that the gas barrier film is wound around a cylindrical mandrel having a diameter of 2 mm so that the gas barrier layer is formed outside, according to the cylindrical mandrel method (JIS K5600-5-1: 1999). The gas barrier layer of the wound portion thereof is not cracked.

本發明之阻氣性薄膜的阻氣性係藉由水蒸氣穿透率來評定。本發明之阻氣性薄膜的水蒸氣穿透率較佳為小於5.0×10-3g/m2/day,更佳為小於3.0×10-3g/m2/day,特佳為小於1.0×10-3g/m2/day。 The gas barrier properties of the gas barrier film of the present invention are evaluated by the water vapor transmission rate. The gas barrier film of the present invention preferably has a water vapor transmission rate of less than 5.0 × 10 -3 g / m 2 /day, more preferably less than 3.0 × 10 -3 g / m 2 /day, particularly preferably less than 1.0. ×10 -3 g/m 2 /day.

又,本發明之阻氣性薄膜較佳為高透明性。具體而言,本發明之阻氣性薄膜較佳為總透光率為88%以上。 Further, the gas barrier film of the present invention preferably has high transparency. Specifically, the gas barrier film of the present invention preferably has a total light transmittance of 88% or more.

[硬化樹脂層] [hardened resin layer]

較佳的是在環狀烯烴樹脂薄膜之具有阻氣層的面之相反面(背面)具有硬化樹脂層。透過具有硬化樹脂層,可提升阻氣性薄膜的耐擦傷性。由此觀點而言,硬化樹脂層的鉛筆硬度(由JIS K5600-5-4(1999)所規定之鉛筆硬度)較佳為F以上,更佳為H以上。上限之鉛筆硬度過高的話,後述之可撓性會惡化,故較佳為3H以下,特佳為2H以下。 It is preferred to have a hardened resin layer on the opposite side (back surface) of the surface of the cyclic olefin resin film having the gas barrier layer. By having a hardened resin layer, the scratch resistance of the gas barrier film can be improved. From this point of view, the pencil hardness of the cured resin layer (the pencil hardness specified by JIS K5600-5-4 (1999)) is preferably F or more, more preferably H or more. When the pencil hardness of the upper limit is too high, the flexibility described later is deteriorated, so it is preferably 3H or less, and particularly preferably 2H or less.

上述硬化樹脂層較佳為熱硬化樹脂層或活性能量線硬化樹脂層,特佳為活性能量線硬化樹脂層。就活性能量線硬化樹脂層而言,較佳為紫外線硬化樹脂層。 The hardened resin layer is preferably a thermosetting resin layer or an active energy ray-curable resin layer, and particularly preferably an active energy ray-curable resin layer. The active energy ray-curable resin layer is preferably an ultraviolet-curable resin layer.

又,硬化樹脂層較佳含有粒子。再者,硬化樹脂層較佳為於其表面具有粒子所產生的微小突起。藉此,可提升阻氣性薄膜的滑動性或抗黏連性。 Further, the cured resin layer preferably contains particles. Further, the hardened resin layer preferably has minute projections generated by particles on its surface. Thereby, the slidability or blocking resistance of the gas barrier film can be improved.

基於確保高透明性同時提升滑動性之觀點,而在阻氣性薄膜設置含有粒子的硬化樹脂層時,較佳為含有平均粒徑遠小於硬化樹脂層的厚度的粒子,而於硬化樹脂層表面形成該粒子所產生的突起。例如,硬化樹脂層所含粒子之平均粒徑(r:μm)與硬化樹脂層的厚度(d:μm)的比率(r/d)較佳為0.7以下,更佳為0.5以下,特佳為0.3以下。下限比率過小的話,無法獲得良好的滑動性,故較佳為0.01以上,更佳為0.02以上,特佳為0.03以上。 From the viewpoint of ensuring high transparency and improving slidability, when the gas barrier film is provided with a hardened resin layer containing particles, it is preferred to contain particles having an average particle diameter much smaller than the thickness of the cured resin layer, and on the surface of the cured resin layer. The protrusions generated by the particles are formed. For example, the ratio (r/d) of the average particle diameter (r: μm) of the particles contained in the cured resin layer to the thickness (d: μm) of the cured resin layer is preferably 0.7 or less, more preferably 0.5 or less, and particularly preferably 0.3 or less. When the lower limit ratio is too small, good slidability cannot be obtained, so it is preferably 0.01 or more, more preferably 0.02 or more, and particularly preferably 0.03 or more.

對於積層有硬化樹脂層的阻氣性薄膜,基於確保高可撓性之觀點,亦宜為依據圓筒形心軸法(JIS K5600-5-1:1999),將阻氣性薄膜以硬化樹脂層成外側的方式捲繞於直徑2mm的圓筒心軸時(以阻氣性薄膜之阻氣層與圓筒形心軸接觸的方式捲繞時),其捲繞部分之硬化樹脂層未產生裂痕。 For a gas barrier film in which a hardened resin layer is laminated, it is also preferable to use a gas barrier film as a hardening resin in accordance with a cylindrical mandrel method (JIS K5600-5-1:1999) based on the viewpoint of ensuring high flexibility. When the layer is wound on the outer side of the cylindrical mandrel having a diameter of 2 mm (when the gas barrier layer of the gas barrier film is wound in contact with the cylindrical mandrel), the hardened resin layer of the wound portion is not produced. crack.

諸如上述,基於對硬化樹脂層賦予高可撓性之觀點,硬化樹脂層之藉由奈米壓痕法所測得的推壓硬度較佳為200~600N/mm2的範圍,更佳為250~550N/mm2的範圍,特佳為300~500N/mm2的範圍。 For example, the pressing hardness measured by the nanoindentation method of the cured resin layer is preferably in the range of 200 to 600 N/mm 2 , more preferably 250 to 250, based on the viewpoint of imparting high flexibility to the cured resin layer. range of 550N / mm 2, and particularly preferably in a range of 300 ~ 500N / mm 2 of.

由上述觀點而言,作為硬化樹脂層之樹脂成分,較佳使用胺基甲酸酯系樹脂。亦即,硬化樹脂層較佳為含有胺基甲酸酯系樹脂(胺基甲酸酯(甲基)丙烯酸酯單體或寡聚物)的活性能量線硬化樹脂層。作為上述胺基甲酸酯系樹脂,較佳為1~5官能之胺基甲酸酯系樹脂,更佳為1~4官能之胺基甲酸酯系樹脂,特佳為1~3官能之胺基甲酸酯樹脂。 From the above viewpoints, as the resin component of the cured resin layer, a urethane-based resin is preferably used. That is, the cured resin layer is preferably an active energy ray-curable resin layer containing a urethane-based resin (urethane (meth) acrylate monomer or oligomer). The urethane-based resin is preferably a 1-5-functional urethane-based resin, more preferably a 1-4-functional urethane-based resin, and particularly preferably a 1-3 functional group. A urethane resin.

硬化樹脂層的厚度,基於確保良好的可撓性之觀點及抑制阻氣性薄膜的捲曲之觀點,較佳為小於4μm,更佳為小於3μm,特佳為小於2μm。基於賦予良好的滑動性之觀點,下限厚度較佳為0.3μm以上,更佳為0.5μm以上,特佳為0.7μm以上。 The thickness of the cured resin layer is preferably less than 4 μm, more preferably less than 3 μm, and particularly preferably less than 2 μm from the viewpoint of ensuring good flexibility and suppressing curl of the gas barrier film. The lower limit thickness is preferably 0.3 μm or more, more preferably 0.5 μm or more, and particularly preferably 0.7 μm or more, from the viewpoint of imparting good slidability.

硬化樹脂層所含有之粒子的平均粒徑(r)較佳為0.02~0.5μm的範圍,更佳為0.03~0.4μm的範圍,特佳為0.04~0.2μm的範圍。 The average particle diameter (r) of the particles contained in the cured resin layer is preferably in the range of 0.02 to 0.5 μm, more preferably in the range of 0.03 to 0.4 μm, and particularly preferably in the range of 0.04 to 0.2 μm.

硬化樹脂層所含有之粒子的平均粒徑(r)若小於0.02μm,無法獲得良好的滑動性;另一方面,平均粒徑(r)若大於0.5μm,則霧度值會變大而使透明性降低。 When the average particle diameter (r) of the particles contained in the cured resin layer is less than 0.02 μm, good slidability cannot be obtained. On the other hand, if the average particle diameter (r) is more than 0.5 μm, the haze value is increased. The transparency is reduced.

硬化樹脂層所含有之粒子的含量,基於確保高透明性同時提升滑動性之觀點,相對於100質量%之硬化樹脂層的固體含量總量,較佳為2~40質量%的範圍,更佳為3~30質量%的範圍,特佳為5~20質量%的範圍。 The content of the particles contained in the cured resin layer is preferably in the range of 2 to 40% by mass, more preferably in the range of 2 to 40% by mass based on 100% by mass of the total solid content of the cured resin layer, from the viewpoint of ensuring high transparency and improving slidability. It is in the range of 3 to 30% by mass, and particularly preferably in the range of 5 to 20% by mass.

作為硬化樹脂層所含有之粒子,可舉出有機粒子或無機粒子。 Examples of the particles contained in the cured resin layer include organic particles or inorganic particles.

作為構成有機粒子的樹脂,可舉出丙烯酸系樹脂、苯乙烯系樹脂、聚酯系樹脂、聚胺基甲酸酯系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚矽氧系樹脂、氟系樹脂、或者用於上述樹脂之合成的2種以上之單體的共聚樹脂。此等當中,較佳為使用丙烯酸系樹脂粒子。 Examples of the resin constituting the organic particles include an acrylic resin, a styrene resin, a polyester resin, a polyurethane resin, a polycarbonate resin, a polyamide resin, and a polyoxyn resin. A fluorine-based resin or a copolymer resin of two or more kinds of monomers used for the synthesis of the above resins. Among these, acrylic resin particles are preferably used.

作為丙烯酸系樹脂粒子,可舉出丙烯酸樹脂粒子、甲基丙烯酸樹脂粒子、丙烯酸單體或者甲基丙烯酸單體與其他單體,例如苯乙烯、胺基甲酸酯丙烯酸酯、胺基甲酸酯甲基丙烯酸酯、聚酯丙烯酸酯、聚酯甲基丙烯酸酯、聚矽氧丙烯酸酯、聚矽氧甲基丙烯酸酯等之共聚樹脂粒子。 Examples of the acrylic resin particles include acrylic resin particles, methacrylic resin particles, acrylic monomers or methacrylic monomers and other monomers such as styrene, urethane acrylate, and urethane. Copolymer resin particles such as methacrylate, polyester acrylate, polyester methacrylate, polyoxy acrylate, polyfluorene methacrylate, and the like.

此等有機粒子較佳為藉由乳化聚合法來合成。透過以乳化聚合法來合成,可獲得平均粒徑為0.5μm以下的有機粒子。 These organic particles are preferably synthesized by an emulsion polymerization method. By synthesizing by an emulsion polymerization method, organic particles having an average particle diameter of 0.5 μm or less can be obtained.

作為無機粒子,可舉出二氧化矽、氧化鈦、氧化鋁、氧化鋯、碳酸鈣、沸石等的無機粒子。此等當中,較佳為二氧化矽粒子,特佳為膠體二氧化矽或氣相法二氧化矽(亦稱乾式二氧化矽或發煙二氧化矽)。 Examples of the inorganic particles include inorganic particles such as cerium oxide, titanium oxide, aluminum oxide, zirconium oxide, calcium carbonate, and zeolite. Among these, cerium oxide particles are preferred, and colloidal cerium oxide or fumed cerium oxide (also known as dry cerium oxide or fumed cerium oxide) is particularly preferred.

無機粒子,如二氧化矽粒子較佳為以有機化合物進行改性(表面處理)。藉由將無機粒子以有機化合物進行表面處理,可使粒子大量地局部存在(浮起)於硬化樹脂層的表面側(環狀烯烴樹脂薄膜之相反側)。藉此,能以較少的粒子含量賦予高滑動性。 The inorganic particles, such as cerium oxide particles, are preferably modified with an organic compound (surface treatment). By surface-treating the inorganic particles with an organic compound, the particles can be locally present in a large amount (floating) on the surface side of the cured resin layer (opposite side of the cyclic olefin resin film). Thereby, high slidability can be imparted with a small particle content.

作為使用於無機粒子之改性(表面處理)的有機化合物,可舉出下述通式(1)~(3),可單獨或者組合使用此等有機化合物;CnF2n+1-(CH2)m-Si(Q)3…通式(1) Examples of the organic compound used for the modification (surface treatment) of the inorganic particles include the following general formulae (1) to (3), and these organic compounds can be used singly or in combination; C n F 2n+1 -(CH) 2 ) m -Si(Q) 3 ... general formula (1)

(通式(1)中,n表示1~10之整數,m表示1~5之整數;Q表示碳數1~5之烷氧基或鹵素原子)。 (In the formula (1), n represents an integer of 1 to 10, m represents an integer of 1 to 5; and Q represents an alkoxy group having 1 to 5 carbon atoms or a halogen atom).

B-R4-SiR5 n(OR6)3-n…通式(2) BR 4 -SiR 5 n (OR 6 ) 3-n ... Formula (2)

D-R7-Rf2…通式(3) DR 7 -Rf 2 ...general (3)

(通式(2)及(3)中,B及D各自獨立地表示反應性部位,R4及R7各自獨立地表示碳數1至3之伸烷基、或者由前述伸烷基所衍生之酯結構,R5及R6各自獨立地表示氫或者碳數為1至4之烷基,Rf2表示氟烷基,n表示0至2之整數)。 (In the general formulae (2) and (3), B and D each independently represent a reactive moiety, and R 4 and R 7 each independently represent an alkylene group having 1 to 3 carbon atoms or derived from the aforementioned alkylene group. The ester structure, R 5 and R 6 each independently represent hydrogen or an alkyl group having 1 to 4 carbon atoms, Rf 2 represents a fluoroalkyl group, and n represents an integer of 0 to 2.

作為通式(1)之化合物,具體而言可例示下述之化合物:C4F9CH2CH2Si(OCH3)3 Specific examples of the compound of the formula (1) include the following compounds: C 4 F 9 CH 2 CH 2 Si(OCH 3 ) 3

C6F13CH2CH2Si(OCH3)3 C 6 F 13 CH 2 CH 2 Si(OCH 3 ) 3

C8F17CH2CH2Si(OCH3)3 C 8 F 17 CH 2 CH 2 Si(OCH 3 ) 3

C6F13CH2CH2CH2Si(OCH3)3 C 6 F 13 CH 2 CH 2 CH 2 Si(OCH 3 ) 3

C6F13CH2CH2CH2CH2Si(OCH3)3 C 6 F 13 CH 2 CH 2 CH 2 CH 2 Si(OCH 3 ) 3

C6F13CH2CH2Si(OC2H5)3 C 6 F 13 CH 2 CH 2 Si(OC 2 H 5 ) 3

C8F17CH2CH2CH2Si(OC2H5)3 C 8 F 17 CH 2 CH 2 CH 2 Si(OC 2 H 5 ) 3

C6F13CH2CH2CH2CH2Si(OC2H5)3 C 6 F 13 CH 2 CH 2 CH 2 CH 2 Si(OC 2 H 5 ) 3

C6F13CH2CH2SiCl3 C 6 F 13 CH 2 CH 2 SiCl 3

C6F13CH2CH2SiBr3 C 6 F 13 CH 2 CH 2 SiBr 3

C6F13CH2CH2CH2SiCl3 C 6 F 13 CH 2 CH 2 CH 2 SiCl 3

C6F13CH2CH2Si(OCH3)Cl2C 6 F 13 CH 2 CH 2 Si(OCH 3 )Cl 2 .

作為通式(2)的具體例,可舉出丙烯醯氧乙基三甲氧基矽烷、丙烯醯氧丙基三甲氧基矽烷、丙烯醯氧丁基三甲氧基矽烷、丙烯醯氧戊基三甲氧基矽烷、丙烯醯氧己基三甲氧基矽烷、丙烯醯氧庚基三甲氧基矽烷、甲基丙烯醯氧乙基三甲氧基矽烷、甲基丙烯醯氧丙基三甲氧基矽烷、甲基丙烯醯氧丁基三甲氧基矽烷、甲基丙烯醯氧己基三甲氧基矽烷、甲基丙烯醯氧庚基三甲氧基矽烷、甲基丙烯醯氧丙基甲基二甲氧基矽烷、甲基丙烯醯氧丙基甲基二甲氧基矽烷及包含此等化合物中之甲氧基經其他的烷氧基及羥基取代的化合物者等。 Specific examples of the general formula (2) include propylene oxime oxyethyl trimethoxy decane, propylene oxypropyl trimethoxy decane, propylene oxybutyl trimethoxy decane, and propylene oxiranyl trimethoxy hydride. Base alkane, propylene oxyhexyl trimethoxy decane, propylene oxiranyl heptyl trimethoxy decane, methacryl oxiranyl trimethoxy decane, methacryl oxiranyl trimethoxy decane, methacryl oxime Oxybutyl butyl trimethoxy decane, methacryl oxiranyl trimethoxy decane, methacryl oxiranyl trimethoxy decane, methacryl oxiranyl methyl dimethoxy decane, methacryl oxime Oxypropylmethyldimethoxydecane and a compound containing a methoxy group in these compounds substituted with another alkoxy group and a hydroxyl group.

作為通式(3)的具體例,可舉出2,2,2-三氟乙基丙烯酸酯、2,2,3,3,3-五氟丙基丙烯酸酯、2-全氟丁基乙基丙烯酸酯、3-全氟丁基-2-羥丙基丙烯酸酯、2-全氟己基乙基丙烯酸酯、3-全氟己基-2-羥丙基丙烯酸酯、2- 全氟辛基乙基丙烯酸酯、3-全氟辛基-2-羥丙基丙烯酸酯、2-全氟癸基乙基丙烯酸酯、2-全氟-3-甲基丁基乙基丙烯酸酯、3-全氟-3-甲氧基丁基-2-羥丙基丙烯酸酯、2-全氟-5-甲基己基乙基丙烯酸酯、3-全氟-5-甲基己基-2-羥丙基丙烯酸酯、2-全氟-7-甲基辛基-2-羥丙基丙烯酸酯、四氟丙基丙烯酸酯、八氟戊基丙烯酸酯、十二氟庚基丙烯酸酯、十六氟壬基丙烯酸酯、六氟丁基丙烯酸酯、2,2,2-三氟乙基甲基丙烯酸酯、2,2,3,3,3-五氟丙基甲基丙烯酸酯、2-全氟丁基乙基甲基丙烯酸酯、3-全氟丁基-2-羥丙基甲基丙烯酸酯、2-全氟辛基乙基甲基丙烯酸酯、3-全氟辛基-2-羥丙基甲基丙烯酸酯、2-全氟癸基乙基甲基丙烯酸酯、2-全氟-3-甲基丁基乙基甲基丙烯酸酯、3-全氟-3-甲基丁基-2-羥丙基甲基丙烯酸酯、2-全氟-5-甲基己基乙基甲基丙烯酸酯、3-全氟-5-甲基己基-2-羥丙基甲基丙烯酸酯、2-全氟-7-甲基辛基乙基甲基丙烯酸酯、3-全氟-7-甲基辛基乙基甲基丙烯酸酯、四氟丙基甲基丙烯酸酯、八氟戊基甲基丙烯酸酯、八氟戊基甲基丙烯酸酯、十二氟庚基甲基丙烯酸酯、十六氟壬基甲基丙烯酸酯、1-三氟甲基三氟乙基甲基丙烯酸酯、六氟丁基甲基丙烯酸酯等。 Specific examples of the general formula (3) include 2,2,2-trifluoroethyl acrylate, 2,2,3,3,3-pentafluoropropyl acrylate, and 2-perfluorobutyl B. Acrylate, 3-perfluorobutyl-2-hydroxypropyl acrylate, 2-perfluorohexylethyl acrylate, 3-perfluorohexyl-2-hydroxypropyl acrylate, 2-perfluorooctyl Acrylate, 3-perfluorooctyl-2-hydroxypropyl acrylate, 2-perfluorodecylethyl acrylate, 2-perfluoro-3-methylbutylethyl acrylate, 3-perfluoro 3-methoxybutyl-2-hydroxypropyl acrylate, 2-perfluoro-5-methylhexylethyl acrylate, 3-perfluoro-5-methylhexyl-2-hydroxypropyl acrylate , 2-perfluoro-7-methyloctyl-2-hydroxypropyl acrylate, tetrafluoropropyl acrylate, octafluoropentyl acrylate, dodecafluoroheptyl acrylate, hexadecafluorodecyl acrylate , hexafluorobutyl acrylate, 2,2,2-trifluoroethyl methacrylate, 2,2,3,3,3-pentafluoropropyl methacrylate, 2-perfluorobutylethyl Methacrylate, 3-perfluorobutyl-2-hydroxypropyl methacrylate, 2-perfluorooctylethyl methacrylate, 3-perfluorooctyl-2-hydroxypropylmethyl Oleate, 2-perfluorodecylethyl methacrylate, 2-perfluoro-3-methylbutylethyl methacrylate, 3-perfluoro-3-methylbutyl-2-hydroxyl Propyl methacrylate, 2-perfluoro-5-methylhexylethyl methacrylate, 3-perfluoro-5-methylhexyl-2-hydroxypropyl methacrylate, 2-perfluoro- 7-Methyloctylethyl methacrylate, 3-perfluoro-7-methyloctylethyl methacrylate, tetrafluoropropyl methacrylate, octafluoropentyl methacrylate, eight Fluoryl methacrylate, dodecafluoroheptyl methacrylate, hexadecafluorodecyl methacrylate, 1-trifluoromethyltrifluoroethyl methacrylate, hexafluorobutyl methacrylate, etc. .

就硬化樹脂層而言,基於確保高透明性同時提升滑動性之觀點,硬化樹脂層表面之藉由原子力顯微鏡(AFM)所測得的表面粗糙度(Ra)較佳為2.0nm以上10.0nm以下。硬化樹脂層的表面粗糙度(Ra)若小於2.0nm,滑動性會降低。又,表面粗糙度(Ra)若超過 10.0nm,則透明性會降低。由上述觀點而言,硬化樹脂層表面之藉由原子力顯微鏡(AFM)所測得的表面粗糙度(Ra)更佳為2.5nm以上7.0nm以下,特佳為3.0nm以上6.0nm以下。 The surface roughness (Ra) measured by atomic force microscopy (AFM) on the surface of the cured resin layer is preferably 2.0 nm or more and 10.0 nm or less from the viewpoint of ensuring high transparency and improving slidability. . When the surface roughness (Ra) of the cured resin layer is less than 2.0 nm, the slidability is lowered. Further, when the surface roughness (Ra) exceeds 10.0 nm, the transparency is lowered. From the above viewpoints, the surface roughness (Ra) measured by atomic force microscopy (AFM) on the surface of the cured resin layer is more preferably 2.5 nm or more and 7.0 nm or less, and particularly preferably 3.0 nm or more and 6.0 nm or less.

[密封黏著劑層] [Sealing Adhesive Layer]

將本發明之阻氣性薄膜應用於後述之有機EL裝置時,本發明之阻氣性薄膜較佳為隔著密封黏著劑層貼合於有機EL元件。亦即,本發明之阻氣性薄膜,較佳為在阻氣層的面積層密封黏著劑層。 When the gas barrier film of the present invention is applied to an organic EL device to be described later, the gas barrier film of the present invention is preferably bonded to the organic EL device via a sealing adhesive layer. That is, in the gas barrier film of the present invention, it is preferred to seal the adhesive layer in the area layer of the gas barrier layer.

密封黏著劑層較佳為含有選自包含聚異丁烯、丁基橡膠、聚異戊二烯、苯乙烯-異丁烯改性樹脂、苯乙烯-異戊二烯-苯乙烯嵌段共聚物、苯乙烯-丁二烯-苯乙烯嵌段共聚物、苯乙烯-異戊二烯橡膠、聚丁二烯橡膠、苯乙烯-丁二烯橡膠、及聚丁烯之群組的至少1種樹脂作為密封樹脂。此等當中,更佳為包含聚異丁烯或丁基橡膠。 The sealing adhesive layer preferably contains a polymer selected from the group consisting of polyisobutylene, butyl rubber, polyisoprene, styrene-isobutylene modified resin, styrene-isoprene-styrene block copolymer, styrene- At least one resin of a group of a butadiene-styrene block copolymer, a styrene-isoprene rubber, a polybutadiene rubber, a styrene-butadiene rubber, and a polybutene is used as a sealing resin. Among these, it is more preferable to contain polyisobutylene or butyl rubber.

密封黏著劑層較佳為進一步含有增黏樹脂。作為所述增黏樹脂,可舉出例如脂環族系石油樹脂、脂環族系氫化石油樹脂、芳香族系石油樹脂、及松香系樹脂。此等增黏樹脂當中,較佳為脂環族系石油樹脂,而且脂環族系氫化石油樹脂當中,較佳為氫化萜烯系樹脂、氫化酯系樹脂、C5系石油樹脂之氫化樹脂、C9系石油樹脂之氫化樹脂。 The sealing adhesive layer preferably further contains a tackifying resin. Examples of the tackifier resin include an alicyclic petroleum resin, an alicyclic hydrogenated petroleum resin, an aromatic petroleum resin, and a rosin-based resin. Among these tackifier resins, preferred are alicyclic petroleum resins, and among the alicyclic hydrogenated petroleum resins, hydrogenated terpene resins, hydrogenated ester resins, hydrogenated resins of C5 petroleum resins, and C9 are preferred. A hydrogenated resin of petroleum resin.

密封樹脂與增黏樹脂的質量比(密封樹脂/增黏樹脂)較佳為10/90~100/0,更佳為20/80~90/10。 The mass ratio of the sealing resin to the tackifying resin (sealing resin/tackifying resin) is preferably from 10/90 to 100/0, more preferably from 20/80 to 90/10.

又,密封黏著劑層可進一步含有紫外線吸收劑、抗氧化劑、抗靜電劑、塑化劑、填充劑、耐燃劑、交聯劑、及防鏽劑等。 Further, the sealing adhesive layer may further contain an ultraviolet absorber, an antioxidant, an antistatic agent, a plasticizer, a filler, a flame retardant, a crosslinking agent, and a rust preventive agent.

密封黏著劑層的厚度較佳為5~150μm的範圍,更佳為10~100μm的範圍,特佳為20~80μm的範圍。又,密封黏著劑層係其水蒸氣穿透率較佳為40g/m2/day以下,更佳為30g/m2/day以下,特佳為20g/m2/day以下。 The thickness of the sealing adhesive layer is preferably in the range of 5 to 150 μm, more preferably in the range of 10 to 100 μm, and particularly preferably in the range of 20 to 80 μm. Further, the sealing adhesive layer preferably has a water vapor permeability of 40 g/m 2 /day or less, more preferably 30 g/m 2 /day or less, and particularly preferably 20 g/m 2 /day or less.

密封黏著劑層可藉由塗布於阻氣性薄膜之阻氣層上而形成,亦可對離型薄膜塗布密封黏著劑層後,再貼合密封黏著劑層的面與阻氣性薄膜的阻氣層的面。 The sealing adhesive layer can be formed by coating on the gas barrier layer of the gas barrier film, and the sealing adhesive layer can be applied to the release film, and then the surface of the sealing adhesive layer and the gas barrier film can be bonded. The face of the gas layer.

[阻氣性薄膜的應用例] [Application examples of gas barrier film]

本發明之阻氣性薄膜可適用於醫藥品等的包裝材、有機EL照明、有機EL裝置、太陽能電池等的電子裝置。 The gas barrier film of the present invention can be suitably used for packaging materials such as pharmaceuticals, organic EL illumination, organic EL devices, and electronic devices such as solar cells.

尤其是,由於本發明之阻氣性薄膜具有高可撓性,而適用於可撓(可彎折或者可折疊)的有機EL裝置。又,本發明之阻氣性薄膜係適合當作為相位差薄膜(λ/4板)。 In particular, since the gas barrier film of the present invention has high flexibility, it is suitable for a flexible (bendable or foldable) organic EL device. Further, the gas barrier film of the present invention is suitable as a retardation film (λ/4 plate).

作為可撓性有機EL裝置,可舉出例如折疊式顯示器(可折疊之顯示器)、彎折式顯示器(可彎折之顯示器)及捲軸顯示器(可捲繞之顯示器)等的可撓性顯示器。本發明之阻氣性薄膜係適用於如上述之可撓性顯示器。 Examples of the flexible organic EL device include flexible displays such as a foldable display (foldable display), a bent display (a bendable display), and a reel display (a rollable display). The gas barrier film of the present invention is suitable for use in a flexible display as described above.

阻氣性薄膜,在應用於有機EL裝置等時係切成既定的大小。此時,在阻氣層之切斷部有時會產生 微小裂痕。縱然僅於切成既定大小的阻氣性薄膜之切片的阻氣層之切斷部產生微小裂痕,一般而言,阻氣性能也不會有問題。然而,在將阻氣層之切斷部產生微小裂痕的切片應用於可撓性顯示器的情況下,將可撓性顯示器彎折或折疊時,存在於切片的阻氣層之切斷部的微小裂痕會朝中央方向延伸而使阻氣性降低。 The gas barrier film is cut into a predetermined size when applied to an organic EL device or the like. At this time, minute cracks may occur in the cut portion of the gas barrier layer. Even if a crack is generated only in the cut portion of the gas barrier layer cut into a slice of the gas barrier film of a predetermined size, generally, the gas barrier performance is not problematic. However, when a slice having a micro crack in the cut portion of the gas barrier layer is applied to a flexible display, when the flexible display is bent or folded, it is present in the cut portion of the gas barrier layer of the slice. The crack will extend in the center direction to lower the gas barrier properties.

本發明之阻氣性薄膜的無機膜,於切斷時不會產生裂痕,或者即使產生裂痕亦極微小或為極少數。此種本發明之阻氣性薄膜的切片,應用於可撓性有機EL裝置而經彎折或折疊時,仍可抑制阻氣性的降低。 The inorganic film of the gas barrier film of the present invention does not cause cracks at the time of cutting, or is extremely small or extremely rare even if cracks are generated. When the slice of the gas barrier film of the present invention is applied to a flexible organic EL device and is bent or folded, the decrease in gas barrier properties can be suppressed.

亦即,本發明之阻氣性薄膜的切片係適用於可撓性有機EL裝置,例如可撓性有機EL顯示器。尤其適用於折疊式有機EL顯示器或彎折式有機EL顯示器。 That is, the chip of the gas barrier film of the present invention is suitable for a flexible organic EL device such as a flexible organic EL display. Especially suitable for folding organic EL displays or bent organic EL displays.

本發明之有機EL裝置係具備本發明之阻氣性薄膜。 The organic EL device of the present invention comprises the gas barrier film of the present invention.

圖1為具備本發明之阻氣性薄膜(切片)之有機EL裝置的一例的示意剖面圖。惟,本發明不限定於此。有機EL裝置100係於背面基板101(聚醯亞胺基板)具有有機EL元件102。有機EL元件102係隔著密封黏著劑層103而由阻氣性薄膜104被覆。 Fig. 1 is a schematic cross-sectional view showing an example of an organic EL device including a gas barrier film (slice) of the present invention. However, the invention is not limited thereto. The organic EL device 100 has an organic EL element 102 on a back substrate 101 (polyimine substrate). The organic EL element 102 is covered with the gas barrier film 104 via the sealing adhesive layer 103.

阻氣性薄膜104上積層有光學薄膜105(偏光薄膜、相位差薄膜、觸控面板等),進一步於其上積層有表面保護薄膜106(硬塗膜、抗反射膜等)。當光學薄膜105兼具表面保護機能時,可省略表面保護薄膜106。 An optical film 105 (a polarizing film, a retardation film, a touch panel, or the like) is laminated on the gas barrier film 104, and a surface protective film 106 (a hard coat film, an antireflection film, or the like) is further laminated thereon. When the optical film 105 has both surface protection functions, the surface protection film 106 can be omitted.

[阻氣性薄膜的切片] [Slice of gas barrier film]

諸如上述,本發明之阻氣性薄膜的切片(以下有單稱為「切片」)係具有即使經過彎折或折疊,水蒸氣穿透率也不會增大之特徵。具體而言,切片之折疊試驗後的水蒸氣穿透率係與折疊試驗前同樣地,較佳為小於5.0×10-3g/m2/day,更佳為小於3.0×10-3g/m2/day,特佳為小於1.0×10-3g/m2/day。折疊試驗的細節係於後述。 As described above, the slice of the gas barrier film of the present invention (hereinafter simply referred to as "slice") has a feature that the water vapor permeability does not increase even if it is bent or folded. Specifically, the water vapor permeability after the folding test of the slice is preferably less than 5.0 × 10 -3 g / m 2 /day, more preferably less than 3.0 × 10 -3 g / as in the case of the folding test. m 2 /day, particularly preferably less than 1.0 × 10 -3 g / m 2 /day. The details of the folding test are described later.

本發明之阻氣性薄膜的切片較佳為在阻氣層之切斷部實質上不存在微小裂痕。藉此,可抑制切片之折疊試驗後的水蒸氣穿透率的增大,而能夠使切片之折疊試驗後的水蒸氣穿透率成為上述範圍。 The slice of the gas barrier film of the present invention preferably has substantially no microscopic cracks in the cut portion of the gas barrier layer. Thereby, the increase in the water vapor permeability after the folding test of the slice can be suppressed, and the water vapor permeability after the folding test of the slice can be made into the above range.

於此,微小裂痕係指長度為30μm以上的裂痕。又,所稱在阻氣層之切斷部實質上不存在微小裂痕,係指使用數位顯微鏡(KEYENCE(股)製之「VHX-1000」),以倍率200倍,針對切片之切斷部(例如當切片為矩形時,為其四邊),以約略10mm的間隔進行觀察,切斷部長度每200mm之微小裂痕的個數小於50個之意。上述微小裂痕之測定方法之微小裂痕的個數較佳為小於30(個/切斷部長度200mm),更佳為小於10(個/切斷部長度200mm),特佳為0(個/切斷部長度200mm)。 Here, the microcrack means a crack having a length of 30 μm or more. In addition, it is said that there is substantially no micro-crack in the cut portion of the gas barrier layer, and it is a cut-off portion for the slice at a magnification of 200 times using a digital microscope ("VHX-1000" manufactured by KEYENCE Co., Ltd.). For example, when the slice is a rectangle, the four sides thereof are observed at intervals of about 10 mm, and the number of minute cracks per 200 mm of the length of the cut portion is less than 50. The number of the micro cracks in the method for measuring the micro cracks is preferably less than 30 (the length of the cut portion is 200 mm), more preferably less than 10 (the length of the cut portion is 200 mm), and particularly preferably 0 (cut/cut) The length of the broken part is 200mm).

根據本發明之阻氣性薄膜之構成,亦即根據在環狀烯烴樹脂薄膜直接具有阻氣層,且此阻氣層由包含氧化鋅、二氧化矽及氧化鋁的無機膜之單一膜所構成之構成,可抑制切斷時微小裂痕的產生。 The gas barrier film according to the present invention has a gas barrier layer directly composed of a single film of an inorganic film containing zinc oxide, cerium oxide and aluminum oxide. With this configuration, it is possible to suppress the occurrence of minute cracks during cutting.

[實施例]  [Examples]  

以下,基於實施例具體地說明本發明。惟,本發明不受下述實施例所限定。 Hereinafter, the present invention will be specifically described based on examples. However, the invention is not limited by the following examples.

[評定方法]  [Assessment method]  

首先,茲說明各實施例及比較例中的評定方法。評定n數,除非特別說明,否則設n=5並求取其平均值。 First, the evaluation methods in the respective examples and comparative examples will be described. The number of n is evaluated, and unless otherwise specified, n=5 is set and the average value is obtained.

(1)阻氣性薄膜之阻氣層之可撓性(A)的評定 (1) Evaluation of the flexibility (A) of the gas barrier layer of the gas barrier film

依據圓筒形心軸法(JIS K5600-5-1:1999),以阻氣性薄膜的阻氣層成外側的方式予以捲繞於直徑2mm的圓筒形心軸,以目視觀察其捲繞部分之阻氣層是否產生裂痕,依以下基準進行評定。 According to the cylindrical mandrel method (JIS K5600-5-1:1999), the gas barrier layer of the gas barrier film was wound around a cylindrical mandrel having a diameter of 2 mm so as to be visually observed to be wound. Whether or not some of the gas barrier layer is cracked is evaluated according to the following criteria.

A:看不出裂痕。 A: No cracks can be seen.

B:看出裂痕。 B: I saw the crack.

(2)阻氣性薄膜之硬化樹脂層之可撓性(B)的評定 (2) Evaluation of flexibility (B) of the cured resin layer of the gas barrier film

對設有硬化樹脂層的阻氣性薄膜,以與上述(1)同樣的方式進行評定。惟,係以阻氣性薄膜之阻氣層之相反側的面之硬化樹脂層成外側的方式予以捲繞於直徑2mm的圓筒形心軸,評定硬化樹脂層是否產生裂痕。 The gas barrier film provided with the cured resin layer was evaluated in the same manner as in the above (1). In the meantime, the hardened resin layer on the opposite side of the gas barrier layer of the gas barrier film was wound around a cylindrical mandrel having a diameter of 2 mm to evaluate whether or not the cured resin layer was cracked.

(3)硬化樹脂層之藉由奈米壓痕法的推壓硬度的測定 (3) Determination of the hardness of the hardened resin layer by the nanoindentation method

使用ELIONIX(股)製之奈米壓痕儀「ENT-2100」進行測定。將阻氣性薄膜的測定面(硬化樹脂層面)之相反面,經由接著劑(東亞合成(股)製“Aron Alpha(註冊商標)”固定於專用的試樣固定臺,並使用稜線角115°的三角錐 金剛石壓頭(Berkovich壓頭),以下述條件測定硬化樹脂層的推壓硬度(HIT(N/mm2))。測定數據係藉由「ENT-2100」之專用解析軟體(version 6.18)來處理。 The measurement was carried out using a nanoindenter "ENT-2100" manufactured by ELIONIX. The opposite side of the measurement surface (hardened resin layer) of the gas barrier film was fixed to a dedicated sample fixing table via an adhesive (Aron Alpha (registered trademark) manufactured by Toagos Corporation, and a ridge angle of 115° was used. The triangular cone diamond indenter (Berkovich indenter) measures the pressing hardness (H IT (N/mm 2 )) of the cured resin layer under the following conditions. The measurement data is a dedicated analysis software of "ENT-2100". 6.18) to deal with.

<測定條件>  <Measurement conditions>  

‧測定模式:負載-卸載試驗 ‧ Measurement mode: load-unloading test

‧最大負載:100mN ‧Maximum load: 100mN

‧達最大負載時的保持時間:1秒 ‧ Hold time at maximum load: 1 second

‧負載速度、卸載速度:10mN/sec ‧Load speed, unloading speed: 10mN/sec

‧推壓深度:膜厚的1/10。 ‧Pushing depth: 1/10 of the film thickness.

(4)各層的厚度 (4) Thickness of each layer

使用微量取樣系統(日立製FB-2000A),藉由FIB法(具體而言,係基於「高分子表面加工學」(岩森曉著)p.118~119所記載之方法)來製作阻氣性薄膜之剖面觀察用試樣。藉由穿透型電子顯微鏡(日立製H-9000UHRII),設加速電壓為300kV,觀察剖面觀察用試樣的剖面並測定阻氣層、硬化樹脂層的厚度。 Using a micro-sampling system (Hitachi FB-2000A), the gas barrier property is produced by the FIB method (specifically, the method described in "Polymer Surface Processing" (Iwate), p. 118-119) A sample for cross-section observation of a film. The cross section of the sample for cross-section observation was observed by a transmission electron microscope (H-9000 UHRII manufactured by Hitachi Ltd.) at an acceleration voltage of 300 kV, and the thickness of the gas barrier layer and the cured resin layer was measured.

(5)硬化樹脂層所含有之粒子的平均粒徑的測定 (5) Measurement of average particle diameter of particles contained in the cured resin layer

以TEM(穿透型電子顯微鏡)觀察硬化樹脂層的剖面(約1萬~30萬倍),量測存在於此剖面照片之寬度(與硬化樹脂層的厚度方向正交之長度)1μm的所有粒子的最大長度,將此等值進行算術平均,以所得值作為粒子的平均粒徑。 The cross section (about 10,000 to 300,000 times) of the cured resin layer was observed by a TEM (transmission electron microscope), and the width of the cross-sectional photograph (the length orthogonal to the thickness direction of the cured resin layer) of 1 μm was measured. The maximum length of the particles is arithmetically averaged, and the obtained value is taken as the average particle diameter of the particles.

(6)藉由原子力顯微鏡所測得之表面粗糙度(Ra)的測定 (6) Determination of surface roughness (Ra) measured by atomic force microscopy

使用Hitachi High-Tech Science製之原子力顯微鏡「AFM5100N」,根據下述條件測定硬化樹脂層的表面粗糙度(Ra)。 The surface roughness (Ra) of the cured resin layer was measured according to the following conditions using an atomic force microscope "AFM5100N" manufactured by Hitachi High-Tech Science.

‧掃描模式:DFM ‧ Scan mode: DFM

‧掃描範圍:5μm×5μm ‧Scanning range: 5μm×5μm

‧數據數:256×256 ‧Number of data: 256×256

‧測定環境:25℃、大氣中。 ‧ Measurement environment: 25 ° C, in the atmosphere.

(7)阻氣性薄膜之水蒸氣穿透率的測定 (7) Determination of water vapor transmission rate of gas barrier film

以溫度40℃、濕度90%RH、測定面積50cm2之條件,使用英國Technolox公司製之水蒸氣穿透率測定裝置(機種名:“DELTAPERM(註冊商標)”)來進行測定。試樣數係按每1水準取2個檢體,測定次數係針對各檢體設為5次,以所得10點的平均值作為水蒸氣穿透率(g/m2/day)。 The measurement was carried out using a water vapor permeability measuring apparatus (model name: "DELTAPERM (registered trademark)") manufactured by Technolox, UK under the conditions of a temperature of 40 ° C, a humidity of 90% RH, and a measurement area of 50 cm 2 . The number of samples was taken to be two samples per level, and the number of measurements was set to five times for each sample, and the average value of the obtained ten points was used as the water vapor transmission rate (g/m 2 /day).

(8)阻氣層(無機膜)的組成分析 (8) Composition analysis of gas barrier layer (inorganic membrane)

阻氣層的組成分析(無機膜是否含有氧化鋅、二氧化矽、氧化鋁、及各元素的含有比率)係藉由X射線光電子光譜法(XPS法)來進行。亦即,藉由使用氬離子的濺鍍蝕刻,將最外表層蝕刻去除5nm左右後,測定各元素的含有比率。XPS法的測定條件如下: The composition analysis of the gas barrier layer (whether or not the inorganic film contains zinc oxide, cerium oxide, aluminum oxide, and the content ratio of each element) is carried out by X-ray photoelectron spectroscopy (XPS method). That is, the outermost layer was etched and removed by about 5 nm by sputtering using argon ions, and then the content ratio of each element was measured. The measurement conditions of the XPS method are as follows:

‧裝置:ESCA 5800(ULVAC-PHI公司製) ‧Device: ESCA 5800 (manufactured by ULVAC-PHI)

‧激發X射線:monochromatic AlKα ‧Inspire X-ray: monochromatic AlKα

‧X射線功率:300W ‧X-ray power: 300W

‧X射線徑:800μm ‧X-ray diameter: 800μm

‧光電子脫離角度:45° ‧Photoelectron detachment angle: 45°

‧Ar離子蝕刻:2.0kV、10mPa。 ‧Ar ion etching: 2.0kV, 10mPa.

(9)阻氣性薄膜之滑動性的評定 (9) Evaluation of the slidability of gas barrier film

依以下要領評定背面設有硬化樹脂層之阻氣性薄膜的滑動性。 The slidability of the gas barrier film provided with the hardened resin layer on the back side was evaluated in the following manner.

裁切阻氣性薄膜而製成2片薄片(20cm×15cm)。以2片薄片之阻氣層面與硬化樹脂層相對向的方式將2片薄片僅些微錯開地重疊並置於平滑的臺上,藉由用手指將下方的薄片固定於臺上,並用手使上方的薄片滑動的方法來進行滑動性是否良好的判定。測定環境為23℃、55%RH。 Two sheets (20 cm × 15 cm) were cut by cutting the gas barrier film. The two sheets are overlapped with a slight gap between the two gas barrier layers and the hardened resin layer, and placed on a smooth table, by fixing the lower sheet to the table with a finger, and by hand to make the upper portion The method of sliding the sheet to determine whether the slidability is good or not. The measurement environment was 23 ° C and 55% RH.

A:上方的薄片可滑動。 A: The upper sheet can slide.

B:上方的薄片無法滑動。 B: The upper sheet cannot slide.

(10)基材薄膜之遲滯量(Re550)的測定 (10) Determination of hysteresis amount of substrate film (Re550)

就基材薄膜之對波長550nm的光之面內方向的遲滯量(Re550),係使用王子計測器公司製雙折射計KOBRA-WR,藉由平行尼科耳旋轉法來測定。 The hysteresis amount (Re550) of the base film in the in-plane direction of light having a wavelength of 550 nm was measured by a parallel Nicols rotation method using a birefringence meter KOBRA-WR manufactured by Oji Scientific Co., Ltd.

(11)總透光率的測定 (11) Determination of total light transmittance

基於JIS K7361(1997),使用濁度計NDH2000(日本電色工業(股)製)來測定。 It is measured based on JIS K7361 (1997) using a turbidity meter NDH2000 (manufactured by Nippon Denshoku Industries Co., Ltd.).

(12)硬化樹脂層之鉛筆硬度的測定 (12) Determination of pencil hardness of hardened resin layer

使用鉛筆硬度試驗機HEIDON-14(新東科學(股)),依循JIS K5600-5-4(1999)來測定。 It was measured using a pencil hardness tester HEIDON-14 (New East Science Co., Ltd.) in accordance with JIS K5600-5-4 (1999).

(13)阻氣性薄膜的切片之切斷部的微小裂痕的觀察 (13) Observation of micro cracks in the cut portion of the slice of the gas barrier film

使用數位顯微鏡(KEYENCE(股)製之「VHX-1000」)以倍率200倍觀察切片四邊的阻氣層切斷部,測定長度 為30μm以上之微小裂痕的個數。針對四邊的切斷部分別以約略10mm間隔進行觀察,求出微小裂痕的合計個數,依下述式換算成切斷部長度每200mm的個數,依以下基準進行評定。 The gas barrier layer cut portion on the four sides of the slice was observed at a magnification of 200 times using a digital microscope ("VHX-1000" manufactured by KEYENCE Co., Ltd.), and the number of minute cracks having a length of 30 μm or more was measured. The cut portions of the four sides were observed at intervals of approximately 10 mm, and the total number of the micro cracks was determined, and the number of the cut portions per 200 mm was converted according to the following formula, and the evaluation was performed based on the following criteria.

切斷部每200mm的個數=合計個數/(200mm/切斷部的合計長度)…式1 The number of the cut portions per 200 mm = the total number / (200 mm / the total length of the cut portions)

(此外,本實施例中的切斷部的合計長度為640mm) (In addition, the total length of the cut portions in the present embodiment is 640 mm)

A:微小裂痕在切斷部每200mm的個數小於10個。 A: The number of micro cracks per cut of the cut portion is less than ten.

B:微小裂痕在切斷部每200mm的個數為10個以上且小於30個。 B: The number of micro cracks per 10 mm in the cut portion is 10 or more and less than 30.

C:微小裂痕在切斷部每200mm的個數為30個以上且小於50個。 C: The number of micro cracks per 30 mm in the cut portion is 30 or more and less than 50.

D:微小裂痕在切斷部每200mm的個數為50個以上且小於100個。 D: The number of micro cracks per 50 mm in the cut portion is 50 or more and less than 100.

E:微小裂痕在切斷部每200mm的個數為100個以上。 E: The number of micro cracks per 100 mm in the cut portion is 100 or more.

(14)切片之折疊試驗及折疊試驗後的水蒸氣穿透率的測定 (14) Determination of water vapor transmission rate after folding test and folding test

使用依據ASTM-D522的加德納式心軸彎曲試驗機(安田精機(股)製之「No.550加德納式心軸彎曲試驗機」),以切片的無機膜成外側的方式予以捲繞於直徑3mm的桿棒,以約1秒折疊180度。重複此操作10次。以在上述彎曲試驗中抵接於桿棒的部位略為中央的方式製作水蒸氣穿透率測定用試樣,以與上述(7)同樣的方式測定水蒸氣穿透率。 Using a Gardner type mandrel bending tester ("No. 550 Gardner type mandrel bending tester" manufactured by Yasuda Seiki Co., Ltd.) according to ASTM-D522, the sliced inorganic film was rolled outward. Wrap around a 3 mm diameter rod and fold it 180 degrees in about 1 second. Repeat this operation 10 times. A sample for measuring a water vapor permeability was prepared so that the portion abutting on the rod in the bending test was slightly centered, and the water vapor permeability was measured in the same manner as in the above (7).

[實施例1] [Example 1]

對厚度為50μm的環狀烯烴樹脂薄膜(日本ZEON(股)之「ZeonorFilm(註冊商標)」ZF14-050:遲滯量Re550=3nm;單面預先積層有PET保護薄膜)之未積層有保護薄膜的面積層包含下述之無機膜的阻氣層而製成阻氣性薄膜。無機膜的厚度係調整成130nm。 A cyclic olefin resin film having a thickness of 50 μm (Zeonor Film (registered trademark) ZF14-050 of Japan ZEON Co., Ltd.: hysteresis amount Re550=3 nm; a single-sided pre-laminated PET protective film) is not laminated with a protective film. The area layer contains a gas barrier layer of the following inorganic film to form a gas barrier film. The thickness of the inorganic film was adjusted to 130 nm.

<無機膜的積層> <Lamination of inorganic film>

使用圖2所示構造之捲繞式濺鍍‧CVD裝置1,將由氧化鋅、二氧化矽與氧化鋁所形成的混合燒結材之濺鍍靶設置於濺鍍電極12,實施使用氬氣及氧氣的濺鍍,在環狀烯烴樹脂薄膜的其中一面上積層無機膜而得到阻氣性薄膜4。 Using a wound sputter ‧ CVD apparatus 1 having the structure shown in FIG. 2, a sputtering target of a mixed sintered material composed of zinc oxide, cerium oxide and aluminum oxide is placed on the sputtering electrode 12, and argon gas and oxygen gas are used. In the sputtering, an inorganic film is laminated on one surface of the cyclic olefin resin film to obtain a gas barrier film 4.

具體的操作如下。首先,對濺鍍電極12,在設有以氧化鋅/二氧化矽/氧化鋁的組成質量比為77/20/3所燒結而成的濺鍍靶之捲繞式濺鍍‧CVD裝置1的捲繞室6中,以設置環狀烯烴樹脂薄膜的無機膜之一側的面與濺鍍電極12相對向的方式裝設於捲出軸7而捲出,並經由捲出側導輥8、9、10,通過冷卻滾筒11。以減壓度2×10-1Pa的方式,設氧氣分壓10%而導入氬氣及氧氣,藉由直流電源施加投入功率4000W,使氬氣‧氧氣電漿產生而形成無機膜。厚度係根據薄膜運送速度來調整。其後,經由捲繞側導輥13、14、15捲繞於捲繞軸16。 The specific operation is as follows. First, the sputter electrode 12 is provided with a sputter-plated CVD apparatus 1 having a sputter target sintered at a mass ratio of zinc oxide/ceria/alumina of 77/20/3. In the winding chamber 6, the surface of one side of the inorganic film provided with the annular olefin resin film is attached to the winding shaft 7 so as to face the sputtering electrode 12, and is wound up, and the winding side guide roller 8 is 9, 10, through the cooling drum 11. Argon gas and oxygen gas were introduced at a partial pressure of oxygen of 10% by a pressure of 2 × 10 -1 Pa, and an input power of 4000 W was applied by a DC power source to generate an argon gas/oxygen plasma to form an inorganic film. The thickness is adjusted according to the film transport speed. Thereafter, the winding shaft 16 is wound around the winding side guide rolls 13, 14, and 15.

就此無機膜的組成,Zn原子濃度為27.5atom%、Si原子濃度為13.1atom%、Al原子濃度為2.3atom%、O原子濃度為57.1atom%。 With respect to the composition of the inorganic film, the Zn atom concentration was 27.5 atom%, the Si atom concentration was 13.1 atom%, the Al atom concentration was 2.3 atom%, and the O atom concentration was 57.1 atom%.

[實施例2] [Embodiment 2]

除變更為厚度為23μm的環狀烯烴樹脂薄膜(日本ZEON(股)之「ZeonorFilm(註冊商標)」ZF14-023:遲滯量Re550=3nm:單面預先積層有PET保護薄膜),並將無機膜的厚度變更為50nm以外,係以與實施例1同樣的方式製作阻氣性薄膜。 In addition, it was changed to a cyclic olefin resin film having a thickness of 23 μm (Zeonor Film (registered trademark) ZF14-023 of Japan ZEON Co., Ltd.: hysteresis amount Re550=3 nm: a single-sided pre-laminated PET protective film), and an inorganic film A gas barrier film was produced in the same manner as in Example 1 except that the thickness was changed to 50 nm.

[實施例3] [Example 3]

依下述要領製作具有作為相位差薄膜(λ/4板)之機能的阻氣性薄膜。亦即,對厚度為28μm、遲滯量Re550為140nm的環狀烯烴樹脂薄膜(日本ZEON(股)之「ZeonorFilm(註冊商標)」ZM14-140:單面預先積層有PET保護薄膜)之未積層有保護薄膜的面,以與實施例1同樣的方式積層無機膜而製成阻氣性薄膜。惟,無機膜的厚度係調整成50nm。 A gas barrier film having a function as a retardation film (λ/4 plate) was produced in the following manner. In other words, a cyclic olefin resin film having a thickness of 28 μm and a hysteresis amount of Re550 of 140 nm (Zeonor Film (registered trademark) ZM14-140 of Japan ZEON Co., Ltd.: a PET protective film laminated on one side) has an unstacked layer. On the surface of the protective film, an inorganic film was laminated in the same manner as in Example 1 to form a gas barrier film. However, the thickness of the inorganic film was adjusted to 50 nm.

[比較例1] [Comparative Example 1]

對厚度為50μm的環狀烯烴樹脂薄膜(日本ZEON(股)之「ZeonorFilm(註冊商標)」ZF14-050:遲滯量Re550=3nm:單面預先積層有PET保護薄膜)之未積層有保護薄膜的面實施電暈處理,以凹版塗布機塗布下述之硬塗層用塗布液作為底塗層,以90℃乾燥後,以400mJ/cm2照射紫外線使其硬化而形成硬塗層。此硬塗層的厚度為2μm。 A 50-m thick cyclic olefin resin film (Zeonor Film (registered trademark) ZF14-050 of Japan ZEON Co., Ltd.: hysteresis amount Re550=3 nm: a single-sided pre-laminated PET protective film) The surface was subjected to a corona treatment, and the coating liquid for a hard coat layer described below was applied as a primer layer by a gravure coater, dried at 90 ° C, and then irradiated with ultraviolet rays at 400 mJ/cm 2 to be hardened to form a hard coat layer. This hard coat layer has a thickness of 2 μm.

<底塗層(硬塗層用塗布液)> <Undercoat layer (coating solution for hard coat layer)>

將含有胺基甲酸酯丙烯酸酯寡聚物的紫外線硬化性樹脂塗布液(日本合成化學(股)之「UV-1700B」),以有機溶劑(MEK)稀釋成固體含量濃度為20質量%。 The ultraviolet curable resin coating liquid containing the urethane acrylate oligomer ("Synthesis Chemical Co., Ltd." "UV-1700B") was diluted with an organic solvent (MEK) to have a solid content concentration of 20% by mass.

<阻氣層的積層> <Layer of gas barrier layer>

在上述所得之積層有硬塗層的環狀烯烴樹脂薄膜之硬塗層的面,以與實施例1同樣的方式形成無機膜而製成阻氣性薄膜。 On the surface of the hard coat layer of the cyclic olefin resin film in which the hard coat layer was laminated, the inorganic film was formed in the same manner as in Example 1 to obtain a gas barrier film.

[比較例2] [Comparative Example 2]

對厚度為50μm的環狀烯烴樹脂薄膜(日本ZEON(股)之「ZeonorFilm(註冊商標)」ZF14-050:遲滯量Re550=3nm:單面預先積層有PET保護薄膜)之未積層有保護薄膜的面,以與實施例1同樣的方式積層厚度為100nm的無機膜。其次,於此無機膜上,使用圖2所示構造之捲繞式濺鍍‧CVD裝置1實施以六甲基二矽氮烷為原料的化學氣相沉積(CVD)而積層SiO2膜。此SiO2膜的厚度為120nm。 A 50-m thick cyclic olefin resin film (Zeonor Film (registered trademark) ZF14-050 of Japan ZEON Co., Ltd.: hysteresis amount Re550=3 nm: a single-sided pre-laminated PET protective film) On the surface, an inorganic film having a thickness of 100 nm was laminated in the same manner as in Example 1. Next, on the inorganic film, a SiO 2 film was deposited by chemical vapor deposition (CVD) using hexamethyldiaziridine as a raw material by a roll-type sputtering CVD apparatus 1 having the structure shown in Fig. 2 . This SiO 2 film had a thickness of 120 nm.

[比較例3] [Comparative Example 3]

除將基材薄膜變更為厚度50μm的聚對苯二甲酸乙二酯薄膜(TORAY(股)製之「Lumirror(註冊商標)」U48)以外,係以與實施例1同樣的方式製成阻氣性薄膜。 A gas barrier was produced in the same manner as in Example 1 except that the base film was changed to a polyethylene terephthalate film ("Lumirror (registered trademark)" U48) manufactured by TORAY Co., Ltd., having a thickness of 50 μm. Film.

[比較例4] [Comparative Example 4]

除將比較例1中的基材薄膜變更為厚度50μm的聚對苯二甲酸乙二酯薄膜(TORAY(股)製之「Lumirror(註冊商標)」U48)以外,係以與比較例1同樣的方式製成阻氣性薄膜。 The same procedure as in Comparative Example 1 except that the base film in Comparative Example 1 was changed to a polyethylene terephthalate film ("Lumirror (registered trademark)" U48) manufactured by TORAY Co., Ltd., having a thickness of 50 μm. The method is to form a gas barrier film.

[比較例5] [Comparative Example 5]

對厚度為50μm的環狀烯烴樹脂薄膜(日本ZEON(股)製之「ZeonorFilm(註冊商標)」ZF14-050:遲滯量 Re550=3nm;單面預先積層有PET保護薄膜)之未積層有保護薄膜的面,使用圖2所示構造之捲繞式濺鍍‧CVD裝置1積層厚度為200nm的二氧化矽膜(SiO2膜)。 A laminated olefin resin film having a thickness of 50 μm (Zeonor Film (registered trademark) ZF14-050, manufactured by Japan ZEON Co., Ltd.: hysteresis amount Re550 = 3 nm; a single-sided pre-laminated PET protective film) On the surface, a ruthenium dioxide film (SiO 2 film) having a thickness of 200 nm was laminated using a wound sputter ‧ CVD apparatus 1 having the structure shown in FIG. 2 .

[比較例6] [Comparative Example 6]

對厚度為50μm的環狀烯烴樹脂薄膜(日本ZEON(股)製之「ZeonorFilm(註冊商標)」ZF14-050:遲滯量Re550=3nm;單面預先積層有PET保護薄膜)之未積層有保護薄膜的面,使用圖2所示構造之捲繞式濺鍍‧CVD裝置1積層厚度為200nm的氮化矽膜(SiN膜)。氮化矽膜的製作係於包含SiH4、NH3、N2的混合氣體中使電漿產生來行。 A laminated olefin resin film having a thickness of 50 μm (Zeonor Film (registered trademark) ZF14-050, manufactured by Japan ZEON Co., Ltd.: hysteresis amount Re550 = 3 nm; a single-sided pre-laminated PET protective film) On the surface, a tantalum nitride film (SiN film) having a thickness of 200 nm was laminated using a wound sputter ‧ CVD apparatus having the structure shown in FIG. The tantalum nitride film is produced by causing plasma to be generated in a mixed gas containing SiH 4 , NH 3 , and N 2 .

[評定] [assessment]

針對上述實施例及比較例中所得之阻氣性薄膜,進行前述之測定及評定。將其結果示於表1。此外,上述測定及評定係在將保護薄膜剝離的狀態下實施。 The above-described measurement and evaluation were carried out for the gas barrier films obtained in the above examples and comparative examples. The results are shown in Table 1. Further, the above measurement and evaluation were carried out in a state where the protective film was peeled off.

表中,COP係表示環狀烯烴樹脂薄膜,PET表示聚對苯二甲酸乙二酯薄膜。HC表示硬塗層。 In the table, COP represents a cyclic olefin resin film, and PET represents a polyethylene terephthalate film. HC represents a hard coat layer.

由表1可知,實施例1~3其水蒸氣穿透率、阻氣性、總透光率優良。 As is clear from Table 1, Examples 1 to 3 were excellent in water vapor permeability, gas barrier properties, and total light transmittance.

另一方面,就比較例1來說,由於在環狀烯烴樹脂薄膜與阻氣層之間配置有底塗層(硬塗層),故而阻氣層的可撓性(A)降低。 On the other hand, in Comparative Example 1, since the undercoat layer (hard coat layer) was disposed between the cyclic olefin resin film and the gas barrier layer, the flexibility (A) of the gas barrier layer was lowered.

就比較例2來說,作為阻氣層,由於係積層有本發明之薄膜的無機膜與其他的膜(SiO2膜),故而阻氣層的可撓性(A)降低。 In Comparative Example 2, as the gas barrier layer, since the inorganic film of the film of the present invention and the other film (SiO 2 film) were laminated, the flexibility (A) of the gas barrier layer was lowered.

就比較例3來說,其係在聚對苯二甲酸乙二酯薄膜(PET薄膜)直接積層本發明之薄膜的無機膜,但阻氣性(水蒸氣穿透率)差。其理由茲推測係PET薄膜,因被其平滑性比環狀烯烴樹脂薄膜更差影響到所致。又,由於係使用PET薄膜作為基材薄膜,致總透光率降低。 In Comparative Example 3, the inorganic film of the film of the present invention was directly laminated on a polyethylene terephthalate film (PET film), but the gas barrier property (water vapor transmission rate) was poor. The reason for this is presumed to be that the PET film is less affected by the smoothness than the cyclic olefin resin film. Moreover, since a PET film is used as a base film, the total light transmittance is lowered.

就比較例4來說,其係對聚對苯二甲酸乙二酯薄膜(PET薄膜),隔著底塗層(硬塗層)積層阻氣層(本發明之薄膜的無機膜),阻氣性(水蒸氣穿透率)雖良好,但阻氣層的可撓性(A)降低,而且總透光率亦降低。 In Comparative Example 4, a polyethylene terephthalate film (PET film) was laminated with a gas barrier layer (an inorganic film of the film of the present invention) via an undercoat layer (hard coat layer) to block gas. Although the properties (water vapor transmission rate) are good, the flexibility (A) of the gas barrier layer is lowered, and the total light transmittance is also lowered.

就比較例5及6來說,其為設置二氧化矽膜(SiO2膜)或氮化矽膜(SiN膜)來替代本發明之薄膜的無機膜的阻氣性薄膜,惟阻氣性、可撓性及總透光率較差。 In the case of Comparative Examples 5 and 6, it is a gas barrier film in which an inorganic film of the film of the present invention is provided instead of a ruthenium dioxide film (SiO 2 film) or a tantalum nitride film (SiN film), but gas barrier properties, Flexibility and total light transmittance are poor.

又,實施例1~3之阻氣性薄膜的切片,在阻氣層的切斷部實質上無微小裂痕的產生,可抑制折疊試驗後之水蒸氣穿透率的上昇。 Further, in the sections of the gas barrier film of Examples 1 to 3, substantially no micro-cracks were generated in the cut portion of the gas barrier layer, and the increase in the water vapor permeability after the folding test was suppressed.

另一方面,設有底塗層(硬塗層)的比較例1及4、積層本發明之薄膜的無機膜與其他的膜(SiO2膜)的比較例2、設置二氧化矽膜(SiO2膜)或氮化矽膜(SiN膜)來替代本發明之薄膜的無機膜的比較例5、6之阻氣性薄膜的切片,均在阻氣層的切斷部產生微小裂痕,折疊試驗後的水蒸氣穿透率大幅上昇。 On the other hand, Comparative Examples 1 and 4 in which an undercoat layer (hard coat layer) was provided, Comparative Example 2 in which an inorganic film of a film of the present invention was laminated and another film (SiO 2 film), and a ruthenium dioxide film (SiO) were provided. 2 film) or tantalum nitride film (SiN film) instead of the inorganic film of the film of the present invention, the gas barrier film of Comparative Examples 5 and 6 all produced micro cracks in the cut portion of the gas barrier layer, and the folding test The subsequent water vapor transmission rate has increased significantly.

[實施例11] [Example 11]

在製作實施例1之阻氣性薄膜前,剝離環狀烯烴樹脂薄膜之保護薄膜,並對此剝離面以凹版塗布機塗布下述之硬化樹脂層用塗布液a1,以90℃乾燥後,以400mJ/cm2照射紫外線使其硬化而形成硬化樹脂層。 Before the gas barrier film of Example 1 was produced, the protective film of the cyclic olefin resin film was peeled off, and the following coating liquid a1 for the cured resin layer was applied to the release surface by a gravure coater, and dried at 90 ° C. 400 mJ/cm 2 was irradiated with ultraviolet rays to be hardened to form a cured resin layer.

此硬化樹脂層的厚度為1.5μm、粒子的平均粒徑為0.08μm、粒子的平均粒徑(r:μm)與硬化樹脂層的厚度(d:μm)的比率(r/d)為0.05。又,此硬化樹脂層的鉛筆硬度為F。 The thickness of the cured resin layer was 1.5 μm, the average particle diameter of the particles was 0.08 μm, and the ratio (r/d) of the average particle diameter (r: μm) of the particles to the thickness (d: μm) of the cured resin layer was 0.05. Further, the hardened resin layer has a pencil hardness of F.

<硬化樹脂層用塗布液a1) <Coating liquid a1 for a resin layer)

對Aica Kogyo(股)製之紫外線硬化性塗布劑「AICAAITRON(註冊商標)」Z-850-3,以固體含量換算,相對於塗布液的總固體含量為10質量%的方式添加下述二氧化矽粒子分散液b1,以有機溶劑(MEK)稀釋而調製成固體含量濃度為20質量%的塗布液。 The following oxidizing agent was added to the AICA Kogyo Co., Ltd. UV-curable coating agent "AICAAITRON (registered trademark)" Z-850-3 in terms of solid content in a manner of 10% by mass based on the total solid content of the coating liquid. The cerium particle dispersion b1 was diluted with an organic solvent (MEK) to prepare a coating liquid having a solid content concentration of 20% by mass.

(二氧化矽粒子分散液b1) (cerium oxide particle dispersion b1)

使氣相法二氧化矽(日本AEROSIL(股)之「AEROSIL(註冊商標)」OX50)在有機溶劑(MEK)中分散而得到二氧化矽濃度為15質量%的分散液。作為分散裝置係使用珠磨機。 The vapor phase cerium oxide ("AEROSIL (registered trademark)" OX50) of AEROSIL (Japan) was dispersed in an organic solvent (MEK) to obtain a dispersion having a cerium oxide concentration of 15% by mass. A bead mill is used as the dispersing device.

其次,對300質量份的此分散液混合8質量份的氟烷基烷氧基矽烷(信越化學(股)製之「KBM7103」),以50℃加熱攪拌1小時,而得到經表面處理的二氧化矽粒子之分散液。 Next, 8 parts by mass of fluoroalkyl alkoxy decane ("KBM7103" manufactured by Shin-Etsu Chemical Co., Ltd.) was mixed with 300 parts by mass of this dispersion, and the mixture was heated and stirred at 50 ° C for 1 hour to obtain a surface-treated two. A dispersion of cerium oxide particles.

<阻氣層(無機膜)的積層> <Layer of gas barrier layer (inorganic film)>

對積層有硬化樹脂層的環狀烯烴樹脂薄膜之硬化樹脂層的面之相反面,以與實施例1同樣的方式積層阻氣層(無機膜)而製成阻氣性薄膜。 On the opposite side to the surface of the cured resin layer of the cyclic olefin resin film in which the cured resin layer was laminated, a gas barrier layer (inorganic film) was laminated in the same manner as in Example 1 to form a gas barrier film.

[實施例12] [Embodiment 12]

在製作實施例2之阻氣性薄膜前,剝離環狀烯烴樹脂薄膜之保護薄膜,並對此剝離面,以與實施例11同樣的方式積層硬化樹脂層。其次,對積層有硬化樹脂層的環狀烯烴樹脂薄膜之硬化樹脂層的面之相反面,以與實施例2同樣的方式積層阻氣層(無機膜)而製成阻氣性薄膜。 Before the gas barrier film of Example 2 was produced, the protective film of the cyclic olefin resin film was peeled off, and the cured resin layer was laminated in the same manner as in Example 11 on the release surface. Then, a gas barrier layer (inorganic film) was laminated in the same manner as in Example 2 on the opposite side to the surface of the cured resin layer of the cyclic olefin resin film in which the cured resin layer was laminated to form a gas barrier film.

[實施例13] [Example 13]

在製作實施例3之阻氣性薄膜前,剝離環狀烯烴樹脂薄膜之保護薄膜,並對此剝離面,以與實施例11同樣的方式積層硬化樹脂層。其次,對積層有硬化樹脂層的環狀烯烴樹脂薄膜之硬化樹脂層的面之相反面,以與實施例3同樣的方式積層阻氣層(無機膜)而製成阻氣性薄膜。 Before the gas barrier film of Example 3 was produced, the protective film of the cyclic olefin resin film was peeled off, and the cured resin layer was laminated in the same manner as in Example 11 on the release surface. Then, a gas barrier layer (inorganic film) was laminated in the same manner as in Example 3 on the opposite side to the surface of the cured resin layer of the cyclic olefin resin film in which the cured resin layer was laminated to form a gas barrier film.

[比較例11] [Comparative Example 11]

在製作比較例1之阻氣性薄膜前,剝離環狀烯烴樹脂薄膜之保護薄膜,並對此剝離面以凹版塗布機塗布下 述之硬化樹脂層用塗布液a2,以90℃乾燥後,以400mJ/cm2照射紫外線使其硬化而形成硬化樹脂層。 The protective film of the cyclic olefin resin film was peeled off before the production of the gas barrier film of Comparative Example 1, and the coating liquid a2 for the cured resin layer described below was applied to the release surface by a gravure coater, and dried at 90 ° C. 400 mJ/cm 2 was irradiated with ultraviolet rays to be hardened to form a cured resin layer.

此硬化樹脂層的厚度為1.5μm、粒子的平均粒徑為0.08μm、粒子的平均粒徑(r:μm)與硬化樹脂層的厚度(d:μm)的比率(r/d)為0.05。此硬化樹脂層的鉛筆硬度為H。 The thickness of the cured resin layer was 1.5 μm, the average particle diameter of the particles was 0.08 μm, and the ratio (r/d) of the average particle diameter (r: μm) of the particles to the thickness (d: μm) of the cured resin layer was 0.05. The hardened resin layer has a pencil hardness of H.

其次,對積層有硬化樹脂層的環狀烯烴樹脂薄膜之硬化樹脂層的面之相反面,以與比較例1同樣的方式依序積層硬塗層與阻氣層(無機膜)而製成阻氣性薄膜。 Then, the hard coat layer and the gas barrier layer (inorganic film) were sequentially laminated in the same manner as in Comparative Example 1 on the opposite side to the surface of the cured resin layer of the cyclic olefin resin film in which the cured resin layer was laminated. Gas film.

<硬化樹脂層用塗布液a2> <Coating liquid for hardened resin layer a2>

對含有胺基甲酸酯丙烯酸酯寡聚物的紫外線硬化性樹脂塗布液(日本合成化學(股)之「UV-1700B」),以固體含量換算,相對於塗布液的總固體含量為8質量%的方式添加上述二氧化矽粒子分散液b1,以有機溶劑(MEK)稀釋而調製成固體含量濃度為20質量%的塗布液。 The ultraviolet curable resin coating liquid containing the urethane acrylate oligomer ("UV-1700B" of Nippon Synthetic Chemical Co., Ltd.) is 8 mass based on the total solid content of the coating liquid in terms of solid content. The above-described ceria particle dispersion b1 was added in an amount of %, and diluted with an organic solvent (MEK) to prepare a coating liquid having a solid content concentration of 20% by mass.

[比較例12] [Comparative Example 12]

在製作比較例2之阻氣性薄膜前,剝離環狀烯烴樹脂薄膜之保護薄膜,並對此剝離面以凹版塗布機塗布下述之硬化樹脂層用塗布液a3,以90℃乾燥後,以400mJ/cm2照射紫外線使其硬化而形成硬化樹脂層。 Before the gas barrier film of Comparative Example 2 was produced, the protective film of the cyclic olefin resin film was peeled off, and the following coating liquid a3 for the cured resin layer was applied to the release surface by a gravure coater, and dried at 90 ° C. 400 mJ/cm 2 was irradiated with ultraviolet rays to be hardened to form a cured resin layer.

此硬化樹脂層的厚度為1.5μm。此硬化樹脂層的鉛筆硬度為H。 The thickness of this hardened resin layer was 1.5 μm. The hardened resin layer has a pencil hardness of H.

其次,對積層有硬化樹脂層的環狀烯烴樹脂薄膜之硬化樹脂層的面之相反面,以與比較例2同樣的 方式依序積層硬塗層與阻氣層(無機膜)而製成阻氣性薄膜。 Then, the hard coat layer and the gas barrier layer (inorganic film) were sequentially laminated in the same manner as in Comparative Example 2 on the opposite side to the surface of the cured resin layer of the cyclic olefin resin film in which the cured resin layer was laminated. Gas film.

<硬化樹脂層用塗布液a3> <Coating liquid for hardened resin layer a3>

將含有胺基甲酸酯丙烯酸酯寡聚物的紫外線硬化性樹脂塗布液(日本合成化學(股)之「UV-1700B」)以有機溶劑(MEK)稀釋而調製成固體含量濃度為20質量%的塗布液。 The ultraviolet curable resin coating liquid containing the urethane acrylate oligomer ("Synthesis Chemical Co., Ltd." "UV-1700B") was diluted with an organic solvent (MEK) to prepare a solid content concentration of 20% by mass. Coating solution.

[評定] [assessment]

針對上述實施例及比較例中所得之阻氣性薄膜,進行前述之測定及評定。將其結果示於表2。 The above-described measurement and evaluation were carried out for the gas barrier films obtained in the above examples and comparative examples. The results are shown in Table 2.

表中,COP係表示環狀烯烴樹脂薄膜。HC表示硬塗層。 In the table, COP represents a cyclic olefin resin film. HC represents a hard coat layer.

Claims (11)

一種阻氣性薄膜,其為在環狀烯烴樹脂薄膜的至少其中一面直接具有包含單一無機膜之阻氣層的阻氣性薄膜,其中,前述無機膜至少包含氧化鋅、二氧化矽及氧化鋁。  A gas barrier film which is a gas barrier film having a gas barrier layer containing a single inorganic film directly on at least one side of a cyclic olefin resin film, wherein the inorganic film contains at least zinc oxide, cerium oxide, and aluminum oxide .   如請求項1之阻氣性薄膜,其中,前述無機膜之藉由X射線光電子光譜法(XPS法)所測得的Zn原子濃度為20~40atom%、Si原子濃度為5~20atom%、Al原子濃度為0.5~5atom%、O原子濃度為35~70atom%。  The gas barrier film according to claim 1, wherein the inorganic film has a Zn atom concentration of 20 to 40 atom%, an atomic concentration of 5 to 20 atom%, and Al measured by X-ray photoelectron spectroscopy (XPS method). The atomic concentration is 0.5 to 5 atom%, and the O atom concentration is 35 to 70 atom%.   如請求項1或2之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜之對波長550nm的光之面內方向的遲滯量(Re550)為500nm以下。  The gas barrier film according to claim 1 or 2, wherein the cyclic olefin resin film has a retardation amount (Re550) in the in-plane direction of light having a wavelength of 550 nm of 500 nm or less.   如請求項1至3中任一項之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜具有作為相位差薄膜之機能。  The gas barrier film according to any one of claims 1 to 3, wherein the cyclic olefin resin film has a function as a retardation film.   如請求項1至4中任一項之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜的厚度小於100μm。  The gas barrier film according to any one of claims 1 to 4, wherein the cyclic olefin resin film has a thickness of less than 100 μm.   如請求項1至5中任一項之阻氣性薄膜,其中,前述無機膜的厚度為30~60nm的範圍或120~170nm的範圍。  The gas barrier film according to any one of claims 1 to 5, wherein the thickness of the inorganic film is in the range of 30 to 60 nm or in the range of 120 to 170 nm.   如請求項5或6之阻氣性薄膜,其中,前述環狀烯烴樹脂薄膜的厚度小於50μm,且前述無機膜的厚度為30~60nm的範圍。  The gas barrier film according to claim 5 or 6, wherein the cyclic olefin resin film has a thickness of less than 50 μm, and the inorganic film has a thickness of 30 to 60 nm.   如請求項1至7中任一項之阻氣性薄膜,其中,在前述環狀烯烴樹脂薄膜之具有阻氣層的面之相反面具有硬化樹脂層。  The gas barrier film according to any one of claims 1 to 7, which has a cured resin layer on a surface opposite to a surface of the cyclic olefin resin film having a gas barrier layer.   如請求項8之阻氣性薄膜,其中,前述硬化樹脂層含有粒子,該粒子的平均粒徑(r:μm)與硬化樹脂層的厚度(d:μm)的比率(r/d)為0.7以下。  The gas barrier film according to claim 8, wherein the hardened resin layer contains particles, and a ratio (r/d) of an average particle diameter (r: μm) of the particles to a thickness (d: μm) of the cured resin layer is 0.7. the following.   如請求項8或9之阻氣性薄膜,其中,前述硬化樹脂層之藉由原子力顯微鏡所測得的表面粗糙度(Ra)為2.0nm以上10.0nm以下。  The gas barrier film according to claim 8 or 9, wherein the surface roughness (Ra) of the cured resin layer measured by atomic force microscopy is 2.0 nm or more and 10.0 nm or less.   一種有機EL裝置,其係具備如請求項1至10中任一項之阻氣性薄膜。  An organic EL device comprising the gas barrier film according to any one of claims 1 to 10.  
TW106143479A 2016-12-15 2017-12-12 Gas barrier film and organic EL device TW201834850A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-242938 2016-12-15
JP2016242938 2016-12-15

Publications (1)

Publication Number Publication Date
TW201834850A true TW201834850A (en) 2018-10-01

Family

ID=62558335

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106143479A TW201834850A (en) 2016-12-15 2017-12-12 Gas barrier film and organic EL device

Country Status (3)

Country Link
JP (1) JPWO2018110272A1 (en)
TW (1) TW201834850A (en)
WO (1) WO2018110272A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102326010B1 (en) * 2021-01-13 2021-11-11 코오롱인더스트리 주식회사 Moisture and oxygen barrier laminate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170084351A (en) * 2011-02-25 2017-07-19 미쓰비시 마테리알 가부시키가이샤 Transparent oxide film and process for producing same
JP6197428B2 (en) * 2012-08-01 2017-09-20 東レ株式会社 Gas barrier film
JPWO2014097997A1 (en) * 2012-12-19 2017-01-12 コニカミノルタ株式会社 Electronic devices
JP6042840B2 (en) * 2014-03-27 2016-12-14 富士フイルム株式会社 Functional film and method for producing functional film
JP2016064650A (en) * 2014-09-16 2016-04-28 東レ株式会社 Gas barrier film
JP2016095974A (en) * 2014-11-13 2016-05-26 日本ゼオン株式会社 Base film, barrier laminate and organic electroluminescence display device
JP2016175223A (en) * 2015-03-19 2016-10-06 凸版印刷株式会社 Gas barrier laminate, and solar battery module and image display element using the same
JP6650770B2 (en) * 2016-01-29 2020-02-19 日東電工株式会社 Conductive laminated film

Also Published As

Publication number Publication date
JPWO2018110272A1 (en) 2019-10-24
WO2018110272A1 (en) 2018-06-21

Similar Documents

Publication Publication Date Title
CN109121431B (en) Optical film for organic electroluminescent display device, polarizing film with adhesive layer, and organic electroluminescent display device
WO2018135360A1 (en) Film laminate for touch panel
JP2021101249A (en) Polarizing film with adhesive layer, optical member, and image display device
WO2018135359A1 (en) Film laminate for touch panel
TW201819573A (en) Rubber-based pressure-sensitive adhesive composition, rubber-based pressure-sensitive adhesive layer, pressure-sensitive adhesive film, optical film with rubber-based pressure-sensitive adhesive layer, optical member, and image display device
KR102509766B1 (en) Gas barrier film, optical film and flexible display
TWI791739B (en) Organic-inorganic hybrid film , laminate and articles including organic-inorganic hybrid film
TW201811564A (en) Polarizing plate
JP2018119075A (en) Transparent conductive film with tacky adhesive layer, laminate, and organic el display device
JP2017177808A (en) Base film for gas barrier film, gas barrier film and organic el device
JP7294841B2 (en) laminated film
WO2017130617A1 (en) Gas barrier film
JP5664341B2 (en) Gas barrier film
TW201834850A (en) Gas barrier film and organic EL device
JP6175960B2 (en) Gas barrier film
JP2013237264A (en) Gas barrier film
WO2022260152A1 (en) Hard coat film, optical member, and image display device
WO2019146622A1 (en) Hard coating film and method for producing same
JP2018113137A (en) Seal film for organic element and organic element
JP7334624B2 (en) laminate
JP2019128542A (en) Hard coat film and manufacturing method therefor
JP4793022B2 (en) Laminated body
WO2022209104A1 (en) Optical laminate, optical laminate production method, optical member, optical device, optical member production method and optical device production method
JP2019128543A (en) Hard coat film and manufacturing method therefor
JP7214824B1 (en) hard coat film