TW201833013A - Transport system and method - Google Patents
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Abstract
Description
本揭露之部分實施方式係關於一種傳輸系統與方法,特別係關於一種用於半導體廠之傳輸系統與方法。 Some embodiments of the present disclosure relate to a transmission system and method, and more particularly to a transmission system and method for a semiconductor factory.
隨著科技日趨成長,積體電路廣泛地應用在各個領域中,例如:記憶體、中央處理器(CPU)、液晶顯示裝置(LCD)、發光二極體(LED)、雷射二極體或晶片組,連帶促進半導體產業的蓬勃發展。在半導體產業的高度競爭下,半導體元件須在最有效率的條件下進行設計與製造。傳統上,半導體元件之搬運係採用人工搬運,但隨著半導體元件之晶圓尺寸的增加及製程的複雜度提升,人工搬運逐漸無法符合需求,且人為操作容易產生錯誤、污染、以及速度不易提升的狀況。因此,自動化物料配送系統(Automated Material Handling System,AMHS)已大量地應用在半導體製造廠中。 As technology grows, integrated circuits are widely used in various fields, such as memory, central processing unit (CPU), liquid crystal display (LCD), light-emitting diode (LED), laser diode or The chipset, together with the promotion of the semiconductor industry boom. In the highly competitive semiconductor industry, semiconductor components must be designed and manufactured under the most efficient conditions. Traditionally, the handling of semiconductor components has been carried out manually. However, as the wafer size of semiconductor components increases and the complexity of the process increases, manual handling is gradually unable to meet the demand, and human operations are prone to errors, pollution, and speed. The situation. Therefore, the Automated Material Handling System (AMHS) has been widely used in semiconductor manufacturing plants.
一般而言,自動化物料配送系統具有高架式輸送系統(Overhead Hoist Transport System;OHTS)與多個儲藏區(Stocker)、或工作站(Tool Station),以自動地接收、傳送、與放置半導體元件相關之承載裝置。因此,自動化物料配送系統具有節省人力、降低汙染、增加傳送速度…等優點。 In general, an automated material distribution system has an Overhead Hoist Transport System (OHTS) and multiple stockers (Stockers), or a workstation (Tool Station) to automatically receive, transfer, and place semiconductor components. Carrying device. Therefore, the automated material distribution system has the advantages of saving manpower, reducing pollution, increasing transmission speed, and the like.
依據本揭露之部分實施方式,傳輸系統包含負載埠、複數第一軌道、水平移動裝置、升降機、至少一第二軌道與緩衝載台。負載埠係設置於與半導體製程有關之機台。至少部分的第一軌道之間的空間係位於負載埠之正上方。水平移動裝置係可移動性地耦合第一軌道。升降機係設置於水平移動裝置。第二軌道具有連續的第一區段與第二區段,第一區段係位於第一軌道之間的空間的正下方,且第二區段係不位於第一軌道之間的空間的正下方。第一緩衝載台係可移動性地耦合第二軌道。 According to some embodiments of the disclosure, the transmission system includes a load port, a plurality of first tracks, a horizontal moving device, an elevator, at least one second track, and a buffer stage. The load system is set on a machine associated with the semiconductor process. At least a portion of the space between the first tracks is located directly above the load. The horizontal moving device is movably coupled to the first track. The elevator is installed in a horizontal moving device. The second track has a continuous first section and a second section, the first section being directly below the space between the first rails, and the second section being positive of the space not located between the first rails Below. The first buffer stage is movably coupled to the second track.
依據本揭露之部分實施方式,傳輸系統包含負載埠、複數軌道、水平移動裝置、升降機與緩衝載台。負載埠係設置於一與半導體製程有關之機台。軌道之每一者具有連續的第一區段與第二區段,第一區段之間的空間係位於負載埠之正上方,第二區段之間的空間係不位於負載埠之正上方。水平移動裝置係可移動係地耦合軌道。升降機係設置於水平移動裝置。緩衝載台係位於第二區段之間的空間的正下方。 According to some embodiments of the present disclosure, the transmission system includes a load port, a plurality of tracks, a horizontal moving device, an elevator, and a buffer stage. The load system is set on a machine associated with the semiconductor process. Each of the tracks has a continuous first section and a second section, the space between the first sections is directly above the load 埠, and the space between the second sections is not directly above the load 埠. The horizontal moving device is a mobile system coupled to the track. The elevator is installed in a horizontal moving device. The buffer stage is located directly below the space between the second sections.
依據本揭露之部分實施方式,傳輸方法包含以下步驟。判斷負載埠是否被佔據。當負載埠被判斷被佔據時,移動一緩衝載台至一第一位置,且第一位置係位於負載埠正上方。傳送一物件至位於第一位置之緩衝載台上。 According to some embodiments of the disclosure, the transmission method comprises the following steps. Determine if the load is occupied. When the load 埠 is judged to be occupied, a buffer stage is moved to a first position, and the first position is located directly above the load 埠. An object is transported to the buffer stage in the first position.
10‧‧‧傳輸系統 10‧‧‧Transmission system
20‧‧‧自動化物料傳輸系統 20‧‧‧Automatic Material Transfer System
22‧‧‧機台間傳輸裝置 22‧‧‧Inter-machine transmission
100‧‧‧負載埠 100‧‧‧Load埠
110‧‧‧承載部 110‧‧‧Loading Department
120‧‧‧連接部 120‧‧‧Connecting Department
122‧‧‧開口門 122‧‧‧Open door
130‧‧‧物件偵測裝置 130‧‧‧ Object Detection Device
200‧‧‧緩衝載台 200‧‧‧buffer stage
210‧‧‧可移動緩衝載台 210‧‧‧Removable buffer stage
220‧‧‧固定緩衝載台 220‧‧‧Fixed buffer stage
230‧‧‧物件偵測裝置 230‧‧‧ Object Detection Device
300‧‧‧傳送裝置 300‧‧‧Transfer device
310‧‧‧水平移動裝置 310‧‧‧Horizontal mobile device
320‧‧‧升降機 320‧‧‧ Lifts
400‧‧‧機台 400‧‧‧ machine
410‧‧‧連接端 410‧‧‧Connected end
412‧‧‧存取開口 412‧‧‧ access opening
510‧‧‧夾門 510‧‧‧ 夹门
600‧‧‧第一軌道 600‧‧‧ first track
700‧‧‧緩衝載台致動器 700‧‧‧Bubble stage actuator
710‧‧‧第一致動單元 710‧‧‧First actuating unit
720‧‧‧第二致動單元 720‧‧‧Second actuating unit
800‧‧‧傳送裝置致動器 800‧‧‧Transfer actuator
810‧‧‧第一致動模組 810‧‧‧First actuation module
820‧‧‧第二致動模組 820‧‧‧Second actuation module
830‧‧‧第三致動模組 830‧‧‧ Third Actuation Module
900‧‧‧第二軌道 900‧‧‧second track
920‧‧‧滑動件 920‧‧‧Sliding parts
A、B、C‧‧‧物件 A, B, C‧‧‧ objects
D1‧‧‧第一方向 D1‧‧‧ first direction
D2‧‧‧第二方向 D2‧‧‧ second direction
D3‧‧‧第三方向 D3‧‧‧ third direction
P1‧‧‧第一位置 P1‧‧‧ first position
P2‧‧‧第二位置 P2‧‧‧ second position
P3‧‧‧第三位置 P3‧‧‧ third position
閱讀以下詳細敘述並搭配對應之圖式,可了解本揭露之多個樣態。需留意的是,圖式中的多個特徵並未根據該業界領域之標準作法繪製實際比例。事實上,所述之特徵的尺寸可以任意的增加或減少以利於討論的清晰性。 Read the following detailed description and the corresponding drawings to understand the various aspects of the disclosure. It should be noted that the various features in the schema do not draw actual scales based on standard practices in the industry. In fact, the dimensions of the features described can be arbitrarily increased or decreased to facilitate clarity of discussion.
第1圖為依據本揭露之部分實施方式之傳輸系統之立體示意圖。 1 is a perspective view of a transmission system in accordance with some embodiments of the present disclosure.
第2圖為依據本揭露之部分實施方式之傳輸系統之側視圖。 2 is a side elevational view of a transmission system in accordance with some embodiments of the present disclosure.
第3圖為依據本揭露之部分實施方式之傳輸系統之俯視圖。 Figure 3 is a top plan view of a transmission system in accordance with some embodiments of the present disclosure.
第4圖為依據本揭露之部分實施方式之傳輸方法的流程圖。 4 is a flow chart of a transmission method in accordance with some embodiments of the present disclosure.
以下將以圖式及詳細說明清楚說明本揭露之精神,任何所屬技術領域中具有通常知識者在瞭解本揭露之實施例後,當可由本揭露所教示之技術,加以改變及修飾,其並不脫離本揭露之精神與範圍。舉例而言,敘述「第一特徵形成於第二特徵上方或上」,於實施例中將包含第一特徵及第二特徵具有直接接觸;且也將包含第一特徵和第二特徵為非直接接觸,具有額外的特徵形成於第一特徵和第二特徵之間。此外,本揭露在多個範例中將重複使用元件標號以及/或文字。重複的目的在於簡化與釐清,而其本身並不會決定多個實施例以及/或所討論的配置之間的關係。 The spirit and scope of the present disclosure will be apparent from the following description of the embodiments of the present disclosure, which may be modified and modified by the teachings of the present disclosure. Depart from the spirit and scope of this disclosure. For example, the description "the first feature is formed above or above the second feature", in the embodiment, the first feature and the second feature are included in direct contact; and the first feature and the second feature are also included as indirect The contact has additional features formed between the first feature and the second feature. Moreover, the present disclosure will reuse component numbers and/or text in various examples. The purpose of the repetition is to simplify and clarify, and does not in itself determine the relationship between the various embodiments and/or the configurations in question.
在本文中所使用的術語,僅是用以描述特定實施例,不應以此敘述限制本揭露。在本文中,除非上下文中另外明確指明,否則單數形式「一」以及「所述」亦欲包含複數形式。進一步理解,術語「包括」、「包含」以及「具有」,在本說明書使用時,用以表示所述特徵、區域、整體、步驟、操作、元件和/或成分的存在,但不排除存在或添加一個或多個特徵、區域、整體、步驟、操作、元件、成分,和/或以上組合。 The terminology used herein is for the purpose of describing the particular embodiment In the present disclosure, the singular forms "a" and "the" It is to be understood that the terms "comprises", "comprising" and "comprising" are used to mean the presence of the features, regions, integers, steps, operations, components and/or components, but do not exclude One or more of the features, regions, integers, steps, operations, components, components, and/or combinations thereof are added.
此外,方位相對詞彙,如「在...之下」、「下面」、「下」、「上方」或「上」或類似詞彙,在本文中為用來便於描述繪示於圖式中的一個元件或特徵至另外的元件或特徵之關係。方位相對詞彙除了用來描述裝置在圖式中的方位外,其包含裝置於使用或操作下之不同的方位。當裝置被另外設置(旋轉90度或者其他面向的方位),本文所用的方位相對詞彙同樣可相應地進行解釋。 In addition, azimuth-relative vocabulary, such as "under", "below", "below", "above" or "upper" or similar words, is used herein to facilitate the description in the drawings. The relationship of one element or feature to another element or feature. Azimuthally relative terms are used to describe different orientations of the device in use or operation, except to describe the orientation of the device in the drawings. When the device is otherwise set (rotated 90 degrees or other oriented orientation), the orientation relative vocabulary used herein can also be interpreted accordingly.
在半導體元件的製造過程中,半導體晶圓(wafer)往往需要歷經數十道或數百道製程以形成最終的半導體元件。大體而言,半導體晶圓可儲存於晶圓承載單元中,晶圓承載單元可容納多個半導體晶圓,再藉由自動化物料配送系統(Automated Material Handling System,AMHS)之傳輸裝置,例如:例如自動導引車(Automatic guided vehicle;AGV)、軌道導引車(Rail guided vehicle;RGV)、高架式輸送裝置(Overhead Hoist Shuttle;OHS)以及高架式起吊輸送裝置(Overhead Hoist Transport;OHT)、或其他適當裝置, 自動地傳送晶圓承載單元於不同的製程機台(設備)之間,使得製程機台可批量地處理半導體晶圓。 In the fabrication of semiconductor components, semiconductor wafers often require tens or hundreds of processes to form the final semiconductor component. Generally, the semiconductor wafer can be stored in a wafer carrier unit, the wafer carrier unit can accommodate a plurality of semiconductor wafers, and then transmitted by an automated material handling system (AMHS), for example, for example: Automatic guided vehicle (AGV), Rail guided vehicle (RGV), Overhead Hoist Shuttle (OHS), and Overhead Hoist Transport (OHT), or Other suitable devices automatically transfer the wafer carrier unit between different process machines (devices) so that the process machine can process the semiconductor wafers in batches.
也就是說,晶圓承載單元可藉由自動化物料配送系統之傳輸裝置傳送至不同的製程機台之間。製程機台可具有對應的工作站(tool station),工作站包含至少一個負載埠(load port),負載埠係連接製程機台且可用以放置、或儲存晶圓承載單元。然而,工作站之負載埠的數量係固定的、且有限制的,無法依據當下製程的產能、或狀況而進行調整或變動。因此,當晶圓承載單元所欲製程的製程機台之對應的負載埠皆被佔據時,晶圓承載單元便無法被傳送至所欲製程的製程機台而停留在傳輸裝置上,導致晶圓承載單元產生「塞車」的現象,因而增加晶圓承載單元於不同製程機台之間的停留時間,且延遲晶圓承載單元中的半導體晶圓的製程時間。在此,停留時間係表示半導體晶圓在製造過程中由一製程機台所對應的工作站傳輸至另一製程機台所對應的工作站所花費的時間。 That is to say, the wafer carrier unit can be transferred between different process machines by the transmission device of the automated material distribution system. The process machine can have a corresponding workstation station that includes at least one load port that is coupled to the process machine and can be used to place or store the wafer carrier unit. However, the number of load ports on the workstation is fixed and limited, and cannot be adjusted or changed depending on the capacity or condition of the current process. Therefore, when the corresponding load ports of the process machine of the wafer carrier unit are occupied, the wafer carrier unit cannot be transferred to the process machine of the desired process and stays on the transmission device, resulting in the wafer. The load cell generates a phenomenon of "plugging", thereby increasing the residence time of the wafer carrier unit between different process machines and delaying the processing time of the semiconductor wafer in the wafer carrier unit. Here, the dwell time indicates the time taken for the semiconductor wafer to be transferred from the workstation corresponding to one process machine to the workstation corresponding to the other process machine during the manufacturing process.
此外,晶圓承載單元於製程機台之間的停留時間亦會影響半導體晶圓廠的生產效率與產能,且當晶圓承載單元於製程機台之間的停留時間過長時,亦即,太過延遲晶圓承載單元中的半導體晶圓的製程時間時,位於半導體晶圓廠內的氣體雜質、或粒子可能會汙染晶圓承載單元中的半導體晶圓,特別是在半導體晶圓剛結束某些製程時會變得特別容易遭受污染。 In addition, the residence time of the wafer carrier unit between the processing machines also affects the production efficiency and capacity of the semiconductor fab, and when the residence time of the wafer carrier unit between the processing machines is too long, that is, When the process time of the semiconductor wafer in the wafer carrier unit is too delayed, gas impurities or particles located in the semiconductor wafer fab may contaminate the semiconductor wafer in the wafer carrier unit, especially at the end of the semiconductor wafer. Some processes become particularly susceptible to contamination.
有鑑於此,本揭露之部分實施方式提供一種傳輸系統及其方法,其可改善物件(例如:晶圓承載單元、或光罩 載具)傳送於不同製程機台之間的塞車現象,且減少物件傳送於不同製程機台之間的停留時間。 In view of this, some embodiments of the present disclosure provide a transmission system and a method thereof, which can improve the phenomenon of traffic jam between objects (for example, a wafer carrier unit or a reticle carrier) transmitted between different process machines, and reduce The time the object is transported between different process machines.
參照第1圖。第1圖為依據本揭露之部分實施方式之傳輸系統之立體示意圖。於部分實施方式中,傳輸系統10包含負載埠100、緩衝載台200、傳送裝置300、複數第一軌道600與至少一第二軌道900。負載埠100係設置於與半導體製程有關之機台400。更詳細地說,負載埠100係用以容納物件(例如:晶圓承載單元、或光罩載具),且負載埠100係連接機台400之一連接端410(可參閱第2圖),使得物件中的內容物可經由負載埠100與連接端410而被傳送至機台400中。第一軌道600係鄰設於機台400之一側,且至少部分第一軌道600之間的空間係位於負載埠100的正上方。換句話說,第一軌道600之每一者具有連續的第一區段602與第二區段604(又稱延伸區段604)。舉例而言,第一區段602係連接第二區段604,且兩者係一體成形的。第一軌道600之第一區段602之間的空間係位於負載埠100的正上方,且第一軌道600之第二區段604之間的空間係不位於負載埠100的正上方。第二軌道900具有連續的第一區段902與第二區段904,第二軌道900之第一區段902係位於兩第一軌道600之第一區段602之間的空間的正下方,且第二區段904係不位於兩第一軌道600之第一區段602之間的空間的正下方。緩衝載台200係用以暫時地存放物件,且緩衝載台200可分類為可移動緩衝載台210與固定緩衝載台220。可移動緩衝載台210係可移動性地耦合第二軌道900。亦即,可移動緩衝載台210係可沿著第二軌道900移動至兩第二軌道 900之第一區段902之間的空間,或移動至兩第二軌道900之第二區段904之間的空間。換句話說,可移動緩衝載台210係可移動至位於負載埠100之正上方的位置或移動至不位於負載埠100之正上方的位置。固定緩衝載台220係位於第一軌道600之第二區段604之間的空間的正下方,亦即,固定緩衝載台220係不位於負載埠100的正上方。傳送裝置300係用以將物件傳送於負載埠100所在之位置與緩衝載台200所在之位置之間。進一步來說,於部分實施方式中,負載埠100與緩衝載台200可被統稱為工作站,工作站可存放物件。亦即,物件可選擇性地被放置於負載埠100或緩衝載台200(可移動緩衝載台210、固定緩衝載台220、或以上兩者)上,從而增加物件之放置空間的選擇性。因此,傳輸系統10可幫助減少物件傳送於不同機台400之間的塞車現象,且減少物件傳送於不同機台400之間的停留時間。 Refer to Figure 1. 1 is a perspective view of a transmission system in accordance with some embodiments of the present disclosure. In some embodiments, the transmission system 10 includes a load cassette 100, a buffer stage 200, a transfer device 300, a plurality of first tracks 600, and at least one second track 900. The load 埠 100 is placed on the machine 400 associated with the semiconductor process. In more detail, the load port 100 is used to accommodate an object (for example, a wafer carrier unit or a mask carrier), and the load port 100 is connected to one of the terminals 410 of the machine 400 (see FIG. 2). The contents of the article are caused to be transferred to the machine 400 via the load port 100 and the connection end 410. The first rail 600 is adjacent to one side of the machine 400, and at least a portion of the space between the first rails 600 is located directly above the load cassette 100. In other words, each of the first tracks 600 has a continuous first section 602 and a second section 604 (also referred to as an extended section 604). For example, the first section 602 is coupled to the second section 604 and the two are integrally formed. The space between the first sections 602 of the first track 600 is located directly above the load cassette 100, and the space between the second sections 604 of the first track 600 is not directly above the load cassette 100. The second track 900 has a continuous first section 902 and a second section 904, and the first section 902 of the second track 900 is located directly below the space between the first sections 602 of the two first tracks 600. And the second section 904 is not directly below the space between the first sections 602 of the two first rails 600. The buffer stage 200 is for temporarily storing objects, and the buffer stage 200 can be classified into a movable buffer stage 210 and a fixed buffer stage 220. The movable buffer stage 210 is movably coupled to the second track 900. That is, the movable buffer stage 210 can be moved along the second track 900 to the space between the first sections 902 of the two second tracks 900, or to the second section 904 of the two second tracks 900. Space between. In other words, the movable buffer stage 210 can be moved to a position directly above the load cassette 100 or moved to a position not directly above the load cassette 100. The fixed buffer stage 220 is located directly below the space between the second sections 604 of the first track 600, that is, the fixed buffer stage 220 is not directly above the load cassette 100. The transfer device 300 is used to transfer the object between the position where the load cassette 100 is located and the position where the buffer stage 200 is located. Further, in some embodiments, the load cassette 100 and the buffer stage 200 can be collectively referred to as a workstation, and the workstation can store objects. That is, the article can be selectively placed on the load cassette 100 or the buffer stage 200 (the movable buffer stage 210, the fixed buffer stage 220, or both), thereby increasing the selectivity of the placement space of the object. Thus, the transport system 10 can help reduce the traffic jam between objects transported between different stations 400 and reduce the dwell time that objects travel between different stations 400.
於部分實施方式中,如第1圖所示,傳送裝置300可用以在負載埠100與緩衝載台200之間傳送物件。舉例而言,於部分實施方式中,傳送裝置300可依據不同的狀況,例如:機台400的製程狀況、負載埠100被佔據的狀況、緩衝載台200被佔據的狀況、或機台400的其他相關狀態…等,將物件從緩衝載台200移動至負載埠100;或者,將物件從負載埠100移動至緩衝載台200,但本揭露不以此為限。也就是說,物件可經由傳送裝置300而被放置於負載埠100、或緩衝載台200上。 In some embodiments, as shown in FIG. 1, the conveyor 300 can be used to transfer items between the load cassette 100 and the buffer stage 200. For example, in some embodiments, the transmitting device 300 may be in accordance with different conditions, such as the process status of the machine 400, the condition in which the load 埠 100 is occupied, the condition in which the buffer stage 200 is occupied, or the machine 400. Other related states, etc., move the object from the buffer stage 200 to the load cassette 100; or move the object from the load cassette 100 to the buffer stage 200, but the disclosure is not limited thereto. That is, the article can be placed on the load cassette 100 or the buffer stage 200 via the transfer device 300.
同時參照第1圖與第2圖。第2圖為依據本揭露之 部分實施方式之傳輸系統之側視圖。於部分實施方式中,傳送裝置300係位於第一軌道600中,且可沿著第一軌道600移動。傳送裝置300包含水平移動裝置310與升降機320,水平移動裝置310係可移動性係地耦合第一軌道600,且升降機320係設置於水平移動裝置310。水平移動裝置310係沿著第一方向D1移動,且升降機320係沿著第二方向D2移動,第一方向D1與第二方向D2相交。第一方向D1係第一軌道600的長度方向,亦即,複數個負載埠100的排列方向。在一些實施方式中,第一方向D1可為水平方向,而第二方向D2可為垂直方向,亦即,第一方向D1與第二方向D2實質上垂直。 Refer to both Figure 1 and Figure 2. Figure 2 is a side elevational view of a transmission system in accordance with some embodiments of the present disclosure. In some embodiments, the transfer device 300 is located in the first track 600 and is movable along the first track 600. The transfer device 300 includes a horizontal moving device 310 and an elevator 320. The horizontal moving device 310 is movably coupled to the first track 600, and the elevator 320 is disposed at the horizontal moving device 310. The horizontal moving device 310 moves along the first direction D1, and the elevator 320 moves along the second direction D2, and the first direction D1 intersects the second direction D2. The first direction D1 is the longitudinal direction of the first track 600, that is, the arrangement direction of the plurality of loads 埠100. In some embodiments, the first direction D1 may be a horizontal direction, and the second direction D2 may be a vertical direction, that is, the first direction D1 and the second direction D2 are substantially perpendicular.
於部分實施方式中,如第1圖與第2圖所示,緩衝載台200所在的水平高度係不同於負載埠100所在的水平高度,且第一軌道600所在的水平高度係不同於緩衝載台200所在的水平高度。更詳細地說,緩衝載台200所在的水平高度係高於負載埠100所在的水平高度,且第一軌道600所在的水平高度係高於緩衝載台200所在的水平高度。如此一來,在安裝緩衝載台200與第一軌道600時,由於緩衝載台200與第一軌道600係設置於負載埠100的上方,因此,緩衝載台200與第一軌道600的安裝並不會干擾負載埠100運作,且不會干擾負載埠100所對應的機台400的運作。 In some embodiments, as shown in FIGS. 1 and 2, the level at which the buffer stage 200 is located is different from the level at which the load 埠 100 is located, and the level at which the first track 600 is located is different from the buffer load. The level at which the station 200 is located. In more detail, the level at which the buffer stage 200 is located is higher than the level at which the load 埠 100 is located, and the level at which the first track 600 is located is higher than the level at which the buffer stage 200 is located. In this way, when the buffer stage 200 and the first rail 600 are installed, since the buffer stage 200 and the first rail 600 are disposed above the load cassette 100, the buffer stage 200 and the first rail 600 are mounted. It does not interfere with the operation of the load 埠100, and does not interfere with the operation of the machine 400 corresponding to the load 埠100.
舉例而言,於部分實施方式中,傳送裝置300可為自動導引車(Automatic guided vehicle;AGV)、軌道導引車(Rail guided vehicle;RGV)、高架式輸送裝置(Overhead Hoist Shuttle;OHS)、高架式起吊輸送裝置(Overhead Hoist Transport;OHT)、或其他適當裝置,以自動地移動物件,但本揭露不以此為限。 For example, in some embodiments, the transmitting device 300 can be an Automatic guided vehicle (AGV), a Rail guided vehicle (RGV), and an Overhead Hoist Shuttle (OHS). , Overhead Hoist Transport (OHT), or other suitable device to automatically move objects, but the disclosure is not limited thereto.
於部分實施方式中,機台400可具有蝕刻製程之功能、沉積製程之功能、黃光製程之功能、擴散製程之功能、或其他半導體製程之功能,但本揭露不以此為限。於其他實施方式中,機台400可具有量測、或檢測工具,以進行與半導體製程相關之偵測,但本揭露不以此為限。 In some embodiments, the machine 400 may have the functions of an etching process, a deposition process, a yellow process, a diffusion process, or other semiconductor processes, but the disclosure is not limited thereto. In other embodiments, the machine 400 can have a measurement or detection tool for performing semiconductor process related detection, but the disclosure is not limited thereto.
於部分實施方式中,物件可為晶圓承載單元,用以容納300mm(12inch)或450mm(18inch)等尺寸的晶圓片,舉例來說,物件可為前開式晶圓盒(Front Open Unified Pods;FOUPs)中、晶圓盒(PODs)、晶圓載具(wafer carriers)、晶圓載具(wafer carriers)、或晶圓匣(cassette),但本揭露不以此為限。於其他實施方式中,物件可為光罩載具,例如:光罩載具(reticle carriers)、或光罩傳送盒(Reticle SMIF Pod;RSP),但本揭露不以此為限。 In some embodiments, the object may be a wafer carrying unit for accommodating a wafer of 300 mm (12 inch) or 450 mm (18 inch). For example, the object may be a front open wafer cassette (Front Open Unified Pods) ;FOUPs), wafer cassettes (PODs), wafer carriers, wafer carriers, or cassettes, but the disclosure is not limited thereto. In other embodiments, the object may be a reticle carrier, such as a reticle carrier, or a Reticle SMIF Pod (RSP), but the disclosure is not limited thereto.
於部分實施方式中,如第2圖所示,負載埠100具有相鄰的承載部110與連接部120。承載部110可用以承載物件C。連接部120突出於承載部110並連通機台400,而可用以將儲存於物件C中的內容物傳遞至機台400,或從機台400中接收處理完畢的內容物。進一步來說,負載埠100之連接部120係連接機台400之一連接端410。連接端410包含一存取開口(access port)412,存取開口412係被負載埠100之連接部120之開口門(port door)122覆蓋著。連接部120之開口門122包含相對的外表面與內表面,外表面係暴露於半導體工廠的環境 中,內表面係連接機台400之連接端410的存取開口412,且內表面係位於機台400之密封環境中。如此一來,當負載埠100所承載之物件C中的內容物欲進入機台400時,連接部120之開口門122可被開啟,使得物件C中的內容物可經由機台400之存取開口412而進入機台400中。 In some embodiments, as shown in FIG. 2, the load cassette 100 has an adjacent carrier portion 110 and a connection portion 120. The carrier 110 can be used to carry the item C. The connecting portion 120 protrudes from the carrying portion 110 and communicates with the machine table 400, and can be used to transfer the contents stored in the object C to the machine 400 or receive the processed contents from the machine 400. Further, the connection portion 120 of the load port 100 is connected to one of the connection ends 410 of the machine 400. The connection end 410 includes an access port 412 that is covered by a port door 122 of the connection portion 120 of the load port 100. The opening door 122 of the connecting portion 120 includes opposite outer and inner surfaces, the outer surface is exposed to the environment of the semiconductor factory, the inner surface is connected to the access opening 412 of the connecting end 410 of the machine 400, and the inner surface is located at the machine The sealed environment of the station 400. In this way, when the content in the object C carried by the load cassette 100 is to enter the machine 400, the opening door 122 of the connecting portion 120 can be opened, so that the content in the object C can be accessed through the opening of the machine 400. 412 enters the machine 400.
舉例來說,於部分實施方式中,如第2圖所示,當物件C為一前開式晶圓盒時,物件C可包含一可移動夾門(poddoor)510,夾門510與負載埠100之開口門122係可連動的。舉例而言,於部分實施方式中,物件C之夾門510上方具有多個孔洞,且負載埠100之開口門122的上方具有對應孔洞之對準栓具(alignmentpin)。負載埠100之對準栓具可緊密地卡合夾門510之孔洞,使得物件C與負載埠100之間可緊密地連接。當負載埠100所承載之物件C中的內容物欲進入機台400時,物件C之夾門510可被開啟,且負載埠100之開口門122亦係被開啟的,使得物件C中的內容物可依序經由夾門510、開口門122與存取開口412進入機台400中。舉例而言,於部分實施方式中,物件C中的內容物可為半導體晶圓、或光罩,但本揭露不以此為限。 For example, in some embodiments, as shown in FIG. 2, when the object C is a front open type wafer cassette, the object C may include a movable poddoor 510, the clamping door 510 and the load cassette 100. The opening door 122 is interlockable. For example, in some embodiments, the clip C of the object C has a plurality of holes above the opening door 122 of the load C, and an alignment pin corresponding to the hole is provided above the opening door 122 of the load port 100. The alignment plug of the load cassette 100 can tightly engage the hole of the clamp door 510 so that the object C and the load cassette 100 can be tightly coupled. When the content in the object C carried by the load cassette 100 is to enter the machine 400, the door 510 of the object C can be opened, and the opening door 122 of the load 埠 100 is also opened, so that the contents in the object C are The machine 400 can be accessed through the clamping door 510, the opening door 122 and the access opening 412 in sequence. For example, in some embodiments, the content in the object C may be a semiconductor wafer, or a reticle, but the disclosure is not limited thereto.
同時參照第1~3圖。第3圖為依據本揭露之部分實施方式之傳輸系統之俯視圖。於部分實施方式中,可移動緩衝載台210可包含移動組件,例如:滑輪、引導鍊、馬達、或其他適當的驅動裝置,但本揭露不以此為限。於部分實施方式中,第二軌道900可包含一滑動件920,滑動件920係連接可移動緩衝載台210,且滑動件920係可移動性地耦接第二軌道 900,使得可移動緩衝載台210係沿著第二軌道900的長度方向移動。於部分實施方式中,第一軌道600的長度方向與第二軌道900的長度方向相交。舉例而言,於部分實施方式中,第一軌道600的長度方向與第二軌道900的長度方向係實質上垂直。選擇性地,於部分實施方式中,第一軌道600的長度方向與第二軌道900的長度方向可相夾一鈍角、或銳角,但本揭露不以此為限。 Also refer to Figures 1~3. Figure 3 is a top plan view of a transmission system in accordance with some embodiments of the present disclosure. In some embodiments, the movable buffer stage 210 can include a moving component, such as a pulley, a guide chain, a motor, or other suitable driving device, but the disclosure is not limited thereto. In some embodiments, the second rail 900 can include a slider 920 that is coupled to the movable buffer stage 210, and the slider 920 is movably coupled to the second rail 900 such that the movable buffer is loaded. The stage 210 moves along the length of the second track 900. In some embodiments, the length direction of the first track 600 intersects the length direction of the second track 900. For example, in some embodiments, the length direction of the first track 600 is substantially perpendicular to the length direction of the second track 900. Optionally, in some embodiments, the length direction of the first track 600 and the length direction of the second track 900 may be at an obtuse angle or an acute angle, but the disclosure is not limited thereto.
於部分實施方式中,第一軌道600係鄰設於機台400之連接端410,且第一軌道600係沿著第一方向D1(亦即,複數個負載埠100的排列方向)延伸。換句話說,第一軌道600之第一區段602與第二區段604係沿著第一方向D1排列,且第一軌道600之第一區段602的長度方向與第一軌道600的第二區段604的長度方向係實質上平行。第二軌道900係連接機台400之連接端410,且第二軌道900沿著一第三方向D3(亦即,負載埠100與機台400的排列方向)延伸。換句話說,第二軌道900之第一區段902與第二區段904係沿著第三方向D3排列,且第一方向D1與第三方向D3相交。如此一來,由於第一軌道600的長度方向(第一方向D1)與第二軌道900的長度方向(第三方向D3)相交,可移動緩衝載台210可沿著第三方向D3在第二軌道900上移動,傳送裝置300可沿著第一方向D1在第一軌道600上移動,故傳送裝置300與可移動緩衝載台210可同時位於負載埠100所在位置的正上方,使得傳送裝置300能夠在可移動緩衝載台210上進行物件的取放作業。 In some embodiments, the first track 600 is adjacent to the connection end 410 of the machine 400, and the first track 600 extends along the first direction D1 (ie, the arrangement direction of the plurality of load ports 100). In other words, the first section 602 and the second section 604 of the first track 600 are arranged along the first direction D1, and the length direction of the first section 602 of the first track 600 and the first track 600 are The lengthwise direction of the two sections 604 is substantially parallel. The second rail 900 is connected to the connecting end 410 of the machine 400, and the second rail 900 extends along a third direction D3 (that is, the direction in which the load 埠100 and the machine 400 are arranged). In other words, the first section 902 and the second section 904 of the second track 900 are aligned along the third direction D3, and the first direction D1 intersects the third direction D3. In this way, since the longitudinal direction of the first track 600 (the first direction D1) intersects with the longitudinal direction of the second track 900 (the third direction D3), the movable buffer stage 210 can be along the third direction D3 at the second Moving on the track 900, the conveying device 300 can move on the first track 600 along the first direction D1, so that the conveying device 300 and the movable buffer stage 210 can be located directly above the position of the load port 100, so that the conveying device 300 The pick-and-place operation of the object can be performed on the movable buffer stage 210.
於部分實施方式中,如第3圖所示,第二軌道900 之第一區段902的長度不小於可移動緩衝載台210的長度。舉例而言,第一區段902的長度可大於或等於可移動緩衝載台210於第三方向D3的長度。因此,可移動緩衝載台210可完全地位於第二軌道900之第一區段902之間的空間中,而完全地位於負載埠100的正上方。於部分實施方式中,第二軌道900之第二區段904的長度不小於可移動緩衝載台210的長度。舉例而言,第二區段904的長度可大於或等於可移動緩衝載台210於第三方向D3的長度。因此,可移動緩衝載台210可完全地位於第二軌道900之第二區段904之間的空間中,而完全地離開負載埠100的正上方。 In some embodiments, as shown in FIG. 3, the length of the first section 902 of the second track 900 is not less than the length of the movable buffer stage 210. For example, the length of the first section 902 can be greater than or equal to the length of the movable buffer stage 210 in the third direction D3. Accordingly, the movable buffer stage 210 can be completely located in the space between the first sections 902 of the second rail 900, and completely above the load cassette 100. In some embodiments, the length of the second section 904 of the second track 900 is not less than the length of the movable buffer stage 210. For example, the length of the second section 904 can be greater than or equal to the length of the movable buffer stage 210 in the third direction D3. Thus, the movable buffer stage 210 can be completely located in the space between the second sections 904 of the second track 900, completely away from the load cassette 100 directly above.
於部分實施方式中,傳輸系統10更包含一緩衝載台致動器700,緩衝載台致動器700係電性連接或訊號連接至可移動緩衝載台210。緩衝載台致動器700係用以控制可移動緩衝載台210於第一位置P1與第二位置P2之間移動。第一位置P1係位於負載埠100的正上方,且第二位置P2係相對第一位置P1遠離機台400。更詳細地說,於部分實施方式中,緩衝載台致動器700包含第一致動單元710,第一致動單元710係用以致動可移動緩衝載台210移動,使得可移動緩衝載台210從第一位置P1移動至第二位置P2。或者,緩衝載台致動器700包含第二致動單元720,第二致動單元720係用以致動可移動緩衝載台210移動,使得可移動緩衝載台210從第二位置P2移動至第一位置P1,但本揭露不以此為限。在一些實施方式中,第一致動單元710與第二致動單元720可為安裝於同一致動器中的軟體或韌體,在其他實施方式中,第一致動單元710與第二致動 單元720亦可為兩獨立的硬體裝置。 In some embodiments, the transmission system 10 further includes a buffer stage actuator 700 that is electrically connected or signaled to the movable buffer stage 210. The buffer stage actuator 700 is for controlling the movement of the movable buffer stage 210 between the first position P1 and the second position P2. The first position P1 is located directly above the load port 100, and the second position P2 is remote from the machine table 400 relative to the first position P1. In more detail, in some embodiments, the buffer stage actuator 700 includes a first actuation unit 710 that is used to actuate the movable buffer stage 210 to move such that the movable buffer stage 210 moves from the first position P1 to the second position P2. Alternatively, the buffer stage actuator 700 includes a second actuation unit 720 for actuating the movable buffer stage 210 to move such that the movable buffer stage 210 moves from the second position P2 to the first A position P1, but the disclosure is not limited thereto. In some embodiments, the first actuation unit 710 and the second actuation unit 720 can be software or firmware installed in the same actuator. In other embodiments, the first actuation unit 710 and the second actuation The moving unit 720 can also be two independent hardware devices.
於部分實施方式中,如第1及3圖所示,傳輸系統10更包含一第一致動模組810,電性耦接傳送裝置300,第一致動模組810係用以當緩衝載台200移動至一位置時,控制傳送裝置300前往此位置且停止於此位置上,且此位置係位於負載埠100的正上方。換句話說,第一致動模組810係經配置以致動傳送裝置300移動且傳送物件。當可移動緩衝載台210欲從一第二位置P2移動至第一位置P1時,第一致動模組810可指派傳送裝置300一傳送路徑,並控制傳送裝置300沿著此傳送路徑前往第一位置P1。第一位置P1係位於負載埠100的正上方,且第二位置P2係相對第一位置P1遠離機台400。舉例而言,於部分實施方式中,當可移動緩衝載台210移動至第一位置P1時,第一致動模組810可控制傳送裝置300之水平移動裝置310(可參閱第2圖)沿著第一方向D1移動至第一位置P1,且停止於第一位置P1。隨後,第一致動模組810可控制傳送裝置300之升降機320(可參閱第2圖)沿著第二方向D2移動,並夾取與移動位於可移動緩衝載台210上的物件,但本揭露不以此為限。 In some embodiments, as shown in FIGS. 1 and 3, the transmission system 10 further includes a first actuation module 810 electrically coupled to the transmission device 300. The first actuation module 810 is configured to be used as a buffer. When the station 200 is moved to a position, the control conveyor 300 is moved to this position and stopped at this position, and this position is directly above the load cassette 100. In other words, the first actuation module 810 is configured to actuate the transfer device 300 to move and transfer the item. When the movable buffer stage 210 is to be moved from a second position P2 to the first position P1, the first actuation module 810 can assign a transmission path to the transmission device 300 and control the transmission device 300 to proceed along the transmission path. A position P1. The first position P1 is located directly above the load port 100, and the second position P2 is remote from the machine table 400 relative to the first position P1. For example, in some embodiments, when the movable buffer stage 210 is moved to the first position P1, the first actuation module 810 can control the horizontal moving device 310 of the transmitting device 300 (see FIG. 2). The first direction D1 moves to the first position P1 and stops at the first position P1. Subsequently, the first actuation module 810 can control the elevator 320 of the conveyor 300 (see FIG. 2) to move along the second direction D2, and grip and move the object located on the movable buffer stage 210, but Exposure is not limited to this.
於部分實施方式中,如第1及3圖所示,傳輸系統10更包含一第二致動模組820,電性耦接傳送裝置300。第二致動模組820係用以當緩衝載台200離開第一位置P1時,控制傳送裝置300從第一位置P1前往負載埠100所在的位置。換句話說,第二致動模組820係經配置以致動傳送裝置300移動且傳送物件。當可移動緩衝載台210從第一位置P1移動至第二位 置P2時,第二致動模組820可指派傳送裝置300一傳送路徑,並控制傳送裝置300沿著此傳送路徑從第一位置P1前進至負載埠100。舉例而言,於部分實施方式中,當可移動緩衝載台210欲從第一位置P1移動至第二位置P2時,第二致動模組820可控制傳送裝置300之升降機320抓取可移動緩衝載台210在第一位置P1時,此可移動緩衝載台210上的物件。隨後,當可移動緩衝載台210移動且停留至第二位置P2時,第二致動模組820可控制傳送裝置300之升降機320沿著第二方向D2移動,使得升降機320從第一位置P1向下被移動至負載埠100上,從而幫助物件從可移動緩衝載台210之第一位置P1移動且放置於負載埠100上,但本揭露不以此為限。 In some embodiments, as shown in FIGS. 1 and 3, the transmission system 10 further includes a second actuation module 820 electrically coupled to the transmission device 300. The second actuation module 820 is configured to control the transfer device 300 from the first position P1 to the position where the load cassette 100 is located when the buffer stage 200 leaves the first position P1. In other words, the second actuation module 820 is configured to actuate the transfer device 300 to move and transfer the item. When the movable buffer stage 210 is moved from the first position P1 to the second position P2, the second actuation module 820 can assign a transfer path to the transfer device 300 and control the transfer device 300 along the transfer path from the first position. P1 proceeds to load 埠100. For example, in some embodiments, when the movable buffer stage 210 is to be moved from the first position P1 to the second position P2, the second actuation module 820 can control the elevator 320 of the transfer device 300 to grasp and move. When the buffer stage 210 is in the first position P1, this can move the object on the buffer stage 210. Subsequently, when the movable buffer stage 210 moves and stays to the second position P2, the second actuation module 820 can control the elevator 320 of the conveyor 300 to move along the second direction D2 such that the elevator 320 is from the first position P1. The object is moved downward to the load 埠100, thereby helping the object to move from the first position P1 of the movable buffer stage 210 and placed on the load 埠100, but the disclosure is not limited thereto.
於部分實施方式中,如第1及3圖所示,緩衝載台200係固定於一第三位置P3,且第三位置P3係不位於負載埠100的正上方。也就是說,固定緩衝載台220係位於第一軌道600所在的位置的正下方,且不位於負載埠100所在的位置的正上方。因此,在不會阻擋傳送裝置300傳送物件至負載埠100的前提下,固定緩衝載台220可增加物件之放置空間的選擇性。於部分實施方式中,傳送系統10更包含第三致動模組830,第三致動模組830係用以致動傳送裝置300從固定緩衝載台220所在的第三位置P3移動至負載埠100、或者致動傳送裝置300從負載埠100移動至固定緩衝載台220所在的第三位置P3,但本揭露不以此為限。於部分實施方式中,可移動緩衝載台210與固定緩衝載台220可並存於此傳輸系統10中,以進一步增加物件之緩衝放置空間的選擇性。 In some embodiments, as shown in FIGS. 1 and 3, the buffer stage 200 is fixed to a third position P3, and the third position P3 is not located directly above the load cassette 100. That is, the fixed buffer stage 220 is located directly below the position where the first track 600 is located, and is not located directly above the position where the load port 100 is located. Therefore, the fixed buffer stage 220 can increase the selectivity of the space in which the object is placed without obstructing the transfer device 300 from transporting the object to the load cassette 100. In some embodiments, the transport system 10 further includes a third actuation module 830 for actuating the transport device 300 to move from the third position P3 where the fixed buffer stage 220 is located to the load 埠100. Or, the actuating and transmitting device 300 is moved from the load port 100 to the third position P3 where the fixed buffer stage 220 is located, but the disclosure is not limited thereto. In some embodiments, the movable buffer stage 210 and the fixed buffer stage 220 can coexist in the transmission system 10 to further increase the selectivity of the buffer placement space of the object.
大體而言,於部分實施方式中,第一致動模組810、第二致動模組820與第三致動模組830又可被統稱為傳送裝置致動器800。傳送裝置致動器800可用以控制傳送裝置300移動於緩衝載台200(包含可移動緩衝載台210與固定緩衝載台220)與負載埠100之間,亦即,傳送裝置致動器800可用以控制水平移動裝置310與升降機320之至少一者移動。於部分實施方式中,傳送裝置致動器800可電性連接或訊號連接至傳送裝置300。於部分實施方式中,第一致動器710與第二致動器720又可被統稱為緩衝載台致動器700,且緩衝載台致動器700可電性連接或訊號連接至滑動件920,用以控制滑動件920移動,使得可移動緩衝載台210移動於第一位置P1與第二位置P2。於部分實施方式中,緩衝載台致動器700與傳送裝置致動器800之至少一者可被整合至電腦之一或多個處理裝置中。處理裝置可以是中央處理器、控制元件、微處理器、伺服器或其他可執行指令的硬體元件。在其他實施方式中,緩衝載台致動器700與傳送裝置致動器800之至少一者可由電腦之電腦程式所實現且儲存於儲存裝置中。儲存裝置包含非暫態電腦可讀取記錄媒體或其他具有儲存功能的裝置。此電腦程式包括複數個程式指令,此些程式指令可由一中央處理器來執行,從而執行各模組的功能,但本揭露不以此為限。 In general, in some embodiments, the first actuation module 810, the second actuation module 820, and the third actuation module 830 can be collectively referred to as a delivery device actuator 800. The transfer device actuator 800 can be used to control the transfer device 300 to move between the buffer stage 200 (including the movable buffer stage 210 and the fixed buffer stage 220) and the load cassette 100, that is, the transfer device actuator 800 is available At least one of the horizontal moving device 310 and the elevator 320 is controlled to move. In some embodiments, the conveyor actuator 800 can be electrically connected or signaled to the conveyor 300. In some embodiments, the first actuator 710 and the second actuator 720 may be collectively referred to as a buffer stage actuator 700, and the buffer stage actuator 700 may be electrically connected or signal-connected to the slider. 920, for controlling the movement of the slider 920, so that the movable buffer stage 210 is moved to the first position P1 and the second position P2. In some embodiments, at least one of the buffer stage actuator 700 and the conveyor actuator 800 can be integrated into one or more of the computers. The processing device can be a central processor, a control element, a microprocessor, a server, or other hardware component of executable instructions. In other embodiments, at least one of the buffer stage actuator 700 and the conveyor actuator 800 can be implemented by a computer program of a computer and stored in the storage device. The storage device includes a non-transitory computer readable recording medium or other storage device. The computer program includes a plurality of program instructions, which can be executed by a central processing unit to perform the functions of the modules, but the disclosure is not limited thereto.
於部分實施方式中,傳送裝置致動器800可電性連接或訊號連接至一原料控制系統(material control system,MCS)。原料控制系統可連接多部主機(host computer),而每一主機連接至一或多個機台400。主機中可 內嵌機台自動化程式(Equipment Automation Program,EAP),用以於原料控制系統與機台之間傳遞訊息與發佈指令,從而避免傳送裝置300於傳送物件時發生碰撞(collision)的可能性。 In some embodiments, the conveyor actuator 800 can be electrically connected or signaled to a material control system (MCS). The material control system can be connected to a plurality of host computers, and each host is connected to one or more machines 400. An instrument automation program (EAP) can be embedded in the host to transmit messages and issue commands between the material control system and the machine, thereby avoiding the possibility of collision of the transfer device 300 when transferring objects. Sex.
參照第4圖。第4圖為依據本揭露之部分實施方式之傳輸方法的流程圖。於部分實施方式中,傳輸方法包含以下步驟。於步驟S10中,判斷負載埠100是否被佔據。當負載埠100被判斷為佔據時,則執行步驟S20;當負載埠100被判斷為不被占據時,則執行步驟S12(將於稍後段落做更詳細的描述)。於步驟S20中,當負載埠100被判斷為佔據時,移動緩衝載台200至一第一位置P1,且第一位置P1係位於負載埠100的正上方。更詳細地說,當負載埠100不具有存放物件的空間時,可移動緩衝載台210會移動至第一位置P1,以提供物件放置空間。於步驟S30中,傳送一物件至位於第一位置P1的緩衝載台200上。如此一來,當負載埠100皆被佔據時,物件可選擇性地被放置於緩衝載台200上,因此,可幫助減少物件傳送於不同機台400之間的塞車現象,且減少物件傳送於不同製程機台之間的停留時間。 Refer to Figure 4. 4 is a flow chart of a transmission method in accordance with some embodiments of the present disclosure. In some embodiments, the transmission method includes the following steps. In step S10, it is judged whether or not the load port 100 is occupied. When the load 埠100 is judged to be occupied, step S20 is performed; when the load 埠100 is judged to be not occupied, step S12 is performed (to be described in more detail later). In step S20, when the load port 100 is judged to occupy, the buffer stage 200 is moved to a first position P1, and the first position P1 is located directly above the load port 100. In more detail, when the load cassette 100 does not have a space for storing articles, the movable buffer stage 210 is moved to the first position P1 to provide an object placement space. In step S30, an object is transported to the buffer stage 200 at the first position P1. In this way, when the load 埠100 is occupied, the object can be selectively placed on the buffer stage 200, thereby helping to reduce the traffic jam between the objects transmitted between the different machines 400, and reducing the transfer of objects to Residence time between different process machines.
於部分實施方式中,傳輸方法更包含以下步驟。於步驟S12中,當負載埠100被判斷為不被佔據時,移動緩衝載台200至一第二位置P2,第二位置P2係相對第一位置P1遠離負載埠100。於步驟S14中,傳送物件至負載埠100上。如此一來,物件可依據當下負載埠100的狀態,而被決定被放置於負載埠100、或緩衝載台200上,從而增加物件之放置空間的選 擇性。舉例來說,於部分實施方式中,物件可為晶圓承載單元,例如:前開式晶圓盒(Front Open Unified Pods;FOUPs)中、晶圓盒(PODs)、晶圓載具(wafer carriers)、晶圓載具(wafer carriers)、或晶圓匣(cassette),但本揭露不以此為限。於其他實施方式中,物件可光罩載具,例如:光罩載具(reticle carriers)、或光罩傳送盒(Reticle SMIF Pod;RSP),但本揭露不以此為限。 In some embodiments, the transmission method further includes the following steps. In step S12, when the load port 100 is determined not to be occupied, the buffer stage 200 is moved to a second position P2, which is away from the load port 100 with respect to the first position P1. In step S14, the object is transferred to the load cassette 100. In this way, the object can be placed on the load cassette 100 or the buffer stage 200 according to the state of the current load 埠 100, thereby increasing the selection of the space in which the object is placed. For example, in some embodiments, the object may be a wafer carrier unit, such as: Front Open Unified Pods (FOUPs), wafer cassettes (PODs), wafer carriers, Wafer carriers, or cassettes, but the disclosure is not limited thereto. In other embodiments, the article may be a reticle carrier, such as a reticle carrier, or a Reticle SMIF Pod (RSP), but the disclosure is not limited thereto.
於部分實施方式中,負載埠100更包含一物件偵測裝置130,用以偵測負載埠100是否被物件佔據,且物件偵測裝置130可回報所偵測之一負載埠狀態予傳輸系統10。相似地,緩衝載台200亦包含一物件偵測裝置230,用以偵測緩衝載台200是否被物件佔據,且物件偵測裝置230可回報所偵測之一緩衝載台狀態予傳輸系統10。舉例而言,於部分實施方式中,物件偵測裝置130與230可包含紅外線感測裝置、壓力感測裝置、光學偵測裝置、重力感測裝置,但本揭露不以此為限。 In some embodiments, the load port 100 further includes an object detecting device 130 for detecting whether the load port 100 is occupied by the object, and the object detecting device 130 can report the detected load state to the transmission system 10 . Similarly, the buffer stage 200 also includes an object detecting device 230 for detecting whether the buffer stage 200 is occupied by the object, and the object detecting device 230 can report the detected buffer stage status to the transmission system 10 . For example, in some embodiments, the object detecting devices 130 and 230 may include an infrared sensing device, a pressure sensing device, an optical detecting device, and a gravity sensing device, but the disclosure is not limited thereto.
於部分實施方式中,如第1圖所示,傳輸系統10可與一自動化物料傳輸系統20結合。自動化物料傳輸系統20可包含一機台間傳輸裝置22,機台間傳輸裝置22係用以將物件A從一機台移動至另一機台,且機台間傳輸裝置22係位於傳送裝置300之上。 In some embodiments, as shown in FIG. 1, transmission system 10 can be combined with an automated material handling system 20. The automated material transfer system 20 can include an inter-machine transfer device 22 for moving the item A from one machine to another, and the inter-machine transfer device 22 is located at the transfer device 300. Above.
舉例而言,如第1圖所示,於部分實施方式中,當機台間傳輸裝置22移動物件A從一機台至另一機台400時,若機台400之負載埠100係不被佔據的,則負載埠100之物件偵測裝置130會傳送一負載埠空缺狀態S1予傳輸系統10以及自 動化物料傳輸系統20。隨後,在緩衝載台200不位於負載埠100正上方的前提下,機台間傳輸裝置22會將物件A移動至負載埠100上。 For example, as shown in FIG. 1 , in some embodiments, when the inter-machine transmission device 22 moves the object A from one machine to another, if the load of the machine 400 is not 100 Occupied, the object detecting device 130 of the load port 100 transmits a load 埠 vacancy state S1 to the transport system 10 and the automated material transfer system 20. Subsequently, the inter-machine transfer device 22 moves the object A onto the load cassette 100 on the premise that the buffer stage 200 is not directly above the load cassette 100.
舉例而言,於其他實施方式中,如第2圖所示,當機台間傳輸裝置22從一機台移動物件B至另一機台400時,若機台400之負載埠100係被物件C所佔據的,則負載埠100之物件偵測裝置130會傳送一負載埠佔據狀態S2予傳輸系統10以及自動化物料傳輸系統20。隨後,傳輸系統10與自動化物料傳輸系統20會詢問在緩衝載台200是否被佔據。若緩衝載台200係不被佔據的,則緩衝載台200之物件偵測裝置230會傳送一緩衝載台空缺狀態S3予傳輸系統10以及自動化物料傳輸系統20,驅使緩衝載台200會沿著第三方向D3移動至第一位置P1,以使得機台間傳輸裝置22可將物件B移動至緩衝載台200上。隨後,當機台400處於閒置狀態時,亦即,沒有任何物件之內容物(例如:晶圓)在機台400中執行半導體製程時,機台400會回報一卸載完成訊息予傳輸系統10與自動化物料傳輸系統20。接著,傳輸系統10之傳送裝置300可將完成製程之物件C移動至可移動緩衝載台210上、或傳送裝置300可將完成製程之物件C移動至固定緩衝載台220上、或自動化物料傳輸系統20之機台間傳輸裝置22可將物件C從負載埠100移動至另一機台,但本揭露不以此為限。因此,物件C可從負載埠100離開。當負載埠100係不被物件所佔據的,負載埠100之物件偵測裝置130會傳送一負載埠空缺狀態S1予傳輸系統10以及自動化物料傳輸系統20。隨後,傳送裝置300可將位於緩衝載台 200之物件B移動至負載埠100上。值得注意的,此處僅係用以說明當傳輸系統10與自動化物料傳輸系統20結合時,物件的傳送方法,不應以此限制本揭露。在實際應用上,傳輸系統10與自動化物料傳輸系統20可依據當下的狀況,例如:機台間傳輸裝置22的狀況、機台400的製程狀況、負載埠100被佔據的狀況、緩衝載台200被佔據的狀況、或機台400的其他相關狀態…等,邏輯性地控制傳輸系統10與自動化物料傳輸系統20的傳送路徑,但本揭露不以此為限。 For example, in other embodiments, as shown in FIG. 2, when the inter-machine transfer device 22 moves the object B from one machine to the other, if the load of the machine 400 is 100, the object is The object detecting device 130 of the load 埠100, which is occupied by C, transmits a load 埠 occupation state S2 to the transmission system 10 and the automated material transfer system 20. Subsequently, the transport system 10 and the automated material transfer system 20 will ask if the buffer stage 200 is occupied. If the buffer stage 200 is not occupied, the object detecting device 230 of the buffer stage 200 transmits a buffer stage vacancy state S3 to the transmission system 10 and the automated material transfer system 20, driving the buffer stage 200 along The third direction D3 is moved to the first position P1 such that the inter-machine transfer device 22 can move the object B onto the buffer stage 200. Then, when the machine 400 is in an idle state, that is, when there is no object content (for example, a wafer) to perform a semiconductor process in the machine 400, the machine 400 returns an unloading completion message to the transmission system 10 and Automated material transfer system 20. Next, the transport device 300 of the transport system 10 can move the finished object C to the movable buffer stage 210, or the transport device 300 can move the finished object C to the fixed buffer stage 220, or automate material transfer. The inter-machine transfer device 22 of the system 20 can move the object C from the load cassette 100 to another machine, but the disclosure is not limited thereto. Therefore, the object C can exit from the load 埠100. When the load 埠 100 is not occupied by the object, the object detecting device 130 of the load 埠 100 transmits a load 埠 vacant state S1 to the transport system 10 and the automated material transfer system 20. Subsequently, the transport device 300 can move the object B located on the buffer stage 200 onto the load cassette 100. It should be noted that the method for transmitting the object when the transmission system 10 is combined with the automated material transfer system 20 is merely used herein, and the disclosure should not be limited. In practical applications, the transmission system 10 and the automated material transfer system 20 may be based on current conditions, such as the condition of the inter-machine transmission device 22, the process status of the machine 400, the condition occupied by the load 埠 100, and the buffer stage 200. The occupied condition, or other related state of the machine 400, etc., logically controls the transmission path of the transmission system 10 and the automated material transfer system 20, but the disclosure is not limited thereto.
於部分實施方式中,傳輸系統10可包含一製造執行系統(Manufacturing Execution System;MES),製造執行系統可具有規劃物件之傳送路徑的功能、最佳化物件之傳送路徑的功能、或紀錄物件之傳送路徑的功能…等功能。傳輸系統10之緩衝載台致動器700係依據製造執行系統所發出的指令,控制可移動緩衝載台210於第一位置P1與第二位置P2之間移動。傳輸系統10之傳送裝置致動器800亦係依據製造執行系統所發出的指令,控制傳送裝置300在負載埠100與緩衝載台200之間傳送物件。 In some embodiments, the transmission system 10 can include a Manufacturing Execution System (MES), which can have the function of planning the transmission path of the object, the function of the transmission path of the optimal material, or the record object. The function of the transmission path...etc. The buffer stage actuator 700 of the transmission system 10 controls the movable buffer stage 210 to move between the first position P1 and the second position P2 in accordance with an instruction issued by the manufacturing execution system. The conveyor actuator 800 of the transmission system 10 also controls the conveyor 300 to transfer items between the load cassette 100 and the buffer stage 200 in accordance with instructions issued by the manufacturing execution system.
於部分實施方式中,傳輸系統10可包含一即時派工系統(Real-Time Dispatching System;RTD)。當機台400閒置狀態時,亦即,物件於機台400所執行半導體製程完成時,機台400會回報一卸載完成訊息予製造執行系統。製造執行系統會詢問即時派工系統此物件接下來欲搬運到哪一機台上。當即時派工系統回覆製造執行系統時,製造執行系統即傳送一搬運指令給傳送裝置致動器800。接著,傳送裝置致動器800會 控制傳送裝置300將物件搬離負載埠100。相似地,當機台400回報一載入完成訊息予製造執行系統時,亦即,物件中的內容物已進入機台400。製造執行系統會詢問接下來欲搬運哪一批物件到機台400,然後即時派工系統會給製造執行系統一製程清單,其中載明所欲進行機台400之半導體製程的物件清單。隨後,製造執行系統會傳送一搬運指令給傳送裝置致動器800,傳送裝置致動器800可控制傳送裝置300將另一物件傳送至負載埠100上。 In some embodiments, the transmission system 10 can include a Real-Time Dispatching System (RTD). When the machine 400 is in an idle state, that is, when the semiconductor process performed by the machine 400 is completed, the machine 400 reports an unloading completion message to the manufacturing execution system. The manufacturing execution system will ask the instant dispatch system which machine the object will next be transported to. When the instant dispatch system replies to the manufacturing execution system, the manufacturing execution system transmits a handling command to the conveyor actuator 800. Next, the conveyor actuator 800 controls the conveyor 300 to move the item away from the load port 100. Similarly, when the machine 400 reports a load completion message to the manufacturing execution system, that is, the contents of the object have entered the machine 400. The manufacturing execution system will ask which batch of objects to be transported to the machine 400 next, and then the immediate dispatching system will give the manufacturing execution system a process list containing a list of objects for the semiconductor process of the machine 400 to be performed. Subsequently, the manufacturing execution system transmits a handling command to the conveyor actuator 800, which can control the conveyor 300 to transfer another item to the load cassette 100.
於上述之一或多個實施方式中,傳輸系統包含負載埠、複數第一軌道、水平移動裝置、升降機、至少一第二軌道與緩衝載台。負載埠係設置於與半導體製程有關之機台。至少部分的第一軌道之間的空間係位於負載埠之正上方。水平移動裝置係可移動性地耦合第一軌道。升降機係設置於水平移動裝置。第二軌道具有連續的第一區段與第二區段,第一區段係位於第一軌道之間的空間的正下方,且第二區段係不位於第一軌道之間的空間的正下方。第一緩衝載台係可移動性地耦合第二軌道。如此一來,緩衝載台可不位於負載埠的正上方,故物件可選擇性地被放置於負載埠或緩衝載台上,從而增加物件之放置空間的選擇性。因此,傳輸系統可幫助減少物件傳送於不同機台之間的塞車現象,且減少物件傳送於不同機台之間的停留時間。 In one or more of the above embodiments, the transmission system includes a load port, a plurality of first tracks, a horizontal moving device, an elevator, at least one second track, and a buffer stage. The load system is set on a machine associated with the semiconductor process. At least a portion of the space between the first tracks is located directly above the load. The horizontal moving device is movably coupled to the first track. The elevator is installed in a horizontal moving device. The second track has a continuous first section and a second section, the first section being directly below the space between the first rails, and the second section being positive of the space not located between the first rails Below. The first buffer stage is movably coupled to the second track. In this way, the buffer stage can be located not directly above the load raft, so that the object can be selectively placed on the load raft or the buffer stage, thereby increasing the selectivity of the space in which the object is placed. Therefore, the transport system can help reduce the traffic jam between objects transported between different machines and reduce the dwell time between items being transported between different machines.
上述已概述數個實施方式的特徵,因此熟習此技藝者可更了解本揭露之態樣。熟悉此技藝者應了解到,其可輕易地利用本揭露做為基礎,來設計或潤飾其他製程與結構,以 實現與在此所介紹之實施方式相同之目的及/或達到相同的優點。熟悉此技藝者也應了解到,這類均等架構並未脫離本揭露之精神和範圍,且熟悉此技藝者可在不脫離本揭露之精神和範圍下,進行各種之更動、取代與潤飾。 The features of the several embodiments have been summarized above, and those skilled in the art will appreciate the aspects of the disclosure. Those skilled in the art will appreciate that the present disclosure can be readily utilized to design or refine other processes and structures to achieve the same objectives and/or the same advantages as the embodiments described herein. It is to be understood by those skilled in the art that the present invention is not limited to the spirit and scope of the disclosure, and various modifications, substitutions, and alterations may be made without departing from the spirit and scope of the disclosure.
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