TW201824424A - Leveling equipment for chip-carrying sheet capable of moving a leveling equipment under the condition that the chip-carrying sheet is in a leveling state - Google Patents

Leveling equipment for chip-carrying sheet capable of moving a leveling equipment under the condition that the chip-carrying sheet is in a leveling state Download PDF

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TW201824424A
TW201824424A TW105143268A TW105143268A TW201824424A TW 201824424 A TW201824424 A TW 201824424A TW 105143268 A TW105143268 A TW 105143268A TW 105143268 A TW105143268 A TW 105143268A TW 201824424 A TW201824424 A TW 201824424A
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leveling
sheet
die
chip
carrier sheet
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TW105143268A
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TWI598981B (en
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何毓民
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技鼎股份有限公司
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Abstract

The present invention provides a leveling equipment of a chip-carrying sheet, comprising a back-side leveling device, a front-side sucking device, a moving device, and a controller. A holding seat of the front-side sucking device has a chip-carrying sheet sucking surface facing the front surface of a chip-carrying sheet. The vacuum suction members respectively correspond to the dicing channel on the front surface of a chip-carrying sheet under the condition that the chip-carrying sheet sucking surface faces the front surface of the chip-carrying sheet. The controller makes the vacuum suction members of the front-side sucking device suck the dicing channel on the front surface of the chip-carrying sheet under the condition that the chip-carrying sheet is maintained at a flat level by the back-side leveling device, so that the front-side sucking device holds the chip-carrying sheet in a leveling state. And, when the front-side sucking device holds the chip-carrying sheet in a leveling state, the moving device moves the front-side sucking device of the chip-carrying sheet to deliver the chip-carrying sheet in a leveling state.

Description

晶粒承載片整平設備Grain carrier sheet leveling equipment

本發明相關於一種整平設備,特別是相關於一種可在整平狀態下移動晶粒承載片的晶粒承載片整平設備。The present invention relates to a leveling device, and in particular, to a die-loading sheet leveling device capable of moving a die-loading sheet in a flattened state.

半導體晶圓通常由矽或複數元素之化合物形成之單結晶材料所構成,廣泛應用於製造電子零件材料。半導體晶圓的製造方式,首先將熔融的材料拉成單晶的圓柱狀之鑄塊,再切片成基板狀,並進行研磨以得到希望的厚度。Semiconductor wafers are usually composed of single crystalline materials made of silicon or multiple element compounds, and are widely used in the manufacture of electronic component materials. In the manufacturing method of a semiconductor wafer, a molten material is first drawn into a single-crystal cylindrical ingot, then sliced into a substrate shape, and then polished to obtain a desired thickness.

然而,隨著半導體產業的技術發展,為求更好的效能、更小的產品體積,半導體晶圓的厚度通常被限制在毫米的等級。這樣薄的厚度,致使晶圓容易發生翹曲,嚴重影響到後續加工以及檢測的精準度。雖然有些方式可以暫時整平晶圓,例如利用具有真空吸力的裝置吸附晶圓的背面以使晶圓暫時被拉平,但一旦晶圓離開該裝置,晶圓又會回復到翹曲的狀態。因此此種方式只能在一個固定的位置使晶圓暫時被整平,並沒有辦法讓晶圓保持整平地在各個加工、量測設備之間移動。而加工設備對翹曲的晶圓執行加工就會出現誤差、降低良率,量測設備也難以對翹曲的晶圓直接進行檢測。However, with the technological development of the semiconductor industry, for better efficiency and smaller product volume, the thickness of semiconductor wafers is usually limited to the millimeter level. Such a thin thickness makes the wafer prone to warp, which seriously affects the accuracy of subsequent processing and inspection. Although some methods can temporarily level the wafer, such as using a vacuum suction device to suck the back of the wafer to temporarily flatten the wafer, once the wafer leaves the device, the wafer will return to a warped state. Therefore, this method can only temporarily level the wafer at a fixed position, and there is no way to keep the wafer level and move between various processing and measuring equipment. The processing equipment performs errors on the warped wafer, which reduces the yield, and it is difficult for the measurement equipment to directly detect the warped wafer.

因此,為解決上述問題,本發明的目的即在提供一種可在整平狀態下移動晶粒承載片的晶粒承載片整平設備。Therefore, in order to solve the above-mentioned problems, an object of the present invention is to provide a die-bearing sheet leveling device capable of moving the die-bearing sheet in a flattened state.

本發明為解決習知技術之問題所採用之技術手段係提供一種晶粒承載片整平設備,包含:一背面整平裝置,係藉由附接至一待整平的晶粒承載片之背面而將該晶粒承載片保持在一整平狀態;一正面吸附裝置,包括一吸持座及複數個真空吸件,該吸持座具有面向該晶粒承載片之正面的一晶粒承載片吸持面,該複數個真空吸件以一預設的設置位置設置於該晶粒承載片吸持面,而該複數個真空吸件在該晶粒承載片吸持面對應於該晶粒承載片之正面的狀態下為各別對應於在該晶粒承載片之正面形成的一切割槽道;以及一移動裝置,連接於該正面吸附裝置而得以移動該正面吸附裝置;以及一控制裝置,訊號連接於該背面整平裝置、該移動裝置及該正面吸附裝置,其中,該控制裝置經設置而:在該晶粒承載片藉由該背面整平裝置保持在該整平狀態的情況下,使該正面吸附裝置以該複數個真空吸件吸附該晶粒承載片之正面的該切割槽道,並透過控制該背面整平裝置,而在該正面吸附裝置以該複數個真空吸件吸附該晶粒承載片之正面的該切割槽道之後使該背面整平裝置脫離與該晶粒承載片的附接,使該正面吸附裝置為持取在該整平狀態下的該晶粒承載片,以及在該正面吸附裝置持取在該整平狀態下的該晶粒承載片的情況下,使該移動裝置移動該正面吸附裝置,而移送在該整平狀態下的該晶粒承載片。The technical means adopted by the present invention to solve the problems of the conventional technology is to provide a die-bearing sheet leveling device, including: a back-side leveling device, which is attached to the back of a die-bearing sheet to be leveled The die carrier sheet is maintained in a flat state; a front surface adsorption device includes a holding seat and a plurality of vacuum suction members, and the holding seat has a die carrier sheet facing the front side of the die carrier sheet. Holding surface, the plurality of vacuum suction members are set on the holding surface of the die carrier sheet with a preset setting position, and the plurality of vacuum holding members on the holding surface of the die carrier sheet correspond to the die carrier The state of the front side of the sheet is a cutting channel corresponding to the front surface of the die carrier sheet; and a moving device connected to the front side suction device to move the front side suction device; and a control device, The signal is connected to the back surface leveling device, the mobile device, and the front surface adsorption device, wherein the control device is arranged to: in a case where the die carrier sheet is maintained in the leveled state by the back surface leveling device, Make The front surface adsorption device uses the plurality of vacuum suction members to adsorb the cutting channel on the front surface of the grain bearing sheet, and through controlling the back surface leveling device, the front surface adsorption device uses the plurality of vacuum suction members to adsorb the crystal particles. After the cutting channel on the front side of the carrier sheet, the back surface leveling device is detached from the attachment to the die carrier sheet, so that the front surface adsorption device is to hold the die carrier sheet in the leveled state, and In the case where the front surface adsorption device holds the crystal bearing sheet in the flattened state, the moving device moves the front surface adsorption device to transfer the crystal grain bearing sheet in the flattened state.

在本發明的一實施例中係提供一種晶粒承載片整平設備,該背面整平裝置包括一整平承台及複數個真空觸件,該複數個真空觸件貫穿設置於該整平承台。In one embodiment of the present invention, a die-bearing wafer leveling device is provided. The back-side leveling device includes a leveling stand and a plurality of vacuum contacts. The plurality of vacuum contacts are disposed through the leveling support. station.

在本發明的一實施例中係提供一種晶粒承載片整平設備,該背面整平裝置更包括一移動載座,連接於該整平承台,而帶動該整平承台在一校準平面上調整位置。According to an embodiment of the present invention, there is provided a chip-bearing sheet leveling device. The back-leveling device further includes a moving carrier connected to the leveling platform, and driving the leveling platform to a calibration plane. Adjust the position.

在本發明的一實施例中係提供一種晶粒承載片整平設備,該背面整平裝置更包括一校準用影像擷取構件,訊號連接該整平承台,該校準用影像擷取構件用以拍攝一校準影像供該整平承台調整位置。According to an embodiment of the present invention, there is provided a chip-bearing sheet leveling device. The back-leveling device further includes a calibration image capturing component. A signal is connected to the leveling platform. The calibration image capturing component is used for the calibration. A calibration image is taken for the leveling platform to adjust the position.

在本發明的一實施例中係提供一種晶粒承載片整平設備,該吸持座係呈圓盤狀而形狀對應一晶圓。According to an embodiment of the present invention, a die-bearing wafer leveling device is provided. The holding seat is in the shape of a disc and corresponds to a wafer.

在本發明的一實施例中係提供一種晶粒承載片整平設備,該複數個真空吸件的該預設的設置位置為在該晶粒承載片吸持面對應於該晶粒承載片之正面的狀態下為各別對應於在該晶粒承載片之正面形成的切割槽道的交會點。In one embodiment of the present invention, there is provided a die-bearing sheet leveling device. The preset setting positions of the plurality of vacuum suction members are on the die-bearing sheet holding surface corresponding to the die-bearing sheet. In the state of the front face, the intersection points corresponding to the cutting channels formed on the front face of the die carrier sheet respectively.

在本發明的一實施例中係提供一種晶粒承載片整平設備,更包括一晶粒承載片檢測影像擷取裝置,係訊號連接該控制裝置,該晶粒承載片檢測影像擷取裝置係於該晶粒承載片的正面而檢測該整平狀態下的該晶粒承載片。According to an embodiment of the present invention, a die-bearing sheet leveling device is provided, and further includes a die-bearing sheet detection image capture device connected to the control device. The die-bearing sheet detection image capture device is The grain bearing sheet in the flattened state is detected on the front side of the grain bearing sheet.

經由本發明所採用之技術手段,可在晶粒承載片保持整平狀態下送往各個加工、量測設備,使加工、量測更容易、省時,因而增加生產良率、降低生產成本。Through the technical means adopted by the present invention, the die carrier sheet can be sent to various processing and measuring equipments while keeping the flat state, so that processing and measuring are easier and time-saving, thereby increasing production yield and reducing production costs.

本發明所採用的具體實施例,將藉由以下之實施例及附呈圖式作進一步之說明。The specific embodiments used in the present invention will be further explained by the following embodiments and accompanying drawings.

以下根據第1圖至第7圖,而說明本發明的實施方式。該說明並非為限制本發明的實施方式,而為本發明之實施例的一種。Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 7. This description is not intended to limit the embodiment of the present invention, but is an example of the embodiment of the present invention.

如第1圖所示,本發明之一實施例之晶粒承載片整平設備100,包括一背面整平裝置1、一正面吸附裝置2、一移動裝置3及一控制裝置4。As shown in FIG. 1, a die carrier wafer leveling device 100 according to an embodiment of the present invention includes a back surface leveling device 1, a front surface adsorption device 2, a moving device 3, and a control device 4.

背面整平裝置1係藉由附接至一待整平的晶粒承載片W之背面而將晶粒承載片W保持在一整平狀態。晶粒承載片W可以是一片尚未切割的晶圓,或者是扇出製程中的薄片狀的晶粒承載體(複數個晶粒黏合於一基板),且本發明不限於此。在本實施例中,背面整平裝置1是一種運用真空吸力以整平晶粒承載片W的裝置,包括一整平承台11及複數個真空觸件12,複數個真空觸件12貫穿設置於整平承台11,而可自整平承台11的表面凸伸。詳細來說,如第3圖及第4圖所示,複數個真空觸件12自整平承台11的表面凸伸,以使各個真空觸件12碰觸到待整平的晶粒承載片W的背面。由於晶粒承載片W可能翹曲的緣故,複數個真空觸件12凸伸的長度也不同。這些真空觸件12同時具有觸碰探測以及真空吸嘴的功能。當真空觸件12都碰觸到晶粒承載片W的背面,則利用真空的吸力將晶粒承載片W向下拉平,以使原本翹曲的晶粒承載片W被整平在一個平面上。然而本發明不限於此,亦可以利用其他整平方式或不同的機構將晶粒承載片W整平。The back surface leveling device 1 maintains the die carrier sheet W in a flattened state by being attached to the back surface of a die carrier sheet W to be leveled. The die carrier sheet W may be a wafer that has not been cut, or a sheet-like die carrier (a plurality of die are adhered to a substrate) in a fan-out process, and the present invention is not limited thereto. In this embodiment, the back surface leveling device 1 is a device that uses vacuum suction to level the wafer carrier sheet W, and includes a leveling platform 11 and a plurality of vacuum contacts 12, and the plurality of vacuum contacts 12 are disposed through The leveling base 11 can be protruded from the surface of the leveling base 11. In detail, as shown in FIG. 3 and FIG. 4, the plurality of vacuum contacts 12 protrude from the surface of the leveling base 11, so that each vacuum contact 12 touches the die carrier sheet to be leveled. The back of W. Due to the possible warpage of the die carrier sheet W, the protruding lengths of the plurality of vacuum contacts 12 are also different. These vacuum contacts 12 have both touch detection and vacuum nozzle functions. When the vacuum contacts 12 all touch the back of the die carrier sheet W, the die carrier sheet W is pulled down by vacuum suction, so that the originally warped die carrier sheet W is leveled on a plane. . However, the present invention is not limited to this, and other die-leveling methods or different mechanisms may be used to level the die-bearing sheet W.

如第1圖及第2圖所示,正面吸附裝置2包括一吸持座21及複數個真空吸件22。吸持座21具有面向晶粒承載片W之正面的一晶粒承載片吸持面F,複數個真空吸件22以一預設的設置位置設置於晶粒承載片吸持面F,而複數個真空吸件22在晶粒承載片吸持面F對應於晶粒承載片W之正面的狀態下為各別對應於在晶粒承載片W之正面形成的一切割槽道C(繪於第5圖)。在本實施例中,吸持座21係呈圓盤狀而形狀對應一晶圓,可視產品的不同而形狀對應例如8吋晶圓、12吋晶圓,然而本發明不限於此,吸持座21可形狀對應一方形基板而呈方形。在本實施例中,複數個真空吸件22的該預設的設置位置為在晶粒承載片吸持面F對應於晶粒承載片W之正面的狀態下為各別對應於在晶粒承載片W之正面形成的切割槽道C的交會點,然而本發明不限於此。As shown in FIGS. 1 and 2, the front suction device 2 includes a suction holder 21 and a plurality of vacuum suction members 22. The holding base 21 has a die-bearing sheet holding surface F facing the front side of the die-bearing sheet W. A plurality of vacuum suction members 22 are arranged at a predetermined setting position on the die-holding sheet holding surface F, and a plurality of Each vacuum suction member 22 corresponds to a cutting channel C (drawn in the first section) formed on the front surface of the die carrier sheet W in a state where the die carrier sheet holding surface F corresponds to the front face of the die carrier sheet W. Figure 5). In this embodiment, the holding base 21 has a disc shape and a shape corresponding to a wafer, and the shape may correspond to, for example, an 8-inch wafer and a 12-inch wafer depending on the product. However, the present invention is not limited to this. 21 may have a square shape corresponding to a square substrate. In this embodiment, the preset positions of the plurality of vacuum suction members 22 are respectively corresponding to the state where the die carrier sheet holding surface F corresponds to the front side of the die carrier sheet W corresponding to the die carrier. The intersection of the cutting channels C formed on the front surface of the sheet W, but the present invention is not limited to this.

移動裝置3連接於正面吸附裝置2而得以移動正面吸附裝置2。在本實施例中,如第1圖所示,移動裝置3可在水平方向上(上端雙箭頭所示)移動正面吸附裝置2。且本發明不限於此,亦可以在水平平面上或垂直方向上(Z軸)移動正面吸附裝置2。The moving device 3 is connected to the front suction device 2 to move the front suction device 2. In this embodiment, as shown in FIG. 1, the moving device 3 can move the front suction device 2 in a horizontal direction (shown by a double arrow on the upper end). In addition, the present invention is not limited to this, and the front adsorption device 2 may be moved in a horizontal plane or a vertical direction (Z axis).

控制裝置4訊號連接於背面整平裝置1、移動裝置3及正面吸附裝置2。如第5圖所示,控制裝置4經設置而在晶粒承載片W藉由背面整平裝置1保持在整平狀態的情況下,使正面吸附裝置2以複數個真空吸件22吸附晶粒承載片W之正面的切割槽道C,並如第6圖所示,透過控制背面整平裝置1,而在正面吸附裝置2以複數個真空吸件22吸附晶粒承載片W之正面的切割槽道C之後使背面整平裝置1脫離與晶粒承載片W的附接,使正面吸附裝置2為持取在整平狀態下的晶粒承載片W。並且,如第7圖所示,控制裝置4經設置而在正面吸附裝置2持取在整平狀態下的晶粒承載片W的情況下,使移動裝置3(繪於第1圖)移動正面吸附裝置2,而移送在整平狀態下的晶粒承載片W。The control device 4 is connected to the back leveling device 1, the mobile device 3, and the front adsorption device 2 by signals. As shown in FIG. 5, the control device 4 is arranged to cause the front surface adsorption device 2 to adsorb the crystal grains with the plurality of vacuum suction members 22 in a case where the die carrier sheet W is maintained in a flat state by the back surface leveling device 1. As shown in FIG. 6, the cutting channel C on the front surface of the carrier sheet W is controlled by the back surface leveling device 1, and the front surface adsorption device 2 uses a plurality of vacuum suction members 22 to adsorb the cut of the front surface of the wafer carrier sheet W. After the channel C, the back surface leveling device 1 is detached from the attachment with the die carrier sheet W, so that the front surface adsorption device 2 is holding the die carrier sheet W in the leveled state. In addition, as shown in FIG. 7, the control device 4 is provided to move the moving device 3 (drawn in FIG. 1) when the front surface suction device 2 holds the die carrier sheet W in a flat state. The adsorption device 2 transfers the die-carrying sheet W in the flattened state.

由於正面吸附裝置2以複數個真空吸件22吸附晶粒承載片W之正面的切割槽道C,因此可在不碰傷晶粒承載片W之正面的晶粒的情況下移送晶粒承載片W。Since the front surface adsorption device 2 uses a plurality of vacuum suction members 22 to adsorb the cutting channel C on the front surface of the die carrier sheet W, the die carrier sheet can be transferred without damaging the die on the front side of the die carrier sheet W. W.

進一步地,如第1圖所示,在本實施例中,背面整平裝置1更包括一移動載座13,連接於整平承台11,而帶動整平承台11在一校準平面上調整位置。Further, as shown in FIG. 1, in this embodiment, the back surface leveling device 1 further includes a moving carrier 13 connected to the leveling platform 11, and the leveling platform 11 is driven to adjust on a calibration plane. position.

進一步地,在本實施例中,背面整平裝置1更包括一校準用影像擷取構件,訊號連接整平承台11。校準用影像擷取構件用以拍攝一校準影像供整平承台11調整位置。Further, in this embodiment, the back surface leveling device 1 further includes an image capturing member for calibration, and a signal is connected to the leveling platform 11. The calibration image capturing component is used to capture a calibration image for the leveling platform 11 to adjust the position.

進一步地,在本實施例中,晶粒承載片整平設備100更包括一晶粒承載片檢測影像擷取裝置,係訊號連接控制裝置4,該晶粒承載片檢測影像擷取裝置係於晶粒承載片W的正面而檢測整平狀態下的晶粒承載片W。Further, in this embodiment, the die carrier chip leveling device 100 further includes a die carrier chip detection image capture device, which is a signal connection control device 4, and the die carrier chip detection image capture device is provided on the wafer. The grain bearing sheet W is detected on the front side of the grain bearing sheet W in a flat state.

綜上所述,本發明的晶粒承載片整平設備100不僅可自晶粒承載片W的背面整平晶粒承載片W,並且能在晶粒承載片W保持整平狀態下送往各個加工、量測設備,使加工、量測更容易、省時,因而增加生產良率、降低生產成本。In summary, the die carrier sheet leveling apparatus 100 of the present invention can not only level the die carrier sheet W from the back of the die carrier sheet W, but also can send the die carrier sheet W to each of them while the die carrier sheet W remains leveled. Processing and measuring equipment makes processing and measuring easier and saves time, thus increasing production yield and reducing production costs.

以上之敘述以及說明僅為本發明之較佳實施例之說明,對於此項技術具有通常知識者當可依據以下所界定申請專利範圍以及上述之說明而作其他之修改,惟此些修改仍應是為本發明之發明精神而在本發明之權利範圍中。The above descriptions and descriptions are merely illustrations of the preferred embodiments of the present invention. Those with ordinary knowledge of this technology may make other modifications based on the scope of the patent application defined below and the above description, but these modifications should still be made. It is the spirit of the present invention and is within the scope of the present invention.

100‧‧‧晶粒承載片整平設備 100‧‧‧ Grain carrier sheet leveling equipment

1‧‧‧晶粒承載片背面整平裝置 1‧‧‧Flat-leveling device for die carrier sheet

11‧‧‧整平承台 11‧‧‧leveling platform

12‧‧‧真空觸件 12‧‧‧vacuum contacts

13‧‧‧移動載座 13‧‧‧mobile carrier

2‧‧‧晶粒承載片正面吸附裝置 2‧‧‧Front-side adsorption device for grain bearing sheet

21‧‧‧吸持座 21‧‧‧ Holding seat

22‧‧‧真空吸件 22‧‧‧Vacuum suction

3‧‧‧移動裝置 3‧‧‧ mobile device

4‧‧‧控制裝置 4‧‧‧control device

C‧‧‧切割槽道 C‧‧‧ cutting channel

F‧‧‧晶粒承載片吸持面 F‧‧‧ Grain-bearing sheet suction surface

W‧‧‧晶粒承載片 W‧‧‧ Die Carrier Sheet

第1圖為顯示根據本發明一實施例的晶粒承載片整平設備之示意圖。 第2圖為顯示根據本發明的實施例的晶粒承載片正面吸附裝置之示意圖。 第3圖至第4圖為顯示背面整平裝置整平一晶粒承載片之示意圖。 第5圖至第6圖為顯示正面吸附裝置持取在整平狀態下的晶粒承載片之示意圖。 第7圖為顯示移送在整平狀態下的晶粒承載片之示意圖。FIG. 1 is a schematic diagram showing a die carrier wafer leveling apparatus according to an embodiment of the present invention. FIG. 2 is a schematic diagram showing a front surface adsorption device of a die carrier sheet according to an embodiment of the present invention. Figures 3 to 4 are schematic diagrams showing a flattening device for flattening a die-bearing sheet by the back-leveling device. FIG. 5 to FIG. 6 are schematic diagrams showing a die carrier sheet held by the front adsorption device in a flat state. FIG. 7 is a schematic diagram showing a die carrier sheet transferred in a flattened state.

Claims (7)

一種晶粒承載片整平設備,包含: 一背面整平裝置,係藉由附接至一待整平的晶粒承載片之背面而將該晶粒承載片保持在一整平狀態; 一正面吸附裝置,包括一吸持座及複數個真空吸件,該吸持座具有面向該晶粒承載片之正面的一晶粒承載片吸持面,該複數個真空吸件以一預設的設置位置設置於該晶粒承載片吸持面,而該複數個真空吸件在該晶粒承載片吸持面對應於該晶粒承載片之正面的狀態下為各別對應於在該晶粒承載片之正面形成的一切割槽道;以及 一移動裝置,連接於該正面吸附裝置而得以移動該正面吸附裝置;以及 一控制裝置,訊號連接於該背面整平裝置、該移動裝置及該正面吸附裝置, 其中,該控制裝置經設置而: 在該晶粒承載片藉由該背面整平裝置保持在該整平狀態的情況下,使該正面吸附裝置以該複數個真空吸件吸附該晶粒承載片之正面的該切割槽道,並透過控制該背面整平裝置,而在該正面吸附裝置以該複數個真空吸件吸附該晶粒承載片之正面的該切割槽道之後使該背面整平裝置脫離與該晶粒承載片的附接,使該正面吸附裝置為持取在該整平狀態下的該晶粒承載片,以及 在該正面吸附裝置持取在該整平狀態下的該晶粒承載片的情況下,使該移動裝置移動該正面吸附裝置,而移送在該整平狀態下的該晶粒承載片。A die-bearing sheet leveling device includes: a back-side leveling device for maintaining the die-bearing sheet in a flat state by being attached to the back surface of a die-bearing sheet to be leveled; The adsorption device includes a holding base and a plurality of vacuum suction parts. The holding base has a holding surface of a die-carrying sheet facing the front side of the die-carrying sheet. The plurality of vacuum suction parts are provided in a preset setting. The position is set on the holding surface of the die carrier sheet, and the plurality of vacuum suction members respectively correspond to the holding of the die carrier in a state where the holding surface of the die carrier sheet corresponds to the front side of the die carrier sheet. A cutting channel formed on the front surface of the sheet; and a moving device connected to the front suction device so that the front suction device can be moved; and a control device connected to the back leveling device, the moving device and the front suction A device, wherein the control device is arranged to: when the die carrier sheet is maintained in the flat state by the back surface leveling device, cause the front surface adsorption device to adsorb the crystal particles with the plurality of vacuum suction members Bear The cutting channel on the front surface of the sheet is controlled by the back surface leveling device, and the back surface is leveled after the front surface adsorption device adsorbs the cutting channel on the front surface of the grain bearing sheet with the plurality of vacuum suction members. The device is detached from the attachment of the crystal grain bearing sheet, so that the front surface adsorption device is holding the crystal grain bearing sheet in the flat state, and the front surface adsorption device is holding the crystal grain in the flat state. In the case of a granular carrier sheet, the moving device is moved to the front adsorption device, and the grain carrier sheet in the flattened state is transferred. 如請求項1所述之晶粒承載片整平設備,其中該背面整平裝置包括一整平承台及複數個真空觸件,該複數個真空觸件貫穿設置於該整平承台。The grain-bearing wafer leveling device according to claim 1, wherein the back-surface leveling device includes a leveling platform and a plurality of vacuum contacts, and the plurality of vacuum contacts are disposed through the leveling platform. 如請求項2所述之晶粒承載片整平設備,其中該背面整平裝置更包括一移動載座,連接於該整平承台,而帶動該整平承台在一校準平面上調整位置。The chip-bearing chip leveling device according to claim 2, wherein the back-leveling device further includes a moving carrier connected to the leveling platform, and driving the leveling platform to adjust the position on a calibration plane . 如請求項3所述之晶粒承載片整平設備,其中該背面整平裝置更包括一校準用影像擷取構件,訊號連接該整平承台,該校準用影像擷取構件用以拍攝一校準影像供該整平承台調整位置。The chip-bearing sheet leveling device according to claim 3, wherein the back-leveling device further includes a calibration image capturing component, and a signal is connected to the leveling platform, and the calibration image capturing component is used to shoot a A calibration image is provided for the leveling platform to adjust the position. 如請求項1所述之晶粒承載片整平設備,其中該吸持座係呈圓盤狀而形狀對應一晶圓。The die carrier wafer leveling apparatus according to claim 1, wherein the holding seat is in a disc shape and corresponds to a wafer. 如請求項1所述之晶粒承載片整平設備,其中該複數個真空吸件的該預設的設置位置為在該晶粒承載片吸持面對應於該晶粒承載片之正面的狀態下為各別對應於在該晶粒承載片之正面形成的切割槽道的交會點。The die carrier sheet leveling device according to claim 1, wherein the preset setting positions of the plurality of vacuum suction members are in a state where the die carrier sheet holding surface corresponds to the front side of the die carrier sheet Below are the intersections corresponding to the cutting channels formed on the front surface of the die carrier sheet, respectively. 如請求項1所述之晶粒承載片整平設備,更包括一晶粒承載片檢測影像擷取裝置,係訊號連接該控制裝置,該晶粒承載片檢測影像擷取裝置係於該晶粒承載片的正面而檢測該整平狀態下的該晶粒承載片。The die-bearing wafer leveling device according to claim 1, further comprising a die-bearing wafer detection image capture device, which is connected to the control device, and the die-bearing wafer detection image capture device is connected to the die. The front side of the carrier sheet detects the grain carrier sheet in the flattened state.
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