TW201822836A - Particle beam therapy apparatus - Google Patents

Particle beam therapy apparatus Download PDF

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TW201822836A
TW201822836A TW106121794A TW106121794A TW201822836A TW 201822836 A TW201822836 A TW 201822836A TW 106121794 A TW106121794 A TW 106121794A TW 106121794 A TW106121794 A TW 106121794A TW 201822836 A TW201822836 A TW 201822836A
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magnetic field
field strength
energy
particle beam
electromagnet
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TW106121794A
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Chinese (zh)
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小田原周平
片寄雅
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三菱電機股份有限公司
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00Radiation therapy
    • A61N5/10X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy

Abstract

In a particle beam therapy apparatus 100, a deflecting electromagnet 55 deflects an ion beam, and at the same time adjusts the magnetic intensity from a first magnetic field intensity higher than a target magnetic field intensity by main coils 2a and 2b to a second magnetic field intensity lower than the first magnetic field intensity and higher than the target magnetic field intensity by a predetermined amount, and thereafter compensates it to the target magnetic field intensity by compensation coils 3a and 3b that share magnetic cores 1a and 1b with the main coils 2a and 2b respectively. Thereby, the magnetic field of the deflecting electromagnet 55 is changed on the same hysteresis curve as in the case that the same energy is repeatedly delivered even if the beam energy is switched during the irradiation, and the same beam state as that at the adjustment can be realized even after the beam energy is changed.

Description

粒子線治療裝置  Particle line therapy device  

本發明係關於一種照射粒子線進行癌症治療之粒子線治療裝置。 The present invention relates to a particle beam therapy device for irradiating particle lines for cancer treatment.

在以往的粒子線治療裝置中,在切換供應至照射系統之粒子射束的能量時,係進行所謂初始化之處理,該初始化之處理係反覆進行在激磁到最大磁場強度後,設定成最低磁場強度再激磁至最大磁場強度之操作,而在該初始化之處理後,必須將磁場從最大磁場強度降低而進行設定。在未使用該方法時,會由於磁滯現象導致即便流動相同電流也會產生與目標不同之磁場。 In the conventional particle beam therapy apparatus, when the energy of the particle beam supplied to the irradiation system is switched, the so-called initialization process is performed, and the initialization process is repeated to set the minimum magnetic field strength after the excitation to the maximum magnetic field strength. The operation of re-excitation to the maximum magnetic field strength, after the initialization process, must be set by reducing the magnetic field from the maximum magnetic field strength. When this method is not used, a magnetic field different from the target will be generated even if the same current flows due to hysteresis.

例如,於專利文獻1中揭露一種醫療用電子加速裝置,係在每次安裝時,必定在使電磁鐵的磁通密度飽和後固定在所期望之值,而不受磁滯導致之磁通密度的變動之影響。 For example, Patent Document 1 discloses a medical electronic acceleration device which is fixed at a desired value after saturation of a magnetic flux density of an electromagnet at each mounting, without being affected by hysteresis. The impact of changes.

[先前技術文獻]  [Previous Technical Literature]   [專利文獻]  [Patent Literature]  

專利文獻1:日本特開平3-236862號公報(第2頁右下 欄第18行至第3頁左上欄第1行、第3圖) Patent Document 1: Japanese Patent Laid-Open No. Hei 3-236862 (page 2, right lower column, line 18 to page 3, upper left column, first line, third figure)

然而,在專利文獻1所示之初始化方法係有初始化會耗費時間之問題。再者,在將磁場從最大磁場強度壓低後,將磁場強度提高而進行修正時,磁場強度與激磁電流的關係不會固定成唯一,而有難以確保磁場強度的精確度之問題。並且,與作為目標之磁場強度之偏差幅度係依磁場強度的變化的起點、大小、增減方向而不同,因此必須依磁場強度的變化模式來製作及保存龐大的量之設定資料,而有造成大幅度的成本增大之問題。 However, the initialization method shown in Patent Document 1 has a problem that it takes time to initialize. Further, when the magnetic field is lowered from the maximum magnetic field strength and the magnetic field strength is increased and corrected, the relationship between the magnetic field strength and the exciting current is not fixed to be unique, and there is a problem that it is difficult to ensure the accuracy of the magnetic field strength. Further, the magnitude of the deviation from the target magnetic field strength differs depending on the starting point, the size, and the increasing or decreasing direction of the change in the magnetic field strength. Therefore, it is necessary to create and store a large amount of setting data according to the mode of variation of the magnetic field strength, resulting in The problem of large cost increases.

本發明係為了解決上述課題所研創者,其目的在於提供一種粒子線治療裝置,係可縮短設定時間並且實現高精確度的射束照射。 The present invention has been made in an effort to solve the above problems, and an object of the invention is to provide a particle beam therapy apparatus capable of shortening a set time and achieving high-accuracy beam irradiation.

本發明之粒子線治療裝置係具有使離子射束偏向並且將離子射束供應至照射系統之偏向電磁鐵,該離子射束之磁場強度係藉由主線圈從比作為目標之磁場強度更高的第一磁場強度調整成比前述第一磁場強度更低且比前述作為目標之磁場強度高出預定量之第二磁場強度後,藉由與前述主線圈共用鐵芯之修正線圈修正成前述作為目標之磁場強度。 The particle beam therapy device of the present invention has a deflecting electromagnet that deflects the ion beam and supplies the ion beam to the illumination system. The magnetic field strength of the ion beam is higher than the target magnetic field by the main coil. The first magnetic field strength is adjusted to be lower than the first magnetic field strength and higher than the target magnetic field strength by a predetermined amount of the second magnetic field strength, and then corrected by the correction coil that shares the iron core with the main coil The strength of the magnetic field.

依據本發明,藉由將共用鐵芯之修正線圈 的激磁限定於消除主線圈的激磁之方向,即可在能量變更後仍維持相同之射束狀態,且可縮短設定時間並且實現高精確度之照射。 According to the present invention, by limiting the excitation of the correction coil of the common core to the direction of eliminating the excitation of the main coil, the same beam state can be maintained after the energy change, and the set time can be shortened and high precision can be achieved. Irradiation.

1‧‧‧軛鐵 1‧‧‧ yoke

1a、1b‧‧‧磁極鐵芯 1a, 1b‧‧‧ pole core

2a、2b‧‧‧主線圈 2a, 2b‧‧‧ main coil

3a、3b‧‧‧修正線圈 3a, 3b‧‧‧ correction coil

4‧‧‧射束導管 4‧‧‧beam catheter

10x、10y‧‧‧十字線 10x, 10y‧‧‧ crosshairs

11‧‧‧射束位置 11‧‧‧beam position

41‧‧‧粒子線照射裝置 41‧‧‧Particle line irradiation device

52‧‧‧粒子線產生裝置 52‧‧‧Particle line generator

53‧‧‧前段加速器 53‧‧‧Front accelerator

54‧‧‧同步加速器 54‧‧‧Sync Accelerator

55‧‧‧偏向電磁鐵 55‧‧‧ biased electromagnet

59‧‧‧射束照射系統 59‧‧‧beam irradiation system

100‧‧‧粒子線治療裝置 100‧‧‧Particle line therapy device

D‧‧‧深度方向 D‧‧‧depth direction

S1、S2、…、SN‧‧‧分層 S1, S2, ..., SN‧‧ tier

第1圖係顯示本發明實施形態1之粒子線治療裝置的偏向電磁鐵的構成之圖。 Fig. 1 is a view showing the configuration of a deflection electromagnet of the particle beam therapy apparatus according to the first embodiment of the present invention.

第2圖係顯示本發明實施形態1之粒子線治療裝置的整體構成之圖。 Fig. 2 is a view showing the overall configuration of a particle beam therapeutic apparatus according to a first embodiment of the present invention.

第3圖係顯示在本發明實施形態1之粒子線治療裝置中之偏向電磁鐵的動作的一例之圖。 Fig. 3 is a view showing an example of the operation of the deflection electromagnet in the particle beam therapy apparatus according to the first embodiment of the present invention.

第4圖係用以說明在本發明實施形態1之粒子線治療裝置中之偏向電磁鐵的調整方法之圖。 Fig. 4 is a view for explaining a method of adjusting a deflection electromagnet in the particle beam therapy apparatus according to the first embodiment of the present invention.

第5圖係用以說明在以往的粒子線治療裝置中之偏向電磁鐵的調整方法之圖。 Fig. 5 is a view for explaining a method of adjusting a deflection electromagnet in a conventional particle beam therapy apparatus.

第6圖係用以說明在本發明實施形態1之粒子線治療裝置中之偏向電磁鐵的動作之圖。 Fig. 6 is a view for explaining the operation of the deflecting electromagnet in the particle beam therapeutic apparatus according to the first embodiment of the present invention.

第7圖係用以說明在以往的粒子線治療裝置中之偏向電磁鐵的動作之圖。 Fig. 7 is a view for explaining the operation of the deflection electromagnet in the conventional particle beam therapy apparatus.

第8圖係顯示以藉由本發明實施形態1之粒子線治療裝置的偏向電磁鐵調整過之能量所照射之照射區域的一例之圖。 Fig. 8 is a view showing an example of an irradiation region irradiated with energy adjusted by a deflection electromagnet of the particle beam therapy apparatus according to the first embodiment of the present invention.

第1圖係本發明實施形態1之粒子線治療裝 置100的主要構成之偏向電磁鐵之圖,第1圖(a)係顯示側面圖,第1圖(b)係顯示第1圖(a)之在AA線之箭號方向剖面圖。第2圖係粒子線治療裝置整體的概略構成之俯瞰圖。 Fig. 1 is a view showing a deflection electromagnet of a main configuration of a particle beam therapy device 100 according to a first embodiment of the present invention, wherein Fig. 1(a) shows a side view, and Fig. 1(b) shows a first figure (a). A cross-sectional view of the arrow in the direction of the AA line. Fig. 2 is a plan view showing a schematic configuration of the entire particle beam therapy device.

如第2圖所示,實施形態1之粒子線治療裝置100係具備粒子線產生裝置52、粒子線照射裝置41及複數個偏向電磁鐵55,並經由射束輸送系統59而連接。粒子線產生裝置52係具有包含離子源之前段加速器53及同步加速器54,在離子源產生之帶電粒子(例如質子離子或碳離子)係被前段加速器53加速,從前段加速器53射出之粒子線係射入至同步加速器54。該粒子線係被同步加速器54加速,並在提高至所設定之能量後,從出射機器射出。從同步加速器54射出之粒子線係經過複數個偏向電磁鐵55及由真空導管所構成之射束輸送系統59而到達粒子線照射裝置41,並從未圖示之粒子線照射噴嘴照射至乘載於治療台之患者的患部。 As shown in FIG. 2, the particle beam therapy apparatus 100 according to the first embodiment includes a particle beam generating device 52, a particle beam irradiation device 41, and a plurality of deflection electromagnets 55, and is connected via a beam delivery system 59. The particle beam generating device 52 includes an ion source front-stage accelerator 53 and a synchrotron 54. The charged particles (for example, proton ions or carbon ions) generated by the ion source are accelerated by the front accelerator 53 and are emitted from the front accelerator 53. The injection is made to the synchrotron 54. The particle line is accelerated by the synchrotron 54 and, after being increased to the set energy, is emitted from the exiting machine. The particle beam emitted from the synchrotron 54 passes through a plurality of deflecting electromagnets 55 and a beam transporting system 59 composed of a vacuum duct, and reaches the particle beam irradiation device 41, and is irradiated to the carrier from a particle beam irradiation nozzle (not shown). The affected part of the patient at the treatment station.

偏向電磁鐵55係使離子射束偏向。偏向所需之磁場強度會因射束能量而不同。如第1圖所示,偏向電磁鐵55係具備:呈環狀之一對主線圈2a、2b;配置於主線圈2a、2b的外周側之呈環狀之一對修正線圈3a、3b;配置於主線圈2a、2b的內周側之一對磁極鐵芯1a、1b;以及以在一對磁極鐵芯1a、1b之間通過偏向電磁鐵55之方式設置之射束導管4。一對磁極鐵芯1a、1b係由強磁性體所構成,且與以圍繞主線圈2a、2b及修正線圈3a、3b之方式形成之軛鐵1一體地成形。 The deflecting electromagnet 55 biases the ion beam. The strength of the magnetic field required for deflection will vary depending on the beam energy. As shown in Fig. 1, the deflecting electromagnet 55 includes one pair of main coils 2a and 2b in a ring shape, and one pair of ring-shaped correction coils 3a and 3b disposed on the outer peripheral side of the main coils 2a and 2b. The pair of pole cores 1a and 1b on the inner peripheral side of the main coils 2a and 2b, and the beam guide 4 provided to bias the electromagnet 55 between the pair of pole cores 1a and 1b. The pair of pole cores 1a and 1b are made of a ferromagnetic body, and are integrally formed with the yoke 1 formed so as to surround the main coils 2a and 2b and the correction coils 3a and 3b.

從患者至最靠近患者之偏向電磁鐵55為止之距離s一般為距離照射部位1至5m程度。在照射部位之射束位置所要求的精確度為±0.5mm左右,在假設s=1m時,必須使偏向電磁鐵55的偏向角的誤差落在±0.5mm rad以內。偏向電磁鐵55一般係以數度以上之單位使射束的軌道偏向。例如若設為偏向45deg(=./4rad),則必須以精確度±0.5mm rad/(./4rad)*100=±0.06%來控制偏向電磁鐵55的磁場強度。 The distance s from the patient to the electromagnet 55 closest to the patient is generally about 1 to 5 m from the irradiation site. The accuracy required for the beam position at the irradiation site is about ±0.5 mm. When s = 1 m is assumed, the error of the deflection angle of the deflection electromagnet 55 must be within ±0.5 mm rad. The deflecting electromagnet 55 generally deflects the orbit of the beam by a unit of several degrees or more. For example, if the deflection is 45 deg (=./4 rad), the magnetic field strength of the deflection electromagnet 55 must be controlled with an accuracy of ±0.5 mm rad/(./4 rad)*100=±0.06%.

由於難以僅藉由主線圈2a、2b來確保精確度,因此一般而言於偏向電磁鐵55係具備有與主線圈2a、2b分別共用磁極鐵芯1a、1b之修正線圈3a、3b。偏向電磁鐵55係利用在僅使用主線圈2a、2b時之射束軌道測定結果來調整修正線圈3a、3b的激磁電流,而使軌道誤差變小以確保精確度。調整係在反覆輸送相同能量之狀態下按每個能量進行。 Since it is difficult to ensure accuracy only by the main coils 2a and 2b, the deflection electromagnets 55 are generally provided with correction coils 3a and 3b that share the pole cores 1a and 1b with the main coils 2a and 2b, respectively. The deflection electromagnet 55 adjusts the excitation current of the correction coils 3a and 3b by using the beam orbit measurement results when only the main coils 2a and 2b are used, and reduces the track error to ensure accuracy. The adjustment is performed for each energy in a state in which the same energy is repeatedly delivered.

第3圖係顯示在偏向電磁鐵55中對主線圈2a、2b利用修正線圈3a、3b進行修正前後之射束監視器的一例之圖。第3圖之十字線10x、10y係以設計上的射束位置為中心之縱、橫之中心線。在未使用修正線圈3a、3b之情形時,偏向電磁鐵55一般而言係因機器的設置誤差、製作誤差、磁場設定誤差等而導致於射束的軌道產生偏離設計之誤差,而成為從設計上的射束位置偏離之射束位置11。 Fig. 3 is a view showing an example of a beam monitor before and after correction of the main coils 2a and 2b by the correction coils 3a and 3b in the deflection electromagnet 55. The cross lines 10x and 10y of Fig. 3 are the center lines of the vertical and horizontal directions centering on the designed beam position. In the case where the correction coils 3a, 3b are not used, the deflection electromagnet 55 is generally caused by a setting error of the machine, a manufacturing error, a magnetic field setting error, etc., which causes a deviation from the design of the beam trajectory. The upper beam position deviates from the beam position 11.

相對於此,藉由使用修正線圈3a、3b,偏 向電磁鐵55係可依據配置於輸送系統及照射系統之射束監視器的測定結果,使監視器上的射束的通過位置與設計對準,藉此縮小輸送系統、照射系統整體的射束軌道誤差,並可使射束位置成為設計上的射束位置12。 On the other hand, by using the correction coils 3a and 3b, the deflection electromagnet 55 can align the passing position of the beam on the monitor with the design according to the measurement results of the beam monitors disposed in the transport system and the illumination system. Thereby, the beam trajectory error of the entire conveying system and the illuminating system is reduced, and the beam position can be made into the designed beam position 12.

在僅進行在相同的磁場強度下的運用時,利用主線圈2a、2b及修正線圈3a、3b進行之調整方法雖沒有限制,惟在變更磁場強度且偏向電磁鐵55具有磁極鐵芯1a、1b時必須考量磁滯。 When the operation is performed under the same magnetic field strength, the adjustment methods by the main coils 2a and 2b and the correction coils 3a and 3b are not limited, but the magnetic field strength is changed and the electromagnet 55 has the magnetic pole cores 1a and 1b. The hysteresis must be considered.

第4圖係用以說明在本發明實施形態1之粒子線治療裝置100中之偏向電磁鐵55之磁場強度有變化時的調整方法之圖。第4圖(a)係顯示激磁電流的變化,第4圖(b)係顯示磁滯環與激磁電流之關係。第5圖係顯示與第4圖對應之以往的偏向電磁鐵的調整方法之圖。第4圖(b)及第5圖(b)的鏈線係顯示從鐵芯從被消磁之狀態進行激磁之情形,虛線係顯示一般的磁滯曲線。偏向電磁鐵由於一般為單極電源,故進行如實線之動作。 Fig. 4 is a view for explaining an adjustment method when the magnetic field strength of the electromagnet 55 is changed in the particle beam therapy apparatus 100 according to the first embodiment of the present invention. Fig. 4(a) shows the change of the exciting current, and Fig. 4(b) shows the relationship between the hysteresis loop and the exciting current. Fig. 5 is a view showing a method of adjusting a conventional deflection electromagnet corresponding to Fig. 4; The chain lines of Figs. 4(b) and 5(b) show the case where the core is excited from the demagnetized state, and the broken line shows the general hysteresis curve. Since the biasing electromagnet is generally a unipolar power source, it operates as a solid line.

在以往的粒子線治療裝置中,為了避免磁滯的影響以確保磁場的精確度,係採用下述方法:進行所謂初始化之處理,該初始化之處理係反覆進行:在激磁到最大磁場強度後,設定為最低磁場強度並再度激磁到最大磁場強度之操作;而在初始化之處理後使磁場從最大磁場強度降低至預定的磁場強度。所謂初始化之處理係實施一至數十次。由於射束能量的變更係以從高能量往低能量之方式進行,故就偏向電磁鐵的主線圈而言雖沒有問題,惟 在主線圈之調整後將修正線圈予以激磁,而如第5圖(a)所示要將磁場強度往提高之方向修正時(I2U→I3U),如第5圖(b)所示,由於磁滯導致磁場強度相對於激磁電流的變化係從I1至I0間的磁滯曲線偏離,而在與磁場強度的目標值Bob對應之激磁電流會產生偏差。因此,在未進行初始化而變更射束能量時,即便設定在反覆輸送相同能量之狀態下進行調整之激磁電流,磁場亦不會成為調整時的狀態,而有能量變更後的射束狀態不會成為所期望之射束狀態之情形。 In the conventional particle beam therapy apparatus, in order to avoid the influence of hysteresis to ensure the accuracy of the magnetic field, the following method is employed: the so-called initialization process is performed, and the initialization process is repeated: after the excitation to the maximum magnetic field strength, The operation of setting the minimum magnetic field strength and re-energizing to the maximum magnetic field strength; and reducing the magnetic field from the maximum magnetic field strength to the predetermined magnetic field strength after the initialization process. The processing of initialization is performed one to several times. Since the change of the beam energy is performed from high energy to low energy, there is no problem in biasing the main coil of the electromagnet, but the correction coil is excited after the adjustment of the main coil, as shown in Fig. 5. (a) When the magnetic field strength is corrected in the direction of improvement (I 2U → I 3U ), as shown in Fig. 5 (b), the change in magnetic field strength with respect to the excitation current due to hysteresis is from I 1 to The hysteresis curve between I 0 deviates, and the excitation current corresponding to the target value Bob of the magnetic field strength deviates. Therefore, when the beam energy is changed without initializing, even if the excitation current adjusted in the state in which the same energy is repeatedly supplied is set, the magnetic field does not become the state at the time of adjustment, and the beam state after the energy change does not occur. The situation of the desired beam state.

在本發明實施形態1之粒子線治療裝置100中,偏向電磁鐵55係使離子射束偏向,並且藉由主線圈2a、2b將磁場強度從比作為目標之磁場強度更高之第一磁場強度,調整成比前述第一磁場強度更低且比前述作為目標之磁場強度更高預定量之第二磁場強度後,將藉由與主線圈2a、2b分別共用磁極鐵芯1a、1b之修正線圈3a、3b而修正成作為目標之磁場強度之離子射束供應至照射系統。 In the particle beam therapy system 100 according to the first embodiment of the present invention, the deflecting electromagnet 55 biases the ion beam, and the main coil 2a, 2b increases the magnetic field strength from the first magnetic field strength which is higher than the target magnetic field strength. After being adjusted to be lower than the first magnetic field strength and higher than the target magnetic field strength by a predetermined amount of the second magnetic field strength, the correction coils of the magnetic pole cores 1a, 1b are shared by the main coils 2a, 2b, respectively. The ion beams corrected to the magnetic field strength of the target are supplied to the illumination system by 3a and 3b.

偏向電磁鐵55係在變更磁場強度時,如第4圖(a)所示,係在激磁至飽和之最大磁場強度(I1)後,使主線圈2a、2b的激磁電流成為比磁場強度的目標值Bob高出預定量(I2),並以使主線圈2a、2b所致之磁場強度變低之方式將修正線圈3a、3b的激磁電流進行修正(I2→I3),如第4圖(b)所示,磁場強度的目標值Bob係設定在I1至I0間之磁滯曲線上。於此,預定量為對應於偏向電磁鐵55的最大 輸出之1%以內的範圍之值。 Deflecting electromagnet 55 is changed based upon the magnetic field strength, as in FIG. 4 (a), the excitation to the saturation based upon the maximum magnetic field strength (I 1), the exciting current of the main coil 2a, 2b than the magnetic field strength becomes The target value Bob is raised by a predetermined amount (I 2 ), and the excitation current of the correction coils 3a and 3b is corrected (I 2 → I 3 ) such that the magnetic field strength due to the main coils 2a and 2b is lowered. As shown in Fig. 4(b), the target value Bob of the magnetic field strength is set on the hysteresis curve between I 1 and I 0 . Here, the predetermined amount is a value corresponding to a range within 1% of the maximum output of the deflection electromagnet 55.

如此,藉由將與主線圈2a、2b分別共用磁極鐵芯1a、1b之修正線圈3a、3b之激磁限定在使主線圈2a、2b的激磁抵銷之方向,即便是在照射中切換能量之情形亦可與反覆輸送相同能量之情形在相同之磁滯曲線上使磁場變化,因此可減輕能量變更時與調整時之差異,而可在能量變更後亦維持相同的射束狀態。 In this manner, the excitation of the correction coils 3a and 3b sharing the magnetic pole cores 1a and 1b with the main coils 2a and 2b is limited to the direction in which the excitation of the main coils 2a and 2b is canceled, and the energy is switched even during the irradiation. In the case where the same energy is repeatedly transmitted, the magnetic field is changed on the same hysteresis curve. Therefore, the difference between the energy change and the adjustment can be reduced, and the same beam state can be maintained after the energy change.

接著,針對在本發明實施形態1之粒子線治療裝置100中之偏向電磁鐵55的動作進行說明。第6圖係用以說明在本發明實施形態1之粒子線治療裝置100中之偏向電磁鐵55之磁場強度連續變化複數次時的調整方法之圖。第6圖(a)係顯示激磁電流的變化,第6圖(b)係顯示磁滯環與激磁電流之關係。第7圖係顯示與第6圖對應之以往的偏向電磁鐵之情形的調整方法。第8圖係顯示藉由以本發明實施形態1之粒子線治療裝置100中之偏向電磁鐵55所調整之能量而被照射之照射區域的一例之圖。 Next, the operation of the deflecting electromagnet 55 in the particle beam therapy device 100 according to the first embodiment of the present invention will be described. Fig. 6 is a view for explaining an adjustment method when the magnetic field strength of the electromagnet 55 is continuously changed plural times in the particle beam therapy device 100 according to the first embodiment of the present invention. Fig. 6(a) shows the change of the exciting current, and Fig. 6(b) shows the relationship between the hysteresis loop and the exciting current. Fig. 7 is a view showing an adjustment method in the case of the conventional deflection electromagnet corresponding to Fig. 6. Fig. 8 is a view showing an example of an irradiation region to be irradiated by the energy adjusted by the electromagnet 55 in the particle beam therapy device 100 according to the first embodiment of the present invention.

如第8圖所示,在使用積層原體照射法或掃描照射法等之以往的粒子線照射裝置中,係相對於深度方向D以分層S1、S2、…、SN(N為整數)之方式分割並對照射區域進行照射時,必須變更對患者照射之射束的能量。在藉由粒子線產生裝置52或射束輸送系統59來變更射束之能量時,偏向電磁鐵55的磁場強度亦必須對應於射束的能量進行變更。如此,在磁場強度要進行複數次變化時,係採用依每個分層之照射反覆進行下述操作之方法:進行 所謂初始化之處理,該初始化之處理係反覆進行在激磁到最大磁場強度後,設定成最低磁場強度,再激磁至最大磁場強度之操作,而在初始化之處理後,將磁場從最大磁場強度設定成預定的磁場強度,並在照射後再度激磁到最大磁場強度。初始化的時間通常耗費大致1分鐘,而有設定時間的效率化之問題。 As shown in Fig. 8, in the conventional particle beam irradiation apparatus using a laminated original irradiation method or a scanning irradiation method, the layers S1, S2, ..., SN (N is an integer) with respect to the depth direction D are used. When the method is divided and the irradiation area is irradiated, it is necessary to change the energy of the beam irradiated to the patient. When the energy of the beam is changed by the particle beam generating device 52 or the beam transporting system 59, the intensity of the magnetic field biased toward the electromagnet 55 must also be changed in accordance with the energy of the beam. In this way, when the magnetic field strength is to be changed plural times, the method of performing the following operations in accordance with the irradiation of each layer is performed by performing a so-called initialization process, which is repeated after the excitation to the maximum magnetic field strength. The operation is set to the lowest magnetic field strength and then excited to the maximum magnetic field strength, and after the initialization process, the magnetic field is set from the maximum magnetic field strength to a predetermined magnetic field strength, and is again excited to the maximum magnetic field strength after the irradiation. The initialization time usually takes about 1 minute, and there is a problem of efficiency in setting time.

再者,如第7圖所示,在先激磁至最大磁場強度(I1),之後下降到預定的磁場強度(I2)後再朝提高磁場強度之方向進行修正(I2→I3)並進行照射後,不進行初始化而改變能量時,係無關於之後的激磁電流的設定方式,激磁電流與磁場強度的關係會從I1至I0間之磁滯曲線偏離(I3→I4→I5→I6→I7),即便設定成在反覆輸送相同能量之狀態下進行調整之激磁電流,亦不會成為調整時的磁場強度。 Furthermore, as shown in Fig. 7, the magnetic field is first excited to the maximum magnetic field strength (I 1 ), and then decreased to a predetermined magnetic field strength (I 2 ) and then corrected in the direction of increasing the magnetic field strength (I 2 → I 3 ). After the irradiation, the energy is changed without initializing, and there is no setting method of the subsequent excitation current. The relationship between the excitation current and the magnetic field strength deviates from the hysteresis curve between I 1 and I 0 (I 3 → I 4 →I 5 →I 6 →I 7 ), even if the excitation current is adjusted so that the same energy is repeatedly supplied, it does not become the magnetic field strength at the time of adjustment.

在本發明之實施形態1之粒子線治療裝置100中,偏向電磁鐵55係首先如第6圖(a)所示,激磁至飽和之最大磁場強度(I1)後,設定成使主線圈2a、2b的激磁電流成為比磁場強度的目標值Bob1高出預定量(I2),並以使主線圈2a、2b所致之磁場強度變低之方式將修正線圈3a、3b的激磁電流進行修正(I2→I3)。此時,如第6圖(b)所示,磁場強度的目標值Bob1係被設定在I1至I0間之磁滯曲線上。在該狀態下,藉由包含偏向電磁鐵55之射束照射系統59而被供應至粒子線照射裝置41之射束係被照射至第8圖所示之分層S1。 In the particle beam therapy apparatus 100 according to the first embodiment of the present invention, the deflecting electromagnet 55 is first set to the main coil 2a after being excited to the maximum magnetic field strength (I 1 ) of saturation as shown in Fig. 6(a). The excitation current of 2b is higher than the target value B ob1 of the magnetic field strength by a predetermined amount (I 2 ), and the excitation current of the correction coils 3a and 3b is made such that the magnetic field strength due to the main coils 2a and 2b is lowered. Correction (I 2 → I 3 ). At this time, as shown in Figure section 6 (b), the target value of magnetic field strength B ob1 is set based on the I 1 to I 0 of the hysteresis curve. In this state, the beam system supplied to the particle beam irradiation device 41 by the beam irradiation system 59 including the deflection electromagnet 55 is irradiated to the layer S1 shown in Fig. 8.

接著,如第6圖(a)所示,偏向電磁鐵55係 從對分層S1進行過照射之狀態(I3),設定成使主線圈2a、2b的激磁電流成為比磁場強度的目標值Bob2高出預定量(I4),並以使主線圈2a、2b所致之磁場強度變低之方式將修正線圈3a、3b的激磁電流進行修正(I4→I5)。此時,如第6圖(b)所示,磁場強度的目標值Bob2係被設定在I1至I0間之磁滯曲線上。在該狀態下,藉由包含偏向電磁鐵55之射束照射系統59被供應至粒子線照射裝置41之射束係照射至第8圖所示之分層S2。 Next, as shown in Fig. 6(a), the deflection electromagnet 55 is set so that the excitation current of the main coils 2a and 2b becomes a target value of the magnetic field strength in a state (I 3 ) in which the layer S1 is irradiated. B ob2 is raised by a predetermined amount (I 4 ), and the excitation currents of the correction coils 3a and 3b are corrected (I 4 → I 5 ) so that the magnetic field strength due to the main coils 2a and 2b is lowered. At this time, as shown in Figure section 6 (b), the target value of magnetic field strength B ob2 is set based on the I 1 to I 0 of the hysteresis curve. In this state, the beam system supplied to the particle beam irradiation device 41 by the beam irradiation system 59 including the deflection electromagnet 55 is irradiated to the layer S2 shown in Fig. 8.

接著,如第6圖(a)所示,偏向電磁鐵55係從對分層S2進行過照射之狀態(I3),設定成使主線圈2a、2b的激磁電流成為比磁場強度的目標值Bob3高出預定量(I6),並以使主線圈2a、2b所致之磁場強度變低之方式將修正線圈3a、3b的激磁電流進行修正(I6→I7)。此時,如第6圖(b)所示,磁場強度的目標值Bob3係被設定在I1至I0間之磁滯曲線上。在該狀態下,藉由包含偏向電磁鐵55之射束照射系統59被供應至粒子線照射裝置41之射束係被照射至第8圖所示之分層S3。另外,上述預定量皆為對應於偏向電磁鐵55的最大輸出的1%以內的範圍之值。 Next, as shown in Fig. 6(a), the deflection electromagnet 55 is set so that the excitation current of the main coils 2a and 2b becomes a target value of the magnetic field strength in a state (I 3 ) in which the layer S2 is irradiated. B ob3 is raised by a predetermined amount (I 6 ), and the excitation currents of the correction coils 3a and 3b are corrected (I 6 → I 7 ) such that the magnetic field strength due to the main coils 2a and 2b is lowered. At this time, as shown in Figure section 6 (b), the target value of magnetic field strength B ob3 based on I 1 is set to I 0 of the hysteresis curve. In this state, the beam system supplied to the particle beam irradiation device 41 by the beam irradiation system 59 including the deflection electromagnet 55 is irradiated to the layer S3 shown in Fig. 8. Further, the predetermined amounts are all values corresponding to a range within 1% of the maximum output of the deflecting electromagnet 55.

如此,藉由將與主線圈2a、2b分別共用磁極鐵芯1a、1b之修正線圈3a、3b之激磁限定在使主線圈2a、2b的激磁抵銷之方向,即便是在照射中連續切換能量之情形,亦可在與反覆輸送相同能量之情形相同之磁滯曲線上使磁場變化,因此無須在每次能量變更進行初始化,即可減輕能量變更時與調整時之差異,且在能量變更後亦 可維持與調整時相同的射束狀態。 In this manner, the excitation of the correction coils 3a and 3b sharing the magnetic pole cores 1a and 1b with the main coils 2a and 2b is limited to the direction in which the excitation of the main coils 2a and 2b is canceled, and the energy is continuously switched even during the irradiation. In the case of the magnetic hysteresis curve which is the same as the case where the same energy is repeatedly transmitted, the magnetic field can be changed. Therefore, it is not necessary to initialize each energy change, thereby reducing the difference between the energy change and the adjustment, and after the energy change. It is also possible to maintain the same beam state as when adjusting.

如上所述,本發明實施形態1之粒子線治療裝置100之偏向電磁鐵55係使離子射束偏向,並且藉由主線圈2a、2b將磁場強度從比作為目標之磁場強度更高之第一磁場強度,調整成比前述第一磁場強度更低且比前述作為目標之磁場強度高出預定量之第二磁場強度後,將藉由與主線圈2a、2b分別共用磁極鐵芯1a、1b之修正線圈3a、3b而修正成作為目標之磁場強度之離子射束供應至照射系統,因此藉由將共用鐵芯之修正線圈之激磁限定在使主線圈的激磁抵銷之方向,即便是在照射中切換能量之情形時,亦可在與反覆輸送相同能量之情形相同之磁滯曲線上使磁場變化,因此可減輕能量變更時與調整時之差異,而在能量變更後亦可維持相同的射束狀態。 As described above, the deflecting electromagnet 55 of the particle beam therapy apparatus 100 according to the first embodiment of the present invention biases the ion beam, and the magnetic field strength is higher than the target magnetic field by the main coils 2a and 2b. The magnetic field strength is adjusted to be lower than the first magnetic field strength and higher than the target magnetic field strength by a predetermined amount of the second magnetic field strength, and the magnetic pole cores 1a, 1b are shared by the main coils 2a, 2b, respectively. By correcting the coils 3a and 3b and correcting the ion beam as the target magnetic field strength to be supplied to the illumination system, the excitation of the correction coil of the common core is limited to the direction in which the excitation of the main coil is canceled, even if it is irradiated. In the case of switching energy, the magnetic field can be changed on the same hysteresis curve as the case of repeatedly delivering the same energy, so that the difference between the energy change and the adjustment can be reduced, and the same shot can be maintained after the energy change. Beam status.

再者,即便是在照射中連續切換能量之情形時,亦可在與反覆輸送相同能量之情形相同之磁滯曲線上使磁場變化,因此無須在每次能量變更時進行初始化,即可減輕能量變更時與調整時之差異,而在能量變更後亦可維持與調整時相同的射束狀態。並且,不需要每種能量的變更起點、變更量及要變更的能量之組合之設定資料,即能夠應用在不進行射束能量變更之狀態下進行調整之設定資料。藉此,能夠縮短設定時間,以及能夠將藉由按每個能量進行調整之激磁電流的任意組合來設定偏向電磁鐵之偏向電磁鐵的設定資料極小化,並且使偏向電磁鐵成為與調整時相同之狀態,因此可使射束狀態成為與調整時相 同,而可實現高精確度的射束照射。 Furthermore, even when the energy is continuously switched during the irradiation, the magnetic field can be changed on the hysteresis curve which is the same as the case where the same energy is repeatedly supplied, so that the energy can be reduced without initializing each time the energy is changed. The difference between the change and the adjustment time, and the same beam state as the adjustment can be maintained after the energy change. Further, the setting data of the combination of the change start point, the change amount, and the energy to be changed for each energy is not required, that is, the setting data for adjustment without changing the beam energy can be applied. Thereby, the set time can be shortened, and the setting data of the deflection electromagnet that is biased toward the electromagnet can be minimized by any combination of the excitation currents adjusted for each energy, and the deflection electromagnet can be made the same as the adjustment time. In this state, the beam state can be made the same as in the adjustment, and high-accuracy beam irradiation can be realized.

另外,本發明係於粒子線治療裝置中可應用於至少一個偏向電磁鐵。再者,本發明係在其發明的範圍內可適當將實施形態予以變形、省略。 Further, the present invention is applicable to at least one biasing electromagnet in a particle beam therapy device. Further, the present invention can be modified and omitted as appropriate within the scope of the invention.

Claims (3)

一種粒子線治療裝置,係具有使離子射束偏向並且將離子射束供應至照射系統的偏向電磁鐵,該離子射束之磁場強度係在藉由主線圈從比作為目標之磁場強度更高的第一磁場強度調整成比前述第一磁場強度更低且比前述作為目標之磁場強度還高預定量之第二磁場強度後,藉由與前述主線圈共用鐵芯之修正線圈修正成前述作為目標之磁場強度。  A particle beam therapy device having a deflecting electromagnet that deflects an ion beam and supplies an ion beam to an illumination system, the magnetic field strength of the ion beam being higher than a target magnetic field by the main coil The first magnetic field strength is adjusted to be lower than the first magnetic field strength and higher than the target magnetic field strength by a predetermined amount of the second magnetic field strength, and then corrected by the correction coil that shares the iron core with the main coil The strength of the magnetic field.   如申請專利範圍第1項所述之粒子線治療裝置,其中,前述預定量係為與前述偏向電磁鐵的最大輸出之1%以內的範圍對應之值。  The particle beam therapy apparatus according to claim 1, wherein the predetermined amount is a value corresponding to a range within 1% of a maximum output of the deflection electromagnet.   如申請專利範圍第1項或第2項所述之粒子線治療裝置,其中,在每次將前述偏向電磁鐵的磁場強度變更成前述作為目標之磁場強度時,反覆進行前述調整及前述修正。  The particle beam therapy apparatus according to the first or second aspect of the invention, wherein the adjustment and the correction are performed repeatedly each time the magnetic field intensity of the deflection electromagnet is changed to the target magnetic field strength.  
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