TW201809598A - Method of obtaining deviation angle - Google Patents

Abstract

A method of obtaining a deviation angle including following steps is provided. An apparatus is provided. The apparatus includes a first substrate and a second substrate respectively having a first mark and a second mark. A reference point located on the first substrate is obtained, and the reference point does not overlap with the first mark or the second mark. The reference point is defined as an original point (x0,y0) of an X-Y coordinate. A value of a parallel deviation [Delta][delta]x and a value of a vertical deviation [Delta][delta]y are obtained. A first deviation angle [Delta][theta] between the first substrate and the second substrate is calculated by a first formula. The first formula is[Delta][theta]=tan<SP>-1</SP>[y1-[Delta][delta]y/X1-[Delta][delta]X]-[theta]0, wherein [theta]0 is an included angle between a X axis of the X-Y coordinate and a line connecting a geometry center of the second mark and the reference point.

Description

How to get the offset angle

The present invention relates to a method, and particularly to a method of obtaining an offset angle.

Various devices include two substrates to be aligned. The alignment between the two substrates will affect the quality of the device. For example, the display panel includes a pixel array substrate, an opposite substrate relative to the pixel array substrate, and a display medium located between the two. The alignment between the pixel array substrate and the counter substrate will affect the optical characteristics of the display panel.

Generally speaking, in order to determine the alignment between the pixel array substrate and the counter substrate, the display panel has a horizontal assembly precision mark and a vertical flat assembly precision mark. By horizontally setting the precision marks, the offset of the pixel array substrate and the counter substrate in the x direction can be known. By vertically assembling the precision marks, the offset of the pixel array substrate and the counter substrate in the y direction can be known. However, with the horizontally assembled precision marks and the vertically assembled precision marks, it is difficult to know the offset angle between the pixel array substrate and the counter substrate. In particular, when the display panel is in Fringe-Field Switching (FFS) or In-Plane Switching (IPS) mode, the offset rotation angle between the pixel array substrate and the opposite substrate changes to the display panel The optical quality (for example: contrast) has a huge impact. If the offset angle between the pixel array substrate and the counter substrate cannot be monitored in real time, it is unfavorable for the quality control and classification of the display panel.

The invention provides a method for obtaining an offset angle, which can easily obtain the offset angle between the first and second substrates.

The method for obtaining the offset angle of the present invention includes the following steps. Provide the device. The device includes a first substrate and a second substrate that overlap. The first substrate has a first mark. The second substrate has a second mark. The second mark includes multiple sub-marks. The sub-marks are arranged in an array in the x direction and the y direction perpendicular to each other. Obtaining a reference point on the first substrate, the reference point does not overlap with the first mark or the second mark. Let the reference point be the origin of the XY coordinate system (x ₀ , y ₀ ). The X axis of the XY coordinate system is parallel to the x direction. The Y axis of the XY coordinate system is parallel to the y direction. Obtain the coordinates (x _c , y _c ) of the geometric center of the second mark on the XY coordinate system. The coordinates (x ₁ , y ₁ ) of the first mark on the XY coordinate system are calculated using the coordinates (x _c , y _c ) and the sub-marks of the second mark. Obtain the horizontal offset Δδx and the vertical offset Δδy between the first substrate and the second substrate. Use the following formula (1): Calculate the first offset angle Δθ between the first substrate and the second substrate, where θ ₀ is the angle between the X axis of the XY coordinate system and the line connecting the reference point and the geometric center of the second mark.

In an embodiment of the present invention, all the sub-marks have the same size, and each sub-mark has a first width W1 and a second width W2 in the x direction and the y direction, respectively, and uses the coordinates of the geometric center of the second mark ( x _c , y _c ) and a plurality of sub-marks, the step of calculating the coordinates (x ₁ , y ₁ ) of the first mark on the XY coordinate system includes: finding a sub-mark that overlaps with the first mark, the sub-mark and The geometric center of the second mark is distanced by n sub-marks in the x direction, and the geometric center of the second mark is distanced by m sub-marks in the y direction, where n and m are integers; use formula (2) : And formula (3): , Calculate the coordinates of the first mark on the XY coordinate system (x ₁ , y ₁ ).

In an embodiment of the invention, the above-mentioned first substrate further has a horizontal assembly precision mark and a vertical assembly precision mark, and the step of obtaining the reference point on the first substrate includes: letting the extension line passing the horizontal assembly precision mark and The intersection point of the extension line passing through the vertical assembly precision mark is the reference point.

In an embodiment of the present invention, the distance R between the reference point and the geometric center of the second mark is a preset value, and the x _c and y _c of the coordinates (x _c , y _c ) of the geometric center of the second mark are respectively Meet the following formula (4): And formula (5): .

In an embodiment of the invention, the above-mentioned second mark is a checkerboard pattern. The checkerboard pattern includes a plurality of light-shielding blocks and a plurality of light-transmitting blocks alternately arranged in the x-direction and the y-direction, and the first mark is a dot-shaped area smaller than each light-shielding block and each light-transmitting block pattern.

In an embodiment of the invention, the above-mentioned second mark is a checkerboard pattern. The checkerboard pattern includes a plurality of light-shielding blocks and a plurality of light-transmitting blocks alternately arranged in the x direction and the y direction. The first mark is a diamond. The side length of the diamond is greater than or equal to the side length of each light-blocking block and the side length of each light-transmitting block.

In an embodiment of the invention, the above method for obtaining the offset angle further includes: measuring the gap z _c between the first substrate and the second substrate directly below the geometric center of the second mark and the positive mark The gap z ₁ between the first substrate and the second substrate above; use the following formula (6) to obtain a second offset angle ΔΦ, ---- (6).

In an embodiment of the present invention, the above device is a liquid crystal display device in a fringe field switching (FFS) mode or an in-plane switching (IPS) mode.

Based on the above, the method for obtaining the offset angle according to an embodiment of the present invention can easily obtain the offset angle between the first and second substrates of any device. The offset angle can be used to more accurately monitor and classify the quality of the device.

In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below and described in detail in conjunction with the accompanying drawings.

FIG. 1 is a schematic cross-sectional view of an apparatus according to an embodiment of the invention. FIG. 2 is a schematic top view of the first and second marks of the first and second substrates and the vicinity thereof according to an embodiment of the invention. The following uses FIG. 1 and FIG. 2 to illustrate how to obtain the offset angle between the first and second substrates 100 and 200.

Please refer to FIGS. 1 and 2. First, a device 1000 is provided. The device 1000 includes first and second substrates 100 and 200 that overlap in the z direction. The first substrate 100 has a first mark 110 (shown in FIG. 2). The second substrate 200 has a second mark 210 (shown in FIG. 2). In this embodiment, the device 1000 is, for example, a display panel. The display panel includes opposing first and second substrates 100 and 200 and a display medium 300 interposed between the first and second substrates 100 and 200. In the present embodiment, the display medium 300 is, for example, liquid crystal, but the invention is not limited thereto. The 1000 active areas of the device include AA and the surrounding area BB outside the active area AA. The first and second marks 110 and 210 may be provided in the peripheral area BB.

The following method of obtaining the offset angle is applied to the display panel of Fringe-Field Switching (FFS) and In-Plane Switching (IPS) mode sensitive to the offset angle, which has the most benefit. However, the present invention is not limited to this. In other embodiments, the device 1000 may also be a display panel in other modes, for example; twisted nematic (TN), super-twisted nematic (STN), vertical alignment (Vertically Aligned, VA), patterned vertical alignment (Patterned Vertical Alignment, PVA), etc. In addition, it should be noted that in this embodiment, the device 1000 takes the display panel as an example, but the device 1000 is not limited to the display panel. In other embodiments, the device 1000 may also be a semiconductor element, or include alignment The other components of the two substrates.

Referring to FIG. 2, the second mark 210 includes different sub-marks 212 and 214. The sub-marks 212 and 214 are arranged in an array in the x direction and the y direction perpendicular to each other. For example, in this embodiment, the second mark 210 may be a checkerboard pattern, the checkerboard pattern includes a plurality of light-shielding blocks (ie, sub-markers 212) and a plurality of alternately arranged in the x and y directions Light-transmitting block (ie sub-mark 214). In this embodiment, the first mark 110 may be a dot pattern having an area smaller than each light-shielding block (ie, the sub-mark 212) and each light-transmitting block (ie, the sub-mark 214). However, the present invention does not limit the patterns of the first and second marks 110 and 210. In other embodiments, the patterns of the first and second marks 110 and 210 can be designed into other shapes according to actual needs. The following uses FIG. 3 as an example.

3 is a schematic top view of the first and second marks of the first and second substrates according to another embodiment of the invention. The first and second marks 110 ', 210 of FIG. 3 are similar to the first and second marks 110, 210 of FIG. 2, and the first and second marks 110', 210 of FIG. 3 can also be applied to the following method of obtaining the offset angle in. The first and second marks 110 ', 210 of FIG. 3 are different from the first and second marks 110, 210 of FIG. 2 in that the first mark 110' of FIG. 3 may be a diamond pattern. The side length of the diamond 110 'is greater than or equal to the side length of each sub-mark 212,214. In this way, when the first mark 110 'overlaps with the second mark 210, the vertex of the first mark 110' of the rhombus easily falls outside a corresponding sub-mark 212. In this way, it is easier to determine which sub-mark 212 of the second mark 210 overlaps with the first mark 110 ', and then obtain the offset angle.

Please refer to FIGS. 1 and 2. Then, a reference point P (shown in FIG. 2) located on the first substrate 100 is obtained. The reference point P does not overlap with the first mark 110 and / or the second mark 210 in the z direction. In this embodiment, the first substrate 100 further has horizontally assembled precision marks 120 (shown in FIG. 2) and vertically assembled precision marks 130 (shown in FIG. 2). The extension line L1 passes the horizontal assembly precision mark 120, and the extension line L2 passes the vertical assembly precision mark 130, so that the intersection point of the extension lines L1 and L2 can be the reference point P. After that, the reference point P is defined as the origin of the XY coordinate system (x ₀ , y ₀ ). The X axis of the XY coordinate system is parallel to the above x direction. The Y axis of the XY coordinate system is parallel to the above y direction.

Please refer to FIG. 2. Next, the coordinates (x _c , y _c ) of the geometric center 210 _{c of the} second mark 210 on the XY coordinate system are obtained. In this embodiment, the distance R between the reference point P and the geometric center 210c of the second mark 210 is a known preset value. The size of distance R depends on the actual needs. In detail, the distance R can be designed to be larger when the more accurate offset angle is to be obtained. 210 second mark 210c geometric center of the coordinate (x _c, y _c) of x _c and y _c satisfy the following formulas (1) and (2), ----(1) ---- (2), where θ ₀ is the angle θ ₀ between the X axis of the XY coordinate system and the connection line K1 between the reference point P and the geometric center 210c of the second mark 210. Taking an actual value as an example, the distance R between the reference point P and the geometric center 210c of the second mark 210 is, for example, 200√2 unit length, and θ ₀ is, for example, 45 ^o , and substitute 200√2 and 45 ^o into equation (1) It can be obtained from equation (2) that the coordinates (x _c , y _c ) of the geometric center 210 _{c of the} second mark 210 are (200, 200).

Then, the coordinates (x _c , y _c ) of the geometric center 210 _c of the second mark 210 and the sub-marks 212 and 214 of the second mark 210 are used to calculate the coordinates (x ₁ , y ₁ ) of the first mark 110 on the XY coordinate system . In this embodiment, each sub-mark 212, 214 has the same size, each sub-mark 212, 214 has a first width W1 and a second width W2 in the x-direction and y-direction, respectively, and the second mark 210 is used to geometrically The method of calculating the coordinates (x ₁ , y ₁ ) of the first mark 110 on the XY coordinate system by the coordinates (x _c , y _c ) of the center 210 _c and the sub-marks 212, 214 includes the following steps.

First, find a sub-mark 212 that overlaps with the first mark 110. The sub-mark 212 overlapping the first mark 110 and the geometric center 210c of the second mark 210 are separated by n sub-marks 212 or 214 in the x direction. n is an integer; if the sub-marker 212 overlapping the first mark 110 is to the right of the geometric center 210c, the n value is positive; if the sub-marker 212 overlapping the first mark 110 is to the left of the geometric center 210c, the n value negative. The geometric center 210c of the sub-mark 212 overlapping the first mark 110 and the second mark 210 are separated by m sub-marks 212 or 214 in the y direction. m is an integer; if the sub mark 212 overlapping the first mark 110 is above the geometric center 210c, the m value is positive; if the sub mark 212 overlapping the first mark 110 is below the geometric center 210c, the m value Is negative. Next, the coordinates (x _1, y ₁ ) of the first mark 110 on the XY coordinate system are calculated using the following equations (3) and (4). ---- (3) ---- (4) Taking the actual value as an example, in this embodiment, the geometric center 210c of the sub-mark 212 overlapping the first mark 110 and the second mark 210 differ by 1 sub-mark 212 or 214 in the x direction The distance (ie n = 1). The sub-mark 212 overlapping with the first mark 110 and the geometric center 210c of the second mark 210 are separated by a distance of -1 sub-mark 212 or 214 in the y direction (ie, m = -1). The first width W1 and the second width W2 of each sub-mark 212, 214 in the x direction and the y direction are, for example, one unit length. Substituting n = 1, m = -1, W1 = W2 = 1 into the above formula (3) and the above formula (4), the coordinates (x _1, y ₁ ) of the first mark 110 are (200 + 1‧1, 200 -1‧1), that is (201, 199).

Please refer to FIGS. 1 and 2, and then obtain the horizontal offset Δδx and the vertical offset Δδy between the first and second substrates 100 and 200. For example, in this embodiment, the horizontal offset Δδx between the first substrate 100 and the second substrate 200 can be obtained by the horizontal assembly precision mark 120 of the first substrate 100; The vertical assembly precision mark 120 obtains the vertical offset amount Δδy between the first substrate 100 and the second substrate 200. Next, the first offset angle Δθ between the first substrate 100 and the second substrate 200 is calculated using the following formula (5), ---- (5), where θ ₀ is the angle θ ₀ between the X axis of the XY coordinate system and the connection line K1 between the reference point P and the geometric center 210c of the second mark 210. Taking actual values as an example, △ δx and △ δy are, for example, 0, . In other words, in this embodiment, the first and second substrates 100 and 200 in the two-dimensional space (xy plane) of the first offset angle is 0.286 ^o △ θ in the present embodiment.

The above-mentioned first offset angle Δθ refers to an offset angle of the first and second substrates 100 and 200 in a two-dimensional space (on the xy plane). The above method of obtaining the first offset angle Δθ can be further extended and applied to the three-dimensional space to obtain the second offset angle ΔΦ. ΔΦ represents the degree to which the second substrate 200 is warped relative to the first substrate 100 in the z direction. In detail, please refer to FIG. 1 and FIG. 2, the above method for obtaining the offset angle further includes: measuring the gap z _c between the first substrate 100 and the second substrate 200 directly under the geometric center 210 _c and the first mark 110 The gap z ₁ between the first substrate 100 and the second substrate 200 directly above. The gap z _c is a cell gap along the z direction on the geometric center 210 _{c of} the first and second substrates 100 and 200. The gap z ₁ is the gap between the first and second substrates 100 and 200 along the z direction on the first mark 110. Next, the second offset angle ΔΦ can be obtained using the following equation (6). ---- (6) When △ Φ = 0, it means that the first substrate 100 and the second substrate 200 are parallel. When ΔΦ ≠ 0, it means that the second substrate 200 is tilted at an angle ΔΦ with respect to the first substrate 100 in the z direction.

In summary, the method for obtaining the offset angle according to an embodiment of the present invention can easily obtain the offset angle between the first and second substrates of any device. The offset angle can be used to more accurately monitor and classify the quality of the device.

Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the appended patent application.

100‧‧‧The first substrate
110, 110'‧‧‧ first mark
120‧‧‧Horizontal assembly precision mark
130‧‧‧ Vertical assembly precision mark
200‧‧‧Second substrate
210‧‧‧Second mark
210c‧‧‧Geometric Center
212, 214‧‧‧ sub-tag
300‧‧‧Display medium
1000‧‧‧device
AA‧‧‧Active area
BB‧‧‧ surrounding area
K1‧‧‧Connect
L1, L2‧‧‧Extension line
P‧‧‧Reference point
R‧‧‧Distance
W1‧‧‧First width
W2‧‧‧second width
x, y, z‧‧‧ direction
X, Y‧‧‧ axis (x ₀ , y ₀ , z ₀ ) ‧‧‧ origin (x _c , y _c , z _c ), (x ₁ , y ₁ , z ₁ ) ‧‧‧ coordinates θ ₀ ‧ ‧‧ Angle

FIG. 1 is a schematic cross-sectional view of an apparatus according to an embodiment of the invention. FIG. 2 is a schematic top view of the first and second marks of the first and second substrates and the vicinity thereof according to an embodiment of the invention. 3 is a schematic top view of the first and second marks of the first and second substrates according to another embodiment of the invention.

110‧‧‧ First mark

120‧‧‧Horizontal assembly precision mark

130‧‧‧ Vertical assembly precision mark

210‧‧‧Second mark

210c‧‧‧Geometric Center

212, 214‧‧‧ sub-tag

K1‧‧‧Connect

L1, L2‧‧‧Extension line

P‧‧‧Reference point

R‧‧‧Distance

W1‧‧‧First width

W2‧‧‧second width

x, y, z‧‧‧ direction

X, Y‧‧‧ axis

(x ₀ , y ₀ , z ₀ ) ‧‧‧Origin

(x _c , y _c , z _c ), (x ₁ , y ₁ , z ₁ ) ‧‧‧Coordinates

θ ₀ ‧‧‧ included angle

Claims (8)

A method for obtaining an offset angle includes: providing a device including a first substrate and a second substrate overlapping each other, the first substrate has a first mark, and the second substrate has a second mark, The second mark includes a plurality of sub-marks, the sub-marks are arranged in an array in the x direction and the y direction perpendicular to each other; a reference point on the first substrate is obtained, the reference point does not correspond to the first mark or The second mark overlaps; let the reference point be the origin of an XY coordinate system (x ₀ , y ₀ ), the X axis of the XY coordinate system is parallel to the x direction, and the Y axis of the XY coordinate system is parallel to the y direction Parallel; obtain the coordinates (x _c , y _c ) of the geometric center of the second mark on the XY coordinate system; use the coordinates (x _c , y _c ) and the sub-marks of the second mark to calculate the first A coordinate (x ₁ , y ₁ ) marked on the XY coordinate system; obtaining a horizontal offset Δδx and a vertical offset Δδy between the first substrate and the second substrate; and using the following Equation (1) calculates a first offset angle Δθ between the first substrate and the second substrate, ------- (1), where θ _{0 is} the angle between the X axis of the XY coordinate system and the line connecting the reference point and the geometric center of the second mark. The method for obtaining an offset angle as described in item 1 of the patent application scope, wherein the sub-markers have the same size, and each sub-marker has a first width W1 and a second width in the x direction and the y direction, respectively The width W2, and the step of calculating the coordinates (x ₁ , y ₁ ) of the first mark on the XY coordinate system using the coordinates (x _c , y _c ) of the geometric center of the second mark and the sub-marks includes : Find a sub-mark that overlaps with the first mark, the geometric center of the sub-mark and the second mark is separated by n sub-marks in the x direction, and the geometric center of the sub mark and the second mark is in the y direction The distance between the m sub-markers, where n and m are integers; and the coordinates (x ₁ , y ₁ ) of the first marker on the XY coordinate system are calculated using the following formulas (2) and (3), ------- (2); ------- (3). The method for obtaining an offset angle as described in item 1 of the patent application scope, wherein the first substrate further has a horizontal assembly precision mark and a vertical assembly precision mark, and the step of obtaining the reference point on the first substrate Including: let the intersection point of an extension line passing through the horizontal assembly precision mark and an extension line passing through the vertical assembly precision mark be the reference point. The method for obtaining an offset angle as described in item 3 of the patent application scope, wherein the distance R between the reference point and the geometric center of the second mark is a preset value, and the coordinate of the geometric center of the second mark (x _c , y _c ) x _c and y _c satisfy the following formula (4) and formula (5), ------- (4); ------- (5). The method for obtaining an offset angle as described in item 1 of the patent application scope, wherein the second mark is a checkerboard pattern, the checkerboard pattern includes a plurality of light-shielding blocks and multiple Light-transmitting blocks, and the first mark is a dot-like pattern with an area smaller than each of the light-blocking blocks and each light-transmitting block. The method for obtaining an offset angle as described in item 1 of the patent application, wherein the second mark is a checkerboard pattern, the checkerboard pattern includes a plurality of light shielding blocks and a plurality of alternately arranged in the x direction and the y direction The light-transmitting block, and the first mark is a diamond, and the side length of the diamond is greater than or equal to the side length of each light-shielding block and the side length of each light-transmitting block. The method for obtaining an offset angle as described in item 1 of the patent application scope further includes: measuring the gap z _c between the first substrate and the second substrate directly below the geometric center of the second mark and the first A gap z ₁ between the first substrate and the second substrate directly above a mark; and a second offset angle ΔΦ is obtained using the following formula (6), ---- (6). The method for obtaining an offset angle as described in item 1 of the patent application range, wherein the device is a liquid crystal display device in fringe field switching (FFS) mode or in-plane switching (IPS) mode.