TW201809022A - Resin composition for forming high refractive index cured film - Google Patents

Abstract

Provided is a resin composition for forming a high refractive index cured film, which contains (a) a fluorene compound represented by formula [1] and (b) an aromatic ring-containing polymer that contains a repeating unit derived from a (meth)acrylic acid and/or an aliphatic (meth)acrylate compound (excluding those having a silane structure in a side chain) and a repeating unit derived from an aromatic ring-containing compound having a polymerizable double bond. (In the formula, each of R1 and R2 independently represents a hydrogen atom or a methyl group; each of L1 and L2 independently represents an optionally substituted phenylene group or an optionally substituted naphthalenediyl group; each of L3 and L4 independently represents an alkylene group having 1-6 carbon atoms; and m and n represent integers satisfying 0 ≤ m ≤ 40, 0 ≤ n ≤ 40 and 0 ≤ m + n ≤ 40.).

Description

Resin composition for forming high refractive index cured film

The present invention relates to a resin composition for forming a high refractive index cured film.

Conventionally, necessary protective films, insulating films, etc. of touch panels and the like can be formed at necessary positions by pattern processing using a photolithography method using a photosensitive resin composition. However, the photolithography method of pattern processing is not only complicated in steps, but also has the problem of cost. On the other hand, there has been proposed a composition in which a protective film and an insulating film can be formed on necessary parts in a simpler method and at a lower cost (for example, refer to Patent Document 1). Furthermore, in many cases, a coating film having a high refractive index is provided to suppress light reflection and improve transmittance or visibility (for example, refer to Patent Document 2).

[Prior technical literature] [Patent Literature]

[Patent Document 1] International Publication No. 2016/013543

[Patent Document 2] Japanese Patent Application Laid-Open No. 2014-5437

The present invention has been made in view of the foregoing circumstances, and an object thereof is to provide a composition which can be formed not only in a necessary portion by a simple method such as a printing method, but also can be provided with a cured film having a high refractive index.

As a result of repeated positive reviews by the present inventors in order to achieve the foregoing object, they found that a composition containing a specific fluorene compound and a polymer containing a specific aromatic ring can impart a hardened film having a high refractive index, and thus completed the present invention.

Accordingly, the present invention provides a resin composition for forming a high-refractive index cured film described below.

A resin composition for forming a high refractive index cured film, comprising (a) a fluorene compound represented by formula [1], and (b) an aromatic ring-containing polymer containing (meth) acrylic acid and Repeating units of aliphatic (meth) acrylate compounds (except those with a silane structure in the side chain) and repeating units derived from aromatic ring-containing compounds containing polymerizable double bonds: (In the formula, R ¹ and R ² each independently represent a hydrogen atom or a methyl group, L ¹ and L ² each independently represent a phenyl group which may contain a substituent or a naphthalenediyl group which may contain a substituent, and L ³ and L ⁴ respectively Independently represents an alkylene group having a carbon number of 1 to 6, and m and n represent integers satisfying 0 ≦ m ≦ 40, 0 ≦ n ≦ 40, and 0 ≦ m + n ≦ 40).

2. The resin composition for forming a high refractive index cured film according to 1, further comprising (c) a solvent.

3. The resin composition for forming a high refractive index cured film according to 1 or 2, further comprising (d) a monofunctional (meth) acrylate compound.

4. The resin composition for forming a high refractive index cured film according to any one of 1 to 3, further comprising (e) a polyfunctional (meth) acrylate compound.

5. The resin composition for forming a high refractive index cured film according to 4, wherein (e) the polyfunctional (meth) acrylate compound is selected from a compound containing three (meth) acrylfluorenyl groups in one molecule and containing 4 At least one group of (meth) acrylfluorenyl compounds.

6. The resin composition for forming a high refractive index cured film according to any one of 1 to 5, further comprising (f) an ion trapping agent.

7. The resin composition for forming a high refractive index cured film according to 6, wherein (f) the ion trapping agent contains a benzo-1H-triazole compound.

8. The resin composition for forming a high refractive index cured film according to any one of 1 to 7, further comprising (g) a silane coupling agent.

9. The resin composition for forming a high refractive index cured film according to 8, wherein (g) the silane coupling agent contains a silane compound represented by the formula [4], (In the formula, R ⁶ represents a methyl group or an ethyl group, X represents a hydrolyzable group, Y represents a reactive functional group, L ⁷ represents a single bond or an alkylene group having 1 to 10 carbon atoms, and a represents an integer of 0 to 2) .

10. The resin composition for forming a high refractive index cured film according to any one of 1 to 9, further comprising (h) a radical polymerization initiator.

11. The resin composition for forming a high refractive index cured film according to any one of 1 to 10, which is used for a screen printing method.

12. A high-refractive index cured film obtained from the resin composition for forming a high-refractive index cured film according to any one of 1 to 11.

13. A conductive member comprising a base material on which a metal electrode and / or metal wiring is formed, and a high refractive index cured film such as 12 formed on the base material so as to be in contact with the electrode and / or wiring.

The cured film obtained by using the composition of the present invention can be easily formed by a simple method such as a printing method, and further has a high refractive index and excellent light transmittance. Therefore, the composition of the present invention can form a protective film, a flattening film, an insulating film, and the like in various displays such as organic electroluminescence (EL) elements, and a hardened film such as a protective film and an insulating film in a touch panel. By providing a hardened film having a high refractive index, light reflection can be suppressed, and transmittance or visibility can be improved.

The resin composition for forming a high refractive index cured film of the present invention comprises (a) a fluorene compound represented by the following formula [1], and (b) an aromatic compound A cyclic polymer containing repeating units derived from (meth) acrylic acid and / or aliphatic (meth) acrylate compounds (except for those having a silane structure in the side chain) and derived from polymers containing polymerizable double bonds A repeating unit of an aromatic ring-containing compound.

[(a) hydrazone compound]

(a) The hydrazone compound of a component is represented by following formula [1].

In Formula [1], R ¹ and R ² each independently represent a hydrogen atom or a methyl group, and L ¹ and L ² each independently represent a phenylene group which may contain a substituent or a naphthyldiyl group which may contain a substituent. L ³ and L ⁴ each independently represent an alkylene group having 1 to 6 carbon atoms.

Examples of the phenylene group which may contain a substituent include 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, 2-methylbenzene-1,4-diyl, 2-aminobenzene-1,4-diyl, 2,4-dibromobenzene-1,3-diyl, 2,6-dibromobenzene-1,4-diyl, and the like.

Examples of the naphthalenediyl group which may contain a substituent include 1,2-naphthalenediyl, 1,4-naphthalenediyl, 1,5-naphthalenediyl, 1,8-naphthalenediyl, and 2,3-naphthalenediyl Group, 2,6-naphthalenediyl and the like.

Among these, L ¹ and L ^{2 are} preferably 1,4-phenylene and the like.

Examples of the alkylene group include, for example, methylene, ethylene, trimethylene, methylethylene, tetramethylene, 1-methyltrimethylene, and 1,1-dimethylethylene. , Pentamethylene, 1-methyltetramethylene, 2-methyltetramethylene, 1,1-dimethyltrimethylene, 1,2-dimethyltrimethylene, 2,2- Dimethyltrimethylene, 1-ethyltrimethylene, hexamethylene, 1-methylpentamethylene, 2-methylpentamethylene, 3-methylpentamethylene, 1,1 -Dimethyltetramethylene, 1,2-dimethyltetramethylene, 2,2-dimethyltetramethylene, 1-ethyltetramethylene, 1,1,2-trimethyl Methyltrimethylene, 1,2,2-trimethyltrimethylene, 1-ethyl-1-methyltrimethylene, 1-ethyl-2-methyltrimethylene, and the like. Among these, as the L ³ and L ⁴ , an alkylene group having 2 to 4 carbon atoms is preferable, and specifically, an ethylidene group, a trimethylene group, a methylethylidene group, a tetramethylene group, 1-methyltrimethylene, 1,1-dimethylethylene and the like.

In Formula [1], m and n represent integers satisfying 0 ≦ m ≦ 40, 0 ≦ n ≦ 40, and 0 ≦ m + n ≦ 40. m and n are preferably integers satisfying 0 ≦ m ≦ 30, 0 ≦ n ≦ 30, and 0 ≦ m + n ≦ 30, and more preferably 0 ≦ m ≦ 20, 0 ≦ n ≦ 20, and 2 ≦ m + n ≦ An integer of 20 is better to satisfy the integers of 0 ≦ m ≦ 10, 0 ≦ n ≦ 10, and 2 ≦ m + n ≦ 10, and even better to satisfy 0 ≦ m ≦ 5, 0 ≦ n ≦ 5, and 2 ≦ m + An integer of n ≦ 10.

As specific examples of the compound represented by the formula [1], for example, 9,9-bis (4-((meth) propenyloxy) phenyl) -9H-fluorene, 9,9-bis (4- ( 2- (meth) acryloxyethoxy) phenyl) -9H-fluorene, 9,9-bis (4- (2- (2- (meth) acryloxyethoxyethoxy) ethoxy) Phenyl) -9H-fluorene, OGUSOL (registered trademark) EA-0200, EA-0300, EA-F5003, EA-F5503, EA-F5510, EA- F5710, GA-5000 (above are manufactured by Osaka Gas Chemical Co., Ltd.), NK ESTER A-BPEF (made by Shin Nakamura Chemical Industry Co., Ltd.), etc., but are not limited to these.

In the composition of the present invention, the content of the fluorene compound of the component (a) is 100 parts by mass with respect to the aromatic ring-containing polymer of the component (b), preferably 1 to 200 parts by mass, more preferably 5 to 150 parts by mass, and more It is preferably 10 to 100 parts by mass. (a) If the content of the hafnium compound in the component is within the above range, a cured film having a high refractive index and sufficient hardness can be obtained.

[(b) Aromatic ring-containing polymer]

(b) The aromatic ring-containing polymer of the component contains repeating units derived from (meth) acrylic acid and / or aliphatic (meth) acrylate compounds (except those having a silane structure in the side chain) and derived from Polymeric double bond repeating unit of aromatic ring-containing compound.

Examples of the aliphatic (meth) acrylate compound include those represented by formula [2].

In the formula [2], R ³ represents a hydrogen atom or a methyl group. R ⁴ represents an alkyl group having 1 to 20 carbon atoms which may be substituted by a hydroxyl group, an ethoxy group, a (meth) acrylfluorenyl group, or an isocyanate group.

The alkyl group having 1 to 20 carbon atoms may be linear, branched, or cyclic, and examples thereof include methyl, ethyl, n-propyl, and isopropyl. Carbon, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, etc. Linear or branched alkyl; cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, bicyclobutyl, dicyclopentyl, dicyclohexyl , Bicycloheptyl, bicyclooctyl, bicyclononyl, bicyclodecyl, and the like having a cyclic alkyl group having 3 to 20 carbon atoms.

Examples of the aliphatic (meth) acrylate compound include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, and (meth) 2,2,2-trifluoroethyl acrylate, third butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2 methacrylate , 3-dihydroxypropyl, 4-hydroxybutyl (meth) acrylate, and the like. Among them, from the viewpoint of light transmittance of the obtained cured film, the aliphatic (meth) acrylate compound preferably contains one selected from methyl (meth) acrylate and ethyl (meth) acrylate, and more preferably contains (methyl Methyl) acrylate.

The aromatic ring-containing compound containing a polymerizable double bond is not particularly limited as long as it is copolymerizable with a (meth) acrylic acid or an aliphatic (meth) acrylate compound. Examples of such aromatic ring-containing compounds are those represented by the following formula [3].

In the formula [3], R ⁵ represents a hydrogen atom or a methyl group. L ⁵ represents a single bond or -C (= O) -OL ^6- , and L ⁶ represents a single bond or an alkylene group having 1 to 6 carbon atoms which may contain an ether bond. Ar represents an aromatic ring group having 6 to 20 carbon atoms. Some or all of the aforementioned hydrogen atoms containing an aromatic ring group may also pass through a halogen atom such as a chlorine atom, a bromine atom, or an iodine atom; the carbon number of a methyl group, an ethyl group, etc. Substituents such as 1 to 6 alkyl groups.

Examples of the aforementioned alkylene group are the same as those described above. L ^{6 is} preferably a single bond, methylene, ethylene, trimethylene, methylethylene, tetramethylene, ethylenedioxyethylene, 3,6-dioxaoctane-1 , 8-diyl (-CH ₂ CH ₂ OCH ₂ CH ₂ OCH ₂ CH _2- ), (methylethenyl) oxy (methylethenyl), and the like.

Examples of the aromatic ring-containing group include phenyl, 1-naphthyl, 2-naphthyl, 1-anthryl, 2-anthryl, 9-anthryl, 1-phenanthryl, 2-phenanthryl, and 3-phenanthrene Aryl, 4-phenanthryl, 9-phenanthryl, 2-biphenyl, 3-biphenyl, 4-biphenyl, 9H-carbazole-9-yl, etc .; phenoxy, 1-naphthalene Oxy, 2-naphthyloxy, 1-anthraceneoxy, 2-anthraceneoxy, 9-anthraceneoxy, 1-phenanthryloxy, 2-phenanthryloxy, 3-phenanthryloxy, 4-phenanthryloxy , 9-phenanthryloxy, 2-biphenoxy, 3-biphenoxy, 4-biphenoxy and other aryloxy groups; 2-phenoxyphenyl, 3-phenoxyphenyl, 4 -Phenoxyphenyl, 2-naphthyloxyphenyl, 3-naphthyloxyphenyl, 4-naphthyloxyphenyl, 2- (2-biphenoxy) phenyl, 2- (3-biphenyl (Phenoxy) phenyl, 2- (4-biphenoxy) phenyl, 3- (2-biphenoxy) phenyl, 3- (3-biphenoxy) phenyl, 3- (4 -Aromatic compounds such as -biphenyloxy) phenyl, 4- (2-biphenyloxy) phenyl, 4- (3-biphenyloxy) phenyl, 4- (4-biphenyloxy) phenyl Oxyaryl; 2-phenoxyethoxy, 2-naphthyloxyethoxy, 2- (2-biphenoxy) ethoxy, 2- (3-biphenoxy) ethoxy Aryloxyalkoxy, 2- (4-biphenyloxy) ethoxy Wait.

Among these, the aromatic ring-containing group is preferably phenyl, 1-naphthyl, 2-naphthyl, 2-biphenyl, 3-biphenyl, 4-biphenyl, 9H-carbazole-9- Phenyl, phenoxy, 1-naphthyloxy, 2-naphthyloxy, 2-biphenoxy, 3-biphenoxy, 4-biphenoxy, 2-phenoxyphenyl, 3-benzene Oxyphenyl, 4-phenoxyphenyl.

Examples of the aromatic ring-containing compound represented by the formula [3] include an aromatic ring-containing vinyl compound, an aromatic ring-containing (meth) acrylate compound, and the like.

Examples of the aromatic ring-containing vinyl compound include styrenes such as styrene, α-methylstyrene, chlorostyrene, bromostyrene, and 4-tert-butylstyrene; 1-vinylnaphthalene, 2- Aromatic vinyl compounds such as vinylnaphthalene, 2-vinylanthracene, 9-vinylanthracene, 2-vinylbiphenyl, 3-vinylbiphenyl, 4-vinylbiphenyl, N-vinylcarbazole .

Examples of the aromatic ring-containing (meth) acrylate compound include phenyl (meth) acrylate, benzyl (meth) acrylate, 1-phenylethyl (meth) acrylate, and 2-benzene (meth) acrylate Ethyl ester, 1-naphthyl (meth) acrylate, 1-naphthyl methyl (meth) acrylate, 2-naphthyl (meth) acrylate, 2-naphthyl methyl (meth) acrylate, (methyl 9-anthracene acrylate, 9-anthryl methyl (meth) acrylate, 9-phenanthryl methyl (meth) acrylate, 1-phenoxyethyl (meth) acrylate, (meth) acrylic acid 2-phenoxyethyl, 2-phenoxybenzyl (meth) acrylate, 3-phenoxybenzyl (meth) acrylate, 4-phenoxybenzyl (meth) acrylate, (methyl ) Acrylic acid 2- (2-biphenyloxy) Ethyl ester, 2- (3-biphenoxy) ethyl (meth) acrylate, 2- (4-biphenoxy) ethyl (meth) acrylate, and the like.

Among these, the aromatic ring-containing compound represented by the formula [3] is preferably styrene, 2-phenoxybenzyl (meth) acrylate, 3-phenoxybenzyl (meth) acrylate, (methyl ) 4-phenoxybenzyl acrylate, 2- (2-biphenoxy) ethyl (meth) acrylate, 2- (3-biphenoxy) ethyl (meth) acrylate, (methyl) 2- (4-biphenoxy) ethyl acrylate and the like are more preferably styrene, 3-phenoxybenzyl (meth) acrylate, and 2- (2-biphenoxy) ethyl (meth) acrylate Esters, etc.

The said aromatic ring containing compound can be used individually by 1 type or in combination of 2 or more types.

(b) The aromatic ring-containing polymer of the component may contain other repeating units other than the repeating unit as long as the effect of the present invention is not impaired. Monomers for obtaining other repeating units are typically exemplified by vinyl compounds, maleimines, acrylonitrile, and maleic anhydride.

Examples of the vinyl compound include methyl vinyl ether, 2-hydroxyethyl vinyl ether, propyl vinyl ether, benzyl vinyl ether, and phenyl vinyl ether.

Examples of the maleimidines include maleimide, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, and the like.

In the aromatic ring-containing polymer of the component (b), the repeating unit derived from the aromatic ring-containing compound containing a polymerizable double bond is based on the viewpoint of increasing the refractive index of the obtained cured film, compared to (meth) acrylic acid and / or The repeating unit of the (meth) acrylate compound is 1 mole, preferably 0.3 to 20 mole%, more preferably 0.5 to 10 mole%, and more preferably 1 to 5 mole%. Further, in the aromatic ring-containing polymer of the component (b), the repeating unit derived from the (meth) acrylic acid and / or (meth) acrylate compound and the repeating unit derived from the aromatic ring-containing compound containing a polymerizable double bond The content is preferably 50 to 100 mole%, more preferably 75 to 100 mole%, and even more preferably 100 mole%.

The aromatic ring-containing polymer of the component (b) can be synthesized by polymerizing a monomer that obtains the aforementioned repeating unit. As the polymerization method, radical polymerization, anionic polymerization, cationic polymerization, and the like can be used. However, since the polymer having the necessary weight average molecular weight (Mw) of the present invention can be produced relatively easily, radical polymerization is preferred.

Examples of the starting agent include peroxides such as benzophenazine peroxide, cumene hydroperoxide, and third butyl hydrogen peroxide; persulfates such as sodium persulfate, potassium persulfate, and ammonium persulfate; even Azo compounds such as azoisobutyronitrile, azobis (2-methylbutyronitrile), azobisisovaleronitrile, 2,2'-azobis (isobutyric acid) dimethyl, and the like. The amount of this initiator cannot be specified because it varies with the type or amount of monomer and the reaction temperature, but it is usually about 0.005 to 0.05 mole relative to 1 mole of the monomer. The reaction temperature during the polymerization may be appropriately set from 0 ° C to the boiling point of the catalyst used, but it is usually about 20 to 100 ° C. The reaction time is about 0.1 to 30 hours.

The polymerization is preferably performed in a solvent, and a solvent generally used in the reaction may be used as a solvent for the polymerization reaction. Specific water; methanol, B Alcohol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, 2-methyl-2-propanol, 1-pentanol, 2-pentanol Alcohol, 3-pentanol, 3-methyl-1-butanol, 2-methyl-2-butanol, 1-hexanol, 1-heptanol, 2-heptanol, 3-heptanol, 2-octanol Alcohols, alcohols such as 2-ethyl-1-hexanol, benzyl alcohol, cyclohexanol; diethyl ether, diisopropyl ether, dibutyl ether, cyclopentyl methyl ether, tetrahydrofuran, 1,4-dioxane And other ethers; halogenated hydrocarbons such as chloroform, dichloromethane, dichloroethane, carbon tetrachloride, etc .; methylcellolysin, ethylcellolysin, isopropylcellolysin, butylcellolysin, diethyl Ether alcohols such as glycol monobutyl ether; alkanediol diacetates such as ethylene glycol diacetate and propylene glycol diacetate; diethylene glycol monomethyl ether acetate, diethylene glycol Monoethyl ether acetate, diethylene glycol monopropyl ether acetate, diethylene glycol monoisopropyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoisobutyl ether acetate Esters, diethylene glycol monohexyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate, dipropylene glycol mono-shank ether acetate, dipropylene glycol monoisopropyl ether ethyl Esters, dipropylene glycol monobutyl ether acetate, dipropylene glycol monoisobutyl ether acetate, dipropylene glycol monohexyl ether acetate, and other dioxane monoalkyl ether acetates; acetone, methyl ethyl ketone, Ketones such as methyl isobutyl ketone, cyclohexanone, etc .; esters such as ethyl acetate, butyl acetate, ethyl propionate, cellosolve acetate, etc .; n-pentane, n-hexane, n-heptane, Aliphatic n-octane, n-nonane, n-decane, cyclopentane, methylcyclopentane, cyclohexane, methylcyclohexane, benzene, toluene, xylene, ethylbenzene, anisole, etc. Or aromatic hydrocarbons; acetals such as methylal, diethyl acetal; fatty acids such as formic acid, acetic acid, propionic acid; nitro compounds such as nitropropane, nitrobenzene; dimethylamine, Monoethanolamine, pyridine, etc .; N-methyl-2-pyrrolidone, N, N-dimethylformamide, etc. Fluorene amines; fluorenes such as dimethyl sulfene; nitriles such as acetonitrile. From these, the solvent to be used is appropriately selected in consideration of the type or amount of the monomer or the initiator, the reaction temperature, and the like.

(b) The weight average molecular weight (Mw) of the aromatic ring-containing polymer of the component is preferably 5,000 to 500,000 from the viewpoint of ensuring the solubility of the polymer and preparing a composition capable of obtaining a better cured film. In particular, when considering the excessive increase in the viscosity of the composition, the upper limit of the Mw of the polymer is preferably 200,000, more preferably 150,000, more preferably 100,000, and even more preferably 80,000. When the viscosity of the composition is inhibited from excessively decreasing, The lower limit value is preferably 10,000, more preferably 15,000, still more preferably 30,000, and even more preferably 40,000. The Mw in the present invention is a polystyrene conversion measured value by gel permeation chromatography (GPC).

The aromatic ring-containing polymer may be any of a random copolymer, an alternating copolymer, and a block copolymer.

[(c) Solvent]

The composition of the present invention may contain (c) a solvent. (c) If the solvent is capable of dissolving the components (a) and (b), and further contains (d) a monofunctional (meth) acrylate compound described later, (e) a polyfunctional (meth) acrylate compound, ( f) Ion trapping agents, (g) silane coupling agents, (h) radical polymerization initiators, polymerization inhibitors, and other additives are not particularly limited as long as they can be dissolved.

Specific examples of the solvent include diethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol, 1,2-ethanediol (ethylene glycol), and 1,2-propylene. Alkanediol (ethylene glycol), 1,2-butanediol, 2,3-butanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentane Glycols such as alkanediol, 2-methyl-2,4-pentanediol (hexanediol), 1,3-octanediol, 3,6-octanediol; triols such as glycerol ; Glycol monomethyl ether, Glycol monoethyl ether, Glycol monopropyl ether, Glycol monoisopropyl ether, Glycol monobutyl ether, Glycol monoisobutyl ether, Glycol monohexyl ether Ethylene glycol monoalkane ethers, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monoisopropyl ether, propylene glycol monobutyl ether, propylene glycol monoisobutyl ether, propylene glycol monohexyl ether, etc. Ethers such as alkanediol monoalkane ethers; ethylene glycol monophenyl ethers such as ethylene glycol monoaryl ethers; propylene glycol monophenyl ethers such as propylene glycol monoaryl ethers; etc; Ethylene glycol monoaralkyl ethers such as glycol monobenzyl ether, Ethylene glycol monoaralkyl ethers such as propylene glycol monoaralkyl ether such as propylene glycol monobenzyl ether; Ethylene glycol monoaryl ether such as ethylene glycol butoxy ether Alkylene glycol alkane ethers such as alcohol alkoxy alkyl ethers, propylene glycol butoxy ether, etc. Alkyl ethers; ethylene glycol dimethyl ethers, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, ethylene glycol diisopropyl ether, ethylene glycol dibutyl ether, and the like Methyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, propylene glycol diisopropyl ether, propylene glycol dialkyl ethers such as propylene glycol dialkyl ethers, and other alkanediol dialkyl ethers; ethylene glycol monomethyl ether acetate, ethyl ether Glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monoisopropyl ether acetate, ethylene glycol monobutyl ether acetate and the like, Propylene glycol monomethyl ether acetate, Propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monoisopropyl ether acetate, propylene glycol monoalkyl ether acetate, and other alkanediol monoalkyl ether acetates, etc. Types; ethylene glycol monoacetates such as ethylene glycol monoacetate, alkanediol monoacetates such as propylene glycol monoacetate, propylene glycol monoacetates, etc .; ethylene glycol diacetates, etc. Ethylene glycol diacetates, propylene glycol diacetates, propylene glycol diacetates, and other alkanediol diacetates; diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol monoacetate Diethylene glycol monoalkane ethers such as propylene ether, diethylene glycol monoisopropyl ether, diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monohexyl ether, etc. Dipropylene glycol monoethers such as methyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoisopropyl ether, dipropylene glycol monobutyl ether, dipropylene glycol monoisobutyl ether, dipropylene glycol monohexyl ether, etc. Alkanediol monoalkane ethers; diethylene glycol monobenzyl ethers and other dioxane monoaryl ethers; diethylene glycol monophenyl ethers and other diethylene glycol Alcohol monoaryl ethers, dipropylene glycol monophenyl ethers and other dipropylene glycol monoaryl ethers and other dioxane glycol monoaryl ethers; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene glycol diaryl ether Diethylene glycol dialkyl ethers such as propyl ether, diethylene glycol diisopropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, dipropylene glycol dipropyl ether, dipropylene glycol di Dipropylene glycol dialkyl ethers such as isopropyl ether, dipropylene glycol dibutyl ether, etc .; diethylene glycol dialkyl ethers such as diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, Ethylene glycol monopropyl ether acetate, diethylene glycol monoisopropyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoisobutyl ether acetate, diethylene glycol mono Diethylene glycol monoalkyl ether acetates such as hexyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate, dipropylene glycol monopropyl ether acetate, dipropylene glycol monoisopropyl ether Dipropylene glycol monoalkyl ethers such as dipropylene glycol monoalkyl ether acetates, dipropylene glycol monobutyl ether acetate, dipropylene glycol monoisobutyl ether acetate, dipropylene glycol monohexyl ether acetate, and the like Acetic acid esters; triethylene glycol monoalkyl ethers such as triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, etc .; tripropylene glycol monomethyl ethers such as tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. Alkanediol monoalkane ethers; triethylene glycol dialkyl ethers such as triethylene glycol dimethyl ether, triethylene glycol diethyl ether, and tripropylene glycol dialkyl ethers such as tripropylene glycol dimethyl ether, tripropylene glycol diethyl ether, etc. Trianediol dialkyl ethers; 1-propanol, 2-propanol, 1-butanol, 2-butanol, 1-pentanol, 1-hexanol, 1-heptanol, 1-nonyl Alcohols, 1-decanol, 1-undecanol, 1-dodecanol, 1-tetradecanol, etc., linear aliphatic alcohols, cyclohexanol, 2-methylcyclohexanol, etc. Fatty alcohols Phenols such as phenol; aromatic alcohols such as benzyl alcohol; heterocyclic alcohols such as furfuryl alcohol; hydrogenated heterocyclic alcohols such as tetrahydrofurfuryl alcohol; diisopropyl ether, di-n-butyl ether, di-n-hexyl ether, etc. Dialkyl ethers; methylphenyl ether, ethylphenyl ether, n-butylphenyl ether, benzyl (3-methylbutyl) ether, (2-methylphenyl) methyl ether, Alkyl aryl ethers such as (3-methylphenyl) methyl ether, (4-methylphenyl) methyl ether; Alkyl aryl alkyl ethers such as ethyl benzyl ether; Cyclic alkyl monoethers such as 2-methylfuran, tetrahydrofuran, and tetrahydropyran; cyclic alkyl diethers such as 1,4-dioxane; cyclic alkyl triethers such as trioxane Class; diethoxyalkyl ethers such as diglycidyl ether; ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, second butyl acetate, third acetic acid Linear or branched acetic acid such as butyl ester, n-pentyl acetate, (3-methylbutyl) acetate, n-hexyl acetate, (2-ethylbutyl) acetate, (2-ethylhexyl) acetate, etc. Alkyl esters, cyclic acetic acid alkyls such as cyclohexyl acetate, 2-methylcyclohexyl acetate, etc .; ethyl propionate, n-propyl propionate, isopropyl propionate, propionic acid N-butyl ester, isobutyl propionate, second butyl propionate, third butyl propionate, n-pentyl propionate, (3-methylbutyl) propionate, n-hexyl propionate, propionic acid (2 -Ethyl butyl) ester, (2-ethylhexyl) propionate, linear or branched alkyl propionates, cyclic, such as cyclohexyl propionate, 2-methyl cyclohexyl propionate, etc. Alkyl propionates such as alkyl propionates; ethyl butyrate, n-propyl butyrate, isopropyl butyrate, N-butyl butyrate, isobutyl butyrate, second butyl butyrate, third butyl butyrate, n-amyl butyrate, (3-methylbutyl) butyrate, n-hexyl butyrate, butyrate (2-ethylbutyl) ester, (2-ethylhexyl) butyrate, linear or branched alkyl butyrate, cyclohexyl butyrate, 2-methylcyclohexyl butyrate, etc. Alkyl butyrate esters such as cyclic butyric acid; ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, second butyl lactate, third butyl lactate, N-amyl lactate, (3-methylbutyl) lactate, n-hexyl lactate, (2-ethylbutyl) lactate, (2-ethyl lactate) (Hex) esters, such as linear or branched alkyl lactates, cyclohexyl lactate, 2-methylcyclohexyl lactate, cyclic alkane alkanes, etc. alkanoates, etc .; benzyl acetate Aralkyl acetates such as esters, aralkyl propionates such as benzyl propionate, aralkyl butyrate such as benzyl butyrate, aralkyl lactates such as benzyl lactate Alkyl esters; diethyl ketone, diisopropyl ketone, methyl ethyl ketone, methyl n-propyl ketone, methyl n-butyl ketone, methyl isobutyl ketone, methyl n-propyl ketone, Dialkyl ketones such as methyl-n-hexyl ketone, ethyl n-butyl ketone, and di-n-propyl ketone; cyclic alkenyl ketones such as isophorone; cyclic alkyl ketones such as cyclohexanone; 4 -Hydroxy-4-methyl-2-pentanone (diacetone alcohol) and other hydroxydialkyl ketones; furfural and other heterocyclic aldehydes; pentane, octane, 2,2,3-trimethyl Linear or branched alkanes such as hexane, decane, dodecane; toluene, xylene, o-xylene, m-xylene, p-xylene, mesitylene, tetrahydronaphthalene, cyclohexyl Alkylbenzenes such as benzene; cyclohexanone, methylcyclohexanone, ethylcyclohexanone, etc. Cycloalkanes and the like are not limited thereto. These solvents can be used alone or in combination of two or more.

The composition of the present invention preferably contains a resin having a temperature of 150 ° C or higher, more preferably 180 ° C or higher, and more preferably 200 ° C or higher, from the viewpoint of obtaining a good film reproducibility when the composition is coated by a printing method. Standard boiling Point of solvent. By including a solvent having this boiling point, a good liquid film state can be achieved with good reproducibility.

Based on these circumstances, when the printing method is used as the coating method, the composition of the present invention preferably contains a solvent containing an aromatic ring polymer that can well dissolve the component (b), and is specifically selected from diols, alkanes, and the like. Diethylene glycol diacetates, dioxane monoalkyl ethers, dioxane monoaryl ethers, dioxane monoaryl ethers, alkylene glycol monoalkyl ether acetates, and alkylene glycol monoaryl ethers At least one type of alkyl ether.

Specific examples of such a solvent include propylene glycol diacetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, and diethyl ether. Glycol monobutyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, diethylene glycol monohexyl ether, triethylene glycol monobutyl ether, propylene glycol mono Butyl ether, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, diethylene glycol monophenyl ether, ethylene glycol monobenzyl ether, diethylene glycol monobenzyl ether, and the like are not limited thereto.

(c) The solvent of the component is preferably such that the solid content concentration in the composition of the present invention becomes 1 to 95% by mass, more preferably the solid content concentration becomes 5 to 90% by mass, and even more preferably the solid content concentration. The amount is 10 to 85% by mass. Here, the solid content means that the solvent is removed from all components of the composition of the present invention.

The composition of the present invention may further include a monofunctional (meth) acrylate compound, a polyfunctional (meth) acrylate compound, and a radical polymerization initiator for the purpose of adhesion and hardness adjustment of the cured film. , Silane coupling agents, polymerization inhibitors, etc.

[(d) Monofunctional (meth) acrylate compound]

The composition of the present invention may also contain (d) a monofunctional (meth) acrylate compound. In the present invention, the so-called monofunctional (meth) acrylate compound is a compound containing one (meth) acrylfluorenyl group in the molecule, and is exemplified as the monomer component of the aromatic ring-containing polymer as the component (b). Aliphatic (meth) acrylate compound or aromatic ring-containing (meth) acrylate compound. Among these, the (d) monofunctional (meth) acrylate compound is preferably an aromatic ring-containing (meth) acrylate compound, and particularly preferably an aromatic ring-containing (meth) acrylic acid represented by the formula [3]. An ester compound is exemplified. A monofunctional (meth) acrylate compound may be used individually by 1 type, and may be used in combination of 2 or more type.

Specific examples of preferred aromatic ring-containing (meth) acrylate compounds include benzyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, 2-phenoxybenzyl (meth) acrylate, 3-phenoxybenzyl (meth) acrylate, 4-phenoxybenzyl (meth) acrylate, 2- (2-biphenoxy) ethyl (meth) acrylate, (meth) acrylic acid 2 -(3-biphenoxy) ethyl, 2- (4-biphenoxy) ethyl (meth) acrylate, and the like. Among these, benzyl (meth) acrylate, 3-phenoxybenzyl (meth) acrylate, and 2- (2-biphenoxy) ethyl (meth) acrylate are more preferred, and more preferably 3-phenoxybenzyl (meth) acrylate.

The content of the monofunctional (meth) acrylate compound of the component (d) is preferably 0 to 100 parts by mass based on 100 parts by mass of the aromatic ring-containing polymer of the component (b) based on the refractive index of the obtained cured film. , It is more preferably 0 to 50 parts by mass, and still more preferably 0 to 30 parts by mass.

[(e) Multifunctional (meth) acrylate compound]

The composition of the present invention may include (e) a polyfunctional (meth) acrylate compound from the viewpoint of adjusting the physical properties of the cured film. In the present invention, the so-called polyfunctional (meth) acrylate compound is a compound containing at least two (meth) acryl groups in a molecule, and specific examples thereof are esters of a polyhydric alcohol and (meth) acrylic acid. Moreover, especially from the viewpoint of improving the hardness, the number of (meth) acrylfluorenyl groups in one molecule of the multifunctional (meth) acrylate compound is preferably 3 to 6, more preferably 3 or 4. Examples of such a polyhydric alcohol include glycerol, erythritol, pentaerythritol, trimethylolethane, trimethylolpropane, dipentaerythritol, and di-trimethylolpropane.

Specific examples of the polyfunctional (meth) acrylate compound include neopentyl glycol di (meth) acrylate, bisphenol A di (meth) acrylate, and ethylene oxide modified bisphenol A di (meth) acrylate. Bifunctional (meth) acrylate compounds having two (meth) acrylfluorenyl groups, such as meth) acrylates; pentaerythritol tri (meth) acrylate, trimethylolethane tri (meth) acrylate , Trimethylolpropane tri (meth) acrylate, etc., trifunctional (meth) acrylate compounds with three (meth) acrylfluorenyl groups; pentaerythritol tetra (meth) acrylate, di-trimethylol 4-functional (meth) acrylate compounds having four (meth) acrylfluorenyl groups such as propane tetra (meth) acrylate; dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate 5 to 6-functional (meth) acrylic acid having 5 or 6 (meth) acryl groups The acrylate compound and the like are not limited thereto. A polyfunctional (meth) acrylate compound may be used individually by 1 type, and may be used in combination of 2 or more type.

The aforementioned polyfunctional (meth) acrylate compound can be easily obtained as a commercial product, and specific examples thereof include, for example, KAYARAD (registered trademark) NPGDA, R-551, T-1420, DPHA manufactured by Nippon Kayaku Co., Ltd. , DPHA-2C, D-310, D-330, DPCA-20, DPCA-30, DPCA-60, DPCA-120, DN-0075, DN-2475, R-526, MANDA, GPO-303, TMPTA, THE -330, TPA-320, TPA-330, PET-30, RP-1040; ARONIX (registered trademark) M-211B, M-6200, M-309, M-400, M-402, M-405, M-450, M-7100, M-8030, M-8060, M-1310, M-1600, M-1960, M-8100, M-8530, M-8560, M-9050; Osaka Organic Chemical industry (stock) system BISCOTE 700HV, 295, 300, 360, GPT, 3PA, 400, 312; Shin Nakamura Chemical Industry (stock) system NK ESTER ABE-300, A-BPE-4, A-BPE-10, A -BPE-20, A-BPE-30, A-BPE-3, A-B1206PE, BPE-80N, BPE-100, BPE-200, BPE-500, BPE-900, BPE-1300N, NPG, A-9300 , A-9300-1CL, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, AD-TMP, ATM-35E , A-TMMT, A-9500, A-DPH, TMPT, etc.

According to a preferred aspect of the present invention, the polyfunctional (meth) acrylate compound contained in the composition of the present invention contains at least one polyfunctional (meth) group having 3 or 4 (meth) acrylfluorenyl groups. Acrylated 组合。 The compound.

When the polyfunctional (meth) acrylate compound containing the component (e) is contained, the content is preferably 10 to 300 parts by mass, more preferably 20 to 200 parts by mass relative to 100 parts by mass of the aromatic ring-containing polymer of the component (b). It is more preferably 50 to 150 parts by mass. If the content is in the aforementioned range, the hardness improvement effect of the cured film is obtained, and cracking does not occur.

[(f) Ion trapping agent]

The composition of the present invention may further include (f) an ion trapping agent. (f) The ion trapping agent has a function of preventing migration due to contact of the metal wiring and the like with water especially when the substrate is made of metal or when metal wiring is formed on the substrate.

From the viewpoint of improving the migration inhibition energy of the obtained cured film, as a preferable example of the ion trapping agent, a compound having a nitrogen-based heterocyclic ring in the structure is exemplified. A so-called nitrogen-based heterocyclic system has a cyclic structure of three or more membered rings containing a saturated or unsaturated bond, and the cyclic structure has one or more nitrogen atoms.

Examples of the nitrogen-based heterocyclic ring include those having a saturated bond, such as aziridine (ethyleneimine), azetidin (azetidine), tetrahydropyrrole (pyrrolidine), and azacyclohexane ( (Piperidine), azacycloheptane (hexamethylene diamine), etc., as examples of those having unsaturated bonds, such as Azirine (1H-nitrogen, 2H-nitrogen), Azine (Azete) ( Azetidine diene), azole (1H-pyrrole, 2H-pyrrole, imidazole, pyrazole, 1,2,3-triazole, 1,2,4-triazole, 1H-tetrazole), pyridine, Azepine Azepine (Azatropilidene), imidazolidine, pyrazine, triazine (1,2,3-triazine, 1,2,4-triazine, 1,3,5-triazine), etc., and also examples It is a porphyrin, choline, phthalocyanine, etc. that binds a plurality of nitrogen-based heterocycles.

Further, as the nitrogen-based heterocyclic ring, nitrogen-based heterocyclic rings may be condensed with each other or with an aromatic ring hydrocarbon compound (benzene ring or naphthalene ring), and examples thereof include benzotriazole, indole, isoindole, and benzo. Imidazole, quinoline, isoquinoline, quinoline, oxoline, purine, pyridine, acridine, carbazole and the like.

In addition, as the nitrogen-based heterocyclic ring, a hetero atom other than a nitrogen atom may be used, and examples include, for example, a sulfur atom-containing thiazole, isothiazole, and quinoline; or an oxygen atom-containing oxazole, isoxazole, Furazine, morpholine, 3-pyrazolinone, 5-pyrazolinone, benzoxazole, etc.

Furthermore, it may be an addition compound of a nitrogen-based heterocyclic ring in which other nitrogen-based heterocyclic rings such as isocyanuric acid are added to the nitrogen-based heterocyclic rings. In the present invention, the nitrogen-based heterocyclic ring may be used singly or in combination.

Specific examples of the compound having a nitrogen-based heterocyclic ring in the structure include 2,4-diamino-6-vinyl-1,3,5-triazine, 2,4-diamino-6-vinyl -1,3,5-triazine isocyanuric acid adduct salt, 2,4-diamino-6- (2- (meth) propenyloxyethyl) -1,3,5-triazine , 2- [2-hydroxy-4- (hexyloxy) phenyl] -4,6-diphenyl-1,3,5-triazine, 2,4-bis (2,4-dimethylbenzene ) -6- (2-hydroxy-4-octyloxyphenyl) -1,3,5-triazine, 2- (2-hydroxy-4-hexyloxyphenyl) -4,6-diphenyl -1,3,5-triazine, 2- [2-hydroxy-4- [3- (2-ethylhexyl-1-oxy) -2-hydroxypropoxy] phenyl] -4,6 -Bis (2,4-dimethylphenyl) -1,3,5-triazine, 2- [4- [2-hydroxy-3- (dodecyloxy) propoxy] -2-hydroxy Phenyl] -4,6-bis (2,4-dimethylphenyl)- 1,3,5-triazine, 2,4-bis [2-hydroxy-4-butoxyphenyl] -6- (2,4-dibutoxyphenyl) -1,3,5-tris Triazine compounds such as hydrazine, N'-third butyl-N-cyclopropyl-6- (methylthio) -1,3,5-triazine-2,4-diamine; 1,2,3 -Benzotriazole, 1,2,3-benzotriazole sodium salt, 3-methyl-1H-benzotriazole, 4-methyl-1H-benzotriazole, 5-methyl-1H- Benzotriazole, carboxybenzotriazole, 1- [N, N-bis (2-ethylhexyl) aminomethyl] benzotriazole, 1- [N, N-bis (2-ethylhexyl) ) Aminomethyl] methylbenzotriazole, 2,2 '-[[(methyl-1H-benzotriazol-1-yl) methyl] imino] bisethanol, 6- (2- Benzotriazolyl) -4-third octyl-6'-third butyl-4'-methyl-2,2-methylenebisphenol, 2- (5-methyl-2-hydroxybenzene Phenyl) benzotriazole, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2-benzotriazole, 2- (3-thirdbutyl -5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, 2- (2-hydroxy-3,5-di-third-pentylphenyl) -2H-benzotriazole, 2 -(2-hydroxy-5-third octylphenyl) benzotriazole, 2- (3-dodecyl-2-hydroxy-5-methylphenyl) benzotriazole, 2- (2 -Hydroxy-5-third butylphenyl) benzotriazole, 2- (2-hydroxy- 3,5-di-tert-butylphenyl) -5-chlorobenzotriazole, 2,2'-methylenebis [6- (2H-benzotriazol-2-yl) -4-section Trioctylphenol], 2- (3-second butyl-5-third butyl-2-hydroxyphenyl) benzotriazole, 2- (2-hydroxy-5-third butylphenyl) -2-benzotriazole, 2- (2H-benzotriazol-2-yl) -6- (1-methyl-1-phenylethyl) -4- (1,1,3,3- Tetramethylbutyl) phenol, 2- (2'-hydroxy-5 '-(meth) propenyloxyethylphenyl) -2H-benzotriazole, etc. Limited to these.

Among them, the ion trapping agent preferably contains a 1H-benzotriazole compound, and more preferably contains 1H-benzotriazole which may be substituted by an alkyl group having 1 to 3 carbon atoms. Even more preferably it contains 5-methyl-1H-benzotriazole.

The compound having a nitrogen-based heterocyclic ring in the structure can be synthesized by a conventional method, and can also be obtained as a commercial product. Specific examples of commercially available products are Tinuvin (registered trademark) 234, 326, 328, 329, 400, 405, 460, 571, 928, 1577, P, PS, UVITEX (registered trademark) OB, IRGAGUARD (registered trademark) D 1071 (above manufactured by BASF), SB-UVA 6164, SB-UVA 6577, EVERSORB 70, EVERSORB 75 (above are SORT (shares)), CURAZOLE (registered trademark) VT, VT-OK, MAVT (above are Shikoku Chemical Industry Co., Ltd.), BT-120, JCL-400, CBT-1, BT-LX, TT-LX, TT-LYX, JAST-500, JF-832 (the above are the Chengbei Chemical Corporation (shares )), 5MBT (made by CHEMIPRO), RUVA-93 (made by Otsuka Chemical Co., Ltd.), 5-methyl-1H-benzotriazole (made by Tokyo Chemical Industry Co., Ltd.), and the like.

Other preferable examples of the ion trapping agent include hydrazine derivatives, sulfur-containing phosphines, and the like. As specific examples thereof, decamethylenedicarboxylic acid disalicylidene hydrazine, N, N'-bis [3- [3,5-di-third-butyl-4-hydroxyphenyl] propionyl ] Hydrazine, 2,2'-oxalamine bis [ethyl 3- (3,5-third butyl-4-hydroxyphenyl) propionate], bisbenzylidene hydrazine oxalate, m-xylylene Formic acid bis (2-phenoxypropenylhydrazine), tris [2-thirdbutyl-4- (2'-methyl-4'-hydroxy-5'-third butylphenylthio) -5 -Methylphenyl] phosphite and the like. These may be used individually by 1 type, and may use 2 or more types together.

The hydrazine derivative and sulfur-containing phosphine can be synthesized by a conventional method, and can also be obtained on the market. Specific examples of commercially available products are inhibitors OABH (made by Eastman), ADEKASTAB (registered trademark) CDA-6 (made by ADEKA (stock)), Irganox (registered trademark) MD 1024 (made by BASF), and the like.

When the ion trapping agent containing the component (f) is contained in an amount of 100 parts by mass with respect to the aromatic ring-containing polymer of the component (b), it is preferable to obtain a film having excellent hardness, adhesion and the like with good reproducibility. 20 parts by mass or less, more preferably 10 parts by mass or less, and from the viewpoint of excellent migration suppression energy, 0.001 parts by mass or more is more preferable, 0.005 parts by mass or more is more preferable, and 0.01 parts by mass or more is more preferable.

[(g) Silane coupling agent]

The composition of the present invention may include (g) a silane coupling agent from the viewpoint of improving the adhesion of the obtained cured film to a substrate or the like. According to a preferred aspect, the silane coupling agent includes a silane compound represented by the formula [4]. .

In the formula [4], R ⁶ represents a methyl group or an ethyl group. X represents a hydrolyzable group. Y represents a reactive functional group. L ⁷ represents a single bond or an alkylene group having 1 to 10 carbon atoms. a represents an integer from 0 to 2.

Examples of the alkylene group having 1 to 10 carbon atoms represented by L ⁷ include methylene, ethylene, trimethylene, methylethylene, tetramethylene, 1-methyltrimethylene, and pentaethylene. Methyl, 2,2-dimethyltrimethylene, hexamethylene, octamethylene, decamethylene, and the like. Among these, trimethylene is preferred.

Examples of the hydrolyzable group represented by X are a halogen atom and a carbon number An alkoxy group of 1 to 3, an alkoxyalkoxy group of 2 to 4 carbons, and the like. Examples of the halogen atom include a chlorine atom and a bromine atom. The alkoxy group having 1 to 3 carbon atoms is preferably a linear or branched one, and specific examples thereof include a methoxy group, an ethoxy group, an n-propoxy group, and an isopropoxy group. The alkoxyalkoxy group having 2 to 4 carbon atoms is specifically a methoxymethoxy group, a 2-methoxyethoxy group, an ethoxymethoxy group, and a 2-ethoxyethoxy group.

Examples of the reactive functional group represented by Y include an amine group, a ureido group, a (meth) acrylfluorenyl group, a vinyl group, an epoxy group, and a mercapto group. Among these, an amine group, a ureido group, and a (meth) acrylic fluorenyloxy group are preferable, and an amine group or a urea group is more preferable.

Specific examples of the silane coupling agent include 3-aminopropyltrichlorosilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, and 3-aminopropyl (methyl (Dimethoxy) silane, 3-aminopropyl (methyl) (diethoxy) silane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane , 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, vinyltrichlorosilane, vinyltrimethoxysilane, ethylene Triethoxysilane, allyl trichlorosilane, allyl trimethoxysilane, allyl triethoxysilane, 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxy Propyl (methyl) (diethoxy) silane, 3-glycidyloxypropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3 -Mercaptopropyl (methyl) (dimethoxy) silane, 3-mercaptopropyl (methyl) (diethoxy) silane, 7-octenyltrichlorosilane, 7-octenyltrimethoxy Silane, 7-octenyl triethoxy Silyl, 8-glycidyloxyoctyltrichlorosilane, 8-glycidyloxyoctyltrimethoxysilane, 8-glycidyloxyoctyltriethoxysilane, 8- (meth) acrylic acid Oxyoctyltrichlorosilane, 8- (meth) acryloxyoctyltrimethoxysilane, 8- (meth) acryloxyoctyltriethoxysilane, 8-oxiranyl Octyltrichlorosilane, 8-oxiranyloctyltrimethoxysilane, 8-oxiranyloctyltriethoxysilane, and the like.

Among these, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-ureidopropyltrimethoxysilane, and 3-ureidopropyltriethoxysilane are preferred. , 3- (meth) propenyloxypropyltrimethoxysilane, 3- (meth) propenyloxypropyltriethoxysilane, and the like.

Silane coupling agents can be synthesized using conventional methods or can be obtained as commercially available products. Moreover, a silane coupling agent can be used individually by 1 type or in combination of 2 or more types.

When the silane coupling agent containing the component (g) is contained, the content is preferably 0.001 to 10 parts by mass, more preferably 0.01 to 5 parts by mass, and more preferably 100 parts by mass of the aromatic ring-containing polymer of the component (b). It is 0.05 to 1 part by mass. If the content is in the aforementioned range, the effect of improving adhesion is obtained, and the hardness is not reduced.

[(h) radical polymerization initiator]

The composition of the present invention may contain (h) a radical polymerization initiator in order to promote the polymerization of the polymerizable component contained in the composition. For example, although spontaneous polymerization can be performed by high-temperature processing, when high-temperature hardening processing such as denaturation of a substrate cannot be performed, a radical polymerization initiator can be used. A low-temperature hardening process or a light hardening process is performed.

The radical polymerization initiator may be any substance that can release radical polymerization by irradiation with light and / or heating. Examples of photoradical polymerization initiators include benzophenone derivatives, imidazole derivatives, bisimidazole derivatives, N-aryl glycine derivatives, organic azide compounds, titanocene compounds, and aluminates Complexes, organic peroxides, N-alkoxypyridinium salts, thioxanthone derivatives, and the like. More specifically, benzophenone, 1,3-bis (third butyldioxycarbonyl) benzophenone, 3,3 ', 4,4'-tetrakis (third butyldioxy) Carbonyl) benzophenone, 3-phenyl-5-isoxazolone, 2-mercaptobenzimidazole, bis (2,4,5-triphenyl) imidazole, 2,2-dimethoxy- 1,2-diphenylethane-1-one, 1-hydroxycyclohexyl = phenyl = ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinyl) butane- 1-one, bis (η ⁵ -2,4-cyclopentadien-1-yl) bis (2,6-difluoro-3- (1H-pyrrole-1-yl) phenyl) titanium, etc., but not Limited to these.

As the photoradical polymerization initiator, commercially available products can be used, and examples thereof include IRGACURE (registered trademark) 651, 184, 369, and 784 manufactured by BASF Corporation. In addition, commercially available products other than the foregoing may be used, and specific examples are IRGACURE 500, 907, 379, 819, 127, 754, 250, 1800, 1870, OXE01, TPO, DAROCUR (registered trademark) 1173 manufactured by BASF; Lambson Speedcure (registered trademark) MBB, PBZ, ITX, CTX, EDB made by the company; Esacure (registered trademark) ONE, KIP150, KT046 made by Lamberti; KAYACURE (registered trademark) DETX-S, CTX, BMS made by Japan Chemicals , DMBI, etc.

Examples of the thermal radical polymerization initiator include acetamidine peroxide, benzamidine peroxide, methyl ethyl ketone peroxide, cyclohexanone peroxide, hydrogen peroxide, and third butyl group. Hydrogen peroxide, cumene hydroperoxide, di-third butyl peroxide, dicumene peroxide, dilauryl peroxide, third butyl peroxyacetate, third butyl Peroxyvalerate, tert-butperoxy-2-ethylhexanoate (2-ethylperoxyhexanoate tert-butyl ester), etc .; 2,2'-azobis Isobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile), (1-phenylethyl) azodiphenylmethane, 2,2'-azobis (4- (Methoxy-2,4-dimethylvaleronitrile), 2,2'-azobisisobutyric acid dimethyl ester, 2,2'-azobis (2-methylbutyronitrile), 1,1 '-Azobis (1-cyclohexylcarbonitrile), 2- (aminomethylamidoazo) isobutyronitrile, 2,2'-azobis (2,4,4-trimethylpentane) Azo compounds such as 2-phenylazo-2,4-dimethyl-4-methoxyvaleronitrile, 2,2'-azobis (2-methylpropane); ammonium persulfate, Persulfate, etc. of sodium persulfate, potassium persulfate, etc., but not limited to Wait.

Examples of commercially available thermal radical polymerization initiators include PEROYL (registered trademark) IB, NPP, IPP, SBP, TCP, OPP, SA, 355, L, PERBUTYL (registered trademark) ND, NHP, MA, PV, 355, A, C, D, E, L, I, O, P, Z, PERHEXYL (registered trademark) ND, PV, D, I, O, Z, PEROCTA (registered trademark) ND, NYPER (registered trademark) PMB, BMT, BW, Pertetra (registered trademark) A, Perhexa (registered trademark) MC, TMH, HC, 250, 25B, C, 25Z, 22, V, PEROCTA (registered trademark) 0, PERCUMYL (registered trademark) Trademark) ND, D, PERMENTA (registered trademark) H, NOFMER (registered trademark) BC; Wako Pure Chemical Industries, Ltd. V-70, V-65, V-59, V-40, V-30, VA-044, VA-046B, VA-061, V-50, VA-057, VA-086, VF-096, VAM-110, V-601, V-501; IRGACURE 184, 369, 651, 500, 819, made by BASF, 907, 784, 2959, CGI1700, CGI1750, CGI1850, CG24-61, TPO, DAROCUR 1116, 1173; SAITEK SURFACE SPECIALITIES company UVECRYL (registered trademark) P36; Lamberti company Esacure KIP150, KIP65LT, KIP100F, KT37, KT55, KT046 , KIP75 / B, etc., but not limited to them.

When the radical polymerization initiator contains the component (h), its content is preferably 1 to 20 parts by mass, more preferably 1 to 15 parts by mass, relative to 100 parts by mass of the aromatic ring-containing polymer of the component (b).

The composition of the present invention may contain a polymerization inhibitor if necessary. Specific examples of the polymerization inhibitor include 2,6-diisobutylphenol, 3,5-di-third-butylphenol, 3,5-di-third-butylcresol, hydroquinone, and hydroquinone monomethyl ether. , Biphenyltriol, third butyl catechol, 4-methoxy-1-naphthol, etc. When a polymerization inhibitor is contained, the content is preferably 1% by mass or less, and more preferably 0.5% by mass or less in the total solid content.

The composition of the present invention may further include a surfactant, a cross-linking agent, a defoaming agent, a rheology modifier, a pigment, a dye, a storage stabilizer, a polyhydric phenol, or a polycarboxylic acid without impairing the effects of the present invention as required. Dissolution accelerators for acids, etc.

It is not particularly limited as a surfactant, but an example is given as an example Such as fluorine-based surfactants, silicon-based surfactants, non-ionic surfactants and so on. Examples of such surfactants include, for example, EF TOP (registered trademark) EF301, EF303, and EF352 made by Mitsubishi Materials Electrochemical Corporation (Stock); MEGAFAC (registered trademark) F171, F173 made by DIC (Share); FLUORAD (registered trademark) made by 3M Corporation ) FC430, FC431; ASAHIGARD (registered trademark) made by Asahi Glass (registered trademark) AG710, AGC SEMICHEMICAL (share) made of SURFLON (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105, SC106, etc.

Examples of the cross-linking agent include a polyfunctional epoxy compound, a polyfunctional isocyanate compound, a polyfunctional thiol compound, and a melamine-based cross-linking agent. When a polyfunctional (meth) acrylate compound is included, it is preferably trifunctional or higher. Thiol compounds. The polyfunctional thiol compound can be obtained as an addition reactant of a polyhydric alcohol and a monofunctional and / or polyfunctional thiol compound. Examples of specific compounds include 1,3,5-tris (2- (3-mercaptopropionyloxy) ethyl) isocyanurate, 1,3,5-tris (2- (3-mercaptobutyryloxy) (Ethyl) ethyl) isocyanurate (manufactured by Showa Denko Corporation, KARENZ MT (registered trademark) NR1), trifunctional thiol compounds such as trimethylolpropane tri (3-mercaptopropionate); pentaerythritol 4-functional thiol compounds such as tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutyrate) (manufactured by Showa Denko, KARENZ MT PEI); dipentaerythritol hexa (3-mercaptopropionate) ) And other 6-functional thiol compounds.

Examples of defoamers are acetylene glycol, polysiloxane fluids and emulsions, ethoxylated or propoxylated polysiloxanes, hydrocarbons, fatty acid ester derivatives, ethyl acetate The halogenated polyamine, poly (alkylene oxide) polymer, copolymer, and the like are not limited thereto. When screen printing is performed, the composition of the present invention preferably contains a defoamer.

The viscosity of the composition of the present invention at 25 ° C is preferably from 1 to 10,000 mPa · s, more preferably from 1 to 50,000 mPa · s, and even more preferably from 1 to 1,000 mPa · s from the viewpoint of coatability. If the viscosity is in the above range, the coatability is good, and the desired film thickness can be obtained.

The viscosity of the composition of the present invention at 25 ° C is preferably from 10 to 100,000 mPa · s, more preferably from 500 to 100,000 mPa · s, and even more preferably from 1,000 to 100,000 mPa · s from the viewpoint of printability. If the viscosity is in the aforementioned range, the ejection property is good, no load is applied to the steps, and the composition is not diffused after coating or the transferability of the composition to the substrate is reduced.

When forming a microstructure hardened film such as an insulating film that forms a bridge structure between the X-axis electrode and the Y-axis electrode of the touch panel orthogonal to each other, when a printing method such as screen printing or gravure printing is used, the invention The viscosity of the composition at 25 ° C is preferably 10 to 100,000 mPa‧s, more preferably 5,000 to 100,000 mPa‧s, and even more preferably 20,000 to 100,000 mPa‧s. If the viscosity is in the aforementioned range, the ejection property is good, no load is applied to the steps, and the composition is not diffused after coating or the transferability of the composition to the substrate is reduced. In the present invention, the viscosity is a value measured by an E-type viscometer.

The method for preparing the composition of the present invention is not limited. As an example, the aromatic ring-containing polymer of component (b) is dissolved in a solvent, and other components are mixed in the solution at a specific ratio to make a uniform solution. Method. When preparing the composition of the present invention, a solution containing an aromatic ring-containing polymer obtained by a polymerization reaction in a solvent can be used as it is. In this case, it is sufficient to feed other components into a solution containing an aromatic ring-containing polymer to make a uniform solution. Further, a solvent may be further added for the purpose of concentration adjustment.

From the viewpoint of obtaining a more uniform cured film, the composition thus prepared is preferably used after filtration using a filter having a pore size of about 0.2 μm or the like.

[Hardened film]

The composition of the present invention is made by spin coating, flow coating, roll coating, slit coating, spin coating subsequent to slit coating, inkjet coating, screen printing, soft printing, gravure printing, and lithography. Printing, gravure lithography, etc. are applied to substrates with electrodes and / or wiring (such as silicon / silicon dioxide coated substrates; silicon nitride substrates; metals, silver, such as aluminum, molybdenum, chromium, copper, silver, etc. Metal nanowires such as nanowires, metal nanowires such as silver nano particles, copper nano particles, poly (3,4-ethylenedioxythiophene) / poly (styrene sulfonate) (PEDOT / (PSS), graphene, carbon nanotube and other conductive polymer-coated substrates; glass substrates; quartz substrates; indium tin oxide (ITO) substrates; ITO film substrates; triethyl cellulose (TAC) films, polyester Film, acrylic film, resin film substrate such as cyclic olefin (COP) film, etc.), followed by pre-drying (pre-baking) with a hot plate or oven to form a coating film. The composition of the present invention is particularly suitable for printing methods such as inkjet coating, screen printing, flexographic printing, and gravure lithography.

Pre-baking is generally carried out at a temperature of better than 60 to 150 ° C, more preferably 80 to 120 ° C, and a treatment of 0.5 to 30 minutes when using a hot plate, and 0.5 to 90 minutes when using an oven.

Next, baking is performed after heat curing. Specifically, heating is performed using a hot plate, an oven, or the like. Post-baking is generally performed at a temperature of better than 150-300 ° C, more preferably 200-250 ° C. It is processed for 1 to 30 minutes when using a hot plate, and for 1 to 90 minutes when using an oven.

When the composition of the present invention contains a thermal radical initiator, it can be hardened at a low temperature. In this case, the pre-baking conditions are the same as described above, but the post-baking temperature is preferably 60 to 200 ° C, more preferably 80 to 150 ° C. Other conditions are the same as described above.

In addition, when the composition of the present invention contains a photo-radical initiator, after the pre-baking, the coating film may be irradiated with light such as ultraviolet rays (UV) to perform photo-hardening. The aforementioned light preferably has a wavelength in a range of 200 to 500 nm, and its exposure amount is preferably 100 to 5,000 mJ / cm ² .

After light hardening, baking after heat hardening can also be performed. Specifically, heating is performed using a hot plate, an oven, or the like. Post-baking generally adopts a method of better than 60 ~ 150 ℃, more preferably 80 ~ 120 ℃, processing for 1 to 30 minutes when using a hot plate, and processing for 1 to 90 minutes when using an oven.

By hardening the composition of the present invention under the aforementioned conditions, the step of the substrate can be sufficiently flattened, and a hardened film having a high refractive index can be formed.

The cured film of the present invention can be easily formed by a simple method such as printing, and further has a high refractive index, so it can be expected to be formed. Materials for protective films, flattening films, insulating films, etc. in various displays such as organic EL elements, and hardened films such as protective films and insulating films in touch panels.

A conductive member provided with a cured film of the present invention formed on a substrate on which a metal electrode and / or metal wiring is formed so as to be in contact with the electrode and / or wiring, since the corrosion of the electrode and / or wiring is suppressed, It is possible to suppress an increase in resistance in the electrode or wiring, peeling of the electrode or metal from other members, and the like, and as a result, it is excellent in durability.

[Example]

Hereinafter, the present invention will be described more specifically with reference to production examples, comparative production examples, examples, and comparative examples, but the present invention is not limited to the following examples. In the examples, the devices and conditions used for the preparation of the samples and the analysis of the physical properties are as follows.

(1) Stirring and defoaming

Installation: THINKY (share) rotation and revolution mixer AWATORY Rintaro (registered trademark) ARE-310

(2) Spin coating

Device: Cee (registered trademark) I00 made by Brewer Science

(3) UV exposure

Device: Conveyor belt UV lamp system (H bulb) manufactured by HEAREUS

(4) constant temperature bath

Device: Small environmental tester SH-222 made by ESPEC

(5) Gel permeation chromatography (GPC)

Device: Shodex (registered trademark) GPC-101, manufactured by Showa Denko Corporation

Column: Showa Denko Shodex GPC KF-803L + KF-804L

Column temperature: 40 ℃

Solvent: THF

Flow: 1mL / min

Detector: RI

Calibration line: standard polystyrene

(6) Measurement of refractive index

Device: Metricon Model 2010 / M 稜鏡 Coupler

Measurement temperature: 25 ° C

(7) Measurement of total light transmittance

Device: Nephelometer NDH 5000 made by Nippon Denshoku Industries Co., Ltd.

Wavelength range: 380 ~ 780nm

The abbreviations have the following meanings.

EPPA: ethoxylated o-phenylphenol acrylate (NK ESTER A-LEN-10 manufactured by Shin Nakamura Chemical Industry Co., Ltd.)

MAA: methacrylic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)

MMA: methyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.)

POBA: 3-phenoxybenzyl acrylate (LIGHT ACRYLATE POB-A manufactured by Kyoeisha Chemical Co., Ltd.)

St: Styrene (manufactured by Tokyo Chemical Industry Co., Ltd.)

MAIB: 2,2'-azobis (isobutyric acid) dimethyl ester (manufactured by Tokyo Chemical Industry Co., Ltd.)

BPFDA: Bisphenol hydrazone diacrylate (OGSOL EA-F5710, manufactured by Osaka Gas Chemical Co., Ltd.)

TMPTA: Trimethylolpropane triacrylate (NK ESTER A-TMPT manufactured by Shin Nakamura Chemical Industry Co., Ltd.)

A771: polysiloxane based defoamer (AGITAN771 manufactured by MUNZING)

APTES: (3-aminopropyl) triethoxysilane (LS-3150, manufactured by Shin-Etsu Chemical Industry Co., Ltd.)

MBT: 5-methyl-1H-benzotriazole (manufactured by Tokyo Chemical Industry Co., Ltd.)

1184: 1-hydroxycyclohexyl = phenyl = ketone (IRGACURE (registered trademark) 184 manufactured by BASF)

DEGEEA: Diethylene glycol monoethyl ether acetate (manufactured by Tokyo Chemical Industry Co., Ltd.)

PGDA: Propylene glycol diacetate (manufactured by Wako Pure Chemical Industries, Ltd.)

[1] Manufacturing of polymers [Production Example 1] Production of aromatic ring-containing polymer 1

In a 1-liter four-necked flask, 324.5 g of PGDA as a solvent was fed. In this PGDA, a mixture of MMA 61.6 g (0.62 mol), St 150.0 g (1.44 mol), and MAIB 4.72 g (0.02 mol) was added dropwise over 2 hours while stirring at 70 ° C (internal temperature) under a nitrogen atmosphere. liquid. Dropwise After that, it was further reacted at 70 ° C. for 20 hours to obtain a polymer solution P1 having a polymer concentration of 40% by mass. The polymer Mw in P1 was 65,000.

[Production Example 2] Production of aromatic ring-containing polymer 2

In a 1-liter four-necked flask, 315.1 g of PGDA as a solvent was fed. In this PGDA, a mixture of 30.0 g (0.30 mol) of MMA, 177.8 g (0.70 mol) of POBA and 2.30 g (0.01 mol) of MAIB was added dropwise under stirring in a nitrogen atmosphere at 70 ° C (internal temperature) for 2 hours. liquid. After the dropwise addition, the mixture was further reacted at 70 ° C. for 20 hours to obtain a polymer solution P2 having a polymer concentration of 40% by mass. The polymer Mw in P2 was 125,000.

[Production Example 3] Production of aromatic ring-containing polymer 3

In a 1-liter four-necked flask, 329.5 g of PGDA as a solvent was fed. In this PGDA, a mixture of 30.0 g (0.30 mol) of MMA, 187.4 g (0.70 mol) of EPPA and 2.30 g (0.01 mol) of MAIB was added dropwise under stirring in a nitrogen atmosphere at 70 ° C (internal temperature) for 2 hours. liquid. After the dropwise addition, the mixture was further reacted at 70 ° C. for 20 hours to obtain a polymer solution P3 having a polymer concentration of 40% by mass. The polymer Mw in P3 was 56,000.

[Production Example 4] Production of aromatic ring-containing polymer 4

In a 1-liter four-necked flask, 345.0 g of PGDA as a solvent was fed. In this PGDA, a mixture of 27.5 g (0.32 mol) of MAA, 200.0 g (0.75 mol) of EPPA and 2.45 g (0.01 mol) of MAIB was added dropwise under stirring in a nitrogen atmosphere at 70 ° C (internal temperature) for 2 hours. liquid. Dropwise Then, it was further reacted at 70 ° C for 20 hours to obtain a polymer solution P4 having a polymer concentration of 40% by mass. The polymer Mw in P4 was 70,000.

[Comparative Production Example 1] Production of polymer without aromatic ring

In a 1-liter four-necked flask, 303.5 g of DEGEEA as a solvent was fed. In this DEGEEA, a mixed solution of 200.0 g (2.00 mol) of MMA and 2.30 g (0.01 mol) of MAIB was added dropwise under stirring in a nitrogen atmosphere at 70 ° C (internal temperature) for 2 hours. After the dropwise addition, the mixture was further reacted at 70 ° C. for 20 hours to obtain a polymer solution P5 having a polymer concentration of 40% by mass. The polymer Mw in P5 was 95,000.

[2] Preparation of a resin composition for forming a cured film [Example 1]

250 parts by mass of the polymer solution P1 obtained in Production Example 1 (100 parts by mass based on the polymer), 55 parts by mass of BPFDA as a fluorene compound, 55 parts by mass of TMPTA as a polyfunctional (meth) acrylate, and ion trapping 6 parts by mass of MBT of the agent, 0.1 parts by mass of APTES as the silane coupling agent, 0.65 parts by mass of A771 as an antifoaming agent, 6.4 parts by mass of I184 as a radical polymerization initiator and 70 parts by mass of PGDA as a solvent are mixed . This mixture was stirred and degassed at 2,000 rpm for 10 minutes to prepare a paint having a solid content concentration of 50% by mass. Here, the solid component refers to all components except the solvent.

[Examples 2 to 4, Comparative Examples 1 to 2]

Except that the formulation of each component was changed as described in Table 1, each paint was prepared in the same manner as in Example 1.

[3] Production and evaluation of hardened film [Evaluation of refractive index]

The paints of Examples 1 to 4 and Comparative Examples 1 to 2 were respectively coated on a glass substrate by spin coating, and prebaked in an oven at 110 ° C. for 10 minutes. The obtained coating film was subjected to UV exposure (exposure amount 800 mJ / cm ² ), and then baked in an oven at 110 ° C. for 30 minutes to produce a cured film having a thickness of about 5 μm.

The refractive index and total light transmittance of the obtained cured film at a wavelength of 633 nm were measured. The results are shown in Table 2.

As shown in Table 2, the cured film obtained from the composition of the present invention has a high refractive index at a wavelength of 633 nm and is 1.56 or more (Examples 1 to 4). In contrast, a cured film (Comparative Example 1) without a polymer having an aromatic group and a cured film (Comparative Example 2) in which a fluorene compound is not formulated have lower refractive indices of 1.557 and 1.540, respectively.

Claims (13)

A resin composition for forming a high refractive index cured film, comprising (a) a fluorene compound represented by the formula [1], and (b) an aromatic ring-containing polymer containing (meth) acrylic acid and / or Repeating units of aliphatic (meth) acrylate compounds (except those with a silane structure in the side chain) and repeating units derived from aromatic ring-containing compounds containing polymerizable double bonds: (In the formula, R ¹ and R ² each independently represent a hydrogen atom or a methyl group, L ¹ and L ² each independently represent a phenyl group which may contain a substituent or a naphthalenediyl group which may contain a substituent, and L ³ and L ⁴ respectively Independently represents an alkylene group having a carbon number of 1 to 6, and m and n represent integers satisfying 0 ≦ m ≦ 40, 0 ≦ n ≦ 40, and 0 ≦ m + n ≦ 40). The resin composition for forming a high refractive index cured film according to claim 1, further comprising (c) a solvent. The resin composition for forming a high refractive index cured film according to claim 1 or 2, further comprising (d) a monofunctional (meth) acrylate compound. Resin for forming a high refractive index cured film according to any one of claims 1 to 3 The composition further includes (e) a polyfunctional (meth) acrylate compound. The resin composition for forming a high refractive index cured film according to claim 4, wherein (e) the polyfunctional (meth) acrylate compound is selected from a compound containing three (meth) acrylfluorenyl groups in one molecule and containing 4 At least one group of (meth) acrylfluorenyl compounds. The resin composition for forming a high refractive index cured film according to any one of claims 1 to 5, further comprising (f) an ion trapping agent. The resin composition for forming a high refractive index cured film according to claim 6, wherein (f) the ion trapping agent contains a benzo-1H-triazole compound. The resin composition for forming a high refractive index cured film according to any one of claims 1 to 7, further comprising (g) a silane coupling agent. The resin composition for forming a high refractive index cured film according to claim 8, wherein (g) the silane coupling agent contains a silane compound represented by the formula [4], (In the formula, R ⁶ represents a methyl group or an ethyl group, X represents a hydrolyzable group, Y represents a reactive functional group, L ⁷ represents a single bond or an alkylene group having 1 to 10 carbon atoms, and a represents an integer of 0 to 2) . The resin composition for forming a high refractive index cured film according to any one of claims 1 to 9, further comprising (h) a radical polymerization initiator. The resin composition for forming a high refractive index cured film according to any one of claims 1 to 10, which is used for a screen printing method. A high-refractive index cured film obtained from the resin composition for forming a high-refractive index cured film according to any one of claims 1 to 11. A conductive member includes a base material on which a metal electrode and / or metal wiring is formed, and a high refractive index cured film as claimed in claim 12 formed on the base material so as to be in contact with the electrode and / or wiring.