TW201808423A - Gas recovery and purification method achieving the purpose of gas recovery and purification by producing purified gases from a mixed gas - Google Patents
Gas recovery and purification method achieving the purpose of gas recovery and purification by producing purified gases from a mixed gas Download PDFInfo
- Publication number
- TW201808423A TW201808423A TW105106543A TW105106543A TW201808423A TW 201808423 A TW201808423 A TW 201808423A TW 105106543 A TW105106543 A TW 105106543A TW 105106543 A TW105106543 A TW 105106543A TW 201808423 A TW201808423 A TW 201808423A
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- purification tank
- purification
- tank
- temperature
- Prior art date
Links
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
Description
本發明係有關於一種氣體回收純化方法;特別是有關於一種利用固體沒有蒸汽壓的基本特性,將混合氣體中的部份氣體冷凍成為固體,使氣相中只剩下一種稀有氣體即為純化後的稀有氣體,而得到高純度的稀有氣體的氣體回收純化方法。 The invention relates to a gas recovery and purification method; in particular, it relates to a method that utilizes the basic characteristics of solids without vapor pressure to freeze part of the gas in the mixed gas into a solid, so that only one rare gas in the gas phase is purified. A method for recovering and purifying a rare gas and obtaining a high-purity rare gas.
在半導體工業的製程中,使用大量的高純度稀有氣體,也產生大量的稀有氣體廢氣,這些稀有氣體廢氣都是二種以上稀有氣體的混合氣體,必須加以分離純化後才能再利用,例如氖、氬和氪的混合氣體必需將氖氣、氬氣、氪氣純化分開後才能再利用。 In the process of the semiconductor industry, a large amount of high-purity rare gases are used, and a large amount of rare gas exhaust gas is also generated. These rare gas exhaust gases are a mixture of two or more rare gases and must be separated and purified before being reused, such as neon, The mixed gas of argon and krypton must be purified and separated before being reused.
專利文獻1:US5294422A。專利文獻1是在1944年於美國揭露的一種稀有氣體純化技術,其利用鋯釩二種金屬的合金製成的氣體捕捉器去除稀有氣體中的不純物,而得到高純度的稀有氣體。 Patent Document 1: US5294422A. Patent Document 1 is a rare gas purification technology disclosed in the United States in 1944. It uses a gas trap made of an alloy of two metals, zirconium and vanadium, to remove impurities in the rare gas and obtain a rare gas with high purity.
專利文獻2:EP0422559A1。專利文獻2是在1991年於歐洲揭露的一種稀有氣體純化技術,其是利用金屬和陶瓷製造成多孔性的儲氫材料去除稀有氣體中的不純物,而得到高純度的稀有氣體。 Patent Document 2: EP0422559A1. Patent Document 2 is a rare gas purification technology disclosed in Europe in 1991. It uses metals and ceramics to produce porous hydrogen storage materials to remove impurities in the rare gases and obtain rare gases with high purity.
專利文獻3:US6843973(B2)。專利文獻3是2002年於美國揭露的一種稀有氣體純化技術,其利用蒸餾法從 氧氣中回收氪和氙。 Patent Document 3: US6843973 (B2). Patent Document 3 is a rare gas purification technology disclosed in the United States in 2002. Krypton and xenon are recovered from oxygen.
前述的氣體捕捉器或儲氫材料都是用吸附法或化學反應法去除稀有氣體中的不純物,以得到純化的稀有氣體,至於蒸餾法是用於液態蒸發為氣態之分離,由於液態也有其蒸汽壓,因此需要精餾塔才能將它們分離,而且很難達到高純度的氣體。 The aforementioned gas traps or hydrogen storage materials are used to remove impurities in rare gases by adsorption or chemical reaction methods to obtain purified rare gases. As for the distillation method, liquid evaporation is used for gaseous separation. Pressure, so a rectification column is required to separate them, and it is difficult to achieve high purity gases.
發明人有鑑於此,乃苦思細索,積極研究,加以多年從事相關產品研究之經驗,並經不斷研究及改良,終於發展出本發明。 In view of this, the inventors have been thinking hard, actively researching, and having years of experience in researching related products, and after continuous research and improvement, finally developed the present invention.
本發明的目的在於提供一種可回收及純化氣體的氣體回收純化方法。 An object of the present invention is to provide a gas recovery and purification method capable of recovering and purifying a gas.
本發明達成上述目的之步驟包括:a)準備一純化槽,該純化槽為雙套層純化槽,具有一夾層空間;b)準備一冷凍劑儲存槽、一混合氣體儲存槽及一第一氣體儲存槽;c)將冷凍劑灌入純化槽的夾層空間,藉以使純化槽內的溫度維持在一預定溫度範圍內;d)將混合氣體灌入純化槽進行冷凍固化,產生由非氣態物質所構成的剩餘固體物質,以及由氣態物質所構成的第一種純化氣體;該剩餘固體物質累積在該純化槽內;該第一種純化氣體排出至該第一氣體儲存槽;藉此方法可達到回收及純化氣體的目的。 The steps of the present invention to achieve the above objective include: a) preparing a purification tank, which is a double-layered purification tank with a sandwich space; b) preparing a refrigerant storage tank, a mixed gas storage tank, and a first gas Storage tank; c) filling refrigerant into the interlayer space of the purification tank, so as to maintain the temperature in the purification tank within a predetermined temperature range; d) pouring mixed gas into the purification tank for freeze solidification, resulting in non-gaseous substances The remaining solid material and the first purified gas composed of gaseous materials; the remaining solid material is accumulated in the purification tank; the first purified gas is discharged to the first gas storage tank; Purpose of gas recovery and purification.
較佳者,該步驟b)包含:步驟b1)在將冷凍劑灌入純化槽的夾層空間之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入與第一種純化氣體相同的氣體;藉此方法,可提高氣體純化的程度。 Preferably, step b) comprises: step b1) before purging the refrigerant into the interlayer space of the purification tank, first performing purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: Use the vacuum method and / or fill the purification tank with the same gas as the first purification gas; by this method, the degree of gas purification can be improved.
較佳者,該步驟c)之預定溫度範圍高於「混合氣體中之凝固點第一低者」的沸點,並低於「混合氣體中之凝固點第二低者」的凝固點;藉此方法,可獲得高純度的氣體。 Preferably, the predetermined temperature range of step c) is higher than the boiling point of "the first lowest freezing point in the mixed gas" and lower than the freezing point of "the second lowest freezing point in the mixed gas"; Obtain a high-purity gas.
較佳者,該步驟d)之後更包括下列步驟:e)提高純化槽內的溫度,使純化槽內的溫度高於「剩餘固體物質中沸點最低者」的沸點以進行汽化,產生由氣態物質所構成的第二種純化氣體,以及由其它物質構成的剩餘固體物質;在使「剩餘固體物質中沸點最低者」汽化的過程中,一邊等待「剩餘固體物質中沸點最低者」汽化,一邊將已經汽化的氣體排出至一第二氣體儲存槽,可達到回收及純化氣體的目的。 Preferably, after step d), the following steps are further included: e) increasing the temperature in the purification tank so that the temperature in the purification tank is higher than the boiling point of "the lowest boiling point of the remaining solid matter" for vaporization to produce gaseous substances The second type of purified gas and the remaining solid matter composed of other substances; in the process of vaporizing "the lowest boiling point among the remaining solid substances", while waiting for the "lowest boiling point among the remaining solid substances" to vaporize, The vaporized gas is discharged to a second gas storage tank, which can achieve the purpose of recovering and purifying the gas.
較佳者,該步驟d)包含:步驟d1)在提高純化槽內的溫度之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氣態的「剩餘固體物質中沸點最低者」;藉此方法,可獲得高純度的氣體。 Preferably, the step d) comprises: step d1) before increasing the temperature in the purification tank, first performing a purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: using a vacuum method And / or filling the purification tank with the gaseous "lowest boiling point of the remaining solid matter"; by this method, a high-purity gas can be obtained.
較佳者,該步驟e)之後更包括下列步驟:f)重複執行步驟e)至少一次,可達到回收及純化氣體的目的。 Preferably, after step e), the following steps are further included: f) Step e) is repeatedly performed at least once to achieve the purpose of recovering and purifying the gas.
本發明的另一目的在於提供一種可回收及純化氖氣、氬氣及氪氣的氣體回收純化方法。 Another object of the present invention is to provide a gas recovery and purification method capable of recovering and purifying neon gas, argon gas and krypton gas.
本發明達成上述目的之步驟包括:a)準備一純化槽,該純化槽為雙套層純化槽,具有一夾層空間;b)準備一冷凍劑儲存槽、一混合氣體儲存槽及一第一氣體儲存槽;該冷凍劑為液態氮;該混合氣體包括:氖氣、氬氣及氪氣;c)將冷凍劑灌入純化槽的夾層空間,藉以使純化槽 內的溫度維持在一預定溫度範圍內;該預定溫度範圍高於氖的沸點,並低於氬的凝固點;d)將混合氣體灌入純化槽進行冷凍固化,產生由固態的氬及氪所構成的剩餘固體物質,以及由氖氣所構成的第一種純化氣體;該剩餘固體物質累積在該純化槽內;該第一種純化氣體排出至該第一氣體儲存槽;藉此方法,可達到回收及純化氖氣的目的。 The steps of the present invention to achieve the above objective include: a) preparing a purification tank, which is a double-layered purification tank with a sandwich space; b) preparing a refrigerant storage tank, a mixed gas storage tank, and a first gas Storage tank; the refrigerant is liquid nitrogen; the mixed gas includes: neon, argon, and krypton; c) the refrigerant is filled into the interlayer space of the purification tank, so that the purification tank The temperature inside is maintained within a predetermined temperature range; the predetermined temperature range is higher than the boiling point of neon and lower than the freezing point of argon; d) the mixed gas is poured into a purification tank for freeze solidification, resulting in solid argon and krypton Residual solid matter, and the first purified gas composed of neon gas; the residual solid matter is accumulated in the purification tank; the first purified gas is discharged to the first gas storage tank; by this method, it can be achieved The purpose of recovery and purification of neon gas.
較佳者,該步驟b)包含:步驟b1)在將冷凍劑灌入純化槽的夾層空間之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氖氣;藉此方法,可獲得高純度的氖氣。 Preferably, step b) comprises: step b1) before purging the refrigerant into the interlayer space of the purification tank, first performing purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: The vacuum method is used and / or the purification tank is filled with neon gas; by this method, high purity neon gas can be obtained.
較佳者,該步驟d)之後更包括下列步驟:e)提高純化槽內的溫度,使純化槽內的溫度高於氬的沸點,並低於氪的凝固點,以進行氬汽化,產生由氬氣所構成的第二種純化氣體,以及由固態的氪所構成的剩餘固體物質;在使氬汽化的過程中,一邊等待氬汽化,一邊將已經汽化的氬氣排出至一第二氣體儲存槽;藉此方法,可達到回收及純化氬氣的目的。 Preferably, after step d), the following steps are further included: e) increasing the temperature in the purification tank so that the temperature in the purification tank is higher than the boiling point of argon and lower than the freezing point of tritium for argon vaporization to produce argon. The second purified gas composed of gas and the remaining solid matter composed of solid krypton; in the process of argon vaporization, while waiting for the argon to vaporize, the vaporized argon gas is discharged to a second gas storage tank ; With this method, the purpose of recovering and purifying argon can be achieved.
較佳者,該步驟d)包含:步驟d1)在提高純化槽內的溫度之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氬氣;藉此方法,可獲得高純度的氬氣。 Preferably, the step d) comprises: step d1) before increasing the temperature in the purification tank, first performing a purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: using a vacuum method And / or filling the purification tank with argon; by this method, high-purity argon can be obtained.
較佳者,該步驟e)之後更包括下列步驟:f)提高純化槽內的溫度,使純化槽內的溫度高於氪的沸點,以進行氪汽化,產生由氪氣所構成的第三種純化氣體;在使氪汽化的過程中,一邊等待氪汽化,一邊將已經汽化的氪 氣排出至一第三氣體儲存槽;藉此方法,可達到回收及純化氪氣的目的。 Preferably, after step e), the following steps are further included: f) Increasing the temperature in the purification tank so that the temperature in the purification tank is higher than the boiling point of thorium to perform thorium vaporization and generate a third kind of thorium Purified gas; in the process of vaporizing radon, while waiting for radon to vaporize, the vaporized radon The gas is discharged to a third gas storage tank; by this method, the purpose of recovering and purifying radon gas can be achieved.
較佳者,該步驟e)包含:步驟e1)在提高純化槽內的溫度之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氪氣;藉此方法,可獲得高純度的氪氣。 Preferably, step e) includes: step e1) before increasing the temperature in the purification tank, first performing a purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: using a vacuum method And / or purge radon gas into the purification tank; by this method, high purity radon gas can be obtained.
本發明為達到上述及其他目的,其所採取之技術手段、元件及其功效,茲採一較佳實施例配合圖示說明如下。 In order to achieve the above and other objectives, the present invention adopts the technical means, components, and effects thereof. A preferred embodiment is illustrated below with reference to the drawings.
a、b‧‧‧準備步驟 a, b‧‧‧ preparation steps
b1‧‧‧排淨步驟 b1‧‧‧Draining steps
c‧‧‧控溫步驟 c‧‧‧Temperature control step
d‧‧‧進料步驟 d‧‧‧Feeding steps
d1‧‧‧排淨步驟 d1‧‧‧Draining steps
e‧‧‧控溫步驟 e‧‧‧Temperature control step
e1‧‧‧排淨步驟 e1‧‧‧Draining steps
f‧‧‧控溫步驟 f‧‧‧Temperature control step
圖1為本發明第一實施例之流程圖。 FIG. 1 is a flowchart of a first embodiment of the present invention.
圖2為本發明第二實施例之流程圖。 FIG. 2 is a flowchart of a second embodiment of the present invention.
圖3為本發明第三實施例之流程圖。 FIG. 3 is a flowchart of a third embodiment of the present invention.
圖4為本發明第四實施例之流程圖。 FIG. 4 is a flowchart of a fourth embodiment of the present invention.
如圖1所示之本發明第一實施例,本發明氣體回收純化方法包括下列步驟:a)準備一純化槽,該純化槽為雙套層純化槽,具有一夾層空間;b)準備一冷凍劑儲存槽、一混合氣體儲存槽及一第一氣體儲存槽;c)將冷凍劑灌入純化槽的夾層空間,藉以使純化槽內的溫度維持在一預定溫度範圍內;d)將混合氣體灌入純化槽進行冷凍固化,產生由非氣態物質所構成的剩餘固體物質,以及由氣態物質所構成的第一種純化氣體;該剩餘固體物質累積在該純化槽內;該第一種純化氣體排出至該第一氣體儲存槽;藉此方法,可達到回收及純化氣體的目的。下文將詳 予說明。 As shown in FIG. 1, the first embodiment of the present invention, the gas recovery and purification method of the present invention includes the following steps: a) preparing a purification tank, which is a double-layered purification tank with a sandwich space; b) preparing a freezing Agent storage tank, a mixed gas storage tank, and a first gas storage tank; c) the refrigerant is filled into the interlayer space of the purification tank to maintain the temperature in the purification tank within a predetermined temperature range; d) the mixed gas Filled into the purification tank for freeze solidification to produce the remaining solid matter composed of non-gaseous substances and the first purified gas composed of gaseous substances; the remaining solid matter accumulated in the purification tank; the first purified gas It is discharged to the first gas storage tank; by this method, the purpose of recovering and purifying the gas can be achieved. More details below To explain.
步驟a)為準備步驟;準備一純化槽,該純化槽為雙套層純化槽,具有一夾層空間。夾層空間用於放置冷凍劑,藉以控制純化槽內的溫度,其與純化槽連設在一起,例如環設在純化槽的外周。 Step a) is a preparation step. A purification tank is prepared. The purification tank is a double-layered purification tank with a sandwich space. The interlayer space is used to place a refrigerant to control the temperature in the purification tank, and it is connected to the purification tank, for example, it is arranged around the periphery of the purification tank.
步驟b)為準備步驟;準備一冷凍劑儲存槽、一混合氣體儲存槽及一第一氣體儲存槽。冷凍劑可採用例如液態氮等低溫液體。混合氣體可含有各種氣體,當然亦可含有稀有氣體,例如由含有氖氣、氬氣、氪氣的混合氣體。 Step b) is a preparation step; preparing a refrigerant storage tank, a mixed gas storage tank, and a first gas storage tank. The refrigerant may be a low-temperature liquid such as liquid nitrogen. The mixed gas may contain various gases, and of course, it may also contain a rare gas, such as a mixed gas containing neon, argon, and krypton.
步驟c)為控溫步驟;將冷凍劑灌入純化槽的夾層空間,藉以使純化槽內的溫度維持在一預定溫度範圍內。純化槽的夾層空間與內部空間之間係可設有易導熱的結構,以便利用熱傳導來控制純化槽的溫度。因此,當冷凍劑進入夾層空間時,將可影響純化槽的溫度,進而可藉由控制冷凍劑的溫度以控制純化槽內的溫度。 Step c) is a temperature control step; the refrigerant is poured into the interlayer space of the purification tank, thereby maintaining the temperature in the purification tank within a predetermined temperature range. A structure capable of conducting heat can be provided between the interlayer space and the internal space of the purification tank, so as to control the temperature of the purification tank by using heat conduction. Therefore, when the refrigerant enters the interlayer space, the temperature of the purification tank can be affected, and the temperature in the purification tank can be controlled by controlling the temperature of the refrigerant.
步驟d)為進料步驟;將混合氣體灌入純化槽進行冷凍固化,產生由非氣態物質所構成的剩餘固體物質,以及由氣態物質所構成的第一種純化氣體;該剩餘固體物質累積在該純化槽內;該第一種純化氣體排出至該第一氣體儲存槽。在進行此步驟時,當混合氣體灌進純化槽中以後,凝固點高於預定溫度的氣體都會凝固,因此能有效從混合氣體中分離出凝固點低的氣體。此外,在將混合氣體灌入純化槽時,可依預定流量進行,藉以確保在氣體排到第一氣體儲存槽前有足夠的冷凍滯留時間,藉以得到純化後的氣體。 Step d) is a feeding step; the mixed gas is poured into a purification tank for freeze solidification to produce a residual solid substance composed of a non-gaseous substance and a first purified gas composed of a gaseous substance; the residual solid substance accumulates in Inside the purification tank; the first purification gas is discharged to the first gas storage tank. When this step is performed, when the mixed gas is poured into the purification tank, the gas with a freezing point higher than a predetermined temperature will be solidified, so the gas with a low freezing point can be effectively separated from the mixed gas. In addition, when the mixed gas is poured into the purification tank, it can be performed at a predetermined flow rate to ensure that there is a sufficient freezing retention time before the gas is discharged to the first gas storage tank, thereby obtaining a purified gas.
在進行步驟c)的控制預定溫度範圍時,預定溫 度範圍至少要高於「混合氣體中之凝固點第一低者」的沸點,例如將運定溫度範圍控制在高於「混合氣體中之凝固點第一低者」的沸點,並低於「混合氣體中之凝固點第二低者」的凝固點;如此一來,在進行步驟d)時,就可使純化槽中只剩下「混合氣體中之凝固點第一低者」呈氣態,可獲得高純度的氣體。當然,如果已知「混合氣體中之凝固點第一低者」是少量且可忽略不計的氣體,則在控制預定溫度範圍時可忽略這類因素;例如當混合氣體大多是由氖氣、氬氣、氪氣等氣體所組成,而其中還含有少量且可忽略不計的凝固點比氖氣還低的氦氣,則可將預定溫度範圍控制在高於氖氣的沸點,並低於氬氣的凝固點,藉以取得純化後的氖氣。 When performing the control of the predetermined temperature range in step c), the predetermined temperature The temperature range must be at least higher than the boiling point of the "lowest freezing point in mixed gas". For example, the temperature range of the set temperature should be higher than the boiling point of the "lowest freezing point in mixed gas" and lower than the "mixed gas The solidification point of the second lowest solidification point in the middle "; in this way, when step d) is performed, only the" lowest solidification point in the mixed gas "in the purification tank can be left in a gaseous state, and a high purity gas. Of course, if the "lowest freezing point in the mixed gas" is known to be a small amount of negligible gas, then such factors can be ignored when controlling the predetermined temperature range; for example, when the mixed gas is mostly composed of neon, argon , Radon and other gases, and it also contains a small amount of negligible helium with a freezing point lower than neon, the predetermined temperature range can be controlled above the boiling point of neon and below the freezing point of argon To obtain purified neon.
另外,在進行步驟c)的控制預定溫度範圍時,預定溫度範圍應盡量保持在低於「混合氣體中之凝固點第二低者」的凝固點的狀態下,藉以確保「混合氣體中之凝固點第二低者」被凝固。 In addition, when controlling the predetermined temperature range in step c), the predetermined temperature range should be kept below the freezing point of "the second lowest freezing point in the mixed gas" as far as possible to ensure the "second freezing point in the mixed gas" The "lower" is frozen.
在進行步驟d)時,混合氣體中被凝固的氣體的體積大量縮小,而未凝固的氣體又排到第一氣體儲存槽內,因此能長時間運作。 When step d) is performed, the volume of the solidified gas in the mixed gas is greatly reduced, and the uncondensed gas is discharged into the first gas storage tank, so it can operate for a long time.
前述的第一種純化氣體可用壓縮機壓縮後送到第一氣體儲存槽內儲存。 The aforementioned first purified gas can be compressed by a compressor and sent to a first gas storage tank for storage.
前述的純化槽可具有一混合氣體控制閥及至少一排出閥;混合氣體控制閥可控制混合氣體灌入純化槽的流量,藉以確保混合氣體在純化槽內有足夠的冷凍滯留時間。另外,混合氣體控制閥與排出閥可間隔一預定距離,使得混合氣體中的凝固點高於預定溫度範圍的氣體在 從混合氣體控制閥流到排出閥時能夠確實凝固。 The aforementioned purification tank may have a mixed gas control valve and at least one discharge valve; the mixed gas control valve may control the flow rate of the mixed gas into the purification tank, thereby ensuring that the mixed gas has a sufficient freezing retention time in the purification tank. In addition, the mixed gas control valve and the discharge valve can be spaced a predetermined distance apart, so that the gas having a freezing point higher than a predetermined temperature range It can be solidified when flowing from the mixed gas control valve to the discharge valve.
如前所述,夾層空間是利用熱傳導的方式控制純化槽內的溫度,因此,在混合氣體進入純化槽後,大多數的凝固點高的氣體都會凝固在純化槽的內壁面上。在此狀況下,在混合氣體控制閥與排出閥之間的純化槽內部可設有例如柵板、蜿蜒的通道、攔截網體等結構,藉以增加凝固的效率。 As mentioned earlier, the interlayer space uses heat conduction to control the temperature in the purification tank. Therefore, after the mixed gas enters the purification tank, most of the gases with a high freezing point will solidify on the inner wall surface of the purification tank. In this case, structures such as a grid plate, a meandering channel, and a blocking net body may be provided inside the purification tank between the mixed gas control valve and the discharge valve, thereby increasing the efficiency of solidification.
如圖2所示之本發明第二實施例,步驟b)可進一步包含:步驟b1)在將冷凍劑灌入純化槽的夾層空間之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入與第一種純化氣體相同的氣體。 As shown in FIG. 2, in the second embodiment of the present invention, step b) may further include: step b1) before the refrigerant is filled into the interlayer space of the purification tank, a purification tank drainage method is first performed to drain the purification tank. The purification means of the purification tank includes: using a vacuum method and / or filling the purification tank with the same gas as the first purification gas.
在將冷凍劑灌入純化槽的夾層空間之前,純化槽內含有一般氣體;一般氣體的成分複雜,且可能有凝固點低於「混合氣體中之凝固點第一低者」的凝固點的氣體,所以在灌注混合氣體前可先排淨純化槽內的氣體,藉以提高純化的程度。排淨純化槽內的氣體的方式很多,例如將純化槽抽真空。另外,純化槽內的真空度係依使用需求而定,並且在將純化槽抽真空後,可灌入另外準備的與第一種純化氣體相同的氣體,藉以排淨剩餘的氣體;灌入的氣體將隨著從混合氣體中釋放出來的氣體一起排到一第一氣體備用儲存槽,可作為例如調製次級品用。 Before the refrigerant is filled into the interlayer space of the purification tank, the purification tank contains general gas; the composition of the general gas is complex, and there may be gases whose freezing point is lower than the freezing point of the "lowest freezing point in the mixed gas", so Before filling the mixed gas, the gas in the purification tank can be purged to improve the degree of purification. There are many ways to evacuate the gas in the purification tank, such as evacuating the purification tank. In addition, the degree of vacuum in the purification tank depends on the use requirements. After the purification tank is evacuated, the same gas as the first purified gas can be filled in to purify the remaining gas; The gas will be discharged to a first gas reserve storage tank together with the gas released from the mixed gas, and can be used, for example, for preparing secondary products.
如前所述,在進行步驟d)時,會在純化槽內累積固化的剩餘固體物質。剩餘固體物質中當然也可能含有例如稀有氣體等物質。因此,在步驟d)之後可繼續進行其他步驟。茲說明如下。 As mentioned above, when step d) is carried out, solidified residual solid matter is accumulated in the purification tank. The remaining solid matter may of course also contain substances such as noble gases. Therefore, other steps can be continued after step d). It is explained below.
如圖3所示之本發明第三實施例,在步驟d)之後,可進一步進行下列步驟:e)提高純化槽內的溫度,使純化槽內的溫度高於「剩餘固體物質中沸點最低者」的沸點以進行汽化,產生由氣態物質所構成的第二種純化氣體,以及由其它物質構成的剩餘固體物質;在使「剩餘固體物質中沸點最低者」汽化的過程中,一邊等待「剩餘固體物質中沸點最低者」汽化,一邊將已經汽化的氣體排出至一第二氣體儲存槽;藉此方法,可進一步回收及純化剩餘固體物質中的稀有氣體。 The third embodiment of the present invention as shown in FIG. 3, after step d), the following steps may be further performed: e) increasing the temperature in the purification tank, so that the temperature in the purification tank is higher than "the lowest boiling point of the remaining solid matter" ”Boiling point for vaporization, generating a second purified gas composed of gaseous substances, and residual solid substances composed of other substances; in the process of vaporizing“ the lowest boiling point among the remaining solid substances ”, while waiting for the“ remaining "The lowest boiling point of solid matter" is vaporized, and the vaporized gas is discharged to a second gas storage tank; by this method, the rare gas in the remaining solid matter can be further recovered and purified.
當然,與步驟b)相同,步驟d)亦可進一步包含:步驟d1)在提高純化槽內的溫度之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氣態的「剩餘固體物質中沸點最低者」。 Of course, the same as step b), step d) may further include: step d1) before increasing the temperature in the purification tank, performing purification tank exhaustion means to exhaust the gas in the purification tank; the purification tank exhausting means Including: using the vacuum method and / or filling the purification tank with gaseous "the lowest boiling point of the remaining solid matter".
關於提高純化槽的溫度的方式,如前所述,冷凍劑可採用例如液態氮等低溫液體;因此夾層空間可設有調壓閥,藉以提高冷凍劑的溫度,進而提高純化槽內的溫度。 Regarding the method for increasing the temperature of the purification tank, as mentioned above, the cryogen may be a low-temperature liquid such as liquid nitrogen; therefore, a pressure regulating valve may be provided in the interlayer space to increase the temperature of the refrigerant, thereby increasing the temperature in the purification tank.
在完成步驟e)之後,若純化槽內還有剩餘固體物質,可進一步進行下列步驟:e1)重複執行步驟d1)至少一次;f)重複執行步驟e)至少一次,藉以取得更多種類的純化氣體,並分別存放在不同的儲存槽中。 After completing step e), if there are remaining solids in the purification tank, the following steps can be further performed: e1) Repeat step d1) at least once; f) Repeat step e) at least once to obtain more types of purification The gas is stored in different storage tanks.
步驟b1)、步驟d1)、步驟e1)所進行的排淨純化槽內的氣體的動作係視需求而定。例如不進行排淨純化槽內的氣體的動作會減少所得的氣體的純度,但若在可接受範圍內,則可不進行排淨純化槽內的氣體的動作。 The operation of purifying the gas in the purification tank performed in steps b1), d1), and e1) depends on demand. For example, not purifying the gas in the purification tank will reduce the purity of the gas obtained, but if it is within an acceptable range, it may not be purging the gas in the purification tank.
如圖4所示之本發明第四實施例,本發明可適用於回收純化各種混合氣體,在此實施例中,具體採用液態氮為冷凍劑,並採用由氖氣、氬氣、氮氣混合而成的混合氣體,可達到回收純化如氖氣、氬氣及氪氣等稀有氣體的目的;茲說明如下。 The fourth embodiment of the present invention shown in FIG. 4 is applicable to recovering and purifying various mixed gases. In this embodiment, liquid nitrogen is specifically used as a refrigerant, and a mixture of neon, argon, and nitrogen is used. The resulting mixed gas can achieve the purpose of recovering and purifying rare gases such as neon, argon and krypton; it is described below.
在此實施例中,氣體回收純化方法包括下列步驟:a)準備一純化槽,該純化槽為雙套層純化槽,具有一夾層空間;b)準備一冷凍劑儲存槽、一混合氣體儲存槽及一第一氣體儲存槽;該冷凍劑為液態氮;該混合氣體包括:氖氣、氬氣及氪氣;c)將冷凍劑灌入純化槽的夾層空間,藉以使純化槽內的溫度維持在一預定溫度範圍內;該預定溫度範圍高於氖的沸點,並低於氬的凝固點;d)將混合氣體灌入純化槽進行冷凍固化,產生由固態的氬及氮所構成的剩餘固體物質,以及由氖氣所構成的第一種純化氣體;該剩餘固體物質累積在該純化槽內;該第一種純化氣體排出至該第一氣體儲存槽;e)提高純化槽內的溫度,使純化槽內的溫度高於氬的沸點,並低於氪的凝固點,以進行氬汽化,產生由氬氣所構成的第二種純化氣體,以及由固態的氪所構成的剩餘固體物質;在使氬汽化的過程中,一邊等待氬汽化,一邊將已經汽化的氬氣排出至一第二氣體儲存槽;f)提高純化槽內的溫度,使純化槽內的溫度高於氪的沸點,以進行氪汽化,產生由氮氣所構成的第三種純化氣體;在使氪汽化的過程中,一邊等待氪汽化,一邊將已經汽化的氪氣排出至一第三氣體儲存槽;藉此方法,可達到回收及純化氣體的目的,特別是回收及純化氖氣、氬氣、氪氣。 In this embodiment, the gas recovery and purification method includes the following steps: a) preparing a purification tank, which is a double-layered purification tank with an interlayer space; b) preparing a refrigerant storage tank and a mixed gas storage tank And a first gas storage tank; the refrigerant is liquid nitrogen; the mixed gas includes: neon, argon, and krypton; c) the refrigerant is filled into the interlayer space of the purification tank to maintain the temperature in the purification tank Within a predetermined temperature range; the predetermined temperature range is higher than the boiling point of neon and lower than the freezing point of argon; d) the mixed gas is poured into a purification tank for freeze solidification to produce a residual solid substance composed of solid argon and nitrogen And the first purification gas composed of neon gas; the remaining solid matter is accumulated in the purification tank; the first purification gas is discharged to the first gas storage tank; e) the temperature in the purification tank is increased so that The temperature in the purification tank is higher than the boiling point of argon and lower than the freezing point of tritium for argon vaporization to produce a second purified gas composed of argon and the remaining solid matter composed of solid tritium; in In the process of vaporizing argon, while waiting for the argon to vaporize, exhaust the vaporized argon to a second gas storage tank; f) increase the temperature in the purification tank so that the temperature in the purification tank is higher than the boiling point of tritium, and The radon vaporization is performed to generate a third purified gas composed of nitrogen; in the process of radon vaporization, while waiting for radon vaporization, the vaporized radon gas is discharged to a third gas storage tank; by this method, To achieve the purpose of recovering and purifying gas, especially recovering and purifying neon, argon and krypton.
步驟b)所準備的冷凍劑儲存槽中存放的冷凍劑為液態氮,可達到-196℃之低溫,並可透過例如調壓等手段來提高溫度。此外,混合氣體儲存槽中存放的混合氣體包括:氖氣、氬氣及氪氣。此外,步驟b)包含:步驟b1)在將冷凍劑灌入純化槽的夾層空間之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氖氣。 The refrigerant stored in the refrigerant storage tank prepared in step b) is liquid nitrogen, which can reach a low temperature of -196 ° C, and the temperature can be increased by means such as pressure adjustment. In addition, the mixed gas stored in the mixed gas storage tank includes neon gas, argon gas, and radon gas. In addition, step b) includes: step b1) before purging the refrigerant into the mezzanine space of the purification tank, first purifying the tank to purify the gas in the purification tank; the purification tank purging means includes: using a vacuum Way and / or inject neon gas into the purification tank.
在進行步驟c)時,可將純化槽內的溫度控制在-196℃。 During step c), the temperature in the purification tank can be controlled at -196 ° C.
在進行步驟d)後,可使凝固點為-189℃的氬氣及凝固點為-157℃的氪氣冷凍固化成為固體,剩下一種成分是凝固點-248℃的氖氣為氣態。此外,步驟d)包含:步驟d1)在提高純化槽內的溫度之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氬氣。 After step d), argon having a freezing point of -189 ° C and radon having a freezing point of -157 ° C can be freeze-solidified into solids, and the remaining component is neon gas having a freezing point of -248 ° C as a gas. In addition, step d) includes: step d1) before increasing the temperature in the purification tank, first performing a purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: using a vacuum method and / or The purification tank was purged with argon.
在進行步驟e)時,可利用例如調壓的手段來提高液態氮的溫度,進而提高純化槽內的溫度,使純化槽內的溫度介於-163℃至-180℃之間,進而使固態氬汽化成為氣體,因為氬的沸點為-185.8℃;而由於氪的沸點為-157℃,因此氪仍然是固體。此外,步驟e)包含:步驟e1)在提高純化槽內的溫度之前,先進行純化槽排淨手段以排淨純化槽內的氣體;該純化槽排淨手段包括:使用抽真空方式及/或對純化槽灌入氬氣。 When performing step e), the temperature of the liquid nitrogen can be increased by means of, for example, pressure adjustment, thereby increasing the temperature in the purification tank, so that the temperature in the purification tank is between -163 ° C and -180 ° C, and then the solid state Argon vaporizes into a gas because argon has a boiling point of -185.8 ° C; and because rhenium has a boiling point of -157 ° C, rhenium is still a solid. In addition, step e) includes: step e1) before increasing the temperature in the purification tank, first performing a purification tank drainage means to exhaust the gas in the purification tank; the purification tank drainage means includes: using a vacuum method and / or The purification tank was purged with argon.
在進行步驟f)時,可利用例如調壓的手段來提高液態氮的溫度,進而提高純化槽內的溫度,使純化槽內的溫度高於氪的沸點,即高於-152.9℃。 When performing step f), the temperature of the liquid nitrogen can be increased by means of pressure adjustment, for example, and the temperature in the purification tank can be increased, so that the temperature in the purification tank is higher than the boiling point of tritium, that is, higher than -152.9 ° C.
在前述各個控制預定溫度範圍的步驟中,預定溫度範圍可盡量接近純化槽內之氣態物質的凝結點。例如,在進行步驟f)時,預定溫度範圍應盡量接近-152.9℃(例如-150℃),藉以使產生的氪氣維持接近凝結點的溫度,進而方便將產出的氪氣壓縮儲存在第三稀有氣體儲存槽內。 In each of the foregoing steps of controlling the predetermined temperature range, the predetermined temperature range can be as close as possible to the condensation point of the gaseous substance in the purification tank. For example, when performing step f), the predetermined temperature range should be as close as possible to -152.9 ° C (for example, -150 ° C), so as to maintain the generated radon gas at a temperature close to the freezing point, thereby facilitating the compressed radon gas to be stored in the Three rare gas storage tanks.
以上為本案所舉之實施例,僅為便於說明而設,當不能以此限制本案之意義,即大凡依所列申請專利範圍所為之各種變換設計,均應包含在本案之專利範圍中。 The above-mentioned embodiments in this case are provided for convenience of explanation only. When the meaning of this case cannot be limited in this way, that is, all kinds of transformation designs based on the scope of patent applications listed should be included in the scope of patents in this case.
a、b‧‧‧準備步驟 a, b‧‧‧ preparation steps
c‧‧‧控溫步驟 c‧‧‧Temperature control step
d‧‧‧進料步驟 d‧‧‧Feeding steps
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW105106543A TWI584864B (en) | 2016-03-03 | 2016-03-03 | Gas recovery and purification method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW105106543A TWI584864B (en) | 2016-03-03 | 2016-03-03 | Gas recovery and purification method |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI584864B TWI584864B (en) | 2017-06-01 |
TW201808423A true TW201808423A (en) | 2018-03-16 |
Family
ID=59688142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105106543A TWI584864B (en) | 2016-03-03 | 2016-03-03 | Gas recovery and purification method |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI584864B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113457199A (en) * | 2021-04-13 | 2021-10-01 | 中国地质大学(武汉) | Cold hydrazine device for gas separation and application |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5106399A (en) * | 1991-02-25 | 1992-04-21 | Union Carbide Industrial Gases Technology Corporation | Argon purification system |
JP2823835B2 (en) * | 1995-12-06 | 1998-11-11 | 有限会社川井技術研究所 | Method for recovering hydrocarbons from waste gas containing gaseous hydrocarbons |
US6257018B1 (en) * | 1999-06-28 | 2001-07-10 | Praxair Technology, Inc. | PFC recovery using condensation |
US7988755B2 (en) * | 2006-05-04 | 2011-08-02 | Milaebo Co., Ltd. | Byproduct collecting apparatus of semiconductor apparatus |
KR20130098284A (en) * | 2010-06-25 | 2013-09-04 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | Recovery of xe and other high value compounds |
-
2016
- 2016-03-03 TW TW105106543A patent/TWI584864B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI584864B (en) | 2017-06-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI355288B (en) | Inert gas recycling method using gas recycling con | |
US9682859B2 (en) | Hydrogen, lithium, and lithium hydride production | |
TW200829324A (en) | Concentrating/diluting apparatus for specific gases and concentrating/diluting method for specific gases | |
JP5822299B2 (en) | Propane purification method and purification system | |
ITMI20120872A1 (en) | NON EVAPORABLE GETTER ALLOYS PARTICULARLY SUITABLE FOR THE ABSORPTION OF HYDROGEN AND NITROGEN | |
US20150037242A1 (en) | If7-derived iodine fluoride compound recovery method and recovery device | |
JP4033591B2 (en) | SF6 gas recovery device | |
TW201808423A (en) | Gas recovery and purification method achieving the purpose of gas recovery and purification by producing purified gases from a mixed gas | |
JP6133877B2 (en) | B2F4 manufacturing process | |
JP2008094630A (en) | Hydrofluoric acid production apparatus and hydrofluoric acid production method | |
JP4653023B2 (en) | Ozone concentrator | |
KR101888550B1 (en) | Apparatus for manufacturing high purity neon | |
US6516619B2 (en) | Method of storing a gas | |
TWI618568B (en) | Gas recovery and purification process | |
JPH11262782A (en) | Highly concentrated ozone water making apparatus | |
TWI602610B (en) | Gas recovery and purification device | |
US10632436B2 (en) | Hydrogen, lithium, and lithium hydride production | |
TWM524220U (en) | Gas recovery purification device | |
FR3044071A1 (en) | METHOD AND SYSTEM FOR STORING A LIQUEFIED GASEOUS MIXTURE, IN PARTICULAR LIQUEFIED AIR | |
JP3609619B2 (en) | Fluorine supply system, fluorine supply device and gas recycling system | |
JP2002013696A (en) | Method for solidifying and refining carbon dioxide and method of filling pressure vessel with carbon dioxide gas | |
EP2872298B1 (en) | Method and apparatus for cooling a flow containing at least 35% carbon dioxide and mercury | |
JP5453845B2 (en) | Vessel for storing liquid ozone | |
WO2023135312A1 (en) | Evaporation pump | |
JP2010051850A (en) | Apparatus for producing film, and method of producing film using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |