TW201802144A - Polyimide precursor, polyimide, polyimide film and substrate, and tetracarboxylic dianhydride used in manufacture of polyimide - Google Patents
Polyimide precursor, polyimide, polyimide film and substrate, and tetracarboxylic dianhydride used in manufacture of polyimide Download PDFInfo
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- TW201802144A TW201802144A TW106117913A TW106117913A TW201802144A TW 201802144 A TW201802144 A TW 201802144A TW 106117913 A TW106117913 A TW 106117913A TW 106117913 A TW106117913 A TW 106117913A TW 201802144 A TW201802144 A TW 201802144A
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- following chemical
- polyimide
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 215
- 239000004642 Polyimide Substances 0.000 title claims abstract description 154
- 239000002243 precursor Substances 0.000 title claims abstract description 140
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 title claims description 61
- 239000000758 substrate Substances 0.000 title claims description 57
- 125000006158 tetracarboxylic acid group Chemical group 0.000 title claims description 54
- 238000004519 manufacturing process Methods 0.000 title claims description 30
- 239000000126 substance Substances 0.000 claims description 344
- 238000006243 chemical reaction Methods 0.000 claims description 261
- -1 olefin compound Chemical class 0.000 claims description 150
- 229920002098 polyfluorene Polymers 0.000 claims description 79
- 239000003960 organic solvent Substances 0.000 claims description 64
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 60
- 150000001875 compounds Chemical class 0.000 claims description 57
- 150000003949 imides Chemical class 0.000 claims description 55
- 125000003118 aryl group Chemical group 0.000 claims description 48
- 125000000217 alkyl group Chemical group 0.000 claims description 39
- 125000004432 carbon atom Chemical group C* 0.000 claims description 39
- 239000003054 catalyst Substances 0.000 claims description 34
- 229910052763 palladium Inorganic materials 0.000 claims description 31
- 239000002253 acid Substances 0.000 claims description 28
- 239000003795 chemical substances by application Substances 0.000 claims description 23
- 239000005749 Copper compound Substances 0.000 claims description 21
- 150000008064 anhydrides Chemical class 0.000 claims description 21
- 150000001880 copper compounds Chemical class 0.000 claims description 21
- 239000003377 acid catalyst Substances 0.000 claims description 18
- 239000002966 varnish Substances 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 14
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 13
- 239000012528 membrane Substances 0.000 claims description 13
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 12
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 12
- 125000002723 alicyclic group Chemical group 0.000 claims description 11
- 150000001412 amines Chemical class 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 125000001931 aliphatic group Chemical group 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 9
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 9
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- XDLNRRRJZOJTRW-UHFFFAOYSA-N thiohypochlorous acid Chemical compound ClS XDLNRRRJZOJTRW-UHFFFAOYSA-N 0.000 claims description 6
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 5
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 abstract description 83
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 126
- 150000004985 diamines Chemical class 0.000 description 116
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 96
- 239000002904 solvent Substances 0.000 description 91
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 88
- 239000000243 solution Substances 0.000 description 84
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 81
- 239000007787 solid Substances 0.000 description 78
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 70
- 239000010408 film Substances 0.000 description 60
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 59
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 57
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 54
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 53
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 51
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 49
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 48
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 48
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 46
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 45
- 229910052757 nitrogen Inorganic materials 0.000 description 45
- 238000003756 stirring Methods 0.000 description 43
- 238000005160 1H NMR spectroscopy Methods 0.000 description 42
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 39
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 38
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 38
- 239000002585 base Substances 0.000 description 35
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 34
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 32
- 150000002466 imines Chemical class 0.000 description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 30
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 30
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 30
- 239000000203 mixture Substances 0.000 description 28
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 27
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 27
- 239000011521 glass Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 26
- 150000001298 alcohols Chemical class 0.000 description 25
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 25
- 230000000704 physical effect Effects 0.000 description 25
- 239000005340 laminated glass Substances 0.000 description 24
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 24
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 23
- 238000000262 chemical ionisation mass spectrometry Methods 0.000 description 23
- 150000001409 amidines Chemical class 0.000 description 22
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 21
- 150000002170 ethers Chemical class 0.000 description 21
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 20
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 20
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 20
- 150000008282 halocarbons Chemical class 0.000 description 19
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 19
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 18
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 18
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 18
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 18
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 18
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 18
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 18
- 239000008096 xylene Substances 0.000 description 18
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 17
- 238000013019 agitation Methods 0.000 description 17
- 238000004458 analytical method Methods 0.000 description 17
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 17
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 16
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 16
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 16
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 16
- 150000001335 aliphatic alkanes Chemical class 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- 150000002825 nitriles Chemical class 0.000 description 16
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 16
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 15
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 15
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 15
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- 235000019253 formic acid Nutrition 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 15
- 239000000178 monomer Substances 0.000 description 15
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 15
- 150000003460 sulfonic acids Chemical class 0.000 description 15
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 14
- 235000013877 carbamide Nutrition 0.000 description 14
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 238000002156 mixing Methods 0.000 description 13
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 150000003672 ureas Chemical class 0.000 description 13
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000000706 filtrate Substances 0.000 description 12
- 239000012299 nitrogen atmosphere Substances 0.000 description 12
- 239000004810 polytetrafluoroethylene Substances 0.000 description 12
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 12
- 239000000725 suspension Substances 0.000 description 12
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 11
- CRXBTDWNHVBEIC-UHFFFAOYSA-N 1,2-dimethyl-9h-fluorene Chemical compound C1=CC=C2CC3=C(C)C(C)=CC=C3C2=C1 CRXBTDWNHVBEIC-UHFFFAOYSA-N 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 11
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 10
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 10
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 10
- ZPQOPVIELGIULI-UHFFFAOYSA-N 1,3-dichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1 ZPQOPVIELGIULI-UHFFFAOYSA-N 0.000 description 9
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 9
- 241000006479 Cyme Species 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 150000001733 carboxylic acid esters Chemical class 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 9
- 150000002576 ketones Chemical class 0.000 description 9
- 150000007522 mineralic acids Chemical class 0.000 description 9
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 9
- 229940090181 propyl acetate Drugs 0.000 description 9
- 238000001953 recrystallisation Methods 0.000 description 9
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 9
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 8
- BMAJJGIETZBWTI-UHFFFAOYSA-N C1C23C1(C1C(C=C2)O1)O3 Chemical compound C1C23C1(C1C(C=C2)O1)O3 BMAJJGIETZBWTI-UHFFFAOYSA-N 0.000 description 8
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- 230000015572 biosynthetic process Effects 0.000 description 8
- VHILMKFSCRWWIJ-UHFFFAOYSA-N dimethyl acetylenedicarboxylate Chemical compound COC(=O)C#CC(=O)OC VHILMKFSCRWWIJ-UHFFFAOYSA-N 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- 238000004817 gas chromatography Methods 0.000 description 8
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- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 8
- 239000007800 oxidant agent Substances 0.000 description 8
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 8
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- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 8
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 7
- XGXQZMDBRWCHOK-UHFFFAOYSA-N 2-dimethylarsanylsulfanylethanol Chemical compound C[As](C)SCCO XGXQZMDBRWCHOK-UHFFFAOYSA-N 0.000 description 7
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 7
- 235000011054 acetic acid Nutrition 0.000 description 7
- 229910052783 alkali metal Inorganic materials 0.000 description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 7
- 229910052794 bromium Inorganic materials 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 235000019260 propionic acid Nutrition 0.000 description 7
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 7
- 150000003512 tertiary amines Chemical class 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 7
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 6
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- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- ZPAKUZKMGJJMAA-UHFFFAOYSA-N Cyclohexane-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)CC1C(O)=O ZPAKUZKMGJJMAA-UHFFFAOYSA-N 0.000 description 1
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 1
- 241000065675 Cyclops Species 0.000 description 1
- 102000053602 DNA Human genes 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical group CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- QZRGKCOWNLSUDK-UHFFFAOYSA-N Iodochlorine Chemical compound ICl QZRGKCOWNLSUDK-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- PMDCZENCAXMSOU-UHFFFAOYSA-N N-ethylacetamide Chemical compound CCNC(C)=O PMDCZENCAXMSOU-UHFFFAOYSA-N 0.000 description 1
- QLQXIRYQVQHAIW-UHFFFAOYSA-N NC1=CC=CC=C1.NC1(C=CC(C=C1)=C1C=CC(N)(C=C1)N)N Chemical compound NC1=CC=CC=C1.NC1(C=CC(C=C1)=C1C=CC(N)(C=C1)N)N QLQXIRYQVQHAIW-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- NAGRYAJLVZELEP-UHFFFAOYSA-N O.O.C(=O)(O)C=1C=C(C=CC1C(=O)O)C=1C=C2C=CC3=CC(=CC4=CC=C(C1)C2=C43)C4=CC(=C(C=C4)C(=O)O)C(=O)O Chemical compound O.O.C(=O)(O)C=1C=C(C=CC1C(=O)O)C=1C=C2C=CC3=CC(=CC4=CC=C(C1)C2=C43)C4=CC(=C(C=C4)C(=O)O)C(=O)O NAGRYAJLVZELEP-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- VRJOXEQHIHTHOS-UHFFFAOYSA-N S.[Cl+] Chemical compound S.[Cl+] VRJOXEQHIHTHOS-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- FPXWISWMBLVKOD-UHFFFAOYSA-N [4-(4-aminobenzoyl)oxyphenyl] 4-aminobenzoate Chemical compound C1=CC(N)=CC=C1C(=O)OC(C=C1)=CC=C1OC(=O)C1=CC=C(N)C=C1 FPXWISWMBLVKOD-UHFFFAOYSA-N 0.000 description 1
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- RAOSIAYCXKBGFE-UHFFFAOYSA-K [Cu+3].[O-]P([O-])([O-])=O Chemical compound [Cu+3].[O-]P([O-])([O-])=O RAOSIAYCXKBGFE-UHFFFAOYSA-K 0.000 description 1
- WXOQGOXTUJOXCA-UHFFFAOYSA-N [I].[Cu] Chemical compound [I].[Cu] WXOQGOXTUJOXCA-UHFFFAOYSA-N 0.000 description 1
- GPWHDDKQSYOYBF-UHFFFAOYSA-N ac1l2u0q Chemical class Br[Br-]Br GPWHDDKQSYOYBF-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- MRSWDOKCESOYBI-UHFFFAOYSA-N anthracene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C=C(C(C(=O)O)=C3)C(O)=O)C3=CC2=C1 MRSWDOKCESOYBI-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- CJYIPJMCGHGFNN-UHFFFAOYSA-N bicyclo[2.2.1]heptane-2,3,5,6-tetracarboxylic acid Chemical compound C1C2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O CJYIPJMCGHGFNN-UHFFFAOYSA-N 0.000 description 1
- XQBSPQLKNWMPMG-UHFFFAOYSA-N bicyclo[2.2.2]octane-2,3,5,6-tetracarboxylic acid Chemical compound C1CC2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O XQBSPQLKNWMPMG-UHFFFAOYSA-N 0.000 description 1
- IFPMQFXJDRAHOQ-UHFFFAOYSA-N bicyclo[4.1.0]hepta-1(6),2-diene-4,5-dione Chemical compound O=C1C(=O)C=CC2=C1C2 IFPMQFXJDRAHOQ-UHFFFAOYSA-N 0.000 description 1
- CFTXGNJIXHFHTH-UHFFFAOYSA-N bis(4-aminophenyl) benzene-1,4-dicarboxylate Chemical compound C1=CC(N)=CC=C1OC(=O)C1=CC=C(C(=O)OC=2C=CC(N)=CC=2)C=C1 CFTXGNJIXHFHTH-UHFFFAOYSA-N 0.000 description 1
- CODNYICXDISAEA-UHFFFAOYSA-N bromine monochloride Chemical compound BrCl CODNYICXDISAEA-UHFFFAOYSA-N 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- SBTSVTLGWRLWOD-UHFFFAOYSA-L copper(ii) triflate Chemical compound [Cu+2].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F SBTSVTLGWRLWOD-UHFFFAOYSA-L 0.000 description 1
- JIDMEYQIXXJQCC-UHFFFAOYSA-L copper;2,2,2-trifluoroacetate Chemical compound [Cu+2].[O-]C(=O)C(F)(F)F.[O-]C(=O)C(F)(F)F JIDMEYQIXXJQCC-UHFFFAOYSA-L 0.000 description 1
- ITFUHOHJQIDNQW-UHFFFAOYSA-L copper;2,2-dimethylpropanoate Chemical compound [Cu+2].CC(C)(C)C([O-])=O.CC(C)(C)C([O-])=O ITFUHOHJQIDNQW-UHFFFAOYSA-L 0.000 description 1
- DYROSKSLMAPFBZ-UHFFFAOYSA-L copper;2-hydroxypropanoate Chemical compound [Cu+2].CC(O)C([O-])=O.CC(O)C([O-])=O DYROSKSLMAPFBZ-UHFFFAOYSA-L 0.000 description 1
- KOKFUFYHQQCNNJ-UHFFFAOYSA-L copper;2-methylpropanoate Chemical compound [Cu+2].CC(C)C([O-])=O.CC(C)C([O-])=O KOKFUFYHQQCNNJ-UHFFFAOYSA-L 0.000 description 1
- MRYMYQPDGZIGDM-UHFFFAOYSA-L copper;4-methylbenzenesulfonate Chemical compound [Cu+2].CC1=CC=C(S([O-])(=O)=O)C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 MRYMYQPDGZIGDM-UHFFFAOYSA-L 0.000 description 1
- XNEQAVYOCNWYNZ-UHFFFAOYSA-L copper;dinitrite Chemical compound [Cu+2].[O-]N=O.[O-]N=O XNEQAVYOCNWYNZ-UHFFFAOYSA-L 0.000 description 1
- LZJJVTQGPPWQFS-UHFFFAOYSA-L copper;propanoate Chemical compound [Cu+2].CCC([O-])=O.CCC([O-])=O LZJJVTQGPPWQFS-UHFFFAOYSA-L 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 description 1
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- KUFXJZXMWHNCEH-UHFFFAOYSA-N cyperone Natural products C1CC(=O)C(C)=C2CC(C(=C)C)CCC21C KUFXJZXMWHNCEH-UHFFFAOYSA-N 0.000 description 1
- HRYUOPWKEXOLLL-UHFFFAOYSA-N dec-3-ene-1,2,7,8-tetracarboxylic acid Chemical compound CCC(C(O)=O)C(C(O)=O)CCC=CC(C(O)=O)CC(O)=O HRYUOPWKEXOLLL-UHFFFAOYSA-N 0.000 description 1
- GUIAWEJKSYXUFP-UHFFFAOYSA-N decane-2,3,6,7-tetracarboxylic acid Chemical compound CCC(C(CCC(C(CC)C(=O)O)C(=O)O)C(=O)O)C(=O)O GUIAWEJKSYXUFP-UHFFFAOYSA-N 0.000 description 1
- 238000006298 dechlorination reaction Methods 0.000 description 1
- STRNXFOUBFLVIN-UHFFFAOYSA-N diethyl but-2-ynedioate Chemical compound CCOC(=O)C#CC(=O)OCC STRNXFOUBFLVIN-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- SLMNTWPOOQWWIU-UHFFFAOYSA-N diphenyl but-2-ynedioate Chemical compound C=1C=CC=CC=1OC(=O)C#CC(=O)OC1=CC=CC=C1 SLMNTWPOOQWWIU-UHFFFAOYSA-N 0.000 description 1
- OPTPSVGIMYCMQJ-UHFFFAOYSA-N dipropyl but-2-ynedioate Chemical compound CCCOC(=O)C#CC(=O)OCCC OPTPSVGIMYCMQJ-UHFFFAOYSA-N 0.000 description 1
- 210000005069 ears Anatomy 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- FRYHCSODNHYDPU-UHFFFAOYSA-N ethanesulfonyl chloride Chemical compound CCS(Cl)(=O)=O FRYHCSODNHYDPU-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- OMRRUNXAWXNVFW-UHFFFAOYSA-N fluoridochlorine Chemical compound ClF OMRRUNXAWXNVFW-UHFFFAOYSA-N 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N formamide Substances NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- CBEQRNSPHCCXSH-UHFFFAOYSA-N iodine monobromide Chemical compound IBr CBEQRNSPHCCXSH-UHFFFAOYSA-N 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- PVFSDGKDKFSOTB-UHFFFAOYSA-K iron(3+);triacetate Chemical compound [Fe+3].CC([O-])=O.CC([O-])=O.CC([O-])=O PVFSDGKDKFSOTB-UHFFFAOYSA-K 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical compound C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 1
- MBABOKRGFJTBAE-UHFFFAOYSA-N methyl methanesulfonate Chemical compound COS(C)(=O)=O MBABOKRGFJTBAE-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- CQDGTJPVBWZJAZ-UHFFFAOYSA-N monoethyl carbonate Chemical compound CCOC(O)=O CQDGTJPVBWZJAZ-UHFFFAOYSA-N 0.000 description 1
- URAVRPANNFWXAZ-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine;pyridine Chemical class C1=CC=NC=C1.CN(C)C1=CC=CC=N1 URAVRPANNFWXAZ-UHFFFAOYSA-N 0.000 description 1
- SICIPBMLFSQZEQ-UHFFFAOYSA-N n-(2-oxopropyl)acetamide Chemical compound CC(=O)CNC(C)=O SICIPBMLFSQZEQ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- AEYWPRODWLOEFK-UHFFFAOYSA-N n-methylmethanamine;pyridine Chemical class CNC.C1=CC=NC=C1 AEYWPRODWLOEFK-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- DZIPTMXRULMTJR-UHFFFAOYSA-N oct-3-ene-1,2,6,7-tetracarboxylic acid Chemical compound CC(C(CC=CC(CC(=O)O)C(=O)O)C(=O)O)C(=O)O DZIPTMXRULMTJR-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- PZKNFJIOIKQCPA-UHFFFAOYSA-N oxalic acid palladium Chemical compound [Pd].OC(=O)C(O)=O PZKNFJIOIKQCPA-UHFFFAOYSA-N 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- CUQOHAYJWVTKDE-UHFFFAOYSA-N potassium;butan-1-olate Chemical compound [K+].CCCC[O-] CUQOHAYJWVTKDE-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005694 sulfonylation reaction Methods 0.000 description 1
- QZAVDLZLHCMERY-UHFFFAOYSA-N tetramethyl naphthalene-2,3,6,7-tetracarboxylate Chemical compound COC(=O)C1=C(C(=O)OC)C=C2C=C(C(=O)OC)C(C(=O)OC)=CC2=C1 QZAVDLZLHCMERY-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- FXOJASSPEGUXFT-UHFFFAOYSA-N tribromo-$l^{3}-iodane Chemical compound BrI(Br)Br FXOJASSPEGUXFT-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- GRGCWBWNLSTIEN-UHFFFAOYSA-N trifluoromethanesulfonyl chloride Chemical compound FC(F)(F)S(Cl)(=O)=O GRGCWBWNLSTIEN-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/74—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
- C07C69/753—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
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Abstract
Description
本發明係關於具有透明性、彎折耐性、高耐熱性、低線熱膨脹係數等優良的特性之聚醯亞胺、及其前驅體、及在製造它們時使用之四羧酸二酐。The present invention relates to a polyimide having excellent characteristics such as transparency, bending resistance, high heat resistance, and low linear thermal expansion coefficient, a precursor thereof, and a tetracarboxylic dianhydride used in the production thereof.
近年,伴隨高度資訊化社會之到來,光通訊領域之光纖、光導波路等顯示裝置領域之液晶配向膜、彩色濾光片用保護膜等光學材料的開發正進展中。尤其在顯示裝置領域,替代玻璃基板之輕質且可撓性優異之塑膠基板探討、可彎曲或可圓化之顯示器之開發正積極進行中。所以,需要可使用在如此的用途的性能更高之光學材料。In recent years, with the advent of a highly information-oriented society, the development of optical materials such as liquid crystal alignment films and protective films for color filters in the fields of display devices such as optical fibers and optical waveguides is progressing. Especially in the field of display devices, the development of lightweight and flexible plastic substrates that replace glass substrates, and the development of bendable or roundable displays are actively underway. Therefore, there is a need for optical materials with higher performance that can be used in such applications.
芳香族聚醯亞胺,由於形成分子內共軛或電荷移動錯合物而固有地著色為黃褐色。為了抑制著色之方法,有人提出例如對於分子內導入氟原子、對於主鏈賦予彎曲性、導入體積大的基團作為側鏈等以妨礙分子內共軛或電荷移動錯合物形成並且使其展現透明性之方法。Aromatic polyfluorene imine is inherently colored yellow-brown due to the formation of intramolecular conjugates or charge transfer complexes. In order to suppress the coloring method, it has been proposed to introduce a fluorine atom into a molecule, impart flexibility to a main chain, introduce a bulky group as a side chain, and the like to hinder the formation and display of a conjugate or a charge transfer complex in the molecule. Method of transparency.
又,也有人提出使用理論上不形成電荷移動錯合物的半脂環族或全脂環族聚醯亞胺以使其展現透明性之方法。尤其使用芳香族四羧酸二酐作為四羧酸成分、脂環族二胺作為二胺成分之高透明性之半脂環族聚醯亞胺、及使用脂環族四羧酸二酐作為四羧酸成分、芳香族二胺作為二胺成分之高透明性之半脂環族聚醯亞胺已有許多提案。In addition, a method has also been proposed in which a semialicyclic or fully cycloaliphatic polyfluorene imine that does not form a charge transfer complex is theoretically made to exhibit transparency. In particular, an aromatic tetracarboxylic dianhydride is used as a tetracarboxylic acid component, an alicyclic diamine is used as a diamine component and the highly transparent semi-alicyclic polyfluorene imine, and the alicyclic tetracarboxylic dianhydride is used as a tetracarboxylic acid. Numerous proposals have been made for a highly transparent semialicyclic polyfluorene imine having a carboxylic acid component and an aromatic diamine as the diamine component.
例如:專利文獻1揭示由在化學結構中具至少1個脂肪族6員環且不具芳香族環之脂環族四羧酸成分與在化學結構中具有至少1個醯胺鍵與芳香族環之芳香族二胺成分獲得之半脂環族聚醯亞胺前驅體、及聚醯亞胺。具體而言,專利文獻1之實施例中,就脂環族四羧酸成分而言,使用雙環[2.2.2]辛烷-2,3,5,6-四羧酸二酐、十氫-1,4:5,8-二甲橋萘-2,3,6,7-四羧酸二酐等,就具有醯胺鍵與芳香族環之芳香族二胺成分而言,使用4,4’-二胺基苯醯替苯胺等。又,專利文獻1之實施例中,就其他二胺成分而言,使用對苯二胺、2,2’-雙(三氟甲基)聯苯胺、4,4’-氧基二苯胺等。For example, Patent Document 1 discloses that an alicyclic tetracarboxylic acid component having at least one aliphatic 6-membered ring in the chemical structure and no aromatic ring and a chemical structure having at least one amide bond and an aromatic ring in the chemical structure A semialicyclic polyfluorene imide precursor obtained from an aromatic diamine component, and a polyfluorene. Specifically, in the example of Patent Document 1, as for the alicyclic tetracarboxylic acid component, bicyclic [2.2.2] octane-2,3,5,6-tetracarboxylic dianhydride, decahydro- 1,4: 5,8-Dimethynaphthalene-2,3,6,7-tetracarboxylic dianhydride, etc. As the aromatic diamine component having a fluorene bond and an aromatic ring, 4,4 is used '-Diaminobenzimetidine and the like. In the example of Patent Document 1, as other diamine components, p-phenylenediamine, 2,2'-bis (trifluoromethyl) benzidine, 4,4'-oxydiphenylamine, and the like are used.
又,專利文獻2揭示特徵為使特定之脂環族四羧酸二酐與二胺於作為觸媒之無機鹽類存在下反應之聚醯胺酸之製造方法。並且,於專利文獻2之實施例8,係於作為觸媒之氯化鈣存在下使脂環族四羧酸二酐六環[6.6.1.13,6 .110 , 13 .02,7 .09 , 14 ]十七烷基-4,5,11,13-四羧酸二酐與4,4’-二胺基二苯醚反應而合成聚醯胺酸並醯亞胺化,獲得聚醯亞胺。但是在專利文獻2之比較例5,係不添加係觸媒之氯化鈣而使六環[6.6.1.13,6 .110 , 13 .02,7 .09 , 14 ]十七烷基-4,5,11,13-四羧酸二酐與4,4’-二胺基二苯醚反應而合成聚醯胺酸,進行醯亞胺化而獲得之聚醯亞胺,獲得之聚醯亞胺的ηinh 低,無法成膜化。In addition, Patent Document 2 discloses a method for producing a polyamic acid characterized by reacting a specific alicyclic tetracarboxylic dianhydride and a diamine in the presence of an inorganic salt as a catalyst. In addition, in Example 8 of Patent Document 2, the alicyclic tetracarboxylic dianhydride hexacyclic ring was made in the presence of calcium chloride as a catalyst [6.6.1.1 3,6 .1 10 , 13 .0 2,7 .0 9 , 14 ] Heptadecanyl-4,5,11,13-tetracarboxylic dianhydride is reacted with 4,4'-diaminodiphenyl ether to synthesize polyimide and then imidize to obtain Polyimide. However, in Patent Document Comparative Example 52, the catalyst system without the addition of the calcium-based hexacyclo [6.6.1.1 3,6 .1 10, 13 .0 2,7 .0 9, 14] heptadecane -4,5,11,13-tetracarboxylic dianhydride is reacted with 4,4'-diaminodiphenyl ether to synthesize polyfluorinated acid, and polyimide obtained by fluorimidization is obtained. Polyimide has a low η inh and cannot be formed into a film.
針對半脂環族聚醯亞胺,非專利文獻1揭示由三環癸烯四羧酸二酐(苯與馬來酸酐之加成產物)與二胺基二苯醚獲得之可溶性脂環族聚醯亞胺中之緩和轉移與強度特性之交互關係。 [先前技術文獻] [專利文獻]For semi-alicyclic polyimide, Non-Patent Document 1 discloses a soluble alicyclic polyamine obtained from tricyclodecene tetracarboxylic dianhydride (the addition product of benzene and maleic anhydride) and diaminodiphenyl ether. Reciprocal relationship between mitigation transfer and strength properties in sulfonium imine. [Prior Art Literature] [Patent Literature]
[專利文獻1] 國際公開第2012/124664號 [專利文獻2] 日本特開平5-271409號公報 [非專利文獻][Patent Document 1] International Publication No. 2012/124664 [Patent Document 2] Japanese Patent Laid-Open No. 5-271409 [Non-Patent Document]
[非專利文獻1] Izvestiya Akademii Nauk Kazakhskoi SSR, Seriya Khimicheskaya, 1987, No.5, p.40[Non-Patent Document 1] Izvestiya Akademii Nauk Kazakhskoi SSR, Seriya Khimicheskaya, 1987, No. 5, p. 40
[發明欲解決之課題] 本發明之目的為提供有透明性、彎折耐性、高耐熱性、低線熱膨脹係數等優良的特性之新穎之聚醯亞胺、及其前驅體。又,本發明之目的係提供使用在製造聚醯亞胺之新穎之四羧酸二酐、及其製造方法。 [解決課題之方式][Problems to be Solved by the Invention] An object of the present invention is to provide novel polyimide and its precursor having excellent characteristics such as transparency, bending resistance, high heat resistance, and low linear thermal expansion coefficient. Another object of the present invention is to provide a novel tetracarboxylic dianhydride used in the production of polyimide, and a method for producing the same. [Solution to the problem]
本發明係關於以下各項。 1. 一種聚醯亞胺前驅體,其特徵為:包括下列化學式(1-1)表示之重複單元中之至少1種,化學式(1-1)表示之重複單元之合計含量相對於全部重複單元為50莫耳%以上;The present invention relates to the following items. 1. A polyimide precursor comprising at least one of the repeating units represented by the following chemical formula (1-1), and the total content of repeating units represented by the chemical formula (1-1) relative to all repeating units 50 mol% or more;
[化1]式中,A11 係下列化學式(A-1)表示之4價基、或下列化學式(A-2)表示之4價基,B11 係下列化學式(B-1)表示之2價基、或下列化學式(B-2)表示之2價基,X1 、X2 各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基;[Chemical 1] In the formula, A 11 is a tetravalent group represented by the following chemical formula (A-1) or a tetravalent group represented by the following chemical formula (A-2), and B 11 is a divalent group represented by the following chemical formula (B-1), or A divalent group represented by the following chemical formula (B-2), X 1 and X 2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkyl silyl group having 3 to 9 carbon atoms;
[化2]式中,R1 、R2 、R3 各自獨立地為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 2] In the formula, R 1 , R 2 , and R 3 are each independently -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化3]式中,R4 為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 3] In the formula, R 4 is -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化4]式中,n1 表示0~3之整數、n2 表示0~3之整數;Y1 、Y2 、Y3 各自獨立地表示選自於由氫原子、甲基、三氟甲基構成之群組中之1種,Q1 、Q2 各自獨立地表示選自於由直接鍵結、或式:-NHCO-、-CONH-、-COO-、-OCO-表示之基構成之群組中之1種;[Chemical 4] In the formula, n 1 represents an integer of 0 to 3, and n 2 represents an integer of 0 to 3; Y 1 , Y 2 , and Y 3 each independently represent a member selected from the group consisting of a hydrogen atom, a methyl group, and a trifluoromethyl group. One of the groups, Q 1 and Q 2 each independently represent a member selected from the group consisting of a group represented by a direct bond, or a formula: -NHCO-, -CONH-, -COO-, -OCO- 1 species
[化5]式中,Y4 表示氫原子、或碳數1~4之烷基。[Chemical 5] In the formula, Y 4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
2. 一種聚醯亞胺前驅體,其特徵為:包括下列化學式(1-2)表示之重複單元中之至少1種;2. A polyimide precursor, comprising: at least one of the repeating units represented by the following chemical formula (1-2);
[化6]式中,A12 為下列化學式(A-3)表示之4價基、或下列化學式(A-4)表示之4價基,B12 為具有芳香族環或脂環結構之2價基,X3 、X4 各自獨立地為氫、碳數1~6之烷基、或碳數3~9之烷基矽基;[Chemical 6] In the formula, A 12 is a tetravalent group represented by the following chemical formula (A-3) or a tetravalent group represented by the following chemical formula (A-4), B 12 is a divalent group having an aromatic ring or an alicyclic structure, and X 3 , X 4 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkyl silyl group having 3 to 9 carbon atoms;
[化7]式中,R5 、R6 各自獨立地為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 7] In the formula, R 5 and R 6 are each independently -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化8]式中,R7 為-CH2 CH2 -、或-CH=CH-。 3. 如2.之聚醯亞胺前驅體,其中,該化學式(1-2)表示之重複單元之合計含量相對於全部重複單元為50莫耳%以上。[Chemical 8] In the formula, R 7 is -CH 2 CH 2- , or -CH = CH-. 3. The polyfluorene imide precursor according to 2., wherein the total content of the repeating units represented by the chemical formula (1-2) is 50 mol% or more relative to the total repeating units.
4. 一種聚醯亞胺,其特徵為包括下列化學式(2-1)表示之重複單元中之至少1種,化學式(2-1)表示之重複單元之合計含量相對於全部重複單元為50莫耳%以上;4. A polyimide, characterized in that it comprises at least one of the repeating units represented by the following chemical formula (2-1), and the total content of the repeating units represented by the chemical formula (2-1) is 50 moles relative to all the repeating units. Ears above
[化9]式中,A21 為下列化學式(A-1)表示之4價基、或下列化學式(A-2)表示之4價基,B21 為下列化學式(B-1)表示之2價基、或下列化學式(B-2)表示之2價基;[Chemical 9] In the formula, A 21 is a tetravalent group represented by the following chemical formula (A-1) or a tetravalent group represented by the following chemical formula (A-2), and B 21 is a divalent group represented by the following chemical formula (B-1), or Divalent group represented by the following chemical formula (B-2);
[化10]式中,R1 、R2 、R3 各自獨立地為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 10] In the formula, R 1 , R 2 , and R 3 are each independently -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化11]式中,R4 為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 11] In the formula, R 4 is -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化12]式中,n1 表示0~3之整數,n2 表示0~3之整數;Y1 、Y2 、Y3 各自獨立地表示選自於由氫原子、甲基、三氟甲基構成之群組中之1種,Q1 、Q2 各自獨立地表示選自於由直接鍵結、或式:-NHCO-、-CONH-、-COO-、-OCO-表示之基構成之群組中之1種;[Chemical 12] In the formula, n 1 represents an integer of 0 to 3, and n 2 represents an integer of 0 to 3; Y 1 , Y 2 , and Y 3 each independently represent a member selected from the group consisting of a hydrogen atom, a methyl group, and a trifluoromethyl group. One of the groups, Q 1 and Q 2 each independently represent a member selected from the group consisting of a group represented by a direct bond, or a formula: -NHCO-, -CONH-, -COO-, -OCO- 1 species
[化13]式中,Y4 表示氫原子、或碳數1~4之烷基。[Chemical 13] In the formula, Y 4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
5. 一種聚醯亞胺,其特徵為:包括下列化學式(2-2)表示之重複單元中之至少1種;5. A polyimide, characterized in that it comprises at least one of the repeating units represented by the following chemical formula (2-2);
[化14]式中,A22 為下列化學式(A-3)表示之4價基、或下列化學式(A-4)表示之4價基,B22 為具有芳香族環或脂環結構之2價基;[Chemical 14] In the formula, A 22 is a tetravalent group represented by the following chemical formula (A-3) or a tetravalent group represented by the following chemical formula (A-4), and B 22 is a divalent group having an aromatic ring or an alicyclic structure;
[化15]式中,R5 、R6 各自獨立地為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 15] In the formula, R 5 and R 6 are each independently -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化16]式中,R7 為-CH2 CH2 -、或-CH=CH-。 6. 如5.之聚醯亞胺,其中,該化學式(2-2)表示之重複單元之合計含量相對於全部重複單元為50莫耳%以上。[Chemical 16] In the formula, R 7 is -CH 2 CH 2- , or -CH = CH-. 6. The polyfluorene imide of 5., wherein the total content of the repeating units represented by the chemical formula (2-2) is 50 mol% or more relative to all the repeating units.
7. 一種聚醯亞胺,係由如1.至3.中任一項之聚醯亞胺前驅體獲得。 8. 一種膜,係由如1.至3.中任一項之聚醯亞胺前驅體獲得之聚醯亞胺、或如4.至6.中任一項之聚醯亞胺為主而成。 9. 一種清漆,包括如1.至3.中任一項之聚醯亞胺前驅體、或如4.至6.中任一項之聚醯亞胺。 10. 一種聚醯亞胺膜,係使用含有如1.至3.中任一項之聚醯亞胺前驅體、或如4.至6.中任一項之聚醯亞胺之清漆獲得。 11. 一種顯示器用、觸控面板用、或太陽能電池用之基板,其特徵為:含有由如1.至3.中任一項之聚醯亞胺前驅體獲得之聚醯亞胺、或如4.至6.中任一項之聚醯亞胺。7. A polyimide, obtained from a polyimide precursor according to any one of 1. to 3. 8. A film comprising a polyimide obtained from a polyimide precursor according to any one of 1. to 3. or a polyimide according to any one of 4. to 6. to make. 9. A varnish comprising a polyimide precursor according to any one of 1. to 3. or a polyimide according to any one of 4. to 6. 10. A polyimide film obtained by using a polyimide precursor according to any one of 1. to 3. or a polyimide varnish according to any one of 4. to 6. 11. A substrate for a display, a touch panel, or a solar cell, comprising: a polyimide obtained from a polyimide precursor according to any one of 1. to 3. Polyimide of any one of 4. to 6.
12. 一種下列化學式(M-1)表示之四羧酸二酐;12. A tetracarboxylic dianhydride represented by the following chemical formula (M-1);
[化17]式中,R5 ’、R6 ’各自獨立地為-CH2 -、或-CH2 CH2 -。 13. 一種下列化學式(M-2)表示之四酯化合物;[Chemical 17] In the formula, R 5 ′ and R 6 ′ are each independently —CH 2 — or —CH 2 CH 2 —. 13. A tetraester compound represented by the following chemical formula (M-2);
[化18]式中,R5 ’、R6 ’各自獨立地為-CH2 -、或-CH2 CH2 -,R11 、R12 、R13 、R14 各自獨立地為碳數1~10之烷基。 14. 一種下列化學式(M-3)表示之四酯化合物;[Chemical 18] In the formula, R 5 ′ and R 6 ′ are each independently —CH 2 — or —CH 2 CH 2 —, and R 11 , R 12 , R 13 , and R 14 are each independently an alkyl group having 1 to 10 carbon atoms. . 14. A tetraester compound represented by the following chemical formula (M-3);
[化19]式中,R5 ’、R6 ’各自獨立地為-CH2 -、或-CH2 CH2 -,R11 、R12 、R13 、R14 各自獨立地為碳數1~10之烷基。[Chemical 19] In the formula, R 5 ′ and R 6 ′ are each independently —CH 2 — or —CH 2 CH 2 —, and R 11 , R 12 , R 13 , and R 14 are each independently an alkyl group having 1 to 10 carbon atoms. .
15. 一種四羧酸二酐之製造方法,其特徵為包括以下步驟: (A)於鹼存在下,使下列化學式(M-A-1)表示之烯烴化合物與脂肪族磺醯氯或芳香族磺醯氯反應而獲得下列化學式(M-A-2)表示之烯烴化合物;15. A method for producing a tetracarboxylic dianhydride, comprising the following steps: (A) In the presence of a base, an olefin compound represented by the following chemical formula (MA-1) and an aliphatic sulfonium chloride or an aromatic sulfonium Chlorine reaction to obtain an olefin compound represented by the following chemical formula (MA-2);
[化20]式中,R5 ’、R6 ’各自獨立地為-CH2 -、或-CH2 CH2 -;[Chemical 20] In the formula, R 5 ′ and R 6 ′ are each independently —CH 2 — or —CH 2 CH 2 —;
[化21]式中,R5 ’、R6 ’之含意同前述,R為也可以有取代基之烷基或芳基; (B)使該化學式(M-A-2)表示之烯烴化合物於鈀觸媒與銅化合物存在下和醇化合物與一氧化碳反應,而獲得下列化學式(M-A-3)表示之四酯化合物;[Chemical 21] In the formula, R 5 ′ and R 6 ′ have the same meanings as above, and R is an alkyl group or an aryl group which may have a substituent; (B) The olefin compound represented by the chemical formula (MA-2) is used in a palladium catalyst and copper In the presence of the compound, the alcohol compound is reacted with carbon monoxide to obtain a tetraester compound represented by the following chemical formula (MA-3);
[化22]式中,R5 ’、R6 ’、R之含意同前述,R11 、R12 、R13 、R14 各自獨立地為碳數1~10之烷基; (C)從該化學式(M-A-3)表示之四酯化合物獲得下列化學式(M-3)表示之四酯化合物;[Chemical 22] In the formula, R 5 ′, R 6 ′, and R have the same meanings as above, and R 11 , R 12 , R 13 , and R 14 are each independently an alkyl group having 1 to 10 carbon atoms; (C) From the chemical formula (MA- 3) Tetraester compound represented by the following formula: The tetraester compound represented by the following chemical formula (M-3) is obtained;
[化23]式中,R5 ’、R6 ’、R11 、R12 、R13 、R14 之含意同前述; (D)由該化學式(M-3)表示之四酯化合物之氧化反應獲得下列化學式(M-2)表示之四酯化合物;[Chemical 23] In the formula, R 5 ′, R 6 ′, R 11 , R 12 , R 13 , R 14 have the same meanings as above; (D) The oxidation reaction of the tetraester compound represented by the chemical formula (M-3) gives the following chemical formula ( M-2) tetraester compound;
[化24]式中,R5 ’、R6 ’、R11 、R12 、R13 、R14 之含意同前述; (E)使該化學式(M-2)表示之四酯化合物於酸觸媒存在下於有機溶劑中反應,獲得下列化學式(M-1)表示之四羧酸二酐;[Chemical 24] In the formula, R 5 ′, R 6 ′, R 11 , R 12 , R 13 , R 14 have the same meanings as above; (E) The tetraester compound represented by the chemical formula (M-2) is present in the presence of an acid catalyst in Reaction in an organic solvent to obtain a tetracarboxylic dianhydride represented by the following chemical formula (M-1);
[化25]式中,R5 ’、R6 ’之含意同前述。[Chemical 25] In the formula, R 5 ′ and R 6 ′ have the same meanings as described above.
16. 一種下列化學式(M-4)表示之四羧酸二酐;16. A tetracarboxylic dianhydride represented by the following chemical formula (M-4);
[化26]式中,R7 為-CH2 CH2 -、或-CH=CH-。 17. 一種下列化學式(M-5)表示之四酯化合物;[Chemical 26] In the formula, R 7 is -CH 2 CH 2- , or -CH = CH-. 17. A tetraester compound represented by the following chemical formula (M-5);
[化27]式中,R7 為-CH2 CH2 -、或-CH=CH-,R21 、R22 、R23 、R24 各自獨立地為碳數1~10之烷基。 18. 一種下列化學式(M-6)表示之二鹵代二羧酸酐;[Chemical 27] In the formula, R 7 is -CH 2 CH 2- , or -CH = CH-, and R 21 , R 22 , R 23 , and R 24 are each independently an alkyl group having 1 to 10 carbon atoms. 18. A dihalodicarboxylic anhydride represented by the following chemical formula (M-6);
[化28]式中,X11 、X12 各自獨立地表示-F、-Cl、-Br、或-I中之任一者。 19. 一種下列化學式(M-7)表示之二羧酸酐;[Chemical 28] In the formula, X 11 and X 12 each independently represent any one of -F, -Cl, -Br, or -I. 19. A dicarboxylic anhydride represented by the following chemical formula (M-7);
[化29] [Chemical 29]
20. 一種四羧酸二酐之製造方法,其特徵為包括以下步驟: (A)使下列化學式(M-B)表示之二羧酸酐與1,3-丁二烯反應而獲得下列化學式(M-7)表示之二羧酸酐;20. A method for producing a tetracarboxylic dianhydride, comprising the following steps: (A) reacting a dicarboxylic anhydride represented by the following chemical formula (MB) with 1,3-butadiene to obtain the following chemical formula (M-7 ) Represented by dicarboxylic anhydride;
[化30] [Chemical 30]
[化31](B)使該化學式(M-7)表示之二羧酸酐與二鹵化劑反應,而獲得下列化學式(M-6)表示之二鹵代二羧酸酐;[Chemical 31] (B) reacting the dicarboxylic anhydride represented by the chemical formula (M-7) with a dihalogenating agent to obtain a dihalodicarboxylic anhydride represented by the following chemical formula (M-6);
[化32]式中,X11 、X12 各自獨立地表示-F、-Cl、-Br、或-I中之任一者; (C)使該化學式(M-6)表示之二鹵代二羧酸酐與馬來酸酐反應,而獲得下列化學式(M-4-1)表示之四羧酸二酐;[Chemical 32] In the formula, X 11 and X 12 each independently represent any one of -F, -Cl, -Br, or -I; (C) the dihalodicarboxylic anhydride represented by the chemical formula (M-6) and Maleic anhydride is reacted to obtain tetracarboxylic dianhydride represented by the following chemical formula (M-4-1);
[化33](D)使該化學式(M-4-1)表示之四羧酸二酐於酸存在下與醇化合物反應而獲得下列化學式(M-5-1)表示之四酯化合物;[Chemical 33] (D) reacting a tetracarboxylic dianhydride represented by the chemical formula (M-4-1) with an alcohol compound in the presence of an acid to obtain a tetraester compound represented by the following chemical formula (M-5-1);
[化34]式中,R21 、R22 、R23 、R24 各自獨立地為碳數1~10之烷基; (E)使該化學式(M-5-1)表示之四酯化合物於金屬觸媒存在下與氫反應而獲得下列化學式(M-5-2)表示之四酯化合物;[Chem 34] In the formula, R 21 , R 22 , R 23 , and R 24 are each independently an alkyl group having 1 to 10 carbon atoms; (E) The tetraester compound represented by the chemical formula (M-5-1) is present in a metal catalyst And reacting with hydrogen to obtain a tetraester compound represented by the following chemical formula (M-5-2);
[化35]式中,R21 、R22 、R23 、R24 之含意同前述; (F)使該化學式(M-5-2)表示之四酯化合物於酸觸媒存在下於有機溶劑中反應,獲得下列化學式(M-4-2)表示之四羧酸二酐;[Chemical 35] In the formula, R 21 , R 22 , R 23 , and R 24 have the same meanings as above; (F) reacting the tetraester compound represented by the chemical formula (M-5-2) in an organic solvent in the presence of an acid catalyst to obtain Tetracarboxylic dianhydride represented by the following chemical formula (M-4-2);
[化36]。[Chemical 36] .
21. 一種四羧酸二酐之製造方法,其特徵為包括以下步驟: (A)使下列化學式(M-C-1)表示之二烯化合物與下列化學式(M-C-2)表示之乙炔化合物反應而獲得下列化學式(M-C-3)表示之二酯化合物;21. A method for producing a tetracarboxylic dianhydride, comprising the following steps: (A) A diene compound represented by the following chemical formula (MC-1) is reacted with an acetylene compound represented by the following chemical formula (MC-2) to obtain A diester compound represented by the following chemical formula (MC-3);
[化37]式中,R4 為-CH2 -、-CH2 CH2 -、或-CH=CH-;[Chemical 37] In the formula, R 4 is -CH 2- , -CH 2 CH 2- , or -CH = CH-;
[化38]式中,R31 、R32 各自獨立地為碳數1~10之烷基、或苯基;[Chemical 38] In the formula, R 31 and R 32 are each independently an alkyl group having 1 to 10 carbon atoms or a phenyl group;
[化39]式中,R4 、R31 、R32 之含意同前述; (B)利用該化學式(M-C-3)表示之二酯化合物之氧化反應,獲得下列化學式(M-C-4)表示之二酯化合物;[Chemical 39] In the formula, R 4 , R 31 and R 32 have the same meanings as above; (B) The oxidation reaction of the diester compound represented by the chemical formula (MC-3) is used to obtain the diester compound represented by the following chemical formula (MC-4);
[化40]式中,R4 、R31 、R32 之含意同前述; (C)使該化學式(M-C-4)表示之二酯化合物於鈀觸媒及銅化合物存在下和醇化合物與一氧化碳反應而獲得下列化學式(M-C-5)表示之四酯化合物;[Chemical 40] In the formula, R 4 , R 31 and R 32 have the same meanings as above; (C) The diester compound represented by the chemical formula (MC-4) is reacted with an alcohol compound and carbon monoxide in the presence of a palladium catalyst and a copper compound to obtain the following Tetraester compound represented by Chemical Formula (MC-5);
[化41]式中,R4 、R31 、R32 之含意同前述,R33 、R34 各自獨立地為碳數1~10之烷基; (D)使該化學式(M-C-5)表示之四酯化合物於酸觸媒存在下於有機溶劑中反應,獲得下列化學式(M-9)表示之四羧酸二酐;[Chemical 41] In the formula, R 4 , R 31 , and R 32 have the same meanings as above, and R 33 and R 34 are each independently an alkyl group having 1 to 10 carbon atoms; (D) a tetraester compound represented by the chemical formula (MC-5) React in an organic solvent in the presence of an acid catalyst to obtain a tetracarboxylic dianhydride represented by the following chemical formula (M-9);
[化42]式中,R4 之含意同前述。 [發明之效果][Chemical 42] In the formula, R 4 has the same meaning as described above. [Effect of the invention]
依本發明可提供有透明性、彎折耐性、高耐熱性、低線熱膨脹係數等優良的特性之新穎之聚醯亞胺、及其前驅體、及製造它們時使用的新穎之四羧酸二酐、及其製造方法。According to the present invention, a novel polyimide having excellent characteristics such as transparency, bending resistance, high heat resistance, and low linear thermal expansion coefficient, a precursor thereof, and a novel tetracarboxylic acid diamine used in manufacturing them can be provided. Anhydride, and its manufacturing method.
此由本發明之聚醯亞胺前驅體獲得之聚醯亞胺、及本發明之聚醯亞胺,容易形成微細電路,適合使用在形成顯示器用途等的基板。又,由本發明之聚醯亞胺前驅體獲得之聚醯亞胺、及本發明之聚醯亞胺,適合使用在觸控面板用、太陽能電池用之基板。The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention are easy to form a fine circuit, and are suitable for use in a substrate for forming a display or the like. The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention are suitable for use in a substrate for a touch panel or a solar cell.
本發明之第1態樣之聚醯亞胺前驅體(以下也稱為「聚醯亞胺前驅體(1-1)」),係包括前述化學式(1-1)表示之重複單元中之至少1種,且此化學式(1-1)表示之重複單元之合計含量相對於全部重複單元為50莫耳%以上之聚醯亞胺前驅體。惟前述化學式(1-1),表示來自四羧酸成分之4價基A11 之4個原子鍵結中有1個鍵結於-CONH-,1個鍵結於-CONH-B11 -,1個鍵結於-COOX1 ,1個鍵結於-COOX2 ,且前述化學式(1-1)包括其結構異構物的全部。The polyfluorene imide precursor of the first aspect of the present invention (hereinafter also referred to as "polyfluorene imine precursor (1-1)") includes at least one of the repeating units represented by the aforementioned chemical formula (1-1). 1 type, and the total content of repeating units represented by the chemical formula (1-1) is 50 mol% or more of a polyimide precursor. However, the aforementioned chemical formula (1-1) indicates that one of the four atomic bonds of the tetravalent group A 11 derived from the tetracarboxylic acid component is bonded to -CONH-, and one is bonded to -CONH-B 11- , One is bonded to -COOX 1 and one is bonded to -COOX 2 , and the aforementioned chemical formula (1-1) includes all of its structural isomers.
本發明之聚醯亞胺前驅體(1-1),宜為前述化學式(1-1)表示之重複單元1種以上在全部重複單元中合計佔50莫耳%以上,更佳為60莫耳%以上,又更佳為70莫耳%以上,尤佳為80莫耳%以上。The polyfluorene imide precursor (1-1) of the present invention is preferably one or more repeating units represented by the aforementioned chemical formula (1-1), and the total repeating units account for more than 50 mol%, and more preferably 60 mol. % Or more, more preferably 70 mol% or more, particularly preferably 80 mol% or more.
又,本發明之聚醯亞胺前驅體(1-1)也可含有A11 及/或B11 不同的前述化學式(1-1)之重複單元2種以上。又,本發明之聚醯亞胺前驅體(1-1),也可含有A11 係前述化學式(A-1)表示之4價基的前述化學式(1-1)的重複單元中的1種或2種以上與A11 係前述化學式(A-2)表示之4價基的前述化學式(1-1)的重複單元中的1種或2種以上。Moreover, the polyfluorene imide precursor (1-1) of the present invention may contain two or more kinds of repeating units of the aforementioned chemical formula (1-1) different from A 11 and / or B 11 . In addition, the polyfluorene imide precursor (1-1) of the present invention may contain one of the repeating units of the aforementioned chemical formula (1-1) having a tetravalent group represented by A 11 based on the aforementioned chemical formula (A-1). Or two or more of the repeating units of the aforementioned chemical formula (1-1) having a tetravalent group represented by the aforementioned chemical formula (A-2) of A 11 is one or two or more.
換言之,本發明之聚醯亞胺前驅體(1-1),係由包括給予前述化學式(A-1)之結構之四羧酸成分及/或給予前述化學式(A-2)之結構之四羧酸成分之四羧酸成分,與包括給予前述化學式(B-1)之結構之二胺成分及/或給予前述化學式(B-2)之結構之二胺成分之二胺成分獲得之聚醯亞胺前驅體。In other words, the polyfluorene imide precursor (1-1) of the present invention is composed of a tetracarboxylic acid component provided with the structure of the aforementioned chemical formula (A-1) and / or Polytetracarboxylic acid component of a carboxylic acid component, and a polymer obtained by including a diamine component imparted to the structure of the aforementioned chemical formula (B-1) and / or a diamine component imparted to the diamine component of the structure of the aforementioned chemical formula (B-2) Imine precursor.
給予前述化學式(1-1)之重複單元之四羧酸成分,係給予前述化學式(A-1)之結構之四羧酸成分、及給予前述化學式(A-2)之結構之四羧酸成分。給予前述化學式(A-1)之結構之四羧酸成分,例如:十四氫-1H,3H-4,12:5,11:6,10-三甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-4,12-乙橋-5,11:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-4,12:5,11-二乙橋-6,10-甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-4,12:5,11:6,10-三甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-5,11-乙橋-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-4,12-乙烯橋-5,11:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-4,12:5,11-二乙烯橋-6,10-甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-4,12:5,11:6,10-三乙烯橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、十四氫-1H,3H-5,11-乙烯橋-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、及對應之四羧酸、四羧酸二酐以外之四羧酸衍生物等,給予前述化學式(A-2)之結構之四羧酸成分,例如:3a,4,10,10a-四氫-1H,3H-4,10-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮、3a,4,10,10a-四氫-1H,3H-4,10-乙橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮、3a,4,10,10a-四氫-1H,3H-4,10-乙烯橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮、及對應之四羧酸、四羧酸二酐以外之四羧酸衍生物等。該等四羧酸成分(四羧酸類等)可單獨使用1種也可組合使用多數種。在此,四羧酸類等,代表四羧酸、四羧酸二酐、四羧酸矽酯、四羧酸酯、四羧醯氯等四羧酸衍生物。The tetracarboxylic acid component given to the repeating unit of the aforementioned chemical formula (1-1) is a tetracarboxylic acid component given to the structure of the aforementioned chemical formula (A-1) and a tetracarboxylic acid component given to the structure of the aforementioned chemical formula (A-2) . The tetracarboxylic acid component of the structure of the aforementioned chemical formula (A-1) is given, for example: tetradecyl-1H, 3H-4,12: 5,11: 6,10-trimethyl bridge anthracene [2,3-c: 6 , 7-c '] difuran-1,3,7,9-tetraone, tetradecahydro-1H, 3H-4,12-ethyl bridge-5,11: 6,10-dimethyl bridge anthracene [2 , 3-c: 6,7-c '] difuran-1,3,7,9-tetraketone, tetradecahydro-1H, 3H-4,12: 5,11-diethyl bridge-6,10- Methylanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, tetradecahydro-1H, 3H-4,12: 5,11: 6, 10-trimethyl bridge anthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraketone, tetradecahydro-1H, 3H-5,11-ethyl bridge-4 , 12: 6,10-dimethylmethanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, tetradehydro-1H, 3H-4, 12-Ethylene Bridge-5,11: 6,10-Dimethylbridge Anthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, tetradehydro- 1H, 3H-4,12: 5,11-diethylene bridge-6,10-methanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetra Ketone, tetradecyl-1H, 3H-4,12: 5,11: 6,10-triethylene bridge anthracene [2,3-c: 6,7-c '] difuran-1,3,7, 9-tetraketone, tetradecahydro-1H, 3H-5,11-ethylene bridge-4,12: 6,10-dimethyl bridge anthracene [2,3-c: 6,7-c '] difuran- 1,3,7,9-tetraketone, and corresponding tetracarboxylic acid, tetracarboxylic acid di A tetracarboxylic acid derivative other than the tetracarboxylic acid derivative is given a tetracarboxylic acid component of the structure of the aforementioned chemical formula (A-2), for example: 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-methanonaphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone, 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-ethyl bridgenaphthalene Benzo [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone, 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-ethylene bridge Naphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone, and corresponding tetracarboxylic acids, tetracarboxylic acid derivatives other than tetracarboxylic dianhydrides, etc. . These tetracarboxylic acid components (tetracarboxylic acids, etc.) may be used individually by 1 type, and may be used in combination of multiple types. Here, tetracarboxylic acids and the like represent tetracarboxylic acid derivatives such as tetracarboxylic acid, tetracarboxylic dianhydride, silicon tetracarboxylic acid ester, tetracarboxylic acid ester, and tetracarboxylic acid chloride.
給予前述化學式(1-1)之重複單元之二胺成分,係給予前述化學式(B-1)之結構之二胺成分、及給予前述化學式(B-2)之結構之二胺成分。The diamine component given to the repeating unit of the aforementioned chemical formula (1-1) is a diamine component given to the structure of the aforementioned chemical formula (B-1) and a diamine component given to the structure of the aforementioned chemical formula (B-2).
給予前述化學式(B-1)之結構之二胺成分,於具有芳香環且有多個芳香環時,芳香環彼此各自獨立地直接鍵結、以醯胺鍵、或酯鍵連結。芳香環彼此之連結位置不特別限定,宜相對於胺基或芳香環彼此之連結基以4位鍵結較佳。亦即,前述化學式(B-1)表示之基中,芳香環彼此之連結位置不特別限定,相對於A11 所鍵結之醯胺基(-CONH-)或芳香環彼此之連結基,以4位鍵結較佳。藉由以此方式鍵結,獲得之聚醯亞胺成為直線結構,會有線熱膨脹變低的情形。給予前述化學式(B-1)之結構之二胺成分有1個芳香環時,宜有對伸苯基結構較佳。亦即,前述化學式(B-1)表示之基有1個芳香環時(n1 及n2 為0時),前述化學式(B-1)表示之基為也可以有取代基(Y1 )之對伸苯基,較佳為無取代之對伸苯基。又,芳香環也可有甲基、三氟甲基取代。又,取代位置無特殊限制。When the diamine component having the structure of the aforementioned chemical formula (B-1) is provided with an aromatic ring and a plurality of aromatic rings, the aromatic rings are each independently directly bonded to each other by a amine bond or an ester bond. The position where the aromatic rings are connected to each other is not particularly limited, and it is preferable to bond at the 4-position with respect to the amine group or the connecting group between the aromatic rings. That group, the aforementioned chemical formula (B-1) represented in the aromatic ring of another coupling position is not particularly limited with respect to the acyl group (-CONH-) A 11 are bonded to each other or an aromatic ring of the linking group to 4-position bonding is preferred. By bonding in this way, the obtained polyimide becomes a linear structure, and the linear thermal expansion may become low. When the diamine component given the structure of the aforementioned chemical formula (B-1) has an aromatic ring, it is preferable to have a p-phenylene structure. That is, when the group represented by the aforementioned chemical formula (B-1) has one aromatic ring (when n 1 and n 2 are 0), the group represented by the aforementioned chemical formula (B-1) may have a substituent (Y 1 ). The p-phenylene group is preferably an unsubstituted p-phenylene group. The aromatic ring may be substituted by a methyl group or a trifluoromethyl group. In addition, there is no particular restriction on the replacement position.
給予前述化學式(B-2)之結構之二胺成分,係有脂肪族6員環者,在脂肪族6員環也可經甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等碳數1~4之烷基取代,但考量獲得之聚醯亞胺之耐熱性及線熱膨脹係數,無取代之脂肪族6員環較佳。亦即,前述化學式(B-2)表示之基中,Y4 宜為氫原子較佳。又,取代位置無特殊限制。又,給予前述化學式(B-2)之結構之二胺成分,宜就脂肪族6員環而言具有1,4-環己烷結構較佳。亦即,前述化學式(B-2)表示之基係也可以有取代基(Y4 )之1,4-伸環己基,較佳為無取代之1,4-伸環己基。The diamine component given the structure of the aforementioned chemical formula (B-2) is a 6-membered aliphatic ring, and the 6-membered aliphatic ring can also be passed through methyl, ethyl, n-propyl, isopropyl, and n-butyl groups. , Isobutyl, second butyl, third butyl and other alkyl groups with 1 to 4 carbon atoms, but considering the heat resistance and linear thermal expansion coefficient of the obtained polyimide, the unsubstituted aliphatic 6-membered ring good. That is, in the group represented by the aforementioned chemical formula (B-2), Y 4 is preferably a hydrogen atom. In addition, there is no particular restriction on the replacement position. Furthermore, it is preferred that the diamine component having the structure of the aforementioned chemical formula (B-2) has a 1,4-cyclohexane structure in terms of an aliphatic 6-membered ring. That is, the base system represented by the aforementioned chemical formula (B-2) may have a 1,4-cyclohexyl group having a substituent (Y 4 ), preferably an unsubstituted 1,4-cyclohexyl group.
給予前述化學式(B-1)之結構之二胺成分無特殊限定,例如:對苯二胺、間苯二胺、聯苯胺、3,3’-二胺基-聯苯、2,2’-雙(三氟甲基)聯苯胺、3,3’-雙(三氟甲基)聯苯胺、間聯甲苯胺、4,4’-二胺基苯醯替苯胺、3,4’-二胺基苯醯替苯胺、N,N’-雙(4-胺基苯基)對苯二甲醯胺、N,N’-對伸苯基雙(對胺基苯甲醯胺)、4-胺基苯氧基-4-二胺基苯甲酸酯、雙(4-胺基苯基)對苯二甲酸酯、聯苯-4,4’-二羧酸雙(4-胺基苯基)酯、對伸苯基雙(對胺基苯甲酸酯)、雙(4-胺基苯基)-[1,1’-聯苯]-4,4’-二羧酸酯、[1,1’-聯苯]-4,4’-二基雙(4-胺基苯甲酸酯)等。給予前述化學式(B-2)之結構之二胺成分可列舉1,4-二胺基環己烷、1,4-二胺基-2-甲基環己烷、1,4-二胺基-2-乙基環己烷、1,4-二胺基-2-正丙基環己烷、1,4-二胺基-2-異丙基環己烷、1,4-二胺基-2-正丁基環己烷、1,4-二胺基-2-異丁基環己烷、1,4-二胺基-2-第二丁基環己烷、1,4-二胺基-2-第三丁基環己烷、1,2-二胺基環己烷等。給予前述化學式(B-2)之結構之二胺成分,考量獲得之聚醯亞胺之熱線膨脹係數低之觀點,宜為1,4-二胺基環己烷更理想。又,上述具1,4-環己烷結構之二胺之1,4位之立體結構不特別限定,宜為反式結構較佳。反式結構的情形,相較於順式結構,有更抑制獲得之聚醯亞胺著色的情形。該等二胺成分可單獨使用1種也可組合使用多數種。The diamine component given the structure of the aforementioned chemical formula (B-1) is not particularly limited, for example: p-phenylenediamine, m-phenylenediamine, benzidine, 3,3'-diamine-biphenyl, 2,2'- Bis (trifluoromethyl) benzidine, 3,3'-bis (trifluoromethyl) benzidine, m-toluidine, 4,4'-diaminobenzidine, 3,4'-diamine Phenylbenzidine, N, N'-bis (4-aminophenyl) p-xylylenediamine, N, N'-p-phenylene bis (p-aminobenzidine), 4-amine Phenoxy-4-diaminobenzoate, bis (4-aminophenyl) terephthalate, biphenyl-4,4'-dicarboxylic acid bis (4-aminophenyl) ) Ester, p-phenylene bis (p-aminobenzoate), bis (4-aminophenyl)-[1,1'-biphenyl] -4,4'-dicarboxylic acid ester, [1 , 1'-biphenyl] -4,4'-diylbis (4-aminobenzoate) and the like. Examples of the diamine component imparted to the structure of the aforementioned chemical formula (B-2) include 1,4-diaminocyclohexane, 1,4-diamino-2-methylcyclohexane, and 1,4-diamine. 2-ethylcyclohexane, 1,4-diamino-2-n-propylcyclohexane, 1,4-diamino-2-isopropylcyclohexane, 1,4-diamino 2-n-butylcyclohexane, 1,4-diamino-2-isobutylcyclohexane, 1,4-diamino-2-second butylcyclohexane, 1,4-di Amino-2-third butylcyclohexane, 1,2-diaminocyclohexane, and the like. Given the diamine component of the structure of the aforementioned chemical formula (B-2), considering the viewpoint that the obtained polyimide has a low coefficient of thermal expansion, the 1,4-diaminocyclohexane is more preferable. In addition, the three-dimensional structure of the 1,4-position of the above-mentioned diamine having a 1,4-cyclohexane structure is not particularly limited, and a trans-structure is preferred. In the case of the trans structure, the obtained polyimide may be more inhibited from coloring than the cis structure. These diamine components may be used singly or in combination.
前述化學式(1-1)中之B11 ,亦即前述化學式(B-1)表示之2價基、及前述化學式(B-2)表示之2價基,宜為下列化學式(B-1-1)~(B-1-6)、(B-2-1)中任一者表示之基較佳。B 11 in the aforementioned chemical formula (1-1), that is, the divalent group represented by the aforementioned chemical formula (B-1) and the divalent group represented by the aforementioned chemical formula (B-2), are preferably the following chemical formula (B-1- 1) A base represented by any of (B-1-6) and (B-2-1) is preferred.
[化43] [Chemical 43]
又,給予B11 係前述化學式(B-1-1)或(B-1-2)表示者的前述化學式(1-1)之重複單元的二胺成分,係4,4’-二胺基苯醯替苯胺,給予B11 係前述化學式(B-1-3)表示者的前述化學式(1-1)之重複單元的二胺成分,係雙(4-胺基苯基)對苯二甲酸酯,給予B11 係前述化學式(B-1-4)表示者的前述化學式(1-1)之重複單元的二胺成分,係對苯二胺,給予B11 係前述化學式(B-1-5)表示者的前述化學式(1-1)之重複單元的二胺成分,係2,2’-雙(三氟甲基)聯苯胺,給予B11 係前述化學式(B-1-6)表示者的前述化學式(1-1)之重複單元的二胺成分,係間聯甲苯胺,給予B11 係前述化學式(B-2-1)表示者的前述化學式(1-1)之重複單元的二胺成分,係1,4-二胺基環己烷。The diamine component of the repeating unit of the chemical formula (1-1) represented by B 11 is represented by the aforementioned chemical formula (B-1-1) or (B-1-2) is a 4,4'-diamine group. Bentamidine, given to B 11 is a diamine component of the repeating unit of the aforementioned formula (1-1) represented by the aforementioned formula (B-1-3), and is a bis (4-aminophenyl) p-xylylene Acid ester, to which B 11 is the diamine component of the repeating unit of the aforementioned chemical formula (1-1) represented by the aforementioned chemical formula (B-1-4), is p-phenylenediamine, and B 11 is the aforementioned chemical formula (B-1) -5) The diamine component of the repeating unit of the aforementioned chemical formula (1-1) is 2,2'-bis (trifluoromethyl) benzidine, and B 11 is given by the aforementioned chemical formula (B-1-6) The diamine component of the repeating unit of the aforementioned chemical formula (1-1), m-toluidine, is given to the B 11 series of the repeating unit of the aforementioned chemical formula (1-1). The diamine component is 1,4-diaminocyclohexane.
前述化學式(1-1)中之B11 中,前述化學式(B-1-1)~(B-1-6)、(B-2-1)中任一者表示之基之比例,合計較佳為30莫耳%以上,更佳為50莫耳%以上,尤佳為70莫耳%以上。In B 11 in the aforementioned chemical formula (1-1), the ratio of the bases represented by any one of the aforementioned chemical formulas (B-1-1) to (B-1-6) and (B-2-1) is compared. It is preferably 30 mol% or more, more preferably 50 mol% or more, and even more preferably 70 mol% or more.
本發明之聚醯亞胺前驅體(1-1),可含有前述化學式(1-1)表示之重複單元以外之其他重複單元。在某實施態樣中,來自前述化學式(1-1)表示之重複單元以外之其他重複單元例如四羧酸成分之4價基,係前述化學式(A-1)表示之4價基或前述化學式(A-2)表示之4價基,且來自二胺成分之2價基有多個芳香環且芳香環彼此以醚鍵(-O-)連結者的重複單元,在全部重複單元中的含量例如:30莫耳%以下、或25莫耳%以下、或20莫耳%以下、或10莫耳%以下較佳。在某實施態樣,取決於要求之特性、用途,來自四羧酸成分之4價基係前述化學式(A-1)表示之4價基或前述化學式(A-2)表示之4價基且來自二胺成分之2價基為具多個芳香環且芳香環彼此以醚鍵(-O-)連結者的重複單元,在全部重複單元中之含量例如:40莫耳%以下,較佳為35莫耳%以下較佳。The polyfluorene imide precursor (1-1) of the present invention may contain a repeating unit other than the repeating unit represented by the aforementioned chemical formula (1-1). In an embodiment, the repeating unit other than the repeating unit represented by the aforementioned chemical formula (1-1), such as a tetravalent group of a tetracarboxylic acid component, is a tetravalent group represented by the aforementioned chemical formula (A-1) or the aforementioned chemical formula The content of the repeating unit of the tetravalent group represented by (A-2) and the repeating unit of the divalent component derived from the diamine component having multiple aromatic rings and the aromatic rings connected with each other by an ether bond (-O-) in all the repeating units For example: 30 mol% or less, or 25 mol% or less, or 20 mol% or less, or 10 mol% or less is preferred. In an embodiment, the tetravalent group derived from the tetracarboxylic acid component is a tetravalent group represented by the aforementioned chemical formula (A-1) or a tetravalent group represented by the aforementioned chemical formula (A-2) depending on the required characteristics and applications. The divalent group derived from the diamine component is a repeating unit having a plurality of aromatic rings and the aromatic rings are connected by an ether bond (-O-). The content of the repeating units in all repeating units is, for example, 40 mol% or less, preferably 35 mol% or less is preferred.
給予其他重複單元之四羧酸成分,可使用芳香族或脂肪族四羧酸類。雖無特殊限制,例如:2,2-雙(3,4-二羧基苯基)六氟丙烷、4-(2,5-二側氧基四氫呋喃-3-基)-1,2,3,4-四氫萘-1,2-二羧酸、苯均四酸、3,3’,4,4’-二苯酮四羧酸、3,3’,4,4’-聯苯四羧酸、2,3,3’,4’-聯苯四羧酸、4,4’-氧基二鄰苯二甲酸、雙(3,4-二羧基苯基)碸二無水物、間聯三苯-3,4,3’,4’-四羧酸二酐、對聯三苯-3,4,3’,4’-四羧酸二酐、雙羧基苯基二甲基矽烷、雙二羧基苯氧基二苯基硫醚、磺醯基二鄰苯二甲酸、1,2,3,4-環丁烷四羧酸、異亞丙基二苯氧基雙鄰苯二甲酸、環己烷-1,2,4,5-四羧酸、[1,1’-聯(環己烷)]-3,3’,4,4’-四羧酸、[1,1’-聯(環己烷)]-2,3,3’,4’-四羧酸、[1,1’-聯(環己烷)]-2,2’,3,3’-四羧酸、4,4’-亞甲基雙(環己烷-1,2-二羧酸)、4,4’-(丙烷-2,2-二基)雙(環己烷-1,2-二羧酸)、4,4’-氧基雙(環己烷-1,2-二羧酸)、4,4’-硫雙(環己烷-1,2-二羧酸)、4,4’-磺醯基雙(環己烷-1,2-二羧酸)、4,4’-(二甲基矽烷二基)雙(環己烷-1,2-二羧酸)、4,4’-(四氟丙烷-2,2-二基)雙(環己烷-1,2-二羧酸)、八氫戊搭烯-1,3,4,6-四羧酸、雙環[2.2.1]庚烷-2,3,5,6-四羧酸、6-(羧基甲基)雙環[2.2.1]庚烷-2,3,5-三羧酸、雙環[2.2.2]辛烷-2,3,5,6-四羧酸、雙環[2.2.2]辛-5-烯-2,3,7,8-四羧酸、三環[4.2.2.02,5]癸烷-3,4,7,8-四羧酸、三環[4.2.2.02,5]癸-7-烯-3,4,9,10-四羧酸、9-氧雜三環[4.2.1.02,5]壬烷-3,4,7,8-四羧酸、十氫-1,4:5,8-二甲橋萘-2,3,6,7-四羧酸、降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四羧酸等衍生物、該等之酸二酐。該等四羧酸成分(四羧酸類等)可單獨使用1種也可組合使用多數種。該等之中,雙環[2.2.1]庚烷-2,3,5,6-四羧酸、雙環[2.2.2]辛烷-2,3,5,6-四羧酸、十氫-1,4:5,8-二甲橋萘-2,3,6,7-四羧酸、降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四羧酸等衍生物、該等之酸二酐較佳。As the tetracarboxylic acid component for giving other repeating units, aromatic or aliphatic tetracarboxylic acids can be used. Although there are no special restrictions, for example: 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane, 4- (2,5-dioxotetrahydrofuran-3-yl) -1,2,3, 4-tetrahydronaphthalene-1,2-dicarboxylic acid, pyromellitic acid, 3,3 ', 4,4'-benzophenone tetracarboxylic acid, 3,3', 4,4'-biphenyltetracarboxylic acid Acid, 2,3,3 ', 4'-biphenyltetracarboxylic acid, 4,4'-oxydiphthalic acid, bis (3,4-dicarboxyphenyl) pyrene dihydrate, intermoletris Benzene-3,4,3 ', 4'-tetracarboxylic dianhydride, terphenyltriphenyl-3,4,3', 4'-tetracarboxylic dianhydride, biscarboxyphenyldimethylsilane, bisdicarboxyl Phenoxy diphenyl sulfide, sulfofluorenyl diphthalic acid, 1,2,3,4-cyclobutanetetracarboxylic acid, isopropylidene diphenoxy diphthalic acid, cyclohexane -1,2,4,5-tetracarboxylic acid, [1,1'-bi (cyclohexane)]-3,3 ', 4,4'-tetracarboxylic acid, [1,1'-bi (cyclic Hexane)]-2,3,3 ', 4'-tetracarboxylic acid, [1,1'-bi (cyclohexane)]-2,2', 3,3'-tetracarboxylic acid, 4,4 '-Methylenebis (cyclohexane-1,2-dicarboxylic acid), 4,4'-(propane-2,2-diyl) bis (cyclohexane-1,2-dicarboxylic acid), 4,4'-oxybis (cyclohexane-1,2-dicarboxylic acid), 4,4'-thiobis (cyclohexane-1,2-dicarboxylic acid), 4,4'-sulfofluorene Bis (cyclohexane -1,2-dicarboxylic acid), 4,4 '-(dimethylsilanediyl) bis (cyclohexane-1,2-dicarboxylic acid), 4,4'-(tetrafluoropropane-2, 2-diyl) bis (cyclohexane-1,2-dicarboxylic acid), octahydropentadiene-1,3,4,6-tetracarboxylic acid, bicyclo [2.2.1] heptane-2,3 , 5,6-tetracarboxylic acid, 6- (carboxymethyl) bicyclo [2.2.1] heptane-2,3,5-tricarboxylic acid, bicyclo [2.2.2] octane-2,3,5, 6-tetracarboxylic acid, bicyclic [2.2.2] oct-5-ene-2,3,7,8-tetracarboxylic acid, tricyclic [4.2.2.02,5] decane-3,4,7,8- Tetracarboxylic acid, tricyclic [4.2.2.02,5] dec-7-ene-3,4,9,10-tetracarboxylic acid, 9-oxatricyclo [4.2.1.02,5] nonane-3,4 , 7,8-tetracarboxylic acid, decahydro-1,4: 5,8-dimethyl bridgenaphthalene-2,3,6,7-tetracarboxylic acid, norbornane-2-spiro-α-cyclopentanone -α'-spiro-2 ''-norbornane-5,5 '', 6,6 ''-tetracarboxylic acid, and other dianhydrides. These tetracarboxylic acid components (tetracarboxylic acids, etc.) may be used individually by 1 type, and may be used in combination of multiple types. Among these, bicyclic [2.2.1] heptane-2,3,5,6-tetracarboxylic acid, bicyclic [2.2.2] octane-2,3,5,6-tetracarboxylic acid, decahydro- 1,4: 5,8-Dimethynaphthalene-2,3,6,7-tetracarboxylic acid, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2 ''-norbidine Derivatives such as alkane-5,5 '', 6,6 ''-tetracarboxylic acid, and such acid dianhydrides are preferred.
又,組合之二胺成分,為給予前述化學式(B-1)之結構之二胺成分及給予前述化學式(B-2)之結構之二胺成分以外之其他二胺時,就給予其他重複單元之四羧酸成分而言,可以使用給予前述化學式(A-1)之結構之四羧酸成分及給予前述化學式(A-2)之結構之四羧酸成分中之1種或2種以上。When the combined diamine component is a diamine component given the structure of the aforementioned chemical formula (B-1) and a diamine other than the diamine component given the structure of the aforementioned chemical formula (B-2), other repeating units are given. As the tetracarboxylic acid component, one or two or more of the tetracarboxylic acid component given the structure of the aforementioned chemical formula (A-1) and the tetracarboxylic acid component given the structure of the aforementioned chemical formula (A-2) can be used.
就給予其他重複單元之二胺成分而言,可使用其他芳香族或脂肪族二胺類。雖無特殊限定,例如:4,4’-氧基二苯胺、3,4’-氧基二苯胺、3,3’-氧基二苯胺、雙(4-胺基苯基)硫醚、p-亞甲基雙(苯二胺)、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、2,2-雙[4-(4-胺基苯氧基)苯基]六氟丙烷、2,2-雙(4-胺基苯基)六氟丙烷、雙(4-胺基苯基)碸、3,3-雙((胺基苯氧基)苯基)丙烷、2,2-雙(3-胺基-4-羥基苯基)六氟丙烷、雙(4-(4-胺基苯氧基)二苯基)碸、雙(4-(3-胺基苯氧基)二苯基)碸、八氟聯苯胺、3,3’-二甲氧基-4,4’-二胺基聯苯、3,3’-二氯-4,4’-二胺基聯苯、3,3’-二氟-4,4’-二胺基聯苯、9,9-雙(4-胺基苯基)茀、4,4’-雙(4-胺基苯氧基)聯苯、4,4’-雙(3-胺基苯氧基)聯苯等、該等之衍生物。該等二胺成分可單獨使用1種也可組合使用多數種。As for the diamine component to which other repeating units are given, other aromatic or aliphatic diamines may be used. Although not particularly limited, for example: 4,4'-oxydiphenylamine, 3,4'-oxydiphenylamine, 3,3'-oxydiphenylamine, bis (4-aminophenyl) sulfide, p -Methylenebis (phenylenediamine), 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 1,4-bis (4 -Aminophenoxy) benzene, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, 2,2-bis (4-aminophenyl) hexafluoropropane, Bis (4-aminophenyl) fluorene, 3,3-bis ((aminophenoxy) phenyl) propane, 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane, Bis (4- (4-aminophenoxy) diphenyl) fluorene, bis (4- (3-aminophenoxy) diphenyl) fluorene, octafluorobenzidine, 3,3'-dimethyl Oxy-4,4'-diaminobiphenyl, 3,3'-dichloro-4,4'-diaminobiphenyl, 3,3'-difluoro-4,4'-diaminobiphenyl Benzene, 9,9-bis (4-aminophenyl) fluorene, 4,4'-bis (4-aminophenoxy) biphenyl, 4,4'-bis (3-aminophenoxy) Biphenyl, etc. and their derivatives. These diamine components may be used singly or in combination.
又,組合之四羧酸成分為給予前述化學式(A-1)之結構之四羧酸成分及給予前述化學式(A-2)之結構之四羧酸成分以外之其他四羧酸類等時,就給予其他重複單元之二胺成分而言,也可使用給予前述化學式(B-1)之結構之二胺成分及給予前述化學式(B-2)之結構之二胺成分中之1種或2種以上。When the combined tetracarboxylic acid component is a tetracarboxylic acid component given a structure of the aforementioned chemical formula (A-1) and a tetracarboxylic acid component other than the tetracarboxylic acid component given a structure of the aforementioned chemical formula (A-2), For the diamine component given to other repeating units, one or two of the diamine component given to the structure of the aforementioned chemical formula (B-1) and the diamine component given to the structure of the aforementioned chemical formula (B-2) may be used. the above.
在某實施態樣,例如:4,4’-氧基二苯胺、4,4’-雙(4-胺基苯氧基)聯苯等有多個芳香環且芳香環彼此以醚鍵(-O-)連結之二胺成分,在二胺成分100莫耳%中之含量宜為例如:30莫耳%以下、或25莫耳%以下、或20莫耳%以下、或10莫耳%以下較佳。又,在某實施態樣,取決於要求特性、用途,有多個芳香環且芳香環彼此以醚鍵(-O-)連結之二胺成分,在二胺成分100莫耳%中之使用量宜為例如:40莫耳%以下,較佳為35莫耳%以下較佳。In a certain embodiment, for example, 4,4'-oxydiphenylamine, 4,4'-bis (4-aminophenoxy) biphenyl, and the like have multiple aromatic rings and the aromatic rings are ether-bonded (- O-) The content of the linked diamine component in 100 mol% of the diamine component is preferably, for example: 30 mol% or less, or 25 mol% or less, or 20 mol% or less, or 10 mol% or less Better. In a certain embodiment, depending on the required characteristics and applications, the amount of the diamine component having a plurality of aromatic rings and the aromatic rings connected with each other by an ether bond (-O-) is 100 mol% of the diamine component. It is preferably, for example, 40 mol% or less, more preferably 35 mol% or less.
本發明之第2態樣之聚醯亞胺前驅體(以下也稱為「聚醯亞胺前驅體(1-2)」),係含有前述化學式(1-2)表示之重複單元中之至少1種之聚醯亞胺前驅體。惟前述化學式(1-2),代表來自四羧酸成分之4價基A12 之4個原子鍵結當中,1個鍵結於-CONH-,1個鍵結於-CONH-B12 -,1個鍵結於-COOX3 ,1個鍵結於-COOX4 ,且前述化學式(1-2)包括其結構異構物的全部。The polyfluorene imide precursor of the second aspect of the present invention (hereinafter also referred to as "polyfluorene imide precursor (1-2)") contains at least one of the repeating units represented by the aforementioned chemical formula (1-2). A polyimide precursor. However, the aforementioned chemical formula (1-2) represents the four atomic bonds of the tetravalent group A 12 derived from the tetracarboxylic acid component, one is bonded to -CONH-, and one is bonded to -CONH-B 12- , One is bonded to -COOX 3 and one is bonded to -COOX 4 , and the aforementioned chemical formula (1-2) includes all of its structural isomers.
化學式(1-2)表示之重複單元之合計含量不特別限定,相對於全部重複單元為50莫耳%以上較佳。亦即,本發明之聚醯亞胺前驅體(1-2),係前述化學式(1-2)表示之重複單元1種以上的含量在全部重複單元中合計為50莫耳%以上較佳,更佳為60莫耳%以上,更佳為70莫耳%以上,更佳為80莫耳%以上,尤佳為90莫耳%以上。The total content of the repeating units represented by the chemical formula (1-2) is not particularly limited, but it is preferably 50 mol% or more with respect to all the repeating units. That is, the polyfluorene imide precursor (1-2) of the present invention is more than 50 mol% in total of the repeating units represented by the aforementioned chemical formula (1-2). It is more preferably 60 mol% or more, more preferably 70 mol% or more, even more preferably 80 mol% or more, and even more preferably 90 mol% or more.
又,本發明之聚醯亞胺前驅體(1-2),也可含有A12 及/或B12 不同的前述化學式(1-2)之重複單元2種以上。又,本發明之聚醯亞胺前驅體(1-2),也可含有A12 係前述化學式(A-3)表示之4價基的前述化學式(1-2)之重複單元1種或2種以上與A12 係前述化學式(A-4)表示之4價基的前述化學式(1-2)之重複單元。Moreover, the polyfluorene imide precursor (1-2) of the present invention may contain two or more kinds of repeating units of the aforementioned chemical formula (1-2) different from A 12 and / or B 12 . Further, the polyimide precursor of the present invention (1-2), A 12 may contain repeat units (A-3) represents a tetravalent group of the chemical formula of the chemical formula (1-2) of one or two The above-mentioned repeating unit of the aforementioned chemical formula (1-2) having a tetravalent group represented by the aforementioned chemical formula (A-4) is more than A 12 .
換言之,本發明之聚醯亞胺前驅體(1-2),係由含有給予前述化學式(A-3)之結構之四羧酸成分及/或給予前述化學式(A-4)之結構之四羧酸成分之四羧酸成分,及含有具芳香族環或脂環結構之二胺成分(亦即,芳香族二胺或脂環族二胺)之二胺成分獲得之聚醯亞胺前驅體。In other words, the polyimide precursor (1-2) of the present invention is composed of the tetracarboxylic acid component containing the structure given to the aforementioned chemical formula (A-3) and / or the fourth structure given to the aforementioned chemical formula (A-4) A tetracarboxylic acid component of a carboxylic acid component, and a polyimide precursor obtained from a diamine component containing a diamine component having an aromatic ring or an alicyclic structure (that is, an aromatic diamine or an alicyclic diamine). .
給予前述化學式(1-2)之重複單元之四羧酸成分,係給予前述化學式(A-3)之結構之四羧酸成分、及給予前述化學式(A-4)之結構之四羧酸成分。給予前述化學式(A-3)之結構之四羧酸成分,例如:3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12-乙橋-6,10-甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二乙橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12-乙烯橋-6,10-甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二乙烯橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮、及對應之四羧酸、四羧酸二酐以外之四羧酸衍生物等,給予前述化學式(A-4)之結構之四羧酸成分,例如:十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮、及對應之四羧酸、、四羧酸二酐以外之四羧酸衍生物等。該等四羧酸成分(四羧酸類等)可單獨使用1種也可組合使用多數種。在此,四羧酸類等,係指四羧酸、及四羧酸二酐、四羧酸矽酯、四羧酸酯、四羧醯氯等四羧酸衍生物。The tetracarboxylic acid component given to the repeating unit of the aforementioned chemical formula (1-2) is a tetracarboxylic acid component given to the structure of the aforementioned chemical formula (A-3), and a tetracarboxylic acid component given to the structure of the aforementioned chemical formula (A-4) . Give the tetracarboxylic acid component of the structure of the aforementioned chemical formula (A-3), for example: 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H-4,12: 6,10-di Methylanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, 3a, 4,6,6a, 9a, 10,12,12a-octahydro -1H, 3H-4,12-ethyl bridge-6,10-methanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H-4,12: 6,10-diethylanthracene [2,3-c: 6,7-c '] difuran -1,3,7,9-tetraone, 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H-4,12-ethylene bridge-6,10-methanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H -4,12: 6,10-diethylene bridge anthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone, and the corresponding tetracarboxylic acid, tetra A tetracarboxylic acid derivative other than a carboxylic dianhydride is given a tetracarboxylic acid component of the structure of the aforementioned chemical formula (A-4), for example: decahydro-1H, 3H-4,10-ethyl bridge-5,9-form Bridgenaphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone, and corresponding tetracarboxylic acids, and tetracarboxylic acids other than tetracarboxylic dianhydride derivatives Things. These tetracarboxylic acid components (tetracarboxylic acids, etc.) may be used individually by 1 type, and may be used in combination of multiple types. Here, tetracarboxylic acids and the like refer to tetracarboxylic acid derivatives such as tetracarboxylic acid, tetracarboxylic dianhydride, silicon tetracarboxylic acid ester, tetracarboxylic acid ester, and tetracarboxylic acid chloride.
前述化學式(1-2)中之B12 ,為具有芳香族環或脂環結構之2價基,考量獲得之聚醯亞胺之耐熱性之觀點,宜為具有芳香族環之2價基較佳。化學式(1-2)中之B12 亦即二胺成分不特別限定,可因應要求之特性、用途適當選擇。B 12 in the aforementioned chemical formula (1-2) is a divalent group having an aromatic ring or an alicyclic structure. Considering the heat resistance of the obtained polyimide, the divalent group having an aromatic ring is preferably good. The B 12 in the chemical formula (1-2), that is, the diamine component is not particularly limited, and may be appropriately selected according to the required characteristics and applications.
給予前述化學式(1-2)之重複單元之二胺成分,例如就給予前述聚醯亞胺前驅體(1-1)之前述化學式(B-1)之結構之二胺成分及給予前述化學式(B-2)之結構之二胺成分列舉者,再者,可列舉和就給予前述化學式(B-1)之結構之二胺成分及給予前述化學式(B-2)之結構之二胺成分以外之其他重複單元之二胺成分列舉者,皆可理想地使用。聚醯亞胺前驅體(1-2)中,該等二胺成分可單獨使用1種也可組合使用多數種。The diamine component of the repeating unit of the aforementioned chemical formula (1-2) is given, for example, the diamine component of the structure of the aforementioned chemical formula (B-1) given to the aforementioned polyfluorene imine precursor (1-1) and the aforementioned chemical formula ( Examples of the diamine component of the structure of B-2), and further, the diamine component of the structure of the aforementioned chemical formula (B-1) and the diamine component of the structure of the aforementioned chemical formula (B-2) Any of the diamine components of other repeating units can be used as desired. In the polyfluorene imide precursor (1-2), these diamine components may be used singly or in combination.
前述化學式(1-2)中之B12 宜為有碳數6~40之芳香族環之2價基較理想,前述聚醯亞胺前驅體(1-1)例示之前述化學式(B-1)表示之基更理想。又,前述聚醯亞胺前驅體(1-1)例示之前述化學式(B-2)表示之基亦為理想。前述化學式(1-2)中之B12 宜為前述化學式(B-1-1)~(B-1-6)、(B-2-1)中任一者表示之基尤佳。It is preferable that B 12 in the aforementioned chemical formula (1-2) is a divalent group having an aromatic ring having 6 to 40 carbon atoms. The aforementioned chemical formula (B-1) exemplified by the aforementioned polyfluorene imine precursor (1-1) ) Is more ideal. The group represented by the aforementioned chemical formula (B-2) exemplified by the aforementioned polyfluorene imine precursor (1-1) is also preferable. B 12 in the aforementioned chemical formula (1-2) is preferably a base represented by any one of the aforementioned chemical formulas (B-1-1) to (B-1-6) and (B-2-1).
前述化學式(1-2)中之B12 宜為有多數芳香環且芳香環彼此之一部分或全部以醚鍵(-O-)連結之2價基,下列化學式(B-3-1)~(B-3-4)中任一者表示之基特別理想。B 12 in the aforementioned chemical formula (1-2) is preferably a divalent group having a plurality of aromatic rings and one or all of the aromatic rings are connected by an ether bond (-O-). The following chemical formulas (B-3-1) ~ ( The base represented by any of B-3-4) is particularly desirable.
[化44] [Chemical 44]
又,給予B12 係前述化學式(B-3-1)表示者的前述化學式(1-2)之重複單元的二胺成分,係4,4’-氧基二苯胺,給予B12 係前述化學式(B-3-2)表示者的前述化學式(1-2)之重複單元的二胺成分,係1,4-雙(4-胺基苯氧基)苯,給予B12 係前述化學式(B-3-3)表示者的前述化學式(1-2)之重複單元的二胺成分,係1,3-雙(4-胺基苯氧基)苯,給予B12 係前述化學式(B-3-4)表示者的前述化學式(1-2)之重複單元的二胺成分,係4,4’-雙(4-胺基苯氧基)聯苯。In addition, B 12 is a diamine component of the repeating unit of the aforementioned chemical formula (1-2) represented by the aforementioned chemical formula (B-3-1), and is 4,4'-oxydiphenylamine, and B 12 is the aforementioned chemical formula. (B-3-2) The diamine component of the repeating unit of the aforementioned chemical formula (1-2) is 1,4-bis (4-aminophenoxy) benzene, and B 12 is the aforementioned chemical formula (B -3-3) The diamine component of the repeating unit of the aforementioned chemical formula (1-2) is 1,3-bis (4-aminophenoxy) benzene, and B 12 is given by the aforementioned chemical formula (B-3 -4) The diamine component of the repeating unit of the aforementioned chemical formula (1-2) is 4,4'-bis (4-aminophenoxy) biphenyl.
如前述,化學式(1-2)中之B12 亦即二胺成分,可因應要求之特性、用途適當選擇。在某實施態樣,前述化學式(1-2)中之B12 中,前述化學式(B-1)表示之基及/或前述化學式(B-2)表示之基,更佳為前述化學式(B-1-1)~(B-1-6)、(B-2-1)中任一者表示之基之比例,合計宜為例如:50莫耳%以上,更佳為60莫耳%以上,更佳為65莫耳%以上,更佳為70莫耳%以上、或75莫耳%以上較佳。在某實施態樣,前述化學式(1-2)中之B12 中,具有多數芳香環且芳香環彼此之一部分或全部以醚鍵(-O-)連結之2價基,更佳為前述化學式(B-3-1)~(B-3-4)中任一者表示之基之比例,合計為例如:30莫耳%以上,更佳為50莫耳%以上。在某實施態樣,前述化學式(1-2)中之B12 中,前述化學式(B-1)表示之基及/或前述化學式(B-2)表示之基之比例,合計為60莫耳%以上,較佳為65莫耳%以上、或70莫耳%以上、或75莫耳%以上,前述化學式(B-3-1)~(B-3-4)中任一者表示之基之比例,合計為40莫耳%以下,較佳為35莫耳%以下、或30莫耳%以下、或25莫耳%以下較佳。As described above, B 12 in the chemical formula (1-2), that is, a diamine component, can be appropriately selected according to the required characteristics and applications. In an embodiment, in B 12 in the aforementioned chemical formula (1-2), the base represented by the aforementioned chemical formula (B-1) and / or the base represented by the aforementioned chemical formula (B-2) is more preferably the aforementioned chemical formula (B -1-1) ~ (B-1-6), (B-2-1) The proportion of the base is preferably, for example, 50 mol% or more, more preferably 60 mol% or more , More preferably 65 mol% or more, more preferably 70 mol% or more, or more preferably 75 mol% or more. In an embodiment, in B 12 in the aforementioned chemical formula (1-2), the divalent group having a plurality of aromatic rings and one or all of the aromatic rings are connected by an ether bond (-O-), and more preferably the aforementioned chemical formula The ratio of the bases represented by any of (B-3-1) to (B-3-4) is, for example, 30 mol% or more, and more preferably 50 mol% or more. In an embodiment, the proportion of the base represented by the aforementioned chemical formula (B-1) and / or the base represented by the aforementioned chemical formula (B-2) in B 12 in the aforementioned chemical formula (1-2) is 60 mol in total. % Or more, preferably 65 mol% or more, or 70 mol% or more, or 75 mol% or more, the base represented by any one of the aforementioned chemical formulas (B-3-1) to (B-3-4) The proportion is 40 mol% or less in total, preferably 35 mol% or less, or 30 mol% or less, or 25 mol% or less.
本發明之聚醯亞胺前驅體(1-2),可以含有前述化學式(1-2)表示之重複單元以外之其他重複單元。The polyfluorene imide precursor (1-2) of the present invention may contain a repeating unit other than the repeating unit represented by the aforementioned chemical formula (1-2).
給予其他重複單元之四羧酸成分可以使用其他芳香族或脂肪族四羧酸類,例如可列舉和就前述聚醯亞胺前驅體(1-1)中給予其他重複單元之四羧酸成分列舉者為同樣者。又,可使用就給予前述化學式(1-1)之重複單元之四羧酸成分(亦即,給予前述化學式(A-1)之結構之四羧酸成分、及給予前述化學式(A-2)之結構之四羧酸成分)列舉者。聚醯亞胺前驅體(1-2)中,給予該等其他重複單元之四羧酸成分可單獨使用1種也可組合使用多數種。Other aromatic or aliphatic tetracarboxylic acids may be used as the tetracarboxylic acid component to give other repeating units. For example, the tetracarboxylic acid components given to other repeating units in the aforementioned polyfluorene imine precursor (1-1) may be listed and listed. For the same. In addition, a tetracarboxylic acid component given to the repeating unit of the aforementioned chemical formula (1-1) (that is, a tetracarboxylic acid component given to the structure of the aforementioned chemical formula (A-1), and a given formula (A-2) can be used. Structure of the tetracarboxylic acid component). In the polyfluorene imide precursor (1-2), the tetracarboxylic acid component given to these other repeating units may be used singly or in combination.
又,組合之二胺成分係不具芳香族環及脂環結構之二胺時,就給予其他重複單元之四羧酸成分而言,可使用給予前述化學式(A-3)之結構之四羧酸成分及給予前述化學式(A-4)之結構之四羧酸成分中之1種或2種以上。When the combined diamine component is a diamine having no aromatic ring and alicyclic structure, as for the tetracarboxylic acid component imparting other repeating units, a tetracarboxylic acid having a structure of the aforementioned chemical formula (A-3) can be used. One or two or more of the components and the tetracarboxylic acid component giving the structure of the aforementioned chemical formula (A-4).
就給予其他重複單元之二胺成分而言,可使用其他芳香族或脂肪族二胺類,例如和就給予前述聚醯亞胺前驅體(1-1)中之其他重複單元之二胺成分列舉者為同樣者。又,可使用就給予前述化學式(1-1)之重複單元之二胺成分(亦即,給予前述化學式(B-1)之結構之二胺成分、及給予前述化學式(B-2)之結構之二胺成分)列舉者。聚醯亞胺前驅體(1-2)中,給予該等其他重複單元之二胺成分可單獨使用1種也可組合使用多數種。As for the diamine component giving other repeating units, other aromatic or aliphatic diamines can be used, for example, and the diamine component giving other repeating units in the aforementioned polyfluorene imine precursor (1-1) is listed Those are the same. Further, a diamine component given to the repeating unit of the aforementioned chemical formula (1-1) (that is, a diamine component given to the structure of the aforementioned chemical formula (B-1), and a structure given to the aforementioned chemical formula (B-2) can be used. Of the diamine component). In the polyfluorene imide precursor (1-2), the diamine component to which these other repeating units are given may be used alone or in combination.
本發明之聚醯亞胺前驅體[聚醯亞胺前驅體(1-1)、聚醯亞胺前驅體(1-2)]中,前述化學式(1-1)中之X1 、X2 、 及前述化學式(1-2)中之X3 、X4 各自獨立地為氫、碳數1~6,較佳為碳數1~3之烷基、或碳數3~9之烷基矽基中之任一者。X1 、X2 、X3 、X4 可依後述製造方法,改變其官能基種類、及官能基之導入率。In the polyimide precursor [polyimide precursor (1-1), polyimide precursor (1-2)] of the present invention, X 1 and X 2 in the aforementioned chemical formula (1-1) and in the aforementioned chemical formula (1-2) X 3, X 4 are each independently hydrogen, 1 to 6 carbon atoms, preferably an alkyl group having 1 to 3 carbon atoms, the carbon atoms or alkyl of 3 to 9 silicon Any one of the bases. X 1 , X 2 , X 3 , and X 4 can be changed in the type of functional group and the introduction rate of functional group according to the production method described later.
X1 及X2 、X3 及X4 為氫時,聚醯亞胺之製造有容易之傾向。When X 1 and X 2 , X 3 and X 4 are hydrogen, the production of polyimide tends to be easy.
X1 及X2 、X3 及X4 為碳數1~6,較佳為碳數1~3之烷基時,聚醯亞胺前驅體之保存安定性有優異之傾向。於此情形,X1 及X2 、X3 及X4 宜為甲基或乙基更佳。When X 1 and X 2 , X 3 and X 4 are alkyl groups having 1 to 6 carbon atoms, and preferably 1 to 3 carbon atoms, the storage stability of the polyfluorene imide precursor tends to be excellent. In this case, X 1 and X 2 , X 3 and X 4 are more preferably methyl or ethyl.
X1 及X2 、X3 及X4 為碳數3~9之烷基矽基時,醯亞胺前驅體之溶解性有優良的傾向。於此情形。X1 及X2 、X3 及X4 宜為三甲基矽基或第三丁基二甲基矽基更佳。When X 1 and X 2 , X 3 and X 4 are alkylsilyl groups having 3 to 9 carbon atoms, the solubility of the fluorene imine precursor tends to be excellent. In this case. X 1 and X 2 , X 3 and X 4 are more preferably a trimethylsilyl group or a third butyldimethylsilyl group.
官能基之導入率不特別限定,導入烷基或烷基矽基時,可以X1 及X2 、X3 及X4 各為25%以上,較佳為50%以上,更佳為75%以上為烷基或烷基矽基。The introduction rate of the functional group is not particularly limited. When an alkyl group or an alkylsilyl group is introduced, X 1 and X 2 , X 3 and X 4 may each be 25% or more, preferably 50% or more, and more preferably 75% or more. Alkyl or alkylsilyl.
本發明之聚醯亞胺前驅體,藉由X1 與X2 、X3 與X4 採取之化學結構,可分類成:1)聚醯胺酸(X1 與X2 、X3 與X4 為氫)、2)聚醯胺酸酯(X1 與X2 之至少一部分為烷基、X3 與X4 之至少一部分為烷基)、3)4)聚醯胺酸矽酯(X1 與X2 之至少一部分為烷基矽基、X3 與X4 之至少一部分為烷基矽基)。並且,本發明之聚醯亞胺前驅體可就其分類利用以下製造方法輕易製造。惟本發明之聚醯亞胺前驅體之製造方法不限於以下之製造方法。Polyimide precursor of the present invention, by X 1 and X 2, X 3 and X 4 TAKEN chemical structure, can be classified into: 1) Polyamide acid (X 1 and X 2, X 3 and X 4 Is hydrogen), 2) polyamidate (at least a part of X 1 and X 2 is an alkyl group, at least a part of X 3 and X 4 is an alkyl group), 3) 4) polysilicic acid silicon ester (X 1 And at least a part of X 2 is an alkylsilyl group, and at least a part of X 3 and X 4 is an alkylsilyl group). In addition, the polyimide precursor of the present invention can be easily produced by the following production methods for its classification. However, the manufacturing method of the polyimide precursor of this invention is not limited to the following manufacturing methods.
1) 聚醯胺酸 本發明之聚醯亞胺前驅體,可藉由於溶劑中將作為四羧酸成分之四羧酸二酐與二胺成分以大致等莫耳,較佳為二胺成分相對於四羧酸成分之莫耳比[二胺成分之莫耳數/四羧酸成分之莫耳數]較佳為0.90~1.10,更佳為0.95~1.05之比例,例如於120℃以下之比較的低溫度邊抑制醯亞胺化邊反應,而適宜地以聚醯亞胺前驅體溶液組成物之形式獲得。1) Polyfluorinated acid The polyfluorinated imide precursor of the present invention can be obtained by using the tetracarboxylic dianhydride as the tetracarboxylic acid component and the diamine component in the solvent to approximately equal mole, preferably the diamine component is opposite. The molar ratio of the tetracarboxylic acid component [mole number of the diamine component / mole number of the tetracarboxylic acid component] is preferably 0.90 to 1.10, and more preferably 0.95 to 1.05, for example, a comparison below 120 ° C It can be obtained as a composition of a polyfluorene imine precursor solution while suppressing the reaction of fluorene imidization at a low temperature.
本發明之聚醯亞胺前驅體之合成方法不限定,但更具體而言可藉由將二胺溶解在有機溶劑,邊攪拌邊於此溶液中緩慢添加四羧酸二酐,於0~120℃,較佳為5~80℃之範圍攪拌1~72小時,以獲得聚醯亞胺前驅體。於80℃以上反應時,分子量會依存於聚合時之溫度履歷而變動,且因熱而進行醯亞胺化,故可能無法安定地製造聚醯亞胺前驅體。上述製造方法中,二胺與四羧酸二酐之添加順序容易提高聚醯亞胺前驅體之分子量,故較理想。又,上述製造方法之二胺與四羧酸二酐之添加順序也可顛倒,考量減少析出物之觀點,為較理想。The method for synthesizing the polyfluorene imide precursor of the present invention is not limited, but more specifically, by dissolving the diamine in an organic solvent, slowly adding tetracarboxylic dianhydride to this solution while stirring, at 0 to 120 Stir for 1 to 72 hours at a temperature in the range of preferably 5 to 80 ° C to obtain a polyimide precursor. When the reaction is carried out at 80 ° C or higher, the molecular weight varies depending on the temperature history during the polymerization and the fluorene imidization is performed due to heat. Therefore, the polyfluorene imide precursor may not be produced stably. In the above manufacturing method, the order of addition of the diamine and the tetracarboxylic dianhydride is likely to increase the molecular weight of the polyfluorene imide precursor, so it is preferable. In addition, the order of addition of diamine and tetracarboxylic dianhydride in the above-mentioned production method may be reversed, and it is preferable to consider the viewpoint of reducing precipitates.
又,四羧酸成分與二胺成分之莫耳比以二胺成分過量時,可視需要添加和二胺成分之過量莫耳數大致相當量之羧酸衍生物,以使四羧酸成分與二胺成分之莫耳比接近大致等當量。在此,羧酸衍生物宜為實質上不使聚醯亞胺前驅體溶液之黏度增加,亦即實質上不涉及分子鏈延長之四羧酸、或作為末端停止劑之作用之三羧酸及其酐、二羧酸及其酐等。In addition, when the molar ratio of the tetracarboxylic acid component and the diamine component is excessive by the diamine component, a carboxylic acid derivative having a molar amount approximately equal to the excess molar number of the diamine component may be added as needed to make the tetracarboxylic acid component and the diamine component The molar ratio of the amine component is approximately equivalent. Here, the carboxylic acid derivative is preferably a tetracarboxylic acid that does not substantially increase the viscosity of the polyfluorene imide precursor solution, that is, a tetracarboxylic acid that does not substantially involve the extension of the molecular chain, or a tricarboxylic acid that acts as a terminal stopper and Its anhydride, dicarboxylic acid and its anhydride.
2) 聚醯胺酸酯 藉由使四羧酸二酐和任意之醇反應,獲得二酯二羧酸後,和氯化試藥(亞硫醯氯、草醯氯等)反應,獲得二酯二羧醯氯。藉由將此二酯二羧醯氯與二胺於-20~120℃,較佳為-5~80℃之範圍攪拌1~72小時,可獲得聚醯亞胺前驅體。於80℃以上反應時,分子量會依存於聚合時之溫度履歷而變動,且因熱進行醯亞胺化,故可能無法安定地製造聚醯亞胺前驅體。又,也可藉由將二酯二羧酸與二胺使用磷系縮合劑、碳二亞胺縮合劑等進行脱水縮合,而簡便地獲得聚醯亞胺前驅體。2) Polyamic acid ester is obtained by reacting a tetracarboxylic dianhydride with an arbitrary alcohol to obtain a diester dicarboxylic acid, and then reacting it with a chlorinated reagent (such as thionyl chloride, chloracetin, etc.) to obtain a diester Dicarboxylic acid chloride. By stirring the diester dicarboxyphosphonium chloride and diamine at -20 to 120 ° C, preferably -5 to 80 ° C, for 1 to 72 hours, a polyfluorene imide precursor can be obtained. When the reaction is carried out at a temperature above 80 ° C, the molecular weight varies depending on the temperature history during the polymerization, and the fluorene imidization is performed due to heat. Therefore, the polyfluorene imide precursor may not be produced stably. Moreover, a polyimide precursor can also be obtained simply by carrying out dehydration condensation of a diester dicarboxylic acid and a diamine using a phosphorus-type condensation agent, a carbodiimide condensation agent, etc.
以此方法獲得之聚醯亞胺前驅體因為安定,可添加水、醇等溶劑並進行再沉澱等精製。Because the polyimide precursor obtained in this way is stable, solvents such as water and alcohol can be added and refined by reprecipitation.
3) 聚醯胺酸矽酯(間接法) 預先使二胺與矽基化劑反應,獲得矽基化的二胺。視需要,利用蒸餾等實施矽基化之二胺之精製。並且於經脱水之溶劑中先溶解經矽基化之二胺,邊攪拌邊緩慢添加四羧酸二酐,於0~120℃,較佳為5~80℃之範圍進行1~72小時攪拌,以獲得聚醯亞胺前驅體。於80℃以上反應時,分子量會依存於聚合時之溫度履歷而變動,且會因熱導致醯亞胺化進行,因此可能無法安定地製造聚醯亞胺前驅體。3) Polysiloxane (indirect method) The diamine is reacted with a silylating agent in advance to obtain a silylated diamine. If necessary, purification of silylated diamine is performed by distillation or the like. And in a dehydrated solvent, first dissolve the silylated diamine, and slowly add tetracarboxylic dianhydride while stirring. Stir for 1 to 72 hours at 0 to 120 ° C, preferably 5 to 80 ° C. To obtain a polyimide precursor. When the reaction is performed at a temperature of 80 ° C or higher, the molecular weight varies depending on the temperature history during polymerization, and the fluorene imidization progresses due to heat. Therefore, the polyfluorene imide precursor may not be produced stably.
在此使用之矽基化劑若使用不含氯之矽基化劑,無需將經矽基化之二胺精製,故較理想。不含氯原子之矽基化劑可列舉N,O-雙(三甲基矽基)三氟乙醯胺、N,O-雙(三甲基矽基)乙醯胺、六甲基二矽氮烷。不含氟原子且為低成本的觀點,N,O-雙(三甲基矽基)乙醯胺、六甲基二矽氮烷尤佳。If the silylating agent used here does not contain a chlorine-based silylating agent, it is not necessary to refine the silylated diamine, so it is ideal. Examples of the silylating agent not containing chlorine atom include N, O-bis (trimethylsilyl) trifluoroacetamide, N, O-bis (trimethylsilyl) acetamidamine, and hexamethyldisilazide. Nitrogen. From the viewpoint of not containing a fluorine atom and being a low cost, N, O-bis (trimethylsilyl) acetamide and hexamethyldisilazane are particularly preferable.
又,二胺之矽基化反應中,為了促進反應,可使用吡啶、哌啶、三乙胺等胺系觸媒。此觸媒可直接作為聚醯亞胺前驅體之聚合觸媒使用。In the silylation reaction of diamines, in order to promote the reaction, amine catalysts such as pyridine, piperidine, and triethylamine can be used. This catalyst can be used directly as a polymerization catalyst for polyimide precursors.
4) 聚醯胺酸矽酯(直接法) 將於1)的方法獲得之聚醯胺酸溶液與矽基化劑混合,於0~120℃,較佳為5~80℃之範圍攪拌1~72小時,以獲得聚醯亞胺前驅體。於80℃以上反應時,分子量會依存於聚合時之溫度履歷變動,且會因熱導致醯亞胺化進行,故有可能無法安定地製造聚醯亞胺前驅體。4) Polysiloxane (direct method) The polyamino acid solution obtained in the method of 1) is mixed with a silylating agent, and stirred at a temperature of 0 ~ 120 ° C, preferably 5 ~ 80 ° C, for 1 ~ 72 hours to obtain a polyimide precursor. When the reaction is carried out at a temperature of 80 ° C or higher, the molecular weight changes depending on the temperature history during polymerization, and the fluorene imidization progresses due to heat. Therefore, the polyfluorene imide precursor may not be produced stably.
在此使用之矽基化劑若使用不含氯之矽基化劑,則無需將經矽基化之聚醯胺酸、或獲得之聚醯亞胺精製,為較理想。不含氯原子之矽基化劑可列舉N,O-雙(三甲基矽基)三氟乙醯胺、N,O-雙(三甲基矽基)乙醯胺、六甲基二矽氮烷。考量不含氟原子且低成本之觀點,N,O-雙(三甲基矽基)乙醯胺、六甲基二矽氮烷尤佳。If the silylating agent used here is a silylating agent that does not contain chlorine, it is not necessary to refine the silylated polyamic acid or the obtained polyimide, which is ideal. Examples of the silylating agent not containing chlorine atom include N, O-bis (trimethylsilyl) trifluoroacetamide, N, O-bis (trimethylsilyl) acetamidamine, and hexamethyldisilazide. Nitrogen. Considering the viewpoint of containing no fluorine atom and low cost, N, O-bis (trimethylsilyl) acetamide and hexamethyldisilazane are particularly preferable.
前述製造方法皆可於有機溶劑中理想地進行,故其結果可輕易地獲得本發明之聚醯亞胺前驅體之清漆。The aforementioned manufacturing methods can all be performed ideally in an organic solvent, and as a result, the varnish of the polyimide precursor of the present invention can be easily obtained.
製備聚醯亞胺前驅體時使用之溶劑,例如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮、1,3-二甲基-2-咪唑啶酮、二甲基亞碸等非質子性溶劑較理想,尤其N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮為較佳,但只要原料單體成分與生成之聚醯亞胺前驅體會溶解,何種種類之溶劑皆可無問題地使用,故其結構無特殊限定。溶劑宜採用N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等醯胺溶劑、γ-丁內酯、γ-戊內酯、δ-戊內酯、γ-己內酯、ε-己內酯、α-甲基-γ-丁內酯等環狀酯溶劑、碳酸伸乙酯、碳酸伸丙酯等碳酸酯溶劑、三乙二醇等二醇系溶劑、間甲酚、對甲酚、3-氯苯酚、4-氯苯酚等苯酚系溶劑、苯乙酮、1,3-二甲基-2-咪唑啶酮、環丁碸、二甲基亞碸等較理想。再者,也可以使用其他一般的有機溶劑,亦即苯酚、鄰甲酚、乙酸丁酯、乙酸乙酯、乙酸異丁酯、丙二醇甲基乙酸酯、乙基賽珞蘇、丁基賽珞蘇、2-甲基賽珞蘇乙酸酯、乙基賽珞蘇乙酸酯、丁基賽珞蘇乙酸酯、四氫呋喃、二甲氧基乙烷、二乙氧基乙烷、二丁醚、二乙二醇二甲醚、甲基異丁酮、二異丁酮、環戊酮、環己酮、甲乙酮、丙酮、丁醇、乙醇、二甲苯、甲苯、氯苯、萜烯、礦精、石油腦系溶劑等。又,溶劑也可將多數種組合使用。Solvents used in the preparation of polyimide precursors, such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethyl Aprotic solvents such as methyl-2-imidazolidinone and dimethylsulfinyl are preferred, especially N, N-dimethylacetamidamine and N-methyl-2-pyrrolidone are preferred, but as long as the raw material monomer The components and the produced polyimide precursor will dissolve, and any kind of solvent can be used without any problem, so its structure is not particularly limited. As the solvent, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone and other amine solvents, γ-butyrolactone, γ-valerolactone, δ-pentyl Cyclic ester solvents such as lactone, γ-caprolactone, ε-caprolactone, α-methyl-γ-butyrolactone, carbonate solvents such as ethylene carbonate and propylene carbonate, triethylene glycol, etc. Diol solvents, phenol solvents such as m-cresol, p-cresol, 3-chlorophenol, 4-chlorophenol, acetophenone, 1,3-dimethyl-2-imidazolidone, cyclobutane Methyl fluorene is preferred. Furthermore, other general organic solvents can also be used, that is, phenol, o-cresol, butyl acetate, ethyl acetate, isobutyl acetate, propylene glycol methyl acetate, ethyl cyperidine, butyl cyperone Threon, 2-methylcythrethacetate, ethylcythrethacetate, butylcythrethacetate, tetrahydrofuran, dimethoxyethane, diethoxyethane, dibutyl ether , Diethylene glycol dimethyl ether, methyl isobutyl ketone, diisobutyl ketone, cyclopentanone, cyclohexanone, methyl ethyl ketone, acetone, butanol, ethanol, xylene, toluene, chlorobenzene, terpenes, mineral spirits , Petroleum brain solvent. A plurality of solvents may be used in combination.
本發明中,聚醯亞胺前驅體之對數黏度不特別限定,在30℃之濃度0.5g/dL之N,N-二甲基乙醯胺溶液中之對數黏度為0.2dL/g以上,更佳為0.3dL/g以上。對數黏度為0.2dL/g以上則聚醯亞胺前驅體之分子量高,獲得之聚醯亞胺之機械強度、耐熱性優異。In the present invention, the logarithmic viscosity of the polyfluorene imide precursor is not particularly limited, and the logarithmic viscosity in a N, N-dimethylacetamide solution at a concentration of 30 g at 0.5 g / dL is 0.2 dL / g or more, It is preferably 0.3 dL / g or more. If the logarithmic viscosity is 0.2 dL / g or more, the molecular weight of the polyimide precursor is high, and the obtained polyimide has excellent mechanical strength and heat resistance.
本發明中,聚醯亞胺前驅體之清漆至少含有本發明之聚醯亞胺前驅體[聚醯亞胺前驅體(1-1)及/或聚醯亞胺前驅體(1-2)]與溶劑。相對於溶劑與四羧酸成分與二胺成分之合計量,四羧酸成分與二胺成分之合計量為5質量%以上,較佳為10質量%以上,更佳為15質量%以上之比例。又,通常,相對於溶劑與四羧酸成分與二胺成分之合計量,四羧酸成分與二胺成分之合計量為60質量%以下,較佳為50質量%以下。此濃度係大致近似於起源於聚醯亞胺前驅體之固體成分濃度之濃度,若此濃度過低,例如在製造聚醯亞胺膜時會難以控制獲得之聚醯亞胺膜之膜厚。In the present invention, the polyimide precursor varnish contains at least the polyimide precursor of the present invention [polyimide precursor (1-1) and / or polyimide precursor (1-2)] With solvent. Relative to the total amount of the solvent, the tetracarboxylic acid component and the diamine component, the total amount of the tetracarboxylic acid component and the diamine component is 5% by mass or more, preferably 10% by mass or more, and more preferably 15% by mass or more. . The total amount of the tetracarboxylic acid component and the diamine component is usually 60% by mass or less, and preferably 50% by mass or less based on the total amount of the solvent, the tetracarboxylic acid component, and the diamine component. This concentration is approximately similar to the concentration of the solid component concentration of the polyimide precursor. If the concentration is too low, for example, it is difficult to control the film thickness of the polyimide film obtained when manufacturing the polyimide film.
本發明之聚醯亞胺前驅體之清漆使用之溶劑只要聚醯亞胺前驅體會溶解即無問題,其結構無特殊限定。溶劑可列舉N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮等醯胺溶劑、γ-丁內酯、γ-戊內酯、δ-戊內酯、γ-己內酯、ε-己內酯、α-甲基-γ-丁內酯等環狀酯溶劑、碳酸伸乙酯、碳酸伸丙酯等碳酸酯溶劑、三乙二醇等二醇系溶劑、間甲酚、對甲酚、3-氯苯酚、4-氯苯酚等苯酚系溶劑、苯乙酮、1,3-二甲基-2-咪唑啶酮、環丁碸、二甲基亞碸等較理想。再者,其他一般的有機溶劑,亦即苯酚、鄰甲酚、乙酸丁酯、乙酸乙酯、乙酸異丁酯、丙二醇甲基乙酸酯、乙基賽珞蘇、丁基賽珞蘇、2-甲基賽珞蘇乙酸酯、乙基賽珞蘇乙酸酯、丁基賽珞蘇乙酸酯、四氫呋喃、二甲氧基乙烷、二乙氧基乙烷、二丁醚、二乙二醇二甲醚、甲基異丁酮、二異丁酮、環戊酮、環己酮、甲乙酮、丙酮、丁醇、乙醇、二甲苯、甲苯、氯苯、萜烯、礦精、石油腦系溶劑等也可使用。又,可將它們中的多數種組合使用。又,聚醯亞胺前驅體之清漆之溶劑,可直接使用製備聚醯亞胺前驅體時使用之溶劑。The solvent used in the varnish of the polyimide precursor of the present invention is not a problem as long as the polyimide precursor is soluble, and its structure is not particularly limited. Examples of the solvent include amine solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, and N-methyl-2-pyrrolidone, γ-butyrolactone, γ-valerolactone, Cyclic ester solvents such as δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ-butyrolactone, carbonate solvents such as ethyl carbonate and propylene carbonate, triethyl Diol solvents such as diols, phenol solvents such as m-cresol, p-cresol, 3-chlorophenol, 4-chlorophenol, acetophenone, 1,3-dimethyl-2-imidazolidinone, cyclobutane Rhenium, dimethyl sulfene and the like are preferred. In addition, other general organic solvents, namely phenol, o-cresol, butyl acetate, ethyl acetate, isobutyl acetate, propylene glycol methyl acetate, ethyl cyperidine, butyl cyperidine, 2 -Methyl cyperidine acetate, ethyl cyperidine acetate, butyl cyperidine acetate, tetrahydrofuran, dimethoxyethane, diethoxyethane, dibutyl ether, diethyl Dimethyl glycol ether, methyl isobutyl ketone, diisobutyl ketone, cyclopentanone, cyclohexanone, methyl ethyl ketone, acetone, butanol, ethanol, xylene, toluene, chlorobenzene, terpenes, mineral spirits, petroleum brain A solvent or the like can also be used. Moreover, most of them can be used in combination. In addition, as the solvent of the varnish of the polyfluorene imide precursor, a solvent used in preparing the polyfluorene imide precursor can be directly used.
本發明中,聚醯亞胺前驅體之清漆之黏度(旋轉黏度)不特別限定,使用E型旋轉黏度計於溫度25℃、剪切速度20sec-1 測得之旋轉黏度為0.01~1000Pa・sec較理想,0.1~100Pa・sec更理想。又,視需要,也可賦予觸變性。於上述範圍之黏度時,實施塗佈、製膜時,容易操作且可抑制眼孔(eye hole),塗平性優異,可獲得良好的被膜。In the present invention, the viscosity (rotary viscosity) of the varnish of the polyimide precursor is not particularly limited. The rotational viscosity measured by using an E-type rotary viscometer at a temperature of 25 ° C and a shear rate of 20 sec -1 is 0.01 to 1000 Pa · sec More ideal, 0.1 ~ 100Pa ・ sec is more ideal. If necessary, thixotropy may be imparted. When the viscosity is within the above range, it is easy to handle and suppress eye holes during coating and film formation, and it is excellent in flatness and good film.
本發明之聚醯亞胺前驅體之清漆,視需要也可添加化學醯亞胺化劑(乙酸酐等酸酐、吡啶、異喹啉等胺化合物)、抗氧化劑、填料(二氧化矽等無機粒子等)、染料、顏料、矽烷偶聯劑等偶聯劑、底塗劑、阻燃材、消泡劑、塗平劑、流變性控制劑(流動輔助劑)、剝離劑等。According to the varnish of the polyfluorene imide precursor of the present invention, chemical fluorimide (anhydride compounds such as acetic anhydride, amine compounds such as pyridine, isoquinoline), antioxidants, and fillers (inorganic particles such as silicon dioxide) may be added as needed. Etc.), dyes, pigments, coupling agents such as silane coupling agents, primers, flame retardants, defoamers, leveling agents, rheology control agents (flow aids), release agents, etc.
本發明之第1態樣之聚醯亞胺(以下也稱為「聚醯亞胺(2-1)」),係含有前述化學式(2-1)表示之重複單元中之至少1種,且此化學式(2-1)表示之重複單元之合計含量相對於全部重複單元為50莫耳%以上之聚醯亞胺。亦即,本發明之聚醯亞胺(2-1)可以使用為了獲得本發明之聚醯亞胺前驅體(1-1)所使用之前述四羧酸成分與二胺成分獲得,理想之四羧酸成分與二胺成分也和前述本發明之聚醯亞胺前驅體(1-1)相同。The polyimide (hereinafter also referred to as "polyimide (2-1)") of the first aspect of the present invention contains at least one of the repeating units represented by the aforementioned chemical formula (2-1), and The total content of the repeating units represented by this chemical formula (2-1) is 50 mol% or more of polyimide with respect to the total repeating units. That is, the polyfluorene imine (2-1) of the present invention can be obtained by using the aforementioned tetracarboxylic acid component and diamine component used in order to obtain the polyfluorine imine precursor (1-1) of the present invention. The carboxylic acid component and the diamine component are also the same as the polyfluorene imine precursor (1-1) of the present invention.
又,前述化學式(2-1)對應於聚醯亞胺前驅體(1-1)之前述化學式(1-1),前述化學式(2-1)中之A21 、B21 各對應於前述化學式(1-1)中之A11 、B11 。The aforementioned chemical formula (2-1) corresponds to the aforementioned chemical formula (1-1) of the polyfluorene imine precursor (1-1), and each of A 21 and B 21 in the aforementioned chemical formula (2-1) corresponds to the aforementioned chemical formula. A 11 and B 11 in (1-1).
本發明之第2態樣之聚醯亞胺(以下也稱為「聚醯亞胺(2-2)」),係含有前述化學式(2-2)表示之重複單元中之至少1種的聚醯亞胺。化學式(2-2)表示之重複單元之合計含量不特別限定,宜相對於全部重複單元為50莫耳%以上較佳。亦即,本發明之聚醯亞胺(2-2),可以使用為了獲得本發明之聚醯亞胺前驅體(1-2)所使用之前述四羧酸成分與二胺成分而獲得,理想之四羧酸成分與二胺成分也和前述本發明之聚醯亞胺前驅體(1-2)相同。The polyimide (hereinafter also referred to as "polyimide (2-2)") of the second aspect of the present invention is a polyimide containing at least one of the repeating units represented by the aforementioned chemical formula (2-2).醯 imine. The total content of the repeating units represented by the chemical formula (2-2) is not particularly limited, and it is preferably 50 mol% or more relative to the total repeating units. That is, the polyfluorene imine (2-2) of the present invention can be obtained by using the aforementioned tetracarboxylic acid component and diamine component used in order to obtain the polyfluorene imine precursor (1-2) of the present invention. The tetracarboxylic acid component and the diamine component are also the same as the polyfluorene imide precursor (1-2) of the present invention.
又,前述化學式(2-2)對應於聚醯亞胺前驅體(1-2)之前述化學式(1-2),前述化學式(2-2)中之A22 、B22 分別對應於前述化學式(1-2)中之A12 、B12 。The aforementioned chemical formula (2-2) corresponds to the aforementioned chemical formula (1-2) of the polyimide precursor (1-2), and A 22 and B 22 in the aforementioned chemical formula (2-2) respectively correspond to the aforementioned chemical formula. A 12 and B 12 in (1-2).
本發明之聚醯亞胺(2-1)可藉由將如前述本發明之聚醯亞胺前驅體(1-1)進行脱水閉環反應(醯亞胺化反應)以理想地製造。本發明之聚醯亞胺(2-2),可藉由將如前述本發明之聚醯亞胺前驅體(1-2)予以脱水閉環反應(醯亞胺化反應)而理想地製造。醯亞胺化的方法不特別限定,可理想地採用公知之熱醯亞胺化、或化學醯亞胺化的方法。The polyfluorene imine (2-1) of the present invention can be ideally produced by subjecting the polyfluorene imine precursor (1-1) of the present invention as described above to a dehydration ring-closing reaction (fluorene imidization reaction). The polyfluorene imine (2-2) of the present invention can be ideally produced by subjecting the polyfluorene imine precursor (1-2) of the present invention as described above to a dehydration ring-closing reaction (fluorene imidization reaction). The method of fluorene imidization is not particularly limited, and a known method of thermal fluoridation or chemical fluoridation can be preferably used.
獲得之聚醯亞胺之形態,可適宜地列舉膜、聚醯亞胺膜與其他基材之疊層體、塗覆膜、粉末、珠粒、成型體、發泡體、及清漆等。As the form of the obtained polyimide, a film, a laminate of a polyimide film and another substrate, a coating film, a powder, beads, a molded body, a foam, and a varnish can be suitably cited.
本發明中,聚醯亞胺之對數黏度不特別限定,在30℃之濃度0.5g/dL之N,N-二甲基乙醯胺溶液中之對數黏度為0.2dL/g以上,更佳為0.4dL/g以上,尤佳為0.5dL/g以上。對數黏度為0.2dL/g以上則獲得之聚醯亞胺之機械強度、耐熱性優異。In the present invention, the logarithmic viscosity of polyfluoreneimine is not particularly limited, and the logarithmic viscosity in a N, N-dimethylacetamide solution at a concentration of 30 g at 0.5 g / dL is 0.2 dL / g or more, more preferably 0.4 dL / g or more, particularly preferably 0.5 dL / g or more. If the logarithmic viscosity is 0.2 dL / g or more, the obtained polyimide has excellent mechanical strength and heat resistance.
本發明中,聚醯亞胺之清漆至少含有本發明之聚醯亞胺與溶劑,相對於溶劑與聚醯亞胺之合計量,聚醯亞胺為5質量%以上,較佳為10質量%以上,更佳為15質量%以上,尤佳為20質量%以上之比例。此濃度若過低,例如製造聚醯亞胺膜時會難控制獲得之聚醯亞胺膜之膜厚。In the present invention, the polyimide varnish contains at least the polyimide and the solvent of the present invention, and the polyimide is 5% by mass or more, preferably 10% by mass, relative to the total amount of the solvent and the polyimide. Above, more preferably 15% by mass or more, particularly preferably 20% by mass or more. If the concentration is too low, for example, it may be difficult to control the film thickness of the obtained polyimide film when manufacturing the polyimide film.
本發明之聚醯亞胺之清漆使用之溶劑若聚醯亞胺可溶解,則無問題,其結構無特殊限定。溶劑可同樣使用前述本發明之聚醯亞胺前驅體之清漆使用之溶劑。If the solvent used for the polyimide varnish of the present invention is soluble, there is no problem and the structure is not particularly limited. The solvent may be the same as that used for the varnish of the polyimide precursor of the present invention.
本發明中,聚醯亞胺之清漆之黏度(旋轉黏度)不特別限定,使用E型旋轉黏度計於溫度25℃、剪切速度20sec-1 測得之旋轉黏度為0.01~1000Pa・sec較理想,0.1~100Pa・sec更理想。又,視需要,也可賦予觸變性。上述範圍之黏度則實施塗覆、製膜時,容易操作,又,眼孔(eye hole)受抑制,塗平性優異,可獲得良好的被膜。In the present invention, the viscosity (rotary viscosity) of the polyimide varnish is not particularly limited. It is preferable that the rotational viscosity measured by using an E-type rotary viscometer at a temperature of 25 ° C. and a shear rate of 20 sec -1 is 0.01 to 1000 Pa · sec. , 0.1 ~ 100Pa · sec is more ideal. If necessary, thixotropy may be imparted. The viscosity in the above range is easy to handle during coating and film formation. In addition, eye holes are suppressed, the flatness is excellent, and a good film can be obtained.
本發明之聚醯亞胺之清漆中,視需要亦可添加抗氧化劑、填料(二氧化矽等無機粒子等)、染料、顏料、矽烷偶聯劑等偶聯劑、底塗劑、阻燃材、消泡劑、塗平劑、流變性空制劑(流動輔助劑)、剝離劑等。In the polyimide varnish of the present invention, coupling agents such as antioxidants, fillers (inorganic particles such as silicon dioxide, etc.), dyes, pigments, silane coupling agents, primers, and flame-retardant materials may be added as needed. , Antifoaming agent, leveling agent, rheological air preparation (flow aid), release agent, etc.
由本發明之聚醯亞胺前驅體獲得之聚醯亞胺及本發明之聚醯亞胺不特別限定,製成膜時100℃到250℃之線熱膨脹係數較佳為45ppm/K以下,更佳為40ppm/K以下。線熱膨脹係數若大,和金屬等導體間之線熱膨脹係數之差距大,形成電路基板時有時會有翹曲增大等不良情形。The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention are not particularly limited, and the linear thermal expansion coefficient at 100 ° C to 250 ° C when the film is made is preferably 45 ppm / K or less, more preferably It is 40 ppm / K or less. If the coefficient of linear thermal expansion is large, the difference between the coefficient of linear thermal expansion and a conductor such as a metal is large, and there may be disadvantages such as increased warpage when forming a circuit board.
由本發明之聚醯亞胺前驅體獲得之聚醯亞胺及本發明之聚醯亞胺不特別限定,厚度10μm之膜之全光透射率(波長380nm~780nm之平均光透射率)較佳為70%以上,更佳為75%以上,又更佳為80%以上。於顯示器用途等使用時,全光透射率若低則光源需加強,會發生耗能之問題等。The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention are not particularly limited, and the total light transmittance (average light transmittance at a wavelength of 380 to 780 nm) of a film having a thickness of 10 μm is preferably Above 70%, more preferably above 75%, and even more preferably above 80%. When used in display applications, etc., if the total light transmittance is low, the light source needs to be strengthened, which may cause problems such as energy consumption.
又,由本發明之聚醯亞胺構成的膜,取決於用途,膜之厚度較佳為1μm~250μm,更佳為1μm~150μm,又更佳為1μm~50μm,尤佳為1μm~30μm。聚醯亞胺膜使用顯示器用途等透光之用途時,若聚醯亞胺膜太厚,會有透光率減低之虞。In addition, depending on the application, the film made of the polyfluorene imide of the present invention has a thickness of preferably 1 μm to 250 μm, more preferably 1 μm to 150 μm, still more preferably 1 μm to 50 μm, and even more preferably 1 μm to 30 μm. When the polyimide film is used in a light-transmitting application such as a display application, if the polyimide film is too thick, there is a possibility that the light transmittance may decrease.
由本發明之聚醯亞胺前驅體獲得之聚醯亞胺及本發明之聚醯亞胺不特別限定,為聚醯亞胺耐熱性之指標之5%重量減少溫度較佳為420℃以上,更佳為450℃以上。於聚醯亞胺上形成電晶體等在聚醯亞胺上形成氣體阻隔膜等時,耐熱性若低,則有時會在聚醯亞胺與阻隔膜之間因為聚醯亞胺之分解等伴隨的散逸氣體導致發生隆起。The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention are not particularly limited, and the 5% weight reduction temperature which is an index of the heat resistance of the polyimide is preferably 420 ° C or more, more Preferably it is above 450 ° C. When a transistor is formed on polyimide, a gas barrier film is formed on the polyimide, etc., if the heat resistance is low, the polyimide may be decomposed by the polyimide, etc. The accompanying fugitive gas causes the uplift to occur.
由本發明之聚醯亞胺前驅體獲得之聚醯亞胺及本發明之聚醯亞胺,例如可適用於顯示器用透明基板、觸控面板用透明基板、或太陽能電池用基板之用途。The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention can be applied to, for example, a transparent substrate for a display, a transparent substrate for a touch panel, or a substrate for a solar cell.
以下針對使用本發明之聚醯亞胺前驅體之聚醯亞胺膜/基材疊層體、或聚醯亞胺膜之製造方法之一例說明。惟不限於以下之方法。An example of a method for producing a polyimide film / substrate laminate or a polyimide film using the polyimide precursor of the present invention is described below. It is not limited to the following methods.
將本發明之聚醯亞胺前驅體之清漆流延在例如陶瓷(玻璃、矽、氧化鋁等)、金屬(銅、鋁、不銹鋼等)、耐熱塑膠膜(聚醯亞胺膜等)等基材,於真空中在氮氣等鈍性氣體中,或空氣中使用熱風或紅外線,於20~180℃,較佳為20~150℃之溫度範圍進行乾燥。其次可將獲得之聚醯亞胺前驅體膜於基材上、或將聚醯亞胺前驅體膜從基材上剝離,並於此膜端部固定住的狀態,於真空中,氮氣等鈍性氣體中,或空氣中,使用熱風或紅外線,例如於200~500℃,更佳為250~460℃左右之溫度進行加熱醯亞胺化,而製造聚醯亞胺膜/基材疊層體、或聚醯亞胺膜。又,為了防止獲得之聚醯亞胺膜氧化劣化,加熱醯亞胺化宜在真空中,或鈍性氣體中進行。加熱醯亞胺化之溫度若不太高,則於空氣中實施亦無妨。The varnish of the polyimide precursor of the present invention is cast on a base such as ceramic (glass, silicon, alumina, etc.), metal (copper, aluminum, stainless steel, etc.), heat-resistant plastic film (polyimide film, etc.), etc. The material is dried in a vacuum in an inert gas such as nitrogen or hot air or infrared in the air at a temperature range of 20 to 180 ° C, preferably 20 to 150 ° C. Secondly, the obtained polyimide precursor film can be detached from the substrate, or the polyimide precursor film can be peeled from the substrate, and the end of the film can be fixed. In a vacuum, nitrogen or the like is blunt. In hot gas or air, use hot air or infrared rays, for example, at 200 to 500 ° C, more preferably 250 to 460 ° C, to heat and imidize to produce a polyimide film / substrate laminate. , Or polyimide film. In addition, in order to prevent the oxidative degradation of the obtained polyfluorene imide film, it is preferable to perform the heating fluorimide in a vacuum or in an inert gas. If the temperature of the imidization by heating is not too high, it may be carried out in the air.
又,聚醯亞胺前驅體之醯亞胺化反應,也可將如前述利用加熱處理之加熱醯亞胺化替換成利用將聚醯亞胺前驅體於吡啶、三乙胺等3級胺存在下浸於含有乙酸酐等脱水環化試藥之溶液等化學性處理進行。又,藉由事先將該等脱水環化試藥投入到聚醯亞胺前驅體之清漆中並攪拌,將其流延在基材上並乾燥,以製得部分醯亞胺化的聚醯亞胺前驅體,將獲得之部分醯亞胺化的聚醯亞胺前驅體膜在基材上、或將聚醯亞胺前驅體膜從基材上剝離,並於此膜端部固定住的狀態,進一步實施如前述加熱處理,可獲得聚醯亞胺膜/基材疊層體、或聚醯亞胺膜。In addition, the fluorene imidization reaction of the polyfluorene imine precursor can also be replaced by the presence of the polyfluorene imine precursor in a tertiary amine such as pyridine, triethylamine, etc. Chemical treatment such as immersion in a solution containing a dehydration cyclization reagent such as acetic anhydride is performed. In addition, the dehydration cyclization reagents are put into a polyimide precursor varnish and stirred in advance, and the casted substance is cast on a substrate and dried to obtain a partially fluorinated polyimide. Amine precursor, a state in which the obtained partially imidized polyfluorene imide precursor film is on a substrate, or a polyimide precursor film is peeled from a substrate, and is fixed at the end of the film Further, if the heat treatment is performed as described above, a polyimide film / substrate laminate or a polyimide film can be obtained.
依此方式獲得之聚醯亞胺膜/基材疊層體、或聚醯亞胺膜,藉由在其單面或兩面形成導電性層,可以獲得可撓性的導電性基板。By forming a polyimide film / base material laminate or a polyimide film obtained in this manner, a flexible conductive substrate can be obtained by forming a conductive layer on one or both sides.
可撓性的導電性基板例如可依以下方法獲得。亦即就第一方法而言,不將聚醯亞胺膜/基材疊層體從基材剝離聚醯亞胺膜,而是在此聚醯亞胺膜表面利用濺鍍、蒸鍍、印刷等形成導電性物質(金屬或金屬氧化物、導電性有機物、導電性碳等)之導電層,製得導電性層/聚醯亞胺膜/基材之導電性疊層體。之後視需要,從基材將導電性層/聚醯亞胺膜疊層體剝離,藉此,獲得由導電性層/聚醯亞胺膜疊層體構成的透明且可撓性的導電性基板。A flexible conductive substrate can be obtained by the following method, for example. That is, in the first method, instead of peeling the polyimide film / substrate laminate from the base material, the polyimide film surface is sputtered, vapor-deposited, and printed. The conductive layer (such as metal or metal oxide, conductive organic substance, conductive carbon, etc.) is formed to form a conductive laminate of a conductive layer / polyimide film / base material. Thereafter, if necessary, the conductive layer / polyimide film laminate is peeled from the substrate, thereby obtaining a transparent and flexible conductive substrate composed of the conductive layer / polyimide film laminate. .
第二方法,可從聚醯亞胺膜/基材疊層體之基材將聚醯亞胺膜剝離,獲得聚醯亞胺膜,在此聚醯亞胺膜表面依和第一方法同樣方式形成導電性物質(金屬或金屬氧化物、導電性有機物、導電性碳等)之導電層,獲得由導電性層/聚醯亞胺膜疊層體、或導電性層/聚醯亞胺膜/導電性層疊層體構成之透明且可撓性的導電性基板。In the second method, the polyimide film can be peeled off from the base material of the polyimide film / substrate laminate to obtain a polyimide film. The surface of the polyimide film is the same as the first method. Form a conductive layer of a conductive substance (metal or metal oxide, conductive organic substance, conductive carbon, etc.) to obtain a conductive layer / polyimide film laminate, or a conductive layer / polyimide film / A transparent and flexible conductive substrate made of a conductive laminate.
又,第一、第二的方法中,視需要也可在聚醯亞胺膜之表面形成導電層前,利用濺鍍、蒸鍍、凝膠-溶膠法等形成水蒸氣、氧等氣體阻隔層、光調整層等無機層。In the first and second methods, if necessary, a gas barrier layer such as water vapor or oxygen may be formed by sputtering, vapor deposition, gel-sol method, or the like before forming a conductive layer on the surface of the polyimide film. , Light adjustment layer and other inorganic layers.
又,導電層可利用光微影法、各種印刷法、噴墨法等方法適宜地形成電路。The conductive layer can be formed into a circuit by a method such as photolithography, various printing methods, and inkjet methods.
依此方式獲得之本發明之基板,在由本發明之聚醯亞胺構成之聚醯亞胺膜之表面,視需要介隔氣體阻隔層、無機層形成有導電層之電路。此基板為可撓性,容易形成微細的電路。因此此基板適合作為顯示器用、觸控面板用、或太陽能電池用之基板。In the substrate of the present invention obtained in this manner, a circuit having a conductive layer formed between the gas barrier layer and the inorganic layer on the surface of the polyimide film composed of the polyimide of the present invention as required. This substrate is flexible and easily forms fine circuits. Therefore, this substrate is suitable as a substrate for a display, a touch panel, or a solar cell.
亦即,在此基板利用蒸鍍、各種印刷法、或噴墨法等進一步形成電晶體(無機電晶體、有機電晶體)並製造可撓性薄膜電晶體,適合作為顯示器用之液晶元件、EL元件、光電元件。That is, the substrate is further formed with a transistor (inorganic transistor, organic transistor) by vapor deposition, various printing methods, or inkjet methods, and a flexible thin-film transistor is manufactured. The substrate is suitable for use as a liquid crystal element for display and EL Element, optoelectronic element.
本發明之聚醯亞胺前驅體(1-2)及本發明之聚醯亞胺(2-2)之製造使用之四羧酸二酐即前述化學式(M-1)表示之四羧酸二酐、及前述化學式(M-4)表示之四羧酸二酐,係新穎之化合物。The tetracarboxylic dianhydride used in the production of the polyfluorene imide precursor (1-2) of the present invention and the polyfluorene imine (2-2) of the present invention is the tetracarboxylic acid dianhydride represented by the aforementioned chemical formula (M-1) The anhydride and the tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-4) are novel compounds.
以下針對前述化學式(M-1)表示之四羧酸二酐之製造方法記載。Hereinafter, the manufacturing method of the tetracarboxylic dianhydride represented by the said chemical formula (M-1) is described.
前述化學式(M-1)表示之四羧酸二酐,可參考日本特開2010-184898號公報、J. Chin. Chem. Soc. 1998, 45, 799、Tetrahedron 1998, 54, 7013, Helvetica. Chim. Acta. 2003, 86, 439、Angew. Chem. Int. Ed. Engl. 1989, 28, 1037等,依照例如:以下所示之反應方案合成。在此,係以R5 ’、R6 ’為-CH2 -之化學式(M-1)表示之四羧酸二酐,亦即3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮(DMADA)為例説明,但其他四羧酸二酐也可同樣地製造。For the tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-1), refer to Japanese Patent Application Laid-Open No. 2010-184898, J. Chin. Chem. Soc. 1998, 45, 799, Tetrahedron 1998, 54, 7013, Helvetica. Chim Acta. 2003, 86, 439, Angew. Chem. Int. Ed. Engl. 1989, 28, 1037, etc. were synthesized according to the reaction scheme shown below, for example. Here, it is a tetracarboxylic dianhydride represented by the chemical formula (M-1) in which R 5 ′ and R 6 ′ are —CH 2 —, that is, 3a, 4, 6, 6a, 9a, 10, 12, 12a- Octahydro-1H, 3H-4,12: 6,10-dimethyl bridge anthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone (DMADA) As an example, other tetracarboxylic dianhydrides can be produced similarly.
[化45]式中,R為也可以有取代基之烷基或芳基,R11 、R12 、R13 、R14 各自獨立地為碳數1~10之烷基。[Chemical 45] In the formula, R is an alkyl group or an aryl group which may have a substituent, and R 11 , R 12 , R 13 , and R 14 are each independently an alkyl group having 1 to 10 carbon atoms.
(第1步驟) 第1步驟中,合成R5 ’、R6 ’係-CH2 -之化學式(M-1)之四羧酸二酐(DMADA)時,係使對苯醌(BQ)與環戊二烯(CP)反應,合成1,4,4a,5,8,8a,9a,10a-八氫-1,4:5,8-二甲橋蒽-9,10-二酮(DNBQ)。合成R5 ’、R6 ’係-CH2 CH2 -之化學式(M-1)之四羧酸二酐時,在此,將環戊二烯(CP)替換成1,3-環己二烯,與BQ反應即可。(Step 1) In the first step, when the tetracarboxylic dianhydride (DMADA) of the chemical formula (M-1) of R 5 ′ and R 6 ′ -CH 2 -is synthesized, p-benzoquinone (BQ) and Cyclopentadiene (CP) reaction to synthesize 1,4,4a, 5,8,8a, 9a, 10a-octahydro-1,4: 5,8-dimethylmethanthracene-9,10-dione (DNBQ ). When synthesizing a tetracarboxylic dianhydride of the formula (M-1) in which R 5 ′ and R 6 ′ are —CH 2 CH 2 —, cyclopentadiene (CP) is replaced by 1,3-cyclohexadiene. The olefin can be reacted with BQ.
前述環戊二烯(或1,3-環己二烯等)之使用量相對於對苯醌(BQ)1莫耳,較佳為1.0~20莫耳,又更佳為1.5~10.0莫耳。The amount of the aforementioned cyclopentadiene (or 1,3-cyclohexadiene, etc.) is preferably 1.0 to 20 mol, and more preferably 1.5 to 10.0 mol relative to 1 mol of p-benzoquinone (BQ). .
本反應通常於有機溶劑中進行。使用之有機溶劑只要不妨礙反應則不特別限定,例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等醯胺類;N,N-二甲基咪唑啶酮等尿素類;二甲基亞碸、環丁碸等亞碸類;乙腈、丙腈等腈類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、第三丁醇等醇類;二異丙醚、二烷、四氫呋喃、環丙基甲醚等醚類;苯、甲苯、二甲苯等芳香族烴類;己烷、環己烷、庚烷、辛烷等脂肪族烴類;二氯甲烷、氯仿、1,2-二氯乙烷、氯苯等鹵化烴類;乙酸乙酯、乙酸丁基等酯類;丙酮、甲乙酮、甲基異丁酮等,較佳為醇類、芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction is usually performed in an organic solvent. The organic solvent used is not particularly limited as long as it does not interfere with the reaction, for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, and other amines; N, N -Ureas such as dimethyl imidazolidone; fluorenes such as dimethyl fluorene and cyclobutane; nitriles such as acetonitrile and propionitrile; methanol, ethanol, n-propanol, isopropanol, n-butanol, Alcohols such as tributanol; diisopropyl ether, di Ethers such as alkane, tetrahydrofuran, cyclopropyl methyl ether; aromatic hydrocarbons such as benzene, toluene, xylene; aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane; methylene chloride, chloroform, 1 , 2-dichloroethane, chlorobenzene and other halogenated hydrocarbons; ethyl acetate, butyl acetate and other esters; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., preferably alcohols, aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量,可利用反應液之均勻性、攪拌性適當調節,相對於BQ1g較佳為1~50g,又更佳為2~30g。The amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and is preferably 1 to 50 g, and more preferably 2 to 30 g, relative to BQ1 g.
本反應,例如可利用於有機溶劑中將BQ與CP混合並攪拌之等方法實施。此時之反應溫度較佳為0~150℃,又更佳為15~60℃,反應壓力無特殊限制。This reaction can be carried out by, for example, a method of mixing and stirring BQ and CP in an organic solvent. The reaction temperature at this time is preferably 0 to 150 ° C, and more preferably 15 to 60 ° C. The reaction pressure is not particularly limited.
(第2步驟) 第2步驟,係使第1步驟獲得之DNBQ與硼氫化鈉反應,合成1,4,4a,5,8,8a, 9,9a,10,10a-十氫-1,4:5,8-二甲橋蒽-9,10-二醇(DNHQ)。(Second step) The second step is to react the DNBQ obtained in the first step with sodium borohydride to synthesize 1,4,4a, 5,8,8a, 9,9a, 10,10a-decahydro-1,4 : 5,8-dimethyl bridge anthracene-9,10-diol (DNHQ).
前述硼氫化鈉之使用量,相對於DNBQ1莫耳,較佳為0.5~10莫耳,又更佳為1.5~5.0莫耳。The use amount of the aforementioned sodium borohydride is preferably 0.5 to 10 mol, and more preferably 1.5 to 5.0 mol relative to DNBQ1 mol.
本反應通常於有機溶劑中進行。使用之有機溶劑只要不妨礙反應即不特別限定,例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等醯胺類;N,N-二甲基咪唑啶酮等尿素類;二甲基亞碸、環丁碸等亞碸類;乙腈、丙腈等腈類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、第三丁醇等醇類;二異丙醚、二烷、四氫呋喃、環丙基甲醚等醚類;苯、甲苯、二甲苯等芳香族烴類;己烷、環己烷、庚烷、辛烷等脂肪族烴類;乙酸乙酯、乙酸丁基等酯類;丙酮、甲乙酮、甲基異丁酮等,較佳為醇類、醚類、芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction is usually performed in an organic solvent. The organic solvent used is not particularly limited as long as it does not hinder the reaction, for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, and other amines; N, N -Ureas such as dimethyl imidazolidone; fluorenes such as dimethyl fluorene and cyclobutane; nitriles such as acetonitrile and propionitrile; methanol, ethanol, n-propanol, isopropanol, n-butanol, Alcohols such as tributanol; diisopropyl ether, di Ethers such as alkane, tetrahydrofuran, cyclopropyl methyl ether; aromatic hydrocarbons such as benzene, toluene, xylene; aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane; ethyl acetate, butyl acetate And other esters; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., preferably alcohols, ethers, and aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量可因應反應液之均勻性、攪拌性適當調節,但相對於DNBQ1g,較佳為1~100g,又更佳為5~50g。The amount of the aforementioned organic solvent can be appropriately adjusted according to the uniformity and agitation of the reaction liquid, but it is preferably 1 to 100 g, and more preferably 5 to 50 g, relative to DNBQ1 g.
本反應可藉由例如在有機溶劑中將DNBQ與硼氫化鈉混合並攪拌等方法實施。此時之反應溫度較佳為-20~150℃,又更佳為0~50℃,反應壓力無特殊限制。This reaction can be performed by, for example, mixing and stirring DNBQ with sodium borohydride in an organic solvent. The reaction temperature at this time is preferably -20 to 150 ° C, and more preferably 0 to 50 ° C. The reaction pressure is not particularly limited.
(第3步驟) 第3步驟,係於鹼存在下使第2步驟獲得之DNHQ與甲烷磺醯氯反應,合成二甲烷磺酸1,4,4a,5,8,8a,9,9a,10,10a-十氫-1,4:5,8-二甲橋蒽-9,10-二酯(DNCMS;於此情形R係-CH3 [-SO2 R為甲磺醯基(-SO2 CH3 )])。也可將甲烷磺醯氯替換為使用其他之脂肪族磺醯氯或芳香族磺醯氯。(3rd step) The third step is to react the DNHQ obtained in the second step with methanesulfonyl chloride in the presence of a base to synthesize dimethylsulfonic acid 1,4,4a, 5,8,8a, 9,9a, 10 , 10a-decahydro-1,4: 5,8-dimethyl bridge anthracene-9,10-diester (DNCMS; in this case R is -CH 3 [-SO 2 R is methanesulfonyl (-SO 2 CH 3 )]). Methanesulfonyl chloride can also be replaced with other aliphatic sulfonyl chloride or aromatic sulfonyl chloride.
本反應使用鹼。本反應中,使用之鹼,例如:二丁胺、哌啶、2-甲哌啶等二級胺類;三乙胺、三丁胺等三級胺類;吡啶、甲基吡啶、二甲胺基吡啶等吡啶類;喹啉、異喹啉、甲基喹啉等喹啉類;氫化鈉、氫化鉀等鹼金屬氫化物;甲醇鈉、乙醇鈉、異丙醇鈉、第三丁醇鉀等鹼金屬醇鹽;碳酸鈉、碳酸鉀等鹼金屬碳酸鹽;碳酸氫鈉、碳酸氫鉀等鹼金屬碳酸氫鹽;氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物,較佳為三級胺類、吡啶類、喹啉類、鹼金屬碳酸鹽。又,該等鹼可單獨使用或混用二種以上。This reaction uses a base. The bases used in this reaction are, for example, secondary amines such as dibutylamine, piperidine, and 2-methylpiperidine; tertiary amines such as triethylamine, tributylamine; pyridine, methylpyridine, and dimethylamine Pyridines such as pyridine; quinolines such as quinoline, isoquinoline, and methylquinoline; alkali metal hydrides such as sodium hydride and potassium hydride; sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium tert-butoxide, etc. Alkali metal alkoxides; alkali metal carbonates such as sodium carbonate and potassium carbonate; alkali metal bicarbonates such as sodium bicarbonate and potassium bicarbonate; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, preferably tertiary amines Type, pyridine type, quinoline type, alkali metal carbonate. These bases can be used alone or in combination of two or more.
前述鹼之使用量,相對於DNHQ1莫耳較佳為0.01~200莫耳,又更佳為0.1~100莫耳。The amount of the aforementioned base to be used is preferably 0.01 to 200 moles, more preferably 0.1 to 100 moles relative to DNHQ1 mole.
本反應使用磺醯氯。本反應使用之磺醯氯,例如:甲烷磺醯氯、乙烷磺醯氯、三氟甲烷磺醯氯等脂肪族磺醯氯類;苯磺醯氯、甲苯磺醯氯、硝基苯磺醯氯等芳香族磺醯氯類,較佳為脂肪族磺醯氯。又,該等磺醯氯可單獨使用或混用二種以上。This reaction uses sulfonium chloride. Sulfasulfonium chloride used in this reaction, for example: aliphatic sulfonium chloride such as methanesulfonyl chloride, ethanesulfonyl chloride, trifluoromethanesulfonyl chloride; benzenesulfonyl chloride, tosylsulfonium chloride, nitrobenzenesulfonyl chloride Aromatic sulfonyl chloride, such as chlorine, is preferably an aliphatic sulfonyl chloride. In addition, these sulfonyl chlorides can be used alone or in combination of two or more.
前述磺醯氯之使用量,相對於DNHQ1莫耳,較佳為1.5~10莫耳,又更佳為1.8~5莫耳。The amount of sulfonyl chloride used is preferably 1.5 to 10 moles, and more preferably 1.8 to 5 moles, relative to DNHQ1 mole.
本反應通常於有機溶劑中進行。使用之有機溶劑只要不妨礙反應則不特別限定,例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等醯胺類;N,N-二甲基咪唑啶酮等尿素類;吡啶、甲基吡啶、二甲胺基吡啶等吡啶類;喹啉、異喹啉、甲基喹啉等喹啉類;二甲基亞碸、環丁碸等亞碸類;乙腈、丙腈等腈類;二異丙醚、二烷、四氫呋喃、環丙基甲醚等醚類;苯、甲苯、二甲苯等芳香族烴類;己烷、環己烷、庚烷、辛烷等脂肪族烴類;乙酸乙酯、乙酸丁基等酯類;丙酮、甲乙酮、甲基異丁酮等,較佳為吡啶類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction is usually performed in an organic solvent. The organic solvent used is not particularly limited as long as it does not interfere with the reaction, for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, and other amines; N, N -Ureas such as dimethylimidazolidone; pyridines such as pyridine, methylpyridine, dimethylaminopyridine; quinolines such as quinoline, isoquinoline, methylquinoline; dimethylsulfinium, cyclobutane Rhenium and other fluorenes; acetonitrile, propionitrile and other nitriles; diisopropyl ether, two Ethers such as alkane, tetrahydrofuran, cyclopropyl methyl ether; aromatic hydrocarbons such as benzene, toluene, xylene; aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane; ethyl acetate, butyl acetate And other esters; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., preferably pyridines. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量,可利用反應液之均勻性、攪拌性適當調節,相對於DNHQ1g較佳為1~200g,又更佳為10~100g。The amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 1 to 200 g, and more preferably 10 to 100 g, relative to 1 g of DNHQ.
本反應,例如可利用在有機溶劑中將DNHQ、鹼、磺醯氯混合並攪拌等方法進行。此時之反應溫度較佳為-20~150℃,又更佳為0~50℃,反應壓力無特殊限制。This reaction can be performed, for example, by mixing and stirring DNHQ, alkali, and sulfonium chloride in an organic solvent. The reaction temperature at this time is preferably -20 to 150 ° C, and more preferably 0 to 50 ° C. The reaction pressure is not particularly limited.
(第4步驟) 第4步驟,於鈀觸媒與銅化合物存在下使甲醇類與一氧化碳和第3步驟獲得之DNCMS反應,合成9,10-雙((甲基磺醯基)氧)十四氫-1,4:5,8-二甲橋蒽-2,3,6,7-四羧酸四甲酯(DNMTE;於此情形R11 ~R14 為甲基)。也可以將甲醇替換為使用所望之酯化合物所對應之其他之醇化合物。(Fourth step) In the fourth step, methanol was reacted with carbon monoxide and the DNCMS obtained in the third step in the presence of a palladium catalyst and a copper compound to synthesize 9,10-bis ((methylsulfonyl) oxy) 14 Hydrogen-1,4: 5,8-dimethyl bridge anthracene-2,3,6,7-tetracarboxylic acid tetramethyl ester (DNMTE; in this case R 11 to R 14 are methyl). Alternatively, methanol may be replaced with another alcohol compound corresponding to the desired ester compound.
本反應使用之醇化合物,例如:甲醇、乙醇、正丙醇、異丙醇、正丁醇、第二丁醇、第三丁醇、戊醇、甲氧基乙醇、乙氧基乙醇、乙二醇、三乙二醇等,較佳為甲醇、乙醇、正丙醇、異丙醇,又更佳為甲醇、乙醇、異丙醇。又,該等醇化合物可單獨使用或混用二種以上。Alcohol compounds used in this reaction, such as: methanol, ethanol, n-propanol, isopropanol, n-butanol, second butanol, third butanol, pentanol, methoxyethanol, ethoxyethanol, ethylene glycol Alcohol, triethylene glycol, and the like are preferably methanol, ethanol, n-propanol, and isopropanol, and more preferably methanol, ethanol, and isopropanol. These alcohol compounds may be used alone or in combination of two or more.
醇化合物之使用量,相對於DNCMS1g較佳為1~100g,又更佳為5~50g。The amount of the alcohol compound is preferably 1 to 100 g, and more preferably 5 to 50 g, relative to 1 g of DNCMS.
本反應使用鈀觸媒。本反應使用之鈀觸媒,只要含鈀即不特別限定,例如:氯化鈀、溴化鈀等鹵化鈀;乙酸鈀、草酸鈀等鈀有機酸鹽;硝酸鈀、硫酸鈀等鈀無機酸鹽;鈀載持於碳、氧化鋁等擔體而成的鈀碳、鈀氧化鋁等,較佳為氯化鈀、鈀碳。This reaction uses a palladium catalyst. The palladium catalyst used in the reaction is not particularly limited as long as it contains palladium, for example: palladium halide such as palladium chloride and palladium bromide; palladium organic acid salts such as palladium acetate and oxalate; palladium inorganic acid salts such as palladium nitrate and palladium sulfate ; Palladium carbon, palladium alumina, and the like supported by palladium supported on carbon, alumina, and the like, preferably palladium chloride and palladium carbon.
前述鈀觸媒之使用量,相對於DNCMS1莫耳較佳為0.001~1莫耳,又更佳為0.01~0.5莫耳。The use amount of the aforementioned palladium catalyst is preferably 0.001 to 1 mol, and more preferably 0.01 to 0.5 mol relative to DNCMS1 mol.
本反應使用銅化合物。本反應使用之銅化合物,例如:氧化銅(I)、氯化銅(I)、溴化銅(I)等一價之銅化合物、氧化銅(II)、氯化銅(II)、溴化銅(II)等二價之銅化合物等,較佳為二價之銅化合物,又更佳為氯化銅(II)。又,該等銅化合物可單獨使用或混用二種以上。This reaction uses a copper compound. Copper compounds used in this reaction, such as: copper (I) oxide, copper (I) chloride, copper (I) bromide and other equivalent copper compounds, copper (II) oxide, copper (II) chloride, bromide A divalent copper compound such as copper (II), etc., is preferably a divalent copper compound, and more preferably copper (II) chloride. Moreover, these copper compounds can be used individually or in mixture of 2 or more types.
前述銅化合物之使用量,相對於DNCMS1莫耳較佳為1.0~50莫耳,又更佳為4.0~20莫耳。The use amount of the aforementioned copper compound is preferably 1.0 to 50 mol, and more preferably 4.0 to 20 mol relative to DNCMS1 mol.
本反應也可使用前述醇化合物以外之有機溶劑。使用之有機溶劑只要不妨礙反應則不特別限定,例如:脂肪族羧酸類(例如:甲酸、乙酸、丙酸、三氟乙酸等)、有機磺酸類(例如:甲磺酸、三氟甲磺酸等)、酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)等。較佳為脂肪族烴類、芳香族烴類、鹵化烴類、鹵化芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。In this reaction, an organic solvent other than the aforementioned alcohol compound may be used. The organic solvent used is not particularly limited as long as it does not interfere with the reaction, for example: aliphatic carboxylic acids (for example, formic acid, acetic acid, propionic acid, trifluoroacetic acid, etc.), organic sulfonic acids (for example, methanesulfonic acid, trifluoromethanesulfonic acid) Etc.), ketones (for example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), ammonium (for example: N , N-dimethylformamidine, N, N-dimethylacetamide, N-methylpyrrolidone, etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. : Diethyl ether, diisopropyl ether, tetrahydrofuran, di Alkanes, 1,2-methylene dioxobenzene, etc.), aromatic hydrocarbons (e.g., benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (e.g., chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), and the like. Preferred are aliphatic hydrocarbons, aromatic hydrocarbons, halogenated hydrocarbons, and halogenated aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量,可利用反應液之均勻性、攪拌性適當調節,相對於DNCMS1g,較佳為1~100g,又更佳為5~50g。The amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 1 to 100 g, and more preferably 5 to 50 g, relative to 1 g of DNCMS.
本反應,例如可利傭有機溶劑中將DNCMS及醇化合物、鈀觸媒與銅化合物混合,於一氧化碳之氣體環境下攪拌等方法進行。此時之反應溫度較佳為-20~100℃,又更佳為0~50℃,反應壓力無特殊限制。This reaction can be performed, for example, by mixing DNCMS, an alcohol compound, a palladium catalyst, and a copper compound in a organic solvent, and stirring under a carbon monoxide gas environment. The reaction temperature at this time is preferably -20 to 100 ° C, and more preferably 0 to 50 ° C. The reaction pressure is not particularly limited.
(第5步驟) 第5步驟中,藉由第4步驟獲得之DNMTE之脱甲烷磺醯基化反應,合成1,2,3,4,4a,5,6,7,8,9a-十氫-1,4:5,8-二甲橋蒽-2,3,6,7-四羧酸四甲酯(DMHAE)。此第5步驟獲得之化合物,為前述化學式(M-3)表示之四酯化合物,係新穎之化合物。(Fifth step) In the fifth step, 1,2,3,4,4a, 5,6,7,8,9a-decahydro was synthesized by the demethane sulfonylation reaction of DNMTE obtained in the fourth step. -1,4: 5,8-dimethyl bridge anthracene-2,3,6,7-tetracarboxylic acid tetramethyl ester (DMHAE). The compound obtained in this step 5 is a tetraester compound represented by the aforementioned chemical formula (M-3) and is a novel compound.
本反應,可利用例如將DNMTE於有機溶劑中,視需要邊加熱邊攪拌等方法實施。此時之反應溫度較佳為-20~200℃,又更佳為25~180℃,反應壓力無特殊限制。This reaction can be carried out by, for example, using DNMTE in an organic solvent, and stirring while heating as necessary. The reaction temperature at this time is preferably -20 to 200 ° C, and more preferably 25 to 180 ° C. The reaction pressure is not particularly limited.
本反應,即使在反應液中不添加鹼也可藉由加熱並攪拌以進行,但為了捕捉副生之強酸性之甲磺酸,宜使用鹼。使用之鹼只要不妨礙反應則不特別限定,例如:二丁胺、哌啶、2-甲哌啶等二級胺類;三乙胺、三丁胺等三級胺類;吡啶、甲基吡啶、二甲胺基吡啶等吡啶類;喹啉、異喹啉、甲基喹啉等喹啉類;氫化鈉、氫化鉀等鹼金屬氫化物;甲醇鈉、乙醇鈉、異丙醇鈉、第三丁醇鉀等鹼金屬醇鹽;碳酸鈉、碳酸鉀、碳酸鋰等鹼金屬碳酸鹽;碳酸氫鈉、碳酸氫鉀等鹼金屬碳酸氫鹽;氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物,較佳為三級胺類、吡啶類、喹啉類、鹼金屬碳酸鹽。又,該等鹼可單獨使用或混用二種以上。This reaction can be carried out by heating and stirring even without adding a base to the reaction solution, but in order to capture by-product strong acidic methanesulfonic acid, a base is preferably used. The base used is not particularly limited as long as it does not interfere with the reaction, for example: secondary amines such as dibutylamine, piperidine, 2-methylpiperidine; tertiary amines such as triethylamine, tributylamine; pyridine, methylpyridine , Pyridines such as dimethylaminopyridine; quinolines such as quinoline, isoquinoline, methylquinoline; alkali metal hydrides such as sodium hydride, potassium hydride; sodium methoxide, sodium ethoxide, sodium isopropoxide, third Alkali metal alkoxides such as potassium butoxide; alkali metal carbonates such as sodium carbonate, potassium carbonate, and lithium carbonate; alkali metal bicarbonates such as sodium hydrogen carbonate and potassium bicarbonate; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide , Preferably tertiary amines, pyridines, quinolines, alkali metal carbonates. These bases can be used alone or in combination of two or more.
前述鹼之使用量,相對於DNMTE1莫耳,較佳為1.5~5莫耳,又更佳為1.8~3莫耳。The amount of the aforementioned base to be used is preferably 1.5 to 5 mol, and more preferably 1.8 to 3 mol, relative to 1 Dmol.
本反應通常於有機溶劑中進行。使用之有機溶劑只要不妨礙反應則不特別限定,例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等醯胺類;N,N-二甲基咪唑啶酮等尿素類;二甲基亞碸、環丁碸等亞碸類;乙腈、丙腈等腈類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、第三丁醇等醇類;二異丙醚、二烷、四氫呋喃、環丙基甲醚等醚類;苯、甲苯、二甲苯等芳香族烴類;己烷、環己烷、庚烷、辛烷等脂肪族烴類;二氯甲烷、氯仿、1,2-二氯乙烷、氯苯等鹵化烴類;乙酸乙酯、乙酸丁酯等酯類;丙酮、甲乙酮、甲基異丁酮等,較佳為醯胺類、尿素類、腈類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction is usually performed in an organic solvent. The organic solvent used is not particularly limited as long as it does not interfere with the reaction, for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethyl Imidamines such as isobutylphosphoniumamine; Ureas such as N, N-dimethylimidazolidone; Subfluorenes such as dimethylsulfinium and cyclobutyrium; nitriles such as acetonitrile and propionitrile; methanol, ethanol, Alcohols such as n-propanol, isopropanol, n-butanol, and tertiary butanol; diisopropyl ether, two Ethers such as alkane, tetrahydrofuran, cyclopropyl methyl ether; aromatic hydrocarbons such as benzene, toluene, xylene; aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane; methylene chloride, chloroform, 1 , 2-dichloroethane, chlorobenzene and other halogenated hydrocarbons; ethyl acetate, butyl acetate and other esters; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., preferably amines, ureas, nitriles. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量,可利用反應液之均勻性、攪拌性適當調節,相對於DNMTE1g較佳為1~100g,又更佳為2~50g。The amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and is preferably 1 to 100 g, and more preferably 2 to 50 g, relative to 1 g of DNMTE.
(第6步驟) 第6步驟,藉由第5步驟獲得之DMHAE之芳香族化反應(氧化反應),合成1,2,3,4,5,6,7,8-八氫-1,4:5,8-二甲橋蒽-2,3,6,7-四羧酸四甲酯(DMAME)。此第6步驟獲得之化合物,為前述化學式(M-2)表示之四酯化合物,係新穎之化合物。(Step 6) In step 6, 1,2,3,4,5,6,7,8-octahydro-1,4 is synthesized from the aromaticization reaction (oxidation reaction) of DMHAE obtained in step 5. : Tetramethyl 5,8-dimethyl bridge anthracene-2,3,6,7-tetracarboxylic acid (DMAME). The compound obtained in this step 6 is a tetraester compound represented by the aforementioned chemical formula (M-2), and is a novel compound.
本反應例如可利用將DMHAE與用以芳香族化之氧化劑於溶劑中視需要邊加熱邊攪拌等方法進行。此時之反應溫度較佳為25~150℃,又更佳為40~120℃,反應壓力無特殊限制。This reaction can be performed, for example, by a method such as stirring DMHAE and an aromatic oxidizing agent in a solvent while heating as necessary. The reaction temperature at this time is preferably 25 to 150 ° C, and more preferably 40 to 120 ° C. The reaction pressure is not particularly limited.
本反應中,為了芳香族化,使用氧化劑。使用之氧化劑只要是不妨礙反應者即不特別限定,例如可使用2,3-二氯-5,6-二氰基-對苯醌、四氯苯醌等苯醌類。In this reaction, an oxidizing agent is used for aromatization. The oxidizing agent used is not particularly limited as long as it does not interfere with the reaction, and for example, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone and tetrachlorobenzoquinone can be used.
前述氧化劑之使用量,相對於DMHAE1莫耳較佳為0.5~5莫耳,又更佳為0.8~3莫耳。The amount of the aforementioned oxidizing agent is preferably 0.5 to 5 moles, and more preferably 0.8 to 3 moles relative to DMHAE1 mole.
本反應通常係於溶劑中進行。使用之溶劑只要不妨礙反應即不特別限定,例如:水;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等醯胺類;N,N-二甲基咪唑啶酮等尿素類;乙腈、丙腈等腈類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、第三丁醇等醇類;二異丙醚、二烷、四氫呋喃、環丙基甲醚等醚類;苯、甲苯、二甲苯等芳香族烴類;己烷、環己烷、庚烷、辛烷等脂肪族烴類;二氯甲烷、氯仿、1,2-二氯乙烷、氯苯等鹵化烴類;乙酸乙酯、乙酸丁酯等酯類;丙酮、甲乙酮、甲基異丁酮等,較佳為芳香族烴類、鹵化烴類、醚類、醇類、水。又,該等溶劑可單獨使用或混用二種以上。This reaction is usually carried out in a solvent. The solvent used is not particularly limited as long as it does not hinder the reaction, for example: water; N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethyl Imidamines such as isobutylammonium amine; ureas such as N, N-dimethylimidazolidone; nitriles such as acetonitrile and propionitrile; methanol, ethanol, n-propanol, isopropanol, n-butanol, Alcohols such as tributanol; diisopropyl ether, di Ethers such as alkane, tetrahydrofuran, cyclopropyl methyl ether; aromatic hydrocarbons such as benzene, toluene, xylene; aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane; methylene chloride, chloroform, 1 2,2-dichloroethane, chlorobenzene and other halogenated hydrocarbons; ethyl acetate, butyl acetate and other esters; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., preferably aromatic hydrocarbons, halogenated hydrocarbons, ethers Alcohol, alcohol, water. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量,可利用反應液之均勻性、攪拌性予以適當調節,但相對於DMHAE1g較佳為1~100g,又更佳為2~50g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, but it is preferably 1 to 100 g, and more preferably 2 to 50 g, relative to 1 g of DMHAE.
(第7步驟) 第7步驟中,利用第6步驟獲得之DMAME之無水化反應,合成3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮(DMADA)。此第7步驟獲得之化合物係前述化學式(M-1)表示之四羧酸二酐。(Step 7) In the seventh step, 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H-4,12 are synthesized by the anhydrous reaction of DMAME obtained in the sixth step: 6,10-dimethylmethanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone (DMADA). The compound obtained in this seventh step is a tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-1).
本反應可利用例如將DMAME於酸觸媒存在下於有機溶劑中邊加熱邊攪拌等方法以進行。此時之反應溫度較佳為50~130℃,又更佳為80~120℃,反應壓力無特殊限制。This reaction can be performed by a method such as stirring DMAME in an organic solvent in the presence of an acid catalyst while heating. The reaction temperature at this time is preferably 50 to 130 ° C, and more preferably 80 to 120 ° C. The reaction pressure is not particularly limited.
本反應使用酸觸媒。本反應使用之酸觸媒只要是酸即不特別限制,例如:鹽酸、氫溴酸、氫碘酸、硫酸、氯硫酸、硝酸等無機酸類;甲磺酸、苯磺酸、對甲苯磺酸等有機磺酸類;氯乙酸、三氟乙酸等鹵化羧酸類、離子交換樹脂、硫酸矽膠、沸石、酸性氧化鋁等,較佳為無機酸類、有機磺酸類,又更佳為有機磺酸類。又,該等酸可單獨使用或混用二種以上。This reaction uses an acid catalyst. The acid catalyst used in this reaction is not particularly limited as long as it is an acid, for example: hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, chlorosulfuric acid, nitric acid and other inorganic acids; methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, etc. Organic sulfonic acids; halogenated carboxylic acids such as chloroacetic acid and trifluoroacetic acid, ion exchange resins, silica gel, zeolites, acid alumina, etc., preferably inorganic acids, organic sulfonic acids, and more preferably organic sulfonic acids. These acids can be used alone or in combination of two or more.
前述酸觸媒之使用量,相對於DMAME1莫耳較佳為0.0001~0.1莫耳,更佳為0.001~0.05莫耳。The amount of the aforementioned acid catalyst is preferably 0.0001 to 0.1 mole, and more preferably 0.001 to 0.05 mole relative to DMAME1 mole.
本反應宜於溶劑中進行較佳。使用之溶劑宜為甲酸、乙酸、丙酸等有機酸溶劑為較佳。又,該等溶劑可單獨使用或混用二種以上。This reaction is preferably carried out in a solvent. The solvent used is preferably an organic acid solvent such as formic acid, acetic acid, and propionic acid. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量,可利用反應液之均勻性、攪拌性予以適當調節,相對於DMAME1g,較佳為0.1~100g,又更佳為1~10g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.1 to 100 g, and more preferably 1 to 10 g, relative to 1 g of DMAME.
各反應之詳情依實施例説明,但該技術領域中有通常知識者可以變更溶劑、進料量、反應條件等,又,各反應之結束後,可利用例如:過濾、萃取、蒸餾、昇華、再結晶、管柱層析等一般的方法實施反應產物之單離、精製等。The details of each reaction are explained according to the examples, but those with ordinary knowledge in the technical field can change the solvent, feed amount, reaction conditions, etc. After the completion of each reaction, for example, filtration, extraction, distillation, sublimation, Recrystallization, column chromatography and other general methods are used to isolate and purify the reaction product.
以下說明前述化學式(M-4)表示之四羧酸二酐之製造方法。A method for producing the tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-4) will be described below.
前述化學式(M-4)表示之四羧酸二酐,可參考Helv. Chim. Acta. 1975, 58, 160, Macromolecules 1993, 26, 3490等,例如依以下所示之反應方案合成。For the tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-4), reference may be made to Helv. Chim. Acta. 1975, 58, 160, Macromolecules 1993, 26, 3490, and the like, for example, according to the reaction scheme shown below.
[化46]式中,X11 、X12 各自獨立地為-F、-Cl、-Br、或-I,R21 、R22 、R23 、R24 各自獨立地為碳數1~10之烷基。[Chemical 46] In the formula, X 11 and X 12 are each independently -F, -Cl, -Br, or -I, and R 21 , R 22 , R 23 , and R 24 are each independently an alkyl group having 1 to 10 carbon atoms.
(第1步驟) 第1步驟中,使5-降莰烯-2,3-二羧酸酐(NA)與1,3-丁二烯反應,合成3a,4,4a,5,8,8a,9,9a-八氫-4,9-甲橋萘并[2,3-c]呋喃-1,3-二酮(OMNA)。此第1步驟獲得之化合物係前述化學式(M-7)表示之二羧酸酐,為新穎之化合物。(First step) In the first step, 5-norbornene-2,3-dicarboxylic anhydride (NA) is reacted with 1,3-butadiene to synthesize 3a, 4,4a, 5,8,8a, 9,9a-octahydro-4,9-methanonaphtho [2,3-c] furan-1,3-dione (OMNA). The compound obtained in this first step is a dicarboxylic anhydride represented by the aforementioned chemical formula (M-7) and is a novel compound.
本反應可藉由例如在高壓釜等耐壓容器中裝入NA,導入1,3-丁二烯,加熱並攪拌等方法以進行。此時之反應溫度較佳為80~220℃,又更佳為100~180℃,反應壓力無特殊限制。This reaction can be carried out by, for example, charging NA into a pressure-resistant container such as an autoclave, introducing 1,3-butadiene, heating and stirring. The reaction temperature at this time is preferably 80 to 220 ° C, and more preferably 100 to 180 ° C. The reaction pressure is not particularly limited.
前述1,3-丁二烯之使用量,相對於NA1莫耳,較佳為0.5~5莫耳,又更佳為0.8~3莫耳。The use amount of the aforementioned 1,3-butadiene is preferably 0.5 to 5 mol, and more preferably 0.8 to 3 mol relative to NA1 mol.
本反應可使用也可不使用有機溶劑。使用之溶劑只要不妨礙反應即不特別限定,例如:酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧基苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)、苯酚類(苯酚、甲基苯酚、對氯苯酚等)等。較佳為使用脂肪族烴類、及芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction may or may not use an organic solvent. The solvent to be used is not particularly limited as long as it does not interfere with the reaction, for example: ketones (for example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane Alkanes, etc.), amidines (for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethylisobutylamidine Etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. diethyl ether, diisopropyl ether, tetrahydrofuran, diamine Alkanes, 1,2-methylenedioxybenzene, etc.), aromatic hydrocarbons (e.g., benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (e.g., chlorobenzene, 1,2-dichlorobenzene, etc.) , 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (for example: nitrobenzene, etc.), halogenated hydrocarbons (for example: dichloromethane, chloroform, tetrachloride) Carbon, 1,2-dichloroethane, etc.), carboxylic acid esters (e.g., ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (e.g., acetonitrile, propionitrile, benzonitrile, etc.), Phosphonium (for example: dimethyl fluorene and the like), fluorene (for example: cyclobutyl fluorene and the like), phenols (phenol, methylphenol, p-chlorophenol, etc.) and the like. It is preferable to use aliphatic hydrocarbons and aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
使用有機溶劑時,前述有機溶劑之使用量可利用反應液之均勻性、攪拌性予以適當調節,相對於NA1g,較佳為0.1~100g,又更佳為1~50g。When an organic solvent is used, the amount of the organic solvent used can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.1 to 100 g, and more preferably 1 to 50 g, relative to NA 1 g.
(第2步驟) 第2步驟中,使第1步驟獲得之OMNA與作為二鹵化劑之溴反應,合成6,7-二溴十氫-4,9-甲橋萘并[2,3-c]呋喃-1,3-二酮(DBDNA;於此情形X11 、X12 為-Br)。也可將溴替換為使用後述其他的二鹵化劑。此第2步驟獲得之化合物係前述化學式(M-6)表示之二鹵代二羧酸酐,為新穎之化合物。(Second step) In the second step, the OMNA obtained in the first step is reacted with bromine as a dihalogenating agent to synthesize 6,7-dibromodecahydro-4,9-methacylnaphtho [2,3-c ] Furan-1,3-dione (DBDNA; in this case X 11 and X 12 are -Br). The bromine may be replaced with another dihalogenating agent described later. The compound obtained in this second step is a dihalodicarboxylic anhydride represented by the aforementioned chemical formula (M-6) and is a novel compound.
本反應可利用例如將OMNA與二鹵化劑在有機溶劑中混合並攪拌等方法以進行。此時之反應溫度較佳為-100~50℃,又更佳為-80~30℃,反應壓力無特殊限制。This reaction can be performed by, for example, mixing and stirring OMNA and a dihalogenating agent in an organic solvent. The reaction temperature at this time is preferably -100 to 50 ° C, and more preferably -80 to 30 ° C. The reaction pressure is not particularly limited.
本反應使用溴等二鹵化劑。本反應使用之二鹵化劑只要可以將烯烴予以二鹵化即不特別限定,可以列舉氟、氯、溴、碘等鹵素類、及其吡啶鹽、銨鹽、三溴吡啶、三溴苄基三甲基銨等三溴化物鹽、氟化氯、氯化溴、氯化碘、溴化碘、三溴化碘等鹵化合物、及其吡啶鹽、銨鹽等,較佳為鹵素類,尤佳為溴。This reaction uses a dihalogenating agent such as bromine. The dihalogenating agent used in this reaction is not particularly limited as long as it can dihalide an olefin, and examples thereof include halogens such as fluorine, chlorine, bromine, and iodine, and pyridine salts, ammonium salts, tribromopyridine, and tribromobenzyltrimethyl. Tribromide salts such as ammonium chloride, halogen compounds such as chlorine fluoride, bromine chloride, iodine chloride, iodine bromide, and iodine tribromide, and their pyridine salts, ammonium salts, etc., are preferably halogens, particularly preferably bromine.
前述二鹵化劑之使用量,相對於OMNA1莫耳,較佳為0.5~5莫耳,又更佳為0.8~2莫耳。The amount of the aforementioned dihalogenating agent is preferably 0.5 to 5 moles, and more preferably 0.8 to 2 moles, relative to OMNA1 mole.
本反應通常於有機溶劑中進行。使用之溶劑只要不妨礙反應即不特別限定,例如:酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)、苯酚類(苯酚、甲基苯酚、對氯苯酚)等。較佳為脂肪族烴類、鹵化烴類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction is usually performed in an organic solvent. The solvent to be used is not particularly limited as long as it does not interfere with the reaction, for example: ketones (for example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane Alkanes, etc.), amidines (for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethylisobutylamidine Etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. diethyl ether, diisopropyl ether, tetrahydrofuran, diamine Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), phenols (phenol, methylphenol, p-chlorophenol), and the like. Preferred are aliphatic hydrocarbons and halogenated hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量,可利用反應液之均勻性、攪拌性予以適當調節,相對於OMNA1g,較佳為0.1~100g,又更佳為1~50g。The amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.1 to 100 g, and more preferably 1 to 50 g, relative to 1 g of OMNA.
(第3步驟) 第3步驟中,使第2步驟獲得之DBDNA與馬來酸酐反應,合成3a,4,4a,5,5a,8a,9,9a,10,10a-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(EEMDA)。此第3步驟獲得之化合物為R7 係-CH=CH-之前述化學式(M-4)表示之四羧酸二酐,為新穎之化合物。(Step 3) In step 3, the DBDNA obtained in step 2 is reacted with maleic anhydride to synthesize 3a, 4,4a, 5,5a, 8a, 9,9a, 10,10a-decahydro-1H, 3H -4,10-Ethyl bridge-5,9-methyl bridgenaphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone (EEMDA). The compound obtained in this third step is a tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-4) of the R 7 series -CH = CH-, and is a novel compound.
本反應可利用例如將DBDNA與馬來酸酐混合,加熱並攪拌等方法進行。此時之反應溫度較佳為100~250℃,又更佳為120~230℃,反應壓力無特殊限制。This reaction can be performed by, for example, mixing DBDNA with maleic anhydride, heating and stirring. The reaction temperature at this time is preferably 100 to 250 ° C, and more preferably 120 to 230 ° C. The reaction pressure is not particularly limited.
前述馬來酸酐之使用量,相對於DBDNA1莫耳通常為1莫耳以上,較佳為2莫耳以上,又更佳為4莫耳以上。The amount of the aforementioned maleic anhydride is usually 1 mol or more, preferably 2 mol or more, and more preferably 4 mol or more, relative to 1 DNA of the DNA molecule.
本反應係將固體DBDNA與馬來酸酐混合並進行反應。馬來酸酐相對於DBDNA之理論必要量為1莫耳,但使用約1莫耳時,有時反應結束後之反應物會在反應容器內固化而難以取出。另一方面,馬來酸酐(熔點52-56℃)以超過等莫耳之量使用時,因為反應溫度高於馬來酸酐之熔點,因此過量的馬來酸酐為液體,作為溶劑的作用,反應系變成懸浮液。反應結束後,從反應溫度冷卻到適合作業的溫度(例如:100℃左右)後,添加有機溶劑到系內並過濾的話,可取得高純度之EEMDA。This reaction is performed by mixing solid DBDNA with maleic anhydride. The theoretically necessary amount of maleic anhydride with respect to DBDNA is 1 mol. However, when using about 1 mol, the reactant after the reaction may be solidified in the reaction container and difficult to remove. On the other hand, when maleic anhydride (melting point 52-56 ° C) is used in an amount exceeding isomolar, the reaction temperature is higher than the melting point of maleic anhydride, so excess maleic anhydride is a liquid, which acts as a solvent and reacts. The system becomes a suspension. After the reaction is completed, the reaction temperature is cooled to a temperature suitable for the operation (for example, about 100 ° C.), and an organic solvent is added to the system and filtered to obtain high-purity EEMDA.
反應後添加之有機溶劑,例如:酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)等。較佳為脂肪族烴類、及芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。Organic solvents added after the reaction, for example: ketones (for example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), 醯Amines (for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethylisobutylamidine, etc.), urea (N, N'-dimethylimidazolidone, etc.), ethers (for example: diethyl ether, diisopropyl ether, tetrahydrofuran, di Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), and the like. Preferred are aliphatic hydrocarbons and aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述有機溶劑之使用量,可利用製備之溶液之均勻性、攪拌性予以適當調節,相對於DBDNA1g較佳為0.1~30mL,又更佳為0.5~20mL。The amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the prepared solution, and is preferably 0.1 to 30 mL, and more preferably 0.5 to 20 mL, relative to 1 g of DBDNA.
(第4步驟) 第4步驟中,使第3步驟獲得之EEMDA與甲醇類反應而合成1,4,4a,5,6,7,8,8a-八氫-1,4-乙橋-5,8-甲橋萘-6,7,10,11-四羧酸四甲酯(EEMDE;於此情形,R21 ~R24 為甲基)。也可以將甲醇替換成所望之酯化合物所對應之其他之醇化合物。此第4步驟獲得之化合物係R7 為-CH=CH-之前述化學式(M-5)表示之四酯化合物,乃新穎之化合物。(Step 4) In step 4, the EEMDA obtained in step 3 is reacted with methanol to synthesize 1,4,4a, 5,6,7,8,8a-octahydro-1,4-ethyl bridge-5. , 8-Methylnaphthalene-6,7,10,11-tetracarboxylic acid tetramethyl ester (EEMDE; in this case, R 21 to R 24 are methyl). Alternatively, methanol may be replaced with another alcohol compound corresponding to the desired ester compound. The compound obtained in this fourth step is a tetraester compound represented by the aforementioned chemical formula (M-5) in which R 7 is -CH = CH-, and is a novel compound.
本反應可利用例如於酸存在下將EEMDA、原酯類、及醇類混合並攪拌等方法進行。此時之反應溫度較佳為20~150℃,又更佳為50~100℃,反應壓力無特殊限制。This reaction can be performed, for example, by mixing and stirring EEMDA, orthoesters, and alcohols in the presence of an acid. The reaction temperature at this time is preferably 20 to 150 ° C, and more preferably 50 to 100 ° C. The reaction pressure is not particularly limited.
本反應使用酸。本反應使用之酸無特殊限制,例如:鹽酸、氫溴酸、氫碘酸、硫酸、氯硫酸、硝酸等無機酸類;甲磺酸、苯磺酸、對甲苯磺酸等有機磺酸類;氯乙酸、三氟乙酸等鹵化羧酸類、離子交換樹脂、硫酸矽膠、沸石、酸性氧化鋁等,較佳為無機酸類、有機磺酸類,又更佳為無機酸類。又,該等酸可單獨使用或混用二種以上。This reaction uses an acid. There are no special restrictions on the acids used in this reaction, for example: inorganic acids such as hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, chlorosulfuric acid, and nitric acid; organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, and p-toluenesulfonic acid; chloroacetic acid Halogenated carboxylic acids, such as trifluoroacetic acid, ion exchange resins, silica gel, zeolites, acidic alumina, etc., are preferably inorganic acids, organic sulfonic acids, and more preferably inorganic acids. These acids can be used alone or in combination of two or more.
前述酸之使用量,相對於EEMDA1莫耳,較佳為0.01~10莫耳,更佳為0.05~3莫耳。The amount of the aforementioned acid to be used is preferably 0.01 to 10 moles, more preferably 0.05 to 3 moles, relative to EEMDA1 mole.
本反應使用醇化合物。本反應使用之醇化合物,例如:甲醇、乙醇、正丙醇、異丙醇、正丁醇、第二丁醇、第三丁醇、戊醇、甲氧基乙醇、乙氧基乙醇、乙二醇、三乙二醇等,較佳為甲醇、乙醇、正丙醇、異丙醇,又更佳為甲醇、乙醇。又,該等醇化合物可單獨使用或混用二種以上。This reaction uses an alcohol compound. Alcohol compounds used in this reaction, such as: methanol, ethanol, n-propanol, isopropanol, n-butanol, second butanol, third butanol, pentanol, methoxyethanol, ethoxyethanol, ethylene glycol Alcohol, triethylene glycol and the like are preferably methanol, ethanol, n-propanol, isopropanol, and more preferably methanol and ethanol. These alcohol compounds may be used alone or in combination of two or more.
前述醇化合物之使用量,相對於EEMDA1g,較佳為0.1~200g,又更佳為1~100g。The amount of the aforementioned alcohol compound is preferably 0.1 to 200 g, and more preferably 1 to 100 g, relative to EEMDA 1 g.
本反應也可使用前述醇類以外之有機溶劑。使用之有機溶劑只要不妨礙反應即不特別限定,例如:脂肪族羧酸類(例如:甲酸、乙酸、丙酸、三氟乙酸等)、有機磺酸類(例如:甲磺酸、三氟甲磺酸等)、酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)等。較佳為脂肪族烴類、芳香族烴類、鹵化烴類、鹵化芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。In this reaction, organic solvents other than the aforementioned alcohols may be used. The organic solvent used is not particularly limited as long as it does not hinder the reaction, for example: aliphatic carboxylic acids (for example: formic acid, acetic acid, propionic acid, trifluoroacetic acid, etc.), organic sulfonic acids (for example: methanesulfonic acid, trifluoromethanesulfonic acid) Etc.), ketones (for example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), ammonium (for example: N , N-dimethylformamidine, N, N-dimethylacetamide, N-methylpyrrolidone, etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. : Diethyl ether, diisopropyl ether, tetrahydrofuran, di Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), and the like. Preferred are aliphatic hydrocarbons, aromatic hydrocarbons, halogenated hydrocarbons, and halogenated aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述醇類以外之有機溶劑之使用量,相對於EEMDA1g,較佳為0.1~200g,又更佳為1~100g。The amount of the organic solvent other than the aforementioned alcohols is preferably 0.1 to 200 g, and more preferably 1 to 100 g, relative to 1 g of EEMDA.
本反應可使用原酯類。使用之原酯類可列舉下式表示之化合物,例如:原甲酸三甲酯、原甲酸三乙酯,較佳為原甲酸三甲酯。This reaction can use orthoesters. The orthoesters to be used include compounds represented by the following formulas, for example: trimethyl orthoformate and triethyl orthoformate, preferably trimethyl orthoformate.
[化47] [Chemical 47]
式中,Rf 為氫原子、或碳數1~5之烷基,較佳為氫原子、甲基,更佳為氫原子。又,Re 為碳數1~5之烷基,較佳為甲基、乙基,更佳為甲基。3個Re 可相同也可不同,宜為相同較佳。In the formula, R f is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom. And, R e is alkyl of 1 to 5, preferably methyl, ethyl, more preferably methyl. The three R e may be the same or different, and are preferably the same.
前述原酯類之使用量,相對於EEMDA1g,較佳為0.5g以上,又更佳為1~5g。The amount of the aforementioned orthoesters is preferably 0.5 g or more, and more preferably 1 to 5 g, relative to EEMDA 1 g.
(第5步驟) 第5步驟中,使第4步驟獲得之EEMDE與氫反應,合成十氫-1,4-乙橋-5,8-甲橋萘-2,3,6,7-四羧酸四甲酯(EMDE)。此第5步驟獲得之化合物,係R7 為-CH2 CH2 -之前述化學式(M-5)表示之四酯化合物,乃新穎之化合物。(Fifth step) In the fifth step, the EEMDE obtained in the fourth step is reacted with hydrogen to synthesize decahydro-1,4-ethyl bridge-5,8-methyl bridge naphthalene-2,3,6,7-tetracarboxylic acid. Tetramethyl acid (EMDE). The compound obtained in this step 5 is a tetraester compound represented by the aforementioned chemical formula (M-5) in which R 7 is -CH 2 CH 2 -and is a novel compound.
本反應可藉由例如將EEMDE與金屬觸媒於溶劑中混合,於氫氣環境下視需要邊加熱邊攪拌等方法進行。此時之反應溫度較佳為0~150℃,又更佳為10~120℃。反應壓力較佳為0.1~20MPa,又更佳為0.1~5MPa。This reaction can be performed, for example, by mixing EEMDE and a metal catalyst in a solvent, and stirring under heating in a hydrogen environment, if necessary. The reaction temperature at this time is preferably 0 to 150 ° C, and more preferably 10 to 120 ° C. The reaction pressure is preferably 0.1 to 20 MPa, and more preferably 0.1 to 5 MPa.
本反應使用氫。使用之氫之量相對於EEMDE1莫耳較佳為0.8~100莫耳,又更佳為1~50莫耳。This reaction uses hydrogen. The amount of hydrogen used is preferably 0.8 to 100 mol, and more preferably 1 to 50 mol relative to EEMDE1 mol.
本反應使用金屬觸媒。使用之金屬觸媒只要是可將EEMDE之結構中之烯烴部分予以氫化者即可,不特別限定,例如:銠系觸媒(銠碳、威爾金森錯合物等)鈀系觸媒(鈀碳、鈀氧化鋁、鈀矽膠等)、鉑系觸媒(鉑碳、鉑氧化鋁等)、鎳系觸媒(倫尼鎳觸媒、海綿鎳觸媒等)。較佳為銠系觸媒、鈀系觸媒,又更佳為銠系觸媒。This reaction uses a metal catalyst. The metal catalyst used is not particularly limited as long as it can hydrogenate the olefin portion in the structure of EEMDE. For example: rhodium-based catalysts (rhodium carbon, Wilkinson complex, etc.) palladium-based catalysts (palladium Carbon, palladium-alumina, palladium-silicone, etc.), platinum-based catalysts (platinum-carbon, platinum-alumina, etc.), nickel-based catalysts (luny nickel catalyst, sponge nickel catalyst, etc.). A rhodium-based catalyst and a palladium-based catalyst are preferred, and a rhodium-based catalyst is more preferred.
前述金屬觸媒之使用量,按金屬原子換算,相對於EEMDE1莫耳較佳為0.0001~1莫耳,又更佳為0.001~0.8莫耳。The use amount of the aforementioned metal catalyst is, in terms of metal atoms, preferably 0.0001 to 1 mole, and more preferably 0.001 to 0.8 mole relative to EEMDE1 mole.
本反應宜使用溶劑較佳。使用之溶劑只要不妨礙反應即不特別限定,例如:水、醇類(甲醇、乙醇、正丙醇、異丙醇、正丁醇、第二丁醇、第三丁醇等)、酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)、苯酚類(苯酚、甲基苯酚、對氯苯酚)等。較佳為醇類、醯胺類、脂肪族烴類、及芳香族烴類。又,該等溶劑可單獨使用或混用二種以上。It is preferable to use a solvent in this reaction. The solvent to be used is not particularly limited as long as it does not hinder the reaction, for example: water, alcohols (methanol, ethanol, n-propanol, isopropanol, n-butanol, second butanol, third butanol, etc.), ketones ( For example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), amidines (for example: N, N-dimethyl Formamidine, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethylisobutylamidine, etc.), ureas (N, N'-dimethylimidazolidone Etc.), ethers (for example: diethyl ether, diisopropyl ether, tetrahydrofuran, di Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), phenols (phenol, methylphenol, p-chlorophenol), and the like. Alcohols, amidines, aliphatic hydrocarbons, and aromatic hydrocarbons are preferred. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量,可以利用反應液之均勻性、攪拌性予以適當調節,相對於EEMDE1g,較佳為0.1~100g,又更佳為1~50g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.1 to 100 g, and more preferably 1 to 50 g, relative to EEMDE 1 g.
(第6步驟) 第6步驟中,藉由第5步驟獲得之EMDE之無水化反應,合成十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(EMDA)。此第6步驟獲得之化合物係R7 為-CH2 CH2 -之前述化學式(M-4)表示之四羧酸二酐。(Step 6) In step 6, the dehydration reaction of EMDE obtained in step 5 was used to synthesize decahydro-1H, 3H-4,10-ethyl bridge-5,9-methaphthonaphtho [2,3 -c: 6,7-c '] difuran-1,3,6,8-tetraone (EMDA). The compound obtained in this step 6 is a tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-4) in which R 7 is -CH 2 CH 2- .
本反應可藉由例如將EMDE於酸觸媒存在下在有機溶劑中邊加熱邊攪拌等方法進行。此時之反應溫度較佳為50~130℃,又更佳為80~120℃,反應壓力無特殊限制。This reaction can be carried out by, for example, a method of stirring EMDE in an organic solvent in the presence of an acid catalyst while heating. The reaction temperature at this time is preferably 50 to 130 ° C, and more preferably 80 to 120 ° C. The reaction pressure is not particularly limited.
本反應使用酸觸媒。本反應使用之酸觸媒只要是酸即無特殊限制,例如:鹽酸、氫溴酸、氫碘酸、硫酸、氯硫酸、硝酸等無機酸類;甲磺酸、苯磺酸、對甲苯磺酸等有機磺酸類;氯乙酸、三氟乙酸等鹵化羧酸類、離子交換樹脂、硫酸矽膠、沸石、酸性氧化鋁等,較佳為無機酸類、有機磺酸類,又更佳為有機磺酸類。又,該等酸可單獨使用或混用二種以上。This reaction uses an acid catalyst. The acid catalyst used in this reaction is not particularly limited as long as it is an acid, such as: inorganic acids such as hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, chlorosulfuric acid, nitric acid, etc .; Organic sulfonic acids; halogenated carboxylic acids such as chloroacetic acid and trifluoroacetic acid, ion exchange resins, silica gel, zeolites, acid alumina, etc., preferably inorganic acids, organic sulfonic acids, and more preferably organic sulfonic acids. These acids can be used alone or in combination of two or more.
前述酸觸媒之使用量,相對於EMDE1莫耳,較佳為0.001~0.5莫耳,更佳為0.001~0.2莫耳。The amount of the aforementioned acid catalyst is preferably 0.001 to 0.5 mol, and more preferably 0.001 to 0.2 mol relative to EMDE1 mol.
本反應宜於溶劑中進行為較佳。使用之溶劑宜為甲酸、乙酸、丙酸等有機酸溶劑較佳。又,該等溶劑可單獨使用或混用二種以上。This reaction is preferably carried out in a solvent. The solvent used is preferably an organic acid solvent such as formic acid, acetic acid, and propionic acid. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量可利用反應液之均勻性、攪拌性予以適當調節,相對於EMDE1g,較佳為0.1~100g,又更佳為1~10g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.1 to 100 g, and more preferably 1 to 10 g, relative to 1 g of EMDE.
各反應之詳情依實施例説明,該技術領域中有通常知識者可以變更溶劑、進料量、反應條件等,又,各反應之結束後,可利用例如:過濾、萃取、蒸餾、昇華、再結晶、管柱層析等一般的方法實施反應產物之單離、精製等。The details of each reaction are explained according to the examples. Those with ordinary knowledge in the technical field can change the solvent, feed amount, reaction conditions, etc. After the completion of each reaction, it can be used for example: filtration, extraction, distillation, sublimation, re- The general methods such as crystallization and column chromatography are used to separate and purify the reaction products.
依本發明,可以提供係給予前述化學式(A-2)之結構之四羧酸成分之前述化學式(M-9)表示之四羧酸二酐之新穎之製造方法。以下說明其製造方法。According to the present invention, a novel method for producing a tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-9) which is a tetracarboxylic acid component having the structure of the aforementioned chemical formula (A-2) can be provided. The manufacturing method is described below.
前述化學式(M-9)表示之四羧酸二酐,可以參考Can. J. Chem. 1975, 53, 256, Tetrahedron Lett. 2003, 44, 561等,例如依照以下所示之反應方案合成。在此,係以R4 為-CH2 -之化學式(M-9)表示之四羧酸二酐,亦即3a,4,10,10a-四氫-1H,3H-4,10-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(BNDA)為例説明,但也可同樣製造其他四羧酸二酐。The tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-9) can be synthesized by referring to Can. J. Chem. 1975, 53, 256, Tetrahedron Lett. 2003, 44, 561, and the like, for example, according to the reaction scheme shown below. Here, it is a tetracarboxylic dianhydride represented by the chemical formula (M-9) in which R 4 is -CH 2- , that is, 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-form bridge The naphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone (BNDA) is taken as an example, but other tetracarboxylic dianhydrides can also be produced in the same manner.
[化48]式中,R31 、R32 各自獨立地為碳數1~10之烷基、或苯基,R33 、R34 各自獨立地為碳數1~10之烷基。[Chemical 48] In the formula, R 31 and R 32 are each independently an alkyl group having 1 to 10 carbon atoms or a phenyl group, and R 33 and R 34 are each independently an alkyl group having 1 to 10 carbon atoms.
(第1步驟) 第1步驟中,合成R4 為-CH2 -之化學式(M-9)之四羧酸二酐(BNDA)時,係使順式-1,4-二氯-2-丁烯(DCB)與環戊二烯(CP)反應,而合成5,6-雙(氯甲基)雙環[2.2.1]庚-2-烯(BCMN)。合成R4 係-CH2 CH2 -之化學式(M-9)之四羧酸二酐時,在此,只要將環戊二烯(CP)替換為1,3-環己二烯,和DCB反應即可。(First step) In the first step, when synthesizing tetracarboxylic dianhydride (BNDA) of chemical formula (M-9) in which R 4 is -CH 2- , cis-1,4-dichloro-2- Butene (DCB) is reacted with cyclopentadiene (CP) to synthesize 5,6-bis (chloromethyl) bicyclo [2.2.1] hept-2-ene (BCMN). When synthesizing the tetracarboxylic dianhydride of the formula (M-9) of R 4 -CH 2 CH 2- , as long as the cyclopentadiene (CP) is replaced with 1,3-cyclohexadiene, and DCB Just respond.
本反應可藉由例如將DCB與CP混合並攪拌等方法進行。此時之反應溫度較佳為50~250℃,又更佳為150~220℃,反應壓力無特殊限制。This reaction can be performed by, for example, mixing and stirring DCB and CP. The reaction temperature at this time is preferably 50 to 250 ° C, and more preferably 150 to 220 ° C. The reaction pressure is not particularly limited.
CP係二環戊二烯(DCP)之單體,可藉由將DCP於160~200℃加熱以定量地取得CP。在此第1步驟使用之CP,也可藉由DCP之熱分解而使其在系中發生後使用。DCP係方案中所示之化合物。CP is a monomer of dicyclopentadiene (DCP). CP can be obtained quantitatively by heating DCP at 160 ~ 200 ° C. The CP used in this first step can also be used after it has occurred in the system by thermal decomposition of DCP. DCP is a compound shown in the scheme.
前述CP之使用量,相對於DCB1莫耳,較佳為0.2~10莫耳,又更佳為0.5~5莫耳。The use amount of the aforementioned CP is preferably 0.2 to 10 mol, and more preferably 0.5 to 5 mol relative to DCB1 mol.
本反應可使用也可不使用有機溶劑。使用之有機溶劑只要不妨礙反應即不特別限定,例如:脂肪族羧酸類(例如:甲酸、乙酸、丙酸、三氟乙酸等)、有機磺酸類(例如:甲磺酸、三氟甲磺酸等)、醇類(例如:甲醇、乙醇、異丙醇、第三丁醇、乙二醇、三乙二醇等)、酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)、苯酚類(苯酚、甲基苯酚、對氯苯酚等)等。較佳為脂肪族烴類、及芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。This reaction may or may not use an organic solvent. The organic solvent used is not particularly limited as long as it does not interfere with the reaction, for example: aliphatic carboxylic acids (for example, formic acid, acetic acid, propionic acid, trifluoroacetic acid, etc.), organic sulfonic acids (for example, methanesulfonic acid, trifluoromethanesulfonic acid Etc.), alcohols (for example: methanol, ethanol, isopropanol, tertiary butanol, ethylene glycol, triethylene glycol, etc.), ketones (for example: acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic Hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), ammonium (for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (for example: diethyl ether, diisopropyl ether, tetrahydrofuran, diamine Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), phenols (phenol, methylphenol, p-chlorophenol, etc.) and the like. Preferred are aliphatic hydrocarbons and aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
使用有機溶劑時,前述有機溶劑之使用量可利用反應液之均勻性、攪拌性予以適當調節,相對於DCB1g,較佳為0.2~10g,又更佳為0.3~5g。When an organic solvent is used, the amount of the aforementioned organic solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.2 to 10 g, and more preferably 0.3 to 5 g, relative to DCB 1 g.
(第2步驟) 第2步驟中,利用第1步驟獲得之BCMN與鹼之反應進行脱氯化氫化,合成5,6-二亞甲基雙環[2.2.1]庚-2-烯(CYDE)。(Second step) In the second step, the reaction between the BCMN obtained in the first step and the base is used for dechlorination and hydrogenation to synthesize 5,6-dimethylenebicyclo [2.2.1] hept-2-ene (CYDE).
本反應可藉由例如將BCMN與鹼在溶劑中混合並攪拌等方法以進行。此時之反應溫度較佳為0~150℃,又更佳為20~120℃,反應壓力無特殊限制。This reaction can be performed by, for example, mixing and stirring BCMN and a base in a solvent. The reaction temperature at this time is preferably 0 to 150 ° C, and more preferably 20 to 120 ° C. The reaction pressure is not particularly limited.
本反應使用鹼。本反應使用之鹼,例如:二丁胺、哌啶、2-甲哌啶等二級胺類;三乙胺、三丁胺等三級胺類;吡啶、甲基吡啶、二甲胺基吡啶等吡啶類;喹啉、異喹啉、甲基喹啉等喹啉類;氫化鈉、氫化鉀等鹼金屬氫化物;甲醇鈉、乙醇鈉、異丙醇鈉、第三丁醇鉀等鹼金屬醇鹽;碳酸鈉、碳酸鉀等鹼金屬碳酸鹽;碳酸氫鈉、碳酸氫鉀等鹼金屬碳酸氫鹽;氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物,較佳為三級胺類、鹼金屬醇鹽、鹼金屬碳酸鹽、鹼金屬氫氧化物。又,該等鹼可單獨使用或混用二種以上。This reaction uses a base. Bases used in this reaction, for example: secondary amines such as dibutylamine, piperidine, 2-methylpiperidine; tertiary amines such as triethylamine, tributylamine; pyridine, methylpyridine, dimethylaminopyridine Pyridines, etc .; Quinolines, such as quinoline, isoquinoline, methylquinoline; alkali metal hydrides such as sodium hydride, potassium hydride; alkali metals such as sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium third butoxide Alkoxides; alkali metal carbonates such as sodium carbonate and potassium carbonate; alkali metal bicarbonates such as sodium bicarbonate and potassium bicarbonate; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, preferably tertiary amines, Alkali metal alkoxide, alkali metal carbonate, alkali metal hydroxide. These bases can be used alone or in combination of two or more.
前述鹼之使用量,相對於BCMN1莫耳,較佳為1~20莫耳,又更佳為1.5~10莫耳。The amount of the aforementioned base to be used is preferably 1 to 20 moles, and more preferably 1.5 to 10 moles, relative to BCMN1 mole.
本反應通常宜於溶劑中進行。使用之溶劑只要不妨礙反應即不特別限定,例如:水、醇類(例如:甲醇、乙醇、異丙醇、第三丁醇、乙二醇、三乙二醇等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)等。較佳為水、醇類、醚類。又,該等溶劑可單獨使用或混用二種以上。This reaction is usually carried out in a solvent. The solvent used is not particularly limited as long as it does not hinder the reaction, such as: water, alcohols (for example, methanol, ethanol, isopropanol, tertiary butanol, ethylene glycol, triethylene glycol, etc.), aliphatic hydrocarbons ( For example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), amidines (for example: N, N-dimethylformamide, N, N-dimethylacetamide, N-formamide Pyrrolidone, etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. diethyl ether, diisopropyl ether, tetrahydrofuran, diamine Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), fluorene (for example: dimethyl sulfene, etc.), fluorene (for example: Cyclops, etc.) and so on. Water, alcohols and ethers are preferred. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量,可利用反應液之均勻性、攪拌性予以適當調節,相對於BCMN1g,較佳為0.1~100g,又更佳為0.2~50g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and is preferably 0.1 to 100 g, and more preferably 0.2 to 50 g, relative to 1 g of BCMN.
(第3步驟) 第3步驟中,使第2步驟獲得之CYDE與乙炔二羧酸二甲酯(DMAD)反應,而合成1,4,5,8-四氫-1,4-甲橋萘-6,7-二羧酸二甲酯(CYME;於此情形R31 、R32 為甲基)。也可以將乙炔二羧酸二甲酯替換成後述其他的乙炔二羧酸二酯。(3rd step) In the 3rd step, CYDE obtained in the 2nd step is reacted with dimethyl acetylene dicarboxylate (DMAD) to synthesize 1,4,5,8-tetrahydro-1,4-methylnaphthalene Dimethyl-6,7-dicarboxylic acid (CYME; in this case R 31 and R 32 are methyl). You may replace dimethyl acetylene dicarboxylate with another acetylene dicarboxylic acid diester mentioned later.
本反應可藉由例如將CYDE與DMAD於溶劑中混合並攪拌等方法進行。此時之反應溫度較佳為0~150℃,又更佳為20~120℃,反應壓力無特殊限制。This reaction can be performed, for example, by mixing and stirring CYDE and DMD in a solvent. The reaction temperature at this time is preferably 0 to 150 ° C, and more preferably 20 to 120 ° C. The reaction pressure is not particularly limited.
本反應使用如DMAD之乙炔二羧酸二酯。使用之乙炔二羧酸二酯選擇對應於所望之酯化合物者。本反應使用之乙炔二羧酸二酯可列舉乙炔二羧酸二甲酯、乙炔二羧酸二乙酯、乙炔二羧酸二丙酯等,較佳為乙炔二羧酸二甲酯、乙炔二羧酸二乙酯。又,乙炔二羧酸二苯酯也可使用。鍵結於乙炔之2個取代基可相同也可不同。This reaction uses an acetylene dicarboxylic acid diester such as DMAD. The acetylene dicarboxylic acid diester used is selected corresponding to the desired ester compound. Examples of the acetylene dicarboxylic acid diester used in this reaction include dimethyl acetylene dicarboxylate, diethyl acetylene dicarboxylate, dipropyl acetylene dicarboxylate, etc., preferably dimethyl acetylene dicarboxylate and acetylene dicarboxylic acid. Diethyl carboxylate. Diphenyl acetylene dicarboxylate can also be used. The two substituents bonded to acetylene may be the same or different.
前述DMAD等乙炔二羧酸二酯之使用量,相對於CYDE1莫耳較佳為0.8~20莫耳,又更佳為1~10莫耳。The use amount of the aforementioned acetylene dicarboxylic acid diester such as DMAD is preferably 0.8 to 20 mol, and more preferably 1 to 10 mol, relative to CYDE1 mol.
本反應通常宜於溶劑中進行。使用之溶劑只要不妨礙反應即不特別限定,例如:水、醇類(例如:甲醇、乙醇、異丙醇、第三丁醇、乙二醇、三乙二醇等)、酮類(例如:丙酮、丁酮、環己酮等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)、苯酚類(苯酚、甲基苯酚、對氯苯酚等)等。較佳為水、醇類、醚類、脂肪族烴類、芳香族烴類。又,該等溶劑可單獨使用或混用二種以上。This reaction is usually carried out in a solvent. The solvent to be used is not particularly limited as long as it does not interfere with the reaction, for example: water, alcohols (for example: methanol, ethanol, isopropanol, tertiary butanol, ethylene glycol, triethylene glycol, etc.), ketones (for example: Acetone, methyl ethyl ketone, cyclohexanone, etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), amidines (for example: N, N-dimethylformamidine) Amines, N, N-dimethylacetamide, N-methylpyrrolidone, etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. diethyl ether, diisopropyl ether , Tetrahydrofuran, two Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), phenols (phenol, methylphenol, p-chlorophenol, etc.) and the like. Water, alcohols, ethers, aliphatic hydrocarbons, and aromatic hydrocarbons are preferred. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量,可利用反應液之均勻性、攪拌性予以適當調節,相對於CYME1g,較佳為0.2~200g,又更佳為0.3~100g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and it is preferably 0.2 to 200 g, and more preferably 0.3 to 100 g, relative to 1 g of CYME.
(第4步驟) 第4步驟中,利用第3步驟獲得之CYME之芳香族化反應(氧化反應),合成1,4-二氫-1,4-甲橋萘-6,7-二羧酸二甲酯(CYPDM)。(Fourth step) In the fourth step, 1,4-dihydro-1,4-methylnaphthalene-6,7-dicarboxylic acid is synthesized by using the aromaticization reaction (oxidation reaction) of CYME obtained in the third step. Dimethyl ester (CYPDM).
本反應可藉由例如將CYME與用以芳香族化之氧化劑於溶劑中攪拌等方法進行。此時之反應溫度較佳為-20~150℃,又更佳為0~120℃,反應壓力無特殊限制。This reaction can be performed by, for example, stirring CYME and an oxidizing agent for aromaticization in a solvent. The reaction temperature at this time is preferably -20 to 150 ° C, and more preferably 0 to 120 ° C. The reaction pressure is not particularly limited.
本反應中,為了芳香族化,使用氧化劑。使用之氧化劑只要不妨礙反應即不特別限定,可以使用例如:2,3-二氯-5,6-二氰基對苯醌、四氯苯醌等苯醌類。In this reaction, an oxidizing agent is used for aromatization. The oxidizing agent used is not particularly limited as long as it does not hinder the reaction, and for example, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone and tetrachlorobenzoquinone can be used.
前述氧化劑之使用量,相對於CYME1莫耳,較佳為0.5~10莫耳,又更佳為0.8~5莫耳。The amount of the aforementioned oxidant is preferably 0.5 to 10 moles, and more preferably 0.8 to 5 moles relative to CYME1 mole.
本反應通常於溶劑中進行。使用之溶劑只要不妨礙反應即不特別限定,例如:水;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、N,N-二甲基異丁基醯胺等醯胺類;N,N-二甲基咪唑啶酮等尿素類;乙腈、丙腈等腈類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、第三丁醇等醇類;二異丙醚、二烷、四氫呋喃、環丙基甲醚等醚類;苯、甲苯、二甲苯等芳香族烴類;己烷、環己烷、庚烷、辛烷等脂肪族烴類;二氯甲烷、氯仿、1,2-二氯乙烷、氯苯等鹵化烴類;乙酸乙酯、乙酸丁酯等酯類;丙酮、甲乙酮、甲基異丁酮等,較佳為芳香族烴類、鹵化烴類、醚類、醇類、水。又,該等溶劑可單獨使用或混用二種以上。This reaction is usually carried out in a solvent. The solvent used is not particularly limited as long as it does not hinder the reaction, for example: water; N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, N, N-dimethyl Imidamines such as isobutylammonium amine; ureas such as N, N-dimethylimidazolidone; nitriles such as acetonitrile and propionitrile; methanol, ethanol, n-propanol, isopropanol, n-butanol, Alcohols such as tributanol; diisopropyl ether, di Ethers such as alkane, tetrahydrofuran, cyclopropyl methyl ether; aromatic hydrocarbons such as benzene, toluene, xylene; aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane; methylene chloride, chloroform, 1 2,2-dichloroethane, chlorobenzene and other halogenated hydrocarbons; ethyl acetate, butyl acetate and other esters; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., preferably aromatic hydrocarbons, halogenated hydrocarbons, ethers Alcohol, alcohol, water. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量,可利用反應液之均勻性、攪拌性予以適當調節,相對於CYME1g,較佳為1~100g,又更佳為2~50g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and is preferably 1 to 100 g, and more preferably 2 to 50 g, relative to 1 g of CYME.
(第5步驟) 第5步驟中,於鈀觸媒及銅化合物存在下使第4步驟獲得之CYPDM與甲醇類於一氧化碳反應,而合成1,2,3,4-四氫-1,4-甲橋萘-2,3,6,7-四羧酸四甲酯(BNME;於此情形R31 ~R34 為甲基)。也可以將甲醇替換為對應於所望之酯化合物之其他之醇化合物。(Step 5) In step 5, CYPDM obtained in step 4 and methanol are reacted with carbon monoxide in the presence of a palladium catalyst and a copper compound to synthesize 1,2,3,4-tetrahydro-1,4- Tetramethylnaphthalene-2,3,6,7-tetracarboxylic acid tetramethyl ester (BNME; in this case R 31 to R 34 are methyl). It is also possible to replace methanol with another alcohol compound corresponding to the desired ester compound.
本反應可藉由例如於有機溶劑中將CYPDM及所望之酯化合物所對應之醇類、鈀觸媒及銅化合物混合,並在一氧化碳之氣體環境下攪拌等方法進行。此時之反應溫度較佳為-10~100℃,又更佳為-10~70℃,反應壓力無特殊限制。This reaction can be performed by, for example, mixing CYPDM and the alcohol corresponding to the desired ester compound, a palladium catalyst, and a copper compound in an organic solvent, and stirring under a carbon monoxide gas environment. The reaction temperature at this time is preferably -10 to 100 ° C, and more preferably -10 to 70 ° C. The reaction pressure is not particularly limited.
本反應使用醇化合物。本反應使用之醇化合物,例如:甲醇、乙醇、正丙醇、異丙醇、正丁醇、第二丁醇、第三丁醇、戊醇、甲氧基乙醇、乙氧基乙醇、乙二醇、三乙二醇等,較佳為甲醇、乙醇、正丙醇、異丙醇,又更佳為甲醇、乙醇、異丙醇。又,該等醇化合物可單獨使用或混用二種以上。This reaction uses an alcohol compound. Alcohol compounds used in this reaction, such as: methanol, ethanol, n-propanol, isopropanol, n-butanol, second butanol, third butanol, pentanol, methoxyethanol, ethoxyethanol, ethylene glycol Alcohol, triethylene glycol, and the like are preferably methanol, ethanol, n-propanol, and isopropanol, and more preferably methanol, ethanol, and isopropanol. These alcohol compounds may be used alone or in combination of two or more.
前述醇化合物之使用量,相對於CYPDM1g,較佳為0.1~200g,又更佳為1~100g。The amount of the aforementioned alcohol compound is preferably 0.1 to 200 g, and more preferably 1 to 100 g, relative to 1 g of CYPDM.
本反應也可使用前述醇類以外之有機溶劑。使用之有機溶劑只要不妨礙反應即不特別限定,例如:甲酸、脂肪族羧酸類(例如:乙酸、丙酸、三氟乙酸等)、有機磺酸類(例如:甲磺酸、三氟甲磺酸等)、脂肪族烴類(例如:正戊烷、正己烷、正庚烷、環己烷等)、醯胺類(例如:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮等)、尿素類(N,N’-二甲基咪唑啶酮等)、醚類(例如:二乙醚、二異丙醚、四氫呋喃、二烷、1,2-亞甲基二氧化苯等)、芳香族烴類(例如:苯、甲苯、二甲苯等)、鹵化芳香族烴類(例如:氯苯、1,2-二氯苯、1,3-二氯苯、1,4-二氯苯等)、硝基化芳香族烴類(例如:硝基苯等)、鹵化烴類(例如:二氯甲烷、氯仿、四氯化碳、1,2-二氯乙烷等)、羧酸酯類(例如:乙酸乙酯、乙酸丙酯、乙酸丁酯等)、腈類(例如:乙腈、丙腈、苯甲腈等)、亞碸類(例如:二甲基亞碸等)、碸類(例如:環丁碸等)等。較佳為脂肪族烴類、芳香族烴類、鹵化烴類、鹵化芳香族烴類。又,該等有機溶劑可單獨使用或混用二種以上。In this reaction, organic solvents other than the aforementioned alcohols may be used. The organic solvent used is not particularly limited as long as it does not hinder the reaction, for example: formic acid, aliphatic carboxylic acids (for example: acetic acid, propionic acid, trifluoroacetic acid, etc.), organic sulfonic acids (for example: methanesulfonic acid, trifluoromethanesulfonic acid) Etc.), aliphatic hydrocarbons (for example: n-pentane, n-hexane, n-heptane, cyclohexane, etc.), amidoamines (for example: N, N-dimethylformamide, N, N-dimethylformamide) Ethylacetamide, N-methylpyrrolidone, etc.), ureas (N, N'-dimethylimidazolidone, etc.), ethers (e.g. diethyl ether, diisopropyl ether, tetrahydrofuran, diamine Alkane, 1,2-methylene benzene dioxide, etc.), aromatic hydrocarbons (for example: benzene, toluene, xylene, etc.), halogenated aromatic hydrocarbons (for example: chlorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, 1,4-dichlorobenzene, etc.), nitrated aromatic hydrocarbons (e.g., nitrobenzene, etc.), halogenated hydrocarbons (e.g., dichloromethane, chloroform, carbon tetrachloride) , 1,2-dichloroethane, etc.), carboxylic acid esters (for example: ethyl acetate, propyl acetate, butyl acetate, etc.), nitriles (for example: acetonitrile, propionitrile, benzonitrile, etc.), Amidines (for example: dimethyl fluorene, etc.), amidines (for example: cyclobutane, etc.), and the like. Preferred are aliphatic hydrocarbons, aromatic hydrocarbons, halogenated hydrocarbons, and halogenated aromatic hydrocarbons. Moreover, these organic solvents can be used individually or in mixture of 2 or more types.
前述醇類以外之有機溶劑之使用量,相對於CYPDM1g,較佳為0.1~200g,又更佳為1~100g。The amount of organic solvents other than the aforementioned alcohols is preferably 0.1 to 200 g, and more preferably 1 to 100 g, relative to 1 g of CYPDM.
本反應使用之鈀觸媒只要是含鈀即不特別限定,例如:氯化鈀、溴化鈀等鹵化鈀;乙酸鈀、草酸鈀等鈀有機酸鹽;硝酸鈀、硫酸鈀等鈀無機酸鹽;雙(乙醯基丙酮根)鈀、雙(1,1,1-5,5,5-六氟乙醯基丙酮根)鈀等之類的鈀錯合物;鈀載持於碳、氧化鋁等擔體而得之鈀碳、鈀氧化鋁等,較佳為氯化鈀、鈀碳。The palladium catalyst used in this reaction is not particularly limited as long as it contains palladium, for example: palladium halide such as palladium chloride and palladium bromide; palladium organic acid salts such as palladium acetate and palladium oxalate; palladium inorganic acid salts such as palladium nitrate and palladium sulfate ; Palladium complexes such as bis (acetamidoacetone) palladium, bis (1,1,1-5,5,5-hexafluoroacetamidoacetone) palladium; palladium supported on carbon, oxidized Palladium carbon, palladium aluminum oxide, and the like obtained from a support such as aluminum are preferably palladium chloride and palladium carbon.
前述鈀觸媒之使用量,相對於CYPDM1莫耳,較佳為0.0001~0.2莫耳,又更佳為0.001~0.1莫耳。The amount of the palladium catalyst used is preferably 0.0001 to 0.2 mole, and more preferably 0.001 to 0.1 mole, relative to CYPDM1 mole.
本反應使用之銅化合物,於前述鈀觸媒中之Pd(II)還原為Pd(0)的情形,只要可將Pd(0)氧化為Pd(II)者即無特殊限制,例如:銅化合物、鐵化合物等,較佳為銅化合物。本反應使用之銅化合物,具體而言,可以列舉銅、乙酸銅、丙酸銅、正丁酸銅、2-甲基丙酸銅、三甲基乙酸銅、乳酸銅、丁酸銅、苯甲酸銅、三氟乙酸銅、雙(乙醯基丙酮根)銅、雙(1,1,1-5,5,5-六氟乙醯基丙酮根)銅、氯化銅、溴化銅、碘化銅、硝酸銅、亞硝酸銅、硫酸銅、磷酸銅、氧化銅、氫氧化銅、三氟甲磺酸銅、對甲苯磺酸銅、及氰化銅等。又,鐵化合物具體而言可列舉氯化鐵(III)、硝酸鐵(III)、硫酸鐵(III)、乙酸鐵(III)等。較佳為使用二價之銅化合物,又更佳為使用氯化銅(II)。在此,「銅化合物」除了各種化合物以外,也以包括銅單體的含意使用。又,該等銅化合物可單獨使用或混用二種以上。For the copper compound used in this reaction, in the case where Pd (II) in the aforementioned palladium catalyst is reduced to Pd (0), there is no special restriction as long as it can oxidize Pd (0) to Pd (II), for example: copper compound , Iron compounds, etc., copper compounds are preferred. Specific examples of copper compounds used in this reaction include copper, copper acetate, copper propionate, copper n-butyrate, copper 2-methylpropionate, copper trimethylacetate, copper lactate, copper butyrate, and benzoic acid. Copper, copper trifluoroacetate, copper bis (acetamidoacetone) copper, copper (1,1,1-5,5,5-hexafluoroacetamidoacetone) copper, copper chloride, copper bromide, iodine Copper, copper nitrate, copper nitrite, copper sulfate, copper phosphate, copper oxide, copper hydroxide, copper triflate, copper p-toluenesulfonate, and copper cyanide. Specific examples of the iron compound include iron (III) chloride, iron (III) nitrate, iron (III) sulfate, and iron (III) acetate. It is preferred to use a divalent copper compound, and even more preferred to use copper (II) chloride. Here, the "copper compound" is used in addition to various compounds in the meaning including a copper monomer. Moreover, these copper compounds can be used individually or in mixture of 2 or more types.
前述銅化合物之使用量,相對於CYPDM1莫耳,較佳為4~50莫耳,又更佳為5~20莫耳。The amount of the aforementioned copper compound is preferably 4-50 mol, and more preferably 5-20 mol relative to CYPDM1 mol.
(第6步驟) 第6步驟,藉由第5步驟獲得之BNME之無水化反應,合成3a,4,10,10a-四氫-1H,3H-4,10-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(BNDA)。此第6步驟獲得之化合物係前述化學式(M-9)表示之四羧酸二酐。(Sixth step) In the sixth step, 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-methanonaphtho [2,3 is synthesized by the anhydrous reaction of BNME obtained in the fifth step. -c: 6,7-c '] difuran-1,3,6,8-tetraone (BNDA). The compound obtained in this sixth step is a tetracarboxylic dianhydride represented by the aforementioned chemical formula (M-9).
本反應可藉由例如將BNME於酸觸媒存在下在有機溶劑中邊加熱邊攪拌等方法以進行。此時之反應溫度較佳為50~130℃,又更佳為80~120℃,反應壓力無特殊限制。This reaction can be performed, for example, by heating BNME in an organic solvent in the presence of an acid catalyst while stirring, and the like. The reaction temperature at this time is preferably 50 to 130 ° C, and more preferably 80 to 120 ° C. The reaction pressure is not particularly limited.
本反應使用酸觸媒。本反應使用之酸觸媒只要是酸即無特殊限制,例如:鹽酸、氫溴酸、氫碘酸、硫酸、氯硫酸、硝酸等無機酸類;甲磺酸、苯磺酸、對甲苯磺酸等有機磺酸類;氯乙酸、三氟乙酸等鹵化羧酸類、離子交換樹脂、硫酸矽膠、沸石、酸性氧化鋁等,較佳為使用無機酸類、有機磺酸類,又更佳為有機磺酸類。又,該等酸可單獨使用或混用二種以上。This reaction uses an acid catalyst. The acid catalyst used in this reaction is not particularly limited as long as it is an acid, for example: hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, chlorosulfuric acid, nitric acid and other inorganic acids; methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, etc. Organic sulfonic acids; halogenated carboxylic acids such as chloroacetic acid and trifluoroacetic acid, ion exchange resins, silica gel, zeolites, acidic alumina, etc. It is preferable to use inorganic acids, organic sulfonic acids, and more preferably organic sulfonic acids. These acids can be used alone or in combination of two or more.
前述酸觸媒之使用量,相對於BNME1莫耳,較佳為0.001~0.5莫耳,更佳為0.001~0.2莫耳。The amount of the aforementioned acid catalyst is preferably 0.001 to 0.5 mol, and more preferably 0.001 to 0.2 mol relative to BNME1 mol.
本反應宜於溶劑中進行較佳。使用之溶劑宜為甲酸、乙酸、丙酸等有機酸溶劑較佳。又,該等溶劑可單獨使用或混用二種以上。This reaction is preferably carried out in a solvent. The solvent used is preferably an organic acid solvent such as formic acid, acetic acid, and propionic acid. These solvents may be used alone or in combination of two or more.
前述溶劑之使用量可利用反應液之均勻性、攪拌性予以適當調節,相對於BNME1g較佳為0.1~100g,又更佳為1~10g。The amount of the aforementioned solvent can be appropriately adjusted by using the uniformity and agitation of the reaction solution, and is preferably 0.1 to 100 g, and more preferably 1 to 10 g, relative to 1 g of BNME.
各反應之詳情利用實施例説明,但該技術領域中有通常知識者可以變更溶劑、進料量、反應條件等,又,各反應之結束後也可利用例如:過濾、萃取、蒸餾、昇華、再結晶、管柱層析等一般的方法實施反應產物之單離、精製等。 [實施例]The details of each reaction are explained using examples, but those with ordinary knowledge in the technical field can change the solvent, feed amount, reaction conditions, etc. After the completion of each reaction, it can be used, for example: filtration, extraction, distillation, sublimation, Recrystallization, column chromatography and other general methods are used to isolate and purify the reaction product. [Example]
以下依實施例及比較例對於本發明更説明。又,本發明不限於以下之實施例。Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. The present invention is not limited to the following examples.
以下各例之評價依以下的方法進行。The evaluation of each of the following examples was performed by the following method.
<聚醯亞胺膜之評價> [全光透射率] 使用紫外可見分光光度計/V-650DS(日本分光製),測定膜厚10μm之聚醯亞胺膜之全光透射率(380nm~780nm之平均透射率)。< Evaluation of polyimide film > [Total light transmittance] Using a UV-visible spectrophotometer / V-650DS (manufactured by Japan Spectroscopy), the total light transmittance of a polyimide film with a thickness of 10 μm (380nm ~ 780nm) was measured. Average transmittance).
[拉伸彈性模數、斷裂伸長度、斷裂強度] 將聚醯亞胺膜衝壓為IEC-540(S)規格之啞鈴形狀,作為試驗片(寬:4mm),使用ORIENTEC公司製TENSILON,以夾頭間長30mm、拉伸速度2mm/分,測定初始之拉伸彈性模數、斷裂點伸長度、斷裂強度。[Tensile elastic modulus, elongation at break, breaking strength] A polyimide film was punched into a dumbbell shape according to IEC-540 (S). As a test piece (width: 4mm), TENSILON manufactured by ORIENTEC Corporation was used to clamp The head length was 30 mm and the tensile speed was 2 mm / min. The initial tensile elastic modulus, elongation at break point, and breaking strength were measured.
[線熱膨脹係數(CTE)、Tg] 將膜厚10μm之聚醯亞胺膜切出寬4mm之條狀,作為試驗片,使用TMA/SS6100(SII Technology(股)公司製),以夾頭間長15mm、負荷2g、升溫速度20℃/分升溫到500℃。從獲得之TMA曲線求出100℃到250℃的線熱膨脹係數。又,定義TMA曲線之反曲點為Tg(玻璃轉移溫度)。[Linear thermal expansion coefficient (CTE), Tg] A polyimide film with a thickness of 10 μm was cut into a strip with a width of 4 mm. As a test piece, TMA / SS6100 (manufactured by SII Technology Co., Ltd.) was used. The length is 15 mm, the load is 2 g, and the temperature rise rate is 20 ° C./min, and the temperature is raised to 500 ° C. From the obtained TMA curve, a linear thermal expansion coefficient of 100 ° C to 250 ° C was obtained. The inflection point of the TMA curve is defined as Tg (glass transition temperature).
[5%重量減少溫度] 將膜厚10μm之聚醯亞胺膜作為試驗片,使用TA INSTRUMENT公司製熱重量測定裝置(Q5000IR),於氮氣流中,以升溫速度10℃/分從25℃升溫到600℃。從獲得之重量曲線求出5%重量減少溫度。[5% weight reduction temperature] A polyimide film having a film thickness of 10 μm was used as a test piece, and a thermal weight measuring device (Q5000IR) manufactured by TA Instruments was used, and the temperature was increased from 25 ° C. at a heating rate of 10 ° C./min in a nitrogen stream. To 600 ° C. From the obtained weight curve, a 5% weight reduction temperature was determined.
以下之各例使用之原材料之簡稱如下。The abbreviations of the raw materials used in the following examples are as follows.
[二胺成分] DABAN:4,4’-二胺基苯醯替苯胺 PPD:對苯二胺 TFMB:2,2’-雙(三氟甲基)聯苯胺 4,4’-ODA:4,4’-氧基二苯胺 TPE-R:1,3-雙(4-胺基苯氧基)苯 BAPB:4,4’-雙(4-胺基苯氧基)聯苯 tra-DACH:反式-1,4-二胺基環己烷 [四羧酸成分] TNDA:十四氫-1H,3H-4,12:5,11:6,10-三甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮 BNDA:3a,4,10,10a-四氫-1H,3H-4,10-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮 DMADA:3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮 EMDAdx:(3aR,4R,5S,5aR,8aS,9R,10S,10aS)-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮 EMDAxx:(3aR,4R,5S,5aS,8aR,9R,10S,10aS)-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮[Diamine component] DABAN: 4,4'-diaminobenzidine aniline PPD: p-phenylenediamine TFMB: 2,2'-bis (trifluoromethyl) benzidine 4,4'-ODA: 4, 4'-oxydiphenylamine TPE-R: 1,3-bis (4-aminophenoxy) benzene BAPB: 4,4'-bis (4-aminophenoxy) biphenyl tra-DACH: trans Formula-1,4-Diaminocyclohexane [tetracarboxylic acid component] TNDA: Tetradecyl-1H, 3H-4,12: 5,11: 6,10-Trimethyl bridge anthracene [2,3-c : 6,7-c '] difuran-1,3,7,9-tetraketone BNDA: 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-methanonaphtho [2,3 -c: 6,7-c '] difuran-1,3,6,8-tetraketone DMADA: 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H-4, 12: 6,10-dimethylmethanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraketoneEMDAdx: (3aR, 4R, 5S, 5aR, 8aS , 9R, 10S, 10aS) -decahydro-1H, 3H-4,10-ethyl bridge-5,9-methyl bridge naphtho [2,3-c: 6,7-c '] difuran-1,3 , 6,8-tetraketone EMDAxx: (3aR, 4R, 5S, 5aS, 8aR, 9R, 10S, 10aS) -decahydro-1H, 3H-4,10-ethyl bridge-5,9-methyl bridge naphtho [ 2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone
[溶劑] NMP:N-甲基-2-吡咯烷酮 DMAc:N,N-二甲基乙醯胺[Solvent] NMP: N-methyl-2-pyrrolidone DMAc: N, N-dimethylacetamide
表1記載實施例、比較例使用之四羧酸成分、二胺成分之結構式。Table 1 shows the structural formulas of the tetracarboxylic acid component and the diamine component used in the examples and comparative examples.
【表1】 【Table 1】
[實施例S-1(DMADA之合成)][Example S-1 (Synthesis of DMADA)]
[化49]於容量2L之反應容器裝入甲苯1500mL與對苯醌(BQ)153.3g(1.39mol)。然後保持溫度25-30℃,費時2小時滴加環戊二烯183.5g(2.78mmol)後,於25℃反應20小時。將反應液濃縮乾固,並於獲得之濃縮物中添加乙醇1490g,終夜攪拌。之後將固體過濾,以乙醇洗淨後,於60℃進行真空乾燥,獲得淡紅色固體227g。於獲得之淡紅色固體227g添加乙醇1350g,於80℃攪拌1小時,並將固體過濾。將過濾物以氯仿1080g溶解,添加活性碳10g並攪拌1小時。之後進行過濾,將濾液濃縮乾固,並將獲得之固體於60℃真空乾燥,獲得1,4,4a,5,8,8a,9a,10a-八氫-1,4:5,8-二甲橋蒽-9,10-二酮(DNBQ)之白色固體184g (1 H-NMR分析測得純度100%、產率55.3%)。[Chemical 49] A reaction container with a capacity of 2 L was charged with 1500 mL of toluene and 153.3 g (1.39 mol) of p-benzoquinone (BQ). After maintaining the temperature at 25-30 ° C, 183.5 g (2.78 mmol) of cyclopentadiene was added dropwise over 2 hours, and then the reaction was carried out at 25 ° C for 20 hours. The reaction solution was concentrated to dryness, and 1490 g of ethanol was added to the obtained concentrate, followed by stirring overnight. Thereafter, the solid was filtered, washed with ethanol, and then vacuum-dried at 60 ° C to obtain 227 g of a pale red solid. To 227 g of the obtained pale red solid, 1350 g of ethanol was added, and the mixture was stirred at 80 ° C. for 1 hour, and the solid was filtered. The filtrate was dissolved in 1080 g of chloroform, and 10 g of activated carbon was added and stirred for 1 hour. After filtering, the filtrate was concentrated to dryness, and the obtained solid was dried under vacuum at 60 ° C to obtain 1,4,4a, 5,8,8a, 9a, 10a-octahydro-1,4: 5,8-II 184 g of methoanthrene-9,10-dione (DNBQ) as a white solid (100% purity by 1 H-NMR analysis, 55.3% yield).
DNBQ之物性値如下。The physical properties of DNBQ are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.29(d,J=8.5Hz,2H),1.46(d,J=8.5Hz,2H),2.87(s,2H),3.36(s,2H),6.19(t,J=1.8Hz,2H) CI-MS(m/z);241(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.29 (d, J = 8.5 Hz, 2H), 1.46 (d, J = 8.5 Hz, 2H), 2.87 (s, 2H), 3.36 (s, 2H ), 6.19 (t, J = 1.8Hz, 2H) CI-MS (m / z); 241 (M + 1)
於容量5L之反應容器中添加DNBQ100.5g(31.7mmol)、甲醇1.5L、四氫呋喃1.5L。然後於溫度5℃費時1小時添加硼氫化鈉30.0g(60.3mmol)後,於溫度5~10℃反應7小時。其次於溫度5℃滴加飽和氯化銨水溶液1L後,升溫到溫度25℃。過濾在反應液中析出之白色固體,將溶劑減壓餾去。過濾析出之白色固體,於獲得之白色固體添加離子交換水1.5L,於40℃攪拌1小時。之後將白色固體過濾,以離子交換水200mL洗淨2次後,以乙酸乙酯100mL洗淨2次,真空乾燥,獲得1,4,4a,5,8,8a,9,9a,10,10a-十氫-1,4:5,8-二甲橋蒽-9,10-二醇(DNHQ)之白色固體84.2g(1 H-NMR分析測得純度100%、產率82%)。In a reaction vessel having a capacity of 5 L, 100.5 g (31.7 mmol) of DNBQ, 1.5 L of methanol, and 1.5 L of tetrahydrofuran were added. Then, 30.0 g (60.3 mmol) of sodium borohydride was added at a temperature of 5 ° C for 1 hour, and then the reaction was performed at a temperature of 5 to 10 ° C for 7 hours. Next, 1 L of a saturated ammonium chloride aqueous solution was added dropwise at a temperature of 5 ° C, and then the temperature was raised to a temperature of 25 ° C. The white solid precipitated in the reaction solution was filtered, and the solvent was distilled off under reduced pressure. The precipitated white solid was filtered, and 1.5 L of ion-exchanged water was added to the obtained white solid, followed by stirring at 40 ° C for 1 hour. After that, the white solid was filtered, washed twice with 200 mL of ion-exchanged water, washed twice with 100 mL of ethyl acetate, and dried under vacuum to obtain 1,4,4a, 5,8,8a, 9,9a, 10,10a. -Decahydro-1,4: 5,8-dimethyl bridge anthracene-9,10-diol (DNHQ) as a white solid 84.2 g (100% purity and 82% yield by 1 H-NMR analysis).
DNHQ之物性値如下。The physical properties of DNHQ are as follows.
1 H-NMR(DMSO-d6 , σ(ppm));0.99(d,J=7.8Hz,1H),1.16(d,J=7.8Hz,1H),1.26-1.34(m,2H),1.52-1.62(m,2H),2.34-2.42(m,2H),2.77(s,2H),2.85(s,2H),2.91(brs,2H),4.26(s,1H),4.28(s,1H),6.04(t,J=1.8Hz,2H),6.09(t,J=1.8Hz,2H) CI-MS(m/z);245(M+1) 1 H-NMR (DMSO-d 6 , σ (ppm)); 0.99 (d, J = 7.8 Hz, 1H), 1.16 (d, J = 7.8 Hz, 1H), 1.26-1.34 (m, 2H), 1.52 -1.62 (m, 2H), 2.34-2.42 (m, 2H), 2.77 (s, 2H), 2.85 (s, 2H), 2.91 (brs, 2H), 4.26 (s, 1H), 4.28 (s, 1H ), 6.04 (t, J = 1.8 Hz, 2H), 6.09 (t, J = 1.8 Hz, 2H) CI-MS (m / z); 245 (M + 1)
於容量5L之反應容器中加入DNHQ87.0g(356mmol)、N,N-二甲胺基吡啶4.3g(35.2mmol)、吡啶1740g,冷卻到溫度5℃。然後費時20分鐘滴加甲磺醯氯87.0g(760mmol)後,升溫到溫度25℃,於同溫度反應9小時。然後滴加離子交換水2500g,將析出之白色固體過濾。將獲得之白色固體以10%鹽酸200mL、10%碳酸氫鈉水溶液200mL、再以離子交換水200mL洗淨5次,並真空乾燥。使獲得之白色固體128.9g溶於乙酸乙酯2800g,以無水硫酸鎂35g乾燥(脱水)。然後,將此乙酸乙酯溶液通入到矽膠管柱,將溶劑以蒸發器餾去,獲得二甲烷磺酸1,4,4a,5,8,8a,9,9a,10,10a-十氫-1,4:5,8-二甲橋蒽-9,10-二酯(DNCMS)之白色固體124.5g(1 H-NMR分析測得純度99%、產率87.4%)。In a reaction vessel with a capacity of 5 L, 87.0 g (356 mmol) of DNHQ, 4.3 g (35.2 mmol) of N, N-dimethylaminopyridine, and 1740 g of pyridine were added, and the temperature was cooled to 5 ° C. Then, 87.0 g (760 mmol) of methanesulfonyl chloride was added dropwise over a period of 20 minutes, and then the temperature was raised to 25 ° C, and the reaction was performed at the same temperature for 9 hours. Then, 2500 g of ion-exchanged water was added dropwise, and the precipitated white solid was filtered. The obtained white solid was washed 5 times with 200 mL of 10% hydrochloric acid, 200 mL of 10% sodium bicarbonate aqueous solution, 200 mL of ion-exchanged water, and dried under vacuum. 128.9 g of the obtained white solid was dissolved in 2800 g of ethyl acetate, and dried (dehydrated) with 35 g of anhydrous magnesium sulfate. Then, this ethyl acetate solution was passed into a silica gel column, and the solvent was distilled off with an evaporator to obtain 1,4,4a, 5,8,8a, 9,9a, 10,10a-decahydromethanesulfonic acid. 124.5 g of -1,4: 5,8-dimethyl bridge anthracene-9,10-diester (DNCMS) as a white solid (purity 99% by 1 H-NMR analysis, yield 87.4%).
DNCMS之物性値如下。The physical properties of DNCMS are as follows.
1 H-NMR(DMSO-d6 , σ(ppm));1.18(d,J=8.3Hz,1H),1.32(d,J=8.2Hz,1H),1.39-1.42(m,2H),2.00-2.15(m,2H),2.81(s,2H),2.85-2.90(m,2H),2.97(s,2H),3.22(s,6H),4.10-4.20(m,2H),6.23(s,2H),6.27(s,2H) CI-MS(m/z);401(M+1) 1 H-NMR (DMSO-d 6 , σ (ppm)); 1.18 (d, J = 8.3 Hz, 1H), 1.32 (d, J = 8.2 Hz, 1H), 1.39-1.42 (m, 2H), 2.00 -2.15 (m, 2H), 2.81 (s, 2H), 2.85-2.90 (m, 2H), 2.97 (s, 2H), 3.22 (s, 6H), 4.10-4.20 (m, 2H), 6.23 (s , 2H), 6.27 (s, 2H) CI-MS (m / z); 401 (M + 1)
於容量1L之反應容器裝入甲醇364g、氯仿62g、氯化銅(II)136g(1011mmol)、氯化鈀6g(33.7mmol)並攪拌。將系內之氣體環境取代為一氧化碳後,費時3小時滴加DNCMS27g(67.3mmol)溶於氯仿178g而得之溶液,於20-25℃反應4小時。其次,將系內之氣體環境從一氧化碳取代為氬氣後,從反應混合物餾去溶劑,並添加氯仿621g。更重複2次同樣的操作。並且,從獲得之茶綠色之懸浮液將不溶物以過濾除去。獲得之溶液以飽和碳酸氫鈉水溶液324g洗淨3次,再以精製水324g洗淨3次後,於有機層加入無水硫酸鎂2.7g、活性碳2.7g並攪拌。然後將溶液過濾後減壓濃縮,獲得白色固體51g。其次,實施利用矽膠層析(展開溶劑;己烷:乙酸乙酯=10:1(容量比))所為之精製,獲得9,10-雙((甲基磺醯基)氧)十四氫-1,4:5,8-二甲橋蒽-2,3,6,7-四羧酸酯(DNMTE)之白色固體27g HPLC分析測得純度97.1pa%、產率64.4%)。A reaction vessel having a capacity of 1 L was charged with 364 g of methanol, 62 g of chloroform, 136 g (1011 mmol) of copper (II) chloride, and 6 g (33.7 mmol) of palladium chloride, and stirred. After replacing the gas environment in the system with carbon monoxide, a solution prepared by dissolving 27 g (67.3 mmol) of DNCMS in 178 g of chloroform was added dropwise over 3 hours, and reacted at 20-25 ° C for 4 hours. Next, after replacing the gas environment in the system from carbon monoxide to argon, the solvent was distilled off from the reaction mixture, and 621 g of chloroform was added. Repeat the same operation twice more. And, the insoluble matter was removed from the obtained tea green suspension by filtration. The obtained solution was washed three times with 324 g of a saturated sodium bicarbonate aqueous solution and three times with 324 g of purified water, and then 2.7 g of anhydrous magnesium sulfate and 2.7 g of activated carbon were added to the organic layer and stirred. The solution was filtered and concentrated under reduced pressure to obtain 51 g of a white solid. Next, purification was performed by silica gel chromatography (developing solvent; hexane: ethyl acetate = 10: 1 (volume ratio)) to obtain 9,10-bis ((methylsulfonyl) oxy) tetradecyl- 27 g of a white solid of 1,4: 5,8-dimethyl bridge anthracene-2,3,6,7-tetracarboxylic acid ester (DNMTE) was analyzed by HPLC (purity: 97.1 pa%, yield: 64.4%).
DNMTE之物性値如下。The physical properties of DNMTE are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.49(d,J=10Hz,2H),2.31(d,J=10Hz,2H),2.62-2.67(m,2H),2.69(s,2H),2.87(s,4H),3.06(s,6H),3.19(s,2H),3.32(s,2H),3.64(s,6H),3.66(s,6H),4.98-5.12(m,2H) CI-MS(m/z);637(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.49 (d, J = 10 Hz, 2H), 2.31 (d, J = 10 Hz, 2H), 2.62-2.67 (m, 2H), 2.69 (s, 2H ), 2.87 (s, 4H), 3.06 (s, 6H), 3.19 (s, 2H), 3.32 (s, 2H), 3.64 (s, 6H), 3.66 (s, 6H), 4.98-5.12 (m, 2H) CI-MS (m / z); 637 (M + 1)
於容量500mL之反應容器中裝入碳酸鋰6.4g(86.8mmol)、N,N’-二甲基甲醯胺130g,升溫到150℃。然後,費時1小時滴加DNMTE27.6g(42.1mol)與N,N’-二甲基甲醯胺130g之混合液,於同溫度反應15小時。反應結束後將反應液減壓濃縮,獲得白色固體22.4g。其次,實施利用矽膠層析(展開溶劑;己烷:乙酸乙酯=10:1(容量比))所為之精製,然後實施利用再結晶(溶劑比;甲苯/庚烷=2:3)所為之精製,獲得1,2,3,4,4a,5,6,7,8,9a-十氫-1,4:5,8-二甲橋蒽-2,3,6,7-四羧酸四甲酯(DMHAE)之白色固體13.9g(HPLC分析測得純度95.1pa%、產率72.2%)。A 500-mL reaction container was charged with 6.4 g (86.8 mmol) of lithium carbonate and 130 g of N, N'-dimethylformamide, and the temperature was raised to 150 ° C. Then, a mixed solution of 27.6 g (42.1 mol) of DNMTE and 130 g of N, N'-dimethylformamide was added dropwise over 1 hour, and reacted at the same temperature for 15 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure to obtain 22.4 g of a white solid. Next, purification by silica gel chromatography (developing solvent; hexane: ethyl acetate = 10: 1 (volume ratio)) was performed, and then recrystallization (solvent ratio; toluene / heptane = 2: 3) was performed. Refined to obtain 1,2,3,4,4a, 5,6,7,8,9a-decahydro-1,4: 5,8-dimethylmethanthracene-2,3,6,7-tetracarboxylic acid Tetramethyl ester (DMHAE) was 13.9 g of a white solid (purity: 95.1 pa% by HPLC analysis, yield: 72.2%).
DMHAE之物性値如下。The physical properties of DMHAE are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.36(d,J=10Hz,1H),1.56(d,J=10Hz,1H),2.05(d,J=10Hz,1H),2.29(d,J=10Hz,1H),2.56(s,2H),2.83(s,2H),2.90(d,J=1.6Hz,2H),3.05(s,2H),3.07(d,J=1.6Hz,2H),3.61(s,6H),3.65(s,6H),5.10(s,2H) CI-MS(m/z);445(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.36 (d, J = 10 Hz, 1 H), 1.56 (d, J = 10 Hz, 1 H), 2.05 (d, J = 10 Hz, 1 H), 2.29 (d , J = 10Hz, 1H), 2.56 (s, 2H), 2.83 (s, 2H), 2.90 (d, J = 1.6Hz, 2H), 3.05 (s, 2H), 3.07 (d, J = 1.6Hz, 2H), 3.61 (s, 6H), 3.65 (s, 6H), 5.10 (s, 2H) CI-MS (m / z); 445 (M + 1)
於300mL之反應容器中裝入甲苯68mL、2,3-二氯-5,6-二氰基對苯醌7.3g(31.9mmol),升溫到80℃。滴加DMHAE(30.4mmol)13.5g溶於甲苯200mL而得之之溶液,反應8小時。反應結束後將反應液濃縮,於濃縮物添加氯仿130mL,獲得紅茶色懸浮液。其次進行過濾,分離為深紅黑色之過濾物與濾液。將濾液以飽和碳酸氫鈉水溶液100mL洗淨3次後,於取得之有機層添加無水硫酸鎂12g而脱水。其次進行過濾,將濾液濃縮乾固,獲得紅褐色固體5.6g。又,於前述深紅黑色之過濾物添加氯仿100mL,實施同樣的操作,獲得紅褐色固體4.0g。對於獲得之紅褐色固體9.6g實施利用再結晶(溶劑比;甲苯:庚烷=1:7)所為之精製,獲得1,2,3,4,5,6,7,8-八氫-1,4:5,8-二甲橋蒽-2,3,6,7-四羧酸四甲酯(DMAME)之乳白色固體7.4g(HPLC分析測得純度99.9pa%、產率56.6%)。A 300 mL reaction vessel was charged with 68 mL of toluene and 7.3 g (31.9 mmol) of 2,3-dichloro-5,6-dicyano-p-benzoquinone, and the temperature was raised to 80 ° C. A solution prepared by dissolving 13.5 g of DMHAE (30.4 mmol) in 200 mL of toluene was added dropwise, and reacted for 8 hours. After the reaction was completed, the reaction solution was concentrated, and 130 mL of chloroform was added to the concentrate to obtain a black tea-colored suspension. It was then filtered to separate the dark red and black filter and filtrate. The filtrate was washed three times with 100 mL of a saturated sodium bicarbonate aqueous solution, and then 12 g of anhydrous magnesium sulfate was added to the obtained organic layer to dehydrate it. After filtering, the filtrate was concentrated to dryness to obtain 5.6 g of a red-brown solid. Further, 100 mL of chloroform was added to the dark red and black filter, and the same operation was performed to obtain 4.0 g of a reddish brown solid. 9.6 g of the obtained red-brown solid was purified by recrystallization (solvent ratio; toluene: heptane = 1: 7) to obtain 1,2,3,4,5,6,7,8-octahydro-1 , 4: 5,8-Dimethanthracene-2,3,6,7-tetracarboxylic acid tetramethyl ester (DMAME), 7.4 g (purity 99.9pa%, 56.6% yield by HPLC analysis).
DMAME之物性値如下。The physical properties of DMAME are as follows.
1 H-NMR(CDCl3, σ(ppm));1.80(d,J=9.6Hz,2H),2.43(d,J=9.6Hz,2H),2.68(d,J=1.6Hz,4H),3.53(s,4H),3.67(s,12H),7.06(s,2H) CI-MS(m/z);442(M+1) 1 H-NMR (CDCl 3, σ (ppm)); 1.80 (d, J = 9.6 Hz, 2H), 2.43 (d, J = 9.6 Hz, 2H), 2.68 (d, J = 1.6 Hz, 4H), 3.53 (s, 4H), 3.67 (s, 12H), 7.06 (s, 2H) CI-MS (m / z); 442 (M + 1)
於容量100mL之反應容器中裝入DMAME5.27g(11.9mmol)、甲酸26.3g、對甲苯磺酸一水合物47mg(0.24mmol),於溫度98℃反應30小時。反應結束後將反應液減壓濃縮,並於濃縮物添加甲苯30g。重複此操作6次,將甲酸大致完全地餾去。將獲得之懸浮液過濾,並將獲得之固體以甲苯30g洗淨後,於80℃進行真空乾燥,獲得乳白色固體4.0g。之後以乙酸酐進行再結晶,再以N,N’-二甲基乙醯胺進行再結晶,獲得3a,4,6,6a,9a,10,12,12a-八氫-1H,3H-4,12:6,10-二甲橋蒽并[2,3-c:6,7-c’]二呋喃-1,3,7,9-四酮(DMADA)之白色固體3.28g(1 H-NMR分析測得純度98.3%、產率77.3%)。A reaction container with a capacity of 100 mL was charged with 5.27 g (11.9 mmol) of DMAME, 26.3 g of formic acid, and 47 mg (0.24 mmol) of p-toluenesulfonic acid monohydrate, and reacted at a temperature of 98 ° C for 30 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure, and 30 g of toluene was added to the concentrate. This operation was repeated 6 times, and the formic acid was distilled off almost completely. The obtained suspension was filtered, and the obtained solid was washed with 30 g of toluene, and then vacuum-dried at 80 ° C. to obtain 4.0 g of a milky white solid. Then it is recrystallized with acetic anhydride and then recrystallized with N, N'-dimethylacetamide to obtain 3a, 4,6,6a, 9a, 10,12,12a-octahydro-1H, 3H-4 , 12: 6,10-dimethylmethanthracene [2,3-c: 6,7-c '] difuran-1,3,7,9-tetraone (DMADA) 3.28 g ( 1 H -NMR analysis measured 98.3% purity and 77.3% yield).
DMADA之物性値如下。The physical properties of DMADA are as follows.
1 H-NMR(DMSO-d6 , σ(ppm));1.61(d,J=10.8Hz,2H),1.81(d,J=10.8Hz,2H),3.04(s,2H),3.04(s,2H),3.76(s,4H),7.39(s,2H) CI-MS(m/z);351(M+1) 1 H-NMR (DMSO-d 6 , σ (ppm)); 1.61 (d, J = 10.8 Hz, 2H), 1.81 (d, J = 10.8 Hz, 2H), 3.04 (s, 2H), 3.04 (s , 2H), 3.76 (s, 4H), 7.39 (s, 2H) CI-MS (m / z); 351 (M + 1)
[實施例S-2-1(EMDAdx之合成)][Example S-2-1 (Synthesis of EMDAdx)]
[化50]於容量3L之高壓釜中裝入順式-5-降莰烯-內向-2,3-二羧酸酐(endo -NA) 600g(3.66mol),然後裝入2,6-二丁基羥基甲苯1.20g。將系內進行氮氣取代後,於溫度-25℃添加1,3-丁二烯221g(4.09mol),於溫度150-160℃反應一晩,獲得白色固體760g。將以上之操作再重複2次,獲得白色固體2258g(產率36%)。然後,於獲得之白色固體2258g添加甲苯9.7L,於溫度102℃加熱攪拌,使固體溶解。於同溫度攪拌10分鐘後,添加庚烷2.6L,冷卻到室溫並攪拌一晩,將析出之固體過濾。將獲得之固體以庚烷2.6L洗淨後,於40℃進行5小時真空乾燥,獲得白色固體691g。[Chemical 50] In a 3L autoclave, 600g (3.66mol) of cis-5-norbornene-inward-2,3-dicarboxylic anhydride ( endo- NA) was charged, and then 2,6-dibutylhydroxytoluene was charged. 1.20g. After the system was replaced with nitrogen, 221 g (4.09 mol) of 1,3-butadiene was added at a temperature of -25 ° C, and the mixture was reacted at a temperature of 150-160 ° C for one night to obtain 760 g of a white solid. The above operation was repeated two more times to obtain 2258 g of a white solid (yield 36%). Then, 9.7 L of toluene was added to 2258 g of the obtained white solid, and the mixture was heated and stirred at a temperature of 102 ° C. to dissolve the solid. After stirring at the same temperature for 10 minutes, 2.6 L of heptane was added, cooled to room temperature and stirred overnight, and the precipitated solid was filtered. The obtained solid was washed with 2.6 L of heptane, and then vacuum-dried at 40 ° C. for 5 hours to obtain 691 g of a white solid.
於容量5L之反應容器裝入獲得之白色固體691g與甲苯2.1L。於溫度98℃加熱攪拌後,添加庚烷1.1L並冷卻到室溫,再攪拌一晩。將析出之固體過濾,以庚烷1.1L洗淨後,於40℃進行3小時真空乾燥,獲得(3aR,4S,9R,9aS)-3a,4,4a, 5,8,8a,9,9a-八氫-4,9-甲橋萘并[2,3-c]呋喃-1,3-二酮(OMNAdx)之白色固體634g(1 H-NMR分析測得純度99.1%、產率26%)。A reaction container having a capacity of 5 L was charged with 691 g of the obtained white solid and 2.1 L of toluene. After heating and stirring at a temperature of 98 ° C, 1.1 L of heptane was added and cooled to room temperature, followed by stirring for a while. The precipitated solid was filtered, washed with 1.1 L of heptane, and vacuum-dried at 40 ° C for 3 hours to obtain (3aR, 4S, 9R, 9aS) -3a, 4,4a, 5,8,8a, 9,9a -Octahydro-4,9-methanonaphtho [2,3-c] furan-1,3-dione (OMNAdx) as a white solid 634 g (purity 99.1% by 1 H-NMR analysis, yield 26%) ).
OMNAdx之物性値如下。The physical properties of OMNAdx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.50(d,J=11Hz,1H),1.52-1.63(m,3H),1.78-1.87(m,2H),2.12(d,J=11Hz,1H),2.24-2.35(m,2H),2.54-2.59(m,2H),3.42(dd,J=2.1Hz,J=3.5Hz,2H),5.83-5.91(m,2H) CI-MS(m/z);219(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.50 (d, J = 11 Hz, 1H), 1.52-1.63 (m, 3H), 1.78-1.87 (m, 2H), 2.12 (d, J = 11Hz , 1H), 2.24-2.35 (m, 2H), 2.54-2.59 (m, 2H), 3.42 (dd, J = 2.1Hz, J = 3.5Hz, 2H), 5.83-5.91 (m, 2H) CI-MS (m / z); 219 (M + 1)
於容量20L之反應容器中添加OMNAdx560g(2.54mol)、二氯甲烷9.5L。邊冷卻到溫度-55~-43℃,邊滴加溴496g(3.1mol)溶於二氯甲烷4.9L而得之溶液,反應1小時。反應結束後將溶劑以蒸發器除去,於獲得之固體中添加庚烷600mL並攪拌。並且將白色固體過濾,以庚烷4.5L洗淨後,於40℃減壓乾燥,獲得(3aR,4S,9R,9aS)-6,7-二溴十氫-4,9-甲橋萘并[2,3-c]呋喃-1,3-二酮(DBDNAdx)之白色固體805g(1 H-NMR分析測得純度100%、產率78%)。In a reaction vessel with a capacity of 20 L, 560 g (2.54 mol) of OMNAdx and 9.5 L of dichloromethane were added. While cooling to a temperature of -55 to -43 ° C, a solution obtained by dissolving 496 g (3.1 mol) of bromine in 4.9 L of dichloromethane was added dropwise and reacted for 1 hour. After the reaction, the solvent was removed by an evaporator, and 600 mL of heptane was added to the obtained solid, followed by stirring. The white solid was filtered, washed with 4.5 L of heptane, and dried under reduced pressure at 40 ° C. to obtain (3aR, 4S, 9R, 9aS) -6,7-dibromodecahydro-4,9-methacylnaphthalene. [2,3-c] furan-1,3-dione (DBDNAdx) was 805 g of a white solid (purity was 100% by 1 H-NMR analysis, yield was 78%).
DBDNAdx之物性値如下。The physical properties of DBDNAdx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.52-1.76(m,2H),1.88-2.05(m,4H),2.05-2.24(m,2H),2.57(brs,2H),3.48(t,J=2.5Hz,2H),4.30(ddd,J=3.6Hz,J=5.4Hz,J=12.5Hz,1H),4.68(dt,J=3.3Hz,J=3.5Hz,1H) CI-MS(m/z);379(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.52-1.76 (m, 2H), 1.88-2.05 (m, 4H), 2.05-2.24 (m, 2H), 2.57 (brs, 2H), 3.48 ( t, J = 2.5 Hz, 2H), 4.30 (ddd, J = 3.6 Hz, J = 5.4 Hz, J = 12.5 Hz, 1H), 4.68 (dt, J = 3.3 Hz, J = 3.5 Hz, 1H) CI- MS (m / z); 379 (M + 1)
於容量2L之反應容器加入馬來酸酐130g(1.33mol)、DBDNAdx 100g(264.5mmol),於溫度187℃反應2小時。反應結束後冷卻到溫度100℃,添加甲苯400mL。冷卻到室溫附近,將析出之固體過濾,以甲苯洗淨後,於60℃進行真空乾燥,獲得(3aR,4R,5S,5aR,8aS,9R,10S,10aS)-3a,4,4a,5,5a,8a, 9,9a,10,10a-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(EEMDAdx)之灰色固體75g(1 H-NMR分析測得純度98.4%、產率89%)。In a reaction vessel with a capacity of 2 L, 130 g (1.33 mol) of maleic anhydride and 100 g (264.5 mmol) of DBDNAdx were added, and reacted at a temperature of 187 ° C for 2 hours. After the reaction was completed, the temperature was cooled to 100 ° C, and 400 mL of toluene was added. After cooling to about room temperature, the precipitated solid was filtered, washed with toluene, and vacuum-dried at 60 ° C to obtain (3aR, 4R, 5S, 5aR, 8aS, 9R, 10S, 10aS) -3a, 4,4a, 5,5a, 8a, 9,9a, 10,10a-Decahydro-1H, 3H-4,10-Ethyl bridge-5,9-methyl bridge naphtho [2,3-c: 6,7-c '] 75 g of a gray solid of difuran-1,3,6,8-tetraone (EEMDAdx) (purity: 98.4% by 1 H-NMR analysis, yield: 89%).
EEMDAdx之物性値如下。The physical properties of EEMDAdx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.04(d,J=10.8Hz,1H),1.82(s,2H),2.30(d,J=10.8Hz,1H),2.62(s,2H),3.20(s,2H),3.39(m,2H),3.42(d,J=2.1Hz,J=3.4Hz,2H),6.20(dd,J=3.2Hz,J=4.5Hz,2H) CI-MS(m/z);314(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.04 (d, J = 10.8 Hz, 1H), 1.82 (s, 2H), 2.30 (d, J = 10.8 Hz, 1H), 2.62 (s, 2H ), 3.20 (s, 2H), 3.39 (m, 2H), 3.42 (d, J = 2.1Hz, J = 3.4Hz, 2H), 6.20 (dd, J = 3.2Hz, J = 4.5Hz, 2H) CI -MS (m / z); 314 (M + 1)
於容量2L之反應容器中加入EEMDAdx75g(239mmol)、原甲酸三甲酯152g、甲醇1500g、濃硫酸22.5g,於溫度63℃反應23小時。反應結束後將反應液減壓濃縮,於濃縮殘渣添加飽和碳酸氫鈉水溶液600g,並以氯仿500g萃取。將有機層以水200g洗淨2次,以無水硫酸鎂(MgSO4 )乾燥(脱水)後過濾,將濾液減壓濃縮,獲得固體80.7g。然後實施利用甲苯150g與庚烷450g所為之晶析,獲得(1R,4S,5R,6S,7R,8S,10S,11R)-1,4,4a,5,6,7,8,8a-八氫-1,4-乙橋-5,8-甲橋萘-6,7, 10,11-四羧酸四甲酯(EEMDEdx)之白色固體75g(1 H-NMR分析測得純度100%、產率77%)。75 g (239 mmol) of EEMDAdx, 152 g of trimethyl orthoformate, 1500 g of methanol, and 22.5 g of concentrated sulfuric acid were added to a reaction vessel having a capacity of 2 L, and the reaction was carried out at a temperature of 63 ° C. for 23 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure, 600 g of a saturated sodium bicarbonate aqueous solution was added to the concentrated residue, and the mixture was extracted with 500 g of chloroform. The organic layer was washed twice with 200 g of water, dried (dehydrated) with anhydrous magnesium sulfate (MgSO 4 ), and then filtered, and the filtrate was concentrated under reduced pressure to obtain 80.7 g of a solid. Then crystallization using 150g of toluene and 450g of heptane was carried out to obtain (1R, 4S, 5R, 6S, 7R, 8S, 10S, 11R) -1,4,4a, 5,6,7,8,8a-eight 75g of hydrogen-1,4-ethyl bridge-5,8-methacylnaphthalene-6,7,10,11-tetracarboxylic acid tetramethyl ester (EEMDEdx) as a white solid (purity 100% by 1 H-NMR analysis, 77% yield).
EEMDEdx之物性値如下。The physical properties of EEMDEdx are as follows.
1 H-NMR(CDCl3, σ(ppm));0.81(d,J=11Hz,1H),2.29(s,2H),2.43(s,2H),2.58(d,J=11Hz,1H),2.86(t,J=2.0Hz,2H),3.00(brs,2H),3.05(s,2H),3.57(s,6H),3.65(s,6H),6.28(dd,J=3.3Hz,J=4.6Hz,2H) CI-MS(m/z);407(M+1) 1 H-NMR (CDCl 3, σ (ppm)); 0.81 (d, J = 11 Hz, 1H), 2.29 (s, 2H), 2.43 (s, 2H), 2.58 (d, J = 11 Hz, 1H), 2.86 (t, J = 2.0 Hz, 2H), 3.00 (brs, 2H), 3.05 (s, 2H), 3.57 (s, 6H), 3.65 (s, 6H), 6.28 (dd, J = 3.3Hz, J = 4.6Hz, 2H) CI-MS (m / z); 407 (M + 1)
於容量200mL之反應容器中添加EEMDEdx6g(14.8mmol)、甲醇120g、10%銠-碳觸媒(N.E.Chemcat製、50wt%含水品)3g。將系內進行氫氣取代後,將氫氣加壓到0.9MPa,於內溫80℃反應4小時。反應結束後將反應物以N,N’-二甲基甲醯胺100mL洗淨並取出。實施獲得之反應懸浮液之矽藻土過濾後,減壓濃縮,獲得白色固體。將此操作重複7次,獲得白色固體41.2g(GC分析測得純度99.9%、產率97%)。其次,以矽膠管柱實施精製(展開溶劑;己烷/乙酸乙酯=3/1(v/v)),獲得(1R,2R,3S,4S,5R,6S,7R,8S)-十氫-1,4-乙橋-5,8-甲橋萘-2,3,6,7-四羧酸四甲酯(EMDEdx)之白色固體35g(GC分析測得純度100%、產率83%)。In a reaction container having a capacity of 200 mL, 3 g of EEMDEdx 6 g (14.8 mmol), 120 g of methanol, and 10% rhodium-carbon catalyst (manufactured by N.E. Chemcat, 50 wt% water-containing product) were added. After the system was replaced with hydrogen, the hydrogen was pressurized to 0.9 MPa and reacted at an internal temperature of 80 ° C for 4 hours. After the reaction was completed, the reaction product was washed with 100 mL of N, N'-dimethylformamide and taken out. The obtained reaction suspension was filtered through celite and concentrated under reduced pressure to obtain a white solid. This operation was repeated 7 times to obtain 41.2 g of a white solid (99.9% purity and 97% yield by GC analysis). Next, purification was performed using a silica gel column (developing solvent; hexane / ethyl acetate = 3/1 (v / v)) to obtain (1R, 2R, 3S, 4S, 5R, 6S, 7R, 8S) -decahydro 35 g of white solid -1,4-ethyl bridge-5,8-methacylnaphthalene-2,3,6,7-tetracarboxylic acid tetramethyl ester (EMDEdx) (100% purity by GC analysis, 83% yield) ).
EMDEdx之物性値如下。1 H-NMR(CDCl3 , σ(ppm));1.25(d,J=11Hz,1H),1.49(d,J=9.0Hz,2H),1.79(d,J=9.0Hz,2H),2.00(s,2H),2.14(s,2H),2.24(d,J=11Hz,1H),2.51(s,2H),2.90(s,2H),3.02(t,J=2.0Hz,2H),3.63(s,6H),3.64(s,6H) CI-MS(m/z);409(M+1)The physical properties of EMDEdx are as follows. 1 H-NMR (CDCl 3 , σ (ppm)); 1.25 (d, J = 11 Hz, 1H), 1.49 (d, J = 9.0 Hz, 2H), 1.79 (d, J = 9.0 Hz, 2H), 2.00 (s, 2H), 2.14 (s, 2H), 2.24 (d, J = 11 Hz, 1H), 2.51 (s, 2H), 2.90 (s, 2H), 3.02 (t, J = 2.0 Hz, 2H), 3.63 (s, 6H), 3.64 (s, 6H) CI-MS (m / z); 409 (M + 1)
於容量300mL之反應容器中添加EMDEdx30g(73.4mmol)、甲酸150g、對甲苯磺酸一水合物280mg(1.47mmol),於溫度95℃~99℃反應16小時。反應結束後將反應液減壓濃縮,於濃縮物添加甲苯72mL。重複此操作6次,將甲酸大致完全餾去。將獲得之懸浮液過濾,並將獲得之固體以甲苯35mL洗淨後,於80℃真空乾燥,獲得灰色固體23.4g。之後重複利用乙酸酐、N,N’-二甲基乙醯胺所為之再結晶,獲得(3aR,4R,5S,5aR,8aS,9R,10S,10aS)-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(EMDAdx)之白色固體18.9g(1 H-NMR分析測得純度98.5%、產率80%)。In a reaction container with a capacity of 300 mL, 30 g (73.4 mmol) of EMDEDx, 150 g of formic acid, and 280 mg (1.47 mmol) of p-toluenesulfonic acid monohydrate were added, and reacted at a temperature of 95 ° C to 99 ° C for 16 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure, and 72 mL of toluene was added to the concentrate. This operation was repeated 6 times, and formic acid was almost completely distilled off. The obtained suspension was filtered, and the obtained solid was washed with 35 mL of toluene, and then dried under vacuum at 80 ° C. to obtain 23.4 g of a gray solid. Afterwards, it was recrystallized by using acetic anhydride and N, N'-dimethylacetamide to obtain (3aR, 4R, 5S, 5aR, 8aS, 9R, 10S, 10aS) -decahydro-1H, 3H-4, 10-Ethyl-5,9-methanonaphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone (EMDAdx) as a white solid 18.9g ( 1 H-NMR analysis measured a purity of 98.5% and a yield of 80%).
EMDAdx之物性値如下。The physical properties of EMDAdx are as follows.
1 H-NMR(DMSO-d6 , σ(ppm));1.17(d,J=9.9Hz,2H),1.48(d,J=12Hz,1H),1.45-1.68(m,4H),2.04-2.14(m,3H),2.69(s,2H),3.29(s,2H),3.55(dd,J=1.2Hz,J=2.1Hz,2H) CI-MS(m/z);317(M+1) 1 H-NMR (DMSO-d 6 , σ (ppm)); 1.17 (d, J = 9.9 Hz, 2H), 1.48 (d, J = 12 Hz, 1H), 1.45-1.68 (m, 4H), 2.04- 2.14 (m, 3H), 2.69 (s, 2H), 3.29 (s, 2H), 3.55 (dd, J = 1.2Hz, J = 2.1Hz, 2H) CI-MS (m / z); 317 (M + 1)
[實施例S-2-2(EMDAxx之合成)][Example S-2-2 (Synthesis of EMDAxx)]
[化51]於3L之高壓釜內裝入順式-5-降莰烯-外向-2,3-二羧酸酐(exo -NA)600g(3.66mol)、2,6-二丁基羥基甲苯300mg。將系內進行氮氣取代後,於內溫-25℃添加1,3-丁二烯319g(5.91mol),於反應溫度140~166℃進行35小時攪拌,獲得白色固體866.2g(產率58%)。然後將獲得之白色固體866.2g以甲苯再結晶,獲得(3aR,4R,9S,9aS)-3a,4,4a,5,8,8a,9,9a-八氫-4,9-甲橋萘并[2,3-c]呋喃-1,3-二酮(OMNAxx)之白色結晶359g(1 H-NMR分析測得純度100%、產率45%)。[Chemical 51] A 3L autoclave was charged with 600 g (3.66 mol) of cis-5-norbornene-exo-2,3-dicarboxylic anhydride ( exo- NA) and 300 mg of 2,6-dibutylhydroxytoluene. After the inside of the system was replaced with nitrogen, 319 g (5.91 mol) of 1,3-butadiene was added at an internal temperature of -25 ° C, and the mixture was stirred at a reaction temperature of 140 to 166 ° C for 35 hours to obtain 866.2 g of a white solid (yield 58%). ). Then 866.2 g of the obtained white solid was recrystallized from toluene to obtain (3aR, 4R, 9S, 9aS) -3a, 4,4a, 5,8,8a, 9,9a-octahydro-4,9-methynaphthalene 359 g of white crystals of [2,3-c] furan-1,3-dione (OMNAxx) (purity was 100% by 1 H-NMR analysis, and yield was 45%).
OMNAxx之物性値如下。The physical properties of OMNAxx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.19(d,J=12Hz,1H),1.52-1.63(m,2H),1.73-1.82(m,2H),1.89(d,J=12Hz,1H),2.27-2.40(m,2H),2.56(t,J=1.2Hz,2H),2.98(d,J=1.2Hz,2H),5.80-5.92(m,2H) CI-MS(m/z);219(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.19 (d, J = 12 Hz, 1 H), 1.52-1.63 (m, 2H), 1.73-1.82 (m, 2H), 1.89 (d, J = 12 Hz , 1H), 2.27-2.40 (m, 2H), 2.56 (t, J = 1.2Hz, 2H), 2.98 (d, J = 1.2Hz, 2H), 5.80-5.92 (m, 2H) CI-MS (m / z); 219 (M + 1)
於容量3L之反應容器中裝入OMNAxx120g(550mmol)、二氯甲烷2.2L。邊冷卻到溫度-65~-60℃,邊費時2小時滴加溴105.4g(660mmol)溶於二氯甲烷200mL而得之溶液,反應1小時。此操作進行2次。並且收集2次分量之反應液,以蒸發器濃縮,獲得淡茶色固體。於獲得之淡茶色固體加入庚烷1.5L並過濾。並且將濾取之固體以庚烷500mL洗淨後,真空乾燥,獲得(3aR,4R,9S,9aS)-6,7-二溴十氫-4,9-甲橋萘并[2,3-c]呋喃-1,3-二酮(DBDNAxx)之白色固體313g(1 H-NMR分析測得純度100%、產率75%)。又,將濾液減壓濃縮,以庚烷500mL洗淨後真空乾燥,獲得DBDNAxx之白色固體78.1g(1 H-NMR分析測得純度100%、產率19%)。A reaction container having a capacity of 3 L was charged with 120 g (550 mmol) of OMNAxx and 2.2 L of dichloromethane. While cooling to a temperature of -65 to -60 ° C, a solution obtained by dissolving 105.4 g (660 mmol) of bromine in 200 mL of dichloromethane was added dropwise over 2 hours, and reacted for 1 hour. This operation is performed twice. The reaction solution was collected in two portions and concentrated by an evaporator to obtain a light brown solid. To the obtained light brown solid, 1.5 L of heptane was added and filtered. The filtered solid was washed with 500 mL of heptane and dried under vacuum to obtain (3aR, 4R, 9S, 9aS) -6,7-dibromodecahydro-4,9-methanonaphtho [2,3- c] 313 g of furan-1,3-dione (DBDNAxx) as a white solid (100% purity and 75% yield by 1 H-NMR analysis). The filtrate was concentrated under reduced pressure, washed with 500 mL of heptane, and dried under vacuum to obtain 78.1 g of DBDNAxx as a white solid (100% purity and 19% yield by 1 H-NMR analysis).
DBDNAxx之物性値如下。The physical properties of DBDNAxx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.28(d,J=12Hz,1H),1.62(q,J=12Hz,1H),1.84-2.24(m,5H),2.59(s,2H),3.03(dd,J=7.3Hz,J=23Hz,2H),4.32(ddd,J=3.3Hz,J=5.5Hz,J=12Hz,1H),4.73(dd,J=3.0Hz,J=7.0Hz,1H) CI-MS(m/z);379(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.28 (d, J = 12 Hz, 1H), 1.62 (q, J = 12 Hz, 1H), 1.84-2.24 (m, 5H), 2.59 (s, 2H ), 3.03 (dd, J = 7.3 Hz, J = 23 Hz, 2H), 4.32 (ddd, J = 3.3 Hz, J = 5.5 Hz, J = 12 Hz, 1H), 4.73 (dd, J = 3.0 Hz, J = 7.0Hz, 1H) CI-MS (m / z); 379 (M + 1)
於容量2L之反應容器中添加馬來酸酐259g(2.64mol)、DBDNAxx 200g(529mmol),於反應溫度190℃反應2小時。反應結束後冷卻到溫度100℃,添加甲苯900mL。冷卻到室溫附近,分濾析出之固體。將獲得之固體以甲苯900mL洗淨後,以60℃、3小時之條件進行減壓乾燥,獲得(3aR,4R,5S,5aS,8aR,9R, 10S,10aS)-3a,4,4a,5,5a,8a,9,9a,10,10a-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(EEMDAxx)之淡茶色固體140.2g(1 H-NMR分析測得純度97.2%、產率82%)。In a reaction vessel with a capacity of 2 L, 259 g (2.64 mol) of maleic anhydride and 200 g (529 mmol) of DBDNAxx were added, and reacted at a reaction temperature of 190 ° C for 2 hours. After the reaction was completed, the temperature was cooled to 100 ° C, and 900 mL of toluene was added. After cooling to room temperature, the precipitated solid was separated by filtration. The obtained solid was washed with 900 mL of toluene, and then dried under reduced pressure at 60 ° C for 3 hours to obtain (3aR, 4R, 5S, 5aS, 8aR, 9R, 10S, 10aS) -3a, 4, 4a, 5 , 5a, 8a, 9,9a, 10,10a-decahydro-1H, 3H-4,10-ethyl bridge-5,9-methyl bridge naphtho [2,3-c: 6,7-c '] 140.2 g of a light brown solid of furan-1,3,6,8-tetraketone (EEMDAxx) (97.2% purity and 82% yield by 1 H-NMR analysis).
又,對於DBDNAxx180g(476mmol)進行同樣的操作,獲得EEMDAxx之淡茶色固體139.2g(1 H-NMR純度98.9%、產率92%)。Further, the same operation was performed on 180 g (476 mmol) of DBDNAxx to obtain 139.2 g of a light brown solid of EEMDAxx ( 1 H-NMR purity 98.9%, yield 92%).
EEMDAxx之物性値如下。The physical properties of EEMDAxx are as follows.
1 H-NMR(CDCl3 , σ(ppm));0.59(d,J=12Hz,1H),2.01(s,2H),2.12(d,J=12Hz,1H),2.55(s,2H),2.98(d,J=1.4Hz,2H),3.20-3.30(m,4H),6.20(dd,J=3.1Hz,J=4.4Hz,2H) CI-MS(m/z);314(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 0.59 (d, J = 12 Hz, 1H), 2.01 (s, 2H), 2.12 (d, J = 12 Hz, 1H), 2.55 (s, 2H), 2.98 (d, J = 1.4 Hz, 2H), 3.20-3.30 (m, 4H), 6.20 (dd, J = 3.1 Hz, J = 4.4 Hz, 2H) CI-MS (m / z); 314 (M + 1)
於容量20L之反應容器中裝入EEMDAxx254.9g(794.8mmol)、甲醇10L、原甲酸三甲酯533g、濃硫酸63g,於溫度61~67℃攪拌79小時。反應結束後將反應液減壓濃縮,獲得灰色固體513g。將獲得之固體溶於氯仿3256g,滴加到7重量%碳酸氫鈉水溶液1700g。於已分液之有機層添加無水硫酸鎂31.6g及活性碳26.8g,於室溫攪拌1小時後,進行過濾,將濾液以氯仿322g洗淨並減壓濃縮,獲得灰色固體325.3g。然後將獲得之灰色固體以甲醇再結晶,獲得(1R,4S,5R,6R,7S,8S,10S,11R)-1,4,4a,,6,7,8,8a-八氫-1,4-乙橋-5,8-甲橋萘-6,7,10,11-四羧酸四甲酯(EEMDExx)之白色固體294.9g(GC分析測得純度100%、產率91%)。A reaction vessel with a capacity of 20 L was charged with EEMDAxx254.9 g (794.8 mmol), 10 L of methanol, 533 g of trimethyl orthoformate, and 63 g of concentrated sulfuric acid, and stirred at a temperature of 61 to 67 ° C. for 79 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure to obtain 513 g of a gray solid. The obtained solid was dissolved in 3256 g of chloroform, and 1700 g of a 7% by weight aqueous sodium hydrogen carbonate solution was added dropwise. To the separated organic layer were added 31.6 g of anhydrous magnesium sulfate and 26.8 g of activated carbon, and the mixture was stirred at room temperature for 1 hour, and then filtered. The filtrate was washed with 322 g of chloroform and concentrated under reduced pressure to obtain 325.3 g of a gray solid. The obtained gray solid was then recrystallized from methanol to obtain (1R, 4S, 5R, 6R, 7S, 8S, 10S, 11R) -1,4,4a ,, 6,7,8,8a-octahydro-1, 294.9 g of 4-ethyl bridge-5,8-methacylnaphthalene-6,7,10,11-tetracarboxylic acid tetramethyl ester (EEMDExx) as a white solid (100% purity and 91% yield by GC analysis).
EEMDExx之物性値如下。The physical properties of EEMDExx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.55(d,J=11Hz,1H),1.61(s,2H),2.29(d,J=11Hz,1H),2.43(s,2H),2.62(d,J=1.9Hz,2H),2.97(s,2H),3.03(s,2H),3.58(s,6H),3.60(s,6H),6.23(dd,J=3.2Hz,J=4.6Hz,2H) CI-MS(m/z);407(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.55 (d, J = 11 Hz, 1H), 1.61 (s, 2H), 2.29 (d, J = 11 Hz, 1H), 2.43 (s, 2H), 2.62 (d, J = 1.9 Hz, 2H), 2.97 (s, 2H), 3.03 (s, 2H), 3.58 (s, 6H), 3.60 (s, 6H), 6.23 (dd, J = 3.2Hz, J = 4.6Hz, 2H) CI-MS (m / z); 407 (M + 1)
於容量3L之高壓釜中添加EEMDExx98.2g(242mmol)、甲醇1720g,並添加10%銠-碳觸媒(N.E. Chemcat製、50%含水品)49.1g。將系內進行氫氣取代後,將氫氣加壓到0.9MPa,於內溫80℃反應4小時。反應結束後邊將析出之固體以N,N’-二甲基甲醯胺3235g溶解,邊取出反應物,進行矽藻土過濾,並去除觸媒。此操作對於EEMDExx97.3g(239mmol)更進行2次。然後將全部的濾液合併,減壓濃縮,獲得灰色固體289.1g。將獲得之灰色固體以氯仿700g與庚烷4373g再結晶,獲得(1R,2R,3S,4S,5R,6R,7S,8S)-十氫-1,4-乙橋-5,8-甲橋萘-2,3,6,7-四羧酸四甲酯(EMDExx)之微灰色固體283.0g(GC分析測得純度99.9pa%、產率96%)。In an autoclave with a capacity of 3 L, EEMDExx 98.2 g (242 mmol) and 1,720 g of methanol were added, and 49.1 g of 10% rhodium-carbon catalyst (manufactured by N.E. Chemcat, 50% water-containing product) was added. After the system was replaced with hydrogen, the hydrogen was pressurized to 0.9 MPa and reacted at an internal temperature of 80 ° C for 4 hours. After the reaction was completed, the precipitated solid was dissolved with 3235 g of N, N'-dimethylformamide, and the reaction product was taken out, filtered through celite, and the catalyst was removed. This operation was performed twice more for EEMDExx 97.3 g (239 mmol). Then, all the filtrates were combined and concentrated under reduced pressure to obtain 289.1 g of a gray solid. The obtained gray solid was recrystallized from 700 g of chloroform and 4373 g of heptane to obtain (1R, 2R, 3S, 4S, 5R, 6R, 7S, 8S) -decahydro-1,4-ethyl bridge-5,8-methyl bridge Naphthalene-2,3,6,7-tetracarboxylic acid tetramethyl ester (EMDExx) was a fine gray solid 283.0 g (purity 99.9pa% and yield 96% by GC analysis).
EMDExx之物性値如下。The physical properties of EMDExx are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.52(d,J=9.0Hz,2H),1.58(s,2H),1.76(d,J=9.0Hz,2H),1.95-2.10(m,4H),2.52(s,2H),2.71(d,J=1.6Hz,2H),2.84(s,2H),3.63(s,6H),3.64(s,6H) CI-MS(m/z);409(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.52 (d, J = 9.0 Hz, 2H), 1.58 (s, 2H), 1.76 (d, J = 9.0 Hz, 2H), 1.95-2.10 (m , 4H), 2.52 (s, 2H), 2.71 (d, J = 1.6Hz, 2H), 2.84 (s, 2H), 3.63 (s, 6H), 3.64 (s, 6H) CI-MS (m / z ); 409 (M + 1)
於容量3L之反應容器中加入EMDExx282.0g(689.7mmol)、甲酸1410g、對甲苯磺酸一水合物3.28g(17mmol),於溫度95℃~97℃反應19小時。反應結束後將反應液減壓濃縮,於濃縮物添加甲苯700mL。重複此操作6次,將甲酸大致完全地餾去。將獲得之懸浮液過濾,將獲得之固體以甲苯490mL洗淨後,於80℃真空乾燥,獲得灰色固體219.6g。之後實施利用乙酸酐所為之再結晶,再進行利用N,N’-二甲基甲醯胺所為之再結晶,獲得(3aR,4R,5S,5aS,8aR,9R,10S,10aS)-十氫-1H,3H-4,10-乙橋-5,9-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(EMDAxx)之白色固體175.9g(1 H-NMR分析測得純度99.4%、產率96%)。EMDExx 282.0 g (689.7 mmol), formic acid 1410 g, and p-toluenesulfonic acid monohydrate 3.28 g (17 mmol) were added to a reaction vessel with a capacity of 3 L, and the reaction was carried out at a temperature of 95 ° C to 97 ° C for 19 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure, and 700 mL of toluene was added to the concentrate. This operation was repeated 6 times, and the formic acid was distilled off almost completely. The obtained suspension was filtered, and the obtained solid was washed with 490 mL of toluene, and then dried under vacuum at 80 ° C. to obtain 219.6 g of a gray solid. Thereafter, recrystallization using acetic anhydride and recrystallization using N, N'-dimethylformamide were performed to obtain (3aR, 4R, 5S, 5aS, 8aR, 9R, 10S, 10aS) -decahydro -1H, 3H-4,10-ethyl bridge-5,9-methyl bridge naphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone (EMDAxx) 175.9 g of a white solid (99.4% purity and 96% yield by 1 H-NMR analysis).
再者,使用獲得之EMDAxx150g,以250~290℃/5Pa之昇華條件進行精製,獲得EMDAxx之白色固體146g(1 H-NMR分析測得純度100%、回收率97.6%)。Furthermore, 150 g of the obtained EMDAxx was refined under the sublimation conditions of 250 to 290 ° C./5Pa to obtain 146 g of a white solid of EMDAxx (purity was 100% by 1 H-NMR analysis, and the recovery was 97.6%).
EMDAxx之物性値如下。The physical properties of EMDAxx are as follows.
1 H-NMR(DMSO-d6 , σ(ppm));0.98(d,J=13Hz,1H),1.15(d,J=9.4Hz,2H),1.57(d,J=9.4Hz,2H),1.81(s,2H),1.91(d,J=13Hz,1H),2.17(s,2H),2.63(s,2H),3.04(s,2H),3.19(s,2H) CI-MS(m/z);317(M+1) 1 H-NMR (DMSO-d 6 , σ (ppm)); 0.98 (d, J = 13 Hz, 1H), 1.15 (d, J = 9.4 Hz, 2H), 1.57 (d, J = 9.4 Hz, 2H) , 1.81 (s, 2H), 1.91 (d, J = 13Hz, 1H), 2.17 (s, 2H), 2.63 (s, 2H), 3.04 (s, 2H), 3.19 (s, 2H) CI-MS ( m / z); 317 (M + 1)
[實施例S-3(BNDA之合成)][Example S-3 (Synthesis of BNDA)]
[化52]於容量1L之高壓釜中裝入順式-1,4-二氯-2-丁烯233g(1.76mol)、二環戊二烯245g(1.96mol)、甲苯176mL。將系內進行氮氣取代後,於溫度180℃反應5小時。打開高壓釜,取出反應物並濃縮。[Chemical 52] A 1-liter autoclave was charged with 233 g (1.76 mol) of cis-1,4-dichloro-2-butene, 245 g (1.96 mol) of dicyclopentadiene, and 176 mL of toluene. After replacing the inside of the system with nitrogen, the reaction was carried out at a temperature of 180 ° C for 5 hours. The autoclave was opened, the reaction was removed and concentrated.
然後於容量1L之高壓釜中裝入順式-1,4-二氯-2-丁烯149g(1.13mol)、二環戊二烯156g(1.25mol)、甲苯112mL。將系內氮氣取代後,於溫度180℃反應5小時。打開高壓釜,取出反應物並濃縮。Then, an autoclave having a capacity of 1 L was charged with 149 g (1.13 mol) of cis-1,4-dichloro-2-butene, 156 g (1.25 mol) of dicyclopentadiene, and 112 mL of toluene. After replacing the nitrogen in the system, the reaction was carried out at a temperature of 180 ° C for 5 hours. The autoclave was opened, the reaction was removed and concentrated.
將合計2次反應獲得之反應物(濃縮殘渣)合併(共計942g),進行減壓蒸餾,獲得5,6-雙(氯甲基)雙環[2.2.1]庚-2-烯(BCMN)之淡茶色液體396.8g(GC分析測得純度74.7%、產率65%)。The reactants (concentrated residues) obtained from the total of two reactions were combined (a total of 942 g) and distilled under reduced pressure to obtain 5,6-bis (chloromethyl) bicyclo [2.2.1] hept-2-ene (BCMN). Light brown liquid 396.8 g (purity 74.7%, yield 65% by GC analysis).
BCMN之物性値如下。The physical properties of BCMN are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.37(d,J=8.4Hz,1H),1.56(d,J=8.4Hz,1H),2.55-2.67(m,2H),3.06-3.17(m,4H),3.47(dd,J=5.8Hz,J=10Hz,2H),6.25(t,J=2.0Hz,2H) CI-MS(m/z);191(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.37 (d, J = 8.4 Hz, 1H), 1.56 (d, J = 8.4 Hz, 1H), 2.55-2.67 (m, 2H), 3.06-3.17 (m, 4H), 3.47 (dd, J = 5.8Hz, J = 10Hz, 2H), 6.25 (t, J = 2.0Hz, 2H) CI-MS (m / z); 191 (M + 1)
於容量5L之反應容器中添加85wt%氫氧化鈉水溶液307g(4.65mol)、乙醇2.3L、BCMN396.8g(1.55mol),於反應溫度78℃進行41小時加熱攪拌。反應結束後將獲得之懸浮液過濾。然後將濾液冷卻到溫度10℃,邊冷卻到溫度10~20℃邊滴加濃硫酸120g,獲得懸浮液。將獲得之懸浮液過濾,並將濾液於55-58℃/290-300mmHg進行減壓蒸餾,獲得5,6-二亞甲基雙環[2.2.1]庚-2-烯(CYDE)之乙醇溶液2424g。In a reaction vessel having a capacity of 5 L, 307 g (4.65 mol) of an 85 wt% sodium hydroxide aqueous solution, 2.3 L of ethanol, and 396.8 g (1.55 mol) of BCMN were added, and the mixture was heated and stirred at a reaction temperature of 78 ° C for 41 hours. After the reaction was completed, the obtained suspension was filtered. Then, the filtrate was cooled to a temperature of 10 ° C, and 120 g of concentrated sulfuric acid was added dropwise while cooling to a temperature of 10 to 20 ° C to obtain a suspension. The obtained suspension was filtered, and the filtrate was distilled under reduced pressure at 55-58 ° C / 290-300mmHg to obtain an ethanol solution of 5,6-dimethylmethylenebicyclo [2.2.1] hept-2-ene (CYDE). 2424g.
CYDE之物性値如下。The physical properties of CYDE are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.57(d,J=8.2Hz,1H),1.77(d,J=8.2Hz,1H),3.30(d,J=1.8Hz,2H),4.95(s,2H),5.16(s,2H),6.19(s,2H) CI-MS(m/z);119(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.57 (d, J = 8.2 Hz, 1H), 1.77 (d, J = 8.2 Hz, 1H), 3.30 (d, J = 1.8 Hz, 2H), 4.95 (s, 2H), 5.16 (s, 2H), 6.19 (s, 2H) CI-MS (m / z); 119 (M + 1)
於容量10L之反應容器中添加獲得之CYDE之乙醇溶液2424g、乙炔二羧酸二甲酯264.3g(1.86mol),於反應溫度70~78℃反應17小時。反應結束後將乙醇減壓餾去,獲得茶色液體369.3g。其次,以矽膠管柱層析(展開溶劑;己烷:乙酸乙酯=15:1(容量比))進行精製,獲得為茶色液體之含1,4,5,8-四氫-1,4-甲橋萘-6,7-二羧酸二甲酯(CYME)之餾分(1)126g(GC分析測得純度85.6pa%)及餾分(2)177g(GC分析測得純度50.9pa%)之2種餾分[合計產率(BCMN基準之產率)49%]。In a reaction container with a capacity of 10 L, 2424 g of the obtained ethanol solution of CYDE and 264.3 g (1.86 mol) of dimethyl acetylene dicarboxylate were added, and the reaction was performed at a reaction temperature of 70 to 78 ° C. for 17 hours. After the reaction was completed, the ethanol was distilled off under reduced pressure to obtain 369.3 g of a brown liquid. Next, it was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 15: 1 (volume ratio)) to obtain a brown liquid containing 1,4,5,8-tetrahydro-1,4. -Dimethylnaphthalene-6,7-dicarboxylate (CYME) fraction (1) 126g (purity measured by GC analysis 85.6pa%) and fraction (2) 177g (purity measured by GC analysis 50.9pa%) The two fractions [total yield (BCMN-based yield) 49%].
CYME之物性値如下。The physical properties of CYME are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.98(d,J=0.8Hz,2H),2.85-3.02(m,2H),3.21-3.40(m,4H),3.76(s,6H),6.76(t,J=1.8Hz,2H) CI-MS(m/z);261(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.98 (d, J = 0.8 Hz, 2H), 2.85-3.02 (m, 2H), 3.21-3.40 (m, 4H), 3.76 (s, 6H) , 6.76 (t, J = 1.8Hz, 2H) CI-MS (m / z); 261 (M + 1)
於容量3L之反應容器中,於氬氣環境下加入含有CYME之餾分(1)126g(純度85.6pa%;414.4mmol)、二氯甲烷1.3L、2,3-二氯-5,6-二氰基對苯醌138g (607.9mmol),於20℃反應7小時。In a reaction container with a capacity of 3 L, 126 g of CYME-containing fraction (1) (purity 85.6 pa%; 414.4 mmol), 1.3 m of dichloromethane, and 2,3-dichloro-5,6-di were added under an argon atmosphere. 138 g (607.9 mmol) of cyano p-benzoquinone was reacted at 20 ° C for 7 hours.
又,於容量3L之反應容器中,在氬氣環境下添加含CYME之餾分(2)177g(純度50.9pa%;346.1mmol)、二氯甲烷890mL、2,3-二氯-5,6-二氰基對苯醌97.7g (430.4mmol),於20℃反應7小時。In a reaction container with a capacity of 3 L, 177 g of a CYME-containing fraction (2) (purity 50.9 pa%; 346.1 mmol), 890 mL of dichloromethane, and 2,3-dichloro-5,6- were added under an argon atmosphere. 97.7 g (430.4 mmol) of dicyano-p-benzoquinone were reacted at 20 ° C for 7 hours.
合併2次反應獲得之反應物並減壓濃縮,獲得茶色液體457.4g。然後,以矽膠層析(展開溶劑;己烷:乙酸乙酯=15:1(容量比))精製,獲得紅色油狀物質248.9g。將此油狀物質溶於乙酸乙酯2L,以飽和碳酸氫鈉水溶液500mL洗淨3次,再以飽和食鹽水500mL洗淨後,以硫酸鈉脱水乾燥並過濾後,將濾液減壓濃縮,獲得1,4-二氫-1,4-甲橋萘-6,7-二羧酸二甲酯(CYPDM)之紅色油狀物質146g(GC分析測得純度99.1pa%、產率74%)。The reactants obtained from the two reactions were combined and concentrated under reduced pressure to obtain 457.4 g of a brown liquid. Then, it was purified by silica gel chromatography (developing solvent; hexane: ethyl acetate = 15: 1 (volume ratio)) to obtain 248.9 g of a red oily substance. This oily substance was dissolved in 2 L of ethyl acetate, washed three times with 500 mL of a saturated sodium bicarbonate aqueous solution, and then washed with 500 mL of a saturated saline solution, dried over sodium sulfate and filtered, and the filtrate was concentrated under reduced pressure to obtain 146 g of a red oily substance of dimethyl 1,4-dihydro-1,4-methylnaphthalene-6,7-dicarboxylic acid (CYPDM) (purity: 99.1 pa% by GC analysis, yield: 74%).
CYPDM之物性値如下。The physical properties of CYPDM are as follows.
1 H-NMR(CDCl3 , σ(ppm));2.26(d,J=7.6Hz,1H),2.36(d,J=7.6Hz,1H),3.85(s,6H),3.94(t,J=1.8Hz,2H),6.77(t,J=1.8Hz,2H),7.56(s,2H) CI-MS(m/z);259(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 2.26 (d, J = 7.6 Hz, 1H), 2.36 (d, J = 7.6 Hz, 1H), 3.85 (s, 6H), 3.94 (t, J = 1.8Hz, 2H), 6.77 (t, J = 1.8Hz, 2H), 7.56 (s, 2H) CI-MS (m / z); 259 (M + 1)
於容量500mL之反應容器裝入甲醇135g、氯仿41g、氯化銅(II)52g (387mmol)、氯化鈀14mg(0.08mmol)。將系內之氣體環境取代為一氧化碳後,費時6小時滴加CYPDM20g(76.7mmol)溶於氯仿66g而得之溶液,於室溫反應3小時。其次將系內之氣體環境從一氧化碳取代為氬氣後,從反應混合物餾去溶劑,並添加氯仿300g。再減壓濃縮並餾去溶劑,添加氯仿300g。並且從獲得之茶綠色之懸浮液以過濾去除不溶物。將獲得之溶液以飽和碳酸氫鈉水溶液240g洗淨3次,再以精製水240g洗淨3次後,於有機層添加無水硫酸鎂4g、活性碳2g並攪拌。並且,將溶液過濾後減壓濃縮,獲得淡茶色固體26.7g。其次,實施利用矽膠層析(展開溶劑;己烷:乙酸乙酯=15:1(容量比))所為之精製,然後實施利用再結晶(溶劑比;甲苯/庚烷=2.5:1(容量比))所為之精製,獲得1,2,3,4-四氫-1,4-甲橋萘-2,3,6,7-四羧酸四甲酯(BNME)之白色固體22.4g(HPLC分析測得純度94.8pa%、產率67.5%)。A 500 mL reaction container was charged with 135 g of methanol, 41 g of chloroform, 52 g (387 mmol) of copper (II) chloride, and 14 mg (0.08 mmol) of palladium chloride. After replacing the gas environment in the system with carbon monoxide, a solution obtained by dissolving 20 g (76.7 mmol) of CYPDM in 66 g of chloroform was added dropwise over 6 hours, and reacted at room temperature for 3 hours. Next, after replacing the gas environment in the system from carbon monoxide to argon, the solvent was distilled off from the reaction mixture, and 300 g of chloroform was added. After concentrating under reduced pressure, the solvent was distilled off, and 300 g of chloroform was added. The insoluble matter was removed from the obtained tea green suspension by filtration. The obtained solution was washed three times with 240 g of a saturated sodium bicarbonate aqueous solution and three times with 240 g of purified water, and then 4 g of anhydrous magnesium sulfate and 2 g of activated carbon were added to the organic layer and stirred. The solution was filtered and concentrated under reduced pressure to obtain 26.7 g of a light brown solid. Next, purification by silica gel chromatography (developing solvent; hexane: ethyl acetate = 15: 1 (volume ratio)) was performed, and then recrystallization (solvent ratio; toluene / heptane = 2.5: 1 (volume ratio) was performed. )) Refined to obtain 22.4 g of white solid 1,2,3,4-tetrahydro-1,4-methyl bridge naphthalene-2,3,6,7-tetracarboxylic acid (BNME) (HPLC Analytical analysis revealed a purity of 94.8 pa% and a yield of 67.5%).
BNME之物性値如下。The physical properties of BNME are as follows.
1 H-NMR(CDCl3 , σ(ppm));1.89(d,J=10Hz,1H),2.54(d,J=10Hz,1H),2.74(d,J=2.0Hz,2H),3.67(t,J=2.0Hz,2H),3.70(s,6H),3.89(s,6H),7.57(s,2H) CI-MS(m/z);377(M+1) 1 H-NMR (CDCl 3 , σ (ppm)); 1.89 (d, J = 10 Hz, 1H), 2.54 (d, J = 10 Hz, 1H), 2.74 (d, J = 2.0 Hz, 2H), 3.67 ( t, J = 2.0Hz, 2H), 3.70 (s, 6H), 3.89 (s, 6H), 7.57 (s, 2H) CI-MS (m / z); 377 (M + 1)
於容量200mL之反應容器中加入BNME20g(50.4mmol)、甲酸60g、對甲苯磺酸一水合物194.2mg(1.02mmol),於內溫95℃~99℃反應57小時。反應結束後將反應液減壓濃縮,於濃縮物中添加甲苯42g。重複此操作7次,將甲酸大致完全餾去。將獲得之懸浮液過濾,並將獲得之固體以甲苯21g洗淨後,於80℃真空乾燥,獲得乳白色固體16.1g。之後實施利用乙酸酐所為之再結晶,再實施利用N,N’-二甲基乙醯胺所為之再結晶,獲得3a,4,10,10a-四氫-1H,3H-4,10-甲橋萘并[2,3-c:6,7-c’]二呋喃-1,3,6,8-四酮(BNDA)之白色固體8.39g(1 H-NMR分析測得純度98.8%、產率57.9%)。In a reaction container with a capacity of 200 mL, 20 g (50.4 mmol) of BNME, 60 g of formic acid, and 194.2 mg (1.02 mmol) of p-toluenesulfonic acid monohydrate were added, and reacted at an internal temperature of 95 ° C to 99 ° C for 57 hours. After the reaction was completed, the reaction solution was concentrated under reduced pressure, and 42 g of toluene was added to the concentrate. This operation was repeated 7 times, and formic acid was almost completely distilled off. The obtained suspension was filtered, and the obtained solid was washed with 21 g of toluene, and then dried under vacuum at 80 ° C. to obtain 16.1 g of a milky white solid. Thereafter, recrystallization using acetic anhydride was performed, and recrystallization using N, N'-dimethylacetamide was performed to obtain 3a, 4,10,10a-tetrahydro-1H, 3H-4,10-formaldehyde. Bridgenaphtho [2,3-c: 6,7-c '] difuran-1,3,6,8-tetraone (BNDA) 8.39 g (purity 98.8% by 1 H-NMR analysis, Yield: 57.9%).
再者,使用獲得之BNDA15g,以220~230℃/5Pa之昇華條件進行精製,獲得BNDA之白色固體11.6g(1 H-NMR分析測得純度100%、回收率76.4%)。Furthermore, 15 g of the obtained BNDA was used for refining at a sublimation condition of 220 to 230 ° C./5 Pa to obtain 11.6 g of BNDA as a white solid (100% purity by 1 H-NMR analysis and 76.4% recovery).
BNDA之物性値如下。The physical properties of BNDA are as follows.
1 H-NMR(DMSO-d6 , σ(ppm));1.79(d,J=15Hz,1H),1.93(d,J=15Hz,1H),3.21(s,2H),4.05(s,2H),8.07(s,2H) CI-MS(m/z);285(M+1) 1 H-NMR (DMSO-d 6 , σ (ppm)); 1.79 (d, J = 15 Hz, 1H), 1.93 (d, J = 15 Hz, 1H), 3.21 (s, 2H), 4.05 (s, 2H ), 8.07 (s, 2H) CI-MS (m / z); 285 (M + 1)
[實施例1] 於經氮氣取代之反應容器中裝入DABAN0.60g(2.6毫莫耳),添加NMP6.29g,其量係使進料單體總質量(二胺成分與羧酸成分之總和)成為20質量%之量,於室溫攪拌1小時。於此溶液緩慢添加TNDA1.12g(2.6毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 1] In a reaction vessel substituted with nitrogen, 0.60 g (2.6 mmol) of DABAN was charged, and NMP 6.29 g was added, and the amount was based on the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component). ) To an amount of 20% by mass, and stirred at room temperature for 1 hour. To this solution was slowly added 1.12 g (2.6 mmol) of TNDA. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下),直接在玻璃基板上從室溫加熱到440℃而進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated to room temperature to 440 ° C directly on the glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to perform thermal hydrazone imine. Into a colorless and transparent polyfluoreneimide film / glass laminate. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例2] 於經氮氣取代之反應容器中裝入DABAN1.00g(4.4毫莫耳)、PPD0.07g(0.6毫莫耳)、與BAPB0.46g(1.3毫莫耳),添加NMP11.54g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為25質量%之量,於室溫攪拌1小時。於此溶液中緩慢添加TNDA2.32g(6.3毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 2] In a reaction vessel substituted with nitrogen, 1.00 g (4.4 mmol) of DABAN, 0.07 g (0.6 mmol) of PPD, and 0.46 g (1.3 mmol) of BAPB were added, and 11.54 g of NMP was added. This amount is an amount such that the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component) becomes 25% by mass, and the mixture is stirred at room temperature for 1 hour. To this solution was slowly added 2.32 g (6.3 mmol) of TNDA. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加溫到460℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。A polyimide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 460 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to perform thermal imidization. Into a colorless and transparent polyfluoreneimide film / glass laminate. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[比較例1] 於經氮氣取代之反應容器中裝入BAPB1.00g(2.7毫莫耳),添加NMP6.00g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為25質量%之量,於室溫攪拌1小時。於此溶液緩慢添加TNDA1.00g(2.7毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Comparative Example 1] In a reaction container substituted with nitrogen, 1.00 g (2.7 mmol) of BAPB was charged, and NMP 6.00 g was added. This amount is based on the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component). ) To an amount of 25% by mass, and stirred at room temperature for 1 hour. To this solution was slowly added 1.00 g (2.7 mmol) of TNDA. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到430℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 430 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less), and then thermally fluorinated. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[比較例2] 於經氮氣取代之反應容器中裝入4,4’-ODA0.70g(3.5毫莫耳),添加DMAc 7.95g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為20質量%之量,於室溫攪拌1小時。於此溶液中緩慢添加TNDA1.29g(3.5毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Comparative Example 2] A reaction vessel substituted with nitrogen was charged with 0.70 g (3.5 mmol) of 4,4'-ODA, and 7.95 g of DMAc was added. This amount is based on the total mass of the feed monomer (diamine component and The sum of the carboxylic acid components) was 20% by mass, and the mixture was stirred at room temperature for 1 hour. To this solution was slowly added 1.29 g (3.5 mmol) of TNDA. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到430℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 430 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less), and then thermally fluorinated. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例3] 於經氮氣取代之反應容器中裝入DABAN0.23g(1.0毫莫耳),添加NMP 2.70g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為16質量%之量,於室溫攪拌1小時。於此溶液緩慢添加實施例S-3獲得之BNDA0.29g(1.0毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 3] 0.23 g (1.0 mmol) of DABAN was charged into a reaction container substituted with nitrogen, and 2.70 g of NMP was added. This amount is based on the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component). ) To an amount of 16% by mass, and stirred at room temperature for 1 hour. To this solution, 0.29 g (1.0 mmol) of BNDA obtained in Example S-3 was slowly added. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到320℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 320 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less), and then thermally fluorinated. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例4] 於經氮氣取代之反應容器中裝入PPD0.40g(3.7毫莫耳),添加NMP5.81g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為20質量%之量,於室溫攪拌1小時。於此溶液中緩慢添加實施例S-3獲得之BNDA1.05g(3.7毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 4] 0.40 g (3.7 mmol) of PPD was charged into a nitrogen-substituted reaction container, and NMP 5.81 g was added. This amount is based on the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component). ) To an amount of 20% by mass, and stirred at room temperature for 1 hour. To this solution was slowly added 1.05 g (3.7 mmol) of BNDA obtained in Example S-3. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到350℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。A polyimide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated from room temperature to 350 ° C. directly on a glass substrate under a nitrogen atmosphere (oxygen concentration below 200 ppm), and then subjected to thermal fluoridation. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例5] 於經氮氣取代之反應容器中裝入TFMB1.52g(4.7毫莫耳),添加NMP11.41g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為20質量%之量,於室溫攪拌1小時。於此溶液中緩慢添加實施例S-3獲得之BNDA1.35g(4.7毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 5] A reaction vessel substituted with nitrogen was charged with TFMB 1.52 g (4.7 mmol), and NMP 11.41 g was added. This amount was based on the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component). ) To an amount of 20% by mass, and stirred at room temperature for 1 hour. To this solution was slowly added 1.35 g (4.7 mmol) of BNDA obtained in Example S-3. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到320℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 320 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less), and then thermally fluorinated. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例6] 於經氮氣取代之反應容器中裝入DABAN0.40g(1.8毫莫耳)、TFMB0.70g(2.2毫莫耳)、與BAPB0.16g(0.4毫莫耳),添加NMP10.00g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為20質量%之量,於室溫攪拌1小時。於此溶液緩慢添加實施例S-3獲得之BNDA1.24g(4.4毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 6] In a reaction vessel substituted with nitrogen, 0.40 g (1.8 mmol) of DABAN, 0.70 g (2.2 mmol) of TFMB, and 0.16 g (0.4 mmol) of BAPB were added, and 10.00 g of NMP was added. This amount is an amount such that the total mass of the feed monomer (the sum of the diamine component and the carboxylic acid component) becomes 20% by mass, and the mixture is stirred at room temperature for 1 hour. To this solution was slowly added 1.24 g (4.4 mmol) of BNDA obtained in Example S-3. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到350℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。A polyimide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated from room temperature to 350 ° C. directly on a glass substrate under a nitrogen atmosphere (oxygen concentration below 200 ppm), and then subjected to thermal fluoridation. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例7] 於經氮氣取代之反應容器中裝入tra-DACH0.39g(3.5毫莫耳),添加NMP 11.14g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為11質量%之量,於室溫攪拌1小時。於此溶液緩慢添加實施例S-3獲得之BNDA0.98g(3.5毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 7] 0.39 g (3.5 mmol) of tra-DACH was charged into a reaction container substituted with nitrogen, and 11.14 g of NMP was added. This amount is based on the total mass of the feed monomer (diamine component and carboxylic acid component The total amount was 11% by mass, and the mixture was stirred at room temperature for 1 hour. To this solution was slowly added 0.98 g (3.5 mmol) of BNDA obtained in Example S-3. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到320℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 320 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less), and then thermally fluorinated. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[比較例3] 於經氮氣取代之反應容器中裝入4,4’-ODA0.60g(3.0毫莫耳),添加NMP 13.06g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為10質量%之量,於室溫攪拌1小時。於此緩慢添加實施例S-3獲得之BNDA0.85g(3.0毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Comparative Example 3] In a reaction container substituted with nitrogen, 4,0'-ODA 0.60 g (3.0 mmol) was added, and 13.06 g of NMP was added. This amount is based on the total mass of the feed monomer (diamine component and The sum of the carboxylic acid components) was 10% by mass, and the mixture was stirred at room temperature for 1 hour. Here, 0.85 g (3.0 mmol) of BNDA obtained in Example S-3 was slowly added. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到320℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated directly from room temperature to 320 ° C on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less), and then thermally fluorinated. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例8] 於經氮氣取代之反應容器中裝入4,4’-ODA0.70g(3.5毫莫耳),添加NMP 25.57g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為7質量%之量,於室溫攪拌1小時。於此溶液緩慢添加實施例S-1獲得之DMADA1.22g(3.5毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 8] In a reaction container substituted with nitrogen, 4,0'-ODA 0.70 g (3.5 mmol) was added, and 25.57 g of NMP was added. This amount was based on the total mass of the feed monomer (diamine component and The sum of the carboxylic acid components) was 7% by mass, and the mixture was stirred at room temperature for 1 hour. To this solution was slowly added 1.22 g (3.5 mmol) of DMADA obtained in Example S-1. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到350℃,進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。A polyimide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated from room temperature to 350 ° C. directly on a glass substrate under a nitrogen atmosphere (oxygen concentration below 200 ppm), and then subjected to thermal fluoridation. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
[實施例9] 於經氮氣取代之反應容器中裝入TPE-R1.20g(4.1毫莫耳),添加NMP11.39g,此量係使進料單體總質量(二胺成分與羧酸成分之總和)成為25質量%之量,於室溫攪拌1小時。於此溶液緩慢添加實施例S-2-2獲得之EMDAxx1.32g(4.1毫莫耳)。於室溫攪拌48小時,獲得均勻且黏稠的聚醯亞胺前驅體溶液。[Example 9] TPE-R1.20g (4.1 millimolar) was charged into a reaction container substituted with nitrogen, and NMP11.39g was added. This amount is based on the total mass of the feed monomer (diamine component and carboxylic acid component). The total amount was 25% by mass, and the mixture was stirred at room temperature for 1 hour. To this solution was slowly added 1.32 g (4.1 mmol) of EMDAxx obtained in Example S-2-2. Stir at room temperature for 48 hours to obtain a homogeneous and viscous polyimide precursor solution.
將經PTFE製濾膜過濾之聚醯亞胺前驅體溶液塗佈在玻璃基板,於氮氣環境下(氧濃度200ppm以下)直接在玻璃基板上從室溫加熱到450℃而進行熱醯亞胺化,獲得無色透明的聚醯亞胺膜/玻璃疊層體。其次將獲得之聚醯亞胺膜/玻璃疊層體浸於水後剝離、乾燥而獲得膜厚10μm之聚醯亞胺膜。The polyfluorene imide precursor solution filtered through a PTFE filter membrane was coated on a glass substrate, and heated to 450 ° C from room temperature directly on a glass substrate under a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to perform thermal fluorination. A colorless and transparent polyfluorene imide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water, peeled off, and dried to obtain a polyimide film having a film thickness of 10 μm.
測定此聚醯亞胺膜之特性之結果示於表2。Table 2 shows the results of measuring the characteristics of the polyfluoreneimide film.
【表2】 【Table 2】
從表2-1所示結果可知:使用TNDA作為四羧酸成分的情形,相較於只使用有醚鍵(-O-)之二胺(4,4’-ODA、BAPB)作為二胺成分時,使用給予不具醚鍵(-O-)之前述化學式(B-1)之結構之二胺(DABAN、PPD)時可保持充分的透明性、機械的特性,且獲得之聚醯亞胺之耐熱性高,線熱膨脹係數低(實施例1、2與比較例1、2)。使用BNDA作為四羧酸成分的情形,相較於只使用有醚鍵(-O-)之二胺(4,4’-ODA)作為二胺成分時,使用給予不具醚鍵(-O-)之前述化學式(B-1)之結構之二胺(DABAN、PPD、TFMB)、使用給予前述化學式(B-2)之結構之二胺(tra-DACH)時,會保持充分的透明性、機械的特性,且獲得之聚醯亞胺之線熱膨脹係數極低,耐熱性亦為同等以上(實施例3~7與比較例3)。From the results shown in Table 2-1, it can be seen that when using TNDA as the tetracarboxylic acid component, compared to using only diamine (4,4'-ODA, BAPB) having an ether bond (-O-) as the diamine component In the case of using a diamine (DABAN, PPD) having a structure of the aforementioned chemical formula (B-1) having no ether bond (-O-), sufficient transparency and mechanical properties can be maintained, and the obtained polyimide High heat resistance and low coefficient of linear thermal expansion (Examples 1, 2 and Comparative Examples 1, 2). In the case of using BNDA as the tetracarboxylic acid component, compared with the case where only a diamine (4,4'-ODA) having an ether bond (-O-) is used as a diamine component, a non-ether bond (-O-) is used. When the diamine (DABAN, PPD, TFMB) of the structure of the aforementioned chemical formula (B-1) and the diamine (tra-DACH) of the structure of the aforementioned chemical formula (B-2) are used, sufficient transparency and mechanical properties will be maintained. And the linear thermal expansion coefficient of the obtained polyimide is extremely low, and the heat resistance is also equal to or higher (Examples 3 to 7 and Comparative Example 3).
又,可知組合之二胺成分為相同的情形,使用DMADA作為四羧酸成分時,相較於使用BNDA時,獲得之聚醯亞胺之線熱膨脹係數減低(實施例8與比較例3)。In addition, it can be seen that the combined diamine components are the same. When DMADA is used as the tetracarboxylic acid component, the linear thermal expansion coefficient of the polyfluorene imine obtained is lower than that when BNDA is used (Example 8 and Comparative Example 3).
又,使用EMDA作為四羧酸成分時,可獲得線熱膨脹係數低、耐熱性高、有充分特性之聚醯亞胺(實施例9)。 [產業利用性]When EMDA is used as the tetracarboxylic acid component, polyimide having a low linear thermal expansion coefficient, high heat resistance, and sufficient characteristics can be obtained (Example 9). [Industrial availability]
依本發明可提供有透明性、彎折耐性、高耐熱性、低線熱膨脹係數等優良的特性之聚醯亞胺、及其前驅體、及此等之製造中使用之新穎之四羧酸二酐。此由本發明之聚醯亞胺前驅體獲得之聚醯亞胺、及本發明之聚醯亞胺,透明性高且低線熱膨脹係數,容易形成微細電路,也兼有耐溶劑性,尤其適合形成顯示器用途等的基板。According to the present invention, polyimide having excellent characteristics such as transparency, bending resistance, high heat resistance, and low linear thermal expansion coefficient, a precursor thereof, and a novel tetracarboxylic acid used in the production thereof can be provided. anhydride. The polyimide obtained from the polyimide precursor of the present invention and the polyimide of the present invention have high transparency and low coefficient of linear thermal expansion, are easy to form fine circuits, and have solvent resistance, and are particularly suitable for forming Substrates for display applications, etc.
無no
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Publication number | Priority date | Publication date | Assignee | Title |
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CA1239649A (en) * | 1982-09-30 | 1988-07-26 | Howard Alper | Process for the production of carboxylic acid esters and/or carboxylic acids |
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JPH05140141A (en) * | 1991-11-13 | 1993-06-08 | Japan Synthetic Rubber Co Ltd | Production of carboxylic acid anhydride |
JPH05271409A (en) * | 1992-03-30 | 1993-10-19 | Japan Synthetic Rubber Co Ltd | Production of polyamic acid |
JPH06345868A (en) * | 1993-06-03 | 1994-12-20 | Shin Etsu Chem Co Ltd | Polyimide and its production |
US6071670A (en) * | 1996-10-11 | 2000-06-06 | Kabushiki Kaisha Toshiba | Transparent resin, photosensitive composition, and method of forming a pattern |
JP2001151728A (en) * | 1999-11-30 | 2001-06-05 | Nissan Chem Ind Ltd | Method for producing alicyclic dicarboxylic acid derivative and alicyclic dicarboxylic acid drivative |
JP4045595B2 (en) * | 2003-04-22 | 2008-02-13 | Jsr株式会社 | Liquid crystal alignment agent |
JP2007002023A (en) * | 2005-06-21 | 2007-01-11 | Fujifilm Holdings Corp | Film and image display |
JP5194342B2 (en) * | 2005-07-15 | 2013-05-08 | Jnc株式会社 | Liquid crystal aligning agent and vertical alignment liquid crystal display element for vertical alignment liquid crystal display element |
JP5158356B2 (en) * | 2008-06-03 | 2013-03-06 | Jsr株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
JP2010184898A (en) * | 2009-02-12 | 2010-08-26 | Tokyo Kogei Univ | Dodecahydro-1,4:5,8-dimethanoanthracene-9,10-dione-2,3,6,7-tetracarboxylic acid-2,3:6,7-dianhydrides, dodecahydro-1,4:5,8-dimethanoanthracene-9,10-dione-2,3,6,7-tetracarboxylic acid tetraesters and method for producing the same |
US20120190802A1 (en) * | 2011-01-26 | 2012-07-26 | Nexolve Corporation | Polyimide polymer from non-stoichiometric components |
KR101941413B1 (en) * | 2011-03-11 | 2019-01-22 | 우베 고산 가부시키가이샤 | Polyimide precursor and polyimide |
JP6060695B2 (en) * | 2012-01-20 | 2017-01-18 | 宇部興産株式会社 | Polyimide precursor and polyimide |
JP5845918B2 (en) * | 2012-01-20 | 2016-01-20 | 宇部興産株式会社 | Polyimide precursor and polyimide |
JP6283954B2 (en) * | 2012-09-10 | 2018-02-28 | 宇部興産株式会社 | Polyimide precursor, polyimide, varnish, polyimide film, and substrate |
CN104769012B (en) * | 2012-09-10 | 2017-10-03 | 宇部兴产株式会社 | Polyimide precursor, polyimides, varnish, polyimide film and substrate |
US20160137787A1 (en) * | 2013-06-27 | 2016-05-19 | Ube Industries, Ltd. | Polymide precursor and polymide |
JP2015108092A (en) * | 2013-12-05 | 2015-06-11 | 学校法人東京工芸大学 | Polyimide production method and polyimide obtained by the same |
JP6506260B2 (en) * | 2014-04-23 | 2019-04-24 | Jxtgエネルギー株式会社 | Tetracarboxylic acid dianhydride, polyamic acid, polyimide, method for producing them, and polyamic acid solution |
JP6086139B2 (en) * | 2015-10-05 | 2017-03-01 | 宇部興産株式会社 | Polyimide precursor and polyimide |
-
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CN109415379A (en) | 2019-03-01 |
JPWO2017209199A1 (en) | 2019-04-04 |
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TWI742087B (en) | 2021-10-11 |
JP2022116052A (en) | 2022-08-09 |
WO2017209199A1 (en) | 2017-12-07 |
CN114854010B (en) | 2024-04-16 |
JP6939779B2 (en) | 2021-09-22 |
CN118221527A (en) | 2024-06-21 |
WO2017209197A1 (en) | 2017-12-07 |
CN114854010A (en) | 2022-08-05 |
JP7327573B2 (en) | 2023-08-16 |
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