TW201800496A - Compound, photosensitive resin composition comprising the same and color filter - Google Patents

Abstract

Provided are a compound represented by Chemical Formula 1, a photosensitive resin composition including the same, and color filter including a photosensitive resin film manufactured using the photosensitive resin composition. [Chemical Formula 1] (In Chemical Formula 1, each substituent is the same as defined in the specification.).

Description

Compound, photosensitive resin composition containing the same, and color filter

The present disclosure relates to a novel compound, a photosensitive resin composition containing the same, and a color filter.

Among many types of displays, liquid crystal display devices have the advantages of being light, thin, low in cost, low in operating power consumption, and highly supportive for integrated circuits, and have been more widely used in laptops, monitors, And TV screen. The liquid crystal display device includes a lower substrate and an upper substrate, and a black matrix, a color filter, and an indium tin oxide pixel electrode are formed on the lower substrate, and an active layer including a liquid crystal layer, a thin film transistor, and a capacitor layer is formed on the upper substrate. The circuit portion and the indium tin oxide pixel electrode. By sequentially stacking a plurality of color filters (generally formed of three primary colors (for example, red (R), green (G), and blue (B))) in a predetermined order to form each pixel in the pixel region A color filter is formed in the medium, and a black matrix layer is disposed on the transparent substrate in a predetermined pattern to form a boundary between the pixels. As one of various methods of forming a color filter, the pigment dispersion method provides a colored film by repeating a series of processes: for example, coating a photosensitive resin composition containing a colorant on a transparent substrate including a black matrix, The formed pattern is exposed, the unexposed portion is removed with a solvent, and it is thermally cured. The photosensitive resin composition for producing a color filter according to the pigment dispersion method generally contains a binder resin, a photopolymerizable monomer, a photopolymerization initiator, a solvent, and other additives. The pigment dispersion method having the above characteristics is actively applied to the manufacture of liquid crystal displays such as mobile phones, laptops, monitors, and televisions. However, the photosensitive resin composition for a color filter using a pigment dispersion method has certain disadvantages in that it is difficult to finely pulverize the pigment powder, and even if the pigment powder is dispersed, various additives are required to stabilize the dispersion and it is required Complex processes, and the difficulty of further maintaining the optimum quality of the pigment dispersion under complex storage conditions and transport conditions. Further, a color filter produced using a pigment-type photosensitive resin composition has limitations in brightness and contrast due to pigment fineness. Therefore, there is a need to develop a dye having heat resistance and chemical resistance similar to those of a pigment.

Embodiments of the invention provide a novel compound.

Another embodiment provides a photosensitive resin composition comprising the compound.

Still another embodiment provides a color filter including a photosensitive resin film produced using the photosensitive resin composition.

在化學式1中， R¹ 為鹵素原子、經取代或未經取代的C1至C20烷基、經取代或未經取代的C1至C20烷氧基、或者經取代或未經取代的C6至C20芳基， R² 為經取代或未經取代的C3至C20脂環族環狀基、或者經取代或未經取代的C6至C20芳基，其限制條件是所述芳基僅具有至少一個選自鹵素原子、經取代或未經取代的C1至C10烷基、經取代或未經取代的C1至C10烷氧基、及經取代或未經取代的C1至C10烷硫基中的取代基， R³ 至R⁵ 獨立地為經取代或未經取代的C1至C20烷基、經取代或未經取代的C1至C20烷氧基、或者經取代或未經取代的C6至C20芳基， m及n獨立地為介於1至5範圍內的整數，且 L由化學式2表示， [化學式2]

其中，在化學式2中， L¹ 為-O(C=O)-或-S-，且 A為經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20脂環族環狀基、經取代或未經取代的C6至C20芳基、或者經取代或未經取代的C2至C20雜芳基。An embodiment of the present invention provides a compound represented by Chemical Formula 1. [Chemical Formula 1]

In Chemical Formula 1, R ¹ is a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aromatic group. And R ² is a substituted or unsubstituted C 3 to C 20 alicyclic cyclic group, or a substituted or unsubstituted C 6 to C 20 aryl group, with the proviso that the aryl group has only at least one selected from the group consisting of a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group, R ³ to R ^{5 are} independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group, m and n is independently an integer ranging from 1 to 5, and L is represented by Chemical Formula 2, [Chemical Formula 2]

Wherein, in Chemical Formula 2, L ¹ is -O(C=O)- or -S-, and A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 fat. a cyclocyclic group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group.

The R ¹ may be a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group.

The R ² may be a substituted or unsubstituted adamantyl group, or a substituted or unsubstituted phenyl group. The phenyl group has only at least one selected from a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to a substituent in the C10 alkylthio group.

The R ² may be "the unsubstituted adamantyl group" or "the phenyl group has only at least one selected from a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, substituted or not Substituted C1 to C10 alkoxy groups, and substituted or unsubstituted substituents in the C1 to C10 alkylthio group.

The R ³ to R ⁵ may independently be a substituted or unsubstituted C1 to C20 alkyl group.

[化學式4]

[化學式5]

[化學式6]

[化學式7]

在化學式3至化學式7中， R⁶ 為經取代或未經取代的C1至C10烷基、經取代或未經取代的氨基、或者經取代或未經取代的醯基， R⁷ 至R⁹ 獨立地為羥基或者經取代或未經取代的C1至C10烷基，其限制條件是R⁷ 及R⁸ 中的至少一者為羥基， R¹⁰ 為經取代或未經取代的C1至C10烷基， o及p獨立地為介於1至3範圍內的整數，其限制條件是2 ≤ o + p ≤ 5，且 q為介於0至4範圍內的整數。The L may be represented by one selected from Chemical Formula 3 to Chemical Formula 7. [Chemical Formula 3]

[Chemical Formula 4]

[Chemical Formula 5]

[Chemical Formula 6]

[Chemical Formula 7]

In Chemical Formula 3 to Chemical Formula 7, R ⁶ is a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted fluorenyl group, and R ⁷ to R ^{9 are} independently Is a hydroxy group or a substituted or unsubstituted C1 to C10 alkyl group, with the proviso that at least one of R ⁷ and R ⁸ is a hydroxyl group, and R ¹⁰ is a substituted or unsubstituted C1 to C10 alkyl group, o and p are independently integers in the range of 1 to 3, with the constraint being 2 ≤ o + p ≤ 5, and q is an integer ranging from 0 to 4.

在化學式8中， R^x 為經取代或未經取代的C1至C10烷基，且 z為介於0至5範圍內的整數。The substituted or unsubstituted amino group can be represented by Chemical Formula 8. [Chemical Formula 8]

In Chemical Formula 8, R ^x is a substituted or unsubstituted C1 to C10 alkyl group, and z is an integer ranging from 0 to 5.

The substituted or unsubstituted fluorenyl group can be represented by Chemical Formula 9. [Chemical Formula 9]

The R ⁶ may be a tert-butyl group, the substituent represented by Chemical Formula 8, or the substituent represented by Chemical Formula 9.

The R ⁷ to R ⁹ may independently be a hydroxyl group or a t-butyl group, with the proviso that at least one of R ⁷ and R ⁸ is a hydroxyl group.

The R ¹⁰ may be substituted or unsubstituted methyl, substituted or unsubstituted ethyl, substituted or unsubstituted propyl, substituted or unsubstituted butyl, or substituted or Unsubstituted pentyl.

[化學式10-2]

在化學式10-1及化學式10-2中， R¹ 為鹵素原子、經取代或未經取代的C1至C20烷氧基、或者經取代或未經取代的C6至C20芳基， R² 為經取代或未經取代的C3至C20脂環族環狀基、或者經取代或未經取代的C6至C20芳基，其限制條件是所述芳基具有至少一個選自鹵素原子、經取代或未經取代的C1至C10烷基、經取代或未經取代的C1至C10烷氧基、及經取代或未經取代的C1至C10烷硫基中的取代基， R³ 至R⁵ 獨立地為經取代或未經取代的C1至C20烷基，且 L由化學式2表示， [化學式2]

其中，在化學式2中， L¹ 為-O(C=O)-，且 A為經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20脂環族環狀基、或者經取代或未經取代的C6至C20芳基。Chemical Formula 1 can be represented by Chemical Formula 10-1 or Chemical Formula 10-2. [Chemical Formula 10-1]

[Chemical Formula 10-2]

In Chemical Formula 10-1 and Chemical Formula 10-2, R ¹ is a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group, and R ² is a a substituted or unsubstituted C3 to C20 alicyclic cyclic group, or a substituted or unsubstituted C6 to C20 aryl group, with the proviso that the aryl group has at least one selected from a halogen atom, substituted or not a substituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group, and R ³ to R ^{5 are} independently a substituted or unsubstituted C1 to C20 alkyl group, and L is represented by Chemical Formula 2, [Chemical Formula 2]

Wherein, in Chemical Formula 2, L ¹ is -O(C=O)-, and A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring. A substituted or unsubstituted C6 to C20 aryl group.

[化學式1-2]

[化學式1-3]

[化學式1-4]

[化學式1-5]

[化學式1-6]

[化學式1-7]

[化學式1-8]

[化學式1-9]

[化學式1-10]

[化學式1-11]

[化學式1-12]

Chemical Formula 1 can be represented by one selected from Chemical Formula 1-1 to Chemical Formula 1-12. [Chemical Formula 1-1]

[Chemical Formula 1-2]

[Chemical Formula 1-3]

[Chemical Formula 1-4]

[Chemical Formula 1-5]

[Chemical Formula 1-6]

[Chemical Formula 1-7]

[Chemical Formula 1-8]

[Chemical Formula 1-9]

[Chemical Formula 1-10]

[Chemical Formula 1-11]

[Chemical Formula 1-12]

The compound represented by Chemical Formula 1 may be a dye.

The dye has a maximum absorbance in the wavelength range from 450 nm to 600 nm.

Another embodiment provides a photosensitive resin composition comprising the compound as a dye.

The photosensitive resin composition containing the compound as a dye may further contain a binder resin, a pigment, a photopolymerizable monomer, a photopolymerization initiator, and a solvent.

The dye may be contained in an amount of from 5% by weight to 20% by weight based on the total of the photosensitive resin composition.

The dye may be contained in an amount of 10% by weight to 15% by weight based on the total amount of the photosensitive resin composition.

The pigment may comprise a blue pigment.

The binder resin may include an acrylic binder resin, a cardo-based binder resin, or a combination thereof.

The photosensitive resin composition may include: 1% by weight to 10% by weight of the binder resin; and 45% by weight to 80% by weight of the dye and the dye, based on the total amount of the photosensitive resin composition a color former of the pigment; 1% by weight to 5% by weight of the photopolymerizable monomer; 0.1% by weight to 3% by weight of the photopolymerization initiator; and the balance being the solvent.

The photosensitive resin composition may further comprise the following additives: malonic acid; 3-amino-1,2-propanediol; a decane-based coupling agent; a leveling agent; a fluorine-based surfactant; a radical polymerization initiator; combination.

Another embodiment provides a color filter including a photosensitive resin film produced using the photosensitive resin composition.

Other embodiments of the invention are included in the detailed description which follows.

The compound according to the embodiment has color characteristics, and when a photosensitive resin composition containing the compound is used, a color filter having improved brightness, heat resistance, and processability can be provided.

Embodiments of the invention are set forth in detail below. However, the embodiments are exemplary, and the invention is not limited thereto and the invention is defined by the scope of the claims.

In the present specification, the term "substituted" means that at least one hydrogen is substituted with at least one substituent selected from the group consisting of a halogen atom (F, Cl, Br or I), a hydroxyl group, a nitro group, when a specific definition is not additionally provided. a cyano group, an amino group (NH ₂ , NH(R ²⁰⁰ ) or N(R ²⁰¹ )(R ²⁰² ), wherein R ²⁰⁰ , R ²⁰¹ and R ²⁰² are the same or different and independently a C1 to C10 alkyl group or C6 to C20 aryl), fluorenyl, fluorenyl, fluorenyl, carboxy, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted Or an unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heterocyclic group.

In the present specification, when a specific definition is not additionally provided, "alkyl" means a C1 to C20 alkyl group and especially a C1 to C15 alkyl group, and "cycloalkyl group" means a C3 to C20 cycloalkyl group and especially C3 to C18. Cycloalkyl, "alkoxy" means C1 to C20 alkoxy and especially C1 to C18 alkoxy, "aryl" means C6 to C20 aryl and especially C6 to C18 aryl, "alkenyl" is Refers to C2 to C20 alkenyl and especially C2 to C18 alkenyl, "alkylene" refers to C1 to C20 alkyl and especially C1 to C18 alkyl, and "extended aryl" refers to C6 to C20 extended aryl And especially C6 to C16 extended aryl.

In the present specification, when a specific definition is not provided, "(meth)acrylate means both "acrylate" and "methacrylate", and "(meth)acrylic" means "acrylic acid" and "Methacrylate".

In the present specification, the term "combination" means mixing or copolymerization when a specific definition is not additionally provided. Further, "copolymerization" means block copolymerization to random copolymerization, and "copolymer" means a block copolymer to a random copolymer.

In the chemical formula of the present specification, unless a specific definition is additionally provided, when a chemical bond is not drawn at a position to be given, a hydrogen atom is bonded at the position.

In the present specification, the card poly-resin refers to a resin containing at least one functional group selected from the chemical formula 11-1 to the chemical formula 11-11 in its skeleton.

In the present specification, when a specific definition is not additionally provided, "*" indicates a point connecting the same or different atoms or chemical formulas.

在化學式1中， R¹ 為鹵素原子、經取代或未經取代的C1至C20烷基、經取代或未經取代的C1至C20烷氧基、或者經取代或未經取代的C6至C20芳基， R² 為經取代或未經取代的C3至C20脂環族環狀基、或者經取代或未經取代的C6至C20芳基，其限制條件是所述芳基僅具有至少一個選自鹵素原子、經取代或未經取代的C1至C10烷基、經取代或未經取代的C1至C10烷氧基、及經取代或未經取代的C1至C10烷硫基中的取代基， R³ 至R⁵ 獨立地為經取代或未經取代的C1至C20烷基、經取代或未經取代的C1至C20烷氧基、或者經取代或未經取代的C6至C20芳基， m及n獨立地為介於1至5範圍內的整數，且 L由化學式2表示， [化學式2]

其中，在化學式2中， L¹ 為-O(C=O)-或-S-，且 A為經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20脂環族環狀基、經取代或未經取代的C6至C20芳基、或者經取代或未經取代的C2至C20雜芳基。An embodiment of the present invention provides a compound represented by Chemical Formula 1. [Chemical Formula 1]

In Chemical Formula 1, R ¹ is a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aromatic group. And R ² is a substituted or unsubstituted C 3 to C 20 alicyclic cyclic group, or a substituted or unsubstituted C 6 to C 20 aryl group, with the proviso that the aryl group has only at least one selected from the group consisting of a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group, R ³ to R ^{5 are} independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group, m and n is independently an integer ranging from 1 to 5, and L is represented by Chemical Formula 2, [Chemical Formula 2]

Wherein, in Chemical Formula 2, L ¹ is -O(C=O)- or -S-, and A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 fat. a cyclocyclic group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group.

The compound according to the examples is represented by Chemical Formula 1, and has excellent spectral characteristics, a high molar extinction coefficient, and organic substances such as cyclohexanone, propylene glycol monomethyl ether acetate, etc., compared with the conventional dye. Excellent solubility of solvents.

For example, R ¹ may be a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group. When R ¹ is a halogen atom, the heat resistance may be higher than when R ¹ is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted group. The C6 to C20 aryl group deteriorates.

R ² may be substituted or unsubstituted adamantyl, or substituted or unsubstituted phenyl. The phenyl group may have only at least one C1 to C10 alkyl group selected from a halogen atom, a substituted or unsubstituted group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 group. a substituent in an alkylthio group.

For example, when R ² is a triphenylmethyl-substituted phenyl group, heat resistance may be deteriorated when R ² is a phenyl group substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group.

For example, R ² may be "unsubstituted adamantyl group" or "the phenyl group has only at least one selected from a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, substituted or not Substituted C1 to C10 alkoxy groups, and substituted or unsubstituted substituents in the C1 to C10 alkylthio group.

R ³ to R ⁵ may independently be a substituted or unsubstituted C1 to C20 alkyl group.

[化學式4]

[化學式5]

[化學式6]

[化學式7]

在化學式3至化學式7中， R⁶ 為經取代或未經取代的C1至C10烷基、經取代或未經取代的氨基、或者經取代或未經取代的醯基， R⁷ 至R⁹ 獨立地為羥基或者經取代或未經取代的C1至C10烷基，其限制條件是R⁷ 及R⁸ 中的至少一者為羥基， R¹⁰ 為經取代或未經取代的C1至C10烷基， o及p獨立地為介於1至3範圍內的整數，其限制條件是2 ≤ o + p ≤ 5，且 q為介於0至4範圍內的整數。L may be represented by one selected from Chemical Formula 3 to Chemical Formula 7. [Chemical Formula 3]

[Chemical Formula 4]

[Chemical Formula 5]

[Chemical Formula 6]

[Chemical Formula 7]

In Chemical Formula 3 to Chemical Formula 7, R ⁶ is a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted fluorenyl group, and R ⁷ to R ^{9 are} independently Is a hydroxy group or a substituted or unsubstituted C1 to C10 alkyl group, with the proviso that at least one of R ⁷ and R ⁸ is a hydroxyl group, and R ¹⁰ is a substituted or unsubstituted C1 to C10 alkyl group, o and p are independently integers in the range of 1 to 3, with the constraint being 2 ≤ o + p ≤ 5, and q is an integer ranging from 0 to 4.

在化學式8中， R^x 為經取代或未經取代的C1至C10烷基，且 z為介於0至5範圍內的整數。For example, a substituted or unsubstituted amino group can be represented by Chemical Formula 8. [Chemical Formula 8]

In Chemical Formula 8, R ^x is a substituted or unsubstituted C1 to C10 alkyl group, and z is an integer ranging from 0 to 5.

For example, a substituted or unsubstituted fluorenyl group can be represented by Chemical Formula 9. [Chemical Formula 9]

For example, R ⁶ may be a tert-butyl group, a substituent represented by Chemical Formula 8, or a substituent represented by Chemical Formula 9.

For example, R ⁷ to R ⁹ may independently be a hydroxyl group or a t-butyl group, with the proviso that at least one of R ⁷ and R ⁸ is a hydroxyl group.

For example, R ¹⁰ may be substituted or unsubstituted methyl, substituted or unsubstituted ethyl, substituted or unsubstituted propyl, substituted or unsubstituted butyl, or Substituted or unsubstituted pentyl.

In Chemical Formula 1, the position of R ¹ may be an ortho, meta, or para position. For example, the position of R ¹ can be an ortho or para position, such as an ortho position. When R ¹ becomes meta, para, and ortho, in order, the brightness and heat resistance can be excellent in the order described. In other words, a compound having in the para position of R ¹ can have more excellent than the compound of R ¹ has the brightness in the meta and heat resistance, and the compound having a ratio R1 of the compound may have for R ¹ in the ortho position with More excellent brightness and heat resistance.

[化學式10-2]

在化學式10-1及化學式10-2中， R¹ 為鹵素原子、經取代或未經取代的C1至C20烷氧基、或者經取代或未經取代的C6至C20芳基， R² 為經取代或未經取代的C3至C20脂環族環狀基、或者經取代或未經取代的C6至C20芳基，其限制條件是所述芳基具有至少一個選自鹵素原子、經取代或未經取代的C1至C10烷基、經取代或未經取代的C1至C10烷氧基、及經取代或未經取代的C1至C10烷硫基中的取代基， R³ 至R⁵ 獨立地為經取代或未經取代的C1至C20烷基，且 L由化學式2表示， [化學式2]

其中，在化學式2中， L¹ 為-O(C=O)-，且 A為經取代或未經取代的C1至C20烷基、經取代或未經取代的C3至C20脂環族環狀基、或者經取代或未經取代的C6至C20芳基。For example, the compound represented by Chemical Formula 1 may be a compound represented by Chemical Formula 10-1 or a compound represented by Chemical Formula 10-2. [Chemical Formula 10-1]

[Chemical Formula 10-2]

In Chemical Formula 10-1 and Chemical Formula 10-2, R ¹ is a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group, and R ² is a a substituted or unsubstituted C3 to C20 alicyclic cyclic group, or a substituted or unsubstituted C6 to C20 aryl group, with the proviso that the aryl group has at least one selected from a halogen atom, substituted or not a substituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group, and R ³ to R ^{5 are} independently a substituted or unsubstituted C1 to C20 alkyl group, and L is represented by Chemical Formula 2, [Chemical Formula 2]

Wherein, in Chemical Formula 2, L ¹ is -O(C=O)-, and A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring. A substituted or unsubstituted C6 to C20 aryl group.

[化學式1-2]

[化學式1-3]

[化學式1-4]

[化學式1-5]

[化學式1-6]

[化學式1-7]

[化學式1-8]

[化學式1-9]

[化學式1-10]

[化學式1-11]

[化學式1-12]

The compound represented by Chemical Formula 1 can be represented by one selected from Chemical Formula 1-1 to Chemical Formula 1-12. [Chemical Formula 1-1]

[Chemical Formula 1-2]

[Chemical Formula 1-3]

[Chemical Formula 1-4]

[Chemical Formula 1-5]

[Chemical Formula 1-6]

[Chemical Formula 1-7]

[Chemical Formula 1-8]

[Chemical Formula 1-9]

[Chemical Formula 1-10]

[Chemical Formula 1-11]

[Chemical Formula 1-12]

The compound represented by Chemical Formula 1 according to the embodiment can express a clear color even in a small amount, and when used as a coloring agent, a display device having excellent color characteristics such as brightness, contrast, and the like can be manufactured. For example, the compound can be a colorant, such as a dye, such as a blue or violet dye, such as a dye having a maximum absorbance in the wavelength range from 300 nm to 600 nm, such as from 450 nm to 600 nm.

In general, dyes are the most expensive of the components used in color filters. Therefore, expensive dyes may be required to be used more to achieve desired effects (e.g., high brightness, high contrast, etc.) and, therefore, increase the unit cost of production. However, when the compound according to the embodiment is used as a colorant (for example, a dye in a color filter), the compound and/or polymer can achieve improved color characteristics even when used in a small amount (for example, high brightness or high contrast) ) and reduce the unit cost of production.

According to another embodiment, there is provided a photosensitive resin composition comprising the compound according to the embodiment as a dye.

For example, the photosensitive resin composition contains the amount of 5% by weight to 20% by weight, for example, 10% by weight to 15% by weight, based on the total amount of the photosensitive resin composition of the embodiment, represented by Chemical Formula 1. The compound, and thus the brightness, heat resistance, and chemical resistance, can be significantly improved. That is, the dye may be contained in an amount of 5 wt% to 20 wt%, for example, 10 wt% to 15 wt%, based on the total amount of the photosensitive resin composition, and thus brightness, heat resistance, and chemical resistance are improved.

For example, the photosensitive resin composition may include a compound, a pigment, a binder resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent according to the examples.

The compound according to the embodiment can function as a colorant (for example, a dye such as a blue dye or a violet dye) in the photosensitive resin composition, and thus excellent color characteristics can be achieved.

The pigment may include, but is not limited to, a yellow pigment, a green pigment, a red pigment, a blue pigment, a violet pigment, or a combination thereof. For example, the pigment may be contained in the photosensitive resin composition in the form of a pigment dispersion.

The pigment dispersion may contain a solid pigment, a solvent, and a dispersant that uniformly disperses the pigment in a solvent.

It may comprise from 1% by weight to 20% by weight, for example from 8% by weight to 20% by weight, for example from 15% by weight to 20% by weight, for example from 8% by weight to 15% by weight, for example 10% by weight, based on the total mass of the pigment dispersion A solid pigment in an amount of up to 20% by weight or such as from 10% to 15% by weight.

The dispersant may be a nonionic dispersant, an anionic dispersant, a cationic dispersant or the like. Specific examples of the dispersing agent may be a polyalkylene glycol and an ester thereof, a polyoxyalkylene, a polyhydric alcohol ester alkylene oxide addition product, an alcohol alkylene oxide addition product, a sulfonate, a sulfonate, a carboxylate A carboxylate, an alkylguanamine alkylene oxide addition product, an alkylamine or the like, and these dispersants may be used singly or as a mixture of two or more.

Commercially available examples of dispersants may include DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161 made by BYK Co., Ltd. , DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001; EFKA Chemicals Co .) manufactured Efka (EFKA)-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450; Solsperse manufactured by Zeneka 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc.; or PB711, PB821, etc. manufactured by Ajinomoto Inc.

The dispersant may be included in an amount of from 1% by weight to 20% by weight based on the total amount of the pigment dispersion. When the dispersant in the above range is contained, the dispersibility of the photosensitive resin composition is improved by an appropriate viscosity, and thus the optical quality, physical quality, and the like can be maintained when the photosensitive resin composition is applied to a product. Chemical quality.

The solvent used to form the pigment dispersion may be ethylene glycol acetate, ethyl cellosolve, propylene glycol monomethyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether or the like.

The pigment dispersion may be contained in an amount of 40% by weight to 60% by weight, for example, 45% by weight to 55% by weight based on the total amount of the photosensitive resin composition. When the pigment dispersion in the range is contained, process margin is ensured, and color reproducibility and contrast are improved.

The pigment can be pretreated with a water soluble inorganic salt and a wetting agent. When the pigment is pretreated, the initial particle size of the pigment can become finer.

The pretreatment can be carried out by kneading the water-soluble inorganic salt and the wetting agent and the pigment, and then filtering and washing the kneaded pigment.

Kneading can be carried out at a temperature of from 40 ° C to 100 ° C, and filtration and washing can be carried out by filtering the pigment after washing off the inorganic salt with water or the like.

Examples of the water-soluble inorganic salt may be sodium chloride, potassium chloride or the like, but are not limited thereto. The wetting agent uniformly mixes and pulverizes the pigment with the water-soluble inorganic salt. Examples of the wetting agent include an alkylene glycol monoalkyl ether such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, and the like; and an alcohol such as ethanol or the like. Propanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerol polyethylene glycol, and the like. These wetting agents may be used singly or as a mixture of two or more.

The kneaded pigment may have an average particle size ranging from 30 nm to about 100 nm. When the average particle diameter of the pigment is within the range, heat resistance and light resistance can be improved, and a fine pattern can be efficiently formed.

The photosensitive resin composition contains a coloring agent containing a dye and a pigment, and may include a coloring agent in an amount of 45% by weight to 80% by weight, for example, 55% by weight to 70% by weight based on the total amount of the photosensitive resin composition. When the coloring agent within the range is included, brightness, color reproducibility, pattern curability, heat resistance, and chemical resistance are improved.

The binder resin may include an acrylic binder resin, a cardo binder resin, or a combination thereof.

The acrylic adhesive resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing at least one acrylic repeating unit.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer comprising at least one carboxyl group. Examples of the monomer include (meth)acrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount of from 5% by weight to 50% by weight, for example from 10% by weight to 40% by weight, based on the total of the acrylic binder resin.

The diene unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether or the like; an unsaturated carboxylic acid ester compound such as (A) Methyl acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzene (meth) acrylate Methyl ester, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, etc.; unsaturated aminoalkyl carboxylate compound, such as 2-aminoethyl (meth)acrylate, 2-(meth)acrylate Dimethylaminoethyl ester or the like; a vinyl carboxylate compound such as vinyl acetate, vinyl benzoate or the like; an unsaturated glycidyl carboxylate compound such as glycidyl (meth)acrylate; an acrylonitrile compound , for example, (meth)acrylonitrile or the like; an unsaturated decylamine compound such as (meth) acrylamide or the like; and the like, and the second ethylenically unsaturated monomer may be used singly or as two or more The mixture is used in the form of a mixture.

Specific examples of the acrylic adhesive resin may be polybenzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene Copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate Ester copolymers, etc., but are not limited thereto. These acrylic adhesive resins may be used singly or as a mixture of two or more.

The acrylic binder resin may have a weight average molecular weight of from 3,000 g/mol to 150,000 g/mol, such as from 5,000 g/mol to 50,000 g/mol, or such as from 20,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the acrylic adhesive resin is within the above range, the photosensitive resin composition has good physical properties and chemical properties, proper viscosity, and close contact with the substrate during the manufacture of the color filter. .

The acrylic binder resin may have an acid value of from 15 mgKOH/g to 60 mgKOH/g, for example from 20 mgKOH/g to 50 mgKOH/g. When the acid value of the acrylic adhesive resin is within the above range, the resolution of the pixel pattern is improved.

在化學式11中， R¹¹ 及R¹² 獨立地為氫原子或者經取代或未經取代的(甲基)丙烯醯氧基烷基， R¹³ 及R¹⁴ 獨立地為氫原子、鹵素原子、或者經取代或未經取代的C1至C20烷基，且 Z¹ 為單鍵、O、CO、SO₂ 、CR¹⁵ R¹⁶ 、SiR¹⁷ R¹⁸ （其中，R¹⁵ 至R¹⁸ 獨立地為氫原子或者經取代或未經取代的C1至C20烷基）、或由化學式11-1至化學式11-11表示的連接基中的一者， [化學式11-1]

[化學式11-2]

[化學式11-3]

[化學式11-4]

[化學式11-5]

（在化學式11-5中，R^a 為氫原子、乙基、C₂ H₄ Cl、C₂ H₄ OH、CH₂ CH=CH₂ 、或苯基） [化學式11-6]

[化學式11-7]

[化學式11-8]

[化學式11-9]

[化學式11-10]

[化學式11-11]

Z² 為酸二酐殘基，且 m1及m2獨立地為介於0至4範圍內的整數。The card multi-adhesive resin may contain a repeating unit represented by Chemical Formula 11. [Chemical Formula 11]

In Chemical Formula 11, R ¹¹ and R ^{12 are} independently a hydrogen atom or a substituted or unsubstituted (meth) acryloxyalkyl group, and R ¹³ and R ^{14 are} independently a hydrogen atom, a halogen atom, or a a substituted or unsubstituted C1 to C20 alkyl group, and Z ¹ is a single bond, O, CO, SO ₂ , CR ¹⁵ R ¹⁶ , SiR ¹⁷ R ¹⁸ (wherein R ¹⁵ to R ^{18 are} independently a hydrogen atom or a a substituted or unsubstituted C1 to C20 alkyl group, or one of the linking groups represented by Chemical Formula 11-1 to Chemical Formula 11-11, [Chemical Formula 11-1]

[Chemical Formula 11-2]

[Chemical Formula 11-3]

[Chemical Formula 11-4]

[Chemical Formula 11-5]

(In Chemical Formula 11-5, R ^a is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ , or a phenyl group) [Chemical Formula 11-6]

[Chemical Formula 11-7]

[Chemical Formula 11-8]

[Chemical Formula 11-9]

[Chemical Formula 11-10]

[Chemical Formula 11-11]

Z ² is an acid dianhydride residue, and m1 and m2 are independently an integer ranging from 0 to 4.

在化學式12中， Z³ 由化學式12-1或化學式12-7表示。 [化學式12-1]

（在化學式12-1中，R^b 及R^c 獨立地為氫原子、經取代或未經取代的C1至C20烷基、酯基、或醚基） [化學式12-2]

[化學式12-3]

[化學式12-4]

[化學式12-5]

（在化學式12-5中，R^d 為O、S、NH、經取代或未經取代的C1至C20伸烷基、C1至C20烷基胺基、或C2至C20烯基胺基） [化學式12-6]

[化學式12-7]

At least one of the ends of the cardo-based binder resin may include a functional group represented by Chemical Formula 12. [Chemical Formula 12]

In Chemical Formula 12, Z ^{3 is} represented by Chemical Formula 12-1 or Chemical Formula 12-7. [Chemical Formula 12-1]

(In Chemical Formula 12-1, R ^b and R ^{c are} independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group, or an ether group) [Chemical Formula 12-2]

[Chemical Formula 12-3]

[Chemical Formula 12-4]

[Chemical Formula 12-5]

(In Chemical Formula 12-5, R ^d is O, S, NH, substituted or unsubstituted C1 to C20 alkylene group, C1 to C20 alkylamino group, or C2 to C20 alkenylamino group) [Chemical Formula 12-6]

[Chemical Formula 12-7]

The cardo-based binder resin can be prepared, for example, by mixing at least two of the following: a ruthenium-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)anthracene (9,9-bis) (4-oxiranylmethoxyphenyl)fluorene); an acid anhydride compound such as pyromellitic dianhydride, naphthalenetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutane Tetracarboxylic acid dianhydride, perylenetetracarboxylic dianhydride, tetrahydrofuran tetracarboxylic dianhydride, and tetrahydrophthalic anhydride; glycol compounds such as ethylene glycol, propylene glycol, and polyethylene glycol; alcohol compounds such as methanol, ethanol , propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent-based compounds such as propylene glycol methyl ethyl acetate and N-methylpyrrolidone; phosphorus compounds such as triphenylphosphine; and amine or ammonium salt compounds, For example, tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, and benzyltriethylammonium chloride.

The card multi-adhesive resin has low developability, and when the color filter is formed of a photosensitive resin composition having a cardo-based adhesive resin, it is difficult to control the developability of the pattern. Herein, an acrylic adhesive resin can be used together with a card-based adhesive resin as a binder resin to control the developability of the pattern.

Further, when a cardo-based adhesive resin is used together with an acrylic-based adhesive resin, a photosensitive resin composition having high resolution and high brightness characteristics and excellent close contact force can be obtained.

The card multi-adhesive resin may have a weight average molecular weight of from 500 g/mol to 50,000 g/mol, for example from 3,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the card multi-adhesive resin is within the range, a pattern can be well formed without residue during the production of the color filter, and the film thickness does not decrease during development.

The cardo binder resin may have an acid value of from 100 mgKOH/g to 140 mgKOH/g.

The binder resin may be contained in an amount of from 1% by weight to 10% by weight, for example, from 1% by weight to 5% by weight based on the total of the photosensitive resin composition. When the binder resin in the range is contained, excellent sensitivity, developability, resolution, and pattern linearity can be obtained.

The photopolymerizable monomer may be a (meth)acrylic monofunctional or polyfunctional ester containing at least one ethylenically unsaturated double bond.

The photopolymerizable monomer has an ethylenically unsaturated double bond, and thus, can cause sufficient polymerization during exposure of the pattern forming process and form a pattern having excellent heat resistance, light resistance, and chemical resistance.

Specific examples of the photopolymerizable monomer may be ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(methyl) Acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A (Meth) acrylate, pentaerythritol di(meth) acrylate, pentaerythritol tri(meth) acrylate, pentaerythritol tetra (meth) acrylate, quaternary pentoxide hexa (meth) acrylate, dipentaerythritol II (meth) acrylate, dipentaerythritol tri(meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, Ethylene glycol monomethyl ether (meth) acrylate, trimethylolpropane tri(meth) acrylate, tris(meth) propylene methoxyethyl phosphate, phenol aldehyde epoxy (meth) acrylate, and the like.

Commercially available examples of photopolymerizable monomers are as follows. The monofunctional (meth) acrylate may comprise Aronix M-101 ^® , M-111 ^® , M-114 ^® (Toagosei Chemistry Industry Co., Ltd.); Kaya KAYARAD TC-110S ^® , TC-120S ^® (Nippon Kayaku Co., Ltd.); V-158 ^® , V-2311 ^® (Osaka Organic Chemical Co., Ltd.) Ind., Ltd.)) and so on. Examples of the difunctional (meth) acrylate may include Aronix M-210 ^® , M-240 ^® , M-6200 ^® (East Asia Chemical Co., Ltd.), KAYARAD HDDA ^® , HX -220 ^® , R-604 ^® (Nippon Chemical Co., Ltd.), V-260 ^® , V-312 ^® , V-335 HP ^® (Osaka Organic Chemical Co., Ltd.), etc. Examples of trifunctional (meth) acrylates may include Aronix M-309 ^® , M-400 ^® , M-405 ^® , M-450 ^® , M-7100 ^® , M-8030 ^® , M- 8060 ^® (East Asia Chemical Co., Ltd.), KAYARAD TMPTA ^® , DPCA-20 ^® , DPCA-30 ^® , DPCA-60 ^® , DPCA-120 ^® (Japan Chemicals Co., Ltd.), V-295 ^® , V-300 ^® , V-360 ^® , V-GPT ^® , V-3PA ^® , V-400 ^® (Osaka Organic Chemical Co., Ltd.), etc. These photopolymerizable monomers may be used singly or as a mixture of two or more.

The photopolymerizable monomer can be treated with an acid anhydride to improve developability.

The photopolymerizable monomer may be contained in an amount of from 1% by weight to 5% by weight, for example, from 1% by weight to 3% by weight based on the total amount of the photosensitive resin composition. When the photopolymerizable monomer in the range is contained, the photopolymerizable monomer can be sufficiently cured upon exposure during the pattern forming process and thus reliability is improved, and developability by development with an alkaline developer Improved.

The photopolymerization initiator is a commonly used initiator in the photosensitive resin composition, and may be, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, or an anthraquinone-based compound. a compound, or a combination thereof.

Examples of the acetophenone-based compound may be 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyl group. Trichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4- (Methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzylmethyl-2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one, etc. .

Examples of the benzophenone-based compound may be benzophenone, benzhydryl benzoate, benzhydryl methyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated Benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobiphenyl Ketone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone and the like.

Examples of the thioxanthone-based compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone , 2-chlorothioxanthone and the like.

Examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal or the like.

Examples of the triazine-based compound may be 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3',4 '-Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethane) -s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis ( Trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-three Pyrazine, 2-(naphthoquinone-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthoquinone-1-yl)-4,6-bis ( Trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperidinyl-s-triazine, 2-4-bis(trichloromethyl)-6- (4- Methoxystyryl)-s-triazine and the like.

Examples of the lanthanoid compound may be an O-indenyl lanthanide compound, 2-(o-benzylidene fluorenyl)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1- (o-Ethyl hydrazide)-1-[9-ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxygen Amino-1-phenylpropan-1-one and the like. An example of the O-mercapto lanthanide compound may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl- Phenyl)-butan-1-one, 1-(4-phenylthiophenyl)-butan-1,2-dione 2-indole-O-benzoate, 1-(4-phenylthiobenzene Base)-octane-1,2-dione 2-indole-O-benzoate, 1-(4-phenylthiophenyl)-oct-1-one oxime-O-acetate, and 1- (4-Benzylthiophenyl)-butan-1-one oxime-O-acetate.

In addition to the above-mentioned compound, the photopolymerization initiator may further contain an oxazole compound, a diketone compound, a lanthanum borate compound, a diazo compound, an imidazole compound, a biimidazole compound, an anthraquinone compound, and the like.

The photopolymerization initiator can be used together with a photosensitizer capable of causing a chemical reaction by absorbing light and being excited and then transmitting its energy.

Examples of the photosensitizer may be tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-mercaptopropionate, dipentaerythritol tetrakis-mercaptopropionate or the like.

The photopolymerization initiator may be contained in an amount of 0.1% by weight to 3% by weight, for example, 0.1% by weight to 2% by weight based on the total amount of the photosensitive resin composition. When the photopolymerization initiator in the range is contained, since sufficient curing is performed during the exposure of the pattern forming process, excellent reliability can be ensured, and the transmittance can be prevented from being deteriorated by the non-reactive initiator.

The solvent is a material having compatibility with, but not reacting with, the compound according to the examples, the pigment, the binder resin, the photopolymerizable monomer, and the photopolymerization initiator.

Examples of the solvent may include an alcohol such as methanol, ethanol, etc.; an ether such as dichloroethyl ether, n-butyl ether, diisoamyl ether, anisole, tetrahydrofuran or the like; a glycol ether such as ethylene glycol monomethyl ether or ethylene Alcohol monoethyl ether, etc.; cellosolve acetate, such as methyl cellosolve acetate, ethyl cellosolve acetate, diethyl cellosolve acetate, etc.; carbitol, such as methyl ethyl carbitol, diethyl Carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, etc.; propylene glycol alkyl ether acetate, For example, propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, etc.; aromatic hydrocarbons such as toluene, xylene, etc.; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentyl Ketone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-pentyl ketone, 2-heptanone, etc.; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate Ester, isobutyl acetate, etc.; lactate, such as methyl lactate, ethyl lactate, etc.; alkyl oxyacetate, such as methyl oxyacetate, ethyl oxyacetate, oxygen Butyl acetate and the like; alkyl alkoxyacetate, such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc. An alkyl 3-oxopropionate such as methyl 3-oxypropionate, ethyl 3-oxypropionate or the like; an alkyl 3-alkoxypropionate such as 3-methoxypropionic acid Methyl ester, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, etc.; alkyl 2-oxopropionate, such as 2-oxypropane Methyl ester, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc.; alkyl 2-alkoxypropionate, such as methyl 2-methoxypropionate, 2-methoxy Ethyl propionate, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate, etc.; 2-oxy-2-methylpropionate, such as 2-oxy-2-methylpropane Methyl ester, ethyl 2-oxy-2-methylpropionate, etc.; alkyl monooxymonocarboxylate of alkyl 2-alkoxy-2-methylpropanoate, such as 2-methoxy Methyl 2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc.; esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate , ethyl hydroxyacetate, 2-hydroxy-3-methyl Methyl butyrate or the like; a keto ester such as ethyl pyruvate. In addition, high boiling solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformamide, N-methylacetamide, N,N-di can also be used. Methylacetamide, N-methylpyrrolidone, dimethyl hydrazine, benzyl ethyl ether, dihexyl ether, acetamidine, isophorone, caproic acid, octanoic acid, 1-octanol, 1-indole Alcohol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl acetate Cellulolytic agent, etc.

In view of miscibility and reactivity, a glycol ether such as ethylene glycol monoethyl ether or the like; ethylene glycol alkyl ether acetate such as ethyl cellosolve acetate; and the like; an ester such as 2-hydroxypropyl may be preferably used. Ethyl acetate or the like; carbitol, such as diethylene glycol monomethyl ether; and propylene glycol alkyl ether acetate, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, and the like.

The solvent may be included in the balance (for example, 15% by weight to 50% by weight, or for example, 20% by weight to 40% by weight) based on the total amount of the photosensitive resin composition. When a solvent in the range is contained, the photosensitive resin composition may have an appropriate viscosity, and thus the coating processability can be improved when applied to a product.

The photosensitive resin composition according to the embodiment may further contain other additives to prevent generation of stains or spots during coating, to adjust leveling characteristics, or to prevent pattern residue due to undeveloped: for example, malonic acid; 3-amino- 1,2-propanediol; a decane-based coupling agent; a leveling agent; a fluorine-based surfactant; a radical polymerization initiator; or a combination thereof.

Examples of the decane coupling agent may be trimethoxydecyl benzoic acid, γ-methyl propylene methoxy propyl trimethoxy decane, vinyl triethoxy decane, vinyl trimethoxy decane, γ-isocyanate. Propyl triethoxy decane, γ-glycidoxypropyl trimethoxy decane, β-(3,4-epoxycyclohexyl)ethyltrimethoxy decane, etc., and the decane coupling agent can be used Used alone or in a mixture of two or more.

Examples of the fluorine-based surfactant may be the following commercially available fluorine-based surfactants: for example, BM-1000 ^® and BM-1100 ^® (BM Chemie Inc.); MEGAFACE F 142D ^® , F 172 ^® , F 173 ^® and F 183 ^® (Dainippon Ink Kagaku Kogyo Co., Ltd.); FULORAD FC-135 ^® , FULORAD FC-170C ^® , FULORAD FC-430 ^® and FULORAD FC-431 ^® (Sumitomo 3M Co., Ltd.); SURFLON S-112 ^® , SURFLON S-113 ^® , SURFLON S-131 ^® , SURFLON S-141 ^® and SURFLON S-145 ^® (Asahi Glass Co., Ltd. ( Asahi Glass Co., Ltd.); and SH-28PA ^® , SH-190 ^® , SH-193 ^® , SZ-6032 ^® and SF-8428 ^® (Toray Silicone Co., Ltd.) )).

The amount of these additives can be adjusted depending on the desired properties.

The photosensitive resin composition may further contain an epoxy compound to improve the close contact property with the substrate.

The epoxy compound may comprise a phenol novolac epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A epoxy compound, an alicyclic epoxy compound, or a combination thereof.

Further, the photosensitive resin composition may contain a predetermined amount of other additives such as an antioxidant, a stabilizer, or the like, unless other additives deteriorate the properties of the photosensitive resin composition.

According to another embodiment, there is provided a color filter including a photosensitive resin film manufactured using the photosensitive resin composition according to the embodiment.

The pattern forming process of the color filter is as follows.

The process includes: applying a positive photosensitive resin composition on a support substrate by spin coating, slit coating, inkjet printing, or the like; drying the applied positive photosensitive resin composition to form a photosensitive resin composition The film is exposed; the positive photosensitive resin composition film is exposed; the exposed positive photosensitive resin composition film is developed in an alkaline aqueous solution to obtain a photosensitive resin film; and the photosensitive resin film is heat-treated. The conditions of the patterning process are well known in the relevant art and will not be described in detail in this specification.

In the following, the present invention will be described in more detail with reference to examples, however, these examples should not be construed as limiting the scope of the invention in any way.

(synthesis of compounds)

向二甲基甲醯胺（dimethyl formamide，DMF，250 ml）中添加了2-溴-2-甲氧基苯乙酮（1 mol）並與此同時在室溫下進行了攪拌。向反應溶液中添加了鄰苯二甲醯亞胺鉀（0.95 mol），且將混合物攪拌了3小時。當反應完成之後，使用水（2500 ml）獲得了沉澱物，並然後進行了過濾及乾燥以獲得由化學式2-1表示的化合物。（產率：78%）Synthesis Example 1-1: Synthesis of a compound represented by Chemical Formula 2-1

2-Bromo-2-methoxyacetophenone (1 mol) was added to dimethyl formamide (DMF, 250 ml) and stirred at room temperature. Potassium phthalimide (0.95 mol) was added to the reaction solution, and the mixture was stirred for 3 hours. After completion of the reaction, a precipitate was obtained using water (2500 ml), and then filtered and dried to obtain a compound represented by Chemical Formula 2-1. (Yield: 78%)

根據與合成例1-1相同的方法使用2-溴-4'-甲氧基苯乙酮作為起始材料合成了由化學式2-2表示的化合物。（產率：75.6 %）Synthesis Example 1-2: Synthesis of Compound represented by Chemical Formula 2-2 [Chemical Formula 2-2]

The compound represented by Chemical Formula 2-2 was synthesized by the same method as in Synthesis Example 1-1 using 2-bromo-4'-methoxyacetophenone as a starting material. (Yield: 75.6 %)

根據與合成例1-1相同的方法使用2-溴-2'-氯苯乙酮作為起始材料合成了由化學式2-3表示的化合物。（產率：74.5 %）Synthesis Example 1-3: Synthesis of a compound represented by Chemical Formula 2-3 [Chemical Formula 2-3]

The compound represented by Chemical Formula 2-3 was synthesized by the same method as in Synthesis Example 1-1 using 2-bromo-2'-chloroacetophenone as a starting material. (Yield: 74.5 %)

根據與合成例1-1相同的方法使用2-溴-4'-氯苯乙酮作為起始材料合成了由化學式2-4表示的化合物。（產率：78.4 %）Synthesis Example 1-4: Synthesis of a compound represented by Chemical Formula 2-4 [Chemical Formula 2-4]

The compound represented by Chemical Formula 2-4 was synthesized by the same method as in Synthesis Example 1-1 using 2-bromo-4'-chloroacetophenone as a starting material. (Yield: 78.4%)

根據與合成例1-1相同的方法使用2-溴-4'-苯基苯乙酮作為起始材料合成了由化學式2-5表示的化合物。（產率：76.8 %）Synthesis Example 1-5: Synthesis of a compound represented by Chemical Formula 2-5 [Chemical Formula 2-5]

The compound represented by Chemical Formula 2-5 was synthesized by the same method as in Synthesis Example 1-1 using 2-bromo-4'-phenylacetophenone as a starting material. (Yield: 76.8 %)

根據與合成例1-1相同的方法使用2-溴苯乙酮作為起始材料合成了由化學式2-6表示的化合物。（產率：81.5 %）Synthesis Example 1-6: Synthesis of a compound represented by Chemical Formula 2-6 [Chemical Formula 2-6]

The compound represented by Chemical Formula 2-6 was synthesized by the same method as in Synthesis Example 1-1 using 2-bromoacetophenone as a starting material. (Yield: 81.5 %)

向甲苯（500 ml）中添加了氰基乙酸（1.46 mol）及2,6-二-叔丁基-4-甲基環己醇（1.33 mol），且在室溫下對混合物進行了攪拌。向此反應溶液中添加了吡啶（1.59 mol）並與此同時進行了攪拌。向此溶液中添加了無水乙酸（2.65 mol）並與此同時攪拌了6小時以完成反應。將反應溶液用10%鹽酸水溶液（500 g）洗滌了兩次，並用氯化鈉水溶液（500 g）洗滌了兩次。使用硫酸鎂移除了水，且通過對其進行過濾及乾燥獲得了由化學式3-1表示的化合物。（產率：62.5 %）Synthesis Example 2: Synthesis of a compound represented by Chemical Formula 3-1

Toluene (500 ml) was added with cyanoacetic acid (1.46 mol) and 2,6-di-tert-butyl-4-methylcyclohexanol (1.33 mol), and the mixture was stirred at room temperature. To the reaction solution, pyridine (1.59 mol) was added and stirred at the same time. Anhydrous acetic acid (2.65 mol) was added to this solution and stirred at the same time for 6 hours to complete the reaction. The reaction solution was washed twice with 10% aqueous hydrochloric acid (500 g) and twice with aqueous sodium chloride (500 g). Water was removed using magnesium sulfate, and the compound represented by Chemical Formula 3-1 was obtained by filtering and drying it. (Yield: 62.5 %)

向甲醇（10 ml）與水（10 ml）的混合溶液中添加了由化學式2-1表示的化合物（3.8 mol）及由化學式3-1表示的化合物（4.15 mol），並接著與此同時進行了攪拌。向其中滴加了48%的氫氧化鈉水溶液（8.36 mol），且將混合物加熱至70℃並攪拌了3小時。使用薄層色譜法（thin layer chromatography，TLC）對反應進行了監視並接著完成了反應。將所得物冷卻至室溫，用水及己烷進行了洗滌，並進行了乾燥以獲得由化學式4-1表示的化合物。（產率：69 %）Synthesis Example 3-1: Synthesis of a compound represented by Chemical Formula 4-1

To the mixed solution of methanol (10 ml) and water (10 ml), a compound (3.8 mol) represented by Chemical Formula 2-1 and a compound (4.15 mol) represented by Chemical Formula 3-1 were added, and then simultaneously Stir. A 48% aqueous sodium hydroxide solution (8.36 mol) was added dropwise thereto, and the mixture was heated to 70 ° C and stirred for 3 hours. The reaction was monitored using thin layer chromatography (TLC) and then the reaction was completed. The resultant was cooled to room temperature, washed with water and hexane, and dried to obtain a compound represented by Chemical Formula 4-1. (Yield: 69%)

根據與合成例3-1相同的方法使用由化學式2-2表示的化合物作為起始材料合成了由化學式4-2表示的化合物。（產率：71.8 %）Synthesis Example 3-2: Synthesis of Compound represented by Chemical Formula 4-2 [Chemical Formula 4-2]

The compound represented by Chemical Formula 4-2 was synthesized by the same procedure as in Synthesis Example 3-1 using the compound represented by Chemical Formula 2-2 as a starting material. (Yield: 71.8 %)

根據與合成例3-1相同的方法使用由化學式2-3表示的化合物作為起始材料合成了由化學式4-3表示的化合物。（產率：70.2 %）Synthesis Example 3-3: Synthesis of Compound represented by Chemical Formula 4-3 [Chemical Formula 4-3]

The compound represented by Chemical Formula 4-3 was synthesized by the same procedure as in Synthesis Example 3-1 using the compound represented by Chemical Formula 2-3 as a starting material. (Yield: 70.2%)

根據與合成例3-1相同的方法使用由化學式2-4表示的化合物作為起始材料合成了由化學式4-4表示的化合物。（產率：69.2 %）Synthesis Example 3-4: Synthesis of Compound represented by Chemical Formula 4-4 [Chemical Formula 4-4]

The compound represented by Chemical Formula 4-4 was synthesized by the same procedure as in Synthesis Example 3-1 using the compound represented by Chemical Formula 2-4 as a starting material. (Yield: 69.2%)

根據與合成例3-1相同的方法使用由化學式2-5表示的化合物作為起始材料合成了由化學式4-5表示的化合物。（產率：70.1 %）Synthesis Example 3-5: Synthesis of a compound represented by Chemical Formula 4-5 [Chemical Formula 4-5]

The compound represented by Chemical Formula 4-5 was synthesized by the same procedure as in Synthesis Example 3-1 using the compound represented by Chemical Formula 2-5 as a starting material. (Yield: 70.1%)

根據與合成例3-1相同的方法使用由化學式2-6表示的化合物作為起始材料合成了由化學式4-6表示的化合物。（產率：73.4 %）Synthesis Example 3-6: Synthesis of a compound represented by Chemical Formula 4-6 [Chemical Formula 4-6]

The compound represented by Chemical Formula 4-6 was synthesized by the same procedure as in Synthesis Example 3-1 using the compound represented by Chemical Formula 2-6 as a starting material. (Yield: 73.4%)

向乙酸（800 g）中添加了由化學式4-1表示的化合物（0.38 mol），並接著與此同時在室溫下進行了攪拌。向此反應溶液中添加了原甲酸三乙酯（0.23 mol），且將混合物加熱至130℃並攪拌了10小時。當反應完成之後，用乙腈（100 g）對所得物進行了過濾，且向其中添加了乙腈（100 g），並且將混合物進行了攪拌。對此溶液進行了過濾並然後用乙腈（100 g）進行了洗滌，且進行了乾燥以獲得由化學式5-1表示的化合物。（產率：68.7 %）Synthesis Example 4-1: Synthesis of a compound represented by Chemical Formula 5-1

To the acetic acid (800 g), a compound (0.38 mol) represented by Chemical Formula 4-1 was added, and then stirred at room temperature at the same time. To the reaction solution was added triethyl orthoformate (0.23 mol), and the mixture was heated to 130 ° C and stirred for 10 hours. After the reaction was completed, the resultant was filtered with acetonitrile (100 g), and acetonitrile (100 g) was added thereto, and the mixture was stirred. This solution was filtered and then washed with acetonitrile (100 g) and dried to obtain a compound represented by Chemical Formula 5-1. (Yield: 68.7 %)

根據與合成例4-1相同的方法使用由化學式4-2表示的化合物作為起始材料合成了由化學式5-2表示的化合物。（產率：70.4 %）Synthesis Example 4-2: Synthesis of Compound represented by Chemical Formula 5-2 [Chemical Formula 5-2]

The compound represented by Chemical Formula 5-2 was synthesized by the same procedure as in Synthesis Example 4-1 using the compound represented by Chemical Formula 4-2 as a starting material. (Yield: 70.4%)

根據與合成例4-1相同的方法使用由化學式4-3表示的化合物作為起始材料合成了由化學式5-3表示的化合物。（產率：69.6 %）Synthesis Example 4-3: Synthesis of Compound represented by Chemical Formula 5-3 [Chemical Formula 5-3]

The compound represented by Chemical Formula 5-3 was synthesized by the same procedure as in Synthesis Example 4-1 using the compound represented by Chemical Formula 4-3 as a starting material. (Yield: 69.6 %)

根據與合成例4-1相同的方法使用由化學式4-4表示的化合物作為起始材料合成了由化學式5-4表示的化合物。（產率：71.9 %）Synthesis Example 4-4: Synthesis of Compound represented by Chemical Formula 5-4 [Chemical Formula 5-4]

The compound represented by Chemical Formula 5-4 was synthesized by the same procedure as in Synthesis Example 4-1 using the compound represented by Chemical Formula 4-4 as a starting material. (Yield: 71.9 %)

根據與合成例4-1相同的方法使用由化學式4-5表示的化合物作為起始材料合成了由化學式5-5表示的化合物。（產率：74.2 %）Synthesis Example 4-5: Synthesis of a compound represented by Chemical Formula 5-5 [Chemical Formula 5-5]

The compound represented by Chemical Formula 5-5 was synthesized by the same procedure as in Synthesis Example 4-1 using the compound represented by Chemical Formula 4-5 as a starting material. (Yield: 74.2%)

根據與合成例4-1相同的方法使用由化學式4-6表示的化合物作為起始材料合成了由化學式5-6表示的化合物。（產率：72.8 %）Synthesis Example 4-6: Synthesis of a compound represented by Chemical Formula 5-6 [Chemical Formula 5-6]

The compound represented by Chemical Formula 5-6 was synthesized by the same procedure as in Synthesis Example 4-1 using the compound represented by Chemical Formula 4-6 as a starting material. (Yield: 72.8 %)

向甲苯（17 ml）中添加了由化學式5-1表示的化合物，並與此同時進行了攪拌。向此溶液中滴加了氫氧化鈉（40%的水溶液，0.036 mmol）。隨後，在室溫下向其中添加了四丁基溴化銨（tetrabutyl ammonium bromide，TBAB，0.0012 mmol），將混合物攪拌了30分鐘並使用冰浴冷卻至0℃。向反應溶液中添加了1-金剛烷碳醯氯（1-adamantane carbonyl chloride）（0.072 mmol）。在移除冰浴後加熱至室溫的同時將混合物攪拌了2小時以完成反應。用水（100 ml）及乙酸乙酯（100 ml）對所得物進行了洗滌及乾燥以獲得由化學式6-1表示的化合物。（產率：72.5 %）Synthesis Example 5-1: Synthesis of a compound represented by Chemical Formula 6-1

The compound represented by Chemical Formula 5-1 was added to toluene (17 ml), and stirred at the same time. To the solution was added dropwise sodium hydroxide (40% aqueous solution, 0.036 mmol). Subsequently, tetrabutyl ammonium bromide (TBAB, 0.0012 mmol) was added thereto at room temperature, and the mixture was stirred for 30 minutes and cooled to 0 ° C using an ice bath. 1-adamantane carbonyl chloride (0.072 mmol) was added to the reaction solution. The mixture was stirred for 2 hours while heating to room temperature after removing the ice bath to complete the reaction. The resultant was washed with water (100 ml) and ethyl acetate (100 ml) and dried to give a compound of formula 6-1. (Yield: 72.5 %)

根據與合成例5-1相同的方法使用由化學式5-1表示的化合物及4-甲氧基-2-甲基苯甲醯氯作為起始材料合成了由化學式6-2表示的化合物。（產率：74.2 %）Synthesis Example 5-2: Synthesis of Compound represented by Chemical Formula 6-2 [Chemical Formula 6-2]

The compound represented by Chemical Formula 6-2 was synthesized by the same procedure as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-1 and 4-methoxy-2-methylbenzhydrin chloride as a starting material. (Yield: 74.2%)

根據與合成例5-1相同的方法使用由化學式5-2表示的化合物及1-金剛烷碳醯氯作為起始材料合成了由化學式6-3表示的化合物。（產率：74.5 %）Synthesis Example 5-3: Synthesis of Compound represented by Chemical Formula 6-3 [Chemical Formula 6-3]

The compound represented by Chemical Formula 6-3 was synthesized by the same method as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-2 and 1-adamantanecarbofluorene as a starting material. (Yield: 74.5 %)

根據與合成例5-1相同的方法使用由化學式5-2表示的化合物及4-甲氧基-4-甲基苯甲醯氯作為起始材料合成了由化學式6-4表示的化合物。（產率：78.2 %）Synthesis Example 5-4: Synthesis of Compound represented by Chemical Formula 6-4 [Chemical Formula 6-4]

The compound represented by Chemical Formula 6-4 was synthesized by the same procedure as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-2 and 4-methoxy-4-methylbenzhydrin chloride as a starting material. (Yield: 78.2%)

根據與合成例5-1相同的方法使用由化學式5-4表示的化合物及1-金剛烷碳醯氯作為起始材料合成了由化學式6-5表示的化合物。（產率：72.6 %）Synthesis Example 5-5: Synthesis of a compound represented by Chemical Formula 6-5 [Chemical Formula 6-5]

The compound represented by Chemical Formula 6-5 was synthesized by the same method as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-4 and 1-adamantanecarbofluorene as a starting material. (Yield: 72.6 %)

根據與合成例5-1相同的方法使用由化學式5-5表示的化合物及1-金剛烷碳醯氯作為起始材料合成了由化學式6-6表示的化合物。（產率：70.4 %）Synthesis Example 5-6: Synthesis of a compound represented by Chemical Formula 6-6 [Chemical Formula 6-6]

The compound represented by Chemical Formula 6-6 was synthesized by the same procedure as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-5 and 1-adamantanecarbofluorene as a starting material. (Yield: 70.4%)

根據與合成例5-1相同的方法使用由化學式5-5表示的化合物及4-甲氧基-2-甲基苯甲醯氯作為起始材料合成了由化學式6-7表示的化合物。（產率：74.6 %）Synthesis Example 5-7: Synthesis of a compound represented by Chemical Formula 6-7 [Chemical Formula 6-7]

The compound represented by Chemical Formula 6-7 was synthesized by the same method as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-5 and 4-methoxy-2-methylbenzhydrin chloride as a starting material. (Yield: 74.6 %)

根據與合成例5-1相同的方法使用由化學式5-5表示的化合物及2-甲氧基苯甲醯氯作為起始材料合成了由化學式6-8表示的化合物。（產率：75.1 %）Synthesis Example 5-8: Synthesis of a compound represented by Chemical Formula 6-8 [Chemical Formula 6-8]

The compound represented by Chemical Formula 6-8 was synthesized by the same method as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-5 and 2-methoxybenzimid chloride as a starting material. (Yield: 75.1%)

根據與合成例5-1相同的方法使用由化學式5-5表示的化合物及2-(甲硫基)苯甲醯氯作為起始材料合成了由化學式6-9表示的化合物。（產率：72.3 %）Synthesis Example 5-9: Synthesis of a compound represented by Chemical Formula 6-9 [Chemical Formula 6-9]

The compound represented by Chemical Formula 6-9 was synthesized by the same procedure as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-5 and 2-(methylthio)benzhydrin chloride as a starting material. (Yield: 72.3 %)

根據與合成例5-1相同的方法使用由化學式5-6表示的化合物及4-甲氧基-2-甲基苯甲醯氯作為起始材料合成了由化學式6-10表示的化合物。（產率：72.3 %）Synthesis Example 5-10: Synthesis of a compound represented by Chemical Formula 6-10 [Chemical Formula 6-10]

The compound represented by Chemical Formula 6-10 was synthesized by the same method as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-6 and 4-methoxy-2-methylbenzhydrin chloride as a starting material. (Yield: 72.3 %)

根據與合成例5-1相同的方法使用由化學式5-2表示的化合物及2-三氟甲基苯甲醯氯作為起始材料合成了由化學式6-11表示的化合物。（產率：78.2 %）Synthesis Example 5-11: Synthesis of a compound represented by Chemical Formula 6-11 [Chemical Formula 6-11]

The compound represented by Chemical Formula 6-11 was synthesized by the same procedure as in Synthesis Example 5-1 using the compound represented by Chemical Formula 5-2 and 2-trifluoromethylbenzhydrin chloride as a starting material. (Yield: 78.2%)

向水（60 ml）/甲醇（90 ml）的混合溶液中添加了4-叔丁基苯甲酸（0.14 mol）及甲醇鈉（30%的甲醇溶液，0.14 mol）。向此溶液中添加了硫酸鋅7水合物（0.06 mol）。在室溫下將混合物攪拌了1小時以完成反應。當反應完成之後，對所得物進行了過濾，用水（1000 ml）及甲醇（1000 ml）進行洗滌以獲得由化學式7-1表示的化合物。（產率：90.1 %）Synthesis Example 6-1: Synthesis of a compound represented by Chemical Formula 7-1

To a mixed solution of water (60 ml) / methanol (90 ml) was added 4-tert-butylbenzoic acid (0.14 mol) and sodium methoxide (30% methanol solution, 0.14 mol). To this solution was added zinc sulfate 7 hydrate (0.06 mol). The mixture was stirred at room temperature for 1 hour to complete the reaction. After the reaction was completed, the resultant was filtered, washed with water (1000 ml) and methanol (1000 ml) to obtain a compound represented by the formula 7-1. (Yield: 90.1%)

根據與合成例6-1相同的方法使用2-(2,3-二甲基苯基氨基)苯甲酸作為起始材料合成了由化學式7-2表示的化合物。（產率：93.3 %）Synthesis Example 6-2: Synthesis of Compound represented by Chemical Formula 7-2 [Chemical Formula 7-2]

The compound represented by Chemical Formula 7-2 was synthesized by the same method as in Synthesis Example 6-1 using 2-(2,3-dimethylphenylamino)benzoic acid as a starting material. (Yield: 93.3%)

向乙醇（10 ml）中添加了由化學式6-1表示的化合物（0.642 mmol）及由化學式7-1表示的化合物（0.835 mmol），並與此同時在室溫下進行了攪拌。用薄層色譜法對反應進行了檢查並完成了反應。在對反應溶液的乙醇進行乾燥之後用亞甲基氯（100 ml）及水（100 ml）對所得物進行了洗滌，以獲得由化學式1-1表示的化合物。（產率：81.7%，基質輔助雷射脫吸離子化飛行時間質譜（matrix-assisted laser desorption/ionization time-of-flight mass spectrometry，Maldi tof Mass）：1454.8）Synthesis Example 7-1: Synthesis of Compound (Dye) represented by Chemical Formula 1-1

A compound (0.642 mmol) represented by Chemical Formula 6-1 and a compound (0.835 mmol) represented by Chemical Formula 7-1 were added to ethanol (10 ml), and stirred at room temperature. The reaction was examined by thin layer chromatography and the reaction was completed. After drying the ethanol of the reaction solution, the resultant was washed with methylene chloride (100 ml) and water (100 ml) to obtain a compound represented by Chemical Formula 1-1. (Yield: 81.7%, matrix-assisted laser desorption/ionization time-of-flight mass spectrometry, Maldi tof Mass: 1454.8)

基質輔助雷射脫吸離子化飛行時間質譜：1426.7 根據與合成例7-1相同的方法使用由化學式6-4表示的化合物及由化學式7-1表示的化合物作為起始材料合成了由化學式1-2表示的化合物。（產率：82.8%）Synthesis Example 7-2: Synthesis of Compound (Dye) represented by Chemical Formula 1-2 [Chemical Formula 1-2]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1426.7 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-4 and the compound represented by Chemical Formula 7-1 as a starting material. a compound represented by -2. (Yield: 82.8%)

基質輔助雷射脫吸離子化飛行時間質譜：1465.7 根據與合成例7-1相同的方法使用由化學式6-5表示的化合物及由化學式7-1表示的化合物作為起始材料合成了由化學式1-3表示的化合物。（產率：84.1%）Synthesis Example 7-3: Synthesis of Compound (Dye) Represented by Chemical Formula 1-3 [Chemical Formula 1-3]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1465.7 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-5 and the compound represented by Chemical Formula 7-1 as a starting material. a compound represented by -3. (Yield: 84.1%)

基質輔助雷射脫吸離子化飛行時間質譜：1547.9 根據與合成例7-1相同的方法使用由化學式6-6表示的化合物及由化學式7-1表示的化合物作為起始材料合成了由化學式1-4表示的化合物。（產率：87.2 %）Synthesis Example 7-4: Synthesis of Compound (Dye) Represented by Chemical Formula 1-4 [Chemical Formula 1-4]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1547.9 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-6 and the compound represented by Chemical Formula 7-1 as a starting material. a compound represented by -4. (Yield: 87.2%)

基質輔助雷射脫吸離子化飛行時間質譜：1491.7 根據與合成例7-1相同的方法使用由化學式7-1表示的化合物作為起始材料合成了由化學式1-5表示的化合物。（產率：82.2 %）Synthesis Example 7-5: Synthesis of Compound (Dye) represented by Chemical Formula 1-5 [Chemical Formula 1-5]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1491.7 The compound represented by Chemical Formula 1-5 was synthesized by the same procedure as in Synthesis Example 7-1 using the compound represented by Chemical Formula 7-1 as a starting material. (Yield: 82.2%)

基質輔助雷射脫吸離子化飛行時間質譜：1522.67 根據與合成例7-1相同的方法使用由化學式6-9表示的化合物及由化學式7-1表示的化合物作為起始材料合成了由化學式1-6表示的化合物。（產率：81.8 %）Synthesis Example 7-6: Synthesis of Compound (Dye) Represented by Chemical Formula 1-6 [Chemical Formula 1-6]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1522.67 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-9 and the compound represented by Chemical Formula 7-1 as a starting material. a compound represented by -6. (Yield: 81.8 %)

基質輔助雷射脫吸離子化飛行時間質譜：1489.72 根據與合成例7-1相同的方法使用由化學式6-2表示的化合物及由化學式7-2表示的化合物作為起始材料合成了由化學式1-7表示的化合物。（產率：85.8 %）Synthesis Example 7-7: Synthesis of Compound (Dye) represented by Chemical Formula 1-7 [Chemical Formula 1-7]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1498.72 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-2 and the compound represented by Chemical Formula 7-2 as a starting material. a compound represented by -7. (Yield: 85.8 %)

基質輔助雷射脫吸離子化飛行時間質譜：1454.81 根據與合成例7-1相同的方法使用由化學式6-3表示的化合物及由化學式7-2表示的化合物作為起始材料合成了由化學式1-8表示的化合物。（產率：82.3 %）Synthesis Example 7-8: Synthesis of Compound (Dye) represented by Chemical Formula 1-8 [Chemical Formula 1-8]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1454.81 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-3 and the compound represented by Chemical Formula 7-2 as a starting material. a compound represented by -8. (Yield: 82.3 %)

基質輔助雷射脫吸離子化飛行時間質譜：1541.49 根據與合成例7-1相同的方法使用由化學式6-7表示的化合物及由化學式7-2表示的化合物作為起始材料合成了由化學式1-9表示的化合物。（產率：84.3 %）Synthesis Example 7-9: Synthesis of Compound (Dye) represented by Chemical Formula 1-9 [Chemical Formula 1-9]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1541.19 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-7 and the compound represented by Chemical Formula 7-2 as a starting material. a compound represented by -9. (Yield: 84.3 %)

基質輔助雷射脫吸離子化飛行時間質譜：1569.52 根據與合成例7-1相同的方法使用由化學式6-8表示的化合物及由化學式7-2表示的化合物作為起始材料合成了由化學式1-10表示的化合物。（產率：80.6 %）Synthesis Example 7-10: Synthesis of Compound (Dye) represented by Chemical Formula 1-10 [Chemical Formula 1-10]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1659.52 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-8 and the compound represented by Chemical Formula 7-2 as a starting material. a compound represented by -10. (Yield: 80.6 %)

基質輔助雷射脫吸離子化飛行時間質譜：1429.17 根據與合成例7-1相同的方法使用由化學式6-2表示的化合物及由化學式7-1表示的化合物作為起始材料合成了由化學式1-11表示的化合物（染料）。（產率：85.8 %）Synthesis Example 7-11: Synthesis of Compound (Dye) represented by Chemical Formula 1-11 [Chemical Formula 1-11]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1429.17 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-2 and the compound represented by Chemical Formula 7-1 as a starting material. Compound (dye) represented by -11. (Yield: 85.8 %)

基質輔助雷射脫吸離子化飛行時間質譜：1401.11 根據與合成例7-1相同的方法使用由化學式6-11表示的化合物及由化學式7-2表示的化合物作為起始材料合成了由化學式1-12表示的化合物（染料）。（產率：85.8 %）Synthesis Example 7-12: Synthesis of Compound (Dye) represented by Chemical Formula 1-12 [Chemical Formula 1-12]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1401.11 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-11 and the compound represented by Chemical Formula 7-2 as a starting material. Compound (dye) represented by -12. (Yield: 85.8 %)

基質輔助雷射脫吸離子化飛行時間質譜：1366.69 根據與合成例7-1相同的方法使用由化學式6-10表示的化合物及由化學式7-1表示的化合物作為起始材料合成了由化學式C-1表示的化合物。（產率：78.6 %）Comparative Synthesis Example 1: Synthesis of a compound represented by Chemical Formula C-1 [Chemical Formula C-1]

Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: 1366.69 was synthesized according to the same method as in Synthesis Example 7-1 using the compound represented by Chemical Formula 6-10 and the compound represented by Chemical Formula 7-1 as a starting material. a compound represented by -1. (Yield: 78.6 %)

Assessment 1: Solubility Measurement

A dilution solvent (Anone) was added to each of 0.5 g of each compound synthesized in Synthesis Example 7-1 to Synthesis Example 7-12 and Comparative Synthesis Example 1, respectively, using a rotary mixer (MIXROTAR VMR) -5, Luchi Inc.) Each solution was stirred at 25 ° C and 100 rpm for 1 hour, and then the solubility of each compound was confirmed and the results are shown in Table 1. (Anone refers to cyclohexanone.)

Solubility Evaluation Reference The compound (solute) is greater than or equal to 2.5% by weight based on the total amount of the diluent solvent: ○ The compound (solute) is less than 2.5% by weight based on the total amount of the diluent solvent: ×

[Table 1] (Unit: % by weight)

Referring to Table 1, the compounds according to Examples 7-1 to 7-12 (compounds according to the examples) have excellent solubility with respect to an organic solvent as compared with the compound according to Comparative Synthesis Example 1, and thus when used for a photosensitive resin The composition and the like exhibit excellent color characteristics.

(Synthesis of photosensitive resin composition)

Example 1 to Example 14 and Comparative Example 1 to Comparative Example 4

The photosensitive resin compositions according to Examples 1 to 14 and Comparative Examples 1 to 4 were prepared to have each composition using the following components shown in Table 2 and Table 3.

Specifically, the photopolymerization initiator was dissolved in a solvent, and the solution was stirred at room temperature for 2 hours, and a binder resin and a photopolymerizable compound were added thereto, and the mixture was stirred at room temperature for 2 hours. Subsequently, a dye and a pigment dispersion were added as a colorant to the obtained reactant, and the obtained mixture was stirred at room temperature for one hour. Then, the product thus obtained was filtered 3 times to remove impurities to prepare a photosensitive resin composition.

(A) Adhesive Resin Acrylic Adhesive Resin (OH-139, Samsung SDI Co., Ltd.)

(B) Colorant Dye (B-1) Compound of Synthesis Example 7-1 (Compound represented by Chemical Formula 1-1) (B-2) Compound of Synthesis Example 7-2 (Compound represented by Chemical Formula 1-2) (B-3) Compound of Synthesis Example 7-3 (Compound represented by Chemical Formula 1-3) (B-4) Synthesis of Compound of Example 7-4 (Compound represented by Chemical Formula 1-4) (B-5) Synthesis Compound of Example 7-5 (compound represented by Chemical Formula 1-5) (B-6) Synthesis of Compound of Example 7-6 (Compound represented by Chemical Formula 1-6) (B-7) Synthesis of Compound of Example 7-7 (Compound represented by Chemical Formula 1-7) (B-8) The compound of Synthesis Example 7-8 (compound represented by Chemical Formula 1-8) (B-9) The compound of Synthesis Example 7-9 (Chemical Formula 1-9) (B-10) Compound of Synthesis Example 7-10 (Compound represented by Chemical Formula 1-10) (B-11) Compound of Synthesis Example 7-11 (Compound represented by Chemical Formula 1-11) (B) -12) Compound of Synthesis Example 7-12 (compound represented by Chemical Formula 1-12) (B-13) Comparative Compound of Synthesis Example 1 (Compound represented by Chemical Formula C-1) Pigment Dispersion (B-14) C.I Pigment Blue 15: 6 dispersion (GC1679, Sanyo (Sanyo)) (B-15) "blue 15: violet dye 6+" co-dispersing liquid (GC1207, Sanyo)

(C) Photopolymerizable monomer DPHA (Japan Chemicals Co., Ltd.)

(D) Photopolymerization initiator Lanthanide initiator (OXE01, BASF)

(E) Solvent propylene glycol monomethyl ether acetate (PGMEA, Kyowa Co., Ltd.)

(F) Other additives Fluoride-based surfactant (F-554, DIC Co., Ltd.)

[Table 2] (Unit: % by weight)

[Table 3] (Unit: % by weight)

Assessment 2: Measurement of brightness, heat resistance, and chemical resistance

The photosensitive resin compositions according to Examples 1 to 14 and Comparative Examples 1 to 4 were respectively coated to a thickness of 1 μm to 3 μm on a 1 mm thick degresed glass substrate, and then at 90 ° C. The plate was dried for 2 minutes to obtain a film (250 rpm to 350 rpm). The film was exposed using a high pressure mercury lamp (exposure condition: 50 mJ/cm ² ) having a main wavelength of 365 nm, and a 111-fold diluted KOH developing solution (washing solution/developing solution = 1/0.8) was used in the developer. Developed for 60 seconds. Subsequently, the film was dried in a forced convection drying oven at 230 ° C for 20 minutes to obtain a color sample.

The luminance of the color sample (based on 0.1065) was measured using a spectrophotometer (MCPD3000, Otsuka Electronics Co., Ltd.) (based on C light source), and the results are shown in Table 4.

The color samples were dried again in a convection oven at 230 ° C for 60 minutes, and the color difference of the color samples before and after drying was measured using a spectrophotometer (MCPD3000, Otsuka Electronics Co., Ltd.) based on the C light source, and The heat resistance (DEab*) of the sample was then measured, and the results are shown in Table 4.

The color samples were precipitated in a methyl pyrrolidone (NMP) solution at 80 ° C for 1 minute, and the absorbance of the color sample of the methylpyrrolidone solution was analyzed using an ultraviolet-visible spectrometer (UV-VIS) to measure the resistance. Chemical (elution resistance), and the results are shown in Table 4.

[Table 4]

Referring to Table 4, the photosensitive resin composition containing the chemical formula 1 as a dye or a photosensitive resin composition containing a compound exceeding the range described below is contained in an amount of 5 to 20% by weight based on the total amount of the photosensitive resin composition. The photosensitive resin composition of the compound represented by Chemical Formula 1 as a dye in an amount of, for example, 10% by weight to 15% by weight, exhibits excellent color characteristics, heat resistance, and chemical resistance.

While the present invention has been described in connection with the exemplary embodiments of the present invention, it is understood that the invention is not limited to the disclosed embodiments, but rather, the invention is intended to cover Various modifications and equivalent arrangements within the spirit and scope of the scope.

no.

no.

no.

Claims (20)

A compound represented by Chemical Formula 1: [Chemical Formula 1] Wherein, in Chemical Formula 1, R ¹ is a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to a C20 aryl group, R ² is a substituted or unsubstituted C 3 to C 20 alicyclic cyclic group, or a substituted or unsubstituted C 6 to C 20 aryl group, with the proviso that the aryl group has only at least one a substituent selected from a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group R ³ to R ^{5 are} independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group, m and n are independently an integer ranging from 1 to 5, and L is represented by Chemical Formula 2, [Chemical Formula 2] Wherein, in Chemical Formula 2, L ¹ is -O(C=O)- or -S-, and A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 fat. a cyclocyclic group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group. The compound of claim 1, wherein R ¹ is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted group. C6 to C20 aryl. The compound of claim 1, wherein R ² is a substituted or unsubstituted adamantyl group, or a substituted or unsubstituted phenyl group, with the proviso that the phenyl group has only at least one a substituent selected from a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group. The compound of claim 3, wherein R ² is the unsubstituted adamantyl group or has at least one selected from the group consisting of a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, and substituted Or the unsubstituted C1 to C10 alkoxy group, and the substituted or unsubstituted C1 to C10 alkylthio group of the phenyl group. The compound of claim 1, wherein R ³ to R ^{5 are} independently a substituted or unsubstituted C1 to C20 alkyl group. The compound according to claim 1, wherein L is represented by one selected from Chemical Formula 3 to Chemical Formula 7: [Chemical Formula 3] [Chemical Formula 4] [Chemical Formula 5] [Chemical Formula 6] [Chemical Formula 7] Wherein, in Chemical Formula 3 to Chemical Formula 7, R ⁶ is a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted fluorenyl group, R ⁷ to R ⁹ independently of a hydroxy group or a substituted or unsubstituted C1 to C10 alkyl group, with the proviso that at least one of R ⁷ and R ⁸ is a hydroxyl group, and R ¹⁰ is a substituted or unsubstituted C1 to C10 alkane The bases, o and p are independently integers ranging from 1 to 3, with the constraint being 2 ≤ o + p ≤ 5, and q being an integer ranging from 0 to 4. The compound according to claim 6, wherein the substituted or unsubstituted amino group is represented by Chemical Formula 8, and the substituted or unsubstituted fluorenyl group is represented by Chemical Formula 9: [Chemical Formula 8] [Chemical Formula 9] Wherein, in Chemical Formula 8, R ^x is a substituted or unsubstituted C1 to C10 alkyl group, and z is an integer ranging from 0 to 5. The compound according to claim 6, wherein R6 is a tert-butyl group, a substituent represented by Chemical Formula 8, or a substituent represented by Chemical Formula 9, and R ⁷ to R ^{9 are} independently a hydroxyl group or a t-butyl group. The limitation is that at least one of R ⁷ and R ⁸ is a hydroxyl group, and R ¹⁰ is a substituted or unsubstituted methyl group, a substituted or unsubstituted ethyl group, a substituted or unsubstituted propyl group, Substituted or unsubstituted butyl group, or substituted or unsubstituted pentyl group: [Chemical Formula 8] [Chemical Formula 9] Wherein, in Chemical Formula 8, R ^x is a substituted or unsubstituted C1 to C10 alkyl group, and z is an integer ranging from 0 to 5. The compound according to claim 1, wherein the chemical formula 1 is represented by Chemical Formula 10-1 or Chemical Formula 10-2: [Chemical Formula 10-1] [Chemical Formula 10-2] Wherein, in Chemical Formula 10-1 and Chemical Formula 10-2, R ¹ is a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group, R ² a substituted or unsubstituted C3 to C20 alicyclic cyclic group, or a substituted or unsubstituted C6 to C20 aryl group, with the proviso that the aryl group has at least one selected from a halogen atom and substituted Or an unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, and a substituted or unsubstituted C1 to C10 alkylthio group, R ³ to R ⁵ independently The ground is a substituted or unsubstituted C1 to C20 alkyl group, and L is represented by Chemical Formula 2, [Chemical Formula 2] Wherein, in Chemical Formula 2, L ¹ is -O(C=O)-, and A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring. A substituted or unsubstituted C6 to C20 aryl group. The compound according to claim 1, wherein the chemical formula 1 is represented by one selected from the group consisting of Chemical Formula 1-1 to Chemical Formula 1-12: [Chemical Formula 1-1] [Chemical Formula 1-2] [Chemical Formula 1-3] [Chemical Formula 1-4] [Chemical Formula 1-5] [Chemical Formula 1-6] [Chemical Formula 1-7] [Chemical Formula 1-8] [Chemical Formula 1-9] [Chemical Formula 1-10] [Chemical Formula 1-11] [Chemical Formula 1-12] . The compound according to claim 1, wherein the compound represented by Chemical Formula 1 has a maximum absorbance in a wavelength range of 450 nm to 600 nm. A photosensitive resin composition comprising the compound according to any one of claims 1 to 11 as a dye. The photosensitive resin composition according to claim 12, wherein the photosensitive resin composition further comprises a binder resin, a pigment, a photopolymerizable monomer, a photopolymerization initiator, and a solvent. The photosensitive resin composition according to claim 12, wherein the dye is contained in an amount of from 5% by weight to 20% by weight based on the total of the photosensitive resin composition. The photosensitive resin composition according to claim 14, wherein the dye is contained in an amount of 10% by weight to 15% by weight based on the total of the photosensitive resin composition. The photosensitive resin composition according to claim 13, wherein the pigment is a blue pigment. The photosensitive resin composition according to claim 13, wherein the binder resin comprises an acrylic binder resin, a cardo binder resin, or a combination thereof. The photosensitive resin composition according to claim 13, wherein the photosensitive resin composition contains 1% by weight to 10% by weight of the binder based on the total amount of the photosensitive resin composition. Resin; 45% by weight to 80% by weight of a coloring agent comprising the dye and the pigment; 1% by weight to 5% by weight of the photopolymerizable monomer; 0.1% by weight to 3% by weight of the photopolymerizable An initiator; and the balance of the solvent. The photosensitive resin composition according to claim 12, wherein the photosensitive resin composition further comprises the following additives: malonic acid; 3-amino-1,2-propanediol; decane-based coupling agent; a fluorine-based surfactant; a radical polymerization initiator; or a combination thereof. A color filter comprising a photosensitive resin film produced by using the photosensitive resin composition according to claim 12 of the patent application.