TW201741298A - Compound, colorant composition comprising the same and resin composition comprising the same, photosensitive material, color filter, display device capable of improving color reproduction, brightness and contrast ratio - Google Patents
Compound, colorant composition comprising the same and resin composition comprising the same, photosensitive material, color filter, display device capable of improving color reproduction, brightness and contrast ratio Download PDFInfo
- Publication number
- TW201741298A TW201741298A TW106116394A TW106116394A TW201741298A TW 201741298 A TW201741298 A TW 201741298A TW 106116394 A TW106116394 A TW 106116394A TW 106116394 A TW106116394 A TW 106116394A TW 201741298 A TW201741298 A TW 201741298A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- chemical formula
- substituted
- compound
- carbon atoms
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/58—[b]- or [c]-condensed
- C07D209/72—4,7-Endo-alkylene-iso-indoles
- C07D209/76—4,7-Endo-alkylene-iso-indoles with oxygen atoms in positions 1 and 3
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/04—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B25/00—Quinophthalones
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
本說明書是有關於一種化合物、包含此化合物的著色劑組成物以及包含此化合物的樹脂組成物。The present specification relates to a compound, a color former composition comprising the same, and a resin composition comprising the same.
最近,對於彩色濾光片,要求以高亮度、高明暗比為特徵的性能。另外,顯示元件開發的主要目的之一在於由色純度的提升帶來的顯示元件性能的差別化及製造步驟上的生產性的提升。Recently, for color filters, performance characterized by high brightness and high light to dark ratio is required. In addition, one of the main purposes of the development of display elements is the differentiation of display element performance and the improvement of productivity in manufacturing steps due to the improvement in color purity.
先前,用作彩色濾光片的著色劑的顏料類型是以粒子分散狀態存在於彩色光阻劑中,因此,難以藉由顏料粒子的大小與分布調節來調節亮度及明暗比。於顏料粒子的情況下,於彩色濾光片內凝聚,溶解及分散性降低,由於凝聚(aggregation)的大粒子而產生光的多重散射(multiple scattering)。已指出此種偏光的光的散射是使明暗比降低的主要原因。為了藉由顏料的超微粒化及分散穩定化來提升亮度及明暗比,正在不斷地進行努力,但就用以實現高色純度顯示裝置用色座標的著色劑的選定而言自由度受限。另外,使用已開發出的著色材料、特別是顏料的顏料分散法於提升使用其的彩色濾光片的色純度、亮度及明暗比的方面有限。Previously, the type of pigment used as a color filter of a color filter was present in a color dispersion in a particle-dispersed state, and therefore, it was difficult to adjust the brightness and the light-dark ratio by adjusting the size and distribution of the pigment particles. In the case of pigment particles, aggregation occurs in the color filter, solubility and dispersibility are lowered, and multiple scattering of light occurs due to large particles of aggregation. It has been pointed out that the scattering of such polarized light is the main reason for the reduction in the light to dark ratio. In order to increase the brightness and the light-dark ratio by the ultrafine particle size and dispersion stabilization of the pigment, efforts are being made continuously, but the degree of freedom is limited in the selection of the coloring agent for realizing the color coordinates of the high-color purity display device. Further, the pigment dispersion method using the developed coloring material, particularly the pigment, is limited in terms of improving the color purity, brightness, and brightness ratio of the color filter using the color filter.
藉此,要求開發可藉由提高色純度來提升色彩再現、亮度及明暗比的新穎的著色劑。 [現有技術文獻] [專利文獻]Accordingly, it is required to develop a novel coloring agent which can enhance color reproduction, brightness, and brightness ratio by improving color purity. [Prior Art Document] [Patent Literature]
[專利文獻1]韓國公開專利公報第2012-0139606號[Patent Document 1] Korean Patent Publication No. 2012-0139606
[發明所欲解決的課題] 本說明書提供一種化合物、包含此化合物的著色劑組成物以及包含此化合物的樹脂組成物。 [解決課題的手段][Problems to be Solved by the Invention] The present specification provides a compound, a color former composition containing the same, and a resin composition containing the compound. [Means for solving the problem]
本說明書的一實施態樣提供一種下述化學式1所表示的化合物。One embodiment of the present specification provides a compound represented by the following Chemical Formula 1.
[化學式1] [Chemical Formula 1]
所述化學式1中, Y1及Y2分別獨立地為直接鍵結、或者CQ1Q2, Q1、Q2、R6~R13中的兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~30的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~30的單環或多環的雜環, Q1、Q2、R1~R5及R6~R13中的不與鄰接的基形成環者分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、以及經取代或未經取代的碳數2~30的單環或多環的雜芳基所組成的群組中。In the chemical formula 1, Y1 and Y2 are each independently a direct bond or CQ1Q2, and two or more mutually adjacent groups of Q1, Q2 and R6 to R13 are bonded to each other to form at least one or more substituted or Unsubstituted monocyclic or polycyclic aromatic hydrocarbon ring having 6 to 30 carbon atoms or substituted or unsubstituted heterocyclic or polycyclic heterocyclic ring having 2 to 30 carbon atoms, Q1, Q2, R1 to R5 and R6 to R13, which are not independently bonded to each other, are independently selected from hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 30 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted carbon number 2 to A group consisting of 30 monocyclic or polycyclic heteroaryl groups.
本說明書的另一實施態樣提供一種包含所述化學式1所表示的化合物的著色劑組成物。Another embodiment of the present specification provides a color former composition comprising the compound represented by Chemical Formula 1.
本說明書的又一實施態樣提供一種包含所述著色劑組成物的樹脂組成物。 [發明的效果]Yet another embodiment of the present specification provides a resin composition comprising the colorant composition. [Effects of the Invention]
本說明書的一實施態樣的化合物能夠用作染料,因而可用作彩色濾光片材料。A compound of an embodiment of the present specification can be used as a dye and thus can be used as a color filter material.
本說明書的一實施態樣的包含所述化合物的樹脂組成物的色彩特性、耐熱性及耐溶劑性優異。The resin composition containing the compound according to an embodiment of the present specification is excellent in color characteristics, heat resistance, and solvent resistance.
另外,本說明書的一實施態樣的包含所述化合物的樹脂組成物發揮防止已微粒化的顏料的再凝聚及異物生成的作用,於應用於彩色濾光片的情況下,明暗比提升。Further, the resin composition containing the compound according to an embodiment of the present invention functions to prevent re-agglomeration and foreign matter formation of the finely divided pigment, and when applied to a color filter, the light-dark ratio is improved.
以下,對本說明書進行更詳細的說明。Hereinafter, the present specification will be described in more detail.
本說明書的一實施態樣提供一種所述化學式1所表示的化合物。所述化學式1的特徵在於:取代基R6~R13中的至少一個以上為硝基。所述硝基可於化合物整體中發揮拉電子的作用。One embodiment of the present specification provides a compound represented by the above Chemical Formula 1. The chemical formula 1 is characterized in that at least one of the substituents R6 to R13 is a nitro group. The nitro group can function as a pull electron in the entire compound.
本說明書中,以下對取代基的例示進行說明,但並不限定於此。In the present specification, the following description of the substituents will be given, but the invention is not limited thereto.
所述所謂「取代」的用語是指化合物的鍵結於碳原子上的氫原子置換為其他取代基,所取代的位置若為氫原子被取代的位置、即取代基能夠進行取代的位置,則並無限定,於取代兩個以上的情況下,兩個以上的取代基可相互相同或者不同。The term "substitution" means that a hydrogen atom bonded to a carbon atom of a compound is substituted with another substituent, and the position substituted is a position at which a hydrogen atom is substituted, that is, a position at which a substituent can be substituted. It is not limited, and in the case of replacing two or more, two or more substituents may be the same or different from each other.
本說明書中所謂「經取代或未經取代的」的用語是指由選自由重氫、鹵素基、烷基、烯基、烷氧基、環烷基、矽烷基、芳烷基、芳烯基、酯基、羰基、芳基、芳基氧基、烷基硫氧基、烷基磺酸氧基、芳基磺酸氧基、硼基、烷基胺基、芳烷基胺基、芳基胺基、雜芳基、咔唑基、丙烯醯基、丙烯酸酯基、醚基、腈基、硝基、羥基、氰基、以及包含N、O、S、或P原子中的一個以上的雜環基所組成的群組中的一個以上的取代基所取代、或者由所述例示的取代基中的兩個以上的取代基連結而成的取代基所取代、或者不具有任何取代基。例如,「兩個以上的取代基連結而成的取代基」可為聯苯基。即,聯苯基可為芳基,亦可解釋為兩個苯基連結而成的取代基。The term "substituted or unsubstituted" as used in the specification means selected from the group consisting of heavy hydrogen, halogen, alkyl, alkenyl, alkoxy, cycloalkyl, nonylalkyl, aralkyl, aralkenyl. , ester group, carbonyl group, aryl group, aryloxy group, alkyl thiooxy group, alkyl sulfonate oxy group, aryl sulfonate oxy group, boron group, alkyl amine group, aralkyl group, aryl group An amine group, a heteroaryl group, a carbazolyl group, an acryloyl group, an acrylate group, an ether group, a nitrile group, a nitro group, a hydroxyl group, a cyano group, and one or more impurities including N, O, S, or P atoms One or more substituents in the group consisting of a cyclic group are substituted or substituted with a substituent in which two or more substituents in the above-exemplified substituent are bonded, or have no substituent. For example, the "substituent in which two or more substituents are bonded" may be a biphenyl group. That is, the biphenyl group may be an aryl group, and may also be interpreted as a substituent in which two phenyl groups are bonded.
本說明書中,鹵素基的例子有氟、氯、溴或碘。In the present specification, examples of the halogen group are fluorine, chlorine, bromine or iodine.
本說明書中,所述烷基可為直鏈或者分支鏈,碳數並無特別限定,較佳為1~50。具體例有:甲基、乙基、丙基、正丙基、異丙基、丁基、正丁基、異丁基、第三丁基、第二丁基、1-甲基-丁基、1-乙基-丁基、戊基、正戊基、異戊基、新戊基、第三戊基、己基、正己基、1-甲基戊基、2-甲基戊基、4-甲基-2-戊基、3,3-二甲基丁基、2-乙基丁基、庚基、正庚基、1-甲基己基、環戊基甲基、環己基甲基、辛基、正辛基、第三辛基、1-甲基庚基、2-乙基己基、2-丙基戊基、正壬基、2,2-二甲基庚基、1-乙基-丙基、1,1-二甲基-丙基、異己基、2-甲基戊基、4-甲基己基、5-甲基己基等,但並不限定於該些。In the present specification, the alkyl group may be a straight chain or a branched chain, and the number of carbon atoms is not particularly limited, and is preferably from 1 to 50. Specific examples are: methyl, ethyl, propyl, n-propyl, isopropyl, butyl, n-butyl, isobutyl, tert-butyl, t-butyl, 1-methyl-butyl, 1-ethyl-butyl, pentyl, n-pentyl, isopentyl, neopentyl, third amyl, hexyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl Benzyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, heptyl, n-heptyl, 1-methylhexyl, cyclopentylmethyl, cyclohexylmethyl, octyl , n-octyl, trioctyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-decyl, 2,2-dimethylheptyl, 1-ethyl-propyl The group is 1,1,1-dimethyl-propyl, isohexyl, 2-methylpentyl, 4-methylhexyl, 5-methylhexyl, etc., but is not limited thereto.
本說明書中,所述烯基可為直鏈或者分支鏈,碳數並無特別限定,較佳為2~40。具體例有:乙烯基、1-丙烯基、異丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-戊烯基、2-戊烯基、3-戊烯基、3-甲基-1-丁烯基、1,3-丁二烯基、烯丙基、1-苯基乙烯基-1-基、2-苯基乙烯基-1-基、2,2-二苯基乙烯基-1-基、2-苯基-2-(萘基-1-基)乙烯基-1-基、2,2-雙(二苯基-1-基)乙烯基-1-基、二苯乙烯基、苯乙烯基等,但並不限定於該些。In the present specification, the alkenyl group may be a straight chain or a branched chain, and the number of carbon atoms is not particularly limited, but is preferably 2 to 40. Specific examples are: vinyl, 1-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, 3-pentene , 3-methyl-1-butenyl, 1,3-butadienyl, allyl, 1-phenylvinyl-1-yl, 2-phenylvinyl-1-yl, 2, 2-diphenylvinyl-1-yl, 2-phenyl-2-(naphthyl-1-yl)vinyl-1-yl, 2,2-bis(diphenyl-1-yl)vinyl -1-yl, distyryl, styryl, and the like, but are not limited thereto.
本說明書中,所述烷氧基可為直鏈、分支鏈或環鏈。烷氧基的碳數並無特別限定,較佳為碳數1~20。具體而言可為:甲氧基、乙氧基、正丙氧基、異丙氧基、異丙基氧基、正丁氧基、異丁氧基、第三丁氧基、第二丁氧基、正戊基氧基、新戊基氧基、異戊基氧基、正己基氧基、3,3-二甲基丁基氧基、2-乙基丁基氧基、正辛基氧基、正壬基氧基、正癸基氧基、苄基氧基、對甲基苄基氧基等,但並不限定於該些。In the present specification, the alkoxy group may be a straight chain, a branched chain or a cyclic chain. The carbon number of the alkoxy group is not particularly limited, but is preferably 1 to 20 carbon atoms. Specifically, it may be: methoxy, ethoxy, n-propoxy, isopropoxy, isopropyloxy, n-butoxy, isobutoxy, tert-butoxy, second butoxy , n-pentyloxy, neopentyloxy, isopentyloxy, n-hexyloxy, 3,3-dimethylbutyloxy, 2-ethylbutyloxy, n-octyloxy The group, n-decyloxy group, n-decyloxy group, benzyloxy group, p-methylbenzyloxy group and the like are not limited thereto.
本說明書中,環己基並無特別限定,可為碳數3~20,特別是可為環戊基、環己基。In the present specification, the cyclohexyl group is not particularly limited, and may have a carbon number of 3 to 20, and particularly may be a cyclopentyl group or a cyclohexyl group.
本說明書中,關於所述芳烷基,具體而言,芳基部分能夠應用與後述的芳基相關的說明,為碳數6~49,烷基部位為碳數1~44。具體例有:苄基、對甲基苄基、間甲基苄基、對乙基苄基、間乙基苄基、3,5-二甲基苄基、α-甲基苄基、α,α-二甲基苄基、α,α-甲基苯基苄基、1-萘基苄基、2-萘基苄基、對氟苄基、3,5-二氟苄基、α,α-二-三氟甲基苄基、對甲氧基苄基、間甲氧基苄基、α-苯氧基苄基、α-苄氧基苄基、萘基甲基、萘基乙基、萘基異丙基、吡咯基甲基、吡咯基乙基、胺基苄基、硝基苄基、氰基苄基、1-羥基-2-苯基異丙基、1-氯-2-苯基異丙基等,但並不限定於該些。In the present specification, the arylalkyl group, specifically, the aryl moiety can be used in the description of the aryl group described later, and has a carbon number of 6 to 49 and an alkyl group of 1 to 44 carbon atoms. Specific examples are: benzyl, p-methylbenzyl, m-methylbenzyl, p-ethylbenzyl, m-ethylbenzyl, 3,5-dimethylbenzyl, α-methylbenzyl, α, α-Dimethylbenzyl, α,α-methylphenylbenzyl, 1-naphthylbenzyl, 2-naphthylbenzyl, p-fluorobenzyl, 3,5-difluorobenzyl, α,α -di-trifluoromethylbenzyl, p-methoxybenzyl, m-methoxybenzyl, α-phenoxybenzyl, α-benzyloxybenzyl, naphthylmethyl, naphthylethyl, Naphthylisopropyl, pyrrolylmethyl, pyrrolylethyl, aminobenzyl, nitrobenzyl, cyanobenzyl, 1-hydroxy-2-phenylisopropyl, 1-chloro-2-benzene The isopropyl group or the like is not limited thereto.
本說明書中,關於芳烯基的芳基部分,能夠應用與後述的芳基相關的說明,烯基部分能夠應用與所述烯基相關的說明。In the present specification, as for the aryl moiety of the aralkenyl group, a description relating to an aryl group to be described later can be applied, and a description relating to the alkenyl group can be applied to the alkenyl moiety.
本說明書中,酯基的碳數並無特別限定,較佳為碳數1~50。具體而言,可為下述結構式的化合物,但並不限定於此。 In the present specification, the carbon number of the ester group is not particularly limited, but is preferably from 1 to 50 carbon atoms. Specifically, it may be a compound of the following structural formula, but is not limited thereto.
本說明書中,羰基的碳數並無特別限定,較佳為碳數1~50。具體而言,可為如下所述的結構的化合物,但並不限定於此。 In the present specification, the carbon number of the carbonyl group is not particularly limited, but is preferably from 1 to 50 carbon atoms. Specifically, it may be a compound having the structure described below, but is not limited thereto.
本說明書中,於所述芳基為單環式芳基的情況下,碳數並無特別限定,較佳為碳數6~25。具體而言,單環式芳基為苯基、聯苯基、聯三苯基等,但並不限定於該些。In the present specification, when the aryl group is a monocyclic aryl group, the carbon number is not particularly limited, and is preferably 6 to 25 carbon atoms. Specifically, the monocyclic aryl group is a phenyl group, a biphenyl group, a biphenyl group or the like, but is not limited thereto.
於所述芳基為多環式芳基的情況下,碳數並無特別限定,較佳為碳數10~24。具體而言,多環式芳基為萘基、蒽基、菲基、芘基、苝基、基、茀基等,但並不限定於該些。In the case where the aryl group is a polycyclic aryl group, the carbon number is not particularly limited, and is preferably 10 to 24 carbon atoms. Specifically, the polycyclic aryl group is a naphthyl group, an anthracenyl group, a phenanthryl group, a fluorenyl group, a fluorenyl group, Base, base, etc., but not limited to these.
本說明書中,所述茀基可經取代,鄰接的取代基可相互鍵結而形成環。In the present specification, the fluorenyl group may be substituted, and adjacent substituents may be bonded to each other to form a ring.
於所述茀基被取代的情況下,可為、、、及等,但並不限定於該些。In the case where the thiol group is substituted, , , ,and Etc., but not limited to these.
本說明書中,雜芳基為包含一個以上的非碳原子的異種原子者,具體而言,所述異種原子可包含一個以上的選自由O、N、Se及S等所組成的群組中的原子。雜芳基的碳數並無特別限定,較佳為碳數2~60。雜環基的例子有:噻吩基、呋喃基、吡咯基、咪唑基、噻唑基、噁唑基、噁二唑基、三唑基、吡啶基、聯吡啶基、嘧啶基、三嗪基、三唑基、吖啶基、噠嗪基、吡嗪基、喹啉基、喹唑啉基、喹噁啉基、酞嗪基、吡唑并嘧啶基、吡唑并吡嗪基、吡嗪并吡嗪基、異喹啉基、吲哚基、咔唑基、苯并噁唑基、苯并咪唑基、苯并噻唑基、苯并咔唑基、苯并噻吩基、二苯并噻吩基、苯并呋喃基、啡啉基(phenanthroline)、噻唑基、異噁唑基、噁二唑基、噻二唑基、苯并噻唑基、啡噻嗪基以及二苯并呋喃基等,但並非僅限定於該些。In the present specification, a heteroaryl group is a hetero atom having one or more non-carbon atoms, and specifically, the hetero atom may include one or more groups selected from the group consisting of O, N, Se, and S. atom. The carbon number of the heteroaryl group is not particularly limited, but is preferably from 2 to 60 carbon atoms. Examples of heterocyclic groups are: thienyl, furyl, pyrrolyl, imidazolyl, thiazolyl, oxazolyl, oxadiazolyl, triazolyl, pyridyl, bipyridyl, pyrimidinyl, triazinyl, tri Azyl, acridinyl, pyridazinyl, pyrazinyl, quinolinyl, quinazolinyl, quinoxalinyl, pyridazinyl, pyrazolopyrimidinyl, pyrazolopyrazinyl, pyrazinopyridinium Azinyl, isoquinolyl, decyl, oxazolyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, benzoxazolyl, benzothienyl, dibenzothiophenyl, benzene And furanyl, phenanthroline, thiazolyl, isoxazolyl, oxadiazolyl, thiadiazolyl, benzothiazolyl, phenothiazinyl and dibenzofuranyl, but not limited For that.
本說明書中,除了並非一價基以外,芳香族烴環能夠應用芳基的說明。In the present specification, the description of the aryl group can be applied to the aromatic hydrocarbon ring except that it is not a monovalent group.
本說明書中,除了並非一價基以外,雜環能夠應用雜芳基的說明。In the present specification, the heterocyclic ring can be applied to the description of the heteroaryl group, except that it is not a monovalent group.
本說明書中,「鄰接的」基團可指於和該取代基被取代的原子直接連結的原子上所取代的取代基、與該取代基在立體結構上位置最接近的取代基、或者於該取代基被取代的原子上取代的其他取代基。例如,取代於苯環中的鄰(ortho)位上的兩個取代基以及取代於脂肪族環中的同一碳上的兩個取代基可解釋為相互「鄰接的」基團。In the present specification, the "adjacent" group may mean a substituent substituted on an atom directly bonded to an atom to which the substituent is substituted, a substituent closest to the position of the substituent in a steric structure, or Other substituents substituted on the atom to which the substituent is substituted. For example, two substituents substituted at the ortho position in the phenyl ring and two substituents substituted on the same carbon in the aliphatic ring may be interpreted as "adjacent" groups.
本說明書中,所謂鄰接的基團相互鍵結而形成環,如上所述,是指鄰接的基團相互鍵結而形成5員~8員的烴環或形成5員~8員的雜環,可為單環或多環,亦可為脂肪族、芳香族、或該些縮合的形態,並不限定於此。In the present specification, the adjacent groups are bonded to each other to form a ring, and as described above, the adjacent groups are bonded to each other to form a hydrocarbon ring of 5 to 8 members or a heterocyclic ring of 5 to 8 members. It may be monocyclic or polycyclic, and may be aliphatic, aromatic, or a form of such condensation, and is not limited thereto.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、以及經取代或未經取代的碳數2~30的單環或多環的雜芳基所組成的群組中,R6~R13中的至少一個以上為硝基,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~30的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~30的單環或多環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 30 carbon atoms, substituted or not. a substituted alkoxy group having 1 to 30 carbon atoms, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted carbon number of 2 to 30 In the group consisting of a heterocyclic or polycyclic heteroaryl group, at least one of R6 to R13 is a nitro group, and at least two or more adjacent groups of R6 to R13 are bonded to each other to form at least one or more. A substituted or unsubstituted monocyclic or polycyclic aromatic hydrocarbon ring having 6 to 30 carbon atoms or a substituted or unsubstituted monocyclic or polycyclic heterocyclic ring having 2 to 30 carbon atoms.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~10的烷基、經取代或未經取代的碳數1~10的烷氧基、經取代或未經取代的碳數6~20的單環或多環的芳基、以及經取代或未經取代的碳數2~20的單環或多環的雜芳基所組成的群組中,R6~R13中的至少一個以上為硝基,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~20的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~20的單環或多環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 10 carbon atoms, substituted or not. Substituted alkoxy groups having 1 to 10 carbon atoms, substituted or unsubstituted monocyclic or polycyclic aryl groups having 6 to 20 carbon atoms, and substituted or unsubstituted carbon number 2 to 20 In the group consisting of a heterocyclic or polycyclic heteroaryl group, at least one of R6 to R13 is a nitro group, and at least two or more adjacent groups of R6 to R13 are bonded to each other to form at least one or more. A substituted or unsubstituted monocyclic or polycyclic aromatic hydrocarbon ring having 6 to 20 carbon atoms or a substituted or unsubstituted monocyclic or polycyclic heterocyclic ring having 2 to 20 carbon atoms.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數6~15的單環或多環的芳基、以及經取代或未經取代的碳數2~15的單環或多環的雜芳基所組成的群組中,R6~R13中的至少一個以上為硝基,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~15的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~15的單環或多環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted, mono- or polycyclic aryl having 6 to 15 carbon atoms. In the group consisting of a substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 2 to 15 carbon atoms, at least one of R6 to R13 is a nitro group, and at least one of R6 to R13 Two or more mutually adjacent groups are bonded to each other to form at least one substituted or unsubstituted monocyclic or polycyclic aromatic hydrocarbon ring having 6 to 15 carbon atoms, or substituted or unsubstituted A monocyclic or polycyclic heterocyclic ring having 2 to 15 carbon atoms.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、以及羥基所組成的群組中,R6~R13中的至少一個以上為硝基,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~10的單環的芳香族烴環、或者經取代或未經取代的碳數2~10的單環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, a heavy hydrogen, a halogen group, a nitro group, and a hydroxyl group, and at least one of R6 to R13 is a nitro group, R6. At least two or more mutually adjacent groups of -R13 are bonded to each other to form at least one substituted or unsubstituted monocyclic aromatic hydrocarbon ring having 6 to 10 carbon atoms, or substituted or not A substituted monocyclic heterocyclic ring having 2 to 10 carbon atoms.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、以及羥基所組成的群組中,R6~R13中的至少一個以上為硝基,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~10的單環的芳香族烴環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, a heavy hydrogen, a halogen group, a nitro group, and a hydroxyl group, and at least one of R6 to R13 is a nitro group, R6. At least two or more adjacent groups in the group -R13 are bonded to each other to form at least one substituted or unsubstituted monocyclic aromatic hydrocarbon ring having 6 to 10 carbon atoms.
依據本說明書的一實施態樣,所述化學式1所表示的化合物是由下述化學式2或化學式3所表示。According to an embodiment of the present specification, the compound represented by Chemical Formula 1 is represented by the following Chemical Formula 2 or Chemical Formula 3.
[化學式2] [Chemical Formula 2]
[化學式3] [Chemical Formula 3]
所述化學式2及化學式3中, Y1、Y2、R1~R13如化學式1中的定義所述, R14、R15及R6'~R15'分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、及經取代或未經取代的碳數6~30的單環或多環的芳基、以及經取代或未經取代的碳數2~30的單環或多環的雜芳基所組成的群組中, 所述化學式2的R6'~R9'中的一個以上、以及所述化學式3的R10'~R13'中的一個以上為硝基。In the chemical formula 2 and the chemical formula 3, Y1, Y2, R1 to R13 are as defined in the chemical formula 1, and R14, R15 and R6' to R15' are each independently selected from hydrogen, a heavy hydrogen, a halogen group, a nitro group, a hydroxy group, a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 30 carbon atoms, and a substituted or unsubstituted carbon number of 6 to 30 a group consisting of a cyclic or polycyclic aryl group and a substituted or unsubstituted heterocyclic group having 2 to 30 carbon atoms of a monocyclic or polycyclic ring, wherein R6' to R9' of the chemical formula 2 One or more of the above and one or more of R10' to R13' of the chemical formula 3 are a nitro group.
所述化學式2及化學式3中,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、經取代或未經取代的碳數6~30的單環或多環的芳基、以及經取代或未經取代的碳數2~30的單環或多環的雜芳基所組成的群組中,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~30的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~30的單環或多環的雜環,R14、R15及R6'~R15'分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~30的烷基、經取代或未經取代的碳數1~30的烷氧基、及經取代或未經取代的碳數6~30的單環或多環的芳基、以及經取代或未經取代的碳數2~30的單環或多環的雜芳基所組成的群組中,R6'~R13'中的至少一個以上為硝基。In the chemical formula 2 and the chemical formula 3, R1 to R13 are each independently selected from hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 30 carbon atoms, substituted or not. a substituted alkoxy group having 1 to 30 carbon atoms, a substituted or unsubstituted monocyclic or polycyclic aryl group having 6 to 30 carbon atoms, and a substituted or unsubstituted carbon number of 2 to 30 In the group consisting of a heterocyclic or polycyclic heteroaryl group, at least two or more adjacent groups of R6 to R13 are bonded to each other to form at least one substituted or unsubstituted carbon number 6 to a monocyclic or polycyclic aromatic hydrocarbon ring of 30, or a substituted or unsubstituted monocyclic or polycyclic heterocyclic ring having 2 to 30 carbon atoms, R14, R15 and R6' to R15' are each independently selected from Hydrogen, heavy hydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 30 carbon atoms, substituted or unsubstituted alkoxy having 1 to 30 carbon atoms, and substituted or An unsubstituted group of 6 to 30 monocyclic or polycyclic aryl groups, and a substituted or unsubstituted heterocyclic group having 2 to 30 carbon atoms of a monocyclic or polycyclic group. At least one of R6' to R13' is a nitro group.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~10的烷基、經取代或未經取代的碳數1~10的烷氧基、經取代或未經取代的碳數6~20的單環或多環的芳基、以及經取代或未經取代的碳數2~20的單環或多環的雜芳基所組成的群組中,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~20的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~20的單環或多環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 10 carbon atoms, substituted or not. Substituted alkoxy groups having 1 to 10 carbon atoms, substituted or unsubstituted monocyclic or polycyclic aryl groups having 6 to 20 carbon atoms, and substituted or unsubstituted carbon number 2 to 20 In the group consisting of a heterocyclic or polycyclic heteroaryl group, at least two or more adjacent groups of R6 to R13 are bonded to each other to form at least one substituted or unsubstituted carbon number 6 to a monocyclic or polycyclic aromatic hydrocarbon ring of 20 or a substituted or unsubstituted monocyclic or polycyclic heterocyclic ring having 2 to 20 carbon atoms.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數6~15的單環或多環的芳基、以及經取代或未經取代的碳數2~15的單環或多環的雜芳基所組成的群組中,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~15的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~15的單環或多環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted, mono- or polycyclic aryl having 6 to 15 carbon atoms. a group consisting of a substituted or unsubstituted monocyclic or polycyclic heteroaryl group having 2 to 15 carbon atoms, wherein at least two or more adjacent groups of R6 to R13 are bonded to each other And forming at least one substituted or unsubstituted monocyclic or polycyclic aromatic hydrocarbon ring having 6 to 15 carbon atoms, or substituted or unsubstituted monocyclic or polycyclic ring having 2 to 15 carbon atoms; Heterocyclic.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、以及羥基所組成的群組中,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~15的單環或多環的芳香族烴環、或者經取代或未經取代的碳數2~15的單環或多環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, a heavy hydrogen, a halogen group, a nitro group, and a hydroxyl group, and at least two of R6 to R13 are adjacent to each other. The groups are bonded to each other to form at least one substituted or unsubstituted monocyclic or polycyclic aromatic hydrocarbon ring having 6 to 15 carbon atoms, or a substituted or unsubstituted carbon number of 2 to 15 A cyclic or polycyclic heterocyclic ring.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、以及羥基所組成的群組中,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~10的單環的芳香族烴環、或者經取代或未經取代的碳數2~10的單環的雜環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, a heavy hydrogen, a halogen group, a nitro group, and a hydroxyl group, and at least two of R6 to R13 are adjacent to each other. The groups are bonded to each other to form at least one substituted or unsubstituted monocyclic aromatic hydrocarbon ring having 6 to 10 carbon atoms, or substituted or unsubstituted heterocyclic carbon having 2 to 10 carbon atoms ring.
依據本說明書的一實施態樣,R1~R13分別獨立地選自由氫、重氫、鹵素基、硝基、以及羥基所組成的群組中,R6~R13中的至少兩個以上的相互鄰接的基團相互鍵結而形成至少一個以上的經取代或未經取代的碳數6~10的單環的芳香族烴環。According to an embodiment of the present specification, R1 to R13 are each independently selected from the group consisting of hydrogen, a heavy hydrogen, a halogen group, a nitro group, and a hydroxyl group, and at least two of R6 to R13 are adjacent to each other. The groups are bonded to each other to form at least one substituted or unsubstituted monocyclic aromatic hydrocarbon ring having 6 to 10 carbon atoms.
依據本說明書的一實施態樣,R14、R15及R6'~R15'分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、經取代或未經取代的碳數1~10的烷基、經取代或未經取代的碳數1~10的烷氧基、及經取代或未經取代的碳數6~15的單環或多環的芳基、以及經取代或未經取代的碳數2~15的單環或多環的雜芳基所組成的群組中,R6'~R13'中的至少一個以上為硝基。According to an embodiment of the present specification, R14, R15 and R6' to R15' are each independently selected from the group consisting of hydrogen, dihydrogen, halogen, nitro, hydroxy, substituted or unsubstituted alkyl having 1 to 10 carbon atoms. a substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 15 carbon atoms or a substituted or unsubstituted aryl group In the group consisting of a monocyclic or polycyclic heteroaryl group having 2 to 15 carbon atoms, at least one of R6' to R13' is a nitro group.
依據本說明書的一實施態樣,R14、R15及R6'~R15'分別獨立地選自由氫、重氫、鹵素基、硝基、羥基、及經取代或未經取代的碳數6~10的單環的芳基、以及經取代或未經取代的碳數2~10的單環的雜芳基所組成的群組中,R6'~R13'中的至少一個以上為硝基。According to an embodiment of the present specification, R14, R15 and R6' to R15' are each independently selected from the group consisting of hydrogen, dihydrogen, halogen, nitro, hydroxy, and substituted or unsubstituted carbon number 6-10. In the group consisting of a monocyclic aryl group and a substituted or unsubstituted heterocyclic group having 2 to 10 carbon atoms, at least one of R6' to R13' is a nitro group.
依據本說明書的一實施態樣,R14、R15及R6'~R15'分別獨立地選自由氫、重氫、鹵素基、以及硝基所組成的群組中,R6'~R13'中的至少一個以上為硝基。According to an embodiment of the present specification, R14, R15 and R6' to R15' are each independently selected from the group consisting of hydrogen, a heavy hydrogen, a halogen group, and a nitro group, and at least one of R6' to R13' The above is a nitro group.
依據本說明書的一實施態樣,可提供一種所述化學式1由下述化學式4所表示的化合物。According to an embodiment of the present specification, a compound represented by the following Chemical Formula 4 can be provided.
[化學式4] [Chemical Formula 4]
所述化學式4中, R1~R5、R14、R15及R6'~R15'與所述相同。In the chemical formula 4, R1 to R5, R14, R15 and R6' to R15' are the same as described above.
依據本說明書的一實施態樣,提供一種所述化學式1中,R6~R9中的至少一個以上為鹵素元素的化合物。According to an embodiment of the present invention, in the chemical formula 1, at least one of R6 to R9 is a halogen element.
依據本說明書的一實施態樣,提供一種所述化學式2及化學式3中,R9'及R13’中的至少一個以上為硝基的化合物。According to one embodiment of the present specification, a compound in which at least one of R9' and R13' is a nitro group in Chemical Formula 2 and Chemical Formula 3 is provided.
依據本說明書的一實施態樣,提供一種所述化學式1所表示的化合物由下述化合物中的任一者所表示的化合物。 According to an embodiment of the present invention, there is provided a compound represented by any one of the following compounds.
依據本說明書的另一實施態樣,提供一種包含本說明書的一實施態樣的化合物的著色劑組成物。According to another embodiment of the present specification, a color former composition comprising a compound of an embodiment of the present specification is provided.
所述著色劑組成物可除了所述化學式1的化合物以外,更包含染料及顏料中的至少一種。例如,所述著色劑組成物可僅包含本說明書的一實施態樣的化合物,亦可包含所述化學式1的化合物與一種以上的染料,或者包含本說明書的一實施態樣的化合物與一種以上的顏料,或者包含所述化學式1的化合物、一種以上的染料以及一種以上的顏料。The colorant composition may further contain at least one of a dye and a pigment in addition to the compound of Chemical Formula 1. For example, the colorant composition may include only a compound of one embodiment of the present specification, or may include the compound of the chemical formula 1 and one or more dyes, or a compound containing one embodiment of the present specification and one or more A pigment, or a compound of the above formula 1, one or more dyes, and one or more pigments.
本說明書的一實施態樣中,提供一種包含所述著色劑組成物的樹脂組成物。In an embodiment of the present specification, a resin composition comprising the colorant composition is provided.
本說明書的一實施態樣中,所述樹脂組成物可更包含黏合劑樹脂、多官能性單體、光起始劑、以及溶媒。In an embodiment of the present specification, the resin composition may further comprise a binder resin, a polyfunctional monomer, a photoinitiator, and a solvent.
所述黏合劑樹脂若為可顯示出由樹脂組成物所製造的膜的強度、顯影性等物性者,則並無特別限定。The binder resin is not particularly limited as long as it exhibits physical properties such as strength and developability of the film produced from the resin composition.
所述黏合劑樹脂可使用賦予機械強度的多官能性單體與賦予鹼溶解性的單體的共聚合樹脂,可更包含該技術領域中通常使用的黏合劑。The binder resin may be a copolymerized resin of a polyfunctional monomer imparting mechanical strength and a monomer which imparts alkali solubility, and may further contain a binder which is generally used in the art.
賦予所述膜的機械強度的多官能性單體可為不飽和羧酸酯類、芳香族乙烯基類、不飽和醚類、不飽和醯亞胺類、以及酸酐中的任一種以上。The polyfunctional monomer which imparts mechanical strength to the film may be any one or more of unsaturated carboxylic acid esters, aromatic vinyls, unsaturated ethers, unsaturated quinones, and acid anhydrides.
所述不飽和羧酸酯類的具體例可選自由以下化合物所組成的群組中:(甲基)丙烯酸苄酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸2-苯氧基乙酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基-3-氯丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸醯基辛基氧基-2-羥基丙酯、丙三醇(甲基)丙烯酸酯、(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸3-甲氧基丁酯、乙氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基三丙二醇(甲基)丙烯酸酯、聚(乙二醇)甲醚(甲基)丙烯酸酯、苯氧基二乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚乙二醇(甲基)丙烯酸酯、對壬基苯氧基聚丙二醇(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸四氟丙酯、(甲基)丙烯酸1,1,1,3,3,3-六氟異丙酯、(甲基)丙烯酸八氟戊酯、(甲基)丙烯酸十七氟癸酯、(甲基)丙烯酸三溴苯酯、α-羥基甲基丙烯酸甲酯、α-羥基甲基丙烯酸乙酯、α-羥基甲基丙烯酸丙酯以及α-羥基甲基丙烯酸丁酯,但並非僅限定於該些。Specific examples of the unsaturated carboxylic acid esters may be selected from the group consisting of benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, (methyl) ) butyl acrylate, dimethylaminoethyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, cyclohexyl (meth) acrylate, (methyl) Isobornyl acrylate, ethylhexyl (meth)acrylate, 2-phenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, hydroxyethyl (meth)acrylate, (methyl) ) 2-hydroxypropyl acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, decyl octyloxy-2-hydroxypropyl (meth) acrylate Ester, glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxy diethylene glycol (meth) acrylate Ester, methoxytriethylene glycol (meth) acrylate, methoxy tripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl ether (meth) acrylate, phenoxy diethylene glycol (meth) acrylate, p-nonyl phenoxy polyethyl Glycol (meth) acrylate, p-nonyl phenoxy polypropylene glycol (meth) acrylate, glycidyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, (meth) acrylate 1, 1,1,3,3,3-hexafluoroisopropyl ester, octafluoropentyl (meth)acrylate, heptadecafluoro(meth)acrylate, tribromophenyl (meth)acrylate, α-hydroxyl Methyl methacrylate, α-hydroxyethyl methacrylate, α-hydroxypropyl methacrylate, and α-hydroxy methacrylate butyl ester are not limited thereto.
所述芳香族乙烯基單體類的具體例可選自由苯乙烯、α-甲基苯乙烯、(鄰、間、對)-乙烯基甲苯、(鄰、間、對)-甲氧基苯乙烯、以及(鄰、間、對)-氯苯乙烯所組成的群組中,但並非僅限定於該些。Specific examples of the aromatic vinyl monomer may be selected from styrene, α-methylstyrene, (o-, m-, p-)-vinyltoluene, (o-, m-, p-)-methoxystyrene. And the group consisting of (o-, m-, p-)-chlorostyrene, but not limited to these.
所述不飽和醚類的具體例可選自由乙烯基甲醚、乙烯基乙醚、以及烯丙基縮水甘基醚所組成的群組中,但並非僅限定於該些。Specific examples of the unsaturated ethers may be selected from the group consisting of vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether, but are not limited thereto.
所述不飽和醯亞胺類的具體例可選自由N-苯基順丁烯二醯亞胺、N-(4-氯苯基)順丁烯二醯亞胺、N-(4-羥基苯基)順丁烯二醯亞胺、以及N-環己基順丁烯二醯亞胺所組成的群組中,但並非僅限定於該些。Specific examples of the unsaturated quinone imines may be selected from N-phenyl maleimide, N-(4-chlorophenyl) maleimide, N-(4-hydroxybenzene The group consisting of butylenediamine and N-cyclohexylmethyleneimine is, but not limited to, only those groups.
所述酸酐有順丁烯二酸酐、甲基順丁烯二酸酐、四氫鄰苯二甲酸酐等,但並非僅限定於該些。The acid anhydride is maleic anhydride, methyl maleic anhydride, tetrahydrophthalic anhydride or the like, but is not limited thereto.
賦予所述鹼溶解性的單體若包含酸基,則並無特別限定,例如較佳為使用選自由(甲基)丙烯酸、丁烯酸、衣康酸、順丁烯二酸、反丁烯二酸、單甲基順丁烯二酸、5-降冰片烯-2-羧酸、鄰苯二甲酸單-2-((甲基)丙烯醯氧基)乙酯、丁二酸單-2-((甲基)丙烯醯氧基)乙酯、ω-羧基聚己內酯單(甲基)丙烯酸酯所組成的群組中的一種以上,但並非僅限定於該些。The monomer which imparts alkali solubility is not particularly limited as long as it contains an acid group, and for example, it is preferably selected from (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, and antibutene. Diacid, monomethyl maleic acid, 5-norbornene-2-carboxylic acid, mono-2-((meth)acryloxy)ethyl phthalate, succinic acid mono-2 One or more of the group consisting of -((meth)acryloxy)ethyl ester and ω-carboxypolycaprolactone mono(meth)acrylate, but it is not limited to these.
本說明書的一實施態樣中,所述黏合劑樹脂的酸價為50 KOHmg/g~130 KOHmg/g,重量平均分子量為1,000~50,000。In an embodiment of the present specification, the binder resin has an acid value of 50 KOHmg/g to 130 KOHmg/g and a weight average molecular weight of 1,000 to 50,000.
所述多官能性單體為發揮藉由光而形成光阻像的作用的單體,具體而言可為選自由丙二醇甲基丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇丙烯酸酯、新戊二醇二丙烯酸酯、6-己二醇二丙烯酸酯、1,6-己二醇丙烯酸酯四乙二醇甲基丙烯酸酯、雙苯氧基乙醇二丙烯酸酯、三羥基乙基異氰脲酸酯三甲基丙烯酸酯、三甲基丙烷三甲基丙烯酸酯、二苯基季戊四醇六丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯以及二季戊四醇六甲基丙烯酸酯所組成的群組中的一種或者兩種以上的混合物。The polyfunctional monomer is a monomer that functions to form a photoresist image by light, and specifically may be selected from the group consisting of propylene glycol methacrylate, dipentaerythritol hexaacrylate, dipentaerythritol acrylate, and neopentyl Alcohol diacrylate, 6-hexanediol diacrylate, 1,6-hexanediol acrylate tetraethylene glycol methacrylate, bisphenoxyethanol diacrylate, trihydroxyethyl isocyanurate a group consisting of trimethacrylate, trimethylpropane trimethacrylate, diphenyl pentaerythritol hexaacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, and dipentaerythritol hexamethacrylate One or a mixture of two or more.
所述光起始劑若為藉由光而產生自由基來引起交聯的起始劑,則並無特別限定,例如可為選自由苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物、以及肟系化合物所組成的群組中的一種以上。The photoinitiator is not particularly limited as long as it is a radical generating a radical by light to cause cross-linking, and may be, for example, selected from the group consisting of an acetophenone-based compound, a biimidazole-based compound, and a triazine-based compound. And one or more of the group consisting of lanthanoid compounds.
所述苯乙酮系化合物有:2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥基乙氧基)-苯基-(2-羥基-2-丙基)酮、1-羥基環己基苯基酮、安息香甲醚、安息香乙醚、安息香異丁醚、安息香丁醚、2,2-二甲氧基-2-苯基苯乙酮、2-甲基-(4-甲硫基)苯基-2-嗎啉基-1-丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-(4-溴-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮或者2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮等,並不限定於該些。The acetophenone-based compound is: 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane- 1-ketone, 4-(2-hydroxyethoxy)-phenyl-(2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl phenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobutyl ether Benzoin, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl-(4-methylthio)phenyl-2-morpholinyl-1-propan-1-one , 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one, 2-(4-bromo-benzyl-2-dimethylamino 1-(4-morpholinylphenyl)-butan-1-one or 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one It is not limited to these.
所述聯咪唑系化合物有:2,2-雙(2-氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4',5,5'-四(3,4,5-三甲氧基苯基)-1,2'-聯咪唑、2,2'-雙(2,3-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4,5,5'-四苯基-1,2'-聯咪唑等,並不限定於該些。The biimidazole-based compound is: 2,2-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)- 4,4',5,5'-tetrakis(3,4,5-trimethoxyphenyl)-1,2'-biimidazole, 2,2'-bis(2,3-dichlorophenyl)- 4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4,4,5,5'-tetraphenyl-1,2'-biimidazole, etc. It is not limited to these.
所述三嗪系化合物有:3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸1,1,1,3,3,3-六氟異丙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸2-環氧基乙酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸環己酯、2-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}乙酸苄酯、3-{氯-4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙酸、3-{4-[2,4-雙(三氯甲基)-均三嗪-6-基]苯硫基}丙醯胺、2,4-雙(三氯甲基)-6-對甲氧基苯乙烯基-均三嗪、2,4-雙(三氯甲基)-6-(1-對二甲基胺基苯基)-1,3,-丁二烯基-均三嗪、2-三氯甲基-4-胺基-6-對甲氧基苯乙烯基-均三嗪等,並不限定於該些。The triazine-based compound is: 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 3-{4-[2,4 - bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid 1,1,1,3,3,3-hexafluoroisopropyl, 2-{4-[2,4 - bis(trichloromethyl)-s-triazin-6-yl]phenylthio}acetate, 2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl 2-Phenylthio}acetic acid 2-epoxyethyl ester, 2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}acetic acid cyclohexyl ester, 2 -{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}benzyl acetate, 3-{chloro-4-[2,4-bis(trichloromethyl) -)-triazine-6-yl]phenylthio}propionic acid, 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propanoid Amine, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazine, 2,4-bis(trichloromethyl)-6-(1-p-dimethylamine Phenyl)-1,3,-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, etc., not limited thereto These.
所述肟系化合物有:1,2-辛二酮,-1-(4-苯硫基)苯基,-2-(鄰苯甲醯基肟)(汽巴-嘉基(Ciba-Geigy)公司,CGI124)、乙酮,-1-(9-乙基)-6-(2-甲基苯甲醯基-3-基)-,1-(O-乙醯基肟)(CGI242)、N-1919(艾迪科(ADEKA)公司)等,並不限定於該些。The lanthanide compounds are: 1,2-octanedione,-1-(4-phenylthio)phenyl,-2-(o-benzylidene fluorene) (Ciba-Geigy) Company, CGI124), ethyl ketone, 1-(9-ethyl)-6-(2-methylbenzimid-3-yl)-, 1-(O-ethylindenyl) (CGI242), N-1919 (ADEKA), etc., is not limited to these.
所述溶媒可為選自由以下化合物所組成的群組中的一種以上:丙酮、甲基乙基酮、甲基異丁基酮、甲基溶纖劑、乙基溶纖劑、四氫呋喃、1,4-二噁烷、乙二醇二甲醚、乙二醇二乙醚、丙二醇二甲醚、丙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇甲基乙醚、氯仿、二氯甲烷、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2-三氯乙烷、1,1,2-三氯乙烯、己烷、庚烷、辛烷、環己烷、苯、甲苯、二甲苯、甲醇、乙醇、異丙醇、丙醇、丁醇、第三丁醇、2-乙氧基丙醇、2-甲氧基丙醇、3-甲氧基丁醇、環己酮、環戊酮、丙二醇甲醚乙酸酯、丙二醇乙醚乙酸酯、3-甲氧基丁基乙酸酯、3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、甲基溶纖劑乙酸酯、丁基乙酸酯、丙二醇單甲醚以及二丙二醇單甲醚,但並非僅限定於此。The solvent may be one or more selected from the group consisting of acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, 1, 4-Dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ether , chloroform, dichloromethane, 1,2-dichloroethane, 1,1,1-trichloroethane, 1,1,2-trichloroethane, 1,1,2-trichloroethylene, hexane , heptane, octane, cyclohexane, benzene, toluene, xylene, methanol, ethanol, isopropanol, propanol, butanol, tert-butanol, 2-ethoxypropanol, 2-methoxy Propanol, 3-methoxybutanol, cyclohexanone, cyclopentanone, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, 3-methoxybutyl acetate, 3-ethoxypropionic acid Ethyl ester, ethyl cellosolve acetate, methyl cellosolve acetate, butyl acetate, propylene glycol monomethyl ether, and dipropylene glycol monomethyl ether are not limited thereto.
本說明書的一實施態樣中,以所述樹脂組成物中的固體成分的總重量為基準,所述化學式1的化合物的含量為5重量%~60重量%,所述黏合劑樹脂的含量為1重量%~60重量%,所述起始劑的含量為0.1重量%~20重量%,所述多官能性單體的含量為0.1重量%~50重量%。In one embodiment of the present specification, the content of the compound of the chemical formula 1 is 5% by weight to 60% by weight based on the total weight of the solid content in the resin composition, and the content of the binder resin is 1% by weight to 60% by weight, the content of the initiator is 0.1% by weight to 20% by weight, and the content of the polyfunctional monomer is 0.1% by weight to 50% by weight.
所謂所述固體成分的總重量是指樹脂組成物中除溶媒之外的成分的重量總和。固體成分以及各成分的以固體成分為基準的重量%的基準可利用液相層析法或者氣相層析法等本領域所使用的一般的分析方法來測定。The total weight of the solid component means the sum of the weights of the components other than the solvent in the resin composition. The basis of the solid content and the weight % based on the solid content of each component can be measured by a general analytical method used in the art, such as liquid chromatography or gas chromatography.
本說明書的一實施態樣中,所述樹脂組成物追加包含選自由光交聯增感劑、硬化促進劑、密合促進劑、界面活性劑、抗氧化劑、熱聚合防止劑、紫外線吸收劑、抗氧化劑、分散劑以及調平劑所組成的群組中的一種或兩種以上的添加劑。In one embodiment of the present specification, the resin composition further comprises a photocrosslinking sensitizer, a curing accelerator, an adhesion promoter, a surfactant, an antioxidant, a thermal polymerization inhibitor, an ultraviolet absorber, One or two or more additives selected from the group consisting of antioxidants, dispersants, and leveling agents.
本說明書的一實施態樣中,以所述樹脂組成物中的固體成分的總重量為基準,所述添加劑的含量為0.1重量%~20重量%。In one embodiment of the present specification, the content of the additive is from 0.1% by weight to 20% by weight based on the total weight of the solid content in the resin composition.
所述光交聯增感劑可使用選自由以下化合物所組成的群組中的一種以上:二苯甲酮、4,4-雙(二甲基胺基)二苯甲酮、4,4-雙(二乙基胺基)二苯甲酮、2,4,6-三甲基胺基二苯甲酮、甲基-鄰苯甲醯基苯甲酸酯、3,3-二甲基-4-甲氧基二苯甲酮、3,3,4,4-四(第三丁基過氧化羰基)二苯甲酮等二苯甲酮系化合物;9-茀酮、2-氯-9-茀酮、2-甲基-9-茀酮等茀酮系化合物;硫雜蒽酮、2,4-二乙基硫雜蒽酮、2-氯硫雜蒽酮、1-氯-4-丙基氧基硫雜蒽酮、異丙基硫雜蒽酮、二異丙基硫雜蒽酮等硫雜蒽酮系化合物;氧雜蒽酮、2-甲基氧雜蒽酮等氧雜蒽酮系化合物;蒽醌、2-甲基蒽醌、2-乙基蒽醌、第三丁基蒽醌、2,6-二氯-9,10-蒽醌等蒽醌系化合物;9-苯基吖啶、1,7-雙(9-吖啶基)庚烷、1,5-雙(9-吖啶基戊烷)、1,3-雙(9-吖啶基)丙烷等吖啶系化合物;苄基、1,7,7-三甲基-雙環[2,2,1]庚烷-2,3-二酮、9,10-菲醌等二羰基化合物;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基氧化膦等氧化膦系化合物;甲基-4-(二甲基胺基)苯甲酸酯、乙基-4-(二甲基胺基)苯甲酸酯、2-正丁氧基乙基-4-(二甲基胺基)苯甲酸酯等苯甲酸酯系化合物;2,5-雙(4-二乙基胺基亞苄基)環戊酮、2,6-雙(4-二乙基胺基亞苄基)環己酮、2,6-雙(4-二乙基胺基亞苄基)-4-甲基-環戊酮等胺基增效劑;3,3-羰基乙烯基-7-(二乙基胺基)香豆素、3-(2-苯并噻唑基)-7-(二乙基胺基)香豆素、3-苯甲醯基-7-(二乙基胺基)香豆素、3-苯甲醯基-7-甲氧基-香豆素、10,10-羰基雙[1,1,7,7-四甲基-2,3,6,7-四氫-1H,5H,11H-C1]-苯并吡喃并[6,7,8-ij]-喹嗪-11-酮等香豆素系化合物;4-二乙基胺基查耳酮、4-疊氮基亞苄基苯乙酮等查耳酮化合物;2-苯甲醯基亞甲基、3-甲基-b-萘并噻唑啉。The photocrosslinking sensitizer may be one or more selected from the group consisting of benzophenone, 4,4-bis(dimethylamino)benzophenone, 4,4- Bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3-dimethyl- a benzophenone compound such as 4-methoxybenzophenone or 3,3,4,4-tetrakis(t-butylperoxycarbonyl)benzophenone; 9-fluorenone, 2-chloro-9 Anthrone-based compounds such as anthrone and 2-methyl-9-fluorenone; thioxanthone, 2,4-diethylthiazinone, 2-chlorothiazepinone, 1-chloro-4- a thioxanthone compound such as propyloxy thioxanthone, isopropyl thioxanthone or diisopropyl thioxanthone; oxazepine such as xanthone or 2-methyloxaxanone; Ketone compounds; anthraquinone compounds such as hydrazine, 2-methyl hydrazine, 2-ethyl hydrazine, tert-butyl hydrazine, 2,6-dichloro-9,10-fluorene; 9-benzene Acridine such as pyridinium, 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinylpentane), 1,3-bis(9-acridinyl)propane a compound; benzyl, 1,7,7-trimethyl-bicyclo[2,2,1]heptane-2,3-dione, 9,10-phenanthrenequinone Dicarbonyl compound; 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, bis(2,6-dimethoxybenzylidene)-2,4,4-trimethylpentyl a phosphine oxide compound such as phosphine oxide; methyl-4-(dimethylamino)benzoate, ethyl-4-(dimethylamino)benzoate, 2-n-butoxyethyl a benzoate compound such as -4-(dimethylamino)benzoate; 2,5-bis(4-diethylaminobenzylidene)cyclopentanone, 2,6-bis (4) -Amino-aminobenzylidene)cyclohexanone, 2,6-bis(4-diethylaminobenzylidene)-4-methyl-cyclopentanone and other amine synergists; 3,3 -carbonylvinyl-7-(diethylamino)coumarin, 3-(2-benzothiazolyl)-7-(diethylamino)coumarin, 3-benzylidene-7 -(diethylamino)coumarin, 3-benzylidene-7-methoxy-coumarin, 10,10-carbonyl bis[1,1,7,7-tetramethyl-2, Coumarin compound such as 3,6,7-tetrahydro-1H,5H,11H-C1]-benzopyrano[6,7,8-ij]-quinolizin-11-one; 4-2-B A chalcone compound such as a sulfhydryl ketone or a 4-azidobenzylidene acetophenone; 2-benzimidylmethylene, 3-methyl-b-naphthylthiazoline.
所述硬化促進劑是為了提高硬化以及機械強度而使用,具體而言可使用選自由以下化合物所組成的群組中的一種以上:2-巰基苯并咪唑、2-巰基苯并噻唑、2-巰基苯并噁唑、2,5-二巰基-1,3,4-噻二唑、2-巰基-4,6-二甲基胺基吡啶、季戊四醇-四(3-巰基丙酸酯)、季戊四醇-三(3-巰基丙酸酯)、季戊四醇-四(2-巰基乙酸酯)、季戊四醇-三(2-巰基乙酸酯)、三羥甲基丙烷-三(2-巰基乙酸酯)、以及三羥甲基丙烷-三(3-巰基丙酸酯)。The hardening accelerator is used for improving hardening and mechanical strength, and specifically, one or more selected from the group consisting of 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2- Mercaptobenzoxazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis(3-mercaptopropionate), Pentaerythritol-tris(3-mercaptopropionate), pentaerythritol-tetrakis(2-mercaptoacetate), pentaerythritol-tris(2-mercaptoacetate), trimethylolpropane-tris(2-mercaptoacetate) And trimethylolpropane-tris(3-mercaptopropionate).
本說明書中使用的密合促進劑可選擇甲基丙烯醯氧基丙基三甲氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷、甲基丙烯醯氧基丙基三乙氧基矽烷、甲基丙烯醯氧基丙基二甲氧基矽烷等甲基丙烯醯基矽烷偶合劑中的一種以上來使用,烷基三甲氧基矽烷可自辛基三甲氧基矽烷、十二烷基三甲氧基矽烷、十八烷基三甲氧基矽烷等中選擇一種以上來使用。The adhesion promoter used in the present specification may be selected from methacryloxypropyltrimethoxydecane, methacryloxypropyldimethoxydecane, methacryloxypropyltriethoxylate. One or more of a methacryl decyl decane coupling agent such as decane or methacryloxypropyldimethoxydecane, which may be derived from octyltrimethoxydecane or dodecyl group. One or more of trimethoxydecane, octadecyltrimethoxydecane, and the like are used.
所述界面活性劑為矽酮系界面活性劑或者氟系界面活性劑,具體而言,矽酮系界面活性劑可使用:畢克化學(BYK-Chemie)公司的BYK-077、BYK-085、BYK-300、BYK-301、BYK-302、BYK-306、BYK-307、BYK-310、BYK-320、BYK-322、BYK-323、BYK-325、BYK-330、BYK-331、BYK-333、BYK-335、BYK-341v344、BYK-345v346、BYK-348、BYK-354、BYK-355、BYK-356、BYK-358、BYK-361、BYK-370、BYK-371、BYK-375、BYK-380、BYK-390等,氟系界面活性劑可使用:DIC(大日本油墨化學(DaiNippon Ink & Chemicals))公司的F-114、F-177、F-410、F-411、F-450、F-493、F-494、F-443、F-444、F-445、F-446、F-470、F-471、F-472SF、F-474、F-475、F-477、F-478、F-479、F-480SF、F-482、F-483、F-484、F-486、F-487、F-172D、MCF-350SF、TF-1025SF、TF-1117SF、TF-1026SF、TF-1128、TF-1127、TF-1129、TF-1126、TF-1130、TF-1116SF、TF-1131、TF1132、TF1027SF、TF-1441、TF-1442等,但並非僅限定於該些。The surfactant is an anthrone-based surfactant or a fluorine-based surfactant. Specifically, an anthrone-based surfactant can be used: BYK-077, BYK-085 of BYK-Chemie. BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK-310, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK- 333, BYK-335, BYK-341v344, BYK-345v346, BYK-348, BYK-354, BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390, etc., fluorine-based surfactants can be used: DIC (DaiNippon Ink & Chemicals) company's F-114, F-177, F-410, F-411, F- 450, F-493, F-494, F-443, F-444, F-445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483, F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF- 1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF-1130, TF-1116SF, TF-1131, TF1132, TF1027SF, TF-1441, TF-1442, etc., but not limited to these .
所述抗氧化劑可為選自由受阻酚(Hindered phenol)系抗氧化劑、胺系抗氧化劑、硫系抗氧化劑以及膦系抗氧化劑所組成的群組中的一種以上,但並非僅限定於此。The antioxidant may be one or more selected from the group consisting of a hindered phenol-based antioxidant, an amine-based antioxidant, a sulfur-based antioxidant, and a phosphine-based antioxidant, but is not limited thereto.
抗氧化劑的具體例可列舉:磷酸、三甲基磷酸酯或者三乙基磷酸酯之類的磷酸系熱穩定劑;2,6-二-第三丁基-對甲酚、十八烷基-3-(4-羥基-3,5-二-第三丁基苯基)丙酸酯、四雙[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、3,5-二-第三丁基-4-羥基苄基亞磷酸二乙酯、2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-g,t-丁基苯酚4,4'-亞丁基-雙(3-甲基-6-第三丁基苯酚)、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)或者雙[3,3-雙-(4'-羥基-3'-第三丁基苯基)丁酸]二醇酯(Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid]glycol ester)之類的受阻酚(Hindered phenol)系一次抗氧化劑;苯基-α-萘基胺、苯基-β-萘基胺、N,N'-二苯基-對苯二胺或者N,N'-二-β-萘基-對苯二胺之類的胺系二次抗氧化劑;二月桂基二硫化物、二月桂基硫代丙酸酯、二硬脂基硫代丙酸酯、巰基苯并噻唑或者四甲基秋蘭姆二硫化物四雙[亞甲基-3-(月桂基硫基)丙酸酯]甲烷等硫系二次抗氧化劑;或者三苯基亞磷酸酯、三(壬基苯基)亞磷酸酯、三異癸基亞磷酸酯、雙(2,4-二丁基苯基)季戊四醇二亞磷酸酯(Bis(2,4-ditbutylphenyl)Pentaerythritol Diphosphite)或者(1,1'-聯苯基)-4,4'-二基雙膦酸四[2,4-雙(1,1-二甲基乙基)苯基]酯((1,1'-Biphenyl)-4,4'-Diylbis phosphonic acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl] ester)之類的亞磷酸酯系二次抗氧化劑。Specific examples of the antioxidant include a phosphate-based heat stabilizer such as phosphoric acid, trimethyl phosphate or triethyl phosphate; 2,6-di-t-butyl-p-cresol, octadecyl- 3-(4-hydroxy-3,5-di-t-butylphenyl)propionate, tetra-bis[methylene-3-(3,5-di-t-butyl-4-hydroxyphenyl) Propionate]methane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, 3,5-di- Diethyl tert-butyl-4-hydroxybenzyl phosphite, 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-g, t-butylphenol 4 , 4'-butylidene-bis(3-methyl-6-tert-butylphenol), 4,4'-thiobis(3-methyl-6-tert-butylphenol) or double [3, 3-bis-(4'-hydroxy-3'-t-butylphenyl)butanoic acid]diol (Bis[3,3-bis-(4'-hydroxy-3'-tert-butylphenyl)butanoicacid] Hindered phenol such as glycol ester is a primary antioxidant; phenyl-α-naphthylamine, phenyl-β-naphthylamine, N,N'-diphenyl-p-phenylenediamine or N , an amine-based secondary antioxidant such as N'-di-β-naphthyl-p-phenylenediamine; dilauryl disulfide, dilauryl thiopropionate, distearyl a sulfur-based secondary antioxidant such as thiopropionate, mercaptobenzothiazole or tetramethylthiuram disulfide tetrakis[methylene-3-(laurylthio)propionate]methane; or Phenyl phosphite, tris(nonylphenyl) phosphite, triisodecyl phosphite, bis(2,4-dibutylphenyl)pentaerythritol diphosphite (Bis(2,4-ditbutylphenyl) ) Pentaerythritol Diphosphite) or (1,1 '-biphenyl)-4,4'-diylbisphosphonic acid tetrakis[2,4-bis(1,1-dimethylethyl)phenyl] ester (( A phosphite secondary antioxidant such as 1,1'-Biphenyl)-4,4'-Diylbis phosphonic acid tetrakis [2,4-bis(1,1-dimethylethyl)phenyl] ester).
所述紫外線吸收劑可使用:2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯-苯并三唑、烷氧基二苯甲酮等,但並不限定於該些,本領域中通常使用者均能夠使用。The ultraviolet absorber may be used: 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chloro-benzotriazole, alkoxybenzophenone, etc., but It is not limited to these, and is generally available to users in the art.
作為所述熱聚合防止劑,例如可包含選自由以下化合物所組成的群組中的一種以上:對苯甲醚、對苯二酚、鄰苯二酚(pyrocatechol)、第三丁基兒茶酚(tert-butyl catechol)、N-亞硝基苯基羥基胺銨鹽、N-亞硝基苯基羥基胺鋁鹽、對甲氧基苯酚、二-第三丁基-對甲酚、鄰苯三酚、苯醌、4,4-硫代雙(3-甲基-6-第三丁基苯酚)、2,2-亞甲基雙(4-甲基-6-第三丁基苯酚)、2-巰基咪唑以及啡噻嗪(phenothiazine),但並非僅限定於該些,可包含該技術領域中通常已知者。The thermal polymerization preventing agent may, for example, comprise one or more selected from the group consisting of p-anisole, hydroquinone, pyrocatechol, and tert-butylcatechol. (tert-butyl catechol), N-nitrosophenylhydroxylamine ammonium salt, N-nitrosophenylhydroxylamine aluminum salt, p-methoxyphenol, di-tert-butyl-p-cresol, ortho-benzene Trisphenol, benzoquinone, 4,4-thiobis(3-methyl-6-tert-butylphenol), 2,2-methylenebis(4-methyl-6-tert-butylphenol) 2-mercaptoimidazole and phenothiazine, but are not limited thereto only, and may be generally included in the art.
所述分散劑可於以下方法中使用:於預先對顏料進行表面處理的形態下內部添加於顏料中的方法、或者外部添加於顏料中的方法。所述分散劑可使用化合物型、非離子性、陰離子性或者陽離子性分散劑,可列舉氟系、酯系、陽離子系、陰離子系、非離子系、兩性界面活性劑等。The dispersing agent can be used in the following method: a method of internally adding to a pigment in a form in which a pigment is surface-treated in advance, or a method of externally adding to a pigment. As the dispersant, a compound type, a nonionic, an anionic or a cationic dispersant can be used, and examples thereof include a fluorine-based, ester-based, cationic-based, anionic-based, nonionic-based, and amphoteric surfactant.
該些能夠分別使用或者將兩種以上組合使用。These can be used separately or in combination of two or more.
具體而言,所述分散劑有選自由聚烷二醇及其酯、聚氧伸烷基多元醇、酯環氧烷加成物、醇環氧烷加成物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺環氧烷加成物以及烷基胺所組成的群組中的一種以上,但並不限定於此。Specifically, the dispersing agent is selected from the group consisting of polyalkylene glycols and esters thereof, polyoxyalkylene alkyl polyols, ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonates, sulfonates And one or more of the group consisting of a carboxylate, a carboxylate, a alkylguanamine alkylene oxide adduct, and an alkylamine, but is not limited thereto.
所述調平劑可為聚合物性或者非聚合物性。聚合物性的調平劑的具體例可列舉聚乙烯亞胺、聚醯胺胺、胺與環氧化物的反應產物為例,非聚合物性的調平劑的具體例包含非-聚合物含硫化合物以及非-聚合物含氮化合物,但並不限定於此,本技術領域中通常使用者均能夠使用。The leveling agent can be polymeric or non-polymeric. Specific examples of the polymer leveling agent include polyethyleneimine, polyamidamine, an amine and an epoxide reaction product, and specific examples of the non-polymeric leveling agent include a non-polymer sulfur-containing compound. And a non-polymer nitrogen-containing compound, but it is not limited thereto, and can be generally used by a user in the art.
本說明書的一實施態樣中,提供一種由所述樹脂組成物所製造的感光材料。In an embodiment of the present specification, a photosensitive material produced from the resin composition is provided.
更詳細而言,藉由適當的方法將本說明書的樹脂組成物塗佈於基材上來形成薄膜或圖案形態的感光材料。More specifically, the resin composition of the present specification is applied onto a substrate by an appropriate method to form a photosensitive material in a film or pattern form.
所述塗佈方法並無特別限制,可使用噴射法、輥塗法、旋塗法等,通常廣泛使用旋塗法。另外,於形成塗佈膜後,視情況,可於減壓下去除一部分的殘留溶媒。The coating method is not particularly limited, and a spray method, a roll coating method, a spin coating method, or the like can be used, and a spin coating method is usually widely used. Further, after the coating film is formed, a part of the residual solvent can be removed under reduced pressure as the case may be.
用以使本說明書的樹脂組成物硬化的光源例如有:使波長為250 nm~450 nm的光發散的水銀蒸氣弧(arc)、碳弧、Xe弧等,但未必限定於該些。The light source for curing the resin composition of the present specification includes, for example, a mercury vapor arc (arc), a carbon arc, a Xe arc, or the like which disperses light having a wavelength of from 250 nm to 450 nm, but is not necessarily limited thereto.
本說明書的樹脂組成物可用於:薄膜電晶體液晶顯示裝置(TFT LCD)彩色濾光片製造用顏料分散型感光材、薄膜電晶體液晶顯示裝置(TFT LCD)或者有機發光二極體的黑色矩陣形成用感光材、外塗層形成用感光材、柱狀間隔物感光材、光硬化型塗料、光硬化性墨水、光硬化性黏接劑、印刷版、印刷配線板用感光材、電漿顯示器面板(Plasma Display Panel,PDP)用感光材等中,對其用途並不特別設限。The resin composition of the present specification can be used for: a thin film transistor liquid crystal display device (TFT LCD), a pigment dispersion type photosensitive material for color filter manufacturing, a thin film transistor liquid crystal display device (TFT LCD), or a black matrix of an organic light emitting diode. Photographic material for forming, overcoat layer forming photosensitive material, columnar spacer photosensitive material, photocurable coating material, photocurable ink, photocurable adhesive, printing plate, photosensitive member for printed wiring board, and plasma display In the photosensitive material for a panel (Plasma Display Panel, PDP), the use thereof is not particularly limited.
本說明書的一實施態樣中,提供一種包含所述感光材料的彩色濾光片。In an embodiment of the present specification, a color filter including the photosensitive material is provided.
所述彩色濾光片可使用包含所述化學式1的化合物的樹脂組成物來製造。藉由將所述樹脂組成物塗佈於基板上,形成塗佈膜,對所述塗佈膜進行曝光、顯影及硬化,可形成彩色濾光片。The color filter can be produced using a resin composition containing the compound of the chemical formula 1. A coating film is formed by applying the resin composition onto a substrate, and the coating film is exposed, developed, and cured to form a color filter.
本說明書的一實施態樣的樹脂組成物的耐熱性優異,由熱處理引起的色彩變化少,即便藉由彩色濾光片製造時的硬化過程,色彩再現率亦高,可提供亮度及明暗比高的彩色濾光片。The resin composition of one embodiment of the present specification is excellent in heat resistance, and has little color change due to heat treatment, and the color reproduction rate is high even when the color filter is used for the hardening process, and the brightness and the light-dark ratio are high. Color filter.
所述基板可為玻璃板、矽晶圓以及聚醚碸(Polyethersulfone,PES)、聚碳酸酯(Polycarbonate,PC)等塑膠基材的板等,其種類並無特別限制。The substrate may be a glass plate, a tantalum wafer, a plate of a plastic substrate such as polyethersulfone (PES) or polycarbonate (PC), and the like, and the kind thereof is not particularly limited.
所述彩色濾光片可包含紅色圖案、綠色圖案、藍色圖案、黑色矩陣。The color filter may include a red pattern, a green pattern, a blue pattern, and a black matrix.
另一實施態樣中,所述彩色濾光片可更包含外塗層。In another embodiment, the color filter may further comprise an overcoat layer.
於彩色濾光片的彩色畫素之間,出於提高對比度的目的,可配置稱為黑色矩陣的格子狀的黑色圖案。黑色矩陣的材料可使用鉻。該情況下可利用如下方式:使鉻蒸鍍於玻璃基板整體上,藉由蝕刻處理來形成圖案。但是,考慮到步驟上的高費用、鉻的高反射率、由鉻廢液引起的環境污染,可使用利用能夠進行微細加工的顏料分散法的樹脂黑色矩陣。Between the color pixels of the color filter, a lattice-like black pattern called a black matrix can be arranged for the purpose of improving contrast. The material of the black matrix can use chromium. In this case, the chromium can be vapor-deposited on the entire glass substrate, and a pattern can be formed by an etching process. However, in consideration of the high cost in the step, the high reflectance of chromium, and the environmental pollution caused by the chromium waste liquid, a resin black matrix using a pigment dispersion method capable of microfabrication can be used.
本說明書的一實施態樣的黑色矩陣可使用黑色顏料或者黑色染料來作為著色劑。例如可單獨使用碳黑,或者將碳黑與著色顏料混合使用,此時,由於混合遮光性不足的著色顏料,故而具有如下優點:即便相對而言著色劑的量增加,膜的強度或者對基板的密合性亦不會下降。A black matrix of an embodiment of the present specification may use a black pigment or a black dye as a colorant. For example, carbon black may be used alone or in combination with a color pigment. In this case, since the coloring pigment having insufficient light shielding property is mixed, there is an advantage that the strength of the film or the substrate is increased even if the amount of the colorant is relatively increased. The adhesion will not decrease.
提供包含本說明書的彩色濾光片的顯示器裝置。A display device including a color filter of the present specification is provided.
所述顯示器裝置可為電漿顯示器面板(Plasma Display Panel,PDP)、發光二極體(Light Emitting Diode,LED)、有機發光元件(Organic Light Emitting Diode,OLED)、液晶顯示裝置(Liquid Crystal Display,LCD)、薄膜電晶體液晶顯示裝置(Thin Film Transistor-Liquid Crystal Display,LCD-TFT)以及陰極射線管(Cathode Ray Tube,CRT)中的任一者。The display device may be a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), or a liquid crystal display device (Liquid Crystal Display, Any of LCD, Thin Film Transistor-Liquid Crystal Display (LCD-TFT), and Cathode Ray Tube (CRT).
以下,列舉實施例來對本說明書進行詳細說明。下述實施例是用以對本說明書進行說明者,本說明書的範圍包括下述申請專利範圍中記載的範圍以及其置換及變更,並不限定於實施例的範圍。Hereinafter, the present specification will be described in detail by way of examples. The following examples are intended to be illustrative of the present invention, and the scope of the present invention is intended to cover the scope of the invention and the scope of the invention.
合成例1 反應式1 Synthesis Example 1 Reaction Formula 1
於30 ml的HNO3 中加入10 g(50.459 mmol)的2,3-萘二羧酸酐(A-1),將反應溶液緩緩升溫,並於95℃下攪拌2小時。使反應溶液冷卻至常溫,於水中沈澱。於減壓下對析出物進行過濾,利用80℃的對流烘箱乾燥1天,獲得所述A-2。將所述A-2加入至50 ml的乙酸酐中,升溫至150℃並攪拌2小時。使反應物冷卻至常溫,於減壓下進行過濾,並利用少量的水進行水洗,從而獲得8.3 g(34.132 mmol)的所述A-3,產率為67.64%。10 g (50.459 mmol) of 2,3-naphthalenedicarboxylic anhydride (A-1) was added to 30 ml of HNO 3 , and the reaction solution was gradually warmed up and stirred at 95 ° C for 2 hours. The reaction solution was cooled to room temperature and precipitated in water. The precipitate was filtered under reduced pressure, and dried in a convection oven at 80 ° C for 1 day to obtain the A-2. The A-2 was added to 50 ml of acetic anhydride, and the temperature was raised to 150 ° C and stirred for 2 hours. The reactant was cooled to room temperature, filtered under reduced pressure, and washed with water with a small amount of water to obtain 8.3 g (34.132 mmol) of the A-3 in a yield of 67.64%.
合成例2 反應式2 Synthesis Example 2 Reaction Formula 2
於3 g的苯甲酸與3 g的苯甲酸甲酯中加入3 g(18.963 mmol)的8-胺基喹呐啶(A-4)與2.809 g(18.963 mmol)的鄰苯二甲酸酐(A-5),緩緩升溫並於180℃下攪拌5小時。使反應物冷卻至常溫,於100 ml的MeOH中沈澱。於減壓下對析出物進行過濾,利用MeOH進行水洗。利用80℃的對流烘箱乾燥1天,從而獲得4.67 g(16.198 mmol)的所述A-6,產率為85.4%。3 g (18.963 mmol) of 8-aminoquinoxadine (A-4) and 2.809 g (18.963 mmol) of phthalic anhydride (A) were added to 3 g of benzoic acid and 3 g of methyl benzoate. -5), slowly warmed up and stirred at 180 ° C for 5 hours. The reaction was cooled to ambient temperature and taken up in 100 mL MeOH. The precipitate was filtered under reduced pressure and washed with MeOH. It was dried by a convection oven at 80 ° C for 1 day to obtain 4.67 g (16.198 mmol) of the A-6 in a yield of 85.4%.
合成例3 反應式3 Synthesis Example 3 Reaction Formula 3
於3 g的苯甲酸、3 g的苯甲酸甲酯中加入1.687 g(6.937 mmol)的所述A-3與2 g(6.937 mmol)的所述A-6,緩緩升溫並於200℃下攪拌3小時。使反應物冷卻至常溫,於100 ml的MeOH中沈澱。於減壓下對析出物進行過濾,利用MeOH進行水洗。利用80℃的對流烘箱乾燥1天,從而獲得12.422 g(4.717 mmol)的所述反應式3的產物,產率為68.0%。1.687 g (6.937 mmol) of the A-3 and 2 g (6.937 mmol) of the A-6 were added to 3 g of benzoic acid and 3 g of methyl benzoate, and the temperature was gradually raised at 200 ° C. Stir for 3 hours. The reaction was cooled to ambient temperature and taken up in 100 mL MeOH. The precipitate was filtered under reduced pressure and washed with MeOH. It was dried by a convection oven at 80 ° C for 1 day to obtain 12.422 g (4.717 mmol) of the product of the reaction formula 3 in a yield of 68.0%.
合成例4 反應式4 Synthesis Example 4 Reaction Formula 4
設為與反應式2及反應式3的條件相同的條件來合成所述反應式4的產物。The product of the above Reaction Formula 4 was synthesized under the same conditions as those of Reaction Formula 2 and Reaction Formula 3.
合成例5 反應式5 Synthesis Example 5 Reaction Formula 5
設為與反應式2及反應式3的條件相同的條件來合成所述反應式5的產物。The product of the reaction formula 5 was synthesized under the same conditions as those of the reaction formula 2 and the reaction formula 3.
合成例6 反應式6 Synthesis Example 6 Reaction Formula 6
設為與反應式2及反應式3的條件相同的條件來合成所述反應式6的產物。The product of the reaction formula 6 was synthesized under the same conditions as those of the reaction formula 2 and the reaction formula 3.
合成例7 反應式7 Synthesis Example 7 Reaction Formula 7
設為與反應式2及反應式3的條件相同的條件來合成所述反應式7的產物。The product of the reaction formula 7 was synthesized under the same conditions as those of the reaction formula 2 and the reaction formula 3.
合成例8 反應式8 Synthesis Example 8 Reaction Formula 8
設為與反應式2及反應式3的條件相同的條件來合成所述反應式8的產物。The product of the reaction formula 8 was synthesized under the same conditions as those of the reaction formula 2 and the reaction formula 3.
本申請案的化學式3中,R10'~R15'中的任一者為硝基的具體例是藉由與所述合成例3~合成例8的產物相同的順序及方法進行合成。In the chemical formula 3 of the present application, a specific example of the nitro group in any one of R10' to R15' is synthesized by the same procedures and methods as those of the synthesis examples 3 to 8.
合成例9 反應式9 Synthesis Example 9 Reaction Formula 9
於5 g的苯甲酸與10 g的苯甲酸甲酯中加入5 g(20.562 mmol)的所述A-3與3.253 g(20.562 mmol)的8-胺基喹呐啶(A-4),緩緩升溫並於180℃下攪拌5小時。使反應物冷卻至常溫,於150 ml的MeOH中沈澱。於減壓下對析出物進行過濾,利用MeOH進行水洗。利用80℃的對流烘箱乾燥1天,從而獲得7.094 g(18.505 mmol)的所述A-17,產率為90.0%。5 g (20.562 mmol) of the A-3 and 3.253 g (20.562 mmol) of 8-aminoquinoxadine (A-4) were added to 5 g of benzoic acid and 10 g of methyl benzoate. The temperature was gradually raised and stirred at 180 ° C for 5 hours. The reaction was cooled to ambient temperature and taken up in 150 mL MeOH. The precipitate was filtered under reduced pressure and washed with MeOH. It was dried by a convection oven at 80 ° C for 1 day to obtain 7.094 g (18.505 mmol) of the A-17 in a yield of 90.0%.
合成例10 反應式10 Synthesis Example 10 Reaction Formula 10
於5 g的苯甲酸與10 g的苯甲酸甲酯中加入5 g(13.043 mmol)的所述A-17、1.932 g(13.043 mmol)的鄰苯二甲酸酐(A-5),緩緩升溫並於200℃下攪拌3小時。使反應物冷卻至常溫,於150 ml的MeOH中沈澱。於減壓下對析出物進行過濾,利用MeOH進行水洗。利用80℃的對流烘箱乾燥1天,從而獲得5.022 g(9.781 mmol)的所述反應式10的產物,產率為74.97%。5 g (13.043 mmol) of the A-17, 1.932 g (13.043 mmol) of phthalic anhydride (A-5) were added to 5 g of benzoic acid and 10 g of methyl benzoate, and the temperature was gradually raised. It was stirred at 200 ° C for 3 hours. The reaction was cooled to ambient temperature and taken up in 150 mL MeOH. The precipitate was filtered under reduced pressure and washed with MeOH. It was dried by a convection oven at 80 ° C for 1 day to obtain 5.022 g (9.781 mmol) of the product of the reaction formula 10 in a yield of 74.97%.
合成例11 反應式11 Synthesis Example 11 Reaction Formula 11
設為與反應式9及反應式10的條件相同的條件來合成所述反應式11的產物。The product of the above Reaction Formula 11 was synthesized under the same conditions as those of Reaction Formula 9 and Reaction Formula 10.
合成例12 反應式12 Synthesis Example 12 Reaction Formula 12
設為與反應式9及反應式10的條件相同的條件來合成所述反應式12的產物。The product of the above Reaction Formula 12 was synthesized under the same conditions as those of Reaction Formula 9 and Reaction Formula 10.
合成例13 反應式13 Synthesis Example 13 Reaction Formula 13
設為與反應式9及反應式10的條件相同的條件來合成所述反應式13的產物。The product of the reaction formula 13 was synthesized under the same conditions as those of the reaction formula 9 and the reaction formula 10.
本申請案的化學式2中,R6'~R9'、R14及R15中的任一者為硝基的具體例是藉由與所述合成例10~合成例13的產物相同的順序及方法進行合成。In the chemical formula 2 of the present application, a specific example in which any one of R6' to R9', R14 and R15 is a nitro group is synthesized by the same procedures and methods as those of the synthesis examples 10 to 13 .
實施例1 將所述合成例3的產物5.554 g、作為黏合劑樹脂的甲基丙烯酸苄酯與甲基丙烯酸的共聚物(莫耳比70:30、酸價為113 KOHmg/g、藉由GPC測定的重量平均分子量20,000、分子量分布(PDI)2.0 g、固體成分(S.C)25%、包含溶媒PGMEA)10.376 g、作為光起始劑的I-369(巴斯夫(BASF)公司)2.018 g、作為光聚合性化合物的DPHA(日本化藥)12.443 g、溶劑丙二醇單甲醚乙酸酯(Propylene Glycol Monomethyl Ether Acetate,PGMEA)68.593 g以及作為添加劑的1.016 g的DIC公司的F-475混合,製造化合物。Example 1 5.554 g of the product of Synthesis Example 3, a copolymer of benzyl methacrylate and methacrylic acid as a binder resin (mol ratio 70:30, acid value 113 KOH mg/g, by GPC) The weight average molecular weight measured was 20,000, the molecular weight distribution (PDI) was 2.0 g, the solid content (SC) was 25%, and the solvent PGMEA was contained in 10.376 g, and I-369 (BASF) 2.018 g as a photoinitiator was used. Photopolymerizable compound DPHA (Nippon Chemical Co., Ltd.) 12.443 g, Solylene Glycol Monomethyl Ether Acetate (PGMEA) 68.593 g, and 1.016 g of DIC Corporation's F-475 as an additive were mixed to prepare a compound. .
實施例2 使用合成例4的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 2 A compound was produced in the same manner except that the product of Synthesis Example 4, 5.554 g, was used instead of the product of Synthesis Example 3 of Example 1.
實施例3 使用合成例5的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 3 A compound was produced in the same manner except that the product of Synthesis Example 5 was used instead of the product of Synthesis Example 3 of Example 1.
實施例4 使用合成例6的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 4 A compound was produced in the same manner except that the product of Synthesis Example 6 was used instead of the product of Synthesis Example 3 of Example 1.
實施例5 使用合成例7的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 5 A compound was produced in the same manner except that the product of Synthesis Example 7 was used instead of the product of Synthesis Example 3 of Example 1.
實施例6 使用合成例8的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 6 A compound was produced in the same manner except that the product of Synthesis Example 8 was used instead of the product of Synthesis Example 3 of Example 1.
實施例7 使用合成例10的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 7 A compound was produced in the same manner except that the product of Synthesis Example 10, 5.554 g, was used instead of the product of Synthesis Example 3 of Example 1.
實施例8 使用合成例11的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 8 A compound was produced in the same manner except that the product of Synthesis Example 11 was used instead of the product of Synthesis Example 3 of Example 1.
實施例9 使用合成例12的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 9 A compound was produced in the same manner except that the product of Synthesis Example 12 was used instead of the product of Synthesis Example 3 of Example 1.
實施例10 使用合成例13的產物5.554 g來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Example 10 A compound was produced in the same manner except that the product of Synthesis Example 13 was used instead of the product of Synthesis Example 3 of Example 1.
比較例1 使用下述化學式5所表示的化合物來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Comparative Example 1 A compound was produced in the same manner except that the compound represented by the following Chemical Formula 5 was used instead of the product of Synthesis Example 3 of Example 1.
化學式5 Chemical formula 5
比較例2 使用下述化學式6所表示的化合物來代替所述實施例1的合成例3的產物,除此以外,以同樣的方式製造化合物。Comparative Example 2 A compound was produced in the same manner except that the compound represented by the following Chemical Formula 6 was used instead of the product of Synthesis Example 3 of Example 1.
化學式6 Chemical formula 6
基板製作 將藉由所述實施例1、實施例2及比較例1所製造的化合物旋塗(spin coating)於玻璃(5 cm×5 cm)上,於100℃下實施100秒鐘前熱處理(prebake)來形成膜。將形成有膜的基板與光罩(photo mask)之間的間隔設為250 μm,使用曝光機以40 mJ/cm2 的曝光量來對基板的整面進行照射。 以後,將經曝光的基板於顯影液(KOH、0.05%)中顯影60秒鐘,於230℃下進行20分鐘後熱處理(post bake)來製作基板。Preparation of the substrate The compound produced in the above Example 1, Example 2, and Comparative Example 1 was spin-coated on glass (5 cm × 5 cm), and heat treatment was performed at 100 ° C for 100 seconds. Prebake) to form a film. The interval between the substrate on which the film was formed and the photo mask was set to 250 μm, and the entire surface of the substrate was irradiated with an exposure amount of 40 mJ/cm 2 using an exposure machine. Thereafter, the exposed substrate was developed in a developing solution (KOH, 0.05%) for 60 seconds, and post-baked at 230 ° C for 20 minutes to prepare a substrate.
耐熱性評價 對於以如所述般的條件所製作的前熱處理(prebake)基板,使用分光計(MCPD-大塚公司),獲得380 nm~780 nm的範圍的可見光區域的透過率光譜。另外,對前熱處理(prebake)基板,於230℃下追加實施20分鐘後熱處理(post bake),藉由相同的裝備及測定範圍來獲得透過率光譜。 利用所獲得的透過率光譜與C光源背光,使用所獲得的值E(L*、a*、b*)來計算ΔEab,並示於下述表1中。 ΔE(L*、a*、b*)={(ΔL*)2+(Δa*)2+(Δb*)2}1/2 ΔE值小表示色彩耐熱性優異。 一般而言,當具有ΔEab<3的值時,可謂之耐熱性優異的著色劑。Evaluation of heat resistance A transmittance spectrum of a visible light region in the range of 380 nm to 780 nm was obtained using a spectrometer (MCPD-Otsuka Co., Ltd.) on a prebake substrate prepared under the above-described conditions. Further, a prebake substrate was additionally subjected to post bake at 230 ° C for 20 minutes, and a transmittance spectrum was obtained by the same equipment and measurement range. Using the obtained transmittance spectrum and the C light source backlight, ΔEab was calculated using the obtained values E (L*, a*, b*), and is shown in Table 1 below. ΔE(L*, a*, b*)={(ΔL*)2+(Δa*)2+(Δb*)2} 1/2 A small value of ΔE indicates excellent color heat resistance. In general, when it has a value of ΔEab<3, it is a coloring agent excellent in heat resistance.
對於本申請案的一實施態樣的化合物與比較例1,將耐熱性的測定結果示於下述表1中。另外,如表1所示,本申請案的一實施態樣的化合物與比較例1(現在的商用化製品)類似,顯示出3以下的色彩變化(ΔEab)。The results of measurement of heat resistance of the compound of one embodiment of the present application and Comparative Example 1 are shown in Table 1 below. Further, as shown in Table 1, a compound of an embodiment of the present application is similar to Comparative Example 1 (current commercial product), and exhibits a color change of 3 or less (ΔEab).
[表1]
長波長性評價 準確秤量所述實施例1、實施例4及實施例7與比較例2的化合物試樣0.05 g,加入至200 ml的容量瓶(volumetric flask)中後,裝滿DMF至200 ml的顯示線。將該溶液移液(pipetting)5 ml,加入至100 ml的容量瓶中後,以DMF填滿至100 ml的顯示線。使用該溶液,利用紫外可見分光光度計(UV-Vis Spectrophotometer)來測定紫外-可見(UV-Vis)吸收光譜,將其結果示於下述表2中。Long-wavelength evaluation Accurately weigh 0.05 g of the compound samples of Example 1, Example 4, and Example 7 and Comparative Example 2, and add it to a 200 ml volumetric flask to fill DMF to 200 ml. Display line. The solution was piped 5 ml, added to a 100 ml volumetric flask, and filled to a 100 ml display line with DMF. Using this solution, an ultraviolet-visible (UV-Vis) absorption spectrum was measured using a UV-Vis Spectrophotometer, and the results are shown in Table 2 below.
[表2]
如根據所述表2而明確般,可知與未取代有硝基的比較例2相比,本申請案的一實施態樣的化合物實現長波長化。藉此,本申請案的一實施態樣的化合物可具有藉由吸收光譜的長波長化而著色劑的使用量減少的優點。As is clear from the above Table 2, it is understood that the compound of one embodiment of the present application is longer-wavelength than Comparative Example 2 in which the nitro group is not substituted. Thereby, the compound of one embodiment of the present application can have an advantage that the amount of the coloring agent used is reduced by the long wavelength of the absorption spectrum.
無no
無no
無no
Claims (14)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
??10-2016-0063649 | 2016-05-24 | ||
KR1020160063649A KR102067858B1 (en) | 2016-05-24 | 2016-05-24 | Compound, colorant composition comprising the same and resin composition comprising the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201741298A true TW201741298A (en) | 2017-12-01 |
TWI622586B TWI622586B (en) | 2018-05-01 |
Family
ID=60428270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106116394A TWI622586B (en) | 2016-05-24 | 2017-05-18 | Compound, colorant composition comprising the same and resin composition comprising the same, photosensitive material, color filter, display device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6380867B2 (en) |
KR (1) | KR102067858B1 (en) |
CN (1) | CN107417665B (en) |
TW (1) | TWI622586B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL3829054T3 (en) | 2016-05-31 | 2022-09-19 | Ocean Sun As | Solar power plant |
JP6432076B1 (en) * | 2017-12-22 | 2018-12-05 | 東洋インキScホールディングス株式会社 | Coloring composition for color filter and color filter |
KR102235984B1 (en) * | 2018-04-04 | 2021-04-02 | 주식회사 엘지화학 | Quinophthalone-based compound, photosensitive resin composition, photoresist, color filter, and display device comprising the same |
JP7172477B2 (en) * | 2018-11-12 | 2022-11-16 | 東洋インキScホールディングス株式会社 | Coloring composition for color filter and color filter |
KR102216766B1 (en) * | 2018-11-23 | 2021-02-16 | 주식회사 엘지화학 | Photosensitive resin composition, photoresist, color filter and display device |
WO2020130441A1 (en) * | 2018-12-21 | 2020-06-25 | 주식회사 엘지화학 | Photosensitive resin composition, photosensitive material, color filter, and display device |
KR20210127754A (en) * | 2019-02-18 | 2021-10-22 | 스미또모 가가꾸 가부시키가이샤 | Coloring compositions, compounds, color filters and display devices |
KR20210144834A (en) * | 2019-03-29 | 2021-11-30 | 스미또모 가가꾸 가부시키가이샤 | Coloring compositions, compounds, color filters and display devices |
CN116656148A (en) * | 2023-05-16 | 2023-08-29 | 华东理工大学 | Yellow liquid crystal display pigment yellow derivative and application thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53121822A (en) * | 1977-04-01 | 1978-10-24 | Teijin Ltd | Colored organic compounds and their manufacture |
CN103460086B (en) * | 2011-03-18 | 2016-05-18 | 东洋油墨Sc控股株式会社 | Color composition for color filter and colour filter |
US9346749B2 (en) | 2011-06-16 | 2016-05-24 | Korea Research Institute Of Chemical Technology | 1,3-di-oxo-indene derivative, pharmaceutically acceptable salt or optical isomer thereof, preparation method thereof, and pharmaceutical composition containing same as an antiviral, active ingredient |
JP5267696B1 (en) * | 2012-03-02 | 2013-08-21 | 東洋インキScホールディングス株式会社 | Quinophthalone compounds |
WO2014035203A1 (en) * | 2012-08-31 | 2014-03-06 | 주식회사 엘지화학 | Styryl-based compound, coloring material comprising the styryl-based compound, photosensitive resin composition comprising the coloring material, photoresist material prepared from the photosensitive resin composition, color filter comprising the photoresist material, and display device comprising the color filter |
-
2016
- 2016-05-24 KR KR1020160063649A patent/KR102067858B1/en active IP Right Grant
-
2017
- 2017-05-18 TW TW106116394A patent/TWI622586B/en active
- 2017-05-23 JP JP2017101707A patent/JP6380867B2/en active Active
- 2017-05-23 CN CN201710368178.5A patent/CN107417665B/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20170132589A (en) | 2017-12-04 |
KR102067858B1 (en) | 2020-01-17 |
TWI622586B (en) | 2018-05-01 |
CN107417665B (en) | 2020-07-31 |
JP6380867B2 (en) | 2018-08-29 |
CN107417665A (en) | 2017-12-01 |
JP2017210615A (en) | 2017-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI622586B (en) | Compound, colorant composition comprising the same and resin composition comprising the same, photosensitive material, color filter, display device | |
KR102092438B1 (en) | Photosensitive resin composition and color filter comprising same | |
TWI675830B (en) | Xanthene-based compound, colorant composition comprising the same and resin composition comprising the same | |
CN107656423B (en) | Photosensitive resin composition and color filter containing the same | |
JP6604606B2 (en) | Compound, coloring material composition containing the same, and resin composition containing the same | |
TW201422645A (en) | Styryl-based compound, coloring agent comprising styryl-based compound, photoresist resin composition comprising coloring agent, photosensitive material manufactured by using the photoresist resin composition, color filter comprising the same and display | |
TW201739844A (en) | Compound, colorant composition comprising the same and resin composition comprising the same capable of providing excellent solubility and chemical resistance | |
JP6753597B2 (en) | Compound and photosensitive resin composition containing the compound | |
TWI694992B (en) | Compound, colorant composition, resin composition, photosensitive material, color filter, and display device | |
JP6897906B2 (en) | Compounds, color material compositions containing them, and resin compositions containing them | |
KR20200069056A (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
KR20190140741A (en) | Compound, photosensitive resin composition comprising the same, photo resist, color filter, and display device | |
KR20190140744A (en) | Compound, photosensitive resin composition comprising the same, photo resist, color filter, and display device | |
KR102662536B1 (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
KR102291761B1 (en) | Compound, colorant composition comprising the same and resin composition comprising the same | |
TWI598334B (en) | Compound and colorant composition,resin composition, photosensitive material, color filter and display device comprising the same | |
KR20200069070A (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
KR20200069730A (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
KR102683195B1 (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
KR102718652B1 (en) | Compound, photosensitive resin composition comprising the same, photoresist, color filter and display device | |
KR102636806B1 (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
KR102648146B1 (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device | |
JP2018028072A (en) | Compound, colorant composition comprising the same and resin composition comprising the same | |
TWI761701B (en) | Colorant composition, photoresist, color filter and display device | |
KR20200069062A (en) | Colorant composition, photosensitive resin composition, photo resist, color filter, and display device |