TW201732431A - Photosensitive coloring composition, cured product, colored spacer, and image display device - Google Patents

Photosensitive coloring composition, cured product, colored spacer, and image display device Download PDF

Info

Publication number
TW201732431A
TW201732431A TW105142935A TW105142935A TW201732431A TW 201732431 A TW201732431 A TW 201732431A TW 105142935 A TW105142935 A TW 105142935A TW 105142935 A TW105142935 A TW 105142935A TW 201732431 A TW201732431 A TW 201732431A
Authority
TW
Taiwan
Prior art keywords
group
ring
less
meth
mass
Prior art date
Application number
TW105142935A
Other languages
Chinese (zh)
Other versions
TWI711882B (en
Inventor
Atsuya Ito
Yoshihide Ogawa
li-hua Pei
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW201732431A publication Critical patent/TW201732431A/en
Application granted granted Critical
Publication of TWI711882B publication Critical patent/TWI711882B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

The present invention addresses the problem of providing a photosensitive coloring composition with which it is possible to form a pattern with high light-blocking properties, high reliability, and exceptional surface smoothness, the composition being desirably used for forming a colored spacer in particular. This photosensitive coloring composition contains a coloring agent (a), an alkali-soluble resin (b), a photopolymerization initiator (c), an ethylenically unsaturated compound (d), a solvent (e), and a dispersant (f). The coloring agent (a) contains an organic pigment and carbon black. The alkali-soluble resin (b) contains an epoxy (meth)acrylate resin (b-I) and a (meth)acrylic copolymer resin (b-II), in which repeating units [alpha] that have an ethylenically unsaturated bond and repeating units [beta] derived from an unsaturated carboxylic acid are contained in a side chain. The (meth)acrylic copolymer resin (b-II) contains at least 12 mol% of the repeating units [alpha].

Description

感光性著色組合物、硬化物、著色間隔件、圖像顯示裝置Photosensitive coloring composition, cured product, colored spacer, image display device

本發明係關於一種感光性著色組合物等。詳細而言，本發明係關於一種可於例如液晶顯示器等之彩色濾光片中較佳地用於著色間隔件等之形成之感光性著色組合物、將該感光性著色組合物硬化而獲得之著色間隔件、具備該著色間隔件之圖像顯示裝置。The present invention relates to a photosensitive coloring composition and the like. In particular, the present invention relates to a photosensitive coloring composition which can be preferably used for forming a coloring spacer or the like in a color filter such as a liquid crystal display, and is obtained by curing the photosensitive coloring composition. A coloring spacer and an image display device including the coloring spacer.

液晶顯示器(LCD)係利用藉由施加至液晶之電壓之導通/斷開而切換液晶分子之排列方式之性質。另一方面，構成LCD之單元之各構件多為藉由以光微影法為代表之利用感光性組合物之方法所形成者。基於容易形成微細之結構、對大畫面用之基板之處理亦容易等理由，今後該感光性組合物之應用範圍有進一步擴大之傾向。 然而，使用感光性組合物所製造之LCD因感光性組合物本身之電特性、或感光性組合物中所含之雜質之影響，而存在無法保持對液晶所施加之電壓，由此產生顯示器之顯示不均等問題之情形。尤其對於彩色液晶顯示器中靠近液晶層之構件、例如液晶面板中用以將2片基板之間隔保持固定之所謂柱狀間隔件、感光性間隔件等，其影響較大。 先前，於將不具有遮光性之間隔件用於TFT(Thin Film Transistor，薄膜電晶體)型LCD之情形時，存在因透過間隔件之光而使作為開關元件之TFT產生誤動作之情況。為了防止該情況，例如專利文獻1中記載有使用具有遮光性之間隔件(著色間隔件)之方法。 一方面，近年來，隨著面板結構之變化，提出有藉由光微影法一次性形成高度不同之著色間隔件之方法。例如專利文獻2中揭示有藉由組合複數種光吸收特性不同之特定之顏料種類，而確保紫外線區域與可見光區域之光吸收之平衡，可維持遮光性與液晶之電壓保持率，並且實現形狀及階差之控制、及與基板之密接性。 另一方面，專利文獻3中揭示有使用特定結構之鹼可溶性樹脂亦可實現遮光性、階差之控制、及與基板之密接性。 先前技術文獻 專利文獻 專利文獻1：日本專利特開平8-234212號公報 專利文獻2：國際公開第2013/115268號 專利文獻3：日本專利特開2013-134263號公報A liquid crystal display (LCD) is a property that switches the arrangement of liquid crystal molecules by on/off of a voltage applied to a liquid crystal. On the other hand, each member constituting the unit of the LCD is often formed by a method using a photosensitive composition typified by photolithography. The application range of the photosensitive composition tends to be further expanded in the future because of the ease of formation of a fine structure and the ease of handling of a substrate for a large screen. However, the LCD manufactured using the photosensitive composition may not be able to maintain a voltage applied to the liquid crystal due to the electrical characteristics of the photosensitive composition itself or the impurities contained in the photosensitive composition, thereby producing a display. Shows the situation of unequal problems. In particular, in a member of a color liquid crystal display which is close to a liquid crystal layer, for example, a so-called column spacer, a photosensitive spacer or the like for holding a space between two substrates in a liquid crystal panel, the influence is large. In the case where a spacer having no light-shielding property is used for a TFT (Thin Film Transistor) type LCD, there is a case where a TFT as a switching element malfunctions due to light transmitted through the spacer. In order to prevent this, for example, Patent Document 1 describes a method of using a spacer (coloring spacer) having a light-shielding property. On the one hand, in recent years, with the change of the structure of the panel, a method of forming a color spacer having a different height by a photolithography method has been proposed. For example, Patent Document 2 discloses that by combining a plurality of specific pigment types having different light absorption characteristics, the balance of light absorption between the ultraviolet region and the visible region is ensured, and the light-shielding property and the liquid crystal voltage retention ratio are maintained, and the shape and the shape are achieved. The control of the step and the adhesion to the substrate. On the other hand, Patent Document 3 discloses that the use of an alkali-soluble resin having a specific structure can also achieve light-shielding property, control of step difference, and adhesion to a substrate. CITATION LIST Patent Literature Patent Literature 1: Japanese Laid-Open Patent Publication No. Hei No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No.

[發明所欲解決之問題] 近年來，隨著面板結構之變化，有進一步提高著色間隔件之遮光性之要求。作為提高遮光性之方法，可列舉使用遮光性較高之顏料之方法、或提高感光性著色組合物中之顏料含有比例之方法等。本發明者等人研究後發現，於專利文獻2所記載之感光性著色組合物中，併用遮光性較高之顏料等進一步提高了著色間隔件之遮光性，但於膜表面附近與膜底部附近交聯密度差變大，因熱硬化過程之熱收縮導致塗膜表面產生皺褶，表面平滑性變得不充分。 又，於專利文獻3所記載之使用感光性著色組合物而形成遮光性較高之著色間隔件之情形時，發現源自著色劑之雜質溶出至形成成為其上層膜之配向膜時之溶劑中，而且由於高顏料濃度且硬化成分較少，導致雜質溶出亦較多，結果存在使LCD之顯示可靠性變差等問題。 本發明係鑒於上述情況而完成者，本發明之目的在於提供一種可形成遮光性較高、高可靠性且表面平滑性優異之圖案之感光性著色組合物。 [解決問題之技術手段] 本發明者等人為了解決上述課題而進行了努力研究，結果發現，於感光性著色組合物中，藉由組合使用環氧(甲基)丙烯酸酯樹脂與特定之(甲基)丙烯酸系共聚合樹脂作為鹼可溶性樹脂，可解決上述課題，從而達成本發明。 即，本發明具有以下[1]至[9]之構成。 [1]一種感光性著色組合物，其特徵在於：其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者，且 上述(a)著色劑含有有機顏料及碳黑， 上述(b)鹼可溶性樹脂含有(b-I)環氧(甲基)丙烯酸酯樹脂、與(b-II)含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂，且 上述(b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元α之含有比例為12莫耳%以上。 [2]如[1]所記載之感光性著色組合物，其中上述有機顏料含有選自由下述通式(1)所表示之化合物、該化合物之幾何異構物、該化合物之鹽及該化合物之幾何異構物之鹽所組成之群中之至少1種有機黑色顏料， [化1](式(1)中，R11 及R16 互相獨立為氫原子、CH3 、CF3 、氟原子或氯原子； R12 、R13 、R14 、R15 、R17 、R18 、R19 及R20 與其他全部互相獨立而為氫原子、鹵素原子、R21 、COOH、COOR21 、COO- 、CONH2 、CONHR21 、CONR21 R22 、CN、OH、OR21 、COCR21 、OCONH2 、OCONHR21 、OCONR21 R22 、NO2 、NH2 、NHR21 、NR21 R22 、NHCOR22 、NR21 COR22 、N=CH2 、N=CHR21 、N=CR21 R22 、SH、SR21 、SOR21 、SO2 R21 、SO3 R21 、SO3 H、SO3 - 、SO2 NH2 、SO2 NHR21 或SO2 NR21 R22 ； 且選自由R12 與R13 、R13 與R14 、R14 與R15 、R17 與R18 、R18 與R19 、及R19 與R20 所組成之群中之至少1種組合可互相直接鍵結，或者利用氧原子、硫原子、NH或NR21 橋而互相鍵結； R21 及R22 互相獨立為碳數1～12之烷基、碳數3～12之環烷基、碳數2～12之烯基、碳數3～12之環烯基或碳數2～12之炔基)。 [3]一種感光性著色組合物，其特徵在於：其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者，且 上述(a)著色劑含有選自由紅色顏料及橙色顏料所組成之群中之至少一種與選自由藍色顏料及紫色顏料所組成之群中之至少一種， 上述(b)鹼可溶性樹脂含有(b-I)環氧(甲基)丙烯酸酯樹脂、與(b-II)含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂，且 上述(b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元α之含有比例為12莫耳%以上。 [4]如[1]至[3]中任一項所記載之感光性著色組合物，其中上述重複單元α具有下述通式(I)所表示之化學結構， [化2](式(I)中，R1 及R2 分別獨立地表示氫原子或甲基；R3 表示二價連結基)。 [5]如[1]至[4]中任一項所記載之感光性著色組合物，其中上述(b-II)(甲基)丙烯酸系共聚合樹脂之含有比例相對於感光性著色組合物中之全部固形物成分為1質量%以上。 [6]如[1]至[5]中任一項所記載之感光性著色組合物，其中經硬化之塗膜之每1 μm膜厚之光學密度為1.0以上。 [7]一種硬化物，其係將如[1]至[6]中任一項所記載之感光性著色組合物硬化而獲得。 [8]一種著色間隔件，其係由如[7]所記載之硬化物所形成。 [9]一種圖像顯示裝置，其具備如[8]所記載之著色間隔件。 [發明之效果] 根據本發明，可提供一種可形成遮光性較高、高可靠性且表面平滑性優異之圖案之感光性著色組合物。又，可提供一種遮光性優異、表面平滑性優異之硬化物及著色間隔件，進而可提供一種具備此種著色間隔件之圖像顯示裝置。[Problems to be Solved by the Invention] In recent years, as the panel structure has changed, there has been a demand for further improving the light-shielding property of the coloring spacer. Examples of the method for improving the light-shielding property include a method of using a pigment having a high light-shielding property or a method of increasing a pigment content ratio in a photosensitive coloring composition. In the photosensitive coloring composition described in Patent Document 2, the inventors of the present invention have further improved the light-shielding property of the coloring spacer by using a pigment having a high light-shielding property, but in the vicinity of the film surface and the vicinity of the film bottom. The difference in crosslink density becomes large, and wrinkles are formed on the surface of the coating film due to thermal shrinkage during the heat hardening process, and surface smoothness is insufficient. Further, in the case of using the photosensitive coloring composition described in Patent Document 3 to form a coloring spacer having a high light-shielding property, it is found that impurities derived from the coloring agent are eluted into a solvent in forming an alignment film which is an upper film thereof. Further, since the pigment concentration is high and the hardening component is small, the impurities are eluted more, and as a result, the display reliability of the LCD is deteriorated. The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a photosensitive coloring composition which can form a pattern having high light-shielding property, high reliability, and excellent surface smoothness. [Means for Solving the Problems] The inventors of the present invention have made an effort to solve the above problems, and as a result, found that an epoxy (meth) acrylate resin and a specific one are used in combination in a photosensitive coloring composition. The methylated acrylic copolymer resin can solve the above problems as an alkali-soluble resin, and the present invention has been achieved. That is, the present invention has the following constitutions [1] to [9]. [1] A photosensitive coloring composition comprising (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent and (f) a dispersant, wherein the (a) colorant contains an organic pigment and carbon black, and the (b) alkali-soluble resin contains (bI) an epoxy (meth) acrylate resin, and (b- II) a (meth)acrylic copolymer resin containing a repeating unit α having an ethylenically unsaturated bond in a side chain and a repeating unit β derived from an unsaturated carboxylic acid, and the above (b-II) (meth)acrylic acid The content ratio of the above repeating unit α in the copolymerized resin is 12 mol% or more. [2] The photosensitive coloring composition according to [1], wherein the organic pigment contains a compound selected from the group consisting of the following formula (1), a geometric isomer of the compound, a salt of the compound, and the compound At least one organic black pigment in the group consisting of salts of geometric isomers, [Chemical 1] (In the formula (1), R 11 and R 16 are each independently a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 And R 20 and all others are independent of each other and are a hydrogen atom, a halogen atom, R 21 , COOH, COOR 21 , COO − , CONH 2 , CONHR 21 , CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OCONH 2 , OCONHR 21, OCONR 21 R 22 , NO 2, NH 2, NHR 21, NR 21 R 22, NHCOR 22, NR 21 COR 22, N = CH 2, N = CHR 21, N = CR 21 R 22, SH, SR 21 , SOR 21 , SO 2 R 21 , SO 3 R 21 , SO 3 H, SO 3 - , SO 2 NH 2 , SO 2 NHR 21 or SO 2 NR 21 R 22 ; and selected from R 12 and R 13 , At least one combination of R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be directly bonded to each other or an oxygen atom may be used. And a sulfur atom, NH or NR 21 bridge and are bonded to each other; R 21 and R 22 are each independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, and an alkenyl group having 2 to 12 carbon atoms. a cycloalkenyl group having 3 to 12 carbon atoms or an alkynyl group having 2 to 12 carbon atoms. [3] A photosensitive coloring composition comprising (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, and (f) a dispersing agent, wherein the (a) coloring agent contains at least one selected from the group consisting of a red pigment and an orange pigment, and at least one selected from the group consisting of a blue pigment and a purple pigment. In the above (b) the alkali-soluble resin contains (bI) an epoxy (meth) acrylate resin, and (b-II) a repeating unit α having an ethylenically unsaturated bond in a side chain and derived from an unsaturated carboxylic acid. The (meth)acrylic copolymer resin of the repeating unit β, and the content ratio of the above repeating unit α in the (b-II) (meth)acrylic copolymer resin is 12 mol% or more. [4] The photosensitive coloring composition according to any one of [1] to [3] wherein the repeating unit (α) has a chemical structure represented by the following formula (I), [Chemical 2] (In the formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group; and R 3 represents a divalent linking group). [5] The photosensitive coloring composition according to any one of [1] to [4] wherein the content ratio of the (b-II) (meth)acrylic copolymer resin is relative to the photosensitive coloring composition. All of the solid content components are 1% by mass or more. [6] The photosensitive coloring composition according to any one of [1] to [5] wherein the optical density per 1 μm of the cured coating film is 1.0 or more. [7] A cured product obtained by curing the photosensitive coloring composition according to any one of [1] to [6]. [8] A colored spacer formed of the cured product as described in [7]. [9] An image display device comprising the coloring spacer according to [8]. [Effects of the Invention] According to the present invention, it is possible to provide a photosensitive coloring composition which can form a pattern having high light-shielding property, high reliability, and excellent surface smoothness. Further, it is possible to provide a cured product and a colored spacer which are excellent in light-shielding property and excellent in surface smoothness, and further provide an image display device including such a coloring spacer.

以下，對本發明之實施形態進行具體說明，但本發明並不限定於以下之實施形態，可於其主旨之範圍內進行各種變更而實施。 再者，於本發明中，所謂「(甲基)丙烯酸」意指「丙烯酸及/或甲基丙烯酸」，「(甲基)丙烯酸酯」、「(甲基)丙烯醯基」亦相同。 於本發明中，所謂「(共)聚合物」意指包括均聚物(homopolymer)與共聚物(copolymer)兩者，所謂「酸(酐)」、「(無水)…酸」意指包括酸與其酐兩者。又，於本發明中，所謂「丙烯酸系樹脂」意指含有(甲基)丙烯酸之(共)聚合物、含有具有羧基之(甲基)丙烯酸酯之(共)聚合物。 又，於本發明中，所謂「單體」係相對於所謂之高分子物質(聚合物)之用語，其含義除了狹義之單體(monomer)以外，亦包括二聚物、三聚物、低聚物等。 於本發明中，所謂「全部固形物成分」意指感光性著色組合物中或下文所述之油墨中所含之溶劑以外之全部成分。 於本發明中，所謂「重量平均分子量」係指藉由GPC(凝膠滲透層析法)所獲得之聚苯乙烯換算之重量平均分子量(Mw)。 又，於本發明中，所謂「胺值」，只要無特別說明，則表示有效固形物成分換算之胺值，為每1 g分散劑之固形物成分之鹼量與當量之KOH之質量所表示之值。再者，下文對測定方法進行說明。另一方面，所謂「酸值」，只要無特別說明，則表示有效固形物成分換算之酸值，藉由中和滴定而算出。 又，於本說明書中，「質量」所表示之百分率或份與「重量」所表示之百分率或份含義相同。 [感光性著色組合物] 本發明之感光性著色組合物含有 (a)著色劑、 (b)鹼可溶性樹脂、 (c)光聚合起始劑、 (d)乙烯性不飽和化合物、 (e)溶劑、及 (f)分散劑 作為必需成分，可視需要而進一步含有矽烷偶合劑等密接改善劑、塗佈性提高劑、顯影改良劑、紫外線吸收劑、抗氧化劑、界面活性劑、顏料衍生物等其他調配成分，通常各調配成分係以溶解或分散於溶劑中之狀態使用。 本發明之第一態樣之感光性著色組合物中，(a)著色劑含有有機顏料及碳黑。又，本發明之第二態樣之感光性著色組合物中，(a)著色劑含有選自由紅色顏料及橙色顏料所組成之群中之至少一種與選自由藍色顏料及紫色顏料所組成之群中之至少一種。進而，本發明之第三態樣之感光性著色組合物係用於形成著色間隔件。 以下，只要無特別說明，則「本發明之感光性著色組合物」係指上述第一態樣之感光性著色組合物、第二態樣之感光性著色組合物、及第三態樣之感光性著色組合物之全部。 ＜(a)著色劑＞ 本發明之感光性著色組合物所使用之(a)著色劑只要為可將感光性著色組合物或將其硬化而獲得之硬化物進行著色之色料，則無特別限定，例如可列舉顏料或染料，就耐久性之觀點而言，可較佳地使用顏料。 作為顏料，可列舉有機顏料或無機顏料，就抑制液晶之電壓保持率之降低之觀點，又，就抑制紫外線之吸收而變得容易控制形狀或階差之觀點而言，較佳為使用有機顏料。 本發明之第一態樣之感光性著色組合物所使用之(a)著色劑含有有機顏料及碳黑。由此，藉由使用紫外線之吸收較少之有機顏料，而使形狀或階差之控制變得容易，亦使表面平滑性變得良好，又，藉由除了有機顏料以外亦使用碳黑，可達成高遮光性。 有機顏料之種類並無特別限定，就密接性之觀點而言，較佳為含有選自由紅色顏料、橙色顏料、藍色顏料及紫色顏料所組成之群中之至少一種有機著色顏料。又，就遮光性之觀點而言，較佳為含有有機黑色顏料。 該等顏料之化學結構並無特別限定，除了利用偶氮系、酞菁系、喹吖啶酮系、苯并咪唑酮系、異吲哚啉酮系、二㗁??系、陰丹士林系、苝系等之有機顏料以外，亦可利用各種無機顏料等。以下，以顏料編號例示可使用之顏料之具體例。以下所列舉之「C.I.顏料紅2」等用語意指色度指數(C.I.)。 作為紅色顏料，可列舉：C.I.顏料紅1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、38、41、47、48、48：1、48：2、48：3、48：4、49、49：1、49：2、50：1、52：1、52：2、53、53：1、53：2、53：3、57、57：1、57：2、58：4、60、63、63：1、63：2、64、64：1、68、69、81、81：1、81：2、81：3、81：4、83、88、90：1、101、101：1、104、108、108：1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、175、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276。其中，較佳可列舉C.I.顏料紅48：1、122、149、168、177、179、194、202、206、207、209、224、242、254、272，進而較佳可列舉C.I.顏料紅149、177、179、194、209、224、254。再者，就分散性或遮光性之方面而言，較佳為使用C.I.顏料紅177、254、272，於藉由紫外線進行硬化之情形時，較佳為使用紫外線吸收率較低者作為紅色顏料，就該觀點而言，更佳為使用C.I.顏料紅254、272。 作為橙色(orange)顏料，可列舉：C.I.顏料橙1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78、79。其中，較佳可列舉C.I.顏料橙38、43、64、71、72。再者，就分散性或遮光性之方面而言，較佳為使用C.I.顏料橙43、64、72，於藉由紫外線進行硬化之情形時，較佳為使用紫外線吸收率較低者作為橙色顏料，就該觀點而言，更佳為使用C.I.顏料橙64、72。 作為藍色顏料，可列舉：C.I.顏料藍1、1：2、9、14、15、15：1、15：2、15：3、15：4、15：6、16、17、19、25、27、28、29、33、35、36、56、56：1、60、61、61：1、62、63、66、67、68、71、72、73、74、75、76、78、79。其中，較佳可列舉C.I.顏料藍15、15：1、15：2、15：3、15：4、15：6、16、60，進而較佳可列舉C.I.顏料藍15：6。 再者，就分散性或遮光性之方面而言，較佳為使用C.I.顏料藍15：6、16、60，於藉由紫外線進行硬化之情形時，較佳為使用紫外線吸收率較低者作為藍色顏料，就該觀點而言，更佳為使用C.I.顏料藍60。 作為紫色顏料，可列舉：C.I.顏料紫1、1：1、2、2：2、3、3：1、3：3、5、5：1、14、15、16、19、23、25、27、29、31、32、37、39、42、44、47、49、50。其中，較佳可列舉C.I.顏料紫19、23、29，進而較佳可列舉C.I.顏料紫23。 再者，就分散性或遮光性之方面而言，較佳為使用C.I.顏料紫23、29，於藉由紫外線進行硬化之情形時，較佳為使用紫外線吸收率較低者作為紫色顏料，就該觀點而言，更佳為使用C.I.顏料紫29。 作為除了紅色顏料、橙色顏料、藍色顏料、紫色顏料以外可使用之有機著色顏料，例如可列舉綠色顏料、黃色顏料等。 作為綠色顏料，可列舉：C.I.顏料綠1、2、4、7、8、10、13、14、15、17、18、19、26、36、45、48、50、51、54、55。其中，較佳可列舉C.I.顏料綠7、36。 作為黃色顏料，可列舉：C.I.顏料黃1、1：1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35：1、36、36：1、37、37：1、40、41、42、43、48、53、55、61、62、62：1、63、65、73、74、75、81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127：1、128、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191：1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207、208。其中，較佳可列舉C.I.顏料黃83、117、129、138、139、150、154、155、180、185，進而較佳可列舉C.I.顏料黃83、138、139、150、180。 該等中，就遮光性或形狀及階差之控制之觀點而言，較佳為含有以下顏料中之至少一種以上。 紅色顏料：C.I.顏料紅177、254、272 橙色顏料：C.I.顏料橙43、64、72 藍色顏料：C.I.顏料藍15：6、60 紫色顏料：C.I.顏料紫23、29 又，就遮光性或形狀及階差之控制之觀點而言，紅色顏料較佳為以下之(1)，橙色顏料較佳為以下之(2)，藍色顏料較佳為以下之(3)，紫色顏料較佳為以下之(4)。 (1)選自C.I.顏料紅177、254中之至少一種 (2)選自C.I.顏料橙43、64中之至少一種 (3)選自C.I.顏料藍15：6、60中之至少一種 (4)選自C.I.顏料紫23、29中之至少一種 再者，於第一態樣之感光性著色組合物中，組合複數種有機顏料而使用之情形時之該組合並無特別限定，就可見光區域之尤其長波長區域中之遮光性之觀點而言，較佳為使用藍色顏料及/或紫色顏料。尤其是由於碳黑之吸收光譜中吸光度自短波長至長波長逐漸下降，又，與有機顏料相比紫外線區域之吸光度變高，因此就兼顧遮光性與製版性之觀點而言，較佳為併用藍色顏料及/或紫色顏料與碳黑，更佳為併用藍色顏料及紫色顏料與碳黑。 另一方面，於使用少量碳黑之情形時，就遮光性之觀點而言，較佳為含有選自由紅色顏料及橙色顏料所組成之群中之至少一種與選自由藍色顏料及紫色顏料所組成之群中之至少一種，作為該具體組合例，可列舉紅色顏料與藍色顏料之組合、藍色顏料與橙色顏料之組合、藍色顏料與橙色顏料以及紫色顏料之組合等。 進而，除了該等有機著色顏料以外，可進一步使用黑色色料。作為黑色色料，可列舉碳黑等無機黑色顏料、或有機黑色顏料。 另一方面，亦可使用有機黑色顏料代替有機著色顏料。 第一態樣之感光性著色組合物含有碳黑作為黑色色料。由此藉由除了有機顏料以外亦使用碳黑，可達成高遮光性。於使用碳黑之情形時，尤其是由於有表面平滑性變差之傾向，因此藉由應用本發明，而有可改善該情況之傾向。作為碳黑之例，可列舉如以下之碳黑。 三菱化學公司製造：MA7、MA8、MA11、MA77、MA100、MA100R、MA100S、MA220、MA230、MA600、MCF88、#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#900、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#2650、#3030、#3050、#3150、#3250、#3400、#3600、#3750、#3950、#4000、#4010、OIL7B、OIL9B、OIL11B、OIL30B、OIL31B Degussa公司製造：Printex(註冊商標，以下相同)3、Printex3OP、Printex30、Printex30OP、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V、PrintexG、SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、Color Black FW1、Color Black FW2、Color Black FW2V、Color Black FW18、Color Black FW18、Color Black FW200、Color Black S160、Color Black S170 Cabot公司製造：Monarch(註冊商標，以下相同)120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL(註冊商標，以下相同)99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACK PEARLS480、PEARLS130、VULCAN(註冊商標)XC72R、ELFTEX(註冊商標)-8 Columbian Carbon公司製造：RAVEN(註冊商標，以下相同)11、RAVEN14、RAVEN15、RAVEN16、RAVEN22、RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000 碳黑亦可使用由樹脂被覆者。若使用由樹脂被覆之碳黑，則具有提高與玻璃基板之密接性或體積電阻值之效果。作為由樹脂被覆之碳黑，例如可適宜地使用日本專利特開平09-71733號公報所記載之碳黑等。就體積電阻或介電常數之方面而言，可適宜地使用樹脂被覆碳黑。 作為供於利用樹脂進行之被覆處理之碳黑，較佳為Na與Ca之合計含量為100 ppm以下。碳黑通常以百分比之級別含有以自製造時之原料油或燃燒油(或氣體)、反應停止水或造粒水、進而反應爐之爐材等混入之Na或Ca、K、Mg、Al、Fe等作為組成之灰分。其中，通常各含有數百ppm以上之Na或Ca，藉由減少該等，而有抑制向透明電極(ITO(Indium Tin Oxides，氧化銦錫))或其他電極中之滲透，可防止電性短路之傾向。 作為減少含有該等Na或Ca之灰分之含量的方法，可藉由嚴格選擇該等之含量儘可能少之物作為製造碳黑時之原料油或燃料油(或氣體)及反應停止水以及儘可能減少調整結構(structure)之鹼性物質之添加量而實現。作為其他方法，可列舉藉由水或鹽酸等清洗由爐製造出之碳黑而將Na或Ca溶解去除之方法。 具體而言，將碳黑混合分散於水、鹽酸、或過氧化氫水中後，若添加難溶於水之溶媒，則碳黑轉移至溶媒側，與水完全分離，並且存在於碳黑中之大部分Na或Ca溶解於水或酸中而被去除。為了將Na與Ca之合計量減少為100 ppm以下，亦存在單獨藉由嚴格選擇原材料之碳黑製造過程或者單獨藉由水或酸溶解方式而實現之情形，但藉由將該兩種方式併用，可更容易地使Na與Ca之合計量成為100 ppm以下。 又，樹脂被覆碳黑較佳為pH值為6以下之所謂之酸性碳黑。由於在水中之分散直徑(附聚直徑)變小，因此可被覆至微細單元而較為適宜。進而較佳為平均粒徑為40 nm以下，鄰苯二甲酸二丁酯(DBP)吸收量為140 ml/100 g以下。藉由設為上述範圍內，而有可獲得遮光性良好之塗膜之傾向。平均粒徑意指數量平均粒徑，意指藉由粒子圖像解析求出之圓當量徑，該粒子圖像解析係對藉由電子顯微鏡觀察以數萬倍拍攝之照片拍攝數個視野，藉由圖像處理裝置計測2000～3000個左右之該等照片之粒子。 製備以樹脂被覆之碳黑之方法並無特別限定，例如適當調整碳黑及樹脂之調配量後，採用如下方法：1.將使樹脂與環己酮、甲苯、二甲苯等溶劑混合並加熱溶解而成之樹脂溶液與混合有碳黑及水之懸濁液加以混合攪拌，使碳黑與水分離後，將水去除並進行加熱混練，將所獲得之組合物成形為片狀並粉碎後，加以乾燥之方法；2.將以與上述同樣之方式製備之樹脂溶液與懸濁液加以混合攪拌並將碳黑及樹脂粒狀化後，將所獲得之粒狀物分離、加熱而去除殘存之溶劑及水之方法；3.於上述例示之溶劑中溶解順丁烯二酸、反丁烯二酸等羧酸，添加、混合碳黑並加以乾燥，去除溶劑而獲得添附羧酸之碳黑後，於其中添加樹脂並進行乾摻之方法；4.將構成進行被覆之樹脂之含反應性基單體成分與水進行高速攪拌而製備懸濁液，聚合後進行冷卻而由聚合物懸濁液獲得含反應性基之樹脂後，於其中添加碳黑並進行混練，使碳黑與反應性基進行反應(使碳黑接枝)，並進行冷卻及粉碎之方法等。 被覆處理之樹脂之種類亦無特別限定，通常為合成樹脂，進而結構中具有苯環之樹脂由於作為兩性系界面活性劑之作用更強，因此就分散性及分散穩定性之方面而言較佳。 作為具體之合成樹脂，可使用：酚樹脂、三聚氰胺樹脂、二甲苯樹脂、鄰苯二甲酸二烯丙酯樹脂、甘酞樹脂、環氧樹脂、烷基苯樹脂等熱硬化性樹脂；或聚苯乙烯、聚碳酸酯、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、改性聚苯醚、聚碸、聚對苯對苯二甲醯胺、聚醯胺醯亞胺、聚醯亞胺、聚胺基雙順丁烯二醯亞胺、聚醚碸、聚苯碸、聚芳酯、聚醚醚酮等熱塑性樹脂。樹脂對碳黑之被覆量相對於碳黑與樹脂之合計量，較佳為1～30質量%，藉由設為上述下限值以上，有可使被覆充分進行之傾向。另一方面，藉由設為上述上限值以下，有防止樹脂彼此之黏著，而製成分散性良好者之傾向。 以上述方式藉由樹脂進行被覆處理而成之碳黑可依照常規方法用作著色間隔件之遮光材，可藉由常規方法製作以該著色間隔件作為構成要素之彩色濾光片。若使用此種碳黑，則有可以較低成本達成高遮光率且表面反射率較低之著色間隔件之傾向。又，亦推測藉由以樹脂被覆碳黑表面，亦有將Ca或Na封入至碳黑中之作用。 作為碳黑以外之黑色色料，就抑制液晶之電壓保持率之降低之觀點，又，就抑制紫外線之吸收而變得容易控制形狀或階差之觀點而言，較佳為使用有機黑色顏料，尤其是就遮光性之觀點而言，較佳為使用選自由下述通式(1)所表示之化合物、該化合物之幾何異構物、該化合物之鹽及該化合物之幾何異構物之鹽所組成之群中之至少1種有機黑色顏料(以下有時簡記為「上述通式(1)所表示之有機黑色顏料」)。 [化3]式(1)中，R11 及R16 互相獨立為氫原子、CH3 、CF3 、氟原子或氯原子； R12 、R13 、R14 、R15 、R17 、R18 、R19 及R20 與其他全部互相獨立而為氫原子、鹵素原子、R21 、COOH、COOR21 、COO- 、CONH2 、CONHR21 、CONR21 R22 、CN、OH、OR21 、COCR21 、OCONH2 、OCONHR21 、OCONR21 R22 、NO2 、NH2 、NHR21 、NR21 R22 、NHCOR22 、NR21 COR22 、N=CH2 、N=CHR21 、N=CR21 R22 、SH、SR21 、SOR21 、SO2 R21 、SO3 R21 、SO3 H、SO3 - 、SO2 NH2 、SO2 NHR21 或SO2 NR21 R22 ； 且選自由R12 與R13 、R13 與R14 、R14 與R15 、R17 與R18 、R18 與R19 、及R19 與R20 所組成之群中之至少1種組合可互相直接鍵結，或者利用氧原子、硫原子、NH或NR21 橋而互相鍵結； R21 及R22 互相獨立為碳數1～12之烷基、碳數3～12之環烷基、碳數2～12之烯基、碳數3～12之環烯基或碳數2～12之炔基。 通式(1)所表示之化合物之幾何異構物具有以下之核結構(其中省略結構式中之取代基)，很可能最穩定的是反-反異構物。 [化4]於通式(1)所表示之化合物為陰離子性之情形時，較佳為藉由任意公知之合適之陽離子，例如金屬、有機、無機或金屬有機陽離子，具體而言為鹼金屬、鹼土金屬、過渡金屬、一級銨、二級銨、三烷基銨等三級銨、四烷基銨等四級銨或有機金屬錯合物補償其電荷而成之鹽。又，於通式(1)所表示之化合物之幾何異構物為陰離子性之情形時，較佳為同樣之鹽。 於通式(1)之取代基及該等之定義中，由於有遮蔽率變高之傾向，因此較佳為以下。其原因在於認為以下取代基無吸收，不會對顏料之色相產生影響。 R12 、R14 、R15 、R17 、R19 及R20 互相獨立，較佳為氫原子、氟原子、或氯原子，進而較佳為氫原子。 R13 及R18 互相獨立，較佳為氫原子、NO2 、OCH3 、OC2 H5 、溴原子、氯原子、CH3 、C2 H5 、N(CH3 )2 、N(CH3 )(C2 H5 )、N(C2 H5 )2 、α-萘基、β-萘基、SO3 H或SO3 - ，進而較佳為氫原子或SO3 H。 R11 及R16 互相獨立，較佳為氫原子、CH3 或CF3 ，進而較佳為氫原子。 較佳為選自由R11 與R16 、R12 與R17 、R13 與R18 、R14 與R19 、及R15 與R20 所組成之群中之至少1種組合相同，更佳為R11 與R16 相同，R12 與R17 相同，R13 與R18 相同，R14 與R19 相同，且R15 與R20 相同。 碳數1～12之烷基例如為：甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、2-甲基丁基、正戊基、2-戊基、3-戊基、2,2-二甲基丙基、正己基、庚基、正辛基、1,1,3,3-四甲基丁基、2-乙基己基、壬基、癸基、十一烷基或十二烷基。 碳數3～12之環烷基例如為：環丙基、環丙基甲基、環丁基、環戊基、環己基、環己基甲基、三甲基環己基、側柏基(thujyl)、降基、基、降蒈基(Norcaryl)、蒈基、□基、降蒎基、蒎基、1-金剛烷基或2-金剛烷基。 碳數2～12之烯基例如為：乙烯基、烯丙基、2-丙烯-2-基、2-丁烯-1-基、3-丁烯-1-基、1,3-丁二烯-2-基、2-戊烯-1-基、3-戊烯-2-基、2-□基-1-丁烯-3-基、2-甲基-3-丁烯-2-基、3-甲基-2-丁烯-1-基、1,4-戊二烯-3-基、己烯基、辛烯基、壬烯基、癸烯基或十二碳烯基。 碳數3～12之環烯基例如為：2-環丁烯-1-基、2-環戊烯-1-基、2-環己烯-1-基、3-環己烯-1-基、2,4-環己二烯-1-基、1-對□烯-8-基、4(10)-側柏烯-10-基、2-降烯-1-基、2,5-降二烯-1-基、7,7-二甲基-2,4-降蒈二烯-3-基或烯基(camphenyl)。 碳數2～12之炔基例如為：1-丙炔-3-基、1-丁炔-4-基、1-戊炔-5-基、2-甲基-3-丁炔-2-基、1,4-戊二炔-3-基、1,3-戊二炔-5-基、1-己炔-6-基、順-3-甲基-2-戊烯-4-炔-1-基、反-3-甲基-2-戊烯-4-炔-1-基、1,3-己二炔-5-基、1-辛炔-8-基、1-壬炔-9-基、1-癸炔-10-基或1-十二碳炔-12-基。 鹵素原子例如為：氟原子、氯原子、溴原子或碘原子。 上述通式(1)所表示之有機黑色顏料較佳為下述通式(2)所表示之化合物。 [化5]作為此種有機黑色顏料之具體例，可列舉商品名如下者：Irgaphor(註冊商標) Black S 0100 CF(BASF公司製造)。 該有機黑色顏料較佳為藉由下文所述之分散劑、溶劑、方法使其分散而使用。又，於分散時若存在上述通式(2)之磺酸衍生物，則存在提高分散性或保存性之情形。 作為上述通式(1)所表示之有機黑色顏料以外之黑色色料，可列舉：乙炔黑、燈黑、骨黑、石墨、鐵黑、苯胺黑、花青黑、鈦黑、苝黑等。 又，除了上述顏料以外，亦可使用染料。作為可用作色料之染料，可列舉：偶氮系染料、蒽醌系染料、酞菁系染料、醌亞胺系染料、喹啉系染料、硝基系染料、羰基系染料、次甲基系染料等。 作為偶氮系染料，例如可列舉：C.I.酸性黃11、C.I.酸性橙7、C.I.酸性紅37、C.I.酸性紅180、C.I.酸性藍29、C.I.直接紅28、C.I.直接紅83、C.I.直接黃12、C.I.直接橙26、C.I.直接綠28、C.I.直接綠59、C.I.反應性黃2、C.I.反應性紅17、C.I.反應性紅120、C.I.反應性黑5、C.I.分散橙5、C.I.分散紅58、C.I.分散藍165、C.I.鹼性藍41、C.I.鹼性紅18、C.I.媒染紅7、C.I.媒染黃5、C.I.媒染黑7等。 作為蒽醌系染料，例如可列舉：C.I.還原藍4、C.I.酸性藍40、C.I.酸性綠25、C.I.反應性藍19、C.I.反應性藍49、C.I.分散紅60、C.I.分散藍56、C.I.分散藍60等。 除此以外，作為酞菁系染料，例如可列舉C.I.還原藍5等，作為醌亞胺系染料，例如可列舉C.I.鹼性藍3、C.I.鹼性藍9等，作為喹啉系染料，例如可列舉C.I.溶劑黃33、C.I.酸性黃3、C.I.分散黃64等，作為硝基系染料，例如可列舉C.I.酸性黃1、C.I.酸性橙3、C.I.分散黃42等。 該等顏料較佳為以平均粒徑通常成為1 μm以下、較佳為0.5 μm以下、進而較佳為0.25 μm以下之方式分散而使用。此處，平均粒徑之基準為顏料粒子之個數。 再者，顏料之平均粒徑係根據藉由動態光散射(Dynamic Light Scattering，DLS)測得之顏料粒徑求出之值。粒徑測定係對經充分稀釋之感光性著色組合物(通常進行稀釋而而製備為顏料濃度0.005～0.2質量%左右。但若有測定機器推薦之濃度，則按照該濃度)進行，於25℃下進行測定。 第二態樣之感光性著色組合物所使用之(a)著色劑含有選自由紅色顏料及橙色顏料所組成之群中之至少一種與選自由藍色顏料及紫色顏料所組成之群中之至少一種。由此藉由本發明之第二態樣之感光性著色組合物含有特定之有機著色顏料之組合，而可達成高遮光性。 作為紅色顏料、橙色顏料、藍色顏料及紫色顏料，可適宜地使用與第一態樣中所記載者相同者。顏色之組合並無特別限定，就遮光性之觀點而言，例如可列舉：紅色顏料與藍色顏料之組合、橙色顏料與藍色顏料之組合、橙色顏料與藍色顏料以及紫色顏料之組合等。 又，第二態樣之感光性著色組合物亦可含有紅色顏料、橙色顏料、藍色顏料及紫色顏料以外之顏料，就遮光性之觀點而言，較佳為含有黑色色料。作為黑色色料，可適宜地使用與第一態樣中所記載者相同者。 第三態樣之感光性著色組合物係用於形成著色間隔件之感光性著色組合物，(a)著色劑並無特別限定。例如可列舉含有上文所述之有機著色顏料、黑色色料、染料之至少任一種者。又，作為(a)著色劑，亦可使用作為第一態樣及第二態樣所記載者，又，就遮光性之觀點而言，亦可使用含有上述通式(1)所表示之有機黑色顏料之著色劑。 ＜(b)鹼可溶性樹脂＞ 本發明所使用之(b)鹼可溶性樹脂係含有羧基或羥基之樹脂，尤其含有(b-I)環氧(甲基)丙烯酸酯樹脂、與(b-II)含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂，且(b-II)(甲基)丙烯酸系共聚合樹脂中之重複單元α之含有比例為10莫耳%以上，較佳為12莫耳%以上。 於單獨使用(b-I)環氧(甲基)丙烯酸酯樹脂作為(b)鹼可溶性樹脂之情形時，通常該樹脂於主鏈具有芳香族等結構，該結構導致容易產生熱流動，產生皺褶而表面平滑性容易變差。皺褶會導致遮光性亦降低，因此無法獲得所需之遮光性而容易產生漏光等問題。 又，於著色間隔件中多數情況以高於黑矩陣之膜厚使用。又，為了設置所需之階差，較理想為感光性著色組合物具有不易熱變形之塗膜特性，但為了確保壓縮特性或可靠性，較佳為將顏料濃度設定為低於黑矩陣。其結果，於著色間隔件中，於膜表面附近與膜底部附近交聯密度之差進一步變大，而變得容易產生皺褶。又，由於此種熱變形，因此有無法確保充分之階差形成性之傾向。 為了兼顧此各種性能，認為藉由併用主鏈中不含芳香環等且熱收縮較少之丙烯酸系樹脂、尤其是玻璃轉移溫度較高且不易熱流動之含有源自不飽和羧酸之重複單元之特定之(甲基)丙烯酸系共聚合樹脂，可降低熱流動，抑制皺褶之產生，而可使表面平滑性變得良好。但由於在併用感度較低之(甲基)丙烯酸系共聚合樹脂之情形時，有可靠性變差之傾向，因此認為藉由向該(甲基)丙烯酸系共聚合樹脂中導入特定量之乙烯性不飽和鍵，可充分確保感度，使可靠性變得良好，其結果為可實現兼顧表面平滑性與可靠性。 ＜(b-I)環氧(甲基)丙烯酸酯樹脂＞ (b-I)環氧(甲基)丙烯酸酯樹脂係使環氧化合物與α,β-不飽和單羧酸及/或酯部分具有羧基之α,β-不飽和單羧酸酯之反應物及藉由該反應產生之羥基進一步與具有2個以上可與多元酸及/或其酐等之羥基進行反應之取代基之化合物進行反應而獲得之樹脂。 作為本發明所使用之(b-I)環氧(甲基)丙烯酸酯樹脂，就可靠性之觀點而言，尤其可適宜地使用下述環氧(甲基)丙烯酸酯樹脂(b1)及/或環氧(甲基)丙烯酸酯樹脂(b2)(以下有時稱為「含羧基之環氧(甲基)丙烯酸酯樹脂」)。 ＜環氧(甲基)丙烯酸酯樹脂(b1)＞ 藉由對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯，進而與多元酸及/或其酐進行反應而獲得之鹼可溶性樹脂。 ＜環氧(甲基)丙烯酸酯樹脂(b2)＞ 藉由對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯，進而與多元醇、及多元酸及/或其酐進行反應而獲得之鹼可溶性樹脂。 此處，所謂環氧樹脂係亦包括藉由熱硬化形成樹脂前之原料化合物而言，作為該環氧樹脂，可自公知之環氧樹脂中適當選擇而使用。又，環氧樹脂可使用使酚性化合物與表鹵醇進行反應而獲得之化合物。作為酚性化合物，較佳為具有二價或二價以上之酚性羥基之化合物，可為單體，亦可為聚合物。 作為成為原料之環氧樹脂之種類，可適宜地使用甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、三苯酚甲烷型環氧樹脂、聯苯酚醛清漆型環氧樹脂、萘酚醛清漆型環氧樹脂、作為二環戊二烯與苯酚或甲酚之加成聚合反應物與表鹵醇之反應產物之環氧樹脂、含金剛烷基之環氧樹脂、茀型環氧樹脂等，可適宜地使用此種主鏈具有芳香族環者。 又，作為環氧樹脂之具體例，可適宜地使用：雙酚A型環氧樹脂(例如三菱化學公司製造之「Epikote(註冊商標；以下相同)828」、「Epikote 1001」、「Epikote 1002」、「Epikote 1004」等)、藉由雙酚A型環氧樹脂之醇性羥基與表氯醇之反應而獲得之環氧樹脂(例如日本化藥公司製造之「NER-1302」(環氧當量323，軟化點76℃))、雙酚F型樹脂(例如三菱化學公司製造之「Epikote 807」、「EP-4001」、「EP-4002」、「EP-4004等」)、藉由雙酚F型環氧樹脂之醇性羥基與表氯醇之反應而獲得之環氧樹脂(例如日本化藥公司製造之「NER-7406」(環氧當量350，軟化點66℃))、雙酚S型環氧樹脂、聯苯縮水甘油醚(例如三菱化學公司製造之「YX-4000」)、苯酚酚醛清漆型環氧樹脂(例如日本化藥公司製造之「EPPN-201」、三菱化學公司製造之「EP-152」、「EP-154」、Dow Chemical公司製造之「DEN-438」)、(鄰、間、對)甲酚酚醛清漆型環氧樹脂(例如日本化藥公司製造之「EOCN(註冊商標；以下相同)-102S」、「EOCN-1020」、「EOCN-104S」)、異氰脲酸三縮水甘油酯(例如日產化學公司製造之「TEPIC(註冊商標)」)、三苯酚甲烷型環氧樹脂(例如日本化藥公司製造之「EPPN(註冊商標；以下相同)-501」、「EPN-502」、「EPPN-503」)、脂環式環氧樹脂(Daicel化學工業公司製造之「Celloxide 2021P」、「Celloxide(註冊商標；以下相同)EHPE」)、將藉由二環戊二烯與苯酚之反應獲得之苯酚樹脂進行縮水甘油基化而成之環氧樹脂(例如DIC公司製造之「EXA-7200」、日本化藥公司製造之「NC-7300」)、下述通式(B1)～(B4)所表示之環氧樹脂等。具體而言，作為下述通式(B1)所表示之環氧樹脂，可列舉日本化藥公司製造之「XD-1000」，作為下述通式(B2)所表示之環氧樹脂，可列舉日本化藥公司製造之「NC-3000」，作為下述通式(B4)所表示之環氧樹脂，可列舉新日鐵住金化學公司製造之「ESF-300」等。 [化6]於上述通式(B1)中，a表示平均值，表示0～10之數。R111 表示氫原子、鹵素原子、碳數1～8之烷基、碳數3～10之環烷基、苯基、萘基、或聯苯基中之任一者。再者，存在於1分子中之複數個R111 分別可相同亦可不同。 [化7]於上述通式(B2)中，b表示平均值，表示0～10之數。R121 表示氫原子、鹵素原子、碳數1～8之烷基、碳數3～10之環烷基、苯基、萘基、或聯苯基中之任一者。再者，存在於1分子中之複數個R121 分別可相同亦可不同。 [化8]於上述通式(B3)中，X表示下述通式(B3-1)或(B3-2)所表示之連結基。但於分子結構中含有1個以上之金剛烷結構。c表示2或3之整數。 [化9][化10]於上述通式(B3-1)及(B3-2)中，R131 ～R134 及R135 ～R137 分別獨立地表示可具有取代基之金剛烷基、氫原子、可具有取代基之碳數1～12之烷基、或可具有取代基之苯基。﹡表示鍵結鍵。 [化11]於上述通式(B4)中，p及q分別獨立地表示0～4之整數，R141 及R142 分別獨立地表示碳數1～4之烷基或鹵素原子。R143 及R144 分別獨立地表示碳數1～4之伸烷基。x及y分別獨立地表示0以上之整數。 該等中，就可靠性之觀點而言，較佳為使用通式(B1)～(B4)之任一者所表示之環氧樹脂。 作為α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯，可列舉：(甲基)丙烯酸、丁烯酸、鄰乙烯基苯甲酸、間乙烯基苯甲酸、對乙烯基苯甲酸；(甲基)丙烯酸之α位鹵代烷基、烷氧基、鹵素、硝基、氰基取代體等單羧酸；2-(甲基)丙烯醯氧基乙基丁二酸、2-(甲基)丙烯醯氧基乙基己二酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基順丁烯二酸、2-(甲基)丙烯醯氧基丙基丁二酸、2-(甲基)丙烯醯氧基丙基己二酸、2-(甲基)丙烯醯氧基丙基四氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基順丁烯二酸、2-(甲基)丙烯醯氧基丁基丁二酸、2-(甲基)丙烯醯氧基丁基己二酸、2-(甲基)丙烯醯氧基丁基氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丁基鄰苯二甲酸、2-(甲基)丙烯醯氧基丁基順丁烯二酸；作為對(甲基)丙烯酸加成ε-己內酯、β-丙內酯、γ-丁內酯、δ-戊內酯等內酯類而成者之單體；或對(甲基)丙烯酸羥基烷基酯、季戊四醇三(甲基)丙烯酸酯加成丁二酸(酐)、鄰苯二甲酸(酐)、順丁烯二酸(酐)等酸(酐)而成之單體；(甲基)丙烯酸二聚物等。 該等中，就感度之方面而言，尤佳為(甲基)丙烯酸。 作為對環氧樹脂加成α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之方法，可使用公知之方法。例如，可於酯化觸媒之存在下，於50～150℃之溫度下使α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯與環氧樹脂進行反應。作為此處所使用之酯化觸媒，可使用：三乙胺、三甲胺、苄基二甲基胺、苄基二乙基胺等三級胺；四甲基氯化銨、四乙基氯化銨、十二烷基三甲基氯化銨等四級銨鹽等。 再者，環氧樹脂、α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯、及酯化觸媒均可單獨使用一種，亦可將兩種以上併用。 α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之使用量相對於環氧樹脂之環氧基1當量，較佳為0.5～1.2當量之範圍，進而較佳為0.7～1.1當量之範圍。藉由設為上述下限值以上，有可使不飽和基之導入量充分，且使後續之與多元酸及/或其酐之反應亦充分之傾向。又，藉由設為上述上限值以下，有可抑制α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯作為未反應物殘存之情況之傾向。 作為多元酸及/或其酐，可列舉選自順丁烯二酸、丁二酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸、及該等之酐等中之一種或兩種以上。 較佳為順丁烯二酸、丁二酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸、或該等之酐。尤佳為四氫鄰苯二甲酸、聯苯四羧酸、無水四氫鄰苯二甲酸、或聯苯四羧酸二酐。 關於多元酸及/或其酐之加成反應，亦可使用公知之方法，可於與對環氧樹脂進行之α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之加成反應同樣之條件下繼續反應而獲得目標物。多元酸及/或其酐成分之加成量較佳為所產生之含羧基之環氧(甲基)丙烯酸酯樹脂之酸值成為10～150 mgKOH/g之範圍之程度，進而較佳為成為20～140 mgKOH/g之範圍之程度。藉由設為上述下限值以上，有鹼性顯影性變得良好之傾向，又，藉由設為上述上限值以下，有硬化性能變得良好之傾向。 再者，於該多元酸及/或其酐之加成反應時，可添加三羥甲基丙烷、季戊四醇、二季戊四醇等多官能醇而製成導入多分支結構者。 含羧基之環氧(甲基)丙烯酸酯樹脂通常藉由在環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物中混合多元酸及/或其酐後，或者在環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物中混合多元酸及/或其酐及多官能醇後進行加溫而獲得。於該情形時，多元酸及/或其酐與多官能醇之混合順序並無特別限制。藉由加溫，多元酸及/或其酐對環氧樹脂與α,β-不飽和單羧酸或具有羧基之α,β-不飽和單羧酸酯之反應物及多官能醇之混合物中所存在之任一羥基進行加成反應。 含羧基之環氧(甲基)丙烯酸酯樹脂所含之重複單元之化學結構並無特別限定，例如可列舉以下所示之化學結構。 [化12][化13][化14][化15]其中於上述式(C-1)～(C-15)中，X表示以下之結構。 [化16](上述結構X中之R11 表示氫原子或甲基，Y表示氫原子或多元酸之殘基。又，多元酸亦可互相交聯) 作為含羧基之環氧(甲基)丙烯酸酯樹脂，除了上文所述者以外，可列舉韓國公開專利第10-2013-0022955號公報所記載者等。 環氧(甲基)丙烯酸酯樹脂之藉由凝膠滲透層析法(GPC)測得之聚苯乙烯換算之重量平均分子量(Mw)通常為1000以上，較佳為2000以上，更佳為3000以上，進而較佳為4000以上，尤佳為5000以上，且通常為10000以下，較佳為8000以下，更佳為7000以下。藉由設為上述下限值以上，有可靠性良化之傾向，又，藉由設為上述上限值以下，有溶解性變得良好之傾向。 環氧(甲基)丙烯酸酯樹脂之酸值並無特別限定，較佳為10 mg・KOH/g以上，更佳為20 mg・KOH/g以上，進而較佳為40 mg・KOH/g以上，進而更佳為60 mg・KOH/g以上，尤佳為80 mg・KOH/g以上，又，較佳為200 mg・KOH/g以下，更佳為150 mg・KOH/g以下，進而較佳為120 mg・KOH/g以下，尤佳為100 mg・KOH/g以下。藉由設為上述下限值以上，有可獲得適度之顯影溶解性之傾向，又，藉由設為上述上限值以下，有可抑制過分進行顯影而發生膜溶解之情況之傾向。 環氧(甲基)丙烯酸酯樹脂之化學結構並無特別限定，就可靠性之觀點而言，較佳為含有具有下述通式(b-I-I)所表示之重複單元結構之環氧(甲基)丙烯酸酯樹脂(以下有時簡記為「(b-I-I)環氧(甲基)丙烯酸酯樹脂」)及/或具有下述通式(b-I-II)所表示之部分結構之環氧(甲基)丙烯酸酯樹脂(以下有時簡記為「(b-I-II)環氧(甲基)丙烯酸酯樹脂」)。 [化17]式(b-I-I)中，R11 表示氫原子或甲基，R12 表示可具有取代基之二價烴基。式(b-I-I)中之苯環可進一步經任意取代基取代。﹡表示鍵結鍵。 [化18]式(b-I-II)中，R13 分別獨立地表示氫原子或甲基。R14 表示具有環狀烴基作為側鏈之二價烴基。R15 及R16 分別獨立地表示可具有取代基之二價脂肪族基。m及n分別獨立地表示0～2之整數。﹡表示鍵結鍵。 ＜(b-I-I)環氧(甲基)丙烯酸酯樹脂＞ 首先，對具有上述通式(b-I-I)所表示之重複單元結構之環氧(甲基)丙烯酸酯樹脂進行詳細說明。 [化19]式(b-I-I)中，R11 表示氫原子或甲基，R12 表示可具有取代基之二價烴基。式(b-I-I)中之苯環可進一步經任意取代基取代。﹡表示鍵結鍵。 (R12 ) 於上述式(b-I-I)中，R12 表示可具有取代基之二價烴基。 作為二價烴基，可列舉：二價脂肪族基、二價芳香族環基、將1個以上之二價脂肪族基與1個以上之二價芳香族環基連結而成之基。 二價脂肪族基可列舉直鏈狀、支鏈狀、環狀者。該等中，就顯影溶解性之觀點而言，較佳為直鏈狀者，另一方面，就減少顯影液對曝光部之滲透之觀點而言，較佳為環狀者。其碳數通常為1以上，較佳為3以上，更佳為6以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為二價之直鏈狀脂肪族基之具體例，可列舉：亞甲基、伸乙基、伸正丙基、伸正丁基、伸正戊基、伸正己基、伸正庚基等。該等中，就骨架之剛直性之觀點而言，較佳為亞甲基。 作為二價之支鏈狀脂肪族基，可列舉上文所述之二價之直鏈狀脂肪族基具有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等作為側鏈之結構。 二價之環狀脂肪族基所具有之環數並無特別限定，通常為1以上，較佳為2以上，又，通常為12以下，較佳為10以下。藉由設為上述下限值以上，有成為強固之膜，基板密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。作為二價之環狀脂肪族基之具體例，可列舉自環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環、二環戊二烯等環中去除2個氫原子而成之基。該等中，就骨架之剛直性之觀點而言，較佳為自二環戊二烯環、金剛烷環中去除2個氫原子而成之基。 作為二價脂肪族基可具有之取代基，可列舉：羥基、甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等中，就合成容易性之觀點而言，較佳為未經取代。 又，作為二價芳香族環基，可列舉二價芳香族烴環基及二價雜芳香環基。其碳數通常為4以上，較佳為5以上，更佳為6以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為二價芳香族烴環基中之芳香族烴環，可為單環，亦可為縮合環，例如可列舉具有1個自由原子價之苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、環、聯三伸苯環、苊環、螢蒽環、茀環等之基。又，作為雜芳香環基中之雜芳香環，可為單環，亦可為縮合環，例如可列舉具有1個自由原子價之呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡??環、嗒??環、嘧啶環、三??環、喹啉環、異喹啉環、啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等之基。該等中，就圖案化特性之觀點而言，較佳為苯環或萘環，更佳為苯環。 作為二價芳香族環基可具有之取代基，可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。該等中，就顯影溶解性、耐吸濕性之觀點而言，較佳為未經取代。 又，作為將1個以上之二價脂肪族基與1個以上之二價芳香族環基連結而成之基，可列舉將1個以上之上文所述之二價脂肪族基與1個以上之上文所述之二價芳香族環基連結而成之基。 二價脂肪族基之個數並無特別限定，通常為1以上，較佳為2以上，且通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 二價芳香族環基之個數並無特別限定，通常為1以上，較佳為2以上，且通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為將1個以上之二價脂肪族基與1個以上之二價芳香族環基連結而成之基之具體例，可列舉下述式(b-I-I-A)～(b-I-I-F)所表示之基等。該等中，就骨架之剛直性與膜之疏水化之觀點而言，較佳為下述式(b-I-I-A)所表示之基。 [化20]如上所述，式(b-I-I)中之苯環可進一步經任意取代基取代。作為該取代基，例如可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。取代基之個數亦無特別限定，可為1個，亦可為2個以上。 該等中，就圖案化特性之觀點而言，較佳為未經取代。 又，上述式(b-I-I)所表示之重複單元結構就合成之簡易性之觀點而言，較佳為下述式(b-I-I-1)所表示之重複單元結構。 [化21]式(b-I-I-1)中，R11 及R12 與上述式(b-I-I)中者含義相同。RX 表示氫原子或多元酸殘基。﹡表示鍵結鍵。式(b-I-I-1)中之苯環可進一步經任意取代基取代。 所謂多元酸殘基意指自多元酸或其酐中去除1個OH基而成之一價基。作為多元酸，可列舉選自順丁烯二酸、丁二酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸中之一種或兩種以上。 該等中，就圖案化特性之觀點而言，較佳為順丁烯二酸、丁二酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸，更佳為四氫鄰苯二甲酸、聯苯四羧酸、四氫鄰苯二甲酸、聯苯四羧酸。 (b-I-I)環氧(甲基)丙烯酸酯樹脂1分子中所含之上述式(b-I-I-1)所表示之重複單元結構可為一種，亦可為兩種以上，例如可混合存在RX 為氫原子者與RX 為多元酸殘基者。 又，(b-I-I)環氧(甲基)丙烯酸酯樹脂1分子中所含之上述式(b-I-I)所表示之重複單元結構之數量並無特別限定，較佳為1以上，更佳為3以上，又，較佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 (b-I-I)環氧(甲基)丙烯酸酯樹脂之藉由凝膠滲透層析法(GPC)測得之聚苯乙烯換算之重量平均分子量(Mw)並無特別限定，較佳為1000以上，更佳為1500以上，進而較佳為2000以上，進而更佳為3000以上，尤佳為4000以上，最佳為5000以上，又，較佳為30000以下，更佳為20000以下，進而較佳為10000以下，尤佳為8000以下。藉由設為上述下限值以上，有感光性著色組合物之殘膜率變得良好之傾向，又，藉由設為上述上限值以下，有解像性變得良好之傾向。 (b-I-I)環氧(甲基)丙烯酸酯樹脂之酸值並無特別限定，較佳為10 mgKOH/g以上，更佳為20 mgKOH/g以上，進而較佳為40 mgKOH/g以上，進而更佳為50 mgKOH/g以上，尤佳為80 mgKOH/g以上，又，較佳為200 mgKOH/g以下，更佳為150 mgKOH/g以下，進而更佳為130 mgKOH/g以下，尤佳為100 mgKOH/g以下。藉由設為上述下限值以上，有顯影溶解性提高，解像性變得良好之傾向，又，藉由設為上述上限值以下，有感光性著色組合物之殘膜率變得良好之傾向。 以下列舉(b-I-I)環氧(甲基)丙烯酸酯樹脂之具體例。再者，例中之﹡表示鍵結鍵。 [化22][化23][化24][化25]＜(b-I-II)環氧(甲基)丙烯酸酯樹脂＞ 繼而，對具有上述通式(b-I-II)所表示之部分結構之環氧(甲基)丙烯酸酯樹脂進行詳細說明。 [化26]式(b-I-II)中，R13 分別獨立地表示氫原子或甲基。R14 表示具有環狀烴基作為側鏈之二價烴基。R15 及R16 分別獨立地表示可具有取代基之二價脂肪族基。m及n分別獨立地表示0～2之整數。﹡表示鍵結鍵。 (R14 ) 於上述通式(b-I-II)中，R14 表示具有環狀烴基作為側鏈之二價烴基。 作為環狀烴基，可列舉脂肪族環基或芳香族環基。 脂肪族環基所具有之環數並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 又，脂肪族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為脂肪族環基中之脂肪族環之具體例，可列舉：環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等。該等中，就感光性著色組合物之殘膜率與解像性之觀點而言，較佳為金剛烷環。 另一方面，芳香族環基所具有之環數並無特別限定，通常為1以上，較佳為2以上，更佳為3以上，又，通常為10以下，較佳為5以下，更佳為4以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為芳香族環基，可列舉芳香族烴環基、雜芳香環基。又，芳香族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，進而更佳為10以上，尤佳為12以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。 作為芳香族環基中之芳香族環之具體例，可列舉：苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、環、聯三伸苯環、苊環、螢蒽環、茀環等。該等中，就圖案化特性之觀點而言，較佳為茀環。 又，具有環狀烴基作為側鏈之二價烴基中之二價烴基並無特別限定，例如可列舉二價脂肪族基、二價芳香族環基、將1個以上之二價脂肪族基與1個以上之二價芳香族環基連結而成之基。 二價脂肪族基可列舉直鏈狀、支鏈狀、環狀者。該等中，就顯影溶解性之觀點而言，較佳為直鏈狀者，另一方面，就減少顯影液對曝光部之滲透之觀點而言，較佳為環狀者。其碳數通常為1以上，較佳為3以上，更佳為6以上，又，較佳為25以下，更佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為二價之直鏈狀脂肪族基之具體例，可列舉：亞甲基、伸乙基、伸正丙基、伸正丁基、伸正戊基、伸正己基、伸正庚基等。該等中，就骨架之剛直性之觀點而言，較佳為亞甲基。 作為二價之支鏈狀脂肪族基，可列舉上文所述之二價之直鏈狀脂肪族基具有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等作為側鏈之結構。 二價之環狀脂肪族基所具有之環數並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下，進而較佳為3以下。藉由設為上述下限值以上，有成為強固之膜，基板密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。作為二價之環狀脂肪族基之具體例，可列舉自環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等環中去除2個氫原子而成之基。該等中，就骨架之剛直性之觀點而言，較佳為自金剛烷環中去除2個氫原子而成之基。 作為二價脂肪族基可具有之取代基，可列舉：羥基、甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等中，就合成容易性之觀點而言，較佳為未經取代。 又，作為二價芳香族環基，可列舉二價芳香族烴環基及二價雜芳香環基。其碳數通常為4以上，較佳為5以上，更佳為6以上，又，較佳為30以下，更佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為二價芳香族烴環基中之芳香族烴環，可為單環，亦可為縮合環，例如可列舉具有1個自由原子價之苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、環、聯三伸苯環、苊環、螢蒽環、茀環等之基。又，作為雜芳香環基中之雜芳香環，可為單環，亦可為縮合環，例如可列舉具有1個自由原子價之呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡??環、嗒??環、嘧啶環、三??環、喹啉環、異喹啉環、啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等之基。該等中，就圖案化特性之觀點而言，較佳為苯環或萘環，更佳為茀環。 作為二價芳香族環基可具有之取代基，可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。該等中，就顯影溶解性之觀點而言，較佳為未經取代。 又，作為將1個以上之二價脂肪族基與1個以上之二價芳香族環基連結而成之基，可列舉將1個以上之上文所述之二價脂肪族基與1個以上之上文所述之二價芳香族環基連結而成之基。 二價脂肪族基之個數並無特別限定，通常為1以上，較佳為2以上，且通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 二價芳香族環基之個數並無特別限定，通常為1以上，較佳為2以上，且通常為10以下，較佳為5以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為將1個以上之二價脂肪族基與1個以上之二價芳香族環基連結而成之基之具體例，可列舉上述式(b-I-I-A)～(b-I-I-F)所表示之基等。該等中，就骨架之剛直性與膜之疏水化之觀點而言，較佳為上述式(b-I-I-C)所表示之基。 作為側鏈之環狀烴基於該等二價烴基上之鍵結態樣並無特別限定，例如可列舉以該側鏈取代脂肪族基或芳香族環基之1個氫原子而成之態樣、或包括脂肪族基之1個碳原子在內而構成作為側鏈之環狀烴基之態樣。 (R15 、R16 ) 於上述通式(b-I-II)中，R15 及R16 分別獨立地表示可具有取代基之二價脂肪族基。 二價脂肪族基可列舉直鏈狀、支鏈狀、環狀者。該等中，就顯影溶解性之觀點而言，較佳為直鏈狀者，另一方面，就減少顯影液對曝光部之滲透之觀點而言，較佳為環狀者。其碳數通常為1以上，較佳為3以上，更佳為6以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，與基板之密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為二價之直鏈狀脂肪族基之具體例，可列舉：亞甲基、伸乙基、伸正丙基、伸正丁基、伸正戊基、伸正己基、伸正庚基等。該等中，就骨架之剛直性之觀點而言，較佳為亞甲基。 作為二價之支鏈狀脂肪族基，可列舉上文所述之二價之直鏈狀脂肪族基具有甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基等作為側鏈之結構。 二價之環狀脂肪族基所具有之環數並無特別限定，通常為1以上，較佳為2以上，又，通常為12以下，較佳為10以下。藉由設為上述下限值以上，有成為強固之膜，基板密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。作為二價之環狀脂肪族基之具體例，可列舉自環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環、二環戊二烯等環中去除2個氫原子而成之基。該等中，就骨架之剛直性之觀點而言，較佳為自二環戊二烯環、金剛烷環中去除2個氫原子而成之基。 作為二價脂肪族基可具有之取代基，可列舉：羥基、甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等中，就合成容易性之觀點而言，較佳為未經取代。 (m、n) 於上述通式(b-I-II)中，m及n表示0～2之整數。藉由設為上述下限值以上，有精確圖案化變得良好，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有顯影性變得良好之傾向。就顯影性之觀點而言，較佳為m及n為0，另一方面，就精確圖案化、表面粗糙之觀點而言，較佳為m及n為1以上。 又，上述通式(b-I-II)所表示之部分結構就與基板之密接性之觀點而言，較佳為下述通式(b-I-II-1)所表示之部分結構。 [化27]式(b-I-II-1)中，R13 、R15 、R16 、m及n與上述式(b-I-II)含義相同。Rα 表示可具有取代基之一價之環狀烴基。p為1以上之整數。式(b-I-II-1)中之苯環可進一步經任意取代基取代。﹡表示鍵結鍵。 (Rα ) 於上述通式(b-I-II-1)中，Rα 表示可具有取代基之一價之環狀烴基。 作為環狀烴基，可列舉脂肪族環基或芳香族環基。 脂肪族環基所具有之環數並無特別限定，通常為1以上，較佳為2以上，又，通常為6以下，較佳為4以下，更佳為3以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。 又，脂肪族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。 作為脂肪族環基中之脂肪族環之具體例，可列舉：環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等。該等中，就強固之膜特性之觀點而言，較佳為金剛烷環。 另一方面，芳香族環基所具有之環數並無特別限定，通常為1以上，較佳為2以上，更佳為3以上，又，通常為10以下，較佳為5以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。 作為芳香族環基，可列舉芳香族烴環基、雜芳香環基。又，芳香族環基之碳數通常為4以上，較佳為5以上，更佳為6以上，又，較佳為30以下，更佳為20以下，進而較佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有圖案化特性變得良好之傾向。 作為芳香族環基中之芳香族環之具體例，可列舉：苯環、萘環、蒽環、菲環、茀環等。該等中，就顯影溶解性之觀點而言，較佳為茀環。 作為環狀烴基可具有之取代基，可列舉：羥基、甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等中，就合成之容易性之觀點而言，較佳為未經取代。 p表示1以上之整數，較佳為2以上，又，較佳為3以下。藉由設為上述下限值以上，有膜硬化度與殘膜率變得良好之傾向，又，藉由設為上述上限值以下，有顯影性變得良好之傾向。 該等中，就強固之膜硬化度之觀點而言，較佳為Rα 為一價脂肪族環基，更佳為金剛烷基。 如上所述，式(b-I-II-1)中之苯環可進一步經任意取代基取代。作為該取代基，例如可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。取代基之個數亦無特別限定，可為1個，亦可為2個以上。 該等中，就圖案化特性之觀點而言，較佳為未經取代。 以下列舉上述式(b-I-II-1)所表示之部分結構之具體例。 [化28][化29][化30][化31][化32]又，上述通式(b-I-II)所表示之部分結構就骨架之剛直性、及膜疏水化之觀點而言，較佳為下述通式(b-I-II-2)所表示之部分結構。 [化33]式(b-I-II-2)中，R13 、R15 、R16 、m及n與上述式(b-I-II)含義相同。Rβ 表示可具有取代基之二價之環狀烴基。式(b-I-II-2)中之苯環可進一步經任意取代基取代。﹡表示鍵結鍵。 (Rβ ) 於上述式(b-I-II-2)中，Rβ 表示可具有取代基之二價之環狀烴基。 作為環狀烴基，可列舉脂肪族環基或芳香族環基。 脂肪族環基所具有之環數並無特別限定，通常為1以上，較佳為2以上，又，通常為10以下，較佳為5以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 又，脂肪族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，又，較佳為40以下，更佳為35以下，進而較佳為30以下。藉由設為上述下限值以上，有抑制顯影時之膜粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差及顯影時之膜減少，提高解像性之傾向。 作為脂肪族環基中之脂肪族環之具體例，可列舉：環己烷環、環庚烷環、環癸烷環、環十二烷環、降烷環、異烷環、金剛烷環、環十二烷環等。該等中，就保存穩定性之觀點而言，較佳為金剛烷環。 另一方面，芳香族環基所具有之環數並無特別限定，通常為1以上，較佳為2以上，更佳為3以上，又，通常為10以下，較佳為5以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差或膜減少，解像性提高之傾向。 作為芳香族環基，可列舉芳香族烴環基、雜芳香環基。又，芳香族環基之碳數通常為4以上，較佳為6以上，更佳為8以上，進而較佳為10以上，又，較佳為40以下，更佳為30以下，進而較佳為20以下，尤佳為15以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差或膜減少，解像性提高之傾向。 作為芳香族環基中之芳香族環之具體例，可列舉：苯環、萘環、蒽環、菲環、茀環等。該等中，就顯影性之觀點而言，較佳為茀環。 作為環狀烴基可具有之取代基，可列舉：羥基、甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、異戊基等碳數1～5之烷基；甲氧基、乙氧基等碳數1～5之烷氧基；羥基；硝基；氰基；羧基等。該等中，就合成之簡易性之觀點而言，較佳為未經取代。 該等中，就保存穩定性及電特性之觀點而言，Rβ 較佳為二價脂肪族環基，更佳為二價金剛烷環基。 另一方面，就塗膜之低吸濕性及圖案化特性之觀點而言，Rβ 較佳為二價芳香族環基，更佳為二價茀環基。 如上所述，式(b-I-II-2)中之苯環可進一步經任意取代基取代。作為該取代基，例如可列舉：羥基、甲基、甲氧基、乙基、乙氧基、丙基、丙氧基等。取代基之個數亦無特別限定，可為1個，亦可為2個以上。 又，2個苯環可經由取代基而連結。作為該情形時之取代基，可列舉：-O-、-S-、-NH-、-CH2 -等二價基。 該等中，就圖案化特性之觀點而言，較佳為未經取代。又，就使膜減少等不易產生之觀點而言，較佳為甲基取代。 以下列舉上述式(b-I-II-2)所表示之部分結構之具體例。再者，例中之﹡表示鍵結鍵。 [化34][化35][化36][化37]另一方面，上述式(b-I-II)所表示之部分結構就塗膜殘膜率與圖案化特性之觀點而言，較佳為下述式(b-I-II-3)所表示之部分結構。 [化38]式(b-I-II-3)中，R13 、R14 、R15 、R16 、m及n與上述式(b-I-II)含義相同。RZ 表示氫原子或多元酸殘基。 所謂多元酸殘基意指自多元酸或其酐中去除1個OH基而成之一價基。再者，亦可進而再去除1個OH基，而與式(b-I-II-3)所表示之其他分子中之RZ 共用，即可經由RZ 連結複數個式(b-I-II-3)。 作為多元酸，可列舉選自順丁烯二酸、丁二酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、二苯甲酮四羧酸、甲基六氫鄰苯二甲酸、內亞甲基四氫鄰苯二甲酸、氯菌酸、甲基四氫鄰苯二甲酸、聯苯四羧酸中之一種或兩種以上。 該等中，就圖案化特性之觀點而言，較佳為順丁烯二酸、丁二酸、伊康酸、鄰苯二甲酸、四氫鄰苯二甲酸、六氫鄰苯二甲酸、均苯四甲酸、偏苯三甲酸、聯苯四羧酸，更佳為四氫鄰苯二甲酸、聯苯四羧酸、四氫鄰苯二甲酸、聯苯四羧酸。 (b-I-II)環氧(甲基)丙烯酸酯樹脂1分子中所含之上述式(b-I-II-3)所表示之部分結構可為一種，亦可為兩種以上，例如可混合存在RZ 為氫原子者與RZ 為多元酸殘基者。 又，(b-I-II)環氧(甲基)丙烯酸酯樹脂1分子中所含之上述式(b-I-II)所表示之部分結構之數量並無特別限定，較佳為1以上，更佳為3以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下。藉由設為上述下限值以上，有容易獲得強固之膜，不易產生表面粗糙，電特性變得良好之傾向，又，藉由設為上述上限值以下，有容易抑制感度變差或膜減少，解像性提高之傾向。 (b-I-II)環氧(甲基)丙烯酸酯樹脂之藉由凝膠滲透層析法(GPC)測得之聚苯乙烯換算之重量平均分子量(Mw)並無特別限定，較佳為1000以上，更佳為2000以上，又，較佳為30000以下，更佳為20000以下，進而較佳為10000以下，進而更佳為7000以下，尤佳為5000以下。藉由設為上述下限值以上，有圖案化特性變得良好之傾向，又，藉由設為上述上限值以下，有容易獲得強固之膜，不易產生表面粗糙之傾向。 (b-I-II)環氧(甲基)丙烯酸酯樹脂之酸值並無特別限定，較佳為10 mgKOH/g以上，更佳為20 mgKOH/g以上，進而較佳為40 mgKOH/g以上，進而更佳為60 mgKOH/g以上，尤佳為80 mgKOH/g以上，最佳為100 mgKOH/g以上，又，較佳為200 mgKOH/g以下，更佳為150 mgKOH/g以下，進而較佳為120 gKOH/g以下。藉由設為上述下限值以上，有變得容易獲得強固之膜之傾向，又，藉由設為上述上限值以下，有顯影溶解性提高，解像性變得良好之傾向。 ＜(b-II)含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂＞ (b-II)(甲基)丙烯酸系共聚合樹脂含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β。認為藉由具有重複單元α，可確保可靠性，又，認為藉由具有重複單元β，可將表面平滑性良化。 重複單元α只要為側鏈具有乙烯性不飽和鍵者，則無特別限定，例如，可列舉下述通式(I)所表示之化學結構者。 [化39]上述式(I)中，R1 及R2 分別獨立地表示氫原子或甲基。R3 表示二價連結基。 作為二價連結基，可列舉可具有取代基之伸烷基或可具有取代基之二價芳香族環基。 作為伸烷基，可列舉直鏈狀、支鏈狀或環狀之伸烷基。其碳數較佳為1以上，更佳為2以上，進而較佳為3以上，又，較佳為20以下，更佳為15以下，進而較佳為10以下，進而更佳為8以下，尤佳為5以下。藉由設為上述下限值以上，有反應性提高之傾向，又，藉由設為上述上限值以下，有熱流動性減少之傾向。 作為伸烷基之具體例，可列舉：亞甲基、伸乙基、伸丙基、伸丁基、伸異丁基、伸環己基等。該等中，就反應性之觀點而言，較佳為亞甲基、伸乙基或伸丙基，更佳為伸丙基。 作為二價芳香族環基，可列舉二價芳香族烴環基及二價雜芳香環基。其碳數較佳為4以上，更佳為5以上，進而較佳為6以上，又，較佳為30以下，更佳為20以下，進而較佳為15以下，尤佳為10以下。藉由設為上述下限值以上，有反應性提高之傾向，又，藉由設為上述上限值以下，有熱流動性減少之傾向。 作為芳香族烴環基中之芳香族烴環，可為單環，亦可為縮合環，例如可列舉：苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、環、聯三伸苯環、苊環、螢蒽環、茀環等之基。 又，作為雜芳香環基中之雜芳香環基，可為單環，亦可為縮合環，例如可列舉：呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡??環、嗒??環、嘧啶環、三??環、喹啉環、異喹啉環、啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等之基。 又，作為伸烷基及二價芳香族環基可具有之取代基，可列舉鹵素原子、苯基、羥基、羧基等，該等中，就反應性之觀點而言，較佳為羥基。 又，作為上述通式(I)所表示之化學結構，就反應性之觀點而言，較佳為下述通式(I-1)或(I-2)所表示之化學結構，更佳為下述通式(I-1)所表示之化學結構。 [化40]上述式(I-1)及式(I-2)中，R1 表示氫原子或甲基。 上述通式(I-1)或(I-2)所表示之化學結構可藉由對源自(甲基)丙烯酸之重複單元加成含環氧基之不飽和化合物而形成。 另一方面，作為源自不飽和羧酸之重複單元β，例如可列舉：源自丙烯酸之重複單元、源自甲基丙烯酸之重複單元、源自丁烯酸之重複單元、源自伊康酸之重複單元、源自順丁烯二酸之重複單元、源自反丁烯二酸之重複單元等，該等中，就熱流動性之觀點而言，較佳為源自丙烯酸之重複單元或源自甲基丙烯酸之重複單元，更佳為下述通式(II)所表示之化學結構者。 [化41]上述式(II)中，R3 分別獨立地表示氫原子或甲基。 又，(b-II)(甲基)丙烯酸系共聚合樹脂除了含有上述重複單元α及β以外，亦可進而含有重複單元γ。作為重複單元γ，可列舉源自(甲基)丙烯酸酯等乙烯性不飽和化合物之重複單元，例如，就可靠性或顯影時間之調整之觀點而言，較佳為具有下述式(IIIa)所表示之部分結構之重複單元。 [化42]式(IIIa)中，R1d ～R4d 分別獨立地表示氫原子、或碳數1～10之烷基，R5d 與R6d 分別獨立地表示氫原子、或碳數1～10之烷基。又，R5d 與R6d 可連結而形成環。R5d 與R6d 連結而形成之環較佳為脂肪族環，可為飽和或不飽和之任一種，較佳為碳數5～6。 R1d ～R4d 中之烷基之碳數通常為1以上，且通常為10以下，較佳為8以下，更佳為5以下。藉由設為上述上限值以下，有成為適當之顯影溶解性之傾向。 該等中，就溶解性之觀點而言，R1d ～R4d 較佳為氫原子。 R5d 及R6d 中之烷基之碳數通常為1以上，又，通常為10以下，較佳為8以下，更佳為5以下。藉由設為上述下限值以上，有表現出適當之溶解性之傾向，又，藉由設為上述上限值以下，有保持親水性之傾向。 該等中，就顯影溶解性之觀點而言，較佳為R5d 及R6d 為氫原子，或R5d 及R6d 連結而形成碳數5～6之脂肪族環。 於上述式(IIIa)中，較佳為具有下述式(IIIb)、(IIIc)、或(IIId)所表示之結構者。藉由導入該等部分結構，有可增加耐熱性或強度之傾向。 [化43]作為具有上述式(IIIa)所表示之部分結構之重複單元，就硬化性之觀點而言，較佳為下述式(III)所表示者。 [化44]式(III)中，R4 表示氫原子或甲基，R5 表示上述之式(IIIa)所表示之部分結構。 另一方面，作為成為重複單元γ之來源之乙烯性不飽和化合物，除了具有上述之式(IIIa)所表示之部分結構之(甲基)丙烯酸酯以外，例如亦可列舉：苯乙烯之α-烷基、鄰烷基、間烷基、對烷基、硝基、氰基、醯胺、酯衍生物等苯乙烯類；丁二烯、2,3-二甲基丁二烯、異戊二烯、氯丁二烯等二烯類；(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-甲基環己酯、(甲基)丙烯酸二環己酯、(甲基)丙烯酸異基酯、(甲基)丙烯酸金剛烷基酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸炔丙酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸萘酯、(甲基)丙烯酸蒽酯、(甲基)丙烯酸蒽醌酯、(甲基)丙烯酸向日葵基酯、(甲基)丙烯酸水楊基酯、(甲基)丙烯酸呋喃基酯、(甲基)丙烯酸糠酯、(甲基)丙烯酸四氫呋喃基酯、(甲基)丙烯酸吡喃基酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯乙基酯、(甲基)丙烯酸甲苯酯、(甲基)丙烯酸-1,1,1-三氟乙酯、(甲基)丙烯酸全氟乙酯、(甲基)丙烯酸全氟正丙酯、(甲基)丙烯酸全氟異丙酯、(甲基)丙烯酸三苯基甲酯、(甲基)丙烯酸異丙苯酯、(甲基)丙烯酸3-(N,N-二甲胺基)丙酯、(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯等(甲基)丙烯酸酯類；(甲基)丙烯醯胺、(甲基)丙烯酸N,N-二甲基醯胺、(甲基)丙烯酸N,N-二乙基醯胺、(甲基)丙烯酸N,N-二丙基醯胺、(甲基)丙烯酸N,N-二異丙基醯胺、(甲基)丙烯酸蒽基醯胺等(甲基)丙烯醯胺類；(甲基)丙烯醯替苯胺、(甲基)丙烯醯腈、丙烯醛、氯乙烯、偏二氯乙烯、氟乙烯、偏二氟乙烯、N-乙烯基吡咯啶酮、乙烯基吡啶、乙酸乙烯酯等乙烯基化合物類；檸康酸二乙酯、順丁烯二酸二乙酯、反丁烯二酸二乙酯、伊康酸二乙酯等不飽和二羧酸二酯類；N-苯基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺、N-月桂基順丁烯二醯亞胺、N-(4-羥基苯基)順丁烯二醯亞胺等單順丁烯二醯亞胺類；N-(甲基)丙烯醯基鄰苯二甲醯亞胺等之類的自由基聚合性化合物。 該等中，為了賦予更優異之耐熱性及強度，有效的是使用選自苯乙烯、(甲基)丙烯酸苄酯及單順丁烯二醯亞胺中之至少一種作為乙烯性不飽和化合物。 (b-II)(甲基)丙烯酸系共聚合樹脂之製造方法並無特別限定，可藉由使分別與重複單元α～γ相對應之(甲基)丙烯酸酯化合物進行共聚合而獲得。又，亦可藉由首先獲得(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸α-乙基縮水甘油酯、(甲基)丙烯酸3,4-環氧丁酯、甲基(甲基)丙烯酸3,4-環氧環己酯、(甲基)丙烯酸4-羥基丁酯縮水甘油醚等含環氧基之(甲基)丙烯酸酯與(甲基)丙烯酸、(甲基)丙烯酸酯等乙烯性不飽和化合物之共聚物，並且對該共聚物所含之環氧基加成乙烯性不飽和單羧酸之方法而獲得。 (b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元α之含有比例通常為10莫耳%以上，較佳為12莫耳%以上，更佳為15莫耳%以上，進而較佳為18莫耳%以上，進而更佳為20莫耳%以上，尤佳為22莫耳%以上，最佳為25莫耳%以上，又，較佳為40莫耳%以下，更佳為35莫耳%以下，進而較佳為30莫耳%以下，進而更佳為25莫耳%以下。藉由設為上述下限值以上，有容易確保可靠性之傾向，又，藉由設為上述上限值以下，有容易確保表面平滑性之傾向。 又，(b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元β之含有比例較佳為20莫耳%以上，更佳為30莫耳%以上，進而較佳為40莫耳%以上，最佳為50莫耳%以上，又，較佳為70莫耳%以下，更佳為60莫耳%以下，進而較佳為50莫耳%以下。藉由設為上述下限值以上，有容易確保顯影溶解性之傾向，又，藉由設為上述上限值以下，有容易確保可靠性之傾向。 又，(b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元γ之含有比例通常為0莫耳%以上，較佳為10莫耳%以上，更佳為20莫耳%以上，進而較佳為30莫耳%以上，又，較佳為60莫耳%以下，更佳為50莫耳%以下，進而較佳為40莫耳%以下。藉由設為上述下限值以上，有密接性變得良好之傾向，又，藉由設為上述上限值以下，有容易確保可靠性之傾向。 (b-II)(甲基)丙烯酸系共聚合樹脂之藉由凝膠滲透層析法(GPC)測得之聚苯乙烯換算之重量平均分子量(Mw)通常為3000以上，較佳為5000以上，更佳為10000以上，進而較佳為15000以上，且通常為50000以下，較佳為30000以下，更佳為20000以下。藉由設為上述下限值以上，有可靠性變得良好之傾向，又，藉由設為上述上限值以下，有顯影溶解性變得良好之傾向。 (b-II)(甲基)丙烯酸系共聚合樹脂之酸值並無特別限定，較佳為100 mg・KOH/g以上，更佳為130 mg・KOH/g以上，進而較佳為160 mg・KOH/g以上，尤佳為180 mg・KOH/g以上，又，較佳為400 mg・KOH/g以下，更佳為300 mg・KOH/g以下，進而較佳為200 mg・KOH/g以下。藉由設為上述下限值以上，有變得容易確保顯影溶解性之傾向，又，藉由設為上述上限值以下，有變得容易確保可靠性之傾向。 於本發明之感光性著色組合物中，可含有一種含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(b-II)(甲基)丙烯酸系共聚合樹脂，又，亦可含有兩種以上。於含有兩種以上之情形時，就容易獲得本發明之效果之觀點而言，較佳為於至少一種以上之樹脂中該重複單元α之含有比例為上述範圍內。 又，另一方面，於其他態樣之感光性著色組合物中，於含有兩種以上之含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(b-II)(甲基)丙烯酸系共聚合樹脂之情形時，亦可以其全部種類之(b-II)(甲基)丙烯酸系共聚合樹脂之全部重複單元為基準，而使其中所含之重複單元α之含有比例成為上述範圍內。同樣地，可將重複單元β之含有比例設為以全部種類之(b-II)(甲基)丙烯酸系共聚合樹脂之全部重複單元為基準者。於含有重複單元γ之情形時，亦同樣地可將其含有比例設為以全部種類之(b-II)(甲基)丙烯酸系共聚合樹脂之全部重複單元為基準者。 ＜其他鹼可溶性樹脂＞ 本發明所使用之(b)鹼可溶性樹脂除了含有上述(b-I)環氧(甲基)丙烯酸酯樹脂及上述(b-II)(甲基)丙烯酸系共聚合樹脂以外，亦可含有其他鹼可溶性樹脂。 其他鹼可溶性樹脂並無限制，自感光性著色組合物通常所使用之樹脂中選擇即可。例如可列舉日本專利特開2007-271727號公報、日本專利特開2007-316620號公報、日本專利特開2007-334290號公報等所記載之黏合劑樹脂等。又，就與顏料或分散劑等之相容性之觀點而言，較佳為使用丙烯酸系樹脂，更佳可使用日本專利特開2014-137466號公報所記載者。 ＜(c)光聚合起始劑＞ (c)光聚合起始劑係具有直接吸收光，引起分解反應或奪氫反應，產生聚合活性自由基之功能之成分。視需要亦可添加聚合促進劑(鏈轉移劑)、增感色素等加成劑而使用。 作為光聚合起始劑，例如可列舉：日本專利特開昭59-152396號公報、日本專利特開昭61-151197號公報所記載之含有二茂鈦化合物之茂金屬化合物；日本專利特開2000-56118號公報所記載之六芳基聯咪唑衍生物；日本專利特開平10-39503號公報所記載之鹵甲基化㗁二唑衍生物、鹵甲基均三??衍生物、N-苯基甘胺酸等N-芳基-α-胺基酸類、N-芳基-α-胺基酸鹽類、N-芳基-α-胺基酸酯類等自由基活性劑、α-胺基烷基苯酮衍生物；日本專利特開2000-80068號公報、日本專利特開2006-36750號公報等所記載之肟酯衍生物等。 具體而言，例如，作為二茂鈦衍生物類，可列舉：二(環戊二烯基)二氯化鈦、二(環戊二烯基)雙苯基鈦、二(環戊二烯基)雙(2,3,4,5,6-五氟苯-1-基)鈦、二(環戊二烯基)雙(2,3,5,6-四氟苯-1-基)鈦、二(環戊二烯基)雙(2,4,6-三氟苯-1-基)鈦、二(環戊二烯基)二(2,6-二氟苯-1-基)鈦、二(環戊二烯基)二(2,4-二氟苯-1-基)鈦、二(甲基環戊二烯基)雙(2,3,4,5,6-五氟苯-1-基)鈦、二(甲基環戊二烯基)雙(2,6-二氟苯-1-基)鈦、二(環戊二烯基)[2,6-二氟-3-(吡咯-1-基)-苯-1-基]鈦等。 又，作為聯咪唑衍生物類，可列舉：2-(2'-氯苯基)-4,5-二苯基咪唑二聚物、2-(2'-氯苯基)-4,5-雙(3'-甲氧基苯基)咪唑二聚物、2-(2'-氟苯基)-4,5-二苯基咪唑二聚物、2-(2'-甲氧基苯基)-4,5-二苯基咪唑二聚物、(4'-甲氧基苯基)-4,5-二苯基咪唑二聚物等。 又，作為鹵甲基化㗁二唑衍生物類，可列舉：2-三氯甲基-5-(2'-苯并呋喃基)-1,3,4-㗁二唑、2-三氯甲基-5-[β-(2'-苯并呋喃基)乙烯基]-1,3,4-㗁二唑、2-三氯甲基-5-[β-(2'-(6"-苯并呋喃基)乙烯基)]-1,3,4-㗁二唑、2-三氯甲基-5-呋喃基-1,3,4-㗁二唑等。 又，作為鹵甲基均三??衍生物類，可列舉：2-(4-甲氧基苯基)-4,6-雙(三氯甲基)均三??、2-(4-甲氧基萘基)-4,6-雙(三氯甲基)均三??、2-(4-乙氧基萘基)-4,6-雙(三氯甲基)均三??、2-(4-乙氧基羰基萘基)-4,6-雙(三氯甲基)均三??等。 又，作為α-胺基烷基苯酮衍生物類，可列舉：2-甲基-1-[4-(甲硫基)苯基]-2-??啉基丙烷-1-酮、2-苄基-2-二甲胺基-1-(4-??啉基苯基)-丁酮-1、2-苄基-2-二甲胺基-1-(4-??啉基苯基)丁烷-1-酮、4-二甲胺基苯甲酸乙酯、4-二甲胺基苯甲酸異戊酯、4-二乙胺基苯乙酮、4-二甲胺基苯丙酮、1,4-二甲胺基苯甲酸2-乙基己酯、2,5-雙(4-二乙胺基苯亞甲基)環己酮、7-二乙胺基-3-(4-二乙胺基苯甲醯基)香豆素、4-(二乙胺基)查耳酮等。 作為光聚合起始劑，尤其是就感度或製版性之方面而言，有效的是肟酯系化合物，於使用含有酚性羥基之鹼可溶性樹脂之情形等時，就感度之方面而言變得不利，因此尤其是此種感度優異之肟酯系化合物較為有用。由於肟酯系化合物於其結構中兼具吸收紫外線之結構、傳遞光能之結構及產生自由基之結構，因此少量即感度較高，且對熱反應而言較為穩定，可以少量獲得高感度之感光性著色組合物。 作為肟酯系化合物，例如可列舉下述通式(IV)所表示之化合物。 [化45]上述式(IV)中，R21a 表示氫原子、可具有取代基之烷基、或可具有取代基之芳香族環基。 R21b 表示包含芳香環或雜芳香環之任意取代基。 R22a 表示可具有取代基之烷醯基、或可具有取代基之芳醯基。 R21a 中之烷基之碳數並無特別限定，就於溶媒中之溶解性或感度之觀點而言，通常為1以上，較佳為2以上，又，通常為20以下，較佳為15以下，更佳為10以下。作為烷基之具體例，可列舉：甲基、乙基、丙基、環戊基乙基、丙基等。 作為烷基可具有之取代基，可列舉：芳香族環基、羥基、羧基、鹵素原子、胺基、醯胺基、4-(2-甲氧基-1-甲基)乙氧基-2-甲基苯基或N-乙醯基-N-乙醯氧基胺基等，就合成容易性之觀點而言，較佳為未經取代。 作為R21a 中之芳香族環基，可列舉芳香族烴環基及雜芳香環基。芳香族環基之碳數並無特別限定，就於感光性著色組合物中之溶解性之觀點而言，較佳為5以上。又，就顯影性之觀點而言，較佳為30以下，更佳為20以下，進而較佳為12以下。 作為芳香族環基之具體例，可列舉：苯基、萘基、吡啶基、呋喃基等，該等中，就顯影性之觀點而言，較佳為苯基或萘基，更佳為苯基。 作為芳香族環基可具有之取代基，可列舉：羥基、羧基、鹵素原子、胺基、醯胺基、烷基等，就顯影性之觀點而言，較佳為羥基、羧基，更佳為羧基。 該等中，就顯影性之觀點而言，R21a 較佳為可具有取代基之烷基，更佳為未經取代之烷基，進而較佳為甲基。 又，作為R21b ，較佳可列舉可經取代之咔唑基、可經取代之9-氧硫??基或可經取代之二苯硫醚基。該等中，就抑制N-甲基吡咯啶酮(NMP)溶出之觀點而言，較佳為可經取代之二苯硫醚基。 又，R22a 中之烷醯基之碳數並無特別限定，就於溶媒中之溶解性或感度之觀點而言，通常為2以上，較佳為3以上，又，通常為20以下，較佳為15以下，更佳為10以下，進而較佳為5以下。作為烷醯基之具體例，可列舉：乙醯基、羥乙基、丙醯基、丁醯基等。 作為烷醯基可具有之取代基，可列舉：芳香族環基、羥基、羧基、鹵素原子、胺基、醯胺基等，就合成容易性之觀點而言，較佳為未經取代。 又，R22a 中之芳醯基之碳數並無特別限定，就於溶媒中之溶解性或感度之觀點而言，通常為7以上，較佳為8以上，又，通常為20以下，較佳為15以下，更佳為10以下。作為芳醯基之具體例，可列舉：苯甲醯基、萘甲醯基等。 作為芳醯基可具有之取代基，可列舉：羥基、羧基、鹵素原子、胺基、醯胺基、烷基等，就合成容易性之觀點而言，較佳為未經取代。 該等中，就感度之觀點而言，R22a 較佳為可具有取代基之烷醯基，更佳為未經取代之烷醯基，進而較佳為乙醯基。 上述通式(IV)所表示之化合物中，就抑制NMP溶出之觀點而言，較佳為下述通式(V)所表示之化合物。 [化46]於上述通式(V)中，R23 表示可具有取代基之烷基、或可具有取代基之芳香族環基。 R24 表示可具有取代基之烷基、或可具有取代基之芳香族環基。 R25 表示羥基、羧基或下述通式(V-1)所表示之基，h表示0～5之整數。 式(V)中所示之苯環可進而具有取代基。 [化47]式(V-1)中，R25a 表示-O-、-S-、-OCO-或-COO-。 R25b 表示可具有取代基之伸烷基。 R25b 之伸烷基部分可被-O-、-S-、-COO-或-OCO-中斷1～5次。R25 之伸烷基部分可具有分支側鏈，亦可為伸環己基。 R25c 表示羥基或羧基。 R23 中之烷基之碳數並無特別限定，就於感光性著色組合物中之溶解性之觀點而言，較佳為1以上。又，就顯影性之觀點而言，較佳為20以下，更佳為10以下，進而較佳為8以下，進而更佳為5以下，尤佳為3以下。 作為烷基之具體例，可列舉：甲基、己基、環戊基甲基等，該等中，就顯影性之觀點而言，甲基或己基，更佳為甲基。 作為烷基可具有之取代基，可列舉：芳香族環基、羥基、羧基、鹵素原子、胺基、醯胺基等，就鹼性顯影性之觀點而言，較佳為羥基、羧基，更佳為羧基。又，就合成容易性之觀點而言，較佳為未經取代。 作為R23 中之芳香族環基，可列舉芳香族烴環基及雜芳香環基。芳香族環基之碳數並無特別限定，就於感光性著色組合物中之溶解性之觀點而言，較佳為5以上。又，就顯影性之觀點而言，較佳為30以下，更佳為20以下，進而較佳為12以下。 作為芳香族環基之具體例，可列舉：苯基、萘基、吡啶基、呋喃基等，該等中，就顯影性之觀點而言，較佳為苯基或萘基，更佳為苯基。 作為芳香族環基可具有之取代基，可列舉：羥基、羧基、鹵素原子、胺基、醯胺基、烷基等，就顯影性之觀點而言，較佳為羥基、羧基，更佳為羧基。 該等中，就顯影性之觀點而言，R23 較佳為可具有取代基之烷基，更佳為未經取代之烷基，進而較佳為甲基。 R24 中之烷基之碳數並無特別限定，就感度之觀點而言，較佳為1以上。又，就感度之觀點而言，較佳為20以下，更佳為10以下，進而較佳為5以下，尤佳為3以下。 作為烷基之具體例，可列舉：甲基、乙基、丙基等，該等中，就感度之觀點而言，較佳為甲基或乙基，更佳為甲基。 作為烷基可具有之取代基，可列舉：鹵素原子、羥基、羧基、胺基、醯胺基等，就鹼性顯影性之觀點而言，較佳為羥基、羧基，更佳為羧基，另一方面，就合成容易性之觀點而言，較佳為未經取代。 作為R24 中之芳香族環基，可列舉芳香族烴環基及雜芳香環基。其碳數較佳為30以下，更佳為12以下，且通常為4以上，較佳為6以上。藉由設為上述上限值以下，有成為高感度之傾向，藉由設為上述下限值以上，有成為低昇華性之傾向。 芳香族烴環基意指具有1個自由原子價之芳香族烴環。芳香族烴環基之芳香族烴環可為單環，亦可為縮合環，可列舉：苯環、萘環、蒽環、菲環、苝環、稠四苯環、芘環、苯并芘環、環、聯三伸苯環、苊環、螢蒽環、茀環等。 又，雜芳香環基意指具有1個自由原子價之雜芳香環。雜芳香環基之雜芳香環可為單環，亦可為縮合環，例如可列舉：呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡??環、嗒??環、嘧啶環、三??環、喹啉環、異喹啉環、啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環等。 作為芳香族環基可具有之取代基，可列舉：烷基、鹵素原子、羥基、羧基等。 該等中，就感度之觀點而言，R24 較佳為可具有取代基之烷基，更佳為未經取代之烷基，進而較佳為甲基。 另一方面，就製版性之觀點而言，R24 較佳為可具有取代基之芳香族環基，更佳為可具有取代基之芳香族烴基，進而較佳為未經取代之芳香族烴基，尤佳為苯基。 R25 為羥基、羧基或上述通式(V-1)所表示之基，該等中，就感度及顯影性之觀點而言，較佳為上述通式(V-1)所表示之基。 於上述通式(V-1)中，如上文所述，R25a 表示-O-、-S-、-OCO-或-COO-，該等中，就感度及顯影性之觀點而言，較佳為-O-或-OCO-，更佳為-O-。 如上文所述，R25b 表示可具有取代基之伸烷基。 R25b 中之伸烷基之碳數並無特別限定，就於感光性著色組合物中之溶解性之觀點而言，較佳為1以上，更佳為2以上，又，較佳為20以下，更佳為10以下，進而較佳為5以下，尤佳為3以下。 伸烷基可為直鏈，亦可進行分支，亦可為含有脂肪族環者。該等中，就於感光性著色組合物中之溶解性之觀點而言，較佳為直鏈。 作為伸烷基之具體例，可列舉：亞甲基、伸乙基、伸丙基等，該等中，就於感光性著色組合物中之溶解性之觀點而言，更佳為亞甲基。 如上文所述，R25c 為羥基或羧基。就可靠性(液晶污染性)之觀點而言，R25c 較佳為羥基。 於上述通式(V)中，h表示0～5之整數。尤其是就顯影性之觀點而言，h較佳為1以上，又，較佳為4以下，更佳為3以下，進而較佳為2以下，最佳為1。 另一方面，就合成容易性之觀點而言，h較佳為0。 作為上述通式(IV)或(V)所表示之肟酯系化合物之具體例，可列舉以下者。 [化48]上述通式(V)所表示之肟酯系化合物之製造方法並無特別限定，例如可藉由日本專利特開2000-080068號公報所記載之方法而製造。 又，作為肟酯系化合物，亦可使用上述通式(IV)或(V)以外之化合物，例如亦可使用日本專利特開2000-80068號公報、日本專利特開2006-36750號公報、國際公開第2008/075564號、國際公開第2009/131189號、日本專利特表2014-500852號公報等所記載之肟酯衍生物等。 光聚合起始劑可單獨使用一種，亦可組合兩種以上而使用。 可視需要以提高感應感度為目的，而於光聚合起始劑中調配與圖像曝光光源之波長相對應之增感色素、聚合促進劑。作為增感色素，可列舉：日本專利特開平4-221958號公報、日本專利特開平4-219756號公報所記載之??色素；日本專利特開平3-239703號公報、日本專利特開平5-289335號公報所記載之具有雜環之香豆素色素；日本專利特開平3-239703號公報、日本專利特開平5-289335號公報所記載之3-酮香豆素化合物；日本專利特開平6-19240號公報所記載之吡咯亞甲基色素；以及日本專利特開昭47-2528號公報、日本專利特開昭54-155292號公報、日本特公昭45-37377號公報、日本專利特開昭48-84183號公報、日本專利特開昭52-112681號公報、日本專利特開昭58-15503號公報、日本專利特開昭60-88005號公報、日本專利特開昭59-56403號公報、日本專利特開平2-69號公報、日本專利特開昭57-168088號公報、日本專利特開平5-107761號公報、日本專利特開平5-210240號公報、日本專利特開平4-288818號公報所記載之具有二烷基胺基苯骨架之色素等。 該等增感色素中較佳者為含胺基之增感色素，進而較佳者為於同一分子內具有胺基及苯基之化合物。尤佳者為例如：4,4'-二甲胺基二苯甲酮、4,4'-二乙胺基二苯甲酮、2-胺基二苯甲酮、4-胺基二苯甲酮、4,4'-二胺基二苯甲酮、3,3'-二胺基二苯甲酮、3,4-二胺基二苯甲酮等二苯甲酮系化合物；2-(對二甲胺基苯基)苯并㗁唑、2-(對二乙胺基苯基)苯并㗁唑、2-(對二甲胺基苯基)苯并[4,5]苯并㗁唑、2-(對二甲胺基苯基)苯并[6,7]苯并㗁唑、2,5-雙(對二乙胺基苯基)-1,3,4-㗁唑、2-(對二甲胺基苯基)苯并噻唑、2-(對二乙胺基苯基)苯并噻唑、2-(對二甲胺基苯基)苯并咪唑、2-(對二乙胺基苯基)苯并咪唑、2,5-雙(對二乙胺基苯基)-1,3,4-噻二唑、(對二甲胺基苯基)吡啶、(對二乙胺基苯基)吡啶、(對二甲胺基苯基)喹啉、(對二乙胺基苯基)喹啉、(對二甲胺基苯基)嘧啶、(對二乙胺基苯基)嘧啶等含對二烷基胺基苯基之化合物等。其中，最佳者為4,4'-二烷基胺基二苯甲酮。 又，增感色素亦為可單獨使用一種，亦可將兩種以上併用。 作為聚合促進劑，例如可使用：對二甲胺基苯甲酸乙酯、苯甲酸2-二甲胺基乙酯等芳香族胺；正丁胺、N-甲基二乙醇胺等脂肪族胺；下文所述之巰基化合物等。聚合促進劑可單獨使用一種，亦可組合兩種以上而使用。 ＜(d)乙烯性不飽和化合物＞ 本發明之感光性著色組合物含有(d)乙烯性不飽和化合物。藉由含有(d)乙烯性不飽和化合物而感度提高。 本發明所使用之乙烯性不飽和化合物係分子內具有至少1個乙烯性不飽和基之化合物。具體而言，例如可列舉：(甲基)丙烯酸、(甲基)丙烯酸烷基酯、丙烯腈、苯乙烯、及具有1個乙烯性不飽和鍵之羧酸與多元或一元醇之單酯等。 於本發明中，尤其理想為使用1分子中具有二個以上乙烯性不飽和基之多官能乙烯性單體。多官能乙烯性單體所具有之乙烯性不飽和基之個數並無特別限定，通常為2以上，較佳為4以上，更佳為5以上，又，較佳為8以下，更佳為7以下。藉由設為上述下限值以上，有成為高感度之傾向，藉由設為上述上限值以下，有於溶媒中之溶解性提高之傾向。 作為多官能乙烯性單體之例，例如可列舉：脂肪族聚羥基化合物與不飽和羧酸之酯；芳香族聚羥基化合物與不飽和羧酸之酯；藉由脂肪族聚羥基化合物、芳香族聚羥基化合物等多元羥基化合物、不飽和羧酸及多元羧酸之酯化反應獲得之酯等。 作為上述脂肪族聚羥基化合物與不飽和羧酸之酯，可列舉：乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基乙烷三丙烯酸酯、季戊四醇二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、甘油丙烯酸酯等脂肪族聚羥基化合物之丙烯酸酯、將該等例示化合物之丙烯酸酯換為甲基丙烯酸酯之甲基丙烯酸酯、同樣地替代為伊康酸酯而成之伊康酸酯、替代為丁烯酸酯而成之丁烯酸酯或替代為順丁烯二酸酯而成之順丁烯二酸酯等。 作為芳香族聚羥基化合物與不飽和羧酸之酯，可列舉：對苯二酚二丙烯酸酯、對苯二酚二甲基丙烯酸酯、間苯二酚二丙烯酸酯、間苯二酚二甲基丙烯酸酯、鄰苯三酚三丙烯酸酯等芳香族聚羥基化合物之丙烯酸酯及甲基丙烯酸酯等。 作為藉由多元羧酸及不飽和羧酸與多元羥基化合物之酯化反應而獲得之酯，未必為單一物質，若列舉具有代表性之具體例，則可列舉：丙烯酸、鄰苯二甲酸、及乙二醇之縮合物；丙烯酸、順丁烯二酸、及二乙二醇之縮合物；甲基丙烯酸、對苯二甲酸及季戊四醇之縮合物；丙烯酸、己二酸、丁二醇及甘油之縮合物等。 除此以外，作為本發明所使用之多官能乙烯性單體之例，有用的是：如使多異氰酸酯化合物與含羥基之(甲基)丙烯酸酯或使多異氰酸酯化合物與多元醇及含羥基之(甲基)丙烯酸酯進行反應而獲得之(甲基)丙烯酸胺基甲酸酯類；如多元環氧化合物與羥基(甲基)丙烯酸酯或(甲基)丙烯酸之加成反應物之環氧丙烯酸酯類；伸乙基雙丙烯醯胺等丙烯醯胺類；鄰苯二甲酸二烯丙酯等烯丙酯類；鄰苯二甲酸二乙烯酯等含乙烯基之化合物等。 作為上述(甲基)丙烯酸胺基甲酸酯類，例如可列舉：DPHA-40H、UX-5000、UX-5002D-P20、UX-5003D、UX-5005(日本化藥公司製造)、U-2PPA、U-6LPA、U-10PA、U-33H、UA-53H、UA-32P、UA-1100H(新中村化學工業公司製造)、UA-306H、UA-510H、UF-8001G(協榮社化學公司製造)、UV-1700B、UV-7600B、UV-7605B、UV-7630B、UV7640B(日本合成化學公司製造)等。 該等中，就硬化性之觀點而言，作為(d)乙烯性不飽和化合物，較佳為使用(甲基)丙烯酸烷基酯，更佳為使用二季戊四醇六丙烯酸酯。 該等可單獨使用一種，亦可將兩種以上併用。 ＜(e)溶劑＞ 本發明之感光性著色組合物含有(e)溶劑。藉由含有(e)溶劑，可使顏料分散於溶劑中，又，塗佈變得容易。 本發明之感光性著色組合物通常以(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(f)分散劑、及視需要而使用之其他各種材料溶解或分散於溶劑中之狀態而使用。溶劑中，就分散性或塗佈性之觀點而言，較佳為有機溶劑。 有機溶劑中，就塗佈性之觀點而言，較佳為選擇沸點為100～300℃之範圍者，更佳為選擇沸點為120～280℃之範圍者。再者，此處所謂之沸點意指於壓力1013.25 hPa下之沸點。 作為此種有機溶劑，例如可列舉如下者。 乙二醇單甲醚、乙二醇單乙醚、乙二醇單丙醚、乙二醇單丁醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丁醚、丙二醇第三丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丁醚、甲氧基甲基戊醇、二丙二醇單乙醚、二丙二醇單甲醚、3-甲基-3-甲氧基丁醇、三乙二醇單甲醚、三乙二醇單乙醚、三丙二醇甲醚之類的二醇單烷基醚類； 乙二醇二甲醚、乙二醇二乙醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇二丙醚、二乙二醇二丁醚、二丙二醇二甲醚之類的二醇二烷基醚類； 乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單正丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、丙二醇單丁醚乙酸酯、甲氧基乙酸丁酯、3-甲氧基乙酸丁酯、甲氧基戊基乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、二乙二醇單正丁醚乙酸酯、二丙二醇單甲醚乙酸酯、三乙二醇單甲醚乙酸酯、三乙二醇單乙醚乙酸酯、3-甲基-3-甲氧基乙酸丁酯之類的二醇烷基醚乙酸酯類； 乙二醇二乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯等二醇二乙酸酯類； 乙酸環己酯等乙酸烷基酯類； 戊基醚、二乙醚、二丙醚、二異丙醚、二丁醚、二戊醚、乙基異丁基醚、二己醚之類的醚類； 丙酮、甲基乙基酮、甲基戊基酮、甲基異丙基酮、甲基異戊基酮、二異丙基酮、二異丁基酮、甲基異丁基酮、環己酮、乙基戊基酮、甲基丁基酮、甲基己基酮、甲基壬基酮、甲氧基甲基戊酮之類的酮類； 乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、丙二醇、丁二醇、二乙二醇、二丙二醇、三乙二醇、甲氧基甲基戊醇、甘油、苄醇之類的一元或多元醇類； 正戊烷、正辛烷、二異丁烯、正己烷、己烯、異戊二烯、二戊烯、十二烷之類的脂肪族烴類； 環己烷、甲基環己烷、甲基環己烯、聯環己烷之類的脂環式烴類； 苯、甲苯、二甲苯、異丙苯之類的芳香族烴類； 甲酸戊酯、甲酸乙酯、乙酸乙酯、乙酸丁酯、乙酸丙酯、乙酸戊酯、異丁酸甲酯、乙二醇乙酸酯、丙酸乙酯、丙酸丙酯、丁酸丁酯、丁酸異丁酯、異丁酸甲酯、辛酸乙酯、硬脂酸丁酯、苯甲酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、γ-丁內酯之類的鏈狀或環狀酯類； 3-甲氧基丙酸、3-乙氧基丙酸之類的烷氧基羧酸類； 氯丁烷、氯戊烷之類的鹵化烴類； 甲氧基甲基戊酮之類的醚酮類； 乙腈、苯甲腈之類的腈類等。 作為相當於上述之市售之有機溶劑，可列舉：礦油精、Varsol#2、Apco#18溶劑、Apco稀釋劑、Socal溶劑No.1及No.2、Solvesso#150、Shell TS28溶劑、卡必醇、乙基卡必醇、丁基卡必醇、甲賽路蘇(「賽路蘇」為註冊商標；以下相同)、乙賽路蘇、乙賽路蘇乙酸酯、甲賽路蘇乙酸酯、二乙二醇二甲醚(均為商品名)等。 該等有機溶劑可單獨使用，亦可將兩種以上併用。 於藉由光微影法形成著色間隔件之情形時，較佳為選擇沸點為100～200℃(壓力1013.25 hPa條件下；以下關於沸點全部相同)之範圍者作為有機溶劑。更佳為具有120～170℃之沸點者。 上述有機溶劑中，就塗佈性、表面張力等之平衡良好，組合物中之構成成分之溶解度相對較高之方面而言，較佳為二醇烷基醚乙酸酯類。 又，二醇烷基醚乙酸酯類可單獨使用，亦可併用其他有機溶劑。作為所併用之有機溶劑，尤佳者為二醇單烷基醚類。其中，尤其是就組合物中之構成成分之溶解性而言，較佳為丙二醇單甲醚。再者，二醇單烷基醚類之極性較高，若添加量過多，則有顏料容易凝聚，其後獲得之著色樹脂組合物之黏度提高等保存穩定性降低之傾向，因此溶劑中之二醇單烷基醚類之比例較佳為5質量%～30質量%，更佳為5質量%～20質量%。 又，亦較佳為併用具有150℃以上之沸點之有機溶劑(以下有時稱為「高沸點溶劑」)。藉由併用此種高沸點溶劑，感光性著色組合物變得不易乾燥，具有防止組合物中之顏料之均勻之分散狀態因急遽之乾燥而受到破壞之效果。即，具有防止產生例如因狹縫噴嘴尖端之色料等之析出、固化引起之雜質缺陷的效果。就此種效果較高之方面而言，上述各種溶劑中，尤佳為二乙二醇單正丁醚、二乙二醇單正丁醚乙酸酯、及二乙二醇單乙醚乙酸酯。 有機溶劑中之高沸點溶劑之含有比例較佳為3質量%～50質量%，更佳為5質量%～40質量%，尤佳為5質量%～30質量%。藉由設為上述下限值以上，有可抑制例如於狹縫噴嘴尖端色料等析出、固化而引起雜質缺陷之情況之傾向，又，藉由設為上述上限值以下，有可抑制組合物之乾燥速度變慢，抑制減壓乾燥製程之觸控不良或預烘烤之氣孔痕跡等問題之傾向。 再者，沸點150℃以上之高沸點溶劑可為二醇烷基醚乙酸酯類，又，亦可為二醇烷基醚類，於該情形時，可不另外含有沸點150℃以上之高沸點溶劑。 作為較佳之高沸點溶劑，例如可列舉上文所述之各種溶劑中之二乙二醇單正丁醚乙酸酯、二乙二醇單乙醚乙酸酯、二丙二醇甲醚乙酸酯、1,3-丁二醇二乙酸酯、1,6-己醇二乙酸酯、甘油三乙酸酯等。 ＜(f)分散劑＞ 於本發明之感光性著色組合物中，由於對於確保品質之穩定性而言重要的是使(a)著色劑微細地分散，且使其分散狀態穩定，因此含有(f)分散劑。 作為(f)分散劑，較佳為具有官能基之高分子分散劑，進而就分散穩定性之方面而言，較佳為具有如下基等官能基之高分子分散劑：羧基；磷酸基；磺酸基；或該等之鹽之基；一級、二級或三級胺基；四級銨鹽基；源自吡啶、嘧啶、吡??等含氮雜環之基。其中，尤其就於分散顏料時可以少量之分散劑進行分散之觀點而言，尤佳為具有如下基等鹼性官能基之高分子分散劑：一級、二級或三級胺基；四級銨鹽基；源自吡啶、嘧啶、吡??等含氮雜環之基。 又，作為高分子分散劑，例如可列舉：胺基甲酸酯系分散劑、丙烯酸系分散劑、聚伸乙基亞胺系分散劑、聚烯丙基胺系分散劑、包含具有胺基之單體與巨單體之分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙烯二酯系分散劑、聚醚磷酸系分散劑、聚酯磷酸系分散劑、山梨糖醇酐脂肪族酯系分散劑、脂肪族改性聚酯系分散劑等。 作為此種分散劑之具體例，可列舉商品名為如下者：EFKA(註冊商標；BASF公司製造)、DISPERBYK(註冊商標；BYK-Chemie公司製造)、Disparlon(註冊商標；楠本化成公司製造)、SOLSPERSE(註冊商標；Lubrizol公司製造)、KP(信越化學工業公司製造)、Polyflow(共榮社化學公司製造)、Ajisper(註冊商標；Ajinomoto公司製造)等。 該等高分子分散劑可單獨使用一種，或者亦可將兩種以上併用。 高分子分散劑之重量平均分子量(Mw)通常為700以上，較佳為1000以上，又，通常為100,000以下，較佳為50,000以下。 該等中，就顏料之分散性之觀點而言，(f)分散劑較佳為含有具有官能基之胺基甲酸酯系高分子分散劑及/或丙烯酸系高分子分散劑，尤佳為含有丙烯酸系高分子分散劑。 又，就分散性、保存性之方面而言，較佳為具有鹼性官能基且具有聚酯鍵及/或聚醚鍵之高分子分散劑。 作為胺基甲酸酯系及丙烯酸系高分子分散劑，例如可列舉：DISPERBYK160～166、182系列(均為胺基甲酸酯系)、DISPERBYK2000、2001、LPN21116等(均為丙烯酸系)(以上均為BYK-Chemie公司製造)。 作為胺基甲酸酯系高分子分散劑，若具體例示較佳之化學結構，則例如可列舉藉由使多異氰酸酯化合物、分子內具有1個或2個羥基之數量平均分子量300～10,000之化合物、及同一分子內具有活性氫與三級胺基之化合物進行反應而獲得之重量平均分子量1,000～200,000之分散樹脂等。藉由利用苄基氯等四級化劑對該等進行處理，可使全部或一部分三級胺基成為四級銨鹽基。 作為上述多異氰酸酯化合物之例，可列舉：對苯二異氰酸酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、萘-1,5-二異氰酸酯、聯甲苯胺二異氰酸酯等芳香族二異氰酸酯；六亞甲基二異氰酸酯、離胺酸甲酯二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯、二聚酸二異氰酸酯等脂肪族二異氰酸酯；異佛酮二異氰酸酯、4,4'-亞甲基雙(環己基異氰酸酯)、ω,ω'-二異氰酸基-二甲基環己烷等脂環族二異氰酸酯；苯二甲基二異氰酸酯、α,α,α',α'-四甲基苯二甲基二異氰酸酯等具有芳香環之脂肪族二異氰酸酯；離胺酸酯三異氰酸酯、1,6,11-十一烷三異氰酸酯、1,8-二異氰酸基-4-異氰酸基甲基辛烷、1,3,6-六亞甲基三異氰酸酯、聯環庚烷三異氰酸酯、三(異氰酸基苯基)甲烷、三(異氰酸基苯基)硫代磷酸酯等三異氰酸酯；以及該等之三聚物、水加成物、及該等之多元醇加成物等。作為多異氰酸酯，較佳為有機二異氰酸酯之三聚物，最佳為甲苯二異氰酸酯之三聚物與異佛酮二異氰酸酯之三聚物。該等可單獨使用一種，亦可將兩種以上併用。 作為異氰酸酯之三聚物之製造方法，可列舉如下方法：使用適當之三聚化觸媒、例如三級胺類、膦類、烷氧化物類、金屬氧化物、羧酸鹽類等，使上述多異氰酸酯類進行異氰酸酯基之部分三聚化，藉由添加觸媒毒而停止三聚化後，藉由溶劑萃取、薄膜蒸餾而去除未反應之多異氰酸酯，從而獲得目標之含異氰脲酸酯基之多異氰酸酯。 作為同一分子內具有1個或2個羥基之數量平均分子量300～10,000之化合物，可列舉：聚醚二醇(polyether glycol)、聚酯二醇(polyester glycol)、聚碳酸酯二醇、聚烯烴二醇等、以及該等化合物之單個末端羥基經碳數1～25之烷基進行烷氧基化而成者及該等兩種以上之混合物。 作為聚醚二醇(polyether glycol)，可列舉：聚醚二醇(polyether diol)、聚醚酯二醇(polyetherester diol)、及該等兩種以上之混合物。作為聚醚二醇(polyether diol)，可列舉使環氧烷進行均聚合或共聚合而獲得者，例如可列舉：聚乙二醇、聚丙二醇、聚乙二醇-丙二醇、聚氧四亞甲基二醇、聚氧六亞甲基二醇、聚氧八亞甲基二醇及該等之兩種以上之混合物。 作為聚醚酯二醇(polyetherester diol)，可列舉藉由使含醚基之二醇或其與其他二醇之混合物與二羧酸或該等之酐進行反應、或者使聚酯二醇(polyester glycol)與環氧烷進行反應而獲得者，例如可列舉聚(聚氧四亞甲基)己二酸酯等。作為聚醚二醇(polyether glycol)，最佳為聚乙二醇、聚丙二醇、聚氧四亞甲基二醇或該等之化合物之單個末端羥基經碳數1～25之烷基進行烷氧基化而成之化合物。 作為聚酯二醇(polyester glycol)，可列舉：使二羧酸(丁二酸、戊二酸、己二酸、癸二酸、反丁烯二酸、順丁烯二酸、鄰苯二甲酸等)或該等之酐與二醇(glycol)(乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、2,3-丁二醇、3-甲基-1,5-戊二醇、新戊二醇、2-甲基-1,3-丙二醇、2-甲基-2-丙基-1,3-丙二醇、2-丁基-2-乙基-1,3-丙二醇、1,5-戊二醇、1,6-己二醇、2-甲基-2,4-戊二醇、2,2,4-三甲基-1,3-戊二醇、2-乙基-1,3-己二醇、2,5-二甲基-2,5-己二醇、1,8-八亞甲基二醇、2-甲基-1,8-八亞甲基二醇、1,9-壬二醇等脂肪族二醇；雙羥基甲基環己烷等脂環族二醇；苯二甲醇、雙羥基乙氧基苯等芳香族二醇；N-甲基二乙醇胺等N-烷基二烷醇胺等)進行縮聚而獲得者，例如聚己二酸乙二酯、聚己二酸丁二酯、聚六亞甲基己二酸酯、聚己二酸乙二酯/己二酸丙二酯等；或者可列舉使用上述二醇(diol)類或碳數1～25之一元醇作為起始劑而獲得之聚內酯二醇或聚內酯單醇，例如聚己內酯二醇、聚甲基戊內酯及該等之兩種以上之混合物。作為聚酯二醇(polyester glycol)，最佳為聚己內酯二醇或以碳數1～25之醇作為起始劑之聚己內酯。 作為聚碳酸酯二醇，可列舉聚碳酸(1,6-己二酯)、聚碳酸(3-甲基-1,5-戊二酯)等，作為聚烯烴二醇，可列舉聚丁二烯二醇、氫化型聚丁二烯二醇、氫化型聚異戊二醇等。 該等可單獨使用一種，亦可將兩種以上併用。 同一分子內具有1個或2個羥基之化合物之數量平均分子量通常為300～10,000，較佳為500～6,000，進而較佳為1,000～4,000。 對本發明所使用之同一分子內具有活性氫與三級胺基之化合物進行說明。 作為活性氫，即直接鍵結於氧原子、氮原子或硫原子上之氫原子，可列舉羥基、胺基、硫醇基等官能基中之氫原子，其中，較佳為胺基、尤其是一級胺基之氫原子。 三級胺基並無特別限定，例如可列舉具有碳數1～4之烷基之胺基、或雜環結構，更具體而言，可列舉咪唑環或三唑環等。 若例示此種同一分子內具有活性氫與三級胺基之化合物，則可列舉：N,N-二甲基-1,3-丙二胺、N,N-二乙基-1,3-丙二胺、N,N-二丙基-1,3-丙二胺、N,N-二丁基-1,3-丙二胺、N,N-二甲基乙二胺、N,N-二乙基乙二胺、N,N-二丙基乙二胺、N,N-二丁基乙二胺、N,N-二甲基-1,4-丁二胺、N,N-二乙基-1,4-丁二胺、N,N-二丙基-1,4-丁二胺、N,N-二丁基-1,4-丁二胺等。 又，作為三級胺基為含氮雜環結構之情形時之該含氮雜環，可列舉：吡唑環、咪唑環、三唑環、四唑環、吲哚環、咔唑環、吲唑環、苯并咪唑環、苯并三唑環、苯并㗁唑環、苯并噻唑環、苯并噻二唑環等含氮五員雜環；吡啶環、嗒??環、嘧啶環、三??環、喹啉環、吖啶環、異喹啉環等含氮六員雜環。該等含氮雜環中，較佳為咪唑環或三唑環。 若具體例示該等具有咪唑環與胺基之化合物，則可列舉：1-(3-胺基丙基)咪唑、組胺酸、2-胺基咪唑、1-(2-胺基乙基)咪唑等。又，若具體例示具有三唑環與胺基之化合物，則可列舉：3-胺基-1,2,4-三唑、5-(2-胺基-5-氯苯基)-3-苯基-1H-1,2,4-三唑、4-胺基-4H-1,2,4-三唑-3,5-二醇、3-胺基-5-苯基-1H-1,3,4-三唑、5-胺基-1,4-二苯基-1,2,3-三唑、3-胺基-1-苄基-1H-2,4-三唑等。其中，較佳為N,N-二甲基-1,3-丙二胺、N,N-二乙基-1,3-丙二胺、1-(3-胺基丙基)咪唑、3-胺基-1,2,4-三唑。 該等可單獨使用一種，亦可將兩種以上併用。 製造胺基甲酸酯系高分子分散劑時之原料之較佳之調配比率相對於多異氰酸酯化合物100質量份，同一分子內具有1個或2個羥基之數量平均分子量300～10,000之化合物為10～200質量份，較佳為20～190質量份，進而較佳為30～180質量份，同一分子內具有活性氫與三級胺基之化合物為0.2～25質量份，較佳為0.3～24質量份。 胺基甲酸酯系高分子分散劑之製造係依照製造聚胺基甲酸酯樹脂之公知之方法而進行。作為製造時之溶媒，通常可使用：丙酮、甲基乙基酮、甲基異丁基酮、環戊酮、環己酮、異佛酮等酮類；乙酸乙酯、乙酸丁酯、乙酸賽路蘇等酯類；苯、甲苯、二甲苯、己烷等烴類；二丙酮醇、異丙醇、第二丁醇、第三丁醇等一部分醇類；二氯甲烷、氯仿等氯化物；四氫呋喃、二乙醚等醚類；二甲基甲醯胺、N-甲基吡咯啶酮、二甲基亞碸等非質子性極性溶媒等。該等可單獨使用一種，亦可將兩種以上併用。 於上述製造時，通常可使用胺基甲酸酯化反應觸媒。作為該觸媒，例如可列舉：二丁基二月桂酸錫、二辛基二月桂酸錫、二丁基二辛酸錫、辛酸亞錫等錫系觸媒；乙醯丙酮酸鐵、氯化鐵等鐵系觸媒；三乙胺、三乙二胺等三級胺系觸媒等。該等可單獨使用一種，亦可將兩種以上併用。 同一分子內具有活性氫與三級胺基之化合物之導入量以反應後之胺值計，較佳為控制為1～100 mgKOH/g之範圍內。更佳為5～95 mgKOH/g之範圍。胺值係藉由酸中和滴定鹼性胺基，使其與酸值相對於而以KOH之mg數所表示之值。若胺值低於上述範圍，則有分散能力降低之傾向，又，若胺值超出上述範圍，則有顯影性容易降低之傾向。 再者，於以上反應中異氰酸酯基殘存於高分子分散劑中之情形時，若進一步藉由醇或胺基化合物破壞異氰酸酯基，則產物之經時穩定性變高，故而較佳。 胺基甲酸酯系高分子分散劑之重量平均分子量(Mw)通常為1,000～200,000之範圍，較佳為2,000～100,000之範圍，更佳為3,000～50,000之範圍。若該分子量未達1,000，則有分散性及分散穩定性變差之傾向，若超過200,000，則有溶解性降低，分散性變差，同時反應之控制變得困難之傾向。 作為丙烯酸系高分子分散劑，較佳為使用具有官能基(此處所謂之官能基為上文作為高分子分散劑所含之官能基而說明之官能基)之含不飽和基之單體與不具有官能基之含不飽和基單體之無規共聚物、接枝共聚物、嵌段共聚物。該等共聚物可藉由公知之方法而製造。 作為具有官能基之含不飽和基之單體，可列舉如下物質作為具體例：(甲基)丙烯酸、2-(甲基)丙烯醯氧基乙基丁二酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、丙烯酸二聚物等具有羧基之不飽和單體；(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸二乙胺基乙酯及該等之四級化物等具有三級胺基、四級銨鹽基之不飽和單體。該等可單獨使用一種，亦可將兩種以上併用。 作為不具有官能基之含不飽和基之單體，可列舉：(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯氧基甲酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異[艸+伯]基酯、(甲基)丙烯酸三環癸基酯、(甲基)丙烯酸四氫糠酯、N-乙烯基吡咯啶酮、苯乙烯及其衍生物、α-甲基苯乙烯；N-環己基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺、N-苄基順丁烯二醯亞胺等N-取代順丁烯二醯亞胺；丙烯腈、乙酸乙烯酯及聚(甲基)丙烯酸甲酯巨單體、聚苯乙烯巨單體、聚(甲基)丙烯酸2-羥基乙酯巨單體、聚乙二醇巨單體、聚丙二醇巨單體、聚己內酯巨單體等巨單體等。該等可單獨使用一種，亦可將兩種以上併用。 丙烯酸系高分子分散劑尤佳為包含具有官能基之A嵌段與不具有官能基之B嵌段之A-B或B-A-B嵌段共聚物，於該情形時，於A嵌段中除了包含源自上述含有官能基之含不飽和基單體之部分結構以外，亦可包含源自上述不含官能基之含不飽和基單體之部分結構，該等可以無規共聚合或嵌段共聚合之任一態樣含有於該A嵌段中。又，不含官能基之部分結構於A嵌段中之含量通常為80質量%以下，較佳為50質量%以下，進而較佳為30質量%以下。 B嵌段係包含源自上述不含官能基之含不飽和基單體之部分結構者，亦可於1個B嵌段中含有兩種以上源自單體之部分結構，該等可以無規共聚合或嵌段共聚合之任一態樣含有於該B嵌段中。 該A-B或B-A-B嵌段共聚物例如係藉由以下所示之活性聚合法而製備。 活性聚合法中有陰離子活性聚合法、陽離子活性聚合法、自由基活性聚合法，其中，陰離子活性聚合法之聚合活性種為陰離子，例如以下述流程表示。 [化49]上述流程中，Ar1 為一價有機基，Ar2 為與Ar1 不同之一價有機基，M為金屬原子，s及t分別為1以上之整數。 自由基活性聚合法之聚合活性種為自由基，例如以下述流程表示。 [化50]上述流程中，Ar1 為一價有機基，Ar2 為與Ar1 不同之一價有機基，j及k分別為1以上之整數，Ra 為氫原子或一價有機基，Rb 為與Ra 不同之氫原子或一價有機基。 於合成該丙烯酸系高分子分散劑時，可採用日本專利特開平9-62002號公報、或P. Lutz, P. Masson et al, Polym. Bull. 12, 79 (1984), B.C. Anderson, G.D. Andrews et al, Macromolecules, 14, 1601(1981), K. Hatada, K. Ute, et al, Polym. J. 17, 977(1985), 18, 1037(1986), 右手浩一、畑田耕一、高分子加工、36， 366(1987)，東村敏延、沢本光男、高分子論文集、46， 189(1989)， M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737(1987)、相田卓三、井上祥平、有機合成化學、43, 300(1985), D.Y. Sogoh, W.R. Hertler et al, Macromolecules, 20, 1473(1987)等所記載之公知之方法。 本發明可使用之丙烯酸系高分子分散劑可為A-B嵌段共聚物，亦可為B-A-B嵌段共聚物，構成該共聚物之A嵌段/B嵌段比較佳為1/99～80/20，尤佳為5/95～60/40(質量比)，藉由設為該範圍內，有可確保分散性與保存穩定性之平衡之傾向。 又，本發明可使用之A-B嵌段共聚物、B-A-B嵌段共聚物1 g中之四級銨鹽基之量通常較佳為0.1～10 mmol，藉由設為該範圍內，有可確保良好之分散性之傾向。 再者，於此種嵌段共聚物中，通常同在含有製造過程中所產生之胺基之情形，其胺值為1～100 mgKOH/g左右，就分散性之觀點而言，較佳為10 mgKOH/g以上，更佳為30 mgKOH/g以上，進而較佳為50 mgKOH/g以上，又，較佳為90 mgKOH/g以下，更佳為80 mgKOH/g以下，進而較佳為75 mgKOH/g以下。 此處，該等嵌段共聚物等分散劑之胺值係以相對於除分散劑試樣中之溶劑以外之固形物成分1 g之鹼量與當量之KOH之質量表示，係藉由如下方法而測定。 精確稱量0.5～1.5 g分散劑試樣置於100 mL之燒杯中，以50 mL之乙酸將其溶解。使用具備pH電極之自動滴定裝置，藉由0.1 mol/L之HClO4 乙酸溶液對該溶液進行中和滴定。以滴定pH曲線之反曲點作為滴定終點，藉由下式求出胺值。 胺值[mgKOH/g]＝(561×V)/(W×S) [其中，W表示分散劑試樣稱取量[g]，V表示滴定終點處之滴定量[mL]，S表示分散劑試樣之固形物成分濃度[質量%]] 又，該嵌段共聚物之胺值亦取決於成為該酸值之根源之酸性基之有無及種類，一般而言較低為宜，通常為10 mgKOH/g以下，其重量平均分子量(Mw)較佳為1000～100,000之範圍。藉由設為上述範圍內，有可確保良好之分散性之傾向。 於具有四級銨鹽基作為官能基之情形時，對高分子分散劑之具體之結構並無特別限定，就分散性之觀點而言，較佳為具有下述式(i)所表示之重複單元(以下有時稱為「重複單元(i)」)。 [化51]上述式(i)中，R31 ～R33 分別獨立為氫原子、可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基，R31 ～R33 中2個以上可互相鍵結而形成環狀結構。R34 為氫原子或甲基。X為二價連結基，Y- 為抗衡陰離子。 上述式(i)之R31 ～R33 中之可具有取代基之烷基之碳數並無特別限定，通常為1以上，又，較佳為10以下，更佳為6以下。作為烷基之具體例，可列舉：甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等，該等中，較佳為甲基、乙基、丙基、丁基、戊基、或己基，更佳為甲基、乙基、丙基、或丁基。又，可為直鏈狀、支鏈狀之任一者。又，亦可含有環己基、環己基甲基等環狀結構。 上述式(i)之R31 ～R33 中之可具有取代基之芳基之碳數並無特別限定，通常為6以上，又，較佳為16以下，更佳為12以下。作為芳基之具體例，可列舉：苯基、甲基苯基、乙基苯基、二甲基苯基、二乙基苯基、萘基、蒽基等，該等中，較佳為苯基、甲基苯基、乙基苯基、二甲基苯基、或二乙基苯基，更佳為苯基、甲基苯基、或乙基苯基。 上述式(i)之R31 ～R33 中之可具有取代基之芳烷基之碳數並無特別限定，通常為7以上，又，較佳為16以下，更佳為12以下。作為芳烷基之具體例，可列舉：苯基亞甲基、苯基伸乙基、苯基伸丙基、苯基伸丁基、苯基伸異丙基等，該等中，較佳為苯基亞甲基、苯基伸乙基、苯基伸丙基、或苯基伸丁基，更佳為苯基亞甲基、或苯基伸乙基。 該等中，就分散性之觀點而言，較佳為R31 ～R33 分別獨立為烷基或芳烷基，具體而言，較佳為R31 及R33 分別獨立為甲基或乙基，且R32 為苯基亞甲基或苯基伸乙基，進而較佳為R31 及R33 為甲基，且R32 為苯基亞甲基。 又，於上述高分子分散劑具有三級胺作為官能基之情形時，就分散性之觀點而言，較佳為具有下述式(ii)所表示之重複單元(以下有時稱為「重複單元(ii)」)。 [化52]上述式(ii)中，R35 及R36 分別獨立為氫原子、可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基，R35 及R36 可互相鍵結而形成環狀結構。R37 為氫原子或甲基。Z為二價連結基。 又，作為上述式(ii)之R35 及R36 中之可具有取代基之烷基，可較佳地採用作為上述式(i)之R31 ～R33 而例示者。 同樣地，作為上述式(ii)之R35 及R36 中之可具有取代基之芳基，可較佳地採用作為上述式(i)之R31 ～R33 而例示者。又，作為上述式(ii)之R35 及R36 中之可具有取代基之芳烷基，可較佳地採用作為上述式(i)之R31 ～R33 而例示者。 該等中，較佳為R35 及R36 分別獨立為可具有取代基之烷基，更佳為甲基或乙基。 作為上述式(i)之R31 ～R33 及上述式(ii)之R35 及R36 中之烷基、芳烷基或芳基可具有之取代基，可列舉：鹵素原子、烷氧基、苯甲醯基、羥基等。 於上述式(i)及(ii)中，作為二價連結基X及Z，例如可列舉碳數1～10之伸烷基、碳數6～12之伸芳基、-CONH-R43 -基、-COOR44 -基[其中，R43 及R44 為單鍵、碳數1～10之伸烷基、或碳數2～10之醚基(烷氧基烷基)]等，較佳為-COO-R44 -基。 又，於上述式(i)中，作為抗衡陰離子之Y- ，可列舉：Cl- 、Br- 、I- 、ClO4 - 、BF4 - 、CH3 COO- 、PF6 - 等。 上述式(i)所表示之重複單元之含有比例並無特別限定，就分散性之觀點而言，相對於上述式(i)所表示之重複單元之含有比例與上述式(ii)所表示之重複單元之含有比例之合計，較佳為60莫耳%以下，更佳為50莫耳%以下，進而較佳為40莫耳%以下，尤佳為35莫耳%以下，又，較佳為5莫耳%以上，更佳為10莫耳%以上，進而較佳為20莫耳%以上，尤佳為30莫耳%以上。 又，上述式(i)所表示之重複單元於高分子分散劑之總重複單元中所占之含有比例並無特別限定，就分散性之觀點而言，較佳為1莫耳%以上，更佳為5莫耳%以上，進而較佳為10莫耳%以上，又，較佳為50莫耳%以下，更佳為30莫耳%以下，進而較佳為20莫耳%以下，尤佳為15莫耳%以下。 又，上述式(ii)所表示之重複單元於高分子分散劑之總重複單元中所占之含有比例並無特別限定，就分散性之觀點而言，較佳為5莫耳%以上，更佳為10莫耳%以上，進而較佳為15莫耳%以上，尤佳為20莫耳%以上，又，較佳為60莫耳%以下，更佳為40莫耳%以下，進而較佳為30莫耳%以下，尤佳為25莫耳%以下。 又，高分子分散劑就提高相對於溶媒等黏合劑成分之相容性，提高分散穩定性之觀點而言，較佳為具有下述式(iii)所表示之重複單元(以下有時稱為「重複單元(iii)」)。 [化53]上述式(iii)中，R40 為伸乙基或伸丙基，R41 為可具有取代基之烷基，R42 為氫原子或甲基。n為1～20之整數。 上述式(iii)之R41 中之可具有取代基之烷基之碳數並無特別限定，通常為1以上，較佳為2以上，又，較佳為10以下，更佳為6以下。作為烷基之具體例，可列舉：甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等，該等中，較佳為甲基、乙基、丙基、丁基、戊基、或己基，更佳為甲基、乙基、丙基、或丁基。又，可為直鏈狀、支鏈狀之任一者。又，亦可含有環己基、環己基甲基等環狀結構。 又，上述式(iii)中之n就相對於溶媒等黏合劑成分之相容性與分散性之觀點而言，較佳為1以上，更佳為2以上，又，較佳為10以下，更佳為5以下。 又，上述式(iii)所表示之重複單元於高分子分散劑之總重複單元中所占之含有比例並無特別限定，較佳為1莫耳%以上，更佳為2莫耳%以上，進而較佳為4莫耳%以上，又，較佳為30莫耳%以下，更佳為20莫耳%以下，進而較佳為10莫耳%以下。於為上述範圍內之情形時，有可兼顧相對於溶媒等黏合劑成分之相容性與分散穩定性之傾向。 又，高分子分散劑就提高分散劑相對於溶媒等黏合劑成分之相容性，提高分散穩定性之觀點而言，較佳為具有下述式(iv)所表示之重複單元(以下有時稱為「重複單元(iv)」)。 [化54]上述式(iv)中，R38 為可具有取代基之烷基、可具有取代基之芳基、或可具有取代基之芳烷基。R39 為氫原子或甲基。 上述式(iv)之R38 中之可具有取代基之烷基之碳數並無特別限定，通常為1以上，較佳為2以上，更佳為4以上，又，較佳為10以下，更佳為8以下。作為烷基之具體例，可列舉：甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基等，該等中，較佳為甲基、乙基、丙基、丁基、戊基、或己基，更佳為甲基、乙基、丙基、或丁基。又，可為直鏈狀、支鏈狀之任一者。又，亦可含有環己基、環己基甲基等環狀結構。 上述式(iv)之R38 中之可具有取代基之芳基之碳數並無特別限定，通常為6以上，又，較佳為16以下，更佳為12以下，進而較佳為8以下。作為芳基之具體例，可列舉：苯基、甲基苯基、乙基苯基、二甲基苯基、二乙基苯基、萘基、蒽基等，該等中，較佳為苯基、甲基苯基、乙基苯基、二甲基苯基、或二乙基苯基，更佳為苯基、甲基苯基、或乙基苯基。 上述式(iv)之R38 中之可具有取代基之芳烷基之碳數並無特別限定，通常為7以上，又，較佳為16以下，更佳為12以下，進而較佳為10以下。作為芳烷基之具體例，可列舉：苯基亞甲基、苯基伸乙基、苯基伸丙基、苯基伸丁基、苯基伸異丙基等，該等中，較佳為苯基亞甲基、苯基伸乙基、苯基伸丙基、或苯基伸丁基，更佳為苯基亞甲基、或苯基伸乙基。 該等中，就溶劑相容性與分散穩定性之觀點而言，R38 較佳為烷基或芳烷基，更佳為甲基、乙基或苯基亞甲基。 作為R38 中之烷基可具有之取代基，可列舉鹵素原子、烷氧基等。又，作為芳基或芳烷基可具有之取代基，可列舉鏈狀之烷基、鹵素原子、烷氧基等。又，於R38 所表示之鏈狀之烷基中含有直鏈狀及支鏈狀之任一者。 又，上述式(iv)所表示之重複單元於高分子分散劑之總重複單元中所占之含有比例就分散性之觀點而言，較佳為30莫耳%以上，更佳為40莫耳%以上，進而較佳為50莫耳%以上，又，較佳為80莫耳%以下，更佳為70莫耳%以下。 高分子分散劑亦可具有重複單元(i)、重複單元(ii)、重複單元(iii)及重複單元(iv)以外之重複單元。作為此種重複單元之例，可列舉源自如下單體之重複單元：苯乙烯、α-甲基苯乙烯等苯乙烯系單體；(甲基)丙烯醯氯等(甲基)丙烯酸氯系單體；(甲基)丙烯醯胺、N-羥甲基丙烯醯胺等(甲基)丙烯醯胺系單體；乙酸乙烯酯；丙烯腈；烯丙基縮水甘油醚、丁烯酸縮水甘油醚；N-甲基丙烯醯基??啉等單體。 高分子分散劑就進一步提高分散性之觀點而言，較佳為包含具有重複單元(i)及重複單元(ii)之A嵌段與不具有重複單元(i)及重複單元(ii)之B嵌段之嵌段共聚物。該嵌段共聚物較佳為A-B嵌段共聚物或B-A-B嵌段共聚物。藉由於A嵌段中不僅導入四級銨鹽基，而且亦導入三級胺基，意外地有分散劑之分散能力顯著提高之傾向。又，B嵌段較佳為具有重複單元(iii)，更佳為進而具有重複單元(iv)。 重複單元(i)及重複單元(ii)可以無規共聚合、嵌段共聚合之任一態樣含有於A嵌段中。又，重複單元(i)及重複單元(ii)可於1個A嵌段中各含有兩種以上，於該情形時，各重複單元可以無規共聚合、嵌段共聚合之任一態樣含有於該A嵌段中。 又，於A嵌段中可含有重複單元(i)及重複單元(ii)以外之重複單元，作為此種重複單元之例，可列舉上文所述之源自(甲基)丙烯酸酯系單體之重複單元等。重複單元(i)及重複單元(ii)以外之重複單元於A嵌段中之含量較佳為0～50莫耳%，更佳為0～20莫耳%，最佳為於A嵌段中不含該重複單元。 於B嵌段中可含有重複單元(iii)及(iv)以外之重複單元，作為此種重複單元之例，可列舉源自如下單體之重複單元：苯乙烯、α-甲基苯乙烯等苯乙烯系單體；(甲基)丙烯醯氯等(甲基)丙烯酸氯系單體；(甲基)丙烯醯胺、N-羥甲基丙烯醯胺等(甲基)丙烯醯胺系單體；乙酸乙烯酯；丙烯腈；烯丙基縮水甘油醚、丁烯酸縮水甘油醚；N-甲基丙烯醯基??啉等單體。重複單元(iii)及重複單元(iv)以外之重複單元於B嵌段中之含量較佳為0～50莫耳%，更佳為0～20莫耳%，最佳為於B嵌段中不含該重複單元。 又，就提高分散穩定性之方面而言，(f)分散劑較佳為與下文所述之顏料衍生物併用。 ＜感光性著色組合物之其他調配成分＞ 於本發明之感光性著色組合物中，除了上述成分以外，可適當調配矽烷偶合劑等密接改善劑、塗佈性提高劑、顯影改良劑、紫外線吸收劑、抗氧化劑、界面活性劑、顏料衍生物、光酸產生劑、交聯劑、聚合促進劑等。 (1)密接改善劑 為了改善與基板之密接性，亦可於本發明之感光性著色組合物中含有密接改善劑。作為密接改善劑，較佳為矽烷偶合劑、含磷酸基之化合物等。 作為矽烷偶合劑之種類，可單獨使用環氧系、(甲基)丙烯酸系、胺基系等各者中之一種，或可將兩種以上混合而使用。 作為較佳之矽烷偶合劑，例如可列舉：3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷等(甲基)丙烯醯氧基矽烷類；2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷等環氧矽烷類；3-脲基丙基三乙氧基矽烷等脲基矽烷類；3-異氰酸酯基丙基三乙氧基矽烷等異氰酸酯基矽烷類，尤佳為環氧矽烷類之矽烷偶合劑。 作為含磷酸基之化合物，較佳為含(甲基)丙烯醯基之磷酸酯類，較佳為下述通式(g1)、(g2)或(g3)所表示者。 [化55]於上述通式(g1)、(g2)及(g3)中，R51 表示氫原子或甲基，l及l'為1～10之整數，m為1、2或3。 該等含磷酸基之化合物亦為可單獨使用一種，亦可組合兩種以上而使用。 (2)界面活性劑 為了提高塗佈性，可於本發明之感光性著色組合物中含有界面活性劑。 作為界面活性劑，例如可使用陰離子系、陽離子系、非離子系、兩性界面活性劑等各種者。其中，就對各特性造成不良影響之可能性較低之方面而言，較佳為使用非離子系界面活性劑，其中，就塗佈性之方面而言，有效的是氟系或矽系之界面活性劑。 作為此種界面活性劑，例如可列舉：TSF4460(GE Toshiba Silicones公司製造)、DFX-18(NEOS公司製造)、BYK-300、BYK-325、BYK-330(BYK-Chemie公司製造)、KP340(Shin-Etsu Silicones公司製造)、F-470、F-475、F-478、F-559(DIC公司製造)、SH7PA(Toray Silicone公司製造)、DS-401(Daikin公司製造)、L-77(Nippon Unicar公司製造)、FC4430(住友3M公司製造)等。 再者，界面活性劑可使用一種，亦可以任意組合及比率併用兩種以上。 (3)顏料衍生物 為了提高分散性、保存性，可於本發明之感光性著色組合物中含有顏料衍生物作為分散助劑。 作為顏料衍生物，可列舉：偶氮系、酞菁系、喹吖啶酮系、苯并咪唑酮系、喹酞酮系、異吲哚啉酮系、二㗁??系、蒽醌系、陰丹士林系、苝系、紫環酮系、二酮吡咯并吡咯系、二㗁??系等衍生物，其中，較佳為酞菁系、喹酞酮系。 作為顏料衍生物之取代基，可列舉磺酸基、磺醯胺基及其四級鹽、鄰苯二甲醯亞胺甲基、二烷基胺基烷基、羥基、羧基、醯胺基等直接或經由烷基、芳基、雜環基等鍵結於顏料骨架上者，較佳為磺酸基。又，該等取代基可對一個顏料骨架取代複數個。 作為顏料衍生物之具體例，可列舉：酞菁之磺酸衍生物、喹酞酮之磺酸衍生物、蒽醌之磺酸衍生物、喹吖啶酮之磺酸衍生物、二酮吡咯并吡咯之磺酸衍生物、二㗁??之磺酸衍生物等。該等可單獨使用一種，亦可將兩種以上併用。 (4)光酸產生劑 所謂光酸產生劑係可藉由紫外線而產生酸之化合物，藉由進行曝光時產生之酸之作用，因存在例如三聚氰胺化合物等交聯劑，故而會進行交聯反應。該光酸產生劑中，較佳為對溶劑之溶解性、尤其是對感光性著色組合物所使用之溶劑之溶解性較大者，例如可列舉：二苯基錪、二甲苯基錪、苯基對茴香基錪、雙(間硝基苯基)錪、雙(對第三丁基苯基)錪、雙(對氯苯基)錪、雙(正十二烷基)錪、對異丁基苯基對甲苯基錪、對異丙基苯基對甲苯基錪等二芳基錪；或三苯基鋶等三芳基鋶之氯化物、溴化物；或氟硼酸鹽、六氟磷酸鹽、六氟砷酸鹽、芳香族磺酸鹽、四(五氟苯基)硼酸鹽等；或正丁基三苯基硼酸二苯基苯甲醯甲基鋶等鋶有機硼錯合物類；或2-甲基-4,6-雙(三氯甲基)三??、2-(4-甲氧基苯基)-4,6-雙(三氯甲基)三??等三??化合物等，但並不僅限於此。 (5)交聯劑 可進而於本發明之感光性著色組合物中添加交聯劑，例如可使用三聚氰胺或胍胺系之化合物。作為該等交聯劑，例如可列舉下述通式(6)所表示之三聚氰胺或胍胺系之化合物。 [化56]式(6)中，R61 表示-NR66 R67 基或碳數6～12之芳基，於R61 為-NR66 R67 基之情形時，R62 、R63 、R64 、R65 、R66 及R67 之一表示-CH2 OR68 基，並且於R61 為碳數6～12之芳基之情形時，R62 、R63 、R64 及R65 之一表示-CH2 OR68 基，R62 、R63 、R64 、R65 、R66 及R67 中剩餘者互相獨立地表示氫或-CH2 OR68 基，此處，R68 表示氫原子或碳數1～4之烷基。 此處，碳數6～12之芳基典型而言為苯基、1-萘基或2-萘基，於該等苯基或萘基上可鍵結有烷基、烷氧基、鹵素原子等取代基。烷基及烷氧基可分別為碳數1～6左右。R68 所表示之烷基較佳為上述中之甲基或乙基，尤佳為甲基。 相當於通式(6)之三聚氰胺系化合物、即下述通式(6-1)之化合物中包含六羥甲基三聚氰胺、五羥甲基三聚氰胺、四羥甲基三聚氰胺、六甲氧基甲基三聚氰胺、五甲氧基甲基三聚氰胺、四甲氧基甲基三聚氰胺、六乙氧基甲基三聚氰胺等。 [化57]式(6-1)中，於R62 、R63 、R64 、R65 、R66 及R67 之一為芳基之情形時，R62 、R63 、R64 及R65 之一表示-CH2 OR68 基，R62 、R63 、R64 、R65 、R66 及R67 中剩餘者互相獨立地表示氫原子或-CH2 OR68 基，此處，R68 表示氫原子或烷基。 又，相當於通式(6)之胍胺系化合物、即通式(6)中之R61 為芳基之化合物中包含四羥甲基苯并胍胺、四甲氧基甲基苯并胍胺、三甲氧基甲基苯并胍胺、四乙氧基甲基苯并胍胺等。 進而，亦可使用具有羥甲基或羥甲基烷基醚基之交聯劑。以下列舉其例。 2,6-雙(羥基甲基)-4-甲基苯酚、4-第三丁基-2,6-雙(羥基甲基)苯酚、5-乙基-1,3-雙(羥基甲基)全氫-1,3,5-三??-2-酮(通稱為N-乙基二羥甲基三??酮)或其二甲醚體、二羥甲基三亞甲基脲或其二甲醚體、3,5-雙(羥基甲基)全氫-1,3,5-㗁二??-4-酮(通稱為dimethyloluron)或其二甲醚體、四羥甲基乙二醛二烷基脲或其四甲醚體。 再者，該等交聯劑可單獨使用一種，亦可組合兩種以上而使用。使用交聯劑時之量相對於感光性著色組合物之全部固形物成分較佳為0.1～15質量%，尤佳為0.5～10質量%。 (6)巰基化合物 作為聚合促進劑，又，為了提高與基板之密接性，亦可添加巰基化合物。 作為巰基化合物之種類，可列舉：2-巰基苯并噻唑、2-巰基苯并㗁唑、2-巰基苯并咪唑、己二硫醇、癸二硫醇、1,4-二甲硫基苯、丁二醇雙硫代丙酸酯、丁二醇雙硫代乙醇酸酯、乙二醇雙硫代乙醇酸酯、三羥甲基丙烷三硫代乙醇酸酯、丁二醇雙硫代丙酸酯、三羥甲基丙烷三硫代丙酸酯、三羥甲基丙烷三硫代乙醇酸酯、季戊四醇四硫代丙酸酯、季戊四醇四硫代乙醇酸酯、三羥基乙基三硫代丙酸酯、乙二醇雙(3-巰基丁酸酯)、丁二醇雙(3-巰基丁酸酯)、1,4-雙(3-巰基丁醯氧基)丁烷、三羥甲基丙烷三(3-巰基丁酸酯)、季戊四醇四(3-巰基丁酸酯)、季戊四醇三(3-巰基丁酸酯)、乙二醇雙(3-巰基異丁酸酯)、丁二醇雙(3-巰基異丁酸酯)、三羥甲基丙烷三(3-巰基異丁酸酯)、1,3,5-三(3-巰基丁氧基乙基)-1,3,5-三??-2,4,6(1H,3H,5H)-三酮等具有雜環之巰基化合物或脂肪族多官能巰基化合物等。該等可單獨使用各者之一種，或可將兩種以上混合而使用。 ＜感光性著色組合物中之成分調配量＞ 於本發明之感光性著色組合物中，(a)著色劑之含有比例相對於感光性著色組合物中之全部固形物成分量，通常為10質量%以上，更佳為20質量%以上，進而較佳為30質量%以上，進而更佳為35質量%以上，尤佳為40質量%以上，又，通常較佳為60質量%以下，更佳為50質量%以下，進而較佳為48質量%以下，尤佳為46質量%以下。藉由將(a)著色劑之含有比例設為上述下限值以上，有可獲得充分之光學密度(optical density，OD)之傾向，又，藉由設為上述上限值以下，有容易獲得充分之製版特性之傾向。 又，於(a)著色劑含有有機顏料之情形時，有機顏料相對於(a)著色劑之含有比例較佳為1質量%以上，更佳為5質量%以上，進而較佳為10質量%以上，進而更佳為30質量%以上，尤佳為50質量%以上，最佳為70質量%以上，又，通常為100質量%以下，較佳為99質量%以下，更佳為95質量%以下，進而較佳為90質量%以下，進而更佳為85質量%以下，尤佳為80質量%以下。藉由設為上述下限值以上，有可獲得充分之光學密度(OD)之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 又，於(a)著色劑含有有機著色顏料之情形時，有機著色顏料相對於(a)著色劑之含有比例較佳為1質量%以上，更佳為5質量%以上，進而較佳為10質量%以上，進而更佳為30質量%以上，尤佳為50質量%以上，最佳為70質量%以上，又，通常為100質量%以下，較佳為99質量%以下，更佳為95質量%以下，進而較佳為90質量%以下，進而更佳為85質量%以下，尤佳為80質量%以下。藉由設為上述下限值以上，有可獲得充分之光學密度(OD)之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 又，於(a)著色劑含有選自由紅色顏料及橙色顏料所組成之群中之至少一種顏料之情形時，選自由紅色顏料及橙色顏料所組成之群中之至少一種顏料相對於(a)著色劑之含有比例較佳為1質量%以上，更佳為2質量%以上，進而較佳為3質量%以上，又，較佳為30質量%以下，更佳為20質量%以下，進而較佳為15質量%以下，進而更佳為10質量%以下，尤佳為7質量%以下，最佳為5質量%以下。藉由設為上述下限值以上，有可獲得充分之光學密度(OD)之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 又，於(a)著色劑含有選自由藍色顏料及紫色顏料所組成之群中之至少一種顏料之情形時，選自由藍色顏料及紫色顏料所組成之群中之至少一種顏料相對於(a)著色劑之含有比例較佳為20質量%以上，更佳為30質量%以上，進而較佳為40質量%以上，進而更佳為50質量%以上，尤佳為60質量%以上，最佳為65質量%以上，又，較佳為90質量%以下，更佳為80質量%以下，進而較佳為70質量%以下。藉由設為上述下限值以上，有可確保遮光性之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 於(a)著色劑含有黑色色料之情形時，黑色色料相對於(a)著色劑之含有比例較佳為5質量%以上，更佳為10質量%以上，進而較佳為15質量%以上，尤佳為20質量%以上，又，較佳為50質量%以下，更佳為40質量%以下，進而較佳為35質量%以下，進而更佳為30質量%以下。藉由設為上述下限值以上，有可獲得充分之光學密度(OD)之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 進而，於(a)著色劑含有有機黑色顏料之情形時，黑色有機顏料相對於(a)著色劑之含有比例較佳為1質量%以上，更佳為5質量%以上，進而更佳為10質量%以上，尤佳為20質量%以上，又，較佳為50質量%以下，更佳為40質量%以下，進而較佳為30質量%以下，尤佳為20質量%以下。藉由設為上述下限值以上，有可獲得充分之光學密度(OD)之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 於(a)著色劑含有碳黑之情形時，碳黑相對於(a)著色劑之含有比例較佳為5質量%以上，更佳為10質量%以上，進而較佳為15質量%以上，尤佳為20質量%以上，又，較佳為50質量%以下，更佳為40質量%以下，進而較佳為35質量%以下，尤佳為30質量%以下。藉由設為上述下限值以上，有可獲得充分之光學密度(OD)之傾向，藉由設為上述上限值以下，有可確保製版特性之傾向。 (b)鹼可溶性樹脂之含有比例相對於本發明之感光性著色組合物之全部固形物成分通常為5質量%以上，較佳為10質量%以上，更佳為20質量%以上，進而較佳為25質量%以上，且通常為85質量%以下，較佳為80質量%以下，更佳為70質量%以下，進而較佳為60質量%以下，進而更佳為50質量%以下，尤佳為40質量%以下。藉由將(b)鹼可溶性樹脂之含有比例設為上述下限值以上，有可抑制未曝光部分相對於顯影液之溶解性降低，而抑制顯影不良之傾向。又，藉由設為上述上限值以下，有可抑制顯影液對曝光部之滲透性變高之情況，而可抑制像素之銳利性或密接性降低之傾向。 (b-I)環氧(甲基)丙烯酸酯樹脂之含有比例相對於本發明之感光性著色組合物之全部固形物成分，通常為3質量%以上，較佳為6質量%以上，更佳為8質量%以上，且通常為40質量%以下，較佳為30質量%以下，更佳為20質量%以下，進而較佳為15質量%以下。藉由設為上述下限值以上，有可確保可靠性之傾向，又，藉由設為上述上限值以下，有可確保表面平滑性之傾向。 (b)鹼可溶性樹脂中所含之(b-I)環氧(甲基)丙烯酸酯樹脂之含有比例通常為10質量%以上，較佳為20質量%以上，更佳為25質量%以上，進而較佳為30質量%以上，尤佳為40質量%以上，且通常為90質量%以下，較佳為80質量%以下，更佳為70質量%以下，進而較佳為60質量%以下，進而更佳為50質量%以下，尤佳為40質量%以下。藉由設為上述下限值以上，有可確保可靠性之傾向，又，藉由設為上述上限值以下，有可確保表面平滑性之傾向。 (b-II)(甲基)丙烯酸系共聚合樹脂之含有比例相對於本發明之感光性著色組合物之全部固形物成分，通常為1質量%以上，較佳為3質量%以上，更佳為6質量%以上，進而較佳為8質量%以上，且通常為40質量%以下，較佳為30質量%以下，更佳為20質量%以下，進而較佳為15質量%以下。藉由設為上述下限值以上，有可確保表面平滑性之傾向，又，藉由設為上述上限值以下，有可確保可靠性之傾向。 (b)鹼可溶性樹脂中所含之(b-II)(甲基)丙烯酸系共聚合樹脂之含有比例通常為10質量%以上，較佳為20質量%以上，更佳為25質量%以上，進而較佳為30質量%以上，尤佳為40質量%以上，且通常為80質量%以下，較佳為70質量%以下，更佳為60質量%以下，進而較佳為50質量%以下，尤佳為40質量%以下。藉由設為上述下限值以上，有可確保表面平滑性之傾向，又，藉由設為上述上限值以下，有可確保可靠性之傾向。 (c)光聚合起始劑之含有比例相對於本發明之感光性著色組合物之全部固形物成分，通常為0.1質量%以上，較佳為0.5質量%以上，更佳為1質量%以上，進而較佳為2質量%以上，進而更佳為3質量%以上，尤佳為4質量%以上，且通常為15質量%以下，較佳為10質量%以下，更佳為8質量%以下，進而較佳為7質量%以下。藉由將(c)光聚合起始劑之含有比例設為上述下限值以上，有可抑制感度降低之傾向，藉由設為上述上限值以下，有可抑制未曝光部分相對於顯影液之溶解性降低，而抑制顯影不良之傾向。 於將(c)光聚合起始劑與聚合促進劑一併使用之情形時，聚合促進劑之含有比例相對於本發明之感光性著色組合物之全部固形物成分，較佳為0.05質量%以上，且通常為10質量%以下，較佳為5質量%以下，聚合促進劑較佳為以相對於(c)光聚合起始劑100質量份通常為0.1～50質量份、尤其是0.1～20質量份之比例使用。藉由將聚合促進劑之含有比例設為上述下限值以上，有可抑制對曝光光線之感度降低之傾向，藉由設為上述上限值以下，有可抑制未曝光部分相對於顯影液之溶解性降低，而抑制顯影不良之傾向。 又，增感色素於本發明之感光性著色組合物中所占之調配比例就感度之觀點而言，於感光性著色組合物中之全部固形物成分中，通常為20質量%以下，較佳為15質量%以下，進而較佳為10質量%以下。 (d)乙烯性不飽和化合物之含有比例相對於本發明之感光性著色組合物之全部固形物成分通常為30質量%以下，較佳為20質量%以下，更佳為15質量%以下。藉由將(d)乙烯性不飽和化合物之含有比例設為上述上限值以下，有抑制顯影液對曝光部之滲透性變高之情況，而容易獲得良好之圖像之傾向。再者，(d)乙烯性不飽和化合物之含有比例之下限值通常為1質量%以上，較佳為5質量%以上。 再者，本發明之感光性著色組合物藉由使用(e)溶劑，而以其固形物成分濃度成為通常為5質量%以上、較佳為10質量%以上、更佳為15質量%以上、進而較佳為20質量%以上且通常為50質量%以下、較佳為30質量%以下之方式進行調液。 (f)分散劑之含有比例於感光性著色組合物之固形物成分中通常為1質量%以上，較佳為3質量%以上，更佳為5質量%以上，且通常為30質量%以下，較佳為20質量%以下，更佳為15質量%以下，進而較佳為10質量%以下。又，(f)分散劑相對於(a)著色劑100質量份之含有比例通常為5質量份以上，更佳為10質量份以上，進而較佳為15質量份以上，且通常為50質量份以下，尤佳為30質量份以下。藉由將(f)分散劑之含有比例設為上述下限值以上，有容易獲得充分之分散性之傾向，藉由設為上述上限值以下，有可抑制因其他成分之比例相對減少而導致感度、製版性等降低之情況之傾向。 於使用密接改善劑之情形時，其含有比例相對於感光性著色組合物中之全部固形物成分，通常為0.1～5質量%，較佳為0.2～3質量%，進而較佳為0.4～2質量%。藉由將密接改善劑之含有比例設為上述下限值以上，有可充分獲得改善密接性之效果之傾向，藉由設為上述上限值以下，有可抑制感度降低、顯影後殘留殘渣而成為缺陷之情況之傾向。 又，於使用界面活性劑之情形時，其含有比例相對於感光性著色組合物中之全部固形物成分，通常為0.001～10質量%，較佳為0.005～1質量%，進而較佳為0.01～0.5質量%，最佳為0.03～0.3質量%。藉由將界面活性劑之含量設為上述下限值以上，有容易表現出塗佈膜之平滑性、均一性之傾向，藉由設為上述上限值以下，有容易表現出塗佈膜之平滑性、均一性，亦可抑制其他特性變差之傾向。 ＜感光性著色組合物之物性＞ 本發明之感光性著色組合物可適宜地用於形成著色間隔件，就用作著色間隔件之觀點而言，較佳為呈黑色。又，將感光性著色組合物硬化而成之塗膜之每1 μm膜厚之光學密度(OD)較佳為1.0以上，更佳為1.2以上，進而較佳為1.5以上，尤佳為1.8以上，且通常為4.0以下，較佳為3.0以下，更佳為2.5以下。 ＜感光性著色組合物之製造方法＞ 本發明之感光性著色組合物(以下有時稱為「抗蝕劑」)可依照常規方法而製造。 通常較佳為使用塗料調節器、砂磨機、球磨機、輥磨機、石磨機、噴射磨機、均質機等對(a)著色劑預先進行分散處理。由於藉由分散處理將(a)著色劑微粒化，因此抗蝕劑之塗佈特性提高。 分散處理通常較佳為藉由併用(a)著色劑、(e)溶劑、及(f)分散劑、以及(b)鹼可溶性樹脂之一部分或全部之系統進行(以下有時將供於分散處理之混合物、及藉由該處理而獲得之組合物稱為「油墨」或「顏料分散液」)。尤其是若使用高分子分散劑作為(f)分散劑，則可抑制所獲得之油墨及抗蝕劑之經時增黏(分散穩定性優異)，故而較佳。 如上所述，於製造抗蝕劑之步驟中，較佳為製造至少含有(a)著色劑、(e)溶劑、及(f)分散劑之顏料分散液。作為顏料分散液可使用之(a)著色劑、(e)有機溶劑、及(f)分散劑，分別可較佳地採用作為感光性著色組合物可使用者而記載者。 再者，於對含有調配於感光性著色組合物中之全部成分之液體進行分散處理之情形時，由於分散處理時產生放熱，因此存在高反應性之成分改性之可能性。因此，較佳為藉由含有高分子分散劑之系統進行分散處理。 於藉由砂磨機使(a)著色劑分散之情形時，可較佳地使用0.1～8 mm左右之粒徑之玻璃珠或氧化鋯珠。分散處理條件如下：溫度通常為0℃至100℃，較佳為室溫至80℃之範圍。分散時間根據液之組成及分散處理裝置之尺寸等而合適時間有所不同，因此適當進行調節。分散標準為以抗蝕劑之20度鏡面光澤度(JIS Z8741)成為50～300之範圍之方式控制油墨之光澤。於抗蝕劑之光澤度較低之情形時，較多情況下分散處理不充分，而殘留粗糙之顏料(色料)粒子，存在顯影性、密接性、解像性等變得不充分之可能性。又，若進行分散處理直至光澤值超過上述範圍，則由於顏料破碎而產生大量超微粒，因此反而有分散穩定性受損之傾向。 又，分散於油墨中之顏料之分散粒徑通常為0.03～0.3 μm，可藉由動態光散射法等進行測定。 繼而，將藉由上述分散處理而獲得之油墨與抗蝕劑中所含之上述其他成分加以混合而製成均勻之溶液。於抗蝕劑之製造步驟中，由於較多情況下微細之污物會混入至液中，因此較理想為藉由過濾器等對所獲得之抗蝕劑進行過濾處理。 [硬化物] 藉由將本發明之感光性著色組合物硬化，可獲得硬化物。將感光性著色組合物硬化而成之硬化物可適宜地用作著色間隔件。 [著色間隔件] 繼而，依照使用本發明之感光性著色組合物之著色間隔件之製造方法對其進行說明。 (1)支持體 作為用以形成著色間隔件之支持體，只要有適度之強度，則其材質並無特別限定。主要使用透明基板，作為材質，例如可列舉：聚對苯二甲酸乙二酯等聚酯系樹脂、聚丙烯、聚乙烯等聚烯烴系樹脂、聚碳酸酯、聚甲基丙烯酸甲酯、聚碸等熱塑性樹脂製片材；環氧樹脂、不飽和聚酯樹脂、聚(甲基)丙烯酸系樹脂等熱硬化性樹脂片材、或各種玻璃等。其中，就耐熱性之觀點而言，較佳為玻璃、耐熱性樹脂。又，亦存在於基板之表面成膜ITO、IZO(Indium Zinc Oxide，氧化銦鋅)等透明電極之情形。除了透明基板以外，亦可於TFT陣列上形成。 為了改良接著性等表面物性，可視需要對支持體進行電暈放電處理、臭氧處理、矽烷偶合劑或胺基甲酸酯系樹脂等各種樹脂之薄膜形成處理等。 透明基板之厚度通常設為0.05～10 mm之範圍，較佳設為0.1～7 mm之範圍。又，於進行各種樹脂之薄膜形成處理之情形時，其膜厚通常為0.01～10 μm之範圍，較佳為0.05～5 μm之範圍。 (2)著色間隔件 本發明之感光性著色組合物係用於與公知之彩色濾光片用感光性著色組合物同樣之用途，以下，依照使用本發明之感光性著色組合物之黑色光間隔件之形成方法之具體例對用作著色間隔件(黑色光間隔件)之情形進行說明。 通常，藉由塗佈等方法以膜狀或圖案狀將感光性著色組合物供給於應設置黑色光間隔件之基板上，將溶劑加以乾燥。其次，藉由進行曝光-顯影之光微影法等方法進行圖案形成。其後，視需要進行追加曝光或熱硬化處理，藉此於該基板上形成黑色光間隔件。 (3)著色間隔件之形成 [1]對基板之供給方法 本發明之感光性著色組合物通常以溶解或分散於溶劑中之狀態供給至基板上。作為其供給方法，可藉由先前公知之方法進行，例如旋轉塗佈法、線棒塗佈法、流塗法、模塗法、輥塗法、噴塗法等。又，亦可藉由噴墨法或印刷法等，以圖案狀供給。其中，若藉由模塗法，則就可大幅削減塗佈液之使用量，且完全不會受利用旋轉塗佈法時附著之霧等之影響，可抑制雜質產生等綜合觀點而言較佳。 塗佈量根據用途而有所不同，例如於黑色光間隔件之情形時，乾燥膜厚通常為0.5 μm～10 μm之範圍，較佳為1 μm～9 μm之範圍，尤佳為1 μm～7 μm之範圍。又，重要的是乾燥膜厚或最終形成之間隔件之高度於基板全域上均勻。於偏差較大之情形時，會於液晶面板上產生不均缺陷。 但於藉由光微影法將本發明之感光性著色組合物一次性形成高度不同之黑色光間隔件之情形時，最終形成之黑色光間隔件之高度不同。 再者，可使用玻璃基板等公知之基板作為基板。又，基板表面為平面為宜。 [2]乾燥方法 將感光性著色組合物溶液供給至基板上後之乾燥較佳為利用使用加熱板、IR(infrared，紅外線)烘箱、對流烘箱之乾燥方法。又，亦可組合不提高溫度而於減壓腔室內進行乾燥之減壓乾燥法。 乾燥之條件可根據溶劑成分之種類、所使用之乾燥機之性能等而適當選擇。乾燥時間根據溶劑成分之種類、所使用之乾燥機之性能等，通常可於40℃～130℃之溫度下15秒～5分鐘之範圍內選擇，較佳為於50℃～110℃之溫度下30秒～3分鐘之範圍內選擇。 [3]曝光方法 曝光係於感光性著色組合物之塗佈膜上重疊負光罩圖案，經由該光罩圖案照射紫外線或可見光線之光源而進行。於使用曝光光罩進行曝光之情形時，可利用使曝光光罩靠近感光性著色組合物之塗佈膜之方法，或將曝光光罩配置於偏離感光性著色組合物之塗佈膜之位置，並投影經由該曝光光罩之曝光之光之方法。又，亦可利用不使用光罩圖案之藉由雷射光進行之掃描曝光方式。此時，為了防止由氧引起之光聚合性層之感度降低，可視需要於脫氧環境下進行，或於在光聚合性層上形成聚乙烯醇層等隔氧層後進行曝光。 作為本發明之較佳之態樣，於藉由光微影法同時形成高度不同之黑色光間隔件之情形時，例如使用具有遮光部(透光率0%)與作為複數個開口部之相對於平均透光率最高之開口部(完全透過開口部)平均透光率較小之開口部(中間透過開口部)的曝光光罩。藉由該方法，利用中間透過開口部與完全透過開口部之平均透光率之差、即曝光量之差而產生殘膜率之差異。 已知有例如利用具有微小之多角形之遮光單元的矩陣狀遮光圖案製作中間透過開口部之方法等。又，已知有作為吸收體，藉由鉻系、鉬系、鎢系、矽系等材料之膜對透光率進行控制而製作之方法等。 上述曝光所使用之光源並無特別限定。作為光源，例如可列舉：氙氣燈、鹵素燈、鎢絲燈、高壓水銀燈、超高壓水銀燈、金屬鹵化物燈、中壓水銀燈、低壓水銀燈、碳弧燈、螢光燈等燈光源，或氬離子雷射、YAG(Yttrium Aluminum Garnet，釔-鋁-石榴石)雷射、準分子雷射、氮雷射、氦-鎘雷射、藍紫色半導體雷射、近紅外半導體雷射等雷射光源等。於照射特定波長之光而使用之情形時，亦可利用光學濾光片。 作為光學濾光片，例如可為可藉由薄膜控制曝光波長中之透光率之類型，作為該情形時之材質，例如可列舉：Cr化合物(Cr之氧化物、氮化物、氮氧化物、氟化物等)、MoSi、Si、W、Al等。 作為曝光量，通常為1 mJ/cm2 以上，較佳為5 mJ/cm2 以上，更佳為10 mJ/cm2 以上，且通常為300 mJ/cm2 以下，較佳為200 mJ/cm2 以下，更佳為150 mJ/cm2 以下。 又，於近接曝光方式之情形時，曝光對象與光罩圖案之距離通常為10 μm以上，較佳為50 μm以上，更佳為75 μm以上，且通常為500 μm以下，較佳為400 μm以下，更佳為300 μm以下。 [4]顯影方法 進行上述曝光後，藉由使用鹼性化合物之水溶液、或有機溶劑之顯影，可於基板上形成圖像圖案。該水溶液中可進而含有界面活性劑、有機溶劑、緩衝劑、錯合劑、染料或顏料。 作為鹼性化合物，可列舉：氫氧化鈉、氫氧化鉀、氫氧化鋰、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、矽酸鈉、矽酸鉀、偏矽酸鈉、磷酸鈉、磷酸鉀、磷酸氫鈉、磷酸氫鉀、磷酸二氫鈉、磷酸二氫鉀、氫氧化銨等無機鹼性化合物；或單、二或三乙醇胺、單、二或三甲胺、單、二或三乙胺、單或二異丙胺、正丁胺、單、二或三異丙醇胺、伸乙基亞胺、伸乙基二亞胺、四甲基氫氧化銨(TMAH)、膽鹼等有機鹼性化合物。該等鹼性化合物可為兩種以上之混合物。 作為上述界面活性劑，例如可列舉：聚氧乙烯烷基醚類、聚氧乙烯烷基芳基醚類、聚氧乙烯烷基酯類、山梨糖醇酐烷基酯類、單甘油酯烷基酯類等非離子系界面活性劑；烷基苯磺酸鹽類、烷基萘磺酸鹽類、烷基硫酸鹽類、烷基磺酸鹽類、磺基丁二酸酯鹽類等陰離子性界面活性劑；烷基甜菜鹼類、胺基酸類等兩性界面活性劑。 作為有機溶劑，例如可列舉：異丙醇、苄醇、乙基賽路蘇、丁基賽路蘇、苯基賽路蘇、丙二醇、二丙酮醇等。有機溶劑可單獨使用，亦可與水溶液併用。 顯影處理之條件並無特別限制，通常可於顯影溫度為10～50℃之範圍，其中較佳為15～45℃、尤佳為20～40℃下，藉由浸漬顯影法、噴射顯影法、毛刷顯影法、超音波顯影法等任一顯影方法進行。 [5]追加曝光及熱硬化處理 可視需要藉由與上述曝光方法同樣之方法對顯影後之基板進行追加曝光，又，亦可進行熱硬化處理。關於此時之熱硬化處理條件，溫度可於100℃～280℃之範圍、較佳為150℃～250℃之範圍內選擇，時間は可於5分鐘～60分鐘之範圍內選擇。 本發明之著色間隔件之大小或形狀等係根據應用其之彩色濾光片之規格等而適當調整，本發明之感光性著色組合物尤其是對藉由光微影法同時形成間隔件與輔助間隔件高度不同之黑色光間隔件有用，於該情形時，間隔件之高度通常為2～7 μm左右，輔助間隔件通常具有較間隔件低0.2～1.5 μm左右之高度。 又，本發明之著色間隔件之每1 μm之光學密度(OD)就遮光性之觀點而言，較佳為1.2以上，更佳為1.5以上，進而較佳為1.8以上，且通常為4.0以下，較佳為3.0以下。此處，光學密度(OD)係藉由下文所述之方法測得之值。 [彩色濾光片] 本發明之彩色濾光片具備如上所述之本發明之著色間隔件，例如係於作為透明基板之玻璃基板上積層黑矩陣與紅色、綠色、藍色之像素著色層及表塗層，並於形成著色間隔件後形成配向膜而製造。 可將此種具有本發明之著色間隔件之彩色濾光片與液晶驅動側基板進行貼合而形成液晶單元，於形成之液晶單元中注入液晶，藉此製造具備本發明之著色間隔件之液晶顯示裝置等圖像顯示裝置。 [實施例] 繼而，列舉實施例及比較例更具體地說明本發明，但本發明只要不超過其主旨，則並不限定於以下實施例。 以下之實施例及比較例所使用之感光性著色組合物之構成成分如下所述。 ＜有機黑色顏料＞ BASF公司製造，Irgaphor(註冊商標) Black S 0100 CF(具有下述式(2)所表示之化學結構) [化58]＜鹼可溶性樹脂-A＞ 一面對丙二醇單甲醚乙酸酯145質量份進行氮氣置換一面加以攪拌，並升溫至120℃。於其中滴加苯乙烯10質量份、甲基丙烯酸縮水甘油酯85.2質量份及具有三環癸烷骨架之單丙烯酸酯(日立化成公司製造之FA-513M)66質量份，以及歷經3小時滴加2,2'-偶氮雙-2-甲基丁腈8.47質量份，進而於90℃下繼續攪拌2小時。其次將反應容器內置換為空氣，於丙烯酸43.2質量份中投入三(二甲胺基甲基)苯酚0.7質量份及對苯二酚0.12質量份，於100℃下持續反應12小時。其後，添加四氫鄰苯二甲酸酐(THPA)56.2質量份、三乙胺0.7質量份，於100℃下反應3.5小時。由此獲得之鹼可溶性樹脂-A之藉由GPC測得之重量平均分子量Mw約為8400，酸值為80 mgKOH/g。 ＜鹼可溶性樹脂-B＞ 一面對丙二醇單甲醚乙酸酯217.6質量份與丙二醇單甲醚53.9質量份之混合液進行氮氣置換一面加以攪拌，升溫至120℃。歷經3小時於其中滴加甲基丙烯酸苄酯3.52質量份、甲基丙烯酸58.5質量份、具有三環癸烷骨架之單丙烯酸酯FA-513M(日立化成公司製造)66.1質量份及2,2'-偶氮雙-2-甲基丁腈3.8質量份之混合液，進而於90℃下繼續攪拌2小時。其次，將反應容器內置換為空氣，投入甲基丙烯酸縮水甘油酯27.3質量份、三(二甲胺基甲基)苯酚0.6質量份及對苯二酚0.1質量份，於100℃下持續反應12小時。由此獲得之鹼可溶性樹脂-B之重量平均分子量Mw為16500，酸值為176 mgKOH/g。 ＜鹼可溶性樹脂-C＞ 一面對丙二醇單甲醚乙酸酯303.5質量份與丙二醇單甲醚75.9質量份之混合液進行氮氣置換一面加以攪拌，升溫至120℃。歷經3小時於其中滴加苯乙烯10.4質量份、甲基丙烯酸34.4質量份、具有三環癸烷骨架之單丙烯酸酯FA-513M(日立化成公司製造)66.1質量份及2,2'-偶氮雙-2-甲基丁腈8.7質量份之混合液，進而於90℃下繼續攪拌2小時。其次，將反應容器內置換為空氣，投入甲基丙烯酸縮水甘油酯9.9質量份、三(二甲胺基甲基)苯酚0.2質量份及對苯二酚0.04質量份，於100℃下持續反應12小時。由此獲得之鹼可溶性樹脂-C之重量平均分子量Mw為7200，酸值為86 mgKOH/g。 ＜鹼可溶性樹脂-D＞ 日本化藥公司製造之「ZCR-1642H」(Mw＝6500，酸值＝98 mgKOH/g) ＜鹼可溶性樹脂-E＞ [化59]將上述結構之環氧化合物(環氧當量264)50 g、丙烯酸13.65 g、甲氧基乙酸丁酯60.5 g、三苯基膦0.936 g、及對甲氧基苯酚0.032 g裝入至安裝有溫度計、攪拌機、冷卻管之燒瓶中，一面加以攪拌一面於90℃下反應至酸值成為5 mgKOH/g以下為止。反應需要12小時，獲得環氧丙烯酸酯溶液。 將上述環氧丙烯酸酯溶液25質量份及三羥甲基丙烷(TMP)0.76質量份、聯苯四羧酸二酐(BPDA)3.3質量份、四氫鄰苯二甲酸酐(THPA)3.5質量份裝入至安裝有溫度計、攪拌機、冷卻管之燒瓶中，一面加以攪拌一面緩慢升溫至105℃而進行反應。 於樹脂溶液變得透明時，以甲氧基乙酸丁酯進行稀釋，以固形物成分成為50質量%之方式進行製備，而獲得酸值113 mgKOH/g、藉由GPC測得之聚苯乙烯換算之重量平均分子量(Mw)2600、雙鍵當量520 g/mol之含羧基之環氧甲基丙烯酸酯樹脂(鹼可溶性樹脂-E)。 ＜鹼可溶性樹脂-F＞ 一面對丙二醇單甲醚乙酸酯214.5質量份與丙二醇單甲醚53.6質量份之混合液進行氮氣置換一面加以攪拌，升溫至120℃。歷經3小時於其中滴加甲基丙烯酸苄酯68.7質量份、甲基丙烯酸43.9質量份、具有三環癸烷骨架之單丙烯酸酯FA-513M(日立化成公司製造)22.0質量份及2,2'-偶氮雙-2-甲基丁腈1.4質量份之混合液，進而於90℃下繼續攪拌2小時。其次，將反應容器內置換為空氣，投入甲基丙烯酸縮水甘油酯21.3質量份、三(二甲胺基甲基)苯酚0.5質量份及對苯二酚0.1質量份，於100℃下持續反應12小時。由此獲得之鹼可溶性樹脂-F之重量平均分子量Mw為44100，酸值為130 mgKOH/g。 ＜鹼可溶性樹脂-G＞ 一面對丙二醇單甲醚乙酸酯210.1質量份與丙二醇單甲醚52.5質量份之混合液進行氮氣置換一面加以攪拌，升溫至120℃。歷經3小時於其中滴加甲基丙烯酸苄酯3.52質量份、甲基丙烯酸68.8質量份、具有三環癸烷骨架之單丙烯酸酯FA-513M(日立化成公司製造)39.7質量份及2,2'-偶氮雙-2-甲基丁腈3.3質量份之混合液，進而於90℃下繼續攪拌2小時。其次，將反應容器內置換為空氣，投入甲基丙烯酸縮水甘油酯38.4質量份、三(二甲胺基甲基)苯酚0.8質量份及對苯二酚0.1質量份，於100℃下持續反應12小時。由此獲得之鹼可溶性樹脂-G之重量平均分子量Mw為19100，酸值為198 mgKOH/g。 ＜分散劑-I＞ BYK-Chemie公司製造之「DISPERBYK-LPN21116」(包含側鏈具有四級銨鹽基及三級胺基之A嵌段與不具有四級銨鹽基及三級胺基之B嵌段的丙烯酸系A-B嵌段共聚物。胺值為70 mgKOH/g，酸值為1 mgKOH/g以下) 於分散劑-I之A嵌段中含有下述式(1a)及(2a)之重複單元，於B嵌段中含有下述式(3a)之重複單元。下述式(1a)、(2a)、及(3a)之重複單元於分散劑-I之總重複單元中所占之含有比例分別為11.1莫耳%、22.2莫耳%、6.7莫耳%。 [化60]＜分散劑-II＞ BYK-Chemie公司製造之「DISPERBYK-167」(胺基甲酸酯系高分子分散劑) ＜顏料衍生物＞ Lubrizol公司製造之「Solsperse12000」 ＜溶劑-I＞ PGMEA：丙二醇單甲醚乙酸酯 ＜溶劑-II＞ MB：3-甲氧基丁醇 ＜光聚合起始劑＞ 下述結構之化合物 [化61]＜光聚合性單體＞ DPHA：日本化藥公司製造之二季戊四醇六丙烯酸酯 ＜添加劑＞ 日本化藥公司製造，KAYAMER PM-21(含甲基丙烯醯基之磷酸酯) ＜界面活性劑＞ DIC公司製造之MEGAFAC F-559 ＜每單位膜厚之光學密度(單位OD值)之測定＞ 每單位膜厚之光學密度係藉由以下順序進行測定。 首先，以最終膜厚成為2 μm之方式藉由旋轉塗佈機將所製備之感光性著色組合物塗佈於玻璃基板上，減壓乾燥1分鐘後，於加熱板溫度80℃下乾燥70秒。經過曝光及顯影步驟後於烘箱溫度230℃下加熱20分鐘，藉此獲得抗蝕劑塗佈基板。藉由透過濃度計Gretag Macbeth D200-II測定所獲得之基板之光學密度(OD)，藉由Ryoka Systems公司製造之非接觸表面/層剖面形狀計測系統VertScan(R)2.0測定膜厚，根據光學密度(OD)及膜厚算出每單位膜厚之光學密度。再者，OD值係表示遮光能力之數值，數值越大表示遮光性越高。 ＜NMP溶出試驗＞ N-甲基吡咯啶酮(NMP)溶出試驗係藉由以下順序進行。 首先，以最終膜厚成為2 μm之方式藉由旋轉塗佈機將所製備之感光性著色組合物塗佈於玻璃基板上，減壓乾燥1分鐘後，於加熱板溫度80℃下乾燥70秒。經過曝光及顯影步驟後於烘箱溫度230℃下加熱20分鐘而獲得抗蝕劑塗佈基板。自所製作之抗蝕劑塗佈基板切下2塊測定用基板(2.5 cm×1.0 cm見方)，浸漬於裝有N-甲基吡咯啶酮(NMP)8 mL之10 mL用小瓶中。然後，以將該裝有測定用基板之小瓶於80℃之熱浴中靜置40分鐘之狀態實施NMP溶出試驗。靜置40分鐘後自熱浴中將小瓶取出，藉由分光光度計(島津製作所公司製造之「UV-3100PC」)於300～800 nm之波長範圍內以1 nm為間隔對該NMP溶出溶液測定吸光度。光源使用鹵素燈及氘燈(切換波長360 nm)，檢測器使用光電倍增器，以狹縫寬度2 nm作為測定條件。又，將試樣溶液(NMP溶出溶液)置於1 cm見方之石英皿進行測定。所謂吸光度係分光法中表示光通過某物體時光強度會衰減何種程度之無因次量，由以下之式所定義。 A(吸光度)＝-log10 (I/I0 ) (I：透過光強度、I0 ：入射光強度) 又，自相同之光源分別向試樣溶液與NMP單獨液入射光時，可將透過NMP單獨液之光強度視為I0 ，將透過試樣溶液之光強度視為I。因此，上式之(I/I0 )表示透光率，吸光度A為以對數表現透過率之倒數而得之值。吸光度A係算出試樣溶液所含之物質之濃度等時所使用之表述。於吸光度A＝0之情形時，表示完全未吸收光之狀態(透過率100%)，於吸光度A＝∞之情形時，表示光完全未透過之狀態(透過率0%)。即，吸光度越強，表示抗蝕劑塗膜成分越多地溶出至NMP中，NMP耐性越差。算出所測得之吸光度之光譜面積(nm)，將面積值未達20(nm)評價為○，將為20(nm)以上評價為×，對NMP耐性進行評價。作為本評價基準之吸光度之光譜面積可以各波長下之吸光度之和表示，意指所溶出之抗蝕劑成分之總和。 NMP耐性評價基準：利用吸光度之光譜面積值進行之判定(波長300～800 nm) ○：未達20(nm) ×：20(nm)以上 ＜表面平滑性之評價＞ 表面平滑性及下述之表面粗度之評價係藉由以下順序進行。 首先，以最終膜厚成為3 μm之方式藉由旋轉塗佈機將所製備之感光性著色組合物塗佈於玻璃基板上，減壓乾燥1分鐘後，於加熱板溫度80℃下乾燥70秒。經過曝光及顯影步驟後於烘箱溫度230℃下加熱20分鐘而獲得抗蝕劑塗佈基板。對於所製作之抗蝕劑塗佈基板，藉由光學顯微鏡於70 μm×70 μm之視野下觀察加熱後之表面有無皺褶產生。再者，評價基準如以下所述。 ○：於圖案之表面未觀察到微米級之皺褶 ×：於圖案之表面明顯存在微米級之皺褶 ＜表面粗度之評價＞ 對於上述＜表面平滑性之評價＞中所製作之抗蝕劑塗佈基板，藉由Ryoka Systems公司製造之三維非接觸表面形狀計測系統Micromap，使用50倍之光學透鏡，以Focus模式於70 μm×70 μm之視野中測定表面粗度Sa(算術平均粗糙度，μm)。 ＜顏料分散液1、3及4之製備＞ 以成為表1所記載之質量比之方式將表1所記載之顏料、分散劑、分散助劑、鹼可溶性樹脂、及溶劑加以混合。藉由塗料振盪機於25～45℃之範圍內對該混合液進行3小時之分散處理。使用0.5 mm之氧化鋯珠作為珠粒，添加分散液之2.5倍之質量。分散結束後，藉由過濾器將珠粒與分散液分離，而製備顏料分散液1、3及4。 [表1] ＜顏料分散液2(被覆碳黑分散液)＞ 碳黑係藉由通常之油爐法而製造。其中，使用Na、Ca、S分量較少之乙烯焦油作為原料油，燃燒用使用焦爐煤氣。進而，使用經離子交換樹脂處理之純水作為反應停止水。使用均質機，以5,000～6,000 rpm將所獲得之碳黑540 g與純水14500 g一併攪拌30分鐘而獲得漿料。將該漿料轉移至附螺旋型攪拌機之容器中，一面以約1,000 rpm加以混合一面逐量添加溶解有環氧樹脂「Epikote 828」(三菱化學公司製造)60 g之甲苯600 g。於約15分鐘內分散於水中之碳黑全部轉移至甲苯側，成為約1 mm之粒。 繼而，藉由60目金屬線網甩掉水後，置入真空乾燥機中，於70℃下乾燥7小時，而將甲苯與水完全去除。 以成為表1所記載之質量比之方式將所獲得之被覆碳黑、分散劑、顏料衍生物及溶劑加以混合。 藉由攪拌機將其充分攪拌而進行預混。繼而，藉由塗料振盪機於25～45℃之範圍內進行6小時之分散處理。使用0.5 mm之氧化鋯珠作為珠粒，添加與分散液相同之質量。分散結束後，藉由過濾器將珠粒與分散液分離，而製備顏料分散液2。 [實施例1～6、比較例1～3] 以固形物成分比率成為表2之調配比例之方式添加各成分，進而以固形物成分成為22質量%之方式添加PGMEA，加以攪拌而使其溶解，從而製備感光性著色組合物。將所製備之組合物之固形物成分比率示於表2。又，將藉由上文所述之方法測得之單位OD值、NMP溶出試驗、表面平滑性及表面粗糙度之評價結果示於表2。再者，表2中之感光性著色組合物之質量份表示固形物成分之質量份。 [表2] 表2之實施例1與比較例1及2之比較揭示出，包含(b-I)環氧(甲基)丙烯酸酯樹脂與(b-II)含有12莫耳%以上之具有乙烯性不飽和鍵之重複單元α且含有源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂的感光性著色組合物可確保較高之遮光性，同時可靠性與表面平滑性優異。另一方面，重複單元α未達12莫耳%之比較例1之可靠性不良，又，不含(b-II)(甲基)丙烯酸系共聚合樹脂之比較例2之表面平滑性不良。 於如比較例2般主要之樹脂成分為(b-I)環氧(甲基)丙烯酸酯樹脂之情形時，認為由其結構引起之熱流動導致表面平滑性變得不良。因此認為，藉由除了環氧(甲基)丙烯酸酯樹脂以外亦使用不易熱流動之含有源自不飽和羧酸之重複單元的(甲基)丙烯酸系共聚合樹脂，熱流動減少而改善表面平滑性。但由於此種(甲基)丙烯酸系共聚合樹脂通常與環氧(甲基)丙烯酸酯樹脂相比感度較低，故而存在硬化性降低，如比較例1般可靠性變差之情形。因此認為，藉由提高(甲基)丙烯酸系共聚合樹脂中之具有乙烯性不飽和鍵之重複單元α之含有比例，可確保充分之硬化性，兼顧可靠性與表面平滑性。 又，實施例1～3之比較揭示出，於著色劑含有有機顏料與碳黑之情形，或含有選自由紅色顏料及橙色顏料所組成之群中之至少一種與選自由藍色顏料及紫色顏料所組成之群中之至少一種之情形時，不論具體之顏料種類為何，均可確保較高之遮光性，同時可靠性與表面平滑性優異。 相對於此，著色劑僅為紫外線吸收性較高之碳黑之比較例3的表面平滑性不充分。 另一方面，實施例2與4之比較揭示出，不論(b-I)環氧(甲基)丙烯酸酯樹脂之種類為何，可靠性均優異。另一方面，實施例1、5、6之比較揭示出，若(b-II)樹脂中之具有乙烯性不飽和鍵之重複單元α之含有比例為12莫耳%以上，則不論其具體之含有比例之值如何，可靠性與表面平滑性均優異。 已使用特定之態樣對本發明進行了詳細說明，但業者明白，可不脫離本發明之意圖與範圍而進行各種變更及變形。再者，本申請案基於2015年12月24日提出申請之日本專利申請案(日本專利特願2015-252149)，藉由引用而援引其全部內容。 [產業上之可利用性] 根據本發明之感光性著色組合物，可提供一種遮光性較高、高可靠性且表面平滑性優異之硬化物及著色間隔件，進而，可提供具備此種著色間隔件之圖像顯示裝置。因此，本發明於感光性著色組合物、硬化物、著色間隔件及圖像顯示裝置之各領域內，產業上之可利用性極高。The embodiments of the present invention are specifically described below, but the present invention is not limited to the embodiments described below, and various modifications can be made without departing from the spirit and scope of the invention. In the present invention, "(meth)acrylic acid" means "acrylic acid and/or methacrylic acid", and "(meth)acrylate" and "(meth)acrylylene group" are also the same. In the present invention, the term "(co)polymer" means both a homopolymer and a copolymer, and the so-called "acid (anhydride)", "(anhydrous) ... acid" means acid. Both with its anhydride. In the present invention, the term "acrylic resin" means a (co)polymer containing (meth)acrylic acid and a (co)polymer containing a (meth)acrylate having a carboxyl group. Further, in the present invention, the term "monomer" is used in relation to a so-called high molecular substance (polymer), and its meaning includes dimers, trimers, and lows in addition to a narrow monomer. Polymer, etc. In the present invention, the term "all solid components" means all components other than the solvent contained in the photosensitive coloring composition or the ink described below. In the present invention, the "weight average molecular weight" means a weight average molecular weight (Mw) in terms of polystyrene obtained by GPC (gel permeation chromatography). In the present invention, the "amine value" is an amine value in terms of an effective solid content, unless otherwise specified, and is expressed by the amount of alkali of the solid content of the dispersant and the mass of KOH of the equivalent amount. The value. Furthermore, the measurement method will be described below. On the other hand, the "acid value" is an acid value converted into an effective solid content, and is calculated by neutralization titration unless otherwise specified. In addition, in this specification, the percentage or part expressed by "mass" has the same meaning as the percentage or part expressed by "weight". [Photosensitive Coloring Composition] The photosensitive coloring composition of the present invention contains (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) The solvent and (f) a dispersant are essential components, and may further contain an adhesion improving agent such as a decane coupling agent, a coating property improver, a development improver, an ultraviolet absorber, an antioxidant, a surfactant, a pigment derivative, etc., as necessary. Other compounding components are usually used in a state of being dissolved or dispersed in a solvent. In the photosensitive coloring composition of the first aspect of the present invention, (a) the coloring agent contains an organic pigment and carbon black. Further, in the photosensitive coloring composition of the second aspect of the invention, the (a) coloring agent contains at least one selected from the group consisting of a red pigment and an orange pigment and is selected from the group consisting of a blue pigment and a purple pigment. At least one of the groups. Further, the photosensitive coloring composition of the third aspect of the present invention is for forming a colored spacer. In the following, the photosensitive coloring composition of the present invention refers to the photosensitive coloring composition of the first aspect, the photosensitive coloring composition of the second aspect, and the photosensitive state of the third aspect, unless otherwise specified. The entire coloring composition. <(a) Colorant> The coloring agent (a) used in the photosensitive coloring composition of the present invention is not particularly limited as long as it is a coloring agent capable of coloring the photosensitive coloring composition or the cured product obtained by curing the photosensitive coloring composition. For example, a pigment or a dye can be exemplified, and a pigment can be preferably used from the viewpoint of durability. The pigment is an organic pigment or an inorganic pigment, and from the viewpoint of suppressing a decrease in the voltage holding ratio of the liquid crystal, it is preferable to use an organic pigment from the viewpoint of suppressing the absorption of ultraviolet rays and easily controlling the shape or the step. . The (a) coloring agent used in the photosensitive coloring composition of the first aspect of the present invention contains an organic pigment and carbon black. Thus, by using an organic pigment which absorbs less ultraviolet rays, the control of the shape or the step is facilitated, the surface smoothness is also improved, and carbon black is used in addition to the organic pigment. Achieve high opacity. The type of the organic pigment is not particularly limited, and from the viewpoint of adhesion, it is preferred to contain at least one organic coloring pigment selected from the group consisting of a red pigment, an orange pigment, a blue pigment, and a violet pigment. Further, from the viewpoint of light blocking properties, it is preferred to contain an organic black pigment. The chemical structure of the pigments is not particularly limited, and azo, phthalocyanine, quinacridone, benzimidazolone, isoindolinone, diterpene, and indanthrene are used. In addition to organic pigments such as lanthanum and lanthanide, various inorganic pigments and the like can be used. Hereinafter, specific examples of the pigment which can be used are exemplified by the pigment number. The terms "C.I. Pigment Red 2" as exemplified below mean the color index (C.I.). As the red pigment, CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53: 1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81: 1, 81:2, 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276. Among them, preferred are CI Pigment Red 48:1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254, and 272, and further preferably CI Pigment Red 149 , 177, 179, 194, 209, 224, 254. Further, in terms of dispersibility or light-shielding property, CI Pigment Red 177, 254, and 272 are preferably used, and in the case of curing by ultraviolet rays, it is preferred to use a lower ultraviolet absorptivity as a red pigment. From this point of view, it is more preferable to use CI Pigment Red 254, 272. As the orange pigment, CI Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79. Among them, preferred are C.I. Pigment Oranges 38, 43, 64, 71, and 72. Further, in terms of dispersibility or light-shielding property, it is preferred to use CI Pigment Oranges 43, 64, 72, and in the case of curing by ultraviolet rays, it is preferred to use an ultraviolet-absorbing rate lower as an orange pigment. From this point of view, it is more preferable to use CI Pigment Orange 64, 72. As the blue pigment, CI Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25 , 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78 79. Among them, preferred are C.I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 60, and more preferably C.I. Pigment Blue 15:6. Further, in terms of dispersibility or light-shielding property, it is preferred to use CI Pigment Blue 15:6, 16, 60, and in the case of curing by ultraviolet rays, it is preferred to use a lower ultraviolet absorption rate as a Blue pigment, from this point of view, it is more preferable to use CI Pigment Blue 60. As the purple pigment, CI Pigment Violet 1, 1:1, 2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. Among them, C.I. Pigment Violet 19, 23, and 29 are preferable, and C.I. Pigment Violet 23 is further preferably used. Further, in terms of dispersibility or light-shielding property, it is preferred to use CI Pigment Violet 23, 29, and in the case of curing by ultraviolet rays, it is preferred to use a violet-absorbing pigment as a purple pigment. From this point of view, it is more preferable to use CI Pigment Violet 29. Examples of the organic coloring pigment which can be used in addition to the red pigment, the orange pigment, the blue pigment, and the violet pigment include a green pigment and a yellow pigment. As the green pigment, C.I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55 is exemplified. Among them, C.I. Pigment Green 7, 36 is preferable. As the yellow pigment, CI Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170,172,173,174,175,176,180,181,182,183,184,185,188,189,190,191,191:1,192,193,194,195,196 199, 200, 202, 203, 204, 205, 206, 207, 208. Among them, preferred are C.I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185, and further preferably C.I. Pigment Yellow 83, 138, 139, 150, 180. Among these, it is preferable to contain at least one of the following pigments from the viewpoint of the light-shielding property or the control of the shape and the step. Red pigment: CI Pigment Red 177, 254, 272 Orange Pigment: CI Pigment Orange 43, 64, 72 Blue Pigment: CI Pigment Blue 15: 6, 60 Purple Pigment: CI Pigment Violet 23, 29 Again, in shade or shape From the viewpoint of the control of the step, the red pigment is preferably the following (1), the orange pigment is preferably the following (2), the blue pigment is preferably the following (3), and the violet pigment is preferably the following (4). (1) at least one selected from the group consisting of CI Pigment Red 177, 254 (2) selected from at least one of CI Pigment Oranges 43, 64 (3) selected from at least one of CI Pigment Blues 15: 6, 60 (4) Further, at least one selected from the group consisting of CI Pigment Violet 23 and 29, in the case of using a plurality of kinds of organic pigments in the photosensitive coloring composition of the first aspect, the combination is not particularly limited, and the visible light region is used. Particularly, from the viewpoint of light blocking properties in a long wavelength region, it is preferred to use a blue pigment and/or a violet pigment. In particular, since the absorbance in the absorption spectrum of carbon black gradually decreases from a short wavelength to a long wavelength, and the absorbance in the ultraviolet region is higher than that of the organic pigment, it is preferable to use both the light-shielding property and the plate-making property. Blue pigments and/or violet pigments and carbon black, more preferably blue pigments and purple pigments and carbon black. On the other hand, in the case of using a small amount of carbon black, from the viewpoint of light blocking property, it is preferred to contain at least one selected from the group consisting of a red pigment and an orange pigment and selected from the group consisting of blue pigments and purple pigments. At least one of the group of the composition may be, for example, a combination of a red pigment and a blue pigment, a combination of a blue pigment and an orange pigment, a combination of a blue pigment and an orange pigment, and a violet pigment. Further, in addition to the organic coloring pigments, a black coloring material can be further used. Examples of the black colorant include inorganic black pigments such as carbon black and organic black pigments. On the other hand, an organic black pigment can also be used instead of the organic coloring pigment. The photosensitive coloring composition of the first aspect contains carbon black as a black colorant. Thus, by using carbon black in addition to the organic pigment, high light-shielding properties can be achieved. In the case of using carbon black, in particular, since surface smoothness tends to be deteriorated, there is a tendency to improve the situation by applying the present invention. Examples of the carbon black include carbon black as follows. Mitsubishi Chemical Corporation manufactures: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, #5, #10, #20, #25, #30, #32, #33, #40 , #44, #45, #47, #50, #52, #55, #650, #750, #850, #900, #950, #960, #970, #980, #990, #1000,# 2200, #2300, #2350, #2400, #2600, #2650, #3030, #3050, #3150, #3250, #3400, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B , OIL11B, OIL30B, OIL31B Degussa company: Printex (registered trademark, the same below) 3, Printex3OP, Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, Printex A, Printex L, Printex G , Printex P, Printex U, Printex V, PrintexG, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW18, Color Black FW200, Color Black S160, Color Black S170 Cabot : Monarch (registered trademark, the same below) 120, Monarch280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL (registered trademark, the same below) 99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R , REGAL, REGAL, R, R, R, R, R , RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN1000, RAVEN1020, RAVEN1040, RAVEN1060U, RAVEN1080U, RAVEN1170, RAVEN1190U, RAVEN1250, RAVEN1500, RAVEN2000, RAVEN2500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750 RAVEN7000 carbon black can also be used by resin coating. When carbon black coated with a resin is used, the effect of improving the adhesion to the glass substrate or the volume resistance value is obtained. For example, carbon black or the like described in JP-A-H09-71733 can be suitably used as the carbon black coated with the resin. The resin coated carbon black can be suitably used in terms of volume resistance or dielectric constant. As the carbon black to be coated by the resin, the total content of Na and Ca is preferably 100 ppm or less. Carbon black usually contains Na or Ca, K, Mg, Al, which are mixed in from the raw material oil or combustion oil (or gas) at the time of manufacture, the reaction stop water or granulated water, and the furnace material of the reaction furnace, in a percentage level. Fe or the like as the ash of the composition. In general, each of several hundred ppm or more of Na or Ca is contained, and by reducing the amount, it is possible to suppress penetration into a transparent electrode (ITO (Indium Tin Oxides)) or other electrodes, thereby preventing electrical short circuit. The tendency. As a method of reducing the content of the ash containing the Na or Ca, it is possible to strictly select the content of such a content as little as the raw material oil or fuel oil (or gas) in the production of carbon black, and to stop the water and the reaction. It is possible to reduce the amount of the alkaline substance added to the structure. As another method, a method of dissolving and removing Na or Ca by washing carbon black produced by a furnace with water or hydrochloric acid is mentioned. Specifically, after the carbon black is mixed and dispersed in water, hydrochloric acid, or hydrogen peroxide water, if a solvent that is hardly soluble in water is added, the carbon black is transferred to the solvent side, completely separated from the water, and is present in the carbon black. Most of Na or Ca is dissolved in water or acid and removed. In order to reduce the total amount of Na and Ca to 100 ppm or less, there is also a case where the carbon black manufacturing process of the raw material is strictly selected or the water or acid dissolution method alone is used, but the two methods are used together. It is easier to make the total amount of Na and Ca 100 ppm or less. Further, the resin-coated carbon black is preferably a so-called acidic carbon black having a pH of 6 or less. Since the dispersion diameter (agglomeration diameter) in water becomes small, it is preferable to coat the fine unit. Further preferably, the average particle diameter is 40 nm or less, and the dibutyl phthalate (DBP) absorption amount is 140 ml/100 g or less. When it is set to the above range, there is a tendency that a coating film having good light blocking properties can be obtained. The average particle diameter means a number average particle diameter, which means a circle-equivalent diameter obtained by particle image analysis, and the particle image analysis system takes several fields of view by photographs taken by tens of thousands of times by electron microscopic observation. The particles of the photographs of about 2,000 to 3,000 or so are measured by the image processing apparatus. The method for preparing the carbon black coated with the resin is not particularly limited. For example, after appropriately adjusting the blending amount of the carbon black and the resin, the following method is employed: 1. The resin is mixed with a solvent such as cyclohexanone, toluene or xylene, and dissolved by heating. The obtained resin solution is mixed and stirred with a suspension of carbon black and water to separate the carbon black from the water, and then the water is removed and heated and kneaded, and the obtained composition is formed into a sheet shape and pulverized. a method of drying; 2. mixing and stirring a resin solution prepared in the same manner as above and a suspension of the carbon black and the resin, separating and heating the obtained granular material to remove the remaining a solvent and a water method; 3. Dissolving a carboxylic acid such as maleic acid or fumaric acid in the solvent exemplified above, adding and mixing carbon black, and drying the solvent to obtain a carbon black to which a carboxylic acid is added. a method in which a resin is added and dry-blended; 4. A suspension is prepared by rapidly stirring a reactive group-containing monomer component constituting the coated resin with water, and after cooling, the polymer suspension is cooled. Obtained Reactive group of the resin containing therein carbon black is added and kneaded, so that carbon black is reacted with the reactive group (so that the carbon black graft), and cooling and pulverizing method of the like. The type of the resin to be coated is not particularly limited, and is usually a synthetic resin. Further, the resin having a benzene ring in the structure is more effective as an amphoteric surfactant, and therefore is preferable in terms of dispersibility and dispersion stability. . As the specific synthetic resin, a thermosetting resin such as a phenol resin, a melamine resin, a xylene resin, a diallyl phthalate resin, a glycerin resin, an epoxy resin, or an alkylbenzene resin; or a polyphenylene can be used; Ethylene, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, modified polyphenylene ether, polyfluorene, polyparaphenylene terephthalamide, polyamidoximine, A thermoplastic resin such as polyimine, polyamine bis-butenylene diimide, polyether oxime, polyphenyl fluorene, polyarylate, or polyether ether ketone. The coating amount of the resin to the carbon black is preferably from 1 to 30% by mass based on the total amount of the carbon black and the resin, and the coating tends to be sufficiently carried out by setting it to the above lower limit value. On the other hand, when it is set to the above upper limit or less, it is possible to prevent adhesion of the resins to each other, and it tends to be excellent in dispersibility. The carbon black obtained by coating the resin in the above manner can be used as a light-shielding material for coloring the spacer according to a conventional method, and a color filter having the colored spacer as a constituent element can be produced by a conventional method. When such a carbon black is used, there is a tendency to achieve a color-blocking member having a high light-shielding ratio and a low surface reflectance at a low cost. Further, it is also presumed that the surface of the carbon black is coated with a resin, and Ca or Na is also enclosed in the carbon black. As a black coloring material other than carbon black, it is preferable to use an organic black pigment from the viewpoint of suppressing the decrease in the voltage holding ratio of the liquid crystal and suppressing the absorption of ultraviolet rays to easily control the shape or the step. In particular, from the viewpoint of light-shielding properties, it is preferred to use a salt selected from the group consisting of a compound represented by the following formula (1), a geometric isomer of the compound, a salt of the compound, and a geometric isomer of the compound. At least one organic black pigment in the group (hereinafter sometimes referred to as "the organic black pigment represented by the above formula (1)"). [Chemical 3]In formula (1), R11 And R16 Independent of each other as a hydrogen atom, CH3 , CF3 , fluorine atom or chlorine atom; R12 , R13 , R14 , R15 , R17 , R18 , R19 And R20 Independent of all others, it is a hydrogen atom, a halogen atom, Rtwenty one , COOH, COORtwenty one COO- , CONH2 , CONHRtwenty one , CONRtwenty one Rtwenty two , CN, OH, ORtwenty one COCRtwenty one OCONH2 OCONHRtwenty one OCONRtwenty one Rtwenty two NO2 NH2 NHRtwenty one NRtwenty one Rtwenty two NHCORtwenty two NRtwenty one CORtwenty two , N=CH2 , N=CHRtwenty one , N=CRtwenty one Rtwenty two , SH, SRtwenty one , SORtwenty one , SO2 Rtwenty one , SO3 Rtwenty one , SO3 H, SO3 - , SO2 NH2 , SO2 NHRtwenty one Or SO2 NRtwenty one Rtwenty two ; and selected from R12 With R13 , R13 With R14 , R14 With R15 , R17 With R18 , R18 With R19 And R19 With R20 At least one of the combined groups may be directly bonded to each other or using an oxygen atom, a sulfur atom, NH or NRtwenty one Bridge and interlock with each other; Rtwenty one And Rtwenty two Independent of each other, it is an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms or an alkynyl group having 2 to 12 carbon atoms. The geometric isomer of the compound represented by the formula (1) has the following core structure (wherein the substituent in the structural formula is omitted), and it is likely that the most stable is a trans-trans isomer. [Chemical 4]When the compound represented by the formula (1) is anionic, it is preferably any known cation such as a metal, an organic, an inorganic or a metal organic cation, specifically an alkali metal or an alkaline earth metal. A salt of a tetra-ammonium or an organometallic complex such as a transition metal, a primary ammonium, a secondary ammonium or a trialkylammonium such as a tertiary ammonium or a tetraalkylammonium to compensate for its charge. Further, in the case where the geometric isomer of the compound represented by the formula (1) is anionic, the same salt is preferred. In the substituent of the formula (1) and the definitions thereof, the masking ratio tends to be high, and therefore it is preferably the following. The reason for this is that the following substituents are considered to have no absorption and do not affect the hue of the pigment. R12 , R14 , R15 , R17 , R19 And R20 They are independent of each other, preferably a hydrogen atom, a fluorine atom, or a chlorine atom, and more preferably a hydrogen atom. R13 And R18 Independent of each other, preferably hydrogen atom, NO2 OCH3 OC2 H5 , bromine atom, chlorine atom, CH3 , C2 H5 , N (CH3 )2 , N (CH3 ) (C2 H5 ), N (C)2 H5 )2 , α-naphthyl, β-naphthyl, SO3 H or SO3 - Further preferably a hydrogen atom or SO3 H. R11 And R16 Independent of each other, preferably hydrogen atom, CH3 Or CF3 Further, it is preferably a hydrogen atom. Preferably selected from the group consisting of R11 With R16 , R12 With R17 , R13 With R18 , R14 With R19 And R15 With R20 At least one of the group consisting of the same combination, more preferably R11 With R16 Same, R12 With R17 Same, R13 With R18 Same, R14 With R19 Same, and R15 With R20 the same. The alkyl group having 1 to 12 carbon atoms is, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, t-butyl, 2-methylbutyl, N-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2- Ethylhexyl, decyl, decyl, undecyl or dodecyl. The cycloalkyl group having 3 to 12 carbon atoms is, for example, cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, thujyl. ,dropbase,Base, Norcaryl, sulfhydryl, decyl, norbornyl, fluorenyl, 1-adamantyl or 2-adamantyl. The alkenyl group having 2 to 12 carbon atoms is, for example, vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, 1,3-butane Alken-2-yl, 2-penten-1-yl, 3-penten-2-yl, 2-indol-1-but-3-yl, 2-methyl-3-butene-2- Base, 3-methyl-2-buten-1-yl, 1,4-pentadien-3-yl, hexenyl, octenyl, nonenyl, nonenyl or dodecenyl. The cycloalkenyl group having 3 to 12 carbon atoms is, for example, 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, 3-cyclohexene-1- Base, 2,4-cyclohexadien-1-yl, 1-p-butene-8-yl, 4(10)-pentacene-10-yl, 2-lowerAlkene-1-yl, 2,5-lowerDien-1-yl, 7,7-dimethyl-2,4-norpred-3-yl orAlkenyl (camphenyl). The alkynyl group having 2 to 12 carbon atoms is, for example, 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, 2-methyl-3-butyn-2- , 1,4-pentadiyn-3-yl, 1,3-pentadiyn-5-yl, 1-hexyne-6-yl, cis-3-methyl-2-pentene-4-yne -1-yl, trans-3-methyl-2-penten-4-yn-1-yl, 1,3-hexadiyn-5-yl, 1-octyne-8-yl, 1-decyne -9-yl, 1-decynyl-10-yl or 1-dodecynyl-12-yl. The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. The organic black pigment represented by the above formula (1) is preferably a compound represented by the following formula (2). [Chemical 5]Specific examples of such an organic black pigment include the following: Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF Corporation). The organic black pigment is preferably used by dispersing it by a dispersant, a solvent, or a method described below. Further, when the sulfonic acid derivative of the above formula (2) is present during dispersion, the dispersibility or preservability may be improved. Examples of the black coloring material other than the organic black pigment represented by the above formula (1) include acetylene black, lamp black, bone black, graphite, iron black, aniline black, cyanine black, titanium black, and ruthenium. Further, in addition to the above pigments, a dye may also be used. Examples of the dye usable as the coloring material include an azo dye, an anthraquinone dye, a phthalocyanine dye, a quinone imine dye, a quinoline dye, a nitro dye, a carbonyl dye, and a methine group. Dyes and the like. Examples of the azo dye include CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Blue 29, CI Direct Red 28, CI Direct Red 83, and CI Direct Yellow 12. CI Direct Orange 26, CI Direct Green 28, CI Direct Green 59, CI Reactive Yellow 2, CI Reactive Red 17, CI Reactive Red 120, CI Reactive Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Disperse blue 165, CI alkaline blue 41, CI alkaline red 18, CI mordant red 7, CI mordant yellow 5, CI mord black 7, and the like. Examples of the lanthanide dye include CI reduction blue 4, CI acid blue 40, CI acid green 25, CI reactive blue 19, CI reactive blue 49, CI dispersion red 60, CI dispersion blue 56, and CI dispersion blue. 60 and so on. In addition, examples of the phthalocyanine-based dye include CI-reduced blue 5 and the like, and examples of the quinone-imine dye include CI basic blue 3 and CI basic blue 9 as a quinoline dye. For example, CI Solvent Yellow 33, CI Acid Yellow 3, and CI Disperse Yellow 64 are exemplified, and examples of the nitro dye include CI Acid Yellow 1, CI Acid Orange 3, and CI Disperse Yellow 42. These pigments are preferably used in such a manner that the average particle diameter is usually 1 μm or less, preferably 0.5 μm or less, and more preferably 0.25 μm or less. Here, the reference of the average particle diameter is the number of pigment particles. Further, the average particle diameter of the pigment is a value obtained by measuring the particle diameter of the pigment measured by Dynamic Light Scattering (DLS). The particle size measurement is carried out on a sufficiently diluted photosensitive coloring composition (usually diluted to a pigment concentration of about 0.005 to 0.2% by mass. However, if the concentration recommended by the measuring apparatus is used, the concentration is carried out), at 25 ° C. The measurement was carried out. (a) The colorant used in the second aspect of the photosensitive coloring composition contains at least one selected from the group consisting of a red pigment and an orange pigment and at least one selected from the group consisting of a blue pigment and a purple pigment. One. Thus, the photosensitive coloring composition of the second aspect of the present invention contains a combination of specific organic coloring pigments, thereby achieving high light-shielding properties. As the red pigment, the orange pigment, the blue pigment, and the violet pigment, the same as those described in the first aspect can be suitably used. The combination of colors is not particularly limited, and examples thereof include a combination of a red pigment and a blue pigment, a combination of an orange pigment and a blue pigment, a combination of an orange pigment and a blue pigment, and a purple pigment. . Further, the photosensitive coloring composition of the second aspect may contain a pigment other than a red pigment, an orange pigment, a blue pigment, and a violet pigment, and preferably contains a black coloring material from the viewpoint of light blocking properties. As the black coloring material, the same as those described in the first aspect can be suitably used. The photosensitive coloring composition of the third aspect is used for forming a photosensitive coloring composition of a colored spacer, and (a) the coloring agent is not particularly limited. For example, at least one of the organic coloring pigment, the black coloring matter, and the dye described above may be mentioned. Further, as the coloring agent (a), those described as the first aspect and the second aspect may be used, and from the viewpoint of light blocking property, the organic substance represented by the above formula (1) may be used. A coloring agent for black pigments. <(b) Alkali-soluble resin> The (b) alkali-soluble resin used in the present invention is a resin containing a carboxyl group or a hydroxyl group, and particularly contains (bI) an epoxy (meth) acrylate resin and a (b-II)-containing side. a (meth)acrylic copolymer resin having a repeating unit α having an ethylenically unsaturated bond and a repeating unit β derived from an unsaturated carboxylic acid, and a (b-II) (meth)acrylic copolymer resin The content ratio of the repeating unit α is 10 mol% or more, preferably 12 mol% or more. When (bI) an epoxy (meth) acrylate resin is used alone as the (b) alkali-soluble resin, the resin usually has a structure such as an aromatic group in the main chain, and this structure causes heat generation and wrinkles to occur easily. Surface smoothness is easily deteriorated. The wrinkles cause a decrease in the light-shielding property, so that the desired light-shielding property cannot be obtained, and problems such as light leakage are likely to occur. Moreover, in many cases, the coloring spacer is used in a film thickness higher than that of the black matrix. Further, in order to provide a desired step, it is preferable that the photosensitive coloring composition has coating film properties which are not easily thermally deformed. However, in order to secure compression characteristics or reliability, it is preferred to set the pigment concentration to be lower than that of the black matrix. As a result, in the colored spacer, the difference in the crosslink density near the film surface and the vicinity of the film bottom is further increased, and wrinkles are likely to occur. Moreover, due to such thermal deformation, there is a tendency that sufficient step formation property cannot be ensured. In order to achieve such various properties, it is considered that by using an acrylic resin which does not contain an aromatic ring or the like in the main chain and which has less heat shrinkage, in particular, a glass-containing repeating unit derived from an unsaturated carboxylic acid having a high transfer temperature and which is not easily thermally flowable The specific (meth)acrylic copolymer resin can reduce the flow of heat and suppress the occurrence of wrinkles, and can improve the surface smoothness. However, in the case where a (meth)acrylic copolymer resin having a low sensitivity is used in combination, reliability tends to be deteriorated, and it is considered that a specific amount of ethylene is introduced into the (meth)acrylic copolymer resin. The unsaturated bond can sufficiently ensure the sensitivity and make the reliability good, and as a result, surface smoothness and reliability can be achieved. <(bI) Epoxy (meth) acrylate resin> (bI) Epoxy (meth) acrylate resin is a compound having an epoxy group and an α,β-unsaturated monocarboxylic acid and/or ester moiety having a carboxyl group The reactant of the β-unsaturated monocarboxylic acid ester and the hydroxyl group produced by the reaction are further reacted with a compound having two or more substituents reactive with a hydroxyl group of a polybasic acid and/or an anhydride thereof. Resin. As the (bI) epoxy (meth) acrylate resin used in the present invention, the following epoxy (meth) acrylate resin (b1) and/or ring can be suitably used from the viewpoint of reliability. Oxygen (meth) acrylate resin (b2) (hereinafter sometimes referred to as "carboxyl group-containing epoxy (meth) acrylate resin"). <Epoxy (meth) acrylate resin (b1)> by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, and further with a polybasic acid And an alkali-soluble resin obtained by reacting with it or its anhydride. <Epoxy (meth) acrylate resin (b2)> by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, and further with a polyhydric alcohol And an alkali-soluble resin obtained by reacting a polybasic acid and/or an anhydride thereof. Here, the epoxy resin system also includes a raw material compound before the resin is formed by thermal curing, and the epoxy resin can be appropriately selected from known epoxy resins. Further, as the epoxy resin, a compound obtained by reacting a phenolic compound with an epihalohydrin can be used. The phenolic compound is preferably a compound having a divalent or higher phenolic hydroxyl group, and may be a monomer or a polymer. As the type of the epoxy resin to be used as a raw material, a cresol novolac type epoxy resin, a phenol novolak type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, and a trisphenol methane can be suitably used. Type epoxy resin, biphenyl novolak type epoxy resin, naphthol novolak type epoxy resin, epoxy resin as a reaction product of an addition polymerization reaction of dicyclopentadiene with phenol or cresol and epihalohydrin An adamantyl group-containing epoxy resin, a fluorene type epoxy resin, or the like can be suitably used, and such a main chain has an aromatic ring. Further, as a specific example of the epoxy resin, a bisphenol A type epoxy resin (for example, "Epikote (registered trademark; the same below) 828", "Epikote 1001", "Epikote 1002" manufactured by Mitsubishi Chemical Corporation can be suitably used. "Epikote 1004", etc., an epoxy resin obtained by the reaction of an alcoholic hydroxyl group of a bisphenol A type epoxy resin with epichlorohydrin (for example, "NER-1302" (epoxy equivalent) manufactured by Nippon Kayaku Co., Ltd. 323, softening point 76 ° C)), bisphenol F type resin (for example, "Epikote 807", "EP-4001", "EP-4002", "EP-4004, etc." manufactured by Mitsubishi Chemical Corporation), by bisphenol An epoxy resin obtained by reacting an alcoholic hydroxyl group of an epoxy resin with epichlorohydrin (for example, "NER-7406" (epoxy equivalent 350, softening point 66 ° C) manufactured by Nippon Kayaku Co., Ltd.), bisphenol S Type epoxy resin, biphenyl glycidyl ether (for example, "YX-4000" manufactured by Mitsubishi Chemical Corporation), and phenol novolac type epoxy resin (for example, "EPPN-201" manufactured by Nippon Kayaku Co., Ltd., manufactured by Mitsubishi Chemical Corporation) "EP-152", "EP-154", "DEN-438" manufactured by Dow Chemical Co., Ltd., (Neighbor, Inter, and Pair) A cresol novolac type epoxy resin (for example, "EOCN (registered trademark; the same below) -102S", "EOCN-1020", "EOCN-104S") manufactured by Nippon Kayaku Co., Ltd., and triglycidyl isocyanurate (for example, "TEPIC (registered trademark)" manufactured by Nissan Chemical Co., Ltd.) and trisphenol methane epoxy resin (for example, "EPPN (registered trademark; the same below) -501" and "EPN-502" manufactured by Nippon Kayaku Co., Ltd. "EPPN-503"), alicyclic epoxy resin ("Celloxide 2021P" manufactured by Daicel Chemical Industry Co., Ltd., "Celloxide (registered trademark; the same below) EHPE"), which will react with dicyclopentadiene and phenol An epoxy resin obtained by glycidylation of a phenol resin (for example, "EXA-7200" manufactured by DIC Corporation, "NC-7300" manufactured by Nippon Kayaku Co., Ltd.), and the following general formula (B1) to (B4) ) The epoxy resin represented by the like. Specifically, the epoxy resin represented by the following general formula (B1) is "XD-1000" manufactured by Nippon Kayaku Co., Ltd., and the epoxy resin represented by the following general formula (B2) is exemplified. "NC-3000" manufactured by Nippon Kayaku Co., Ltd., as the epoxy resin represented by the following general formula (B4), "ESF-300" manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd., etc. [Chemical 6]In the above formula (B1), a represents an average value and represents a number of from 0 to 10. R111 Any of a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. Furthermore, a plurality of Rs present in one molecule111 They can be the same or different. [Chemistry 7]In the above formula (B2), b represents an average value and represents a number of 0 to 10. R121 Any of a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. Furthermore, a plurality of Rs present in one molecule121 They can be the same or different. [化8]In the above formula (B3), X represents a linking group represented by the following formula (B3-1) or (B3-2). However, it contains more than one adamantane structure in the molecular structure. c represents an integer of 2 or 3. [Chemistry 9][化10]In the above formulae (B3-1) and (B3-2), R131 ~R134 And R135 ~R137 Each of them may independently represent an adamantyl group which may have a substituent, a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, or a phenyl group which may have a substituent. * indicates the key combination. [11]In the above formula (B4), p and q each independently represent an integer of 0 to 4, R141 And R142 Each of the alkyl groups having 1 to 4 carbon atoms or a halogen atom is independently represented. R143 And R144 Each of the alkylene groups having a carbon number of 1 to 4 is independently represented. x and y each independently represent an integer of 0 or more. Among these, from the viewpoint of reliability, it is preferred to use an epoxy resin represented by any one of the general formulae (B1) to (B4). Examples of the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group include (meth)acrylic acid, crotonic acid, o-vinylbenzoic acid, and m-vinylbenzoic acid. P-vinylbenzoic acid; monocarboxylic acid such as α-haloalkyl, alkoxy, halogen, nitro, cyano substituent of (meth)acrylic acid; 2-(meth)acryloxyethyl succinic acid , 2-(Methyl) propylene methoxyethyl adipate, 2-(methyl) propylene methoxyethyl phthalate, 2-(methyl) propylene oxiranyl ethyl hexahydroortylene Dicarboxylic acid, 2-(meth) propylene oxiranyl ethyl maleate, 2-(methyl) propylene methoxy succinic acid, 2-(methyl) propylene methoxy propyl Diacid, 2-(methyl)propenyloxypropyltetrahydrophthalic acid, 2-(methyl)propenyloxypropylphthalic acid, 2-(methyl)acryloxypropoxypropane Base maleic acid, 2-(meth) propylene oxy butyl succinic acid, 2-(methyl) propylene methoxy butyl adipate, 2-(methyl) propylene oxy butyl Hydrogen phthalic acid, 2-(methyl) propylene methoxy butyl phthalic acid, 2-(methyl) propylene oxy butyl butylene Acid; as a monomer for the addition of (meth)acrylic acid to ε-caprolactone, β-propiolactone, γ-butyrolactone, δ-valerolactone or the like; or a monomer obtained by adding a hydroxyalkyl acrylate, a pentaerythritol tri(meth) acrylate to an acid (anhydride) such as succinic acid (anhydride), phthalic acid (anhydride), or maleic acid (anhydride) (meth)acrylic acid dimer, and the like. Among these, (meth)acrylic acid is particularly preferable in terms of sensitivity. As a method of adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, a known method can be used. For example, an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group can be reacted with an epoxy resin in the presence of an esterification catalyst at a temperature of 50 to 150 ° C. . As the esterification catalyst used herein, a tertiary amine such as triethylamine, trimethylamine, benzyldimethylamine or benzyldiethylamine can be used; tetramethylammonium chloride and tetraethylchlorinated A quaternary ammonium salt such as ammonium or dodecyltrimethylammonium chloride. Further, the epoxy resin, the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and the esterification catalyst may be used singly or in combination of two or more. The α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group is preferably used in an amount of from 0.5 to 1.2 equivalents per 1 equivalent of the epoxy group of the epoxy resin, and further Preferably, it is in the range of 0.7 to 1.1 equivalents. When it is set to the above lower limit value, the amount of introduction of the unsaturated group can be made sufficient, and the subsequent reaction with the polybasic acid and/or its anhydride tends to be sufficient. In addition, it is preferable that the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group remains as an unreacted product by setting it as the upper limit or less. The polybasic acid and/or its anhydride may be selected from the group consisting of maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and pyromellitic acid. , trimellitic acid, benzophenone tetracarboxylic acid, methyl hexahydrophthalic acid, endomethylene tetrahydrophthalic acid, chloric acid, methyltetrahydrophthalic acid, biphenyl One or more of a carboxylic acid, an anhydride, and the like. Preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid Acid, or such anhydride. More preferably, it is tetrahydrophthalic acid, biphenyltetracarboxylic acid, anhydrous tetrahydrophthalic acid, or biphenyltetracarboxylic dianhydride. The addition reaction of a polybasic acid and/or an anhydride thereof may be carried out by a known method, an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid having a carboxyl group. The addition reaction of the acid ester is continued under the same conditions to obtain a target. The addition amount of the polybasic acid and/or its anhydride component is preferably such that the acid value of the carboxyl group-containing epoxy (meth) acrylate resin to be produced is in the range of 10 to 150 mgKOH/g, and more preferably The extent of the range of 20 to 140 mgKOH/g. When it is set to the above lower limit value, the alkali developability tends to be good, and the hardening performance tends to be good by setting it as the upper limit or less. Further, in the addition reaction of the polybasic acid and/or its anhydride, a polyfunctional alcohol such as trimethylolpropane, pentaerythritol or dipentaerythritol may be added to prepare a multi-branched structure. A carboxyl group-containing epoxy (meth) acrylate resin is usually obtained by mixing a polybasic acid in a reaction of an epoxy resin with an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group. And/or its anhydride, or in the reaction of an epoxy resin with an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid having a carboxyl group, a polybasic acid and/or an anhydride thereof The functional alcohol is obtained by heating. In this case, the order of mixing the polybasic acid and/or its anhydride with the polyfunctional alcohol is not particularly limited. By heating, a polybasic acid and/or an anhydride thereof, a mixture of an epoxy resin and an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group and a polyfunctional alcohol Any of the hydroxyl groups present is subjected to an addition reaction. The chemical structure of the repeating unit contained in the carboxyl group-containing epoxy (meth) acrylate resin is not particularly limited, and examples thereof include the chemical structures shown below. [化12][Chemistry 13][Chemistry 14][化15]In the above formulae (C-1) to (C-15), X represents the following structure. [Chemistry 16](R in the above structure X11 Represents a hydrogen atom or a methyl group, and Y represents a hydrogen atom or a residue of a polybasic acid. Further, the polybasic acid may be cross-linked to each other. The carboxyl group-containing epoxy (meth) acrylate resin may be, for example, those described in Korean Laid-Open Patent Publication No. 10-2013-0022955. The polystyrene-equivalent weight average molecular weight (Mw) of the epoxy (meth) acrylate resin measured by gel permeation chromatography (GPC) is usually 1,000 or more, preferably 2,000 or more, more preferably 3,000. The above is more preferably 4,000 or more, and particularly preferably 5,000 or more, and usually 10,000 or less, preferably 8,000 or less, and more preferably 7,000 or less. When it is set to the above lower limit value, the reliability tends to be improved, and the solubility is preferably improved by setting it as the upper limit or less. The acid value of the epoxy (meth) acrylate resin is not particularly limited, but is preferably 10 mg·KOH/g or more, more preferably 20 mg·KOH/g or more, and still more preferably 40 mg·KOH/g or more. Furthermore, it is more preferably 60 mg·KOH/g or more, and particularly preferably 80 mg·KOH/g or more, and more preferably 200 mg·KOH/g or less, more preferably 150 mg·KOH/g or less. It is preferably 120 mg/KOH/g or less, and more preferably 100 mg/KOH/g or less. When it is set to the above lower limit value, it is preferable to obtain an appropriate development solubility, and it is preferable to set it as the above upper limit value, and it is possible to suppress excessive development and film dissolution. The chemical structure of the epoxy (meth) acrylate resin is not particularly limited, and from the viewpoint of reliability, it is preferred to contain an epoxy (methyl) having a repeating unit structure represented by the following formula (bII). Acrylate resin (hereinafter sometimes abbreviated as "(bII) epoxy (meth) acrylate resin") and/or epoxy (meth)acrylic acid having a partial structure represented by the following formula (bI-II) An ester resin (hereinafter sometimes abbreviated as "(bI-II) epoxy (meth) acrylate resin"). [化17]In the formula (b-I-I), R11 Represents a hydrogen atom or a methyl group, R12 Represents a divalent hydrocarbon group which may have a substituent. The benzene ring in the formula (b-I-I) may be further substituted with any substituent. * indicates the key combination. [化18]In formula (b-I-II), R13 Each represents a hydrogen atom or a methyl group independently. R14 A divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is represented. R15 And R16 Divalent aliphatic groups which may have a substituent are each independently represented. m and n each independently represent an integer of 0 to 2. * indicates the key combination. <(b-I-I) Epoxy (meth) acrylate resin> First, an epoxy (meth) acrylate resin having a repeating unit structure represented by the above formula (b-I-I) will be described in detail. [Chemistry 19]In the formula (b-I-I), R11 Represents a hydrogen atom or a methyl group, R12 Represents a divalent hydrocarbon group which may have a substituent. The benzene ring in the formula (b-I-I) may be further substituted with any substituent. * indicates the key combination. (R12 ) in the above formula (b-I-I), R12 Represents a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include a divalent aliphatic group, a divalent aromatic ring group, and a group obtained by linking one or more divalent aliphatic groups to one or more divalent aromatic ring groups. Examples of the divalent aliphatic group include a linear chain, a branched chain, and a ring. Among these, from the viewpoint of developing solubility, it is preferably a linear one, and on the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, it is preferably a ring. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, further preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. Specific examples of the divalent straight-chain aliphatic group include a methylene group, an exoethyl group, an exo-propyl group, an exo-butyl group, a di-n-pentyl group, a hexyl group, and a perylene group. Among these, a methylene group is preferred from the viewpoint of the rigidity of the skeleton. As the divalent branched aliphatic group, the divalent linear aliphatic group described above may have a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or the like. The second butyl group, the third butyl group or the like has a structure as a side chain. The number of rings of the divalent cyclic aliphatic group is not particularly limited, and is usually 1 or more, preferably 2 or more, and usually 12 or less, preferably 10 or less. When it is set as the above-mentioned lower limit, it is a film which is a strong film, and the adhesiveness of the board|substrate is good, and it is easy to suppress the deterioration of the sensitivity and the film reduction at the time of image- Improve the tendency of resolution. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, and a lowering.Alkane ringA group in which two hydrogen atoms are removed from a ring such as an alkane ring, an adamantane ring, a cyclododecane ring or a dicyclopentadiene. Among these, from the viewpoint of the rigidity of the skeleton, it is preferred to form a base by removing two hydrogen atoms from the dicyclopentadiene ring or the adamantane ring. Examples of the substituent which the divalent aliphatic group may have include a hydroxyl group, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a second butyl group, a tert-butyl group, a pentyl group, and an isoprene group. An alkyl group having 1 to 5 carbon atoms; alkoxy group having 1 to 5 carbon atoms such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group; Among these, from the viewpoint of easiness of synthesis, it is preferably unsubstituted. Further, examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent heteroaromatic ring group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, further preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring, and examples thereof include a benzene ring having one free atomic valence, a naphthalene ring, an anthracene ring, a phenanthrene ring, and an anthracene ring. , thick tetraphenyl ring, anthracene ring, benzofluorene ring,The ring, the triple extension benzene ring, the anthracene ring, the fluorene ring, the anthracene ring and the like. Further, the heteroaromatic ring in the heteroaromatic ring group may be a single ring or a condensed ring, and examples thereof include a furan ring having one free valence, a benzofuran ring, a thiophene ring, and a benzothiophene ring. Pyrrole ring, pyrazole ring, imidazole ring, oxadiazole ring, anthracene ring, indazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furan And pyrrole ring, furanfuran ring, thienofuran ring, benzoisoxazole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridyl ring, fluorene ring, pyrimidine ring, three? Ring, quinoline ring, isoquinoline ring,A group such as a porphyrin ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, an acridine ring, a quinazoline ring, a quinazolinone ring, an anthracene ring or the like. Among these, from the viewpoint of patterning properties, a benzene ring or a naphthalene ring is preferred, and a benzene ring is more preferred. Examples of the substituent which the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, a propoxy group and the like. Among these, from the viewpoint of developing solubility and moisture absorption resistance, it is preferably unsubstituted. In addition, as a group in which one or more divalent aliphatic groups are bonded to one or more divalent aromatic ring groups, one or more of the above-mentioned divalent aliphatic groups and one may be mentioned. The above-mentioned divalent aromatic ring group is bonded to the above. The number of the divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. The number of the divalent aromatic ring groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. Specific examples of the group in which one or more divalent aliphatic groups are bonded to one or more divalent aromatic ring groups include a group represented by the following formulas (b-I-I-A) to (b-I-I-F). In the above, from the viewpoint of the rigidity of the skeleton and the hydrophobization of the film, a group represented by the following formula (b-I-I-A) is preferred. [Chemistry 20]As described above, the benzene ring in the formula (b-I-I) may be further substituted with any substituent. Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of the substituents is not particularly limited, and may be one or two or more. Among these, from the viewpoint of the patterning property, it is preferably unsubstituted. Further, from the viewpoint of the simplicity of synthesis of the repeating unit structure represented by the above formula (b-I-I), the repeating unit structure represented by the following formula (b-I-I-1) is preferable. [Chem. 21]In the formula (b-I-I-1), R11 And R12 It has the same meaning as in the above formula (b-I-I). RX Represents a hydrogen atom or a polybasic acid residue. * indicates the key combination. The benzene ring in the formula (b-I-I-1) may be further substituted with an arbitrary substituent. The polybasic acid residue means a valence group obtained by removing one OH group from a polybasic acid or an anhydride thereof. The polybasic acid may be selected from the group consisting of maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. , one of benzophenone tetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chloric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid Or two or more. Among these, from the viewpoint of patterning properties, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and the like are preferable. Pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic acid, biphenyltetracarboxylic acid. The (b-I-I) epoxy (meth) acrylate resin may have one or more repeating unit structures represented by the above formula (b-I-I-1), and may be mixed in two or more.X For hydrogen atoms and RX It is a polybasic acid residue. Further, the number of the repeating unit structure represented by the above formula (bII) contained in one molecule of the (bII) epoxy (meth) acrylate resin is not particularly limited, but is preferably 1 or more, and more preferably 3 or more. Further, it is preferably 20 or less, and more preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit, it is easy to suppress the deterioration of the sensitivity and the film reduction during development. The tendency of resolution. (bII) The weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography (GPC) of the epoxy (meth) acrylate resin is not particularly limited, but is preferably 1,000 or more. Preferably, it is 1,500 or more, more preferably 2,000 or more, further preferably 3,000 or more, more preferably 4,000 or more, most preferably 5,000 or more, further preferably 30,000 or less, more preferably 20,000 or less, and still more preferably 10,000. Below, it is especially preferable to be 8000 or less. When it is set to the above lower limit value, the residual film ratio of the photosensitive coloring composition tends to be good, and the resolution is preferably equal to or lower than the above upper limit value. The acid value of the (bII) epoxy (meth) acrylate resin is not particularly limited, but is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more, still more preferably 40 mgKOH/g or more, and furthermore It is preferably 50 mgKOH/g or more, more preferably 80 mgKOH/g or more, further preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, and still more preferably 130 mgKOH/g or less, particularly preferably 100 mgKOH/g or less. When it is set to the above lower limit value, the development solubility is improved, and the resolving property tends to be good. Further, when the content is at most the above upper limit, the residual film ratio of the photosensitive coloring composition is good. The tendency. Specific examples of the (b-I-I) epoxy (meth) acrylate resin are listed below. Furthermore, the * in the example indicates a keying key. [化22][化23][Chem. 24][化25]<(b-I-II) Epoxy (meth) acrylate resin> Next, the epoxy (meth) acrylate resin having a partial structure represented by the above formula (b-I-II) will be described in detail. [Chem. 26]In formula (b-I-II), R13 Each represents a hydrogen atom or a methyl group independently. R14 A divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is represented. R15 And R16 Divalent aliphatic groups which may have a substituent are each independently represented. m and n each independently represent an integer of 0 to 2. * indicates the key combination. (R14 ) in the above formula (b-I-II), R14 A divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is represented. Examples of the cyclic hydrocarbon group include an aliphatic cyclic group or an aromatic cyclic group. The number of rings of the aliphatic ring group is not particularly limited, and is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit, it is easy to suppress the deterioration of the sensitivity and the film reduction during development. The tendency of resolution. Further, the number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 40 or less, still more preferably 30 or less, still more preferably 20 or less, and particularly preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit, it is easy to suppress the deterioration of the sensitivity and the film reduction during development. The tendency of resolution. Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, and a loweringAlkane ringAn alkane ring, an adamantane ring, a cyclododecane ring, and the like. Among these, an adamantane ring is preferred from the viewpoint of the residual film ratio and resolution of the photosensitive coloring composition. On the other hand, the number of rings of the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less, and more preferably It is 4 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit, it is easy to suppress the deterioration of the sensitivity and the film reduction during development. The tendency of resolution. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and a heteroaromatic ring group. Further, the number of carbon atoms of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 10 or more, still more preferably 12 or more, still more preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. Further, the patterning property tends to be good by setting it as the upper limit or less. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, an anthracene ring, a condensed tetraphenyl ring, an anthracene ring, and a benzofluorene ring.Ring, joint three-extension benzene ring, anthracycline ring, fluorene ring, ring and so on. Among these, from the viewpoint of patterning characteristics, an anthracene ring is preferred. Further, the divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, and examples thereof include a divalent aliphatic group and a divalent aromatic ring group, and one or more divalent aliphatic groups and A group in which one or more divalent aromatic ring groups are bonded. Examples of the divalent aliphatic group include a linear chain, a branched chain, and a ring. Among these, from the viewpoint of developing solubility, it is preferably a linear one, and on the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, it is preferably a ring. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, further preferably 25 or less, more preferably 20 or less, still more preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. Specific examples of the divalent straight-chain aliphatic group include a methylene group, an exoethyl group, an exo-propyl group, an exo-butyl group, a di-n-pentyl group, a hexyl group, and a perylene group. Among these, a methylene group is preferred from the viewpoint of the rigidity of the skeleton. As the divalent branched aliphatic group, the divalent linear aliphatic group described above may have a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or the like. The second butyl group, the third butyl group or the like has a structure as a side chain. The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set as the above-mentioned lower limit, it is a film which is a strong film, and the adhesiveness of the board|substrate is good, and it is easy to suppress the deterioration of the sensitivity and the film reduction at the time of image- Improve the tendency of resolution. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, and a lowering.Alkane ringA group in which two hydrogen atoms are removed from a ring such as an alkane ring, an adamantane ring or a cyclododecane ring. Among these, from the viewpoint of the rigidity of the skeleton, it is preferred to form a base from which two hydrogen atoms are removed from the adamantane ring. Examples of the substituent which the divalent aliphatic group may have include a hydroxyl group, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a second butyl group, a tert-butyl group, a pentyl group, and an isoprene group. An alkyl group having 1 to 5 carbon atoms; alkoxy group having 1 to 5 carbon atoms such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group; Among these, from the viewpoint of easiness of synthesis, it is preferably unsubstituted. Further, examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent heteroaromatic ring group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, further preferably 30 or less, more preferably 20 or less, still more preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring, and examples thereof include a benzene ring having one free atomic valence, a naphthalene ring, an anthracene ring, a phenanthrene ring, and an anthracene ring. , thick tetraphenyl ring, anthracene ring, benzofluorene ring,The ring, the triple extension benzene ring, the anthracene ring, the fluorene ring, the anthracene ring and the like. Further, the heteroaromatic ring in the heteroaromatic ring group may be a single ring or a condensed ring, and examples thereof include a furan ring having one free valence, a benzofuran ring, a thiophene ring, and a benzothiophene ring. Pyrrole ring, pyrazole ring, imidazole ring, oxadiazole ring, anthracene ring, indazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furan And pyrrole ring, furanfuran ring, thienofuran ring, benzoisoxazole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridyl ring, fluorene ring, pyrimidine ring, three? Ring, quinoline ring, isoquinoline ring,A group such as a porphyrin ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, an acridine ring, a quinazoline ring, a quinazolinone ring, an anthracene ring or the like. Among these, from the viewpoint of patterning properties, a benzene ring or a naphthalene ring is preferred, and an anthracene ring is more preferred. Examples of the substituent which the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, a propoxy group and the like. Among these, from the viewpoint of developing solubility, it is preferably unsubstituted. In addition, as a group in which one or more divalent aliphatic groups are bonded to one or more divalent aromatic ring groups, one or more of the above-mentioned divalent aliphatic groups and one may be mentioned. The above-mentioned divalent aromatic ring group is bonded to the above. The number of the divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. The number of the divalent aromatic ring groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. Specific examples of the group in which one or more divalent aliphatic groups are bonded to one or more divalent aromatic ring groups include a group represented by the above formulas (b-I-I-A) to (b-I-I-F). Among these, from the viewpoint of the rigidity of the skeleton and the hydrophobicization of the film, the group represented by the above formula (b-I-I-C) is preferred. The cyclic hydrocarbon in the side chain is not particularly limited based on the bonding state on the divalent hydrocarbon group, and examples thereof include a case where one hydrogen atom of the aliphatic group or the aromatic ring group is substituted by the side chain. Or a cyclic hydrocarbon group as a side chain including one carbon atom of the aliphatic group. (R15 , R16 ) in the above formula (b-I-II), R15 And R16 Divalent aliphatic groups which may have a substituent are each independently represented. Examples of the divalent aliphatic group include a linear chain, a branched chain, and a ring. Among these, from the viewpoint of developing solubility, it is preferably a linear one, and on the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, it is preferably a ring. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, further preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness, and the adhesion to the substrate tends to be good, and it is easy to suppress the sensitivity change by setting it as the upper limit or less. The difference between the film and the film during development is reduced, and the tendency to improve the resolution is improved. Specific examples of the divalent straight-chain aliphatic group include a methylene group, an exoethyl group, an exo-propyl group, an exo-butyl group, a di-n-pentyl group, a hexyl group, and a perylene group. Among these, a methylene group is preferred from the viewpoint of the rigidity of the skeleton. As the divalent branched aliphatic group, the divalent linear aliphatic group described above may have a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or the like. The second butyl group, the third butyl group or the like has a structure as a side chain. The number of rings of the divalent cyclic aliphatic group is not particularly limited, and is usually 1 or more, preferably 2 or more, and usually 12 or less, preferably 10 or less. When it is set as the above-mentioned lower limit, it is a film which is a strong film, and the adhesiveness of the board|substrate is good, and it is easy to suppress the deterioration of the sensitivity and the film reduction at the time of image- Improve the tendency of resolution. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, and a lowering.Alkane ringA group in which two hydrogen atoms are removed from a ring such as an alkane ring, an adamantane ring, a cyclododecane ring or a dicyclopentadiene. Among these, from the viewpoint of the rigidity of the skeleton, it is preferred to form a base by removing two hydrogen atoms from the dicyclopentadiene ring or the adamantane ring. Examples of the substituent which the divalent aliphatic group may have include a hydroxyl group, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a second butyl group, a tert-butyl group, a pentyl group, and an isoprene group. An alkyl group having 1 to 5 carbon atoms; alkoxy group having 1 to 5 carbon atoms such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group; Among these, from the viewpoint of easiness of synthesis, it is preferably unsubstituted. (m, n) In the above formula (b-I-II), m and n represent an integer of 0 to 2. When it is set to the above lower limit value, the patterning is improved, and the surface roughness tends to be less likely to occur. Further, the developer property tends to be good by setting it as the upper limit or less. From the viewpoint of developability, m and n are preferably 0. On the other hand, from the viewpoint of precise patterning and surface roughness, m and n are preferably 1 or more. Further, from the viewpoint of the adhesion between the partial structure represented by the above formula (b-I-II) and the substrate, a partial structure represented by the following formula (b-I-II-1) is preferred. [化27]In the formula (b-I-II-1), R13 , R15 , R16 , m and n have the same meanings as the above formula (b-I-II). Rα A cyclic hydrocarbon group which may have a monovalent value of a substituent. p is an integer of 1 or more. The benzene ring in the formula (b-I-II-1) may be further substituted with any substituent. * indicates the key combination. (Rα ) in the above formula (b-I-II-1), Rα A cyclic hydrocarbon group which may have a monovalent value of a substituent. Examples of the cyclic hydrocarbon group include an aliphatic cyclic group or an aromatic cyclic group. The number of rings of the aliphatic ring group is not particularly limited, and is usually 1 or more, preferably 2 or more, and usually 6 or less, preferably 4 or less, and more preferably 3 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. Further, the patterning property tends to be good by setting it as the upper limit or less. Further, the number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 40 or less, still more preferably 30 or less, still more preferably 20 or less, and particularly preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. Further, the patterning property tends to be good by setting it as the upper limit or less. Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, and a loweringAlkane ringAn alkane ring, an adamantane ring, a cyclododecane ring, and the like. Among these, an adamantane ring is preferred from the viewpoint of strong film properties. On the other hand, the number of rings of the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. Further, the patterning property tends to be good by setting it as the upper limit or less. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and a heteroaromatic ring group. Further, the number of carbon atoms of the aromatic ring group is usually 4 or more, preferably 5 or more, more preferably 6 or more, still more preferably 30 or less, still more preferably 20 or less, still more preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. Further, the patterning property tends to be good by setting it as the upper limit or less. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and an anthracene ring. Among these, from the viewpoint of developing solubility, an anthracene ring is preferred. Examples of the substituent which the cyclic hydrocarbon group may have include a hydroxyl group, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a second butyl group, a third butyl group, a pentyl group, an isopentyl group, and the like. An alkyl group having 1 to 5 carbon atoms; an alkoxy group having 1 to 5 carbon atoms such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group; Among these, from the viewpoint of easiness of synthesis, it is preferably unsubstituted. p represents an integer of 1 or more, preferably 2 or more, and more preferably 3 or less. When it is set to the above lower limit value, the film hardening degree and the residual film ratio tend to be good, and when the upper limit is equal to or less than the above upper limit, the developability tends to be good. Among these, from the viewpoint of a strong film hardening degree, R is preferred.α It is a monovalent aliphatic ring group, and more preferably an adamantyl group. As described above, the benzene ring in the formula (b-I-II-1) may be further substituted with any substituent. Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of the substituents is not particularly limited, and may be one or two or more. Among these, from the viewpoint of the patterning property, it is preferably unsubstituted. Specific examples of the partial structure represented by the above formula (b-I-II-1) are listed below. [化28][化29][化30][化31][化32]Further, the partial structure represented by the above formula (b-I-II) is preferably a partial structure represented by the following formula (b-I-II-2) from the viewpoint of the rigidity of the skeleton and the hydrophobicization of the film. [化33]In the formula (b-I-II-2), R13 , R15 , R16 , m and n have the same meanings as the above formula (b-I-II). Rβ A divalent cyclic hydrocarbon group which may have a substituent. The benzene ring in the formula (b-I-II-2) may be further substituted with an arbitrary substituent. * indicates the key combination. (Rβ ) in the above formula (b-I-II-2), Rβ A divalent cyclic hydrocarbon group which may have a substituent. Examples of the cyclic hydrocarbon group include an aliphatic cyclic group or an aromatic cyclic group. The number of rings of the aliphatic ring group is not particularly limited, and is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit, it is easy to suppress the deterioration of the sensitivity and the film reduction during development. The tendency of resolution. Further, the number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 40 or less, still more preferably 35 or less, still more preferably 30 or less. When it is set to the above-mentioned lower limit, it is preferable to suppress the film roughness during development, and it is easy to suppress the deterioration of the sensitivity and the film reduction at the time of development, and to improve the resolution, by setting it as the above-mentioned upper limit. tendency. Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, and a loweringAlkane ringAn alkane ring, an adamantane ring, a cyclododecane ring, and the like. Among these, an adamantane ring is preferred from the viewpoint of storage stability. On the other hand, the number of rings of the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and usually 10 or less, preferably 5 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit value, it is easy to suppress the deterioration of the sensitivity or the film, and the resolution is improved. The tendency. Examples of the aromatic ring group include an aromatic hydrocarbon ring group and a heteroaromatic ring group. Further, the number of carbon atoms of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 10 or more, further preferably 40 or less, more preferably 30 or less, and further preferably It is 20 or less, and particularly preferably 15 or less. When it is set to the above lower limit value, it is easy to obtain a film having a strong surface, and it is less likely to cause surface roughness. When the value is equal to or less than the above upper limit value, it is easy to suppress the deterioration of the sensitivity or the film, and the resolution is improved. The tendency. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and an anthracene ring. Among these, from the viewpoint of developability, an anthracene ring is preferred. Examples of the substituent which the cyclic hydrocarbon group may have include a hydroxyl group, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a second butyl group, a third butyl group, a pentyl group, an isopentyl group, and the like. An alkyl group having 1 to 5 carbon atoms; an alkoxy group having 1 to 5 carbon atoms such as a methoxy group or an ethoxy group; a hydroxyl group; a nitro group; a cyano group; a carboxyl group; Among these, from the viewpoint of the ease of synthesis, it is preferably unsubstituted. In these terms, in terms of preserving stability and electrical properties, Rβ It is preferably a divalent aliphatic cyclic group, more preferably a divalent adamantane ring group. On the other hand, in terms of the low hygroscopicity and patterning properties of the coating film, Rβ It is preferably a divalent aromatic ring group, more preferably a divalent anthracene ring group. As described above, the benzene ring in the formula (b-I-II-2) may be further substituted with any substituent. Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of the substituents is not particularly limited, and may be one or two or more. Further, two benzene rings may be linked via a substituent. As a substituent in this case, -O-, -S-, -NH-, -CH can be mentioned.2 - Wait for the divalent group. Among these, from the viewpoint of the patterning property, it is preferably unsubstituted. Further, from the viewpoint that film formation or the like is less likely to occur, methyl substitution is preferred. Specific examples of the partial structure represented by the above formula (b-I-II-2) are listed below. Furthermore, the * in the example indicates a keying key. [化34][化35][化36][化37]On the other hand, the partial structure represented by the above formula (b-I-II) is preferably a partial structure represented by the following formula (b-I-II-3) from the viewpoint of the coating film residual ratio and the patterning property. [化38]In the formula (b-I-II-3), R13 , R14 , R15 , R16 , m and n have the same meanings as the above formula (b-I-II). RZ Represents a hydrogen atom or a polybasic acid residue. The polybasic acid residue means a valence group obtained by removing one OH group from a polybasic acid or an anhydride thereof. Furthermore, one OH group can be further removed, and R in the other molecules represented by the formula (b-I-II-3)Z Share, you can pass RZ Link a plurality of formulas (b-I-II-3). The polybasic acid may be selected from the group consisting of maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. , one of benzophenone tetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chloric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid Or two or more. Among these, from the viewpoint of patterning properties, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and the like are preferable. Pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic acid, biphenyltetracarboxylic acid. The partial structure represented by the above formula (b-I-II-3) contained in one molecule of the (b-I-II) epoxy (meth) acrylate resin may be one type or two or more types, for example, may be mixed in the presence of R.Z For hydrogen atoms and RZ It is a polybasic acid residue. Further, the number of partial structures represented by the above formula (bI-II) contained in one molecule of the (bI-II) epoxy (meth) acrylate resin is not particularly limited, but is preferably 1 or more, and more preferably Further, 3 or more is preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. When it is set to the above lower limit value, it is easy to obtain a film which is strong, and it is less likely to cause surface roughness, and electrical characteristics tend to be good. Further, when it is equal to or less than the above upper limit, it is easy to suppress sensitivity deterioration or film. Reduce the tendency to improve resolution. The polystyrene-equivalent weight average molecular weight (Mw) of the (bI-II) epoxy (meth) acrylate resin measured by gel permeation chromatography (GPC) is not particularly limited, and is preferably 1,000 or more. More preferably, it is 2,000 or more, and further preferably 30,000 or less, more preferably 20,000 or less, further preferably 10,000 or less, further preferably 7,000 or less, and particularly preferably 5,000 or less. When it is set to the above lower limit value, the patterning property tends to be good, and when it is set to the above upper limit value, it is easy to obtain a strong film, and the surface roughness tends to be less likely to occur. The acid value of the (bI-II) epoxy (meth) acrylate resin is not particularly limited, but is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more, and still more preferably 40 mgKOH/g or more. More preferably, it is 60 mgKOH/g or more, more preferably 80 mgKOH/g or more, more preferably 100 mgKOH/g or more, further preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, and further Preferably, it is 120 gKOH/g or less. When it is set to the above lower limit value, it is easy to obtain a strong film, and when it is set to the above upper limit value, the development solubility is improved, and the resolving property tends to be good. <(b-II) A (meth)acrylic copolymer resin containing a repeating unit α having an ethylenically unsaturated bond in a side chain and a repeating unit β derived from an unsaturated carboxylic acid> (b-II) (methyl) The acrylic copolymer resin contains a repeating unit α having an ethylenically unsaturated bond in a side chain and a repeating unit β derived from an unsaturated carboxylic acid. It is considered that reliability is ensured by having the repeating unit α, and it is considered that the surface smoothness can be improved by having the repeating unit β. The repeating unit α is not particularly limited as long as it has an ethylenically unsaturated bond in the side chain. For example, a chemical structure represented by the following formula (I) can be mentioned. [39]In the above formula (I), R1 And R2 Each represents a hydrogen atom or a methyl group independently. R3 Indicates a divalent linking group. The divalent linking group may, for example, be a dialkyl group which may have a substituent or a divalent aromatic ring group which may have a substituent. The alkylene group may, for example, be a linear, branched or cyclic alkyl group. The carbon number is preferably 1 or more, more preferably 2 or more, still more preferably 3 or more, further preferably 20 or less, more preferably 15 or less, still more preferably 10 or less, still more preferably 8 or less. It is especially good for 5 or less. When it is set to the above lower limit value, the reactivity tends to be improved, and the thermal fluidity tends to decrease by setting it as the upper limit or less. Specific examples of the alkylene group include a methylene group, an ethylidene group, a propyl group, a butyl group, an exobutyl group, and a cyclohexyl group. Among these, from the viewpoint of reactivity, a methylene group, an ethyl group or a propyl group is preferred, and a propyl group is more preferred. Examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent heteroaromatic ring group. The carbon number is preferably 4 or more, more preferably 5 or more, still more preferably 6 or more, further preferably 30 or less, more preferably 20 or less, still more preferably 15 or less, and still more preferably 10 or less. When it is set to the above lower limit value, the reactivity tends to be improved, and the thermal fluidity tends to decrease by setting it as the upper limit or less. The aromatic hydrocarbon ring in the aromatic hydrocarbon ring group may be a single ring or a condensed ring, and examples thereof include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, an anthracene ring, a condensed tetraphenyl ring, and an anthracene ring. Benzopyrene ring,The ring, the triple extension benzene ring, the anthracene ring, the fluorene ring, the anthracene ring and the like. Further, the heteroaromatic ring group in the heteroaromatic ring group may be a single ring or a condensed ring, and examples thereof include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, and a pyrazole. Ring, imidazole ring, oxadiazole ring, anthracene ring, indazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrazole ring, furan a furan ring, a thienofuran ring, a benzisoxazole ring, a benzisothiazole ring, a benzimidazole ring, a pyridine ring, a pyridyl ring, a fluorene ring, a pyrimidine ring, a tricyclic ring, a quinoline Ring, isoquinoline ring,A group such as a porphyrin ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, an acridine ring, a quinazoline ring, a quinazolinone ring, an anthracene ring or the like. In addition, examples of the substituent which the alkylene group and the divalent aromatic ring group may have include a halogen atom, a phenyl group, a hydroxyl group, and a carboxyl group. Among these, a hydroxyl group is preferred from the viewpoint of reactivity. Further, the chemical structure represented by the above formula (I) is preferably a chemical structure represented by the following formula (I-1) or (I-2) from the viewpoint of reactivity, and more preferably The chemical structure represented by the following formula (I-1). [化40]In the above formula (I-1) and formula (I-2), R1 Represents a hydrogen atom or a methyl group. The chemical structure represented by the above formula (I-1) or (I-2) can be formed by adding an epoxy group-containing unsaturated compound to a repeating unit derived from (meth)acrylic acid. On the other hand, examples of the repeating unit β derived from the unsaturated carboxylic acid include a repeating unit derived from acrylic acid, a repeating unit derived from methacrylic acid, a repeating unit derived from crotonic acid, and a source derived from itaconic acid. a repeating unit, a repeating unit derived from maleic acid, a repeating unit derived from fumaric acid, etc., and among these, from the viewpoint of thermal fluidity, a repeating unit derived from acrylic acid or The repeating unit derived from methacrylic acid is more preferably a chemical structure represented by the following formula (II). [化41]In the above formula (II), R3 Each represents a hydrogen atom or a methyl group independently. Further, the (b-II) (meth)acrylic copolymer resin may further contain a repeating unit γ in addition to the above repeating units α and β. The repeating unit γ is a repeating unit derived from an ethylenically unsaturated compound such as (meth) acrylate. For example, from the viewpoint of reliability or development time adjustment, it is preferred to have the following formula (IIIa). A repeating unit of a portion of the structure represented. [化42]In formula (IIIa), R1d ~R4d Respectively represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, R5d With R6d Each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. Also, R5d With R6d Can be joined to form a ring. R5d With R6d The ring formed by the bonding is preferably an aliphatic ring, and may be either saturated or unsaturated, and preferably has a carbon number of 5 to 6. R1d ~R4d The number of carbon atoms in the alkyl group is usually 1 or more, and is usually 10 or less, preferably 8 or less, more preferably 5 or less. When it is set to the above upper limit or less, it tends to be suitable for developing solubility. Among these, from the viewpoint of solubility, R1d ~R4d It is preferably a hydrogen atom. R5d And R6d The number of carbon atoms in the alkyl group is usually 1 or more, and is usually 10 or less, preferably 8 or less, more preferably 5 or less. When it is set to the above lower limit value, the solubility tends to be appropriate, and the hydrophilicity tends to be maintained by setting it as the upper limit or less. Among these, from the viewpoint of developing solubility, R is preferred.5d And R6d Is a hydrogen atom, or R5d And R6d Linked to form an aliphatic ring having 5 to 6 carbon atoms. In the above formula (IIIa), it is preferred to have a structure represented by the following formula (IIIb), (IIIc) or (IIId). By introducing these partial structures, there is a tendency to increase heat resistance or strength. [化43]The repeating unit having a partial structure represented by the above formula (IIIa) is preferably represented by the following formula (III) from the viewpoint of hardenability. [化44]In formula (III), R4 Represents a hydrogen atom or a methyl group, R5 The partial structure represented by the above formula (IIIa) is shown. On the other hand, as the ethylenically unsaturated compound which is a source of the repeating unit γ, in addition to the (meth) acrylate having a partial structure represented by the above formula (IIIa), for example, α- of styrene may be mentioned. Styrenes such as alkyl, ortho, alkyl, p-alkyl, nitro, cyano, decylamine, ester derivatives; butadiene, 2,3-dimethylbutadiene, isoprene a diene such as alkene or chloroprene; methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, (meth)acrylic acid N-butyl acrylate, second butyl (meth) acrylate, tert-butyl (meth) acrylate, amyl (meth) acrylate, neopentyl (meth) acrylate, isoamyl (meth) acrylate, Hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, dodecyl (meth)acrylate, cyclopentyl (meth)acrylate, (a) Base) cyclohexyl acrylate, 2-methylcyclohexyl (meth) acrylate, dicyclohexyl (meth) acrylate, (meth) acrylateBase ester, adamantyl (meth) acrylate, allyl (meth) acrylate, propargyl (meth) acrylate, phenyl (meth) acrylate, naphthyl (meth) acrylate, (methyl) ) decyl acrylate, decyl (meth) acrylate, sunflower (meth) acrylate, salicyl (meth) acrylate, furyl (meth) acrylate, decyl (meth) acrylate, Tetrahydrofuranyl (meth)acrylate, pyranyl (meth)acrylate, benzyl (meth)acrylate, phenethyl (meth)acrylate, toluene (meth)acrylate, (meth)acrylic acid -1,1,1-trifluoroethyl ester, perfluoroethyl (meth)acrylate, perfluoro-n-propyl (meth)acrylate, perfluoroisopropyl (meth)acrylate, (meth)acrylic acid Phenylmethyl ester, cumyl (meth)acrylate, 3-(N,N-dimethylamino)propyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (methyl) (meth) acrylate such as 2-hydroxypropyl acrylate; (meth) acrylamide, N, N-dimethyl decyl (meth) acrylate, N, N- bis (meth) acrylate Ethyl decylamine, N,N-dipropyl decylamine (meth) acrylate, N (meth) acrylate (Methyl) acrylamide such as N-diisopropyl decylamine or decyl decyl methacrylate; (meth) acryl anilide, (meth) acrylonitrile, acrolein, vinyl chloride , vinylidene chloride, vinyl fluoride, vinylidene fluoride, N-vinyl pyrrolidone, vinyl pyridine, vinyl acetate, etc.; vinyl citrate, diethyl maleate , unsaturated dicarboxylic acid diesters such as diethyl fumarate and diethyl itaconate; N-phenyl maleimide, N-cyclohexyl maleimide, N-Lauryl maleimide, N-(4-hydroxyphenyl) maleimide, etc., mono-n-butylene diimine; N-(methyl) propylene fluorenyl phthalate A radically polymerizable compound such as dimethyl sulfoxide. Among these, in order to impart more excellent heat resistance and strength, it is effective to use at least one selected from the group consisting of styrene, benzyl (meth) acrylate, and mono-n-butylene iminoimide as the ethylenically unsaturated compound. The method for producing the (b-II) (meth)acrylic copolymer resin is not particularly limited, and can be obtained by copolymerizing a (meth) acrylate compound corresponding to each of the repeating units α to γ. Further, by first obtaining glycidyl (meth)acrylate, α-ethyl glycidyl (meth)acrylate, 3,4-epoxybutyl (meth)acrylate, methyl (methyl) Epoxy group-containing (meth) acrylate such as 3,4-epoxycyclohexyl acrylate or 4-hydroxybutyl methacrylate (glycidyl ether), (meth) acrylate, (meth) acrylate, etc. A copolymer of an ethylenically unsaturated compound, which is obtained by a method of adding an epoxy group-containing ethylenically unsaturated monocarboxylic acid to the epoxy group. The content ratio of the above repeating unit α in the (b-II) (meth)acrylic copolymer resin is usually 10 mol% or more, preferably 12 mol% or more, more preferably 15 mol% or more, and further It is preferably 18 mol% or more, more preferably 20 mol% or more, and particularly preferably 22 mol% or more, more preferably 25 mol% or more, further preferably 40 mol% or less, more preferably It is 35 mol% or less, more preferably 30 mol% or less, and still more preferably 25 mol% or less. When it is set to the above lower limit value, it is easy to ensure reliability, and it is easy to ensure surface smoothness by setting it as the said upper limit or less. Further, the content ratio of the repeating unit β in the (b-II) (meth)acrylic copolymer resin is preferably 20 mol% or more, more preferably 30 mol% or more, and still more preferably 40 mol%. More preferably, it is 50 mol% or more, and is preferably 70 mol% or less, more preferably 60 mol% or less, further preferably 50 mol% or less. When it is set to the above lower limit value, it is easy to ensure development solubility, and it is easy to ensure reliability by setting it as the said upper limit or less. Further, the content ratio of the above repeating unit γ in the (b-II) (meth)acrylic copolymer resin is usually 0 mol% or more, preferably 10 mol% or more, more preferably 20 mol% or more. Further, it is preferably 30 mol% or more, more preferably 60 mol% or less, still more preferably 50 mol% or less, still more preferably 40 mol% or less. When the value is equal to or higher than the lower limit value, the adhesion tends to be good, and when the value is equal to or less than the upper limit value, the reliability tends to be secured. The (b-II) (meth)acrylic copolymer resin has a weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography (GPC) of usually 3,000 or more, preferably 5,000 or more. More preferably, it is 10,000 or more, further preferably 15,000 or more, and usually 50,000 or less, preferably 30,000 or less, more preferably 20,000 or less. When the value is equal to or higher than the lower limit value, the reliability tends to be good, and the development solubility is preferably improved by setting it as the upper limit or less. The acid value of the (b-II) (meth)acrylic copolymer resin is not particularly limited, but is preferably 100 mg·KOH/g or more, more preferably 130 mg·KOH/g or more, and further preferably 160 mg. KOH/g or more is preferably 180 mg·KOH/g or more, more preferably 400 mg·KOH/g or less, still more preferably 300 mg·KOH/g or less, and further preferably 200 mg·KOH/ g below. When it is set to the above lower limit value, it is easy to ensure development solubility, and it is easy to ensure reliability by setting it as the said upper limit or less. In the photosensitive coloring composition of the present invention, a (b-II) (meth)acrylic acid group containing a repeating unit α having an ethylenically unsaturated bond in a side chain and a repeating unit β derived from an unsaturated carboxylic acid may be contained. The copolymerized resin may contain two or more kinds. In the case where two or more kinds of cases are contained, from the viewpoint of easily obtaining the effects of the present invention, it is preferred that the content of the repeating unit α in at least one of the resins is within the above range. On the other hand, in another aspect of the photosensitive coloring composition, two or more repeating units α having an ethylenically unsaturated bond having a side chain and a repeating unit β derived from an unsaturated carboxylic acid are contained ( In the case of b-II) (meth)acrylic copolymerized resin, all of the repeating units of all kinds of (b-II) (meth)acrylic copolymer resin may be used as a reference. The content ratio of the repeating unit α is within the above range. Similarly, the content ratio of the repeating unit β can be set based on all repeating units of all kinds of (b-II) (meth)acrylic copolymer resin. In the case where the repeating unit γ is contained, the content ratio of the repeating unit γ can be similarly determined based on all the repeating units of all kinds of (b-II) (meth)acrylic copolymer resin. <Other alkali-soluble resin> The (b) alkali-soluble resin used in the present invention contains, in addition to the above (bI) epoxy (meth) acrylate resin and the above (b-II) (meth) acryl-based copolymer resin, It may also contain other alkali soluble resins. The other alkali-soluble resin is not limited, and may be selected from the resins generally used for the photosensitive coloring composition. For example, the adhesive resin described in JP-A-2007-271702, JP-A-2007-316620, JP-A-2007-334290, and the like can be used. Further, from the viewpoint of compatibility with a pigment, a dispersant or the like, an acrylic resin is preferably used, and those described in JP-A-2014-137466 are more preferably used. <(c) Photopolymerization initiator> (c) The photopolymerization initiator has a function of directly absorbing light, causing a decomposition reaction or a hydrogen abstraction reaction, and generating a function of polymerizing active radicals. An addition agent such as a polymerization accelerator (chain transfer agent) or a sensitizing dye may be added as needed. Examples of the photopolymerization initiator include a metallocene compound containing a titanocene compound described in JP-A-59-152396, JP-A-61-151197, and JP-A-2000 The hexaarylbiimidazole derivative described in the above-mentioned Japanese Patent Publication No. Hei 10-39503, the halomethylated oxadiazole derivative, the halomethyl sulphide derivative, and the N-benzene. Radical active agents such as N-aryl-α-amino acids, N-aryl-α-amino acid salts, N-aryl-α-amino acid esters, etc., α-amines An alkyl benzophenone derivative, an oxime ester derivative or the like described in JP-A-2000-80068, JP-A-2006-36750, and the like. Specifically, examples of the titanocene derivative include bis(cyclopentadienyl)titanium dichloride, bis(cyclopentadienyl)bisphenyltitanium, and bis(cyclopentadienyl). Bis(2,3,4,5,6-pentafluorophenyl-1-yl)titanium, bis(cyclopentadienyl)bis(2,3,5,6-tetrafluorophenyl-1-yl)titanium , bis(cyclopentadienyl)bis(2,4,6-trifluorophenyl-1-yl)titanium, bis(cyclopentadienyl)bis(2,6-difluorophenyl-1-yl)titanium , bis(cyclopentadienyl)bis(2,4-difluorophenyl-1-yl)titanium, bis(methylcyclopentadienyl)bis(2,3,4,5,6-pentafluorobenzene -1-yl)titanium, bis(methylcyclopentadienyl)bis(2,6-difluorophenyl-1-yl)titanium, bis(cyclopentadienyl)[2,6-difluoro-3 -(pyrrol-1-yl)-phenyl-1-yl]titanium or the like. Further, examples of the biimidazole derivative include 2-(2'-chlorophenyl)-4,5-diphenylimidazole dimer and 2-(2'-chlorophenyl)-4,5-. Bis(3'-methoxyphenyl)imidazole dimer, 2-(2'-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-methoxyphenyl A-4,5-diphenylimidazole dimer, (4'-methoxyphenyl)-4,5-diphenylimidazole dimer, and the like. Further, examples of the halomethylated oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuranyl)-1,3,4-oxadiazole and 2-trichloro. Methyl-5-[β-(2'-benzofuranyl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-(6" -benzofuranyl)vinyl)]-1,3,4-oxadiazole, 2-trichloromethyl-5-furanyl-1,3,4-oxadiazole, etc. Also, as a halomethyl group The derivatives are all: tris(2-methoxyphenyl)-4,6-bis(trichloromethyl)-tetra-, 2-(4-methoxynaphthyl) -4,6-bis(trichloromethyl)-tetra-, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-all-?, 2-(4- Ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl) is tri- or the like. Further, as the α-aminoalkylphenone derivative, 2-methyl-1- [4-(Methylthio)phenyl]-2-oxalinylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-indolylphenyl)-butyl Keto-1, 2-benzyl-2-dimethylamino-1-(4-indolylphenyl)butan-1-one, ethyl 4-dimethylaminobenzoate, 4-dimethyl Isoamyl benzoate, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, 2-ethylhexyl 1,4-dimethylaminobenzoate, 2,5-bis ( 4-two Aminobenzylidene)cyclohexanone, 7-diethylamino-3-(4-diethylaminobenzimidyl)coumarin, 4-(diethylamino)chalcone, etc. The photopolymerization initiator is effective as an oxime ester compound in terms of sensitivity or plate-making property, and is disadvantageous in terms of sensitivity when using an alkali-soluble resin containing a phenolic hydroxyl group. Therefore, in particular, such an oxime ester compound which is excellent in sensitivity is useful. Since the oxime ester compound has both a structure for absorbing ultraviolet rays, a structure for transmitting light energy, and a structure for generating radicals in the structure, a small amount is highly sensitive. Further, it is stable to a thermal reaction, and a photosensitive resin composition having a high sensitivity can be obtained in a small amount. Examples of the oxime ester-based compound include compounds represented by the following formula (IV).In the above formula (IV), R21a A hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent. R21b Represents any substituent containing an aromatic ring or a heteroaromatic ring. R22a An alkane group which may have a substituent or an aryl group which may have a substituent. R21a The number of carbon atoms in the alkyl group is not particularly limited, and is usually 1 or more, preferably 2 or more, and usually 20 or less, preferably 15 or less, from the viewpoint of solubility or sensitivity in a solvent. More preferably 10 or less. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a cyclopentylethyl group, and a propyl group. Examples of the substituent which the alkyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amine group, a decylamino group, and a 4-(2-methoxy-1-methyl)ethoxy group-2. -Methylphenyl or N-ethinyl-N-acetoxyamino group or the like is preferably unsubstituted from the viewpoint of easiness of synthesis. As R21a Examples of the aromatic ring group in the middle include an aromatic hydrocarbon ring group and a heteroaromatic ring group. The number of carbon atoms of the aromatic ring group is not particularly limited, and is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. Moreover, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, still more preferably 12 or less. Specific examples of the aromatic ring group include a phenyl group, a naphthyl group, a pyridyl group, and a furyl group. Among these, from the viewpoint of developability, a phenyl group or a naphthyl group is preferred, and benzene is more preferred. base. Examples of the substituent which the aromatic ring group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amine group, a decylamino group, and an alkyl group. From the viewpoint of developability, a hydroxyl group or a carboxyl group is preferred, and more preferably carboxyl. Among these, from the viewpoint of developability, R21a It is preferably an alkyl group which may have a substituent, more preferably an unsubstituted alkyl group, and further preferably a methyl group. Also, as R21b Preferably, the substituted carbazolyl group and the substituted 9-oxosulfuric acid are listed.a base or a substituted diphenyl sulfide group. Among these, a diphenyl sulfide group which can be substituted is preferable from the viewpoint of suppressing the elution of N-methylpyrrolidone (NMP). Also, R22a The number of carbon atoms in the alkane group is not particularly limited, and is usually 2 or more, preferably 3 or more, and usually 20 or less, preferably 15 or less, from the viewpoint of solubility or sensitivity in a solvent. More preferably, it is 10 or less, More preferably, it is 5 or less. Specific examples of the alkyl fluorenyl group include an ethyl hydrazine group, a hydroxyethyl group, a propyl fluorenyl group, and a butyl group. Examples of the substituent which the alkano group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amine group, and a guanamine group. From the viewpoint of easiness of synthesis, it is preferably unsubstituted. Also, R22a The carbon number of the fluorenyl group in the medium is not particularly limited, and is usually 7 or more, preferably 8 or more, and usually 20 or less, preferably 15 or less, from the viewpoint of solubility or sensitivity in the solvent. More preferably 10 or less. Specific examples of the aryl group include a benzamidine group, a naphthylmethyl group, and the like. Examples of the substituent which the aryl group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amine group, a decylamino group, and an alkyl group. From the viewpoint of easiness of synthesis, it is preferably unsubstituted. In these terms, from the point of view of sensitivity, R22a It is preferably an alkane group which may have a substituent, more preferably an unsubstituted alkyl group, and further preferably an ethyl group. Among the compounds represented by the above formula (IV), from the viewpoint of suppressing the elution of NMP, a compound represented by the following formula (V) is preferred. [Chem. 46]In the above formula (V), Rtwenty three An alkyl group which may have a substituent or an aromatic ring group which may have a substituent. Rtwenty four An alkyl group which may have a substituent or an aromatic ring group which may have a substituent. R25 It represents a hydroxyl group, a carboxyl group, or a group represented by the following formula (V-1), and h represents an integer of 0-5. The benzene ring shown in the formula (V) may further have a substituent. [化47]In formula (V-1), R25a Represents -O-, -S-, -OCO- or -COO-. R25b Represents an alkylene group which may have a substituent. R25b The alkyl moiety can be interrupted 1 - 5 times by -O-, -S-, -COO- or -OCO-. R25 The alkyl moiety may have a branched side chain or a cyclohexyl group. R25c Indicates a hydroxyl group or a carboxyl group. Rtwenty three The number of carbon atoms in the alkyl group is not particularly limited, and is preferably 1 or more from the viewpoint of solubility in the photosensitive coloring composition. Further, from the viewpoint of developability, it is preferably 20 or less, more preferably 10 or less, still more preferably 8 or less, still more preferably 5 or less, and still more preferably 3 or less. Specific examples of the alkyl group include a methyl group, a hexyl group, and a cyclopentylmethyl group. Among them, a methyl group or a hexyl group is more preferably a methyl group from the viewpoint of developability. Examples of the substituent which the alkyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amine group, and a guanamine group. From the viewpoint of alkali developability, a hydroxyl group or a carboxyl group is preferred. Good is a carboxyl group. Further, from the viewpoint of easiness of synthesis, it is preferably unsubstituted. As Rtwenty three Examples of the aromatic ring group in the middle include an aromatic hydrocarbon ring group and a heteroaromatic ring group. The number of carbon atoms of the aromatic ring group is not particularly limited, and is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. Moreover, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, still more preferably 12 or less. Specific examples of the aromatic ring group include a phenyl group, a naphthyl group, a pyridyl group, and a furyl group. Among these, from the viewpoint of developability, a phenyl group or a naphthyl group is preferred, and benzene is more preferred. base. Examples of the substituent which the aromatic ring group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amine group, a decylamino group, and an alkyl group. From the viewpoint of developability, a hydroxyl group or a carboxyl group is preferred, and more preferably carboxyl. Among these, from the viewpoint of developability, Rtwenty three It is preferably an alkyl group which may have a substituent, more preferably an unsubstituted alkyl group, and further preferably a methyl group. Rtwenty four The number of carbon atoms in the alkyl group is not particularly limited, and is preferably 1 or more from the viewpoint of sensitivity. Further, from the viewpoint of sensitivity, it is preferably 20 or less, more preferably 10 or less, further preferably 5 or less, and particularly preferably 3 or less. Specific examples of the alkyl group include a methyl group, an ethyl group, and a propyl group. Among these, a methyl group or an ethyl group is preferred from the viewpoint of sensitivity, and a methyl group is more preferred. Examples of the substituent which the alkyl group may have include a halogen atom, a hydroxyl group, a carboxyl group, an amine group, and a decylamino group. From the viewpoint of alkali developability, a hydroxyl group, a carboxyl group, and more preferably a carboxyl group are preferable. On the one hand, from the viewpoint of easiness of synthesis, it is preferably unsubstituted. As Rtwenty four Examples of the aromatic ring group in the middle include an aromatic hydrocarbon ring group and a heteroaromatic ring group. The carbon number is preferably 30 or less, more preferably 12 or less, and usually 4 or more, preferably 6 or more. When it is set to the above upper limit value, it tends to be high-sensitivity, and it is preferable to have a low sublimation property by setting it as the said lower limit or more. The aromatic hydrocarbon ring group means an aromatic hydrocarbon ring having one free atomic valence. The aromatic hydrocarbon ring of the aromatic hydrocarbon ring group may be a single ring or a condensed ring, and examples thereof include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, an anthracene ring, a condensed tetraphenyl ring, an anthracene ring, and a benzofluorene ring. ring,Ring, joint three-extension benzene ring, anthracycline ring, fluorene ring, ring and so on. Further, a heteroaromatic ring group means a heteroaromatic ring having one free atomic valence. The heteroaromatic ring of the heteroaromatic ring group may be a single ring or a condensed ring, and examples thereof include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, and an anthracene ring. Diazole ring, anthracene ring, indazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furanfuran ring, thiophene Furan ring, benzisoxazole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridyl ring, fluorene ring, pyrimidine ring, tricyclic ring, quinoline ring, isoquinoline ring ,A porphyrin ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, an acridine ring, a quinazoline ring, a quinazolinone ring, an anthracene ring or the like. Examples of the substituent which the aromatic ring group may have include an alkyl group, a halogen atom, a hydroxyl group, and a carboxyl group. In these terms, from the point of view of sensitivity, Rtwenty four It is preferably an alkyl group which may have a substituent, more preferably an unsubstituted alkyl group, and further preferably a methyl group. On the other hand, in terms of plate making, Rtwenty four It is preferably an aromatic ring group which may have a substituent, more preferably an aromatic hydrocarbon group which may have a substituent, and further preferably an unsubstituted aromatic hydrocarbon group, and particularly preferably a phenyl group. R25 In the viewpoint of sensitivity and developability, the hydroxyl group, the carboxyl group or the group represented by the above formula (V-1) is preferably a group represented by the above formula (V-1). In the above formula (V-1), as described above, R25a In the viewpoint of sensitivity and developability, -O-, -S-, -OCO- or -COO- is preferred, and -O- or -OCO-, more preferably -O-. As mentioned above, R25b Represents an alkylene group which may have a substituent. R25b The number of carbon atoms of the alkylene group is not particularly limited, and is preferably 1 or more, more preferably 2 or more, and more preferably 20 or less, from the viewpoint of solubility in the photosensitive coloring composition. It is preferably 10 or less, more preferably 5 or less, and particularly preferably 3 or less. The alkyl group may be a straight chain, may be branched, or may contain an aliphatic ring. Among these, from the viewpoint of solubility in the photosensitive coloring composition, linear is preferred. Specific examples of the alkylene group include a methylene group, an ethylidene group, and a propyl group. Among these, a methylene group is more preferable from the viewpoint of solubility in the photosensitive coloring composition. . As mentioned above, R25c It is a hydroxyl group or a carboxyl group. From the standpoint of reliability (liquid crystal contamination), R25c It is preferably a hydroxyl group. In the above formula (V), h represents an integer of 0 to 5. In particular, from the viewpoint of developability, h is preferably 1 or more, more preferably 4 or less, still more preferably 3 or less, still more preferably 2 or less, and most preferably 1. On the other hand, h is preferably 0 from the viewpoint of easiness of synthesis. Specific examples of the oxime ester compound represented by the above formula (IV) or (V) include the following. [48]The method for producing the oxime ester compound represented by the above formula (V) is not particularly limited, and it can be produced, for example, by the method described in JP-A-2000-080068. Further, as the oxime ester-based compound, a compound other than the above formula (IV) or (V) may be used, and for example, JP-A-2000-80068, JP-A-2006-36750, and International An oxime ester derivative or the like described in JP-A-2008- 075564, International Publication No. 2009/131189, and JP-A-2014-500852. The photopolymerization initiator may be used singly or in combination of two or more. For the purpose of improving the sensitivity of the induction, a sensitizing dye or a polymerization accelerator corresponding to the wavelength of the image exposure light source may be blended in the photopolymerization initiator. Examples of the sensitizing dyes include those described in JP-A-4-221958 and JP-A-4-219756.A coumarin dye having a heterocyclic ring described in Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. The 3-ketocoumarin compound described in Japanese Laid-Open Patent Publication No. Hei 6-19240, and the Japanese Patent Laid-Open No. Sho 47-2528, and Japanese Patent Laid-Open No. 54- Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open No. Hei 59-56403, Japanese Patent Laid-Open No. Hei No. 2-69, Japanese Patent Laid-Open No. Hei No. 57-168088, Japanese Patent Laid-Open No. Hei 5-170761, Japan A dye having a dialkylamino benzene skeleton described in Japanese Laid-Open Patent Publication No. Hei-4-288818, and the like. Among these sensitizing dyes, preferred are amine group-containing sensitizing dyes, and further preferred are compounds having an amine group and a phenyl group in the same molecule. Particularly preferred are, for example, 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobiphenyl a benzophenone compound such as a ketone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone or 3,4-diaminobenzophenone; 2-( p-Dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5]benzoindole Oxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-carbazole, 2 -(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethyl) Aminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-diethylamine) Phenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine, (p-diethylaminophenyl) A compound containing a p-dialkylaminophenyl group such as a pyrimidine or the like. Among them, the most preferred one is 4,4'-dialkylaminobenzophenone. Further, the sensitizing dye may be used singly or in combination of two or more. As the polymerization accelerator, for example, an aromatic amine such as p-dimethylaminobenzoic acid ethyl ester or 2-dimethylaminoethyl benzoate; an aliphatic amine such as n-butylamine or N-methyldiethanolamine; The mercapto compound or the like. The polymerization accelerator may be used singly or in combination of two or more. <(d) Ethylene Unsaturated Compound> The photosensitive coloring composition of the present invention contains (d) an ethylenically unsaturated compound. The sensitivity is improved by containing (d) an ethylenically unsaturated compound. The ethylenically unsaturated compound used in the present invention is a compound having at least one ethylenically unsaturated group in its molecule. Specific examples thereof include (meth)acrylic acid, alkyl (meth)acrylate, acrylonitrile, styrene, and a carboxylic acid having one ethylenically unsaturated bond and a monoester of a polyhydric or monohydric alcohol. . In the present invention, it is particularly preferred to use a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule. The number of the ethylenically unsaturated groups of the polyfunctional ethylenic monomer is not particularly limited, but is usually 2 or more, preferably 4 or more, more preferably 5 or more, still more preferably 8 or less, and even more preferably 7 or less. When it is set to the above lower limit value, the sensitivity tends to be high, and the solubility in the solvent tends to be improved by setting it as the upper limit or less. Examples of the polyfunctional ethylenic monomer include an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid; an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid; and an aliphatic polyhydroxy compound and an aromatic group. An ester obtained by esterification reaction of a polyvalent hydroxy compound such as a polyhydroxy compound, an unsaturated carboxylic acid, and a polyvalent carboxylic acid. Examples of the ester of the above aliphatic polyhydroxy compound and unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, and trimethylolethane triacrylate. An acrylate of an aliphatic polyhydroxy compound such as an ester, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate or glycerin acrylate, The acrylate of the exemplified compound is replaced by the methacrylate of methacrylate, the iconic acid ester which is replaced by the iconic acid ester, the butenoate which is replaced by the butenoate or the substitution is A maleic acid ester of maleic acid ester or the like. Examples of the ester of the aromatic polyhydroxy compound and the unsaturated carboxylic acid include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, and resorcinol dimethyl. Acrylates and methacrylates of aromatic polyhydroxy compounds such as acrylate and pyrogallol triacrylate. The ester obtained by the esterification reaction of a polyvalent carboxylic acid and an unsaturated carboxylic acid with a polyvalent hydroxy compound is not necessarily a single substance, and specific examples thereof include acrylic acid, phthalic acid, and Ethylene glycol condensate; condensate of acrylic acid, maleic acid, and diethylene glycol; condensate of methacrylic acid, terephthalic acid, and pentaerythritol; acrylic acid, adipic acid, butanediol, and glycerin Condensate, etc. In addition, as an example of the polyfunctional ethylenic monomer used in the present invention, it is useful to use a polyisocyanate compound with a hydroxyl group-containing (meth) acrylate or a polyisocyanate compound with a polyol and a hydroxyl group. A (meth)acrylic acid urethane obtained by reacting a (meth) acrylate; an epoxy acrylate such as an addition reaction of a polyvalent epoxy compound with a hydroxy (meth) acrylate or (meth) acrylate Esters; propylene oxime amines such as ethyl bis acrylamide; allyl esters such as diallyl phthalate; vinyl-containing compounds such as divinyl phthalate. Examples of the (meth)acrylic acid amides include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, and U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), UA-306H, UA-510H, UF-8001G (manufactured by Xierongshe Chemical Co., Ltd.) ), UV-1700B, UV-7600B, UV-7605B, UV-7630B, UV7640B (manufactured by Nippon Synthetic Chemical Co., Ltd.). Among these, from the viewpoint of curability, as the (d) ethylenically unsaturated compound, it is preferred to use an alkyl (meth)acrylate, and more preferably dipentaerythritol hexaacrylate. These may be used alone or in combination of two or more. <(e) Solvent> The photosensitive coloring composition of the present invention contains (e) a solvent. By containing the (e) solvent, the pigment can be dispersed in a solvent, and coating can be facilitated. The photosensitive coloring composition of the present invention is usually (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (f) a dispersant, and, if necessary, It is used in a state in which various other materials used are dissolved or dispersed in a solvent. Among the solvents, from the viewpoint of dispersibility or coatability, an organic solvent is preferred. In the organic solvent, from the viewpoint of coatability, it is preferred to select a boiling point of 100 to 300 ° C, and more preferably a boiling point of 120 to 280 ° C. Further, the term "boiling point" as used herein means the boiling point at a pressure of 1013.25 hPa. As such an organic solvent, the following are mentioned, for example. Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol tert-butyl ether, diethyl Glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethylpentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methyl-3-methoxy Glycol monoalkyl ethers such as butanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, tripropylene glycol methyl ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol Glycol dialkyl ethers such as glyceryl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether; ethylene glycol monomethyl ether Acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl Ether acetate, butyl methoxyacetate, butyl 3-methoxyacetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate , Ethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, 3-methyl-3-methoxy Glycol alkyl ether acetates such as butyl acetate; diols such as ethylene glycol diacetate, 1,3-butylene glycol diacetate, and 1,6-hexanol diacetate Acetate; alkyl acetate such as cyclohexyl acetate; pentyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, ethyl isobutyl ether, dihexyl ether Ethers; acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl Ketones such as ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl decyl ketone, methoxy methyl pentanone; ethanol, propanol, butanol, Mono- or polyhydric alcohols such as hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerol, benzyl alcohol ; n-pentane, n-octane, diisobutylene, n-hexane, hexene Aliphatic hydrocarbons such as isoprene, dipentene, and dodecane; alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, and cyclohexane; benzene , aromatic hydrocarbons such as toluene, xylene, cumene; amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol Acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl octanoate, butyl stearate, ethyl benzoate, 3-ethoxy Methyl propyl propionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, 3-methoxy a chain or cyclic ester such as butyl propionate or γ-butyrolactone; an alkoxycarboxylic acid such as 3-methoxypropionic acid or 3-ethoxypropionic acid; chlorobutane, Halogenated hydrocarbons such as chloropentane; ether ketones such as methoxymethylpentanone; nitriles such as acetonitrile and benzonitrile; and the like. Examples of the commercially available organic solvent include mineral spirits, Varsol #2, Apco #18 solvent, Apco diluent, Socal solvent No. 1 and No. 2, Solvesso #150, Shell TS28 solvent, and card. Alcohol, ethyl carbitol, butyl carbitol, acesulfasol ("Salousu" is a registered trademark; the same below), B. Lucerne, B. sulphate acetate, A. Acetate, diethylene glycol dimethyl ether (both trade names), and the like. These organic solvents may be used singly or in combination of two or more. In the case where the colored spacer is formed by photolithography, it is preferred to select an organic solvent as a boiling point of 100 to 200 ° C (pressure 1013.25 hPa; the following is true for all boiling points). More preferably, it has a boiling point of 120 to 170 °C. Among the above organic solvents, a glycol base ether acetate is preferred because the balance between coatability and surface tension is good, and the solubility of the constituent components in the composition is relatively high. Further, the glycol alkyl ether acetates may be used singly or in combination with other organic solvents. As the organic solvent to be used in combination, a diol monoalkyl ether is preferable. Among them, in particular, the solubility of the constituent components in the composition is preferably propylene glycol monomethyl ether. Further, the diol monoalkyl ethers have a high polarity, and if the amount is too large, the pigment tends to aggregate, and the storage stability of the colored resin composition obtained thereafter is lowered, so that the storage stability is lowered. The proportion of the alcohol monoalkyl ether is preferably from 5% by mass to 30% by mass, more preferably from 5% by mass to 20% by mass. Further, it is also preferred to use an organic solvent having a boiling point of 150 ° C or higher (hereinafter sometimes referred to as "high boiling point solvent"). By using such a high boiling point solvent in combination, the photosensitive coloring composition becomes less likely to be dried, and has an effect of preventing the uniform dispersion state of the pigment in the composition from being destroyed by rapid drying. In other words, it has an effect of preventing the occurrence of impurity defects due to precipitation or solidification of a toner or the like at the tip of the slit nozzle. In terms of such a high effect, among the above various solvents, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are particularly preferable. The content ratio of the high boiling point solvent in the organic solvent is preferably from 3% by mass to 50% by mass, more preferably from 5% by mass to 40% by mass, even more preferably from 5% by mass to 30% by mass. When the thickness is equal to or higher than the lower limit value, it is possible to suppress the occurrence of an impurity defect due to precipitation or solidification at the tip of the slit nozzle, and the like, and it is possible to suppress the combination by setting the upper limit or lower. The drying speed of the object is slow, and the tendency of problems such as poor touch of the vacuum drying process or stomata marks of prebaking is suppressed. Further, the high boiling point solvent having a boiling point of 150 ° C or higher may be a glycol alkyl ether acetate or a glycol alkyl ether. In this case, a high boiling point solvent having a boiling point of 150 ° C or higher may not be additionally contained. . Preferred examples of the high-boiling point solvent include diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, and dipropylene glycol methyl ether acetate in various solvents described above. , 3-butanediol diacetate, 1,6-hexanol diacetate, triacetin, and the like. <(f) Dispersant> In the photosensitive coloring composition of the present invention, it is important to ensure the stability of the quality, that the (a) coloring agent is finely dispersed and the dispersion state is stabilized, so that f) Dispersant. The (f) dispersant is preferably a polymer dispersant having a functional group, and further preferably a polymer dispersant having a functional group such as a carboxyl group; a phosphate group; a sulfonate in terms of dispersion stability. An acid group; or a base of such a salt; a primary, secondary or tertiary amine group; a quaternary ammonium salt group; a nitrogen-containing heterocyclic group derived from a pyridine, a pyrimidine or a pyridyl group. Among them, in particular, from the viewpoint of dispersing a small amount of a dispersing agent when dispersing a pigment, a polymer dispersing agent having a basic functional group such as a primary, secondary or tertiary amine group; a base; a group derived from a nitrogen-containing heterocyclic ring such as pyridine, pyrimidine or pyridinium. In addition, examples of the polymer dispersant include an urethane dispersant, an acryl dispersant, a polyethylenimine dispersant, a polyallylamine dispersant, and an amine group-containing dispersant. Monomer and macromonomer dispersant, polyoxyethylene alkyl ether dispersant, polyoxyethylene diester dispersant, polyether phosphate dispersant, polyester phosphate dispersant, sorbitan fatty ester A dispersant, an aliphatic modified polyester dispersant, or the like. Specific examples of such a dispersing agent include the following: EFKA (registered trademark; manufactured by BASF Corporation), DISPERBYK (registered trademark; manufactured by BYK-Chemie Co., Ltd.), Disparlon (registered trademark; manufactured by Nanben Chemical Co., Ltd.), SOLSPERSE (registered trademark; manufactured by Lubrizol Co., Ltd.), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), Ajisper (registered trademark; manufactured by Ajinomoto Co., Ltd.), and the like. These polymer dispersants may be used alone or in combination of two or more. The weight average molecular weight (Mw) of the polymer dispersant is usually 700 or more, preferably 1,000 or more, and usually 100,000 or less, preferably 50,000 or less. In the above, the dispersing agent (f) preferably contains a urethane-based polymer dispersing agent having a functional group and/or an acrylic polymer dispersing agent, and particularly preferably Contains an acrylic polymer dispersant. Further, in terms of dispersibility and preservability, a polymer dispersant having a basic functional group and having a polyester bond and/or a polyether bond is preferred. Examples of the urethane-based and acrylic-based polymer dispersing agents include DISPERBYK 160 to 166 and 182 series (all of which are urethane-based), DISPERBYK 2000, 2001, and LPN 21116 (all of which are acrylic) (above). All are manufactured by BYK-Chemie). As a urethane-based polymer dispersing agent, a specific chemical structure is specifically exemplified, and examples thereof include a polyisocyanate compound and a compound having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the molecule. And a dispersion resin having a weight average molecular weight of 1,000 to 200,000 obtained by reacting a compound having active hydrogen and a tertiary amino group in the same molecule. By treating these with a quaternizing agent such as benzyl chloride, all or a part of the tertiary amine group can be made into a quaternary ammonium salt group. Examples of the polyisocyanate compound include p-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, and naphthalene-1,5- Aromatic diisocyanate such as diisocyanate or tolidine diisocyanate; hexamethylene diisocyanate, methyl isocyanate diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, dimer acid diisocyanate Alicyclic diisocyanate; isophorone diisocyanate, 4,4'-methylene bis(cyclohexyl isocyanate), ω, ω'-diisocyanato-dimethylcyclohexane or the like alicyclic diisocyanate An aliphatic diisocyanate having an aromatic ring such as phenyldimethyl diisocyanate, α,α,α',α'-tetramethylbenzenedimethyl diisocyanate; an isocyanate triisocyanate, 1,6,11- Undecane triisocyanate, 1,8-diisocyanato-4-isocyanatomethyloctane, 1,3,6-hexamethylene triisocyanate, bicycloheptane triisocyanate, three (iso) a triisocyanate such as cyanatophenyl)methane or tris(isocyanatophenyl)phosphorothioate; and such terpolymers and water adducts And those of polyhydric alcohol adducts. As the polyisocyanate, a terpolymer of an organic diisocyanate is preferred, and a trimer of toluene diisocyanate and a metapolymer of isophorone diisocyanate are preferred. These may be used alone or in combination of two or more. Examples of the method for producing the isocyanate trimer include the use of a suitable trimerization catalyst, for example, a tertiary amine, a phosphine, an alkoxide, a metal oxide, a carboxylate, or the like. The polyisocyanate undergoes partial trimerization of the isocyanate group, and after the trimerization is stopped by adding the catalyst poison, the unreacted polyisocyanate is removed by solvent extraction and thin film distillation, thereby obtaining the target isocyanurate-containing ester. Polyisocyanate. Examples of the compound having a number average molecular weight of 300 to 10,000 having one or two hydroxyl groups in the same molecule include polyether glycol, polyester glycol, polycarbonate diol, and polyolefin. A diol or the like, and a single terminal hydroxyl group of the compounds are alkoxylated with an alkyl group having 1 to 25 carbon atoms, and a mixture of two or more of them. Examples of the polyether glycol include a polyether diol, a polyetherester diol, and a mixture of two or more of these. Examples of the polyether diol include those obtained by homopolymerization or copolymerization of an alkylene oxide, and examples thereof include polyethylene glycol, polypropylene glycol, polyethylene glycol-propylene glycol, and polyoxytetraethylene. a diol, a polyoxyhexamethylene glycol, a polyoxyoctamethylene glycol, and a mixture of two or more thereof. As the polyetherester diol, a reaction may be exemplified by reacting an ether group-containing diol or a mixture thereof with another diol with a dicarboxylic acid or an anhydride, or a polyester diol (polyester) Glycol), which is obtained by a reaction with an alkylene oxide, may, for example, be poly(polyoxytetramethylene) adipate or the like. As a polyether glycol, preferably polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol or a single terminal hydroxyl group of the compound is subjected to alkoxylation with an alkyl group having 1 to 25 carbon atoms. A compound formed by the base. Examples of the polyester glycol include dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, and phthalic acid). Etc.) or such anhydrides and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butane) Alcohol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1,5-pentanediol, neopentyl glycol, 2-methyl-1,3-propanediol, 2-methyl 2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,5-pentanediol, 1,6-hexanediol, 2-methyl- 2,4-pentanediol, 2,2,4-trimethyl-1,3-pentanediol, 2-ethyl-1,3-hexanediol, 2,5-dimethyl-2,5 - an aliphatic diol such as hexanediol, 1,8-octamethylene glycol, 2-methyl-1,8-octamethylene glycol or 1,9-nonanediol; bishydroxymethyl ring An alicyclic diol such as hexane; an aromatic diol such as benzenedimethanol or bishydroxyethoxybenzene; an N-alkyl dialkanolamine such as N-methyldiethanolamine; or the like obtained by polycondensation, for example, poly Ethylene adipate, polybutylene adipate, polyhexamethylene adipate, polyethylene adipate / A propylene glycol adipate or the like; or a polylactone diol or a polylactone monool obtained by using the above diol (diol) or a carbon number of 1 to 25 as a starter, for example, polyhexanol Lactone diol, polymethyl valerolactone, and mixtures of two or more thereof. As the polyester glycol, polycaprolactone diol or polycaprolactone having a carbon number of 1 to 25 as an initiator is preferred. Examples of the polycarbonate diol include (1,6-hexanediester) polycarbonate and (3-methyl-1,5-pentanedicarboxylate). Examples of the polyolefin diol include polybutadiene. An olefinic diol, a hydrogenated polybutadiene diol, or a hydrogenated polyisoprene diol. These may be used alone or in combination of two or more. The number average molecular weight of the compound having one or two hydroxyl groups in the same molecule is usually from 300 to 10,000, preferably from 500 to 6,000, more preferably from 1,000 to 4,000. A compound having active hydrogen and a tertiary amino group in the same molecule used in the present invention will be described. The active hydrogen, that is, the hydrogen atom directly bonded to the oxygen atom, the nitrogen atom or the sulfur atom, may be a hydrogen atom in a functional group such as a hydroxyl group, an amine group or a thiol group, and among them, an amine group, particularly A hydrogen atom of a primary amine group. The tertiary amino group is not particularly limited, and examples thereof include an amine group having an alkyl group having 1 to 4 carbon atoms or a heterocyclic ring structure, and more specifically, an imidazole ring or a triazole ring. When such a compound having an active hydrogen and a tertiary amino group in the same molecule is exemplified, N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3- Propylenediamine, N,N-dipropyl-1,3-propanediamine, N,N-dibutyl-1,3-propanediamine, N,N-dimethylethylenediamine, N,N -diethylethylenediamine, N,N-dipropylethylenediamine, N,N-dibutylethylenediamine, N,N-dimethyl-1,4-butanediamine, N,N- Diethyl-1,4-butanediamine, N,N-dipropyl-1,4-butanediamine, N,N-dibutyl-1,4-butanediamine, and the like. Further, examples of the nitrogen-containing heterocyclic ring in the case where the tertiary amino group is a nitrogen-containing heterocyclic ring structure include a pyrazole ring, an imidazole ring, a triazole ring, a tetrazole ring, an anthracene ring, an indazole ring, and an anthracene. a nitrogen-containing five-membered heterocyclic ring such as an azole ring, a benzimidazole ring, a benzotriazole ring, a benzoxazole ring, a benzothiazole ring, or a benzothiadiazole ring; a pyridine ring, a fluorene ring, a pyrimidine ring, A nitrogen-containing six-membered heterocyclic ring such as a tricyclic ring, a quinoline ring, an acridine ring or an isoquinoline ring. Among these nitrogen-containing heterocyclic rings, an imidazole ring or a triazole ring is preferred. Specific examples of such compounds having an imidazole ring and an amine group include 1-(3-aminopropyl)imidazole, histidine, 2-aminoimidazole, and 1-(2-aminoethyl). Imidazole and the like. Further, specific examples of the compound having a triazole ring and an amine group include 3-amino-1,2,4-triazole and 5-(2-amino-5-chlorophenyl)-3- Phenyl-1H-1,2,4-triazole, 4-amino-4H-1,2,4-triazole-3,5-diol, 3-amino-5-phenyl-1H-1 , 3,4-triazole, 5-amino-1,4-diphenyl-1,2,3-triazole, 3-amino-1-benzyl-1H-2,4-triazole, and the like. Among them, preferred are N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propanediamine, 1-(3-aminopropyl)imidazole, and 3 -Amino-1,2,4-triazole. These may be used alone or in combination of two or more. The compounding ratio of the raw material in the case of producing a urethane-based polymer dispersing agent is 10 to 10 parts by mass based on 100 parts by mass of the polyisocyanate compound, and the compound having one or two hydroxyl groups in the same molecule has an average molecular weight of 300 to 10,000. 200 parts by mass, preferably 20 to 190 parts by mass, more preferably 30 to 180 parts by mass, and the compound having active hydrogen and tertiary amino group in the same molecule is 0.2 to 25 parts by mass, preferably 0.3 to 24 parts by mass. Share. The production of the urethane-based polymer dispersant is carried out in accordance with a known method for producing a polyurethane resin. As a solvent at the time of production, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, and isophorone can be usually used; ethyl acetate, butyl acetate, and acetic acid are used. Esters such as Lucu; hydrocarbons such as benzene, toluene, xylene, and hexane; some alcohols such as diacetone alcohol, isopropanol, second butanol, and third butanol; chlorides such as dichloromethane and chloroform; An ether such as tetrahydrofuran or diethyl ether; an aprotic polar solvent such as dimethylformamide, N-methylpyrrolidone or dimethylhydrazine. These may be used alone or in combination of two or more. In the above production, a urethanization reaction catalyst can usually be used. Examples of the catalyst include tin-based catalysts such as dibutyltin laurate, dioctyltin laurate, dibutyltin octoate, and stannous octoate; and acetonitrile pyruvate and ferric chloride. An iron-based catalyst; a tertiary amine-based catalyst such as triethylamine or triethylenediamine. These may be used alone or in combination of two or more. The amount of the compound having an active hydrogen and a tertiary amino group in the same molecule is preferably controlled to be in the range of 1 to 100 mgKOH/g based on the amine value after the reaction. More preferably, it is in the range of 5 to 95 mgKOH/g. The amine value is a value expressed by the acid neutralization titration of the basic amine group with respect to the acid value in terms of the number of mg of KOH. When the amine value is less than the above range, the dispersibility is lowered, and if the amine value is outside the above range, the developability tends to be lowered. In the case where the isocyanate group remains in the polymer dispersant in the above reaction, if the isocyanate group is further destroyed by the alcohol or the amine compound, the stability with time of the product becomes high, which is preferable. The weight average molecular weight (Mw) of the urethane-based polymer dispersant is usually in the range of 1,000 to 200,000, preferably in the range of 2,000 to 100,000, and more preferably in the range of 3,000 to 50,000. When the molecular weight is less than 1,000, the dispersibility and the dispersion stability tend to be deteriorated. When the molecular weight exceeds 200,000, the solubility is lowered, the dispersibility is deteriorated, and the control of the reaction tends to be difficult. As the acrylic polymer dispersant, it is preferred to use an unsaturated group-containing monomer having a functional group (the functional group described herein as a functional group contained in the above polymer dispersant) A random copolymer, a graft copolymer, or a block copolymer containing an unsaturated group-containing monomer having no functional group. These copolymers can be produced by a known method. Specific examples of the unsaturated group-containing monomer having a functional group include (meth)acrylic acid, 2-(meth)acryloxyethyl succinic acid, and 2-(methyl) propylene. An unsaturated monomer having a carboxyl group such as a nonyloxyethylphthalic acid, a 2-(meth)acryloxyethyl hexahydrophthalic acid or an acrylic acid dimer; a dimethylamine (meth)acrylate An ethylenic ester, diethylaminoethyl (meth)acrylate, and a tertiary monomer having a tertiary amino group and a quaternary ammonium salt group, and the like. These may be used alone or in combination of two or more. Examples of the unsaturated group-containing monomer having no functional group include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and isopropyl (meth)acrylate. N-butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, benzyl (meth)acrylate, phenyl (meth)acrylate, (meth)acrylic acid ring Hexyl ester, phenoxyethyl (meth)acrylate, phenoxymethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, iso(艸+)yl (meth)acrylate , tricyclodecyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, N-vinyl pyrrolidone, styrene and its derivatives, α-methyl styrene; N-cyclohexyl cis N-substituted maleimide, such as enediamine, N-phenyl maleimide, N-benzyl maleimide, acrylonitrile, vinyl acetate, and poly(( Methyl methacrylate macromonomer, polystyrene macromonomer, poly(meth)acrylic acid 2-hydroxyethyl macromonomer, polyethylene glycol macromonomer, polypropylene glycol macromonomer, polycaprolactone Giant monomers such as giant monomers. These may be used alone or in combination of two or more. The acrylic polymer dispersant is particularly preferably an AB or BAB block copolymer comprising an A block having a functional group and a B block having no functional group, in which case, in addition to the above, the A block is derived from the above. In addition to the partial structure of the unsaturated group-containing monomer having a functional group, a partial structure derived from the above unsaturated group-containing monomer having no functional group may be contained, and these may be random copolymerization or block copolymerization. One aspect is contained in the A block. Further, the content of the partial structure containing no functional group in the A block is usually 80% by mass or less, preferably 50% by mass or less, and more preferably 30% by mass or less. The B block system includes a partial structure derived from the above unsaturated group-containing monomer having no functional group, and may contain two or more partial structures derived from a monomer in one B block, and these may be random. Any aspect of copolymerization or block copolymerization is contained in the B block. The A-B or B-A-B block copolymer is produced, for example, by the living polymerization method shown below. The living polymerization method includes an anion living polymerization method, a cationic living polymerization method, and a radical living polymerization method. The polymerization active species of the anionic living polymerization method is an anion, and is represented, for example, by the following scheme. [化49]In the above process, Ar1 Is a monovalent organic group, Ar2 For with Ar1 Different one-valent organic groups, M is a metal atom, and s and t are each an integer of 1 or more. The polymerization active species of the radical living polymerization method is a radical, and is represented, for example, by the following scheme. [化50]In the above process, Ar1 Is a monovalent organic group, Ar2 For with Ar1 Different one-valent organic groups, j and k are integers of 1 or more, respectively, Ra Is a hydrogen atom or a monovalent organic group, Rb For with Ra Different hydrogen atoms or monovalent organic groups. For the synthesis of the acrylic polymer dispersant, Japanese Patent Laid-Open No. Hei 9-62002, or P. Lutz, P. Masson et al, Polym. Bull. 12, 79 (1984), BC Anderson, GD Andrews can be used. Et al, Macromolecules, 14, 1601 (1981), K. Hatada, K. Ute, et al, Polym. J. 17, 977 (1985), 18, 1037 (1986), Right Hand Hao Yi, Putian Gengyi, Polymer Processing 36, 366 (1987), Dongcun Min Yan, Sakamoto K., Polymer Proceedings, 46, 189 (1989), M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737 (1987), A well-known method as described in Ada Shozo, Inoue Cheung Ping, Organic Synthetic Chemistry, 43, 300 (1985), DY Sogoh, WR Hertler et al, Macromolecules, 20, 1473 (1987). The acrylic polymer dispersing agent which can be used in the present invention may be an AB block copolymer or a BAB block copolymer, and the A block/B block constituting the copolymer is preferably from 1/99 to 80/20. In particular, it is preferably from 5/95 to 60/40 (mass ratio), and by setting it as such a range, there is a tendency to ensure a balance between dispersibility and storage stability. Further, the amount of the quaternary ammonium salt group in the 1 g of the AB block copolymer or the BAB block copolymer which can be used in the present invention is usually preferably 0.1 to 10 mmol, and it is ensured that the amount is within the range. The tendency to disperse. Further, in such a block copolymer, it is usually the same as the amine group produced in the production process, and the amine value is about 1 to 100 mgKOH/g, and from the viewpoint of dispersibility, it is preferably 10 mgKOH/g or more, more preferably 30 mgKOH/g or more, further preferably 50 mgKOH/g or more, further preferably 90 mgKOH/g or less, more preferably 80 mgKOH/g or less, further preferably 75 Below mgKOH/g. Here, the amine value of the dispersing agent such as the block copolymer is expressed by the mass of the alkali amount and the equivalent amount of KOH of the solid content other than the solvent in the dispersant sample, by the following method And measured. Accurately weigh 0.5 to 1.5 g of the dispersant sample into a 100 mL beaker and dissolve it with 50 mL of acetic acid. Use an automatic titrator with pH electrode with 0.1 mol/L HClO4 The solution was subjected to neutralization titration with an acetic acid solution. The titration point of the pH curve was titrated as the end point of the titration, and the amine value was determined by the following formula. Amine value [mgKOH/g] = (561 × V) / (W × S) [Where, W represents the amount of dispersant sample weighed [g], V represents the titer at the end of the titration [mL], and S represents dispersion Concentration of solid content of the sample of the agent [% by mass]] The amine value of the block copolymer also depends on the presence or absence of the acidic group which is the source of the acid value, and is generally lower, usually The weight average molecular weight (Mw) of 10 mgKOH/g or less is preferably in the range of 1,000 to 100,000. By setting it as the said range, it exists in the tendency which can maintain favorable dispersibility. In the case of having a quaternary ammonium salt group as a functional group, the specific structure of the polymer dispersant is not particularly limited, and from the viewpoint of dispersibility, it is preferred to have a repeat represented by the following formula (i) Unit (hereinafter sometimes referred to as "repeating unit (i)"). [化51]In the above formula (i), R31 ~R33 Each independently is a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent, R31 ~R33 Two or more of them may be bonded to each other to form a ring structure. R34 It is a hydrogen atom or a methyl group. X is a divalent linking group, Y- To counter anions. R of the above formula (i)31 ~R33 The number of carbon atoms of the alkyl group which may have a substituent is not particularly limited, but is usually 1 or more, more preferably 10 or less, still more preferably 6 or less. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group and the like. Among them, a methyl group, an ethyl group, a propyl group, and the like are preferable. Butyl, pentyl or hexyl, more preferably methyl, ethyl, propyl or butyl. Further, it may be either linear or branched. Further, it may contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group. R of the above formula (i)31 ~R33 The number of carbon atoms of the aryl group which may have a substituent is not particularly limited, and is usually 6 or more, more preferably 16 or less, still more preferably 12 or less. Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, a decyl group, and the like. Among them, benzene is preferred. A group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, or a diethylphenyl group, more preferably a phenyl group, a methylphenyl group, or an ethylphenyl group. R of the above formula (i)31 ~R33 The number of carbon atoms of the aralkyl group which may have a substituent is not particularly limited, and is usually 7 or more, more preferably 16 or less, still more preferably 12 or less. Specific examples of the aralkyl group include a phenylmethylene group, a phenylethyl group, a phenyl propyl group, a phenyl butyl group, a phenyl isopropyl group, and the like. Among them, a phenyl group is preferable. The group is a phenylethyl group, a phenyl propyl group, or a phenyl butyl group, more preferably a phenylmethylene group or a phenyl phenyl group. Among these, from the viewpoint of dispersibility, R is preferred.31 ~R33 Separately, each is an alkyl group or an aralkyl group, and specifically, preferably R31 And R33 Separately methyl or ethyl, and R32 It is a phenylmethylene group or a phenyl group, and is preferably an R group.31 And R33 Is methyl, and R32 It is a phenylmethylene group. In the case where the polymer dispersant has a tertiary amine as a functional group, it is preferably a repeating unit represented by the following formula (ii) from the viewpoint of dispersibility (hereinafter sometimes referred to as "repeating" Unit (ii)"). [化52]In the above formula (ii), R35 And R36 Each independently is a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent, R35 And R36 They can be bonded to each other to form a ring structure. R37 It is a hydrogen atom or a methyl group. Z is a divalent linking group. Also, as R of the above formula (ii)35 And R36 An alkyl group which may have a substituent, preferably used as the above formula (i)31 ~R33 And the instantiator. Similarly, as the above formula (ii) R35 And R36 An aryl group which may have a substituent, preferably used as the above formula (i)31 ~R33 And the instantiator. Also, as R of the above formula (ii)35 And R36 An aralkyl group which may have a substituent, preferably used as the above formula (i)31 ~R33 And the instantiator. Among these, preferably R35 And R36 Each is independently an alkyl group which may have a substituent, more preferably a methyl group or an ethyl group. As the above formula (i) R31 ~R33 And R of the above formula (ii)35 And R36 The alkyl group, the aralkyl group or the aryl group may have a substituent, and examples thereof include a halogen atom, an alkoxy group, a benzamidine group, a hydroxyl group and the like. In the above formulas (i) and (ii), examples of the divalent linking groups X and Z include an alkylene group having 1 to 10 carbon atoms, an extended aryl group having 6 to 12 carbon atoms, and -CONH-R.43 -base, -COOR44 -base [where, R43 And R44 It is a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkoxyalkyl group) having 2 to 10 carbon atoms, etc., preferably -COO-R44 -base. Further, in the above formula (i), Y as a counter anion- , can be listed as: Cl- , Br- , I- , ClO4 - BF4 - , CH3 COO- PF6 - Wait. The content ratio of the repeating unit represented by the above formula (i) is not particularly limited, and the content ratio of the repeating unit represented by the above formula (i) is expressed by the above formula (ii) from the viewpoint of dispersibility. The total content of the repeating unit is preferably 60% by mole or less, more preferably 50% by mole or less, still more preferably 40% by mole or less, still more preferably 35% by mole or less, and further preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 20 mol% or more, and particularly preferably 30 mol% or more. In addition, the content ratio of the repeating unit represented by the above formula (i) to the total repeating unit of the polymer dispersing agent is not particularly limited, and is preferably 1 mol% or more from the viewpoint of dispersibility. Preferably, it is 5 mol% or more, more preferably 10 mol% or more, further preferably 50 mol% or less, more preferably 30 mol% or less, further preferably 20 mol% or less, particularly preferably It is 15% or less. In addition, the content ratio of the repeating unit represented by the above formula (ii) to the total repeating unit of the polymer dispersing agent is not particularly limited, and is preferably 5 mol% or more from the viewpoint of dispersibility. Preferably, it is 10 mol% or more, further preferably 15 mol% or more, more preferably 20 mol% or more, further preferably 60 mol% or less, more preferably 40 mol% or less, and further preferably It is 30 mol% or less, and particularly preferably 25 mol% or less. In addition, the polymer dispersant preferably has a repeating unit represented by the following formula (iii) from the viewpoint of improving compatibility with a binder component such as a solvent and improving dispersion stability (hereinafter sometimes referred to as "Repeating unit (iii)"). [化53]In the above formula (iii), R40 For stretching ethyl or propyl, R41 Is an alkyl group which may have a substituent, R42 It is a hydrogen atom or a methyl group. n is an integer from 1 to 20. R of the above formula (iii)41 The number of carbon atoms of the alkyl group which may have a substituent is not particularly limited, and is usually 1 or more, preferably 2 or more, more preferably 10 or less, still more preferably 6 or less. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group and the like. Among them, a methyl group, an ethyl group, a propyl group, and the like are preferable. Butyl, pentyl or hexyl, more preferably methyl, ethyl, propyl or butyl. Further, it may be either linear or branched. Further, it may contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group. Further, in the above formula (iii), n is preferably 1 or more, more preferably 2 or more, and more preferably 10 or less, from the viewpoint of compatibility and dispersibility of a binder component such as a solvent. More preferably 5 or less. Further, the content ratio of the repeating unit represented by the above formula (iii) to the total repeating unit of the polymer dispersing agent is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more. Further, it is preferably 4 mol% or more, more preferably 30 mol% or less, still more preferably 20 mol% or less, still more preferably 10 mol% or less. When it is in the above range, the compatibility with the binder component such as a solvent and the dispersion stability tend to be balanced. Further, the polymer dispersant preferably has a repeating unit represented by the following formula (iv) from the viewpoint of improving the compatibility of the dispersant with respect to the binder component such as a solvent and improving the dispersion stability (hereinafter sometimes) It is called "repeating unit (iv)"). [54]In the above formula (iv), R38 It may be an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent. R39 It is a hydrogen atom or a methyl group. R of the above formula (iv)38 The number of carbon atoms of the alkyl group which may have a substituent is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 4 or more, still more preferably 10 or less, still more preferably 8 or less. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group and the like. Among them, a methyl group, an ethyl group, a propyl group, and the like are preferable. Butyl, pentyl or hexyl, more preferably methyl, ethyl, propyl or butyl. Further, it may be either linear or branched. Further, it may contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group. R of the above formula (iv)38 The number of carbon atoms of the aryl group which may have a substituent is not particularly limited, but is usually 6 or more, more preferably 16 or less, still more preferably 12 or less, still more preferably 8 or less. Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, a decyl group, and the like. Among them, benzene is preferred. A group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, or a diethylphenyl group, more preferably a phenyl group, a methylphenyl group, or an ethylphenyl group. R of the above formula (iv)38 The number of carbon atoms of the aralkyl group which may have a substituent is not particularly limited, but is usually 7 or more, more preferably 16 or less, still more preferably 12 or less, still more preferably 10 or less. Specific examples of the aralkyl group include a phenylmethylene group, a phenylethyl group, a phenyl propyl group, a phenyl butyl group, a phenyl isopropyl group, and the like. Among them, a phenyl group is preferable. The group is a phenylethyl group, a phenyl propyl group, or a phenyl butyl group, more preferably a phenylmethylene group or a phenyl phenyl group. Among these, in terms of solvent compatibility and dispersion stability, R38 It is preferably an alkyl group or an aralkyl group, more preferably a methyl group, an ethyl group or a phenylmethylene group. As R38 The alkyl group may have a substituent, and examples thereof include a halogen atom, an alkoxy group and the like. Further, examples of the substituent which the aryl group or the aralkyl group may have include a chain alkyl group, a halogen atom, an alkoxy group and the like. Also, in R38 The chain-like alkyl group represented by the chain includes either a linear chain or a branched chain. Further, the content of the repeating unit represented by the above formula (iv) in the total repeating unit of the polymer dispersing agent is preferably 30 mol% or more, more preferably 40 mol, from the viewpoint of dispersibility. % or more, further preferably 50 mol% or more, further preferably 80 mol% or less, more preferably 70 mol% or less. The polymer dispersant may have a repeating unit other than the repeating unit (i), the repeating unit (ii), the repeating unit (iii), and the repeating unit (iv). Examples of such a repeating unit include a repeating unit derived from a monomer such as styrene monomer such as styrene or α-methylstyrene or a (meth)acrylic acid chloride such as (meth)acrylonium chloride. Monomer; (meth) acrylamide, N-methylol acrylamide, etc. (meth) acrylamide monomer; vinyl acetate; acrylonitrile; allyl glycidyl ether, butyrate glycidol Ether; monomer such as N-methylpropenyl phthalocyanine. The polymer dispersant preferably comprises an A block having a repeating unit (i) and a repeating unit (ii) and a B having no repeating unit (i) and repeating unit (ii) from the viewpoint of further improving dispersibility. Block copolymers of blocks. The block copolymer is preferably an A-B block copolymer or a B-A-B block copolymer. Since not only the quaternary ammonium salt group but also the tertiary amine group is introduced into the A block, there is a tendency that the dispersing ability of the dispersing agent is remarkably improved. Further, the B block preferably has a repeating unit (iii), and more preferably has a repeating unit (iv). The repeating unit (i) and the repeating unit (ii) may be contained in the A block in any of random copolymerization and block copolymerization. Further, the repeating unit (i) and the repeating unit (ii) may each contain two or more kinds in one A block. In this case, each repeating unit may be in any state of random copolymerization or block copolymerization. Contained in the A block. Further, the repeating unit (i) and the repeating unit other than the repeating unit (ii) may be contained in the A block, and examples of such a repeating unit include the (meth)acrylate-based single sheet as described above. Repetitive units of the body, etc. The content of the repeating unit other than the repeating unit (i) and the repeating unit (ii) in the A block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, most preferably in the A block. This repeating unit is not included. The repeating unit other than the repeating units (iii) and (iv) may be contained in the B block, and examples of such a repeating unit include repeating units derived from the following monomers: styrene, α-methylstyrene, and the like. a styrene monomer; a (meth)acrylic acid chloride monomer such as (meth)acrylonium chloride; a (meth)acrylamide amine such as (meth)acrylamide or N-methylol acrylamide Monomer; vinyl acetate; acrylonitrile; allyl glycidyl ether, glycidyl butenoate; N-methylpropenyl phthalocyanine and other monomers. The content of the repeating unit other than the repeating unit (iii) and the repeating unit (iv) in the B block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, most preferably in the B block. This repeating unit is not included. Further, in terms of improving the dispersion stability, the (f) dispersant is preferably used in combination with the pigment derivative described below. In the photosensitive coloring composition of the present invention, in addition to the above components, an adhesion improving agent such as a decane coupling agent, a coating property improving agent, a development improving agent, and ultraviolet absorbing agent can be appropriately prepared. Agents, antioxidants, surfactants, pigment derivatives, photoacid generators, crosslinking agents, polymerization promoters, and the like. (1) Adhesion improving agent In order to improve the adhesion to a substrate, the photosensitive coloring composition of the present invention may contain an adhesion improving agent. As the adhesion improving agent, a decane coupling agent, a compound containing a phosphate group, or the like is preferable. As the type of the decane coupling agent, one of epoxy group, (meth)acrylic acid type, and amine group type may be used alone, or two or more types may be used in combination. Preferred examples of the decane coupling agent include (meth)acryl oxime such as 3-methacryloxypropylmethyldimethoxydecane or 3-methylpropenoxypropyltrimethoxydecane. Oxydecanes; 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldiethoxylate Ethylene decanes such as decane, 3-glycidoxypropyltriethoxy decane, etc.; ureido decanes such as 3-ureidopropyltriethoxydecane; 3-isocyanatepropyltriethoxydecane The isocyanate-based decane is preferably a decane coupling agent of an epoxy decane. The phosphoric acid group-containing compound is preferably a (meth)acrylonyl group-containing phosphate, and is preferably represented by the following formula (g1), (g2) or (g3). [化55]In the above formulas (g1), (g2) and (g3), R51 It represents a hydrogen atom or a methyl group, and l and l' are integers of 1 to 10, and m is 1, 2 or 3. These phosphate group-containing compounds may be used singly or in combination of two or more. (2) Surfactant In order to improve coatability, a surfactant may be contained in the photosensitive coloring composition of the present invention. As the surfactant, for example, an anionic, a cationic, a nonionic or an amphoteric surfactant can be used. Among them, a nonionic surfactant is preferably used in terms of a low possibility of adversely affecting each property, and among them, in terms of applicability, fluorine or lanthanum is effective. Surfactant. Examples of such a surfactant include TSF4460 (manufactured by GE Toshiba Silicones Co., Ltd.), DFX-18 (manufactured by NEOS Corporation), BYK-300, BYK-325, BYK-330 (manufactured by BYK-Chemie Co., Ltd.), and KP340 (for example). Shin-Etsu Silicones Co., Ltd.), F-470, F-475, F-478, F-559 (manufactured by DIC Corporation), SH7PA (manufactured by Toray Silicone Co., Ltd.), DS-401 (manufactured by Daikin Co., Ltd.), L-77 ( Nippon Unicar company, FC4430 (manufactured by Sumitomo 3M). Further, the surfactant may be used singly or in combination of two or more kinds in any combination and in any ratio. (3) Pigment Derivative In order to improve dispersibility and preservability, a pigment derivative may be contained as a dispersing aid in the photosensitive coloring composition of the present invention. Examples of the pigment derivative include an azo type, a phthalocyanine type, a quinacridone type, a benzimidazolone type, a quinophthalone type, an isoindolinone type, a diterpene type, and a lanthanide type. Derivatives such as indanthrene, anthraquinone, a purple ketone, a diketopyrrolopyrrole, and a diterpene are preferably phthalocyanine or quinophthalone. Examples of the substituent of the pigment derivative include a sulfonic acid group, a sulfonylamino group and a quaternary salt thereof, a phthalimidomethyl group, a dialkylaminoalkyl group, a hydroxyl group, a carboxyl group, a decylamino group, and the like. The sulfonic acid group is preferably bonded directly or via an alkyl group, an aryl group, a heterocyclic group or the like to the pigment skeleton. Further, the substituents may be substituted for a plurality of pigment skeletons. Specific examples of the pigment derivative include a sulfonic acid derivative of phthalocyanine, a sulfonic acid derivative of quinacridone, a sulfonic acid derivative of hydrazine, a sulfonic acid derivative of quinacridone, and a diketopyrrole. a sulfonic acid derivative of pyrrole, a sulfonic acid derivative of diterpene, and the like. These may be used alone or in combination of two or more. (4) Photoacid generator A photoacid generator is a compound which can generate an acid by ultraviolet rays, and undergoes an action of an acid generated during exposure, and a cross-linking reaction occurs because a crosslinking agent such as a melamine compound exists. . Among the photoacid generators, those having a solubility in a solvent, particularly a solvent used in a photosensitive coloring composition, are preferable, and examples thereof include diphenyl hydrazine, xylyl hydrazine, and benzene. P-p-anisyl, bis(m-nitrophenyl)fluorene, bis(p-butylphenyl)fluorene, bis(p-chlorophenyl)fluorene, bis(n-dodecyl)fluorene, p-isobutyl a diaryl sulfonium such as phenyl p-tolyl fluorene or p-isopropylphenyl p-tolyl fluorene; or a chloride or bromide of a triaryl sulfonium such as triphenylphosphonium; or a fluoroborate or a hexafluorophosphate; Hexafluoroarsenate, aromatic sulfonate, tetrakis(pentafluorophenyl)borate, etc.; or n-butyltriphenylborate diphenyl benzamidine methyl hydrazine or the like; 2-methyl-4,6-bis(trichloromethyl)trisole, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)trisole, etc. Compounds, etc., but not limited to this. (5) Crosslinking agent A crosslinking agent may be further added to the photosensitive coloring composition of the present invention. For example, a melamine or a guanamine-based compound may be used. Examples of the crosslinking agent include a melamine or a guanamine-based compound represented by the following formula (6). [化56]In equation (6), R61 Means -NR66 R67 Or an aryl group having 6 to 12 carbon atoms, in R61 For -NR66 R67 In the case of the base, R62 , R63 , R64 , R65 , R66 And R67 One represents -CH2 OR68 Base, and in R61 In the case of an aryl group having 6 to 12 carbon atoms, R62 , R63 , R64 And R65 One represents -CH2 OR68 Base, R62 , R63 , R64 , R65 , R66 And R67 The remaining ones independently represent hydrogen or -CH2 OR68 Base, here, R68 It represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Here, the aryl group having 6 to 12 carbon atoms is typically a phenyl group, a 1-naphthyl group or a 2-naphthyl group, and an alkyl group, an alkoxy group or a halogen atom may be bonded to the phenyl or naphthyl group. And other substituents. The alkyl group and the alkoxy group may each have a carbon number of about 1 to 6. R68 The alkyl group represented is preferably a methyl group or an ethyl group as described above, and more preferably a methyl group. The melamine-based compound of the formula (6), that is, the compound of the following formula (6-1), contains hexamethylol melamine, pentamethylol melamine, tetramethylol melamine, hexamethoxymethyl melamine. , pentamethoxymethyl melamine, tetramethoxymethyl melamine, hexaethoxymethyl melamine, and the like. [化57]In equation (6-1), in R62 , R63 , R64 , R65 , R66 And R67 When one is an aryl group, R62 , R63 , R64 And R65 One represents -CH2 OR68 Base, R62 , R63 , R64 , R65 , R66 And R67 The remaining ones independently represent a hydrogen atom or -CH2 OR68 Base, here, R68 Represents a hydrogen atom or an alkyl group. Further, it corresponds to the guanamine compound of the formula (6), that is, the R in the formula (6)61 The compound which is an aryl group contains tetramethylolbenzoguanamine, tetramethoxymethylbenzoguanamine, trimethoxymethylbenzoguanamine, tetraethoxymethylbenzoguanamine, and the like. Further, a crosslinking agent having a methylol group or a methylol alkyl ether group can also be used. The examples are listed below. 2,6-bis(hydroxymethyl)-4-methylphenol, 4-tert-butyl-2,6-bis(hydroxymethyl)phenol, 5-ethyl-1,3-bis(hydroxymethyl) a perhydro-1,3,5-trioxol-2-one (commonly known as N-ethyl dimethylol trimethyl ketone) or a dimethyl ether thereof, dimethylol trimethylene urea or Dimethyl ether, 3,5-bis(hydroxymethyl)perhydro-1,3,5-indenyl-4-ketone (commonly known as dimethyloluron) or its dimethyl ether, tetramethylol ethylene An aldehyde dialkyl urea or its tetramethyl ether body. Further, these crosslinking agents may be used alone or in combination of two or more. The amount of the crosslinking agent used is preferably from 0.1 to 15% by mass, particularly preferably from 0.5 to 10% by mass, based on the total solid content of the photosensitive coloring composition. (6) Mercapto compound As a polymerization accelerator, a mercapto compound may be added in order to improve adhesion to a substrate. Examples of the mercapto compound include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, hexanedithiol, decanedithiol, and 1,4-dimethylthiobenzene. , butanediol dithiopropionate, butanediol dithioglycolate, ethylene glycol dithioglycolate, trimethylolpropane trithioglycolate, butanediol dithiopropyl Acid ester, trimethylolpropane trithiopropionate, trimethylolpropane trithioglycolate, pentaerythritol tetrathiopropionate, pentaerythritol tetrathioglycolate, trihydroxyethyl trithio Propionate, ethylene glycol bis(3-mercaptobutyrate), butanediol bis(3-mercaptobutyrate), 1,4-bis(3-mercaptobutoxy)butane, trishydroxyl Propane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), ethylene glycol bis(3-mercaptoisobutyrate), dibutyl Alcohol bis(3-mercaptoisobutyrate), trimethylolpropane tris(3-mercaptoisobutyrate), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3, a heterocyclic sulfhydryl compound or an aliphatic polyfunctional thiol group such as 5-tris--2,4,6(1H,3H,5H)-trione Wait. These may be used alone or in combination of two or more. <Component Formulation Amount in Photosensitive Coloring Composition> In the photosensitive coloring composition of the present invention, the content ratio of (a) the colorant is usually 10% based on the total solid content of the photosensitive coloring composition. More preferably, it is 20% by mass or more, more preferably 30% by mass or more, further preferably 35% by mass or more, more preferably 40% by mass or more, and still more preferably 60% by mass or less, and more preferably It is 50% by mass or less, more preferably 48% by mass or less, and particularly preferably 46% by mass or less. When the content ratio of the coloring agent (a) is at least the above lower limit value, a sufficient optical density (OD) tends to be obtained, and it is easy to obtain the optical density (OD). The tendency to fully plate the features. Moreover, when (a) the coloring agent contains an organic pigment, the content ratio of the organic pigment to the (a) coloring agent is preferably 1% by mass or more, more preferably 5% by mass or more, and still more preferably 10% by mass. The above is more preferably 30% by mass or more, more preferably 50% by mass or more, most preferably 70% by mass or more, and usually 100% by mass or less, preferably 99% by mass or less, and more preferably 95% by mass. In the following, it is preferably 90% by mass or less, more preferably 85% by mass or less, and still more preferably 80% by mass or less. When it is set to the above lower limit value, a sufficient optical density (OD) tends to be obtained, and when it is at most the above upper limit value, the plate making property tends to be secured. Moreover, when (a) the coloring agent contains an organic coloring pigment, the content ratio of the organic coloring pigment to the (a) coloring agent is preferably 1% by mass or more, more preferably 5% by mass or more, and still more preferably 10%. The mass% or more is more preferably 30% by mass or more, more preferably 50% by mass or more, most preferably 70% by mass or more, and usually 100% by mass or less, preferably 99% by mass or less, more preferably 95% by mass or more. The mass% or less is more preferably 90% by mass or less, further preferably 85% by mass or less, and particularly preferably 80% by mass or less. When it is set to the above lower limit value, a sufficient optical density (OD) tends to be obtained, and when it is at most the above upper limit value, the plate making property tends to be secured. Further, when (a) the colorant contains at least one pigment selected from the group consisting of a red pigment and an orange pigment, at least one pigment selected from the group consisting of a red pigment and an orange pigment is relative to (a) The content ratio of the coloring agent is preferably 1% by mass or more, more preferably 2% by mass or more, further preferably 3% by mass or more, more preferably 30% by mass or less, still more preferably 20% by mass or less, and further It is preferably 15% by mass or less, more preferably 10% by mass or less, still more preferably 7% by mass or less, and most preferably 5% by mass or less. When it is set to the above lower limit value, a sufficient optical density (OD) tends to be obtained, and when it is at most the above upper limit value, the plate making property tends to be secured. Further, when (a) the colorant contains at least one pigment selected from the group consisting of a blue pigment and a violet pigment, at least one pigment selected from the group consisting of a blue pigment and a violet pigment is relative to ( a) The content ratio of the coloring agent is preferably 20% by mass or more, more preferably 30% by mass or more, further preferably 40% by mass or more, further preferably 50% by mass or more, and particularly preferably 60% by mass or more, most preferably It is preferably 65 mass% or more, more preferably 90 mass% or less, still more preferably 80 mass% or less, still more preferably 70 mass% or less. When it is set to the above lower limit value, the light-shielding property tends to be ensured, and when it is equal to or less than the above upper limit value, the plate-making property tends to be secured. When (a) the coloring agent contains a black coloring material, the content ratio of the black coloring matter to the (a) coloring agent is preferably 5% by mass or more, more preferably 10% by mass or more, and still more preferably 15% by mass. The above is more preferably 20% by mass or more, further preferably 50% by mass or less, more preferably 40% by mass or less, still more preferably 35% by mass or less, and still more preferably 30% by mass or less. When it is set to the above lower limit value, a sufficient optical density (OD) tends to be obtained, and when it is at most the above upper limit value, the plate making property tends to be secured. Further, when (a) the colorant contains an organic black pigment, the content ratio of the black organic pigment to the (a) colorant is preferably 1% by mass or more, more preferably 5% by mass or more, and still more preferably 10%. The mass% or more is particularly preferably 20% by mass or more, more preferably 50% by mass or less, still more preferably 40% by mass or less, further preferably 30% by mass or less, and particularly preferably 20% by mass or less. When it is set to the above lower limit value, a sufficient optical density (OD) tends to be obtained, and when it is at most the above upper limit value, the plate making property tends to be secured. When (a) the coloring agent contains carbon black, the content ratio of the carbon black to the (a) coloring agent is preferably 5% by mass or more, more preferably 10% by mass or more, and still more preferably 15% by mass or more. In particular, it is preferably 20% by mass or more, more preferably 50% by mass or less, still more preferably 40% by mass or less, further preferably 35% by mass or less, and particularly preferably 30% by mass or less. When it is set to the above lower limit value, a sufficient optical density (OD) tends to be obtained, and when it is at most the above upper limit value, the plate making property tends to be secured. (b) The content of the alkali-soluble resin is usually 5% by mass or more, preferably 10% by mass or more, more preferably 20% by mass or more, and further preferably 100% by mass or more, more preferably the total solid content of the photosensitive coloring composition of the present invention. It is 25% by mass or more, and usually 85% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, further preferably 60% by mass or less, and still more preferably 50% by mass or less. It is 40% by mass or less. When the content ratio of the (b) alkali-soluble resin is at least the above lower limit value, the solubility of the unexposed portion with respect to the developer can be suppressed from being lowered, and the development failure tends to be suppressed. In addition, when the upper limit is equal to or lower than the upper limit, the permeability of the developer to the exposed portion can be suppressed from increasing, and the sharpness of the pixel or the adhesion can be suppressed from being lowered. The content ratio of the (bI) epoxy (meth) acrylate resin is usually 3% by mass or more, preferably 6% by mass or more, and more preferably 8% based on the total solid content of the photosensitive coloring composition of the present invention. The mass% or more is usually 40% by mass or less, preferably 30% by mass or less, more preferably 20% by mass or less, still more preferably 15% by mass or less. When the value is equal to or higher than the lower limit value, the reliability is ensured, and the surface smoothness is ensured by setting it as the upper limit or less. (b) The content ratio of the (bI) epoxy (meth) acrylate resin contained in the alkali-soluble resin is usually 10% by mass or more, preferably 20% by mass or more, more preferably 25% by mass or more, and further It is preferably 30% by mass or more, more preferably 40% by mass or more, and usually 90% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, still more preferably 60% by mass or less, and further more preferably It is preferably 50% by mass or less, and particularly preferably 40% by mass or less. When the value is equal to or higher than the lower limit value, the reliability is ensured, and the surface smoothness is ensured by setting it as the upper limit or less. The content ratio of the (b-II) (meth)acrylic copolymer resin is usually 1% by mass or more, preferably 3% by mass or more, more preferably the total solid content of the photosensitive coloring composition of the present invention. It is 6% by mass or more, more preferably 8% by mass or more, and usually 40% by mass or less, preferably 30% by mass or less, more preferably 20% by mass or less, still more preferably 15% by mass or less. When it is set to the above lower limit value, the surface smoothness tends to be ensured, and the reliability is preferably ensured by setting it as the upper limit or less. (b) The content ratio of the (b-II) (meth)acrylic copolymer resin contained in the alkali-soluble resin is usually 10% by mass or more, preferably 20% by mass or more, and more preferably 25% by mass or more. Furthermore, it is preferably 30% by mass or more, more preferably 40% by mass or more, and usually 80% by mass or less, preferably 70% by mass or less, more preferably 60% by mass or less, and still more preferably 50% by mass or less. More preferably, it is 40% by mass or less. When it is set to the above lower limit value, the surface smoothness tends to be ensured, and the reliability is preferably ensured by setting it as the upper limit or less. (c) The content ratio of the photopolymerization initiator is usually 0.1% by mass or more, preferably 0.5% by mass or more, and more preferably 1% by mass or more based on the total solid content of the photosensitive coloring composition of the present invention. Furthermore, it is preferably 2% by mass or more, more preferably 3% by mass or more, still more preferably 4% by mass or more, and usually 15% by mass or less, preferably 10% by mass or less, and more preferably 8% by mass or less. Further, it is preferably 7% by mass or less. When the content ratio of the photopolymerization initiator (c) is at least the above lower limit value, the sensitivity may be suppressed from decreasing, and by setting it as the upper limit or less, it is possible to suppress the unexposed portion from being opposed to the developer. The solubility is lowered, and the tendency of development failure is suppressed. When the (c) photopolymerization initiator is used together with the polymerization accelerator, the content ratio of the polymerization accelerator is preferably 0.05% by mass or more based on the total solid content of the photosensitive coloring composition of the present invention. In general, it is usually 10% by mass or less, preferably 5% by mass or less, and the polymerization accelerator is preferably 0.1 to 50 parts by mass, particularly 0.1 to 20 parts by mass per 100 parts by mass of the (c) photopolymerization initiator. The proportion of the mass is used. When the content ratio of the polymerization accelerator is equal to or higher than the above-described lower limit value, the sensitivity to the exposure light is suppressed from decreasing, and by setting the upper limit or lower, it is possible to suppress the unexposed portion from being opposed to the developer. The solubility is lowered to suppress the tendency of development failure. In addition, the blending ratio of the sensitizing dye in the photosensitive coloring composition of the present invention is usually 20% by mass or less, preferably 20% by mass or less, based on the total sensitivity of the solid content component in the photosensitive coloring composition. It is 15% by mass or less, and more preferably 10% by mass or less. (d) The content of the ethylenically unsaturated compound is usually 30% by mass or less, preferably 20% by mass or less, and more preferably 15% by mass or less based on the total solid content of the photosensitive coloring composition of the present invention. When the content ratio of the (d) ethylenically unsaturated compound is at most the above upper limit value, the permeability of the developer to the exposed portion is suppressed from increasing, and a favorable image tends to be easily obtained. In addition, the lower limit of the content ratio of the (d) ethylenically unsaturated compound is usually 1% by mass or more, preferably 5% by mass or more. In addition, the photosensitive coloring composition of the present invention has a solid content concentration of usually 5 mass% or more, preferably 10 mass% or more, more preferably 15 mass% or more, by using (e) a solvent. Further, it is preferably 20% by mass or more, and usually 50% by mass or less, preferably 30% by mass or less. (f) The content ratio of the dispersing agent is usually 1% by mass or more, preferably 3% by mass or more, more preferably 5% by mass or more, and usually 30% by mass or less, based on the solid content of the photosensitive coloring composition. It is preferably 20% by mass or less, more preferably 15% by mass or less, and still more preferably 10% by mass or less. In addition, the content ratio of the (f) dispersant to 100 parts by mass of the (a) coloring agent is usually 5 parts by mass or more, more preferably 10 parts by mass or more, still more preferably 15 parts by mass or more, and usually 50 parts by mass. In the following, it is particularly preferably 30 parts by mass or less. When the content ratio of the (f) dispersant is at least the above lower limit value, it is easy to obtain sufficient dispersibility, and by setting it as the upper limit or less, it is possible to suppress a relative decrease in the ratio of other components. A tendency to cause a decrease in sensitivity, plate making, and the like. When the adhesion improving agent is used, the content thereof is usually 0.1 to 5% by mass, preferably 0.2 to 3% by mass, and more preferably 0.4 to 2%, based on the total solid content of the photosensitive coloring composition. quality%. When the content ratio of the adhesion improving agent is not less than the above-described lower limit value, the effect of improving the adhesion is obtained, and the effect of lowering the sensitivity is suppressed, and the residue after development is suppressed. The tendency to become a defect. Further, when a surfactant is used, the content thereof is usually 0.001 to 10% by mass, preferably 0.005 to 1% by mass, and more preferably 0.01, based on the total solid content of the photosensitive coloring composition. ～0.5 mass%, preferably 0.03 to 0.3 mass%. When the content of the surfactant is at least the above lower limit, the smoothness and uniformity of the coating film tend to be easily exhibited, and when the content is equal to or less than the above upper limit, the coating film can be easily expressed. Smoothness and uniformity can also suppress the tendency of other characteristics to deteriorate. <Physical Properties of Photosensitive Coloring Composition> The photosensitive coloring composition of the present invention can be suitably used for forming a colored spacer, and is preferably black in view of use as a colored spacer. Moreover, the optical density (OD) per 1 μm of the coating film obtained by curing the photosensitive coloring composition is preferably 1.0 or more, more preferably 1.2 or more, still more preferably 1.5 or more, and particularly preferably 1.8 or more. It is usually 4.0 or less, preferably 3.0 or less, more preferably 2.5 or less. <Method for Producing Photosensitive Coloring Composition> The photosensitive coloring composition of the present invention (hereinafter sometimes referred to as "resist") can be produced according to a conventional method. It is generally preferred to preliminarily disperse the (a) colorant using a paint conditioner, a sand mill, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer or the like. Since the (a) coloring agent is atomized by the dispersion treatment, the coating property of the resist is improved. The dispersion treatment is usually preferably carried out by using a system in which part or all of (a) a coloring agent, (e) a solvent, and (f) a dispersing agent, and (b) an alkali-soluble resin are used in combination (hereinafter, it is sometimes used for dispersion treatment). The mixture and the composition obtained by this treatment are referred to as "ink" or "pigment dispersion"). In particular, when a polymer dispersant is used as the (f) dispersant, it is preferable to suppress the viscosity of the obtained ink and the resist over time (excellent dispersion stability). As described above, in the step of producing a resist, it is preferred to produce a pigment dispersion liquid containing at least (a) a colorant, (e) a solvent, and (f) a dispersant. As the pigment dispersion liquid, (a) a colorant, (e) an organic solvent, and (f) a dispersant can be preferably used as a photosensitive coloring composition. Further, in the case where the liquid containing all the components blended in the photosensitive coloring composition is subjected to dispersion treatment, since heat generation occurs during the dispersion treatment, there is a possibility that the highly reactive component is modified. Therefore, it is preferred to carry out dispersion treatment by a system containing a polymer dispersant. When the (a) coloring agent is dispersed by a sand mill, glass beads or zirconia beads having a particle diameter of about 0.1 to 8 mm can be preferably used. The dispersion treatment conditions are as follows: the temperature is usually from 0 ° C to 100 ° C, preferably from room temperature to 80 ° C. The dispersion time varies depending on the composition of the liquid, the size of the dispersion processing apparatus, and the like, and is appropriately adjusted. The dispersion standard is to control the gloss of the ink so that the 20-degree specular gloss (JIS Z8741) of the resist is in the range of 50 to 300. When the gloss of the resist is low, the dispersion treatment is insufficient in many cases, and the pigment (color) particles remaining in the rough may have insufficient developability, adhesion, and resolution. Sex. Further, when the dispersion treatment is carried out until the gloss value exceeds the above range, a large amount of ultrafine particles are generated due to the breakage of the pigment, and thus the dispersion stability tends to be impaired. Further, the dispersed particle diameter of the pigment dispersed in the ink is usually 0.03 to 0.3 μm, and can be measured by a dynamic light scattering method or the like. Then, the ink obtained by the above dispersion treatment and the above-mentioned other components contained in the resist are mixed to prepare a uniform solution. In the step of producing the resist, since fine dirt is mixed into the liquid in many cases, it is preferable to subject the obtained resist to filtration treatment by a filter or the like. [Cured Product] A cured product can be obtained by curing the photosensitive coloring composition of the present invention. The cured product obtained by hardening the photosensitive coloring composition can be suitably used as a colored spacer. [Coloring spacer] Next, a method of manufacturing the coloring spacer using the photosensitive coloring composition of the present invention will be described. (1) Supporting body As the support for forming the colored spacer, the material is not particularly limited as long as it has moderate strength. A transparent substrate is mainly used, and examples of the material include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, polycarbonate, polymethyl methacrylate, and polyfluorene. A sheet made of a thermoplastic resin, a thermosetting resin sheet such as an epoxy resin, an unsaturated polyester resin or a poly(meth)acrylic resin, or various glasses. Among them, from the viewpoint of heat resistance, glass or a heat resistant resin is preferred. Further, a transparent electrode such as ITO or IZO (Indium Zinc Oxide) is formed on the surface of the substrate. In addition to the transparent substrate, it may be formed on the TFT array. In order to improve the surface physical properties such as adhesion, the support may be subjected to a film forming treatment of various resins such as a corona discharge treatment, an ozone treatment, a decane coupling agent, or a urethane-based resin. The thickness of the transparent substrate is usually in the range of 0.05 to 10 mm, preferably in the range of 0.1 to 7 mm. Further, in the case of performing film formation treatment of various resins, the film thickness is usually in the range of 0.01 to 10 μm, preferably in the range of 0.05 to 5 μm. (2) Colored spacer The photosensitive coloring composition of the present invention is used for the same application as the photosensitive coloring composition for a known color filter, and hereinafter, according to the black light interval of the photosensitive coloring composition of the present invention. A specific example of the method of forming the member will be described as a case where the coloring spacer (black light spacer) is used. Usually, the photosensitive coloring composition is supplied to the substrate on which the black light spacer is to be provided in a film form or a pattern by a method such as coating, and the solvent is dried. Next, pattern formation is performed by a method such as exposure-developing photolithography. Thereafter, additional exposure or thermal hardening treatment is performed as needed to form a black light spacer on the substrate. (3) Formation of Colored Substrate [1] Method of Supplying Substrate The photosensitive coloring composition of the present invention is usually supplied onto a substrate in a state of being dissolved or dispersed in a solvent. The supply method can be carried out by a conventionally known method such as a spin coating method, a bar coating method, a flow coating method, a die coating method, a roll coating method, a spray coating method, or the like. Further, it may be supplied in a pattern by an inkjet method, a printing method, or the like. In addition, by the die-coating method, the amount of the coating liquid to be used can be drastically reduced, and it is not affected by the mist adhered by the spin coating method, and the like, and it is preferable to suppress the generation of impurities. . The coating amount varies depending on the application. For example, in the case of a black light spacer, the dry film thickness is usually in the range of 0.5 μm to 10 μm, preferably in the range of 1 μm to 9 μm, and particularly preferably 1 μm. A range of 7 μm. Also, it is important that the dry film thickness or the height of the finally formed spacer is uniform over the entire substrate. In the case of a large deviation, uneven defects may occur on the liquid crystal panel. However, when the photosensitive coloring composition of the present invention is formed into a black light spacer having a different height by a photolithography method, the height of the finally formed black light spacer is different. Further, a known substrate such as a glass substrate can be used as the substrate. Further, the surface of the substrate is preferably a flat surface. [2] Drying method Drying after the photosensitive coloring composition solution is supplied onto the substrate is preferably a drying method using a hot plate, an IR (infrared) oven, or a convection oven. Further, a vacuum drying method in which drying is performed in a decompression chamber without increasing the temperature may be combined. The drying conditions can be appropriately selected depending on the kind of the solvent component, the performance of the dryer to be used, and the like. The drying time is usually selected from the range of 15 to 5 minutes at a temperature of 40 to 130 ° C, preferably at a temperature of 50 to 110 ° C, depending on the type of the solvent component and the performance of the dryer to be used. Choose from 30 seconds to 3 minutes. [3] Exposure method Exposure is performed by superposing a negative mask pattern on a coating film of a photosensitive coloring composition, and irradiating a light source of ultraviolet rays or visible light through the mask pattern. When the exposure is performed using an exposure mask, the exposure mask may be brought close to the coating film of the photosensitive coloring composition, or the exposure mask may be disposed at a position away from the coating film of the photosensitive coloring composition. And a method of projecting the exposed light through the exposure mask. Further, it is also possible to use a scanning exposure method by laser light without using a mask pattern. In this case, in order to prevent the sensitivity of the photopolymerizable layer from being lowered by oxygen, it may be carried out in a deoxidizing atmosphere, or an oxygen barrier layer such as a polyvinyl alcohol layer may be formed on the photopolymerizable layer, and then exposed. As a preferred aspect of the present invention, when a black light spacer having a different height is simultaneously formed by photolithography, for example, a light blocking portion (light transmittance of 0%) and a plurality of openings are used as opposed to each other. An exposure mask having an opening portion (intermediately transmissive opening portion) having an average light transmittance of the opening having the highest average light transmittance (completely passing through the opening portion). According to this method, the difference in the residual film ratio is caused by the difference between the average light transmittance of the intermediate transmission opening portion and the total transmission opening portion, that is, the difference in exposure amount. For example, a method of forming an intermediate transmission opening by a matrix-shaped light-shielding pattern having a light-shielding unit having a small polygonal shape is known. Further, a method of producing a light transmittance by controlling a film of a material such as a chromium-based, molybdenum-based, tungsten-based or lanthanide-based material as an absorber is known. The light source used for the above exposure is not particularly limited. Examples of the light source include a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a fluorescent lamp, and the like, or an argon ion. Laser, YAG (Yttrium Aluminum Garnet) laser, excimer laser, nitrogen laser, helium-cadmium laser, blue-violet semiconductor laser, near-infrared semiconductor laser, etc. . An optical filter can also be used when it is used to illuminate light of a specific wavelength. As the optical filter, for example, a type in which the light transmittance in the exposure wavelength can be controlled by the film can be used. As a material in this case, for example, a Cr compound (Cr oxide, nitride, nitrogen oxide, or the like) Fluoride, etc.), MoSi, Si, W, Al, and the like. As the exposure amount, usually 1 mJ/cm2 Above, preferably 5 mJ/cm2 Above, more preferably 10 mJ/cm2 Above, and usually 300 mJ/cm2 Hereinafter, it is preferably 200 mJ/cm2 Below, more preferably 150 mJ/cm2 the following. Further, in the case of the proximity exposure mode, the distance between the exposure target and the mask pattern is usually 10 μm or more, preferably 50 μm or more, more preferably 75 μm or more, and usually 500 μm or less, preferably 400 μm. Hereinafter, it is more preferably 300 μm or less. [4] Developing method After the above exposure, an image pattern can be formed on a substrate by using an aqueous solution of a basic compound or an organic solvent. The aqueous solution may further contain a surfactant, an organic solvent, a buffer, a binder, a dye or a pigment. Examples of the basic compound include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium citrate, potassium citrate, sodium metasilicate, and sodium phosphate. An inorganic basic compound such as potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate or ammonium hydroxide; or mono-, di- or triethanolamine, mono-, di- or trimethylamine, mono-, di- or tri- Ethylamine, mono or diisopropylamine, n-butylamine, mono-, di- or triisopropanolamine, ethyl imine, ethyldiimide, tetramethylammonium hydroxide (TMAH), choline, etc. Basic compound. These basic compounds may be a mixture of two or more kinds. Examples of the above surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl groups. Nonionic surfactants such as esters; anionics such as alkylbenzenesulfonates, alkylnaphthalenesulfonates, alkyl sulfates, alkylsulfonates, sulfosuccinates, etc. Surfactant; amphoteric surfactants such as alkyl betaines and amino acids. Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl sirolius, butyl siroli, phenyl racessu, propylene glycol, and diacetone alcohol. The organic solvent may be used singly or in combination with an aqueous solution. The conditions of the development treatment are not particularly limited, and usually the development temperature is in the range of 10 to 50 ° C, preferably 15 to 45 ° C, particularly preferably 20 to 40 ° C, by immersion development, spray development, Any development method such as a brush development method or an ultrasonic development method is performed. [5] Additional exposure and thermal hardening treatment The substrate after development may be additionally exposed by a method similar to the above-described exposure method, or may be subjected to a heat hardening treatment. The temperature hardening treatment conditions at this time may be selected from the range of 100 ° C to 280 ° C, preferably 150 ° C to 250 ° C, and the time は may be selected within the range of 5 minutes to 60 minutes. The size or shape of the coloring spacer of the present invention is appropriately adjusted according to the specifications of the color filter to which the color filter is applied, and the photosensitive coloring composition of the present invention, in particular, simultaneously forms a spacer and an auxiliary by photolithography. A black light spacer having a different spacer height is useful. In this case, the height of the spacer is usually about 2 to 7 μm, and the auxiliary spacer usually has a height lower than the spacer by about 0.2 to 1.5 μm. Further, the optical density (OD) per 1 μm of the colored spacer of the present invention is preferably 1.2 or more, more preferably 1.5 or more, still more preferably 1.8 or more, and usually 4.0 or less from the viewpoint of light blocking property. Preferably, it is 3.0 or less. Here, the optical density (OD) is a value measured by the method described below. [Color Filter] The color filter of the present invention includes the coloring spacer of the present invention as described above, for example, a black matrix and red, green, and blue pixel colored layers are laminated on a glass substrate as a transparent substrate. The top coat is produced by forming an alignment film after forming the colored spacer. The color filter having the colored spacer of the present invention and the liquid crystal driving side substrate are bonded together to form a liquid crystal cell, and liquid crystal is injected into the formed liquid crystal cell, thereby manufacturing a liquid crystal having the colored spacer of the present invention. An image display device such as a display device. [Examples] Hereinafter, the present invention will be specifically described by way of examples and comparative examples, but the present invention is not limited to the following examples as long as the gist of the invention is not exceeded. The constituent components of the photosensitive coloring composition used in the following examples and comparative examples are as follows. <Organic Black Pigment> Manufactured by BASF Corporation, Irgaphor (registered trademark) Black S 0100 CF (having a chemical structure represented by the following formula (2)) [Chem. 58]<Alkali-Soluble Resin-A> One 145 parts by mass of propylene glycol monomethyl ether acetate was stirred while being purged with nitrogen, and the temperature was raised to 120 °C. 10 parts by mass of styrene, 85.2 parts by mass of glycidyl methacrylate, and 66 parts by mass of monoacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton, and dropwise addition over 3 hours were added thereto. 2.47 parts by mass of 2,2'-azobis-2-methylbutyronitrile, and further stirring was continued at 90 ° C for 2 hours. Next, the inside of the reaction vessel was replaced with air, and 0.7 parts by mass of tris(dimethylaminomethyl)phenol and 0.12 parts by mass of hydroquinone were placed in 43.2 parts by mass of acrylic acid, and the reaction was continued at 100 ° C for 12 hours. Thereafter, 56.2 parts by mass of tetrahydrophthalic anhydride (THPA) and 0.7 parts by mass of triethylamine were added, and the mixture was reacted at 100 ° C for 3.5 hours. The alkali-soluble resin-A thus obtained had a weight average molecular weight Mw of about 8400 and an acid value of 80 mgKOH/g as measured by GPC. <Alkali-Soluble Resin-B> A mixture of 217.6 parts by mass of propylene glycol monomethyl ether acetate and 53.9 parts by mass of propylene glycol monomethyl ether was stirred while being purged with nitrogen, and the temperature was raised to 120 °C. 3.52 parts by mass of benzyl methacrylate, 58.5 parts by mass of methacrylic acid, and a monoacrylate FA-513M (manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton, 66.1 parts by mass and 2,2' were added dropwise thereto over 3 hours. A mixture of 3.8 parts by mass of azobis-2-methylbutyronitrile was further stirred at 90 ° C for 2 hours. Next, the inside of the reaction vessel was replaced with air, and 27.3 parts by mass of glycidyl methacrylate, 0.6 parts by mass of tris(dimethylaminomethyl)phenol, and 0.1 part by mass of hydroquinone were added, and the reaction was continued at 100 ° C. hour. The alkali-soluble resin-B thus obtained had a weight average molecular weight Mw of 16,500 and an acid value of 176 mgKOH/g. <Alkali-soluble resin-C> A mixture of 303.5 parts by mass of propylene glycol monomethyl ether acetate and 75.9 parts by mass of propylene glycol monomethyl ether was stirred while being purged with nitrogen, and the temperature was raised to 120 °C. 10.4 parts by mass of styrene, 34.4 parts by mass of methacrylic acid, and a monoacrylate FA-513M (manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton, 66.1 parts by mass and 2,2'-azo were added dropwise thereto over 3 hours. A mixture of 8.7 parts by mass of bis-2-methylbutyronitrile was further stirred at 90 ° C for 2 hours. Next, the inside of the reaction vessel was replaced with air, and 9.9 parts by mass of glycidyl methacrylate, 0.2 parts by mass of tris(dimethylaminomethyl)phenol, and 0.04 parts by mass of hydroquinone were added, and the reaction was continued at 100 ° C. hour. The alkali-soluble resin-C thus obtained had a weight average molecular weight Mw of 7,200 and an acid value of 86 mgKOH/g. <Alkali-soluble resin-D> "ZCR-1642H" manufactured by Nippon Kayaku Co., Ltd. (Mw=6500, acid value = 98 mgKOH/g) <alkali-soluble resin-E> [Chem. 59]50 g of the epoxy compound (epoxy equivalent 264) of the above structure, 13.65 g of acrylic acid, 60.5 g of butyl methoxyacetate, 0.936 g of triphenylphosphine, and 0.032 g of p-methoxyphenol were charged to the thermometer. The flask of the stirrer and the cooling tube was reacted at 90 ° C while stirring to an acid value of 5 mgKOH/g or less. The reaction took 12 hours to obtain an epoxy acrylate solution. 25 parts by mass of the above epoxy acrylate solution, 0.76 parts by mass of trimethylolpropane (TMP), 3.3 parts by mass of biphenyltetracarboxylic dianhydride (BPDA), and 3.5 parts by mass of tetrahydrophthalic anhydride (THPA). The mixture was placed in a flask equipped with a thermometer, a stirrer, and a cooling tube, and the mixture was stirred while gradually raising the temperature to 105 ° C to carry out a reaction. When the resin solution became transparent, it was diluted with butyl methoxyacetate to prepare a solid content of 50% by mass, and an acid value of 113 mgKOH/g was obtained, which was converted to polystyrene by GPC. A carboxyl group-containing epoxy methacrylate resin (alkali-soluble resin-E) having a weight average molecular weight (Mw) of 2,600 and a double bond equivalent of 520 g/mol. <Alkali-soluble resin-F> A mixture of 214.5 parts by mass of propylene glycol monomethyl ether acetate and 53.6 parts by mass of propylene glycol monomethyl ether was stirred while being nitrogen-substituted, and the temperature was raised to 120 °C. 68.7 parts by mass of benzyl methacrylate, 43.9 parts by mass of methacrylic acid, and a monoacrylate FA-513M (manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton, 22.0 parts by mass and 2,2' were added dropwise thereto over 3 hours. A mixture of 1.4 parts by mass of azobis-2-methylbutyronitrile was further stirred at 90 ° C for 2 hours. Next, the inside of the reaction vessel was replaced with air, and 21.3 parts by mass of glycidyl methacrylate, 0.5 parts by mass of tris(dimethylaminomethyl)phenol, and 0.1 part by mass of hydroquinone were added, and the reaction was continued at 100 ° C. hour. The alkali-soluble resin-F thus obtained had a weight average molecular weight Mw of 44,100 and an acid value of 130 mgKOH/g. <Alkali-soluble resin-G> A mixture of 210.1 parts by mass of propylene glycol monomethyl ether acetate and 52.5 parts by mass of propylene glycol monomethyl ether was stirred while being purged with nitrogen, and the temperature was raised to 120 °C. 3.52 parts by mass of benzyl methacrylate, 68.8 parts by mass of methacrylic acid, and a monoacrylate FA-513M (manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton, 39.7 parts by mass and 2,2' were added dropwise thereto over 3 hours. A mixture of 3.3 parts by mass of azobis-2-methylbutyronitrile was further stirred at 90 ° C for 2 hours. Next, the inside of the reaction vessel was replaced with air, and 38.4 parts by mass of glycidyl methacrylate, 0.8 parts by mass of tris(dimethylaminomethyl)phenol, and 0.1 part by mass of hydroquinone were added, and the reaction was continued at 100 ° C. hour. The alkali-soluble resin-G thus obtained had a weight average molecular weight Mw of 19,100 and an acid value of 198 mgKOH/g. <Dispersant-I> "DISPERBYK-LPN21116" manufactured by BYK-Chemie Co., Ltd. (including A block having a quaternary ammonium salt group and a tertiary amino group in a side chain and having no quaternary ammonium salt group and tertiary amine group) An acrylic AB block copolymer of B block. The amine value is 70 mgKOH/g, and the acid value is 1 mgKOH/g or less. The following formulas (1a) and (2a) are contained in the A block of the dispersant-I. The repeating unit contains a repeating unit of the following formula (3a) in the B block. The content ratio of the repeating unit of the following formulas (1a), (2a), and (3a) to the total repeating unit of the dispersing agent-I was 11.1 mol%, 22.2 mol%, and 6.7 mol%, respectively. [60]<Dispersant-II> "DISPERBYK-167" (urethane-based polymer dispersant) manufactured by BYK-Chemie Co., Ltd. <Pigment Derivative> "Solsperse 12000" manufactured by Lubrizol Co., Ltd. <Solvent-I> PGMEA: Propylene glycol Methyl ether acetate <solvent-II> MB: 3-methoxybutanol <photopolymerization initiator> Compound of the following structure [Chem. 61]<Photopolymerizable monomer> DPHA: Dipentaerythritol hexaacrylate manufactured by Nippon Kayaku Co., Ltd. <Additive> Manufactured by Nippon Kayaku Co., Ltd., KAYAMER PM-21 (phosphate containing methacryl oxime) <Interactivator> DIC MEGAFAC F-559 manufactured by the company <Measurement of optical density per unit film thickness (unit OD value)> The optical density per unit film thickness was measured by the following procedure. First, the prepared photosensitive coloring composition was applied onto a glass substrate by a spin coater at a final film thickness of 2 μm, dried under reduced pressure for 1 minute, and dried at a hot plate temperature of 80 ° C for 70 seconds. . After the exposure and development steps, the film was heated at an oven temperature of 230 ° C for 20 minutes, thereby obtaining a resist-coated substrate. The film thickness was measured by a non-contact surface/layer profile shape measuring system VertScan(R) 2.0 manufactured by Ryoka Systems, Inc., by measuring the optical density (OD) of the obtained substrate by a densitometer Gretag Macbeth D200-II, according to the optical density. (OD) and film thickness The optical density per unit film thickness was calculated. Further, the OD value indicates the value of the light blocking ability, and the larger the value indicates the higher the light blocking property. <NMP Dissolution Test> The N-methylpyrrolidone (NMP) dissolution test was carried out in the following order. First, the prepared photosensitive coloring composition was applied onto a glass substrate by a spin coater at a final film thickness of 2 μm, dried under reduced pressure for 1 minute, and dried at a hot plate temperature of 80 ° C for 70 seconds. . After the exposure and development steps, the film was heated at an oven temperature of 230 ° C for 20 minutes to obtain a resist-coated substrate. Two measurement substrates (2.5 cm × 1.0 cm square) were cut out from the prepared resist-coated substrate, and immersed in a 10 mL vial containing 8 mL of N-methylpyrrolidone (NMP). Then, the NMP elution test was carried out in a state in which the vial containing the measurement substrate was allowed to stand in a hot bath at 80 ° C for 40 minutes. After standing for 40 minutes, the vial was taken out from the heat bath, and the NMP elution solution was measured at a distance of 1 nm in a wavelength range of 300 to 800 nm by a spectrophotometer ("UV-3100PC" manufactured by Shimadzu Corporation). Absorbance. The light source uses a halogen lamp and a xenon lamp (switching wavelength 360 nm), and the detector uses a photomultiplier with a slit width of 2 nm as a measurement condition. Further, the sample solution (NMP elution solution) was placed in a 1 cm square quartz dish for measurement. The so-called absorbance-based spectroscopic method is a dimensionless amount indicating how much light intensity is attenuated when passing light through an object, and is defined by the following equation. A (absorbance) = -log10 (I/I0 (I: transmitted light intensity, I0 : Incident light intensity) When light is incident on the sample solution and the NMP separate liquid from the same light source, the light intensity transmitted through the NMP alone liquid can be regarded as I.0 The light intensity through the sample solution is regarded as I. Therefore, the above formula (I/I0 ) indicates the light transmittance, and the absorbance A is a value obtained by reciprocal expression of the logarithm. The absorbance A is an expression used when calculating the concentration or the like of the substance contained in the sample solution. In the case where the absorbance A=0, it indicates a state in which light is not absorbed at all (transmittance: 100%), and when the absorbance A=∞, it indicates a state in which light is completely opaque (transmittance: 0%). That is, the stronger the absorbance, the more the resist coating film component is eluted into the NMP, and the NMP resistance is inferior. The spectral area (nm) of the measured absorbance was calculated, and the area value was less than 20 (nm) and evaluated as ○, and the value was evaluated as × (nm) or more as ×, and NMP resistance was evaluated. The spectral area of the absorbance as the basis of this evaluation can be expressed as the sum of the absorbances at the respective wavelengths, and means the sum of the resist components dissolved. NMP resistance evaluation criteria: determination by spectral area value of absorbance (wavelength: 300 to 800 nm) ○: less than 20 (nm) ×: 20 (nm) or more <evaluation of surface smoothness> Surface smoothness and the following The evaluation of the surface roughness was carried out by the following procedure. First, the prepared photosensitive coloring composition was applied onto a glass substrate by a spin coater at a final film thickness of 3 μm, dried under reduced pressure for 1 minute, and dried at a hot plate temperature of 80 ° C for 70 seconds. . After the exposure and development steps, the film was heated at an oven temperature of 230 ° C for 20 minutes to obtain a resist-coated substrate. With respect to the prepared resist-coated substrate, the surface of the heated surface was observed to have wrinkles by heating under a field of view of 70 μm × 70 μm. Furthermore, the evaluation criteria are as follows. ○: No micron-sized wrinkles were observed on the surface of the pattern ×: Micron-sized wrinkles were apparent on the surface of the pattern <Evaluation of surface roughness> Resist prepared in the above <Evaluation of Surface Smoothness> The substrate was coated with a three-dimensional non-contact surface shape measuring system Micromap manufactured by Ryoka Systems, Inc., using a 50-fold optical lens, and the surface roughness Sa (arithmetic mean roughness) was measured in a Focus mode at a field of 70 μm × 70 μm. Mm). <Preparation of Pigment Dispersions 1, 3, and 4> The pigments, dispersants, dispersing aids, alkali-soluble resins, and solvents described in Table 1 were mixed so as to have the mass ratios shown in Table 1. The mixture was subjected to dispersion treatment for 3 hours by a paint shaker in the range of 25 to 45 °C. Use 0.5 mmThe zirconia beads were used as beads, and the mass of the dispersion was added 2.5 times. After the end of the dispersion, the beads were separated from the dispersion by a filter to prepare pigment dispersions 1, 3 and 4. [Table 1] <Pigment Dispersion Liquid 2 (Coated Carbon Black Dispersion)> Carbon black is produced by a normal oil furnace method. Among them, ethylene tar having a small Na, Ca, and S component is used as a raw material oil, and coke oven gas is used for combustion. Further, pure water treated with an ion exchange resin was used as the reaction stop water. Using a homogenizer, 540 g of the obtained carbon black and 14500 g of pure water were stirred at 5,000 to 6,000 rpm for 30 minutes to obtain a slurry. The slurry was transferred to a container equipped with a screw-type mixer, and 600 g of toluene dissolved in 60 g of epoxy resin "Epikote 828" (manufactured by Mitsubishi Chemical Corporation) was added thereto in an amount of about 1,000 rpm. The carbon black dispersed in the water was transferred to the toluene side in about 15 minutes to form a pellet of about 1 mm. Then, the water was dropped by a 60-mesh metal wire mesh, placed in a vacuum dryer, and dried at 70 ° C for 7 hours to completely remove toluene and water. The obtained coated carbon black, a dispersant, a pigment derivative, and a solvent were mixed so as to have the mass ratio shown in Table 1. Premixing was carried out by thoroughly stirring it with a mixer. Then, dispersion treatment was carried out for 6 hours in a range of 25 to 45 ° C by a paint shaker. Use 0.5 mmThe zirconia beads are used as beads, and the same mass as the dispersion is added. After the end of the dispersion, the beads were separated from the dispersion by a filter to prepare a pigment dispersion 2. [Examples 1 to 6 and Comparative Examples 1 to 3] Each component was added so that the solid content ratio became the blending ratio of Table 2, and PGMEA was added so that the solid content became 22% by mass, and the mixture was stirred and dissolved. Thereby, a photosensitive coloring composition is prepared. The solid content ratio of the prepared composition is shown in Table 2. Further, the evaluation results of the unit OD value, the NMP dissolution test, the surface smoothness, and the surface roughness measured by the method described above are shown in Table 2. Further, the parts by mass of the photosensitive coloring composition in Table 2 represent parts by mass of the solid content component. [Table 2] Comparison of Example 1 of Table 2 with Comparative Examples 1 and 2 revealed that the (bI) epoxy (meth) acrylate resin and (b-II) contained 12 mol% or more of ethylenically unsaturated bonds. The photosensitive coloring composition containing the (meth)acrylic copolymer resin derived from the repeating unit β of the unsaturated carboxylic acid in the repeating unit α can ensure high light-shielding property and is excellent in reliability and surface smoothness. On the other hand, the reliability of Comparative Example 1 in which the repeating unit α was less than 12 mol% was poor, and the surface smoothness of Comparative Example 2 containing no (b-II) (meth)acrylic copolymer resin was poor. In the case where the main resin component as in Comparative Example 2 is a (b-I) epoxy (meth) acrylate resin, it is considered that the heat flow caused by the structure causes the surface smoothness to become poor. Therefore, it is considered that by using a (meth)acrylic copolymer resin containing a repeating unit derived from an unsaturated carboxylic acid which is not easily thermally flowed in addition to the epoxy (meth) acrylate resin, heat flow is reduced to improve surface smoothness. Sex. However, since such a (meth)acrylic copolymer resin generally has a lower sensitivity than an epoxy (meth)acrylate resin, the curability is lowered, and the reliability is deteriorated as in Comparative Example 1. Therefore, it is considered that by increasing the content ratio of the repeating unit α having an ethylenically unsaturated bond in the (meth)acrylic copolymer resin, sufficient hardenability can be ensured, and reliability and surface smoothness can be achieved. Further, the comparison of Examples 1 to 3 reveals that, in the case where the colorant contains an organic pigment and carbon black, or contains at least one selected from the group consisting of a red pigment and an orange pigment, and is selected from the group consisting of a blue pigment and a purple pigment. In the case of at least one of the groups, regardless of the specific pigment type, high light-shielding properties can be ensured, and reliability and surface smoothness are excellent. On the other hand, in Comparative Example 3, the coloring agent was only a carbon black having a high ultraviolet absorbing property, and the surface smoothness was insufficient. On the other hand, the comparison of Examples 2 and 4 revealed that the reliability was excellent regardless of the type of the (b-I) epoxy (meth) acrylate resin. On the other hand, the comparison of Examples 1, 5, and 6 reveals that if the content ratio of the repeating unit α having an ethylenically unsaturated bond in the (b-II) resin is 12 mol% or more, regardless of the specific The value of the ratio is excellent, and both reliability and surface smoothness are excellent. The present invention has been described in detail with reference to the preferred embodiments thereof. In addition, the present application is based on Japanese Patent Application No. 2015-252149, filed on Dec. [Industrial Applicability] According to the photosensitive coloring composition of the present invention, it is possible to provide a cured product and a colored spacer having high light-shielding property, high reliability, and excellent surface smoothness, and further, such coloring can be provided. Image display device for spacers. Therefore, the present invention has an extremely high industrial applicability in various fields of a photosensitive coloring composition, a cured product, a colored spacer, and an image display device.

無no

Claims (9)

一種感光性著色組合物，其特徵在於：其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者，並且 上述(a)著色劑含有有機顏料及碳黑， 上述(b)鹼可溶性樹脂含有(b-I)環氧(甲基)丙烯酸酯樹脂、與(b-II)含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂，且 上述(b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元α之含有比例為12莫耳%以上。A photosensitive coloring composition comprising (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, And (f) a dispersant, wherein the (a) colorant contains an organic pigment and carbon black, and the (b) alkali-soluble resin contains (bI) an epoxy (meth) acrylate resin and (b-II) a (meth)acrylic copolymer resin having a repeating unit α of an ethylenically unsaturated bond and a repeating unit β derived from an unsaturated carboxylic acid, and the above (b-II) (meth)acrylic copolymer resin The content ratio of the above repeating unit α is 12 mol% or more. 如請求項1之感光性著色組合物，其中上述有機顏料含有選自由下述通式(1)所表示之化合物、該化合物之幾何異構物、該化合物之鹽及該化合物之幾何異構物之鹽所組成之群中之至少1種有機黑色顏料， [化1](式(1)中，R11 及R16 互相獨立為氫原子、CH3 、CF3 、氟原子或氯原子； R12 、R13 、R14 、R15 、R17 、R18 、R19 及R20 與其他全部互相獨立而為氫原子、鹵素原子、R21 、COOH、COOR21 、COO- 、CONH2 、CONHR21 、CONR21 R22 、CN、OH、OR21 、COCR21 、OCONH2 、OCONHR21 、OCONR21 R22 、NO2 、NH2 、NHR21 、NR21 R22 、NHCOR22 、NR21 COR22 、N=CH2 、N=CHR21 、N=CR21 R22 、SH、SR21 、SOR21 、SO2 R21 、SO3 R21 、SO3 H、SO3 - 、SO2 NH2 、SO2 NHR21 或SO2 NR21 R22 ； 且選自由R12 與R13 、R13 與R14 、R14 與R15 、R17 與R18 、R18 與R19 、及R19 與R20 所組成之群中之至少1種組合可互相直接鍵結，或者利用氧原子、硫原子、NH或NR21 橋而互相鍵結； R21 及R22 互相獨立為碳數1～12之烷基、碳數3～12之環烷基、碳數2～12之烯基、碳數3～12之環烯基或碳數2～12之炔基)。The photosensitive coloring composition of claim 1, wherein the organic pigment contains a compound selected from the group consisting of the following formula (1), a geometric isomer of the compound, a salt of the compound, and a geometric isomer of the compound At least one organic black pigment in the group consisting of salt, [Chemical 1] (In the formula (1), R 11 and R 16 are each independently a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom; R 12 , R 13 , R 14 , R 15 , R 17 , R 18 , R 19 And R 20 and all others are independent of each other and are a hydrogen atom, a halogen atom, R 21 , COOH, COOR 21 , COO − , CONH 2 , CONHR 21 , CONR 21 R 22 , CN, OH, OR 21 , COCR 21 , OCONH 2 , OCONHR 21, OCONR 21 R 22 , NO 2, NH 2, NHR 21, NR 21 R 22, NHCOR 22, NR 21 COR 22, N = CH 2, N = CHR 21, N = CR 21 R 22, SH, SR 21 , SOR 21 , SO 2 R 21 , SO 3 R 21 , SO 3 H, SO 3 - , SO 2 NH 2 , SO 2 NHR 21 or SO 2 NR 21 R 22 ; and selected from R 12 and R 13 , At least one combination of R 13 and R 14 , R 14 and R 15 , R 17 and R 18 , R 18 and R 19 , and R 19 and R 20 may be directly bonded to each other or an oxygen atom may be used. And a sulfur atom, NH or NR 21 bridge and are bonded to each other; R 21 and R 22 are each independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, and an alkenyl group having 2 to 12 carbon atoms. a cycloalkenyl group having 3 to 12 carbon atoms or an alkynyl group having 2 to 12 carbon atoms. 一種感光性著色組合物，其特徵在於：其係含有(a)著色劑、(b)鹼可溶性樹脂、(c)光聚合起始劑、(d)乙烯性不飽和化合物、(e)溶劑、及(f)分散劑者，並且 上述(a)著色劑含有選自由紅色顏料及橙色顏料所組成之群中之至少一種、與選自由藍色顏料及紫色顏料所組成之群中之至少一種， 上述(b)鹼可溶性樹脂含有(b-I)環氧(甲基)丙烯酸酯樹脂、與(b-II)含有側鏈具有乙烯性不飽和鍵之重複單元α及源自不飽和羧酸之重複單元β之(甲基)丙烯酸系共聚合樹脂，且 上述(b-II)(甲基)丙烯酸系共聚合樹脂中之上述重複單元α之含有比例為12莫耳%以上。A photosensitive coloring composition comprising (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a solvent, And (f) a dispersing agent, wherein the (a) coloring agent contains at least one selected from the group consisting of a red pigment and an orange pigment, and at least one selected from the group consisting of a blue pigment and a purple pigment. The (b) alkali-soluble resin contains (bI) an epoxy (meth) acrylate resin, and (b-II) a repeating unit α having an ethylenically unsaturated bond in a side chain, and a repeating unit derived from an unsaturated carboxylic acid. The β (meth)acrylic copolymer resin, and the content ratio of the above repeating unit α in the (b-II) (meth)acrylic copolymer resin is 12 mol% or more. 如請求項1至3中任一項之感光性著色組合物，其中上述重複單元α具有下述通式(I)所表示之化學結構， [化2](式(I)中，R1 及R2 分別獨立地表示氫原子或甲基；R3 表示二價連結基)。The photosensitive coloring composition according to any one of claims 1 to 3, wherein the above repeating unit α has a chemical structure represented by the following formula (I), [Chemical 2] (In the formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group; and R 3 represents a divalent linking group). 如請求項1至4中任一項之感光性著色組合物，其中上述(b-II)(甲基)丙烯酸系共聚合樹脂之含有比例相對於感光性著色組合物中之全部固形物成分為1質量%以上。The photosensitive coloring composition according to any one of claims 1 to 4, wherein a content ratio of the (b-II) (meth)acrylic copolymer resin is relative to all solid components in the photosensitive coloring composition. 1% by mass or more. 如請求項1至5中任一項之感光性著色組合物，其中經硬化之塗膜之每1 μm膜厚之光學密度為1.0以上。The photosensitive coloring composition according to any one of claims 1 to 5, wherein the hardened coating film has an optical density of 1.0 or more per 1 μm film thickness. 一種硬化物，其係將如請求項1至6中任一項之感光性著色組合物硬化而獲得。A cured product obtained by hardening the photosensitive coloring composition according to any one of claims 1 to 6. 一種著色間隔件，其由如請求項7之硬化物所形成。A colored spacer formed of a cured product as claimed in claim 7. 一種圖像顯示裝置，其具備如請求項8之著色間隔件。An image display device comprising a color spacer as claimed in claim 8.
TW105142935A 2015-12-24 2016-12-23 Photosensitive coloring composition, cured product, coloring spacer, image display device TWI711882B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015252149 2015-12-24
JP??2015-252149 2015-12-24

Publications (2)

Publication Number Publication Date
TW201732431A true TW201732431A (en) 2017-09-16
TWI711882B TWI711882B (en) 2020-12-01

Family

ID=59089487

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105142935A TWI711882B (en) 2015-12-24 2016-12-23 Photosensitive coloring composition, cured product, coloring spacer, image display device

Country Status (5)

Country Link
JP (2) JP6268508B2 (en)
KR (1) KR102540423B1 (en)
CN (1) CN108475012B (en)
TW (1) TWI711882B (en)
WO (1) WO2017110893A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI765958B (en) * 2018-01-19 2022-06-01 南韓商東友精細化工有限公司 Colored photosensitive resin composition, color filter including black matrix , column spacer or black column spacer manufactured using the colored photosensitive resin composition, and display device including the color filter

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170086399A (en) * 2016-01-18 2017-07-26 롬엔드하스전자재료코리아유한회사 Black photosensitive resin composition and black column spacer prepared therefrom
CN106194517B (en) * 2016-08-31 2019-10-22 北汽福田汽车股份有限公司 Fuel heating system
WO2019065686A1 (en) * 2017-09-26 2019-04-04 大阪有機化学工業株式会社 Photosensitive resin composition for forming photospacer, method for forming photospacer, substrate equipped with photospacer, and colour filter
JP6374595B1 (en) * 2017-09-26 2018-08-15 東京応化工業株式会社 Photosensitive resin composition, cured film, display device, and pattern forming method
KR101869205B1 (en) * 2017-10-13 2018-07-19 동우 화인켐 주식회사 Photosensitive resin composition, and pattern formed therefrom, color filter comprising thereof and liquid crystal display device comprigin the color filter
TWI781283B (en) * 2018-01-26 2022-10-21 日商三菱化學股份有限公司 Colored photosensitive resin composition, bank, organic electroluminescent element, image display device and lighting
KR102048770B1 (en) * 2018-02-27 2019-11-26 애경화학 주식회사 Photo-curable resin ink composition for 3D printing with heat resisting and high mechanical property comprising dicyclopentadien epoxy acrylate
US20200201180A1 (en) * 2018-12-21 2020-06-25 Rohm And Haas Electronic Materials Korea Ltd. Colored photosensitive resin composition and black matrix prepared therefrom
KR102560228B1 (en) * 2018-12-24 2023-07-27 동우 화인켐 주식회사 Photosensitive resin composition, and color filter and liquid crystal display device formed therefrom
JP7331371B2 (en) * 2019-02-04 2023-08-23 三菱ケミカル株式会社 Photosensitive colored resin composition, cured product, and image display device
JP7360798B2 (en) * 2019-02-21 2023-10-13 サカタインクス株式会社 Colored composition and colored resist composition containing the same
KR102558491B1 (en) * 2019-03-12 2023-07-21 동우 화인켐 주식회사 A blue color photosensitive resin composition for organic light emitting diodes, a color filter and an image display device comprising the same
CN113631600A (en) * 2019-03-28 2021-11-09 富士胶片株式会社 Coloring composition, cured film, structure, color filter, and display device
WO2021090836A1 (en) * 2019-11-06 2021-05-14 三菱ケミカル株式会社 Photosensitive resin composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device
JP7081696B2 (en) * 2020-01-21 2022-06-07 東レ株式会社 Positive photosensitive resin composition, cured film, laminate, substrate with conductive pattern, manufacturing method of laminate, touch panel and organic EL display device

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08234212A (en) 1995-02-28 1996-09-13 Casio Comput Co Ltd Liquid crystal display element
JP4538220B2 (en) * 2003-12-16 2010-09-08 東洋インキ製造株式会社 Red coloring composition for color filter and color filter
WO2009025297A1 (en) * 2007-08-22 2009-02-26 Mitsubishi Chemical Corporation Resin black matrix, light blocking photosensitive resin composition, tft element substrate and liquid crystal display device
JP2011099919A (en) * 2009-11-04 2011-05-19 Mitsubishi Chemicals Corp Colored resin composition, color filter, liquid crystal display device, and organic el display
JP2012018246A (en) * 2010-07-07 2012-01-26 Mitsubishi Chemicals Corp Colored photosensitive resin composition, cured product and liquid crystal display device
WO2013062011A1 (en) * 2011-10-25 2013-05-02 三菱化学株式会社 Colored photosensitive resin composition, colored spacer, color filter, and liquid crystal display device
JP2013134263A (en) 2011-12-22 2013-07-08 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer
KR102078989B1 (en) 2012-01-31 2020-02-19 미쯔비시 케미컬 주식회사 Colored photosensitive composition, black photo spacer, and color filter
TWI585527B (en) * 2012-02-29 2017-06-01 新日鐵住金化學股份有限公司 A photosensitive composition for black matrix and a method for producing the same
WO2013180386A1 (en) * 2012-05-30 2013-12-05 주식회사 엘지화학 Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same
US9217070B2 (en) * 2012-06-01 2015-12-22 Basf Se Black colorant mixture
JP6065596B2 (en) * 2013-01-16 2017-01-25 Jsr株式会社 Radiation-sensitive coloring composition, colored cured film, and display element
JP6062278B2 (en) * 2013-02-14 2017-01-18 クラリアント・ファイナンス・（ビーブイアイ）・リミテッド Black pigment composition
JP6065645B2 (en) * 2013-02-27 2017-01-25 三菱化学株式会社 Photosensitive resin composition, cured product obtained by curing the same, color filter, and liquid crystal display device
JP6147143B2 (en) * 2013-08-28 2017-06-14 富士フイルム株式会社 Colored photosensitive resin composition, cured film, color filter, method for producing color filter, solid-state imaging device, and image display device
KR20150026246A (en) * 2013-09-02 2015-03-11 동우 화인켐 주식회사 Photosensitive resin composition for transparent pixel
KR20230085213A (en) * 2013-09-25 2023-06-13 미쯔비시 케미컬 주식회사 Photosensitive coloring composition, black matrix, coloring spacer, image display device, and pigment dispersion
KR20150105248A (en) * 2014-03-07 2015-09-16 신닛테츠 수미킨 가가쿠 가부시키가이샤 Black resin composition for light-shielding film, substrate with that light-shielding film by curing thereof, and color filter or touch panel using the substrate with that light-shielding film
KR20150107491A (en) * 2014-03-14 2015-09-23 동우 화인켐 주식회사 A colored photosensitive resin composition
JP6330412B2 (en) * 2014-03-26 2018-05-30 東レ株式会社 Shielding film forming substrate and touch panel
KR101474803B1 (en) * 2014-03-27 2014-12-19 제일모직주식회사 Method of manufacturing black column spacer, black column spacer, and color filter
KR102344138B1 (en) * 2014-03-31 2021-12-28 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 Photosensitive resin composition for light shielding film, light shielding film using the same, and color filter including that film
CN106459238B (en) * 2014-05-27 2018-11-13 富士胶片株式会社 Lightproof composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI765958B (en) * 2018-01-19 2022-06-01 南韓商東友精細化工有限公司 Colored photosensitive resin composition, color filter including black matrix , column spacer or black column spacer manufactured using the colored photosensitive resin composition, and display device including the color filter

Also Published As

Publication number Publication date
JP2018081317A (en) 2018-05-24
CN108475012A (en) 2018-08-31
KR20180096648A (en) 2018-08-29
TWI711882B (en) 2020-12-01
JP6268508B2 (en) 2018-01-31
JP6919554B2 (en) 2021-08-18
KR102540423B1 (en) 2023-06-05
WO2017110893A1 (en) 2017-06-29
JPWO2017110893A1 (en) 2017-12-21
CN108475012B (en) 2022-07-15

Similar Documents

Publication Publication Date Title
JP7268700B2 (en) Photosensitive coloring composition, cured product, colored spacer, image display device
TWI711882B (en) Photosensitive coloring composition, cured product, coloring spacer, image display device
TWI753056B (en) Colored photosensitive resin composition, pigment dispersion, bank, organic electroluminescent element, image display device and lighting
TWI759427B (en) Photosensitive colored composition, cured product, colored spacer, image display device
TWI794156B (en) Photosensitive coloring composition for forming colored spacer, cured product, colored spacer, image display device
TW201520689A (en) Photosensitive colored composition, black matrix, colored spacer, image display device and pigment dispersion liquid
JP6543968B2 (en) Photosensitive coloring composition, cured product, coloring spacer, and image display device
TW201818152A (en) Photosensitive resin composition, cured product and image display device
JP6528475B2 (en) Photosensitive coloring composition, cured product, coloring spacer, and image display device
JP2016177190A (en) Photosensitive coloring composition for forming colored spacer, cured product, colored spacer, and image display device
JP2022078139A (en) Photosensitive coloring composition, cured material, coloring spacer, image display device
JP2017053942A (en) Photosensitive coloring composition, cured product, colored spacer, and image display device
JP7485147B2 (en) Photosensitive coloring composition, cured product, colored spacer, and image display device
TWI829830B (en) Photosensitive coloring composition, hardened material, coloring spacer, and image display device
JP2019015966A (en) Photosensitive coloring composition, cured product, colored spacer, and image display device
TWI768074B (en) Photosensitive colored composition, cured product, colored spacer, and image display device
WO2022176976A1 (en) Photosensitive colored composition, cured object, banks, organic electroluminescent element, and image display device
JP2019144407A (en) Photosensitive colored composition, cured product, colored spacer and image display device