TW201730362A - 具有氣體漏洩預防能力之旋轉夾具 - Google Patents

具有氣體漏洩預防能力之旋轉夾具 Download PDF

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TW201730362A
TW201730362A TW105139016A TW105139016A TW201730362A TW 201730362 A TW201730362 A TW 201730362A TW 105139016 A TW105139016 A TW 105139016A TW 105139016 A TW105139016 A TW 105139016A TW 201730362 A TW201730362 A TW 201730362A
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安得羅斯 格萊斯勒
貝哈德 洛伊德爾
巴哈斯卡 班達拉普
馬克斯 將克
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蘭姆研究股份公司
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Abstract

一種用以處理晶圓形狀物品的設備，其包含處理腔室及設置在處理腔室內之旋轉夾具。旋轉夾具係配置以將晶圓形狀物品固持在預定的處理位置。一板件遮蓋旋轉夾具，且固定在旋轉夾具或與旋轉夾具一體成形而能一起旋轉，該板件具有中央開口。一噴嘴組件延伸進入處理腔室，以使噴嘴組件的排放端穿過板件的中央開口，以定義介於中央開口與噴嘴組件之間的間隙，該間隙係自一上方入口端延伸至一下方出口端。噴嘴組件包含至少一側邊噴嘴，該至少一側邊噴嘴係設置以引導鄰近間隙及下方出口端上游的氣體流量，且係配置以在間隙的下方出口端的上游位置處產生一下降壓力，從而控制氣體流量自上方入口端朝下方出口端通過間隙。

Description

具有氣體漏洩預防能力之旋轉夾具
本發明大致關於用以處理晶圓形狀物品（如半導體晶圓）之設備，尤其有關包含旋轉夾具的設備，其中旋轉夾具係設計成防止夾具內之非期望的氣體流動。
半導體晶圓經過各種表面處理製程，例如蝕刻、清理、研磨、及材料沉積。為符合此類製程，可藉由與可旋轉載具結合之夾具而相對於一或更多處理流體噴嘴來支撐單一晶圓，如美國專利第4903717號及第5513668號中所描述者。
替代性地，可將用以支撐晶圓之環形轉子形式的夾具設置在封閉處理腔室內，並藉由主動式磁浮軸承來驅動而無實際接觸，如國際公開專利第WO2007/101764號及美國專利第6485531號中所描述者。
當固定噴嘴組件穿過夾具的旋轉部份時，必須有機械空隙。然而，這樣的空隙可能導致非期望的氣體流動，因而可能對晶圓處理造成負面影響。
本案發明人發展出一種用以處理晶圓形狀物品之改良設備，其中一旋轉夾具係設計以防止夾具內之非期望的氣體流動。
因此，在一實施態樣中，本發明涉及一種用以處理晶圓形狀物品的設備，其包含處理腔室及設置在處理腔室內之旋轉夾具。旋轉夾具係配置以將晶圓形狀物品固持在預定的處理位置。一板件遮蓋旋轉夾具，且固定在旋轉夾具或與旋轉夾具一體成形而能一起旋轉，板件具有中央開口。噴嘴組件延伸進入處理腔室，以使噴嘴組件的排放端穿過板件的中央開口，以定義介於中央開口與噴嘴組件之間的間隙，該間隙自一上方入口端延伸至一下方出口端。噴嘴組件包含至少一側邊噴嘴，該至少一側邊噴嘴係設置以引導鄰近間隙及下方出口端上游的氣體流量，且係配置以在間隙的下方出口端的上游位置處產生一下降壓力，從而控制氣體流量自上方入口端朝下方出口端通過間隙。
在根據本發明之設備的較佳實施例中，板件及處理腔室的上部定義一氣體分佈腔室，且其中板件包含各自形成在其中央及周緣區域的複數開口，從而自氣體分佈腔室供應處理氣體至由旋轉夾具所固持之晶圓形狀物品的表面。
在根據本發明之設備的較佳實施例中，至少一氣體供應噴嘴係設置在噴嘴組件的徑向外側，該至少一氣體供應噴嘴將處理氣體供應至氣體分佈腔室。
在根據本發明之設備的較佳實施例中，板件係圓頂形狀，致使其中央區域較其周緣區域離設置在旋轉夾具上之晶圓形狀物品更遠。
在根據本發明之設備的較佳實施例中，該複數開口之每一者具有範圍從0.3到2.0 mm²的截面積，較佳地從0.5到1.5 mm²，及更佳地從0.7到1.2 mm²。
在根據本發明之設備的較佳實施例中，該複數開口包括至少20個開口，較佳地為至少50個開口，及更較佳地為至少80個開口。
在根據本發明之設備的較佳實施例中，該至少一側邊噴嘴包含相對於間隙而對稱設置的至少三個側邊噴嘴。
在根據本發明之設備的較佳實施例中，該至少一側邊噴嘴包含具有一出口之緊縮部，該出口與其鄰近之寬闊部連通且與間隙的上方入口端連通，從而藉由文土里效應（Venturi effect）產生下降壓力。
在根據本發明之設備的較佳實施例中，緊縮部係定向以使其流動路徑大致平行於旋轉夾具的旋轉軸。
在根據本發明之設備的較佳實施例中，緊縮部係定向以使其流動路徑相對於旋轉夾具的旋轉軸傾斜延伸，而緊縮部的入口較該出口更靠近旋轉夾具的旋轉軸。
在根據本發明之設備的較佳實施例中，噴嘴組件包含液體供應導管及氣體供應導管，液體供應導管及氣體供應導管之每一者係以低於間隙的下方出口端之高度，而在噴嘴組件的排放端處開放。
在根據本發明之設備的較佳實施例中，板件的中央開口係直徑30～60 mm的圓形開口。
在根據本發明之設備的較佳實施例中，旋轉夾具包含磁性轉子，該設備更包含磁性定子，磁性定子係裝設在處理腔室外側並圍繞磁性轉子。
現在參考圖1，其係根據本發明之第一實施方式之用以處理晶圓形狀物品表面的設備，該設備包含封閉處理腔室13，其中設有環形旋轉夾具16。旋轉夾具16為磁性轉子，其係被設置在腔室外側的磁性定子17所圍繞，以使磁性轉子自由地在腔室13內轉動及懸浮，而不接觸腔室壁。腔室13係藉由剛性固定在其上端的蓋件14而於上端處封閉。
上述磁性轉子夾具的進一步結構細節係敘述在例如共同所有的美國專利第8646767號。
環形旋轉夾具16具有一環形系列的向下懸置之夾持栓銷19，於處理期間其係可鬆開式地固持晶圓W。下方分佈單元22係設置以供應液體及/或氣體至腔室13內之晶圓W的面朝下的一側。加熱器31係設置在腔室13內，以根據執行中的製程而將晶圓W加熱至期望的溫度。加熱器31較佳地包含多數藍光LED燈，其放射線輸出容易被矽晶圓優先吸收（相對於腔室13的構件）。
上方分佈單元包含外側氣體導管27及內側液體導管25，內側液體導管25係以同軸方式設置在外側氣體導管27之內。導管25、27皆穿過蓋件14，並容許液體及氣體供應至腔室13內之晶圓W的面朝上的一側。上方分佈單元亦包括導管23，其供應氣體至環形噴嘴塊24，噴嘴塊24之中形成至少一側邊噴嘴，以下將說明更多的細節。
出口板件28的下方側定義氣體噴淋頭，其亦顯示在圖2的平面圖中。出口板件28包含多數排放孔29，其容許處理氣體通過氣體噴淋頭而從氣體分佈腔室37到鄰近晶圓W的面朝上的一側之區域。此實施方式中的排放孔29各自具有範圍從0.3到2.0 mm2 的截面積，較佳地從0.5到1.5 mm2 ，及更佳地從0.7到1.2 mm2 。較佳地為具有至少20個孔29，更佳地為至少50個，再更佳地為至少80個，及甚至更佳地為300個。
出口板件28係剛性固定在旋轉夾具16或與旋轉夾具16一體成形，且因此與旋轉夾具16一起旋轉。另一方面，導管25、27係固定裝設在腔室13的蓋件14之中，並且以微小的空隙穿過形成在板件28中之中央開口。
如圖2所示，板件28的中央區域及周緣區域各自具有複數個孔29，其中該中央區域係定義為在板件28的二分之一半徑30內之一區域，且該周緣區域係定義為該二分之一半徑30以外之區域。
回到圖­­­1，可見到氣體分佈腔室37係經由處理氣體供應導管34來供應處理氣體，處理氣體供應導管34進而與處理氣體來源（未顯示）連通，在較佳實施方式中其為含有臭氧之氣體。
額外氣體導管40係設置在腔室13的外緣附近，並將如N2 之清理氣體導入旋轉夾具16的外緣與腔室13的圍繞圓柱壁之間所定義的間隙。來自噴嘴40的氣體亦形成一邊界，以使供應自噴嘴34的處理氣體被限制在分佈腔室37內。
如圖3所示，本實施方式之排放孔29係以相對於旋轉夾具16的垂直旋轉軸的傾斜角度而定向，以使該些孔指向旋轉夾具16的徑向外側。本案發明人發現到此配置幫助使分佈腔室37中的任何液體轉向離開晶圓W的面朝上的表面，同時允許經由導管34所供應之處理氣體仍能到達鄰近晶圓W的目標區域。
如圖4所示，此實施方式中之板件28與旋轉夾具16係一體成形。噴嘴組件21的下端穿過板件28中的中央開口，且環形間隙26係定義在這二個構件之間。噴嘴組件21亦包括第三噴嘴塊24（由導管23供應氣體），其引導鄰近此環形間隙26的氣體。
旋轉夾具16亦包括上述之夾持栓銷19和針狀軸承18，且針狀軸承18將栓銷19向下推，以使位在栓銷19的上端處之齒輪與共同環形齒輪15的鋸齒部呈連續嚙合，例如共同所有之美國專利第8646767號及美國公開專利申請案第2015/0008632號所述。
空隙或環形間隙26是使旋轉夾具16與板件28能相對於裝設在此設備之蓋件14中的固定噴嘴頭21旋轉所必需的。然而，本案發明人發現到在使用如此之設備時，有相當大部份的處理氣體流量被重新導向，以致其並非流過氣體噴淋頭板件28的開孔29，而是流過環形間隙26。
具體而言，如圖5a所示，當轉動旋轉夾具且將處理氣體供應至腔室37時，噴淋頭板件28相對於固定蓋件14及噴嘴組件21之旋轉導致非期望的處理流體流過環形間隙33（環形間隙33係存在於中央開口附近的板件28的外表面與蓋件14的內環形表面之間）。經由環形間隙33所汲抽之處理氣體接著通過環形間隙26（如圖5a中之虛線箭號所示），而使得由旋轉夾具所固持之晶圓W的中央區域處理不均衡。這就是沒有藉由導管23供應氣體的情況。
舉例而言，可在高溫封閉處理腔室中使用包括臭氧的高反應性氣體來執行光阻去除。光阻去除需要一致的速率以符合產品規格。然而，在氣體自板件28漏洩流至環形間隙26的未受控情況下，光阻去除會有中央高峰且光阻剝除速率均勻性較差。
現在參考圖5b，已發現到設置至少一側邊噴嘴32提供了針對此非期望的處理氣體流動問題之解決手段。具體而言，藉由供應氣體（其較佳地為惰性氣體，如N2 ）通過導管23到環形噴嘴塊24並通過側邊噴嘴32，則能使非期望的處理氣體流過間隙33及26降低或完全停止。具體而言，圖5b中之虛線箭號表示惰性氣體從噴嘴32流入間隙33，及處理氣體流入間隙26的降低流量。
圖5c顯示通過導管23及間隙33的惰性氣體流量足以防止任何處理氣體流入間隙26的情況。
應注意到，噴嘴32的孔明顯比噴嘴32的入口及出口處之流動路徑的面積更窄小。噴嘴32係設置在靠近間隙26的更徑向外側處。因此，當惰性氣體通過並從噴嘴32排出時，惰性氣體在噴嘴32中加速，進而在環形間隙26的上端處藉由文土里效應產生一下降壓力。此下降壓力阻止或防止非期望的處理氣體流入間隙26，否則便會發生如圖5a所示之情況。
再者，此效應可藉由修改通過噴嘴32的流速來進行調整，以使通過環形間隙33的處理氣體流量降低，或完全防止處理氣體進入間隙26，或甚至引起氣體往上流過環形間隙26的逆向流動。
圖5d顯示一替代實施方式，其中側邊噴嘴35並不像側邊噴嘴32垂直延伸的情況，而是其上方入口位於其下方出口的徑向內側。側邊噴嘴35因而傾斜延伸，且已發現到這對於一些應用上具有優點。選擇性地，側邊噴嘴35可以相反方向傾斜延伸，亦即其上方入口位於其下方出口的徑向外側。
雖然已就各種較佳實施方式來描述本發明，惟應瞭解到這些實施方式係僅供以說明本發明，且本發明並不限於這些實施方式，而是包括隨附之申請專利範圍的真正範圍及精神所包含之內容。
13‧‧‧腔室
14‧‧‧蓋件
15‧‧‧齒輪
16‧‧‧旋轉夾具
17‧‧‧定子
18‧‧‧針狀軸承
19‧‧‧栓銷
21‧‧‧噴嘴組件
22‧‧‧分佈單元
23‧‧‧導管
24‧‧‧噴嘴塊
25‧‧‧內側液體導管
26‧‧‧間隙
27‧‧‧外側氣體導管
28‧‧‧板件
29‧‧‧孔
30‧‧‧二分之一半徑
31‧‧‧加熱器
32‧‧‧噴嘴
33‧‧‧間隙
34‧‧‧處理氣體供應導管
35‧‧‧側邊噴嘴
37‧‧‧氣體分佈腔室
40‧‧‧氣體導管
在參考附圖而閱讀過本發明之較佳實施方式的以下詳細描述後，本發明的其他目的、特徵、及優點將變得更為清楚，其中：
圖1係根據本發明之第一實施方式之設備的說明性橫剖面側視圖；
圖2係用於圖1之實施方式之氣體噴淋頭的出口板件的平面圖；
圖3係圖1中之局部細節III的放大圖；
圖4係一立體圖（部份剖面），其顯示圖1之實施方式的額外細節；
圖5a、5b、及5c係圖4中之局部細節V的放大圖，其顯示基於使用根據圖1之實施方式的設備的不同流動情況；及
圖5d係圖4中之局部細節V的放大圖，其顯示側邊排放噴嘴的替代性實施方式。
14‧‧‧蓋件
15‧‧‧齒輪
16‧‧‧旋轉夾具
18‧‧‧針狀軸承
19‧‧‧栓銷
21‧‧‧噴嘴組件
23‧‧‧導管
24‧‧‧噴嘴塊
26‧‧‧間隙
27‧‧‧外側氣體導管
28‧‧‧板件
29‧‧‧孔
34‧‧‧處理氣體供應導管

Claims (14)

  1. 一種用以處理晶圓形狀物品的設備，包含： 處理腔室； 旋轉夾具，設置在該處理腔室內，該旋轉夾具係配置以將晶圓形狀物品固持在預定的處理位置； 板件，遮蓋該旋轉夾具，且固定在該旋轉夾具或與該旋轉夾具一體成形而能一起旋轉，該板件具有中央開口；及 噴嘴組件，延伸進入該處理腔室，以使該噴嘴組件的排放端穿過該板件的該中央開口，以定義介於該中央開口與該噴嘴組件之間的間隙，該間隙自一上方入口端延伸至一下方出口端； 該噴嘴組件包含至少一側邊噴嘴，該至少一側邊噴嘴係設置以引導鄰近該間隙及該下方出口端上游的氣體流量，且係配置以在該間隙的該下方出口端的上游位置處產生一下降壓力，從而控制氣體流量自該上方入口端朝該下方出口端通過該間隙。
  2. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該板件及該處理腔室的上部定義一氣體分佈腔室，且其中該板件包含各自形成在其中央及周緣區域的複數開口，從而自該氣體分佈腔室供應處理氣體至由該旋轉夾具所固持之晶圓形狀物品的表面。
  3. 如申請專利範圍第2項之用以處理晶圓形狀物品的設備，更包含設置在該噴嘴組件的徑向外側之至少一氣體供應噴嘴，該至少一氣體供應噴嘴將處理氣體供應至該氣體分佈腔室。
  4. 如申請專利範圍第2項之用以處理晶圓形狀物品的設備，其中該板件係圓頂形狀，致使其中央區域較其周緣區域離設置在該旋轉夾具上之晶圓形狀物品更遠。
  5. 如申請專利範圍第2項之用以處理晶圓形狀物品的設備，其中該複數開口之每一者具有範圍從0.3到2.0 mm²的截面積。
  6. 如申請專利範圍第2項之用以處理晶圓形狀物品的設備，其中該複數開口包括至少20個開口。
  7. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該至少一側邊噴嘴包含相對於該間隙而對稱設置的至少三個側邊噴嘴。
  8. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該至少一側邊噴嘴包含具有一出口之緊縮部，該出口與其鄰近之寬闊部連通且與該間隙的該上方入口端連通，從而藉由文土里效應（Venturi effect）產生該下降壓力。
  9. 如申請專利範圍第8項之用以處理晶圓形狀物品的設備，其中該緊縮部係定向以使其流動路徑大致平行於該旋轉夾具的旋轉軸。
  10. 如申請專利範圍第8項之用以處理晶圓形狀物品的設備，其中該緊縮部係定向以使其流動路徑相對於該旋轉夾具的旋轉軸傾斜延伸，而該緊縮部的入口較該出口更靠近該旋轉夾具的旋轉軸。
  11. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該板件係圓頂形狀，致使其中央區域較其周緣區域離設置在該旋轉夾具上之晶圓形狀物品更遠。
  12. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該噴嘴組件包含液體供應導管及氣體供應導管，該液體供應導管及該氣體供應導管之每一者係以低於該間隙的該下方出口端之高度，而在該噴嘴組件的該排放端處開放。
  13. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該板件的該中央開口係直徑30～60 mm的圓形開口。
  14. 如申請專利範圍第1項之用以處理晶圓形狀物品的設備，其中該旋轉夾具包含磁性轉子，該設備更包含磁性定子，該磁性定子係裝設在該處理腔室外側並圍繞該磁性轉子。
TW105139016A 2015-12-04 2016-11-28 具有氣體漏洩預防能力之旋轉夾具 TW201730362A (zh)

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