TW201724290A - Sealed devices and methods for making the same - Google Patents

Sealed devices and methods for making the same Download PDF

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TW201724290A
TW201724290A TW105125622A TW105125622A TW201724290A TW 201724290 A TW201724290 A TW 201724290A TW 105125622 A TW105125622 A TW 105125622A TW 105125622 A TW105125622 A TW 105125622A TW 201724290 A TW201724290 A TW 201724290A
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substrate
cavity
glass
seal
sealing device
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康拉得潔米葛力
道森伊利大衛法蘭斯
洛古諾夫史蒂芬路夫維奇
克薩達馬克亞歷山卓
斯特列利佐夫亞歷山大米哈伊洛維奇
汪柏德雷納德傑拉德
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康寧公司
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/04Joining glass to metal by means of an interlayer
    • C03C27/042Joining glass to metal by means of an interlayer consisting of a combination of materials selected from glass, glass-ceramic or ceramic material with metals, metal oxides or metal salts
    • C03C27/044Joining glass to metal by means of an interlayer consisting of a combination of materials selected from glass, glass-ceramic or ceramic material with metals, metal oxides or metal salts of glass, glass-ceramic or ceramic material only
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • CCHEMISTRY; METALLURGY
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    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/04Joining burned ceramic articles with other burned ceramic articles or other articles by heating with articles made from glass
    • C04B37/042Joining burned ceramic articles with other burned ceramic articles or other articles by heating with articles made from glass in a direct manner
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    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/04Joining burned ceramic articles with other burned ceramic articles or other articles by heating with articles made from glass
    • C04B37/045Joining burned ceramic articles with other burned ceramic articles or other articles by heating with articles made from glass characterised by the interlayer used
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission
    • H01L27/153Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission in a repetitive configuration, e.g. LED bars
    • H01L27/156Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483Containers
    • H01L33/486Containers adapted for surface mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • H01L33/502Wavelength conversion materials
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    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/10Glass interlayers, e.g. frit or flux
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32Ceramic
    • C04B2237/34Oxidic
    • C04B2237/343Alumina or aluminates
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    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32Ceramic
    • C04B2237/36Non-oxidic
    • C04B2237/361Boron nitride
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    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32Ceramic
    • C04B2237/36Non-oxidic
    • C04B2237/365Silicon carbide
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    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32Ceramic
    • C04B2237/36Non-oxidic
    • C04B2237/366Aluminium nitride
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0041Processes relating to semiconductor body packages relating to wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/507Wavelength conversion elements the elements being in intimate contact with parts other than the semiconductor body or integrated with parts other than the semiconductor body

Abstract

Disclosed herein are sealed devices comprising at least one cavity containing at least one quantum dot or at least one laser diode are also disclosed herein. The sealed devices can comprise a glass substrate sealed to an inorganic substrate, optionally via a sealing layer, the seal extending around the at least one cavity. Display and optical devices comprising such sealed devices are also disclosed herein, as well as methods for making such sealed devices.

Description

密封裝置以及其製造方法Sealing device and method of manufacturing same

本揭露大致上涉及密封裝置,且更具體地涉及包含量子點、雷射二極管、發光二極管或其他發光結構的密封裝置及包含這種密封裝置的顯示和光學裝置。The present disclosure relates generally to sealing devices and, more particularly, to sealing devices including quantum dots, laser diodes, light emitting diodes, or other light emitting structures, and display and optical devices including such sealing devices.

密封玻璃封裝和包裝在電子和其他裝置的應用中越來越受歡迎,其受益於持續操作的密封環境。受益於封閉封裝的例示性裝置包括電視、感測器、光學裝置、有機發光二極管(OLED)顯示器、3D噴墨印表機、雷射印表機、固態照明源和光伏結構。例如,包括OLED或量子點(QD)的顯示器需要密封且封閉的封裝,以避免該等材料在大氣條件下的可能分解。Sealed glass packaging and packaging are becoming increasingly popular in electronic and other device applications, benefiting from a continuously operating sealed environment. Exemplary devices that benefit from a closed package include televisions, sensors, optical devices, organic light emitting diode (OLED) displays, 3D inkjet printers, laser printers, solid state lighting sources, and photovoltaic structures. For example, displays that include OLEDs or quantum dots (QDs) require a sealed and enclosed package to avoid possible decomposition of such materials under atmospheric conditions.

不管是否利用或不利用環氧樹脂或其他密封材料,透過將該等基板置於爐內都能夠密封玻璃、陶瓷和/或玻璃-陶瓷基板。然而,一般在較高的加工溫度下操作該爐,該溫度不適於很多裝置,例如OLED和QD。利用玻璃料亦能夠密封該玻璃基板,例如,將玻璃料置於該等基板之間並利用雷射或其他熱源加熱該玻璃料以密封該包裝。基於玻璃料的密封劑可包括,例如研磨至約2至150微米之範圍的顆粒尺寸的玻璃材料。該玻璃料能夠與具有相似顆粒尺寸的負CTE材料混合,以降低該等基板和該玻璃料之間的熱膨脹係數的失配。The glass, ceramic and/or glass-ceramic substrates can be sealed by placing the substrates in a furnace, with or without the use of epoxy or other sealing materials. However, the furnace is typically operated at higher processing temperatures that are not suitable for many devices, such as OLEDs and QDs. The glass substrate can also be sealed with a frit, for example, by placing a frit between the substrates and heating the frit with a laser or other heat source to seal the package. The frit-based sealant can include, for example, a glass material that is ground to a particle size in the range of from about 2 to 150 microns. The frit can be mixed with a negative CTE material having a similar particle size to reduce the mismatch in the coefficient of thermal expansion between the substrates and the frit.

玻璃料一般具有高於450°C的玻璃轉變溫度(Tg ),因此需要處於提高的溫度下的處理以形成密封。這種高溫密封處理對溫度敏感的工件有損。進一步地,該玻璃料膏體內的該負的CTE無機填料負面地影響該玻璃料的透明度,其造成不透明的密封。因此,提供透明且封閉的密封裝置及在較低溫度下用以形成這種裝置的方法是有利的,該低溫適於封裝熱敏工件。Glass frits generally have a glass transition temperature ( Tg ) above 450 °C and therefore require treatment at elevated temperatures to form a seal. This high temperature sealing process is detrimental to temperature sensitive workpieces. Further, the negative CTE inorganic filler within the frit paste negatively affects the transparency of the frit, which results in an opaque seal. Accordingly, it would be advantageous to provide a transparent and closed sealing device and a method for forming such a device at a lower temperature suitable for packaging a heat sensitive workpiece.

在各種實施例中,本揭露涉及密封裝置,其包含玻璃基板,該玻璃基板包含第一表面;無機基板,其包含第二表面;密封層,其與至少一部分該第一表面和至少一部分該第二表面接觸;及至少一個密封,其透過該密封層將該玻璃基板黏結至該無機基板,其中,該無機基板具有大於約2.5W/m-K的熱導率,其中,該第一或第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個量子點和至少一個LED元件,且其中,該密封環繞該至少一個空腔延伸。In various embodiments, the present disclosure relates to a sealing device comprising a glass substrate comprising a first surface; an inorganic substrate comprising a second surface; a sealing layer with at least a portion of the first surface and at least a portion of the a second surface contact; and at least one seal that bonds the glass substrate to the inorganic substrate through the sealing layer, wherein the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK, wherein the first or second surface At least one of the at least one cavity includes at least one quantum dot and at least one LED element, and wherein the seal extends around the at least one cavity.

本文亦揭示了包含雷射二極管的密封裝置,該等裝置包含玻璃基板,該玻璃基板包含第一表面;無機基板,其包含第二表面;密封層,其與至少一部分該第一表面和至少一部分該第二表面接觸;及至少一個密封,其透過該密封層將該玻璃基板黏結至該無機基板,其中,該無機基板具有大於約2.5W/m-K的熱導率,其中,該第一或第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個雷射二極管,且其中,該密封環繞該至少一個空腔延伸。Also disclosed herein are sealing devices comprising laser diodes, the devices comprising a glass substrate comprising a first surface; an inorganic substrate comprising a second surface; a sealing layer with at least a portion of the first surface and at least a portion The second surface is in contact with; and at least one seal that bonds the glass substrate to the inorganic substrate through the sealing layer, wherein the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK, wherein the first or the first At least one of the two surfaces includes at least one cavity including at least one laser diode, and wherein the seal extends around the at least one cavity.

本文進一步揭示了包含玻璃基板的密封裝置,該玻璃基板包含第一表面,該摻雜的無機基板包含第二表面;及至少一個密封,其將該玻璃基板黏結至該摻雜的無機基板,其中,該摻雜的無機基板包含大於約2.5W/m-K的熱導率及至少約0.05wt%的選自ZnO、SnO、SnO2 或TiO2 中的至少一個摻雜劑。在一些實施例中,該玻璃基板可黏結至該無機基板或可透過密封層黏結。Further disclosed herein is a sealing device comprising a glass substrate comprising a first surface, the doped inorganic substrate comprising a second surface; and at least one seal bonding the glass substrate to the doped inorganic substrate, wherein The doped inorganic substrate comprises a thermal conductivity greater than about 2.5 W/mK and at least about 0.05 wt% of at least one dopant selected from the group consisting of ZnO, SnO, SnO 2 or TiO 2 . In some embodiments, the glass substrate can be bonded to the inorganic substrate or bonded through a sealing layer.

本文亦揭示了用以製造這種密封裝置的方法,該等方法包含:將至少一個空腔內的該至少一個量子點和至少一個LED元件置於玻璃基板的第一表面或無機基板的第二表面上;將密封層置於至少一部分該第一表面或至少一部分該第二表面的上方;將該第一表面與該第二表面接觸,其間設置有該密封層,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封,該密封環繞該至少一個包含該至少一個量子點和該至少一個LED元件的空腔延伸,其中,該無機基板具有大於約2.5W/m-K的熱導率。Also disclosed herein are methods for making such a sealing device, the methods comprising: placing the at least one quantum dot and at least one LED element in at least one cavity on a first surface of a glass substrate or a second surface of an inorganic substrate Forming a sealing layer over at least a portion of the first surface or at least a portion of the second surface; contacting the first surface with the second surface with the sealing layer disposed therebetween to form a sealing interface; A laser beam operating at a predetermined wavelength is directed to the sealing interface to form a seal between the glass substrate and the inorganic substrate, the seal surrounding the at least one cavity including the at least one quantum dot and the at least one LED element Extending wherein the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK.

本文亦揭示了用以製造包含雷射二極管的密封裝置的方法,該等方法包含:將至少一個空腔內的該至少一個量子點和至少一個LED元件置於玻璃基板的第一表面或無機基板的第二表面上;將密封層置於至少一部分該第一表面或至少一部分該第二表面的上方;將該第一表面與該第二表面接觸,其間設置有該密封層,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封,該密封環繞該至少一個包含該至少一個雷射二極管的空腔延伸,其中,該無機基板具有大於約2.5W/m-K的熱導率。Also disclosed herein are methods for fabricating a sealing device comprising a laser diode, the methods comprising: placing the at least one quantum dot and the at least one LED component in the at least one cavity on a first surface of the glass substrate or an inorganic substrate a second surface; placing a sealing layer over at least a portion of the first surface or at least a portion of the second surface; contacting the first surface with the second surface with the sealing layer disposed therebetween to form a sealing interface And directing a laser beam operating at a predetermined wavelength to the sealing interface to form a seal between the glass substrate and the inorganic substrate, the seal extending around the at least one cavity including the at least one laser diode, Wherein, the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK.

本文揭示的附加方法包括用以製造密封裝置的方法,該等方法包含:在無機基板中摻雜至少一個在預定波長下吸收的摻雜劑;將玻璃基板的第一表面與該摻雜的無機基板的第二表面接觸,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封,其中,該無機基板具有大於約2.5W/m-K的熱導率。Additional methods disclosed herein include methods for fabricating a sealing device, the methods comprising: doping at least one dopant that absorbs at a predetermined wavelength in an inorganic substrate; and bonding the first surface of the glass substrate to the doped inorganic Contacting a second surface of the substrate to form a sealing interface; and directing a laser beam operating at a predetermined wavelength to the sealing interface to form a seal between the glass substrate and the inorganic substrate, wherein the inorganic substrate has a greater than A thermal conductivity of about 2.5 W/mK.

本文進一步揭示了用以製造密封裝置的方法,該等方法包含:將玻璃基板的第一表面和無機基板的第二表面與密封層接觸,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封;其中,該玻璃基板的CTE和該無機基板的CTE之間的差值小於20x10-7 /°C,且該無機基板具有大於約2.5W/m-K的熱導率。Further disclosed herein are methods for fabricating a sealing device, the method comprising: contacting a first surface of a glass substrate and a second surface of the inorganic substrate with a sealing layer to form a sealing interface; and a thunder that will operate at a predetermined wavelength Directing a beam of light to the sealing interface to form a seal between the glass substrate and the inorganic substrate; wherein a difference between a CTE of the glass substrate and a CTE of the inorganic substrate is less than 20×10 -7 /° C., and The inorganic substrate has a thermal conductivity greater than about 2.5 W/mK.

本揭露的附加特徵和優點將在隨後的描述中闡述,且所屬技術領域中具有通常知識者將從該描述熟知或經由本文描述的包括隨後的詳細說明、申請專利範圍和附圖方法實踐而認可其部分。Additional features and advantages of the present disclosure will be set forth in the description which follows, and the <Desc/Clms Page number> Part of it.

應當理解,上述一般描述和以下詳細描述都呈現本發明的實施例,並且上述一般描述和以下詳細描述意欲提供用於理解申請專利範圍的本質和特性的概述和框架。本說明書包括該附圖,以提供對本揭露的進一步理解,並且該附圖併入本說明書且構成本說明書的一部分。該附圖對本發明的實施例進行圖解,並且與說明書一起用於解釋各種實施例的原理和操作。The foregoing description of the preferred embodiments of the invention and the claims The description includes the drawings to provide a further understanding of the present disclosure, and which is incorporated in the specification and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description,

本文揭示了包含至少兩個選自玻璃、玻璃-陶瓷和/或陶瓷基板的基板的密封裝置。例示性密封裝置能夠包括例如封裝量子點、LED、雷射二極管(LD)和其他發光結構的密封裝置。本文亦揭示了包含這種密封元件的顯示及光學裝置。顯示器例如電視、電腦、手持裝置、手錶或類似裝置能夠包含背光源,該背光源包含作為顏色轉換器的量子點(QD)。例示性光學裝置能夠包括但不限於感測器、手錶、生物感測器和其他被組態用以包含本文描述的實施例的裝置。在一些實施例中,能夠例如在玻璃管、毛細管或板例如量子點增強膜(QDEF)或封裝的裝置(例如小芯片)內封裝QD。能夠用量子點(例如綠色和紅色的發射量子點)填充這種膜或裝置,且能夠在兩端和/或外周密封。由於QD的溫度敏感性,利用量子點材料的背光源避免了該量子點材料和該光源(例如LED)之間的直接接觸。因此,如 1 所示,包含複數個QDs或QD(其包含材料105 )的密封裝置101 往往被合併至該背光堆層作為分離元件,例如,置於接近LED103 ,但是保持足夠的距離以避免在極端條件(例如,高達約140°C的溫度和高達約100W/cm2 的光通量)下損壞包含材料105 的QDs或QD。例如,密封裝置101 能夠置於接近包含一個或多個空腔109 的第一基板107 ,該空腔109 包含LED103 。然而在一些範例中,該等密封裝置能夠引起大量的材料浪費和/或使生產例如QDEF複雜化。進一步地,在QDEF的情況下,該等膜亦缺少用以驅散由顏色轉換產生的熱量的良好路徑。在一些實施例中,該密封裝置101 可包括封閉地密封至下基板的上基板,兩者形成包含QDs或QD的外殼,QDs或QD包含材料105 。之後,該包裝或小芯片可被密封至下方的第一基板107 。儘管未示出,該實施例可設置於在第一基板107 內形成的井的壁內,該第一基板107 包含LED103 。在附加的實施例中,一個或多個透鏡(未示出)可設置於該小芯片或與LED103 相對的密封裝置101 的一側上。Disclosed herein are sealing devices comprising at least two substrates selected from the group consisting of glass, glass-ceramic and/or ceramic substrates. Exemplary sealing devices can include, for example, encapsulating quantum dots, LEDs, laser diodes (LDs), and other light emitting structures. Display and optical devices incorporating such sealing elements are also disclosed herein. A display such as a television, computer, handheld device, watch or the like can include a backlight containing a quantum dot (QD) as a color converter. Exemplary optical devices can include, but are not limited to, sensors, watches, biosensors, and other devices configured to include the embodiments described herein. In some embodiments, the QD can be packaged, for example, in a glass tube, capillary or plate such as a quantum dot enhancement film (QDEF) or a packaged device (eg, a chiplet). Such films or devices can be filled with quantum dots (e.g., green and red emitting quantum dots) and can be sealed at both ends and/or periphery. Due to the temperature sensitivity of the QD, backlights utilizing quantum dot materials avoid direct contact between the quantum dot material and the source (eg, LED). Thus the sealing device 101, as shown in FIG. 1, includes a plurality of QDs or the QD (comprising material 105) are often incorporated into the backlight stack as a separation element, for example, is placed close to the LED 103, but a sufficient distance to avoid damage or QD material 105 comprising QDs under extreme conditions (e.g., up to about the temperature to 140 ° C and up to about 100W / cm 2 flux). For example, the sealing device 101 can be placed closer to comprise one or more cavities 109 of the first substrate 107, the cavity 109 includes LED 103. In some examples, however, such sealing devices can cause significant material waste and/or complicate production such as QDEF. Further, in the case of QDEF, the films also lack a good path to dissipate the heat generated by color conversion. In some embodiments, the sealing device 101 can include an upper substrate that is hermetically sealed to the lower substrate, both forming a housing comprising QDs or QDs, the QDs or QD comprising a material 105 . Thereafter, the package or chiplet can be sealed to the underlying first substrate 107 . Although not shown, this embodiment may be provided in the wall of the well formed in the first substrate 107, the substrate 107 comprises a first LED 103. In an additional embodiment, one or more lenses (not shown) may be disposed on one side of the chiplet or sealing device 101 opposite the LED 103 .

現在參考 2-5 論述本揭露的各種實施例,其圖示了例示性密封裝置。以下一般描述意欲提供申請專利範圍保護的裝置的概觀,且各種態樣將參考非限制性實施例在本揭露的全文內更具體地論述,在本揭露的上下文中,這些實施例可互換。全文中將使用「第一」基板、「玻璃」基板或「第一玻璃」基板,這些標記可互換以指示相同的基板。相似地,全文中將使用「第二」基板、「無機」基板、「摻雜的無機」基板或「第二無機」基板,這些標記可互換以指示相同的基板。裝置 2-5 various reference now to FIG discussed embodiments of the present disclosure, which illustrates an exemplary sealing means. The following general description is intended to provide an overview of the claimed invention, and the various aspects of the invention are described in the context of the disclosure of the invention, and in the context of the disclosure, these embodiments are interchangeable. The "first" substrate, the "glass" substrate, or the "first glass" substrate will be used throughout, and these labels may be interchanged to indicate the same substrate. Similarly, a "second" substrate, an "inorganic" substrate, a "doped inorganic" substrate, or a "second inorganic" substrate will be used throughout, and these labels can be interchanged to indicate the same substrate. Device

本文揭示密封裝置,其包含玻璃基板,該玻璃基板包含第一表面;無機基板,其包含第二表面;密封層,其與至少一部分該第一表面和至少一部分該第二表面接觸;及至少一個密封,其透過該密封層將該玻璃基板黏結至該無機基板,其中,該無機基板具有大於約2.5W/m-K的熱導率,其中,該第一或第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個量子點和至少一個LED元件,且其中,該密封環繞該至少一個空腔延伸。本文亦揭示了包含這種密封裝置的顯示及光學裝置。Disclosed herein is a sealing device comprising a glass substrate comprising a first surface; an inorganic substrate comprising a second surface; a sealing layer in contact with at least a portion of the first surface and at least a portion of the second surface; and at least one a seal that bonds the glass substrate to the inorganic substrate through the sealing layer, wherein the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK, wherein at least one of the first or second surface comprises at least one a cavity comprising at least one quantum dot and at least one LED element, and wherein the seal extends around the at least one cavity. Display and optical devices incorporating such sealing devices are also disclosed herein.

2A-B 繪示了密封裝置200 的兩個非限制性實施例的橫截面圖。該密封裝置200 包含第一玻璃基板201 和包含至少一個空腔209 的第二玻璃基板207 。該至少一個空腔209 能夠包含至少一個量子點205 。該至少一個空腔209 亦能夠包含至少一個LED元件203 。該第一基板207 和第二基板201 能夠透過至少一個密封211 接合至一起,該密封211 能夠環繞該至少一個空腔209 延伸。或者,該密封能夠環繞一個以上的空腔延伸,例如兩個或更多空腔(未示出)。在附加的實施例中,一個或多個透鏡(未示出)可設置於與LED203 相對的第一玻璃基板201 的一側上。該LED203 可具有任意直徑或長度,例如約100µm至約1mm,約200µm至約900µm,約300µm至約800µm,約400µm至約700µm,約350µm至約400µm及其間的任意子範圍。該LED203 亦可提供高或低的通量,例如,爲了高通量,該LED203 可發射20W/cm2 或更多。爲了低通量,該LED203 可發射小於20W/cm2 Of FIG. 2A-B illustrates a schematic cross-sectional view of two non-limiting embodiments of the sealing apparatus 200. The sealing device 200 includes a first glass substrate 201 and a second glass substrate 207 including at least one cavity 209 . The at least one cavity 209 can comprise at least one quantum dot 205 . The at least one cavity 209 can also comprise at least one LED element 203 . The first substrate 207 and second substrate 201 can be bonded 211 together to transmit at least one seal, the seal 211 can surround at least one cavity 209 extends. Alternatively, the seal can extend around more than one cavity, such as two or more cavities (not shown). In an additional embodiment, one or more lenses (not shown) may be disposed on one side of the first glass substrate 201 opposite the LEDs 203 . The LED 203 can have any diameter or length, such as from about 100 μm to about 1 mm, from about 200 μm to about 900 μm, from about 300 μm to about 800 μm, from about 400 μm to about 700 μm, from about 350 μm to about 400 μm, and any subrange therebetween. The LED 203 can also provide high or low flux, for example, for high throughput, the LED 203 can emit 20 W/cm 2 or more. For low throughput, the LED 203 can emit less than 20 W/cm 2 .

2A 中圖示的非限制性實施例中,該至少一個LED元件203 能夠與該至少一個量子點205 直接接觸。如本文中使用的術語「接觸」意欲指示兩個所列元件之間的直接實體接觸(physical contact)或相互作用(interaction),例如,該量子點和LED元件能夠在空腔內進行實體相互作用。在 2B 中圖示的非限制性實施例中,該至少一個LED元件203 和該至少一個量子點205 可存在於相同的空腔內,但是例如透過分離障礙物或膜213 彼此分離。經由比較,分離的密封的毛細管或板內的量子點,例如 1 所示的QDEF難以與該LED直接相互作用,且未設置於帶有該LED的該空腔內。In the non-limiting embodiment illustrated in FIG . 2A , the at least one LED element 203 can be in direct contact with the at least one quantum dot 205 . The term "contact" as used herein is intended to indicate a direct physical contact or interaction between two listed elements, for example, the quantum dots and LED elements are capable of interacting physically within the cavity. . Non-limiting embodiment illustrated in the first embodiment in FIG. 2B, the at least one LED element 203 and the at least one quantum dot 205 may be present in the same cavity, for example 213 but separated from each other through a barrier or membrane separation. Via comparison within the quantum dot, a capillary or a separate sealing sheet, for example, as shown in FIG. QDEF first difficult to directly interact with the LED, and not disposed in the cavity with the LED.

2C 中圖示的非限制性實施例中,密封裝置200 可包括至少一個LED元件203 、第一基板201 、第二基板207 和第三基板215 。該第一基板201 和第三基板2 15 可形成封閉地密封包裝或裝置216 ,其形成包含該至少一個量子點205 的封閉且密封的區域。在一些實施例中,封閉地密封包裝或裝置216 亦可包括一個或多個膜217a b ,例如但不限於用作高通濾波器的膜和用作低通濾波器的膜或提供用以過濾預定波長的光的膜。在一些實施例中,該至少一個LED元件203 能夠與該至少一個量子點205 分隔開預定距離「d」。在一些實施例中,該預定距離能夠小於或等於約100µm。在其他實施例中,該預定距離為約50µm至約2mm之間、約75µm至約500µm之間、約90µm至約300µm及其所有其間的子範圍。在一些實施例中,自該LED元件203 的上表面至包含該至少一個量子點205 的該封閉且密封的區域的中線量測該預定距離。當然,亦可至包含該至少一個量子點205 的該封閉且密封的區域的任意部分,例如但不限於至朝向該至少一個量子點205 的該第三基板215 的上表面、朝向該至少一個量子點205 的該第一基板210 的下表面或透過可存在於該封閉地密封包裝或裝置216 內的任意膜或濾波器217a b 形成的表面量測該預定距離。在一些實施例中,例示性膜包括避免來自例示性LED元件203 的藍光沿著一方向逃逸該裝置216 的濾波器217a 和/或避免紅光(或另一來自激發的量子點材料發射的另一光)沿著第二方向逃逸該裝置216 的另一濾波器217b 。例如,在一些實施例中,該裝置200 可包含一個或多個包含在透過該第二基板207 和/或其他基板形成的井或其他外殼內的LED元件203 。接近該一個或多個LED元件的封閉地密封包裝或裝置216 (例如,如上述的預定距離)可被固定至或密封至該第二基板207 且可包含封閉地密封至形成包含單個波長量子點材料205 的密封區域的第三基板215 的第一基板201 ,該單個波長量子點材料205 組態用以當透過該一個或多個LED元件203 發射的光激發時發射處於紅外波長、接近紅外波長或在預定光譜(紅光)下的光。該量子點材料205 與該LED元件203 相隔預定距離。在這種例示性實施例中,第一濾波器217a 可設置於該第一基板201 的底(或上)面,以過濾自該裝置200 的上表面發射的藍光,且第二濾波器207 b可設置於該第三基板的上(或底)面上,以過濾來自激發該第三基板215 的底面的該量子點材料的激發的光。在附加的實施例中,濾波器217c 可設置於該第二基板215 所得底面上,以過濾藍光。在一些實施例中,該等濾波器217a217b217c 單獨或組合包括複數個根據其光學屬性選取的薄膜層。在具體例示性濾波器217a217b217c 中,其設計用以具有藍波高透射性,以使得藍LED光自接近該裝置200 的導光板射出。該等濾波器亦處理紅色和綠色波的高反射,以降低返回至該導光板來自該量子點材料205 的後向反射。In the non-limiting embodiment illustrated in FIG . 2C , the sealing device 200 can include at least one LED element 203 , a first substrate 201 , a second substrate 207, and a third substrate 215 . The first substrate 201 and the third substrate 2 15 may form a hermetic sealed package or device 216 that forms a closed and sealed region containing the at least one quantum dot 205 . In some embodiments, the hermetically sealed package or device 216 may also include one or more membranes 217a , b such as, but not limited to, a membrane used as a high pass filter and a membrane used as a low pass filter or provided for filtration A film of light of a predetermined wavelength. In some embodiments, the at least one LED element 203 can be separated from the at least one quantum dot 205 by a predetermined distance "d". In some embodiments, the predetermined distance can be less than or equal to about 100 [mu]m. In other embodiments, the predetermined distance is between about 50 [mu]m and about 2 mm, between about 75 [mu]m and about 500 [mu]m, between about 90 [mu]m and about 300 [mu]m, and all subranges therebetween. In some embodiments, the predetermined distance is measured from the upper surface of the LED element 203 to the midline of the enclosed and sealed region containing the at least one quantum dot 205 . Of course, any portion of the enclosed and sealed region including the at least one quantum dot 205 , such as, but not limited to, the upper surface of the third substrate 215 facing the at least one quantum dot 205 , toward the at least one quantum The lower surface of the first substrate 210 of the point 205 or the surface formed by any of the films or filters 217a , b that may be present in the hermetically sealed package or device 216 measures the predetermined distance. In some embodiments, the exemplary film includes avoiding blue light from the exemplary LED element 203 from escaping the filter 217a of the device 216 in one direction and/or avoiding red light (or another from the emitted quantum dot material emission) A light) escapes another filter 217b of the device 216 along the second direction. For example, in some embodiments, the device 200 can include one or more LED elements 203 contained within a well or other housing formed through the second substrate 207 and/or other substrate. A hermetically sealed package or device 216 proximate the one or more LED elements (eg, a predetermined distance as described above) can be secured to or sealed to the second substrate 207 and can include a hermetic seal to form a single wavelength quantum dot a first substrate 201 of a third substrate 215 of a sealed region of material 205 , the single wavelength quantum dot material 205 configured to emit at an infrared wavelength, near infrared wavelength when excited by light emitted by the one or more LED elements 203 Or light under a predetermined spectrum (red light). The quantum dot material 205 is spaced apart from the LED element 203 by a predetermined distance. In such an exemplary embodiment, the first filter 217a may be disposed on a bottom (or upper) surface of the first substrate 201 to filter blue light emitted from an upper surface of the device 200 , and the second filter 207b The upper (or bottom) surface of the third substrate may be disposed to filter the excited light from the quantum dot material that excites the bottom surface of the third substrate 215 . In an additional embodiment, the filter 217c can be disposed on the bottom surface of the second substrate 215 to filter blue light. In some embodiments, the filters 217a , 217b , 217c, alone or in combination, comprise a plurality of thin film layers selected according to their optical properties. In the specific exemplary filters 217a , 217b , 217c , it is designed to have blue wave high transmission such that blue LED light is emitted from the light guide plate proximate to the device 200 . The filters also process the high reflection of the red and green waves to reduce back reflection from the quantum dot material 205 back to the light guide.

一個例示性低通濾波器217a217b217c 包括由多層高折射率和低折射率材料製成的薄膜堆層。在一些實施例中,該堆層包括奇數層,在其他實施例中,該堆層包括偶數層。在一些實施例中,該複數層包括2或更多層、3或更多層、4或更多層、5或更多層、6或更多層、7或更多層、8或更多層、9或更多層、10或更多層、11或更多層、12或更多層、13或更多層、14或更多層、15或更多層、16或更多層、17或更多層、18或更多層、19或更多層、20或更多層、21或更多層、22或更多層、23或更多層、24或更多層、25或更多層、26或更多層、27或更多層、28或更多層、29或更多層等。在一實施例中,例示性濾波器包含多個具有適用的高折射率材料和適用的低折射率材料的交替層。例示性高折射率材料包括但不限於Nb2 O5 、Ta2 O5 、TiO2 及其複合氧化物。例示性低折射率材料包括但不限於SiO2 、ZrO2 、HfO2 、Bi2 O3 、La2 O3 、Al2 O3 及其複合氧化物。在一實施例中,如下表1所提供,例示性濾波器包括具有Nb2 O5 和SiO2 總厚度接近1.8µm的交替層,其設計用以透過450nm的光而反射550nm和632nm的光。 1 An exemplary low pass filter 217a , 217b , 217c includes a thin film stack of multiple layers of high refractive index and low refractive index materials. In some embodiments, the stack includes odd layers, and in other embodiments, the stack includes even layers. In some embodiments, the plurality of layers includes 2 or more layers, 3 or more layers, 4 or more layers, 5 or more layers, 6 or more layers, 7 or more layers, 8 or more Layer, 9 or more layers, 10 or more layers, 11 or more layers, 12 or more layers, 13 or more layers, 14 or more layers, 15 or more layers, 16 or more layers, 17 or more layers, 18 or more layers, 19 or more layers, 20 or more layers, 21 or more layers, 22 or more layers, 23 or more layers, 24 or more layers, 25 or More layers, 26 or more layers, 27 or more layers, 28 or more layers, 29 or more layers, and the like. In an embodiment, the exemplary filter comprises a plurality of alternating layers of a suitable high refractive index material and a suitable low refractive index material. Exemplary high refractive index materials include, but are not limited to, Nb 2 O 5 , Ta 2 O 5 , TiO 2 , and composite oxides thereof. Exemplary low refractive index materials include, but are not limited to, SiO 2 , ZrO 2 , HfO 2 , Bi 2 O 3 , La 2 O 3 , Al 2 O 3 , and composite oxides thereof. In one embodiment, as provided in Table 1 below, the exemplary filter includes alternating layers having a total thickness of Nb 2 O 5 and SiO 2 of approximately 1.8 μm designed to reflect light of 550 nm and 632 nm through 450 nm of light. Table 1

7 8 是本揭露的一些實施例的光學效能的圖示說明。參考 7 ,提供垂直入射時來自表1的該濾波器的光學效能。應當注意,描述的實施例提供處於450nm下的高透射性(實線)和超過550~640nm的接近100%反射(虛線)。參考 8 ,提供以50°角入射時來自表1的該濾波器的光學效能。應當注意,描述的實施例提供在高入射角時的藍光的透射性和紅及綠光的反射。 7 and FIG. 8 is a diagram illustrating the optical performance of some embodiments of the present disclosure. Referring to FIG. 7, from the optical performance of the filter 1 of Table providing normal incidence. It should be noted that the described embodiments provide high transmission (solid line) at 450 nm and near 100% reflection (dashed line) over 550-640 nm. Referring to FIG. 8, there is provided an optical filter performance from Table 1 that when the incidence angle at 50 °. It should be noted that the described embodiments provide for the transmission of blue light and the reflection of red and green light at high angles of incidence.

例示性濾波器的實施例能夠用於側照或直照導光板和接近QD材料(即,用作該QD材料和導光板的中間物或如參考 2B 2C 上述)之間。例如,繼續參考 2C ,例示性濾波器217c 能夠提高自該包裝導出光的效率。在其他實施例中,該低通濾波器能夠置於該覆蓋玻璃(例如,第二基板215 )上,從而該UV吸收材料亦為干涉濾波器。特別地,用作高折射率材料的該材料吸收足夠的UV,以啟用本文揭示的該雷射焊接處理。能夠透過本領域已知的任意數目的薄膜法(例如噴射、電漿增強化學氣相沉積等類似方法)沉積該等例示性材料層。該膜或層可直接沉積於該導光板或基板或作為分離層上,之後透過光學透明黏合劑附接。已發現具有該等濾波器的本文描述的實施例(1)引起較高的向前的輸出光,增強該裝置200 或導光板的整個亮度,(2)提高量子點轉換效率,啟用較少的量子點材料,及(3)依靠傳統的薄膜處理技術便於製造。Exemplary embodiments of the filter can be used as direct or edge-lit light guide plate and close to the QD material (i.e., the QD was used as an intermediate material and a light guide plate or the first reference to the above-described FIG. 2B and 2C) between. For example, with continued reference to FIG . 2C , the exemplary filter 217c can increase the efficiency of light extraction from the package. In other embodiments, the low pass filter can be placed on the cover glass (eg, the second substrate 215 ) such that the UV absorbing material is also an interference filter. In particular, the material used as a high refractive index material absorbs sufficient UV to enable the laser welding process disclosed herein. The layers of exemplary materials can be deposited by any number of thin film methods known in the art, such as jet, plasma enhanced chemical vapor deposition, and the like. The film or layer can be deposited directly onto the light guide or substrate or as a separate layer and then attached through an optically clear adhesive. It has been found that the embodiment (1) described herein with such filters causes higher forward output light, enhances the overall brightness of the device 200 or the light guide, (2) improves quantum dot conversion efficiency, enables less Quantum dot materials, and (3) rely on traditional thin film processing techniques to facilitate fabrication.

在一些實施例中,該第一基板210 、第二基板207 和/或第三基板215 能夠選自玻璃基板且可包含本領域已知的用於顯示及其他電子裝置的任意玻璃。適用的玻璃能夠包括但不限於鋁矽酸鹽、鹼性鋁矽酸鹽、硼矽酸鹽、鹼性硼矽酸鹽、鋁硼矽酸鹽、鹼性鋁硼矽酸鹽和其他適宜玻璃。在各種實施例中,該等基板可化學強化和/或熱回火。適用的可購得的基板的非限制性範例包括來自康寧公司的EAGLE XG® 、LotusTM 、IrisTM 、Willow® 和Gorilla® 玻璃等等。根據一些非限制性實施例,透過離子交換的化學強化玻璃可用作基板。In some embodiments, the first substrate 210 , the second substrate 207, and/or the third substrate 215 can be selected from a glass substrate and can include any glass known in the art for display and other electronic devices. Suitable glasses can include, but are not limited to, aluminosilicates, basic aluminosilicates, borosilicates, basic borosilicates, aluminoboronates, basic aluminoborates, and other suitable glasses. In various embodiments, the substrates can be chemically strengthened and/or thermally tempered. Non-limiting examples of suitable commercially available substrates include EAGLE XG ® , Lotus TM , Iris TM , Willow ® , and Gorilla ® glass from Corning Incorporated, and the like. According to some non-limiting embodiments, ion-exchanged chemically strengthened glass can be used as the substrate.

根據各種實施例,該第一、第二、和/或第三玻璃基板201207215 可具有大於約100MPa的壓縮應力和大於約10微米的壓縮應力的層深(DOL)。在進一步的實施例中,該第一、第二、和/或第三玻璃基板可具有大於約500MPa的壓縮應力和大於約20微米的DOL或大於約700MPa的壓縮應力和大於約40微米的DOL。在非限制性實施例中,該第一、第二、和/或第三玻璃基板可具有小於或等於3mm的厚度,例如約0.1mm至約2.5mm、約0.3mm至約2mm、約0.5mm至約1.5mm或約0.7mm至約1mm,其包括其間的所有範圍及子範圍。According to various embodiments, the first, second, and/or third glass substrates 201 , 207 , 215 may have a compressive stress greater than about 100 MPa and a layer depth (DOL) greater than about 10 microns of compressive stress. In a further embodiment, the first, second, and/or third glass substrates can have a compressive stress greater than about 500 MPa and a DOL greater than about 20 microns or a compressive stress greater than about 700 MPa and a DOL greater than about 40 microns. . In a non-limiting embodiment, the first, second, and/or third glass substrates can have a thickness of less than or equal to 3 mm, such as from about 0.1 mm to about 2.5 mm, from about 0.3 mm to about 2 mm, about 0.5 mm. To about 1.5 mm or from about 0.7 mm to about 1 mm, including all ranges and subranges therebetween.

在各種實施例中,該第一、第二、和/或第三玻璃基板可為透明或大致透明。如本文中適用的術語「透明」意欲指示厚度接近1mm的該基板在該光譜(400-700nm)的可見區域內具有大於約80%的透射率。例如,例示性透明基板在可見光範圍內可具有大於約85%的透射率,例如大於約90%或大於約95%,其包括其間的所有範圍及子範圍。在一些實施例中,例示性玻璃基板在紫外光(UV)區域內(200-400nm)可具有大於約50%的透射率,例如大於約55%、大於約60%、大於約65%、大於約70%、大於約75%、大於約80%、大於約85%、大於約90%、大於約95%或大於約99%的透射率,其包括其間的所有範圍及子範圍。In various embodiments, the first, second, and/or third glass substrates can be transparent or substantially transparent. The term "transparent" as used herein is intended to indicate that the substrate having a thickness of approximately 1 mm has a transmittance of greater than about 80% in the visible region of the spectrum (400-700 nm). For example, an exemplary transparent substrate can have a transmittance of greater than about 85%, such as greater than about 90% or greater than about 95%, in the visible range, including all ranges and subranges therebetween. In some embodiments, an exemplary glass substrate can have a transmittance of greater than about 50% in the ultraviolet (UV) region (200-400 nm), such as greater than about 55%, greater than about 60%, greater than about 65%, greater than Transmittance of about 70%, greater than about 75%, greater than about 80%, greater than about 85%, greater than about 90%, greater than about 95%, or greater than about 99%, including all ranges and subranges therebetween.

根據各種實施例,該第二基板207 能夠選自無機基板,例如具有高於玻璃的熱導率的無機基板。例如,適用的無機基板可包括具有相對高的熱導率的基板,例如大於約2.5W/m-K(例如,大於約2.6、3、5、7.5、10、15、20、25、30、40、50、60、70、80、90或100W/m-K),例如,約2.5W/m-K至約100W/m-K之範圍,其包括其間的所有範圍及子範圍。在一些實施例中,該無機基板的熱導率能夠大於100W/m-K,例如約100W/m-K至約300W/m-K之範圍,(例如大於約100、110、120、130、140、150、160、170、180、190、200、210、220、230、240、250、260、270、280、290或300W/m-K),其包括其間的所有範圍及子範圍。According to various embodiments, the second substrate 207 can be selected from an inorganic substrate, such as an inorganic substrate having a thermal conductivity higher than that of glass. For example, suitable inorganic substrates can include substrates having relatively high thermal conductivity, such as greater than about 2.5 W/mK (eg, greater than about 2.6, 3, 5, 7.5, 10, 15, 20, 25, 30, 40, 50, 60, 70, 80, 90 or 100 W/mK), for example, in the range of from about 2.5 W/mK to about 100 W/mK, including all ranges and subranges therebetween. In some embodiments, the thermal conductivity of the inorganic substrate can be greater than 100 W/mK, such as from about 100 W/mK to about 300 W/mK, (eg, greater than about 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200, 210, 220, 230, 240, 250, 260, 270, 280, 290 or 300 W/mK), including all ranges and subranges therebetween.

根據各種實施例,該無機基板能夠包含陶瓷基板,其能夠包括陶瓷或玻璃-陶瓷基板。在非限制性實施例中,該第二基板207 能夠包含氮化鋁、氧化鋁、氧化鈹、氮化硼或碳化矽等等。在一些實施例中,該無機基板的厚度可為約0.1mm至約3mm,例如,約0.2mm至約2.5mm、約0.3mm至約2mm、約0.4mm至約1.5mm、約0.5mm至約1mm、約0.6mm至約0.9mm或約0.7mm至約0.8mm,其包括其間的所有範圍及子範圍。在附加的實施例中,該無機基板在給出的雷射操作波長(例如,在UV波長(200-400nm)下或在可見波長(400-700nm)下)下很少或沒有吸收。例如,該第二無機基板在該雷射的操作波長下可吸收小於約10%,例如小於約5%、小於約3%、小於約2%或小於約1%的吸收,例如約1%至約10%。在一些實施例中,該無機基板可為透明或散射。According to various embodiments, the inorganic substrate can comprise a ceramic substrate that can comprise a ceramic or glass-ceramic substrate. In a non-limiting embodiment, the second substrate 207 can comprise aluminum nitride, aluminum oxide, tantalum oxide, boron nitride, tantalum carbide, or the like. In some embodiments, the inorganic substrate can have a thickness of from about 0.1 mm to about 3 mm, for example, from about 0.2 mm to about 2.5 mm, from about 0.3 mm to about 2 mm, from about 0.4 mm to about 1.5 mm, from about 0.5 mm to about 1 mm, from about 0.6 mm to about 0.9 mm, or from about 0.7 mm to about 0.8 mm, including all ranges and subranges therebetween. In an additional embodiment, the inorganic substrate has little or no absorption at a given laser operating wavelength (eg, at UV wavelengths (200-400 nm) or at visible wavelengths (400-700 nm). For example, the second inorganic substrate can absorb less than about 10%, such as less than about 5%, less than about 3%, less than about 2%, or less than about 1% of absorption at the operating wavelength of the laser, such as about 1% to About 10%. In some embodiments, the inorganic substrate can be transparent or scattering.

在進一步的實施例中,該第二無機基板可摻雜至少一個能夠在預定波長下(例如,在雷射的預定操作波長下)吸收光的摻雜劑。摻雜劑包括例如ZnO、SnO、SnO2 、TiO2 等類似物質。在一些實施例中,該摻雜劑能夠選自在UV波長(200-400nm)下吸收的化合物。該一定量的摻雜劑能夠合併至該無機基板,以足夠誘發該無機基板在預定波長下的吸收。例如,該摻雜劑能夠合併至具有大於約0.05wt%(500ppm)的濃度(例如,約500ppm至約106ppm之範圍)的該無機基板。在一些實施例中,該摻雜劑濃度能夠大於約0.5wt%、大於約1wt%,、大於約2wt%、大於約3wt%、大於約4wt%、大於約5wt%、大於約6wt%、大於約7wt%、大於約8wt%、大於約9wt%或大於約10wt%,其包括其間的所有範圍及子範圍。根據附加的實施例,該摻雜劑可具有大於約10wt%的濃度,例如,約20wt%、30wt%、40wt%、50wt%、60wt%、70wt%、80wt%或90wt%,其包括其間的所有範圍及子範圍。在進一步的實施例中,該摻雜的無機基板可包含約100%的摻雜劑,例如,ZnO陶瓷基板的範例。In a further embodiment, the second inorganic substrate can be doped with at least one dopant capable of absorbing light at a predetermined wavelength (eg, at a predetermined operating wavelength of the laser). The dopant includes, for example, ZnO, SnO, SnO 2 , TiO 2 or the like. In some embodiments, the dopant can be selected from compounds that absorb at UV wavelengths (200-400 nm). The amount of dopant can be incorporated into the inorganic substrate to sufficiently induce absorption of the inorganic substrate at a predetermined wavelength. For example, the dopant can be incorporated into the inorganic substrate having a concentration greater than about 0.05 wt% (500 ppm) (eg, in the range of from about 500 ppm to about 106 ppm). In some embodiments, the dopant concentration can be greater than about 0.5 wt%, greater than about 1 wt%, greater than about 2 wt%, greater than about 3 wt%, greater than about 4 wt%, greater than about 5 wt%, greater than about 6 wt%, greater than About 7 wt%, greater than about 8 wt%, greater than about 9 wt%, or greater than about 10 wt%, including all ranges and subranges therebetween. According to additional embodiments, the dopant may have a concentration greater than about 10 wt%, for example, about 20 wt%, 30 wt%, 40 wt%, 50 wt%, 60 wt%, 70 wt%, 80 wt%, or 90 wt%, including All ranges and sub-ranges. In a further embodiment, the doped inorganic substrate can comprise about 100% dopant, such as an example of a ZnO ceramic substrate.

根據各種實施例,能夠選取該第一、第二、和/或第三基板,從而該等基板的熱膨脹係數(CTE)大致相似。例如,該第三或第二基板的CTE是該第一基板的CTE的50%內,例如,約該第一基板的CTE的40%內、約30%內、約20%內、約15%內、約10%內或約5%內。透過非限制性範例,該第一基板的CTE(在約25-400°C之範圍的溫度下)在約30x10-7 /°C至約90x10-7 /°C之範圍,例如,約40x10-7 /°C至約80x10-7 /°C或約50x10-7 /°C至約60x10-7 /°C (例如約30、35、40、45、50、55、60、65、70、75、80、85或90x10-7 /°C),其包括其間的所有範圍及子範圍。根據非限制性實施例,該玻璃基板可為康寧® Gorilla® 玻璃,其具有約75至約85x10-7 /°C之範圍的CTE或康寧® EAGLE XG® 、LotusTM 或Willow® 玻璃,其具有約30至約50x10-7 /°C之範圍的CTE。該第二基板能夠包含無機,例如,陶瓷或玻璃-陶瓷基板,其(在約25-400°C之範圍的溫度下)具有約20x10-7 /°C至約100x10-7 /°CCTE,例如約30x10-7 /°C至約80x10-7 /°C、約40x10-7 /°C 至約70x10-7 /°C或約50x10-7 /°C至約60x10-7 /°C (例如約20、25、30、35、40、45、50、55、60、65、70、75、80、85、90、95或100x10-7 /°C),其包括其間的所有範圍及子範圍。According to various embodiments, the first, second, and/or third substrates can be selected such that the coefficients of thermal expansion (CTE) of the substrates are substantially similar. For example, the CTE of the third or second substrate is within 50% of the CTE of the first substrate, for example, within about 40%, within about 30%, within about 20%, and about 15% of the CTE of the first substrate. Within, within about 10% or within about 5%. By way of non-limiting example, the CTE of the first substrate (at a temperature in the range of about 25-400 ° C) ranges from about 30 x 10 -7 / ° C to about 90 x 10 -7 / ° C, for example, about 40 x 10 - 7 / ° C to about 80 x 10 -7 / ° C or about 50 x 10 -7 / ° C to about 60 x 10 -7 / ° C (for example about 30, 35, 40, 45, 50, 55, 60, 65, 70, 75 , 80, 85 or 90x10 -7 / ° C), which includes all ranges and sub-ranges therebetween. The non-limiting embodiment, the glass substrate may be a glass Corning ® Gorilla ®, having 85x10 -7 CTE in the range of from about 75 to about / ° C, or of Corning ® EAGLE XG ®, Lotus TM Willow ® or glass, having CTE in the range of from about 30 to about 50 x 10 -7 / °C. The second substrate can comprise an inorganic, for example, ceramic or glass-ceramic substrate having a temperature (at a temperature in the range of about 25-400 ° C) of from about 20 x 10 -7 / ° C to about 100 x 10 -7 / ° CCTE, for example From about 30x10 -7 /°C to about 80x10 -7 /°C, about 40x10 -7 /°C to about 70x10 -7 /°C or about 50x10 -7 /°C to about 60x10 -7 /°C (for example 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95 or 100x10 -7 / ° C), including all ranges and subranges therebetween.

2A-C 將該至少一個空腔209 圖示為具有梯形的橫截面,應當理解,如所需的給出應用,該等空腔能夠具有任意所給形狀或尺寸。例如,該等空腔能夠具有正方形、圓柱形、矩形、半圓形或半橢圓形橫截面或不規則橫截面等等。該第一基板210 或第三基板215 的表面包含至少一個空腔209 (見 5 2C )或該第一或第三及第二基板均包含空腔亦是可能的。作為選擇性地或此外,該第一或第二基板內的空腔能夠填充在可見波長或LED操作波長中的一個或兩者下為透明的材料。 2A-C of FIG. The at least one cavity 209 is illustrated as having a trapezoidal cross-section, it should be understood that, as desired given application, these cavities can have any given shape or size. For example, the cavities can have a square, cylindrical, rectangular, semi-circular or semi-elliptical cross section or irregular cross section, and the like. The third substrate 215 or the surface 210 of the first substrate comprises at least one cavity 209 (see FIG. 2C and 5) or the third or the first and the second substrate contains a cavity is also possible. Alternatively or additionally, the cavity within the first or second substrate can be filled with a material that is transparent at one or both of the visible wavelengths or LED operating wavelengths.

而且, 2A-B 繪示包含單個空腔209 的密封裝置,包含複數個或一列空腔的密封裝置亦易於落在本揭露的範圍內。例如,該密封裝置能夠包含任意數目的空腔209 ,其能夠以包括規則和不規則的圖案的任意所需方式排列和或分隔。進一步地, 2A-B 中的單個空腔209 包含量子點和LED元件,應當理解,該描述是非限制性的。亦可設想一個或多個空腔不包含量子點和/或LED元件的實施例(見 2C )。亦可設想一個或多個空腔包含複數個LED元件和/或量子點的實施例。而且,不需要各空腔包含相同數目或數量的量子點和/或LED元件,這種數量的空腔和不包含量子點和/或LED元件的一些空腔亦是可能的。Further, the FIG. 2A-B shows a sealing apparatus comprising a single cavity 209, comprising a plurality of cavities or a sealing means is also easy to fall within the scope of the present disclosure. For example, the sealing device can comprise any number of cavities 209 that can be arranged and or separated in any desired manner including regular and irregular patterns. Further, a single cavity of FIG. 2A-B 209 and the quantum dot LED elements, it should be understood that this description is non-limiting. Also contemplated that do not contain one or more cavities of the quantum dot and / or LED elements (see FIG second 2C). Embodiments in which one or more cavities comprise a plurality of LED elements and/or quantum dots are also contemplated. Moreover, it is not necessary for each cavity to contain the same number or number of quantum dots and/or LED elements, such a number of cavities and some cavities that do not contain quantum dots and/or LED elements are also possible.

該至少一個空腔209 能夠具有任意所給深度,例如,封裝於該空腔內的物件(例如,量子點和/或LD)的類型和/或形狀和/或數目選取合適。透過非限制性實施例,該至少一個空腔209 能夠延伸至該第一和/或第二基板內小於約1mm的深度,例如小於約0.5mm、小於約0.4mm、小於約0.3mm、小於約0.2mm、小於約0.1mm、小於約0.05mm、小於約0.02mm或小於約0.01mm,其包含其間的所有範圍及子範圍,例如約0.01mm至約1mm之範圍。亦可設想能夠使用一列空腔,與該列中的其他空腔相比,各空腔具有相同或不同的深度,相同或不同的形狀和/或相同或不同的尺寸。The at least one cavity 209 can have any given depth, for example, the type and/or shape and/or number of articles (eg, quantum dots and/or LDs) encapsulated within the cavity are suitably selected. By way of non-limiting example, the at least one cavity 209 can extend to a depth of less than about 1 mm within the first and/or second substrate, such as less than about 0.5 mm, less than about 0.4 mm, less than about 0.3 mm, less than about 0.2 mm, less than about 0.1 mm, less than about 0.05 mm, less than about 0.02 mm, or less than about 0.01 mm, including all ranges and subranges therebetween, such as from about 0.01 mm to about 1 mm. It is also conceivable to be able to use a column of cavities having the same or different depths, the same or different shapes and/or the same or different dimensions compared to the other cavities in the column.

在一些實施例中,該至少一個空腔209 能夠包含至少一個量子點205 。依據發射光的所需波長,量子點能夠具有不同的形狀和/或尺寸。例如,發射光的頻率隨著該量子點的尺寸的減小而增加,例如,隨著該量子點的尺寸的增加,該發射光的顏色能夠自紅色轉變為藍色。當用藍、UV或接近UV光輻射時,量子點可將該光轉換為較長波長的紅、黃、綠或藍光。根據各種實施例,該量子點能夠選自紅色和綠色量子點,當用藍、UV或接近UV光輻射時,其在紅色和綠色波長下發射。例如,該LED元件能夠發射藍光(接近450-490nm)、UV光(接近200-400nm)或接近UV光(接近300-450nm)。In some embodiments, the at least one cavity 209 can comprise at least one quantum dot 205 . The quantum dots can have different shapes and/or sizes depending on the desired wavelength of the emitted light. For example, the frequency of the emitted light increases as the size of the quantum dot decreases, for example, as the size of the quantum dot increases, the color of the emitted light can change from red to blue. When irradiated with blue, UV or near UV light, the quantum dots can convert the light into longer wavelength red, yellow, green or blue light. According to various embodiments, the quantum dots can be selected from red and green quantum dots that emit at red and green wavelengths when irradiated with blue, UV or near UV light. For example, the LED element can emit blue light (near 450-490 nm), UV light (close to 200-400 nm), or near UV light (near 300-450 nm).

此外,該至少一個空腔能夠包含相同或不同類型的量子點,例如發射不同波長的量子點是可能的。例如,在一些實施例中,空腔能夠包含發射綠色和紅色波長的量子點,以在該空腔內產生紅-綠-藍(RGB)光譜。然而,根據其他實施例,單個空腔包含僅發射相同波長的量子點是可能的,例如包含僅綠色量子點的空腔或包含僅紅色量子點的空腔。例如,該密封裝置能夠包含一列空腔,其中該等空腔的將近三分之一由綠色量子點填充且該等空腔的將近三分之一由紅色量子點填充,而該等空腔的將近三分之一保持空白(以發射藍光)。利用這種組態,該整個陣列能夠產生RGB光譜,亦提供各單個顏色的動態調光。Furthermore, the at least one cavity can comprise the same or different types of quantum dots, for example it is possible to emit quantum dots of different wavelengths. For example, in some embodiments, the cavity can contain quantum dots that emit green and red wavelengths to produce a red-green-blue (RGB) spectrum within the cavity. However, according to other embodiments, it is possible for a single cavity to contain quantum dots that only emit the same wavelength, such as a cavity containing only green quantum dots or a cavity containing only red quantum dots. For example, the sealing device can comprise a series of cavities, wherein nearly one third of the cavities are filled with green quantum dots and nearly one third of the cavities are filled with red quantum dots, and the cavities Nearly one-third remain blank (to emit blue light). With this configuration, the entire array is capable of producing RGB spectra, as well as dynamic dimming of individual colors.

當然,應該理解,包含任意類型、顏色或數目的任意比例的量子點是可能的且可設想為落入本揭露的範圍內。本領域具有通常知識者有能力選取這種組態的空腔或該等空腔和該等類型和數目的量子點,以置於各空腔內,以實現所需效果。而且,儘管本文論述顯示裝置的紅色和綠色量子點的裝置,應當理解,能夠使用任意類型的量子點,其能夠發射任意波長的光,包括但不限於紅色、橘色、黃色、綠色、藍色或該可見光譜中的任意其它顏色(例如,400-700nm)。Of course, it should be understood that quantum dots of any ratio, color or number of any number are possible and are contemplated as falling within the scope of the present disclosure. Those of ordinary skill in the art have the ability to select such configured cavities or such cavities and the types and numbers of quantum dots to be placed within each cavity to achieve the desired effect. Moreover, although a device for displaying red and green quantum dots of a device is discussed herein, it should be understood that any type of quantum dot capable of emitting light of any wavelength, including but not limited to red, orange, yellow, green, blue, can be used. Or any other color in the visible spectrum (eg, 400-700 nm).

例示性量子點能夠具有各種形狀。量子點的形狀的範例包括但不限於球體、棒、盤狀、四腳體、其他形狀和/或其混合。例示性量子點亦能夠包含在聚合物樹脂內,例如但不限於丙烯酸鹽或另一適用的聚合物或單體內。這種例示性樹脂亦可包括適用的分散顆粒,包括但不限於TiO2 或類似顆粒。Exemplary quantum dots can have a variety of shapes. Examples of shapes of quantum dots include, but are not limited to, spheres, rods, discs, tetrapods, other shapes, and/or mixtures thereof. Exemplary quantum dots can also be included in the polymer resin such as, but not limited to, acrylate or another suitable polymer or monomer. Such exemplary resins may also include suitable dispersed particles including, but not limited to, TiO 2 or similar particles.

在一些實施例中,量子點包含無機半導體材料,其允許可溶性和具有無機半導體的高效率和穩定性的聚合物的加工性的組合。相比於其有機半導體類似物,無機半導體量子點一般在存在水蒸汽和氧氣時更穩定。如上述,因為其量子限制發射屬性,其冷光為極窄的波帶且產生由單個高斯光譜表徵的高度飽和的色光。因為微晶徑控制該量子點光學帶隙,透過合成和結構改變能夠實現吸收和發射波長的微調。In some embodiments, the quantum dots comprise an inorganic semiconductor material that allows for a combination of solubility and processability of the polymer having high efficiency and stability of the inorganic semiconductor. Inorganic semiconductor quantum dots are generally more stable in the presence of water vapor and oxygen than their organic semiconductor analogs. As mentioned above, because of its quantum confinement emission properties, its luminescence is a very narrow band and produces highly saturated color light characterized by a single Gaussian spectrum. Since the microcrystal diameter controls the optical band gap of the quantum dot, fine adjustment of the absorption and emission wavelengths can be achieved through synthesis and structural changes.

在一些實施例中,無機半導體微晶量子點包括IV族元素、II-VI族化合物、II-V族化合物、III-VI族化合物、III-V族化合物、IV-VI族化合物、I-III-VI族化合物、II-IV-VI族化合物或II-IV-V族化合物、其合金和/或其混合物,其包括四元和三元合金和/或混合物。範例包括但不限於ZnO、ZnS、ZnSe、ZnTe、CdO、CdS、CdSe、CdTe、HgO、HgS、HgSe、HgTe、AlN、AlP、AlAs、AlSb、GaN、GaP、GaAs、GaSb、GaSe、InN、InP、InAs、InSb、TlN、TlP、TlAs、TlSb、PbO、PbS、PbSe、PbTe、其合金、和/或其混合物,其包括四元和三元合金和/或混合物。In some embodiments, the inorganic semiconductor microcrystalline quantum dots comprise a Group IV element, a II-VI compound, a II-V compound, a III-VI compound, a III-V compound, an IV-VI compound, and I-III. a Group VI compound, a Group II-IV-VI compound or a Group II-IV-V compound, an alloy thereof and/or mixtures thereof, including quaternary and ternary alloys and/or mixtures. Examples include, but are not limited to, ZnO, ZnS, ZnSe, ZnTe, CdO, CdS, CdSe, CdTe, HgO, HgS, HgSe, HgTe, AlN, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, GaSe, InN, InP InAs, InSb, TlN, TlP, TlAs, TlSb, PbO, PbS, PbSe, PbTe, alloys thereof, and/or mixtures thereof, including quaternary and ternary alloys and/or mixtures.

在一些實施例中,量子點能夠包括在該量子點的至少部分表面的上方的殼。該結構又稱作核-殼結構。該殼能夠包含無機材料,更優選地無機半導體材料,無機殼能夠鈍化表面電子態至比有機覆蓋基團更遠的範圍。用於殼內的無機半導體材料包括但不限於IV族元素、II-VI族化合物、II-V族化合物、III-VI族化合物、III-V族化合物、IV-VI族化合物、I-III-VI族化合物、II-IV-VI族化合物或II-IV-V族化合物、其合金和/或其混合物,其包括四元和三元合金和/或混合物。範例包括但不限於ZnO、ZnS、ZnSe、ZnTe、CdO、CdS、CdSe、CdTe、HgO、HgS、HgSe、HgTe、AlN、AlP、AlAs、AlSb、GaN、GaP、GaAs、GaSb、GaSe、InN、InP、InAs、InSb、TlN、TlP、TlAs、TlSb、PbO、PbS、PbSe、PbTe、其合金、和/或其混合物,其包括四元和三元合金和/或混合物。In some embodiments, a quantum dot can include a shell above at least a portion of a surface of the quantum dot. This structure is also known as a core-shell structure. The shell can comprise an inorganic material, more preferably an inorganic semiconductor material, which is capable of passivating the surface electronic state to a range further than the organic covering group. Inorganic semiconductor materials for use in the shell include, but are not limited to, Group IV elements, Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, I-III- Group VI compounds, Group II-IV-VI compounds or Group II-IV-V compounds, alloys thereof and/or mixtures thereof, including quaternary and ternary alloys and/or mixtures. Examples include, but are not limited to, ZnO, ZnS, ZnSe, ZnTe, CdO, CdS, CdSe, CdTe, HgO, HgS, HgSe, HgTe, AlN, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, GaSe, InN, InP InAs, InSb, TlN, TlP, TlAs, TlSb, PbO, PbS, PbSe, PbTe, alloys thereof, and/or mixtures thereof, including quaternary and ternary alloys and/or mixtures.

在一些實施例中,量子點材料能夠包括II-VI族半導體,其包括CdSe、CdS和CdTe,且能夠用於橫跨帶有較窄分佈和高發射量子效率的整個可見光譜發射。例如,約2nm直徑的CdSe量子點在藍光下發射而8nm直徑的顆粒在紅光下發射。透過替代帶有不同帶隙的其他半導體材料將該量子點組成物改變為合成物改變該電磁光譜的區域,其中能夠調諧該量子點發射。在其他實施例中,該量子點材料無鎘。無鎘量子點材料的範例包括InP和Inx Gax-1 P。在製備Inx Gax-1 P的方法的範例中,InP能夠摻雜少量Ga,以將帶隙轉移至高能量,從而進入稍藍於紅/綠光的波長。在用於製備該三元材料的另一方法的範例中,GaP能夠摻雜In以進入稍紅於深藍光的波長。InP具有1.27eV的直接塊帶隙,其能夠在超過摻雜2eV的Ga的情況下調諧。僅包含InP的量子點材料能夠提供自黃/綠至深紅的調諧的發射,在InP中添加少量Ga能夠利於將該發射調諧至深綠/淺綠。包含Inx Gax-1 P(0<x<1)的量子點材料能夠提供光發射,若不是整個可見光譜,其在超過可見光譜的至少較大部分可調諧。InP/ZnSeS核-殼量子點能夠自深紅諧調至具有70%之高的效率的黃光。對於高CRI白QD-LED發射器來說,InP/ZnSeS能夠用於將該可見光譜的紅光部分處理成至黃/綠部分且Inx Gax-1 P將提供深綠至淺綠光的發射。In some embodiments, the quantum dot material can comprise a Group II-VI semiconductor, including CdSe, CdS, and CdTe, and can be used to emit across the entire visible spectrum with narrower distribution and high emission quantum efficiency. For example, a CdSe quantum dot of about 2 nm diameter is emitted under blue light and an 8 nm diameter particle is emitted under red light. The quantum dot composition is changed to a region where the composition changes the electromagnetic spectrum by replacing other semiconductor materials with different band gaps, wherein the quantum dot emission can be tuned. In other embodiments, the quantum dot material is cadmium free. Examples of cadmium-free quantum dot materials include InP and In x Ga x-1 P. In an example of a method of preparing In x Ga x-1 P, InP can be doped with a small amount of Ga to transfer the band gap to high energy, thereby entering a wavelength slightly blue to red/green light. In an example of another method for preparing the ternary material, GaP can be doped with In to enter a wavelength that is slightly redder than the deep blue light. InP has a direct block band gap of 1.27 eV, which can be tuned with Ga exceeding 2eV doping. Quantum dot materials containing only InP are capable of providing tuned emission from yellow/green to deep red, and the addition of a small amount of Ga in InP can facilitate tuning the emission to dark green/light green. Quantum dot materials comprising In x Ga x-1 P (0 < x < 1) are capable of providing light emission, which, if not the entire visible spectrum, is tunable over at least a larger portion of the visible spectrum. InP/ZnSeS core-shell quantum dots can be tuned from deep red to yellow light with 70% efficiency. For high CRI white QD-LED emitters, InP/ZnSeS can be used to process the red portion of the visible spectrum to the yellow/green portion and In x Ga x-1 P will provide dark green to light green emission.

在一些實施例中,例如,見 2A 2B / 2C ,該量子點材料能夠提供在預定光譜中可調諧的發射。例如,可選取例示性量子點材料,從而自其發射僅在單個光譜內,例如但不限於紅色光譜,例如,約620nm至約750nm。當然,可選取例示性單個波長量子點材料,從而當透過接近光源(例如該至少一個LED元件203 )的激發,發射其他光譜(例如,308-450nm的紫光、450-495nm的藍光、495-570nm的綠光、570-590nm的黃光和590-620nm的橘光)。在其他實施例中,該等量子點材料能夠提供在其他光譜中的可調諧發射,例如但不限於紅外光譜(例如,700nm至1mm)或紫外光譜(例如,10nm至380nm)。In some embodiments, e.g., see section 2A, 2B and / or 2C, the quantum dot material can be provided in the predetermined spectrum emission tunable. For example, an exemplary quantum dot material can be selected such that it is emitted from only a single spectrum, such as, but not limited to, a red spectrum, for example, from about 620 nm to about 750 nm. Of course, an exemplary single wavelength quantum dot material can be selected such that when excited by a proximity source (eg, the at least one LED element 203 ), other spectra are emitted (eg, 308-450 nm violet, 450-495 nm blue, 495-570 nm). Green light, yellow light at 570-590 nm and orange light at 590-620 nm). In other embodiments, the quantum dot materials are capable of providing tunable emission in other spectra, such as, but not limited to, infrared (eg, 700 nm to 1 mm) or ultraviolet (eg, 10 nm to 380 nm).

該第一基板201 的第一表面和該第二基板207 的第二表面透過密封或焊接211 接合。該密封211 能夠環繞該至少一個空腔209 延伸,從而在該空腔內密封該工件。例如,如 2A-B 所示,該密封能夠在該相同的空腔內封裝該至少一個量子點205 和該至少一個LED元件203 。在多個空腔的情況中,該密封能夠環繞單個空腔延伸,例如,該列中的各空腔彼此分離,以產生一個或多個離散的密封區域或袋,或該密封能夠環繞多個空腔延伸,例如,兩個或更多空腔,例如三、四、五、十或更多空腔等。包含一個或多個空腔的該密封裝置亦是可能的,該一個或多個空腔亦可根據所需(例如,缺乏LED和/或量子點的空腔的情況中)不被密封。因此,應當理解,各種空腔能夠是空的或缺乏量子點和/或LED,該等空的空腔從而因合適或所需被密封或不密封。在一些實施例中,該密封211 能夠包含如上述的共同未決的美國專利申請第13/777 ,584、13/891,291、14/270,828和14/271,797號的玻璃-至-玻璃密封、玻璃-至-玻璃-陶瓷密封或玻璃-至-陶瓷密封,其所有經由引用其全文將其內容併入本文。The first surface of the first substrate 201 and the second surface of the second substrate 207 are bonded by sealing or soldering 211 . The seal 211 can extend around the at least one cavity 209 to seal the workpiece within the cavity. For example, as shown, the quantum dot 205 can be sealed and the at least one LED element 203 of FIG. 2A-B in the same cavity of the at least one package. In the case of a plurality of cavities, the seal can extend around a single cavity, for example, the cavities in the column are separated from one another to create one or more discrete sealing areas or pockets, or the seal can encircle multiple The cavity extends, for example, two or more cavities, such as three, four, five, ten or more cavities, and the like. It is also possible to include the sealing means comprising one or more cavities which may also be unsealed depending on the desired (for example, in the absence of a cavity of LEDs and/or quantum dots). Thus, it should be understood that the various cavities can be empty or lack quantum dots and/or LEDs that are thus sealed or unsealed as appropriate or desired. In some embodiments, the seal 211 can comprise U.S. Patent Application No. 13/777, glass as described in co-pending 584,13 / 891,291,14 / 270,828 and No. 14 / 271,797 - to - sealing glass, glass - to - glass-ceramic or glass-to-ceramic seals, the contents of which are hereby incorporated by reference in its entirety.

在其他非限制性實施例中,該裝置能夠包含設置於該第一和第二基板之間並連接其的密封層。例如,如 3 所示,該密封材料或層315 能夠接觸該第一基板301 的至少一部分第一表面317 和該第二基板307 的至少一部分第二表面319 。能夠例如自在預定雷射操作波長和/或相對低的玻璃轉化溫度(Tg )下具有大於10%的吸收的玻璃組成物選取該密封層315 。根據各種實施例,能夠自硼酸鹽玻璃、磷酸鹽玻璃、亞碲酸鹽玻璃和硫族玻璃(例如錫磷酸鹽玻璃、錫氟磷酸鹽玻璃和錫氟硼酸鹽玻璃)中選取該密封層。In other non-limiting embodiments, the device can include a sealing layer disposed between and coupled to the first and second substrates. At least a portion of the first surface of the second substrate 317 and at least a portion of the second surface 307 of the example, as shown, the sealing material layer 315 or the first substrate 301 can be in contact with the third 319 in FIG. The sealing layer 315 can be selected, for example, from a glass composition having an absorption of greater than 10% at a predetermined laser operating wavelength and/or a relatively low glass transition temperature ( Tg ). According to various embodiments, the sealing layer can be selected from borate glass, phosphate glass, tellurite glass, and chalcogenide glass (eg, tin phosphate glass, tin fluorophosphate glass, and tin fluoroborate glass).

一般來說,適用的密封層材料能夠包括低Tg 玻璃和銅或錫的適用地反應性氧化物。透過非限制性範例,該密封層能夠包含具有低於或等於約400°C的Tg 的玻璃。例如,低於或等於約350°C、約300°C、約250°C或約200°C,其包括其間的所有範圍及子範圍,例如約200°C至約400°C之範圍。揭示了適用的密封層和方法,例如美國專利申請第13/777,584、13/891,291、14/270,828和14/271,797號,其所有經由引用其全文將其內容併入本文。In general, suitable sealing layer materials can include low Tg glass and suitable reactive oxides of copper or tin. By way of non-limiting example, the sealing layer can comprise glass having a Tg of less than or equal to about 400 °C. For example, less than or equal to about 350 ° C, about 300 ° C, about 250 ° C, or about 200 ° C, including all ranges and subranges therebetween, such as from about 200 ° C to about 400 ° C. Suitable sealing layers and methods are disclosed, for example, in U.S. Patent Application Serial Nos. 13/777,584, 13/891,291, 14/270,828, and the entire disclosures of which are incorporated herein by reference.

該密封層315 的厚度能夠依據本申請而變化,在一些實施例中,在約0.1微米至約10微米之範圍,例如小於約5微米、小於約3微米、小於約2微米、小於約1微米、小於約0.5微米或小於約0.2微米,其包括其間的所有範圍及子範圍。在各種實施例中,該密封層315 在該雷射操作波長下(室溫下)能夠具有大於約10%、大於約15%、大於約20%、大於約25%、大於約30%、大於約35%、大於約40%、大於約45%或大於約50%的吸收,其包括其間的所有範圍及子範圍,例如約10%至約50%。例如,該密封層能夠在UV波長(200-400nm)下吸收,例如,具有大於約10%的吸收。在一些實施例中,該密封層對可見光可為透明或大致透明,例如,在光譜的可見區(400-700nm)具有大於約80%的透射率。The thickness of the sealing layer 315 can vary depending on the application, in some embodiments, in the range of from about 0.1 microns to about 10 microns, such as less than about 5 microns, less than about 3 microns, less than about 2 microns, less than about 1 micron. Less than about 0.5 microns or less than about 0.2 microns, including all ranges and subranges therebetween. In various embodiments, the sealing layer 315 can have greater than about 10%, greater than about 15%, greater than about 20%, greater than about 25%, greater than about 30%, greater than the laser operating wavelength (at room temperature). An absorption of about 35%, greater than about 40%, greater than about 45%, or greater than about 50%, including all ranges and subranges therebetween, such as from about 10% to about 50%. For example, the sealing layer can absorb at UV wavelengths (200-400 nm), for example, having an absorption greater than about 10%. In some embodiments, the sealing layer can be transparent or substantially transparent to visible light, for example, having a transmittance of greater than about 80% in the visible region of the spectrum (400-700 nm).

3 所示,該密封層315 能夠在該第一和第二基板310307 之間包含連續板或層。例如,該密封層315 能夠覆蓋至該第一表面317 或第二表面319 上,從而該密封層覆蓋該至少一個空腔(未示出)。在該等實施例中,該密封層315 在可見波長下為大致透明且在UV波長(或任意其他預定雷射操作波長)下吸收。或者,如 4A-B 所示,能夠提供該密封層415 ,從而其在該空腔(未示出)的周圍形成框架。該密封層能夠以任意所需形狀或圖案應用於該第一基板401 (如 4B 所示)或該第二基板407 4B 中未示出)。在該等實施例中,該密封層415 在可見波長下為大致透明或在可見波長下吸收和/或大致透明或在UV波長(或任意其他預定雷射操作波長)下吸收。例如,能夠選取該雷射在任意波長下操作,其中該密封層在吸收且該第一基板未吸收。當然,該密封層315415 能夠具有依據該基板和/或空腔形狀如特定申請所需的任意形狀。As the sealing layer 315 can be in the first and second substrate 310, or a layer comprising a continuous sheet between the section 307 shown in FIG. 3. For example, the sealing layer 315 can cover the first surface 317 or the second surface 319 such that the sealing layer covers the at least one cavity (not shown). In such embodiments, the sealing layer 315 is substantially transparent at the visible wavelength and is absorbed at the UV wavelength (or any other predetermined laser operating wavelength). Alternatively, as shown on FIG. 4A-B, the sealing layer 415 can be provided, so that it is formed around the frame (not shown) of the cavity. The sealing layer can be any desired shape or pattern applied to the first substrate 401 (as shown in FIG. 4B) or the second substrate 407 (not shown in Figure 4B). In such embodiments, the sealing layer 415 is substantially transparent at the visible wavelength or absorbs and/or substantially transparent at the visible wavelength or absorbs at the UV wavelength (or any other predetermined laser operating wavelength). For example, the laser can be selected to operate at any wavelength, wherein the sealing layer is absorbing and the first substrate is not absorbed. Of course, the sealing layers 315 , 415 can have any shape as desired for a particular application depending on the substrate and/or cavity shape.

2A-B 所示的該第一和第二基板之間的該密封211 能夠透過如 3-4 所示的該密封層315415 形成。例如,在所給波長下操作的雷射光束能夠引導至該密封層(或密封介面),以在該兩個基板之間形成密封或焊接。不希望受理論所限制,應當相信,該密封層對來自該雷射光束的光的吸收和該第一和第二基板誘發的瞬時吸收能夠引起局部加熱(例如,接近該第一基板的Tg 的溫度)和該第一密封層和/或玻璃基板的融化,以形成該兩個基板之間的黏結。根據各種實施例,該密封或焊接211 能夠具有約10微米至約300微米之範圍的寬度,例如約25微米至約250微米、約50微米至約200微米、或約100微米至約150微米,其包含期間的所有範圍及其子範圍。As shown in FIG. 2A-B of the seal between the first and the second substrate 211 can, the seal 415 is formed through the layer 315 as shown in Fig 3-4. For example, a laser beam operating at a given wavelength can be directed to the sealing layer (or sealing interface) to form a seal or weld between the two substrates. Without wishing to be bound by theory, it is believed that the absorption of light from the laser beam by the sealing layer and the transient absorption induced by the first and second substrates can cause localized heating (eg, proximity to the Tg of the first substrate ) The temperature) and the first sealing layer and/or the glass substrate are melted to form a bond between the two substrates. According to various embodiments, the seal or weld 211 can have a width in the range of from about 10 microns to about 300 microns, such as from about 25 microns to about 250 microns, from about 50 microns to about 200 microns, or from about 100 microns to about 150 microns, It contains all the ranges of the period and its sub-ranges.

在各種實施例中,如本文所揭示,該第一和第二基板能夠密封至一起,以產生環繞該至少一個空腔的密封或焊接。在某些實施例中,該密封或焊接可為封閉的密封,例如,在該裝置內形成一個或多個氣密和/或防水袋。例如,至少一個空腔能夠為封閉密封,從而該空腔為不透或大致不透水、濕氣、空氣和/或其他污染物。透過非限制性實施例,封閉密封能夠組態用以限制氧氣的蒸騰(擴散)小於約10-2 cm3 /m2 /天(例如,小於約10-3 /cm3 /m2 /天)且限制水的蒸騰約10-2 g/m2 /天(例如,小於約10-3 、10-4 、10-5 或10-6 g/m2 /天)。在各種實施例中,封閉密封能夠大致防止水、濕氣和/或空氣接觸該封閉密封保護的該等元件。In various embodiments, as disclosed herein, the first and second substrates can be sealed together to create a seal or weld around the at least one cavity. In some embodiments, the seal or weld can be a closed seal, for example, forming one or more airtight and/or waterproof pockets within the device. For example, the at least one cavity can be a closed seal such that the cavity is impermeable or substantially impervious to moisture, moisture, air, and/or other contaminants. By way of non-limiting example, the hermetic seal can be configured to limit the transpiration (diffusion) of oxygen to less than about 10 -2 cm 3 /m 2 /day (eg, less than about 10 -3 /cm 3 /m 2 /day) And limiting the transpiration of water by about 10 -2 g/m 2 /day (eg, less than about 10 -3 , 10 -4 , 10 -5 , or 10 -6 g / m 2 /day). In various embodiments, the closure seal can substantially prevent water, moisture, and/or air from contacting the components of the enclosed seal protection.

根據某些態樣,該密封裝置的總厚度能夠小於約6mm,例如小於約5mm、小於約4mm、小於約3mm、小於約2mm、小於約1.5mm、小於約1mm或小於約0.5mm,其包括其間的所有範圍及子範圍。例如,該密封裝置的厚度能夠為約0.3mm至約3mm之範圍,例如約0.5mm至約2.5mm、或約1mm至約2mm,其包括其間的所有範圍及子範圍。According to some aspects, the total thickness of the sealing device can be less than about 6 mm, such as less than about 5 mm, less than about 4 mm, less than about 3 mm, less than about 2 mm, less than about 1.5 mm, less than about 1 mm, or less than about 0.5 mm, including All ranges and sub-ranges in between. For example, the thickness of the sealing device can range from about 0.3 mm to about 3 mm, such as from about 0.5 mm to about 2.5 mm, or from about 1 mm to about 2 mm, including all ranges and subranges therebetween.

本文揭示的該等密封裝置可用於各種顯示裝置或顯示元件中,其包括但不限於背光或背光式顯示器,例如電視、電腦監視器、手持裝置等類似裝置,其能夠包含各種附加元件。本文揭示的該等密封裝置亦可用作照明裝置,例如燈具和固態照明設備。例如,包含與至少一個LED管芯接觸的量子點的密封裝置能夠用於一般的燈飾,例如,模擬態樣的寬帶輸出。這種照明設備能夠包含例如在各種波長(例如,400-700nm之範圍的波長)下發射的各種尺寸的量子點。The sealing devices disclosed herein can be used in a variety of display devices or display elements including, but not limited to, backlights or backlit displays, such as televisions, computer monitors, handheld devices, and the like, which can include a variety of additional components. The sealing devices disclosed herein can also be used as lighting devices, such as luminaires and solid state lighting devices. For example, a sealing device comprising quantum dots in contact with at least one LED die can be used for general lighting, for example, a broadband output of a simulated aspect. Such illumination devices can include quantum dots of various sizes, for example, emitted at various wavelengths (eg, wavelengths in the range of 400-700 nm).

本文亦揭示了包含雷射二極管的密封裝置,該等裝置包含玻璃基板,該玻璃基板包含第一表面;無機基板,其包含第二表面;密封層,其與至少一部分該第一表面和至少一部分該第二表面接觸;及至少一個密封,其透過該密封層將該玻璃基板黏結至該無機基板,其中,該無機基板具有至少2.5W/m-K的熱導率,其中,該第一或第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個雷射二極管,且其中,該密封環繞該至少一個空腔延伸。封閉封裝的雷射二極管在光學裝置、印表機等類似裝置中很有用。Also disclosed herein are sealing devices comprising laser diodes, the devices comprising a glass substrate comprising a first surface; an inorganic substrate comprising a second surface; a sealing layer with at least a portion of the first surface and at least a portion The second surface is in contact with; and at least one seal that bonds the glass substrate to the inorganic substrate through the sealing layer, wherein the inorganic substrate has a thermal conductivity of at least 2.5 W/mK, wherein the first or second At least one of the surfaces includes at least one cavity including at least one laser diode, and wherein the seal extends around the at least one cavity. Closed-packaged laser diodes are useful in optical devices, printers, and the like.

參考 5 ,例示性密封裝置500 能夠包含第一玻璃基板501 和透過密封511 密封至一起的第二無機基板507 ,以形成至少一個空腔509 。雷射二極管521 或其他發光結構能夠封裝於可選地在支援件523 上的該空腔內。在一些實施例中,能夠使用該支援件523 ,以在所需的該密封包裝內調整該雷射二極管521 的高度,以在預定區域或該第一玻璃基板501 的窗口525 發射光。例示性雷射二極管能夠包括半導體材料,例如氮化鎵、砷化鎵、砷化鎵鋁、銻化鎵和磷化銦等等。雷射二極管能夠發射具有任意波長的光,例如可見(~400-700nm)和紅外(~700-1400nm)波。在一些實施例中,該雷射二極管可發射在約400nm至約670nm之範圍波長的藍或綠光。Referring to FIG . 5 , the exemplary sealing device 500 can include a first glass substrate 501 and a second inorganic substrate 507 sealed together through a seal 511 to form at least one cavity 509 . A laser diode 521 or other light emitting structure can be packaged within the cavity, optionally on the support member 523 . In some embodiments, the support member 523 can be used to adjust the height of the laser diode 521 within the desired sealed package to emit light at a predetermined area or window 525 of the first glass substrate 501 . Exemplary laser diodes can include semiconductor materials such as gallium nitride, gallium arsenide, aluminum gallium arsenide, gallium antimonide, and indium phosphide. Laser diodes are capable of emitting light of any wavelength, such as visible (~400-700 nm) and infrared (~700-1400 nm) waves. In some embodiments, the laser diode can emit blue or green light having a wavelength in the range of from about 400 nm to about 670 nm.

應當理解,揭示的關於密封裝置200 (包含QD/LED)的實施例能夠不受限制地合併至密封裝置500 (包含LD)內。例如,該第一玻璃基板501 和第二無機基板507 能夠選自相似的材料且能夠具有與如 2 A-B 中分別所述的基板201207 相似的屬性。相似地,能夠利用上述關於 3 -4 中的相似密封層315415 和圖案以相似於上述的密封211 的方式形成該密封511 。而且,該空腔509 能夠具有相似於參考 2A-B 中所示和所述的空腔209 的形狀和屬性。It should be understood that the disclosed embodiments relating to the sealing device 200 (including the QD/LED) can be incorporated into the sealing device 500 (including the LD) without limitation. For example, 507 can be selected from a material similar to the first and the second glass substrate 501 can have the inorganic substrate and the second as in FIG. 2 A-B, respectively, of the substrate 201,207 and similar properties. Similarly, similar to the above can be utilized on the sealing layer 315 of FIG. 3-4, and a pattern 415 in a similar manner as described above to form a seal 211. The seal 511. Further, the cavity 509 can be similar to that shown in and with reference to the FIG. 2A-B of the cavity 209 and the shape properties.

本文進一步揭示了包含玻璃基板的密封裝置,該玻璃基板包含第一表面,該摻雜的無機基板包含第二表面;及至少一個密封,其將該玻璃基板黏結至該摻雜的無機基板,其中,該摻雜的無機基板包含大於約2.5W/m-K的熱導率及至少約0.05wt%的選自ZnO、SnO、SnO2 或TiO2 中的至少一個摻雜劑。在一些實施例中,該玻璃基板可黏結至該無機基板或可透過密封層黏結。Further disclosed herein is a sealing device comprising a glass substrate comprising a first surface, the doped inorganic substrate comprising a second surface; and at least one seal bonding the glass substrate to the doped inorganic substrate, wherein The doped inorganic substrate comprises a thermal conductivity greater than about 2.5 W/mK and at least about 0.05 wt% of at least one dopant selected from the group consisting of ZnO, SnO, SnO 2 or TiO 2 . In some embodiments, the glass substrate can be bonded to the inorganic substrate or bonded through a sealing layer.

參考 6 ,例示性密封裝置600 能夠包含第一玻璃基板601 和透過密封611 密封至一起的摻雜的無機基板607 。儘管未圖示,該第一或第二基板中的一個或兩者能夠包含至少一個空腔。該至少一個空腔能夠包含任意適用的工件,其包括但不限於量子點、LED、雷射二極管或任意其它發光裝置。例如,該密封裝置600 能夠包含空腔,該空腔包括如 2A-B 所示的至少一個量子點和至少一個LED或如 5 所示的雷射二極管等。Referring to FIG . 6 , an exemplary sealing device 600 can include a first glass substrate 601 and a doped inorganic substrate 607 sealed together by a seal 611 . Although not shown, one or both of the first or second substrates can comprise at least one cavity. The at least one cavity can comprise any suitable workpiece including, but not limited to, quantum dots, LEDs, laser diodes, or any other illumination device. For example, the sealing device 600 can comprise a cavity, the cavity comprising a laser diode as shown in FIG. 2A-B of the at least one quantum dot and at least one LED, or as shown in FIG. 5 and the like.

應當理解,揭示的關於密封裝置200 (包含QD/LED)和500 的實施例能夠不受限制地合併至密封裝置600 內。例如,該第一玻璃基板601 和第二無機基板607 能夠選自相似的材料且能夠具有與如 2 A-B 中分別所述的基板201207 相似的屬性。例如,該摻雜的無機基板607 能夠包含無機基板,其具有至少約2.5W/m-K的熱導率且摻雜有(例如,至少約0.05wt%)的能夠在預定波長(例如,雷射的預定操作波長)下吸收光的至少一個摻雜劑。適用的摻雜劑能夠包括例如ZnO、SnO、SnO2 、TiO2 等類似物質。在一些實施例中,該摻雜劑能夠選自在UV波長(200-400nm)下吸收的化合物。It should be understood that the disclosed embodiments with respect to sealing device 200 (including QD/LED) and 500 can be incorporated into sealing device 600 without limitation. For example, the first glass substrate 601 and second substrate 607 can be selected from inorganic materials and can have similar as in the first and in FIG. 2 A-B, respectively, of the substrate 201,207 and similar properties. For example, the doped inorganic substrate 607 can comprise an inorganic substrate having a thermal conductivity of at least about 2.5 W/mK and doped with (eg, at least about 0.05 wt%) capable of being at a predetermined wavelength (eg, laser) At least one dopant that absorbs light at a predetermined operating wavelength). Suitable dopants can include, for example, ZnO, SnO, SnO 2 , TiO 2 , and the like. In some embodiments, the dopant can be selected from compounds that absorb at UV wavelengths (200-400 nm).

相似地,能夠利用上述關於 3 -4 中的相似密封層315415 和圖案以相似於上述的密封211 的方式形成該密封611 。在附加的實施例中,如下關於該等方法的詳細論述,例如,由於在該雷射操作波長下的該至少一個摻雜劑的吸收,該密封611 能夠直接形成於該玻璃基板和該摻雜的無機基板之間。而且,該等基板601607 能夠包含一個或多個空腔,其具有相似於參考 2A-B 中所示和所述的空腔209 的形狀和屬性且含有 2A-B 5 中所示的工件。方法 Similarly, similar to the above can be utilized on the sealing layer 315 of FIG. 3-4, and a pattern 415 in a similar manner as described above to form a seal 211. The seal 611. In an additional embodiment, as discussed in detail below with respect to the methods, for example, the seal 611 can be formed directly on the glass substrate and the doping due to absorption of the at least one dopant at the laser operating wavelength. Between the inorganic substrates. Further, these substrates 601, 607 can comprise one or more cavities, which have similar reference first to FIGS. 2A-B and shown in the cavity 209 and the shape and properties of the containing section or FIG. 2A-B Figure 5 shows the workpiece. method

本文揭示了用以製造密封裝置的方法,該等方法包含:將至少一個空腔內的該至少一個量子點和至少一個LED元件置於玻璃基板的第一表面或無機基板的第二表面上;將密封層置於至少一部分該第一表面或至少一部分該第二表面的上方;將該第一表面與該第二表面接觸,其間設置有該密封層,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封,該密封環繞該至少一個包含該至少一個量子點和該至少一個LED元件的空腔延伸,其中,該無機基板具有大於約2.5W/m-K的熱導率。Disclosed herein are methods for fabricating a sealing device, the method comprising: placing the at least one quantum dot and at least one LED element in at least one cavity on a first surface of a glass substrate or a second surface of an inorganic substrate; Placing a sealing layer over at least a portion of the first surface or at least a portion of the second surface; contacting the first surface with the second surface with the sealing layer disposed therebetween to form a sealing interface; and will be at a predetermined wavelength a downwardly operating laser beam directed to the sealing interface to form a seal between the glass substrate and the inorganic substrate, the seal extending around the at least one cavity comprising the at least one quantum dot and the at least one LED element, wherein The inorganic substrate has a thermal conductivity greater than about 2.5 W/mK.

本文亦揭示了用以製造包含雷射二極管的密封裝置的方法,該等方法包含:將至少一個空腔內的該至少一個量子點和至少一個LED元件置於玻璃基板的第一表面或無機基板的第二表面上;將密封層置於至少一部分該第一表面或至少一部分該第二表面的上方;將該第一表面與該第二表面接觸,其間設置有該密封層,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封,該密封環繞該至少一個包含該至少一個雷射二極管的空腔延伸,其中,該無機基板具有大於約2.5W/m-K的熱導率。Also disclosed herein are methods for fabricating a sealing device comprising a laser diode, the methods comprising: placing the at least one quantum dot and the at least one LED component in the at least one cavity on a first surface of the glass substrate or an inorganic substrate a second surface; placing a sealing layer over at least a portion of the first surface or at least a portion of the second surface; contacting the first surface with the second surface with the sealing layer disposed therebetween to form a sealing interface And directing a laser beam operating at a predetermined wavelength to the sealing interface to form a seal between the glass substrate and the inorganic substrate, the seal extending around the at least one cavity including the at least one laser diode, Wherein, the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK.

本文進一步揭示用以製造密封裝置的方法,該等方法包含:在無機基板中摻雜至少一個在預定波長下吸收的摻雜劑;將玻璃基板的第一表面與該摻雜的無機基板的第二表面接觸,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封,其中,該無機基板具有大於約2.5W/m-K的熱導率。Further disclosed herein are methods for fabricating a sealing device, the method comprising: doping at least one dopant that absorbs at a predetermined wavelength in an inorganic substrate; and affixing the first surface of the glass substrate to the doped inorganic substrate Two surface contacts to form a sealing interface; and directing a laser beam operating at a predetermined wavelength to the sealing interface to form a seal between the glass substrate and the inorganic substrate, wherein the inorganic substrate has a thickness greater than about 2.5 W /mK thermal conductivity.

本文進一步揭示了用以製造密封裝置的方法,該等方法包含:將玻璃基板的第一表面和無機基板的第二表面與密封層接觸,以形成密封介面;及將在預定波長下操作的雷射光束引導至該密封介面,以在該玻璃基板和該無機基板之間形成密封;其中,該玻璃基板的CTE和該無機基板的CTE之間的差值小於20x10-7 /°C,且該無機基板具有大於約2.5W/m-K的熱導率。Further disclosed herein are methods for fabricating a sealing device, the method comprising: contacting a first surface of a glass substrate and a second surface of the inorganic substrate with a sealing layer to form a sealing interface; and a thunder that will operate at a predetermined wavelength Directing a beam of light to the sealing interface to form a seal between the glass substrate and the inorganic substrate; wherein a difference between a CTE of the glass substrate and a CTE of the inorganic substrate is less than 20×10 -7 /° C., and The inorganic substrate has a thermal conductivity greater than about 2.5 W/mK.

根據各種實施例,密封層能夠可選地先於密封施加於至少部分該玻璃基板或至少部分該無機基板。如上述,該第一(玻璃)或第二(無機)基板可包含至少一個空腔。該等空腔例如透過按壓、模製、切削或任意其他適用的方法設置於該第一或第二基板內。若存在的話,該密封層能夠應用於任意該空腔的上方或環繞該空腔形成框架。在一些實施例中,至少一個量子點和至少一個LED元件能夠置於該空腔內。在替代性實施例中,至少一個雷射二極管能夠置於該空腔內。在進一步的實施例中,工件能夠置於該空腔內。According to various embodiments, the sealing layer can optionally be applied to at least a portion of the glass substrate or at least a portion of the inorganic substrate prior to sealing. As mentioned above, the first (glass) or second (inorganic) substrate may comprise at least one cavity. The cavities are disposed in the first or second substrate, for example, by pressing, molding, cutting, or any other suitable method. If present, the sealing layer can be applied over or around the cavity to form a frame. In some embodiments, at least one quantum dot and at least one LED element can be placed within the cavity. In an alternative embodiment, at least one laser diode can be placed within the cavity. In a further embodiment, the workpiece can be placed within the cavity.

根據各種實施例,該無機基板能夠為摻雜的無機基板。例如在形成該無機基板期間進行摻雜,例如能夠將至少一個摻雜劑或其前驅物添加至用於形成該無機基板的該批料。適用的摻雜劑能夠包括例如ZnO、SnO、SnO2 、TiO2 等類似物質。例示性摻雜劑的濃度能夠包括例如大於0.05wt%(例如,大於約1、2、3、4、5、6、7、8、9、或10wt%等)。According to various embodiments, the inorganic substrate can be a doped inorganic substrate. For example, doping is performed during the formation of the inorganic substrate, for example, at least one dopant or a precursor thereof can be added to the batch for forming the inorganic substrate. Suitable dopants can include, for example, ZnO, SnO, SnO 2 , TiO 2 , and the like. The concentration of exemplary dopants can include, for example, greater than 0.05 wt% (eg, greater than about 1, 2, 3, 4, 5, 6, 7, 8, 9, or 10 wt%, etc.).

之後該第一表面和第二表面能夠可選地接觸設置於其間的該密封層,以形成密封介面。因此,該等基板能夠例如環繞該至少一個空腔被密封。根據各種非限制性實施例,密封能夠透過雷射焊接進行。例如,雷射能夠被引導至或密封介面上,從而該密封層吸收雷射能量並將該介面加熱至接近該玻璃基板的Tg 的溫度。因此,該密封層和/或玻璃基板的融化能夠在該第一和第二基板之間形成黏結。或者,密封層可不存在且該第二無機基板可被摻雜,從而其吸收雷射能量並將該介面加熱至接近該玻璃基板的Tg 的溫度。在各種實施例中,在接近室溫的溫度下進行雷射密封,例如約25°C至約50°C,或約30°C至約40°C,其包括其間的所有範圍及子範圍。而在該密封介面處的加熱可引起溫度升高超過該等溫度,這種加熱位於該密封區域,從而降低了對將要封裝於該裝置內的熱敏工件的損壞的風險。The first surface and the second surface can then optionally contact the sealing layer disposed therebetween to form a sealing interface. Thus, the substrates can be sealed, for example, around the at least one cavity. According to various non-limiting embodiments, the seal can be performed by laser welding. For example, the laser can be directed to the sealing interface or such that the sealing layer absorbs the laser energy and the interface is heated to a temperature, T g is close to the glass substrate. Therefore, the melting of the sealing layer and/or the glass substrate can form a bond between the first and second substrates. Alternatively, the sealing layer may be absent and the second substrate may be doped with inorganic, which absorbs the laser energy and thus the interface to be close to the heating temperature T g of the glass substrate. In various embodiments, the laser seal is performed at a temperature near room temperature, such as from about 25 ° C to about 50 ° C, or from about 30 ° C to about 40 ° C, including all ranges and subranges therebetween. Heating at the sealing interface can cause the temperature to rise above the temperature, which is located in the sealed area, thereby reducing the risk of damage to the heat sensitive workpiece to be encapsulated within the device.

該雷射可選自本領域內已知的用於玻璃基板焊接的任意適用的雷射。例如,該雷射可發射在UV(~200-400nm)、可見(~400-700nm)或紅外(~700-1600nm)波長下的光。根據各種實施例,該雷射可在約300nm至約1600nm之範圍的預定波長下操作,例如約350nm至約1400nm、約400nm至約1000nm、約450nm至約750nm、約500nm至約700nm、或約600nm至約650nm,其包括期間的所有範圍及其子範圍。在磨屑實施例中,該雷射可為在約355nm下操作的UV雷射、在約532nm下操作的可見光雷射、或在約810nm或任意適用的NIR波長下操作的近紅外雷射。根據附加的實施例,該雷射操作波長可選作任意波長,在該波長下該第一玻璃基板為大致透明且該密封層和/或無機基板正在吸收。例示性雷射包括IR雷射、氬離子雷射、氦-鎘雷射、三次諧波生成雷射等。The laser can be selected from any suitable laser known in the art for welding glass substrates. For example, the laser can emit light at UV (~200-400 nm), visible (~400-700 nm) or infrared (~700-1600 nm) wavelengths. According to various embodiments, the laser may operate at a predetermined wavelength ranging from about 300 nm to about 1600 nm, such as from about 350 nm to about 1400 nm, from about 400 nm to about 1000 nm, from about 450 nm to about 750 nm, from about 500 nm to about 700 nm, or about 600 nm to about 650 nm, which includes all ranges of the period and its subranges. In a wear debris embodiment, the laser can be a UV laser operating at about 355 nm, a visible light laser operating at about 532 nm, or a near infrared laser operating at about 810 nm or any suitable NIR wavelength. According to an additional embodiment, the laser operating wavelength can be selected to be any wavelength at which the first glass substrate is substantially transparent and the sealing layer and/or inorganic substrate is being absorbed. Exemplary lasers include IR lasers, argon ion lasers, helium-cluster lasers, and third harmonic generation lasers.

在某些實施例中,該雷射光束能夠具有約0.2W至約50W的平均功率,例如約0.5W至約40W、約1W至約30W、約2W至約25W、約3W至約20W、約4W至約15W、約5W至約12W、約6W至約10W、或約7W至約8W,其包括其間的所有範圍及子範圍。在某些實施例中,該雷射可在任意頻率下操作且以脈衝、調制(準連續)或連續的方式操作。在一些實施例中,該雷射可以短脈衝模式(burst mode)操作,各短脈衝包含複數個單個脈衝。在一些非限制性實施例中,該雷射可具有約1kHz至約1MHz的重複速率,例如約5kHz至約900kHz,約10kHz至約800kHz、約20kHz至約700kHz、約30kHz至約600kHz、約40kHz至約500kHz、約50kHz至約400kHz、約60kHz至約300kHz、約70kHz至約200kHz、或約80kHz至約100kHz,其包括其間的所有範圍及子範圍。In certain embodiments, the laser beam can have an average power of from about 0.2 W to about 50 W, such as from about 0.5 W to about 40 W, from about 1 W to about 30 W, from about 2 W to about 25 W, from about 3 W to about 20 W, about 4W to about 15W, from about 5W to about 12W, from about 6W to about 10W, or from about 7W to about 8W, including all ranges and subranges therebetween. In some embodiments, the laser can operate at any frequency and operate in a pulsed, modulated (quasi-continuous) or continuous manner. In some embodiments, the laser can be operated in a burst mode, each short pulse comprising a plurality of individual pulses. In some non-limiting embodiments, the laser can have a repetition rate of from about 1 kHz to about 1 MHz, such as from about 5 kHz to about 900 kHz, from about 10 kHz to about 800 kHz, from about 20 kHz to about 700 kHz, from about 30 kHz to about 600 kHz, about 40 kHz. Up to about 500 kHz, from about 50 kHz to about 400 kHz, from about 60 kHz to about 300 kHz, from about 70 kHz to about 200 kHz, or from about 80 kHz to about 100 kHz, including all ranges and subranges therebetween.

根據各種實施例,該光束可引導至並聚焦至該密封介面上、該密封介面下方或該密封介面上方。在一些非限制性實施例中,該介面上的該光束點直徑可小於約1mm。例如,該光束點直徑可小於約500微米,例如小於約400微米、小於約300微米、小於約200微米、小於約100微米、小於約50微米或小於約20微米,其包括其間的所有範圍及子範圍。在一些實施例中,該光束點直徑可為約10微米至約500微米之範圍,例如約50微米至約250微米、約75微米至約200微米、或約100微米至約150微米,其包含期間的所有範圍及其子範圍。According to various embodiments, the beam of light may be directed to and focused onto the sealing interface, below the sealing interface, or above the sealing interface. In some non-limiting embodiments, the beam spot diameter on the interface can be less than about 1 mm. For example, the beam spot diameter can be less than about 500 microns, such as less than about 400 microns, less than about 300 microns, less than about 200 microns, less than about 100 microns, less than about 50 microns, or less than about 20 microns, including all ranges therebetween. Subrange. In some embodiments, the beam spot diameter can range from about 10 microns to about 500 microns, such as from about 50 microns to about 250 microns, from about 75 microns to about 200 microns, or from about 100 microns to about 150 microns, including All ranges and their sub-ranges of the period.

根據各種實施例,密封該基板包含利用任意預定路徑沿著該等基板(或該等基板能夠相對該雷射平移)掃描或平移雷射光束,以產生任意圖案,例如正方形、矩形、圓形、橢圓形或任意適用的圖案或形狀,例如,以在該裝置內封閉地密封至少一個空腔。該雷射光束(或基板)以該平移速度沿著該介面移動,該平移速度可透過應用改變且根據例如該第一和第二基板的組成物和/或聚焦組態和/或雷射功率、平率和/或波長改變。在一些實施例中,該雷射可具有約1mm/s至約1000mm/s之範圍的平移速度,例如,約5mm/s至約750mm/s、約10mm/s至約500mm/s、或約50mm/s至約250mm/s,例如大於約100mm/s、大於約200mm/s、大於約300mm/s、大於約400mm/s大於約500mm/s或大於約600mm/s,其包括其間的所有範圍及子範圍。According to various embodiments, sealing the substrate includes scanning or translating a laser beam along the substrates (or the substrates can be translated relative to the laser) using any predetermined path to produce an arbitrary pattern, such as square, rectangular, circular, An elliptical or any suitable pattern or shape, for example, to hermetically seal at least one cavity within the device. The laser beam (or substrate) moves along the interface at the translational speed, the translational speed being changeable by application and depending on, for example, the composition of the first and second substrates and/or the focus configuration and/or the laser power , flatness and / or wavelength changes. In some embodiments, the laser can have a translational speed in the range of from about 1 mm/s to about 1000 mm/s, for example, from about 5 mm/s to about 750 mm/s, from about 10 mm/s to about 500 mm/s, or about From 50 mm/s to about 250 mm/s, such as greater than about 100 mm/s, greater than about 200 mm/s, greater than about 300 mm/s, greater than about 400 mm/s greater than about 500 mm/s, or greater than about 600 mm/s, including all of Scope and sub-range.

根據本文揭示的各種實施例,該雷射波長、脈衝持續時間、重複速率、平均功率、聚焦條件和其他相關的參數可改變,以透過該密封層產生足夠將該第一和第二基板焊接至一起的能量。所屬技術領域具有通常知識者有能力如期望應用所需改變該等參數。在各種實施例中,該雷射通量(或強度)低於該第一和/或第二基板的損壞閾值,例如,該雷射在足夠用以將該等基板焊接至一起但不至於損壞該等基板的強度的條件下操作。在某些實施例中,該雷射光束可在低於或等於在該密封介面處的該雷射光束的直徑的乘積和該雷射光束的重複速率的平移速度下操作。According to various embodiments disclosed herein, the laser wavelength, pulse duration, repetition rate, average power, focus conditions, and other related parameters may be varied to create sufficient sealing of the first and second substrates through the sealing layer to The energy together. Those of ordinary skill in the art have the ability to change such parameters as desired for the application. In various embodiments, the laser flux (or intensity) is below a damage threshold of the first and/or second substrate, for example, the laser is sufficient to solder the substrates together but is not damaged The substrates are operated under the conditions of the strength. In some embodiments, the laser beam can operate at a translation speed that is less than or equal to the product of the diameter of the laser beam at the sealing interface and the repetition rate of the laser beam.

應當理解,該各種揭示的實施例可涉及特定的特徵、元件或步驟,其可結合特定實施例描述。應當理解,特定特徵、元件或步驟儘管與某一特定實施例的描述有關,但可與各種未示出的組合或排列中的替代實施例互換或組合。It should be understood that the various disclosed embodiments may be described in a particular feature, element or step. It is understood that the particular features, elements, or steps may be interchanged or combined with alternative embodiments in various combinations or arrangements not shown, although related to the description of a particular embodiment.

亦應當理解,如本文中所用的術語「該(the)」、「一(a)」或「一(an)」是指「至少一」,且不應限於「僅一」,除非明確地指示相反的情況。因此,例如,參考「一個空腔」包括具有一個這種「空腔」或兩個或更多這種「空腔」的範例,除非上下文另外明確說明。相似地,「複數」或「陣列」意欲指示兩個或更多,從而「一列空腔」或「複數個空腔」指示兩個或更多這種空腔。It should also be understood that the terms "the", "a" or "an" as used herein mean "at least one" and should not be limited to "only one" unless expressly indicated The opposite is true. Thus, for example, reference to "a cavity" includes an example of having such a "cavity" or two or more such "cavities" unless the context clearly dictates otherwise. Similarly, "plural" or "array" is intended to indicate two or more such that "a column of cavities" or "plurality of cavities" indicates two or more such cavities.

本文中的範圍表示為從「約」一個特定值和/或到「約」另一特定值。當表示這種範圍時,範例包括從該一個特定值和/或到該另一特定值。同樣地,當該等值表示為近似值時,經由使用先行詞「約」,應當理解,該特定值形成另一態樣。應當進一步理解,該等範圍之各者的該端點和另一端點顯著相關,且和另一端點獨立相關。Ranges herein are expressed as "about" a particular value and/or to "about" another particular value. When representing such a range, the examples include from the one particular value and/or to the other particular value. Similarly, when the equivalent value is expressed as an approximation, it is understood that the particular value forms another aspect. It should be further understood that the endpoint of each of the ranges is significantly related to the other endpoint and is independently associated with the other endpoint.

不管是否指出,本文中的所有數值應理解為包括「約」,除非另外明確說明。然而,應當進一步理解,所列各數值不管是否示為「約」該值應精確設為「約」該值。因此,「小於10mm的尺寸」和「小於約10mm的尺寸」均包括「小於約10mm的尺寸」和「小於10mm的尺寸」的實施例。All values herein are to be understood as including "approximately" unless stated otherwise. However, it should be further understood that the values listed should be accurately set to "about" regardless of whether they are indicated as "about" or not. Therefore, "a size smaller than 10 mm" and "a size smaller than about 10 mm" include embodiments of "a size smaller than about 10 mm" and "a size smaller than 10 mm".

除非另外明確說明,本文中闡述的任一方法不意欲解釋為需要以特定次序執行其步驟。因此,方法請求項並不在其步驟之後實際列舉一個次序或該請求項或說明中明確提出該步驟不應限於特定的次序,其不意欲推測任意特定次序。Any method set forth herein is not intended to be construed as requiring that its steps be performed in a particular order, unless specifically stated otherwise. Accordingly, a method request does not actually recite an order after the steps or the claim or the description is not necessarily limited to a particular order, which is not intended to be inferred.

儘管使用過度詞「包含」揭示特定實施例的各種特徵、元件或步驟,應當理解,暗示了替代實施例包括使用該過渡詞「包含」、「基本包含」來揭露的實施例。因此,例如,暗示的替代實施例包含A+B+C的方法包括包含A+B+C方法的實施例及基本包含A+B+C方法的實施例。The use of the terms "comprising", "comprising" or "substantially encompassing", is used in the alternative embodiments. Thus, for example, a suggested alternative embodiment comprising A+B+C includes an embodiment comprising an A+B+C method and an embodiment comprising substantially an A+B+C method.

所屬技術領域具有通常知識者應當明白,可對本揭露作出各種修改和變化,而不脫離本揭露的精神和範圍。所屬技術領域具有通常知識者可以想到,因為本揭示的實施例的修改組合、子組合及變化併入本揭露的精神和實質,本揭露應當解釋為包括所附申請專利範圍和其同等物的範圍內的一切事物。It will be apparent to those skilled in the art that various modifications and changes can be made in the present disclosure without departing from the spirit and scope of the disclosure. It is to be understood by those of ordinary skill in the art that the present invention is to be construed as the scope of the appended claims. Everything inside.

101‧‧‧密封裝置
103‧‧‧LED
105‧‧‧材料
107‧‧‧第一基板
109‧‧‧空腔
200‧‧‧密封裝置
201‧‧‧第一玻璃基板
203‧‧‧LED元件
205‧‧‧量子點
207‧‧‧第二玻璃基板
209‧‧‧空腔
211‧‧‧密封
213‧‧‧分離障礙物或膜
215‧‧‧第三基板
216‧‧‧封閉地密封包裝或裝置
217a‧‧‧濾波器
217b‧‧‧濾波器
301‧‧‧第一基板
307‧‧‧第二基板
315‧‧‧密封材料或層
317‧‧‧第一表面
319‧‧‧第二表面
401‧‧‧第一基板
407‧‧‧第二基板
415‧‧‧密封層
500‧‧‧密封裝置
501‧‧‧第一玻璃基板
507‧‧‧第二無機基板
509‧‧‧空腔
511‧‧‧密封
521‧‧‧雷射二極管
523‧‧‧支援件
525‧‧‧窗口
600‧‧‧密封裝置
601‧‧‧第一玻璃基板
607‧‧‧無機基板
611‧‧‧密封
101‧‧‧ Sealing device
103‧‧‧LED
105‧‧‧Materials
107‧‧‧First substrate
109‧‧‧ cavity
200‧‧‧ Sealing device
201‧‧‧First glass substrate
203‧‧‧LED components
205‧‧ ‧ quantum dots
207‧‧‧Second glass substrate
209‧‧‧ cavity
211‧‧‧ Seal
213‧‧‧Separation of obstacles or membranes
215‧‧‧ third substrate
216‧‧‧Closed sealed package or device
217a‧‧‧ filter
217b‧‧‧ filter
301‧‧‧First substrate
307‧‧‧second substrate
315‧‧‧ Sealing material or layer
317‧‧‧ first surface
319‧‧‧ second surface
401‧‧‧First substrate
407‧‧‧second substrate
415‧‧‧ sealing layer
500‧‧‧ Sealing device
501‧‧‧First glass substrate
507‧‧‧Second inorganic substrate
509‧‧‧ Cavity
511‧‧‧ Seal
521‧‧‧Laser diode
523‧‧‧Support
525‧‧‧ window
600‧‧‧ Sealing device
601‧‧‧ first glass substrate
607‧‧‧Inorganic substrate
611‧‧‧ Seal

當閱讀時結合以下附圖將進一步理解以下詳細描述,其中,用相同的數字指示相似的元件。The detailed description below is further understood by the same reference

1 繪示了設置於接近包含發光二極管(LED)的空腔的量子點膜的橫截面圖; FIG 1 illustrates a cross-sectional view is provided proximate cavity comprises a light emitting diode (LED), a quantum dot film;

2A-C 繪示了根據本揭露的一些實施例的密封裝置的橫截面圖; Of FIG. 2A-C illustrate a cross-sectional view of some embodiments of the sealing device according to the embodiment of the present disclosure;

3 繪示了根據本揭露的實施例的設置於兩個基板之間的密封層的橫截面圖; FIG 3 illustrates a schematic cross sectional view of the seal layer between two substrates provided in accordance with an embodiment of the present disclosure;

4A 繪示了根據本揭露的進一步實施例的設置於兩個基板之間的密封層框架的橫截面圖; Figure 4A illustrates a cross-sectional view of a sealing frame layer in between the two substrates is provided according to a further embodiment of the present disclosure;

4B 繪示了根據本揭露的各種實施例的基板和密封層框架的俯視圖; Figure 4B illustrates a top plan view of a substrate layer and a sealing frame according to various embodiments of the present disclosure;

5 繪示了根據本揭露的附加實施例的密封裝置的橫截面圖; FIG 5 illustrates a cross-sectional view of an additional embodiment of the sealing apparatus of the present disclosure according to the embodiment;

6 繪示了根據本揭露的進一步實施例的密封裝置的橫截面圖;及 FIG 6 illustrates a cross-sectional view of a further embodiment sealing device according to embodiments of the present disclosure; and

7 8 是本揭露的一些實施例的光學效能的圖示說明。 7 and FIG. 8 is a diagram illustrating the optical performance of some embodiments of the present disclosure.

國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無Domestic deposit information (please note according to the order of the depository, date, number)

國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無Foreign deposit information (please note in the order of country, organization, date, number)

(請換頁單獨記載) 無(Please change the page separately) No

200‧‧‧密封裝置 200‧‧‧ Sealing device

201‧‧‧第一玻璃基板 201‧‧‧First glass substrate

203‧‧‧LED元件 203‧‧‧LED components

205‧‧‧量子點 205‧‧ ‧ quantum dots

207‧‧‧第二玻璃基板 207‧‧‧Second glass substrate

211‧‧‧密封 211‧‧‧ Seal

215‧‧‧第三基板 215‧‧‧ third substrate

216‧‧‧封閉地密封包裝或裝置 216‧‧‧Closed sealed package or device

217a‧‧‧濾波器 217a‧‧‧ filter

217b‧‧‧濾波器 217b‧‧‧ filter

Claims (20)

一種密封裝置,其包含: 一玻璃基板,其包含一第一表面; 一無機基板,其包含一第二表面; 一密封層,其與至少一部分該第一表面和至少一部分該第二表面接觸; 至少一個密封,其透過該密封層將該玻璃基板黏結至該無機基板; 其中,該無機基板具有大於約2.5W/m-K的一熱導率, 其中,該第一和第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個量子點和至少一個LED元件,或其中,該第一或第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個雷射二極管,且 其中,該至少一個密封環繞該至少一個空腔延伸。A sealing device comprising: a glass substrate comprising a first surface; an inorganic substrate comprising a second surface; a sealing layer in contact with at least a portion of the first surface and at least a portion of the second surface; At least one seal that bonds the glass substrate to the inorganic substrate through the sealing layer; wherein the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK, wherein at least one of the first and second surfaces Including at least one cavity comprising at least one quantum dot and at least one LED element, or wherein at least one of the first or second surface comprises at least one cavity comprising at least one laser diode And wherein the at least one seal extends around the at least one cavity. 如請求項1所述之密封裝置,其中,該玻璃基板包含選自鋁矽酸鹽、鹼性鋁矽酸鹽、硼矽酸鹽、鹼性硼矽酸鹽、鋁硼矽酸鹽和鹼性鋁硼矽酸鹽玻璃中的一玻璃。The sealing device of claim 1, wherein the glass substrate comprises an aluminosilicate, an alkali aluminate, a borosilicate, an alkali borosilicate, an aluminoboronate, and an alkali a glass in aluminoborosilicate glass. 如請求項1所述之密封裝置,其中,該無機基板包含氮化鋁、氧化鋁、氧化鈹、氮化硼或碳化矽。The sealing device of claim 1, wherein the inorganic substrate comprises aluminum nitride, aluminum oxide, hafnium oxide, boron nitride or tantalum carbide. 如請求項1所述之密封裝置,其中,該密封層包含選自錫氟磷酸鹽玻璃、摻雜鎢的錫氟磷酸鹽玻璃、硫族玻璃、亞碲酸鹽玻璃、硼酸鹽玻璃和磷酸鹽玻璃中的一玻璃。The sealing device of claim 1, wherein the sealing layer comprises a tin fluorophosphate glass, a tungsten-doped tin fluorophosphate glass, a chalcogenide glass, a tellurite glass, a borate glass, and a phosphate a glass in the glass. 如請求項1所述之密封裝置,其中,至少一個密封為一雷射焊接密封。The sealing device of claim 1, wherein the at least one seal is a laser welded seal. 如請求項1所述之密封裝置,其中,該密封層設置於該至少一個空腔的上方,且其中,該密封層具有在一預定雷射波長下大於約10%的一吸收且在可見波長下實質上透明。The sealing device of claim 1, wherein the sealing layer is disposed above the at least one cavity, and wherein the sealing layer has an absorption greater than about 10% at a predetermined laser wavelength and at a visible wavelength It is essentially transparent. 如請求項1所述之密封裝置,其中,該至少一個量子點和至少一個LED元件與該至少一個空腔內直接接觸。The sealing device of claim 1, wherein the at least one quantum dot and the at least one LED element are in direct contact with the at least one cavity. 如請求項1所述之密封裝置,其中,該至少一個量子點和至少一個LED元件透過該至少一個空腔內的一分隔障礙物分離。The sealing device of claim 1, wherein the at least one quantum dot and the at least one LED element are separated by a separation barrier in the at least one cavity. 一種顯示或光學裝置,其包含請求項1所述之密封裝置。A display or optical device comprising the sealing device of claim 1. 一種密封裝置,其包含: 一玻璃基板,其包含一第一表面; 一摻雜的無機基板,其包含一第二表面;及 至少一個密封,其將該玻璃基板黏結至該摻雜的無機基板, 其中,該摻雜的無機基板包含大於2.5W/m-K的熱導率和至少約0.05wt%的選自ZnO、SnO、SnO2 或TiO2 中的至少一個摻雜劑。A sealing device comprising: a glass substrate comprising a first surface; a doped inorganic substrate comprising a second surface; and at least one seal bonding the glass substrate to the doped inorganic substrate Wherein the doped inorganic substrate comprises a thermal conductivity greater than 2.5 W/mK and at least about 0.05 wt% of at least one dopant selected from the group consisting of ZnO, SnO, SnO 2 or TiO 2 . 如請求項10所述之密封裝置,其中,該至少一個密封包含一摻雜玻璃的無機雷射焊接密封。The sealing device of claim 10, wherein the at least one seal comprises a doped glass inorganic laser welded seal. 如請求項10所述之密封裝置,其進一步包含至少一個設置於該玻璃基板和該摻雜的無機基板之間的密封層,且其中,該至少一個密封包含一摻雜玻璃密封層的無機雷射焊接密封。The sealing device of claim 10, further comprising at least one sealing layer disposed between the glass substrate and the doped inorganic substrate, and wherein the at least one seal comprises an inorganic mine doped with a glass sealing layer Shot welding seal. 如請求項10所述之密封裝置,其中,該第一和第二表面中的至少一個包含至少一個空腔,且其中,該至少一個空腔包含至少一個量子點和至少一個LED元件或至少一個雷射二極管。The sealing device of claim 10, wherein at least one of the first and second surfaces comprises at least one cavity, and wherein the at least one cavity comprises at least one quantum dot and at least one LED element or at least one Laser diode. 一種密封裝置,其包含: 一第一玻璃基板,其包含一第一表面; 一第二玻璃基板,其包含一第二表面; 一無機基板,其包含一第三表面; 一密封層,其與至少一部分該第二表面和至少一部分該第三表面接觸; 至少一個密封,其透過該密封層將該玻璃基板黏結至該無機基板; 其中,該無機基板具有大於約2.5W/m-K的一熱導率, 其中,該第二或第三表面中的至少一個包含至少一個空腔,該空腔包含至少一個量子點和至少一個LED元件,且其中,該至少一個密封環繞該至少一個空腔延伸。A sealing device comprising: a first glass substrate comprising a first surface; a second glass substrate comprising a second surface; an inorganic substrate comprising a third surface; a sealing layer, At least a portion of the second surface is in contact with at least a portion of the third surface; at least one seal that bonds the glass substrate to the inorganic substrate through the sealing layer; wherein the inorganic substrate has a thermal conductivity greater than about 2.5 W/mK Rate, wherein at least one of the second or third surfaces comprises at least one cavity comprising at least one quantum dot and at least one LED element, and wherein the at least one seal extends around the at least one cavity. 如請求項14所述之密封裝置,其中,該至少一個LED元件被包含在一第一空腔內且該至少一個量子點被包含在與該第一空腔無關的一第二空腔內。The sealing device of claim 14, wherein the at least one LED element is contained within a first cavity and the at least one quantum dot is contained within a second cavity unrelated to the first cavity. 一種密封裝置,其包含: 一第一玻璃基板,其包含一第一表面; 一第二玻璃基板,其包含一第二表面; 一第三基板,其包含一第三表面; 一第一密封,其將該第一玻璃基板黏結至該第二玻璃基板; 其中,該第二或第三表面中的至少一個包含至少一個空腔,該空腔包含至少一個量子點和至少一個LED元件,且 其中,該至少一個密封環繞該至少一個空腔延伸。A sealing device comprising: a first glass substrate comprising a first surface; a second glass substrate comprising a second surface; a third substrate comprising a third surface; a first seal, Bonding the first glass substrate to the second glass substrate; wherein at least one of the second or third surfaces comprises at least one cavity comprising at least one quantum dot and at least one LED element, and wherein The at least one seal extends around the at least one cavity. 如請求項16所述之密封裝置,其中,該至少一個LED元件被包含在一第一空腔內且該至少一個量子點被包含在與該第一空腔無關的一第二空腔內。The sealing device of claim 16, wherein the at least one LED element is contained within a first cavity and the at least one quantum dot is contained within a second cavity unrelated to the first cavity. 一種密封裝置,其包含: 一第一玻璃基板,其包含一第一表面; 一第二玻璃基板,其包含一第二表面; 一第三基板,其包含一第三表面; 一第一密封,其將該第一玻璃基板黏結至該第二玻璃基板; 其中,該第一或第二表面中的至少一個包含至少一個空腔,該空腔包含至少一個量子點,且其中,該第三表面接近該至少一個LED元件,且 其中,該至少一個密封環繞該至少一個空腔延伸。A sealing device comprising: a first glass substrate comprising a first surface; a second glass substrate comprising a second surface; a third substrate comprising a third surface; a first seal, Bonding the first glass substrate to the second glass substrate; wherein at least one of the first or second surface comprises at least one cavity, the cavity comprising at least one quantum dot, and wherein the third surface Adjacent to the at least one LED element, and wherein the at least one seal extends around the at least one cavity. 如請求項18所述之密封裝置,其進一步包含一個或多個用於篩選預定波長的光的膜,其中,該一個或多個膜包含高折射率材料和低折射率材料的交替膜。The sealing device of claim 18, further comprising one or more films for screening light of a predetermined wavelength, wherein the one or more films comprise alternating films of high refractive index material and low refractive index material. 如請求項19所述之密封裝置,其中,該高折射率材料選自由Nb2 O5 、Ta2 O5 、TiO2 及其複合氧化物構成之組中,且其中,該低折射率材料選自由SiO2 、ZrO2 、HfO2 、Bi2 O3 、La2 O3 、Al2 O3 及其複合氧化物構成之組中。The sealing device of claim 19, wherein the high refractive index material is selected from the group consisting of Nb 2 O 5 , Ta 2 O 5 , TiO 2 and composite oxides thereof, and wherein the low refractive index material is selected It is a group consisting of SiO 2 , ZrO 2 , HfO 2 , Bi 2 O 3 , La 2 O 3 , Al 2 O 3 and a composite oxide thereof.
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Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10319878B2 (en) * 2014-10-31 2019-06-11 eLux, Inc. Stratified quantum dot phosphor structure
KR20180061355A (en) 2015-10-06 2018-06-07 코닝 인코포레이티드 Space multiplexing coupler for light guide plate
EP3336158B1 (en) * 2016-12-14 2023-03-08 Samsung Electronics Co., Ltd. Emissive nanocrystal particle, method of preparing the same and device including emissive nanocrystal particle
CN107238886A (en) * 2017-07-07 2017-10-10 青岛骐骥光电科技有限公司 A kind of glass light guide plate and preparation method thereof
KR102282644B1 (en) * 2017-12-11 2021-07-27 한국전기연구원 System for providing wavelength variable light source
KR102592483B1 (en) * 2018-10-10 2023-10-25 주식회사 루멘스 Method for manufacturing quantum dot plate assembly
CN108573992A (en) * 2018-05-08 2018-09-25 业成科技(成都)有限公司 The electronic device of display panel, the preparation method and application display panel
CN109301053A (en) * 2018-11-09 2019-02-01 易美芯光(北京)科技有限公司 A kind of quantum dot LED encapsulation structure and its manufacturing method
KR102592685B1 (en) 2019-03-05 2023-10-23 삼성디스플레이 주식회사 Backlight unit and display device comprising the same
CN111987206A (en) * 2019-05-23 2020-11-24 易美芯光(北京)科技有限公司 Quantum dot LED packaging device and manufacturing method
KR102177480B1 (en) * 2019-10-04 2020-11-11 동우 화인켐 주식회사 Color Conversion Panel
KR102167982B1 (en) * 2019-10-04 2020-10-20 동우 화인켐 주식회사 Color Conversion Panel
KR102167515B1 (en) * 2019-10-04 2020-10-19 동우 화인켐 주식회사 Color Conversion Panel
WO2021235709A1 (en) * 2020-05-18 2021-11-25 엘지이노텍 주식회사 Light path control member and display device including same
DE102020117186A1 (en) 2020-06-30 2021-12-30 Schott Ag Enclosed optoelectronic module and process for its production
CN114019718B (en) * 2021-09-30 2022-09-27 北海惠科光电技术有限公司 Manufacturing method of backlight module, backlight module and display device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7597603B2 (en) * 2005-12-06 2009-10-06 Corning Incorporated Method of encapsulating a display element
US7615506B2 (en) * 2006-10-06 2009-11-10 Corning Incorporated Durable tungsten-doped tin-fluorophosphate glasses
US20110317397A1 (en) * 2010-06-23 2011-12-29 Soraa, Inc. Quantum dot wavelength conversion for hermetically sealed optical devices
KR101709387B1 (en) * 2012-02-27 2017-02-22 코닝 인코포레이티드 LOW Tg GLASS GASKET FOR HERMETIC SEALING APPLICATIONS
US9666763B2 (en) * 2012-11-30 2017-05-30 Corning Incorporated Glass sealing with transparent materials having transient absorption properties
US9202996B2 (en) * 2012-11-30 2015-12-01 Corning Incorporated LED lighting devices with quantum dot glass containment plates
JP2016507162A (en) * 2013-02-11 2016-03-07 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. LED module having an airtight seal of wavelength conversion material

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