TW201714330A - Light emitting device with beveled reflector, beveled luminescent structure and manufacturing method of the same - Google Patents

Light emitting device with beveled reflector, beveled luminescent structure and manufacturing method of the same Download PDF

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TW201714330A
TW201714330A TW105140231A TW105140231A TW201714330A TW 201714330 A TW201714330 A TW 201714330A TW 105140231 A TW105140231 A TW 105140231A TW 105140231 A TW105140231 A TW 105140231A TW 201714330 A TW201714330 A TW 201714330A
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light
fluorescent
emitting device
layer
top surface
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TW105140231A
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TWI669836B (en
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陳傑
王琮璽
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行家光電股份有限公司
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Abstract

A light emitting device, including an LED semiconductor die, a photoluminescent structure and a reflector, is disclosed. The photoluminescent structure with a beveled edge surface is disposed on top of the LED semiconductor die, wherein a lower surface of the photoluminescent structure adheres to an upper surface of the LED semiconductor die. A reflective resin material is disposed surrounding edge surfaces of the LED semiconductor die and the photoluminescent structure forming a beveled reflector. A method to manufacture the above light emitting device is also disclosed. Advantages of this light emitting device with beveled reflector include increasing the light extraction efficiency, making the viewing angle tunable, improving the spatial color uniformity and reducing the light source etendue realized in a compact form factor size.

Description

具導角反射結構的發光裝置、螢光結構及其製造方法 Light-emitting device with guide angle reflection structure, fluorescent structure and manufacturing method thereof

本發明有關一種發光裝置、螢光結構及其製造方法,特別關於一種具有LED晶片之發光裝置、包含於其中之螢光結構及其製造方法。 The present invention relates to a light-emitting device, a fluorescent structure, and a method of fabricating the same, and more particularly to a light-emitting device having an LED chip, a fluorescent structure included therein, and a method of fabricating the same.

LED(發光二極體)晶片係普遍地被使用來提供照明或指示用的光源,而LED晶片通常會置於一封裝結構中,亦或會被一螢光材料包覆或覆蓋,以成為一發光裝置。 LED (Light Emitting Diode) wafers are commonly used to provide illumination or indication light sources, and LED wafers are typically placed in a package structure or may be covered or covered by a phosphor material to become a Light emitting device.

發光裝置可經由適當的設計方案來獲得良好的發光效率及特定的發光角度,例如傳統具有高經濟效益的支架型(PLCC)LED封裝,透過反射杯的設計可增加其發光效率,並達到特定的發光角度,但支架型LED封裝卻有其先天限制,例如:光在螢光膠內的行進路徑差異大而造成空間光均勻性差並產生黃暈、出光面積遠大於LED晶片面積而造成特定方向單位面積光強度(intensity)低、出光面積大而造成二次光學透鏡不易設計、熱阻大而造成散熱不易。因此,利用LED覆晶晶片(flip chip)進行晶片級(chip scale)封裝以製作小尺寸發光裝置而趨近理想點光源可有效解決上述問題,又因小尺寸晶片級封裝可進一步降低生產成本,故此趨勢已成為業界努力的目標。但是當發光裝置的尺寸越益縮小時,原本可應用於大尺寸的方案,將變得難以適用於小尺寸的發光裝置中。 The illuminating device can obtain good luminous efficiency and a specific illuminating angle through a suitable design scheme, for example, a conventional cost-effective bracket type (PLCC) LED package, and the design of the reflecting cup can increase the luminous efficiency and achieve a specific Luminous angle, but the bracket type LED package has its inherent limitations. For example, the difference in the traveling path of light in the fluorescent glue causes the spatial light uniformity to be poor and produces a yellow halo, and the light-emitting area is much larger than the LED chip area, resulting in a specific direction unit. The area light intensity (intensity) is low, and the light-emitting area is large, which makes the secondary optical lens difficult to design, and the thermal resistance is large, which makes heat dissipation difficult. Therefore, the use of an LED flip chip for chip scale packaging to fabricate a small-sized light-emitting device to approach an ideal point source can effectively solve the above problem, and the production cost can be further reduced by a small-sized wafer-level package. Therefore, this trend has become the goal of the industry. However, when the size of the light-emitting device is increasingly reduced, a solution that can be applied to a large size will become difficult to apply to a small-sized light-emitting device.

在現行的小尺寸發光裝置中,因現有製程技術的限制,其反射結構垂直地覆蓋螢光結構之側面,這種架構造成在螢光材料內部射入反射結構的光將因臨界角的限制而大部分被反射回螢光材料或LED晶片中,不易被導向螢光結構的頂面以被汲取出發光裝置之外,因而造成較多光能量損耗於發光裝置內部,因此其發光效率仍可進一步提升。此外,目前的小尺寸發光裝置尚無有效的方案用以調整發光角度。 In the current small-sized light-emitting device, due to limitations of the existing process technology, the reflective structure vertically covers the side of the fluorescent structure, and the structure causes the light incident on the reflective structure inside the fluorescent material to be limited by the critical angle. Most of the light is reflected back into the fluorescent material or the LED chip, and is not easily guided to the top surface of the fluorescent structure to be taken out of the light emitting device, thereby causing more light energy loss inside the light emitting device, so the luminous efficiency can be further improved. Upgrade. In addition, there is no effective solution for adjusting the illumination angle of current small-sized illumination devices.

有鑑於此,提供一種可改善發光裝置的發光效率、提升空間光均勻性、縮小發散角度、發光面積趨近理想點光源、降低熱阻或可調整發光角度的技術方案,乃為此業界待解決的問題。 In view of the above, there is provided a technical solution for improving the luminous efficiency of the light-emitting device, improving the spatial light uniformity, reducing the divergence angle, and approaching the ideal point light source, reducing the thermal resistance or adjusting the illumination angle. The problem.

本發明之一目的在於提供一種發光裝置、螢光結構及其製造方法,其能改善發光裝置的發光效率及空間光均勻性以避免黃暈的產生,或調整其發光角度,同時具有小發光面積及低熱阻。 An object of the present invention is to provide a light-emitting device, a fluorescent structure and a manufacturing method thereof, which can improve the luminous efficiency and spatial light uniformity of the light-emitting device to avoid the generation of yellow halos, or adjust the light-emitting angle thereof, and have a small light-emitting area. And low thermal resistance.

本發明之另一目的在於提供一種發光裝置、螢光結構及其製造方法,其能使小尺寸的發光裝置有良好的發光效率及/或空間光均勻性以避免黃暈的產生,或調整其發光角度。 Another object of the present invention is to provide a light-emitting device, a fluorescent structure, and a manufacturing method thereof, which can enable a small-sized light-emitting device to have good luminous efficiency and/or spatial light uniformity to avoid the generation of yellow halos, or to adjust Beam angle.

為達上述目的,本發明所揭露的一種發光裝置包含一LED晶片、一螢光結構及一反射結構。該LED晶片具有一上表面、相對於該上表面之一下表面、一側面以及一電極組,該側面形成於該上表面與該下表面之間,該電極組設置於該下表面上;該螢光結構設置於LED晶片上,其具有一頂面、相對於該頂面之一底面、及形成於該頂面與該底面之間的一側面,其中該頂面大於該底面,使該側面相對於該頂面與該底面呈現一傾斜狀,該底面位於該LED晶片之該上表面上;該反射結構包覆該LED晶片之側面及該螢光結構之側面。 To achieve the above objective, a light emitting device disclosed in the present invention comprises an LED chip, a fluorescent structure and a reflective structure. The LED chip has an upper surface, a lower surface opposite to the upper surface, a side surface, and an electrode group formed between the upper surface and the lower surface, the electrode group being disposed on the lower surface; The light structure is disposed on the LED chip, and has a top surface, a bottom surface opposite to the top surface, and a side surface formed between the top surface and the bottom surface, wherein the top surface is larger than the bottom surface, so that the side surface is opposite The top surface and the bottom surface are inclined, and the bottom surface is located on the upper surface of the LED chip; the reflective structure covers the side of the LED chip and the side of the fluorescent structure.

為達上述目的,本發明所揭露的一種發光裝置的製造方法,包含:形成具有一倒錐形側面之一螢光結構;將該螢光結構設置於一LED晶片上,以形成一發光結構;以及將該發光結構之側面進行包覆,以形成一具有倒錐形內導角之反射結構。 In order to achieve the above object, a method for fabricating a light-emitting device according to the present invention includes: forming a fluorescent structure having a reverse tapered side; the fluorescent structure is disposed on an LED wafer to form a light emitting structure; And coating the side of the light emitting structure to form a reflective structure having an inverted tapered inner corner.

為達上述目的,本發明所揭露的一種螢光結構包含一頂面、一底面、形成於該頂面及該底面之一側面、及設置於該螢光結構內的螢光材料,其中,該頂面大於該底面,使得該側面為一傾斜側面,該頂面之一長度不大於3.0公釐,該頂面之一寬度不大於2.0公釐。 In order to achieve the above objective, a fluorescent structure disclosed in the present invention comprises a top surface, a bottom surface, a side surface formed on the top surface and the bottom surface, and a fluorescent material disposed in the fluorescent structure, wherein The top surface is larger than the bottom surface such that the side surface is an inclined side surface, and one of the top surfaces has a length of not more than 3.0 mm, and one of the top surfaces has a width of not more than 2.0 mm.

為達上述目的,本發明所揭露的一種螢光結構的製造方法,包含:提供一螢光薄膜;提供具有相連接之複數個刀刃的一沖切刀具;以及使用該沖切刀具來沖切該螢光薄膜,以使該螢光薄膜分成複數個螢光結構;其中,該些螢光結構包含一頂面、一底面及形成於該頂面及該底面之一側面,該頂面大於該底面,使得該側面為一傾斜側面。 To achieve the above object, a method for fabricating a fluorescent structure according to the present invention includes: providing a fluorescent film; providing a punching cutter having a plurality of connected blades; and punching the punching tool using the punching tool a fluorescent film, wherein the fluorescent film is divided into a plurality of fluorescent structures; wherein the fluorescent structures comprise a top surface, a bottom surface, and a side surface formed on the top surface and the bottom surface, the top surface being larger than the bottom surface So that the side is an inclined side.

藉此,本發明的發光裝置及其製造方法能至少提供以下的有益效果:具有導角的反射結構能使LED晶片的光線更易被汲取至發光裝 置外,可增加發光效率及/或光均勻性;此外,該螢光結構可略大於LED晶片,故所構成的發光裝置能具有小尺寸的外觀。另一方面,具有傾斜側面的螢光結構除了可容易地製作外,傾斜側面的傾斜角度亦可調整,進而控制發光角度。 Thereby, the illuminating device and the manufacturing method thereof of the present invention can at least provide the following beneficial effects: the reflective structure with the lead angle enables the light of the LED chip to be more easily captured to the illuminating device. In addition, the luminous efficiency and/or light uniformity can be increased; in addition, the fluorescent structure can be slightly larger than the LED wafer, so that the light-emitting device can have a small-sized appearance. On the other hand, in addition to the fluorescent structure having the inclined side surface, the inclination angle of the inclined side surface can be adjusted to control the light-emitting angle.

為讓上述目的、技術特徵及優點能更明顯易懂,下文係以較佳之實施例配合所附圖式進行詳細說明。 The above objects, technical features and advantages will be more apparent from the following description.

1A、1B、1C、1D、1E、1F、1G、1H、1I、1J、1K‧‧‧發光裝置 1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H, 1I, 1J, 1K‧‧‧ illuminating devices

10‧‧‧LED晶片 10‧‧‧LED chip

11‧‧‧上表面 11‧‧‧ upper surface

12‧‧‧下表面 12‧‧‧ Lower surface

13‧‧‧側面 13‧‧‧ side

14‧‧‧電極組 14‧‧‧Electrode group

20‧‧‧螢光結構 20‧‧‧Fluorescent structure

20’‧‧‧透明結構 20’‧‧‧Transparent structure

201‧‧‧螢光層 201‧‧‧Fluorescent layer

201’‧‧‧螢光層 201’‧‧‧Fluorescent layer

202‧‧‧透光層 202‧‧‧Transparent layer

203‧‧‧透鏡陣列層 203‧‧‧ lens array layer

21‧‧‧頂面 21‧‧‧ top surface

22‧‧‧底面 22‧‧‧ bottom

23‧‧‧側面、傾斜側面 23‧‧‧Side, sloping side

23’‧‧‧垂直側面 23’‧‧‧Vertical side

30‧‧‧反射結構 30‧‧‧Reflective structure

31‧‧‧內側面 31‧‧‧ inside

32‧‧‧內導角、內側斜面 32‧‧‧Inner guide angle, inside slope

33‧‧‧頂面 33‧‧‧ top surface

34‧‧‧底面 34‧‧‧ bottom

35‧‧‧外側面 35‧‧‧Outside

40‧‧‧基板 40‧‧‧Substrate

50、50’、50”‧‧‧輔助材 50, 50', 50" ‧ ‧ auxiliary materials

60‧‧‧沖切刀具 60‧‧‧Cutting cutter

61‧‧‧刀刃 61‧‧‧blade

70‧‧‧鋸輪、雙角銑刀 70‧‧‧Saw wheel, double angle milling cutter

71‧‧‧刀刃 71‧‧‧blade

L‧‧‧光 L‧‧‧Light

X‧‧‧向上傾斜量 X‧‧‧ upward tilt

T‧‧‧厚度 T‧‧‧ thickness

W‧‧‧長度 W‧‧‧ length

H‧‧‧高度 H‧‧‧ Height

第1圖為依據本發明之第1較佳實施例之發光裝置的示意圖。 Fig. 1 is a schematic view showing a light-emitting device according to a first preferred embodiment of the present invention.

第2圖為依據本發明之第2較佳實施例之發光裝置的示意圖。 Fig. 2 is a schematic view showing a light-emitting device according to a second preferred embodiment of the present invention.

第3圖為依據本發明之第3較佳實施例之發光裝置的示意圖。 Figure 3 is a schematic view of a light-emitting device according to a third preferred embodiment of the present invention.

第4圖為依據本發明之第4較佳實施例之發光裝置的示意圖。 Figure 4 is a schematic view of a light-emitting device according to a fourth preferred embodiment of the present invention.

第5圖為依據本發明之第5較佳實施例之發光裝置的示意圖。 Figure 5 is a schematic view of a light-emitting device according to a fifth preferred embodiment of the present invention.

第6圖為依據本發明之第6較佳實施例之發光裝置的示意圖。 Figure 6 is a schematic view of a light-emitting device according to a sixth preferred embodiment of the present invention.

第7圖為依據本發明之第7較佳實施例之發光裝置的示意圖。 Figure 7 is a schematic view of a light-emitting device according to a seventh preferred embodiment of the present invention.

第8圖為依據本發明之第8較佳實施例之發光裝置的示意圖。 Figure 8 is a schematic view of a light-emitting device according to an eighth preferred embodiment of the present invention.

第9圖為依據本發明之第9較佳實施例之發光裝置的示意圖。 Figure 9 is a schematic view of a light-emitting device according to a ninth preferred embodiment of the present invention.

第10圖為依據本發明之第10較佳實施例之發光裝置的示意圖。 Figure 10 is a schematic view of a light-emitting device according to a tenth preferred embodiment of the present invention.

第11A圖至第11D圖為依據本發明之較佳實施例之發光裝置之製造方法的形成螢光薄膜的步驟示意圖。 11A to 11D are views showing the steps of forming a fluorescent film according to a method of manufacturing a light-emitting device according to a preferred embodiment of the present invention.

第12A圖至第12C圖為依據本發明之較佳實施例之發光裝置之製造方法的形成另一螢光薄膜的步驟示意圖。 12A to 12C are views showing the steps of forming another fluorescent film in the method of manufacturing the light-emitting device according to the preferred embodiment of the present invention.

第13A圖及第13B圖為發光裝置內之光線傳遞示意圖及對比圖(螢光結構之螢光層未顯示)。 Fig. 13A and Fig. 13B are schematic diagrams and comparison diagrams of light transmission in the light-emitting device (the fluorescent layer of the fluorescent structure is not shown).

第14圖及第15圖為依據本發明之較佳實施例之發光裝置之製造方法的形成又一螢光薄膜的步驟示意圖。 14 and 15 are schematic views showing the steps of forming a further fluorescent film in accordance with a method of fabricating a light-emitting device according to a preferred embodiment of the present invention.

第16A圖至第16F圖為依據本發明之較佳實施例之發光裝置之製造方法的沖切螢光薄膜的步驟示意圖。 16A to 16F are views showing the steps of punching a fluorescent film according to a method of manufacturing a light-emitting device according to a preferred embodiment of the present invention.

第17圖為依據本發明之較佳實施例之發光裝置之製造方法的切割螢光薄膜的步驟示意圖。 Figure 17 is a view showing the steps of cutting a fluorescent film according to a method of manufacturing a light-emitting device according to a preferred embodiment of the present invention.

第18A圖及第18B圖為依據本發明之較佳實施例之發光裝置之製造方法的形成發光結構的步驟示意圖。 18A and 18B are schematic diagrams showing the steps of forming a light-emitting structure in accordance with a method of fabricating a light-emitting device according to a preferred embodiment of the present invention.

第19圖為依據本發明之較佳實施例之發光裝置之製造方法的形成反射結構的步驟示意圖。 Figure 19 is a schematic view showing the steps of forming a reflective structure in a method of fabricating a light-emitting device according to a preferred embodiment of the present invention.

第20圖為依據本發明之較佳實施例之發光裝置之製造方法的移除輔助材的步驟示意圖。 Figure 20 is a schematic view showing the steps of removing an auxiliary material in a method of manufacturing a light-emitting device according to a preferred embodiment of the present invention.

第21圖為依據本發明之較佳實施例之發光裝置之製造方法的切割反射結構的步驟示意圖。 Figure 21 is a view showing the steps of cutting a reflection structure of a method of manufacturing a light-emitting device according to a preferred embodiment of the present invention.

第22A圖至、第22B圖、第22D圖及第22E圖為依據本發明之第11較佳實施例之發光裝置的示意圖,其中第22D圖及第22E圖更顯示發光裝置內之光線傳遞示意圖,而第22C圖則顯示發光裝置具有均勻分佈的螢光材料時的光線傳遞示意圖。 22A to 22B, 22D and 22E are schematic views of a light-emitting device according to an eleventh preferred embodiment of the present invention, wherein 22D and 22E further illustrate light transmission in the light-emitting device. And Fig. 22C shows a schematic diagram of light transmission when the illuminating device has a uniformly distributed fluorescent material.

請參閱第1圖所示,其為依據本發明之第1較佳實施例之發光裝置的示意圖。該發光裝置1A可包含一LED晶片10、一螢光結構20及一反射結構30,而該些元件的技術內容將依序說明如下。 Referring to Fig. 1, there is shown a schematic view of a light-emitting device according to a first preferred embodiment of the present invention. The illuminating device 1A can include an LED chip 10, a fluorescent structure 20 and a reflective structure 30, and the technical contents of the components will be described below.

該LED晶片10可為一覆晶型態之晶片,而外觀上可具有一上表面11、一下表面12、一側面13及一電極組14。該上表面11與下表面12為相對且相反地設置,而側面13形成於上表面11與下表面12之間,且連接上表面11與下表面12。電極組14設置於下表面12上,且可具有二個以上之電極。電能(圖未示)可透過電極組14供應至LED晶片10內,然後使LED晶片10發光。LED晶片10所發射出之光線大部分是從上表面11離開。 The LED chip 10 can be a flip-chip wafer and can have an upper surface 11, a lower surface 12, a side surface 13 and an electrode group 14 in appearance. The upper surface 11 and the lower surface 12 are opposite and oppositely disposed, and the side surface 13 is formed between the upper surface 11 and the lower surface 12, and connects the upper surface 11 and the lower surface 12. The electrode group 14 is disposed on the lower surface 12 and may have more than two electrodes. Electrical energy (not shown) can be supplied into the LED wafer 10 through the electrode group 14, and then the LED wafer 10 is illuminated. Most of the light emitted by the LED wafer 10 exits from the upper surface 11.

螢光結構20能改變LED晶片10所發射之光線之波長,而外觀上可具有一頂面21、一底面22及一側面23;頂面21與底面22為相對且相反設置,而側面23形成於頂面21與底面22之間,且連接頂面21與底面22。頂面21與底面22可為水平面,故兩者可相平行。 The phosphor structure 20 can change the wavelength of the light emitted by the LED chip 10, and can have a top surface 21, a bottom surface 22 and a side surface 23 in appearance; the top surface 21 and the bottom surface 22 are opposite and opposite, and the side surface 23 is formed. Between the top surface 21 and the bottom surface 22, and connecting the top surface 21 and the bottom surface 22. The top surface 21 and the bottom surface 22 may be horizontal, so that the two may be parallel.

頂面21大於底面22,也就是,頂面21之面積大於底面22之面積,故沿著法線方向往下觀察,頂面21可遮蓋住底面22。當頂面21大於底面22時,側面23將相對於頂面21與底面22呈現一傾斜狀,故側 面23亦可稱為傾斜側面23。傾斜側面23是沿著頂面21與底面22之輪廓而形成,故傾斜側面23相對於頂面21與底面22為環狀。因此,螢光結構20外觀上呈現為一截錐體(frustum),而側面23為倒錐型側面。 The top surface 21 is larger than the bottom surface 22, that is, the area of the top surface 21 is larger than the area of the bottom surface 22, so that the top surface 21 can cover the bottom surface 22 as viewed downward in the normal direction. When the top surface 21 is larger than the bottom surface 22, the side surface 23 will be inclined with respect to the top surface 21 and the bottom surface 22, so the side Face 23 can also be referred to as sloped side 23. Since the inclined side surface 23 is formed along the contour of the top surface 21 and the bottom surface 22, the inclined side surface 23 is annular with respect to the top surface 21 and the bottom surface 22. Thus, the phosphor structure 20 appears as a frustum in appearance and the side 23 is an inverted cone side.

螢光結構20結構上可包含一螢光層201及至少一透光層202,而至少一透光層202形成於螢光層201之上,或可說,透光層202堆疊於螢光層201上。透光層202及螢光層201都可讓光線通過,故其製造材料皆可包含一可透光樹脂等透光材料,而螢光層201的製造材料則進一步包含螢光粉,其混合於透光材料中。當LED晶片10之光線通過螢光層201,部分光線之波長將會改變,然後再繼續通過透光層202。 The phosphor structure 20 may include a phosphor layer 201 and at least one light transmissive layer 202, and at least one light transmissive layer 202 is formed on the phosphor layer 201, or the light transmissive layer 202 may be stacked on the phosphor layer. 201. The light transmissive layer 202 and the phosphor layer 201 can pass light, so that the manufacturing material can include a light transmissive material such as a light transmissive resin, and the material of the phosphor layer 201 further includes a phosphor powder, which is mixed with In the light-transmitting material. As the light from the LED wafer 10 passes through the phosphor layer 201, the wavelength of some of the light will change and then continue through the light transmissive layer 202.

透光層202雖然不會改變光線之波長,但可保護螢光層201,使得環境中的物質不易接觸到螢光層201。此外,透光層202還可增加螢光結構20的整體結構強度,以使得螢光結構20不易彎曲,提供生產上足夠的可操作性。 Although the light transmissive layer 202 does not change the wavelength of the light, the phosphor layer 201 can be protected so that substances in the environment do not easily contact the phosphor layer 201. In addition, the light transmissive layer 202 can also increase the overall structural strength of the phosphor structure 20 to make the phosphor structure 20 less flexible, providing sufficient operability in production.

螢光結構20位置上係設置於LED晶片10上,且螢光結構20之底面22位於LED晶片10之上表面11上,故頂面21及傾斜側面23亦位於LED晶片10之上表面11上。換言之,螢光結構20整體都位於LED晶片10之上表面11上。 The phosphor structure 20 is disposed on the LED chip 10 at a position, and the bottom surface 22 of the phosphor structure 20 is located on the upper surface 11 of the LED chip 10. Therefore, the top surface 21 and the inclined side surface 23 are also located on the upper surface 11 of the LED chip 10. . In other words, the phosphor structure 20 is entirely located on the upper surface 11 of the LED wafer 10.

較佳地,螢光結構20之底面22可透過一黏膠(例如矽膠)或膠帶等具有黏性之材料(圖未示)來黏貼至LED晶片10之上表面11,使得螢光結構20與LED晶片10之間的固定更佳。此外,螢光結構20之底面22可不小於(即大於或等於)LED晶片10之上表面11,故沿著法線方向往下觀察,螢光結構20可遮蔽LED晶片10。 Preferably, the bottom surface 22 of the phosphor structure 20 can be adhered to the upper surface 11 of the LED chip 10 through a viscous material (not shown) such as a glue (for example, silicone) or tape, so that the fluorescent structure 20 and The fixing between the LED chips 10 is better. In addition, the bottom surface 22 of the phosphor structure 20 can be no less than (ie, greater than or equal to) the upper surface 11 of the LED wafer 10, so that the fluorescent structure 20 can shield the LED wafer 10 as viewed downward in the normal direction.

反射結構30包覆LED晶片10之側面13及螢光結構20之傾斜側面23,而沒有包覆螢光結構20之頂面21;本實施例中,螢光結構20之傾斜側面23被完全地包覆。反射結構30可阻擋LED晶片10之光線,故光線在側面13及傾斜側面23處會被反射,而最終被導向頂面21。 The reflective structure 30 covers the side surface 13 of the LED chip 10 and the inclined side surface 23 of the fluorescent structure 20 without covering the top surface 21 of the fluorescent structure 20; in this embodiment, the inclined side surface 23 of the fluorescent structure 20 is completely Coated. The reflective structure 30 blocks the light from the LED wafer 10 so that the light is reflected at the side 13 and the inclined side 23 and ultimately directed to the top surface 21.

較佳地,反射結構30包覆側面13及傾斜側面23時,會貼合側面13及傾斜側面23,以使得反射結構30與側面13及傾斜側面23之間沒有間隙。因此,反射結構30具有與側面13相貼合的一內側面31,以及與傾斜側面23相貼合的一內導角(或稱內側斜面)32:由於傾斜側面23 為倒錐型側面,故相貼合的內導角32為倒錐型內側面,使反射結構30呈現內導角反射面。此外,反射結構30之一頂面33可齊平於螢光結構20之頂面21;反射結構30還具有一外側面35,其與內側面31及內側斜面32相分隔,且外側面35可為垂直面。 Preferably, when the reflective structure 30 covers the side surface 13 and the inclined side surface 23, the side surface 13 and the inclined side surface 23 are adhered so that there is no gap between the reflective structure 30 and the side surface 13 and the inclined side surface 23. Therefore, the reflecting structure 30 has an inner side surface 31 which is in contact with the side surface 13 and an inner guiding angle (or inner side inclined surface) 32 which is in contact with the inclined side surface 23: due to the inclined side surface 23 The inner tapered corner 32 is an inverted tapered inner side surface, so that the reflective structure 30 exhibits an inner corner reflecting surface. In addition, one top surface 33 of the reflective structure 30 can be flush with the top surface 21 of the fluorescent structure 20; the reflective structure 30 further has an outer side surface 35 separated from the inner side surface 31 and the inner side slope surface 32, and the outer side surface 35 can be It is a vertical surface.

在製造材料上,反射結構30可由包含一反射性樹脂之一材料所製成,反射性樹脂例如可為聚鄰苯二甲醯胺(polyphthalamide,即PPA)、聚對苯二甲酸環己烷二甲醇酯(Polycyclolexylene-di-methylene Terephthalate,即PCT)或熱固性環氧樹脂(Epoxy molding compound,即EMC)。 In the manufacturing material, the reflective structure 30 may be made of a material comprising a reflective resin, such as polyphthalamide (PPA) or poly(cyclohexane). Polycyclolexylene-di-methylene Terephthalate (PCT) or Epoxy molding compound (EMC).

反射結構30亦可由包含一可透光樹脂之另一材料所製成,且可透光樹脂包含反射性微粒。可透光樹脂例如可為矽膠或低反射係數矽膠(折射係數可為1.35至1.45左右),而反射性微粒可為二氧化鈦(TiO2)、氮化硼(BN)、二氧化矽(SiO2)或三氧化二鋁(Al2O3);反射性微粒的尺寸可設置成約為0.5倍的可見光波長。除了上述的製造材料外,反射結構30亦有可能由其他材料來製成。 The reflective structure 30 can also be made of another material comprising a light transmissive resin, and the light transmissive resin comprises reflective particles. The light transmissive resin may be, for example, silicone or low reflection coefficient silicone (having a refractive index of about 1.35 to 1.45), and the reflective particles may be titanium dioxide (TiO 2 ), boron nitride (BN), or cerium oxide (SiO 2 ). Or aluminum oxide (Al 2 O 3 ); the size of the reflective particles can be set to about 0.5 times the wavelength of visible light. In addition to the above-described materials of manufacture, the reflective structure 30 may also be made of other materials.

以上為發光裝置1A的各元件的技術內容,而發光裝置1A至少具有以下技術特點。 The above is the technical content of each element of the light-emitting device 1A, and the light-emitting device 1A has at least the following technical features.

如第13A圖所示,螢光結構20具有傾斜側面23,使得LED晶片10之光線L,或經由螢光層201(如第1圖所示)所轉換發出之光線,可沿著傾斜側面23更有效率地射出螢光結構20;換言之,傾斜側面23有利於將光線L導引射出螢光結構20之頂面21外,不易造成光線L被反射回螢光結構20或LED晶片10內,因而減少了光能量的損耗。因此,LED晶片10所發射出之光線L可良好地被汲取出螢光結構20外,使得發光裝置1A整體上有良好發光效率。與不具有傾斜側面的螢光結構20相比時(如第13B圖所示,光線L容易因臨界角的限制而大部分在頂面21被反射回螢光結構20或LED晶片10中),具有傾斜側面23的螢光結構20對於發光效率之提升,將可更容易理解。 As shown in FIG. 13A, the phosphor structure 20 has an inclined side surface 23 such that the light L of the LED wafer 10, or the light emitted by the phosphor layer 201 (as shown in FIG. 1), can be along the inclined side 23 The fluorescent structure 20 is more efficiently emitted; in other words, the inclined side surface 23 is configured to guide the light L out of the top surface 21 of the fluorescent structure 20, and the light L is not easily reflected back into the fluorescent structure 20 or the LED wafer 10. Thus, the loss of light energy is reduced. Therefore, the light L emitted from the LED wafer 10 can be well extracted from the fluorescent structure 20, so that the light-emitting device 1A as a whole has good luminous efficiency. When compared with the fluorescent structure 20 having no inclined sides (as shown in FIG. 13B, the light L is likely to be mostly reflected back to the fluorescent structure 20 or the LED wafer 10 on the top surface 21 due to the critical angle limitation), The phosphor structure 20 having the inclined side faces 23 will be more easily understood for the improvement of luminous efficiency.

此外,螢光結構20之傾斜側面23在改善光汲取效率之同時,亦可使發光裝置1A具有良好的空間光均勻性,可避免黃暈的產生。再者,傾斜側面23具有不同的傾斜角度時,會使發光裝置1A具有不同的發 光角度,故透過對傾斜角度的設計,可達到調整發光角度的目的。 In addition, the inclined side surface 23 of the fluorescent structure 20 can improve the light extraction efficiency, and can also have good spatial light uniformity of the light-emitting device 1A, thereby avoiding the generation of yellow halos. Moreover, when the inclined side faces 23 have different inclination angles, the light-emitting device 1A has different hairs. The angle of light, so through the design of the tilt angle, the purpose of adjusting the angle of illumination can be achieved.

螢光結構20除了能藉由傾斜側面23來增加發光效率外,亦可藉由調整透光層202之折射係數至小於螢光層201之折射係數來增加發光效率。也就是,透光層202的折射係數可介於螢光層201與空氣之間,使得LED晶片10之光線通過透光層202而進入至空氣時,可減少因為折射係數的差異而在介面上反射。 In addition to increasing the luminous efficiency by tilting the side surface 23, the fluorescent structure 20 can also increase the luminous efficiency by adjusting the refractive index of the light transmitting layer 202 to be smaller than the refractive index of the fluorescent layer 201. That is, the refractive index of the light transmissive layer 202 can be between the phosphor layer 201 and the air, so that when the light of the LED chip 10 enters the air through the light transmissive layer 202, the interface can be reduced due to the difference in refractive index. reflection.

若透光層202為兩個以上(圖未示),則該些透光層202的折射係數可相異(即兩個透光層202的製造材料不同),且在上方者的折射係數小於在下方者的折射係數。如此,可進一步提升發光效率。 If the light-transmitting layer 202 is two or more (not shown), the refractive indices of the light-transmitting layers 202 may be different (that is, the manufacturing materials of the two light-transmitting layers 202 are different), and the refractive index of the upper layer is smaller than The refractive index of the person below. In this way, the luminous efficiency can be further improved.

另一方面,螢光結構20可僅大於LED晶片10一點,故LED晶片10為小尺寸時,螢光結構20亦能設置成小尺寸;而用以包覆的反射結構30亦可設置成小尺寸,使得最終的發光裝置1A的尺寸為微小者。換言之,若發光裝置1A的尺寸需設計成微小者或是晶片級(chip scale),採用螢光結構20亦是可行,且還能增加發光效率等。在一示例中,發光裝置1A的寬度與長度係對應反射結構30的長度及寬度,而該寬度不大於2.0公釐,而該長度不大於3.0公釐。 On the other hand, the fluorescent structure 20 can be only a little larger than the LED chip 10. Therefore, when the LED chip 10 is small, the fluorescent structure 20 can also be set to a small size; and the reflective structure 30 for coating can also be set to be small. The size is such that the size of the final light-emitting device 1A is small. In other words, if the size of the light-emitting device 1A needs to be designed to be a small one or a chip scale, it is also possible to use the fluorescent structure 20, and it is also possible to increase luminous efficiency and the like. In one example, the width and length of the illumination device 1A correspond to the length and width of the reflective structure 30, and the width is no greater than 2.0 mm, and the length is no greater than 3.0 mm.

以上是發光裝置1A的技術內容的說明,接著將說明依據本發明其他實施例的發光裝置的技術內容,而各實施例的發光裝置的技術內容應可互相參考,故相同的部分將省略或簡化。 The above is the description of the technical content of the light-emitting device 1A. Next, the technical contents of the light-emitting device according to other embodiments of the present invention will be described, and the technical contents of the light-emitting devices of the respective embodiments should be referred to each other, so that the same portions will be omitted or simplified. .

請參閱第2圖所示,其為依據本發明之第2較佳實施例之發光裝置的示意圖。發光裝置1B與其他發光裝置不同處至少在於,發光裝置1B的螢光結構20中,透光層202形成於螢光層201之下。也就是,透光層202位於螢光層201與LED晶片10之上表面11之間,故螢光層201不會接觸到LED晶片10。因此,LED晶片10運作時所產生的熱能較不會影響到螢光層201,也就是,螢光層201的溫度較不會因為熱能而上升,故螢光層201在轉換光線波長的效率上,不易衰減。此外,螢光層201的折射係數可小於透光層202的折射係數,以增加發光效率。 Referring to Fig. 2, there is shown a schematic view of a light-emitting device according to a second preferred embodiment of the present invention. The light-emitting device 1B differs from the other light-emitting devices at least in that the light-transmitting layer 202 is formed under the fluorescent layer 201 in the fluorescent structure 20 of the light-emitting device 1B. That is, the light transmissive layer 202 is located between the phosphor layer 201 and the upper surface 11 of the LED wafer 10, so that the phosphor layer 201 does not contact the LED wafer 10. Therefore, the thermal energy generated when the LED chip 10 operates does not affect the phosphor layer 201, that is, the temperature of the phosphor layer 201 is less increased due to thermal energy, so the efficiency of the phosphor layer 201 in converting the wavelength of the light is , not easy to decay. Further, the refractive index of the phosphor layer 201 may be smaller than the refractive index of the light transmissive layer 202 to increase luminous efficiency.

請參閱第3圖所示,其為依據本發明之第3較佳實施例之發光裝置的示意圖。發光裝置1C與其他發光裝置不同處至少在於,發光裝置1C的螢光結構20更包含一透鏡陣列層203,其形成於螢光層201上。 透鏡陣列層203可與透光層202一體成型,故透光層202可視為透鏡陣列層203的一部分;透鏡陣列層203可高於反射結構30的頂面33,使得螢光結構20的頂面21高於反射結構30的頂面33。透鏡陣列層203可進一步增加發光裝置1C的發光效率。 Referring to Fig. 3, there is shown a schematic view of a light-emitting device according to a third preferred embodiment of the present invention. The light-emitting device 1C is different from the other light-emitting devices at least in that the fluorescent structure 20 of the light-emitting device 1C further includes a lens array layer 203 formed on the fluorescent layer 201. The lens array layer 203 can be integrally formed with the light transmissive layer 202, so that the light transmissive layer 202 can be regarded as a part of the lens array layer 203; the lens array layer 203 can be higher than the top surface 33 of the reflective structure 30 such that the top surface of the fluorescent structure 20 21 is higher than the top surface 33 of the reflective structure 30. The lens array layer 203 can further increase the luminous efficiency of the light-emitting device 1C.

請參閱第4圖所示,其為依據本發明之第4較佳實施例之發光裝置的示意圖。發光裝置1D與其他發光裝置不同處至少在於,發光裝置1D的螢光結構20包含複數透光層202,且螢光層201形成於該些透光層202之間。這樣的配置下,透光層202可保護螢光層201,且可降低LED晶片10的熱能對螢光層201的影響。此外,螢光層201的折射係數可小於位於下方的透光層202的折射係數,但大於位於上方的透光層202的折射係數,以增加發光效率。 Referring to Fig. 4, there is shown a schematic view of a light-emitting device according to a fourth preferred embodiment of the present invention. The light emitting device 1D is different from the other light emitting devices at least in that the fluorescent structure 20 of the light emitting device 1D includes a plurality of light transmitting layers 202, and the fluorescent layer 201 is formed between the light transmitting layers 202. In such a configuration, the light transmissive layer 202 can protect the phosphor layer 201 and can reduce the influence of the thermal energy of the LED wafer 10 on the phosphor layer 201. Further, the refractive index of the phosphor layer 201 may be smaller than the refractive index of the light transmissive layer 202 located below, but larger than the refractive index of the light transmissive layer 202 located above to increase the luminous efficiency.

請參閱第5圖所示,其為依據本發明之第5較佳實施例之發光裝置的示意圖。發光裝置1E與其他發光裝置不同處至少在於,發光裝置1E的螢光結構20為一單層螢光結構,也就是僅包含螢光層201,而沒有透光層。因此,螢光層201的厚度可較大,能將較多比例的光線轉換波長,適用於需大量轉換光線波長的LED發光裝置,例如低色溫的白光LED。 Referring to Fig. 5, there is shown a schematic view of a light-emitting device according to a fifth preferred embodiment of the present invention. The light-emitting device 1E is different from the other light-emitting devices at least in that the fluorescent structure 20 of the light-emitting device 1E is a single-layer fluorescent structure, that is, only the fluorescent layer 201 is included, and there is no light-transmitting layer. Therefore, the thickness of the phosphor layer 201 can be large, and a large proportion of light can be converted into a wavelength, which is suitable for an LED light-emitting device that requires a large amount of converted light wavelength, such as a white LED with a low color temperature.

請參閱第6圖所示,其為依據本發明之第6較佳實施例之發光裝置的示意圖。發光裝置1F與其他發光裝置不同處至少在於,發光裝置1F更包括一基板40,而LED晶片10及反射結構30皆設置於基板40上,LED晶片10的電極組14還進一步電性連接至基板40。基板40為能傳遞電能的元件,(例如電路板、支架等),故透過基板40可將電能供應至發光裝置1F中。反射結構30可進一步延伸至LED晶片10的下表面12與基板40之間。 Please refer to FIG. 6, which is a schematic diagram of a light-emitting device according to a sixth preferred embodiment of the present invention. The illuminating device 1F is different from the other illuminating devices. The illuminating device 1F further includes a substrate 40. The LED chip 10 and the reflective structure 30 are disposed on the substrate 40. The electrode assembly 14 of the LED chip 10 is further electrically connected to the substrate. 40. The substrate 40 is an element capable of transmitting electrical energy (for example, a circuit board, a bracket, etc.), so that electric energy can be supplied to the light-emitting device 1F through the substrate 40. The reflective structure 30 can further extend between the lower surface 12 of the LED wafer 10 and the substrate 40.

請參閱第7圖所示,其為依據本發明之第7較佳實施例之發光裝置的示意圖。發光裝置1G與其他發光裝置不同處至少在於,發光裝置1G的螢光結構20的頂面21高於反射結構30之頂面33,且螢光結構20之傾斜側面23部分地露出於反射結構30。換言之,反射結構30僅部分地包覆螢光結構20之傾斜側面23。由於反射結構30的頂面33低於螢光結構20的頂面21,故反射結構30在形成時,不會蔓延到螢光結構20的頂面21,因此增加了製程誤差容許量,可有效提升良率與產能,故可不需藉助於模 具(詳細說明可參閱後述實施例中的製造方法)而進一步降低生產成本。 Referring to Fig. 7, there is shown a schematic view of a light-emitting device according to a seventh preferred embodiment of the present invention. The light emitting device 1G is different from the other light emitting devices at least in that the top surface 21 of the fluorescent structure 20 of the light emitting device 1G is higher than the top surface 33 of the reflective structure 30, and the inclined side surface 23 of the fluorescent structure 20 is partially exposed to the reflective structure 30. . In other words, the reflective structure 30 only partially covers the sloped side 23 of the phosphor structure 20. Since the top surface 33 of the reflective structure 30 is lower than the top surface 21 of the fluorescent structure 20, the reflective structure 30 does not spread to the top surface 21 of the fluorescent structure 20 when formed, thereby increasing the tolerance of the process error, which is effective. Improve yield and productivity, so you don’t need to resort to The production method can be further reduced by referring to the manufacturing method in the later-described embodiment.

請參閱第8圖所示,其為依據本發明之第8較佳實施例之發光裝置的示意圖。發光裝置1H與其他發光裝置不同處至少在於,發光裝置1H的反射結構30雖完整地包覆螢光結構20的傾斜側面23,但反射結構30之頂面33並非一平面,而是從內導角32漸漸地向下傾斜;換言之,反射結構30之頂面33是從螢光結構20之頂面21向下凹陷。這種型態的反射結構30在形成時,亦可增加製程誤差容許量。 Referring to Fig. 8, there is shown a schematic view of a light-emitting device according to an eighth preferred embodiment of the present invention. The light-emitting device 1H is different from the other light-emitting devices at least in that the reflective structure 30 of the light-emitting device 1H completely covers the inclined side surface 23 of the fluorescent structure 20, but the top surface 33 of the reflective structure 30 is not a flat surface but is guided from the inside. The corner 32 is gradually inclined downward; in other words, the top surface 33 of the reflective structure 30 is recessed downward from the top surface 21 of the fluorescent structure 20. This type of reflective structure 30 can also increase the tolerance of the process error when formed.

請參閱第9圖所示,其為依據本發明之第9較佳實施例之發光裝置的示意圖。發光裝置1I與其他發光裝置不同處至少在於,發光裝置1I的螢光結構20的頂面21可在法線方向上,遮蔽住反射結構30;也就是,沿著法線方向往下觀察,僅會觀察到螢光結構20,而觀察不到反射結構30。如此,反射結構30的寬度及長度將進一步縮減,使得發光裝置1I能具有更小的尺寸。 Referring to Fig. 9, there is shown a schematic view of a light-emitting device according to a ninth preferred embodiment of the present invention. The light-emitting device 1I is different from the other light-emitting devices at least in that the top surface 21 of the fluorescent structure 20 of the light-emitting device 1I can shield the reflective structure 30 in the normal direction; that is, viewed downward along the normal direction, only The fluorescent structure 20 is observed, and the reflective structure 30 is not observed. As such, the width and length of the reflective structure 30 will be further reduced, enabling the illumination device 1I to have a smaller size.

請參閱第10圖所示,其為依據本發明之第10較佳實施例之發光裝置的示意圖。發光裝置1J與其他發光裝置不同處至少在於,發光裝置1J的螢光結構20可使反射結構30之底面34向上傾斜。具體而言,當反射結構30在形成時,是由一液態的製造材料在較高溫度固化而成,而固化的過程會造成反射結構30的體積縮減,降溫過程亦會造成反射結構30與螢光結構20的體積縮減。由於螢光結構20與反射結構30相貼合,當兩者體積縮減時,反射結構30的底面34會因應變形而向上傾斜。 Referring to Fig. 10, there is shown a schematic view of a light-emitting device according to a tenth preferred embodiment of the present invention. The light-emitting device 1J differs from other light-emitting devices at least in that the fluorescent structure 20 of the light-emitting device 1J can tilt the bottom surface 34 of the reflective structure 30 upward. Specifically, when the reflective structure 30 is formed, it is formed by curing a liquid manufacturing material at a relatively high temperature, and the curing process causes the volume of the reflective structure 30 to be reduced, and the cooling process also causes the reflective structure 30 and the fluorescent structure. The volume of the light structure 20 is reduced. Since the fluorescent structure 20 is attached to the reflective structure 30, when the volume is reduced, the bottom surface 34 of the reflective structure 30 is inclined upward in response to the deformation.

底面34的向上傾斜量X相關連於螢光結構20與反射結構30的材料特性及尺寸差異等因素,故調整該些因素可得到所需的向上傾斜量X。較佳地,向上傾斜量X至少為3微米。 The amount of upward tilt X of the bottom surface 34 is related to factors such as material characteristics and dimensional differences of the fluorescent structure 20 and the reflective structure 30, so adjusting the factors can obtain the required amount of upward tilt X. Preferably, the amount of upward tilt X is at least 3 microns.

底面34的向上傾斜可提供以下的有益效果:當發光裝置1J接合至一基板(圖未示)的過程中,常會對發光裝置1J及基板施加熱能(例如在迴焊製程或共晶接合的情況時,皆須施加熱能),而熱能會造成反射結構30及螢光結構20膨脹;若沒有向上傾斜時,膨脹的反射結構30的底面34可能推擠基板,然後造成發光裝置1J被抬升,進而造成接合失敗;然而,本實施例的發光裝置1J的反射結構30的底面34不會推擠基板,因為底面34係向上傾斜。 The upward tilting of the bottom surface 34 provides the following beneficial effects: when the light emitting device 1J is bonded to a substrate (not shown), thermal energy is often applied to the light emitting device 1J and the substrate (for example, in a reflow process or eutectic bonding). When heat is applied, the thermal energy causes the reflective structure 30 and the fluorescent structure 20 to expand; if not tilted upward, the bottom surface 34 of the expanded reflective structure 30 may push the substrate, and then cause the light-emitting device 1J to be lifted, thereby The joint failure is caused; however, the bottom surface 34 of the reflective structure 30 of the light-emitting device 1J of the present embodiment does not push the substrate because the bottom surface 34 is inclined upward.

在上述的實施例中的發光裝置1A-1J中,其技術內容應可互相應用,並不限定於本身的實施例中。例如,發光裝置1C的透鏡陣列層203、發光裝置1F的基板40、發光裝置1J的向上傾斜的底面34等皆可應用於其他實施例的發光裝置中(圖未示)。又,在發光裝置1A-1J中,該螢光結構20皆可依設計需求將螢光層201與透光層202增加為複數個,並適當調整其堆疊順序,或於螢光結構20中適當加入二氧化鈦(TiO2)等填充材料,使整體上獲得最佳效果。 In the light-emitting devices 1A to 1J of the above-described embodiments, the technical contents thereof should be applicable to each other, and are not limited to the embodiments thereof. For example, the lens array layer 203 of the light-emitting device 1C, the substrate 40 of the light-emitting device 1F, the upwardly inclined bottom surface 34 of the light-emitting device 1J, and the like can be applied to the light-emitting device of other embodiments (not shown). In the illuminating device 1A-1J, the fluorescent structure 20 can be added to the plurality of the fluorescent layer 201 and the transparent layer 202 according to design requirements, and the stacking order can be appropriately adjusted, or appropriately in the fluorescent structure 20. A filler such as titanium oxide (TiO 2 ) is added to obtain the best effect as a whole.

再者,發光裝置1A-1J的技術內容亦可應用於製作發出單色光的發光裝置(monochromatic LED)1K,如第22A圖所示,發光裝置1K將前述實施例的螢光結構20以一透明材料所構成的透明結構20’來替代,即該透明結構20’不包含螢光層或螢光材料,藉此LED晶片10所發出的光其波長在通過透明結構20’時並不會被轉換。如此,可用以製作紅光、綠光、藍光、紅外光或紫外光等單色光的小尺寸發光裝置,其亦同時具有小發散角、出光面積小以利二次透鏡設計、熱阻小及可調整發光角度等效益。 Furthermore, the technical contents of the light-emitting devices 1A-1J can also be applied to the production of a monochromatic LED 1K that emits monochromatic light. As shown in FIG. 22A, the light-emitting device 1K has the fluorescent structure 20 of the foregoing embodiment as a Instead of the transparent structure 20' formed by the transparent material, the transparent structure 20' does not contain a phosphor layer or a fluorescent material, whereby the light emitted by the LED wafer 10 does not pass through the transparent structure 20'. Conversion. Thus, a small-sized light-emitting device capable of producing monochromatic light such as red light, green light, blue light, infrared light, or ultraviolet light has a small divergence angle and a small light-emitting area to facilitate secondary lens design and low thermal resistance. Can adjust the luminous angle and other benefits.

又由於部分的應用場合需要高指向性的光源,進一步縮小發散角有其必要性。如第22B圖所示,當該透明結構20’之側面傾斜角為零時(即成為垂直側面23’),可獲得更小的發散角。此發散角又可透過增加反射結構30的高度H進一步縮減。較佳地,反射結構30的高度H不小於0.1倍的LED晶片10的長度W,不大於5倍的LED晶片10的長度W(即深寬比0.1≦H/W≦5)。雖然垂直側面23’的透明結構20’會犧牲整體出光效率,但縮小後的發散角卻可以使光能量更為集中,造成特定方向的單位面積光通量(即照度)增加,因而符合高指向性光源的應用。較佳地,該透明結構20’採用低折射係數之透明材料所製成,折射係數越接近1,對於照度增加的效果越好。 Since some applications require high directivity light sources, it is necessary to further reduce the divergence angle. As shown in Fig. 22B, when the side surface inclination angle of the transparent structure 20' is zero (i.e., becomes the vertical side surface 23'), a smaller divergence angle can be obtained. This divergence angle can in turn be further reduced by increasing the height H of the reflective structure 30. Preferably, the height H of the reflective structure 30 is not less than 0.1 times the length W of the LED wafer 10, and is not more than 5 times the length W of the LED wafer 10 (ie, the aspect ratio is 0.1 ≦H/W ≦ 5). Although the transparent structure 20' of the vertical side 23' sacrifices the overall light extraction efficiency, the reduced divergence angle can concentrate the light energy, causing an increase in the luminous flux per unit area (i.e., illuminance) in a specific direction, thereby conforming to the high directivity light source. Applications. Preferably, the transparent structure 20' is made of a transparent material having a low refractive index, and the closer the refractive index is to 1, the better the effect of increasing the illuminance.

此外,若將一螢光層201’(如第22D圖所示)設置於該透明結構20’的底部,則可進一步符合高指向性白光光源的應用。例如第22C圖所示者,當發光裝置之螢光材料為均勻分布於透明結構20’中,光L遇到螢光材料時將產生散射(scattering)而無法利用反射結構30提高光的指向性;因此,將螢光層201’設置於透明結構20’的底部(且可堆疊於LED晶片10上)可避免光L在透明結構20’內產生散射。例如第22D圖所示,在 透明結構20’內無散射的狀況下,大入射角(與垂直方向夾角大)的光L將多次地被反射結構30所反射,造成其光強度快速衰減,而不易脫離透明結構20’(因為光L易在透明結構20’之頂面反射而回到透明結構20’內);又如第22E圖所示,小入射角(與垂直方向夾角小)的光L很少被反射結構30所反射,容易脫離透明結構20’。如此,發光裝置1K可篩選掉大部分具有大入射角的光L,使整體所發出的光L具有較小的發散角與較高的指向性。 Further, if a phosphor layer 201' (as shown in Fig. 22D) is disposed at the bottom of the transparent structure 20', the application of the high directivity white light source can be further satisfied. For example, as shown in FIG. 22C, when the fluorescent material of the light-emitting device is uniformly distributed in the transparent structure 20', the light L will be scattered when it encounters the fluorescent material, and the directivity of the light cannot be improved by the reflective structure 30. Therefore, disposing the phosphor layer 201' at the bottom of the transparent structure 20' (and stackable on the LED wafer 10) can prevent the light L from being scattered within the transparent structure 20'. As shown in Figure 22D, in In the case where there is no scattering in the transparent structure 20', the light L having a large incident angle (large angle with the vertical direction) will be reflected by the reflection structure 30 a plurality of times, causing the light intensity to be rapidly attenuated, and it is not easy to be separated from the transparent structure 20' ( Since the light L is easily reflected back on the top surface of the transparent structure 20' and returned to the transparent structure 20'); as shown in Fig. 22E, the light L having a small incident angle (small angle with the vertical direction) is rarely reflected by the structure 30. Reflected, it is easy to get detached from the transparent structure 20'. Thus, the light-emitting device 1K can filter out most of the light L having a large incident angle, so that the light L emitted as a whole has a small divergence angle and a high directivity.

上述的發光裝置1K亦可為一晶片級封裝的發光裝置,即在長度及寬度上透明結構20’等於或略大於LED晶片10,而反射結構30略大於LED晶片10。如此,發光裝置1K能改善目前已知的發光裝置無法符合具有小發散角之晶片級封裝的缺失。 The above-described light-emitting device 1K may also be a wafer-level packaged light-emitting device, that is, the transparent structure 20' is equal to or slightly larger than the LED wafer 10 in length and width, and the reflective structure 30 is slightly larger than the LED wafer 10. As such, the light-emitting device 1K can improve the current known light-emitting device from failing to conform to the wafer-level package having a small divergence angle.

接著將說明依據本發明的較佳實施例的發光裝置的製造方法,該製造方法可製造出相同或類似於上述實施例的發光裝置1A-1J,故製造方法的技術內容與發光裝置1A-1J的技術內容可相互參考。製造方法可包含三大階段:形成具有一倒錐形側面之一螢光結構;將螢光結構設置於一LED晶片上,以形成一發光結構;以及將發光結構之側面進行包覆,以形成一具有倒錐形內導角之反射結構。各階段的技術內容依序說明如下。 Next, a method of manufacturing a light-emitting device according to a preferred embodiment of the present invention, which can manufacture the light-emitting devices 1A-1J which are the same or similar to the above-described embodiments, and the technical contents of the manufacturing method and the light-emitting devices 1A-1J will be described. The technical content can be referred to each other. The manufacturing method may comprise three stages: forming a fluorescent structure having a reverse tapered side; placing the fluorescent structure on an LED wafer to form a light emitting structure; and coating the side of the light emitting structure to form A reflective structure having an inverted tapered inner corner. The technical contents of each stage are described in the following order.

螢光結構20的形成可分成間接形成或直接形成,間接形成是指:先形成一螢光薄膜後,再將螢光薄膜分成複數個螢光結構。請參閱第11A圖至第11D圖所示,其為「形成螢光薄膜」的步驟示意圖。如第11A圖所示,首先提供一輔助材(例如離型膜)50,而輔助材50還可放置於一支撐結構(例如矽基板或玻璃基板,圖未示)上。 The formation of the fluorescent structure 20 can be divided into indirect formation or direct formation. Indirect formation means that after forming a fluorescent film, the fluorescent film is divided into a plurality of fluorescent structures. Please refer to FIGS. 11A to 11D, which are schematic diagrams of the steps of "forming a fluorescent film". As shown in Fig. 11A, an auxiliary material (e.g., release film) 50 is first provided, and the auxiliary material 50 may be placed on a support structure (e.g., a ruthenium substrate or a glass substrate, not shown).

如第11B圖所示,接著將螢光層201形成於輔助材50上,可藉由噴塗(spray coating)、印刷(printing)、或模造(molding)等製程來達成,也就是,將螢光層201的製造材料藉由這些製程設置於輔助材50上,製造材料固化後即可形成螢光層201。公開號US2010/0119839及US2010/0123386之美國專利申請案所揭露的螢光層的形成方法亦可應用於本實施例中,其可良好地控制螢光層的厚度及均勻性;該兩美國專利申請案的技術內容以引用方式全文併入本文。 As shown in FIG. 11B, the phosphor layer 201 is then formed on the auxiliary material 50, which can be achieved by a process such as spray coating, printing, or molding, that is, fluorescent light. The manufacturing material of the layer 201 is disposed on the auxiliary material 50 by these processes, and the fluorescent layer 201 can be formed after the manufacturing material is cured. The method for forming a phosphor layer disclosed in U.S. Patent Application Publication No. US-A-2010/0119839 and U.S. Patent Application Publication No. 2010/0123386 is also applicable to the present embodiment, which can well control the thickness and uniformity of the phosphor layer; The technical content of the application is hereby incorporated by reference in its entirety.

如第11C圖所示,接著將透光層202形成於螢光層201上, 可藉由噴塗、印刷、模造或點膠(dispensing)等製程來達成。若需形成兩個以上的透光層202時,則噴塗製程較為適合。如第11D圖所示,當透光層202形成後,可將輔助材50移除,以得到透光層202與螢光層201所構成的一螢光薄膜200。螢光薄膜200可對應發光裝置1A的螢光結構20(如第1圖所示),亦可對應發光裝置1G、1H及1J的螢光結構20(如第7、8及10圖所示),藉由將製作完成的螢光薄膜200於切割時上下反置,即可對應發光裝置1B的螢光結構20(如第2圖所示)。 As shown in FIG. 11C, the light transmissive layer 202 is then formed on the phosphor layer 201, This can be achieved by processes such as spraying, printing, molding or dispensing. If more than two light transmissive layers 202 are to be formed, the spraying process is suitable. As shown in FIG. 11D, after the light transmissive layer 202 is formed, the auxiliary material 50 can be removed to obtain a phosphor film 200 composed of the light transmissive layer 202 and the phosphor layer 201. The fluorescent film 200 can correspond to the fluorescent structure 20 of the light-emitting device 1A (as shown in FIG. 1), and can also correspond to the fluorescent structure 20 of the light-emitting devices 1G, 1H and 1J (as shown in Figures 7, 8, and 10). By making the finished fluorescent film 200 upside down at the time of cutting, the fluorescent structure 20 of the light-emitting device 1B can be correspondingly (as shown in FIG. 2).

藉由改變透光層202與螢光層201的形成順序,可得到不同的螢光薄膜200,例如第12A圖至第12C圖所示,透光層202、螢光層201及另一透光層202依序形成於輔助材50上,以構成一對應發光裝置1D的螢光結構20(如第4圖所示)的螢光薄膜200。又如第14圖所示,輔助材50上僅有形成螢光層201,故可構成一對應發光裝置1E、1F及1I的螢光結構20(如第5、6及9圖所示)的螢光薄膜200。 By changing the order of formation of the light-transmitting layer 202 and the phosphor layer 201, different phosphor films 200 can be obtained, for example, as shown in FIGS. 12A to 12C, the light-transmitting layer 202, the phosphor layer 201, and another light-transmitting layer. The layer 202 is sequentially formed on the auxiliary material 50 to constitute a fluorescent film 200 corresponding to the fluorescent structure 20 (shown in FIG. 4) of the light-emitting device 1D. As shown in Fig. 14, only the phosphor layer 201 is formed on the auxiliary material 50, so that a fluorescent structure 20 corresponding to the light-emitting devices 1E, 1F and 1I (as shown in Figs. 5, 6 and 9) can be formed. Fluorescent film 200.

再如第15圖所示,在形成螢光層201後,可於螢光層201上形成一透鏡陣列層203。透鏡陣列層203的形成可藉由模造,也就是,將螢光層201及輔助材50放置於一模具(圖未示)中,然後將透鏡陣列層203的製造材料注入至模具中,製造材料固化可形成透鏡陣列層203。此種螢光層201和透鏡陣列層203所構成的螢光薄膜200可對應發光裝置1C的螢光結構20(如第3圖所示)。 Further, as shown in Fig. 15, after the phosphor layer 201 is formed, a lens array layer 203 can be formed on the phosphor layer 201. The lens array layer 203 can be formed by molding, that is, the phosphor layer 201 and the auxiliary material 50 are placed in a mold (not shown), and then the manufacturing material of the lens array layer 203 is injected into the mold to fabricate the material. Curing can form the lens array layer 203. The fluorescent film 200 composed of the phosphor layer 201 and the lens array layer 203 can correspond to the fluorescent structure 20 of the light-emitting device 1C (as shown in FIG. 3).

當各種螢光薄膜200形成後,可藉由沖切(punching)來將螢光薄膜200分成複數個具有一傾斜側面之部分,而其中一個該部分為該螢光結構20。 After the various fluorescent films 200 are formed, the fluorescent film 200 can be divided into a plurality of portions having an inclined side surface by punching, and one of the portions is the fluorescent structure 20.

具體而言,請參閱第16A圖及第16B圖所示,螢光薄膜200先被翻轉後以底面朝上被放置於另一輔助材50’上,然後一沖切刀具60從上方來沖切螢光薄膜200。請參閱第16C圖所示,沖切刀具60係具有複數個刀刃61,且該些刀刃61相連接,並依據螢光結構20之外型來排列,例如排列成矩型。因此,當沖切刀具60沖切螢光薄膜200時,如第16D圖及第16E圖所示,螢光薄膜200將會分成複數個螢光結構20;也就是,沖切一次即可形成複數個螢光結構20。該些螢光結構20的底面22是朝向沖切刀具60的刀刃61。另外,如第16F圖所示,若沖切的螢光薄膜200包含透 鏡陣列層203時,則透鏡陣列層203被放置於輔助材50’上。 Specifically, referring to FIGS. 16A and 16B, the fluorescent film 200 is first turned over and placed on the other auxiliary material 50' with the bottom surface facing upward, and then a punching cutter 60 is punched from above. Fluorescent film 200. Referring to Fig. 16C, the punching cutter 60 has a plurality of cutting edges 61, and the cutting edges 61 are connected and arranged according to the outer shape of the fluorescent structure 20, for example, arranged in a rectangular shape. Therefore, when the punching cutter 60 punches the fluorescent film 200, as shown in FIGS. 16D and 16E, the fluorescent film 200 is divided into a plurality of fluorescent structures 20; that is, a plurality of fluorescent structures 20 can be formed by punching once. A fluorescent structure 20. The bottom surface 22 of the phosphor structures 20 is a blade 61 that faces the die cutting tool 60. In addition, as shown in FIG. 16F, if the die-cut fluorescent film 200 is transparent In the case of the mirror array layer 203, the lens array layer 203 is placed on the auxiliary material 50'.

由此可知,沖切方式可將螢光薄膜200快速地分成複數個螢光結構20。此外,螢光結構20的傾斜側面23的傾斜角度亦可透過數個因素予以控制,例如調整刀刃61的角度(或剖面)、螢光結構20的幾何尺寸及/或螢光薄膜200的材料性質等因素。因此,當事先設定好這些因素後,即可得到所需的傾斜側面23。 It can be seen that the punching method can quickly divide the fluorescent film 200 into a plurality of fluorescent structures 20. In addition, the inclination angle of the inclined side surface 23 of the fluorescent structure 20 can also be controlled by several factors, such as adjusting the angle (or section) of the cutting edge 61, the geometry of the fluorescent structure 20, and/or the material properties of the fluorescent film 200. And other factors. Therefore, when these factors are set in advance, the desired inclined side surface 23 can be obtained.

除了沖切外,亦可採取鋸切(sawing)、精密切削(precision machining)或微加工(micro machining)等方式來將螢光薄膜200形成複數個螢光結構20。請參閱第17圖所示,一鋸輪或雙角銑刀(dual angle milling cutter)70多次地切割螢光薄膜200,以使螢光薄膜200分成複數個螢光結構20;該些螢光結構20的底面22是朝向鋸輪或雙角銑刀70的刀刃71。螢光結構20的傾斜側面23的傾斜角度可由刀刃71的角度(或剖面)來控制。在微加工方式中,可使用阻擋層沈積、形狀定義與蝕刻等步驟來形成螢光結構20。 In addition to die cutting, the fluorescent film 200 may be formed into a plurality of fluorescent structures 20 by means of sawing, precision machining, or micro machining. Referring to FIG. 17, a saw wheel or a dual angle milling cutter cuts the fluorescent film 200 more than 70 times, so that the fluorescent film 200 is divided into a plurality of fluorescent structures 20; The bottom surface 22 of the structure 20 is a blade 71 that faces the saw wheel or the double angle milling cutter 70. The angle of inclination of the inclined side surface 23 of the fluorescent structure 20 can be controlled by the angle (or section) of the blade 71. In the micromachining mode, the steps of barrier deposition, shape definition, and etching can be used to form the phosphor structure 20.

上述方式係從螢光薄膜200來間接地形成螢光結構20,若以模造(molding)或微加工(micro machining)等方式可直接地形成螢光結構20。具體而言,在模造方式中,一模具(圖未示)將被提供,其模穴的形狀對應螢光結構20的外觀,然後螢光結構20的製造材料將注入至模穴中,製造材料固化後可形成螢光結構20。在微加工方式中,以塗佈、曝光、顯影及/或蝕刻等步驟來形成螢光結構20。模造及微加工之方式亦可以批次生產方式同時製作出複數個螢光結構20。 In the above manner, the fluorescent structure 20 is indirectly formed from the fluorescent film 200, and the fluorescent structure 20 can be directly formed by molding or micro machining. Specifically, in the molding mode, a mold (not shown) is provided, the shape of the cavity corresponds to the appearance of the fluorescent structure 20, and then the material of the fluorescent structure 20 is injected into the cavity to manufacture the material. The phosphor structure 20 can be formed after curing. In the micromachining mode, the phosphor structure 20 is formed by steps of coating, exposure, development, and/or etching. Molding and micromachining methods can also be used to produce a plurality of fluorescent structures 20 simultaneously in a batch production mode.

除了可透光樹脂等軟性透光材料之外,視應用需求亦可使用玻璃、陶瓷等脆性透光材料來形成螢光結構20。其中,在間接方法中,可以採用燒結等方法先形成螢光薄板,再使用鋸切(sawing)等方法形成複數個螢光結構20;在直接方法中,可將螢光材料與透光材料粉末置入模穴中,再進行燒結直接形成複數個螢光結構20;而此螢光結構20的製作方法亦可應用於製作透明結構20’。此外,將透明玻璃基板或透明陶瓷基板直接經由鋸切等方法亦可形成複數個透明結構20’。 In addition to the soft light transmissive material such as a light transmissive resin, the phosphor structure 20 may be formed using a brittle light transmissive material such as glass or ceramic depending on the application. Wherein, in the indirect method, a fluorescent thin plate may be formed by a method such as sintering, and a plurality of fluorescent structures 20 may be formed by a method such as sawing; in the direct method, the fluorescent material and the transparent material powder may be used. The plurality of fluorescent structures 20 are directly formed by being placed in the cavity, and then sintered. The method of fabricating the fluorescent structure 20 can also be applied to the transparent structure 20'. Further, a plurality of transparent structures 20' may be formed by directly cutting a transparent glass substrate or a transparent ceramic substrate by a sawing or the like.

接著說明「發光結構之形成」。請參閱第18A圖,首先複數個LED晶片10被間隔地放置在另一輔助材50”上,輔助材50”可為紫外線 解黏膠帶(UV release tape)或熱解黏膠帶(thermal release tape)等。此外,LED晶片10可受壓而使其的電極組14嵌入至輔助材50”而不外露。若LED晶片10下方有設置一基板40時(如第6圖所示),則不須使用輔助材50”。 Next, the "formation of the light-emitting structure" will be described. Referring to FIG. 18A, first, a plurality of LED chips 10 are placed at intervals on another auxiliary material 50", and the auxiliary material 50" may be ultraviolet rays. UV release tape or thermal release tape. In addition, the LED chip 10 can be pressed so that the electrode group 14 is embedded in the auxiliary material 50" without being exposed. If a substrate 40 is disposed under the LED wafer 10 (as shown in FIG. 6), no auxiliary is needed. 50".

請參閱第18B圖,接著將螢光結構20放置於LED晶片10之上表面11,且螢光結構20的傾斜側面23露出於上表面11之外;螢光結構20可透過黏膠或膠帶來黏貼至LED晶片10之上表面11。如此,螢光結構20及LED晶片10可形成一發光結構。 Referring to FIG. 18B, the fluorescent structure 20 is then placed on the upper surface 11 of the LED chip 10, and the inclined side surface 23 of the fluorescent structure 20 is exposed outside the upper surface 11; the fluorescent structure 20 can be passed through the adhesive or tape. Adhered to the upper surface 11 of the LED wafer 10. As such, the phosphor structure 20 and the LED wafer 10 can form a light emitting structure.

接著說明「反射結構之形成」。反射結構30之形成是將LED晶片10之側面13及螢光結構20之傾斜側面23共同(即同時)進行包覆,而具體的方式至少有模造及點膠兩種。請參閱第19圖所示,採取模造時,螢光結構20、LED晶片10及輔助材50”將被放置於一模具(圖未示)中,然後將反射結構30的製造材料注入至模具中,並包覆LED晶片10之側面13及螢光結構20之傾斜側面23;當製造材料固化後,反射結構30即可形成。此種作法下的反射結構30可包覆全部的傾斜側面23。 Next, the "formation of the reflective structure" will be described. The reflective structure 30 is formed by coating the side surface 13 of the LED chip 10 and the inclined side surface 23 of the fluorescent structure 20 together (ie, simultaneously), and the specific manner is at least two types of molding and dispensing. Referring to FIG. 19, when the molding is performed, the fluorescent structure 20, the LED wafer 10 and the auxiliary material 50" will be placed in a mold (not shown), and then the manufacturing material of the reflective structure 30 is injected into the mold. And covering the side surface 13 of the LED chip 10 and the inclined side surface 23 of the fluorescent structure 20; when the manufacturing material is cured, the reflective structure 30 can be formed. The reflective structure 30 in this manner can cover all the inclined side surfaces 23.

採取點膠時,則不需要上述的模具。反射結構30的製造材料將直接地澆淋至輔助材50”上,然後製造材料會在輔助材50”漸漸增厚,以包覆LED晶片10之側面13及螢光結構20之傾斜側面23,所澆淋的製造材料不會超過螢光結構20之頂面21。當輕微減少所澆淋的製造材料時,其固化所形成的反射結構30將會如同第7圖及第8圖所示者。 When dispensing, the above mold is not required. The material from which the reflective structure 30 is fabricated will be directly poured onto the auxiliary material 50", and then the material will be gradually thickened in the auxiliary material 50" to cover the side 13 of the LED wafer 10 and the inclined side 23 of the fluorescent structure 20. The material to be poured does not exceed the top surface 21 of the phosphor structure 20. When the poured manufacturing material is slightly reduced, the reflective structure 30 formed by curing will be as shown in Figs. 7 and 8.

當反射結構30形成後,如第20圖所示,輔助材50”將可移除,以得到複數個發光裝置1A(或其他類型的發光裝置)。該些發光裝置1A的反射結構30可能會相連接,因此可再採取一切割步驟(如第21圖所示)以將相連接的反射結構30切割分離,便到相互分離的發光裝置1A。 After the reflective structure 30 is formed, as shown in Fig. 20, the auxiliary material 50" will be removable to obtain a plurality of light-emitting devices 1A (or other types of light-emitting devices). The reflective structures 30 of the light-emitting devices 1A may be The electrodes are connected so that a further cutting step (as shown in Fig. 21) can be taken to cut and separate the connected reflective structures 30 to the mutually separated light-emitting devices 1A.

綜合上述,本實施例中的發光裝置的製造方法可製造出各種具有傾斜側面的螢光結構的發光裝置,且發光裝置可為小尺寸者。此外,製造方法還具有可批次生產大量的螢光結構,且反射結構可不藉由模具來形成,以降低成本等特點。 In summary, the manufacturing method of the light-emitting device in the present embodiment can manufacture various light-emitting devices having a fluorescent structure having inclined sides, and the light-emitting device can be a small size. In addition, the manufacturing method also has a large number of fluorescent structures that can be mass-produced, and the reflective structure can be formed without being formed by a mold to reduce cost and the like.

上述之實施例僅用來例舉本發明之實施態樣,以及闡釋本發明之技術特徵,並非用來限制本發明之保護範疇。任何熟悉此技術者可輕易完成之改變或均等性之安排均屬於本發明所主張之範圍,本發明之權 利保護範圍應以申請專利範圍為準。 The embodiments described above are only intended to illustrate the embodiments of the present invention, and to explain the technical features of the present invention, and are not intended to limit the scope of protection of the present invention. Any change or equivalence arrangement that can be easily accomplished by those skilled in the art is within the scope of the invention as claimed. The scope of protection shall be subject to the scope of patent application.

1A‧‧‧發光裝置 1A‧‧‧Lighting device

10‧‧‧LED晶片 10‧‧‧LED chip

11‧‧‧上表面 11‧‧‧ upper surface

12‧‧‧下表面 12‧‧‧ Lower surface

13‧‧‧側面 13‧‧‧ side

14‧‧‧電極組 14‧‧‧Electrode group

20‧‧‧螢光結構 20‧‧‧Fluorescent structure

201‧‧‧螢光層 201‧‧‧Fluorescent layer

202‧‧‧透光層 202‧‧‧Transparent layer

21‧‧‧頂面 21‧‧‧ top surface

22‧‧‧底面 22‧‧‧ bottom

23‧‧‧側面、傾斜側面 23‧‧‧Side, sloping side

30‧‧‧反射結構 30‧‧‧Reflective structure

31‧‧‧內側面 31‧‧‧ inside

32‧‧‧內導角、內側斜面 32‧‧‧Inner guide angle, inside slope

33‧‧‧頂面 33‧‧‧ top surface

34‧‧‧底面 34‧‧‧ bottom

35‧‧‧外側面 35‧‧‧Outside

Claims (7)

一種發光裝置的製造方法,包含:形成具有一傾斜側面之一螢光結構;將該螢光結構設置於一LED晶片之一上表面上、但不覆蓋該LED晶片之一側面,以形成一發光結構;以及將該發光結構之側面進行包覆,以形成一具有倒錐形內側面之反射結構,其中,該反射結構係將該LED晶片之該側面及該螢光結構之該傾斜側面共同進行包覆。 A method of manufacturing a light-emitting device, comprising: forming a fluorescent structure having a slanted side; placing the fluorescent structure on an upper surface of an LED chip but not covering one side of the LED chip to form a light-emitting device And structuring the side surface of the light emitting structure to form a reflective structure having an inverted tapered inner side surface, wherein the reflective structure is performed by the side surface of the LED chip and the inclined side surface of the fluorescent structure Coated. 如請求項1所述的發光裝置的製造方法,其中,形成該螢光結構之該步驟,係以沖切(punching)、模造(molding)、鋸切(sawing)、精密切削(precision machining)或微加工(micro machining)形成出該傾斜側面。 The method of manufacturing a light-emitting device according to claim 1, wherein the step of forming the fluorescent structure is by punching, molding, sawing, precision machining or Micro machining forms the inclined side. 如請求項1所述的發光裝置的製造方法,形成該螢光結構之該步驟更包含:沖切一螢光薄膜,以使該螢光薄膜分成複數個具有一傾斜側面之部分,而其中一個該部分為該螢光結構。 The method for manufacturing a light-emitting device according to claim 1, wherein the step of forming the fluorescent structure further comprises: cutting a fluorescent film to divide the fluorescent film into a plurality of portions having a sloped side, and one of the This part is the fluorescent structure. 如請求項3所述的發光裝置的製造方法,其中,該螢光薄膜為一單層螢光薄膜、或包含一螢光層及一透光層,該螢光層形成於該透光層之上或該透光層之下。 The method for manufacturing a light-emitting device according to claim 3, wherein the fluorescent film is a single-layer fluorescent film or comprises a fluorescent layer and a light-transmitting layer, and the fluorescent layer is formed on the light-transmitting layer. Above or below the light transmissive layer. 如請求項1-4其中一項所述的發光裝置的製造方法,其中,該螢光結構係黏貼至該LED晶片。 The method of manufacturing a light-emitting device according to any one of claims 1 to 4, wherein the fluorescent structure is adhered to the LED wafer. 一種螢光結構,包含一頂面、一底面、形成於該頂面及該底面之間的一側面、及設置於該螢光結構內的螢光材料,其中,該頂面大於該底面,使得該側面為一傾斜側面,該頂面之一長度不大於3.0公釐,該頂面之一寬度不大於2.0公釐。 A fluorescent structure comprising a top surface, a bottom surface, a side surface formed between the top surface and the bottom surface, and a fluorescent material disposed in the fluorescent structure, wherein the top surface is larger than the bottom surface, such that The side surface is an inclined side surface, one of the top surfaces having a length of not more than 3.0 mm, and one of the top surfaces having a width of not more than 2.0 mm. 一種螢光結構的製造方法,包含:提供一螢光薄膜;提供具有相連接之複數個刀刃的一沖切刀具;以及使用該沖切刀具來沖切該螢光薄膜,以使該螢光薄膜分成複數個螢光結構;其中,該些螢光結構包含一頂面、一底面及形成於該頂面及該底面之間的一側面,該頂面大於該底面,使得該側面為一傾斜側面。 A method of fabricating a fluorescent structure, comprising: providing a fluorescent film; providing a punching cutter having a plurality of connected blades; and punching the fluorescent film with the punching cutter to make the fluorescent film Dividing into a plurality of fluorescent structures; wherein the fluorescent structures comprise a top surface, a bottom surface and a side surface formed between the top surface and the bottom surface, the top surface being larger than the bottom surface, such that the side surface is an inclined side .
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