TW201712885A - Sonar cell and a method of fabricating sonar cell - Google Patents
Sonar cell and a method of fabricating sonar cellInfo
- Publication number
- TW201712885A TW201712885A TW105123722A TW105123722A TW201712885A TW 201712885 A TW201712885 A TW 201712885A TW 105123722 A TW105123722 A TW 105123722A TW 105123722 A TW105123722 A TW 105123722A TW 201712885 A TW201712885 A TW 201712885A
- Authority
- TW
- Taiwan
- Prior art keywords
- sonar
- cell
- type
- region
- diffusing layer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 abstract 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Sustainable Development (AREA)
- Chemical & Material Sciences (AREA)
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
Abstract
A sonar cell provided by the present invention comprises: a p-type diffusion layer (2) formed on a light receiving side (1A), which is a first main surface, of an n-type single crystal silicon substrate (1); a n-type diffusing layer (5) formed on a back side (1B), which is a second main surface, oppositing to the light-receiving side (1A); a light receiving side electrode (4) coupled to the p-type diffusing layer (2); and a back side electrode (7) coupled to the n-type diffusing layer (5). The p-type diffusing layer (2) comprises: a first region (R1) having a first diffusing depth; a second region (R2), disposed as a strip-like structure along the periphery of the semiconductor substrate to surround the first region (R1) and the diffusing depth of the first dopant is deeper than the first region (R1). A sonar cell of reverse bias with low leaking can be thus obtained.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015151147 | 2015-07-30 | ||
PCT/JP2016/071320 WO2017018300A1 (en) | 2015-07-30 | 2016-07-20 | Solar cell and method for manufacturing solar cell |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201712885A true TW201712885A (en) | 2017-04-01 |
TWI606601B TWI606601B (en) | 2017-11-21 |
Family
ID=57884811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105123722A TWI606601B (en) | 2015-07-30 | 2016-07-27 | Sonar cell and a method of fabricaitng sonar cell |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6234633B2 (en) |
TW (1) | TWI606601B (en) |
WO (1) | WO2017018300A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110098265A (en) * | 2019-04-29 | 2019-08-06 | 南通天盛新能源股份有限公司 | A kind of N-type front electrode of solar battery method for metallising |
EP4287267A1 (en) * | 2022-06-01 | 2023-12-06 | Jinko Solar (Haining) Co., Ltd. | Photovoltaic cell and photovoltaic module |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100304098B1 (en) * | 1996-09-06 | 2002-03-08 | 다니구찌 이찌로오, 기타오카 다카시 | Transistor and method of manufacturing |
JP3676954B2 (en) * | 1999-11-08 | 2005-07-27 | シャープ株式会社 | Photoelectric conversion element and manufacturing method thereof |
JP5868290B2 (en) * | 2012-08-23 | 2016-02-24 | 三菱電機株式会社 | Photovoltaic device and manufacturing method thereof |
JP2014146766A (en) * | 2013-01-30 | 2014-08-14 | Mitsubishi Electric Corp | Method for manufacturing solar cell and solar cell |
JP2015130406A (en) * | 2014-01-07 | 2015-07-16 | 三菱電機株式会社 | Photovoltaic device, method of manufacturing the same, and photovoltaic module |
-
2016
- 2016-07-20 WO PCT/JP2016/071320 patent/WO2017018300A1/en active Application Filing
- 2016-07-20 JP JP2017508592A patent/JP6234633B2/en not_active Expired - Fee Related
- 2016-07-27 TW TW105123722A patent/TWI606601B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP6234633B2 (en) | 2017-11-22 |
TWI606601B (en) | 2017-11-21 |
JPWO2017018300A1 (en) | 2017-07-27 |
WO2017018300A1 (en) | 2017-02-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |