TW201710311A - Fluorine-containing compound, photocurable composition, coating liquid, composition for forming hard coat layer, and article - Google Patents

Fluorine-containing compound, photocurable composition, coating liquid, composition for forming hard coat layer, and article Download PDF

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TW201710311A
TW201710311A TW105123196A TW105123196A TW201710311A TW 201710311 A TW201710311 A TW 201710311A TW 105123196 A TW105123196 A TW 105123196A TW 105123196 A TW105123196 A TW 105123196A TW 201710311 A TW201710311 A TW 201710311A
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compound
fluorine
integer
containing compound
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Kiyotaka Takao
Taiki Hoshino
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Asahi Glass Co Ltd
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • C08G65/226Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/331Polymers modified by chemical after-treatment with organic compounds containing oxygen
    • C08G65/332Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers

Abstract

Provided is a fluorine-containing compound that provides excellent anti-contamination properties (oil-based ink repellency and fingerprint removal properties) to an object (e.g., a barcode layer), and is highly compatible with non-fluorine-based photopolymerizable compounds. The fluorine-containing compound is represented by [D-O-{(CmF2mO)a(CnF2n-iHiO)b}-]dA. D is a C1-6 perfluoroalkyl group or the like; m is an integer from 1 to 6; a is an integer from 0 to 200; n is an integer from 1 to 6; i is an integer from 1 to 2n-1; b is an integer from 6 to 200; d is an integer of at least 1; and A is a d valent organic group having at least one polymerizable carbon-carbon double bond.

Description

含氟化合物、光硬化性組成物、塗覆液、硬塗層形成用組成物及物品Fluorine-containing compound, photocurable composition, coating liquid, composition for forming a hard coat layer, and article

本發明係關於含氟化合物、含有該含氟化合物之光硬化性組成物及塗覆液、以及由該光硬化性組成物或該塗覆液構成之硬塗層形成用組成物及具有由該組成物形成之硬塗層的物品。The present invention relates to a fluorine-containing compound, a photocurable composition containing the fluorine-containing compound, a coating liquid, and a composition for forming a hard coat layer comprising the photocurable composition or the coating liquid, and An article of hard coating formed by the composition.

光學物品、顯示器、光記錄媒體等通常於表面具有用以防止刮傷等的硬塗層。 又,該物品宜具有防污性,亦即污垢(指紋、皮脂、汗、化妝品、食品、油性墨水等)不易附著表面且即使污垢附著於表面上也可輕易除去的特性。例如,眼鏡鏡片表面一旦附著污垢,便會妨礙良好視界,且醜化外觀。光記錄媒體表面一旦附著污垢,信號的記錄及再生有可能發生故障。顯示器表面一旦附著污垢,視辨性便降低,會對附觸控面板之顯示器的操作性帶來不良影響。An optical article, a display, an optical recording medium, or the like usually has a hard coat layer on the surface to prevent scratching or the like. Further, the article preferably has antifouling property, that is, a property in which dirt (fingerprint, sebum, sweat, cosmetics, food, oily ink, etc.) is hard to adhere to the surface and can be easily removed even if the dirt adheres to the surface. For example, once the surface of the spectacle lens is attached with dirt, it will impede a good view and demonize the appearance. Once the surface of the optical recording medium is attached with dirt, the recording and reproduction of the signal may malfunction. Once the surface of the display is attached with dirt, the visibility is lowered, which adversely affects the operability of the display with the touch panel.

可賦予硬塗層防污性之含氟化合物已有下述提議。 (1)使三異氰酸酯、具有活性氫及聚(氧全氟伸烷基)鏈之全氟聚醚與具有活性氫及聚合性碳-碳雙鍵之單體進行反應而製得之含氟化合物(專利文獻1)。 (2)具有末端CF3 -、含有1個以上氫原子之氧氟伸烷基、聚(氧全氟伸烷基)鏈及(甲基)丙烯醯基的含氟化合物(專利文獻2)。 (3)具有聚(CH2 CF2 CF2 O)鏈及聚合性碳-碳雙鍵之含氟化合物(專利文獻3)。 先前技術文獻 專利文獻The following proposals have been made for a fluorine-containing compound which imparts antifouling properties to a hard coat layer. (1) A fluorine-containing compound obtained by reacting a triisocyanate, a perfluoropolyether having an active hydrogen and a poly(oxyperfluoroalkylene) chain, and a monomer having an active hydrogen and a polymerizable carbon-carbon double bond (Patent Document 1). (2) A fluorine-containing compound having a terminal CF 3 -, an oxyfluoroalkyl group having one or more hydrogen atoms, a poly(oxyperfluoroalkylene) chain, and a (meth)acryl fluorenyl group (Patent Document 2). (3) A fluorine-containing compound having a poly(CH 2 CF 2 CF 2 O) chain and a polymerizable carbon-carbon double bond (Patent Document 3). Prior art document patent document

專利文獻1:日本專利第3963169號公報 專利文獻2:國際公開第2015/056731號 專利文獻3:美國專利提申案公開第2014/0123876號說明書Patent Document 1: Japanese Patent No. 3963169 Patent Document 2: International Publication No. 2015/056731 Patent Document 3: US Patent Application Publication No. 2014/0123876

發明概要 發明欲解決之課題 使用(1)~(3)之含氟化合物形成硬塗層時,通常會併用非氟系光聚合性化合物。 但,根據本發明人等之研討,(1)之含氟化合物與非氟系光聚合性化合物的相溶性不夠充分。所以,將含有(1)之含氟化合物及非氟系光聚合性化合物的硬塗層形成用組成物塗佈於基材表面時,容易於塗膜產生缺陷,而容易使硬塗層外觀變差。又,為了抑制聚合反應而將該組成物低溫儲存時會產生沉澱。以下,塗膜不易產生缺陷的性質表記為「製膜性」,低溫儲存時不易產生沉澱的性質則表記為「低溫儲存穩定性」。Disclosure of the Invention Problems to be Solved by the Invention When a hard coat layer is formed using the fluorine-containing compound of (1) to (3), a non-fluorine-based photopolymerizable compound is usually used in combination. However, according to the study by the inventors of the present invention, the compatibility between the fluorine-containing compound of (1) and the non-fluorine-based photopolymerizable compound is insufficient. Therefore, when the composition for forming a hard coat layer containing the fluorine-containing compound (1) and the non-fluorine-based photopolymerizable compound is applied to the surface of the substrate, defects in the coating film are likely to occur, and the appearance of the hard coat layer is easily changed. difference. Further, precipitation is caused when the composition is stored at a low temperature in order to suppress the polymerization reaction. Hereinafter, the property in which the coating film is less likely to cause defects is referred to as "film forming property", and the property in which precipitation is less likely to occur during low-temperature storage is referred to as "low-temperature storage stability".

(2)之含氟化合物具有含1個以上氫原子之氧氟伸烷基,所以比起(1)之含氟化合物,其與非氟系光聚合性化合物之相溶性較佳。因此,含有(2)之含氟化合物及非氟系光聚合性化合物的硬塗層形成用組成物之製膜性佳。但,該組成物的低溫儲存穩定性尚且不足。Since the fluorine-containing compound (2) has an oxyfluoroalkyl group having one or more hydrogen atoms, it is more compatible with the non-fluorine-based photopolymerizable compound than the fluorine-containing compound of (1). Therefore, the composition for forming a hard coat layer containing the fluorine-containing compound (2) and the non-fluorine-based photopolymerizable compound is excellent in film formability. However, the low temperature storage stability of the composition is still insufficient.

(3)之含氟化合物具有聚(CH2 CF2 CF2 O)鏈,所以比起(2)之含氟化合物,其與非氟系光聚合性化合物之相溶性較佳。因此,含有(3)之含氟化合物及非氟系光聚合性化合物的硬塗層形成用組成物之製膜性及低溫儲存穩定性佳。但,(3)之含氟化合物的末端為FCH2 -,所以硬塗層之防污性不夠充分。Since the fluorine-containing compound (3) has a poly(CH 2 CF 2 CF 2 O) chain, it is more compatible with the non-fluorine-based photopolymerizable compound than the fluorine-containing compound of (2). Therefore, the composition for forming a hard coat layer containing the fluorine-containing compound (3) and the non-fluorine-based photopolymerizable compound is excellent in film formability and low-temperature storage stability. However, since the end of the fluorine-containing compound of (3) is FCH 2 -, the antifouling property of the hard coat layer is insufficient.

本發明目的在於提供:可賦予對象物(硬塗層等)優異的防污性(油性墨水撥去性、指紋污垢除去性)且與非氟系光聚合性化合物之相溶性高的含氟化合物;可形成防污性優異的對象物且製膜性及低溫儲存穩定性良好的光硬化性組成物及塗覆液;可形成防污性優異的硬塗層且製膜性及低溫儲存穩定性良好的硬塗層形成用組成物;以及具有防污性及外觀優良之硬塗層的物品。 用以解決課題之手段An object of the present invention is to provide a fluorine-containing compound which is excellent in antifouling property (oily ink repellency and fingerprint soil removal property) and which has high compatibility with a non-fluorine-based photopolymerizable compound. A photocurable composition and a coating liquid which are excellent in antifouling properties and excellent in film formability and low-temperature storage stability, and can form a hard coat layer excellent in antifouling properties and have good film formability and low-temperature storage stability. A good composition for forming a hard coat layer; and an article having a hard coat layer excellent in antifouling property and appearance. Means to solve the problem

本發明提供具有下述[1]~[13]之構成的含氟化合物、光硬化性組成物、塗覆液、硬塗層形成用組成物及物品 [1]一種含氟化合物,係下式(1)所示化合物: [D-O-{(Cm F2m O)a (Cn F2n-i Hi O)b }-]d A・・・(1) 惟,D為(Rf1 )e -R1 -或Rf2 -; Rf1 為碳數1~6之全氟烷基; e為1~3之整數; R1 為碳數1~6之(e+1)價烴基; Rf2 為碳數1~6之全氟烷基; m為1~6之整數; a為0~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成; n為1~6之整數; i為1~2n-1之整數; b為6~200之整數,且(Cn F2n-i Hi O)b 可由n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O構成; d為1以上之整數; A為具有1個以上聚合性碳-碳雙鍵之d價有機基; a個Cm F2m O及b個Cn F2n-i Hi O之鍵結順序不受限。The present invention provides a fluorine-containing compound, a photocurable composition, a coating liquid, a composition for forming a hard coat layer, and a fluorine-containing compound of the article [1] having the following structures [1] to [13], which are as follows. (1) Compound shown: [DO-{(C m F 2m O) a (C n F 2n-i H i O) b }-] d A・・・(1) However, D is (R f1 ) e -R 1 - or R f2 -; R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms; e is an integer of 1 to 3; and R 1 is an (e+1)-valent hydrocarbon group having 1 to 6 carbon atoms; F2 is a perfluoroalkyl group having a carbon number of 1 to 6; m is an integer of 1 to 6; a is an integer of 0 to 200, and when a is 2 or more, (C m F 2m O) a may be different from each other by m More than C m F 2m O; n is an integer from 1 to 6; i is an integer from 1 to 2n-1; b is an integer from 6 to 200, and (C n F 2n-i H i O) b can be n And one or more of i or two different from each other: C n F 2n-i H i O; d is an integer of 1 or more; A is a d-valent organic having one or more polymerizable carbon-carbon double bonds The bonding order of a C m F 2m O and b C n F 2n-i H i O is not limited.

[2]如[1]之含氟化合物,其中前述式(1)所示化合物為下式(11)所示化合物; [D-O-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b }-]d A・・・(11) 惟,D、m、n、i、b、d及A與前述式(1)之D、m、n、i、b、d及A相同; a為1~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成; a為2以上時,{(Cm F2m O)a }為a個Cm F2m O所構成之嵌段; {(Cn F2n-i Hi O)b }為b個Cn F2n-i Hi O所構成之嵌段。 [3]如[2]之含氟化合物,其中前述式(1)所示化合物為下式(111)所示化合物; [D-O-{(CF2 CF2 O)a }-{CF2 CH2 O-(CF2 CFHO-CF2 CF2 CF2 CH2 O)b/2-1 }-]d A・・・(111) 惟,D、d及A與前述式(1)之D、d及A相同,b為前述式(1)之b中的偶數。[2] The fluorine-containing compound according to [1], wherein the compound represented by the above formula (1) is a compound represented by the following formula (11); [DO-{(C m F 2m O) a }-{(C n F 2n-i H i O) b }-] d A・・・(11) However, D, m, n, i, b, d, and A are D, m, n, i, b of the above formula (1) , d and A are the same; a is an integer from 1 to 200, and when a is 2 or more, (C m F 2m O) a may be composed of two or more kinds of C m F 2m O different from each other; when a is 2 or more, {(C m F 2m O) a } is a block composed of a C m F 2m O; {(C n F 2n-i H i O) b } is b C n F 2n-i H i O The block formed. [3] The fluorine-containing compound according to [2], wherein the compound represented by the above formula (1) is a compound represented by the following formula (111); [DO-{(CF 2 CF 2 O) a }-{CF 2 CH 2 O-(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) b/2-1 }-] d A・・・(111) However, D, d and A and D, d of the above formula (1) Same as A, and b is an even number in b of the above formula (1).

[4]如[1]之含氟化合物,其中前述式(1)所示化合物為下式(12)所示化合物; [D-O-{(Cn F2n-i Hi O)c }-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b-c }-]d A・・・(12) 惟,D、m、n、i、b、d及A與前述式(1)之D、m、n、i、b、d及A相同; a為1~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成; c為2或3,(Cn F2n-i Hi O)c 可由n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O構成; {(Cn F2n-i Hi O)c }為c個Cn F2n-i Hi O所構成之嵌段; a為2以上時,{(Cm F2m O)a }為a個Cm F2m O所構成之嵌段; {(Cn F2n-i Hi O)b-c }為b-c個Cn F2n-i Hi O所構成之嵌段。[4] The fluorine-containing compound according to [1], wherein the compound represented by the above formula (1) is a compound represented by the following formula (12); [DO-{(C n F 2n-i H i O) c }-{ (C m F 2m O) a }-{(C n F 2n-i H i O) bc }-] d A・・・(12) However, D, m, n, i, b, d, and A are D, m, n, i, b, d and A of the above formula (1) are the same; a is an integer from 1 to 200, and when a is 2 or more, (C m F 2m O) a can be different from m More than C m F 2m O; c is 2 or 3, (C n F 2n-i H i O) c may be one or more of n and i different from each other 2 or more C n F 2n-i H i O is composed; {(C n F 2n-i H i O) c } is a block composed of c C n F 2n-i H i O; when a is 2 or more, {(C m F 2m O a } is a block composed of a C m F 2m O; {(C n F 2n-i H i O) bc } is a block composed of bc C n F 2n-i H i O .

[5]如[1]之含氟化合物,其中前述式(1)所示化合物為下式(112)所示化合物; [D-O-(CH2 CF2 CF2 O)b-1 -CH2 CF2 CH2 O-]d A・・・(112) 惟,b、d及A與前述式(1)之b、d及A相同且D為(Rf1 )e -R1 -。 [6]如[1]~[4]中任一項之含氟化合物,其中以a/b表示之前述a與前述b之比值為20/1~1/20。 [7]如[1]~[6]中任一項之含氟化合物,其中前述A為具有1個以上(甲基)丙烯醯氧基之d價有機基。 [8]如[1]~[7]中任一項之含氟化合物,該含氟化合物係下列三者之反應生成物且不具未反應之異氰酸酯基:以D-O-{(Cm F2m O)a (Cn F2n-i Hi O)b }-H表示之羥基化合物、具有1個以上(甲基)丙烯醯氧基之羥基化合物及具有2個以上異氰酸酯基之聚異氰酸酯。 [9]如[1]~[8]中任一項之含氟化合物,其數量平均分子量為1,200~8,000。[5] The fluorine-containing compound according to [1], wherein the compound represented by the above formula (1) is a compound represented by the following formula (112); [DO-(CH 2 CF 2 CF 2 O) b-1 -CH 2 CF 2 CH 2 O-] d A (112) However, b, d, and A are the same as b, d, and A of the above formula (1), and D is (R f1 ) e - R 1 -. [6] The fluorine-containing compound according to any one of [1] to [4] wherein the ratio of the a to the above b, represented by a/b, is from 20/1 to 1/20. [A] The fluorine-containing compound according to any one of [1] to [6] wherein the A is a d-valent organic group having one or more (meth) propylene fluorenyloxy groups. [8] The fluorine-containing compound according to any one of [1] to [7] wherein the fluorine-containing compound is a reaction product of the following three and has no unreacted isocyanate group: DO-{(C m F 2m O a (C n F 2n-i H i O) b }-H represents a hydroxy compound, a hydroxy compound having one or more (meth) acryloxy groups, and a polyisocyanate having two or more isocyanate groups. [9] The fluorine-containing compound according to any one of [1] to [8], which has a number average molecular weight of 1,200 to 8,000.

[10]一種光硬化性組成物,其特徵在於含有如[1]~[9]中任一項之含氟化合物、光聚合性化合物(惟,前述含氟化合物除外)及光聚合引發劑(惟,不含液態介質)。 [11]一種塗覆液,其特徵在於含有如[10]之光硬化性組成物及液態介質。 [12]一種硬塗層形成用組成物,係由如[10]之光硬化性組成物或如[11]之塗覆液構成。 [13]一種物品,其特徵在於具有基材及硬塗層,該硬塗層係由如[10]之光硬化性組成物或如[11]之塗覆液形成。 發明效果[10] A photocurable composition comprising the fluorine-containing compound according to any one of [1] to [9], a photopolymerizable compound (except for the fluorine-containing compound), and a photopolymerization initiator ( However, it does not contain liquid media). [11] A coating liquid comprising the photocurable composition of [10] and a liquid medium. [12] A composition for forming a hard coat layer comprising the photocurable composition of [10] or the coating liquid of [11]. [13] An article characterized by having a substrate and a hard coat layer formed of a photocurable composition such as [10] or a coating liquid such as [11]. Effect of the invention

本發明之含氟化合物可賦予對象物優異的防污性且與非氟系光聚合性化合物之相溶性很高。 本發明之光硬化性組成物及塗覆液可形成防污性優異的對象物且製膜性及低溫儲存穩定性良好。 本發明之硬塗層形成用組成物可形成防污性優異的硬塗層且製膜性及低溫儲存穩定性良好。 本發明之物品具有防污性及外觀優良的硬塗層。The fluorine-containing compound of the present invention can impart excellent antifouling properties to a target material and has high compatibility with a non-fluorine-based photopolymerizable compound. The photocurable composition and the coating liquid of the present invention can form an object excellent in antifouling property and have good film formability and low-temperature storage stability. The hard-coat layer forming composition of the present invention can form a hard coat layer excellent in antifouling properties and has good film formability and low-temperature storage stability. The article of the present invention has a hard coat layer excellent in antifouling properties and appearance.

用以實施發明之形態 在本說明書中,式(1)所示化合物表記為化合物(1)。以其他式表示之化合物亦以同樣方式表記。 在本說明書中,有時會將光硬化性組成物、塗覆液及硬塗層形成用組成物總稱表記為「組成物」。 本說明書中,在未特別言及之前提下,「聚合性碳-碳雙鍵」亦作「聚合性雙鍵」。 本說明書之下述用語意義如下。 「氟伸烷基」係指伸烷基之氫原子有一部分或全部被氟原子取代之基,「全氟伸烷基」意指伸烷基之氫原子全部被氟原子取代之基。 「全氟烷基」意指烷基之氫原子全部被氟原子取代之基。 「(甲基)丙烯醯基」為丙烯醯基及甲基丙烯醯基之總稱。 「對象物」係指被賦予防污性之物。對象物可列舉如硬塗層、撥液層、脫模層、成形品等。In the present specification, the compound represented by the formula (1) is represented by the compound (1). Compounds represented by other formulas are also expressed in the same manner. In the present specification, the photocurable composition, the coating liquid, and the composition for forming a hard coat layer are collectively referred to as "composition". In the present specification, the "polymerizable carbon-carbon double bond" is also referred to as "polymerizable double bond" unless otherwise stated. The meanings of the following terms in this manual are as follows. "Fluoroalkylene" means a group in which a part or all of a hydrogen atom of an alkyl group is substituted by a fluorine atom, and "perfluoroalkylene group" means a group in which all hydrogen atoms of an alkyl group are substituted by a fluorine atom. "Perfluoroalkyl" means a group in which all of the hydrogen atoms of the alkyl group are replaced by fluorine atoms. "(Meth)acrylonitrile" is a generic term for propylene fluorenyl and methacryl fluorenyl. "Object" means an object to which antifouling property is imparted. Examples of the object include a hard coat layer, a liquid-repellent layer, a release layer, and a molded article.

[含氟化合物] 本發明之含氟化合物為化合物(1)。 [D-O-{(Cm F2m O)a (Cn F2n-i Hi O)b }-]d A・・・(1)[Fluorine-Containing Compound] The fluorine-containing compound of the present invention is the compound (1). [DO-{(C m F 2m O) a (C n F 2n-i H i O) b }-] d A・・・(1)

(關於D) D為(Rf1 )e -R1 -或Rf2 -。 藉由化合物(1)具有D,可讓化合物(1)之其中一末端成為CF3 -。所以,化合物(1)可對對象物(硬塗層等)充分賦予防污性。(About D) D is (R f1 ) e -R 1 - or R f2 -. By the compound (1) having D, one of the ends of the compound (1) can be made into CF 3 -. Therefore, the compound (1) can sufficiently impart antifouling properties to an object (hard coat layer or the like).

Rf1 為碳數1~6之全氟烷基。全氟烷基可為直鏈狀亦可為分枝狀。從可充分賦予對象物防污性的觀點來看,Rf1 以碳數1~3之全氟烷基為佳,CF3 -或CF3 CF2 -較佳,CF3 -尤佳。 e為1~3之整數。從化合物(1)之易製性觀點來看,e宜為1或2,尤宜為1。 R1 為碳數1~6之(e+1)價烴基。從化合物(1)之易製性觀點來看,R1 以-CH2 -、>CH-、-CH2 CH2 -為佳,-CH2 -、-CH2 CH2 -尤佳。R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms. The perfluoroalkyl group may be linear or branched. From the viewpoint of sufficiently imparting antifouling properties to the object, R f1 is preferably a perfluoroalkyl group having 1 to 3 carbon atoms, CF 3 - or CF 3 CF 2 - is preferable, and CF 3 - is particularly preferable. e is an integer from 1 to 3. From the viewpoint of the controllability of the compound (1), e is preferably 1 or 2, and particularly preferably 1. R 1 is an (e+1)-valent hydrocarbon group having 1 to 6 carbon atoms. From the viewpoint of the controllability of the compound (1), R 1 is preferably -CH 2 -, >CH- or -CH 2 CH 2 -, and -CH 2 - or -CH 2 CH 2 - is particularly preferred.

(Rf1 )e -R1 -可列舉如下述基團(g1)~(g3)。 Rf1 (CH2 )h1 -・・・(g1)、 (Rf1 )2 CH(CH2 )h2 -・・・(g2)、 (Rf1 )3 C(CH2 )h3 -・・・(g3)。 惟,h1為1~3之整數,h2為0~2之整數,h3為1~3之整數。 從化合物(1)之易製性觀點來看,(Rf1 )e -R1 -宜為CF3 CH2 -、(CF3 )2 CH-、CF3 CF2 CH2 -、CF3 CF2 CF2 CH2 CH2 -、CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 -。(R f1 ) e - R 1 - may, for example, be the following groups (g1) to (g3). R f1 (CH 2 ) h1 -・・・(g1), (R f1 ) 2 CH(CH 2 ) h2 -・・・(g2), (R f1 ) 3 C(CH 2 ) h3 -・・・( G3). However, h1 is an integer from 1 to 3, h2 is an integer from 0 to 2, and h3 is an integer from 1 to 3. From the viewpoint of the controllability of the compound (1), (R f1 ) e -R 1 - is preferably CF 3 CH 2 -, (CF 3 ) 2 CH-, CF 3 CF 2 CH 2 -, CF 3 CF 2 CF 2 CH 2 CH 2 -, CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 -.

Rf2 為碳數1~6之全氟烷基。全氟烷基可為直鏈狀亦可為分枝狀。從可充分賦予對象物防污性的觀點來看,Rf2 之碳數為1~3為佳,1或2較佳,以1尤佳。 從化合物(1)之易製性觀點來看,Rf2 宜為CF3 -、CF3 CF2 -、CF3 CF2 CF2 -。R f2 is a perfluoroalkyl group having 1 to 6 carbon atoms. The perfluoroalkyl group may be linear or branched. From the viewpoint of sufficiently imparting antifouling properties to the object, the carbon number of R f2 is preferably from 1 to 3, preferably 1 or 2, more preferably 1 or more. From the viewpoint of the ease of production of the compound (1), R f2 is preferably CF 3 -, CF 3 CF 2 -, CF 3 CF 2 CF 2 -.

(關於(Cm F2m O)a ) (Cm F2m O)a 可進一步對對象物賦予防污性。 m為1~6之整數。從可充分賦予對象物防污性的觀點來看,m為1~3為佳,1或2尤佳。m為2以上時,Cm F2m 可為直鏈狀亦可為分枝狀。從可充分賦予對象物防污性的觀點來看,以直鏈狀為宜。 Cm F2m O之具體例可列舉CF2 O、CF2 CF2 O、CF2 CF2 CF2 O、CF(CF3 )CF2 O、CF2 CF2 CF2 CF2 O等。(About (C m F 2m O) a ) (C m F 2m O) a can further impart antifouling properties to an object. m is an integer from 1 to 6. From the viewpoint of sufficiently imparting antifouling properties to the object, m is preferably 1 to 3, and 1 or 2 is particularly preferred. When m is 2 or more, C m F 2m may be linear or branched. From the viewpoint of sufficiently imparting antifouling properties to the object, it is preferably a linear shape. Specific examples of C m F 2m O include CF 2 O, CF 2 CF 2 O, CF 2 CF 2 CF 2 O, CF(CF 3 )CF 2 O, CF 2 CF 2 CF 2 CF 2 O, and the like.

a為0~200之整數。a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成。 從可充分賦予對象物防污性的觀點來看,a以3以上之整數為宜,4以上之整數較佳,5以上之整數尤佳。化合物(1)之數量平均分子量太大時,化合物(1)每單位分子量中存在的聚合性雙鍵數會減少且對象物之耐磨損性降低,再者,化合物(1)與其他成分之相溶性良好,從前述觀點來看,a以100以下之整數為宜,80以下之整數較佳,60以下之整數尤佳。a is an integer from 0 to 200. When a is 2 or more, (C m F 2m O) a may be composed of two or more kinds of C m F 2m O in which m is different from each other. From the viewpoint of sufficiently imparting antifouling properties to the object, a is preferably an integer of 3 or more, and an integer of 4 or more is preferable, and an integer of 5 or more is particularly preferable. When the number average molecular weight of the compound (1) is too large, the number of polymerizable double bonds per unit molecular weight of the compound (1) is decreased and the abrasion resistance of the object is lowered, and further, the compound (1) and other components are The compatibility is good. From the above viewpoint, a is preferably an integer of 100 or less, and an integer of 80 or less is preferable, and an integer of 60 or less is particularly preferable.

(Cm F2m O)a 中存在m互異之2種以上Cm F2m O時,各Cm F2m O之鍵結順序不受限,可為無規鍵結亦可為交錯鍵結,或可鍵結成嵌段狀。例如,存在CF2 O及CF2 CF2 O時,CF2 O與CF2 CF2 O可為無規配置或交錯配置,亦可為多個CF2 O所構成之嵌段與多個CF2 CF2 O所構成之嵌段連結。 又,例如當CF2 CF2 O與CF2 CF2 CF2 CF2 O呈交錯鍵結時,可將(Cm F2m O)a 表示成(CF2 CF2 O-CF2 CF2 CF2 CF2 O)a/2 。此時表示a/2個(CF2 CF2 O)與a/2個(CF2 CF2 CF2 CF2 O)呈交錯配置。另外,在此情況下的a為偶數。M the presence of two or more mutually different C m F 2m O (C m F 2m O) a , the bond order of the C m F 2m O is not limited, may be bonded may also be a random interlaced bond , or can be bonded into a block shape. For example, when CF 2 O and CF 2 CF 2 O are present, CF 2 O and CF 2 CF 2 O may be randomly or staggered, or may be a block composed of a plurality of CF 2 O and a plurality of CF 2 . The block formed by CF 2 O is bonded. Further, for example, when CF 2 CF 2 O and CF 2 CF 2 CF 2 CF 2 O are interlaced, (C m F 2m O) a can be expressed as (CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) a/2 . At this time, it is indicated that a/2 (CF 2 CF 2 O) and a/2 (CF 2 CF 2 CF 2 CF 2 O) are arranged in a staggered manner. In addition, a in this case is an even number.

從賦予對象物充分防污性的觀點來看,(Cm F2m O)a 宜為{(CF2 O)a1 (CF2 CF2 O)a2 }(惟,a1為1以上之整數,a2為1以上之整數,a1+a2為2~200之整數,且a1個CF2 O及a2個CF2 CF2 O之鍵結順序不受限)。此時,CF2 O與CF2 CF2 O呈無規鍵結為宜。 {(CF2 O)a1 (CF2 CF2 O)a2 }之遷移性佳,所以對象物之潤滑性優異。尤其,(CF2 O)a1 之碳數為1且為具有氧原子之基團,所以遷移性較佳。From the viewpoint of imparting sufficient antifouling property to the object, (C m F 2m O) a is preferably {(CF 2 O) a1 (CF 2 CF 2 O) a2 } (however, a1 is an integer of 1 or more, a2 For an integer of 1 or more, a1+a2 is an integer of 2 to 200, and the bonding order of a1 CF 2 O and a2 CF 2 CF 2 O is not limited). At this time, CF 2 O and CF 2 CF 2 O are preferably randomly bonded. Since {(CF 2 O) a1 (CF 2 CF 2 O) a2 } has good mobility, the object is excellent in lubricity. In particular, (CF 2 O) a1 has a carbon number of 1 and is a group having an oxygen atom, so that the mobility is preferred.

化合物(1)可以(Cm F2m O)a 之a數量不同的多種化合物之混合物製得。此時,作為混合物之a之平均值以2~100為宜,4~80尤佳。The compound (1) can be produced as a mixture of a plurality of compounds having a different amount of (C m F 2m O) a . At this time, the average value of a as the mixture is preferably 2 to 100, and particularly preferably 4 to 80.

(關於(Cn F2n-i Hi O)b ) (Cn F2n-i Hi O)b 因為氟原子之一部分可被氫原子取代,所以比起(Cm F2m O)a ,氫原子所致之極化較大,從而賦予化合物(1)與非氟系光聚合性化合物之相溶性。又,因為氟原子之一部分可被氫原子取代,所以比起(Cm F2m O)a ,分子之遷移性較高,從而賦予對象物潤滑性。(About (C n F 2n-i H i O) b ) (C n F 2n-i H i O) b Since one part of the fluorine atom can be substituted by a hydrogen atom, compared to (C m F 2m O) a , The polarization due to the hydrogen atom is large, and the compatibility of the compound (1) with the non-fluorine-based photopolymerizable compound is imparted. Further, since one of the fluorine atoms can be substituted by a hydrogen atom, the mobility of the molecule is higher than that of (C m F 2m O) a , and the object is lubricated.

n為1~6之整數。從可充分賦予對象物防污性的觀點來看,n為1~3為佳,1或2尤佳。n為2以上時,Cn F2n-i Hi O可為直鏈狀亦可為分枝狀。從可充分賦予對象物防污性的觀點來看,以直鏈狀為宜。 i為1~2n-1之整數。從可充分賦予化合物(1)與非氟系光聚合性化合物之相溶性的觀點來看,i宜為2以上之整數(惟,n為1之情況除外)。從可充分賦予對象物防污性的觀點來看,i以n以下之整數為宜。 Cn F2n-i Hi O之具體例可列舉CFHCF2 O、CH2 CF2 O、CF2 CH2 O、CH2 CF2 CF2 O、CH2 CF2 CH2 O、CF2 CF2 CH2 O、CF(CF3 )CH2 O、CF2 CF2 CF2 CH2 O、CF2 CF2 CF2 CF2 CH2 O等。n is an integer from 1 to 6. From the viewpoint of sufficiently imparting antifouling properties to the object, n is preferably 1 to 3, and 1 or 2 is particularly preferable. When n is 2 or more, C n F 2n-i H i O may be linear or branched. From the viewpoint of sufficiently imparting antifouling properties to the object, it is preferably a linear shape. i is an integer from 1 to 2n-1. From the viewpoint of sufficiently imparting compatibility between the compound (1) and the non-fluorine-based photopolymerizable compound, i is preferably an integer of 2 or more (except when n is 1). From the viewpoint of sufficiently imparting antifouling properties to the object, i is preferably an integer of n or less. Specific examples of C n F 2n-i H i O include CFHCF 2 O, CH 2 CF 2 O, CF 2 CH 2 O, CH 2 CF 2 CF 2 O, CH 2 CF 2 CH 2 O, and CF 2 CF 2 . CH 2 O, CF(CF 3 )CH 2 O, CF 2 CF 2 CF 2 CH 2 O, CF 2 CF 2 CF 2 CF 2 CH 2 O, and the like.

b為6~200之整數。(Cn F2n-i Hi O)b 可由n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O構成。 從可充分賦予化合物(1)與非氟系光聚合性化合物之相溶性的觀點來看,b以6以上之整數為佳,10以上之整數較佳,15以上之整數尤佳。從化合物(1)之數量平均分子量太大時,化合物(1)每單位分子量中存在的聚合性雙鍵數會減少且對象物之耐磨損性降低的觀點來看,b以100以下之整數為宜,80以下之整數較佳,60以下之整數尤佳。b is an integer from 6 to 200. (C n F 2n-i H i O) b may be composed of two or more C n F 2n-i H i O in which one or both of n and i are different from each other. From the viewpoint of sufficiently imparting compatibility between the compound (1) and the non-fluorine-based photopolymerizable compound, b is preferably an integer of 6 or more, and an integer of 10 or more is preferable, and an integer of 15 or more is particularly preferable. When the number average molecular weight of the compound (1) is too large, the compound (1) has a decrease in the number of polymerizable double bonds per unit molecular weight and the abrasion resistance of the object is lowered, and b is an integer of 100 or less. Preferably, an integer of 80 or less is preferred, and an integer of 60 or less is particularly preferred.

(Cn F2n-i Hi O)b 中存在n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O時,各Cn F2n-i Hi O之鍵結順序不受限。例如,存在2種Cn F2n-i Hi O時,2種Cn F2n-i Hi O可無規配置或交錯配置,亦可以是多數個其中一Cn F2n-i Hi O所構成之嵌段連結多數個另一Cn F2n-i Hi O所構成之嵌段。 例如,CF2 CFHO與CF2 CF2 CF2 CH2 O呈交錯鍵結時,可將(Cn F2n-i Hi O)b 以(CF2 CFHO-CF2 CF2 CF2 CH2 O)b/2 表示。此時表示b/2個(CF2 CFHO)與b/2個(CF2 CF2 CF2 CH2 O)呈交錯配置。另外,在此情況下的b為偶數。And i n the presence of one or both of the mutually different two or more kinds of C n F 2n-i H i O b in the (C n F 2n-i H i O), each of the C n F 2n-i H i The order of bonding of O is not limited. For example, when there are two kinds of C n F 2n-i H i O, the two C n F 2n-i H i O may be randomly configured or staggered, or may be one of a plurality of C n F 2n-i H i The block formed by O is a block of a plurality of other C n F 2n-i H i O. For example, when CF 2 CFHO and CF 2 CF 2 CF 2 CH 2 O are interlaced, (C n F 2n-i H i O) b can be (CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O ) b/2 indicates. At this time, it is shown that b/2 (CF 2 CFHO) and b/2 (CF 2 CF 2 CF 2 CH 2 O) are arranged in a staggered manner. In addition, b in this case is an even number.

化合物(1)可以(Cn F2n-i Hi O)b 之b數量不同的多種化合物之混合物製得。此時,作為混合物之b之平均值以6~100為宜,10~80尤佳。The compound (1) can be produced as a mixture of a plurality of compounds having different amounts of (C n F 2n-i H i O) b . At this time, the average value of b as a mixture is preferably 6 to 100, and particularly preferably 10 to 80.

(關於A) A為具有1個以上聚合性雙鍵之d價有機基。 d為1以上之整數,且以1~4為宜。從化合物(1)之易製性觀點來看,以1或2較佳;從可充分賦予對象物防污性的觀點來看,以2尤佳。(About A) A is a d-valent organic group having one or more polymerizable double bonds. d is an integer of 1 or more, and preferably 1 to 4. From the viewpoint of the ease of the compound (1), it is preferably 1 or 2, and more preferably 2 from the viewpoint of sufficiently imparting antifouling properties to the object.

聚合性雙鍵可藉由光照射與組成物中所含後述光聚合性化合物進行反應而賦予對象物耐磨耗性。 具有聚合性雙鍵之基可列舉(甲基)丙烯醯基、乙烯基、烯丙基、苯乙烯基、馬來亞醯胺基等。從可充分賦予對象物耐磨耗性的觀點來看,以(甲基)丙烯醯基為宜,丙烯醯基尤佳。 聚合性雙鍵數以化合物(1)每1分子為1~8為宜,1~4較佳,且1尤佳。The polymerizable double bond can be reacted with the photopolymerizable compound described later in the composition by light irradiation to impart abrasion resistance to the object. Examples of the group having a polymerizable double bond include a (meth)acryl fluorenyl group, a vinyl group, an allyl group, a styryl group, and a maleinium group. From the viewpoint of sufficiently imparting abrasion resistance to the object, a (meth) acrylonitrile group is preferred, and an acryl oxime group is particularly preferred. The number of polymerizable double bonds is preferably from 1 to 8 per molecule of the compound (1), preferably from 1 to 4, and particularly preferably 1.

化合物(1)宜為單羥基化合物之後述化合物(x)與具有能與羥基反應之官能基及聚合性雙鍵之化合物(後述化合物(w)等)的反應生成物,或宜為下述三者之反應生成物:後述化合物(x)、具有含活性氫基及聚合性雙鍵之化合物(後述化合物(y)等)以及具有2個以上能與含活性氫基反應之官能基之化合物(後述聚異氰酸酯(z)等)。 具有能與上述羥基反應之官能基與聚合性雙鍵之化合物宜為具有1個官能基與1~3個(甲基)丙烯醯氧基之化合物,可列舉(甲基)丙烯醯氯、(甲基)丙烯酸環氧丙酯、異氰酸酯烷基(甲基)丙烯酸酯等。 具有上述含活性氫基與聚合性雙鍵之化合物宜為具有1個羥基與1~3個(甲基)丙烯醯氧基之化合物,可列舉(甲基)丙烯酸羥烷基酯、三羥甲丙烷二(甲基)丙烯酸酯、新戊四醇三丙烯酸酯等。 具有2個以上能與含活性氫基反應之官能基之化合物宜為具有2~6個異氰酸酯基之聚異氰酸酯,且以具有2或3個異氰酸酯基之聚異氰酸酯較佳,三異氰酸酯尤佳。 A宜為上述反應生成物之化合物(x)部分(其羥基之氫原子除外的部分)以外的部分。The compound (1) is preferably a reaction product of a compound (x) which is a monohydroxy compound described later and a compound having a functional group capable of reacting with a hydroxyl group and a polymerizable double bond (the compound (w) described later), or preferably the following three Reaction product: a compound (x) to be described later, a compound having an active hydrogen group and a polymerizable double bond (such as a compound (y) described later), and a compound having two or more functional groups capable of reacting with an active hydrogen group ( Polyisocyanate (z), etc.) will be described later. The compound having a functional group capable of reacting with the above hydroxyl group and a polymerizable double bond is preferably a compound having one functional group and one to three (meth)acryloxycarbonyl groups, and examples thereof include (meth)acrylofluorene chloride, Glycidyl methacrylate, isocyanate alkyl (meth) acrylate, and the like. The compound having the above active hydrogen group-containing and polymerizable double bond is preferably a compound having one hydroxyl group and one to three (meth)acryloxycarbonyl groups, and examples thereof include hydroxyalkyl (meth)acrylate and trishydroxyl. Propane di(meth)acrylate, neopentyl alcohol triacrylate, and the like. The compound having two or more functional groups reactive with the active hydrogen-containing group is preferably a polyisocyanate having 2 to 6 isocyanate groups, and preferably a polyisocyanate having 2 or 3 isocyanate groups, particularly preferably a triisocyanate. A is preferably a moiety other than the compound (x) moiety (the portion other than the hydrogen atom of the hydroxyl group) of the above reaction product.

A之具體例可列舉如下列。 -C(=O)C(R)=CH2 、 -CH2 CH(OH)CH2 OC(=O)C(R)=CH2 、 -C(=O)NHCH2 CH2 OC(=O)C(R)=CH2 。 -C(=O)NH-Rz-(NHC(=O)O-Ry)2 (-C(=O)NH)2 -Rz-NHC(=O)O-Ry 惟,R為氫原子或甲基,Ry為後述之具有聚合性雙鍵及羥基之化合物(y)中從單羥基化合物去除羥基之殘基,Rz為後述之聚異氰酸酯(z)中從三異氰酸酯去除3個異氰酸酯基之殘基。Specific examples of A can be enumerated as follows. -C(=O)C(R)=CH 2 , -CH 2 CH(OH)CH 2 OC(=O)C(R)=CH 2 , -C(=O)NHCH 2 CH 2 OC(=O ) C(R) = CH 2 . -C(=O)NH-Rz-(NHC(=O)O-Ry) 2 (-C(=O)NH) 2 -Rz-NHC(=O)O-Ry However, R is a hydrogen atom or a Ry is a residue in which a hydroxyl group is removed from a monohydroxy compound in a compound (y) having a polymerizable double bond and a hydroxyl group, and Rz is a residue in which three isocyanate groups are removed from a triisocyanate in a polyisocyanate (z) to be described later. .

(Cm F2m O及Cn F2n-i Hi O之配置) 在化合物(1)中,a為1以上之整數時,a個Cm F2m O及b個Cn F2n-i Hi O之鍵結順序不受限。例如,Cm F2m O及Cn F2n-i Hi O可為無規配置或交錯配置,亦可由1個Cm F2m O或多個Cm F2m O所構成之嵌段與多個Cn F2n-i Hi O所構成之嵌段連結。(Arrangement of C m F 2m O and C n F 2n-i H i O) In the compound (1), when a is an integer of 1 or more, a C m F 2m O and b C n F 2n-i The bonding order of H i O is not limited. For example, C m F 2m O and C n F 2n-i H i O may be randomly or staggered, or may be composed of one C m F 2m O or a plurality of C m F 2m O blocks and The blocks formed by C n F 2n-i H i O are linked.

具有由多個Cn F2n-i Hi O構成之嵌段且因應需求更具有1個Cm F2m O或由多個Cm F2m O構成之嵌段的化合物(1)可列舉如化合物(11)~(14)。 [D-O-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b }-]d A・・・(11) [D-O-{(Cn F2n-i Hi O)c }-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b-c }-]d A・・・(12) [D-O-{(Cn F2n-i Hi O)b-1 }-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O}-]d A・・・(13) [D-O-{(Cn F2n-i Hi O)b }-]d A・・・(14) 惟,D、m、n、i、b、d及A與前述式(1)之D、m、n、i、b、d及A相同,a為1~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成,c為2或3,(Cn F2n-i Hi O)c 可由n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O構成。 a為2以上時,{(Cm F2m O)a }為a個Cm F2m O所構成之嵌段。 {(Cn F2n-i Hi O)b }為b個Cn F2n-i Hi O所構成之嵌段。 {(Cn F2n-i Hi O)c }為c個Cn F2n-i Hi O所構成之嵌段。 {(Cn F2n-i Hi O)b-c }為b-c個Cn F2n-i Hi O所構成之嵌段。 {(Cn F2n-i Hi O)b -1 }為b-1個Cn F2n-i Hi O所構成之嵌段。The compound (1) having a block composed of a plurality of C n F 2n-i H i O and having a C m F 2m O or a block composed of a plurality of C m F 2m O as required may be enumerated as Compounds (11) to (14). [DO-{(C m F 2m O) a }-{(C n F 2n-i H i O) b }-] d A・・・(11) [DO-{(C n F 2n-i H i O) c }-{(C m F 2m O) a }-{(C n F 2n-i H i O) bc }-] d A・・・(12) [DO-{(C n F 2n -i H i O) b-1 }-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O}-] d A・・・(13) [DO -{(C n F 2n-i H i O) b }-] d A・・・(14) However, D, m, n, i, b, d, and A are D and m of the above formula (1) , n, i, b, d, and A are the same, a is an integer from 1 to 200, and when a is 2 or more, (C m F 2m O) a may be composed of two or more types of C m F 2m O. c is 2 or 3, and (C n F 2n-i H i O) c may be composed of two or more C n F 2n-i H i O in which one or both of n and i are different from each other. When a is 2 or more, {(C m F 2m O) a } is a block composed of a C m F 2m O . {(C n F 2n-i H i O) b } is a block composed of b C n F 2n-i H i O . {(C n F 2n-i H i O) c } is a block composed of c C n F 2n-i H i O . {(C n F 2n-i H i O) bc } is a block composed of bc C n F 2n-i H i O . {(C n F 2n-i H i O) b -1 } is a block composed of b-1 C n F 2n-i H i O .

從可充分賦予對象物防污性的觀點來看,作為化合物(1)以化合物(11)為宜。 從對象物之防污性及化合物(1)之與非氟系光聚合性化合物之相溶性的平衡觀點來看,作為化合物(1)以化合物(12)為宜。 以a/b表示之a與b之比值宜為20/1~1/20,10/1~1/10尤佳。a/b只要在前述範圍內,對象物之防污性及化合物(1)之與非氟系光聚合性化合物之相溶性的平衡即佳。From the viewpoint of sufficiently imparting antifouling properties to the object, the compound (11) is preferably used as the compound (1). From the viewpoint of the balance between the antifouling property of the object and the compatibility of the compound (1) with the non-fluorine photopolymerizable compound, the compound (12) is preferably used as the compound (1). The ratio of a to b expressed by a/b is preferably 20/1 to 1/20, and particularly preferably 10/1 to 1/10. When a/b is within the above range, the balance between the antifouling property of the object and the compatibility of the compound (1) with the non-fluorine photopolymerizable compound is preferable.

(化合物(1)之數量平均分子量) 化合物(1)之數量平均分子量以1,200~8,000為宜,1,200~7,000較佳,1,200~5,000尤佳。數量平均分子量只要在該範圍內,便可充分賦予對象物(硬塗層等)防污性及耐磨耗性,並且在組成物中化合物(1)與其他成分之相溶性優異。 化合物(1)之數量平均分子量係利用凝膠滲透層析術(GPC)求得之以聚甲基丙烯酸甲酯換算之數量平均分子量。(Quantitative average molecular weight of the compound (1)) The number average molecular weight of the compound (1) is preferably 1,200 to 8,000, more preferably 1,200 to 7,000, and particularly preferably 1,200 to 5,000. When the number average molecular weight is within this range, the antifouling property and the abrasion resistance of the object (such as a hard coat layer) can be sufficiently imparted, and the compatibility of the compound (1) with other components in the composition is excellent. The number average molecular weight of the compound (1) is a number average molecular weight in terms of polymethyl methacrylate determined by gel permeation chromatography (GPC).

(化合物(1)之製造方法) 化合物(1)例如可藉由使化合物(x)與A之前驅物起反應來製造。 D-O-{(Cm F2m O)a (Cn F2n-i Hi O)b }-H・・・(x) 惟,D、m、a、n、i及b與前述式(1)之D、m、a、n、i及b相同。(Manufacturing Method of Compound (1)) The compound (1) can be produced, for example, by reacting the compound (x) with the precursor of A. DO-{(C m F 2m O) a (C n F 2n-i H i O) b }-H・・・(x) However, D, m, a, n, i, and b are the same as the above formula (1) ) D, m, a, n, i, and b are the same.

由於化合物(x)為單羥基化合物,故在與化合物(x)起反應之A之前驅物為單官能化合物時,可製造出d為1之化合物(1)。A之前驅物為多官能化合物時,則可製造出d為2以上之化合物(1)。此外,A之前驅物為2種以上化合物時,可製造d為1之化合物(1)或d為2以上之化合物(1),也可製造d為1之化合物(1)及d為2以上之化合物(1)的混合物。Since the compound (x) is a monohydroxy compound, when the precursor is a monofunctional compound before the reaction with the compound (x), the compound (1) wherein d is 1 can be produced. When the precursor before A is a polyfunctional compound, the compound (1) wherein d is 2 or more can be produced. Further, when the precursor of A is two or more kinds of compounds, the compound (1) wherein d is 1 or the compound (1) wherein d is 2 or more can be produced, and the compound (1) wherein d is 1 and the ratio of d to 2 or more can be produced. a mixture of compounds (1).

<化合物(1)之製造方法(其1)> 化合物(1)例如可藉由使化合物(x)與化合物(w)進行反應來製造,該化合物(w)具有能與羥基反應之基及聚合性雙鍵。 化合物(w)係具有1個以上能與羥基反應之基且具有1個以上聚合性雙鍵的化合物。能與羥基反應之基為1個時,可製造d為1之化合物(1),能與羥基反應之基為2個以上時,則可製造d為2以上之化合物(1)。化合物(w)之能與羥基反應之基數宜為1個或2個,且以1個尤佳。 聚合性雙鍵數宜為1~3個,且以1個尤佳。化合物(w)宜為具有(甲基)丙烯醯氧基之化合物,尤宜為具有丙烯醯氧基之化合物。 能與羥基反應之官能基可列舉羧基及其反應性衍生物基(鹵化醯基等)、環氧基、異氰酸酯基等。 化合物(w)可列舉如(甲基)丙烯醯氯、環氧烷基(甲基)丙烯酸酯、異氰酸酯烷基(甲基)丙烯酸酯等。 化合物(w)之具體例可列舉下述化合物。 Cl-C(=O)C(R)=CH2 、 Ep-CH2 OC(=O)C(R)=CH2 、 OCN-CH2 CH2 OC(=O)C(R)=CH2 。 惟,R為氫原子或甲基,Ep為環氧基。<Method for Producing Compound (1) (Part 1)> The compound (1) can be produced, for example, by reacting a compound (x) with a compound (w) having a group capable of reacting with a hydroxyl group and polymerizing Sexual double bonds. The compound (w) is a compound having one or more reactive groups capable of reacting with a hydroxyl group and having one or more polymerizable double bonds. When the number of groups capable of reacting with a hydroxyl group is one, a compound (1) wherein d is 1 can be produced, and when two or more groups capable of reacting with a hydroxyl group are used, a compound (1) wherein d is 2 or more can be produced. The number of the compounds (w) capable of reacting with the hydroxyl group is preferably one or two, and particularly preferably one. The number of polymerizable double bonds is preferably from 1 to 3, and more preferably one. The compound (w) is preferably a compound having a (meth) propylene fluorenyloxy group, and particularly preferably a compound having an acryloxy group. Examples of the functional group reactive with a hydroxyl group include a carboxyl group and a reactive derivative group (such as a halogenated group), an epoxy group, and an isocyanate group. The compound (w) may, for example, be (meth)acrylofluorene chloride, alkylene oxide (meth)acrylate or isocyanate alkyl (meth)acrylate. Specific examples of the compound (w) include the following compounds. Cl-C(=O)C(R)=CH 2 , Ep-CH 2 OC(=O)C(R)=CH 2 , OCN-CH 2 CH 2 OC(=O)C(R)=CH 2 . However, R is a hydrogen atom or a methyl group, and Ep is an epoxy group.

使羥基與醯氯反應時會使用鹼性化合物。 使羥基與異氰酸酯基反應時則使用胺甲酸乙酯化觸媒。 製造化合物(1)時,亦可使用製造所需的添加劑(以下亦表記為「製造用添加劑」)。製造用添加劑可舉如聚合抑制劑等。 又,若於反應生成物中殘留未反應之化合物(x),則最終製得之化合物(1)中會殘留化合物(x)。化合物(x)與其他成分之相溶性很低,因此於生成之化合物(1)中殘留有化合物(x)時,組成物可能會白濁。因此,宜使化合物(x)與過剩當量之化合物(w)進行反應,讓實質上所有的化合物(x)皆與化合物(w)反應,並應需求從反應生成物除去未反應之化合物(w)。A basic compound is used when reacting a hydroxyl group with ruthenium chloride. When the hydroxyl group is reacted with an isocyanate group, an urethane ethyl carboxylate catalyst is used. When the compound (1) is produced, an additive required for production (hereinafter also referred to as "additive for manufacturing") can also be used. The additive for production may, for example, be a polymerization inhibitor or the like. Further, when the unreacted compound (x) remains in the reaction product, the compound (x) remains in the finally obtained compound (1). Since the compound (x) has low compatibility with other components, the composition may be cloudy when the compound (x) remains in the resulting compound (1). Therefore, it is preferred to react the compound (x) with the excess equivalent compound (w) such that substantially all of the compound (x) is reacted with the compound (w), and the unreacted compound is removed from the reaction product as required (w) ).

<化合物(1)之製造方法(其2)> 另,化合物(1)亦可使化合物(x)與具有聚合性雙鍵及反應性基之化合物透過能連結兩化合物之多官能化合物結合而製造。多官能化合物以具有2個以上異氰酸酯基之化合物(以下表記為聚異氰酸酯(z))為佳,具有聚合性雙鍵及反應性基之化合物則以具有聚合性雙鍵及含活性氫基之化合物(以下表記為化合物(y))為宜。<Method for Producing Compound (1) (Part 2)> The compound (1) can also be produced by combining a compound (x) with a compound having a polymerizable double bond and a reactive group through a polyfunctional compound capable of linking two compounds. . The polyfunctional compound is preferably a compound having two or more isocyanate groups (hereinafter referred to as polyisocyanate (z)), and a compound having a polymerizable double bond and a reactive group is a compound having a polymerizable double bond and an active hydrogen group. (The following table is a compound (y)).

化合物(y)係具有1個以上含活性氫基及1個以上聚合性雙鍵之化合物,含活性氫基可列舉羥基、1級胺基、2級胺基、羧基等。含活性氫基以羥基為宜。1分子中之含活性氫基數宜為1或2個,且1個尤佳。1分子中之聚合性雙鍵數宜為1~3個,且1個尤佳。化合物(y)宜為具有1個羥基與1~3個(甲基)丙烯醯氧基之化合物,可列舉(甲基)丙烯酸羥烷基酯、三羥甲丙烷二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯等。具有羥基以外之含活性氫基的化合物可列舉如丙烯酸2-胺乙酯等之(甲基)丙烯酸胺烷基酯等。 聚異氰酸酯(z)係具有2個以上異氰酸酯基之化合物,以具有2~4個異氰酸酯基之化合物為佳,尤宜為三異氰酸酯。The compound (y) is a compound having one or more active hydrogen groups and one or more polymerizable double bonds, and examples of the active hydrogen group include a hydroxyl group, a primary amine group, a secondary amine group, and a carboxyl group. The active hydrogen group is preferably a hydroxyl group. The number of active hydrogen-containing groups in one molecule is preferably 1 or 2, and 1 is particularly preferable. The number of polymerizable double bonds in one molecule is preferably from 1 to 3, and one is particularly preferred. The compound (y) is preferably a compound having one hydroxyl group and one to three (meth)acryloxycarbonyl groups, and examples thereof include hydroxyalkyl (meth)acrylate and trimethylolpropane di(meth)acrylate. Neopentyl triol (meth) acrylate, and the like. Examples of the compound having an active hydrogen group other than a hydroxyl group include an amine alkyl (meth)acrylate such as 2-aminoethyl acrylate. The polyisocyanate (z) is a compound having two or more isocyanate groups, preferably a compound having 2 to 4 isocyanate groups, and particularly preferably a triisocyanate.

聚異氰酸酯(z)為多官能性,因此即使化合物(y)為單官能性,化合物(x)、化合物(y)及聚異氰酸酯(z)之反應生成物也可輕易地成為多種化合物之混合物。反應生成物中,具有化合物(x)之殘基及化合物(y)之殘基的反應生成物為化合物(1),僅具有其中一者之殘基的化合物則為非化合物(1)之反應生成物。由化合物(x)之殘基及化合物(y)之殘基其中一者與聚異氰酸酯(z)之殘基所構成的反應生成物以下稱作副產物(v)。 副產物(v)中具有化合物(y)之殘基的化合物為具有聚合性雙鍵之化合物,所以為光聚合性化合物,即使含在化合物(1)中,對於光硬化性組成物之物性的影響還是較少。另一方面,副產物(v)中具有化合物(x)之殘基的化合物為不具聚合性雙鍵之化合物,所以與含有未反應化合物(x)之化合物(1)同樣對光硬化性組成物之物性的影響較大。 因此,在此製造方法中,宜使用較少生成副產物(v)的方法,尤宜使用副產物(v)中具有化合物(x)之殘基的化合物生成較少的方法。具體上,比起將化合物(x)、化合物(y)及聚異氰酸酯(z)3者混合進行反應之方法,下述方法較佳:使化合物(x)或化合物(y)其中一者與過剩當量之聚異氰酸酯(z)反應製造出具有異氰酸酯基之中間反應生成物後,接著使化合物(x)或化合物(y)中之另一者反應來生成不具異氰酸酯基之反應生成物。尤以下述方法為佳:使化合物(x)與過剩當量之聚異氰酸酯(z)反應製造出具有異氰酸酯基之中間反應生成物後,接著對中間反應生成物使用同等當量以上之化合物(y)進行反應,來生成不具異氰酸酯基之反應生成物。 又,為了抑制副產物(v)之生成,宜使用異氰酸酯基數為3以上之聚異氰酸酯(z)。Since the polyisocyanate (z) is polyfunctional, even if the compound (y) is monofunctional, the reaction product of the compound (x), the compound (y) and the polyisocyanate (z) can easily be a mixture of a plurality of compounds. In the reaction product, the reaction product having the residue of the compound (x) and the residue of the compound (y) is the compound (1), and the compound having only one of the residues is the reaction of the non-compound (1). Product. The reaction product composed of the residue of the compound (x) and the residue of the compound (y) and the residue of the polyisocyanate (z) is hereinafter referred to as a by-product (v). The compound having a residue of the compound (y) in the by-product (v) is a compound having a polymerizable double bond, and is a photopolymerizable compound, even if it is contained in the compound (1), the physical properties of the photocurable composition. The impact is still less. On the other hand, since the compound having the residue of the compound (x) in the by-product (v) is a compound having no polymerizable double bond, the photocurable composition is the same as the compound (1) containing the unreacted compound (x). The influence of physical properties is greater. Therefore, in this production method, it is preferred to use a method of generating by-product (v) less, and it is particularly preferable to use a compound having a residue of the compound (x) in the by-product (v) to produce a lesser method. Specifically, compared with the method of mixing the compound (x), the compound (y) and the polyisocyanate (z) 3, the following method is preferred: one of the compound (x) or the compound (y) is excessive The equivalent polyisocyanate (z) is reacted to produce an intermediate reaction product having an isocyanate group, and then the other of the compound (x) or the compound (y) is reacted to form a reaction product having no isocyanate group. In particular, it is preferred to react the compound (x) with an excess equivalent of the polyisocyanate (z) to produce an intermediate reaction product having an isocyanate group, and then to use an equivalent equivalent or more of the compound (y) for the intermediate reaction product. The reaction is carried out to produce a reaction product which does not have an isocyanate group. Further, in order to suppress the formation of by-product (v), it is preferred to use a polyisocyanate (z) having an isocyanate group number of 3 or more.

化合物(y)為單羥基化合物且聚異氰酸酯(z)為三異氰酸酯時,就反應生成物來說可能會生成下述化合物。該等中,式(1-1)及式(1-2)所示化合物為化合物(1),式(2)及式(3)所示化合物為副產物(v)。 Rx-C(=O)NH-Rz-(NHC(=O)O-Ry)2 ・・・(1-1) (Rx-C(=O)NH)2 -Rz-NHC(=O)O-Ry・・・(1-2) (Rx-C(=O)NH)3 -Rz・・・(2) Rz-(NHC(=O)O-Ry)3 ・・・(3) 惟,Rx係已從化合物(x)除去羥基之殘基,Ry係已從單羥基化合物之化合物(y)除去羥基之殘基,Rz係已從三異氰酸酯之聚異氰酸酯(z)除去異氰酸酯基之殘基。When the compound (y) is a monohydroxy compound and the polyisocyanate (z) is a triisocyanate, the following compounds may be formed in the case of the reaction product. Among these, the compound represented by the formula (1-1) and the formula (1-2) is the compound (1), and the compound represented by the formula (2) and the formula (3) is a by-product (v). Rx-C(=O)NH-Rz-(NHC(=O)O-Ry) 2・・・(1-1) (Rx-C(=O)NH) 2 -Rz-NHC(=O)O -Ry・・・(1-2) (Rx-C(=O)NH) 3 -Rz・・・(2) Rz-(NHC(=O)O-Ry) 3・・・(3) Rx has removed the residue of the hydroxyl group from the compound (x), the Ry has removed the residue of the hydroxyl group from the compound (y) of the monohydroxy compound, and the Rz has removed the residue of the isocyanate group from the polyisocyanate (z) of the triisocyanate. .

以上述製造方法製得之反應生成物通常為含有化合物(1-1)及化合物(1-2)之混合物,視情況可能含有化合物(2)或化合物(3)。如前述,化合物(2)之含量不宜多,而化合物(3)含量多至某一程度也不會有太多問題。 本發明之光硬化性組成物中所含含氟化合物可為上述混合物之含氟化合物。以下,含有本發明之含氟化合物的光硬化性組成物亦表示含有上述反應生成物之光硬化性組成物。The reaction product obtained by the above production method usually contains a mixture of the compound (1-1) and the compound (1-2), and may optionally contain the compound (2) or the compound (3). As described above, the content of the compound (2) is not particularly high, and the content of the compound (3) does not have much problem to a certain extent. The fluorine-containing compound contained in the photocurable composition of the present invention may be a fluorine-containing compound of the above mixture. Hereinafter, the photocurable composition containing the fluorine-containing compound of the present invention also represents a photocurable composition containing the above reaction product.

上述製造方法中,使化合物(x)或化合物(y)與聚異氰酸酯(z)或具有前述異氰酸酯基之中間反應生成物反應時,可在胺甲酸乙酯化觸媒等反應觸媒存在下進行反應。又,亦可在聚合抑制劑等製造用添加劑存在下進行反應。 又,若於化合物(1)中殘留未反應之化合物(x),則最終製得之組成物中也會殘留化合物(x)。化合物(x)與其他成分之相溶性低,因此於組成物中殘留有化合物(x)時,組成物可能會白濁。因此,為了不殘留未反應之化合物(x),首先宜使化合物(x)與過剩的聚異氰酸酯(z)反應,讓化合物(x)完全消耗後,與相對於殘存之異氰酸酯基為同等當量以上之化合物(y)進行反應。In the above production method, when the compound (x) or the compound (y) is reacted with the polyisocyanate (z) or an intermediate reaction product having the above-mentioned isocyanate group, it can be carried out in the presence of a reaction catalyst such as a urethane conversion catalyst. reaction. Further, the reaction may be carried out in the presence of an additive for production such as a polymerization inhibitor. Further, when the unreacted compound (x) remains in the compound (1), the compound (x) remains in the finally obtained composition. Since the compound (x) has low compatibility with other components, when the compound (x) remains in the composition, the composition may become cloudy. Therefore, in order to prevent the unreacted compound (x) from remaining, it is preferred to first react the compound (x) with the excess polyisocyanate (z), and after completely consuming the compound (x), it is equivalent to the equivalent of the remaining isocyanate group. The compound (y) is reacted.

化合物(x)與化合物(y)之質量比因應對象物所需特性(防污性、耐磨耗性等)適宜設定即可。從賦予對象物之防污性及耐磨耗性的平衡觀點來看,化合物(x)與化合物(y)之質量比宜為9:1~5:5,8:2~6:4尤佳。The mass ratio of the compound (x) to the compound (y) may be appropriately set in accordance with the desired properties (antifouling property, abrasion resistance, etc.) of the object. From the viewpoint of balance between the antifouling property and the abrasion resistance of the object to be applied, the mass ratio of the compound (x) to the compound (y) is preferably 9:1 to 5:5, and 8:2 to 6:4 is particularly preferable. .

<化合物(x)> 化合物(x)可列舉如化合物(x1)~(x4)。 D-O-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b }-H・・・(x1) D-O-{(Cn F2n-i Hi O)c }-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b-c }-H・・・(x2) D-O-{(Cn F2n-i Hi O)b-1 }-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O}-H・・・(x3) D-O-{(Cn F2n-i Hi O)b }-H・・・(x4) 惟,D、m、a、n、i及b與前述式(11)~(14)之D、m、a、n、i及b相同。<Compound (x)> The compound (x) may, for example, be a compound (x1) to (x4). DO-{(C m F 2m O) a }-{(C n F 2n-i H i O) b }-H・・・(x1) DO-{(C n F 2n-i H i O) c }-{(C m F 2m O) a }-{(C n F 2n-i H i O) bc }-H・・・(x2) DO-{(C n F 2n-i H i O) b -1 }-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O}-H・・・(x3) DO-{(C n F 2n-i H i O) b }-H・(x4) However, D, m, a, n, i, and b are the same as D, m, a, n, i, and b of the above formulas (11) to (14).

<化合物(x1)之製造方法(其1)> 化合物(x1)例如可在鹼性化合物存在下使化合物(21)對化合物(20)進行加成反應而以化合物(x11)之態樣獲得。 D-O-{(Cm F2m O)a }-Cm-1 F2(m-1) CH2 -OH・・・(20) CF2 =CF-O-CF2 CF2 CF2 CH2 -OH・・・(21) D-O-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O-(CF2 CFHO-CF2 CF2 CF2 CH2 O)(b-1)/2 }-H・・・(x11) 惟,b為7以上之奇數。<Method for Producing Compound (x1) (Part 1)> The compound (x1) can be obtained, for example, by subjecting the compound (21) to the compound (20) in the presence of a basic compound to obtain the compound (x11). DO-{(C m F 2m O) a }-C m-1 F 2(m-1) CH 2 -OH・(20) CF 2 =CF-O-CF 2 CF 2 CF 2 CH 2 - OH・・・(21) DO-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O-(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O ) (b-1)/2 }-H・・・(x11) However, b is an odd number of 7 or more.

化合物(20)之具體例可列舉如下。 CF3 -O-{(CF2 CF2 O)a }-CF2 CH2 -OH、 CF3 -O-{(CF2 O)a1 (CF2 CF2 O)a2 }-CF2 CH2 -OH、 CF3 CF2 CF2 -O-{(CF2 CF2 CF2 O)a }-CF2 CF2 CH2 -OH、 CF3 CF2 CF2 -O-{(CF(CF3 )CF2 O)a }-CF(CF3 )CH2 -OH、 CF3 -O-{(CF2 CF2 O-CF2 CF2 CF2 CF2 O)(a-1)/2 -CF2 CF2 O}-CF2 CF2 CF2 CH2 -OH(惟,a為3以上之奇數)等。Specific examples of the compound (20) are as follows. CF 3 -O-{(CF 2 CF 2 O) a }-CF 2 CH 2 -OH, CF 3 -O-{(CF 2 O) a1 (CF 2 CF 2 O) a2 }-CF 2 CH 2 - OH, CF 3 CF 2 CF 2 -O-{(CF 2 CF 2 CF 2 O) a }-CF 2 CF 2 CH 2 -OH, CF 3 CF 2 CF 2 -O-{(CF(CF 3 )CF 2 O) a }-CF(CF 3 )CH 2 -OH, CF 3 -O-{(CF 2 CF 2 O-CF 2 CF 2 CF 2 CF 2 O) (a-1)/2 -CF 2 CF 2 O}-CF 2 CF 2 CF 2 CH 2 -OH (except that a is an odd number of 3 or more).

化合物(20)可利用國際公開第2009/008380號、日本特開2011-116947號公報等中記載之方法來製造。 化合物(21)例如可利用還原劑(硼氫化鈉等)使化合物(22)還原來製造。 CF2 =CF-O-CF2 CF2 CF2 C(=O)OCH3 ・・・(22)The compound (20) can be produced by the method described in, for example, Japanese Laid-Open Patent Publication No. 2009-116947, and the like. The compound (21) can be produced, for example, by reducing a compound (22) with a reducing agent (sodium borohydride or the like). CF 2 =CF-O-CF 2 CF 2 CF 2 C(=O)OCH 3・・・(22)

<化合物(x1)之製造方法(其2)> 化合物(x1)例如可利用下述方法以化合物(x12)之態樣獲得。 在鹼性化合物存在下,使化合物(23)(2,2,3,3-四氟氧雜環丁烷)對前述化合物(20)進行加成反應可獲得化合物(24)。<Method for Producing Compound (x1) (Part 2)> The compound (x1) can be obtained, for example, in the form of the compound (x12) by the following method. The compound (24) can be obtained by subjecting the compound (23) (2,2,3,3-tetrafluorooxetane) to the above compound (20) in the presence of a basic compound.

[化1] [Chemical 1]

D-O-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O-(CH2 CF2 CF2 O)b-2 }-CH2 CF2 C(=O)F・・・(24) 化合物(23)可利用國際公開第2005/080365號等中記載之方法來製造。DO-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O-(CH 2 CF 2 CF 2 O) b-2 }-CH 2 CF 2 C(= O) F (24) The compound (23) can be produced by the method described in International Publication No. 2005/080365.

使化合物(25)對前述化合物(24)進行反應可獲得化合物(26)。 HOR2 ・・・(25) D-O-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O-(CH2CF2 CF2 O)b-2 }-CH2 CF2 C(=O)OR2 ・・・(26) 惟,R2 為烷基。Compound (26) can be obtained by reacting compound (25) with the aforementioned compound (24). HOR 2・・・(25) DO-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O-(CH2CF 2 CF 2 O) b-2 }-CH 2 CF 2 C(=O)OR 2 (26) However, R 2 is an alkyl group.

利用還原劑(硼氫化鈉等)使前述化合物(26)還原可獲得化合物(x12)。 D-O-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O-(CH2 CF2 CF2 O)b-2 -CH2 CF2 CH2 O}-H・・・(x12)The compound (x12) can be obtained by reducing the aforementioned compound (26) with a reducing agent (sodium borohydride or the like). DO-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O-(CH 2 CF 2 CF 2 O) b-2 -CH 2 CF 2 CH 2 O} -H・・・(x12)

<化合物(x2)之製造方法(其1)> 化合物(x2)例如可使用化合物(27)來替代前述化合物(20),除此以外可以與化合物(x1)之製造方法(其1)同樣的方式以化合物(x21)之態樣製得。 D-O-{(Cn F2n-i Hi O)c }-{(Cm F2m O)a }-Cm-1 F2(m-1) CH2 -OH・・・(27) D-O-{(Cn F2n-i Hi O)c }-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O-(CF2 CFHO-CF2 CF2 CF2 CH2 O)(b-c-1)/2 }-H・・・(x21) 惟,b-c-1為2以上之偶數。<Method for Producing Compound (x2) (Part 1)> The compound (x2) can be used in the same manner as the method for producing the compound (x1), for example, in addition to the compound (27). The manner is obtained in the form of the compound (x21). DO-{(C n F 2n-i H i O) c }-{(C m F 2m O) a }-C m-1 F 2(m-1) CH 2 -OH・・・(27) DO -{(C n F 2n-i H i O) c }-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O-(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) (bc-1)/2 }-H・(x21) However, bc-1 is an even number of 2 or more.

化合物(27)之具體例可列舉如下。 CF3 CF2 CF2 -O-{CFHCF2 O-CH2 CF2 O}-{(CF2 O)a1 (CF2 CF2 O)a2 }-CF2 CH2 -OH。 化合物(27)可利用專利文獻2等中記載之方法來製造。Specific examples of the compound (27) are as follows. CF 3 CF 2 CF 2 -O-{CFHCF 2 O-CH 2 CF 2 O}-{(CF 2 O) a1 (CF 2 CF 2 O) a2 }-CF 2 CH 2 -OH. The compound (27) can be produced by the method described in Patent Document 2 or the like.

<化合物(x2)之製造方法(其2)> 化合物(x2)例如可使用前述化合物(27)來替代前述化合物(20),除此以外可以與化合物(x1)之製造方法(其2)同樣的方式以化合物(x22)之態樣製得。 D-O-{(Cn F2n-i Hi O)c }-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O-(CH2 CF2 CF2 O)b-c-2 -CH2 CF2 CH2 O}-H・・・(x22)(Manufacturing Method of Compound (x2) (Part 2)> The compound (x2) can be used, for example, in place of the above-mentioned compound (20), and can be used in the same manner as in the production method (2) of the compound (x1). The manner is obtained in the form of the compound (x22). DO-{(C n F 2n-i H i O) c }-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O-(CH 2 CF 2 CF 2 O) bc-2 -CH 2 CF 2 CH 2 O}-H・・・(x22)

<化合物(x3)之製造方法(其1)> 化合物(x3)例如可利用下述方法以化合物(x31)之態樣獲得。 在鹼性化合物存在下,使前述化合物(21)對化合物(28)進行加成反應可獲得化合物(29)。 D-OH・・・(28) D-O-{(CF2 CFHO-CF2 CF2 CF2 CH2 O)(b-2)/2 }-H・・・(29) 惟,D為(Rf1 )e -R1 -,b為6以上之偶數。<Method for Producing Compound (x3) (Part 1)> The compound (x3) can be obtained, for example, in the form of the compound (x31) by the following method. Compound (29) can be obtained by subjecting compound (21) to addition reaction of compound (28) in the presence of a basic compound. D-OH · · · (28 ) DO - {(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) (b-2) / 2} -H · · · (29) However, D is (R f1 ) e -R 1 -, b is an even number of 6 or more.

化合物(28)之具體例可列舉如下。 CF3 CH2 -OH、 (CF3 )2 CH-OH、 CF3 CF2 CH2 -OH、 CF3 CF2 CF2 CH2 CH2 -OH、 CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 -OH。Specific examples of the compound (28) are as follows. CF 3 CH 2 -OH, (CF 3 ) 2 CH-OH, CF 3 CF 2 CH 2 -OH, CF 3 CF 2 CF 2 CH 2 CH 2 -OH, CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 -OH.

使前述化合物(29)與化合物(30)反應而獲得化合物(x31)。 L-CH2 Cm-1 F2(m-1) O-{(Cm F2m O)a }-Cm-1 F2(m-1) CH2 -OH・・・(30) D-O-{(CF2 CFHO-CF2 CF2 CF2 CH2 O)(b-2)/2 -CH2 Cm-1 F2(m-1) O}-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O}-H・・・(x31) 惟,L為脫離基。L可列舉如甲苯磺醯基、三氟甲磺醯基、九氟丁磺醯基。The compound (29) is reacted with the compound (30) to obtain a compound (x31). L-CH 2 C m-1 F 2(m-1) O-{(C m F 2m O) a }-C m-1 F 2(m-1) CH 2 -OH・(・)(30) DO -{(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) (b-2)/2 -CH 2 C m-1 F 2(m-1) O}-{(C m F 2m O) a }-{C m-1 F 2(m-1) CH 2 O}-H・・・(x31) However, L is a leaving group. L may, for example, be a toluenesulfonyl group, a trifluoromethanesulfonyl group or a nonafluorobutylsulfonyl group.

化合物(30)可利用日本特開2011-116947號公報等中記載之方法製造化合物(31),再將其中一羥基取代成脫離基L而製得。 HO-CH2 Cm-1 F2(m-1) O-{(Cm F2m O)a }-Cm-1 F2(m-1) CH2 -OH・・・(31)The compound (30) can be produced by the method described in JP-A-2011-116947 or the like, and the monohydroxy group is substituted with the cleavable group L. HO-CH 2 C m-1 F 2(m-1) O-{(C m F 2m O) a }-C m-1 F 2(m-1) CH 2 -OH・・・(31)

<化合物(x3)之製造方法(其2)> 化合物(x3)例如可利用下述方法以化合物(x32)之態樣獲得。 在鹼性化合物存在下,使前述化合物(23)對前述化合物(28)進行加成反應可獲得化合物(32)。 D-O-{(CH2 CF2 CF2 O)b-3 }-CH2 CF2 C(=O)F・・・(32)<Method for Producing Compound (x3) (Part 2)> The compound (x3) can be obtained, for example, in the form of the compound (x32) by the following method. The compound (32) can be obtained by subjecting the above compound (23) to the above compound (28) in the presence of a basic compound. DO-{(CH 2 CF 2 CF 2 O) b-3 }-CH 2 CF 2 C(=O)F・・・(32)

使前述化合物(25)對前述化合物(32)進行反應可獲得化合物(33)。 D-O-{(CH2 CF2 CF2 O)b-3 }-CH2 CF2 C(=O)OR2 ・・・(33)The compound (33) can be obtained by reacting the aforementioned compound (25) with the aforementioned compound (32). DO-{(CH 2 CF 2 CF 2 O) b-3 }-CH 2 CF 2 C(=O)OR 2・・・(33)

利用還原劑(硼氫化鈉等)使前述化合物(33)還原可獲得化合物(34)。 D-O-{(CH2 CF2 CF2 O)b-3 -CH2 CF2 CH2 O}-H・・・(34)The compound (34) can be obtained by reducing the aforementioned compound (33) with a reducing agent (sodium borohydride or the like). DO-{(CH 2 CF 2 CF 2 O) b-3 -CH 2 CF 2 CH 2 O}-H・・・(34)

使前述化合物(34)與前述化合物(30)反應而獲得化合物(x32)。 D-O-{(CH2 CF2 CF2 O)b-3 -CH2 CF2 CH2 O-CH2 Cm-1 F2(m-1) O}-{(Cm F2m O)a }-{Cm-1 F2(m-1) CH2 O}-H・・・(x32) 惟,L為脫離基。The compound (34) is reacted with the aforementioned compound (30) to obtain a compound (x32). DO-{(CH 2 CF 2 CF 2 O) b-3 -CH 2 CF 2 CH 2 O-CH 2 C m-1 F 2(m-1) O}-{(C m F 2m O) a } -{C m-1 F 2(m-1) CH 2 O}-H・・・(x32) However, L is a leaving group.

(化合物(x4)之製造方法) 化合物(x4)例如可藉由與化合物(x3)之製造方法(其1)之化合物(29)之製造方法或是化合物(x3)之製造方法(其2)之化合物(34)之製造方法同樣的方式,以化合物(x41)或化合物(x42)之態樣製得。 D-O-{(CF2 CFHO-CF2 CF2 CF2 CH2 O)b/2 }-H・・・(x41) D-O-{(CH2 CF2 CF2 O)b-1 -CH2 CF2 CH2 O}-H・・・(x42)(Manufacturing Method of Compound (x4)) The compound (x4) can be produced, for example, by the method for producing the compound (29) of the compound (x3) or the method for producing the compound (x3) (these 2) The compound (34) is produced in the same manner as the compound (x41) or the compound (x42). DO-{(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) b/2 }-H・(x41) DO-{(CH 2 CF 2 CF 2 O) b-1 -CH 2 CF 2 CH 2 O}-H・・・(x42)

(化合物(x)之數量平均分子量) 化合物(x)之數量平均分子量以1,000~6,000為宜,1,000~5,000較佳,1,200~4,000尤佳。化合物(x)之數量平均分子量只要在該範圍內,便可充分賦予對象物防污性,且化合物(x)與組成物中之其他成分之相溶性優異。 化合物(x)之數量平均分子量可利用下述方法求得:利用GPC與聚甲基丙烯酸甲酯之流出時間作比較,或是利用核磁共振裝置(NMR)比較內部標準物質與化合物(x)之末端官能基的積分比。(Quantitative average molecular weight of the compound (x)) The number average molecular weight of the compound (x) is preferably 1,000 to 6,000, preferably 1,000 to 5,000, more preferably 1,200 to 4,000. When the number average molecular weight of the compound (x) is within this range, the antifouling property of the object can be sufficiently imparted, and the compound (x) is excellent in compatibility with other components in the composition. The number average molecular weight of the compound (x) can be determined by comparing the elution time of GPC with polymethyl methacrylate or comparing the internal standard substance with the compound (x) by a nuclear magnetic resonance apparatus (NMR). The integral ratio of the terminal functional groups.

<化合物(y)> 化合物(y)如前述為具有聚合性雙鍵及含活性氫基之化合物。 化合物(y)尤宜為具有1個羥基及1個(甲基)丙烯醯氧基之化合物。具體上,可列舉(甲基)丙烯酸羥烷基酯、聚氧伸烷基二醇單(甲基)丙烯酸酯等。化合物(y)以羥烷基之碳數為2~10之(甲基)丙烯酸羥烷基酯更佳,尤以具有末端具羥基之直鏈狀羥烷基的丙烯酸羥烷基酯為佳。<Compound (y)> The compound (y) is a compound having a polymerizable double bond and an active hydrogen group as described above. The compound (y) is particularly preferably a compound having one hydroxyl group and one (meth) acryloxy group. Specific examples thereof include hydroxyalkyl (meth)acrylate, polyoxyalkylene glycol mono(meth)acrylate, and the like. The compound (y) is preferably a hydroxyalkyl (meth) acrylate having a hydroxyalkyl group having 2 to 10 carbon atoms, particularly preferably a hydroxyalkyl acrylate having a linear hydroxyalkyl group having a hydroxyl group at the terminal.

化合物(y)之具體例可列舉如下。 HOCH2 CH2 OC(=O)C(R)=CH2 、 HO(CH2 CH2 O)j -C(=O)C(R)C=CH2 、 CH3 CH(OH)CH2 OC(=O)C(R)C=CH2 、 HOCH2 CH=CH2 、 HO(CH2 )k CH=CH2 。 惟,R為氫原子或甲基,j為2~10之整數,k為2~20之整數。Specific examples of the compound (y) are as follows. HOCH 2 CH 2 OC (= O ) C (R) = CH 2, HO (CH 2 CH 2 O) j -C (= O) C (R) C = CH 2, CH 3 CH (OH) CH 2 OC (=O)C(R)C=CH 2 , HOCH 2 CH=CH 2 , HO(CH 2 ) k CH=CH 2 . However, R is a hydrogen atom or a methyl group, j is an integer of 2 to 10, and k is an integer of 2 to 20.

<聚異氰酸酯(z)> 聚異氰酸酯(z)係具有2個以上異氰酸酯基之化合物。 異氰酸酯基係用來與化合物(x)之羥基或化合物(y)之含活性氫基進行反應,以將聚異氰酸酯(z)之結構編入作為化合物(1)結構之一部分。 異氰酸酯基數以2~4為宜,3尤佳。<Polyisocyanate (z)> The polyisocyanate (z) is a compound having two or more isocyanate groups. The isocyanate group is used to react with the hydroxyl group of the compound (x) or the active hydrogen group of the compound (y) to incorporate the structure of the polyisocyanate (z) into a part of the structure of the compound (1). The number of isocyanate groups is preferably 2 to 4, and 3 is particularly preferred.

聚異氰酸酯(z)宜為脂肪族二異氰酸酯、脂環族二異氰酸酯、異氰酸酯基未直接鍵結於芳香環上之芳香族二異氰酸酯以及該等之改質體的三異氰酸酯或四異氰酸酯。改質體可列舉三聚異氰酸酯改質體、縮二脲改質體、三醇改質體、四醇改質體等。 二異氰酸酯可列舉六亞甲基二異氰酸酯、異佛酮二異氰酸酯、4,4’-二環己基甲烷二異氰酸酯、二異氰酸甲苯酯、4,4’-二苯甲烷二異氰酸酯、伸茬基二異氰酸酯等二異氰酸酯等。The polyisocyanate (z) is preferably an aliphatic diisocyanate, an alicyclic diisocyanate, an aromatic diisocyanate in which an isocyanate group is not directly bonded to an aromatic ring, and a modified triisocyanate or tetraisocyanate. Examples of the modified body include a trimerized isocyanate modified product, a biuret modified body, a triol modified form, and a tetraol modified form. Examples of the diisocyanate include hexamethylene diisocyanate, isophorone diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, and thiol group. Diisocyanate such as diisocyanate.

三異氰酸酯之具體例可列舉如下列。 下式(4-1)所示三聚異氰酸酯改質伸烷基二異氰酸酯(伸烷基二異氰酸酯之環狀3聚物)、 下式(4-2)所示三聚異氰酸酯改質二異氰酸甲苯酯(二異氰酸甲苯酯之環狀3聚物)、 下式(4-3)所示三聚異氰酸酯改質異佛酮二異氰酸酯(異佛酮二異氰酸酯之環狀3聚物)、 下式(4-4)所示縮二脲改質伸烷基二異氰酸酯、 下式(4-5)所示丙三醇改質伸烷基二異氰酸酯。 惟,s、t及u分別獨立為2~10之整數。Specific examples of the triisocyanate include the followings. The trimerized isocyanate modified alkyl diisocyanate (cyclic dimer of alkyl diisocyanate) represented by the following formula (4-1), and the trimer isocyanate modified diisocyanate represented by the following formula (4-2) Acid toluene ester (cyclic 3 polymer of toluene diisocyanate), trimer isocyanate modified isophorone diisocyanate represented by the following formula (4-3) (cyclic 3 polymer of isophorone diisocyanate) The biuret modified alkyl diisocyanate represented by the following formula (4-4), and the glycerol modified alkyl diisocyanate represented by the following formula (4-5). However, s, t, and u are each independently an integer from 2 to 10.

[化2] [Chemical 2]

(作用機制) 以上說明之本發明之含氟化合物因為具有(Cn F2n-i Hi O)b ,所以比起(Cm F2m O)a ,氫原子所致之極化較大。因此,與非氟系光聚合性化合物之相溶性良好。另,比起(Cm F2m O)a ,(Cn F2n-i Hi O)b 會更降低對象物的防污性。但本發明之含氟化合物於末端具有CF3 -,因此會使對象物(硬塗層等)表面的表面能量降低,其結果可賦予對象物優異的防污性。 又,本發明之含氟化合物更具有(Cm F2m O)a 時,可進一步賦予對象物優異的防污性。(Action mechanism) Since the fluorine-containing compound of the present invention described above has (C n F 2n-i H i O) b , the polarization due to the hydrogen atom is larger than (C m F 2m O) a . Therefore, compatibility with a non-fluorine-type photopolymerizable compound is favorable. Other than (C m F 2m O) a , (C n F 2n-i H i O) b would be more reduced antifouling properties of the object. However, since the fluorine-containing compound of the present invention has CF 3 - at the terminal, the surface energy of the surface of the object (hard coat layer or the like) is lowered, and as a result, excellent antifouling properties can be imparted to the object. Moreover, when the fluorine-containing compound of the present invention further has (C m F 2m O) a , the object can be further provided with excellent antifouling properties.

[光硬化性組成物] 本發明之光硬化性組成物含有本發明之含氟化合物(化合物(1))、光聚合性化合物(惟,本發明之含氟化合物除外)及光聚合引發劑(惟,不含液態介質)。本發明之光硬化性組成物可因應需求進一步含有光硬化性組成物用添加劑。[Photocurable composition] The photocurable composition of the present invention contains the fluorine-containing compound (compound (1)) of the present invention, a photopolymerizable compound (except for the fluorine-containing compound of the present invention), and a photopolymerization initiator ( However, it does not contain liquid media). The photocurable composition of the present invention may further contain an additive for a photocurable composition according to the demand.

(光聚合性化合物) 光聚合性化合物係在後述光聚合引發劑存在下藉由照射光而引發聚合反應且具有1個以上聚合性雙鍵之化合物。 光聚合性化合物可為非氟系光聚合性化合物亦可為含氟光聚合性化合物(惟,本發明之含氟化合物除外)。從原料入手性及經濟性優異的觀點來看,以非氟系光聚合性化合物為宜。(Photopolymerizable Compound) The photopolymerizable compound is a compound having one or more polymerizable double bonds by initiating a polymerization reaction by irradiation with light in the presence of a photopolymerization initiator to be described later. The photopolymerizable compound may be a non-fluorine-based photopolymerizable compound or a fluorine-containing photopolymerizable compound (except for the fluorine-containing compound of the present invention). From the viewpoint of excellent raw material properties and economical efficiency, a non-fluorine-based photopolymerizable compound is preferred.

光聚合性化合物可列舉多官能性化合物(具有2個以上聚合性雙鍵之化合物)或單官能性化合物(具有1個聚合性雙鍵之化合物)。 光聚合性化合物可列舉(甲基)丙烯酸之單酯或聚酯、具羥基之(甲基)丙烯酸酯與聚異氰酸酯之反應生成物、不具聚合性雙鍵之羥基化合物與具羥基之(甲基)丙烯酸酯及聚異氰酸酯之反應生成物等。具體上,可列舉多元醇與(甲基)丙烯酸之聚酯;多元醇、聚異氰酸酯與(甲基)丙烯酸羥烷基酯之反應生成物;及(甲基)丙烯酸羥烷基酯與聚異氰酸酯之反應生成物等多官能性化合物。 上述多元醇可列舉脂肪族多元醇、脂環族多元醇、參(2-羥乙基)三聚異氰酸酯等具有雜環之多元醇。上述聚異氰酸酯可舉如前述聚異氰酸酯(z)。 另,光聚合性化合物可具有如羥基等對於光聚合反應呈惰性的官能基。 從賦予對象物(硬塗層等)耐磨耗性的觀點來看,光硬化性組成物中所含光聚合性化合物宜至少一部分為多官能性化合物。多官能性化合物1分子中之聚合性雙鍵數宜為3~6個。 光聚合性化合物可單獨使用1種亦可將2種以上併用。The photopolymerizable compound may, for example, be a polyfunctional compound (a compound having two or more polymerizable double bonds) or a monofunctional compound (a compound having one polymerizable double bond). Examples of the photopolymerizable compound include a monoester or a polyester of (meth)acrylic acid, a reaction product of a hydroxyl group-containing (meth)acrylate and a polyisocyanate, a hydroxyl compound having no polymerizable double bond, and a hydroxyl group (methyl group). a reaction product of an acrylate and a polyisocyanate. Specifically, a polyester of a polyhydric alcohol and a (meth)acrylic acid; a reaction product of a polyhydric alcohol, a polyisocyanate and a hydroxyalkyl (meth)acrylate; and a hydroxyalkyl (meth)acrylate and a polyisocyanate are mentioned. A polyfunctional compound such as a reaction product. The polyhydric alcohol may, for example, be a polyhydric alcohol having a hetero ring such as an aliphatic polyhydric alcohol, an alicyclic polyhydric alcohol or a quinone (2-hydroxyethyl) trimeric isocyanate. The above polyisocyanate may, for example, be the above polyisocyanate (z). Further, the photopolymerizable compound may have a functional group which is inert to photopolymerization such as a hydroxyl group. From the viewpoint of the abrasion resistance of the object to be applied (such as a hard coat layer), it is preferred that at least a part of the photopolymerizable compound contained in the photocurable composition is a polyfunctional compound. The number of polymerizable double bonds in the molecule of the polyfunctional compound 1 is preferably from 3 to 6. One type of the photopolymerizable compound may be used alone or two or more types may be used in combination.

(光聚合引發劑) 光聚合引發劑可列舉公知的光聚合引發劑諸如芳基酮系光聚合引發劑(苯乙酮類、二苯基酮類、烷基胺二苯基酮類、苯甲基類、苯偶姻類、苯偶姻醚類、苯甲基二甲基縮酮類、苯甲醯苯甲酸酯類、α-醯基肟酯類等)、含硫系光聚合引發劑(硫化物類、9-氧硫 類等)、醯基膦氧化物類(醯基二芳基膦氧化物等)及其他的光聚合引發劑。 光聚合引發劑可單獨使用1種亦可將2種以上併用。 光聚合引發劑亦可與胺類等光敏劑併用。(Photopolymerization Initiator) The photopolymerization initiator may, for example, be a known photopolymerization initiator such as an arylketone photopolymerization initiator (acetophenone, diphenylketone, alkylamine diphenylketone, or benzophenone). Base, benzoin, benzoin ether, benzyl dimethyl ketal, benzamidine benzoate, α-mercapto oxime ester, etc.), sulfur-containing photopolymerization initiator ( Sulfide, 9-oxosulfur , etc.), mercaptophosphine oxides (fluorenyl diarylphosphine oxides, etc.) and other photopolymerization initiators. One type of the photopolymerization initiator may be used alone or two or more types may be used in combination. The photopolymerization initiator can also be used in combination with a photosensitizer such as an amine.

(光硬化性組成物用添加劑) 光硬化性組成物用添加劑可列舉膠質氧化矽、光敏劑、紫外線吸收劑、光穩定劑、熱硬化穩定劑、抗氧化劑、調平劑、消泡劑、增稠劑、抗沉降劑、顏料、染料、分散劑、抗靜電劑、界面活性劑(防霧劑、調平劑等)、金屬氧化物粒子、各種樹脂(環氧樹脂、不飽和聚酯樹脂、聚胺甲酸乙酯樹脂等)等。(Additive for photocurable composition) Examples of the additive for the photocurable composition include colloidal cerium oxide, a photosensitizer, an ultraviolet absorber, a light stabilizer, a thermosetting stabilizer, an antioxidant, a leveling agent, an antifoaming agent, and an increase. Thickener, anti-settling agent, pigment, dye, dispersant, antistatic agent, surfactant (anti-fogging agent, leveling agent, etc.), metal oxide particles, various resins (epoxy resin, unsaturated polyester resin, Polyurethane resin, etc.).

(光硬化性組成物之組成) 相對於光硬化性組成物,光硬化性組成物中本發明之含氟化合物含量在0.01~5質量%為宜,在0.02~4質量%較佳,在0.05~3質量%尤佳。本發明之含氟化合物含量只要在前述範圍內,光硬化性組成物之低溫儲存穩定性、對象物(硬塗層等)之外觀、耐磨耗性及防污性即佳。(Composition of Photocurable Composition) The content of the fluorine-containing compound of the present invention in the photocurable composition is preferably from 0.01 to 5% by mass, more preferably from 0.02 to 4% by mass, in the photocurable composition. ~3 mass% is especially good. The content of the fluorine-containing compound of the present invention is preferably within the above range, and the low-temperature storage stability of the photocurable composition, the appearance of the object (hard coat layer, etc.), abrasion resistance, and antifouling property are preferable.

相對於光硬化性組成物,光硬化性組成物中之光聚合性化合物含量在20~98.99質量%為宜,在50~98.99質量%較佳,在60~98.99質量%更佳,在80~98.99質量%尤佳。光聚合性化合物含量只要在前述範圍內,光硬化性組成物之低溫儲存穩定性、對象物之外觀、耐磨耗性及防污性即佳。The content of the photopolymerizable compound in the photocurable composition is preferably from 20 to 98.99% by mass, more preferably from 50 to 98.99% by mass, more preferably from 60 to 98.99% by mass, and more preferably from 80 to 98.9% by mass. 98.99% by mass is especially preferred. When the content of the photopolymerizable compound is within the above range, the low-temperature storage stability of the photocurable composition, the appearance of the object, the abrasion resistance, and the antifouling property are excellent.

相對於光硬化性組成物,光硬化性組成物中之光聚合引發劑含量在1~15質量%為宜,在3~15質量%較佳,在3~10質量%尤佳。光聚合引發劑含量只要在前述範圍內,則與光聚合性化合物之相溶性即佳。另,光硬化性組成物之硬化性良好,且所形成之硬化膜的硬度佳。The content of the photopolymerization initiator in the photocurable composition is preferably from 1 to 15% by mass, more preferably from 3 to 15% by mass, particularly preferably from 3 to 10% by mass, based on the photocurable composition. When the content of the photopolymerization initiator is within the above range, compatibility with the photopolymerizable compound is preferable. Further, the photocurable composition has good hardenability, and the cured film formed has good hardness.

含有光硬化性組成物用添加劑時,相對於光硬化性組成物,光硬化性組成物中之光硬化性組成物用添加劑含量在0.5~20質量%為宜,在1~15質量%較佳,在1~10質量%尤佳。When the additive for the photocurable composition is contained, the photocurable composition is preferably used in an amount of 0.5 to 20% by mass, more preferably 1 to 15% by mass, based on the photocurable composition. It is especially good at 1 to 10% by mass.

本發明之光硬化性組成物可含有製造本發明之含氟化合物時產生的副產物、未反應之原料(化合物(x)、化合物(y)、聚異氰酸酯(z)等)及製造本發明之含氟化合物時使用的製造用添加劑(聚合抑制劑等)等不純物。 不純物中,化合物(x)與其他成分之相溶性不夠充分,因此於組成物中殘留有化合物(x)時,組成物可能會白濁。所以,相對於本發明之含氟化合物,化合物(x)含量在10質量%以下為宜,在5質量%以下尤佳。 不純物中,聚異氰酸酯(z)與其他成分之反應性很高,因此組成物中殘留有聚異氰酸酯(z)時,可能會使組成物之儲存穩定性降低。所以,相對於本發明之含氟化合物,聚異氰酸酯(z)含量在4質量%以下為宜,在1質量%以下尤佳。 不純物之鑑定及定量可利用1 H-NMR及19 F-NMR或氣相層析術進行。The photocurable composition of the present invention may contain by-products, unreacted raw materials (compound (x), compound (y), polyisocyanate (z), etc.) which are produced when the fluorine-containing compound of the present invention is produced, and the production of the present invention. An impurity such as a production additive (polymerization inhibitor or the like) used in the case of a fluorine-containing compound. In the impurities, the compatibility of the compound (x) with other components is insufficient, and therefore, when the compound (x) remains in the composition, the composition may be cloudy. Therefore, the content of the compound (x) is preferably 10% by mass or less, and particularly preferably 5% by mass or less based on the fluorine-containing compound of the present invention. In the impurities, the polyisocyanate (z) has high reactivity with other components, and therefore, when the polyisocyanate (z) remains in the composition, the storage stability of the composition may be lowered. Therefore, the content of the polyisocyanate (z) is preferably 4% by mass or less based on the fluorine-containing compound of the present invention, and particularly preferably 1% by mass or less. Identification and quantification of impurities can be carried out by using 1 H-NMR and 19 F-NMR or gas chromatography.

[塗覆液] 本發明之塗覆液含有本發明之光硬化性組成物及液態介質。 本發明之塗覆液係為了使本發明之光硬化性組成物可輕易地塗佈於基材上而調製。[Coating Liquid] The coating liquid of the present invention contains the photocurable composition of the present invention and a liquid medium. The coating liquid of the present invention is prepared in order to allow the photocurable composition of the present invention to be easily applied onto a substrate.

(液態介質) 液態介質以有機溶劑為宜。有機溶劑以具有適合塗佈方法之沸點的有機溶劑為宜。 有機溶劑可為氟系有機溶劑亦可為非氟系有機溶劑,或可將兩溶劑併用。(Liquid medium) The liquid medium is preferably an organic solvent. The organic solvent is preferably an organic solvent having a boiling point suitable for the coating method. The organic solvent may be a fluorine-based organic solvent or a non-fluorine-based organic solvent, or may be used in combination.

液態介質以選自於由下列所構成群組中之至少1種有機溶劑為宜:氟烷、氟芳香族化合物、氟烷基醚、氟醇、僅由氫原子及碳原子構成之化合物以及僅由氫原子、碳原子及氧原子構成之化合物;且以選自氟烷、氟芳香族化合物、氟烷基醚及氟醇之氟系有機溶劑尤佳。 從提高含氟化合物之溶解性的觀點來看,液態介質宜含有合計佔液態介質整體90質量%以上之選自於由下列所構成群組中之至少1種有機溶劑:氟烷、氟芳香族化合物、氟烷基醚、氟醇以及僅由氫原子、碳原子及氧原子構成之化合物。 塗覆液中之液態介質含量在5~80質量%為宜,在10~70質量%較佳,在20~60質量%尤佳。The liquid medium is preferably at least one organic solvent selected from the group consisting of fluorocarbons, fluorine aromatic compounds, fluoroalkyl ethers, fluoroalcohols, compounds consisting only of hydrogen atoms and carbon atoms, and only A compound composed of a hydrogen atom, a carbon atom and an oxygen atom; and a fluorine-based organic solvent selected from the group consisting of a fluorocarbon, a fluorine aromatic compound, a fluoroalkyl ether and a fluoroalcohol is particularly preferable. From the viewpoint of improving the solubility of the fluorine-containing compound, the liquid medium preferably contains at least one organic solvent selected from the group consisting of fluorocarbons and fluorine aromatics in total of 90% by mass or more of the entire liquid medium. A compound, a fluoroalkyl ether, a fluoroalcohol, and a compound consisting only of a hydrogen atom, a carbon atom, and an oxygen atom. The content of the liquid medium in the coating liquid is preferably from 5 to 80% by mass, more preferably from 10 to 70% by mass, particularly preferably from 20 to 60% by mass.

[硬塗層形成用組成物] 本發明之硬塗層形成用組成物係由本發明之光硬化性組成物或本發明之塗覆液構成。 本發明之光硬化性組成物及塗覆液所形成之塗膜於硬化時無須加熱,因此要在由耐熱性比玻璃等更低之樹脂所構成的基材上形成硬塗層時就很適合使用本發明之光硬化性組成物及塗覆液。[Composition for forming a hard coat layer] The composition for forming a hard coat layer of the present invention is composed of the photocurable composition of the present invention or the coating liquid of the present invention. The coating film formed by the photocurable composition and the coating liquid of the present invention does not need to be heated during curing, and therefore is suitable for forming a hard coat layer on a substrate composed of a resin having lower heat resistance than glass or the like. The photocurable composition of the present invention and a coating liquid are used.

[物品] 本發明之物品具有基材以及硬塗層,且該硬塗層係由本發明之硬塗層形成用組成物形成。[Article] The article of the present invention has a substrate and a hard coat layer, and the hard coat layer is formed of the composition for forming a hard coat layer of the present invention.

(硬塗層) 硬塗層可直接形成在基材之至少1表面上,亦可隔著後述之底塗層形成在基材之至少1表面上。 從耐磨耗性及防污性的觀點來看,硬塗層之厚度宜為0.5~20μm,且以1~15μm尤佳。(Hard Coat Layer) The hard coat layer may be formed directly on at least one surface of the substrate, or may be formed on at least one surface of the substrate via an undercoat layer described later. From the viewpoint of abrasion resistance and antifouling property, the thickness of the hard coat layer is preferably from 0.5 to 20 μm, and particularly preferably from 1 to 15 μm.

(基材) 基材係講求耐磨耗性及防污性之各種物品(光學透鏡、顯示器、光記錄媒體等)的本體部分,或是構成該物品表面之構件。 基材表面之材料可列舉金屬、樹脂、玻璃、陶瓷、石及該等之複合材料等。光學透鏡、顯示器、光記錄媒體之基材表面的材料以玻璃或透明樹脂基材為宜。(Substrate) The substrate is a body portion of various articles (optical lenses, displays, optical recording media, etc.) that are resistant to abrasion and stain resistance, or members constituting the surface of the article. Examples of the material of the surface of the substrate include metal, resin, glass, ceramic, stone, and the like. The material of the surface of the substrate of the optical lens, the display, and the optical recording medium is preferably a glass or a transparent resin substrate.

(底塗層) 從提升基材與硬塗層之密著性觀點來看,本發明之物品可進一步在基材與硬塗層之間具有底塗層。 底塗層可列舉公知物。例如可將含有液態介質之底塗層形成用組成物塗佈於基材表面後再將液態介質蒸發除去來形成底塗層。(Undercoat layer) The article of the present invention may further have an undercoat layer between the substrate and the hard coat layer from the viewpoint of adhesion between the lifted substrate and the hard coat layer. The undercoat layer is exemplified by a known one. For example, an undercoat layer may be formed by applying a composition for forming an undercoat layer containing a liquid medium onto a surface of a substrate and then evaporating the liquid medium.

(物品之製造方法) 物品例如可經由下述步驟(I)及步驟(II)來製造。 步驟(I):係應需求將底塗層形成用組成物塗佈於基材表面而形成底塗層的步驟。 步驟(II):係將硬塗層形成用組成物塗佈於基材或底塗層之表面獲得塗膜後,在硬塗層形成用組成物含有液態介質時除去液態介質,再使其光硬化而形成硬塗層的步驟。 實施例(Method for Producing Article) The article can be produced, for example, by the following steps (I) and (II). Step (I): a step of applying an undercoat layer-forming composition to a surface of a substrate to form an undercoat layer as required. Step (II): applying a composition for forming a hard coat layer on the surface of a substrate or a primer layer to obtain a coating film, and then removing the liquid medium when the composition for forming a hard coating layer contains a liquid medium, and then removing the light medium The step of hardening to form a hard coat layer. Example

以下記述關於本發明之實施例及比較例。惟,本發明不僅侷限在實施例。 例1、2為實施例,例3~5為比較例。Hereinafter, examples and comparative examples of the present invention will be described. However, the invention is not limited only to the embodiments. Examples 1 and 2 are examples, and examples 3 to 5 are comparative examples.

[代號] AK-225:CF3 CF2 CHCl2 與CClF2 CF2 CHClF之混合物(旭硝子公司製、ASAHIKLIN(註冊商標)AK-225)、 TMS:四甲矽烷、 L:公升、 Mn:數量平均分子量。[Code] AK-225: Mixture of CF 3 CF 2 CHCl 2 and CClF 2 CF 2 CHClF (ASHTIKLIN (registered trademark) AK-225, manufactured by Asahi Glass Co., Ltd., TMS: tetramethyl decane, L: liter, Mn: number average Molecular weight.

[測定・評估] (化合物之Mn) 化合物之數量平均分子量乃利用核磁共振裝置(NMR)分別比較內部標準物質與化合物之末端官能基之積分比而求得。[Measurement/Evaluation] (Mn of Compound) The number average molecular weight of the compound was determined by comparing the integral ratio of the internal standard substance to the terminal functional group of the compound by a nuclear magnetic resonance apparatus (NMR).

(相溶性) 按照下述基準,以肉眼評估剛調製的硬塗層形成用組成物的外觀。 ○(良好):溶液均勻沒有混濁。 △(尚可):可觀察到些許的混濁。 ×(不佳):可以肉眼清楚觀察到混濁。(Compatibility) The appearance of the composition for forming a hard coat layer which was just prepared was visually evaluated in accordance with the following criteria. ○ (good): The solution was uniform and turbid. △ (acceptable): A slight turbidity can be observed. × (poor): turbidity can be clearly observed by the naked eye.

(室溫儲存穩定性) 將硬塗層形成用組成物在室溫下靜置3個月後,以肉眼評估硬塗層形成用組成物之外觀。 ○(良好):溶液均勻沒有混濁。 △(尚可):可觀察到些許的混濁。 ×(不佳):可以肉眼清楚觀察到混濁。(Standard Storage Stability at Room Temperature) After the composition for forming a hard coat layer was allowed to stand at room temperature for 3 months, the appearance of the composition for forming a hard coat layer was visually evaluated. ○ (good): The solution was uniform and turbid. △ (acceptable): A slight turbidity can be observed. × (poor): turbidity can be clearly observed by the naked eye.

(低溫儲存穩定性) 將硬塗層形成用組成物在-20℃之冷凍庫內靜置3個月後,以肉眼評估硬塗層形成用組成物之外觀。 ○(良好):溶液均勻沒有混濁。 △(尚可):可觀察到些許的混濁。 ×(不佳):可以肉眼清楚觀察到混濁。(Cryogenic Storage Stability) After the composition for forming a hard coat layer was allowed to stand in a freezer at -20 ° C for 3 months, the appearance of the composition for forming a hard coat layer was visually evaluated. ○ (good): The solution was uniform and turbid. △ (acceptable): A slight turbidity can be observed. × (poor): turbidity can be clearly observed by the naked eye.

(硬塗層外觀) 按照下述基準,以肉眼評估硬塗層的外觀。 ○(良好):無觀察到異物且膜厚均勻。 △(尚可):雖無觀察到異物但膜厚不均。 ×(不佳):有觀察到異物且膜厚不均。(Appearance of hard coat layer) The appearance of the hard coat layer was visually evaluated according to the following criteria. ○ (good): no foreign matter was observed and the film thickness was uniform. △ (fair): Although no foreign matter was observed, the film thickness was not uniform. × (poor): Foreign matter was observed and the film thickness was uneven.

(指紋污垢除去性) 使人工指紋液(油酸與鯊烯構成之液體)附著於矽橡膠塞之平坦面後,以不織布(旭化成公司製、BEMCOT(註冊商標)M-3)拭去多餘的油分,以準備指紋的印模。將該指紋印模載置於具有硬塗層之物品上,在荷重9.8N下按壓10秒鐘。針對附有指紋之處使用安裝有拭紙的往復式導線試驗機(KNT公司製),在荷重4.9N下進行擦拭。每一往復擦拭後以肉眼觀察霧度,並持續以肉眼觀察直到10往復後的霧度來進行評估。評估基準如下。 ○(良好):肉眼下未發現霧度。 △(尚可):肉眼下可發現些許霧度。 ×(不佳):肉眼下可明確觀察到霧度。(fingerprint dirt removal property) The artificial fingerprint liquid (liquid of oleic acid and squalene) is attached to the flat surface of the rubber stopper, and the excess is wiped off by a non-woven fabric (made by Asahi Kasei Co., Ltd., BEMCOT (registered trademark) M-3). Oil to prepare the impression of the fingerprint. The fingerprint was placed on an article with a hard coat and pressed at a load of 9.8 N for 10 seconds. A reciprocating wire tester (manufactured by KNT Co., Ltd.) equipped with a wiper was attached to the place where the fingerprint was attached, and the wipe was performed at a load of 4.9 N. The haze was observed with the naked eye after each reciprocating wiping, and the evaluation was continued by visual observation until the haze after 10 reciprocations. The evaluation criteria are as follows. ○ (good): No haze was observed under the naked eye. △ (can still): Some haze can be found under the naked eye. × (poor): The haze can be clearly observed under the naked eye.

(油性墨水撥去性) 以油性筆(Zebra公司製、Mckee極粗黑色)於硬塗層表面上畫線,並以肉眼觀察油性墨水的附著狀態來進行評估。評估基準如下。 ◎(優良):將油性墨水彈撥成圓珠狀。 ○(良好):未將油性墨水彈撥成圓珠狀而是彈撥成線狀,且線寬小於油性筆筆尖寬度之50%。 △(尚可):未將油性墨水彈撥成圓珠狀而是彈撥成線狀,且線寬為油性筆筆尖寬度之50%以上且小於100%。 ×(不良):無法將油性墨水彈撥成圓珠狀或線狀,可於表面上清楚繪出線條。(Oil-based ink detachability) An oil-based pen (manufactured by Zebra, Mckee, extremely thick black) was drawn on the surface of the hard coat layer, and the adhesion state of the oil-based ink was visually observed. The evaluation criteria are as follows. ◎ (Excellent): The oily ink is plucked into a bead shape. ○ (good): The oily ink is not plucked into a bead shape but plucked into a line shape, and the line width is less than 50% of the width of the oil pen tip. △ (fair): The oily ink is not plucked into a bead shape but plucked into a line shape, and the line width is 50% or more and less than 100% of the width of the oil pen tip. × (bad): The oily ink cannot be plucked into a bead or a line, and the line can be clearly drawn on the surface.

(耐磨耗性) 針對具有硬塗層之物品使用往復式導線試驗機(KNT公司製),在荷重9.8N下使鋼絲絨(NIHON STEEL WOOL Co., Ltd.製、Bonstar(註冊商標)#0000)往復100次後,根據JIS R3257:1999「基板玻璃表面之潤濕性試驗方法」,在液滴:約2μL/滴、溫度:20℃之條件下測定水接觸角及油酸接觸角。各接觸角係測定3處並取該等之平均值。評估基準如下。 ○(良好):水接觸角、油酸接觸角與下式求得之初始接觸角之差皆低於10%。 △(尚可):水接觸角、油酸接觸角之其中一者與下式求得之初始接觸角之差低於10%。 ×(不佳):水接觸角、油酸接觸角與下式求得之初始接觸角之差皆在10%以上。 與初始接觸角之差(%)=(初始接觸角-耐磨耗性試驗後接觸角)/初始接觸角×100(Abrasion resistance) A reciprocating wire tester (manufactured by KNT Co., Ltd.) was used for articles having a hard coat layer, and steel wool was produced under a load of 9.8 N (manufactured by NIHON STEEL WOOL Co., Ltd., Bonstar (registered trademark)# 0000) After 100 times of reciprocation, the water contact angle and the oleic acid contact angle were measured in accordance with JIS R3257:1999 "Test method for wettability of substrate glass surface" under the conditions of droplets: about 2 μL/drop and temperature: 20 °C. Each contact angle was measured at 3 places and the average of these was taken. The evaluation criteria are as follows. ○ (good): The difference between the water contact angle, the oleic acid contact angle and the initial contact angle obtained by the following formula is less than 10%. △ (acceptable): The difference between the water contact angle and the oleic acid contact angle and the initial contact angle obtained by the following formula is less than 10%. × (poor): The difference between the water contact angle, the oleic acid contact angle and the initial contact angle obtained by the following formula is 10% or more. Difference from initial contact angle (%) = (initial contact angle - contact angle after abrasion resistance test) / initial contact angle × 100

(鉛筆硬度) 按照JIS K5600-5-4:1999(ISO 15184:1996)「刻痕硬度(鉛筆法)」測定硬塗層表面之鉛筆硬度。(Pencil Hardness) The pencil hardness of the surface of the hard coat layer was measured in accordance with JIS K5600-5-4:1999 (ISO 15184:1996) "Scoring Hardness (Pencil Method)".

[例1] (例1-1) 於500mL之3口燒瓶添加硼氫化鈉16.5g及AK-225 200g,並在冰浴中予以攪拌。再將化合物(22)200g及甲醇27.2g之混合物以內溫不超過15℃的方式緩慢地滴入其中。全數滴下後維持在浸漬於冰浴中的狀態攪拌2小時。再投入2N之HCl 250mL,使反應結束。以水及飽和食鹽水將反應液洗淨3次。使其在硫酸鈉上乾燥後,利用過濾濾去固體,再以減壓蒸餾除去溶劑而獲得無色透明液體之化合物(21)。以氣相層析儀分析生成物的結果得到生成出純度98.7%之化合物(21),且未檢測出未反應之化合物(22)。 CF2 =CF-O-CF2 CF2 CF2 C(=O)OCH3 ・・・(22) CF2 =CF-O-CF2 CF2 CF2 CH2 -OH・・・(21)[Example 1] (Example 1-1) 16.5 g of sodium borohydride and 200 g of AK-225 were placed in a 500-mL three-necked flask, and stirred in an ice bath. Further, a mixture of 200 g of the compound (22) and 27.2 g of methanol was slowly dropped thereinto at an internal temperature of not more than 15 °C. After all the dropwise additions, the mixture was stirred for 2 hours while being immersed in an ice bath. Further, 2N HCl 250 mL was added to complete the reaction. The reaction solution was washed three times with water and saturated brine. After drying over sodium sulfate, the solid was filtered off by filtration, and the solvent was evaporated under reduced pressure to give Compound (21) as a colorless transparent liquid. The product was analyzed by a gas chromatograph to obtain a compound (21) having a purity of 98.7%, and no unreacted compound (22) was detected. CF 2 =CF-O-CF 2 CF 2 CF 2 C(=O)OCH 3・・・(22) CF 2 =CF-O-CF 2 CF 2 CF 2 CH 2 -OH・・・(21)

(例1-2) 按照國際公開第2009/008380號中記載之方法獲得化合物(20-1)。 CF3 -O-{(CF2 CF2 O)a }-CF2 CH2 -OH・・・(20-1) a之平均值:6、 數量平均分子量:730。(Example 1-2) The compound (20-1) was obtained by the method described in International Publication No. 2009/008380. CF 3 -O-{(CF 2 CF 2 O) a }-CF 2 CH 2 -OH (20-1) Average value of a: 6. Number average molecular weight: 730.

(例1-3) 於連接有回流冷卻器之100mL茄形燒瓶內放入例1-1中所得化合物(21)22g及例1-2中所得化合物(20-1)10g並添加碳酸鉀粉末1.47g。在氮氣環境下,於60℃下攪拌8小時後再添加碳酸鉀粉末1.74g,於80℃下攪拌2小時,然後再於室溫下攪拌24小時。添加鹽酸水溶液處理掉過剩的碳酸鉀後,添加水及AK-225進行分液處理。水洗3次後回收有機相,再以蒸發器進行濃縮而獲得高黏度之生成物32.65g。再以AK-225 30g稀釋後展開於矽膠管柱層析儀(展開溶劑:AK-225)進行分取。針對各餾份從19 F-NMR之積分值求出下式(x11-1)中之b1平均值。獲得合併b1平均值為7~15之餾份後的化合物(x11-1)6.06g。 CF3 -O-{(CF2 CF2 O)a }-{CF2 CH2 O-(CF2 CFHO-CF2 CF2 CF2 CH2 O)b1 }-H・・・(x11-1)(Example 1-3) 22 g of the compound (21) obtained in Example 1-1 and 10 g of the compound (20-1) obtained in Example 1-2 were placed in a 100 mL eggplant-shaped flask to which a reflux condenser was attached, and potassium carbonate powder was added thereto. 1.47g. After stirring at 60 ° C for 8 hours under a nitrogen atmosphere, 1.74 g of potassium carbonate powder was further added, and the mixture was stirred at 80 ° C for 2 hours, and then at room temperature for 24 hours. After adding an aqueous solution of hydrochloric acid to remove excess potassium carbonate, water and AK-225 were added to carry out liquid separation treatment. After washing three times, the organic phase was recovered, and concentrated by an evaporator to obtain a high-viscosity product of 32.65 g. After further dilution with AK-225 30 g, it was developed by tapidine column chromatography (developing solvent: AK-225) for fractionation. The average value of b1 in the following formula (x11-1) was determined from the integral value of 19 F-NMR for each fraction. The compound (x11-1) 6.06 g obtained by combining the fractions having an average b1 of 7 to 15 was obtained. CF 3 -O-{(CF 2 CF 2 O) a }-{CF 2 CH 2 O-(CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) b1 }-H・・・(x11-1)

化合物(x11-1)之NMR質譜;1 H-NMR(300.4MHz、溶劑:氘代丙酮、基準:TMS) δ(ppm):4.1(2H)、4.8(22H)、6.7~6.9(11H)。19 F-NMR(282.7MHz、溶劑:氘代丙酮、基準:CFCl3 ) δ(ppm):-55.3(3F)、-77.6(2F)、-83.7~-85.1(22F)、-88.5(24F)、-89.3~-90.4(22F)、-120.2(20F)、-122.0(2F)、-126.6(22F)、-145.1(11F)。 a之平均值:6、b1之平均值:11、數量平均分子量:4,080。NMR mass spectrum of the compound (x11-1); 1 H-NMR (300.4 MHz, solvent: deuterated acetone, standard: TMS) δ (ppm): 4.1 (2H), 4.8 (22H), 6.7 to 6.9 (11H). 19 F-NMR (282.7 MHz, solvent: deuterated acetone, standard: CFCl 3 ) δ (ppm): -55.3 (3F), -77.6 (2F), -83.7 to -85.1 (22F), -88.5 (24F) , -89.3~-90.4 (22F), -120.2 (20F), -122.0 (2F), -126.6 (22F), -145.1 (11F). Average of a: 6, average of b1: 11, number average molecular weight: 4,080.

(例1-4) 在安裝有滴下漏斗、冷凝器、溫度計、攪拌裝置之100mL之2口燒瓶中使366mg之聚異氰酸酯(z-1)(Sumika Bayer Urethane Co., Ltd.製、Sumidur N3300、異氰酸酯基含有率:21.8%、式(4-1)所示三聚異氰酸酯改質六亞甲基二異氰酸酯)溶解於5.9g之氟系有機溶劑(日本ZEON公司製、ZEORORA(註冊商標)H、1,1,2,2,3,3,4-七氟環戊烷)中,並添加二月桂酸二丁錫(東京化成公司製)1.5mg,在氮氣環境下於40℃下進行攪拌,同時以1小時的時間滴下化合物(x11-1)911mg後攪拌1小時。以30分鐘的時間滴下194mg之化合物(y-1)(共榮社化學公司製、LIGHT ESTER HOA、丙烯酸2-羥乙酯)後攪拌4小時。利用紅外吸收光譜確認異氰酸酯基之吸收已完全消失。添加二丁基羥甲苯0.2mg而獲得反應生成物。(Example 1-4) 366 mg of polyisocyanate (z-1) (Sumika Bayer Urethane Co., Ltd., Sumidur N3300, manufactured by Sumika Bayer Urethane Co., Ltd., was placed in a 100 mL 2-necked flask equipped with a dropping funnel, a condenser, a thermometer, and a stirring device. The isocyanate group content: 21.8%, and the trimer isocyanate-modified hexamethylene diisocyanate represented by the formula (4-1) is dissolved in 5.9 g of a fluorine-based organic solvent (ZEORORA (registered trademark) H, manufactured by Japan ZEON Co., Ltd. 1.5 mg of dibutyltin dilaurate (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to 1,1,2,2,3,3,4-heptafluorocyclopentane, and the mixture was stirred at 40 ° C under a nitrogen atmosphere. At the same time, 911 mg of the compound (x11-1) was added dropwise over 1 hour, followed by stirring for 1 hour. 194 mg of the compound (y-1) (manufactured by Kyoeisha Chemical Co., Ltd., LIGHT ESTER HOA, 2-hydroxyethyl acrylate) was added dropwise over a period of 30 minutes, followed by stirring for 4 hours. The absorption of the isocyanate group was completely disappeared by infrared absorption spectroscopy. 0.2 mg of dibutylhydroxytoluene was added to obtain a reaction product.

(例1-5) 於10mL試管放入前述反應生成物50mg、光聚合性化合物(共榮社化學公司製、LIGHT ACRYLATE PE-4A、新戊四醇四丙烯酸酯)200mg、非氟系有機溶劑(丙二醇單甲基醚)200mg、光聚合引發劑(2-甲基-1-{4-(甲硫基)苯基}-2-啉基丙-1-酮)0.1mg後,在室溫且遮光之狀態下攪拌1小時而獲得硬塗層形成用組成物。(Example 1-5) Into a 10 mL test tube, 50 mg of the reaction product, a photopolymerizable compound (manufactured by Kyoeisha Chemical Co., Ltd., LIGHT ACRYLATE PE-4A, pentaerythritol tetraacrylate), 200 mg, and a non-fluorine-based organic solvent were placed. (propylene glycol monomethyl ether) 200 mg, photopolymerization initiator (2-methyl-1-{4-(methylthio)phenyl}-2- After 0.1 mg of the morphyl propan-1-one), the mixture was stirred at room temperature for 1 hour while being light-shielded to obtain a composition for forming a hard coat layer.

(例1-6) 於聚對苯二甲酸乙二酯基材表面利用棒塗法塗佈硬塗層形成用組成物,形成塗膜,再以50℃之加熱板使其乾燥1分鐘而於基材表面形成乾燥膜。使用高壓水銀燈照射紫外線(光量:300mJ/cm2 、波長365nm之紫外線累積能量)而於基材表面形成一厚5μm之硬塗層。 硬塗層形成用組成物及硬塗層之評估結果顯示於表2。(Example 1-6) A composition for forming a hard coat layer was applied onto a surface of a polyethylene terephthalate substrate by a bar coating method to form a coating film, which was then dried by a hot plate at 50 ° C for 1 minute. A dry film is formed on the surface of the substrate. A high-pressure mercury lamp was used to irradiate ultraviolet rays (light quantity: 300 mJ/cm 2 , ultraviolet light accumulation energy of 365 nm) to form a hard coat layer having a thickness of 5 μm on the surface of the substrate. The evaluation results of the composition for forming a hard coat layer and the hard coat layer are shown in Table 2.

[例2] (例2-1) 於連接有回流冷卻器之100mL茄形燒瓶內放入0.36g之化合物(28-1)(東京化成工業公司製,1H,1H,2H,2H-全氟-1-辛醇)並添加碳酸鉀粉末0.14g。在氮氣環境下於室溫下攪拌30分鐘後,冷卻至0℃,添加1.3g之化合物(23)(大金工業公司製。2,2,3,3-四氟氧雜環丁烷),再於0℃下攪拌24小時。利用19 F-NMR確認化合物(23)完全被消耗後,添加甲醇2mL,在室溫下攪拌1小時。添加水20mL進行分液處理而獲得化合物(33-1)1.6g。 CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 -OH・・・(28-1)。 CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 -O-(CH2 CF2 CF2 O)b3 -CH2 CF2 C(=O)OCH3 ・・・(33-1)[Example 2] (Example 2-1) 0.36 g of a compound (28-1) was placed in a 100 mL eggplant-shaped flask to which a reflux condenser was connected (manufactured by Tokyo Chemical Industry Co., Ltd., 1H, 1H, 2H, 2H-perfluoro -1-octanol) and added 0.14 g of potassium carbonate powder. After stirring at room temperature for 30 minutes under a nitrogen atmosphere, the mixture was cooled to 0 ° C, and 1.3 g of a compound (23) (2,2,3,3-tetrafluorooxetane) was added. It was further stirred at 0 ° C for 24 hours. After confirming that the compound (23) was completely consumed by 19 F-NMR, 2 mL of methanol was added, and the mixture was stirred at room temperature for 1 hour. 20 mL of water was added to carry out liquid separation treatment to obtain 1.6 g of the compound (33-1). CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 -OH・(28-1). CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 -O-(CH 2 CF 2 CF 2 O) b3 -CH 2 CF 2 C(=O)OCH 3・・・(33-1)

化合物(33-1)之NMR質譜;1 H-NMR(300.4MHz、溶劑:氘代丙酮、基準:TMS) δ(ppm):1.7(2H)、3.3~3.9(23H)、4.1(2H)。19 F-NMR(282.7MHz、溶劑:氘代丙酮、基準:CFCl3 ) δ(ppm):-80(2F)、-83~-85(18F)、-86(3F)、-118(2F)、-126~-132(26F)。 b3之平均值:9、數量平均分子量:1,660。NMR mass spectrum of the compound (33-1); 1 H-NMR (300.4 MHz, solvent: deuterated acetone, standard: TMS) δ (ppm): 1.7 (2H), 3.3 to 3.9 (23H), 4.1 (2H). 19 F-NMR (282.7 MHz, solvent: deuterated acetone, standard: CFCl 3 ) δ (ppm): -80 (2F), -83 to -85 (18F), -86 (3F), -118 (2F) , -126~-132(26F). Average of b3: 9, number average molecular weight: 1,660.

(例2-2) 於100mL茄形燒瓶內投入化合物(33-1)1.6g,並加入硼氫化鈉80mg後在氮氣環境下於室溫下攪拌24小時。添加10%鹽酸直至溶液變成酸性。以AK-225 100mL稀釋後,以水20mL洗淨2次。回收有機相並以蒸發器濃縮,進行真空乾燥而獲得化合物(x42-1)1.6g。 CF3 CF2 CF2 CF2 CF2 CF2 CH2 CH2 -O-{(CH2 CF2 CF2 O)b3 -CH2 CF2 CH2 O}-H・・・(x42-1)(Example 2-2) 1.6 g of the compound (33-1) was placed in a 100 mL eggplant-shaped flask, and 80 mg of sodium borohydride was added thereto, followed by stirring at room temperature for 24 hours under a nitrogen atmosphere. 10% hydrochloric acid was added until the solution became acidic. After diluting with AK-225 100 mL, it was washed twice with 20 mL of water. The organic phase was recovered, concentrated with an evaporator, and dried in vacuo to give compound (x 42-1) 1.6 g. CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 CH 2 CH 2 -O-{(CH 2 CF 2 CF 2 O) b3 -CH 2 CF 2 CH 2 O}-H・・・(x42-1)

化合物(x42-1)之NMR質譜;1 H-NMR(300.4MHz、溶劑:氘代丙酮、基準:TMS) δ(ppm):1.7(2H)、3.3~3.9(24H)。19 F-NMR(282.7MHz、溶劑:氘代丙酮、基準:CFCl3 ) δ(ppm):-81(2F)、-83~-85(18F)、-86(3F)、-118(2F)、-126~-132(26F)。 b3之平均值:9、數量平均分子量:1,660。NMR mass spectrum of the compound (x42-1); 1 H-NMR (300.4 MHz, solvent: deuterated acetone, standard: TMS) δ (ppm): 1.7 (2H), 3.3 to 3.9 (24H). 19 F-NMR (282.7 MHz, solvent: deuterated acetone, standard: CFCl 3 ) δ (ppm): -81 (2F), -83 to -85 (18F), -86 (3F), -118 (2F) , -126~-132(26F). Average of b3: 9, number average molecular weight: 1,660.

(例2-3) 除了如表1所示變更原料之種類及份量以外,以與例1同樣的方式獲得含有含氟化合物之組成物後,製得硬塗層形成用組成物及硬塗層。硬塗層形成用組成物及硬塗層之評估結果顯示於表2。(Example 2-3) A composition containing a fluorine-containing compound was obtained in the same manner as in Example 1 except that the type and the amount of the raw material were changed as shown in Table 1, and a composition for forming a hard coat layer and a hard coat layer were obtained. . The evaluation results of the composition for forming a hard coat layer and the hard coat layer are shown in Table 2.

[例3] 除了如表1所示變更原料之種類及份量以外,以與例1同樣的方式獲得反應生成物後,製得硬塗層形成用組成物及硬塗層。硬塗層形成用組成物及硬塗層之評估結果顯示於表2。[Example 3] A reaction product was obtained in the same manner as in Example 1 except that the type and amount of the raw material were changed as shown in Table 1, and a composition for forming a hard coat layer and a hard coat layer were obtained. The evaluation results of the composition for forming a hard coat layer and the hard coat layer are shown in Table 2.

[例4] 按照專利文獻3之實施例2中記載之方法獲得化合物(35)。 F(CH2 CF2 CF2 O)b2 CH2 CF2 CH2 OH・・・(35) b2之平均值:6、數量平均分子量:894。[Example 4] The compound (35) was obtained by the method described in Example 2 of Patent Document 3. F(CH 2 CF 2 CF 2 O) b2 CH 2 CF 2 CH 2 OH (35) Average value of b2: 6. Number average molecular weight: 894.

除了如表1所示變更原料之種類及份量以外,以與例1同樣的方式獲得反應生成物後,製得硬塗層形成用組成物及硬塗層。硬塗層形成用組成物及硬塗層之評估結果顯示於表2。The reaction product was obtained in the same manner as in Example 1 except that the type and amount of the raw material were changed as shown in Table 1, and then a composition for forming a hard coat layer and a hard coat layer were obtained. The evaluation results of the composition for forming a hard coat layer and the hard coat layer are shown in Table 2.

[例5] 按照專利文獻2之實施例1-1中記載之方法獲得化合物(27-1)。 CF3 CF2 CF2 -O-{CFHCF2 O-CH2 CF2 O}-{(CF2 O)a1 (CF2 CF2 O)a2 }-CF2 CH2 -OH・・・(27-1)。 a1之平均值:8、a2之平均值:10、數量平均分子量:2,070。[Example 5] The compound (27-1) was obtained by the method described in Example 1-1 of Patent Document 2. CF 3 CF 2 CF 2 -O-{CFHCF 2 O-CH 2 CF 2 O}-{(CF 2 O) a1 (CF 2 CF 2 O) a2 }-CF 2 CH 2 -OH・(・(27- 1). Average of a1: 8, average of a2: 10, number average molecular weight: 2,070.

除了如表1所示變更原料之種類及份量以外,以與例1同樣的方式獲得反應生成物後,製得硬塗層形成用組成物及硬塗層。硬塗層形成用組成物及硬塗層之評估結果顯示於表2。The reaction product was obtained in the same manner as in Example 1 except that the type and amount of the raw material were changed as shown in Table 1, and then a composition for forming a hard coat layer and a hard coat layer were obtained. The evaluation results of the composition for forming a hard coat layer and the hard coat layer are shown in Table 2.

[表1] [Table 1]

[表2] [Table 2]

例1、2之含氟化合物具有(Cn F2n-i Hi O)b 且末端具有CF3 -,因此硬塗層形成用組成物之低溫儲存穩定性佳,且硬塗層之防污性及外觀優異。又,例1之含氟化合物更具有(Cm F2m O)a ,因此硬塗層之防污性(油性墨水撥去性)特別優異。 例3之含氟化合物不具(Cn F2n-i Hi O)b ,因此與非氟系光聚合性化合物之相溶性不夠充分,且硬塗層形成用組成物之室溫及低溫儲存穩定性不足,硬塗層之外觀也不夠充分。 例(4)之含氟化合物的末端不具CF3 -,所以硬塗層之防污性不夠充分。 例5之含氟化合物雖然具有(Cn F2n-i Hi O)b 但其數量不足,因此硬塗層形成用組成物之低溫儲存穩定性不足。 產業上之可利用性The fluorine-containing compound of Examples 1 and 2 has (C n F 2n-i H i O) b and has CF 3 - at the end, so that the composition for forming a hard coat layer has good low-temperature storage stability, and the anti-fouling of the hard coat layer Excellent in appearance and appearance. Further, since the fluorine-containing compound of Example 1 has (C m F 2m O) a , the antifouling property (oily ink detachability) of the hard coat layer is particularly excellent. Since the fluorine-containing compound of Example 3 does not have (C n F 2n-i H i O) b , the compatibility with the non-fluorine-based photopolymerizable compound is insufficient, and the composition for forming a hard coat layer is stable at room temperature and low temperature. Insufficient sex, the appearance of the hard coat is not sufficient. The end of the fluorine-containing compound of the example (4) does not have CF 3 -, so the antifouling property of the hard coat layer is insufficient. Although the fluorine-containing compound of Example 5 has (C n F 2n-i H i O) b, the amount thereof is insufficient, so that the composition for forming a hard coat layer has insufficient low-temperature storage stability. Industrial availability

本發明之含氟化合物很適合用在賦予對象物(硬塗層等)優異的防污性。含有本發明之含氟化合物的光硬化性組成物或塗覆液可賦予觸控面板之輸入面等優異的防污性。又,像是混合於樹脂材料中以賦予成形品防污性的用途以及模具等之脫模劑、軸承等之防止漏油、加工電子零件等時防止加工溶液的附著或加工品之防濕等亦可使用。 又,在此係引申已於2015年7月23日提申之日本專利申請案2015-145875號之說明書、申請專利範圍及摘要之全部內容並納入作為本發明說明書之揭示。The fluorine-containing compound of the present invention is suitably used for imparting excellent antifouling properties to an object to be applied (such as a hard coat layer). The photocurable composition or coating liquid containing the fluorine-containing compound of the present invention can impart excellent antifouling properties to the input surface of the touch panel or the like. In addition, it is used for mixing with a resin material to impart antifouling properties to a molded article, a mold release agent such as a mold, a bearing or the like, oil leakage prevention, processing of electronic parts, etc., prevention of adhesion of a processing solution, moisture prevention of a processed product, and the like. Can also be used. The entire disclosure of Japanese Patent Application No. 2015-145875, the entire disclosure of which is incorporated herein in

(無)(no)

Claims (13)

一種含氟化合物,係下式(1)所示化合物; [D-O-{(Cm F2m O)a (Cn F2n-i Hi O)b }-]d A・・・(1) 惟,D為(Rf1 )e -R1 -或Rf2 -; Rf1 為碳數1~6之全氟烷基; e為1~3之整數; R1 為碳數1~6之(e+1)價烴基; Rf2 為碳數1~6之全氟烷基; m為1~6之整數; a為0~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成; n為1~6之整數; i為1~2n-1之整數; b為6~200之整數,且(Cn F2n-i Hi O)b 可由n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O構成; d為1以上之整數; A為具有1個以上聚合性碳-碳雙鍵之d價有機基; a個Cm F2m O及b個Cn F2n-i Hi O之鍵結順序不受限。A fluorine-containing compound which is a compound represented by the following formula (1); [DO-{(C m F 2m O) a (C n F 2n-i H i O) b }-] d A・・・(1) However, D is (R f1 ) e -R 1 - or R f2 -; R f1 is a perfluoroalkyl group having 1 to 6 carbon atoms; e is an integer of 1 to 3; and R 1 is a carbon number of 1 to 6 ( e+1) valence hydrocarbon group; R f2 is a perfluoroalkyl group having 1 to 6 carbon atoms; m is an integer of 1 to 6; a is an integer of 0 to 200, and when a is 2 or more, (C m F 2m O a can be composed of two or more different types of C m F 2m O; n is an integer from 1 to 6; i is an integer from 1 to 2n-1; b is an integer from 6 to 200, and (C n F 2n- i H i O) b may be composed of two or more C n F 2n-i H i O which are different from one or both of n and i; d is an integer of 1 or more; A is one or more polymerizable carbons - a d-valent organic group of a carbon double bond; the bonding order of a C m F 2m O and b C n F 2n-i H i O is not limited. 如請求項1之含氟化合物, 其中前述式(1)所示化合物為下式(11)所示化合物; [D-O-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b }-]d A・・・(11) 惟,D、m、n、i、b、d及A與前述式(1)之D、m、n、i、b、d及A相同; a為1~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成; a為2以上時,{(Cm F2m O)a }為a個Cm F2m O所構成之嵌段; {(Cn F2n-i Hi O)b }為b個Cn F2n-i Hi O所構成之嵌段。The fluorine-containing compound of claim 1, wherein the compound represented by the above formula (1) is a compound represented by the following formula (11); [DO-{(C m F 2m O) a }-{(C n F 2n-i H i O) b }-] d A・・・(11) However, D, m, n, i, b, d, and A are D, m, n, i, b, and d of the above formula (1). A is the same; a is an integer from 1 to 200, and when a is 2 or more, (C m F 2m O) a can be composed of two or more different kinds of C m F 2m O; when a is 2 or more, {(C) m F 2m O) a } is a block composed of a C m F 2m O; {(C n F 2n-i H i O) b } is composed of b C n F 2n-i H i O Block. 如請求項2之含氟化合物,其中前述式(1)所示化合物為下式(111)所示化合物; [D-O-{(CF2 CF2 O)a }-{CF2 CH2 O-(CF2 CFHO-CF2 CF2 CF2 CH2 O)b/2-1 }-]d A・・・(111) 惟,D、d及A與前述式(1)之D、d及A相同,b為前述式(1)之b中的偶數。The fluorine-containing compound of claim 2, wherein the compound represented by the above formula (1) is a compound represented by the following formula (111); [DO-{(CF 2 CF 2 O) a }-{CF 2 CH 2 O-( CF 2 CFHO-CF 2 CF 2 CF 2 CH 2 O) b/2-1 }-] d A・・・(111) However, D, d and A are the same as D, d and A of the above formula (1) , b is an even number in b of the above formula (1). 如請求項1之含氟化合物,其中前述式(1)所示化合物為下式(12)所示化合物; [D-O-{( Cn F2n-i Hi O)c }-{(Cm F2m O)a }-{(Cn F2n-i Hi O)b-c }-]d A・・・(12) 惟,D、m、n、i、b、d及A與前述式(1)之D、m、n、i、b、d及A相同; a為1~200之整數,且a為2以上時,(Cm F2m O)a 可由m互異之2種以上Cm F2m O構成; c為2或3,(Cn F2n-i Hi O)c 可由n及i之其中一者或兩者互異之2種以上Cn F2n-i Hi O構成; {(Cn F2n-i Hi O)c }為c個Cn F2n-i Hi O所構成之嵌段; a為2以上時,{(Cm F2m O)a }為a個Cm F2m O所構成之嵌段; {(Cn F2n-i Hi O)b-c }為b-c個Cn F2n-i Hi O所構成之嵌段。The fluorine-containing compound of claim 1, wherein the compound represented by the above formula (1) is a compound represented by the following formula (12); [DO-{( C n F 2n-i H i O) c }-{(C m F 2m O) a }-{(C n F 2n-i H i O) bc }-] d A・・・(12) However, D, m, n, i, b, d, and A are as described above ( 1) D, m, n, i, b, d, and A are the same; a is an integer from 1 to 200, and when a is 2 or more, (C m F 2m O) a can be two or more different from each other. m F 2m O; c is 2 or 3, (C n F 2n-i H i O) c may be two or more of n and i different from each other, C n F 2n-i H i O Composition; {(C n F 2n-i H i O) c } is a block composed of c C n F 2n-i H i O; when a is 2 or more, {(C m F 2m O) a } a block composed of a C m F 2m O; {(C n F 2n-i H i O) bc } is a block composed of bc C n F 2n-i H i O . 如請求項1之含氟化合物, 其中前述式(1)所示化合物為下式(112)所示化合物; [D-O-(CH2 CF2 CF2 O)b-1 -CH2 CF2 CH2 O-]d A・・・(112) 惟,b、d及A與前述式(1)之b、d及A相同且D為(Rf1 )e -R1 -。The fluorine-containing compound of claim 1, wherein the compound represented by the above formula (1) is a compound represented by the following formula (112); [DO-(CH 2 CF 2 CF 2 O) b-1 -CH 2 CF 2 CH 2 O-] d A (112) However, b, d, and A are the same as b, d, and A of the above formula (1), and D is (R f1 ) e - R 1 -. 如請求項1至4中任一項之含氟化合物,其中以a/b表示之前述a與前述b之比值為20/1~1/20。The fluorine-containing compound according to any one of claims 1 to 4, wherein a ratio of the aforementioned a to the above b represented by a/b is from 20/1 to 1/20. 如請求項1至6中任一項之含氟化合物,其中前述A為具有1個以上(甲基)丙烯醯氧基之d價有機基。The fluorine-containing compound according to any one of claims 1 to 6, wherein the A is a d-valent organic group having one or more (meth) propylene fluorenyloxy groups. 如請求項1至7中任一項之含氟化合物,該含氟化合物係下列三者之反應生成物且不具未反應之異氰酸酯基:以D-O-{(Cm F2m O)a (Cn F2n-i Hi O)b }-H表示之羥基化合物、具有1個以上(甲基)丙烯醯氧基之羥基化合物及具有2個以上異氰酸酯基之聚異氰酸酯。The fluorine-containing compound according to any one of claims 1 to 7, which is a reaction product of the following three and has no unreacted isocyanate group: DO-{(C m F 2m O) a (C n F 2n-i H i O) hydroxy compound represented by b }-H, a hydroxy compound having one or more (meth) acryloxy groups, and a polyisocyanate having two or more isocyanate groups. 如請求項1至8中任一項之含氟化合物,其數量平均分子量為1,200~8,000。The fluorine-containing compound according to any one of claims 1 to 8, which has a number average molecular weight of 1,200 to 8,000. 一種光硬化性組成物,其特徵在於含有如請求項1至9中任一項之含氟化合物、光聚合性化合物(惟,前述含氟化合物除外)及光聚合引發劑(惟,不含液態介質)。A photocurable composition comprising the fluorine-containing compound according to any one of claims 1 to 9, a photopolymerizable compound (except for the fluorine-containing compound), and a photopolymerization initiator (only, no liquid) medium). 一種塗覆液,其特徵在於含有如請求項10之光硬化性組成物及液態介質。A coating liquid comprising the photocurable composition of claim 10 and a liquid medium. 一種硬塗層形成用組成物,係由如請求項10之光硬化性組成物或如請求項11之塗覆液構成。A composition for forming a hard coat layer, which is composed of the photocurable composition of claim 10 or the coating liquid of claim 11. 一種物品,其特徵在於具有基材及硬塗層,該硬塗層係由如請求項10之光硬化性組成物或如請求項11之塗覆液形成。An article characterized by having a substrate and a hard coat layer formed of the photocurable composition of claim 10 or the coating liquid of claim 11.
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