TW201634859A - Light irradiation apparatus - Google Patents
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- TW201634859A TW201634859A TW105100268A TW105100268A TW201634859A TW 201634859 A TW201634859 A TW 201634859A TW 105100268 A TW105100268 A TW 105100268A TW 105100268 A TW105100268 A TW 105100268A TW 201634859 A TW201634859 A TW 201634859A
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- G—PHYSICS
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- G02B5/22—Absorbing filters
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Abstract
Description
本發明係關於將穿透波長選擇濾光器之光照射於照射區域之光照射裝置。 The present invention relates to a light irradiation device that irradiates light that penetrates a wavelength selective filter to an irradiation region.
已知有一種光硬化技術,其已被廣泛地應用於液晶面板之封裝、光學透鏡零件之黏著、光碟之黏著、印刷電路基板之零件的暫時固定等方面,該技術通常係將光硬化劑塗覆於紙或塑膠等之表面,然後對此光硬化劑照射光而使其硬化。用於光硬化之光,係根據硬化劑之種類、硬化條件等而不同,除了紫外線(紫外光)外,有時還使用可視光或近紅外線。光硬化技術中使用之光照射裝置之光源,於將紫外線利用於光硬化之情況,通常係使用高壓水銀燈或金屬鹵化物燈等之放電燈(例如,參照專利文獻1)。為了極力避免來自光源之熱影響,於此種之光照射裝置配置有遮蔽照射區域不需要之可視光及近紅外線之熱線截止濾光器(例如,參照專利文獻2)。 There is known a photohardening technique which has been widely applied to packaging of liquid crystal panels, adhesion of optical lens components, adhesion of optical disks, temporary fixing of components of printed circuit boards, etc., which is usually applied with a light hardener. Cover the surface of paper or plastic, and then light the light hardener to harden it. The light used for photohardening differs depending on the kind of hardener, hardening conditions, etc., and visible light or near-infrared rays may be used in addition to ultraviolet rays (ultraviolet light). In the case where the light source of the light irradiation device used in the photo-curing technique is used for photocuring, a discharge lamp such as a high-pressure mercury lamp or a metal halide lamp is usually used (for example, see Patent Document 1). In order to avoid the thermal influence from the light source as much as possible, the light irradiation device is provided with a heat-ray cut filter that shields the visible light and the near-infrared rays that are not required for the irradiation region (for example, refer to Patent Document 2).
專利文獻1:日本專利第4642066號公報 Patent Document 1: Japanese Patent No. 4642066
專利文獻2:日本專利特開2007-191543號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 2007-191543
可是,截止濾光器係採用於透明基板上層積了電介質多層膜之波長選擇濾光器,於穿透特性上具有入射角度依存性。因此,於僅利用截止濾光器對照射區域所需要之波長進行調整之情況,對傾斜入射於濾光器之光而言,會有被不需要之波長穿透而照射至照射區域之問題。 However, the cut-off filter is a wavelength selective filter in which a dielectric multilayer film is laminated on a transparent substrate, and has an incident angle dependency on the penetration characteristics. Therefore, in the case where the wavelength required for the irradiation region is adjusted by only the cut filter, there is a problem that the light obliquely incident on the filter is irradiated to the irradiation region by the unnecessary wavelength.
本發明係鑒於上述情況而完成,目的在於提供一種光照射裝置,其能以使用具有入射角度依存性之波長選擇濾光器之構成,高精度地將照射區域不需要之波長之光遮蔽。 The present invention has been made in view of the above circumstances, and it is an object of the invention to provide a light-irradiating device capable of selectively shielding light having a wavelength unnecessary for an irradiation region by using a wavelength selective filter having an incident angle dependency.
為了達成上述目的,本發明提供一種光照射裝置,係具備放射包含照射區域所需要之波長的光之光源、及供包含上述需要之波長的光穿透之波長選擇濾光器,將自上述光源穿透上述波長選擇濾光器之光照射於上述照射區域;其特徵在於,該光照射裝置係具備吸收上述需要之波長之範圍外之光之吸收濾光器,且將穿透上述波長選擇濾光器及上述吸收濾光器之光照射於上述照射區域。 In order to achieve the above object, the present invention provides a light irradiation device including a light source that emits light having a wavelength required for an irradiation region, and a wavelength selective filter that transmits light including the wavelength required, from the light source Light passing through the wavelength selective filter is irradiated to the irradiation region; wherein the light irradiation device is provided with an absorption filter that absorbs light outside the range of the required wavelength, and penetrates the wavelength selection filter The light of the optical device and the absorption filter is irradiated to the irradiation region.
此外,本發明係於上述光照射裝置中,其特徵在於:上述吸收濾光器係配置為供穿透上述波長選擇濾光器之光入射。 Furthermore, the present invention is directed to the light irradiation device described above, wherein the absorption filter is configured to allow light incident through the wavelength selective filter to be incident.
此外,本發明係於上述光照射裝置中,其特徵在於:具備反射鏡,該反射鏡係對來自上述光源之光進行反射,以使來自上述光源之光在包含傾斜之入射角度之角度範圍內入射於上述波長選擇濾光器。 Further, the present invention is directed to the light irradiation device, comprising: a mirror that reflects light from the light source such that light from the light source is within an angle range including an incident angle of inclination It is incident on the above wavelength selection filter.
此外,本發明係於上述光照射裝置中,其特徵在於:上述波長選擇濾光器係具有入射角度依存性之濾光器,上述吸收濾 光器係不具有入射角度依存性之濾光器。 Furthermore, the present invention is directed to the light irradiation device characterized in that the wavelength selective filter is a filter having an incident angle dependency, and the absorption filter The light device is a filter that does not have an incident angle dependency.
此外,本發明係於上述光照射裝置中,其特徵在於:上述吸收濾光器係具有光吸收物質之濾光器,上述光吸收物質係吸收未滿上述波長選擇濾光器之穿透波帶下限的波長範圍之光。 Furthermore, the present invention is directed to the light irradiation device characterized in that the absorption filter is a filter having a light absorbing material, and the light absorbing material absorbs a penetration band that is less than the wavelength selective filter. Light in the lower wavelength range.
此外,本發明係於上述光照射裝置中,其特徵在於:於上述波長選擇濾光器與上述吸收濾光器之間介設有襯墊,該襯墊係對不穿透上述波長選擇濾光器及上述吸收濾光器中配置於上述光源側之濾光器而入射於另一濾光器之光進行遮光。 Furthermore, the present invention is directed to the above-mentioned light-irradiating device, characterized in that a spacer is interposed between the wavelength selective filter and the absorption filter, and the spacer is selected to pass through the wavelength selective filtering. The light that is disposed on the light source side filter and the light incident on the other filter in the absorption filter is shielded from light.
此外,本發明係於上述光照射裝置中,其特徵在於:上述波長選擇濾光器及上述吸收濾光器,係於各濾光器延伸之方向分別排列複數片濾光器而構成,上述襯墊具有邊界遮光部,該邊界遮光部係沿構成上述波長選擇濾光器及上述吸收濾光器中配置於上述光源側之濾光器的上述複數片濾光器之邊界部分延伸,對自上述邊界部分洩漏之光進行遮光。 Further, according to the present invention, in the light irradiation device, the wavelength selective filter and the absorption filter are configured by arranging a plurality of filters in a direction in which the respective filters extend, and the lining. The pad has a boundary light blocking portion extending along a boundary portion between the plurality of filters constituting the wavelength selective filter and the filter disposed on the light source side of the absorption filter, The light leaking from the boundary portion is shielded from light.
此外,本發明係於上述光照射裝置中,其特徵在於:具有收容上述光源及上述波長選擇濾光器之箱體,設於上述箱體之照射開口,係由具備上述波長選擇濾光器及上述吸收濾光器之蓋單元所封塞。 Further, the present invention is directed to the light irradiation device, comprising: a housing for accommodating the light source and the wavelength selective filter; and an illumination opening provided in the housing, comprising the wavelength selective filter; The cover unit of the above absorption filter is sealed.
根據本發明,由於具備供包含照射區域需要之波長之光穿透之波長選擇濾光器,並具備吸收需要之波長範圍外之光的吸收濾光器,且將穿透波長選擇濾光器及吸收濾光器之光照射於照射區域,因此,能以使用具有入射角度依存性之波長選擇濾光器之構成,高精度地將照射區域不需要之波長之光遮蔽。 According to the present invention, a wavelength selective filter for transmitting light having a wavelength required for an irradiation region is provided, and an absorption filter for absorbing light outside a required wavelength range is provided, and a wavelength selective filter is penetrated and Since the light of the absorption filter is irradiated to the irradiation region, the filter having the wavelength dependence of the incident angle can be selected, and the light of the wavelength unnecessary for the irradiation region can be shielded with high precision.
1‧‧‧光照射裝置 1‧‧‧Lighting device
2‧‧‧外殼體(箱體) 2‧‧‧Outer casing (box)
2K‧‧‧開口部(照射開口) 2K‧‧‧ openings (irradiation openings)
2R‧‧‧軌道 2R‧‧ Track
11‧‧‧照射單元 11‧‧‧Irradiation unit
12‧‧‧直管型燈管(光源) 12‧‧‧ Straight tube type lamp (light source)
12S‧‧‧燈支撐體 12S‧‧‧light support
13‧‧‧反射鏡單元 13‧‧‧Mirror unit
13A‧‧‧孔部 13A‧‧‧ Hole Department
14‧‧‧框體 14‧‧‧ frame
15‧‧‧燈收容箱 15‧‧‧light storage box
21‧‧‧冷卻單元 21‧‧‧Cooling unit
21A‧‧‧冷卻用散熱器 21A‧‧‧Cooling radiator
21B‧‧‧冷卻用單元 21B‧‧‧Cooling unit
21C‧‧‧冷卻用送風機 21C‧‧‧cooling blower
31‧‧‧蓋單元 31‧‧‧ cover unit
31A‧‧‧開口部 31A‧‧‧ Opening
32‧‧‧框蓋 32‧‧‧ frame cover
32A‧‧‧凸條部 32A‧‧‧Bars
33‧‧‧波長選擇濾光器 33‧‧‧wavelength selection filter
33A‧‧‧濾光器 33A‧‧‧Filter
34‧‧‧襯墊 34‧‧‧ cushion
34A‧‧‧邊界遮光部 34A‧‧‧Boundary Shading Department
35‧‧‧吸收濾光器 35‧‧‧ absorption filter
36‧‧‧濾光器壓件 36‧‧‧Filter presser
37‧‧‧緊固構件 37‧‧‧ fastening members
f1‧‧‧波長選擇濾光器之分光特性 Spectroscopic characteristics of f1‧‧‧ wavelength selective filter
f2‧‧‧吸收濾光器之分光特性 Spectral characteristics of f2‧‧‧ absorption filter
W‧‧‧工件(照射區域) W‧‧‧Workpiece (illuminated area)
圖1為顯示本發明之實施形態之光照射裝置之圖。 Fig. 1 is a view showing a light irradiation device according to an embodiment of the present invention.
圖2為顯示光照射裝置之照射單元之示意圖。 Fig. 2 is a schematic view showing an irradiation unit of a light irradiation device.
圖3為光照射裝置之蓋單元之分解立體圖。 Fig. 3 is an exploded perspective view of the cover unit of the light irradiation device.
圖4為顯示波長選擇濾光器及吸收濾光器之分光特性之圖。 Fig. 4 is a view showing the spectral characteristics of the wavelength selective filter and the absorption filter.
以下,參照圖式對本發明之實施形態進行說明。圖1為顯示實施形態之光照射裝置1之圖。此光照射裝置1係朝以可視光硬化之物質照射可視光的裝置,且構成為設置於對象物之照射面即工件W之上方,對工件W大致均勻地照射390nm~500nm之可視光(可視光之短波長側之光)之裝置。於構成此光照射裝置1之外殼之外殼體2中,收容有照射單元11、將照射單元11冷卻之冷卻單元21、及配置於照射單元11與工件W之間之蓋單元31。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a view showing a light irradiation device 1 of an embodiment. The light irradiation device 1 is a device that illuminates visible light toward a material that is hardened by visible light, and is disposed above the workpiece W that is an irradiation surface of the object, and uniformly irradiates the workpiece W with visible light of 390 nm to 500 nm (visible). A device for light on the short wavelength side of light. The casing 2 constituting the outer casing of the light irradiation device 1 houses an irradiation unit 11, a cooling unit 21 that cools the irradiation unit 11, and a cover unit 31 that is disposed between the irradiation unit 11 and the workpiece W.
圖2為顯示照射單元11之示意圖。照射單元11具備構成光源之直管型燈管12、及使自直管型燈管12放射之光(圖2中,以虛線顯示光)朝下方(工件W側)反射之反射鏡單元13。此反射鏡單元13係被支撐在延伸於直管型燈管12之長邊方向之框體14。直管型燈管12例如為將鎵之鹵化物封入發光管內,大量輸出400~450nm之波長區域之鎵燈,且使用沿工件W大致平行地延伸之長直管型之燈。此直管型燈管12可廣泛地應用各種之光源,例如,也可應用高壓水銀燈、或其他之金屬鹵化物燈。支撐此直管型燈管12之燈支撐體12S被結合於蓋單元31。 FIG. 2 is a schematic view showing the irradiation unit 11. The irradiation unit 11 includes a straight tube type bulb 12 constituting a light source, and a mirror unit 13 that reflects light emitted from the straight tube type bulb 12 (light shown by a broken line in FIG. 2) toward the lower side (the workpiece W side). This mirror unit 13 is supported by a frame 14 extending in the longitudinal direction of the straight tube type bulb 12. The straight tube type lamp 12 is, for example, a gallium lamp in which a halide of gallium is enclosed in an arc tube, a large amount of a wavelength region of 400 to 450 nm is output, and a long straight tube type lamp extending substantially in parallel along the workpiece W is used. The straight tube type lamp 12 can be widely applied to various light sources, for example, a high pressure mercury lamp or other metal halide lamps can also be applied. The lamp support 12S supporting the straight tube type lamp 12 is coupled to the cover unit 31.
反射鏡單元13係形成為向上方凹陷之凹面鏡,且將 直管型燈管12之正下方空開而圍繞著直管型燈管12並沿直管型燈管12之長邊方向延伸。藉由此反射鏡單元13自上方覆蓋直管型燈管12之全長,使未自直管型燈管12被放射於工件W之直接光朝工件W反射。藉由設置反射鏡單元13,可增加照射於工件W之光量,且可提高直管型燈管12之光之利用效率。再者,反射鏡單元13係能滑動自如地被支撐在延伸於直管型燈管12之長邊方向之一對軌道2R,從而可容易將反射鏡單元13移動至容易進行交換等之保養的位置。 The mirror unit 13 is formed as a concave mirror that is recessed upward, and will The straight tube type lamp 12 is open directly below the straight tube type lamp tube 12 and extends along the longitudinal direction of the straight tube type tube 12. The mirror unit 13 covers the entire length of the straight tube type lamp 12 from above, so that the direct light that is not emitted from the straight tube type tube 12 to the workpiece W is reflected toward the workpiece W. By providing the mirror unit 13, the amount of light irradiated to the workpiece W can be increased, and the utilization efficiency of the light of the straight tube type lamp 12 can be improved. Further, the mirror unit 13 is slidably supported by one of the rails 2R extending in the longitudinal direction of the straight tube type lamp 12, so that the mirror unit 13 can be easily moved to a maintenance such as exchange. position.
外殼體2係由具有朝下方開口之開口部2K之金屬製箱體形成,於反射鏡單元13之上方具備冷卻用散熱器21A、冷卻用單元21B、及冷卻用送風機21C等。冷卻用散熱器21A、冷卻用單元21B及冷卻用送風機21C,係構成冷卻單元21之零件,藉由冷卻用送風機21C將冷卻風朝照射單元11送風,對照射單元11之各部分(直管型燈管12、及反射鏡單元13等)進行空氣冷卻。此外,冷卻用散熱器21A及冷卻用單元21B,係對分別供給於設置在反射鏡單元13之複數個孔部13A之冷卻用流體進行冷卻。複數個孔部13A係延伸於反射鏡單元13之長邊方向,且藉由使冷卻用流體流動於各孔部13A之各者,可有效率地冷卻反射鏡單元13。 The outer casing 2 is formed of a metal case having an opening 2K that opens downward, and a cooling radiator 21A, a cooling unit 21B, a cooling blower 21C, and the like are provided above the mirror unit 13. The cooling radiator 21A, the cooling unit 21B, and the cooling fan 21C constitute a component of the cooling unit 21, and the cooling air blower 21C blows the cooling air toward the irradiation unit 11, and the respective portions of the irradiation unit 11 (straight tube type) The lamp tube 12, the mirror unit 13, and the like are air-cooled. Further, the cooling radiator 21A and the cooling unit 21B cool the cooling fluid supplied to the plurality of holes 13A provided in the mirror unit 13, respectively. The plurality of holes 13A extend in the longitudinal direction of the mirror unit 13, and the mirror unit 13 can be efficiently cooled by flowing the cooling fluid to each of the holes 13A.
藉此,可將照射單元11之各部分(直管型燈管12、及反射鏡單元13等)強制冷卻,可充分抑制因直管型燈管12之發熱之影響而造成之直管型燈管12、及反射鏡單元13等之溫度上昇。此外,燈收容箱15之開口部2K,係由蓋單元31覆蓋,因此,可將燈收容箱15自外部空間區隔,可抑制外部空間之熱影響,於燈收容箱15內形成獨立之冷卻空間。 Thereby, the respective portions of the irradiation unit 11 (the straight tube type lamp tube 12, the mirror unit 13, and the like) can be forcibly cooled, and the straight tube type lamp caused by the heat of the straight tube type tube 12 can be sufficiently suppressed. The temperature of the tube 12, the mirror unit 13, and the like rises. Further, the opening portion 2K of the lamp housing box 15 is covered by the cover unit 31. Therefore, the lamp housing box 15 can be separated from the external space, and the thermal influence of the external space can be suppressed, and independent cooling can be formed in the lamp housing box 15. space.
蓋單元31係覆蓋外殼體2之下方之開口部2K之蓋構件,且形成為沿直管型燈管12之長邊方向延伸之矩形薄型之蓋體。於此蓋單元31且直管型燈管12之正下方形成有沿直管型燈管12之長邊方向延伸之矩形之開口部31A,藉由使直管型燈管12之直接光、及由反射鏡單元13反射之間接光通過此開口部31A,而將光照射於工件W。亦即,外殼體2之開口部31A係作為朝工件W照射光之照射開口部而發揮作用。此外,此蓋單元31係被安裝為能容易自外殼體2裝卸自如。由於直管型燈管12係隔著燈支撐體12S被支撐於蓋單元31,因此,能容易自外殼體2拆卸蓋單元31及直管型燈管12。 The cover unit 31 is a cover member that covers the opening portion 2K below the outer casing 2, and is formed into a rectangular thin cover that extends in the longitudinal direction of the straight tube type bulb 12. A rectangular opening portion 31A extending along the longitudinal direction of the straight tube type bulb 12 is formed directly under the cover unit 31 and the straight tube type lamp tube 12, by direct light of the straight tube type tube 12, and Light is reflected by the mirror unit 13 and passes through the opening 31A to illuminate the workpiece W. In other words, the opening 31A of the outer casing 2 functions as an irradiation opening that irradiates the workpiece W with light. Further, the cover unit 31 is attached so as to be easily detachable from the outer casing 2. Since the straight tube type lamp 12 is supported by the cover unit 31 via the lamp support body 12S, the cover unit 31 and the straight tube type lamp tube 12 can be easily detached from the outer casing 2.
其中,直管型燈管12之光中,還包含不需要朝工件W照射之波長之光,為了將此不需要之波長之光除去,於蓋單元31之開口部31A安裝有覆蓋開口部31A之波長選擇濾光器33。波長選擇濾光器33係於透明基板上層積電介質多層膜而形成之光學濾光器,僅供朝工件W之照射所需要之波長(需要波長)之光穿透,不需要之波長之光則不會穿透。藉此,波長選擇濾光器33係作為除去工件W不需要之光之截止濾光器發揮作用。 In the light of the straight tube type lamp 12, light having a wavelength that does not need to be irradiated to the workpiece W is further included, and in order to remove the unnecessary wavelength light, the opening portion 31A is attached to the opening portion 31A of the cover unit 31. The wavelength selection filter 33. The wavelength selective filter 33 is an optical filter formed by laminating a dielectric multilayer film on a transparent substrate, and is only required to pass light of a wavelength (required wavelength) required for irradiation of the workpiece W, and light of an unnecessary wavelength is not Will penetrate. Thereby, the wavelength selective filter 33 functions as a cut filter that removes unnecessary light of the workpiece W.
可是,波長選擇濾光器33在穿透特性上具有入射角度依存性。因此,對傾斜入射之光而言,即使為不需要之波長,也會有一部分光穿透。尤其是,本實施形態之光照射裝置1,係於自直管型燈管12分離之位置配置平板狀之波長選擇濾光器33,且使用彎曲之反射鏡單元13對直管型燈管12之光進行反射,因此,如圖2所示,傾斜入射於波長選擇濾光器33之光成分存在較多,容易使穿透波長選擇濾光器33之不需要之波長之光變多。因此,於 本構成中,進而設置對不需要之波長之光進行吸收之吸收濾光器35,且構成為僅使穿透波長選擇濾光器33、及吸收濾光器35之必要波長之光照射於照射區域即工件W。 However, the wavelength selective filter 33 has an incident angle dependency on the transmission characteristics. Therefore, for obliquely incident light, even if it is an unnecessary wavelength, a part of light penetrates. In particular, in the light irradiation device 1 of the present embodiment, the flat-wavelength selective filter 33 is disposed at a position separated from the straight tube type bulb 12, and the curved mirror unit 13 is used for the straight tube type lamp 12 Since the light is reflected, as shown in FIG. 2, there are many light components obliquely incident on the wavelength selective filter 33, and it is easy to increase the wavelength of the unnecessary wavelength that penetrates the wavelength selective filter 33. Therefore, In the present configuration, an absorption filter 35 that absorbs light of an unnecessary wavelength is further provided, and only light having a necessary wavelength that penetrates the wavelength selective filter 33 and the absorption filter 35 is irradiated to the illumination. The area is the workpiece W.
圖3為顯示蓋單元31之分解立體圖。如圖3所示,蓋單元31具備:框蓋32,其形成開口部31A;波長選擇濾光器33、襯墊34及吸收濾光器35,該等層積配置於此框蓋32;及濾光器壓件36,其將該等波長選擇濾光器33、襯墊34及吸收濾光器35固定於框蓋32。波長選擇濾光器33及吸收濾光器35係形成為較開口部31A略大之矩形平板形狀,本實施形態中,形成為相同之外形形狀。 FIG. 3 is an exploded perspective view showing the cover unit 31. As shown in FIG. 3, the cover unit 31 includes a frame cover 32 that forms an opening 31A, a wavelength selective filter 33, a spacer 34, and an absorption filter 35, which are laminated on the frame cover 32; The filter presser 36 fixes the wavelength selective filter 33, the spacer 34, and the absorption filter 35 to the frame cover 32. The wavelength selection filter 33 and the absorption filter 35 are formed in a rectangular flat plate shape slightly larger than the opening portion 31A, and are formed in the same outer shape in the present embodiment.
框蓋32及濾光器壓件36係由金屬、或樹脂等之具有剛性之材料形成。於框蓋32之上面係以沿著開口部31A之外緣而形成連續之矩形框之方式設置有凸條部32A,此外,濾光器壓件36係以夾持波長選擇濾光器33、襯墊34及吸收濾光器35之方式自上方配置於此凸條部32A,且藉由複數之緊固構件(本構成中為固定螺栓)37將濾光器壓件36固定於框蓋32。藉此,於框蓋32與濾光器壓件36之間夾持有波長選擇濾光器33、襯墊34及吸收濾光器35。本構成中,將波長選擇濾光器33與吸收濾光器35一體構成於蓋單元31,因此,能容易朝照射單元11安裝或拆卸複數之濾光器33、35。此外,由於大致重疊地配置複數之濾光器33、35,因此可抑制具有複數之濾光器33、35之蓋單元31之高度,可抑制光照射裝置1之高度增大。 The frame cover 32 and the filter presser 36 are formed of a material having rigidity such as metal or resin. A ridge portion 32A is disposed on the upper surface of the frame cover 32 so as to form a continuous rectangular frame along the outer edge of the opening portion 31A. Further, the filter pressing member 36 is configured to sandwich the wavelength selection filter 33, The lining portion 34 and the absorbing filter 35 are disposed on the rib portion 32A from above, and the filter press member 36 is fixed to the frame cover 32 by a plurality of fastening members (fixing bolts in the present configuration) 37. . Thereby, the wavelength selective filter 33, the spacer 34, and the absorption filter 35 are interposed between the frame cover 32 and the filter presser 36. In the present configuration, since the wavelength selective filter 33 and the absorption filter 35 are integrally formed in the cover unit 31, the plurality of filters 33 and 35 can be easily attached or detached to the irradiation unit 11. Further, since the plurality of filters 33 and 35 are arranged substantially in a superposed manner, the height of the cover unit 31 having the plurality of filters 33 and 35 can be suppressed, and the increase in the height of the light irradiation device 1 can be suppressed.
襯墊34係用以在重疊配置之波長選擇濾光器33與吸收濾光器35之間確保間隙之間隙調整構件,其由PTFE(聚四氟乙 烯)等之具有遮光性及柔軟性之材料形成。藉由間隔微小之間隙,即使外力作用於一濾光器33或35,也能避免濾光器33及35彼此之接觸,抑制外力之傳遞。尤其是,於將耐紫外線材料且具有高透射率之優點之透明玻璃材料(石英玻璃、硼矽酸玻璃等)使用於波長選擇濾光器33及吸收濾光器35之基材之情況,藉由設置襯墊34,即使將該等加以層積配置,也能有效地抑制因外力之影響造成之玻璃材料之損傷等。 The spacer 34 is a gap adjusting member for ensuring a gap between the wavelength selective filter 33 and the absorption filter 35 in an overlapping configuration, which is made of PTFE (polytetrafluoroethylene) A material having light blocking properties and flexibility such as alkene is formed. By the minute gap, even if an external force acts on a filter 33 or 35, the contacts of the filters 33 and 35 can be prevented from each other, and the transmission of the external force can be suppressed. In particular, in the case where a transparent glass material (quartz glass, borosilicate glass, or the like) which has an ultraviolet-resistant material and has a high transmittance is used for the substrate of the wavelength selective filter 33 and the absorption filter 35, By providing the spacer 34, even if these are laminated, it is possible to effectively suppress damage or the like of the glass material due to the influence of an external force.
此外,襯墊34係形成為沿波長選擇濾光器33之外緣之框狀,使其至少能遮蔽配置於直管型燈管12側之波長選擇濾光器33周圍之間隙。因此,可確實地防止直管型燈管12之光自波長選擇濾光器33之周圍洩漏而入射於配置在工件W側之吸收濾光器35之事態。 Further, the spacer 34 is formed in a frame shape along the outer edge of the wavelength selection filter 33 so as to at least shield the gap around the wavelength selective filter 33 disposed on the side of the straight tube type bulb 12. Therefore, it is possible to surely prevent the light of the straight tube type bulb 12 from leaking from the periphery of the wavelength selection filter 33 and entering the absorption filter 35 disposed on the workpiece W side.
此外,如圖3所示,直管型燈管12側之波長選擇濾光器33,係構成為將複數片之濾光器33A排列於直管型燈管12之長邊方向之多板型,且來自直管型燈管12之光有可能入射於該等濾光器33之間之微小間隙。本實施形態中,襯墊34係一體具備沿構成波長選擇濾光器33之複數濾光器33A(小片)之邊界部分延伸之邊界遮光部34A,以使自邊界部分洩漏之光不入射於配置在工件W側之吸收濾光器35。亦即,襯墊34係作為對不穿透波長選擇濾光器33而入射於吸收濾光器35之光進行遮光之遮光構件發揮作用,可抑制吸收濾光器35之光吸收物質之劣化。此外,直管型燈管12之出射光包含紫外光,由於藉由襯墊34可抑制此紫外光被照射於吸收濾光器35,因此可抑制光吸收物質之紫外線劣化。藉此,可有效率地抑制吸收濾光器35之性能劣化,可期長壽化。再者,也可 將波長選擇濾光器33構成為單板型。於構成為單板型之情況,可刪去襯墊34之上述邊界遮光部34A,也可不刪。於不刪除之情況,可更容易按邊界遮光部34A之數量份適宜地維持波長選擇濾光器33、及吸收濾光器35之間隙。 Further, as shown in FIG. 3, the wavelength selective filter 33 on the side of the straight tube type bulb 12 is configured to arrange a plurality of filters 33A in the longitudinal direction of the straight tube type tube 12. And the light from the straight tube type lamp 12 may be incident on the minute gap between the filters 33. In the present embodiment, the spacer 34 integrally includes a boundary light blocking portion 34A extending along a boundary portion of the plurality of filters 33A (small pieces) constituting the wavelength selective filter 33 so that light leaking from the boundary portion is not incident on the arrangement. The absorption filter 35 on the side of the workpiece W. In other words, the spacer 34 functions as a light shielding member that blocks light that is incident on the absorption filter 35 without penetrating the wavelength selective filter 33, and can suppress deterioration of the light absorbing material of the absorption filter 35. Further, the light emitted from the straight tube type lamp 12 contains ultraviolet light, and since the ultraviolet light is suppressed from being irradiated to the absorption filter 35 by the spacer 34, ultraviolet light deterioration of the light absorbing material can be suppressed. Thereby, the performance deterioration of the absorption filter 35 can be effectively suppressed, and the life can be prolonged. Furthermore, it can also The wavelength selective filter 33 is configured as a single plate type. In the case of the single-plate type, the boundary light-shielding portion 34A of the spacer 34 may be omitted or deleted. In the case where it is not deleted, it is easier to appropriately maintain the gap between the wavelength selective filter 33 and the absorption filter 35 in the number of the boundary light blocking portions 34A.
圖4顯示波長選擇濾光器33及吸收濾光器35之分光特性。圖4中,符號f1顯示波長選擇濾光器33之分光特性,符號f2顯示吸收濾光器35之分光特性。再者,圖4所示之波長選擇濾光器33之分光特性,係垂直入射下之透射率特性。如圖4中符號f1所示,於垂直入射之透射率特性中,波長選擇濾光器33係於390~500nm之波長範圍內具有最大透射率為85%以上之穿透波帶,於600~800nm之波長範圍之至少一部分具有最大透射率為1%以下之可視區域及近紅外光側之截止波帶,及於200~400nm之波長範圍之至少一部分具有最大透射率為1%以下之紫外側截止波帶。此外,藉由以耐熱性較高之材料即石英玻璃形成透明基板,可提高波長選擇濾光器33之耐熱性。 4 shows the spectral characteristics of the wavelength selective filter 33 and the absorption filter 35. In Fig. 4, the symbol f1 shows the spectral characteristics of the wavelength selective filter 33, and the symbol f2 shows the spectral characteristics of the absorption filter 35. Further, the spectral characteristics of the wavelength selective filter 33 shown in Fig. 4 are the transmittance characteristics under normal incidence. As shown by the symbol f1 in FIG. 4, in the transmittance characteristic of normal incidence, the wavelength selective filter 33 is a penetration band having a maximum transmittance of 85% or more in the wavelength range of 390 to 500 nm, at 600~. At least a portion of the wavelength range of 800 nm has a visible region having a maximum transmittance of 1% or less and a cutoff band at a near-infrared light side, and an ultraviolet side having a maximum transmittance of 1% or less in at least a portion of a wavelength range of 200 to 400 nm. Cutoff band. Further, by forming the transparent substrate from quartz glass which is a material having high heat resistance, the heat resistance of the wavelength selective filter 33 can be improved.
具體而言,波長選擇濾光器33係於石英玻璃製之透明基板之不同之面,具有構成窄頻帶通型(NBP型)之濾光器之第1層積體、及構成寬頻帶通型(BBP型)之濾光器之第2層積體,藉由第1層積體,於400~600nm之波長範圍內構成最大透射率為85%以上之穿透波帶、穿透波帶之短波長側之透射率為85%至5%以下之透射率曲線之傾斜、及長波長側之透射率為85%至5%以下之透射率曲線之傾斜。並且,藉由NBP型之第2層積體,於600~800nm之波長範圍之至少一部分構成最小透射率為1%以下之可視區域及近紅外光側截止波帶,及於200~400nm之波長範圍之至少一部分 構成最小透射率成為1%以下之紫外線側截止波帶。 Specifically, the wavelength selective filter 33 is formed on a different surface of a transparent substrate made of quartz glass, and has a first layered body constituting a narrow-band pass type (NBP type) filter and a wide-band type. The second layer of the filter of the (BBP type) is a first layered body, and constitutes a penetration band and a penetration band having a maximum transmittance of 85% or more in a wavelength range of 400 to 600 nm. The transmittance on the short-wavelength side is from 85% to 5%, and the transmittance on the long-wavelength side is from 85% to 5%. Further, the second layered body of the NBP type forms a visible region having a minimum transmittance of 1% or less and a near-infrared light-side cutoff band in at least a part of a wavelength range of 600 to 800 nm, and a wavelength of 200 to 400 nm. At least part of the scope The ultraviolet side cutoff band having a minimum transmittance of 1% or less is formed.
吸收濾光器35係於透明基板(石英玻璃、硼矽酸玻璃等)中使吸收規定波長之光的光吸收物質分散而形成之光學濾光器,且與波長選擇濾光器33同樣,形成為覆蓋蓋單元31之開口部31A之矩形之平板形狀。如圖4中符號f2所示,此吸收濾光器35係被設定為使較高地設定波長選擇濾光器33之穿透率之波長範圍(390~500nm)之光穿透,且吸收此以外之規定波長之光即工件W不需要之波長之光之特性。吸收濾光器35不具有入射角度依存性。 The absorption filter 35 is an optical filter formed by dispersing a light absorbing material that absorbs light of a predetermined wavelength in a transparent substrate (such as quartz glass or borosilicate glass), and is formed in the same manner as the wavelength selective filter 33. It is a rectangular flat plate shape that covers the opening portion 31A of the cover unit 31. As shown by the symbol f2 in Fig. 4, the absorption filter 35 is set to penetrate light in a wavelength range (390 to 500 nm) in which the transmittance of the wavelength selective filter 33 is set high, and absorbs it. The light of a predetermined wavelength is a characteristic of light of a wavelength that is not required for the workpiece W. The absorption filter 35 does not have an incident angle dependency.
更具體而言,吸收濾光器35係將未滿390nm之波長範圍設為吸收波帶,且將390nm以上之波長範圍設為最大透射率為90%以上之穿透波帶。藉此,可利用吸收濾光器35吸收藉由傾斜入射而穿透於波長選擇濾光器33之、未滿390nm之波長之光。再者,如圖3所示,此吸收濾光器35也與波長選擇濾光器33同樣,構成為排列於直管型燈管12之長邊方向之多板型。因此,與以一個零件製作於直管型燈管12之長邊方向變長之波長選擇濾光器33及吸收濾光器35之情況比較,可容易且以低成本製造。 More specifically, the absorption filter 35 is a penetration band having a wavelength range of less than 390 nm as an absorption band and a wavelength range of 390 nm or more as a maximum transmittance of 90% or more. Thereby, the absorption filter 35 can absorb the light having a wavelength of less than 390 nm which is penetrated by the wavelength selective filter 33 by oblique incidence. Further, as shown in FIG. 3, the absorption filter 35 is also configured in a multi-plate type arranged in the longitudinal direction of the straight tube type bulb 12, similarly to the wavelength selective filter 33. Therefore, compared with the case where the wavelength selection filter 33 and the absorption filter 35 which are formed in the longitudinal direction of the straight tube type bulb 12 with one part are selected, it can be manufactured easily and at low cost.
藉由以上之構成,如圖2所示,自直管型燈管12放射之光,直接或者由反射鏡單元13反射後以各種之入射角度入射於波長選擇濾光器33。垂直入射之光,係遵從波長選擇濾光器33之光學特性(圖4中,參照符號f1),使設定為高透射率之波長範圍(390~500nm)之光穿透,且此以外波長之光幾乎不穿透。穿透波長選擇濾光器33之光,由於是在吸收濾光器35之高透射率之波長範圍內,因此穿透吸收濾光器35而照射於工件W。 According to the above configuration, as shown in FIG. 2, the light radiated from the straight tube type lamp 12 is directly or reflected by the mirror unit 13 and is incident on the wavelength selective filter 33 at various incident angles. The light incident vertically is in accordance with the optical characteristics of the wavelength selective filter 33 (reference symbol f1 in Fig. 4), and the light having a wavelength range (390 to 500 nm) set to a high transmittance is penetrated, and the wavelength is other than this. Light hardly penetrates. The light that has passed through the wavelength selective filter 33 is incident on the workpiece W by penetrating the absorption filter 35 because it is in the wavelength range of the high transmittance of the absorption filter 35.
另一方面,傾斜入射於波長選擇濾光器33之光,係 遵從波長選擇濾光器33之入射角度依存性,一部分光穿透波長選擇濾光器33。此穿透之光入射於吸收濾光器35後,遵從吸收濾光器35之光學特性(圖4中,參照符號f2),使設定為高透射率之波長範圍(390nm~)之光穿透,而設定為低透射率之波長範圍(未滿390nm)之光,則由吸收濾光器35吸收。藉此,藉由波長選擇濾光器33及吸收濾光器35之二段濾光器構成,使工件W需要之波長範圍(390~500nm)之光朝工件W照射,可高精度地將工件W不需要之波長範圍(尤其未滿390nm)之光遮蔽。 On the other hand, the light incident on the wavelength selective filter 33 is obliquely A part of the light passes through the wavelength selective filter 33 in accordance with the incident angle dependency of the wavelength selective filter 33. After the transmitted light is incident on the absorption filter 35, the optical characteristics of the absorption filter 35 (refer to reference numeral f2 in Fig. 4) are passed, and light having a wavelength range (390 nm~) set to a high transmittance is penetrated. Light of a wavelength range (less than 390 nm) set to a low transmittance is absorbed by the absorption filter 35. Thereby, the two wavelength filters of the wavelength selective filter 33 and the absorption filter 35 are configured to illuminate the workpiece W in a wavelength range (390 to 500 nm) required for the workpiece W, and the workpiece can be accurately guided. The light is not covered by the wavelength range (especially below 390 nm).
此外,於上述二段濾光器構成中,僅使穿透波長選擇濾光器33之光入射於吸收濾光器35,因此可抑制吸收濾光器35之光吸收物質之劣化,抑制吸收濾光器35之性能劣化。 Further, in the above-described two-stage filter configuration, only the light that has passed through the wavelength selective filter 33 is incident on the absorption filter 35, so that the deterioration of the light absorbing material of the absorption filter 35 can be suppressed, and the absorption filter can be suppressed. The performance of the optical device 35 deteriorates.
如以上說明,本實施形態中,其構成為具備供包含照射區域需要之波長之光穿透之波長選擇濾光器33,並具備吸收上述需要之波長範圍外之光之吸收濾光器35,且將穿透波長選擇濾光器33及吸收濾光器35之光照射於照射區域即工件W,因此,能以使用具有入射角度依存性之波長選擇濾光器33之構成,高精度地將照射區域不需要之波長之光遮蔽,且可高精度地照射需要之波長之光。 As described above, in the present embodiment, the wavelength selective filter 33 for transmitting light having a wavelength required for the irradiation region is provided, and the absorption filter 35 for absorbing light outside the required wavelength range is provided. Further, since the light that has passed through the wavelength selective filter 33 and the absorption filter 35 is irradiated onto the workpiece W which is the irradiation region, the filter can be selected with high accuracy using the wavelength selection filter 33 having the incident angle dependency. The light of the unnecessary wavelength of the irradiation area is shielded, and the light of the desired wavelength can be irradiated with high precision.
此外,吸收濾光器35係配置為使穿透波長選擇濾光器33之光入射,因此可抑制入射於吸收濾光器35之光之量。藉此,可抑制吸收濾光器35之性能劣化,延長吸收濾光器35之壽命。如此,於本構成中,藉由於第一段配置波長選擇濾光器33且於第二段配置吸收濾光器35之多段濾光器構成,可高精度地將照射區域不需要之波長之光遮蔽,並可期待吸收濾光器35之長壽化。 Further, the absorption filter 35 is disposed such that light passing through the wavelength selective filter 33 is incident, so that the amount of light incident on the absorption filter 35 can be suppressed. Thereby, the deterioration of the performance of the absorption filter 35 can be suppressed, and the life of the absorption filter 35 can be prolonged. As described above, in the present configuration, by configuring the wavelength selective filter 33 in the first stage and the multi-segment filter in which the absorption filter 35 is disposed in the second stage, the wavelength of the unnecessary wavelength of the irradiation region can be accurately performed. The shadowing is expected, and the longevity of the absorption filter 35 can be expected.
然而,只要是在能充分地確保吸收濾光器35之壽命之範圍內,也可將吸收濾光器35配置於較波長選擇濾光器33靠直管型燈管12側。根據此構成,由於僅有穿透吸收濾光器35之波長範圍之光入射於波長選擇濾光器33,因此,由吸收濾光器35吸收之波長範圍之光不會照射於工件W。 However, as long as the life of the absorption filter 35 can be sufficiently ensured, the absorption filter 35 can be disposed on the side of the straight tube type bulb 12 of the wavelength selection filter 33. According to this configuration, since only the light of the wavelength range penetrating the absorption filter 35 is incident on the wavelength selective filter 33, the light of the wavelength range absorbed by the absorption filter 35 is not irradiated onto the workpiece W.
此外,由於具備反射鏡單元13,利用反射鏡單元13對直管型燈管12之光進行反射,以使此光在包含傾斜之入射角度之角度範圍內入射於波長選擇濾光器33,因此可一面使用反射鏡單元13來提高光之利用效率,一面避免因使用反射鏡單元13而傾斜入射並穿透波長選擇濾光器33之不需要之光成分之增加引起之弊病。 Further, since the mirror unit 13 is provided, the light of the straight tube type lamp 12 is reflected by the mirror unit 13 so that the light is incident on the wavelength selective filter 33 within an angular range including the incident angle of inclination, so that The mirror unit 13 can be used while improving the light use efficiency while avoiding the disadvantages caused by an increase in unnecessary light components that are obliquely incident and penetrate the wavelength selective filter 33 by using the mirror unit 13.
此外,將光源即直管型燈管12及波長選擇濾光器33收容於構成外殼體2之箱體,且包含設於此箱體之照射開口之開口部2K,係由具備波長選擇濾光器33及吸收濾光器35之蓋單元31所封塞,因此,可將波長選擇濾光器33及吸收濾光器35單元化而容易進行裝卸。因此,可容易進行波長選擇濾光器33及吸收濾光器35之裝卸或檢修等之保養。此外,由於可藉由蓋單元31將外殼體2與周圍區隔,因此能抑制周圍之熱影響,於外殼體2內形成獨立之冷卻空間,從而可有效率地進行外殼體2內之冷卻。 Further, the straight tube type lamp 12 and the wavelength selective filter 33, which are light sources, are housed in a casing constituting the outer casing 2, and include an opening portion 2K provided in the irradiation opening of the casing, and is provided with wavelength selective filtering. Since the lid unit 31 of the absorbing filter 35 and the absorbing filter 35 are closed, the wavelength selective filter 33 and the absorbing filter 35 can be unitized and can be easily attached and detached. Therefore, maintenance such as attachment or detachment of the wavelength selective filter 33 and the absorption filter 35 can be easily performed. Further, since the outer casing 2 can be separated from the surrounding by the cover unit 31, the surrounding heat can be suppressed, and an independent cooling space can be formed in the outer casing 2, whereby the cooling in the outer casing 2 can be efficiently performed.
此外,蓋單元31係於波長選擇濾光器33與吸收濾光器35之間,介設對不穿透配置於光源側之一濾光器(波長選擇濾光器33)而入射於另一濾光器(吸收濾光器35)之光進行遮光之襯墊34,因此,可抑制通過光源側之濾光器(波長選擇濾光器33)之照射區域不需要之光被照射於照射區域、及吸收濾光器35之性能劣化。此外,由於介設有襯墊34,因此可確實地將波長選擇濾光器33與 吸收濾光器35間隔一間隙加以配置,可抑制濾光器33、35彼此之接觸等。 Further, the cover unit 31 is disposed between the wavelength selective filter 33 and the absorption filter 35, and is disposed on the other side of the light source side (wavelength selection filter 33). The light of the filter (absorption filter 35) is shielded by the light-shielding pad 34, so that light that is not required to be irradiated through the light source side filter (wavelength selective filter 33) can be suppressed from being irradiated to the irradiation area. And the performance of the absorption filter 35 is deteriorated. In addition, since the spacer 34 is interposed, the wavelength selective filter 33 can be surely The absorption filters 35 are disposed with a gap therebetween, and the contact of the filters 33 and 35 with each other can be suppressed.
上述之實施形態,只是本發明之一實施形態例而已,只要於不超出本發明之實質內容之範圍內,即可任意地變形及應用。例如,對將波長選擇濾光器33及吸收濾光器35一體構成於蓋單元31之情況進行了說明,但不限於此,也可將各濾光器33、35之任一者或兩者配置於與蓋單元31不同之位置。亦即,只要將各濾光器33、35配置為使穿透波長選擇濾光器33及吸收濾光器35之光照射於照射區域即可。此外,也可於吸收濾光器35之表面設置防反射膜,以抑制由吸收濾光器35反射之光成分。 The above-described embodiments are merely examples of the embodiments of the present invention, and may be arbitrarily modified and applied without departing from the spirit and scope of the invention. For example, although the case where the wavelength selection filter 33 and the absorption filter 35 are integrally formed in the cover unit 31 has been described, the present invention is not limited thereto, and either or both of the filters 33 and 35 may be used. It is disposed at a different position from the cover unit 31. In other words, each of the filters 33 and 35 may be disposed such that light passing through the wavelength selective filter 33 and the absorption filter 35 is irradiated onto the irradiation region. Further, an anti-reflection film may be provided on the surface of the absorption filter 35 to suppress the light component reflected by the absorption filter 35.
此外,對設為波長選擇濾光器33及吸收濾光器35之二段濾光器構成之情況進行了說明,但也可將其他之光學濾光器配置於光源側或與光源相反之側,設為三段以上之濾光器構成。然而,根據確保光透射率之觀點,上述二段濾光器構成最有利。 Further, although the configuration of the two-stage filter which is the wavelength selection filter 33 and the absorption filter 35 has been described, other optical filters may be disposed on the light source side or on the opposite side of the light source. It is composed of three or more filters. However, the above two-stage filter is most advantageous in terms of ensuring light transmittance.
此外,光照射裝置1之光源,也可採用將各管軸同軸串聯排列而構成2根以上之直管型燈管者。此外,也可採用排列配置LED等之發光元件之光源。 Further, the light source of the light irradiation device 1 may be a straight tube type lamp in which two or more tube axes are coaxially arranged in series to form two or more tubes. Further, a light source in which light-emitting elements such as LEDs are arranged may be employed.
11‧‧‧照射單元 11‧‧‧Irradiation unit
12‧‧‧直管型燈管(光源) 12‧‧‧ Straight tube type lamp (light source)
13‧‧‧反射鏡單元 13‧‧‧Mirror unit
15‧‧‧燈收容箱 15‧‧‧light storage box
31‧‧‧蓋單元 31‧‧‧ cover unit
33‧‧‧波長選擇濾光器 33‧‧‧wavelength selection filter
35‧‧‧吸收濾光器 35‧‧‧ absorption filter
W‧‧‧工件(照射區域) W‧‧‧Workpiece (illuminated area)
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JP2015002867A JP6471503B2 (en) | 2015-01-09 | 2015-01-09 | Light irradiation device |
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JP6471503B2 (en) | 2019-02-20 |
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