TW201623511A - Protection of new electro-conductors based on nano-sized metals using direct bonding with optically clear adhesives - Google Patents

Protection of new electro-conductors based on nano-sized metals using direct bonding with optically clear adhesives Download PDF

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TW201623511A
TW201623511A TW104128853A TW104128853A TW201623511A TW 201623511 A TW201623511 A TW 201623511A TW 104128853 A TW104128853 A TW 104128853A TW 104128853 A TW104128853 A TW 104128853A TW 201623511 A TW201623511 A TW 201623511A
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adhesive composition
metal
electrical conductor
additive
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張瑩
可琳 伊莉莎白 利普斯科恩
亞伯特 依華 艾維瑞茲
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3M新設資產公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
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    • C09J9/02Electrically-conducting adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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    • HELECTRICITY
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Abstract

The present invention is an adhesive composition for stabilizing an electrical conductor. The adhesive composition includes a base polymer and an additive to interfere with photo-oxidation of metals. When the adhesive composition is in contact with the electrical conductor, the electrical conductor has less than about a 20% change in electrical resistance over a period of about 500 hours of light exposure.

Description

用光學清透黏著劑直接接合以保護基於奈米大小金屬的新電導體 Direct bonding with optical clear adhesive to protect new electrical conductors based on nano-sized metals

本發明係關於光學清透黏著劑組成物(optically clear adhesive composition)。具體而言,本發明係關於可穩定電導體之光學清透黏著劑組成物。 This invention relates to an optically clear adhesive composition. In particular, the present invention relates to optical clear adhesive compositions that stabilize electrical conductors.

在過去幾十年間,透明導電膜已經廣泛使用於例如觸控面板顯示器、液晶顯示器、電發光(electroluminescent)照明、有機發光二極體裝置、以及太陽光電電池(photovoltaic solar cell)等應用中。以氧化銦錫(indium tin oxide,ITO)為基底的透明導電膜係大多數應用的選擇。然而,以ITO為基底的透明導電膜受限於高成本、對複雜而昂貴的設備及製程的需要、相對(對比純金屬)高的電阻、以及本身具有的脆度及碎裂的傾向;尤其當沉積在可撓性基材上時。近年來以金屬奈米粒子、奈米棒、及奈米線為基底的新導體在技術上已有顯著的進步,且印刷圖案、隨機圖案(以將可見度及波紋最小化)、以及(得自奈米大小的金屬材料的)金屬網目對電子產業變得有吸引力多了。以銀及銅為基底的金屬導體可能是最常見的。具體的實例為銀奈 米線(silver nanowires,SNWs)。以SNW為基底的膜以一適中的成本給予高導電率、高光透射度、較優的可撓性及延展性,這使其等在許多應用中成為ITO的一所欲替代品;尤其對較薄及較具可撓性的裝置而言。 In the past several decades, transparent conductive films have been widely used in applications such as touch panel displays, liquid crystal displays, electroluminescent illumination, organic light emitting diode devices, and photovoltaic solar cells. A transparent conductive film based on indium tin oxide (ITO) is the most suitable choice for applications. However, ITO-based transparent conductive films are limited by the high cost, the need for complex and expensive equipment and processes, the relative (higher contrast metal) resistance, and the tendency to have brittleness and chipping; When deposited on a flexible substrate. In recent years, new conductors based on metal nanoparticles, nanorods, and nanowires have made significant advances in technology, with printed patterns, random patterns (to minimize visibility and ripple), and (from The metal mesh of nano-sized metal materials has become much more attractive to the electronics industry. Metal conductors based on silver and copper are probably the most common. A specific example is Yinnai. Silver nanowires (SNWs). The SNW-based film imparts high conductivity, high light transmission, superior flexibility and ductility at a moderate cost, making it a desirable alternative to ITO in many applications; Thin and more flexible devices.

然而,要讓SNW長時間保持穩定的挑戰性非常高,因為其等對光線及環境曝光可係敏感的。有一此類實例,即SNW基底觸控面板在一顯示器之瀏覽區及/或靠近墨邊(ink edge,顯示器周圍的黑或白墨邊)處之導電軌跡因UV而起的分解。此分解可導致導電率的一突然耗損,且因此亦耗損觸控面板的功能,可能係因SNW之光氧化而起。有些文獻指出銀之所謂的電漿子共振可對氧化銀促成銀氧化。 However, the challenge of keeping SNW stable for long periods of time is very high because it is sensitive to light and ambient exposure. One such example is the decomposition of the conductive track of the SNW base touch panel at the viewing area of the display and/or near the ink edge (black or white ink edge around the display) due to UV. This decomposition can result in a sudden loss in conductivity and, therefore, the function of the touch panel, possibly due to oxidation of the light of the SNW. Some literature indicates that silver's so-called plasmonic resonance can promote silver oxidation of silver oxide.

在一項實施例中,本發明係一種用於將一電導體穩定之黏著劑組成物。該黏著劑組成物包括一基底聚合物及用以干擾金屬光氧化的一添加劑。當該電導體上塗布有該黏著劑組成物,該電導體之電阻在約500小時之一曝光期間具有少於約20%的改變。 In one embodiment, the invention is an adhesive composition for stabilizing an electrical conductor. The adhesive composition includes a base polymer and an additive for interfering with photooxidation of the metal. When the electrical conductor is coated with the adhesive composition, the electrical resistance of the electrical conductor has a change of less than about 20% during one exposure of about 500 hours.

在另一項實施例中,本發明係一種用於穩定一電導體之方法。該方法包括提供一黏著劑組成物及將該黏著劑組成物塗布於該電導體上。該黏著劑組成物包括一基底聚合物及用以干擾或阻止電導體之氧化的一添加劑。當該電導體上塗布有該黏著劑組成物,該電導體之電阻在約500小時之一曝光期間具有少於約20%的改變。 In another embodiment, the invention is a method for stabilizing an electrical conductor. The method includes providing an adhesive composition and applying the adhesive composition to the electrical conductor. The adhesive composition includes a base polymer and an additive to interfere with or prevent oxidation of the electrical conductor. When the electrical conductor is coated with the adhesive composition, the electrical resistance of the electrical conductor has a change of less than about 20% during one exposure of about 500 hours.

100‧‧‧測試試料 100‧‧‧Test materials

102‧‧‧銀奈米線;SNW塗層 102‧‧‧Silver nanowire; SNW coating

104‧‧‧聚酯膜;PET膜 104‧‧‧ polyester film; PET film

106‧‧‧光學清透黏著劑條;OCA條 106‧‧‧Optical clear adhesive strip; OCA strip

108‧‧‧顯微鏡載玻片;載玻片 108‧‧‧Microscope slides; slides

110‧‧‧黑色絕緣膠帶;黑色膠帶 110‧‧‧Black insulating tape; black tape

圖1A係一構造樣品的俯視圖,該構造樣品係用於測量一銀奈米線膜之電阻的改變。 Figure 1A is a top plan view of a construction sample used to measure the change in electrical resistance of a silver nanowire film.

圖1B係圖1A之構造樣品的側視圖,該構造樣品係用於測量一銀奈米線膜之電阻的改變。 Figure 1B is a side elevational view of the construction sample of Figure 1A for measuring the change in electrical resistance of a silver nanowire film.

這些圖未依比例繪製,而且僅意圖用於說明的目的。 These figures are not drawn to scale and are intended for purposes of illustration only.

本發明係一光學清透黏著劑(OCA)組成物,其在多種情況下(即便沒有紫外線(UV)或可見光保護塗層)為奈米線感測器提供穩定性。該光學清透黏著劑組成物包括一基底聚合物及干擾金屬光氧化的添加劑。該基底聚合物可係選自任何光學清透黏著劑聚合物。合適之黏著劑的實例包括抗氧化劑、金屬錯合劑、還原劑、兼可還原及錯合金屬之材料、及其組合。本發明之OCA可基於用於(例如)觸控螢幕、電磁遮蔽、光電板、金屬網目、窗戶之透明加熱線圖案等的金屬奈米粒子、奈米棒、及奈米線以穩定電導體。暴露至UV及可見光時,這些金屬導體可易於分解,導致導電率之耗損。藉由將本發明之OCA直接施加於導體上,可避免高價的保護塗層(即,barriers、UV阻斷)且可簡化物件之裝配程序。本發明亦涵蓋使用方法及含有此類與該等金屬導體接觸之OCA的物件。 The present invention is an optical clear adhesive (OCA) composition that provides stability to nanowire sensors in a variety of situations, even without ultraviolet (UV) or visible light protective coatings. The optical clear adhesive composition comprises a base polymer and an additive that interferes with photooxidation of the metal. The base polymer can be selected from any optical clear adhesive polymer. Examples of suitable adhesives include antioxidants, metal complexing agents, reducing agents, materials that are both reducible and miscible metals, and combinations thereof. The OCA of the present invention can be based on metal nanoparticles, nanorods, and nanowires for, for example, touch screens, electromagnetic shielding, photovoltaic panels, metal mesh, transparent heating line patterns of windows, etc. to stabilize electrical conductors. When exposed to UV and visible light, these metal conductors can be easily decomposed, resulting in loss of electrical conductivity. By applying the OCA of the present invention directly to the conductor, expensive protective coatings (i.e., barriers, UV blocking) can be avoided and the assembly process of the article can be simplified. The invention also encompasses methods of use and articles containing such OCA in contact with the metallic conductors.

本發明之光學清透黏著劑組成物的本質可係壓敏的或熱活化的。類似地,其等可作為一膜黏著劑施加、直接作為一熱熔分配、或作為一液態OCA施加及在最後裝配時固化。 The nature of the optical clear adhesive composition of the present invention may be pressure sensitive or heat activated. Similarly, they can be applied as a film adhesive, directly as a hot melt dispensing, or as a liquid OCA application and as a final assembly.

本發明之黏著劑組成物包括一基底聚合物。雖然從丙烯酸基底聚合物(尤其一隨機的(甲基)丙烯酸共聚物)衍生出的黏著劑組成物因其適中的成本及廣泛的可得性而係較佳的,但亦可使用其他的聚合物作為黏著劑組成物之間質而不脫離本發明之所欲範疇。其他聚合物之實例包括但不限於:聚酯、聚胺基甲酸酯、聚脲、聚醯胺、聚矽氧、聚烯、丙烯酸嵌段共聚物(acrylic block copolymer)、橡膠嵌段共聚物(即,聚苯乙烯-聚異戊二烯-聚苯乙烯(SIS)、聚苯乙烯-聚(乙烯丁烯)-聚苯乙烯(SEBS)、聚苯乙烯-聚(乙烯丙烯)-聚苯乙烯(SEPS)等)、及其組合。在取得光學清透摻合物時,亦可使用這些聚合物的混合物(包括該等(甲基)丙烯酸酯)。 The adhesive composition of the present invention comprises a base polymer. Although an adhesive composition derived from an acrylic base polymer (especially a random (meth)acrylic copolymer) is preferred for its moderate cost and wide availability, other polymerizations may be used. The material acts as an adhesive composition without departing from the intended scope of the invention. Examples of other polymers include, but are not limited to, polyesters, polyurethanes, polyureas, polyamines, polyoxyxides, polyolefins, acrylic block copolymers, rubber block copolymers. (ie, polystyrene-polyisoprene-polystyrene (SIS), polystyrene-poly(ethylene butene)-polystyrene (SEBS), polystyrene-poly(ethylene propylene)-polyphenylene Ethylene (SEPS), etc., and combinations thereof. Mixtures of these polymers, including such (meth) acrylates, can also be used in obtaining optical clear blends.

該等聚合物可係可商購的、或可藉由習用手段聚合,該等習用手段包括溶液聚合法、熱整體聚合法、加成聚合法、開環聚合法、乳化聚合法、UV或可見光觸發整體聚合法、以及縮合聚合法。 The polymers may be commercially available or may be polymerized by conventional means including solution polymerization, thermal bulk polymerization, addition polymerization, ring opening polymerization, emulsion polymerization, UV or visible light. The overall polymerization method and the condensation polymerization method are triggered.

本發明之黏著劑組成物亦包括至少一干擾光氧化的添加劑。該等添加劑作用以干擾或預防金屬導體在暴露於UV光時之氧化。因此合適的添加劑係彼等干擾金屬光氧化者。干擾金屬光氧化之合適添加劑的實例包括但不限於:金屬錯合材料、抗氧化劑、還原劑、金屬錯合及還原材料及其組合。 The adhesive composition of the present invention also includes at least one additive that interferes with photooxidation. These additives act to interfere with or prevent oxidation of the metal conductor upon exposure to UV light. Suitable additives are therefore those which interfere with the photooxidation of the metal. Examples of suitable additives that interfere with metal photooxidation include, but are not limited to, metal miscible materials, antioxidants, reducing agents, metal mismatching and reducing materials, and combinations thereof.

金屬錯合劑這種材料可遷移到金屬導體的表面上,並與該表面形成將該劑接合至該表面之一錯合物。不受限於理論,一般相信在這樣做的過程中,該添加劑可預防水分及氧氣進入金屬表面,降低或消除溶解掉任何經氧化物種的風險。合適之錯合劑的實例包括但 不限於羧酸(例如氫化肉桂酸或檸檬酸酯)。亦可使用天然的化合物(例如抗壞血酸),只要其可溶於該黏著劑間質。 Metal Misc. This material can migrate to the surface of the metal conductor and form a complex with the surface that bonds the agent to the surface. Without being bound by theory, it is believed that in doing so, the additive prevents moisture and oxygen from entering the metal surface, reducing or eliminating the risk of dissolving any oxide species. Examples of suitable complexing agents include but It is not limited to a carboxylic acid (for example, hydrogenated cinnamic acid or citrate). Natural compounds such as ascorbic acid can also be used as long as they are soluble in the adhesive interstitial.

抗氧化劑作用以干擾光化學起始之分解反應且因此抑制電導體之氧化。雖然已知抗氧化劑會干擾氧化過程,但其等與易於氧化的金屬導體(例如奈米粒子、奈米棒或奈米線)並用的做法之前並非先前技術中已知的。合適之抗氧化劑的實例係彼等以Irganox之商標名稱販售者(即,Irganox 1010、Irganox 1024及Irganox 1076),可得自位於Florham Park,New Jersey的BASF,或可以Cyanox得自位於Woodland Park,New Jersey的CYTEC。亦可使用天然的抗氧化劑(例如抗壞血酸),只要其可溶於該黏著劑間質。 The antioxidant acts to interfere with the photochemical initiation of the decomposition reaction and thus inhibits oxidation of the electrical conductor. While antioxidants are known to interfere with the oxidation process, their use in conjunction with readily oxidizable metal conductors (e.g., nanoparticles, nanorods, or nanowires) has not been previously known in the prior art. Examples of suitable antioxidants are those sold under the trade name Irganox (i.e., Irganox 1010, Irganox 1024, and Irganox 1076) available from BASF, Florham Park, New Jersey, or Cyanox, available from Woodland Park. CYTEC, New Jersey. Natural antioxidants such as ascorbic acid can also be used as long as they are soluble in the adhesive interstitial.

還原劑至少可以兩種方式干擾金屬導體之氧化。還原劑可與將金屬氧化成一金屬氧化物之氧物種反應及/或其等可很快地將金屬氧化物還原至金屬狀態,使該金屬得到保存且該金屬氧化物無法溶解及從該金屬移除,使電導率得到維護。不受理論限制,一般認為在一些情況下,這些化合物較佳地吸附在金屬表面上,使其等可能比還原劑更有效。合適之還原劑的額外實例包括係具有相對低的氧化電位之有機分子的化合物,例如膦及不飽和及多不飽和酸等。實例包括但不限於:亞麻仁油酸、油酸、次亞麻油酸、肉桂酸、桂皮醯基醇、香草醇、香茅醇、香茅醛、檸檬醛、以及肉桂醛。可使用例如一烯蒎(pinene)及檸檬油精的萜烯類。亦可使用不飽和松香酸及松香酸(例如松脂酸)。在一些情況下,還原劑可經共聚合。合適之共聚合添加劑的一個實例係香茅基丙烯酸酯。 The reducing agent can interfere with the oxidation of the metal conductor in at least two ways. The reducing agent can react with an oxygen species that oxidizes the metal to a metal oxide and/or the like can quickly reduce the metal oxide to a metallic state, allowing the metal to be preserved and the metal oxide to be insoluble and removed from the metal In addition, the conductivity is maintained. Without being bound by theory, it is believed that in some cases, these compounds are preferably adsorbed onto the metal surface such that they may be more effective than the reducing agent. Additional examples of suitable reducing agents include compounds which are organic molecules having a relatively low oxidation potential, such as phosphines and unsaturated and polyunsaturated acids and the like. Examples include, but are not limited to, linseed oleic acid, oleic acid, linoleic acid, cinnamic acid, cinnamyl alcohol, vanillyl alcohol, citronellol, citronellal, citral, and cinnamaldehyde. Terpenes such as a pinene and limonene can be used. Unsaturated rosin acids and abietic acids (such as rosin acid) can also be used. In some cases, the reducing agent can be copolymerized. One example of a suitable copolymerization additive is citronellyl acrylate.

金屬錯合及還原材料作用為一金屬錯合材料及一還原劑,如上所述。具有羧酸基的化合物可係此類材料之一者,且係合適用於本發明之黏著劑組成物中。合適之金屬錯合及還原材料的實例包括但不限於不飽和及多不飽和酸,例如亞麻仁油酸、油酸、次亞麻油酸、以及肉桂酸。 The metal mismatch and reduction material acts as a metal miscible material and a reducing agent, as described above. The compound having a carboxylic acid group may be one of such materials, and is suitably used in the adhesive composition of the present invention. Examples of suitable metal miscible and reducing materials include, but are not limited to, unsaturated and polyunsaturated acids such as linoleic acid, oleic acid, linoleic acid, and cinnamic acid.

黏著劑組成物中所需之添加劑的最小量取決於環境暴露狀況及將可容許之電阻變化量。在一項實施例中,該等添加劑係以乾燥黏著劑塗層之約5重量%或更少的量存在於該黏著劑組成物中。在一項實施例中,該等添加劑係以至少約0.1重量%存在於該黏著劑組成物中。在一項實施例中,該等添加劑係以介於約0.5及約3間之重量%存在於該黏著劑組成物中。 The minimum amount of additive required in the adhesive composition will depend on the environmental exposure and the amount of electrical resistance that will be tolerated. In one embodiment, the additives are present in the adhesive composition in an amount of about 5% by weight or less of the dry adhesive coating. In one embodiment, the additives are present in the adhesive composition at a level of at least about 0.1% by weight. In one embodiment, the additives are present in the adhesive composition at between about 0.5 and about 3 weight percent.

該添加劑顯著地改善導體在接觸光學清透黏著劑時之穩定性,即便在相當強烈的光照之下。穩定性係藉由電阻在一段特定時間內之變化來測定。不受理論限制,一般相信穩定化會干擾光氧化的過程。在一項實施例中,塗布或層壓本發明之黏著劑組成物的電導體之電阻在一段約三周(500小時)的時間內,電阻將有一小於約20%的改變,具體地小於約10%且更具體地小於約5%。 This additive significantly improves the stability of the conductor when it comes into contact with optically clear adhesives, even under fairly intense light. Stability is determined by the change in resistance over a specified period of time. Without being bound by theory, it is generally believed that stabilization can interfere with the process of photooxidation. In one embodiment, the electrical resistance of the electrical conductor of the adhesive composition of the present invention is coated or laminated for a period of about three weeks (500 hours), and the electrical resistance will have a change of less than about 20%, specifically less than about 10% and more specifically less than about 5%.

由於黏著劑組成物必須係光學清透的,該等添加劑應係可混溶於該黏著劑間質中的,使其對該黏著劑組成物之光學性質具有最小的影響或不具有影響,以使最終的配方保有其光學清透特性。「光學清透(optically clear)」意指具有至少約90%之高可見光透射性、不多於約2%的低霧度(haze)且亦係中性色彩(color neutral)及無白 化(non-whitening)。然而,在一些情況下(例如漫射黏著劑),光學要求可能不那麼嚴格。雖然黏著劑組成物在本說明書全文中主要經敘述為一光學清透黏著劑,但相同的添加劑亦可用於(例如)直接接觸金屬導體的光阻中,或作為奈米大小金屬粒子分散本身的一部分,例如銀奈米線墨。 Since the adhesive composition must be optically clear, the additives should be miscible in the adhesive interstitial to have minimal or no effect on the optical properties of the adhesive composition. The final formulation retains its optical clarity. "Optically clear" means having a high visible light transmission of at least about 90%, a haze of no more than about 2%, and also a neutral color and no whiteness. Non-whitening. However, in some cases (such as diffusing adhesives), the optical requirements may be less stringent. Although the adhesive composition is primarily described as an optical clear adhesive throughout the specification, the same additives may be used, for example, in direct contact with the photoresist of a metal conductor, or as a dispersion of nanosized metal particles themselves. Part of it, for example, silver nanowire ink.

該等添加劑亦必須不影響使用該黏著劑組成物之顯示器總成的機械耐久性(mechanical durability)。在一項實施例中,該黏著劑組成物在20分鐘或72小時之停靠時間(dwell time)後之180度剝離力(180 degree peel force)超過至少約30oz/吋,具體地超過至少約40oz/吋且更具體地超過至少約50oz/吋。該等添加劑應亦係可溶於該黏著劑間質中的。 These additives must also not affect the mechanical durability of the display assembly using the adhesive composition. In one embodiment, the adhesive composition has a 180 degree peel force after a dwell time of 20 minutes or 72 hours of at least about 30 oz/吋, specifically more than at least about 40 oz. /吋 and more specifically at least about 50 oz/吋. These additives should also be soluble in the adhesive interstitial.

取決於用於製作黏著劑組成物的製程,該等添加劑亦可係必須相容於用於生產黏著劑組成物之聚合、塗布、及固化程序。舉例而言,絕不可對UV聚合或固化程序有顯著的阻滯或干擾。在一些實施例中,該等添加劑在一溶劑中或熱熔塗布程序中亦必須係非揮發性的。 Depending on the process used to make the adhesive composition, the additives may also be compatible with the polymerization, coating, and curing procedures used to produce the adhesive composition. For example, there must be no significant blockage or interference with the UV polymerization or curing process. In some embodiments, the additives must also be non-volatile in a solvent or hot melt coating procedure.

在一項實施例中,為了改善環境耐久性,該黏著劑組成物亦包括一交聯劑。該黏著劑組成物之該等聚合物可經使用所屬技術領域中熟知的方法交聯,包括(例如)物理交聯(如高Tg接枝(graft)或嵌段(block)、硬段、小微晶等)、離子性交聯(ionic crosslinking)(例如羧酸與一金屬離子或酸/鹼類型交聯)、以及共價交聯(例如多官能氮丙啶與羧酸、三聚氰胺與羧酸、多官能(甲基)丙烯酸酯之共聚 合作用、以及例如與二苯甲酮或蒽醌化合物之脫氫(hydrogen abstraction)機制)。 In one embodiment, to improve environmental durability, the adhesive composition also includes a crosslinking agent. The polymers of the adhesive composition can be crosslinked by methods well known in the art including, for example, physical crosslinking (e.g., high Tg graft or block, hard segment, small). Microcrystalline, etc.), ionic crosslinking (eg, carboxylic acid cross-linking with a metal ion or acid/base type), and covalent cross-linking (eg, polyfunctional aziridine with carboxylic acid, melamine, and carboxylic acid, Copolymerization of polyfunctional (meth) acrylate For cooperation, and for example, a hydrogen abstraction mechanism with a benzophenone or a hydrazine compound.

本發明提出一迅速浮現之需求,即保護從奈米大小金屬(例如銀及銅)衍生出的新電導體。基底聚合物與干擾金屬之光氧化的添加劑的結合不僅為這些導體提供環境保護,且其等大部分亦與UV固化程序相容,包括用於液體OCA者、可用於導體之圖案的一些光阻、以及用於生產OCA之單網聚合程序(one-web polymerization process)。 The present invention addresses the need for a rapid emergence to protect new electrical conductors derived from nano-sized metals such as silver and copper. The combination of a base polymer and an additive that interferes with the photooxidation of the metal not only provides environmental protection for these conductors, but is also largely compatible with UV curing procedures, including some photoresists for liquid OCA, patterns that can be used for conductors. And a one-web polymerization process for producing OCA.

實例Instance

本發明在以下實例中被更具體地描述,該等實例只意圖作為說明,因為在本發明範圍內的許多改變和變化對於所屬技術領域中具有通常知識者而言將是顯而易見的。除非另有指明,否則在下面實例中被記述的所有份數、百分比、及比率都是以重量計。 The invention is described in more detail in the following examples, which are intended to be illustrative only, as many variations and modifications within the scope of the invention will be apparent to those skilled in the art. All parts, percentages, and ratios recited in the examples below are by weight unless otherwise indicated.

材料:所用材料係取自下列供應商。 Materials: The materials used were taken from the following suppliers.

測試試料之製備Preparation of test samples

圖1A及圖1B分別顯示測試試料100之俯視圖及側視圖,其等表示用於測量銀奈米線膜之電阻的改變之一結構範例。銀奈米線102(SNW)係以在聚酯(PET)膜104上塗布銀墨(Cambrios Technologies Corporation,Sunnyvale,CA)製成。該塗布片材之電阻一般係約50歐姆/sq。從一塊2吋乘3吋之光學清透黏著劑(OCA)條106的一側移除離型襯墊,並放置該OCA條使其直接接觸PET膜104塗布有銀奈米線102之側。將OCA條106以小型橡膠手動滾筒(hand roll)滾動四回固定,確保沒有氣泡包埋在OCA106及SNW塗層102之間。將第二襯墊從該OCA移除,並將該OCA/銀奈米線膜總成層壓至一2吋乘3吋之顯微鏡載玻片108上。如圖1所示,與該OCA/銀奈米線膜總成相對的載玻片108有一半被黑色絕緣膠帶110覆蓋,而另一半則保持開放。以一氙弧燈(xenon arc lamp)從覆蓋膠帶的一側照射測試試料100,以使光線通過該玻璃或經黑色膠帶110阻隔。 1A and 1B respectively show a plan view and a side view of the test sample 100, which show an example of a structure for measuring the change in the resistance of the silver nanowire film. Silver nanowire 102 (SNW) was made by coating silver ink (Cambrios Technologies Corporation, Sunnyvale, CA) on polyester (PET) film 104. The resistance of the coated sheet is typically about 50 ohms/sq. The release liner is removed from one side of a 2 inch by 3 inch optical clearing adhesive (OCA) strip 106 and placed in direct contact with the side of the PET film 104 coated with the silver nanowire 102. The OCA strip 106 was rolled four times with a small rubber hand roll to ensure that no air bubbles were embedded between the OCA 106 and the SNW coating 102. The second liner was removed from the OCA and the OCA/silver nanowire film assembly was laminated to a 2 inch by 3 inch microscope slide 108. As shown in Figure 1, half of the slides 108 opposite the OCA/silver nanowire film assembly are covered by a black insulating tape 110 while the other half remains open. The test sample 100 is irradiated from the side of the cover tape with a xenon arc lamp to allow light to pass through the glass or be blocked by the black tape 110.

方法method 測量銀奈米線膜之電阻改變的方法Method for measuring resistance change of silver nanowire film

使用一Delcom 707傳導監測器(Delcom Instruments,Inc.,Minneapolis,MN)在測試試料的三個圈起來的不同區域測量電阻改變,測試結果摘要於表1至表5中。在表1至表5中,被黑色絕緣膠帶完全覆蓋的銀奈米線之測量係以「無光」指稱,被黑色絕緣膠帶部分覆蓋的銀奈米線之測量係以「界面」指稱,而完全暴露於氙弧燈的銀奈米線之測量係以「有光」指稱。各圈被測量至少兩次。若量度 有所不同,一般會排除該資料並測試一新的試料。一般認為在曝光500小時後電阻改變小於25%係可接受的性能。「無光」測量係以一內部控制進行,以確保在不存在氙弧燈曝光時該OCA膜與該銀奈米線間沒有不利的交互作用。在「無光」、「界面」或「有光」之任一測量區域中大於25%的電阻改變都被認為是彼測試試料的失效。表中的空白格表示並未收集資料。 Resistance changes were measured in three different zones of the test strip using a Delcom 707 Conductivity Monitor (Delcom Instruments, Inc., Minneapolis, MN), and the results are summarized in Tables 1 through 5. In Tables 1 to 5, the measurement of the silver nanowire completely covered by the black insulating tape is referred to as "no light", and the measurement of the silver nanowire partially covered by the black insulating tape is referred to as "interface", and The measurement of the silver nanowires that are completely exposed to the xenon arc lamp is referred to as "light". Each circle is measured at least twice. If measured Different, this information will generally be excluded and a new sample will be tested. It is believed that a resistance change of less than 25% after 500 hours of exposure is acceptable performance. The "matte" measurement was performed with an internal control to ensure that there was no adverse interaction between the OCA film and the silver nanowire in the absence of xenon arc exposure. A resistance change greater than 25% in any of the "no light", "interface" or "light" measurement areas is considered a failure of the test material. Blank spaces in the table indicate that no data has been collected.

對氙弧燈曝光時間的百分電阻改變係計算如下:%電阻改變=1/(100*(Gt-G0)/G0),其中G0係沒有氙弧燈曝光的初始傳導性,而Gt係在氙弧燈曝光t小時之後的傳導性。氙弧燈曝光狀況的參數如下: The percent resistance change for the exposure time of the xenon arc lamp is calculated as follows: % resistance change = 1 / (100 * (G t - G 0 ) / G 0 ), where G 0 has no initial conductivity of xenon arc exposure, The G t is the conductivity after the exposure of the xenon arc lamp for t hours. The parameters of the xenon arc exposure are as follows:

氙弧燈曝光狀況A的參數為:於340nm之輻射照度0.4W/m2、黑盤溫度(black panel temperature)60℃、氣溫38℃、相對溼度50%。 The parameters of the X-ray lamp exposure condition A are: illuminance at 340 nm of 0.4 W/m 2 , black panel temperature of 60 ° C, temperature of 38 ° C, and relative humidity of 50%.

氙弧燈曝光狀況B的參數為:前300個小時,樣品經暴露於下列狀況:於340nm之輻射照度0.4W/m2、黑盤溫度60℃,在那之後樣品經額外暴露於下列狀況:於340nm之輻射照度0.55W/m2、黑盤溫度70℃、氣溫47℃、相對溼度50%。 The parameters of the X-ray lamp exposure condition B are: for the first 300 hours, the sample was exposed to the following conditions: illuminance at 340 nm 0.4 W/m 2 , black plate temperature 60 ° C, after which the sample was additionally exposed to the following conditions: The illuminance at 340 nm was 0.55 W/m 2 , the temperature at the black disk was 70 ° C, the temperature was 47 ° C, and the relative humidity was 50%.

霧度測量之方法Method of measuring haze

根據ASTM D 1003 92測量霧度。黏著劑實例13的結果摘要於表6。試樣之製備係藉由以異丙醇將LCD玻璃清潔三次並將其以KIMWIPES(Kimberly-Clark Corp.,Neenah,WI)完全乾燥。將各OCA膜切割成足以覆蓋該球體之入口埠的大小。將離型襯墊從一側移 除,且將該OCA膜以小型橡膠手動滾筒滾動四回層壓至該LCD玻璃上。該樣品經視察檢驗以確保其沒有明顯可見的內部空隙、粒子、抓痕、以及瑕疵。在霧度測試前將第二襯墊移除。使用一UltraScan Pro分光光度計(Hunter Associates Laboratory,Inc.,Reston,VA)抵靠LCD玻璃之背景測量霧度。 Haze was measured according to ASTM D 1003 92. The results of Adhesive Example 13 are summarized in Table 6. The samples were prepared by cleaning the LCD glass three times with isopropyl alcohol and completely drying it with KIMWIPES (Kimberly-Clark Corp., Neenah, WI). Each OCA film is cut to a size sufficient to cover the entrance pupil of the sphere. Move the release liner from one side In addition, the OCA film was laminated four times on a small rubber manual roll onto the LCD glass. The sample was inspected to ensure that it has no visible internal voids, particles, scratches, and flaws. The second liner was removed prior to the haze test. Haze was measured against the background of the LCD glass using an UltraScan Pro spectrophotometer (Hunter Associates Laboratory, Inc., Reston, VA).

色度測量之方法Method of chromaticity measurement

根據ASTM E1164 07/CIELAB測量色度。黏著劑實例13的結果摘要於表6。試樣之製備係藉由以異丙醇將LCD玻璃清潔三次並將其以KIMWIPES(Kimberly-Clark Corp.,Neenah,WI)完全乾燥。將各OCA膜切割成足以覆蓋該球體之入口埠的大小。將離型襯墊從一側移除,且將該OCA膜以四回小型橡膠手動滾筒層壓至該LCD玻璃上。該樣品經視察檢驗以確保其沒有明顯可見的內部空隙、粒子、抓痕、以及瑕疵。在色度測試前將第二襯墊移除。使用一UltraScan Pro分光光度計(Hunter Associates Laboratory,Inc.,Reston,VA)抵靠LCD玻璃之背景測量色度。 The color is measured according to ASTM E1164 07/CIELAB. The results of Adhesive Example 13 are summarized in Table 6. The samples were prepared by cleaning the LCD glass three times with isopropyl alcohol and completely drying it with KIMWIPES (Kimberly-Clark Corp., Neenah, WI). Each OCA film is cut to a size sufficient to cover the entrance pupil of the sphere. The release liner was removed from one side and the OCA film was laminated to the LCD glass with a four-times small rubber hand roller. The sample was inspected to ensure that it has no visible internal voids, particles, scratches, and flaws. The second liner was removed prior to the color test. The chromaticity was measured against the background of the LCD glass using an UltraScan Pro spectrophotometer (Hunter Associates Laboratory, Inc., Reston, VA).

耐久性及抗白化之方法Durability and anti-whitening method

從一2吋乘3吋之OCA條移除離型襯墊,將該條施加至一5密耳厚之具底漆聚(對酞酸乙二酯)(PET)膜(Skyrol SH81,SKC Inc)。將該OCA條以小型橡膠手動滾筒滾動四回固定,確保沒有包埋氣泡。將第二襯墊從該OCA條移除,並將該OCA條層壓至一2吋乘 3吋之LCD玻璃或5密耳厚之具底漆PET膜上。將該OCA條以小型橡膠手動滾筒滾動四回固定,確保沒有包埋氣泡。將該等樣品放置於一65℃且相對濕度90%的測試室內,每隔一天查看氣泡或白化的出現。氣泡的形成表示該樣品的耐久性不足。在抗白化方面,將一具有可見白化的樣品從測試室中移除,若白化在移除後3分鐘內消失,則視為通過。黏著劑實例13的結果摘要於表6。 Remove the release liner from a 2 inch by 3 inch OCA strip and apply the strip to a 5 mil thick primer poly(ethylene terephthalate) (PET) film (Skyrol SH81, SKC Inc) ). The OCA strip was rolled four times with a small rubber hand roller to ensure that no air bubbles were buried. Removing the second liner from the OCA strip and laminating the OCA strip to a 2 fold 3 inch LCD glass or 5 mil thick primer PET film. The OCA strip was rolled four times with a small rubber hand roller to ensure that no air bubbles were buried. The samples were placed in a test chamber at 65 ° C and 90% relative humidity, and the appearance of bubbles or whitening was observed every other day. The formation of bubbles indicates insufficient durability of the sample. In terms of anti-whitening, a sample with visible whitening is removed from the test chamber, and if whitening disappears within 3 minutes after removal, it is considered to pass. The results of Adhesive Example 13 are summarized in Table 6.

180度剝離力黏著性測量之方法180 degree peel force adhesion measurement method

修正版ASTM D903-98,180度剝離,12吋/分鐘。以異丙醇將漂浮玻璃清潔三次並將其以KIMWIPES完全乾燥。將一OCA試樣切割成1吋寬乘大約12吋長的尺寸。從一側移除離型襯墊,將該OCA以小型橡膠手動滾筒滾動四回層壓至一2密耳之具底漆PET膜,確保沒有包埋氣泡。將第二襯墊移除,且將該OCA以5 lb手動滾筒滾動三回固定至漂浮玻璃,確保沒有包埋氣泡。在於室溫下分別20分鐘或72小時之停靠時間後(如表6所指明),使用IMASS SP-2000滑動/剝離測試器(IMASS,Inc,Accord,MA)以12吋/分鐘之測試速度測量180度剝離力黏著性。 Modified ASTM D903-98, 180 degree peel, 12 吋 / min. The floating glass was cleaned three times with isopropanol and completely dried with KIMWIPES. An OCA sample was cut to a size of 1 inch wide by about 12 inches long. The release liner was removed from one side and the OCA was rolled four times back to a 2 mil prime PET film with a small rubber hand roller to ensure no embedding of air bubbles. The second liner was removed and the OCA was rolled three times back to the floating glass with a 5 lb hand roller to ensure no embedding bubbles. After 12 minutes or 72 hours of stand-by time at room temperature (as indicated in Table 6), the IMASS SP-2000 Slide/Peel Tester (IMASS, Inc, Accord, MA) was used to measure at 12 吋/min. 180 degree peel adhesion.

配製Formulation 丙烯酸共聚物1Acrylic copolymer 1

製備2-EHA/iBOA/HEA=55/25/20(質量份)之一混合物,且以乙酸乙酯/甲苯(1:1)稀釋該混合物,以得到一50質量%的 單體濃度。接著基於單體質量以一0.15質量%的比率添加Vazo-52作為一起始劑。將該混合物倒入一玻璃瓶中並以氮氣沖洗10分鐘,且接著密封保存於一惰性大氣中。隨後,允許該反應在55℃下恆溫浴中進行6小時。接著將反應溫度增加至75℃額外進行4小時。得到一透明黏性溶液。將此丙烯酸共聚物溶液用於下列實例中而不分離該共聚物。所得之丙烯酸共聚物的重量平均分子量為563,000g/mol,其係以凝膠滲透層析術對聚苯乙烯標準測量。 A mixture of 2-EHA/iBOA/HEA=55/25/20 (parts by mass) was prepared, and the mixture was diluted with ethyl acetate/toluene (1:1) to obtain a 50% by mass. Monomer concentration. Vazo-52 was then added as a starter at a ratio of 0.15 mass% based on the mass of the monomer. The mixture was poured into a glass vial and flushed with nitrogen for 10 minutes and then sealed and stored in an inert atmosphere. Subsequently, the reaction was allowed to proceed in a constant temperature bath at 55 ° C for 6 hours. The reaction temperature was then increased to 75 ° C for an additional 4 hours. A clear viscous solution is obtained. This acrylic copolymer solution was used in the following examples without isolating the copolymer. The resulting acrylic copolymer had a weight average molecular weight of 563,000 g/mol, which was measured by gel permeation chromatography on polystyrene standards.

比較例1Comparative example 1

對於丙烯酸共聚物1,基於乾燥之共聚物質量,分別以0.05及0.4份質量每百分之比率添加KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面經以一50μm厚的RF02N離型膜層壓且於65℃儲放24小時。 For the acrylic copolymer 1, KBM 403 and Desmodur N3300 were added at a ratio of 0.05 and 0.4 parts by mass, respectively, based on the mass of the dried copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and stored at 65 ° C for 24 hours.

比較例2Comparative example 2

使用Darocur 1173(0.02份)、EHA(55份)、iBOA(25份)、及HEA(20份)製備一單體預混物。此混合物經於一富含氮氣之大氣下暴露至紫外線輻射部分聚合,以提供一具有約1000cps(1PaS)之黏度的可塗布漿液。接著將HDDA(0.15份)、KBM-403(0.05份)、及Irgacure 651(0.15份)添加至100份的漿液中。 在混合後,以50μm的厚度將該漿液用刀塗布(knife-coat)於兩個經聚矽氧處理之離型襯墊間(RF02N/RF12N)。接著將得到的經塗布材料暴露於一低強度之紫外線輻射源,該紫外線輻射源在約2J/cm2之總UVA劑量具有300至400nm之一光譜輸出,最大強度為351nm。 A monomer premix was prepared using Darocur 1173 (0.02 parts), EHA (55 parts), iBOA (25 parts), and HEA (20 parts). The mixture was partially polymerized by exposure to ultraviolet radiation in a nitrogen-rich atmosphere to provide a coatable slurry having a viscosity of about 1000 cps (1 PaS). Next, HDDA (0.15 parts), KBM-403 (0.05 parts), and Irgacure 651 (0.15 parts) were added to 100 parts of the slurry. After mixing, the slurry was knife-coated with a thickness of 50 μm between two polyfluorinated release liners (RF02N/RF12N). The resulting coated material is then exposed to a low intensity ultraviolet radiation source having a spectral output of one of 300 to 400 nm at a total UVA dose of about 2 J/cm 2 and a maximum intensity of 351 nm.

黏著劑實例1Adhesive example 1

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加乙醯基三-2-乙基己基、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃下烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, ethyl decyl tri-2-ethylhexyl, KBM 403 and Desmodur N3300 were added in a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例2Adhesive example 2

至丙烯酸共聚物1,基於乾燥之共聚物質量,分別以5、0.05及0.4份質量每百分之比率添加聯三苯膦、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, biphenylphosphine, KBM 403 and Desmodur N3300 were added at a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the dried copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例3Adhesive Example 3

至丙烯酸共聚物1,基於乾燥之共聚物質量,分別以5、0.05及0.4份質量每百分之比率添加氫基桂皮酸、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, hydrogen cinnamic acid, KBM 403 and Desmodur N3300 were added at a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the dried copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例4Adhesive example 4

至丙烯酸共聚物1,基於共聚物之質量,分別以1、0.05及0.4份質量每百分之比率添加Irganox 1076、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, Irganox 1076, KBM 403 and Desmodur N3300 were added at a ratio of 1, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例5Adhesive example 5

至丙烯酸共聚物1,基於共聚物之質量,分別以1、0.05及0.4份質量每百分之比率添加Irganox 1024、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, Irganox 1024, KBM 403 and Desmodur N3300 were added at a ratio of 1, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例6Adhesive Example 6

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加檸檬油精、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, lemon olein, KBM 403 and Desmodur N3300 were added at a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例7Adhesive Example 7

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加β-一烯蒎、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, β-monoolefin, KBM 403 and Desmodur N3300 were added in a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例8Adhesive Example 8

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加桂皮醇、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50 μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, cinnamyl alcohol, KBM 403 and Desmodur N3300 were added at a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the thickness of the PSA is 50 Mm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例9Adhesive Example 9

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加桂皮醛、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, cinnamaldehyde, KBM 403 and Desmodur N3300 were added in a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例10Adhesive Example 10

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加桂皮酸、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, cinnamic acid, KBM 403 and Desmodur N3300 were added in a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例11Adhesive Example 11

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加次亞麻油酸、KBM 403及 Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, based on the mass of the copolymer, adding linolenic acid, KBM 403 and 5, 0.05 and 0.4 parts by mass, respectively. Desmodur N3300. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例12Adhesive Example 12

至丙烯酸共聚物1,基於共聚物之質量,分別以5、0.05及0.4份質量每百分之比率添加松香酸、KBM 403及Desmodur N3300。接著,將該製備之溶液塗布在一50μm厚的RF22N離型膜上,且在70℃的烘箱中乾燥30分鐘。乾燥之後,該PSA之厚度為50μm。接著,此PSA表面被層壓有一50μm厚的RF02N離型膜且於65°老化24小時。 To the acrylic copolymer 1, rosin acid, KBM 403 and Desmodur N3300 were added at a ratio of 5, 0.05 and 0.4 parts by mass, respectively, based on the mass of the copolymer. Next, the prepared solution was coated on a 50 μm thick RF22N release film and dried in an oven at 70 ° C for 30 minutes. After drying, the PSA had a thickness of 50 μm. Next, the PSA surface was laminated with a 50 μm thick RF02N release film and aged at 65° for 24 hours.

黏著劑實例13Adhesive Example 13

使用Darocur 1173(0.02份)、EHA(55份)、iBOA(25份)、及HEA(20份)製備一單體預混物。此混合物經於一富含氮氣之大氣下暴露至紫外線輻射部分聚合,以提供一具有約1000cps(1PaS)之黏度的可塗布漿液。接著將HDDA(0.15份)、KBM-403(0.05份)、Irganox 1024(1份)、及Irgacure 651(0.15份)添加至100份的該漿液中,且在混合後將其以50μm的厚度用刀塗布於二個經聚矽氧處理的離型襯墊(RF02N/RF12N)間。接著將得到的經塗布材料暴露於一低強度之紫外線輻射源,該紫外線輻射源在約2 J/cm2之總UVA劑量具有300至400nm之一光譜輸出,最大強度為351nm。 A monomer premix was prepared using Darocur 1173 (0.02 parts), EHA (55 parts), iBOA (25 parts), and HEA (20 parts). The mixture was partially polymerized by exposure to ultraviolet radiation in a nitrogen-rich atmosphere to provide a coatable slurry having a viscosity of about 1000 cps (1 PaS). Next, HDDA (0.15 parts), KBM-403 (0.05 parts), Irganox 1024 (1 part), and Irgacure 651 (0.15 parts) were added to 100 parts of the slurry, and after mixing, it was used in a thickness of 50 μm. The knife was coated between two polyfluorinated release liners (RF02N/RF12N). The resulting coated material is then exposed to a low intensity ultraviolet radiation source having a spectral output of one of 300 to 400 nm at a total UVA dose of about 2 J/cm 2 and a maximum intensity of 351 nm.

黏著劑實例14Adhesive Example 14

將β-香茅醇(300.00g,1.92mol)、己烷(1500mL)、及三乙胺(212.49g,2.10mol)之一混合物於一冰浴中冷卻。將丙烯醯氯(190.08g,2.10mol)逐滴加入達5小時以上。將該混合物在室溫下攪拌17小時並接著過濾。將溶液在真空下濃縮然後用水洗滌。溶劑於真空下被移除以提供一經真空蒸餾而純化的原油。於70至75℃以0.30mmHg收集得一無色的油(香茅基丙烯酸酯282.83g)。 A mixture of β-citronellol (300.00 g, 1.92 mol), hexane (1500 mL), and triethylamine (212.49 g, 2.10 mol) was cooled in an ice bath. Propylene hydrazine chloride (190.08 g, 2.10 mol) was added dropwise over 5 hours. The mixture was stirred at room temperature for 17 hours and then filtered. The solution was concentrated under vacuum and then washed with water. The solvent was removed under vacuum to provide a crude oil that was purified by vacuum distillation. A colorless oil (citronellyl acrylate 282.83 g) was collected at 0.30 mmHg at 70 to 75 °C.

使用Darocur 1173(0.02份)、EHA(55份)、iBOA(25份)、及HEA(20份)製備一單體預混物。此混合物經於一富含氮氣之大氣下暴露至紫外線輻射部分聚合,以提供一具有約1000cps(1PaS)之黏度的可塗布漿液。接著將HDDA(0.15份)、KBM-403(0.05份)、香茅基丙烯酸酯(2份)、及Irgacure 651(0.15份)添加至100份的該漿液中,且在混合後將其以50μm的厚度用刀塗布於二個經聚矽氧處理的離型襯墊(RF02N/RF12N)間。接著將得到的經塗布材料暴露於一低強度之紫外線輻射源,該紫外線輻射源在約2J/cm2之總UVA劑量具有300至400nm之一光譜輸出,最大強度為351nm。 A monomer premix was prepared using Darocur 1173 (0.02 parts), EHA (55 parts), iBOA (25 parts), and HEA (20 parts). The mixture was partially polymerized by exposure to ultraviolet radiation in a nitrogen-rich atmosphere to provide a coatable slurry having a viscosity of about 1000 cps (1 PaS). Next, HDDA (0.15 parts), KBM-403 (0.05 parts), citronella acrylate (2 parts), and Irgacure 651 (0.15 parts) were added to 100 parts of the slurry, and after mixing, they were 50 μm. The thickness was applied by knife to two polyoxygenated release liners (RF02N/RF12N). The resulting coated material is then exposed to a low intensity ultraviolet radiation source having a spectral output of one of 300 to 400 nm at a total UVA dose of about 2 J/cm 2 and a maximum intensity of 351 nm.

表1:將銀奈米線穩定的錯合劑Table 1: Stabilizers for stabilizing silver nanowires

雖然本發明已參照較佳的實施例加以描述,但所屬技術領域中具有通常知識之工作者應能理解形式及細節可改變而不會偏離本發明的精神及範疇。 Although the present invention has been described with reference to the preferred embodiments thereof, those skilled in the art can understand that the form and details can be changed without departing from the spirit and scope of the invention.

100‧‧‧測試試料 100‧‧‧Test materials

102‧‧‧銀奈米線;SNW塗層 102‧‧‧Silver nanowire; SNW coating

108‧‧‧顯微鏡載玻片;載玻片 108‧‧‧Microscope slides; slides

110‧‧‧黑色絕緣膠帶;黑色膠帶 110‧‧‧Black insulating tape; black tape

Claims (20)

一種用於穩定一電導體之黏著劑組成物,該黏著劑組成物包含:一基底聚合物;及一添加劑,其用以干擾金屬之光氧化;其中當該電導體接觸該黏著劑組成物時,該電導體之電阻在過約500小時之一曝光期間具有少於約20%的改變。 An adhesive composition for stabilizing an electrical conductor, the adhesive composition comprising: a base polymer; and an additive for interfering with photooxidation of the metal; wherein the electrical conductor contacts the adhesive composition The electrical conductor has a resistance of less than about 20% change during one exposure period of about 500 hours. 如請求項1之黏著劑組成物,其中該添加劑係選自由下列組成之群組:金屬錯合材料、抗氧化劑、還原劑、金屬錯合及還原材料、及其組合。 The adhesive composition of claim 1, wherein the additive is selected from the group consisting of a metal miscible material, an antioxidant, a reducing agent, a metal mismatch and a reducing material, and combinations thereof. 如請求項1之黏著劑組成物,其中該添加劑佔該黏著劑組成物之至多約5重量%。 The adhesive composition of claim 1, wherein the additive comprises up to about 5% by weight of the adhesive composition. 如請求項1之黏著劑組成物,其中該添加劑佔該黏著劑組成物之至少於約0.1重量%。 The adhesive composition of claim 1, wherein the additive comprises at least about 0.1% by weight of the adhesive composition. 如請求項1之黏著劑組成物,其中該添加劑佔該黏著劑組成物之約0.5及約3重量%間。 The adhesive composition of claim 1, wherein the additive comprises between about 0.5 and about 3% by weight of the adhesive composition. 如請求項1之黏著劑組成物,其中該基底聚合物包含下列之一者:聚酯、聚胺基甲酸酯、聚脲、聚醯胺、聚矽氧、聚烯、丙烯酸嵌段共聚物(acrylic block copolymer)、橡膠嵌段共聚物或隨機(甲基)丙烯酸共聚物。 The adhesive composition of claim 1, wherein the base polymer comprises one of the following: polyester, polyurethane, polyurea, polyamine, polyoxyn, polyene, acrylic block copolymer (acrylic block copolymer), rubber block copolymer or random (meth)acrylic copolymer. 如請求項6之黏著劑組成物,其中該基底聚合物係一隨機(甲基)丙烯酸共聚物。 The adhesive composition of claim 6, wherein the base polymer is a random (meth)acrylic copolymer. 如請求項1之黏著劑組成物,其中該等電導體係基於金屬導體。 The adhesive composition of claim 1, wherein the electrically conductive system is based on a metallic conductor. 如請求項8之黏著劑組成物,其中該等金屬導體包含銀或銅。 The adhesive composition of claim 8, wherein the metal conductors comprise silver or copper. 如請求項8之黏著劑組成物,其中該等金屬導體係金屬奈米粒子、奈米棒及奈米線。 The adhesive composition of claim 8, wherein the metal conducting system is a metal nanoparticle, a nanorod, and a nanowire. 如請求項1之黏著劑組成物,其進一步包含一交聯劑。 The adhesive composition of claim 1, which further comprises a crosslinking agent. 如請求項1之黏著劑組成物,其中當該電導體上塗布有該黏著劑組成物時,該電導體之電阻在過約500小時之一曝光期間具有少於約10%的改變。 The adhesive composition of claim 1, wherein when the electrical conductor is coated with the adhesive composition, the electrical resistance of the electrical conductor has a change of less than about 10% during one exposure period of about 500 hours. 一種用於穩定一電導體之方法,該方法包含:提供一黏著劑組成物,其包含:一基底聚合物;及一添加劑,其用於干擾或預防該電導體之氧化;及將該黏著劑組成物塗布或層壓於該電導體上;其中當該電導體上塗布有該黏著劑組成物時,該電導體之電阻在過約500小時之一曝光期間具有少於約20%的改變。 A method for stabilizing an electrical conductor, the method comprising: providing an adhesive composition comprising: a base polymer; and an additive for interfering with or preventing oxidation of the electrical conductor; and the adhesive The composition is coated or laminated to the electrical conductor; wherein when the electrical conductor is coated with the adhesive composition, the electrical conductor has a resistance of less than about 20% change during one exposure period of about 500 hours. 如請求項13之方法,其中該添加劑係選自由下列組成之群組:金屬錯合材料、抗氧化劑、還原劑、金屬錯合及還原材料、及其組合。 The method of claim 13, wherein the additive is selected from the group consisting of a metal miscible material, an antioxidant, a reducing agent, a metal mismatch and a reducing material, and combinations thereof. 如請求項13之方法,其中該添加劑佔該黏著劑組成物之約0.1及約5重量%間。 The method of claim 13 wherein the additive comprises between about 0.1 and about 5% by weight of the adhesive composition. 如請求項13之方法,其中該基底聚合物包含下列之一者:聚酯、聚胺基甲酸酯、聚脲、聚醯胺、聚矽氧、聚烯、丙烯酸嵌段共聚物、橡膠嵌段共聚物或隨機(甲基)丙烯酸共聚物。 The method of claim 13, wherein the base polymer comprises one of the following: polyester, polyurethane, polyurea, polyamine, polyoxyn, polyene, acrylic block copolymer, rubber embedded Segment copolymer or random (meth)acrylic copolymer. 如請求項13之方法,其中該等電導體係基於金屬導體。 The method of claim 13, wherein the conductivity system is based on a metal conductor. 如請求項17之方法,其中該等金屬導體係金屬奈米粒子、奈米棒及奈米線。 The method of claim 17, wherein the metal conducting system is a metal nanoparticle, a nanorod, and a nanowire. 如請求項13之方法,其進一步包含一交聯劑。 The method of claim 13 further comprising a crosslinking agent. 如請求項13之方法,其中當該電導體上塗布或層壓有該黏著劑組成物時,該電導體之電阻在過約500小時之一曝光期間具有少於約10%的改變。 The method of claim 13, wherein the electrical conductor has a resistance of less than about 10% change during one exposure period of about 500 hours when the adhesive composition is coated or laminated to the electrical conductor.
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