TW201622171A - Electroluminescence and photoluminescence multi-band white light LED - Google Patents

Electroluminescence and photoluminescence multi-band white light LED Download PDF

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TW201622171A
TW201622171A TW103142342A TW103142342A TW201622171A TW 201622171 A TW201622171 A TW 201622171A TW 103142342 A TW103142342 A TW 103142342A TW 103142342 A TW103142342 A TW 103142342A TW 201622171 A TW201622171 A TW 201622171A
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light
photoluminescent
type semiconductor
semiconductor layer
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TWI543394B (en
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Fu-Bang Chen
yan-qin Wang
Wei-Yu Yan
shi-xian Huang
zhi-song Zhang
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High Power Optoelectronics Inc
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Abstract

The invention provides an Electroluminescence and photoluminescence multi-band white light LED, comprising an electroluminescence structure, a first photoluminescence layer, a second photoluminescence layer and a red light-emitting layer. The electroluminescence structure emits a violet light having a wavelength of 395 nm to 450 nm and full width at half maximum (FWHM) that is less than 25 nm. The first photoluminescence layer, the second photoluminescence layer and the red light-emitting layer are disposed sequentially on the electroluminescence structure, and the first photoluminescence layer absorbs the violet light to generate a blue light, the second photoluminescence layer absorbs the violet light and the blue light to generate a green light, and the red light-emitting layer generates a red light. Accordingly, the violet light, blue light, green light, and red light are mixed to form a white light with a highly color-rendering property, capable of meeting the requirements of LCD industry and art light.

Description

電致光與光致光多波段白光發光二極體Electroluminescent and photoluminescent multi-band white light emitting diode

本發明為有關白光發光二極體,尤其關於高演色性之白光發光二極體。The present invention relates to a white light emitting diode, and more particularly to a white color light emitting diode of high color rendering.

請參閱「圖1」所示,為一種習知垂直式發光二極體,其包含組成三明治結構的一N型半導體層1A、一活性層2A與一P型半導體層3A,該P型半導體層3A之下依序形成一基板4A與一P型電極5A,而該N型半導體層1A的表面為供設置一N型電極6A。Referring to FIG. 1 , it is a conventional vertical light-emitting diode comprising an N-type semiconductor layer 1A constituting a sandwich structure, an active layer 2A and a P-type semiconductor layer 3A, and the P-type semiconductor layer. A substrate 4A and a P-type electrode 5A are sequentially formed under 3A, and an N-type electrode 6A is provided on the surface of the N-type semiconductor layer 1A.

據此於該N型電極6A與該P型電極5A之間施予順向偏壓之後,該N型半導體層1A與該P型半導體層3A分別提供電子與電洞,電子與電洞可以於該活性層2A內結合,進而能階跳躍而產生波長固定的激發光。Accordingly, after the forward bias is applied between the N-type electrode 6A and the P-type electrode 5A, the N-type semiconductor layer 1A and the P-type semiconductor layer 3A respectively provide electrons and holes, and electrons and holes can be used for the activity. The layers 2A are combined to further jump in order to generate excitation light having a fixed wavelength.

請再參閱「圖2」所示,為一種習知水平發光二極體,其同樣包含組成三明治結構的一N型半導體層1B、一活性層2B與一P型半導體層3B,且該N型半導體層1B形成於一基板4B上,並該P型半導體層3B與該N型半導體層1B的同一側分別設置一P型電極5B與一N型電極6B,據此於該N型電極6B與該P型電極5B之間施予電壓之後,電子與電洞可以於該活性層2B內結合而產生激發光。Referring to FIG. 2 again, it is a conventional horizontal light-emitting diode, which also includes an N-type semiconductor layer 1B, an active layer 2B and a P-type semiconductor layer 3B constituting a sandwich structure, and the N-type The semiconductor layer 1B is formed on a substrate 4B, and a P-type electrode 5B and an N-type electrode 6B are respectively disposed on the same side of the P-type semiconductor layer 3B and the N-type semiconductor layer 1B, whereby the N-type electrode 6B is After a voltage is applied between the P-type electrodes 5B, electrons and holes can be combined in the active layer 2B to generate excitation light.

請再參閱「圖3」所示,為美國專利公告第US7223998號「White, single or multi-color light emitting diodes by recycling guided modes」專利,其亦為一種光子循環發光二極體,其主要是包含一氮化物發光二極體9,並在該氮化物發光二極體9上依序堆疊一無參雜半導體層9A、一氮化物光致光活性層9B與一無參雜半導體層9A,其中該氮化物發光二極體9所產生的電激光9C(藍光)會射入該氮化物光致光活性層9B,而產生另一波長的光致光9D(黃光),簡言之,氮化物光致光活性層9B的存在在於產生另一波長的光致光,亦即其目地在於讓多種顏色的光進行混合,其再混合自發紅色發光物質、光激發紅色磷光發光物質或紅色量子點所發出的紅光,即可以產生演色性較佳的白光。Please refer to the patent of US Patent Publication No. US7223998 "White, single or multi-color light emitting diodes by recycling guided modes", which is also a photonic cycle light-emitting diode, which mainly includes a nitride light-emitting diode 9 is sequentially stacked on the nitride light-emitting diode 9 with a non-doped semiconductor layer 9A, a nitride photoactive layer 9B and a non-doped semiconductor layer 9A. The electric laser light 9C (blue light) generated by the nitride light-emitting diode 9 is incident on the nitride photo-photoactive layer 9B to generate another wavelength of photo-induced light 9D (yellow light), in short, nitrogen. The photo-photoactive layer 9B is present in that photo-induced light of another wavelength is produced, that is, the purpose is to mix light of a plurality of colors, which are mixed with a spontaneous red luminescent substance, a photo-excited red phosphorescent substance or a red quantum dot. The red light emitted can produce white light with better color rendering.

顯然,習知技術雖然揭露利用該氮化物光致光活性層9B的存在,吸收電激光9C(藍光),並藉以產生光致光9D(黃光),並加以混合以產生演色性較佳的白光,然而實際白光,為包含紅橙黃綠藍靛紫等顏色,顯然習知技術並未包含部分色彩,其演色性仍然無法滿足真實白光的需求。Obviously, the prior art discloses the use of the presence of the nitride photoactive layer 9B, absorbing the electric laser 9C (blue light), and thereby generating photo-induced light 9D (yellow light), and mixing them to produce a better color rendering property. White light, however, the actual white light, including red orange yellow green blue purple purple and other colors, it is obvious that the conventional technology does not contain part of the color, its color rendering still can not meet the real white light demand.

爰是,本發明的主要目的在於揭露一種白光發光二極體,其具有高度演色性,可以滿足LCD產業以及美術燈的要求。Therefore, the main object of the present invention is to disclose a white light emitting diode which has high color rendering property and can meet the requirements of the LCD industry and art lamps.

基於上述目的,本發明為一種電致光與光致光多波段白光發光二極體,其包含一電致發光結構、一第一光致發光層、一第二光致發光層與一紅色發光層,其中該電致發光結構具有受順向偏壓而發出波長為395奈米到450奈米且半高寬小於25奈米的一紫光之一電致發光活性層、分設於該電致發光活性層兩側的一P型半導體層與一第一N型半導體層,該第一光致發光層間隔該第一N型半導體層設置於該電致發光結構上,且該第一光致發光層吸收該紫光而發出一藍光,該第二光致發光層則間隔一第二N型半導體層設置於該第一光致發光層上,且該第二光致發光層吸收該紫光、該藍光而發出一綠光,該紅色發光層依序間隔一保護層、一第三N型半導體層設置於該第二光致發光層上,該紅色發光層產生一紅光,且該紅光、該綠光、該藍光與該紫光混合形成一具有高度演色性的白光,可滿足LCD產業以及美術燈的要求。Based on the above object, the present invention is an electroluminescent and photoluminous multi-band white light emitting diode comprising an electroluminescent structure, a first photoluminescent layer, a second photoluminescent layer and a red light emitting a layer, wherein the electroluminescent structure has an electroluminescence active layer that is biased by a forward bias to emit a wavelength of from 395 nm to 450 nm and a FWHM of less than 25 nm, and is disposed on the electrolysis a P-type semiconductor layer on both sides of the luminescent active layer and a first N-type semiconductor layer, the first photo-emitting layer being disposed on the electroluminescent structure, and the first photo-induced layer The luminescent layer absorbs the violet light to emit a blue light, the second photoluminescent layer is disposed on the first photoluminescent layer with a second N-type semiconductor layer, and the second photoluminescent layer absorbs the violet light, a blue light emitting a green light, the red light emitting layer is sequentially spaced apart by a protective layer, and a third N-type semiconductor layer is disposed on the second photoluminescent layer, the red light emitting layer generates a red light, and the red light, The green light, the blue light and the violet light are mixed to form a high color rendering Sexual white light can meet the requirements of the LCD industry and art lights.

據此,本發明為透過多個發光層的設計,形成具有高度演色性的白光,且本發明的該紫光為利用電致發光結構所產生,並以該紫光為基礎,利用光致發光的方式產生該藍光與該綠光,而該紅光則以技術相當成熟的自發紅色發光物質、光激發紅色磷光發光物質或紅色量子點來發光,由於發出該紫光的成本相對低廉,因此本發明不但可產生具有高度演色性的白光,且可有效降低成本,滿足製造上的需求。Accordingly, the present invention forms a white light having a high color rendering property through the design of a plurality of light-emitting layers, and the violet light of the present invention is produced by using an electroluminescence structure, and based on the violet light, a photoluminescence method is utilized. The blue light and the green light are generated, and the red light emits light with a relatively mature spontaneous red luminescent material, a light-excited red phosphorescent luminescent material or a red quantum dot. Since the cost of emitting the violet light is relatively low, the present invention is not only Produces white light with high color rendering, and can effectively reduce costs and meet manufacturing needs.

習知Conventional knowledge

1A、1B‧‧‧N型半導體層1A, 1B‧‧‧N type semiconductor layer

2A、2B‧‧‧活性層2A, 2B‧‧‧ active layer

3A、3B‧‧‧P型半導體層3A, 3B‧‧‧P type semiconductor layer

4A、4B‧‧‧基板4A, 4B‧‧‧ substrate

5A、5B‧‧‧P型電極5A, 5B‧‧‧P type electrode

6A、6B‧‧‧N型電極6A, 6B‧‧‧N type electrode

9‧‧‧氮化物發光二極體9‧‧‧ nitride light-emitting diode

9A‧‧‧無參雜半導體層9A‧‧‧No impurity semiconductor layer

9B‧‧‧氮化物光致光活性層9B‧‧‧Nitride photoactive layer

9C‧‧‧電激光9C‧‧‧Electric laser

9D‧‧‧光致光9D‧‧‧Lighting

本發明this invention

10‧‧‧電致發光結構10‧‧‧ electroluminescent structure

11‧‧‧電致發光活性層11‧‧‧electroluminescent active layer

12‧‧‧P型半導體層12‧‧‧P type semiconductor layer

13‧‧‧第一N型半導體層13‧‧‧First N-type semiconductor layer

20‧‧‧第一光致發光層20‧‧‧First photoluminescent layer

30‧‧‧第二光致發光層30‧‧‧Second photoluminescent layer

31‧‧‧第二N型半導體層31‧‧‧Second N-type semiconductor layer

40‧‧‧紅色發光層40‧‧‧Red light layer

50‧‧‧保護層50‧‧‧Protective layer

55‧‧‧無摻雜半導體層55‧‧‧ Undoped semiconductor layer

60‧‧‧第三N型半導體層60‧‧‧Third N-type semiconductor layer

70‧‧‧N型電極70‧‧‧N type electrode

80‧‧‧反射層80‧‧‧reflective layer

81‧‧‧緩衝層81‧‧‧buffer layer

82‧‧‧結合層82‧‧‧ bonding layer

83‧‧‧基板83‧‧‧Substrate

84‧‧‧P型電極84‧‧‧P type electrode

85‧‧‧電流阻擋層85‧‧‧current barrier

90‧‧‧紫光90‧‧‧ violet

91‧‧‧藍光91‧‧‧Blue

92‧‧‧綠光92‧‧‧Green light

93‧‧‧紅光93‧‧‧Red light

94‧‧‧白光94‧‧‧White light

941‧‧‧紫光波鋒941‧‧‧Ziguang Bofeng

942‧‧‧藍光波鋒942‧‧‧Blu-ray wave front

943‧‧‧綠光波鋒943‧‧‧Green light wave front

944‧‧‧紅光波鋒944‧‧‧Red Light Wave Front

95、96‧‧‧曲線95, 96‧‧‧ Curve

圖1為習知垂直式發光二極體結構圖。FIG. 1 is a structural diagram of a conventional vertical light emitting diode.

圖2為習知水平發光二極體結構圖。2 is a structural diagram of a conventional horizontal light emitting diode.

圖3為習知光激發光發光二極體結構圖。3 is a structural diagram of a conventional photoexcited light emitting diode.

圖4為本發明結構圖。Figure 4 is a structural view of the present invention.

圖5為本發明之白光光頻譜圖。Figure 5 is a spectrum diagram of white light of the present invention.

圖6為本發明CIE 1931 色度座標圖。Figure 6 is a chromaticity coordinate diagram of the CIE 1931 of the present invention.

圖7為本發明平均演色評價指數比較圖。Fig. 7 is a comparison diagram of the average color rendering evaluation index of the present invention.

茲有關本發明的詳細內容及技術說明,現以實施例來作進一步說明,但應瞭解的是,該等實施例僅為例示說明之用,而不應被解釋為本發明實施之限制。The detailed description of the present invention and the technical description of the present invention are further illustrated by the accompanying drawings, but it should be understood that these embodiments are merely illustrative and not to be construed as limiting.

請一併參閱「圖4」與「圖5」所示,本發明為一種電致光與光致光多波段白光發光二極體,其包含一電致發光結構10、一第一光致發光層20、一第二光致發光層30與一紅色發光層40,其中該電致發光結構10具有受順向偏壓而發出波長為395奈米到450奈米且半高寬小於25奈米的一紫光90之一電致發光活性層11、分設於該電致發光活性層11兩側的一P型半導體層12與一第一N型半導體層13。Please refer to FIG. 4 and FIG. 5 together. The present invention is an electroluminescent and photoluminous multi-band white light emitting diode comprising an electroluminescent structure 10 and a first photoluminescence. a layer 20, a second photoluminescent layer 30 and a red luminescent layer 40, wherein the electroluminescent structure 10 has a forward bias voltage and emits a wavelength of 395 nm to 450 nm and a FWHM of less than 25 nm. One of the violet light 90 is an electroluminescent active layer 11, and a P-type semiconductor layer 12 and a first N-type semiconductor layer 13 are disposed on both sides of the electroluminescent active layer 11.

該第一光致發光層20間隔該第一N型半導體層13設置於該電致發光結構10上,且該第一光致發光層20吸收該紫光90而發出一藍光91,該第一光致發光層20的材料可以選擇讓該藍光91波長為445奈米到465奈米且半高寬大於20奈米之材料,如可以選用藍光材料Inx Ga1-x N/GaN, x=0.1~0.2。The first photoluminescent layer 20 is disposed on the electroluminescent structure 10, and the first photoluminescent layer 20 absorbs the violet light 90 to emit a blue light 91. The first light is emitted. The material of the light-emitting layer 20 can be selected such that the blue light 91 has a wavelength of 445 nm to 465 nm and a full width at half maximum of more than 20 nm, such as a blue material In x Ga 1-x N/GaN, x=0.1 ~0.2.

該第二光致發光層30則間隔一第二N型半導體層31設置於該第一光致發光層20上,且該第二光致發光層30吸收該紫光90、該藍光91而發出一綠光92,該第二光致發光層30可以選擇讓該綠光92波長為490奈米到540奈米且半高寬大於20奈米之材料,如可以選用綠光材料:Inx Ga1-x N/GaN, x=0.2~0.3。The second photoluminescent layer 30 is disposed on the first photoluminescent layer 20 with a second N-type semiconductor layer 31, and the second photoluminescent layer 30 absorbs the violet light 90 and the blue light 91 to emit a The green light 92, the second photoluminescent layer 30 can be selected such that the green light 92 has a wavelength of 490 nm to 540 nm and a full width at half maximum of more than 20 nm, such as a green light material: In x Ga 1 -x N/GaN, x=0.2~0.3.

該紅色發光層40依序間隔一保護層50、一第三N型半導體層60設置於該第二光致發光層30上,該紅色發光層40產生一紅光93,且該紅色發光層40可以為自發紅色發光物質、光激發紅色磷光發光物質與紅色量子點的任一,如可以選用紅光材料:氮化物參雜Eu2+ 或Mn4+ ,且該紅光93波長可以為600奈米到750奈米。The red light emitting layer 40 is sequentially disposed on the second photoluminescent layer 30. The red light emitting layer 40 generates a red light 93, and the red light emitting layer 40 is disposed. It may be any of a spontaneous red luminescent substance, a light-exciting red phosphorescent substance and a red quantum dot, such as a red material: a nitride doping Eu 2+ or Mn 4+ , and the red light 93 wavelength may be 600 奈Rice to 750 nm.

如「圖5」所示,為本發明混光後之白光94光頻譜圖,可見白光94具有紫光波鋒941、藍光波鋒942、綠光波鋒943與紅光波鋒944,亦即其為由紫光90、藍光91、綠光92與紅光93所混合形成,其具有高度演色性,可滿足LCD產業以及美術燈的要求。As shown in FIG. 5, the light spectrum of the white light 94 after the light mixing of the present invention shows that the white light 94 has a purple wave front 941, a blue wave front 942, a green light front 943 and a red light wave front 944, that is, it is Violet 90, blue light 91, green light 92 and red light 93 are mixed to form, which has high color rendering, which can meet the requirements of LCD industry and art light.

又為了確保該電致發光活性層11所發出的該紫光90不會被完全轉換為該藍光91與該綠光92,該電致發光活性層11的面積可以大於等於該第一光致發光層20與該第二光致發光層30,如此該電致發光活性層11可以確保有足夠之該電激發紫光90可以通過該第一光致發光層20與該第二光致發光層30。In order to ensure that the violet light 90 emitted by the electroluminescent active layer 11 is not completely converted into the blue light 91 and the green light 92, the area of the electroluminescent active layer 11 may be greater than or equal to the first photoluminescent layer. 20 and the second photoluminescent layer 30, such that the electroluminescent active layer 11 can ensure that the electrically excited violet light 90 can pass through the first photoluminescent layer 20 and the second photoluminescent layer 30.

又為了供給該電致發光活性層11順向偏壓,本發明更具有一N型電極70,該N型電極70為貫穿該保護層50、該第三N型半導體層60、該第二光致發光層30、該第二N型半導體層31與該第一光致發光層20,且該N型電極70與該第一N型半導體層13接觸;而該P型半導體層12下方依序設置一反射層80、一緩衝層81、一結合層82、一基板83與一P型電極84,因而只要於該N型電極70與該P型電極84之間供給順向電壓,即可驅動發出紫光90。In order to supply the electroluminescent active layer 11 in the forward bias direction, the present invention further has an N-type electrode 70 extending through the protective layer 50, the third N-type semiconductor layer 60, and the second light. The light-emitting layer 30, the second N-type semiconductor layer 31 and the first photo-emitting layer 20, and the N-type electrode 70 is in contact with the first N-type semiconductor layer 13; and the P-type semiconductor layer 12 is sequentially under A reflective layer 80, a buffer layer 81, a bonding layer 82, a substrate 83 and a P-type electrode 84 are provided, so that a forward voltage can be supplied between the N-type electrode 70 and the P-type electrode 84 to drive Emits a purple light 90.

且為了發光均勻度,該反射層80與該緩衝層81之間可以設置對應該N型電極70設置的一電流阻擋層85,以藉由該電流阻擋層85的阻擋,分散電流,來增加發光均勻度,且電流阻擋層85的設置位置,可以選擇對應該N型電極70,以讓有效發光區域避開該N型電極70,以增加發光效率。For the uniformity of the light, a current blocking layer 85 corresponding to the N-type electrode 70 may be disposed between the reflective layer 80 and the buffer layer 81 to increase the light emission by blocking the current blocking layer 85 and dispersing the current. The uniformity and the position of the current blocking layer 85 can be selected to correspond to the N-type electrode 70 so that the effective light-emitting region avoids the N-type electrode 70 to increase the luminous efficiency.

又該保護層50與該第三N型半導體層60之間更可以設置一無摻雜半導體層55,該無摻雜半導體層55可以設置光折射或粗化的結構而使得亮度提升。Further, an undoped semiconductor layer 55 may be disposed between the protective layer 50 and the third N-type semiconductor layer 60. The undoped semiconductor layer 55 may be provided with a structure of light refraction or roughening to enhance brightness.

請再一併參閱「圖6」與「圖7」所示,為本發明CIE 1931 色度座標圖與平均演色評價指數比較圖;如上述之結構與使用之材料,本發明之白光94為座落於暖白區(暖白的區域在CIE 1931色度座標圖範圍為x:0.41~0.50 y:0.36~0.45)。而如圖7所示,其中X軸是電流值單位為安培(A),Y軸是平均演色評價指數(Ra),而曲線95(菱形標記)為本發明白光94的平均演色評價指數,曲線96(方形標記)為對照組的平均演色評價指數,且對照組為使用一般藍光LED加上YAG黃色螢光粉產生白光,可以明顯發現本發明之白光94的平均演色評價指數(Ra),明顯高於對照組。Please refer to FIG. 6 and FIG. 7 again for comparison of the CIE 1931 chromaticity coordinate map and the average color rendering evaluation index of the present invention; as the above structure and materials used, the white light 94 of the present invention is a seat. Fall in the warm white area (the warm white area in the CIE 1931 color coordinate map range is x: 0.41 ~ 0.50 y: 0.36 ~ 0.45). As shown in FIG. 7, the X-axis is the current value unit of Ampere (A), the Y-axis is the average color rendering index (Ra), and the curve 95 (diamond mark) is the average color rendering index of the white light 94 of the present invention. 96 (square mark) is the average color rendering index of the control group, and the control group uses the general blue LED plus YAG yellow fluorescent powder to produce white light, and the average color rendering index (Ra) of the white light 94 of the present invention can be clearly found. Higher than the control group.

如上所述,本發明主要是透過多個發光層的設計,藉以形成具有高度演色性的白光,且本發明利用電致發光結構10產生紫光90,再以該紫光90為基礎,利用光致發光的方式產生該藍光91與該綠光92,而該紅光93則以技術相當成熟的自發紅色發光物質、光激發紅色磷光發光物質或紅色量子點來發光。由於發出該紫光90的成本相對低廉,因此本發明不但可產生具有高度演色性的白光94,且可有效降低成本,滿足製造上的需求。As described above, the present invention mainly transmits a plurality of light-emitting layers to form white light having a high color rendering property, and the present invention utilizes the electroluminescence structure 10 to generate violet light 90, and based on the violet light 90, photoluminescence is utilized. The blue light 91 and the green light 92 are generated in a manner that emits light with a relatively mature spontaneous red luminescent material, a photoexcited red phosphorescent material, or a red quantum dot. Since the cost of emitting the violet light 90 is relatively low, the present invention can not only produce white light 94 having a high color rendering property, but also can effectively reduce the cost and meet the manufacturing requirements.

 

10‧‧‧電致發光結構 10‧‧‧ electroluminescent structure

11‧‧‧電致發光活性層 11‧‧‧electroluminescent active layer

12‧‧‧P型半導體層 12‧‧‧P type semiconductor layer

13‧‧‧第一N型半導體層 13‧‧‧First N-type semiconductor layer

20‧‧‧第一光致發光層 20‧‧‧First photoluminescent layer

30‧‧‧第二光致發光層 30‧‧‧Second photoluminescent layer

31‧‧‧第二N型半導體層 31‧‧‧Second N-type semiconductor layer

40‧‧‧紅色發光層 40‧‧‧Red light layer

50‧‧‧保護層 50‧‧‧Protective layer

55‧‧‧無摻雜半導體層 55‧‧‧ Undoped semiconductor layer

60‧‧‧第三N型半導體層 60‧‧‧Third N-type semiconductor layer

70‧‧‧N型電極 70‧‧‧N type electrode

80‧‧‧反射層 80‧‧‧reflective layer

81‧‧‧緩衝層 81‧‧‧buffer layer

82‧‧‧結合層 82‧‧‧ bonding layer

83‧‧‧基板 83‧‧‧Substrate

84‧‧‧P型電極 84‧‧‧P type electrode

85‧‧‧電流阻擋層 85‧‧‧current barrier

90‧‧‧紫光 90‧‧‧ violet

91‧‧‧藍光 91‧‧‧Blue

92‧‧‧綠光 92‧‧‧Green light

93‧‧‧紅光 93‧‧‧Red light

Claims (9)

【第1項】[Item 1]
一種電致光與光致光多波段白光發光二極體,其包含:
一電致發光結構,該電致發光結構具有受順向偏壓而發出波長為395奈米到450奈米且半高寬小於25奈米的一紫光之一電致發光活性層、分設於該電致發光活性層兩側的一P型半導體層與一第一N型半導體層;
一第一光致發光層,該第一光致發光層間隔該第一N型半導體層設置於該電致發光結構上,且該第一光致發光層吸收該紫光而發出一藍光;
一第二光致發光層,該第二光致發光層間隔一第二N型半導體層設置於該第一光致發光層上,且該第二光致發光層吸收該紫光、該藍光而發出一綠光;
一紅色發光層,該紅色發光層依序間隔一保護層、一第三N型半導體層設置於該第二光致發光層上,該紅色發光層產生一紅光,且該紅光、該綠光、該藍光與該紫光混合形成一白光。

An electroluminescence and photoluminescence multi-band white light emitting diode comprising:
An electroluminescent structure having an electroluminescence active layer which is subjected to a forward bias and emits a wavelength of from 395 nm to 450 nm and a full width at half maximum of less than 25 nm. a P-type semiconductor layer on both sides of the electroluminescent active layer and a first N-type semiconductor layer;
a first photoluminescent layer, the first photoluminescent layer is disposed on the electroluminescent structure, and the first photoluminescent layer absorbs the violet light to emit a blue light;
a second photoluminescent layer disposed on the first photoluminescent layer with a second N-type semiconductor layer, and the second photoluminescent layer absorbing the violet light and the blue light a green light
a red light emitting layer, the red light emitting layer is sequentially spaced apart by a protective layer, and a third N-type semiconductor layer is disposed on the second photoluminescent layer, the red light emitting layer generates a red light, and the red light and the green light Light, the blue light is mixed with the violet light to form a white light.
【第2項】[Item 2]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中該紅色發光層為自發紅色發光物質、光激發紅色磷光發光物質與紅色量子點的任一。

The electroluminescent and photoluminescent multi-band white light emitting diode according to claim 1, wherein the red light emitting layer is any one of a spontaneous red light emitting material, a light emitting red phosphorescent material and a red quantum dot.
【第3項】[Item 3]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中該藍光波長為445奈米到465奈米且半高寬大於20奈米。

The electroluminescent and photoluminescent multi-band white light emitting diode according to claim 1, wherein the blue light has a wavelength of 445 nm to 465 nm and a full width at half maximum of more than 20 nm.
【第4項】[Item 4]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中該綠光波長為490奈米到540奈米且半高寬大於20奈米。

The electroluminescent and photoluminescent multi-band white light emitting diode according to claim 1, wherein the green light has a wavelength of 490 nm to 540 nm and a full width at half maximum of more than 20 nm.
【第5項】[Item 5]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中該紅光波長為600奈米到750奈米。

The electroluminescent and photoluminescent multi-band white light emitting diode according to claim 1, wherein the red light has a wavelength of from 600 nm to 750 nm.
【第6項】[Item 6]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中該電致發光活性層的面積大於等於該第一光致發光層與該第二光致發光層。

The electroluminescent and photoluminous multi-band white light emitting diode according to claim 1, wherein the area of the electroluminescent active layer is greater than or equal to the first photoluminescent layer and the second photoluminescence. Floor.
【第7項】[Item 7]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中更具有一N型電極,該N型電極貫穿該保護層、該第三N型半導體層、該第二光致發光層、該第二N型半導體層與該第一光致發光層,且該N型電極與該第一N型半導體層接觸;而該P型半導體層下方依序設置一反射層、一緩衝層、一結合層、一基板與一P型電極。

The electro-optic and photo-optic multi-band white light-emitting diode according to claim 1, wherein the N-type electrode further has an N-type electrode, the N-type electrode penetrating the protective layer, the third N-type semiconductor layer, The second photoluminescent layer, the second N-type semiconductor layer and the first photoluminescent layer, and the N-type electrode is in contact with the first N-type semiconductor layer; and the P-type semiconductor layer is sequentially disposed under the P-type semiconductor layer a reflective layer, a buffer layer, a bonding layer, a substrate and a P-type electrode.
【第8項】[Item 8]
如申請專利範圍第7項所述之電致光與光致光多波段白光發光二極體,其中該反射層與該緩衝層之間設置對應該N型電極設置的一電流阻擋層。

The electro-optic and photo-optic multi-band white light-emitting diode according to claim 7, wherein a current blocking layer corresponding to the N-type electrode is disposed between the reflective layer and the buffer layer.
【第9項】[Item 9]
如申請專利範圍第1項所述之電致光與光致光多波段白光發光二極體,其中該保護層與該第三N型半導體層之間更設置一無摻雜半導體層。

The electro-optic and photo-optic multi-band white light-emitting diode according to claim 1, wherein an undoped semiconductor layer is further disposed between the protective layer and the third N-type semiconductor layer.
TW103142342A 2014-12-05 2014-12-05 Electroluminescence and Photoluminescence Multiband White Light Emitting Diodes TWI543394B (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
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TWI599078B (en) * 2016-08-05 2017-09-11 行家光電股份有限公司 Moisture-resistant chip scale packaging light emitting device
US10230027B2 (en) 2016-08-05 2019-03-12 Maven Optronics Co., Ltd. Moisture-resistant chip scale packaging light-emitting device
CN110337721A (en) * 2016-12-27 2019-10-15 艾利迪公司 Method for manufacturing the photoelectric device of the luminescence generated by light pad comprising photoresist
TWI750289B (en) * 2016-12-29 2021-12-21 法商艾勒迪亞公司 Optoelectronic device with light-emitting diodes

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI599078B (en) * 2016-08-05 2017-09-11 行家光電股份有限公司 Moisture-resistant chip scale packaging light emitting device
US10230027B2 (en) 2016-08-05 2019-03-12 Maven Optronics Co., Ltd. Moisture-resistant chip scale packaging light-emitting device
CN110337721A (en) * 2016-12-27 2019-10-15 艾利迪公司 Method for manufacturing the photoelectric device of the luminescence generated by light pad comprising photoresist
CN110337721B (en) * 2016-12-27 2023-05-12 艾利迪公司 Method for manufacturing optoelectronic device comprising photoluminescent pad of photoresist
TWI750289B (en) * 2016-12-29 2021-12-21 法商艾勒迪亞公司 Optoelectronic device with light-emitting diodes

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