TW201620638A - Electronic device housing and manufacturing method for manufacturing the same - Google Patents

Electronic device housing and manufacturing method for manufacturing the same Download PDF

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TW201620638A
TW201620638A TW103142430A TW103142430A TW201620638A TW 201620638 A TW201620638 A TW 201620638A TW 103142430 A TW103142430 A TW 103142430A TW 103142430 A TW103142430 A TW 103142430A TW 201620638 A TW201620638 A TW 201620638A
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metal plate
metal
electronic device
forging
metal layer
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TW103142430A
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TWI560004B (en
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彭新鑑
陳垂鴻
吳仲庭
張碩修
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宏達國際電子股份有限公司
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Abstract

A method for manufacturing an electronic device housing includes the following steps. A metal plate is provided. The metal plate is forged. In the forging process, the metal plate is maintained in the solid state and not converted to the super-saturated solid solution. The anodizing treatment is performed to the forged metal plate.

Description

電子裝置殼體及其加工方法 Electronic device housing and processing method thereof

本發明係關於一種電子裝置殼體,且特別係關於一種電子裝置殼體及其加工方法。 The present invention relates to an electronic device housing, and more particularly to an electronic device housing and a method of processing the same.

隨著科技日新月異的發展,手機可不僅可提供照相及攝影功能,還可連結網路而提供使用者隨時取得所需的資訊,故手機的需求也日漸上升。 With the rapid development of technology, mobile phones can not only provide camera and photography functions, but also connect to the Internet to provide users with the information they need at any time, so the demand for mobile phones is also rising.

為了因應手機外觀的美觀設計,目前越來越多手機殼體具有弧面。製造者通常係利用球型銑刀對金屬板銑出弧面,以形成上述具有弧面的手機殼體。然而,利用球型銑刀來銑出弧面往往需要耗費大量的時間,而降低手機殼體的加工效率。 In order to respond to the beautiful design of the appearance of the mobile phone, more and more mobile phone casings have a curved surface. The manufacturer usually uses a ball milling cutter to mill the metal plate to form a curved surface to form the above-mentioned curved mobile phone case. However, the use of a ball milling cutter to mill out the curved surface often takes a lot of time and reduces the processing efficiency of the mobile phone casing.

有鑑於此,本發明之一目的係在於提供一種電子裝置殼體之加工方法,相較於利用球型銑刀來銑出弧面的方式而言,此加工方法可更快速地形成弧面。 In view of the above, an object of the present invention is to provide a method for processing an electronic device housing, which can form a curved surface more quickly than a method of milling a curved surface by a ball milling cutter.

為了達到上述目的,依據本發明之一實施方式,一種電子裝置殼體之加工方法包含以下步驟。提供一金屬板。對金屬板進行鍛造,其中在鍛造過程中,金屬板係維持在固態而未轉換成過飽和固溶體。對鍛造後的金屬板進行陽極處理。 In order to achieve the above object, according to an embodiment of the present invention, a method of processing an electronic device housing includes the following steps. A metal plate is provided. The metal sheet is forged, wherein during the forging process, the metal sheet is maintained in a solid state and is not converted into a supersaturated solid solution. The forged metal sheet is anodized.

依據本發明之另一實施方式,一種電子裝置殼體包含一金屬板以及一陽極氧化層。金屬板包含一第一金屬層以及一第二金屬層。第二金屬層係覆蓋於第一金屬層上。第一金屬層與第二金屬層具有相同材料。第二金屬層係受到鍛造的影響,使得第二金屬層中的金屬顆粒比第一金屬層中的金屬顆粒更為扁平。陽極氧化層係覆蓋於金屬板之第二金屬層上。 According to another embodiment of the present invention, an electronic device housing includes a metal plate and an anodized layer. The metal plate includes a first metal layer and a second metal layer. The second metal layer covers the first metal layer. The first metal layer and the second metal layer have the same material. The second metal layer is affected by forging such that the metal particles in the second metal layer are flatter than the metal particles in the first metal layer. The anodized layer is coated on the second metal layer of the metal plate.

於上述實施方式中,製造者可利用鍛造來形成具有弧面的金屬板,而無須以球型銑刀來銑出弧面,由於鍛造弧面的所需時間比銑出弧面的所需時間少,故可提高電子裝置殼體的加工效率。 In the above embodiment, the manufacturer can use forging to form a metal plate having a curved surface without milling the arc surface with a ball milling cutter, because the time required for forging the curved surface is longer than the time required for milling the curved surface. The processing efficiency of the electronic device housing can be improved.

以上所述僅係用以闡述本發明所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本發明之具體細節將在下文的實施方式及相關圖式中詳細介紹。 The above description is only for explaining the problems to be solved by the present invention, the technical means for solving the problems, the effects thereof, and the like, and the specific details of the present invention will be described in detail in the following embodiments and related drawings.

100‧‧‧金屬板 100‧‧‧Metal plates

101‧‧‧第一金屬層 101‧‧‧First metal layer

102‧‧‧第二金屬層 102‧‧‧Second metal layer

110‧‧‧正面 110‧‧‧ positive

120‧‧‧背面 120‧‧‧Back

122‧‧‧下陷面 122‧‧‧Sinking

130‧‧‧凹槽 130‧‧‧ Groove

132‧‧‧槽底面 132‧‧‧Slot bottom

134‧‧‧側牆 134‧‧‧Side wall

136‧‧‧部位 136‧‧‧ parts

200‧‧‧陽極氧化層 200‧‧‧anodized layer

P1‧‧‧金屬顆粒 P1‧‧‧ metal particles

P2‧‧‧金屬顆粒 P2‧‧‧ metal particles

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:第1圖繪示依據本發明一實施方式之電子裝置殼體的 立體圖;第2至5圖繪示在各加工步驟下的立體圖;第6圖,本圖繪示依據本發明一實施方式之電子裝置之殼體的加工過程的溫度示意圖;以及第7圖繪示第1圖之電子裝置殼體沿著A-A’線的剖面圖。 The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood. 2 to 5 are perspective views of the processing steps of the electronic device according to an embodiment of the present invention; and FIG. 7 is a schematic view showing the processing of the housing of the electronic device according to an embodiment of the present invention; Figure 1 is a cross-sectional view of the electronic device housing taken along line A-A'.

以下將以圖式揭露本發明之複數實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,熟悉本領域之技術人員應當瞭解到,在本發明部分實施方式中,這些實務上的細節並非必要的,因此不應用以限制本發明。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。另外,為了便於讀者觀看,圖式中各元件的尺寸並非依實際比例繪示。 The embodiments of the present invention are disclosed in the following drawings, and for the purpose of clarity However, it should be understood by those skilled in the art that the details of the invention are not essential to the details of the invention. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings. In addition, the dimensions of the various elements in the drawings are not shown in actual scale for the convenience of the reader.

第1圖繪示依據本發明一實施方式之電子裝置殼體的立體圖。如第1圖所示,為了形成具有弧面的電子裝置殼體,依據本發明之一實施方式,電子裝置殼體之加工方法可包含以下步驟,其中第2至5圖繪示在各加工步驟下的立體圖。如第2圖所示,首先,可提供金屬板100。金屬板100的材質可為鋁或鋁合金,舉例來說,金屬板100的材質可為型號為6061或6063的鋁合金,但本發明並不以此為限。 FIG. 1 is a perspective view of an electronic device housing according to an embodiment of the present invention. As shown in FIG. 1 , in order to form an electronic device housing having a curved surface, according to an embodiment of the present invention, the processing method of the electronic device housing may include the following steps, wherein the second to fifth embodiments are illustrated in each processing step. The perspective view below. As shown in Fig. 2, first, a metal plate 100 can be provided. The material of the metal plate 100 may be aluminum or an aluminum alloy. For example, the material of the metal plate 100 may be an aluminum alloy of the type 6061 or 6063, but the invention is not limited thereto.

接著,對金屬板100進行第一次鍛造。舉例來說,請先參閱第2圖,金屬板100具有正面110以及相對的背面120。在鍛造過程中,如第3圖所示,可對金屬板100的正面110的局部區域施加壓力(例如壓迫或敲擊正面110的局部區域),而使正面110的局部區域下凹而形成凹槽130。凹槽130具有槽底面132以及側牆134。槽底面132係由金屬板100的正面110朝向背面120凹陷的,而側牆134圍繞槽底面132,並鄰接槽底面132以及正面110。藉由鍛造的方式,槽底面132可受到鍛造的力量而變形為弧面。換句話說,金屬板100可被鍛造出弧面。此外,由於鍛造相較於利用銑刀的加工方式而言,可較快速地形成弧面,因此,上述實施方式可提高加工效率。 Next, the metal plate 100 is forged for the first time. For example, referring to FIG. 2 first, the metal plate 100 has a front surface 110 and an opposite back surface 120. In the forging process, as shown in Fig. 3, a partial pressure on the front surface 110 of the metal plate 100 (e.g., pressing or tapping a partial area of the front surface 110) may be applied, and a partial area of the front surface 110 may be recessed to form a concave shape. Slot 130. The groove 130 has a groove bottom surface 132 and a side wall 134. The groove bottom surface 132 is recessed from the front surface 110 of the metal plate 100 toward the back surface 120, and the side wall 134 surrounds the groove bottom surface 132 and abuts the groove bottom surface 132 and the front surface 110. By forging, the groove bottom surface 132 can be deformed into a curved surface by the force of forging. In other words, the metal plate 100 can be forged into a curved surface. Further, since the forging can form the arc surface relatively faster than the processing method using the milling cutter, the above embodiment can improve the machining efficiency.

於部分實施方式中,為了金屬板100的上色以及保護等,當金屬板100鍛造完成後,製造者會對金屬板100進行陽極處理。然而,發明人發現,若在鍛造時,金屬板100被加熱至高溫而轉換成過飽和固溶體,則金屬板100的晶格會產生變化,使得金屬板100的部分區域較粗糙,而部分區域較細緻,因此,當此金屬板100經陽極處理後,容易產生不均勻的細微孔洞,而當金屬板100染色時,這些不均勻的孔洞會造成染料的分佈不均,而導致金屬板100不同位置的顏色不同,因而產生花斑,而導致外觀上的缺陷。 In some embodiments, for the coloring and protection of the metal plate 100, after the metal plate 100 is forged, the manufacturer performs anodizing of the metal plate 100. However, the inventors have found that if the metal plate 100 is heated to a high temperature and converted into a supersaturated solid solution at the time of forging, the lattice of the metal plate 100 is changed, so that a partial region of the metal plate 100 is rough, and a partial region is obtained. It is more detailed. Therefore, when the metal plate 100 is subjected to anodization, uneven micropores are easily generated, and when the metal plate 100 is dyed, these uneven holes may cause uneven distribution of dyes, resulting in different metal plates 100. The color of the position is different, resulting in speckles, which leads to defects in appearance.

因此,於部分實施方式中,在鍛造過程中,金屬板100係維持在固態而未轉換成過飽和固溶體,如此一來,即 使後續對金屬板100進行陽極處理,金屬板100也不會產生花斑。舉例來說,當金屬板100的材料為鋁合金時,若溫度大於530℃,其會轉換成過飽和固溶體,因此,製造者可控制鍛造過程的溫度T小於或等於530℃,以使金屬板100可維持在固態而不轉換成過飽和固溶體,而防止陽極處理時花斑的產生。較佳來說,鍛造過程可在室溫下進行,換句話說,鍛造過程的溫度T可為室溫,如此不僅能防止金屬板100轉換成過飽和固溶體,還可省卻對金屬板100加熱所需的能源成本。舉例來說,鍛造過程的溫度T可滿足:15℃≦T≦40℃,以便金屬板100可維持在固態而不轉換成過飽和固溶體。應瞭解到,本說明書全文所述的過飽和固溶體係指在既定溫度下溶解溶質的數量大於該溫度下處於平衡狀態時溶解度的固溶體。 Therefore, in some embodiments, during the forging process, the metal plate 100 is maintained in a solid state and is not converted into a supersaturated solid solution, thus, Subsequent anodizing of the metal plate 100 does not cause speckles in the metal plate 100. For example, when the material of the metal plate 100 is an aluminum alloy, if the temperature is greater than 530 ° C, it will be converted into a supersaturated solid solution, so the manufacturer can control the temperature T of the forging process to be less than or equal to 530 ° C to make the metal The plate 100 can be maintained in a solid state without being converted into a supersaturated solid solution, while preventing generation of speckles during anodizing. Preferably, the forging process can be carried out at room temperature. In other words, the temperature T of the forging process can be room temperature, so that not only the metal plate 100 can be prevented from being converted into a supersaturated solid solution, but also the metal plate 100 can be omitted. The energy cost required. For example, the temperature T of the forging process can satisfy: 15 ° C ≦ T ≦ 40 ° C, so that the metal plate 100 can be maintained in a solid state without being converted into a supersaturated solid solution. It should be understood that the supersaturated solid solution system described throughout the specification refers to a solid solution in which the amount of dissolved solute at a given temperature is greater than the solubility at equilibrium at that temperature.

於部分實施方式中,若第一次鍛造未使金屬板100形成所需的形狀,則可對金屬板100進行多次的鍛造。具體來說,可對第3圖所示型態之金屬板100進行第二次鍛造,而將其鍛造成如第4圖所示之型態的金屬板100。舉例來說,可對凹槽130的槽底面132之局部區域施加壓力(例如壓迫或敲擊槽底面132的局部區域),使槽底面132之局部區域繼續凹陷,而在凹槽130中產生部位136。部位136可連接槽底面132與正面110。若經兩次鍛造仍未使金屬板100形成所需的形狀,則可對金屬板100再次進行鍛造,直到形成所需形狀為止。 In some embodiments, if the first forging does not form the metal plate 100 into a desired shape, the metal plate 100 may be forged several times. Specifically, the metal plate 100 of the type shown in Fig. 3 can be forged a second time and forged into a metal plate 100 of the type shown in Fig. 4. For example, a partial area of the groove bottom surface 132 of the recess 130 may be applied (eg, a partial area of the bottom surface 132 of the groove is pressed or struck) such that a partial area of the bottom surface 132 of the groove continues to be recessed, and a portion is created in the groove 130. 136. The portion 136 can connect the groove bottom surface 132 to the front surface 110. If the metal plate 100 is not formed into a desired shape by two forgings, the metal plate 100 can be forged again until a desired shape is formed.

上述的兩次鍛造均係從金屬板100的正面110進行 鍛造,故若欲對金屬板100的背面120進行鍛造時,於部分實施方式中,可進行第三次鍛造,如第5圖所示,在本次鍛造過程中,係將金屬板100翻面,以針對金屬板100的背面120進行鍛造。舉例來說,可對金屬板100的背面120之邊緣施加壓力(例如壓迫或敲擊背面120的邊緣),使背面120的邊緣下凹而形成下陷面122。若本次鍛造仍未使金屬板100的背面120形成所需的形狀,則可對金屬板100的背面120再次進行鍛造,直到形成所需形狀為止。 The above two forgings are performed from the front surface 110 of the metal plate 100. Forging, if the back surface 120 of the metal plate 100 is to be forged, in some embodiments, the third forging can be performed. As shown in FIG. 5, in the forging process, the metal plate 100 is turned over. Forging is performed on the back surface 120 of the metal plate 100. For example, pressure may be applied to the edge of the back side 120 of the metal sheet 100 (eg, pressing or tapping the edge of the back side 120) such that the edge of the back side 120 is recessed to form the depressed surface 122. If the forging has not yet formed the desired shape of the back surface 120 of the metal plate 100, the back surface 120 of the metal plate 100 can be forged again until the desired shape is formed.

以上三次鍛造過程的溫度T均小於530℃,較佳來說,以上三次鍛造過程均可在室溫下進行,如此不僅可防止花斑的產生,還可省下對金屬板100加熱所需的能源成本。舉例來說,以上三次鍛造過程的溫度T可滿足:15℃≦T≦40℃,以便金屬板100可維持在固態而不轉換成過飽和固溶體,而防止花斑的產生。 The temperature T of the above three forging processes is less than 530 ° C. Preferably, the above three forging processes can be performed at room temperature, so that not only the generation of the spot can be prevented, but also the heating of the metal plate 100 can be saved. Energy costs. For example, the temperature T of the above three forging processes can satisfy: 15 ° C ≦ T ≦ 40 ° C, so that the metal plate 100 can be maintained in a solid state without being converted into a supersaturated solid solution, thereby preventing generation of speckle.

由於在上述三次鍛造過程中,金屬板100均未轉換成過飽和固溶體,故金屬板100不會經過具有硬化效果的固溶處理(solution heat treatment),而硬度較低。應瞭解到,上述之固溶處理係指先將合金材料加熱至高溫狀態(如500℃以上),並由高溫狀態淬水急冷,而形成過飽和固溶體的處理。具體來說,在固溶處理的前段過程中,可先將合金材料加熱至其固溶線以上之單向區,並將此合金材料維持在高溫狀態一段時間,在這段時間內,此合金材料所得到的能量足以讓合金材料進行物理重組,使得合金材料的強化元素或金屬間化合物逐漸析出。合金材料的析出元素可 融入合金材料的基材(如鋁基材)中,形成單相固溶體。簡單來說,上述單向固溶體的形成原理係類似於將鹽溶於水的過程,而鋁基材可類比為水,析出元素可以類比為鹽。接著,在固溶處理的後段過程中,可將此單相固溶體快速淬火至低溫,使合金材料形成過飽和固溶體。 Since the metal plate 100 is not converted into a supersaturated solid solution during the above three forging processes, the metal plate 100 does not pass through a solution heat treatment having a hardening effect, and the hardness is low. It should be understood that the above solution treatment refers to a treatment in which the alloy material is first heated to a high temperature state (for example, 500 ° C or higher) and quenched by a high temperature state to form a supersaturated solid solution. Specifically, in the front stage of the solution treatment, the alloy material may be first heated to a unidirectional region above the solvus line, and the alloy material is maintained at a high temperature for a period of time, during which time the alloy material The energy obtained is sufficient for the physical recombination of the alloy material, so that the strengthening elements or intermetallic compounds of the alloy material gradually precipitate. The precipitation element of the alloy material can be A single phase solid solution is formed in a substrate (such as an aluminum substrate) that is incorporated into an alloy material. Briefly, the formation principle of the above unidirectional solid solution is similar to the process of dissolving a salt in water, and an aluminum substrate can be analogized to water, and a precipitation element can be analogized to a salt. Then, in the latter stage of the solution treatment, the single-phase solid solution can be rapidly quenched to a low temperature to form a supersaturated solid solution of the alloy material.

為了提高不經過固溶處理之金屬板100的硬度,於部分實施方式中,金屬板100在鍛造前的維氏硬度值H1可滿足:40Hv≦H1≦50Hv,上述維氏硬度值H1比傳統電子裝置殼體的原料硬度高,而可防止金屬板100在鍛造後的硬度過低。 In order to improve the hardness of the metal plate 100 which is not subjected to the solution treatment, in some embodiments, the Vickers hardness value H1 of the metal plate 100 before forging may satisfy: 40 Hv ≦ H1 ≦ 50 Hv, and the above-mentioned Vickers hardness value H1 is higher than that of the conventional electronic The material of the device casing is high in hardness, and the hardness of the metal plate 100 after forging is prevented from being too low.

此外,為了更進一步地提高金屬板100的硬度,於部分實施方式中,在鍛造後,可對金屬板100進行時效硬化處理(age hardening),以使金屬板100硬化。時效硬化處理可包含自然時效硬化處理(natural age hardening)與人工時效硬化處理(artificial age hardening)。自然時效硬化處理係指把金屬板100放置於室溫下恆溫加熱,來產生強化或硬化的效應。人工時效硬化處理則係指把金屬板100放置於高於室溫的環境下恆溫加熱,來產生強化或硬化的效應。由於對金屬板100採用人工時效硬化處理可較大幅度地提高金屬板100的硬度,因此,本發明實施方式所採用的時效硬化處理較佳為人工時效硬化處理,其可包含以下步驟。首先,在鍛造後,可將金屬板100加熱至一高溫狀態。接著,可將金屬板100維持在高溫狀態下,而使金屬板100硬化,其中高溫狀態之溫度係大於40℃,並小於或 等於530℃,以防止金屬板100轉換成過飽和固溶體。於部份實施方式中,可將金屬板100維持在溫度約為160℃~200℃的高溫狀態,以產生較佳的硬化效果。 Further, in order to further increase the hardness of the metal plate 100, in some embodiments, after forging, the metal plate 100 may be subjected to age hardening to harden the metal plate 100. The age hardening treatment may include natural age hardening and artificial age hardening. Natural age hardening treatment refers to the effect of placing the metal plate 100 at room temperature under constant temperature to produce strengthening or hardening. The artificial age hardening treatment refers to the effect of placing the metal plate 100 at a constant temperature in a temperature higher than room temperature to produce an effect of strengthening or hardening. Since the hardness of the metal plate 100 can be greatly improved by the artificial age hardening treatment on the metal plate 100, the age hardening treatment used in the embodiment of the present invention is preferably an artificial age hardening treatment, which may include the following steps. First, after forging, the metal plate 100 can be heated to a high temperature state. Then, the metal plate 100 can be maintained at a high temperature to harden the metal plate 100, wherein the temperature in the high temperature state is greater than 40 ° C and less than or It is equal to 530 ° C to prevent the metal plate 100 from being converted into a supersaturated solid solution. In some embodiments, the metal plate 100 can be maintained at a high temperature of about 160 ° C to 200 ° C to produce a better hardening effect.

當製造者所採用的金屬板100在鍛造前的維氏硬度值H1滿足:40Hv≦H1≦50Hv時,可先對金屬板100進行鍛造,再對金屬板100進行前段所述之時效硬化處理,則在時效硬化處理後的金屬板100之維氏硬度值H2可滿足:80Hv≦H2≦90Hv。換句話說,時效硬化處理可在鍛造後進行。如此一來,即便金屬板100的加工過程中並未經過固溶處理,仍可滿足電子裝置殼體的硬度需求。應瞭解到,本說明書全文所述之「約」係指數值之誤差或範圍在百分之二十以內,較佳地是在百分之十以內,而更佳地則是在百分五之以內。 When the Vickers hardness value H1 of the metal plate 100 used by the manufacturer before forging satisfies: 40Hv ≦ H1 ≦ 50Hv, the metal plate 100 may be forged first, and then the metal plate 100 may be subjected to age hardening treatment as described in the preceding paragraph. Then, the Vickers hardness value H2 of the metal plate 100 after the age hardening treatment can satisfy: 80 Hv ≦ H2 ≦ 90 Hv. In other words, the age hardening treatment can be performed after forging. In this way, even if the metal plate 100 is not subjected to solution treatment during processing, the hardness requirement of the electronic device housing can be satisfied. It should be understood that the error or range of the "about" index value described in the full text of this specification is within 20%, preferably within 10%, and more preferably at 5%. Within.

整體來說,可參閱第6圖,本圖繪示依據本發明一實施方式之電子裝置之殼體的加工過程的溫度示意圖。如第6圖所示,步驟S1係指第一次鍛造(如第2圖所示),而步驟S2係指第二次鍛造(如第3圖所示),而步驟S3係指第三次鍛造,而步驟S4係指時效硬化處理。其中步驟S1、S2及S3(亦即,鍛造步驟)可在相同溫度下進行,而步驟S4(亦即,時效硬化處理)可在較高的溫度下進行,亦即,步驟S4(亦即,時效硬化處理)之溫度可高於步驟S1、S2及S3(亦即,鍛造步驟)之溫度。 In general, referring to FIG. 6 , this figure illustrates a temperature diagram of a process of processing a housing of an electronic device according to an embodiment of the present invention. As shown in Fig. 6, step S1 refers to the first forging (as shown in Fig. 2), and step S2 refers to the second forging (as shown in Fig. 3), and step S3 refers to the third time. Forging, and step S4 means age hardening treatment. Wherein steps S1, S2 and S3 (i.e., forging steps) can be performed at the same temperature, and step S4 (i.e., age hardening treatment) can be performed at a higher temperature, that is, step S4 (i.e., The temperature of the age hardening treatment may be higher than the temperatures of the steps S1, S2 and S3 (i.e., the forging step).

最後,請復參閱第1圖,可對金屬板100進行陽極處理。具體來說,可在金屬板100表面形成以其基底金屬 為主的陽極氧化層200,其不僅可增加金屬板100的機械強度,且還能使染料滲入金屬板100的表面,以實現對電子裝置殼體上色的效果。陽極處理可藉由將金屬板100置於電解槽中的陽極,並施加一定電壓與電流,以促使金屬板的背面120形成附著良好的陽極氧化層200。另外,由於金屬板100在鍛造過程中未被轉換成過飽和固溶體,因此,即使金屬板100的背面120上形成有陽極氧化層200,也不會產生花斑。 Finally, please refer to FIG. 1 for the anode treatment of the metal plate 100. Specifically, the base metal may be formed on the surface of the metal plate 100 The main anodized layer 200 not only increases the mechanical strength of the metal plate 100, but also allows the dye to penetrate into the surface of the metal plate 100 to achieve the effect of coloring the housing of the electronic device. The anodizing treatment can be performed by placing the metal plate 100 in the anode of the electrolytic cell and applying a certain voltage and current to cause the back surface 120 of the metal plate to form the well-attached anodized layer 200. Further, since the metal plate 100 is not converted into a supersaturated solid solution during the forging process, even if the anodized layer 200 is formed on the back surface 120 of the metal plate 100, no spots are generated.

第7圖繪示第1圖之電子裝置殼體沿著A-A’線的剖面圖。如第7圖所示,電子裝置殼體可包含金屬板100與陽極氧化層200。金屬板100包含第一金屬層101以及第二金屬層102,第二金屬層102覆蓋於第一金屬層101上。陽極氧化層200係覆蓋於金屬板100之第二金屬層102上。第一金屬層101與第二金屬層102具有相同材料,例如:第一金屬層101與第二金屬層102的材質均為鋁合金,但本發明並不以此為限。第一金屬層101中含有金屬顆粒P1,第二金屬層102中含有金屬顆粒P2。第二金屬層102係受到鍛造的影響,使得第二金屬層102中的金屬顆粒P2比第一金屬層101中的金屬顆粒P1更為扁平。換句話說,若由顯微鏡觀看電子裝置殼體的剖面時,可看到金屬板100表層的金屬顆粒,比金屬板100內層的金屬顆粒更為扁平,而此金屬顆粒的形狀差異便係由於金屬板100表層受到鍛造的壓力所造成的。因此,使用者可藉由觀察金屬板100表層與金屬板100內層中的金屬顆粒之形狀差異,來得知 金屬板100是否經過鍛造。 Fig. 7 is a cross-sectional view showing the electronic device casing of Fig. 1 taken along line A-A'. As shown in FIG. 7, the electronic device housing may include a metal plate 100 and an anodized layer 200. The metal plate 100 includes a first metal layer 101 and a second metal layer 102, and the second metal layer 102 covers the first metal layer 101. The anodized layer 200 is coated on the second metal layer 102 of the metal plate 100. The first metal layer 101 and the second metal layer 102 have the same material. For example, the materials of the first metal layer 101 and the second metal layer 102 are all aluminum alloys, but the invention is not limited thereto. The first metal layer 101 contains metal particles P1, and the second metal layer 102 contains metal particles P2. The second metal layer 102 is affected by forging such that the metal particles P2 in the second metal layer 102 are flatter than the metal particles P1 in the first metal layer 101. In other words, if the cross section of the electronic device housing is viewed by a microscope, the metal particles on the surface of the metal plate 100 can be seen to be flatter than the metal particles in the inner layer of the metal plate 100, and the difference in shape of the metal particles is due to The surface of the metal plate 100 is caused by the pressure of forging. Therefore, the user can know by observing the difference in shape between the surface layer of the metal plate 100 and the metal particles in the inner layer of the metal plate 100. Whether the metal plate 100 is forged.

於部分實施方式中,第一金屬層101的相對兩側均具有第二金屬層102。換句話說,金屬板100的相對兩面均受到鍛造的影響,而產生兩第二金屬層102。 In some embodiments, the first metal layer 101 has a second metal layer 102 on opposite sides thereof. In other words, the opposite sides of the metal plate 100 are affected by forging, and two second metal layers 102 are produced.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.

100‧‧‧金屬板 100‧‧‧Metal plates

120‧‧‧背面 120‧‧‧Back

200‧‧‧陽極氧化層 200‧‧‧anodized layer

Claims (10)

一種電子裝置殼體的加工方法,包含:提供一金屬板;對該金屬板進行鍛造,其中在鍛造過程中,該金屬板係維持在固態而未轉換成過飽和固溶體;以及對鍛造後的該金屬板進行陽極處理。 A method of processing an electronic device housing, comprising: providing a metal plate; forging the metal plate, wherein the metal plate is maintained in a solid state without being converted into a supersaturated solid solution during the forging process; and after forging The metal plate was anodized. 如請求項1所述之電子裝置殼體的加工方法,其中該鍛造過程的溫度T滿足:15℃≦T≦40℃。 The processing method of the electronic device housing according to claim 1, wherein the temperature T of the forging process satisfies: 15 ° C ≦ T ≦ 40 ° C. 如請求項1所述之電子裝置殼體的加工方法,更包含:在鍛造後,對該金屬板進行時效硬化處理,該時效硬化處理包含對該金屬板加熱至一高溫狀態,並將該金屬板維持在該高溫狀態下,而使該金屬板硬化,其中該高溫狀態之溫度係大於40℃並小於或等於530℃。 The processing method of the electronic device casing according to claim 1, further comprising: after forging, performing an age hardening treatment on the metal plate, the age hardening treatment comprising heating the metal plate to a high temperature state, and the metal is heated The sheet is maintained at the elevated temperature to harden the metal sheet, wherein the temperature in the high temperature state is greater than 40 ° C and less than or equal to 530 ° C. 如請求項3所述之電子裝置殼體的加工方法,其中該高溫狀態之溫度約為160℃~200℃。 The processing method of the electronic device casing according to claim 3, wherein the temperature in the high temperature state is about 160 ° C to 200 ° C. 如請求項1所述之電子裝置殼體的加工方法,其中該金屬板在鍛造前的維氏硬度值H1滿足:40Hv≦H1≦50Hv。 The processing method of the electronic device casing according to claim 1, wherein the Vickers hardness value H1 of the metal plate before forging satisfies: 40 Hv ≦ H1 ≦ 50 Hv. 如請求項3所述之電子裝置殼體的加工方法,其中 該金屬板在該時效硬化處理後的維氏硬度值H2滿足:80Hv≦H2≦90Hv。 The processing method of the electronic device housing according to claim 3, wherein The Vickers hardness value H2 of the metal sheet after the age hardening treatment satisfies: 80 Hv ≦ H2 ≦ 90 Hv. 如請求項1所述之電子裝置殼體的加工方法,其中對該金屬板進行鍛造包含對該金屬板進行多次的鍛造流程,其中對該金屬板進行多次的鍛造流程包含對該金屬板之正面進行兩次鍛造流程以及對該金屬板之背面進行一次鍛造流程。 The processing method of the electronic device casing according to claim 1, wherein the forging the metal plate comprises performing a forging process for the metal plate a plurality of times, wherein the forging process of the metal plate is performed multiple times including the metal plate The forging process is performed twice on the front side and a forging process is performed on the back side of the metal plate. 如請求項1所述之電子裝置殼體的加工方法,其中該金屬板係被鍛造出一弧面。 The method of processing an electronic device housing according to claim 1, wherein the metal plate is forged with a curved surface. 一種電子裝置殼體,包含:一金屬板,包含:一第一金屬層;以及一第二金屬層,覆蓋於該第一金屬層上,該第一金屬層與該第二金屬層具有相同材料,且該第二金屬層係受到鍛造的影響,使得該第二金屬層中的金屬顆粒比該第一金屬層中的金屬顆粒更為扁平;以及一陽極氧化層,覆蓋於該金屬板之該第二金屬層上。 An electronic device housing comprising: a metal plate comprising: a first metal layer; and a second metal layer overlying the first metal layer, the first metal layer and the second metal layer having the same material And the second metal layer is affected by forging such that the metal particles in the second metal layer are flatter than the metal particles in the first metal layer; and an anodized layer covering the metal plate On the second metal layer. 如請求項9所述之電子裝置殼體,其中該金屬板在時效硬化處理後的維氏硬度值H2滿足:80Hv≦H2≦90Hv。 The electronic device casing according to claim 9, wherein the Vickers hardness value H2 of the metal plate after the age hardening treatment satisfies: 80 Hv ≦ H2 ≦ 90 Hv.
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