TW201616545A - Inductively coupled plasma processing device and heating part thereof - Google Patents

Inductively coupled plasma processing device and heating part thereof Download PDF

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TW201616545A
TW201616545A TW103144911A TW103144911A TW201616545A TW 201616545 A TW201616545 A TW 201616545A TW 103144911 A TW103144911 A TW 103144911A TW 103144911 A TW103144911 A TW 103144911A TW 201616545 A TW201616545 A TW 201616545A
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heating wire
plasma processing
processing apparatus
inductively coupled
coupled plasma
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TW103144911A
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TWI570768B (en
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Xiao-Bing Xie
zhi lin Huang
Lei Wan
Jun Wang
Shen Jian Liu
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Advanced Micro Fabrication Equipment Shanghai Co L
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Abstract

The present invention provides an inductively coupled plasma processing device and the heating part thereof, so as to reduce or even completely avoid weakening of plasma dissociation effect of an electric heating wire above the dielectric window to an inductive coil. The heating part is configured to control the temperature of the dielectric window at a top of a reaction chamber. The heating part includes the electric heating wire arranged on an upper surface of the dielectric window. The entire of the electric heating wire is centrally symmetric. The electric heating wire has two contacts configured to be electrically connected to a heating power supply for forming a loop. The electric heating wire circularly forms multiple patterns, and each pattern is opposite to a heating current direction in the center of the symmetric pattern.

Description

感應耦合電漿體處理裝置及其加熱部件Inductively coupled plasma processing device and heating element thereof

本發明涉及感應耦合電漿體(ICP,Inductive Coupled Plasma)處理裝置,如ICP蝕刻裝置、ICP薄膜沉積裝置等,尤其涉及應用在上述裝置中為其反應腔室頂部的絕緣窗(dielectric window)提供溫度控制的加熱裝置。The present invention relates to an inductive coupled plasma (ICP) processing device, such as an ICP etching device, an ICP thin film deposition device, etc., and more particularly to the use of a dielectric window for the top of a reaction chamber in the above device. Temperature controlled heating unit.

近年來,隨著半導體製造工藝的發展,對元件的集成度和性能要求越來越高,電漿工藝被廣泛應用於半導體元件的製造中。其中主要的電漿處理裝置包括電容耦合型(CCP)和感應耦合型(ICP)兩種,其中感應耦合型的電漿處理裝置具有電漿濃度高,蝕刻速率快等優點。In recent years, with the development of semiconductor manufacturing processes, the integration and performance requirements of components have become higher and higher, and plasma processes are widely used in the manufacture of semiconductor components. The main plasma processing devices include capacitive coupling type (CCP) and inductive coupling type (ICP). Among them, the inductive coupling type plasma processing device has the advantages of high plasma concentration and fast etching rate.

如圖1所示,感應耦合型電漿處理裝置通常包括一個反應腔室100,反應腔室100內部的下方設置有用於放置待加工基片的基座20,一個低頻偏置射頻電源(如2Mhz/400KHz)通過一個匹配網路1連接到基座20。一個排氣裝置(未圖示)連通到基座20周圍,抽走反應過程中的新生成氣體以及部分未來得及參與反應的反應氣體,以控制反應腔室100內的氣壓。反應腔室100頂部為一絕緣窗110,由於其為電絕緣材料製成,因而上方的電磁場可透過其進入反應腔室100,以激發反應腔室100內的反應氣體解離生成電漿體,進行工藝處理。As shown in FIG. 1, the inductively coupled plasma processing apparatus generally includes a reaction chamber 100, and a susceptor 20 for placing a substrate to be processed, a low frequency bias RF power source (such as 2Mhz) is disposed under the inside of the reaction chamber 100. /400 KHz) is connected to the base 20 through a matching network 1. An exhaust device (not shown) is connected to the periphery of the susceptor 20 to evacuate the newly generated gas during the reaction and some of the reaction gas that is expected to participate in the reaction to control the gas pressure in the reaction chamber 100. The top of the reaction chamber 100 is an insulating window 110. Since it is made of an electrically insulating material, the upper electromagnetic field can pass through the reaction chamber 100 to excite the reaction gas in the reaction chamber 100 to dissociate to form a plasma. Process processing.

由於絕緣窗110內不同區域間的溫度差異會影響反應腔室100內反應進行速度的均一性,溫度梯度太大時甚至會造成絕緣窗110的開裂破損,因而絕緣窗110的上表面設置有加熱部件,其通常為電熱絲(也可稱之為電熱線圈)120,以對絕緣窗110的溫度進行控制。電熱絲120通過導線連接到一個加熱電源(其既可為交流電源,也可為直流電源)。Since the temperature difference between different regions in the insulating window 110 affects the uniformity of the reaction speed in the reaction chamber 100, even if the temperature gradient is too large, the insulating window 110 may be cracked and damaged, and thus the upper surface of the insulating window 110 is provided with heating. The component, which is typically a heating wire (also referred to as an electric heating coil) 120, controls the temperature of the insulating window 110. The heating wire 120 is connected by wires to a heating power source (which can be either an AC power source or a DC power source).

電熱絲120上方設置有至少一個感應線圈140,感應線圈140通過一個匹配網路2連接到高頻射頻電源(如13MHz)。感應線圈140在被施加高頻射頻功率後產生一個高頻電磁場,這個高頻電磁場向下穿過電熱絲120和絕緣窗110進入反應腔室100內部,激發反應腔室100內的反應氣體產生並維持需要的電漿體。Above the heating wire 120, at least one induction coil 140 is disposed, and the induction coil 140 is connected to a high frequency RF power source (such as 13 MHz) through a matching network 2. The induction coil 140 generates a high frequency electromagnetic field after being applied with high frequency radio frequency power. The high frequency electromagnetic field passes through the heating wire 120 and the insulating window 110 into the reaction chamber 100 to excite the reaction gas in the reaction chamber 100 to be generated. Maintain the required plasma.

然而,電熱絲120在形成閉合迴路以實現對絕緣窗110加熱時,其在感應線圈140所產生的高頻電磁場作用下,會感應產生一個與感應線圈140高頻電磁場反向的電磁場。該反向電磁場作用至反應腔室100內部時,會抵消一部分感應線圈140所產生的高頻電磁場的作用(相當於抵消了一部分高頻射頻功率耦合至反應腔室100的能量),從而降低了電漿體密度。However, when the heating wire 120 forms a closed loop to heat the insulating window 110, it induces an electromagnetic field that is opposite to the high-frequency electromagnetic field of the induction coil 140 under the action of the high-frequency electromagnetic field generated by the induction coil 140. When the reverse electromagnetic field acts inside the reaction chamber 100, it cancels the effect of a part of the high frequency electromagnetic field generated by the induction coil 140 (corresponding to canceling the energy of a part of the high frequency RF power coupled to the reaction chamber 100), thereby reducing the Plasma density.

本發明的目的在於改善甚至是完全避免絕緣窗上方的電熱絲對感應線圈解離電漿體作用的削弱。It is an object of the present invention to improve or even completely avoid the weakening of the effect of the heating wire above the insulating window on the dissociation of the induction coil from the plasma.

根據本發明的一個方面,提供一種感應耦合電漿體處理裝置,包括:反應腔室,所述反應腔室的頂部設置有一絕緣窗;加熱部件,所述加熱部件包括設置在所述絕緣窗的上表面的電熱絲,所述電熱絲整體呈中心對稱,所述電熱絲具有用於與加熱電源電性連接以形成迴路的兩個接點;所述電熱絲環繞形成多個圖形,每一圖形和與該圖形中心對稱的圖形中的加熱電流方向相反;感應線圈,所述感應線圈設置在所述電熱絲的上方,並與射頻電源電性連接;所述感應線圈產生的電磁場於所述每一圖形所在區域內的磁通量,於與該圖形中心對稱的圖形所在區域內的磁通量,兩者總是相等。According to an aspect of the invention, there is provided an inductively coupled plasma processing apparatus comprising: a reaction chamber having an insulating window disposed at a top thereof; a heating member, wherein the heating member comprises a insulating window disposed a heating wire on the upper surface, the heating wire is entirely centrally symmetrical, and the heating wire has two contacts for electrically connecting with a heating power source to form a loop; the heating wire surrounds forming a plurality of graphics, each graphic The direction of the heating current is opposite to the direction of the heating current in the pattern symmetrical with the center of the pattern; the induction coil is disposed above the heating wire and electrically connected to the RF power source; the electromagnetic field generated by the induction coil is The magnetic flux in the area where a pattern is located is always equal to the magnetic flux in the area where the pattern is symmetric with the center of the figure.

可選的,所述感應線圈呈圓形,其圓心為所述電熱絲的對稱中心。Optionally, the induction coil has a circular shape, and a center of the circle is a symmetric center of the heating wire.

可選的,所述電熱絲包括多段相互平行的橫向延伸部以及連接相鄰橫向延伸部的連接部。Optionally, the heating wire comprises a plurality of parallel lateral extensions and a connection connecting adjacent lateral extensions.

可選的,所述橫向延伸部的端點位於所述絕緣窗的邊緣處,以使所述電熱絲在所述絕緣窗上佔據較大的區域。Optionally, the end of the lateral extension is located at an edge of the insulating window such that the heating wire occupies a larger area on the insulating window.

可選的,相鄰橫向延伸部之間的距離相等。Alternatively, the distance between adjacent lateral extensions is equal.

可選的,所述電熱絲包括兩層,其中,所述橫向延伸部與所述延伸部位於靠近所述絕緣窗的下層,一豎直部位於遠離所述絕緣窗的上層;所述豎直部的一端連接至所述下層的一橫向延伸部或連接部,另一端連接至所述兩個接點中的一個。Optionally, the heating wire comprises two layers, wherein the lateral extension and the extension are located near a lower layer of the insulating window, and a vertical portion is located at an upper layer away from the insulating window; One end of the portion is connected to a lateral extension or connection of the lower layer, and the other end is connected to one of the two contacts.

可選的,與所述豎直部相連的所述橫向延伸部或連接部,以及與所述豎直部相連的所述接點,分別位於所述電熱絲的兩端。Optionally, the lateral extension or connection portion connected to the vertical portion, and the contact point connected to the vertical portion are respectively located at two ends of the heating wire.

可選的,所述電熱絲整體位於同一層內,所述電熱絲實體穿過它的對稱中心。Optionally, the heating wire is entirely located in the same layer, and the heating wire entity passes through its symmetrical center.

可選的,所述加熱電源為交流電源或直流電源。Optionally, the heating power source is an alternating current power source or a direct current power source.

可選的,所述電熱絲以這樣的方式遍佈於所述絕緣窗的上表面:在絕緣窗所在的平面或與該平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自所述絕緣窗的一側延伸至絕緣窗之相對的另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述絕緣窗的所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。Optionally, the heating wire is distributed on the upper surface of the insulating window in such a manner that two directions perpendicular to each other, that is, a P direction and a Q direction, are defined in a plane where the insulating window is located or a plane parallel to the plane. The heating wire extends from one side of the insulating window in the P direction to the opposite side of the insulating window, and then extends to the other side in the Q direction to another position; in the other position Wherein, the heating wire extends in the opposite direction from the P direction from the other side of the insulating window to the one side; in this manner, the heating wire is gradually extended from one end in the Q direction to the other end. .

可選的,自所述Q方向上的所述另一端處,所述電熱絲又折返至所述Q方向上的所述一端;折返的電熱絲與折返點之前的電熱絲不位於同一平面內。Optionally, the heating wire is folded back to the one end in the Q direction from the other end in the Q direction; the electric heating wire that is folded back and the heating wire before the turning point are not in the same plane. .

可選的,所述折返的電熱絲呈直線型。Optionally, the folded electric heating wire is linear.

可選的,所述兩個接點均位於所述Q方向上的所述一端。Optionally, the two contacts are located at the one end in the Q direction.

可選的,折返的電熱絲與折返點之前的電熱絲之間以絕緣材料隔離。Optionally, the folded heating wire is insulated from the heating wire before the turning point by an insulating material.

可選的,折返的電熱絲為外周包覆絕緣皮的芯線。Optionally, the folded electric heating wire is a core wire covering the outer sheath.

可選的,折返的電熱絲的導電性優於折返點之前的電熱絲。Optionally, the electrically conductive wire of the folded back wire is superior to the electric heating wire before the turning point.

可選的,折返的電熱絲與折返點之前的電熱絲之間以隔熱材料隔離。Optionally, the folded electric heating wire is insulated from the heating wire before the turning point by an insulating material.

可選的,折返的電熱絲懸空於折返點之前的電熱絲上方。Optionally, the folded electric heating wire is suspended above the heating wire before the turning point.

可選的,所述電熱絲整體位於同一層內,包括設置於絕緣窗不同區域的左上部分、右上部分、左下部分與右下部分;其中,所述右下部分於對稱中心處與所述左上部分相連,所述左上部分與所述右上部分相連,所述右上部分於對稱中心處與所述左下部分相連。Optionally, the heating wire is entirely located in the same layer, and includes an upper left portion, an upper right portion, a lower left portion, and a lower right portion disposed in different regions of the insulating window; wherein the lower right portion is at a center of symmetry and the upper left portion The portions are connected, the upper left portion is connected to the upper right portion, and the upper right portion is connected to the lower left portion at a center of symmetry.

可選的,所述電熱絲的所述左上部分、右上部分、左下部分與右下部分中的任一個或全部以這樣的方式設置:在絕緣窗所在的平面或與該平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自所述絕緣窗的一側延伸至絕緣窗之相對的另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述絕緣窗的所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。Optionally, any one or all of the upper left portion, the upper right portion, the lower left portion, and the lower right portion of the heating wire are disposed in such a manner as to be defined in a plane in which the insulating window is located or a plane parallel to the plane Two directions perpendicular to each other, that is, a P direction and a Q direction; the heating wire extends from one side of the insulating window in the P direction to the opposite side of the insulating window, and then to the other side along the Q direction Extending to another location; at the other location, the heating wire extends in a direction opposite to the P direction from the other side of the insulating window to the one side; in this manner, The heating wire is gradually extended from one end in the Q direction to the other end.

根據本發明的另一個方面,提供一種用於感應耦合電漿體處理裝置的加熱部件,所述加熱部件用來對反應腔室頂部的絕緣窗進行溫度控制,所述加熱部件包括設置在所述絕緣窗的上表面的電熱絲,所述電熱絲整體呈中心對稱,所述電熱絲具有用於與加熱電源電性連接以形成迴路的兩個接點;所述電熱絲環繞形成多個圖形,每一圖形和與該圖形中心對稱的圖形中的加熱電流方向相反。According to another aspect of the present invention, there is provided a heating component for an inductively coupled plasma processing apparatus for temperature control of an insulating window at a top of a reaction chamber, the heating component comprising a heating wire on the upper surface of the insulating window, the heating wire is entirely centrally symmetrical, and the heating wire has two contacts for electrically connecting with a heating power source to form a loop; the heating wire surrounds forming a plurality of patterns, The direction of the heating current in each of the patterns and the pattern symmetrical with respect to the center of the pattern is opposite.

可選的,所述感應線圈呈圓形,其圓心為所述電熱絲的對稱中心。Optionally, the induction coil has a circular shape, and a center of the circle is a symmetric center of the heating wire.

可選的,所述電熱絲包括多段相互平行的橫向延伸部以及連接相鄰橫向延伸部的連接部。Optionally, the heating wire comprises a plurality of parallel lateral extensions and a connection connecting adjacent lateral extensions.

可選的,所述橫向延伸部的端點位於所述絕緣窗的邊緣處,以使所述電熱絲在所述絕緣窗上佔據較大的區域。Optionally, the end of the lateral extension is located at an edge of the insulating window such that the heating wire occupies a larger area on the insulating window.

可選的,相鄰橫向延伸部之間的距離相等。Alternatively, the distance between adjacent lateral extensions is equal.

可選的,所述電熱絲包括兩層,其中,所述橫向延伸部與所述延伸部位於靠近所述絕緣窗的下層,一豎直部位於遠離所述絕緣窗的上層;所述豎直部的一端連接至所述下層的一橫向延伸部或連接部,另一端連接至所述兩個接點中的一個。Optionally, the heating wire comprises two layers, wherein the lateral extension and the extension are located near a lower layer of the insulating window, and a vertical portion is located at an upper layer away from the insulating window; One end of the portion is connected to a lateral extension or connection of the lower layer, and the other end is connected to one of the two contacts.

可選的,與所述豎直部相連的所述橫向延伸部或連接部,以及與所述豎直部相連的所述接點,分別位於所述電熱絲的兩端。Optionally, the lateral extension or connection portion connected to the vertical portion, and the contact point connected to the vertical portion are respectively located at two ends of the heating wire.

可選的,所述電熱絲整體位於同一層內,所述電熱絲實體穿過它的對稱中心。Optionally, the heating wire is entirely located in the same layer, and the heating wire entity passes through its symmetrical center.

可選的,所述加熱電源為交流電源或直流電源。Optionally, the heating power source is an alternating current power source or a direct current power source.

可選的,所述電熱絲以這樣的方式設置:在一平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自一側延伸至另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。Optionally, the heating wire is disposed in such a manner that two directions perpendicular to each other, that is, a P direction and a Q direction are defined in one plane; the heating wire extends from one side to the other side in the P direction, and then Extending from the other side in the Q direction to another position; at the other position, the heating wire extends in the opposite direction of the P direction from the other side to the one side; In one mode, the heating wire gradually extends from one end in the Q direction to the other end.

可選的,自所述Q方向上的所述另一端處,所述電熱絲又折返至所述Q方向上的所述一端;折返的電熱絲與折返點之前的電熱絲不位於同一平面內。Optionally, the heating wire is folded back to the one end in the Q direction from the other end in the Q direction; the electric heating wire that is folded back and the heating wire before the turning point are not in the same plane. .

可選的,所述折返的電熱絲呈直線型。Optionally, the folded electric heating wire is linear.

可選的,所述兩個接點均位於所述Q方向上的所述一端。Optionally, the two contacts are located at the one end in the Q direction.

可選的,折返的電熱絲與折返點之前的電熱絲之間以絕緣材料隔離。Optionally, the folded heating wire is insulated from the heating wire before the turning point by an insulating material.

可選的,折返的電熱絲為外周包覆絕緣皮的芯線。Optionally, the folded electric heating wire is a core wire covering the outer sheath.

可選的,折返的電熱絲的導電性優於折返點之前的電熱絲。Optionally, the electrically conductive wire of the folded back wire is superior to the electric heating wire before the turning point.

可選的,折返的電熱絲的材質包括鋁合金或銅。Optionally, the material of the folded electric heating wire comprises aluminum alloy or copper.

可選的,折返的電熱絲與折返點之前的電熱絲之間以隔熱材料隔離。Optionally, the folded electric heating wire is insulated from the heating wire before the turning point by an insulating material.

可選的,所述隔熱材料包括鐵氟龍或者KAPTON。Optionally, the insulating material comprises Teflon or KAPTON.

可選的,折返的電熱絲懸空於折返點之前的電熱絲上方。Optionally, the folded electric heating wire is suspended above the heating wire before the turning point.

可選的,折返的電熱絲與折返點之前的電熱絲之間的距離大於或等於5mm。Optionally, the distance between the folded heating wire and the heating wire before the turning point is greater than or equal to 5 mm.

可選的,所述電熱絲整體位於同一層內,包括設置於絕緣窗不同區域的左上部分、右上部分、左下部分與右下部分;其中,所述右下部分於對稱中心處與所述左上部分相連,所述左上部分與所述右上部分相連,所述右上部分於對稱中心處與所述左下部分相連。Optionally, the heating wire is entirely located in the same layer, and includes an upper left portion, an upper right portion, a lower left portion, and a lower right portion disposed in different regions of the insulating window; wherein the lower right portion is at a center of symmetry and the upper left portion The portions are connected, the upper left portion is connected to the upper right portion, and the upper right portion is connected to the lower left portion at a center of symmetry.

可選的,所述電熱絲的所述左上部分、右上部分、左下部分與右下部分中的任一個或全部以這樣的方式設置:在絕緣窗所在的平面或與該平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自所述絕緣窗的一側延伸至絕緣窗之相對的另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述絕緣窗的所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。Optionally, any one or all of the upper left portion, the upper right portion, the lower left portion, and the lower right portion of the heating wire are disposed in such a manner as to be defined in a plane in which the insulating window is located or a plane parallel to the plane Two directions perpendicular to each other, that is, a P direction and a Q direction; the heating wire extends from one side of the insulating window in the P direction to the opposite side of the insulating window, and then to the other side along the Q direction Extending to another location; at the other location, the heating wire extends in a direction opposite to the P direction from the other side of the insulating window to the one side; in this manner, The heating wire is gradually extended from one end in the Q direction to the other end.

可選的,所述感應線圈產生的電磁場於所述每一圖形所在區域內的磁通量,於與該圖形中心對稱的圖形所在區域內的磁通量,兩者總是相等。Optionally, the electromagnetic field generated by the induction coil is perpendicular to the magnetic flux in the region where each of the patterns is located, and the magnetic flux in the region where the pattern is symmetric with the center of the pattern.

以下結合附圖,對本發明的感應耦合電漿體處理裝置、其加熱部件進行說明。需強調的是,這裡僅是示例型的闡述,不排除有其它利用本發明的實施方式。Hereinafter, the inductively coupled plasma processing apparatus and the heating member of the present invention will be described with reference to the accompanying drawings. It is emphasized that the description herein is merely exemplary and that other embodiments that utilize the invention are not excluded.

加熱部件的第一實施例First embodiment of a heating component

圖2至圖6是應用在感應耦合電漿體處理裝置以對其反應腔室頂部的絕緣窗進行溫度控制的加熱部件(特別是其電熱絲)的第一種實施方式的結構示意圖。這裡的感應耦合電漿體處理裝置的結構(除電熱絲外)均與圖1中相同,請參前面對圖1的描述,在此不贅述。以下重點描述電熱絲的細部結構和與其關聯的部件。2 to 6 are structural schematic views of a first embodiment of a heating member (particularly, a heating wire) applied to an inductively coupled plasma processing apparatus for temperature control of an insulating window at the top of its reaction chamber. The structure of the inductively coupled plasma processing apparatus (except the heating wire) is the same as that in FIG. 1, please refer to the description of FIG. 1 above, and details are not described herein. The following focuses on the detailed structure of the heating wire and the components associated therewith.

圖2是用於上述處理裝置的加熱部件的電熱絲的一種佈線方式圖。圖2中虛線框所勾畫的是絕緣窗110的形狀(其為圓形),而實體線條展示的是貼附在絕緣窗110上表面的電熱絲120的佈線形狀。電熱絲120的兩個端點T1、T2分別與加熱電源(其既可為交流電源,也可以是直流電源)的正負電極相連,以在加熱電源閉合後使電熱絲120能形成一閉合迴路;端點T1、T2也可稱之為與加熱電源電性連接的接點。整個電熱絲120可視為加熱電流從一個端點(如T1)傳輸至另一端點(如T2)的路徑圖。電熱絲120大體均勻地分佈在絕緣窗110的整個區域,可基本保證電熱絲120對絕緣窗110加熱的均勻性,防止大溫度梯度的出現。Fig. 2 is a wiring pattern diagram of a heating wire used for a heating member of the above processing apparatus. The dotted line frame in Fig. 2 outlines the shape of the insulating window 110 (which is a circle), and the solid line shows the wiring shape of the heating wire 120 attached to the upper surface of the insulating window 110. The two end points T1 and T2 of the heating wire 120 are respectively connected to the positive and negative electrodes of the heating power source (which may be an alternating current power source or a direct current power source) to enable the heating wire 120 to form a closed loop after the heating power source is closed; The terminals T1, T2 may also be referred to as contacts that are electrically connected to the heating source. The entire heating wire 120 can be viewed as a path map of the heating current being transmitted from one end (e.g., T1) to the other end (e.g., T2). The heating wire 120 is substantially evenly distributed over the entire area of the insulating window 110, and the heating uniformity of the heating wire 120 to the insulating window 110 can be substantially ensured, and the occurrence of a large temperature gradient is prevented.

為後文描述的方便,這裡根據形狀的差異將本實施例中的電熱絲120大致分為三個類型:(1)、多段相互平行的橫向延伸部(如線段H-H);(2)、用於連接相鄰橫向延伸部或用於連接接點(如T1)與橫向延伸部的連接部(如線段H-I);以及(3)、用於連接最靠上的N點與最靠下的接點T2的豎直部NT2。其中,豎直部NT2與多段橫向延伸部均異面相交,也就是說,豎直部NT2與橫向延伸部在圖中的交點處不發生電性接觸。For the convenience of the following description, the heating wire 120 in this embodiment is roughly divided into three types according to the difference in shape: (1), a plurality of horizontally extending portions parallel to each other (such as a line segment HH); (2) Connecting adjacent lateral extensions or connecting portions for connecting joints (such as T1) and lateral extensions (such as line segments HI); and (3) for connecting the uppermost N points with the lowermost connection Point the vertical portion NT2 of T2. Wherein, the vertical portion NT2 and the plurality of laterally extending portions both face each other, that is, the vertical portion NT2 and the laterally extending portion do not make electrical contact at the intersection of the figure.

繼續參照圖2,電熱絲120整體呈中心對稱,對稱中心為絕緣窗110的圓心O。由於感應線圈140(見圖1)亦呈圓形,並且在放置時其圓心會與絕緣窗的圓心重合,因而電熱絲120的對稱中心也即感應線圈140的圓心O。With continued reference to FIG. 2, the heating wire 120 is entirely centrally symmetric, and the center of symmetry is the center O of the insulating window 110. Since the induction coil 140 (see FIG. 1) is also circular, and its center will coincide with the center of the insulating window when placed, the center of symmetry of the heating wire 120 is also the center O of the induction coil 140.

電熱絲120在環繞絕緣窗110排布時,會環繞出多個(即兩個或更多)圖形(其所佔據的區域對應地稱之為繪圖區域)。這些圖形可以是封閉圖形,如P11、P12,也可以是非封閉圖形,如P21、P21。由於電熱絲120整體呈中心對稱,因而,每個圖形也必然存在與其中心對稱的圖形(即對稱圖形);兩者的面積相等。又因為感應線圈140的圓心為它們的對稱中心,因而由感應線圈140所產生的高頻電磁場在每對相互對稱(這裡的對稱指的是中心對稱,下同)的繪圖區域內的磁通量相等。When the heating wire 120 is arranged around the insulating window 110, a plurality of (i.e., two or more) patterns (the areas occupied by them are correspondingly referred to as drawing areas) are surrounded. These graphics can be closed graphics, such as P11, P12, or non-closed graphics, such as P21, P21. Since the heating wire 120 is entirely centrally symmetrical, each pattern must also have a pattern symmetrical with its center (ie, a symmetrical pattern); the areas of the two are equal. Also, since the center of the induction coil 140 is their symmetrical center, the high-frequency electromagnetic field generated by the induction coil 140 is equal in the magnetic flux in each of the pair of mutually symmetrical regions (here, the symmetry refers to the center symmetry, the same below).

在某一時刻,加熱電流在電熱絲120內的流通如圖中箭頭所標示:加熱電流自接點T1進入,而後依次通過多段橫向延伸部與連接部,到達最上方的N點,最後經豎直部NT2返回接點T2,從而完成一個迴路。在整個流通過程中,可以發現,每對對稱繪圖區域的電流方向都是相反的(注意:這裡所說的電流方向指的是順時針方向、逆時針方向)。比如,繪圖區域P11中的電流為逆時針方向,它的對稱繪圖區域P12則是順時針方向;繪圖區域P21中的電流為順時針方向,它的對稱繪圖區域P22則是逆時針方向。綜合以上可知,每對對稱繪圖區域的磁通量相等,電流方向相反,因而它們的磁通量可相互完全抵消。由於整個電熱絲120可視為由一對或多對對稱繪圖區域拼合而成,而每對對稱區域的磁通量又為零,因而,整個電熱絲120的總磁通量為零,從而在感應線圈140的高頻電磁場中不感生出反向電磁場。At a certain moment, the circulation of the heating current in the heating wire 120 is indicated by the arrow in the figure: the heating current enters from the contact point T1, and then passes through the plurality of lateral extensions and the connecting portion in turn, reaches the uppermost point N, and finally passes through the vertical Straight NT2 returns to contact T2, completing a loop. Throughout the flow, it can be seen that the current direction of each pair of symmetric drawing areas is reversed (Note: the current direction referred to herein refers to clockwise and counterclockwise directions). For example, the current in the drawing area P11 is counterclockwise, and its symmetrical drawing area P12 is clockwise; the current in the drawing area P21 is clockwise, and its symmetric drawing area P22 is counterclockwise. In summary, the magnetic flux of each pair of symmetric drawing areas is equal, and the current directions are opposite, so that their magnetic fluxes can completely cancel each other. Since the entire heating wire 120 can be formed by combining one or more pairs of symmetric drawing areas, and the magnetic flux of each pair of symmetric areas is zero, the total magnetic flux of the entire heating wire 120 is zero, so that the height of the induction coil 140 is high. A reverse electromagnetic field is not induced in the frequency electromagnetic field.

說明一點,由於這裡的圖形或繪圖區域要對應順時針電流方向、逆時針電流方向的概念,因而,對於那些不能判斷出其內部電流是順時針方向還是逆時針方向的圖形或繪圖區域不能視為本發明所定義的圖形或繪圖區域。To illustrate, since the pattern or drawing area here corresponds to the clockwise current direction and the counterclockwise current direction, it is not considered as a graphic or drawing area where it is impossible to judge whether the internal current is clockwise or counterclockwise. A graphic or drawing area as defined by the present invention.

每一橫向延伸部(如H-H等)的兩端點(即起止點)位於絕緣窗110的邊緣處(即儘量靠近圖中的虛線框),以使得其圖形能夠盡可能大地鋪展開來,佔據盡可能大的絕緣窗110區域。另外,橫向延伸部之間的距離(即相鄰橫向延伸部的間距)也盡可能地保持相等,從而加強加熱的均勻性。The two end points (ie, the starting and ending points) of each lateral extension (such as HH, etc.) are located at the edge of the insulating window 110 (ie, as close as possible to the dashed box in the figure), so that the graphics can be spread as large as possible, occupying As large as possible the area of the insulating window 110. In addition, the distance between the lateral extensions (i.e., the spacing of adjacent lateral extensions) is also kept as equal as possible to enhance the uniformity of heating.

圖3、圖4分別是圖2沿線A-A、B-B的截面圖。如圖3與圖4所示,電熱絲120的底層結構(底層結構主要包括橫向延伸部與連接部;圖中示出的是橫向延伸部)貼附在絕緣窗110的上表面,是供熱的主要結構。該底層結構的上方覆蓋一層絕緣材料層125,豎直部NT2設置在絕緣材料層125的上方。電熱絲120最上方的所述N點通過一穿過絕緣材料層125的導電結構C電性連接至豎直部NT2。3 and 4 are cross-sectional views taken along line A-A and B-B of Fig. 2, respectively. As shown in FIG. 3 and FIG. 4, the underlying structure of the heating wire 120 (the bottom structure mainly includes a lateral extending portion and a connecting portion; the lateral extending portion is shown in the drawing) is attached to the upper surface of the insulating window 110, and is heated. The main structure. The underlying structure is covered with a layer of insulating material 125, and the vertical portion NT2 is disposed above the layer of insulating material 125. The N point at the uppermost portion of the heating wire 120 is electrically connected to the vertical portion NT2 through a conductive structure C passing through the insulating material layer 125.

圖5是圖2所示電熱絲120的底層結構(指的是最貼近下方絕緣窗110的層)的示意圖。如圖5所示,該底層結構包括了除豎直部NT2外的電熱絲120的所有結構。5 is a schematic view of the underlying structure of the heating wire 120 of FIG. 2 (referring to the layer closest to the lower insulating window 110). As shown in FIG. 5, the underlying structure includes all of the structures of the heating wire 120 except for the vertical portion NT2.

如圖5所示,電熱絲120的底層結構以這樣的方式遍佈於絕緣窗110的上表面:在絕緣窗110所在的平面或與該平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;與P、Q方向相反的方向記為P’、Q’方向。相應的,圖中的上方、上端可表述為Q端,圖中的下方、下端可表述為Q’端;圖中的左方、左側可表述為P’側,圖中的右方、右側可表述為P側。比如,自圖中的R點開始,電熱絲120沿P方向自絕緣窗110的一側(即P’側,或者說圖中的左側)延伸至絕緣窗110之相對的另一側(即P側,或者說圖中的右側),如S點;而後於所述另一側(即P側)沿Q方向延伸至另一位置(或稱另一高度)處,如T點;在所述另一位置處(或者說所述另一高度上),電熱絲120沿P方向的反方向(即P’方向)又自絕緣窗110的所述另一側(即P側)延伸至所述一側(即P’側),比如圖中的U點處;以此方式,電熱絲120逐步自Q方向上的一端(即圖中的下端,Q’端)延伸至另一端(即圖中的上端,Q端),並大致排滿幾乎整個絕緣窗110。As shown in FIG. 5, the underlying structure of the heating wire 120 is distributed over the upper surface of the insulating window 110 in such a manner that two directions perpendicular to each other are defined in a plane in which the insulating window 110 is located or a plane parallel to the plane, that is, P The direction and the Q direction; the direction opposite to the P and Q directions is denoted as the P', Q' direction. Correspondingly, the upper and upper ends in the figure can be expressed as Q end, and the lower and lower ends in the figure can be expressed as Q' end; the left side and the left side in the figure can be expressed as P' side, and the right side and the right side in the figure can be Expressed as the P side. For example, starting from point R in the figure, the heating wire 120 extends from the side of the insulating window 110 (ie, the P' side, or the left side in the drawing) to the opposite side of the insulating window 110 in the P direction (ie, P). Side, or the right side of the figure, such as point S; and then on the other side (ie, the P side) extends in the Q direction to another position (or another height), such as point T; At another location (or at the other height), the opposite direction of the heating wire 120 in the P direction (ie, the P' direction) extends from the other side of the insulating window 110 (ie, the P side) to the One side (ie, the P' side), such as the U point in the figure; in this way, the heating wire 120 gradually extends from one end in the Q direction (ie, the lower end in the figure, the Q' end) to the other end (ie, in the figure) The upper end, Q end), and is substantially filled with almost the entire insulating window 110.

說明一點,本說明中及請求項中,所稱的一端與另一端、一側與另一側只是要表明兩者的相對位置;“一端”與“另一端”(以及,“一側”與“另一側”)只有成對出現才有真實、具體的含義。比如,這裡所說的,“電熱絲120沿P方向自絕緣窗110的一側(如R點)延伸至絕緣窗110之相對的另一側(如S點)”,只是要表明這裡的起始點R點與終點S點在P方向上存在相對距離。也就是說,“R點位於絕緣窗的左側,S點位於絕緣窗的右側”沒有要表達“R點必須是要位於絕緣窗的最左側邊緣,S點必須是要位於絕緣窗的最右側邊緣”這樣的位置關係,而只是要表達“在左右方向上,R點相比S點更靠左”這個意思。In the description and the claims, the one end and the other end, one side and the other side are only to indicate the relative positions of the two; "one end" and "the other end" (and, "one side" and "The other side" only has a true and specific meaning when it appears in pairs. For example, as referred to herein, "the heating wire 120 extends from one side of the insulating window 110 (such as point R) in the P direction to the opposite side of the insulating window 110 (such as point S)", just to indicate the starting point here. There is a relative distance between the starting point R point and the ending point S point in the P direction. That is, "R point is on the left side of the insulating window, S point is on the right side of the insulating window". There is no need to express "R point must be located at the leftmost edge of the insulating window, and point S must be located at the rightmost edge of the insulating window. "This positional relationship, but just to express "in the left and right direction, the point R is more left than the S point".

另外,這裡所定義的P方向與Q方向也可以有很多其它選擇;或者說,P方向與Q方向可以是隨意選擇的,只要滿足兩者垂直即可。因為,這裡借助P方向與Q方向建立的坐標系,只是為了方便描述電熱絲的形狀等特徵;採用其它坐標系或乾脆不採用坐標系輔助描述電熱絲的特徵,都不會改變電熱絲實際形狀的分毫,只是可能描述困難或麻煩一點而已。在圖5中,是以紙面中豎直向上的方向作為Q方向,以水準向右的方向作為P方向,來對電熱絲的形狀進行描述的。可以想見,這裡也完全可以相反的方向(即以圖5中的P’方向作為P方向,Q’方向作為Q方向)或其它方式建立坐標系描述電熱絲。In addition, there may be many other options for the P direction and the Q direction defined herein; alternatively, the P direction and the Q direction may be arbitrarily selected as long as the two are perpendicular. Because the coordinate system established by the P direction and the Q direction here is only for the convenience of describing the shape of the heating wire, etc.; using other coordinate systems or simply not using the coordinate system to describe the characteristics of the heating wire, the actual shape of the heating wire is not changed. The points are only a matter of difficulty or trouble. In Fig. 5, the shape of the heating wire is described by taking the direction of the vertical direction in the paper surface as the Q direction and the direction of the right direction as the P direction. It is conceivable that the coordinate system description heating wire can also be established in the opposite direction (i.e., the P direction in Fig. 5 as the P direction, the Q' direction as the Q direction) or other means.

在製備電熱絲120時,可先通過鏤空金屬薄板的方式(也可通過彎折金屬條的方式)形成如圖5所示的底層結構。而後在該底層結構上形成(比如,可通過注塑的方式)一層絕緣材料層125。絕緣材料層125製備時,最好能保持N點以及接點T1等外露而不被絕緣材料覆蓋;當然,在該些點N、T1被絕緣材料層125覆蓋時,可通過挖孔的方式將它們外露。最後,在絕緣材料層125設置豎直部NT2,並將豎直部NT2與底層結構的N點連在一起。In the preparation of the heating wire 120, the underlying structure as shown in FIG. 5 can be formed by hollowing out a thin metal plate (also by bending a metal strip). A layer of insulating material 125 is then formed (e.g., by injection molding) on the underlying structure. When the insulating material layer 125 is prepared, it is preferable to keep the N point and the contact T1 and the like exposed without being covered by the insulating material; of course, when the points N and T1 are covered by the insulating material layer 125, the hole can be punctured. They are exposed. Finally, a vertical portion NT2 is provided on the insulating material layer 125, and the vertical portion NT2 is joined to the N point of the underlying structure.

為簡化電熱絲120的製作流程,可以帶絕緣皮的纜線(所述纜線至少包括兩層:位於中心並作為電導體的芯線,以及包覆在芯線圓周的絕緣皮)作為豎直部NT2。在形成上述底層結構後,可直接將上述纜線放置在底層結構上,而後調整它們的相對位置使纜線與橫向延伸部垂直。之後,將纜線的一端與底層結構的N點電性連接起來(比如,可通過焊接或纏繞導線的方式)。最後,在底層結構和纜線的上方形成絕緣材料層125。In order to simplify the manufacturing process of the heating wire 120, a cable with an insulating sheath (the cable includes at least two layers: a core wire located at the center and serving as an electrical conductor, and an insulating sheath covering the circumference of the core wire) as a vertical portion NT2 . After forming the underlying structure, the cables can be placed directly on the underlying structure and their relative positions adjusted to make the cable perpendicular to the lateral extension. Thereafter, one end of the cable is electrically connected to the N point of the underlying structure (for example, by soldering or winding the wire). Finally, a layer of insulating material 125 is formed over the underlying structure and the cable.

絕緣窗110上的溫度會受電熱絲120排布密度的影響,單位區域內電熱絲120存在越多則產生的熱量也越多。與圖中所示,豎直部NT2與橫向延伸部之間存在多個交點;如果整個電熱絲120內的電熱絲120都是均勻發熱的話,那麼上述交點所在位置處的發熱量將會是其它區域的兩倍,這樣就會產生熱點,不利於絕緣窗110的溫度均勻分佈。為避免這一問題,可以選擇導電性更高的材料作為豎直部NT2的材料(或者乾脆使豎直部NT2幾乎不發熱,使其僅作為優良的導體而存在)。比如,以鎳鎘合金或者鎢合金作為上述底層結構的材料,以導電性更好的鋁合金或銅作為豎直部NT2的材料。這樣,豎直部NT2的電阻明顯小於其它區域,其單位長度的發熱量也明顯小於其它區域,因而,交點位置處的發熱量也與其它區域接近。The temperature on the insulating window 110 is affected by the arrangement density of the heating wire 120, and the more the heating wire 120 is present in the unit area, the more heat is generated. As shown in the figure, there are a plurality of intersections between the vertical portion NT2 and the lateral extension portion; if the heating wire 120 in the entire heating wire 120 is uniformly heated, the heat generated at the position of the intersection point will be other Double the area, which will generate hot spots, which is not conducive to the uniform distribution of the temperature of the insulating window 110. To avoid this problem, a material having higher conductivity can be selected as the material of the vertical portion NT2 (or the vertical portion NT2 is hardly heated so that it exists only as an excellent conductor). For example, a nickel-cadmium alloy or a tungsten alloy is used as the material of the above-mentioned underlayer structure, and an aluminum alloy or copper having better conductivity is used as the material of the vertical portion NT2. Thus, the resistance of the vertical portion NT2 is significantly smaller than that of other regions, and the heat generation per unit length is also significantly smaller than other regions, and thus the amount of heat generated at the intersection position is also close to other regions.

除了前面所描述的利用不同電阻率的材料外,其它方法也可以用來解決減少交點處的發熱量這一問題。In addition to the materials described above that utilize different resistivities, other methods can be used to address the problem of reducing the amount of heat at the intersection.

比如,可以採用隔熱材料(其相當於圖3與圖4中所示的絕緣材料層125)隔離交點處的上下層電熱絲;上述隔熱材料的厚度足夠大時,可以使得僅緊貼絕緣窗110的電熱絲(即,上述的底層結構)產生的熱量才能擴散至絕緣窗110,上層的電熱絲(即,豎直部NT2)產生的熱量被隔熱材料所阻隔、不會對下方的絕緣窗110有明顯影響。隔熱材料可以選擇鐵氟龍或者KAPTON(聚醯亞胺膠帶),既能實現電絕緣也能防止熱量傳導。For example, an insulating material (which corresponds to the insulating material layer 125 shown in FIG. 3 and FIG. 4) may be used to isolate the upper and lower electric heating wires at the intersection; when the thickness of the insulating material is sufficiently large, the insulating material may be tightly insulated only The heat generated by the heating wire of the window 110 (i.e., the above-mentioned underlying structure) can be diffused to the insulating window 110, and the heat generated by the upper heating wire (ie, the vertical portion NT2) is blocked by the insulating material and does not belong to the lower portion. The insulating window 110 has a significant effect. Insulation materials can be selected from Teflon or KAPTON (polyimide tape) to achieve electrical insulation and heat transfer.

又如,可以將豎直部NT2懸空在整個絕緣窗110的上方;一般而言,保證豎直部NT2的下表面高度在所述橫向延伸部的上表面上方5mm以上就能有效防止多餘的熱量傳導到下方的絕緣窗110。For another example, the vertical portion NT2 may be suspended above the entire insulating window 110; generally, it is ensured that the lower surface height of the vertical portion NT2 is more than 5 mm above the upper surface of the laterally extending portion to effectively prevent excess heat. Conducted to the underlying insulating window 110.

不僅如此,所述底層結構與豎直部NT2採用同樣電阻材料時,也可以通過改變不同部位電熱絲的橫截面來改變發熱量。Moreover, when the underlying structure and the vertical portion NT2 are made of the same resistive material, the heat generation amount can also be changed by changing the cross section of the electric heating wire at different portions.

圖6是圖2中一對特殊對稱圖形或者說對稱繪圖區域的放大圖。其中的D1區域包含了與加熱電源相連的兩個接點T1、T2,由於T1與T2不能直接連接在一起,因而D1未完全封閉。與D1中心對稱的D2(參圖2)卻是個封閉圖形,因而兩者在圖形上存在了細微的差別。這在一定程度上使得D1、D2未能絕對地呈中心對稱。這裡要強調的是,這種情形仍構成了本發明所稱的“呈中心對稱”。也就是說,這種非絕對中心對稱的程度只要還能夠滿足兩者的磁通量基本相同(業內認為兩者磁通量雖有細微差異,但這個差異幾乎沒有意義),就仍能被視為本發明所稱的“呈中心對稱”,因為只要它們的電流方向相反,兩者的磁通量也大致能完全抵消,實現發明目的。Figure 6 is an enlarged view of a pair of special symmetrical figures or symmetric drawing areas of Figure 2. The D1 area contains two contacts T1 and T2 connected to the heating power source. Since T1 and T2 cannot be directly connected together, D1 is not completely closed. D2 (see Figure 2), which is symmetric with the center of D1, is a closed figure, so there are subtle differences in the graphics. This makes D1 and D2 not completely symmetrical in the center. It is emphasized here that this situation still constitutes the "central symmetry" referred to in the present invention. That is to say, the degree of such non-absolute central symmetry can be regarded as the present invention as long as it can satisfy the fact that the magnetic fluxes of the two are substantially the same (the industry believes that there are slight differences in the magnetic flux between the two, but the difference is almost meaningless). The so-called "central symmetry", because as long as their current direction is opposite, the magnetic flux of the two can be roughly canceled completely, achieving the purpose of the invention.

加熱部件的第二實施例Second embodiment of a heating component

圖7是用於上述處理裝置的加熱部件的電熱絲的另一種佈線方式圖。如圖7所示,電熱絲220整體亦呈中心對稱,對稱中心為絕緣窗110的圓心。由於感應線圈140(見圖1)亦呈圓形,並且在放置時其圓心會與絕緣窗的圓心重合,因而電熱絲220的對稱中心也即感應線圈140的圓心。Fig. 7 is a view showing another wiring pattern of the heating wire used for the heating member of the above processing apparatus. As shown in FIG. 7, the heating wire 220 is also centrally symmetric as a whole, and the center of symmetry is the center of the insulating window 110. Since the induction coil 140 (see FIG. 1) is also circular, and its center coincides with the center of the insulating window when placed, the center of symmetry of the heating wire 220 is also the center of the induction coil 140.

與前面實施例類似,電熱絲220也包括了多段相互平行的橫向延伸部,以及用於連接相鄰橫向延伸部或用於連接接點(如T1、T2)與橫向延伸部的連接部。但是,它的一個橫向延伸部的長度大約只有前面實施例對應部分的一半,位於同一直線上的兩個橫向延伸部合在一起才相當於前面實施例中的一個。Similar to the previous embodiment, the heating wire 220 also includes a plurality of mutually parallel lateral extensions, and a connection for joining adjacent lateral extensions or for connecting the contacts (e.g., T1, T2) to the lateral extensions. However, the length of one of its lateral extensions is only about half of the corresponding portion of the previous embodiment, and the two lateral extensions on the same line are joined together to be equivalent to one of the previous embodiments.

下面介紹電熱絲220的繞線方式(或者說加熱電流在電熱絲220中的路徑)。為描述的方便,以經過對稱中心O的兩條虛直線,將電熱絲220及絕緣窗110劃分為四個部分:左上部分、右上部分、左下部分與右下部分。如圖中所示,電熱絲220自接點T1處開始先在右下方的四分之一圓形區域內完成該區域的纏繞(或者說佈線),然後穿過圓心進入左上方的四分之一圓形區域;完成左上區域的繞線後,則開始對其相鄰的右上區域的繞線;右上區域的繞線完成後,則再次穿過圓心進行左下區域的繞線,並形成另一接點T2。The winding mode of the heating wire 220 (or the path of the heating current in the heating wire 220) will be described below. For convenience of description, the heating wire 220 and the insulating window 110 are divided into four parts by two imaginary straight lines passing through the symmetry center O: an upper left part, an upper right part, a lower left part, and a lower right part. As shown in the figure, the heating wire 220 completes the winding (or wiring) of the area in the quarter-circular area in the lower right from the contact point T1, and then enters the upper left quarter by the center of the circle. a circular area; after completing the winding of the upper left area, the winding of the upper right area is started; after the winding of the upper right area is completed, the winding of the lower left area is again passed through the center of the circle, and another Contact T2.

電熱絲220的左上部分、右上部分、左下部分與右下部分中的任一個或全部以類似於圖2實施例中的方式設置於絕緣窗110的上表面的對應區域:在絕緣窗110所在的平面或與該平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;與P、Q方向相反的方向記為P’、Q’方向。相應的,圖中的上方、上端可表述為Q端,圖中的下方、下端可表述為Q’端;圖中的左方、左側可表述為P’側,圖中的右方、右側可表述為P側。比如,自圖中的R’點開始,電熱絲220沿P方向自絕緣窗110的一側(即P’側,或者說圖中的左側)延伸至絕緣窗110之相對的另一側(即P側,或者說圖中的右側),如S’點;而後於所述另一側(即P側)沿Q方向延伸至另一位置(或稱另一高度)處,如T’點;在所述另一位置處(或者說所述另一高度上),電熱絲220沿P方向的反方向(即P’方向)又自絕緣窗110的所述另一側(即P側)延伸至所述一側(即P’側),比如圖中的U’點處;以此方式,電熱絲120逐步自Q方向上的一端(即圖中的下端,Q’端)延伸至另一端(即圖中的上端,Q端),並大致排滿所屬區域。Any one or all of the upper left portion, the upper right portion, the lower left portion, and the lower right portion of the heating wire 220 are disposed in corresponding regions of the upper surface of the insulating window 110 in a manner similar to that in the embodiment of FIG. 2: where the insulating window 110 is located The plane or the plane parallel to the plane defines two directions perpendicular to each other, that is, the P direction and the Q direction; and the directions opposite to the P and Q directions are denoted as P' and Q' directions. Correspondingly, the upper and upper ends in the figure can be expressed as Q end, and the lower and lower ends in the figure can be expressed as Q' end; the left side and the left side in the figure can be expressed as P' side, and the right side and the right side in the figure can be Expressed as the P side. For example, starting from the point R' in the figure, the heating wire 220 extends from the side of the insulating window 110 (ie, the P' side, or the left side in the drawing) to the opposite side of the insulating window 110 in the P direction (ie, The P side, or the right side in the figure), such as the S' point; and then the other side (ie, the P side) extends in the Q direction to another position (or another height), such as the T' point; At the other position (or at the other height), the heating wire 220 extends in the opposite direction of the P direction (ie, the P' direction) from the other side of the insulating window 110 (ie, the P side). To the side (ie, the P' side), such as the U' point in the figure; in this manner, the heating wire 120 is gradually extended from one end in the Q direction (ie, the lower end in the figure, the Q' end) to the other end. (ie the upper end of the figure, Q end), and roughly fill the area.

這種佈線方式不但使得電熱絲220保留了前面實施例中電熱絲120的主要優點,還使得其具有了一些獨特的功效。比如,電熱絲220(除交點O處)整體大致位於同一平面內。又如,它不再需要一條單獨的豎直部NT2。——豎直部NT2與橫向延伸部、連接部等不位於同一層內(或者說同一平面內),因而,它的存在會增加製造的複雜度及成本。This wiring not only allows the heating wire 220 to retain the main advantages of the heating wire 120 in the previous embodiment, but also gives it some unique effects. For example, the heating wire 220 (except the intersection point O) is generally located in the same plane. As another example, it no longer requires a separate vertical portion NT2. - The vertical portion NT2 is not located in the same layer (or in the same plane) as the lateral extension, the connection portion, etc., and thus its presence increases the complexity and cost of manufacture.

需說明的是,電熱絲220也存在一個交點(位於圓心O處)。為避免該交點成為加熱過程中的熱點,可採用前面實施例中相同的方法對其處理;比如,採用隔熱材料等。另外,前面實施例中的說明及很多措施也大都適用於此,這裡不再重複描述。It should be noted that the heating wire 220 also has an intersection point (located at the center O). In order to prevent the intersection from becoming a hot spot in the heating process, it may be treated in the same manner as in the previous embodiment; for example, a heat insulating material or the like is used. In addition, the descriptions in the foregoing embodiments and many measures are also mostly applicable thereto, and the description thereof will not be repeated here.

在本發明的描述中,需要說明的是,除非另有明確的規定和限定,術語“相連”、“電連接”應做廣義理解,例如,可以是直接相連,也可以通過中間媒介間接相連。對於本領域具有通常知識者而言,可以具體情況理解上述術語在本發明中的具體含義。In the description of the present invention, it should be noted that the terms "connected" and "electrically connected" are to be understood broadly, and may be directly connected or indirectly connected through an intermediate medium, unless otherwise specifically defined and defined. For those of ordinary skill in the art, the specific meaning of the above terms in the present invention can be understood in specific circumstances.

儘管本發明的內容已經通過上述優選實施例作了詳細介紹,但應當認識到上述的描述不應被認為是對本發明的限制。在本領域中具有通常知識者閱讀了上述內容後,對於本發明的多種修改和替代都將是顯而易見的。因此,本發明的保護範圍應由所附的請求項來限定。Although the present invention has been described in detail by the preferred embodiments thereof, it should be understood that the foregoing description should not be construed as limiting. Various modifications and alterations of the present invention will be apparent to those of ordinary skill in the art. Accordingly, the scope of the invention should be defined by the appended claims.

1、2‧‧‧匹配網路
100‧‧‧反應腔室
110‧‧‧絕緣窗
120‧‧‧電熱絲
125‧‧‧絕緣材料層
140‧‧‧感應線圈
20‧‧‧基座
220‧‧‧電熱絲
C‧‧‧導電結構
D1、D2‧‧‧區域
N‧‧‧點
NT2‧‧‧豎直部
O‧‧‧圓心
P、P’‧‧‧方向
P11、P21‧‧‧繪圖區域
P12、P22‧‧‧對稱繪圖區域
Q、Q’‧‧‧方向
R、R’‧‧‧點
S、S’‧‧‧點
T、T’‧‧‧點
T1、T2‧‧‧點
U、U’‧‧‧點
1, 2‧‧‧ matching network
100‧‧‧reaction chamber
110‧‧‧Insulated window
120‧‧‧Electrical wire
125‧‧‧Insulation layer
140‧‧‧Induction coil
20‧‧‧ Pedestal
220‧‧‧Electric heating wire
C‧‧‧Electrical structure
D1, D2‧‧‧ area
N‧‧ points
NT2‧‧‧ vertical
O‧‧‧ Center
P, P'‧‧‧ direction
P11, P21‧‧‧ drawing area
P12, P22‧‧ symmetrical drawing area
Q, Q'‧‧‧ direction
R, R'‧‧‧ points
S, S'‧‧‧
T, T'‧‧‧ points
T1, T2‧‧‧ points
U, U'‧‧‧ points

通過閱讀參照以下附圖對非限制性實施例所作的詳細描述,本發明的其它特徵、目的和優點將會變得更明顯: [圖1]是感應耦合電漿體處理裝置的結構示意圖; [圖2]是用於上述處理裝置的加熱部件的電熱絲的一種佈線結構示意圖; [圖3]是[圖2]沿線A-A的截面結構示意圖; [圖4]是[圖2]沿線B-B的截面結構示意圖; [圖5]是[圖2]所示電熱絲的底層佈線結構示意圖; [圖6]是[圖2]的局部放大圖; [圖7]是用於上述處理裝置的加熱部件的電熱絲的另一種佈線結構示意圖。Other features, objects, and advantages of the present invention will become more apparent from the detailed description of the accompanying drawings <RTIgt; Fig. 2] is a schematic view showing a wiring structure of a heating wire used for a heating member of the above processing apparatus; [Fig. 3] is a schematic sectional view of [Fig. 2] along line AA; [Fig. 4] is a section [Fig. 2] along line BB [FIG. 5] is a schematic diagram of the underlying wiring structure of the electric heating wire shown in [FIG. 2]; [FIG. 6] is a partial enlarged view of [FIG. 2]; [FIG. 7] is a heating member for the above-described processing apparatus. Another schematic diagram of the wiring structure of the heating wire.

110‧‧‧絕緣窗 110‧‧‧Insulated window

120‧‧‧電熱絲 120‧‧‧Electrical wire

D1、D2‧‧‧區域 D1, D2‧‧‧ area

N‧‧‧點 N‧‧ points

O‧‧‧圓心 O‧‧‧ Center

P11、P21‧‧‧繪圖區域 P11, P21‧‧‧ drawing area

P12、P22‧‧‧對稱繪圖區域 P12, P22‧‧ symmetrical drawing area

T1、T2‧‧‧點 T1, T2‧‧‧ points

Claims (25)

一種感應耦合電漿體處理裝置,包含: 反應腔室,所述反應腔室的頂部設置有一絕緣窗; 加熱部件,所述加熱部件包括設置在所述絕緣窗的上表面的電熱絲,所述電熱絲整體呈中心對稱,所述電熱絲具有用於與加熱電源電性連接以形成迴路的兩個接點;所述電熱絲環繞形成多個圖形,每一圖形和與所述圖形中心對稱的圖形中的加熱電流方向相反; 感應線圈,所述感應線圈設置在所述電熱絲的上方,並與射頻電源電性連接;所述感應線圈產生的電磁場於所述每一圖形所在區域內的磁通量,於與所述圖形中心對稱的圖形所在區域內的磁通量,兩者總是相等。An inductively coupled plasma processing apparatus comprising: a reaction chamber having an insulating window disposed at a top thereof; a heating member, the heating member comprising an electric heating wire disposed on an upper surface of the insulating window, The heating wire is entirely centrally symmetrical, and the heating wire has two contacts for electrically connecting with the heating power source to form a loop; the heating wire surrounds forming a plurality of patterns, each of which is symmetrical with the center of the pattern The heating current in the pattern is opposite in direction; the induction coil is disposed above the heating wire and electrically connected to the RF power source; the electromagnetic field generated by the induction coil is in the magnetic flux in the area where each of the patterns is located The magnetic flux in the region of the pattern symmetrical with the center of the pattern is always equal. 如請求項1所述的感應耦合電漿體處理裝置,其中,所述感應線圈呈圓形,其圓心為所述電熱絲的對稱中心。The inductively coupled plasma processing apparatus according to claim 1, wherein the induction coil has a circular shape whose center is a symmetrical center of the heating wire. 如請求項1所述的感應耦合電漿體處理裝置,其中,所述電熱絲包括多段相互平行的橫向延伸部以及連接相鄰橫向延伸部的連接部。The inductively coupled plasma processing apparatus according to claim 1, wherein the heating wire comprises a plurality of laterally extending portions extending parallel to each other and a connecting portion connecting adjacent laterally extending portions. 如請求項3所述的感應耦合電漿體處理裝置,其中,所述橫向延伸部的端點位於所述絕緣窗的邊緣處,以使所述電熱絲在所述絕緣窗上佔據較大的區域。The inductively coupled plasma processing apparatus of claim 3, wherein an end point of the lateral extension is located at an edge of the insulating window such that the heating wire occupies a large portion on the insulating window region. 如請求項3所述的感應耦合電漿體處理裝置,其中,所述相鄰橫向延伸部之間的距離相等。The inductively coupled plasma processing apparatus of claim 3, wherein the distance between the adjacent lateral extensions is equal. 如請求項3所述的感應耦合電漿體處理裝置,其中,所述電熱絲包括兩層,其中,所述橫向延伸部與所述延伸部位於靠近所述絕緣窗的下層,一豎直部位於遠離所述絕緣窗的上層;所述豎直部的一端連接至所述下層的一橫向延伸部或連接部,另一端連接至所述兩個接點中的一個。The inductively coupled plasma processing apparatus of claim 3, wherein the heating wire comprises two layers, wherein the lateral extension and the extension are located adjacent to a lower layer of the insulating window, a vertical portion Located at an upper layer remote from the insulating window; one end of the vertical portion is connected to a lateral extension or connection of the lower layer, and the other end is connected to one of the two contacts. 如請求項6所述的感應耦合電漿體處理裝置,其中,與所述豎直部相連的所述橫向延伸部或連接部,以及與所述豎直部相連的所述接點,分別位於所述電熱絲的兩端。The inductively coupled plasma processing apparatus of claim 6, wherein the lateral extension or connection portion connected to the vertical portion, and the contact point connected to the vertical portion are respectively located Both ends of the heating wire. 如請求項3所述的感應耦合電漿體處理裝置,其中,所述電熱絲整體位於同一層內,所述電熱絲實體穿過它的對稱中心。The inductively coupled plasma processing apparatus of claim 3, wherein the heating wire is entirely located in the same layer, and the heating wire entity passes through its symmetrical center. 如請求項1所述的感應耦合電漿體處理裝置,其中,所述電熱絲以這樣的方式遍佈於所述絕緣窗的上表面:在絕緣窗所在的平面或與所述平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自所述絕緣窗的一側延伸至絕緣窗之相對的另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述絕緣窗的所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。The inductively coupled plasma processing apparatus according to claim 1, wherein the heating wire is distributed over the upper surface of the insulating window in such a manner that a plane in which the insulating window is located or a plane parallel to the plane Defining two directions perpendicular to each other, that is, a P direction and a Q direction; the heating wire extending from one side of the insulating window to the opposite side of the insulating window in the P direction, and then to the other side edge Q The direction extends to another position; at the other position, the opposite direction of the heating wire in the P direction extends from the other side of the insulating window to the one side; The electric heating wire is gradually extended from one end in the Q direction to the other end. 如請求項9所述的感應耦合電漿體處理裝置,其中,自所述Q方向上的所述另一端處,所述電熱絲又折返至所述Q方向上的所述一端;折返的電熱絲與折返點之前的電熱絲不位於同一平面內。The inductively coupled plasma processing apparatus according to claim 9, wherein the electric heating wire is folded back to the one end in the Q direction from the other end in the Q direction; The wire before the return point is not in the same plane. 如請求項10所述的感應耦合電漿體處理裝置,其中,所述折返的電熱絲呈直線型。The inductively coupled plasma processing apparatus according to claim 10, wherein the folded electric heating wire is linear. 如請求項10所述的感應耦合電漿體處理裝置,其中,所述兩個接點均位於所述Q方向上的所述一端。The inductively coupled plasma processing apparatus of claim 10, wherein the two contacts are located at the one end in the Q direction. 如請求項10所述的感應耦合電漿體處理裝置,其中,折返的電熱絲與折返點之前的電熱絲之間以絕緣材料隔離。The inductively coupled plasma processing apparatus according to claim 10, wherein the folded electric heating wire is insulated from the heating wire before the turning point by an insulating material. 如請求項10所述的感應耦合電漿體處理裝置,其中,折返的電熱絲為外周包覆絕緣皮的芯線。The inductively coupled plasma processing apparatus according to claim 10, wherein the folded electric heating wire is a core wire covering the outer sheath. 如請求項10所述的感應耦合電漿體處理裝置,其中,折返的電熱絲的導電性優於折返點之前的電熱絲。The inductively coupled plasma processing apparatus according to claim 10, wherein the electrical conductivity of the folded electric heating wire is superior to the electric heating wire before the turning point. 如請求項10所述的感應耦合電漿體處理裝置,其中,折返的電熱絲與折返點之前的電熱絲之間以隔熱材料隔離。The inductively coupled plasma processing apparatus according to claim 10, wherein the folded electric heating wire and the electric heating wire before the turning point are separated by a heat insulating material. 如請求項10所述的感應耦合電漿體處理裝置,其中,折返的電熱絲懸空於折返點之前的電熱絲上方。The inductively coupled plasma processing apparatus of claim 10, wherein the folded electric heating wire is suspended above the heating wire before the turning point. 如請求項1所述的感應耦合電漿體處理裝置,其中,所述電熱絲整體位於同一層內,包括設置於絕緣窗不同區域的左上部分、右上部分、左下部分與右下部分;其中,所述右下部分於對稱中心處與所述左上部分相連,所述左上部分與所述右上部分相連,所述右上部分於對稱中心處與所述左下部分相連。The inductively coupled plasma processing apparatus according to claim 1, wherein the heating wire is entirely located in the same layer, and includes an upper left portion, an upper right portion, a lower left portion, and a lower right portion disposed in different regions of the insulating window; The lower right portion is connected to the upper left portion at a center of symmetry, and the upper left portion is connected to the upper right portion, and the upper right portion is connected to the lower left portion at a center of symmetry. 如請求項18所述的感應耦合電漿體處理裝置,其中,所述電熱絲的所述左上部分、右上部分、左下部分與右下部分中的任一個或全部以這樣的方式設置:在絕緣窗所在的平面或與所述平面平行的平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自所述絕緣窗的一側延伸至絕緣窗之相對的另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述絕緣窗的所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。The inductively coupled plasma processing apparatus according to claim 18, wherein any one or all of the upper left portion, the upper right portion, the lower left portion, and the lower right portion of the heating wire are disposed in such a manner as to be insulated The plane in which the window is located or the plane parallel to the plane defines two directions perpendicular to each other, that is, the P direction and the Q direction; the heating wire extends from one side of the insulating window to the opposite side of the insulating window in the P direction. The other side, and then extending to the other side in the Q direction to another position; at the other position, the heating wire in the opposite direction of the P direction is again from the other of the insulating window The side extends to the one side; in this manner, the heating wire is gradually extended from one end in the Q direction to the other end. 用於感應耦合電漿體處理裝置的加熱部件,所述加熱部件用來對反應腔室頂部的絕緣窗進行溫度控制,所述加熱部件包括設置在所述絕緣窗的上表面的電熱絲,所述電熱絲整體呈中心對稱,所述電熱絲具有用於與加熱電源電性連接以形成迴路的兩個接點;所述電熱絲環繞形成多個圖形,每一圖形和與所述圖形中心對稱的圖形中的加熱電流方向相反。a heating member for inductively coupling a plasma processing apparatus for temperature control of an insulating window at a top of a reaction chamber, the heating member including an electric heating wire disposed on an upper surface of the insulating window, The electric heating wire is entirely centrally symmetrical, and the heating wire has two contacts for electrically connecting with a heating power source to form a loop; the heating wire surrounds forming a plurality of patterns, each of which is symmetrical with the center of the pattern The heating current in the pattern is in the opposite direction. 如請求項20所述的加熱部件,其中,所述電熱絲包括位於同一平面內的多段相互平行的橫向延伸部以及連接相鄰橫向延伸部的連接部。The heating member of claim 20, wherein the heating wire comprises a plurality of mutually parallel lateral extensions in the same plane and a connection connecting adjacent lateral extensions. 如請求項20所述的加熱部件,其中,所述電熱絲以這樣的方式設置:在一平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自一側延伸至另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。The heating member according to claim 20, wherein the heating wire is disposed in such a manner that two directions perpendicular to each other, that is, a P direction and a Q direction, are defined in one plane; the heating wire is from the P direction The side extends to the other side and then extends to the other side in the Q direction to another position; at the other position, the opposite direction of the heating wire in the P direction extends from the other side To the one side; in this manner, the heating wire is gradually extended from one end in the Q direction to the other end. 如請求項20所述的加熱部件,其中,所述電熱絲整體位於同一層內,包括設置於不同區域的左上部分、右上部分、左下部分與右下部分;其中,所述右下部分於對稱中心處與所述左上部分相連,所述左上部分與所述右上部分相連,所述右上部分於對稱中心處與所述左下部分相連。The heating member according to claim 20, wherein the heating wire is entirely located in the same layer, and includes an upper left portion, an upper right portion, a lower left portion, and a lower right portion disposed in different regions; wherein the lower right portion is symmetric The center is connected to the upper left portion, the upper left portion is connected to the upper right portion, and the upper right portion is connected to the lower left portion at the center of symmetry. 如請求項23所述的加熱部件,其中,所述電熱絲的所述左上部分、右上部分、左下部分與右下部分中的任一個或全部以這樣的方式設置:在一平面內定義相互垂直的兩個方向,即P方向與Q方向;所述電熱絲沿P方向自一側延伸至另一側,而後於所述另一側沿Q方向延伸至另一位置處;在所述另一位置處,所述電熱絲沿P方向的反方向又自所述另一側延伸至所述一側;以此方式,所述電熱絲逐步自Q方向上的一端延伸至另一端。The heating member according to claim 23, wherein any one or all of the upper left portion, the upper right portion, the lower left portion, and the lower right portion of the heating wire are disposed in such a manner as to define mutually perpendicular in a plane Two directions, namely a P direction and a Q direction; the heating wire extends from one side to the other side in the P direction, and then extends in the Q direction to another position on the other side; At the position, the heating wire extends from the other side to the one side in the opposite direction of the P direction; in this manner, the heating wire gradually extends from one end in the Q direction to the other end. 如請求項20所述的加熱部件,其中,所述感應線圈產生的電磁場於所述每一圖形所在區域內的磁通量,於與所述圖形中心對稱的圖形所在區域內的磁通量,兩者總是相等。The heating unit of claim 20, wherein the electromagnetic field generated by the induction coil is in a magnetic flux in an area where each of the patterns is located, and a magnetic flux in a region where the pattern is symmetric with the center of the pattern, both of which are always equal.
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