TW201607935A - Composition, film, optical device, and compound - Google Patents

Composition, film, optical device, and compound Download PDF

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TW201607935A
TW201607935A TW104123954A TW104123954A TW201607935A TW 201607935 A TW201607935 A TW 201607935A TW 104123954 A TW104123954 A TW 104123954A TW 104123954 A TW104123954 A TW 104123954A TW 201607935 A TW201607935 A TW 201607935A
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人見誠一
高橋秀知
吉井朗子
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富士軟片股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety

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Abstract

The invention provides a composition, a film, an optical device, and a compound that can form a film having a high refractive index and exhibits excellent developability and curability. The composition of the invention includes a compound represented by the following general formula (1). In the general formula (1), Ar1-Ar4 each represent an aromatic ring group independently. At least one of Ar1-Ar4 is a polycyclic aromatic group and satisfies the following requirement 1 or requirement 2. Requirement 1: At least one of Ar1-Ar4 has a substituent containing an acid group and a polymerizable group. Requirement 2: At least one of Ar1-Ar4 has a substituent containing an acid group and at least one of Ar1-Ar4 has a substituent containing a polymerizable group.

Description

組成物、膜、光學裝置、化合物Composition, film, optical device, compound

本發明是有關於一種包含具有特定結構的化合物的組成物、由該組成物所獲得的膜、包含該膜的光學裝置、及組成物中所含的化合物。The present invention relates to a composition comprising a compound having a specific structure, a film obtained from the composition, an optical device comprising the film, and a compound contained in the composition.

先前,對由光學材料等中所使用的組成物(含有樹脂或聚合性化合物的組成物)所形成的膜要求高折射率。另外,在應用於各種構件時有需要圖案(pattern)形成的情況,因此對所述組成物亦要求顯影性及硬化性優異。 在所述背景下,例如專利文獻1中揭示有鹼可溶性(alkali-soluble)感光性樹脂組成物,其成分揭示有具有聚合性基及茀骨架的化合物。In the past, a film formed of a composition (a composition containing a resin or a polymerizable compound) used in an optical material or the like is required to have a high refractive index. Further, when it is applied to various members, a pattern is required. Therefore, the composition is also required to have excellent developability and hardenability. Under the circumstances, for example, Patent Document 1 discloses an alkali-soluble photosensitive resin composition in which a component having a polymerizable group and an anthracene skeleton is disclosed.

[化1][現有技術文獻] [專利文獻][Chemical 1] [Prior Art Document] [Patent Literature]

[專利文獻1]日本專利特開平10-161315號公報[Patent Document 1] Japanese Patent Laid-Open No. Hei 10-161315

[發明所欲解決之課題][Problems to be solved by the invention]

近年來,隨著光學裝置(固體攝影元件、顯示裝置等)的高功能化或小型化,對用作光學材料的組成物要求折射率、顯影性及硬化性的進一步提高。 本發明者等人對專利文獻1中記載的組成物進行研究,結果確認到無法同時實現所述三種性能而需要進一步改良。 本發明是鑒於所述實際情況,其課題在於提供一種可形成顯示出高折射率的膜且亦顯示出優異的顯影性及硬化性的組成物。 另外,本發明的課題亦在於提供一種由所述組成物所形成的膜、包含所述膜的光學裝置、及化合物。 [解決課題之手段]In recent years, as optical devices (solid-state imaging devices, display devices, and the like) are highly functionalized or miniaturized, a refractive index, developability, and hardenability are further required for a composition used as an optical material. The present inventors have studied the composition described in Patent Document 1, and as a result, it has been confirmed that the above three properties cannot be simultaneously achieved and further improvement is required. The present invention has been made in view of the above circumstances, and an object thereof is to provide a composition which can form a film exhibiting a high refractive index and which exhibits excellent developability and hardenability. Another object of the present invention is to provide a film formed of the above composition, an optical device including the film, and a compound. [Means for solving the problem]

本發明者等人為了解決所述課題而進行努力研究,結果發現,藉由使用特定結構的化合物,可獲得所期望的效果,從而完成了本發明。 即,本發明者等人發現可藉由以下構成而解決所述課題。The present inventors have made an effort to solve the above problems, and as a result, have found that a desired effect can be obtained by using a compound having a specific structure, and the present invention has been completed. That is, the inventors of the present invention have found that the above problems can be solved by the following configuration.

(1)一種組成物,其包含下述通式(1)所表示的化合物。 (2)如(1)所述的組成物,其中在通式(1)中,Ar3 與Ar4 連結。 (3)如(1)或(2)所述的組成物,其中化合物為下述通式(2)所表示的化合物。 (4)如(3)所述的組成物,其中在通式(2)中,Ar5 及Ar6 的至少1個為多環芳香族基。 (5)如(1)至(4)中任一項所述的組成物,其中酸基為羧酸基。 (6)如(1)至(5)中任一項所述的組成物,其進而包含通式(1)所表示的化合物以外的聚合性化合物。 (7)如(1)至(6)中任一項所述的組成物,其進而包含具有酸基與聚合性基的聚合物(polymer)。 (8)如(7)所述的組成物,其中聚合物進而具有芳香環基。 (9)如(1)至(8)中任一項所述的組成物,其中包含酸基及聚合性基的取代基為通式(X-1)所表示的基。 (10)一種膜,其是由如(1)至(9)中任一項所述的組成物所形成。 (11)一種光學裝置,其包含如(10)所述的膜。 (12)一種化合物,其是以下述通式(1)表示。 (13)如(12)所述的化合物,其中在通式(1)中,Ar3 與Ar4 連結。 (14)如(12)或(13)所述的化合物,其中通式(1)以通式(2)表示。 (15)如(14)所述的化合物,其中在通式(2)中,Ar5 及Ar6 的至少1個為多環芳香族基。 (16)如(12)至(15)中任一項所述的化合物,其中酸基為羧酸基。 (17)如(12)至(16)中任一項所述的化合物,其中包含酸基及聚合性基的取代基為通式(X-1)所表示的基。 [發明的效果](1) A composition comprising a compound represented by the following formula (1). (2) The composition according to (1), wherein, in the formula (1), Ar 3 is bonded to Ar 4 . (3) The composition according to (1) or (2), wherein the compound is a compound represented by the following formula (2). (4) The composition according to (3), wherein in the formula (2), at least one of Ar 5 and Ar 6 is a polycyclic aromatic group. (5) The composition according to any one of (1) to (4) wherein the acid group is a carboxylic acid group. (6) The composition according to any one of (1) to (5) further comprising a polymerizable compound other than the compound represented by the formula (1). (7) The composition according to any one of (1) to (6) further comprising a polymer having an acid group and a polymerizable group. (8) The composition according to (7), wherein the polymer further has an aromatic ring group. (9) The composition according to any one of (1) to (8), wherein the substituent comprising an acid group and a polymerizable group is a group represented by the formula (X-1). (10) A film formed from the composition according to any one of (1) to (9). (11) An optical device comprising the film of (10). (12) A compound represented by the following formula (1). (13) The compound according to (12), wherein, in the formula (1), Ar 3 is bonded to Ar 4 . (14) A compound according to (12) or (13), wherein the formula (1) is represented by the formula (2). (15) The compound according to (14), wherein in the formula (2), at least one of Ar 5 and Ar 6 is a polycyclic aromatic group. The compound according to any one of (12) to (15), wherein the acid group is a carboxylic acid group. (17) The compound according to any one of (12) to (16), wherein the substituent comprising an acid group and a polymerizable group is a group represented by the formula (X-1). [Effects of the Invention]

根據本發明,可提供一種可形成顯示出高折射率的膜且亦顯示出優異的顯影性及硬化性的組成物。 另外,根據本發明,可提供一種由所述組成物所形成的膜、包含所述膜的光學裝置、及化合物。According to the present invention, it is possible to provide a composition which can form a film exhibiting a high refractive index and which also exhibits excellent developability and hardenability. Further, according to the present invention, a film formed of the composition, an optical device including the film, and a compound can be provided.

以下,對本發明的組成物等進行說明。 此外,在本說明書中,所謂(甲基)丙烯酸酯是表示丙烯酸酯或甲基丙烯酸酯,所謂(甲基)丙烯醯氧基是表示丙烯醯氧基或甲基丙烯醯氧基。 進而,在本說明書中,使用「~」所表示的數值範圍意指包含「~」的前後所記載的數值作為下限值及上限值的範圍。Hereinafter, the composition and the like of the present invention will be described. Further, in the present specification, the (meth) acrylate means acrylate or methacrylate, and the (meth) propylene oxime means propylene methoxy or methacryloxy group. Further, in the present specification, the numerical range indicated by "~" means a range including the numerical values described before and after "~" as the lower limit and the upper limit.

<組成物> 本發明的組成物中包含通式(1)所表示的化合物。<Composition> The composition of the present invention contains the compound represented by the formula (1).

[化2]通式(1)[Chemical 2] General formula (1)

通式(1)中,Ar1 ~Ar4 分別獨立地表示芳香環基。如下所述,芳香環基亦可具有取代基。另外,Ar1 ~Ar4 亦可相互以單鍵或二價連結基連結。 芳香環基的種類並無特別限制,可列舉芳香族烴基(芳基)、芳香族雜環基(雜芳基)、或組合該些而成的基等。 構成芳香族烴基的環的具體例可列舉:苯環、萘環、蒽環、菲環、茀環、三伸苯環、芘環、稠四苯環、聯苯環(2個苯基可以任意的連結樣式連結)、聯三苯環(3個苯基可以任意的連結樣式連結)等。 芳香族雜環基例如可列舉包含五員環、六員環或七員環或其縮合環的芳香族雜環基。芳香族雜環基中所含的雜原子可列舉氧原子、硫原子、氮原子等。構成芳香族雜環基的環的具體例可列舉:呋喃環、噻吩環、吡咯環、噁唑環、異噁唑環、噁二唑環、噻唑環、異噻唑環、噻二唑環、咪唑環、吡唑環、三唑環、呋呫環、四唑環、吡啶環、噠嗪環、嘧啶環、吡嗪環、三嗪環、四嗪環、苯并呋喃環、異苯并呋喃環、苯并噻吩環、吲哚環、吲哚啉環、異吲哚環、苯并噁唑環、苯并噻唑環、吲唑環、苯并咪唑環、喹啉環、異喹啉環、噌啉(cinnoline)環、酞嗪(phthalazine)環、喹唑啉環、喹噁啉環、二苯并呋喃環、二苯并噻吩環、咔唑環、吖啶環、啡啶環、啡啉(phenanthroline)環、啡嗪(phenazine)環、萘啶(naphthyridine)環、嘌呤環、喋啶環等。In the formula (1), Ar 1 to Ar 4 each independently represent an aromatic ring group. The aromatic ring group may have a substituent as described below. Further, Ar 1 to Ar 4 may be bonded to each other by a single bond or a divalent linking group. The type of the aromatic ring group is not particularly limited, and examples thereof include an aromatic hydrocarbon group (aryl group), an aromatic heterocyclic group (heteroaryl group), and a group in which these are combined. Specific examples of the ring constituting the aromatic hydrocarbon group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, an anthracene ring, a triphenylene ring, an anthracene ring, a condensed tetraphenyl ring, and a biphenyl ring (two phenyl groups may be used arbitrarily The connection style is linked, and the triphenyl ring (three phenyl groups can be linked in any connection mode). Examples of the aromatic heterocyclic group include an aromatic heterocyclic group containing a five-membered ring, a six-membered ring or a seven-membered ring or a fused ring thereof. Examples of the hetero atom contained in the aromatic heterocyclic group include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the ring constituting the aromatic heterocyclic group include a furan ring, a thiophene ring, a pyrrole ring, an oxazole ring, an isoxazole ring, an oxadiazole ring, a thiazole ring, an isothiazole ring, a thiadiazole ring, and an imidazole. Ring, pyrazole ring, triazole ring, furazan ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring, benzofuran ring, isobenzofuran ring , benzothiophene ring, anthracene ring, porphyrin ring, isoindole ring, benzoxazole ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, isoquinoline ring, anthracene Cinnoline ring, phthalazine ring, quinazoline ring, quinoxaline ring, dibenzofuran ring, dibenzothiophene ring, indazole ring, acridine ring, pyridine ring, morpholine Phenanthroline) ring, phenazine ring, naphthyridine ring, anthracene ring, acridine ring and the like.

此外,Ar1 ~Ar4 的至少1個為多環芳香族基,就滿足所形成的膜的折射率更優異、顯影性優異、及硬化性優異中的至少一個方面(以下,亦簡稱為「本發明的效果更優異的方面」)而言,更佳為Ar1 ~Ar4 中的2個~4個為多環芳香族基。 所謂多環芳香族基是指多個芳香環基縮合而形成的基,具體而言,可列舉多環芳香族烴基(多環芳香族烴環基)或多環芳香族雜環基。 此處,所謂多環芳香族烴基是指包含具有2個以上的環的芳香族烴環的基,更具體而言,為具有2個以上的單環芳香族烴環(苯環)的縮合環的基。其中,較佳為包含2個以上的單環芳香族烴環彼此縮環而成的環的基。 構成多環芳香族烴基的環的具體例可列舉:萘環、蒽環、菲環、茀環、苊(acenaphthylene)環、1,2-苯并菲(chrysene)環、1,2-苯并苊(fluoranthene)環、芘環、三伸苯環、稠四苯(tetracene)環、苯并芘環、苉(picene)環、苝環、稠五苯(pentacene)環、稠六苯(hexacene)環、稠七苯(heptacene)環、蔻(coronene)環等。其中,較佳為萘環。 另外,所謂多環芳香族雜環基是指包含具有2個以上的環的芳香族雜環的基,更具體而言,為具有2個以上的環且具有1個以上的單環芳香族雜環的縮合環的基。其中,較佳為包含1個以上的單環芳香族烴環與1個以上的單環雜環縮環而成的環的基、或包含2個以上的單環雜環縮環而成的環的基。 構成多環芳香族雜環基的環的具體例可列舉:吖啶環、苯并喹啉環、咔唑環、啡嗪環、啡啶環、啡啉環、咔啉(carboline)環、環吖嗪(cyclazine)環、喹叨啉(quindoline)環、苯并[lmn]菲啶(benzo[lmn]phenanthridine,thebenidine)環、喹嚀叨啉(quinindoline)環、三苯基二噻嗪環、三苯基二噁嗪環、菲吖嗪(phenanthrazine)環、蒽吖嗪(anthrazine)環、萘嵌間二氮雜苯環、二氮雜咔唑環(表示構成咔啉環的碳原子的任意1個經氮原子取代的環)、啡啉環、二苯并呋喃環、二苯并噻吩環、萘并呋喃環、萘并噻吩環、苯并二呋喃環、苯并二噻吩環、萘并二呋喃環、萘并二噻吩環、蒽並呋喃環、蒽並二呋喃環、蒽並噻吩環、蒽並二噻吩環、噻蒽環、啡噁噻(phenoxathiin)環、萘并[2,3-b]噻吩(thiophanthrene)環(萘并噻吩環)等。 構成多環芳香族雜環基的單環雜環並無特別限制,其具體例例如可列舉:呋喃環、噻吩環、吡咯環、噁唑環、異噁唑環、噁二唑環、噻唑環、異噻唑環、噻二唑環、咪唑環、吡唑環、三唑環、呋呫環、四唑環、吡啶環、噠嗪環、嘧啶環、吡嗪環、三嗪環、四嗪環等。In addition, at least one of Ar 1 to Ar 4 is a polycyclic aromatic group, and at least one of the refractive index of the formed film is more excellent, the developability is excellent, and the curability is excellent (hereinafter, also referred to as " More preferably, the effect of the present invention is that the two to four of Ar 1 to Ar 4 are polycyclic aromatic groups. The polycyclic aromatic group is a group formed by condensing a plurality of aromatic ring groups, and specific examples thereof include a polycyclic aromatic hydrocarbon group (polycyclic aromatic hydrocarbon ring group) or a polycyclic aromatic heterocyclic group. Here, the polycyclic aromatic hydrocarbon group means a group containing an aromatic hydrocarbon ring having two or more rings, and more specifically, a condensed ring having two or more monocyclic aromatic hydrocarbon rings (benzene rings). Base. Among them, a group containing a ring in which two or more monocyclic aromatic hydrocarbon rings are condensed with each other is preferred. Specific examples of the ring constituting the polycyclic aromatic hydrocarbon group include a naphthalene ring, an anthracene ring, a phenanthrene ring, an anthracene ring, an acenaphthylene ring, a 1,2-benzophene ring, and a 1,2-benzo compound. Fluoranene ring, anthracene ring, triphenylene ring, tetracene ring, benzofluorene ring, picene ring, anthracene ring, pentacene ring, hexacene Ring, heptacene ring, coronene ring, and the like. Among them, a naphthalene ring is preferred. In addition, the polycyclic aromatic heterocyclic group is a group containing an aromatic heterocyclic ring having two or more rings, and more specifically, has two or more rings and has one or more monocyclic aromatic impurities. The base of the condensed ring of the ring. Among them, a ring containing one or more monocyclic aromatic hydrocarbon rings and one or more monocyclic heterocyclic ring-condensed rings or a ring containing two or more monocyclic heterocyclic rings is preferable. Base. Specific examples of the ring constituting the polycyclic aromatic heterocyclic group include an acridine ring, a benzoquinoline ring, an oxazole ring, a phenazine ring, a phenazin ring, a phenanthroline ring, a carboline ring, and a ring. a cyclazine ring, a quindoline ring, a benzo[lmn]phenanthridine, thebenidine ring, a quinindoline ring, a triphenyldithiazine ring, Triphenyl dioxin ring, phenanthrazine ring, anthrazine ring, naphthalene diazabenzene ring, diazacarbazole ring (representing any carbon atom constituting a porphyrin ring) a ring substituted with a nitrogen atom), a phenoline ring, a dibenzofuran ring, a dibenzothiophene ring, a naphthopyrene ring, a naphthothiophene ring, a benzodifuran ring, a benzodithiophene ring, a naphtho Difuran ring, naphthacene dithiophene ring, indenofuran ring, indenodifuran ring, indenothiophene ring, indenodithiophene ring, thioindole ring, phenoxathiin ring, naphtho[2,3 -b] thiophanthrene ring (naphthothiophene ring) and the like. The monocyclic heterocyclic ring constituting the polycyclic aromatic heterocyclic group is not particularly limited, and specific examples thereof include a furan ring, a thiophene ring, a pyrrole ring, an oxazole ring, an isoxazole ring, an oxadiazole ring, and a thiazole ring. , isothiazole ring, thiadiazole ring, imidazole ring, pyrazole ring, triazole ring, furazan ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring Wait.

Ar1 ~Ar4 中亦可包含下述取代基。 取代基的種類例如可列舉:鹵素原子、烷基(包含環烷基、雙環烷基、三環烷基)、烯基(包含環烯基、雙環烯基)、炔基、芳基、雜芳基、氰基、羥基、硝基、羧基、烷氧基、芳氧基、矽烷氧基、雜芳氧基、醯氧基、胺甲醯氧基、烷氧基羰氧基、芳氧基羰氧基、胺基(包含苯胺基)、銨基、醯基胺基、胺基羰基胺基、烷氧基羰基胺基、芳氧基羰基胺基、胺磺醯基胺基、烷基或芳基磺醯基胺基、巰基、烷硫基、芳硫基、雜環硫基、胺磺醯基、磺基、烷基或芳基亞磺醯基、烷基或芳基磺醯基、醯基、芳氧基羰基、烷氧基羰基、胺甲醯基、芳基或雜環偶氮基、醯亞胺基、膦基、氧膦基、氧膦基氧基、氧膦基胺基、膦醯基、矽烷基、肼基、脲基、硼酸基(-B(OH)2 )、磷酸基(-OPO(OH)2 )、硫酸基(-OSO3 H)、或組合該些基而成的基等。The following substituents may be contained in Ar 1 to Ar 4 . Examples of the type of the substituent include a halogen atom, an alkyl group (including a cycloalkyl group, a bicycloalkyl group, a tricycloalkyl group), an alkenyl group (including a cycloalkenyl group or a bicycloalkenyl group), an alkynyl group, an aryl group, and a heteroaryl group. Base, cyano, hydroxy, nitro, carboxy, alkoxy, aryloxy, nonyloxy, heteroaryloxy, decyloxy, amine methoxycarbonyl, alkoxycarbonyloxy, aryloxycarbonyl Oxyl, amine (including anilino), ammonium, mercaptoamine, aminocarbonylamino, alkoxycarbonylamino, aryloxycarbonylamino, aminesulfonylamino, alkyl or aromatic Alkylsulfonylamino, fluorenyl, alkylthio, arylthio, heterocyclic thio, sulfonyl, sulfo, alkyl or arylsulfinyl, alkyl or arylsulfonyl, hydrazine Alkyl, aryloxycarbonyl, alkoxycarbonyl, aminemethanyl, aryl or heterocyclic azo, fluorenylene, phosphino, phosphinyl, phosphinyloxy, phosphinylamino, Phosphoninyl, decyl, decyl, ureido, boronic acid (-B(OH) 2 ), phosphate (-OPO(OH) 2 ), sulfate (-OSO 3 H), or a combination of these groups The basis of the formation.

此外,所述化合物滿足以下的要件1或要件2。 要件1:Ar1 ~Ar4 的至少1個具有包含酸基及聚合性基的取代基。 要件2:Ar1 ~Ar4 的至少1個具有包含酸基的取代基,且Ar1 ~Ar4 的至少1個具有包含聚合性基的取代基。 以下,對各要件進行詳細說明。Further, the compound satisfies the following requirement 1 or requirement 2. Requirement 1: At least one of Ar 1 to Ar 4 has a substituent including an acid group and a polymerizable group. Requirement 2: At least one of Ar 1 to Ar 4 has a substituent including an acid group, and at least one of Ar 1 to Ar 4 has a substituent containing a polymerizable group. Hereinafter, each requirement will be described in detail.

(要件1) 要件1意圖Ar1 ~Ar4 的至少1個具有包含酸基及聚合性基的取代基(以下,亦簡稱為「取代基X」)。此外,取代基X是所謂一價取代基。 在要件1中,只要Ar1 ~Ar4 的至少1個具有取代基X即可,亦可Ar1 ~Ar4 的2個以上包含取代基X。另外,多個取代基X亦可多個取代至Ar1 ~Ar4 的任一個上。進而,Ar1 ~Ar4 中亦可包含取代基X以外的取代基。 取代基X中所含的「酸基」例如可列舉羧酸基、磺酸基、單硫酸酯基、磷酸基、單磷酸酯基、膦酸基、次膦酸基、硼酸基作為較佳例,更佳為羧酸基、磺酸基、單硫酸酯基、磷酸基、單磷酸酯基、膦酸基、次膦酸基,進而較佳為羧酸基、磺酸基、磷酸基、膦酸基、次膦酸基,尤佳為羧酸基。(Requirement 1) The requirement 1 is that at least one of Ar 1 to Ar 4 has a substituent including an acid group and a polymerizable group (hereinafter, simply referred to as "substituent X"). Further, the substituent X is a so-called monovalent substituent. In a requirement, as long as at least one of Ar 1 ~ Ar 4 has a substituent X can be, also two or more Ar 1 ~ Ar 4 comprises a substituent group X. Further, a plurality of substituents X may be substituted with any one of Ar 1 to Ar 4 . Further, Ar 1 to Ar 4 may further contain a substituent other than the substituent X. Examples of the "acid group" contained in the substituent X include a carboxylic acid group, a sulfonic acid group, a monosulfate group, a phosphoric acid group, a monophosphate group, a phosphonic acid group, a phosphinic acid group, and a boronic acid group. More preferably, it is a carboxylic acid group, a sulfonic acid group, a monosulfate group, a phosphoric acid group, a monophosphate group, a phosphonic acid group, a phosphinic acid group, and further preferably a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, a phosphine group. An acid group or a phosphinic acid group is particularly preferably a carboxylic acid group.

取代基X中所含的「聚合性基」例如可列舉自由基(radical)聚合性基、陽離子(cation)聚合性基等。 自由基聚合性基可使用通常已知的自由基聚合性基,較佳的自由基聚合性基可列舉具有可進行自由基聚合的乙烯性不飽和鍵的聚合性基,具體而言,可列舉乙烯基、(甲基)丙烯醯氧基等。其中,較佳為(甲基)丙烯醯氧基,更佳為丙烯醯氧基。 陽離子聚合性基可使用通常已知的陽離子聚合性基,具體而言,可列舉:脂環式醚基、環狀縮醛基、環狀內酯基、環狀硫醚基、螺環原酸酯基(spiroorthoester)、乙烯氧基等。其中,較佳為脂環式醚基、乙烯氧基,尤佳為環氧基、氧雜環丁基、乙烯氧基。The "polymerizable group" contained in the substituent X may, for example, be a radical polymerizable group or a cationic polymerizable group. As the radical polymerizable group, a generally known radical polymerizable group can be used, and a preferred radical polymerizable group is a polymerizable group having an ethylenically unsaturated bond capable of undergoing radical polymerization, and specific examples thereof include a polymerizable group. Vinyl, (meth) propylene decyloxy, and the like. Among them, a (meth) propylene fluorenyloxy group is preferred, and an acryloxy group is more preferred. As the cationically polymerizable group, a generally known cationically polymerizable group can be used, and specific examples thereof include an alicyclic ether group, a cyclic acetal group, a cyclic lactone group, a cyclic thioether group, and a spiro ortho acid. Spiroorthoester, ethyleneoxy, and the like. Among them, an alicyclic ether group or a vinyloxy group is preferred, and an epoxy group, an oxetanyl group or a vinyloxy group is particularly preferred.

取代基X中亦可包含2個以上的酸基,該情況下,酸基的種類可相同亦可不同。 取代基X中亦可包含2個以上的聚合性基,該情況下,聚合性基的種類可相同亦可不同。 取代基X中包含酸基及聚合性基的形態可列舉:經由鏈狀飽和烴基(可為直鏈狀亦可為支鏈狀,較佳為碳數1~10)、環狀飽和烴基(較佳為碳數3~10)、芳香族基(較佳為碳數5~10,例如為伸苯基)等連結基將酸基及聚合性基鍵結而形成一價取代基的形態等。 取代基X的較佳形態可列舉通式(X-1)所表示的基。此外,以下式中,「*」表示鍵結位置。The substituent X may contain two or more acid groups, and in this case, the types of the acid groups may be the same or different. Two or more polymerizable groups may be contained in the substituent X. In this case, the types of the polymerizable groups may be the same or different. The form in which the acid group and the polymerizable group are contained in the substituent X may be a chain-like saturated hydrocarbon group (which may be linear or branched, preferably having a carbon number of 1 to 10) or a cyclic saturated hydrocarbon group. A linking group such as a carbon number of 3 to 10) or an aromatic group (preferably, a carbon number of 5 to 10, for example, a phenylene group) is bonded to an acid group and a polymerizable group to form a monovalent substituent. A preferred embodiment of the substituent X is a group represented by the formula (X-1). Further, in the following formula, "*" indicates the bonding position.

[化3]通式(X-1)[Chemical 3] General formula (X-1)

通式(X-1)中,LX1 、LX2 及LX3 分別獨立地表示單鍵或二價連結基。 二價連結基包含由1個至100個碳原子、0個至10個氮原子、0個至50個氧原子、1個至200個氫原子、及0個至20個硫原子構成的基,可未經取代亦可進而具有取代基。 更具體而言,二價連結基例如可列舉:二價鏈狀飽和烴基(可為直鏈狀亦可為支鏈狀,較佳為碳數1~20)、二價環狀飽和烴基(較佳為碳數3~20)、二價芳香族基(較佳為碳數5~20,例如伸苯基)、-O-、-S-、-SO2 -、-NRL -、-CO-、-NH-、-COO-、-CONRL -、-O-CO-O-、-SO3 -、-NHCOO-、-SO2 NRL -、-NH-CO-NH-、或將該些組合兩種以上而成的基(例如伸烷氧基、伸烷氧基羰基、伸烷基羰氧基等)等。此處,RL 表示氫原子或烷基(較佳為碳數1~10)。In the general formula (X-1), L X1 , L X2 and L X3 each independently represent a single bond or a divalent linking group. The divalent linking group includes a group consisting of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 sulfur atoms. It may be unsubstituted and may further have a substituent. More specifically, the divalent linking group may, for example, be a divalent chain saturated hydrocarbon group (which may be linear or branched, preferably having 1 to 20 carbon atoms) or a divalent cyclic saturated hydrocarbon group (more preferably Preferably, the carbon number is 3 to 20), the divalent aromatic group (preferably having a carbon number of 5 to 20, such as a phenyl group), -O-, -S-, -SO 2 -, -NR L -, -CO -, -NH-, -COO-, -CONR L -, -O-CO-O-, -SO 3 -, -NHCOO-, -SO 2 NR L -, -NH-CO-NH-, or A group in which two or more kinds are combined (for example, an alkoxy group, an alkoxycarbonyl group, an alkylcarbonyloxy group, etc.). Here, R L represents a hydrogen atom or an alkyl group (preferably, a carbon number of 1 to 10).

二價連結基亦可具有取代基,取代基例如可列舉:甲基、乙基等碳數1至20的烷基,苯基、萘基等碳數6至16的芳基,羥基、胺基、羧基、磺醯胺基、N-磺醯基醯胺基、乙醯氧基等碳數1至6的醯氧基,甲氧基、乙氧基等碳數1至6的烷氧基,氯、溴等鹵素原子,甲氧基羰基、乙氧基羰基、環己氧基羰基等碳數2至7的烷氧基羰基,氰基,第三丁基碳酸酯等碳酸酯基等。The divalent linking group may have a substituent. Examples of the substituent include an alkyl group having 1 to 20 carbon atoms such as a methyl group and an ethyl group, an aryl group having 6 to 16 carbon atoms such as a phenyl group and a naphthyl group, and a hydroxyl group and an amino group. a carboxyl group having 1 to 6 carbon atoms such as a carboxyl group, a sulfonylamino group, an N-sulfonylguanamine group or an ethoxycarbonyl group; an alkoxy group having 1 to 6 carbon atoms such as a methoxy group or an ethoxy group; A halogen atom such as chlorine or bromine; an alkoxycarbonyl group having 2 to 7 carbon atoms such as a methoxycarbonyl group, an ethoxycarbonyl group or a cyclohexyloxycarbonyl group; a carbonate group such as a cyano group or a t-butyl carbonate; and the like.

通式(X-1)中,W表示三價連結基。三價連結基可較佳地列舉自所述LX1 ~LX3 所表示的二價連結基的所述具體例中去除1個任意的氫原子而成的基。更具體而言,可列舉-CH<、-N<等。In the formula (X-1), W represents a trivalent linking group. The trivalent linking group is preferably a group obtained by removing one arbitrary hydrogen atom from the specific example of the divalent linking group represented by the above L X1 to L X3 . More specifically, -CH<, -N<, etc. are mentioned.

通式(X-1)中,Va 表示酸基。酸基的定義如上所述。 通式(X-1)中,Vb 表示聚合性基。聚合性基的定義如上所述。In the formula (X-1), V a represents an acid group. The definition of the acid group is as described above. In the formula (X-1), V b represents a polymerizable group. The definition of the polymerizable group is as described above.

(要件2) 要件2意圖Ar1 ~Ar4 的至少1個具有包含酸基的取代基(以下,亦簡稱為「取代基Y」),且Ar1 ~Ar4 的至少1個具有包含聚合性基的取代基(以下,亦簡稱為「取代基Z」)。此外,取代基Y及取代基Z是所謂一價取代基。 在要件2中,只要Ar1 ~Ar4 的至少1個具有取代基Y即可,亦可Ar1 ~Ar4 的2個以上包含取代基Y。另外,多個取代基Y亦可多個取代至Ar1 ~Ar4 的任一個上。 在要件2中,只要Ar1 ~Ar4 的至少1個具有取代基Z即可,亦可Ar1 ~Ar4 的2個以上包含取代基Z。另外,多個取代基Z亦可多個取代至Ar1 ~Ar4 的任一個上。 進而,亦可在Ar1 ~Ar4 的任一個上同時取代取代基Y及取代基Z。 此外,Ar1 ~Ar4 上亦可包含除取代基Y及取代基Z以外的取代基。 取代基Y中所含的酸基的定義如上所述。取代基Y中包含至少1個酸基,亦可包含2個以上酸基。在包含2個以上酸基的情況下,酸基的種類可相同亦可不同。 取代基Z中所含的聚合性基的定義如上所述。取代基Z中包含至少1個聚合性基,亦可包含2個以上的聚合性基。在包含2個以上聚合性基的情況下,聚合性基的種類可相同亦可不同。(Requirement 2) at least one of the elements 2 are intended to Ar 1 ~ Ar 4 has a substituent group containing an acid group (hereinafter, also simply referred to as "substituent Y"), and Ar 1 ~ Ar 4, at least one having a polymerizable The substituent of the group (hereinafter, also referred to simply as "substituent Z"). Further, the substituent Y and the substituent Z are so-called monovalent substituents. In elements 2, as long as at least one of Ar 1 ~ Ar 4 has a substituent Y can be, also two or more Ar 1 ~ Ar 4 comprises a substituent group Y. Further, a plurality of substituents Y may be substituted with any one of Ar 1 to Ar 4 . In elements 2, as long as at least one of Ar 1 ~ Ar 4 has a substituent Z can, also two or more Ar 1 ~ Ar 4 comprises a substituent group Z. Further, a plurality of substituents Z may be substituted with any one of Ar 1 to Ar 4 . Further, the substituent Y and the substituent Z may be simultaneously substituted on any of Ar 1 to Ar 4 . Further, Ar 1 to Ar 4 may further contain a substituent other than the substituent Y and the substituent Z. The definition of the acid group contained in the substituent Y is as described above. The substituent Y contains at least one acid group, and may contain two or more acid groups. When two or more acid groups are contained, the types of acid groups may be the same or different. The definition of the polymerizable group contained in the substituent Z is as described above. The substituent Z contains at least one polymerizable group, and may contain two or more polymerizable groups. When two or more polymerizable groups are contained, the types of the polymerizable groups may be the same or different.

取代基Y的較佳形態可列舉通式(Y-1)所表示的基。此外,以下式中,「*」表示鍵結位置。   通式(Y-1)     *-LY1 -Va 所述通式(Y-1)中,LY1 表示單鍵或二價連結基。二價連結基的具體例及較佳形態與所述LX1 ~LX3 所表示的二價連結基相同。此外,LY1 上亦可進而取代Va 。 通式(Y-1)中,Va 表示酸基。A preferred embodiment of the substituent Y is a group represented by the formula (Y-1). Further, in the following formula, "*" indicates the bonding position. General formula (Y-1) *-L Y1 - V a In the above formula (Y-1), L Y1 represents a single bond or a divalent linking group. Specific examples and preferred embodiments of the divalent linking group are the same as those of the divalent linking group represented by the above L X1 to L X3 . Further, the substituent may further L Y1 V a. In the formula (Y-1), V a represents an acid group.

取代基Z的較佳形態可列舉通式(Z-1)所表示的基。此外,以下式中,「*」表示鍵結位置。   通式(Z-1)     *-LZ1 -Vb 所述通式(Z-1)中,LZ1 表示單鍵或二價連結基。二價連結基的具體例及較佳形態與所述LX1 ~LX3 所表示的二價連結基相同。此外,LZ1 上亦可進而取代Vb 。 通式(Z-1)中,Vb 表示聚合性基。A preferred embodiment of the substituent Z is a group represented by the formula (Z-1). Further, in the following formula, "*" indicates the bonding position. General formula (Z-1) *-L Z1 - V b In the above formula (Z-1), L Z1 represents a single bond or a divalent linking group. Specific examples and preferred embodiments of the divalent linking group are the same as those of the divalent linking group represented by the above L X1 to L X3 . In addition, L Z1 may further replace V b . In the formula (Z-1), V b represents a polymerizable group.

(較佳形態) 作為所述通式(1)所表示的化合物的較佳形態之一,就本發明的效果更優異的方面而言,可列舉Ar3 與Ar4 連結。此處,所謂「Ar3 與Ar4 連結」是表示Ar3 與Ar4 經由單鍵或二價連結基而連結。二價連結基的具體例及較佳形態與所述LX1 ~LX3 所表示的二價連結基相同。(Preferred embodiment) As one of the preferable embodiments of the compound represented by the above formula (1), Ar 3 is bonded to Ar 4 in terms of the effect of the present invention being more excellent. Here, "Ar 3 and Ar 4 are linked" means that Ar 3 and Ar 4 are linked via a single bond or a divalent linking group. Specific examples and preferred embodiments of the divalent linking group are the same as those of the divalent linking group represented by the above L X1 to L X3 .

作為所述通式(1)所表示的化合物的最佳形態,就本發明的效果更優異的方面而言,可列舉通式(2)所表示的化合物。The best form of the compound represented by the above formula (1) is a compound represented by the formula (2), and the effect of the present invention is more excellent.

[化4]通式(2)[Chemical 4] General formula (2)

通式(2)中,Ar1 ~Ar2 及Ar5 ~Ar6 分別獨立地表示芳香環基。芳香環基的定義如上所述。此外,芳香環基亦可具有取代基。另外,Ar5 ~Ar6 分別以包含通式(2)中的2個碳原子的形式構成芳香環基。 此外,Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個為多環芳香族基,就本發明的效果更優異的方面而言,更佳為Ar1 ~Ar2 及Ar5 ~Ar6 中的2個~4個為多環芳香族基。其中,就本發明的效果更優異的方面而言,較佳為Ar5 ~Ar6 的至少1個為多環芳香族基。此外,在Ar5 ~Ar6 的至少1個為多環芳香族基的情況下,Ar5 ~Ar6 分別以包含通式(2)中的2個碳原子的形式構成多環芳香環基。In the formula (2), Ar 1 to Ar 2 and Ar 5 to Ar 6 each independently represent an aromatic ring group. The definition of the aromatic ring group is as described above. Further, the aromatic ring group may have a substituent. Further, Ar 5 to Ar 6 each constitute an aromatic ring group in the form of two carbon atoms in the formula (2). Further, at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 is a polycyclic aromatic group, and more preferably Ar 1 to Ar 2 and Ar 5 to Ar 6 in terms of the effect of the present invention. Two to four of them are polycyclic aromatic groups. Among them, in terms of the effect of the present invention being more excellent, at least one of Ar 5 to Ar 6 is preferably a polycyclic aromatic group. Further, when at least one of Ar 5 to Ar 6 is a polycyclic aromatic group, each of Ar 5 to Ar 6 constitutes a polycyclic aromatic ring group in the form of two carbon atoms in the formula (2).

此外,所述化合物滿足以下的要件3或要件4。 要件3:Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含酸基及聚合性基(所述取代基X)的取代基。 要件4:Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含酸基的取代基(所述取代基Y),且Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含聚合性基的取代基(所述取代基Z)。Further, the compound satisfies the following requirement 3 or requirement 4. Requirement 3: At least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has a substituent including an acid group and a polymerizable group (the substituent X). Requirement 4: At least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has a substituent including an acid group (the substituent Y), and at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has A substituent containing a polymerizable group (the substituent Z).

在要件3中,只要Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有取代基X即可,亦可Ar1 ~Ar2 及Ar5 ~Ar6 的2個以上包含取代基X。另外,多個取代基X亦可多個取代至Ar1 ~Ar2 及Ar5 ~Ar6 的任一個上。進而,Ar1 ~Ar2 及Ar5 ~Ar6 中亦可包含取代基X以外的取代基。 此外,取代基X的定義及較佳形態如上所述。In the element 3, at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 may have a substituent X, and two or more of Ar 1 to Ar 2 and Ar 5 to Ar 6 may include a substituent X. Further, a plurality of substituents X may be substituted with any one of Ar 1 to Ar 2 and Ar 5 to Ar 6 . Further, Ar 1 to Ar 2 and Ar 5 to Ar 6 may further include a substituent other than the substituent X. Further, the definition and preferred form of the substituent X are as described above.

在要件4中,只要Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有取代基Y(或者取代基Z)即可,亦可Ar1 ~Ar2 及Ar5 ~Ar6 的2個以上包含取代基Y(或者取代基Z)。另外,多個取代基Y(或者多個取代基Z)亦可多個取代至Ar1 ~Ar2 及Ar5 ~Ar6 的任一個上。進而,Ar1 ~Ar2 及Ar5 ~Ar6 中亦可包含取代基Y(或者取代基Z)以外的取代基。進而,亦可在Ar1 ~Ar2 及Ar5 ~Ar6 的任一個上同時取代取代基Y及取代基Z。 此外,取代基Y及取代基Z的定義及較佳形態如上所述。In the element 4, at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 may have a substituent Y (or a substituent Z), and two of Ar 1 to Ar 2 and Ar 5 to Ar 6 may be used. The above includes a substituent Y (or a substituent Z). Further, a plurality of substituents Y (or a plurality of substituents Z) may be substituted with any one of Ar 1 to Ar 2 and Ar 5 to Ar 6 . Further, Ar 1 to Ar 2 and Ar 5 to Ar 6 may further include a substituent other than the substituent Y (or the substituent Z). Further, the substituent Y and the substituent Z may be simultaneously substituted in any one of Ar 1 to Ar 2 and Ar 5 to Ar 6 . Further, the definitions and preferred forms of the substituent Y and the substituent Z are as described above.

通式(1)所表示的化合物的合成方法並無特別限制,可組合公知的方法來進行合成。The method for synthesizing the compound represented by the formula (1) is not particularly limited, and a known method can be used for the synthesis.

<組成物> 本發明的組成物包含所述通式(1)所表示的化合物。此外,在組成物中,通式(1)所表示的化合物可僅使用一種,亦可併用兩種以上。 在使用由本發明的組成物所形成的膜作為高折射率膜的情況下,作為組成物中所含的通式(1)所表示的化合物的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為5質量%以上,更佳為10質量%以上,進而較佳為30質量%以上。上限並無特別限制,可列舉100質量%,在包含下述其他任意成分的情況下,多數情況下為80質量%以下,多數情況下為60質量%以下。 此外,所謂固體成分意指形成下述膜的成分,不含溶劑。<Composition> The composition of the present invention contains the compound represented by the above formula (1). In addition, the compound represented by the formula (1) may be used alone or in combination of two or more. In the case where the film of the composition of the present invention is used as the high-refractive-index film, the content of the compound represented by the formula (1) contained in the composition is more excellent in terms of the effects of the present invention. With respect to all the solid components in the composition, it is preferably 5% by mass or more, more preferably 10% by mass or more, and still more preferably 30% by mass or more. The upper limit is not particularly limited, and may be, for example, 100% by mass, and in the case of including any of the other optional components described below, it is usually 80% by mass or less, and in many cases, it is 60% by mass or less. Further, the solid content means a component which forms the following film, and does not contain a solvent.

<其他任意成分> 組成物中亦可包含所述通式(1)所表示的化合物以外的其他化合物,例如亦可包含聚合性化合物、聚合物、聚合起始劑、界面活性劑、矽烷偶合劑(silane coupling agent)、無機粒子、溶劑、聚合抑制劑等。 以下,對組成物中可包含的任意成分的代表例進行詳細說明。<Other optional components> The composition may contain other compounds than the compound represented by the above formula (1), and may contain, for example, a polymerizable compound, a polymer, a polymerization initiator, a surfactant, and a decane coupling agent. (silane coupling agent), inorganic particles, solvent, polymerization inhibitor, and the like. Hereinafter, a representative example of any component which can be contained in the composition will be described in detail.

(聚合性化合物) 組成物中亦可包含與通式(1)所表示的化合物不同的聚合性化合物。藉由使用聚合性化合物且實施硬化處理,而所形成的膜的強度提高。 聚合性化合物的種類並無特別限制,可使用公知的聚合性化合物。聚合性化合物中所含的聚合性基的種類並無特別限制,例如可列舉包含於取代基X的聚合性基。 聚合性化合物中的聚合性基的數量並無特別限制,就所形成的膜的強度更優異的方面而言,較佳為包含2個以上的聚合性基。換言之,較佳為多官能聚合性化合物。 此外,組成物中可僅含有一種聚合性化合物,亦可含有兩種以上的聚合性化合物。(Polymerizable Compound) The polymerizable compound different from the compound represented by the formula (1) may be contained in the composition. The strength of the formed film is improved by using a polymerizable compound and performing a hardening treatment. The type of the polymerizable compound is not particularly limited, and a known polymerizable compound can be used. The type of the polymerizable group contained in the polymerizable compound is not particularly limited, and examples thereof include a polymerizable group included in the substituent X. The number of the polymerizable groups in the polymerizable compound is not particularly limited, and it is preferable to contain two or more polymerizable groups from the viewpoint that the strength of the formed film is more excellent. In other words, a polyfunctional polymerizable compound is preferred. Further, the composition may contain only one polymerizable compound, and may contain two or more kinds of polymerizable compounds.

聚合性化合物並無特別限制,例如可列舉包含乙烯性不飽和鍵的化合物。包含乙烯性不飽和鍵的化合物的例子可參考日本專利特開2013-253224號公報的段落0033~段落0034的記載,且將其內容併入至本說明書中。 包含乙烯性不飽和鍵的化合物較佳為乙烯氧基改質季戊四醇四丙烯酸酯(市售品為NK ESTER ATM-35E;新中村化學公司製造)、二季戊四醇三丙烯酸酯(市售品為KAYARAD D-330;日本化藥股份有限公司製造)、二季戊四醇四丙烯酸酯(市售品為KAYARAD D-320;日本化藥股份有限公司製造)、二季戊四醇五(甲基)丙烯酸酯(市售品為KAYARAD D-310;日本化藥股份有限公司製造)、二季戊四醇六(甲基)丙烯酸酯(市售品為KAYARAD DPHA;日本化藥股份有限公司製造)、及該些的(甲基)丙烯醯基介隔乙二醇、丙二醇殘基的結構。另外,亦可使用該些的寡聚物型(oligomer type)。 另外,可引用日本專利特開2012-251125號公報(對應的國際公開第2012/153826號)的段落[0107]~段落[0118]或日本專利特開2012-255148號公報(對應的國際公開第2012-157784號)的段落[0114]~段落[0128]等中記載的聚合性化合物,且將該些內容併入至本申請案說明書中。The polymerizable compound is not particularly limited, and examples thereof include a compound containing an ethylenically unsaturated bond. An example of a compound containing an ethylenically unsaturated bond can be referred to the description of paragraphs 0033 to 0034 of JP-A-2013-253224, the contents of which are incorporated herein. The compound containing an ethylenically unsaturated bond is preferably a vinyloxy-modified pentaerythritol tetraacrylate (commercially available as NK ESTER ATM-35E; manufactured by Shin-Nakamura Chemical Co., Ltd.) and dipentaerythritol triacrylate (commercially available as KAYARAD D). -330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available) KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth) acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.), and (meth) acrylonitrile The structure of the ethylene glycol and propylene glycol residues. In addition, such an oligomer type can also be used. In addition, paragraphs [0107] to [0118] of Japanese Patent Laid-Open Publication No. 2012-251125 (corresponding International Publication No. 2012/153826) or Japanese Patent Laid-Open No. 2012-255148 (corresponding International Publication No.) The polymerizable compound described in paragraphs [0114] to [0128] of [2012-157784], and the contents thereof are incorporated in the specification of the present application.

聚合性化合物的其他較佳形態可列舉下述通式(M1)所表示的聚合性化合物。Other preferred embodiments of the polymerizable compound include a polymerizable compound represented by the following formula (M1).

[化5]通式(M1)[Chemical 5] General formula (M1)

所述通式(M1)中,Ar11 ~Ar14 分別獨立地表示可具有取代基的芳香環基,Ar11 ~Ar14 中的1個以上包含具有聚合性基的取代基。另外,Ar11 ~Ar14 可分別相互連結,較佳為Ar13 與Ar14 連結。 Ar11 ~Ar14 所表示的芳香環基的定義與通式(1)中的Ar1 ~Ar4 所表示的芳香環基的定義同義,較佳形態亦相同。 另外,Ar11 ~Ar14 所包含的取代基所具有的所述聚合性基較佳為自由基聚合性基。In the above formula (M1), Ar 11 to Ar 14 each independently represent an aromatic ring group which may have a substituent, and one or more of Ar 11 to Ar 14 include a substituent having a polymerizable group. Further, Ar 11 to Ar 14 may be bonded to each other, and it is preferable that Ar 13 and Ar 14 are bonded to each other. The definition of the aromatic ring group represented by Ar 11 to Ar 14 is synonymous with the definition of the aromatic ring group represented by Ar 1 to Ar 4 in the formula (1), and the preferred embodiment is also the same. Further, the polymerizable group of the substituent contained in Ar 11 to Ar 14 is preferably a radical polymerizable group.

Ar11 ~Ar14 中的1個以上包含具有聚合性基的取代基。其中,就所形成的膜的強度更優異的方面而言,較佳為Ar11 ~Ar14 中的2個~4個包含具有聚合性基的取代基,更佳為Ar11 ~Ar14 中的2個或3個包含具有聚合性基的取代基,尤佳為Ar11 ~Ar14 中的2個包含具有聚合性基的取代基。 此外,具有聚合性基的取代基的結構並無特別限定,就本發明的效果更優異的方面而言,較佳為以下通式(M2)所表示的基。   通式(M2)     *-LB -Vb LB 表示單鍵或二價連結基。二價連結基的具體例及較佳形態與所述LX1 ~LX3 所表示的二價連結基相同。 Vb 表示聚合性基。聚合性基的定義如上所述。One or more of Ar 11 to Ar 14 include a substituent having a polymerizable group. In particular, in terms of the strength of the formed film being more excellent, it is preferred that two to four of Ar 11 to Ar 14 include a substituent having a polymerizable group, and more preferably Ar 11 to Ar 14 Two or three substituents having a polymerizable group are contained, and it is particularly preferable that two of Ar 11 to Ar 14 include a substituent having a polymerizable group. In addition, the structure of the substituent having a polymerizable group is not particularly limited, and a group represented by the following formula (M2) is preferred because the effect of the present invention is more excellent. The general formula (M2) *-L B -V b L B represents a single bond or a divalent linking group. Specific examples and preferred embodiments of the divalent linking group are the same as those of the divalent linking group represented by the above L X1 to L X3 . V b represents a polymerizable group. The definition of the polymerizable group is as described above.

所述通式(M1)中,Ar11 ~Ar14 亦可分別相互連結。Ar11 ~Ar14 分別相互連結時所形成的環較佳為脂環。Ar11 ~Ar14 分別相互連結時的連結基可列舉單鍵、-O-等,較佳為單鍵。Ar11 ~Ar14 分別相互連結時所形成的環(意指包含Ar11 ~Ar14 分別相互連結時的連結基的1個環,並非Ar11 ~Ar14 分別相互連結的結果所形成的縮合環整體)的環員數較佳為5或6,更佳為5。 在Ar11 ~Ar14 分別相互連結的情況下,較佳為Ar11 ~Ar14 中相互鄰接的2個連結,更佳為Ar13 及Ar14 連結,尤佳為Ar11 ~Ar14 中僅Ar13 及Ar14 連結。In the above formula (M1), Ar 11 to Ar 14 may be bonded to each other. The ring formed when Ar 11 to Ar 14 are bonded to each other is preferably an alicyclic ring. Examples of the linking group when Ar 11 to Ar 14 are bonded to each other include a single bond, -O-, and the like, and a single bond is preferred. Ring Ar Ar 11 ~ 14 are connected to each other are formed by (Ar 11 ~ Ar comprises means connected to the time base 14 are coupled to each other in a ring not condensed ring Ar Ar 11 ~ 14 are interconnected results to be formed The number of rings of the whole is preferably 5 or 6, more preferably 5. When Ar 11 to Ar 14 are respectively connected to each other, it is preferable that two of Ar 11 to Ar 14 are adjacent to each other, and more preferably Ar 13 and Ar 14 are bonded, and particularly preferably Ar 11 to Ar 14 are Ar only. 13 and Ar 14 links.

在組成物中包含聚合性化合物的情況下,作為組成物中所含的聚合性化合物的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為20質量%~95質量%,更佳為30質量%~80質量%,進而較佳為35質量%~60質量%。 另外,通式(1)所表示的化合物與聚合性化合物的質量比並無特別限制,就本發明的效果更優異的方面而言,相對於通式(1)所表示的化合物100質量份,聚合性化合物的含量較佳為10質量份~120質量份,更佳為30質量份~90質量份。 此外,在組成物中,聚合性化合物可僅使用一種,亦可併用兩種以上。When the polymerizable compound is contained in the composition, the content of the polymerizable compound contained in the composition is preferably excellent in the effect of the present invention with respect to all the solid components in the composition. 20% by mass to 95% by mass, more preferably 30% by mass to 80% by mass, still more preferably 35% by mass to 60% by mass. In addition, the mass ratio of the compound represented by the formula (1) to the polymerizable compound is not particularly limited, and the effect of the present invention is more excellent, and 100 parts by mass of the compound represented by the formula (1). The content of the polymerizable compound is preferably from 10 parts by mass to 120 parts by mass, more preferably from 30 parts by mass to 90 parts by mass. Further, in the composition, the polymerizable compound may be used alone or in combination of two or more.

(聚合物) 組成物中亦可包含聚合物,就本發明的效果更優異的方面而言,較佳為具有酸基與聚合性基的聚合物。 酸基及聚合性基的具體例及較佳形態與通式(1)所表示的化合物中的酸基及聚合性基分別相同。 聚合物中的酸基及聚合性基的位置並無特別限制,可列舉側鏈或末端。另外,聚合物中較佳為包含具有酸基的重複單元及具有聚合性基的重複單元。 進而,就所形成的膜的折射率更優異的方面而言,聚合物中較佳為包含芳香環基。芳香環基的具體例及較佳形態與通式(1)所表示的化合物中的芳香環基相同。此外,聚合物中較佳為包含具有芳香環基的重複單元。 聚合物的主骨架並無特別限制,例如較佳為丙烯酸系聚合物、聚醚、丙烯醯胺、聚醯胺、聚醯亞胺、丙烯酸系聚合物、聚酯等,更佳為丙烯酸系聚合物。 聚合物的重量平均分子量並無特別限制,較佳為1,000~100,000,更佳為1,000~30,000,進而較佳為5,000~30,000,進而更佳為7,000~20,000。 此外,在本說明書中,重量平均分子量是在以下條件下藉由凝膠滲透層析法(Gel Permeation Chromatography,GPC)(溶劑:四氫呋喃(tetrahydrofuran,THF))所測定的聚苯乙烯換算值。 ·本體:HLC-8220 GPC(東曹(Tosoh)製造) ·管柱(column):將保護管柱(guard column)(HZ-L)、TSK gel Super(HZM-M)、TSK gel Super(HZ4000)、TSK gel Super(HZ3000)、TSK gel Super(HZ2000)連結而成的管柱 ·溶離液:四氫呋喃 ·送液條件:樣品泵(sample pump) 0.35 mL/min,參考泵(reference pump) 0.2 mL/min ·管柱溫度調節:40℃ ·測定樣品:0.1 wt%濃度(實施0.5 μm薄膜過濾器(membrane filter)過濾) ·注入量:10 μm ·測定時間:26分鐘The (polymer) composition may also contain a polymer, and in terms of the effect of the present invention being more excellent, a polymer having an acid group and a polymerizable group is preferred. Specific examples and preferred embodiments of the acid group and the polymerizable group are the same as those of the acid group and the polymerizable group in the compound represented by the formula (1). The position of the acid group and the polymerizable group in the polymer is not particularly limited, and examples thereof include a side chain or a terminal. Further, the polymer preferably contains a repeating unit having an acid group and a repeating unit having a polymerizable group. Further, in terms of the more excellent refractive index of the formed film, the polymer preferably contains an aromatic ring group. Specific examples and preferred embodiments of the aromatic ring group are the same as those of the compound represented by the formula (1). Further, it is preferred that the polymer contain a repeating unit having an aromatic ring group. The main skeleton of the polymer is not particularly limited, and is preferably, for example, an acrylic polymer, a polyether, a acrylamide, a polyamide, a polyimide, an acrylic polymer, a polyester, etc., more preferably an acrylic polymerization. Things. The weight average molecular weight of the polymer is not particularly limited, and is preferably from 1,000 to 100,000, more preferably from 1,000 to 30,000, still more preferably from 5,000 to 30,000, still more preferably from 7,000 to 20,000. Further, in the present specification, the weight average molecular weight is a value in terms of polystyrene measured by Gel Permeation Chromatography (GPC) under the following conditions (solvent: tetrahydrofuran (THF)). · Body: HLC-8220 GPC (manufactured by Tosoh) · Column: guard column (HZ-L), TSK gel Super (HZM-M), TSK gel Super (HZ4000) ), TSK gel Super (HZ3000), TSK gel Super (HZ2000) linked column column / dissolving solution: tetrahydrofuran · feeding conditions: sample pump 0.35 mL / min, reference pump (reference pump) 0.2 mL /min · Column temperature adjustment: 40 ° C · Measurement sample: 0.1 wt% concentration (implemented by 0.5 μm membrane filter) · Injection volume: 10 μm · Measurement time: 26 minutes

作為所述聚合物的較佳形態,就本發明的效果更優異的方面而言,可列舉包含通式(A)所表示的重複單元、通式(B)所表示的重複單元及通式(C)所表示的重複單元的聚合物。In a preferred embodiment of the polymer, the effect of the present invention is more excellent, and the repeating unit represented by the formula (A), the repeating unit represented by the formula (B), and the formula (including C) The polymer of the repeating unit represented.

[化6] [Chemical 6]

通式(A)~通式(C)中,R1A 、R1B 及R1C 分別獨立地表示氫原子或烷基(較佳為碳數1~3的烷基)。 通式(A)~通式(C)中,L1A 、L1B 及L1C 分別獨立地表示單鍵或二價連結基。二價連結基的具體例及較佳形態與所述LX1 ~LX3 所表示的二價連結基相同。 通式(A)中,R2A 表示酸基。 通式(B)中,R2B 表示聚合性基。 通式(C)中,R2C 表示芳香環基。In the general formulae (A) to (C), R 1A , R 1B and R 1C each independently represent a hydrogen atom or an alkyl group (preferably an alkyl group having 1 to 3 carbon atoms). In the general formulae (A) to (C), L 1A , L 1B and L 1C each independently represent a single bond or a divalent linking group. Specific examples and preferred embodiments of the divalent linking group are the same as those of the divalent linking group represented by the above L X1 to L X3 . In the formula (A), R 2A represents an acid group. In the formula (B), R 2B represents a polymerizable group. In the formula (C), R 2C represents an aromatic ring group.

在組成物中包含聚合物的情況下,作為組成物中所含的聚合物的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為10質量%~95質量%,更佳為20質量%~80質量%。 另外,通式(1)所表示的化合物與聚合物的質量比並無特別限制,就本發明的效果更優異的方面而言,相對於通式(1)所表示的化合物100質量份,聚合物的含量較佳為10質量份~200質量份,更佳為20質量份~150質量份。 此外,在組成物中,聚合物可僅使用一種,亦可併用兩種以上。When the polymer is contained in the composition, the content of the polymer contained in the composition is preferably 10% with respect to the total solid content of the composition in terms of the effect of the present invention being more excellent. % to 95% by mass, more preferably 20% by mass to 80% by mass. In addition, the mass ratio of the compound represented by the formula (1) to the polymer is not particularly limited, and in terms of the effect of the present invention, the polymerization is carried out with respect to 100 parts by mass of the compound represented by the formula (1). The content of the substance is preferably from 10 parts by mass to 200 parts by mass, more preferably from 20 parts by mass to 150 parts by mass. Further, in the composition, the polymer may be used alone or in combination of two or more.

(聚合起始劑) 聚合起始劑只要具有藉由光、熱的任一者或其兩者而使聚合性化合物的聚合開始的能力,則並無特別限制,較佳為光聚合起始劑。在利用光而開始聚合的情況下,較佳為對紫外線區域至可見光線具有感光性的聚合起始劑。 另外,在利用熱而使聚合開始的情況下,較佳為在150℃~250℃下發生分解的聚合起始劑。 聚合起始劑較佳為至少具有芳香族基的化合物,例如可列舉:醯基膦化合物、苯乙酮化合物、α-胺基酮化合物、二苯甲酮化合物、安息香醚化合物、縮酮衍生物化合物、噻噸酮化合物、肟化合物、六芳基聯咪唑化合物、三鹵甲基化合物、偶氮化合物、有機過氧化物、重氮鎓化合物、錪化合物、鋶化合物、吖嗪鎓化合物、茂金屬化合物等鎓鹽化合物、有機硼鹽化合物、二碸化合物、硫醇化合物等。 所述聚合起始劑可參照日本專利特開2013-253224號公報的段落0217~段落0228的記載,且將其內容併入至本說明書中。 肟化合物可使用作為市售品的IRGACURE-OXE01(巴斯夫(BASF)公司製造)、IRGACURE-OXE02(巴斯夫(BASF)公司製造)。苯乙酮系起始劑可使用作為市售品的IRGACURE-907、IRGACURE-369及IRGACURE-379(商品名:均為日本巴斯夫(BASF Japan)公司製造)。另外,醯基膦系起始劑可使用作為市售品的IRGACURE-819或DAROCUR-TPO(商品名:均為日本巴斯夫(BASF Japan)公司製造)。 另外,可引用日本專利特開2012-251125號公報(對應的國際公開第2012/153826號)的段落[0119]~段落[0215]或日本專利特開2012-255148號公報(對應的國際公開第2012-157784號)的段落[0129]~段落[0226]等中記載的聚合起始劑,且將該些內容併入至本申請案說明書中。 在組成物中包含聚合起始劑的情況下,作為組成物中所含的聚合起始劑的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為0.1質量%~10質量%,更佳為0.5質量%~5質量%。(Polymerization Initiator) The polymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of a polymerizable compound by either light or heat, and is preferably a photopolymerization initiator. . In the case where polymerization is started by light, a polymerization initiator which is photosensitive to an ultraviolet ray region to visible light is preferred. Further, in the case where polymerization is started by heat, a polymerization initiator which decomposes at 150 ° C to 250 ° C is preferred. The polymerization initiator is preferably a compound having at least an aromatic group, and examples thereof include a mercaptophosphine compound, an acetophenone compound, an α-aminoketone compound, a benzophenone compound, a benzoin ether compound, and a ketal derivative. Compound, thioxanthone compound, hydrazine compound, hexaarylbiimidazole compound, trihalomethyl compound, azo compound, organic peroxide, diazonium compound, hydrazine compound, hydrazine compound, oxazine oxime compound, metallocene An onium salt compound such as a compound, an organic boron salt compound, a diterpene compound, a thiol compound, or the like. The polymerization initiator can be referred to the description of paragraphs 0217 to 0228 of JP-A-2013-253224, and the contents thereof are incorporated in the specification. As the ruthenium compound, IRGACURE-OXE01 (manufactured by BASF) and IRGACURE-OXE02 (manufactured by BASF) can be used as a commercial product. As the acetophenone-based initiator, IRGACURE-907, IRGACURE-369, and IRGACURE-379 (trade names: all manufactured by BASF Japan Co., Ltd.) are commercially available. Further, as the mercaptophosphine-based initiator, IRGACURE-819 or DAROCUR-TPO (trade name: all manufactured by BASF Japan) can be used as a commercial product. In addition, paragraphs [0119] to [0215] of Japanese Patent Laid-Open Publication No. 2012-251125 (corresponding International Publication No. 2012/153826) or Japanese Patent Laid-Open No. 2012-255148 (corresponding international publications) The polymerization initiator described in paragraphs [0129] to [0226] of 2012-157784, and the contents thereof are incorporated in the specification of the present application. In the case where the polymerization initiator is contained in the composition, the content of the polymerization initiator contained in the composition is more excellent in the effect of the present invention than the total solid content in the composition. It is preferably from 0.1% by mass to 10% by mass, more preferably from 0.5% by mass to 5% by mass.

(界面活性劑) 界面活性劑並無特別限制,可使用氟系界面活性劑、非離子系界面活性劑、陽離子系界面活性劑、陰離子系界面活性劑、矽酮系界面活性劑等各種界面活性劑。 氟系界面活性劑例如可列舉:Megafac F171、Megafac F172、Megafac F173、Megafac F176、Megafac F177、Megafac F141、Megafac F142、Megafac F143、Megafac F144、Megafac R30、Megafac F437、Megafac F475、Megafac F479、Megafac F482、Megafac F554、Megafac F780、Megafac F781(以上為大日本油墨化學(Dainippon Ink & Chemical,DIC)股份有限公司製造),Fluorad FC430、Fluorad FC431、Fluorad FC171(以上為住友3M股份有限公司製造),Surflon S-382、Surflon SC-101、Surflon SC-103、Surflon SC-104、Surflon SC-105、Surflon SC1068、Surflon SC-381、Surflon SC-383、Surflon S393、Surflon KH-40(以上為旭硝子股份有限公司製造),PF636、PF656、PF6320、PF6520、PF7002(歐諾法(OMNOVA)公司製造)等。 界面活性劑可引用日本專利特開2012-251125號公報(對應的國際公開第2012/153826號)的段落[0256]~段落[0264]或日本專利特開2012-255148號公報(對應的國際公開第2012-157784號)的段落[0295]~段落[0303]等中記載的界面活性劑,且將該些內容併入至本申請案說明書中。 在組成物中包含界面活性劑的情況下,作為組成物中所含的界面活性劑的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為0.01質量%~10質量%,更佳為0.01質量%~5質量%。(Interacting Agent) The surfactant is not particularly limited, and various interface activities such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and an anthrone-based surfactant can be used. Agent. Examples of the fluorine-based surfactant include Megafac F171, Megafac F172, Megafac F173, Megafac F176, Megafac F177, Megafac F141, Megafac F142, Megafac F143, Megafac F144, Megafac R30, Megafac F437, Megafac F475, Megafac F479, and Megafac F482. , Megafac F554, Megafac F780, Megafac F781 (above manufactured by Dainippon Ink & Chemical (DIC) Co., Ltd.), Fluorad FC430, Fluorad FC431, Fluorad FC171 (above Sumitomo 3M Co., Ltd.), Surflon S-382, Surflon SC-101, Surflon SC-103, Surflon SC-104, Surflon SC-105, Surflon SC1068, Surflon SC-381, Surflon SC-383, Surflon S393, Surflon KH-40 (above is Asahi Glass Co., Ltd.) Manufactured by the company, PF636, PF656, PF6320, PF6520, PF7002 (manufactured by OMNOVA). The surfactant may be referred to in paragraphs [0256] to [0264] of Japanese Patent Laid-Open Publication No. 2012-251125 (corresponding International Publication No. 2012/153826) or Japanese Patent Laid-Open No. 2012-255148 (corresponding international publication) The surfactants described in paragraphs [0295] to [0303] of the Japanese Patent Publication No. 2012-157784, and the contents thereof are hereby incorporated by reference. When the surfactant is contained in the composition, the content of the surfactant contained in the composition is preferably excellent in terms of the effect of the present invention with respect to all the solid components in the composition. From 0.01% by mass to 10% by mass, more preferably from 0.01% by mass to 5% by mass.

(矽烷偶合劑) 矽烷偶合劑並無特別限制,例如可列舉:N-β-胺基乙基-γ-胺基丙基-甲基二甲氧基矽烷(信越化學工業公司製造,商品名 KBM-602)、N-β-胺基乙基-γ-胺基丙基-三甲氧基矽烷(信越化學工業公司製造,商品名 KBM-603)、N-β-胺基乙基-γ-胺基丙基-三乙氧基矽烷(信越化學工業公司製造,商品名 KBE-602)、γ-胺基丙基-三甲氧基矽烷(信越化學工業公司製造,商品名 KBM-903)、γ-胺基丙基-三乙氧基矽烷(信越化學工業公司製造,商品名 KBE-903)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(信越化學工業公司製造,商品名 KBM-503)等。 在組成物中包含矽烷偶合劑的情況下,作為組成物中所含的矽烷偶合劑的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為0.01質量%~10質量%,更佳為0.01質量%~5質量%。(decane coupling agent) The decane coupling agent is not particularly limited, and examples thereof include N-β-aminoethyl-γ-aminopropyl-methyldimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM) -602), N-β-aminoethyl-γ-aminopropyl-trimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-603), N-β-aminoethyl-γ-amine Propyl-triethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KBE-602), γ-aminopropyl-trimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-903), γ- Aminopropyl-triethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KBE-903), 3-methacryloxypropyltrimethoxydecane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-503) )Wait. When the decane coupling agent is contained in the composition, the content of the decane coupling agent contained in the composition is preferably excellent in terms of the effect of the present invention with respect to all the solid components in the composition. From 0.01% by mass to 10% by mass, more preferably from 0.01% by mass to 5% by mass.

(聚合抑制劑) 為了在本發明的組成物的製造中或保存中抑制聚合性化合物的不需要的聚合,組成物中亦可包含聚合抑制劑。 聚合抑制劑可列舉:含酚系羥基的化合物、N-氧化物化合物類、哌啶1-氧自由基化合物類、吡咯啶1-氧自由基化合物類、N-亞硝基苯基羥基胺類、重氮鎓化合物類、陽離子染料類、含硫基的化合物類、含硝基的化合物類、FeCl3 、CuCl2 等過渡金屬化合物類。 在組成物中包含聚合抑制劑的情況下,作為組成物中所含的聚合抑制劑的含量,就本發明的效果更優異的方面而言,相對於組成物中的全部固體成分,較佳為0.001質量%~1質量%,更佳為0.001質量%~0.5質量%。(Polymerization Inhibitor) In order to suppress unnecessary polymerization of the polymerizable compound during production or storage of the composition of the present invention, a polymerization inhibitor may be contained in the composition. Examples of the polymerization inhibitor include a phenolic hydroxyl group-containing compound, an N-oxide compound, a piperidine 1-oxyl radical compound, a pyrrolidine 1-oxy radical compound, and an N-nitrosophenylhydroxylamine. And diazonium compounds, cationic dyes, sulfur-containing compounds, nitro-containing compounds, transition metal compounds such as FeCl 3 and CuCl 2 . When the polymerization inhibitor is contained in the composition, the content of the polymerization inhibitor contained in the composition is preferably excellent in terms of the effect of the present invention with respect to all the solid components in the composition. 0.001% by mass to 1% by mass, more preferably 0.001% by mass to 0.5% by mass.

(無機粒子) 無機粒子較佳為折射率高且無色、白色或透明的無機粒子,可列舉鈦(Ti)、鋯(Zr)、鋁(Al)、矽(Si)、鋅(Zn)或鎂(Mg)的氧化物粒子,更佳為二氧化鈦(TiO2 )粒子、氧化鋯(ZrO2 )粒子或二氧化矽(SiO2 )粒子。 無機粒子的一次粒徑並無特別限制,較佳為1 nm~100 nm,更佳為1 nm~80 nm,尤佳為1 nm~50 nm。若無機粒子的一次粒徑為所述範圍內,則分散性優異,並且折射率及透過率提高。 無機粒子的折射率並無特別限制,就獲得高折射率的觀點而言,較佳為1.75~2.70,更佳為1.90~2.70。 無機粒子的比表面積並無特別限制,較佳為10 m2 /g~400 m2 /g,更佳為20 m2 /g~200 m2 /g,進而較佳為30 m2 /g~150 m2 /g。 另外,無機粒子的形狀並無特別限制,例如可列舉米粒狀、球形狀、立方體狀、紡錘形狀或不定形狀等。 無機粒子亦可為藉由有機化合物進行了表面處理的無機粒子。表面處理中所使用的有機化合物的例子包含多元醇、烷醇胺、硬脂酸、矽烷偶合劑或鈦酸酯偶合劑。其中,較佳為硬脂酸或矽烷偶合劑。 另外,就耐候性進一步提高的方面而言,無機粒子的表面亦較佳為藉由鋁、矽、氧化鋯等氧化物覆蓋。 無機粒子可較佳地使用市售的無機粒子。 無機粒子可單獨使用一種,亦可組合兩種以上而使用。(Inorganic Particles) The inorganic particles are preferably inorganic particles having a high refractive index and being colorless, white or transparent, and examples thereof include titanium (Ti), zirconium (Zr), aluminum (Al), cerium (Si), zinc (Zn) or magnesium. The oxide particles of (Mg) are more preferably titanium dioxide (TiO 2 ) particles, zirconium oxide (ZrO 2 ) particles or cerium oxide (SiO 2 ) particles. The primary particle diameter of the inorganic particles is not particularly limited, but is preferably 1 nm to 100 nm, more preferably 1 nm to 80 nm, and particularly preferably 1 nm to 50 nm. When the primary particle diameter of the inorganic particles is within the above range, the dispersibility is excellent, and the refractive index and the transmittance are improved. The refractive index of the inorganic particles is not particularly limited, and from the viewpoint of obtaining a high refractive index, it is preferably 1.75 to 2.70, more preferably 1.90 to 2.70. The specific surface area of the inorganic particles is not particularly limited, but is preferably from 10 m 2 /g to 400 m 2 /g, more preferably from 20 m 2 /g to 200 m 2 /g, still more preferably 30 m 2 /g - 150 m 2 /g. Further, the shape of the inorganic particles is not particularly limited, and examples thereof include a rice grain shape, a spherical shape, a cubic shape, a spindle shape, and an indefinite shape. The inorganic particles may also be inorganic particles surface-treated with an organic compound. Examples of the organic compound used in the surface treatment include a polyol, an alkanolamine, a stearic acid, a decane coupling agent, or a titanate coupling agent. Among them, a stearic acid or a decane coupling agent is preferred. Further, in terms of further improvement in weather resistance, the surface of the inorganic particles is preferably covered with an oxide such as aluminum, lanthanum or zirconia. As the inorganic particles, commercially available inorganic particles can be preferably used. The inorganic particles may be used singly or in combination of two or more.

以異物的去除或缺陷的減少等為目的,本發明的組成物較佳為利用過濾器(filter)進行過濾。過濾器只要為先前以來一直用於過濾用途等的過濾器,則可無特別限定地使用。例如可列舉:由聚四氟乙烯(polytetrafluoroethylene,PTFE)等氟樹脂、尼龍(nylon)等聚醯胺系樹脂、聚乙烯、聚丙烯(polypropylene,PP)等聚烯烴樹脂(包含高密度、超高分子量)等構成的過濾器。該些素材之中,較佳為聚丙烯(包含高密度聚丙烯)及尼龍。 過濾器的孔徑宜為0.1 μm~7.0 μm左右,較佳為0.2 μm~2.5 μm左右,更佳為0.2 μm~1.5 μm左右,進而較佳為0.3 μm~0.7 μm。藉由設為該範圍,可抑制過濾堵塞,並且可將組成物中所含的雜質或凝聚物等微細的異物確實地去除。 在使用過濾器時,亦可組合不同的過濾器。此時,利用第1過濾器的過濾可僅為1次,亦可進行2次以上。在組合不同的過濾器而進行2次以上過濾的情況下,較佳為相較於第一次的過濾的孔徑而第二次以後的孔徑同等或較大。另外,亦可在所述範圍內組合不同孔徑的第1過濾器。此處的孔徑可參照過濾器廠商的標稱值。市售的過濾器例如可自日本頗爾(Nihon Pall)股份有限公司、埃德溫東洋(Advantec Toyo)股份有限公司、日本應特格(Nihon Entegris)股份有限公司(原日本密科理(Nihon Mykrolis)股份有限公司)、或北澤微過濾器(KITZ Micro Filter)股份有限公司等所提供的各種過濾器中選擇。 第2過濾器可使用由與所述第1過濾器相同的材料等所形成的過濾器。第2過濾器的孔徑宜為0.2 μm~10.0 μm左右,較佳為0.2 μm~7.0 μm左右,進而較佳為0.3 μm~6.0 μm左右。藉由設為該範圍,可在使組成物中所含有的成分粒子殘存的狀態下,將混入至組成物中的異物去除。 例如,亦可利用第1過濾器的過濾僅以分散液進行,混合其他成分後,進行第2過濾。For the purpose of removing foreign matter or reducing defects, the composition of the present invention is preferably filtered by a filter. The filter is not particularly limited as long as it is a filter that has been used for filtration purposes and the like. For example, a fluororesin such as polytetrafluoroethylene (PTFE), a polyamide resin such as nylon, or a polyolefin resin such as polyethylene or polypropylene (polypropylene) may be used (including high density and high density). A filter composed of a molecular weight or the like. Among these materials, polypropylene (including high density polypropylene) and nylon are preferred. The pore diameter of the filter is preferably from about 0.1 μm to about 7.0 μm, preferably from about 0.2 μm to about 2.5 μm, more preferably from about 0.2 μm to about 1.5 μm, still more preferably from 0.3 μm to 0.7 μm. By setting it as the range, it is possible to suppress the clogging of the filter, and it is possible to reliably remove fine foreign matter such as impurities or aggregates contained in the composition. Different filters can also be combined when using filters. In this case, the filtration by the first filter may be performed only once or twice or more. In the case where two or more filters are combined in combination with different filters, it is preferable that the pore diameters of the second time or later are equal or larger than those of the first filter. Further, the first filter having a different pore diameter may be combined within the above range. The aperture here can be referred to the nominal value of the filter manufacturer. Commercially available filters are available, for example, from Nihon Pall Co., Ltd., Advantec Toyo Co., Ltd., and Nihon Entegris Co., Ltd. (formerly Nihon, Japan) Mykrolis), or KITZ Micro Filter Co., Ltd., and other filters are available. As the second filter, a filter formed of the same material as the first filter or the like can be used. The pore diameter of the second filter is preferably from about 0.2 μm to about 10.0 μm, preferably from about 0.2 μm to about 7.0 μm, more preferably from about 0.3 μm to about 6.0 μm. By setting it as the range, the foreign matter mixed in the composition can be removed in a state in which the component particles contained in the composition remain. For example, the filtration by the first filter may be carried out only with a dispersion, and after mixing other components, the second filtration may be performed.

<用途> 本發明的化合物及組成物的用途並無特別限制,例如作為顯示裝置或固體攝影元件的高折射構件(微透鏡(micro lens)、彩色濾光片(color filter)的基底層或鄰接層等透明膜,彩色濾光片的白色畫素(white pixel))、透鏡(眼鏡透鏡、數位相機(digital camera)用透鏡、菲涅耳透鏡(Fresnel lens)、稜鏡透鏡(prism lens)等)、光學用外塗劑(over coat agent)、硬塗劑(hard coat agent)、抗反射膜、光纖(light fiber)、光波導、發光二極體(Light Emitting Diode,LED)用密封材料、LED用平坦化材料、太陽光電池用塗佈材料(coating materials)有用。<Application> The use of the compound and the composition of the present invention is not particularly limited, and for example, a high refractive member (micro lens, a color filter) or a contiguous layer of a display device or a solid-state imaging element Transparent film such as layer, white pixel of color filter, lens (glass lens, lens for digital camera, Fresnel lens, prism lens, etc.) ), an over coat agent for optical use, a hard coat agent, an antireflection film, a light fiber, an optical waveguide, a sealing material for a light emitting diode (LED), LEDs are useful for planarizing materials and coating materials for solar cells.

<膜> 本發明的膜是由本發明的組成物所獲得的膜。藉由對組成物實施硬化處理,可獲得硬化膜。 本發明的膜的折射率並無特別限制,較佳為1.55以上,更佳為1.6~2.0。 本發明的膜的光透過率並無特別限制,較佳為遍及400 nm~700 nm的波長區域整個區域為90%以上,更佳為95%以上,進而較佳為100%。 本發明的膜的厚度並無特別限制,較佳為0.1 μm~20 μm,更佳為0.1 μm~10 μm,進而較佳為0.5 μm~4 μm。 使本發明的組成物硬化的方法並無特別限制,可列舉加熱或曝光等。加熱中所使用的裝置並無特別限制,可使用送風乾燥機、烘箱(oven)、紅外線乾燥機、加熱圓筒(drum)等。曝光中的使用裝置並無特別限制,可使用水銀燈、金屬鹵化物燈(metal halide lamp)、氙氣(Xe)燈、化學燈(chemical lamp)、碳弧燈(carbon arc lamp)等。 所述膜可應用於各種用途,例如可應用於固體攝影元件或顯示裝置等光學裝置。<Film> The film of the present invention is a film obtained from the composition of the present invention. The cured film can be obtained by subjecting the composition to a hardening treatment. The refractive index of the film of the present invention is not particularly limited, but is preferably 1.55 or more, and more preferably 1.6 to 2.0. The light transmittance of the film of the present invention is not particularly limited, but is preferably 90% or more, more preferably 95% or more, and still more preferably 100% in the entire wavelength region of 400 nm to 700 nm. The thickness of the film of the present invention is not particularly limited, but is preferably 0.1 μm to 20 μm, more preferably 0.1 μm to 10 μm, still more preferably 0.5 μm to 4 μm. The method for curing the composition of the present invention is not particularly limited, and examples thereof include heating or exposure. The apparatus used for heating is not particularly limited, and a blower dryer, an oven, an infrared dryer, a heating drum, or the like can be used. The device to be used for the exposure is not particularly limited, and a mercury lamp, a metal halide lamp, a xenon (Xe) lamp, a chemical lamp, a carbon arc lamp, or the like can be used. The film can be applied to various uses, for example, to an optical device such as a solid-state imaging element or a display device.

<固體攝影元件> 本發明的膜可較佳地應用於固體攝影元件。 例如可列舉如下構成等:在基板上具有包含構成固體攝影元件(電荷耦合器件(Charge Coupled Device,CCD)影像感測器(image sensor)、互補金氧半導體(Complementary MOS)影像感測器等)的受光區域的多個光二極體(photodiode)及多晶矽(polysilicon)等的受光元件,並且在彩色濾光片的下方具備作為本發明的膜的底塗膜。<Solid Photographic Element> The film of the present invention can be preferably applied to a solid-state imaging element. For example, the configuration may be such as to include a solid-state imaging device (Charge Coupled Device (CCD) image sensor, complementary MOS image sensor, etc.) on the substrate. A plurality of light-receiving elements such as photodiodes and polysilicon in the light-receiving region, and an undercoat film as a film of the present invention are provided below the color filter.

<顯示裝置> 本發明的膜可較佳地應用於顯示裝置。 本發明的顯示裝置較佳為數位單眼反光相機(digital single-lens reflex camera)的取景器(view finder)或頭戴(head-mount)式顯示器(display)等中所使用的小型·高精細有機電致發光(electroluminescence,EL)顯示裝置(例如,微型發光二極體(Organic Light Emitting Diode,OLED)),例如較佳為在玻璃(glass)等基板上設置有各畫素配置為矩陣(matrix)狀而成的顯示區域的顯示裝置。 以下,參照圖式對本發明的顯示裝置的一實施方式進行說明。 圖1是使用本發明的組成物作為彩色濾光片的基底劑的顯示裝置的一實施方式,為其一畫素部分的剖面圖。在顯示裝置100中,各畫素例如藉由產生白色光的多個有機EL元件20與彩色濾光片50(50R、50 G、50B)的組合而產生三原色(紅、綠及藍)的任一種光。多個有機EL元件20的間距(pitch)(中心間距離)p例如為30 μm以下,具體而言例如為約2 μm至3 μm。即,該顯示裝置100是有機EL元件20的尺寸極小的所謂稱為微型顯示器的顯示裝置。此外,在該顯示裝置100上設置有接目鏡(未圖示),使用者經由接目鏡而可放大地觀察到顯示於顯示裝置100的圖像。因此,使用者所能觀察到的僅為顯示於顯示裝置100的圖像中接目鏡的取入角的範圍內的部分。 有機EL元件20在基板10上配置為矩陣狀,並且藉由保護膜30所被覆。在保護膜30上,隔著接著層(未圖示)而遍及整面貼合有包含玻璃等的密封用基板(未圖示)。在該密封用基板的基板10側的表面設置有彩色濾光片50。 彩色濾光片50具有與多個有機EL元件20對向的透過紅色區域(未圖示)。在透過色區域的一部分設置有半透過區域(未圖示)。藉此,在該顯示裝置100中,即便在有機EL元件20的尺寸小的情況下,亦可抑制因通過鄰接的透過色區域的光的繞射所致的混色。 在彩色濾光片50的下方設置有作為本發明的膜的基底層40。 [實施例]<Display Device> The film of the present invention can be preferably applied to a display device. The display device of the present invention is preferably a small-sized high-definition used in a view finder or a head-mount display of a digital single-lens reflex camera. An electroluminescence (EL) display device (for example, an Organic Light Emitting Diode (OLED)), for example, preferably arranged on a substrate such as glass as a matrix (matrix) A display device for a display area. Hereinafter, an embodiment of a display device of the present invention will be described with reference to the drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing an embodiment of a display device using a composition of the present invention as a base agent for a color filter. In the display device 100, each pixel generates three primary colors (red, green, and blue) by, for example, a combination of a plurality of organic EL elements 20 that generate white light and color filters 50 (50R, 50 G, 50B). a kind of light. The pitch (center-to-center distance) p of the plurality of organic EL elements 20 is, for example, 30 μm or less, and specifically, for example, about 2 μm to 3 μm. In other words, the display device 100 is a display device called a microdisplay having an extremely small size of the organic EL element 20. Further, an eyepiece (not shown) is provided on the display device 100, and the user can view the image displayed on the display device 100 in an enlarged manner via the eyepiece. Therefore, what the user can observe is only the portion of the range of the angle of the entrance of the eyepiece displayed in the image of the display device 100. The organic EL elements 20 are arranged in a matrix on the substrate 10 and covered by the protective film 30. A sealing substrate (not shown) including glass or the like is bonded to the entire surface of the protective film 30 via an adhesive layer (not shown). A color filter 50 is provided on the surface of the substrate 10 on the sealing substrate. The color filter 50 has a red-transmissive region (not shown) that faces the plurality of organic EL elements 20. A semi-transmissive region (not shown) is provided in a portion of the transmission color region. As a result, in the display device 100, even when the size of the organic EL element 20 is small, color mixing due to diffraction of light passing through the adjacent transmission color regions can be suppressed. A base layer 40 as a film of the present invention is provided below the color filter 50. [Examples]

以下,藉由實施例對本發明進行更詳細的說明,但本發明並不限定於該些。 此外,關於本實施例,在組成物的製備後,全部使用日本頗爾製造的DFA4201NXEY(0.45 μm尼龍過濾器)進行過濾。Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited thereto. Further, with respect to the present example, after the preparation of the composition, all were filtered using DFA4201 NXEY (0.45 μm nylon filter) manufactured by Pall Japan.

<化合物的合成> 藉由公知的方法合成下述A-1~A-3。此外,各化合物的鑑定是藉由核磁共振(nuclear magnetic resonance,NMR)而進行。圖2中表示A-2的1 H-NMR圖表(chart)。<Synthesis of Compound> The following A-1 to A-3 were synthesized by a known method. Further, the identification of each compound was carried out by nuclear magnetic resonance (NMR). The 1 H-NMR chart (chart) of A-2 is shown in Fig. 2 .

<合成例1:A-1的合成法> 將5-溴-1-二氫茚酮50 g(和光純藥製造)與鄰苯二甲醛32 g的甲醇1500 mL溶液加熱至40℃而使其完全溶解。將氫氧化鉀(和光純藥製造)40 g的甲醇100 mL一面保持為30℃以下一面滴加至所述溶液中。滴加後,在55℃下加熱2小時後,冷卻至0℃。藉由進行過濾而獲得目標茀酮37 g。 在氮氣環境下,向所獲得的茀酮30 g與2-萘硼酸(東京化成製造)20 g的THF 500 mL溶液中添加碳酸鉀35 g(和光純藥製造)的水250 mL溶液並加熱至65℃。向其中添加四(三苯基膦)鈀(0)(東京化成製造)1.1 g。加熱攪拌5小時後,分液而獲得有機層,向所獲得的有機層中添加甲醇500 mL。藉由過濾而獲得析出來的目標物Y(31 g,90%)。<Synthesis Example 1: Synthesis of A-1> A solution of 50 g of 5-bromo-1-indanone (manufactured by Wako Pure Chemical Industries, Ltd.) and benzene phthalate (32 g) in 1500 mL of methanol was heated to 40 ° C to make it completely dissolved. To 100 g of methanol of 40 g of potassium hydroxide (manufactured by Wako Pure Chemical Industries, Ltd.) while being kept at 30 ° C or lower, the solution was added dropwise to the solution. After the dropwise addition, the mixture was heated at 55 ° C for 2 hours and then cooled to 0 ° C. The target anthrone 37 g was obtained by filtration. Add a solution of 35 g of potassium carbonate (manufactured by Wako Pure Chemical Industries, Ltd.) in a solution of 30 g of fluorenone obtained and 20 g of 2-naphthalene boronic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) in a 500 mL solution of THF. 65 ° C. To this was added tetrakis(triphenylphosphine)palladium(0) (manufactured by Tokyo Chemical Industry Co., Ltd.). After heating and stirring for 5 hours, the organic layer was obtained by liquid separation, and 500 mL of methanol was added to the obtained organic layer. The precipitated target Y (31 g, 90%) was obtained by filtration.

在對包含削片鎂(和光純藥股份有限公司製造)15.8 g(0.2171 mol)的四氫呋喃200 mL進行攪拌時,滴加2-(4-溴苯基)-苯并噻唑(東京化成製造)189.0 g(0.6514 mol)的四氫呋喃溶液2000 mL,製作格任亞(Grignard)試劑。其後,冷卻至0℃,一面注意放熱一面對目標物Y80 g添加格任亞(Grignard)試劑。滴加後,攪拌30分後滴加飽和氯化銨水溶液,停止反應。進行分液、濃縮而獲得油(oil),對所獲得的油利用管柱層析法(column chromatography)(己烷/乙酸乙酯=3/1)進行純化,獲得目標的三級醇98 g(產率:77.2%)。2-(4-bromophenyl)-benzothiazole (manufactured by Tokyo Chemical Industry Co., Ltd.) 189.0 was added dropwise while stirring 1.5 mL of tetrahydrofuran containing 15.8 g (0.2171 mol) of diced magnesium (manufactured by Wako Pure Chemical Industries, Ltd.). A solution of g (0.6514 mol) in tetrahydrofuran (2000 mL) was used to prepare a Grignard reagent. Thereafter, it was cooled to 0 ° C, and while adding heat, a Grignard reagent was added to the target Y80 g. After the dropwise addition, the mixture was stirred for 30 minutes, and then a saturated aqueous solution of ammonium chloride was added dropwise to terminate the reaction. The oil was separated and concentrated to obtain an oil, and the obtained oil was purified by column chromatography (hexane/ethyl acetate = 3/1) to obtain the objective tertiary alcohol 98 g. (Yield: 77.2%).

將所獲得的三級醇98 g(0.1730 mol)與二羥基萘(東京化成製造)33.3 g(0.2076 mol)、3-巰基丙酸(東京化成工業股份有限公司製造)2.8 g(0.02595 mol)的甲苯600 mL溶液加熱至60℃。向該溶液中滴加甲磺酸(東京化成工業股份有限公司製造)249.9 g(2.595 mol)。滴加後,攪拌1小時後添加水與乙酸乙酯,進行分液、濃縮而獲得油,對所獲得的油利用管柱層析法(己烷/乙酸乙酯=2/1)進行純化,獲得目標的二羥基體113 g(產率:91.9%)。The obtained tertiary alcohol 98 g (0.1730 mol) and dihydroxynaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.) 33.3 g (0.2076 mol), 3-mercaptopropionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 2.8 g (0.02595 mol) The 600 mL solution of toluene was heated to 60 °C. To the solution, methanesulfonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 249.9 g (2.595 mol) was added dropwise. After the dropwise addition, the mixture was stirred for 1 hour, and then water and ethyl acetate were added thereto, and liquid separation was carried out to obtain an oil. The obtained oil was purified by column chromatography (hexane/ethyl acetate = 2/1). The target dihydroxyl group 113 g was obtained (yield: 91.9%).

[化7] [Chemistry 7]

相對於二羥基體4 g將溴乙酸甲酯2.6 g(東京化成製造)、碳酸鉀4.7 g(和光純藥製造)的二甲基甲醯胺(DMF)20 mL溶液在60℃下攪拌2小時。反應結束後,添加氫氧化鉀1 g(和光純藥製造)的水10 mL而進行水解。添加鹽酸而成為酸性後,利用乙酸乙酯對有機層進行萃取,將其滴加至甲醇中並進行過濾,藉此獲得二羧酸體2.5 g。 向二羧酸體的環己酮17 mL中添加甲基丙烯酸縮水甘油酯0.43 g(和光純藥製造)、溴化四丁基銨0.2 g(和光純藥製造)、對甲氧基苯酚0.01 g(和光純藥製造),在90℃下攪拌12小時。 在0℃下向該反應液中添加丙烯醯氯1.4 g(東京化成製造)、三乙基胺3.0 g(和光純藥製造)並攪拌1小時。將反應液滴加至甲醇中並進行過濾,藉此獲得4 g的A-1。A solution of 2.6 g of methyl bromoacetate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 4.7 g of potassium carbonate (manufactured by Wako Pure Chemical Industries, Ltd.) in 20 mL of dimethylformamide (DMF) was stirred at 60 ° C for 2 hours. . After the completion of the reaction, 10 g of water of 1 g of potassium hydroxide (manufactured by Wako Pure Chemical Industries, Ltd.) was added to carry out hydrolysis. After adding hydrochloric acid to become acidic, the organic layer was extracted with ethyl acetate, and the mixture was added dropwise to methanol and filtered to obtain 2.5 g of a dicarboxylic acid. To a 17 mL portion of cyclohexanone dicarboxylic acid, 0.43 g of glycidyl methacrylate (manufactured by Wako Pure Chemical Industries, Ltd.), 0.2 g of tetrabutylammonium bromide (manufactured by Wako Pure Chemical Industries, Ltd.), and p-methoxyphenol 0.01 g were added. (Wako Pure Chemicals), stirred at 90 ° C for 12 hours. 1.4 g of acrylonitrile chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) and 3.0 g of triethylamine (manufactured by Wako Pure Chemical Industries, Ltd.) were added to the reaction mixture at 0 ° C and stirred for 1 hour. The reaction liquid was added to methanol and filtered, whereby 4 g of A-1 was obtained.

<合成例2:A-2的合成法> (單官能茀單體X的合成) 依據以下所示的合成流程(scheme)及合成方法(步驟A~步驟D),合成單官能茀單體X。<Synthesis Example 2: Synthesis method of A-2> (Synthesis of monofunctional oxime monomer X) The monofunctional oxime monomer X was synthesized according to the following synthesis scheme and synthesis method (steps A to D). .

[化8] [化8]

(步驟A) 在將削片鎂(和光純藥股份有限公司製造)14.6 g(0.5993 mol)在四氫呋喃200 mL中攪拌時,滴加2-溴萘(東京化成工業股份有限公司製造)124.1 g(0.5993 mol)的四氫呋喃溶液800 mL,製作格任亞(Grignard)試劑。其後,冷卻至0℃,滴加11H-苯并[b]茀-11-酮(東京化成工業製造)46 g的THF溶液600 mL。滴加後,攪拌30分鐘後滴加飽和氯化銨水溶液,停止反應。進行分液、濃縮而獲得油,對所獲得的油利用管柱層析法(己烷/乙酸乙酯=4/1)進行純化,獲得目標的三級醇65 g(產率:90.2%)。(Step A) 2-bromonaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.) 124.1 g was added dropwise while stirring 14.6 g (0.5993 mol) of the diced magnesium (manufactured by Wako Pure Chemical Industries, Ltd.) in tetrahydrofuran (200 mL). A solution of 0.5993 mol) in tetrahydrofuran (800 mL) was used to prepare a Grignard reagent. Thereafter, it was cooled to 0 ° C, and 600 mL of a 46 g THF solution of 11H-benzo[b]fluoren-11-one (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise. After the dropwise addition, the mixture was stirred for 30 minutes, and then a saturated aqueous solution of ammonium chloride was added dropwise to terminate the reaction. The oil was separated and concentrated to obtain an oil, and the obtained oil was purified by column chromatography (hexane/ethyl acetate = 4/1) to obtain a target tertiary alcohol 65 g (yield: 90.2%). .

(步驟B) 將步驟A中所獲得的三級醇62 g(0.1730 mol)與2-萘酚(東京化成工業股份有限公司製造)29.9 g(0.2076 mol)、3-巰基丙酸(東京化成工業股份有限公司製造)2.8 g(0.02595 mol)的甲苯600 mL溶液加熱至60℃。向該溶液中滴加甲磺酸(東京化成工業股份有限公司製造)249.9 g(2.595 mol)。滴加後,攪拌1小時後添加水與乙酸乙酯,進行分液、濃縮而獲得油,對所獲得的油利用管柱層析法(己烷/乙酸乙酯=3/1)進行純化,獲得目標的萘酚加成體77 g(產率:91.9%)。(Step B) 62 g (0.1730 mol) of the tertiary alcohol obtained in the step A and 2-naphthol (manufactured by Tokyo Chemical Industry Co., Ltd.) 29.9 g (0.2076 mol), 3-mercaptopropionic acid (Tokyo Chemical Industry Co., Ltd.) Manufactured by the company, 2.8 g (0.02595 mol) of toluene 600 mL solution was heated to 60 °C. To the solution, methanesulfonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 249.9 g (2.595 mol) was added dropwise. After the dropwise addition, the mixture was stirred for 1 hour, and then water and ethyl acetate were added thereto, and liquid separation was carried out to obtain an oil. The obtained oil was purified by column chromatography (hexane/ethyl acetate = 3/1). The target naphthol adduct 77 g (yield: 91.9%) was obtained.

(步驟C) 將步驟B中所獲得的萘酚加成體74 g(0.1527 mol)與碳酸乙二酯(東京化成工業股份有限公司製造)26.9 g(0.3054 mol)、碳酸鉀(和光純藥股份有限公司製造)42.2 g(0.3054 mol)的二甲基甲醛溶液740 mL在110℃下攪拌3小時。確認原料的消失後,添加氫氧化鉀18.8%水溶液91 g。確認作為原料的碳酸乙二酯的消失後,添加水與乙酸乙酯,進行分液、濃縮而獲得目標的醇68 g(產率:84.3%)。(Step C) 74 g (0.1527 mol) of naphthol adduct obtained in the step B and ethylene carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) 26.9 g (0.3054 mol), potassium carbonate (Wako Pure Chemicals Co., Ltd.) Manufactured by the company, 42.2 g (0.3054 mol) of dimethylformaldehyde solution 740 mL was stirred at 110 ° C for 3 hours. After confirming the disappearance of the raw material, 91 g of a 18.8% aqueous solution of potassium hydroxide was added. After confirming the disappearance of ethylene carbonate as a raw material, water and ethyl acetate were added, and liquid separation and concentration were carried out to obtain 68 g of a target alcohol (yield: 84.3%).

(步驟D) 向步驟C中所獲得的醇68 g(0.1286 mol)的四氫呋喃1000 mL溶液中添加三乙基胺(和光純藥股份有限公司製造)52.1 g(0.5145 mol)並冷卻至0℃。其次,滴加丙烯醯氯(東京化成工業股份有限公司製造)23.3 g(0.2573 mol)並攪拌30分鐘。確認原料消失後,添加水與乙酸乙酯,進行分液、濃縮而獲得油,向所獲得的油中添加乙酸乙酯而製成30%溶液,將其滴加於冷卻至0℃的甲醇中,藉由過濾回收析出來的目標的單官能茀單體X(45 g)(產率:60.0%)。(Step D) To a solution of 68 g (0.1286 mol) of a tetrahydrofuran in a solution of the alcohol obtained in the step C, was added diethyl ether (manufactured by Wako Pure Chemical Industries, Ltd.) 52.1 g (0.5145 mol) and cooled to 0 °C. Next, 23.3 g (0.2573 mol) of acrylonitrile (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and stirred for 30 minutes. After confirming the disappearance of the raw materials, water and ethyl acetate were added, liquid separation and concentration were carried out to obtain an oil, and ethyl acetate was added to the obtained oil to prepare a 30% solution, which was added dropwise to methanol cooled to 0 ° C. The target monofunctional oxime monomer X (45 g) was recovered by filtration (yield: 60.0%).

在氮氣環境下,向所獲得的單官能茀單體X10 g與硫代蘋果酸2.57 g(東京化成製造)的環己酮200 mL溶液中添加0.067 g的V-601(和光純藥製造),在90℃下攪拌5小時。將反應液滴加至甲醇中並進行過濾,藉此獲得硫代蘋果酸加成體12 g。將所獲得的硫代蘋果酸加成體10 g與甲基丙烯酸縮水甘油酯1.94 g(和光純藥製造)、溴化四丁基銨0.88 g(和光純藥製造)、對甲氧基苯酚0.01 g的環己酮50 mL溶液在90℃下攪拌12小時。將該反應液滴加至甲醇中並進行過濾,藉此獲得11.5 g的A-2。0.067 g of V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was added to a solution of the obtained monofunctional oxime monomer X10 g and thiomalic acid 2.57 g (manufactured by Tokyo Chemical Industry Co., Ltd.) in a nitrogen atmosphere at a nitrogen atmosphere. Stir at 90 ° C for 5 hours. The reaction liquid droplets were added to methanol and filtered, whereby 12 g of thiomalic acid addition product was obtained. The obtained thiomalic acid addition body 10 g and glycidyl methacrylate 1.94 g (manufactured by Wako Pure Chemical Industries, Ltd.), tetrabutylammonium bromide 0.88 g (manufactured by Wako Pure Chemical Industries, Ltd.), p-methoxyphenol 0.01 A 50 mL solution of g in cyclohexanone was stirred at 90 ° C for 12 hours. The reaction solution was added dropwise to methanol and filtered, whereby 11.5 g of A-2 was obtained.

<合成例3:A-3的合成方法> 將5-甲氧基-1-二氫茚酮100 g(和光純藥製造)與鄰苯二甲醛83 g的甲醇2000 mL溶液加熱至40℃而使其完全溶解。將氫氧化鉀(和光純藥製造)104 g的甲醇600 mL一面保持為40℃以下一面滴加至所述溶液中。滴加後,在55℃下加熱2小時後,冷卻至0℃。藉由進行過濾而獲得目標的茀酮59 g。 向茀酮50 g的乙酸60 mL溶液中添加48%氫溴酸水溶液130 g,加熱至120℃而攪拌一整夜。反應結束後,添加水600 mL、乙酸乙酯600 mL,對有機層進行萃取。利用碳酸氫鈉水溶液·水進行洗淨後,將溶劑蒸餾去除,藉此獲得羥基體7.5 g。 將羥基體5 g、溴乙酸甲酯4.2 g(東京化成製造)、碳酸鉀8.4 g(和光純藥製造)的DMF100 mL溶液在60℃下攪拌2小時。反應結束後,添加氫氧化鉀1 g(和光純藥製造)的水10 mL而進行水解。添加鹽酸而成為酸性後,利用乙酸乙酯對有機層進行萃取,獲得目標的羧酸體6 g。 將羧酸體6 g與2-萘酚8.1 g(東京化成製造)的甲苯600 mL溶液加熱至60℃後滴加甲磺酸28 g。攪拌2小時後,進行注水並利用乙酸乙酯對有機層進行萃取,利用管柱層析法進行純化後,獲得目標的茀體9 g。 將茀體9 g與碳酸乙二酯5.5 g(東京化成製造)、碳酸鉀8.7 g(和光純藥製造)的DMF90 mL溶液在110℃下加熱2小時。其後,添加氫氧化鉀3.5 g的水20 mL攪拌1小時。進行注水並利用乙酸乙酯對有機層進行萃取,獲得目標的二醇體10 g。 向二醇體10 g的THF100 mL溶液中添加三乙基胺13.7 g(和光純藥製造)並冷卻至0℃。向其中添加丙烯醯氯7.6 g(東京化成製造)。攪拌1小時後,進行注水並利用乙酸乙酯對有機層進行萃取,利用碳酸氫鈉水溶液·水進行洗淨。將有機層滴加至甲醇中並進行過濾,藉此獲得8 g的A-3。<Synthesis Example 3: Synthesis method of A-3> A solution of 100 g of 5-methoxy-1-indanone (manufactured by Wako Pure Chemical Industries, Ltd.) and 83 g of o-phthalaldehyde (300 g) in methanol was heated to 40 ° C. Make it completely soluble. To 100 g of methanol (104 g) of 104 g of potassium hydroxide (manufactured by Wako Pure Chemical Industries, Ltd.) while being kept at 40 ° C or lower, the solution was added dropwise to the solution. After the dropwise addition, the mixture was heated at 55 ° C for 2 hours and then cooled to 0 ° C. The target anthrone 59 g was obtained by filtration. To a solution of 50 g of acetic acid in 60 mL of acetic acid, 130 g of a 48% aqueous solution of hydrobromic acid was added, and the mixture was heated to 120 ° C and stirred overnight. After completion of the reaction, 600 mL of water and 600 mL of ethyl acetate were added, and the organic layer was extracted. After washing with an aqueous solution of sodium hydrogencarbonate and water, the solvent was distilled off, whereby 7.5 g of a hydroxyl group was obtained. A solution of 5 g of a hydroxyl group, 4.2 g of methyl bromoacetate (manufactured by Tokyo Chemical Industry Co., Ltd.), and 8.4 g of potassium carbonate (manufactured by Wako Pure Chemical Industries, Ltd.) in DMF was stirred at 60 ° C for 2 hours. After the completion of the reaction, 10 g of water of 1 g of potassium hydroxide (manufactured by Wako Pure Chemical Industries, Ltd.) was added to carry out hydrolysis. After adding hydrochloric acid to become acidic, the organic layer was extracted with ethyl acetate to obtain 6 g of the desired carboxylic acid. 6 g of a carboxylic acid body and a solution of 8.1 g of 2-naphthol (manufactured by Tokyo Chemical Industry Co., Ltd.) in toluene (600 mL) were heated to 60 ° C, and then 28 g of methanesulfonic acid was added dropwise. After stirring for 2 hours, water was poured and the organic layer was extracted with ethyl acetate, and purified by column chromatography to obtain 9 g of the target carcass. A solution of 9 g of steroids and a solution of 5.5 g of ethylene carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 8.7 g of potassium carbonate (manufactured by Wako Pure Chemical Industries, Ltd.) in DMF 90 ml was heated at 110 ° C for 2 hours. Thereafter, 20 mL of potassium hydroxide 3.5 g of water was added and stirred for 1 hour. Water was injected and the organic layer was extracted with ethyl acetate to obtain 10 g of the target diol. To a solution of 10 g of diol in 100 mL of THF, 13.7 g of triethylamine (manufactured by Wako Pure Chemical Industries, Ltd.) was added and cooled to 0 °C. 7.6 g of acrylonitrile chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added thereto. After stirring for 1 hour, water was poured and the organic layer was extracted with ethyl acetate, and washed with aqueous sodium hydrogen carbonate solution and water. The organic layer was added dropwise to methanol and filtered, whereby 8 g of A-3 was obtained.

[化9] [Chemistry 9]

[化10] [化10]

此外,所述A-2是2個R內,所述結構式中的上側的R為H且下側為所述基的化合物與所述結構式中的上側的R為所述基且下側為H的化合物的混合物。Further, the A-2 is in two R, and the compound on the upper side in the structural formula is R and the compound on the lower side is the group and the upper side R in the structural formula is the group and the lower side A mixture of compounds of H.

[化11] [11]

(B-1) 歷時2小時向在氮氣下加熱至90℃的環己酮7.1 g中滴加丙烯酸苄酯10 g(東京化成工業股份有限公司製造)、丙烯酸1.9 g(東京化成工業股份有限公司製造)、0.81 g的V-601(和光純藥股份有限公司製造)的環己酮溶液10.7 g。攪拌2小時後,追加0.4 g的V-601,進而攪拌5小時。向其中添加甲基丙烯酸縮水甘油酯0.56 g(東京化成工業股份有限公司製造)、溴化四丁基銨0.064 g(東京化成工業股份有限公司製造)、對甲氧基苯酚0.005 g(和光純藥股份有限公司製造),進行一整夜的攪拌,藉此獲得聚合物B-1的環己酮溶液(Mw:5000,Mn:3000)。(B-1) 10 g of benzyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 1.9 g of acrylic acid were added dropwise to 7.1 g of cyclohexanone heated to 90 ° C under nitrogen for 2 hours (Tokyo Chemical Industry Co., Ltd.) Manufactured, 0.81 g of V-601 (manufactured by Wako Pure Chemical Co., Ltd.), 10.7 g of a cyclohexanone solution. After stirring for 2 hours, 0.4 g of V-601 was added, and the mixture was further stirred for 5 hours. 0.56 g of glycidyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 0.064 g of tetrabutylammonium bromide (manufactured by Tokyo Chemical Industry Co., Ltd.), and 0.005 g of p-methoxyphenol (Wako Pure Chemicals) were added thereto. The company was made to stir overnight, thereby obtaining a cyclohexanone solution (Mw: 5000, Mn: 3000) of the polymer B-1.

(B-2) 歷時2小時向在氮氣下加熱至90℃的環己酮7.5 g中滴加丙烯酸異丁酯10 g(東京化成工業股份有限公司製造)、丙烯酸2.4 g(東京化成工業股份有限公司製造)、1.03 g的V-601(和光純藥股份有限公司製造)的環己酮溶液11.2 g。攪拌2小時後,追加0.5 g的V-601,進而攪拌5小時。向其中添加甲基丙烯酸縮水甘油酯0.62 g(東京化成工業股份有限公司製造)、溴化四丁基銨0.070 g(東京化成工業股份有限公司製造)、對甲氧基苯酚0.005 g(和光純藥股份有限公司製造),進行一整夜的攪拌,藉此獲得聚合物B-2的環己酮溶液(Mw:5500,Mn:3200)。(B-2) 10 g of isobutyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 2.4 g of acrylic acid were added dropwise to 7.5 g of cyclohexanone heated to 90 ° C under nitrogen for 2 hours (Tokyo Chemical Industry Co., Ltd.) The company made), 1.03 g of V-601 (manufactured by Wako Pure Chemical Co., Ltd.), 11.2 g of cyclohexanone solution. After stirring for 2 hours, 0.5 g of V-601 was added, and the mixture was further stirred for 5 hours. To this, 0.62 g of glycidyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 0.070 g of tetrabutylammonium bromide (manufactured by Tokyo Chemical Industry Co., Ltd.), and 0.005 g of p-methoxyphenol (Wako Pure Chemicals Co., Ltd.) were added thereto. Co., Ltd.) was stirred overnight to obtain a cyclohexanone solution of polymer B-2 (Mw: 5500, Mn: 3200).

此外,下述「M-1」是使用東亞合成股份有限公司製造的Aronix TO-2349。 另外,所述「C-1」及「C-4」是比較例化合物。In addition, the following "M-1" is Aronix TO-2349 manufactured by Toagosei Co., Ltd. Further, the "C-1" and "C-4" are comparative compounds.

<組成物1~組成物6的製備> 將所述化合物A-1(1.3質量份)、聚合物B-1(30%PGMEA(丙二醇1-單甲醚2-乙酸酯)溶液 3.9質量份)、聚合性化合物M-1(0.3 質量份)、IRGACURE OXE01(巴斯夫(BASF)公司製造)0.16質量份、添加劑Megafac F-781F(DIC公司製造)0.17質量份、KBM-602(信越化學工業公司製造)0.02質量份、對甲氧基苯酚(和光純藥製造)0.01質量份、及PGMEA(13質量份)混合,藉此製備組成物1。 關於組成物2~組成物6,如下述表1所示,變更化合物A及聚合物的種類,以與組成物1相同的順序製備。<Preparation of Composition 1 to Composition 6> The compound A-1 (1.3 parts by mass), the polymer B-1 (30% PGMEA (propylene glycol 1-monomethyl ether 2-acetate) solution, 3.9 parts by mass) ), polymerizable compound M-1 (0.3 parts by mass), IRGACURE OXE01 (manufactured by BASF), 0.16 parts by mass, additive Megafac F-781F (manufactured by DIC Corporation), 0.17 parts by mass, KBM-602 (Shin-Etsu Chemical Co., Ltd.) The composition 1 was prepared by mixing 0.02 parts by mass of 0.01 parts by mass of p-methoxyphenol (manufactured by Wako Pure Chemical Industries, Ltd.) and PGMEA (13 parts by mass). The composition 2 to the composition 6 were prepared in the same order as the composition 1 by changing the types of the compound A and the polymer as shown in the following Table 1.

<折射率的評價> 利用旋塗法(spin coat method)將各組成物塗佈於矽晶圓(silicon wafer)上,其後,在加熱板(hot plate)上以100℃加熱2分鐘而獲得膜厚1 μm的感光性膜。繼而,使用Execure3000(豪雅(HOYA)股份有限公司製造)照射10 mW/cm2 的紫外線,藉此製備硬化膜。 對所獲得的膜,使用折射率(波長:500 nm)(裝置:大日本Screen製造股份有限公司製造的橢圓偏光式膜厚測定裝置 RE系列,RE-3320)進行測定。然後,根據以下基準評價折射率。將結果示於表1。實際應用上,較佳為A~B。 ·A:折射率為1.65以上 ·B:折射率為1.60以上且小於1.65 ·C:折射率小於1.60<Evaluation of Refractive Index> Each composition was applied onto a silicon wafer by a spin coat method, and then heated at 100 ° C for 2 minutes on a hot plate. A photosensitive film having a film thickness of 1 μm. Then, ultraviolet rays of 10 mW/cm 2 were irradiated using Execure 3000 (manufactured by HOYA Co., Ltd.) to prepare a cured film. The obtained film was measured using a refractive index (wavelength: 500 nm) (device: ellipsic film thickness measuring device RE series manufactured by Dainippon Screen Manufacturing Co., Ltd., RE-3320). Then, the refractive index was evaluated in accordance with the following criteria. The results are shown in Table 1. In practical applications, it is preferably A to B. · A: refractive index is 1.65 or more · B: refractive index is 1.60 or more and less than 1.65 · C: refractive index is less than 1.60

<顯影性的評價> 利用旋塗法將各組成物塗佈於矽晶圓上,其後,在加熱板上以100℃加熱2分鐘而獲得膜厚1 μm的感光性膜。對該膜,經由一邊1.1 μm的正方畫素分別排列於基板上的4 mm×3 mm的區域的遮罩圖案(mask pattern),使用i射線步進機FPA-3000i5+(佳能(Canon)股份有限公司製造),在365 nm的波長下以曝光量200 mJ/cm2 進行曝光。 對所述曝光後的膜,使用氫氧化四甲基銨的0.2質量%水溶液,在23℃下進行60秒覆液式顯影(puddle development)。其後,利用旋轉噴水器(spin shower)使用水進行沖洗(rinse),進而利用純水進行水洗。其後,利用高壓的空氣(air)使水滴飛濺,使矽晶圓自然乾燥,在200℃下利用加熱板進行300秒的後烘烤(post bake),獲得矽晶圓上的膜厚1 μm的透明圖案(硬化膜)。使用測長SEM(臨界尺寸量測掃描式電子顯微鏡(CD-SEM:Critical Dimension-Scanning Electron Microscope),S-7800H,日立製作所股份有限公司製造)自矽晶圓上以30000倍觀察所獲得的透明圖案。然後,基於以下基準評價顯影性。將結果示於表1。實際應用上,較佳為A~B。 A:在畫素上完全未確認到殘渣。 B:在畫素上確認到少許殘渣,但為可容許的範圍內。 C:在畫素上觀察到大量殘渣。<Evaluation of developability> Each composition was applied onto a ruthenium wafer by a spin coating method, and then heated on a hot plate at 100 ° C for 2 minutes to obtain a photosensitive film having a film thickness of 1 μm. The film was arranged in a mask pattern of 4 mm × 3 mm on the substrate via a side square of 1.1 μm, using an i-ray stepper FPA-3000i5+ (Canon Limited) Co., Ltd.) at a wavelength of 365 nm at an exposure amount of 200 mJ / cm 2 exposure. To the film after the exposure, a 0.2% by mass aqueous solution of tetramethylammonium hydroxide was used, and puddle development was performed at 23 ° C for 60 seconds. Thereafter, it was rinsed with water using a spin shower, and then washed with pure water. Thereafter, the high-pressure air was used to splash the water droplets, and the silicon wafer was naturally dried, and post-bake was performed at 200 ° C for 300 seconds using a hot plate to obtain a film thickness of 1 μm on the germanium wafer. Transparent pattern (hardened film). Using a length measuring SEM (Critical Dimension-Scanning Electron Microscope (CD-SEM), S-7800H, manufactured by Hitachi, Ltd.), the transparency obtained by observing 30,000 times on the wafer was observed. pattern. Then, the developability was evaluated based on the following criteria. The results are shown in Table 1. In practical applications, it is preferably A to B. A: No residue was confirmed on the pixels. B: A small amount of residue was confirmed on the pixels, but it was within an allowable range. C: A large amount of residue was observed on the pixels.

<硬化性的評價> 與折射率的評價同樣地製備膜。其後,將所獲得的膜在環己酮中浸漬5分鐘後,測定膜的殘存率(%)[{(浸漬前的膜的質量-浸漬後的膜的質量)/浸漬前的膜的質量}×100]。將結果示於表1。實際應用上,較佳為A~B。 ·A:殘存率為95%以上 ·B:殘存率為85%以上且小於95% ·C:殘存率小於85%<Evaluation of Curability> A film was prepared in the same manner as the evaluation of the refractive index. Thereafter, the obtained film was immersed in cyclohexanone for 5 minutes, and then the residual ratio (%) of the film was measured [{(mass of film before immersion - mass of film after immersion) / quality of film before immersion }×100]. The results are shown in Table 1. In practical applications, it is preferably A to B. · A: Residual rate is 95% or more · B: Residual rate is 85% or more and less than 95% · C: Residual rate is less than 85%

[表1] [Table 1]

如表1所示確認到,在使用本發明的組成物的實施例中,所獲得的膜的折射率高,顯影性及硬化性亦優異。 特別是根據實施例3與實施例4的比較確認到,在所使用的聚合物中包含芳香環基的情況下,折射率更優異。 另一方面,在作為不含本發明的化合物的組成物的比較例1~比較例2中,無法獲得所期望的效果。此外,比較例2中記載的組成物相當於專利文獻1中記載的使用C-4的組成物。As shown in Table 1, in the examples using the composition of the present invention, the obtained film had a high refractive index and was excellent in developability and hardenability. In particular, according to the comparison between Example 3 and Example 4, it was confirmed that when the polymer to be used contains an aromatic ring group, the refractive index is more excellent. On the other hand, in Comparative Examples 1 to 2 which are compositions which do not contain the compound of the present invention, the desired effects were not obtained. Further, the composition described in Comparative Example 2 corresponds to the composition using C-4 described in Patent Document 1.

10‧‧‧基板
20‧‧‧有機EL元件
30‧‧‧保護膜
40‧‧‧基底層
50‧‧‧彩色濾光片
50B‧‧‧藍色彩色濾光片
50G‧‧‧綠色彩色濾光片
50R‧‧‧紅色彩色濾光片
100‧‧‧顯示裝置(微型OLED)
p‧‧‧間距(中心間距離)
10‧‧‧Substrate
20‧‧‧Organic EL components
30‧‧‧Protective film
40‧‧‧ basal layer
50‧‧‧Color filters
50B‧‧‧Blue color filter
50G‧‧‧Green color filter
50R‧‧‧Red color filter
100‧‧‧Display device (micro OLED)
P‧‧‧pitch (center distance)

圖1是使用本發明的組成物作為彩色濾光片的基底劑的顯示裝置的一實施方式的一畫素部分的剖面圖。 圖2是A-2的1 H-NMR圖表。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a pixel portion of an embodiment of a display device using a composition of the present invention as a base agent for a color filter. 2 is a 1 H-NMR chart of A-2.

10‧‧‧基板 10‧‧‧Substrate

20‧‧‧有機EL元件 20‧‧‧Organic EL components

30‧‧‧保護膜 30‧‧‧Protective film

40‧‧‧基底層 40‧‧‧ basal layer

50B‧‧‧藍色彩色濾光片 50B‧‧‧Blue color filter

50G‧‧‧綠色彩色濾光片 50G‧‧‧Green color filter

50R‧‧‧紅色彩色濾光片 50R‧‧‧Red color filter

100‧‧‧顯示裝置(微型OLED) 100‧‧‧Display device (micro OLED)

p‧‧‧間距(中心間距離) P‧‧‧pitch (center distance)

Claims (17)

一種組成物,其包含通式(1)所表示的化合物, [化1]通式(1)   通式(1)中,Ar1 ~Ar4 分別獨立地表示芳香環基;此外,Ar1 ~Ar4 的至少1個為多環芳香族基,滿足以下的要件1或要件2, 要件1:Ar1 ~Ar4 的至少1個具有包含酸基及聚合性基的取代基; 要件2:Ar1 ~Ar4 的至少1個具有包含酸基的取代基,且Ar1 ~Ar4 的至少1個具有包含聚合性基的取代基。A composition comprising a compound represented by the formula (1), [Chemical Formula 1] In the general formula (1), Ar 1 to Ar 4 each independently represent an aromatic ring group; and at least one of Ar 1 to Ar 4 is a polycyclic aromatic group, and the following requirements 1 or requirements are satisfied. 2, requirement 1: at least one of Ar 1 to Ar 4 has a substituent including an acid group and a polymerizable group; and 2: at least one of Ar 1 to Ar 4 has a substituent including an acid group, and Ar 1 ~ At least one of Ar 4 has a substituent containing a polymerizable group. 如申請專利範圍第1項所述的組成物,其中在通式(1)中,Ar3 與Ar4 連結。The composition according to claim 1, wherein in the formula (1), Ar 3 is bonded to Ar 4 . 如申請專利範圍第1項或第2項所述的組成物,其中所述化合物為通式(2)所表示的化合物, [化2]通式(2) 通式(2)中,Ar1 ~Ar2 及Ar5 ~Ar6 分別獨立地表示芳香環基;此外,Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個為多環芳香族基,滿足以下的要件3或要件4, 要件3:Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含酸基及聚合性基的取代基; 要件4:Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含酸基的取代基,且Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含聚合性基的取代基。The composition according to claim 1 or 2, wherein the compound is a compound represented by the formula (2), [Chemical 2] In the general formula (2), Ar 1 to Ar 2 and Ar 5 to Ar 6 each independently represent an aromatic ring group; and at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 is plural. The cyclic aromatic group satisfies the following requirement 3 or requirement 4, and the requirement 3: at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has a substituent including an acid group and a polymerizable group; and the element 4: Ar 1 ~ At least one of Ar 2 and Ar 5 to Ar 6 has a substituent including an acid group, and at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has a substituent containing a polymerizable group. 如申請專利範圍第3項所述的組成物,其中在通式(2)中,Ar5 及Ar6 的至少1個為多環芳香族基。The composition according to claim 3, wherein in the formula (2), at least one of Ar 5 and Ar 6 is a polycyclic aromatic group. 如申請專利範圍第1項或第2項所述的組成物,其中酸基為羧酸基。The composition of claim 1 or 2, wherein the acid group is a carboxylic acid group. 如申請專利範圍第1項或第2項所述的組成物,其進而包含所述通式(1)所表示的化合物以外的聚合性化合物。The composition according to the first or second aspect of the invention, which further comprises a polymerizable compound other than the compound represented by the above formula (1). 如申請專利範圍第1項或第2項所述的組成物,其進而包含具有酸基與聚合性基的聚合物。The composition according to claim 1 or 2, further comprising a polymer having an acid group and a polymerizable group. 如申請專利範圍第7項所述的組成物,其中所述聚合物進而具有芳香環基。The composition of claim 7, wherein the polymer further has an aromatic ring group. 如申請專利範圍第1項或第2項所述的組成物,其中所述包含酸基及聚合性基的取代基為通式(X-1)所表示的基, [化3]通式(X-1)   通式(X-1)中,LX1 、LX2 及LX3 分別獨立地表示單鍵或二價連結基;W表示三價連結基;Va 表示酸基;Vb 表示聚合性基;*表示鍵結位置。The composition according to the first or second aspect of the invention, wherein the substituent comprising an acid group and a polymerizable group is a group represented by the formula (X-1), [Chem. 3] In the formula (X-1), L X1 , L X2 and L X3 each independently represent a single bond or a divalent linking group; W represents a trivalent linking group; V a represents an acid group; b represents a polymerizable group; * represents a bonding position. 一種膜,其是由如申請專利範圍第1項至第9項中任一項所述的組成物所形成。A film formed by the composition according to any one of claims 1 to 9. 一種光學裝置,其包含如申請專利範圍第10項所述的膜。An optical device comprising the film of claim 10 of the patent application. 一種化合物,其是以通式(1)表示, [化4]通式(1)   通式(1)中,Ar1 ~Ar4 分別獨立地表示芳香環基;此外,Ar1 ~Ar4 的至少1個為多環芳香族基,滿足以下的要件1或要件2, 要件1:Ar1 ~Ar4 的至少1個具有包含酸基及聚合性基的取代基; 要件2:Ar1 ~Ar4 的至少1個具有包含酸基的取代基,且Ar1 ~Ar4 的至少1個具有包含聚合性基的取代基。a compound represented by the formula (1), [Chemical 4] In the general formula (1), Ar 1 to Ar 4 each independently represent an aromatic ring group; and at least one of Ar 1 to Ar 4 is a polycyclic aromatic group, and the following requirements 1 or requirements are satisfied. 2, requirement 1: at least one of Ar 1 to Ar 4 has a substituent including an acid group and a polymerizable group; and 2: at least one of Ar 1 to Ar 4 has a substituent including an acid group, and Ar 1 ~ At least one of Ar 4 has a substituent containing a polymerizable group. 如申請專利範圍第12項所述的化合物,其中在通式(1)中,Ar3 與Ar4 連結。The compound according to claim 12, wherein in the formula (1), Ar 3 is bonded to Ar 4 . 如申請專利範圍第12項或第13項所述的化合物,其中通式(1)以通式(2)表示, [化5]通式(2)   通式(2)中,Ar1 ~Ar2 及Ar5 ~Ar6 分別獨立地表示芳香環基;此外,Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個為多環芳香族基,滿足以下的要件3或要件4; 要件3:Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含酸基及聚合性基的取代基; 要件4:Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含酸基的取代基,且Ar1 ~Ar2 及Ar5 ~Ar6 的至少1個具有包含聚合性基的取代基。The compound of claim 12 or 13, wherein the formula (1) is represented by the formula (2), [Chem. 5] In the general formula (2), Ar 1 to Ar 2 and Ar 5 to Ar 6 each independently represent an aromatic ring group; and at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 is plural. The cyclic aromatic group satisfies the following requirement 3 or the requirement 4; and the requirement 3: at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has a substituent including an acid group and a polymerizable group; and the element 4: Ar 1 ~ At least one of Ar 2 and Ar 5 to Ar 6 has a substituent including an acid group, and at least one of Ar 1 to Ar 2 and Ar 5 to Ar 6 has a substituent containing a polymerizable group. 如申請專利範圍第14項所述的化合物,其中在通式(2)中,Ar5 及Ar6 的至少1個為多環芳香族基。The compound according to claim 14, wherein in the formula (2), at least one of Ar 5 and Ar 6 is a polycyclic aromatic group. 如申請專利範圍第12項或第13項所述的化合物,其中酸基為羧酸基。The compound of claim 12, wherein the acid group is a carboxylic acid group. 如申請專利範圍第12項或第13項所述的化合物,其中所述包含酸基及聚合性基的取代基為通式(X-1)所表示的基, [化6]通式(X-1)   通式(X-1)中,LX1 、LX2 及LX3 分別獨立地表示單鍵或二價連結基;W表示三價連結基;Va 表示酸基;Vb 表示聚合性基;*表示鍵結位置。The compound according to claim 12, wherein the substituent comprising an acid group and a polymerizable group is a group represented by the formula (X-1), [Chem. 6] In the formula (X-1), L X1 , L X2 and L X3 each independently represent a single bond or a divalent linking group; W represents a trivalent linking group; V a represents an acid group; b represents a polymerizable group; * represents a bonding position.
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