TW201606385A - Black electrode substrate, manufacturing method of black electrode substrate, and display device - Google Patents

Abstract

A black electrode substrate (100) of the present invention includes: a transparent substrate, which has a first surface (15a) used as a touch sensing input surface, and a second surface (15b) opposite to said first surface (15a), a display area (15c) defined on the aforesaid second surface (15b) and having a rectangular shape from the top view, and an outer area (15d) defined on the aforesaid second surface (15b) and located outside the display area (15c); a first black layer (1), which contains carbon as a main coloring material and is provided on the aforesaid display area (15c) of the second surface (15b) and the outer area (15d); a first indium-containing layer (2), which contains indium and is provided on said first black layer (1); a copper-containing layer (3), which contains copper and is provided on said first indium-containing layer (2); a second indium-containing layer (4), which contains indium and is provided on the aforementioned copper-containing layer (3); a second black layer (5), which contains carbon as a main coloring material and is provided on said second indium-containing layer (4); a black electrode pattern (60), which is defined by black wirings (6) of a laminated structure composed of said first black layer (1), said first indium-containing layer (2), said copper-containing layer (3), said second indium-containing layer (4) and said second black layer (5). A plurality of pixel openings (8) are formed on said display area (15c), the aforementioned laminated structure of the black wirings (6) disposed on the outer area (15d) has terminal portions that are exposed from the second indium-containing layer (4); and a rectangular-shaped transparent resin layer (9), which is disposed on the display area (15c) in a manner of overlapping the black electrode pattern (60), and having the same size as the display area (15c) from the top view.

Description

Black electrode substrate, method of manufacturing black electrode substrate, and display device

The present invention relates to a black electrode substrate, a black electrode substrate manufacturing method, and a display device including the black electrode substrate, which have improved visibility and have low resistance metal wiring. The black electrode substrate of the present invention is used as an in-cell display device in which a capacitive touch sensing function is built in a liquid crystal cell.

It is known that a touch panel is disposed on a display surface of a display device provided on a portable device such as a smart phone or a tablet. The touch panel is used as an input means for detecting contact of a finger or a pointer with a touch panel. The detection of a position such as a finger or a pointer on a touch panel is mainly performed by detecting a change in electrostatic capacitance generated by contact between a touch panel and a finger or an indicator.

However, the configuration in which the touch panel is provided on the display device causes an increase in the thickness or weight of the entire display device, and therefore, the touch panel can be said to be an unnecessary member in the configuration of the display device. In order to reduce the weight of a display device having a touch panel, it is known to use a touch panel mainly using an organic thin film. However, even in the case of such a touch panel, it is difficult to avoid an increase in the thickness of the entire display device. Furthermore, in the case where the display device includes the above-described touch panel and high-definition pixels, There is a disadvantage that the necessary input (pen input) to the touch panel is difficult.

Specifically, the display device includes 400 ppi (pixel per inch), and further includes a high-quality pixel of 500 ppi or more, and the pixel pitch is about 10 to 20 μm. As described above, when the display device includes the above-described touch panel and high-definition pixels, there is a problem in that not only many touch panels cannot withstand the pen pressure of the pen, but also the resolution of the opening of the input portion of the touch panel. It is limited; or it is difficult to achieve the resolution of a touch panel that fully responds to the high quality of the display device. Therefore, there is a need for a high level of touch sensing technology for touch panels.

In recent years, the development of a touch sensing technology called "in cell" that does not use a touch panel and has a touch sensing function in a liquid crystal cell or a display device has been progressing. Medium (hereinafter referred to as in-cell display device).

In the structure of the above display device, a structure in which a color filter substrate in which a plurality of colored layers are regularly arranged and an array substrate in which an active element such as a TFT (Thin Film Transistor) is built is known.

In an in-cell display device, an attempt is made to provide a set of in-line touch sensing electrode groups on either one of a color filter substrate and an array substrate or between a color filter substrate and an array substrate ( In cell) construction. With this configuration, by detecting the change in electrostatic capacitance occurring between the touch sensing electrode groups, it is possible to realize a touch sensing function for detecting an input position such as a finger or a pointer.

However, in the touch panel using the organic film as a substrate, the stretching (for example, thermal expansion coefficient) of the substrate is large, and it constitutes 10 to 20 μm. It is difficult to mutually align (align) the red pixel pattern, the green pixel pattern, the blue pixel pattern, and the black matrix pattern of the fine pixel. Therefore, it is difficult to apply the organic film substrate to a high-quality color filter substrate. In addition, for example, the display device described in Patent Documents 1 to 3 is known.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Publication No. 2011-065393

[Patent Document 2] Japanese National Patent Publication No. 2013-540331

[Patent Document 3] International Publication No. 2011-052392

Patent Document 1 discloses a structure in which a transparent conductive film and a light-shielding metal film are laminated on a plastic film. However, since it is difficult to apply the structure disclosed in Patent Document 1 to an in-cell structure and the substrate is a film, the film substrate cannot be used for a high-quality color filter for the above reasons. Specifically, the plastic film is susceptible to heat or humidity, and the size of the plastic film is easily changed greatly, and it is difficult to align a plurality of patterns such as a color pattern or a black matrix pattern constituting a pixel of 400 ppi or more, and it is difficult to obtain a reproduction of the pixel pattern. Sex. Further, Patent Document 1 does not mean that an in-cell technique is incorporated into a color filter (integration). For example, in the paragraph [0026] of Patent Document 1, aluminum is exemplified as the light-shielding metal film layer. In the manufacturing process of red pixels, green pixels, blue pixels, or black matrix, although using an alkaline developing solution The method of photo lithography, but the metal wiring of aluminum is easily corroded by an alkaline developing solution, and it is difficult to form a color filter. Further, Patent Document 1 does not consider the reflection of light generated on the surface of the light-shielding metal film, and the visibility of the observer who observes the display device is lowered.

Patent Document 2 discloses a structure in which a light absorbing layer and a conductive layer having a low total reflectance are laminated, and a touch panel (for example, claim 25 of Patent Document 2) is disclosed. However, Patent Document 2 does not indicate that an in-cell technique is incorporated into a color filter (integration). For example, in the paragraphs [0071], [0096] and the experimental examples of Patent Document 2, aluminum is exemplified as a material of a conductive pattern (or a conductive layer). In the manufacturing process of a red pixel, a green pixel, a blue pixel, or a black matrix, although the method of photolithography using an alkaline developing solution is utilized, the metal wiring of aluminum is easily corroded by an alkaline developing solution, and it is difficult to form a color filter. . In the request item 14 of the patent document 2, for example, the total reflectance is 3% or less in terms of the structure in which the light absorbing layer is placed on the surface opposite to the surface to which the substrate is bonded. However, in Experimental Examples 1 to 7, the measurement wavelength of the total reflectance was 550 nm. Further, as disclosed in FIG. 11, FIG. 16, or FIG. 18 of Patent Document 2, a configuration in which the total reflectance of 3% or less is achieved is not specifically disclosed in the wavelength region of light having a visible region of 400 nm to 700 nm. For example, in the reflectance of Fig. 18, since the reflectance of the blue region of 400 nm to 500 nm is large, the color of the light absorbing layer is not observed as black, but is observed as blue, and the visibility is lowered.

In the claim 24 or the experimental example 3 of Patent Document 2, it is revealed that the metal forming the conductive layer is copper (Cu). However, when a glass substrate such as an alkali-free glass is used as a substrate, there is a problem that the adhesion of the substrate to copper, copper oxide or copper oxynitride cannot be sufficiently obtained. For example, at the base A copper-containing film is formed on the material, and a transparent tape (registered trademark) or the like is attached to the copper-containing film. When the transparent tape is peeled off, there is a practical problem that the copper-containing film is simply peeled off from the substrate. Therefore, Patent Document 2 does not disclose a specific technique for improving the adhesion in forming a conductive layer containing copper on a substrate.

Patent Document 3 discloses a display device in which a touch sensing electrode and a black region for displaying a color image and a color filter layer are provided on an outer surface of a front substrate constituting a display panel (for example, claim 1 of Patent Document 3) , request item 2 or figure 3, etc.). The touch sensing electrode is formed of a metal material and overlaps with a black region (black matrix) other than the opening of the pixel. In the request 7 of Patent Document 3, a structure in which a transparent conductive film is laminated on a bump sensing electrode is disclosed, but a technique of using a layer containing indium is not disclosed. Further, a structure in which a black layer in which carbon is introduced as a color material is laminated on the surface of the touch sensing electrode is not disclosed. Further, as disclosed in paragraph [0043] of Patent Document 3, copper is not considered as a metal material forming a touch sensing electrode.

The present invention has been made in view of the above problems, and provides a black electrode substrate having improved visibility, a pixel opening having a high aperture ratio, high adhesion to a transparent substrate, and good electrical connection. Furthermore, the present invention provides a method of manufacturing a black electrode substrate and a display device including the black electrode substrate.

A black electrode substrate according to a first aspect of the present invention includes a transparent substrate having a first surface that functions as a touch sensing input surface and a second surface that is opposite to the first surface, and is defined on the second surface Overlooking a rectangular display region and an outer region defined on the second surface and located outside the display region; the first black layer is disposed on the display region and the outer region of the second surface, and contains carbon as a first coloring material; a first indium layer disposed on the first black layer and containing indium; a copper-containing layer disposed on the first indium-containing layer and containing copper; and a second indium-containing layer, The method is disposed on the copper-containing layer and comprises indium; the second black layer is disposed on the second indium-containing layer and contains carbon as a main color material; and the black electrode pattern has the first A black wiring having a laminated structure including a black layer, the first indium containing layer, the copper-containing layer, the second indium-containing layer, and the second black layer is defined, and a plurality of pixel openings are formed in the display region. The multilayer structure of the black wiring provided on the outer region includes a terminal portion in which the second indium-containing layer is exposed, and a rectangular transparent resin layer which is provided so as to overlap the black electrode pattern. The foregoing The display area, the display area and having the same size in plan view.

The copper-containing layer is a metal layer such as a copper layer or a copper alloy layer. An indium-containing layer is provided on the interface between the copper-containing layer and the transparent substrate or the interface between the copper-containing layer and the organic resin layer such as the black layer, and practical black wiring can be provided.

In the black electrode substrate according to the first aspect of the present invention, preferably, in the laminated structure of the black wiring, a line width of the first black layer, a line width of the first indium-containing layer, and a line of the copper-containing layer. The width of the second indium-containing layer and the line width of the second black layer are the same.

In the black electrode substrate according to the first aspect of the present invention, preferably, the first indium-containing layer and the second indium-containing layer are alloy layers containing copper and indium.

In the black electrode substrate according to the first aspect of the present invention, it is preferable that the first indium-containing layer and the second indium-containing layer are metal oxide layers containing indium oxide as a main material.

In the black electrode substrate according to the first aspect of the present invention, preferably, the first indium-containing layer and the second indium-containing layer are metal oxide layers containing a mixed oxide containing indium oxide and tin oxide.

In the black electrode substrate according to the first aspect of the present invention, it is preferable that at least a red layer, a green layer, and a blue layer are disposed in each of the pixel openings of the plurality of pixel openings to cover the red layer and the green layer. The transparent resin layer is formed in the form of the blue layer.

A method of manufacturing a black electrode substrate according to a second aspect of the present invention, comprising: preparing a transparent substrate having a first surface that functions as a touch sensing input surface and a second surface that is opposite to the first surface, a display region having a rectangular shape in plan view on the second surface, and an outer region defined on the second surface and located outside the display region; and forming a first black containing carbon as a main color material on the transparent substrate a comprehensive film; forming a first indium-containing comprehensive film containing indium on the first black overall film; forming a copper-containing comprehensive film containing copper on the first indium-containing comprehensive film; forming an indium on the copper-containing comprehensive film a second indium-containing comprehensive film; forming a second black overall film containing carbon as a main color material on the second indium-containing comprehensive film; forming a second black layer by patterning the second black overall film; Using the second black layer as a mask, by etching the first black overall film, the first indium-containing comprehensive film, the copper-containing comprehensive film, and the second indium-containing comprehensive film, formed by black Black electrode pattern specified, the black line having a first wiring a laminated structure composed of a black layer, a first indium-containing layer, a copper-containing layer, a second indium-containing layer, and a second black layer; and a rectangular shape having the same size as the display region in plan view so as to cover the black wiring a transparent resin layer is formed on the display region; and a photoresist layer having the same size as the display region in a plan view is formed on the display region so as to expose the outer region and cover the transparent resin layer; The photoresist layer and the second black layer located in the outer region are removed by dry etching using a fluorocarbon-based gas, and a terminal portion in which the second indium-containing layer is exposed is formed on the outer region.

A display device according to a third aspect of the present invention includes the black electrode substrate of the first aspect.

A display device according to a fourth aspect of the present invention includes the black electrode substrate of the first aspect, and a transparent conductive wiring laminated on the transparent resin layer of the black electrode substrate to be orthogonal to the black wiring in plan view The array substrate includes an active device disposed at a position adjacent to each of the pixel openings of the plurality of pixel openings in a plan view, and a metal wiring electrically connected to the active device; a liquid crystal layer And a control unit that controls the active element and includes a touch sensing function for detecting a change in electrostatic capacitance occurring between the black wiring and the transparent conductive wiring.

A display device according to a fifth aspect of the present invention includes the black electrode substrate of the first aspect, and the array substrate including an active element disposed at a position adjacent to each pixel opening of the plurality of pixel openings in plan view Metal with the aforementioned active components a wire and a touch sensing wire for touch sensing; a liquid crystal layer disposed between the black electrode substrate and the array substrate; and a control unit for controlling the active device, wherein detection is performed in the foregoing A touch sensing function of a change in electrostatic capacitance between the black wiring and the aforementioned touch sensing wiring.

A display device according to a sixth aspect of the present invention includes the black electrode substrate of the first aspect, and the array substrate including an active element disposed at a position adjacent to each pixel opening of the plurality of pixel openings in plan view a metal wiring electrically connected to the active device, and a common electrode that forms a capacitance to the black wiring; a liquid crystal layer disposed between the black electrode substrate and the array substrate; and a control unit that controls the The active device includes a touch sensing function for detecting a change in electrostatic capacitance occurring between the black wiring and the common electrode.

A display device according to a seventh aspect of the present invention includes the black electrode substrate of the first aspect, and the array substrate including an active element disposed at a position adjacent to each of the pixel openings of the plurality of pixel openings in plan view a gate line electrically connected to the active element, a touch sensing wiring for electrically touching and sensing the parallel extension of the gate line, and covering the active element and sensing the wiring with the touch a light shielding layer formed of the same metal layer; a liquid crystal layer disposed between the black electrode substrate and the array substrate; and a control unit that controls the active element to detect the occurrence of the black wiring and the touch feeling A touch sensing function that measures the change in electrostatic capacitance between wirings.

The display device according to the above aspect of the invention can be applied to a display device such as a liquid crystal display device or an organic EL display device.

Further, in the aspect of the present invention, the touch sensing technique for detecting the presence or absence of a finger or a pointer may be, for example, detecting a black wiring disposed on the black electrode substrate and being disposed via the transparent resin. A touch sensing technique for changing a capacitance between a transparent conductive wiring that faces an insulator such as a layer and a black wiring. In addition, a touch sensing technique for detecting a change in electrostatic capacitance between a black wiring disposed on a black electrode substrate and a metal wiring provided on an array substrate disposed opposite to the black electrode substrate may be used. The black wiring can be used as a driving electrode or a detecting electrode in terms of capacitive touch sensing. In the following description, the drive electrode and the detection electrode are referred to as touch sense electrodes. The smallest structure in which black wiring is provided on a transparent substrate is sometimes referred to as a black electrode substrate.

In the display device according to the third to seventh aspects of the present invention, it is preferable that at least a red layer, a green layer, and a blue layer are disposed in each of the pixel opening portions of the plurality of pixel openings to cover the red layer and the green layer. The transparent resin layer is formed in a layer and the blue layer.

In the display device according to the third to seventh aspects of the present invention, it is preferable that the metal wiring has a structure in which a copper-containing layer containing at least copper and two indium-containing layers that sandwich the copper-containing layer and contain indium are laminated. Floor.

In the display device according to the third to seventh aspects of the present invention, it is preferable that the touch sensing wiring has a structure in which a copper-containing layer containing at least copper and a copper layer containing the copper layer and containing indium are laminated. Indium containing layers.

In the display device according to the third to seventh aspects of the present invention, preferably, the active element is a transistor having a channel layer, and the channel layer includes Two or more metal oxides of a group consisting of gallium, indium, zinc, tin, and antimony.

According to the aspect of the present invention, it is possible to provide a black electrode substrate having a low-resistance black wiring that acts on one of the electrodes of the sensing electrode without using a member having a thickness like a touch panel. Furthermore, since the first indium containing layer and the second indium containing layer are used, it is possible to provide a terminal or electrode which is highly adhesive between the black layer and the copper containing layer and which is easily electrically connected to the copper containing layer. A black electrode substrate electrically connected to the copper-containing layer. Further, a black electrode substrate in which colored pixels such as a red layer, a green layer, and a blue layer are laminated may be provided. Further, a display device including the black electrode substrate having the above effects can be provided.

1‧‧‧ first black layer

2‧‧‧First indium containing layer

3‧‧‧Bronze layer

4‧‧‧Second indium containing layer

5‧‧‧ second black layer

6‧‧‧Black wiring

60‧‧‧Black electrode pattern

7‧‧‧Transparent conductive wiring

8‧‧‧pixel opening

9‧‧‧Transparent resin layer

11, 13‧‧‧ Terminals

15, 25‧‧‧ Transparent substrate

15a‧‧‧ first side

15b‧‧‧ second side

15c‧‧‧Display area

15d‧‧‧Outer area

41, 475‧‧‧ source line

20, 620, 720, 820‧‧‧ liquid crystal layer

42, 471‧‧ ‧ gate line (scanning line)

439, 472‧‧‧ Touch sensing wiring (touch sensing electrode)

473‧‧‧Lighting layer

28, 478‧‧‧ gate electrode

26, 476‧‧‧ active components

24, 324, 424, 474‧‧ ‧ pixel electrodes

27‧‧‧Contact hole

29‧‧‧First metal wiring

31‧‧‧Training Department

32‧‧‧ Sealing Department

33, 34, 35‧‧‧ insulation

40‧‧‧Second metal wiring

R‧‧‧ red layer

G‧‧‧Green layer

B‧‧‧Blue layer

M‧‧‧End of metal wiring

Me‧‧‧second terminal part with exposed indium layer

S‧‧ slit

100‧‧‧Black electrode substrate

200, 300, 400, 450‧‧‧ array substrates

500, 600, 700, 800‧‧‧ display devices (liquid crystal display devices)

Fig. 1 is a cross-sectional view showing a portion of a black electrode substrate according to a first embodiment of the present invention, and is a view showing a cross section taken along line A-A' of Fig. 3.

2A is an enlarged cross-sectional view showing a black wiring disposed on the black electrode substrate according to the first embodiment of the present invention, and is an enlarged view showing an important portion shown by a symbol B in the first drawing.

2B is a plan view showing the entire transparent substrate constituting the black electrode substrate according to the first embodiment of the present invention, as viewed from the first surface.

Fig. 3 is an enlarged plan view showing a black electrode pattern disposed on the black electrode substrate according to the first embodiment of the present invention.

Figure 4 is a partial view showing the black aspect of the second embodiment of the present invention. A cross-sectional view of the electrode substrate is a cross-sectional view showing a structure in which a red layer, a green layer, and a blue layer are provided in the pixel opening.

Fig. 5 is a block diagram showing a liquid crystal display device according to a third embodiment of the present invention.

Fig. 6 is a cross-sectional view partially showing a liquid crystal display device according to a third embodiment of the present invention.

Fig. 7 is a plan view showing a planar pattern of a black electrode substrate constituting a liquid crystal display device according to a third embodiment of the present invention, and is a view for explaining a positional relationship between a black electrode pattern and a transparent conductive wiring which is orthogonal to the black electrode pattern.

Fig. 8 is a plan view showing, in an enlarged manner, pixels constituting an array substrate of a liquid crystal display device according to a third embodiment of the present invention.

Fig. 9A is a cross-sectional view showing a liquid crystal display device according to a third embodiment of the present invention, and is a schematic view showing a cross section taken along line E-E' of Fig. 8 and a cross section of an end portion of the liquid crystal display device.

Fig. 9B is an enlarged cross-sectional view showing an end portion of a liquid crystal display device according to a third embodiment of the present invention, and is an enlarged view for explaining a portion shown by a symbol M in Fig. 9A.

Fig. 10 is a cross-sectional view showing the end portion of the liquid crystal display device of the third embodiment of the present invention, partially showing a cross section taken along line B-B' of Fig. 7.

Figure 11 is a partial cross-sectional view showing a display device according to a fourth embodiment of the present invention.

Figure 12 is a partial cross-sectional view showing a display device according to a fifth embodiment of the present invention.

Fig. 13A is a partial plan view showing a display device according to a sixth embodiment of the present invention.

Figure 13B is a partial cross-sectional view showing a display device according to a sixth embodiment of the present invention.

Figure 13C is a partial cross-sectional view showing a display device according to a sixth embodiment of the present invention.

Fig. 14A is a view for explaining a method of manufacturing a black electrode substrate according to a seventh embodiment of the present invention.

Fig. 14B is a view for explaining a method of manufacturing a black electrode substrate according to a seventh embodiment of the present invention.

Fig. 14C is a view for explaining a method of manufacturing a black electrode substrate according to a seventh embodiment of the present invention.

Fig. 15 is a flow chart for explaining a method of manufacturing a black electrode substrate according to a seventh embodiment of the present invention.

Fig. 16 is a partial cross-sectional view showing a modification of the black electrode substrate according to the first embodiment of the present invention.

[Formation of the Invention]

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

In the following description, the same or substantially the same functions and components are denoted by the same reference numerals, and description thereof will be omitted.

In each of the figures, since each component is a size that can be recognized on the drawing, the size and ratio of each component and the actual person are made. Properly different.

In each of the embodiments, the description will be omitted. For example, the components of the normal display device and the display device of the present invention are not described. Further, in each of the embodiments, a black electrode substrate or a liquid crystal display device including the black electrode substrate will be described. However, the black electrode substrate according to the embodiment of the present invention can be applied to a liquid crystal display device such as an organic EL display device. Display device.

[First Embodiment]

Hereinafter, the black electrode substrate 100 according to the embodiment of the present invention will be described using Figs. 1 to 3 .

Fig. 1 shows the minimum structure of the black electrode substrate of the present embodiment. The black electrode substrate 100 includes a transparent substrate 15 and a plurality of black wirings 6 provided on the transparent substrate 15. Further, in the cross-sectional view of Fig. 1, a plurality of black wirings 6 are provided on the transparent substrate 15, but as shown in the plan view of Fig. 3, the black wirings 6 constitute a black electrode pattern 60 having a plurality of pixel openings 8. . That is, the region formed between the plurality of black wirings 6 in the first drawing is the pixel opening portion 8. The display unit, the shape of the opening, the number of pixels, and the like of the display device described in detail below are not limited to the above configuration.

As shown in Fig. 1, the transparent substrate 15 has a first surface 15a that functions to touch the sensing input surface and a second surface 15b that is opposite to the first surface 15a. As shown in FIG. 2B, the transparent substrate 15 has a rectangular display region 15c (symbol D in FIG. 3) defined on the second surface 15b, and a predetermined surface on the second surface 15b and located outside the display region 15c. Outer area 15d. In other words, the outer region 15d has a frame like the surrounding display region 15c. shape. Further, the display region 15c is a region that becomes a display portion constituting the display device. The outer region 15d is a region that becomes a frame portion constituting the display device. As the material of the transparent substrate 15, a glass substrate represented by an alkali-free glass is used. Further, as the material of the transparent substrate 15, a resin film having a large stretchability is not used. The thickness of the transparent substrate 15 is, for example, in the range of 1 mm to 0.1 mm.

As shown in FIG. 2A, the black wiring 6 is composed of a first black layer 1, a first indium-containing layer 2, a copper-containing layer or a copper alloy layer, and a second layer, which are sequentially formed on the transparent substrate 15. The indium layer 4 and the second black layer 5 are formed.

The first black layer 1 is disposed on the second surface 15b and on the display region 15c and the outer region 15d. The first indium-containing layer 2 is disposed on the first black layer 1. The copper-containing layer 3 is provided on the first indium-containing layer 2. The second indium-containing layer 4 is provided on the copper-containing layer 3. The second black layer 5 is provided on the second indium-containing layer 4. That is, the black wiring 6 has a laminated structure composed of the first black layer 1, the first indium-containing layer 2, the copper-containing layer 3, the second indium-containing layer 4, and the second black layer 5.

Fig. 3 is a partial plan view showing a black electrode substrate 100 according to an embodiment of the present invention. The cross section along the line A-A' shown in Fig. 3 is shown in Fig. 1.

As shown in FIG. 3, the black electrode substrate 100 of the present embodiment has a black electrode pattern 60 which is formed on the second surface 15b and extends in the X direction (first direction) and the Y direction ( The black wiring 6 in the second direction orthogonal to the first direction is defined by the black wiring 6. A plurality of black electrode patterns 60 are formed on the second surface 15b. Each of the black electrode patterns 60 has a plurality of pixel openings 8 (opening patterns), and the plurality of pixel openings 8 (opening pattern) has a rectangular shape extending in the Y direction, and is surrounded by the black wiring 6 and formed on the display region 15c. In other words, in the black electrode pattern 60, the black wiring 6 extends in the X direction and the Y direction so as to form a matrix pattern (lattice pattern), and the black wiring 6 extending in the X direction and the black wiring extending in the Y direction are connected in the connection portion. 6. Further, in such a configuration, the black wiring 6 extending in the X direction and the Y direction is electrically connected to form a connection structure having a lattice pattern, and the strength is improved. In the third electrode, in the black electrode pattern 60, six pixel openings 8 are arranged in the X direction, and 480 pixel openings 8 are arranged in the Y direction.

Furthermore, the two black electrode patterns 60 adjacent to each other (for example, the first black electrode pattern 60a and the second black electrode pattern 60b) are electrically insulated from the slit S. A pixel opening portion 8 is also provided between the two black electrode patterns 60 that are electrically insulated. Even in this case, the present invention is defined as the pixel opening portion 8 defined by the black wiring 6. Further, each of the black electrode patterns 60 has a terminal portion 11 provided on the outer region 15d. A lead line is provided between the conductive portion of the black electrode pattern 60 formed on the display region 15c and the terminal portion 11 provided on the outer region 15d. In the terminal portion 11, the second black layer 5 having the laminated structure of the black wiring 6 is removed, and the second indium-containing layer 4 is exposed.

The plurality of black electrode patterns 60 having the above pattern are arranged in parallel with each other in the X direction. The number of black electrode patterns 60 is, for example, 320. Therefore, the total number of pixels (the number of pixel openings 8) of the black electrode substrate 100 shown in FIG. 3 is 1920×480. In the example shown in FIG. 3, although the first black layer 1 and the second black layer 5 are formed to have the same pattern shape and have the same line width, the first black layer 1 and the second The line widths of the black layers 5 may be different from each other, and the pattern shapes of the first black layer 1 and the second black layer 5 may be different from each other.

Further, in the present embodiment, the black electrode pattern 60 is defined such that the six pixel openings 8 are arranged in the X direction in the black wiring 6, and one black touch sensing electrode is formed by one black electrode pattern 60. However, the invention is not limited by this configuration. A plurality of black wirings 6 may be formed on the transparent substrate 15 so as to be arranged in parallel with each other in the X direction, and a plurality of black wirings 6 may be defined by a wiring group (for example, a group of one wiring group formed by six wirings). In this case, one wiring group forms a black touch sensing electrode. Further, in the case where the black touch sensing electrode is formed by such a wiring group, it is not necessary to use all the black wirings constituting the wiring group as the driving electrodes (electrodes that generate the touch signals). For example, in the configuration of the plurality of black wirings 6 arranged in the X direction, for example, six black wirings are defined as one group, and a plurality of black wiring groups are set on the transparent substrate 15. Further, black wiring arranged every six lines may be used as the driving electrode. Specifically, by driving a method in which five black wirings are thinned out (removed) and a scanning signal is transmitted to one black wiring, the black wiring can be thinned and driven (scanned). In this case, the five black wirings that have been removed (poorized) become electrically floating (floating).

(black layer)

The first black layer 1 and the second black layer 5 contain carbon as a main color material (black color material), and are composed of a resin in which the black color material is dispersed. In the following description, the first black layer 1 and the second black layer 5 may be referred to simply as a black layer. If only an oxide of copper or an oxide of a copper alloy is provided on the transparent substrate 15, sufficient black or low reflectance cannot be obtained, but By providing a black layer on the transparent substrate 15, the reflectance of visible light on the surface of the black wiring 6 can be suppressed to 3% or less. Further, as will be described later, since the first black layer 1 and the second black layer 5 are formed so as to sandwich the copper-containing layer 3, high light-shielding properties can be obtained.

In the case of black color materials, carbon, carbon nanotubes or a mixture of a plurality of organic pigments and carbon may be used. Carbon is used as a main color material of, for example, 51% by mass or more, and in order to adjust the reflection color, an organic pigment such as blue or red may be added to the color material. For example, by adjusting the concentration of carbon (reducing the carbon concentration) contained in the photosensitive black coating liquid used as the starting material, the reproducibility of the color appearing in the black layer can be improved. Furthermore, in the embodiment of the present invention, the solid content of the resin, the curing agent, and the pigment is in the range of 4 to 50% by mass. The concentration of carbon may exceed 50% by mass, but the concentration of carbon exceeds 50% by mass for the entire solid content, and the coatability of the coating film tends to decrease. When the carbon concentration is 4% by mass or less, sufficient black color cannot be obtained, and reflection due to the metal layer (the copper-containing layer 3) disposed under the black layer is generated, and the visibility is largely lowered. When the carbon concentration is not described in the following embodiments, the carbon concentration is 40% by mass for all solids. By determining the carbon concentration in this manner, it is possible to form a black wiring having a thin line by patterning, for example, a black wiring having a line width of 1 to 5 μm, even if a large exposure apparatus for a display device is used.

When the black layer is formed, the alignment mark is formed on the transparent substrate 15 using the same material as the black layer. The alignment marks are used for alignment (alignment) of the exposure or pattern in the photolithography process for subsequent processes. If the process of using alignment marks is prioritized, then the black layer The optical density can be set to 2 or less, for example, in the penetration measurement. Further, a second black layer 5 may be formed by using a mixture of a plurality of organic pigments as a black color material without using carbon. The reflectance of the first black layer 1 and the second black layer 5 is preferably a refractive index (about 1.5) of a substrate such as glass or a transparent resin, and it is preferable to adjust the content or type of the black color material and the resin to be used. The content, the kind, or the film thickness is such that the reflectance at the interface between the black layer and the substrate becomes 2% or less. When the conditions for forming such a black layer are optimized, the reflectance at the interface between the substrate such as glass having a refractive index of about 1.5 and the black layer can be 2% or less in the wavelength region of visible light. rate. The reflectance of the black layer takes into consideration the visibility of the observer, and is preferably set to 3% or less. Further, the refractive index of the acrylic resin or liquid crystal material which is usually used for a color filter is approximately in the range of 1.5 to 1.7.

The thickness of the black wiring 6 composed of the first black layer 1, the first indium-containing layer 2, the copper-containing layer 3 composed of the copper layer or the copper alloy layer, the second indium-containing layer 4, and the second black layer 5 may be Set to 1 μm or less. When the thickness of the black wiring 6 exceeds 2 μm, the uneven shape caused by the formation of the black wiring 6 adversely affects the alignment of the liquid crystal. Therefore, the thickness of the black wiring 6 is preferably set to 1.5 μm or less.

A plurality of pixel openings 8 surrounded by the formed black wirings 6 (black layers) are formed in the display region 15c. The shape of the pixel opening portion 8 may be a line shape, but may be formed in a polygonal shape in which at least two sides are parallel. For the polygons in which the two sides are parallel, a rectangle, a hexagon, a doglegged shape, or the like can be exemplified. As a frame shape surrounding the periphery of the above-described polygonal pixel, the pattern shape of the black wiring can be formed into electricity Gas-closed shape. The pattern shape may be a pattern that is electrically closed in a plan view, or may be a pattern in which a part of the pattern shape is opened (an unconnected portion is provided in appearance). The detection of electrical noise generated around the liquid crystal display device changes due to the selection of such a pattern shape. Alternatively, the detection of electrical noise generated around the liquid crystal display device may vary due to the pattern shape or area of the copper-containing layer 3 of the metal layer.

(including copper layer)

The metal forming the copper-containing layer 3 is copper or a copper alloy. When the copper-containing layer 3 is formed using a film of copper or a film of a copper alloy, if the film thickness of the copper-containing layer 3 is 100 nm or more or 150 nm or more, visible light hardly penetrates the copper-containing layer 3. Therefore, when the film thickness of the copper-containing layer 3 constituting the black wiring 6 of the present embodiment is, for example, about 100 nm to 300 nm, sufficient light-shielding property can be obtained.

As the copper-containing layer 3, a metal layer having alkali resistance can be applied. The case where alkali resistance is required is, for example, a development process (subsequent process) using an alkaline developer. Specifically, in the process of forming a color filter, for example, or the process of forming the second black layer 5 to have a pattern different from the first black layer 1 (black matrix or the like), the copper-containing layer 3 is required to be resistant. Alkaline. In the case where the terminal portion is formed on the black wiring to be described later, the copper-containing layer 3 is also required to have alkali resistance. Further, chromium has alkali resistance and can be suitably used as a metal layer constituting the black wiring 6. However, chromium has a high electric resistance value, and harmful chromium ions are generated in a manufacturing process for forming a chromium layer. Therefore, it is difficult to apply the chromium layer to the black wiring 6 in consideration of actual production. From the viewpoint of low resistance value, it is preferable to form the copper-containing layer 3 using copper or a copper alloy. Copper or a copper alloy is desirable as a material of the copper-containing layer 3 because of its good electrical conductivity.

The copper-containing layer 3 may contain an alloying element of 3 at% or less as a copper alloy. As the alloying element, one or more elements selected from the group consisting of magnesium, calcium, titanium, molybdenum, indium, tin, zinc, aluminum, lanthanum, nickel, lanthanum, cerium, and gallium may be selected. By adding these alloy metals to the copper-containing layer 3, the pattern shape can be improved in pattern formation of the photolithography process. The alloying of copper (copper alloy) suppresses diffusion of copper from the copper-containing layer 3 to the layer provided around the copper-containing layer 3, and improves heat resistance and the like. When more than 3 at% of the alloying element is added to the copper-containing layer 3, the resistance value of the black wiring 6 becomes high. By adding the alloy metal to the copper-containing layer 3, the pattern shape of the copper-containing layer 3 can be improved in pattern formation of the photolithography process. When the resistance value of the copper-containing layer 3 constituting the black wiring 6 becomes high, the waveform of the driving voltage with respect to the touch sensing is deformed or a signal delay occurs, which is not suitable.

(including indium layer)

The first indium containing layer 2 and the second indium containing layer 4 have about two functions. The first function is an improvement in adhesion and adhesion between the black layer and the copper-containing layer. The second function is to improve the electrical connectivity between the electrode or terminal connected to the copper-containing layer and the copper-containing layer. The adhesion to the oxide or nitride of copper, copper alloy or copper-containing metal which is a black layer of the dispersion of the resin and the black color material is generally low. Furthermore, there is a problem that peeling occurs at the interface between the black layer and the oxide or the interface between the black layer and the nitride. Further, in terms of oxides or nitrides of copper, copper alloys or copper-containing metals, electrical connectivity is generally unstable and reliability is lacking. For example, copper oxide or copper sulfide which is formed on the surface of copper over time has characteristics close to that of the insulator, which causes problems in electrical installation. For the film thickness of the indium-containing layer, for example, a film thickness of 2 nm to 50 nm can be applied.

The first indium-containing layer 2 and the second indium-containing layer 4 (hereinafter, these indium-containing layers are simply referred to as indium-containing layers) may contain from 0.5 at% to 40 at% for the indium-containing conductive metal oxide or copper. A metal indium is selected from a copper indium alloy (an alloy layer containing copper and indium). By increasing the content of indium contained in the copper indium alloy, it is possible to suppress the formation of copper oxide which is easily formed on the surface of the indium-containing layer. Furthermore, the indium-containing layer can easily achieve electrical contact between the terminals or electrodes electrically connected to the copper-containing layer and the copper-containing layer. In the case of using a copper indium alloy, an alloy containing 40 at% or more of metal indium can be used. However, since indium is expensive, it is not economically preferable to contain indium in an indium containing layer at a high content. Further, when the content of the metal indium is 40 at% or less, since the indium-containing layer has heat resistance to 500 ° C, an indium-containing layer can be used as the metal wiring provided on the array substrate. The atomic weight of indium is higher than that of copper, and indium is easily combined with oxygen compared to copper, and indium oxide is more easily formed on the surface of the copper indium alloy than copper oxide. The copper indium alloy can solve problems such as diffusion of copper generated when a copper monomer is used or void formation in a metal layer.

For the conductive metal oxide containing indium, a mixed oxide containing indium oxide and tin oxide called ITO (Indium Tin Oxide), a mixed oxide containing indium oxide, gallium oxide, and zinc oxide, and oxidation may be used. a mixed oxide of tin and cerium oxide, a mixed oxide containing indium oxide, tin oxide, and zinc oxide.

The present invention is not limited to the above-described metal oxide, and a mixed oxide containing a small amount of other metal oxides may be contained in the indium-containing layer, and the other metal oxides are titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, and oxidation. Hey. In the case where the indium containing layer contains a mixed oxide, consider mixing The surface of the oxide is electrically contacted (electrically connected) with the copper-containing layer 3, and "indium-containing" means that the content of indium oxide in the mixed oxide is 51% by weight to 99% by weight.

Even when indium is used as the metal, or even when indium is used as the oxide, the indium-containing layer can be greatly improved for a resin such as an acrylic resin which is a color filter substrate, a transparent substrate such as glass, or ruthenium oxide or nitrogen. Adhesion of inorganic film such as bismuth. Therefore, an indium-containing layer can be provided at the interface between the metal layer (the copper-containing layer) formed of copper or a copper alloy and the black layer or the interface between the transparent substrate or the inorganic insulating layer and the metal layer. Even when indium is used as the metal, even when indium is used as the oxide, by providing the indium-containing layer on the terminal portion, it is possible to provide a terminal portion which is stably electrically connected.

The indium-containing layer can be formed by sputtering or the like. In the case where the indium-containing layer is formed into a film, in addition to argon, oxygen may be introduced into the film forming chamber to form a film.

(function of black wiring)

As described above, the black wiring 6 (black electrode pattern 60) is a conductive wiring having a laminated structure in which a copper-containing layer 3 containing copper or a copper alloy is sandwiched by two black layers, in the copper-containing layer 3 and black. The interface between the layers is provided with an indium containing layer. The black wiring 6 described in the following embodiments can function as a touch sensing electrode used in capacitive touch sensing.

The touch sensing electrode has a configuration in which, for example, a plurality of detecting electrodes are disposed in a first direction (for example, an X direction) in a plan view, and a plurality of driving electrodes are disposed via an insulating layer located in a lamination direction (Z direction). Second direction (Y direction). The AC pulse signal is applied to the drive electrode at a frequency of, for example, several KHz to several tens of KHz. Generally, with the application of the AC pulse signal, a certain output waveform is maintained at the detecting electrode. If a finger or an indicator or the like touches or approaches the first surface 15a of the touch sensing input surface, the change occurs on the output waveform of the detecting electrode located at the contact portion or the approaching portion, and the presence or absence of the touch input can be determined.

The black electrode pattern 60 (black wiring 6) can be used as the above-described driving electrode or detecting electrode. When the transparent conductive wiring 7 (described later) is provided in a direction (Y direction) orthogonal to the direction in which the black electrode patterns 60 are arranged (X direction), the transparent conductive wiring can be similarly provided. Used as a drive or detection electrode.

Although the line widths of the first black layer 1 and the second black layer 5 constituting the black wiring 6 may be set to be the same, the line width may be different. The pattern of the first black layer 1 and the pattern of the second black layer 5 may be set to be the same. It is preferable that at least one of the first black layer 1 and the second black layer 5 has a line width equal to the line width of the copper-containing layer 3. For example, a plurality of black wires composed of the first black layer 1, the first indium-containing layer 2, the copper-containing layer 3 composed of a copper layer or a copper alloy layer, the second indium-containing layer 4, and the second black layer 5 may be formed. The lines are arranged in such a way that they are arranged in one direction. As described above, the transparent conductive wiring can be disposed to be orthogonal to the arrangement of the plurality of black wirings.

The line widths of the first black layer 1 and the second black layer 5 constituting the black wiring 6 are the same as each other, or the pattern shapes of the first black layer 1 and the second black layer 5 are the same as each other, and the second black is used. The layer 5 is used as a patterned mask (resist pattern), and the indium-containing layer and the copper layer are wet-etched all at once to obtain the same pattern as the second black layer 5. Copper-containing layer 3. Further, by using the second black layer 5 and the copper-containing layer 3 as a mask, dry etching is performed to obtain the first black layer 1 having the same line width as the second black layer 5. As described above, the line widths of the first black layer 1 and the second black layer 5 constituting the black wiring 6 are the same as each other, or the pattern shapes of the first black layer 1 and the second black layer 5 are the same as each other, and the wiring is easy. The black electrode substrate 100 is manufactured by a process. From the viewpoint of the aperture ratio of the pixel opening portion 8, the line widths of the black layer, the indium-containing layer, and the copper-containing layer 3 are preferably the same as each other. Here, the same line width means that in the well-known process of photolithography such as exposure, development, etching, etc., the line width of each of the black layer, the indium-containing layer, and the copper-containing layer 3 is achieved for the purpose of the line width. Within ±1.5μm.

Since the black wiring 6 has a structure in which the visible light having the indium-containing layer and the copper-containing layer 3 is less reflected by the black layer, the black wiring 6 does not hinder the visibility of the observer. Further, when the black electrode substrate 100 is placed on the liquid crystal display device, since the light emitted from the backlight of the display device is not reflected by the copper-containing layer 3, it is possible to prevent light from entering the active element such as the TFT.

Further, the display device including the black electrode substrate according to the first embodiment can be used as a light source of a backlight unit by emitting an LED light-emitting element such as red light emission, green light emission, blue light emission or the like, which can be used in a field sequential manner. Color display.

[Second embodiment]

Fig. 4 is a cross-sectional view showing a portion of a black electrode substrate according to a second embodiment of the present invention, and showing a structure in which a red layer, a green layer, and a blue layer are provided in a pixel opening.

Regarding the pixel opening portion 8, one portion of the end portion of the second black layer 5 may be A color filter composed of a colored layer such as a red layer R, a green layer G, and a blue layer B is laminated in a superimposed manner. Further, a transparent resin layer 9 is formed to cover the red layer R, the green layer G, and the blue layer B. Regarding the color filter, in addition to the coloring layers of the red layer R, the green layer G, and the blue layer B, other color layers such as a light color layer, a complementary color layer, and a white layer (transparent layer) may be added. Before the color filter is laminated on the pixel opening portion 8, the transparent resin layer may be formed on the second surface 15b of the transparent substrate 15 on which the black wiring 6 is formed so as to cover the black wiring 6. Fig. 4 exemplifies a structure in which a transparent resin layer 9 is laminated on the coloring layers of the red layer R, the green layer G, and the blue layer B. A conductive layer (not shown) of a thin film of ITO or the like may be formed on the transparent resin layer 9. In the embodiment to be described later, the structure in which the transparent conductive wiring is laminated on the color filter will be described.

A colored layer such as a red layer R, a green layer G, and a blue layer B is obtained by dispersing, for example, an organic pigment in a photosensitive transparent resin, and forming a transparent resin in which an organic pigment is dispersed on a color filter, and then using a well-known one. The formation of light lithography.

[Third embodiment]

(Longitudinal electric field type liquid crystal display device)

Next, a liquid crystal display device according to a third embodiment of the present invention will be described with reference to Figs. 5 to 10 . In the third embodiment, the same members as those in the first and second embodiments are denoted by the same reference numerals, and their description is omitted or simplified.

Fig. 5 is a block diagram for explaining the function of the liquid crystal display device of the embodiment. The liquid crystal display device 500 of the present embodiment includes a display unit 110 that is disposed in a position corresponding to the display region 15c. And a control unit 120 for controlling the display unit 110 and the touch sensing function. The control unit 120 has a well-known structure, and includes a mapping signal timing control unit 121, a touch sensing, a scanning signal control unit 122, and a system control unit 123.

The video signal timing control unit 121 transmits a signal to a signal line 41 (described later) and a scanning line 42 (described later) of the array substrate 200 at a fixed potential of a plurality of transparent conductive wires 7 (described later). By applying a liquid crystal driving voltage for display to the pixel electrode 24 in the layer Z direction between the transparent conductive wiring 7 and the pixel electrode 24 (described later), liquid crystal driving of the liquid crystal molecules of the liquid crystal layer 20 (described later) is driven. Thereby, an image is displayed on the array substrate 200.

The touch sensing unit 122 applies a detection driving voltage to the black electrode pattern 60 (black wiring 6) with a plurality of transparent conductive wires 7 at a fixed potential, and detects between the black electrode patterns 60 and the transparent conductive wirings 7. Touch changes are detected by changes in electrostatic capacitance (edge capacitance).

The system control unit 123 controls the video signal timing control unit 121 and the touch sensing/scan signal control unit 122.

Fig. 6 and Fig. 9A are cross-sectional views partially showing the liquid crystal display device of the embodiment. The liquid crystal display device includes an optical film such as a well-known polarizing plate, an alignment film, a cover glass (protective glass), and the like, but these members are omitted in FIGS. 6 and 9A. Further, Fig. 9A is a schematic view showing a cross section taken along line E-E' of Fig. 8 and a cross section of an end portion of the liquid crystal display device. In order to facilitate the understanding of the present embodiment, the cross-sectional view of the liquid crystal display device is schematically shown in FIG. 9A, but the positional relationship between the pixel portion (pixel electrode) and the conductive portion in FIG. 9A and the actual configuration are shown. different.

In the liquid crystal display device 500 (hereinafter, the liquid crystal display device 500) of the third embodiment, the black electrode substrate 100 according to the first embodiment of the present invention is applied.

The liquid crystal display device 500 includes a black electrode substrate 100, an array substrate 200 on which an active device is provided, and a liquid crystal layer 20 sandwiched between the substrates 100 and 200 to form a liquid crystal cell. The first surface 15a of the black electrode substrate 100 that functions to touch the sensing input surface is located on the surface side of the liquid crystal display device 500 to form a display surface.

(liquid crystal layer)

The initial alignment direction of the liquid crystal layer 20 is perpendicular to the respective faces of the black electrode substrate 100 and the array substrate 200, and is used in the so-called VA method (Vertically Alignment method: vertical electric field method using liquid crystal molecules of vertical alignment) The LCD driver method. In the VA method, the liquid crystal layer 20 operates in accordance with the voltage applied in the thickness Z direction (longitudinal direction) of the liquid crystal layer 20, and the liquid crystal display device 500 displays an image or the like.

Examples of liquid crystal driving methods applicable to the vertical electric field method include HAN (Hybrid-aligned Nematic), TN (Twisted Nematic), OCB (Optically Compensated Bend), CPA (Continuous Pinwheel Alignment), ECB (Electrically Controlled Birefringence), and TBA. (Transverse Bent Alignment), etc., can be selected and used as appropriate.

In the method of driving the liquid crystal layer 20, the liquid crystal driving may be a common inversion driving, or the pixel electrode may be reversely driven while maintaining the common electrode at a fixed potential, and the liquid crystal layer 20 may be electrically applied. Press and drive.

(transparent conductive wiring)

Next, the transparent conductive wiring provided on the liquid crystal display device 500 will be described.

In addition to the structure of the black electrode substrate 100 described in the first embodiment and the second embodiment, the transparent conductive wiring 7 is provided on the transparent resin layer 9 of the black electrode substrate 100. The transparent conductive wiring 7 also serves as a function of a touch sensing electrode and a function of a common electrode (a driving electrode of a liquid crystal) used when a voltage is applied to the liquid crystal layer 20.

In the liquid crystal display device 500 of the present embodiment, the liquid crystal layer 20 is driven by applying a driving voltage of the liquid crystal between the transparent conductive wiring 7 serving as the common electrode and the pixel electrode 24 (described later) provided in the array substrate 200.

As shown in Fig. 6, the black wirings 6 of the black electrode substrate 100 are arranged in the X direction so as to have a line pattern shape extending in the Y direction perpendicular to the plane of the paper. The black electrode patterns 60 composed of the black wirings 6 are similarly arranged in the X direction (see FIG. 3). A plurality of transparent conductive wirings 7 are arranged on the transparent resin layer 9 of the black electrode substrate 100. The transparent conductive wires 7 are arranged in the Y direction so as to have a line pattern shape extending in the X direction. The black wiring 6 and the transparent conductive wiring 7 are disposed to be orthogonal to each other via the transparent resin layer 9 which is a dielectric.

Fig. 7 is a plan view showing the black electrode substrate 100 shown in Fig. 6 as seen from the film surface of the transparent conductive wiring 7, and shows an example of the black electrode substrate 100. The Y direction in which the black electrode pattern 60 composed of the black wiring 6 extends is orthogonal to the X direction in which the transparent conductive wiring 7 extends, and has a width in the Y direction. The transparent conductive wiring 7 of the web and the plurality of black wirings 6 are arranged to overlap each other. For example, the pixel pitch in the X direction can be set to 21 μm, the line width of the black wiring 6 can be set to 4 μm, and the line width of the transparent conductive wiring 7 can be set to 123 μm (the pitch of the transparent conductive wiring 7 is 126 μm). In Fig. 7, when one black electrode pattern 60 is focused on, one transparent conductive wiring 7 is orthogonal to the six black wirings 6. The black electrode patterns 60 adjacent to each other are electrically distinguished by the slits S. The width of the slit S can be set to 1 to 4 μm.

In the structure in which the black electrode substrate 100 is incorporated in the liquid crystal display device 500, light leakage from the liquid crystal display device 500 can be prevented by placing the metal wiring provided on the array substrate at a lower portion of the slit S. Although not shown, in the present embodiment, in the portion where the slit S is provided, the red layer R and the blue layer B are formed to overlap (color overlap), and light leakage from the liquid crystal display device 500 is suppressed. Each of the black wirings of the plurality of black wirings 6 having a fine line width can form an edge capacitance along the wiring direction thereof, and a large S/N ratio can be obtained with a large edge capacitance.

For example, in the present embodiment, the transparent conductive wiring 7 is a common electrode and functions as a detecting electrode that constitutes a touch sensing electrode. The black electrode pattern 60 having the black wiring 6 functions as a drive electrode that constitutes a touch sensing electrode. A predetermined electrostatic capacitance C5 is formed between the black electrode pattern 60 and the transparent conductive wiring 7 (see FIG. 6). When a finger or an indicator touches or approaches the black electrode substrate 100, the electrostatic capacitance corresponding to a position such as a finger or a pointer changes, and the touch input position is detected.

Further, in the present embodiment, a configuration is adopted in which a black electrode pattern having a group of a plurality of black wirings 6 is detected. The change in electrostatic capacitance between 60 and the transparent conductive wiring 7; however, the present invention is not limited by this configuration. It is also possible to provide a plurality of individual black wirings on the black electrode substrate 100 without using the configuration of the black electrode pattern 60 as described above. In this case, by driving, for example, six black wirings for thinning (removing) five black wirings to transmit a scanning signal to a black wiring, the black wiring can be thinned and driven (scanned), and a touch feeling can be obtained. The speed of measurement is high.

The potential of the transparent conductive wiring 7 is a fixed potential on both the touch sensing drive and the liquid crystal drive. By setting the potential of the transparent conductive wiring 7 in this manner, the touch sensing drive and the liquid crystal driving can be driven at different frequencies. In the liquid crystal display device 500 of the present embodiment, a large edge capacitance can be obtained, and while maintaining a high S/N ratio, the driving voltage required for the touch sensing drive can be reduced, and power consumption can be reduced.

(array substrate)

Next, the array substrate 200 provided on the liquid crystal display device 500 will be described with reference to FIGS. 6 and 8 to 10 .

As shown in FIG. 6, the array substrate 200 includes a transparent substrate 25, insulating layers 33, 34, and 35 which are sequentially provided on the transparent substrate 25, and pixel electrodes 24 provided on the insulating layer 35. The pixel electrode 24 is electrically connected to the active device 26 (thin film transistor) via the contact hole 27 (see FIG. 9A). The active element 26 is disposed at a position adjacent to each pixel opening of the plurality of pixel openings 8. Further, as shown in FIG. 9A, the array substrate 200 has the first metal wiring 29 disposed on the sealing portion 32 of the liquid crystal display device 500 or the like. The first metal wiring 29 is formed of the same material by the same process as the gate electrode 28 (described later). Inside the sealing portion 32 of the liquid crystal display device 500 and through The liquid crystal layer 20 is sealed between the conductive wiring 7 and the pixel electrode 24. The first metal wiring 29 may have a configuration in which a copper-containing layer containing at least copper and two indium-containing layers sandwiching a copper-containing layer and containing indium are laminated.

FIG. 8 is a plan view showing an enlarged view of one pixel of the array substrate 200.

As shown in FIGS. 8 and 9A, the array substrate 200 has a plurality of pixel electrodes 24, a plurality of thin film transistors 26, second metal wirings 40, and plural on the main surface of the transparent substrate 25 opposed to the liquid crystal layer 20. Insulating layers 33, 34, 35. More specifically, a plurality of pixel electrodes 24 and a plurality of thin film transistors 26 are provided on the main surface of the transparent substrate 25 via a plurality of insulating layers 33, 34, and 35. Further, the thin film transistor 26 is not shown in Fig. 6, and the insulating layers 33, 34, and 35 are not shown in Fig. 8.

The second metal wiring 40 has a plurality of signal lines 41 (source lines, source electrodes), scanning lines 42 (gate lines), and auxiliary capacitance lines 43. The scan line 42 is connected to the gate electrode 28. The signal line 41, the scanning line 42, and the auxiliary capacitance line 43 have the same wiring structure as the black wiring 6. Thereby, the source electrode and the drain electrode constituting the active device 26 are formed of the second metal wiring 40 having a three-layer structure including an indium layer/copper/indium-containing layer. That is, the second metal wiring 40 has a configuration in which a copper-containing layer containing at least copper and two indium-containing layers containing a copper-containing layer and containing indium are laminated. The second metal wiring 40 is formed on the insulating layer 35 on the first metal wiring 29, and is formed into a film in a different process from the first metal wiring 29.

Each of the pixel electrodes 24 has a well-known structure and is disposed on the surface of the insulating layer 35 opposed to the liquid crystal layer 20 so as to face the pixel opening 8 surrounded by the black wiring 6.

The channel layer 46 of each of the thin film transistors 26 can be formed of a lanthanide semiconductor or an oxide semiconductor such as polysilicon. In the thin film transistor 26, the channel layer 46 is preferably an oxide semiconductor containing two or more kinds of metal oxides of gallium, indium, zinc, tin, and antimony such as IGZO (registered trademark). That is, the channel layer 46 is formed of an InGaZnO-based metal oxide. Since the thin film transistor 26 having such a structure has high memory (less leakage current), it is easy to maintain the pixel capacitance after the liquid crystal driving voltage is applied. Therefore, the configuration in which the auxiliary capacitance line 43 is omitted can be formed.

A thin film transistor using an oxide semiconductor as a channel layer has, for example, a bottom gate type configuration. It is also possible to use a top gate type or a double gate type transistor structure for a thin film transistor. It is also possible to use a thin film transistor having a channel layer of an oxide semiconductor for a photo sensor or other active device.

The thin film transistor 26 in which the oxide semiconductor such as IGZO is used for the channel layer 46 has high electron mobility, and a required driving voltage can be applied to the pixel electrode 24 in a short time of, for example, 2 msec (milliseconds) or less. For example, the 1-frame of the double-speed drive (when the number of display frames in one second is 120 frames) is about 8.3 msec, and for example, 6 msec can be assigned to the touch sensing. Since the transparent conductive wiring 7 functioning as the drive electrode has a fixed potential, the liquid crystal drive and the touch electrode drive can be driven in a time-division manner. The driving frequency of the pixel electrode that drives the liquid crystal can be made different from the driving frequency of the touch electrode.

Further, the thin film transistor 26 using the oxide semiconductor for the channel layer 46 has a driving voltage applied to the pixel electrode 24 for a long time because the leakage current is small as described above. Signal lines, scanning lines, and auxiliary capacitors of the active device are formed by copper wiring having a wiring resistance smaller than that of the aluminum wiring Lines and the like, and using IGZO which can be driven in a short time as an active element, the touch sensing is expanded in the time tolerance of scanning, and the change in the generated electrostatic capacitance can be detected with high precision. When an oxide semiconductor such as IGZO is applied to an active device, the driving time of the liquid crystal or the like can be shortened, and a sufficient margin can be applied to the touch signal sensing during the image signal processing of the entire display screen.

The drain electrode 36 extends from the thin film transistor 26 to the center of the pixel, and is electrically connected to the pixel electrode 24 which is a transparent electrode via the contact hole 27. The source electrode 55 extends from the thin film transistor 26 and is electrically connected to the signal line 41.

(Outer structure 1 of liquid crystal display device 500)

Fig. 9A is a view for explaining the outer peripheral structure of the liquid crystal cell of the liquid crystal display device 500 of the present embodiment. FIG. 9A shows an example in which the transparent conductive wiring 7 of the black electrode substrate 100 including the black touch sensing electrode (black electrode pattern 60) is electrically connected to the array substrate 200. The transparent conductive wiring 7 provided on the black electrode substrate 100 is formed to cover the plane of the transparent resin layer 9 located on the display region 15c and to cover the end portion of the transparent resin layer 9 located at the outer region 15d. Further, the transparent conductive wiring 7 is formed so as to cover the joint portion between the end portion of the transparent resin layer 9 and the second surface 15b of the black electrode substrate 100 along the inclined surface formed at the end portion of the transparent resin layer 9, and to face the liquid crystal The outside of the unit extends. In the outer region 15d, the transparent conductive wiring 7 formed on the black electrode substrate 100 constitutes the terminal portion 13. In the outer region 15d, the sealing portion 32 and the conduction portion 31 are formed to cover the terminal portion 13. The terminal portion 13 is connected to the first metal wiring 29 of the array substrate 200 via the conduction portion 31. The first metal wiring 29 may be formed of the same layer as, for example, the gate electrode 28 or the gate line. Electrically connected via the conduction portion 31 The first metal wiring 29 on the transparent conductive wiring 7 is maintained at a fixed potential.

Fig. 9B is an enlarged view for explaining a portion displayed by the symbol M of Fig. 9A. The first metal wiring 29 provided on the transparent substrate 25 has substantially the same structure as the black wiring 6 shown in the first embodiment, and has a first indium-containing layer 2, a copper-containing layer 3, and a second indium-containing layer 4. The three-layer structure. In the present embodiment, the first indium-containing layer 2 having a film thickness of 20 nm is formed using ITO (In-Sn-O). A copper-containing layer 3 having a film thickness of 200 nm was formed with a copper-magnesium alloy containing 0.5 at% of magnesium (Mg). A second indium-containing layer 4 having a film thickness of 20 nm was formed with a copper-magnesium alloy containing 22 at% of In. The first indium-containing layer 2 is formed by forming ITO by forming an amorphous film by sputtering using room temperature conditions. The first indium-containing layer 2, the copper-containing layer 3, and the second indium-containing layer 4 can be easily processed all at once by wet etching. The reflection color of the surface of the copper-indium alloy becomes a color close to gray, and the occurrence of red color due to the copper monomer can be avoided, and the reflectance can also be lowered.

In the first metal wiring 29 of the present embodiment, copper or a copper alloy (the copper-containing layer 3) is sandwiched between the indium-containing layers, so that the adhesion to a transparent substrate such as glass is improved. Further, the electrical connection on the first metal wiring 29 is stabilized, and a good terminal structure can be realized. Furthermore, in the present embodiment, the black electrode pattern 60 extends in the Y direction, and the transparent conductive wiring 7 extends in the X direction. The present invention is not limited to such a configuration, and the black electrode pattern 60 may extend in the X direction, and the transparent conductive wiring 7 may extend in the Y direction.

In this configuration, the indium-containing layer is sandwiched between the transparent conductive wiring 7 and the conductive portion 31. In this case, the indium-containing layer improves the electrical connectivity between the transparent conductive wiring 7 and the conductive portion 31. Therefore, electrical contact between the first metal wiring 29 and the transparent conductive wiring 7 can be easily achieved.

(Outer structure 2 of liquid crystal display device 500)

Fig. 10 is a view for explaining the outer peripheral structure of the liquid crystal cell of the liquid crystal display device 500 of the present embodiment. Fig. 10 is a view showing an example in which the black electrode pattern 60 of the black electrode substrate 100 is electrically connected to the array substrate 200 along the line B-B' of Fig. 7. In the process of forming the blue layer B on the pixel opening portion 8 shown in FIG. 7, the blue layer B is formed not only in the pixel opening portion 8, but also outside the pixel opening portion 8 (the pixel opening portion 8 is not formed). The region) also has a blue layer B formed on the black electrode pattern 60 extending from the display region 15c to the outer region 15d. In consideration of such a case, the tenth figure is a display structure in which a blue layer B is provided between the transparent resin layer 9 and the black electrode pattern 60.

In the outer region 15d, the second indium-containing layer 4 of the black electrode pattern 60 is exposed. In the display region 15c, the second black layer 5 is covered by the transparent resin layer 9. In particular, in the laminated structure of the black electrode pattern 60 provided in the outer region 15d, the second black layer 5 is removed by etching which will be described later, and the second indium-containing layer 4 is exposed, and the terminal portion 11 is formed. The terminal portion 11 is connected to the first metal wiring 29 provided on the transparent substrate 25 (array substrate 200) via the conduction portion 31. The structure of the first metal wiring 29 and the structure of the conduction portion 31 are the same as those shown in FIG. 9A. As a voltage for the touch sensing drive of the transparent conductive wiring 7 supplied to the fixed potential, the driving voltage is supplied to the first metal wiring 29 electrically connected to the black electrode pattern 60 via the conduction portion 31. In this configuration, the second indium-containing layer 4 of the black electrode pattern 60 is sandwiched between the copper-containing layer 3 and the conductive portion 31. In this case, the second indium-containing layer 4 improves the electrical connectivity between the copper-containing layer 3 and the conductive portion 31. Therefore, electrical contact between the first metal wiring 29 and the copper-containing layer 3 can be easily achieved.

In the liquid crystal display device 500 having the above configuration, the liquid crystal driving and the touch sensing driving are controlled by the control unit 120. When the sensing drive is touched, the black electrode pattern 60 is applied as a driving electrode, and the transparent conductive wiring 7 is applied to the detecting electrode of a fixed potential, so that the driving condition of the touch sensing and the driving condition of the liquid crystal layer 20 can be made ( Frequency or voltage, etc.) is different. The driving frequency of the touch sensing is different from the driving frequency of the liquid crystal, and it is difficult to be affected by the driving, respectively. For example, the driving frequency of the touch sensing can be several KHz to several tens of KHz, and the frequency of the liquid crystal driving is 60 Hz to 240 Hz. Furthermore, it is also possible to make the touch sensing drive and the liquid crystal driving time-sharing. In the case where the black wiring 6 is used as the driving electrode (the touch sensing drive scan electrode), the scanning frequency of the capacitance detection can be arbitrarily adjusted in accordance with the required speed of the touch input. Alternatively, in terms of touch sensing driving, the transparent conductive wiring 7 may be acted as a driving electrode, and the black electrode pattern 60 may function as a detecting electrode. In this case, the transparent conductive wiring 7 is a drive electrode (scanning electrode) that applies a voltage of a constant frequency. Further, in terms of touch sensing driving and liquid crystal driving, the voltage (AC signal) applied to the driving electrodes may be an inversion driving method in which the positive and negative voltages are inverted. The touch sensing and liquid crystal driving may be time-sharing or not time-sharing.

Alternatively, regarding the touch sensing voltage, by reducing the voltage amplitude (peak to peak) of the applied AC signal, the influence of the touch sensing driving voltage on the liquid crystal display can be alleviated.

According to the liquid crystal display device 500 of the present embodiment, the black wiring pattern 60 of the black electrode pattern 60 has the first black layer 1, the first indium containing layer 2, the copper containing layer 3, the second indium containing layer 4, and the second black. The layered structure formed by the layer 5. Therefore, the first indium layer 2 can be utilized to increase the first black The adhesion between the layer 1 and the copper-containing layer 3 can improve the adhesion between the copper-containing layer 3 and the second black layer 5 by the second indium-containing layer 4. Therefore, the copper-containing layer 3 can be prevented from being peeled off from the first black layer 1, and the second black layer 5 can be prevented from being peeled off from the copper-containing layer 3. Furthermore, since the copper-containing layer 3 is sandwiched between the first indium-containing layer 2 and the second indium-containing layer 4, the electrical connection between the electrode or terminal connected to the copper-containing layer 3 and the copper-containing layer 3 can be made. Sexual improvement. In particular, since the second indium-containing layer 4 laminated on the copper-containing layer 3 is exposed at the terminal portion 11, the electrical connectivity between the conductive portion 31 and the copper-containing layer 3 can be improved.

Further, in the black electrode pattern 60, the black wiring 6 extends in the X direction and the Y direction, and the black wiring 6 extending in the X direction and the black wiring 6 extending in the Y direction are connected to form a lattice pattern. Therefore, when the pressing force is applied to the first surface 15a that touches the sensing input surface, the force transmitted to the black wiring 6 is dispersed in the X direction and the Y direction which are the directions in which the plurality of black wirings 6 extend along the lattice pattern. . Thus, the black wiring 6 has a two-dimensional lattice pattern, and the strength against the pressing force applied to the first surface 15a is improved. Therefore, not only the high adhesion preventing the copper-containing layer 3 from being peeled off from the first black layer 1 and the second black layer 5 but also the black wiring 6 having high mechanical strength is obtained from the viewpoint of stress dispersion. That is, since the black wiring 6 has a two-dimensional lattice pattern, the effect of preventing the copper-containing layer 3 from peeling off the first black layer 1 and the second black layer 5 can be obtained in multiples.

Further, since the first surface 15a of the black electrode substrate 100 functions as a touch sensing input surface, it is located on the surface side of the liquid crystal display device 500 to form a display surface. Therefore, when the liquid crystal display device 500 is used, the pressing force of the first surface 15a is given along with the user's touch input. Due to the generation of pressing force, stress is generated in the transparent substrate 15, and the internal stress is generated. The first surface 15a is transferred to the second surface 15b in the transparent substrate 15 to reach the second surface 15b. The force due to the stress transmitted in the transparent substrate 15 is given to the black wiring 6 provided on the second surface 15b.

Further, when the user does not use the liquid crystal display device 500, the liquid crystal display device 500 is often stored in, for example, the inside of a pocket provided on the user's clothes or inside the bag carried by the user. In this case, a force from an unintentional external force is applied to the first surface 15a of the black electrode substrate 100, and as a result, it is considered that an unintended external force is given to the black wiring 6. Furthermore, the case where the black electrode substrate 100 is bent is also considered. In other words, the black electrode substrate 100 can be said to be the member most apt to receive a force from the outside among the members constituting the liquid crystal display device 500.

On the other hand, even if the liquid crystal display device 500 is exposed to the use environment or the storage environment as described above, since the adhesion of the copper-containing layer 3 to the first black layer 1 and the second black layer 5 is improved by the indium-containing layer, Peeling of the copper-containing layer 3 can be prevented. Further, the indium-containing layer can improve the electrical connectivity between the conductive portion 31 and the copper-containing layer 3. Since the black wiring 6 having a two-dimensional lattice pattern is used to obtain high strength, the effect of preventing the copper-containing layer 3 from peeling off the first black layer 1 and the second black layer 5 can be obtained in multiples. That is, the resistance of the black electrode substrate 100 and the liquid crystal display device 500 to external force can be improved.

[Fourth embodiment]

(horizontal electric field type liquid crystal display device)

Next, a liquid crystal display device according to a fourth embodiment of the present invention will be described with reference to Fig. 11. In the fourth embodiment, the same members as those in the first to third embodiments are denoted by the same reference numerals, and their description will be omitted or simplified.

As shown in FIG. 11, the liquid crystal display device 600 of the present embodiment includes a black electrode substrate 100, an array substrate 300 on which an active device is placed, and a liquid crystal layer 620 sandwiched between the substrates 100 and 300 to form a liquid crystal cell. The first surface 15a of the black electrode substrate 100 that functions to touch the sensing input surface is located on the surface side of the liquid crystal display device 600 to form a display surface.

The array substrate 300 includes an active device (TFT) for driving a liquid crystal, a pixel electrode 324 for driving liquid crystal, a common electrode 332, and an insulating layer provided between the pixel electrode 324 and the common electrode 332. The common electrode 332 is an electrode for liquid crystal driving, and functions as a touch sensing electrode (touch sensing wiring). The common electrode 332 extends in parallel with the gate line (metal wiring) constituting the active element.

The liquid crystal of the liquid crystal layer 620 is horizontally aligned to the surface of the transparent substrate 25 at the initial alignment. The driving of the liquid crystal is controlled by the active element to be driven by an edge electric field generated between the pixel electrode 324 and the common electrode 332. This liquid crystal driving method is called FFS (fringe field switching) or IPS (in plane switching). The common electrode 332 has an opening having substantially the same width as the pixel opening portion 8 in plan view, and has a line shape extending in the X direction orthogonal to the extending direction (Y direction) of the black electrode pattern 60. About a certain electrostatic capacitance C6 for touch sensing is formed between the black electrode pattern 60 and the common electrode 332.

Unlike the third embodiment, the transparent conductive wiring 7 may not be formed on the black electrode substrate 100. In the configuration shown in Fig. 11, the liquid crystal driving and the touch sensing driving of the common electrode 332 are performed in a time division manner. The control of the liquid crystal drive and the touch sensing drive is performed by the control unit 120 shown in FIG. The common electrode 332 is formed of a transparent conductive film such as ITO. In Fig. 11, illustrations of liquid crystal driven active elements, auxiliary capacitors, alignment films, optical films, coverslips, and the like are omitted.

In the fourth embodiment, the same effects as those of the third embodiment can be obtained.

[Fifth Embodiment]

(horizontal electric field type liquid crystal display device)

Next, a liquid crystal display device according to a fifth embodiment of the present invention will be described with reference to FIG. In the fifth embodiment, the same members as those in the first to fourth embodiments are denoted by the same reference numerals, and their description will be omitted or simplified.

As shown in Fig. 12, the liquid crystal display device 700 of the present embodiment includes a black electrode substrate 100, an array substrate 400 on which an active device is placed, and a liquid crystal layer 720 sandwiched between the substrates 100 and 400 to form a liquid crystal cell. The first surface 15a of the black electrode substrate 100 that functions to touch the sensing input surface is located on the surface side of the liquid crystal display device 700 to form a display surface.

The array substrate 400 includes an active device (TFT) for driving a liquid crystal, a pixel electrode 424 for driving a liquid crystal, a common electrode 432, a touch sensing wiring 439, and an insulating layer provided between the pixel electrode 424 and the common electrode 432. An insulating layer between the common electrode 432 and the touch sensing wiring 439. The common electrode 432 functions as an electrode for liquid crystal driving. The touch sensing wiring 439 extends in parallel with the gate line constituting the active element, and functions as a touch sensing electrode used for the touch sensing drive, and has an extending direction extending in the black electrode pattern 60 (Y direction) ) orthogonal line shapes in the X direction. The touch sensing wiring 439 has a configuration in which a copper-containing layer containing at least copper and two indium-containing layers sandwiching a copper-containing layer and containing indium are laminated.

The liquid crystal of the liquid crystal layer 720 is horizontally aligned to the surface of the transparent substrate 25 at the initial alignment. The driving of the liquid crystal is controlled by the active element to be driven by an edge electric field generated between the pixel electrode 424 and the common electrode 432. This liquid crystal driving method is called FFS (fringe field switching) or IPS (in plane switching). The common electrode 432 has an opening having a width substantially the same as that of the pixel opening portion 8 in plan view. An electrostatic capacitance C7 for a certain touch sensing is formed between the black electrode pattern 60 and the touch sensing wiring 439.

Unlike the third embodiment, the transparent conductive wiring 7 may not be formed on the black electrode substrate 100. In the configuration shown in FIG. 12, the driving of the liquid crystal driving of the common electrode 432 and the touch sensing touch wiring 439 may not be performed in a time division manner. Further, the frequency of the signal for driving the touch sensing wiring 439 can be made different from the frequency of the liquid crystal driving signal. The common electrode 432 is formed of a transparent conductive film such as ITO. The touch sensing wiring 439 is a metal wiring formed of the same metal material as the gate line and formed in the same process as the process of forming the gate line. The touch sensing wiring 439 is electrically independent of the metal wiring constituting the active element. In terms of the touch sensing function, the touch sensing wiring 439 can be used as a driving electrode or a detecting electrode. The control of the liquid crystal drive and the touch sensing drive is performed by the control unit 120 shown in FIG. In Fig. 12, illustration of a liquid crystal driven active device, an auxiliary capacitor, an alignment film, an optical film, a cover glass, and the like is omitted.

Also in the fifth embodiment, the same effects as those of the third embodiment can be obtained.

[Sixth embodiment]

(Liquid crystal display device with light shielding layer)

Next, a liquid crystal display device according to a sixth embodiment of the present invention will be described with reference to Figs. 13A to 13C. In the sixth embodiment, the same members as those in the first to fifth embodiments are denoted by the same reference numerals, and their description is omitted or simplified.

Fig. 13A is a partial plan view showing an array substrate 450 constituting a liquid crystal display device according to an embodiment of the present invention. Fig. 13B is a partial cross-sectional view taken along line C-C' shown in Fig. 13A. Fig. 13C is a partial cross-sectional view showing the array substrate 450 constituting the display device according to the embodiment of the present invention. In FIGS. 13A to 13C, illustration of a common electrode, a storage capacitor, an alignment film, an optical film, a cover glass, and the like for driving the liquid crystal is omitted.

As shown in FIG. 13C, the liquid crystal display device 800 of the present embodiment includes a black electrode substrate 100, an array substrate 450 on which an active device is placed, and a liquid crystal layer 820 sandwiched between the substrates 100 and 450 to form a liquid crystal cell. The first surface 15a of the black electrode substrate 100 that functions to touch the sensing input surface is located on the surface side of the liquid crystal display device 800 to form a display surface.

As shown in FIGS. 13A and 13B, the array substrate 450 includes a gate line 471 extending in the X direction, a gate electrode 478 connected to the gate line 471, a source line 475 extending in the Y direction, and an active element 476. The touch sensing electrode 472 (touch sensing wiring), the light shielding layer 473, and the like are touched. As shown in FIG. 13C, the touch sensing electrode 472 is electrically independent of the gate line 471, and is disposed in parallel with the gate line 471 in a plan view and overlaps the gate line 471 via the insulating layers 483, 484, and 485. . Further, the touch sensing electrodes 472 and the light shielding layer 473 are located in the same layer, and are formed in the same process using the same metal material.

The configuration of the touch sensing electrode 472 or the metal material forming the touch sensing electrode 472 is not limited. For example, a single layer or a plurality of laminated layers containing a high melting point metal such as titanium or molybdenum, aluminum or an aluminum alloy, a titanium/copper/titanium three-layer structure, and an indium-containing layer/copper alloy/indium-containing layer three-layer structure may be exemplified. Or a material that forms this configuration. Further, in order to improve visibility, a black layer may be formed on the touch sensing electrode 472. An insulating layer such as hafnium oxide or hafnium oxynitride may be formed on the touch sensing electrode 472 and the light shielding layer 473. In order to reduce electrical noise, the touch sensing electrode 472 is preferably formed in a simple shape such as a line shape. However, in order to improve the light blocking property, a pattern shape in which the touch sensing electrode 472 and the light shielding layer 473 are connected may be employed. The touch sensing electrode 472 extending in the X direction and the black electrode pattern 60 extending in the Y direction are orthogonal to each other in plan view. The touch sensing electrode 472 acts as a touch sensing electrode. At the time of touch sensing, the thinning drive can be performed as described in the above embodiment. Specifically, in the configuration in which the plurality of touch sensing electrodes 472 are disposed on the array substrate 450, for example, six touch sensing electrodes are defined as one group, and a plurality of touch sensing are set on the array substrate 450. Electrode group. Then, 5 of the 6 touch sensing electrodes are thinned out (removed), and the scanning signal is transmitted to one touch sensing electrode. By this driving method, the touch sensing electrode can be thinned and driven (scanned). In this case, the five touch sensing electrodes that have been removed (poorized) become electrically floating (floating).

As shown in FIG. 13B, the liquid crystal driven pixel electrode 474 is electrically connected to the gate electrode constituting the active element 476 via the contact hole.

In FIGS. 13B and 13C, although the pixel electrode 474 is connected to the drain electrode via the light shielding layer 473, the light shielding layer 473 and the drain electrode are The connection structure is not limited to the structure shown in this embodiment. The channel layer (semiconductor layer) constituting the active element 476 is covered with a light shielding layer 473 and shielded from light.

The electrostatic capacitance C8 at the time of the touch sensing is generated between the black wiring 6 and the touch sensing electrode 472 included in the black electrode substrate 100. For example, the touch sensing electrode 472 can be made to act as a driving electrode, and the black wiring 6 can be made to function as a detecting electrode. When the finger or the indicator touches or approaches the first surface 15a of the touch sensing input surface, the electrostatic capacitance changes, and the black wiring 6 detects the change, and determines whether there is a touch input. Further, the touch sensing electrode 472 may be acted as a detecting electrode to cause the black wiring 6 to function as a driving electrode.

The material forming the channel layer constituting the active element 476 may be an oxide semiconductor or a polycrystalline germanium semiconductor. In the present embodiment, since the light shielding layer 473 shields the backlight or the external light, various active elements can be used for the liquid crystal display device 800. The display device according to the embodiment of the present invention can also be applied to an HMD (Head Mounted Display), a liquid crystal projector, or the like.

Also in the sixth embodiment, the same effects as those of the third embodiment can be obtained.

[Seventh embodiment]

(Manufacturing method of black electrode substrate)

Next, a method of manufacturing a black electrode substrate according to a seventh embodiment of the present invention will be described with reference to Figs. 3 and 14A to 15 .

14A to 14C are cross-sectional views partially showing a manufacturing process of the black electrode substrate according to the embodiment of the present invention. Figure 15 is a flow chart showing the manufacturing process of the black electrode substrate. In the present embodiment, the black electrode substrate described in the first embodiment is formed in black. A process of further forming a pattern of a transparent resin layer on the electrode substrate will be described. Further, after the black electrode pattern 60 including the black wiring 6 is formed, a color layer pattern is formed on the pixel opening portion 8 so that the red layer, the green layer, and the blue layer are disposed on the pixel opening portion 8, and a transparent resin is further formed. Floor.

First, as shown in Fig. 14A, the transparent substrate 15 is prepared. The transparent substrate 15 has a first surface 15a that functions to touch the sensing input surface, a second surface 15b that is opposite to the first surface 15a, a rectangular display area 15c that is defined on the second surface 15b, and is defined in The outer side region 15d on the second surface 15b and outside the display region 15c. A black electrode pattern 60 defined by the black wiring 6 is formed on the transparent substrate 15.

Here, a method of forming the black electrode pattern 60 will be described with reference to FIG.

First, a black coating liquid containing carbon as a main color material is applied onto the transparent substrate 15 to form a hard film to form a first black overall film (step S1). Thereafter, a first indium-containing comprehensive film containing indium is formed on the first black overall film, a copper-containing comprehensive film containing copper is formed on the first indium-containing comprehensive film, and a second containing indium is formed on the copper-containing comprehensive film. A comprehensive film containing indium (step S2). Specifically, the laminated body of the above three comprehensive films is laminated on the first black overall film by continuous film formation using a vacuum film forming apparatus. Next, a second black overall film is formed on the second indium-containing composite film by using an alkali developable photosensitive black coating liquid (coating liquid containing carbon as a main color material) (step S3). As the black coating liquid, for example, a well-known acrylic photosensitive black coating liquid can be applied as a black matrix material. The color material used to form the black layer of the black electrode is preferably mainly carbon. In order to adjust The organic pigment is added in a small amount to the photosensitive black coating liquid in a small amount of the reflection color generated from the black layer. However, in many organic pigments, the metal is placed in the pigment construction. When a film containing such an organic pigment is etched in a few ways, contamination due to the metal sometimes occurs. Taking this into consideration, the formulation of the photosensitive black coating liquid was adjusted.

Thereafter, the second black overall film is exposed, developed, and hardened by a well-known photolithography method to form a patterned second black layer 5 (step S4). The patterned second black layer 5 has the same planar shape as the black electrode pattern 60 (the plurality of pixel openings 8, the black wiring 6, the terminal portion 11, the slit S, and the lead line) shown in FIG.

Next, the second black layer 5 having the above-described planar pattern is used as a mask, and the first black overall film, the first indium-containing overall film, the copper-containing comprehensive film, and the second indium-containing comprehensive film are wet-etched (step S5). Thereby, the black electrode pattern 60 defined by the black wiring 6 having the first black layer 1, the first indium-containing layer 2, the copper-containing layer 3, the second indium-containing layer 4, and the second is formed. A laminated structure composed of the black layer 5. At this time, the patterns of the second black layer 5, the first indium containing layer 2, the copper-containing layer 3, and the second indium-containing layer 4 are substantially the same.

Next, as shown in Fig. 14B, a transparent resin full-film comprising a transparent resin material is formed on the transparent substrate 15 so as to cover the second black layer 5 (step S6). In addition, by patterning the transparent resin overall film, a rectangular transparent resin layer 9 having the same size as the display region 15c in plan view is formed on the display region 15c (step S7). In other words, as shown in Fig. 3, the pattern of the transparent resin layer 9 is a pattern in which the region forming the terminal portion 11 required for electrical mounting is exposed, and has substantially the same size as the display region 15c.

Next, a part of the transparent resin layer 9 in the thickness direction (Z direction) (portion close to the surface of the transparent resin layer 9) and the second black layer 5 located in the outer region 15d are removed by dry etching using a fluorocarbon-based gas (step S8). In other words, a part of the transparent resin layer 9 and the second black layer 5 are simultaneously dry-etched, whereby the transparent resin layer 9 remains to have a predetermined thickness even if the second black layer 5 is removed. That is, the etching of the transparent resin layer 9 partially removing the display region 15c and the etching of the second black layer 5 exposed in the outer region 15d are completely removed. In consideration of the above dry etching, the transparent resin layer 9 before dry etching has a relatively thick film thickness. Thereby, as shown in FIG. 14C, the terminal portion 11 having the surface Me exposed by the second indium-containing layer 4 is formed on the outer region 15d (step S9).

In the process of removing a portion of the transparent resin layer 9 and the second black layer 5 in the thickness direction shown in the cross-sectional view of Fig. 14C, it is preferable to use a fluorocarbon-based gas such as CF ₄ or C ₃ F ₈ as a dry etching. gas. By using such a gas, the influence of the indium-containing layer or the copper-containing layer 3 is not imparted, and the second black layer 5 can be removed by etching. Further, argon or oxygen may be added to a gas such as CF ₄ or C ₃ F ₈ as needed. The pressure in the chamber into which the gas for the dry etching process is introduced, the flow rate or flow rate of the introduced gas, and the output or frequency of the high-frequency power for etching can be appropriately adjusted.

[Eighth Embodiment]

This embodiment is a modification of the terminal portion structure (Fig. 14C) displayed in the sixth embodiment. The eighth embodiment will be described with reference to Fig. 6, Fig. 7, and Fig. 16.

In the liquid crystal display device of the vertical electric field shown in the third embodiment, as shown in FIGS. 6 and 7, the transparent resin layer 9 is formed. The conductive wiring 7 is formed to extend in the X direction. When the transparent conductive wiring 7 is formed on the transparent resin layer 9, a conductive oxide such as ITO is used in advance on the surface (the second surface 15b) of the transparent substrate 15, and the terminal portion 11 of the outer region 15d is also used. Film formation is carried out. That is, in the process of forming the transparent conductive wiring 7, the ITO film is simultaneously formed on the terminal portion 11 of the outer region 15d. In this case, since ITO is a hard film equivalent to ceramics, the terminal portion 11 is less likely to be injured, and extremely stable electrical mounting can be performed on the terminal portion 11.

The display device according to the embodiment of the present invention can be used in various applications. For an electronic device to which the display device according to the embodiment of the present invention can be applied, a mobile phone, a portable game machine, a personal digital assistant, a personal computer, an e-book, a video camera, a digital camera, a head mounted display, and a navigation system can be held. , audio reproduction devices (car audio, digital audio players, etc.), copiers, fax machines, printing machines, printing and laminating machines, vending machines, automatic teller machines (ATM), personal authentication machines, optical communication equipment. Each of the above embodiments can be used in combination.

The preferred embodiments of the present invention have been described above, but such aspects are to be construed as illustrative only and not limiting. Additions, omissions, substitutions, and other changes can be made without departing from the scope of the invention. Accordingly, the invention is not to be limited by the foregoing description, but rather by the scope of the claims.

1‧‧‧ first black layer

2‧‧‧First indium containing layer

3‧‧‧Bronze layer

4‧‧‧Second indium containing layer

5‧‧‧ second black layer

6‧‧‧Black wiring

8‧‧‧pixel opening

9‧‧‧Transparent resin layer

11‧‧‧ Terminals

15‧‧‧Transparent substrate

15a‧‧‧ first side

15b‧‧‧ second side

15c‧‧‧Display area

15d‧‧‧Outer area

60‧‧‧Black electrode pattern

60a‧‧‧First black electrode pattern

60b‧‧‧second black electrode pattern

100‧‧‧Black electrode substrate

D‧‧‧Looking out of the rectangular display area 15c

B‧‧‧Blue layer

R‧‧‧ red layer

G‧‧‧Green layer

S‧‧ slit

X‧‧‧ first direction

Y‧‧‧second direction

Z‧‧‧ layering direction

Claims (16)

A black electrode substrate comprising: a transparent substrate having a first surface that functions to touch the sensing input surface; a second surface that is opposite to the first surface; and a rectangular shape that is defined on the second surface a display area and an outer area defined on the second surface and outside the display area; the first black layer is disposed on the display area and the outer area of the second surface, and contains carbon as a main a coloring material; a first indium-containing layer disposed on the first black layer and containing indium; a copper-containing layer disposed on the first indium-containing layer and containing copper; and a second indium-containing layer Provided on the copper-containing layer, comprising indium; a second black layer disposed on the second indium-containing layer, containing carbon as a main color material; and a black electrode pattern having the first black layer a black wiring having a laminated structure including the first indium containing layer, the copper-containing layer, the second indium-containing layer, and the second black layer, wherein a plurality of pixel openings are formed in the display region. Located on the aforementioned outer area The laminated structure of the black wiring includes a terminal portion in which the second indium-containing layer is exposed, and a rectangular transparent resin layer which is provided on the display region so as to overlap the black electrode pattern, and has a plan view. The same size as the aforementioned display area. The black electrode substrate of claim 1, wherein in the aforementioned laminated structure of the black wiring, The line width of the first black layer, the line width of the first indium-containing layer, the line width of the copper-containing layer, the line width of the second indium-containing layer, and the line width of the second black layer are the same. The black electrode substrate of claim 1, wherein the first indium-containing layer and the second indium-containing layer are alloy layers containing copper and indium. The black electrode substrate of claim 1, wherein the first indium-containing layer and the second indium-containing layer are metal oxide layers containing indium oxide as a main material. The black electrode substrate of claim 1, wherein the first indium-containing layer and the second indium-containing layer are metal oxide layers containing a mixed oxide of indium oxide and tin oxide. The black electrode substrate of claim 1, wherein at least a red layer, a green layer, and a blue layer are disposed in each of the pixel opening portions of the plurality of pixel openings; and the red layer, the green layer, and the blue layer are covered The aforementioned transparent resin layer is formed. A method for manufacturing a black electrode substrate, comprising: preparing a transparent substrate having a first surface that functions as a touch sensing input surface and a second surface opposite to the first surface, and is defined in the second a rectangular display surface in plan view, and an outer region defined on the second surface and located outside the display region; and a first black overall film containing carbon as a main color material is formed on the transparent substrate; Forming the first indium containing indium on the first black overall film a comprehensive film; forming a copper-containing comprehensive film containing copper on the first indium-containing comprehensive film; forming a second indium-containing comprehensive film containing indium on the copper-containing comprehensive film; forming a content on the second indium-containing comprehensive film a second black overall film having carbon as a main color material; forming a second black layer by patterning the second black overall film; and etching the first black overall film by using the second black layer as a mask The first indium-containing comprehensive film, the copper-containing comprehensive film, and the second indium-containing comprehensive film form a black electrode pattern defined by black wiring, wherein the black wiring has a first black layer and a first indium layer a laminated structure including a copper-containing layer, a second indium-containing layer, and a second black layer; and a rectangular transparent resin layer having the same size as the display region in plan view is formed in the above-described outer region. In the display region, the portion of the transparent resin layer in the thickness direction and the second black layer located in the outer region are removed by dry etching using a fluorocarbon-based gas. Indium-containing layer is exposed terminal portion is formed on the outer region. A display device comprising the black electrode substrate of claim 1. A display device comprising: a black electrode substrate as claimed in claim 1; a transparent conductive wiring laminated on the transparent resin layer of the black electrode substrate to be orthogonal to the black wiring in plan view, and an array substrate having a plurality of pixels adjacent to the plurality of pixels in plan view An active element at a position of each pixel opening of the opening and a metal wiring electrically connected to the active element; a liquid crystal layer disposed between the transparent conductive wiring and the array substrate; and a control unit A touch sensing function for detecting a change in electrostatic capacitance occurring between the black wiring and the transparent conductive wiring is provided. A display device comprising: a black electrode substrate according to claim 1; and an array substrate including an active element disposed at a position adjacent to each pixel opening of the plurality of pixel openings in a plan view, and the foregoing a metal wiring electrically connected to the active device, and a touch sensing wiring for touch sensing; a liquid crystal layer disposed between the black electrode substrate and the array substrate; and a control unit having a detection occurrence A touch sensing function of a change in electrostatic capacitance between the black wiring and the touch sensing wiring. A display device comprising: a black electrode substrate according to claim 1; and an array substrate provided in a plan view adjacent to the foregoing An active element at a position of each pixel opening of the plurality of pixel openings, a metal wiring electrically connected to the active element, and a common electrode forming a capacitance to the black wiring; and a liquid crystal layer disposed on the black electrode The substrate and the array substrate; and a control unit having a touch sensing function for detecting a change in electrostatic capacitance occurring between the black wiring and the common electrode. A display device comprising: a black electrode substrate according to claim 1; and an array substrate including an active element disposed at a position adjacent to each pixel opening of the plurality of pixel openings in a plan view, and the foregoing a gate line electrically connected to the active device, a touch sensing wiring for electrically sensing the parallel and extending parallel to the gate line, and a metal covering the active element and having the same contact with the touch sensing wiring a light shielding layer formed by a layer; a liquid crystal layer disposed between the black electrode substrate and the array substrate; and a control unit configured to detect a change in electrostatic capacitance occurring between the black wiring and the touch sensing wiring Touch sensing function. The display device according to any one of claims 8 to 12, wherein at least a red layer, a green layer and a blue layer are disposed in each pixel opening portion of the plurality of pixel openings to cover the red layer, the green layer, and The transparent resin layer is formed in the form of the blue layer. The display device according to any one of claims 9 to 11, wherein the metal wiring has a configuration in which a copper-containing layer containing at least copper and a second indium-containing layer sandwiching the copper-containing layer and containing indium are laminated. The display device of claim 10 or 12, wherein the touch sensing wiring has a configuration in which a copper-containing layer containing at least copper and a second indium-containing layer sandwiching the copper-containing layer and containing indium are laminated. The display device according to any one of claims 10 to 12, wherein the active element is a transistor having a channel layer, the channel layer comprising two selected from the group consisting of gallium, indium, zinc, tin, and antimony. More than one type of metal oxide.