TW201606037A - Enhanced pressure sensitive adhesive for thermal management applications - Google Patents

Enhanced pressure sensitive adhesive for thermal management applications Download PDF

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TW201606037A
TW201606037A TW104115794A TW104115794A TW201606037A TW 201606037 A TW201606037 A TW 201606037A TW 104115794 A TW104115794 A TW 104115794A TW 104115794 A TW104115794 A TW 104115794A TW 201606037 A TW201606037 A TW 201606037A
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film
filler
thickness
graphite
weight
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史考特T 亞倫
曹新培
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漢高智慧財產控股公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08Homopolymers or copolymers of acrylic acid esters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/005Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
    • B32B9/007Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile comprising carbon, e.g. graphite, composite carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3737Organic materials with or without a thermoconductive filler
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/102Oxide or hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/104Oxysalt, e.g. carbonate, sulfate, phosphate or nitrate particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/107Ceramic
    • B32B2264/108Carbon, e.g. graphite particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • B32B2307/302Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2405/00Adhesive articles, e.g. adhesive tapes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
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    • C08K2003/2227Oxides; Hydroxides of metals of aluminium
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    • C08K3/00Use of inorganic substances as compounding ingredients
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    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2296Oxides; Hydroxides of metals of zinc
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
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    • C09J2433/00Presence of (meth)acrylic polymer
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    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
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    • H01L23/00Details of semiconductor or other solid state devices
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    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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Abstract

An enhanced pressure sensitive adhesive film includes a filler dispersed within an acrylic polymer matrix. The filler has an average particle size less than the thickness of the pressure sensitive adhesive layer, and is selected from graphite, boron nitride, aluminum oxide and zinc oxide.

Description

用於熱管理應用之增強的壓敏黏著劑 Enhanced pressure sensitive adhesive for thermal management applications

本文提供用於熱管理應用之增強的壓敏黏著劑薄膜。 Provided herein are enhanced pressure sensitive adhesive films for thermal management applications.

人們熟知用於耗散由裝置內之電子組件生成之熱之熱管理材料。已知習用壓敏黏著劑(PSA)(例如基於丙烯酸之PSA)提供將散熱材料附接至電子組件之手段。然而,通常避免基於丙烯酸之PSA,乃因跨越丙烯酸基質之導熱性較差。儘管導熱PSA市面有售,但其通常具有75μm至150μm之厚度以便填充膠合線間之任何表面空隙或間隙。該等導熱PSA不適於具有有限空間且要求改良之熱管理解決方法之愈來愈小的電子裝置。同樣,用於電子裝置之熱解決方法已避免具有習用PSA之層壓散熱材料。 Thermal management materials for dissipating heat generated by electronic components within the device are well known. Conventional pressure sensitive adhesives (PSAs), such as acrylic based PSAs, are known to provide a means of attaching a heat dissipating material to an electronic component. However, acrylic based PSA is generally avoided because of the poor thermal conductivity across the acrylic substrate. Although thermally conductive PSA is commercially available, it typically has a thickness of from 75 [mu]m to 150 [mu]m to fill any surface voids or gaps between the glue lines. These thermally conductive PSAs are not suitable for increasingly smaller electronic devices that have limited space and require improved thermal management solutions. Also, thermal solutions for electronic devices have avoided laminated heat sink materials with conventional PSAs.

儘管一些PSA對於愈來愈小的電子裝置而言係導電的,但其未針對熱管理進行最佳設計。舉例而言,市售導電PSA薄膜通常未高度填充,且填充劑粒子跨越薄膜之厚度。儘管該等導電PSA經設計以使z-方向上之電傳導最大化,但該等PSA並未針對熱管理進行最佳化。 Although some PSAs are electrically conductive to ever smaller electronic devices, they are not optimally designed for thermal management. For example, commercially available conductive PSA films are typically not highly filled and the filler particles span the thickness of the film. Although the conductive PSAs are designed to maximize electrical conduction in the z-direction, the PSAs are not optimized for thermal management.

石墨散熱材料提供具有高導熱性之薄、撓性、輕質薄膜以與PSA結合使用。大多數精力集中於熱改良所研發之獨特性新散熱薄膜難以製造、昂貴、限於某些散熱材料。其他熱解決方法均集中於軟體及再設計裝置。 The graphite heat sink provides a thin, flexible, lightweight film with high thermal conductivity for use with PSA. Most of the focus is on the uniqueness of thermal reforms. New heat-dissipating films are difficult to manufacture, expensive, and limited to certain heat-dissipating materials. Other thermal solutions focus on software and redesign devices.

業內需要克服PSA用於電子裝置中之熱管理之缺點及侷限性。本發明滿足此需要。 There is a need in the industry to overcome the shortcomings and limitations of PSA for thermal management in electronic devices. The present invention satisfies this need.

本發明之一個態樣係關於包括分散於丙烯酸系聚合物基質內之填充劑之壓敏黏著劑薄膜,且填充劑具有小於壓敏黏著劑薄膜之厚度之平均粒度。填充劑係選自由以下組成之群:石墨、氮化硼、氧化鋁及氧化鋅。在PSA薄膜之一個實施例中,PSA薄膜之厚度小於15μm,且填充劑包含5重量%至95重量%之PSA薄膜。在另一實施例中,PSA薄膜之厚度小於10μm,且填充劑包含10重量%至80重量%之薄膜。在另一實施例中,填充劑係石墨且PSA薄膜具有介於1W/mK至3W/mK之間之導熱率。 One aspect of the present invention relates to a pressure-sensitive adhesive film comprising a filler dispersed in an acrylic polymer matrix, and the filler has an average particle size smaller than the thickness of the pressure-sensitive adhesive film. The filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide. In one embodiment of the PSA film, the PSA film has a thickness of less than 15 [mu]m and the filler comprises from 5% to 95% by weight of the PSA film. In another embodiment, the PSA film has a thickness of less than 10 [mu]m and the filler comprises from 10% to 80% by weight of the film. In another embodiment, the filler is graphite and the PSA film has a thermal conductivity between 1 W/mK and 3 W/mK.

在另一態樣中,本發明係關於散熱層壓板,其包括兩個或更多個散熱層及置於散熱層之間之PSA薄膜。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑。填充劑具有小於薄膜之厚度之平均粒度,且填充劑係選自由以下組成之群:石墨、氮化硼、氧化鋁及氧化鋅。在層壓板之一個實施例中,PSA薄膜之厚度小於15μm且填充劑佔PSA層之5重量%至95重量%。在層壓板之另一實施例中,薄膜之厚度小於10μm且填充劑佔薄膜之10重量%至80重量%。在層壓板之再一實施例中,填充劑係石墨且PSA薄膜具有介於1W/mK至3W/mK之間之導熱率。在層壓板之另一實施例中,散熱層係選自合成石墨、天然石墨、鋁及銅箔。在層壓板之再一實施例中,散熱層包含具有介於5μm至25μm之間之厚度之合成石墨。 In another aspect, the invention is directed to a heat dissipating laminate comprising two or more heat dissipating layers and a PSA film disposed between the heat dissipating layers. The PSA film comprises a filler dispersed in an acrylic polymer matrix. The filler has an average particle size less than the thickness of the film, and the filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide. In one embodiment of the laminate, the PSA film has a thickness of less than 15 [mu]m and the filler comprises from 5% to 95% by weight of the PSA layer. In another embodiment of the laminate, the film has a thickness of less than 10 [mu]m and the filler comprises from 10% to 80% by weight of the film. In still another embodiment of the laminate, the filler is graphite and the PSA film has a thermal conductivity of between 1 W/mK and 3 W/mK. In another embodiment of the laminate, the heat dissipation layer is selected from the group consisting of synthetic graphite, natural graphite, aluminum, and copper foil. In still another embodiment of the laminate, the heat dissipation layer comprises synthetic graphite having a thickness of between 5 μm and 25 μm.

本發明之另一態樣包括製備壓敏黏著劑薄膜之方法,其包括提供釋放襯墊;及將壓敏黏著劑薄膜安置於釋放襯墊上。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑,填充劑具有小於薄膜之厚度之平均粒度,且其中填充劑係選自由以下組成之群:石墨、氮化硼、 氧化鋁及氧化鋅。在特定實施例中,薄膜之厚度小於15μm,且填充劑佔薄膜之5重量%至95重量%。 Another aspect of the invention includes a method of making a pressure sensitive adhesive film comprising providing a release liner; and placing a pressure sensitive adhesive film on the release liner. The PSA film comprises a filler dispersed in an acrylic polymer matrix, the filler having an average particle size smaller than the thickness of the film, and wherein the filler is selected from the group consisting of graphite, boron nitride, Alumina and zinc oxide. In a particular embodiment, the thickness of the film is less than 15 [mu]m and the filler comprises from 5% to 95% by weight of the film.

本發明之另一態樣係關於電子物件,其包括散熱材料、電子組件及壓敏黏著劑(PSA)薄膜。PSA薄膜係置於散熱材料與電子組件之間。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑,且填充劑具有小於PSA薄膜之厚度之平均粒度。填充劑係選自石墨、氮化硼、氧化鋁及氧化鋅。 Another aspect of the invention pertains to electronic articles comprising a heat dissipating material, an electronic component, and a pressure sensitive adhesive (PSA) film. The PSA film is placed between the heat sink material and the electronic components. The PSA film comprises a filler dispersed in an acrylic polymer matrix, and the filler has an average particle size smaller than the thickness of the PSA film. The filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide.

在電子物件之再一實施例中,散熱材料係選自由以下組成之群:合成石墨、天然石墨、鋁及銅箔。在電子物件之另一實施例中,散熱材料包含具有介於5μm至25μm之間之厚度之合成石墨。在電子物件之再一實施例中,電子組件係選自由以下組成之群之生熱組件:積體微晶片、微處理器、電晶體、二極體、繼電器、電阻器、變壓器、放大器、EMI屏蔽及電容器,且其中電子組件具有介於15℃至100℃之間之操作溫度。 In still another embodiment of the electronic article, the heat dissipating material is selected from the group consisting of synthetic graphite, natural graphite, aluminum, and copper foil. In another embodiment of the electronic article, the heat dissipating material comprises synthetic graphite having a thickness of between 5 μm and 25 μm. In still another embodiment of the electronic article, the electronic component is selected from the group consisting of: a bulk microchip, a microprocessor, a transistor, a diode, a relay, a resistor, a transformer, an amplifier, and an EMI Shielding and capacitors, and wherein the electronic components have an operating temperature of between 15 ° C and 100 ° C.

在另一態樣中,本發明係關於包括包括至少一個基板之外殼之電子物件。基板接近至少一個生熱電子組件。PSA薄膜係置於基板上。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑。填充劑具有小於PSA薄膜之厚度之平均粒度,且填充劑係選自石墨、氮化硼、氧化鋁及氧化鋅。 In another aspect, the invention is directed to an electronic article comprising a housing comprising at least one substrate. The substrate is proximate to at least one of the heat generating electronic components. The PSA film is placed on the substrate. The PSA film comprises a filler dispersed in an acrylic polymer matrix. The filler has an average particle size less than the thickness of the PSA film, and the filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide.

在電子物件之一個實施例中,PSA薄膜之厚度小於15μm且填充劑佔薄膜之5重量%至95重量%。在電子物件之另一實施例中,薄膜之厚度小於10μm且填充劑佔薄膜之10重量%至80重量%。在再一實施例中,填充劑係石墨且薄膜具有介於1W/mK至3W/mK之間之導熱性。在另一實施例中,電子物件進一步包括經安置與薄膜接觸之散熱材料,且散熱材料係選自由以下組成之群:合成石墨、天然石墨、鋁及銅箔。在另一實施例中,電子物件進一步包括經安置與PSA薄膜接 觸之散熱材料,且散熱材料包含具有介於5μm至25μm之間之厚度之合成石墨。在另一實施例中,電子組件係選自由以下組成之群:積體微晶片、微處理器、電晶體、二極體、繼電器、電阻器、變壓器、放大器、EMI屏蔽及電容器,且電子組件具有介於15℃至100℃之間之操作溫度。 In one embodiment of the electronic article, the PSA film has a thickness of less than 15 [mu]m and the filler comprises from 5% to 95% by weight of the film. In another embodiment of the electronic article, the thickness of the film is less than 10 [mu]m and the filler comprises from 10% to 80% by weight of the film. In still another embodiment, the filler is graphite and the film has a thermal conductivity of between 1 W/mK and 3 W/mK. In another embodiment, the electronic article further includes a heat dissipating material disposed in contact with the film, and the heat dissipating material is selected from the group consisting of: synthetic graphite, natural graphite, aluminum, and copper foil. In another embodiment, the electronic article further includes being placed in contact with the PSA film The heat dissipating material is touched, and the heat dissipating material comprises synthetic graphite having a thickness of between 5 μm and 25 μm. In another embodiment, the electronic component is selected from the group consisting of an integrated microchip, a microprocessor, a transistor, a diode, a relay, a resistor, a transformer, an amplifier, an EMI shield, and a capacitor, and an electronic component It has an operating temperature between 15 ° C and 100 ° C.

如上所述,本文提供增強的壓敏黏著劑(PSA)薄膜。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑,且填充劑具有小於PSA薄膜之厚度之平均粒度。在實施例中,PSA薄膜係置於散熱材料與電子組件之間。 As noted above, an enhanced pressure sensitive adhesive (PSA) film is provided herein. The PSA film comprises a filler dispersed in an acrylic polymer matrix, and the filler has an average particle size smaller than the thickness of the PSA film. In an embodiment, the PSA film is placed between the heat sink material and the electronic component.

本文亦提供包括包括至少一個基板之外殼之電子物件。基板接近至少一個生熱電子組件,且PSA薄膜係置於基板上。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑。填充劑具有小於PSA薄膜之厚度之平均粒度。 Also provided herein are electronic articles comprising a housing comprising at least one substrate. The substrate is adjacent to at least one of the heat generating electronic components, and the PSA film is placed on the substrate. The PSA film comprises a filler dispersed in an acrylic polymer matrix. The filler has an average particle size that is less than the thickness of the PSA film.

在再一態樣中,本發明係關於散熱層壓板,其包括兩個或更多個散熱層及置於散熱層之間之PSA薄膜。PSA薄膜包括分散於丙烯酸系聚合物基質內之填充劑。填充劑具有小於薄膜之厚度之平均粒度。 In still another aspect, the present invention is directed to a heat dissipating laminate comprising two or more heat dissipating layers and a PSA film disposed between the heat dissipating layers. The PSA film comprises a filler dispersed in an acrylic polymer matrix. The filler has an average particle size that is less than the thickness of the film.

PSA薄膜組成包含分散於PSA基質內之填充劑。填充劑可導熱且導電。或者,其可導熱且電絕緣。導熱填充劑可包含金屬填充劑、無機填充劑或其組合。 The PSA film composition comprises a filler dispersed in a PSA matrix. The filler can be thermally and electrically conductive. Alternatively, it can be thermally and electrically insulated. The thermally conductive filler may comprise a metal filler, an inorganic filler, or a combination thereof.

金屬填充劑包括金屬粒子及粒子表面上具有層之金屬粒子。該等層可為(例如)粒子表面上之金屬氮化物層或金屬氧化物層。適宜金屬填充劑係例如選自由鋁、銅、金、鎳、錫、銀及其組合組成之群之金屬之粒子。適宜金屬填充劑進一步例如在其表面上具有選自由以下 組成之群之層之上文所列示金屬之粒子:氮化鋁、氧化鋁、氮化硼、氧化鋅、氧化鎂、氧化銅、氧化鎳、氧化銀及其組合。舉例而言,金屬填充劑可包含在其表面上具有氧化鋁層之鋁粒子。 The metal filler includes metal particles and metal particles having a layer on the surface of the particles. The layers can be, for example, metal nitride layers or metal oxide layers on the surface of the particles. Suitable metal fillers are, for example, particles selected from the group consisting of aluminum, copper, gold, nickel, tin, silver, and combinations thereof. Suitable metal fillers further have, for example, on their surface selected from the following The particles of the metal listed above in the layer of the composition: aluminum nitride, aluminum oxide, boron nitride, zinc oxide, magnesium oxide, copper oxide, nickel oxide, silver oxide, and combinations thereof. For example, the metal filler may include aluminum particles having an aluminum oxide layer on the surface thereof.

無機填充劑係例如金屬氧化物,例如氧化鋁、氧化鈹、氧化鎂及氧化鋅;氮化物,例如氮化鋁及氮化硼;金剛石、天然石墨、合成石墨、單層石墨、碳黑、碳纖維、碳奈米管、石墨纖維、金剛石粉末、氮化硼奈米管及其組合。 Inorganic fillers are, for example, metal oxides such as alumina, cerium oxide, magnesium oxide and zinc oxide; nitrides such as aluminum nitride and boron nitride; diamond, natural graphite, synthetic graphite, single layer graphite, carbon black, carbon fiber , carbon nanotubes, graphite fibers, diamond powder, boron nitride nanotubes and combinations thereof.

導熱填充劑粒子之形狀沒有特別限制,然而,圓形或球形粒子可防止黏度於在組合物中載入高含量導熱填充劑後增加至不合意值。導熱填充劑之平均粒度將取決於各種因素,包括選擇用於PSA之導熱填充劑之類型及添加至可固化組合物中之確切量,以及將使用組合物之固化產物之電子組件及/或散熱材料間之PSA之膠合線厚度。 The shape of the thermally conductive filler particles is not particularly limited, however, the circular or spherical particles prevent the viscosity from increasing to an undesired value after loading a high content of the thermally conductive filler in the composition. The average particle size of the thermally conductive filler will depend on various factors, including the type of thermally conductive filler selected for the PSA and the exact amount added to the curable composition, as well as the electronic components and/or heat sinks that will use the cured product of the composition. Glue line thickness of PSA between materials.

填充劑可具有小於壓敏黏著劑層之厚度之平均粒度。在一實施例中,將填充劑分散於小於15微米厚之PSA薄膜中,且填充劑具有小於PSA薄膜之厚度之平均粒度。在另一實施例中,將填充劑分散於小於10微米厚之PSA薄膜中,且填充劑具有小於PSA薄膜之厚度之平均粒度。 The filler may have an average particle size that is less than the thickness of the pressure sensitive adhesive layer. In one embodiment, the filler is dispersed in a PSA film that is less than 15 microns thick and the filler has an average particle size that is less than the thickness of the PSA film. In another embodiment, the filler is dispersed in a PSA film that is less than 10 microns thick and the filler has an average particle size that is less than the thickness of the PSA film.

導熱填充劑可為單一導熱填充劑或兩種或更多種導熱填充劑之組合,該兩種或更多種導熱填充劑在至少一個諸如粒子形狀、平均粒度、粒度分佈及填充劑類型等性質方面有所不同。在實施例中,金屬與無機填充劑之組合可提供增加之導熱性。 The thermally conductive filler may be a single thermally conductive filler or a combination of two or more thermally conductive fillers in at least one such as particle shape, average particle size, particle size distribution, and filler type. The aspects are different. In an embodiment, the combination of metal and inorganic filler provides increased thermal conductivity.

在實施例中,可使用大小不同的導熱填充劑材料,舉例而言,具有較大平均粒度之石墨與具有較小平均粒度之石墨之組合。另一選擇為,可期望使用金屬填充劑之組合,例如具有較大平均粒度之氮化硼與具有較小平均粒度之石墨。使用具有較大平均粒度之第一填充劑及平均粒度小於該第一填充劑之第二填充劑可改良包裝效率,可減小 黏度,且可增強熱轉移。 In embodiments, thermally conductive filler materials of different sizes may be used, for example, a combination of graphite having a larger average particle size and graphite having a smaller average particle size. Alternatively, it may be desirable to use a combination of metal fillers, such as boron nitride having a larger average particle size and graphite having a smaller average particle size. Using a first filler having a larger average particle size and a second filler having an average particle size smaller than the first filler can improve packaging efficiency and can be reduced Viscosity and enhanced heat transfer.

PSA組合物中之導熱填充劑之量取決於各種因素,包括針對組合物選擇之固化機制、所選導熱填充劑及PSA之期望強度。在實施例中,填充劑可選自由石墨、氮化硼、氧化鋁及氧化鋅組成之群。 The amount of thermally conductive filler in the PSA composition will depend on various factors including the cure mechanism selected for the composition, the selected thermally conductive filler, and the desired strength of the PSA. In an embodiment, the filler may be selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide.

適宜導熱填充劑之商業代表性實例包括如實例中所列舉之石墨、氮化硼及氧化鋅。 Commercially representative examples of suitable thermally conductive fillers include graphite, boron nitride, and zinc oxide as exemplified in the examples.

壓敏黏著劑Pressure sensitive adhesive

將導熱填充劑分散於基質中,該基質可為壓敏黏著劑。PSA係由丙烯酸系聚合物製得,該丙烯酸系聚合物係例如具有以下各項組合物者或可藉由聚合以下各項製備者:(i)為具有式CH2=CH(R1)(COOR2)之丙烯酸或甲基丙烯酸衍生物(例如,甲基丙烯酸酯)之丙烯酸單體,其中R1係H或CH3且R2係C1-20、較佳地C1-8烷基鏈;及(ii)具有本文在以下更詳細地闡述之側接反應性官能基之單體,且單體(ii)之量係每100g丙烯酸系聚合物約0.001當量至約0.015當量。 The thermally conductive filler is dispersed in a matrix which may be a pressure sensitive adhesive. The PSA is made of an acrylic polymer, for example, having the following composition or can be prepared by polymerizing: (i) having the formula CH 2 =CH(R 1 ) ( An acrylic monomer of an acrylic or methacrylic acid derivative (e.g., methacrylate) of COOR 2 ) wherein R 1 is H or CH 3 and R 2 is C 1-20 , preferably C 1-8 alkyl And (ii) a monomer having pendant reactive functional groups as set forth in more detail below, and the amount of monomer (ii) is from about 0.001 equivalents to about 0.015 equivalents per 100 grams of acrylic polymer.

對於聚合製程,組份(i)及(ii)之單體(若適當)係藉由自由基聚合轉化成丙烯酸系聚合物。單體經選擇使得所得聚合物可用於根據D.Satas之「Handbook of Pressure Sensitive Adhesive Technology」(van Nostrand,NY(1989))製備PSA。 For the polymerization process, the monomers of components (i) and (ii), if appropriate, are converted to acrylic polymers by free radical polymerization. The monomers are selected such that the resulting polymer can be used to prepare PSA according to "Handbook of Pressure Sensitive Adhesive Technology" by D. Satas (van Nostrand, NY (1989)).

可用作單體混合物(i)之組份之丙烯酸酯及/或甲基丙烯酸酯之實例包括丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、甲基丙烯酸甲酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸正戊酯、丙烯酸正己酯、丙烯酸正庚基酯及丙烯酸正辛酯、丙烯酸正壬酯、甲基丙烯酸月桂酯、丙烯酸環己酯及具支鏈(甲基)丙烯酸異構物,例如丙烯酸異丁酯、甲基丙烯酸異丁酯、甲基丙烯酸正丁酯、丙烯酸2-乙基己酯、甲基丙烯酸十八烷基酯及丙烯酸異辛基酯。 Examples of the acrylate and/or methacrylate which can be used as the component of the monomer mixture (i) include methyl acrylate, ethyl acrylate, ethyl methacrylate, methyl methacrylate, n-butyl acrylate, N-butyl methacrylate, n-amyl acrylate, n-hexyl acrylate, n-heptyl acrylate and n-octyl acrylate, n-decyl acrylate, lauryl methacrylate, cyclohexyl acrylate and branched (methyl) Acrylic isomers such as isobutyl acrylate, isobutyl methacrylate, n-butyl methacrylate, 2-ethylhexyl acrylate, octadecyl methacrylate and isooctyl acrylate.

例示性丙烯酸單體混合物(i)具有小於0℃之Tg值及自約10,000 g/mol至約2,000,000g/mol(例如在50,000g/mol與l,000,000g/mol之間以及合意地在100,000g/mol與700,000g/mol之間)之重量平均分子量。混合物(i)可為前體係其具有小於0℃之均聚物Tg之單一單體。 An exemplary acrylic monomer mixture (i) has a Tg value of less than 0 ° C and from about 10,000 A weight average molecular weight of from g/mol to about 2,000,000 g/mol (for example between 50,000 g/mol and 1,000,000 g/mol and desirably between 100,000 g/mol and 700,000 g/mol). Mixture (i) can be a single monomer having a homopolymer Tg of less than 0 °C in the former system.

適宜單體(ii)之實例係能夠給黏著薄膜提供生坯強度者,包括環脂族環氧單體M100及A400(Daicel)、氧雜環丁烷單體OXE-10(可自Kowa公司購得)、甲基丙烯酸二環戊二烯酯環氧化物(CD535,可自美國賓夕法尼亞州埃克斯頓之Sartomer公司購得),以及4-乙烯基-1-環己烯-1,2-環氧化物(可自Dow購得)。 Examples of suitable monomers (ii) are those capable of providing green strength to the adhesive film, including cycloaliphatic epoxy monomers M100 and A400 (Daicel), oxetane monomer OXE-10 (available from Kowa Corporation). Dicyclopentadienyl epoxide epoxide (CD535, available from Sartomer, Inc., Exton, Pa.), and 4-vinyl-1-cyclohexene-1,2- Epoxide (available from Dow).

丙烯酸系聚合物能夠經受紫外線後陽離子活化之反應且因此給黏著薄膜提供高溫固持強度。丙烯酸系聚合物係具有以下各項組合物者或可藉由聚合以下各項製備者:(i)為具有式CH2=CH(R1)(COOR2)之丙烯酸或甲基丙烯酸衍生物之丙烯酸系單體,其中R1係H或CH3且R2係C1-20烷基鏈;及(ii)具有選自以下兩者之側接反應性官能基之組合之單體:(1)環脂族環氧物、氧雜環丁烷、二苯甲酮或其混合物,及(2)經單取代環氧乙烷。單體(ii)之量係每100g丙烯酸系聚合物約0.001當量至約0.015當量。丙烯酸系聚合物本質上無多(甲基)丙烯酸酯、多元醇或OH官能基且該聚合物在聚合後保持實質上直鏈的。在更佳實施例中,單體(ii)之量係每100g丙烯酸系聚合物約0.002當量至約0.01當量。 The acrylic polymer is capable of withstanding the reaction of cation activation after ultraviolet light and thus provides a high temperature holding strength to the adhesive film. The acrylic polymer may have the following composition or may be prepared by polymerizing: (i) an acrylic acid or methacrylic acid derivative having the formula CH 2 =CH(R 1 )(COOR 2 ) An acrylic monomer, wherein R 1 is H or CH 3 and R 2 is a C 1-20 alkyl chain; and (ii) a monomer having a combination of pendant reactive functional groups selected from the group consisting of: (1) a cycloaliphatic epoxide, oxetane, benzophenone or mixtures thereof, and (2) a monosubstituted ethylene oxide. The amount of the monomer (ii) is from about 0.001 equivalents to about 0.015 equivalents per 100 g of the acrylic polymer. The acrylic polymer is essentially free of multiple (meth) acrylate, polyol or OH functional groups and the polymer remains substantially linear after polymerization. In a more preferred embodiment, the amount of monomer (ii) is from about 0.002 equivalents to about 0.01 equivalents per 100 grams of acrylic polymer.

所製備之丙烯酸系聚合物通常具有10,000g/mol至2,000,000g/mol(例如,在50,000g/mol與1,000,000g/mol之間,如在100,000g/mol與700,000g/mol之間)之重量平均之平均分子量(Mw)。Mw係藉由凝膠滲透層析或基質輔助雷射脫附/離子化質譜來測定。 The acrylic polymer produced typically has a weight of from 10,000 g/mol to 2,000,000 g/mol (eg, between 50,000 g/mol and 1,000,000 g/mol, such as between 100,000 g/mol and 700,000 g/mol). Average average molecular weight (M w ). M w is determined by gel permeation chromatography or matrix-assisted laser desorption/ionization mass spectrometry.

可用作單體(ii)之經單取代環氧乙烷之實例包括甲基丙烯酸縮水甘油酯、1,2-環氧-5-己烯、4-羥丁基丙烯酸縮水甘油醚、環脂族環氧單體M100及A400、OXE-10、CD535環氧化物及4-乙烯基-1-環己烯- 1,2-環氧化物。 Examples of the monosubstituted ethylene oxide which can be used as the monomer (ii) include glycidyl methacrylate, 1,2-epoxy-5-hexene, glycidyl 4-hydroxybutyl acrylate, and cycloaliphatic Group epoxy monomers M100 and A400, OXE-10, CD535 epoxide and 4-vinyl-1-cyclohexene - 1,2-epoxide.

PSA亦可包含各種其他添加劑,例如塑化劑、增黏劑及填充劑,所有該等添加劑照慣例皆用於製備PSA。作為欲添加之塑化劑,低分子量丙烯酸系聚合物、鄰苯二甲酸酯、苯甲酸酯、己二酸酯或塑化劑樹脂具有些許可能性。有可能使用在文獻中闡述之任何已知增黏性樹脂作為欲添加之增黏劑或增黏性樹脂。非限制性實例包括蒎烯樹脂、茚樹脂及其經歧化、氫化、聚合化及酯化衍生物及鹽類、脂肪族及芳烴樹脂、萜烯樹脂、萜烯酚樹脂、C5樹脂、C9樹脂,及其他烴類樹脂。可使用該等或其他樹脂之任何期望組合,以便根據期望之最終性質調整所得之黏著劑之性質。 The PSA may also contain various other additives such as plasticizers, tackifiers, and fillers, all of which are conventionally used in the preparation of PSA. As the plasticizer to be added, a low molecular weight acrylic polymer, a phthalate ester, a benzoate, an adipate or a plasticizer resin has a slight possibility. It is possible to use any of the known tackifying resins described in the literature as the tackifier or tackifying resin to be added. Non-limiting examples include terpene resins, oxime resins and their disproportionated, hydrogenated, polymerized and esterified derivatives and salts, aliphatic and aromatic resins, terpene resins, terpene phenol resins, C 5 resins, C 9 Resins, and other hydrocarbon resins. Any desired combination of these or other resins can be used to tailor the properties of the resulting adhesive to the desired final properties.

PSA可進一步與一或多種添加劑(例如防老劑、抗氧化劑、光穩定劑、複合劑及/或加速劑)摻和。 The PSA can be further blended with one or more additives such as antioxidants, antioxidants, light stabilizers, complexing agents, and/or accelerators.

適宜PSA之商業代表性實例包括可自Henkel公司以商品名DUROTAK購得者。 Commercially representative examples of suitable PSAs include those available from Henkel under the trade name DUROTAK.

通常,習用PSA之導熱率在0.1W/mK至0.25W/mK之範圍內。熱增強之PSA可使導熱性自0.25W/mK增加至20W/mK,且甚至更特定而言自0.5W/mK至10W/mK。 Generally, the thermal conductivity of conventional PSA ranges from 0.1 W/mK to 0.25 W/mK. The thermally enhanced PSA can increase the thermal conductivity from 0.25 W/mK to 20 W/mK, and even more specifically from 0.5 W/mK to 10 W/mK.

可將熱增強之PSA組合物置於釋放層或電子組件之至少一部分上之塗層及/或外殼之內表面上。 The thermally enhanced PSA composition can be placed on the inner surface of the coating and/or outer shell of the release layer or at least a portion of the electronic component.

PSA薄膜之厚度足以幫助產生結合以使熱傳輸穿過薄膜,但並未厚至足以干擾電子裝置之組裝及/或操作。 The thickness of the PSA film is sufficient to aid in the creation of a bond for heat transfer through the film, but is not thick enough to interfere with the assembly and/or operation of the electronic device.

在一實施例中,呈液態之熱增強之PSA之黏度在15cp至15,000cp且更佳300cp至3000cp之範圍內。乾燥薄膜中之熱增強之PSA之厚度可在2微米至30微米、且更佳3微米至15微米、且甚至更佳5微米至12微米之範圍內。180°剝離強度下之黏著力可在8lbf/in至100lbf/in、且甚至更佳10lbf/in至70lbf/in之範圍內。在特定實施例中,填充劑係 石墨且PSA層具有介於1W/mK至3W/mK之間之導熱率。 In one embodiment, the viscosity of the liquid-enhanced PSA is in the range of 15 cp to 15,000 cp and more preferably 300 cp to 3000 cp. The thickness of the thermally enhanced PSA in the dried film can range from 2 microns to 30 microns, and more preferably from 3 microns to 15 microns, and even more preferably from 5 microns to 12 microns. The adhesion at 180° peel strength can range from 8 lbf/in to 100 lbf/in, and even more preferably from 10 lbf/in to 70 lbf/in. In a particular embodiment, the filler system The graphite and PSA layer has a thermal conductivity of between 1 W/mK and 3 W/mK.

在另一實施例中,塗層小於15微米厚,且PSA中之導熱填充劑佔5重量%至95重量%。在另一實施例中,塗層小於10微米厚,且PSA中之導熱填充劑佔10重量%至80重量%。 In another embodiment, the coating is less than 15 microns thick and the thermally conductive filler in the PSA is from 5% to 95% by weight. In another embodiment, the coating is less than 10 microns thick and the thermally conductive filler in the PSA is from 10% to 80% by weight.

在特定實施例中,將填充劑分散於小於15微米厚之PSA薄膜中,填充劑係石墨且具有小於PSA薄膜之厚度之平均粒度,在PSA溶劑蒸發前,填充劑佔液體PSA之5重量%至35重量%,且PSA薄膜具有介於1W/mK至3W/mK之間之導熱率。在甚至更特定之實施例中,將填充劑分散於小於10微米厚之PSA薄膜中,填充劑係石墨且具有小於PSA薄膜之厚度之平均粒度,在PSA溶劑蒸發前,填充劑佔液體PSA之10重量%至30重量%,且PSA薄膜具有介於1W/mK至3W/mK之間之導熱率。 In a particular embodiment, the filler is dispersed in a PSA film that is less than 15 microns thick, the filler is graphite and has an average particle size less than the thickness of the PSA film, and the filler comprises 5% by weight of the liquid PSA prior to evaporation of the PSA solvent. Up to 35% by weight, and the PSA film has a thermal conductivity of between 1 W/mK and 3 W/mK. In an even more specific embodiment, the filler is dispersed in a PSA film that is less than 10 microns thick, the filler is graphite and has an average particle size less than the thickness of the PSA film, and the filler occupies the liquid PSA prior to evaporation of the PSA solvent. 10% by weight to 30% by weight, and the PSA film has a thermal conductivity of between 1 W/mK and 3 W/mK.

散熱材料Heat sink material

為有效管理由電子組件生成之熱,散熱器材料可將熱轉移至被動或主動散熱體。使用施加至低功率裝置之散熱器(例如移動裝置中之半導體及EMI屏蔽)將熱直接傳導至環境,至包殼或至遠離熱點之另一區域。在高功率裝置(例如CPU)上,該等散熱器將熱散佈至主動式冷卻裝置。 To effectively manage the heat generated by electronic components, the heat sink material transfers heat to a passive or active heat sink. Heat is applied directly to the environment using a heat sink applied to the low power device (eg, semiconductor and EMI shielding in the mobile device) to the enclosure or to another region away from the hot spot. On high power devices (such as CPUs), the heat sinks dissipate heat to the active cooling device.

可利用各種散熱器用於不同的應用。散熱器可由固體導熱金屬製得。銅及鋁因其導熱率高且成本低而成為最常用的金屬。銅之缺點係其密度及熱膨脹係數(TCE)較高,此阻止直接附接至矽晶粒。鋁提供高導熱率、低密度及易於製造性,但其(TCE)亦高於矽。與鋁及銅相比,導熱陶瓷(例如BeO、AlN及SiC)皆具有高導熱率及低TCE。散熱材料之厚度可在5微米至500微米之範圍內。 A variety of heat sinks are available for different applications. The heat sink can be made of a solid thermally conductive metal. Copper and aluminum are the most commonly used metals due to their high thermal conductivity and low cost. The disadvantage of copper is its high density and coefficient of thermal expansion (TCE), which prevents direct attachment to the germanium grains. Aluminum provides high thermal conductivity, low density, and ease of manufacture, but its (TCE) is also higher than 矽. Thermally conductive ceramics (such as BeO, AlN, and SiC) have high thermal conductivity and low TCE compared to aluminum and copper. The thickness of the heat dissipating material can range from 5 microns to 500 microns.

可使用天然及合成石墨作為散熱材料,其優點係石墨之密度為銅之1/5。天然石墨係各向同性材料,其在散佈器之平面(x-y軸)上提 供約140W/mK至500W/mK之導熱率,且垂直於平面(z軸)遍及散佈器厚度具有約3W/mK至10W/mK之較低導熱率。合成石墨可在散佈器之平面上提供約600W/mK至1750W/mK之導熱率。石墨散熱器具體而言可用於熱通量密度較低之電子應用中,例如具有記憶體模組及可攜式電子裝置之電子應用。 Natural and synthetic graphite can be used as the heat dissipating material, and the advantage is that the density of graphite is 1/5 of that of copper. Natural graphite isotropic material, which is raised on the plane of the diffuser (x-y axis) A thermal conductivity of about 140 W/mK to 500 W/mK is provided, and a lower thermal conductivity of about 3 W/mK to 10 W/mK across the plane (z-axis) across the spreader thickness. Synthetic graphite provides a thermal conductivity of from about 600 W/mK to about 1750 W/mK in the plane of the diffuser. Graphite heat sinks are particularly useful in electronic applications where heat flux density is low, such as electronic applications with memory modules and portable electronics.

在實施例中,散熱器係石墨片或金屬箔。在特定實施例中,散熱器係由撓性合成石墨、天然石墨及其組合形成。合成或天然石墨之厚度可在5微米至45微米之範圍內。在特定實施例中,散熱材料係具有介於5μm至25μm之間之厚度之合成石墨。銅箔散熱材料之厚度可在15微米至250微米之範圍內。 In an embodiment, the heat sink is a graphite sheet or a metal foil. In a particular embodiment, the heat sink is formed from flexible synthetic graphite, natural graphite, and combinations thereof. The thickness of the synthetic or natural graphite can range from 5 microns to 45 microns. In a particular embodiment, the heat dissipating material is synthetic graphite having a thickness of between 5 μm and 25 μm. The thickness of the copper foil heat sink material can range from 15 microns to 250 microns.

適宜散熱器之商業代表性實例包括來自Qingdao之合成石墨及來自Panasonic之熱解石墨。 Commercially representative examples of suitable heat sinks include synthetic graphite from Qingdao and pyrolytic graphite from Panasonic.

電子組件Electronic component

電子組件可包含任何子總成,該子總成產生足夠熱,若不耗散則干擾電子組件或該電子組件係一個元件之系統之操作。電子組件可包含微處理器或電腦晶片、積體電路、用於光學裝置之電子控制裝置(如雷射或場效應電晶體(FET))。在實施例中,電子組件係選自由以下組成之群之生熱組件:積體微晶片、微處理器、電晶體、二極體、繼電器、電阻器、變壓器、放大器、EMI屏蔽及電容器。電子組件包括至少一個熱自其輻射且可用作欲自電子組件耗散之熱之來源之表面。在實施例中,電子組件具有介於15℃至100℃之間之操作溫度。 The electronic component can include any subassembly that produces sufficient heat to interfere with the operation of the electronic component or the system in which the electronic component is a component if not dissipated. Electronic components can include microprocessors or computer chips, integrated circuits, electronic controls for optical devices such as lasers or field effect transistors (FETs). In an embodiment, the electronic component is selected from the group consisting of: a bulk microchip, a microprocessor, a transistor, a diode, a relay, a resistor, a transformer, an amplifier, an EMI shield, and a capacitor. The electronic component includes at least one surface from which heat is radiated and can be used as a source of heat to be dissipated from the electronic component. In an embodiment, the electronic component has an operating temperature of between 15 °C and 100 °C.

可在電子物件之組裝中使用電子組件、增強的壓敏黏著劑及散熱材料。此物件(或「裝置」)可選自筆記型個人電腦、平板型個人電腦或手持裝置,例如,音樂播放器、視訊播放器、靜態影像播放器、遊戲機、其他媒體播放器、音樂記錄器、視訊記錄器、相機、其他媒體記錄器、無線電、醫療設備、家用電器、運輸載具儀器、樂器、計 算器、行動電話、其他無線通信裝置、個人數位助理、遙控器、頁調器、監視器、電視、立體音響設備、機上盒(set up box)、轉頻器、音樂盒、數據機、路由器、鍵盤、滑鼠、揚聲器、印刷機及其組合。 Electronic components, reinforced pressure sensitive adhesives and heat sinking materials can be used in the assembly of electronic objects. The object (or "device") can be selected from a notebook personal computer, a tablet personal computer or a handheld device, such as a music player, a video player, a still video player, a game console, other media players, a music recorder. , video recorders, cameras, other media recorders, radios, medical equipment, household appliances, transport vehicles, musical instruments, meters Calculators, mobile phones, other wireless communication devices, personal digital assistants, remote controls, pagers, monitors, televisions, stereo devices, set up boxes, frequency converters, music boxes, data sets, Routers, keyboards, mice, speakers, printers, and combinations thereof.

裝置包括具有至少一個接近及/或包封至少一個生熱組件之表面之外殼。外殼可自塑膠、金屬或任何適宜金屬製作而成。外殼可由單片材料形成,或自多片材料形成。外殼可包括子總成,包括外部及內部包殼、結構支撐體、緊固件及中間框架。在實施例中,屏蔽中間框架係接近相同或不同的印刷電路板(PCG)上之電子組件放置。外殼可經調適以促進熱之耗散或分佈。 The device includes an outer casing having at least one surface that approximates and/or encloses at least one heat generating component. The outer casing can be made of plastic, metal or any suitable metal. The outer casing may be formed from a single piece of material or from multiple pieces of material. The outer casing can include sub-assemblies including outer and inner claddings, structural supports, fasteners, and intermediate frames. In an embodiment, the shield intermediate frame is placed close to the electronic components on the same or different printed circuit boards (PCGs). The outer casing can be adapted to promote heat dissipation or distribution.

製備方法Preparation

可藉由將導熱填充劑分散至液體PSA樹脂系統中來製備組裝有增強之PSA之電子裝置。樹脂系統可包括水性或溶劑性溶液丙烯酸PSA。然後,將液體溶液塗覆或施加至第一表面(例如散熱材料、電子組件)或電子裝置之外殼。然後,乾燥溶液以去除溶劑,留下增強之PSA之薄膜。亦可將此溶液塗覆至釋放襯墊(例如聚矽氧處理之釋放襯墊)上,且然後,進行乾燥以去除溶劑,產生增強之PSA之薄轉移帶格式。然後,可將增強之PSA施加至第二表面(例如散熱材料、電子組件)或電子裝置之包殼。在實施例中,將增強之PSA施加至散熱材料。在另一實施例中,將增強之PSA施加至電子裝置內之外殼。 An electronic device assembled with an enhanced PSA can be prepared by dispersing a thermally conductive filler into a liquid PSA resin system. The resin system can include an aqueous or solvent based acrylic PSA. The liquid solution is then applied or applied to a first surface (eg, a heat dissipating material, an electronic component) or an outer casing of the electronic device. The solution is then dried to remove the solvent leaving a film of reinforced PSA. This solution can also be applied to a release liner (e.g., a polyoxo-treated release liner) and then dried to remove solvent to produce a thinned transfer tape format of the enhanced PSA. The reinforced PSA can then be applied to a second surface (eg, a heat dissipating material, an electronic component) or a cladding of an electronic device. In an embodiment, the enhanced PSA is applied to a heat dissipating material. In another embodiment, the enhanced PSA is applied to an outer casing within the electronic device.

可藉由將導熱填充劑分散至液體PSA樹脂系統中形成導熱散熱層壓板。樹脂系統可包括水基或溶劑基溶液丙烯酸PSA。然後,將液體溶液塗覆或施加至第一散熱材料。然後,乾燥溶液以去除溶劑,留下增強的壓敏黏著劑之薄膜。亦可將此溶液塗覆至釋放襯墊上,且然後,進行乾燥以去除溶劑,產生導熱PSA之薄轉移帶格式。然後,可將增強之PSA施加至第二散熱材料以形成導熱散熱層壓板。可藉由在中間插入導熱PSA之薄膜添加額外的散熱材料層。增強之PSA可囊封 散熱材料。有利地,當利用介入導熱PSA施加額外層時,形成更強且更耐久之層壓散熱器。 The thermally conductive heat-dissipating laminate can be formed by dispersing a thermally conductive filler into a liquid PSA resin system. The resin system can include a water based or solvent based solution acrylic PSA. The liquid solution is then applied or applied to the first heat sink material. The solution is then dried to remove the solvent leaving a film of the enhanced pressure sensitive adhesive. This solution can also be applied to a release liner and then dried to remove solvent to produce a thin transfer ribbon format for thermally conductive PSA. The reinforced PSA can then be applied to the second heat sink material to form a thermally conductive heat sink laminate. An additional layer of heat sinking material can be added by inserting a thin film of thermally conductive PSA in between. Enhanced PSA can be encapsulated Heat sink material. Advantageously, a stronger and more durable laminated heat sink is formed when an additional layer is applied using the intervening thermally conductive PSA.

實例 Instance 實例1Example 1

將下文表1中列出之成份放置於器皿中,同時高速分散混合以形成混合物。 The ingredients listed in Table 1 below were placed in a vessel while mixing at high speed to form a mixture.

1平均粒度0.12μm,表面積9.0m2/g 9.0,表觀密度0.64g/cm3 1 average particle size 0.12 μm, surface area 9.0 m 2 /g 9.0, apparent density 0.64 g/cm 3 .

2物件大小d50 2.2μm。表面積21.0m2/g,敲緊密度0.30g/cm3 2 object size d50 2.2μm. The surface area was 21.0 m 2 /g, and the knocking tightness was 0.30 g/cm 3 .

3平均粒度0.9μm,表面積20.0m2/g,敲緊密度0.12g/cm3 3, an average particle size of 0.9 μm, a surface area of 20.0 m 2 /g, and a knock tightness of 0.12 g/cm 3 .

4粒度d50 2.4μm、d90 4.1μm,表面積26.0m2/g,密度0.07g/cm3 4 particle size d50 2.4 μm, d90 4.1 μm, surface area 26.0 m 2 /g, density 0.07 g/cm 3 .

5粒度d50 2.6μm、d90 5.0μm,表面積352m2/g,真密度2.16g/cm3 5 particle size d50 2.6 μm, d90 5.0 μm, surface area 352 m 2 /g, true density 2.16 g/cm 3 .

6粒度d50 5.2μm、d90 12μm。 6 particle size d50 5.2 μm, d90 12 μm.

將每一混合物攪拌2分鐘以分散導熱填充劑且形成經編號試樣。然後,利用下拉棒將每一混合物施加至聚矽氧處理之釋放襯墊上並在 90℃下乾燥15分鐘以產生約5μm至10μm之黏性、熱增強之PSA薄膜。然後,將每一增強之PSA薄膜轉移層壓成合成石墨片(25um Qingdao,切割成50×55mm之大小)。將5μm PET層壓於未覆蓋PSA之石墨之側上,以產生完整的散熱器薄膜。然後,自載體釋放襯墊去除此薄膜,並將所暴露之PSA薄膜黏著至模擬包封於電子裝置中之電子組件之熱測試晶粒之表面。 Each mixture was stirred for 2 minutes to disperse the thermally conductive filler and form a numbered sample. Then, each mixture is applied to the release liner of the polyoxygen treatment using a pull-down bar and Drying at 90 ° C for 15 minutes to produce a viscous, heat-reinforced PSA film of about 5 μm to 10 μm. Then, each of the reinforced PSA films was transferred and laminated into a synthetic graphite sheet (25 um Qingdao, cut into a size of 50 x 55 mm). 5 μm PET was laminated on the side of the graphite not covered with PSA to produce a complete heat sink film. The film is then removed from the carrier release liner and the exposed PSA film is adhered to the surface of the thermal test die that simulates the electronic components encapsulated in the electronic device.

在下表2中,將試樣編號1至8黏著至熱測試晶粒之表面,且以如最左邊行中所顯示之若干時間間隔記錄接面溫度。作為測試晶粒生成之熱,其散佈穿過PSA且至石墨片中。 In Table 2 below, sample numbers 1 through 8 were adhered to the surface of the thermal test die and the junction temperature was recorded at several time intervals as shown in the leftmost row. As the heat generated by the test die, it spreads through the PSA and into the graphite flakes.

將該等試樣之結果與利用對照、PSA塗覆之石墨片之未填充試樣獲得之結果相比較。發現增強之薄膜之熱耗散性能較習用PSA好高達1.4℃。例如,參見1800秒間隔下之試樣7對對照。 The results of the samples were compared to the results obtained with unfilled samples of control, PSA coated graphite sheets. It was found that the heat dissipation performance of the enhanced film was as high as 1.4 ° C compared with the conventional PSA. See, for example, sample 7 versus control at 1800 second intervals.

實例2Example 2

在高速分散混合下將下表3中所列示之試樣編號1至15之成份置於器皿中,以形成混合物。 The components of sample numbers 1 to 15 listed in Table 3 below were placed in a vessel under high speed dispersion mixing to form a mixture.

1粒度d50 3.68μm,表面積14.49m2/g。 1 particle size d50 3.68 μm, surface area 14.49 m 2 /g.

2 Panasonic PGS石墨經闡述為具有以下尺寸之熱解石墨片:對於37μm之總厚度,10μm PET、17μm石墨、10μm習用PSA。石墨片經闡述具有2.10g/cm3之密度,及沿x-y軸1750W/mK之導熱率。 2 Panasonic PGS graphite is illustrated as a pyrolytic graphite sheet having the following dimensions: 10 μm PET, 17 μm graphite, 10 μm conventional PSA for a total thickness of 37 μm. The graphite sheet was described to have a density of 2.10 g/cm 3 and a thermal conductivity of 1750 W/mK along the xy axis.

3Dasen DSN5025PM-5經闡述為具有以下尺寸之合成石墨薄膜:對於35μm之總厚度,5μm PET、25μm石墨、5μm習用PSA。將此薄膜施加於75μm PET釋放襯墊上。為施加至測試晶粒,去除並丟棄75μm PET釋放襯墊,且將PSA薄膜施加至測試晶粒。石墨片經闡述 具有1.6-1.8g/cm3之密度,及沿x-y軸如1500W/mK至1700W/mK及z軸15W/mK至20W/mK之導熱率。 3 Dasen DSN5025PM-5 is illustrated as a synthetic graphite film having the following dimensions: for a total thickness of 35 μm, 5 μm PET, 25 μm graphite, 5 μm conventional PSA. This film was applied to a 75 μm PET release liner. To apply to the test dies, a 75 [mu]m PET release liner was removed and discarded, and a PSA film was applied to the test dies. The graphite sheet is illustrated to have a density of 1.6-1.8 g/cm 3 and a thermal conductivity along the xy axis such as 1500 W/mK to 1700 W/mK and the z-axis 15 W/mK to 20 W/mK.

將每一混合物攪拌2分鐘以分散導熱填充劑並形成經編號試樣。然後,利用下拉棒將每一混合物施加至聚矽氧處理之釋放襯墊上並在121℃下乾燥15分鐘以產生約5μm至10μm之黏性、熱增強之PSA薄膜。然後,將每一增強之PSA薄膜轉移層壓成合成石墨片(25um Dasen,具有與實例1相同的尺寸),並將5μm PET層壓於未覆蓋PSA之石墨之側上,以產生完整的散熱器薄膜。然後,自此薄膜之載體釋放襯墊去除此薄膜,且將具有PSA薄膜之表面黏著至熱測試晶粒之表面用於評估。 Each mixture was stirred for 2 minutes to disperse the thermally conductive filler and form a numbered sample. Then, each mixture was applied to a polyfluorene-treated release liner using a drawdown bar and dried at 121 ° C for 15 minutes to produce a viscous, heat-reinforced PSA film of about 5 μm to 10 μm. Then, each reinforced PSA film was transferred into a synthetic graphite sheet (25 um Dasen, having the same dimensions as in Example 1), and 5 μm PET was laminated on the side of the graphite not covering the PSA to produce complete heat dissipation. Film. The film was then released from the carrier release liner of the film and the surface with the PSA film adhered to the surface of the thermal test die for evaluation.

使用兩種市售石墨散熱器薄膜(Panasonic PGS石墨(「PGS」)及Dasen DSN5000石墨(「DSN」))作為對照以與增強之PSA相比較。對照之性質闡述於表1中,且類似地切割成50×55mm之大小。去除釋放層。 Two commercially available graphite heat sink films (Panasonic PGS graphite ("PGS") and Dasen DSN5000 graphite ("DSN")) were used as controls to compare with the enhanced PSA. The nature of the control is set forth in Table 1 and similarly cut to a size of 50 x 55 mm. Remove the release layer.

在下表4中,將試樣編號1至15及兩個對照黏著至熱測試晶粒之表面,且記錄30分鐘測試時間後之最後接面溫度。 In Table 4 below, sample numbers 1 through 15 and two controls were adhered to the surface of the thermal test die and the last junction temperature after the 30 minute test time was recorded.

將具有習用PSA/石墨散熱器之兩個對照之結果與含有增強之PSA/石墨散熱器之試樣相比較。發現熱增強之PSA提供較塗覆有習用黏著劑之兩個對照好3-7℃之改良之熱耗散。 The results of the two controls with the conventional PSA/graphite heat sink were compared to samples containing the reinforced PSA/graphite heat sink. The thermally enhanced PSA was found to provide improved heat dissipation of 3-7 °C compared to the two controls coated with conventional adhesives.

Claims (19)

一種壓敏黏著劑薄膜,其包含:分散於丙烯酸系聚合物基質內之填充劑,該填充劑具有小於該壓敏黏著劑薄膜之厚度之平均粒度,其中該填充劑係選自由以下組成之群:石墨、氮化硼、氧化鋁及氧化鋅。 A pressure-sensitive adhesive film comprising: a filler dispersed in an acrylic polymer matrix, the filler having an average particle size smaller than a thickness of the pressure-sensitive adhesive film, wherein the filler is selected from the group consisting of : graphite, boron nitride, aluminum oxide and zinc oxide. 如請求項1之壓敏黏著劑薄膜,其中該薄膜之厚度小於15μm,且該填充劑佔該薄膜之5重量%至95重量%。 The pressure-sensitive adhesive film of claim 1, wherein the film has a thickness of less than 15 μm, and the filler accounts for 5% by weight to 95% by weight of the film. 如請求項1之壓敏黏著劑薄膜,其中該薄膜之厚度小於10μm,且該填充劑佔該薄膜之10重量%至80重量%。 The pressure-sensitive adhesive film of claim 1, wherein the film has a thickness of less than 10 μm, and the filler accounts for 10% by weight to 80% by weight of the film. 如請求項1之壓敏黏著劑薄膜,其中該填充劑係石墨,且該薄膜具有介於1W/mK至3W/mK之間之導熱率。 The pressure-sensitive adhesive film of claim 1, wherein the filler is graphite, and the film has a thermal conductivity of between 1 W/mK and 3 W/mK. 一種散熱層壓板,其包含:兩個或更多個散熱層,及置於該等散熱層之間之壓敏黏著劑薄膜;其中該薄膜包含分散於丙烯酸系聚合物基質內之填充劑,該填充劑具有小於該薄膜之厚度之平均粒度,且其中該填充劑係選自由以下組成之群:石墨、氮化硼、氧化鋁及氧化鋅。 A heat dissipation laminate comprising: two or more heat dissipation layers, and a pressure sensitive adhesive film disposed between the heat dissipation layers; wherein the film comprises a filler dispersed in an acrylic polymer matrix, The filler has an average particle size less than the thickness of the film, and wherein the filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide. 如請求項5之散熱層壓板,其中該薄膜之厚度小於15μm且該填充劑佔該薄膜之5重量%至95重量%。 The heat-dissipating laminate of claim 5, wherein the film has a thickness of less than 15 μm and the filler comprises from 5% by weight to 95% by weight of the film. 如請求項5之散熱層壓板,其中該薄膜之厚度小於10μm且該填充劑佔該薄膜之10重量%至80重量%。 The heat-dissipating laminate of claim 5, wherein the film has a thickness of less than 10 μm and the filler comprises from 10% by weight to 80% by weight of the film. 如請求項5之散熱層壓板,其中該填充劑係石墨且該薄膜具有介 於1W/mK至3W/mK之間之導熱率。 The heat-dissipating laminate of claim 5, wherein the filler is graphite and the film has a mediation Thermal conductivity between 1 W/mK and 3 W/mK. 如請求項5之散熱層壓板,其中該散熱層係選自由以下組成之群:合成石墨、天然石墨、鋁及銅箔。 The heat-dissipating laminate of claim 5, wherein the heat dissipation layer is selected from the group consisting of synthetic graphite, natural graphite, aluminum, and copper foil. 如請求項5之散熱層壓板,其中該散熱層包含具有介於5μm至25μm之間之厚度之合成石墨。 A heat dissipation laminate according to claim 5, wherein the heat dissipation layer comprises synthetic graphite having a thickness of between 5 μm and 25 μm. 一種製備壓敏黏著劑薄膜之方法,其包含提供釋放襯墊;及將壓敏黏著劑薄膜安置於該釋放襯墊上,其中該薄膜包含分散於丙烯酸系聚合物基質內之填充劑,該填充劑具有小於該薄膜之厚度之平均粒度,且其中該填充劑係選自由以下組成之群:石墨、氮化硼、氧化鋁及氧化鋅。 A method of preparing a pressure sensitive adhesive film comprising providing a release liner; and placing a pressure sensitive adhesive film on the release liner, wherein the film comprises a filler dispersed in an acrylic polymer matrix, the filling The agent has an average particle size less than the thickness of the film, and wherein the filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide. 如請求項11之方法,其中該薄膜之厚度小於15μm且該填充劑佔該薄膜之5重量%至95重量%。 The method of claim 11, wherein the film has a thickness of less than 15 μm and the filler comprises from 5% by weight to 95% by weight of the film. 一種電子製造物件,其包含:散熱材料;電子組件;及壓敏黏著劑薄膜,其具有一厚度且安置於該散熱材料與該電子組件之間;其中該薄膜包含分散於丙烯酸系聚合物基質內之填充劑,該填充劑具有小於該薄膜之厚度之平均粒度,其中該填充劑係選自由以下組成之群:石墨、氮化硼、氧化鋁及氧化鋅。 An electronic article of manufacture comprising: a heat dissipating material; an electronic component; and a pressure sensitive adhesive film having a thickness disposed between the heat dissipating material and the electronic component; wherein the film comprises dispersed in an acrylic polymer matrix The filler having an average particle size smaller than the thickness of the film, wherein the filler is selected from the group consisting of graphite, boron nitride, aluminum oxide, and zinc oxide. 如請求項13之電子物件,其中該薄膜之厚度小於15μm且該填充劑佔該薄膜之5重量%至95重量%。 The electronic article of claim 13, wherein the film has a thickness of less than 15 μm and the filler comprises from 5% to 95% by weight of the film. 如請求項13之電子物件,其中該薄膜之厚度小於10μm且該填充劑佔該薄膜之10重量%至80重量%。 The electronic article of claim 13, wherein the film has a thickness of less than 10 μm and the filler comprises from 10% by weight to 80% by weight of the film. 如請求項13之電子物件,其中該填充劑係石墨且該薄膜具有介於1W/mK至3W/mK之間之導熱率。 The electronic article of claim 13, wherein the filler is graphite and the film has a thermal conductivity of between 1 W/mK and 3 W/mK. 如請求項13之電子物件,其中該散熱材料係選自由以下組成之群:合成石墨、天然石墨、鋁及銅箔。 The electronic article of claim 13, wherein the heat dissipating material is selected from the group consisting of synthetic graphite, natural graphite, aluminum, and copper foil. 如請求項13之電子物件,其中該散熱材料包含具有介於5μm至25μm之間之厚度之合成石墨。 The electronic article of claim 13, wherein the heat dissipating material comprises synthetic graphite having a thickness of between 5 μm and 25 μm. 如請求項13之電子物件,其中該電子組件係選自由以下組成之群之生熱組件:積體微晶片、微處理器、電晶體、二極體、繼電器、電阻器、變壓器、放大器、EMI屏蔽及電容器,且其中該電子組件具有介於15℃至100℃之間之操作溫度。 The electronic article of claim 13, wherein the electronic component is selected from the group consisting of: a bulk microchip, a microprocessor, a transistor, a diode, a relay, a resistor, a transformer, an amplifier, and an EMI Shielding and capacitors, and wherein the electronic component has an operating temperature of between 15 ° C and 100 ° C.
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KR20090043633A (en) * 2007-10-30 2009-05-07 쓰리엠 이노베이티브 프로퍼티즈 캄파니 Thermally conductive adhesives and adhesive tape using the same
DE102008049850A1 (en) * 2008-10-01 2010-04-08 Tesa Se Thermally conductive pressure-sensitive adhesive
DE102008049849A1 (en) * 2008-10-01 2010-04-08 Tesa Se Thermal conduction composition
JP2012001712A (en) * 2010-05-17 2012-01-05 Nitto Denko Corp Undercoat agent composition and adhesive sheet
US20130303646A1 (en) * 2012-05-10 2013-11-14 Nitto Denko Corporation Pressure-sensitive adhesive sheet for metal surface protection
CN103694919A (en) * 2012-12-18 2014-04-02 斯迪克新型材料(江苏)有限公司 Graphite heat-dissipation adhesive tape for electronic products
CN103694918A (en) * 2012-12-18 2014-04-02 斯迪克新型材料(江苏)有限公司 Graphite heat-conducting adhesive tape

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WO2015183896A1 (en) 2015-12-03
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