TW201603897A - Coating apparatus and system for producing porous imide resin film - Google Patents

Coating apparatus and system for producing porous imide resin film Download PDF

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TW201603897A
TW201603897A TW104117953A TW104117953A TW201603897A TW 201603897 A TW201603897 A TW 201603897A TW 104117953 A TW104117953 A TW 104117953A TW 104117953 A TW104117953 A TW 104117953A TW 201603897 A TW201603897 A TW 201603897A
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film
coating
roller
unit
base material
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TW104117953A
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TWI665024B (en
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Yoshitsugu Kawamura
Hideyuki Mizuki
Shinya Sugiyama
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Tokyo Ohka Kogyo Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/40Separators; Membranes; Diaphragms; Spacing elements inside cells
    • H01M50/403Manufacturing processes of separators, membranes or diaphragms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/06Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/20Manufacture of shaped structures of ion-exchange resins
    • C08J5/22Films, membranes or diaphragms
    • C08J5/2206Films, membranes or diaphragms based on organic and/or inorganic macromolecular compounds
    • C08J5/2218Synthetic macromolecular compounds
    • C08J5/2256Synthetic macromolecular compounds based on macromolecular compounds obtained by reactions other than those involving carbon-to-carbon bonds, e.g. obtained by polycondensation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/40Separators; Membranes; Diaphragms; Spacing elements inside cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/40Separators; Membranes; Diaphragms; Spacing elements inside cells
    • H01M50/409Separators, membranes or diaphragms characterised by the material
    • H01M50/411Organic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/40Separators; Membranes; Diaphragms; Spacing elements inside cells
    • H01M50/409Separators, membranes or diaphragms characterised by the material
    • H01M50/411Organic material
    • H01M50/414Synthetic resins, e.g. thermoplastics or thermosetting resins
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Abstract

Provided are: a coating apparatus which is capable of producing a high-quality porous imide resin film; and a system for producing a porous imide resin film. A coating apparatus which is provided with: a band-like base (S1) which moves in a predetermined direction; a first nozzle (12) which forms a first coating film (F1) by applying a first coating liquid (Q1) over the band-like base (S1), said first coating liquid (Q1) containing a polyamide acid, a polyimide, a polyamide-imide or polyamide, and fine particles; and a second nozzle (13) which forms a second coating film (F2) by applying a second coating liquid (Q2) over the first coating film (F1), said second coating liquid (Q2) containing a polyamide acid, a polyimide, a polyamide-imide or polyamide, and fine particles such that at least the content ratio of the fine particles is different from that of the first coating liquid (Q1). A system for producing a porous imide resin film.

Description

塗佈裝置及多孔性之醯亞胺系樹脂膜製造系統 Coating device and porous yttrium-based resin film manufacturing system

本發明係有塗佈裝置及多孔性之醯亞胺系樹脂膜製造系統。 The present invention relates to a coating apparatus and a porous yttrium-based resin film production system.

二次電池之一種的鋰離子電池係於被浸漬於電解液之正極與負極之間,配置分隔膜,藉由分隔膜防止正極與負極之間直接電接觸的構造。正極使用鋰過渡金屬氧化物,負極使用例如鋰或碳(石墨)等。充電時,鋰離子由正極通過分隔膜,往負極移動,放電時,鋰離子由負極通過分隔膜,往正極移動。 A lithium ion battery of one type of secondary battery is a structure in which a separator film is disposed between a positive electrode and a negative electrode of an electrolytic solution, and a direct contact between the positive electrode and the negative electrode is prevented by a separator. A lithium transition metal oxide is used for the positive electrode, and for example, lithium or carbon (graphite) or the like is used for the negative electrode. During charging, lithium ions pass through the separator from the positive electrode and move toward the negative electrode. When discharging, lithium ions pass through the separator from the negative electrode and move toward the positive electrode.

此鋰離子電池因重複充電及放電,而有在負極,鋰金屬以樹枝狀析出,電池之電特性降低等之問題發生的疑慮。對此,例如提案使用多孔性之分隔膜,提高鋰離子電池之電特性。這種多孔質之分隔膜,近年已嘗試使用耐熱性高,且安全性高之多孔性聚醯亞胺膜所構成的分隔膜(參照例如專利文獻1等)。 This lithium ion battery has doubts such as a negative electrode, a lithium metal precipitated in a dendritic shape, and a decrease in electrical characteristics of the battery due to repeated charging and discharging. For this reason, for example, it is proposed to use a porous separator to improve the electrical characteristics of the lithium ion battery. In the porous separator film, a separator film composed of a porous polyimide film having high heat resistance and high safety has been tried in recent years (see, for example, Patent Document 1).

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開2011-111470號公報 [Patent Document 1] Japanese Laid-Open Patent Publication No. 2011-111470

[發明概要] [Summary of the Invention]

上述多孔性聚醯亞胺膜,例如塗佈形成含有微粒子之聚醯胺酸或聚醯亞胺之未燒成膜,將此未燒成膜進行燒成形成燒成膜,藉由自燒成膜中除去微粒子來製造。但是使用以往塗佈步驟所形成的未燒成膜時,所製造的多孔性之聚醯亞胺膜,在孔之均勻性或密度等之方面仍不足。因此,需要可製造更高品質之多孔性之聚醯亞胺膜的塗佈裝置。又,不限於聚醯亞胺膜,且醯亞胺系樹脂膜也要求可形成高品質之多孔性膜的塗佈裝置。 The porous polyimide film is, for example, coated with an unfired film of polyamic acid or polyimine containing microparticles, and the unfired film is fired to form a fired film, and is self-fired. The film is removed by removing fine particles. However, when the unfired film formed by the conventional coating step is used, the porous polyimide film produced is still insufficient in terms of uniformity, density, and the like of the pores. Therefore, there is a need for a coating apparatus that can produce a higher quality porous polyimide film. Further, it is not limited to a polyimide film, and a coating device capable of forming a high-quality porous film is also required.

有鑑於以上的情形,本發明之目的係提供可製造高品質之多孔性之醯亞胺系樹脂膜的塗佈裝置及多孔性之醯亞胺系樹脂膜製造系統。 In view of the above, an object of the present invention is to provide a coating apparatus for producing a high-quality porous quinone-imide resin film and a porous yttrium-based resin film production system.

本發明之第1態樣之塗佈裝置,其係形成多孔性之醯亞胺系樹脂膜用之塗佈裝置,其係具備:在特定方向移動的基材;將含有聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯 胺、及微粒子之第1液體塗佈於前述基材上,形成第1層的第1塗佈部;及將含有聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺、及微粒子,且至少相對於前述第1液體而言,微粒子之含有率不同之第2液體,塗佈於前述第1層上,形成第2層的第2塗佈部。 A coating apparatus according to a first aspect of the present invention is a coating apparatus for forming a porous yttrium-based resin film, comprising: a substrate that moves in a specific direction; and a poly-proline醯imine, polyamidimide or polyfluorene The first liquid of the amine and the fine particles is applied onto the substrate to form a first coating portion of the first layer; and the polyamine, polyimine, polyamidimide or polyamine may be contained. And the fine particles, and at least the second liquid having a different content rate of the fine particles is applied to the first layer to form the second coating portion of the second layer.

本發明之第2態樣之多孔性之醯亞胺系樹脂膜製造系統係製造多孔性之醯亞胺系樹脂膜的製造系統,且包含第1態樣的塗佈裝置。 The porous yttrium imide resin film production system according to the second aspect of the present invention is a production system for producing a porous bismuth amide resin film, and includes a coating device according to the first aspect.

依據本發明之態樣時,可提供可製造高品質之多孔性之醯亞胺系樹脂膜的塗佈裝置及多孔性之醯亞胺系樹脂膜製造系統。 According to the aspect of the invention, it is possible to provide a coating apparatus for producing a high-quality porous quinone-imide resin film and a porous yttrium-based resin film production system.

SYS‧‧‧製造系統 SYS‧‧‧ Manufacturing System

F‧‧‧多孔性樹脂膜 F‧‧‧Porous resin film

FA‧‧‧未燒成膜 FA‧‧‧Unfired film

S1、S2‧‧‧帶狀基材 S1, S2‧‧‧ ribbon substrate

S1b‧‧‧下面 S1b‧‧‧ below

Q1‧‧‧第1塗佈液 Q1‧‧‧1st coating solution

F1‧‧‧第1塗佈膜 F1‧‧‧1st coating film

Q2‧‧‧第2塗佈液 Q2‧‧‧2nd coating solution

F2‧‧‧第2塗佈膜 F2‧‧‧2nd coating film

F3‧‧‧層合體 F3‧‧‧Layer

R‧‧‧捲筒體 R‧‧‧Roll body

A1‧‧‧樹脂材料 A1‧‧‧Resin materials

A2‧‧‧微粒子 A2‧‧‧Microparticles

A3‧‧‧樹脂層 A3‧‧‧ resin layer

A4‧‧‧多孔部 A4‧‧‧Porous Department

S3‧‧‧搬送構件 S3‧‧‧Transporting components

10、10A、10B、210、310、310A、410‧‧‧塗佈單元 10, 10A, 10B, 210, 310, 310A, 410‧‧‧ coating unit

11‧‧‧搬送部 11‧‧‧Transportation Department

11b‧‧‧支撐滾輪(第1滾輪) 11b‧‧‧Support roller (1st roller)

11c‧‧‧支撐滾輪(第2滾輪) 11c‧‧‧Support roller (2nd roller)

11e‧‧‧基材捲繞滾輪(捲繞部) 11e‧‧‧Substrate winding roller (winding section)

12‧‧‧第1噴嘴(第1塗佈部) 12‧‧‧1st nozzle (1st coating part)

13‧‧‧第2噴嘴(第2塗佈部) 13‧‧‧2nd nozzle (2nd coating part)

14‧‧‧乾燥部 14‧‧‧Drying Department

15‧‧‧主加熱部(加熱部) 15‧‧‧Main heating section (heating section)

16‧‧‧副加熱部(加熱部) 16‧‧‧Sub heating section (heating section)

17‧‧‧剝離部 17‧‧‧ peeling department

[圖1]表示本發明之第1實施形態之製造系統之一例的圖。 Fig. 1 is a view showing an example of a manufacturing system according to a first embodiment of the present invention.

[圖2]表示設置於本實施形態之塗佈單元之噴嘴之一例的圖。 Fig. 2 is a view showing an example of a nozzle provided in the coating unit of the embodiment.

[圖3]表示設置於本實施形態之塗佈單元之乾燥部之一例的圖。 Fig. 3 is a view showing an example of a drying unit provided in the coating unit of the embodiment.

[圖4]表示本實施形態之捲繞部之一例的斜視圖。 Fig. 4 is a perspective view showing an example of a winding portion of the embodiment.

[圖5]表示本實施形態之燒成單元之一例的斜視圖。 Fig. 5 is a perspective view showing an example of a firing unit of the embodiment.

[圖6]表示本實施形態之除去單元之一例的斜視圖。 Fig. 6 is a perspective view showing an example of a removing unit of the embodiment.

[圖7]表示本實施形態之醯亞胺系樹脂膜之製造過程之一例的圖。 Fig. 7 is a view showing an example of a manufacturing process of the quinone-based resin film of the present embodiment.

[圖8]表示變形例之塗佈單元之一例的圖。 Fig. 8 is a view showing an example of a coating unit of a modification.

[圖9]表示本發明之第2實施形態之塗佈單元之一例的圖。 Fig. 9 is a view showing an example of a coating unit according to a second embodiment of the present invention.

[圖10]表示本發明之第3實施形態之塗佈單元之一例的圖。 Fig. 10 is a view showing an example of a coating unit according to a third embodiment of the present invention.

[圖11]表示變形例之塗佈單元之一例的圖。 Fig. 11 is a view showing an example of a coating unit of a modification.

[圖12]表示本發明之第4實施形態之塗佈單元之一例的圖。 Fig. 12 is a view showing an example of a coating unit according to a fourth embodiment of the present invention.

[圖13]表示變形例之捲繞裝置之一例的圖。 Fig. 13 is a view showing an example of a winding device according to a modification.

[圖14]表示實施形態之分隔膜之一例的圖。 Fig. 14 is a view showing an example of a separator film of the embodiment.

本發明或本說明書中,層合體係指前述第1層及前述第2層所構成之未燒成膜。形成本發明之多孔性之醯亞胺系樹脂膜時,第1液體及第2液體中,聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺之中,使用各自同種的樹脂時,形成之前述第1層及前述第2層所構成之未燒成膜(或多孔性之醯亞胺系樹脂膜)實質為1層,但是形成微粒子之含有率不同之未燒成膜(或具有空孔率不同之區域之多孔性之醯亞胺系樹脂膜),故也包含第1液體及第2液體使用同種樹脂的情形,本發明或本說明書中稱為 層合體。 In the present invention or the present specification, the layered system refers to an unfired film composed of the first layer and the second layer. When the porous bismuth imide resin film of the present invention is formed, among the first liquid and the second liquid, the same species is used for polyamine, polyimine, polyamidimide or polyamine. In the case of the resin, the unfired film (or the porous yttrium-based resin film) formed of the first layer and the second layer is substantially one layer, but the content of the fine particles is not burned. The film (or a bismuth imine resin film having a porosity in a region having a different porosity) is also included in the first liquid and the second liquid, and is referred to in the present invention or in the present specification. Laminated body.

以下参照圖面說明本發明之實施形態。以下使用XYZ座標系,說明圖中的方向。此XYZ座標系中,與水平面平行的平面作為XY平面。與此XY平面平行的一方向標記為X方向,與X方向正交之方向標記為Y方向。又,與XY平面垂直的方向標記為Z方向。X方向、Y方向及Z方向之各自在圖中之箭頭方向為+方向,與箭頭方向相反的方向作為-方向來說明。 Embodiments of the present invention will be described below with reference to the drawings. The following uses the XYZ coordinate system to illustrate the direction in the figure. In this XYZ coordinate system, a plane parallel to the horizontal plane serves as an XY plane. One direction parallel to the XY plane is marked in the X direction, and the direction orthogonal to the X direction is marked in the Y direction. Further, the direction perpendicular to the XY plane is marked as the Z direction. The direction of the arrow in the X direction, the Y direction, and the Z direction in the figure is the + direction, and the direction opposite to the arrow direction is described as the - direction.

圖1表示製造系統SYS之一例的圖。圖1所示之製造系統SYS係製造多孔性樹脂膜F(多孔性之醯亞胺系樹脂膜)者。製造系統SYS具備:塗佈特定之塗佈液,形成未燒成膜FA的塗佈單元(塗佈裝置)10、將未燒成膜FA進行燒成形成燒成膜FB的燒成單元20、自燒成膜FB中除去微粒子,形成多孔性樹脂膜F的除去單元30及統合控制上述各單元的控制裝置(無圖示)。 Fig. 1 is a view showing an example of a manufacturing system SYS. The manufacturing system SYS shown in FIG. 1 is a porous resin film F (porous yttrium-based resin film). The manufacturing system SYS includes a coating unit (coating apparatus) 10 that forms a specific coating liquid, forms an unfired film FA, and a firing unit 20 that fires the unfired film FA to form a fired film FB. The removing unit 30 is formed by removing the fine particles from the fired film FB, and the removing unit 30 for forming the porous resin film F and the control device (not shown) for controlling the respective units described above are integrated.

製造系統SYS例如於上下2階層所構成,塗佈單元10被配置於2階部分,燒成單元20及除去單元30被配置於1階部分。配置於相同一階之燒成單元20及除去單元30,例如在Y方向排列配置,但是不限於此,例如也可於X方向或X方向與Y方向之合成方向排列配置。 The manufacturing system SYS is configured, for example, in the upper and lower layers, the coating unit 10 is disposed in the second-order portion, and the firing unit 20 and the removing unit 30 are disposed in the first-order portion. The firing unit 20 and the removing unit 30 disposed in the same order are arranged in the Y direction, for example. However, the firing unit 20 and the removing unit 30 are arranged in the Y direction, for example, in the X direction or the Y direction and the Y direction.

製造系統SYS之階層構造或各階之各單元的配置等,不限定於上述者,例如塗佈單元10及燒成單元20可配置於2階部分,除去單元30可被置於1階部分。 又,所有的單元也可配置於同一階。此時,各單元可一列配置或可以複數列配置。又,所有的單元也可配置於不同階層。 The hierarchical structure of the manufacturing system SYS or the arrangement of each unit of each step is not limited to the above. For example, the coating unit 10 and the firing unit 20 may be disposed in the second-order portion, and the removing unit 30 may be placed in the first-order portion. Also, all units can be configured in the same order. At this time, each unit can be configured in one column or in multiple columns. Also, all units can be configured at different levels.

製造系統SYS中,未燒成膜FA形成帶狀。塗佈單元10之+Y側(未燒成膜FA之搬送方向的前方)設置將帶狀之未燒成膜FA捲繞成捲筒狀之捲繞部40。燒成單元20之-Y側(未燒成膜FA之搬送方向的後方)設置將捲筒狀之未燒成膜FA往燒成單元20送出之送出部50。除去單元30之+Y側(燒成膜FB之搬送方向的前方)設置將多孔性樹脂膜F捲繞成捲筒狀的捲繞部60。 In the manufacturing system SYS, the unfired film FA is formed into a strip shape. The +Y side of the coating unit 10 (the front side in the conveyance direction of the unfired film FA) is provided with the winding portion 40 in which the strip-shaped unfired film FA is wound into a roll shape. The -Y side of the firing unit 20 (the rear side in the transport direction of the unfired film FA) is provided with the delivery portion 50 that feeds the unfired film FA of the roll shape to the firing unit 20. The +Y side of the removal unit 30 (the front side in the conveyance direction of the fired film FB) is provided with the winding portion 60 in which the porous resin film F is wound into a roll shape.

如此,由送出部50經由燒成單元20及除去單元30,至捲繞部60為止之區間(1階部分)係藉由所謂的捲對捲(roll-to-roll)方式來處理。因此,此區間係未燒成膜FA、燒成膜FB及多孔性樹脂膜F之各膜以連續狀態被搬送。 In this manner, the section (first-order portion) from the delivery unit 50 to the winding unit 60 via the firing unit 20 and the removal unit 30 is processed by a so-called roll-to-roll method. Therefore, in this section, each film of the unfired film FA, the fired film FB, and the porous resin film F is conveyed in a continuous state.

[塗佈液] [coating liquid]

在此,說明各單元之前,針對成為多孔性樹脂膜F之原料的塗佈液進行說明。塗佈液包含特定之樹脂材料、微粒子及溶劑。特定之樹脂材料,例如可列舉聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺、或聚醯胺。溶劑可使用可溶解此等之樹脂材料的有機溶劑。 Here, the coating liquid which becomes a raw material of the porous resin film F is demonstrated before each unit. The coating liquid contains specific resin materials, fine particles, and a solvent. Specific resin materials include, for example, polyaminic acid, polyimine, polyamidimide, or polyamine. As the solvent, an organic solvent which can dissolve the resin materials can be used.

本實施形態中,塗佈液可使用微粒子之含有率不同之2種類的塗佈液(第1塗佈液及第2塗佈液)。具 體而言,第1塗佈液係以微粒子之含有率高於第2塗佈液來調製。藉此,可擔保未燒成膜FA、燒成膜FB及多孔性樹脂膜F之強度及柔軟性。又,藉由設置微粒子之含有率較低的層,可達成降低多孔性樹脂膜F之製造成本。 In the present embodiment, two types of coating liquids (first coating liquid and second coating liquid) having different microparticle content ratios can be used as the coating liquid. With In the first embodiment, the first coating liquid is prepared such that the content ratio of the fine particles is higher than that of the second coating liquid. Thereby, the strength and flexibility of the unfired film FA, the fired film FB, and the porous resin film F can be secured. Moreover, by providing a layer having a low content of fine particles, it is possible to reduce the manufacturing cost of the porous resin film F.

例如,第1塗佈液中,以19:81~45:65之體積比含有樹脂材料與微粒子。又,第2塗佈液中,以20:80~50:50之體積比含有樹脂材料與微粒子。但是第1塗佈液之微粒子之含有率高於第2塗佈液之微粒子之含有率,來設定體積比。各樹脂材料之體積係使用各樹脂材料之質量乘以其比重所得的值。 For example, in the first coating liquid, a resin material and fine particles are contained in a volume ratio of 19:81 to 45:65. Further, in the second coating liquid, a resin material and fine particles are contained in a volume ratio of 20:80 to 50:50. However, the content ratio of the fine particles in the first coating liquid is higher than the content ratio of the fine particles in the second coating liquid, and the volume ratio is set. The volume of each resin material is a value obtained by multiplying the mass of each resin material by its specific gravity.

上述的情形,將第1塗佈液之體積全體設定為100時,微粒子之體積為65以上時,粒子為均勻分散,又,微粒子之體積為81以內時,粒子彼此不會凝聚而分散。因此,多孔性樹脂膜F可均勻形成孔。又,微粒子之體積比率在此範圍內時,可確保未燒成膜FA成膜時之剝離性。 In the above case, when the volume of the first coating liquid is set to 100, the particles are uniformly dispersed when the volume of the fine particles is 65 or more, and when the volume of the fine particles is 81 or less, the particles are not aggregated and dispersed. Therefore, the porous resin film F can uniformly form pores. Further, when the volume ratio of the fine particles is within this range, the peeling property at the time of film formation of the unfired film FA can be ensured.

第2塗佈液之體積全體設定為100時,微粒子之體積為50以上時,微粒子單體為均勻分散,又,微粒子之體積為80以內時,微粒子彼此不會凝聚,又,表面也不會產生龜裂等,因此,可安定形成電特性良好的多孔性樹脂膜F。 When the volume of the second coating liquid is 100, the volume of the fine particles is 50 or more, and the fine particles are uniformly dispersed. When the volume of the fine particles is 80 or less, the fine particles do not aggregate with each other, and the surface does not. Since cracks or the like are generated, the porous resin film F having good electrical characteristics can be stably formed.

上述2種類的塗佈液係藉由例如將預先分散有微粒子之溶劑與聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺以任意之比率混合來調製。又,也可在預先分散有 微粒子之溶劑中,使聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺進行聚合來調製。例如可在預先分散有微粒子之有機溶劑中,使四羧酸二酐及二胺進行聚合成為聚醯胺酸,或再進行醯亞胺成為聚醯亞胺化來製造。 The above two types of coating liquids are prepared by, for example, mixing a solvent in which fine particles are dispersed in advance with polyamine, polyimine, polyamidimide or polyamine at an arbitrary ratio. Also, it can be dispersed in advance The solvent of the microparticles is prepared by polymerizing polylysine, polyimine, polyamidamine or polyamine. For example, it can be produced by polymerizing a tetracarboxylic dianhydride and a diamine into a polyphthalic acid in an organic solvent in which fine particles are dispersed in advance, or by further performing ruthenium imidization.

塗佈液之黏度,最終較佳為300~2500cP,更佳為400~1500cP之範圍,又更佳為600~1200cP之範圍。塗佈液之黏度在此範圍內時,可均勻成膜。 The viscosity of the coating liquid is preferably from 300 to 2500 cP, more preferably from 400 to 1500 cP, and even more preferably from 600 to 1200 cP. When the viscosity of the coating liquid is within this range, the film can be uniformly formed.

上述塗佈液中,將微粒子與聚醯胺酸或聚醯亞胺進行乾燥作為未燒成膜FA時,微粒子之材質為後述無機材料時,微粒子/聚醯亞胺之比率成為2~6(質量比),來混合微粒子與聚醯胺酸或聚醯亞胺即可。更佳為3~5(質量比)。微粒子之材質為後述有機材料時,微粒子/聚醯亞胺之比率成為1~3.5(質量比),來混合微粒子與聚醯胺酸或聚醯亞胺即可。更佳為1.2~3(質量比)。又,作為未燒成膜FA時,微粒子/聚醯亞胺之體積比率成為1.5~4.5,來混合微粒子與聚醯胺酸或聚醯亞胺即可。更佳為1.8~3(體積比)。作為未燒成膜FA時,微粒子/聚醯亞胺之質量比或體積比在下限值以上時,分隔膜可得到適當密度的孔,在上限值以下時,不會產生黏度之增加或膜中之龜裂等之問題,可安定成膜。取代聚醯胺酸或聚醯亞胺,樹脂材料為聚醯胺醯亞胺或聚醯胺時,質量比也與上述同樣。 In the coating liquid, when the fine particles are dried with polyacrylic acid or polyimine as the unfired film FA, when the material of the fine particles is an inorganic material to be described later, the ratio of the fine particles/polyimine is 2 to 6 ( Mass ratio), it is sufficient to mix the fine particles with polyamic acid or polyimine. More preferably 3 to 5 (mass ratio). When the material of the fine particles is an organic material to be described later, the ratio of the fine particles/polyimine is 1 to 3.5 (mass ratio), and the fine particles may be mixed with polyamic acid or polyimine. More preferably 1.2 to 3 (mass ratio). Further, in the case of the unfired film FA, the volume ratio of the fine particles/polyimine is 1.5 to 4.5, and the fine particles may be mixed with polyamic acid or polyimine. More preferably, it is 1.8 to 3 (volume ratio). When the mass ratio or the volume ratio of the fine particles/polyimine is less than or equal to the lower limit value, the separator can obtain pores having an appropriate density, and when the amount is less than the upper limit, the viscosity does not increase or the film is formed. The problem of cracking in the middle can be stabilized into a film. When the polyacetamide or the polyimine is substituted, and the resin material is polyamidamine or polyamine, the mass ratio is also the same as described above.

以下具體說明各樹脂材料。 Each resin material will be specifically described below.

<聚醯胺酸> <polylysine>

本實施形態所用的聚醯胺酸係使任意之四羧酸二酐與二胺聚合所得者,無特別限定皆可使用。四羧酸二酐及二胺之使用量並無特殊限定,相對於四羧酸二酐1莫耳,較佳為使用二胺0.50~1.50莫耳,更佳為使用0.60~1.30莫耳,特佳為使用0.70~1.20莫耳。 The polyamic acid used in the present embodiment is not particularly limited as long as it is obtained by polymerizing any of the tetracarboxylic dianhydride and the diamine. The amount of the tetracarboxylic dianhydride and the diamine to be used is not particularly limited, and is preferably from 0.50 to 1.50 moles, more preferably from 0.60 to 1.30 moles, per mole of the tetracarboxylic dianhydride. Jia uses 0.70~1.20 moules.

四羧酸二酐可適宜選擇以往作為聚醯胺酸之合成原料使用的四羧酸二酐。四羧酸二酐可為芳香族四羧酸二酐、亦可為脂肪族四羧酸二酐,但是由所得之聚醯亞胺樹脂的耐熱性的觀點而言,較佳為使用芳香族四羧酸二酐。四羧酸二酐亦可組合2種以上使用。 As the tetracarboxylic dianhydride, a tetracarboxylic dianhydride which has been conventionally used as a synthetic raw material of polyamic acid can be suitably selected. The tetracarboxylic dianhydride may be an aromatic tetracarboxylic dianhydride or an aliphatic tetracarboxylic dianhydride, but from the viewpoint of heat resistance of the obtained polyamidene resin, aromatic four is preferably used. Carboxylic dianhydride. The tetracarboxylic dianhydride may be used in combination of two or more kinds.

芳香族四羧酸二酐之較佳的具體例,可列舉苯均四酸二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、雙(2,3-二羧基苯基)甲烷二酐、雙(3,4-二羧基苯基)甲烷二酐、3,3’,4,4’-聯苯基四羧酸二酐、2,3,3’,4’-聯苯基四羧酸二酐、2,2,6,6-聯苯基四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯基)-1,1,1,3,3,3-六氟丙烷二酐、2,2-雙(2,3-二羧基苯基)-1,1,1,3,3,3-六氟丙烷二酐、3,3’,4,4’-二苯甲酮四羧酸二酐、雙(3,4-二羧基苯基)醚二酐、雙(2,3-二羧基苯基)醚二酐、2,2’,3,3’-二苯甲酮四羧酸二酐、4,4-(p-伸苯基二氧)二鄰苯二甲酸二酐、4,4-(m-伸苯基二氧)二鄰苯二甲酸二酐、1,2,5,6-萘四羧酸二酐、1,4,5,8-萘四羧酸二酐、2,3,6,7-萘四羧酸二酐、1,2,3,4-苯四羧酸二酐、 3,4,9,10-苝四羧酸二酐、2,3,6,7-蒽四羧酸二酐、1,2,7,8-菲四羧酸二酐、9,9-雙鄰苯二甲酸酐茀、3,3’,4,4’-二苯基碸四羧酸二酐等。脂肪族四羧酸二酐,可列舉例如乙烯四羧酸二酐、丁烷四羧酸二酐、環戊烷四羧酸二酐、環己烷四羧酸二酐、1,2,4,5-環己烷四羧酸二酐、1,2,3,4-環己烷四羧酸二酐等。此等之中,由價格、獲得容易性等而言,較佳為3,3’,4,4’-聯苯基四羧酸二酐及苯均四酸二酐。又,此等四羧酸二酐亦可單獨或混合二種以上使用。 Preferred specific examples of the aromatic tetracarboxylic dianhydride include pyromellitic dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, and bis(2,3-di). Carboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4 '-biphenyltetracarboxylic dianhydride, 2,2,6,6-biphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2 - bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 3,3',4,4'-benzophenone tetracarboxylate Acid dianhydride, bis(3,4-dicarboxyphenyl)ether dianhydride, bis(2,3-dicarboxyphenyl)ether dianhydride, 2,2',3,3'-benzophenone tetracarboxylate Acid dianhydride, 4,4-(p-phenylenedioxy)diphthalic dianhydride, 4,4-(m-phenylenedioxy)diphthalic dianhydride, 1,2, 5,6-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,2,3,4-benzene Tetracarboxylic dianhydride, 3,4,9,10-decanetetracarboxylic dianhydride, 2,3,6,7-nonanetetracarboxylic dianhydride, 1,2,7,8-phenanthrenetetracarboxylic dianhydride, 9,9-double Bismuth phthalate, 3,3', 4,4'-diphenylphosphonium tetracarboxylic dianhydride, and the like. Examples of the aliphatic tetracarboxylic dianhydride include ethylene tetracarboxylic dianhydride, butane tetracarboxylic dianhydride, cyclopentane tetracarboxylic dianhydride, cyclohexane tetracarboxylic dianhydride, 1, 2, 4, 5-cyclohexanetetracarboxylic dianhydride, 1,2,3,4-cyclohexanetetracarboxylic dianhydride, and the like. Among these, 3,3',4,4'-biphenyltetracarboxylic dianhydride and pyromellitic dianhydride are preferable in terms of price, availability, and the like. Further, these tetracarboxylic dianhydrides may be used singly or in combination of two or more.

二胺可適宜選擇以往作為聚醯胺酸之合成原料使用的二胺。二胺可為芳香族二胺、亦可為脂肪族二胺,但是就所得之聚醯亞胺樹脂的耐熱性之觀點而言,較佳為芳香族二胺。此等二胺亦可組合2種以上使用。 As the diamine, a diamine which has been conventionally used as a synthetic raw material of polylysine can be suitably selected. The diamine may be an aromatic diamine or an aliphatic diamine, but from the viewpoint of heat resistance of the obtained polyimine resin, an aromatic diamine is preferred. These diamines can also be used in combination of 2 or more types.

芳香族二胺,可列舉鍵結有1個或2~10個左右之苯基的二胺基化合物。具體而言為苯二胺及其衍生物、二胺基聯苯化合物及其衍生物、二胺基二苯化合物及其衍生物、二胺基三苯化合物及其衍生物、二胺基萘及其衍生物、胺基苯基胺基二氫茚(Indane)及其衍生物、二胺基四苯化合物及其衍生物、二胺基六苯化合物及其衍生物、cardo型茀二胺衍生物。 The aromatic diamine may, for example, be a diamine compound having one or two to ten phenyl groups bonded thereto. Specifically, it is phenylenediamine and its derivatives, diaminobiphenyl compounds and derivatives thereof, diaminodiphenyl compounds and derivatives thereof, diaminotriphenyl compounds and derivatives thereof, diaminonaphthalenes and Its derivatives, aminophenylaminoindoline (Indane) and its derivatives, diaminotetraphenyl compounds and their derivatives, diaminohexabenzene compounds and their derivatives, cardo type quinone diamine derivatives .

苯二胺為m-苯二胺、p-苯二胺等,苯二胺衍生物為鍵結有甲基、乙基等之烷基的二胺,例如2,4-二胺基甲苯、2,4-三苯二胺等。 The phenylenediamine is m-phenylenediamine, p-phenylenediamine or the like, and the phenylenediamine derivative is a diamine to which an alkyl group such as a methyl group or an ethyl group is bonded, for example, 2,4-diaminotoluene, 2 , 4-triphenyldiamine, and the like.

二胺基聯苯化合物係2個胺基苯基以苯基彼此間鍵結者。例如為4,4’-二胺基聯苯、4,4’-二胺基-2,2’- 雙(三氟甲基)聯苯等。 The diaminobiphenyl compound is a group in which two aminophenyl groups are bonded to each other with a phenyl group. For example, 4,4'-diaminobiphenyl, 4,4'-diamino-2,2'- Bis(trifluoromethyl)biphenyl and the like.

二胺基二苯化合物係2個胺基苯基經由其他基,而以苯基彼此鍵結者。鍵結為醚鍵、磺醯基鍵、硫醚鍵、以伸烷基或其衍生物基之鍵結、亞胺基鍵、偶氮鍵、氧化膦鍵、醯胺鍵、伸脲基鍵等。伸烷基鍵係碳數為1~6左右者,其衍生物基係伸烷基之1個以上之氫原子被鹵素原子等取代者。 The diaminodiphenyl compound is one in which two aminophenyl groups are bonded to each other via a phenyl group. The bond is an ether bond, a sulfonyl bond, a thioether bond, a bond of an alkyl group or a derivative thereof, an imine bond, an azo bond, a phosphine oxide bond, a guanamine bond, a ureido bond, or the like. . When the alkyl group has a carbon number of about 1 to 6, the hydrogen atom of one or more of the alkyl groups of the derivative group is substituted by a halogen atom or the like.

二胺基二苯化合物之例,可列舉3,3’-二胺基二苯基醚、3,4’-二胺基二苯基醚、4,4’-二胺基二苯基醚、3,3’-二胺基二苯基碸、3,4’-二胺基二苯基碸、4,4’-二胺基二苯基碸、3,3’-二胺基二苯基甲烷、3,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基硫醚、3,3’-二胺基二苯基酮、3,4’-二胺基二苯基酮、2,2-雙(p-胺基苯基)丙烷、2,2’-雙(p-胺基苯基)六氟丙烷、4-甲基-2,4-雙(p-胺基苯基)-1-戊烯、4-甲基-2,4-雙(p-胺基苯基)-2-戊烯、亞胺基二苯胺、4-甲基-2,4-雙(p-胺基苯基)戊烷、雙(p-胺基苯基)氧化膦、4,4’-二胺基偶氮苯、4,4’-二胺基二苯基脲、4,4’-二胺基二苯基醯胺、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、4,4’-雙(4-胺基苯氧基)聯苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(4-胺基苯氧基)苯基]六氟丙烷等。 Examples of the diaminodiphenyl compound include 3,3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, and 4,4'-diaminodiphenyl ether. 3,3'-diaminodiphenylanthracene, 3,4'-diaminodiphenylanthracene, 4,4'-diaminodiphenylanthracene, 3,3'-diaminodiphenyl Methane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl sulfide, 3,3'-diamine Diphenyl ketone, 3,4'-diaminodiphenyl ketone, 2,2-bis(p-aminophenyl)propane, 2,2'-bis(p-aminophenyl)hexafluoropropane , 4-methyl-2,4-bis(p-aminophenyl)-1-pentene, 4-methyl-2,4-bis(p-aminophenyl)-2-pentene, sub Aminodiphenylamine, 4-methyl-2,4-bis(p-aminophenyl)pentane, bis(p-aminophenyl)phosphine oxide, 4,4'-diaminoazobenzene, 4,4'-diaminodiphenylurea, 4,4'-diaminodiphenylguanamine, 1,4-bis(4-aminophenoxy)benzene, 1,3-double (4 -aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 4,4'-bis(4-aminophenoxy)biphenyl, bis[4-(4- Aminophenoxy)phenyl]indole, bis[4-(3-aminophenoxy)phenyl]anthracene, 2,2-bis[4-(4-amine Phenoxy) phenyl] propane, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane.

此等之中,就價格、獲得容易性等而言,較 佳為p-苯二胺、m-苯二胺、2,4-二胺基甲苯及4,4’-二胺基二苯基醚。 Among these, in terms of price, ease of access, etc. Preferred are p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene and 4,4'-diaminodiphenyl ether.

二胺基三苯化合物係2個胺基苯基與1個伸苯基均經由其他的基鍵結者,其他的基係選擇與二胺基二苯化合物相同者。二胺基三苯化合物之例,可列舉1,3-雙(m-胺基苯氧基)苯、1,3-雙(p-胺基苯氧基)苯、1,4-雙(p-胺基苯氧基)苯等。 The diaminotriphenyl compound is one in which two aminophenyl groups and one phenylene group are bonded via another group, and the other groups are selected to be the same as the diaminobiphenyl compound. Examples of the diaminotriphenyl compound include 1,3-bis(m-aminophenoxy)benzene, 1,3-bis(p-aminophenoxy)benzene, and 1,4-bis(p). -Aminophenoxy)benzene and the like.

二胺基萘之例,可列舉1,5-二胺基萘及2,6-二胺基萘。 Examples of the diaminonaphthalenes include 1,5-diaminonaphthalene and 2,6-diaminonaphthalene.

胺基苯基胺基二氫茚之例,可列舉5或6-胺基-1-(p-胺基苯基)-1,3,3-三甲基二氫茚。 Examples of the aminophenylaminoindoline are 5 or 6-amino-1-(p-aminophenyl)-1,3,3-trimethylindoline.

二胺基四苯化合物之例,可列舉4,4’-雙(p-胺基苯氧基)聯苯、2,2’-雙[p-(p’-胺基苯氧基)苯基]丙烷、2,2’-雙[p-(p’-胺基苯氧基)聯苯基]丙烷、2,2’-雙[p-(m-胺基苯氧基)苯基]二苯甲酮等。 Examples of the diaminotetraphenyl compound include 4,4'-bis(p-aminophenoxy)biphenyl and 2,2'-bis[p-(p'-aminophenoxy)phenyl group. Propane, 2,2'-bis[p-(p'-aminophenoxy)biphenyl]propane, 2,2'-bis[p-(m-aminophenoxy)phenyl]di Benzophenone and the like.

cardo型茀二胺衍生物可列舉9,9-雙苯胺茀等。 The cardo type quinone diamine derivative may, for example, be 9,9-bisaniline oxime or the like.

脂肪族二胺例如碳數為2~15左右者,具體而言可列舉五亞甲二胺、六亞甲二胺、七亞甲二胺等。 The aliphatic diamine has a carbon number of, for example, about 2 to 15, and specific examples thereof include pentaethylenediamine, hexamethylenediamine, and heptylenediamine.

再者,亦可為此等二胺之氫原子被由鹵素原子、甲基、甲氧基、氰基、苯基等群中選擇之至少1種的取代基取代的化合物。 Further, a compound in which a hydrogen atom of the diamine is substituted with at least one substituent selected from the group consisting of a halogen atom, a methyl group, a methoxy group, a cyano group, and a phenyl group may also be used.

製造本實施形態所用之聚醯胺酸的手段並無特殊限制,例如可使用於有機溶劑中,使酸、二胺成分反 應的方法等習知的手法。 The means for producing the poly-proline used in the present embodiment is not particularly limited, and for example, it can be used in an organic solvent to reverse the acid and diamine components. The method of the application, such as the method.

四羧酸二酐與二胺之反應,通常在有機溶劑中進行。四羧酸二酐與二胺之反應所使用之有機溶劑,只要可溶解四羧酸二酐及二胺,且不與四羧酸二酐及二胺反應者,則無特別限定。有機溶劑可單獨或混合2種以上使用。 The reaction of the tetracarboxylic dianhydride with the diamine is usually carried out in an organic solvent. The organic solvent used for the reaction between the tetracarboxylic dianhydride and the diamine is not particularly limited as long as it can dissolve the tetracarboxylic dianhydride and the diamine and does not react with the tetracarboxylic dianhydride or the diamine. The organic solvent may be used singly or in combination of two or more.

四羧酸二酐與二胺之反應所用的有機溶劑之例,可列舉N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺、N,N-二乙基甲醯胺、N-甲基己內醯胺、N,N,N’,N’-四甲基脲等之含氮極性溶劑;β-丙內酯、γ-丁內酯、γ-戊內酯、δ-戊內酯、γ-己內酯、ε-己內酯等之內酯系極性溶劑;二甲基亞碸;乙腈;乳酸乙酯、乳酸丁酯等之脂肪酸酯類;二乙二醇二甲基醚、二乙二醇二乙基醚、二噁烷、四氫呋喃、甲基賽珞蘇乙酸酯、乙基賽珞蘇乙酸酯等之醚類;甲酚類等之酚系溶劑。此等有機溶劑可單獨或混合2種以上使用。有機溶劑之使用量並無特別限定,但較佳為使生成之聚醯胺酸的含量為5~50質量%。 Examples of the organic solvent used for the reaction of the tetracarboxylic dianhydride and the diamine include N-methyl-2-pyrrolidone, N,N-dimethylacetamide, and N,N-diethylacetamidine. Amine, N,N-dimethylformamide, N,N-diethylformamide, N-methylcaprolactam, N,N,N',N'-tetramethylurea, etc. Nitrogen polar solvent; lactone-based polar solvent such as β-propiolactone, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone; dimethyl Acetone; acetonitrile; fatty acid esters such as ethyl lactate and butyl lactate; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dioxane, tetrahydrofuran, methyl cyproterone acetate An ether such as ethyl acetaminophen; a phenolic solvent such as cresol. These organic solvents may be used alone or in combination of two or more. The amount of the organic solvent used is not particularly limited, but it is preferably such that the content of the produced polyamine is 5 to 50% by mass.

此等有機溶劑之中,就生成之聚醯胺酸的溶解性而言,較佳為N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺、N,N-二乙基甲醯胺、N-甲基己內醯胺、N,N,N’,N’-四甲基脲等之含氮極性溶劑。 Among these organic solvents, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-di are preferable in terms of solubility of the produced polylysine. Ethyl acetamide, N,N-dimethylformamide, N,N-diethylformamide, N-methylcaprolactam, N,N,N',N'-tetramethyl A nitrogen-containing polar solvent such as urea.

聚合溫度一般為-10~120℃、較佳為5~30℃。 聚合時間雖依所使用之原料組成而異,通常為3~24Hr(小時)。又,如此條件下所得到之聚醯胺酸之有機溶劑溶液的固有黏度,較佳為1000~10萬cP(百分泊)、又更佳為5000~7萬cP之範圍。 The polymerization temperature is usually -10 to 120 ° C, preferably 5 to 30 ° C. The polymerization time varies depending on the composition of the raw materials used, and is usually from 3 to 24 hours (hours). Further, the organic solvent solution of the polyamic acid obtained under such conditions preferably has an intrinsic viscosity of from 1,000 to 100,000 cP (percentage of poise) and more preferably from 5,000 to 70,000 cp.

<聚醯亞胺> <polyimine]

本實施形態所使用之聚醯亞胺,只要可溶解塗佈液所使用之有機溶劑的可溶性聚醯亞胺,則其結構或分子量並無限定,可使用習知者。關於聚醯亞胺,亦可於側鏈具有羧基等之可縮合的官能基或於燒成時會促進交聯反應等之官能基。 The polyimine used in the present embodiment is not limited as long as it can dissolve the soluble polyimine of the organic solvent used in the coating liquid, and a conventional one can be used. The polyimine may have a condensable functional group such as a carboxyl group in the side chain or a functional group which promotes a crosslinking reaction or the like at the time of firing.

為了成為可溶於有機溶劑的聚醯亞胺,可使用於主鏈導入柔軟之彎曲構造之單體,例如可使用乙二胺、六亞甲二胺、1,4-二胺基環己烷、1,3-二胺基環己烷、4,4’-二胺基二環己基甲烷等之脂肪族二胺;2-甲基-1,4-苯二胺、o-聯甲苯胺、m-聯甲苯胺、3,3’-二甲氧基聯苯胺、4,4’-二胺基苯甲醯苯胺等之芳香族二胺;聚氧乙烯二胺、聚氧丙烯二胺、聚氧丁烯二胺等之聚氧化烯二胺;聚矽氧烷二胺;2,3,3’,4’-氧二鄰苯二甲酸酐、3,4,3’,4’-氧二鄰苯二甲酸酐、2,2-雙(4-羥基苯基)丙烷二苯甲酸酯-3,3’,4,4’-四羧酸二酐等。又,使用具有提高對有機溶劑之溶解性的官能基之單體,例如可使用2,2’-雙(三氟甲基)-4,4’-二胺基聯苯、2-三氟甲基-1,4-苯二胺等之氟化二胺。此外,除了提高上述聚醯亞胺之溶解性用的單體外,於不 阻礙溶解性之範圍內,可併用與上述聚醯胺酸之欄所記載者相同的單體。 In order to be a polyimine soluble in an organic solvent, a monomer for introducing a main chain into a soft curved structure can be used, for example, ethylenediamine, hexamethylenediamine, 1,4-diaminocyclohexane can be used. An aliphatic diamine such as 1,3-diaminocyclohexane or 4,4'-diaminodicyclohexylmethane; 2-methyl-1,4-phenylenediamine, o-tolidine; An aromatic diamine such as m-tolidine, 3,3'-dimethoxybenzidine or 4,4'-diaminobenzimidamide; polyoxyethylene diamine, polyoxypropylene diamine, poly Polyoxyalkylene diamine such as oxybutylene diamine; polyoxyalkylene diamine; 2,3,3',4'-oxydiphthalic anhydride, 3,4,3',4'-oxygen Phthalic anhydride, 2,2-bis(4-hydroxyphenyl)propane dibenzoate-3,3',4,4'-tetracarboxylic dianhydride, and the like. Further, a monomer having a functional group for improving solubility in an organic solvent is used, and for example, 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl, 2-trifluoromethyl can be used. A fluorinated diamine such as 1,4-phenylenediamine. In addition, in addition to the monomer for improving the solubility of the above polyimine, The same monomers as those described in the above column of polyamic acid can be used in combination within the range in which the solubility is inhibited.

本發明所用之製造可溶解於有機溶劑之聚醯亞胺的手段,並無特別限定,例如可使用將聚醯胺酸進行化學醯亞胺化或加熱醯亞胺化,使溶解於有機溶劑之方法等之習知手法。這種聚醯亞胺,可列舉脂肪族聚醯亞胺(全脂肪族聚醯亞胺)、芳香族聚醯亞胺等,較佳為芳香族聚醯亞胺。芳香族聚醯亞胺可為將具有如式(1)所示之重複單位的聚醯胺酸藉由熱或化學閉環反應而取得者、或將具有如式(2)所示之重複單位的聚醯亞胺溶解於溶劑者。式中Ar表示芳基。 The means for producing the polyimine which can be dissolved in the organic solvent used in the present invention is not particularly limited, and for example, polyacrylic acid can be chemically imidized or heated by imidization to dissolve in an organic solvent. Methods such as methods. Examples of the polyimine are aliphatic polyimine (all aliphatic polyimine), aromatic polyimine, and the like, and aromatic polyimine is preferred. The aromatic polyimine may be obtained by a thermal or chemical ring closure reaction of a polylysine having a repeating unit represented by the formula (1), or may have a repeating unit as shown in the formula (2). Polyimine dissolved in solvent. Wherein Ar represents an aryl group.

<聚醯胺醯亞胺> <polyamidoquinone imine>

本實施形態所使用的聚醯胺醯亞胺,只要是可溶解於塗佈液所使用之有機溶劑的可溶性聚醯胺醯亞胺,則不限制其構造或分子量,可使用習知者。關於聚醯胺醯亞胺,其側鏈可具有羧基等的可縮合的官能基或燒成時促進交聯反應等的官能基。 The polyamidoximine used in the present embodiment is not limited to its structure or molecular weight as long as it is a soluble polyamidoquinone which can be dissolved in an organic solvent used in the coating liquid, and a conventional one can be used. The polyamidoquinone may have a side chain having a condensable functional group such as a carboxyl group or a functional group which promotes a crosslinking reaction upon firing.

本實施形態所使用之聚醯胺醯亞胺,無特別限制地可使用使任意偏苯三甲酸酐與二異氰酸酯反應而得到者、或藉由任意偏苯三甲酸酐的反應性衍生物與二胺之反應得到的前驅物聚合物進行醯亞胺化而得者。 The polyamidoximine used in the present embodiment can be obtained by reacting any trimellitic anhydride with a diisocyanate or by using a reactive derivative of any trimellitic anhydride and a diamine, without particular limitation. The precursor polymer obtained by the reaction is obtained by ruthenium imidization.

上述任意的偏苯三甲酸酐或其反應性衍生物,可列舉例如偏苯三甲酸酐、偏苯三甲酸酐氯化物等的偏苯三甲酸酐鹵素化物、偏苯三甲酸酐酯等。 Examples of the above-mentioned trimellitic anhydride or a reactive derivative thereof include trimellitic anhydride halides such as trimellitic anhydride and trimellitic anhydride chloride, and trimellitic anhydride.

二異氰酸酯可列舉例如間伸苯基二異氰酸酯、p-伸苯基二異氰酸酯、4,4’-氧基雙(苯基異氰酸酯)、4,4’-二異氰酸酯二苯基甲烷、雙[4-(4-異氰酸酯苯氧基)苯基]碸、2,2’-雙[4-(4-異氰酸酯苯氧基)苯基]丙烷等。 The diisocyanate may, for example, be an exophenylene diisocyanate, p-phenylene diisocyanate, 4,4'-oxybis(phenyl isocyanate), 4,4'-diisocyanate diphenylmethane, or a double [4- (4-Isocyanate phenoxy)phenyl]anthracene, 2,2'-bis[4-(4-isocyanatephenoxy)phenyl]propane, and the like.

二胺可列舉與在前述聚醯胺酸之說明中所例示相同者。 The diamine can be exemplified by the same as exemplified in the description of the aforementioned polyamic acid.

<聚醯胺> <polyamide>

聚醯胺較佳為由二羧酸與二胺所得之聚醯胺,特佳為芳香族聚醯胺。 The polyamine is preferably a polyamine obtained from a dicarboxylic acid and a diamine, and particularly preferably an aromatic polyamine.

二羧酸可列舉馬來酸、富馬酸、伊康酸、甲 基馬來酸、二甲基馬來酸、苯基馬來酸、氯馬來酸、二氯馬來酸、氟馬來酸、苯二甲酸、間苯二甲酸、對苯二甲酸及聯苯甲酸(Diphenic acid)等。 Examples of the dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, and A. Kamalyx, dimethyl maleic acid, phenyl maleic acid, chloromaleic acid, dichloromaleic acid, fluoromaleic acid, phthalic acid, isophthalic acid, terephthalic acid and biphenyl Diphenic acid and the like.

二胺可列舉與前述聚醯胺酸之說明例示者同樣者。 The diamine may be the same as the illustrative example of the above polyamic acid.

<微粒子> <microparticle>

接著,說明微粒子。微粒子可使用例如真球率高,且粒徑分布指數小者。這種微粒子於液體中之分散性優,成為互不凝集的狀態。微粒子的粒徑(平均直徑),例如可設定為100~2000nm左右。藉由使用如上述微粒子,在其後的步驟去除微粒子,可使所得之多孔性樹脂膜F的孔徑一致。可使施加於藉由多孔性樹脂膜F形成之分隔膜的電場均勻化。 Next, the fine particles will be described. The microparticles can be used, for example, in which the true spherical ratio is high and the particle size distribution index is small. Such fine particles are excellent in dispersibility in a liquid, and are in a state in which they do not aggregate. The particle diameter (average diameter) of the fine particles can be set, for example, to about 100 to 2000 nm. By using the fine particles as described above and removing the fine particles in the subsequent steps, the pore diameter of the obtained porous resin film F can be made uniform. The electric field applied to the separator film formed by the porous resin film F can be made uniform.

微粒子之材質,只要不溶於塗佈液所含之溶劑,且其後步驟可自多孔性樹脂膜F中去除的材質時,無特別限定,可採用習知者。例如,無機材料可列舉二氧化矽(silica)、氧化鈦、氧化鋁(Al2O3)等之金屬氧化物。有機材料可列舉高分子量烯烴(聚丙烯、聚乙烯等)、聚苯乙烯、環氧樹脂、纖維素、聚乙烯醇、聚乙烯丁醛(polyvinyl butyral)、聚酯、聚甲基丙烯酸甲酯、聚醚等之有機高分子微粒子。微粒子之一例可列舉(單分散)球狀二氧化矽粒子等之矽溶膠、碳酸鈣等。此時,可使多孔性樹脂膜F之孔徑更均勻。 The material of the fine particles is not particularly limited as long as it is insoluble in the solvent contained in the coating liquid, and the subsequent step can be removed from the porous resin film F, and a conventional one can be used. For example, examples of the inorganic material include metal oxides such as silica, titanium oxide, and aluminum oxide (Al 2 O 3 ). Examples of the organic material include high molecular weight olefins (polypropylene, polyethylene, etc.), polystyrene, epoxy resin, cellulose, polyvinyl alcohol, polyvinyl butyral, polyester, polymethyl methacrylate, Organic polymer microparticles such as polyether. Examples of the fine particles include a ruthenium sol such as (monodisperse) spherical cerium oxide particles, calcium carbonate, and the like. At this time, the pore diameter of the porous resin film F can be made more uniform.

又,第1塗佈液所含有之微粒子與第2塗佈液所含有之微粒子,在真球率、粒徑、材料等之各方面可相同或彼此相異。第1塗佈液所含有之微粒子,其粒徑分布指數比第2塗佈液所含有之微粒子小或相同較佳。或第1塗佈液所含有之微粒子,其真球率比第2塗佈液所含有之微粒子小或相同較佳。又,第1塗佈液所含有之微粒子,其微粒子之粒徑(平均直徑)比第2塗佈液所含有之微粒子小為佳,特別是第1塗佈液所含有之微粒子為100~1000nm(更佳為100~600nm),第2塗佈液所含有之微粒子為500~2000nm(更佳為700~2000nm)較佳。第1塗佈膜所含有之微粒子之粒徑藉由使用比第2塗佈液所含有之微粒子之粒徑小者,可使多孔性樹脂膜F表面之孔之開口比例高且均勻。又,相較於多孔性樹脂膜F全體為第1塗佈液所含有之微粒子之粒徑的情形,可更提高膜的強度。 Further, the fine particles contained in the first coating liquid and the fine particles contained in the second coating liquid may be the same or different from each other in terms of true spherical ratio, particle diameter, material, and the like. The fine particles contained in the first coating liquid preferably have a smaller particle size distribution index than the fine particles contained in the second coating liquid. The fine particles contained in the first coating liquid preferably have a lower true spherical ratio than the fine particles contained in the second coating liquid. Further, the fine particles contained in the first coating liquid have a smaller particle diameter (average diameter) than the fine particles contained in the second coating liquid, and particularly, the fine particles contained in the first coating liquid are 100 to 1000 nm. (more preferably, it is 100 to 600 nm), and the fine particles contained in the second coating liquid are preferably 500 to 2000 nm (more preferably 700 to 2000 nm). When the particle diameter of the fine particles contained in the first coating film is smaller than the particle diameter of the fine particles contained in the second coating liquid, the opening ratio of the pores on the surface of the porous resin film F can be made high and uniform. Moreover, the strength of the film can be further improved as compared with the case where the entire porous resin film F is the particle diameter of the fine particles contained in the first coating liquid.

又,上述塗佈液除了特定之樹脂材料、微粒子及溶劑外,必要時也可含有脫模劑、分散劑、縮合劑、醯亞胺化劑、界面活性劑等各種的添加劑。 Further, the coating liquid may contain various additives such as a release agent, a dispersant, a condensing agent, a ruthenium imidating agent, and a surfactant, in addition to a specific resin material, fine particles, and a solvent.

[塗佈單元] [Coating unit]

本實施形態之塗佈單元10具有搬送部11、第1噴嘴(第1塗佈部)12、第2噴嘴(第2塗佈部)13、乾燥部14、主加熱部(加熱部)15、副加熱部(加熱部)16及剝離部17。 The coating unit 10 of the present embodiment includes a conveying unit 11, a first nozzle (first coating unit) 12, a second nozzle (second coating unit) 13, a drying unit 14, and a main heating unit (heating unit) 15, The sub heating unit (heating unit) 16 and the peeling unit 17 are provided.

搬送部11具有帶狀基材(基材)S1、基材送出滾輪11a、支撐滾輪(第1滾輪)11b、支撐滾輪(第2滾輪)11c、 支撐滾輪11d、基材捲繞滾輪11e及搬出滾輪11f。 The conveyance unit 11 has a belt-shaped base material (base material) S1, a base material delivery roller 11a, a support roller (first roller) 11b, a support roller (second roller) 11c, The support roller 11d, the substrate winding roller 11e, and the carry-out roller 11f.

帶狀基材S1係形成帶狀。帶狀基材S1係由基材送出滾輪11a送出,具有張力跨接於支撐滾輪11b~11d,藉由基材捲繞滾輪11e捲繞。因此,帶狀基材S1之下面S1b係藉由支撐滾輪11b~11d引導。帶狀基材S1之材質,可列舉例如聚對苯二甲酸乙二酯(PET)等,但是不限於此等,也可為不銹鋼等之金屬材料。 The belt-shaped base material S1 is formed into a belt shape. The belt-shaped base material S1 is fed by the base material feed roller 11a, and has a tension across the support rollers 11b to 11d, and is wound by the base material winding roller 11e. Therefore, the lower surface S1b of the strip-shaped substrate S1 is guided by the support rollers 11b to 11d. The material of the belt-shaped base material S1 may, for example, be polyethylene terephthalate (PET), but is not limited thereto, and may be a metal material such as stainless steel.

各滾輪11a~11f例如形成圓筒狀,各自與X方向平行配置。又,各滾輪11a~11f不限於與X方向平行的配置,至少1個為對於X方向,可以傾斜配置。例如,各滾輪11a~11f為與Z方向平行配置,Z方向之高度位置可相同來配置。此時,帶狀基材S1係對於水平面(XY平面),以直立狀態沿著水平面移動。 Each of the rollers 11a to 11f is formed, for example, in a cylindrical shape, and is disposed in parallel with the X direction. Further, each of the rollers 11a to 11f is not limited to the arrangement parallel to the X direction, and at least one of them may be disposed obliquely with respect to the X direction. For example, the rollers 11a to 11f are arranged in parallel with the Z direction, and the height positions in the Z direction can be arranged in the same manner. At this time, the strip-shaped substrate S1 moves in the erect state along the horizontal plane with respect to the horizontal plane (XY plane).

基材送出滾輪11a係纏繞有帶狀基材S1的狀態來配置。支撐滾輪11b係配置於基材送出滾輪11a之+Z側,同時被配置於比基材送出滾輪11a更靠近-Y側。又,支撐滾輪11c係配置於支撐滾輪11b之+Z側,同時被配置於比支撐滾輪11b更靠近+Y側。藉由此3個滾輪(基材送出滾輪11a、支撐滾輪11b、11c)之配置,帶狀基材S1係以含有支撐滾輪11b之-Y側端部的面支撐。 The substrate feeding roller 11a is disposed in a state in which the belt-shaped base material S1 is wound. The support roller 11b is disposed on the +Z side of the substrate feed roller 11a, and is disposed closer to the -Y side than the substrate feed roller 11a. Further, the support roller 11c is disposed on the +Z side of the support roller 11b, and is disposed closer to the +Y side than the support roller 11b. By the arrangement of the three rollers (the substrate feeding roller 11a and the supporting rollers 11b and 11c), the belt-shaped base material S1 is supported by a surface including the end portion on the -Y side of the supporting roller 11b.

又,支撐滾輪11d係配置於支撐滾輪11c之+Y側,同時被配置於支撐滾輪11c之-Z側。此時,藉由支撐滾輪11b~11d之3個滾輪之配置,帶狀基材S1係以含有支撐滾輪11c之+Z側端部的面支撐。 Further, the support roller 11d is disposed on the +Y side of the support roller 11c, and is disposed on the -Z side of the support roller 11c. At this time, the belt-shaped base material S1 is supported by the surface including the +Z-side end portion of the support roller 11c by the arrangement of the three rollers supporting the rollers 11b to 11d.

又,支撐滾輪11d可被置於與支撐滾輪11c之高度位置(Z方向之位置)大致同等高度位置。此時,帶狀基材S1係由支撐滾輪11c朝向支撐滾輪11d,以與XY平面大致平行的狀態,被送至+Y方向。 Further, the support roller 11d can be placed at substantially the same height position as the height position (position in the Z direction) of the support roller 11c. At this time, the belt-shaped base material S1 is fed to the support roller 11d by the support roller 11c, and is sent to the +Y direction in a state substantially parallel to the XY plane.

基材捲繞滾輪11e係被配置於支撐滾輪11d之-Z側。由支撐滾輪11d朝向基材捲繞滾輪11e,帶狀基材S1係被送至-Z方向。搬出滾輪11f係被配置於在支撐滾輪11d之+Y側,且-Z側。搬出滾輪11f係將以主加熱部15形成的未燒成膜FA送至+Y方向。此未燒成膜FA藉由搬出滾輪11f,搬出至塗佈單元10之外部。 The substrate winding roller 11e is disposed on the -Z side of the support roller 11d. The support roller 12d is wound toward the base material winding roller 11e, and the belt-shaped base material S1 is sent to the -Z direction. The carry-out roller 11f is disposed on the +Y side of the support roller 11d and on the -Z side. The unloading roller 11f sends the unfired film FA formed by the main heating unit 15 to the +Y direction. This unfired film FA is carried out to the outside of the coating unit 10 by carrying out the roller 11f.

上述滾輪11a~11f不限於圓筒形,也可形成錐型之冠部(CROWN)。此時,對於滾輪11a~11f之鬆弛補正有用,帶狀基材S1或後述之未燒成膜FA可與滾輪11a~11f均等接觸。又,滾輪11a~11f也可形成輻射型之冠部。此時,可有效防止帶狀基材S1或未燒成膜FA之蛇行。又,滾輪11a~11f也可形成凹(CONCAVE)型之冠部(X方向之中央部為凹形彎曲的部分)。此時,將張力賦予X方向,可搬送帶狀基材S1或未燒成膜FA,故可有效防止皺紋之發生。對於以下的滾輪,與上述同樣,也可為具有錐型、輻射型、凹型等之冠部的構成。 The rollers 11a to 11f are not limited to a cylindrical shape, and a tapered crown portion (CROWN) may be formed. At this time, it is useful for the relaxation correction of the rollers 11a to 11f, and the belt-shaped base material S1 or the unfired film FA described later can be brought into uniform contact with the rollers 11a to 11f. Further, the rollers 11a to 11f can also form a crown portion of a radiation type. At this time, it is possible to effectively prevent the meandering of the belt-shaped base material S1 or the unfired film FA. Further, the rollers 11a to 11f may be formed in a crown portion of a CONCAVE type (a portion in which the central portion in the X direction is concavely curved). At this time, the tension is imparted to the X direction, and the belt-shaped base material S1 or the unfired film FA can be conveyed, so that the occurrence of wrinkles can be effectively prevented. The following roller may have a configuration of a crown portion such as a tapered shape, a radiation type, or a concave shape, as described above.

圖2(a)表示第1噴嘴12之一例的斜視圖。如圖1及圖2(a)所示,第1噴嘴12係於帶狀基材S1之上面S1a形成第1塗佈液Q1之塗佈膜(以下為第1塗佈膜F1)。第1噴嘴12具有吐出第1塗佈液Q1之吐出口 12a。例如以長度方向與帶狀基材S1之X方向之尺寸大致相同來形成吐出口12a。 Fig. 2(a) is a perspective view showing an example of the first nozzle 12. As shown in FIG. 1 and FIG. 2( a ), the first nozzle 12 is a coating film (hereinafter referred to as a first coating film F1 ) in which the first coating liquid Q1 is formed on the upper surface S1 a of the belt-shaped base material S1 . The first nozzle 12 has a discharge port for discharging the first coating liquid Q1. 12a. For example, the discharge port 12a is formed in the longitudinal direction substantially the same as the dimension of the strip-shaped base material S1 in the X direction.

第1噴嘴12係配置於吐出位置P1。吐出位置P1係相對於支撐滾輪11b為-Y方向上的位置。第1噴嘴12係吐出口12a朝向+Y方向,以傾斜來配置。因此,吐出口12a係朝向帶狀基材S1之中,以支撐滾輪11b之-Y側端部支撐的部分。第1噴嘴12係對於此帶狀基材S1之上面S1a,由吐出口12a沿著水平方向(Y方向)吐出第1塗佈液Q1。 The first nozzle 12 is disposed at the discharge position P1. The discharge position P1 is a position in the -Y direction with respect to the support roller 11b. The first nozzle 12 is disposed such that the discharge port 12a faces the +Y direction and is inclined. Therefore, the discharge port 12a faces the belt-shaped base material S1 to support the portion supported by the -Y side end portion of the roller 11b. The first nozzle 12 discharges the first coating liquid Q1 in the horizontal direction (Y direction) from the discharge port 12a with respect to the upper surface S1a of the belt-shaped base material S1.

第1噴嘴12例如可往Y方向移動來形成。因此,第1噴嘴12對於帶狀基材S1可往靠近的方向(+Y方向)及疏遠(alienate)的方向(-Y方向)移動。又,第1噴嘴12也可往X方向或Z方向移動。又,第1噴嘴12可設置成可繞著與X方向平行之軸線旋轉。 The first nozzle 12 can be formed, for example, by moving in the Y direction. Therefore, the first nozzle 12 moves in the direction (+Y direction) and the alienation direction (-Y direction) in which the belt-shaped base material S1 can approach. Further, the first nozzle 12 can also move in the X direction or the Z direction. Further, the first nozzle 12 may be provided to be rotatable about an axis parallel to the X direction.

圖2(b)係表示第2噴嘴13之一例的斜視圖。如圖1及圖2(b)所示,第2噴嘴13係在帶狀基材S1上,與第1塗佈膜F1重疊以形成第2塗佈液Q2之塗佈膜(以下為第2塗佈膜F2)。第2噴嘴13具有吐出第2塗佈液Q2之吐出口13a。例如長度方向與帶狀基材S1之X方向之尺寸大致相同,以形成吐出口13a。 Fig. 2(b) is a perspective view showing an example of the second nozzle 13. As shown in FIG. 1 and FIG. 2(b), the second nozzle 13 is formed on the belt-shaped base material S1 and overlaps with the first coating film F1 to form a coating film of the second coating liquid Q2 (hereinafter referred to as the second Coating film F2). The second nozzle 13 has a discharge port 13a for discharging the second coating liquid Q2. For example, the longitudinal direction is substantially the same as the dimension of the strip-shaped substrate S1 in the X direction to form the discharge port 13a.

第2噴嘴13配置於吐出位置P2。吐出位置P2係與支撐滾輪11c對應的位置,相對於支撐滾輪11c為+Z方向上之位置。第2噴嘴13係使吐出口13a朝向-Z方向來配置。因此,吐出口13a係朝向帶狀基材S1之 中,以支撐滾輪11c之+Z側端部支撐的部分。第2噴嘴13係對於此帶狀基材S1,由吐出口13a沿著重力方向(Z方向)吐出第2塗佈液Q2。因此,第1噴嘴12及第2噴嘴13係各自之吐出方向(水平方向及重力方向:塗佈方向)互相交叉來配置。 The second nozzle 13 is disposed at the discharge position P2. The discharge position P2 is a position corresponding to the support roller 11c, and is located in the +Z direction with respect to the support roller 11c. The second nozzle 13 is disposed such that the discharge port 13a faces the -Z direction. Therefore, the discharge port 13a faces the strip-shaped substrate S1. The portion supported by the +Z side end portion of the support roller 11c. The second nozzle 13 discharges the second coating liquid Q2 in the gravity direction (Z direction) from the discharge port 13a in the belt-shaped base material S1. Therefore, the discharge directions (horizontal direction and gravity direction: application direction) of the first nozzle 12 and the second nozzle 13 are arranged to intersect each other.

第2噴嘴13例如可往Z方向移動來形成。因此,第2噴嘴13對於帶狀基材S1可往靠近的方向(-Z方向)及疏遠的方向(+Z方向)移動。又,第2噴嘴13也可往X方向或Y方向移動。又,第2噴嘴13可設置成可繞著與X方向平行的軸線旋轉。 The second nozzle 13 can be formed, for example, by moving in the Z direction. Therefore, the second nozzle 13 moves in the direction (-Z direction) in which the belt-shaped base material S1 can be moved and the direction (+Z direction) in the distance. Further, the second nozzle 13 can also move in the X direction or the Y direction. Further, the second nozzle 13 may be provided to be rotatable about an axis parallel to the X direction.

又,第1噴嘴12及第2噴嘴13不吐出塗佈液時,配置於無圖示之待機位置,吐出塗佈液時,可由待機位置分別移動至上述吐出位置P1、P2。又,可設置第1噴嘴12及第2噴嘴13進行預備吐出動作的部分。 When the first nozzle 12 and the second nozzle 13 do not discharge the coating liquid, they are placed at a standby position (not shown), and when the coating liquid is discharged, the standby position can be moved to the discharge positions P1 and P2, respectively. Further, a portion where the first nozzle 12 and the second nozzle 13 perform a preliminary discharge operation can be provided.

第1噴嘴12及第2噴嘴13各自經由連接配管(無圖示)等,與塗佈液供給源(無圖示)連接。第1噴嘴12及第2噴嘴13例如在內部設置保持特定量之塗佈液的保持部(無圖示)。此時,第1噴嘴12及第2噴嘴13可具有調整上述保持部所保持之液狀體之溫度的溫度調節部。 Each of the first nozzle 12 and the second nozzle 13 is connected to a coating liquid supply source (not shown) via a connection pipe (not shown) or the like. For example, the first nozzle 12 and the second nozzle 13 are provided with a holding portion (not shown) that holds a specific amount of the coating liquid. At this time, the first nozzle 12 and the second nozzle 13 may have a temperature adjustment unit that adjusts the temperature of the liquid body held by the holding unit.

由第1噴嘴12或第2噴嘴13吐出之各塗佈液之吐出量或第1塗佈膜F1或第2塗佈膜F2之膜厚,可藉由各噴嘴、各連接配管(無圖示)、或塗佈液供給源(無圖示)所連接的幫浦(無圖示)之壓力、搬送速度、各噴嘴位置或帶狀基材S1與噴嘴之距離等來調整。第1塗佈膜F1或 第2塗佈膜F2之膜厚,例如分別為0.5μm~500μm。 The discharge amount of each coating liquid discharged from the first nozzle 12 or the second nozzle 13 or the thickness of the first coating film F1 or the second coating film F2 can be set by each nozzle and each connecting pipe (not shown). The pressure of the pump (not shown) to which the coating liquid supply source (not shown) is connected, the conveyance speed, the position of each nozzle, or the distance between the strip-shaped base material S1 and the nozzle, etc. are adjusted. First coating film F1 or The film thickness of the second coating film F2 is, for example, 0.5 μm to 500 μm.

如本實施形態,使用2種類之塗佈液(第1塗佈液Q1及第2塗佈液Q2)時,將藉由第1塗佈液Q1所得之第1塗佈膜F1的膜厚,例如在0.5μm~10μm之範圍調整,將藉由第2塗佈液Q2所得之第2塗佈膜F2的膜厚,例如在1μm~50μm之範圍調整較佳。 In the present embodiment, when two types of coating liquids (first coating liquid Q1 and second coating liquid Q2) are used, the film thickness of the first coating film F1 obtained by the first coating liquid Q1 is For example, it is preferable to adjust the film thickness of the second coating film F2 obtained by the second coating liquid Q2 in the range of from 1 μm to 50 μm, in the range of from 0.5 μm to 10 μm.

又,乾燥部14配置於第1噴嘴12及第2噴嘴13之間。乾燥部14使形成於帶狀基材S1上之第1塗佈膜F1乾燥。藉由使第1塗佈膜F1乾燥後,形成第2塗佈膜F2,例如可抑制第2塗佈液所用的微粒子與第1塗佈膜F1之微粒子混合存在。 Further, the drying unit 14 is disposed between the first nozzle 12 and the second nozzle 13 . The drying unit 14 dries the first coating film F1 formed on the belt-shaped base material S1. By drying the first coating film F1 and forming the second coating film F2, for example, it is possible to prevent the fine particles used for the second coating liquid from being mixed with the fine particles of the first coating film F1.

圖3(a)及(b)表示乾燥部14之一例的圖。如圖3(a)及(b)所示,乾燥部14具有氣體供給部14a、氣體噴出噴嘴14b、排氣框體14c及安裝部14d。 3(a) and 3(b) are views showing an example of the drying unit 14. As shown in FIGS. 3(a) and 3(b), the drying unit 14 includes a gas supply unit 14a, a gas discharge nozzle 14b, an exhaust frame 14c, and a mounting portion 14d.

氣體供給部14a必要時,將氣體加熱至特定溫度,供給氣體噴出噴嘴14b。氣體供給部14a具有例如加熱氣體之紅外線加熱器及輸送加熱後的氣體之氣體送出部。又,氣體之加熱溫度,例如50℃~150℃、較佳為50℃~100℃之範圍。此外,氣體也可不加熱,而使由氣體噴出噴嘴14b噴出。又,由氣體供給部14a供給之氣體的流量配合帶狀基材S1之搬送速度或帶狀基材S1之寬等適宜調整即可。 The gas supply unit 14a heats the gas to a specific temperature as necessary, and supplies it to the gas discharge nozzle 14b. The gas supply unit 14a includes, for example, an infrared heater that heats the gas and a gas delivery unit that transports the heated gas. Further, the heating temperature of the gas is, for example, in the range of 50 ° C to 150 ° C, preferably 50 ° C to 100 ° C. Further, the gas may be ejected from the gas ejection nozzle 14b without heating. In addition, the flow rate of the gas supplied from the gas supply unit 14a may be appropriately adjusted in accordance with the conveyance speed of the belt-shaped base material S1 or the width of the belt-shaped base material S1.

氣體噴出噴嘴14b係將由氣體供給部14a供給之氣體朝向第1塗佈膜F1噴出。氣體噴出噴嘴14b係 於X方向以長條狀形成。氣體噴出噴嘴14b具有連接部14e。連接部14e係設置於氣體噴出噴嘴14b之+Z側的端面。氣體噴出噴嘴14b經由連接部14e,與氣體供給部14a連接。 The gas discharge nozzle 14b discharges the gas supplied from the gas supply unit 14a toward the first coating film F1. Gas ejection nozzle 14b It is formed in a long strip shape in the X direction. The gas ejection nozzle 14b has a connection portion 14e. The connecting portion 14e is provided on the end surface of the gas discharge nozzle 14b on the +Z side. The gas discharge nozzle 14b is connected to the gas supply unit 14a via the connection portion 14e.

又,氣體噴出噴嘴14b具有噴出氣體之噴出口14f。噴出口14f係形成狹縫狀。噴出口14f之長度方向為X方向。氣體噴出噴嘴14b係在X方向具有長形之中空部。氣體噴出噴嘴14b中,由氣體供給部14a之氣體在X方向擴散,由噴出口14f之X方向的全體噴出而形成。 Further, the gas discharge nozzle 14b has a discharge port 14f for discharging a gas. The discharge port 14f is formed in a slit shape. The longitudinal direction of the discharge port 14f is the X direction. The gas ejection nozzle 14b is a hollow portion having an elongated shape in the X direction. In the gas discharge nozzle 14b, the gas in the gas supply portion 14a is diffused in the X direction, and is formed by ejecting the entire X direction of the discharge port 14f.

噴出口14f係長度方向(X方向)之尺寸大致與帶狀基材S1之寬(X方向之尺寸)相等而形成。噴出口14f之長度方向的尺寸可為比帶狀基材S1之寬更大來形成,也可比帶狀基材S1之寬更小來形成。氣體噴出噴嘴14b設置噴出調整板14g。噴出調整板14g可調整噴出口14f之開口寬。 The size of the discharge port 14f in the longitudinal direction (X direction) is substantially equal to the width of the strip-shaped base material S1 (the dimension in the X direction). The size of the discharge port 14f in the longitudinal direction may be formed to be larger than the width of the belt-shaped base material S1, or may be formed smaller than the width of the belt-shaped base material S1. The gas discharge nozzle 14b is provided with a discharge adjustment plate 14g. The discharge adjustment plate 14g can adjust the opening width of the discharge port 14f.

排氣框體14c如圖3(b)所示,圍繞氣體噴出噴嘴14b來配置。排氣框體14c係與氣體噴出噴嘴14b之間,形成間隙14h來配置。排氣框體14c係在與氣體噴出噴嘴14b之間形成間隙14h的狀態下,與氣體噴出噴嘴14b成為一體被固定。 The exhaust frame 14c is disposed around the gas discharge nozzle 14b as shown in Fig. 3(b). The exhaust frame 14c is disposed between the gas discharge nozzle 14b and the gap 14h. The exhaust frame 14c is integrally fixed to the gas discharge nozzle 14b in a state where a gap 14h is formed between the gas discharge nozzle 14b and the gas discharge nozzle 14b.

排氣框體14c具有吸入口14i及排氣口14j。吸入口14i係朝向第1塗佈膜F1側(帶狀基材S1側)。吸入口14i與排氣口14j之間經由間隙14h而連通。又,排 氣口14j係形成於排氣框體14c之+Z側之端面。排氣口14j係在X方向複數排列配置。本實施形態中,排氣口14j係在2處設置。排氣口14j有排氣管連接。此排氣管連接吸引幫浦等之無圖示之吸引源。藉由驅動此吸引源,排氣管變成負壓。藉此,第1塗佈膜F1之表面的氣體由吸入口14i被間隙14h吸引。又,被間隙14h吸引的氣體由排氣口14j經由排氣管進行排氣。因此,可防止由噴出口14f噴出的氣體在第1噴嘴12側或第2噴嘴13側漏出,可抑制吐出口12a及13a乾燥。 The exhaust frame 14c has a suction port 14i and an exhaust port 14j. The suction port 14i faces the first coating film F1 side (the strip-shaped substrate S1 side). The suction port 14i and the exhaust port 14j communicate with each other via the gap 14h. Again, row The port 14j is formed on the end face of the exhaust frame 14c on the +Z side. The exhaust port 14j is arranged in a plurality of rows in the X direction. In the present embodiment, the exhaust port 14j is provided at two locations. The exhaust port 14j has an exhaust pipe connection. This exhaust pipe is connected to attract a suction source such as a pump. By driving this suction source, the exhaust pipe becomes a negative pressure. Thereby, the gas on the surface of the first coating film F1 is sucked by the suction port 14i by the gap 14h. Further, the gas sucked by the gap 14h is exhausted through the exhaust port 14j via the exhaust pipe. Therefore, it is possible to prevent the gas discharged from the discharge port 14f from leaking on the first nozzle 12 side or the second nozzle 13 side, and it is possible to prevent the discharge ports 12a and 13a from drying.

安裝部14d安裝於無圖示之框體而被固定。安裝部14d如圖3(a)所示,將帶狀基材S1挾著X方向來配置。因此,由噴出口14f噴出的氣體可防止由X方向漏出所構成。 The mounting portion 14d is attached to a frame (not shown) and fixed. As shown in FIG. 3(a), the mounting portion 14d is disposed such that the strip-shaped base material S1 is placed in the X direction. Therefore, the gas ejected from the discharge port 14f can be prevented from leaking in the X direction.

接著,如圖1所示,主加熱部15係第2噴嘴13之+Y側,且被配置於支撐滾輪11c與支撐滾輪11d之間。主加熱部15係使被塗佈於帶狀基材S1上之第1塗佈膜F1及第2塗佈膜F2之層合體F3進行加熱、乾燥,形成未燒成膜FA。 Next, as shown in FIG. 1, the main heating unit 15 is the +Y side of the second nozzle 13, and is disposed between the support roller 11c and the support roller 11d. In the main heating unit 15, the laminate F3 of the first coating film F1 and the second coating film F2 applied to the belt-shaped base material S1 is heated and dried to form an unfired film FA.

主加熱部15具有腔(chamber)15a與加熱器15b。腔15a收容帶狀基材S1及加熱器15b。腔15a係沿著帶狀基材S1之搬送方向,+Y側之端部在-Z側傾斜配置。腔15a中設置排氣管(exhaust duct)15c。排氣管15c連接無圖示之排氣管。腔15a內之氣體經由排氣管15c及排氣管,排氣至外部。 The main heating portion 15 has a chamber 15a and a heater 15b. The cavity 15a accommodates the strip substrate S1 and the heater 15b. The cavity 15a is arranged along the transport direction of the strip-shaped substrate S1, and the end on the +Y side is arranged obliquely on the -Z side. An exhaust duct 15c is provided in the chamber 15a. The exhaust pipe 15c is connected to an exhaust pipe (not shown). The gas in the chamber 15a is exhausted to the outside via the exhaust pipe 15c and the exhaust pipe.

加熱器15b係將第1塗佈膜F1及第2塗佈膜F2進行加熱。加熱器15b例如可使用紅外線加熱器等。加熱器15b係以30℃~100℃左右之溫度,將塗佈膜加熱。又,加熱器15b可設置成在Y方向分成複數之區域進行加熱。 The heater 15b heats the first coating film F1 and the second coating film F2. As the heater 15b, for example, an infrared heater or the like can be used. The heater 15b heats the coating film at a temperature of about 30 ° C to 100 ° C. Further, the heater 15b may be provided to be heated in a plurality of regions in the Y direction.

副加熱部16係將未燒成膜FA加熱,使以主加熱部15形成的未燒成膜FA容易由帶狀基材S1剝離。副加熱部16係將氣體加熱至特定溫度,且向未燒成膜FA吹送。副加熱部16之氣體之加熱溫度,設定為使未燒成膜FA容易由帶狀基材S1剝離的溫度。圖1中,副加熱部16係與主加熱部15獨立存在,但是也可設置於主加熱部15之內部。 The sub-heating unit 16 heats the unfired film FA, and the unfired film FA formed by the main heating unit 15 is easily peeled off from the belt-shaped base material S1. The sub heating unit 16 heats the gas to a specific temperature and blows it to the unfired film FA. The heating temperature of the gas of the sub-heating unit 16 is set to a temperature at which the unfired film FA is easily peeled off by the belt-shaped base material S1. In FIG. 1, the sub heating unit 16 is provided separately from the main heating unit 15, but may be provided inside the main heating unit 15.

剝離部17係未燒成膜FA由帶狀基材S1被剝離的部分。本實施形態中,藉由作業者之手作業剝離未燒成膜FA,但是不限於此,也可使用機械手等自動剝離。又,自動剝離時,可配置形成有可由帶狀基材S1剝離未燒成膜FA之刃的剝離用構件等。由帶狀基材S1剝離的未燒成膜FA,藉由搬出滾輪11f被搬出至塗佈單元10之外部,送至捲繞部40。又,未燒成膜FA經剝離後的帶狀基材S1,藉由基材捲繞滾輪11e捲繞。 The peeling portion 17 is a portion where the unfired film FA is peeled off by the belt-shaped base material S1. In the present embodiment, the unfired film FA is peeled off by the operator's hand. However, the present invention is not limited thereto, and automatic peeling by a robot or the like may be used. Moreover, at the time of automatic peeling, the peeling member etc. which can isolate the blade of the unfired film FA from the tape-form base material S1 can be arrange|positioned. The unfired film FA peeled off from the belt-shaped base material S1 is carried out to the outside of the coating unit 10 by the carry-out roller 11f, and is sent to the winding unit 40. Moreover, the strip-shaped base material S1 after the unfired film FA is peeled off is wound by the base material winding roller 11e.

[捲繞部(1)] [Winding section (1)]

圖4概略表示塗佈單元10之+Y側之構成的斜視圖。 Fig. 4 is a schematic perspective view showing the configuration of the +Y side of the coating unit 10.

如圖4所示,塗佈單元10之+Y側設置搬出未燒成膜 FA之搬出口10b。由搬出口10b搬出的未燒成膜FA,藉由捲繞部40捲繞。 As shown in FIG. 4, the +Y side of the coating unit 10 is provided to carry out the unfired film. FA's export 10b. The unfired film FA carried out by the carry-out port 10b is wound by the winding portion 40.

捲繞部40係於軸承41被安裝軸構件SF的構成。軸構件SF係將由搬出口10b搬出的未燒成膜FA捲繞形成捲筒體R。軸構件SF係對於軸承41,設置成可拆裝。軸構件SF安裝於軸承41時,可繞著與X方向平行之軸線旋轉來被支撐。捲繞部40具有可使安裝於軸承41之軸構件SF旋轉之無圖示的驅動機構。 The winding portion 40 is configured such that the bearing 41 is attached to the shaft member SF. The shaft member SF winds the unfired film FA carried out by the carry-out port 10b to form the roll body R. The shaft member SF is detachably attached to the bearing 41. When the shaft member SF is attached to the bearing 41, it can be supported by being rotated about an axis parallel to the X direction. The winding portion 40 has a drive mechanism (not shown) that can rotate the shaft member SF attached to the bearing 41.

又,捲繞部40中,未燒成膜FA之中,第1塗佈膜F1側之面配置於外側,來捲繞未燒成膜FA。例如藉由驅動機構,使軸構件SF繞著圖1之逆時針旋轉,來捲繞未燒成膜FA。形成有捲筒體R的狀態下,軸構件SF由軸承41取下,可將捲筒體R移動至其他之單元。 In the unwound film FA, the surface of the uncoated film FA is disposed on the outer side of the first coating film F1, and the unfired film FA is wound. For example, the shaft member SF is rotated counterclockwise about FIG. 1 by a drive mechanism to wind the unfired film FA. In a state in which the reel body R is formed, the shaft member SF is removed by the bearing 41, and the reel body R can be moved to another unit.

[送出部] [Send out]

圖5係概略表示燒成單元20之-Y側之構成的斜視圖。 Fig. 5 is a perspective view schematically showing a configuration of the -Y side of the firing unit 20.

如圖5所示,燒成單元20之-Y側設置搬入未燒成膜FA之搬入口20a。送出部50係相對於搬入口20a,送出未燒成膜FA。 As shown in Fig. 5, the inlet side 20a of the unfired film FA is placed on the -Y side of the firing unit 20. The delivery unit 50 sends the unfired film FA to the carry-in port 20a.

送出部50係軸構件SF可安裝於軸承51的構成。軸構件SF可與安裝於捲繞部40之軸承41者共同使用。因此,可將自捲繞部40取下之軸構件SF安裝至送出部50之軸承51。藉此,可將捲繞部40形成的捲筒體R 配置於送出部50。又,對於軸承51及捲繞部40之軸承41,各自可設定為離地面之高度為相等,也可設定為不同的高度位置。 The delivery portion 50 is a structure in which the shaft member SF can be attached to the bearing 51. The shaft member SF can be used together with the bearing 41 attached to the winding portion 40. Therefore, the shaft member SF taken out from the winding portion 40 can be attached to the bearing 51 of the delivery portion 50. Thereby, the roll body R formed by the winding portion 40 can be formed It is disposed in the delivery unit 50. Further, the bearings 51 of the bearing 51 and the winding portion 40 may be set to have the same height from the ground or may be set to different height positions.

軸構件SF被安裝於軸承51時,可繞著與X方向平行之軸線旋轉而被支撐。送出部50具有使安裝於軸承51之軸構件SF旋轉之無圖示的驅動機構。藉由驅動機構,使軸構件SF繞著圖1之順時針旋轉,構成捲筒體R之未燒成膜FA朝向搬入口20a被送出。上述捲繞部40中,未燒成膜FA之中,第1塗佈膜F1側之面配置於外側,來捲繞未燒成膜FA,因此未燒成膜FA由捲筒體R被拉出時,第1塗佈膜F1側被配置於上方。 When the shaft member SF is attached to the bearing 51, it can be supported by being rotated about an axis parallel to the X direction. The delivery unit 50 has a drive mechanism (not shown) that rotates the shaft member SF attached to the bearing 51. The shaft member SF is rotated clockwise around FIG. 1 by the drive mechanism, and the unfired film FA constituting the roll body R is sent toward the transfer port 20a. In the wound portion 40, the unfired film FA is disposed on the outer side of the first coating film F1 side to wind the unfired film FA, so that the unfired film FA is pulled by the roll body R When it is out, the 1st coating film F1 side is arrange|positioned on the upper side.

[燒成單元] [burning unit]

燒成單元20在本實施形態中,對於未燒成膜FA進行高溫處理的單元。燒成單元20係將未燒成膜FA進行燒成,形成含有微粒子的燒成膜FB。燒成單元20具有腔21、加熱部22及搬送部23。腔21具有搬入未燒成膜FA之搬入口20a及搬出燒成膜FB之搬出口20b。腔21係收容加熱部22及搬送部23。 In the present embodiment, the firing unit 20 performs a high temperature treatment on the unfired film FA. In the firing unit 20, the unfired film FA is fired to form a fired film FB containing fine particles. The firing unit 20 has a cavity 21, a heating unit 22, and a conveying unit 23. The chamber 21 has a transfer inlet 20a into which the unfired film FA is carried, and a transfer port 20b into which the fired film FB is carried out. The cavity 21 houses the heating unit 22 and the conveying unit 23.

加熱部22係將被搬入腔31內之未燒成膜FA進行加熱。加熱部22具有於Y方向排列配置之複數的加熱器22a。此加熱器22a例如可使用紅外線加熱器等。加熱部22係由腔21之內部之-Y側端部跨+Y側端部來配置。加熱部22係在Y方向之大致全體,可將未燒成膜FA 加熱。加熱部22例如可將未燒成膜FA加熱至120℃~450℃左右。藉由加熱部22之加熱溫度可配合未燒成膜FA之搬送速度或未燒成膜FA之構成成分等適宜調整。 The heating unit 22 heats the unfired film FA carried into the cavity 31. The heating unit 22 has a plurality of heaters 22a arranged in the Y direction. As the heater 22a, for example, an infrared heater or the like can be used. The heating portion 22 is disposed so that the end portion on the -Y side of the inside of the cavity 21 crosses the +Y side end portion. The heating unit 22 is substantially the entire Y direction, and the unfired film FA can be used. heating. The heating unit 22 can heat the unfired film FA to, for example, about 120 to 450 ° C. The heating temperature of the heating unit 22 can be appropriately adjusted in accordance with the conveying speed of the unfired film FA or the constituent components of the unfired film FA.

搬送部23具有搬送帶23a、驅動滾輪23b、被動滾輪23c及張力滾輪23d、23e。搬送帶23a係形成無端狀,沿著Y方向配置。搬送帶23a係使用對於未燒成膜FA之燒成溫度具有耐久性的材料所形成。搬送帶23a係在具有張力的狀態下,與XY平面大致平行,跨接於驅動滾輪23b與被動滾輪23c之間。未燒成膜FA及燒成膜FB係被載置於搬送帶23a的狀態下,被搬送至+Y方向。 The conveyance unit 23 has a conveyance belt 23a, a drive roller 23b, a passive roller 23c, and tension rollers 23d and 23e. The conveyor belt 23a is formed in an endless shape and arranged along the Y direction. The conveyor belt 23a is formed using a material having durability against the firing temperature of the unfired film FA. The conveyor belt 23a is substantially parallel to the XY plane in a state of being tensioned, and is bridged between the drive roller 23b and the driven roller 23c. The unfired film FA and the fired film FB are conveyed to the +Y direction while being placed on the conveyor belt 23a.

驅動滾輪23b係被配置於腔21之內部之+Y側端部。驅動滾輪23b係例如形成圓筒狀,與X方向平行配置。驅動滾輪23b設置例如馬達等之旋轉驅動裝置。驅動滾輪23b設置成藉由此旋轉驅動裝置,可繞著與X方向平行之軸線旋轉。藉由驅動滾輪23b旋轉,搬送帶23a繞著圖1之順時針旋轉。藉由搬送帶23a旋轉,被載置於搬送帶23a上之未燒成膜FA及燒成膜FB被搬送至+Y方向。 The drive roller 23b is disposed at the +Y side end of the inside of the cavity 21. The drive roller 23b is formed, for example, in a cylindrical shape, and is disposed in parallel with the X direction. The drive roller 23b is provided with a rotary drive such as a motor. The drive roller 23b is arranged to be rotatable about an axis parallel to the X direction by means of the rotary drive. By the rotation of the drive roller 23b, the conveyor belt 23a rotates clockwise around FIG. By the rotation of the conveyor belt 23a, the unfired film FA and the fired film FB placed on the conveyor belt 23a are conveyed to the +Y direction.

被動滾輪23c係被配置於腔21之內部之-Y側端部。被動滾輪23c例如形成圓筒狀,與X方向平行配置。被動滾輪23c係形成與驅動滾輪23b相同之直徑,Z方向之位置(高度位置)與驅動滾輪23b大致相等來配置。被動滾輪23c係設置為可繞與X方向平行之軸線旋轉。被動滾輪23c係追蹤搬送帶23a之旋轉而旋轉。 The passive roller 23c is disposed at the -Y side end of the inside of the cavity 21. The driven roller 23c is formed, for example, in a cylindrical shape, and is disposed in parallel with the X direction. The driven roller 23c has the same diameter as the driving roller 23b, and the position (height position) in the Z direction is substantially equal to the driving roller 23b. The passive roller 23c is arranged to be rotatable about an axis parallel to the X direction. The passive roller 23c rotates by tracking the rotation of the conveyance belt 23a.

張力滾輪23d係配置於被動滾輪23c之+Z側。張力滾輪23d係與X方向平行配置,設定為可繞X軸旋轉。張力滾輪23d設置為可在Z方向昇降移動。張力滾輪23d在與被動滾輪23c之間,可挾著未燒成膜FA。張力滾輪23d可挾著未燒成膜FA的狀態旋轉。 The tension roller 23d is disposed on the +Z side of the driven roller 23c. The tension roller 23d is disposed in parallel with the X direction and is set to be rotatable about the X axis. The tension roller 23d is provided to be movable up and down in the Z direction. The tension roller 23d is placed between the passive roller 23c and the unfired film FA. The tension roller 23d is rotatable in a state in which the film FA is not burned.

張力滾輪23e係配置於驅動滾輪23b之+Z側。張力滾輪23e係與X方向平行配置,設置成可繞X軸旋轉。張力滾輪23e設置成可在Z方向昇降移動。張力滾輪23e在與驅動滾輪23b之間,可挾著未燒成膜FB。張力滾輪23e可挾著未燒成膜FB的狀態旋轉。 The tension roller 23e is disposed on the +Z side of the drive roller 23b. The tension roller 23e is disposed in parallel with the X direction and is provided to be rotatable about the X axis. The tension roller 23e is provided to be movable up and down in the Z direction. The tension roller 23e is adjacent to the drive roller 23b so as to be adjacent to the unfired film FB. The tension roller 23e is rotatable in a state in which the film FB is not fired.

張力滾輪23d、23e各自在被動滾輪23c及驅動滾輪23b之間,各自挾著未燒成膜FA及燒成膜FB的狀態下,連續之未燒成膜FA及燒成膜FB之中,被挾之2處之間的部分,阻斷來自外部之張力。藉此,可防止對於未燒成膜FA及燒成膜FB,施加過剩的負荷。張力滾輪23d、23e可調整避免對配置於腔21內之未燒成膜FA及燒成膜FB施加張力。 Each of the tension rollers 23d and 23e is in the state of the unfired film FA and the fired film FB, and the unfired film FA and the fired film FB are placed between the passive roller 23c and the drive roller 23b. The part between the two places, blocking the tension from the outside. Thereby, it is possible to prevent an excessive load from being applied to the unfired film FA and the fired film FB. The tension rollers 23d and 23e can be adjusted to prevent tension from being applied to the unfired film FA and the fired film FB disposed in the cavity 21.

[除去單元] [removal unit]

除去單元30具有腔31、蝕刻部32、洗凈部33、乾燥部34及搬送部35。腔31具有搬入燒成膜FB之搬入口30a及搬出多孔性樹脂膜F之搬出口30b。腔31係收容蝕刻部32、洗凈部33、乾燥部34及搬送部35。 The removal unit 30 has a cavity 31, an etching unit 32, a cleaning unit 33, a drying unit 34, and a conveying unit 35. The chamber 31 has a transfer inlet 30a into which the fired film FB is carried, and a transfer port 30b through which the porous resin film F is carried out. The cavity 31 houses the etching unit 32, the cleaning unit 33, the drying unit 34, and the conveying unit 35.

蝕刻部32係對燒成膜FB進行蝕刻,除去燒 成膜FB所含有之微粒子,形成多孔性樹脂膜F。蝕刻部32中,藉由將燒成膜FB浸漬於可溶解或分解微粒子的蝕刻液中,除去微粒子。蝕刻部32設置供給這種蝕刻液的供給部(無圖示)或可儲存蝕刻液的儲存部。 The etching unit 32 etches the fired film FB to remove the burn The fine particles contained in the film formation FB form a porous resin film F. In the etching portion 32, the sintered film FB is immersed in an etching liquid capable of dissolving or decomposing the fine particles to remove the fine particles. The etching unit 32 is provided with a supply unit (not shown) that supplies such an etching liquid or a storage unit that can store the etching liquid.

洗凈部33係洗淨蝕刻後之多孔性樹脂膜F。洗凈部33配置於蝕刻部32之+Y側(多孔性樹脂膜F之搬送方向的前方)。洗凈部33具有供給洗凈液的供給部(無圖示)。又,也可具有將洗淨多孔性樹脂膜F後之廢液回收的回收部(無圖示)、多孔性樹脂膜F之液體排除之液體排除部(無圖示)等。 The cleaning unit 33 is a porous resin film F after the etching. The cleaning portion 33 is disposed on the +Y side of the etching portion 32 (before the conveyance direction of the porous resin film F). The cleaning unit 33 has a supply unit (not shown) that supplies the cleaning liquid. In addition, a recovery unit (not shown) that collects the waste liquid after washing the porous resin film F, and a liquid removal unit (not shown) that removes the liquid of the porous resin film F may be provided.

乾燥部34係將洗凈後之多孔性樹脂膜F進行乾燥。乾燥部34配置於洗凈部33之+Y側(多孔性樹脂膜F之搬送方向的前方)。乾燥部34設置加熱多孔性樹脂膜F的加熱部等。 The drying unit 34 dries the washed porous resin film F. The drying unit 34 is disposed on the +Y side of the cleaning unit 33 (before the conveyance direction of the porous resin film F). The drying unit 34 is provided with a heating unit or the like that heats the porous resin film F.

搬送部35跨越蝕刻部32、洗凈部33及乾燥部34,搬送燒成膜FB及多孔性樹脂膜F。搬送部35具有搬送帶35a、驅動滾輪35b及被動滾輪35c。又,除驅動滾輪35b及被動滾輪35c外,也可於蝕刻部32、洗凈部33、乾燥部34之內部配置支撐搬送帶35a的支撐滾輪。 The conveyance unit 35 traverses the etching unit 32, the cleaning unit 33, and the drying unit 34, and conveys the fired film FB and the porous resin film F. The conveyance unit 35 has a conveyance belt 35a, a drive roller 35b, and a passive roller 35c. Further, in addition to the driving roller 35b and the driven roller 35c, a supporting roller that supports the conveying belt 35a may be disposed inside the etching portion 32, the cleaning portion 33, and the drying portion 34.

搬送帶35a係形成無端狀,沿著Y方向配置。搬送帶35a係使用對於上述蝕刻液具有耐久性的材料所形成。搬送帶35a在具有張力的狀態下,與XY平面大致平行狀態,跨接於驅動滾輪35b與被動滾輪35c之間。 燒成膜FB及多孔性樹脂膜F被載置於搬送帶35a上。 The conveyor belt 35a is formed in an endless shape and arranged along the Y direction. The conveyor belt 35a is formed using a material having durability to the above etching liquid. The conveyance belt 35a is bridged between the drive roller 35b and the passive roller 35c in a state of being in tension with the XY plane. The fired film FB and the porous resin film F are placed on the conveyor belt 35a.

驅動滾輪35b配置於腔31之內部之+Y側端部。驅動滾輪35b例如形成圓筒狀,且與X方向平行配置。驅動滾輪35b設置例如馬達等之旋轉驅動裝置。驅動滾輪35b係設置成藉由此旋轉驅動裝置,可繞著與X方向平行之軸線旋轉。藉由驅動滾輪35b旋轉,搬送帶35a繞著圖1之順時針旋轉。藉由搬送帶35a旋轉,被載置於搬送帶35a上之燒成膜FB及多孔性樹脂膜F被搬送至+Y方向。 The drive roller 35b is disposed at the +Y side end of the inside of the cavity 31. The drive roller 35b is formed, for example, in a cylindrical shape, and is disposed in parallel with the X direction. The drive roller 35b is provided with a rotary drive such as a motor. The drive roller 35b is arranged to be rotatable about an axis parallel to the X direction by means of the rotary drive. By the rotation of the drive roller 35b, the conveyor belt 35a rotates clockwise around FIG. By the rotation of the conveyance belt 35a, the fired film FB and the porous resin film F placed on the conveyance belt 35a are conveyed to the +Y direction.

被動滾輪35c配置於腔31之內部之-Y側端部。被動滾輪35c例如形成圓筒狀,且與X方向平行配置。被動滾輪35c係形成與驅動滾輪35b相同之直徑,Z方向之位置(高度位置)與驅動滾輪35b大致相等來配置。被動滾輪35c係設置為可繞著與X方向平行之軸線旋轉。被動滾輪35c係追蹤搬送帶35a之旋轉而旋轉。 The passive roller 35c is disposed at the -Y side end of the inside of the cavity 31. The passive roller 35c is formed, for example, in a cylindrical shape and arranged in parallel with the X direction. The driven roller 35c has the same diameter as the driving roller 35b, and the position (height position) in the Z direction is substantially equal to the driving roller 35b. The passive roller 35c is arranged to be rotatable about an axis parallel to the X direction. The passive roller 35c rotates while tracking the rotation of the conveyor belt 35a.

又,除去單元30不限於藉由蝕刻除去微粒子的情形。例如,微粒子之材質使用比聚醯亞胺更低溫分解的有機材料時,藉由將燒成膜FB加熱,可使微粒子分解。這種有機材料只要是比聚醯亞胺更低溫分解的有機材料時,無特別限定均可使用。例如可列舉由線狀聚合物或習知之解聚合性聚合物所構成之樹脂微粒子。通常的線狀聚合物在熱分解時,聚合物之分子鏈被不規則切斷,解聚合性聚合物係在熱分解時,聚合物分解成單體的聚合物。皆分解成低分子量體或CO2,由燒成膜FB中消失。此時 之微粒子之分解溫度,較佳為200~320℃,更佳為230~260℃。分解溫度為200℃以上時,塗佈液使用高沸點溶劑時,也可成膜,燒成單元20中之燒成條件之選擇變寬。又,分解溫度未達320℃時,對於燒成膜FB不會施加熱傷害,可僅使微粒子消失。 Further, the removing unit 30 is not limited to the case where the fine particles are removed by etching. For example, when the material of the fine particles is an organic material which decomposes at a lower temperature than the polyimide, the fine particles are decomposed by heating the fired film FB. The organic material is not particularly limited as long as it is an organic material which decomposes at a lower temperature than the polyimide. For example, resin fine particles composed of a linear polymer or a conventional depolymerizable polymer may be mentioned. When a linear polymer is thermally decomposed, the molecular chain of the polymer is irregularly cut, and the depolymerizable polymer is decomposed into a monomeric polymer upon thermal decomposition. Both are decomposed into a low molecular weight body or CO 2 and disappear from the fired film FB. The decomposition temperature of the fine particles at this time is preferably 200 to 320 ° C, more preferably 230 to 260 ° C. When the decomposition temperature is 200° C. or higher, when the coating liquid is a high boiling point solvent, film formation can be performed, and the selection of the firing conditions in the firing unit 20 can be widened. Further, when the decomposition temperature is less than 320 ° C, no thermal damage is applied to the fired film FB, and only the fine particles can be eliminated.

[捲繞部(2)] [Winding section (2)]

圖6概略表示除去單元30之+Y側之構成的斜視圖。 Fig. 6 is a schematic perspective view showing the configuration of the +Y side of the removal unit 30.

如圖6所示,塗佈單元30之+Y側設置搬出多孔性樹脂膜F之搬出口30b。由搬出口30b搬出的多孔性樹脂膜F,藉由捲繞部60捲繞。 As shown in FIG. 6, the +Y side of the coating unit 30 is provided with the carry-out port 30b which carries out the porous resin film F. The porous resin film F carried out by the outlet 30b is wound by the winding portion 60.

捲繞部60係於軸承61被安裝軸構件SF的構成。軸構件SF係將由搬出口30b搬出的多孔性樹脂膜F捲繞形成捲筒體RF。軸構件SF係對於軸承61,設置成可拆裝。軸構件SF被安裝於軸承61時,可繞著與X方向平行之軸線旋轉來被支撐。捲繞部60具有可使安裝於軸承61之軸構件SF旋轉之無圖示的驅動機構。藉由驅動機構使軸構件SF旋轉,以捲繞多孔性樹脂膜F。在形成有捲筒體RF的狀態下,軸構件SF由軸承61上取下,可回收捲筒體RF。 The winding portion 60 is configured such that the bearing 61 is attached to the shaft member SF. The shaft member SF winds the porous resin film F carried out from the delivery port 30b to form a roll body RF. The shaft member SF is detachably attached to the bearing 61. When the shaft member SF is attached to the bearing 61, it can be supported by being rotated about an axis parallel to the X direction. The winding portion 60 has a drive mechanism (not shown) that can rotate the shaft member SF attached to the bearing 61. The shaft member SF is rotated by a drive mechanism to wind the porous resin film F. In a state in which the reel body RF is formed, the shaft member SF is removed from the bearing 61, and the reel body RF can be recovered.

[製造方法] [Production method]

其次,說明使用如上述構成的製造系統SYS,製造多孔性樹脂膜F之動作之一例。圖7(a)~(f)表示多孔性樹脂 膜F之製造過程之一例的圖。 Next, an example of an operation of manufacturing the porous resin film F using the manufacturing system SYS having the above configuration will be described. Figures 7(a) to (f) show porous resins A diagram of an example of the manufacturing process of the film F.

首先,塗佈單元10中,形成未燒成膜FA。塗佈單元10係使基材送出滾輪11a旋轉,送出帶狀基材S1,將帶狀基材S1設置於支撐滾輪11b~11d後,以基材捲繞滾輪11e捲繞。然後,由基材送出滾輪11a依序送出帶狀基材S1,同時以基材捲繞滾輪11e進行捲繞。帶狀基材S1係藉由支撐滾輪11b~11d,下面S1b被引導的狀態下被輸送。 First, in the coating unit 10, an unfired film FA is formed. In the coating unit 10, the substrate feeding roller 11a is rotated to feed the belt-shaped base material S1, and the belt-shaped base material S1 is placed on the supporting rollers 11b to 11d, and then wound by the substrate winding roller 11e. Then, the tape-like substrate S1 is sequentially fed out from the substrate feeding roller 11a, and the substrate winding roller 11e is wound. The belt-shaped base material S1 is conveyed by the support rollers 11b to 11d and the lower surface S1b is guided.

此狀態下,使第1噴嘴12配置於第1位置P1,使吐出口12a朝向+Y方向。藉此,使吐出口12a朝向帶狀基材S1之中,藉由支撐滾輪11b支撐的部分。然後,由吐出口12a吐出第1塗佈液Q1。第1塗佈液Q1係由吐出口12a朝向+Y方向被吐出,到達帶狀基材S1後,隨著帶狀基材S1之移動,被塗佈於帶狀基材S1之上面S1a。藉此,如圖7(a)所示,帶狀基材S1之上面S1a形成藉由第1塗佈液Q1所得的第1塗佈膜F1。第1塗佈膜F1中,樹脂材料A1中含有特定之體積比的微粒子A2。 In this state, the first nozzle 12 is placed at the first position P1, and the discharge port 12a is oriented in the +Y direction. Thereby, the discharge port 12a is directed toward the belt-shaped base material S1 by the portion supported by the support roller 11b. Then, the first coating liquid Q1 is discharged from the discharge port 12a. The first coating liquid Q1 is discharged from the discharge port 12a in the +Y direction, and reaches the belt-shaped base material S1, and is applied to the upper surface S1a of the belt-shaped base material S1 as the belt-shaped base material S1 moves. Thereby, as shown in FIG. 7(a), the first coating film F1 obtained by the first coating liquid Q1 is formed on the upper surface S1a of the belt-shaped base material S1. In the first coating film F1, the resin material A1 contains fine particles A2 having a specific volume ratio.

第1塗佈膜F1隨著帶狀基材S1之移動,而在+Z方向移動。第1塗佈膜F1到達乾燥部14時,使由氣體噴出噴嘴14b之噴出口14f噴出加熱氣體,使第1塗佈膜F1之表面乾燥。又,藉由使排氣口14j所連接之無圖示的排氣機構作動,被噴射於第1塗佈膜F1之加熱氣體,經由吸入口14i、隙間14h及排氣口14j而排氣。藉此,可防止加熱氣體在第1噴嘴12側或第2噴嘴13側漏 出,可抑制吐出口12a及13a之乾燥。 The first coating film F1 moves in the +Z direction as the belt-shaped substrate S1 moves. When the first coating film F1 reaches the drying unit 14, the heating gas is discharged from the discharge port 14f of the gas discharge nozzle 14b, and the surface of the first coating film F1 is dried. Further, the exhaust gas (not shown) connected to the exhaust port 14j is actuated, and the heated gas injected into the first coating film F1 is exhausted through the suction port 14i, the gap 14h, and the exhaust port 14j. Thereby, it is possible to prevent the heating gas from leaking on the side of the first nozzle 12 or the side of the second nozzle 13 The drying of the discharge ports 12a and 13a can be suppressed.

接著,使第2噴嘴12配置於第2位置P2,使吐出口13a朝向-Z方向。藉此,使吐出口13a朝向帶狀基材S1之中,藉由支撐滾輪11c支撐的部分。隨著帶狀基材S1之移動,第1塗佈膜F1到達吐出口13a之-Z側時,使由吐出口13a吐出第2塗佈液Q2。第2塗佈液Q2係由吐出口13a朝向-Z方向被吐出,到達形成於帶狀基材S1之第1塗佈膜F1上之後,隨著帶狀基材S1之移動,被塗佈於第1塗佈膜F1上。藉此,如圖7(b)所示,第1塗佈膜F1上形成藉由第2塗佈液所得的第2塗佈膜F2。第2塗佈膜F2中,樹脂材料A1中含有特定之體積比的微粒子A2。微粒子之含有率係設定為第1塗佈膜F1大於第2塗佈膜F2。藉由乾燥部14,使第1塗佈膜F1之表面成為乾燥的狀態,故在第1塗佈膜F1上,與第2塗佈膜F2之間幾乎未混合有微粒子A2等,維持第1塗佈膜F1及第2塗佈膜F2之微粒子的含有率。 Next, the second nozzle 12 is placed at the second position P2, and the discharge port 13a is oriented in the -Z direction. Thereby, the discharge port 13a is directed toward the belt-shaped base material S1 by the portion supported by the support roller 11c. When the first coating film F1 reaches the -Z side of the discharge port 13a as the belt-shaped base material S1 moves, the second coating liquid Q2 is discharged from the discharge port 13a. The second coating liquid Q2 is discharged from the discharge port 13a in the -Z direction, and reaches the first coating film F1 formed on the belt-shaped base material S1, and is then applied to the belt-shaped base material S1. On the first coating film F1. Thereby, as shown in FIG. 7(b), the second coating film F2 obtained by the second coating liquid is formed on the first coating film F1. In the second coating film F2, the resin material A1 contains fine particles A2 having a specific volume ratio. The content ratio of the fine particles is set such that the first coating film F1 is larger than the second coating film F2. Since the surface of the first coating film F1 is in a dry state by the drying unit 14, the first coating film F1 and the second coating film F2 are hardly mixed with the fine particles A2 and the like, and the first one is maintained. The content ratio of the fine particles of the coating film F1 and the second coating film F2.

又,吐出口12a、13a朝向帶狀基材S1之中,藉由支撐滾輪11b、11c支撐的部分的狀態下,被塗佈第1塗佈液Q1及第2塗佈液Q2,因此,第1塗佈液Q1及第2塗佈液Q2到達帶狀基材S1時,對帶狀基材S1產生作用的力被支撐滾輪11b、11c所接受。因此,帶狀基材S1之撓性或振動等之發生被抑制,帶狀基材S1上以均勻的厚度安定形成第1塗佈膜F1及第2塗佈膜F2。 In addition, the first coating liquid Q1 and the second coating liquid Q2 are applied to the strip-shaped base material S1, and the first coating liquid Q1 and the second coating liquid Q2 are applied in a state where the portions of the belt-shaped base material S1 are supported by the support rollers 11b and 11c. When the coating liquid Q1 and the second coating liquid Q2 reach the belt-shaped base material S1, the force acting on the belt-shaped base material S1 is received by the support rollers 11b and 11c. Therefore, the occurrence of flexibility, vibration, and the like of the belt-shaped base material S1 is suppressed, and the first coating film F1 and the second coating film F2 are formed in a uniform thickness on the belt-shaped base material S1.

接著,帶狀基材S1移動,而第1塗佈膜F1 及第2塗佈膜F2之層合部分被搬入主加熱部15之腔15a內時,主加熱部15中,進行第1塗佈膜F1及第2塗佈膜F2之乾燥。主加熱部15係使用加熱器15b,例如以50℃~100℃左右的溫度,將第1塗佈膜F1及第2塗佈膜F2加熱。此溫度範圍時,帶狀基材S1不會發生應變或變形等,可將第1塗佈膜F1及第2塗佈膜F2加熱。藉由使第1塗佈膜F1及第2塗佈膜F2之層合體乾燥,如圖7(c)所示,形成未燒成膜FA。 Next, the strip substrate S1 moves, and the first coating film F1 When the laminated portion of the second coating film F2 is carried into the cavity 15a of the main heating portion 15, the first coating film F1 and the second coating film F2 are dried in the main heating portion 15. The main heating unit 15 uses the heater 15b to heat the first coating film F1 and the second coating film F2 at a temperature of, for example, about 50° C. to 100° C. In the temperature range, the strip-shaped substrate S1 is not strained or deformed, and the first coating film F1 and the second coating film F2 can be heated. By drying the laminate of the first coating film F1 and the second coating film F2, an unfired film FA is formed as shown in Fig. 7(c).

形成未燒成膜FA後,藉由帶狀基材S1之移動,未燒成膜FA到達副加熱部16時,將被加熱至特定溫度的氣體由副加熱部16噴出至未燒成膜FA,將未燒成膜FA加熱。藉此,未燒成膜FA變得容易由帶狀基材S1剝離。 When the unfired film FA is formed, when the unfired film FA reaches the sub-heating unit 16 by the movement of the strip-shaped substrate S1, the gas heated to a specific temperature is ejected from the sub-heating unit 16 to the unfired film FA. The unfired film FA is heated. Thereby, the unfired film FA is easily peeled off from the belt-shaped base material S1.

接著,帶狀基材S1移動,未燒成膜FA之前端部分到達剝離部17時,例如藉由作業者之手作業,將此前端部分由帶狀基材S1剝離。本實施形態中,帶狀基材S1之材料使用例如PET,故使第1塗佈膜F1及第2塗佈膜F2乾燥形成未燒成膜FA時,由帶狀基材S1剝離變得容易,故作業者容易進行剝離。 Then, the strip-shaped base material S1 moves, and when the end portion of the unfired film FA reaches the peeling portion 17, the tip end portion is peeled off from the strip-shaped base material S1 by, for example, an operator's hand. In the present embodiment, the material of the belt-shaped base material S1 is, for example, PET. When the first coating film F1 and the second coating film F2 are dried to form the unfired film FA, the strip substrate S1 is easily peeled off. Therefore, the operator is easy to peel off.

將未燒成膜FA之前端部分剝離後,接著,帶狀基材S1移動,藉由第1噴嘴12形成第1塗佈膜F1。又,接著,藉由第2噴嘴13形成第2塗佈膜F2,以主加熱部15形成未燒成膜FA。藉此,未燒成膜FA形成帶狀,由主加熱部15搬出至+Y側的未燒成膜FA之長度漸 漸變長。作業者在剝離部17,繼續剝離未燒成膜FA。然後,被剝離後之未燒成膜FA成為前端到達捲繞部40之軸構件SF的長度時,作業者以手作業將未燒成膜FA設置於搬出滾輪11f,同時,未燒成膜FA之前端部分裝設於軸構件SF。然後,依序形成未燒成膜FA,為了配合剝離,在捲繞部40使軸構件SF旋轉。藉此,被剝離後之未燒成膜FA依序由塗佈單元10搬出,被捲繞部40之軸構件SF捲繞,形成捲筒體R。構成捲筒體R之未燒成膜FA如圖7(d)所示,成為由帶狀基材S1剝離後的狀態,表面及裏面均露出。 After the front end portion of the unfired film FA is peeled off, the belt-shaped base material S1 is moved, and the first coating film F1 is formed by the first nozzle 12 . Then, the second coating film F2 is formed by the second nozzle 13, and the unfired film FA is formed by the main heating portion 15. Thereby, the unfired film FA is formed into a strip shape, and the length of the unfired film FA carried out from the main heating unit 15 to the +Y side is gradually increased. The gradient is long. The operator continues to peel off the unfired film FA at the peeling portion 17. Then, when the unfired film FA after being peeled off reaches the length of the shaft member SF of the winding portion 40, the operator sets the unfired film FA on the carry-out roller 11f by hand, and the unfired film FA The front end portion is mounted to the shaft member SF. Then, the unfired film FA is sequentially formed, and the shaft member SF is rotated in the winding portion 40 in order to fit the peeling. Thereby, the unfired film FA which has been peeled off is sequentially carried out by the coating unit 10, and is wound by the shaft member SF of the winding portion 40 to form the roll body R. As shown in Fig. 7(d), the unfired film FA constituting the roll body R is in a state of being peeled off by the tape-shaped base material S1, and the surface and the inside are exposed.

剝離未燒成膜FA之前端部分的作業、及剝離後之前端部分安裝於軸構件SF的作業等,不限於作業者以手作業進行的態樣,例如可使用機械手或剝離用構件等自動進行。又,為了提高未燒成膜FA之剝離性,故也可在帶狀基材S1之表面形成脫模層。 The work of peeling off the front end portion of the unfired film FA and the work of attaching the front end portion to the shaft member SF after peeling are not limited to the case where the operator performs the work by hand, and for example, an automatic hand or a member for peeling can be used. get on. Further, in order to improve the releasability of the unfired film FA, a release layer may be formed on the surface of the belt-shaped base material S1.

特定長度的未燒成膜FA被捲繞於軸構件SF後,切斷未燒成膜FA,同時將軸構件SF連捲筒體R一同由軸承41取下。然後,將新的軸構件SF安裝於捲繞部40之軸承41,將未燒成膜FA之切取的端部裝設於此軸構件SF,使旋轉接著形成未燒成膜FA,可製作新的捲筒體R。 After the unfired film FA of a specific length is wound around the shaft member SF, the unfired film FA is cut, and the shaft member SF is continuously removed from the roll body R by the bearing 41. Then, the new shaft member SF is attached to the bearing 41 of the winding portion 40, and the cut end portion of the unfired film FA is attached to the shaft member SF, and the unfired film FA is formed by the rotation to make a new one. Roll reel R.

另外,例如作業者將由軸承41連捲筒體R一同取下的軸構件SF搬送至送出部50,安裝於軸承51。此軸構件SF之搬送動作及安裝動作也可使用機械手或搬送 裝置等自動進行。軸構件SF安裝於軸承51後,藉由使軸構件SF旋轉,由捲筒體R依序拉出未燒成膜FA,而未燒成膜FA被搬入燒成單元20之腔21內。又,將未燒成膜FA之前端搬入腔21時,作業者也可以手作業,也可使用機械手等自動進行。 Further, for example, the operator transports the shaft member SF that has been removed by the winding body R of the bearing 41 to the delivery unit 50, and is attached to the bearing 51. The transfer operation and mounting operation of the shaft member SF can also be performed by using a robot or transporting The device or the like is automatically performed. After the shaft member SF is attached to the bearing 51, the unfired film FA is sequentially pulled out from the roll body R by rotating the shaft member SF, and the unfired film FA is carried into the cavity 21 of the firing unit 20. Further, when the front end of the unfired film FA is carried into the chamber 21, the operator can also work by hand or automatically using a robot or the like.

被搬入腔21內之未燒成膜FA被載置於搬送帶23a上,遵循搬送帶23a之旋轉,被搬送至+Y方向。又,也可使用張力滾輪23d、23e調整張力。然後,搬送未燒成膜FA,同時使用加熱部22,進行未燒成膜FA之燒成。 The unfired film FA carried into the cavity 21 is placed on the conveyor belt 23a, and is conveyed to the +Y direction in accordance with the rotation of the conveyor belt 23a. Further, the tension can be adjusted using the tension rollers 23d and 23e. Then, the unfired film FA is transferred, and the heating portion 22 is used to perform baking of the unfired film FA.

燒成時之溫度係因未燒成膜FA之構造而異,較佳為120℃~375℃左右,又更佳為150℃~350℃。又,微粒子中含有機材料時,必須設定比其熱分解溫度更低之溫度。塗佈液含有聚醯胺酸時,此燒成時,完成醯亞胺化較佳,但是不限於未燒成膜FA為由聚醯亞胺、聚醯胺醯亞胺或聚醯胺所構成,藉由燒成單元20,對於未燒成膜FA進行高溫處理的情形。 The temperature at the time of firing varies depending on the structure of the unfired film FA, and is preferably from about 120 ° C to about 375 ° C, more preferably from 150 ° C to 350 ° C. Further, when the organic material is contained in the fine particles, it is necessary to set a temperature lower than the thermal decomposition temperature. When the coating liquid contains polylysine, it is preferable to carry out the ruthenium imidation at the time of baking, but it is not limited to the unfired film. The FA is composed of polyimine, polyamidimide or polyamine. The case where the unfired film FA is subjected to high temperature treatment by the firing unit 20 is used.

又,燒成條件,例如塗佈液含有聚醯胺酸及/或聚醯亞胺時,可以3小時使由室溫升溫至375℃後,在375℃下保持20分鐘的方法或可以50℃刻度,階段性由室溫升溫至375℃(各階段保持20分鐘),最後,375℃下保持20分鐘等進行階段性加熱。又,可將未燒成膜FA之端部固定於SUS製之模型等,防止變形。 Further, for the firing conditions, for example, when the coating liquid contains polyamic acid and/or polyimine, the temperature may be raised to 375 ° C from room temperature for 3 hours, and then held at 375 ° C for 20 minutes or 50 ° C. The scale was gradually increased from room temperature to 375 ° C (each stage was maintained for 20 minutes), and finally, the stage heating was carried out by holding at 375 ° C for 20 minutes or the like. Further, the end portion of the unfired film FA can be fixed to a model made of SUS or the like to prevent deformation.

藉由這種燒成,如圖7(e)所示,形成燒成膜 FB。燒成膜FB係在經醯亞胺化或高溫處理之樹脂層A3的內部含有微粒子A2。燒成膜FB之膜厚,可藉由例如測微器(micrometer)等測量複數處的厚度,求得平均值。較佳的平均膜厚,若使用於分隔膜等時,較佳為3μm~500μm,更佳為5μm~100μm,又更佳為10μm~30μm。 By this baking, as shown in FIG. 7(e), a fired film is formed. FB. The fired film FB contains fine particles A2 inside the resin layer A3 which is subjected to hydrazine imidization or high temperature treatment. The film thickness of the fired film FB can be measured by measuring the thickness at a plurality of places such as a micrometer to obtain an average value. The preferred average film thickness is preferably from 3 μm to 500 μm, more preferably from 5 μm to 100 μm, still more preferably from 10 μm to 30 μm, when used in a separator film or the like.

在燒成單元20所形成的燒成膜FB,由燒成單元20搬出時,未經捲繞被搬入除去單元30。燒成膜FB之前端部分搬入除去單元30時,作業者可以手作業進行,也可使用機械手等自動進行。 When the fired film FB formed by the firing unit 20 is carried out by the firing unit 20, it is unwound and loaded into the removal unit 30. When the front end portion of the fired film FB is carried into the removal unit 30, the operator can perform the work by hand or automatically using a robot or the like.

被搬入除去單元30之燒成膜FB被載置於搬送帶35a上,遵循搬送帶35a之旋轉,被搬送至+Y方向。除去單元30係隨著燒成膜FB之搬送,首先,在蝕刻部32中,除去微粒子A2。微粒子A2之材質,使用例如二氧化矽時,蝕刻部32中,燒成膜FB被浸漬於低濃度之氟化氫等之蝕刻液中。藉此,微粒子A2溶解於蝕刻液而被除去,如圖7(f)所示,形成在樹脂層A3之內部含有多孔部A4的多孔性樹脂膜F。 The fired film FB of the loading and unloading unit 30 is placed on the conveyance belt 35a, and is conveyed to the +Y direction in accordance with the rotation of the conveyance belt 35a. The removal unit 30 is transported along with the fired film FB. First, the fine particles A2 are removed in the etching unit 32. When the material of the fine particles A2 is, for example, cerium oxide, in the etching portion 32, the fired film FB is immersed in an etching liquid such as hydrogen fluoride having a low concentration. By this, the fine particles A2 are dissolved in the etching liquid and removed, and as shown in FIG. 7(f), the porous resin film F containing the porous portion A4 inside the resin layer A3 is formed.

其後,遵循搬送帶35a之旋轉,多孔性樹脂膜F依序被搬入洗凈部33及乾燥部34中。洗凈部33係藉由洗凈液洗淨多孔性樹脂膜F,然後進行液體排除。又,乾燥部34係液體排除後之多孔性樹脂膜F被加熱,洗凈液被除去。然後,多孔性樹脂膜F自除去單元30被搬出,藉由捲繞部60之軸構件SF被捲繞。 Thereafter, the porous resin film F is sequentially carried into the cleaning unit 33 and the drying unit 34 in accordance with the rotation of the conveyor belt 35a. The cleaning unit 33 cleans the porous resin film F by the cleaning liquid, and then removes the liquid. Further, the dry portion 34 is heated by the porous resin film F after the liquid is removed, and the cleaning liquid is removed. Then, the porous resin film F is carried out from the removal unit 30, and the shaft member SF of the winding portion 60 is wound.

如上述,本實施形態之塗佈單元10具備:在 特定方向移動的帶狀基材S1;將含有聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺之樹脂材料A1及微粒子A2的第1塗佈液Q1塗佈於帶狀基材S1上,形成第1塗佈膜F1的第1噴嘴12;及將含有樹脂材料A1及微粒子A2,且至少相對於第1塗佈液Q1而言,微粒子A2之含有率不同之第2塗佈液Q2,塗佈於第1塗佈膜F1上,形成第2塗佈膜F2的第2噴嘴13;故未燒成膜FA上可形成微粒子A2之含有率不同之2層。 As described above, the coating unit 10 of the present embodiment includes: a strip-shaped substrate S1 that moves in a specific direction; and a first coating liquid Q1 that contains a resin material A1 of polylysine, polyimine, polyamidamine or polyamine, and fine particles A2 is applied to the belt The first nozzle 12 of the first coating film F1 is formed on the substrate S1; and the resin material A1 and the fine particles A2 are contained, and at least the content of the fine particles A2 is different from the first coating liquid Q1. (2) The coating liquid Q2 is applied to the first coating film F1 to form the second nozzle 13 of the second coating film F2. Therefore, two layers having different contents of the fine particles A2 can be formed on the unfired film FA.

因此,將未燒成膜FA進行燒成形成燒成膜FB,由燒成膜FB中除去微粒子A2,形成多孔性樹脂膜F時,多孔性樹脂膜F之中,與第1塗佈膜F1對應的層,相對於與第2塗佈膜F2對應的層,可以均勻、稠密形成多孔部的孔。這種多孔性樹脂膜F作為鋰離子電池等之分隔膜使用時,藉由第1塗佈膜F1側配置於負極面側,離子順利移動,故可提高電池之電特性。又,相較於僅以第1塗佈液Q1形成相同空孔率之多孔性之醯亞胺系樹脂膜的情形,更可確保作為膜之強度。如此,藉由使用本實施形態之塗佈單元10,以形成的未燒成膜FA為基礎,製造多孔性樹脂膜F,可得到高品質的多孔性樹脂膜F。 Therefore, when the unfired film FA is fired to form the fired film FB, and the fine particles A2 are removed from the fired film FB to form the porous resin film F, the first resin film F and the first coating film F1 are formed. The corresponding layer can form a pore of the porous portion uniformly and densely with respect to the layer corresponding to the second coating film F2. When the porous resin film F is used as a separator film such as a lithium ion battery, the ions are smoothly moved by being disposed on the negative electrode surface side of the first coating film F1 side, so that the electrical characteristics of the battery can be improved. In addition, in the case of forming a porous yttrium imide resin film having the same porosity only in the first coating liquid Q1, the strength of the film can be secured. By using the coating unit 10 of the present embodiment, the porous resin film F is produced based on the unfired film FA formed, and a high-quality porous resin film F can be obtained.

又,本實施形態之製造系統SYS係包含上述塗佈單元10,故可以連串流程進行上述未燒成膜FA之形成、未燒成膜FA之燒成(燒成膜FB之形成)、及微粒子A2之除去(多孔性樹脂膜F之形成)之3個步驟。藉此,可提高多孔性樹脂膜F之製造效率。 Further, since the manufacturing system SYS of the present embodiment includes the coating unit 10, the formation of the unfired film FA, the firing of the unfired film FA (formation of the fired film FB), and the like can be performed in a series of steps. Three steps of removing the fine particles A2 (formation of the porous resin film F). Thereby, the manufacturing efficiency of the porous resin film F can be improved.

又,基材使用形成帶狀之帶狀基材(S1),故可形成帶狀之未燒成膜(FA)。因此,可適用於捲對捲方式等之製造步驟,可有效率地形成多孔性之醯亞胺系樹脂膜(多孔性樹脂膜F)。 Further, since the base material is formed into a strip-shaped base material (S1), a strip-shaped unfired film (FA) can be formed. Therefore, it can be applied to a manufacturing step such as a roll-to-roll method, and a porous bismuth imide resin film (porous resin film F) can be efficiently formed.

又,具備引導帶狀基材(S1)之下面(S1b)之第1滾輪(支撐滾輪11b)及第2滾輪(支撐滾輪11c),而第2塗佈部(第2噴嘴13)與第2滾輪對應配置,故第2液體(第2塗佈液Q2)到達帶狀基材時,對帶狀基材產生作用的力被第2滾輪接受。因此,可抑制帶狀基材之纏繞或振動等之發生,帶狀基材上可以均勻的厚度,安定形成第2層(第2塗佈膜F2)。 Further, the first roller (support roller 11b) and the second roller (support roller 11c) for guiding the lower surface (S1b) of the strip-shaped base material (S1) are provided, and the second coating portion (second nozzle 13) and the second coating portion are provided. When the second liquid (the second coating liquid Q2) reaches the belt-shaped base material, the force acting on the belt-shaped base material is received by the second roller. Therefore, the occurrence of entanglement or vibration of the belt-shaped base material can be suppressed, and the second layer (second coating film F2) can be formed stably on the belt-shaped base material with a uniform thickness.

又,第1滾輪(支撐滾輪11b)及第2滾輪(支撐滾輪11c)為上下方向位置不同來配置,第1塗佈部(第1噴嘴12)及第2塗佈部(第2噴嘴13)各自之塗佈方向互為交叉方式配置,故可以不同之高度位置形成第1層(第1塗佈膜F1)及第2層(第2塗佈膜F2)。藉此,可有效地利用空間,配置第1塗佈部及第2塗佈部。 In addition, the first roller (support roller 11b) and the second roller (support roller 11c) are disposed in different positions in the vertical direction, and the first application portion (first nozzle 12) and the second application portion (second nozzle 13) Since the respective coating directions are arranged so as to intersect each other, the first layer (first coating film F1) and the second layer (second coating film F2) can be formed at different height positions. Thereby, the first application portion and the second application portion can be disposed by effectively utilizing the space.

又,第1塗佈部(第1噴嘴12)及第2塗佈部(第2噴嘴13)各自對於基材(帶狀基材S1),可在靠近及疏遠的方向移動,故可調整第1塗佈部及第2塗佈部與基材之間的距離。 In addition, each of the first application portion (first nozzle 12) and the second application portion (second nozzle 13) can move in the direction of approaching and escaping to the base material (the belt-shaped base material S1), so that the first adjustment portion can be adjusted. 1 The distance between the coating portion and the second coating portion and the substrate.

又,第1塗佈部(第1噴嘴12)與第2塗佈部(第2噴嘴13)之間,具備至少使第1層(第1塗佈膜F1)之表面乾燥用的乾燥部(14),故在第1塗佈膜F1與第2塗 佈膜F2之間,可防止樹脂材料或微粒子等進行混合。 Further, between the first application portion (first nozzle 12) and the second application portion (second nozzle 13), a drying portion for drying at least the surface of the first layer (first coating film F1) is provided ( 14), so in the first coating film F1 and the second coating The resin film, the fine particles, and the like are prevented from being mixed between the film films F2.

又,具備將基材(帶狀基材S1)上之第1層(第1噴嘴12)及第2層(第2噴嘴13)所構成之層合體(F3)進行加熱的加熱部(15、16),故可形成具有微粒子之含有率不同之2層的未燒成膜FA。 Further, a heating unit (15) for heating the laminate (F3) composed of the first layer (first nozzle 12) and the second layer (second nozzle 13) on the base material (the belt-shaped base material S1) is provided. 16), it is possible to form the unfired film FA having two layers having different contents of fine particles.

又,加熱部(15、16)含有將層合體(F3)加熱的主加熱部(15)及將由主加熱部搬送之層合體(未燒成膜FA)加熱至特定溫度的副加熱部(16),故可有效地形成未燒成膜FA及可形成使未燒成膜FA容易由基材(帶狀基材S1)剝離的狀態。 Further, the heating unit (15, 16) includes a main heating unit (15) that heats the laminate (F3) and a sub heating unit that heats the laminate (unfired film FA) conveyed by the main heating unit to a specific temperature (16). Therefore, the unfired film FA can be formed efficiently, and the unfired film FA can be easily peeled off from the substrate (the belt-shaped substrate S1).

又,具備將基材(帶狀基材S1)上之第1層(第1塗佈膜F1)及第2層(第2塗佈膜F2)所構成之層合體(未燒成膜FA)由基材剝離的剝離部(17),故有效地剝離未燒成膜FA。 In addition, a laminate (unfired film FA) composed of a first layer (first coating film F1) and a second layer (second coating film F2) on a substrate (ribbon substrate S1) is provided. Since the peeling part (17) peeled off from the base material, the unfired film FA is effectively peeled off.

[變形例1] [Modification 1]

上述第1實施形態中,關於第1噴嘴12,在吐出口12a朝向帶狀基材S1之中,藉由支撐滾輪11b支撐的部分的狀態下,塗佈第1塗佈液Q1的情形為例來說明,但不限於此。 In the above-described first embodiment, the case where the first coating liquid Q1 is applied to the first nozzle 12 in a state where the discharge port 12a is supported by the support roller 11b is used as an example. To illustrate, but not limited to this.

圖8(a)及(b)表示變形例之塗佈單元10A、10B之部的構成例的圖。 (a) and (b) of FIG. 8 are views showing a configuration example of portions of the coating units 10A and 10B according to the modification.

如圖8(a)所示,塗佈單元10A係由支撐滾輪11b,在偏離+Z側的位置設定吐出位置P1A。此時,第1噴嘴12 係在吐出口12a朝向帶狀基材S1之中,偏離支撐滾輪11b之支撐的部分(例如偏離+Z側的部分)的狀態下,塗佈第1塗佈液Q1。帶狀基材S1之下面S1b與支撐滾輪11b之間挾著異物時,有時有帶狀基材S1側隆起形成突起的情形。形成這種突起的部分塗佈第1塗佈液Q1時,第1塗佈膜F1有形成針孔等的疑慮。對此,本變形例係使第1塗佈液Q1到達帶狀基材S1之中,偏離支撐滾輪11b之支撐的部分,可防止第1塗佈膜F1形成針孔等。 As shown in Fig. 8(a), the coating unit 10A sets the discharge position P1A at a position deviated from the +Z side by the support roller 11b. At this time, the first nozzle 12 The first coating liquid Q1 is applied in a state where the discharge port 12a faces the belt-shaped base material S1 and deviates from the portion of the support roller 11b (for example, a portion deviated from the +Z side). When a foreign matter is caught between the lower surface S1b of the belt-shaped base material S1 and the support roller 11b, the belt-shaped base material S1 may be bulged to form a projection. When the first coating liquid Q1 is applied to the portion where the projections are formed, the first coating film F1 has a problem that pinholes or the like are formed. On the other hand, in the present modification, the first coating liquid Q1 is caused to reach the portion of the belt-shaped base material S1 and deviated from the support of the support roller 11b, and the first coating film F1 can be prevented from forming a pinhole or the like.

又,如圖8(b)所示,塗佈單元10B係在支撐滾輪11b與支撐滾輪11c之間,配置另外的支撐滾輪11g,而帶狀基材S1成為藉由支撐滾輪11b、支撐滾輪11g、支撐滾輪11c引導的狀態。又,塗佈單元10B係由支撐滾輪11b,在偏離+Z側的位置設定吐出位置P1B。此時,第1噴嘴12係在吐出口12a朝向帶狀基材S1之中,支撐滾輪11b與支撐滾輪11g之支撐間的部分的狀態下,塗佈第1塗佈液Q1。藉此,與上述同樣,可防止第1塗佈膜F1形成針孔等。 Further, as shown in Fig. 8(b), the coating unit 10B is disposed between the support roller 11b and the support roller 11c, and another support roller 11g is disposed, and the belt-shaped substrate S1 is supported by the roller 11b and the support roller 11g. The state in which the support roller 11c is guided. Moreover, the coating unit 10B sets the discharge position P1B at the position deviated from the +Z side by the support roller 11b. At this time, the first nozzle 12 is applied with the first coating liquid Q1 in a state where the discharge port 12a faces the belt-shaped base material S1 and supports the portion between the roller 11b and the support roller 11g. Thereby, similarly to the above, it is possible to prevent the first coating film F1 from forming a pinhole or the like.

[第2實施形態] [Second Embodiment]

其次,說明第2實施形態。圖9表示第2實施形態之塗佈單元210之一例的圖。上述實施形態係以基材使用藉由PET等之樹脂材料而形成之帶狀基材S1的構成為例來說明,但是本實施形態中,帶狀基材之材料等與第1實施形態不同。以下,主要針對與第1實施形態之相異點來說 明。 Next, a second embodiment will be described. Fig. 9 is a view showing an example of the coating unit 210 of the second embodiment. In the above embodiment, the configuration of the belt-shaped base material S1 formed of a resin material such as PET is used as an example. However, in the present embodiment, the material of the belt-shaped base material or the like is different from that of the first embodiment. Hereinafter, the main points are different from the first embodiment. Bright.

如圖9所示,本實施形態之塗佈單元210之搬送部211中,基材使用藉由不銹鋼等之金屬材料而形成的帶狀基材S2。帶狀基材S2以金屬材料所形成,因此變得不易形成皺紋等。帶狀基材S2係形成無端狀,具有張力,跨接支撐滾輪211a、支撐滾輪11b、11c、11d、支撐滾輪211e之間。因此,帶狀基材S2之下面S2b係被支撐滾輪211a、11b、11c、11d、211e所引導。各帶狀基材S2係例如圖9之順時針方向循環於此等之支撐滾輪211a、11b、11c、11d、211e之間。 As shown in Fig. 9, in the conveying unit 211 of the coating unit 210 of the present embodiment, a belt-shaped base material S2 formed of a metal material such as stainless steel is used as the base material. Since the belt-shaped base material S2 is formed of a metal material, it becomes difficult to form wrinkles or the like. The belt-shaped base material S2 is formed in an endless shape and has tension, and is bridged between the support roller 211a, the support rollers 11b, 11c, and 11d, and the support roller 211e. Therefore, the lower surface S2b of the strip-shaped substrate S2 is guided by the support rollers 211a, 11b, 11c, 11d, and 211e. Each of the strip-shaped base materials S2 is, for example, looped in the clockwise direction of FIG. 9 between the support rollers 211a, 11b, 11c, 11d, and 211e.

又,第1噴嘴12係在帶狀基材S2之上面S2a形成第1塗佈膜F1。又,第2噴嘴13係在帶狀基材S2之上面S2a,重疊於第1塗佈膜F1,形成第2塗佈膜F2。 Further, the first nozzle 12 forms the first coating film F1 on the upper surface S2a of the strip-shaped substrate S2. Moreover, the second nozzle 13 is placed on the upper surface S2a of the strip-shaped base material S2, and is superposed on the first coating film F1 to form the second coating film F2.

主加熱部15中,形成於帶狀基材S2上的層合體F3被加熱。帶狀基材S2為以金屬材料所形成,故相較於使用以樹脂材料形成的基材時,可將主加熱部15中之加熱溫度設定為較高。因此,可以高溫且短時間進行加熱,故可有效地形成未燒成膜FA。又,帶狀基材S2之上面S2a為了容易將形成之未燒成膜FA剝離,例如形成鏡面。又,上面S2a也可預先藉由剝離劑等形成剝離層。 In the main heating unit 15, the laminate F3 formed on the belt-shaped base material S2 is heated. Since the belt-shaped base material S2 is formed of a metal material, the heating temperature in the main heating portion 15 can be set higher than when a base material formed of a resin material is used. Therefore, heating can be performed at a high temperature and for a short period of time, so that the unfired film FA can be efficiently formed. Moreover, the upper surface S2a of the strip-shaped base material S2 is formed, for example, to form a mirror surface in order to easily peel off the formed unfired film FA. Further, in the upper surface S2a, a release layer may be formed in advance by a release agent or the like.

支撐滾輪211e與支撐滾輪211a之間,配置洗凈部212。洗凈部212係洗淨未燒成膜FA被剝離後之帶狀基材S2。洗凈部212具有除去帶狀基材S2之上面 S2a之異物的除去部。又,洗凈部212也可為具有靜電除去器等之除電部,可將帶狀基材S2除靜電的構成。 A cleaning portion 212 is disposed between the support roller 211e and the support roller 211a. The cleaning unit 212 cleans the strip-shaped substrate S2 from which the unfired film FA is peeled off. The cleaning portion 212 has the upper surface of the strip substrate S2 removed The removal portion of the foreign matter of S2a. Moreover, the cleaning unit 212 may have a static eliminating portion such as an electrostatic remover, and the strip-shaped substrate S2 may be electrostatically removed.

如此,本實施形態中,帶狀基材(S2)形成無端狀進行循環,可節約形成帶狀基材的資材,可達成低成本化。又,帶狀基材(S2)為金屬材料所形成,故相較於帶狀基材為樹脂材料所形成的情形,比較不易形成皺紋等,成為耐久性優異的構成。藉此,可安定形成未燒成膜FA。 As described above, in the present embodiment, the belt-shaped base material (S2) is circulated in an endless shape, and the material for forming the belt-shaped base material can be saved, and the cost can be reduced. In addition, since the strip-shaped base material (S2) is formed of a metal material, it is less likely to form wrinkles or the like as compared with the case where the strip-shaped base material is formed of a resin material, and has a structure excellent in durability. Thereby, the unfired film FA can be formed stably.

[第3實施形態] [Third embodiment]

其次,說明第3實施形態。圖10表示第3實施形態之塗佈單元310之一例的圖。本實施形態中,搬送帶狀基材S1之搬送部311之構成與第1實施形態不同。以下,主要針對與第1實施形態之相異點進行說明。 Next, a third embodiment will be described. Fig. 10 is a view showing an example of the coating unit 310 of the third embodiment. In the present embodiment, the configuration of the conveying unit 311 for conveying the belt-shaped base material S1 is different from that of the first embodiment. Hereinafter, differences from the first embodiment will be mainly described.

如圖10所示,搬送部311係與第1實施形態同樣,具有帶狀基材(基材)S1、基材送出滾輪11a、支撐滾輪(第1滾輪)11b、支撐滾輪(第2滾輪)11c、支撐滾輪11d、基材捲繞滾輪11e及搬出滾輪11f。 As shown in FIG. 10, the conveyance unit 311 has a belt-shaped base material (base material) S1, a base material delivery roller 11a, a support roller (first roller) 11b, and a support roller (second roller) as in the first embodiment. 11c, a support roller 11d, a substrate winding roller 11e, and a carry-out roller 11f.

又,搬送部311具有搬送構件S3及支撐滾輪311a、311e。搬送構件S3形成帶狀,例如使用不銹鋼等之金屬材料形成無端狀。搬送構件S3具有張力,跨接支撐支撐滾輪311a、支撐滾輪11b、11c、11d及支撐滾輪311e之間。因此,搬送構件S3之下面係被支撐滾輪311a、11b、11c、11d、311e引導。搬送構件S3係將此等之支撐滾輪311a、11b、11c、11d、311e之間,例如於圖 10之順時針方向進行循環。 Moreover, the conveyance part 311 has the conveyance member S3 and the support rollers 311a and 311e. The conveying member S3 is formed in a belt shape, and is formed in an endless shape by using a metal material such as stainless steel. The conveying member S3 has a tension and is bridged between the support supporting roller 311a, the supporting rollers 11b, 11c, 11d and the supporting roller 311e. Therefore, the lower surface of the conveying member S3 is guided by the support rollers 311a, 11b, 11c, 11d, and 311e. The conveying member S3 is between the supporting rollers 311a, 11b, 11c, 11d, and 311e, for example, as shown in the figure. Loop 10 in a clockwise direction.

帶狀基材S1係形成帶狀。帶狀基材S1係由基材送出滾輪11a送出,具有張力跨接於搬送構件S3,被基材捲繞滾輪11e捲繞。因此,帶狀基材S1之下面S1b係被搬送構件S3引導。 The belt-shaped base material S1 is formed into a belt shape. The belt-shaped base material S1 is sent out by the base material feeding roller 11a, has a tension across the conveying member S3, and is wound by the base material winding roller 11e. Therefore, the lower surface S1b of the strip-shaped base material S1 is guided by the conveying member S3.

又,第1噴嘴12係在被搬送構件S3支撐的帶狀基材S1之上面S1a形成第1塗佈膜F1。又,第2噴嘴13係在被搬送構件S3支撐的帶狀基材S1之上面S1a,與第1塗佈膜F1重疊,形成第2塗佈膜F2。因此,可安定形成第1塗佈膜F1及第2塗佈膜F2。 In addition, the first nozzle 12 forms the first coating film F1 on the upper surface S1a of the belt-shaped base material S1 supported by the conveying member S3. In addition, the second nozzle 13 is placed on the upper surface S1a of the belt-shaped base material S1 supported by the conveying member S3, and overlaps with the first coating film F1 to form the second coating film F2. Therefore, the first coating film F1 and the second coating film F2 can be formed stably.

主加熱部15中,形成於帶狀基材S1上的層合體F3被加熱。此帶狀基材S1係在搬送構件S3上重疊被配置,故相較於單獨使用帶狀基材S1的情形,比較不易形成皺紋等,成為耐久性優異的構成。又,使用樹脂材料形成的帶狀基材S1被配置於表面側,故成為剝離性優異的構成。因此,不需要將搬送構件S3之表面形成鏡面。故可有效率且安定形成未燒成膜FA。 In the main heating unit 15, the laminate F3 formed on the belt-shaped base material S1 is heated. Since the strip-shaped base material S1 is disposed so as to overlap the transporting member S3, it is less likely to form wrinkles or the like than the strip-shaped base material S1 alone, and has a structure excellent in durability. Moreover, since the strip-shaped base material S1 formed using the resin material is disposed on the surface side, it has a structure excellent in peelability. Therefore, it is not necessary to form the surface of the conveying member S3 into a mirror surface. Therefore, the unfired film FA can be formed efficiently and stably.

剝離部17係形成於帶狀基材S1上之未燒成膜FA被剝離。因此,相較於將形成於金屬材料之帶狀基材的未燒成膜FA剝離的情形,較容易剝離。 The peeling portion 17 is formed by peeling off the unfired film FA formed on the belt-shaped base material S1. Therefore, it is easier to peel off than the case where the unfired film FA formed on the strip-shaped base material of the metal material is peeled off.

又,在支撐滾輪311e與支撐滾輪311a之間,配置洗凈部312。洗凈部312係洗淨搬送構件S3。洗凈部312具有除去搬送構件S3之上面S3a之異物的除去部。藉此,可防止在搬送構件S3與帶狀基材S1之間,挾 著異物,故可抑制未燒成膜FA形成針孔等。又,洗凈部312可為具有靜電除去器等之除電部,可為使搬送構件S3除靜電的構成。 Further, a cleaning portion 312 is disposed between the support roller 311e and the support roller 311a. The washing unit 312 is a washing and conveying member S3. The cleaning unit 312 has a removal portion that removes foreign matter on the upper surface S3a of the conveying member S3. Thereby, it is possible to prevent between the conveying member S3 and the belt-shaped base material S1. Since the foreign matter is formed, it is possible to suppress the formation of pinholes or the like in the unfired film FA. Further, the cleaning unit 312 may be a static eliminating unit having an electrostatic discharge device or the like, and may be configured to remove static electricity from the conveying member S3.

如此,依據本實施形態時,基材使用形成帶狀的帶狀基材(S1),至少與第1塗佈部(第1噴嘴12)及第2塗佈部(第2噴嘴13)對應之範圍內,具備搬送帶狀基材的搬送構件(S3),搬送構件為帶狀且形成無端狀進行循環,故可安定形成第1層(第1塗佈膜F1)及第2層(第2塗佈膜F2)。又,搬送構件(S3)為藉由金屬材料所形成,故帶狀基材S1不易形成皺紋等,成為耐久性優異的構成。 As described above, according to the present embodiment, the strip-shaped base material (S1) is formed in the base material, and at least the first coating portion (first nozzle 12) and the second coating portion (second nozzle 13) are used. In the range, the conveying member (S3) for conveying the belt-shaped base material is provided, and the conveying member is belt-shaped and is formed in an endless shape, so that the first layer (first coating film F1) and the second layer (second) can be stably formed. Coating film F2). In addition, since the conveyance member (S3) is formed of a metal material, the belt-shaped base material S1 is less likely to form wrinkles or the like, and has a structure excellent in durability.

[變形例2] [Modification 2]

上述第3實施形態係由支撐滾輪11b至支撐滾輪11c,帶狀基材S1在搬送構件S3上被支撐的狀態下被搬送的情形為例來說明,但不限於此。 In the third embodiment, the support roller 11b is supported by the support roller 11c, and the belt-shaped base material S1 is transported while being supported by the transport member S3. However, the present invention is not limited thereto.

圖11表示變形例之塗佈單元310A之一部份之構成例的圖。 Fig. 11 is a view showing a configuration example of a part of the coating unit 310A of the modification.

如圖11所示,支撐滾輪11b與支撐滾輪11c之間,設置補助滾輪11h。此補助滾輪11h配置於帶狀基材S1與搬送構件S3之間,對帶狀基材S1施加張力的狀態下支撐。補助滾輪11h係設定為與搬送構件S3非接觸。因此,支撐滾輪11b與支撐滾輪11c之間,帶狀基材S1以離開搬送構件S3的狀態被搬送。 As shown in FIG. 11, between the support roller 11b and the support roller 11c, the auxiliary roller 11h is provided. The auxiliary roller 11h is disposed between the belt-shaped base material S1 and the conveying member S3, and is supported while applying tension to the belt-shaped base material S1. The auxiliary roller 11h is set so as not to be in contact with the conveying member S3. Therefore, between the support roller 11b and the support roller 11c, the belt-shaped base material S1 is conveyed in a state of being separated from the conveyance member S3.

又,第1噴嘴12係吐出口12a朝向帶狀基材S1之中,偏離支撐滾輪11b之支撐的部分(例如偏離+Z側的部分)的狀態,塗佈第1塗佈液Q1。藉此,即使在帶狀基材S1之下面與搬送構件S3之間挾著異物時,也可防止第1塗佈膜F1形成針孔等。 In addition, the first coating liquid 12 is applied to the strip-shaped base material S1, and the first coating liquid Q1 is applied in a state of being displaced from the support portion of the support roller 11b (for example, a portion deviated from the +Z side). Thereby, even when a foreign matter is caught between the lower surface of the belt-shaped base material S1 and the conveying member S3, it is possible to prevent the first coating film F1 from forming a pinhole or the like.

又,乾燥部14係配置於例如支撐滾輪11b與補助滾輪11h之間,但是不限於此,也可與補助滾輪11h對應配置,也可配置於補助滾輪11h與支撐滾輪11c之間。 Further, the drying unit 14 is disposed between, for example, the support roller 11b and the auxiliary roller 11h. However, the present invention is not limited thereto, and may be disposed corresponding to the auxiliary roller 11h or may be disposed between the auxiliary roller 11h and the support roller 11c.

[第4實施形態] [Fourth embodiment]

其次,說明第4實施形態。圖12表示第4實施形態之塗佈單元410之一例的圖。本實施形態中,捲繞未燒成膜FA用之捲繞裝置設置於塗佈單元410,此點與第1實施形態不同。以下,主要針對與第1實施形態之相異點來說明。 Next, a fourth embodiment will be described. Fig. 12 is a view showing an example of the coating unit 410 of the fourth embodiment. In the present embodiment, the winding device for winding the unfired film FA is provided in the coating unit 410, which is different from the first embodiment. Hereinafter, the differences from the first embodiment will be mainly described.

如圖12所示,塗佈單元410設置捲繞部(捲筒體保持部)440。捲繞部440係捲繞由帶狀基材S1被剝離,以支撐滾輪11i所運送的未燒成膜FA。捲繞部440之構成係與第1實施形態之捲繞部40之構成大致相同。例如,捲繞部440係被裝設於軸承441之軸構件SF的構成。軸構件SF係捲繞以支撐滾輪11i所運送之未燒成膜FA,形成捲筒體R。軸構件SF係對於軸承441,設置成可拆裝。捲繞部440具有使被裝設於軸承441之軸構件 SF旋轉之無圖示的驅動機構。又,捲繞部440係未燒成膜FA之中,第1塗佈膜F1側之面被配置於外側,以捲繞未燒成膜FA。例如藉由驅動機構,使軸構件SF繞著圖18之逆時針旋轉,以捲繞未燒成膜FA。形成有捲筒體R之狀態下,將軸構件SF由軸承441取下,可使捲筒體R移動至其他的單元。又,未燒成膜FA被剝離後的帶狀基材S1係以基材捲繞滾輪(捲繞部)11e捲繞。 As shown in FIG. 12, the coating unit 410 is provided with a winding portion (a roll holding portion) 440. The winding portion 440 is wound by the belt-shaped base material S1 to be supported to support the unfired film FA conveyed by the roller 11i. The configuration of the winding portion 440 is substantially the same as the configuration of the winding portion 40 of the first embodiment. For example, the winding portion 440 is configured to be attached to the shaft member SF of the bearing 441. The shaft member SF is wound to support the unfired film FA conveyed by the roller 11i to form a roll body R. The shaft member SF is detachably attached to the bearing 441. The winding portion 440 has a shaft member that is mounted to the bearing 441 The drive mechanism of the SF rotation without illustration. Further, the winding portion 440 is an unfired film FA, and the surface on the first coating film F1 side is disposed on the outer side to wind the unfired film FA. For example, the shaft member SF is rotated counterclockwise about FIG. 18 by the drive mechanism to wind the unfired film FA. In a state in which the roll body R is formed, the shaft member SF is removed by the bearing 441, and the roll body R can be moved to another unit. Moreover, the strip-shaped base material S1 after the unfired film FA is peeled off is wound by the base material winding roller (winding portion) 11e.

如此,依據本實施形態時,因具備保持帶狀基材(S1)之捲筒體(R)的捲筒體保持部(捲繞部440)及捲繞由捲筒體拉出之帶狀基材的捲繞部(基材捲繞滾輪11e),故可適合將捲筒體以捲對捲方式等之製造步驟,可有效率形成多孔性之醯亞胺系樹脂膜(多孔性樹脂膜F)。又,將未燒成膜FA剝離後之帶狀基材以捲繞部捲繞,可有效率地回收帶狀基材。 As described above, according to the present embodiment, the roll holding portion (winding portion 440) for holding the roll body (R) of the belt-shaped base material (S1) and the tape-shaped base drawn by the roll body are wound. Since the winding portion (the substrate winding roller 11e) of the material is suitable for the production process such as the roll-to-roll method, the porous yttrium-based resin film (porous resin film F) can be efficiently formed. ). Moreover, the tape-shaped base material after peeling off the unfired film FA is wound by the winding part, and the tape-shaped base material can be collect|recovered efficiently.

[變形例3] [Modification 3]

上述實施形態中,以捲繞部40、60、440為使軸構件SF拆裝於軸承41、61、441之構成為例來說明,但是不限於此,例如可使用圖13所示之捲繞裝置90。以下,以使用捲繞裝置90取代捲繞部40的情形為例來說明。 In the above-described embodiment, the winding portions 40, 60, and 440 are described as an example in which the shaft member SF is detached from the bearings 41, 61, and 441. However, the present invention is not limited thereto. For example, the winding shown in FIG. 13 can be used. Device 90. Hereinafter, a case where the winding unit 40 is used instead of the winding unit 40 will be described as an example.

如圖13所示,捲繞裝置90具有框體91、軸構件SF、軸承92、驅動部93、中繼滾輪94a~94e及滾輪支撐部95。框體91係支撐軸構件SF、軸承92、驅動部93、中繼滾輪94a~94e、滾輪支撐部95之各部。 As shown in FIG. 13, the winding device 90 has a frame body 91, a shaft member SF, a bearing 92, a driving portion 93, relay rollers 94a to 94e, and a roller supporting portion 95. The frame 91 supports each of the shaft member SF, the bearing 92, the drive unit 93, the relay rollers 94a to 94e, and the roller support portion 95.

軸構件SF係捲繞由塗佈單元10搬出之未燒成膜FA,形成捲筒體R。軸構件SF係對於軸承92,設定成可拆裝。軸構件SF係被裝設於軸承92時,可繞著與X方向平行的軸線旋轉,被軸承92支撐。形成有捲筒體R的狀態下,將軸構件SF由軸承92取下,可將捲筒體R移動至其他的單元或回收。 The shaft member SF winds the unfired film FA carried out by the coating unit 10 to form a roll body R. The shaft member SF is detachably attached to the bearing 92. When the shaft member SF is attached to the bearing 92, it can be rotated about an axis parallel to the X direction and supported by the bearing 92. In a state in which the roll body R is formed, the shaft member SF is removed by the bearing 92, and the roll body R can be moved to another unit or collected.

中繼滾輪94a~94e係調整未燒成膜FA之張力,將未燒成膜FA送至軸構件SF。中繼滾輪94a~94e例如形成圓筒狀,各自與X方向平行配置。本實施形態中,未燒成膜FA係依中繼滾輪94a、94b、94c、94d、94e之順序跨接,但不限於此,也可不使用一部份的中繼滾輪。又,也可為中繼滾輪94a~94e之中,至少1個可藉由滾輪支撐部95移動。例如也可為滾輪支撐部95使中繼滾輪94b往Z方向或Y方向移動。又,也可為藉由滾輪支撐部95,使中繼滾輪94b繞著與X軸平行之軸線AX回轉的構成。此時,使中繼滾輪94b移動(回轉)的量(距離)以回饋(feed back)軸承92之捲繞速度,可使未燒成膜FA之張力保持一定。又,也可為在中繼滾輪94b之-Y側,使經由支點軸配置的可移動的重疊(無圖示)移動,變更對中繼滾輪94b之負荷的構成。此時,藉由前述重疊調整施加於中繼滾輪94b之負荷,可調整未燒成膜FA之張力。 The relay rollers 94a to 94e adjust the tension of the unfired film FA, and send the unfired film FA to the shaft member SF. The relay rollers 94a to 94e are formed, for example, in a cylindrical shape, and are arranged in parallel with the X direction. In the present embodiment, the unfired film FA is bridged in the order of the relay rollers 94a, 94b, 94c, 94d, and 94e. However, the present invention is not limited thereto, and a part of the relay roller may not be used. Further, at least one of the relay rollers 94a to 94e may be moved by the roller support portion 95. For example, the roller support portion 95 may move the relay roller 94b in the Z direction or the Y direction. Further, the relay roller 94b may be configured to be rotated around the axis AX parallel to the X-axis by the roller support portion 95. At this time, the amount (distance) of the relay roller 94b is moved (rotated) to feed back the winding speed of the bearing 92, and the tension of the unfired film FA can be kept constant. Further, a configuration in which the movable overlap (not shown) disposed via the fulcrum shaft is moved on the -Y side of the relay roller 94b, and the load on the relay roller 94b is changed. At this time, the tension applied to the relay roller 94b by the overlap adjustment can adjust the tension of the unfired film FA.

中繼滾輪94a~94e不限於與X方向平行之配置,也可為對於X方向傾斜配置。又,中繼滾輪R21~R25不限於圓筒形,也可使用形成有錐型、輻射型、 凹型等之冠部(crown)者。 The relay rollers 94a to 94e are not limited to being arranged in parallel with the X direction, and may be arranged obliquely in the X direction. Further, the relay rollers R21 to R25 are not limited to a cylindrical shape, and may be formed into a tapered type or a radiation type. The crown of the concave type, etc.

又,上述捲繞裝置90也可取代捲繞部60來使用。又,藉由使未燒成膜FA等之膜與捲繞時相反方向,使軸構件SF旋轉,可將未燒成膜FA等之膜送出。因此,例如也可使用捲繞裝置90取代上述送出部50。 Further, the winding device 90 may be used instead of the winding portion 60. In addition, the film of the unfired film FA or the like can be rotated by rotating the film of the unfired film FA or the like in the opposite direction to the winding, and the film of the unfired film FA or the like can be sent out. Therefore, for example, the winding device 90 may be used instead of the above-described delivery portion 50.

[分隔膜] [separator film]

其次,說明實施形態之分隔膜100。圖14表示鋰離子電池200之一例的模式圖,一部份被切開的狀態。如圖14所示,鋰離子電池200具有兼正極端子之金屬殼201及負極端子202。金屬殼201之內部設置正極201a、負極202a及分隔膜100,浸漬於無圖示之電解液中。分隔膜100係配置於正極201a與負極202a之間,防止正極201a與負極202a之間之電接觸。正極201a可使用鋰過渡金屬氧化物,負極202a可使用例如鋰或碳(石墨)等。 Next, the separator film 100 of the embodiment will be described. Fig. 14 is a schematic view showing an example of a lithium ion battery 200 in which a portion is cut. As shown in FIG. 14, the lithium ion battery 200 has a metal case 201 and a negative electrode terminal 202 which are also positive electrode terminals. The positive electrode 201a, the negative electrode 202a, and the separator film 100 are provided inside the metal shell 201, and are immersed in an electrolytic solution (not shown). The separator 100 is disposed between the positive electrode 201a and the negative electrode 202a to prevent electrical contact between the positive electrode 201a and the negative electrode 202a. A lithium transition metal oxide can be used for the positive electrode 201a, and lithium, carbon (graphite) or the like can be used for the negative electrode 202a.

上述實施形態所記載的多孔性樹脂膜F係作為此鋰離子電池200之分隔膜100使用。此時,例如將形成有第1塗佈膜F1之面作為鋰離子電池之負極202a側,可提高電池性能。又,圖14係以方型之鋰離子電池200之分隔膜100為例來說明,但是不限於此。上述多孔性樹脂膜F也可使用圓筒型或層合型等之任何形態之鋰離子電池的分隔膜。又,除鋰離子電池之分隔膜外,上述多孔性樹脂膜F可作為燃料電池電解質膜、氣體或液體之分離用膜、低介電率材料使用。 The porous resin film F described in the above embodiment is used as the separator film 100 of the lithium ion battery 200. At this time, for example, the surface on which the first coating film F1 is formed is used as the negative electrode 202a side of the lithium ion battery, and battery performance can be improved. Further, FIG. 14 is an example in which the separator film 100 of the prismatic lithium ion battery 200 is taken as an example, but is not limited thereto. As the porous resin film F, a separator film of a lithium ion battery of any form such as a cylindrical type or a laminated type can be used. Further, the porous resin film F can be used as a fuel cell electrolyte membrane, a gas or liquid separation membrane, or a low dielectric material, in addition to the separator film of the lithium ion battery.

以上針對實施形態說明,但是本發明不限於上述說明,在不脫離本發明之技術特徵的範圍內,可為各種變更。 The present invention has been described above with respect to the embodiments, but the present invention is not limited to the above description, and various modifications can be made without departing from the spirit and scope of the invention.

例如上述實施形態係設置於塗佈單元10之內部的剝離部17中,將未燒成膜FA由帶狀基材S1剝離的構成為例來說明,但不限於此。例如,塗佈單元10中,未將未燒成膜FA與帶狀基材S1剝離,而一體捲繞,在塗佈單元10之外部,浸漬於水等之液體中,同時未燒成膜FA也可由帶狀基材S1剝離。 For example, the above-described embodiment is described as an example in which the unfired film FA is peeled off from the strip-shaped base material S1 in the peeling portion 17 provided inside the coating unit 10, but the present invention is not limited thereto. For example, in the coating unit 10, the unfired film FA is not peeled off from the belt-shaped base material S1, and is integrally wound, and is immersed in a liquid such as water outside the coating unit 10 while the film FA is not fired. It can also be peeled off from the strip substrate S1.

又,使未燒成膜FA浸漬於液體的態樣,不限於將未燒成膜FA由帶狀基材S1剝離的情形。例如,也可使由帶狀基材S1剝離後之未燒成膜FA浸漬於水等之液體中。藉此,將未燒成膜FA進行燒成時,可抑制皺紋形成。又,也可具有使由帶狀基材S1剝離之未燒成膜FA浸漬於水等之液體後,強制該未燒成膜FA的步驟。強制的手段,例如有壓製該未燒成膜FA的步驟。藉此,使未燒成膜FA乾燥或燒成時,可抑制皺紋形成。 Moreover, the aspect in which the unfired film FA is immersed in the liquid is not limited to the case where the unfired film FA is peeled off from the belt-shaped base material S1. For example, the unfired film FA which has been peeled off from the belt-shaped base material S1 may be immersed in a liquid such as water. Thereby, when the unfired film FA is fired, wrinkle formation can be suppressed. In addition, the unfired film FA which is peeled off by the strip-shaped base material S1 may be immersed in a liquid such as water, and the unfired film FA may be forced. Forcible means, for example, a step of pressing the unfired film FA. Thereby, when the unfired film FA is dried or fired, wrinkle formation can be suppressed.

又,上述實施形態及變形例係說明塗佈單元10具有搬送部11、第1噴嘴(第1塗佈部)12、第2噴嘴(第2塗佈部)13、乾燥部14、主加熱部(加熱部)15、副加熱部(加熱部)16及剝離部17的構成,但是此等之中,也可為除去副加熱部(加熱部)16的構成。 In addition, in the above-described embodiment and modification, the coating unit 10 includes a conveying unit 11, a first nozzle (first coating unit) 12, a second nozzle (second coating unit) 13, a drying unit 14, and a main heating unit. The configuration of the (heating unit) 15, the sub heating unit (heating unit) 16, and the peeling unit 17, but among these, the sub heating unit (heating unit) 16 may be removed.

又,上述實施形態及變形例係以進行塗佈單元10之塗佈、燒成單元20之燒成、除去單元30之除去之3個步 驟的情形為例來說明,但是不限於此者。例如塗佈膜之材料使用聚醯亞胺、聚醯胺醯亞胺、或聚醯胺時,可不進行燒成。因此,未進行燒成時,例如藉由在燒成單元20與除去單元30之間設置捲繞裝置及送出裝置等,可將以塗佈單元10形成的未燒成膜FA,不經由燒成單元20而搬入除去單元30中。又,未進行燒成時,製造多孔性之醯亞胺系樹脂膜之製造系統可為包含:將含有聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺及微粒子之液體塗佈於基材,形成未燒成膜的塗佈單元;前述塗佈單元內或前述塗佈單元外,由前述基材剝離後之前述未燒成膜中除去前述微粒子的除去單元的製造系統。 Further, the above-described embodiments and modifications are three steps of applying the coating unit 10, firing the firing unit 20, and removing the removing unit 30. The case of the case is described as an example, but is not limited thereto. For example, when the material of the coating film is polyimine, polyamidimide or polyamine, the firing may not be performed. Therefore, when the firing is not performed, for example, by providing a winding device, a feeding device, and the like between the firing unit 20 and the removing unit 30, the unfired film FA formed by the coating unit 10 can be prevented from firing. The unit 20 is carried into the removal unit 30. Further, in the case where the firing is not performed, the production system for producing the porous bismuth imide resin film may include: containing polylysine, polyimine, polyamidimide or polyamine and fine particles. a coating unit in which a liquid is applied to a substrate to form an unfired film; and a removal unit in which the fine particles are removed from the unfired film after the substrate is peeled off from the substrate or in the coating unit system.

又,上述實施形態及變形例係以藉由所謂的捲對捲方式,形成多孔性樹脂膜F的構成為例來說明,但是不限於此者。例如除去單元30中之處理終了後,多孔性樹脂膜F由除去單元30搬出時,未以捲繞部60捲繞,而以特定的長度切斷,也可將切斷者回收。 In the above-described embodiments and modifications, the configuration in which the porous resin film F is formed by a so-called roll-to-roll method is described as an example, but the invention is not limited thereto. For example, when the processing of the removal unit 30 is completed, the porous resin film F is unwound by the winding unit 60, and is cut by a specific length, and the cut person can be recovered.

10、10B‧‧‧塗佈單元 10, 10B‧‧‧ coating unit

11、23、35‧‧‧搬送部 11, 23, 35‧‧‧Transportation Department

11a‧‧‧基材送出滾輪 11a‧‧‧Substrate feed roller

11b‧‧‧支撐滾輪(第1滾輪) 11b‧‧‧Support roller (1st roller)

11c‧‧‧支撐滾輪(第2滾輪) 11c‧‧‧Support roller (2nd roller)

11d‧‧‧支撐滾輪 11d‧‧‧Support roller

11e‧‧‧基材捲繞滾輪(捲繞部) 11e‧‧‧Substrate winding roller (winding section)

11f‧‧‧搬出滾輪 11f‧‧‧ moving out of the wheel

12‧‧‧第1噴嘴(第1塗佈部) 12‧‧‧1st nozzle (1st coating part)

12a、13a‧‧‧吐出口 12a, 13a‧‧‧ spitting

13‧‧‧第2噴嘴(第2塗佈部) 13‧‧‧2nd nozzle (2nd coating part)

14、34‧‧‧乾燥部 14, 34‧‧‧Drying Department

15‧‧‧主加熱部(加熱部) 15‧‧‧Main heating section (heating section)

15a、21、31‧‧‧腔 15a, 21, 31‧‧‧ cavity

15、22a‧‧‧加熱器 15, 22a‧‧‧ heater

15c‧‧‧排氣管 15c‧‧‧Exhaust pipe

16‧‧‧副加熱部(加熱部) 16‧‧‧Sub heating section (heating section)

17‧‧‧剝離部 17‧‧‧ peeling department

20‧‧‧燒成單元 20‧‧‧burning unit

20a、30a‧‧‧搬入口 20a, 30a‧‧‧

20b、30b‧‧‧搬出口 20b, 30b‧‧‧ moving out

22‧‧‧收容加熱部 22‧‧‧ Containment heating department

23a、35a‧‧‧搬送帶 23a, 35a‧‧‧Transport belt

23b、35b‧‧‧驅動滾輪 23b, 35b‧‧‧ drive roller

23c、35c‧‧‧被動滾輪 23c, 35c‧‧‧passive roller

23d、23e‧‧‧張力滾輪 23d, 23e‧‧‧ tension roller

30‧‧‧除去單元 30‧‧‧Removal unit

32‧‧‧蝕刻部 32‧‧‧Erosion Department

33‧‧‧洗凈部 33‧‧‧Decoration Department

40、60‧‧‧捲繞部 40, 60‧‧‧ Winding Department

41、51、61‧‧‧軸承 41, 51, 61‧ ‧ bearings

50‧‧‧送出部 50‧‧‧Send out

F‧‧‧多孔性樹脂膜 F‧‧‧Porous resin film

F1‧‧‧第1塗佈膜 F1‧‧‧1st coating film

F2‧‧‧第2塗佈膜 F2‧‧‧2nd coating film

FA‧‧‧未燒成膜 FA‧‧‧Unfired film

FB‧‧‧燒成膜 FB‧‧‧Boiled film

P1、P2‧‧‧吐出位置 P1, P2‧‧‧ spitting position

R、RF‧‧‧捲筒體 R, RF‧‧ ‧ roll body

S1‧‧‧帶狀基材 S1‧‧‧Striped substrate

S1a‧‧‧上面 S1a‧‧‧above

S1b‧‧‧下面 S1b‧‧‧ below

SF‧‧‧軸構件 SF‧‧‧shaft components

SYS‧‧‧製造系統 SYS‧‧‧ Manufacturing System

Claims (14)

一種塗佈裝置,其係形成多孔性之醯亞胺系樹脂膜用之塗佈裝置,其係具備:在特定方向移動的基材;將含有聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺、及微粒子之第1液體塗佈於前述基材上,形成第1層的第1塗佈部;及將含有聚醯胺酸、聚醯亞胺、聚醯胺醯亞胺或聚醯胺、及微粒子,且至少相對於前述第1液體而言,微粒子之含有率不同之第2液體,塗佈於前述第1層上,形成第2層的第2塗佈部。 A coating device for forming a porous bismuth imide resin film, comprising: a substrate that moves in a specific direction; and containing polylysine, polyimine, and polyamine The first liquid of sulfimine, polyamine, and fine particles is applied onto the substrate to form a first coating portion of the first layer; and the polyamine, polyimine, and polyamide An imine, a polyamine, and a fine particle, and at least a second liquid having a different content rate of fine particles is applied to the first layer to form a second coating portion of the second layer. . 如申請專利範圍第1項之塗佈裝置,其中前述基材為使用形成帶狀的帶狀基材。 The coating apparatus of claim 1, wherein the substrate is a strip-shaped substrate formed into a strip shape. 如申請專利範圍第2項之塗佈裝置,其係具備引導前述帶狀基材之下面的第1滾輪及第2滾輪,前述第2塗佈部係對應前述第2滾輪來配置。 The coating device according to claim 2, further comprising a first roller and a second roller that guide the lower surface of the strip-shaped substrate, wherein the second coating portion is disposed corresponding to the second roller. 如申請專利範圍第3項之塗佈裝置,其中前述第1滾輪及前述第2滾輪係上下方向之位置不同來配置,前述第1塗佈部及前述第2塗佈部係各自之塗佈方向互相交叉來配置。 The coating device according to claim 3, wherein the first roller and the second roller are disposed in different positions in the vertical direction, and the coating directions of the first coating portion and the second coating portion are respectively Cross each other to configure. 如申請專利範圍第1~4項中任一項之塗佈裝置,其中前述第1塗佈部及前述第2塗佈部之各自係以相對於前述基材,可往靠近及疏遠之方向移動而形成。 The coating device according to any one of claims 1 to 4, wherein each of the first coating portion and the second coating portion is movable toward and away from the substrate. And formed. 如申請專利範圍第1~5項中任一項之塗佈裝置,其中前述第1塗佈部與前述第2塗佈部之間,具備至少使前 述第1層之表面乾燥用的乾燥部。 The coating device according to any one of claims 1 to 5, wherein the first coating portion and the second coating portion are provided at least in front of each other A drying section for drying the surface of the first layer. 如申請專利範圍第1~6項中任一項之塗佈裝置,其中具備將由前述基材上之前述第1層及前述第2層所構成之層合體進行加熱的加熱部。 The coating apparatus according to any one of claims 1 to 6, further comprising a heating unit that heats the laminate of the first layer and the second layer on the substrate. 如申請專利範圍第7項之塗佈裝置,其中前述加熱部包含將前述層合體加熱的主加熱部及將由前述主加熱部搬送之前述層合體加熱至特定溫度的副加熱部。 The coating apparatus according to claim 7, wherein the heating unit includes a main heating unit that heats the laminate, and a sub heating unit that heats the laminate conveyed by the main heating unit to a specific temperature. 如申請專利範圍第1~8項中任一項之塗佈裝置,其係具備將由前述基材上之前述第1層及前述第2層所構成之層合體,由前述基材剝離的剝離部。 The coating device according to any one of claims 1 to 8, further comprising a laminate in which the laminate of the first layer and the second layer on the substrate is peeled off from the substrate . 如申請專利範圍第2項之塗佈裝置,其係具備保持前述帶狀基材之捲筒體的捲筒體保持部及將由前述捲筒體拉出之前述帶狀基材進行捲繞的捲繞部。 The coating device according to the second aspect of the invention, further comprising: a roll holding portion for holding the roll body of the strip-shaped base material; and a roll for winding the strip-shaped base material drawn by the roll body Winding around. 如申請專利範圍第2項之塗佈裝置,其中前述帶狀基材係形成無端狀進行循環。 The coating apparatus of claim 2, wherein the strip-shaped substrate is formed into an endless shape for circulation. 如申請專利範圍第2~12項中任一項之塗佈裝置,其中前述基材為使用形成帶狀的帶狀基材,至少與前述第1塗佈部及前述第2塗佈部對應之範圍內,具備搬送前述帶狀基材的搬送構件,前述搬送構件為帶狀且形成無端狀進行循環。 The coating device according to any one of claims 2 to 12, wherein the substrate is a strip-shaped substrate formed into a strip shape, and corresponds to at least the first coating portion and the second coating portion. In the range, the conveying member that conveys the belt-shaped base material is provided, and the conveying member has a belt shape and is formed in an endless shape to circulate. 如申請專利範圍第12項之塗佈裝置,其中前述搬送構件係藉由金屬材料而形成。 The coating device of claim 12, wherein the conveying member is formed of a metal material. 一種多孔性之醯亞胺系樹脂膜製造系統,其係製造多孔性之醯亞胺系樹脂膜之製造系統, 其係含有如申請專利範圍第1~13項中任一項之塗佈裝置。 A porous bismuth imide resin film production system for producing a porous bismuth imide resin film manufacturing system, It is a coating apparatus according to any one of claims 1 to 13.
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