TW201601289A - Ferromagnetic memory device and its magnetic memory chip - Google Patents

Ferromagnetic memory device and its magnetic memory chip Download PDF

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TW201601289A
TW201601289A TW103122205A TW103122205A TW201601289A TW 201601289 A TW201601289 A TW 201601289A TW 103122205 A TW103122205 A TW 103122205A TW 103122205 A TW103122205 A TW 103122205A TW 201601289 A TW201601289 A TW 201601289A
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coil
magnetic
gate
field effect
magnetic conductive
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TW103122205A
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馮武雄
周煌程
汪濤
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馮武雄
周煌程
汪濤
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Abstract

The patent discloses a memory device and its application to the memory modules. Its memory module contains numbers of metal-oxide-semiconductor (MOS) transistor, which includes a gate region, source region, drain region, a channel and a gate oxide layer. One end of the channel connects to source region and the other end connects to drain region. The gate oxide layer is to isolate gate region, source region, and drain region. A thin magnetic layer is located on the top of gate region. A magnetic coil surround on the MOS transistor. A thin magnetic film is installed on the MOS transistor to achieve small volume, compact layout, and low process cost. The magnetic thin-film on the MOS transistor is magnetized and stored the magnetic energy. Using the property of mobility variation with applying magnetic field, it shows that the memory storage of 1 and 0 on the magnetic MOS transistor is determined by the magnetic thin-film with and without magnetization, respectively. The innovative and nonvolatile read/write memory chip is developed by new memory devices.

Description

鐵磁性記憶模組及應用該模組之記憶晶片 Ferromagnetic memory module and memory chip using the same

本發明係關於一種記憶模組及應用該模組之記憶裝置,尤指一種改變該金氧半場效電晶體之臨界電壓值,以達到儲存、讀取功效之記憶裝置。 The invention relates to a memory module and a memory device using the same, in particular to a memory device for changing the threshold voltage value of the metal oxide half field effect transistor to achieve storage and reading efficiency.

如中華民國專利第166082號「霍爾效應半導體記憶單元」,其包含:一感測器、一對雙極電晶體、磁補片,其中該感測器係以矽基體製成之半導體霍爾棒,該一對雙極電晶體結合於該感測器內,而該磁補片構成於矽線上,且該磁補片位於二寫錄線間之洞孔內,當進行寫錄時,使驅動電流流經感測器之汲極區、通道、源極區,該電流流通方向相交叉於感測器之倒反層(Inversion layer)上產生一霍爾電壓(Hall voltage),並產生局部磁場及磁力線,該磁力線與驅動電流及霍爾電壓接相垂直,又該局部磁場可使磁補片之極性依所要方向「急速移動」而達成,另外,二寫錄線可供大寫錄電流流入,以使磁補片磁化,而使該磁補片可儲存霍爾電壓之二進位數據資料。 For example, the Republic of China Patent No. 166082 "Hall Effect Semiconductor Memory Cell" includes: a sensor, a pair of bipolar transistors, a magnetic patch, wherein the sensor is a semiconductor Hall made of a germanium substrate. a pair of bipolar transistors are coupled to the sensor, and the magnetic patch is formed on the 矽 line, and the magnetic patch is located in a hole between the two write lines, when the recording is performed, The driving current flows through the drain region, the channel, and the source region of the sensor, and the current flowing direction intersects the inversion layer of the sensor to generate a Hall voltage, and generates a local portion. The magnetic field and the magnetic line, the magnetic line is perpendicular to the driving current and the Hall voltage, and the local magnetic field can achieve the polarity of the magnetic patch in a desired direction, and the second write line can be used for the recording current to flow in. In order to magnetize the magnetic patch, the magnetic patch can store binary data of the Hall voltage.

進行讀取時,將感測器之多矽閘元件接地以使其下方之通道產生倒反層,使得驅動電流於通道中流動,以使每一基極區域感應出霍爾電壓及其極性,該霍爾電壓之極性須視磁補片之極性而定,以使儲存於磁補片內之數據資料轉變為電壓,再由一對雙極電晶體予以感測該電壓,使 得出現於二寫錄線上之電壓由與行列相關之行解碼器予以解碼,而可讀取該磁補片所儲存之資訊。 When reading, the multi-gate element of the sensor is grounded so that the channel below it generates an inverted layer, so that the driving current flows in the channel, so that each base region induces the Hall voltage and its polarity. The polarity of the Hall voltage depends on the polarity of the magnetic patch to convert the data stored in the magnetic patch into a voltage, which is sensed by a pair of bipolar transistors. The voltage that appears on the two write lines is decoded by the row decoder associated with the row and column, and the information stored by the magnetic patch can be read.

該「霍爾效應半導體記憶單元」其雖可達到寫錄、讀取功效, 然卻因該「霍爾效應半導體記憶單元」之感測器需搭配一對雙極電晶體使用,因而導致該「霍爾效應半導體記憶單元」具有體積大、連接線路繁雜、製成成本增加。 The "Hall Effect Semiconductor Memory Cell" can achieve the functions of writing and reading. However, since the sensor of the "Hall Effect Semiconductor Memory Cell" needs to be used with a pair of bipolar transistors, the "Hall Effect Semiconductor Memory Cell" has a large volume, complicated connection lines, and increased manufacturing cost.

有鑑於此,因此本發明的鐵磁性記憶體係以標準互補式金氧半電晶體(CMOS)標準製程,製作金氧半場效電晶體為基底的陣列元件,其具有閘極、源極、汲極,以及該金氧半場效電晶體上面鍍有鐵磁性材料;在此元件上佈局X軸及Y軸的兩層環型線圈,而可提供元件上鐵磁性材料在同為順向電流之磁化或同為反向之消磁作用。為實現實用的鐵磁性記憶體晶片,可配合多工器(MUX)以作為選址進行寫入選定為元件位址。另外讀出時亦使用另兩組多工器,分別連至X軸與Y軸之金氧半場效電晶體之汲極與閘極,並將源極全部連在一起作為輸出使用。 In view of this, the ferromagnetic memory system of the present invention is a standard complementary metal oxide semi-transistor (CMOS) standard process for fabricating a gold oxide half field effect transistor as a substrate array element having a gate, a source, and a drain. And the gold-oxygen half-field effect transistor is plated with a ferromagnetic material; two-layer loop coils of the X-axis and the Y-axis are arranged on the component, and the magnetization of the ferromagnetic material on the component is the magnetization of the forward current or The same is the degaussing effect of the reverse. In order to realize a practical ferromagnetic memory chip, a multiplexer (MUX) can be used as a site for writing and selected as a component address. In addition, two sets of multiplexers are also used for reading, which are connected to the drain and gate of the X-axis and Y-axis of the gold-oxygen half-field effect transistor, and the sources are all connected together for output.

本發明之主要目的係提供一種記憶模組,其包含:一金氧半場效電晶體,該金氧半場效電晶體設有一閘極、一源極區、一汲極區、一通道及一閘極絕緣層,該通道一端連接於源極區,且該通道另一端連接於汲極區,該閘極絕緣層將該閘極與源極區及汲極區隔開;一導磁薄膜層,該導磁薄膜層固設於該閘極上;一線圈組,該線圈組環設於金氧半場效電晶體外周圍; 藉由該導磁薄膜層固設於金氧半場效電晶體之閘極上,俾可達到體積小、線路簡化、降低製程成本之目的,同時藉由該導磁薄膜層之導磁特性,而可進行磁化或消磁,予以改變該金氧半場效電晶體之臨界電壓值,進而可達到儲存、讀取之功效。 The main object of the present invention is to provide a memory module comprising: a MOS field effect transistor, the MOS field effect transistor having a gate, a source region, a drain region, a channel, and a gate a pole insulating layer, one end of the channel is connected to the source region, and the other end of the channel is connected to the drain region, the gate insulating layer separates the gate from the source region and the drain region; a magnetic conductive film layer, The magnetic conductive film layer is fixed on the gate; a coil set, the coil set ring is arranged around the outer periphery of the gold oxide half field effect transistor; By fixing the magnetic conductive film layer on the gate of the metal oxide half field effect transistor, the crucible can achieve the purpose of small volume, simplified circuit, and low process cost, and at the same time, the magnetic permeability of the magnetic conductive film layer can be utilized. Magnetization or degaussing is performed to change the critical voltage value of the gold-oxygen half-field effect transistor, thereby achieving the functions of storage and reading.

本發明另一主要目的係提供一種記憶裝置,其包含:複數個金氧半場效電晶體,每一個金氧半場效電晶體設有一閘極、一源極區、一汲極區、一通道及一閘極絕緣層,該通道一端連接於源極區,且該通道另一端連接於汲極區,該閘極絕緣層將該閘極與源極區與汲極區隔開;複數個導磁薄膜層,每一個導磁薄膜層分別固設於每一個金氧半場效電晶體之閘極上,且該導磁薄膜層上方設有至少一導磁性結構材料;複數個線圈組,每一個線圈組環設於該金氧半場效電晶體外周圍並與相鄰之線圈組相連接;其中,該複數個線圈組供電源之電流流通,以產生一外加磁場對定址之該金氧半場效電晶體之導磁薄膜層進行磁化與消磁,予以改變該金氧半場效電晶體之臨界電壓值。 Another main object of the present invention is to provide a memory device comprising: a plurality of MOS field-effect transistors, each of the MOS field-effect transistors having a gate, a source region, a drain region, a channel, and a gate insulating layer, one end of the channel is connected to the source region, and the other end of the channel is connected to the drain region, the gate insulating layer separates the gate from the source region and the drain region; a plurality of magnetic conductive a film layer, each of the magnetic conductive film layers is respectively fixed on the gate of each of the gold oxide half field effect transistors, and at least one magnetic conductive material is disposed above the magnetic conductive film layer; a plurality of coil groups, each coil group a ring is disposed around the outer periphery of the MOS field and connected to an adjacent coil group; wherein the plurality of coil groups supply current for power supply to generate an external magnetic field pair to address the MOS field effect transistor The magnetic conductive film layer is magnetized and demagnetized to change the threshold voltage of the gold oxide half field effect transistor.

1‧‧‧金氧半場效電晶體 1‧‧‧Gold oxygen half-field effect transistor

11‧‧‧閘極 11‧‧‧ gate

12‧‧‧源極區 12‧‧‧ source area

13‧‧‧汲極區 13‧‧‧Bungee Area

14‧‧‧通道 14‧‧‧ passage

15‧‧‧閘極絕緣層 15‧‧‧ gate insulation

16‧‧‧導磁薄膜層 16‧‧‧Magnetic film layer

161‧‧‧導磁性結構材料 161‧‧‧ Magnetically conductive structural materials

2‧‧‧線圈組 2‧‧‧ coil group

21‧‧‧第一線圈 21‧‧‧First coil

22‧‧‧第二線圈 22‧‧‧second coil

4‧‧‧第一電源 4‧‧‧First power supply

5‧‧‧第二電源 5‧‧‧second power supply

I1‧‧‧第一電流 I1‧‧‧First current

I2‧‧‧第二電流 I2‧‧‧second current

第一圖係為本發明之側面剖視示意圖。 The first figure is a side cross-sectional view of the present invention.

第二圖係為第一圖之俯視示意圖。 The second figure is a top view of the first figure.

第三圖係為本發明之線圈組示意圖。 The third figure is a schematic view of the coil set of the present invention.

第四圖係為本發明之磁化動作示意圖。 The fourth figure is a schematic diagram of the magnetization action of the present invention.

第五圖係為本發明排列成陣列之示意圖。 The fifth figure is a schematic view of the present invention arranged in an array.

為使 貴審查員方便簡捷瞭解本發明之其他特徵內容與優點及其所達成之功效能夠更為顯現,茲將本發明配合附圖,詳細說明如下:請參閱第一圖、第二圖及第三圖所示,本發明係提供一種記憶模組,其包含:一金氧半場效電晶體1,該金氧半場效電晶體1設有一閘極11、一源極區12、一汲極區13、一通道14及一閘極絕緣層15,該通道14一端連接於源極區12,且該通道14另一連接於汲極區13,該閘極絕緣層15將該閘極11與源極區12與汲極區13隔開。 In order to make it easier for the examiner to understand the other features and advantages of the present invention and the effects achieved thereby, the present invention will be described in detail with reference to the accompanying drawings: refer to the first figure, the second figure and the As shown in the three figures, the present invention provides a memory module comprising: a MOS field effect transistor 1 having a gate 11, a source region 12, and a drain region. 13. A channel 14 and a gate insulating layer 15, one end of the channel 14 is connected to the source region 12, and the channel 14 is further connected to the drain region 13, the gate insulating layer 15 is connected to the gate 11 and the source The polar region 12 is spaced apart from the drain region 13.

一導磁薄膜層16,該導磁薄膜層16固設於該閘極11上,且該導磁薄膜層16上方設有至少一導磁性結構材料161,又該導磁薄膜層16可為鐵磁性薄膜層,如鎳鐵金屬氧化物。 a magnetic conductive film layer 16 is fixed on the gate 11, and at least one magnetic conductive material 161 is disposed above the magnetic conductive film layer 16, and the magnetic conductive film layer 16 can be iron. A magnetic thin film layer such as a nickel iron metal oxide.

一線圈組2,該線圈組2環設於該金氧半場效電晶體1外周圍,且該線圈組2包含至少一第一線圈21與至少一第二線圈22,其中該第一線圈21環設於金氧半場效電晶體1外周圍,且該第一線圈21可為導電材質,如金屬材質,又該第一線圈21具有Word Line,該第二線圈22環繞於第一線圈21上面,並相互成一角度,且該第二線圈22可為導電材質,如金屬材質,以具有良好導電性,又該第二線圈22具有Bit Line,該第一線圈21與第二線圈22可形成兩層環形線圈組2如第三圖及第四圖所示,予以分別電性連接第一電源4、第二電源5。 a coil assembly 2, the coil assembly 2 is disposed around the outer periphery of the MOSFET, and the coil assembly 2 includes at least a first coil 21 and at least a second coil 22, wherein the first coil 21 is looped The first coil 21 can be a conductive material, such as a metal material, and the first coil 21 has a Word line, and the second coil 22 surrounds the first coil 21, And the second coil 22 can be a conductive material, such as a metal material, to have good conductivity, and the second coil 22 has a Bit Line, and the first coil 21 and the second coil 22 can form two layers. As shown in the third and fourth figures, the toroidal coil group 2 is electrically connected to the first power source 4 and the second power source 5, respectively.

請再參閱第一圖所示,藉由該導磁薄膜層16固設於金氧半場效電晶體1之閘極11上,俾可達到體積小、線路簡化、降低製程成本之目的。 Referring to the first figure, the magnetic conductive film layer 16 is fixed on the gate 11 of the gold-oxygen half-effect transistor 1, so that the volume can be reduced, the circuit is simplified, and the process cost is reduced.

本發明主要係採用磁性材料應用於CMOS元件上,即可以導磁薄膜層16與CMOS電晶體結合,予以形成具有導磁特性之記憶模組,而可進行磁化或消磁,達到儲存、讀取1或0之位元資料功效;主要原理係藉由該導磁薄膜層為一鐵磁性材料,再以電流產生磁場的方式,對該導磁薄膜層進行磁化並改變其載體移動率及臨界電壓以達到儲存的功能,其構造如第三圖所示,我們以第一線圈21與第二線圈22形成雙線圈的方式,增加外加磁場Bapplied以磁化磁性材料。當第二線圈22之Bit Line與第一線圈21之Word Line均為1時施加的磁場最大,磁化最強,以此方式作為記憶體儲存功能及定址的方式。讀取時就電源電流依逆向一半電源施加進行,藉以區別是否有磁化作用,判讀為1或0之資料。 The invention mainly adopts a magnetic material applied to a CMOS component, that is, the magnetic conductive film layer 16 is combined with a CMOS transistor to form a memory module having magnetic conductive characteristics, and can be magnetized or demagnetized to achieve storage and reading. Or 0 bit data function; the main principle is that the magnetic conductive film layer is a ferromagnetic material, and then the magnetic field is magnetized to change the carrier mobility and the threshold voltage. To achieve the storage function, the structure is as shown in the third figure. We add the applied magnetic field B applied to magnetize the magnetic material in such a manner that the first coil 21 and the second coil 22 form a double coil. When the Bit Line of the second coil 22 and the Word Line of the first coil 21 are both 1, the applied magnetic field is the largest and the magnetization is the strongest, in this way as a memory storage function and addressing method. When reading, the power supply current is applied in the reverse half of the power supply, so as to distinguish whether there is magnetization, and the data is judged as 1 or 0.

請參閱第四圖所示,當該線圈組2之第一線圈21與第二線圈22分別電性連接於第一電源4與第二電源5時,可使該第一電源4之第一電流I1流經第一線圈21,且可使該第二電源5之第二電流I2流經第二線圈22,因而可使該線圈組2之第一線圈21與第二線圈22一同產生順向電流及外加磁場以增強該外加磁場強度,請再參閱第一圖所示,此時藉由該導磁薄膜層16故設於該金氧半場效電晶體1之閘極11上,俾使該外加磁場可對該導磁薄膜層16進行磁化,並使該導磁薄膜層16上之導磁性結構材料161產生極性,如該導磁性結構材料161的北極磁性方向向上,南極磁性方向向下,同時可改變該金氧半場效電晶體1之臨界電壓(Threshold Voltage)值,而使該導磁薄膜層16可儲存該金氧半場效電晶體1的臨界電壓的二位元資料,如「1」或「0」,因而可 達到儲存功效。 Referring to the fourth figure, when the first coil 21 and the second coil 22 of the coil assembly 2 are electrically connected to the first power source 4 and the second power source 5, respectively, the first current of the first power source 4 can be made. I1 flows through the first coil 21, and the second current I2 of the second power source 5 can flow through the second coil 22, so that the first coil 21 of the coil group 2 and the second coil 22 can generate a forward current together. And applying a magnetic field to enhance the strength of the applied magnetic field, please refer to the first figure. At this time, the magnetic conductive film layer 16 is disposed on the gate 11 of the MOS field 1 to make the external addition. The magnetic field can magnetize the magnetic conductive film layer 16 and cause the magnetic conductive structure material 161 on the magnetic conductive thin film layer 16 to have a polarity, for example, the north magnetic direction of the magnetic conductive structural material 161 is upward, and the south magnetic direction is downward. The threshold voltage of the MOS field 1 can be changed, and the magnetic thin film layer 16 can store the binary data of the threshold voltage of the MOS field 1, such as "1". Or "0", thus Reach storage efficiency.

又當該第一線圈21電性連接於一逆向的電源,且該第二線圈 22電性連接於一逆向的電源(圖未示),俾使流經第一線圈21之第一電流I1方向相反,且流經第二線圈22之第二電流I2的方向也相反,使得該第一線圈21與第二線圈22可產生逆向電流及反向磁場,而可使該導磁薄膜層16上之導磁性結構材料161之極性相反,如該導磁性結構材料161的南極磁性方向向上,北極磁性方向向下,因而可改變該金氧半場效電晶體1之通道14之載子移動率(mobility),且可對該導磁薄膜層16進行消磁,並使得該導磁薄膜層16所儲存之數據資料可轉變為電壓,予以讀取該電壓,即可以判讀儲存「1」或「0」的電壓資料,進而達到讀取功效。 When the first coil 21 is electrically connected to a reverse power source, and the second coil 22 is electrically connected to a reverse power source (not shown), so that the first current I1 flowing through the first coil 21 is opposite in direction, and the direction of the second current I2 flowing through the second coil 22 is opposite, so that The first coil 21 and the second coil 22 can generate a reverse current and a reverse magnetic field, and the polarities of the magnetic conductive structural material 161 on the magnetic conductive film layer 16 can be reversed, for example, the magnetic polarity of the south pole of the magnetic conductive structural material 161 is upward. The magnetic direction of the north pole is downward, so that the carrier mobility of the channel 14 of the MOS field 1 can be changed, and the magnetic conductive film layer 16 can be demagnetized, and the magnetic conductive film layer 16 can be made. The stored data can be converted into a voltage, and the voltage can be read, that is, the voltage data storing "1" or "0" can be read, thereby achieving the reading efficiency.

請參閱第五圖並配合第二圖、第三圖所示,本發明也可提供 一種記憶裝置,其包含數個金氧半場效電晶體1與數個線圈組2,每一個金氧半場效電晶體1之閘極11上固設至少一導磁薄膜層16,且每一個線圈組2環設於一金氧半場效電晶體1外周圍並與相鄰之線圈組2相連接,即可以每一個線圈組2之第一線圈21分別與橫向或縱向相鄰的第一線圈21相連接,予以形成數條橫向或縱向之第一線圈條。且每一個線圈組2之第二線圈22分別與縱向或橫向相鄰的第二線圈22相連接,予以形成數條縱向或橫向之第二線圈條,並使每一第一線圈條與每一第二線圈條成一角度排列,而使數條的第一線圈條與數條的第二線圈條排列成陣列狀或為矩陣,透過每一條的第一線圈條連接於第一電源4之多工器(MUX),俾使一第一電源4之電流可經由多工器分別流入每一第一線圈條,而使每一第一線圈條產生一第一外加磁場,又該每一第一線圈條連接一逆向的電源的多工器,予以產生逆向 電流,且該逆向的電源的多工器可連接於每一個金氧半場效電晶體1之閘極11(圖未示),且透過每一條的第二線圈條連接於第二電源5之多工器(MUX),以使一第二電源5之電流可經由多工器分別流入每一第二線圈條,而使每一第二線圈條產生一第二外加磁場,又該每一第二線圈條連接一逆向的電源的多工器(圖未示),予以產生逆向電流,且該逆向的電源的多工器可連接於每一個金氧半場效電晶體1之汲極12,並將每一金氧半場效電晶體1之源極13全部連接一起作為輸出使用;因此欲使陣列中的某一金氧半場效電晶體1上的導磁薄膜層16被定址磁化時,俾可令第一電源4之電流與第二電源5之電流分別流入該欲被磁化之金氧半場效電晶體1外周圍的第一線圈21與第二線圈22,而可使該第一線圈21與第二線圈22一同產生順向電流及外加磁場,因而可對該金氧半場效電晶體1上的導磁薄膜層16進行定址磁化,並可改變該金氧半場效電晶體1之臨界電壓值,以使該導磁薄膜層16可儲存該金氧半場效電晶體1的臨界電壓的二位元資料,進而可達到儲存功效。 Please refer to the fifth figure and cooperate with the second figure and the third figure, the present invention can also provide A memory device comprising a plurality of gold oxide half field effect transistors 1 and a plurality of coil groups 2, at least one magnetic conductive film layer 16 is fixed on the gate 11 of each of the gold oxide half field effect transistors 1, and each coil The group 2 ring is disposed around the outer periphery of a MOS field transistor 1 and is connected to the adjacent coil group 2, that is, the first coil 21 of each coil group 2 can be respectively connected to the first coil 21 which is laterally or longitudinally adjacent. Connected to form a plurality of horizontal or longitudinal first coil strips. And the second coils 22 of each coil group 2 are respectively connected to the second coil 22 which is longitudinally or laterally adjacent to form a plurality of longitudinal or transverse second coil strips, and each of the first coil strips and each The second coil strips are arranged at an angle, and the plurality of first coil strips and the plurality of second coil strips are arranged in an array or in a matrix, and the first coil strip passing through each strip is connected to the multiplexer of the first power source 4 And (MUX), the current of a first power source 4 can be respectively flown into each of the first coils via the multiplexer, so that each of the first coils generates a first applied magnetic field, and each of the first coils a multiplexer that connects a reverse power supply to reverse Current, and the multiplexer of the reverse power source can be connected to the gate 11 (not shown) of each of the MOSFETs, and the second coil of each strip is connected to the second power source 5 a device (MUX), such that a current of a second power source 5 can flow into each of the second coil strips via the multiplexer, and each second coil strip generates a second applied magnetic field, and each second The coil strip is connected to a reverse power supply multiplexer (not shown) to generate a reverse current, and the reverse power supply multiplexer can be connected to each of the MOSFETs 12 of the MOSFET 1 and The source 13 of each MOS field 1 is all connected together for output; therefore, if the magnetic permeable film layer 16 on a certain MOS field 1 in the array is addressed and magnetized, The current of the first power source 4 and the current of the second power source 5 respectively flow into the first coil 21 and the second coil 22 around the outer periphery of the metal oxide half field effect transistor 1 to be magnetized, and the first coil 21 and the first coil 21 can be made. The two coils 22 together generate a forward current and an applied magnetic field, so that the gold oxide half field effect transistor 1 can be The magnetic conductive film layer 16 performs address magnetization, and can change the threshold voltage value of the gold oxide half field effect transistor 1 so that the magnetic conductive film layer 16 can store the two positions of the threshold voltage of the gold oxide half field effect transistor 1. Metadata, in order to achieve storage efficiency.

當欲使陣列中已被磁化的金氧半場效電晶體1上的導磁薄膜 層16進行定址消磁時,俾令逆向的電源的電流流入該欲被消磁之金氧半場效電晶體1外周圍的第一線圈21,也令逆向的電源之電流流入該欲被消磁之金氧半場效電晶體1外的第二線圈22,予以產生一逆向的電流及反向磁場,俾可改變該已被磁化的金氧半場效電晶體1上之導磁薄膜層16的極性,而可對該金氧半場效電晶體1上的導磁薄膜層16進行消磁,並使得該導磁薄膜層16所儲存之數據資料可轉變為電壓,予以讀取該電壓,進而達到讀取功效。 a magnetically permeable film on a gold oxide half field effect transistor 1 that is to be magnetized in the array When the layer 16 performs the address degaussing, the current of the reverse power source flows into the first coil 21 around the outer periphery of the gold-oxygen half-effect transistor 1 to be demagnetized, and the current of the reverse power source flows into the gold oxide to be degaussed. The second coil 22 outside the half field effect transistor 1 generates a reverse current and a reverse magnetic field, and the polarity of the magnetic conductive film layer 16 on the magnetized gold oxide half field effect transistor 1 can be changed. The magnetic conductive film layer 16 on the gold oxide half field effect transistor 1 is demagnetized, and the data stored in the magnetic conductive film layer 16 can be converted into a voltage, and the voltage is read to achieve the reading efficiency.

因此,本發明係藉由該導磁薄膜層固設於金氧半場效電晶體 之閘極上,俾可達到體積小、線路簡化、降低製程成本之目的,同時藉由該導磁薄膜層之導磁特性及該金氧半場效電晶體之通道之載子移動率將隨著磁性而改變的特性,而可進行磁化或消磁,予以改變該金氧半場效電晶體之臨界電壓值,進而可達到儲存、讀取之功效。 Therefore, the present invention is fixed to the gold oxide half field effect transistor by the magnetic conductive film layer. On the gate, the crucible can achieve the purpose of small volume, simplified circuit, and reduced process cost, and the magnetic permeability of the magnetic permeability film layer and the carrier mobility of the channel of the MOS field-effect transistor will follow the magnetic property. The characteristic of the change can be magnetized or demagnetized, and the threshold voltage value of the gold-oxygen half-field effect transistor can be changed, thereby achieving the functions of storage and reading.

讀取時係分別將所有X軸的閘極連在一起接至X軸多工器 (未標示),由外部電源經開關至多工器提供該X軸閘極電源。另連接每一Y軸之汲極為一縱軸,並分別連接至Y軸多工器(未標示),由外部提供電源經開關至多工器提供選定的Y軸。最後經所有或一組的源極連在一起經放大器輸及比較器(未標示)判讀出儲存「1」或「0」的電壓資料。 When reading, connect all the X-axis gates to the X-axis multiplexer (Not shown), the X-axis gate power is supplied from an external power source via a switch to the multiplexer. The other Y-axis is connected to a vertical axis and is connected to a Y-axis multiplexer (not shown), which is supplied with power from the outside to the multiplexer to provide the selected Y-axis. Finally, all or a group of sources are connected together to read the voltage data of "1" or "0" by the amplifier input and comparator (not shown).

1‧‧‧金氧半場效電晶體 1‧‧‧Gold oxygen half-field effect transistor

11‧‧‧閘極 11‧‧‧ gate

12‧‧‧源極區 12‧‧‧ source area

13‧‧‧汲極區 13‧‧‧Bungee Area

14‧‧‧通道 14‧‧‧ passage

15‧‧‧閘極絕緣層 15‧‧‧ gate insulation

16‧‧‧導磁薄膜層 16‧‧‧Magnetic film layer

Claims (10)

一種記憶模組,其包含:一金氧半場效電晶體,該金氧半場效電晶體設有一閘極區、一源極區、一汲極區、一通道及一閘極絕緣層,該通道一端連接於源極區,且該通道另一端連接於汲極區,該閘極絕緣層將該閘極與源極區與汲極區隔開;一導磁薄膜層,該導磁薄膜層固設於該閘極上,且該導磁薄膜層上方設有至少一導磁性結構材料;一線圈組,該線圈組環設於該金氧半場效電晶體外周圍;其中,該線圈組供電源之電流流通,以產生一外加磁場對導磁薄膜層進行磁化與消磁,予以改變該金氧半場效電晶體之臨界電壓值。 A memory module comprising: a MOS field effect transistor, the MOS field device having a gate region, a source region, a drain region, a channel and a gate insulating layer, the channel One end is connected to the source region, and the other end of the channel is connected to the drain region, the gate insulating layer separates the gate from the source region and the drain region; a magnetic conductive film layer, the magnetic conductive film layer is fixed Provided on the gate, and at least one magnetic conductive material is disposed above the magnetic conductive film layer; a coil set, the coil set ring is disposed around the outer portion of the metal oxide half field effect transistor; wherein the coil set is powered The current is circulated to generate an applied magnetic field to magnetize and demagnetize the magnetic conductive film layer, and the threshold voltage value of the gold oxide half field effect transistor is changed. 如申請專利範圍第1項所述之記憶模組,其中該導磁薄膜層為鐵磁性結構材料。 The memory module of claim 1, wherein the magnetic conductive film layer is a ferromagnetic structural material. 如申請專利範圍第1項所述之記憶模組,其中該線圈組包含至少一第一線圈與至少一第二線圈,該第一線圈環設於該金氧半場效電晶體外周圍,該第二線圈環繞於該第一線圈上面,並相互成一角度。 The memory module of claim 1, wherein the coil set includes at least one first coil and at least one second coil, the first coil loop is disposed around the outer periphery of the MOS field, Two coils surround the first coil and are at an angle to each other. 如申請專利範圍第3項所述之記憶模組,其中該第一線圈與第二線圈為導電材質。 The memory module of claim 3, wherein the first coil and the second coil are electrically conductive materials. 一種記憶裝置,其包含:複數個金氧半場效電晶體,每一個金氧半場效電晶體設有一閘極、一源極區、一汲極區、一通道及一閘極絕緣層,該通道一端連接於源極區,且該通道另一端連接於汲極區,該閘極絕緣層將該閘極與源極區與汲極區 隔開;複數個導磁薄膜層,每一個導磁薄膜層分別固設於每一個金氧半場效電晶體之閘極上;複數個線圈組,每一個線圈組環設於該金氧半場效電晶體外周圍並與相鄰之線圈組相連接;其中,該複數個線圈組供電源之電流流通,分別以相同之同方向或反方向流動產生一外加磁場對定址的該金氧半場效電晶體之導磁薄膜層進行磁化與消磁,予以改變該金氧半場效電晶體之臨界電壓值。 A memory device comprising: a plurality of gold oxide half field effect transistors, each of the gold oxide half field effect transistors having a gate, a source region, a drain region, a channel and a gate insulating layer, the channel One end is connected to the source region, and the other end of the channel is connected to the drain region, and the gate insulating layer connects the gate and the source region and the drain region Separating; a plurality of magnetic conductive film layers, each of which is respectively fixed on the gate of each of the metal oxide half field effect transistors; a plurality of coil groups, each of which is disposed on the gold oxide half field effect The outer periphery of the crystal is connected to an adjacent coil group; wherein the plurality of coil groups supply current to the power source, respectively flowing in the same direction or in the opposite direction to generate an external magnetic field pair to address the gold oxide half field effect transistor The magnetic conductive film layer is magnetized and demagnetized to change the threshold voltage of the gold oxide half field effect transistor. 如申請專利範圍第5項所述之記憶裝置,其中該每一線圈組包含至少一第一線圈與至少一第二線圈,該第一線圈環設於金氧半場效電晶體外周圍,該第二線圈環繞於第一線圈上面,並相互成一角度。 The memory device of claim 5, wherein each of the coil sets includes at least one first coil and at least one second coil, the first coil loop being disposed around the outer periphery of the MOS field-effect transistor, the first The two coils surround the first coil and are at an angle to each other. 如申請專利範圍第6項所述之記憶裝置,其中該每一線圈組之第一線圈分別與橫向或縱向相鄰的第一線圈相連接,予以形成數條橫向或縱向之第一線圈條,且每一線圈組之第二線圈分別與縱向或橫向相鄰的第二線圈相連接,予以形成數條縱向或橫向之第二線圈條。 The memory device of claim 6, wherein the first coil of each coil group is respectively connected to a horizontally or longitudinally adjacent first coil, and a plurality of horizontal or longitudinal first coil strips are formed. And the second coil of each coil group is respectively connected to the second coil which is longitudinally or laterally adjacent to form a plurality of longitudinal or transverse second coil strips. 如申請專利範圍第7項所述之記憶裝置,其中該每一第一線圈條與該每一第二線圈條成一角度排列。 The memory device of claim 7, wherein each of the first coil strips is arranged at an angle to each of the second coil strips. 如申請專利範圍第6項所述之記憶裝置,其中該第一線圈與第二線圈為導電材質。 The memory device of claim 6, wherein the first coil and the second coil are electrically conductive materials. 如申請專利範圍第5項所述之記憶裝置,予以縱橫排列為一矩陣。 The memory device according to item 5 of the patent application is arranged in a matrix in a vertical and horizontal direction.
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TWI728065B (en) * 2016-03-15 2021-05-21 日商艾普凌科有限公司 Magnetic sensor and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI728065B (en) * 2016-03-15 2021-05-21 日商艾普凌科有限公司 Magnetic sensor and its manufacturing method

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